TW201728445A - Low-dielectric flame-resistant adhesive composition - Google Patents

Low-dielectric flame-resistant adhesive composition Download PDF

Info

Publication number
TW201728445A
TW201728445A TW105135197A TW105135197A TW201728445A TW 201728445 A TW201728445 A TW 201728445A TW 105135197 A TW105135197 A TW 105135197A TW 105135197 A TW105135197 A TW 105135197A TW 201728445 A TW201728445 A TW 201728445A
Authority
TW
Taiwan
Prior art keywords
laminate
resin
adhesive layer
substrate
layer
Prior art date
Application number
TW105135197A
Other languages
Chinese (zh)
Other versions
TWI688474B (en
Inventor
Ryo Sonoda
Takeshi Ito
Tadahiko Mikami
Original Assignee
Toyo Boseki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Boseki filed Critical Toyo Boseki
Publication of TW201728445A publication Critical patent/TW201728445A/en
Application granted granted Critical
Publication of TWI688474B publication Critical patent/TWI688474B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J123/00Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J125/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
    • C09J125/02Homopolymers or copolymers of hydrocarbons
    • C09J125/04Homopolymers or copolymers of styrene
    • C09J125/06Polystyrene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/204Di-electric
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/306Resistant to heat
    • B32B2307/3065Flame resistant or retardant, fire resistant or retardant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

Provided is a laminate that exhibits good adhesion properties with respect to not only conventional polyimide and polyester films but also to metal substrates and low polarity resin substrates, such as LCP, and that can attain high solder heat resistance and has excellent low-dielectric characteristics and flame resistance. This laminate (Z) is obtained by stacking a resin substrate and a metal substrate with an adhesive layer therebetween, the adhesive layer comprising a carboxyl-containing polyolefin resin (A). The laminate (Z) is characterized in that: (1) the adhesive layer has a specific permittivity ([epsilon]c) of at most 3.0 at the frequency of 1 MHz; (2) the adhesive layer has a dielectric tangent (tan[delta]) of at most 0.02 at the frequency of 1 MHz; (3) the peel strength of the resin substrate and the metal substrate is at least 0.5 N/mm; (4) the laminate (Z) has a moist solder heat resistance of at least 240 DEG C; and (5) a laminate (X) of the adhesive layer and the resin substrate indicates VTM-0 by UL-94 standard.

Description

低介電阻燃性接著劑組成物Low dielectric flame retardant adhesive composition

本發明關於一種疊層體,其包含顯現低介電常數、低介電正切、同時具有阻燃性之接著劑層。更詳細言之,係關於一種樹脂基材與金屬基材介由顯現低介電常數、低介電正切及阻燃性之接著劑層疊層而成的疊層體。特別是關於撓性印刷電路板(以下簡稱為FPC)用之疊層體、及含有該疊層體之表覆層膜、疊層板、附樹脂之銅箔及黏合片(bonding sheet)。The present invention relates to a laminate comprising an adhesive layer exhibiting low dielectric constant, low dielectric tangent, and flame retardancy. More specifically, the present invention relates to a laminate in which a resin substrate and a metal substrate are laminated via an adhesive which exhibits a low dielectric constant, a low dielectric tangent, and a flame retardant. In particular, a laminate for a flexible printed circuit board (hereinafter abbreviated as FPC), a surface coating film containing the laminate, a laminate, a copper foil with a resin, and a bonding sheet.

近年,伴隨印刷電路板中之傳輸信號的高速化,信號的高頻化正發展中。與此同時,對於FPC在高頻區域之低介電特性(低介電常數、低介電正切)的要求正日益增長。因應該等要求,作為FPC所使用之基材膜,有人提案以具有低介電特性之液晶聚合物(LCP)、對排聚苯乙烯(SPS)、聚苯硫醚(PPS)等基材膜替換以往的聚醯亞胺(PI)、聚對苯二甲酸乙二酯膜。 但,具有低介電特性之基材膜由於低極性的緣故,使用以往的環氧系接著劑或丙烯酸系接著劑時接著力弱,表覆層膜、疊層板等FPC用構件的製作困難(例如,專利文獻1、2)。又,環氧系接著劑或丙烯酸系接著劑的低介電特性並不優異,會損及FPC的介電特性。 進一步以上述目的使用之接著劑組成物大多為可燃性,需賦予阻燃性。阻燃劑使用鹵素系有機化合物的體系具有優異的阻燃性。但,該方法存在燃燒時會產生腐蝕性鹵素氣體的問題。因此,尋求不含鹵素成分的無鹵素阻燃劑。例如採用磷系阻燃劑的摻合。例如專利文獻3中認為可使用有機次膦酸鋁作為阻燃劑,並顯示了相同文獻所記載之表覆層膜中含有阻燃劑時的阻燃劑之含量範圍。 [先前技術文獻] [專利文獻]In recent years, with the increase in the speed of transmission signals in printed circuit boards, high frequency signals are being developed. At the same time, there is an increasing demand for low dielectric properties (low dielectric constant, low dielectric tangent) of the FPC in the high frequency region. As a substrate film used for FPC, a substrate film such as liquid crystal polymer (LCP), aligned polystyrene (SPS), or polyphenylene sulfide (PPS) having low dielectric properties has been proposed. It replaces the conventional polyimide (PI) and polyethylene terephthalate film. However, the base film having a low dielectric property has a low polarity, and it is difficult to produce a FPC member such as a cover film or a laminate when a conventional epoxy-based adhesive or an acrylic adhesive is used. (for example, Patent Documents 1, 2). Further, the epoxy-based adhesive or the acrylic-based adhesive is not excellent in low dielectric properties, and the dielectric properties of the FPC are impaired. Further, the adhesive composition used for the above purpose is mostly flammable, and it is required to impart flame retardancy. The flame retardant uses a system of a halogen-based organic compound to have excellent flame retardancy. However, this method has a problem that corrosive halogen gas is generated upon burning. Therefore, a halogen-free flame retardant which does not contain a halogen component is sought. For example, blending of a phosphorus-based flame retardant is employed. For example, in Patent Document 3, it is considered that an organic phosphinate as a flame retardant can be used, and the content range of the flame retardant when the flame retardant is contained in the surface coating film described in the same document is shown. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2012-25917號公報 [專利文獻2]WO2015/041085A1公報 [專利文獻3]日本特開2014-34668號公報[Patent Document 1] Japanese Laid-Open Patent Publication No. 2014-34668

[發明所欲解決之課題] 但,專利文獻1中雖有記述聚醯亞胺與壓延銅箔之接著性、焊料耐熱性、阻燃性,但並未提及低介電特性,難以獲得與LCP等具有低介電特性之基材膜的接著性。又,專利文獻2中雖有記述聚醯亞胺與銅箔之接著性、焊料耐熱性、絕緣可靠性、阻燃性,但並未提及介電特性,且亦未提及與LCP等具有低介電特性之基材膜的接著性。專利文獻3中雖有記載介電常數、阻燃性,但僅觸及銅箔與銅箔之接著性,並未提及與聚醯亞胺、LCP基材之接著性。又,亦未提及FPC用途所需之焊料耐熱性。[Problems to be Solved by the Invention] However, Patent Document 1 describes the adhesion between polyimide and rolled copper foil, solder heat resistance, and flame retardancy. However, low dielectric properties are not mentioned, and it is difficult to obtain Adhesion of a substrate film having low dielectric properties such as LCP. Further, Patent Document 2 describes the adhesion between polyimide and copper foil, solder heat resistance, insulation reliability, and flame retardancy. However, dielectric properties are not mentioned, and there is no mention of having an LCP or the like. Adhesion of a substrate film having low dielectric properties. Although the dielectric constant and the flame retardancy are described in Patent Document 3, only the adhesion between the copper foil and the copper foil is touched, and the adhesion to the polyimide and the LCP substrate is not mentioned. Also, there is no mention of the solder heat resistance required for FPC use.

本發明為了解決上述課題而進行深入研究的結果,發現具有特定物性之接著劑層,不僅是與以往的聚醯亞胺、聚對苯二甲酸乙二酯膜,與LCP等具有低介電特性之樹脂基材、銅箔等金屬基材的高接著性、高焊料耐熱性、及低介電特性優異,進一步具有基於UL-94之VTM-0的阻燃性,而完成了本發明。As a result of intensive studies to solve the above problems, the present inventors have found that a binder layer having a specific physical property has low dielectric properties not only with conventional polyimides, polyethylene terephthalate films, and LCPs. The metal substrate such as a resin substrate or a copper foil has high adhesion, high solder heat resistance, and low dielectric properties, and further has flame retardancy based on UL-94 VTM-0, and completed the present invention.

亦即,本發明旨在提供一種疊層體,該疊層體對於聚醯亞胺、LCP等各種樹脂基材與金屬基材兩者具有良好的接著性,且耐熱性、低介電特性、阻燃性亦優異。 [解決課題之手段]That is, the present invention has been made in an effort to provide a laminate having good adhesion to various resin substrates such as polyimide and LCP and a metal substrate, and having heat resistance and low dielectric properties. Excellent flame retardancy. [Means for solving the problem]

一種疊層體(Z),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)疊層體(Z)之加濕焊料耐熱性為240℃以上, (5)將金屬基材從疊層體(Z)去除後得到之疊層體(X)在UL-94法中為VTM-0。A laminate (Z) comprising a resin substrate and a metal substrate laminated via an adhesive comprising a carboxyl group-containing polyolefin resin (A); characterized by: (1) an adhesive layer at a frequency of 1 MHz The relative dielectric constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less, and (3) the peel strength between the resin substrate and the metal substrate is 0.5. N/mm or more, (4) The heat resistance of the wet solder of the laminate (Z) is 240 ° C or higher, and (5) the laminate (X) obtained by removing the metal substrate from the laminate (Z) is In the UL-94 method, it is VTM-0.

一種疊層體(X),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該樹脂基材的疊層體; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)疊層體(X)在UL-94法中為VTM-0。A laminate (X), which is a laminate of a resin substrate and a metal substrate, which is formed by laminating a layer of an adhesive including a carboxyl group-containing polyolefin resin (A). a laminate of the resin substrate; characterized in that: (1) the dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, and (2) dielectric tangent of the adhesive layer at a frequency of 1 MHz (tan δ) is 0.02 or less, and (3) when a metal substrate is laminated on the adhesive layer of the laminate (X), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm. As described above, (4) when a metal substrate is laminated on the adhesive layer of the laminate (X), the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) the laminate (X) is in the UL- In the 94 method, it is VTM-0.

一種疊層體(Y),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該金屬基材的疊層體; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)於疊層體(Y)之接著劑層面疊層樹脂基材以製作疊層體(Z),然後去除金屬基材後得到之疊層體(X)在UL-94法中為VTM-0。A laminate (Y), which is a laminate of a resin substrate and a metal substrate, which is formed by laminating a layer of an adhesive including a carboxyl group-containing polyolefin resin (A). a laminate of the metal substrate; characterized in that: (1) the dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, and (2) dielectric tangent of the adhesive layer at a frequency of 1 MHz (tan δ) is 0.02 or less, and (3) when a resin substrate is laminated on the adhesive layer of the laminate (Y), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm. (4) When the resin substrate is laminated on the adhesive layer of the laminate (Y), the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) subsequent to the laminate (Y) The laminate layer of the resin substrate is laminated to form a laminate (Z), and then the laminate (X) obtained by removing the metal substrate is VTM-0 in the UL-94 method.

一種接著劑層,係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)於接著劑層之其中一面疊層樹脂基材後得到之疊層體(X)在UL-94法中為VTM-0。An adhesive layer used as a laminate (Z) of a resin substrate and a metal substrate via a laminate layer comprising an adhesive layer of a carboxyl group-containing polyolefin resin (A); (1) The relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, and (2) the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less, and (3) When the resin substrate is laminated on one surface of the layer, and the metal substrate is laminated on the other surface, the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm or more, and (4) When the resin substrate is laminated on one surface of the agent layer and the metal substrate is laminated on the other surface, the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) the resin base is laminated on one side of the adhesive layer. The laminate (X) obtained after the material was VTM-0 in the UL-94 method.

一種接著片,含有前述疊層體(Z)、疊層體(X)、疊層體(Y)或接著劑層。一種印刷電路板,包含前述接著片作為構成要素。 [發明之效果]A back sheet comprising the laminate (Z), the laminate (X), the laminate (Y) or an adhesive layer. A printed circuit board comprising the above-described succeeding film as a constituent element. [Effects of the Invention]

關於本發明之樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z),(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)疊層體(Z)之加濕焊料耐熱性為240℃以上,(5)接著劑層與樹脂基材之疊層體(X)在UL-94法中為VTM-0。不僅是與以往的聚醯亞胺、聚酯膜,與LCP等低極性樹脂基材、金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性、阻燃性優異。The laminate (Z) in which the resin substrate and the metal substrate of the present invention are laminated via an adhesive including a carboxyl group-containing polyolefin resin (A), and (1) the adhesive layer at a relative frequency of 1 MHz. The dielectric constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less, and (3) the peel strength between the resin substrate and the metal substrate is 0.5 N/ (m) The heat resistance of the wet solder of the laminate (Z) is 240 ° C or higher, and (5) The laminate (X) of the adhesive layer and the resin substrate is VTM-0 in the UL-94 method. . Not only the conventional polyimide, polyester film, and low-polarity resin substrate such as LCP, but also a metal substrate, it has high adhesion, and it can obtain high solder heat resistance, and is excellent in low dielectric properties and flame retardancy.

以下,針對本發明之實施形態進行詳細說明。本案發明之樹脂基材及金屬基材介由包括含羧基之聚烯烴之接著劑層疊層而成的疊層體滿足下列(1)~(5)。Hereinafter, embodiments of the present invention will be described in detail. The laminate of the resin substrate and the metal substrate of the present invention comprising a layer of an adhesive comprising a carboxyl group-containing polyolefin satisfies the following (1) to (5).

<含羧基之聚烯烴樹脂(A)> 本發明所使用之含羧基之聚烯烴樹脂(A)(以下亦簡稱為(A)成分)並無限定,宜為將α,β-不飽和羧酸及其酸酐中之至少1種接枝於聚烯烴樹脂而得者較佳。聚烯烴樹脂係指例示為乙烯、丙烯、丁烯、丁二烯、異戊二烯等之烯烴單體的均聚物、或與其他單體的共聚物、及所獲得之聚合物的氫化物或鹵化物等以烴骨架為主體的聚合物。亦即,就含羧基之聚烯烴而言,宜為將α,β-不飽和羧酸及其酸酐中之至少1種接枝於聚乙烯、聚丙烯及丙烯-α-烯烴共聚物中之至少1種而得者較佳。<Carboxyl group-containing polyolefin resin (A)> The carboxyl group-containing polyolefin resin (A) (hereinafter also referred to simply as (A) component) used in the present invention is not limited, and is preferably an α,β-unsaturated carboxylic acid. It is preferred that at least one of the anhydrides and the acid anhydride thereof are grafted to the polyolefin resin. The polyolefin resin refers to a homopolymer of an olefin monomer exemplified as ethylene, propylene, butylene, butadiene, isoprene or the like, or a copolymer with other monomers, and a hydride of the obtained polymer. Or a polymer such as a halide which is mainly composed of a hydrocarbon skeleton. That is, in the case of the carboxyl group-containing polyolefin, it is preferred to graft at least one of the α,β-unsaturated carboxylic acid and its anhydride to at least one of the polyethylene, the polypropylene, and the propylene-α-olefin copolymer. One type is preferred.

丙烯-α-烯烴共聚物係以丙烯為主體並與α-烯烴共聚而得者。就α-烯烴而言,例如可使用乙烯、1-丁烯、1-庚烯、1-辛烯、4-甲基-1-戊烯、乙酸乙烯酯等之1種或多種。該等α-烯烴中,乙烯、1-丁烯為較佳。丙烯-α-烯烴共聚物之丙烯成分與α-烯烴成分的比率並無限定,丙烯成分宜為50莫耳%以上較佳,70莫耳%以上更佳。The propylene-α-olefin copolymer is mainly obtained by copolymerizing propylene with an α-olefin. As the α-olefin, for example, one or more of ethylene, 1-butene, 1-heptene, 1-octene, 4-methyl-1-pentene, and vinyl acetate can be used. Among these α-olefins, ethylene and 1-butene are preferred. The ratio of the propylene component to the α-olefin component of the propylene-α-olefin copolymer is not limited, and the propylene component is preferably 50 mol% or more, more preferably 70 mol% or more.

作為α,β-不飽和羧酸及其酸酐中之至少1種,例如可列舉馬來酸、衣康酸、檸康酸及該等之酸酐。該等中酸酐為較佳,馬來酸酐更佳。具體而言,可列舉馬來酸酐改性聚丙烯、馬來酸酐改性丙烯-乙烯共聚物、馬來酸酐改性丙烯-丁烯共聚物、馬來酸酐改性丙烯-乙烯-丁烯共聚物等,可使用該等酸改性聚烯烴之1種或2種以上組合使用。Examples of at least one of the α,β-unsaturated carboxylic acid and the acid anhydride thereof include maleic acid, itaconic acid, citraconic acid, and the like. These anhydrides are preferred, and maleic anhydride is preferred. Specific examples thereof include maleic anhydride-modified polypropylene, maleic anhydride-modified propylene-ethylene copolymer, maleic anhydride-modified propylene-butene copolymer, and maleic anhydride-modified propylene-ethylene-butene copolymer. One or a combination of two or more kinds of these acid-modified polyolefins can be used in combination.

含羧基之聚烯烴樹脂(A)的酸值,以耐熱性及與樹脂基材或金屬基材的接著性的觀點觀之,下限宜為100當量/106 g以上較佳,200當量/106 g以上更佳,250當量/106 g尤佳。未達前述值的話,會有與環氧樹脂(D)、碳二亞胺樹脂(C)的相容性低、無法顯現接著強度的情況。又,會有交聯密度低、欠缺耐熱性的情況。上限宜為1000當量/106 g以下較佳,700當量/106 g以下更佳,500當量/106 g以下尤佳。超過前述值的話,會有接著性降低的情況。又,會有溶液的黏度、穩定性降低、適用期(pot life)特性降低的情況。進一步製造效率亦降低故不佳。The acid value of the carboxyl group-containing polyolefin resin (A) is preferably 100 equivalents/10 6 g or more, and 200 equivalents or less, in view of heat resistance and adhesion to a resin substrate or a metal substrate. More preferably 6 g or more, and 250 equivalents/10 6 g is particularly preferred. When the value is not reached, the compatibility with the epoxy resin (D) or the carbodiimide resin (C) may be low, and the bonding strength may not be exhibited. Further, there is a case where the crosslinking density is low and heat resistance is lacking. The upper limit is preferably 1000 equivalents/10 6 g or less, more preferably 700 equivalents/10 6 g or less, and particularly preferably 500 equivalents/10 6 g or less. If the value exceeds the above value, there is a case where the adhesion is lowered. Further, there is a case where the viscosity and stability of the solution are lowered and the pot life characteristics are lowered. Further manufacturing efficiency is also reduced, which is not good.

含羧基之聚烯烴樹脂(A)之重量平均分子量(Mw)宜為10,000~180,000之範圍較佳。20,000~160,000之範圍更佳,30,000~150,000之範圍尤佳,40,000~140,000之範圍特佳,50,000~130,000之範圍最佳。未達前述值的話,會有凝聚力變弱、接著性差的情況。另一方面,超過前述值的話,會有流動性低、接著時的操作性產生問題的情況。The weight average molecular weight (Mw) of the carboxyl group-containing polyolefin resin (A) is preferably in the range of 10,000 to 180,000. The range of 20,000 to 160,000 is better, the range of 30,000 to 150,000 is particularly good, the range of 40,000 to 140,000 is particularly good, and the range of 50,000 to 130,000 is the best. If the above value is not reached, there is a case where the cohesive force is weak and the adhesion is poor. On the other hand, when the value is more than the above value, there is a case where the fluidity is low and the operability at the time is problematic.

含羧基之聚烯烴樹脂(A)之製造方法並無特別限定,例如可列舉自由基接枝反應(亦即,對於成為主鏈之聚合物生成自由基物種,以該自由基物種作為聚合起始點而使不飽和羧酸及酸酐進行接枝聚合反應)等。The method for producing the carboxyl group-containing polyolefin resin (A) is not particularly limited, and examples thereof include a radical graft reaction (that is, a radical species are generated for a polymer which becomes a main chain, and the radical species is used as a polymerization initiation). The unsaturated carboxylic acid and the acid anhydride are subjected to graft polymerization (such as graft polymerization).

自由基產生劑並無特別限定,宜使用有機過氧化物較佳。有機過氧化物並無特別限定,可列舉過氧化苯二甲酸二-第三丁酯、第三丁基過氧化氫、過氧化二異丙苯、過氧化苯甲醯、過氧化苯甲酸第三丁酯、過氧化-2-乙基己酸第三丁酯、過氧化新戊酸第三丁酯、過氧化甲乙酮、二-第三丁基過氧化物、過氧化月桂醯等過氧化物;偶氮雙異丁腈、偶氮雙異丙腈等偶氮腈類等。The radical generator is not particularly limited, and an organic peroxide is preferably used. The organic peroxide is not particularly limited, and examples thereof include di-tert-butyl peroxybenzeneate, t-butyl hydroperoxide, dicumyl peroxide, benzammonium peroxide, and benzoic acid peroxide. a butyl ester, a third butyl peroxy-2-ethylhexanoate, a third butyl peroxypivalate, a methyl ethyl ketone peroxide, a di-tert-butyl peroxide, a peroxide such as laurel; Azonitrile such as azobisisobutyronitrile or azobisisopropionitrile.

<接著劑層> 本發明中,接著劑層係指將接著劑組成物塗布於基材,並使其乾燥後的接著劑組成物之層。接著劑層之厚度並無特別限定,宜為5μm以上較佳,10μm以上更佳,15μm以上尤佳。又,宜為200μm以下較佳,100μm以下更佳,50μm以下尤佳。厚度過薄時,會難以獲得充分的接著性能,過厚時,可列舉由於乾燥不充分,殘留溶劑容易變多,印刷電路板製造時之壓製時產生隆起的問題。<Adhesive Layer> In the present invention, the adhesive layer refers to a layer of an adhesive composition obtained by applying an adhesive composition to a substrate and drying the composition. The thickness of the layer is not particularly limited, but is preferably 5 μm or more, more preferably 10 μm or more, and still more preferably 15 μm or more. Further, it is preferably 200 μm or less, more preferably 100 μm or less, and particularly preferably 50 μm or less. When the thickness is too small, it is difficult to obtain sufficient adhesion performance. When the thickness is too large, there is a problem that the residual solvent is likely to increase due to insufficient drying, and the embossing occurs during pressing at the time of production of the printed circuit board.

將接著劑組成物塗覆於基材上的方法並無特別限定,可列舉缺角輪塗布機、逆轉輥式塗布機等。或必要時亦可在係印刷電路板構成材料之壓延銅箔、或聚醯亞胺膜上,直接或利用轉印法設置接著劑層。乾燥條件並無特別限定,乾燥後之殘留溶劑率宜為1質量%以下較佳。超過1質量%的話,可列舉印刷電路板壓製時殘留溶劑起泡而產生隆起的問題。The method of applying the adhesive composition to the substrate is not particularly limited, and examples thereof include a chamfer coater and a reverse roll coater. Alternatively, the adhesive layer may be provided directly or by a transfer method on a rolled copper foil or a polyimide film which is a constituent material of the printed circuit board. The drying conditions are not particularly limited, and the residual solvent ratio after drying is preferably 1% by mass or less. When the amount is more than 1% by mass, there is a problem that the residual solvent is foamed at the time of pressing the printed circuit board to cause bulging.

<樹脂基材> 本發明中之樹脂基材,只要是可塗布本發明之接著劑組成物,並乾燥形成接著劑層者即可,並無特別限定,宜為膜狀樹脂等樹脂基材(以下亦稱為基材膜層)較佳。具體而言,可例示聚酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、液晶聚合物(LCP)、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂、及氟系樹脂等。作為LCP膜之市售品,例如可列舉KURARAY(股)公司製的Vecstar(註冊商標)。又,作為聚醯亞胺膜之市售品,例如可列舉Kaneka(股)公司製的Apical(註冊商標)。<Resin base material> The resin base material in the present invention is not particularly limited as long as it can be applied to the adhesive composition of the present invention and dried to form an adhesive layer, and is preferably a resin substrate such as a film-like resin ( Hereinafter, it is also referred to as a base film layer). Specifically, a polyester resin, a polyamide resin, a polyimide resin, a polyamidimide resin, a liquid crystal polymer (LCP), a polyphenylene sulfide, a para-polystyrene, a polyolefin system can be exemplified. Resin, fluorine resin, etc. As a commercial item of the LCP film, for example, Vecstar (registered trademark) manufactured by KURARAY Co., Ltd. can be cited. In addition, as a commercial item of a polyimine film, Apical (registered trademark) by Kaneka Co., Ltd. is mentioned, for example.

樹脂基材之厚度並無特別限定,宜為1μm以上較佳,3μm以上更佳,10μm以上尤佳。又,宜為50μm以下較佳,30μm以下更佳,20μm以下尤佳。厚度過薄時,會有電路難以獲得充分的電氣性能的情況,另一方面,厚度過厚時,會有電路製作時的加工效率等降低的情況。又,樹脂基材之相對介電常數(εc )宜為5.0以下較佳,4.0以下更佳,3.5以下尤佳。下限值並無特別限定,在工業上只要為0.1以上則無問題。The thickness of the resin substrate is not particularly limited, but is preferably 1 μm or more, more preferably 3 μm or more, and still more preferably 10 μm or more. Further, it is preferably 50 μm or less, more preferably 30 μm or less, and particularly preferably 20 μm or less. When the thickness is too small, it may be difficult to obtain sufficient electrical performance in the circuit. On the other hand, when the thickness is too thick, the processing efficiency at the time of circuit production may be lowered. Further, the relative dielectric constant (? c ) of the resin substrate is preferably 5.0 or less, more preferably 4.0 or less, and even more preferably 3.5 or less. The lower limit value is not particularly limited, and it is not problematic if it is industrially 0.1 or more.

<金屬基材> 就金屬基材而言,可使用能用於電路基板之任意以往公知的導電性材料。作為素材,可例示SUS、銅、鋁、鐵、鋼、鋅、鎳等各種金屬及各自的合金、鍍敷物、以鋅或鉻化合物等其他金屬進行處理的金屬等。金屬箔為較佳,銅箔更佳。金屬箔的厚度並無特別限定,宜為1μm以上較佳,3μm以上更佳,10μm以上尤佳。又,宜為50μm以下較佳,30μm以下更佳,20μm以下尤佳。厚度過薄時,會有電路難以獲得充分的電氣性能的情況,另一方面,厚度過厚時,會有電路製作時的加工能率等降低的情況。金屬箔通常係以捲軸狀的形態提供。製造本發明之印刷電路板時所使用之金屬箔的形態並無特別限定。使用帶狀形態的金屬箔時,其長度並無特別限定。又,其寬度亦無特別限定,宜為250~500cm左右較佳。<Metal substrate> As the metal substrate, any conventionally known conductive material that can be used for a circuit board can be used. Examples of the material include various metals such as SUS, copper, aluminum, iron, steel, zinc, and nickel, and alloys, plating materials, and metals treated with other metals such as zinc or chromium compounds. A metal foil is preferred, and a copper foil is preferred. The thickness of the metal foil is not particularly limited, but is preferably 1 μm or more, more preferably 3 μm or more, and still more preferably 10 μm or more. Further, it is preferably 50 μm or less, more preferably 30 μm or less, and particularly preferably 20 μm or less. When the thickness is too small, it may be difficult to obtain sufficient electrical performance in the circuit. On the other hand, when the thickness is too thick, the processing energy rate at the time of circuit production may be lowered. The metal foil is usually provided in the form of a reel. The form of the metal foil used in the production of the printed wiring board of the present invention is not particularly limited. When a metal foil in a strip form is used, the length is not particularly limited. Further, the width thereof is not particularly limited, and is preferably about 250 to 500 cm.

<疊層體> 本發明之疊層體(Z)係樹脂基材與金屬基材介由接著劑層疊層而成者(樹脂基材/接著劑層/金屬基材之3層疊層體),疊層體(X)係樹脂基材與接著劑層疊層而成者(樹脂基材/接著劑層),疊層體(Y)係金屬基材與接著劑層疊層而成者(金屬基材/接著劑層)。本發明中,有時將疊層體(X)、疊層體(Y)及疊層體(Z)合稱為疊層體。疊層體(X)可藉由將接著劑組成物依常規方法塗布於樹脂基材並乾燥而獲得。又,疊層體(Y)可藉由將接著劑組成物依常規方法塗布於金屬基材並乾燥而獲得。疊層體(Z)可藉由在疊層體(X)或疊層體(Y),分別疊層金屬基材或樹脂基材而獲得。亦可於疊層體(X)或疊層體(Y)之接著劑層的面上疊層脫模基材。又,在疊層體(Z)之樹脂基材或金屬基材上進一步疊層接著劑層(接著劑層/樹脂基材/接著劑層/金屬基材、樹脂基材/接著劑層/金屬基材/接著劑層、接著劑層/樹脂基材/接著劑層/金屬基材/接著劑層)亦無妨。<Laminate> The laminate (Z)-based resin substrate of the present invention and the metal substrate are laminated with an adhesive layer (a resin laminate/adhesive layer/three-layer laminate of a metal substrate). Laminate (X)-based resin substrate and adhesive layer laminated layer (resin base material/adhesive layer), laminate (Y)-based metal substrate and adhesive layer laminated layer (metal substrate) / adhesive layer). In the present invention, the laminate (X), the laminate (Y), and the laminate (Z) may be collectively referred to as a laminate. The laminate (X) can be obtained by applying an adhesive composition to a resin substrate by a conventional method and drying. Further, the laminate (Y) can be obtained by applying the adhesive composition to a metal substrate by a conventional method and drying. The laminate (Z) can be obtained by laminating a metal substrate or a resin substrate in a laminate (X) or a laminate (Y), respectively. A release substrate may be laminated on the surface of the laminate layer of the laminate (X) or the laminate (Y). Further, an adhesive layer (adhesive layer/resin substrate/adhesive layer/metal substrate, resin substrate/adhesive layer/metal) is further laminated on the resin substrate or the metal substrate of the laminate (Z). The substrate/adhesive layer, the adhesive layer/resin substrate/adhesive layer/metal substrate/adhesive layer may also be used.

本發明之疊層體更滿足下列要件(1)~(5)。The laminate of the present invention more satisfies the following requirements (1) to (5).

<要件(1)> 針對要件(1)進行說明。關於本案發明之疊層體(Z),接著劑層之於頻率1MHz的相對介電常數(εc )需為3.0以下。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於脫模基材,並在約130℃乾燥約3分鐘。然後在約140℃熱處理約4小時而使其硬化,將硬化後之接著劑組成物層(接著劑層)從脫模膜剝離。測定剝離後之該接著劑組成物層之於頻率1MHz的相對介電常數(εc )。相對介電常數(εc )為3.0以下,2.6以下較佳,2.3以下更佳。下限並無特別限定,實用上為2.0。又,於頻率1MHz~10GHz之全區域的相對介電常數(εc )宜為3.0以下較佳,2.6以下更佳,2.3以下尤佳。<Requirements (1)> Explain the requirements (1). In the laminate (Z) of the invention of the present invention, the relative dielectric constant (? c ) of the adhesive layer at a frequency of 1 MHz is required to be 3.0 or less. Specifically, the adhesive composition was applied to a release substrate so that the thickness after drying became 25 μm, and dried at about 130 ° C for about 3 minutes. Then, it is heat-treated at about 140 ° C for about 4 hours to be hardened, and the hardened adhesive composition layer (adhesive layer) is peeled off from the release film. The relative dielectric constant (? c ) of the adhesive composition layer after peeling at a frequency of 1 MHz was measured. The relative dielectric constant (? c ) is 3.0 or less, preferably 2.6 or less, and more preferably 2.3 or less. The lower limit is not particularly limited, and is practically 2.0. Further, the relative dielectric constant (? c ) of the entire region at a frequency of 1 MHz to 10 GHz is preferably 3.0 or less, more preferably 2.6 or less, and particularly preferably 2.3 or less.

疊層體(Z)中之接著劑層的相對介電常數(εc )可如下述般進行測定。亦即,可例示一種方法,係將疊層體(Z)之金屬基材用蝕刻液去除乾淨,得到接著劑層與樹脂基材之2層疊層體(X)。蝕刻液並無特別限定,可使用氯化鐵(III)水溶液、氯化銅(II)水溶液、硫酸過氧化氫水混合液、鹼蝕刻液、鎳蝕刻液等。然後,將疊層體(X)之樹脂基材剝離(去除)乾淨,於殘留的接著劑層之兩面,利用蒸鍍、濺射法等薄膜法、或塗布導電性糊劑等手法形成金屬層以作為電容器,測定靜電電容,並由厚度與面積算出相對介電常數(εc )。又,就另外的方法而言,可利用前述方法於疊層體(X)之樹脂基材面上形成金屬層以作為電容器,測定樹脂基材與接著劑層的組合靜電電容相對介電常數(εc )後,將金屬層與接著劑層從疊層體(X)剝離(去除)乾淨,同樣地製作電容器並測定靜電電容,測定殘留的樹脂基材的相對介電常數(εc )。由疊層體(X)所獲得之電容器的介電層視為樹脂基材與接著劑層之多層介電體,故由兩者的差可算出接著劑層的相對介電常數(εc )。The relative dielectric constant (? c ) of the adhesive layer in the laminate (Z) can be measured as follows. In other words, a method in which the metal substrate of the laminate (Z) is removed by an etching solution to obtain a two-layer laminate (X) of the adhesive layer and the resin substrate can be exemplified. The etching liquid is not particularly limited, and an iron chloride (III) aqueous solution, a copper chloride (II) aqueous solution, a sulfuric acid hydrogen peroxide aqueous mixed solution, an alkali etching solution, a nickel etching solution, or the like can be used. Then, the resin substrate of the laminate (X) is peeled off (removed), and a metal layer is formed on both surfaces of the remaining adhesive layer by a thin film method such as vapor deposition or sputtering or a method of applying a conductive paste. The capacitance was measured as a capacitor, and the relative dielectric constant (ε c ) was calculated from the thickness and the area. Further, in another method, a metal layer can be formed on the surface of the resin substrate of the laminate (X) by the above method as a capacitor, and the combined capacitance relative dielectric constant of the resin substrate and the adhesive layer can be measured ( After ε c ), the metal layer and the adhesive layer were peeled off (removed) from the laminate (X), and a capacitor was produced in the same manner, and the capacitance was measured, and the relative dielectric constant (ε c ) of the remaining resin substrate was measured. The dielectric layer of the capacitor obtained from the laminate (X) is regarded as a multilayer dielectric of a resin substrate and an adhesive layer, so that the relative dielectric constant (ε c ) of the adhesive layer can be calculated from the difference between the two. .

<要件(2)> 針對要件(2)進行說明。關於本案發明之疊層體(Z),接著劑層之於頻率1MHz的介電正切(tanδ)需為0.02以下。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於脫模基材,並在約130℃乾燥約3分鐘。然後在約140℃熱處理約4小時而使其硬化,將硬化後之接著劑組成物層(接著劑層)從脫模膜剝離。測定剝離後之該接著劑組成物之於頻率1MHz的介電正切(tanδ)。介電正切(tanδ)為0.02以下,0.01以下較佳,0.005以下更佳。下限並無特別限定,實用上為0.0001。又,於頻率1MHz~10GHz之全區域的介電正切(tanδ)宜為0.02以下較佳,0.01以下更佳,0.005以下尤佳。<Requirement (2)> Explain the requirements (2). In the laminate (Z) of the invention of the present invention, the dielectric tangent (tan δ) at a frequency of 1 MHz of the adhesive layer needs to be 0.02 or less. Specifically, the adhesive composition was applied to a release substrate so that the thickness after drying became 25 μm, and dried at about 130 ° C for about 3 minutes. Then, it is heat-treated at about 140 ° C for about 4 hours to be hardened, and the hardened adhesive composition layer (adhesive layer) is peeled off from the release film. The dielectric tangent (tan δ) of the adhesive composition at a frequency of 1 MHz was measured after peeling. The dielectric tangent (tan δ) is 0.02 or less, preferably 0.01 or less, more preferably 0.005 or less. The lower limit is not particularly limited, but is practically 0.0001. Further, the dielectric tangent (tan δ) in the entire region of the frequency of 1 MHz to 10 GHz is preferably 0.02 or less, more preferably 0.01 or less, and particularly preferably 0.005 or less.

針對疊層體(Z)中之接著劑層的介電正切(tanδ),亦可利用與前述介電常數同樣的操作進行測定。The dielectric tangent (tan δ) of the adhesive layer in the laminate (Z) can also be measured by the same operation as the dielectric constant described above.

<要件(3)> 針對要件(3)進行說明。關於本案發明之疊層體(Z),樹脂基材與金屬基材間的剝離強度需為0.5N/mm以上。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於樹脂基材,並在約130℃乾燥約3分鐘。然後於接著劑組成物層(接著劑層)的面上貼合金屬基材。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度需為0.5N/mm以上,0.8N/mm以上較佳,1.0N/mm以上更佳。此外,即使是利用前述方法以外之方法製得的疊層體(Z),只要90°剝離強度為0.5N/mm以上,則包括於本發明中。<Requirements (3)> Explain the requirements (3). In the laminate (Z) of the invention of the present invention, the peel strength between the resin substrate and the metal substrate needs to be 0.5 N/mm or more. Specifically, the adhesive composition was applied to a resin substrate so that the thickness after drying became 25 μm, and dried at about 130° C. for about 3 minutes. Then, a metal substrate is bonded to the surface of the adhesive composition layer (adhesive layer). The bonding is carried out in such a manner that the shiny side of the metal substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min at room temperature (about 25° C.), and the peel strength was measured. The 90° peel strength needs to be 0.5 N/mm or more, preferably 0.8 N/mm or more, more preferably 1.0 N/mm or more. Further, even the laminate (Z) obtained by a method other than the above method is included in the present invention as long as the 90° peel strength is 0.5 N/mm or more.

從疊層體(X),藉由在疊層體(X)之接著劑組成物層(接著劑層)的面上貼合金屬基材,可獲得本發明之疊層體(Z)。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度需為0.5N/mm以上,0.8N/mm以上較佳,1.0N/mm以上更佳。The laminate (Z) of the present invention can be obtained by laminating a metal substrate from the surface of the adhesive composition layer (adhesive layer) of the laminate (X) from the laminate (X). The bonding is carried out in such a manner that the shiny side of the metal substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min at room temperature (about 25° C.), and the peel strength was measured. The 90° peel strength needs to be 0.5 N/mm or more, preferably 0.8 N/mm or more, more preferably 1.0 N/mm or more.

從疊層體(Y),藉由在疊層體(Y)之接著劑組成物層(接著劑層)的面上貼合樹脂基材,可獲得本發明之疊層體(Z)。貼合係以使樹脂基材與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度需為0.5N/mm以上,0.8N/mm以上較佳,1.0N/mm以上更佳。The laminate (Z) of the present invention can be obtained by laminating a resin substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (Y) from the laminate (Y). The bonding is carried out in such a manner that the resin substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min at room temperature (about 25° C.), and the peel strength was measured. The 90° peel strength needs to be 0.5 N/mm or more, preferably 0.8 N/mm or more, more preferably 1.0 N/mm or more.

從接著劑層,藉由在接著劑層之其中一面貼合樹脂基材,在另一面貼合金屬基材之光澤面,可獲得本發明之疊層體(Z)。貼合係將脫模基材/接著劑層與樹脂基材,在約100℃於約3kgf/cm2 之加壓下進行約1m/min輥層壓而貼合後,將脫模基材剝離,以使金屬基材之光澤面與接著劑層接觸的方式,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度需為0.5N/mm以上,0.8N/mm以上較佳,1.0N/mm以上更佳。The laminate (Z) of the present invention can be obtained by bonding a resin substrate to one surface of the adhesive layer and bonding the shiny surface of the metal substrate to the other surface from the adhesive layer. In the bonding, the release substrate/adhesive layer and the resin substrate are subjected to roll lamination at a pressure of about 3 kgf/cm 2 at about 100 ° C for about 1 m/min, and after lamination, the release substrate is peeled off. The vacuum surface of the metal substrate is brought into contact with the adhesive layer in a vacuum at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min at room temperature (about 25° C.), and the peel strength was measured. The 90° peel strength needs to be 0.5 N/mm or more, preferably 0.8 N/mm or more, more preferably 1.0 N/mm or more.

<要件(4)> 針對要件(4)進行說明。關於本案發明之疊層體(Z),加濕焊料耐熱性需為240℃以上。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於樹脂基材,並在約130℃乾燥約3分鐘。然後於接著劑組成物層(接著劑層)的面上貼合金屬基材。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。加濕焊料耐熱性需為240℃以上,250℃以上較佳,260℃以上更佳。此外,即使是利用前述方法以外之方法製得的疊層體(Z),只要加濕焊料耐熱性為240℃以上,則包括於本發明中。<Requirement (4)> Explain the requirement (4). In the laminate (Z) of the invention of the present invention, the heat resistance of the humidifying solder needs to be 240 ° C or higher. Specifically, the adhesive composition was applied to a resin substrate so that the thickness after drying became 25 μm, and dried at about 130° C. for about 3 minutes. Then, a metal substrate is bonded to the surface of the adhesive composition layer (adhesive layer). The bonding is carried out in such a manner that the shiny side of the metal substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The laminate (Z) was treated under conditions of about 40 ° C and about 80 RH% for about 72 hours, and was allowed to flow in a molten solder bath at each temperature for 1 minute, and the temperature at which no change in appearance such as bulging was caused was measured. The heat resistance of the moisturizing solder needs to be 240 ° C or higher, preferably 250 ° C or higher, and more preferably 260 ° C or higher. Further, even the laminate (Z) obtained by a method other than the above method is included in the present invention as long as the heat resistance of the solder is 240 ° C or higher.

從疊層體(X),藉由在疊層體(X)之接著劑組成物層(接著劑層)的面上貼合金屬基材,可獲得本發明之疊層體(Z)。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。加濕焊料耐熱性需為240℃以上,250℃以上較佳,260℃以上更佳。The laminate (Z) of the present invention can be obtained by laminating a metal substrate from the surface of the adhesive composition layer (adhesive layer) of the laminate (X) from the laminate (X). The bonding is carried out in such a manner that the shiny side of the metal substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The laminate (Z) was treated under conditions of about 40 ° C and about 80 RH% for about 72 hours, and was allowed to flow in a molten solder bath at each temperature for 1 minute, and the temperature at which no change in appearance such as bulging was caused was measured. The heat resistance of the moisturizing solder needs to be 240 ° C or higher, preferably 250 ° C or higher, and more preferably 260 ° C or higher.

從疊層體(Y),藉由在疊層體(Y)之接著劑組成物層(接著劑層)的面上貼合樹脂基材,可獲得本發明之疊層體(Z)。貼合係以使樹脂基材與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。加濕焊料耐熱性需為240℃以上,250℃以上較佳,260℃以上更佳。The laminate (Z) of the present invention can be obtained by laminating a resin substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (Y) from the laminate (Y). The bonding is carried out in such a manner that the resin substrate is brought into contact with the adhesive composition layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 for about 30 seconds. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The laminate (Z) was treated under conditions of about 40 ° C and about 80 RH% for about 72 hours, and was allowed to flow in a molten solder bath at each temperature for 1 minute, and the temperature at which no change in appearance such as bulging was caused was measured. The heat resistance of the moisturizing solder needs to be 240 ° C or higher, preferably 250 ° C or higher, and more preferably 260 ° C or higher.

又,從接著劑層,藉由在接著劑層之其中一面貼合樹脂基材,在另一面貼合金屬基材之光澤面,可獲得本發明之疊層體(Z)。貼合係將接著劑層與樹脂基材貼合後,以使金屬基材之光澤面與接著劑層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。加濕焊料耐熱性需為240℃以上,250℃以上較佳,260℃以上更佳。Further, the laminate (Z) of the present invention can be obtained by bonding a resin substrate to one surface of the adhesive layer and bonding the shiny surface of the metal substrate to the other surface. After bonding, the adhesive layer is bonded to the resin substrate, and the shiny surface of the metal substrate is brought into contact with the adhesive layer, and vacuum-pressed at about 160 ° C under a pressure of about 40 kgf / cm 2 . Seconds and then. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened to prepare a three-layer laminate (Z) of a resin substrate / an adhesive layer / a metal substrate. The laminate (Z) was treated under conditions of about 40 ° C and about 80 RH% for about 72 hours, and was allowed to flow in a molten solder bath at each temperature for 1 minute, and the temperature at which no change in appearance such as bulging was caused was measured. The heat resistance of the moisturizing solder needs to be 240 ° C or higher, preferably 250 ° C or higher, and more preferably 260 ° C or higher.

<要件(5)> 針對要件(5)進行說明。關於本案發明之疊層體(Z),對構成疊層體(Z)之疊層體(X)利用基於UL-94之阻燃性評價試驗進行評價時,需為VTM-0。具體而言,以使乾燥後之厚度成為25μm的方式,將本發明之接著劑組成物塗布於樹脂基材,並在約130℃乾燥約3分鐘。然後在約140℃熱處理約4小時而使其硬化,從獲得之疊層體(X)切出試驗片(50±0.5mm×200±0.5mm),並測定厚度。將試驗片整圓成長度200mm、直徑約10mm之筒狀並固定於試驗台(stand)。將氣體燃燒器(gas burner)的火焰調整為高度約20mm,使試驗片的下端接觸火焰3sec後,測定燃燒時間。每1個樣品重複接觸火焰2次。各燃燒時間為10sec以下,且2次之合計燃燒時間為30sec以下者判斷為合格。以各N=5進行試驗,全部合格者相當於VTM-0。<Requirements (5)> Explain the requirements (5). In the laminate (Z) of the present invention, when the laminate (X) constituting the laminate (Z) is evaluated by the UL-94 flame retardancy evaluation test, it is required to be VTM-0. Specifically, the adhesive composition of the present invention was applied to a resin substrate so that the thickness after drying became 25 μm, and dried at about 130 ° C for about 3 minutes. Then, it was heat-treated at about 140 ° C for about 4 hours to be hardened, and a test piece (50 ± 0.5 mm × 200 ± 0.5 mm) was cut out from the obtained laminate (X), and the thickness was measured. The test piece was rounded into a cylindrical shape having a length of 200 mm and a diameter of about 10 mm and fixed to a stand. The flame of the gas burner was adjusted to a height of about 20 mm, and the lower end of the test piece was brought into contact with the flame for 3 sec, and the burning time was measured. The flame was repeatedly contacted twice per sample. When the burning time was 10 sec or less, and the total burning time of 2 times was 30 sec or less, it was judged that it was a pass. The test was carried out with each N=5, and all qualified persons corresponded to VTM-0.

利用蝕刻液將疊層體(Z)之金屬基材從疊層體(Z)去除乾淨,可獲得接著劑層與樹脂基材之2層的疊層體(X)。蝕刻液並無特別限定,可使用氯化鐵(III)水溶液、氯化銅(II)水溶液、硫酸過氧化氫水混合液、鹼蝕刻液、鎳蝕刻液等。The metal substrate of the laminate (Z) is removed from the laminate (Z) by an etching solution, and a laminate (X) of two layers of the adhesive layer and the resin substrate can be obtained. The etching liquid is not particularly limited, and an iron chloride (III) aqueous solution, a copper chloride (II) aqueous solution, a sulfuric acid hydrogen peroxide aqueous mixed solution, an alkali etching solution, a nickel etching solution, or the like can be used.

從疊層體(Y),藉由在疊層體(Y)之接著劑組成物層(接著劑層)的面上貼合樹脂基材而獲得疊層體(Z)後,將疊層體(Z)之金屬基材利用蝕刻液去除乾淨,可獲得疊層體(X)。The laminate (Z) is obtained by laminating a resin substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (Y) from the laminate (Y), and then the laminate is obtained. The metal substrate of (Z) is removed by an etching solution to obtain a laminate (X).

<接著劑組成物> 本發明所使用之接著劑組成物,係至少包括含羧基之聚烯烴樹脂(A)者。藉由包括含羧基之聚烯烴樹脂(A),介由由該接著劑組成物所構成之接著劑層而成的疊層體可顯現前述(1)~(5)之優異性能。<Adhesive Composition> The adhesive composition used in the present invention is at least a carboxyl group-containing polyolefin resin (A). The laminate of the carboxyl group-containing polyolefin resin (A) and the adhesive layer composed of the adhesive composition can exhibit the excellent properties of the above (1) to (5).

本發明之接著劑組成物,除前述(A)成分以外,宜包括含羧基之苯乙烯樹脂(B)(以下亦簡稱為(B)成分。)、碳二亞胺樹脂(C)(以下亦簡稱為(C)成分。)、環氧樹脂(D)(以下亦簡稱為(D)成分。)及/或阻燃性填料(E)(以下亦簡稱為(E)成分。)較佳。藉由包括前述(A)成分~(E)成分之5種樹脂,不僅是與以往的聚醯亞胺、聚酯膜,與習知技術所未預想之LCP膜等低極性樹脂基材、金屬基材亦具有高接著性,且焊料耐熱性、電特性(低介電特性)及阻燃性優異。In addition to the component (A), the adhesive composition of the present invention preferably includes a carboxyl group-containing styrene resin (B) (hereinafter also referred to simply as (B) component), and a carbodiimide resin (C) (hereinafter also The epoxy resin (D) (hereinafter also referred to simply as (D) component) and/or the flame-retardant filler (E) (hereinafter also referred to simply as (E) component) are preferably referred to as (C) component. The five kinds of resins including the components (A) to (E) described above are not only a low-polarity resin substrate or a metal such as an LCP film which is not expected from conventional polyimides and polyester films, and which are not contemplated by the prior art. The substrate also has high adhesion and is excellent in solder heat resistance, electrical properties (low dielectric properties), and flame retardancy.

<含羧基之苯乙烯樹脂(B)> 本發明可使用之含羧基之苯乙烯樹脂(B)並無限定,宜為將芳香族乙烯基化合物單獨、或芳香族乙烯基化合物與共軛二烯化合物之嵌段及/或無規結構為主體的共聚物、及其氫化物以不飽和羧酸進行改性而得者較佳。芳香族乙烯基化合物並無特別限定,例如可列舉苯乙烯、第三丁基苯乙烯、α-甲基苯乙烯、對甲基苯乙烯、二乙烯基苯、1,1-二苯基苯乙烯、N,N-二乙基-對胺基乙基苯乙烯、乙烯基甲苯、對第三丁基苯乙烯等。又,作為共軛二烯化合物,例如可列舉丁二烯、異戊二烯、1,3-戊二烯、2,3-二甲基-1,3-丁二烯等。該等芳香族乙烯基化合物與共軛二烯化合物之共聚物的具體例,可列舉苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS)、苯乙烯-乙烯-乙烯・丙烯-苯乙烯嵌段共聚物(SEEPS)等。<Carboxyl group-containing styrene resin (B)> The carboxyl group-containing styrene resin (B) which can be used in the invention is not limited, and it is preferred to use an aromatic vinyl compound alone or an aromatic vinyl compound and a conjugated diene. The copolymer of the compound and/or the random structure of the copolymer and the hydride thereof are preferably modified with an unsaturated carboxylic acid. The aromatic vinyl compound is not particularly limited, and examples thereof include styrene, t-butyl styrene, α-methyl styrene, p-methyl styrene, divinyl benzene, and 1,1-diphenyl styrene. , N,N-diethyl-p-aminoethylstyrene, vinyltoluene, p-tert-butylstyrene, and the like. Further, examples of the conjugated diene compound include butadiene, isoprene, 1,3-pentadiene, and 2,3-dimethyl-1,3-butadiene. Specific examples of the copolymer of the aromatic vinyl compound and the conjugated diene compound include styrene-ethylene-butylene-styrene block copolymer (SEBS) and styrene-ethylene-propylene-styrene embedded. Segment copolymer (SEPS), styrene-ethylene-ethylene, propylene-styrene block copolymer (SEEPS), and the like.

含羧基之苯乙烯樹脂(B)的改性,例如可藉由在苯乙烯樹脂聚合時,使不飽和羧酸共聚而進行。又,亦可藉由將苯乙烯樹脂與不飽和羧酸在有機過氧化物的存在下加熱、混練而進行。不飽和羧酸並無特別限定,可列舉丙烯酸、甲基丙烯酸、馬來酸、衣康酸、富馬酸、馬來酸酐、衣康酸酐、富馬酸酐等。The modification of the carboxyl group-containing styrene resin (B) can be carried out, for example, by copolymerizing an unsaturated carboxylic acid during polymerization of a styrene resin. Further, it can be carried out by heating and kneading a styrene resin and an unsaturated carboxylic acid in the presence of an organic peroxide. The unsaturated carboxylic acid is not particularly limited, and examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, maleic anhydride, itaconic anhydride, and fumaric anhydride.

含羧基之苯乙烯樹脂(B)的酸值,以耐熱性及與樹脂基材或金屬基材的接著性的觀點觀之,下限宜為10當量/106 g以上較佳,100當量/106 g以上更佳,150當量/106 g尤佳。未達前述值的話,與環氧樹脂(D)、碳二亞胺樹脂(C)的相容性低,會有無法顯現接著強度的情況。又,會有交聯密度低、欠缺耐熱性的情況。上限宜為1000當量/106 g以下較佳,700當量/106 g以下更佳,500當量/106 g以下尤佳。超過前述值的話,會有接著性、低介電特性降低的情況。The acid value of the carboxyl group-containing styrene resin (B) is preferably 10 equivalents/10 6 g or more, and 100 equivalents or less, in view of heat resistance and adhesion to a resin substrate or a metal substrate. More preferably 6 g or more, and 150 equivalents/10 6 g is particularly preferred. When the value is not reached, the compatibility with the epoxy resin (D) or the carbodiimide resin (C) is low, and the bonding strength may not be exhibited. Further, there is a case where the crosslinking density is low and heat resistance is lacking. The upper limit is preferably 1000 equivalents/10 6 g or less, more preferably 700 equivalents/10 6 g or less, and particularly preferably 500 equivalents/10 6 g or less. When the value exceeds the above value, there is a case where the adhesion and the low dielectric property are lowered.

本發明所使用之接著劑組成物中,含羧基之苯乙烯樹脂(B)的含量宜相對於含羧基之聚烯烴樹脂(A)5~95質量份為含羧基之苯乙烯樹脂(B)95~5質量份之範圍,亦即(A)成分/(B)成分=5~95/95~5(質量比)較佳。(A)成分/(B)成分=10~90/90~10(質量比)更佳,(A)成分/(B)成分=15~85/85~15(質量比)之範圍最佳。(A)成分量未達前述值的話,會有交聯密度降低、加濕焊料耐熱性降低的情況。(A)成分量超過前述值的話,會有對於基材的潤濕性降低、接著強度降低的情況。In the adhesive composition used in the present invention, the carboxyl group-containing styrene resin (B) is preferably contained in an amount of 5 to 95 parts by mass based on the carboxyl group-containing polyolefin resin (A) as a carboxyl group-containing styrene resin (B) 95. The range of ~5 parts by mass, that is, the component (A)/component (B) = 5 to 95/95 to 5 (mass ratio) is preferred. The component (A)/component (B) = 10 to 90/90 to 10 (mass ratio) is more preferable, and the range of (A) component / (B) component = 15 to 85 / 85 to 15 (mass ratio) is optimal. When the amount of the component (A) is less than the above value, the crosslinking density may be lowered, and the heat resistance of the moisturizing solder may be lowered. When the amount of the component (A) exceeds the above value, the wettability to the substrate may be lowered, and the strength may be lowered.

<碳二亞胺樹脂(C)> 碳二亞胺樹脂(C)只要是於分子內具有碳二亞胺基者即可,並無特別限定。於分子內具有2個以上之碳二亞胺基的聚碳二亞胺較佳。藉由使用碳二亞胺樹脂(C),含羧基之聚烯烴樹脂(A)或含羧基之苯乙烯樹脂(B)的羧基與碳二亞胺反應,可提高接著劑組成物與基材的相互作用,並可改善接著性。<Carbodiimide Resin (C)> The carbodiimide resin (C) is not particularly limited as long as it has a carbodiimide group in the molecule. A polycarbodiimide having two or more carbodiimide groups in the molecule is preferred. By using a carbodiimide resin (C), the carboxyl group-containing polyolefin resin (A) or the carboxyl group-containing styrene resin (B) carboxyl group is reacted with a carbodiimide to improve the composition of the adhesive and the substrate. Interaction and improved adhesion.

本發明所使用之接著劑組成物中,碳二亞胺樹脂(C)的含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,宜為0.1~30質量份之範圍較佳。1~25質量份之範圍更佳,2~20質量份之範圍最佳。未達前述值的話,會有不能顯現與基材的相互作用、接著性降低的問題。超過前述值的話,會有接著劑的適用期縮短、或低介電特性降低的問題。In the adhesive composition used in the present invention, the content of the carbodiimide resin (C) is preferably 100 parts by mass based on the total of the carboxyl group-containing polyolefin resin (A) and the carboxyl group-containing styrene resin (B). A range of 0.1 to 30 parts by mass is preferred. The range of 1 to 25 parts by mass is more preferably, and the range of 2 to 20 parts by mass is the best. If the value is not reached, there is a problem that the interaction with the substrate does not occur and the adhesion is lowered. When the value exceeds the above value, there is a problem that the pot life of the adhesive is shortened or the low dielectric property is lowered.

<環氧樹脂(D)> 環氧樹脂(D)只要是於分子中具有環氧丙基者即可,並無特別限定,宜為於分子中具有2個以上之環氧丙基者較佳。具體而言雖無特別限定,但可使用選自於由聯苯型環氧樹脂、萘型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆型環氧樹脂、脂環族環氧樹脂、二環戊二烯型環氧樹脂、四環氧丙基二胺基二苯基甲烷、三環氧丙基對胺基苯酚、四環氧丙基雙胺基甲基環己酮、N,N,N’,N’-四環氧丙基-間二甲苯二胺構成之群組中之至少1種。宜為雙酚A型環氧樹脂、酚醛清漆型環氧樹脂或二環戊二烯型環氧樹脂較佳。<Epoxy Resin (D)> The epoxy resin (D) is not particularly limited as long as it has an epoxy propyl group in the molecule, and it is preferred to have two or more epoxy propyl groups in the molecule. . Specifically, it is not particularly limited, but may be selected from biphenyl type epoxy resins, naphthalene type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, and novolak type epoxy resins. , alicyclic epoxy resin, dicyclopentadiene type epoxy resin, tetraepoxypropyl diaminodiphenylmethane, triepoxypropyl p-aminophenol, tetraepoxypropyl diamine At least one of the group consisting of cyclohexanone, N, N, N', N'-tetraepoxypropyl-m-xylylenediamine. It is preferably a bisphenol A type epoxy resin, a novolak type epoxy resin or a dicyclopentadiene type epoxy resin.

本發明所使用之接著劑組成物中,環氧樹脂(D)的含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,宜為1~30質量份之範圍較佳,2~15質量份之範圍更佳,3~10質量份之範圍最佳。未達前述範圍的話,會有不能獲得充分的硬化效果、接著性及耐熱性降低的情況。又,超過前述範圍的話,會有接著劑的適用期縮短、或低介電特性降低的問題。In the adhesive composition used in the present invention, the content of the epoxy resin (D) is preferably 1 part by mass based on 100 parts by mass of the total of the carboxyl group-containing polyolefin resin (A) and the carboxyl group-containing styrene resin (B). The range of 30 parts by mass is more preferable, the range of 2 to 15 parts by mass is more preferable, and the range of 3 to 10 parts by mass is most preferable. If it is less than the above range, sufficient hardening effect, adhesiveness, and heat resistance may not be obtained. Moreover, if it exceeds the above range, there is a problem that the pot life of the adhesive is shortened or the low dielectric properties are lowered.

<阻燃性填料(E)> 阻燃性填料(E)並無特別限定,宜為不溶於有機溶劑者較佳,可列舉無機系阻燃性填料與有機系阻燃性填料。作為無機系阻燃性填料,例如可列舉氫氧化鋁、氫氧化鎂、氫氧化鋯、氫氧化鈣、氫氧化鋇等金屬氫氧化物;鹼性碳酸鎂、碳酸鋅、碳酸鎂-鈣、碳酸鈣、碳酸鋇等金屬碳酸化合物;氧化鎂、氧化鉬、氧化鋯、氧化錫、氧化錫之水合物、氧化銻等金屬氧化物;硼酸鋅、偏硼酸鋅、偏硼酸鋇等金屬硼酸化合物;白雲石、菱水鎂鋁石、硼砂等無機金屬化合物;紅磷等無機磷化合物等。作為有機系阻燃性填料,例如可列舉磷酸三聚氰胺、聚磷酸三聚氰胺、磷酸胍、聚磷酸胍、磷酸銨、聚磷酸銨、磷酸醯胺銨、聚磷酸醯胺銨、磷酸胺甲酸酯、聚磷酸胺甲酸酯、參(二乙基次膦酸)鋁、參(甲基乙基次膦酸)鋁、參(二苯基次膦酸)鋁、雙(二乙基次膦酸)鋅、雙(甲基乙基次膦酸)鋅、雙(二苯基次膦酸)鋅、雙(二乙基次膦酸)氧鈦、肆(二乙基次膦酸)鈦、雙(甲基乙基次膦酸)氧鈦、肆(甲基乙基次膦酸)鈦、雙(二苯基次膦酸)氧鈦、肆(二苯基次膦酸)鈦等磷系阻燃劑;三聚氰胺、蜜白胺(melam)、三聚氰胺氰尿酸酯等三??系化合物;氰尿酸化合物、異氰尿酸化合物、三唑系化合物、四唑化合物、二偶氮化合物、尿素等氮系阻燃劑;聚矽氧化合物、矽烷化合物等矽系阻燃劑等。就阻燃性填料而言,金屬氫氧化物、磷化合物為較佳,其中磷化合物更佳,例如可使用次膦酸鋁等公知的磷系阻燃性填料。此外,磷系阻燃劑有不溶於有機溶劑的類型(磷系阻燃性填料)與可溶於有機溶劑的類型(磷系阻燃性非填料),本發明中宜為不溶於有機溶劑的類型(磷系阻燃性填料)較佳。上述阻燃性填料可單獨使用,亦可將2種以上倂用。<Flame-retardant filler (E)> The flame-retardant filler (E) is not particularly limited, and is preferably one which is insoluble in an organic solvent, and examples thereof include an inorganic flame-retardant filler and an organic flame-retardant filler. Examples of the inorganic flame-retardant filler include metal hydroxides such as aluminum hydroxide, magnesium hydroxide, zirconium hydroxide, calcium hydroxide, and barium hydroxide; and basic magnesium carbonate, zinc carbonate, magnesium carbonate-calcium, and carbonic acid. a metal carbonate compound such as calcium or barium carbonate; a metal oxide such as magnesium oxide, molybdenum oxide, zirconium oxide, tin oxide, tin oxide hydrate or cerium oxide; a metal boric acid compound such as zinc borate, zinc metaborate or barium metaborate; Inorganic metal compounds such as stone, magnesite, borax; inorganic phosphorus compounds such as red phosphorus. Examples of the organic flame-retardant filler include melamine phosphate, melamine polyphosphate, strontium phosphate, strontium polyphosphate, ammonium phosphate, ammonium polyphosphate, ammonium amide ammonium phosphate, ammonium polyphosphate ammonium phosphate, urethane phosphate, and polyphosphate. Ammonium phosphate, ginseng (diethylphosphinic acid) aluminum, ginseng (methylethylphosphinic acid) aluminum, ginseng (diphenylphosphinic acid) aluminum, bis(diethylphosphinic acid) zinc , bis(methylethylphosphinic acid) zinc, bis(diphenylphosphinic acid) zinc, bis(diethylphosphinic)oxytitanium, bismuth (diethylphosphinic acid) titanium, double (a) Phosphorus-based flame retardants such as oxytitanium oxyphosphonate, titanium hydride (methylethylphosphinic acid), titanium bis(diphenylphosphinic acid), titanium bismuth (diphenylphosphinic acid) ; melamine, melam, melamine cyanurate and other three compounds; cyanuric acid compounds, isocyanuric acid compounds, triazole compounds, tetrazole compounds, diazo compounds, urea and other nitrogen resistance A flammable agent; an antimony-based flame retardant such as a polyoxymethane compound or a decane compound. In the case of the flame-retardant filler, a metal hydroxide or a phosphorus compound is preferable, and among them, a phosphorus compound is more preferable, and for example, a known phosphorus-based flame retardant filler such as aluminum phosphinate can be used. Further, the phosphorus-based flame retardant has a type insoluble in an organic solvent (phosphorus-based flame-retardant filler) and a type which is soluble in an organic solvent (phosphorus-based flame-retardant non-filler), and is preferably insoluble in an organic solvent in the present invention. A type (phosphorus-based flame retardant filler) is preferred. The flame-retardant filler may be used singly or in combination of two or more.

本發明所使用之接著劑組成物中,阻燃性填料之含量相對於(A)~(D)成分之合計100質量份宜以20~100質量份之範圍含有較佳,30~90質量份之範圍更佳,40~90質量份之範圍尤佳。未達前述範圍的話,會有難以獲得阻燃性的情況。超過前述範圍的話,會有接著性、耐熱性、電特性等惡化的情況。In the adhesive composition of the present invention, the content of the flame-retardant filler is preferably in the range of 20 to 100 parts by mass, and preferably 30 to 90 parts by mass based on 100 parts by mass of the total of the components (A) to (D). The range is better, and the range of 40 to 90 parts by mass is particularly preferable. If the above range is not reached, it may be difficult to obtain flame retardancy. When it exceeds the above range, the adhesion, heat resistance, electrical properties, and the like may be deteriorated.

本發明所使用之接著劑組成物可進一步含有有機溶劑。就本發明所使用之有機溶劑而言,只要是可使含羧基之聚烯烴樹脂(A)、含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、及環氧樹脂(D)溶解者即可,並無特別限定。具體而言,例如可使用苯、甲苯、二甲苯等芳香族烴;己烷、庚烷、辛烷、癸烷等脂肪族系烴;環己烷、環己烯、甲基環己烷、乙基環己烷等脂環族烴;三氯乙烯、二氯乙烯、氯苯、氯仿等鹵化烴;甲醇、乙醇、異丙醇、丁醇、戊醇、己醇、丙二醇、苯酚等醇系溶劑;丙酮、甲基異丁酮、甲乙酮、戊酮、己酮、環己酮、異佛酮、苯乙酮等酮系溶劑;甲基賽珞蘇、乙基賽珞蘇等賽珞蘇類;乙酸甲酯、乙酸乙酯、乙酸丁酯、丙酸甲酯、甲酸丁酯等酯系溶劑;乙二醇單正丁醚、乙二醇單異丁醚、乙二醇單第三丁醚、二乙二醇單正丁醚、二乙二醇單異丁醚、三乙二醇單正丁醚、四乙二醇單正丁醚等二醇醚系溶劑等,可使用該等中之1種或2種以上倂用。The adhesive composition used in the present invention may further contain an organic solvent. The organic solvent used in the present invention is a carboxyl group-containing polyolefin resin (A), a carboxyl group-containing styrene resin (B), a carbodiimide resin (C), and an epoxy resin (D). The solvent is not particularly limited. Specifically, for example, an aromatic hydrocarbon such as benzene, toluene or xylene; an aliphatic hydrocarbon such as hexane, heptane, octane or decane; cyclohexane, cyclohexene, methylcyclohexane or B; An alicyclic hydrocarbon such as cyclohexane; a halogenated hydrocarbon such as trichloroethylene, dichloroethylene, chlorobenzene or chloroform; an alcohol solvent such as methanol, ethanol, isopropanol, butanol, pentanol, hexanol, propylene glycol or phenol. a ketone solvent such as acetone, methyl isobutyl ketone, methyl ethyl ketone, pentanone, ketone, cyclohexanone, isophorone or acetophenone; acesulfame, ethyl acesulfame, etc.; An ester solvent such as methyl acetate, ethyl acetate, butyl acetate, methyl propionate or butyl formate; ethylene glycol mono-n-butyl ether, ethylene glycol monoisobutyl ether, ethylene glycol mono-tert-butyl ether, A glycol ether solvent such as diethylene glycol mono-n-butyl ether, diethylene glycol mono-isobutyl ether, triethylene glycol mono-n-butyl ether or tetraethylene glycol mono-n-butyl ether can be used. Species or more than two types.

就有機溶劑而言,相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,宜為100~1000質量份之範圍較佳,200~900質量份之範圍更佳,300~800質量份之範圍最佳。未達前述範圍的話,會有液體性及適用期特性降低的情況。又,超過前述範圍的話,會有在製造成本、輸送成本的方面變得不利的問題。The organic solvent is preferably in the range of 100 to 1000 parts by mass, and preferably 200 to 900 parts by mass, based on 100 parts by mass of the total of the carboxyl group-containing polyolefin resin (A) and the carboxyl group-containing styrene resin (B). The range is better, and the range of 300 to 800 parts by mass is the best. If it does not reach the above range, liquidity and pot life characteristics may be lowered. Moreover, if it exceeds the above range, there is a problem that it is disadvantageous in terms of manufacturing cost and transportation cost.

又,本發明所使用之接著劑組成物中,必要時亦可進一步含有其他成分。該等成分的具體例,可列舉黏接性賦予劑、與(E)成分不同之填料、矽烷偶聯劑。Further, the adhesive composition used in the present invention may further contain other components as necessary. Specific examples of the components include a tackifier, a filler different from the component (E), and a decane coupling agent.

<黏接性賦予劑> 本發明所使用之接著劑組成物中,必要時亦可摻合黏接性賦予劑。黏接性賦予劑,可列舉聚萜烯樹脂、松香系樹脂、脂肪族系石油樹脂、脂環族系石油樹脂、共聚系石油樹脂、苯乙烯樹脂及氫化石油樹脂等,係為了提高接著強度而使用。該等可單獨使用,亦可將2種以上任意組合使用。<Adhesiveness-imparting agent> The adhesive composition used in the present invention may be blended with an adhesiveness-imparting agent if necessary. Examples of the adhesiveness-imparting agent include a polyterpene resin, a rosin-based resin, an aliphatic petroleum resin, an alicyclic petroleum resin, a copolymerized petroleum resin, a styrene resin, and a hydrogenated petroleum resin, etc., in order to improve the bonding strength. use. These may be used alone or in combination of two or more.

<與(E)成分不同之填料> 本發明所使用之接著劑組成物中,必要時亦可摻合二氧化矽等與前述(E)成分不同之填料。藉由摻合二氧化矽,耐熱性之特性得到改善,故非常理想。就二氧化矽而言,一般已知有疏水性二氧化矽與親水性二氧化矽,此處為了賦予耐吸濕性,宜為以二甲基二氯矽烷、或六甲基二矽氮烷、辛基矽烷等進行處理之疏水性二氧化矽。二氧化矽的摻合量相對於(A)~(D)成分之合計100質量份宜為0.05~30質量份之摻合量較佳。未達0.05質量份的話,會有無法發揮使耐熱性提高的效果的情況。另一方面,超過30質量份的話,會有發生二氧化矽的分散不良、溶液黏度變得過高而作業性產生不便、或接著性降低的情況。<Fillers different from the component (E)> The binder composition used in the present invention may be blended with a filler different from the component (E), such as ceria, if necessary. It is highly desirable to improve the heat resistance by blending cerium oxide. As the cerium oxide, hydrophobic cerium oxide and hydrophilic cerium oxide are generally known, and in order to impart moisture absorption resistance, it is preferred to use dimethyldichloromethane or hexamethyldioxane. Hydrophobic cerium oxide treated with octyl decane or the like. The blending amount of the cerium oxide is preferably 0.05 to 30 parts by mass based on 100 parts by mass of the total of the components (A) to (D). When it is less than 0.05 part by mass, the effect of improving heat resistance may not be exhibited. On the other hand, when the amount is more than 30 parts by mass, the dispersion of cerium oxide may occur, the viscosity of the solution may become too high, workability may be inconvenient, or the adhesion may be lowered.

<矽烷偶聯劑> 本發明所使用之接著劑組成物中,必要時亦可摻合矽烷偶聯劑。藉由摻合矽烷偶聯劑,對於金屬的接著性或耐熱性之特性得到改善,故非常理想。矽烷偶聯劑並無特別限定,可列舉具有不飽和基者、具有環氧丙基者、具有胺基者等。該等中以耐熱性的觀點觀之,γ-環氧丙氧基丙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三乙氧基矽烷等具有環氧丙基的矽烷偶聯劑更佳。矽烷偶聯劑的摻合量相對於(A)~(D)成分之合計100質量份宜為0.5~20質量份之摻合量較佳。未達0.5質量份的話,會有耐熱性變得不良的情況。另一方面,超過20質量份的話,會有耐熱性不良或接著性降低的情況。<Hydrane coupling agent> In the adhesive composition used in the present invention, a decane coupling agent may be blended as necessary. It is highly desirable to improve the properties of the adhesion or heat resistance of the metal by blending the decane coupling agent. The decane coupling agent is not particularly limited, and examples thereof include those having an unsaturated group, those having an epoxy group, and those having an amine group. Among these, from the viewpoint of heat resistance, γ-glycidoxypropyltrimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, β-(3,4) A decane coupling agent having a glycidyl group such as epoxycyclohexyl)ethyltriethoxydecane is more preferable. The blending amount of the decane coupling agent is preferably from 0.5 to 20 parts by mass based on 100 parts by mass of the total of the components (A) to (D). When it is less than 0.5 part by mass, heat resistance may become unfavorable. On the other hand, when it exceeds 20 parts by mass, the heat resistance may be poor or the adhesion may be lowered.

<接著片> 本發明中,接著片係前述疊層體(Z)與脫模基材介由接著劑組成物疊層而成者、或於疊層體(X)或疊層體(Y)之接著劑層面疊層脫模基材而成者、或於接著劑層之至少其中一面疊層脫模基材而成者。具體的構成態樣可列舉脫模基材/接著劑層、脫模基材/接著劑層/脫模基材、樹脂基材/接著劑層/脫模基材、金屬基材/接著劑層/脫模基材、疊層體/接著劑層/脫模基材、或脫模基材/接著劑層/疊層體/接著劑層/脫模基材。藉由疊層脫模基材,可發揮作為基材之保護層的功能。又,藉由使用脫模基材,可將脫模基材從接著片脫模,而將接著劑層轉印至另外的基材。<Continuous sheet> In the present invention, the laminate is formed by laminating the laminate (Z) and the release substrate via the adhesive composition, or in the laminate (X) or the laminate (Y). The release layer is formed by laminating a release substrate or laminating a release substrate on at least one of the adhesive layers. Specific examples of the composition include a release substrate/adhesive layer, a release substrate/adhesive layer/release substrate, a resin substrate/adhesive layer/release substrate, and a metal substrate/adhesive layer. / release base material, laminate / adhesive layer / release substrate, or release substrate / adhesive layer / laminate / adhesive layer / release substrate. By laminating the release substrate, the function as a protective layer of the substrate can be exhibited. Further, by using a release substrate, the release substrate can be released from the release sheet, and the adhesive layer can be transferred to another substrate.

藉由將本發明所使用之接著劑組成物依常規方法塗布於各種疊層體並乾燥,可獲得本發明之接著片。又,乾燥後將脫模基材貼附於接著劑層的話,可不造成朝基材背面的轉移而進行捲繞,作業性優異,同時接著劑層受到保護,故保存性優異,使用亦容易。又,塗布於脫模基材並乾燥後,視需要貼附另外的脫模基材的話,亦可將接著劑層其本身轉印至其他基材。The adhesive sheet of the present invention can be obtained by applying the adhesive composition used in the present invention to various laminates by a conventional method and drying. In addition, when the release substrate is attached to the adhesive layer after drying, the film can be wound without causing migration to the back surface of the substrate, and the workability is excellent, and the adhesive layer is protected, so that the storage property is excellent and the use is easy. Further, after application to the release substrate and drying, if another release substrate is attached as needed, the adhesive layer itself may be transferred to another substrate.

<脫模基材> 脫模基材並無特別限定,例如可列舉於優質紙、牛皮紙、捲紙、玻璃紙等紙的兩面設置黏土、聚乙烯、聚丙烯等填平劑的塗布層,進一步在其各塗布層之上塗布聚矽氧系、氟系、醇酸系脫模劑而成者。又,亦可列舉於聚乙烯、聚丙烯、乙烯-α-烯烴共聚物、丙烯-α-烯烴共聚物等各種烯烴膜單獨、及聚對苯二甲酸乙二酯等膜上塗布上述脫模劑而成者。由於脫模基材與接著劑層間的脫模力、聚矽氧會對電特性造成不良影響等理由,宜為於優質紙之兩面進行聚丙烯填平處理並於其上使用醇酸系脫模劑者、或於聚對苯二甲酸乙二酯上使用醇酸系脫模劑者較佳。<Release base material> The release base material is not particularly limited, and examples thereof include a coating layer of a filler such as clay, polyethylene, or polypropylene on both sides of paper such as high-quality paper, kraft paper, rolled paper, or cellophane, and further A polyfluorene-based, fluorine-based or alkyd-based release agent is applied to each of the coating layers. Further, the above-mentioned release agent may be applied to various olefin films such as polyethylene, polypropylene, ethylene-α-olefin copolymer, propylene-α-olefin copolymer, and the like, and a film such as polyethylene terephthalate. Founder. Due to the release force between the release substrate and the adhesive layer, and the adverse effect of the polyoxygen on the electrical properties, it is preferable to perform polypropylene filling treatment on both sides of the high-quality paper and to use the alkyd-based release agent. It is preferred to use an alkyd-based release agent on the agent or on polyethylene terephthalate.

<印刷電路板> 本發明中之「印刷電路板」,係包含由形成導體電路之金屬箔與樹脂基材所形成的疊層體作為構成要素者。印刷電路板,例如可使用覆金屬疊層體並利用減去(subtractive)法等以往公知的方法製造。係必要時將由金屬箔形成的導體電路部分性或全面性地使用表覆膜、網版印刷印墨等被覆之所謂撓性電路板(FPC)、扁平電纜、捲帶式自動接合(TAB)用電路板等的總稱。<Printed Circuit Board> The "printed circuit board" in the present invention includes a laminate formed of a metal foil forming a conductor circuit and a resin substrate as a constituent element. The printed circuit board can be produced, for example, by a conventionally known method such as a subtractive method using a metal-clad laminate. A so-called flexible circuit board (FPC), a flat cable, and a tape-type automatic bonding (TAB) which are partially or comprehensively coated with a surface film or a screen printing ink, if necessary, partially or comprehensively. A general term for boards and the like.

本發明之印刷電路板,可為能被採用作為印刷電路板之任意的疊層構成。例如可為由基材膜層、金屬箔層、接著劑層及表覆膜層之4層所構成的印刷電路板。又,例如可為由基材膜層、接著劑層、金屬箔層、接著劑層及表覆膜層之5層所構成的印刷電路板。The printed circuit board of the present invention can be constructed as any laminate that can be used as a printed circuit board. For example, it may be a printed circuit board composed of four layers of a base film layer, a metal foil layer, an adhesive layer, and a surface coating layer. Further, for example, it may be a printed circuit board comprising five layers of a base film layer, an adhesive layer, a metal foil layer, an adhesive layer, and a surface coating layer.

進一步,必要時亦可為將2個或3個以上之上述印刷電路板疊層而得的構成。Further, if necessary, a configuration may be adopted in which two or more of the above printed circuit boards are laminated.

本發明所使用之接著劑組成物適合使用於印刷電路板之各接著劑層。特別是將本發明所使用之接著劑組成物作為接著劑使用的話,不僅是與構成印刷電路板之以往的聚醯亞胺、聚酯膜、銅箔,與LCP等低極性的樹脂基材亦具有高接著性,可獲得耐焊料回焊性,且接著劑層本身低介電特性優異。因此,適合作為表覆層膜、疊層板、附樹脂之銅箔及黏合片所使用之接著劑組成物。The adhesive composition used in the present invention is suitable for use in each of the adhesive layers of a printed circuit board. In particular, when the adhesive composition used in the present invention is used as an adhesive, it is not only a conventional resin substrate such as a polyimine, a polyester film, a copper foil or an LCP which constitutes a printed circuit board. With high adhesion, solder reflow resistance is obtained, and the adhesive layer itself is excellent in low dielectric properties. Therefore, it is suitable as a binder composition used for a cover film, a laminated board, a copper foil with a resin, and an adhesive sheet.

本發明之印刷電路板中,就基材膜而言,可使用自以往既已作為印刷電路板之基材而使用之任意的樹脂膜。作為基材膜之樹脂,可例示聚酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、液晶聚合物、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂、及氟系樹脂等。特別是即使對於液晶聚合物、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂等低極性基材,仍具有優異的接著性。In the printed circuit board of the present invention, any resin film which has been conventionally used as a substrate of a printed circuit board can be used as the base film. The resin of the base film may, for example, be a polyester resin, a polyamide resin, a polyimide resin, a polyamide amide resin, a liquid crystal polymer, a polyphenylene sulfide, a para-polystyrene, or a polyolefin. Resin, fluorine resin, etc. In particular, it has excellent adhesion even to low-polarity substrates such as liquid crystal polymers, polyphenylene sulfide, para-polystyrene, and polyolefin-based resins.

<表覆膜> 就表覆膜而言,可使用以往公知的任意絕緣膜作為印刷電路板用之絕緣膜。例如可使用由聚醯亞胺、聚酯、聚苯硫醚、聚醚碸、聚醚醚酮、芳香族聚醯胺、聚碳酸酯、聚芳酯、聚醯胺醯亞胺、液晶聚合物、對排聚苯乙烯、聚烯烴系樹脂等各種聚合物所製成的膜。聚醯亞胺膜或液晶聚合物膜為更佳。<Table Film> As the surface film, any conventionally known insulating film can be used as the insulating film for a printed circuit board. For example, polyimine, polyester, polyphenylene sulfide, polyether oxime, polyetheretherketone, aromatic polyamine, polycarbonate, polyarylate, polyamidimide, liquid crystal polymer can be used. A film made of various polymers such as polystyrene and polyolefin resin. A polyimide film or a liquid crystal polymer film is more preferable.

本發明之印刷電路板,除使用上述各層之材料以外,可使用以往公知的任意製程進行製造。The printed circuit board of the present invention can be produced by any conventionally known process except for using the materials of the above layers.

較佳之實施態様係製造於表覆膜層疊層接著劑層而成的半成品(以下稱為「表覆膜側半成品」)。另一方面,係製造於基材膜層疊層金屬箔層並形成所期望之電路圖案的半成品(以下稱為「基材膜側2層半成品」)、或於基材膜層疊層接著劑層且於其上疊層金屬箔層並形成所期望之電路圖案的半成品(以下稱為「基材膜側3層半成品」)(以下將基材膜側2層半成品與基材膜側3層半成品合稱為「基材膜側半成品」)。將以此種方式獲得之表覆膜側半成品與基材膜側半成品貼合,可獲得4層或5層之印刷電路板。In a preferred embodiment, the product is a semi-finished product (hereinafter referred to as "surface film side semi-finished product") which is produced by laminating a laminate layer. On the other hand, it is a semi-finished product (hereinafter referred to as "substrate film side two-layer semi-finished product") which is formed on a base film laminated metal foil layer to form a desired circuit pattern, or a base film laminated layer of an adhesive layer. A semi-finished product in which a metal foil layer is laminated thereon to form a desired circuit pattern (hereinafter referred to as "substrate film side three-layer semi-finished product") (hereinafter, the base film side two-layer semi-finished product and the base film side three-layer semi-finished product are combined It is called "substrate film side semi-finished product"). The film-side semi-finished product obtained in this manner is bonded to the base film-side semi-finished product to obtain a 4-layer or 5-layer printed circuit board.

基材膜側半成品,例如可藉由包括以下步驟之製造方法而獲得:(A)於前述金屬箔塗布成為基材膜之樹脂的溶液,並將塗膜進行初步乾燥的步驟;(B)將前述(A)中所獲得之金屬箔與初步乾燥塗膜的疊層物進行熱處理・乾燥的步驟(以下稱為「熱處理・脫溶劑步驟」)。The base film side semi-finished product can be obtained, for example, by a production method comprising the steps of: (A) applying a solution of the metal foil as a resin of the base film, and preliminary drying the coating film; (B) The step of heat-treating and drying the laminate of the metal foil obtained in the above (A) and the preliminary dried coating film (hereinafter referred to as "heat treatment and solvent removal step").

金屬箔層中之電路的形成可使用以往公知的方法。可使用加成法(additive),亦可使用減去法。減去法為較佳。A conventionally known method can be used for forming the circuit in the metal foil layer. Additives can be used, and subtractive methods can also be used. The subtraction method is preferred.

所獲得之基材膜側半成品可直接使用在與表覆膜側半成品之貼合,又,亦可貼合脫模膜進行保存後,使用在與表覆膜側半成品之貼合。The obtained base film side semi-finished product can be directly used for bonding to the surface film side semi-finished product, or can be attached to the release film and stored, and then bonded to the surface film side semi-finished product.

表覆膜側半成品,例如可於表覆膜塗布接著劑而製造。必要時可進行所塗布之接著劑中的交聯反應。較佳實施態様中,係使接著劑層半硬化。The film-side semi-finished product can be produced, for example, by applying an adhesive to the surface film. The crosslinking reaction in the applied adhesive can be carried out as necessary. In a preferred embodiment, the adhesive layer is semi-hardened.

所獲得之表覆膜側半成品可直接使用在與基材膜側半成品之貼合,又,亦可貼合脫模膜進行保存後,使用在與基材膜側半成品之貼合。The obtained film-side semi-finished product can be used as it is directly bonded to the base film side semi-finished product, or can be bonded to the base film side semi-finished product after being adhered to the release film.

基材膜側半成品與表覆膜側半成品,係分別例如以捲軸的形態保存後,進行貼合而製成印刷電路板。就貼合方法而言,可使用任意的方法,例如可使用壓製或滾軸等進行貼合。又,亦可藉由加熱壓製或使用加熱滾軸裝置等方法,邊加熱邊將兩者貼合。The base film side semi-finished product and the surface film side semi-finished product are respectively stored in the form of a reel, and then bonded to form a printed circuit board. As the bonding method, any method can be used, for example, pressing or rolling can be used for lamination. Further, it is also possible to bond the two while heating by heating or pressing or using a heating roller device.

就補強材料側半成品而言,例如如聚醯亞胺膜般柔軟且可捲繞之補強材料的情況下,於補強材料塗布接著劑而製造較理想。又,例如如以環氧樹脂使SUS、鋁等金屬板、玻璃纖維硬化而得之板等般堅硬且無法捲繞之補強板的情況下,藉由將預先塗布於脫模基材之接著劑進行轉印塗布而製造較理想。又,必要時可進行所塗布之接著劑中的交聯反應。較佳實施態様中係使接著劑層半硬化。In the case of a reinforcing material side semi-finished product, for example, a reinforcing material which is soft and can be wound like a polyimide film, it is preferable to apply an adhesive to the reinforcing material. Further, for example, when a reinforcing plate which is hard and cannot be wound, such as a metal plate such as SUS or aluminum, or a glass fiber obtained by curing an epoxy resin, is used, an adhesive agent previously applied to a release substrate is used. It is preferable to carry out transfer coating and manufacture. Further, a crosslinking reaction in the applied adhesive can be carried out as necessary. In a preferred embodiment, the adhesive layer is semi-hardened.

所獲得之補強材料側半成品可直接使用在與印刷電路板背面之貼合,又,亦可貼合脫模膜進行保存後使用在與基材膜側半成品之貼合。The obtained reinforcing material side semi-finished product can be directly used for bonding to the back surface of the printed circuit board, or can be bonded to the release film and stored for use in bonding with the substrate film side semi-finished product.

基材膜側半成品、表覆膜側半成品、補強材料側半成品皆為本發明中之印刷電路板用疊層體。 [實施例]The substrate film side semi-finished product, the surface film side semi-finished product, and the reinforcing material side semi-finished product are all laminates for printed circuit boards in the present invention. [Examples]

<實施例> 以下,列舉實施例對本發明進行更詳細地說明。但,本發明並不限定於實施例。實施例中及比較例中之簡稱份表示質量份。<Examples> Hereinafter, the present invention will be described in more detail by way of examples. However, the invention is not limited to the embodiments. The abbreviated parts in the examples and the comparative examples represent parts by mass.

(物性評價方法)(Physical evaluation method)

酸值(A)成分:含羧基之聚烯烴樹脂 本發明中之含羧基之聚烯烴樹脂(A)的酸值(當量/106 g),係使用FT-IR(島津製作所公司製、FT-IR8200PC),並利用馬來酸酐之羰基(C=O)鍵之伸縮峰部(1780cm-1 )的吸光度(I)、同排聚合物所特有之峰部(840cm-1 )的吸光度(II)、及由馬來酸酐(東京化成製)之氯仿溶液所作成之檢量線獲得的係數(f)根據下式算出,該算出的值以樹脂1ton中之當量(當量/106 g)表示。 酸值=[吸光度(I)/吸光度(II)×(f)/馬來酸酐的分子量×2×104 ] 馬來酸酐的分子量:98.06Acid value (A) component: a carboxyl group-containing polyolefin resin The acid value (equivalent/10 6 g) of the carboxyl group-containing polyolefin resin (A) in the present invention is FT-IR (Shimadzu Corporation, FT-) IR8200PC), absorbance (I) of the stretching peak (1780 cm -1 ) of the carbonyl (C=O) bond of maleic anhydride, and absorbance of the peak (840 cm -1 ) specific to the polymer of the same row (II) The coefficient (f) obtained by the calibration curve prepared from the chloroform solution of maleic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) was calculated according to the following formula, and the calculated value was expressed by the equivalent (equivalent/10 6 g) of the resin 1ton. Acid value = [absorbance (I) / absorbance (II) × (f) / molecular weight of maleic anhydride × 2 × 10 4 ] Molecular weight of maleic anhydride: 98.06

酸值(B)成分:含羧基之苯乙烯樹脂 本發明中之含羧基之苯乙烯樹脂(B)的酸值(當量/106 g),係將含羧基之苯乙烯樹脂溶解於甲苯,並在甲醇鈉之甲醇溶液中以酚酞作為指示劑進行滴定。以樹脂1ton中之當量(當量/106 g)表示。Acid value (B) component: carboxyl group-containing styrene resin The acid value (equivalent/10 6 g) of the carboxyl group-containing styrene resin (B) in the present invention is obtained by dissolving a carboxyl group-containing styrene resin in toluene, and The titration was carried out with phenolphthalein as an indicator in a methanolic sodium methoxide solution. It is represented by the equivalent (equivalent/10 6 g) in the resin 1ton.

重量平均分子量(Mw) 本發明中之重量平均分子量係利用島津製作所(股)製:GPC(凝膠滲透層析法,以下稱GPC,標準物質:聚苯乙烯樹脂,移動相:四氫呋喃,管柱:Shodex KF-802+KF-804L+KF-806L,管柱溫度:30℃,流速:1.0ml/分,檢測器:RI檢測器)測得的值。Weight average molecular weight (Mw) The weight average molecular weight in the present invention is manufactured by Shimadzu Corporation: GPC (gel permeation chromatography, hereinafter referred to as GPC, standard material: polystyrene resin, mobile phase: tetrahydrofuran, column) : Shodex KF-802+KF-804L+KF-806L, column temperature: 30 ° C, flow rate: 1.0 ml / min, detector: RI detector) measured value.

(1)剝離強度(接著性) 以使乾燥後之厚度成為25μm的方式,將後述接著劑組成物塗布於厚度12.5μm之聚醯亞胺膜(Kaneka(股)公司製、Apical(註冊商標))、或厚度25μm之LCP膜(KURARAY(股)公司製、Vecstar(註冊商標)),並在130℃乾燥3分鐘。將如此獲得之接著性膜(B階段品)與18μm之壓延銅箔貼合。貼合係以使壓延銅箔之光澤面與接著劑接觸的方式進行,在160℃於40kgf/cm2 之加壓下壓製30秒而接著。然後在140℃熱處理4小時而使其硬化,得到剝離強度評價用樣品。剝離強度係於25℃拉伸膜,以拉伸速度50mm/min進行90°剝離試驗並測定剝離強度。該試驗係表示於常溫的接著強度。 <評價基準> ◎:1.0N/mm以上 ○:0.8N/mm以上未達1.0N/mm △:0.5N/mm以上未達0.8N/mm ×:未達0.5N/mm(1) Peeling strength (adhesiveness) The adhesive composition described below was applied to a polyimide film having a thickness of 12.5 μm (Kapika Co., Ltd., Apical (registered trademark), so that the thickness after drying was 25 μm. Or an LCP film (manufactured by Kuraray Co., Ltd., Vecstar (registered trademark)) having a thickness of 25 μm, and dried at 130 ° C for 3 minutes. The adhesive film (B-stage product) thus obtained was bonded to a rolled copper foil of 18 μm. The bonding was carried out so that the shiny side of the rolled copper foil was brought into contact with the adhesive, and pressed at 160 ° C under a pressure of 40 kgf / cm 2 for 30 seconds. Then, it was heat-treated at 140 ° C for 4 hours to be hardened, and a sample for peel strength evaluation was obtained. The peel strength was stretched at 25 ° C, and a 90° peel test was performed at a tensile speed of 50 mm/min to measure the peel strength. This test is expressed as the strength at room temperature. <Evaluation Criteria> ◎: 1.0 N/mm or more ○: 0.8 N/mm or more and less than 1.0 N/mm △: 0.5 N/mm or more and less than 0.8 N/mm ×: less than 0.5 N/mm

(2)乾燥焊料耐熱性 利用與上述相同的方法製作樣品,將2.0cm×2.0cm之樣品片於120℃進行30分鐘乾燥處理,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。 <評價基準> ◎:310℃以上 ○:300℃以上未達310℃ △:290℃以上未達300℃ ×:未達290℃(2) Dry solder heat resistance A sample was prepared by the same method as described above, and a 2.0 cm × 2.0 cm sample piece was dried at 120 ° C for 30 minutes, and flowed in a molten solder bath at each temperature for 1 minute, and the measurement was not performed. A temperature that causes a change in appearance such as a bulge. <Evaluation criteria> ◎: 310°C or more ○: 300°C or more and less than 310°C △: 290°C or more and less than 300°C ×: Not up to 290°C

(3)加濕焊料耐熱性 利用與上述相同的方法製作樣品,將2.0cm×2.0cm之樣品片進行40℃×80RH%×72小時處理,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起隆起等外觀變化的溫度。 <評價基準> ◎:260℃以上 ○:250℃以上未達260℃ △:240℃以上未達250℃ ×:未達240℃(3) Humidification solder heat resistance A sample was prepared by the same method as described above, and a 2.0 cm × 2.0 cm sample piece was subjected to treatment at 40 ° C × 80 RH % × 72 hours, and flowed in a molten solder bath at each temperature for 1 minute. The temperature at which the appearance change such as bulging does not occur is measured. <Evaluation criteria> ◎: 260°C or higher ○: 260°C or less at 250°C or more △: 250°C or less at 240°C or less ×: 240°C or less

(4)相對介電常數(εc )及介電正切(tanδ) 以使乾燥硬化後之厚度成為25μm的方式,將後述接著劑組成物塗布於厚度35μm之電解銅箔之光澤面,並在130℃乾燥3分鐘。然後在140℃熱處理4小時使其硬化,而得到試驗用之覆銅疊層板。於所獲得之試驗用覆銅疊層板之已硬化的接著劑組成物面,利用網版印刷塗布蒸發乾固型的導電性銀糊劑成為直徑50mm的圓形,並在120℃乾燥30分鐘使其硬化,進一步於導電性銀糊劑所形成之圓的中央,利用導電性接著劑接著長度30mm的引線,得到平行平板電容器。使用PRECISION LCR meter HP-4284A,在22℃下以頻率1MHz之條件測定所獲得之平行平板電容器的靜電電容Cap與損耗係數D(介電正切),並根據下式算出相對介電常數(εc )。 εc =(Cap×d)/(S×ε0 ) 此處,Cap:靜電電容[F] d:介電體層厚度=25×10-6 [m] S:被測定介電體面積=π×(25×10-3 )2 ε0 :真空的介電常數 8.854×10-12 針對所獲得之相對介電常數、介電正切,如下述般進行評價。 <相對介電常數的評價基準> ◎:2.3以下 ○:超過2.3至2.6以下 △:超過2.6至3.0以下 ×:超過3.0 <介電正切的評價基準> ◎:0.005以下 ○:超過0.005至0.01以下 △:超過0.01至0.02以下 ×:超過0.02(4) Relative dielectric constant (ε c ) and dielectric tangent (tan δ) The adhesive composition described later was applied to a glossy surface of an electrolytic copper foil having a thickness of 35 μm so that the thickness after drying and hardening became 25 μm. Dry at 130 ° C for 3 minutes. Then, it was heat-treated at 140 ° C for 4 hours to be hardened to obtain a copper-clad laminate for testing. On the hardened adhesive composition surface of the obtained copper-clad laminate for testing, a conductive dry silver-type conductive silver paste was applied by screen printing to a circular shape of 50 mm in diameter, and dried at 120 ° C for 30 minutes. This was hardened, and further, a parallel plate capacitor was obtained by using a conductive adhesive followed by a lead having a length of 30 mm in the center of a circle formed by the conductive silver paste. Using the PRECISION LCR meter HP-4284A, the electrostatic capacitance Cap and the loss factor D (dielectric tangent) of the obtained parallel plate capacitor were measured at a frequency of 1 MHz at 22 ° C, and the relative dielectric constant (ε c was calculated according to the following formula). ). ε c = (Cap × d) / (S × ε 0 ) Here, Cap: electrostatic capacitance [F] d: dielectric layer thickness = 25 × 10 -6 [m] S: measured dielectric area = π ×(25 × 10 -3 ) 2 ε 0 : The dielectric constant of vacuum 8.854 × 10 -12 was evaluated for the relative dielectric constant and dielectric tangent obtained as follows. <Evaluation Criteria for Relative Dielectric Constant> ◎: 2.3 or less ○: more than 2.3 to 2.6 or less Δ: more than 2.6 to 3.0 or less ×: more than 3.0 <Evaluation criteria of dielectric tangent> ◎: 0.005 or less ○: more than 0.005 to 0.01 or less △: more than 0.01 to 0.02 or less ×: more than 0.02

(5)阻燃性 以使乾燥後之厚度成為25μm的方式,將後述接著劑組成物塗布於厚度25μm之聚醯亞胺膜(Kaneka(股)公司製、Apical(註冊商標)),並在130℃乾燥3分鐘。然後在140℃熱處理4小時而使其硬化,得到疊層體。使用疊層體基於UL-94製作樣品片,並基於VTM法進行燃燒試驗。 <評價基準> ○:滿足VTM-0條件 ×:VTM-1以上,不滿足VTM-0條件(5) Flame retardancy The adhesive composition described later is applied to a polyimine film (manufactured by Kaneka Co., Ltd., Apical (registered trademark)) having a thickness of 25 μm so that the thickness after drying is 25 μm. Dry at 130 ° C for 3 minutes. Then, it was heat-treated at 140 ° C for 4 hours to be hardened to obtain a laminate. A sample piece was produced based on UL-94 using a laminate, and a burning test was performed based on the VTM method. <Evaluation Criteria> ○: VTM-0 condition is satisfied ×: VTM-1 or more, VTM-0 condition is not satisfied

(含羧基之聚烯烴樹脂) [製造例1] 於1L高壓釜(autoclave)中,加入丙烯-丁烯共聚物(三井化學公司製「TAFMER(註冊商標)XM7080」)100質量份、甲苯150質量份及馬來酸酐19質量份、二-第三丁基過氧化物6質量份,升溫至140℃後,進一步攪拌3小時。之後,將所獲得之反應液冷卻後,注入裝有大量甲乙酮的容器中並使樹脂析出。然後,藉由離心分離該含有樹脂之溶液,將馬來酸酐接枝聚合而得的酸改性丙烯-丁烯共聚物,與(聚)馬來酸酐及低分子量物進行分離、純化。其後,藉由在減壓下、70℃使其乾燥5小時,得到馬來酸酐改性丙烯-丁烯共聚物(CO-1、酸值410當量/106 g、重量平均分子量60,000、Tm80℃、△H35J/g)。(Polyurethane-containing polyolefin resin) [Production Example 1] 100 parts by mass of propylene-butene copolymer (TAFMER (registered trademark) XM7080) manufactured by Mitsui Chemicals Co., Ltd., and 150 mass of toluene were added to a 1 L autoclave. 19 parts by mass of maleic anhydride and 6 parts by mass of di-tert-butyl peroxide were heated to 140 ° C, and further stirred for 3 hours. Thereafter, the obtained reaction liquid was cooled, poured into a vessel containing a large amount of methyl ethyl ketone, and the resin was precipitated. Then, the acid-modified propylene-butene copolymer obtained by graft-polymerizing the resin-containing solution by grafting the maleic anhydride with (poly)maleic anhydride and a low molecular weight substance is separated and purified. Thereafter, it was dried under reduced pressure at 70 ° C for 5 hours to obtain a maleic anhydride-modified propylene-butene copolymer (CO-1, an acid value of 410 equivalents/10 6 g, a weight average molecular weight of 60,000, and a Tm80). °C, △H35J/g).

[製造例2] 將馬來酸酐的添加量變更為11質量份,除此以外,利用與製造例1同樣的方法,得到馬來酸酐改性丙烯-丁烯共聚物(CO-2、酸值224當量/106 g、重量平均分子量65,000、Tm78℃、△H25J/g)。[Production Example 2] A maleic anhydride-modified propylene-butene copolymer (CO-2, acid value) was obtained by the same method as in Production Example 1 except that the amount of the maleic anhydride was changed to 11 parts by mass. 224 equivalents/10 6 g, weight average molecular weight 65,000, Tm 78 ° C, ΔH 25 J/g).

[實施例1] 在配備有水冷回流冷凝器與攪拌器的500mL四口燒瓶中,加入製造例1所獲得之馬來酸酐改性丙烯-丁烯共聚物(CO-1)80質量份、含羧基之苯乙烯樹脂(Tuftec(註冊商標)M1943)20質量份、甲基環己烷450質量份、甲乙酮50質量份,邊攪拌邊升溫至80℃,持續攪拌1小時而溶解。於冷卻獲得之溶液中,摻合5質量份的碳二亞胺樹脂V-09GB、10質量份的環氧樹脂HP-7200,獲得混合溶液。於獲得之混合溶液摻合60質量份的阻燃性填料OP-935,得到接著劑組成物。摻合量、接著強度、焊料耐熱性、電特性、阻燃性顯示於表1。[Example 1] 80 parts by mass of a maleic anhydride-modified propylene-butene copolymer (CO-1) obtained in Production Example 1 was added to a 500 mL four-necked flask equipped with a water-cooled reflux condenser and a stirrer, and the like. 20 parts by mass of a carboxyl group-containing styrene resin (Tuftec (registered trademark) M1943), 450 parts by mass of methylcyclohexane, and 50 parts by mass of methyl ethyl ketone were heated to 80 ° C while stirring, and the mixture was stirred for 1 hour to be dissolved. To the solution obtained by cooling, 5 parts by mass of carbodiimide resin V-09 GB and 10 parts by mass of epoxy resin HP-7200 were blended to obtain a mixed solution. 60 parts by mass of the flame-retardant filler OP-935 was blended with the obtained mixed solution to obtain an adhesive composition. The blending amount, the bonding strength, the solder heat resistance, the electrical properties, and the flame retardancy are shown in Table 1.

[實施例2~10] 將含羧基之聚烯烴樹脂、含羧基之苯乙烯樹脂、碳二亞胺樹脂、環氧樹脂、阻燃性填料如表1所示進行變更,利用與實施例1同樣的方法進行實施例2~10,使其變更成為表1所示之各摻合量。接著強度、焊料耐熱性、電特性、阻燃性顯示於表1。[Examples 2 to 10] The carboxyl group-containing polyolefin resin, the carboxyl group-containing styrene resin, the carbodiimide resin, the epoxy resin, and the flame-retardant filler were changed as shown in Table 1, and the same procedure as in Example 1 was carried out. The methods of Examples 2 to 10 were carried out and changed to the respective blending amounts shown in Table 1. Next, the strength, solder heat resistance, electrical properties, and flame retardancy are shown in Table 1.

[表1] [Table 1]

[比較例1~4] 將含羧基之聚烯烴樹脂、含羧基之苯乙烯樹脂、碳二亞胺樹脂、環氧樹脂、阻燃性填料如表2所示進行變更,利用與實施例1同樣的方法進行比較例1~4,使其變更成為表2所示之各摻合量。接著強度、焊料耐熱性、電特性、阻燃性顯示於表2。[Comparative Examples 1 to 4] The carboxyl group-containing polyolefin resin, the carboxyl group-containing styrene resin, the carbodiimide resin, the epoxy resin, and the flame-retardant filler were changed as shown in Table 2, and the same as in Example 1. The methods of Comparative Examples 1 to 4 were changed to the respective blending amounts shown in Table 2. Next, the strength, solder heat resistance, electrical properties, and flame retardancy are shown in Table 2.

[表2] [Table 2]

表1、2使用之含羧基之聚烯烴樹脂(A)、含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、環氧樹脂(D)、阻燃性填料(E)如下。 含羧基之苯乙烯樹脂:Tuftec(註冊商標)M1913(旭化成化學公司製)、酸價185當量/106 g 含羧基之苯乙烯樹脂:Tuftec(註冊商標)M1943(旭化成化學公司製)、酸價185當量/106 g 碳二亞胺樹脂:V-09GB(日清紡化學公司製) 二環戊二烯型環氧樹脂:HP-7200(DIC公司製)  磷系阻燃性填料:EXOLIT(註冊商標)OP-935(Clariant公司) 金屬水合物系阻燃性填料:MGZ-3(堺化學工業公司製) 膨脹(Intumescent)系阻燃性填料:FP-2100JC(ADEKA公司製) 磷系阻燃性非填料:PX-200(大八化學公司製)The carboxyl group-containing polyolefin resin (A), the carboxyl group-containing styrene resin (B), the carbodiimide resin (C), the epoxy resin (D), and the flame-retardant filler (E) used in Tables 1 and 2 are as follows . Carboxyl group-containing styrene resin: Tuftec (registered trademark) M1913 (manufactured by Asahi Kasei Chemicals Co., Ltd.), acid value: 185 equivalents/10 6 g Carboxyl group-containing styrene resin: Tuftec (registered trademark) M1943 (made by Asahi Kasei Chemicals Co., Ltd.), acid value 185 equivalents/10 6 g carbodiimide resin: V-09GB (manufactured by Nisshinbo Chemical Co., Ltd.) Dicyclopentadiene type epoxy resin: HP-7200 (manufactured by DIC Corporation) Phosphorus-based flame retardant filler: EXOLIT (registered trademark) ) OP-935 (Clariant) Metal hydrate-based flame retardant filler: MGZ-3 (manufactured by Sigma Chemical Industry Co., Ltd.) Intumescent flame retardant filler: FP-2100JC (made by ADEKA) Phosphorus-based flame retardancy Non-filler: PX-200 (made by Daiba Chemical Co., Ltd.)

由表1可知:實施例1~10中,和聚醯亞胺(PI)與銅箔具有優異的接著性、焊料耐熱性,同時和液晶聚合物(LCP)與銅箔亦具有優異的接著性、焊料耐熱性。又,關於接著劑組成物的電特性,相對介電常數、介電正切皆低,係良好。更達成VTM-0,阻燃性優異。反觀由表2可知:比較例1中阻燃性填料量少,阻燃性差。比較例2中阻燃性填料量多,接著性、加濕焊料耐熱性差。比較例3中摻合有有機磷系阻燃劑,與接著劑過度相容,故接著性、加濕焊料耐熱性差。比較例4中僅為含羧基之苯乙烯樹脂,故交聯密度低,加濕焊料耐熱性差。 [產業上利用性]As is clear from Table 1, in Examples 1 to 10, the polyimide and the copper foil have excellent adhesion and solder heat resistance, and the liquid crystal polymer (LCP) and the copper foil also have excellent adhesion. , solder heat resistance. Further, the electrical properties of the adhesive composition were low in relative dielectric constant and dielectric tangent, and were good. It has achieved VTM-0 and is excellent in flame retardancy. In contrast, as seen from Table 2, in Comparative Example 1, the amount of the flame-retardant filler was small, and the flame retardancy was poor. In Comparative Example 2, the amount of the flame-retardant filler was large, and the adhesiveness and the moisturizing solder were inferior in heat resistance. In Comparative Example 3, an organic phosphorus-based flame retardant was blended and was excessively compatible with the adhesive, so that the adhesiveness and the moisturizing solder were inferior in heat resistance. In Comparative Example 4, only the carboxyl group-containing styrene resin was used, so the crosslinking density was low, and the humidifying solder was inferior in heat resistance. [Industrial use]

根據本發明,可提供一種疊層體,不僅是與以往的聚醯亞胺、聚對苯二甲酸乙二酯膜,與LCP等具有低介電特性之樹脂基材、銅箔等金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性、阻燃性優異。基於上述特性,在撓性印刷電路板用途,特別是要求於高頻區域之低介電特性(低相對介電常數、低介電正切)的FPC用途係有用。According to the present invention, it is possible to provide a laminate which is not only a conventional polyimide substrate, a polyethylene terephthalate film, a resin substrate having a low dielectric property such as LCP, or a metal substrate such as a copper foil. It also has high adhesion, high solder heat resistance, and low dielectric properties and flame retardancy. Based on the above characteristics, it is useful for flexible printed circuit board applications, particularly FPC applications requiring low dielectric properties (low relative dielectric constant, low dielectric tangent) in a high frequency region.

no

Claims (6)

一種疊層體(Z),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)疊層體(Z)之加濕焊料耐熱性為240℃以上, (5)將金屬基材從疊層體(Z)去除後得到之疊層體(X)在UL-94法中為VTM-0。A laminate (Z) comprising a resin substrate and a metal substrate laminated via an adhesive comprising a carboxyl group-containing polyolefin resin (A); characterized by: (1) an adhesive layer at a frequency of 1 MHz The relative dielectric constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less, and (3) the peel strength between the resin substrate and the metal substrate is 0.5. N/mm or more, (4) The heat resistance of the wet solder of the laminate (Z) is 240 ° C or higher, and (5) the laminate (X) obtained by removing the metal substrate from the laminate (Z) is In the UL-94 method, it is VTM-0. 一種疊層體(X),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該樹脂基材的疊層體; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)疊層體(X)在UL-94法中為VTM-0。A laminate (X), which is a laminate of a resin substrate and a metal substrate, which is formed by laminating a layer of an adhesive including a carboxyl group-containing polyolefin resin (A). a laminate of the resin substrate; characterized in that: (1) the dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, and (2) dielectric tangent of the adhesive layer at a frequency of 1 MHz (tan δ) is 0.02 or less, and (3) when a metal substrate is laminated on the adhesive layer of the laminate (X), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm. As described above, (4) when a metal substrate is laminated on the adhesive layer of the laminate (X), the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) the laminate (X) is in the UL- In the 94 method, it is VTM-0. 一種疊層體(Y),係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該金屬基材的疊層體; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)於疊層體(Y)之接著劑層面疊層樹脂基材以製作疊層體(Z),然後去除金屬基材後得到之疊層體(X)在UL-94法中為VTM-0。A laminate (Y), which is a laminate of a resin substrate and a metal substrate, which is formed by laminating a layer of an adhesive including a carboxyl group-containing polyolefin resin (A). laminate of the metal substrate; wherein: (1) adhesive layers relative dielectric constant to a frequency of 1MHz (ε c) is 3.0 or less, (2) tangential to the adhesive layer of dielectric frequency of 1MHz (tan δ) is 0.02 or less, and (3) when a resin substrate is laminated on the adhesive layer of the laminate (Y), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm. (4) When the resin substrate is laminated on the adhesive layer of the laminate (Y), the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) subsequent to the laminate (Y) The laminate layer of the resin substrate is laminated to form a laminate (Z), and then the laminate (X) obtained by removing the metal substrate is VTM-0 in the UL-94 method. 一種接著劑層,係樹脂基材及金屬基材介由包括含羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層; 其特徵為: (1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下, (2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下, (3)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上, (4)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上, (5)於接著劑層之其中一面疊層樹脂基材後得到之疊層體(X)在UL-94法中為VTM-0。An adhesive layer used as a laminate (Z) of a resin substrate and a metal substrate via a laminate layer comprising an adhesive layer of a carboxyl group-containing polyolefin resin (A); (1) The relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, and (2) the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less, and (3) When the resin substrate is laminated on one surface of the layer, and the metal substrate is laminated on the other surface, the peel strength between the resin substrate and the metal substrate in the laminate is 0.5 N/mm or more, and (4) When the resin substrate is laminated on one surface of the agent layer and the metal substrate is laminated on the other surface, the heat resistance of the solder of the laminate is 240 ° C or higher, and (5) the resin base is laminated on one side of the adhesive layer. The laminate (X) obtained after the material was VTM-0 in the UL-94 method. 一種接著片,含有如申請專利範圍第1項之疊層體(Z)、如申請專利範圍第2項之疊層體(X)、如申請專利範圍第3項之疊層體(Y)或如申請專利範圍第4項之接著劑層。An adhesive sheet comprising the laminate (Z) of claim 1 of the patent application, the laminate (X) of claim 2, the laminate (Y) of claim 3, or For example, the adhesive layer of claim 4 is applied. 一種印刷電路板,包含如申請專利範圍第5項之接著片作為構成要素。A printed circuit board comprising a back sheet as in the fifth aspect of the patent application as a constituent element.
TW105135197A 2015-11-02 2016-10-31 Low dielectric flame retardant adhesive composition TWI688474B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-215631 2015-11-02
JP2015215631 2015-11-02

Publications (2)

Publication Number Publication Date
TW201728445A true TW201728445A (en) 2017-08-16
TWI688474B TWI688474B (en) 2020-03-21

Family

ID=58663004

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105135197A TWI688474B (en) 2015-11-02 2016-10-31 Low dielectric flame retardant adhesive composition

Country Status (5)

Country Link
JP (2) JP6791163B2 (en)
KR (1) KR102284487B1 (en)
CN (1) CN107848259B (en)
TW (1) TWI688474B (en)
WO (1) WO2017077912A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018030026A1 (en) * 2016-08-09 2018-02-15 東洋紡株式会社 Laminate containing low dielectric constant adhesive layer
JP2019127501A (en) * 2018-01-22 2019-08-01 藤森工業株式会社 Thermosetting adhesive composition, adhesive film, coverlay film, and flexible printed wiring board
CN109666434B (en) * 2018-12-27 2021-09-10 苏州赛伍应用技术股份有限公司 Adhesive, preparation method, adhesive film containing adhesive, preparation method and application
JPWO2020184569A1 (en) * 2019-03-12 2020-09-17
WO2021106847A1 (en) * 2019-11-28 2021-06-03 東洋紡株式会社 Adhesive film, laminate, and printed wiring board
WO2021112134A1 (en) * 2019-12-04 2021-06-10 東洋紡株式会社 Low-dielectric layered product
JPWO2021132058A1 (en) * 2019-12-23 2021-07-01
US20230173731A1 (en) * 2020-03-25 2023-06-08 Toyobo Co., Ltd. Flame-retardant biaxially-oriented polyester film
JP7484517B2 (en) 2020-07-14 2024-05-16 artience株式会社 Thermosetting adhesive sheet and its use
WO2022024808A1 (en) * 2020-07-28 2022-02-03 三菱エンジニアリングプラスチックス株式会社 Resin composition, and methods respectively for manufacturing molded article and plated molded article
KR102327558B1 (en) * 2020-11-09 2021-11-16 동우 화인켐 주식회사 Circuit board, antenna package and display device
WO2022196617A1 (en) * 2021-03-17 2022-09-22 Agc株式会社 Metal-clad laminate and wiring board
TW202337949A (en) * 2022-01-17 2023-10-01 日商東洋紡Mc股份有限公司 Adhesive composition, adhesive sheet, electromagnetic-wave shielding film, laminate, and printed wiring board

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4067144B2 (en) * 1996-08-20 2008-03-26 三井化学株式会社 Adhesive composition
JP2000104025A (en) * 1998-09-29 2000-04-11 Nisshinbo Ind Inc Film for flexible printed wiring board
JP2000345132A (en) * 1999-06-01 2000-12-12 Nisshinbo Ind Inc Method for conjugating lcp
JP3621351B2 (en) * 2001-02-08 2005-02-16 日東電工株式会社 Thermally reactive adhesive composition and thermally reactive adhesive film
JP2007073738A (en) * 2005-09-07 2007-03-22 Toyo Ink Mfg Co Ltd Reinforcing material with adhesive layer, flexible printed wiring board with reinforcing material, and its production process
JP2008111102A (en) * 2006-10-02 2008-05-15 Shin Etsu Chem Co Ltd Flame-retardant adhesive composition, and adhesive sheet, cover-lay film and flexible copper-clad laminate using the same
JP2010222408A (en) * 2009-03-19 2010-10-07 Panasonic Electric Works Co Ltd Resin composition for flexible printed wiring board, resin film, prepreg, metallic foil with resin, flexible printed wiring board
JP5577107B2 (en) * 2010-01-22 2014-08-20 パナソニック株式会社 Resin composition, method for producing resin composition, resin varnish, prepreg, metal-clad laminate, and printed wiring board
JP2012025917A (en) 2010-07-27 2012-02-09 Panasonic Electric Works Co Ltd Halogen-free epoxy resin composition, coverlay film, bonding sheet, prepreg and laminate for printed wiring board
JP5955156B2 (en) 2012-08-10 2016-07-20 ナミックス株式会社 Resin composition, and adhesive film and coverlay film thereby
KR102250655B1 (en) 2013-09-20 2021-05-12 도아고세이가부시키가이샤 Flame-retardant adhesive composition, coverlay film using same, and flexible copper-clad laminate

Also Published As

Publication number Publication date
CN107848259A (en) 2018-03-27
WO2017077912A1 (en) 2017-05-11
JPWO2017077912A1 (en) 2018-08-16
CN107848259B (en) 2020-08-21
JP2021003886A (en) 2021-01-14
KR20180077099A (en) 2018-07-06
KR102284487B1 (en) 2021-08-02
JP6791163B2 (en) 2020-11-25
JP6874896B2 (en) 2021-05-19
TWI688474B (en) 2020-03-21

Similar Documents

Publication Publication Date Title
JP6874896B2 (en) Low Dielectric Flame Retardant Adhesive Composition
TWI697532B (en) Laminated body including low dielectric adhesive layer
JP6705456B2 (en) Low dielectric adhesive composition
TWI600734B (en) Adhesive compositions and their application Coverlay Film and Flexible Copper Clad Laminate
CN111670236B (en) Low dielectric adhesive composition
TWI745273B (en) Laminated body with adhesive layer, flexible copper clad laminated board and flexible flat cable using it
CN109476124B (en) Laminate containing low dielectric adhesive layer
TW202214809A (en) Adhesive composition, adhesive sheet, multilayer body and printed wiring board
CN114080439B (en) Adhesive composition, adhesive sheet, laminate, and printed wiring board
TW202242060A (en) Adhesive composition, and bonding sheet, multilayer body and printed wiring board each containing same
JP2023032287A (en) Low dielectric adhesive composition