TW201833297A - Silicon-containing resin-composition, silicon-containing resin-film, silica film, light-emitting display-element panel and light-emitting display-apparatus providing a silicon-containing resin composition containing a silicon-containing resin (A), a quantum dot (B), and a solvent (S) - Google Patents

Silicon-containing resin-composition, silicon-containing resin-film, silica film, light-emitting display-element panel and light-emitting display-apparatus providing a silicon-containing resin composition containing a silicon-containing resin (A), a quantum dot (B), and a solvent (S) Download PDF

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TW201833297A
TW201833297A TW106145945A TW106145945A TW201833297A TW 201833297 A TW201833297 A TW 201833297A TW 106145945 A TW106145945 A TW 106145945A TW 106145945 A TW106145945 A TW 106145945A TW 201833297 A TW201833297 A TW 201833297A
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silicon
containing resin
film
substituent
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TWI759391B (en
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野田国宏
千坂博樹
塩田大
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日商東京應化工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/10Encapsulated ingredients
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/30Sulfur-, selenium- or tellurium-containing compounds
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/32Phosphorus-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/16Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/20Applications use in electrical or conductive gadgets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass

Abstract

Provided are a silicon-containing resin composition capable of forming a silicon-containing resin film or a silica film containing quantum dots in well-dispersed state while suppressing occurrence of cracks, a silicon-containing resin film containing quantum dots and a silica film as well as a method of manufacturing the same, an optical film and a laminate for a light-emitting display element, a light-emitting display element panel including the optical film or the laminate, and a light-emitting display device including the light-emitting display element panel, the laminate, and a manufacturing method for producing the laminate. In a silicon-containing resin composition comprising a silicon-containing resin (A), a quantum dot (B), and a solvent (S), the silicon-containing resin (A) is selected one or more from a siloxane resin and a polysilane, and cycloalkyl acetate having a specific structure is contained in the solvent (S). As the cycloalkyl acetate, cyclohexyl acetate is preferably used.

Description

含矽樹脂組成物、含矽樹脂薄膜、二氧化矽薄膜、發光顯示元件面板及發光顯示裝置Silicon-containing resin composition, silicon-containing resin film, silicon dioxide film, light-emitting display element panel, and light-emitting display device

[0001] 本發明係關於含矽樹脂組成物、含矽樹脂薄膜、二氧化矽薄膜、發光顯示元件面板及發光顯示裝置。[0001] The present invention relates to a silicon-containing resin composition, a silicon-containing resin film, a silicon dioxide film, a light-emitting display element panel, and a light-emitting display device.

[0002] 較以往,為了封入電子所形成之極小的粒(點)被稱為量子點,已被研究於各種領域的適用。於此,1粒量子點的大小為直徑數奈米至數10奈米,以約1萬個原子構成。   [0003] 該量子點藉由變更其尺寸(改變帶隙(Band gap)),可變換發光之螢光的顏色(發光波長)(波長變換)。因此,近年來針對量子點,作為波長變換材料,適用在顯示元件已被努力研究(參照專利文獻1及2)。   [0004] 又,亦正研究各種光學發光元件或包含在顯示元件之量子點的光學薄膜的適用。作為該光學薄膜,例如提案有於由如聚二甲基矽氧烷之含矽樹脂所構造之基質中分散量子點之光學薄膜(參照專利文獻3)。   例如,在使用液晶顯示元件或有機EL顯示元件等之光源的發光,顯示圖像之元件,將光源所發出之光線透過包含量子點之光學薄膜時,由於可藉由波長變換取出色純度高之綠色光與紅色光,可擴大色相之再現範圍。 [先前技術文獻] [專利文獻]   [0005]   [專利文獻1]日本特開2006-216560號公報   [專利文獻2]日本特開2008-112154號公報   [專利文獻3]韓國公開特許第10-2016-0004524號公報[0002] In the past, extremely small particles (dots) formed to encapsulate electrons are called quantum dots, and they have been studied and applied in various fields. Here, the size of one quantum dot is several nanometers to several ten nanometers in diameter, and is composed of about 10,000 atoms. [0003] By changing its size (band gap), the quantum dot can change the color (emission wavelength) (wavelength conversion) of the fluorescent light emitted. Therefore, in recent years, efforts have been made to apply quantum dots as wavelength conversion materials to display elements (see Patent Documents 1 and 2). [0004] In addition, the application of various optical light-emitting elements or optical films including quantum dots in display elements is also being studied. As the optical film, for example, an optical film in which quantum dots are dispersed in a matrix composed of a silicon-containing resin such as polydimethylsiloxane is proposed (see Patent Document 3). For example, when a light source such as a liquid crystal display element or an organic EL display element is used to emit light and an image is displayed, the light emitted from the light source is transmitted through an optical film including a quantum dot, because the color purity can be extracted by wavelength conversion. Green light and red light can expand the reproduction range of hue. [Prior Art Document] [Patent Document] [0005] [Patent Document 1] Japanese Patent Laid-Open No. 2006-216560 [Patent Document 2] Japanese Patent Laid-Open No. 2008-112154 [Patent Document 3] Korean Public License No. 10-2016 -0004524

[發明欲解決之課題]   [0006] 矽氧烷樹脂或二氧化矽等之含矽材料由於具有耐光性、耐候性、耐溶劑性、耐化學藥品性、透明性及絕緣性等之各種優異之特性,適合作為在包含量子點之光學薄膜的基質之材料。   然而,形成包含由矽氧烷樹脂或二氧化矽等之含矽材料所構成之基質、與分散於該基質中之量子點的薄膜時,有薄膜的膜厚較厚時,容易於所形成之薄膜產生破裂的問題。   [0007] 因此,使用於由含矽材料所構成之基質中包含量子點之光學薄膜時,有必要薄化光學薄膜的膜厚,有顯示限制光學薄膜的設計或具備光學薄膜之各種裝置的設計的問題。   例如,於製造有某程度厚之光學薄膜時,為了得到無破裂之光學薄膜,有必要層合多數較薄之光學薄膜的情況。該情況下,因層合的操作煩雜,導致光學薄膜之製造成本高。   [0008] 又,於包含量子點之光學薄膜,為了抑制入射在薄膜之亮度線的散射,期望使量子點良好地分散,於量子點之粒子間確保有某程度的距離。   惟,於由含矽材料所構成之基質中形成包含量子點之光學薄膜時,有藉由光學薄膜的形成所使用之組成物的組成,使量子點良好分散於薄膜中有困難的情況。   [0009] 本發明係鑑於上述之課題而完成者。本發明以提供一種抑制破裂的發生,並且可以良好分散的狀態形成包含量子點之含矽樹脂薄膜或二氧化矽薄膜之含矽樹脂組成物、與使用該含矽樹脂組成物之矽樹脂薄膜或二氧化矽薄膜之製造方法、與包含量子點之含矽樹脂薄膜或二氧化矽薄膜、與包含該含矽樹脂薄膜及/或該二氧化矽薄膜之發光顯示元件用之光學薄膜或層合體、與包含該光學薄膜或該層合體之發光顯示元件面板、與具備該發光顯示元件面板之發光顯示裝置、與前述之層合體之製造方法作為目的。 [用以解決課題之手段]   [0010] 本發明者們,發現藉由在包含含矽樹脂(A)、與量子點(B)、與溶劑(S)之含矽樹脂組成物,作為含矽樹脂(A),係使用選自由矽氧烷樹脂及聚矽烷所構成之群組中之1種以上,將特定構造之環烷基乙酸酯含有在溶劑(S),可解決上述之課題,而終至完成本發明。具體而言,本發明係提供以下者。   [0011] 本發明之第1態樣,為一種含矽樹脂組成物,其係含有含矽樹脂(A)、與量子點(B)、與溶劑(S),其特徵為含矽樹脂(A)為選自由矽氧烷樹脂及聚矽烷所構成之群組中之1種以上,   溶劑(S)為含有下式(S1)表示之環烷基乙酸酯,(式(S1)中,Rs1 為碳原子數1~3之烷基,p為1~6之整數,q為0~(p+1)之整數)。   [0012] 本發明之第2態樣,為一種含矽樹脂薄膜之製造方法,其係包含:   形成由第1態樣之該含矽樹脂組成物所構成之塗佈膜、與   從塗佈膜去除溶劑(S)。   [0013] 本發明之第3態樣,為一種含矽樹脂薄膜,其係於由含矽樹脂(A)所構成之基質中,分散量子點(B),膜厚為2~300μm。   [0014] 本發明之第4態樣,為一種二氧化矽薄膜之製造方法,其係包含:   形成由第1態樣之該含矽樹脂組成物所構成之塗佈膜、與   燒成塗佈膜。   [0015] 本發明之第5態樣,為一種二氧化矽薄膜,其係於由二氧化矽所構成之基質中,分散量子點(B)。   [0016] 本發明之第6態樣,為一種發光顯示元件用之光學薄膜,其係由第3態樣之該含矽樹脂薄膜或由第5態樣之該二氧化矽薄膜所構成。   [0017] 本發明之第7態樣,為一種層合體,其係包含選自第3態樣之該含矽樹脂薄膜及第5態樣之該二氧化矽薄膜所構成之群組中之1個以上的薄膜。   [0018] 本發明之第8態樣,為一種發光顯示元件面板,其係包含第6態樣之該發光顯示元件用之光學薄膜或第7態樣之該層合體。   [0019] 本發明之第9態樣,為一種發光顯示裝置,其係具備第8態樣之該發光顯示元件面板。   [0020] 本發明之第10之態樣,為一種層合體之製造方法,其係包含選自含矽樹脂薄膜及二氧化矽薄膜中之1個以上的薄膜之層合體之製造方法,其特徵為包含將含矽樹脂薄膜以第2態樣之該製造方法製造及將二氧化矽薄膜以第4之態樣之該製造方法製造中之至少一種。 [發明的效果]   [0021] 根據本發明,可提供一種抑制破裂的發生,並且可以良好分散的狀態形成包含量子點之含矽樹脂薄膜或二氧化矽薄膜之含矽樹脂組成物、與使用該含矽樹脂組成物之含矽樹脂薄膜或二氧化矽薄膜之製造方法、與包含量子點之含矽樹脂薄膜或二氧化矽薄膜、與包含該含矽樹脂薄膜及/或該二氧化矽薄膜之發光顯示元件用之光學薄膜或層合體、與包含該光學薄膜或該層合體之發光顯示元件面板、與具備該發光顯示元件面板之發光顯示裝置、與前述之層合體之製造方法。[Problems to be Solved by the Invention] [0006] Silicon-containing materials such as a siloxane resin or silicon dioxide have various excellent properties such as light resistance, weather resistance, solvent resistance, chemical resistance, transparency, and insulation. Characteristics, suitable as a material for the matrix of optical films containing quantum dots. However, when forming a thin film including a matrix composed of a silicon-containing material such as a siloxane resin or silicon dioxide, and quantum dots dispersed in the matrix, it is easier to form a thin film if the film thickness is thicker. The film is broken. [0007] Therefore, when used in an optical thin film containing quantum dots in a matrix composed of a silicon-containing material, it is necessary to reduce the thickness of the optical thin film, and there are designs for display-limiting optical thin films or designs of various devices including optical thin films. The problem. For example, when an optical film having a certain thickness is manufactured, in order to obtain an optical film without cracks, it is necessary to laminate a plurality of thin optical films. In this case, the manufacturing operation of the optical film is high due to the complicated operation of lamination. [0008] Further, in an optical film including quantum dots, in order to suppress scattering of brightness lines incident on the thin film, it is desirable to disperse the quantum dots well, and to ensure a certain distance between the particles of the quantum dots. However, when an optical film including quantum dots is formed in a matrix composed of a silicon-containing material, it may be difficult to disperse the quantum dots in the film well due to the composition of the composition used for the formation of the optical film. [0009] The present invention has been made in view of the problems described above. The present invention provides a silicon-containing resin composition containing a quantum dot-containing silicon-containing resin film or a silicon dioxide film, and a silicon resin film using the silicon-containing resin composition or the like, which can suppress the occurrence of cracks and can be well dispersed. Manufacturing method of silicon dioxide film, and silicon-containing resin film or silicon dioxide film containing quantum dots, and optical film or laminate for light-emitting display element containing the silicon-containing resin film and / or the silicon dioxide film, A light emitting display element panel including the optical film or the laminated body, a light emitting display device including the light emitting display element panel, and a method for manufacturing the laminated body as described above are the objects. [Means to Solve the Problem] The present inventors discovered that a silicon-containing resin composition containing a silicon-containing resin (A), a quantum dot (B), and a solvent (S) was used as a silicon-containing resin. The resin (A) is one or more selected from the group consisting of a silicone resin and a polysilane, and a cycloalkyl acetate having a specific structure is contained in the solvent (S), which can solve the above-mentioned problems. The invention has finally been completed. Specifically, the present invention provides the following. [0011] A first aspect of the present invention is a silicon-containing resin composition containing a silicon-containing resin (A), a quantum dot (B), and a solvent (S), and is characterized in that the silicon-containing resin (A ) Is one or more selected from the group consisting of a siloxane resin and a polysilane, and the solvent (S) is a cycloalkyl acetate containing a formula (S1), (In the formula (S1), R s1 is an alkyl group having 1 to 3 carbon atoms, p is an integer of 1 to 6, and q is an integer of 0 to (p + 1)). [0012] A second aspect of the present invention is a method for manufacturing a silicon-containing resin film, which includes: forming a coating film composed of the silicon-containing resin composition of the first aspect, and forming a coating film from the coating film. Remove the solvent (S). [0013] A third aspect of the present invention is a silicon-containing resin film, which is dispersed in a matrix composed of a silicon-containing resin (A), and the quantum dots (B) are dispersed, and the film thickness is 2 to 300 μm. [0014] A fourth aspect of the present invention is a method for manufacturing a silicon dioxide film, which includes: forming a coating film composed of the silicon-containing resin composition of the first aspect, and firing coating membrane. [0015] A fifth aspect of the present invention is a silicon dioxide thin film, which is dispersed in a matrix composed of silicon dioxide and disperses quantum dots (B). [0016] A sixth aspect of the present invention is an optical film for a light-emitting display element, which is composed of the silicon-containing resin film of the third aspect or the silicon dioxide film of the fifth aspect. [0017] A seventh aspect of the present invention is a laminate including one selected from the group consisting of the silicon-containing resin film in the third aspect and the silicon dioxide film in the fifth aspect. More than three films. [0018] An eighth aspect of the present invention is a light-emitting display element panel including an optical film for the light-emitting display element according to the sixth aspect or the laminate according to the seventh aspect. [0019] A ninth aspect of the present invention is a light-emitting display device including the light-emitting display element panel according to the eighth aspect. [0020] A tenth aspect of the present invention is a method for manufacturing a laminate, which is a method for manufacturing a laminate including one or more films selected from a silicon-containing resin film and a silicon dioxide film, and is characterized in that It is at least one of the method of manufacturing the silicon-containing resin film in the second aspect and the method of manufacturing the silicon dioxide film in the fourth aspect. [Effects of the Invention] [0021] According to the present invention, it is possible to provide a silicon-containing resin composition containing a quantum dot or a silicon dioxide film including a quantum dot and a silicon resin composition in a well-dispersed state while suppressing the occurrence of cracks, and using the same. Manufacturing method of silicon-containing resin film or silicon dioxide film containing silicon resin composition, silicon-containing resin film or silicon dioxide film containing quantum dots, and silicon-containing resin film and / or silicon dioxide film An optical film or a laminate for a light-emitting display element, a light-emitting display element panel including the optical film or the laminate, a light-emitting display device including the light-emitting display element panel, and a method for manufacturing the foregoing laminate.

[0022] <含矽樹脂組成物>   於本發明該含矽樹脂組成物係含有含矽樹脂(A)、與量子點(B)、與溶劑(S)。   作為含矽樹脂(A),係使用選自矽氧烷樹脂及聚矽烷中之1種以上。   溶劑(S)含有下式(S1)表示之環烷基乙酸酯。(式(S1)中,Rs1 為碳原子數1~3之烷基,p為1~6之整數,q為0~(p+1)之整數)。   [0023] 含矽樹脂組成物係藉由包含含有預定構造之環烷基乙酸酯的溶劑(S),可抑制在使用含矽樹脂組成物所形成之含矽樹脂薄膜或二氧化矽薄膜之破裂的發生,並且在含矽樹脂薄膜或二氧化矽薄膜,可使量子點(B)良好地分散。   [0024] 使用含矽樹脂組成物,形成膜厚2~300μm左右厚度之含矽樹脂薄膜或二氧化矽薄膜時,特別容易產生破裂。   惟,於本發明使用該含矽樹脂組成物時,即使是形成膜厚2~300μm左右厚度之含矽樹脂薄膜或二氧化矽薄膜的情況下,亦容易抑制破裂的發生。   [0025] 以下,針對含矽樹脂組成物所包含之必須或任意之成分進行說明。   [0026] [含矽樹脂(A)]   作為含矽樹脂(A),係使用選自矽氧烷樹脂及聚矽烷中之1種以上。藉由塗佈包含此等之含矽樹脂(A)之含矽樹脂組成物,而得到含矽樹脂薄膜,藉由燒成該含矽樹脂薄膜,而得到二氧化矽系之膜。以下,針對矽氧烷樹脂及聚矽烷進行說明。   [0027] (矽氧烷樹脂)   針對矽氧烷樹脂,若為可溶於含有後述構造之環烷基乙酸酯的溶劑(S)之樹脂,則並未特別限制。   作為矽氧烷樹脂,適合使用例如水解縮合選自下式(A1)表示之矽烷化合物中之至少一種所得之矽氧烷樹脂。[0028] 在式(A1),R表示氫原子、烷基、芳基或芳烷基,R’表示烷基或苯基,n表示2~4之整數。於Si鍵結複數個R時,該複數個R可為相同,亦可為相異。又,鍵結於Si之複數個(OR’)基可為相同,亦可為相異。   [0029] 又,作為R之烷基,較佳為碳原子數1~20之直鏈狀或分支狀的烷基,更佳為碳原子數1~4之直鏈狀或分支狀的烷基。   [0030] R為芳基或芳烷基時,此等之基所包含之芳基於不阻礙本發明目的的範圍,並未被特別限定。作為芳基之適合的例,可列舉下述之基。   [0031][0032] 於上述式之基當中,較佳為下式之基。[0033] 上述式中,Ra1 為氫原子;羥基;甲氧基、乙氧基、丁氧基、丙氧基等之烷氧基;甲基、乙基、丁基、丙基等之烴基。上述式中Ra2 為亞甲基、伸乙基、伸丙基、伸丁基等之伸烷基。   [0034] 作為R為芳基或芳烷基時之適合的具體例,可列舉苄基、苯乙基、苯基、萘基、蒽基、菲基、聯苯基、茀基、芘基等。   [0035] 芳基或芳烷基所包含之苯環數較佳為1~3個。苯環數為1~3個時,矽氧烷樹脂之製造性良好,藉由矽氧烷樹脂之聚合度的上昇抑制燒成時之揮發,二氧化矽薄膜的形成為容易。芳基或芳烷基可具有羥基作為取代基。   [0036] 又,作為R’之烷基較佳為碳原子數1~5之直鏈狀或分支狀之烷基。作為R’之烷基之碳原子數,尤其是從水解速度的點來看,較佳為1或2。   在式(A1)之n為4時之矽烷化合物(i)係以下式(A2)表示。[0037] 式(A2)中,R1 、R2 、R3 及R4 分別獨立與上述R’同樣表示烷基或苯基。   [0038] a、b、c及d為0≦a≦4、0≦b≦4、0≦c≦4、0≦d≦4,且為滿足a+b+c+d=4之條件的整數。   [0039] 在式(A1)之n為3時之矽烷化合物(ii)係以下述式(A3)表示。[0040] 式(A3)中,R5 表示氫原子、與上述R相同表示烷基、芳基或芳烷基。R6 、R7 及R8 分別獨立與上述R’同樣表示烷基或苯基。   [0041] e、f及g為0≦e≦3、0≦f≦3、0≦g≦3,且為滿足e+f+g=3之條件的整數。   [0042] 在式(A1)之n為2時之矽烷化合物(iii)係以下述式(A4)表示。[0043] 式(A4)中,R9 及R10 表示氫原子、與上述R相同表示烷基、芳基或芳烷基。R11 及R12 分別獨立與上述R’同樣表示烷基或苯基。   [0044] h及i為0≦h≦2、0≦i≦2,且為滿足h+i=2之條件的整數。   [0045] 作為矽烷化合物(i)之具體例,可列舉四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、四戊基氧基矽烷、四苯基氧基矽烷、三甲氧基單乙氧基矽烷、二甲氧基二乙氧基矽烷、三乙氧基單甲氧基矽烷、三甲氧基單丙氧基矽烷、單甲氧基三丁氧基矽烷、單甲氧基三戊基氧基矽烷、單甲氧基三苯基氧基矽烷、二甲氧基二丙氧基矽烷、三丙氧基單甲氧基矽烷、三甲氧基單丁氧基矽烷、二甲氧基二丁氧基矽烷、三乙氧基單丙氧基矽烷、二乙氧基二丙氧基矽烷、三丁氧基單丙氧基矽烷、二甲氧基單乙氧基單丁氧基矽烷、二乙氧基單甲氧基單丁氧基矽烷、二乙氧基單丙氧基單丁氧基矽烷、二丙氧基單甲氧基單乙氧基矽烷、二丙氧基單甲氧基單丁氧基矽烷、二丙氧基單乙氧基單丁氧基矽烷、二丁氧基單甲氧基單乙氧基矽烷、二丁氧基單乙氧基單丙氧基矽烷、單甲氧基單乙氧基單丙氧基單丁氧基矽烷等之四烷氧基矽烷,其中,較佳為四甲氧基矽烷、四乙氧基矽烷。   [0046] 作為矽烷化合物(ii)之具體例,可列舉   三甲氧基矽烷、三乙氧基矽烷、三丙氧基矽烷、三戊基氧基矽烷、三苯基氧基矽烷、二甲氧基單乙氧基矽烷、二乙氧基單甲氧基矽烷、二丙氧基單甲氧基矽烷、二丙氧基單乙氧基矽烷、二戊基氧基(Oxyl)單甲氧基矽烷、二戊基氧基單乙氧基矽烷、二戊基氧基單丙氧基矽烷、二苯基氧基(Oxyl)單甲氧基矽烷、二苯基氧基單乙氧基矽烷、二苯基氧基單丙氧基矽烷、甲氧基乙氧基丙氧基矽烷、單丙氧基二甲氧基矽烷、單丙氧基二乙氧基矽烷、單丁氧基二甲氧基矽烷、單戊基氧基二乙氧基矽烷及單苯基氧基二乙氧基矽烷等之氫矽烷化合物;   甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三戊基氧基矽烷、甲基三苯基氧基矽烷、甲基單甲氧基二乙氧基矽烷、甲基單甲氧基二丙氧基矽烷、甲基單甲氧基二戊基氧基矽烷、甲基單甲氧基二苯基氧基矽烷、甲基甲氧基乙氧基丙氧基矽烷及甲基單甲氧基單乙氧基單丁氧基矽烷等之甲基矽烷化合物;   乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷、乙基三戊基氧基矽烷、乙基三苯基氧基矽烷、乙基單甲氧基二乙氧基矽烷、乙基單甲氧基二丙氧基矽烷、乙基單甲氧基二戊基氧基矽烷、乙基單甲氧基二苯基氧基矽烷、乙基甲氧基乙氧基丙氧基矽烷及乙基單甲氧基單乙氧基單丁氧基矽烷等之乙基矽烷化合物;   丙基三甲氧基矽烷、丙基三乙氧基矽烷、丙基三丙氧基矽烷、丙基三戊基氧基矽烷及丙基三苯基氧基矽烷、丙基單甲氧基二乙氧基矽烷、丙基單甲氧基二丙氧基矽烷、丙基單甲氧基二戊基氧基矽烷、丙基單甲氧基二苯基氧基矽烷、丙基甲氧基乙氧基丙氧基矽烷及丙基單甲氧基單乙氧基單丁氧基矽烷等之丙基矽烷化合物;   丁基三甲氧基矽烷、丁基三乙氧基矽烷、丁基三丙氧基矽烷、丁基三戊基氧基矽烷、丁基三苯基氧基矽烷、丁基單甲氧基二乙氧基矽烷、丁基單甲氧基二丙氧基矽烷、丁基單甲氧基二戊基氧基矽烷、丁基單甲氧基二苯基氧基矽烷、丁基甲氧基乙氧基丙氧基矽烷及丁基單甲氧基單乙氧基單丁氧基矽烷等之丁基矽烷化合物;   苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三丙氧基矽烷、苯基三戊基氧基矽烷、苯基三苯基氧基矽烷、苯基單甲氧基二乙氧基矽烷、苯基單甲氧基二丙氧基矽烷、苯基單甲氧基二戊基氧基矽烷、苯基單甲氧基二苯基氧基矽烷、苯基甲氧基乙氧基丙氧基矽烷及苯基單甲氧基單乙氧基單丁氧基矽烷等之苯基矽烷化合物;   羥基苯基三甲氧基矽烷、羥基苯基三乙氧基矽烷、羥基苯基三丙氧基矽烷、羥基苯基三戊基氧基矽烷、羥基苯基三苯基氧基矽烷、羥基苯基單甲氧基二乙氧基矽烷、羥基苯基單甲氧基二丙氧基矽烷、羥基苯基單甲氧基二戊基氧基矽烷、羥基苯基單甲氧基二苯基氧基矽烷、羥基苯基甲氧基乙氧基丙氧基矽烷及羥基苯基單甲氧基單乙氧基單丁氧基矽烷等之羥基苯基矽烷化合物;   萘基三甲氧基矽烷、萘基三乙氧基矽烷、萘基三丙氧基矽烷、萘基三戊基氧基矽烷、萘基三苯基氧基矽烷、萘基單甲氧基二乙氧基矽烷、萘基單甲氧基二丙氧基矽烷、萘基單甲氧基二戊基氧基矽烷、萘基單甲氧基二苯基氧基矽烷、萘基甲氧基乙氧基丙氧基矽烷及萘基單甲氧基單乙氧基單丁氧基矽烷等之萘基矽烷化合物;   苄基三甲氧基矽烷、苄基三乙氧基矽烷、苄基三丙氧基矽烷、苄基三戊基氧基矽烷、苄基三苯基氧基矽烷、苄基單甲氧基二乙氧基矽烷、苄基單甲氧基二丙氧基矽烷、苄基單甲氧基二戊基氧基矽烷、苄基單甲氧基二苯基氧基矽烷、苄基甲氧基乙氧基丙氧基矽烷及苄基單甲氧基單乙氧基單丁氧基矽烷等之苄基矽烷化合物;   羥基苄基三甲氧基矽烷、羥基苄基三乙氧基矽烷、羥基苄基三丙氧基矽烷、羥基苄基三戊基氧基矽烷、羥基苄基三苯基氧基矽烷、羥基苄基單甲氧基二乙氧基矽烷、羥基苄基單甲氧基二丙氧基矽烷、羥基苄基單甲氧基二戊基氧基矽烷、羥基苄基單甲氧基二苯基氧基矽烷、羥基苄基甲氧基乙氧基丙氧基矽烷及羥基苄基單甲氧基單乙氧基單丁氧基矽烷等之羥基苄基矽烷化合物。   [0047] 作為矽烷化合物(iii)之具體例,可列舉   二甲氧基矽烷、二乙氧基矽烷、二丙氧基矽烷、二戊基氧基矽烷、二苯基氧基矽烷、甲氧基乙氧基矽烷、甲氧基丙氧基矽烷、甲氧基戊基氧基矽烷、甲氧基苯基氧基矽烷、乙氧基丙氧基矽烷、乙氧基戊基氧基矽烷及乙氧基苯基氧基矽烷等之氫矽烷化合物;   甲基二甲氧基矽烷、甲基甲氧基乙氧基矽烷、甲基二乙氧基矽烷、甲基甲氧基丙氧基矽烷、甲基甲氧基戊基氧基矽烷、甲基乙氧基丙氧基矽烷、甲基二丙氧基矽烷、甲基二戊基氧基矽烷、甲基二苯基氧基矽烷、甲基甲氧基苯基氧基矽烷等之甲基氫矽烷化合物;   乙基二甲氧基矽烷、乙基甲氧基乙氧基矽烷、乙基二乙氧基矽烷、乙基甲氧基丙氧基矽烷、乙基甲氧基戊基氧基矽烷、乙基乙氧基丙氧基矽烷、乙基二丙氧基矽烷、乙基二戊基氧基矽烷、乙基二苯基氧基矽烷、乙基甲氧基苯基氧基矽烷等之乙基氫矽烷化合物;   丙基二甲氧基矽烷、丙基甲氧基乙氧基矽烷、丙基二乙氧基矽烷、丙基甲氧基丙氧基矽烷、丙基甲氧基戊基氧基矽烷、丙基乙氧基丙氧基矽烷、丙基二丙氧基矽烷、丙基二戊基氧基矽烷、丙基二苯基氧基矽烷、丙基甲氧基苯基氧基矽烷等之丙基氫矽烷化合物;   丁基二甲氧基矽烷、丁基甲氧基乙氧基矽烷、丁基二乙氧基矽烷、丁基甲氧基丙氧基矽烷、丁基甲氧基戊基氧基矽烷、丁基乙氧基丙氧基矽烷、丁基二丙氧基矽烷、丁基二戊基氧基矽烷、丁基二苯基氧基矽烷、丁基甲氧基苯基氧基矽烷等之丁基氫矽烷化合物;   苯基二甲氧基矽烷、苯基甲氧基乙氧基矽烷、苯基二乙氧基矽烷、苯基甲氧基丙氧基矽烷、苯基甲氧基戊基氧基矽烷、苯基乙氧基丙氧基矽烷、苯基二丙氧基矽烷、苯基二戊基氧基矽烷、苯基二苯基氧基矽烷、苯基甲氧基苯基氧基矽烷等之苯基氫矽烷化合物;   羥基苯基二甲氧基矽烷、羥基苯基甲氧基乙氧基矽烷、羥基苯基二乙氧基矽烷、羥基苯基甲氧基丙氧基矽烷、羥基苯基甲氧基戊基氧基矽烷、羥基苯基乙氧基丙氧基矽烷、羥基苯基二丙氧基矽烷、羥基苯基二戊基氧基矽烷、羥基苯基二苯基氧基矽烷、羥基苯基甲氧基苯基氧基矽烷等之羥基苯基氫矽烷化合物;   萘基二甲氧基矽烷、萘基甲氧基乙氧基矽烷、萘基二乙氧基矽烷、萘基甲氧基丙氧基矽烷、萘基甲氧基戊基氧基矽烷、萘基乙氧基丙氧基矽烷、萘基二丙氧基矽烷、萘基二戊基氧基矽烷、萘基二苯基氧基矽烷、萘基甲氧基苯基氧基矽烷等之萘基氫矽烷化合物;   苄基二甲氧基矽烷、苄基甲氧基乙氧基矽烷、苄基二乙氧基矽烷、苄基甲氧基丙氧基矽烷、苄基甲氧基戊基氧基矽烷、苄基乙氧基丙氧基矽烷、苄基二丙氧基矽烷、苄基二戊基氧基矽烷、苄基二苯基氧基矽烷、苄基甲氧基苯基氧基矽烷等之苄基氫矽烷化合物;   羥基苄基二甲氧基矽烷、羥基苄基甲氧基乙氧基矽烷、羥基苄基二乙氧基矽烷、羥基苄基甲氧基丙氧基矽烷、羥基苄基甲氧基戊基氧基矽烷、羥基苄基乙氧基丙氧基矽烷、羥基苄基二丙氧基矽烷、羥基苄基二戊基氧基矽烷、羥基苄基二苯基氧基矽烷、羥基苄基甲氧基苯基氧基矽烷等之羥基苄基氫矽烷化合物;   二甲基二甲氧基矽烷、二甲基甲氧基乙氧基矽烷、二甲基甲氧基丙氧基矽烷、二甲基二乙氧基矽烷、二甲基二戊基氧基矽烷、二甲基二苯基氧基矽烷、二甲基乙氧基丙氧基矽烷、二甲基二丙氧基矽烷等之二甲基矽烷化合物;   二乙基二甲氧基矽烷、二乙基甲氧基乙氧基矽烷、二乙基甲氧基丙氧基矽烷、二乙基二乙氧基矽烷、二乙基二戊基氧基矽烷、二乙基二苯基氧基矽烷、二乙基乙氧基丙氧基矽烷、二乙基二丙氧基矽烷等之二乙基矽烷化合物;   二丙基二甲氧基矽烷、二丙基甲氧基乙氧基矽烷、二丙基甲氧基丙氧基矽烷、二丙基二乙氧基矽烷、二丙基二戊基氧基矽烷、二丙基二苯基氧基矽烷、二丙基乙氧基丙氧基矽烷、二丙基二丙氧基矽烷等之二丙氧基矽烷化合物;   二丁基二甲氧基矽烷、二丁基甲氧基乙氧基矽烷、二丁基甲氧基丙氧基矽烷、二丁基二乙氧基矽烷、二丁基二戊基氧基矽烷、二丁基二苯基氧基矽烷、二丁基乙氧基丙氧基矽烷、二丁基二丙氧基矽烷等之二丁基矽烷化合物;   二苯基二甲氧基矽烷、二苯基甲氧基乙氧基矽烷、二苯基甲氧基丙氧基矽烷、二苯基二乙氧基矽烷、二苯基二戊基氧基矽烷、二苯基二苯基氧基矽烷、二苯基乙氧基丙氧基矽烷、二苯基二丙氧基矽烷等之二苯基矽烷化合物;   二(羥基苯基)二甲氧基矽烷、二(羥基苯基)甲氧基乙氧基矽烷、二(羥基苯基)甲氧基丙氧基矽烷、二(羥基苯基)二乙氧基矽烷、二(羥基苯基)二戊基氧基矽烷、二(羥基苯基)二苯基氧基矽烷、二(羥基苯基)乙氧基丙氧基矽烷、二(羥基苯基)二丙氧基矽烷等之二(羥基苯基)矽烷化合物;   二萘基二甲氧基矽烷、二萘基甲氧基乙氧基矽烷、二萘基甲氧基丙氧基矽烷、二萘基二乙氧基矽烷、二萘基二戊基氧基矽烷、二萘基二苯基氧基矽烷、二萘基乙氧基丙氧基矽烷、二萘基二丙氧基矽烷等之二萘基矽烷化合物;   二苄基二甲氧基矽烷、二苄基甲氧基乙氧基矽烷、二苄基甲氧基丙氧基矽烷、二苄基二乙氧基矽烷、二苄基二戊基氧基矽烷、二苄基二苯基氧基矽烷、二苄基乙氧基丙氧基矽烷、二苄基二丙氧基矽烷等之二苄基矽烷化合物;   二(羥基苄基)二甲氧基矽烷、二(羥基苄基)甲氧基乙氧基矽烷、二(羥基苄基)甲氧基丙氧基矽烷、二(羥基苄基)二乙氧基矽烷、二(羥基苄基)二戊基氧基矽烷、二(羥基苄基)二苯基氧基矽烷、二(羥基苄基)乙氧基丙氧基矽烷、二(羥基苄基)二丙氧基矽烷等之二(羥基苄基)矽烷化合物;   甲基乙基二甲氧基矽烷、甲基乙基甲氧基乙氧基矽烷、甲基乙基甲氧基丙氧基矽烷、甲基乙基二乙氧基矽烷、甲基乙基二戊基氧基矽烷、甲基乙基二苯基氧基矽烷、甲基乙基乙氧基丙氧基矽烷、甲基乙基二丙氧基矽烷等之甲基乙基矽烷化合物;   甲基丙基二甲氧基矽烷、甲基丙基甲氧基乙氧基矽烷、甲基丙基甲氧基丙氧基矽烷、甲基丙基二乙氧基矽烷、甲基丙基二戊基氧基矽烷、甲基丙基二苯基氧基矽烷、甲基丙基乙氧基丙氧基矽烷、甲基丙基二丙氧基矽烷等之甲基丙基矽烷化合物;   甲基丁基二甲氧基矽烷、甲基丁基甲氧基乙氧基矽烷、甲基丁基甲氧基丙氧基矽烷、甲基丁基二乙氧基矽烷、甲基丁基二戊基氧基矽烷、甲基丁基二苯基氧基矽烷、甲基丁基乙氧基丙氧基矽烷、甲基丁基二丙氧基矽烷等之甲基丁基矽烷化合物;   甲基(苯基)二甲氧基矽烷、甲基(苯基)甲氧基乙氧基矽烷、甲基(苯基)甲氧基丙氧基矽烷、甲基(苯基)二乙氧基矽烷、甲基(苯基)二戊基氧基矽烷、甲基(苯基)二苯基氧基矽烷、甲基(苯基)乙氧基丙氧基矽烷、甲基(苯基)二丙氧基矽烷等之甲基(苯基)矽烷化合物;   甲基(羥基苯基)二甲氧基矽烷、甲基(羥基苯基)甲氧基乙氧基矽烷、甲基(羥基苯基)甲氧基丙氧基矽烷、甲基(羥基苯基)二乙氧基矽烷、甲基(羥基苯基)二戊基氧基矽烷、甲基(羥基苯基)二苯基氧基矽烷、甲基(羥基苯基)乙氧基丙氧基矽烷、甲基(羥基苯基)二丙氧基矽烷等之甲基(羥基苯基)矽烷化合物;   甲基(萘基)二甲氧基矽烷、甲基(萘基)甲氧基乙氧基矽烷、甲基(萘基)甲氧基丙氧基矽烷、甲基(萘基)二乙氧基矽烷、甲基(萘基)二戊基氧基矽烷、甲基(萘基)二苯基氧基矽烷、甲基(萘基)乙氧基丙氧基矽烷、甲基(萘基)二丙氧基矽烷等之甲基(萘基)矽烷化合物;   甲基(苄基)二甲氧基矽烷、甲基(苄基)甲氧基乙氧基矽烷、甲基(苄基)甲氧基丙氧基矽烷、甲基(苄基)二乙氧基矽烷、甲基(苄基)二戊基氧基矽烷、甲基(苄基)二苯基氧基矽烷、甲基(苄基)乙氧基丙氧基矽烷、甲基(苄基)二丙氧基矽烷等之甲基(苄基)矽烷化合物;   甲基(羥基苄基)二甲氧基矽烷、甲基(羥基苄基)甲氧基乙氧基矽烷、甲基(羥基苄基)甲氧基丙氧基矽烷、甲基(羥基苄基)二乙氧基矽烷、甲基(羥基苄基)二戊基氧基矽烷、甲基(羥基苄基)二苯基氧基矽烷、甲基(羥基苄基)乙氧基丙氧基矽烷、甲基(羥基苄基)二丙氧基矽烷等之甲基(羥基苄基)矽烷化合物;   乙基丙基二甲氧基矽烷、乙基丙基甲氧基乙氧基矽烷、乙基丙基甲氧基丙氧基矽烷、乙基丙基二乙氧基矽烷、乙基丙基二戊基氧基矽烷、乙基丙基二苯基氧基矽烷、乙基丙基乙氧基丙氧基矽烷、乙基丙基二丙氧基矽烷等之乙基丙基矽烷化合物;   乙基丁基二甲氧基矽烷、乙基丁基甲氧基乙氧基矽烷、乙基丁基甲氧基丙氧基矽烷、乙基丁基二乙氧基矽烷、乙基丁基二戊基氧基矽烷、乙基丁基二苯基氧基矽烷、乙基丁基乙氧基丙氧基矽烷、乙基丁基二丙氧基矽烷等之乙基丁基矽烷化合物;   乙基(苯基)二甲氧基矽烷、乙基(苯基)甲氧基乙氧基矽烷、乙基(苯基)甲氧基丙氧基矽烷、乙基(苯基)二乙氧基矽烷、乙基(苯基)二戊基氧基矽烷、乙基(苯基)二苯基氧基矽烷、乙基(苯基)乙氧基丙氧基矽烷、乙基(苯基)二丙氧基矽烷等之乙基(苯基)矽烷化合物;   乙基(羥基苯基)二甲氧基矽烷、乙基(羥基苯基)甲氧基乙氧基矽烷、乙基(羥基苯基)甲氧基丙氧基矽烷、乙基(羥基苯基)二乙氧基矽烷、乙基(羥基苯基)二戊基氧基矽烷、乙基(羥基苯基)二苯基氧基矽烷、乙基(羥基苯基)乙氧基丙氧基矽烷、乙基(羥基苯基)二丙氧基矽烷等之乙基(羥基苯基)矽烷化合物;   乙基(萘基)二甲氧基矽烷、乙基(萘基)甲氧基乙氧基矽烷、乙基(萘基)甲氧基丙氧基矽烷、乙基(萘基)二乙氧基矽烷、乙基(萘基)二戊基氧基矽烷、乙基(萘基)二苯基氧基矽烷、乙基(萘基)乙氧基丙氧基矽烷、乙基(萘基)二丙氧基矽烷等之乙基(萘基)矽烷化合物;   乙基(苄基)二甲氧基矽烷、乙基(苄基)甲氧基乙氧基矽烷、乙基(苄基)甲氧基丙氧基矽烷、乙基(苄基)二乙氧基矽烷、乙基(苄基)二戊基氧基矽烷、乙基(苄基)二苯基氧基矽烷、乙基(苄基)乙氧基丙氧基矽烷、乙基(苄基)二丙氧基矽烷等之乙基(苄基)矽烷化合物;   乙基(羥基苄基)二甲氧基矽烷、乙基(羥基苄基)甲氧基乙氧基矽烷、乙基(羥基苄基)甲氧基丙氧基矽烷、乙基(羥基苄基)二乙氧基矽烷、乙基(羥基苄基)二戊基氧基矽烷、乙基(羥基苄基)二苯基氧基矽烷、乙基(羥基苄基)乙氧基丙氧基矽烷、乙基(羥基苄基)二丙氧基矽烷等之乙基(羥基苄基)矽烷化合物;   丙基丁基二甲氧基矽烷、丙基丁基甲氧基乙氧基矽烷、丙基丁基甲氧基丙氧基矽烷、丙基丁基二乙氧基矽烷、丙基丁基二戊基氧基矽烷、丙基丁基二苯基氧基矽烷、丙基丁基乙氧基丙氧基矽烷、丙基丁基二丙氧基矽烷等之丙基丁基矽烷化合物;   丙基(苯基)二甲氧基矽烷、丙基(苯基)甲氧基乙氧基矽烷、丙基(苯基)甲氧基丙氧基矽烷、丙基(苯基)二乙氧基矽烷、丙基(苯基)二戊基氧基矽烷、丙基(苯基)二苯基氧基矽烷、丙基(苯基)乙氧基丙氧基矽烷、丙基(苯基)二丙氧基矽烷等之丙基(苯基)矽烷化合物;   丙基(羥基苯基)二甲氧基矽烷、丙基(羥基苯基)甲氧基乙氧基矽烷、丙基(羥基苯基)甲氧基丙氧基矽烷、丙基(羥基苯基)二乙氧基矽烷、丙基(羥基苯基)二戊基氧基矽烷、丙基(羥基苯基)二苯基氧基矽烷、丙基(羥基苯基)乙氧基丙氧基矽烷、丙基(羥基苯基)二丙氧基矽烷等之丙基(羥基苯基)矽烷化合物;   丙基(萘基)二甲氧基矽烷、丙基(萘基)甲氧基乙氧基矽烷、丙基(萘基)甲氧基丙氧基矽烷、丙基(萘基)二乙氧基矽烷、丙基(萘基)二戊基氧基矽烷、丙基(萘基)二苯基氧基矽烷、丙基(萘基)乙氧基丙氧基矽烷、丙基(萘基)二丙氧基矽烷等之丙基(萘基)矽烷化合物;   丙基(苄基)二甲氧基矽烷、丙基(苄基)甲氧基乙氧基矽烷、丙基(苄基)甲氧基丙氧基矽烷、丙基(苄基)二乙氧基矽烷、丙基(苄基)二戊基氧基矽烷、丙基(苄基)二苯基氧基矽烷、丙基(苄基)乙氧基丙氧基矽烷、丙基(苄基)二丙氧基矽烷等之丙基(苄基)矽烷化合物;   丙基(羥基苄基)二甲氧基矽烷、丙基(羥基苄基)甲氧基乙氧基矽烷、丙基(羥基苄基)甲氧基丙氧基矽烷、丙基(羥基苄基)二乙氧基矽烷、丙基(羥基苄基)二戊基氧基矽烷、丙基(羥基苄基)二苯基氧基矽烷、丙基(羥基苄基)乙氧基丙氧基矽烷、丙基(羥基苄基)二丙氧基矽烷等之丙基(羥基苄基)矽烷化合物。   [0048] 藉由將以上說明之矽烷化合物依常法進行水解縮合,而得到矽氧烷樹脂。   矽氧烷樹脂的質量平均分子量較佳為300~30000,更佳為500~10000。可混合2種以上不同質量平均分子量之矽氧烷樹脂。矽氧烷樹脂之質量平均分子量為該範圍內時,容易得到製膜性優異,可形成平坦之含矽樹脂薄膜或二氧化矽薄膜之含矽樹脂組成物。   [0049] 作為水解縮合以上說明之矽烷化合物所得之矽氧烷樹脂的適合之例,可列舉具有下述式(a-1)表示之構造單位的矽氧烷樹脂。在該矽氧烷樹脂,碳原子之數相對於矽原子1個為2個以上。(式(a-1)中,R1 為烷基、芳基或芳烷基,R2 為氫或烷基、芳基或芳烷基,m為0或1)。   [0050] 在R1 及R2 之烷基、芳基或芳烷基係與在前述之式(I)之烷基、芳基或芳烷基相同。   如上述,藉由使用具有烷基、芳基或芳烷基之矽氧烷樹脂,可形成耐久性優異之二氧化矽薄膜,容易得到對微小空間的填充容易之含矽樹脂組成物。   [0051] 作為烷基,較佳為碳原子數1~5之烷基,可列舉甲基、乙基、n-丙基、i-丙基、n-丁基、tert-丁基等。如此藉由具有碳原子數1~5之烷基,容易形成耐熱性良好之二氧化矽薄膜。   作為芳基及芳烷基,可列舉苄基、苯乙基、苯基、萘基、蒽基、菲基、聯苯基、茀基及芘基等。   [0052] 作為芳基及芳烷基,具體而言,較佳可列舉具有下述之構造者。[0053] 上述式中,R3 為氫原子;羥基;甲氧基、乙氧基、丁氧基、丙氧基等之烷氧基;甲基、乙基、丁基、丙基等之烴基,R4 為亞甲基、伸乙基、伸丙基、伸丁基等之伸烷基。尚,上述芳香族烴基可於在該芳香族烴基中之至少一個芳香環,具有上述R3 ,亦可具有複數個。具有複數個R3 時,此等之R3 可為相同,亦可為相異。   [0054] 作為特佳之R1 ,較佳為具有下述之構造(R1 -a)或構造(R1 -b)之基,特佳為(R1 -b)。[0055] 在式(a-1),較佳為m為0,該情況下,矽氧烷樹脂係具有半矽氧烷骨架。進而,矽氧烷樹脂更佳為階梯型之半矽氧烷。   [0056] 進而,在式(a-1)表示之構造單位(單位骨架),相對於矽原子1個,較佳為碳原子為具有成為2個以上15個以下之原子數比。   [0057] 矽氧烷樹脂可具有2種類以上構造單位(a-1)。又,矽氧烷樹脂可為混合由不同構造單位(a-1)所構成之矽氧烷樹脂者。   作為具有2種類以上構造單位(a-1)之矽氧烷樹脂,具體而言,可列舉下述之構造式(A-1-1)~(A-1-3)表示之矽氧烷樹脂。 [0058] 作為矽氧烷樹脂,例如可為含有下式(A-1-4)表示之構成單位者。式(A-1-4)中,R13 係於其構造中具有選自由(甲基)丙烯醯基、乙烯基及環氧基所構成之群組中之至少一種的基之有機基。選自由(甲基)丙烯醯基、乙烯基及環氧基所構成之群組中之至少一種的基,可直接與Si原子鍵結,亦可透過連結基鍵結。連結基例如為碳原子數1~10之可為直鏈亦可為分支鏈之伸烷基或伸芳基,或組合此等之2價基。連結基可具有醚鍵、胺基鍵或醯胺鍵。   [0059] (A-1-4)表示之構成單位,例如雖可列舉以下者,但並非被限定於此等。[0060] 又,R13 為具有環氧基時,作為R13 ,列舉2-(3,4-環氧環己基)乙基及2-(3,4-環氧環己基)丙基作為適合之例。   [0061] 作為矽氧烷樹脂,例如可為含有下式(A-1-5)表示之構成單位者。[0062] 式(A-1-5)中,R14 係於其構造中至少具有一個羧基之有機基。羧基較佳為透過連結基與Si原子鍵結,連結基例如為碳原子數1~10之可為直鏈亦可為分支鏈之伸烷基、環伸烷基或伸芳基,或組合此等之2價基。   連結基可具有醚鍵、胺基鍵、醯胺鍵或乙烯鍵,較佳為具有醯胺鍵。R14 ,例如雖可列舉以下者,但並非被限定於此等。尚,下式中*係意指與式(A-1-5)中之Si鍵結之R14 之鍵結部的末端。[0063] 含矽樹脂組成物可包含後述之硬化劑(C)。在包含硬化劑(C)之含矽樹脂組成物,(i)在硬化劑(C)包含藉由光或熱產生鹼成分之硬化劑時,(ii)在含矽樹脂組成物包含後述之其他成分之光聚合起始劑、酸產生劑或鹼產生劑所構成之群組中之至少一個時,或(iii)在後述之薄膜之製造方法具有曝光步驟時,矽氧烷樹脂較佳為含有(A-1-4)表示之構成單位。同樣,又,(iv)在包含由後述之其他成分之光聚合起始劑、酸產生劑或鹼產生劑所構成之群組中之至少一個(排除相當於硬化劑(C)者)時,矽氧烷樹脂較佳為含有(A-1-4)表示之構成單位。矽氧烷樹脂中之(A-1-4)表示之構成單位的含有比例,例如為10~80莫耳%。作為其他構成單位,可進一步包含式(a-1)表示之構造單位及/或(A-1-5)表示之構成單位。又,可包含2種以上相當於各式之構成單位。   [0064] 在後述之薄膜之製造方法,具有顯影步驟時,矽氧烷樹脂較佳為含有選自由(A-1-5)表示之構成單位、具有構造(R1 -a)之構成單位及具有構造(R1 -b)之構成單位所構成之群組中之1種以上的構成單位。選自由矽氧烷樹脂中之(A-1-5)表示之構成單位、具有構造(R1 -a)之構成單位及具有構造(R1 -b)之構成單位所構成之群組中之構成單位的含有比例,例如為20~90莫耳%。此情況下,作為其他構成單位,可進一步包含式(a-1)表示之構造單位及/或(A-1-4)表示之構成單位,較佳為包含(A-1-4)表示之構成單位及(A-1-5)表示之構成單位的矽氧烷樹脂。又,可包含2種以上相當於各式之構成單位。   [0065] (聚矽烷)   聚矽烷的構造並未被特別限定。聚矽烷雖可為直鏈狀,亦可為分支鏈狀,亦可為網目狀,亦可為環狀,但較佳為直鏈狀或分支鏈狀之鏈狀構造。   聚矽烷可含有矽醇基及/或烷氧基。   作為適合之聚矽烷,例如可列舉必須包含下式(A5)及(A6)表示之單位中之至少一個,且任意含有選自下式(A7)、(A8)及(A9)表示之單位中之至少一個的單位之聚矽烷。該聚矽烷可含有矽醇基或與矽原子鍵結之烷氧基。   [0066](式(A5)、(A7)及(A8)中,Ra3 及Ra4 表示氫原子、有機基或甲矽烷基;Ra5 表示氫原子或烷基;Ra5 為烷基時,較佳為碳原子數1~4之烷基,更佳為甲基及乙基)。   [0067] 針對Ra3 及Ra4 ,作為有機基,可列舉烷基、烯基、環烷基、環烯基、芳基、芳烷基等之烴基或烷氧基、烯基氧基、環烷氧基、環烯基氧基、芳基氧基、芳烷基氧基等。   於此等之基當中,較佳為烷基、芳基及芳烷基。烷基、芳基及芳烷基的適合之例係與前述之式(A1)中之R為烷基、芳基或芳烷基時之例相同。   [0068] Ra3 及Ra4 為甲矽烷基時,作為甲矽烷基,可列舉甲矽烷基、二矽烷基(silanyl)、三矽烷基(silanyl)等之Si1-10 矽烷基(silanyl)(Si1-6 矽烷基(silanyl)等)。   聚矽烷較佳為包含下述(A10)至(A13)的單元。(A10)至(A13)中,Ra3 及Ra4 係與在式(A5)、(A7)及(A8)中之Ra3 及Ra4 相同。a、b及c分別為2~1000之整數。   a、b及c分別較佳為10~500,更佳為10~100。各單元中之構成單位,可於單元中包含無規,亦可以經嵌段化之狀態包含。   [0069] 於經以上說明之聚矽烷當中,較佳為分別與矽原子鍵結之包含組合烷基、與芳基或芳烷基之聚矽烷或僅烷基與矽原子鍵結之聚矽烷。更具體而言,優選使用分別與矽原子鍵結之包含組合甲基、與苄基之聚矽烷,或分別與矽原子鍵結之包含組合甲基、與苯基之聚矽烷或僅甲基與矽原子鍵結之聚矽烷。   [0070] 聚矽烷之質量平均分子量較佳為300~100000,更佳為500~70000,再更佳為800~30000。可混合2種以上不同質量平均分子量之聚矽烷。   [0071] 含矽樹脂組成物中之含矽樹脂(A)的含量並未特別限定,因應所期望膜厚來設定即可。從製膜性的點來看,含矽樹脂組成物中之含矽樹脂(A)的含量較佳為1~50質量%,更佳為5~40質量%,特佳為10~35質量%。   [0072] [量子點(B)]   含矽樹脂組成物包含量子點(B)。   量子點(B)只要為能發揮作為量子點之機能的微粒子,其構造或其構成成分並未被特別限定。量子點(B)為依照量子力學具有獨特光學特性(後述之量子封閉效果)之奈米級的材料,一般為半導體奈米粒子。在本說明書,量子點(B)亦包含於半導體奈米粒子表面進一步為了提昇發光量子收率而被覆者(具有後述之殼構造者),或為了安定化量子點而表面修飾者。   [0073] 量子點(B)雖吸收較帶隙(價電子帶及傳導帶之能量差)更大之能量的光子,而成為釋出因應其粒子徑之波長的光之半導體奈米粒子,但作為量子點(B)之材料所包含之元素,例如可列舉選自由II族元素(2A族、2B族)、III族元素(尤其是3A族)、IV族元素(尤其是4A族)、V族元素(尤其是5A族)及VI族元素(尤其是6A族)所構成之群組中之1種以上。作為量子點(B)之材料較佳之化合物或元素,例如可列舉II-VI族化合物、III-V族化合物、IV-VI族化合物、IV族元素、IV族化合物及此等之組合。   [0074] 作為II-VI族化合物,可列舉選自由CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、MgSe、MgS及此等之混合物所構成之群組中之至少一種的化合物;選自由CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、MgZnSe、MgZnS及此等之混合物所構成之群組中之至少一種的化合物;及選自由HgZnTeS、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe及此等之混合物所構成之群組中之至少一種的化合物。   [0075] 作為III-V族化合物,可列舉選自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb及此等之混合物中之至少一種的化合物;選自GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP及此等之混合物中之至少一種的化合物;及選自GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb及此等之混合物中之至少一種的化合物。   [0076] 作為IV-VI族化合物,可列舉選自SnS、SnSe、SnTe、PbS、PbSe、PbTe及此等之混合物中之至少一種的化合物;選自SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe及此等之混合物中之至少一種的化合物;及選自SnPbSSe、SnPbSeTe、SnPbSTe及此等之混合物中之至少一種的化合物。   [0077] 作為IV族元素,可列舉選自Si、Ge及此等之混合物中之至少一種的化合物。作為IV族化合物,可列舉選自SiC、SiGe及此等之混合物中之至少一種的化合物。   [0078] 量子點(B)之構造雖可為由1種之化合物所構成之均質構造,亦可為由2種以上之化合物所構成之複合構造,但為了提昇上述化合物之發光量子收率,量子點(B)的構造,較佳為芯為以1層以上之殼層被覆之芯-殼構造,更佳為將作為芯的材質之化合物的粒子表面以半導體材料被覆在磊晶(Epitaxial)之構造。例如作為芯之材質,使用II-VI族之CdSe時,作為該被覆層(殼),係使用ZnS。殼較佳為與芯的材質相同之格子定數,適當選擇芯-殼之格子定數的差較小之材料的組合。   [0079] 從安全性的點來看,量子點(B)未包含Cd或Pb作為構成成分,較佳為包含In或Si等作為構成成分,更佳為包含In。   [0080] 作為未具有殼層之均質構造型的量子點(B)之適合的具體例,可列舉AgInS2 及被摻雜Zn之AgInS2 。   作為芯-殼型之量子點(B),可列舉InP/ZnS、CuInS2 /ZnS及(ZnS/AgInS2 )固溶體/ZnS。   尚,在上述,記載有芯-殼型之量子點(B)的材質係作為(芯之材質)/(殼層之材質)。   [0081] 又,以提昇安全性與發光量子收率的點來看,較佳為將芯-殼構造的殼成為多層構造,更佳為成為2層。   為芯-多層殼構造時,作為芯之材質,較佳為選自由InP、ZnS、ZnSe所構成之群組中之至少一種的化合物,更佳為包含InP。作為含有比例,芯的總質量當中,InP為50~100質量%,較佳為60~99質量%,更佳為82~95質量%。又,芯的總質量當中,ZnS及/或ZnSe為0~50質量%,較佳為1~40質量%,更佳為5~18質量%。   [0082] 在多層殼構造之第1殼的材質較佳為ZnS及/或ZnSe。作為ZnS及/或ZnSe之含有比例,將第1殼的全質量作為基準,例如為50~100質量%,較佳為75~98質量%,更佳為80~97質量%。第1殼的材質為ZnS及ZnSe的混合物時,混合比(質量比)並未特別限定,為1/99~99/1,較佳為10/90~90/10。   [0083] 在多層殼構造,使第2殼成長於第1殼的表面上。第2殼的材質較佳為與第1殼的材質為同等(惟,在各材質,對於芯之格子定數的差不同。亦即,在各材質,排除99%以上同質者)。作為ZnS及/或ZnSe之含有比例,將第2殼的全質量作為基準,例如為50~100質量%,較佳為75~98質量%,更佳為80~97質量%。第2殼的材質為ZnS及ZnSe的混合物時,混合比(質量比)並未特別限定,為1/99~99/1,為10/90~90/10。   [0084] 在多層殼構造之第1殼與第2殼於格子定數具有差異。   例如,芯與第1殼之間的格子定數差為2~8%,較佳為2~6%,更佳為3~5%。   又,芯與第2殼之間的格子定數差為5~13%,較佳為5~12%,更佳為7~10%,再更佳為8~10%。   [0085] 又,第1殼與第2殼之格子定數的差,例如為3~9%,較佳為3~7%,更佳為4~6%。   [0086] 藉由此等之芯-多層殼構造之量子點(B)可具有400~800nm的範圍(進而為470~650nm的範圍,尤其是540nm~580nm的範圍)之發光波長(emission wavelength)。   [0087] 作為藉由此等之芯-多層殼構造之量子點(B),例如可列舉InP/ZnS/ZnSe及InP/ZnSe/ZnS。   [0088] 又,量子點(B)可被表面修飾。例如可列舉膦、膦氧化物、三烷基膦類等之磷化合物;吡啶、胺基烷烴類、第3級胺類等之有機氮化合物;巰基醇、硫醇、二烷基硫化物類、二烷基亞碸類等之有機硫化合物;高級脂肪酸、醇類等之表面修飾劑(有機配位子)。   [0089] 上述之量子點(B)可組合2種以上使用,可組合芯-(多層)殼型之量子點(B)、與均質構造型之量子點(B)使用。   [0090] 若量子點(B)之平均粒子徑為可作為量子點進行機能的範圍內,則並未特別限定,較佳為0.5~20nm,更佳為1.0~15nm,再更佳為2~7nm。   為芯-(多層)殼型之量子點(B)時,芯的尺寸例如為0.5~10nm,較佳為2~5nm。殼之平均厚度較佳為0.4~2nm,更佳為0.4~1.4nm。殼為由第1殼與第2殼所構成時,第1殼之平均厚度例如為0.2~1nm,較佳為0.2~0.7。第2殼之平均厚度無論第1殼之平均厚度如何,例如為0.2~1nm,較佳為0.2~0.7。   [0091] 具有該範圍內之平均粒子徑的量子點(B)發揮量子封閉效果,作為量子點進行良好機能的同時,調製容易,具有安定之螢光特性。   尚,量子點(B)之平均粒子徑,例如可藉由將量子點(B)之分散液塗佈・乾燥於基板上,去除揮發成分後,將其表面以透過型電子顯微鏡(TEM)觀察,來定義。通常情況下,作為藉由TEM圖像之圖像解析所得之各粒子的等效圓直徑之數平均徑,可定義其平均粒子徑。   [0092] 量子點(B)的形狀並未被特別限定。作為量子點(B)的形狀之例,可列舉球狀、橢圓球狀、圓柱狀、多角柱狀、圓盤狀及多面體狀等。   此等當中,從操作的容易性、取得容易性的觀點來看,較佳為球狀。   [0093] 從作為光學薄膜之特性或波長變換特性良好的點來看,量子點(B)較佳為包含選自由於500~600nm的波長區域具有螢光極大之化合物(B1)及於600~700nm的波長區域具有螢光極大之化合物(B2)所構成之群組中之1種以上,更佳為選自由化合物(B1)及化合物(B2)所構成之群組中之1種以上所構成。   [0094] 量子點(B)之製造方法並未被特別限定。可將以周知之各種方法製造之量子點作為量子點(B)使用。作為量子點(B)之製造方法,例如可採用於配位性之有機溶劑中熱分解有機金屬化合物之方法。   又,芯-殼構造型之量子點(B),可藉由由反應形成均質之芯後,於經分散之芯的存在下,使殼層之前驅物進行反應,而形成殼層之方法製得。又,例如具有上述芯-多層殼構造之量子點(B)可藉由WO2013/127662號公報所記載之方法製得。   尚,亦可使用市售之各種量子點(B)。   [0095] 量子點(B)的含量相對於含矽樹脂組成物全體的質量,例如為0.05~15質量%。量子點(B)具有殼層時,或被表面修飾時,較佳為1~12質量%,更佳為3~10質量%。量子點(B)僅為半導體奈米粒子時(不具有殼層及/或表面修飾劑時),較佳為0.07~3質量%,更佳為0.1~1質量%。藉由將量子點(B)的含量成為上述的範圍,可輕易得到可形成作為光學薄膜之特性或波長變換特性良好之薄膜的含矽樹脂組成物。   [0096] [硬化劑(C)]   含矽樹脂組成物可包含硬化劑(C)。含矽樹脂組成物包含硬化劑(C)時,藉由N-甲基-2-吡咯啶酮等之有機溶劑,不易溶解、膨潤、變形,容易形成有機溶劑耐性優異之二氧化矽薄膜。   [0097] 作為硬化劑(C)之適合的例,可列舉鹽酸、硫酸、硝酸、苯磺酸及p-甲苯磺酸等之布氏酸(Bronsted acid);2-甲基咪唑、2-乙基-4-甲基咪唑等之咪唑類;2,4,6-參(二甲基胺基甲基)酚、苄基甲基胺、DBU(1,8-二氮雜聯環[5.4.0]-7-十一碳烯)、DCMU(3-(3,4-二氯苯基)-1,1-二甲基尿素)等之有機胺類;三氯化磷、三溴化磷、亞磷酸、亞磷酸三甲酯、亞磷酸三乙酯、亞磷酸三丙酯等之PX3 (式中,X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之磷化合物;氧基三氯化磷、氧基三溴化磷、磷酸、磷酸三甲酯、磷酸三乙酯、磷酸三丙酯等之POX3 (式中,X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之磷化合物;五氧化二磷;聚磷酸或聚磷酸酯等之H(HPO3 )a OH(式中,a為1以上之整數)表示之磷化合物;甲基二氯膦、乙基二氯膦、甲氧基二氯膦等之RC0 PX2 (式中,RC0 為氫原子或碳原子數1~30之有機基,該有機基中之氫原子可被鹵素原子取代。X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之磷化合物;亞磷酸二甲酯、亞磷酸二乙酯、甲基膦酸、甲基膦酸二甲酯、甲基膦酸二氯化物、苯基膦酸、苯基膦酸二氯化物、苄基膦酸二乙酯等之RC0 POX2 (式中,RC0 為氫原子或碳原子數1~30之有機基,該有機基中之氫原子可被鹵素原子取代。X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之磷化合物;三丁基膦、三苯基膦、參(p-甲苯基)膦、參(m-甲苯基)膦、參(o-甲苯基)膦、二苯基環己基膦、三環己基膦、參(二甲氧基苯基)膦、乙基三苯基溴化鏻、苄基三苯基氯化鏻、1,4-雙二苯基膦基丁烷等之有機磷化合物;三氟化硼、三氯化硼、硼酸、硼酸三甲酯、硼酸三乙酯、硼酸三丙酯、硼酸三丁酯、硼酸三戊酯、硼酸三己酯、硼酸三環戊酯、硼酸三環己酯、硼酸三烯丙酯、硼酸三苯酯、硼酸乙基二甲酯等之BX3 (式中,X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之硼化合物;氧化硼(B2 O3 );苯基硼酸、二異丙氧基(甲基)硼烷、甲基硼酸、環己基硼酸等之RC0 BX2 (式中,RC0 為氫原子或碳原子數1~30之有機基,該有機基中之氫原子可被鹵素原子取代。X為鹵素原子、羥基或碳原子數1~6之烷氧基)表示之硼化合物;三苯基膦三苯基硼烷、四苯基鏻四-p-甲苯硼酸酯、四苯基鏻四苯基硼酸酯、四苯基鏻硫氰酸酯、四苯基鏻二氰胺、n-丁基三苯基鏻二氰胺等之有機磷化合物的複合體;三氟化硼等之路易斯酸之有機胺錯合物(作為有機胺,例如有哌啶);氮雜聯環十一碳烯、二氮雜聯環十一碳烯甲苯磺酸鹽或二氮雜聯環十一碳烯辛酸鹽等之脒類。   [0098] 又,使用上述聚矽烷作為(A)成時,除了上述硬化劑,較佳為或單獨使用,或使用藉由光或熱產生鹼成分之硬化劑。   [0099] (藉由熱產生鹼成分之硬化劑)   作為藉由熱產生鹼成分之硬化劑,可不特別限定使用自以往即作為熱鹼產生劑使用之化合物。   例如可將2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮作為藉由熱產生鹼成分之效果劑使用。尚,2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮亦可藉由光之作用來產生鹼。   [0100] 又,藉由加熱產生下式(C1)表示之咪唑化合物之化合物(以下亦記為熱咪唑產生劑)亦優選作為硬化劑使用。(式(C1)中,Rc1 、Rc2 及Rc3 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、膦基、磺酸根基、氧膦基(phosphinyl)、膦醯根基(Phosphonato)或有機基)。   [0101] 作為在Rc1 、Rc2 及Rc3 之有機基,可列舉烷基、烯基、環烷基、環烯基、芳基、芳烷基等。此有機基可於該有機基中包含雜原子等之烴基以外之鍵結或取代基。又,此有機基可為直鏈狀、分支鏈狀、環狀之任一種。此有機基雖通常為1價,但形成環狀構造的情況等,可成為2價以上之有機基。   [0102] Rc1 及Rc2 可鍵結該等而形成環狀構造,可進一步包含雜原子之鍵結。作為環狀構造,可列舉雜環烷基、雜芳基等,亦可為縮合環。   [0103] Rc1 、Rc2 及Rc3 之有機基所包含之鍵結,只要不損害本發明的效果,則並未特別限定,有機基可包含氧原子、氮原子、矽原子等之包含雜原子之鍵結。作為包含雜原子之鍵結的具體例,可列舉醚鍵、硫醚鍵、羰基鍵、硫羰基鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵、亞胺鍵 (-N=C(-R)-、-C(=NR)-:R表示氫原子或有機基)、碳酸酯鍵、磺醯基鍵、亞磺醯基鍵、偶氮鍵等。   [0104] 作為包含Rc1 、Rc2 及Rc3 之可具有有機基之雜原子的鍵結,從咪唑化合物之耐熱性的觀點來看,較佳為醚鍵、硫醚鍵、羰基鍵、硫羰基鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵、亞胺鍵(-N=C(-R)-、-C(=NR)-:R表示氫原子或1價之有機基)、碳酸酯鍵、磺醯基鍵、亞磺醯基鍵。   [0105] Rc1 、Rc2 及Rc3 之有機基為烴基以外之取代基時,Rc1 、Rc2 及Rc3 只要不損害本發明的效果,則並未被特別限定。作為Rc1 、Rc2 及Rc3 之具體例,可列舉鹵素原子、羥基、巰基、硫化物基、氰基、異氰基、氰氧基(cyanato)、異氰氧基、硫氰酸酯基、異硫氰酸酯基、甲矽烷基、矽醇基、烷氧基、烷氧基羰基、胺甲醯基、硫代胺甲醯基、硝基、亞硝基、羧酸酯基、醯基、醯基氧基、亞磺酸基、磺酸根基、膦基、氧膦基(phosphinyl)、膦醯根基、烷基醚基、烯基醚基、烷硫基醚基、烯硫基醚基、芳基醚基、芳硫基醚基等。上述取代基所包含之氫原子可被烴基取代。又,上述取代基所包含之烴基可為直鏈狀、分支鏈狀及環狀之任一種。   [0106] 作為Rc1 、Rc2 及Rc3 ,較佳為氫原子、碳原子數1~12之烷基、碳原子數1~12之芳基、碳原子數1~12之烷氧基及鹵素原子,更佳為氫原子。   [0107] 熱咪唑產生劑若為可藉由加熱產生上述式(C1)表示之咪唑化合物的化合物,則並未被特別限定。對於自以往摻合在各種組成物,藉由熱之作用產生胺之化合物(熱鹼產生劑),藉由將源自加熱時所產生之胺的骨架,取代成源自上述式(C1)表示之咪唑化合物之骨架,而得到作為熱咪唑產生劑使用之化合物。   [0108] 作為適合之熱咪唑產生劑,可列舉下述式(C2)表示之化合物,(式(C2)中,Rc1 、Rc2 及Rc3 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦醯根基或有機基。Rc4 及Rc5 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦醯根基或有機基。Rc6 、Rc7 、Rc8 、Rc9 及Rc10 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦醯根基、胺基、銨基或有機基。Rc6 、Rc7 、Rc8 、Rc9 及Rc10 可鍵結該等之2個以上而形成環狀構造,可包含雜原子之鍵結)。   [0109] 在式(C2),Rc1 、Rc2 及Rc3 係與對於式(C1)進行說明者相同。   [0110] 在式(C2),Rc4 及Rc5 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦醯根基或有機基。   [0111] 作為在Rc4 及Rc5 之有機基,可列舉針對Rc1 、Rc2 及Rc3 所例示者。此有機基係與Rc1 、Rc2 及Rc3 的情況相同,可於該有機基中包含雜原子。又,此有機基可為直鏈狀、分支鏈狀、環狀之任一種。   [0112] 以上當中,作為Rc4 及Rc5 ,較佳為分別獨立為氫原子、碳原子數1~10之烷基、碳原子數4~13之環烷基、碳原子數4~13之環烯基、碳原子數7~16之芳基氧基烷基、碳原子數7~20之芳烷基、具有氰基之碳原子數2~11之烷基、具有羥基之碳原子數1~10之烷基、碳原子數1~10之烷氧基、碳原子數2~11之醯胺基、碳原子數1~10之烷硫基、碳原子數1~10之醯基、碳原子數2~11之酯基(-COOR、-OCOR:R表示烴基)、碳原子數6~20之芳基、取代供電子基及/或吸電子基之碳原子數6~20之芳基、取代供電子基及/或吸電子基之苄基、氰基、甲硫基。更佳為Rc4 及Rc5 之雙方為氫原子,或Rc4 為甲基,Rc5 為氫原子。   [0113] 在式(C2),Rc6 、Rc7 、Rc8 、Rc9 及Rc10 分別獨立表示氫原子、鹵素原子、羥基、巰基、硫化物基、甲矽烷基、矽醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦醯根基、胺基、銨基或有機基。   [0114] 作為在Rc6 、Rc7 、Rc8 、Rc9 及Rc10 之有機基,可列舉在Rc1 、Rc2 及Rc3 所例示者。此有機基係與Rc1 及Rc2 的情況相同,可於該有機基中包含雜原子等之烴基以外之鍵結或取代基。又,此有機基可為直鏈狀、分支鏈狀、環狀之任一種。   [0115] Rc6 、Rc7 、Rc8 、Rc9 及Rc10 可鍵結該等之2個以上而形成環狀構造,可包含雜原子之鍵結。作為環狀構造,可列舉雜環烷基、雜芳基等,亦可為縮合環。例如,Rc6 、Rc7 、Rc8 、Rc9 及Rc10 可鍵結該等之2個以上,共有鍵結Rc6 、Rc7 、Rc8 、Rc9 及Rc10 之苯環的原子,而形成萘、蒽、菲、茚等之縮合環。   [0116] 以上當中,作為Rc6 、Rc7 、Rc8 、Rc9 及Rc10 ,較佳為分別獨立為氫原子、碳原子數1~10之烷基、碳原子數4~13之環烷基、碳原子數4~13之環烯基、碳原子數7~16之芳基氧基烷基、碳原子數7~20之芳烷基、具有氰基之碳原子數2~11之烷基、具有羥基之碳原子數1~10之烷基、碳原子數1~10之烷氧基、碳原子數2~11之醯胺基、碳原子數1~10之烷硫基、碳原子數1~10之醯基、碳原子數2~11之酯基、碳原子數6~20之芳基、取代供電子基及/或吸電子基之碳原子數6~20之芳基、取代供電子基及/或吸電子基之苄基、氰基、甲硫基、硝基。   [0117] 又,作為Rc6 、Rc7 、Rc8 、Rc9 及Rc10 ,可鍵結該等之2個以上,共有鍵結Rc6 、Rc7 、Rc8 、Rc9 及Rc10 之苯環的原子,而形成萘、蒽、菲、茚等之縮合環的情況亦佳。   [0118] 於上述式(C2)表示之化合物當中,較佳為下述式(C3)表示之化合物,(式(C3)中,Rc1 、Rc2 及Rc3 係與式(C1)及(C2)同義。Rc4 ~Rc9 係與式(C2)同義。Rc11 表示氫原子或有機基。Rc6 及Rc7 不會成為羥基。Rc6 、Rc7 、Rc8 及Rc9 可鍵結該等之2個以上而形成環狀構造,可包含雜原子之鍵結)。   [0119] 式(C3)表示之化合物由於具有取代基-O-Rc11 ,故對於有機溶劑之溶解性優異。   [0120] 在式(C3),Rc11 為氫原子或有機基。Rc11 為有機基時,作為有機基,可列舉在Rc1 、Rc2 及Rc3 所例示者。此有機基可於該有機基中包含雜原子。又,此有機基可為直鏈狀、分支鏈狀、環狀之任一種。作為Rc11 ,較佳為氫原子、碳原子數1~12之烷基或烷氧基烷基,更佳為甲基、乙基、n-丙基、i-丙基、n-丁基、i-丁基、t-丁基、甲氧基甲基、乙氧基甲基、甲氧基乙基、乙氧基乙基、丙氧基甲基、丁氧基甲基。   [0121] 將作為熱咪唑產生劑特別適合之化合物的具體例示於以下。[0122] (肟酯化合物)   肟酯化合物係藉由光之作用進行分解而產生鹼。作為適合之肟酯化合物,可列舉下述式(C4)表示之化合物。[0123] 上述式(C4)中,Rc12 表示碳原子數1~10之烷基、可具有取代基之苯基或可具有取代基之咔唑基。m1為0或1。Rc13 表示可具有取代基之碳原子數1~10之烷基、可具有取代基之苯基或可具有取代基之咔唑基。Rc14 表示氫原子、碳原子數1~6之烷基或可具有取代基之苯基。   [0124] Rc12 為碳原子數1~10之烷基時,烷基可為直鏈亦可為分支鏈。此情況下,烷基之碳原子數較佳為1~8,更佳為1~5。   [0125] Rc12 為可具有取代基之苯基時,取代基的種類於不阻礙本發明目的的範圍,並未被特別限定。作為可具有苯基之取代基的適合之例,可列舉烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、胺基、被1或2之有機基取代之胺基、嗎啉-1-基及哌嗪-1-基、鹵素、硝基及氰基等。Rc12 為可具有取代基之苯基,苯基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0126] 苯基所具有之取代基為烷基時,其碳原子數較佳為1~20,更佳為1~10,再更佳為1~6,特佳為1~3,最佳為1。又,烷基可為直鏈,亦可為分支鏈。作為苯基所具有之取代基為烷基時之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、sec-戊基、tert-戊基、n-己基、n-庚基、n-辛基、異辛基、sec-辛基、tert-辛基、n-壬基、異壬基、n-癸基及異癸基等。又,烷基可於碳鏈中包含醚鍵(-O-)。此情況下,作為苯基所具有之取代基,例如可列舉烷氧基烷基、烷氧基烷氧基烷基。苯基所具有之取代基為烷氧基烷基時,較佳為-Rc15 -O-Rc16 表示之基。Rc15 為碳原子數1~10之可為直鏈亦可為分支鏈之伸烷基。Rc16 為碳原子數1~10之可為直鏈亦可為分支鏈之烷基。Rc15 之碳原子數較佳為1~8,更佳為1~5,特佳為1~3。Rc16 之碳原子數較佳為1~8,更佳為1~5,特佳為1~3,最佳為1。作為於碳鏈中具有醚鍵之烷基之例,可列舉甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基及甲氧基丙基等。   [0127] 苯基所具有之取代基為烷氧基時,其碳原子數較佳為1~20,更佳為1~6。又,烷氧基可為直鏈,亦可為分支鏈。作為苯基所具有之取代基為烷氧基時之具體例,可列舉甲氧基、乙氧基、n-丙基氧基、異丙基氧基、n-丁基氧基、異丁基氧基、sec-丁基氧基、tert-丁基氧基、n-戊基氧基、異戊基氧基、sec-戊基氧基、tert-戊基氧基、n-己基氧基、n-庚基氧基、n-辛基氧基、異辛基氧基、sec-辛基氧基、tert-辛基氧基、n-壬基氧基、異壬基氧基、n-癸基氧基及異癸基氧基等。又,烷氧基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵之烷氧基之例,可列舉甲氧基乙氧基、乙氧基乙氧基、2-甲氧基-1-甲基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙基氧基乙氧基乙氧基及甲氧基丙基氧基等。   [0128] 苯基所具有之取代基為環烷基或環烷氧基時,其碳原子數較佳為3~10,更佳為3~6。作為苯基所具有之取代基為環烷基時之具體例,可列舉環丙基、環丁基、環戊基、環己基、環庚基及環辛基等。作為苯基所具有之取代基為環烷氧基時之具體例,可列舉環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環庚基氧基及環辛基氧基等。   [0129] 苯基所具有之取代基為飽和脂肪族醯基或飽和脂肪族醯基氧基時,其碳原子數較佳為2~20,更佳為2~7。作為苯基所具有之取代基為飽和脂肪族醯基時之具體例,可列舉乙醯基、丙醯基、n-丁醯基、2-甲基丙醯基、n-戊醯基、2,2-二甲基丙醯基、n-己醯基、n-庚醯基、n-辛醯基、n-壬醯基、n-癸醯基、n-十一烷醯基、n-十二烷醯基、n-十三烷醯基、n-十四烷醯基、n-十五烷醯基及n-十六烷醯基等。作為苯基所具有之取代基為飽和脂肪族醯基氧基時之具體例,可列舉乙醯基氧基、丙醯基氧基、n-丁醯基氧基、2-甲基丙醯基氧基、n-戊醯基氧基、2,2-二甲基丙醯基氧基、n-己醯基氧基、n-庚醯基氧基、n-辛醯基氧基、n-壬醯基氧基、n-癸醯基氧基、n-十一烷醯基氧基、n-十二烷醯基氧基、n-十三烷醯基氧基、n-十四烷醯基氧基、n-十五烷醯基氧基及n-十六烷醯基氧基等。   [0130] 苯基所具有之取代基為烷氧基羰基時,其碳原子數較佳為2~20,更佳為2~7。作為苯基所具有之取代基為烷氧基羰基時之具體例,可列舉甲氧基羰基、乙氧基羰基、n-丙基氧基羰基、異丙基氧基羰基、n-丁基氧基羰基、異丁基氧基羰基、sec-丁基氧基羰基、tert-丁基氧基羰基、n-戊基氧基羰基、異戊基氧基羰基、sec-戊基氧基羰基、tert-戊基氧基羰基、n-己基氧基羰基、n-庚基氧基羰基、n-辛基氧基羰基、異辛基氧基羰基、sec-辛基氧基羰基、tert-辛基氧基羰基、n-壬基氧基羰基、異壬基氧基羰基、n-癸基氧基羰基及異癸基氧基羰基等。   [0131] 苯基所具有之取代基為苯基烷基時,其碳原子數較佳為7~20,更佳為7~10。又苯基所具有之取代基為萘基烷基時,其碳原子數較佳為11~20,更佳為11~14。作為苯基所具有之取代基為苯基烷基時之具體例,可列舉苄基、2-苯基乙基、3-苯基丙基及4-苯基丁基。作為苯基所具有之取代基為萘基烷基時之具體例,可列舉α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基及2-(β-萘基)乙基。苯基所具有之取代基為苯基烷基或萘基烷基時,取代基可於苯基或萘基上進一步具有取代基。   [0132] 苯基所具有之取代基為雜環基時,雜環基為包含1個以上之N、S、O之5員或6員單環,或縮合該單環彼此或該單環與苯環之雜環基。雜環基為縮合環時,成為環數至3為止者。作為構成該雜環基之雜環,可列舉呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪(indolizine)、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪(Phthalazine)、噌啉及喹喔啉等。苯基所具有之取代基為雜環基時,雜環基可進一步具有取代基。   [0133] 苯基所具有之取代基為被1或2之有機基取代之胺基時,有機基的適合之例,可列舉碳原子數1~20之烷基、碳原子數3~10之環烷基、碳原子數2~20之飽和脂肪族醯基、碳原子數2~20之飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數11~20之萘基烷基及雜環基等。作為此等之適合有機基之具體例,針對苯基所具有之取代基,可列舉與上述者相同者。作為被1或2之有機基取代之胺基之具體例,可列舉甲基胺基、乙基胺基、二乙基胺基、n-丙基胺基、二-n-丙基胺基、異丙基胺基、n-丁基胺基、二-n-丁基胺基、n-戊基胺基、n-己基胺基、n-庚基胺基、n-辛基胺基、n-壬基胺基、n-癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、n-丁醯基胺基、n-戊醯基胺基、n-己醯基胺基、n-庚醯基胺基、n-辛醯基胺基、n-癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基、β-萘甲醯基胺基及N-乙醯基-N-乙醯基氧基胺基等。   [0134] 作為苯基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基,可列舉碳原子數1~6之烷基、碳原子數1~6之烷氧基、碳原子數2~7之飽和脂肪族醯基、碳原子數2~7之烷氧基羰基、碳原子數2~7之飽和脂肪族醯基氧基、具有碳原子數1~6之烷基之單烷基胺基、具有碳原子數1~6之烷基之二烷基胺基、嗎啉-1-基、哌嗪-1-基、鹵素、硝基及氰基等。苯基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基之數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。苯基所具有之取代基所包含之苯基、萘基及雜環基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0135] 以上,雖針對Rc12 為可具有取代基之苯基時之取代基進行說明,但於此等之取代基當中,較佳為烷基或烷氧基烷基。   [0136] Rc12 為可具有取代基之苯基時取代基之數、與取代基之鍵結位置,於不阻礙本發明目的的範圍,並未被特別限定。Rc12 為可具有取代基之苯基時,以鹼之發生效率優異的點來看,可具有取代基之苯基較佳為可具有取代基之o-甲苯基。   [0137] Rc12 為可具有取代基之咔唑基時,取代基的種類於不阻礙本發明目的的範圍,並未被特別限定。作為咔唑基為可具有於碳原子上之適合的取代基之例,可列舉碳原子數1~20之烷基、碳原子數1~20之烷氧基、碳原子數3~10之環烷基、碳原子數3~10之環烷氧基、碳原子數2~20之飽和脂肪族醯基、碳原子數2~20之烷氧基羰基、碳原子數2~20之飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯硫基、可具有取代基之苯基羰基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘基羰基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之碳原子數11~20之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、胺基、被1或2之有機基取代之胺基、嗎啉-1-基及哌嗪-1-基、鹵素、硝基及氰基等。   [0138] Rc12 為可具有取代基之咔唑基時,作為咔唑基為可具有於氮原子上之適合的取代基之例,可列舉碳原子數1~20之烷基、碳原子數3~10之環烷基、碳原子數2~20之飽和脂肪族醯基、碳原子數2~20之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之碳原子數11~20之萘基烷基、可具有取代基之雜環基及可具有取代基之雜環基羰基等。於此等之取代基當中,較佳為碳原子數1~20之烷基,更佳為碳原子數1~6之烷基,特佳為乙基。   [0139] 針對可具有咔唑基之取代基之具體例,關於烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基烷基、可具有取代基之雜環基及被1或2之有機基取代之胺基,係與Rc12 為可具有取代基之苯基時之苯基所具有之取代基的例相同。   [0140] 作為在Rc12 ,咔唑基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基之例,可列舉碳原子數1~6之烷基;碳原子數1~6之烷氧基;碳原子數2~7之飽和脂肪族醯基;碳原子數2~7之烷氧基羰基;碳原子數2~7之飽和脂肪族醯基氧基;苯基;萘基;苯甲醯基;萘甲醯基;藉由選自由碳原子數1~6之烷基、嗎啉-1-基、哌嗪-1-基及苯基所構成之群組中之基所取代之苯甲醯基;具有碳原子數1~6之烷基之單烷基胺基;具有碳原子數1~6之烷基之二烷基胺基;嗎啉-1-基;哌嗪-1-基;鹵素;硝基;氰基。咔唑基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基之數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。苯基、萘基及雜環基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0141] Rc13 為可具有取代基之碳原子數1~10之烷基、可具有取代基之苯基或可具有取代基之咔唑基。   [0142] Rc13 為可具有取代基之碳原子數1~10之烷基時,烷基可為直鏈亦可為分支鏈。此情況下,烷基之碳原子數較佳為1~8,更佳為1~5。   [0143] 在Rc13 ,烷基、苯基或咔唑基所具有之取代基於不阻礙本發明目的的範圍,並未被特別限定。   作為烷基於碳原子上可具有之適合的取代基之例,可列舉碳原子數1~20之烷氧基、碳原子數3~10之環烷基、碳原子數3~10之環烷氧基、碳原子數2~20之飽和脂肪族醯基、碳原子數2~20之烷氧基羰基、碳原子數2~20之飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯硫基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之碳原子數11~20之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、胺基、被1或2之有機基取代之胺基、嗎啉-1-基及哌嗪-1-基、鹵素、硝基及氰基等。   作為苯基及咔唑基於碳原子上可具有之適合的取代基之例,作為烷基於碳原子上可具有之適合的取代基,除了於上述例示之基之外,可列舉碳原子數1~20之烷基。   [0144] 針對可具有烷基、苯基或咔唑基之取代基的具體例,關於烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基烷基、可具有取代基之雜環基及被1或2之有機基取代之胺基,係與Rc12 為可具有取代基之苯基時之苯基所具有之取代基之例相同。   [0145] 作為在Rc13 ,烷基、苯基或咔唑基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基之例,可列舉碳原子數1~6之烷基;碳原子數1~6之烷氧基;碳原子數2~7之飽和脂肪族醯基;碳原子數2~7之烷氧基羰基;碳原子數2~7之飽和脂肪族醯基氧基;苯基;萘基;苯甲醯基;萘甲醯基;藉由選自由碳原子數1~6之烷基、嗎啉-1-基、哌嗪-1-基及苯基所構成之群組中之基所取代之苯甲醯基;具有碳原子數1~6之烷基之單烷基胺基;具有碳原子數1~6之烷基之二烷基胺基;嗎啉-1-基;哌嗪-1-基;鹵素;硝基;氰基。烷基或苯基所具有之取代基所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。苯基、萘基及雜環基具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0146] 從式(C4)表示之化合物的鹼發生效率的點來看,作為Rc13 ,較佳為下述式(C5)表示之基及下述式(C6)表示之基,。   [0147] 式(C5)中,Rc17 及Rc18 分別為1價之有機基,m2為0或1。式(C6)中,Rc19 為選自由1價之有機基、胺基、鹵素、硝基及氰基所構成之群組中之基,A為S或O,m3為0~4之整數。   [0148] 在式(C5)之Rc17 於不阻礙本發明目的的範圍,可選自各種有機基。作為Rc17 之適合的例,可列舉碳原子數1~20之烷基、碳原子數3~10之環烷基、碳原子數2~20之飽和脂肪族醯基、碳原子數2~20之烷氧基羰基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之碳原子數11~20之萘基烷基、可具有取代基之雜環基及可具有取代基之雜環基羰基等。   [0149] 於Rc17 當中,較佳為碳原子數1~20之烷基,更佳為碳原子數1~6之烷基,特佳為乙基。   [0150] 在式(C5)之Rc18 於不阻礙本發明目的的範圍,並未特別限定,可選自各種有機基。作為適合作為Rc18 之基之具體例,可列舉碳原子數1~20之烷基、可具有取代基之苯基、可具有取代基之萘基及可具有取代基之雜環基。作為Rc18 ,於此等之基當中,更佳為可具有取代基之苯基及可具有取代基之萘基,特佳為2-甲基苯基及萘基。   [0151] 作為Rc17 或Rc18 所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基,可列舉碳原子數1~6之烷基、碳原子數1~6之烷氧基、碳原子數2~7之飽和脂肪族醯基、碳原子數2~7之烷氧基羰基、碳原子數2~7之飽和脂肪族醯基氧基、具有碳原子數1~6之烷基之單烷基胺基、具有碳原子數1~6之烷基之二烷基胺基、嗎啉-1-基、哌嗪-1-基、鹵素、硝基及氰基等。Rc17 或Rc18 所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基之數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。Rc17 或Rc18 所包含之苯基、萘基及雜環基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0152] 在式(C6)之Rc19 為有機基時,Rc19 於不阻礙本發明目的的範圍,可選自各種有機基。作為在式(C6),Rc19 為有機基時之適合之例,可列舉碳原子數1~6之烷基;碳原子數1~6之烷氧基;碳原子數2~7之飽和脂肪族醯基;碳原子數2~7之烷氧基羰基;碳原子數2~7之飽和脂肪族醯基氧基;苯基;萘基;苯甲醯基;萘甲醯基;選自由碳原子數1~6之烷基、嗎啉-1-基、哌嗪-1-基及苯基所構成之群組中之基所取代之苯甲醯基;具有碳原子數1~6之烷基之單烷基胺基;具有碳原子數1~6之烷基之二烷基胺基;嗎啉-1-基;哌嗪-1-基;鹵素;硝基;氰基;2-甲基苯基羰基;4-(哌嗪-1-基)苯基羰基;4-(苯基)苯基羰基。   [0153] 於Rc19 當中,較佳為苯甲醯基;萘甲醯基;藉由選自由碳原子數1~6之烷基、嗎啉-1-基、哌嗪-1-基及苯基所構成之群組中之基所取代之苯甲醯基;硝基,更佳為苯甲醯基;萘甲醯基;2-甲基苯基羰基;4-(哌嗪-1-基)苯基羰基;4-(苯基)苯基羰基。   [0154] 又,在式(C6),m3較佳為0~3之整數,更佳為0~2之整數,特佳為0或1。m3為1時,Rc19 之鍵結的位置,較佳為相對於Rc19 所鍵結之苯基與硫原子鍵結之鍵結部,為對位。   [0155] Rc14 為氫原子、碳原子數1~6之烷基或可具有取代基之苯基。為可具有取代基之苯基時,可具有苯基之取代基係與Rc12 為可具有取代基之苯基時相同。作為Rc14 ,較佳為甲基、乙基或苯基,更佳為甲基或苯基。   [0156] 上述式(C4)表示之肟酯化合物係m1為0時,例如可藉由以下所說明之方法合成。首先,將Rc13 -CO-Rc12 表示之酮化合物藉由羥基胺進行肟化,而得到Rc13 -(C=N-OH)-Rc12 表示之肟化合物。其次,將所得之肟化合物藉由Rc14 -CO-Hal(Hal表示鹵素)表示之酸鹵化物或(Rc14 CO)2 O表示之酸酐進行醯基化,而得到m1為0之上述式(C4)表示之肟酯化合物。   [0157] 又,上述式(C4)表示之肟酯化合物係m1為1時,例如可藉由以下所說明之方法合成。首先,將Rc13 -CO-CH2 -Rc12 表示之酮化合物於鹽酸的存在下,使其與亞硝酸酯進行反應,而得到Rc13 -CO-(C=N-OH)-Rc12 表示之肟化合物。其次,將所得之肟化合物藉由Rc14 -CO-Hal(Hal表示鹵素)表示之酸鹵化物或(Rc14 CO)2 O表示之酸酐進行醯基化,而得到m1為1之上述式(C4)表示之肟酯化合物。   [0158] 作為上述式(C4)表示之化合物,可列舉下述式(C7)表示之化合物。[0159] 上述式(C7)中,m1及Rc13 係如上述。Rc20 為選自由1價之有機基、胺基、鹵素、硝基及氰基所構成之群組中之基,m4為0~4之整數,Rc21 為氫原子或碳原子數1~6之烷基。   [0160] 上述式(C7)中,Rc20 於不阻礙本發明目的的範圍,並未特別限定,為有機基時,可適當選自各種有機基。作為Rc20 之適合的例,可列舉烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、胺基、被1或2之有機基取代之胺基、嗎啉-1-基、哌嗪-1-基、鹵素、硝基及氰基等。m4為2~4之整數時,Rc20 可為相同,亦可為相異。又,取代基之碳原子數中不包含進一步具有取代基之取代基的碳原子數。   [0161] Rc20 為烷基時,較佳為碳原子數1~20,更佳為碳原子數1~6。又,Rc20 為烷基時,可為直鏈,亦可為分支鏈。作為Rc20 為烷基時之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、sec-戊基、tert-戊基、n-己基、n-庚基、n-辛基、異辛基、sec-辛基、tert-辛基、n-壬基、異壬基、n-癸基及異癸基等。又,Rc20 為烷基時,烷基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵之烷基之例,可列舉甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基及甲氧基丙基等。   [0162] Rc20 為烷氧基時,較佳為碳原子數1~20,更佳為碳原子數1~6。又,Rc20 為烷氧基時,可為直鏈,亦可為分支鏈。作為Rc20 為烷氧基時之具體例,可列舉甲氧基、乙氧基、n-丙基氧基、異丙基氧基、n-丁基氧基、異丁基氧基、sec-丁基氧基、tert-丁基氧基、n-戊基氧基、異戊基氧基、sec-戊基氧基、tert-戊基氧基、n-己基氧基、n-庚基氧基、n-辛基氧基、異辛基氧基、sec-辛基氧基、tert-辛基氧基、n-壬基氧基、異壬基氧基、n-癸基氧基及異癸基氧基等。又,Rc20 為烷氧基時,烷氧基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵的烷氧基之例,可列舉甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙基氧基乙氧基乙氧基及甲氧基丙基氧基等。   [0163] Rc20 為環烷基或環烷氧基,較佳為碳原子數3~10,更佳為碳原子數3~6。作為Rc20 為環烷基時之具體例,可列舉環丙基、環丁基、環戊基、環己基、環庚基及環辛基等。作為Rc20 為環烷氧基時之具體例,可列舉環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環庚基氧基及環辛基氧基等。   [0164] Rc20 為飽和脂肪族醯基或飽和脂肪族醯基氧基時,較佳為碳原子數2~20,更佳為碳原子數2~7。作為Rc20 為飽和脂肪族醯基時之具體例,可列舉乙醯基、丙醯基、n-丁醯基、2-甲基丙醯基、n-戊醯基、2,2-二甲基丙醯基、n-己醯基、n-庚醯基、n-辛醯基、n-壬醯基、n-癸醯基、n-十一烷醯基、n-十二烷醯基、n-十三烷醯基、n-十四烷醯基、n-十五烷醯基及n-十六烷醯基等。作為Rc20 為飽和脂肪族醯基氧基時之具體例,可列舉乙醯基氧基、丙醯基氧基、n-丁醯基氧基、2-甲基丙醯基氧基、n-戊醯基氧基、2,2-二甲基丙醯基氧基、n-己醯基氧基、n-庚醯基氧基、n-辛醯基氧基、n-壬醯基氧基、n-癸醯基氧基、n-十一烷醯基氧基、n-十二烷醯基氧基、n-十三烷醯基氧基、n-十四烷醯基氧基、n-十五烷醯基氧基及n-十六烷醯基氧基等。   [0165] Rc20 為烷氧基羰基時,較佳為碳原子數2~20,更佳為碳原子數2~7。作為Rc20 為烷氧基羰基時之具體例,可列舉甲氧基羰基、乙氧基羰基、n-丙基氧基羰基、異丙基氧基羰基、n-丁基氧基羰基、異丁基氧基羰基、sec-丁基氧基羰基、tert-丁基氧基羰基、n-戊基氧基羰基、異戊基氧基羰基、sec-戊基氧基羰基、tert-戊基氧基羰基、n-己基氧基羰基、n-庚基氧基羰基、n-辛基氧基羰基、異辛基氧基羰基、sec-辛基氧基羰基、tert-辛基氧基羰基、n-壬基氧基羰基、異壬基氧基羰基、n-癸基氧基羰基及異癸基氧基羰基等。   [0166] Rc20 為苯基烷基時,較佳為碳原子數7~20,更佳為碳原子數7~10。又Rc20 為萘基烷基時,較佳為碳原子數11~20,更佳為碳原子數11~14。作為Rc20 為苯基烷基時之具體例,可列舉苄基、2-苯基乙基、3-苯基丙基及4-苯基丁基。作為Rc20 為萘基烷基時之具體例,可列舉α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基及2-(β-萘基)乙基。Rc20 為苯基烷基或萘基烷基時,Rc20 可於苯基或萘基上進一步具有取代基。   [0167] Rc20 為雜環基時,雜環基為包含1個以上之N、S、O之5員或6員單環,或縮合該單環彼此或該單環與苯環之雜環基。雜環基為縮合環時,成為環數至3為止者。作為構成該雜環基之雜環,可列舉呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉及喹喔啉等。Rc20 為雜環基時,雜環基可進一步具有取代基。   [0168] Rc20 為被1或2之有機基取代之胺基時,有機基的適合之例,可列舉碳原子數1~20之烷基、碳原子數3~10之環烷基、碳原子數2~20之飽和脂肪族醯基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數11~20之萘基烷基及雜環基等。此等之適合之有機基之具體例係與Rc20 相同。作為被1或2之有機基取代之胺基之具體例,可列舉甲基胺基、乙基胺基、二乙基胺基、n-丙基胺基、二-n-丙基胺基、異丙基胺基、n-丁基胺基、二-n-丁基胺基、n-戊基胺基、n-己基胺基、n-庚基胺基、n-辛基胺基、n-壬基胺基、n-癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、n-丁醯基胺基、n-戊醯基胺基、n-己醯基胺基、n-庚醯基胺基、n-辛醯基胺基、n-癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基及β-萘甲醯基胺基等。   [0169] 作為Rc20 所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基,可列舉碳原子數1~6之烷基、碳原子數1~6之烷氧基、碳原子數2~7之飽和脂肪族醯基、碳原子數2~7之烷氧基羰基、碳原子數2~7之飽和脂肪族醯基氧基、具有碳原子數1~6之烷基之單烷基胺基、具有碳原子數1~6之烷基之二烷基胺基、嗎啉-1-基、哌嗪-1-基、鹵素、硝基及氰基等。Rc20 所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基之數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。Rc20 所包含之苯基、萘基及雜環基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0170] Rc20 當中,由於化學性安定,或立體性障礙少,肟酯化合物的合成容易等,較佳為選自由碳原子數1~6之烷基、碳原子數1~6之烷氧基及碳原子數2~7之飽和脂肪族醯基所構成之群組中之基,更佳為碳原子數1~6之烷基,特佳為甲基。   [0171] Rc20 與苯基鍵結之位置對於Rc20 所鍵結之苯基,將苯基與肟酯化合物之主骨架的鍵結部之位置定為1位,將甲基的位置定為2位時,較佳為4位或5位,更佳為5位。又,m4較佳為0~3之整數,更佳為0~2之整數,特佳為0或1。   [0172] 在上述式(C7)之Rc21 為氫原子或碳原子數1~6之烷基。作為Rc21 ,較佳為甲基或乙基,更佳為甲基。   [0173] 將作為式(C4)表示之肟酯化合物特別適合之化合物的具體例示於以下。[0174] 下式(C8)表示之化合物亦適合作為肟酯化合物使用。(Rc22 為氫原子、硝基或1價之有機基,Rc23 及Rc24 分別為可具有取代基之鏈狀烷基、可具有取代基之環狀有機基或氫原子,Rc23 與Rc24 可彼此鍵結形成環,Rc25 為1價之有機基,Rc26 為氫原子、可具有取代基之碳原子數1~11之烷基或可具有取代基之芳基,m6為0~4之整數,m5為0或1)。   [0175] 式(C8)中,Rc22 為氫原子、硝基或1價之有機基。Rc22 係於式(C8)中之茀環上,與-(CO)m5 -表示之基所鍵結之6員芳香環不同之6員芳香環鍵結。式(C8)中,相對於Rc22 之茀環的鍵結位置並未被特別限定。式(C8)表示之化合物為具有1個以上之Rc22 時,由於式(C8)表示之化合物的合成容易等,故較佳為1個以上之Rc22 當中之1個與茀環中之2位鍵結。Rc22 為複數時,複數個Rc22 可為相同,亦可為相異。   [0176] Rc22 為有機基時,Rc22 於不阻礙本發明目的的範圍,並未特別限定,可適當選自各種有機基。作為Rc22 為有機基時之適合的例,可列舉烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、被1或2之有機基取代之胺基、嗎啉-1-基及哌嗪-1-基等。   [0177] Rc22 為烷基時,烷基之碳原子數較佳為1~20,更佳為1~6。又,Rc22 為烷基時,可為直鏈,亦可為分支鏈。作為Rc22 為烷基時之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、sec-戊基、tert-戊基、n-己基、n-庚基、n-辛基、異辛基、sec-辛基、tert-辛基、n-壬基、異壬基、n-癸基及異癸基等。又,Rc22 為烷基時,烷基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵的烷基之例,可列舉甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基及甲氧基丙基等。   [0178] Rc22 為烷氧基時,烷氧基之碳原子數較佳為1~20,更佳為1~6。又,Rc22 為烷氧基時,可為直鏈,亦可為分支鏈。作為Rc22 為烷氧基時之具體例,可列舉甲氧基、乙氧基、n-丙基氧基、異丙基氧基、n-丁基氧基、異丁基氧基、sec-丁基氧基、tert-丁基氧基、n-戊基氧基、異戊基氧基、sec-戊基氧基、tert-戊基氧基、n-己基氧基、n-庚基氧基、n-辛基氧基、異辛基氧基、sec-辛基氧基、tert-辛基氧基、n-壬基氧基、異壬基氧基、n-癸基氧基及異癸基氧基等。又,Rc22 為烷氧基時,烷氧基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵的烷氧基之例,可列舉甲氧基乙氧基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙基氧基乙氧基乙氧基及甲氧基丙基氧基等。   [0179] Rc22 為環烷基或環烷氧基,環烷基或環烷氧基之碳原子數較佳為3~10,更佳為3~6。作為Rc22 為環烷基時之具體例,可列舉環丙基、環丁基、環戊基、環己基、環庚基及環辛基等。作為Rc22 為環烷氧基時之具體例,可列舉環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環庚基氧基及環辛基氧基等。   [0180] Rc22 為飽和脂肪族醯基或飽和脂肪族醯基氧基時,飽和脂肪族醯基或飽和脂肪族醯基氧基之碳原子數較佳為2~21,更佳為2~7。作為Rc22 為飽和脂肪族醯基時之具體例,可列舉乙醯基、丙醯基、n-丁醯基、2-甲基丙醯基、n-戊醯基、2,2-二甲基丙醯基、n-己醯基、n-庚醯基、n-辛醯基、n-壬醯基、n-癸醯基、n-十一烷醯基、n-十二烷醯基、n-十三烷醯基、n-十四烷醯基、n-十五烷醯基及n-十六烷醯基等。作為Rc22 為飽和脂肪族醯基氧基時之具體例,可列舉乙醯基氧基、丙醯基氧基、n-丁醯基氧基、2-甲基丙醯基氧基、n-戊醯基氧基、2,2-二甲基丙醯基氧基、n-己醯基氧基、n-庚醯基氧基、n-辛醯基氧基、n-壬醯基氧基、n-癸醯基氧基、n-十一烷醯基氧基、n-十二烷醯基氧基、n-十三烷醯基氧基、n-十四烷醯基氧基、n-十五烷醯基氧基及n-十六烷醯基氧基等。   [0181] Rc22 為烷氧基羰基時,烷氧基羰基之碳原子數較佳為2~20,更佳為2~7。作為Rc22 為烷氧基羰基時之具體例,可列舉甲氧基羰基、乙氧基羰基、n-丙基氧基羰基、異丙基氧基羰基、n-丁基氧基羰基、異丁基氧基羰基、sec-丁基氧基羰基、tert-丁基氧基羰基、n-戊基氧基羰基、異戊基氧基羰基、sec-戊基氧基羰基、tert-戊基氧基羰基、n-己基氧基羰基、n-庚基氧基羰基、n-辛基氧基羰基、異辛基氧基羰基、sec-辛基氧基羰基、tert-辛基氧基羰基、n-壬基氧基羰基、異壬基氧基羰基、n-癸基氧基羰基及異癸基氧基羰基等。   [0182] Rc22 為苯基烷基時,苯基烷基之碳原子數較佳為7~20,更佳為7~10。又,Rc22 為萘基烷基時,萘基烷基之碳原子數較佳為11~20,更佳為11~14。作為Rc22 為苯基烷基時之具體例,可列舉苄基、2-苯基乙基、3-苯基丙基及4-苯基丁基。作為Rc22 為萘基烷基時之具體例,可列舉α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基及2-(β-萘基)乙基。Rc22 為苯基烷基或萘基烷基時,Rc22 可於苯基或萘基上進一步具有取代基。   [0183] Rc22 為雜環基時,雜環基為包含1個以上之N、S、O之5員或6員單環,或縮合該單環彼此或該單環與苯環之雜環基。雜環基為縮合環時,成為環數至3為止者。雜環基可為芳香族基(雜芳基),亦可為非芳香族基。作為構成該雜環基之雜環,可列舉呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉、喹喔啉、哌啶、哌嗪、嗎啉、哌啶、四氫吡喃及四氫呋喃等。Rc22 為雜環基時,雜環基可進一步具有取代基。   [0184] Rc22 為雜環基羰基時,雜環基羰基所包含之雜環基係與Rc22 為雜環基時相同。   [0185] Rc22 為被1或2之有機基取代之胺基時,有機基的適合之例,可列舉碳原子數1~20之烷基、碳原子數3~10之環烷基、碳原子數2~21之飽和脂肪族醯基、可具有取代基之苯基、可具有取代基之苯甲醯基、可具有取代基之碳原子數7~20之苯基烷基、可具有取代基之萘基、可具有取代基之萘甲醯基、可具有取代基之碳原子數11~20之萘基烷基及雜環基等。此等之適合的有機基之具體例係與Rc22 相同。作為被1或2之有機基取代之胺基之具體例,可列舉甲基胺基、乙基胺基、二乙基胺基、n-丙基胺基、二-n-丙基胺基、異丙基胺基、n-丁基胺基、二-n-丁基胺基、n-戊基胺基、n-己基胺基、n-庚基胺基、n-辛基胺基、n-壬基胺基、n-癸基胺基、苯基胺基、萘基胺基、乙醯基胺基、丙醯基胺基、n-丁醯基胺基、n-戊醯基胺基、n-己醯基胺基、n-庚醯基胺基、n-辛醯基胺基、n-癸醯基胺基、苯甲醯基胺基、α-萘甲醯基胺基及β-萘甲醯基胺基等。   [0186] 作為Rc22 所包含之苯基、萘基及雜環基為進一步具有取代基時之取代基,可列舉碳原子數1~6之烷基、碳原子數1~6之烷氧基、碳原子數2~7之飽和脂肪族醯基、碳原子數2~7之烷氧基羰基、碳原子數2~7之飽和脂肪族醯基氧基、具有碳原子數1~6之烷基之單烷基胺基、具有碳原子數1~6之烷基之二烷基胺基、嗎啉-1-基、哌嗪-1-基、鹵素、硝基及氰基等。Rc22 所包含之苯基、萘基及雜環基為進一步具有取代基時,其取代基之數於不阻礙本發明目的的範圍,雖並未限定,但較佳為1~4。Rc22 所包含之苯基、萘基及雜環基為具有複數個取代基時,複數個取代基可為相同,亦可為相異。   [0187] 以上說明之基當中,作為Rc22 ,為硝基或Rc27 -CO-表示之基時,有提昇感度的傾向故較佳。Rc27 於不阻礙本發明目的的範圍,並未特別限定,可選自各種有機基。作為適合作為Rc27 之基之例,可列舉碳原子數1~20之烷基、可具有取代基之苯基、可具有取代基之萘基及可具有取代基之雜環基。作為Rc27 ,於此等之基當中,特佳為2-甲基苯基、噻吩-2-基及α-萘基。   又,Rc22 為氫原子亦佳。Rc22 為氫原子時,較佳為Rc25 為後述之式(C10)表示之基。   [0188] 式(C8)中,Rc23 及Rc24 分別為可具有取代基之鏈狀烷基、可具有取代基之環狀有機基或氫原子。Rc23 與Rc24 可彼此鍵結而形成環。於此等之基當中,作為Rc23 及Rc24 ,較佳為可具有取代基之鏈狀烷基。Rc23 及Rc24 為可具有取代基之鏈狀烷基時,鏈狀烷基可為直鏈烷基亦可為分支鏈烷基。   [0189] Rc23 及Rc24 為不具有取代基之鏈狀烷基時,鏈狀烷基之碳原子數較佳為1~20,更佳為1~10,特佳為1~6。作為Rc23 及Rc24 為鏈狀烷基時之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、sec-戊基、tert-戊基、n-己基、n-庚基、n-辛基、異辛基、sec-辛基、tert-辛基、n-壬基、異壬基、n-癸基及異癸基等。又,Rc23 及Rc24 為烷基時,烷基可於碳鏈中包含醚鍵(-O-)。作為於碳鏈中具有醚鍵的烷基之例,可列舉甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙基氧基乙氧基乙基及甲氧基丙基等。   [0190] Rc23 及Rc24 為具有取代基之鏈狀烷基時,鏈狀烷基之碳原子數較佳為1~20,更佳為1~10,特佳為1~6。此情況下,取代基之碳原子數未包含在鏈狀烷基之碳原子數。具有取代基之鏈狀烷基較佳為直鏈狀。   可具有烷基之取代基,於不阻礙本發明目的的範圍,並未被特別限定。作為取代基之適合之例,可列舉氰基、鹵素原子、環狀有機基及烷氧基羰基。作為鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子。於此等當中,較佳為氟原子、氯原子、溴原子。作為環狀有機基,可列舉環烷基、芳香族烴基、雜環基。作為環烷基之具體例,係與Rc22 為環烷基時的適合之例相同。作為芳香族烴基之具體例,可列舉苯基、萘基、聯苯基、蒽基及菲基等。作為雜環基之具體例,係與Rc22 為雜環基的適合之例相同。Rc22 為烷氧基羰基時,烷氧基羰基所包含之烷氧基可為直鏈狀亦可為分支鏈狀,較佳為直鏈狀。烷氧基羰基所包含之烷氧基之碳原子數較佳為1~10,更佳為1~6。   [0191] 鏈狀烷基為具有取代基時,取代基之數並未被特別限定。較佳為取代基之數因應鏈狀烷基之碳原子數而變化。取代基之數通常情況下為1~20,較佳為1~10,更佳為1~6。   [0192] Rc23 及Rc24 為環狀有機基時,環狀有機基可為脂環式基,亦可為芳香族基。作為環狀有機基,可列舉脂肪族環狀烴基、芳香族烴基、雜環基。Rc23 及Rc24 為環狀有機基時,可具有環狀有機基之取代基係與Rc23 及Rc24 為鏈狀烷基時相同。   [0193] Rc23 及Rc24 為芳香族烴基時,較佳為芳香族烴基為苯基,或為複數個苯環透過碳-碳鍵進行鍵結所形成之基,或為縮合複數個苯環所形成之基。芳香族烴基為苯基,或為鍵結或縮合複數個苯環所形成之基時,芳香族烴基所包含之苯環的環數並未特別限定,較佳為3以下,更佳為2以下,特佳為1。作為芳香族烴基較佳之具體例,可列舉苯基、萘基、聯苯基、蒽基及菲基等。   [0194] Rc23 及Rc24 為脂肪族環狀烴基時,脂肪族環狀烴基可為單環式亦可為多環式。脂肪族環狀烴基之碳原子數雖並未被特別限定,但較佳為3~20,更佳為3~10。作為單環式之環狀烴基之例,可列舉環丙基、環丁基、環戊基、環己基、環庚基、環辛基、降冰片基、異冰片基、三環壬基、三環癸基、四環十二烷基及金剛烷基等。   [0195] Rc23 及Rc24 為雜環基時,雜環基為包含1個以上之N、S、O之5員或6員單環,或縮合該單環彼此或該單環與苯環之雜環基。雜環基為縮合環時,成為環數至3為止者。雜環基可為芳香族基(雜芳基),亦可為非芳香族基。作為構成該雜環基之雜環,可列舉呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲哚、異吲哚、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、咔唑、嘌呤、喹啉、異喹啉、喹唑啉、酞嗪、噌啉、喹喔啉、哌啶、哌嗪、嗎啉、哌啶、四氫吡喃及四氫呋喃等。   [0196] Rc23 與Rc24 可彼此鍵結而形成環。由Rc23 與Rc24 所形成之環所構成之基,較佳為環烷叉基。Rc23 與Rc24 鍵結形成環烷叉基時,構成環烷叉基之環較佳為5員環~6員環,更佳為5員環。   [0197] Rc23 與Rc24 鍵結所形成之基為環烷叉基時,環烷叉基可與1個以上之其他環進行縮合。作為可與環烷叉基縮合之環的例,可列舉苯環、萘環、環丁烷環、環戊烷環、環己烷環、環庚烷環、環辛烷環、呋喃環、噻吩環、吡咯環、吡啶環、吡嗪環及嘧啶環等。   [0198] 以上說明之Rc23 及Rc24 當中,作為適合之基之例,可列舉式-Ac1 -Ac2 表示之基。式中,Ac1 為直鏈伸烷基,Ac2 可列舉烷氧基、氰基、鹵素原子、鹵素化烷基、環狀有機基或烷氧基羰基。   [0199] Ac1 之直鏈伸烷基之碳原子數較佳為1~10,更佳為1~6。Ac2 為烷氧基時,烷氧基可為直鏈狀亦可為分支鏈狀,較佳為直鏈狀。烷氧基之碳原子數較佳為1~10,更佳為1~6。Ac2 為鹵素原子時,較佳為氟原子、氯原子、溴原子、碘原子,更佳為氟原子、氯原子、溴原子。Ac2 為鹵素化烷基時,鹵素化烷基所包含之鹵素原子較佳為氟原子、氯原子、溴原子、碘原子,更佳為氟原子、氯原子、溴原子。鹵素化烷基可為直鏈狀亦可為分支鏈狀,較佳為直鏈狀。Ac2 為環狀有機基時,環狀有機基之例,係與Rc23 及Rc24 作為取代基所具有之環狀有機基相同。Ac2 為烷氧基羰基時,烷氧基羰基之例係與Rc23 及Rc24 作為取代基所具有之烷氧基羰基相同。   [0200] 作為Rc23 及Rc24 之適合的具體例,可列舉乙基、n-丙基、n-丁基、n-己基、n-庚基及n-辛基等之烷基;2-甲氧基乙基、3-甲氧基-n-丙基、4-甲氧基-n-丁基、5-甲氧基-n-戊基、6-甲氧基-n-己基、7-甲氧基-n-庚基、8-甲氧基-n-辛基、2-乙氧基乙基、3-乙氧基-n-丙基、4-乙氧基-n-丁基、5-乙氧基-n-戊基、6-乙氧基-n-己基、7-乙氧基-n-庚基及8-乙氧基-n-辛基等之烷氧基烷基;2-氰基乙基、3-氰基-n-丙基、4-氰基-n-丁基、5-氰基-n-戊基、6-氰基-n-己基、7-氰基-n-庚基及8-氰基-n-辛基等之氰基烷基;2-苯基乙基、3-苯基-n-丙基、4-苯基-n-丁基、5-苯基-n-戊基、6-苯基-n-己基、7-苯基-n-庚基及8-苯基-n-辛基等之苯基烷基;2-環己基乙基、3-環己基-n-丙基、4-環己基-n-丁基、5-環己基-n-戊基、6-環己基-n-己基、7-環己基-n-庚基、8-環己基-n-辛基、2-環戊基乙基、3-環戊基-n-丙基、4-環戊基-n-丁基、5-環戊基-n-戊基、6-環戊基-n-己基、7-環戊基-n-庚基及8-環戊基-n-辛基等之環烷基烷基;2-甲氧基羰基乙基、3-甲氧基羰基-n-丙基、4-甲氧基羰基-n-丁基、5-甲氧基羰基-n-戊基、6-甲氧基羰基-n-己基、7-甲氧基羰基-n-庚基、8-甲氧基羰基-n-辛基、2-乙氧基羰基乙基、3-乙氧基羰基-n-丙基、4-乙氧基羰基-n-丁基、5-乙氧基羰基-n-戊基、6-乙氧基羰基-n-己基、7-乙氧基羰基-n-庚基及8-乙氧基羰基-n-辛基等之烷氧基羰基烷基;2-氯乙基、3-氯-n-丙基、4-氯-n-丁基、5-氯-n-戊基、6-氯-n-己基、7-氯-n-庚基、8-氯-n-辛基、2-溴乙基、3-溴-n-丙基、4-溴-n-丁基、5-溴-n-戊基、6-溴-n-己基、7-溴-n-庚基、8-溴-n-辛基、3,3,3-三氟丙基及3,3,4,4,5,5,5-七氟-n-戊基等之鹵素化烷基。   [0201] 作為Rc23 及Rc24 ,上述當中,適合之基為乙基、n-丙基、n-丁基、n-戊基、2-甲氧基乙基、2-氰基乙基、2-苯基乙基、2-環己基乙基、2-甲氧基羰基乙基、2-氯乙基、2-溴乙基、3,3,3-三氟丙基及3,3,4,4,5,5,5-七氟-n-戊基。   [0202] 作為Rc25 之適合的有機基之例,與Rc22 相同,可列舉烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧基羰基、飽和脂肪族醯基氧基、可具有取代基之苯基、可具有取代基之苯氧基、可具有取代基之苯甲醯基、可具有取代基之苯氧基羰基、可具有取代基之苯甲醯基氧基、可具有取代基之苯基烷基、可具有取代基之萘基、可具有取代基之萘氧基、可具有取代基之萘甲醯基、可具有取代基之萘氧基羰基、可具有取代基之萘甲醯基氧基、可具有取代基之萘基烷基、可具有取代基之雜環基、可具有取代基之雜環基羰基、被1或2之有機基取代之胺基、嗎啉-1-基及哌嗪-1-基等。此等之基之具體例係與針對Rc22 所說明者相同。又,作為Rc25 ,環烷基烷基、可於芳香環上具有取代基之苯氧基烷基、可於芳香環上具有取代基之苯硫基烷基亦佳。可具有苯氧基烷基及苯硫基烷基之取代基係與可具有Rc22 所包含之苯基的取代基相同。   [0203] 有機基當中,作為Rc25 ,較佳為烷基、環烷基、可具有取代基之苯基或環烷基烷基、可於芳香環上具有取代基之苯硫基烷基。作為烷基,較佳為碳原子數1~20之烷基,更佳為碳原子數1~8之烷基,特佳為碳原子數1~4之烷基,最佳為甲基。於可具有取代基之苯基當中,較佳為甲基苯基,更佳為2-甲基苯基。環烷基烷基所包含之環烷基之碳原子數較佳為5~10,更佳為5~8,特佳為5或6。環烷基烷基所包含之伸烷基之碳原子數較佳為1~8,更佳為1~4,特佳為2。於環烷基烷基當中,較佳為環戊基乙基。可於芳香環上具有取代基之苯硫基烷基所包含之伸烷基之碳原子數較佳為1~8,更佳為1~4,特佳為2。於可於芳香環上具有取代基之苯硫基烷基當中,較佳為2-(4-氯苯硫基)乙基。   [0204] 又,作為Rc25 ,-Ac3 -CO-O-Ac4 表示之基亦佳。Ac3 為2價之有機基,較佳為2價之烴基,較佳為伸烷基。Ac4 為1價之有機基,較佳為1價之烴基。   [0205] Ac3 為伸烷基,伸烷基可為直鏈狀亦可為分支鏈狀,較佳為直鏈狀。Ac3 為伸烷基,伸烷基之碳原子數較佳為1~10,更佳為1~6,特佳為1~4。   [0206] 作為Ac4 之適合的例,可列舉碳原子數1~10之烷基、碳原子數7~20之芳烷基及碳原子數6~20之芳香族烴基。作為Ac4 之適合的具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、n-己基、苯基、萘基、苄基、苯乙基、α-萘基甲基及β-萘基甲基等。   [0207] 作為-Ac3 -CO-O-Ac4 表示之基的適合之具體例,可列舉2-甲氧基羰基乙基、2-乙氧基羰基乙基、2-n-丙基氧基羰基乙基、2-n-丁基氧基羰基乙基、2-n-戊基氧基羰基乙基、2-n-己基氧基羰基乙基、2-苄基氧基羰基乙基、2-苯氧基羰基乙基、3-甲氧基羰基-n-丙基、3-乙氧基羰基-n-丙基、3-n-丙基氧基羰基-n-丙基、3-n-丁基氧基羰基-n-丙基、3-n-戊基氧基羰基-n-丙基、3-n-己基氧基羰基-n-丙基、3-苄基氧基羰基-n-丙基及3-苯氧基羰基-n-丙基等。   [0208] 以上,雖針對Rc25 進行說明,但作為Rc25 ,較佳為下述式(C9)或(C10)表示之基。(式(C9)及(C10)中,Rc28 及Rc29 分別為有機基,m7為0~4之整數,Rc28 及Rc29 為存在於與苯環上相鄰的位置時,Rc28 與Rc29 可彼此鍵結而形成環,m8為1~8之整數,m9為1~5之整數,m10為0~(m9+3)之整數,Rc30 為有機基)。   [0209] 針對式(C9)中之Rc28 及Rc29 的有機基之例係與Rc22 相同。作為Rc28 ,較佳為烷基或苯基。Rc28 為烷基時,其碳原子數較佳為1~10,更佳為1~5,特佳為1~3,最佳為1。亦即最佳為Rc28 為甲基。Rc28 與Rc29 鍵結形成環時,該環可為芳香族環,亦可為脂肪族環。作為式(C9)表示之基,且Rc28 與Rc29 形成環之基的適合之例,可列舉萘-1-基或1,2,3,4-四氫萘-5-基等。上述式(C9)中,m7為0~4之整數,較佳為0或1,更佳為0。   [0210] 上述式(C10)中,Rc30 為有機基。作為有機基,可列舉與針對Rc22 說明之有機基相同之基。有機基當中,較佳為烷基。烷基可為直鏈狀亦可為分支鏈狀。烷基之碳原子數較佳為1~10,更佳為1~5,特佳為1~3。作為Rc30 ,較佳為例示甲基、乙基、丙基、異丙基、丁基等,此等當中,更佳為甲基。   [0211] 上述式(C10)中,m9為1~5之整數,較佳為1~3之整數,更佳為1或2。上述式(C10)中,m10為0~(m9+3),較佳為0~3之整數,更佳為0~2之整數,特佳為0。上述式(C10)中,m8為1~8之整數,較佳為1~5之整數,更佳為1~3之整數,特佳為1或2。   [0212] 式(C8)中,Rc26 為氫原子、可具有取代基之碳原子數1~11之烷基或可具有取代基之芳基。作為Rc26 為烷基時可具有之取代基,較佳為例示苯基、萘基等。又,作為Rc26 為芳基時可具有之取代基,較佳為例示碳原子數1~5之烷基、烷氧基、鹵素原子等。   [0213] 式(C8)中,作為Rc26 ,較佳為例示有氫原子、甲基、乙基、n-丙基、異丙基、n-丁基、苯基、苄基、甲基苯基、萘基等,此等當中,更佳為甲基或苯基。   [0214] 式(C8)表示之化合物之製造方法並未特別限定,可用周知之方法獲得。   [0215] 作為式(C8)表示之化合物之適合的具體例,可列舉以下之化合物1~化合物41。[0216][0217] 含矽樹脂組成物中之硬化劑(C)可包含2種以上不同分類或種類之硬化劑。   含矽樹脂組成物中之硬化劑(C)的含量通常情況下,相對於組成物全體的質量,較佳為0.01~40質量%,更佳為0.1~20質量%,特佳為1~10質量%。   [0218] [硝醯基化合物(D)]   含矽樹脂組成物可包含硝醯基化合物(D)。含矽樹脂組成物為包含硝醯基化合物(D)時,形成二氧化矽薄膜時之燒成溫度,例如由於即使為250℃以下(例如200℃以上250℃以下的範圍)的較低溫度,亦可減低二氧化矽薄膜中之殘渣(源自二氧化矽薄膜之雜質)故較佳。二氧化矽薄膜中之殘渣少時,即使二氧化矽薄膜被放在高溫環境或減壓環境的情況下,抑制來自二氧化矽薄膜之源自薄膜中之殘渣本身或薄膜中之殘渣的分解物之氣體發生。   [0219] 作為硝醯基化合物(D),若為可作為氮氧化物自由基(Nitroxide radical)安定存在之化合物,則並未被特別限定。作為硝醯基化合物(D)之適合的例,可列舉包含下式(d1)表示之構造之化合物。[0220] 式(d1)中,Rd1 、Rd2 、Rd3 及Rd4 分別獨立為氫原子或碳原子數1~10之有機基。Rd1 與Rd2 可彼此鍵結而形成環。又,Rd3 與Rd4 可彼此鍵結而形成環。   含矽樹脂組成物作為硝醯基化合物(D),含有包含上述式(d1)表示之構造的化合物時,即使形成二氧化矽薄膜時之燒成溫度為較低溫度,亦可輕易減低二氧化矽薄膜中之殘渣。   在式(c1),較佳為Rc1 、Rc2 、Rc3 及Rc4 分別獨立為烷基或被雜原子取代之烷基。作為烷基,較佳為甲基、乙基、n-丙基及異丙基。作為雜原子之適合的例,可列舉鹵素原子、氧原子、硫原子及氮原子等。   [0221] 作為(D)硝醯基化合物之適合的具體例,例如較佳為二-tert-丁基氮氧化物、二-1,1-二甲基丙基氮氧化物、二-1,2-二甲基丙基氮氧化物、二-2,2-二甲基丙基氮氧化物及下述式(d2)、(d3)或(d4)表示之化合物。   其中,以即使於以較低之溫度的燒成,亦可輕易減低二氧化矽薄膜中之殘渣的點來看,更佳為下述式(d2)、(d3)或(d4)表示之化合物。   [0222][0223] 式(d2)、(d3)及(d4)中,Rd5 表示氫原子、碳原子數1~12之烷基、羥基、胺基、羧基、氰基、以雜原子取代之烷基,或透過醚鍵、酯鍵、醯胺鍵或胺基甲酸酯鍵鍵結之1價有機基。   Rd6 表示2價或3價之有機基。   n1及n2為滿足1≦n1+n2≦2整數。   n3及n4為滿足1≦n3+n4≦2之整數。   n5及n6為滿足1≦n5+n6≦2之整數。   n7為2或3。   [0224] 作為式(d2)表示之化合物之適合的具體例,可列舉下述之化合物。下述式中,Rd7 分別獨立表示可具有取代基之碳原子數1~20之烷基、可具有取代基之芳香族基或可具有取代基之脂環式基。[0225] 作為式(d3)表示之化合物之適合的具體例,可列舉下述之化合物。[0226] 作為式(d4)表示之化合物之適合的具體例,可列舉下述之化合物。[0227] 作為再更佳之硝醯基化合物(D),由於即使於以較低之溫度的燒成,尤其是亦可輕易減低二氧化矽薄膜中之殘渣,可列舉2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基(Free Radical)、4-羥基-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-胺基-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-羧基-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-氰基-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-甲基丙烯酸-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-丙烯酸-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-氧代(Oxo)-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、3-羧基-2,2,5,5-四甲基吡咯啶1-氧基(Oxyl) 自由基、4-乙醯胺-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-(2-氯乙醯胺)-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-羥基-2,2,6,6-四甲基哌啶1-氧基(Oxyl)苯甲酸鹽 自由基、4-異硫氰酸酯-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基、4-(2-碘乙醯胺)-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基及4-甲氧基-2,2,6,6-四甲基哌啶1-氧基(Oxyl) 自由基。   硝醯基化合物(D)可單獨使用,亦可組合2種以上使用。   [0228] 含矽樹脂組成物之硝醯基化合物(D)的含量可為微量。含矽樹脂組成物中之硝醯基化合物(D)的含量由於即使於以較低之溫度的燒成,亦可輕易減低二氧化矽薄膜中之殘渣,相對於含矽樹脂組成物之溶劑(S)以外之成分之質量的合計,較佳為0.005質量%以上,更佳為0.009質量%以上。   又,含矽樹脂組成物中之(C)硝醯基化合物的含量,相對於含矽樹脂組成物之溶劑(S)以外之成分之質量的合計,較佳為2質量%以下,更佳為1質量%以下。   [0229] [抗氧化劑(E)]   又,含矽樹脂組成物可包含抗氧化劑(E)。藉由包含抗氧化劑,可抑制發光特性的降低。   抗氧化劑較佳為包含選自由磷系、硫系及酚系抗氧化劑所構成之群組中之至少一個。   [0230] 磷系抗氧化劑的種類並未特別限定,具體而言,可列舉3,9-雙(2,6-二-tert-丁基-4-甲基苯氧基)-2,4,8,10-四氧雜-3,9-二磷雜(Phospha)螺環[5.5]十一烷、二異癸基季戊四醇二亞磷酸酯、雙(2,4-二-t-丁基苯基)季戊四醇二亞磷酸酯、2,2’-亞甲基雙(4,6-二-t-丁基-1-苯基氧基)(2-乙基己基氧基)磷、6-[3-(3-t-丁基-4-羥基-5-甲基苯基)丙氧基]-2,4,8,10-四-t-丁基二苯并(Benz)[d,f][1,3,2]二氧磷呯、三苯基亞磷酸酯、二苯基異癸基亞磷酸酯、苯基二異癸基亞磷酸酯、4,4’-丁烯基-雙(3-甲基-6-t-丁基苯基二十三烷基)亞磷酸酯、十八烷基亞磷酸酯、參(壬基苯基)亞磷酸酯、9,10-二氫-9-氧雜-10-磷菲-10-氧化物、10-(3,5-二-t-丁基-4-羥基苄基)-9,10-二氫-9-氧雜-10-磷菲-10-氧化物、10-癸基氧基-9,10-二氫-9-氧雜-10-磷菲-10-氧化物、參(2,4-二-t-丁基苯基)亞磷酸酯、循環式新戊烷四基雙(2,4-二-t-丁基苯基)亞磷酸酯、循環式新戊烷四基雙(2,6-二-t-丁基苯基)亞磷酸酯、2,2-亞甲基雙(4,6-二-t-丁基苯基)辛基亞磷酸酯、參(2,4-二-t-丁基苯基)亞磷酸酯、肆(2,4-二-t-丁基苯基)[1,1-聯苯基]-4,4’-二基雙膦酸酯、雙[2,4-雙(1,1-二甲基乙基)-6-甲基苯基]乙酯及膦酸等。   [0231] 磷系抗氧化劑當中,以耐熱性及防止耐熱變色的側面來看,較佳為2,2’-亞甲基雙(4,6-二-t-丁基-1-苯基氧基)(2-乙基己基氧基)磷、3,9-雙(2,6-二-tert-丁基-4-甲基苯氧基)-2,4,8,10-四氧雜-3,9-二磷雜(Phospha)螺環[5.5]十一烷及6-[3-(3-t-丁基-4-羥基-5-甲基苯基)丙氧基]-2,4,8,10-四-t-丁基二苯并(Benz)[d,f][1,3,2]二氧磷呯等。   [0232] 作為磷系抗氧化劑之市售品,可列舉Irgafos 168(BASF公司製)、Sumilizer GP(住友化學公司製)等。   [0233] 硫系抗氧化劑的種類並未特別限定,具體而言,可列舉2,2-雙({[3-(十二烷硫基)丙醯基]氧基}甲基)-1,3-丙烷二基-雙[3-(十二烷硫基)丙酸酯]、2-巰基苯并(Benz)咪唑、二月桂基-3,3’-硫代二丙酸酯、二肉荳蔻基-3,3’-硫代二丙酸酯、二硬脂基-3,3’-硫代二丙酸酯、季戊四醇-肆(3-月桂硫基丙酸酯)、2-巰基苯并(Benz)咪唑等。   [0234] 硫系抗氧化劑當中,以耐熱性及防止耐熱變色的側面來看,較佳為2,2-雙({3-(十二烷硫基)丙醯基}氧基)甲基)1,3-丙烷二基-雙[3-(十二烷硫基)丙酸酯]、2-巰基苯并(Benz)咪唑等。   [0235] 作為硫系抗氧化劑之市售品,可列舉Irganox 1035(BASF公司製)等。   [0236] 酚系抗氧化劑的種類並未特別限定,具體而言,可列舉3,9-雙[2-[3-(3-t-丁基-4-羥基-5-甲基苯基)丙醯基氧基]-1,1-二甲基乙氧基]-2,4,8,10-四氧雜螺環[5.5]十一烷、季戊四醇・肆[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、1,3,5-三甲基-2,4,6-參(3’,5’-二-t-丁基-4-羥基苄基)苯、三乙二醇-雙[3-(3-t-丁基-5-甲基-4-羥基苯基)丙酸酯]、4,4’-硫雙(6-t-丁基-3-甲基酚)、參-(3,5-二-t-丁基-4-羥基苄基)-異氰脲酸酯、1,3,5-參(4-t-丁基-3-羥基-2,6-二甲基苄基)-異氰脲酸酯、1,6-己烷二醇-雙[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、2,2-硫-二伸乙基雙[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、N,N’-六亞甲基雙(3,5-二-t-丁基-4-羥基-氫肉桂醯胺)、1,3,5-三甲基-2,4,6-參(3,5-二-t-丁基-4-羥基苄基)苯、2,4-雙[(辛硫基)甲基]-O-甲酚、1,6-己烷二醇-雙-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、十八烷基-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯、2,2’-亞甲基雙(4-甲基-6-t-丁基酚)、4,4’-丁烯基-雙(3-甲基-6-t-丁基酚)、1,1,3-參(2-甲基-4-羥基-5-t-丁基苯基)丁烷、1,3,5-參(4-羥基苄基)苯及肆[亞甲基-3-(3,5’-二-t-丁基-4’-羥基苯基丙酸酯)]甲烷等。   [0237] 酚系抗氧化劑當中,以耐熱性及防止耐熱變色的側面來看,較佳為3,9-雙[2-[3-(3-t-丁基-4-羥基-5-甲基苯基)丙醯基氧基]-1,1-二甲基乙氧基]-2,4,8,10-四氧雜螺環[5.5]十一烷、1,3,5-三甲基-2,4,6-參(3’,5’-二-t-丁基-4-羥基苄基)苯、季戊四醇・肆[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、三乙二醇-雙[3-(3-t-丁基-5-甲基-4-羥基苯基)丙酸酯]、4,4’-硫雙(6-t-丁基-3-甲基酚)、參-(3,5-二-t-丁基-4-羥基苄基)-異氰脲酸酯、1,3,5-參(4-t-丁基-3-羥基-2,6-二甲基苄基)-異氰脲酸酯、1,6-己烷二醇-雙[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、2,2-硫-二伸乙基雙[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、N,N’-六亞甲基雙(3,5-二-t-丁基-4-羥基-氫肉桂醯胺)、1,3,5-三甲基-2,4,6-參(3,5-二-t-丁基-4-羥基苄基)苯及2,4-雙[(辛硫基)甲基]-O-甲酚等。   [0238] 作為酚系抗氧化劑之市售品,可列舉Irganox 1010(BASF公司製)、ADK STAB AO-80(ADEKA公司製)等。   [0239] 抗氧化劑的含量,含矽樹脂組成物之固形分總重量中,例如為0.01~30質量%,較佳為0.1~10質量%,更佳為0.5~8質量%,再更佳為1~5質量%。藉由成為上述範圍內,可抑制發光特性的降低,可抑制在烘烤(硬烤)步驟之消光現象。又,使用含矽樹脂組成物藉由印刷法等進行圖型化時,可抑制形成之圖型的剝離。   [0240] [溶劑(S)]   含矽樹脂組成物係含有溶劑(S)。溶劑(S)含有下式(S1)表示之環烷基乙酸酯。含矽樹脂組成物藉由包含與含矽樹脂(A)一起含有下式(S1)表示之環烷基乙酸酯之溶劑(S),容易抑制在使用含矽樹脂組成物所形成之含矽樹脂薄膜或二氧化矽薄膜之破裂的發生。(式(S1)中,Rs1 為碳原子數1~3之烷基,p為1~6之整數,q為0~(p+1)之整數)。   [0241] 作為式(S1)表示之環烷基乙酸酯之具體例,可列舉環丙基乙酸酯、環丁基乙酸酯、環戊基乙酸酯、環己基乙酸酯、環庚基乙酸酯及環辛基乙酸酯。   於此等當中,由於取得容易,容易抑制在含矽樹脂薄膜或二氧化矽薄膜之破裂的發生,故較佳為環辛基乙酸酯。   溶劑(S)可包含組合2種以上之式(S1)表示之環烷基乙酸酯。   [0242] 溶劑(S)中之式(S1)表示之環烷基乙酸酯的含量,於不阻礙本發明目的的範圍,並未被特別限定。溶劑(S)中之式(S1)表示之環烷基乙酸酯的含量通常情況下,例如為30質量%以上,較佳為50質量%以上,更佳為70質量%以上,特佳為90質量%以上,亦可為100質量%。   [0243] 溶劑(S)為包含式(S1)表示之環烷基乙酸酯以外之溶劑時,式(S1)表示之環烷基乙酸酯以外之溶劑的種類於不阻礙本發明目的的範圍,並未被特別限定。   [0244] 作為可包含溶劑(S)之式(S1)表示之環烷基乙酸酯以外的溶劑之例,可列舉   甲醇、乙醇、丙醇、n-丁醇等之醇類;   乙二醇、二乙二醇、丙二醇、二丙二醇等之多元醇類;   丙酮、甲基乙基酮、環己酮、甲基-n-戊基酮、甲基異戊基酮、2-庚酮等之酮類;   γ-丁內酯等之含有內酯環之有機溶劑;   乙二醇單乙酸酯、二乙二醇單乙酸酯、丙二醇單乙酸酯或二丙二醇單乙酸酯等之具有酯鍵之化合物、前述多元醇類或具有前述酯鍵之化合物的單甲基醚、單乙基醚、單丙基醚、單丁基醚等之單烷基醚或單苯基醚等之具有醚鍵之化合物等之多元醇類的衍生物;   如二噁烷之環式醚類或乳酸甲酯、乳酸乙酯、乙酸甲酯、乙酸乙酯、乙酸丁酯、丙酮酸甲酯、丙酮酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯等之酯類;   苯甲醚、乙基苄基醚、甲酚基甲基醚、二苯基醚、二苄基醚、苯乙醚、丁基苯基醚、乙基苯、二乙基苯、戊基苯、異丙基苯、甲苯、二甲苯、異丙基甲苯(Cymene)、均三甲苯等之芳香族系有機溶劑;   N,N,N’,N’-四甲基脲、N,N,2-三甲基丙醯胺、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、N,N-二乙基乙醯胺、N,N-二乙基甲醯胺、1,3-二甲基-2-咪唑啶酮、N-甲基吡咯啶酮、N-乙基吡咯啶酮等之含有氮之有機溶劑。此等之溶劑可組合2種以上使用。   式(S1)表示之環烷基乙酸酯以外之溶劑在溶劑(S)全體之比例,例如適當設定為70質量%以下即可,較佳為0.01~55質量%,更佳為1~50質量%。   [0245] 式(S1)表示之環烷基乙酸酯以外之溶劑中,較佳為丙二醇單甲基醚乙酸酯(PGMEA)、丙二醇單甲基醚(PGME)、N,N,N’,N’-四甲基脲及丁醇。   [0246] 以含矽樹脂組成物作為含矽樹脂(A),包含聚矽烷時,抑制破裂的點或容易形成介電率低之二氧化矽薄膜的點來看,含矽樹脂組成物的水分量較佳為1.0質量%以下,更佳為0.5質量%以下,再更佳為0.3質量%以下,特佳為未滿0.3質量%。尚,溶劑中之水分量可藉由卡爾費休測定法測定。   含矽樹脂組成物的水分源自溶劑(S)的情況較多。因此,較佳為以含矽樹脂組成物的水分量成為上述之量的方式,來脫水溶劑(S)。   [0247] 溶劑(S)的使用量於不阻礙本發明目的的範圍,並未被特別限定。從製膜性的點來看,溶劑(S)係以含矽樹脂組成物之固形分濃度成為較佳為1~50質量%,更佳為10~40質量%的方式使用。   [0248] [其他成分]   含矽樹脂組成物除了含矽樹脂(A)及溶劑(S)以外,可包含添加在自以往被使用在各種用途之含矽樹脂組成物的各種成分。   作為其他成分之例,可列舉光聚合起始劑、酸產生劑、鹼產生劑、觸媒、矽烷偶合劑、密著增強劑、分散劑、界面活性劑、紫外線吸收劑、抗氧化劑、消泡劑、黏度調整劑及著色劑等。   此等之成分分別依通常所使用的量,摻合在含矽樹脂組成物。   [0249] <含矽樹脂組成物之製造方法>   含矽樹脂組成物之製造方法並未被特別限定。通常情況下,藉由分別均勻混合預定量之以上說明的成分,使固形分溶解及分散於溶劑(S),來製造含矽樹脂組成物。為了去除較量子點(B)尺寸更大之不溶物,可將含矽樹脂組成物使用所期望孔徑之過濾器進行過濾。   [0250] <含矽樹脂薄膜及二氧化矽薄膜之製造方法>   以下,針對使用前述之含矽樹脂組成物之含矽樹脂薄膜之製造方法、與二氧化矽薄膜之製造方法進行說明。   [0251] [含矽樹脂薄膜之製造方法]   作為製造含矽樹脂薄膜之方法,可列舉包含   形成由前述之含矽樹脂組成物所構成之塗佈膜、與   從塗佈膜去除溶劑(S)之方法。   [0252] 形成塗佈膜之方法並未被特別限定。例如藉由噴霧法、旋塗法、滾塗法、浸漬法、滴下法等之方法,塗佈含矽樹脂組成物,於基板上形成塗佈膜。   塗佈膜的膜厚並未被特別限定。通常情況下,塗佈膜的膜厚,例如以形成膜厚2μm以上,較佳為5μm以上之含矽樹脂薄膜的方式調整。又,塗佈膜的膜厚以形成較佳為膜厚2~300μm,更佳為30~200μm,再更佳為75~150μm之含矽樹脂薄膜的方式調整。藉由調整含矽樹脂組成物之固形分濃度或任意成分之添加劑,可形成5μm以上進而為30μm以上的膜厚之薄膜。   [0253] 例如,製造膜厚2~300μm左右厚度之含矽樹脂薄膜時,從塗佈膜去除溶劑(S)時,容易於薄膜產生破裂。惟,含矽樹脂組成物藉由包含前述之預定溶劑(S),抑制去除溶劑(S)時之破裂的發生。   [0254] 從塗佈膜去除溶劑(S)之方法並未被特別限定。通常情況下,可列舉將塗佈膜以因應溶劑(S)之沸點的適當溫度進行加熱,或將塗佈膜放置在真空條件下之方法。   [0255] 含矽樹脂薄膜在層合體或發光顯示元件面板等可直接形成於各種機能層上,形成於金屬基板或玻璃基板等之任意材質的基板上後,可從基板剝離來使用。   [0256] [二氧化矽薄膜之製造方法]   作為製造二氧化矽薄膜之方法,可列舉包含:   將前述之含矽樹脂組成物塗佈於基板上,形成塗佈膜之步驟、與   燒成經形成之塗佈膜之步驟之方法。   含矽樹脂組成物包含藉由光之作用進行分解而產生鹼之硬化劑時,較佳為包含曝光之步驟。曝光之步驟可取代燒成之步驟或與燒成之步驟一起進行。又,於曝光之步驟,例如可選擇性曝光經形成之塗佈膜,包含選擇性曝光步驟時,亦可包含顯影之步驟。又,例如可對於經形成之塗佈膜,進行壓印微影。進行壓印微影時,例如,可列舉包含:   將含矽樹脂組成物塗佈於基板上,形成塗佈膜之步驟、與   將形成預定圖型之凹凸構造的模組對於塗佈膜進行按壓之步驟、與   曝光之步驟之方法。   曝光之步驟,係以模組按壓在塗佈膜的狀態,對於由含矽樹脂組成物所構成之塗佈膜進行。藉由曝光之硬化後,藉由剝離前述模組,可得到因應模組的形狀之經圖型化之二氧化矽薄膜。   又,經圖型化之二氧化矽薄膜,可藉由印刷法形成。作為印刷法,可列舉噴墨法、絲網印刷法等。藉由印刷法將含矽樹脂組成物配置成圖型狀後,藉由進行曝光及/或加熱或是燒成,可得到經圖型化之二氧化矽薄膜。   [0257] 塗佈膜係與含矽樹脂薄膜之製造方法同樣進行而形成。   塗佈膜的膜厚並未被特別限定。通常情況下,塗佈膜的膜厚,例如以形成膜厚2μm以上,較佳為5μm以上之含矽樹脂薄膜的方式調整。又,塗佈膜的膜厚,以形成較佳為膜厚2~300μm,更佳為30~200μm,再更佳為75~150μm之含矽樹脂薄膜的方式調整。   [0258] 基板的材質若為耐得住燒成之材質,則並未被特別限定。作為基板之材質的適合之例,可列舉金屬、矽、玻璃等之無機材料,或聚碳酸酯、聚對苯二甲酸乙二酯、聚醚碸、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂等之耐熱性的材料。基板的厚度並未特別限定,基板可為薄膜或薄片。   [0259] 具備塗佈膜之基板係用以下進行燒成。燒成方法雖並未被特別限定,但通常情況下,係使用電氣爐等進行燒成。燒成溫度通常情況下,較佳為300℃以上,更佳為350℃以上。上限雖並未被特別限定,但例如為1000℃以下。含矽樹脂組成物包含硬化劑(C)及/或硝醯基化合物(D)時,即使將燒成溫度的下限值下降至200℃,亦可減低二氧化矽薄膜中之殘渣(源自二氧化矽薄膜之雜質)。燒成環境並未特別限定,可為氮環境或氬環境等之惰性氣體環境下、真空下或減壓下。可為大氣下,且可適當控制氧濃度。   [0260] 如此進行所形成之二氧化矽薄膜不具有破裂,且包含經良好分散之量子點(B)。   [0261] 以上說明之含矽樹脂薄膜及二氧化矽薄膜由於包含經良好分散之量子點(B),故可適合作為發光顯示元件用之光學薄膜使用,又,可適合使用在發光顯示元件所適合使用之層合體的製造。   [0262] <層合體>   層合體為包含選自由前述之含矽樹脂薄膜及前述之二氧化矽薄膜所構成之群組中之1個以上之薄膜的層合體。該層合體可為由僅含有量子點之薄膜所構成之層合體,亦可為由含有量子點之薄膜、與其他機能層所構成之層合體。   [0263] [含有量子點之薄膜的層合體]   作為層合體,例如可列舉包含分散於各種基質材中之量子點(B)的薄膜已層合2層以上,包含選自由前述之含矽樹脂薄膜及前述之二氧化矽薄膜所構成之群組中之1個以上之薄膜的層合體。   該層合體可為僅層合前述之含矽樹脂薄膜及/或前述之二氧化矽薄膜之層合體,亦可為層合前述之含矽樹脂薄膜及/或前述之二氧化矽薄膜、與於含矽樹脂及二氧化矽以外之基質材分散量子點(B)之薄膜的層合體。   [0264] 作為含矽樹脂及二氧化矽以外之基質材,可列舉環氧樹脂、丙烯酸樹脂(例如聚甲基(甲基)丙烯酸酯及聚丁基(甲基)丙烯酸酯等)、降莰烯樹脂、聚烯烴(例如聚伸乙基)、聚乙烯丁醛、聚乙烯乙酸酯、聚脲、聚胺基甲酸酯、聚酯樹脂(例如聚對苯二甲酸乙二酯)、聚碳酸酯樹脂等。   [0265] 層合含有量子點之複數個薄膜來製造層合體時,較佳為相鄰之薄膜的折射率不同。又,較佳為折射率高之高折射率薄膜、與折射率低之低折射率薄膜相互層合。   此情況下,相鄰之薄膜的折射率的差較佳為0.4~2.0。   重複層合折射率不同之複數個層時,從光源入射之光線通過層合體時,藉由由光線之折射之發散,容易提高入射光之利用效率。   [0266] 含有量子點之薄膜,較佳為包含波長變換來自光源之入射光,而產生紅色光之量子點、與波長變換來自光源之入射光,而產生綠色光之量子點。   又,相互層合包含產生紅色光之量子點的薄膜、與包含產生綠色光之量子點的薄膜亦佳。   由於可藉由將如此構成之層合體適用在發光顯示元件面板,藉波長變換取出色純度高之綠色光與紅色光,擴大具備發光顯示元件面板之發光顯示裝置之色相的再現範圍。   尚,作為光源,通常情況下,可利用藍色光或白色光。藉由組合該光源、與上述之層合體使用,可取出色純度高之紅色光、綠色光及藍色光,可顯示良好之色相鮮明的圖像。   [0267] 作為發光顯示裝置,若為使用光源之發光顯示圖像的裝置,則並未特別限定,可列舉液晶顯示裝置或有機EL顯示裝置等。   [0268] 於以上說明之層合體,較佳為選自由前述之含矽樹脂薄膜及前述之二氧化矽薄膜所構成之群組中之2個以上之薄膜,以分別接觸的方式層合。   又,層合體僅由選自由前述之含矽樹脂薄膜及前述之二氧化矽薄膜所構成之群組中之2個以上薄膜所構成亦較佳。   係因為含矽樹脂或二氧化矽具有耐光性、耐候性、耐溶劑性、耐化學藥品性、透明性及絕緣性等之各種優異的特性。   [0269] [含有量子點之薄膜、與包含其他機能層之層合體]   含有量子點之薄膜即前述之含矽樹脂薄膜及前述之二氧化矽薄膜,與其他機能層層合亦較佳。   以下,針對前述之含矽樹脂薄膜及前述之二氧化矽薄膜,有單記載為「含有量子點之薄膜」的情況。   含有量子點之薄膜,較佳為包含波長變換來自光源之入射光,而產生紅色光之量子點、與波長變換來自光源之入射光,而產生綠色光之量子點。   又,作為光源,通常情況下,可利用藍色光或白色光。   [0270] 作為其他機能層,可列舉使光線擴散之擴散層、含矽樹脂薄膜,或具有較二氧化矽薄膜更低之折射率的低折射率層、使從光源入射之光的一部分反射之反射層、將光源所發出之光入射至層合體之導光板等。   又,如有必要,可於層合體內設置空隙。空隙,例如可為空氣之層或氮等之惰性氣體之層。   [0271] 作為擴散層,並未特別限制可使用以往各種顯示裝置或光學裝置所使用之各種擴散層。作為典型之例,可列舉於表面設置棱鏡等之微細構造的薄膜、於表面散布或埋沒珠粒之薄膜及內部包含於將以使微粒子或光線散射的方式進行構造化的界面或空隙等之薄膜。   [0272] 低折射率層若為具有較前述之含矽樹脂薄膜及前述之二氧化矽薄膜更低之折射率的薄膜,則並未特別限定,可使用由各種材質所構成之薄膜。   [0273] 作為反射層,可列舉反射性之偏光薄膜、以可反射入射光當中之一部分的方式,於表面設置棱鏡等之微細構造的薄膜、金屬箔、多層光學薄膜等。反射層較佳為使入射光之30%以上反射,更佳為使40%以上反射,特佳為使50%以上反射。   反射層較佳為反射通過含有量子點之薄膜之光,將反射光再度以入射於含有量子點之薄膜的方式設置。藉由將從反射層入射至含有量子點之薄膜之光由擴散層等,對反射層之方向使其再度反射,較未使用反射層時,可提高從含有量子點之薄膜所發出之綠色光及紅色光的色純度。   [0274] 作為導光板,並未特別限制可使用以往各種顯示裝置或光學裝置所使用之各種導光板。   [0275] 作為包含含有量子點之薄膜、與其他機能層之層合體的較佳之層構成的典型例,可列舉以下之1)~8)的層構成。尚,於1)~8)構成之層合體,於最左所記載之層使光源所發出之光線入射,從最右所記載之層由含有量子點之薄膜取出經波長變換之光線。   通常,以使從層合體取出之光線入射的方式來設置顯示器面板,並利用與色準高之紅色光、綠色光及藍色光,來進行圖像之顯示。   1)擴散層/含有量子點之薄膜/低折射率層/反射層   2)導光板/擴散層/含有量子點之薄膜/低折射率層/反射層   3)低折射率層/含有量子點之薄膜/空隙/反射層   4)導光板/低折射率層/含有量子點之薄膜/空隙/反射層   5)低折射率層/含有量子點之薄膜/低折射率層/反射層   6)導光板/低折射率層/含有量子點之薄膜/低折射率層/反射層   7)反射層/低折射率層/含有量子點之薄膜/低折射率層/反射層   8)導光板/反射層/低折射率層/含有量子點之薄膜/低折射率層/反射層   [0276] 尚,在以上說明之層合體,含矽樹脂薄膜及二氧化矽薄膜較佳為依前述之方法製造。   [0277] <發光顯示元件面板及發光顯示裝置>   由前述之含矽樹脂薄膜或前述之二氧化矽薄膜所構成之光學薄膜,或前述之層合體,係以組入各種發光顯示元件面板,且從光源所發出之光線取出色純度高之紅色光、綠色光及藍色光為目的優選使用。   於此,針對由前述之含矽樹脂薄膜或前述之二氧化矽薄膜所構成之光學薄膜,或前述之層合體的總稱,記載為「量子點片」。   [0278] 發光顯示元件面板,通常情況下,係包含組合光源之背光、與量子點片、與顯示器面板。   量子點片具備導光板時,通常情況下,於導光板的側面以使光線入射的方式設置光源。從導光板的側面入射之光線通過量子點片內,入射在顯示器面板。   量子點片不具備導光板時,從面光源於量子點片的主面使光線入射,將通過量子點片內之光線入射在顯示器面板。   顯示器面板的種類雖若為使用通過量子點片之光線,可形成圖像,則並未被特別限定,但通常情況下,為液晶顯示器面板。   [0279] 由於從光源所發出之光線容易取出尤其是色純度高之紅色光、綠色光及藍色光,故量子點片較佳為前述之層合體。   作為量子點片為層合體時之發光顯示元件面板所具備之構成的較佳組合,可列舉以下a)~h)之組合。   針對下述a)~h)所記載之組合,從最左所記載之構成,記載之順序堆積起來,而形成發光顯示元件面板。   a)面光源/擴散層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   b)附光源之導光板/擴散層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   c)面光源/低折射率層/含有量子點之薄膜/空隙/反射層/顯示器面板   d)附光源之導光板/低折射率層/含有量子點之薄膜/空隙/反射層/顯示器面板   e)面光源/低折射率層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   f)附光源之導光板/低折射率層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   g)面光源/反射層/低折射率層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   h)附光源之導光板/反射層/低折射率層/含有量子點之薄膜/低折射率層/反射層/顯示器面板   [0280] 藉由使用以上說明之發光顯示元件面板,可製造色相之再現範圍廣泛,為良好之色相且可顯示鮮明圖像之發光顯示裝置。 [實施例]   [0281] 以下,雖將本發明由實施例進一步詳細說明,但本發明並非被限定於此等之實施例。   [0282] 在實施例及比較例,使用以下之含矽樹脂A-1~A-6。   A-1:聚苯基矽氧烷樹脂(質量平均分子量:1000)   A-2:聚二甲基矽氧烷樹脂(質量平均分子量:1000)   A-3:由-Si(CH3 )(Ph)-表示之單位所構成之聚矽烷(質量平均分子量:1000、Ph表示苯基)   A-4:由-Si(CH3 )(Ph)-表示之單位所構成之聚矽烷(質量平均分子量:13000、Ph表示苯基)   A-5:包含50質量%之A1、與50質量%之A3的混合樹脂   A-6:包含50質量%之A3、與50質量%之A4的混合樹脂   [0283] 在實施例及比較例,使用以下之量子點B-1~B-5。   對於B-1及B-2,於表1所記載的種類之溶劑中以濃度1質量%作為分散量子點之分散液使用。   對於B-3及B-4,於表1所記載的種類之溶劑中以濃度3質量%作為分散量子點之分散液使用。   對於B-5,於甲苯中以濃度1質量%作為分散量子點之分散液使用。   B-1:由CdSe所構成之芯為被由ZnS所構成之殼層被覆的量子點(發光極大:520nm)   B-2:由CdSe所構成之芯為被由ZnS所構成之殼層被覆的量子點(發光極大:630nm)   B-3:由InP所構成之芯為於被由ZnS所構成之殼層被覆的粒子,配位油胺之量子點(發光極大530nm)   B-4:由InP所構成之芯為於被由ZnS所構成之殼層被覆的粒子,配位油胺之量子點(發光極大620nm)   B-5:由CdSe所構成之芯為被由ZnS所構成之殼層被覆的量子點(發光極大:520nm)   [0284] 在實施例及比較例,使用以下之溶劑S-1~S-6。   S-1:環己基乙酸酯   S-2:丙二醇單甲基醚乙酸酯   S-3:3-甲氧基丁基乙酸酯   S-4:異丙醇   S-5:乙基二甘醇乙酸酯   [0285] [實施例1~12及比較例1~4]   分別均勻混合表1所記載的種類及量(質量份)的含矽樹脂、與量子點、與溶劑,而得到各實施例及比較例之含矽樹脂組成物。   使用所得之含矽樹脂組成物,依以下之方法,進行破裂耐性、與分散安定的試驗。將此等之試驗結果記於表1。   [0286] (破裂耐性評估)   於樣品基板上,將表1之各含矽樹脂組成物使用旋轉塗佈機進行塗佈,形成可形成膜厚5.0μm之二氧化矽薄膜系被膜之膜厚的塗佈膜。將塗佈膜於100℃進行預烘烤2分鐘後,使用縱型烘烤爐(TS8000MB、東京應化工業股份有限公司製),將塗佈膜於350℃燒成30分鐘,而得到膜厚5.0μm之二氧化矽薄膜。將經形成之二氧化矽薄膜的表面使用光學顯微鏡進行觀察,確認破裂的有無。將未確認有破裂的情況判定為良好(○),將確認破裂的情況判定為不佳(×)。將評估結果記於表1。   [0287] (分散安定性評估)   將所得之含矽樹脂組成物中之量子點的平均粒子徑使用HORIBA公司製動態光散射式粒度分布測定裝置LB-500測定。將經測定之平均粒子徑作為分散粒子徑。分散粒子徑越小,係意指量子點無法凝集分散性良好。對於分散性,將分散粒子徑為8nm以下的情況判定為良好(○),將超過15nm的情況判定為不佳(×)。將評估結果記於表1。   [0288][0289] 根據表1,瞭解到含矽樹脂組成物包含量子點並包含前述之式(S1)表示之構造的溶劑時,可製造抑制破裂的發生,量子點良好分散之薄膜。   另外,瞭解到含矽樹脂組成物雖包含量子點但未包含式(S1)表示之構造的溶劑時,在所製造之薄膜容易發生破裂,又難以形成包含良好分散之量子點的薄膜。[0022] <Silicon-containing resin composition> The silicon-containing resin composition of the present invention contains a silicon-containing resin (A), a quantum dot (B), and a solvent (S). As the silicon-containing resin (A), one or more selected from the group consisting of a silicone resin and a polysilane are used. The solvent (S) contains a cycloalkylacetate represented by the following formula (S1). (In formula (S1), R s1 Is an alkyl group having 1 to 3 carbon atoms, p is an integer of 1 to 6, and q is an integer of 0 to (p + 1)). [0023] The silicon-containing resin composition contains a solvent (S) containing a cycloalkyl acetate having a predetermined structure, and can suppress the use of a silicon-containing resin film or a silicon dioxide film formed using the silicon-containing resin composition. Cracking occurs, and quantum dots (B) can be dispersed well in a silicon-containing resin film or a silicon dioxide film. [0024] When a silicon-containing resin composition is used to form a silicon-containing resin film or a silicon dioxide film having a thickness of about 2 to 300 μm, cracks are particularly likely to occur. However, when the silicon-containing resin composition is used in the present invention, even when a silicon-containing resin film or a silicon dioxide film having a film thickness of about 2 to 300 μm is formed, the occurrence of cracks is easily suppressed. [0025] Hereinafter, necessary or arbitrary components included in the silicone-containing resin composition will be described. [Silicon-containing resin (A)] As the silicon-containing resin (A), one or more selected from the group consisting of a silicone resin and a polysilane are used. A silicon-containing resin film is obtained by coating the silicon-containing resin composition containing the silicon-containing resin (A), and a silicon dioxide-based film is obtained by firing the silicon-containing resin film. Hereinafter, a silicone resin and a polysiloxane are demonstrated. (Siloxanes resin) The silicone resin is not particularly limited as long as it is a resin soluble in a solvent (S) containing a cycloalkyl acetate having a structure described later. As the siloxane resin, for example, a siloxane resin obtained by hydrolysis-condensation of at least one selected from the silane compounds represented by the following formula (A1) is suitably used. [0028] In the formula (A1), R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, R ′ represents an alkyl group or a phenyl group, and n represents an integer of 2 to 4. When Si bonds a plurality of Rs, the plurality of Rs may be the same or different. The plural (OR ') groups bonded to Si may be the same or different. [0029] As the alkyl group of R, a linear or branched alkyl group having 1 to 20 carbon atoms is preferred, and a linear or branched alkyl group having 1 to 4 carbon atoms is more preferred. . [0030] When R is an aryl group or an aralkyl group, the aromatic group included in these groups is not particularly limited as long as it does not hinder the object of the present invention. Suitable examples of the aryl group include the following groups. [0031] [0032] Among the above formulae, the following formulae are preferred. [0033] In the above formula, R a1 Is a hydrogen atom; a hydroxyl group; an alkoxy group such as a methoxy group, an ethoxy group, a butoxy group, a propoxy group, and the like; and a hydrocarbon group such as a methyl group, an ethyl group, a butyl group, and a propyl group. In the above formula, R a2 It is an alkylene group such as methylene, ethylene, propyl, butyl. [0034] Specific examples of suitable examples when R is aryl or aralkyl include benzyl, phenethyl, phenyl, naphthyl, anthracenyl, phenanthryl, biphenyl, fluorenyl, and fluorenyl. . [0035] The number of benzene rings contained in the aryl or aralkyl group is preferably 1 to 3. When the number of benzene rings is 1 to 3, the manufacturability of the silicone resin is good, and the increase in the degree of polymerization of the silicone resin suppresses volatilization during firing, and the formation of a silicon dioxide film is easy. An aryl group or an aralkyl group may have a hydroxyl group as a substituent. [0036] The alkyl group as R ′ is preferably a linear or branched alkyl group having 1 to 5 carbon atoms. The number of carbon atoms of the alkyl group of R ′ is particularly preferably 1 or 2 from the viewpoint of hydrolysis rate. The silane compound (i) when n in the formula (A1) is 4 is represented by the following formula (A2). [0037] In the formula (A2), R 1 , R 2 , R 3 And R 4 Each independently independently of the aforementioned R ′ represents an alkyl group or a phenyl group. [0038] a, b, c, and d are 0 ≦ a ≦ 4, 0 ≦ b ≦ 4, 0 ≦ c ≦ 4, 0 ≦ d ≦ 4, and satisfy the conditions of a + b + c + d = 4 Integer. [0039] The silane compound (ii) when n in the formula (A1) is 3 is represented by the following formula (A3). [0040] In the formula (A3), R 5 Represents a hydrogen atom, and is the same as R, and represents an alkyl group, an aryl group, or an aralkyl group. R 6 , R 7 And R 8 Each independently independently of the aforementioned R ′ represents an alkyl group or a phenyl group. [0041] e, f, and g are 0 ≦ e ≦ 3, 0 ≦ f ≦ 3, 0 ≦ g ≦ 3, and are integers that satisfy the condition of e + f + g = 3. [0042] The silane compound (iii) when n in the formula (A1) is 2 is represented by the following formula (A4). In formula (A4), R 9 And R 10 Represents a hydrogen atom, and is the same as R, and represents an alkyl group, an aryl group, or an aralkyl group. R 11 And R 12 Each independently independently of the aforementioned R ′ represents an alkyl group or a phenyl group. [0044] h and i are 0 ≦ h ≦ 2, 0 ≦ i ≦ 2, and are integers that satisfy the condition of h + i = 2. [0045] Specific examples of the silane compound (i) include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, tetrapentyloxysilane, and tetraphenyloxysilane. Silane, trimethoxymonoethoxysilane, dimethoxydiethoxysilane, triethoxymonomethoxysilane, trimethoxymonopropoxysilane, monomethoxytributoxysilane , Monomethoxytripentyloxysilane, monomethoxytriphenyloxysilane, dimethoxydipropoxysilane, tripropoxymonomethoxysilane, trimethoxymonobutoxy Silane, dimethoxydibutoxysilane, triethoxymonopropoxysilane, diethoxydipropoxysilane, tributoxymonopropoxysilane, dimethoxymonoethoxy Monobutoxysilane, diethoxymonomethoxymonobutoxysilane, diethoxymonopropoxymonobutoxysilane, dipropoxymonomethoxymonoethoxysilane, dipropylene Oxymonomethoxymonobutoxysilane, dipropoxymonoethoxymonobutoxysilane, dibutoxymonomethoxymonoethoxysilane, dibutoxymonoethoxymonopropane Tetraalkoxysilanes such as methoxysilane, monomethoxymonoethoxymonopropoxymonobutoxysilane, and the like, among them, tetramethoxysilane and tetraethoxysilane are preferred. [0046] Specific examples of the silane compound (ii) include trimethoxysilane, triethoxysilane, tripropoxysilane, tripentyloxysilane, triphenyloxysilane, and dimethoxy group. Monoethoxysilane, diethoxymonomethoxysilane, dipropoxymonomethoxysilane, dipropoxymonoethoxysilane, dipentyloxy (Oxyl) monomethoxysilane, Dipentyloxy monoethoxysilane, dipentyloxy monopropoxysilane, diphenyloxy (Oxyl) monomethoxysilane, diphenyloxy monoethoxysilane, diphenyl Oxymonopropoxysilane, methoxyethoxypropoxysilane, monopropoxydimethoxysilane, monopropoxydiethoxysilane, monobutoxydimethoxysilane, mono Hydrosilane compounds such as pentyloxydiethoxysilane and monophenyloxydiethoxysilane; methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyl Tripentyloxysilane, methyltriphenyloxysilane, methylmonomethoxydiethoxysilane, methylmonomethoxydipropoxysilane, methylmonomethoxy Amyloxysilane, methylmonomethoxydiphenyloxysilane, methylmethoxyethoxypropoxysilane, methylmonomethoxymonoethoxymonobutoxysilane, etc. Silane compounds; ethyltrimethoxysilane, ethyltriethoxysilane, ethyltripropoxysilane, ethyltripentyloxysilane, ethyltriphenyloxysilane, ethylmonomethoxy Didiethoxysilane, ethylmonomethoxydipropoxysilane, ethylmonomethoxydipentyloxysilane, ethylmonomethoxydiphenyloxysilane, ethylmethoxy Ethoxysilane compounds such as ethoxypropoxysilane and ethylmonomethoxymonoethoxymonobutoxysilane; propyltrimethoxysilane, propyltriethoxysilane, propyltripropoxy Silane, propyltripentyloxysilane and propyltriphenyloxysilane, propylmonomethoxydiethoxysilane, propylmonomethoxydipropoxysilane, propylmonomethoxy Dipentyloxysilane, propylmonomethoxydiphenyloxysilane, propylmethoxyethoxypropoxysilane, and propylmonomethoxymonoethoxymonobutoxy Silane and other propyl silane compounds; butyltrimethoxysilane, butyltriethoxysilane, butyltripropoxysilane, butyltripentyloxysilane, butyltriphenyloxysilane, butyl Methylmonomethoxydiethoxysilane, butylmonomethoxydipropoxysilane, butylmonomethoxydipentyloxysilane, butylmonomethoxydiphenyloxysilane, butylmethyl Butylsilane compounds such as ethoxyethoxypropoxysilane and butylmonomethoxymonoethoxymonobutoxysilane; phenyltrimethoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane Propoxysilane, phenyltripentyloxysilane, phenyltriphenyloxysilane, phenylmonomethoxydiethoxysilane, phenylmonomethoxydipropoxysilane, phenylmonosilane Methoxydipentyloxysilane, phenylmonomethoxydiphenyloxysilane, phenylmethoxyethoxypropoxysilane, and phenylmonomethoxymonoethoxymonobutoxy Phenylsilane compounds such as silane; hydroxyphenyltrimethoxysilane, hydroxyphenyltriethoxysilane, hydroxyphenyltripropoxysilane, hydroxybenzene Tripentyloxysilane, hydroxyphenyltriphenyloxysilane, hydroxyphenylmonomethoxydiethoxysilane, hydroxyphenylmonomethoxydipropoxysilane, hydroxyphenylmonomethoxy Dipentyloxysilane, hydroxyphenylmonomethoxydiphenyloxysilane, hydroxyphenylmethoxyethoxypropoxysilane, and hydroxyphenylmonomethoxymonoethoxymonobutoxy Hydroxyphenylsilane compounds such as silane; naphthyltrimethoxysilane, naphthyltriethoxysilane, naphthyltripropoxysilane, naphthyltripentyloxysilane, naphthyltriphenyloxysilane, Naphthylmonomethoxydiethoxysilane, naphthylmonomethoxydipropoxysilane, naphthylmonomethoxydipentyloxysilane, naphthylmonomethoxydiphenyloxysilane, Naphthylsilane compounds such as naphthylmethoxyethoxypropoxysilane and naphthylmonomethoxymonoethoxymonobutoxysilane; benzyltrimethoxysilane, benzyltriethoxysilane, Benzyltripropoxysilane, benzyltripentyloxysilane, benzyltriphenyloxysilane, benzylmonomethoxydiethoxysilane, benzyl Monomethoxydipropoxysilane, benzylmonomethoxydipentyloxysilane, benzylmonomethoxydiphenyloxysilane, benzylmethoxyethoxypropoxysilane, and benzyl Benzylsilane compounds such as monomethoxymethoxyethoxymonobutoxysilane; hydroxybenzyltrimethoxysilane, hydroxybenzyltriethoxysilane, hydroxybenzyltripropoxysilane, hydroxybenzyl Tripentyloxysilane, hydroxybenzyltriphenyloxysilane, hydroxybenzylmonomethoxydiethoxysilane, hydroxybenzylmonomethoxydipropoxysilane, hydroxybenzylmonomethoxy Dipentyloxysilane, hydroxybenzylmonomethoxydiphenyloxysilane, hydroxybenzylmethoxyethoxypropoxysilane, and hydroxybenzylmonomethoxymonoethoxymonobutoxy A hydroxybenzylsilane compound such as silane. [0047] Specific examples of the silane compound (iii) include dimethoxysilane, diethoxysilane, dipropoxysilane, dipentyloxysilane, diphenyloxysilane, and methoxy Ethoxysilane, methoxypropoxysilane, methoxypentyloxysilane, methoxyphenyloxysilane, ethoxypropoxysilane, ethoxypentyloxysilane, and ethoxy Hydroxysilane compounds such as methylphenyloxysilane; methyldimethoxysilane, methylmethoxyethoxysilane, methyldiethoxysilane, methylmethoxypropoxysilane, methyl Methoxypentyloxysilane, methylethoxypropoxysilane, methyldipropoxysilane, methyldipentyloxysilane, methyldiphenyloxysilane, methylmethoxy Methylhydrosilane compounds such as phenyloxysilane; ethyldimethoxysilane, ethylmethoxyethoxysilane, ethyldiethoxysilane, ethylmethoxypropoxysilane, ethyl Methylmethoxypentyloxysilane, ethylethoxypropoxysilane, ethyldipropoxysilane, ethyldipentyloxysilane, ethyldiphenyl Ethylhydrosilane compounds such as methoxysilane, ethylmethoxyphenyloxysilane, etc .; propyldimethoxysilane, propylmethoxyethoxysilane, propyldiethoxysilane, propyl Methoxypropoxysilane, propylmethoxypentyloxysilane, propylethoxypropoxysilane, propyldipropoxysilane, propyldipentyloxysilane, propyldiphenyl Propylhydrosilane compounds such as methoxysilane and propylmethoxyphenyloxysilane; butyldimethoxysilane, butylmethoxyethoxysilane, butyldiethoxysilane, butylmethoxy Propoxysilane, butylmethoxypentyloxysilane, butylethoxypropoxysilane, butyldipropoxysilane, butyldipentyloxysilane, butyldiphenyloxysilane, Butylhydrosilane compounds such as butylmethoxyphenyloxysilane; phenyldimethoxysilane, phenylmethoxyethoxysilane, phenyldiethoxysilane, phenylmethoxypropoxy Silane, phenylmethoxypentyloxysilane, phenylethoxypropoxysilane, phenyldipropoxysilane, phenyl Phenyloxysilane compounds such as pentyloxysilane, phenyldiphenyloxysilane, phenylmethoxyphenyloxysilane, etc .; hydroxyphenyldimethoxysilane, hydroxyphenylmethoxyethoxy Silane, hydroxyphenyldiethoxysilane, hydroxyphenylmethoxypropoxysilane, hydroxyphenylmethoxypentyloxysilane, hydroxyphenylethoxypropoxysilane, hydroxyphenyldisiloxane Hydroxyphenylhydrosilane compounds such as propoxysilane, hydroxyphenyldipentyloxysilane, hydroxyphenyldiphenyloxysilane, hydroxyphenylmethoxyphenyloxysilane, etc .; naphthyldimethoxy Silyl, naphthylmethoxyethoxysilane, naphthyldiethoxysilane, naphthylmethoxypropoxysilane, naphthylmethoxypentyloxysilane, naphthylethoxypropoxy Naphthylhydrosilane compounds such as silane, naphthyldipropoxysilane, naphthyldipentyloxysilane, naphthyldiphenyloxysilane, naphthylmethoxyphenyloxysilane, etc .; benzyldimethyl Oxysilane, benzylmethoxyethoxysilane, benzyldiethoxysilane, benzylmethoxypropoxysilane, benzyl Methoxymethoxypentyloxysilane, benzylethoxypropoxysilane, benzyldipropoxysilane, benzyldipentyloxysilane, benzyldiphenyloxysilane, benzylmethoxy Benzylhydrosilane compounds such as phenylphenyloxysilane; hydroxybenzyldimethoxysilane, hydroxybenzylmethoxyethoxysilane, hydroxybenzyldiethoxysilane, hydroxybenzylmethoxypropyl Oxysilane, hydroxybenzylmethoxypentyloxysilane, hydroxybenzylethoxypropoxysilane, hydroxybenzyldipropoxysilane, hydroxybenzyldipentyloxysilane, hydroxybenzyldisilane Hydroxybenzylhydrosilane compounds such as phenyloxysilane, hydroxybenzylmethoxyphenyloxysilane, etc .; dimethyldimethoxysilane, dimethylmethoxyethoxysilane, dimethylmethyl Oxypropoxysilane, dimethyldiethoxysilane, dimethyldipentyloxysilane, dimethyldiphenyloxysilane, dimethylethoxypropoxysilane, dimethyl Dimethyl silane compounds such as dipropoxysilane; diethyldimethoxysilane, diethylmethoxyethoxysilane, Dimethoxyethoxysilane, diethyldiethoxysilane, diethyldipentyloxysilane, diethyldiphenyloxysilane, diethylethoxypropoxysilane, diethyl Diethylsilane compounds such as ethyldipropoxysilane; dipropyldimethoxysilane, dipropylmethoxyethoxysilane, dipropylmethoxypropoxysilane, dipropyldisilane Dipropoxy, such as ethoxysilane, dipropyldipentyloxysilane, dipropyldiphenyloxysilane, dipropylethoxypropoxysilane, dipropyldipropoxysilane, etc. Silane compounds; dibutyldimethoxysilane, dibutylmethoxyethoxysilane, dibutylmethoxypropoxysilane, dibutyldiethoxysilane, dibutyldipentyloxysilane, disilane Dibutylsilane compounds such as butyldiphenyloxysilane, dibutylethoxypropoxysilane, dibutyldipropoxysilane; diphenyldimethoxysilane, diphenylmethoxy Ethoxysilane, diphenylmethoxypropoxysilane, diphenyldiethoxysilane, diphenyldipentyloxysilane, diphenyl Diphenylsilane compounds such as phenyloxysilane, diphenylethoxypropoxysilane, diphenyldipropoxysilane; bis (hydroxyphenyl) dimethoxysilane, bis (hydroxyphenyl) ) Methoxyethoxysilane, bis (hydroxyphenyl) methoxypropoxysilane, bis (hydroxyphenyl) diethoxysilane, bis (hydroxyphenyl) dipentyloxysilane, bis ( Bis (hydroxyphenyl) silane compounds such as hydroxyphenyl) diphenyloxysilane, bis (hydroxyphenyl) ethoxypropoxysilane, bis (hydroxyphenyl) dipropoxysilane; dinaphthyl Dimethoxysilane, dinaphthylmethoxyethoxysilane, dinaphthylmethoxypropoxysilane, dinaphthyldiethoxysilane, dinaphthyldipentyloxysilane, dinaphthyl Dinaphthylsilane compounds such as diphenyloxysilane, dinaphthylethoxypropoxysilane, dinaphthyldipropoxysilane, etc .; dibenzyldimethoxysilane, dibenzylmethoxyethyl Oxysilane, dibenzylmethoxypropoxysilane, dibenzyldiethoxysilane, dibenzyldipentyloxysilane, dibenzyldiphenyloxysilane, dibenzylethoxy Dibenzylsilane compounds such as dipropyloxysilane and dibenzyldipropoxysilane; bis (hydroxybenzyl) dimethoxysilane, bis (hydroxybenzyl) methoxyethoxysilane, di ( Hydroxybenzyl) methoxypropoxysilane, bis (hydroxybenzyl) diethoxysilane, bis (hydroxybenzyl) dipentyloxysilane, bis (hydroxybenzyl) diphenyloxysilane, Bis (hydroxybenzyl) ethoxypropoxysilane, bis (hydroxybenzyl) dipropoxysilane, and other bis (hydroxybenzyl) silane compounds; methylethyldimethoxysilane, methylethyl Methoxyethoxysilane, methylethylmethoxypropoxysilane, methylethyldiethoxysilane, methylethyldipentyloxysilane, methylethyldiphenyloxy Methylethylsilane compounds such as silane, methylethylethoxypropoxysilane, methylethyldipropoxysilane, etc .; methylpropyldimethoxysilane, methylpropylmethoxyethyl Oxysilane, methylpropylmethoxypropoxysilane, methylpropyldiethoxysilane, methylpropyldipentyloxysilane, methylpropyldiphenyloxysilane, methyl Methylpropylsilane compounds such as methylethoxypropoxysilane, methylpropyldipropoxysilane; methylbutyldimethoxysilane, methylbutylmethoxyethoxysilane, methylbutylmethyl Oxypropoxysilane, methylbutyldiethoxysilane, methylbutyldipentyloxysilane, methylbutyldiphenyloxysilane, methylbutylethoxypropoxysilane Methyl butyl silane compounds such as methyl butyl dipropoxy silane, methyl phenyl di methoxy silane, methyl phenyl methoxy ethoxy silane, methyl phenyl ) Methoxypropoxysilane, methyl (phenyl) diethoxysilane, methyl (phenyl) dipentyloxysilane, methyl (phenyl) diphenyloxysilane, methyl ( Methyl (phenyl) silane compounds such as phenyl) ethoxypropoxysilane, methyl (phenyl) dipropoxysilane; methyl (hydroxyphenyl) dimethoxysilane, methyl (hydroxy (Phenyl) methoxyethoxysilane, methyl (hydroxyphenyl) methoxypropoxysilane, methyl (hydroxyphenyl) diethoxysilane, methyl (hydroxyphenyl) dipentyloxy Silane, methyl (hydroxy Methyl (hydroxyphenyl) silane compounds such as phenyl) diphenyloxysilane, methyl (hydroxyphenyl) ethoxypropoxysilane, methyl (hydroxyphenyl) dipropoxysilane, etc .; (Naphthyl) dimethoxysilane, methyl (naphthyl) methoxyethoxysilane, methyl (naphthyl) methoxypropoxysilane, methyl (naphthyl) diethoxysilane , Methyl (naphthyl) dipentyloxysilane, methyl (naphthyl) diphenyloxysilane, methyl (naphthyl) ethoxypropoxysilane, methyl (naphthyl) dipropoxy Methyl (naphthyl) silane compounds such as methylsilane; methyl (benzyl) dimethoxysilane, methyl (benzyl) methoxyethoxysilane, methyl (benzyl) methoxypropoxy Silane, methyl (benzyl) diethoxysilane, methyl (benzyl) dipentyloxysilane, methyl (benzyl) diphenyloxysilane, methyl (benzyl) ethoxy Methyl (benzyl) silane compounds such as propoxysilane, methyl (benzyl) dipropoxysilane; methyl (hydroxybenzyl) dimethoxysilane, methyl (hydroxybenzyl) methoxy Ethoxysilane, methyl (hydroxybenzyl) methoxypropoxysilane, methyl (hydroxybenzyl) ) Diethoxysilane, methyl (hydroxybenzyl) dipentyloxysilane, methyl (hydroxybenzyl) diphenyloxysilane, methyl (hydroxybenzyl) ethoxypropoxysilane, Methyl (hydroxybenzyl) dipropoxysilane and other methyl (hydroxybenzyl) silane compounds; ethylpropyldimethoxysilane, ethylpropylmethoxyethoxysilane, ethylpropyl Methoxypropoxysilane, ethylpropyldiethoxysilane, ethylpropyldipentyloxysilane, ethylpropyldiphenyloxysilane, ethylpropylethoxypropoxy Ethylpropylsilane compounds such as silane, ethylpropyldipropoxysilane; ethylbutyldimethoxysilane, ethylbutylmethoxyethoxysilane, ethylbutylmethoxypropoxysilane, Ethylbutyldiethoxysilane, ethylbutyldipentyloxysilane, ethylbutyldiphenyloxysilane, ethylbutylethoxypropoxysilane, ethylbutyldipropylene Ethylbutylsilane compounds such as oxysilane; ethyl (phenyl) dimethoxysilane, ethyl (phenyl) methoxyethoxysilane, ethyl (phenyl) methoxypropoxy Alkane, ethyl (phenyl) diethoxysilane, ethyl (phenyl) dipentyloxysilane, ethyl (phenyl) diphenyloxysilane, ethyl (phenyl) ethoxypropane Ethyl (phenyl) silane compounds such as oxysilane, ethyl (phenyl) dipropoxysilane; ethyl (hydroxyphenyl) dimethoxysilane, ethyl (hydroxyphenyl) methoxyethyl Oxysilane, ethyl (hydroxyphenyl) methoxypropoxysilane, ethyl (hydroxyphenyl) diethoxysilane, ethyl (hydroxyphenyl) dipentyloxysilane, ethyl (hydroxy Phenyl) diphenyloxysilane, ethyl (hydroxyphenyl) ethoxypropoxysilane, ethyl (hydroxyphenyl) dipropoxysilane, and other ethyl (hydroxyphenyl) silane compounds; ethyl (Naphthyl) dimethoxysilane, ethyl (naphthyl) methoxyethoxysilane, ethyl (naphthyl) methoxypropoxysilane, ethyl (naphthyl) diethoxysilane , Ethyl (naphthyl) dipentyloxysilane, ethyl (naphthyl) diphenyloxysilane, ethyl (naphthyl) ethoxypropoxysilane, ethyl (naphthyl) dipropoxy Ethyl (naphthyl) silane compounds such as silane; ethyl (benzyl) dimethoxysilane Alkane, ethyl (benzyl) methoxyethoxysilane, ethyl (benzyl) methoxypropoxysilane, ethyl (benzyl) diethoxysilane, ethyl (benzyl) dipentane Ethyl (benzyl) groups such as ethoxysilane, ethyl (benzyl) diphenyloxysilane, ethyl (benzyl) ethoxypropoxysilane, ethyl (benzyl) dipropoxysilane, etc. ) Silane compounds; ethyl (hydroxybenzyl) dimethoxysilane, ethyl (hydroxybenzyl) methoxyethoxysilane, ethyl (hydroxybenzyl) methoxypropoxysilane, ethyl ( Hydroxybenzyl) diethoxysilane, ethyl (hydroxybenzyl) dipentyloxysilane, ethyl (hydroxybenzyl) diphenyloxysilane, ethyl (hydroxybenzyl) ethoxypropoxy (Hydroxybenzyl) silane compounds such as ethylsilane, ethyl (hydroxybenzyl) dipropoxysilane; propylbutyldimethoxysilane, propylbutylmethoxyethoxysilane, propylbutylmethyl Oxypropoxysilane, propylbutyldiethoxysilane, propylbutyldipentyloxysilane, propylbutyldiphenyloxysilane, propylbutylethoxypropoxysilane , Propylbutyldipropoxysilane, etc. Propylbutylsilane compounds; propyl (phenyl) dimethoxysilane, propyl (phenyl) methoxyethoxysilane, propyl (phenyl) methoxypropoxysilane, propyl ( Phenyl) diethoxysilane, propyl (phenyl) dipentyloxysilane, propyl (phenyl) diphenyloxysilane, propyl (phenyl) ethoxypropoxysilane, propane (Phenyl) dipropoxysilane and other propyl (phenyl) silane compounds; propyl (hydroxyphenyl) dimethoxysilane, propyl (hydroxyphenyl) methoxyethoxysilane, propane (Hydroxyphenyl) methoxypropoxysilane, propyl (hydroxyphenyl) diethoxysilane, propyl (hydroxyphenyl) dipentyloxysilane, propyl (hydroxyphenyl) diphenyl Propyl (hydroxyphenyl) silane compounds such as propyloxysilane, propyl (hydroxyphenyl) ethoxypropoxysilane, propyl (hydroxyphenyl) dipropoxysilane, etc .; propyl (naphthyl) Dimethoxysilane, propyl (naphthyl) methoxyethoxysilane, propyl (naphthyl) methoxypropoxysilane, propyl (naphthyl) diethoxysilane, propyl (naphthalene Group) dipentyloxysilane, propyl (naphthyl) diphenyloxysilane, (Naphthyl) ethoxypropoxysilane, propyl (naphthyl) dipropoxysilane and other propyl (naphthyl) silane compounds; propyl (benzyl) dimethoxysilane, propyl (naphthyl) Benzyl) methoxyethoxysilane, propyl (benzyl) methoxypropoxysilane, propyl (benzyl) diethoxysilane, propyl (benzyl) dipentyloxysilane, Propyl (benzyl) diphenyloxysilane, propyl (benzyl) ethoxypropoxysilane, propyl (benzyl) dipropoxysilane, and other propyl (benzyl) silane compounds; propyl (Hydroxybenzyl) dimethoxysilane, propyl (hydroxybenzyl) methoxyethoxysilane, propyl (hydroxybenzyl) methoxypropoxysilane, propyl (hydroxybenzyl) di Ethoxysilane, propyl (hydroxybenzyl) dipentyloxysilane, propyl (hydroxybenzyl) diphenyloxysilane, propyl (hydroxybenzyl) ethoxypropoxysilane, propyl (Hydroxybenzyl) propyl (hydroxybenzyl) silane compounds such as dipropoxysilane. [0048] The silane compound described above is hydrolyzed and condensed by a conventional method to obtain a siloxane resin. The mass average molecular weight of the silicone resin is preferably 300 to 30,000, and more preferably 500 to 10,000. Can mix more than 2 kinds of siloxane resins with different mass average molecular weight. When the mass average molecular weight of the siloxane resin is within this range, it is easy to obtain a silicon-containing resin composition having excellent film-forming properties and forming a flat silicon-containing resin film or a silicon dioxide film. [0049] A suitable example of the siloxane resin obtained by hydrolyzing and condensing the silane compound described above includes a siloxane resin having a structural unit represented by the following formula (a-1). In this silicone resin, the number of carbon atoms is two or more with respect to one silicon atom. (In formula (a-1), R 1 Is alkyl, aryl or aralkyl, R 2 Is hydrogen or alkyl, aryl or aralkyl, m is 0 or 1). In R 1 And R 2 The alkyl, aryl or aralkyl group is the same as the alkyl, aryl or aralkyl group of the aforementioned formula (I). As described above, by using a siloxane resin having an alkyl group, an aryl group, or an aralkyl group, a silicon dioxide film having excellent durability can be formed, and a silicon-containing resin composition that easily fills a minute space can be easily obtained. [0051] The alkyl group is preferably an alkyl group having 1 to 5 carbon atoms, and examples thereof include methyl, ethyl, n-propyl, i-propyl, n-butyl, tert-butyl, and the like. By having an alkyl group having 1 to 5 carbon atoms in this manner, a silicon dioxide film having good heat resistance is easily formed. Examples of the aryl group and aralkyl group include benzyl, phenethyl, phenyl, naphthyl, anthracenyl, phenanthryl, biphenyl, fluorenyl, and fluorenyl. [0052] As the aryl group and the aralkyl group, specifically, a structure having the following structure is preferable. [0053] In the above formula, R 3 Is a hydrogen atom; a hydroxyl group; an alkoxy group such as methoxy, ethoxy, butoxy, and propoxy; a hydrocarbon group such as methyl, ethyl, butyl, and propyl; R 4 It is an alkylene group such as methylene, ethylene, propyl, butyl. The aromatic hydrocarbon group may have at least one aromatic ring in the aromatic hydrocarbon group, and has the above-mentioned R 3 , May also have multiple. With plural R 3 R 3 It can be the same or different. [0054] R 1 , Preferably having the following structure (R 1 -a) or construct (R 1 -b), especially as (R 1 -b). [0055] In the formula (a-1), it is preferable that m is 0. In this case, the siloxane resin system has a hemisiloxane frame. Furthermore, the siloxane resin is more preferably a stepped siloxane. [0056] Furthermore, the structural unit (unit skeleton) represented by formula (a-1) preferably has an atomic ratio of 2 to 15 carbon atoms relative to one silicon atom. [0057] The siloxane resin may have two or more kinds of structural units (a-1). The siloxane resin may be a siloxane resin composed of different structural units (a-1). Specific examples of the siloxane resin having two or more structural units (a-1) include the siloxane resins represented by the following structural formulae (A-1-1) to (A-1-3) . [0058] The siloxane resin may be, for example, one containing a constituent unit represented by the following formula (A-1-4). In formula (A-1-4), R 13 An organic group having at least one group selected from the group consisting of a (meth) acrylfluorenyl group, a vinyl group, and an epoxy group in its structure. At least one group selected from the group consisting of a (meth) acrylfluorenyl group, a vinyl group, and an epoxy group, may be directly bonded to a Si atom, or may be bonded through a linking group. The linking group is, for example, an alkylene or aryl group having 1 to 10 carbon atoms, which may be linear or branched, or a combination of these divalent groups. The linking group may have an ether bond, an amine bond, or a fluorene bond. [0059] The constituent units represented by (A-1-4) include, for example, the following, but they are not limited to these. [0060] R 13 When it has an epoxy group, as R 13 Suitable examples include 2- (3,4-epoxycyclohexyl) ethyl and 2- (3,4-epoxycyclohexyl) propyl. [0061] As the siloxane resin, for example, one containing a constituent unit represented by the following formula (A-1-5) can be used. In the formula (A-1-5), R 14 An organic group having at least one carboxyl group in its structure. The carboxyl group is preferably bonded to the Si atom through a linking group. The linking group is, for example, a linear or branched alkylene group, a cycloalkylene group, or an aromatic group, or a combination thereof. Equal bivalent base. The linking group may have an ether bond, an amine bond, a fluorene bond, or a vinyl bond, and preferably has a fluorene bond. R 14 For example, although the following are listed, they are not limited to these. In the following formula, * means R which is bonded to Si in formula (A-1-5). 14 The end of the bond. [0063] The silicon-containing resin composition may contain a hardener (C) described later. When the silicon-containing resin composition containing the hardener (C), (i) when the hardener (C) contains a hardener that generates an alkali component by light or heat, (ii) when the silicon-containing resin composition contains other later described When at least one of the group consisting of a photopolymerization initiator, an acid generator or an alkali generator, or (iii) when the method for producing a film described later has an exposure step, the siloxane resin preferably contains (A-1-4) indicates the constituent unit. Similarly, (iv) when at least one of the group consisting of a photopolymerization initiator, an acid generator or an alkali generator (other than a hardening agent (C)) is included, which is described later, The siloxane resin preferably contains a constituent unit represented by (A-1-4). The content ratio of the constituent unit represented by (A-1-4) in the siloxane resin is, for example, 10 to 80 mol%. As another constituent unit, a structural unit represented by formula (a-1) and / or a constituent unit represented by (A-1-5) may be further included. In addition, two or more types of constituent units corresponding to each type may be included. [0064] In the method for manufacturing a thin film described later, when it has a developing step, the siloxane resin preferably contains a structural unit selected from (A-1-5) and has a structure (R 1 -a) constituent units and structures (R 1 -b) One or more constituent units in a group of constituent units. It is selected from the structural units represented by (A-1-5) in the siloxane resin, and has a structure (R 1 -a) constituent units and structures (R 1 The content ratio of the constituent units in the group constituted by the constituent units of -b) is, for example, 20 to 90 mol%. In this case, as another constituent unit, the structural unit represented by formula (a-1) and / or the constituent unit represented by (A-1-4) may be further included, and it is preferable to include the unit represented by (A-1-4) Structural unit and the siloxane resin represented by (A-1-5). In addition, two or more types of constituent units corresponding to each type may be included. (Polysilane) The structure of polysilane is not particularly limited. Although the polysilane may be linear, branched, mesh, or cyclic, a linear or branched chain structure is preferred. The polysilane may contain a silanol group and / or an alkoxy group. As suitable polysilane, for example, at least one of the units represented by the following formulae (A5) and (A6) must be included, and any unit selected from the following formulae (A7), (A8), and (A9) can be included Of at least one unit of polysilane. The polysilane may contain a silanol group or an alkoxy group bonded to a silicon atom. [0066] (In formulae (A5), (A7), and (A8), R a3 And R a4 Represents a hydrogen atom, an organic group, or a silyl group; R a5 Represents a hydrogen atom or an alkyl group; R a5 In the case of an alkyl group, an alkyl group having 1 to 4 carbon atoms is preferred, and a methyl group and an ethyl group are more preferred. [0067] For R a3 And R a4 Examples of the organic group include a hydrocarbon group or an alkoxy group, such as an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, an aralkyl group, an alkenyloxy group, a cycloalkoxy group, and a cycloalkenyloxy group. , Aryloxy, aralkyloxy and the like. Among these groups, an alkyl group, an aryl group, and an aralkyl group are preferable. Suitable examples of the alkyl group, the aryl group, and the aralkyl group are the same as those in the case where R in the formula (A1) is an alkyl group, an aryl group, or an aralkyl group. R a3 And R a4 In the case of a silyl group, examples of the silyl group include Si, such as silyl, silanyl, and silanyl. 1-10 Silanyl (Si 1-6 Silanyl, etc.). The polysilane is preferably a unit including the following (A10) to (A13). (A10) to (A13), R a3 And R a4 Is the same as R in formulas (A5), (A7), and (A8) a3 And R a4 the same. a, b, and c are each an integer from 2 to 1,000. a, b, and c are each preferably 10 to 500, and more preferably 10 to 100. The constituent units in each unit may include random in the unit, or may be included in a block state. [0069] Among the polysilanes described above, a combination alkyl group containing a silicon atom, a polysilane group bonded to an aryl group or an aralkyl group, or a polysilane group bonded only to an alkyl group and a silicon atom is preferred. More specifically, it is preferable to use a polysilane containing a combined methyl group and a benzyl group bonded to a silicon atom, or a polysilane containing a combined methyl group, a phenyl group or a methyl group alone to a silicon atom, respectively. Polysilane bonded by silicon atoms. [0070] The mass average molecular weight of the polysilane is preferably 300 to 100,000, more preferably 500 to 70,000, and still more preferably 800 to 30,000. Can mix more than 2 kinds of polysilane with different mass average molecular weight. [0071] The content of the silicon-containing resin (A) in the silicon-containing resin composition is not particularly limited, and may be set in accordance with a desired film thickness. From the viewpoint of film forming property, the content of the silicon-containing resin (A) in the silicon-containing resin composition is preferably 1 to 50% by mass, more preferably 5 to 40% by mass, and particularly preferably 10 to 35% by mass. . [Quantum Dot (B)] The silicon-containing resin composition includes a quantum dot (B). The structure of the quantum dot (B) is not particularly limited as long as it is a fine particle capable of exerting its function as a quantum dot. Quantum dots (B) are nano-scale materials that have unique optical characteristics (quantum confinement effect described later) in accordance with quantum mechanics, and are generally semiconductor nano particles. In this specification, the quantum dot (B) is also included on the surface of the semiconductor nanoparticle and is covered by a person (having a shell structure to be described later) to improve the luminescence quantum yield, or a surface modifier to stabilize the quantum dot. [0073] Although the quantum dot (B) absorbs photons with a larger energy than the band gap (the energy difference between the valence band and the conduction band), and becomes a semiconductor nanoparticle that emits light according to the wavelength of its particle diameter, As the element included in the material of the quantum dot (B), for example, a group selected from group II elements (groups 2A and 2B), group III elements (particularly group 3A), group IV elements (particularly group 4A), and V One or more of the group consisting of group elements (especially group 5A) and group VI elements (especially group 6A). Preferred compounds or elements as the material of the quantum dot (B) include, for example, a group II-VI compound, a group III-V compound, a group IV-VI compound, a group IV element, a group IV compound, and combinations thereof. [0074] Examples of the group II-VI compounds include at least one selected from the group consisting of CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS, and mixtures thereof. Compound; selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, ZnMg, etc. At least one compound of the group; and at least one compound selected from the group consisting of HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof. [0075] Examples of the III-V compound include at least one compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; and A compound selected from the group consisting of at least one of GaNP, GaAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; and selected from GaAlNAs, GaAlNSb A compound of at least one of GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof. [0076] Examples of the Group IV-VI compounds include compounds selected from at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; selected from SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, and PbSTe A compound of at least one of SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a compound of at least one selected from SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof. [0077] As the group IV element, a compound selected from at least one selected from the group consisting of Si, Ge, and mixtures thereof can be cited. As the Group IV compound, a compound selected from at least one selected from the group consisting of SiC, SiGe, and mixtures thereof. [0078] Although the structure of the quantum dot (B) may be a homogeneous structure composed of one kind of compound or a composite structure composed of two or more kinds of compounds, in order to improve the light emitting quantum yield of the above compound, The structure of the quantum dot (B) is preferably a core-shell structure in which the core is covered with one or more shell layers, and more preferably, the surface of the particles of the compound that is the material of the core is coated with an epitaxial semiconductor material. Of the structure. For example, when CdSe of Group II-VI is used as the material of the core, ZnS is used as the coating layer (shell). The shell is preferably the same lattice number as the material of the core, and a combination of materials with a small difference between the core and shell lattice numbers is appropriately selected. [0079] From the viewpoint of safety, the quantum dot (B) does not include Cd or Pb as a constituent component, preferably contains In or Si as a constituent component, and more preferably contains In. [0080] As a suitable specific example of the quantum dot (B) of the homogeneous structure type having no shell layer, AgInS may be mentioned. 2 And AgInS doped with Zn 2 . Examples of the core-shell type quantum dot (B) include InP / ZnS and CuInS. 2 / ZnS and (ZnS / AgInS 2 ) Solid solution / ZnS. In the above description, the material of the core-shell type quantum dot (B) is described as (the material of the core) / (the material of the shell). [0081] From the viewpoint of improving the safety and the light-emitting quantum yield, it is preferable that the shell of the core-shell structure has a multilayer structure, and more preferably has a two-layer structure. In the case of a core-multilayer shell structure, the material of the core is preferably at least one compound selected from the group consisting of InP, ZnS, and ZnSe, and more preferably contains InP. As a content ratio, in the total mass of the core, InP is 50 to 100% by mass, preferably 60 to 99% by mass, and more preferably 82 to 95% by mass. In addition, among the total mass of the core, ZnS and / or ZnSe is 0 to 50% by mass, preferably 1 to 40% by mass, and more preferably 5 to 18% by mass. [0082] The material of the first shell in the multilayer shell structure is preferably ZnS and / or ZnSe. The content ratio of ZnS and / or ZnSe is based on the total mass of the first shell, and is, for example, 50 to 100% by mass, preferably 75 to 98% by mass, and more preferably 80 to 97% by mass. When the material of the first shell is a mixture of ZnS and ZnSe, the mixing ratio (mass ratio) is not particularly limited, but is 1/99 to 99/1, and preferably 10/90 to 90/10. [0083] In the multilayer shell structure, the second shell is grown on the surface of the first shell. The material of the second shell is preferably the same as the material of the first shell (however, the difference in the lattice number of the core is different in each material. That is, in each material, 99% or more are excluded). The content ratio of ZnS and / or ZnSe is based on the total mass of the second shell, and is, for example, 50 to 100% by mass, preferably 75 to 98% by mass, and more preferably 80 to 97% by mass. When the material of the second shell is a mixture of ZnS and ZnSe, the mixing ratio (mass ratio) is not particularly limited, but is 1/99 to 99/1 and 10/90 to 90/10. [0084] The first shell and the second shell in the multilayer shell structure have a difference in lattice constant. For example, the lattice constant difference between the core and the first shell is 2 to 8%, preferably 2 to 6%, and more preferably 3 to 5%. The difference in lattice constant between the core and the second shell is 5 to 13%, preferably 5 to 12%, more preferably 7 to 10%, and even more preferably 8 to 10%. [0085] The difference between the lattice numbers of the first shell and the second shell is, for example, 3 to 9%, preferably 3 to 7%, and more preferably 4 to 6%. [0086] The quantum dot (B) having the core-multilayer shell structure can have an emission wavelength in the range of 400 to 800 nm (and further in the range of 470 to 650 nm, especially in the range of 540 to 580 nm). . [0087] Examples of the quantum dots (B) having such a core-multilayer shell structure include InP / ZnS / ZnSe and InP / ZnSe / ZnS. [0088] The quantum dot (B) may be surface-modified. Examples include phosphorus compounds such as phosphines, phosphine oxides, and trialkylphosphines; organic nitrogen compounds such as pyridine, aminoalkanes, and tertiary amines; mercapto alcohols, thiols, dialkyl sulfides, Organic sulfur compounds such as dialkyl sulfenes; surface modifiers (organic ligands) for higher fatty acids and alcohols. [0089] The above-mentioned quantum dots (B) can be used in combination of two or more types, and can be used in combination with core- (multi-layer) shell-type quantum dots (B) and homogeneous structure-type quantum dots (B). [0090] The average particle diameter of the quantum dot (B) is not particularly limited as long as it is within a range capable of functioning as a quantum dot, preferably 0.5 to 20 nm, more preferably 1.0 to 15 nm, and even more preferably 2 to 7nm. When the quantum dot (B) is a core- (multilayer) shell type, the size of the core is, for example, 0.5 to 10 nm, and preferably 2 to 5 nm. The average thickness of the shell is preferably 0.4 to 2 nm, and more preferably 0.4 to 1.4 nm. When the shell is composed of the first shell and the second shell, the average thickness of the first shell is, for example, 0.2 to 1 nm, and preferably 0.2 to 0.7. Regardless of the average thickness of the first shell, the average thickness of the second shell is, for example, 0.2 to 1 nm, and preferably 0.2 to 0.7. [0091] The quantum dot (B) having an average particle diameter within this range exhibits a quantum confinement effect, performs good functions as a quantum dot, is easy to modulate, and has stable fluorescent characteristics. The average particle diameter of the quantum dots (B) can be, for example, coated with a dispersion of the quantum dots (B) and dried on a substrate. After removing volatile components, the surface can be observed with a transmission electron microscope (TEM). To define. Generally, the average particle diameter can be defined as the number-average diameter of the equivalent circle diameter of each particle obtained by image analysis of a TEM image. [0092] The shape of the quantum dot (B) is not particularly limited. Examples of the shape of the quantum dot (B) include a spherical shape, an elliptical shape, a cylindrical shape, a polygonal column shape, a disc shape, and a polyhedron shape. Among these, a spherical shape is preferable from a viewpoint of ease of operation and availability. [0093] From the standpoint that the characteristics of the optical film or the wavelength conversion characteristics are good, the quantum dot (B) is preferably selected from the group consisting of a compound (B1) having a maximum fluorescence due to a wavelength region of 500 to 600 nm and a wavelength of 600 to 600. The 700 nm wavelength region has one or more members from the group consisting of the compound (B2) with maximum fluorescence, more preferably one or more members selected from the group consisting of the compound (B1) and the compound (B2) . [0094] The manufacturing method of the quantum dot (B) is not particularly limited. As the quantum dot (B), a quantum dot manufactured by various known methods can be used. As a method for manufacturing the quantum dot (B), for example, a method of thermally decomposing an organometallic compound in a coordinated organic solvent can be adopted. In addition, the core-shell structure type quantum dot (B) can be formed by forming a homogeneous core by reaction, and reacting the precursors of the shell in the presence of the dispersed core to form a shell. Got. Further, for example, the quantum dot (B) having the core-multilayer shell structure can be produced by a method described in WO2013 / 127662. However, various commercially available quantum dots (B) can also be used. [0095] The content of the quantum dots (B) is, for example, 0.05 to 15% by mass based on the mass of the entire silicon-containing resin composition. When the quantum dot (B) has a shell layer or is surface-modified, it is preferably 1 to 12% by mass, and more preferably 3 to 10% by mass. When the quantum dots (B) are only semiconductor nano particles (when no shell layer and / or surface modifier is present), the amount is preferably 0.07 to 3% by mass, and more preferably 0.1 to 1% by mass. By setting the content of the quantum dot (B) in the above range, a silicon-containing resin composition capable of forming a thin film having excellent characteristics or wavelength conversion characteristics as an optical film can be easily obtained. [Hardener (C)] The silicon-containing resin composition may contain a hardener (C). When the silicon-containing resin composition contains a hardener (C), an organic solvent such as N-methyl-2-pyrrolidone is difficult to dissolve, swell, and deform, and it is easy to form a silicon dioxide film having excellent organic solvent resistance. [0097] As suitable examples of the hardener (C), hydrochloric acid, sulfuric acid, nitric acid, benzenesulfonic acid, p-toluenesulfonic acid, and the like; Bronsted acid; 2-methylimidazole, 2-ethyl Imidazoles such as methyl-4-methylimidazole; 2,4,6-gins (dimethylaminomethyl) phenol, benzylmethylamine, DBU (1,8-diazabicyclo [5.4. 0] -7-undecene), DCMU (3- (3,4-dichlorophenyl) -1,1-dimethylurea) and other organic amines; phosphorus trichloride, phosphorus tribromide , Phosphorous acid, trimethyl phosphite, triethyl phosphite, tripropyl phosphite, etc. 3 (Wherein X is a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms) a phosphorus compound; oxyphosphoric trichloride, oxyphosphoric bromide, phosphoric acid, trimethyl phosphate, and triphosphate POX of ethyl ester, tripropyl phosphate, etc. 3 (In the formula, X is a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms.) A phosphorus compound; phosphorus pentoxide; H (HPO) such as polyphosphoric acid or polyphosphate. 3 ) a Phosphorus compounds represented by OH (where a is an integer of 1 or more); R of methyldichlorophosphine, ethyldichlorophosphine, methoxydichlorophosphine, etc. C0 PX 2 (Where, R C0 It is a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the hydrogen atom in the organic group may be substituted with a halogen atom. X is a phosphorus compound represented by a halogen atom, a hydroxyl group or an alkoxy group having 1 to 6 carbon atoms); dimethyl phosphite, diethyl phosphite, methylphosphonic acid, dimethylmethylphosphonate, methyl R of phosphonic acid dichloride, phenylphosphonic acid, phenylphosphonic acid dichloride, diethyl benzylphosphonic acid, etc. C0 POX 2 (Where, R C0 It is a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the hydrogen atom in the organic group may be substituted with a halogen atom. X is a phosphorus compound represented by a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms; tributylphosphine, triphenylphosphine, p- (tolyl) phosphine, and (m-tolyl) phosphine , P- (o-tolyl) phosphine, diphenylcyclohexylphosphine, tricyclohexylphosphine, p- (dimethoxyphenyl) phosphine, ethyltriphenylphosphonium bromide, benzyltriphenylphosphonium chloride , 1,4-bisdiphenylphosphinobutane and other organic phosphorus compounds; boron trifluoride, boron trichloride, boric acid, trimethyl borate, triethyl borate, tripropyl borate, tributyl borate BX, triamyl borate, trihexyl borate, tricyclopentyl borate, tricyclohexyl borate, triallyl borate, triphenyl borate, ethyl dimethyl borate, etc. 3 (Wherein X is a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms); a boron compound represented by boron oxide; 2 O 3 ); R of phenylboronic acid, diisopropoxy (meth) borane, methylboronic acid, cyclohexylboronic acid, etc. C0 BX 2 (Where, R C0 It is a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the hydrogen atom in the organic group may be substituted with a halogen atom. X is a boron compound represented by a halogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms; triphenylphosphine triphenylborane, tetraphenylphosphonium tetra-p-toluene borate, tetraphenylphosphonium Complexes of organophosphorus compounds such as tetraphenylboronic acid esters, tetraphenylphosphonium thiocyanate, tetraphenylphosphonium dicyandiamide, n-butyltriphenylphosphonium dicyandiamide; boron trifluoride, etc. Organic amine complexes of Lewis acids (as organic amines, such as piperidine); azabicycloundecene, diazabicycloundecene tosylate or diazabiundecyl Dicaprylate and the like. [0098] When the polysilane is used as the component (A), in addition to the above-mentioned hardening agent, it is preferably used alone or a hardening agent that generates an alkali component by light or heat. [0099] (Hardener for generating alkali component by heat) As the hardener for generating alkali component by heat, a compound that has been used as a hot alkali generator from the past may not be particularly limited. For example, 2-benzyl-2-dimethylamino-1- (4-morpholinylphenyl) -butane-1-one can be used as an effect agent which generates an alkali component by heat. However, 2-benzyl-2-dimethylamino-1- (4-morpholinylphenyl) -butane-1-one can also generate a base by the action of light. [0100] A compound (hereinafter also referred to as a thermal imidazole generator) that generates an imidazole compound represented by the following formula (C1) by heating is also preferably used as a hardener. (In formula (C1), R c1 , R c2 And R c3 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a phosphino group, a sulfonate group, a phosphinyl group, and a phosphino group Phosphonato) or organic). [0101] As in R c1 , R c2 And R c3 Examples of the organic group include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. The organic group may include a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched, and cyclic. Although this organic group is usually monovalent, it may be a bivalent or more organic group in the case of forming a cyclic structure. R c1 And R c2 These may be bonded to form a ring structure, and may further include a hetero atom bond. Examples of the cyclic structure include a heterocycloalkyl group, a heteroaryl group, and the like, or a condensed ring. R c1 , R c2 And R c3 The bond included in the organic group is not particularly limited as long as the effect of the present invention is not impaired, and the organic group may include a bond including a hetero atom such as an oxygen atom, a nitrogen atom, and a silicon atom. Specific examples of the bond including a hetero atom include an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, a amide bond, a urethane bond, and an imine bond (-N = C ( -R)-, -C (= NR)-: R represents a hydrogen atom or an organic group), carbonate bond, sulfonyl bond, sulfinyl bond, azo bond, and the like. As containing R c1 , R c2 And R c3 From the viewpoint of the heat resistance of an imidazole compound, an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amido bond, and aminomethyl are preferred. Ester bond, imine bond (-N = C (-R)-, -C (= NR)-: R represents hydrogen atom or monovalent organic group), carbonate bond, sulfonyl bond, sulfenyl Base key. R c1 , R c2 And R c3 When the organic group is a substituent other than a hydrocarbon group, R c1 , R c2 And R c3 It does not specifically limit as long as the effect of this invention is not impaired. As R c1 , R c2 And R c3 Specific examples include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group, an isocyanoxy group, a thiocyanate group, an isothiocyanate group, and a methyl group. Silyl, silanol, alkoxy, alkoxycarbonyl, carbamoyl, thiocarbamyl, nitro, nitroso, carboxylate, fluorenyl, fluorenyloxy, sulfinyl Acid group, sulfonate group, phosphine group, phosphinyl group, phosphinyl group, alkyl ether group, alkenyl ether group, alkylthio ether group, alkenylthio ether group, aryl ether group, aryl sulfur group Ether group and so on. The hydrogen atom contained in the substituent may be substituted by a hydrocarbon group. The hydrocarbon group included in the substituent may be any of a linear, branched, and cyclic type. R c1 , R c2 And R c3 Preferably, they are a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and a halogen atom, and more preferably a hydrogen atom. [0107] The thermal imidazole generator is not particularly limited as long as it is a compound capable of generating an imidazole compound represented by the above formula (C1) by heating. For compounds that have been conventionally incorporated in various compositions and generate amines by the action of heat (thermal base generators), the structure derived from the amines generated during heating is replaced by the formula (C1). The imidazole compound is used as a skeleton to obtain a compound used as a thermal imidazole generator. As a suitable thermal imidazole generator, a compound represented by the following formula (C2) may be mentioned, (In formula (C2), R c1 , R c2 And R c3 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonate group, a phosphine group, an phosphine group, a phosphino group, or an organic group. R c4 And R c5 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfinyl group, a sulfonate group, a sulfonate group, a phosphine group, or an phosphinyl group. , Phosphonium, phosphonium, or organic. R c6 , R c7 , R c8 , R c9 And R c10 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfinyl group, a sulfonate group, a sulfonate group, a phosphine group, or a phosphine group. , Phosphonium, phosphonium, amine, ammonium, or organic. R c6 , R c7 , R c8 , R c9 And R c10 Two or more of these may be bonded to form a ring structure, and a heteroatom bond may be included). In formula (C2), R c1 , R c2 And R c3 It is the same as that which explained Formula (C1). In formula (C2), R c4 And R c5 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfinyl group, a sulfonate group, a sulfonate group, a phosphine group, or an phosphinyl group. , Phosphonium, phosphonium, or organic. [0111] As R c4 And R c5 Examples of organic groups include R c1 , R c2 And R c3 Illustrated. This organic system is related to R c1 , R c2 And R c3 In the same case, a hetero atom may be included in the organic group. The organic group may be any of linear, branched, and cyclic. [0112] Among the above, R c4 And R c5 Is preferably a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, and an aromatic group having 7 to 16 carbon atoms, respectively. Alkoxyalkyl, aralkyl having 7 to 20 carbon atoms, alkyl having 2 to 11 carbon atoms having a cyano group, alkyl having 1 to 10 carbon atoms having a hydroxyl group, and 1 to 10 carbon atoms Alkoxy group, fluorenyl group having 2 to 11 carbon atoms, alkylthio group having 1 to 10 carbon atoms, fluorenyl group having 1 to 10 carbon atoms, and ester group having 2 to 11 carbon atoms (-COOR, -OCOR: R represents a hydrocarbon group), an aryl group having 6 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms that substitutes an electron-donating group and / or an electron-withdrawing group, an Benzyl, cyano, methylthio. Better to R c4 And R c5 Both sides are hydrogen atoms, or R c4 Is methyl, R c5 Is a hydrogen atom. In formula (C2), R c6 , R c7 , R c8 , R c9 And R c10 Each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfinyl group, a sulfonate group, a sulfonate group, a phosphine group, or a phosphine group. , Phosphonium, phosphonium, amine, ammonium, or organic. [0114] As in R c6 , R c7 , R c8 , R c9 And R c10 The organic group can be listed in R c1 , R c2 And R c3 Illustrated. This organic system is related to R c1 And R c2 In the same case, a bond or a substituent other than a hydrocarbon group such as a hetero atom may be included in the organic group. The organic group may be any of linear, branched, and cyclic. R c6 , R c7 , R c8 , R c9 And R c10 Two or more of these may be bonded to form a ring structure, and a heteroatom bond may be included. Examples of the cyclic structure include a heterocycloalkyl group, a heteroaryl group, and the like, or a condensed ring. For example, R c6 , R c7 , R c8 , R c9 And R c10 Two or more of them can be bonded, and a total of R is bonded c6 , R c7 , R c8 , R c9 And R c10 Atom of benzene ring to form condensed ring of naphthalene, anthracene, phenanthrene, indene, etc. [0116] Among the above, R c6 , R c7 , R c8 , R c9 And R c10 Is preferably a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, and an aromatic group having 7 to 16 carbon atoms, respectively. Alkoxyalkyl, aralkyl having 7 to 20 carbon atoms, alkyl having 2 to 11 carbon atoms having a cyano group, alkyl having 1 to 10 carbon atoms having a hydroxyl group, and 1 to 10 carbon atoms Alkoxy group, fluorenyl group having 2 to 11 carbon atoms, alkylthio group having 1 to 10 carbon atoms, fluorenyl group having 1 to 10 carbon atoms, ester group having 2 to 11 carbon atoms, carbon number 6 to 20 aryl groups, 6 to 20 carbon atoms substituted electron donor groups and / or electron withdrawing groups, benzyl, cyano, methylthio, nitrate substituted electron donor groups and / or electron withdrawing groups base. And R is c6 , R c7 , R c8 , R c9 And R c10 , Can be bonded to more than 2 of them, a total of R c6 , R c7 , R c8 , R c9 And R c10 It is also preferred that the atom of the benzene ring forms a condensed ring of naphthalene, anthracene, phenanthrene, indene, and the like. [0118] Among the compounds represented by the above formula (C2), preferred are compounds represented by the following formula (C3), (In formula (C3), R c1 , R c2 And R c3 Is synonymous with formulae (C1) and (C2). R c4 ~ R c9 Department is synonymous with formula (C2). R c11 Represents a hydrogen atom or an organic group. R c6 And R c7 Does not become hydroxyl. R c6 , R c7 , R c8 And R c9 Two or more of these may be bonded to form a ring structure, and a heteroatom bond may be included). The compound represented by formula (C3) has a substituent -OR c11 Therefore, it has excellent solubility in organic solvents. In formula (C3), R c11 It is a hydrogen atom or an organic group. R c11 When it is an organic group, examples of the organic group include R c1 , R c2 And R c3 Illustrated. The organic group may include a hetero atom in the organic group. The organic group may be any of linear, branched, and cyclic. As R c11 , Preferably a hydrogen atom, an alkyl group or alkoxyalkyl group having 1 to 12 carbon atoms, more preferably a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, or an i-butyl group Group, t-butyl, methoxymethyl, ethoxymethyl, methoxyethyl, ethoxyethyl, propoxymethyl, butoxymethyl. [0121] Specific examples of compounds particularly suitable as a thermal imidazole generator are shown below. (Oxime ester compound) The oxime ester compound is decomposed by the action of light to generate a base. Examples of suitable oxime ester compounds include compounds represented by the following formula (C4). [0123] In the above formula (C4), R c12 It represents an alkyl group having 1 to 10 carbon atoms, a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent. m1 is 0 or 1. R c13 The alkyl group having 1 to 10 carbon atoms which may have a substituent, a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent. R c14 A hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group which may have a substituent. R c12 When it is an alkyl group having 1 to 10 carbon atoms, the alkyl group may be a straight chain or a branched chain. In this case, the number of carbon atoms of the alkyl group is preferably 1 to 8, more preferably 1 to 5. R c12 When it is a phenyl group which may have a substituent, the kind of substituent is not specifically limited in the range which does not inhibit the objective of this invention. Suitable examples of the substituent which may have a phenyl group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, a saturated aliphatic fluorenyloxy group, A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzamyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, may A phenylalkyl group having a substituent, a naphthyl group having a substituent, a naphthyloxy group having a substituent, a naphthylmethyl group having a substituent, a naphthyloxycarbonyl group having a substituent, and a substituent Naphthylmethyloxy, naphthylalkyl which may have a substituent, heterocyclic group which may have a substituent, amine group, amine group substituted with 1 or 2 organic group, morpholin-1-yl and piperazine Azine-1-yl, halogen, nitro and cyano. R c12 The phenyl group may have a substituent. When the phenyl group has a plurality of substituents, the plurality of substituents may be the same or different. [0126] When the substituent of the phenyl group is an alkyl group, the number of carbon atoms is preferably 1 to 20, more preferably 1 to 10, even more preferably 1 to 6, particularly preferably 1 to 3, and most preferably Is 1. The alkyl group may be a straight chain or a branched chain. Specific examples when the substituent of the phenyl group is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl , N-pentyl, isopentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n -Nonyl, isononyl, n-decyl and isodecyl, etc. The alkyl group may include an ether bond (-O-) in the carbon chain. In this case, examples of the substituent possessed by the phenyl group include an alkoxyalkyl group and an alkoxyalkoxyalkyl group. When the substituent of the phenyl group is an alkoxyalkyl group, it is preferably -R c15 -OR c16 The base of representation. R c15 The alkyl group having 1 to 10 carbon atoms may be a linear or branched alkylene group. R c16 The alkyl group having 1 to 10 carbon atoms may be a linear or branched alkyl group. R c15 The number of carbon atoms is preferably 1 to 8, more preferably 1 to 5, and particularly preferably 1 to 3. R c16 The number of carbon atoms is preferably 1 to 8, more preferably 1 to 5, particularly preferably 1 to 3, and most preferably 1. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl and methoxypropyl. When the substituent of the phenyl group is an alkoxy group, the number of carbon atoms is preferably 1 to 20, and more preferably 1 to 6. The alkoxy group may be a straight chain or a branched chain. Specific examples when the substituent of the phenyl group is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, and an isobutyl group. Oxy, sec-butyloxy, tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, isooctyloxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isononyloxy, n-decyl Ethoxy and isodecyloxy. The alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, 2-methoxy-1-methylethoxy, and methoxyethoxy Ethoxy, ethoxyethoxyethoxy, propyloxyethoxyethoxy, and methoxypropyloxy. When the substituent of the phenyl group is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms thereof is preferably 3 to 10, and more preferably 3 to 6. Specific examples in the case where the substituent of the phenyl group is a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. Specific examples when the phenyl group has a cycloalkoxy group include cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclo Octyloxy and the like. When the substituent of the phenyl group is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, the number of carbon atoms is preferably 2 to 20, and more preferably 2 to 7. Specific examples when the substituent of the phenyl group is a saturated aliphatic fluorenyl group include ethyl fluorenyl, propionyl, n-butylfluorenyl, 2-methylpropylfluorenyl, n-pentanyl, 2,2 -Dimethylpropanyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl Group, n-tridecylfluorenyl, n-tetradecanylfluorenyl, n-pentadecanylfluorenyl, n-hexadecylfluorenyl and the like. Specific examples when the substituent of the phenyl group is a saturated aliphatic fluorenyloxy group include ethynyloxy, propionyloxy, n-butylfluorenyloxy, and 2-methylpropylfluorenyloxy. , N-pentamyloxy, 2,2-dimethylpropanyloxy, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy , N-decylfluorenyloxy, n-undecylfluorenyloxy, n-dodecylfluorenyloxy, n-tridecylfluorenyloxy, n-tetradecanylfluorenyloxy, n-pentadecanyloxy and n-hexadecylfluorenyloxy. [0130] When the substituent of the phenyl group is an alkoxycarbonyl group, the number of carbon atoms is preferably 2 to 20, and more preferably 2 to 7. Specific examples when the substituent of the phenyl group is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, and an n-butyloxy group. Carbonyl, isobutyloxycarbonyl, sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert -Pentyloxycarbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxy Carbonyl, n-nonyloxycarbonyl, isononyloxycarbonyl, n-decyloxycarbonyl, isodecyloxycarbonyl, and the like. [0131] When the substituent of the phenyl group is a phenylalkyl group, the number of carbon atoms is preferably 7 to 20, and more preferably 7 to 10. When the substituent of the phenyl group is a naphthylalkyl group, the number of carbon atoms is preferably 11 to 20, and more preferably 11 to 14. Specific examples when the phenyl group has a phenylalkyl substituent include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. Specific examples when the substituent of the phenyl group is a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β- Naphthyl) ethyl. When the phenyl group has a phenylalkyl or naphthylalkyl substituent, the substituent may further have a substituent on the phenyl or naphthyl group. When the substituent of the phenyl group is a heterocyclic group, the heterocyclic group is a 5- or 6-membered monocyclic ring containing one or more N, S, and O, or the monocyclic rings are condensed with each other or the monocyclic ring and Heterocyclyl of benzene ring. When the heterocyclic group is a condensed ring, the number of rings is up to three. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, and pyridine Azine, benzofuran, benzothiophene, indole, isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, iso Quinoline, quinazoline, phthalazine, perylene and quinoxaline. When the substituent of the phenyl group is a heterocyclic group, the heterocyclic group may further have a substituent. [0133] When a substituent of a phenyl group is an amine group substituted with an organic group of 1 or 2, suitable examples of the organic group include an alkyl group having 1 to 20 carbon atoms and an alkyl group having 3 to 10 carbon atoms Cycloalkyl, saturated aliphatic fluorenyl having 2 to 20 carbon atoms, saturated aliphatic fluorenyloxy having 2 to 20 carbon atoms, phenyl which may have a substituent, benzamidine which may have a substituent, A phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, and a naphthylalkane which may have 11 to 20 carbon atoms in which a substituent may be substituted And heterocyclic groups. As specific examples of such suitable organic groups, the same substituents as those mentioned above can be mentioned as the substituents of the phenyl group. Specific examples of the amino group substituted with an organic group of 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, Isopropylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n -Nonylamino, n-decylamino, phenylamino, naphthylamine, ethylamido, propionamido, n-butylamido, n-pentamylamino, n -Hexylamino, n-heptanylamino, n-octylamino, n-decylamino, benzylamino, α-naphthylamino, β-naphthylamino Aminoamino and N-ethenyl-N-ethenyloxyamino. [0134] The phenyl, naphthyl, and heterocyclic group included as the substituent included in the phenyl group is a substituent when the substituent further has a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms and 1 to 6 carbon atoms. 6 alkoxy group, saturated aliphatic fluorenyl group with 2 to 7 carbon atoms, alkoxycarbonyl group with 2 to 7 carbon atoms, saturated aliphatic fluorenyloxy group with 2 to 7 carbon atoms, having carbon number Monoalkylamino groups of 1 to 6 alkyl groups, dialkylamino groups of alkyl groups having 1 to 6 carbon atoms, morpholin-1-yl, piperazin-1-yl, halogen, nitro, and cyanide Base etc. When a phenyl group, a naphthyl group, and a heterocyclic group included in the substituent group of the phenyl group further have a substituent group, the number of the substituent groups is within a range that does not hinder the object of the present invention. Although not limited, it is preferably 1 ~ 4. When a phenyl group, a naphthyl group, and a heterocyclic group included in a substituent of a phenyl group have a plurality of substituents, the plurality of substituents may be the same or different. [0135] Above, although R c12 The substituent in the case of a phenyl group which may have a substituent is explained, but among these substituents, an alkyl group or an alkoxyalkyl group is preferred. R c12 When it is a phenyl group which may have a substituent, the number of substituents and the bonding position with a substituent are not specifically limited in the range which does not inhibit the objective of this invention. R c12 When it is a phenyl group which may have a substituent, it is preferable that the phenyl group which may have a substituent is o-tolyl group which may have a substituent from the point which is excellent in the generation efficiency of a base. R c12 When it is a carbazolyl group which may have a substituent, the kind of a substituent is not specifically limited in the range which does not inhibit the objective of this invention. Examples of the carbazolyl group as a suitable substituent which may have a carbon atom include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and a ring having 3 to 10 carbon atoms. Alkyl, cycloalkoxy having 3 to 10 carbon atoms, saturated aliphatic fluorenyl having 2 to 20 carbon atoms, alkoxycarbonyl having 2 to 20 carbon atoms, and saturated aliphatic having 2 to 20 carbon atoms Fluorenyloxy, phenyl which may have a substituent, phenoxy which may have a substituent, phenylthio which may have a substituent, phenylcarbonyl which may have a substituent, benzamyl which may have a substituent, A phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms, a naphthyl group which may have a substituent, may have a substituent Naphthyloxy group of naphthyl group, naphthylcarbonyl group which may have substituent, naphthylmethyl group which may have substituent, naphthyloxycarbonyl group which may have substituent, naphthylmethyloxy group which may have substituent, may have substituent A naphthylalkyl group having 11 to 20 carbon atoms, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, Amine group, amine group substituted with 1 or 2 organic group, morpholin-1-yl and piperazin-1-yl, halogen, nitro, cyano and the like. R c12 In the case of a carbazolyl group which may have a substituent, examples of the carbazolyl group as a suitable substituent which may have a nitrogen atom include an alkyl group having 1 to 20 carbon atoms and a ring having 3 to 10 carbon atoms. Alkyl group, saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, alkoxycarbonyl group having 2 to 20 carbon atoms, phenyl group which may have a substituent, benzamidine group which may have a substituent, may have a substituent A phenoxycarbonyl group, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent , A naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. Specific examples of the substituent which may have a carbazolyl group include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, alkoxycarbonyl, and saturated aliphatic fluorenyloxy Group, a phenylalkyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, and an amine group substituted with an organic group of 1 or 2 c12 In the case of a phenyl group which may have a substituent, examples of the substituent of the phenyl group are the same. As in R c12 The phenyl, naphthyl, and heterocyclic groups included in the substituents of the carbazolyl group are examples of the substituents when they further have a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms; Alkoxy group of 6; saturated aliphatic fluorenyl group with 2 to 7 carbon atoms; alkoxycarbonyl group with 2 to 7 carbon atoms; saturated aliphatic fluorenyloxy group with 2 to 7 carbon atoms; phenyl; naphthalene A group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, and a phenyl group; Substituted benzamidine groups; monoalkylamine groups having alkyl groups having 1 to 6 carbon atoms; dialkylamino groups having alkyl groups having 1 to 6 carbon atoms; morpholin-1-yl; piperidine Azin-1-yl; halogen; nitro; cyano. When the phenyl, naphthyl, and heterocyclic group included in the substituent of the carbazolyl group further has a substituent, the number of the substituents is within a range that does not hinder the object of the present invention. Although not limited, it is preferably 1 to 4. When a phenyl group, a naphthyl group and a heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R c13 It is a C1-C10 alkyl group which may have a substituent, a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent. R c13 When it is an alkyl group having 1 to 10 carbon atoms which may have a substituent, the alkyl group may be a straight chain or a branched chain. In this case, the number of carbon atoms of the alkyl group is preferably 1 to 8, more preferably 1 to 5. In R c13 The substitution of the alkyl group, the phenyl group, or the carbazolyl group is not particularly limited as long as it does not hinder the object of the present invention. Examples of suitable substituents that an alkyl group may have on a carbon atom include alkoxy groups having 1 to 20 carbon atoms, cycloalkyl groups having 3 to 10 carbon atoms, and cycloalkoxy groups having 3 to 10 carbon atoms. Group, saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, alkoxycarbonyl group having 2 to 20 carbon atoms, saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, phenyl group which may have a substituent, A phenoxy group which may have a substituent, a phenylthio group which may have a substituent, a benzamidine group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylmethyl group which may have a substituent, and a naphthalene which may have a substituent An oxycarbonyl group, a naphthylmethyloxy group which may have a substituent, a naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclic group which may have a substituent, and a heterocyclic group which may have a substituent Carbonyl, amine, amine substituted with 1 or 2 organic groups, morpholin-1-yl and piperazin-1-yl, halogen, nitro and cyano. Examples of suitable substituents which a phenyl group and a carbazole group may have based on a carbon atom, and suitable substituents which an alkyl group may have on a carbon atom include, in addition to the above-exemplified groups, 1 to 2 carbon atoms. 20 alkyl. [0144] Specific examples of the substituent which may have an alkyl group, a phenyl group, or a carbazolyl group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, Saturated aliphatic fluorenyloxy, phenylalkyl which may have a substituent, naphthylalkyl which may have a substituent, heterocyclic group which may have a substituent, and amine group substituted with an organic group of 1 or 2, With R c12 Examples of the substituent which the phenyl group has when it is a phenyl group which may have a substituent are the same. [0145] As in R c13 Examples of the substituent when the phenyl, naphthyl, and heterocyclic group included in the substituent included in the alkyl group, phenyl group, or carbazolyl group further have a substituent include an alkyl group having 1 to 6 carbon atoms ; Alkoxy group having 1 to 6 carbon atoms; Saturated aliphatic fluorenyl group having 2 to 7 carbon atoms; Alkoxycarbonyl group having 2 to 7 carbon atoms; Saturated aliphatic fluorenyl group oxygen having 2 to 7 carbon atoms Phenyl group; naphthyl group; benzamyl group; naphthylmethyl group; selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, and phenyl group A benzamidine group substituted by a group in the group; a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms; a dialkylamino group having an alkyl group having 1 to 6 carbon atoms; morpholine -1-yl; piperazin-1-yl; halogen; nitro; cyano. When the phenyl, naphthyl, and heterocyclic group included in the substituent of the alkyl group or the phenyl group further has a substituent, the number of the substituents is within a range that does not hinder the object of the present invention. Although not limited, it is preferably 1 to 4. When a phenyl group, a naphthyl group and a heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. From the viewpoint of the base generation efficiency of the compound represented by the formula (C4), R is c13 , Preferably a base represented by the following formula (C5) and A base represented by the following formula (C6), . In formula (C5), R c17 And R c18 Each is a monovalent organic group, and m2 is 0 or 1. In formula (C6), R c19 A group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, A is S or O, and m3 is an integer of 0 to 4. R in formula (C5) c17 To the extent that the object of the present invention is not hindered, it may be selected from various organic groups. As R c17 Suitable examples include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic fluorenyl group having 2 to 20 carbon atoms, and an alkoxy group having 2 to 20 carbon atoms. Carbonyl, phenyl which may have a substituent, benzamidine which may have a substituent, phenoxycarbonyl which may have a substituent, phenylalkyl having 7 to 20 carbon atoms which may have a substituent, may have Naphthyl group as a substituent, naphthylmethyl group which may have a substituent, naphthyloxycarbonyl group which may have a substituent, naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, heterocyclic ring which may have a substituent And a heterocyclic carbonyl group which may have a substituent. R c17 Among these, an alkyl group having 1 to 20 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an ethyl group is particularly preferred. R in formula (C5) c18 The range which does not inhibit the objective of this invention is not specifically limited, It can select from various organic groups. As suitable as R c18 Specific examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R c18 Among these groups, a phenyl group which may have a substituent and a naphthyl group which may have a substituent are more preferred, and a 2-methylphenyl group and a naphthyl group are particularly preferred. [0151] As R c17 Or R c18 The included phenyl, naphthyl, and heterocyclic groups are substituents when further having a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and 2 to 6 carbon atoms 7 saturated aliphatic fluorenyl groups, alkoxycarbonyl groups with 2 to 7 carbon atoms, saturated aliphatic fluorenyloxy groups with 2 to 7 carbon atoms, monoalkylamines having alkyl groups with 1 to 6 carbon atoms Group, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl, piperazin-1-yl, halogen, nitro, cyano, and the like. R c17 Or R c18 When the phenyl group, naphthyl group and heterocyclic group included further have a substituent, the number of the substituents is within a range that does not hinder the object of the present invention, and although not limited, it is preferably 1 to 4. R c17 Or R c18 When the included phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R in formula (C6) c19 When organic, R c19 To the extent that the object of the present invention is not hindered, it may be selected from various organic groups. As in formula (C6), R c19 Suitable examples when it is an organic group include an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; a saturated aliphatic fluorenyl group having 2 to 7 carbon atoms; and 2 to carbon atoms Alkoxycarbonyl group of 7; saturated aliphatic fluorenyloxy group having 2 to 7 carbon atoms; phenyl; naphthyl; benzamyl; naphthylmethyl; selected from alkyl groups having 1 to 6 carbon atoms; Benzamidine substituted by a group in the group consisting of morpholin-1-yl, piperazin-1-yl, and phenyl; a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms; having Dialkylamino groups of alkyl groups having 1 to 6 carbon atoms; morpholin-1-yl; piperazin-1-yl; halogen; nitro; cyano; 2-methylphenylcarbonyl; Azin-1-yl) phenylcarbonyl; 4- (phenyl) phenylcarbonyl. [0153] R c19 Among them, a benzamidine group is preferred; a naphthylmethyl group is selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, and a phenyl group. A benzamidine group substituted with a phenyl group; a nitro group, more preferably a benzamidine group; a naphthylmethyl amidino group; a 2-methylphenylcarbonyl group; a 4- (piperazin-1-yl) phenylcarbonyl group; 4 -(Phenyl) phenylcarbonyl. In formula (C6), m3 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. When m3 is 1, R c19 Position of the bond, preferably relative to R c19 The bond between the bonded phenyl and sulfur atoms is para. R c14 It is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group which may have a substituent. When it is a phenyl group which may have a substituent, the substituent group which may have a phenyl group and R c12 The same applies to a phenyl group which may have a substituent. As R c14 , Preferably methyl, ethyl or phenyl, more preferably methyl or phenyl. When the oxime ester compound m1 represented by the formula (C4) is 0, it can be synthesized, for example, by the method described below. First, change R c13 -CO-R c12 The ketone compound shown is oxidized with hydroxylamine to obtain R c13 -(C = N-OH) -R c12 Represents an oxime compound. Next, pass the obtained oxime compound through R c14 -CO-Hal (Hal represents halogen) acid halide or (R c14 CO) 2 An acid anhydride represented by O is amidated to obtain an oxime ester compound represented by the above formula (C4) where m1 is 0. When the oxime ester compound m1 represented by the formula (C4) is 1, it can be synthesized, for example, by the method described below. First, change R c13 -CO-CH 2 -R c12 The ketone compound indicated is reacted with nitrite in the presence of hydrochloric acid to obtain R c13 -CO- (C = N-OH) -R c12 Represents an oxime compound. Next, pass the obtained oxime compound through R c14 -CO-Hal (Hal represents halogen) acid halide or (R c14 CO) 2 An acid anhydride represented by O is amidated to obtain an oxime ester compound represented by the above formula (C4) where m1 is 1. Examples of the compound represented by the formula (C4) include compounds represented by the following formula (C7). [0159] In the above formula (C7), m1 and R c13 This is as described above. R c20 Is a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group, and a cyano group, m4 is an integer of 0 to 4, and R c21 It is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. [0160] In the above formula (C7), R c20 The range which does not inhibit the objective of this invention is not specifically limited, When it is an organic group, it can select from various organic groups suitably. As R c20 Suitable examples include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, alkoxycarbonyl, saturated aliphatic fluorenyloxy, phenyl which may have a substituent, A phenoxy group which may have a substituent, a benzamidine group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzamyloxy group which may have a substituent, and a phenylalkyl group which may have a substituent , Naphthyl which may have a substituent, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthylmethyloxy which may have a substituent, A naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, an amine group, an amine group substituted with an organic group of 1 or 2, morpholin-1-yl, piperazin-1-yl, halogen, Nitro and cyano. When m4 is an integer from 2 to 4, R c20 It can be the same or different. The number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent further having a substituent. R c20 In the case of an alkyl group, 1 to 20 carbon atoms are preferred, and 1 to 6 carbon atoms are more preferred. Again, R c20 When it is an alkyl group, it may be linear or branched. As R c20 Specific examples when it is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, iso Pentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isononyl, n-decyl and isodecyl. Again, R c20 When it is an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl and methoxypropyl. R c20 When it is an alkoxy group, it is preferably 1 to 20 carbon atoms, and more preferably 1 to 6 carbon atoms. Again, R c20 When it is an alkoxy group, it may be linear or branched. As R c20 Specific examples when it is an alkoxy group include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, and sec-butyloxy Group, tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy, n -Octyloxy, isooctyloxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isononyloxy, n-decyloxy and isodecyloxy Base etc. Again, R c20 When it is an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, and ethoxyethoxyethoxy , Propyloxyethoxyethoxy and methoxypropyloxy. R c20 It is a cycloalkyl group or a cycloalkoxy group, preferably 3 to 10 carbon atoms, and more preferably 3 to 6 carbon atoms. As R c20 Specific examples when it is a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c20 Specific examples when it is a cycloalkoxy group include cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, cyclooctyloxy, and the like. R c20 When it is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, it is preferably 2 to 20 carbon atoms, and more preferably 2 to 7 carbon atoms. As R c20 Specific examples when it is a saturated aliphatic fluorenyl group include ethenyl, propionyl, n-butyridyl, 2-methylpropionyl, n-pentyl, 2,2-dimethylpropionyl, n-hexyl, n-heptanyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl , N-tetradecanyl, n-pentadecanyl, and n-hexadecylfluorenyl. As R c20 Specific examples when it is a saturated aliphatic fluorenyloxy group include ethenyloxy, propionyloxy, n-butylfluorenyloxy, 2-methylpropanyloxy, and n-pentamyloxy , 2,2-dimethylpropanyloxy, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy , N-undecylfluorenyloxy, n-dodecylfluorenyloxy, n-tridecylfluorenyloxy, n-tetradecanylfluorenyloxy, n-pentadecanyloxy And n-hexadecylfluorenyloxy. R c20 When it is an alkoxycarbonyl group, it is preferably 2 to 20 carbon atoms, and more preferably 2 to 7 carbon atoms. As R c20 Specific examples when it is an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, n-butyloxycarbonyl, and isobutyloxy Carbonyl, sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxycarbonyl, n -Hexyloxycarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n-nonyloxy Carbonyl, isononyloxycarbonyl, n-decyloxycarbonyl and isodecyloxycarbonyl. R c20 When it is a phenylalkyl group, it is preferably 7 to 20 carbon atoms, and more preferably 7 to 10 carbon atoms. R c20 When it is a naphthylalkyl group, it is preferably 11 to 20 carbon atoms, and more preferably 11 to 14 carbon atoms. As R c20 Specific examples in the case of phenylalkyl include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c20 Specific examples when it is a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl. R c20 When phenylalkyl or naphthylalkyl, R c20 It may further have a substituent on a phenyl group or a naphthyl group. R c20 When it is a heterocyclic group, the heterocyclic group is a 5- or 6-membered monocyclic ring containing one or more N, S, and O, or a heterocyclic group in which the monocyclic rings are condensed with each other or the monocyclic ring and the benzene ring. When the heterocyclic group is a condensed ring, the number of rings is up to three. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, and pyridine Azine, benzofuran, benzothiophene, indole, isoindole, indazine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, Quinazoline, phthalazine, perylene and quinoxaline. R c20 When it is a heterocyclic group, the heterocyclic group may further have a substituent. R c20 When the amine group is substituted with an organic group of 1 or 2, suitable examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and 2 to 20 carbon atoms. Saturated aliphatic fluorenyl group, phenyl group which may have a substituent, benzamidine group which may have a substituent, phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, naphthyl group which may have a substituent, A naphthylmethyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a carbon atom having 11 to 20, a heterocyclic group, and the like. Specific examples of these suitable organic groups are c20 the same. Specific examples of the amino group substituted with an organic group of 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, Isopropylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n -Nonylamino, n-decylamino, phenylamino, naphthylamine, ethylamido, propionamido, n-butylamido, n-pentamylamino, n -Hexylamino, n-heptanylamino, n-octylamino, n-decylamino, benzylamino, α-naphthylamino and β-naphthylmethyl Amino group and so on. R c20 The included phenyl, naphthyl, and heterocyclic groups are substituents when further having a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and 2 to 6 carbon atoms 7 saturated aliphatic fluorenyl groups, alkoxycarbonyl groups with 2 to 7 carbon atoms, saturated aliphatic fluorenyloxy groups with 2 to 7 carbon atoms, monoalkylamines having alkyl groups with 1 to 6 carbon atoms Group, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl, piperazin-1-yl, halogen, nitro, cyano, and the like. R c20 When the phenyl group, naphthyl group and heterocyclic group included further have a substituent, the number of the substituents is within a range that does not hinder the object of the present invention, and although not limited, it is preferably 1 to 4. R c20 When the included phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. R c20 Among them, chemical stability or less steric hindrance makes synthesis of an oxime ester compound easier, and the like is preferably selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and carbon number. The group in the group consisting of 2 to 7 saturated aliphatic fluorenyl groups is more preferably an alkyl group having 1 to 6 carbon atoms, and particularly preferably a methyl group. R c20 The position of the bond to the phenyl group for R c20 For the phenyl group to be bonded, the position of the bonding portion of the main skeleton of the phenyl group and the oxime ester compound is set to 1 position, and when the position of the methyl group is set to 2 position, it is preferably 4 or 5 position, more preferably For 5 digits. In addition, m4 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. R in the above formula (C7) c21 It is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As R c21 Is preferably methyl or ethyl, and more preferably methyl. [0172] Specific examples of compounds particularly suitable as the oxime ester compound represented by the formula (C4) are shown below. The compound represented by the following formula (C8) is also suitably used as an oxime ester compound. (R c22 A hydrogen atom, a nitro group or a monovalent organic group, R c23 And R c24 Are a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, R c23 With R c24 Can be bonded to each other to form a ring, R c25 Is a monovalent organic group, R c26 Is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent, m6 is an integer of 0 to 4, and m5 is 0 or 1). In formula (C8), R c22 It is a hydrogen atom, a nitro group, or a monovalent organic group. R c22 It is tied to the ring in formula (C8), and-(CO) m5 -The 6-membered aromatic ring to which the indicated base is bonded is different from the 6-membered aromatic ring. In formula (C8), relative to R c22 The bonding position of the cymbal ring is not particularly limited. The compound represented by formula (C8) is a compound having one or more R c22 In this case, since the compound represented by formula (C8) is easy to synthesize, etc., it is preferably one or more R c22 One of them is bonded to the two digits in the ring. R c22 When plural, plural R c22 It can be the same or different. R c22 When organic, R c22 The range which does not inhibit the objective of this invention is not specifically limited, It can select suitably from various organic groups. As R c22 Suitable examples when it is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, a saturated aliphatic fluorenyloxy group, and may have a substituent Phenyl, phenoxy which may have a substituent, benzamidine which may have a substituent, phenoxycarbonyl which may have a substituent, benzamyloxy which may have a substituent, Phenylalkyl, naphthyl which may have a substituent, naphthyloxy which may have a substituent, naphthylmethyl group which may have a substituent, naphthyloxycarbonyl group which may have a substituent, naphthylmethane which may have a substituent An alkoxy group, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, a heterocyclylcarbonyl group which may have a substituent, an amino group substituted with an organic group of 1 or 2, morpholine-1- And piperazin-1-yl and the like. R c22 In the case of an alkyl group, the number of carbon atoms in the alkyl group is preferably 1 to 20, and more preferably 1 to 6. Again, R c22 When it is an alkyl group, it may be linear or branched. As R c22 Specific examples when it is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, iso Pentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isononyl, n-decyl and isodecyl. Again, R c22 When it is an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl and methoxypropyl. R c22 When it is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 to 20, and more preferably 1 to 6. Again, R c22 When it is an alkoxy group, it may be linear or branched. As R c22 Specific examples when it is an alkoxy group include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, and sec-butyloxy Group, tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy, n -Octyloxy, isooctyloxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isononyloxy, n-decyloxy and isodecyloxy Base etc. Again, R c22 When it is an alkoxy group, the alkoxy group may include an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy, ethoxyethoxy, methoxyethoxyethoxy, and ethoxyethoxyethoxy , Propyloxyethoxyethoxy and methoxypropyloxy. R c22 It is a cycloalkyl group or a cycloalkoxy group, and the number of carbon atoms of a cycloalkyl group or a cycloalkoxy group is preferably 3 to 10, more preferably 3 to 6. As R c22 Specific examples when it is a cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. As R c22 Specific examples when it is a cycloalkoxy group include cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, cyclooctyloxy, and the like. R c22 When it is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, the number of carbon atoms of the saturated aliphatic fluorenyl group or saturated aliphatic fluorenyloxy group is preferably 2 to 21, and more preferably 2 to 7. As R c22 Specific examples when it is a saturated aliphatic fluorenyl group include ethenyl, propionyl, n-butyridyl, 2-methylpropionyl, n-pentyl, 2,2-dimethylpropionyl, n-hexyl, n-heptanyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl , N-tetradecanyl, n-pentadecanyl, and n-hexadecylfluorenyl. As R c22 Specific examples when it is a saturated aliphatic fluorenyloxy group include ethenyloxy, propionyloxy, n-butylfluorenyloxy, 2-methylpropanyloxy, and n-pentamyloxy , 2,2-dimethylpropanyloxy, n-hexylfluorenyloxy, n-heptylfluorenyloxy, n-octylfluorenyloxy, n-nonylfluorenyloxy, n-decylfluorenyloxy , N-undecylfluorenyloxy, n-dodecylfluorenyloxy, n-tridecylfluorenyloxy, n-tetradecanylfluorenyloxy, n-pentadecanyloxy And n-hexadecylfluorenyloxy. R c22 When it is an alkoxycarbonyl group, the carbon number of the alkoxycarbonyl group is preferably 2 to 20, and more preferably 2 to 7. As R c22 Specific examples when it is an alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, n-butyloxycarbonyl, and isobutyloxy Carbonyl, sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxycarbonyl, n -Hexyloxycarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n-nonyloxy Carbonyl, isononyloxycarbonyl, n-decyloxycarbonyl and isodecyloxycarbonyl. R c22 When it is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7-20, and more preferably 7-10. Again, R c22 When it is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11-20, and more preferably 11-14. As R c22 Specific examples in the case of phenylalkyl include benzyl, 2-phenylethyl, 3-phenylpropyl, and 4-phenylbutyl. As R c22 Specific examples when it is a naphthylalkyl group include α-naphthylmethyl, β-naphthylmethyl, 2- (α-naphthyl) ethyl, and 2- (β-naphthyl) ethyl. R c22 When phenylalkyl or naphthylalkyl, R c22 It may further have a substituent on a phenyl group or a naphthyl group. R c22 When it is a heterocyclic group, the heterocyclic group is a 5- or 6-membered monocyclic ring containing one or more N, S, and O, or a heterocyclic group in which the monocyclic rings are condensed with each other or the monocyclic ring and the benzene ring. When the heterocyclic group is a condensed ring, the number of rings is up to three. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, and pyridine Azine, benzofuran, benzothiophene, indole, isoindole, indazine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, Quinazoline, phthalazine, oxoline, quinoxaline, piperidine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. R c22 When it is a heterocyclic group, the heterocyclic group may further have a substituent. R c22 When it is a heterocyclylcarbonyl group, the heterocyclyl group contained in the heterocyclylcarbonyl group and R c22 It is the same when it is a heterocyclic group. R c22 When the amine group is substituted with an organic group of 1 or 2, suitable examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and 2 to 21 carbon atoms. Saturated aliphatic fluorenyl group, phenyl group which may have a substituent, benzamidine group which may have a substituent, phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, naphthyl group which may have a substituent, A naphthylmethyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a carbon atom having 11 to 20, a heterocyclic group, and the like. Specific examples of these suitable organic groups are related to R c22 the same. Specific examples of the amino group substituted with an organic group of 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, Isopropylamino, n-butylamino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n -Nonylamino, n-decylamino, phenylamino, naphthylamine, ethylamido, propionamido, n-butylamido, n-pentamylamino, n -Hexylamino, n-heptanylamino, n-octylamino, n-decylamino, benzylamino, α-naphthylamino and β-naphthylmethyl Amino group and so on. R c22 The included phenyl, naphthyl, and heterocyclic groups are substituents when further having a substituent, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and 2 to 6 carbon atoms 7 saturated aliphatic fluorenyl groups, alkoxycarbonyl groups with 2 to 7 carbon atoms, saturated aliphatic fluorenyloxy groups with 2 to 7 carbon atoms, monoalkylamines having alkyl groups with 1 to 6 carbon atoms Group, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl, piperazin-1-yl, halogen, nitro, cyano, and the like. R c22 When the phenyl group, naphthyl group and heterocyclic group included further have a substituent, the number of the substituents is within a range that does not hinder the object of the present invention, and although not limited, it is preferably 1 to 4. R c22 When the included phenyl, naphthyl, and heterocyclic group have a plurality of substituents, the plurality of substituents may be the same or different. [0187] Among the bases described above, R is c22 , For nitro or R c27 When the base is represented by -CO-, it is preferable to increase the sensitivity. R c27 The range which does not inhibit the objective of this invention is not specifically limited, It can select from various organic groups. As suitable as R c27 Examples of the group include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R c27 Among these groups, 2-methylphenyl, thien-2-yl, and α-naphthyl are particularly preferred. Again, R c22 Also preferred is a hydrogen atom. R c22 When it is a hydrogen atom, R is preferred c25 It is a base represented by the formula (C10) mentioned later. In formula (C8), R c23 And R c24 They are a linear alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, respectively. R c23 With R c24 They may be bonded to each other to form a ring. Among these bases, as R c23 And R c24 Is preferably a linear alkyl group which may have a substituent. R c23 And R c24 When it is a linear alkyl group which may have a substituent, the linear alkyl group may be a linear alkyl group or a branched alkyl group. R c23 And R c24 In the case of a chain alkyl group having no substituent, the number of carbon atoms in the chain alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. As R c23 And R c24 Specific examples in the case of a linear alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, and n-pentyl , Isopentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-nonyl, isonon Radical, n-decyl and isodecyl. Again, R c23 And R c24 When it is an alkyl group, the alkyl group may include an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl, ethoxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, and propyloxy. Ethoxyethyl and methoxypropyl. R c23 And R c24 When it is a linear alkyl group having a substituent, the number of carbon atoms of the linear alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. In this case, the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group. The linear alkyl group having a substituent is preferably linear. The substituent which may have an alkyl group is not specifically limited in the range which does not prevent the objective of this invention. Suitable examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom, a chlorine atom, and a bromine atom are preferred. Examples of the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclic group. As a specific example of a cycloalkyl group, it is related to R c22 A suitable example when it is a cycloalkyl group is the same. Specific examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. As a specific example of a heterocyclic group, it is related to R c22 Suitable examples of the heterocyclic group are the same. R c22 When it is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 to 10, and more preferably 1 to 6. [0191] When the chain alkyl group has a substituent, the number of substituents is not particularly limited. It is preferable that the number of substituents varies depending on the number of carbon atoms of the chain alkyl group. The number of substituents is usually 1 to 20, preferably 1 to 10, and more preferably 1 to 6. R c23 And R c24 When it is a cyclic organic group, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclic group. R c23 And R c24 When it is a cyclic organic group, the substituent system which may have a cyclic organic group and R c23 And R c24 The same applies to a linear alkyl group. R c23 And R c24 In the case of an aromatic hydrocarbon group, the aromatic hydrocarbon group is preferably a phenyl group, or a group formed by bonding a plurality of benzene rings through a carbon-carbon bond, or a group formed by condensing a plurality of benzene rings. When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited, but is preferably 3 or less, more preferably 2 or less , Especially good for 1. Specific examples of preferred aromatic hydrocarbon groups include phenyl, naphthyl, biphenyl, anthracenyl, and phenanthryl. R c23 And R c24 When it is an aliphatic cyclic hydrocarbon group, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. Although the number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, it is preferably 3 to 20, and more preferably 3 to 10. Examples of the monocyclic cyclic hydrocarbon group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, norbornyl, isobornyl, tricyclononyl, and tricyclic Cyclodecyl, tetracyclododecyl and adamantyl. R c23 And R c24 When it is a heterocyclic group, the heterocyclic group is a 5- or 6-membered monocyclic ring containing one or more N, S, and O, or a heterocyclic group in which the monocyclic rings are condensed with each other or the monocyclic ring and the benzene ring. When the heterocyclic group is a condensed ring, the number of rings is up to three. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, and pyridine Azine, benzofuran, benzothiophene, indole, isoindole, indazine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, Quinazoline, phthalazine, oxoline, quinoxaline, piperidine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. R c23 With R c24 They may be bonded to each other to form a ring. By R c23 With R c24 The group formed by the formed ring is preferably a cycloalkylidene group. R c23 With R c24 When a cycloalkylidene group is bonded, the ring constituting the cycloalkylidene group is preferably a 5-membered ring to a 6-membered ring, and more preferably a 5-membered ring. R c23 With R c24 When the group formed by the bonding is a cycloalkylidene group, the cycloalkylidene group may be condensed with one or more other rings. Examples of the ring condensable with a cycloalkylidene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, and thiophene. Ring, pyrrole ring, pyridine ring, pyrazine ring, pyrimidine ring and the like. R described above c23 And R c24 Among them, as an example of a suitable basis, formula -A c1 -A c2 The base of representation. Where A c1 For straight chain alkylene, A c2 Examples thereof include an alkoxy group, a cyano group, a halogen atom, a halogenated alkyl group, a cyclic organic group, or an alkoxycarbonyl group. [0199] A c1 The number of carbon atoms of the linear alkylene group is preferably 1 to 10, and more preferably 1 to 6. A c2 When it is an alkoxy group, the alkoxy group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 to 10, and more preferably 1 to 6. A c2 When it is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are preferable, and a fluorine atom, a chlorine atom, and a bromine atom are more preferable. A c2 When it is a halogenated alkyl group, the halogen atom contained in the halogenated alkyl group is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, and more preferably a fluorine atom, a chlorine atom, or a bromine atom. The halogenated alkyl group may be linear or branched, and is preferably linear. A c2 When it is a cyclic organic group, an example of a cyclic organic group is related to R c23 And R c24 The cyclic organic groups possessed as the substituent are the same. A c2 When it is an alkoxycarbonyl group, an example of the alkoxycarbonyl group is the same as R c23 And R c24 The alkoxycarbonyl group having the same substituent is the same. R c23 And R c24 Suitable specific examples include alkyl groups such as ethyl, n-propyl, n-butyl, n-hexyl, n-heptyl, and n-octyl; 2-methoxyethyl, 3-methyl Oxy-n-propyl, 4-methoxy-n-butyl, 5-methoxy-n-pentyl, 6-methoxy-n-hexyl, 7-methoxy-n-heptyl , 8-methoxy-n-octyl, 2-ethoxyethyl, 3-ethoxy-n-propyl, 4-ethoxy-n-butyl, 5-ethoxy-n- Alkoxyalkyl groups such as amyl, 6-ethoxy-n-hexyl, 7-ethoxy-n-heptyl, and 8-ethoxy-n-octyl; 2-cyanoethyl, 3 -Cyano-n-propyl, 4-cyano-n-butyl, 5-cyano-n-pentyl, 6-cyano-n-hexyl, 7-cyano-n-heptyl, and 8- Cyanoalkyl such as cyano-n-octyl; 2-phenylethyl, 3-phenyl-n-propyl, 4-phenyl-n-butyl, 5-phenyl-n-pentyl , 6-phenyl-n-hexyl, 7-phenyl-n-heptyl, 8-phenyl-n-octyl, and the like; 2-cyclohexylethyl, 3-cyclohexyl-n- Propyl, 4-cyclohexyl-n-butyl, 5-cyclohexyl-n-pentyl, 6-cyclohexyl-n-hexyl, 7-cyclohexyl-n-heptyl, 8-cyclohexyl-n-octyl , 2-cyclopentylethyl, 3-cyclopentyl-n-propyl, 4-cyclopentyl-n-butyl, 5-cyclopentyl-n-pentyl , 6-cyclopentyl-n-hexyl, 7-cyclopentyl-n-heptyl and 8-cyclopentyl-n-octyl, etc .; cyclomethoxyalkyl, 2-methoxycarbonylethyl, 3 -Methoxycarbonyl-n-propyl, 4-methoxycarbonyl-n-butyl, 5-methoxycarbonyl-n-pentyl, 6-methoxycarbonyl-n-hexyl, 7-methoxy Carbonyl-n-heptyl, 8-methoxycarbonyl-n-octyl, 2-ethoxycarbonylethyl, 3-ethoxycarbonyl-n-propyl, 4-ethoxycarbonyl-n- Butyl, 5-ethoxycarbonyl-n-pentyl, 6-ethoxycarbonyl-n-hexyl, 7-ethoxycarbonyl-n-heptyl, 8-ethoxycarbonyl-n-octyl, etc. Alkoxycarbonylalkyl; 2-chloroethyl, 3-chloro-n-propyl, 4-chloro-n-butyl, 5-chloro-n-pentyl, 6-chloro-n-hexyl, 7 -Chloro-n-heptyl, 8-chloro-n-octyl, 2-bromoethyl, 3-bromo-n-propyl, 4-bromo-n-butyl, 5-bromo-n-pentyl, 6-bromo-n-hexyl, 7-bromo-n-heptyl, 8-bromo-n-octyl, 3,3,3-trifluoropropyl and 3,3,4,4,5,5,5 -Heptafluoro-n-pentyl and other halogenated alkyl groups. [0201] As R c23 And R c24 Among the above, suitable groups are ethyl, n-propyl, n-butyl, n-pentyl, 2-methoxyethyl, 2-cyanoethyl, 2-phenylethyl, 2- Cyclohexylethyl, 2-methoxycarbonylethyl, 2-chloroethyl, 2-bromoethyl, 3,3,3-trifluoropropyl and 3,3,4,4,5,5,5 -Heptafluoro-n-pentyl. [0202] As R c25 Examples of suitable organic groups, with R c22 Similarly, examples thereof include alkyl, alkoxy, cycloalkyl, cycloalkoxy, saturated aliphatic fluorenyl, alkoxycarbonyl, saturated aliphatic fluorenyloxy, phenyl which may have a substituent, and may have a substituent Phenoxy, optionally benzamidine, substituents, phenoxycarbonyl, substituents, benzamyloxy, phenylalkyl, optionally, Substituted naphthyl, naphthyloxy which may have a substituent, naphthylmethyl which may have a substituent, naphthyloxycarbonyl which may have a substituent, naphthylmethyloxy which may have a substituent, may have a substituent Naphthylalkyl, heterocyclic group which may have substituents, heterocyclic carbonyl group which may have substituent, amine group substituted with 1 or 2 organic group, morpholin-1-yl and piperazine-1- Base etc. The specific examples of these bases are related to R c22 The explanations are the same. Again, as R c25 Cycloalkylalkyl, phenoxyalkyl which may have a substituent on the aromatic ring, and phenylthioalkyl which may have a substituent on the aromatic ring are also preferred. Substituents which may have phenoxyalkyl and phenylthioalkyl groups and which may have R c22 The substituted phenyl groups are the same. [0203] Among the organic groups, R c25 Is preferably an alkyl group, a cycloalkyl group, a phenyl group or a cycloalkylalkyl group which may have a substituent, and a phenylthioalkyl group which may have a substituent on the aromatic ring. The alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group. Among the phenyl groups which may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 to 10, more preferably 5 to 8, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 to 8, more preferably 1 to 4, and particularly preferably 2. Among the cycloalkylalkyl groups, cyclopentylethyl is preferred. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 to 8, more preferably 1 to 4, and particularly preferably 2. Among the phenylthioalkyl groups which may have a substituent on the aromatic ring, 2- (4-chlorophenylthio) ethyl is preferred. And R is c25 , -A c3 -CO-OA c4 The base of representation is also good. A c3 It is a divalent organic group, preferably a divalent hydrocarbon group, and more preferably an alkylene group. A c4 It is a monovalent organic group, and a monovalent hydrocarbon group is preferable. [0205] A c3 For alkylene, alkylene may be linear or branched, and is preferably linear. A c3 As the alkylene group, the number of carbon atoms of the alkylene group is preferably 1 to 10, more preferably 1 to 6, and particularly preferably 1 to 4. [0206] As A c4 Suitable examples include an alkyl group having 1 to 10 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. As A c4 Suitable specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, and n-hexyl , Phenyl, naphthyl, benzyl, phenethyl, α-naphthylmethyl and β-naphthylmethyl. As -A c3 -CO-OA c4 Specific examples of suitable groups include 2-methoxycarbonylethyl, 2-ethoxycarbonylethyl, 2-n-propyloxycarbonylethyl, and 2-n-butyloxycarbonyl. Ethyl, 2-n-pentyloxycarbonylethyl, 2-n-hexyloxycarbonylethyl, 2-benzyloxycarbonylethyl, 2-phenoxycarbonylethyl, 3-methoxy Carbonyl-n-propyl, 3-ethoxycarbonyl-n-propyl, 3-n-propyloxycarbonyl-n-propyl, 3-n-butyloxycarbonyl-n-propyl, 3 -n-pentyloxycarbonyl-n-propyl, 3-n-hexyloxycarbonyl-n-propyl, 3-benzyloxycarbonyl-n-propyl, and 3-phenoxycarbonyl-n- Propyl and so on. [0208] Above, although R c25 Description, but as R c25 Is preferably a group represented by the following formula (C9) or (C10). (In formulae (C9) and (C10), R c28 And R c29 Are organic groups, m7 is an integer of 0 to 4, R c28 And R c29 When it is adjacent to the benzene ring, R c28 With R c29 Can be bonded to each other to form a ring, m8 is an integer of 1 to 8, m9 is an integer of 1 to 5, m10 is an integer of 0 to (m9 + 3), R c30 Is organic). With respect to R in formula (C9) c28 And R c29 Examples of organic radicals are related to R c22 the same. As R c28 Is preferably an alkyl group or a phenyl group. R c28 In the case of an alkyl group, the number of carbon atoms is preferably 1 to 10, more preferably 1 to 5, particularly preferably 1 to 3, and most preferably 1. That is, the best is R c28 Is methyl. R c28 With R c29 When bonded to form a ring, the ring may be an aromatic ring or an aliphatic ring. As a base represented by formula (C9), and R c28 With R c29 Suitable examples of the ring-forming group include naphthalen-1-yl and 1,2,3,4-tetrahydronaphthalen-5-yl. In the formula (C9), m7 is an integer of 0 to 4, preferably 0 or 1, and more preferably 0. In the above formula (C10), R c30 Is organic. Examples of the organic group include those corresponding to R c22 The organic groups described are the same. Among the organic groups, an alkyl group is preferred. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3. As R c30 Preferably, methyl, ethyl, propyl, isopropyl, butyl and the like are exemplified, and among these, methyl is more preferable. [0211] In the formula (C10), m9 is an integer of 1 to 5, preferably an integer of 1 to 3, and more preferably 1 or 2. In the formula (C10), m10 is 0 to (m9 + 3), preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0. In the formula (C10), m8 is an integer of 1 to 8, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, and particularly preferably 1 or 2. In formula (C8), R c26 It is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. As R c26 The substituent which may be possessed when it is an alkyl group is preferably a phenyl group, a naphthyl group, or the like. Again, as R c26 The substituent which may be possessed when it is an aryl group is preferably an alkyl group, alkoxy group, halogen atom, etc. having 1 to 5 carbon atoms. In formula (C8), as R c26 Preferred examples are hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, phenyl, benzyl, methylphenyl, naphthyl, etc. Among these, more preferred Methyl or phenyl. The method for producing the compound represented by formula (C8) is not particularly limited, and it can be obtained by a known method. [0215] As suitable specific examples of the compound represented by the formula (C8), the following compounds 1 to 41 are mentioned. [0216] [0217] The hardener (C) in the silicone-containing resin composition may include two or more hardeners of different classifications or types. The content of the hardener (C) in the silicon-containing resin composition is generally 0.01 to 40% by mass, more preferably 0.1 to 20% by mass, and particularly preferably 1 to 10 with respect to the mass of the entire composition. quality%. [0218] [Nitro-based compound (D)] The silicon-containing resin composition may include a nitro-based compound (D). The firing temperature at the time of forming a silicon dioxide film when the silicon-containing resin composition contains a nitrate-based compound (D) is, for example, a relatively low temperature of 250 ° C or lower (for example, a range of 200 ° C or higher and 250 ° C or lower), It is also preferable to reduce the residues (impurities derived from the silicon dioxide film) in the silicon dioxide film. When there is little residue in the silicon dioxide film, even if the silicon dioxide film is placed in a high-temperature environment or a reduced-pressure environment, the decomposition of the residue from the silicon dioxide film itself or the residue in the film from the silicon dioxide film is suppressed. Gas. [0219] The nitrate-based compound (D) is not particularly limited as long as it is a compound that can stably exist as a nitrogen oxide radical (Nitroxide radical). Examples of suitable examples of the nitrate-based compound (D) include compounds containing a structure represented by the following formula (d1). In formula (d1), R d1 , R d2 , R d3 And R d4 Each is independently a hydrogen atom or an organic group having 1 to 10 carbon atoms. R d1 With R d2 They may be bonded to each other to form a ring. Again, R d3 With R d4 They may be bonded to each other to form a ring. When the silicon-containing resin composition is a nitrate-based compound (D) and contains a compound containing the structure represented by the above formula (d1), even if the firing temperature when forming a silicon dioxide film is low, the dioxide can be easily reduced. Residues in silicon films. In formula (c1), preferably R c1 , R c2 , R c3 And R c4 Each is independently an alkyl group or an alkyl group substituted with a hetero atom. As the alkyl group, a methyl group, an ethyl group, an n-propyl group, and an isopropyl group are preferable. Suitable examples of the hetero atom include a halogen atom, an oxygen atom, a sulfur atom, and a nitrogen atom. [0221] As suitable specific examples of the (D) nitrate compound, for example, di-tert-butyl nitrogen oxide, di-1,1-dimethylpropyl nitrogen oxide, and di-1, 2-dimethylpropyl oxynitride, di-2,2-dimethylpropyl oxynitride, and a compound represented by the following formula (d2), (d3), or (d4). Among them, a compound represented by the following formula (d2), (d3), or (d4) is more preferable because the residue in the silicon dioxide film can be easily reduced even when firing at a lower temperature. . [0222] In formulas (d2), (d3), and (d4), R d5 Represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a hydroxyl group, an amine group, a carboxyl group, a cyano group, an alkyl group substituted with a hetero atom, or an ether bond, an ester bond, an amidine bond, or a carbamate bond Bonded monovalent organic group. R d6 Represents a divalent or trivalent organic group. n1 and n2 are integers satisfying 1 ≦ n1 + n2 ≦ 2. n3 and n4 are integers satisfying 1 ≦ n3 + n4 ≦ 2. n5 and n6 are integers satisfying 1 ≦ n5 + n6 ≦ 2. n7 is 2 or 3. [0197] As suitable specific examples of the compound represented by the formula (d2), the following compounds can be mentioned. In the following formula, R d7 Each independently represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, an aromatic group which may have a substituent, or an alicyclic group which may have a substituent. [0225] As specific examples of suitable compounds represented by the formula (d3), the following compounds can be mentioned. [0226] As suitable specific examples of the compound represented by the formula (d4), the following compounds can be mentioned. [0227] As an even more preferred nitrate compound (D), since the residue in the silicon dioxide film can be easily reduced even if it is fired at a lower temperature, 2,2,6,6 can be cited. -Tetramethylpiperidine 1-oxyl radical (Free Radical), 4-hydroxy-2,2,6,6-tetramethylpiperidine 1-oxyl radical, 4-amine -2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) radical, 4-carboxy-2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) free Methyl, 4-cyano-2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) radical, 4-methacrylic acid-2,2,6,6-tetramethylpiperidine 1 -Oxyl radical, 4-acrylic acid-2,2,6,6-tetramethylpiperidine 1-oxyl radical, 4-oxo-2,2,6, 6-tetramethylpiperidine 1-oxyl radical, 3-carboxy-2,2,5,5-tetramethylpyrrolidine 1-oxyl radical, 4-acetamidine- 2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) radical, 4- (2-chloroacetamidamine) -2,2,6,6-tetramethylpiperidine 1-oxyl (Oxyl) radical, 4-hydroxy-2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) benzoate radical, 4-isothiocyanate-2,2, 6,6-tetramethylpiperidine 1-oxyl (Oxyl) radical, 4- (2-iodoethyl) Amine) -2,2,6,6-tetramethylpiperidine 1-oxy (Oxyl) radical and 4-methoxy-2,2,6,6-tetramethylpiperidine 1-oxy ( Oxyl) free radicals. The nitrobenzyl compound (D) may be used alone or in combination of two or more kinds. [0228] The content of the nitrate-based compound (D) of the silicon-containing resin composition may be a trace amount. Since the content of the nitric acid-based compound (D) in the silicon-containing resin composition can be easily reduced even if it is fired at a lower temperature, compared with the solvent of the silicon-containing resin composition ( The total mass of components other than S) is preferably 0.005 mass% or more, and more preferably 0.009 mass% or more. In addition, the content of the (C) nitroxyl-based compound in the silicone-containing resin composition is preferably 2% by mass or less with respect to the total mass of components other than the solvent (S) of the silicone-containing resin composition, and more preferably 1 mass% or less. [Antioxidant (E)] The silicone resin composition may include an antioxidant (E). By including an antioxidant, it is possible to suppress a decrease in light emission characteristics. The antioxidant preferably contains at least one selected from the group consisting of phosphorus-based, sulfur-based, and phenol-based antioxidants. The type of the phosphorus-based antioxidant is not particularly limited, and specifically, 3,9-bis (2,6-di-tert-butyl-4-methylphenoxy) -2,4, 8,10-Tetraoxa-3,9-Phospha spiro [5.5] undecane, diisodecyl pentaerythritol diphosphite, bis (2,4-di-t-butylbenzene Group) pentaerythritol diphosphite, 2,2'-methylenebis (4,6-di-t-butyl-1-phenyloxy) (2-ethylhexyloxy) phosphorus, 6- [ 3- (3-t-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-t-butyldibenzo (Benz) [d, f ] [1,3,2] Dioxophosphonium, triphenylphosphite, diphenylisodecylphosphite, phenyldiisodecylphosphite, 4,4'-butenyl-bis (3-methyl-6-t-butylphenyl behenyl trisoxy) phosphite, octadecyl phosphite, gins (nonylphenyl) phosphite, 9,10-dihydro- 9-oxa-10-phosphophenanthrene-10-oxide, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10- Phenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phenanthroline-10-oxide, ginseng (2,4-di-t-butylbenzene Base) phosphite, cyclic neopentane tetrayl bis (2,4-di-t-butylphenyl) phosphite , Cyclic neopentane tetrayl bis (2,6-di-t-butylphenyl) phosphite, 2,2-methylenebis (4,6-di-t-butylphenyl) octyl Methyl phosphite, ginseng (2,4-di-t-butylphenyl) phosphite, bis (2,4-di-t-butylphenyl) [1,1-biphenyl] -4 , 4'-diyl bisphosphonate, bis [2,4-bis (1,1-dimethylethyl) -6-methylphenyl] ethyl ester, and phosphonic acid. [0231] Among the phosphorus-based antioxidants, 2,2′-methylenebis (4,6-di-t-butyl-1-phenyloxy) is preferred in terms of heat resistance and prevention of heat-resistant discoloration. () Ethyl) (2-ethylhexyloxy) phosphorus, 3,9-bis (2,6-di-tert-butyl-4-methylphenoxy) -2,4,8,10-tetraoxa -3,9-Phospha spiro [5.5] undecane and 6- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propoxy] -2 , 4,8,10-tetra-t-butyldibenzo (Benz) [d, f] [1,3,2] dioxophosphonium and the like. [0232] Examples of commercially available phosphorus-based antioxidants include Irgafos 168 (manufactured by BASF), Sumilizer GP (manufactured by Sumitomo Chemical Co., Ltd.), and the like. [0233] The type of the sulfur-based antioxidant is not particularly limited, and specifically, 2,2-bis ({[3- (dodecylthio) propanyl] oxy} methyl) -1, 3-propanediyl-bis [3- (dodecylthio) propionate], 2-mercaptobenzo (Benzene) imidazole, dilauryl-3,3'-thiodipropionate, dimeat Myristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate, pentaerythritol-methyl (3-laurylthiopropionate), 2-mercaptobenzene And (Benz) imidazole and the like. [0234] Among sulfur-based antioxidants, 2,2-bis ({3- (dodecylthio) propionyl} oxy) methyl) is preferred in terms of heat resistance and prevention of heat-resistant discoloration. 1,3-propanediyl-bis [3- (dodecylthio) propionate], 2-mercaptobenzo (Benzene) imidazole, and the like. [0235] Examples of commercially available sulfur-based antioxidants include Irganox 1035 (manufactured by BASF). The type of the phenolic antioxidant is not particularly limited, and specifically, 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) Propanyloxy] -1,1-dimethylethoxy] -2,4,8,10-tetraoxaspiro [5.5] undecane, pentaerythritol [3- (3,5- Di-t-butyl-4-hydroxyphenyl) propionate], 1,3,5-trimethyl-2,4,6-ginseng (3 ', 5'-di-t-butyl-4 -Hydroxybenzyl) benzene, triethylene glycol-bis [3- (3-t-butyl-5-methyl-4-hydroxyphenyl) propionate], 4,4'-thiobis (6- t-butyl-3-methylphenol), ginseng- (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanurate, 1,3,5-ginseng (4-t -Butyl-3-hydroxy-2,6-dimethylbenzyl) -isocyanurate, 1,6-hexanediol-bis [3- (3,5-di-t-butyl- 4-hydroxyphenyl) propionate], 2,2-thio-diethylidenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], N, N'-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamonamine), 1,3,5-trimethyl-2,4,6-ginseng (3, 5-di-t-butyl-4-hydroxybenzyl) benzene, 2,4-bis [(octylthio) methyl] -O-cresol, 1,6-hexanediol-bis- [3 -(3,5-di-t-butyl-4-hydroxyphenyl) propionate], octadecyl- [3- (3,5-di-t-butyl-4-hydroxybenzene ) Propionate, 2,2'-methylenebis (4-methyl-6-t-butylphenol), 4,4'-butenyl-bis (3-methyl-6-t-butane Phenol), 1,1,3-ginseng (2-methyl-4-hydroxy-5-t-butylphenyl) butane, 1,3,5-ginseng (4-hydroxybenzyl) benzene and [Methylene-3- (3,5'-di-t-butyl-4'-hydroxyphenylpropionate)] methane and the like. [0237] Among the phenol-based antioxidants, 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methyl) is preferred in terms of heat resistance and prevention of heat-resistant discoloration. Phenyl) propanyloxy] -1,1-dimethylethoxy] -2,4,8,10-tetraoxaspirocyclo [5.5] undecane, 1,3,5-tri Methyl-2,4,6-ginseno (3 ', 5'-di-t-butyl-4-hydroxybenzyl) benzene, pentaerythritol [3- (3,5-di-t-butyl- 4-hydroxyphenyl) propionate], triethylene glycol-bis [3- (3-t-butyl-5-methyl-4-hydroxyphenyl) propionate], 4,4'-sulfur Bis (6-t-butyl-3-methylphenol), ginseng- (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanurate, 1,3,5-gin (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -isocyanurate, 1,6-hexanediol-bis [3- (3,5-di-t -Butyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylidenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate ], N, N'-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamonamine), 1,3,5-trimethyl-2,4,6- See (3,5-di-t-butyl-4-hydroxybenzyl) benzene and 2,4-bis [(octylthio) methyl] -O-cresol. [0238] Examples of commercially available phenolic antioxidants include Irganox 1010 (manufactured by BASF), ADK STAB AO-80 (manufactured by ADEKA), and the like. The content of the antioxidant in the total weight of the solid content of the silicon-containing resin composition is, for example, 0.01 to 30% by mass, preferably 0.1 to 10% by mass, more preferably 0.5 to 8% by mass, and even more preferably 1 to 5 mass%. By falling within the above range, it is possible to suppress a decrease in light emitting characteristics and to suppress a matting phenomenon in a baking (hard baking) step. When patterning is performed by a printing method or the like using a silicon-containing resin composition, peeling of the formed pattern can be suppressed. [Solvent (S)] The silicone-containing resin composition contains a solvent (S). The solvent (S) contains a cycloalkylacetate represented by the following formula (S1). The silicon-containing resin composition containing the solvent (S) containing a cycloalkyl acetate represented by the following formula (S1) together with the silicon-containing resin (A) can easily suppress the silicon-containing resin formed by using the silicon-containing resin composition. The occurrence of cracks in a resin film or a silicon dioxide film. (In formula (S1), R s1 Is an alkyl group having 1 to 3 carbon atoms, p is an integer of 1 to 6, and q is an integer of 0 to (p + 1)). [0241] Specific examples of the cycloalkyl acetate represented by the formula (S1) include cyclopropyl acetate, cyclobutyl acetate, cyclopentyl acetate, cyclohexyl acetate, and cyclohexyl acetate. Heptyl acetate and cyclooctyl acetate. Among these, cyclooctyl acetate is preferable because it is easy to obtain and it is easy to suppress the occurrence of cracks in a silicon-containing resin film or a silicon dioxide film. The solvent (S) may include a cycloalkyl acetate represented by the formula (S1) in combination of two or more kinds. The content of the cycloalkyl acetate represented by the formula (S1) in the solvent (S) is not particularly limited as long as it does not inhibit the object of the present invention. The content of the cycloalkyl acetate represented by the formula (S1) in the solvent (S) is usually 30% by mass or more, preferably 50% by mass or more, more preferably 70% by mass or more, particularly preferably 90% by mass or more may be 100% by mass. [0243] When the solvent (S) is a solvent other than the cycloalkyl acetate represented by the formula (S1), the kind of the solvent other than the cycloalkyl acetate represented by the formula (S1) does not hinder the object of the present invention. The scope is not particularly limited. Examples of solvents other than the cycloalkyl acetate represented by the formula (S1) that can include the solvent (S) include alcohols such as methanol, ethanol, propanol, and n-butanol; ethylene glycol , Diethylene glycol, propylene glycol, dipropylene glycol, and other polyols; acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isoamyl ketone, 2-heptanone, etc. Ketones; γ-butyrolactone-containing organic solvents containing lactone rings; ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, or dipropylene glycol monoacetate, etc. Ester-bonded compounds, monomethyl ethers, monoethyl ethers, monoethyl ethers, monobutyl ethers, etc. of the aforementioned polyols or compounds having the aforementioned ester bond Derivatives of polyhydric alcohols such as ether-bonded compounds; such as cyclic ethers of dioxane or methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, pyruvate Ester of ethyl ester, methyl methoxypropionate, ethyl ethoxypropionate, etc .; anisole, ethyl benzyl ether, cresol methyl ether, diphenyl ether Dibenzyl ether, phenyl ether, butylphenyl ether, ethylbenzene, diethylbenzene, pentylbenzene, cumene, toluene, xylene, isopropyl toluene (Cymene), mesitylene, etc. Aromatic organic solvents; N, N, N ', N'-tetramethylurea, N, N, 2-trimethylpropylamine, N, N-dimethylacetamide, N, N-diamine Methylformamide, N, N-diethylacetamide, N, N-diethylformamide, 1,3-dimethyl-2-imidazolidinone, N-methylpyrrolidone, Organic solvents containing nitrogen, such as N-ethylpyrrolidone. These solvents can be used in combination of two or more. The proportion of the solvent other than the cycloalkyl acetate represented by the formula (S1) in the entire solvent (S) may be appropriately set to, for example, 70% by mass or less, preferably 0.01 to 55% by mass, and more preferably 1 to 50. quality%. [0245] Among solvents other than the cycloalkyl acetate represented by the formula (S1), propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), N, N, N ′ is preferred. , N'-tetramethylurea and butanol. [0246] When a silicon-containing resin composition is used as the silicon-containing resin (A), when polysilane is contained, the point at which cracking is suppressed or a silicon dioxide film having a low dielectric constant is easily formed, the moisture of the silicon-containing resin composition The amount is preferably 1.0% by mass or less, more preferably 0.5% by mass or less, even more preferably 0.3% by mass or less, and particularly preferably less than 0.3% by mass. However, the amount of water in the solvent can be measured by Karl Fischer's method. The water of the silicon-containing resin composition is often derived from the solvent (S). Therefore, the solvent (S) is preferably dehydrated so that the moisture content of the silicon-containing resin composition becomes the above-mentioned amount. The amount of the solvent (S) used is not particularly limited as long as it does not hinder the object of the present invention. From the viewpoint of film forming properties, the solvent (S) is used so that the solid content concentration of the silicon-containing resin composition becomes preferably 1 to 50% by mass, and more preferably 10 to 40% by mass. [Other Components] In addition to the silicon-containing resin (A) and the solvent (S), the silicon-containing resin composition may contain various components added to the silicon-containing resin composition that has been used in various applications conventionally. Examples of other components include photopolymerization initiators, acid generators, alkali generators, catalysts, silane coupling agents, adhesion enhancers, dispersants, surfactants, ultraviolet absorbers, antioxidants, and defoamers. Agents, viscosity modifiers and colorants. These components are blended into the silicon-containing resin composition in the amounts usually used. [0249] <Manufacturing Method of Silicon-Containing Resin Composition> The manufacturing method of the silicon-containing resin composition is not particularly limited. In general, a silicon-containing resin composition is produced by uniformly mixing a predetermined amount of the components described above, and dissolving and dispersing the solid content in the solvent (S). In order to remove insolubles larger in size than the quantum dots (B), the silicone-containing resin composition may be filtered using a filter having a desired pore size. [0250] <Manufacturing Method of Silicon-Containing Resin Film and Silicon Dioxide Film> Hereinafter, a method for manufacturing a silicon-containing resin film using the aforementioned silicon-containing resin composition and a method for manufacturing a silicon dioxide film will be described. [Production Method of Silicon-Containing Resin Film] Examples of a method for producing a silicon-containing resin film include forming a coating film composed of the aforementioned silicon-containing resin composition, and removing the solvent (S) from the coating film. Method. [0252] The method of forming the coating film is not particularly limited. For example, a silicon resin-containing composition is applied by a method such as a spray method, a spin coating method, a roll coating method, a dipping method, or a dropping method to form a coating film on a substrate. The film thickness of the coating film is not particularly limited. In general, the film thickness of the coating film is adjusted, for example, to form a silicon-containing resin film having a film thickness of 2 μm or more, and preferably 5 μm or more. The film thickness of the coating film is adjusted to form a silicon-containing resin film having a film thickness of preferably 2 to 300 μm, more preferably 30 to 200 μm, and still more preferably 75 to 150 μm. By adjusting the solid content concentration of the silicon-containing resin composition or an additive of an arbitrary component, a thin film having a thickness of 5 μm or more and 30 μm or more can be formed. [0253] For example, when a silicon-containing resin film having a film thickness of about 2 to 300 μm is manufactured, when the solvent (S) is removed from the coating film, the film is likely to be cracked. However, the silicone-containing resin composition suppresses the occurrence of cracking when the solvent (S) is removed by including the aforementioned predetermined solvent (S). [0254] The method of removing the solvent (S) from the coating film is not particularly limited. In general, a method of heating the coating film at an appropriate temperature corresponding to the boiling point of the solvent (S), or placing the coating film under a vacuum condition may be mentioned. [0255] The silicon-containing resin film can be directly formed on various functional layers in a laminate, a light-emitting display element panel, or the like. After being formed on a substrate of any material such as a metal substrate or a glass substrate, it can be peeled from the substrate and used. [Production Method of Silicon Dioxide Film] As a method of producing a silicon dioxide film, the method includes the steps of coating the aforementioned silicon-containing resin composition on a substrate, forming a coating film, and firing process. Method of forming a coating film. When the silicon-containing resin composition contains a hardening agent which is decomposed by the action of light to generate an alkali, it is preferable to include a step of exposure. The step of exposing may be performed instead of or in conjunction with the step of firing. In addition, in the step of exposing, for example, the formed coating film may be selectively exposed, and when the selective exposure step is included, the step of developing may also be included. In addition, for example, the formed coating film can be subjected to lithography. In the case of embossing lithography, for example, the steps include: applying a silicon-containing resin composition on a substrate to form a coating film; and pressing the coating film with a module that forms an uneven structure with a predetermined pattern. Steps, and methods of exposure steps. The exposure step is performed on a coating film made of a silicon-containing resin composition in a state where the module is pressed against the coating film. After hardening by exposure, by peeling the aforementioned module, a patterned silicon dioxide film corresponding to the shape of the module can be obtained. In addition, the patterned silicon dioxide film can be formed by a printing method. Examples of the printing method include an inkjet method and a screen printing method. After the silicon-containing resin composition is arranged into a pattern by a printing method, a patterned silicon dioxide film can be obtained by performing exposure and / or heating or firing. [0257] The coating film is formed in the same manner as the method for producing a silicon-containing resin film. The film thickness of the coating film is not particularly limited. In general, the film thickness of the coating film is adjusted, for example, to form a silicon-containing resin film having a film thickness of 2 μm or more, and preferably 5 μm or more. The film thickness of the coating film is adjusted to form a silicon-containing resin film having a film thickness of preferably 2 to 300 μm, more preferably 30 to 200 μm, and still more preferably 75 to 150 μm. [0258] The material of the substrate is not particularly limited as long as it is a material capable of withstanding firing. Suitable examples of the material of the substrate include inorganic materials such as metal, silicon, and glass, or polycarbonate, polyethylene terephthalate, polyether, polyimide resin, and polyimide. Heat-resistant material such as amine resin. The thickness of the substrate is not particularly limited, and the substrate may be a film or a sheet. [0259] The substrate including the coating film was fired in the following manner. The firing method is not particularly limited, but in general, firing is performed using an electric furnace or the like. The firing temperature is usually preferably 300 ° C or higher, and more preferably 350 ° C or higher. Although the upper limit is not particularly limited, it is, for example, 1,000 ° C or lower. When the silicon-containing resin composition contains a hardener (C) and / or a nitrate compound (D), even if the lower limit of the firing temperature is lowered to 200 ° C, the residue in the silicon dioxide film can be reduced (derived from Impurities in silicon dioxide film). The firing environment is not particularly limited, and may be an inert gas environment such as a nitrogen environment or an argon environment, under vacuum, or under reduced pressure. It can be in the atmosphere, and the oxygen concentration can be appropriately controlled. [0260] The silicon dioxide film formed in this way has no cracks and contains well-dispersed quantum dots (B). [0261] Since the silicon-containing resin film and the silicon dioxide film described above include quantum dots (B) which are well dispersed, they can be suitably used as an optical film for a light-emitting display device, and can also be suitably used in a light-emitting display device. Suitable for the manufacture of laminates. [0262] <Laminate> The laminate is a laminate including one or more films selected from the group consisting of the aforementioned silicon-containing resin film and the aforementioned silicon dioxide film. The laminate may be a laminate composed of a thin film containing only quantum dots, or a laminate composed of a thin film containing quantum dots and other functional layers. [0263] [Laminates of Quantum Dot-Containing Thin Films] Examples of the laminate include a film containing quantum dots (B) dispersed in various matrix materials. Two or more layers have been laminated. A laminate of one or more films in the group consisting of a film and the aforementioned silicon dioxide film. The laminate may be a laminate in which only the aforementioned silicon-containing resin film and / or the aforementioned silicon dioxide film are laminated, or may be a laminate in which the aforementioned silicon-containing resin film and / or the aforementioned silicon dioxide film, and A laminate of a thin film containing quantum resin (B) dispersed in a matrix material other than silicon resin and silicon dioxide. [0264] Examples of the matrix material other than the silicon-containing resin and the silicon dioxide include epoxy resins, acrylic resins (for example, polymeth (meth) acrylates and polybutyl (meth) acrylates, etc.), and Olefin resin, polyolefin (such as polyethylene), polyvinyl butyraldehyde, polyvinyl acetate, polyurea, polyurethane, polyester resin (such as polyethylene terephthalate), poly Carbonate resin, etc. [0265] When a plurality of thin films containing quantum dots are laminated to produce a laminate, it is preferable that the refractive indexes of the adjacent thin films are different. Further, a high-refractive index film having a high refractive index and a low-refractive index film having a low refractive index are preferably laminated to each other. In this case, the difference in refractive index between adjacent thin films is preferably 0.4 to 2.0. When multiple layers with different refractive indices are repeatedly laminated, when the light incident from the light source passes through the laminate, it is easy to improve the utilization efficiency of the incident light by the divergence of the refraction of the light. [0266] The thin film containing quantum dots preferably includes a quantum dot whose wavelength converts incident light from a light source to generate red light, and a quantum dot which converts incident light from a light source to generate green light. Further, a thin film including a quantum dot that generates red light and a thin film including a quantum dot that generates green light are preferably laminated to each other. Since the laminated body thus constituted can be applied to a light-emitting display element panel, green light and red light having high color purity can be taken out by wavelength conversion, and the reproduction range of the hue of a light-emitting display device having the light-emitting display element panel can be expanded. As the light source, blue light or white light is usually used. By combining this light source and using it with the above-mentioned laminated body, red light, green light, and blue light with high color purity can be taken out, and a good image with bright hue can be displayed. [0267] The light-emitting display device is not particularly limited as long as it is a device that displays light using a light source, and examples thereof include a liquid crystal display device and an organic EL display device. [0268] The laminated body described above is preferably two or more films selected from the group consisting of the aforementioned silicon-containing resin film and the aforementioned silicon dioxide film, and laminated in a manner of being in contact with each other. It is also preferable that the laminate is composed of only two or more films selected from the group consisting of the aforementioned silicon-containing resin film and the aforementioned silicon dioxide film. It is because silicon-containing resin or silicon dioxide has various excellent characteristics such as light resistance, weather resistance, solvent resistance, chemical resistance, transparency, and insulation. [0269] [Laminates including quantum dot-containing films and other functional layers] Films containing quantum dots, that is, the aforementioned silicon-containing resin films and the aforementioned silicon dioxide films, are preferably laminated with other functional layers. Hereinafter, the above-mentioned silicon-containing resin film and the above-mentioned silicon dioxide film may be individually described as "a film containing quantum dots". The quantum dot-containing film preferably includes a quantum dot whose wavelength converts incident light from a light source to generate red light, and a quantum dot which converts incident light from a light source to generate green light. Moreover, as a light source, blue light or white light can be used normally. [0270] Other functional layers include a diffusion layer that diffuses light, a silicon-containing resin film, or a low-refractive index layer having a lower refractive index than a silicon dioxide film, and a portion that reflects a portion of light incident from a light source. A reflective layer, a light guide plate that injects light emitted from a light source into a laminated body, and the like. If necessary, voids may be provided in the laminate. The void may be, for example, a layer of air or a layer of inert gas such as nitrogen. [0271] The diffusion layer is not particularly limited to various diffusion layers that have been conventionally used in various display devices or optical devices. Typical examples include a thin structured film with prisms or the like on the surface, a thin film with beads scattered or buried on the surface, and a thin film containing an interface or void that is structured to scatter particles or light inside. . [0272] The low refractive index layer is not particularly limited as long as it has a lower refractive index than the aforementioned silicon-containing resin film and the aforementioned silicon dioxide film, and films made of various materials can be used. [0273] Examples of the reflective layer include a reflective polarizing film, a thin film having a fine structure such as a prism provided on the surface so as to reflect a part of incident light, a metal foil, and a multilayer optical film. The reflecting layer preferably reflects more than 30% of the incident light, more preferably reflects more than 40%, and particularly preferably reflects more than 50%. The reflective layer is preferably configured to reflect light passing through a thin film containing quantum dots, and to set the reflected light to be incident on the thin film containing quantum dots again. The light incident from the reflective layer to the thin film containing quantum dots is reflected by the diffusion layer to the direction of the reflective layer, and the green light emitted from the thin film containing quantum dots can be increased when the reflective layer is not used. And the color purity of red light. [0274] The light guide plate is not particularly limited to various light guide plates that have been conventionally used in various display devices or optical devices. [0275] As a typical example of a preferable layer structure including a thin film containing quantum dots and a laminate with other functional layers, the following layer structures 1) to 8) can be cited. Still, the laminated body constituted in 1) to 8), in which the light emitted from the light source is incident on the leftmost layer, and the wavelength-converted light is taken out from the thin film containing the quantum dots from the rightmost layer. Generally, a display panel is provided so that light taken out from the laminated body is incident, and red, green, and blue light with high color accuracy are used to display an image. 1) Diffusion layer / Thin film with quantum dots / Low refractive index layer / Reflective layer 2) Light guide plate / Diffusion layer / Thin film with quantum dots / Low refractive index layer / Reflective layer 3) Low refractive index layer / Thin film with Quantum dots Film / Void / Reflective layer 4) Light guide plate / Low refractive index layer / Thin film containing quantum dots / Void / Reflective layer 5) Low refractive index layer / Thin film containing quantum dot / Low refractive index layer / Reflective layer 6) Light guide plate / Low refractive index layer / Thin film containing quantum dots / Low refractive index layer / Reflective layer 7) Reflective layer / Low refractive index layer / Thin film containing quantum dots / Low refractive index layer / Reflective layer 8) Light guide plate / Reflective layer / Low-refractive index layer / Thin-quantum-containing film / Low-refractive index layer / Reflective layer [0276] In the laminates described above, the silicon-containing resin film and the silicon dioxide film are preferably manufactured according to the aforementioned method. [0277] <Light-emitting display element panel and light-emitting display device> An optical film composed of the aforementioned silicon-containing resin film or the aforementioned silicon dioxide film, or the aforementioned laminated body is incorporated into various light-emitting display element panels, and It is preferably used for the purpose of taking out red light, green light, and blue light with high color purity from the light emitted from the light source. Herein, an optical film composed of the aforementioned silicon-containing resin film or the aforementioned silicon dioxide film, or the general name of the aforementioned laminated body is described as a "quantum dot sheet". [0278] The light-emitting display element panel generally includes a backlight including a combined light source, a quantum dot sheet, and a display panel. When the quantum dot sheet includes a light guide plate, a light source is usually provided on the side of the light guide plate so that light is incident thereon. The light incident from the side of the light guide plate passes through the quantum dot sheet and enters the display panel. When the quantum dot sheet does not include a light guide plate, light is incident from a main surface of the quantum dot sheet from a surface light source, and light passing through the quantum dot sheet is incident on a display panel. The type of the display panel is not particularly limited as long as it can form an image using light passing through the quantum dot sheet, but it is usually a liquid crystal display panel. [0279] Since the light emitted from the light source is easy to take out, especially red light, green light and blue light with high color purity, the quantum dot sheet is preferably the aforementioned laminated body. Preferred combinations of the structure of the light-emitting display element panel when the quantum dot sheet is a laminate include the following combinations a) to h). Regarding the combinations described in the following a) to h), the light-emitting display device panel is formed by stacking the structures described in the leftmost order from the order described. a) Surface light source / diffuse layer / thin film with quantum dots / low refractive index layer / reflective layer / display panel b) light guide plate with light source / diffusion layer / thin film containing quantum dots / low refractive index layer / reflective layer / display Panel c) surface light source / low refractive index layer / thin film containing quantum dots / voids / reflective layer / display panel d) light guide plate with light source / low refractive index layer / thin film containing quantum dots / void / reflection layer / display panel e) Surface light source / low refractive index layer / thin film with quantum dots / low refractive index layer / reflective layer / display panel f) light guide plate with light source / low refractive index layer / thin film containing quantum dots / low refractive index layer / Reflective layer / Display panel g) Surface light source / Reflective layer / Low refractive index layer / Thin film containing quantum dots / Low refractive index layer / Reflective layer / Display panel h) Light guide plate with light source / Reflective layer / Low refractive index layer / Quantum dot-containing thin film / low-refractive index layer / reflective layer / display panel [0280] By using the above-mentioned light-emitting display element panel, a wide range of hue can be produced, which is a good hue and can display bright images of luminescence Display device. [Examples] [0281] Although the present invention will be described in more detail by examples below, the present invention is not limited to these examples. [0282] In the examples and comparative examples, the following silicon-containing resins A-1 to A-6 were used. A-1: Polyphenylsiloxane resin (mass average molecular weight: 1000) A-2: Polydimethylsiloxane resin (mass average molecular weight: 1000) A-3: Made of -Si (CH 3 ) (Ph) -Polysilane composed of units (mass average molecular weight: 1000, Ph represents phenyl) A-4: by -Si (CH 3 ) (Ph)-Polysilane composed of units (mass average molecular weight: 13000, Ph represents phenyl) A-5: 50% by mass of A1, 50% by mass of A3 mixed resin A-6: Contained Mixed resin of 50% by mass of A3 and 50% by mass of A4 [0283] In the Examples and Comparative Examples, the following quantum dots B-1 to B-5 were used. For B-1 and B-2, a concentration of 1% by mass was used as a dispersion liquid for dispersing quantum dots in a solvent of the type described in Table 1. For B-3 and B-4, a concentration of 3% by mass was used as a dispersion liquid for dispersing quantum dots in a solvent of the type described in Table 1. For B-5, a concentration of 1% by mass in toluene was used as a dispersion liquid for dispersing quantum dots. B-1: The core made of CdSe is a quantum dot covered by a shell made of ZnS (emission maximum: 520nm) B-2: The core made of CdSe is covered by a shell made of ZnS Quantum dots (maximum light emission: 630nm) B-3: The core composed of InP is particles covered by a shell layer made of ZnS, and the quantum dots (olemium 530nm) coordinated with oleylamine B-4: InP The core is composed of particles coated with a shell composed of ZnS, and the quantum dots with oleylamine (luminous maximum 620nm) B-5: The core composed of CdSe is covered by a shell composed of ZnS Quantum dots (emission maximum: 520 nm) [0284] In Examples and Comparative Examples, the following solvents S-1 to S-6 were used. S-1: Cyclohexyl acetate S-2: Propylene glycol monomethyl ether acetate S-3: 3-methoxybutyl acetate S-4: Isopropanol S-5: Ethyl diethylene glycol Alcohol Acetate [0285] [Examples 1 to 12 and Comparative Examples 1 to 4] The types and amounts (parts by mass) of a silicon-containing resin, a quantum dot, and a solvent were uniformly mixed, and each was obtained. Silicone-containing resin compositions of Examples and Comparative Examples. Using the obtained silicon-containing resin composition, tests for resistance to cracking and stability of dispersion were performed by the following methods. The results of these tests are shown in Table 1. [Evaluation of Fracture Resistance] On the sample substrate, each silicon-containing resin composition of Table 1 was applied using a spin coater to form a silicon dioxide film having a film thickness of 5.0 μm. Coating film. The coating film was pre-baked at 100 ° C for 2 minutes, and then the coating film was fired at 350 ° C for 30 minutes using a vertical-type baking oven (TS8000MB, manufactured by Tokyo Industries Co., Ltd.) to obtain a film thickness. 5.0 μm silicon dioxide film. The surface of the formed silicon dioxide film was observed with an optical microscope, and the presence or absence of cracks was confirmed. A case where no crack was confirmed was judged to be good (○), and a case where crack was confirmed was judged to be poor (×). The evaluation results are shown in Table 1. (Evaluation of dispersion stability) The average particle diameter of the quantum dots in the obtained silicon-containing resin composition was measured using a dynamic light scattering type particle size distribution measuring device LB-500 manufactured by HORIBA Corporation. The measured average particle diameter was defined as the dispersed particle diameter. The smaller the diameter of the dispersed particles, it means that the quantum dots cannot aggregate and disperse well. Regarding the dispersibility, a case where the diameter of the dispersed particles was 8 nm or less was judged to be good (○), and a case where it was larger than 15 nm was judged to be poor (×). The evaluation results are shown in Table 1. [0288] [0289] According to Table 1, when the silicon-containing resin composition contains quantum dots and a solvent having a structure represented by the aforementioned formula (S1), it is understood that a thin film that suppresses the occurrence of cracks and disperses the quantum dots well can be produced. In addition, it was found that when the silicon-containing resin composition includes quantum dots but does not include a solvent of a structure represented by the formula (S1), the produced thin film is prone to cracking, and it is difficult to form a thin film containing well-dispersed quantum dots.

Claims (16)

一種含矽樹脂組成物,其係含有含矽樹脂(A)、與量子點(B)、與溶劑(S),其特徵為前述含矽樹脂(A)為選自由矽氧烷樹脂及聚矽烷所構成之群組中之1種以上,   前述溶劑(S)為含有下式(S1)表示之環烷基乙酸酯,(式(S1)中,Rs1 為碳原子數1~3之烷基,p為1~6之整數,q為0~(p+1)之整數)。A silicon-containing resin composition comprising a silicon-containing resin (A), a quantum dot (B), and a solvent (S), wherein the silicon-containing resin (A) is selected from the group consisting of a silicone resin and a polysilane. In the group consisting of one or more, the solvent (S) contains a cycloalkyl acetate represented by the following formula (S1), (In the formula (S1), R s1 is an alkyl group having 1 to 3 carbon atoms, p is an integer of 1 to 6, and q is an integer of 0 to (p + 1)). 如請求項1之含矽樹脂組成物,其係進一步含有硬化劑(C)。The silicone resin-containing composition according to claim 1, further comprising a hardener (C). 一種含矽樹脂薄膜之製造方法,其係包含:   形成由如請求項1或2所記載之含矽樹脂組成物所構成之塗佈膜、與   從前述塗佈膜去除溶劑(S)。A method for producing a silicon-containing resin film, comprising: (i) forming a coating film composed of the silicon-containing resin composition according to claim 1 or 2; and (ii) removing a solvent (S) from the aforementioned coating film. 如請求項3之含矽樹脂薄膜之製造方法,其中,前述含矽樹脂薄膜的膜厚為2~300μm。The method for manufacturing a silicon-containing resin film according to claim 3, wherein the film thickness of the silicon-containing resin film is 2 to 300 μm. 一種含矽樹脂薄膜,其係於由含矽樹脂(A)所構成之基質中,分散有量子點(B),膜厚為2~300μm。A silicon-containing resin film is composed of a silicon-containing resin (A) in which a quantum dot (B) is dispersed, and a film thickness is 2 to 300 μm. 一種二氧化矽薄膜之製造方法,其係包含:   形成由如請求項1或2所記載之含矽樹脂組成物所構成之塗佈膜、與   燒成前述塗佈膜。A method for producing a silicon dioxide film, comprising: (i) forming a coating film composed of the silicon-containing resin composition according to claim 1 or 2; and (ii) firing the aforementioned coating film. 如請求項6之二氧化矽薄膜之製造方法,其中,前述二氧化矽薄膜的膜厚為2~300μm。The method for manufacturing a silicon dioxide film according to claim 6, wherein the film thickness of the silicon dioxide film is 2 to 300 μm. 一種二氧化矽薄膜,其係於由二氧化矽所構成之基質中,分散量子點(B)而成。A silicon dioxide film is formed by dispersing quantum dots (B) in a matrix composed of silicon dioxide. 如請求項8之二氧化矽薄膜,其中,膜厚為2~300μm。For example, the silicon dioxide film of claim 8, wherein the film thickness is 2 to 300 μm. 一種發光顯示元件用之光學薄膜,其係由如請求項5所記載之含矽樹脂薄膜,或如請求項8或9所記載之二氧化矽薄膜所構成。An optical film for a light-emitting display element, which is composed of a silicon-containing resin film as described in claim 5 or a silicon dioxide film as described in claim 8 or 9. 一種層合體,其係包含選自由如請求項5所記載之含矽樹脂薄膜及如請求項8或9所記載之二氧化矽薄膜所構成之群組中之1個以上的薄膜。A laminate comprising one or more films selected from the group consisting of a silicon-containing resin film according to claim 5 and a silicon dioxide film according to claim 8 or 9. 如請求項11之層合體,其中,選自由前述之含矽樹脂薄膜及前述之二氧化矽薄膜所構成之群組中之2個以上的薄膜,係以分別接觸的方式層合。For example, the layered product of claim 11, wherein two or more films selected from the group consisting of the aforementioned silicon-containing resin film and the aforementioned silicon dioxide film are laminated in a contact manner. 一種發光顯示元件面板,其係包含如請求項10所記載之發光顯示元件用之光學薄膜或如請求項11或12所記載之層合體。A light-emitting display element panel comprising an optical film for a light-emitting display element according to claim 10 or a laminated body according to claim 11 or 12. 一種發光顯示裝置,其係具備如請求項13所記載之發光顯示面板。A light-emitting display device includes the light-emitting display panel according to claim 13. 一種層合體之製造方法,其係包含選自含矽樹脂薄膜及二氧化矽薄膜中之1個以上的薄膜之層合體之製造方法,其特徵為包含將前述含矽樹脂薄膜以如請求項3或4所記載之製造方法製造及將前述二氧化矽薄膜以如請求項6或7所記載之製造方法製造中之至少一種。A method for manufacturing a laminate, which is a method for manufacturing a laminate including one or more films selected from a silicon-containing resin film and a silicon dioxide film, characterized in that the method includes the step of: Or at least one of the method for manufacturing the silicon dioxide film and the method for manufacturing the silicon dioxide film according to claim 6 or 7. 一種應用,其係用以發光顯示元件之光學薄膜的應用,前述光學薄膜係由如請求項5所記載之含矽樹脂薄膜或如請求項8或9所記載之二氧化矽薄膜所構成。An application is an application of an optical film for a light-emitting display element. The optical film is composed of a silicon-containing resin film according to claim 5 or a silicon dioxide film according to claim 8 or 9.
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