TW201741042A - An apparatus for cleaning a quartz chamber and a method thereof - Google Patents

Abstract

This invention provides an apparatus for cleaning a quartz chamber and a method thereof. The apparatus comprises a cleaning chamber, an inlet, an outlet, and a sealing pad, wherein the inlet and the outlet are positioned at the bottom of the cleaning chamber. When the quartz chamber is cleaned by the apparatus, the sealing pad contacts with an opening of the quartz chamber and seals the opening. The inlet and the outlet are poisoned at a region which the opening projects on. When the quartz chamber is cleaned by the apparatus, cleaning liquids only flow into the interior of the quartz chamber because the sealing pad seals the opening, such that cleaning liquids can't flow into the outside of the quartz chamber and the outside of the quartz chamber is not corroded by the cleaning liquids.

Description

Quartz cavity cleaning device and cleaning method

The present invention relates to the field of semiconductor manufacturing technology, and in particular, to a quartz cavity cleaning device and a cleaning method.

Quartz chambers are widely used in semiconductor manufacturing technology because they contain less metal impurities, their main substance is high-purity cerium oxide, and can withstand higher temperatures up to 1200 degrees. For example, in the epitaxial process, the ruthenium is placed inside the quartz cavity to undergo epitaxial growth, that is, a reaction source is introduced into the quartz cavity in which the ruthenium is placed, and the reaction source is in a certain condition. The reaction takes place and a uniform film is deposited on the surface of the bract. However, in this process, the film is deposited not only on the surface of the ruthenium but also on the inner wall of the quartz cavity. Therefore, after a plurality of deposition processes, a film layer of a certain thickness is formed on the inner wall of the quartz cavity. If the film layer is not removed immediately, it not only changes the geometry inside the quartz cavity but affects the reaction gas flow. And the particulate matter in the film layer may also become a source of contamination inside the quartz cavity, thereby causing defects in the film formed on the succeeding film. Therefore, in order to ensure the cleanliness inside the quartz cavity to ensure the stability of the semiconductor process, the inner wall of the quartz cavity is periodically cleaned.

At present, a method for cleaning a quartz cavity is an immersion cleaning, and the cleaning device used is as shown in FIG. 1. The cleaning device includes: a cleaning chamber 11 for introducing a cleaning liquid. The liquid port 12 and the liquid discharge port 13 for discharging the washing liquid, the liquid inlet port 12 and the liquid discharge port 13 are both disposed on the washing chamber 11. When the quartz chamber 20 is cleaned by the cleaning device described above, the steps are as follows: First, the cleaning liquid is introduced into the cleaning chamber 11 through the liquid inlet 12, and the liquid level of the cleaning liquid is higher than that to be cleaned. The height of the quartz chamber 20; then, the quartz chamber 20 is immersed in the cleaning liquid and left for a while; finally, the cleaning liquid is discharged through the liquid discharge port 13.

In the above cleaning method, the entire quartz cavity is completely immersed in the cleaning liquid. At this time, the contaminants on the inner wall of the quartz cavity are ablated by the cleaning liquid, thereby achieving the purpose of cleaning the inner wall of the quartz cavity. . However, since the above cleaning method is the overall immersion cleaning method, the cleaning liquid will also cause unnecessary erosion to the outer wall of the quartz cavity in which the film layer is not deposited, thereby allowing the service life of the quartz cavity. Greatly shortened and increased the cost of parts. In addition, the overall immersion cleaning method will inevitably lead to excessive consumption of cleaning fluid, resulting in unnecessary waste and increased material costs.

The object of the present invention is to provide a cleaning device for a quartz cavity and a method for cleaning a quartz cavity according to the cleaning device of the quartz cavity, so as to solve the problem that the existing cleaning device is in the process of cleaning the quartz cavity, and the quartz cavity The external cause of erosion problems.

In order to solve the above technical problem, the present invention provides a cleaning device for a quartz cavity, comprising a cleaning chamber for placing a quartz cavity for cleaning thereof, wherein the cleaning device further comprises: disposed at the bottom of the cleaning chamber a liquid inlet, a liquid discharge port, and a gasket. The sealing gasket contacts the opening of the quartz cavity and seals the opening during cleaning of the quartz cavity, wherein the liquid inlet and the liquid discharge port are both Located in the projection area of the opening at the bottom of the cleaning chamber.

Optionally, the gasket is an annular structure, and the liquid inlet and the liquid outlet are both In the area surrounded by the annular structure.

Optionally, the gasket is made of fluororubber.

Optionally, the cleaning device further includes a pre-pressing device, the pre-pressing device includes a pre-pressing block and a driving device, wherein the driving device is configured to drive the pre-pressing block movement, the pre-pressing block and the quartz cavity The body contacts and applies a pressure to the quartz chamber.

Optionally, an inwardly recessed recess is disposed on one end of the pre-compacting block in contact with the quartz cavity, and the contact surface of the recess and the quartz cavity conforms to each other.

Optionally, the pre-compacting block further has a gas circulation passage communicating with the groove, and the gas circulation passage is for discharging the gas in the quartz cavity.

Optionally, the cleaning device further includes a stirring device disposed at a bottom of the cleaning chamber and located in a projection area of the opening of the quartz cavity at the bottom of the cleaning chamber.

Optionally, the stirring device comprises an impeller disk and a plurality of blades on the impeller disk.

Optionally, a plurality of the blades are arranged in a circular shape.

Optionally, the stirring device is made of polytetrafluoroethylene or polyvinylidene fluoride.

Optionally, the cleaning device further includes a gas nozzle disposed at a bottom of the cleaning chamber and located in a projection area of the quartz cavity opening at the bottom of the cleaning chamber.

Optionally, the gas nozzle is a rotating nozzle.

Optionally, the gas jet nozzle of the gas nozzle has a bending angle in a horizontal direction.

Optionally, a check valve is disposed in the gas nozzle.

Optionally, the gas nozzle is connected to a gas supply device.

Optionally, the gas supply device is a nitrogen gas supply device.

Optionally, the cleaning device further includes a liquid level controller, wherein the liquid level controller is configured to detect a liquid level in the quartz chamber, and control the supply amount of the cleaning liquid according to the detected liquid level.

Still another object of the present invention is to provide a cleaning method for a quartz cavity according to the above-described cleaning device for a quartz cavity, comprising: providing a cleaning device for a quartz cavity as described above; The opening is placed on the sealing ring facing the bottom of the cleaning chamber, and the opening is sealed; at least one cleaning process is performed on the quartz cavity; the quartz cavity is dried; wherein the cleaning process includes: injecting liquid After the cleaning liquid is introduced into the mouth to the predetermined liquid level, the cleaning is performed; after the cleaning is completed, the cleaning liquid is discharged through the liquid discharge port.

Optionally, the cleaning device has a stirring device. After the cleaning liquid is introduced into the quartz chamber, the stirring device agitates the cleaning liquid for cleaning.

Optionally, the cleaning device has a gas nozzle, and after the cleaning process is completed, the gas nozzle is used to spray gas to dry the quartz cavity.

Optionally, the cleaning method comprises performing two cleaning processes, wherein the cleaning liquid used in the first cleaning process is a mixed solution of nitric acid, hydrofluoric acid and water, and the cleaning liquid used in the second cleaning process is water.

Compared with the prior art, the cleaning device for the quartz cavity provided by the present invention has a gasket for sealing the opening of the quartz cavity, so that the cleaning liquid can be prevented from leaking and eroding when cleaning the interior of the quartz cavity. The outside of the quartz cavity, which in turn extends the quartz cavity Service life. Moreover, during the cleaning, the cleaning liquid is only introduced into the interior of the quartz chamber, so that the amount of the cleaning liquid can be effectively reduced and the cost can be saved.

In a preferred embodiment, a stirring device is further disposed at the bottom of the cleaning chamber, and the cleaning liquid is agitated to increase the impact force of the cleaning liquid on the inner wall of the quartz chamber, thereby improving the ability to remove pollutants. Compared with the traditional immersion cleaning, it has a better cleaning effect.

11‧‧‧cleaning chamber

12‧‧‧ inlet port

13‧‧‧Draining port

20‧‧‧Quartz cavity

110‧‧‧cleaning chamber

120‧‧‧ inlet port

130‧‧‧Draining port

140‧‧‧ Seal

150‧‧‧Preloading device

151‧‧‧Pre-pressed block

152‧‧‧ drive

1511‧‧‧ Groove

1512‧‧‧ gas flow path

1512a‧‧‧Connection hole

1512b‧‧‧ venting holes

160‧‧‧Agitator

161‧‧‧Iron disk

162‧‧‧ leaves

163‧‧‧through hole

170‧‧‧ gas nozzle

180‧‧‧Level controller

181‧‧‧Flange

182‧‧‧Level gauge

200‧‧‧Quartz cavity

210‧‧‧ openings

220‧‧‧vents

1 is a schematic structural view of a cleaning device for a quartz cavity in the prior art; FIG. 2 is a schematic structural view of a quartz cavity; FIG. 3 is a schematic structural view of a cleaning device for a quartz cavity according to an embodiment of the present invention; BRIEF DESCRIPTION OF THE DRAWINGS FIG. 5 is a schematic structural view of a stirring device for a quartz chamber cleaning device according to an embodiment of the present invention; FIG. 6 is a schematic view showing a quartz device according to an embodiment of the present invention; Schematic diagram of the liquid level controller of the cleaning device of the cavity; FIG. 7 is a schematic flow chart of the cleaning method of the quartz cavity according to an embodiment of the present invention.

As described in the background art, when immersed by using a cleaning device of the prior art When the quartz cavity is cleaned, the purpose of cleaning the interior of the quartz cavity can be achieved, but at the same time, the cleaning solution will also corrode the outside of the quartz cavity, thereby greatly shortening the service life of the quartz cavity. Therefore, the present invention improves the cleaning device to avoid the problem that the cleaning liquid corrodes the outside of the quartz cavity during the cleaning process, thereby prolonging the service life of the quartz cavity.

The cleaning device for the quartz cavity proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the description and appended claims. It should be noted that the drawings are in a very simplified form and both use non-precise proportions, and are only for convenience and clarity to assist the purpose of the embodiments of the present invention.

3 is a schematic structural view of a cleaning device for a quartz chamber according to an embodiment of the present invention. As shown in FIG. 3, the cleaning device for the quartz cavity includes: a cleaning chamber 110 and a liquid inlet 120 disposed at the bottom of the cleaning chamber. a drain port 130 for arranging a quartz chamber for cleaning the quartz chamber, and a gasket 140 for introducing a cleaning liquid, the drain port 130 for Drain the cleaning solution. During the cleaning of the quartz cavity, the gasket 140 contacts an opening of the quartz cavity and seals the opening, wherein the liquid inlet and the liquid discharge port are both located in the opening of the quartz cavity during cleaning Inside the projection area at the bottom of the cavity.

The cleaning device for the quartz cavity provided by the present invention will be further described in detail below in conjunction with the cleaning of the quartz cavity. 2 is a schematic structural view of a quartz cavity. As shown in FIG. 2, the quartz cavity 200 is a funnel-like tapered structure, wherein one end of the quartz cavity 200 has a mounting platform. The opening 210 has a vent hole 220 for exhausting gas inside the quartz cavity 200 at the other end of the quartz cavity 200. When the quartz chamber 200 is cleaned by the cleaning device provided by the present invention, it is specifically referred to FIG. 3: First, the opening 210 of the quartz cavity 200 is placed on the gasket 140 in the direction facing the bottom of the cleaning chamber 110, and the opening 210 of the quartz chamber 200 is sealed by the gasket 140. At this time, the quartz cavity 200 covers the liquid inlet 120 and the liquid discharge port 130, that is, the liquid inlet 120 and the liquid discharge port 130 are located inside the quartz cavity 200; The port 120 is passed through the cleaning liquid, and the opening 210 of the quartz chamber 200 in contact with the gasket 140 can be sealed by the gasket 140 so that the cleaning liquid introduced into the interior of the quartz chamber 200 does not pass through the opening 210. In addition, in order to prevent the cleaning liquid from being excessively supplied, the cleaning liquid overflows from the vent hole 220 of the quartz chamber, the supply amount of the cleaning liquid can be further controlled, thereby ensuring that the outside of the quartz chamber 200 is not exposed. The cleaning liquid causes a problem of being eroded by the cleaning liquid. Finally, the cleaning liquid in the quartz chamber 200 is discharged through the liquid discharge port 130 to complete the cleaning process for the interior of the quartz chamber 200.

It can be seen that when the quartz cavity is cleaned by the cleaning device provided by the invention, the cleaning liquid can be located only inside the quartz cavity, and only the interior of the quartz cavity can be cleaned, and the exterior of the quartz cavity can be avoided. Contact with the cleaning solution to improve the corrosion of the outside of the quartz chamber by the cleaning liquid, and prolong the service life of the quartz chamber.

Specifically, the gasket 140 may be any shape, such as a circle or a rectangle, etc., wherein the area of the gasket 140 is larger than the area of the opening of the quartz cavity 200. In addition, when the shape of the gasket 140 is an annular structure, the shape of the annular structure may be set according to the shape of the opening of the quartz cavity 200. For example, in the embodiment, the quartz cavity 200 The shape of the opening 210 is circular, so the shape of the gasket 140 may be set to a circular shape, and the diameter of the outermost circumference of the annular gasket 140 is larger than the opening of the quartz cavity 200. The diameter, in turn, ensures a complete seal of the opening 210 of the quartz cavity 200. Preferably, the gasket 140 is made of fluororubber. Among them, the fluororubber has high temperature resistance, chemical resistance and good physical and mechanical properties. Therefore, the fluororubber gasket can effectively prevent the gasket 140 from being eroded by the cleaning fluid during the cleaning process. Secondly, the fluororubber has a certain amount of elastic compression, and the Shore A is usually 50 to 90 degrees, so that it has a good sealing effect.

In a preferred embodiment, a sealing force perpendicular to the bottom plane of the cleaning chamber 110 can also be applied to the quartz chamber 200 to further enhance the sealing effect of the gasket 140 on the opening 210 of the quartz chamber 200. Continuing to refer to FIG. 3, in the present embodiment, a force is applied to the quartz cavity 200 by a pre-pressing device 150, and on the other hand, the quartz cavity 200 can be fixed to prevent sliding thereof. That is, the preloading device 150 applies a downward force to the quartz cavity 200 when cleaning the quartz cavity 200.

4 is a schematic structural view of a pre-pressing device for a quartz chamber cleaning device according to an embodiment of the present invention. As shown in FIG. 4 and in conjunction with FIG. 3, the pre-pressing device 150 includes a pre-pressing block 151 and a driving device 152. The driving device 152 is, for example, a cylinder, and the driving device 152 drives the pre-pressing block 151 to perform downward movement. The pre-pressing block 151 is in contact with the quartz cavity 200 and applies a pressure to the quartz cavity 200. . Preferably, an end of the pre-pressing block 151 contacting the quartz cavity 200 is provided with an inwardly recessed groove 1511, and the groove 1511 and the contact surface of the quartz cavity 200 are in engagement with each other. Therefore, it is possible to avoid the problem that the contact surface of the pre-compacting block 121 and the quartz cavity 200 slips and the force cannot be applied to the quartz cavity. For example, in the present embodiment, the pre-pressing block 151 is in contact with the vent hole 220 of the quartz cavity 200. Therefore, the pre-pressing block 151 may be a cylindrical structure having a circular groove 1511. Further, the pre-press block 151 further has a circle and a circle The gas flow path 1512 that communicates with the groove 1511 allows the inside of the quartz cavity 200 to flow with the air outside the quartz cavity 200 through the gas flow path 1512, and the air inside the quartz cavity 200 can be discharged from the gas flow path 1512. . That is, during the cleaning of the quartz chamber 200, the gas inside the quartz chamber 200 enters the gas flow path 1512 via the vent hole 220, and is discharged through the gas flow path 1512. Specifically, referring to FIG. 4, the gas circulation passage 1512 includes a connecting hole 1512a and a vent hole 1512b, and the connecting hole 1512a is located above the groove 1511 and communicates with the groove 1511. The vent hole 1512b communicates with the connection hole 1512a and the outside of the quartz cavity 200, and air located inside the quartz cavity 200 is discharged through the vent hole 1512b after passing through the connection hole 1512a.

With reference to FIG. 3, in the embodiment, the cleaning device of the quartz cavity 200 further includes a stirring device 160. The stirring device 160 is disposed at the bottom of the cleaning chamber 110 and located in the quartz cavity. The opening 210 of the 200 is within the projected area at the bottom of the cleaning chamber 110. That is, when the quartz chamber 200 is cleaned, the stirring device 160 is located inside the quartz chamber 200 and agitates the cleaning liquid, so that the cleaning liquid exerts a large impact force on the inner wall of the quartz chamber 200, so that it is compared In the immersion cleaning, the cleaning method in the embodiment has higher cleaning efficiency, thereby improving the cleaning effect and effectively shortening the cleaning time.

5 is a schematic structural view of a stirring device of a cleaning device for a quartz chamber according to an embodiment of the present invention. As shown in FIG. 5, the stirring device 160 includes an impeller disk 161 and a plurality of blades 162 on the impeller disk 161. Preferably, a plurality of the blades 162 are arranged in a circular shape. In this embodiment, six vanes 162 are disposed on the impeller disc 161, and the impeller disc 161 drives the vane 162 to rotate in a clockwise or counterclockwise direction to achieve agitation of the cleaning liquid. Wherein, the shape of the blade 162 may be a shape of a fan, a rectangle or the like, or the like. Its material can be used Chemically resistant materials such as polytetrafluoroethylene or polyvinylidene fluoride.

With continued reference to FIG. 3, the quartz chamber cleaning apparatus further includes a gas showerhead 170 disposed at the bottom of the cleaning chamber 110 and located at the opening 210 of the quartz chamber 200 in the cleaning chamber. In the projection area at the bottom of the 110, similarly, when the quartz chamber 200 is cleaned, the gas nozzle 170 is also located inside the quartz chamber 200, and further, after the cleaning liquid in the quartz chamber 200 is discharged, Gas can be ejected through the gas jet head 170 to blow dry the quartz chamber 200. In this embodiment, the installation position of the gas nozzle 170 coincides with the center position of the stirring device 160. Specifically, as shown in FIG. 5, a through hole 163 is defined in the center of the impeller disk 161 of the stirring device 160. The gas nozzle 170 extends through the through hole 163 into the cleaning chamber 110. In this way, the limited space of the cleaning chamber 110 can be utilized to the utmost extent, and the gas nozzle 170 is installed at an intermediate position of the cleaning chamber 110, so that the gas ejected from the gas nozzle 170 can be uniformly blown into the quartz chamber 200. On the wall to increase the drying efficiency of the quartz cavity 200. Preferably, the gas nozzle 170 is a rotatable nozzle with a rotation rate of 0 to 10 rpm. Further, the gas jet nozzle of the gas jet head 170 has a bending angle in the horizontal direction, for example, 45°. That is, in the present embodiment, the gas jet head 170 rotates at a certain rotation rate during the drying process, and during the rotation, the gas ejected by the gas jet head 170 directly blows in various directions of the quartz cavity 200. The sidewalls, in turn, increase the rate of drying of the quartz cavity 200.

In addition, since the quartz chamber 200 has a cleaning liquid inside the quartz chamber 200 during the cleaning process, in order to prevent the cleaning liquid from being poured into the gas nozzle 170 to affect its function, in the present embodiment, the gas is A check valve (not shown) is further disposed in the nozzle 170. The type and the installation manner of the check valve can be commonly used in the field, and the installation method is not described herein. Further, the gas nozzle 170 is further connected with a gas supply device. (not shown), the gas supply means can be used to supply nitrogen.

With continued reference to FIG. 3, the quartz chamber cleaning apparatus further includes a liquid level controller 180, and the liquid level controller 180 can be used to detect the liquid level of the cleaning liquid in the quartz chamber 200, and according to the detection. The liquid level is controlled to control the amount of cleaning liquid supplied. The liquid level controller 180 can control the high and low liquid levels by mechanical or electronic methods, thereby controlling a solenoid valve or a water pump, etc., thereby implementing a semi-automatic or fully automatic liquid level control method, which can adopt, for example, Ultrasonic level controller, etc.

In this embodiment, the liquid level controller 180 can be placed in the quartz chamber through the gas circulation passage 1512 located on the pre-pressing block 151 to realize the detection and control of the liquid level in the quartz chamber. Specifically, the structure of the liquid level controller 180 can be referred to as shown in FIG. 6. The liquid level controller 180 includes a flange 181 and a liquid level gauge 182 mounted on the flange 181, the liquid level gauge 182 can sense the liquid level in the quartz chamber. In addition, in order to realize the automatic control function of the liquid level controller 180, the liquid level controller 180 is further connected with a liquid level control system (not shown), and the liquid level control system is connected to the liquid level meter. One end of 182 is also connected to a solenoid valve or pump that supplies cleaning fluid. That is, in the embodiment, the liquid level controller 180 detects the liquid level in the quartz chamber 200 and transmits the signal to the liquid level control system, and the liquid level control system returns the feedback according to the liquid level meter 182. Information, perform replenishment or stop replenishment, thus enabling automatic control of the supply of cleaning fluid.

Of course, those skilled in the art should appreciate that the cleaning device using the quartz cavity provided by the present invention also achieves the overall immersion cleaning mode. For example, when the interior of the quartz cavity is cleaned after the internal cleaning of the quartz cavity is completed, deionized water may be introduced into the cleaning cavity of the cleaning device, and the quartz cavity may not be needed at this time. Body opening Sealing, and immersing the quartz cavity as a whole in deionized water, can achieve the purpose of cleaning the entire quartz cavity.

According to the above cleaning apparatus for a quartz chamber, the present invention also provides a method of cleaning a quartz chamber. Hereinafter, the cleaning method of the quartz cavity provided by the present invention will be further explained by taking the cleaning of the quartz cavity having a circular opening by using the cleaning device described in the above embodiment.

FIG. 7 is a schematic flow chart of a method for cleaning a quartz cavity according to an embodiment of the present invention. As shown in FIG. 7 and in conjunction with FIG. 3, the cleaning method includes:

In step S10, a cleaning device for a quartz chamber as described above is provided, and the cleaning device can be referred to the structural schematic of the cleaning device of the quartz chamber shown in FIG.

Step S20, placing the opening of the quartz cavity 200 facing the bottom of the cleaning chamber 100 on the sealing ring, and sealing the opening;

Step S30, performing at least one cleaning process on the quartz cavity 200; wherein, in step S30, the cleaning process includes:

Step S31, after the cleaning liquid is introduced into the liquid inlet 120 to a predetermined liquid level, and then washed;

In step S32, the cleaning liquid is discharged through the liquid discharge port 130.

Preferably, the cleaning process is performed twice on the quartz chamber, which can be cleaned separately with different cleaning solutions. For example, in the first cleaning, the chemical solution having micro-etching ability is used for cleaning to remove metal ions and high-molecular polymers in the quartz chamber, and the chemical solution may be a mixture of nitric acid, hydrofluoric acid and water. Solution; in the second cleaning, the quartz chamber 200 can be cleaned again by using deionized water, which can be used for removing the first time. The chemical solution remaining in the quartz chamber during washing, on the other hand, the quartz chamber can be cleaned twice, thereby improving the cleaning effect on the quartz chamber.

In addition, when the cleaning process is performed, since the stirring device 160 is installed in the cleaning device, the stirring device 160 can agitate the cleaning liquid in the quartz chamber to increase the impact force of the cleaning liquid on the inner wall of the quartz chamber. In addition, the removal ability of the contaminant can be enhanced, so that it has higher cleaning efficiency than the immersion cleaning method, and correspondingly, the cleaning time can be effectively reduced.

Further, in the cleaning method of the quartz cavity, after the cleaning process of the quartz cavity is completed, the quartz cavity is further dried (step S40). In this embodiment, gas is ejected through the gas jet head 170 to effect drying of the quartz cavity.

In summary, the cleaning method provided by the present invention can not only avoid the problem that the cleaning liquid causes erosion on the outside of the quartz cavity, but also can directly reduce the cleaning liquid in the interior of the quartz cavity during cleaning, thereby effectively reducing the cleaning liquid. The amount of cleaning liquid used, at the same time, after a number of cleaning processes can further improve the cleaning effect of the quartz cavity. Moreover, in a preferred embodiment, by providing a stirring device in the cleaning chamber, the cleaning effect on the quartz chamber can be enhanced, and the cleaning time can be saved.

The above description is only for the description of the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention. Any changes and modifications made by those skilled in the art based on the above disclosure are all within the scope of the claims.

110‧‧‧cleaning chamber

120‧‧‧ inlet port

130‧‧‧Draining port

140‧‧‧ Seal

150‧‧‧Preloading device

151‧‧‧Pre-pressed block

152‧‧‧ drive

160‧‧‧Agitator

170‧‧‧ gas nozzle

180‧‧‧Level controller

200‧‧‧Quartz cavity

Claims (21)

A cleaning device for a quartz cavity includes a cleaning chamber for placing a quartz chamber to clean the quartz chamber, the cleaning device further comprising: a bottom portion disposed at the bottom of the cleaning chamber a liquid inlet, a discharge port, and a gasket, the gasket contacting the opening of the quartz chamber and sealing the opening during the cleaning of the quartz chamber, wherein the liquid inlet Both the mouth and the drain are located within the projection area of the opening at the bottom of the wash chamber. The cleaning device for a quartz cavity according to claim 1, wherein the gasket is an annular structure, and the liquid inlet and the liquid discharge port are both located in a region surrounded by the annular structure. The cleaning device for a quartz cavity according to claim 1, wherein the gasket is made of fluororubber. The cleaning device for a quartz chamber according to claim 1, wherein the cleaning device further comprises a pre-pressing device, the pre-pressing device comprising a pre-pressing block and a driving device, wherein the driving device is configured to drive the The pre-pressing block moves, the pre-compacting block is in contact with the quartz cavity and applies a pressure to the quartz cavity. The cleaning device for a quartz cavity according to claim 4, wherein an end of the pre-compacting block in contact with the quartz cavity is provided with an inwardly recessed groove, the groove and the quartz cavity The contact surfaces fit together. The cleaning device for a quartz chamber according to claim 5, wherein the pre-compacting block further has a gas circulation passage communicating with the groove, the gas circulation passage for discharging the quartz cavity gas. A cleaning device for a quartz chamber according to claim 1, wherein the cleaning device further comprises a stirring device disposed at a bottom of the cleaning chamber and located at an opening of the quartz chamber at the cleaning Inside the projection area of the bottom of the cavity. A cleaning apparatus for a quartz chamber according to claim 7, wherein said stirring means comprises an impeller disk and a plurality of blades on said impeller disk. A cleaning apparatus for a quartz chamber according to claim 8, wherein a plurality of said blades are arranged in a circular shape. The cleaning device for a quartz chamber according to claim 7, wherein the agitation device is made of polytetrafluoroethylene or polyvinylidene fluoride. The cleaning device for a quartz chamber according to claim 1, wherein the cleaning device further comprises a gas nozzle disposed at a bottom of the cleaning chamber and located at an opening of the quartz chamber for the cleaning Inside the projection area of the bottom of the cavity. A cleaning apparatus for a quartz chamber according to claim 11, wherein the gas nozzle is a rotary nozzle. A cleaning apparatus for a quartz chamber according to claim 12, wherein the gas jet nozzle of the gas jet has a bending angle in a horizontal direction. A cleaning apparatus for a quartz chamber according to claim 11, wherein a check valve is disposed in the gas nozzle. A cleaning apparatus for a quartz chamber according to claim 11, wherein the gas nozzle is connected to a gas supply device. A cleaning device for a quartz chamber according to claim 15, wherein the gas supply device is a nitrogen gas supply device. The cleaning device for a quartz chamber according to claim 1, wherein the cleaning device further comprises a liquid level controller, wherein the liquid level controller is configured to detect a liquid level in the quartz chamber, and according to the detected liquid Bit to control the supply of cleaning fluid. A cleaning method for a quartz cavity, comprising: a cleaning device for providing a quartz cavity according to any one of claims 1 to 10; placing an opening of the quartz cavity facing the bottom of the cleaning cavity in the sealing ring And sealing the opening by the sealing ring; performing at least one cleaning process on the quartz cavity; drying the quartz cavity; wherein the cleaning process comprises: introducing into the liquid inlet After the cleaning liquid reaches a predetermined liquid level, the cleaning is performed; after the cleaning is completed, the cleaning liquid is discharged through the liquid discharging port. The method for cleaning a quartz cavity according to claim 18, wherein the cleaning device has a stirring device, and after the cleaning liquid is introduced into the quartz chamber, the stirring device agitates the cleaning liquid for cleaning. The method of cleaning a quartz chamber according to claim 18, wherein the cleaning device has a gas nozzle, and after the cleaning process is completed, the gas nozzle is used to eject gas to dry the quartz chamber. The method for cleaning a quartz cavity according to claim 18, wherein the cleaning method comprises performing two cleaning processes, wherein the cleaning liquid used in the first cleaning process is a mixed solution of nitric acid, hydrofluoric acid and water, and second The cleaning solution used in the cleaning process is water.