TW201733687A - Holding tray for curved surface substrate - Google Patents

Holding tray for curved surface substrate Download PDF

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Publication number
TW201733687A
TW201733687A TW105117411A TW105117411A TW201733687A TW 201733687 A TW201733687 A TW 201733687A TW 105117411 A TW105117411 A TW 105117411A TW 105117411 A TW105117411 A TW 105117411A TW 201733687 A TW201733687 A TW 201733687A
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Taiwan
Prior art keywords
holding
members
base material
curved
slit
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TW105117411A
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Chinese (zh)
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TWI653095B (en
Inventor
Kenji IWANARI
Hachirou TOUCHI
Toshio Kambe
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Chugai Ro Co Ltd
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Publication of TW201733687A publication Critical patent/TW201733687A/en
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Publication of TWI653095B publication Critical patent/TWI653095B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02Means for manipulating or holding work, e.g. for separate articles for particular articles

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  • Coating Apparatus (AREA)

Abstract

A holding tray for a curved surface substrate on which a coating liquid is to be coated by a slit nozzle is characterized in being provided with: a pair of clamping members for holding the curved surface substrate so as to clamp the two ends of the curved surface substrate in the nozzle movement direction of the slit nozzle; and at least one support member, which is disposed between the pair of clamping members in the nozzle movement direction and is for supporting the curved surface substrate from below.

Description

曲面基材之保持托盤 Curved substrate holding tray 發明領域 Field of invention

本發明是涉及曲面基材之保持托盤。 The present invention relates to a holding tray for a curved substrate.

發明背景 Background of the invention

近年來,在顯示面板之市場等,表面是凸狀曲面且背面是平面之片側凸玻璃之需求逐漸升高,該片側凸玻璃之製造是在凸狀曲面玻璃之背面(凹狀曲面)將接著劑平坦地塗布,而與平面玻璃貼合。 In recent years, in the market of display panels, etc., the surface is convex curved and the back side is flat. The demand for the side convex glass is gradually increased. The sheet side convex glass is manufactured on the back surface of the convex curved glass (concave curved surface). The agent is applied flat and is bonded to a flat glass.

習知,要將如接著劑般之塗布液塗布在在平面玻璃的情況下,會使用如專利文獻1所示之平台塗布機(table coater)。另外,要將如接著劑般之塗布液塗布在凹狀曲面的情況下,有如專利文獻2所示之使用圓弧狀之噴嘴而塗布、或如專利文獻3所示之在凹狀曲面之最上位部分進行塗布且讓塗布液因為自身重量而在凹狀曲面上移動之方法。 Conventionally, in the case where a coating liquid such as an adhesive is applied to a flat glass, a table coater as disclosed in Patent Document 1 is used. In addition, when a coating liquid such as an adhesive is applied to a concave curved surface, it is applied by using a circular arc nozzle as shown in Patent Document 2, or as the concave curved surface as shown in Patent Document 3. The upper portion is coated and the coating liquid is moved on the concave curved surface due to its own weight.

先行技術文獻 Advanced technical literature 專利文獻 Patent literature

[專利文獻1]日本特開2002-200450號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2002-200450

[專利文獻2]日本特開2004-167422號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2004-167422

[專利文獻3]日本特開2011-256060號公報 [Patent Document 3] Japanese Laid-Open Patent Publication No. 2011-256060

發明概要 Summary of invention

然而,上述之方法皆難以在將塗布液塗布於凹狀曲面時以令所塗布之塗布液之上面成為平面的方式來塗布。另外,凹狀曲面之R形狀(曲率)是隨著曲面基材而各式各樣,沒有可對R形狀不同之各式各樣之曲面基材進行保持之適切之托盤。 However, it is difficult to apply the above method to apply a coating liquid to a concave curved surface so that the upper surface of the applied coating liquid is flat. Further, the R shape (curvature) of the concave curved surface is various depending on the curved base material, and there is no suitable tray for holding various curved base materials having different R shapes.

於是,本發明之目的是提供當將塗布液以其上面成為平面的方式來對曲面基材塗布的情況下可保持R形狀不同之曲面基材之保持托盤。 Accordingly, an object of the present invention is to provide a holding tray which can hold a curved substrate having a different R shape when a coating liquid is applied to a curved substrate in such a manner that the coating liquid is flat thereon.

本發明是藉由狹縫噴嘴而塗布塗布液之曲面基材之保持托盤,其特徵在於包含:一對之夾持構件,在前述狹縫噴嘴之噴嘴移動方向之前述曲面基材之兩端部,將前述曲面基材夾於其間而保持;及1個以上之支持構件,於前述噴嘴移動方向是配置在前述一對之夾持構件之間,從下方支持前述曲面基材。 The present invention relates to a holding tray for applying a curved substrate of a coating liquid by a slit nozzle, comprising: a pair of holding members at both end portions of the curved substrate in a nozzle moving direction of the slit nozzle And holding the curved base material therebetween; and one or more supporting members are disposed between the pair of holding members in the nozzle moving direction, and support the curved base material from below.

根據前述構成,保持托盤是藉由一對之夾持構件夾曲面基材之兩端部而保持,藉由配置在一對之夾持構件之間之1個以上之支持構件而從下方支持曲面基材,故可保持R形狀不同之曲面基材。 According to the above configuration, the holding tray is held by the pair of holding members sandwiching the both end portions of the curved base material, and the supporting surface is supported from below by one or more supporting members disposed between the pair of holding members. The substrate can be used to maintain a curved substrate with different R shapes.

本發明更宜具有如下之構成。 The present invention preferably has the following constitution.

(1)前述一對之夾持構件及前述支持構件是在前述狹縫噴嘴之狹縫方向之前述曲面基材之兩端部設成一對。 (1) The pair of holding members and the supporting member are provided in a pair at both end portions of the curved base material in the slit direction of the slit nozzle.

(2)前述一對之夾持構件及前述支持構件是於前述狹縫噴嘴之狹縫方向延伸而遍及前述曲面基材之全長,或者,於前述狹縫噴嘴之狹縫方向具有預定間隔而設有複數個。 (2) The pair of holding members and the supporting member extend over the slit direction of the slit nozzle and extend over the entire length of the curved base material, or have a predetermined interval in the slit direction of the slit nozzle. There are multiple.

(3)前述支持構件之支持部可於上下方向昇降。 (3) The support portion of the support member can be raised and lowered in the vertical direction.

(4)前述一對之夾持構件之至少其中一者可沿著前述噴嘴移動方向而移動。 (4) At least one of the pair of holding members may move in the nozzle moving direction.

(5)前述支持構件具有於上下方向賦予勢能之賦予勢能構件。 (5) The support member has a potential energy member that imparts potential energy in the vertical direction.

(6)前述支持構件具有:第1支持構件,與前述一對之夾持構件之其中一側之第1夾持構件沿著前述噴嘴移動方向而一體地移動;及第2支持構件,與前述一對之夾持構件之另一側之第2夾持構件沿著前述噴嘴移動方向而一體地移動。 (6) The support member includes: a first support member that integrally moves with one of the pair of holding members, and a second holding member that moves integrally along the nozzle moving direction; and the second supporting member The second holding member on the other side of the pair of holding members integrally moves in the nozzle moving direction.

根據前述構成(1),由於一對之夾持構件及支持構件是在狹縫方向之曲面基材之兩端部設成一對,故能以最小限度之夾持構件及支持構件來構成保持托盤。 According to the above configuration (1), since the pair of holding members and the supporting member are formed in a pair at both end portions of the curved base material in the slit direction, the holding member and the supporting member can be held by the minimum holding member and the supporting member. tray.

根據前述構成(2),由於一對之夾持構件及支持構件是於狹縫方向延伸而遍及曲面基材之全長,故可提升狹縫方向之曲面基材之保持性。另外,由於一對之夾持構件及支持構件是在狹縫方向隔著預定間隔而設有複數個,故能以合理數量之夾持構件及支持構件來構成保持托盤。 According to the above configuration (2), since the pair of holding members and the supporting member extend in the slit direction and extend over the entire length of the curved base material, the retainability of the curved base material in the slit direction can be improved. Further, since the pair of holding members and the supporting members are provided in plural in the slit direction at predetermined intervals, the holding tray can be constituted by a reasonable number of holding members and supporting members.

根據前述構成(3),可配合曲面基材之R形狀而調 整支持構件之支持部之上下方向位置。 According to the above configuration (3), it can be adjusted in accordance with the R shape of the curved substrate The upper and lower positions of the support portion of the support member.

根據前述構成(4),在保持曲面基材之際,可從夾持構件已張開到大於曲面基材之寬之狀態來進行夾曲面基材之兩端部,故易於保持曲面基材。另外,可配合噴嘴移動方向之曲面基材之長度而調整夾持構件間之距離。 According to the above configuration (4), when the curved base material is held, the both ends of the curved base material can be sandwiched from the state in which the sandwiching member is opened to be wider than the curved base material, so that the curved base material can be easily held. In addition, the distance between the clamping members can be adjusted in accordance with the length of the curved substrate in the direction in which the nozzle moves.

根據前述構成(5),可藉由其緩衝性而令曲面基材在承載於支持構件時不承受過分之力,防止曲面基材之損傷,並且,對應曲面基材之形狀之誤差,可提升支持構件之支持性。 According to the foregoing configuration (5), the curved substrate can be prevented from being excessively loaded when being supported by the supporting member by the cushioning property, and the damage of the curved substrate can be prevented, and the error of the shape of the curved substrate can be improved. Support for component support.

根據前述構成(6),可在維持著與第1夾持構件及第1支持構件之位置關係的情況下移動於噴嘴移動方向,另外,可在維持著與第2夾持構件及第2支持構件之位置關係的情況下移動於噴嘴移動方向。所以,可容易地進行用於保持曲面基材之夾持構件及支持構件之位置調整。 According to the above configuration (6), the nozzle moving direction can be moved while maintaining the positional relationship with the first holding member and the first supporting member, and the second holding member and the second support can be maintained. In the case of the positional relationship of the members, the movement direction of the nozzle is moved. Therefore, the positional adjustment of the holding member and the supporting member for holding the curved base material can be easily performed.

總而言之,根據本發明,可提供當將塗布液以其上面成為平面的方式來對曲面基材塗布的情況下可保持R形狀不同之曲面基材之保持托盤。 In summary, according to the present invention, it is possible to provide a holding tray which can hold a curved substrate having a different R shape when the coating liquid is applied to the curved substrate in such a manner that the coating liquid is flat thereon.

1‧‧‧貯留槽 1‧‧‧reservoir

2‧‧‧保持托盤 2‧‧‧Keep the tray

3‧‧‧狹縫噴嘴 3‧‧‧Slit nozzle

3a‧‧‧狹縫前端部 3a‧‧‧Slit front end

3b‧‧‧吐出口 3b‧‧‧Exporting

4‧‧‧供給部 4‧‧‧Supply Department

10‧‧‧塗布裝置 10‧‧‧ Coating device

11‧‧‧曲面基材 11‧‧‧Surface substrate

11a‧‧‧塗布面 11a‧‧‧ coated surface

12‧‧‧兩通閥 12‧‧‧Two-way valve

20‧‧‧臺 20‧‧‧

21‧‧‧夾持構件 21‧‧‧Clamping members

21a‧‧‧鉛直部分 21a‧‧‧Lead part

21b‧‧‧水平部分 21b‧‧‧ horizontal section

21b1‧‧‧上端部 21b1‧‧‧ upper end

21b2‧‧‧下端部 21b2‧‧‧Bottom

22‧‧‧夾持構件 22‧‧‧Clamping members

23‧‧‧支持構件 23‧‧‧Support components

23a‧‧‧支持部 23a‧‧‧Support Department

23b‧‧‧賦予勢能構件 23b‧‧‧Giving potential energy components

23c‧‧‧管狀構件 23c‧‧‧Tubular components

23d‧‧‧底部 23d‧‧‧ bottom

23e‧‧‧孔部 23e‧‧‧孔部

24‧‧‧支持構件 24‧‧‧Support components

24a‧‧‧支持部 24a‧‧‧Support Department

24b‧‧‧賦予勢能構件 24b‧‧‧Giving potential energy components

24c‧‧‧管狀構件 24c‧‧‧Tubular components

24d‧‧‧底部 24d‧‧‧ bottom

24e‧‧‧孔部 24e‧‧‧孔部

25‧‧‧夾持構件 25‧‧‧Clamping members

26‧‧‧夾持構件 26‧‧‧Clamping members

27‧‧‧支持構件 27‧‧‧Support components

28‧‧‧支持構件 28‧‧‧Support components

43‧‧‧馬達 43‧‧‧Motor

44‧‧‧注射泵 44‧‧‧Syringe pump

45‧‧‧第1供給管路 45‧‧‧1st supply line

48‧‧‧三通閥 48‧‧‧Three-way valve

49‧‧‧第2供給管路 49‧‧‧2nd supply line

201‧‧‧滾珠螺桿 201‧‧‧Ball screw

202‧‧‧把手 202‧‧‧Handle

203‧‧‧移動台 203‧‧‧Mobile Station

204‧‧‧移動台 204‧‧‧Mobile Station

209‧‧‧機械手 209‧‧‧manipulator

210‧‧‧夾持構件 210‧‧‧Clamping members

220‧‧‧夾持構件 220‧‧‧Clamping members

230‧‧‧支持構件 230‧‧‧Support components

240‧‧‧支持構件 240‧‧‧Support components

A‧‧‧長度 A‧‧‧ length

B‧‧‧長度 B‧‧‧ Length

C‧‧‧長度 C‧‧‧ Length

D‧‧‧從狹縫噴嘴之前端部至曲面 基材之塗布面為止的距離 D‧‧‧From the front end of the slit nozzle to the curved surface Distance from the coated surface of the substrate

L‧‧‧中間線 L‧‧‧ middle line

X‧‧‧方向 X‧‧‧ direction

Y‧‧‧方向 Y‧‧‧ direction

[圖1]與本發明之實施形態相關之塗布裝置的概略圖。 Fig. 1 is a schematic view of a coating apparatus according to an embodiment of the present invention.

[圖2]狹縫噴嘴部分之附近的概略立體圖。 Fig. 2 is a schematic perspective view of the vicinity of a slit nozzle portion.

[圖3]保持托盤的正面概略圖。 [Fig. 3] A schematic front view of a holding tray.

[圖4]夾持構件的擴大立體圖。 Fig. 4 is an enlarged perspective view of a holding member.

[圖5]說明對保持托盤安裝曲面基材之作業的圖。 Fig. 5 is a view for explaining an operation of attaching a curved substrate to a holding tray.

[圖6]說明對保持托盤安裝曲面基材之作業的圖。 Fig. 6 is a view for explaining an operation of attaching a curved substrate to a holding tray.

[圖7]說明對保持托盤安裝曲面基材之作業的圖。 Fig. 7 is a view for explaining an operation of attaching a curved substrate to a holding tray.

[圖8]顯示不同實施形態之對保持托盤安裝曲面基材之作業的圖。 Fig. 8 is a view showing the operation of holding a curved substrate on a holding tray in a different embodiment.

[圖9]顯示不同實施形態之對保持托盤安裝曲面基材之作業的圖。 Fig. 9 is a view showing an operation of holding a curved substrate on a holding tray in a different embodiment.

[圖10]顯示不同實施形態之對保持托盤安裝曲面基材之作業的圖。 Fig. 10 is a view showing the operation of holding a curved surface substrate of a tray in a different embodiment.

[圖11]夾持構件及支持構件於Y方向延伸而遍及曲面基材之全長之保持托盤的概略立體圖。 Fig. 11 is a schematic perspective view of a holding tray in which a holding member and a supporting member extend in the Y direction and extend over the entire length of the curved base material.

用以實施發明之形態 Form for implementing the invention

(整體構成) (overall)

圖1是與本發明之實施形態相關之塗布裝置10的概略圖。如圖1所示,塗布裝置10具有貯留塗布液之貯留槽1、將塗布液塗布在保持托盤2上之曲面基材11之狹縫噴嘴3、將塗布液從貯留槽1往狹縫噴嘴3供給之供給部4、控制塗布裝置10之控制部。狹縫噴嘴3是平台塗布機用之狹縫噴嘴,該平台塗布機是在噴嘴本身形成有用於吐出塗布液之預定寬度之狹縫、藉由令狹縫噴嘴3移動而將塗布液塗布在基材。 Fig. 1 is a schematic view of a coating device 10 according to an embodiment of the present invention. As shown in Fig. 1, the coating device 10 has a storage tank 1 for storing a coating liquid, a slit nozzle 3 for applying a coating liquid onto a curved substrate 11 on a holding tray 2, and a coating liquid from a storage tank 1 to a slit nozzle 3. The supply unit 4 is supplied and controls the control unit of the coating device 10. The slit nozzle 3 is a slit nozzle for a stage coater that forms a slit having a predetermined width for discharging the coating liquid on the nozzle itself, and applies the coating liquid to the base by moving the slit nozzle 3 material.

於貯留槽1有供給高壓空氣,藉由該高壓空氣之壓力而將塗布液從下方擠出去。附帶一提,亦可以不使用 高壓空氣而是藉由重力來讓貯留槽1內之塗布液擠出去。 The storage tank 1 is supplied with high-pressure air, and the coating liquid is extruded from below by the pressure of the high-pressure air. With a mention, you can also not use The high-pressure air is used to extrude the coating liquid in the storage tank 1 by gravity.

貯留槽1是透過兩通閥12而與供給部4連接。供給部4具有藉由馬達43來驅動之注射泵44、及三通閥48。貯留槽1是透過兩通閥12而與第1供給管路45連接,第1供給管路45是透過三通閥48而與注射泵44連接。注射泵44是透過三通閥48而與第2供給管路49連接。第2供給管路49是與狹縫噴嘴3連接。狹縫噴嘴3可相對於保持托盤2而移動於水平方向,藉由從狹縫噴嘴3塗布之塗布液,而在保持托盤2上之曲面基材11形成塗膜。附帶一提,控制部是藉由控制供給部4(具體而言,控制藉由馬達43來驅動之注射泵44之運作及三通閥48之運作),而控制從貯留槽1往狹縫噴嘴3之塗布液之供給壓力及/或供給量。 The storage tank 1 is connected to the supply unit 4 through the two-way valve 12. The supply unit 4 has a syringe pump 44 driven by a motor 43 and a three-way valve 48. The storage tank 1 is connected to the first supply line 45 through the two-way valve 12, and the first supply line 45 is connected to the syringe pump 44 through the three-way valve 48. The syringe pump 44 is connected to the second supply line 49 through the three-way valve 48. The second supply line 49 is connected to the slit nozzle 3. The slit nozzle 3 is movable in the horizontal direction with respect to the holding tray 2, and a coating film is formed on the curved base material 11 on the holding tray 2 by the coating liquid applied from the slit nozzle 3. Incidentally, the control unit controls the supply from the storage tank 1 to the slit nozzle by controlling the supply unit 4 (specifically, controlling the operation of the syringe pump 44 driven by the motor 43 and the operation of the three-way valve 48). The supply pressure and/or supply amount of the coating liquid of 3.

圖2是狹縫噴嘴3部分附近的概略立體圖。如圖2所示,在狹縫噴嘴3,身為塗布液之吐出口之狹縫是在狹縫噴嘴3之噴嘴移動方向(X方向)只形成預定寬,朝與X方向正交之狹縫方向Y延伸而形成。於是,可藉由令狹縫噴嘴3朝X方向移動,而在保持托盤2上之曲面基材11以預定寬來塗布塗布液。控制部可調整狹縫噴嘴3之X方向之移動速度。具體而言,控制部以令狹縫噴嘴3之X方向之移動速度是與從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比例的方式而控制狹縫噴嘴3。 2 is a schematic perspective view of the vicinity of a portion of the slit nozzle 3. As shown in FIG. 2, in the slit nozzle 3, the slit which is the discharge port of the coating liquid is formed only in a predetermined width in the nozzle moving direction (X direction) of the slit nozzle 3, and is formed in a slit orthogonal to the X direction. The direction Y is extended to form. Then, the coating liquid can be applied to the curved base material 11 on the holding tray 2 by a predetermined width by moving the slit nozzle 3 in the X direction. The control unit can adjust the moving speed of the slit nozzle 3 in the X direction. Specifically, the control unit controls the moving speed of the slit nozzle 3 in the X direction to be inversely proportional to the distance D from the slit tip end portion 3 a of the slit nozzle 3 to the coated surface 11 a of the curved base material 11 . Slot nozzle 3.

關於曲面基材11,從Y方向看起來是以朝下方突出的方式彎曲而在上面之塗布面11a具有凹狀曲面,並且,凹狀曲面具有一定之曲率。而且,曲面基材11具有令凹狀 曲面朝Y方向延伸之構成。 The curved base material 11 is curved from the Y direction so as to protrude downward, and the coated surface 11a on the upper surface has a concave curved surface, and the concave curved surface has a constant curvature. Moreover, the curved substrate 11 has a concave shape The surface is formed to extend in the Y direction.

另外,於曲面基材11塗布之塗布液宜具有觸變性。觸變性是顯示出如凝膠般之塑性固體與如溶膠般之非牛頓液體的中間物質的性質,意指黏度會隨著時間經過而變化之性質。具體而言,若持續承受剪應力則黏度會逐漸降低而變成液狀,若靜止則黏度會逐漸上昇而最後變成固體狀。在本實施形態,塗布液是具有觸變性,藉此,塗布液在從狹縫噴嘴3吐出時是被賦予剪應力而液狀化,塗布在曲面基材11後是黏度逐漸上昇而最後變成固體狀。總而言之,具有觸變性之塗布液是平常高黏度但賦予壓力時黏度降低、流動性變佳之液體(較常見之例子是如油漆、番茄醬、美乃滋),適合用在如本發明般之有塗料從塗膜厚的地方往塗膜薄的地方流出之虞的情況,在賦予壓力而流動性佳地進行吐出之後,當附著於塗布面時黏度上昇而不易流出。 Further, the coating liquid applied to the curved substrate 11 preferably has thixotropic properties. Thixotropy is the property of an intermediate substance that exhibits a gel-like plastic solid and a sol-like non-Newtonian liquid, meaning the property that viscosity will change over time. Specifically, if the shear stress is continuously applied, the viscosity gradually decreases and becomes liquid, and if it is stationary, the viscosity gradually rises and finally becomes solid. In the present embodiment, the coating liquid is thixotropy, whereby the coating liquid is liquidified by applying shear stress when being discharged from the slit nozzle 3, and the viscosity is gradually increased after being applied to the curved base material 11, and finally becomes solid. shape. In summary, the thixotropic coating liquid is a liquid which is generally high in viscosity but which has a reduced viscosity and a good fluidity when it is applied to pressure (common examples are paints, ketchup, mayonnaise), and is suitable for use in coatings as in the present invention. In the case where the coating film is discharged from a place where the coating film is thick to a place where the coating film is thin, after the pressure is applied and the fluidity is excellent, the viscosity is increased and the gas is not easily discharged when it adheres to the coated surface.

(保持托盤) (hold the tray)

圖3是保持托盤2的正面概略圖。如圖2及圖3所示,對曲面基材11進行保持之保持托盤2是在狹縫噴嘴3之狹縫方向(Y方向)之一端部具有一對之夾持構件21、22及支持構件23、24,前者是在狹縫噴嘴3之噴嘴移動方向(X方向)之曲面基材11之兩端部將曲面基材11夾於其間而保持,後者是在X方向上配置於一對之夾持構件21、22之間而從下方支持曲面基材11。並且,保持托盤2是在狹縫噴嘴3之狹縫方向(Y方向)之另一端部具有一對之夾持構件25、26及支持構件27、28,前者是在狹縫噴嘴3之噴嘴移動方向(X方向)之曲 面基材11之兩端部將曲面基材11夾於其間而保持,後者是在X方向上配置於一對之夾持構件25、26之間而從下方支持曲面基材11。而且,夾持構件21與支持構件23、及、夾持構件25與支持構件27是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對,夾持構件22與支持構件24、及、夾持構件26與支持構件28是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對。 FIG. 3 is a schematic front view of the holding tray 2. As shown in FIG. 2 and FIG. 3, the holding tray 2 for holding the curved base material 11 has a pair of holding members 21, 22 and a supporting member at one end portion of the slit nozzle 3 in the slit direction (Y direction). 23 and 24, the former is held by sandwiching the curved base material 11 at both end portions of the curved base material 11 in the nozzle moving direction (X direction) of the slit nozzle 3, and the latter is disposed in a pair in the X direction. The curved base material 11 is supported from below between the sandwiching members 21 and 22. Further, the holding tray 2 has a pair of holding members 25, 26 and supporting members 27, 28 at the other end portion of the slit nozzle 3 in the slit direction (Y direction), the former being the nozzle movement at the slit nozzle 3. Direction (X direction) Both end portions of the surface substrate 11 are held by sandwiching the curved base material 11 therebetween, and the latter is disposed between the pair of holding members 25 and 26 in the X direction to support the curved base material 11 from below. Further, the holding member 21 and the supporting member 23, and the holding member 25 and the supporting member 27 are formed in a pair at both end portions of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3, and are sandwiched. The holding member 22 and the supporting member 24, and the holding member 26 and the supporting member 28 are provided in a pair at both end portions of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3.

夾持構件21具有朝上下方向延伸之鉛直部分21a、從鉛直部分21a之上端部朝水平方向延伸之水平部分21b。在此,在圖3,鉛直部分21a之長度A、狹縫噴嘴3與鉛直部分21a之鉛直方向長度B、狹縫噴嘴3(初期位置)與鉛直部分21a之X方向長度C是一定。所以,當以夾持構件21夾持曲面基材11時,即便曲面基材11之厚度或曲率發生變化,長度A、長度B及長度C仍為一定,因此,即便曲面基材11之曲率改變,亦可令塗布裝置10之運作之初期條件一定。附帶一提,夾持構件21、22、25、26是以令水平部分之下端之高度(亦即鉛直部分之長度A)相同的方式形成,而將曲面基材11之兩端部以相同高度來夾持。 The holding member 21 has a vertical portion 21a extending in the up-and-down direction and a horizontal portion 21b extending in the horizontal direction from the upper end portion of the vertical portion 21a. Here, in FIG. 3, the length A of the vertical portion 21a, the length B of the vertical direction of the slit nozzle 3 and the vertical portion 21a, the slit nozzle 3 (initial position), and the length C of the vertical portion 21a in the X direction are constant. Therefore, when the curved base material 11 is held by the sandwiching member 21, even if the thickness or curvature of the curved base material 11 changes, the length A, the length B, and the length C are constant, and therefore, even if the curvature of the curved base material 11 changes It is also possible to make the initial conditions of the operation of the coating device 10 constant. Incidentally, the holding members 21, 22, 25, 26 are formed in such a manner that the height of the lower end of the horizontal portion (that is, the length A of the vertical portion) is the same, and the both ends of the curved substrate 11 are at the same height. Come to clamp.

圖4是夾持構件21的擴大立體圖。夾持構件22、25、26是與夾持構件21具有同樣之構造,以下,以夾持構件21來舉例說明。如圖4所示,夾持構件21之水平部分21b是以下端部21b2之水平截面會比上端部21b1小的方式而形成。 FIG. 4 is an enlarged perspective view of the clamp member 21. The holding members 22, 25, 26 have the same configuration as the holding member 21, and hereinafter, the holding member 21 is exemplified. As shown in FIG. 4, the horizontal portion 21b of the sandwiching member 21 is formed such that the horizontal end section of the lower end portion 21b2 is smaller than the upper end portion 21b1.

為了配合噴嘴移動方向(X方向)之曲面基材11的 長度來調整夾持構件21、22間之距離,夾持構件22可相對於夾持構件21而沿著X方向移動。具體而言,與夾持構件22卡合之滾珠螺桿201是從臺20之X方向端部朝X方向內側延伸而設,可藉由將滾珠螺桿201之前端部之把手202旋轉,而令與滾珠螺桿201卡合之夾持構件22在X方向移動。並且,由於夾持構件22及支持構件24是安裝在移動台203(其安裝在臺20之上部且可在X方向移動),故當藉由滾珠螺桿201而令夾持構件22在X方向移動時,移動台203亦會在X方向移動,再者,支持構件24亦會在X方向移動。結果,夾持構件22與支持構件24會一體地在X方向移動。 In order to match the direction of movement of the nozzle (X direction) of the curved substrate 11 The distance between the grip members 21, 22 is adjusted in length, and the grip member 22 is movable in the X direction with respect to the grip member 21. Specifically, the ball screw 201 that is engaged with the holding member 22 is provided to extend inward in the X direction from the X-direction end portion of the table 20, and can be rotated by rotating the handle 202 of the front end portion of the ball screw 201. The grip member 22 to which the ball screw 201 is engaged moves in the X direction. Further, since the holding member 22 and the supporting member 24 are mounted on the moving table 203 (which is mounted on the upper portion of the table 20 and is movable in the X direction), the holding member 22 is moved in the X direction by the ball screw 201. At this time, the mobile station 203 also moves in the X direction, and the support member 24 also moves in the X direction. As a result, the grip member 22 and the support member 24 are integrally moved in the X direction.

與夾持構件22同樣,為了配合噴嘴移動方向(X方向)之曲面基材11的長度來調整夾持構件25、26間之距離,夾持構件26可相對於夾持構件25而沿著X方向移動。而且,支持構件28是與夾持構件26一體地在X方向移動。 Similarly to the grip member 22, in order to adjust the distance between the grip members 25, 26 in accordance with the length of the curved substrate 11 in the nozzle moving direction (X direction), the grip member 26 can be along the X with respect to the grip member 25. Move in direction. Further, the support member 28 is moved integrally with the clamp member 26 in the X direction.

支持構件23、24、27、28是具有同樣之構造。以下,以支持構件23來舉例說明。支持構件23是在上端部具有與曲面基材11接觸之支持部23a,支持部23a是藉由壓縮空氣、電磁力、或機械構造等而可在上下方向昇降。支持部23a之頂部具有球形狀,以樹脂而構成。再者,支持構件23具有在上下方向被賦予勢能之賦予勢能構件23b。賦予勢能構件23b舉例來說是彈簧,具有支持曲面基材11之情況下之緩衝機能。賦予勢能構件23b是收納在管狀構件23c,令支持部23a上下昇降。 The support members 23, 24, 27, 28 have the same configuration. Hereinafter, the support member 23 will be exemplified. The support member 23 has a support portion 23a that comes into contact with the curved base material 11 at the upper end portion, and the support portion 23a can be moved up and down in the vertical direction by compressed air, electromagnetic force, or mechanical structure. The top of the support portion 23a has a spherical shape and is made of a resin. Further, the support member 23 has the potential energy member 23b to which the potential energy is applied in the vertical direction. The potential energy member 23b is, for example, a spring, and has a buffering function in the case of supporting the curved substrate 11. The potential energy member 23b is housed in the tubular member 23c, and the support portion 23a is raised and lowered.

(對保持托盤安裝曲面基材) (Installing the curved substrate for the holding tray)

圖5~圖7是說明對保持托盤2安裝曲面基材11之作業的圖。首先,如圖5所示,使移動台203相對於臺20而移動,藉此,令夾持構件22及支持構件24移動到X方向上與夾持構件21及支持構件23相離最遠之位置。 5 to 7 are views for explaining the operation of attaching the curved base material 11 to the holding tray 2. First, as shown in FIG. 5, the moving table 203 is moved relative to the table 20, whereby the holding member 22 and the supporting member 24 are moved to the farthest distance from the holding member 21 and the supporting member 23 in the X direction. position.

接著,如圖6所示,藉由夾持構件21來將曲面基材11之一端部夾持,並一面以支持構件23之支持部23a於上下方向緩衝、一面藉由支持構件23從下方支持曲面基材11。 Next, as shown in FIG. 6, one end portion of the curved base material 11 is sandwiched by the sandwiching member 21, and is supported by the support portion 23a of the support member 23 in the vertical direction while being supported from below by the support member 23. Curved substrate 11.

最後,如圖7所示,使移動台203相對於臺20而移動,藉此,令夾持構件22及支持構件24朝夾持構件21及支持構件23接近。然後,藉由夾持構件22來將曲面基材11之另一端部夾持,並一面以支持構件24之支持部23a於上下方向緩衝、一面藉由支持構件24從下方支持曲面基材11。附帶一提,在上述安裝,夾持構件25及支持構件27之運作是對應於夾持構件21及支持構件23之運作,夾持構件26及支持構件28之運作是對應於夾持構件22及支持構件24之運作。 Finally, as shown in FIG. 7, the moving table 203 is moved with respect to the table 20, whereby the holding member 22 and the support member 24 are brought close to the holding member 21 and the support member 23. Then, the other end portion of the curved base material 11 is sandwiched by the sandwiching member 22, and the curved base material 11 is supported from below by the support member 24 while being supported by the support portion 23a of the support member 24 in the vertical direction. Incidentally, in the above mounting, the operation of the clamping member 25 and the supporting member 27 corresponds to the operation of the clamping member 21 and the supporting member 23, and the operation of the clamping member 26 and the supporting member 28 corresponds to the clamping member 22 and The operation of the support member 24 is supported.

塗布裝置10是如下般地運作。 The coating device 10 operates as follows.

首先,於貯留槽1供給高壓空氣而加壓,令兩通閥12開放。然後,以三通閥48作為吸引側,令馬達43朝吸引側旋轉,則貯留槽1內之塗布液會通過第1供給管路45、透過三通閥48而填充於注射泵44。 First, high-pressure air is supplied to the storage tank 1 to be pressurized, and the two-way valve 12 is opened. Then, when the three-way valve 48 is used as the suction side and the motor 43 is rotated toward the suction side, the coating liquid in the storage tank 1 is filled in the syringe pump 44 through the first supply line 45 and the three-way valve 48.

在往注射泵44之填充完成後,將三通閥48切換成吐出側。然後,令馬達43朝吐出側旋轉,則注射泵44內之 塗布液會從三通閥48通過第2供給管路49而供給至狹縫噴嘴3。控制部是將馬達43控制成當將注射泵44內之塗布液供給至狹縫噴嘴3之際,塗布液之供給壓力或供給量一定。然後,塗布液會從狹縫噴嘴3之吐出口3b以供給壓力或供給量一定的方式而吐出至保持托盤2上之曲面基材11,成為塗膜。 After the filling of the syringe pump 44 is completed, the three-way valve 48 is switched to the discharge side. Then, the motor 43 is rotated toward the discharge side, and the syringe pump 44 is used. The coating liquid is supplied from the three-way valve 48 to the slit nozzle 3 through the second supply line 49. The control unit controls the motor 43 so that the supply pressure or the supply amount of the coating liquid is constant when the coating liquid in the syringe pump 44 is supplied to the slit nozzle 3. Then, the coating liquid is discharged from the discharge port 3b of the slit nozzle 3 to the curved base material 11 on the holding tray 2 so that the supply pressure or the supply amount is constant, and becomes a coating film.

根據前述構成之塗布裝置10,可發揮如下之效果。 According to the coating apparatus 10 of the above configuration, the following effects can be exhibited.

(1)保持托盤2是以夾持構件21、22及25、26來夾曲面基材11之X方向兩端部而保持,藉由配置在夾持構件21、22及25、26之間之支持構件23、24及27、28而從下方支持曲面基材11,故即便基材是曲面亦可保持,另外,可保持R形狀不同之曲面基材11。 (1) The holding tray 2 is held by sandwiching the both ends of the curved base material 11 in the X direction by the holding members 21, 22, 25, and 26, and is disposed between the holding members 21, 22, and 25, 26 Since the support members 23, 24, 27, and 28 support the curved base material 11 from below, even if the base material is a curved surface, the curved base material 11 having a different R shape can be held.

(2)由於夾持構件21、25與支持構件23、27、以及、夾持構件22、26與支持構件24、28是在Y方向之曲面基材11之兩端部設成一對,故能以最小限度之夾持構件及支持構件來構成保持托盤。 (2) Since the holding members 21, 25 and the supporting members 23, 27, and the holding members 22, 26 and the supporting members 24, 28 are formed in a pair at both end portions of the curved base material 11 in the Y direction, The holding tray can be constructed with a minimum of the clamping member and the supporting member.

(3)由於支持構件23、24、27、28之支持部可於上下方向昇降,故可配合曲面基材11之R形狀而調整支持構件23、24、27、28之支持部之上下方向位置。 (3) Since the support portions of the support members 23, 24, 27, and 28 can be raised and lowered in the up and down direction, the support portion of the support members 23, 24, 27, and 28 can be adjusted in the up and down direction in accordance with the R shape of the curved base material 11. .

(4)由於夾持構件22、26可沿著X方向而移動,故當要保持曲面基材11之際,可從夾持構件22、26已張開到大於曲面基材11之寬之狀態來進行夾曲面基材11之兩端部,故易於保持曲面基材11。另外,可配合X方向之曲面基材11 之長度而調整夾持構件21、22及25、26間之距離。 (4) Since the holding members 22, 26 are movable in the X direction, when the curved substrate 11 is to be held, the clamping members 22, 26 can be opened to a state larger than the width of the curved substrate 11. Since both end portions of the curved surface substrate 11 are sandwiched, it is easy to hold the curved base material 11. In addition, it can be combined with the curved substrate 11 in the X direction. The distance between the holding members 21, 22 and 25, 26 is adjusted by the length.

(5)由於夾持構件21、22、25、26之水平部分是以下端部之水平截面會比上端部小的方式而形成,故可減少曲面基材11與夾持構件21、22、25、26之接觸面積。結果,可減少因為夾持構件21、22、25、26之接觸所造成之令曲面基材11損傷之可能性。 (5) Since the horizontal portion of the holding members 21, 22, 25, 26 is formed such that the horizontal section of the lower end portion is smaller than the upper end portion, the curved base material 11 and the holding members 21, 22, 25 can be reduced. , 26 contact area. As a result, the possibility of damage to the curved substrate 11 due to the contact of the holding members 21, 22, 25, 26 can be reduced.

(6)由於夾持構件21、22、25、26是將曲面基材11之兩端部在相同高度夾持,故在夾持位置,規定從狹縫前端部3a至曲面基材11之塗布面11a為止的距離D。結果,即便曲面基材11之R形狀改變亦可令狹縫噴嘴3之動作之初期位置相同,可令狹縫噴嘴3之動作控制變容易。 (6) Since the sandwiching members 21, 22, 25, and 26 sandwich the both end portions of the curved base material 11 at the same height, the coating from the slit front end portion 3a to the curved base material 11 is specified at the nip position. The distance D from the surface 11a. As a result, even if the R shape of the curved base material 11 is changed, the initial positions of the slit nozzles 3 can be made the same, and the operation control of the slit nozzles 3 can be facilitated.

(7)由於支持構件23、24、27、28具有於上下方向賦予勢能之賦予勢能構件,故可藉由其緩衝性而令曲面基材11在承載於支持構件時不承受過分之力,防止曲面基材11之損傷,並且,對應曲面基材11之形狀之誤差,可提升支持構件23、24、27、28之支持性。 (7) Since the support members 23, 24, 27, and 28 have the potential energy-applying members that impart potential energy in the up-and-down direction, the cushion base material can prevent the curved base material 11 from being excessively stressed when being carried on the support member. The damage of the curved substrate 11 and the support of the support members 23, 24, 27, 28 can be improved by the error of the shape of the curved substrate 11.

(8)由於支持構件24是與夾持構件22沿著X方向而一體地移動,支持構件28是與夾持構件26沿著X方向而一體地移動,故可在維持著與夾持構件22、支持構件24之位置關係的情況下移動於X方向,另外,可在維持著與夾持構件26、支持構件28之位置關係的情況下移動於X方向。所以,可容易地進行用於保持曲面基材11之夾持構件22及支持構件24、夾持構件26及支持構件28之位置調整。 (8) Since the support member 24 is integrally moved with the grip member 22 in the X direction, the support member 28 is integrally moved with the grip member 26 in the X direction, so that the grip member 22 can be maintained When the positional relationship of the support member 24 is maintained, the movement is in the X direction, and the X direction can be moved while maintaining the positional relationship with the clamp member 26 and the support member 28. Therefore, the positional adjustment of the holding member 22 and the supporting member 24, the holding member 26, and the supporting member 28 for holding the curved base material 11 can be easily performed.

(9)由於支持構件23、24、27、28之上端部是具 有球形狀,故可減少曲面基材11與支持構件23、24、27、28之接觸面積。結果,可減少因為支持構件23、24、27、28之接觸所造成之令曲面基材11損傷之可能性。另外,由於支持構件23、24、27、28之上端部是以樹脂構成,故可減少因為支持構件23、24、27、28之接觸所造成之令曲面基材11損傷之可能性。 (9) Since the upper ends of the support members 23, 24, 27, 28 are Since it has a spherical shape, the contact area of the curved base material 11 and the supporting members 23, 24, 27, 28 can be reduced. As a result, the possibility of damage to the curved substrate 11 due to the contact of the supporting members 23, 24, 27, 28 can be reduced. Further, since the upper end portions of the supporting members 23, 24, 27, 28 are made of resin, the possibility of damage to the curved base material 11 due to the contact of the supporting members 23, 24, 27, 28 can be reduced.

(10)由於狹縫噴嘴3之初期位置側之夾持構件21、25是固定、令夾持構件22、26移動於X方向而將曲面基材11夾持,故狹縫噴嘴3之初期位置及由夾持構件21、25造成之曲面基材11之夾持位置是固定。結果,可令塗布裝置10之運作之初期條件一定,可令狹縫噴嘴3之動作控制變容易。 (10) Since the sandwiching members 21 and 25 on the initial position side of the slit nozzle 3 are fixed, and the sandwiching members 22 and 26 are moved in the X direction to sandwich the curved base material 11, the initial position of the slit nozzle 3 is obtained. And the clamping position of the curved substrate 11 caused by the holding members 21, 25 is fixed. As a result, the initial conditions of the operation of the coating device 10 can be made constant, and the operation control of the slit nozzle 3 can be facilitated.

(11)可在往狹縫噴嘴3之塗布液之供給壓力一定之狀態下,以令狹縫噴嘴3之移動速度是與從狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比例的方式而移動狹縫噴嘴3,藉此,以令塗布液之上面成為平面的方式對曲面基材11塗布塗布液。 (11) The moving speed of the slit nozzle 3 in the state where the supply pressure to the coating liquid of the slit nozzle 3 is constant is the distance from the slit front end portion 3a to the coated surface 11a of the curved base material 11 D moves the slit nozzle 3 in an inversely proportional manner, whereby the coating liquid is applied to the curved base material 11 so that the upper surface of the coating liquid becomes a flat surface.

(12)可在往狹縫噴嘴3之塗布液之供給量一定之狀態下,以令狹縫噴嘴3之移動速度是與從狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比例的方式而移動狹縫噴嘴3,藉此,以令塗布液之上面成為平面的方式對曲面基材11塗布塗布液。 (12) In a state where the supply amount of the coating liquid to the slit nozzle 3 is constant, the moving speed of the slit nozzle 3 is the distance from the slit front end portion 3a to the coated surface 11a of the curved base material 11. D moves the slit nozzle 3 in an inversely proportional manner, whereby the coating liquid is applied to the curved base material 11 so that the upper surface of the coating liquid becomes a flat surface.

(13)可用接著劑來作為塗布液而塗布於曲面基材11之凹狀曲面,藉此,在凹狀曲面以接著劑之上面成為平面的方式塗布接著劑。結果,凸狀曲面玻璃與平面玻璃 之貼合變容易,可容易地形成片側凸玻璃。 (13) The adhesive can be applied to the concave curved surface of the curved base material 11 as a coating liquid, whereby the adhesive is applied to the concave curved surface so that the upper surface of the adhesive becomes a flat surface. As a result, convex curved glass and flat glass The bonding is easy, and the sheet-side convex glass can be easily formed.

(14)若塗布液具有觸變性,則可抑制塗布在曲面基材11之塗布液之移動,可將塗布液平坦地塗布在曲面基材11之預定領域內。另外,若塗布液具有觸變性,則吐出後之塗布液是黏度高,因此,即便是如在曲面基材11進行平面塗布的情況般之在塗布中有塗布厚度變化的情況,亦不易發生塗布液從厚度厚的地方往厚度薄的地方流出而使厚度變化之情形,可令塗布液之上面成為適切之平面。 (14) When the coating liquid has thixotropic properties, the movement of the coating liquid applied to the curved base material 11 can be suppressed, and the coating liquid can be applied flatly in a predetermined field of the curved base material 11. Further, when the coating liquid has thixotropic properties, the coating liquid after the discharge has a high viscosity. Therefore, even if the coating thickness changes during coating as in the case where the curved base material 11 is applied in a plane, coating is less likely to occur. When the liquid flows from a thick portion to a thin portion and the thickness is changed, the upper surface of the coating liquid can be made into a suitable plane.

雖然在上述實施形態中,支持構件是於噴嘴移動方向(X方向)設置2個,但亦可以是設置1個或3個以上。 In the above embodiment, the support member is provided in two in the nozzle moving direction (X direction), but one or three or more may be provided.

雖然在上述實施形態中,夾持構件與支持構件是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對,但夾持構件與支持構件亦可以是在Y方向上具有預定間隔而設置3個以上。 In the above embodiment, the holding member and the supporting member are provided in a pair at both end portions of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3, but the holding member and the supporting member may be It is set to have three or more predetermined intervals in the Y direction.

根據本構成,由於夾持構件及支持構件是在狹縫方向隔著預定間隔而設有複數個,故能以合理數量之夾持構件及支持構件來構成保持托盤。 According to this configuration, since the sandwiching member and the supporting member are provided in plural in the slit direction at predetermined intervals, the holding tray can be constituted by a reasonable number of holding members and supporting members.

在上述實施形態,夾持構件22、26可相對於夾持構件21、25而沿著X方向移動。然而,亦可以是夾持構件21、25可相對於夾持構件22、26而沿著X方向移動。另外,亦可以令夾持構件21、22是以維持夾持構件21、22間之中間線之位置的方式而沿著X方向一體地移動,令夾持構件25、26是以維持夾持構件25、26間之中間線之位置的方式而沿著X方向一體地移動。要達成如此之夾持構件21、22,可以令 移動台203、204是以維持夾持構件21、22間之中間線之位置的方式而相對於臺20移動。藉此,即便曲面基材11之尺寸不同,亦可總是以保持托盤2之中央來保持曲面基材11。 In the above embodiment, the sandwiching members 22 and 26 are movable in the X direction with respect to the sandwiching members 21 and 25. However, it is also possible that the gripping members 21, 25 are movable in the X direction with respect to the gripping members 22, 26. Further, the holding members 21 and 22 may be integrally moved in the X direction so as to maintain the position of the intermediate line between the holding members 21 and 22, so that the holding members 25 and 26 are to maintain the holding members. The position of the middle line between the 25 and 26 is integrally moved along the X direction. To achieve such a clamping member 21, 22, it can be The moving stages 203 and 204 move relative to the stage 20 so as to maintain the position of the intermediate line between the sandwiching members 21 and 22. Thereby, even if the size of the curved base material 11 is different, the curved base material 11 can always be held by holding the center of the tray 2.

圖8~圖10是說明令夾持構件21、22以維持夾持構件21、22間之中間線L之位置的方式而沿著X方向一體地移動、令夾持構件25、26以維持夾持構件25、26間之中間線L之位置的方式而沿著X方向一體地移動的情況下之與上述實施形態不同之對保持托盤2安裝曲面基材11之作業的圖。關於以維持夾持構件21、22間之中間線L之位置的方式而沿著X方向一體地移動,舉例來說是指當令夾持構件21朝遠離夾持構件22之方向移動,則夾持構件22朝遠離夾持構件21之方向亦移動相同之距離,當令夾持構件21朝接近夾持構件22之方向移動,則夾持構件22朝接近夾持構件21之方向亦移動相同之距離。關於以維持夾持構件25、26間之中間線L之位置的方式而沿著X方向一體地移動,所指意思亦與上述相同。附帶一提,管狀構件23c、24c是具有底部23d、24d,底部23d、24d可相對於孔部23e、24e而沿著上下方向移動。 8 to 10 are views for explaining that the holding members 21 and 22 are integrally moved in the X direction so as to maintain the position of the intermediate line L between the sandwiching members 21 and 22, so that the holding members 25 and 26 are held by the holding members. In the case where the position of the intermediate line L between the members 25 and 26 is integrally moved in the X direction, the operation of attaching the curved base material 11 to the holding tray 2 different from the above embodiment is shown. Regarding the movement integrally in the X direction in such a manner as to maintain the position of the intermediate line L between the sandwiching members 21, 22, for example, when the holding member 21 is moved away from the holding member 22, the clamping is performed. The member 22 is also moved by the same distance away from the holding member 21, and when the holding member 21 is moved toward the holding member 22, the holding member 22 is also moved by the same distance toward the holding member 21. The meaning of moving integrally along the X direction so as to maintain the position of the intermediate line L between the sandwiching members 25 and 26 is also the same as described above. Incidentally, the tubular members 23c and 24c have bottom portions 23d and 24d, and the bottom portions 23d and 24d are movable in the vertical direction with respect to the hole portions 23e and 24e.

在對保持托盤2安裝曲面基材11之作業,首先,如圖8所示,令移動台203、204相對於臺20而移動,藉此,令夾持構件21與支持構件23、以及、夾持構件22與支持構件24移動至互相於X方向離最遠之位置。 In the operation of attaching the curved base material 11 to the holding tray 2, first, as shown in Fig. 8, the moving stages 203, 204 are moved relative to the stage 20, whereby the holding member 21 and the supporting member 23, and the clip are clamped. The holding member 22 and the supporting member 24 are moved to a position farthest from each other in the X direction.

接著,如圖9所示,藉由機械手209等而令曲面基材11位於夾持構件21與夾持構件22之間。 Next, as shown in FIG. 9, the curved base material 11 is positioned between the clamp member 21 and the clamp member 22 by the robot 209 or the like.

最後,如圖10所示,令移動台203、204相對於臺20而移動,藉此,令夾持構件21與支持構件23、以及、夾持構件22與支持構件24互相於X方向接近。然後,藉由夾持構件21來夾持曲面基材11之一端部,並且,從底部23d之下方藉由壓縮空氣等而將管狀構件23c從孔部23e朝上方舉起,使支持構件23之支持部朝上方昇降,藉由支持構件23而從下方支持曲面基材11。同時,藉由夾持構件22來夾持曲面基材11之另一端部,並且,從底部24d之下方藉由壓縮空氣等而將管狀構件24c從孔部24e朝上方舉起,使支持構件24之支持部朝上方昇降,藉由支持構件24而從下方支持曲面基材11。附帶一提,在上述安裝,夾持構件25及支持構件27之運作是對應於夾持構件21及支持構件23之運作,夾持構件26及支持構件28之運作是對應於夾持構件22及支持構件24之運作。藉由該等一連串之動作,曲面基材11是下面離開機械手209之上面而傳遞至臺20。此時,亦可以是令機械手209朝下方移動而離開曲面基材11之下面。 Finally, as shown in FIG. 10, the moving stages 203, 204 are moved relative to the stage 20, whereby the holding member 21 and the supporting member 23, and the holding member 22 and the supporting member 24 are brought close to each other in the X direction. Then, one end portion of the curved base material 11 is held by the sandwiching member 21, and the tubular member 23c is lifted upward from the hole portion 23e by compressed air or the like from below the bottom portion 23d, so that the support member 23 is lifted. The support portion is raised and lowered upward, and the curved base material 11 is supported from below by the support member 23. At the same time, the other end portion of the curved base material 11 is held by the sandwiching member 22, and the tubular member 24c is lifted upward from the hole portion 24e by compressed air or the like from below the bottom portion 24d, so that the support member 24 is lifted. The support portion is raised and lowered upward, and the curved base material 11 is supported from below by the support member 24. Incidentally, in the above mounting, the operation of the clamping member 25 and the supporting member 27 corresponds to the operation of the clamping member 21 and the supporting member 23, and the operation of the clamping member 26 and the supporting member 28 corresponds to the clamping member 22 and The operation of the support member 24 is supported. By the series of actions, the curved substrate 11 is transferred from the upper surface of the robot 209 to the table 20 below. At this time, the robot 209 may be moved downward to leave the lower surface of the curved base material 11.

根據本構成,由於夾持構件21、22及25、26是以維持中間線之位置的方式而一體地移動,故即便曲面基材11之尺寸不同,亦可將曲面基材11在保持托盤2之中央部予以保持,可配合X方向之曲面基材11之長度而容易地調整夾持構件21、22及25、26間之距離。另外,由於支持構件23是與夾持構件21沿著X方向而一體地移動、支持構件24是與夾持構件22沿著X方向而一體地移動,故可在維持著與夾持構件21、支持構件23之位置關係的情況下移動於X方向,另 外,可在維持著與夾持構件22、支持構件24之位置關係的情況下移動於X方向。再者,由於支持構件27是與夾持構件25沿著X方向而一體地移動、支持構件28是與夾持構件26沿著X方向而一體地移動,故可在維持著與夾持構件25、支持構件27之位置關係的情況下移動於X方向,另外,可在維持著與夾持構件26、支持構件28之位置關係的情況下移動於X方向。所以,可容易地進行用於保持曲面基材11之夾持構件21及支持構件23、夾持構件22及支持構件24、夾持構件25及支持構件27、夾持構件26及支持構件28之位置調整。 According to this configuration, since the sandwiching members 21, 22, 25, and 26 are integrally moved to maintain the position of the intermediate line, even if the size of the curved base material 11 is different, the curved base material 11 can be held in the holding tray 2. The center portion is held, and the distance between the sandwich members 21, 22, 25, and 26 can be easily adjusted in accordance with the length of the curved base material 11 in the X direction. Further, since the support member 23 integrally moves with the clamp member 21 in the X direction, and the support member 24 integrally moves with the clamp member 22 in the X direction, the clamp member 21 can be maintained. In the case of supporting the positional relationship of the member 23, moving in the X direction, another Further, the X direction can be moved while maintaining the positional relationship with the sandwiching member 22 and the supporting member 24. Further, since the support member 27 is integrally moved with the clamp member 25 in the X direction, and the support member 28 is integrally moved with the clamp member 26 in the X direction, the support member 25 can be maintained and held. When the positional relationship of the support member 27 is maintained, the movement is in the X direction, and the X direction is maintained while maintaining the positional relationship with the sandwiching member 26 and the support member 28. Therefore, the holding member 21 and the supporting member 23 for holding the curved base material 11, the holding member 22 and the supporting member 24, the holding member 25 and the supporting member 27, the holding member 26, and the supporting member 28 can be easily performed. Position adjustment.

另外,在上述實施形態,夾持構件21與支持構件23、以及、夾持構件25與支持構件27是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對,夾持構件22與支持構件24、以及、夾持構件26與支持構件28是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對。然而,如圖11所示,亦可以令夾持構件210與支持構件230、以及、夾持構件220與支持構件240是以於Y方向延伸而遍及曲面基材11之全長的方式而設。這些構件可以是如圖11所示地以1整條來延伸於Y方向而遍及曲面基材11之全長,亦可以是適宜地在中途分割,具有預定間隔而設有複數個。 Further, in the above embodiment, the holding member 21 and the supporting member 23, and the holding member 25 and the supporting member 27 are provided at both end portions of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3. In a pair, the holding member 22 and the supporting member 24, and the holding member 26 and the supporting member 28 are formed in a pair at both end portions of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3. . However, as shown in FIG. 11, the holding member 210 and the supporting member 230, and the holding member 220 and the supporting member 240 may be provided so as to extend over the entire length of the curved base material 11 in the Y direction. These members may extend over the entire length of the curved base material 11 in one direction as shown in FIG. 11, or may be appropriately divided in the middle, and may have a plurality of predetermined intervals.

根據本構成,由於夾持構件21、22及支持構件23、24是於Y方向延伸而遍及曲面基材11之全長,故可提升Y方向之曲面基材之保持性。 According to this configuration, since the sandwiching members 21 and 22 and the supporting members 23 and 24 extend in the Y direction and extend over the entire length of the curved base material 11, the retainability of the curved base material in the Y direction can be improved.

在未超脫申請專利範圍所記載之本發明之精神 及範圍的情況下進行各種變形及變更是可能的。 The spirit of the invention described in the patent application scope is not exceeded. Various modifications and changes are possible in the case of the range.

[產業利用性] [Industry Utilization]

本發明可提供當將塗布液以其上面成為平面的方式來對曲面基材塗布的情況下可保持R形狀不同之曲面基材之保持托盤,故產業上之利用價值高。 According to the present invention, it is possible to provide a holding tray for a curved base material having a different R shape when the coating liquid is applied to the curved base material so that the coating liquid is flat thereon, so that the industrial use value is high.

3‧‧‧狹縫噴嘴 3‧‧‧Slit nozzle

3a‧‧‧狹縫前端部 3a‧‧‧Slit front end

11‧‧‧曲面基材 11‧‧‧Surface substrate

11a‧‧‧塗布面 11a‧‧‧ coated surface

20‧‧‧臺 20‧‧‧

21‧‧‧夾持構件 21‧‧‧Clamping members

21a‧‧‧鉛直部分 21a‧‧‧Lead part

21b‧‧‧水平部分 21b‧‧‧ horizontal section

22‧‧‧夾持構件 22‧‧‧Clamping members

23‧‧‧支持構件 23‧‧‧Support components

23a‧‧‧支持部 23a‧‧‧Support Department

23b‧‧‧賦予勢能構件 23b‧‧‧Giving potential energy components

23c‧‧‧管狀構件 23c‧‧‧Tubular components

24‧‧‧支持構件 24‧‧‧Support components

24a‧‧‧支持部 24a‧‧‧Support Department

24b‧‧‧賦予勢能構件 24b‧‧‧Giving potential energy components

24c‧‧‧管狀構件 24c‧‧‧Tubular components

201‧‧‧滾珠螺桿 201‧‧‧Ball screw

202‧‧‧把手 202‧‧‧Handle

203‧‧‧移動台 203‧‧‧Mobile Station

A‧‧‧長度 A‧‧‧ length

B‧‧‧長度 B‧‧‧ Length

C‧‧‧長度 C‧‧‧ Length

D‧‧‧從狹縫噴嘴之前端部至曲面基材 之塗布面為止的距離 D‧‧‧From the front end of the slit nozzle to the curved substrate Distance from the coated surface

X‧‧‧方向 X‧‧‧ direction

Claims (7)

一種保持托盤,是藉由狹縫噴嘴而塗布塗布液之曲面基材之保持托盤,其特徵在於包含:一對之夾持構件,在前述狹縫噴嘴之噴嘴移動方向之前述曲面基材之兩端部,將前述曲面基材夾於其間而保持;及1個以上之支持構件,於前述噴嘴移動方向是配置在前述一對之夾持構件之間,從下方支持前述曲面基材。 A holding tray is a holding tray for coating a curved substrate of a coating liquid by a slit nozzle, comprising: a pair of clamping members, and two of the curved substrate in a nozzle moving direction of the slit nozzle The end portion is held by sandwiching the curved surface substrate therebetween, and one or more supporting members are disposed between the pair of holding members in the nozzle moving direction, and support the curved base material from below. 如請求項1之保持托盤,其中前述一對之夾持構件及前述支持構件是在前述狹縫噴嘴之狹縫方向之前述曲面基材之兩端部設成一對。 The holding tray of claim 1, wherein the pair of holding members and the supporting member are provided in a pair at both end portions of the curved base material in a slit direction of the slit nozzle. 如請求項1之保持托盤,其中前述一對之夾持構件及前述支持構件是於前述狹縫噴嘴之狹縫方向延伸而遍及前述曲面基材之全長,或者,於前述狹縫噴嘴之狹縫方向具有預定間隔而設有複數個。 The holding tray of claim 1, wherein the pair of clamping members and the supporting member extend in a slit direction of the slit nozzle and extend over a entire length of the curved substrate, or a slit of the slit nozzle The direction has a predetermined interval and is provided in plural. 如請求項1至3之任一項之保持托盤,其中前述支持構件之支持部可於上下方向昇降。 The holding tray of any one of claims 1 to 3, wherein the support portion of the aforementioned support member is movable up and down. 如請求項1至4之任一項之保持托盤,其中前述一對之夾持構件之至少其中一者可沿著前述噴嘴移動方向而移動。 The holding tray of any one of claims 1 to 4, wherein at least one of the pair of clamping members is movable along the aforementioned nozzle moving direction. 如請求項1至5之任一項之保持托盤,其中前述支持構件具有於上下方向賦予勢能之賦予勢能構件。 The holding tray according to any one of claims 1 to 5, wherein the support member has a potential energy-enhancing member that imparts potential energy in an up-and-down direction. 如請求項1至6之任一項之保持托盤,其中前述支持構件具有:第1支持構件,與前述一對之夾持構件之其中一側之第1夾持構件沿著前述噴嘴移動方向而一體地移動;及第2支持構件,與前述一對之夾持構件之另一側之第2夾持構件沿著前述噴嘴移動方向而一體地移動。 The holding tray according to any one of claims 1 to 6, wherein the support member has a first supporting member, and a first holding member on one side of the pair of holding members is along the nozzle moving direction. The second supporting member and the second holding member on the other side of the pair of holding members are integrally moved along the nozzle moving direction.
TW105117411A 2016-03-24 2016-06-02 Curved substrate holding tray TWI653095B (en)

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PCT/JP2016/059466 WO2017163382A1 (en) 2016-03-24 2016-03-24 Holding tray for curved surface substrate
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