TW201834051A - Workpiece inspection method, workpiece inspection device and processing device more appropriately and easily detecting a grinding trace of a workpiece - Google Patents

Workpiece inspection method, workpiece inspection device and processing device more appropriately and easily detecting a grinding trace of a workpiece Download PDF

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TW201834051A
TW201834051A TW107106243A TW107106243A TW201834051A TW 201834051 A TW201834051 A TW 201834051A TW 107106243 A TW107106243 A TW 107106243A TW 107106243 A TW107106243 A TW 107106243A TW 201834051 A TW201834051 A TW 201834051A
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Prior art keywords
workpiece
processed surface
light
image
grinding
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TW107106243A
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Chinese (zh)
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TWI741151B (en
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高橋邦充
北野元己
前嶋信
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日商迪思科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/0053Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements

Abstract

To more appropriately and easily detect a grinding trace of a workpiece. The method comprises: a processing step of processing a workpiece with a grinding wheel or a polishing pad, a projection step of irradiating light from a light source to a surface to be processed of the workpiece, such that light reflected by the surface to be processed irradiates the screen to project the projection image on the screen while reflecting the state of the unevenness formed on the surface to be processed in the processing step, an imaging step of imaging the projection image of the screen to form a captured image, and an judging step of judging the quality of the workpiece by knowing the unevenness state of the workpiece based on the captured image.

Description

工件的檢查方法、工件的檢查裝置及加工裝置Workpiece inspection method, workpiece inspection device and processing device

本發明係關於一種對工件上形成的研削痕進行檢查之檢查方法、工件的檢查裝置及加工裝置。The invention relates to an inspection method, an inspection device and a processing device for inspecting grinding marks formed on a workpiece.

將矽、SiC、藍寶石等材料所構成之各種平板狀工件用研削磨石加以研削、或用研磨墊加以研磨之類的加工手法已為人所悉知。該研削磨石,係將金剛石等磨粒由樹脂或金屬等結合材料予以固定所形成。另外,不織布或胺基甲酸酯(urethane)墊所構成之該研磨墊,係與磨粒一同用於對工件的被研磨面進行研磨。Processing methods such as grinding various flat-shaped workpieces made of silicon, SiC, sapphire and the like with a grinding grindstone or grinding with a polishing pad have been known. The grinding stone is formed by fixing abrasive grains such as diamond with a bonding material such as resin or metal. In addition, the polishing pad composed of a non-woven cloth or a urethane pad is used together with abrasive grains to polish the surface to be polished of a workpiece.

利用研削磨石的研削加工或利用研磨墊的研磨加工當中,由研削磨石或研磨墊與工件接觸來進行加工。在這種加工之中,從研削磨石脫落的磨粒、從工件研削下來的研削屑或凝聚的磨粒,可能會進入研削磨石或研磨墊與工件之間,若繼續進行加工則會在工件上形成又深又長的研削痕跡(刮痕)。In a grinding process using a grinding grindstone or a grinding process using a grinding pad, the grinding grindstone or the grinding pad is brought into contact with a workpiece to perform processing. In this kind of processing, the abrasive particles falling from the grinding stone, the grinding chips from the workpiece, or the aggregated abrasive particles may enter between the grinding stone or the polishing pad and the workpiece. Deep and long grinding marks (scratches) are formed on the workpiece.

若對有該研削痕形成之工件進行分割來形成各個元件晶片,則元件晶片之抗折強度就會降低。於是乎,有人提出以下方法:對加工中或是加工後之工件進行攝像來檢測研削痕、或是對工件照射雷射光再根據所反射雷射光之強度來檢測研削痕。 [習知技術文獻] [專利文獻]If a workpiece having the grinding marks formed is divided to form each element wafer, the flexural strength of the element wafer is reduced. Therefore, some people have proposed the following methods: take pictures of the workpiece during or after processing to detect the grinding marks, or irradiate the workpiece with laser light to detect the grinding marks based on the intensity of the reflected laser light. [Habitual technical literature] [patent literature]

[專利文獻1] 日本特開2016-49581號公報 [專利文獻2] 日本特開2010-17792號公報[Patent Document 1] Japanese Patent Application Publication No. 2016-49581 [Patent Document 2] Japanese Patent Application Publication No. 2010-17792

[發明所欲解決的課題] 然而,無論是實施何種方法,能做到研削痕檢測之裝置的構成很複雜,另外,該裝置價格高昂乃是問題。[Problems to be Solved by the Invention] However, no matter which method is implemented, the configuration of a device capable of detecting grinding marks is complicated, and the high cost of the device is a problem.

本發明係鑒於上開問題點而完成,其目的在於提供一種:可更適當更適當地對工件的被加工面上形成的研削痕(刮痕)等凹凸狀態進行檢測之工件的檢查方法、工件的檢查裝置及加工裝置。 [解決課題的技術手段]The present invention has been made in view of the problem of opening, and an object of the present invention is to provide a work piece inspection method and a work piece that can more appropriately and more appropriately detect irregularities such as grinding marks (scratches) formed on a work surface of a work piece. Inspection equipment and processing equipment. [Technical means to solve the problem]

根據本發明的第1態樣,提供一種工件的檢查方法,其特點為具備:加工步驟,係用研削磨石或研磨墊對工件進行加工;投影步驟,係將來自光源的光照射在該工件的被加工面,而該被加工面所反射的該光抵達螢幕,藉此將反映了該加工步驟之中被加工面上所形成的凹凸的狀態之投影影像予以映照在該螢幕;攝像步驟,係對該螢幕的該投影影像進行攝像來形成攝像圖像;及判定步驟,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。According to a first aspect of the present invention, there is provided a method for inspecting a workpiece, which is characterized by comprising: a processing step for processing the workpiece with a grinding stone or a polishing pad; a projection step for irradiating light from a light source on the workpiece The processed surface, and the light reflected by the processed surface reaches the screen, thereby projecting an image reflecting the state of the unevenness formed on the processed surface in the processing step onto the screen; the imaging step, The projection image of the screen is captured to form a captured image; and the determining step is to grasp the uneven state of the workpiece based on the captured image, and then determine whether the workpiece is good or bad.

根據本發明的第2態樣,提供一種工件的檢查方法,其特點為具備:加工步驟,係用研削磨石或研磨墊對工件進行加工;攝像步驟,係將來自光源的光照射在該工件的被加工面,而對該被加工面所反射的該光進行攝像,藉此形成攝像圖像,該攝像圖像寫入反映了該加工步驟之中被加工面上所形成凹凸的狀態之影像;及判定步驟,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。According to a second aspect of the present invention, there is provided a method for inspecting a workpiece, which is characterized by comprising: a processing step for processing the workpiece with a grinding stone or a polishing pad; and an imaging step for irradiating light from a light source on the workpiece The processed surface is photographed, and the light reflected from the processed surface is captured to form a captured image, and the captured image is written into an image reflecting the state of unevenness formed on the processed surface in the processing step ; And a determining step of grasping the uneven state of the workpiece based on the captured image, and then determining whether the workpiece is good or bad.

根據本發明的第3態樣,提供如本發明的第1態樣或是第2態樣有關之工件的檢查方法,其特點為:該攝像圖像中,寫入包含該被加工面中心之該被加工面的中央區域,且在該攝像圖像中,未寫入圍繞該中央區域之該被加工面的外周區域。According to a third aspect of the present invention, there is provided a method for inspecting a workpiece related to the first aspect or the second aspect of the present invention, which is characterized in that: the camera image is written into the image including the center of the processed surface. A central region of the processed surface, and in the captured image, no peripheral region of the processed surface surrounding the central region is written.

根據本發明的第4態樣,提供一種工件的檢查裝置,其特點為具備:保持台,係在暴露研削磨石或研磨墊加工之工件的被加工面之狀態下,保持該工件;光源,係將光照射在該保持台所保持之該工件的被加工面;螢幕,係受該被加工面所反射的該光照射,藉此映照出反映了該工件的該被加工面上由該加工所形成的凹凸的狀態之投影影像;及攝像單元,係對該螢幕所映照之投影影像進行攝像來形成攝像圖像。According to a fourth aspect of the present invention, there is provided an inspection device for a workpiece, which is provided with a holding table for holding the workpiece in a state in which a workpiece to be processed by a grinding stone or a polishing pad is exposed; a light source, The light is irradiated on the processed surface of the workpiece held by the holding table; the screen is irradiated by the light reflected by the processed surface, thereby reflecting the processed surface reflecting the workpiece by the processing office. A projection image of the formed unevenness; and an imaging unit for imaging the projection image projected on the screen to form a captured image.

根據本發明的第5態樣,提供一種工件的檢查裝置,其特點為具備:保持台,係在暴露研削磨石或研磨墊加工之工件的被加工面之狀態下,保持該工件;光源,係將光照射在該保持台所保持之該工件的被加工面;及攝像單元,係對該被加工面所反射的該光進行檢測來形成攝像圖像。According to a fifth aspect of the present invention, there is provided an inspection device for a workpiece, which is characterized by comprising: a holding table for holding the workpiece in a state where a workpiece to be processed by a grinding stone or a polishing pad is exposed; a light source, The light is irradiated on the processed surface of the workpiece held by the holding table; and the camera unit detects the light reflected from the processed surface to form a captured image.

在本發明的第4態樣及第5態樣之中,該工件的檢查裝置亦可更具備:判定單元,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。該判定單元,亦可在包含該被加工面中心的中央區域、與圍繞該中央區域的外周區域,檢測出連續的該凹凸時,將該工件判定為不良品。In the fourth aspect and the fifth aspect of the present invention, the workpiece inspection device may further include: a determination unit that grasps the uneven state of the workpiece based on the captured image, and further determines whether the workpiece is good or bad Or not. The determining unit may determine the workpiece as a defective product when the continuous unevenness is detected in a central region including the center of the surface to be processed and an outer peripheral region surrounding the central region.

在本發明的第4態樣及第5態樣之中,亦可為:該攝像圖像中,寫入包含該被加工面中心之該被加工面的中央區域;該攝像圖像中,未寫入圍繞該中央區域之該被加工面的外周區域。In the fourth aspect and the fifth aspect of the present invention, the captured image may be written in a central area of the processed surface including the center of the processed surface; A peripheral area of the processed surface surrounding the central area is written.

本發明一態樣亦為一種加工裝置,其特點在於具備:卡盤台,係保持工件;加工單元,係用該研削磨石或是該研磨墊對該卡盤台所保持之該工件進行加工;清洗單元,係對經加工之該工件的被加工面進行清洗;及檢查單元,係對經清洗之該工件的該被加工面上形成的加工痕跡之凹凸狀態進行檢查;其中,該檢查單元,為和本發明有關之工件的檢查裝置。 [發明功效]One aspect of the present invention is also a processing device, which is characterized by: a chuck table that holds a workpiece; a processing unit that uses the grinding stone or the polishing pad to process the workpiece held by the chuck table; The cleaning unit is used to clean the processed surface of the processed workpiece; and the inspection unit is used to check the uneven state of the processing marks formed on the processed surface of the cleaned workpiece; wherein, the inspection unit, It is an inspection device for a workpiece related to the present invention. [Inventive effect]

根據本發明一態樣有關之檢查方法、檢查裝置及加工裝置,可基於使用包含光源、螢幕或凹面鏡之簡便構成所攝像到之攝像圖像,來掌握工件的被加工面上由加工所形成之研削痕(刮痕)等凹凸狀態。該攝像圖像之攝像中,使用從光源照射在工件的被加工面並從該被加工面反射出的光。According to the inspection method, inspection device and processing device related to one aspect of the present invention, based on the captured image using a simple structure including a light source, a screen, or a concave mirror, it is possible to grasp the processing surface of the workpiece formed by processing. Grinding unevenness such as scratches (scratches). In this imaging of the captured image, light that is irradiated from the light source onto the work surface of the workpiece and is reflected from the work surface is used.

若工件的被加工面上因加工而形成了凹凸,則利用照射在該被加工面反射出的光所形成之攝像圖像中,寫入強調該凹凸狀態之影像。因此,可便於掌握被加工面上所形成凹凸的狀態,可便於檢查工件。當確認了工件的被加工面有超出容許程度之凹凸形成時,可將該工件判定為不良品,並停止加工,去確認研削磨石或研磨墊之狀態。When unevenness is formed on the work surface of the workpiece due to processing, an image that emphasizes the unevenness state is written in a captured image formed by irradiating light reflected from the work surface. Therefore, it is possible to easily grasp the state of the unevenness formed on the machined surface, and it is easy to inspect the workpiece. When it is confirmed that the processed surface of the workpiece has unevenness that exceeds the allowable level, the workpiece can be judged as a defective product and the processing can be stopped to check the state of the grinding stone or polishing pad.

從而,根據本發明一態樣,會提供一種可更適當更便於對工件的被加工面上形成的研削痕(刮痕)等凹凸狀態進行檢測之工件的檢查方法、工件的檢查裝置及加工裝置。Therefore, according to one aspect of the present invention, a work piece inspection method, a work piece inspection device, and a machining device that can more appropriately and more easily detect irregularities such as grinding marks (scratches) formed on a work surface of a work piece are provided. .

參照附圖,對本發明一態樣有關之實施形態進行說明。圖1(A)係示意性表示本發明一態樣有關之實施形態之工件的檢查方法、工件的檢查裝置、或是加工裝置之中的工件的立體圖。Embodiments related to one aspect of the present invention will be described with reference to the drawings. FIG. 1 (A) is a perspective view schematically showing a workpiece inspection method, a workpiece inspection device, or a workpiece in a processing device according to an embodiment of the present invention.

圖1(A)中,示意性表示了工件1。該工件1,係例如矽、SiC(碳化矽),又或是其他半導體等材料,或是藍寶石、玻璃、石英等材料所構成之略呈圓板狀之基板。In FIG. 1 (A), the workpiece 1 is schematically shown. The workpiece 1 is, for example, a substrate made of silicon, SiC (silicon carbide), other semiconductors, or materials such as sapphire, glass, and quartz.

工件1的表面1a由成格子狀排列之多條分割預定線(切割槽)3劃分為多個區域,由該多條分割預定線3劃分出的各區域中形成有IC等元件5。最後,將工件1沿著切割槽3加以分割,而形成各個元件晶片。The surface 1 a of the workpiece 1 is divided into a plurality of regions by a plurality of predetermined division lines (cutting grooves) 3 arranged in a grid pattern, and elements 5 such as ICs are formed in the regions divided by the plurality of predetermined division lines 3. Finally, the workpiece 1 is divided along the dicing groove 3 to form each element wafer.

接著,就該工件1的表面1a所黏貼之保護膠帶,利用圖1(B)加以說明。圖1(B)中,示意性表示了保護膠帶7。保護膠帶7,具有保護該工件1的表面1a上形成的元件5等之功能。保護膠帶7,保護工件1的表面1a側免於對工件1的背面進行加工或搬送等情況下造成的衝撃,防止元件5產生損傷。Next, the protective tape adhered to the surface 1a of the workpiece 1 will be described using FIG. 1 (B). In FIG. 1 (B), the protective tape 7 is shown typically. The protective tape 7 has a function of protecting the elements 5 and the like formed on the surface 1 a of the workpiece 1. The protective tape 7 protects the surface 1a side of the workpiece 1 from punching caused when the back surface of the workpiece 1 is processed or transported, and prevents the element 5 from being damaged.

保護膠帶7具有:具有可撓性之膠膜狀基材、及在該基材的其中一面上形成的黏糊層(接著劑層)。例如,基材使用PO(聚烯烴)。亦可使用剛性高於PO之PET(聚對苯二甲酸乙二醇酯)、聚氯乙烯、聚苯乙烯等。另外,黏糊層(接著劑層)使用例如矽氧橡膠、丙烯酸類材料、環氧類材料等。The protective tape 7 includes a flexible film-like base material and a sticky layer (adhesive layer) formed on one surface of the base material. For example, the substrate uses PO (polyolefin). PET (polyethylene terephthalate), polyvinyl chloride, polystyrene, etc., which have higher rigidity than PO, can also be used. The adhesive layer (adhesive layer) is made of, for example, silicone rubber, acrylic material, epoxy material, or the like.

接著,說明組裝有對形成凹凸的工件1進行檢查之檢查裝置的加工裝置。圖2係示意性表示作為包含檢查裝置的加工裝置之構成例的研削裝置的立體圖。Next, a processing device incorporating an inspection device for inspecting the uneven workpiece 1 will be described. FIG. 2 is a perspective view schematically showing a grinding device as a configuration example of a processing device including an inspection device.

研削裝置2,在略長方體狀的基台4上具備:安裝於圓盤狀旋轉台6上的卡盤台8、研削單元10及研削單元10a。基台4的後部立設有支柱12及支柱12a,該支柱12及支柱12a分別設有研削單元10及研削單元10a。The grinding device 2 includes, on a slightly rectangular parallelepiped base 4, a chuck table 8 mounted on a disc-shaped rotary table 6, a grinding unit 10, and a grinding unit 10 a. A pillar 12 and a pillar 12 a are erected at the rear of the abutment 4. The pillar 12 and the pillar 12 a are respectively provided with a grinding unit 10 and a grinding unit 10 a.

基台4上,設有可於水平面内中旋轉之圓盤狀旋轉台6。旋轉台6的上表面,具備有於圓周方向相隔120度的3個卡盤台8,藉由旋轉台6的旋轉,讓各卡盤台8分別定位於工件搬入搬出區域、第1研削區域、第2研削區域。在第1研削區域當中,實施例如粗研削;在第2研削區域當中,實施例如精細研削。The base 4 is provided with a disc-shaped rotary table 6 that can rotate in the horizontal plane. The upper surface of the rotary table 6 is provided with three chuck tables 8 spaced 120 degrees apart in the circumferential direction. By the rotation of the rotary table 6, each chuck table 8 is positioned in the work loading and unloading area, the first grinding area, 2nd grinding area. In the first grinding area, for example, rough grinding is performed, and in the second grinding area, for example, fine grinding is performed.

卡盤台8内部具有一端與吸引源(未圖示)相連之吸引通道(未圖示),該吸引通道之另一端與卡盤台8上的保持面8a相連。該保持面8a由多孔質構件所構成,由該吸引源產生的負壓通過該多孔質構件作用於該保持面8a上載置的工件1,使得卡盤台8吸引保持工件。The chuck table 8 has a suction channel (not shown) connected at one end to a suction source (not shown), and the other end of the suction channel is connected to the holding surface 8 a on the chuck table 8. The holding surface 8a is composed of a porous member, and the negative pressure generated by the suction source acts on the workpiece 1 placed on the holding surface 8a through the porous member, so that the chuck table 8 attracts and holds the workpiece.

研削單元10具備:由主軸馬達14所旋轉驅動之研削輪16所保持之研削磨石18。研削單元10a具備:由主軸馬達14a所旋轉驅動之研削輪16a所保持之研削磨石18a。該研削輪16、16a所保持之研削磨石18、18a,係藉由加工進給單元20、20a上下移動,來和卡盤台8上所保持之工件1接觸,將該工件1研削成預定的厚度。The grinding unit 10 includes a grinding stone 18 held by a grinding wheel 16 which is rotationally driven by a spindle motor 14. The grinding unit 10a includes a grinding stone 18a held by a grinding wheel 16a that is rotationally driven by a spindle motor 14a. The grinding wheels 18, 18a held by the grinding wheels 16, 16a are moved up and down by the processing feed units 20, 20a to contact the workpiece 1 held on the chuck table 8, and the workpiece 1 is ground into a predetermined shape. thickness of.

基台4之前側部分比設有旋轉台8的部分更高,基台4之前端固定有卡匣載置台22、22a。卡匣載置台22上載置收納了研削加工前的工件1之卡匣22,卡匣載置台22a載置用以收納研削完畢的工件1之卡匣24a。The front portion of the base 4 is higher than the portion on which the rotary table 8 is provided, and the cassette mounting bases 22 and 22a are fixed to the front end of the base 4. The cassette mounting table 22 mounts a cassette 22 that stores the workpiece 1 before grinding and processing, and the cassette mounting table 22 a mounts a cassette 24 a that stores the workpiece 1 after grinding.

工件搬送機械臂26與卡匣載置台22、22a相鄰安裝於基台4上。基台4之前側部分進一步配設有:具有多個定位銷之定位台28、工件搬入機構(裝載臂)30、工件搬出機構(卸載臂)32、對已研削工件進行清洗及旋轉乾燥之旋轉清洗裝置34。The work transfer robot arm 26 is mounted on the base 4 adjacent to the cassette mounting tables 22 and 22a. The front part of the abutment 4 is further equipped with a positioning table 28 having a plurality of positioning pins, a work-in mechanism (loading arm) 30, a work-out mechanism (unloading arm) 32, and a rotation for cleaning and rotating drying of the ground workpiece洗 装置 34。 Washing device 34.

研削裝置2具備:在該旋轉清洗裝置34與卡匣載置台22a之間的本實施形態有關之檢查裝置36。該檢查裝置36具備:保持所要檢查的工件1之保持台38、光源40、螢幕42、攝像單元44。The grinding device 2 includes an inspection device 36 according to the present embodiment between the rotary cleaning device 34 and the cassette mounting table 22a. The inspection device 36 includes a holding table 38 that holds the workpiece 1 to be inspected, a light source 40, a screen 42, and an imaging unit 44.

在保持台38之斜上方,配置有用以對保持台38所保持之工件1全體發光之光源40。作為光源40,使用例如白熾燈泡或LED。不過,光源40的種類或位置等並未有限制。另外,該光可為平行光亦可為非平行光。若該光採用平行光,例如,可對於光源40組合凹面鏡等光學元件。另外,亦可使用發光區域較小、而被視為點光源之光源,來取得平行光或非平行光。Above the holding table 38, a light source 40 is arranged to emit light to the entire workpiece 1 held by the holding table 38. As the light source 40, for example, an incandescent light bulb or an LED is used. However, the type, position, and the like of the light source 40 are not limited. The light may be parallel light or non-parallel light. If the light is parallel light, for example, an optical element such as a concave mirror may be combined with the light source 40. In addition, a light source having a small light emitting area and being regarded as a point light source may be used to obtain parallel light or non-parallel light.

工件1所反射之光的路徑(光路)上,設有藉由反射後的該光照射以形成投影影像之螢幕42。螢幕42,具代表性的是平坦螢幕,形成為大致與工件1相同的尺寸或大致能顯示工件中央區域的尺寸。在該被加工面因加工所形成之凹凸較容易通過工件中央區域,所以若使用例如可投影工件中心附近之直徑約50mm範圍之螢幕,則較易於確認該凹凸狀態。On the path (light path) of the light reflected by the workpiece 1, a screen 42 is formed by irradiating the reflected light to form a projection image. The screen 42 is typically a flat screen, and is formed to have a size substantially the same as that of the work 1 or a size capable of displaying the center area of the work. The unevenness formed by machining on the surface to be processed easily passes through the center area of the workpiece. Therefore, if a screen with a diameter of about 50 mm near the center of the workpiece can be projected, it is easier to confirm the unevenness state.

本實施形態當中,在保持台38之斜上方配置光源40,並且在工件1所反射之光的路徑上配置螢幕42。若對工件1發射從光源40往斜下方前進之光,則該光會被工件1之暴露面(在此為背面11b)所反射,照射在螢幕42。結果,螢幕42上,形成反映了工件1的暴露面(亦即背面1b)之狀態的投影影像。In the present embodiment, the light source 40 is arranged diagonally above the holding table 38, and the screen 42 is arranged on the path of the light reflected by the workpiece 1. When the workpiece 1 is radiated with light advancing obliquely downward from the light source 40, the light will be reflected by the exposed surface (here, the back surface 11b) of the workpiece 1 and illuminate the screen 42. As a result, a projection image reflecting the state of the exposed surface (that is, the back surface 1 b) of the workpiece 1 is formed on the screen 42.

在可看到螢幕42之位置,配置有用以對螢幕42上形成之投影影像進行攝像以形成攝像圖像之攝像單元(攝像手段)44。該攝像單元44,係例如CCD或CMOS等攝像元件與鏡片等光學元件組合之數位相機,將對投影影像進行攝像所形成之攝像圖像(影像)往外部輸出。再者,作為該攝像單元44,亦可使用形成靜像之數位靜像攝影機、形成動畫之數位攝影機之任一者。At a position where the screen 42 can be seen, an imaging unit (imaging means) 44 configured to capture a projection image formed on the screen 42 to form a captured image is disposed. The imaging unit 44 is a digital camera that combines an imaging element such as a CCD or CMOS with an optical element such as a lens, and outputs a captured image (image) formed by capturing a projection image to the outside. In addition, as the imaging unit 44, either a digital still camera that forms a still image or a digital camera that forms an animation can be used.

在此,用圖4就螢幕42之傾斜角進行說明。圖4中,示意性表示了光源40、工件1、螢幕42、攝像單元44之相關位置。如圖4所示,較佳為工件1的背面1b所反射之該光會垂直入射於螢幕42,以此方式讓螢幕42傾斜。Here, the tilt angle of the screen 42 will be described with reference to FIG. 4. In FIG. 4, the relevant positions of the light source 40, the workpiece 1, the screen 42, and the camera unit 44 are schematically shown. As shown in FIG. 4, it is preferable that the light reflected from the back surface 1 b of the workpiece 1 is incident on the screen 42 perpendicularly, thereby tilting the screen 42.

亦即,將螢幕42傾斜以使:入射於工件1之光與該背面1b所成角度、反射光與該背面1b所成角度、和工件1的背面1b之垂直面與螢幕42的傾斜角度、一致(即三個角度一致)。在此情形,可將極度變形的微小投影影像投影於螢幕42,所以可更正確掌握工件1的背面1b上形成凹凸的狀態。此時,為了讓攝像單元44攝像所形成之攝像圖像清晰化,要適當地調整攝像單元44之景深。That is, the screen 42 is tilted so that the angle of the light incident on the workpiece 1 and the back surface 1b, the angle of the reflected light and the back surface 1b, and the tilt angle of the vertical surface of the back surface 1b of the workpiece 1 and the screen 42, Consistent (that is, the three angles are consistent). In this case, since a minute projection image that is extremely deformed can be projected on the screen 42, it is possible to more accurately grasp the state of the unevenness formed on the back surface 1b of the workpiece 1. At this time, in order to make the captured image formed by the imaging unit 44 clear, the depth of field of the imaging unit 44 needs to be appropriately adjusted.

攝像單元44,與判定單元(未圖示)相連,其用以由攝像單元44所輸出之攝像圖像來確認在工件1的被加工面(背面1b) 因加工而形成之凹凸的狀態,並根據該凹凸狀態來判定工件1之好壞與否。The imaging unit 44 is connected to a determination unit (not shown). The imaging unit 44 is used for confirming the state of irregularities formed on the processed surface (back surface 1b) of the workpiece 1 by processing the captured image output from the imaging unit 44. Whether the workpiece 1 is good or bad is determined based on the uneven state.

再者,檢查裝置36,亦可具備凹面鏡以取代螢幕42。若具備凹面鏡而取代螢幕42,則可藉由該凹面鏡將從該工件1的被加工面反射之光聚光於攝像單元44。因此,抵達攝像單元44之光量增加,攝像單元44可形成更清晰的攝像圖像。The inspection device 36 may be provided with a concave mirror instead of the screen 42. If a concave mirror is provided instead of the screen 42, the light reflected from the processed surface of the workpiece 1 can be focused on the imaging unit 44 by the concave mirror. Therefore, the amount of light reaching the imaging unit 44 increases, and the imaging unit 44 can form a clearer captured image.

另外,本實施形態有關之加工裝置,不一定是藉由具備研削磨石的研削單元來研削工件之研削裝置,也可以是藉由具備研磨墊的研磨單元來研磨工件之研磨裝置。In addition, the processing device according to this embodiment is not necessarily a grinding device for grinding a workpiece by a grinding unit having a grinding stone, but may be a grinding device for grinding a workpiece by a grinding unit provided with a polishing pad.

接著,就由研削裝置2中所具備的檢查裝置36實施之本實施形態有關之工件的檢查方法進行說明。該檢查方法當中,首先,實施用研削磨石或研磨墊對工件加工之加工步驟。Next, a method for inspecting a workpiece according to this embodiment performed by the inspection device 36 provided in the grinding device 2 will be described. In this inspection method, first, a processing step of processing a workpiece with a grinding stone or a polishing pad is performed.

就該加工步驟,利用圖3(A)及圖3(B)加以說明。圖3(A)係示意性表示研削加工的側視圖,圖3(B)係示意性表示研磨加工的側視圖。This processing step will be described with reference to FIGS. 3 (A) and 3 (B). FIG. 3 (A) is a side view schematically showing a grinding process, and FIG. 3 (B) is a side view schematically showing a grinding process.

首先,如圖3(A)所表示,就藉由研削裝置2中所具備之研削單元10對工件1的背面1b側進行研削加工之情形加以說明。在表面1a側朝向下方之狀態下隔著保護膠帶7將工件1載於卡盤台8之保持面8a上。接著,使工件1吸引保持於卡盤台8,讓工件1的背面1b側暴露於上方。使研削裝置2之旋轉台6(參照圖2)旋轉,讓卡盤台8定位於研削單元10之下方。First, as shown in FIG. 3 (A), the case where the grinding process of the back surface 1b side of the workpiece 1 by the grinding unit 10 provided in the grinding apparatus 2 is demonstrated. The workpiece 1 is placed on the holding surface 8 a of the chuck table 8 with the protective tape 7 in a state where the surface 1 a side faces downward. Next, the workpiece 1 is sucked and held on the chuck table 8, and the back surface 1 b side of the workpiece 1 is exposed upward. The rotating table 6 (see FIG. 2) of the grinding device 2 is rotated to position the chuck table 8 below the grinding unit 10.

接著,使研削單元10之主軸馬達14作動,讓研削輪16旋轉。另外,讓卡盤台8繞著與保持面8a垂直的軸周圍旋轉。接著,使加工進給單元20作動,讓研削輪16朝著工件1下降,當旋轉的研削輪16上裝設之研削磨石18與工件1的背面1b側觸碰時,對工件1進行研削加工。當研削磨石18藉加工進給單元20定位於預定高度位置時,將工件1薄化至預定的厚度。Next, the spindle motor 14 of the grinding unit 10 is operated to rotate the grinding wheel 16. In addition, the chuck table 8 is rotated around an axis perpendicular to the holding surface 8a. Next, the processing feed unit 20 is operated to lower the grinding wheel 16 toward the workpiece 1. When the grinding grindstone 18 mounted on the rotating grinding wheel 16 touches the back surface 1b side of the workpiece 1, the workpiece 1 is ground. machining. When the grinding stone 18 is positioned at a predetermined height position by the processing feed unit 20, the workpiece 1 is thinned to a predetermined thickness.

再者,加工步驟當中,如圖3(B)所表示,亦可藉由研磨單元10b對工件1的背面1b側進行研磨加工。該研磨單元10b具備於研削裝置2中,以取代例如圖2所表示之研削裝置2的研削單元10a。再者,該研磨單元10b,亦可具備在不含研削單元之研磨裝置當中。In addition, in the processing steps, as shown in FIG. 3 (B), the back surface 1b side of the workpiece 1 may be polished by the polishing unit 10b. This grinding unit 10b is provided in the grinding apparatus 2 instead of the grinding unit 10a of the grinding apparatus 2 shown in FIG. 2, for example. The polishing unit 10b may be provided in a polishing device that does not include a grinding unit.

該研磨單元10b具有裝設於研磨輪16b之研磨墊18b。使一端與該研磨輪16b相連且與主軸另一端相連之主軸馬達(未圖示)作動,藉以讓研磨輪16b旋轉。The polishing unit 10b includes a polishing pad 18b mounted on a polishing wheel 16b. A spindle motor (not shown) connected to the grinding wheel 16b at one end and connected to the other end of the spindle is operated to rotate the grinding wheel 16b.

利用研磨單元10b進行研磨加工的時,與上述的研削加工同樣,在工件1的表面1a側朝向卡盤台8之狀態下隔著保護膠帶7將工件1載於卡盤台8之保持面8a上。接著,使工件1吸引保持於卡盤台8,讓工件1的背面1b側暴露於上方。When grinding is performed by the grinding unit 10b, the workpiece 1 is placed on the holding surface 8a of the chuck table 8 through the protective tape 7 with the protective tape 7 facing the chuck table 8 side of the workpiece 1 in the same manner as the above-mentioned grinding process. on. Next, the workpiece 1 is sucked and held on the chuck table 8, and the back surface 1 b side of the workpiece 1 is exposed upward.

接著,使研磨輪16b旋轉,讓卡盤台8繞著與保持面8a垂直的軸周圍旋轉,讓研磨輪16b朝著工件1下降。當該研磨輪16b上裝設之研磨墊18b與該工件1的背面1b側觸碰時,實施研磨加工。Next, the grinding wheel 16 b is rotated, the chuck table 8 is rotated around an axis perpendicular to the holding surface 8 a, and the grinding wheel 16 b is lowered toward the workpiece 1. When the polishing pad 18b mounted on the polishing wheel 16b touches the back surface 1b side of the workpiece 1, a polishing process is performed.

利用研削磨石18的研削加工或利用研磨墊18b的研磨加工當中,從研削磨石18脫落的磨粒、從工件1研削下的研削屑或凝聚的磨粒,可能會進入研削磨石18或研磨墊18b與工件1之間,若繼續進行加工則會在工件1上形成又深又長的研削痕(刮痕)。若對有該研削痕形成之工件1進行分割而形成各個元件晶片,元件晶片之抗折強度就會降低,作為元件無法發揮功能,變成不良品。During the grinding process using the grinding stone 18 or the grinding process using the polishing pad 18b, the abrasive particles falling from the grinding stone 18, the grinding chips or the aggregated abrasive particles ground from the workpiece 1, may enter the grinding stone 18 or Between the polishing pad 18 b and the workpiece 1, if machining is continued, deep and long grinding marks (scratch marks) will be formed on the workpiece 1. If the workpiece 1 formed by the grinding marks is divided to form each element wafer, the flexural strength of the element wafer will be reduced, and it will not function as an element and become defective.

因此,在本實施形態有關之工件的檢查方法當中,接著實施投影步驟、攝像步驟、判定步驟,以掌握工件1的被加工面上形成的研削痕(刮痕)等凹凸狀態,來判定工件之好壞與否。Therefore, in the method for inspecting a workpiece according to this embodiment, a projection step, an imaging step, and a judging step are subsequently performed to grasp the uneven state such as a grinding mark (scratch) formed on the processed surface of the workpiece 1 to determine the Good or bad.

投影步驟當中,係將光照射在加工完畢之工件1的被加工面,並將所反射之光投影於螢幕。首先,將加工完畢之工件1從卡盤台8上移往檢查裝置36(參照圖2)之保持台38。在此過程中,藉由旋轉清洗裝置34清洗工件1之該被加工面。在工件1的表面1a側朝向保持台38之狀態下隔著保護膠帶7將工件1置於保持台38上,讓被加工面(背面1b)暴露於上方。In the projection step, light is irradiated onto the processed surface of the processed workpiece 1, and the reflected light is projected on the screen. First, the processed workpiece 1 is moved from the chuck table 8 to the holding table 38 of the inspection device 36 (see FIG. 2). In this process, the processed surface of the workpiece 1 is cleaned by the rotary cleaning device 34. The workpiece 1 is placed on the holding table 38 via the protective tape 7 with the front surface 1a side of the workpiece 1 facing the holding table 38, and the processed surface (back surface 1b) is exposed upward.

接著,如圖4所表示,從光源40發射光46。光源40,係設置成光46可對於保持台38所保持之工件1全體進行照射之態樣(位置、朝向等)。所以,從光源40發射之光46,會被工件1的被加工面(背面1b)反射。Next, as shown in FIG. 4, light 46 is emitted from the light source 40. The light source 40 is provided in a state where the light 46 can irradiate the entire workpiece 1 held by the holding table 38 (position, orientation, etc.). Therefore, the light 46 emitted from the light source 40 is reflected by the processed surface (back surface 1b) of the workpiece 1.

另外,在被工件1反射之光46的路徑上,配置有螢幕42。因此,被工件1的被加工面(背面1b)反射之光46,會照射在螢幕42,形成與該被加工面上因加工所形成凹凸的狀態相應之投影影像。在此,被工件1反射之光46與背面1b所成角度,和螢幕42與加工物1的被加工面的垂直面之傾斜角一致時,該投影影像之變形變得極低。A screen 42 is arranged on the path of the light 46 reflected by the workpiece 1. Therefore, the light 46 reflected by the processed surface (back surface 1b) of the workpiece 1 is irradiated on the screen 42 to form a projection image corresponding to the state of the unevenness formed by the processing on the processed surface. Here, when the angle formed by the light 46 reflected by the workpiece 1 and the back surface 1 b coincides with the inclination angle of the screen 42 and the vertical plane of the processed surface of the workpiece 1, the distortion of the projection image becomes extremely low.

之後,實施攝像步驟。用攝像單元44對該投影影像進行攝像,而形成攝像圖像。此時,為了讓該攝像圖像清晰化,要適當地調整攝像單元(攝像機)44之景深。接著,將攝像單元44所形成之攝像圖像送往判定單元(未圖示)。After that, an imaging step is performed. This projection image is captured by the imaging unit 44 to form a captured image. At this time, in order to make the captured image clear, the depth of field of the camera unit (camera) 44 is appropriately adjusted. Next, the captured image formed by the imaging unit 44 is sent to a determination unit (not shown).

在攝像步驟之後,實施判定步驟:根據攝像單元44所形成之該攝像圖像,來掌握該工件的該凹凸狀態,進而判定工件的好壞與否。在本實施形態之中,該檢查裝置36之攝像單元44所形成的攝像圖像所寫入的投影影像是投影在螢幕42而非工件1的被加工面(背面1b)。After the image capturing step, a determining step is performed: according to the captured image formed by the image capturing unit 44 to grasp the uneven state of the workpiece, and then determine whether the workpiece is good or bad. In this embodiment, the projection image written in the captured image formed by the imaging unit 44 of the inspection device 36 is projected on the screen 42 instead of the processed surface (back surface 1b) of the workpiece 1.

該投影影像,係照射在工件的被加工面之光46被該被加工面反射而照射在螢幕42所形成的影像。在此,該被加工面大致為鏡面,光46於該被加工面被鏡面反射,但在該被加工面有微小凹凸形成之情況,該光46會受該凹凸影響而部分地擴散或收斂。The projection image is an image formed by the light 46 irradiated on the work surface of the workpiece being reflected by the work surface and irradiating the screen 42. Here, the surface to be processed is substantially a mirror surface, and light 46 is specularly reflected on the surface to be processed. However, when a slight unevenness is formed on the surface to be processed, the light 46 is partially diffused or converged due to the unevenness.

因此,該投影影像,會是反映了該被加工面上所形成微小凹凸的狀態之有明暗對比的影像。再者,這種將被鏡面反射的光投影在螢幕等,而在所形成的影像中反映了該鏡面的凹凸狀態之有明暗對比之顯像,係稱作魔鏡顯像。接著,相較於對該被加工面進行直接攝像所形成之攝像圖像,對投影在螢幕42的投影影像進行攝像所形成之攝像圖像,更能有效用於掌握被加工面上所形成該凹凸的狀態。因而藉由魔鏡顯像,來強調該凹凸狀態。Therefore, the projected image will be a light-dark contrast image reflecting the state of the minute unevenness formed on the processed surface. In addition, this type of projection of light reflected by a mirror on a screen or the like, which reflects the convex and concave state of the mirror in the formed image, is called a magic mirror image. Next, compared with a captured image formed by directly photographing the processed surface, a captured image formed by photographing a projection image projected on the screen 42 is more effective for grasping the formed image on the processed surface. Uneven state. Therefore, the concave-convex state is emphasized by the magic mirror display.

從而,可根據寫入該投影影像的該攝像圖像來更便於掌握該工件的該凹凸狀態。例如,被加工面未有凹凸形成時,該攝像圖像所寫入之被加工面全體的明亮度都一樣。另外,例如被加工面有凹凸形成時,該攝像圖像所寫入之投影影像會出現強調被加工面上所形成該凹凸的狀態之明暗圖案。也就是說,可從該攝像圖像掌握工件的凹凸狀態。Therefore, it is possible to more easily grasp the uneven state of the workpiece according to the captured image written in the projection image. For example, when unevenness is not formed on the processed surface, the brightness of the entire processed surface written in the captured image is the same. In addition, for example, when unevenness is formed on the processed surface, a light and dark pattern that emphasizes the state of the unevenness formed on the processed surface appears in the projection image written in the captured image. That is, the uneven state of the work can be grasped from the captured image.

不過,與攝像單元44相連之判定單元(未圖示),已預先登錄了條件:該條件用以根據由該攝像圖像掌握之被加工面的凹凸狀態,來判定是否能充分確保工件1之抗折強度。該判定單元,當工件1的抗折強度充足時,則將工件1判定為良品。另一方面,該判定單元,當因工件1的被加工面上所形成凹凸的狀態導致工件1的抗折強度不足時,則將該工件1判定為不良品。However, a determination unit (not shown) connected to the imaging unit 44 has previously registered a condition: this condition is used to determine whether the workpiece 1 can be sufficiently secured based on the unevenness of the processed surface grasped from the captured image. Flexural strength. This determination unit judges the work 1 as a good product when the bending strength of the work 1 is sufficient. On the other hand, the determination unit determines the work 1 as a defective product when the flexural strength of the work 1 is insufficient due to the unevenness formed on the processed surface of the work 1.

例如,該判定單元,在該工件1之包含該被加工面中心之中央區域、與圍繞該中央區域之外周區域,檢測出連續的凹凸(加工痕跡)時,將該工件1判定為不良品。在此,該中央區域,是指例如距離該被加工面中央約該工件半徑的3分之1到4分之1之位置的圓形區域;該外周區域,是指被加工面之該中央區域以外的區域。For example, the determination unit determines the workpiece 1 as a defective product when a continuous unevenness (processing trace) is detected in a central region of the workpiece 1 including the center of the surface to be processed and a peripheral region surrounding the central region. Here, the central area refers to, for example, a circular area at a distance of about one-third to one-fourth of the radius of the workpiece from the center of the processed surface; the peripheral area refers to the central area of the processed surface Outside the area.

該中央區域與該外周區域之連續的凹凸(加工痕跡),因在正常加工下難以形成,所以若檢測出這種凹凸,則可判定加工裝置發生了某些異常,所以判定單元將檢測到該凹凸之工件1判定為不良品。The continuous unevenness (processing marks) of the central area and the peripheral area is difficult to form under normal processing. If such unevenness is detected, it can be determined that some abnormality has occurred in the processing device, so the determination unit will detect the abnormality The uneven workpiece 1 was determined to be defective.

當判定單元將工件1判定為不良品時,不會將該工件1送往之後的製程,可予以廢棄。接著,在判定被加工面上形成的凹凸是因加工步驟之中的加工所產生時,則對加工步驟之中的加工條件等進行檢驗。或是,確認研削磨石或是研磨墊等有無異常。When the judging unit judges the workpiece 1 as a defective product, the workpiece 1 will not be sent to a subsequent process and can be discarded. Next, when it is determined that the unevenness formed on the processed surface is caused by the processing in the processing step, the processing conditions and the like in the processing step are checked. Or, check whether there are any abnormalities such as grinding stones or polishing pads.

若實施以上的工件的檢查方法,則可根據用簡便構成所形成之攝像圖像,便於掌握工件1的被加工面因加工所形成之加工痕跡(刮痕)等凹凸狀態。If the above-mentioned method for inspecting a workpiece is implemented, it is possible to easily comprehend the irregularities such as processing marks (scratches) formed on the machined surface of the workpiece 1 due to processing, according to the captured image formed by a simple configuration.

再者,上述實施形態當中,光從光源直接照射在工件1,但亦可使從光源發出的光照射在凹面鏡,並讓該凹面鏡所反射之平行光照射在工件1。就此情況,利用圖5(A)加以說明。Furthermore, in the above-mentioned embodiment, the light is directly irradiated to the workpiece 1 from the light source, but the light emitted from the light source may be irradiated to the concave mirror, and the parallel light reflected by the concave mirror may be irradiated to the workpiece 1. This case will be described using FIG. 5 (A).

圖5(A)係示意性表示檢查裝置36a之構成例的圖。圖5(A)所表示之檢查裝置36a,具備:光源40a、凹面鏡48a、保持台38a、螢幕42a、攝像單元44、個人電腦50。FIG. 5 (A) is a diagram schematically showing a configuration example of the inspection device 36a. The inspection device 36a shown in FIG. 5 (A) includes a light source 40a, a concave mirror 48a, a holding table 38a, a screen 42a, an imaging unit 44, and a personal computer 50.

該檢查裝置36a當中,從光源40a發出的光照射在凹面鏡48a。該凹面鏡48a將平行光朝保持台38a所保持之工件1反射。工件1受到該平行光照射時,會將該平行光朝螢幕42a反射,該螢幕42a上形成反映了該工件的該凹凸狀態之投影影像。攝像單元44將該投影影像予以形成,將攝像圖像送往個人電腦50。該個人電腦50,具有作為判定單元之功能,根據該攝像圖像來掌握該工件之該凹凸狀態,進而判定工件之好壞與否。In this inspection device 36a, the light emitted from the light source 40a is irradiated onto the concave mirror 48a. The concave mirror 48a reflects the parallel light toward the workpiece 1 held by the holding table 38a. When the workpiece 1 is irradiated with the parallel light, the parallel light is reflected toward the screen 42a, and a projection image reflecting the uneven state of the workpiece is formed on the screen 42a. The imaging unit 44 forms the projection image, and sends the captured image to the personal computer 50. The personal computer 50 has a function as a determination unit, and grasps the uneven state of the workpiece based on the captured image, and further determines whether the workpiece is good or bad.

還有,上述實施形態當中,使工件1所反射的光照射於螢幕而形成投影影像,並使攝像單元對該投影影像進行攝像而形成了攝像圖像。可是,亦可設置凹面鏡以取代該螢幕,使工件1所反射的光照射在該凹面鏡,並使該光朝著攝像單元聚光。就此情況,利用圖5(B)加以說明。In the above embodiment, a projection image is formed by irradiating the light reflected by the workpiece 1 on the screen, and the imaging unit captures the projection image to form a captured image. However, a concave mirror may be provided instead of the screen, so that the light reflected by the workpiece 1 is irradiated to the concave mirror, and the light is focused toward the imaging unit. This case will be described using FIG. 5 (B).

圖5(B)係示意性表示檢查裝置36b之構成例的圖。圖5(B)所表示之檢查裝置36b具備:光源40b、凹面鏡48b、保持台38b、凹面鏡48c、攝像單元44、個人電腦50。FIG. 5 (B) is a diagram schematically showing a configuration example of the inspection device 36b. The inspection device 36b shown in FIG. 5 (B) includes a light source 40b, a concave mirror 48b, a holding table 38b, a concave mirror 48c, an imaging unit 44, and a personal computer 50.

該檢查裝置36b當中,從光源40b發出的光照射在凹面鏡48b。該凹面鏡48b將平行光朝保持台38b所保持之工件1反射。工件1受到該平行光照射時,會將該平行光朝凹面鏡48c反射,該凹面鏡48c,讓照射在該凹面鏡48c之該平行光朝向攝像單元44反射並聚光。攝像單元44,檢測該凹面鏡48c所反射出的光。In this inspection device 36b, the light emitted from the light source 40b is irradiated onto the concave mirror 48b. The concave mirror 48b reflects the parallel light toward the workpiece 1 held by the holding table 38b. When the workpiece 1 is irradiated with the parallel light, the parallel light is reflected toward the concave mirror 48c, and the concave mirror 48c reflects and focuses the parallel light irradiated on the concave mirror 48c toward the imaging unit 44. The imaging unit 44 detects the light reflected by the concave mirror 48c.

攝像單元44將攝像所得之攝像圖像送往個人電腦50。該個人電腦50,具有作為判定單元之功能,根據該攝像圖像來掌握該工件之該凹凸狀態,進而判定工件之好壞與否。在此,該攝像圖像,並非是將工件1所反射的光照射在螢幕所形成之投影影像予以攝像之圖像,而是該光由凹面鏡48c所反射而聚光在攝像單元44之光被直接補捉到的圖像。The camera unit 44 sends the captured image obtained by the camera to the personal computer 50. The personal computer 50 has a function as a determination unit, and grasps the uneven state of the workpiece based on the captured image, and further determines whether the workpiece is good or bad. Here, the captured image is not an image captured by projecting an image formed by illuminating the light reflected by the workpiece 1 on the screen, but the light is reflected by the concave mirror 48c and condensed by the light of the imaging unit 44. Make up the captured image directly.

使工件1所反射的光聚光在攝像單元44,所以抵達攝像圖像之光量變多,所得之攝像圖像較為清晰。於是,可更正確地對工件1的被加工面之凹凸狀態進行評價,可讓作為判定單元發揮功能之個人電腦50實施更細微的判定。The light reflected by the workpiece 1 is focused on the camera unit 44, so the amount of light reaching the captured image increases, and the obtained captured image is clearer. Therefore, the uneven state of the machined surface of the workpiece 1 can be evaluated more accurately, and the personal computer 50 functioning as the determination unit can be made to perform finer determination.

還有,使光對著工件1的背面1b垂直入射,所反射的光則用對著工件1的背面1b正面配置之攝像單元44予以補捉,藉此可得到無變形的攝像圖像。就這種可得到無變形的攝像圖像之檢查裝置36c,利用圖6加以說明。圖6係示意性表示檢查裝置36c之構成例的圖。In addition, light is made incident perpendicularly on the back surface 1b of the workpiece 1, and the reflected light is captured by a camera unit 44 disposed on the front surface of the back surface 1b of the workpiece 1, thereby obtaining a photographed image without distortion. An inspection apparatus 36c that can obtain a captured image without distortion will be described with reference to FIG. 6. FIG. 6 is a diagram schematically showing a configuration example of the inspection device 36c.

檢查裝置36c具備:光源40c、分光鏡52、攝像單元44。從光源40c發射出的光,藉由光源40c與分光鏡52之間的鏡片56a變成平行光。該平行光,若入射在保持台38c所保持之工件1正面所配設之該分光鏡52,則其一部分會朝向工件1反射。The inspection device 36c includes a light source 40c, a beam splitter 52, and an imaging unit 44. The light emitted from the light source 40c becomes parallel light by the lens 56a between the light source 40c and the beam splitter 52. When the parallel light enters the beam splitter 52 disposed on the front surface of the workpiece 1 held by the holding table 38c, a part of the parallel light is reflected toward the workpiece 1.

於是,如圖6所表示,光對著工件1的背面1b從正面入射。此時,工件1的背面1b之全面不受該光照射亦可,例如照射在背面1b包含中央之直徑50mm之範圍。工件1將入射在背面1b之該光往該正面方向反射。工件1所反射之該光,入射在分光鏡52,其一部分會透射。Then, as shown in FIG. 6, the light is incident from the front toward the back surface 1 b of the work 1. At this time, the entire back surface 1b of the workpiece 1 may not be irradiated with the light, and for example, the back surface 1b may be irradiated on the back surface 1b including a center diameter of 50 mm. The workpiece 1 reflects the light incident on the back surface 1b in the front direction. The light reflected by the workpiece 1 is incident on the beam splitter 52, and a part of the light is transmitted.

接著,透射過分光鏡52之光,由該分光鏡52與攝像單元44之間所配設之鏡片56b聚光在攝像單元44。聚光入射在攝像單元44的光,由攝像單元44所具備之鏡片56c予以最後地聚光,而抵達受光元件54。攝像單元44,對抵達受光元件54之光進行攝像而形成攝像圖像。Then, the light transmitted through the beam splitter 52 is focused by the lens 56b disposed between the beam splitter 52 and the image capturing unit 44 on the image capturing unit 44. The light incident on the imaging unit 44 by the condensed light is finally condensed by a lens 56 c provided in the imaging unit 44 and reaches the light receiving element 54. The imaging unit 44 images the light reaching the light receiving element 54 to form a captured image.

若利用檢查裝置36c,則可使由攝像單元44所形成之攝像圖像的變形極小化,所以可更加正確地評價工件1的背面1b之凹凸狀態。If the inspection device 36c is used, the distortion of the captured image formed by the imaging unit 44 can be minimized, so that the uneven state of the back surface 1b of the workpiece 1 can be evaluated more accurately.

再者,亦可為:該攝像圖像中寫入有包含該被加工面中心之該被加工面的中央區域,該攝像圖像中未寫入有圍繞該中央區域之該被加工面的外周區域。由研削加工等在工件的被加工面形成之加工痕跡較容易通過包含該被加工面中心之該被加工面的中央區域,所以有可掌握該中央區域上所形成凹凸的狀態來判定工件之好壞與否的情況。例如,該中央區域為直徑50mm之圓形區域。Furthermore, the central area of the processed surface including the center of the processed surface may be written in the captured image, and the periphery of the processed surface surrounding the central area may not be written in the captured image. region. Processing marks formed on the processed surface of the workpiece by grinding processing are easier to pass through the central region of the processed surface including the center of the processed surface, so it is possible to determine the quality of the workpiece by grasping the state of the unevenness formed on the central region. Bad or bad situation. For example, the central region is a circular region having a diameter of 50 mm.

除此之外,上述實施形態有關之構造、方法等,在不脫離本發明的目的之範圍當中,可做適度變更予以實施之。In addition, the structures, methods, and the like related to the above embodiments can be implemented with appropriate changes without departing from the scope of the present invention.

1‧‧‧工件1‧‧‧Workpiece

1a‧‧‧表面1a‧‧‧ surface

1b‧‧‧背面1b‧‧‧ back

3‧‧‧分割預定線3‧‧‧ divided scheduled line

5‧‧‧元件5‧‧‧ components

7‧‧‧保護膠帶7‧‧‧ protective tape

2‧‧‧研削裝置2‧‧‧ Grinding device

4‧‧‧基台4‧‧‧ abutment

6‧‧‧旋轉台6‧‧‧ rotating table

8‧‧‧卡盤台8‧‧‧ chuck table

8a‧‧‧保持面8a‧‧‧ keep face

10、10a‧‧‧研削單元10, 10a‧‧‧grinding unit

10b‧‧‧研磨單元10b‧‧‧grinding unit

12、12a‧‧‧支柱12, 12a‧‧‧ Pillar

14、14a‧‧‧主軸馬達14, 14a‧‧‧ spindle motor

16、16a‧‧‧研削輪16, 16a ‧ ‧ grinding wheel

16b‧‧‧研磨輪16b‧‧‧ grinding wheel

18、18a‧‧‧研削磨石18, 18a ‧ ‧ grinding grinding stone

18b‧‧‧研磨墊18b‧‧‧ polishing pad

20、20a‧‧‧加工進給單元20, 20a‧‧‧ processing feed unit

22、22a‧‧‧卡匣載置台22, 22a‧‧‧ Cassette Loading Platform

24、24a‧‧‧卡匣24, 24a‧‧‧ Cassette

26‧‧‧工件搬送機械臂26‧‧‧Workpiece transfer robot

28‧‧‧定位台28‧‧‧ positioning table

30‧‧‧工件搬入機構(裝載臂)30‧‧‧ Workpiece moving mechanism (loading arm)

32‧‧‧工件搬出機構(卸載臂)32‧‧‧ Workpiece removal mechanism (unloading arm)

34‧‧‧旋轉清洗裝置34‧‧‧Rotary cleaning device

36、36a、36b、36c‧‧‧檢查裝置36, 36a, 36b, 36c ‧‧‧ Inspection device

38、38a、38b、38c‧‧‧保持台38, 38a, 38b, 38c

40、40a、40b、40c‧‧‧光源40, 40a, 40b, 40c‧‧‧‧

42、42a‧‧‧螢幕42, 42a‧‧‧Screen

44‧‧‧攝像單元44‧‧‧ camera unit

46‧‧‧光46‧‧‧light

48a、48b、48c‧‧‧凹面鏡48a, 48b, 48c ‧‧‧ concave mirror

50‧‧‧個人電腦50‧‧‧ PC

52‧‧‧分光鏡52‧‧‧ Beamsplitter

54‧‧‧受光元件54‧‧‧ light receiving element

56a、56b、56c‧‧‧鏡片56a, 56b, 56c‧‧‧ lens

圖1(A)係示意性表示工件的立體圖,圖1(B)係示意性表示黏貼有保護膠帶之工件的立體圖。 圖2係示意性表示包含檢查裝置之加工裝置的立體圖。 圖3(A) 係示意性表示研削加工的側視圖,圖3(B)係示意性表示研磨加工的側視圖。 圖4係示意性表示檢查裝置之構成例的圖。 圖5(A)及圖5(B)係示意性表示檢查裝置之構成例的圖。 圖6係示意性表示檢查裝置之構成例的圖。FIG. 1 (A) is a perspective view schematically showing a workpiece, and FIG. 1 (B) is a perspective view schematically showing a workpiece to which a protective tape is stuck. FIG. 2 is a perspective view schematically showing a processing device including an inspection device. FIG. 3 (A) is a side view schematically showing a grinding process, and FIG. 3 (B) is a side view schematically showing a grinding process. FIG. 4 is a diagram schematically showing a configuration example of an inspection device. 5 (A) and 5 (B) are diagrams schematically showing a configuration example of an inspection device. FIG. 6 is a diagram schematically showing a configuration example of an inspection device.

Claims (10)

一種工件的檢查方法,具備: 加工步驟,係用研削磨石或研磨墊對工件進行加工; 投影步驟,係將來自光源的光照射在該工件的被加工面,而該被加工面所反射的該光抵達螢幕,藉此將反映了該加工步驟之中被加工面上所形成的凹凸的狀態之投影影像予以映照在該螢幕; 攝像步驟,係對該螢幕的該投影影像進行攝像來形成攝像圖像;及 判定步驟,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。A method for inspecting a workpiece includes: a processing step for processing the workpiece with a grinding stone or a polishing pad; a projection step for irradiating light from a light source onto a processed surface of the workpiece, and the reflected surface of the processed surface The light reaches the screen, thereby projecting the projection image reflecting the state of the unevenness formed on the processed surface in the processing step onto the screen; the imaging step is to take an image of the projection image of the screen to form a camera An image; and a determining step of grasping the uneven state of the workpiece based on the captured image, and further determining whether the workpiece is good or bad. 一種工件的檢查方法,具備: 加工步驟,係用研削磨石或研磨墊對工件進行加工; 攝像步驟,係將來自光源的光照射在該工件的被加工面,而對該被加工面所反射的該光進行攝像,藉此形成攝像圖像,該攝像圖像寫入反映了該加工步驟之中被加工面上所形成的凹凸的狀態之影像;及 判定步驟,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。A method for inspecting a workpiece, comprising: a processing step for processing the workpiece with a grinding stone or a polishing pad; an imaging step for irradiating light from a light source onto a processed surface of the workpiece and reflecting the processed surface The light is imaged to form a captured image, and the captured image is written into an image reflecting the state of the unevenness formed on the processed surface in the processing step; and the determination step is based on the captured image. Grasp the uneven state of the workpiece, and then determine whether the workpiece is good or bad. 如申請專利範圍第1或2項所述之工件的檢查方法,其中, 該攝像圖像中,係寫入包含該被加工面中心之該被加工面的中央區域; 該攝像圖像中,係未寫入圍繞該中央區域之該被加工面的外周區域。The method for inspecting a workpiece according to item 1 or 2 of the scope of patent application, wherein the camera image is written in a central area of the processed surface including the center of the processed surface; in the camera image, The peripheral area of the processed surface surrounding the central area is not written. 一種工件的檢查裝置,具備: 保持台,係在暴露研削磨石或研磨墊加工之工件的被加工面之狀態下,保持該工件; 光源,係將光照射在該保持台所保持之該工件的被加工面; 螢幕,係受該被加工面所反射的該光照射,藉此映照出反映了該工件的該被加工面上由該加工所形成的凹凸的狀態之投影影像;及 攝像單元,係對該螢幕所映照之投影影像進行攝像來形成攝像圖像。A workpiece inspection device includes: a holding table for holding the workpiece while a processed surface of the workpiece processed by a grinding stone or a polishing pad is exposed; a light source for irradiating light on the workpiece held by the holding table; The processed surface; the screen is illuminated by the light reflected by the processed surface, thereby reflecting a projection image reflecting the state of the unevenness formed by the processing on the processed surface of the workpiece; and a camera unit, The projection image of the screen is captured to form a captured image. 一種工件的檢查裝置,具備: 保持台,係在暴露研削磨石或研磨墊加工之工件的被加工面之狀態下,保持該工件; 光源,係將光照射在該保持台所保持之該工件的被加工面;及 攝像單元,係對該被加工面所反射的該光進行檢測來形成攝像圖像。A workpiece inspection device includes: a holding table for holding the workpiece while a processed surface of the workpiece processed by a grinding stone or a polishing pad is exposed; a light source for irradiating light on the workpiece held by the holding table; The processed surface; and an imaging unit that detects the light reflected from the processed surface to form a captured image. 如申請專利範圍第4或5項所述之工件的檢查裝置,其中更具備: 判定單元,係根據該攝像圖像來掌握該工件的該凹凸狀態,進而判定工件之好壞與否。The inspection device for a workpiece according to item 4 or 5 of the scope of patent application, further comprising: a determination unit that grasps the uneven state of the workpiece based on the captured image, and further determines whether the workpiece is good or bad. 申請專利範圍第6項所述之工件的檢查裝置,其中, 該判定單元,係在包含該被加工面中心之該被加工面的中央區域、與圍繞該中央區域之該被加工面的外周區域檢測出連續的該凹凸時,將該工件判定為不良品。The inspection device for a workpiece according to item 6 of the scope of patent application, wherein the determination unit is in a central region of the processed surface including the center of the processed surface, and an outer peripheral region of the processed surface surrounding the central region. When the continuous unevenness is detected, the workpiece is determined to be defective. 如申請專利範圍第4或5項所述之工件的檢查裝置,其中, 該攝像圖像,係寫入包含該被加工面中心之該被加工面的中央區域, 該攝像圖像中,係未寫入圍繞該中央區域之該被加工面的外周區域。The inspection device for a workpiece according to item 4 or 5 of the scope of patent application, wherein the camera image is written in a central area of the processed surface including the center of the processed surface, and the camera image is not A peripheral area of the processed surface surrounding the central area is written. 如申請專利範圍第6項所述之工件的檢查裝置,其中, 該攝像圖像,係寫入包含該被加工面中心之該被加工面的中央區域, 該攝像圖像中,係未寫入圍繞該中央區域之該被加工面的外周區域。The inspection device for a workpiece according to item 6 of the patent application scope, wherein the camera image is written in a central area of the processed surface including the center of the processed surface, and the camera image is not written A peripheral area of the processed surface surrounding the central area. 一種加工裝置,具備: 卡盤台,係保持工件; 加工單元,係用該研削磨石或是該研磨墊對該卡盤台所保持之該工件進行加工; 清洗單元,係對經加工之該工件的被加工面進行清洗;及 檢查單元,係對經清洗之該工件的該被加工面上形成的加工痕跡之凹凸狀態進行檢查, 其中,該檢查單元為申請專利範圍第4至9項中任一項所述之工件的檢查裝置。A processing device includes: a chuck table that holds a workpiece; a processing unit that uses the grinding stone or the polishing pad to process the workpiece held by the chuck table; a cleaning unit that processes the workpiece that has been processed Cleaning the processed surface; and an inspection unit that inspects the unevenness of the processing marks formed on the processed surface of the workpiece being cleaned, wherein the inspection unit is any of the 4th to 9th in the scope of patent application An inspection device for a workpiece according to one item.
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