TW201802258A - Electrolytic copper foil for providing a high tensile strength, maintaining a high tensile strength after being heated and realizing an excellent folding resistance - Google Patents

Electrolytic copper foil for providing a high tensile strength, maintaining a high tensile strength after being heated and realizing an excellent folding resistance Download PDF

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TW201802258A
TW201802258A TW106120332A TW106120332A TW201802258A TW 201802258 A TW201802258 A TW 201802258A TW 106120332 A TW106120332 A TW 106120332A TW 106120332 A TW106120332 A TW 106120332A TW 201802258 A TW201802258 A TW 201802258A
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copper foil
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tensile strength
electrolytic copper
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TWI641707B (en
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篠崎淳
胡木政登
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古河電氣工業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • H01M4/661Metal or alloys, e.g. alloy coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • H01M10/0525Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

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Abstract

The purpose of the present invention is to provide an electrolytic copper foil for providing a high tensile strength, maintaining high tensile strength after being heated and realizing an excellent folding resistance. The electrolytic copper foil is characterized in: the content of carbon (C) being 20 to 150 mass ppm, the content of sulfur (S) being 18 mass ppm or less, the content of nitrogen (N) being 40 mass ppm or less, and the content of chlorine (Cl) being 25 to 200 mass ppm.

Description

電解銅箔 Electrolytic copper foil

本發明關於一種電解銅箔,適用於例如鋰離子二次電池負極集電體或印刷電路板等的製造。 The present invention relates to an electrolytic copper foil, which is suitable for manufacturing, for example, a negative electrode current collector of a lithium ion secondary battery or a printed circuit board.

在鋰離子二次電池(以下有時僅稱為「電池」)的負極集電體、以電子通信設備為代表的各種電子設備中使用的印刷電路板(以下有時僅稱為「電路板」)的導體部,銅箔被廣泛使用。尤其與壓延銅箔相比,電解銅箔容易兼顧導電率和強度,並且能夠以低成本實現薄箔化,因此得到廣泛使用。 Printed circuit boards (hereinafter sometimes referred to simply as "circuit boards") used in negative current collectors of lithium-ion secondary batteries (hereinafter sometimes referred to simply as "batteries") and various electronic devices such as electronic communication devices ) Conductors, copper foil is widely used. Compared with rolled copper foil, electrolytic copper foil is widely used because it is easy to achieve both conductivity and strength, and it can be made thinner at low cost.

此外,在鋰離子二次電池的製造時以及電池的充放電過程中,銅箔會受到各種應力的負載。因此,銅箔上會產生褶皺或斷裂等損壞,可能會導致電池循環特性下降、短路、起火等問題。為解決這些問題,提出了提高物理特性的方法,例如在鋰離子二次電池中,將銅箔的拉伸強度設為規定值以上、將加熱後的拉伸強度設為規定值以上、或者將銅箔之延伸率設為規定值以上等(專利文獻1至3)。 In addition, the copper foil is subjected to various stress loads during the manufacture of the lithium ion secondary battery and during the charging and discharging of the battery. Therefore, damage such as wrinkles or cracks may occur on the copper foil, which may cause problems such as degradation of battery cycle characteristics, short circuit, and fire. In order to solve these problems, methods for improving physical properties have been proposed. For example, in a lithium ion secondary battery, the tensile strength of copper foil is set to a predetermined value or more, the tensile strength after heating is set to a predetermined value or more, or The elongation of the copper foil is set to a predetermined value or more (Patent Documents 1 to 3).

此外,近年來,隨著鋰離子二次電池高容量化、輕量化之進一步發展,鋰離子二次電池的構造與過去相比也在發生變化。例如,為了將電極以更高密度收納在電池框體內,為銅箔進行折疊加工之情形越來越多。 In addition, in recent years, with the further development of higher capacity and lighter weight of lithium-ion secondary batteries, the structure of lithium-ion secondary batteries has also changed compared with the past. For example, in order to store the electrodes in the battery case at a higher density, there are more and more cases where copper foil is folded.

具體而言,在圓筒形電池中,為防止最內層或最外層電極終端部發生捲繞錯位、確保安全性,會使銅箔夾住隔膜或者根據情況夾住正極的鋁箔後折返,進行折疊加工。 Specifically, in a cylindrical battery, in order to prevent winding misalignment of the innermost or outermost electrode terminal portion and ensure safety, the copper foil is sandwiched between the separator or the aluminum foil of the positive electrode, and then folded back. Folding processing.

此外,在方形或層疊型電池中,過去是180°折返並捲繞電極(相當於專利文獻4的圖4、彎曲角部12),但近年來為實現高密度化,有時會執行更加嚴格的折疊加工,例如施加更大的張力將其捲緊,或者在捲繞之後進行擠壓,縮小折彎半徑,或者使內層側在更小的折彎半徑範圍內捲繞電極等。 In addition, in a rectangular or laminated battery, the electrode has been folded back at 180 ° in the past (corresponding to FIG. 4 and curved corner portion 12 of Patent Document 4). However, in recent years, in order to achieve higher density, stricter implementation may be required. Folding processing, such as applying more tension to wind it up, or pressing it after winding, reducing the bending radius, or winding the electrode on the inner layer side within a smaller bending radius.

另一方面,近年來,以便攜式設備為代表的各種電子設備在進一步小型化、高密度化方面也得到了迅猛發展,對所安裝的部件也提出了小型化和高密度部件收納的要求。尤其在撓性印刷基板中,為將導體部收納在更加狹小的框體內,對銅箔都進行了折疊加工。 On the other hand, in recent years, various electronic devices such as portable devices have been rapidly developed in terms of further miniaturization and high density, and requirements for miniaturization and high-density component storage have been demanded for mounted components. In particular, in a flexible printed circuit board, a copper foil is folded in order to accommodate a conductor portion in a narrower frame.

然而,這種折疊加工存在會使銅箔產生縫隙或斷裂等損壞的問題,為避免這種問題,需要開發一種對折疊加工具有良好耐久性的銅箔。 However, such a folding process has a problem that the copper foil may be damaged, such as a gap or a break. In order to avoid this problem, it is necessary to develop a copper foil having good durability for the folding process.

此處,「折疊(folding)加工」係指對銅箔的某個面實施180°折返之折彎加工。這種折疊加工不一定要緊貼著折彎,可以在折彎部份的內側夾入其他部件。此外,以下,將對於這種折疊加工的銅箔耐久性稱為「耐折疊性」。 Here, the "folding process" refers to a bending process in which a certain surface of the copper foil is folded back at 180 °. This folding process does not have to be close to the bend, and other parts can be clamped inside the bent portion. In addition, the copper foil durability with respect to such a folding process is hereinafter referred to as "foldability."

通常銅箔的折彎性或耐折性的評估多使用JIS P8115:2001中規定的MIT耐折性試驗或IPC彎曲試驗。例如,MIT耐折性試驗是在向銅箔施加負載的狀態下進行±135°的高速重複折彎,對該折彎次數進行評估。在這種方法下,拉伸強 度越高的銅箔,斷裂或電阻增大之前的折彎次數越多,通常被評估為具有良好的耐折性。此外,IPC彎曲試驗是180°折彎,但折彎半徑較大,是在銅箔的彈性變形範圍內進行折彎。在這種方法下,通常不是斷裂,而是評估電阻增大到一定程度之前的折彎次數。 In general, the evaluation of the bendability or folding resistance of a copper foil often uses the MIT bending resistance test or the IPC bending test specified in JIS P8115: 2001. For example, in the MIT bending resistance test, a high-speed repeated bending of ± 135 ° is performed with a load applied to the copper foil, and the number of bending times is evaluated. In this method, the tensile strength The higher the degree of copper foil, the more the number of bends before fracture or resistance increase, and it is generally evaluated as having good folding resistance. In addition, the IPC bending test is a 180 ° bending, but the bending radius is large, and the bending is performed within the elastic deformation range of the copper foil. In this method, instead of breaking, the number of bends before the resistance increases to a certain level is usually evaluated.

而折疊試驗是180°折彎的試驗,與MIT耐折性試驗等相比,折彎半徑小,是在銅箔的塑性變形範圍內進行折彎。因此,耐折疊性是負載模式與MIT耐折性試驗或IPC彎曲試驗完全不同的測量方法,試驗結果之間不一定對應。因此,專利文獻5中揭示之提高了MIT耐折性試驗之耐折性的銅箔、專利文獻6中揭示之提高了IPC彎曲試驗之彎曲性的銅箔未必具有足夠的耐折疊性。 The folding test is a 180 ° bending test. Compared with the MIT resistance test, the bending radius is small, and the bending is performed within the plastic deformation range of the copper foil. Therefore, the folding resistance is a measurement method in which the load mode is completely different from the MIT folding resistance test or the IPC bending test, and the test results do not necessarily correspond. Therefore, the copper foil disclosed in Patent Document 5 which improves the folding resistance of the MIT folding resistance test and the copper foil disclosed in Patent Document 6 which improves the bendability of the IPC bending test do not necessarily have sufficient folding resistance.

此外,銅箔的折疊試驗是伴隨180°折彎之折彎試驗,但現象與例如厚度超過50μm的銅條(copper strip)或銅板之180°折彎不同。即,銅箔由於其厚度非常薄(例如4至30μm),厚度方向上存在之結晶粒的數量少,彎曲內側與外側之間的壓縮應力與拉伸應力的差也小等原因,故而具有較厚的銅板帶所沒有的特徵。 In addition, the copper foil folding test is a bending test accompanying a 180 ° bend, but the phenomenon is different from, for example, a 180 ° bend of a copper strip or a copper plate having a thickness exceeding 50 μm. That is, because copper foil is very thin (for example, 4 to 30 μm), the number of crystal grains in the thickness direction is small, and the difference between the compressive stress and the tensile stress between the inner and outer sides of the bend is also small. Features not found in thick copper strips.

此外,耐折疊性與銅箔的延伸也沒有對應關係。例如,在專利文獻7中公開了一種技術,對延伸大而耐折疊性差的銅箔,藉由控制結晶方位與加工硬化指數來實現拉伸強度與耐折疊性的兼顧。然而,這種技術係關於壓延銅箔之技術,結晶方位與折彎性的關係等銅板帶中眾所周知的關係無法簡單適用於電解銅箔。即,電解銅箔具有電沉積組織,因此在空 位密度、位錯密度、擴散係數等方面,與壓延加工組織具有很大不同。 In addition, there is no correspondence between the folding resistance and the extension of the copper foil. For example, Patent Document 7 discloses a technology that achieves a balance between tensile strength and folding resistance by controlling the crystal orientation and work hardening index of a copper foil with large elongation and poor folding resistance. However, this technique is related to the technique of rolling copper foil, and the well-known relationships among copper plates and strips such as the relationship between crystal orientation and bendability cannot be easily applied to electrolytic copper foil. That is, the electrolytic copper foil has an electrodeposited structure, so Aspects such as bit density, dislocation density, and diffusion coefficient are very different from the calendering structure.

此外,為解決上述問題,例如在關於印刷電路板之專利文獻8中,提出了一種將與金屬層(銅箔)貼合的樹脂層的彈性率和厚度設在固定範圍內,使金屬層的表面粗糙度在規定值以下的方法;在專利文獻9中,提出了一種將聚醯亞胺層的拉伸彈性率、厚度以及銅箔的拉伸彈性率、厚度、平均結晶粒徑設在固定範圍內的方法;專利文獻10中,提出了一種將銅箔貼合於聚醯亞胺層之兩面時的各銅箔的厚度、平均結晶粒徑以及結晶方位控制在規定範圍內的方法。然而,這些對策大多受益於樹脂側之特性或粘貼銅箔之層疊板的構造,對於銅箔側的特性並非充分研究,因此期望銅箔側能提高特性。如果僅依靠銅箔側的特性便能夠改善耐折疊性,則選擇樹脂或設計基板之自由度將得以提高,如此便能使用信號傳輸性能更好的樹脂,並能夠進行更高效率的基板設計,作為撓性印刷基板的性能有望得到進一步提高。 In addition, in order to solve the above-mentioned problems, for example, in Patent Document 8 on a printed circuit board, it is proposed to set the elastic modulus and thickness of a resin layer bonded to a metal layer (copper foil) within a fixed range so that the A method in which the surface roughness is less than a predetermined value; Patent Document 9 proposes a method in which the tensile elastic modulus, thickness of a polyimide layer, and the tensile elastic modulus, thickness, and average crystal grain size of a copper foil are fixed. A method within the range; Patent Document 10 proposes a method of controlling the thickness, average crystal grain size, and crystal orientation of each copper foil when the copper foil is bonded to both sides of the polyimide layer within a predetermined range. However, most of these measures benefit from the characteristics of the resin side or the structure of the laminated board to which the copper foil is attached, and the characteristics of the copper foil side have not been sufficiently studied. Therefore, the characteristics of the copper foil side are expected to be improved. If the fold resistance can be improved by relying only on the characteristics of the copper foil side, the freedom of choosing a resin or designing a substrate will be improved, so that a resin with better signal transmission performance can be used, and a more efficient substrate design can be performed. The performance as a flexible printed circuit board is expected to be further improved.

另一方面,在銅箔中,作為提高耐折疊性的方法,眾所周知降低銅箔的拉伸強度可有效提高耐折疊性,然而拉伸強度並不能一味降低。即,鋰離子二次電池如上所述,在耐折疊性之外,銅箔之拉伸強度、加熱後之拉伸強度也需要在一定值以上,此外,在撓性基板中,銅箔的拉伸強度低時,在製造進一步薄箔化的撓性印刷基板時,在板材通過時和樹脂的模鑄步驟中,操作性會惡化。 On the other hand, as a method for improving folding resistance in copper foil, it is known that reducing the tensile strength of copper foil can effectively improve folding resistance, but the tensile strength cannot be reduced blindly. That is, as described above, in addition to the folding resistance of lithium ion secondary batteries, the tensile strength of copper foil and the tensile strength after heating need to be more than a certain value. In addition, in flexible substrates, the tensile strength of copper foil When the tensile strength is low, when a flexible printed circuit board that is further thinner is manufactured, the workability is deteriorated during the passage of the plate material and the resin molding step.

像這樣,由於提出了提升銅箔的耐折疊性和提升 拉伸強度這一對相反的要求,因此使用過去的銅箔,難以實現在具有高拉伸強度且加熱後仍維持高拉伸強度的同時,具有良好的耐折疊性。 As such, it is proposed to improve the folding resistance and improvement of copper foil Tensile strength is the opposite requirement. Therefore, using conventional copper foil, it is difficult to achieve high folding strength while maintaining high tensile strength after heating, and good folding resistance.

【先行技術文獻】 [Advanced technical literature]

【專利文獻】 [Patent Literature]

【專利文獻1】:日本專利第5588607號公報 [Patent Document 1]: Japanese Patent No. 5588607

【專利文獻2】:日本專利第5074611號公報 [Patent Document 2]: Japanese Patent No. 5074611

【專利文獻3】:日本專利第4583149號公報 [Patent Document 3]: Japanese Patent No. 4583149

【專利文獻4】:日本專利第4863636號公報 [Patent Document 4]: Japanese Patent No. 4863636

【專利文獻5】:日本專利第5301886號公報 [Patent Document 5]: Japanese Patent No. 5301886

【專利文獻6】:日本專利第5373970號公報 [Patent Document 6]: Japanese Patent No. 5373970

【專利文獻7】:國際公開第2012/128099號手冊 [Patent Document 7]: International Publication No. 2012/128099

【專利文獻8】:日本專利特開2012-006200公報 [Patent Document 8]: Japanese Patent Laid-Open No. 2012-006200

【專利文獻9】:日本專利特開2014-080021號公報 [Patent Document 9]: Japanese Patent Laid-Open No. 2014-080021

【專利文獻10】:日本專利特開2015-127120號公報 [Patent Document 10]: Japanese Patent Laid-Open No. 2015-127120

本發明鑒於以上情形開發完成,目的在於提供一種電解銅箔,其具有高拉伸強度,加熱後仍維持高拉伸強度,並且具有良好的耐折疊性。 The present invention has been developed in view of the above circumstances, and an object thereof is to provide an electrolytic copper foil that has high tensile strength, maintains high tensile strength after heating, and has good folding resistance.

本發明人等針對銅箔中含有的微量成份與耐折疊性以及拉伸強度的關係進行了深入研究,發現銅箔中的硫(S) 或氮(N)具有很好的拉伸強度的提升效果,但隨著其含量的增加,折疊性的降低十分明顯,而銅箔中的碳(C)及氯(Cl)對於拉伸強度沒有那麼大的提升效果,但其含量增加後,耐折疊性不會明顯下降,與硫(S)或氮(N)相比,耐折疊性之下降程度較為和緩,根據該調查結果,藉由將銅箔中含有的微量成份碳(C)、硫(S)、氮(N)以及氯(Cl)的含量分別控制在規定範圍內,成功兼顧了優秀的耐折疊性和高拉伸強度,從而完成了本發明。 The inventors have conducted in-depth research on the relationship between the trace components contained in the copper foil, folding resistance, and tensile strength, and found that sulfur (S) in the copper foil Or nitrogen (N) has a good effect of improving tensile strength, but as its content increases, the foldability decreases very significantly, and carbon (C) and chlorine (Cl) in copper foil have no effect on tensile strength. Such a large improvement effect, but after its content is increased, the folding resistance will not be significantly reduced. Compared with sulfur (S) or nitrogen (N), the degree of folding resistance is more moderate. According to the survey results, The content of carbon (C), sulfur (S), nitrogen (N), and chlorine (Cl), which are the trace components contained in the copper foil, are controlled within the specified ranges, respectively, and the excellent folding resistance and high tensile strength are successfully taken into account. The present invention has been completed.

即,本發明的要旨構成如下所述。 That is, the gist structure of this invention is as follows.

[1]一種電解銅箔,其特徵在於:碳(C)的含量為20至150質量ppm、硫(S)的含量為18質量ppm以下,氮(N)的含量為40質量ppm以下、氯(Cl)的含量為25至200質量ppm。 [1] An electrolytic copper foil characterized by a carbon (C) content of 20 to 150 mass ppm, a sulfur (S) content of 18 mass ppm or less, a nitrogen (N) content of 40 mass ppm or less, and chlorine The content of (Cl) is 25 to 200 mass ppm.

[2]根據上述[1]所述的電解銅箔,其中,該碳(C)的含量相對於該氯(Cl)的含量的比[C的含量/Cl的含量]在0.70至1.40範圍內。 [2] The electrolytic copper foil according to the above [1], wherein a ratio of the content of the carbon (C) to the content of the chlorine (Cl) [content of C / content of Cl] is in a range of 0.70 to 1.40 .

[3]根據上述[1]或[2]所述的電解銅箔,其中,在常態下測定的拉伸強度在380至600Mpa範圍內。 [3] The electrolytic copper foil according to the above [1] or [2], wherein the tensile strength measured in a normal state is in a range of 380 to 600 Mpa.

[4]根據上述[1]至[3]中任一項所述的電解銅箔,其中,在300℃、1小時之加熱後狀態下測定的拉伸強度在300至550Mpa範圍內。 [4] The electrolytic copper foil according to any one of the above [1] to [3], wherein a tensile strength measured in a state after heating at 300 ° C. for 1 hour is in a range of 300 to 550 MPa.

[5]根據上述[1]至[4]中任一項所述的電解銅箔,其中,導電率在85%IACS以上。 [5] The electrolytic copper foil according to any one of the above [1] to [4], wherein the electrical conductivity is 85% IACS or more.

[6]一種鋰離子二次電池,具有根據上述[1]至[5]中任一項所述的電解銅箔作為負極集電體。 [6] A lithium ion secondary battery having the electrolytic copper foil according to any one of the above [1] to [5] as a negative electrode current collector.

[7]一種印刷電路板,具有根據上述[1]至[5]中任一項所 述的電解銅箔作為導體部。 [7] A printed circuit board having the structure according to any one of the above [1] to [5] The electrolytic copper foil described above is used as the conductor portion.

藉由本發明,能夠提供一種電解銅箔,其具有高拉伸強度,加熱後仍維持高拉伸強度,並且能實現良好的耐折疊性。本發明所述電解銅箔適用於例如鋰離子二次電池負極集電體的製造,能提高電池容量、循環特性以及安全性。此外,還適用於例如印刷電路板之製造,能提高製造電路板時的操作性、進行撓性印刷基板的折疊加工時的耐久性。 With the present invention, it is possible to provide an electrolytic copper foil that has high tensile strength, maintains high tensile strength after heating, and can achieve good folding resistance. The electrolytic copper foil according to the present invention is suitable for, for example, manufacturing a negative electrode current collector of a lithium ion secondary battery, and can improve battery capacity, cycle characteristics, and safety. In addition, it is also applicable to, for example, the manufacture of a printed circuit board, and can improve the operability when manufacturing a circuit board and the durability when folding a flexible printed circuit board.

10‧‧‧銅箔 10‧‧‧ Copper foil

20‧‧‧隔層 20‧‧‧ compartment

30‧‧‧輥輪 30‧‧‧roller

X‧‧‧虛線區域 X‧‧‧ dashed area

圖1係模式性顯示實施例中進行折疊試驗時之情景的截面概要圖。 FIG. 1 is a schematic cross-sectional view schematically showing a scenario when a folding test is performed in the embodiment.

以下,具體說明本發明所述電解銅箔之優選實施方式。 Hereinafter, preferred embodiments of the electrolytic copper foil according to the present invention will be specifically described.

本發明所述電解銅箔之特徵在於,碳(C)的含量為20至150質量ppm、硫(S)的含量為18質量ppm以下,氮(N)的含量為40質量ppm以下、氯(Cl)的含量為25至200質量ppm。 The electrolytic copper foil according to the present invention has a carbon (C) content of 20 to 150 mass ppm, a sulfur (S) content of 18 mass ppm or less, a nitrogen (N) content of 40 mass ppm or less, and chlorine ( The content of Cl) is 25 to 200 mass ppm.

再者,本說明書中,電解銅箔係指藉由電解處理製作之銅箔,包含製箔後未經表面處理之未處理的銅箔以及根據需要已實施表面處理之銅箔(表面處理電解銅箔)。此外,電解銅箔的箔厚優選在30μm以下,更優選為4至15μm。以下,如未特別說明,「銅箔」意指「電解銅箔」。質量ppm係質量分數,即mg/kg。 In addition, in the present specification, electrolytic copper foil refers to a copper foil produced by electrolytic treatment, including untreated copper foil without surface treatment after the production of the foil, and copper foil that has been subjected to a surface treatment as required (surface-treated electrolytic copper). Foil). The thickness of the electrolytic copper foil is preferably 30 μm or less, and more preferably 4 to 15 μm. Hereinafter, unless otherwise specified, "copper foil" means "electrolytic copper foil". Mass ppm is the mass fraction, ie mg / kg.

<成份組成> <Ingredient composition>

以下為本發明所述電解銅箔之成份組成及其作用。 The following are the composition and functions of the electrolytic copper foil according to the present invention.

本發明所述電解銅箔中,碳(C)、硫(S)、氮(N)以及氯(Cl)之含量均被控制在以下規定範圍。 In the electrolytic copper foil according to the present invention, the contents of carbon (C), sulfur (S), nitrogen (N), and chlorine (Cl) are controlled within the following specified ranges.

[S含量:18質量ppm以下]以及[N含量:40質量ppm以下] [S content: 18 mass ppm or less] and [N content: 40 mass ppm or less]

S及N係具有提高拉伸強度作用之元素,而這些元素具有使銅箔之結晶粒界脆化的傾向,因此耐折疊性會顯著降低。 S and N are elements that increase the tensile strength, and these elements tend to embrittle the crystal grain boundary of the copper foil, so the folding resistance is significantly reduced.

S含量超過18質量ppm時,耐折疊性會極端惡化。因此,使S含量在18質量ppm以下,優選在13質量ppm以下。並且,S含量越少越好,下限值為0質量ppm,但從實用性之觀點考量,可為1質量ppm。 When the S content exceeds 18 mass ppm, folding resistance is extremely deteriorated. Therefore, the S content is set to 18 mass ppm or less, and preferably 13 mass ppm or less. The lower the S content, the better. The lower limit value is 0 mass ppm, but from the viewpoint of practicality, it may be 1 mass ppm.

N含量超過40質量ppm時,耐折疊性會極端惡化。因此,使N含量在40質量ppm以下,優選在30質量ppm以下。並且,N含量越少越好,下限值為0質量ppm,但從實用性之觀點考量,可為1質量ppm。 When the N content exceeds 40 mass ppm, folding resistance is extremely deteriorated. Therefore, the N content is set to 40 mass ppm or less, and preferably 30 mass ppm or less. The lower the N content, the better. The lower limit value is 0 mass ppm, but from the viewpoint of practicality, it may be 1 mass ppm.

[C含量:20至150質量ppm]以及[Cl含量:25至200質量ppm] [C content: 20 to 150 mass ppm] and [Cl content: 25 to 200 mass ppm]

C以及Cl雖然是具有提高拉伸強度作用的元素,但與上述S或N不同,其使銅箔之結晶粒界脆化的作用小,不會使耐折疊性顯著降低。 Although C and Cl are elements having an effect of improving tensile strength, unlike S or N described above, the effect of embrittlement of the crystal grain boundary of the copper foil is small, and the folding resistance is not significantly reduced.

C含量低於20質量ppm時,無法充分發揮提高拉伸強度的效果,超過150質量ppm時,耐折疊性有降低之傾向。因此,從兼顧拉伸強度與耐折疊性之觀點考量,C含量應為20至150質量ppm,優選為30至140質量ppm,更優選為60至 140質量ppm。 When the C content is less than 20 mass ppm, the effect of improving the tensile strength cannot be fully exhibited, and when it exceeds 150 mass ppm, the folding resistance tends to decrease. Therefore, from the viewpoint of taking both tensile strength and folding resistance into consideration, the C content should be 20 to 150 mass ppm, preferably 30 to 140 mass ppm, and more preferably 60 to 140 mass ppm.

Cl含量低於25質量ppm時,無法充分發揮提高拉伸強度的效果,超過200質量ppm時,耐折疊性有降低之傾向。因此,從兼顧拉伸強度與耐折疊性之觀點考量,Cl含量應為25至200質量ppm,優選為30至180質量ppm,更優選為50至150質量ppm。 When the content of Cl is less than 25 mass ppm, the effect of improving the tensile strength cannot be sufficiently exerted, and when it exceeds 200 mass ppm, the folding resistance tends to decrease. Therefore, from the viewpoint of taking both tensile strength and folding resistance into consideration, the Cl content should be 25 to 200 mass ppm, preferably 30 to 180 mass ppm, and more preferably 50 to 150 mass ppm.

此外,C含量與Cl含量的比[C含量/Cl含量]優選在0.70至1.40範圍內,藉由控制在上述範圍內,可進一步提高銅箔之耐折疊性的提升效果。眾所周知,使有機添加劑有效吸附於銅箔時需要Cl。其機理尚不明確,但據稱係因為Cu+-有機添加劑之絡合物會靜電吸附於銅基材表面上特異性吸附之Cl-,於是Cu+-有機添加劑之絡合物經由Cl-吸附於銅基材上。然後,間接吸附於銅基材上的Cu+還原成Cu原子並析出於銅基材上時,一同吸附的有機添加劑(C)以及Cl也同時進入銅箔。因此,C與Cl的存在比的平衡被破壞,銅箔中的C與Cl的存在狀態變化,無法充分獲得銅箔之耐折疊性提升效果。 In addition, the ratio of the C content to the Cl content [C content / Cl content] is preferably in the range of 0.70 to 1.40, and by controlling the above range, the effect of improving the folding resistance of the copper foil can be further improved. It is well known that Cl is required for effective adsorption of organic additives on copper foil. Its mechanism is not clear, but because the system is said to Cu + - complex of organic additive will be electrostatically adsorbed on specific adsorption on the surface of the copper substrate Cl -, then Cu + - complex of organic additive via Cl - Adsorption On a copper substrate. Then, when Cu + indirectly adsorbed on the copper substrate is reduced to Cu atoms and precipitated on the copper substrate, the organic additives (C) and Cl adsorbed together also enter the copper foil at the same time. Therefore, the balance of the existence ratio of C and Cl is broken, the existence state of C and Cl in the copper foil is changed, and the effect of improving the folding resistance of the copper foil cannot be sufficiently obtained.

[其他微量成份] [Other trace ingredients]

在不妨礙本發明之效果的範圍內,本發明所述電解銅箔除上述成份之外,還可含有源於各種添加劑之成份以及不可避免之雜質。 To the extent that the effect of the present invention is not impaired, the electrolytic copper foil of the present invention may contain components derived from various additives and unavoidable impurities in addition to the aforementioned components.

再者,此處所言之源於各種添加劑之成份意指源於製造電解銅箔時使用的有機添加劑或無機添加劑的成份中的除上述成份之外的成份。這種源於各種添加劑的成份的含量上限值優選為100質量ppm。 In addition, the component derived from various additives mentioned here means a component other than the above-mentioned components among components derived from an organic additive or an inorganic additive used in the production of electrolytic copper foil. The upper limit of the content of the components derived from various additives is preferably 100 mass ppm.

此外,此處所言之不可避免之雜質意指含有程度為在製造步驟中不可避免要含有的雜質。作為不可避免之雜質而列舉之成份例如由鐵(Fe)、氧(O)等。不可避免之雜質的含量上限值優選為100質量ppm。根據不可避免之雜質的成份與含量,可能會導致銅箔特性值降低,因此優選進一步抑制其含量。 In addition, the term "unavoidable impurities" as used herein means impurities that are inevitably contained in a manufacturing step. The components listed as unavoidable impurities are, for example, iron (Fe), oxygen (O), and the like. The upper limit of the content of the inevitable impurities is preferably 100 mass ppm. Depending on the composition and content of unavoidable impurities, the characteristic value of the copper foil may be lowered. Therefore, it is preferable to further suppress the content.

<電解銅箔之製造方法> <Manufacturing method of electrolytic copper foil>

下面針對本發明所述電解銅箔(或表面處理電解銅箔)之優選製造方法進行說明。 The preferred manufacturing method of the electrolytic copper foil (or surface-treated electrolytic copper foil) according to the present invention is described below.

本發明所述電解銅箔例如採用以下方法製造,即藉由使用硫酸-硫酸銅水溶液作為電解液,並於不溶性陽極與和該陽極對向設置之鈦製陰極輥之間供給該電解液,一邊以固定速度旋轉陰極輥,一邊於兩極間接通直流電流,從而使銅析出至陰極輥表面上,並將所析出之銅從陰極輥表面上撕下,連續地進行捲繞,該不溶性陽極由被鉑族元素或其氧化物元素覆蓋之鈦構成。再者,該裝置僅為一例。 The electrolytic copper foil of the present invention is produced, for example, by using a sulfuric acid-copper sulfate aqueous solution as an electrolytic solution, and supplying the electrolytic solution between an insoluble anode and a titanium cathode roller provided opposite the anode, The cathode roller is rotated at a fixed speed, and a DC current is applied between the two electrodes, so that copper is precipitated on the surface of the cathode roller, and the precipitated copper is torn off from the surface of the cathode roller and continuously wound. The insoluble anode is Titanium covered with platinum group elements or oxide elements. Moreover, this device is only an example.

尤其是本發明所述電解銅箔藉由在製成箔之銅箔中儘量不含S或N之條件下製造,能夠實現銅箔中之硫(S)的含量在18質量ppm以下且氮(N)的含量在40質量ppm以下的狀態。 In particular, the electrolytic copper foil according to the present invention is manufactured under conditions that do not contain S or N as much as possible in the copper foil made into the foil, and can achieve a sulfur (S) content in the copper foil of 18 mass ppm or less and nitrogen ( N) The state where the content is 40 mass ppm or less.

通常,為實現銅箔之高強度化、高耐熱化,一般會在電解液中添加添加劑。作為此種添加劑,可列舉有機添加劑和無機添加劑,尤其優選有機添加劑。此種一般採用之有機添加劑的分子構造中,多含有S或N。在分子構造中含有S或N之有機添加劑對於銅箔之吸附性強,因此很容易被吸收進銅箔中。此現象係源於S及N所擁有之非共用電子對。 Generally, in order to increase the strength and heat resistance of copper foil, additives are generally added to the electrolytic solution. Examples of such additives include organic additives and inorganic additives, and organic additives are particularly preferred. The molecular structure of such commonly used organic additives often contains S or N. Organic additives containing S or N in the molecular structure have a strong adsorption on copper foil, so they can be easily absorbed into the copper foil. This phenomenon originates from the unshared electron pairs owned by S and N.

因此,如上所述,從獲得將銅箔中之S及N之含量控制在規定範圍的銅箔之觀點考量,優選使用分子構造中不含S及N之有機添加劑。藉由使用此種有機添加劑,可有效防止源於有機添加劑之S及N被吸收至銅箔中。 Therefore, as described above, from the viewpoint of obtaining a copper foil in which the contents of S and N in the copper foil are controlled within a predetermined range, it is preferable to use an organic additive that does not include S and N in the molecular structure. By using such an organic additive, S and N derived from the organic additive can be effectively prevented from being absorbed into the copper foil.

作為分子構造中不含S及N之有機添加劑,例如可列舉聚醚(聚乙二醇、聚丙二醇等)、水溶性多糖類(羥乙基纖維素、羧甲基纖維素等)等。尤其是考慮到電解銅箔之量產性,相比單分子化合物,優選在電解液中具有高穩定性之傾向的高分子化合物。 Examples of organic additives not containing S and N in the molecular structure include polyethers (polyethylene glycol, polypropylene glycol, etc.), water-soluble polysaccharides (hydroxyethyl cellulose, carboxymethyl cellulose, and the like), and the like. In particular, considering the mass productivity of the electrolytic copper foil, a polymer compound having a tendency to have high stability in an electrolytic solution is preferable to a monomolecular compound.

如上所述,從獲得將銅箔中之S及N控制在規定範圍的銅箔之觀點考量,亦可使用分子構造中不含S及N之無機添加劑,但使用無機添加劑時,電解液中無機添加劑會沉澱,導致量產性惡化,並且導電率降低,無法確保良好之耐折疊性。因此,作為添加劑,優選使用上述有機添加劑。 As described above, from the viewpoint of obtaining a copper foil in which S and N in the copper foil are controlled within a predetermined range, an inorganic additive that does not include S and N in the molecular structure may be used. However, when an inorganic additive is used, the inorganic in the electrolytic solution is inorganic. Additives will precipitate, resulting in deterioration of mass productivity, and lowering of electrical conductivity, which cannot ensure good folding resistance. Therefore, as the additive, the above-mentioned organic additive is preferably used.

進而,如上所述,藉由使用分子構造中不含S及N之有機添加劑,能夠將所獲得之銅箔中的S及N的含量控制在上述範圍內,然而從進一步降低銅箔中之S及N的含量之觀點考量,優選使用盡可能降低電解液中S及N濃度的方法,例如使用高純度試劑、選擇活性碳種類,在投入銅原料前進行酸洗等。 Furthermore, as described above, by using an organic additive that does not contain S and N in the molecular structure, the content of S and N in the obtained copper foil can be controlled within the above-mentioned range. However, the S in the copper foil can be further reduced. From the viewpoint of the content of N and N, it is preferable to use a method that reduces the concentration of S and N in the electrolytic solution as much as possible, such as using a high-purity reagent, selecting the type of activated carbon, and pickling before putting in a copper raw material.

調製電解液所使用之硫酸及硫酸銅試劑、添加劑的試劑中,有時會以雜質的形式含有S或N。此外,銅原料或活性碳(用於製造電解銅箔時進行的活性碳處理)的附著物或雜質中也可能含有S或N。其中,反應性、吸附性高的化合物藉由適當採用活性碳處理加以清除、或者藉由電解反應進行分 解,在電解液中不易變濃,而反應性較低的化合物則會在電解液中緩慢蓄積。因此,雖然與有意添加的有機添加劑所帶來的S及N相比影響度很小,但對於由試劑或活性碳等帶來的S及N,也希望盡可能將其除去。 Sulfuric acid, copper sulfate reagents, and additives for preparing electrolytes may contain S or N as impurities. In addition, S or N may be contained in attachments or impurities of copper raw materials or activated carbon (the activated carbon treatment used in the production of electrolytic copper foil). Among them, compounds having high reactivity and adsorption properties are removed by appropriate treatment with activated carbon, or are separated by electrolytic reaction. Solution, it is not easy to thicken in the electrolytic solution, and the less reactive compounds are slowly accumulated in the electrolytic solution. Therefore, although the degree of influence is small compared to S and N brought by intentionally added organic additives, it is also desirable to remove S and N brought by reagents, activated carbon, etc. as much as possible.

需要說明的是,即使進行這些處理,也難以將含有S或N之雜質從電解液中完全清除,要保持電解液中S或N的濃度為零,作業負擔便會增大。因此,考慮到實際製造,從實用性之觀點考量,銅箔中之S及N的含量,可分別在1質量ppm以上。即,只要S的含量在18質量ppm以下、N的含量在40質量ppm以下,則不會對折疊性造成太大影響。 It should be noted that even if these processes are performed, it is difficult to completely remove impurities containing S or N from the electrolytic solution. If the concentration of S or N in the electrolytic solution is kept to zero, the work load will increase. Therefore, in consideration of practical manufacturing, from the viewpoint of practicality, the contents of S and N in the copper foil may be 1 mass ppm or more, respectively. That is, as long as the content of S is 18 mass ppm or less and the content of N is 40 mass ppm or less, the foldability is not affected much.

此外,本發明所述電解銅箔藉由在製成箔之銅箔中含有適量C及Cl之條件下製造,能夠實現銅箔中之碳(C)的含量在20至150質量ppm範圍內,且氯(Cl)的含量在25至200質量ppm範圍內的狀態。 In addition, the electrolytic copper foil according to the present invention is manufactured under the condition that the copper foil made of the foil contains appropriate amounts of C and Cl, and the carbon (C) content in the copper foil can be achieved in the range of 20 to 150 mass ppm. And the state of the content of chlorine (Cl) in the range of 25 to 200 mass ppm.

通常,為實現銅箔之高強度化、高耐熱化,希望銅箔吸收大量的有機添加劑(例如C含量多)。然而,不含S及N之有機添加劑與含有S或N之有機添加劑相比,對銅的吸附性低,因此吸收進銅箔的量有較少的傾向。因此,使用不含S及N之有機添加劑時,為了提高銅箔中的C及Cl含量以達到能夠實現銅箔高強度化、高耐熱化的程度,例如調整電解液中的氯化物離子(Cl-)濃度是有效的方法。眾所周知,電解液中的氯化物離子與有機添加劑相互作用,使有機添加劑容易被吸收進銅箔中。而另一方面,當銅箔中吸收的C及Cl量過多時,耐折疊性會有惡化之傾向。 Generally, in order to achieve high strength and high heat resistance of a copper foil, it is desirable that the copper foil absorb a large amount of organic additives (for example, the C content is large). However, compared with organic additives containing S or N, the organic additives not containing S and N have a lower adsorption to copper, and therefore, the amount absorbed into the copper foil tends to be smaller. Therefore, when using organic additives that do not contain S and N, in order to increase the C and Cl content in the copper foil so as to achieve high strength and high heat resistance of the copper foil, for example, the chloride ion (Cl - ) Concentration is an effective method. It is well known that the chloride ions in the electrolyte interact with the organic additives, so that the organic additives are easily absorbed into the copper foil. On the other hand, when the amount of C and Cl absorbed in the copper foil is excessive, the folding resistance tends to deteriorate.

因此,如上所述,從獲得將銅箔中之C及Cl之含量控制在規定範圍的銅箔之觀點考量,優選對電解液中的氯化物離子濃度進行控制。具體而言,電解液中的氯化物離子濃度優選為150至250mg/L,更加優選為150至200mg/L。藉由控制在上述範圍,可有效控制銅箔中的C及Cl的含量。另一方面,當氯化物離子低於150mg/L時,銅箔中含有的C及Cl的量會變小,難以獲得高強度、高耐熱的效果。此外,當氯化物離子超過250mg/L時,銅箔中吸收的C及Cl量變多,耐折疊性會惡化。 Therefore, as described above, it is preferable to control the chloride ion concentration in the electrolytic solution from the viewpoint of obtaining a copper foil in which the content of C and Cl in the copper foil is controlled within a predetermined range. Specifically, the chloride ion concentration in the electrolytic solution is preferably 150 to 250 mg / L, and more preferably 150 to 200 mg / L. By controlling the above range, the content of C and Cl in the copper foil can be effectively controlled. On the other hand, when the chloride ion is less than 150 mg / L, the amount of C and Cl contained in the copper foil becomes small, and it is difficult to obtain high strength and high heat resistance effects. In addition, when the chloride ion exceeds 250 mg / L, the amount of C and Cl absorbed in the copper foil increases, and the folding resistance is deteriorated.

此外,銅箔中的[C含量/Cl含量]原則上能夠利用電解液中的有機添加劑濃度與氯化物離子濃度的比來進行管理,但優選的濃度比範圍亦可利用有機添加劑種類等其他影響來適當調整。 In addition, the [C content / Cl content] in copper foil can be managed in principle by using the ratio of the concentration of organic additives in the electrolyte to the concentration of chloride ions. To adjust appropriately.

以下列舉電解銅箔製造用電解液的優選組成之一例。 An example of a preferable composition of the electrolytic solution for manufacturing an electrolytic copper foil is given below.

銅濃度50至100g/L Copper concentration 50 to 100 g / L

硫酸濃度40至120g/L Sulfuric acid concentration of 40 to 120 g / L

有機添加劑0.1至100mg/L Organic additives 0.1 to 100 mg / L

氯化物離子150至250mg/L Chloride ion 150 to 250mg / L

如上所述,在製成箔之銅箔中儘量不含S或N之條件以及適量吸收C或Cl之條件下製造十分重要,為此,適當控制電解條件,有意添加有機添加劑是優選且有效的方法。 As described above, it is important to manufacture under conditions that do not contain S or N as much as possible in the copper foil that is made into the foil, and under conditions that appropriately absorb C or Cl. For this reason, it is preferable and effective to properly control the electrolytic conditions and intentionally add organic additives. method.

通常,在銅箔的製造中,一般會使用晶閘管式直流電源。原理上,晶閘管式直流電源之輸出電壓會以50或60Hz 的頻率振動(脈動)。例如,使用脈動率為10%之晶閘管式直流電源時,每秒會產生100次或120次、最大高低差10%之電壓振動。 Generally, in the manufacture of copper foil, a thyristor DC power supply is generally used. In principle, the output voltage of a thyristor DC power supply will be 50 or 60 Hz. Frequency (pulsation). For example, when a thyristor DC power supply with a pulsation rate of 10% is used, a voltage vibration of 100 or 120 times per second with a maximum height difference of 10% will be generated.

眾所周知,此種脈動對於有機添加劑之吸附、吸收行為以及銅之析出行為等電位響應之反應具有非常大的影響,然而其詳細調查和分析極為困難,因此目前通常在銅箔的製造中不考慮脈動之影響。結果,由於脈動之影響,有時會出現有機添加劑不能有效吸收、或結晶粒界發生異常偏析、或有機添加劑反而造成過多吸收的情形。 As we all know, this kind of pulsation has a great influence on the potential response of organic additives such as adsorption, absorption behavior and copper precipitation behavior. However, detailed investigation and analysis are extremely difficult. Therefore, pulsation is usually not considered in the manufacture of copper foil. Influence. As a result, due to the influence of pulsation, there may be cases where the organic additive cannot be effectively absorbed, or abnormal segregation occurs at the crystal grain boundary, or the organic additive causes excessive absorption.

因此,本發明之電解銅箔的製造中,優選在外部干擾少的狀況下,調整電解條件,以取得有機添加劑本來的吸附行為。具體而言,希望在儘量不產生上述電源電壓脈動的電解條件下製造電解銅箔,例如優選使用逆變器式直流電源進行製造。 Therefore, in the production of the electrolytic copper foil of the present invention, it is preferable to adjust the electrolytic conditions to obtain the original adsorption behavior of the organic additive in a state where there is little external interference. Specifically, it is desirable to manufacture the electrolytic copper foil under electrolytic conditions in which the above-mentioned power supply voltage ripple is not generated as much as possible, and for example, it is preferable to use an inverter-type DC power supply for manufacturing.

逆變器式直流電源在原理上是在更高頻率的區域控制,因此可視為實質上沒有脈動影響。因此,藉由使用逆變器式直流電源,針對有機添加劑,能夠容易調整外部干擾少的狀況。 The inverter-type DC power supply is controlled in a higher frequency area in principle, so it can be regarded as having substantially no pulsation effect. Therefore, by using an inverter-type DC power supply, it is possible to easily adjust the situation with little external interference with respect to the organic additive.

此外,使用晶閘管式直流電源時,亦可藉由在脈動盡可能少的條件下進行電解,或者選擇不易受到脈動影響之添加劑或電解條件,獲得脈動影響少的電解條件。 In addition, when using a thyristor-type DC power supply, it is also possible to obtain electrolytic conditions with less pulsation by performing electrolysis under conditions with as few pulsations as possible, or by selecting additives or electrolytic conditions that are not easily affected by pulsations.

本發明中,如上所述,推薦使用不含S及N之有機添加劑,以儘量使製成箔的銅箔中不含S或N,但此種有機添加劑對於銅之吸附力相對較弱。因此,在上述脈動之影響 下,有機添加劑更加難以吸收至銅箔中,因此從銅箔之高強度化、高耐熱化直觀點考量並非優選。但是,如上所述,藉由採用儘量不產生脈動之方法進行電解,即使使用了不含S及N之有機添加劑,亦可有效將有機添加劑吸收入銅箔,並且能夠獲得較為均一之組織。 In the present invention, as described above, it is recommended to use an organic additive that does not contain S and N in order to make the copper foil made of foil free of S or N as much as possible, but the organic additive has relatively weak adsorption force for copper. Therefore, the effects of the above pulsations In addition, it is more difficult for organic additives to be absorbed into the copper foil, so it is not preferable to consider the high strength and high heat resistance of the copper foil intuitively. However, as described above, by performing electrolysis using a method that does not generate pulsation as much as possible, even if an organic additive containing no S and N is used, the organic additive can be effectively absorbed into the copper foil, and a relatively uniform structure can be obtained.

此外,優選電解液之液溫在40至60℃,陰極電極面之平均電流密度為45至60A/dm2In addition, the liquid temperature of the electrolytic solution is preferably 40 to 60 ° C, and the average current density of the cathode electrode surface is 45 to 60 A / dm 2 .

本發明之電解銅箔根據需要,優選在其表面之至少一方上進行表面處理。 The electrolytic copper foil of the present invention is preferably subjected to a surface treatment on at least one of its surfaces as necessary.

作為銅箔之表面處理,例如可實施鉻酸鹽處理、或者Ni或Ni合金電鍍、Co或Co合金電鍍、Zn或Zn合金電鍍、Sn或Sn合金電鍍,於上述各種鍍層上再實施鉻酸鹽處理等之無機防銹處理、或者使用苯並三唑等之有機防銹處理、矽烷偶合劑處理等。上述表面處理除了防銹以外,例如作為鋰離子二次電池之負極集電體使用時,還可發揮提高與活性物質之黏合強度,進而防止電池之充放電循環效率降低之作用。這些防銹處理通常相對於銅箔厚度,以極薄之厚度進行處理。因此,對耐折疊性或拉伸強度幾無影響。 As the surface treatment of the copper foil, for example, chromate treatment, or Ni or Ni alloy plating, Co or Co alloy plating, Zn or Zn alloy plating, Sn or Sn alloy plating can be performed, and then chromate can be applied to the above various plating layers. Inorganic antirust treatment such as treatment, or organic antirust treatment using benzotriazole, etc., and silane coupling agent treatment. In addition to rust prevention, the surface treatment described above, for example, when used as a negative electrode current collector of a lithium ion secondary battery, can also play a role of increasing the adhesion strength with an active material, thereby preventing the charge and discharge cycle efficiency of the battery from decreasing. These rust preventive treatments are usually performed with extremely thin thicknesses relative to the thickness of the copper foil. Therefore, it has little effect on folding resistance or tensile strength.

於對銅箔實施上述表面處理前,根據需要亦可對銅箔表面實施粗化處理。作為粗化處理,可優選採用例如電鍍法、蝕刻法等。這些粗化處理具有進一步提高與作為印刷電路板導體部使用時之電路板樹脂的黏著性、與作為鋰離子二次電池之負極集電體使用時之活性物質的黏著性的作用。 Before performing the surface treatment on the copper foil, the surface of the copper foil may be subjected to a roughening treatment as necessary. As the roughening treatment, for example, a plating method, an etching method, or the like can be preferably used. These roughening treatments have the effect of further improving the adhesion to the circuit board resin when used as a conductor portion of a printed circuit board, and the adhesion to an active material when used as a negative electrode current collector of a lithium ion secondary battery.

作為採用電鍍法之粗化處理,能夠採用電解電鍍 法及無電解電鍍法。藉由Cu、Co以及Ni中之1種金屬之金屬電鍍或含有其中2種以上金屬之合金電鍍,能夠形成粗化粒子。 As a roughening treatment using a plating method, electrolytic plating can be used Method and electroless plating method. Coarse particles can be formed by metal plating of one metal of Cu, Co, and Ni or alloy plating containing two or more of these metals.

此外,作為採用蝕刻法之粗化處理,優選例如物理蝕刻及化學蝕刻之方法。例如,作為物理蝕刻,可列舉利用噴砂等進行蝕刻之方法。此外,作為化學蝕刻,可列舉利用處理液等進行蝕刻之方法。尤其進行化學蝕刻時,作為處理液,能夠使用含有無機或有機酸、氧化劑、添加劑之公知的處理液。 In addition, as the roughening treatment using an etching method, a method such as physical etching and chemical etching is preferable. For example, as the physical etching, a method of etching by sandblasting or the like can be mentioned. Moreover, as a chemical etching, the method of performing an etching using a processing liquid etc. is mentioned. In particular, when performing chemical etching, as the processing liquid, a known processing liquid containing an inorganic or organic acid, an oxidizing agent, and an additive can be used.

<電解銅箔之特性> <Characteristics of electrolytic copper foil>

本發明所述電解銅箔在常態下優選拉伸強度在380MPa以上,更優選為380至600MPa,進一步優選為400至600MPa範圍內。藉由控制在上述範圍內,可進一步提高電池或電路板製造時之操作性及耐久性。再者,本說明書中,所謂「常態」,除了銅箔不具有任何熱歷程的(被製造後未經加熱的)狀態外,還包含具有60℃以下熱歷程的(在60℃下被加熱後的)狀態。 The electrolytic copper foil according to the present invention preferably has a tensile strength of 380 MPa or more under normal conditions, more preferably 380 to 600 MPa, and still more preferably 400 to 600 MPa. By controlling within the above range, the operability and durability during battery or circuit board manufacturing can be further improved. In addition, in this specification, the "normal state" includes a state in which the copper foil does not have any thermal history (unheated after being manufactured), and includes a thermal history of 60 ° C or lower (after being heated at 60 ° C). status.

此外,本發明所述電解銅箔在具有300℃、1小時熱歷程的(在300℃、1小時條件下加熱後的)狀態下,優選拉伸強度在300MPa以上,更優選為300至550MPa,進一步優選為350至550MPa範圍內。藉由控制在上述範圍內,可進一步提高電池或電路板製造時之操作性及耐久性。 In addition, the electrolytic copper foil according to the present invention preferably has a tensile strength of 300 MPa or more, more preferably 300 to 550 MPa, in a state (after heating at 300 ° C and 1 hour) with a thermal history of 300 ° C and 1 hour. It is more preferably within a range of 350 to 550 MPa. By controlling within the above range, the operability and durability during battery or circuit board manufacturing can be further improved.

再者,上述拉伸強度均係依照IPC-TM-650,在室溫(25℃±10℃)下測定的值。 The tensile strengths described above are all values measured at room temperature (25 ° C ± 10 ° C) in accordance with IPC-TM-650.

此外,本發明所述電解銅箔優選導電率為85% IACS以上,更優選為90% IACS以上。通常電解銅箔之高強度 化具有降低導電率之傾向,但本發明之電解銅箔吸收大量C及Cl從而實現高強度化,因此能夠減少導電率之降低。本發明之電解銅箔係作為導電部件使用,因此希望導電率越高越好。需要說明的是,上述導電率係依照JISH0505:1975測定之值。 In addition, the electrolytic copper foil according to the present invention preferably has a conductivity of 85% IACS or more, and more preferably 90% IACS or more. High strength of electrolytic copper foil It has a tendency to reduce the conductivity, but the electrolytic copper foil of the present invention absorbs a large amount of C and Cl to achieve high strength, so it is possible to reduce the decrease in conductivity. Since the electrolytic copper foil of the present invention is used as a conductive member, the higher the conductivity, the better. In addition, the said electric conductivity is the value measured based on JISH0505: 1975.

本發明之電解銅箔優選用於鋰離子二次電池之負極集電體及印刷電路板之導體部之至少一方的製造。尤其作為鋰離子二次電池之負極集電體使用時,由於其具有高強度、高耐熱性,因此在製造電池時以及充放電時具有優異的耐久性和耐折疊性,具有能夠實現更高密度之電極收納的優點。此外,作為印刷電路板之導體部使用時,由於其具有高強度、高耐熱性,因此在製造印刷電路板時具有優異的操作性和耐折疊性,具有能夠實現更高密度之安裝的優點。本發明之電解銅箔更優選同時用於鋰離子二次電池之負極集電體以及印刷電路板之導體部之雙方,此種銅箔之通用性高,在銅箔之製造中,無需改換製造條件也不需要其他生產線,因此具有非常經濟之優點。 The electrolytic copper foil of the present invention is preferably used for manufacturing at least one of a negative electrode current collector of a lithium ion secondary battery and a conductor portion of a printed circuit board. Especially when used as a negative electrode current collector of a lithium ion secondary battery, it has high strength and high heat resistance, so it has excellent durability and folding resistance during battery manufacturing and charging and discharging, and can achieve higher density. Advantages of electrode storage. In addition, when it is used as a conductor portion of a printed circuit board, since it has high strength and high heat resistance, it has excellent operability and folding resistance when manufacturing a printed circuit board, and has the advantage of enabling higher density mounting. The electrolytic copper foil of the present invention is more preferably used for both a negative electrode current collector of a lithium ion secondary battery and a conductor portion of a printed circuit board. Conditions do not require other production lines, so it has a very economical advantage.

以上針對本發明之實施方式進行了說明,上述實施方式僅為本發明之一例,在本發明之範圍內,包含本發明之概念及申請專利範圍中包含的所有形態在內,可進行各種變更。 The embodiment of the present invention has been described above. The above embodiment is only an example of the present invention. Within the scope of the present invention, various changes can be made including the concept of the present invention and all forms included in the scope of patent application.

【實施例】 [Example]

以下,為進一步明確本發明之效果,針對實施例及比較例進行說明。 Hereinafter, in order to further clarify the effects of the present invention, examples and comparative examples will be described.

(實施例1) (Example 1)

藉由於不溶性陽極與和該陽極對向設置之鈦製陰極輥之間供給電解液,一邊以固定速度旋轉陰極輥,一邊於兩 極間接通直流電流,從而使銅析出至陰極輥表面上,製作厚度8μm之未處理銅箔,該不溶性陽極由被鉑族元素或其氧化物元素覆蓋之鈦構成。 Since the electrolyte is supplied between the insoluble anode and a titanium cathode roller provided opposite the anode, the cathode roller is rotated at a constant speed while A DC current was applied between the electrodes to deposit copper on the surface of the cathode roll, and an untreated copper foil having a thickness of 8 μm was produced. The insoluble anode was composed of titanium covered with a platinum group element or an oxide element thereof.

電解液使用硫酸-硫酸銅類電解液,其中,銅濃度被調整為80g/L,硫酸濃度被調整為80g/L。此外,在該電解液中,按照表1調整添加劑及其濃度、以及氯化物離子(Cl-)濃度,使用表1所示的直流電源作為整流器,調整電解液的溫度為50℃、電流密度為40A/dm2、液流速為1.0m/s。 As the electrolytic solution, a sulfuric acid-copper sulfate-based electrolytic solution was used, in which the copper concentration was adjusted to 80 g / L and the sulfuric acid concentration was adjusted to 80 g / L. Further, in the electrolyte, in Table 1 and adjusting the concentration of the additive, and the chloride ion (Cl -) concentration of the DC power supply as shown, using Table 1 as a rectifier, to adjust the temperature of the electrolyte is 50 ℃, current density 40A / dm 2 , liquid flow rate is 1.0m / s.

進而,針對在上述條件下製作之未處理銅箔,在製成箔之後立即進行了鉻酸鹽處理。具體而言,將上述未處理銅箔於45℃之7g/L鉻酸酐水溶液中浸漬5秒後,排去液體,並進行空氣乾燥。 Furthermore, the untreated copper foil produced under the above-mentioned conditions was subjected to a chromate treatment immediately after forming the foil. Specifically, after immersing the untreated copper foil in a 7 g / L chromic anhydride aqueous solution at 45 ° C. for 5 seconds, the liquid was drained and air-dried.

(實施例2至6及9) (Examples 2 to 6 and 9)

實施例2至6及9中,除了添加劑以及氯化物離子之條件、以及作為整流器使用之直流電源的條件的至少1條如表1所示有所變化外,與實施例1採用同樣的方法製作銅箔。 Examples 2 to 6 and 9 were produced in the same manner as in Example 1 except that at least one of the conditions of the additives and chloride ions and the conditions of the DC power source used as a rectifier was changed as shown in Table 1. Copper foil.

(實施例7及8) (Examples 7 and 8)

實施例7及8中,添加劑以及氯化物離子之條件如表1所示有所變化,並且在以下所示條件下進行了粗化處理,除此之外,與實施例1採用同樣的方法製作銅箔。粗化處理在銅濃度30g/L、硫酸濃度180g/L、浴溫25℃、電流密度40A/dm2、處理時間4秒之條件下進行。 In Examples 7 and 8, the conditions of the additives and chloride ions were changed as shown in Table 1, and roughened under the conditions shown below, except that they were produced in the same manner as in Example 1. Copper foil. The roughening treatment was performed under conditions of a copper concentration of 30 g / L, a sulfuric acid concentration of 180 g / L, a bath temperature of 25 ° C, a current density of 40 A / dm 2 , and a treatment time of 4 seconds.

(比較例1至9) (Comparative Examples 1 to 9)

在比較例1至9中,除了添加劑以及氯化物離子 之條件、以及作為整流器使用之直流電源的至少1條如表1所示有所變化外,與實施例1採用同樣的方法製作銅箔。 In Comparative Examples 1 to 9, except for additives and chloride ions The conditions and at least one of the DC power supplies used as a rectifier were changed as shown in Table 1. A copper foil was produced in the same manner as in Example 1.

(比較例10) (Comparative Example 10)

比較例10中,使用調整為銅濃度80g/L、硫酸濃度140g/L之硫酸-硫酸銅類電解液,在電解液中,按照表1調整添加劑及其濃度、以及氯化物離子濃度,使用表1所示的直流電源作為整流器,調整電解液的溫度為50℃、電流密度為52A/dm2、液流速為0.4m/s製作未處理銅箔,除此之外,與實施例1採用同樣的方法製作銅箔。再者,本比較例對應於專利文獻5中記載的實施例1。 In Comparative Example 10, a sulfuric acid-copper sulfate-based electrolyte adjusted to a copper concentration of 80 g / L and a sulfuric acid concentration of 140 g / L was used. In the electrolytic solution, the additives and their concentrations were adjusted according to Table 1, and the chloride ion concentration was used. The DC power source shown in Figure 1 was used as a rectifier. The temperature of the electrolyte was adjusted to 50 ° C, the current density was 52 A / dm 2 , and the liquid flow rate was 0.4 m / s. Method to make copper foil. The comparative example corresponds to Example 1 described in Patent Document 5.

(比較例11) (Comparative Example 11)

在比較例11中,除了作為整流器使用之直流電源如表1所示有所變化外,與比較例10採用同樣的方法製作銅箔。 In Comparative Example 11, except that the DC power source used as a rectifier was changed as shown in Table 1, a copper foil was produced in the same manner as in Comparative Example 10.

(比較例12) (Comparative Example 12)

比較例12中,使用調整為銅濃度70g/L、硫酸濃度100g/L之硫酸-硫酸銅類電解液,在電解液中,按照表1調整添加劑及其濃度、以及氯化物離子濃度,使用表1所示的直流電源作為整流器,調整電解液的溫度為40℃、電流密度為50A/dm2、液流速為0.4m/s製作未處理銅箔,除此之外,與實施例1採用同樣的方法製作銅箔。再者,本比較例對應於專利第4796351號中記載的實施例5。 In Comparative Example 12, a sulfuric acid-copper sulfate-based electrolytic solution adjusted to a copper concentration of 70 g / L and a sulfuric acid concentration of 100 g / L was used. In the electrolytic solution, the additives and their concentrations, and the chloride ion concentration were adjusted according to Table 1. The DC power source shown in Figure 1 was used as a rectifier to adjust the temperature of the electrolyte to 40 ° C, the current density to 50 A / dm 2 , and the liquid flow rate to 0.4 m / s. Method to make copper foil. In addition, this comparative example corresponds to Example 5 described in Patent No. 4976351.

(比較例13) (Comparative Example 13)

在比較例13中,除了作為整流器使用之直流電源如表1所示有所變化外,與比較例12採用同樣的方法製作銅箔。 In Comparative Example 13, except that the DC power source used as a rectifier was changed as shown in Table 1, a copper foil was produced by the same method as Comparative Example 12.

需要說明的是,表1中記載的添加劑的種類中,「HEC1」表示重均分子量約30000之羥乙基纖維素,「HEC2」表示重均分子量約24500之水解羥乙基纖維素,「PPG」表示重均分子量約6000之聚丙二醇,「2M5S」表示「2-巰基苯並咪唑-5-磺酸鈉」,「PEI」表示重均分子量約30000之聚乙烯亞胺,「混合劑」表示使用二甲基二烯丙基氯化銨聚合物和聚二硫二丙烷磺酸鈉以及N,N'-二乙基硫脲按70:60:1之重量比混合的混合添加劑。 In addition, among the types of additives described in Table 1, "HEC1" means hydroxyethyl cellulose having a weight average molecular weight of about 30,000, "HEC2" means hydrolyzed hydroxyethyl cellulose having a weight average molecular weight of about 24500, and "PPG "Means polypropylene glycol with a weight average molecular weight of about 6000," 2M5S "means" sodium 2-mercaptobenzimidazole-5-sulfonate "," PEI "means polyethyleneimine with a weight average molecular weight of about 30,000, and" mixture "means A dimethyldiallylammonium chloride polymer, sodium polydithiodipropane sulfonate, and N, N'-diethylthiourea are used as a mixed additive in a weight ratio of 70: 60: 1.

此外,表1中記載的直流電源中,「逆變器」表示使用逆變器式直流電源(搭載20kHz之高頻逆變器的電源),「晶閘管」表示使用晶閘管式直流電源(脈動率10%之電源)。 In addition, in the DC power supply described in Table 1, "inverter" indicates the use of inverter-type DC power supply (power supply equipped with a 20kHz high-frequency inverter), and "thyristor" indicates the use of thyristor-type DC power supply (pulsation rate of 10) % Of power).

[評估] [Evaluation]

使用上述實施例及比較例之電解銅箔,進行了如下所示的特性評估。各特性之評估條件如下所述。結果如表1所示。 Using the electrolytic copper foils of the above examples and comparative examples, the following characteristics were evaluated. The evaluation conditions of each characteristic are as follows. The results are shown in Table 1.

[1]C含量及S含量分析 [1] C content and S content analysis

使用碳硫分析裝置(EMIA-810W,株式會社堀場製作所製),採用氧氣氣流中燃燒(管狀電爐方式)-紅外線吸收法進行測定。燃燒0.5g的樣品,進行雜質分析。充分小心操作,避免銅箔表面污染,並根據需要進行了丙酮脫脂等前處理。 A carbon-sulfur analyzer (EMIA-810W, manufactured by Horiba, Ltd.) was used, and the measurement was performed by combustion in an oxygen gas flow (tubular electric furnace method) -infrared absorption method. A 0.5 g sample was burned for impurity analysis. Take full care to avoid contamination of the copper foil surface, and perform pretreatment such as acetone degreasing as required.

[2]N含量分析 [2] Analysis of N content

使用氧氮氫分析裝置(EMGA-930,株式會社堀場製作所製),採用惰性氣體熔融-熱傳導度法(TCD)進行測定。燃燒0.5g的樣品,進行雜質分析。充分小心操作,避免銅箔 表面污染,並根據需要進行了丙酮脫脂等前處理。 The measurement was performed using an oxygen nitrogen hydrogen analyzer (EMGA-930, manufactured by Horiba, Ltd.) using an inert gas fusion-thermal conductivity method (TCD). A 0.5 g sample was burned for impurity analysis. Take care to avoid copper foil The surface is contaminated, and pretreatment such as acetone degreasing is performed as required.

[3]Cl含量分析 [3] Cl content analysis

使用一定體積之酸(硫酸1mol/L、35質量%之過氧化氫溶液20ml/L的混合溶液)溶解一定重量之銅箔,針對該溶液,以硝酸銀水溶液(0.01mol/L)為基準溶液,使用自動滴定裝置COM-1600(平沼產業株式會社製)進行電位差滴定,測定銅箔中之Cl含量。 A certain volume of acid (a mixed solution of 1 mol / L sulfuric acid and 20 ml / L of a 35% by mass hydrogen peroxide solution) was used to dissolve a certain weight of copper foil. For this solution, an aqueous silver nitrate solution (0.01 mol / L) was used as the reference solution. Potential difference titration was performed using an automatic titration device COM-1600 (produced by Hiranuma Sangyo Co., Ltd.), and the Cl content in the copper foil was measured.

[4]拉伸試驗 [4] Tensile test

拉伸試驗依據IPC-TM-650之規定進行。此外,使用拉伸試驗機(1122型、Instron公司製),在室溫(25℃±10℃)下、夾盤間距離為70mm之條件進行測定。測定用樣品準備2種,分別是針對各銅箔在常態下切斷為0.5inch×6inch大小的樣品和利用惰性氣體爐(INH-21CD-S,光洋THERMOS系統株式會社製)在300℃下加熱1小時後切斷為0.5inch×6inch大小的樣品,均在上述室溫條件下測定。 The tensile test is performed in accordance with the provisions of IPC-TM-650. The measurement was performed using a tensile tester (type 1122, manufactured by Instron) at room temperature (25 ° C ± 10 ° C) with a distance between chucks of 70 mm. Two types of samples were prepared for measurement, each of which was cut to a size of 0.5 inch × 6 inch for each copper foil under normal conditions, and heated at 300 ° C using an inert gas furnace (INH-21CD-S, manufactured by Koyo THERMOS System Co., Ltd.) Samples cut to a size of 0.5 inch × 6 inch after hours were measured under the above-mentioned room temperature conditions.

本實施例中,常態下測定之拉伸強度以380MPa以上為合格水平,在300℃、1小時之加熱後狀態下測定的拉伸強度以300MPa以上為合格水平。 In this example, the tensile strength measured in the normal state is 380 MPa or more as the acceptable level, and the tensile strength measured in the state after heating at 300 ° C for 1 hour is 300 MPa or more as the acceptable level.

[5]導電率 [5] Electrical conductivity

導電率依據JIS H 0505:1975之規定進行,採用4端子法進行測定。 The electrical conductivity was measured according to JIS H 0505: 1975, and was measured by the 4-terminal method.

本實施例中,將85% IACS以上之導電率評估為良好。 In this example, a conductivity of 85% IACS or more was evaluated as good.

[6]MIT耐折性試驗 [6] MIT folding resistance test

MIT耐折性試驗依據JIS P 8115:2001之規定進 行,在室溫(25℃±10℃)、彎曲半徑R為0.08mm、彎曲角度為±135°、彎曲速度為175次/分鐘、負載載荷為500g之條件下進行。需要說明的是,測定用樣品為使上述銅箔在惰性氣體爐(同上)中經過300℃、1小時加熱,將該加熱後之銅箔切斷為長130mm×寬15mm大小的樣品。 The MIT folding resistance test is performed in accordance with JIS P 8115: 2001. The test was performed under the conditions of room temperature (25 ° C ± 10 ° C), a bending radius R of 0.08 mm, a bending angle of ± 135 °, a bending speed of 175 times / minute, and a load of 500 g. In addition, the measurement sample is a sample in which the copper foil was heated at 300 ° C. for 1 hour in an inert gas furnace (same as above), and the heated copper foil was cut into a size of 130 mm in length × 15 mm in width.

本試驗中,計算測定用樣品切斷之前的彎曲次數,對樣品切斷時之彎曲次數進行評估。 In this test, the number of bends before the measurement sample is cut is calculated, and the number of bends when the sample is cut is evaluated.

本實施例中,將800次以上之彎曲次數評估為良好。 In this example, the number of bending times of 800 or more was evaluated as good.

[7]折疊試驗 [7] Folding test

折疊試驗按照以下<S1>至<S5>之步驟,在室溫(25℃±10℃)下進行。圖1中的<S1>至<S4>對應於以下<S1>至<S4>。 The folding test was performed at room temperature (25 ° C ± 10 ° C) according to the following steps <S1> to <S5>. <S1> to <S4> in FIG. 1 correspond to the following <S1> to <S4>.

<S1>首先,使上述銅箔在惰性氣體爐(同上)中經過300℃、1小時之加熱,將該加熱後之銅箔切斷為0.5inch×6inch大小,製作測定用樣品。 <S1> First, the copper foil was heated at 300 ° C. for 1 hour in an inert gas furnace (same as above), and the heated copper foil was cut to a size of 0.5 inch × 6 inch to prepare a measurement sample.

然後,使用厚度100μm之聚醯亞胺薄膜作為彎曲半徑為0.2mm之隔層,如圖1所示,將測定用樣品10置於隔層20上,將其長度方向的兩端部固定於該隔層20,製作隔層20與銅箔10之疊層體。 Then, a polyimide film having a thickness of 100 μm was used as a spacer having a bending radius of 0.2 mm. As shown in FIG. 1, a measurement sample 10 was placed on the spacer 20, and both ends in the longitudinal direction were fixed to the spacer. The interlayer 20 is a laminated body of the interlayer 20 and the copper foil 10.

<S2>接著,如圖1所示,將隔層20置於內側,將隔層20與銅箔10之疊層體180°折彎,使用橡膠製輥輪(直徑95mm×寬度45mm,重量2kg,橡膠硬度80Hs,太佑機材株式會社製)30施加載荷。 <S2> Next, as shown in FIG. 1, the spacer 20 is placed on the inside, the laminated body of the spacer 20 and the copper foil 10 is bent at 180 °, and a rubber roller (diameter 95 mm × width 45 mm, weight 2 kg) is used. , Rubber hardness 80Hs, manufactured by Taiyou Machinery Co., Ltd.) 30 load.

<S3>然後,在圖1所示之銅箔的折彎部附近(虛線區域X),使用光學式顯微鏡(VHX-1000,株式會社基恩斯製)觀 察有無斷裂(裂縫)。 <S3> Then, the vicinity of the bent portion (dashed area X) of the copper foil shown in FIG. 1 was observed with an optical microscope (VHX-1000, manufactured by Keynes Corporation). Check for cracks (cracks).

<S4>針對<S3>中沒有斷裂的樣品,如圖1所示,將折彎後之疊層體再次打開,使用上述輥輪30將其展平。 <S4> For the sample that did not break in <S3>, as shown in FIG. 1, the folded laminated body was opened again, and flattened using the roller 30 described above.

<S5>然後,重複<S2>至<S4>之步驟,直至在上述<S3>中觀察到斷裂,計算該重複次數,評估觀察到斷裂時之觀察次數。 <S5> Then, repeat the steps from <S2> to <S4> until a break is observed in the above <S3>, calculate the number of repetitions, and evaluate the number of observations when a break is observed.

本實施例中,將40次以上之觀察次數評估為合格水平,將50次以上評估為良好。 In this embodiment, the number of observations of 40 or more times is evaluated as a passing level, and 50 or more times are evaluated as good.

Figure TW201802258AD00001
Figure TW201802258AD00001

如表1所示,本發明實施例1至9之電解銅箔中,碳(C)、硫(S)、氮(N)以及氯(Cl)之含量被控制在規定範圍內,因此加熱前後均具有高拉伸強度,同時耐折疊性優異。 As shown in Table 1, in the electrolytic copper foils according to Examples 1 to 9 of the present invention, the content of carbon (C), sulfur (S), nitrogen (N), and chlorine (Cl) is controlled within a predetermined range, so before and after heating Both have high tensile strength and excellent folding resistance.

相對於此,比較例1至13之電解銅箔中,碳(C)、硫(S)、氮(N)以及氯(Cl)之含量中至少1個未被控制在規定範圍內,因此相比實施例1至9之電解銅箔,加熱前後之拉伸強度及耐折疊性之至少1個特性較差。尤其是比較例2至4、10以及11之電解銅箔,在過去通常之MIT耐折性試驗中能夠發揮優異之耐折彎性,但在更加嚴格的折彎試驗即折疊試驗中無法發揮足夠的耐折彎性。 In contrast, in the electrolytic copper foils of Comparative Examples 1 to 13, at least one of the contents of carbon (C), sulfur (S), nitrogen (N), and chlorine (Cl) was not controlled within a predetermined range. Compared with the electrolytic copper foils of Examples 1 to 9, at least one of the tensile strength and the folding resistance before and after heating is worse. In particular, the electrolytic copper foils of Comparative Examples 2 to 4, 10, and 11 exhibited excellent bending resistance in the conventional MIT bending resistance test in the past, but did not exhibit sufficient performance in a more severe bending test, namely, a folding test. Bending resistance.

如上所述,本發明之電解銅箔具有高拉伸強度,加熱後仍維持高拉伸強度,並且能實現良好的耐折疊性,因此適用於製造鋰離子二次電池負極集電體或電路板之電解銅箔。 As described above, the electrolytic copper foil of the present invention has high tensile strength, maintains high tensile strength after heating, and can achieve good folding resistance. Therefore, it is suitable for manufacturing a negative electrode current collector or a circuit board of a lithium ion secondary battery. Of electrolytic copper foil.

10‧‧‧銅箔 10‧‧‧ Copper foil

20‧‧‧隔層 20‧‧‧ compartment

30‧‧‧輥輪 30‧‧‧roller

X‧‧‧虛線區域 X‧‧‧ dashed area

Claims (9)

一種電解銅箔,其特徵在於:碳(C)的含量為20至150質量ppm、硫(S)的含量為18質量ppm以下,氮(N)的含量為40質量ppm以下、氯(Cl)的含量為25至200質量ppm。 An electrolytic copper foil characterized by a carbon (C) content of 20 to 150 mass ppm, a sulfur (S) content of 18 mass ppm or less, a nitrogen (N) content of 40 mass ppm or less, and chlorine (Cl) The content is 25 to 200 mass ppm. 根據申請專利範圍第1項所述的電解銅箔,其中,該碳(C)的含量相對於該氯(Cl)的含量的比[C的含量/Cl的含量]在0.70至1.40範圍內。 The electrolytic copper foil according to item 1 of the scope of patent application, wherein the ratio of the content of the carbon (C) to the content of the chlorine (Cl) [content of C / content of Cl] is in a range of 0.70 to 1.40. 根據申請專利範圍第1或2項所述的電解銅箔,其中,在常態下測定的拉伸強度在380至600Mpa範圍內。 The electrolytic copper foil according to item 1 or 2 of the scope of the patent application, wherein the tensile strength measured in a normal state is in a range of 380 to 600 Mpa. 根據申請專利範圍第1至3項中任一項所述的電解銅箔,其中,在300℃、1小時加熱後狀態下測定的拉伸強度在300至550Mpa範圍內。 The electrolytic copper foil according to any one of claims 1 to 3, wherein the tensile strength measured in a state after heating at 300 ° C for 1 hour is in a range of 300 to 550 MPa. 根據申請專利範圍第1至4項中任一項所述的電解銅箔,其中,導電率在85%IACS以上。 The electrolytic copper foil according to any one of claims 1 to 4, wherein the electrical conductivity is 85% IACS or more. 根據申請專利範圍第1至5項中任一項所述之電解銅箔,其中,該銅箔用於製造鋰離子二次電池負極集電體。 The electrolytic copper foil according to any one of claims 1 to 5, wherein the copper foil is used for manufacturing a negative electrode current collector of a lithium ion secondary battery. 根據申請專利範圍第1至5項中任一項所述之電解銅箔,其中,該銅箔用於製造印刷電路板之導體部。 The electrolytic copper foil according to any one of claims 1 to 5, wherein the copper foil is used for manufacturing a conductor portion of a printed circuit board. 一種鋰離子二次電池,具有根據申請專利範圍第1至6項中任一項所述的電解銅箔作為負極集電體。 A lithium ion secondary battery having the electrolytic copper foil according to any one of claims 1 to 6 as a negative electrode current collector. 一種印刷電路板,具有根據申請專利範圍第1至5及第7項中任一項所述的電解銅箔作為導體部。 A printed circuit board having the electrolytic copper foil according to any one of claims 1 to 5 and 7 as a conductor portion.
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