TW201833193A - Method for producing polysilane compound, composition, cured product and substrate, and anionic polymerization selective accelerator - Google Patents

Abstract

The present invention provides: a method for producing a polysilane compound which is capable of suppressing the generation of an outgas and the occurrence of microcracks in a film that contains the polysilane compound; and an anionic polymerization selective accelerator that is used in the production of the polysilane compound, and a composition, a cured product and a substrate, each of which contains the polysilane compound. A method for producing a polysilane compound, which comprises a process for causing a reaction of a halosilane compound in the presence of a nitroxy compound. An anionic polymerization selective accelerator which is used in the production of a polysilane compound, and which contains a nitroxy compound that comprises a structure represented by general formula (A). (In formula (A), each of Ra1, Ra2, Ra3 and Ra4 independently represents a hydrogen atom or an organic group; Ra1 and Ra2 may combine with each other to form a ring; and Ra3 and Ra4 may combine with each other to form a ring.)

Description

Polydecane compound, composition, cured product and method for producing substrate, and anionic polymerization selection accelerator

The present invention relates to a polydecane compound, a composition, a cured product, a method for producing a substrate, and an anionic polymerization selection accelerator in the production of a polydecane compound.

The polydecane compound is a ceramic precursor, an optoelectronic material (for example, a photoreceptor such as a photoresist or an organic photoreceptor, an optical transmission material such as an optical waveguide, an optical recording material such as an optical memory, or a material for an electroluminescence device), and various components. An interlayer insulating film, a sealing material of a light-emitting element such as an LED (Light Emitting Diode) element or an organic EL (Electroluminescence) element, a coating film for diffusing impurities to a semiconductor substrate, It is used in applications such as gap fillers for semiconductor processes. As a method for producing such a polydecane compound, for example, Patent Document 1 discloses a method for producing polydecane which is produced by reacting a halodecane compound with magnesium metal in the presence of a lithium compound and a specific metal halide. In the reaction system of polydecane, the raw materials (lithium compound, metal halide, and halodecane compound) are newly added to the active metal magnesium which is a solid component remaining after the reaction, and reacted to form polydecane. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent No. 4559642

[Problems to be Solved by the Invention] When a film is formed using a composition containing a polydecane compound, microcracking and outgassing may occur. In view of the above problems of the prior art, an object of the present invention is to provide a process for producing a polydecane compound capable of suppressing generation of gas generation and microcracking in a film containing a polydecane compound, a composition comprising the polydecane compound, and a cured product. And an anionic polymerization selection accelerator in the production of a substrate and a polydecane compound. [Means for Solving the Problems] The present inventors have found that in the method for producing a polydecane compound, by reacting a halodecane compound in the presence of a nitroxide-based compound, generation of outgas and microcracking can be suppressed, thereby The present invention has been completed. A first aspect of the invention is a process for producing a polydecane compound, which comprises: reacting a halodecane compound in the presence of a nitrate-based compound. The second aspect of the present invention is a polydecane compound obtained by the production method of the first aspect. The third aspect of the present invention is a composition comprising the second aspect of the polydecane compound. The fourth aspect of the present invention is a cured product of the composition of the third aspect. A fifth aspect of the present invention is a substrate comprising a cured material of a fourth aspect. The sixth aspect of the present invention is an anionic polymerization selection accelerator in the production of a polydecane compound containing a nitroxide compound having a structure represented by the following formula (A). [Chemical 1] (In the formula (A), R ^a1 , R ^a2 , R ^a3 and R ^a4 are each independently a hydrogen atom or an organic group. R ^a1 and R ^a2 may be bonded to each other to form a ring. Further, R ^a3 and R ^a4 may mutually Bonding to form a ring). The seventh aspect of the present invention is a method for producing a composition comprising a polydecane compound, and the polydecane compound is produced by the method of the first aspect. The eighth aspect of the invention is a method for producing a cured product of the composition, and the composition is produced by the method of the seventh aspect. According to a ninth aspect of the invention, there is provided a method of producing a substrate having a cured product, wherein the cured product is produced by the method of the eighth aspect. [Effects of the Invention] According to the present invention, a method for producing a polydecane compound capable of suppressing generation of gas generation and microcracking in a film containing a polydecane compound, a composition comprising the polydecane compound, a cured product, and a substrate can be provided. And an anionic polymerization selection accelerator in the manufacture of a polydecane compound.

The embodiments of the present invention are described in detail below, but the present invention is not limited to the following embodiments, and may be appropriately modified within the scope of the object of the present invention. In the present specification, "~" means the above or below unless otherwise specified. <Method for Producing Polydecane Compound> The method for producing a polydecane compound according to the first aspect includes reacting a halodecane compound in the presence of a nitrate-based compound. In the manufacture of polydecane compounds, a decyl radical cation and a decyl radical anion (Electronic Structure of Radical Anions and Cations of Polysilanes with Structural Defects Seki, Shu; Yoshida, Yoichi; Tagawa, Seiichi; Asai, are usually produced. Keisuke, Macromolecules, 1999, 32 (4), pp1080 - 1086). The decyl radical anion can be supplied to the production of the polydecane compound by anionic polymerization, and on the other hand, there is water in the air (H).₂ O) or oxygen (O₂ A case where a side reaction such as a siloxane chain (Si-O) or a stanol group (Si-OH) is selectively formed by a reaction with a decyl radical cation. The present inventors have found that when a film is formed using a composition containing a polydecane compound containing a side reaction such as a decane bond or a stanol group, the above-mentioned siloxane chain, stanol group or the like causes micro crack. Further, it is considered that the decyl radical cation is more likely to cause detachment of a substituent such as an aryl group or an alkyl group (particularly an aryl group) than the fluorenyl radical anion, thereby causing outgassing. On the other hand, in the method for producing a polydecane compound which is presumed to be the first aspect, the cerium-based compound can charge the decyl radical cation to reduce the decyl radical cation, thereby selectively promoting decane. Anionic polymerization of radical anions. It is presumed that the formation of side reactions such as a heptane bond or a stanol group which causes microcracking can be suppressed, and the generation of outgas can also be suppressed. (Nitrate-based compound) The above-mentioned nitrate-based compound is not particularly limited as long as it can be stably present as a nitroxide radical, and preferably contains a structure represented by the following formula (A). Compound. [Chemical 2](in formula (A), R^A1 , R^A2 , R^A3 And R^A4 Each is independently a hydrogen atom or an organic group. R^A1 With R^A2 They can be bonded to each other to form a ring. Also, R^A3 With R^A4 Can be bonded to each other to form a ring). In formula (A), as R^A1 ~R^A4 The organic group represented may be an organic group having 1 to 10 carbon atoms, R^A1 , R^A2 , R^A3 And R^A4 Preferred are each an alkyl group or an alkyl group substituted with a hetero atom. As the alkyl group, a methyl group, an ethyl group, a n-propyl group and an isopropyl group are preferred. Preferable examples of the hetero atom include a halogen atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Preferred examples of the nitroxide-based compound are, for example, di-t-butyl oxynitride, di-1,1-dimethylpropyl oxynitride, and di-1,2-dimethylpropane. a base oxynitride, a di-2,2-dimethylpropyl oxynitride, and a compound represented by the following formula (A1), (A2), or (A3), more preferably the following formula (A1) A compound represented by (A2) or (A3). [Chemical 3]In the formulas (A1), (A2), and (A3), R^A5 Represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a hydroxyl group, an amine group, a carboxyl group, a cyano group, an alkyl group substituted with a hetero atom, or an ether bond, an ester bond, a guanamine bond or a urethane bond And the bonded monovalent organic group. R^A6 Indicates a divalent or trivalent organic group. N1 and n2 are integers satisfying 1≦n1+n2≦2. N3 and n4 are integers satisfying 1≦n3+n4≦2. N5 and n6 are integers satisfying 1≦n5+n6≦2. N7 is 2 or 3. Preferred examples of the compound represented by the formula (A1) include the following compounds. In the following formula, R^A7 Each of them may independently represent an alkyl group having 1 to 20 carbon atoms which may have a substituent, an aromatic group which may have a substituent, or an alicyclic group which may have a substituent. [Chemical 4]Preferred examples of the compound represented by the formula (A2) include the following compounds. [Chemical 5]Preferred examples of the compound represented by the formula (A3) include the following compounds. [Chemical 6]Further preferred as the nitroxide-based compound, 2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical (TEMPO), 4-hydroxy-2,2,6,6-tetramethyl Isopiperidin-1-hydrocarbyloxy radical, 4-amino-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, 4-carboxy-2,2,6,6-tetra Methylpiperidine 1-hydrocarbyloxy radical, 4-cyano-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, 4-methacrylic acid-2,2,6, 6-tetramethylpiperidine 1-hydrocarbyloxy radical, 4-acrylic acid-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, 4-sided oxy-2,2, 6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, 3-carboxy-2,2,5,5-tetramethylpyrrolidine 1-hydrocarbyloxy radical, 4-acetylamine-2, 2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, 4-(2-chloroethylammonium)-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical 4-hydroxy-2,2,6,6-tetramethylpiperidinebenzoic acid 1-hydroxyloxy ester free radical, 4-isothiocyanato-2,2,6,6-tetramethylpiperidine 1 Alkoxy radical, 4-(2-iodoethylamine)-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical, and 4-methoxy-2,2, 6,6-Tetramethylpiperidine 1-hydrocarbyloxy radical. The nitroxide compound may be used singly or in combination of two or more. The amount of the above-mentioned nitrhydryl compound to be used is preferably in the range of 0.0001 to 10 mol times, more preferably in the range of 0.0005 to 5 mol, and further preferably in the range of 0.0008 to 1 mol per mol of the halodecane compound. It is particularly preferably in the range of 0.001 to 0.1 moles. (halodecane compound) The halodecane compound is preferably a compound represented by the following formula (1). X_n SiR_{4 - n} (1) (wherein n is an integer of 2 to 4, and each of n X's are independently a halogen atom, and (4-n) R are each independently a hydrogen atom, an organic group or a decyl group). The halogen atom represented by X may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, preferably a chlorine atom or a bromine atom, and more preferably a chlorine atom. The organic group represented by R may, for example, be an alkyl group having 1 to 10 carbon atoms such as an alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or a third butyl group (preferably a carbon atom). a number of 1 to 6 alkyl groups, especially an alkyl group having 1 to 4 carbon atoms, etc.), a cycloalkyl group (a cycloalkyl group having 5 to 8 carbon atoms such as a cyclohexyl group, especially a ring having 5 to 6 carbon atoms) Alkenyl group, alkenyl group [alkenyl group having 2 to 10 carbon atoms such as a vinyl group, a propenyl group or a butenyl group (preferably an alkenyl group having 2 to 6 carbon atoms, particularly an alkenyl group having 2 to 4 carbon atoms; a cycloalkenyl group having 5 to 10 carbon atoms such as a cycloalkenyl group such as a cycloalkenyl group or a 1-cyclohexenyl group (preferably a cycloalkenyl group having 5 to 8 carbon atoms, particularly carbon) a cycloalkenyl group having 5 to 7 or the like), an aryl group (an aryl group having 6 to 10 carbon atoms such as a phenyl group or a naphthyl group), an aralkyl group such as a benzyl group or a phenethyl group;_6-10 aryl-C_1-6 Alkyl group (C_6-10 aryl-C_1-4 An alkyl group or the like], an amine group, an N-substituted amine group (an N-mono or disubstituted amino group substituted by the above alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group, a fluorenyl group or the like). The above alkyl group, cycloalkyl group, aryl group or aryl group constituting the aralkyl group or the like may have one or a plurality of substituents. Examples of such a substituent include the above-exemplified alkyl groups (especially, an alkyl group having 1 to 6 carbon atoms). Examples of the organic group having such a substituent include a tolyl (methylphenyl) group, a xylyl (dimethylphenyl) group, an ethylphenyl group, and a methylnaphthyl group._1-6 alkyl-C_6-10 Aryl (preferably single, two or three C_1-4 alkyl-C_6-10 Aryl, especially single or two C_1-4 Alkylphenyl group, etc.). The decyl group may, for example, be a substituted fluorenyl group substituted with the above alkyl group, cycloalkyl group, alkenyl group, cycloalkenyl group, aryl group, aralkyl group or alkoxy group. When n is 2 (dihalodecane compound), R is preferably a hydrocarbon group such as an alkyl group or an aryl group. It is also possible that at least one R is an aryl group. In the case where the fluorenyl radical cation has an organic group (especially an aryl group) such as an alkyl group or an aryl group directly bonded to a ruthenium atom, detachment of the above organic group is liable to occur, thereby causing outgassing. On the other hand, in the production method of the polydecane compound estimated in the first aspect, even when the decyl radical cation has an organic group directly bonded to a ruthenium atom (R is an organic group (especially an aryl group) In this case, the nitroxide-based compound also causes charge-rotation of the decyl radical cation and decreases the decyl radical cation, whereby the detachment of the organic group is less likely to occur, and the generation of outgas can be suppressed. Examples of the representative dihalodecane compound include dialkyl dihalodecane (dimethyl dichlorodecane, etc._1-10 Alkyl dihalodecane, preferably two C_1-6 Alkyl dihalodecane, and more preferably two C_1-4 Alkyl dihalothane, etc., monoalkyl monoaryl dihalodecane (methylphenyl dichlorodecane, etc. single C_1-10 Alkyl single C_6-12 Aryl dihalodecane, preferably single C_1-6 Alkyl single C_6-10 Aryl dihalothane, and more preferably single C_1-4 Alkyl single C_6-8 Eryl dihalothane, etc., diaryl dihalodecane (diphenyldichlorodecane, etc._6-12 Aryl dihalodecane, preferably two C_6-10 Aryl dihalodecane, and more preferably two C_6-8 Aryl dihalothane, etc.). As the dihalodecane compound, a dialkyl dihalodecane or a monoalkyl monoaryl dihalodecane is preferred. The dihalodecane compound may be used singly or in combination of two or more. When n is 3 (trihalodecane compound), R is preferably an alkyl group, a cycloalkyl group, a aryl group which may have a substituent, a hydrocarbon group such as an aralkyl group, and more preferably an alkyl group or an aryl group. More preferably, it is an aryl group. As described above, in the method for producing a polydecane compound according to the first aspect, even when the decyl radical cation has an organic group directly bonded to a ruthenium atom (R is an organic group (especially an aryl group) In the case of the above, the action of the above-mentioned nitrate-based compound also makes it difficult to cause the detachment of the organic group to suppress the generation of outgas. The representative trihalodecane compound may, for example, be an alkyl trihalodecane (methyl trichlorodecane, butyl trichlorodecane, tert-butyl trichlorodecane or hexyltrichlorodecane)._1-10 Alkyl trihalodecane, preferably C_1-6 Alkyl trihalodecane, and more preferably C_1-4 Alkyl trihalodecane, etc., cycloalkyl trihalodecane (cyclohexyl trihalodecane, etc. single C_6-10 Cycloalkyltrihalothane, etc., aryltrihalothane (phenyl trichlorodecane, tolyltrichlorodecane, xylyltrichlorodecane, etc. C_6-12 Aryl trihalodecane, preferably C_6-10 Aryl trihalodecane, and more preferably C_6-8 Aryl trihalodecane, etc.). The trihalodecane compound is preferably an alkyl trihalodecane or an aryl trihalodecane. The trihalodecane compound may be used singly or in combination of two or more. Specific examples of the case where n is 4 (tetrahalodecane compound) include tetrachlorosilane, dibromodichlorosilane, tetrabromodecane, and the like. The tetrahalodecane compound can be used singly or in combination of two or more kinds. Further, the tetrahalodecane compound can be used in combination with a mono-, di- or trihalodecane compound. Further, the halodecane compound may be a monohalodecane compound. Examples of the representative monohalodecane include a trialkylmonohalodecane (trimethylchlorodecane, etc., three C)._1-10 Alkyl monohalodecane, preferably three C_1-6 Alkyl monohalodecane, and more preferably three C_1-4 Alkyl monohalodecane, etc., dialkyl monoaryl monohalodecane (dimethylphenyl chlorodecane, etc._1-10 Alkyl single C_6-12 Aryl monohalodecane, preferably two C_1-6 Alkyl single C_6-10 Aryl monohalodecane, and more preferably two C_1-4 Alkyl single C_6-8 Aromatic monohalodecane, etc., monoalkyldiarylmonohalothane (methyldiphenylchlorodecane, etc., single C_1-10 Alkyl di C_6-12 Aryl monohalodecane, preferably single C_1-6 Alkyl di C_6-10 Aryl monohalodecane, and more preferably single C_1-4 Alkyl di C_6-8 Aryl monohalodecane, etc., triarylmonohalodecane (triphenylchlorodecane, etc., three C_6-12 Aryl monohalodecane, preferably three C_6-10 Aryl monohalodecane, and more preferably triple C_6-8 Aryl monohalodecane, etc.). The monohalodecane compound may be used singly or in combination of two or more. These halodecane compounds may be used singly or in combination of two or more. The halodecane compound preferably contains at least one selected from the group consisting of a dihalodecane compound and a trihalodecane compound. Further, in the case where the halodecane compound contains a trihalodecane compound and/or a tetrahalodecane compound, a network-like (mesh or branched) polydecane compound can be produced. In the case of obtaining a network-like polydecane compound, as a representative halodecane (or a combination thereof), (a) an alkyl trihalodecane (for example, an alkyl trihalodecane alone, methyl trihalodecane) may be mentioned. C_2-10 Combination of alkyl trihalodecane, C_2-10 An alkyl trihalodecane or the like, (b) an aryl trihalodecane (for example, an aryl trihalodecane alone), (c) an aryl trihalodecane and a dihalodecane (for example, a monoalkyl monoaryl dihalodecane, etc.) a combination of the like. In the halodecane compound, the ratio (usage ratio) of at least one selected from the group consisting of a dihalodecane compound and a trihalodecane compound may be 50 mol% or more (for example, 60 mol% or more) with respect to the halodecane compound. It is preferably 70 mol% or more (for example, 80 mol% or more), and more preferably 90 mol% or more (for example, 95 mol% or more). Further, in the case of obtaining a network-like polydecane, the ratio (usage ratio) of the trihalodecane compound may be 30 mol% or more (for example, 40 mol% or more) of the total halodecane compound, preferably. It is 50 mol% or more (for example, 60 mol% or more), more preferably 70 mol% or more (for example, 75 mol% or more), and especially 80 mol% or more. Further, in the case of combining a dihalodecane compound and a trihalodecane compound, the ratio may be a dihalodecane compound/trihalothane compound (mole ratio) = 99/1 to 1/99, preferably. It is 90/10 to 2/98 (for example, 85/15 to 2/98), and further preferably 80/20 to 3/97 (for example, 70/30 to 4/96), and particularly 60/40 to 5 /95 (for example, 50/50 to 7/93), usually 50/50 to 5/95 (for example, 45/55 to 7/93, preferably 40/60 to 10/90, and further preferably 30) /70~88/12). The halodecane compound is preferably as pure as possible. For example, the liquid halodecane compound is preferably dried by using a desiccant such as calcium hydride and distilled, and the solid halocin compound is preferably purified by a recrystallization method or the like. Further, the concentration (base concentration) of the halodecane compound in the raw material mixture (reaction liquid) may be, for example, about 0.05 to 20 mol/l, preferably about 0.1 to 15 mol/l, and more preferably 0.2 to 0.2. 5 mol / l or so. In the method for producing a polydecane compound of the first aspect, a method for producing a polydecane compound such as the following (a) to (c) which comprises reacting a halodecane compound can be applied. (a) A method of dehalogenation and polycondensation of a halodecane compound using magnesium as a reducing agent ("magnesium reduction method", a method described in WO98/29476, JP-A-2003-277507, etc.) (b) A method for dehalogenation and polycondensation of a halodecane compound in the presence of an alkali metal such as sodium metal, lithium metal, potassium metal or the like (preferably sodium metal) ("Kipping Method", J. Am. Chem. Soc., 110, 124 (1988), Macromolecules, 23, 3423 (1990), etc.) (c) Method for dehalogenation polycondensation of halodecane compounds by electrode reduction (J. Chem. Soc., Chem. Commun., 1161 (1990), J. Chem. Soc., Chem. Commun. 897 (1992), etc.) The method for producing the polydecane compound of the first aspect is preferably magnesium which reacts the above halodecane compound in the presence of a nitroxide compound and magnesium. a reduction method or a Kipping method for reacting the above halodecane compound in the presence of an alkali metal such as sodium metal, lithium metal, potassium metal or the like (preferably sodium metal), more preferably a nitroxide compound A magnesium reduction method in which the above halodecane compound is reacted in the presence of magnesium. The magnesium may be in the form of a metal magnesium (magnesium element) or a magnesium alloy, or may be a mixture of the above (hereinafter also referred to as "magnesium component"). The type of the magnesium alloy is not particularly limited, and a conventional magnesium alloy such as a magnesium alloy containing aluminum, zinc, or a rare earth element (such as lanthanum, cerium, or the like) may be exemplified. The shape of the magnesium component is not particularly limited as long as it does not impair the reaction of the halodecane compound, and examples thereof include powdery particles (powder, granules, etc.), strips, diced sheets, lumps, and rods. The shape, the plate-like body (flat plate shape, etc.), etc. are especially preferable as a powder, a granular body, a strip shape, a cut sheet shape, etc.. The average particle diameter of magnesium (e.g., powdered magnesium) may be, for example, 1 to 10000 μm, preferably 10 to 7000 μm, and more preferably 15 to 5000 μm (e.g., 20 to 3000 μm). The magnesium component and the alkali metal may be used singly or in combination of two or more. The amount of the magnesium component or the alkali metal to be used is preferably from 1 to 20 equivalents, more preferably from 1.1 to 14 equivalents, still more preferably from 1.2 to 10 equivalents, more preferably from 1.2 to 10 equivalents, per mole of the halogen atom of the halodecane compound. Preferably 1.2 to 5 equivalents. Further, the amount of the magnesium component or the alkali metal used is preferably from 1 to 20 times, more preferably from 1.1 to 14 times, still more preferably from 1.2 to 10, based on the number of moles of the halodecane compound and the amount of magnesium or alkali metal. Times, especially preferably 1.2 to 5 times. The method for producing a polydecane compound according to the first aspect may be carried out in the presence of a nitronium compound, a magnesium component or an alkali metal, and further an organometallic complex represented by the following formula (Z1). The decane compound is reacted. M^p L_p/q (Z1) (in the above formula (Z1), M^p The p-valent metal cation is represented, L represents a q-valent organic ligand, and p and q each independently represent an integer of 1 or more). As a p-valent metal cation M^p The metal atom may be selected from the group consisting of iron, silver, aluminum, lanthanum, cerium, cobalt, copper, lanthanum, cerium, lanthanum, gallium, lanthanum, cerium, lanthanum, indium, cerium, lanthanum, cerium, manganese, molybdenum and lanthanum. , nickel, ruthenium, palladium, rhodium, iridium, platinum, rhodium, iridium, osmium, iridium, osmium, tin, antimony, titanium, antimony, vanadium, chromium, antimony, bismuth, gold, mercury, tungsten, antimony, zinc and zirconium The metal in the group formed. The p is preferably an integer of from 1 to 4, more preferably an integer of from 1 to 3, still more preferably 2 or 3. The q is preferably an integer of from 1 to 4, more preferably an integer of from 1 to 3, still more preferably 1 or 2. Examples of the q-valent organic ligand L include a β-diketone ligand, an olefin, a conjugated ketone, a nitrile, an amine, a carboxyl group ligand, carbon monoxide, a phosphine, a phosphinite, and a phosphine. An organic ligand such as a phosphonite or a phosphite. The q-valent organic ligand L may also be a chelating ligand. The organometallic complex is preferably an organometallic complex represented by the following formula (Z2). [Chemistry 7](In the above formula (Z2), M represents a group selected from the group consisting of iron, silver, aluminum, lanthanum, cerium, cobalt, copper, lanthanum, cerium, lanthanum, gallium, lanthanum, cerium, lanthanum, indium, lanthanum, cerium, lanthanum, manganese. , molybdenum, niobium, nickel, niobium, palladium, rhodium, iridium, platinum, rhodium, iridium, ruthenium, iridium, osmium, tin, antimony, titanium, antimony, vanadium, chromium, antimony, bismuth, gold, mercury, tungsten, antimony a metal in the group consisting of zinc and zirconium, R^Z1 Respectively representing a saturated hydrocarbon group, an unsaturated hydrocarbon group, an aromatic hydrocarbon group, an aralkyl group, an alkoxy group, an aryloxy group, an aralkyloxy group or an aryloxyalkyl group, respectively, R^Z2 It represents a hydrogen atom, a saturated hydrocarbon group, an unsaturated hydrocarbon group, an aromatic hydrocarbon group or the above aralkyl group. p represents an integer of 1 or more). As R^Z1 And R^Z2 The saturated hydrocarbon group represented by the formula includes methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, second butyl group, tert-butyl group, pentyl group, hexyl group, heptyl group, and octyl group. Indenyl, fluorenyl, undecyl, dodecyl, tetradecyl, hexadecyl, octadecyl, eicosyl, behenyl, 2-dodecyl a linear or branched alkyl group having 1 to 40 carbon atoms such as an alkyl group, a triaconyl group, a dodecyl group or a tetradecyl group, and the halogen atom (a fluorine atom, a chlorine atom or a bromine atom) An alkyl group substituted with one or two or more substituents such as an iodine atom, an alkoxy group (hereinafter, etc.), or a decyl group (hereinafter, etc.), for example, a chloropropyl group, 3, 3 , 3-trifluoropropyl, 3,3,4,4,5,5,6,6,6-nonafluorohexyl, tridecafluoro-1,1,2,2-tetrahydrooctyl, heptafluoro -1,1,2,2-tetrahydroindenyl, 3-(heptafluoroisopropoxy)propyl, trimethyldecylmethyl, etc.; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl a cyclic saturated hydrocarbon group having a monocyclic or polycyclic ring having 3 to 18 carbon atoms such as a bicycloheptyl group, a cyclooctyl group or an adamantyl group, and the cyclic saturated hydrocarbons One or two or more substituents such as an alkyl group (such as the above) and an aryl group (such as the above) may be substituted, for example, 4-tert-butylcyclohexyl or 4-phenylcyclohexyl; An alkyl group having the above cyclic saturated hydrocarbon group (such as the above), for example, a cyclohexylmethyl group, an adamantylethyl group or the like. As R^Z1 And R^Z2 The unsaturated hydrocarbon group represented by a vinyl group, an ethynyl group, an allyl group, a 1-propenyl group, a propargyl group, a butenyl group, a pentenyl group, a hexenyl group, an octenyl group, a nonenyl group, and a tenth a linear or branched alkenyl group having 2 to 18 carbon atoms such as a dialkylenyl group or a octadecyl group, and an alkynyl group, and a halogen atom (hereinafter, etc.), an alkoxy group (hereinafter, One or two or more substituents of a decyl group (hereinafter, etc.), an aryl group (hereinafter, etc., etc.), for example, 2-trifluoromethylvinyl group, 2-trifluoromethylethynyl, 3-methoxy-1-propenyl, 3-methoxy-1-propynyl, 2-trimethyldecylvinyl, 2-trimethyldecyl acetylene a cyclic, unsaturated hydrocarbon group having 3 to 18 carbon atoms such as a cyclopropenyl group, a cyclohexenyl group or a cyclooctenyl group; and the above cyclic unsaturated hydrocarbon group; An alkyl group (such as the above), for example, a cyclohexenylethyl group or the like. As R^Z1 And R^Z2 The aromatic hydrocarbon group to be represented by a phenyl group, a tolyl group, a butylphenyl group, a butoxyphenyl group, or the like, which is substituted with one or more of an alkyl group, an alkoxy group, and an amine group, etc. Substituting phenyl and the like. As R^Z1 And R^Z2 Examples of the aralkyl group represented include a benzyl group, a phenethyl group, a methylphenethyl group, a butylphenethyl group, a phenylpropyl group, and a methoxyphenylpropyl group. Examples of the heteroaralkyl group include a heteroaralkyl group. Pyridylmethyl, pyridylethyl and the like. As R^Z1 The alkoxy group represented by the above may, for example, be an alkoxy group having 1 to 18 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a hexyloxy group or an octyloxy group. A substituted phenoxy group such as a phenoxy group, a tolyloxy group or a butylphenoxy group substituted with a substituent such as an alkyl group. As R^Z1 Examples of the aralkyloxy group include a benzyloxy group and a phenethyloxy group. Examples of the aryloxyalkyl group include a phenoxypropyl group and a phenoxybutyl group. As R^Z1 Preferably, it is a saturated hydrocarbon group having 1 to 30 carbon atoms, an aromatic hydrocarbon group or the like, and more preferably an alkyl group having 1 to 15 carbon atoms or a phenyl group, and more preferably a methyl group. As R^Z2 Preferably, it is a hydrogen atom, a saturated hydrocarbon group having 1 to 18 carbon atoms, an aromatic hydrocarbon group, etc., and more preferably a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a phenyl group or a phenylethyl group. Especially preferred are hydrogen atoms. A preferred example of p is as shown above. As a metal complex, according to the above metals M and R^Z1 And R^Z2 A combination of various metal complexes can be mentioned. Specific examples are exemplified by silver acetonate (I), tris(acetonitrile)aluminum (III), and tris(2,2,6,6-tetramethyl-3,5-heptanedione). Aluminum (III), tris(2,2,6,6-tetramethyl-3,5-heptanedione) ruthenium (III), tris(acetonitrile) ruthenium (III), bis(acetonitrile)cobalt (II), tris(acetonitrile)cobalt (III), tris(1,3-diphenyl-1,3-propanedione)cobalt (III), tris(3-methyl-2,4-pentyl) Diketone)cobalt(III), tris(3-phenyl-2,4-pentanedione)cobalt(III), tris(3-(1-phenylethyl)-2,4-pentanedione)cobalt (III), bis(benzaldehyde acetonide) cobalt (II) bis(hexafluoroacetamidine)cobalt (II), tris(2,2,6,6-tetramethyl-3,5-heptanedione) Cobalt (III), bis(acetonitrile) copper (II), bis(2,2,6,6-tetramethyl-3,5-heptanedion) copper (II), three (2, 2, 4) ,6,6-pentamethyl-3,5-heptanedione)cobalt(III), tris(2,2,6,6-tetramethyl-4-(1-phenylethyl)-3,5 -heptanedione)cobalt(III), tris(2,2,6,6-tetramethyl-4-phenyl-3,5-heptanedione)cobalt(III), bis(hexafluoroacetamidine) Copper (II), bis(trifluoroacetamidine) copper (II), tris(acetonitrile) ruthenium (III), tris(acetonitrile) ruthenium (III), three (2, 2, 6, 6 -tetramethyl-3,5-heptanedione) ruthenium (III), tris(acetonitrile) ruthenium (III), bis(acetonitrile) iron (I I), tris(acetonitrile)iron (III), tris(1,3-diphenyl-1,3-propanedione)iron (III), tris(3-methyl-2,4-pentane Ketone) iron (III), tris(3-phenyl-2,4-pentanedione) iron (III), tris(3-(1-phenylethyl)-2,4-pentanedione) iron ( III), tris(2,2,6,6-tetramethyl-3,5-heptanedione)iron (III), tris(2,2,4,6,6-pentamethyl-3,5- Heptanedione) iron (III), tris(2,2,6,6-tetramethyl-4-(1-phenylethyl)-3,5-heptanedion)iron (III), tris(2) , 2,6,6-tetramethyl-4-phenyl-3,5-heptanedione) iron (III), tetrakis(acetonitrile) ruthenium (IV), tris(acetonitrile) gallium (III) , tris(acetonitrile) ruthenium (III), tris(acetonitrile) ruthenium (III), tris(acetonitrile)indium (III), tris(acetonitrile) ruthenium (III), tris(acetonitrile) )镧(III), 三(乙醯酮)镏(III), bis(acetamidineacetone)manganese(II), tris(acetonitrile)manganese(III), bis(hexafluoroacetamidine)manganese (II) ), bis(acetamidine) two-sided molybdenum (IV), tris(acetonitrile) ruthenium (III), tris(2,2,6,6-tetramethyl-3,5-heptanedione)钕(III), bis(acetamidineacetone)nickel(II), bis(2,2,6,6-tetramethyl-3,5-heptanedone)nickel(II), bis(hexafluoroacetamidineacetone) Nickel (II), bis(1,3-diphenyl-1,3-propanedione) nickel (II), double (3-A) -2,4-pentanedione) nickel (II), bis(3-phenyl-2,4-pentanedione) nickel (II), bis(3-(1-phenylethyl)-2, 4-pentanedione) Nickel (II), bis(2,2,4,6,6-pentamethyl-3,5-heptanedione)nickel(II), bis(2,2,6,6- Tetramethyl-4-(1-phenylethyl)-3,5-heptanedione)nickel(II), bis(2,2,6,6-tetramethyl-4-phenyl-3,5 -heptanedione)nickel(II), bis(acetamidineacetone)palladium(II), bis(hexafluoroacetamidineacetone)palladium(II), bis(1,3-diphenyl-1,3-propane) Ketone) palladium (II), bis(3-methyl-2,4-pentanedione) palladium (II), bis(3-phenyl-2,4-pentanedione) palladium (II), double (3) -(1-phenylethyl)-2,4-pentanedione)palladium(II), bis(2,2,4,6,6-pentamethyl-3,5-heptanedione)palladium (II ), bis(2,2,6,6-tetramethyl-4-(1-phenylethyl)-3,5-heptanedione)palladium(II), bis(2,2,6,6- Tetramethyl-4-phenyl-3,5-heptanedione) palladium (II), tris(acetonitrile) ruthenium (III), tris(acetonitrile) ruthenium (III), tris(hexafluoroacetamidine) Acetone) ruthenium (III), bis(acetamidineacetone)platinum (II), tris(acetonitrile) ruthenium (III), tris(acetonitrile) ruthenium (III), tris(acetonitrile) ruthenium (III) , tris(hexafluoroacetamidine) ruthenium (III), tris(2,2,6,6-tetramethyl-3,5-heptanedione) ruthenium (III), tris(acetonitrile) ruthenium (III) ), three (2, 2, 6, 6-four -3,5-heptanedone) ruthenium (III), bis(acetonitrile) tin (II), tris(acetonitrile) ruthenium (III), tris(2,2,6,6-tetramethyl- 3,5-heptanedione) ruthenium (III), tris(2,2,6,6-tetramethyl-3,5-heptanedione) ruthenium (III), tris(acetonitrile) vanadium (III) , tris(acetonitrile) ruthenium (III), tris(hexafluoroacetamidineacetone) ruthenium (III), tris(2,2,6,6-tetramethyl-3,5-heptanedione) oxime (III) ), bis(acetonitrile)zinc (II), bis(hexafluoroacetamidine)zinc (II), bis(2,2,6,6-tetramethyl-3,5-heptanedone) zinc ( II), tetrakis(acetonitrile)zirconium (IV), tetrakis(2,2,6,6-tetramethyl-3,5-heptanedion) zirconium (IV), tetrakis(trifluoroacetamidine)zirconium (IV) and so on. These organic metal complexes may be used singly or in combination of two or more kinds. As the organometallic complex, a metal complex which is synthesized in advance can be used, and it can also be used as a manufacturer in the system. The amount of the above organometallic complex used is preferably in the range of 0.001 to 10 moles, more preferably in the range of 0.001 to 1 mole, and particularly preferably in the range of 0.001 to 0.1 moles, relative to the halodecane compound. . (Metal halide) The method for producing a polydecane compound according to the first aspect can also be carried out by reacting the above halodecane compound with a nitroxide compound, magnesium or an alkali metal, and a further metal halide. The metal halide may, for example, be a polyvalent metal halide such as a transition metal (for example, a group 3A element such as ruthenium, a group 4A element such as titanium or the like, a vanadium or the like, a group 5A element of the periodic table, iron, nickel, cobalt, palladium. Group 8 elements of the periodic table, elements such as Group 1B of the periodic table such as copper, elements of Group 2B of the periodic table such as zinc, etc.), metal halides such as metals of the Group 3B of the periodic table (aluminum, etc.), metals of the Group 4B of the periodic table (tin, etc.) Chloride, bromide or iodide, etc.). The valence of the above metal constituting the metal halide is not particularly limited, and is preferably 2 to 4, particularly 2 or 3. These metal halides may be used singly or in combination of two or more. The metal halide is preferably a chloride or a bromide of at least one metal selected from the group consisting of iron, aluminum, zinc, copper, tin, nickel, cobalt, vanadium, titanium, palladium, rhodium, and the like. As such a metal halide, for example, chloride (FeCl) can be exemplified₂ FeCl₃ Isoferric chloride; AlCl₃ ZnCl₂ , SnCl₂ CoCl₂ VCl₂ TiCl₄ PdCl₂ , SmCl₂ Et, bromide (FeBr)₂ FeBr₃ Ethyl bromide, etc., iodide (SmI₂ and many more. Among the metal halides, preferred are chlorides (for example, ferric chloride (II), iron chloride (III), such as iron chloride, zinc chloride, etc.) and bromide. Ferric chloride and/or zinc chloride, especially zinc chloride, are usually used. The amount of the metal halide to be used is preferably in the range of 0.001 to 10 mol times, more preferably in the range of 0.001 to 1 mol, and particularly preferably in the range of 0.001 to 0.1 mol, based on the halodecane compound. Further, the concentration of the metal halide in the solvent (reaction liquid) is usually about 0.001 to 6 mol/L, preferably 0.005 to 4 mol/L, and more preferably about 0.01 to 3 mol/L. (Aprotic solvent) The reaction of the halodecane compound in the presence of the nitroxide compound in the method for producing a polydecane compound of the first aspect is preferably carried out in a solvent (reaction solvent), more preferably in the apron In a solvent. The aprotic solvent as a solvent (reaction solvent) includes, for example, an ether (1,4-dioxane, tetrahydrofuran, tetrahydropyran, diethyl ether, diisopropyl ether, 1,2-dimethoxyB). Cyclic or chain C such as alkane or bis(2-methoxyethyl)ether_4-6 Ether), carbonates (such as propylene carbonate), nitriles (acetonitrile, benzonitrile, etc.), guanamines (dimethylformamide, dimethylacetamide, etc.), and fluorenes (II) Methyl hydrazine, etc., aromatic hydrocarbons (benzene, toluene, xylene, etc.), aliphatic hydrocarbons (such as chain or cyclic hydrocarbons such as hexane, cyclohexane, octane or cyclooctane) . These aprotic solvents may be used singly or in combination of two or more kinds in the form of a mixed solvent. Among these solvents, it is preferred to use at least a polar solvent [e.g., ethers [e.g., tetrahydrofuran, 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,4-dioxane). Etc. (especially tetrahydrofuran, 1,2-dimethoxyethane)]. The polar solvent may be used singly or in combination of two or more kinds, and a polar solvent may be combined with a non-polar solvent. In the method for producing a polydecane compound according to the first aspect, the liquid (reaction liquid) after the reaction may be further contacted with an aqueous solution containing at least one selected from the group consisting of a base and an acid. Purification, whereby the above polydecane compound is obtained. By performing the purification treatment by bringing the polydecane compound into contact with a base or an acid, inclusions such as halogen atoms (for example, halide ions (such as chloride ions) and Si-Cl remaining in the polydecane compound) can be removed, and The low molecular weight of the polydecane compound is promoted, and the solvent solubility of the above polydecane compound can be improved. Further, the acid also functions as a quencher for the reaction of the above halodecane compound. Further, by subjecting the polydecane compound to a metal halide to be subjected to a purification treatment, metal atoms (for example, Mg, Zn, or the like) remaining in the polydecane compound can be removed. The treatment temperature is preferably from -50 ° C to the boiling point of the solvent, and more preferably from room temperature to 100 ° C. Further, as the base to be used, various compounds can be used as long as they are basic, and for example, sodium hydroxide, potassium hydroxide, barium hydroxide, ammonia, tetramethylammonium hydroxide, sodium carbonate, or carbonic acid can be used. An inorganic base such as sodium hydrogencarbonate, potassium carbonate, lithium hydride, sodium hydride, potassium hydride or calcium hydride; alkyl metal such as methyl lithium, n-butyl lithium, methyl magnesium chloride or ethyl magnesium bromide; , Ga, Fe(Fe(II), Fe(III)), Cd, Co, Ni, Sn, Pb, Cu (Cu(II), Cu(I)), Ag, Pd, Pt, Au, etc. (or a metal halide; a metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butoxide; triethylamine, diisopropylethylamine, N,N-dimethylaniline, pyridine, 4 An organic base such as dimethylaminopyridine or diazabicycloundecene (DBU). Various acids can be used as the acid to be used, and an inorganic acid such as hydrogen chloride can be used. Here, as the solvent to be used for the above-mentioned alkali or acid treatment, various types may be used. For example, one or more selected from the group consisting of hydrocarbon solvents such as benzene, toluene and xylene, propylene glycol monomethyl ether and propylene glycol monoethyl ether may be used. Ethylene glycol solvent, ether solvent such as diethyl ether, diisopropyl ether, dibutyl ether, tetrahydrofuran or 1,4-dioxane, acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl pentyl A ketone solvent such as a ketone, a cyclopentanone or a cyclohexanone; an alcohol solvent such as ethanol, isopropyl alcohol or butanol. Further, the acetate compound containing a cyclic skeleton can also be preferably used as a solvent for the treatment under the above alkaline conditions. The acetate compound having a cyclic skeleton is not particularly limited as long as it is an acetate-based solvent having a cyclic skeleton which does not impair the effects of the present invention, and is preferably acetic acid represented by the following formula (S1). Cycloalkyl esters. [化8](in the formula (S1), R^S1 Each is independently an alkyl group, p is an integer from 1 to 6, and q is an integer from 0 to (p+1). As R^S1 The alkyl group represented by the alkyl group is an alkyl group having 1 to 3 carbon atoms, and examples thereof include a methyl group, an ethyl group, a n-propyl group and an isopropyl group. Specific examples of the cycloalkyl acetate represented by the formula (S1) include cyclopropyl acetate, cyclobutyl acetate, cyclopentyl acetate, cyclohexyl acetate, cycloheptyl acetate, and cyclooctyl acetate. Among these, from the viewpoint of availability, etc., cyclohexyl acetate is preferred. The reaction of the above halodecane compound can also be quenched by acid treatment. Various acids can be used as the acid to be used, and an inorganic acid such as hydrogen chloride can be used. According to the method for producing a polydecane compound of the first aspect, the polydecane compound can be obtained in a yield of 50% or more, preferably 70% or more. <Polydecane compound> According to the method for producing a polydecane compound according to the first aspect, as described above, formation of a side reaction product such as a decane bond or a stanol group can be suppressed, so that the ruthenium in the polyoxane compound can be reduced. The amount of oxygen chain bond (Si-O) present. According to the method for producing a polydecane compound according to the first aspect, the ratio of the following (2X) to the sum of the peak areas of the following (1X) and (2X), that is, the ratio represented by the following formula (3X) can be used. When the ratio is 0.4 or less, the peak areas of the above (1X) and (2X) are the maximum detection in the bond energy range of 99 eV or more and 104 eV or less as measured by X-ray photoelectron spectroscopy in the polydecane compound. The spectrum of the peak height is determined by peak separation, and the ratio is preferably 0.35 or less, more preferably 0.3 or less, still more preferably 0.2 or less, still more preferably 0.1 or less, and most preferably 0.05 or less. (1X)・・・ The area of the peak with the maximum peak height (2X) in the range of 99.0 eV or more and 99.5 eV or less in the key energy range is 100 eV or more and 104 eV or less. The area of the peak of the peak height (3X)・(2X)/[(1X)+(2X)] The intensity of the peak is measured, and the above (1X) and (2X) are performed in the respective bond energy ranges. The area of the peak obtained by peak separation is based on the area of the peak having the maximum peak height in the range of the bond energy of 100 eV or more and 104 eV or less, and the ratio of the content of Si-O and Si-C is known. Further, the content ratio of Si-Si is known from the area of the peak having the maximum peak height in the range of the bond energy of 99.0 eV or more and 99.5 eV or less (1X). It is considered that when the polydecane compound contains not only Si-C but also Si-O, in the range of 100 eV or more and 104 eV or less, two peaks having the largest peak height are overlapped after the peak separation, but the second state Preferably, the polydecane compound is in the range of 100 eV or more and 104 eV or less, and only one peak having the largest peak height appears after the peak separation, since it is preferable to have only one peak, it is substantially free Si-O bond. Further, in the case where the previous polydecane compound includes not only Si-C but also Si-O, in the range of 100 eV or more and 104 eV or less, two peaks having the largest peak height are overlapped after the peak separation, and thus, The area ratio becomes large, so the ratio expressed by the above formula exceeds 0.4. The polydecane compound of the second aspect is a polydecane compound produced by the production method of the first aspect described above. The polydecane compound of the second aspect produced by the production method of the first aspect is, for example, a polydecane compound having 3 to 40 Si atoms, preferably a polydecane compound having 5 to 30 Si atoms. The polydecane compound is preferably at least one selected from the group consisting of polydecane compounds represented by the following general formulae (T-1) and (T-2). (R^T10 R^T11 R^T12 Si)_T1 (R^T13 R^T14 Si)_T2 (R^T15 Si)_T3 (Si)_T4 (T-1) (in the above formula, R^T10 , R^T11 , R^T12 , R^T13 , R^T14 And R^T15 Each is independently a hydrogen atom, a hydroxyl group or an organic group. T1, t2, t3, and t4 are each independently a Mohr fraction, which is t1+t2+t3+t4=1, 0≦t1≦1, 0≦t2≦1, 0≦t3≦1, and 0≦t4≦1). [Chemistry 9](In the above formula (T-2), R^T16 And R^T17 Each independently represents a hydrogen atom, a hydroxyl group or an organic group. U represents an integer from 3 to 20) as R^T10 ~R^T17 The organic group represented by the above is the same as the specific examples and preferred examples described above as the organic group represented by R. As R^T10 ~R^T17 For the organic group to be represented, for example, any of the organic groups can be introduced by the method described in paragraph 0031 of JP-A-2003-261681. The mass average molecular weight (Mw) of the polydecane compound is not particularly limited as long as the object of the present invention is not impaired, and is preferably 500 to 10,000, more preferably 1,000 to 7,000, still more preferably 2,000 to 5,000. In the present specification, the mass average molecular weight (Mw) is a measured value obtained by polystyrene conversion by gel permeation chromatography (GPC). <Composition> The composition of the third aspect is a composition comprising the second aspect of the polydecane compound produced by the production method of the first aspect. Further, from the viewpoint of suppressing generation of outgassing and generation of microcracks, the composition of the third aspect preferably further contains the above-described nitroxide-based compound. The method of further including the above-described nitrate-based compound in the composition of the third aspect is not particularly limited as long as the effect of the present invention is not impaired, and the above-mentioned nitrate used in the production method of the first aspect can be used. The sulfhydryl compound may be obtained by remaining in the composition of the third aspect, or may be obtained by adding the above-described nitrhydryl compound to the composition containing the polydecane compound of the second aspect. These nitroxide compounds may be used singly or in combination of two or more. The content of the above-mentioned nitroxide-based compound in the composition of the third aspect is preferably 0.005% by mass or more, and more preferably 0.009% by mass or more, based on the total mass of the components other than the solvent of the composition of the third aspect. In addition, the content of the nitroxide-based compound in the composition of the third aspect is preferably 2% by mass or less, and more preferably 1% by mass, based on the total mass of the components other than the solvent of the composition of the third aspect. the following. Further, the composition of the third aspect may be a thermosetting composition or may not be a thermosetting composition. Further, the composition of the third aspect may be a radiation-sensitive composition, or may not be a radiation-sensitive composition, and may be a positive-type radiation-sensitive composition which is soluble in a developing solution by exposure, or may be borrowed. A negative-type radiation-sensitive composition that is insolubilized to a developer by exposure. Examples of the light source of the radiation include active energy rays such as ultraviolet rays and excimer laser light, and light sources such as a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, and a carbon arc lamp. (Solvent) The composition of the third aspect preferably contains a solvent. Examples of the solvent include the above-mentioned cyclic skeleton-containing acetate compound such as the cyclic alkyl acetate represented by the above formula (S1); alcohols such as methanol, ethanol, propanol and n-butanol; and ethylene glycol and Polyols such as ethylene glycol, propylene glycol, and dipropylene glycol; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl n-amyl ketone, methyl isoamyl ketone, and 2-heptanone; γ-butyl An organic solvent containing a lactone ring such as a lactone; a compound having an ester bond such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate or dipropylene glycol monoacetate; a derivative of a polyol such as a monomethyl ether of a compound having an ester bond, a monoalkyl ether such as monoethyl ether, monopropyl ether or monobutyl ether; or a compound having an ether bond such as a monophenyl ether; Cyclohexane-like cyclic ethers, or methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, ethoxy Esters such as ethyl propyl propionate; anisole, ethyl benzyl ether, cresyl methyl ether, diphenyl ether, dibenzyl ether, phenyl b An aromatic organic solvent such as ether, butylphenyl ether, ethylbenzene, diethylbenzene, pentylbenzene, cumene, toluene, xylene, isopropyl toluene or mesitylene; N, N, N',N'-tetramethylurea, N,N,2-trimethylpropionamide, N,N-dimethylacetamide, N,N-dimethylformamide, N,N- Nitrogen containing diethylacetamide, N,N-diethylformamide, 1,3-dimethyl-2-imidazolidinone, N-methylpyrrolidone, N-ethylpyrrolidone Organic solvent. Among them, preferred are the cycloalkyl acetate represented by the above formula (S1), propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), N, N, N', N'-four Base urea (TMU), and butanol, more preferably cyclopropyl acetate, cyclobutyl acetate, cyclopentyl acetate, cyclohexyl acetate, cycloheptyl acetate or cyclooctyl acetate, and more preferably cyclohexyl acetate ester. These solvents may be used in combination of two or more kinds. In the composition of the third aspect, the moisture content of the composition of the third aspect is preferably 1.0% by mass or less, more preferably 0.5% by mass or less, and further preferably 0.3% by mass. Below %, it is especially preferred that it is less than 0.3% by mass. Further, the amount of water in the solvent can be measured by a Karl Fischer method. The moisture of the composition of the third aspect is mostly derived from a solvent. Therefore, it is preferred to dehydrate the solvent in such a manner that the moisture content of the composition of the third aspect is the above amount. The amount of the solvent to be used is not particularly limited as long as it does not impair the object of the present invention. In the solvent-based composition, the concentration of the solid content of the composition of the third aspect is preferably from 1 to 50% by mass, more preferably from 10 to 40% by mass. (Other components) The composition of the third aspect may also contain a polydecane other than the polydecane compound of the second aspect. For example, in terms of improving chemical resistance, a polydecane compound having a high Mw (hereinafter also referred to as "high molecular weight polydecane"), and a Mw of a high molecular weight polydecane, for example, more than 5,000 and less than 100,000 are mentioned. Preferably, it is about 6,000 to 60,000. The composition of the third aspect may also contain an antimony resin other than the polydecane compound in terms of improving workability. Examples of the oxime-containing resin other than the polydecane compound include a polydecane oxide resin or a polydecane-polysiloxane resin having a polydecane structure (I-1) and a polyoxyalkylene structure (I-2). The Mw of the cerium-containing resin other than the polydecane compound is preferably 500 to 20,000, more preferably 1,000 to 10,000, still more preferably 2,000 to 8,000. Further, the polydecane-polydecane resin may be produced, for example, by treating the second aspect of the polydecane compound in a solvent under the above basic conditions, and then selecting from the following substances: At least one of the group consisting of hydrolytic condensation reaction: at least one selected from the group consisting of ruthenium compounds represented by the following general formulae (A-1-1) to (A-1-4) A compound, a hydrolyzate, a condensate, and a hydrolysis condensate of the above hydrazine compound. R¹ R² R³ SiX¹ (A-1-1) R⁴ R⁵ SiX² ₂ (A-1-2) R⁶ SiX³ ₃ (A-1-3) SiX⁴ ₄ (A-1-4) (in the above formula, X¹ ~X⁴ Independently hydrolyzable, R¹ , R² , R³ , R⁴ , R⁵ And R⁶ Each of them is independently a hydrogen atom or an organic group, and a hydrogen atom in the organic group may be substituted by a halogen atom). As X¹ ~X⁴ The hydrolyzable group represented by the above may, for example, be an alkoxy group, a halogen atom or an isocyanato group (NCO), and is preferably an alkoxy group. The alkoxy group may, for example, be an alkoxy group having 1 to 6 carbon atoms, and specific examples thereof include a methoxy group, an ethoxy group, a n-propoxy group, an isopropoxy group, a n-butoxy group, and a third group. Butoxy, pentyloxy, and the like. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and is preferably a chlorine atom. As R¹ ~R⁶ The organic group represented by the carbon group is an organic group having 1 to 30 carbon atoms, and examples thereof include an alkyl group [methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, and tert-butyl group; An alkyl group of ～10 (preferably an alkyl group having 1 to 6 carbon atoms, particularly an alkyl group having 1 to 4 carbon atoms), a cycloalkyl group (a cycloalkyl group having 5 to 8 carbon atoms such as a cyclohexyl group) , especially a cycloalkyl group having 5 to 6 carbon atoms), an alkenyl group having 2 to 10 carbon atoms such as a vinyl group, a vinyl group, a propenyl group or a butenyl group (preferably an alkenyl group having 2 to 6 carbon atoms) a cycloalkenyl group having 5 to 10 carbon atoms such as a cycloalkenyl group such as a cycloalkenyl group or a 1-cyclohexenyl group (preferably a carbon number of 5 to 10 carbon atoms) a cycloalkenyl group of 5 to 8, particularly a cycloalkenyl group having 5 to 7 carbon atoms, etc.], an aryl group (an aryl group having 6 to 10 carbon atoms such as a phenyl group or a naphthyl group), and an aralkyl group [benzyl group] , phenethyl, etc._6-10 aryl-C_1-6 Alkyl group (C_6-10 aryl-C_1-4 An alkyl group or the like], an amine group, an N-substituted amine group (an N-mono or disubstituted amino group substituted by the above alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group, a fluorenyl group or the like). The above alkyl group, cycloalkyl group, aryl group or aryl group constituting the aralkyl group or the like may have one or a plurality of substituents. Examples of such a substituent include the above-exemplified alkyl groups (especially, an alkyl group having 1 to 6 carbon atoms), and the above-exemplified alkoxy groups. Examples of the organic group having such a substituent include a tolyl group, a xylyl group, an ethylphenyl group, and a methylnaphthyl group._1-6 alkyl-C_6-10 Aryl (preferably single, two or three C_1-4 alkyl-C_6-10 Aryl, especially single or two C_1-4 Alkylphenyl group, etc.; methoxyphenyl, ethoxyphenyl, methoxynaphthyl, etc._1-10 Alkoxy C_6-10 Aryl (preferably C_1-6 Alkoxy C_6-10 Aryl, especially C_1-4 Alkoxyphenyl group, etc.). Further, the hydrazine compound represented by the above formula (A-1-3) may be an anthracene compound represented by the following formula (A-3). HOOC-U-Z-Y-Si (OR^a )₃ (A-3) (In the above formula (A-3), U represents a divalent group formed by removing one hydrogen atom from each of two ring carbon atoms from an aromatic ring group or an alicyclic group, or An alkyl group which may have a branched chain and/or a double bond, Z represents -NHCO- or -CONH-, and Y represents a single bond, an alkylene group, an extended aryl group or a -R^Y1 -NH-R^Y2 -(where, R^Y1 And R^Y2 Respectively represent alkylene groups, R^a The hydrocarbon groups are each independently represented. Here, U and/or Y may have at least one selected from the group consisting of a (meth)acryl group, a vinyl group, and an epoxy group as a substituent). The aromatic ring in the above U may, for example, be an aromatic ring (for example, a benzene ring, a naphthalene ring, a tolyl group or a xylyl group) having 6 to 10 carbon atoms which may have a substituent of 1 to 2 carbon atoms. Examples of the alicyclic ring in the above-mentioned U include an alicyclic ring having 5 to 10 carbon atoms (for example, a monocyclic cycloalkyl group, a monocyclic cycloalkenyl group, a bicyclic alkyl group, a cage alkyl group, etc., specifically, , for example, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a cyclodecane ring, a cyclodecane ring, a dicyclopentadiene ring, a norbornane ring, a norbornene ring, Cubic alkane ring, basket ring, etc.). Examples of the alkylene group which may have a branched chain and/or a double bond in the above U include an alkylene group having 1 to 4 carbon atoms, and examples thereof include a methylene group, an ethyl group, a stretching group, and a vinyl group. , (2-octenyl)-extended ethyl, (2,4,6-trimethyl-2-decenyl)-extended ethyl, etc., alkyl group having a double bond or having a carbon number of 1 to A branched alkyl group of 9 branches. Examples of the alkylene group in the above Y include an alkylene group having 1 to 6 carbon atoms, and examples thereof include a methylene group, an exoethyl group, a propyl group, and a butyl group. The above-mentioned aryl group in Y is preferably a carbon number of 6 to 10. Examples of such an aryl group include a stretched phenyl group (o-, m-, or equivalent), an anthranyl group (1,4-, 1,5-, 2,6-, etc.). As the above -R in Y^Y1 -NH-R^Y2 -, specifically, for example, -CH₂ -NH-CH₂ -, - (CH₂ )₂ -NH-(CH₂ )₂ -, - (CH₂ )₃ -NH-(CH₂ )₃ -, -CH₂ -NH-(CH₂ )₂ -, - (CH₂ )₂ -NH-CH₂ -, - (CH₂ )₂ -NH-(CH₂ )₃ -, - (CH₂ )₃ -NH-(CH₂ )₂ -, -CH₂ -NH-(CH₂ )₃ -, - (CH₂ )₃ -NH-CH₂ -Wait. The polydecane oxide resin may be at least one selected from the group consisting of the following compounds selected from the group consisting of the above-described compounds (A-1-1) to (A-1-4); A hydrolyzate, a condensate, and a hydrolysis condensate of at least one hydrazine compound in the group. The resin other than the polydecane compound of the first aspect (hereinafter referred to as another Si resin) may be used singly or in combination of plural kinds. In the case where the other Si resin is contained, the mixing ratio (mass ratio) of the polydecane compound of the first aspect in the composition of the third aspect to the other Si resin may be appropriately changed depending on the use, for example, 1:99 to 99:1, preferably 10:90 to 90:10. The composition of the third aspect may also contain an organic compound having two or more hydroxyl groups or carboxyl groups in one molecule as a dissolution promoter for an alkaline aqueous solution or solution. Examples of such an organic compound include the compounds shown below. [化10][11][化12]Further, in the above structural formula, E is a hydrogen atom, a methyl group or a hydroxymethyl group, R¹⁵ Is a methylene group, a carbonyl group or a phenylene group, and n is an integer of 3 or more and less than 100. Na represents a natural number from 1 to 3, nb represents a natural number of 1 or more, nc represents a natural number of 2 to 4, and nd represents a natural number of 2 or more. An enantiomer or a diastereomer may be present in the above structural formula, and each structural formula representatively represents all of the stereoisomers. These stereoisomers may be used singly or in the form of a mixture. These organic compounds may be used alone or in combination of two or more. The amount of the solid content component other than the solvent is preferably 0.001 to 50% by mass, and more preferably 0.01 to 30% by mass based on the total amount of the solid content component of the composition of the third aspect. When the organic resin compound is added to remove the resin composition film during processing in the manufacturing process or to impart lithographic properties to the resin composition, the film formed by using the above composition is disintegrated. It is easy to accelerate and peel off. In order to improve the stability, the composition of the third aspect may further contain an organic acid having a carbon number of 1 to 30 or a divalent or higher. Examples of the acid to be added at this time include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, heptanoic acid, caprylic acid, capric acid, capric acid, oleic acid, stearic acid, linoleic acid, and sub-Asia. Sesic acid, benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, trifluoroacetic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, oxalic acid, malonic acid, methyl propyl Diacid, ethylmalonic acid, propylmalonic acid, butylmalonic acid, dimethylmalonic acid, diethylmalonic acid, succinic acid, methyl succinic acid, glutaric acid, adipic acid , itaconic acid, maleic acid, fumaric acid, citraconic acid, citric acid, and the like. Among these, oxalic acid, maleic acid, formic acid, acetic acid, propionic acid, citric acid and the like are particularly preferred. Further, in order to maintain stability, two or more kinds of acids may be mixed and used. Preferably, the organic substance is blended so as to have a pH of 组合7, more preferably 0.3 ≦pH ≦6.5, more preferably 0.5 ≦pH ≦6, in terms of the pH of the composition. acid. Further, the composition of the third aspect may further contain, as a stabilizer, a cyclic ether as a substituent or a divalent or higher alcohol or an ether compound. Specific examples of the stabilizing agent to be used include the stabilizers described in paragraphs (0180) to (0184) of JP-A-2009-126940. The composition of the third aspect may also comprise water. By adding water, the lithography performance is improved. The content of water in the solvent component of the composition of the third aspect is preferably more than 0% by mass and less than 50% by mass, more preferably from 0.3 to 30% by mass, still more preferably from 0.5 to 20% by mass. The composition of the third aspect may also comprise a photoacid generator. Specific examples of the photoacid generator that can be used include the photoacid generators described in paragraphs (0160) to (0179) of JP-A-2009-126940. The composition of the third aspect may also contain a surfactant as needed. Specific examples of the surfactant which can be used include the surfactant described in paragraph (0185) of JP-A-2009-126940. The composition of the third aspect may also comprise a thermal crosslinking accelerator. Specific examples of the heat crosslinking accelerator which can be used include the thermal crosslinking accelerator described in JP-A-2007-302873. Examples of the thermal crosslinking accelerator include a phosphate compound or a borate compound. Examples of such a phosphate compound include ammonium salts such as ammonium phosphate, tetramethylammonium phosphate, and tetrabutylammonium phosphate; and phosphonium salts such as triphenylsulfonium phosphate. Further, examples of such a borate compound include ammonium salts such as ammonium borate, tetramethylammonium borate, and tetrabutylammonium borate; and phosphonium salts such as triphenylphosphonium borate. In addition, the above-mentioned thermal crosslinking accelerator may be used alone or in combination of two or more. Further, the amount of the thermal crosslinking accelerator added is preferably from 0.01 to 50% by mass, more preferably from 0.1 to 40% by mass, based on the total amount of the solid content component other than the solvent. The composition of the third aspect may also contain various other hardeners. Examples of the curing agent include: Bronsted acid; imidazoles; organic amines; organophosphorus compounds and complexes thereof; organic amine complexes of Lewis acids; terpenes; alkali components produced by light or heat Hardener and the like. (Use) The composition of the third aspect can be used for forming a protective film or an interlayer film for protecting various substrates including a film containing a metal oxide and a film containing various metals. Examples of the various substrates include a substrate of a display material such as a semiconductor substrate, a liquid crystal display, an organic light emitting display (OLED), an electrophoretic display (electronic paper), a touch panel, a color filter, and a backlight (including a metal oxide). Substrate (including a film of various metals), a substrate of a solar cell (including a film containing a metal oxide, a film containing various metals), a substrate of a photoelectric conversion element such as a photosensor (including a film containing a metal oxide, including A film of various metals), a substrate of a photovoltaic element (including a film containing a metal oxide, a film containing various metals). <Cured material and substrate having the cured product> The cured product of the fourth aspect is a cured product of the composition of the third aspect. The substrate of the fifth aspect is a substrate having a cured material of the fourth aspect. The method of forming the cured product of the fourth aspect is not particularly limited as long as the effect of the present invention is not impaired, and a method of using a roll coater, a reverse coater, or a bar coat as needed is exemplified. A non-contact type coating device such as a contact transfer type coating device, a rotator (rotary coating device), or a curtain coater is applied to any substrate. The substrate is not particularly limited, and examples thereof include a glass substrate, a quartz substrate, and a transparent or translucent resin substrate (for example, polycarbonate, polyethylene terephthalate, polyether oxime, polyimine, poly A heat resistant material such as amidoxime or the like, a metal, a ruthenium substrate or the like. It can also be a substrate of a display material such as a semiconductor substrate, a liquid crystal display, an organic light emitting display (OLED), an electrophoretic display (electronic paper), a touch panel, a color filter, a backlight device, etc. (including a metal oxide-containing film, including various a metal film), a substrate of a solar cell (including a film containing a metal oxide, a film containing various metals), a substrate of a photoelectric conversion element such as a photo sensor (including a film containing a metal oxide, a film containing various metals) Various substrates such as a substrate of a photovoltaic element (including a film containing a metal oxide or a film containing various metals). The thickness of the substrate is not particularly limited, and can be appropriately selected depending on the use form of the pattern forming body. The coated film after the application is preferably dried (prebaked). The drying method is not particularly limited, and examples thereof include (1) drying at a temperature of 80 to 120 ° C, preferably 90 to 100 ° C for 60 to 120 seconds by using a hot plate; and (2) placing the number at room temperature. Method of hours to several days; (3) Method of removing the solvent by putting it into a hot air heater or an infrared heater for several tens of minutes to several hours. The dried coating film may be exposed to an active energy ray such as ultraviolet light or excimer laser light, or may be exposed. The amount of energy radiation to be irradiated is not particularly limited, and examples thereof include 30 to 2000 mJ/cm.² about. The exposure step may also be carried out in place of or in addition to the calcination step described below. Further, in the exposure step, for example, the formed coating film may be selectively exposed, and in the case of the selective exposure step, a development step may be included. Further, for example, the formed coating film may be subjected to imprint lithography. In the case of performing imprint lithography, for example, a method comprising the steps of: applying a composition of the third aspect onto a substrate to form a coating film; and pressing the coating film to form a specific pattern a step of the mold of the relief structure; and a step of performing the exposure. The step of performing the exposure is performed on the coating film containing the composition of the third aspect in a state where the mold is pressed to the coating film. After hardening by exposure, the mold is peeled off, whereby a cured product of the fourth aspect patterned according to the shape of the mold can be obtained. In terms of improving the physical properties of the film, the coating film after the drying, after the exposure or after the development is preferably subjected to baking (post-baking). The calcination temperature is also dependent on the underlying substrate or the intended use, and is, for example, in the range of 200 to 1000 ° C, preferably 200 ° C to 500 ° C, more preferably 200 to 250 ° C. The baking atmosphere is not particularly limited, and may be an inert gas atmosphere such as a nitrogen atmosphere or an argon atmosphere, under vacuum, or under reduced pressure. It can also be in the atmosphere, and the oxygen concentration can be appropriately controlled. The baking time may be changed as appropriate, and is about 10 minutes to 120 minutes. The cured product of the fourth aspect is preferably a protective film for protecting the above various substrates (including a film containing a metal oxide and a film containing various metals). When the cured product is a film, the thickness is preferably from 10 nm to 10,000 nm, more preferably from 50 to 5,000 nm, and still more preferably from 100 to 3,000 nm. <Anionic polymerization selection promoter in the production of polydecane compound> The anionic polymerization selection accelerator of the sixth aspect is in the production of a polydecane compound containing a nitroxide compound having a structure represented by the above formula (A). Anionic polymerization selection accelerator. The anionic polymerization selection promoter of the sixth aspect converts the decyl radical cation generated in the production of the polydecane compound into a decyl radical anion by charge spinning, thereby selectively promoting an anion of the decyl radical anion polymerization. Thereby, formation of a side reaction substance such as a decane bond or a stanol group which causes microcracking can be suppressed, and generation of outgas can also be suppressed. Specific examples and preferred examples of the cerium-based compound containing the structure represented by the above formula (A) are as described in the method for producing a polydecane compound of the first aspect. The anionic polymerization selectivity promoter of the sixth aspect is preferably used in an amount of 0.0001 to 10 mol times, more preferably 0.001 to 5 mol times, relative to the halodecane compound used in the production of the polydecane compound. Further, it is preferably in the range of 0.001 to 1 mol, and particularly preferably in the range of 0.001 to 0.1 mol. [Examples] Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited by the examples. [Example 1] Production of polydecane compound To a round flask equipped with a three-way stopcock and a volume of 1000 ml, 25 g of magnesium (particle size: 20 to 1000 μm) was added as a catalyst (three acetone). Iron (III) 2.1 g, 4-hydroxy-TEMPO (4-hydroxy-2,2,6,6-tetramethylpiperidine 1-hydrocarbyloxy radical) 0.61 mmol (0.10 g), at 50 After heating and depressurizing to 1 mmHg (= 133 kPa) at ° C, the inside of the reactor (flask) was dried, and then dry argon gas was introduced into the reactor, and tetrahydrofuran previously dried by sodium-benzophenone carbonyl radical was added ( 500 ml of THF) and stirred at 25 ° C for about 60 minutes. To the reaction mixture, 63.5 g (0.3 mol) of methylphenyldichloromethane previously purified by distillation was added to the reaction mixture, and the mixture was stirred at 25 ° C for about 24 hours. After completion of the reaction, 1000 ml of 1 N (=1 mol/L) hydrochloric acid was added to the reaction mixture, followed by extraction with 500 ml of toluene. The toluene layer was washed 10 times with 200 ml of pure water, and the toluene layer was dried over anhydrous magnesium sulfate, and then toluene was distilled off, whereby a methylphenyl decane polymer (mass average molecular weight: 2000) of 28.4 g (yield 63) was obtained. %). [Examples 2 to 4 and Comparative Examples 1 and 2] Production of a polydecane compound The type of the halodecane compound, the type of the organometallic complex or the metal halide, and the presence or absence of the nitroxide compound were changed as shown in Table 1 below. The production of the polydecane compounds of Examples 2 to 4 and Comparative Examples 1 and 2 was carried out in the same manner as in Example 1 except that the type of the polydecane compound produced was the same. Further, Example 5 was produced in accordance with the method described in JACS, 110, 124 (1998) and Macromolecules, 23, 3423 (1990), in addition to the addition of a nitrate-based compound. [Table 1] [Preparation Examples 1 to 4 and Comparative Preparation Examples 1 and 2] Preparation of the respective polydecane compounds obtained in the above Examples 1 to 4 and Comparative Examples 1 and 2 in such a manner that the solid content concentration was 30% by mass Each of the compositions of Preparation Examples 1 to 4 and Comparative Preparation Examples 1 and 2 was prepared by dissolving in a solvent of the type described in Table 2 and filtering using a filter made of a fluororesin having a pore diameter of 0.1 μm. [Formation of Coating Film] The obtained compositions of the respective Preparation Examples and Comparative Preparation Examples were applied onto a sample substrate by a spin coater to form a coating film having a film thickness of a film having a film thickness of 5.0 μm. After the coating film was prebaked at 100 ° C for 2 minutes, the coating film was baked at 350 ° C for 30 minutes using a vertical baking oven (TS8000MB, manufactured by Tokyo Ohka Kogyo Co., Ltd.) to obtain a film thickness of 5.0 μm. The film. For the formed film, the presence or absence of microcracking and whether or not outgassing was evaluated were evaluated in accordance with the following methods. <Evaluation of microcracks> The surface of the formed film was observed for 24 hours using an optical microscope (magnification: 100 times), and the presence or absence of microcracks was evaluated. The results are shown in Table 2. <Evaluation of Outgassing> Further, the degree of outgas generation was evaluated based on the temperature-out gas analysis method (TDS). It was confirmed that the film formed by using the compositions of Comparative Preparation Examples 1 and 2 produced more outgassing than the composition of Preparation Examples 1 to 5 containing the polydecane compounds of Examples 1 to 5 membrane. [Table 2] The results shown in Table 2 show that the film formed by the compositions of Comparative Preparation Examples 1 and 2 using the polydecane compounds of Comparative Examples 1 and 2 produced without using the nitrate-based compound produced microcracks and release. gas. On the other hand, the film formed by the compositions of Preparation Examples 1 to 5 containing the polydecane compounds of Examples 1 to 5 produced using the nitrate-based compound showed no microcracking, and the generation of outgassing was also suppressed. .

Claims (12)

A method for producing a polydecane compound, which comprises reacting a halodecane compound in the presence of a nitrate-based compound. The production method of claim 1, wherein the nitroxide compound is a compound comprising a structure represented by the following formula (A), [Chemical Formula 1] (In the formula (A), R ^a1 , R ^a2 , R ^a3 and R ^a4 are each independently a hydrogen atom or an organic group; R ^a1 and R ^a2 may be bonded to each other to form a ring; further, R ^a3 and R ^a4 may mutually Bonding to form a ring). The production method according to claim 1 or 2, wherein the above halodecane compound is further reacted in the presence of an alkali metal or magnesium. The production method according to claim 1 or 2, wherein the halodecane compound is a compound represented by the following formula (1), X _n SiR _{4 - n} (1) (wherein n is an integer of 2 to 4, n X is independently a halogen atom, and (4-n) R are each independently a hydrogen atom, an organic group or a decyl group). The production method according to claim 1 or 2, wherein the halodecane compound is further reacted in the presence of an organometallic complex represented by the following formula (B), [Chem. 2] (In the above formula (B), M represents a group selected from the group consisting of iron, silver, aluminum, lanthanum, cerium, cobalt, copper, lanthanum, cerium, lanthanum, gallium, lanthanum, cerium, lanthanum, indium, lanthanum, cerium, lanthanum, manganese. , molybdenum, niobium, nickel, niobium, palladium, rhodium, iridium, platinum, rhodium, iridium, ruthenium, iridium, osmium, tin, antimony, titanium, antimony, vanadium, chromium, antimony, bismuth, gold, mercury, tungsten, antimony a metal in the group consisting of zinc and zirconium, and R ^b1 independently represents a saturated hydrocarbon group, an unsaturated hydrocarbon group, an aromatic hydrocarbon group, an aralkyl group, an alkoxy group, an aryloxy group, an aralkyloxy group or an aryloxyalkyl group. R ^b2 represents a hydrogen atom, a saturated hydrocarbon group, an unsaturated hydrocarbon group, an aromatic hydrocarbon group or an aralkyl group; and p represents an integer of 1 or more). A process for producing a composition comprising a polydecane compound, which is produced by the method of any one of claims 1 to 5. The method of claim 6, wherein the above composition further comprises a nitrate-based compound. A method of producing a cured product of the composition, which is produced by the method of claim 6 or 7. A method for producing a cured substrate, which is produced by the method of claim 8. An anionic polymerization selection accelerator in the production of a polydecane compound, which comprises a nitrate-based compound comprising a structure represented by the following formula (A), [Chem. 3] (In the formula (A), R ^a1 , R ^a2 , R ^a3 and R ^a4 are each independently a hydrogen atom or an organic group; R ^a1 and R ^a2 may be bonded to each other to form a ring; further, R ^a3 and R ^a4 may mutually Bonding to form a ring). An accelerator according to claim 10 which causes charge spinning of a decyl radical cation produced in the production of a polydecane compound. An application of an anthranyl compound containing a structure represented by the following formula (A) for selectively promoting anionic polymerization in the production of a polydecane compound, [Chemical 4] (In the formula (A), R ^a1 , R ^a2 , R ^a3 and R ^a4 are each independently a hydrogen atom or an organic group; R ^a1 and R ^a2 may be bonded to each other to form a ring; further, R ^a3 and R ^a4 may mutually Bonding to form a ring).