TW201831700A - Copper alloy material for resistance member, manufacturing method therefor, and resistor - Google Patents

Copper alloy material for resistance member, manufacturing method therefor, and resistor Download PDF

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TW201831700A
TW201831700A TW106144750A TW106144750A TW201831700A TW 201831700 A TW201831700 A TW 201831700A TW 106144750 A TW106144750 A TW 106144750A TW 106144750 A TW106144750 A TW 106144750A TW 201831700 A TW201831700 A TW 201831700A
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copper alloy
alloy material
rolled sheet
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TWI704241B (en
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檀上翔一
秋谷俊太
藤井惠人
樋口優
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日商古河電氣工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/05Alloys based on copper with manganese as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C13/00Resistors not provided for elsewhere
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • B23K26/21Bonding by welding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Conductive Materials (AREA)
  • Metal Rolling (AREA)

Abstract

Provided are: a copper alloy material for a resistance member having favorable laser weldability, said copper alloy material being capable of easily obtaining a correct measured value in the measurement of electrical resistivity; and a method for manufacturing the copper alloy material. The copper alloy material for a resistance member is a rolled sheet having a thickness t of 0.04 mm or more when measured using a contact-type film thickness gauge, and the copper alloy material comprises 2-14 mass% of manganese with the remainder comprising copper and unavoidable impurities. Further, when the roughness curve in a direction orthogonal to the rolling direction is acquired using a contact-type surface roughness measurement technique, the sheet surface of the rolled sheet has a maximum height Rz of 0.3-1.5 [mu]m, an average length of roughness curve elements RSm of 0.03-0.15 mm, and a value of a parameter A of 0.002-0.04.

Description

電阻材料用銅合金材料及其製造方法、以及電阻器Copper alloy material for resistance material, manufacturing method thereof, and resistor

本發明關於電阻材料用銅合金材料及其製造方法、以及電阻器。The present invention relates to a copper alloy material for a resistance material, a manufacturing method thereof, and a resistor.

就用於電阻器之電阻材料的金屬材料而言,要求電阻溫度係數(temperature coefficient of resistance,以下,也記載為「TCR」)要低,以使電阻器的電阻在環境溫度變化時仍然穩定。所謂電阻溫度係數,是將由於溫度造成的電阻值變化的大小以每1℃相應的百萬分率來呈現,並以TCR(×10-6 /K)=(R-R0 )/R0 ×1/(T-T0 )×106 的算式來呈現。此處,算式中的T表示試驗溫度(℃),T0 表示基準溫度(℃),R表示在試驗溫度T時的電阻值(Ω),R0 表示在試驗溫度T0 時的電阻值(Ω)。Cu-Mn-Ni合金和Cu-Mn-Sn合金,其TCR非常低,因此被廣泛用作為構成電阻材料之金屬材料(例如,參照專利文獻1)。As for the metal material used for the resistance material of the resistor, the temperature coefficient of resistance (hereinafter also referred to as "TCR") is required to be low, so that the resistance of the resistor is stable when the ambient temperature changes. The so-called resistance temperature coefficient is to show the magnitude of the change in resistance value due to temperature in the corresponding millionths per 1 ° C, and use TCR (× 10 -6 / K) = (RR 0 ) / R 0 × 1 / (TT 0 ) × 10 6 . Here, the formula represents a test temperature T (deg.] C), T 0 represents a reference temperature (℃), R represents a resistance value ([Omega]) at the test temperature T, R 0 represents a test temperature in a resistance value T 0 ( Ω). Cu-Mn-Ni alloys and Cu-Mn-Sn alloys have very low TCR, and are therefore widely used as metallic materials constituting resistance materials (for example, refer to Patent Document 1).

在製造電阻器時,經常會將電阻材料與由無氧銅等所組成之導電材料加以熔接。就電阻材料與導電材料的熔接而言,以往一般是使用電子束熔接,但由於期待降低製造成本,故正朝向雷射熔接進行轉變。已知在雷射熔接中,若雷射在被熔接物的表面被反射,則熔接性會下降,因此被熔接物的表面粗糙度較粗則較有利。When manufacturing a resistor, the resistance material is often welded to a conductive material composed of oxygen-free copper and the like. In the welding of a resistance material and a conductive material, electron beam welding is generally used in the past. However, in order to reduce the manufacturing cost, transition is being made toward laser welding. It is known that in laser welding, if the laser is reflected on the surface of the object to be welded, the weldability is lowered, and therefore the rougher surface of the object to be welded is advantageous.

又,伴隨近年的電氣和電子零件的小型化和高集成化,電阻器也進行著小型化,於是電阻材料的板厚也逐漸變薄。以往,電阻材料的表面性狀(表面粗糙度等)給予電阻率的影響小而被忽視,但隨著電阻材料的板厚變薄,影響也變大至無法忽視的程度。亦即,以往,由加工性的觀點來看,在電阻材料的板厚測定中會使用測微器(micrometer),並由其測定值來獲得剖面積,但若電阻材料的表面粗糙度較粗,則從藉由測微器所得的測定值算出的電阻材料的表觀表面積,其與實際表面積之間的差值會變大,因此電阻率的測定值會變得比實際電阻率更大。隨之,製造電阻器時所需的電阻材料的尺寸與從電阻率的測定值算出的尺寸之間也會產生差異,因此在電阻器的設計方面會產生問題。 [先前技術文獻] (專利文獻)In addition, along with the miniaturization and high integration of electrical and electronic parts in recent years, resistors have also been miniaturized, and the thickness of resistive materials has gradually become thinner. Conventionally, the influence of the surface properties (surface roughness, etc.) of the resistive material on the resistivity has been neglected, but as the thickness of the resistive material becomes thinner, the influence becomes larger to an extent that it cannot be ignored. That is, in the past, from the viewpoint of processability, a micrometer was used to measure the thickness of the resistance material, and a cross-sectional area was obtained from the measured value. However, if the surface roughness of the resistance material is relatively rough , The difference between the apparent surface area of the resistive material calculated from the measured value obtained by the micrometer and the actual surface area will increase, so the measured value of the resistivity will become larger than the actual resistivity. As a result, there is also a difference between the size of the resistive material required when manufacturing the resistor and the size calculated from the measured value of the resistivity, and therefore a problem arises in the design of the resistor. [Prior Art Literature] (Patent Literature)

專利文獻1:日本特許公開公報 2016年第69724號Patent Document 1: Japanese Patent Laid-Open Gazette 2016 No. 69724

[發明所欲解決的問題] 本發明所欲解決的問題在於,提供一種電阻材料用銅合金材料及其製造方法,該電阻材料用銅合金材料在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。此外,本發明所欲解決的問題還在於提供一種電阻器,其具有正確的電阻值且容易製造。[Problems to be Solved by the Invention] A problem to be solved by the present invention is to provide a copper alloy material for a resistive material and a method for manufacturing the same. The copper alloy material for a resistive material can easily obtain accurate measurement values in the measurement of resistivity. And has good laser welding. In addition, the problem to be solved by the present invention is to provide a resistor which has a correct resistance value and is easy to manufacture.

[用於解決問題的技術手段] 本發明的一個態樣的電阻材料用銅合金材料,其含有2質量%以上且14質量%以下的錳,剩餘部分由銅及無法避免的雜質所組成,該電阻材料用銅合金材料的重點在於:該電阻材料用銅合金材料是軋延板,該軋延板在利用接觸式膜厚計作測定時,板厚t是0.04mm以上,針對軋延板的板面,藉由接觸式表面粗糙度測定法來取得相對於軋延方向成正交的方向上的粗糙度曲線,此時,最大高度Rz是0.3μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm是0.03mm以上且0.15mm以下,並且,藉由下述數學式算出的參數A的數值是0.002以上且0.04以下。[Technical means for solving the problem] One aspect of the present invention is a copper alloy material for a resistance material, which contains 2% by mass or more and 14% by mass or less of manganese, and the remainder is composed of copper and unavoidable impurities. The main point of the copper alloy material for resistance materials is that the copper alloy material for resistance materials is a rolled sheet. When the rolled sheet is measured by a contact film thickness meter, the thickness t is 0.04 mm or more. For the surface of the plate, a roughness curve in a direction orthogonal to the rolling direction is obtained by the contact surface roughness measurement method. At this time, the maximum height Rz is 0.3 μm or more and 1.5 μm or less. The average length RSm is 0.03 mm or more and 0.15 mm or less, and the value of the parameter A calculated by the following mathematical formula is 0.002 or more and 0.04 or less.

下述數學式中的ymax 是擷取部分中的最高峰的高度,該擷取部分是由粗糙度曲線在其平均線延伸的方向上僅擷取出基準長度l所得到。下述數學式中的yi 、yi+1 是在將擷取部分中存在的粗糙度曲線的測定點分別作為基準點時,從擷取部分的平均線延伸的方向上的一端算來第i個、第i+1個存在的基準點的高度。下述數學式中的xi 、xi+1 是擷取部分的平均線延伸的方向上的一端與第i個、第i+1個基準點之間的平均線延伸的方向上的長度。下述數學式中的n是表示距擷取部分的平均線延伸的方向上的一端最遠離的位置所存在的基準點是從擷取部分的平均線延伸的方向上的一端算來第幾個基準點的數值。下述數學式中的t是利用接觸式膜厚計作測定時的軋延板的板厚。In the following mathematical formula, y max is the height of the highest peak in the extracted portion, which is obtained by extracting only the reference length l in the direction in which the roughness curve extends. In the following mathematical formula, y i and y i + 1 are calculated from the one end in the direction in which the average line of the extraction portion extends when the measurement points of the roughness curve existing in the extraction portion are used as the reference points. The height of the i, i + 1th existing reference points. In the following mathematical formulas, x i and x i + 1 are lengths in the direction in which the average line between the one end of the extracted portion in the direction of extension of the average line and the ith and i + 1th reference points extend. In the following mathematical formula, n is a reference point indicating the position farthest from one end in the direction in which the average line of the extracted portion extends. The value of the reference point. In the following mathematical formula, t is the thickness of the rolled sheet when measured by a contact film thickness meter.

本發明的另一個態樣的電阻材料用銅合金材料的製造方法,其用於製造上述一個態樣的電阻材料用銅合金材料,該方法的重點在於具備:冷軋延步驟,其對銅合金的鑄塊施行冷軋延來成形為板狀以作成軋延板;再結晶退火步驟,其對利用冷軋延步驟所得到的軋延板施行再結晶退火;表面研磨步驟,其對利用再結晶退火步驟施行再結晶退火後的軋延板的板面,使用粒度#800以上且#2400以下的研磨顆粒來施行拋光研磨;以及,再冷軋延步驟,其對利用表面研磨步驟來研磨板面後的軋延板施行加工率超過0%且50%以下的冷軋延。 本發明的另外一個態樣的電阻器,其重點在於:利用上述一個態樣的電阻材料用銅合金材料來構成至少一部分而成。Another aspect of the present invention is a method for manufacturing a copper alloy material for a resistive material, which is used to manufacture the copper alloy material for a resistive material in the above aspect. The method focuses on including: a cold rolling step, The ingot is subjected to cold rolling to form a sheet shape to form a rolled sheet; a recrystallization annealing step that performs recrystallization annealing on the rolled sheet obtained by the cold rolling step; a surface grinding step that uses recrystallization The surface of the rolled sheet after the recrystallization annealing is performed in the annealing step, and polishing is performed using abrasive particles with a particle size of # 800 to # 2400; and, a cold rolling step is used to grind the surface of the sheet using the surface grinding step. The subsequent rolled sheet is subjected to cold rolling with a processing rate of more than 0% and less than 50%. The resistor of another aspect of the present invention is characterized in that at least a portion is formed by using the copper alloy material as the resistance material of the above aspect.

[發明的功效] 本發明的電阻材料用銅合金材料,其在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。 本發明的電阻材料用銅合金材料的製造方法,其能夠製造一種電阻材料用銅合金材料,該電阻材料用銅合金材料在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。 本發明的電阻器,其具有正確的電阻值且容易製造。[Effect of the Invention] The copper alloy material for a resistance material of the present invention can easily obtain accurate measurement values in the measurement of resistivity, and has good laser welding properties. The method for manufacturing a copper alloy material for a resistance material according to the present invention is capable of manufacturing a copper alloy material for a resistance material. The copper alloy material for a resistance material easily obtains a correct measurement value in the measurement of resistivity and has a good laser. Weldability. The resistor of the present invention has a correct resistance value and is easy to manufacture.

針對本發明的一實施型態,詳細說明如下。本實施型態的電阻材料用銅合金材料,其含有2質量%以上且14質量%以下的錳(Mn),剩餘部分由銅(Cu)及無法避免的雜質所組成。而且,本實施型態的電阻材料用銅合金材料是軋延板,該軋延板在利用接觸式膜厚計作測定時,板厚t是0.04mm以上。此外,針對軋延板的板面,藉由接觸式表面粗糙度測定法來取得相對於軋延方向成正交的方向上的粗糙度曲線,此時,最大高度Rz是0.3μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm是0.03mm以上且0.15mm以下,並且,藉由下述數學式算出的參數A的數值是0.002以上且0.04以下。A detailed description of an embodiment of the present invention is as follows. The copper alloy material for the resistance material of this embodiment mode contains 2% by mass to 14% by mass of manganese (Mn), and the remaining portion is composed of copper (Cu) and unavoidable impurities. In addition, the copper alloy material for a resistance material according to this embodiment is a rolled sheet. When the rolled sheet is measured by a contact film thickness meter, the thickness t is 0.04 mm or more. In addition, for the surface of the rolled sheet, a roughness curve in a direction orthogonal to the rolling direction is obtained by a contact surface roughness measurement method. At this time, the maximum height Rz is 0.3 μm or more and 1.5 μm. Hereinafter, the average length RSm of the roughness curve element is 0.03 mm or more and 0.15 mm or less, and the value of the parameter A calculated by the following mathematical formula is 0.002 or more and 0.04 or less.

下述數學式中的ymax 是擷取部分中的最高峰的高度,該擷取部分是由粗糙度曲線在其平均線延伸的方向上僅擷取出基準長度l所得到。下述數學式中的yi 、yi+1 是在將擷取部分中存在的粗糙度曲線的測定點分別作為基準點時,從擷取部分的平均線延伸的方向上的一端算來第i個、第i+1個存在的基準點的高度。下述數學式中的xi 、xi+1 是擷取部分的平均線延伸的方向上的一端與第i個、第i+1個基準點之間的平均線延伸的方向上的長度。下述數學式中的n是表示距擷取部分的平均線延伸的方向上的一端最遠離的位置所存在的基準點是從擷取部分的平均線延伸的方向上的一端算來第幾個基準點的數值。下述數學式中的t是利用接觸式膜厚計作測定時的軋延板的板厚。In the following mathematical formula, y max is the height of the highest peak in the extracted portion, which is obtained by extracting only the reference length l in the direction in which the roughness curve extends. In the following mathematical formula, y i and y i + 1 are calculated from the one end in the direction in which the average line of the extraction portion extends when the measurement points of the roughness curve existing in the extraction portion are used as reference points, respectively. The height of the i, i + 1th existing reference points. In the following mathematical formulas, x i and x i + 1 are lengths in the direction in which the average line between the one end of the extracted portion in the direction of extension of the average line and the i-th and i + 1-th reference points extend. In the following mathematical formula, n is a reference point indicating the position farthest from one end in the direction in which the average line of the extracted portion extends. The reference point is calculated from the end in the direction in which the average line of the extracted portion extends. The value of the reference point. In the following mathematical formula, t is the thickness of the rolled sheet when measured by a contact film thickness meter.

此本實施型態的電阻材料用銅合金材料,如上所述,其最大高度Rz、粗糙度曲線要素的平均長度RSm、參數A(以下,也將這些統整為「表面性狀」來記載)受到適當控制,因此,在電阻率的測定中容易獲得正確的電阻率,並且具有良好的雷射熔接性。因此,本實施型態的電阻材料用銅合金材料,其適合作為構成電阻材料之金屬材料,該電阻材料被使用於例如分路電阻器(shunt resistor)等電阻器。As described above, the copper alloy material for the resistance material of this embodiment is subjected to the maximum height Rz, the average length of the roughness curve element RSm, and the parameter A (hereinafter, these are also collectively described as "surface properties"). Appropriate control, therefore, it is easy to obtain accurate resistivity in the measurement of resistivity, and it has good laser weldability. Therefore, the copper alloy material for the resistance material of this embodiment is suitable as a metal material constituting the resistance material, and the resistance material is used for a resistor such as a shunt resistor.

本實施型態的電阻材料用銅合金材料,其具有如上所述的優良特性,因此利用本實施型態的電阻材料用銅合金材料來構成至少一部分而成的電阻器,其會具有正確的電阻值且容易製造。 以下,針對本實施型態的電阻材料用銅合金材料及電阻器,進一步作詳細說明。The copper alloy material for the resistance material of this embodiment has the excellent characteristics as described above. Therefore, a resistor formed by using the copper alloy material of the resistance material of this embodiment to form at least a part will have the correct resistance Value and easy to manufacture. Hereinafter, the copper alloy material and the resistor for the resistance material of this embodiment will be further described in detail.

本實施型態的電阻材料用銅合金材料,如上所述,其含有2質量%以上且14質量%以下的錳,剩餘部分由銅及無法避免的雜質所組成。錳的含量更佳是6質量%以上且14質量%以下。若錳的含量未滿2質量%,則會有TCR變大之虞,並且,會有材料強度下降而在製造時無法獲得所需的表面性狀之虞。另一方面,若錳的含量超過14質量%,則會有電阻率變高之虞,並且,會有耐蝕性與製造性下降之虞。又,會有材料強度變高而在製造時無法獲得所需的表面性狀之虞。As described above, the copper alloy material for the resistance material of this embodiment contains 2% by mass to 14% by mass of manganese, and the remaining portion is composed of copper and unavoidable impurities. The content of manganese is more preferably 6 mass% or more and 14 mass% or less. If the content of manganese is less than 2% by mass, the TCR may increase, and the strength of the material may be reduced, and the required surface properties may not be obtained during production. On the other hand, if the content of manganese exceeds 14% by mass, the resistivity may increase, and the corrosion resistance and manufacturability may decrease. In addition, there is a possibility that the material strength becomes high and a desired surface property cannot be obtained at the time of manufacture.

本實施型態的電阻材料用銅合金材料,其可進一步含有錳以外的合金成分。在本實施型態的電阻材料用銅合金材料中,可含有的其他合金成分並無特別限定,但例如是:選自由超過0質量%且3質量%以下的鎳(Ni)、超過0質量%且4質量%以下的錫(Sn)、超過0質量%且0.5質量%以下的鐵(Fe)、超過0質量%且0.1質量%以下的矽(Si)、超過0質量%且0.5質量%以下的鉻(Cr)、超過0質量%且0.2質量%以下的鋯(Zr)、超過0質量%且0.2質量%以下的鈦(Ti)、超過0質量%且0.5質量%以下的銀(Ag)、超過0質量%且0.5質量%以下的鎂(Mg)、超過0質量%且0.1質量%以下的鈷(Co)、超過0質量%且0.1質量%以下的磷(P)、以及超過0質量%且0.5質量%以下的鋅(Zn)所組成之群組的1種或2種以上的元素。 上述可含有的其他合金成分中,更佳是含有鎳及錫的至少一者。鎳的含量更佳是0.001質量%以上且3質量%以下,錫的含量更佳是0.001質量%以上且4質量%以下。The copper alloy material for a resistance material according to this embodiment may further contain an alloy component other than manganese. In the copper alloy material for a resistance material of this embodiment, other alloy components that can be contained are not particularly limited, but are selected from, for example, nickel (Ni) exceeding 0% by mass and 3% by mass or less, and exceeding 0% by mass. And 4 mass% of tin (Sn), 0 mass% and 0.5 mass% of iron (Fe), 0 mass% and 0.1 mass% of silicon (Si), more than 0 mass% and 0.5 mass% or less Chromium (Cr), zirconium (Zr) exceeding 0% by mass and 0.2% by mass, titanium (Ti) exceeding 0% by mass and 0.2% by mass, silver (Ag) exceeding 0% by mass and 0.5% by mass , Magnesium (Mg) exceeding 0% by mass and 0.5% by mass, cobalt (Co) exceeding 0% by mass and 0.1% by mass, phosphorus (P) exceeding 0% by mass and 0.1% by mass, and exceeding 0% by mass One or two or more elements in the group consisting of zinc (Zn) of 0.5% by mass or less. Among the other alloy components that can be contained, it is more preferable to contain at least one of nickel and tin. The content of nickel is more preferably 0.001% by mass to 3% by mass, and the content of tin is more preferably 0.001% by mass to 4% by mass.

藉由含有這些合金成分,能夠期待電阻材料用銅合金材料的材料強度提升、電阻率變化小、TCR下降、耐熱性提升等。若這些合金成分的含量超過上述範圍的上限值,則會有電阻材料用銅合金材料的電阻率變得太高、製造性下降等之虞。又,會有材料強度變高而在製造時無法獲得所需的表面性狀之虞。By including these alloy components, it is expected that the material strength of the copper alloy material for the resistance material is improved, the resistivity is small, the TCR is reduced, the heat resistance is improved, and the like. If the content of these alloy components exceeds the upper limit of the above range, the resistivity of the copper alloy material for a resistive material may become too high, and the manufacturability may decrease. In addition, there is a possibility that the material strength becomes high and a desired surface property cannot be obtained at the time of manufacture.

本實施型態的電阻材料用銅合金材料,如上所述,其是軋延板,該軋延板在利用接觸式膜厚計作測定時,板厚t是0.04mm以上。作為接觸式膜厚計,例如,能夠舉出測微器等。從利用接觸式膜厚計測得的板厚t,能夠算出軋延板(或是由電阻材料用銅合金材料製造出的電阻材料)的表觀剖面積。為了求取軋延板(或是由電阻材料用銅合金材料製造出的電阻材料)的實際剖面積,需要考慮軋延板的板面的表面性狀。As described above, the copper alloy material for a resistance material according to this embodiment is a rolled sheet. When the rolled sheet is measured with a contact-type film thickness meter, the thickness t is 0.04 mm or more. Examples of the contact-type film thickness meter include a micrometer. From the plate thickness t measured with a contact-type film thickness meter, the apparent cross-sectional area of a rolled sheet (or a resistance material made of a copper alloy material as a resistance material) can be calculated. In order to obtain the actual cross-sectional area of the rolled sheet (or a resistance material made of a copper alloy material of the resistance material), it is necessary to consider the surface properties of the surface of the rolled sheet.

若軋延板的板厚t未滿0.04mm,則表面性狀給予電阻率測定的影響會變大,因此會有變得難以精度良好地測定電阻率之虞。此外,會有雷射熔接變得困難而成為不易具有良好的雷射熔接性之虞。If the thickness t of the rolled sheet is less than 0.04 mm, the influence of the surface properties on the resistivity measurement will increase, and therefore it may become difficult to measure the resistivity with high accuracy. In addition, there is a possibility that laser welding becomes difficult and it becomes difficult to have good laser welding properties.

由於軋延板的板厚t越大,則表面性狀對於電阻率測定的影響會變得越小,所以會成為容易精度良好地測定電阻率,並且,雷射熔接性會成為良好。並且,雖然伴隨電阻器的小型化,也推進了電阻材料的厚度薄化,但表面性狀對於電阻率測定的影響變得顯著的板厚t是從0.3mm程度開始。The larger the thickness t of the rolled sheet, the smaller the influence of the surface properties on the resistivity measurement. Therefore, it is easy to measure the resistivity with good accuracy, and the laser weldability is improved. In addition, although the thickness of the resistance material has been promoted with the miniaturization of the resistor, the thickness t of the surface property that significantly affects the resistivity measurement starts from about 0.3 mm.

本實施型態的電阻材料用銅合金材料的表面性狀(軋延板的板面的表面性狀),如上所述,藉由接觸式表面粗糙度測定法來取得相對於軋延方向成正交的方向上的粗糙度曲線,此時,最大高度Rz是0.3μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm是0.03mm以上且0.15mm以下,並且,藉由上述數學式算出的參數A的數值是0.002以上且0.04以下。 不過,最大高度Rz更佳是0.5μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm更佳是0.03mm以上且0.1mm以下,並且,藉由上述數學式算出的參數A的數值是0.004以上且0.028以下。As described above, the surface texture of the copper alloy material for the resistance material of this embodiment (the surface texture of the rolled surface of the rolled sheet) is orthogonal to the rolling direction by the contact surface roughness measurement method. The roughness curve in the direction. At this time, the maximum height Rz is 0.3 μm or more and 1.5 μm or less, the average length RSm of the roughness curve element is 0.03 mm or more and 0.15 mm or less, and the parameter A calculated by the above mathematical formula The value is 0.002 or more and 0.04 or less. However, the maximum height Rz is more preferably 0.5 μm to 1.5 μm, the average length RSm of the roughness curve element is more preferably 0.03 mm to 0.1 mm, and the value of the parameter A calculated by the above mathematical formula is 0.004. Above and below 0.028.

若將最大高度Rz、粗糙度曲線要素的平均長度RSm、以及參數A全部設為在上述數值範圍內,則會成為一種電阻材料用銅合金材料,其在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。 在最大高度Rz未滿0.3μm的情況下,會有軋延板的板面太平滑而雷射熔接性下降之虞。另一方面,在最大高度Rz超過1.5μm的情況下,會有軋延板的板面變粗而無法正確測定電阻率之虞。If the maximum height Rz, the average length of the roughness curve element RSm, and the parameter A are all set within the above-mentioned numerical ranges, it will become a copper alloy material for resistance materials, and it is easy to obtain accurate measurements in the measurement of resistivity Value, and has good laser weldability. When the maximum height Rz is less than 0.3 μm, the surface of the rolled sheet may be too smooth and the laser weldability may be reduced. On the other hand, when the maximum height Rz exceeds 1.5 μm, the plate surface of the rolled sheet may become thick and the resistivity may not be accurately measured.

在粗糙度曲線要素的平均長度RSm未滿0.03mm的情況下,軋延板的板面存在的凹凸太多,因此會有無法正確測定電阻率之虞。另一方面,在粗糙度曲線要素的平均長度RSm超過0.15mm的情況下,軋延板的板面存在的凹凸太少,因此會有雷射熔接性下降之虞。When the average length RSm of the roughness curve element is less than 0.03 mm, there are too many irregularities on the surface of the rolled sheet, so that the resistivity may not be accurately measured. On the other hand, when the average length RSm of the roughness curve element exceeds 0.15 mm, there are too few irregularities in the plate surface of the rolled sheet, so there is a possibility that the laser weldability is lowered.

用於算出參數A的上述數學式,其呈現軋延板的表觀剖面積與由於板面的表面性狀的影響所造成的自實際剖面積增加的剖面積之間的關係,參數A的數值越大,意謂由於表面性狀的影響而產生的表觀剖面積與實際剖面積之間的差異越大。The above mathematical formula used to calculate the parameter A shows the relationship between the apparent cross-sectional area of the rolled sheet and the cross-sectional area increased from the actual cross-sectional area due to the influence of the surface texture of the plate surface. Large means that the difference between the apparent cross-sectional area and the actual cross-sectional area due to the influence of surface properties is greater.

此處,針對用於算出參數A的上述數學式,一邊參照第1圖,一邊作詳細說明。第1圖是表示本實施型態的軋延板的表面性狀之示意剖面圖,在X軸方向延伸的波浪線是軋延板的板面的粗糙度曲線。此粗糙度曲線的下方側表示軋延板的內部,上方側表示軋延板的外部。由此粗糙度曲線在X軸方向(亦即,粗糙度曲線的平均線延伸的方向)上僅擷取基準長度l所得的擷取部分中,存在複數個山峰與複數個凹谷,而在本實施型態中,將為了取得粗糙度曲線所進行的藉由接觸式表面粗糙度測得的測定點的任一者皆定義為基準點T。在接觸式表面粗糙度測定中,例如,以0.0005mm的間隔,獲得8000點的測定點(高度情報)。Here, the above-mentioned mathematical formula for calculating the parameter A will be described in detail while referring to FIG. 1. FIG. 1 is a schematic cross-sectional view showing the surface properties of the rolled plate according to the embodiment. The wavy lines extending in the X-axis direction are the roughness curves of the plate surface of the rolled plate. The lower side of the roughness curve indicates the inside of the rolled plate, and the upper side indicates the outside of the rolled plate. Therefore, in the X-axis direction (that is, the direction in which the average line of the roughness curve extends), only a reference length l is obtained in the extraction portion, and there are a plurality of peaks and a plurality of valleys. In the embodiment, any one of the measurement points measured by the contact surface roughness measurement to obtain a roughness curve is defined as the reference point T. In the contact surface roughness measurement, for example, 8000 measurement points (height information) are obtained at intervals of 0.0005 mm.

在第1圖的範例中,從擷取部分的X軸方向上的一端(左端)朝向另一端(右端),依序存在基準點T1 、T2 、T3 、T4 、…、Tn-1 、Tn 。而且,在第1圖所示的範例中,由於距擷取部分的X軸方向上的一端(左端)最遠離的位置所存在的山峰是最高峰,所以此山峰的頂點也就是基準點Tn-1 成為基準點Tmax 。並且,在第1圖中,基於方便說明上述算式,將山峰的頂點及谷底作為基準點來表示,但基準點並不限於山峰的頂點和谷底,也有位於山峰的頂點與谷底之間的點成為基準點的情況。In the example in FIG. 1 , the reference points T 1 , T 2 , T 3 , T 4 ,..., T n exist sequentially from one end (left end) in the X-axis direction of the extracted portion toward the other end (right end). -1 , T n . Moreover, in the example shown in FIG. 1, since the mountain peak located farthest from the one end (left end) in the X-axis direction of the captured portion is the highest peak, the vertex of this mountain peak is also the reference point T n -1 becomes the reference point T max . In addition, in FIG. 1, the vertices and bottoms of the mountain peaks are represented as reference points based on the above-mentioned formulas for convenience of explanation. However, the reference points are not limited to the vertices and bottoms of the mountain peaks. Reference point situation.

第1圖的y1 、y2 、y3 、y4 、…、yn-1 (ymax )、yn ,其表示基準點的高度(Y軸方向上的位置)。又,第1圖的x1 、x2 、x3 、x4 、…、xn-1 (xmax )、xn ,其是擷取部分的X軸方向上的一端(左端)與該基準點之間的X軸方向上的長度。因此,上述算式中的「xi+1 -xi 」是相鄰2個基準點之間的X軸方向上的距離,意謂第1圖中的施加有影陰線(hatching)的梯形部分的高度。Y 1 , y 2 , y 3 , y 4 , ..., y n-1 (y max ), y n in FIG. 1 indicate the height of the reference point (the position in the Y-axis direction). Furthermore, x 1 , x 2 , x 3 , x 4 , ..., x n-1 (x max ), x n in FIG. 1 are an end (left end) in the X-axis direction of the extracted portion and the reference The length in the X-axis direction between the points. Therefore, "x i + 1- x i " in the above formula is the distance in the X-axis direction between two adjacent reference points, which means that the trapezoidal part with hatching applied in the first figure height.

又,上述算式中的「(ymax -yi )」是從擷取部分的X軸方向上的一端(左端)算來第i個存在的基準點與基準點Tmax 之間的Y軸方向上的距離,意謂第1圖中的施加有影陰線的梯形部分的底邊長度。因此,上述算式中的「(ymax -yi )+(ymax -yi+1 )」,其意謂第1圖中的施加有影陰線的梯形部分的「上底與下底的總和」。The "(y max -y i )" in the above formula is the Y-axis direction between the i-th existing reference point and the reference point T max calculated from one end (left end) in the X-axis direction of the extracted portion. The upper distance means the length of the bottom edge of the trapezoidal part to which the shade line is applied in FIG. 1. Therefore, "(y max -y i ) + (y max -y i + 1 )" in the above formula means "the sum of the upper and lower bases of the trapezoidal part with the shaded line in Fig. 1 ".

因此,關於「0.5×{(ymax -yi ) + (ymax -yi+1 )}×(xi+1 -xi )」,若從i=1加總至i=n-1(亦即,若從距擷取部分的X軸方向上的一端(左端)最近的位置所存在的基準點T1 加總至最遠離的位置所存在的基準點Tn ),則成為針對軋延板的單面算出表觀剖面積與實際剖面積之間的差值。進一步,若將上述加總的結果乘以2倍,則成為針對軋延板的雙面算出表觀剖面積與實際剖面積之間的差值。藉由將此剖面積的差值除以利用接觸式膜厚計測得的軋延板的板厚t與基準長度l之乘積t×l(亦即,表觀剖面積)所算出的參數A,能夠評估由於表面性狀的影響所產生的表觀剖面積與實際剖面積之間的差異大小。Therefore, regarding "0.5 × {(y max -y i ) + (y max -y i + 1 )} × (x i + 1 -x i )", if i = 1 is added to i = n-1 (That is, if the reference point T 1 existing at the position closest to one end (left end) in the X-axis direction of the extraction portion is added up to the reference point T n existing at the furthest position), it becomes The difference between the apparent cross-sectional area and the actual cross-sectional area was calculated on one side of the extension plate. Further, when the result of the above-mentioned sum is multiplied by a factor of two, the difference between the apparent cross-sectional area and the actual cross-sectional area is calculated for both sides of the rolled sheet. The parameter A calculated by dividing the difference in cross-sectional area by the product t × l (ie, apparent cross-sectional area) of the product of the rolled plate thickness t and the reference length l measured with a contact film thickness meter, It is possible to evaluate the difference between the apparent cross-sectional area and the actual cross-sectional area due to the influence of surface properties.

若參數A的數值未滿0.002,則會有軋延板的板面太平滑而雷射熔接性下降之虞。另一方面,若參數A的數值超過0.04,則表觀表面積與實際表面積之間的差異會變大,因此會有無法正確測定電阻率之虞。If the value of parameter A is less than 0.002, the surface of the rolled sheet may be too smooth and the laser weldability may be reduced. On the other hand, if the value of the parameter A exceeds 0.04, the difference between the apparent surface area and the actual surface area becomes large, so that the resistivity may not be accurately measured.

隨後,針對本實施型態的電阻材料用銅合金材料的製造方法作說明。本實施型態的電阻材料用銅合金材料,其能夠藉由具備下述步驟的方法來製造:冷軋延步驟,其對銅合金的鑄塊施行冷軋延來成形為板狀以作成軋延板;再結晶退火步驟,其對利用冷軋延步驟所得到的軋延板施行再結晶退火;表面研磨步驟,其對利用再結晶退火步驟施行再結晶退火後的軋延板的板面,使用粒度#800以上且#2400以下的研磨顆粒來施行拋光研磨。Subsequently, a method for manufacturing a copper alloy material for a resistance material according to this embodiment will be described. The copper alloy material for the resistance material of this embodiment can be manufactured by a method having the following steps: a cold rolling step, which cold rolling is performed on a copper alloy ingot to form a sheet shape to form a rolling Plate; recrystallization annealing step, which performs recrystallization annealing on the rolled sheet obtained by the cold rolling step; surface grinding step, which uses the surface of the rolled sheet after recrystallization annealing using the recrystallization annealing step, to use Abrasive particles having a particle size of # 800 or more and # 2400 or less are used for polishing.

藉由這種製造方法,能夠製造本實施型態的電阻材料用銅合金材料,其在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。 以下,作為一個範例,表示本實施型態的電阻材料用銅合金材料的製造方法的更具體的範例。With this manufacturing method, a copper alloy material for a resistive material of the present embodiment can be manufactured, which is easy to obtain accurate measured values during resistivity measurement, and has good laser welding properties. Hereinafter, a more specific example of a method for manufacturing a copper alloy material for a resistance material according to this embodiment will be described as an example.

首先,使用爐等來熔解原料後加以鑄造,而獲得具有上述合金成分之鑄塊(鑄造步驟)。隨後,將利用鑄造步驟所獲得的鑄塊作熱處理來使合金成分均質化(均質化熱處理步驟)。均質化熱處理步驟中的熱處理條件,其可依據合金組成來適當設定,但作為一個範例,能夠舉出在800℃以上且950℃以下歷時10分鐘以上且10小時以下之條件。若加熱溫度太高、加熱時間太長之類的話,則會有電阻材料用銅合金材料的加工性下降之虞。另一方面,若加熱溫度太低、加熱時間太短之類的話,則會有合金成分的均質化變得不足之虞。First, a raw material is melted using a furnace or the like and cast to obtain an ingot having the above alloy composition (casting step). Subsequently, the ingot obtained by the casting step is subjected to heat treatment to homogenize the alloy composition (homogenization heat treatment step). The heat treatment conditions in the homogenization heat treatment step can be appropriately set depending on the alloy composition. As an example, conditions of 800 ° C. or higher and 950 ° C. or lower for 10 minutes or longer and 10 hours or shorter can be mentioned. If the heating temperature is too high and the heating time is too long, the workability of the copper alloy material for resistance materials may be reduced. On the other hand, if the heating temperature is too low and the heating time is too short, the homogenization of the alloy components may become insufficient.

隨後,對藉由均質化熱處理步驟而被均質化後的鑄塊施行熱軋延,以將鑄塊成形為板狀物(熱軋延步驟)。由於均質化熱處理步驟剛結束後的鑄塊是已被加熱至高溫的狀態,故較佳是就此連續地移送至熱軋延步驟來實施熱軋延。若熱軋延結束,則將鑄塊的板狀物冷卻至常溫。由於在熱軋延步驟後的板狀物的表面形成有氧化皮膜,故將此氧化皮膜去除(表面磨削步驟)。Subsequently, the ingot homogenized by the homogenization heat treatment step is subjected to hot rolling to form the ingot into a plate (hot rolling step). Since the ingot immediately after the homogenization heat treatment step has been heated to a high temperature, it is preferably continuously transferred to the hot rolling step for hot rolling. When the hot rolling is completed, the plate-like object of the ingot is cooled to normal temperature. Since an oxide film is formed on the surface of the plate after the hot rolling step, this oxide film is removed (surface grinding step).

隨後,對已去除氧化皮膜後的板狀物施行冷軋延(冷軋延步驟)。例如,將板狀物作冷軋延來薄化板厚以作成軋延板。冷軋延步驟的軋延方向設為與熱軋延步驟的軋延方向同一方向。冷軋延的加工率並無特別限定,但能夠設為例如50%以上。若在冷軋延步驟中的加工率是50%以上,則藉由在後續的再結晶退火步驟中利用適當的條件來退火,能夠將直到熱軋延步驟為止所獲得的材料組織充分地微細化,因此最終所獲得的結晶粒徑不會變得太大而容易成為適當的大小。Subsequently, the plate-shaped object from which the oxide film has been removed is subjected to cold rolling (cold rolling step). For example, a sheet is cold rolled to reduce the thickness of the sheet to form a rolled sheet. The rolling direction in the cold rolling step is the same direction as the rolling direction in the hot rolling step. The working ratio of cold rolling is not particularly limited, but can be set to, for example, 50% or more. If the processing rate in the cold rolling step is 50% or more, by using appropriate conditions for annealing in the subsequent recrystallization annealing step, it is possible to sufficiently refine the material structure obtained up to the hot rolling step. Therefore, the crystal grain size finally obtained does not become too large and easily becomes an appropriate size.

隨後,對利用冷軋延步驟所獲得的軋延板作熱處理,以施行再結晶退火(再結晶退火步驟)。再結晶退火步驟中的熱處理條件,其可依據合金組成等來適當設定,但作為一個範例,能夠舉出在350℃以上且700℃以下歷時10秒以上且10小時以下之條件。若加熱溫度太高、加熱時間太長之類的話,則會有無法將直到熱軋延步驟為止所獲得的材料組織充分地微細化而無法減小最終所獲得的結晶粒徑之虞。另一方面,若加熱溫度太低、加熱時間太短之類的話,則會有無法獲得再結晶組織、或是再結晶組織變得過小而最終所獲得的結晶粒徑變小之虞。就此熱處理而言,可使用將軋延板放入爐內後加以升溫之批次熱處理,也可使用使軋延板連續地通過已升溫的爐內之移動式(traveling)熱處理。Subsequently, the rolled sheet obtained by the cold rolling step is heat-treated to perform recrystallization annealing (recrystallization annealing step). The heat treatment conditions in the recrystallization annealing step can be appropriately set depending on the alloy composition and the like. As an example, conditions of 350 ° C. or higher and 700 ° C. or lower for 10 seconds or longer and 10 hours or shorter can be mentioned. If the heating temperature is too high and the heating time is too long, there is a possibility that the material structure obtained until the hot rolling step cannot be sufficiently refined and the crystal grain size finally obtained may not be reduced. On the other hand, if the heating temperature is too low and the heating time is too short, there is a possibility that a recrystallized structure cannot be obtained, or the recrystallized structure becomes too small, and the crystal grain size finally obtained may become small. This heat treatment may be a batch heat treatment in which the rolled sheet is placed in a furnace and then heated, or a traveling heat treatment may be used in which the rolled sheet is continuously passed through a heated furnace.

隨後,對利用再結晶退火步驟施行再結晶退火後的軋延板的板面,使用粒度#800以上且#2400以下的研磨顆粒來施行拋光研磨(表面研磨步驟)。拋光研磨的研磨方向也就是軋延板的板面與拋光研磨輪(buff)之間的相對移動方向,其設為與冷軋延步驟的軋延方向及熱軋延步驟的軋延方向同一方向。若研磨顆粒的粒度未滿#800,則會有軋延板的板面變得太粗而無法獲得所需的表面性狀之虞。另一方面,若研磨顆粒的粒度超過#2400,則會有軋延板的板面變得太平滑而無法獲得所需的表面性狀之虞。Subsequently, the rolled surface of the rolled sheet subjected to the recrystallization annealing in the recrystallization annealing step is polished with a grain size of # 800 or more and # 2400 or less (surface grinding step). The grinding direction of the polishing and grinding is the relative moving direction between the plate surface of the rolled plate and the buff. It is set to be the same direction as the rolling direction of the cold rolling step and the rolling direction of the hot rolling step. . If the particle size of the abrasive particles is less than # 800, the surface of the rolled sheet may become too coarse, and the desired surface properties may not be obtained. On the other hand, if the particle size of the abrasive particles exceeds # 2400, the plate surface of the rolled sheet may become too smooth and the desired surface properties may not be obtained.

隨後,對利用表面研磨步驟來研磨板面後的軋延板,施行加工率超過0%且50%以下的冷軋延(再冷軋延步驟)。例如,將軋延板作冷軋延,以進一步薄化板厚來作成所需的厚度。若在再冷軋延步驟中的加工率超過50%,則會有在表面研磨步驟中形成的板面凹凸由於冷軋延而壓垮的情況,故會有無法獲得所需的表面性狀之虞。Subsequently, the rolled sheet after the sheet surface is ground by the surface grinding step is subjected to cold rolling (re-cold rolling step) with a working ratio of more than 0% to 50%. For example, a rolled sheet is cold-rolled to further reduce the thickness of the sheet to a desired thickness. If the processing rate in the re-cold rolling step exceeds 50%, the unevenness of the plate surface formed in the surface grinding step may be crushed due to the cold rolling, so that the required surface properties may not be obtained. .

並且,亦可不進行此再冷軋延步驟。亦即,可不進行再冷軋延步驟,而將在表面研磨步驟後所施行之加工的加工率設為0%。 又,再冷軋延步驟的軋延方向,其設為與冷軋延步驟的軋延方向、熱軋延步驟的軋延方向、以及拋光研磨的研磨方向同一方向。然後,在軋延板製造後,針對其板面,取得相對於軋延方向成正交的方向上的粗糙度曲線,不過,此軋延方向意謂在表面研磨步驟前所進行的冷軋延步驟的軋延方向或再冷軋延步驟的軋延方向。Moreover, this re-cold rolling step may not be performed. That is, the re-cold rolling step may not be performed, and the processing rate of the processing performed after the surface grinding step may be set to 0%. The rolling direction in the re-cold rolling step is the same direction as the rolling direction in the cold rolling step, the rolling direction in the hot rolling step, and the polishing direction of polishing. Then, after the rolled sheet is manufactured, a roughness curve in a direction orthogonal to the rolling direction is obtained for the surface of the rolled sheet. However, the rolling direction means cold rolling before the surface grinding step. The rolling direction of the step or the rolling direction of the re-cold rolling step.

藉由具備如上所述的步驟之製造方法,能夠製造一種具有上述表面性狀之軋延板。藉由表面研磨步驟與再冷軋延步驟,會獲得上述表面性狀。不過,在表面研磨步驟前進行的冷軋延步驟與再結晶退火步驟,其可以各進行一次,也可以在進行表面研磨步驟前各自重複進行複數次。又,若在鑄造步驟中採用水平式連續鑄造法(horizontal continuous casting method),來在鑄造步驟中將鑄塊成形為板狀物,則能夠省略均質化熱處理步驟與熱軋延步驟。又,在相鄰步驟與步驟之間或最終步驟(表面研磨步驟或再冷軋延步驟)後,可實施矯正形狀、去除氧化膜、脫脂、防鏽等處理。不過,在表面研磨步驟或再冷軋延步驟後實施的情況下,需要以表面性狀不超出本發明的範圍的方式來進行。By the manufacturing method provided with the steps as described above, a rolled sheet having the above-mentioned surface properties can be manufactured. Through the surface grinding step and the re-cold rolling step, the above-mentioned surface properties are obtained. However, the cold rolling step and the recrystallization annealing step performed before the surface polishing step may be performed once each, or may be repeatedly performed a plurality of times before the surface polishing step is performed. In addition, if a horizontal continuous casting method is used in the casting step to form the ingot into a plate in the casting step, the homogenizing heat treatment step and hot rolling step can be omitted. In addition, treatments such as shape correction, oxide film removal, degreasing, and rust prevention may be performed between adjacent steps and steps or after the final step (surface grinding step or cold rolling step). However, when it is implemented after the surface grinding step or the re-cold rolling step, it is necessary to perform it in such a way that the surface properties do not exceed the scope of the present invention.

並且,本實施型態表示本發明的一個範例,本發明並非僅限於本實施形態。又,可對本實施型態加入各種變更或改良,此加入多樣變更或改良後的型態亦包含於本發明中。 [實施例]In addition, this embodiment mode is an example of the present invention, and the present invention is not limited to this embodiment. In addition, various changes or improvements can be added to the embodiment, and the modified and added modes are also included in the present invention. [Example]

以下,表示實施例及比較例來進一步具體說明本發明。 藉由鑄造來製造具有預定合金組成之鑄塊(鑄造步驟),並在800℃以上且950℃以下施行熱處理10分鐘以上且10小時以下來將合金成分作均質化後(均質化熱處理步驟),藉由熱軋延成形為板狀並進行水冷(熱軋延步驟)。隨後,在對藉由熱軋延所獲得的板狀物施行表面磨削來去除表面的氧化皮膜後(表面磨削步驟),以50%以上的加工率來將板狀物作冷軋延,以薄化板厚而作成軋延板(冷軋延步驟)。Hereinafter, the present invention will be described more specifically by showing examples and comparative examples. After casting to produce an ingot having a predetermined alloy composition (casting step), and performing heat treatment at 800 ° C or higher and 950 ° C or lower for 10 minutes or more and 10 hours or less to homogenize the alloy components (homogenization heat treatment step), It is formed into a plate shape by hot rolling and water-cooled (hot rolling step). Subsequently, the surface of the plate obtained by hot rolling is subjected to surface grinding to remove the oxide film on the surface (surface grinding step), and the plate is cold rolled at a processing rate of 50% or more. The rolled sheet is made by reducing the thickness of the sheet (cold rolling step).

隨後,將此軋延板利用350℃以上且700℃以下並歷時10秒以上且10小時以下之條件來熱處理而施行再結晶退火後(再結晶退火步驟),使用研磨顆粒來對軋延板的板面施行拋光研磨(表面研磨步驟)。進一步,接著,對施行拋光研磨後的軋延板,施行加工率0%以上且60%以下的冷軋延(再冷軋延步驟),而獲得厚度0.04mm以上且0.3mm以下的軋延板。Subsequently, this rolled sheet is heat-treated under conditions of 350 ° C to 700 ° C for 10 seconds to 10 hours, and then subjected to recrystallization annealing (recrystallization annealing step). The surface of the board is polished (surface grinding step). Further, the rolled sheet after the polishing and grinding is subjected to cold rolling (re-cold rolling step) with a processing rate of 0% to 60%, to obtain a rolled sheet having a thickness of 0.04mm to 0.3mm. .

合金組成如表1、2所示,而表1、2所示的合金成分以外的剩餘部分是銅及無法避免的雜質。又,表面研磨步驟中所使用的研磨顆粒的粒度、再冷軋延步驟中的冷軋延的加工率、以及所獲得的軋延板利用接觸式膜厚計測得的板厚如表1、2所示。表1是表示將合金組成作各種變更後的情況的範例,表2是表示將表面研磨步驟及再冷軋延步驟的條件作各種變更後的情況的範例。並且,相較於表2的製造條件,表1的製造條件更佳。The alloy composition is shown in Tables 1 and 2, and the remainder other than the alloy components shown in Tables 1 and 2 are copper and unavoidable impurities. Tables 1 and 2 show the particle size of the abrasive particles used in the surface polishing step, the processing rate of the cold rolling in the re-cold rolling step, and the thickness of the obtained rolled sheet measured by a contact film thickness meter. As shown. Table 1 is an example showing a case where the alloy composition is changed variously, and Table 2 is an example showing a case where the conditions of the surface polishing step and the re-cold rolling step are changed variously. Moreover, compared with the manufacturing conditions of Table 2, the manufacturing conditions of Table 1 are more favorable.

[表1] [Table 1]

[表2] [Table 2]

針對表1、2所示的實施例1~27及比較例1~14的軋延板進行各種評估。以下,說明其內容與方法。又,將評估結果表示於表1、2中。 <關於表面性狀的評估> 針對軋延板的板面,藉由一種根據JIS B0601(2001)規定的方法而實行之方法(接觸式表面粗糙度測定法),來進行表面粗糙度的測定,而取得相對於軋延方向成正交的方向上的粗糙度曲線,並獲得最大高度Rz及粗糙度曲線要素的平均長度RSm,並且,分析粗糙度曲線來獲得藉由上述數學式算出的參數A的數值。The rolled sheets of Examples 1 to 27 and Comparative Examples 1 to 14 shown in Tables 1 and 2 were subjected to various evaluations. The content and method are described below. The evaluation results are shown in Tables 1 and 2. < Evaluation of surface properties > The surface roughness of a rolled sheet is measured by a method (contact surface roughness measurement method) implemented in accordance with a method prescribed in JIS B0601 (2001), and Obtain a roughness curve in a direction orthogonal to the rolling direction, obtain the maximum height Rz and the average length of the roughness curve element RSm, and analyze the roughness curve to obtain the parameter A calculated by the above mathematical formula. Value.

針對上述接觸式表面粗糙度測定法來詳述。使軋延板的板面接觸直徑2μm的探針,以探針的滑動距離(sliding distance)4mm且滑動速度0.1mm/s之條件,使探針在相對於軋延方向成正交的方向上滑動。然後,以0.0005mm間隔來獲得8000點的測定點(高度情報),藉此取得粗糙度曲線。並且,截止值(cut-off value)是0.8mm。The above-mentioned contact surface roughness measurement method will be described in detail. The rolling surface of the rolled sheet was brought into contact with a probe having a diameter of 2 μm, and the sliding distance of the probe was 4 mm and the sliding speed was 0.1 mm / s, so that the probe was in a direction orthogonal to the rolling direction. slide. Then, 8000 measurement points (height information) were obtained at intervals of 0.0005 mm, thereby obtaining a roughness curve. The cut-off value is 0.8 mm.

<關於電阻率的測定> 對軋延板的板面施行鏡面研磨,分別針對鏡面研磨前後的軋延板,藉由一種根據JIS C2525規定的方法而實行之方法(四端點法,four‐terminal method),來測定在20℃的電阻率。軋延板的板厚是利用測微器來測定。然後,鏡面研磨前後的電阻率的差值是2%以下的情況,判定為在電阻率的測定中容易獲得正確的測定值,並以「○」符號表示於表1中。另一方面,鏡面研磨前後的電阻率的差值超過2%的情況,則判定為在電阻率的測定中不易獲得正確的測定值,並以「×」符號表示於表1中。< Measurement of resistivity > The surface of rolled sheet is mirror polished, and the rolled sheet before and after mirror polishing is implemented by a method according to JIS C2525 (four-terminal method, four-terminal method) to determine the resistivity at 20 ° C. The thickness of the rolled sheet is measured using a micrometer. Then, when the difference in resistivity before and after mirror polishing is 2% or less, it is determined that accurate measurement values are easily obtained in the measurement of resistivity, and are shown in Table 1 with "○" symbols. On the other hand, when the difference in resistivity before and after mirror polishing exceeds 2%, it is determined that it is not easy to obtain a correct measurement value in the measurement of resistivity, and the symbol “×” is shown in Table 1.

並且,鏡面研磨後的軋延板,其表觀剖面積與實際剖面積之間的差值小,因此能夠獲得更接近材料的實際電阻率之電阻率。鏡面研磨後的軋延板的板面的表面性狀,其最大高度Rz是0.1~0.3μm,粗糙度曲線要素的平均長度RSm是0.2~0.5mm,參數A的數值是0.001~0.002。In addition, the rolled plate after mirror polishing has a small difference between the apparent cross-sectional area and the actual cross-sectional area, so that a resistivity closer to the actual resistivity of the material can be obtained. The surface texture of the rolled surface of the rolled plate after mirror polishing has a maximum height Rz of 0.1 to 0.3 μm, an average length RSm of the roughness curve element of 0.2 to 0.5 mm, and a parameter A value of 0.001 to 0.002.

<關於雷射熔接性的評估> 將由軋延板與無氧銅組成之導電材料對接後,將其界面利用光纖雷射(fiber laser)熔接來加以熔接。熔接後,對於已熔接的短條狀試片,藉由一種根據JIS Z2241規定的方法而實行之方法,來實施在相對於熔接方向成正交的方向上拉伸的拉伸試驗。然後,試片的破斷強度是150MPa以上的情況,判定為雷射熔接性良好,並以「○」符號表示於表1中。另一方面,試片的破斷強度未滿150MPa的情況,判定為雷射熔接性不良,並以「×」符號表示於表1中。< Evaluation of Laser Weldability > The conductive material composed of rolled sheet and oxygen-free copper was butt-joined, and the interface was welded by fiber laser welding. After welding, a short test strip that has been welded is subjected to a tensile test in a direction orthogonal to the welding direction by a method implemented in accordance with JIS Z2241. Then, when the breaking strength of the test piece was 150 MPa or more, it was determined that the laser weldability was good, and the symbol "○" is shown in Table 1. On the other hand, when the breaking strength of the test piece was less than 150 MPa, it was determined that the laser weldability was poor, and the symbol “×” is shown in Table 1.

由表1、2所示的結果可知,實施例1~27的軋延板,其最大高度Rz是0.3μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm是0.03mm以上且0.15mm以下,參數A的數值是0.002以上且0.04以下,因此在電阻率的測定中容易獲得正確的測定值,並且具有良好的雷射熔接性。From the results shown in Tables 1 and 2, it can be seen that the rolled plate of Examples 1 to 27 has a maximum height Rz of 0.3 μm or more and 1.5 μm or less, and an average length RSm of the roughness curve element is 0.03 mm or more and 0.15 mm or less. The value of parameter A is 0.002 or more and 0.04 or less. Therefore, it is easy to obtain accurate measurement values in the measurement of resistivity, and it has good laser welding properties.

相較於此,比較例1、2的軋延板是合金組成超出本發明的範圍的範例,最大高度Rz、粗糙度曲線要素的平均長度RSm、以及參數A的數值的任一者自上述範圍超出,因此在電阻率的測定中不易獲得正確的測定值、或是雷射熔接性不良。In contrast, the rolled sheets of Comparative Examples 1 and 2 are examples in which the alloy composition exceeds the range of the present invention. Any of the maximum height Rz, the average length of the roughness curve element RSm, and the value of the parameter A is from the above range. If it exceeds this value, it is not easy to obtain accurate measurement values during the measurement of resistivity, or the laser weldability is poor.

比較例3~6、比較例8~12及比較例14的軋延板,是製造條件超出本發明的範圍的實例,最大高度Rz、粗糙度曲線要素的平均長度RSm、以及參數A的數值的任一者自上述範圍超出,因此在電阻率的測定中不易獲得正確的測定值、或是雷射熔接性不良。 比較例7、13的軋延板,其板厚超出本發明的範圍,因此雷射熔接性不良。又,參數A的數值自上述範圍超出,因此在電阻率的測定中不易獲得正確的測定值。The rolled sheets of Comparative Examples 3 to 6, Comparative Examples 8 to 12, and Comparative Example 14 are examples in which the manufacturing conditions are outside the scope of the present invention. The maximum height Rz, the average length of the roughness curve element RSm, and the value of parameter A Since any of them is out of the above range, it is difficult to obtain an accurate measurement value during the measurement of resistivity, or the laser weldability is poor. In the rolled sheets of Comparative Examples 7 and 13, the sheet thickness was outside the range of the present invention, so the laser weldability was poor. Moreover, since the numerical value of the parameter A exceeds the said range, it is difficult to obtain an accurate measured value in the measurement of resistivity.

x1、x2、x3、x4、…、xn-1(xmax)、xn‧‧‧長度x 1 , x 2 , x 3 , x 4 , ..., x n-1 (x max ), x n ‧‧‧ length

y1、y2、y3、y4、…、yn-1(ymax)、yn‧‧‧高度y 1 , y 2 , y 3 , y 4 , ..., y n-1 (y max ), y n ‧‧‧ height

T1、T2、T3、T4、…、Tn-1、Tn‧‧‧基準點T 1 , T 2 , T 3 , T 4 , ..., T n-1 , T n ‧‧‧ reference points

l‧‧‧基準長度 l‧‧‧ reference length

第1圖是說明本發明的電阻材料用銅合金材料的一實施型態之示意說明圖。FIG. 1 is a schematic explanatory diagram illustrating an embodiment of a copper alloy material for a resistance material according to the present invention.

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Claims (4)

一種電阻材料用銅合金材料,其含有2質量%以上且14質量%以下的錳,剩餘部分由銅及無法避免的雜質所組成,其中, 該電阻材料用銅合金材料是軋延板,該軋延板在利用接觸式膜厚計作測定時,板厚t是0.04mm以上, 針對前述軋延板的板面,藉由接觸式表面粗糙度測定法來取得相對於軋延方向成正交的方向上的粗糙度曲線,此時,最大高度Rz是0.3μm以上且1.5μm以下,粗糙度曲線要素的平均長度RSm是0.03mm以上且0.15mm以下,並且,藉由下述數學式算出的參數A的數值是0.002以上且0.04以下;其中,下述數學式中的ymax 是擷取部分中的最高峰的高度,該擷取部分是由前述粗糙度曲線在其平均線延伸的方向上僅擷取出基準長度l所得到;下述數學式中的yi 、yi+1 是在將前述擷取部分中存在的前述粗糙度曲線的測定點分別作為基準點時,從前述擷取部分的平均線延伸的方向上的一端算來第i個、第i+1個存在的基準點的高度;下述數學式中的xi 、xi+1 是前述擷取部分的平均線延伸的方向上的一端與第i個、第i+1個基準點之間的平均線延伸的方向上的長度;下述數學式中的n是表示距前述擷取部分的平均線延伸的方向上的一端最遠離的位置所存在的基準點是從前述擷取部分的平均線延伸的方向上的一端算來第幾個基準點的數值;下述數學式中的t是利用接觸式膜厚計作測定時的前述軋延板的板厚,A copper alloy material for resistance material, which contains 2% by mass to 14% by mass of manganese, and the remaining portion is composed of copper and unavoidable impurities. The copper alloy material for the resistance material is a rolled sheet. When a rolled sheet is measured using a contact film thickness meter, the sheet thickness t is 0.04 mm or more. For the sheet surface of the rolled sheet, a contact surface roughness measurement method is used to obtain orthogonality with respect to the rolled direction. The roughness curve in the direction. At this time, the maximum height Rz is 0.3 μm or more and 1.5 μm or less. The average length RSm of the roughness curve element is 0.03 mm or more and 0.15 mm or less. The parameter is calculated by the following mathematical formula. The value of A is 0.002 or more and 0.04 or less; wherein, y max in the following mathematical formula is the height of the highest peak in the extracted portion, which is obtained from the roughness curve only in the direction in which the average line extends. It is obtained by extracting the reference length l. In the following mathematical formulas, y i and y i + 1 are obtained when the measurement points of the roughness curve existing in the extraction portion are used as reference points, respectively. Average line extension One end of the direction of the i-th calculation, the height of the i + 1 the presence of the reference point; in the following equation x i, x i + 1 is the end in the direction of the average line and fetch portion extending The length in the direction in which the average line extends between the i-th and i + 1-th reference points; n in the following mathematical formula represents the position farthest from one end in the direction in which the average line of the aforementioned extraction portion extends. The existing reference point is a number of reference points calculated from one end in the direction in which the average line of the above-mentioned extracted portion extends; t in the following mathematical formula is the aforesaid rolling when measured using a contact film thickness meter. Plate thickness . 如請求項1所述的電阻材料用銅合金材料,其中,進一步含有:選自由超過0質量%且3質量%以下的鎳、超過0質量%且4質量%以下的錫、超過0質量%且0.5質量%以下的鐵、超過0質量%且0.1質量%以下的矽、超過0質量%且0.5質量%以下的鉻、超過0質量%且0.2質量%以下的鋯、超過0質量%且0.2質量%以下的鈦、超過0質量%且0.5質量%以下的銀、超過0質量%且0.5質量%以下的鎂、超過0質量%且0.1質量%以下的鈷、超過0質量%且0.1質量%以下的磷、以及超過0質量%且0.5質量%以下的鋅所組成之群組的1種或2種以上的元素。The copper alloy material for resistance materials according to claim 1, further comprising: selected from the group consisting of nickel exceeding 0% by mass and 3% by mass, tin exceeding 0% by mass and 4% by mass, and exceeding 0% by mass, and 0.5% by mass or less of iron, more than 0% by mass and 0.1% by mass of silicon, more than 0% by mass of 0.5% by mass of chromium, more than 0% by mass of 0.2% by mass of zirconium, more than 0% by mass and 0.2% of mass % Or less of titanium, silver of more than 0% by mass and 0.5% by mass, magnesium of more than 0% by mass and 0.5% by mass, cobalt of more than 0% by mass and 0.1% by mass, and more than 0% by mass of 0.1% by mass One or two or more elements in a group consisting of phosphorus and zinc in an amount of more than 0% by mass and 0.5% by mass or less. 一種電阻材料用銅合金材料的製造方法,其用於製造如請求項1或請求項2所述的電阻材料用銅合金材料,該方法具備: 冷軋延步驟,其對銅合金的鑄塊施行冷軋延來成形為板狀以作成軋延板; 再結晶退火步驟,其對利用前述冷軋延步驟所得到的軋延板施行再結晶退火; 表面研磨步驟,其對利用前述再結晶退火步驟施行再結晶退火後的軋延板的板面,使用粒度#800以上且#2400以下的研磨顆粒來施行拋光研磨;以及, 再冷軋延步驟,其對利用前述表面研磨步驟來研磨板面後的軋延板施行加工率超過0%且50%以下的冷軋延。A method for manufacturing a copper alloy material for a resistive material, which is used for manufacturing the copper alloy material for a resistive material according to claim 1 or claim 2, the method comprising: a cold rolling step, which is performed on a copper alloy ingot Cold rolling is formed into a plate shape to form a rolled sheet; a recrystallization annealing step that performs recrystallization annealing on the rolled sheet obtained by using the aforementioned cold rolling step; a surface grinding step that uses the aforementioned recrystallization annealing step After the recrystallization annealing is performed, the surface of the rolled sheet is polished using abrasive particles having a particle size of # 800 to # 2400; and, a cold rolling step is performed after the surface of the sheet is ground using the aforementioned surface grinding step. The rolled sheet is cold rolled with a processing rate of more than 0% and less than 50%. 一種電阻器,其利用如請求項1或請求項2所述的電阻材料用銅合金材料來構成至少一部分而成。A resistor is formed by using at least a part of a copper alloy material for a resistance material according to claim 1 or claim 2.
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