TW201813758A

TW201813758A - Stage device

Info

Publication number: TW201813758A
Application number: TW106130725A
Authority: TW
Inventors: 吉田達矢
Original assignee: 住友重機械工業股份有限公司
Priority date: 2016-10-13
Filing date: 2017-09-08
Publication date: 2018-04-16
Also published as: JP6704658B2; WO2018070151A1; JP2018062993A; TWI649151B

Abstract

This stage device (100) is provided with: an X-axis slider (14); an X-axis guide (12) for guiding the movement of the X-axis slider (14) in the X-axis direction; a Y-axis slider (18) for supporting the X-axis guide (12); a Y-axis guide (16) for guiding the movement of the Y-axis slider (18) in the Y-axis direction; and at least one attitude maintaining member (26) for applying an attitude control force to the X-axis guide (12) in order to maintain the attitude of the X-axis guide (12).

Description

Stage device

本發明有關一種載物台裝置。The invention relates to a stage device.

已知有用於向第1方向和與第1方向正交之第2方向對對象物進行定位之載物台裝置。以往，提出有一種X軸方向及Y軸方向的導軌中的任一個被稱為堆棧類型之載物台裝置（例如專利文獻1）。該堆棧類型載物台裝置通常具備第1滑塊、引導第1滑塊向第1方向移動之第1導軌、支撐第1導軌之第2滑塊及引導第2滑塊向第2方向移動之第2導軌。（先前技術文獻）（專利文獻）　　專利文獻1：日本特開平5-57558號公報A stage device for positioning an object in a first direction and a second direction orthogonal to the first direction is known. Conventionally, one of the X-axis direction and the Y-axis direction guide has been proposed as a stack type stage device (for example, Patent Document 1). This stack type stage device generally includes a first slider, a first guide that guides the first slider to move in the first direction, a second slider that supports the first guide, and a second guide that guides the second slider to move in the second direction. 2nd rail. (Prior Art Document) (Patent Document) Patent Document 1: Japanese Patent Application Laid-Open No. 5-57558

（本發明所欲解決之課題）　　如專利文獻1中所記載的堆棧類型載物台裝置中，若第1滑塊移動，則於第1導軌產生荷載變動而使第1導軌繞第2方向傾斜，且可於支撐第1導軌之第2滑塊產生繞第2導軌的力矩。因此，會產生第2滑塊與第2導軌接觸而引起之磨損。　　本發明係鑑於該種狀況而完成，其目的在於提供一種能夠抑制產生滑塊與導軌接觸而引起之磨損之載物台裝置。（用以解決課題之手段）　　為了解決上述問題，本發明的一樣態的載物台裝置，具備：第1滑塊；第1導軌，引導第1滑塊向第1方向移動；第2滑塊，支撐第1導軌；第2導軌，引導第2滑塊向第2方向移動；及至少一個姿勢維持構件，對第1導軌賦予用於維持第1導軌的姿勢之姿勢控制力。　　另外，將以上構成要件的任意組合、本發明的構成要件及表現於裝置、方法、系統等之間相互替換亦有效作為本發明的態樣。（發明之效果）　　依本發明，能夠抑制產生滑塊與導軌接觸而引起之磨損。(Problems to be Solved by the Present Invention) In the stack type stage device described in Patent Document 1, if the first slider moves, a load change occurs on the first guide rail and the first guide rail is tilted around the second direction. , And the second slider supporting the first guide rail can generate a moment around the second guide rail. As a result, abrasion due to contact between the second slider and the second rail may occur. The present invention has been made in view of such a situation, and an object thereof is to provide a stage device capable of suppressing abrasion caused by contact between a slider and a guide rail. (Means to solve the problem) In order to solve the above problems, the same stage device of the present invention includes: a first slider; a first guide rail that guides the first slider to move in the first direction; and the second slider To support the first guide rail; the second guide rail to guide the second slider to move in the second direction; and at least one posture maintaining member to apply a posture control force to the first guide rail to maintain the posture of the first guide rail. In addition, any combination of the above constituent elements, the substitution of the constituent elements of the present invention, and the expression of the device, method, system, etc. are also effective as aspects of the present invention. (Effects of the Invention) According to the present invention, it is possible to suppress abrasion caused by contact between the slider and the guide rail.

以下，對各圖示中所示之相同或相等的構成要件、構件、製程賦予相同的符號，並適當省略重複說明。又，為了便於理解，將各圖示中的構件的尺寸適當放大、縮小表示。又，於各圖示中對實施形態進行說明之基礎上省略並不重要之構件的一部分表示。　　圖1係表示實施形態的之載物台裝置100之透視圖。為了方便說明，如圖示，設定如下XYZ直角座標系，亦即將X軸導軌12（後述）的延伸方向設為X軸方向，將與X軸方向正交之方向且Y軸導軌16（後述）延伸之方向設為Y軸方向，且將與兩者正交之方向設為Z軸方向。將載物台裝置100稱為堆棧類型的XY載物台，且沿X軸方向（第1方向）、Y軸方向（與第1方向正交之第2方向）對對象物進行定位。　　載物台裝置100具備底座10、X軸導軌12、X軸滑塊14、Y軸導軌16、Y軸滑塊18、工作台20、兩個側導軌22、兩個姿勢維持構件26及控制部30（於圖1中未圖示）。　　以後，於Z軸方向上將相對於Y軸導軌16設置X軸導軌12之一側設為上側而進行說明。　　Y軸導軌16為長條狀構件，且被底座10支撐。Y軸滑塊18被Y軸導軌16引導而向Y軸方向移動。X軸導軌12與Y軸導軌16相同為長條狀構件，且被Y軸滑塊18支撐。因此，隨著Y軸滑塊18向Y軸方向移動而使得X軸導軌12以及X軸滑塊14向Y軸方向移動。X軸滑塊14被X軸導軌12引導而向X軸方向移動。　　工作台20固定於X軸滑塊14。於工作台20例如放置半導體晶圓等加工對象物等。使Y軸滑塊18向Y軸方向移動，且使X軸滑塊14向X軸方向移動，藉此能夠使工作台20向XY方向移動而向XY方向對對象物進行定位。　　圖2係表示在與X軸方向正交之平面切斷之X軸導軌12及X軸滑塊14的剖面。另外，作為代表對X軸導軌12及X軸滑塊14的構成進行說明，且對Y軸導軌16及Y軸滑塊18亦適用相同的說明。　　X軸導軌12包括底壁32、第1側壁34及第2側壁36。底壁32為沿X軸方向較長的平板狀構件，且兩個主面以朝向Z軸方向之方式設置。第1側壁34為沿X軸方向較長的立壁，且立設於底壁32的上表面（亦即一個主面）的Y軸方向上的一端。第2側壁36與第1側壁34相同為沿X軸方向較長的立壁，且以與第1側壁34在Y軸方向對向之方式立設於底壁32的上面的Y軸方向的另一端。第1側壁34、第2側壁36分別具有彼此對向而延伸之第1延伸部34a、第2延伸部36a。因此，第1側壁34及第2側壁36具有L字形剖面形狀。　　X軸滑塊14為長方體狀構件，且容納於X軸導軌12的內側，亦即第1側壁34及第2側壁36與底壁32之間。在與X軸導軌12對向之X軸滑塊14的各面，亦即底面14a、第1側面14b、第2側面14c、上面14d形成有一個或複數個空氣墊40。空氣墊40噴出從未圖示之供氣系統供給之高壓氣體，且與X軸導軌12之間形成高壓氣體層。藉此，X軸滑塊14確保微小的間隙而從X軸導軌12上浮。　　在與第1側壁34對向之第1側面14b、與第2側壁36對向之第2側面14c形成有用於驅動X軸導軌12之空氣伺服室48。亦即，本實施形態中，於X軸滑塊14形成有兩個空氣伺服室48。藉此，能夠控制X軸滑塊14繞Z軸旋轉。　　於X軸滑塊14的各面以包圍空氣墊40之方式形成有差動排氣用排氣槽42、44、46。排氣槽42釋放於大氣。另外，排氣槽42也可以與排氣泵（未圖示）連接。排氣槽44、46分別與用於將排氣槽內的壓力設為低真空壓力水平、中真空壓力水平之排氣泵（未圖示）連接，且向外部排出從X軸滑塊14的空氣墊40及空氣伺服室48向內部空間供給之壓縮氣體。如此，藉由不使壓縮氣體從X軸導軌12與X軸滑塊14的間隙漏出，於真空環境下亦能夠使用載物台裝置100。另外，當於大氣壓環境下使用載物台裝置100時，無需設置該種排氣槽42、44、46。　　圖3係圖2的A-A線剖面圖。參閱圖3，對X軸滑塊14相對於X軸導軌12移動之原理進行說明。另外，作為代表對X軸滑塊14相對於X軸導軌12移動之原理進行說明，且對Y軸滑塊18相對於Y軸導軌16移動之原理亦適用相同的說明。載物台裝置100還具備隔壁56。　　於圖3中誇大描繪有X軸導軌12與X軸滑塊14的間隙或隔壁56與空氣伺服室48的間隙。實際上，例如該些間隙為數微米量級。隔壁56固定於X軸導軌12，且在X軸方向將X軸滑塊14的空氣伺服室48劃分為兩個空氣伺服室48A、48B。於兩個空氣伺服室48A、48B分別連接有用於使壓縮氣體能夠出入之供氣系統50A、50B。供氣系統50A、50B分別包括伺服閥52A、52B和壓縮氣體供給源54A、54B。　　若對空氣墊40供給壓縮氣體，則如上述X軸滑塊14相對於X軸導軌12僅稍微上浮。於該狀態下，例如對空氣伺服室48A供給壓縮氣體，並從空氣伺服室48B排出壓縮氣體，則隔壁56作為活塞而發揮作用，且X軸滑塊14向圖中的左方向移動。如此，藉由控制伺服閥52A、52B的開度，能夠相對於X軸導軌12使X軸滑塊14向任意位置移動。　　返回到圖1，兩個側導軌22為長條狀構件。兩個側導軌被底座10支撐，以使該些等長邊方向與Y軸方向一致，並且Y軸導軌16位於X軸方向的該等之間。　　對作為側導軌22的上面之滑行面22a實施平面加工。兩個側導軌22的滑行面22a以彼此成為相同的高度之方式，亦即以從X軸方向觀察時彼此重疊之方式形成。又，從X軸方向觀察時，兩個滑行面22a以與Y軸導軌16（更具體而言，例如Y軸導軌16的底壁32的上面）平行之方式形成。　　兩個姿勢維持構件26固定於X軸導軌12的下面（亦即底壁32的下面）12a。兩個姿勢維持構件26尤其相對於被Y軸滑塊18支撐之X軸導軌12的被支撐部分位於彼此相反的一側，並且固定於X軸導軌12的下面12a，以使位於側導軌22的滑行面22a的上方。於圖1中，兩個姿勢維持構件26分別固定在X軸導軌12的下面12a的X軸方向的兩端。　　圖4係表示姿勢維持構件26之一和其周邊之剖面圖。於圖4中，表示在與Y軸方向正交之平面切斷之剖面。另外，關於另一個姿勢維持構件26亦以相同之方式構成。姿勢維持構件26於本實施形態中包括空氣墊70，且對滑行面22a噴出從未圖示之供氣系統供給之高壓氣體。藉其排斥力，對姿勢維持構件26以及X軸導軌12施加向上的力。又，與X軸滑塊14或Y軸滑塊18相同，於姿勢維持構件26以包圍空氣墊70之方式形成有差動排氣用排氣槽72、74、76。排氣槽72、74、76分別以與排氣槽42、44、46相同之方式構成。如此，藉由不使壓縮氣體從姿勢維持構件26與側導軌22的間隙漏出，於真空環境下亦能夠使用載物台裝置100。另外，當於大氣壓環境下使用載物台裝置100時，無需設置該種排氣槽。　　圖5係表示控制部30的功能及構成之方塊圖。關於在此所示之各方塊，於硬體方面，能夠藉以計算機的CPU（central processing unit（中央處理器））為代表之元件或機械裝置而實現，且於軟體方面，可藉由計算機程式等而實現，但在此描繪有可藉該些的配合而實現之功能方塊。因此，本說明書中提及之本領域技術人員應當理解該些功能方塊能夠藉由硬體、軟體的組合而以各種形態實現之情況。　　控制部30包括：上浮控制部62，為了使X軸滑塊14、Y軸滑塊18上浮而控制從空氣墊40噴出之壓縮氣體的流量；移動控制部64，為了使X軸滑塊14、Y軸滑塊18移動而控制對空氣伺服室48供給之壓縮氣體的流量；及姿勢維持控制部66，為了維持X軸導軌12的姿勢而控制從姿勢維持構件26的空氣墊70噴出之氣體的流量。如上述，姿勢維持構件26相對於滑行面22a噴出高壓氣體，藉此對姿勢維持構件26以及X軸導軌12施加向上的力。姿勢維持控制部66例如藉由該向上的力，以對於藉X軸滑塊14移動而可於X軸導軌12產生之荷載變動得到足夠大的上浮剛性之方式，換言之以能夠抑制或防止基於荷載變動的X軸導軌12的沉入，控制由姿勢維持構件26的空氣墊70噴出之氣體的流量。　　依以上說明之實施形態的載物台裝置100時，於X軸導軌12的下面12a固定兩個姿勢維持構件26，且從姿勢維持構件26相對於滑行面22a噴出氣體。藉此，對姿勢維持構件26以及X軸導軌12施加向上的力。在此，若X軸滑塊14延著X軸導軌12向X軸方向移動，則於X軸導軌12產生荷載變動而使X軸導軌12繞Y軸方向傾斜，且於支撐X軸導軌12之Y軸滑塊18可產生繞Y軸導軌16的力矩。其結果，會產生Y軸滑塊18與Y軸導軌16接觸所引起之磨損。尤其，本實施形態中，Y軸滑塊18因氣體的壓力而上浮，因此若於Y軸滑塊18產生繞Y軸導軌16之力矩，則容易產生磨損。相對於此，本實施形態中，如上述藉兩個姿勢維持構件26對X軸導軌12施加向上的力，例如能夠抑制因於X軸導軌12產生之荷載變動而使得X軸導軌12沉入的向上的力。藉此，即使X軸滑塊14移動亦可抑制X軸滑塊14繞Y軸方向傾斜，且抑制於支撐X軸滑塊14之Y軸滑塊18產生繞Y軸導軌16之力矩，其結果，能夠抑制產生Y軸滑塊18與Y軸導軌16接觸所引起之磨損。又，X軸導軌12繞Y軸方向傾斜之情況得以抑制，因此工作台20的姿勢精度得以提高。　　又，依實施形態的載物台裝置100時，滑塊包括空氣墊40及用於向外部排出從空氣伺服室48供給之壓縮氣體之排氣槽42、44、46。同樣地，姿勢維持構件26包括用於向外部排出從空氣墊70供給之壓縮氣體之排氣槽72、74、76。如此藉由不使壓縮氣體漏出，能夠於真空環境下使用載物台裝置100。　　以上，對實施形態的載物台裝置進行了說明。本領域技術人員應當理解該實施形態為例示，能夠對各構成要件的組合進行各種變形之情況，並且該種變形例亦屬於本發明的範圍內之情況。又，實施形態彼此還能夠進行組合。（變形例1）　　實施形態中並未特別提及，但當X軸滑塊14相對於X軸導軌12的被支撐部分向X軸導軌12的一側移動時，姿勢維持控制部66可以增加由其一側的姿勢維持構件26的空氣墊70噴出之氣體的流量，亦可以減少由其另一側的姿勢維持構件26的空氣墊70噴出之氣體的流量或停止氣體的噴出，或者可以同時使用該等。當X軸滑塊14相對於X軸導軌12的被支撐部分向X軸導軌12的另一側移動時亦相同。又，姿勢維持控制部66依X軸導軌12移動之速度，亦即依於X軸滑塊14產生之荷載變動的大小，可以調整由兩個姿勢維持控制部66的空氣墊70噴出之氣體的流量。（變形例2）　　實施形態中，對兩個姿勢維持構件26以相對於X軸導軌12的被支撐部分位於彼此相反側之方式固定於X軸導軌12之情況進行了說明，但並不限定於此。　　載物台裝置100可以僅具備一個姿勢維持構件26。該情況下，姿勢維持構件26當然僅固定於X軸導軌12的被支撐部分的一側。該情況下，當X軸滑塊14向相對於X軸導軌12的被支撐部分固定有姿勢維持構件26之一側移動時，增加由姿勢維持構件26噴出之氣體的流量，當X軸滑塊14向與其相反側移動時，減少由姿勢維持構件26噴出之氣體的流量或停止氣體的噴出。　　又，載物台裝置100可以具備3個以上的姿勢維持構件26。該情況下，即使所有的姿勢維持構件26僅固定於X軸導軌12的被支撐部分的一側，姿勢維持構件26的一部分亦可固定於X軸導軌12的被支撐部分的一側，且剩餘部分固定於被支撐部分的另一側。（變形例3）　　實施形態中，對姿勢維持構件26包括噴出氣體之空氣墊70之情況進行了說明，但並不限定於此。　　例如，姿勢維持構件26可以是吸入氣體之空氣墊。該情況下，例如控制該姿勢維持構件26所吸入之吸入量，以使藉由X軸滑塊14移動而可於X軸導軌12產生之荷載變動及藉由控制與X軸滑塊14移動過來之一側的相反側的姿勢維持構件26的空氣墊的上浮剛性而施加於該姿勢維持構件26以及X軸導軌12之向下的力實質上相等。換言之，控制姿勢維持構件26所吸入之吸入量，以使能夠抑制或防止基於荷載變動的X軸導軌12的沉入。　　又，例如姿勢維持構件26可以是同時進行氣體的噴出和氣體的吸入之空氣墊。例如，姿勢維持構件26可以是於其中央部分存在氣體的噴出部，且於其周圍有氣體的吸入部。該情況下，藉由控制基於姿勢維持構件26的氣體的吸入量和噴出量而控制姿勢維持構件26的上浮剛性，藉此抑制或控制基於荷載變動的X軸導軌12的沉入。（變形例4）　　實施形態中，對姿勢維持構件26固定於X軸導軌12之情況進行了說明，但並不限定於此。姿勢維持構件26可固定於側導軌22的上面。該情況下，可以於Y軸方向的側導軌22的上面的整個範圍鋪滿姿勢維持構件26。（變形例5）　　實施形態及上述變形例中，對姿勢維持構件26包括空氣墊70之情況進行了說明，但並不限定於此。姿勢維持構件26只要是不與底座10（側導軌22）或X軸導軌12接觸，且能夠對X軸導軌12賦予用於維持X軸導軌12的姿勢之力（亦即姿勢控制力）即可。因此，例如姿勢維持構件26可以能夠賦予作為姿勢控制力之磁力或電磁力。　　上述之實施形態與變形例的任意組合亦可作為本發明的實施形態而實用。依組合而產生之新的實施形態同時具有被組合之實施形態及變形例各自的效果。又，本領域技術人員應當理解申請專利範圍中所記載之各構成要件應發揮之功能可藉由於實施形態及變形例中所示之各構成要件的單體或該等的配合而實現之情況。In the following, the same or equivalent constituent elements, components, and processes shown in each drawing are given the same reference numerals, and repeated descriptions are appropriately omitted. In addition, in order to facilitate understanding, the dimensions of the members in each drawing are appropriately enlarged and reduced. In addition, a part of components that are not important are omitted from the description of the embodiments in each of the drawings. FIG. 1 is a perspective view showing a stage device 100 according to the embodiment. For the convenience of illustration, as shown in the figure, the following XYZ rectangular coordinate system is set, that is, the extension direction of the X-axis guide 12 (described later) is set to the X-axis direction, the direction orthogonal to the X-axis direction and the Y-axis guide 16 (described later) are set. The direction of extension is the Y-axis direction, and the direction orthogonal to both is the Z-axis direction. The stage device 100 is referred to as a stack-type XY stage, and an object is positioned in the X-axis direction (first direction) and the Y-axis direction (second direction orthogonal to the first direction). The stage device 100 includes a base 10, an X-axis guide 12, an X-axis slider 14, a Y-axis guide 16, a Y-axis slider 18, a table 20, two side guides 22, two posture maintaining members 26, and a control unit. 30 (not shown in Figure 1). Hereinafter, a description will be given with one side where the X-axis guide 12 is provided relative to the Y-axis guide 16 as the upper side in the Z-axis direction. The Y-axis guide 16 is an elongated member and is supported by the base 10. The Y-axis slider 18 is guided by the Y-axis guide 16 and moves in the Y-axis direction. The X-axis guide 12 is a long member similar to the Y-axis guide 16 and is supported by the Y-axis slider 18. Therefore, as the Y-axis slider 18 moves in the Y-axis direction, the X-axis guide rail 12 and the X-axis slider 14 move in the Y-axis direction. The X-axis slider 14 is guided by the X-axis guide 12 and moves in the X-axis direction. The table 20 is fixed to the X-axis slider 14. A processing object such as a semiconductor wafer is placed on the table 20. By moving the Y-axis slider 18 in the Y-axis direction and moving the X-axis slider 14 in the X-axis direction, the table 20 can be moved in the XY direction to position the object in the XY direction. FIG. 2 shows a cross section of the X-axis guide 12 and the X-axis slider 14 cut in a plane orthogonal to the X-axis direction. In addition, the configuration of the X-axis guide 12 and the X-axis slider 14 will be described as a representative, and the same description will be applied to the Y-axis guide 16 and the Y-axis slider 18. The X-axis guide 12 includes a bottom wall 32, a first side wall 34, and a second side wall 36. The bottom wall 32 is a flat plate-shaped member that is long in the X-axis direction, and two main surfaces are provided so as to face the Z-axis direction. The first side wall 34 is a vertical wall that is longer in the X-axis direction, and is erected on one end in the Y-axis direction of the upper surface (that is, one main surface) of the bottom wall 32. The second side wall 36 is the same as the first side wall 34 as a long vertical wall in the X-axis direction, and is erected on the other end in the Y-axis direction of the upper surface of the bottom wall 32 so as to face the first side wall 34 in the Y-axis direction. . The first side wall 34 and the second side wall 36 each have a first extension portion 34 a and a second extension portion 36 a extending to face each other. Therefore, the first side wall 34 and the second side wall 36 have an L-shaped cross-sectional shape. The X-axis slider 14 is a rectangular parallelepiped member and is housed inside the X-axis guide 12, that is, between the first side wall 34 and the second side wall 36 and the bottom wall 32. One or a plurality of air cushions 40 are formed on each surface of the X-axis slider 14 facing the X-axis guide rail 12, that is, the bottom surface 14a, the first side surface 14b, the second side surface 14c, and the upper surface 14d. The air cushion 40 ejects high-pressure gas supplied from a gas supply system not shown, and forms a high-pressure gas layer between the air cushion 40 and the X-axis guide 12. Thereby, the X-axis slider 14 ascends from the X-axis guide 12 while ensuring a small gap. An air servo chamber 48 for driving the X-axis guide 12 is formed on the first side surface 14b facing the first side wall 34 and the second side surface 14c facing the second side wall 36. That is, in this embodiment, two air servo chambers 48 are formed in the X-axis slider 14. This makes it possible to control the rotation of the X-axis slider 14 around the Z-axis. The exhaust grooves 42, 44, and 46 for differential exhaust are formed on each surface of the X-axis slider 14 so as to surround the air cushion 40. The exhaust groove 42 is released to the atmosphere. The exhaust tank 42 may be connected to an exhaust pump (not shown). The exhaust grooves 44 and 46 are connected to exhaust pumps (not shown) for setting the pressure in the exhaust grooves to a low vacuum pressure level and a medium vacuum pressure level, respectively, and discharge the pressure from the X-axis slider 14 to the outside. The compressed air supplied from the air cushion 40 and the air servo chamber 48 to the internal space. As described above, the stage device 100 can be used even in a vacuum environment by preventing the compressed gas from leaking from the gap between the X-axis guide 12 and the X-axis slider 14. In addition, when the stage device 100 is used in an atmospheric pressure environment, it is not necessary to provide such exhaust grooves 42, 44, 46. FIG. 3 is a sectional view taken along the line A-A in FIG. 2. Referring to FIG. 3, the principle of movement of the X-axis slider 14 relative to the X-axis guide 12 will be described. In addition, the principle that the X-axis slider 14 moves relative to the X-axis guide 12 will be described as a representative, and the same explanation will be applied to the principle that the Y-axis slider 18 moves relative to the Y-axis guide 16. The stage device 100 further includes a partition wall 56. The gap between the X-axis guide 12 and the X-axis slider 14 or the gap between the partition wall 56 and the air servo chamber 48 is exaggeratedly depicted in FIG. 3. In practice, the gaps are on the order of a few microns, for example. The partition wall 56 is fixed to the X-axis guide 12, and the air servo chamber 48 of the X-axis slider 14 is divided into two air servo chambers 48A and 48B in the X-axis direction. Air supply systems 50A and 50B for connecting compressed air to and from the two air servo chambers 48A and 48B are respectively connected. The gas supply systems 50A and 50B include servo valves 52A and 52B and compressed gas supply sources 54A and 54B, respectively. When the compressed air is supplied to the air cushion 40, the X-axis slider 14 floats slightly with respect to the X-axis guide 12 as described above. In this state, for example, when compressed air is supplied to the air servo chamber 48A and compressed air is discharged from the air servo chamber 48B, the partition wall 56 functions as a piston, and the X-axis slider 14 moves to the left in the figure. As described above, by controlling the opening degrees of the servo valves 52A and 52B, the X-axis slider 14 can be moved to an arbitrary position with respect to the X-axis guide 12. Return to FIG. 1, the two side rails 22 are long members. The two side guides are supported by the base 10 so that the equal-length directions coincide with the Y-axis direction, and the Y-axis guide 16 is located between these in the X-axis direction.平面 Plane the sliding surface 22a as the upper surface of the side guide 22. The sliding surfaces 22a of the two side rails 22 are formed so as to have the same height with each other, that is, such that they overlap each other when viewed from the X-axis direction. When viewed from the X-axis direction, the two sliding surfaces 22 a are formed so as to be parallel to the Y-axis guide 16 (more specifically, the upper surface of the bottom wall 32 of the Y-axis guide 16). (2) The two posture maintaining members 26 are fixed to the lower surface of the X-axis guide rail 12 (that is, the lower surface of the bottom wall 32) 12a. The two posture maintaining members 26 are located on opposite sides of each other from the supported portions of the X-axis guide 12 supported by the Y-axis slider 18 and are fixed to the lower surface 12 a of the X-axis guide 12 so that the Above the sliding surface 22a. In FIG. 1, two posture maintaining members 26 are respectively fixed to both ends in the X-axis direction of the lower surface 12 a of the X-axis guide rail 12. FIG. 4 is a cross-sectional view showing one of the posture maintaining members 26 and its periphery. FIG. 4 shows a cross section cut along a plane orthogonal to the Y-axis direction. The other posture maintaining member 26 is also configured in the same manner. The posture maintaining member 26 includes an air cushion 70 in this embodiment, and sprays high-pressure gas supplied from a gas supply system (not shown) to the sliding surface 22 a. By the repulsive force, an upward force is applied to the posture maintaining member 26 and the X-axis guide 12. Also, similar to the X-axis slider 14 or the Y-axis slider 18, the exhaust gas grooves 72, 74, and 76 for differential exhaust are formed in the posture maintaining member 26 so as to surround the air cushion 70. The exhaust grooves 72, 74, and 76 are configured in the same manner as the exhaust grooves 42, 44, 46, respectively. As described above, the stage device 100 can be used even in a vacuum environment by preventing the compressed gas from leaking from the gap between the posture maintaining member 26 and the side rail 22. In addition, when the stage device 100 is used in an atmospheric pressure environment, it is not necessary to provide such an exhaust groove. 5 is a block diagram showing the function and configuration of the control unit 30. With regard to the blocks shown here, in terms of hardware, they can be implemented by components or mechanical devices represented by the computer's CPU (central processing unit), and in software, they can be implemented by computer programs, etc. It is realized, but there are function blocks that can be realized by these cooperations. Therefore, those skilled in the art mentioned in this specification should understand the cases where these functional blocks can be implemented in various forms by a combination of hardware and software. The control unit 30 includes a floating control unit 62 that controls the flow rate of the compressed gas ejected from the air cushion 40 in order to float the X-axis slider 14 and the Y-axis slider 18, and a movement control unit 64 for the X-axis slider 14, The Y-axis slider 18 moves to control the flow of the compressed gas supplied to the air servo chamber 48; and the posture maintaining control unit 66 controls the gas ejected from the air cushion 70 of the posture maintaining member 26 to maintain the posture of the X-axis guide 12 flow. As described above, the posture maintaining member 26 ejects a high-pressure gas with respect to the sliding surface 22 a, thereby applying an upward force to the posture maintaining member 26 and the X-axis guide 12. The posture maintaining control unit 66 uses, for example, the upward force to obtain a floating rigidity sufficiently large for a load change that can be generated on the X-axis guide 12 by the movement of the X-axis slider 14, in other words, it can suppress or prevent load-based fluctuations. The sinking of the fluctuating X-axis guide 12 controls the flow rate of gas ejected from the air cushion 70 of the posture maintaining member 26. When the stage device 100 according to the embodiment described above is used, two posture maintaining members 26 are fixed to the lower surface 12 a of the X-axis guide 12, and gas is ejected from the posture maintaining members 26 with respect to the sliding surface 22 a. Thereby, upward force is applied to the posture maintaining member 26 and the X-axis guide 12. Here, if the X-axis slider 14 moves along the X-axis guide 12 in the X-axis direction, a load change occurs in the X-axis guide 12 and the X-axis guide 12 is tilted about the Y-axis direction. The Y-axis slider 18 may generate a moment about the Y-axis guide 16. As a result, abrasion caused by contact between the Y-axis slider 18 and the Y-axis guide 16 occurs. In particular, in the present embodiment, the Y-axis slider 18 floats up due to the pressure of the gas. Therefore, if a moment is generated around the Y-axis guide 16 in the Y-axis slider 18, abrasion is likely to occur. On the other hand, in the present embodiment, as described above, by applying the upward force to the X-axis guide 12 by the two posture maintaining members 26, for example, it is possible to suppress the X-axis guide 12 from sinking due to the load variation generated by the X-axis guide 12. Upward force. Thereby, even if the X-axis slider 14 moves, it is possible to suppress the X-axis slider 14 from tilting about the Y-axis direction, and it is suppressed that the Y-axis slider 18 supporting the X-axis slider 14 generates a moment about the Y-axis guide 16. As a result, It is possible to suppress abrasion caused by the contact between the Y-axis slider 18 and the Y-axis guide 16. In addition, since the X-axis guide 12 is prevented from being tilted about the Y-axis direction, the posture accuracy of the table 20 is improved. In the stage device 100 according to the embodiment, the slider includes an air cushion 40 and exhaust grooves 42, 44, 46 for discharging the compressed gas supplied from the air servo chamber 48 to the outside. Similarly, the posture maintaining member 26 includes exhaust grooves 72, 74, and 76 for exhausting the compressed gas supplied from the air cushion 70 to the outside. In this manner, the stage device 100 can be used in a vacuum environment without leaking the compressed gas. In the foregoing, the stage device according to the embodiment has been described. Those skilled in the art should understand that this embodiment is an example, and various modifications can be made to the combination of various constituent elements, and that this modification also belongs to the scope of the present invention. The embodiments can be combined with each other. (Modification 1) 并未 It is not specifically mentioned in the embodiment. However, when the X-axis slider 14 moves to the side of the X-axis guide 12 relative to the supported portion of the X-axis guide 12, the posture maintaining control unit 66 may increase The flow rate of the gas emitted from the air cushion 70 of the posture maintaining member 26 on one side can also reduce the flow rate of the gas emitted from the air cushion 70 of the posture maintaining member 26 on the other side or stop the gas from being discharged, or can be used simultaneously. Such. The same applies when the X-axis slider 14 moves toward the other side of the X-axis guide 12 with respect to the supported portion of the X-axis guide 12. In addition, the attitude maintaining control unit 66 can move according to the speed of the X-axis guide 12, that is, according to the magnitude of the load fluctuation generated by the X-axis slider 14, and can adjust the gas ejected from the air cushion 70 of the two attitude maintaining control units 66. flow. (Modification 2) In the embodiment, the case where the two posture maintaining members 26 are fixed to the X-axis guide 12 so as to be positioned on opposite sides of the supported portion of the X-axis guide 12 is described, but it is not limited to this. this. The ballast stage device 100 may include only one posture maintaining member 26. In this case, it is needless to say that the posture maintaining member 26 is fixed to only one side of the supported portion of the X-axis guide 12. In this case, when the X-axis slider 14 is moved to one side where the posture maintaining member 26 is fixed relative to the supported portion of the X-axis guide 12, the flow rate of the gas ejected from the posture maintaining member 26 is increased. When 14 moves to the opposite side, the flow rate of the gas ejected from the posture maintaining member 26 is reduced or the ejection of the gas is stopped. In addition, the stage device 100 may include three or more posture maintaining members 26. In this case, even if all the posture maintaining members 26 are fixed to only one side of the supported portion of the X-axis guide 12, a part of the posture maintaining members 26 may be fixed to one side of the supported portion of the X-axis guide 12, and the rest The part is fixed to the other side of the supported part. (Modification 3) In the embodiment, the case where the posture maintaining member 26 includes the air cushion 70 that ejects gas has been described, but it is not limited to this. For example, the posture maintaining member 26 may be an air cushion that inhales a gas. In this case, for example, the amount of inhalation sucked by the posture maintaining member 26 is controlled so that the load change that can be generated on the X-axis guide 12 by the movement of the X-axis slider 14 and the control and the X-axis slider 14 move over The air cushion of the posture maintaining member 26 on the opposite side of one side is rigid in the floating direction, and downward forces applied to the posture maintaining member 26 and the X-axis guide 12 are substantially equal. In other words, the amount of suction sucked by the posture maintaining member 26 is controlled so that sinking of the X-axis guide 12 based on the load fluctuation can be suppressed or prevented. In addition, for example, the posture maintaining member 26 may be an air cushion that simultaneously ejects gas and inhales gas. For example, the posture maintaining member 26 may be a gas ejection portion having a central portion thereof, and a gas inhalation portion having a gas surrounding portion. In this case, the floating rigidity of the posture maintaining member 26 is controlled by controlling the amount of gas intake and discharge by the posture maintaining member 26, thereby suppressing or controlling the sinking of the X-axis guide 12 based on the load fluctuation. (Modification 4) In the embodiment, the case where the posture maintaining member 26 is fixed to the X-axis guide 12 is described, but it is not limited to this. The posture maintaining member 26 may be fixed to the upper surface of the side rail 22. In this case, the posture maintaining member 26 may be spread over the entire range of the upper surface of the side rail 22 in the Y-axis direction. (Modification 5) In the embodiment and the modification described above, the case where the posture maintaining member 26 includes the air cushion 70 has been described, but it is not limited to this. As long as the posture maintaining member 26 is not in contact with the base 10 (side guide 22) or the X-axis guide 12, and the X-axis guide 12 can be given a force to maintain the posture of the X-axis guide 12 (that is, a posture control force), . Therefore, for example, the posture maintaining member 26 may be capable of applying a magnetic force or an electromagnetic force as a posture control force.任意 Any combination of the above-mentioned embodiments and modifications can also be applied as an embodiment of the present invention. The new embodiment formed by the combination has the respective effects of the combined embodiment and the modification. In addition, those skilled in the art should understand that the functions required by each of the constituent elements described in the scope of the patent application can be achieved by the individual constituent elements shown in the embodiments and modifications, or the cooperation of these.

10‧‧‧底座10‧‧‧ base

12‧‧‧X軸導軌12‧‧‧X-axis guide

14‧‧‧X軸滑塊14‧‧‧X-axis slider

16‧‧‧Y軸導軌16‧‧‧Y-axis guide

18‧‧‧Y軸滑塊18‧‧‧Y-axis slider

22‧‧‧側導軌22‧‧‧side guide

22a‧‧‧滑行面22a‧‧‧ taxiing surface

26‧‧‧姿勢維持構件26‧‧‧ Posture maintaining member

30‧‧‧控制部30‧‧‧Control Department

40‧‧‧空氣墊40‧‧‧Air cushion

70‧‧‧空氣墊70‧‧‧Air cushion

100‧‧‧載物台裝置100‧‧‧ stage device

圖1係表示實施形態的之載物台裝置之透視圖。　　圖2係表示圖1的X軸導軌及X軸滑塊的剖面之圖。　　圖3係圖2的A-A線剖面圖。　　圖4係表示姿勢維持構件之一和其周邊之剖面圖。　　圖5係表示控制部的功能及構成之方塊圖。FIG. 1 is a perspective view showing a stage device according to the embodiment. FIG. 2 is a view showing a cross section of the X-axis guide rail and the X-axis slider of FIG. 1. FIG. 3 is a sectional view taken along the line A-A in FIG. 2. FIG. 4 is a cross-sectional view showing one of the posture maintaining members and the periphery thereof. FIG. 5 is a block diagram showing the function and configuration of the control section.

Claims

A stage device comprising: a first slider; a first guide rail to guide said first slider to move in a first direction; a second slider to support said first guide rail; a second guide rail to guide said aforementioned The second slider moves in the second direction; and at least one posture maintaining member, which applies posture control force to the first rail to maintain the posture of the first rail.

The stage device described in item 1 of the scope of patent application, wherein the stage device includes two posture maintaining members, and the two posture maintaining members are supported with respect to the first guide rail supported by the second slider. The part is provided so that a posture control force may be given to the opposite side.

The stage device according to item 1 or 2 of the scope of the patent application, wherein the posture maintaining member includes an air cushion that ejects compressed gas.

For example, the stage device described in item 3 of the scope of the patent application, wherein the aforementioned posture maintaining member is fixed to the first guide rail, and slides on a sliding surface that is substantially parallel to the second guide rail.

The stage device described in item 1 or 2 of the scope of patent application, wherein the first slider is guided and moved by the first guide rail, thereby controlling the posture-based maintaining member in accordance with a change in the load generated on the first guide rail. Posture maintenance.