TW201820521A - Board rotary device and board processing apparatus - Google Patents

Abstract

To provide a board rotary device easier to maintain, and reducing pollutant source in a container. A board rotary device 10 has an outer frame 20 including magnetic field generating means, and capable of rotating a generated magnetic field around the medial axis, a container 40 placed on the inside of the outer frame, an inner frame 50 placed in the container, and including a board 60 holding means and magnets or ferromagnetic materials distributed in the circumferential direction, magnetic coupling means for magnetically coupling the outer frame and inner frame, floating the inner frame, and rotating the inner frame while following rotation change of the magnetic field, and gap adjustment means for keeping a constant interval of the outer and inner frames, and maintaining the inner frame concentrically to the outer frame.

Description

Substrate rotation device and substrate processing device

The present invention relates to a substrate rotating device or a substrate processing device that can be used in semiconductor manufacturing steps and the like.

Semiconductor manufacturing steps include the application of photoresist-development, etching, cleaning, and other processes that use chemical liquids to process wafers. These steps use a monolithic substrate rotation device or an immersion device that immerses the wafer into a processing tank filled with a chemical liquid, each with its own advantages and disadvantages. Among the dipping methods, the generation of static electricity is exemplified by advantages, the cleaning efficiency is improved by the addition of ultrasonic vibration, and the disadvantages are the unevenness of the chemical liquid in the treatment tank. Among the rotation methods, for example, there are many control parameters for processing conditions, and excellent uniformity of processing in the wafer plane is exemplified.

On the other hand, in the conventional substrate rotation device, since the rotating shaft (shaft) of the platform on which the wafer is fixed penetrates the bottom of the container, there is corrosion of the seal portion of the penetration portion or contamination from the seal portion. And other issues. In response to this, Patent Document 1 describes a magnetic levitation rotation processing device that rotates a rotating plate contained in a closed container magnetically by a second type of superconductor arranged below the outside of the container, and a rotating magnetic field coil arranged around the container And rotary drive. [Prior Art Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2008-73636

[Problems to be Solved by the Invention] However, the device described in Patent Document 1 has a problem that the equipment becomes large in scale in order to cool the superconductor, and the operability of maintenance operations such as cleaning is to be improved because the shape of the container is complicated. problem.

The present invention has been made in consideration of the above-mentioned problems, and an object thereof is to provide a substrate rotation device that reduces pollution sources in a container and is easier to maintain. [Method of Solving Problems]

The substrate rotating device of the present invention includes: an outer frame body provided with a magnetic field generating mechanism and capable of rotating the generated magnetic field around a central axis; a container disposed inside the outer frame body; an inner frame body disposed in the container Inside, and provided with a substrate holding mechanism, and a magnet or a ferromagnetic body dispersedly disposed in the circumferential direction; a magnetic coupling mechanism that magnetically couples the outer frame and the inner frame to magnetically suspend the inner frame, and The inner frame body rotates in accordance with the rotation change of the magnetic field; and the gap adjustment mechanism maintains a fixed interval between the outer frame body and the inner frame body, and maintains the inner frame body concentrically with the outer frame body.

Here, the central axis of the outer frame means a straight line that passes through the center of the outer frame and is perpendicular to the surface of the outer frame. In addition, rotating the magnetic field around the central axis means changing the magnetic field so that the distribution of magnetic flux density rotates around the central axis.

With this configuration, the inner ring holding the substrate is magnetically levitated and rotated in the container, so that a rotating shaft or the like can be prevented from penetrating the container, thereby reducing a source of pollution in the container. Moreover, since the inner ring and the outer ring are arranged in the same plane and concentric, a simpler shape can be used in terms of the shape of the container.

In one aspect of the present invention, the magnetic field generating mechanism is an electromagnet dispersedly disposed in a circumferential direction of the outer frame so as to face the magnet or ferromagnetic body of the inner frame, and the magnetic field rotates. This is achieved by the rotational movement of the outer frame, and the magnetic coupling mechanism is configured using a magnet or a ferromagnetic body of the inner frame and an electromagnet of the outer frame.

In other aspects of the present invention, the magnetic field generating mechanism is an electromagnet aligned in a circumferential direction of the outer frame, and the rotation of the magnetic field is achieved by sequentially changing the polarity of the electromagnet in the aligned configuration. The magnetic coupling mechanism is configured using a magnet or ferromagnetic body of the inner frame and an electromagnet of the outer frame.

In other aspects of the invention, the aforementioned outer frame system is composed of the following: a non-rotating portion that resides on the outer peripheral side of the outer frame body; and a rotating portion that resides on the inner peripheral side of the outer frame body, and makes the The portions with different magnetic permeability are formed in series along the circumferential direction. Further, the non-rotational portion includes electromagnets aligned in a circumferential direction as the magnetic field generation mechanism, and the rotation of the magnetic field is achieved by the rotational movement of the rotation portion, and the magnetic coupling mechanism uses the magnet of the inner frame. Or a ferromagnetic body, the rotating part, and the electromagnet of the non-rotating part.

In any of the above substrate rotation devices, it is preferable that the outer frame body can be further rotated and tilted around a straight line crossing the central axis. With this configuration, the substrate can be rotated while being tilted from the horizontal plane.

Preferably, the outer frame body can be further translated in the direction of the central axis. This makes it easy to mount or remove the substrate.

Preferably, the container has a chemical liquid supply mechanism and a liquid discharge mechanism at the bottom, and the chemical liquid is stored in the inside, so that the substrate held by the inner frame can be immersed and processed. Here, the chemical liquid contains pure water. With this configuration, the substrate can be rotated while being immersed in a chemical liquid.

The substrate processing apparatus of the present invention includes an outer frame body provided with a magnetic field generating mechanism and capable of rotating the generated magnetic field around a central axis; a container is disposed inside the outer frame body, and a chemical processing liquid can be applied inside Accommodation; an inner frame, which is arranged in the container, and has a substrate holding mechanism, and a magnet or a ferromagnetic body dispersedly arranged in the circumferential direction; a magnetic coupling mechanism, which magnetically couples the outer frame and the inner frame so that the The inner frame is magnetically levitated, and the inner frame is caused to rotate in accordance with the rotation change of the magnetic field; and the gap adjustment mechanism maintains a fixed interval between the outer frame and the inner frame, and maintains the inner frame Is concentric with the outer frame. [Effect of Invention]

According to the substrate rotating device or the substrate processing device of the present invention, since the inner frame body to which the substrate is fixed can be magnetically levitated and rotated in the container, there is no penetrating shaft or the like penetrating the container, which can reduce the pollution source in the container. Moreover, since the inner frame body and the outer frame body are arranged in the same plane and are concentric, a simpler container shape can be adopted.

[Best Mode for Carrying Out the Invention] A first embodiment of the present invention will be described with reference to Figs. 1 to 6. The substrate rotation device of this embodiment can rotate a circular substrate while being immersed in a chemical liquid.

Referring to FIG. 1, a substrate rotation device 10 according to this embodiment includes an outer ring (outer frame) 20, a container 40 disposed inside the outer ring, and an inner ring (inner frame) 50 disposed inside the container. The inner ring holds the substrate 60.

2 and 3, the outer ring 20 includes a plurality of magnetic coupling electromagnets 23 and a plurality of holding claw driving electromagnets 24 between the outer ring upper member 21 and the outer ring lower member 22. In addition, when only "electromagnet" is described in this specification, it means "electromagnet 23 for magnetic coupling."

The electromagnets 23 are dispersedly arranged in the circumferential direction of the outer ring 20. As the electromagnet 23, a hollow solenoid, a solenoid having a core of a permanent magnet or a ferromagnetic body, or the like can be used. A magnetic field is generated by the electromagnet 23. The size of the magnetic force is controlled by a control device (not shown) in the electromagnet 23. The number of the electromagnets 23 is three or more. The upper limit of the number of the electromagnets 23 is not particularly limited, and in order not to complicate the structure excessively, it is preferably seven or less, and more preferably three. The electromagnet 23 is configured as follows: At least one of the triangles having three electromagnets as vertices is an acute-angled triangle. The electromagnet 23 is preferably arranged to equally divide the periphery of the outer ring.

The holding claw driving electromagnet 24 is used to drive a holding claw 54 of an inner ring 50 described later.

The outer ring 20 is rotatable around the center axis Z. The outer ring is rotated to rotate the magnetic field generated by the electromagnet 23 around the center axis Z. The outer ring can be rotated and tilted about a straight line crossing the central axis Z as an axis. This action can be achieved by a gimbal mechanism. As an example, FIG. 4 is explained as follows. The first support frame 61 is horizontally supported by a support mechanism (not shown). The second support frame 62 is supported by the first support frame to be rotatable around the X axis, and is rotatable and tilted (T) around the X axis by the first motor 63. The outer ring 20 is arranged on a bearing 65 fixed by a pillar 64 extending from the second support frame, and is rotated around the Z axis by a belt 68 or the like by a second motor 66 (R). Thereby, the outer ring can rotate and tilt around the X axis, and can rotate around the Z axis.

1 and 3, the container 40 is disposed inside the outer ring 20 and is supported by a support mechanism (not shown). The shape of the container must not interfere with the tilt-rotation of the outer and inner rings. The shape of the container in this embodiment is a spherical shape that is cut up and down, and does not interfere with the outer ring and the inner ring even if the outer ring is tilted and rotated. The container 40 is formed of a side wall portion 41, a lid portion 42, and a bottom portion 43, and the side wall portion constitutes a spherical surface. The bottom portion 43 is liquid-tightly joined to the lower end of the side wall portion. A chemical liquid supply pipe 44 and a liquid discharge pipe 45 are connected to the bottom. It is desirable that the cover portion 42 can also be liquid-tightly joined to the upper end of the side wall portion. It is because the container itself can be tilted in a state where the chemical liquid is stored inside the container.

The material of the container 40 is a dielectric material having a relative magnetic permeability close to 1, and a material that does not corrode by the chemical liquid used and does not become a source of contamination of the substrate. The material of the container should be quartz. For the chemical treatment liquid filled in the container, for example, if the substrate is cleaned, pure water, ammonia, ammonia-hydrogen peroxide mixed solution, hydrochloric acid, hydrochloric acid-hydrogen peroxide mixed solution, sulfuric acid, sulfuric acid-peroxidation are used. Hydrogen mixed liquid, hydrogen peroxide, ozone water, hydrofluoric acid-ozone water mixed liquid, sulfuric acid-ozone water mixed liquid, etc. For the etching process, use nitric acid, fluoric acid, acetic acid, fluoric acid-hydrogen peroxide mixed solution, fluoric acid-nitric acid mixed solution, fluoric acid-nitric acid-acetic acid mixed solution, fluoric acid-hydrochloric acid mixed solution, and sulfuric acid-hydrochloric acid mixed solution. Liquid, sulfuric acid-nitric acid mixed liquid, nitric acid-hydrochloric acid mixed liquid, etc. For drying the substrate, isopropyl alcohol, ethanol, methanol, or the like is used.

Referring to FIGS. 2, 3, and 5, the inner ring 50 is disposed in the container 40. The inner ring 50 includes a plurality of permanent magnets 53 for magnetic coupling and a plurality of holding claws 54 for holding a substrate between the inner ring upper member 51 and the inner ring lower member 52. In addition, when only "permanent magnet" is described in this specification, it means this "permanent magnet 53 for magnetic coupling."

The material of the inner ring upper member 51 and the inner ring lower member 52 is used: it is not corroded by the chemical liquid used, and does not become a source of contamination of the substrate. The material of the inner ring upper member and the inner ring lower member should be quartz.

The permanent magnets 53 are dispersedly arranged in the circumferential direction of the inner ring 50. The number of the permanent magnets 53 is three or more. The permanent magnets 53 are arranged so as to face the electromagnets 23 of the outer ring 20 one-to-one. The permanent magnet 53 is enclosed in a quartz tube. This structure can be achieved, for example, by inserting a permanent magnet into a quartz tube, sealing both ends of the quartz tube with a quartz plate, and welding the end face of the quartz tube to the peripheral edge portion of the quartz plate.

The holding claws 54 are dispersedly arranged in the circumferential direction of the inner ring 50. The holding claw has a through-hole 55 perpendicular to the surface of the inner ring, and is rotatable around a pin 56 through which the through-hole is inserted. The pin is fixed to the inner ring upper member 51 and the inner ring lower member 52 by welding or the like. The base end portion 57 of the holding claw is embedded with the holding claw driving permanent magnet 58 and is attracted or repelled by the holding claw driving electromagnet 24 of the outer ring 20 to rotate the entire holding claw around the pin 56. The front end portion 59 of the holding claw holds the substrate 60.

The number of the holding claws 54 is three or more. The upper limit of the number of holding claws is not particularly limited, but in order not to complicate the structure excessively, it is preferably seven or less, and more preferably three. The holding claws are arranged as follows: At least one of the triangles having the three front ends 59 as apexes is an acute-angled triangle. The holding claw is preferably arranged such that the front end portion 59 divides the outer periphery of the substrate 60 equally.

The material of the holding claws 54 and the pins 56 is the following: those who are not corroded by the chemical liquid used and do not become a source of contamination of the substrate. The material of the holding claws and pins should be quartz.

Referring to FIGS. 2 and 3, the electromagnets 23 and the permanent magnets 53 of the inner ring 50 are arranged one-to-one facing each other in the circumferential direction of the outer ring 20 to form a magnetic coupling mechanism. Thereby, the outer ring and the inner ring are magnetically coupled while sandwiching the side wall of the container 40, and the inner ring is held in a state of being emptied in the container. The larger the distance between the outer ring and the inner ring, the greater the degree of freedom in device design, so the interval should be large. The achievable interval depends on the weight of the inner ring, the magnetic force of the electromagnet 23 and the permanent magnet 53, but from the experimental results of the inventor of the present application, it can be increased to about 40 mm using commonly available materials.

In a state where the inner ring 50 is emptied in the container 40, when the outer ring 20 rotates around the central axis Z, the inner ring rotates following the rotation movement of the outer ring.

However, if only the above-mentioned magnetic coupling mechanism is used, the distance between the outer ring 20 and the inner ring 50 is unstable. Then, the interval between the outer ring and the inner ring is detected by a sensor, and the magnetic force of the electromagnet 23 is adjusted to keep the interval fixed. This keeps the inner ring in the same plane as the outer ring and is concentric. The sensor detects the distance between the outer ring and the inner ring in at least three places. It is desirable to detect the positions of the electromagnet 23 and the permanent magnet 53 so that the magnetic force control of the electromagnet 23 becomes easier. As for the sensor, for example, a laser displacement sensor may be provided on the outer ring.

Next, a method of using the substrate rotation device according to this embodiment will be described with reference to FIG. 6.

First, the lid portion of the container 40 is removed and opened upward, and the substrate 60 is held and inserted into the container by a robot arm 71 or the like, and the substrate is lowered to a predetermined position (FIG. 6A). The substrate is held by the holding claws of the inner ring 50. After handing the substrate to the inner ring, pull the robot arm upward. The lid portion 42 is attached to the container in a liquid-tight manner, and the outer ring 20 is tilted, thereby tilting the inner ring and the substrate 60. A chemical liquid 46 (sulfuric acid-hydrogen peroxide mixed liquid, etc.) is supplied from a chemical liquid supply pipe 44 at the bottom of the container, and the container is filled (FIG. 6B). In a state where the substrate 60 is immersed in the chemical liquid, the substrate 60 is processed by rotating around the central axis Z of the outer ring (FIG. 6C). After the substrate processing is completed, the container 40 and the outer ring 20 are inclined, and the substrate is further inclined, and more preferably, the substrate is erected vertically (FIG. 6D). The chemical liquid is discharged from the liquid discharge pipe 45 at the bottom of the container (FIG. 6E). The substrate 60 is returned to a horizontal level (FIG. 6F). After that, the lid portion of the container is removed and the substrate is taken out by a robot arm or the like.

A second embodiment of the present invention will be described based on Fig. 7. This embodiment is different from the first embodiment in that the magnetic field is rotated using the principle of a linear motor.

Referring to FIG. 7, the outer ring 25 of the substrate processing apparatus 11 according to this embodiment is provided with electromagnets 26 aligned in a circumferential direction as a magnetic field generating mechanism. Moreover, instead of the outer ring itself rotating around the central axis, the outer ring is stationary, and the electromagnet 26 is sequentially turned on / off along the circumferential direction, and the polarity is reversed to rotate the magnetic field. . Thereby, the inner ring 50 is caused to rotate following the rotation change of the magnetic field by the attraction and / or repulsion of the electromagnet 26 and the permanent magnet 53.

The holding claw 54 is driven by the electromagnet (26A in FIG. 7) in the electromagnet 26 which is positioned opposite to the holding magnet driving permanent magnet 58. Specifically, when the holding claw 54 is opened and closed when the inner ring 50 is stopped, the polarity of the electromagnet 26A positioned opposite to the holding claw driving permanent magnet 58 is appropriately reversed. When the inner ring rotates, the polarity or the magnetic force of the electromagnet 26 is controlled so that the state in which the holding claw holds the substrate is maintained.

The structure of the other parts of the outer ring 20, the container 40, and the inner ring 50 is the same as that of the first embodiment.

According to this embodiment, the rotation mechanism and the like of the outer ring are not required, and the device structure can be simplified.

A third embodiment of the present invention will be described based on Fig. 8. In this embodiment, the outer frame system is composed of a non-rotating portion and a rotating portion, which is different from the first embodiment.

Referring to FIG. 8, the outer casing 30 of the substrate processing apparatus 12 according to the present embodiment includes a non-rotating portion 31 located on an outer peripheral side thereof and a rotating portion 33 located on an inner peripheral side thereof. The rotating portion 33 is mechanically engaged with the non-rotating portion via a support mechanism such as a bearing (not shown), and the two are arranged in the same plane with the same concentric and relative positional relationship.

The non-rotating portion 31 includes, as the magnetic field generating mechanism, electromagnets 32 aligned in the circumferential direction. The rotating portion 33 is formed by serially connecting portions having different magnetic permeability in the circumferential direction. The dark portion in FIG. 8 is a portion (high-permeability portion) 34 having high magnetic permeability, and is composed of, for example, a ferromagnetic body or a permanent magnet. The light-colored portion in FIG. 8 is a portion having a low magnetic permeability (low-permeability portion) 35 and is made of, for example, various dielectrics. The magnetic field lines formed by the electromagnet 32 easily pass through the high-permeability portion 34, so that the magnetic flux density of the inner portion of the high-permeability portion 34 of the rotating portion 33 becomes high. Conversely, the magnetic flux density of the low-permeability portion 35 of the rotating portion 33 becomes low. The high-permeability portion 34 is disposed so as to face the permanent magnets 53 and the permanent magnets 58 for driving the holding claws that are dispersedly arranged in the circumferential direction of the inner ring 50.

The electromagnet 32 of the non-rotating portion 31, the high-permeability portion 34 of the rotating portion 33, and the permanent magnet 53 of the inner ring 50 are magnetically coupled, and the inner ring is held in a state of being emptied in the container 40. In addition, when the non-rotating portion 31 is at a standstill, the rotating portion 33 is caused to rotate around the central axis Z to rotate the magnetic field, and the inner ring is caused to rotate following the change of the magnetic field rotation.

The driving method of the holding claw 54 is the same as that of the second embodiment. In other words, when the holding claw 54 is opened and closed when the inner ring 50 is stopped, the polarity of the electromagnet 32A positioned opposite to the holding claw driving permanent magnet 58 is appropriately reversed.

According to this embodiment, since the non-rotating portion 31 where the electromagnet 32 is arranged does not rotate, the wiring of the electromagnet 32 can be simplified.

The substrate rotating apparatuses of the first to third embodiments described above have the advantages of the conventional immersion substrate processing apparatus and the rotary substrate processing apparatus. For example, in terms of the advantages of the dipping method, there is no static problem, and the cleaning effect can be improved by adding ultrasonic vibration. In addition, in terms of the advantages of the rotation method, the substrate is rotated to improve the uniformity of processing within the substrate surface. In addition, since the substrate is rotated while being immersed in a chemical liquid, particularly in the cleaning step, a lift-off effect of dirt adhered to the surface of the substrate can be expected to be easily peeled from the surface.

The present invention is not limited to the embodiments described above, and various modifications can be made within the scope of the technical idea. Several modifications are described below.

The inner frame body and the outer frame system of each of the above embodiments are ring-shaped, but the shapes of the inner frame body and the outer frame body are not limited to this, and may be other polygons such as a regular octagon.

In each of the above-mentioned embodiments, the inner frame includes the permanent magnet 53 for magnetic coupling and the permanent magnet 58 for driving the holding claw, but may be provided with a ferromagnetic body instead of the permanent magnet.

When the number of axes of rotation or rotation of the outer frame is referred to as "rotational degree of freedom", the degree of freedom of rotation of the outer frame of each of the above embodiments is 2, but the degree of freedom of rotation of the outer frame may be Is 3. That is, the outer frame body can rotate around the center axis, and can also rotate and tilt around the two straight lines crossing the center axis. Thereby, the substrate can be processed while moving more complicatedly.

Alternatively, the degree of freedom of rotation of the outer casing may be one. That is, the outer frame body can be rotated around the center axis, but the outer frame body is not inclined to fix the direction of the center axis. Thereby, the device structure can be simplified. The shape of the container may be non-spherical but slightly cylindrical. This is because even if the container is cylindrical, it does not interfere with the rotation of the outer frame and the inner frame. In this case, it is desirable to make the central axis non-vertical and inclined, so that the chemical liquid and the like are not easily left on the substrate when the chemical liquid is discharged.

In addition, the outer frame body can also be translated in the direction of its central axis. This makes it easy to install or remove the substrate.

The substrate rotating device of the present invention can be used as a substitute for a conventional substrate rotating device such as a spin coater without immersing the substrate in a chemical liquid. In this case, if the degree of freedom of rotation is 2, since the substrate can be rotated while being tilted from the horizontal, the optimum processing conditions can be selected. Even if the degree of freedom of rotation is 1, the rotation shaft and the like do not penetrate the container, which can reduce the source of pollution in the container.

In addition, the substrate rotating device of the present invention can be used in a dry process without using a chemical liquid. In this case, the container is provided with the required airtightness.

10-12‧‧‧ substrate rotation device

20‧‧‧ Outer ring (outer frame)

21‧‧‧ outer ring upper member

22‧‧‧Outer ring lower member

23‧‧‧Electromagnet for Electromagnetic Coupling (Electromagnet)

24‧‧‧ Electromagnet for holding claw drive

25‧‧‧outer ring (outer frame)

26, 26A‧‧‧Electromagnet

30‧‧‧Outer frame

31‧‧‧non-rotating section

32, 32A‧‧‧ Electromagnet

33‧‧‧Rotating part

34‧‧‧High permeability

35‧‧‧ low permeability

40‧‧‧container

41‧‧‧Sidewall

42‧‧‧ Cover

43‧‧‧ bottom

44‧‧‧ chemical liquid supply pipe

45‧‧‧Drain tube

46‧‧‧ chemical liquid

50‧‧‧Inner ring (inner frame)

51‧‧‧Inner ring upper member

52‧‧‧Inner ring lower member

53‧‧‧Permanent magnet for magnetic coupling (permanent magnet)

54‧‧‧ holding claw (substrate holding mechanism)

55‧‧‧through hole

56‧‧‧pin

57‧‧‧ base end

58‧‧‧ Permanent magnet for holding claw drive

59‧‧‧Front end

60‧‧‧ substrate

61‧‧‧first support frame

62‧‧‧Second support frame

63‧‧‧The first electric motor (for turning-tilting)

64‧‧‧ Pillar

65‧‧‧bearing

66‧‧‧Second motor (for rotation)

68‧‧‧Belt

71‧‧‧Robot

R‧‧‧rotation

T‧‧‧tilt

Z‧‧‧outer ring-the central axis of the outer frame

[FIG. 1] A perspective view of a substrate rotation device according to a first embodiment of the present invention. [Fig. 2] A cross-sectional view of the center of the thickness direction of the inner ring and the outer ring of the substrate rotating device according to the first embodiment of the present invention. [Fig. 3] It is a vertical sectional view taken along line AA in Fig. 2. [Fig. 4] An example of the rotation mechanism of the outer ring is shown. [Figure 5] Shows the structure of the inner ring. [Fig. 6] (A) to (F) are used to explain the method of using the substrate rotation device according to the first embodiment of the present invention. [FIG. 7] A cross-sectional view of the center of the inner ring and the outer ring in the thickness direction of the substrate rotating device according to the second embodiment of the present invention. [Fig. 8] A cross-sectional view of the center of the inner ring and the outer frame in the thickness direction of the substrate rotating device according to the third embodiment of the present invention.

Claims (12)

A substrate rotating device includes: an outer frame body provided with a magnetic field generating mechanism, and capable of rotating the generated magnetic field around its central axis; a container disposed on the inner side of the outer frame body; an inner frame body disposed on the container Inside, and provided with a substrate holding mechanism, and magnets or ferromagnetic bodies dispersedly arranged in the circumferential direction; a magnetic coupling mechanism that magnetically couples the outer frame body and the inner frame body to magnetically suspend the inner frame body, and makes the inner frame The body rotates in accordance with the rotation change of the magnetic field; the gap adjustment mechanism maintains a fixed interval between the outer frame and the inner frame, and maintains the inner frame concentrically with the outer frame. For example, the substrate rotation device of the scope of application for a patent, wherein the magnetic field generating mechanism is an electromagnet dispersedly arranged along the circumferential direction of the outer frame so as to face the magnet or ferromagnetic body of the inner frame, The rotation of the magnetic field is realized by the rotational movement of the outer frame, and the magnetic coupling mechanism is composed of a magnet or a ferromagnetic body of the inner frame and an electromagnet of the outer frame. For example, the substrate rotation device of the first patent application range, wherein the magnetic field generating mechanism is an electromagnet arranged in alignment along the circumferential direction of the outer frame, and the rotation of the magnetic field is performed by changing the polarity of the aligned electromagnet according to the polarity. The magnetic coupling mechanism is composed of a magnet or a ferromagnetic body of the inner frame and an electromagnet of the outer frame. For example, the substrate rotation device of the scope of application for a patent, wherein the outer frame system is composed of the following parts: a non-rotation part located on the outer peripheral side of the outer frame body; and a rotating part located on the inner peripheral side of the outer frame body The non-rotating portion is provided with electromagnets aligned in the circumferential direction as the magnetic field generating mechanism. The rotation of the magnetic field is achieved by the rotating motion of the rotating portion. The magnetic coupling mechanism is composed of a magnet or a ferromagnetic body of the inner frame, the rotating portion, and an electromagnet of the non-rotating portion. For example, the substrate rotation device according to any one of claims 1 to 4, wherein the outer frame body can be rotated and tilted around a straight line crossing the central axis. For example, the substrate rotation device according to any one of claims 1 to 4, wherein the outer frame body can be further translated in the direction of the central axis. For example, the substrate rotation device of the scope of patent application No. 5, wherein the outer frame body can be further translated along the direction of the central axis. For example, the substrate rotation device according to any one of claims 1 to 4, wherein the container has a chemical liquid supply mechanism and a liquid discharge mechanism at the bottom, and the internal liquid can be stored in the container to store the chemical liquid in the container. The held substrate is dipped and processed. For example, the substrate rotation device of the scope of application for patent No. 5, wherein the container has a chemical liquid supply mechanism and a liquid drainage mechanism at the bottom, and the chemical liquid can be stored in the container to immerse and process the substrate held by the inner frame. . For example, the substrate rotation device of the sixth scope of the application for a patent, wherein the container has a chemical liquid supply mechanism and a liquid drainage mechanism at the bottom, and the chemical liquid can be stored in the container to immerse and process the substrate held by the inner frame. . For example, the substrate rotation device of the seventh scope of the patent application, wherein the container has a chemical liquid supply mechanism and a liquid discharge mechanism at the bottom, and the chemical liquid can be stored inside and the substrate held by the inner frame can be dipped and processed. A substrate processing device includes: an outer frame body provided with a magnetic field generating mechanism and capable of rotating the generated magnetic field around a central axis; a container disposed inside the outer frame body and capable of containing a chemical processing liquid inside the container An inner frame, which is arranged in the container and has a substrate holding mechanism and a magnet or a ferromagnetic body dispersedly arranged in the circumferential direction; a magnetic coupling mechanism that magnetically couples the outer frame with the inner frame to make the inner frame The frame is magnetically levitated, and the inner frame is rotated in accordance with the rotation change of the magnetic field; and the gap adjustment mechanism maintains the interval between the outer frame and the inner frame to be fixed, and maintains the inner frame to be equal to The outer frame is concentric.