TW201704385A - White active energy ray curable resin composition - Google Patents

White active energy ray curable resin composition Download PDF

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TW201704385A
TW201704385A TW105110525A TW105110525A TW201704385A TW 201704385 A TW201704385 A TW 201704385A TW 105110525 A TW105110525 A TW 105110525A TW 105110525 A TW105110525 A TW 105110525A TW 201704385 A TW201704385 A TW 201704385A
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compound
active energy
energy ray
resin composition
curable resin
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TWI689558B (en
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山本和義
吉澤恵理
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日本化藥股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

An object of the present application is to provide a white active energy ray curable resin composition, which can form a cured product after a photocuring step, and has basic characteristics such as solder heat resistance, adhesion and coating film hardness, even without a further thermosetting step. The present application provides a white line active energy ray curable resin composition, comprising a reactive polycarboxylic acid compound (A), a reactive compound (B) other than the (A), a photopolymerization iniciator (C), and titanium oxide (D), wherein the reactive polycarboxylic acid compound (A) is obtained from a reaction of a reactant (E) with a polybasic acid anhydride (d), and the reactant (E) contains an epoxy resin (a) represented by the general formula (1), an acrylic acid (b), and a compound (c) having at least two or more hydroxyl groups and one or more carboxyl in one molecule.

Description

白色活性能量線硬化型樹脂組成物 White active energy ray-hardening resin composition

本發明係有關用以被覆形成於印刷配線板等基板的導體電路圖案之適用於被覆材料的活性能量線硬化型樹脂組成物、以及經使該活性能量線硬化型樹脂組成物硬化後的硬化物所被覆的印刷配線板等被覆形成品。 The present invention relates to an active energy ray-curable resin composition suitable for a coating material for coating a conductor circuit pattern formed on a substrate such as a printed wiring board, and a cured product obtained by curing the active energy ray-curable resin composition. The coated printed wiring board or the like is coated to form a product.

印刷配線板,一般係用於在基板上形成導體電路的圖案,並於其電路圖案的焊接盤(land)藉由焊接來搭載電子零件。其除了焊接盤(land)以外的電路部分,係經作為永久保護皮膜的防焊膜所被覆。藉此,於印刷配線板焊接電子零件時,即防止焊料附著於不必要的部分,且防止電路導體直接曝曬於空氣而被氧化、濕度所腐蝕。 The printed wiring board is generally used to form a pattern of a conductor circuit on a substrate, and to mount an electronic component by soldering on a land of the circuit pattern. The circuit portion other than the land is covered with a solder mask as a permanent protective film. Thereby, when the electronic component is soldered on the printed wiring board, the solder is prevented from adhering to an unnecessary portion, and the circuit conductor is prevented from being directly exposed to the air to be oxidized and corroded by humidity.

以往,若要將具備焊料耐熱性及塗膜硬度等基本特性的防焊膜形成於印刷配線板時,如專利文獻1記載,係需要光硬化步驟與熱硬化步驟。首先,將活性能量線硬化型樹脂組成物塗佈於印刷配線板後,並視需要而以60至100℃左右的溫度進行預備乾燥,形成塗膜。其次,使具有令電路圖案的連接盤(land)以外為透光性的圖案之 負片(negative film)密著於活性能量線硬化型樹脂組成物上,照射活性能量線(例如紫外線)並使其光硬化。更進一步,將非曝光區域以弱鹼性水溶液去除,而將塗膜顯影。最後,以140至180℃左右的溫度使塗膜熱硬化,並使活性能量線硬化型樹脂組成物的硬化塗膜形成於印刷配線板上。 In the past, when a solder resist film having basic properties such as solder heat resistance and coating film hardness is formed on a printed wiring board, as described in Patent Document 1, a photo-curing step and a heat-curing step are required. First, the active energy ray-curable resin composition is applied to a printed wiring board, and then preliminarily dried at a temperature of about 60 to 100 ° C as necessary to form a coating film. Next, a pattern having a light transmissive property other than the land having the circuit pattern is used. A negative film is adhered to the active energy ray-curable resin composition, and is irradiated with an active energy ray (for example, ultraviolet ray) to harden the light. Further, the non-exposed area is removed with a weakly alkaline aqueous solution to develop the coating film. Finally, the coating film is thermally cured at a temperature of about 140 to 180 ° C, and a cured coating film of the active energy ray-curable resin composition is formed on the printed wiring board.

然而,在此種以往的防焊膜形成方法中,因進行光硬化步驟與熱硬化步驟,故會有被膜形成品的生產性未提升之問題。又,於耐熱性低的基板形成防焊膜時,會有熱硬化步驟的熱造成基板變形等基板品質劣化之問題。 However, in such a conventional solder resist film forming method, since the photo-curing step and the heat-hardening step are performed, there is a problem that the productivity of the film-formed product is not improved. Moreover, when a solder resist film is formed on a substrate having low heat resistance, there is a problem that the quality of the substrate is deteriorated due to heat of the heat hardening step.

專利文獻2中,雖然揭示了含有含不飽和基的多元羧酸之樹脂組成物係適用於阻焊劑,但關於分散有氧化鈦等的白色活性能量線硬化型樹脂組成物,則完全未記載。 In Patent Document 2, it is disclosed that a resin composition containing a polyvalent carboxylic acid containing an unsaturated group is applied to a solder resist. However, a white active energy ray-curable resin composition in which titanium oxide or the like is dispersed is not described at all.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2008-257044號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-257044

[專利文獻2]日本專利第2704661號公報 [Patent Document 2] Japanese Patent No. 2704661

本發明為有鑑於上述情況而創作者,本發明之目的係提供一種白色活性能量線硬化型樹脂組成物, 其係在光硬化步驟後,即使不進一步進行熱硬化步驟,仍可形成具有焊料耐熱性、密著性、塗膜硬度等基本特性的硬化物者。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a white active energy ray-curable resin composition. After the photohardening step, a cured product having basic properties such as solder heat resistance, adhesion, and coating film hardness can be formed without further performing a heat curing step.

本發明人等為了解決前述課題而進行深入探討,結果發現具有特定的化合物及組成之樹脂組成物能解決前述課題,逐完成本發明。 The present inventors have intensively studied in order to solve the above problems, and as a result, it has been found that a resin composition having a specific compound and composition can solve the above problems, and the present invention has been completed.

亦即,本發明有關下述(1)至(8)者: That is, the present invention relates to the following (1) to (8):

(1)一種白色活性能量線硬化型樹脂組成物,係含有:反應性多元羧酸化合物(A)、反應性多元羧酸化合物(A)以外的反應性化合物(B)、光聚合起始劑(C)、及氧化鈦(D),其中,反應性多元羧酸化合物(A)係使反應物(E)與多元酸酐(d)反應而得到者,該反應物(E)係通式(1)所示之環氧樹脂(a)與一分子中具有1個以上的可聚合之乙烯性不飽和基與1個以上的羧基之化合物(b)及視需要之一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的反應物。 (1) A white active energy ray-curable resin composition containing a reactive polycarboxylic acid compound (A), a reactive polyvalent carboxylic acid compound (A), a reactive compound (B), and a photopolymerization initiator (C) and titanium oxide (D), wherein the reactive polycarboxylic acid compound (A) is obtained by reacting a reactant (E) with a polybasic acid anhydride (d), and the reactant (E) is a formula (E) 1) The epoxy resin (a) shown and at least one of the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule and one of the molecules as needed A reactant of the above hydroxyl group and one or more carboxyl group compounds (c).

(式中,n表示0至2的正數) (where n represents a positive number from 0 to 2)

(2)如前述(1)所述之白色活性能量線硬化型樹脂組成物,其中,反應性多元羧酸化合物(A)係使反應物(E)與多元酸酐(d)反應而得到者,該反應物(E)係通式(1)所示之環氧樹脂(a)與一分子中具有1個以上的可聚合之乙烯性不飽和基與1個以上的羧基之化合物(b)及一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的反應物。 (2) The white active energy ray-curable resin composition according to the above (1), wherein the reactive polycarboxylic acid compound (A) is obtained by reacting a reactant (E) with a polybasic acid anhydride (d). The reactant (E) is an epoxy resin (a) represented by the formula (1) and a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule. A reactant of a compound (c) having at least two hydroxyl groups and one or more carboxyl groups in one molecule.

(3)如前述(1)或(2)所述之白色活性能量線硬化型樹脂組成物,其中,光聚合起始劑(C)為醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑,其調配比率係相對於苯甲醯基肟系光聚合起始劑1質量份而使醯基膦系光聚合起始劑為2至100質量份。 (3) The white active energy ray-curable resin composition according to the above (1) or (2), wherein the photopolymerization initiator (C) is a mercaptophosphine-based photopolymerization initiator and a benzamidine group. The oxime-based photopolymerization initiator is used in an amount of from 2 to 100 parts by mass based on 1 part by mass of the benzamidine-based photopolymerization initiator.

(4)如前述(1)或(2)所述之白色活性能量線硬化型樹脂組成物,其中,光聚合起始劑(C)為醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑,其調配比率係相對於苯甲醯基肟系光聚合起始劑1質量份而使醯基膦系光聚合起始劑為3至50質量份。 (4) A white active energy ray-curable resin composition according to the above (1) or (2), wherein the photopolymerization initiator (C) is a mercaptophosphine-based photopolymerization initiator and a benzamidine group. The oxime-based photopolymerization initiator is used in an amount of from 3 to 50 parts by mass based on 1 part by mass of the fluorenyl fluorene-based photopolymerization initiator.

(5)如前述(1)或(2)所述之白色活性能量線硬化型樹脂組成 物,其中,光聚合起始劑(C)為醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑,其調配比率係相對於苯甲醯基肟系光聚合起始劑1質量份而使醯基膦系光聚合起始劑為4至10質量份。 (5) A composition of a white active energy ray-curable resin according to the above (1) or (2) The photopolymerization initiator (C) is a mercaptophosphine-based photopolymerization initiator and a benzamidine-based photopolymerization initiator, the ratio of which is relative to the benzamidine-based photopolymerization. The amount of the starting agent is 1 part by mass, and the mercaptophosphine-based photopolymerization initiator is 4 to 10 parts by mass.

(6)如前述(3)至(5)中任一項所述之白色活性能量線硬化型樹脂組成物,其中,醯基膦系光聚合起始劑係選自由2,4,6-三甲基苯甲醯基-二苯基-氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦、雙(2,6-二甲基苯甲醯基)-2,4,4-三甲基-戊基氧化膦及(2,4,6-三甲基苯甲醯基)乙氧基苯基氧化膦所組成群組之1種以上,苯甲醯基肟系光聚合起始劑係選自由1,2-辛二酮,1-[4-(苯基硫基)-2-(O-苯甲醯基肟)]、2-丙二酮-2-O-苯甲醯基肟、1-苯基-1,2-丙二酮-2-O-苯甲醯基肟所組成群組之1種以上。 The white active energy ray-curable resin composition according to any one of the above aspects, wherein the mercaptophosphine-based photopolymerization initiator is selected from the group consisting of 2, 4, 6-three Methyl benzhydryl-diphenyl-phosphine oxide, bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide, bis(2,6-dimethylbenzylidene) One or more groups of -2,4,4-trimethyl-pentylphosphine oxide and (2,4,6-trimethylbenzylidene)ethoxyphenylphosphine oxide, benzamidine The fluorene photopolymerization initiator is selected from the group consisting of 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzylidenehydrazide)], 2-propanedione- One or more groups consisting of 2-O-benzimidoxime and 1-phenyl-1,2-propanedione-2-O-benzoguanidinium.

(7)一種硬化物,其係前述(1)至(6)中任一項所述之白色活性能量線硬化型樹脂組成物的硬化物。 (7) A cured product of the white active energy ray-curable resin composition according to any one of the above (1) to (6).

(8)一種印刷配線板,其具有前述(1)至(6)中任一項所述之白色活性能量線硬化型樹脂組成物的硬化被膜。 (8) A cured wiring film comprising the white active energy ray-curable resin composition according to any one of the above (1) to (6).

根據本發明的態樣,藉由調配反應性多元羧酸化合物(A),即使在利用曝光進行的光硬化步驟後不進行熱硬化步驟,亦即藉由利用活性能量線進行的曝光處理,也可得到於反射率、焊料耐熱性、密著性及塗膜硬度 等諸多特性優異的硬化物。此外,在本發明的態樣中,即使在光硬化步驟後不進行熱硬化步驟,仍可得到上述諸多特性優異的硬化物,故提升了製品(例如具有硬化被膜的印刷配線板)之生產效率。 According to the aspect of the present invention, by disposing the reactive polycarboxylic acid compound (A), even after the photohardening step by exposure, the thermal curing step is not performed, that is, by exposure treatment using an active energy ray. Available in reflectivity, solder heat resistance, adhesion and film hardness And many other hardened materials with excellent properties. Further, in the aspect of the invention, even if the heat hardening step is not performed after the photohardening step, the cured product excellent in the above various characteristics can be obtained, so that the production efficiency of the article (for example, a printed wiring board having a hardened film) is improved. .

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

在本發明中,反應性多元羧酸化合物(A)係使反應物(E)與多元酸酐(d)反應而得到者,該反應物(E)係通式(1)所示之環氧樹脂(a)與一分子中具有1個以上的可聚合之乙烯性不飽和基與1個以上的羧基之化合物(b)及視需要之一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的反應物。 In the present invention, the reactive polycarboxylic acid compound (A) is obtained by reacting a reactant (E) with a polybasic acid anhydride (d), and the reactant (E) is an epoxy resin represented by the general formula (1). (a) a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule, and one or more of the molecules having at least two or more hydroxyl groups and one or more carboxyl groups The reactant of the compound (c).

亦即,本發明之反應性多元羧酸化合物(A)係使環氧樹脂(a)與化合物(b)的反應物(E)再與多元酸酐(d)反應,或是使環氧樹脂(a)與化合物(b)及化合物(c)的反應物(E)再與多元酸酐(d)反應而得到。 That is, the reactive polycarboxylic acid compound (A) of the present invention is obtained by reacting the epoxy resin (a) with the reactant (E) of the compound (b) with the polybasic acid anhydride (d), or by epoxy resin ( a) The reaction product (E) with the compound (b) and the compound (c) is further reacted with the polybasic acid anhydride (d).

在本發明中,是藉由環氧基羧酸酯化反應,於分子鏈中導入乙烯性不飽和基與羥基,而發揮本發明之特徴。 In the present invention, an ethylenically unsaturated group and a hydroxyl group are introduced into a molecular chain by an epoxy group carboxylic acid esterification reaction, and the characteristics of the present invention are exerted.

本發明之通式(1)所示之環氧樹脂(a)係使(4(4(1,1-雙(對羥基苯基)-乙基)α,α-二甲基苯甲基)酚)(以下稱為酚化合物(PA1))與表鹵醇進行反應而得者。本發明之環氧樹脂係如下述代表結構所示。 The epoxy resin (a) represented by the formula (1) of the present invention is (4(4,1,1-bis(p-hydroxyphenyl)-ethyl)α,α-dimethylbenzyl) Phenol) (hereinafter referred to as phenol compound (PA1)) is obtained by reacting with an epihalohydrin. The epoxy resin of the present invention is as shown in the following representative structure.

(式中,n表示0至2的正數) (where n represents a positive number from 0 to 2)

本發明之環氧樹脂,一般可取得如TECMO REVG3101L(Printec製)、NC-6300C(日本化藥製)、NC-6300H(日本化藥製)等,惟利用以下的製造法也可製得通式(1)的化合物。 The epoxy resin of the present invention can be obtained by, for example, TECMO REVG3101L (manufactured by Printec), NC-6300C (manufactured by Nippon Kasei Co., Ltd.), and NC-6300H (manufactured by Nippon Kayaku Co., Ltd.), but can also be obtained by the following manufacturing methods. a compound of formula (1).

又,本發明所使用的環氧樹脂(a)更佳為在常溫為固體者。於本發明中,通常使用軟化點為50至100℃、或熔點為50至190℃的環氧樹脂(a),較佳為軟化點為60至100℃、或熔點為60至190℃者。又,於本發明中,通常可使用環氧當量為130至500g/eq.者,較佳為150至400g/eq.,更佳為170至300g/eq.。當環氧當量過小時,容易變硬、變脆的傾向較強,環氧當量過大時,難以顯現硬度、玻璃轉移點會變低。 Further, the epoxy resin (a) used in the present invention is more preferably a solid at normal temperature. In the present invention, an epoxy resin (a) having a softening point of 50 to 100 ° C or a melting point of 50 to 190 ° C is usually used, preferably having a softening point of 60 to 100 ° C or a melting point of 60 to 190 ° C. Further, in the present invention, an epoxy equivalent of from 130 to 500 g/eq., preferably from 150 to 400 g/eq., more preferably from 170 to 300 g/eq., can be used. When the epoxy equivalent is too small, the tendency to become hard and become brittle is strong, and when the epoxy equivalent is too large, hardness is hard to be formed and the glass transition point is lowered.

於酚化合物(PA1)與表鹵醇的反應中所使用的表鹵醇,可列舉:表氯醇、α-甲基表氯醇、γ-甲基表氯醇、表溴醇等,於本發明中較佳為工業上較容易取得的表氯醇。表鹵醇的使用量係相對於酚化合物(PA1)的羥基1莫耳,而通常為2至15莫耳,較佳為4至10莫耳。使用 過量的表鹵醇時,不僅生產性不佳,所製造的環氧樹脂之軟化點亦變低,對作成預浸物(prepreg)時的黏性等無法造成有益的影響。又,表鹵醇的量未達2莫耳時,n的值變大,在製造中會變得容易皂化。 Examples of the epihalohydrin used in the reaction of the phenol compound (PA1) with an epihalohydrin include epichlorohydrin, α-methylepichlorohydrin, γ-methylepichlorohydrin, and epibromohydrin. In the invention, epichlorohydrin which is industrially easy to obtain is preferred. The epihalohydrin is used in an amount of 1 mol with respect to the hydroxyl group of the phenol compound (PA1), and is usually 2 to 15 mol, preferably 4 to 10 mol. use In the case of an excessive amount of epihalohydrin, not only the productivity is poor, but also the softening point of the epoxy resin to be produced is low, which does not have a beneficial effect on the viscosity at the time of making a prepreg. Further, when the amount of epihalohydrin is less than 2 mol, the value of n becomes large, and it becomes easy to be saponified during production.

於上述環氧化反應中,以使用鹼金屬氫氧化物為較佳。該鹼金屬氫氧化物,可列舉氫氧化鈉、氫氧化鉀等。此外,鹼金屬氫氧化物可使用固形物,亦可使用其水溶液。例如,在以水溶液之形式使用鹼金屬氫氧化物時,係可藉由將鹼金屬氫氧化物的水溶液連續地添加至反應系統內,且同時在減壓下或常壓下連續地使水及表鹵醇餾去,再進行分液並去除水,使表鹵醇連續地返回至反應系統內之方法,而進行環氧化反應。此外,當使用固形時,由其處理容易性、溶解性等問題來看,以使用片狀物為較佳。鹼金屬氫氧化物的使用量係相對於酚化合物(PA1)的羥基1莫耳,而通常為0.90至1.5莫耳,較佳為1.01至1.25莫耳,更佳為1.01至1.15莫耳。 In the above epoxidation reaction, an alkali metal hydroxide is preferably used. Examples of the alkali metal hydroxide include sodium hydroxide, potassium hydroxide and the like. Further, as the alkali metal hydroxide, a solid matter may be used, and an aqueous solution thereof may also be used. For example, when an alkali metal hydroxide is used in the form of an aqueous solution, water can be continuously added to the reaction system by continuously adding an aqueous solution of an alkali metal hydroxide to the reaction system under reduced pressure or under normal pressure. The epoxidation reaction is carried out by distilling off the epihalohydrin and further separating the liquid and removing the water to continuously return the epihalohydrin to the reaction system. Further, when a solid form is used, it is preferable to use a sheet material from the viewpoints of ease of handling, solubility, and the like. The alkali metal hydroxide is used in an amount of from 1 to 0.9 moles, preferably from 1.01 to 1.25 moles, more preferably from 1.01 to 1.15 moles, per mole of the hydroxyl group of the phenol compound (PA1).

上述環氧化反應中,為了促進反應,亦可將氯化四甲基銨、溴化四甲基銨、氯化三甲基苯甲基銨等4級銨鹽,或氯化四甲基鏻、溴化四甲基鏻、氯化三甲基苯甲基鏻、氯化三苯基苯甲基鏻、溴化三苯基乙基鏻等4級鏻鹽作為觸媒來添加。該等4級鹽的使用量係相對於酚化合物(PA1)的羥基1莫耳,而通常為0.1至15g,較佳為0.2至10g。 In the above epoxidation reaction, in order to promote the reaction, a tetra-ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide or trimethylbenzylammonium chloride may be used, or tetramethylguanidine chloride may be used. A quaternary phosphonium salt such as tetramethylguanidinium bromide, trimethylbenzylhydrazine chloride, triphenylbenzylhydrazine chloride or triphenylethylphosphonium bromide is added as a catalyst. These 4-stage salts are used in an amount of from 1 to 15 g, preferably from 0.2 to 10 g, per 1 mol of the hydroxyl group of the phenol compound (PA1).

上述環氧化反應中,就反應進行方面而 言,以添加甲醇、乙醇、異丙等醇類,四氫呋喃、二烷等醚類,二甲基碸、二甲基亞碸、二甲基咪唑啶酮等非質子性極性溶劑等來進行反應為較佳,特別以其光學特性來看,在本發明中以使用醇類及/或醚類為較佳。 In the above epoxidation reaction, in terms of reaction progress, an alcohol such as methanol, ethanol or isopropyl, tetrahydrofuran or the like is added. It is preferred to carry out the reaction, such as an ether such as an alkane, an aprotic polar solvent such as dimethylhydrazine, dimethyl hydrazine or dimethylimidazolidone, and the like, particularly in terms of optical properties thereof, in the present invention. Alcohols and/or ethers are preferred.

使用上述醇類或醚類時,其使用量相對於表鹵醇的使用量,通常為2至50質量%,較佳為4至20質量%。另一方面,使用上述非質子性極性溶劑時,其使用量相對於表鹵醇的使用量,通常為5至100質量%,較佳為10至80質量%。 When the above alcohol or ether is used, it is usually used in an amount of from 2 to 50% by mass, preferably from 4 to 20% by mass, based on the amount of the epihalohydrin used. On the other hand, when the above aprotic polar solvent is used, it is usually used in an amount of 5 to 100% by mass, preferably 10 to 80% by mass based on the amount of the epihalohydrin used.

上述環氧化反應中,反應溫度通常為30至90℃,較佳為35至80℃。另一方面,反應時間通常為0.5至10小時,較佳為1至8小時。本發明之反應在常壓或減壓下進行皆無妨,在減壓條件下以水-表鹵醇的共沸脫水條件進行反應亦無妨。該等環氧化反應的反應物,可藉由在水洗後或未水洗就在加熱減壓下去除表鹵醇、溶劑等而精製。又,為了製成水解性鹵素較少的環氧樹脂,較佳係將所回收的反應物溶解於甲苯、甲基異丁基酮等溶劑中,並加入氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物的水溶液,以進行副生成物的閉環反應,使屬於副生成物的鹵醇之閉環更確實。 In the above epoxidation reaction, the reaction temperature is usually from 30 to 90 ° C, preferably from 35 to 80 ° C. On the other hand, the reaction time is usually from 0.5 to 10 hours, preferably from 1 to 8 hours. The reaction of the present invention may be carried out under normal pressure or reduced pressure, and it is also possible to carry out the reaction under a reduced pressure condition under azeotropic dehydration conditions of water-epihalohydrin. The reactant of the epoxidation reaction can be purified by removing epihalohydrin, a solvent or the like under heating and reduced pressure after washing with water or without washing. Further, in order to form an epoxy resin having less hydrolyzable halogen, it is preferred to dissolve the recovered reactant in a solvent such as toluene or methyl isobutyl ketone, and to add an alkali metal such as sodium hydroxide or potassium hydroxide. The aqueous solution of the hydroxide is subjected to a ring closure reaction of the by-product to make the ring closure of the halogenated alcohol belonging to the by-product more reliable.

此時,鹼金屬氫氧化物的使用量相對於環氧化時使用之酚化合物(PA1)的羥基1莫耳,通常為0.01至0.3莫耳,較佳為0.05至0.2莫耳。又,反應溫度通常為50至120℃,反應時間通常為0.5至2小時。 At this time, the alkali metal hydroxide is used in an amount of usually 0.01 to 0.3 mol, preferably 0.05 to 0.2 mol, based on the hydroxyl group of the phenol compound (PA1) used in the epoxidation. Further, the reaction temperature is usually from 50 to 120 ° C, and the reaction time is usually from 0.5 to 2 hours.

上述環氧化反應中,在反應結束後,將所生成的鹽以過濾、水洗等而去除,繼而在加熱減壓下餾去溶劑,而可得到能使用於本發明之環氧樹脂。依如此的方式所得之環氧樹脂,還包括一部分藉由其溶劑或水而加成有環氧樹脂者、或無法完全閉環而殘存有鹵素者。 In the epoxidation reaction, after the completion of the reaction, the produced salt is removed by filtration, washing with water, or the like, and then the solvent is distilled off under heating and reduced pressure to obtain an epoxy resin which can be used in the present invention. The epoxy resin obtained in such a manner also includes a part in which an epoxy resin is added by a solvent or water, or a halogen is not completely closed and a halogen remains.

依如此的方式所得之作為酚化合物(PA1)與表鹵醇的反應生成物之環氧樹脂(a),較佳係生產性及處理性優異且進而滿足賦予硬化物高機械強度之以下任一項條件者。 The epoxy resin (a) which is a reaction product of a phenol compound (PA1) and an epihalohydrin obtained in such a manner is preferably excellent in productivity and handleability, and further satisfies any of the following to impart high mechanical strength to the cured product. Subject condition.

1.環氧當量較佳為195至245g/eq.,更佳為200至240g/eq.。 1. The epoxy equivalent is preferably from 195 to 245 g/eq., more preferably from 200 to 240 g/eq.

2.在凝膠滲透層析儀中,酚化合物(PA1)彼此藉由表鹵醇而連接2個者係占30面積%以下,連接3個者係占20面積%以下,更佳為連接2個者係占25面積%以下,連接3個者係占15面積%以下。剩餘的則為環氧樹脂(a)的單體。 2. In the gel permeation chromatograph, the phenolic compound (PA1) is connected to each other by epihalohydrin, and the two are 30% by area or less, and the three are connected to 20% by area or less, more preferably 2 The number of individuals is 25 area% or less, and the number of connections is 3 area% or less. The remainder is the monomer of epoxy resin (a).

本發明中,一分子中具有1個以上的可聚合之乙烯性不飽和基與1個以上的羧基之化合物(b),係用以賦予對活性能量線的反應性而反應者。乙烯性不飽和基與羧基只要分別於分子內具有一個以上就無限制。該等可列舉單羧酸化合物、多元羧酸化合物。 In the present invention, the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule is used to provide reactivity to the active energy ray. The ethylenically unsaturated group and the carboxyl group are not limited as long as they have one or more groups in the molecule. These may be mentioned as a monocarboxylic acid compound or a polyvalent carboxylic acid compound.

一分子中具有一個羧基之單羧酸化合物,可列舉例如:(甲基)丙烯酸類或巴豆酸、α-氰基桂皮酸、桂皮酸、或是飽和或不飽和二元酸與含不飽和基的單縮水甘油基化合物之反應物。上述中,(甲基)丙烯酸類可列舉例如:(甲基)丙烯酸、β-苯乙烯基丙烯酸、β-糠基丙烯酸、(甲基) 丙烯酸二聚物、作為飽和或不飽和二元酸酐與1分子中具有1個羥基之(甲基)丙烯酸衍生物等莫耳反應物的半酯類、作為飽和或不飽和二元酸與(甲基)丙烯酸單縮水甘油酯衍生物類之等莫耳反應物的半酯類等。 The monocarboxylic acid compound having one carboxyl group in one molecule may, for example, be (meth)acrylic acid or crotonic acid, α-cyanocinnamic acid, cinnamic acid, or a saturated or unsaturated dibasic acid and an unsaturated group. The reactant of the monoglycidyl compound. In the above, examples of the (meth)acrylic acid include (meth)acrylic acid, β-styrylacrylic acid, β-mercaptoacrylic acid, and (methyl). An acrylic acid dimer, a half ester of a molar reactant such as a saturated or unsaturated dibasic acid anhydride and a (meth)acrylic acid derivative having one hydroxyl group in one molecule, as a saturated or unsaturated dibasic acid and A half ester of a molar reactant such as an acrylic monoglycidyl ester derivative.

繼而,一分子中具有二個以上的羧基之多元羧酸化合物,可列舉:作為飽和或不飽和二元酸酐與一分子中具有複數個羥基之(甲基)丙烯酸酯衍生物的等莫耳反應物的半酯類、作為飽和或不飽和二元酸與具有複數個環氧基的(甲基)丙烯酸縮水甘油酯衍生物類之等莫耳反應物的半酯類等。 Further, a polycarboxylic acid compound having two or more carboxyl groups in one molecule may, for example, be a molar reaction of a saturated or unsaturated dibasic acid anhydride with a (meth) acrylate derivative having a plurality of hydroxyl groups in one molecule. a half ester of a substance, a half ester of a molar reactant such as a saturated or unsaturated dibasic acid and a glycidyl (meth)acrylate derivative having a plurality of epoxy groups.

該等之中,就形成活性能量線硬化型樹脂組成物時的靈敏度方面而言,最佳者可列舉為:(甲基)丙烯酸;(甲基)丙烯酸與ε-己內酯的反應生成物;或桂皮酸。化合物(b)較佳為於化合物中不具有羥基者。 Among these, in terms of sensitivity in forming an active energy ray-curable resin composition, the most preferable ones are (meth)acrylic acid; a reaction product of (meth)acrylic acid and ε-caprolactone. Or cinnamic acid. The compound (b) is preferably one which does not have a hydroxyl group in the compound.

本發明中,視需要所使用之一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c),係以於羧酸酯化合物中導入羥基為目的而反應者。 In the present invention, the compound (c) having at least two or more hydroxyl groups and one or more carboxyl groups in one of the molecules used as needed is a reaction for the purpose of introducing a hydroxyl group into the carboxylate compound.

本發明中,一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的具體例,可列舉例如:二羥甲基丙酸、二羥甲基丁酸、二羥甲基乙酸、二羥甲基戊酸、二羥甲基己酸等含多元羥基的單羧酸類等。特佳者可列舉例如二羥甲基丙酸等。 In the present invention, specific examples of the compound (c) having at least two or more hydroxyl groups and one or more carboxyl groups in one molecule include dimethylolpropionic acid, dimethylolbutanoic acid, and dimethylol group. A monocarboxylic acid containing a polyvalent hydroxyl group such as acetic acid, dimethylol valeric acid or dihydroxymethylhexanoic acid. As a particularly preferable one, dimethylolpropionic acid etc. are mentioned.

該等之中,考量到前述環氧樹脂(a)與化合物(b)及化合物(c)的反應的安定性時,化合物(b)及化合物(c) 較佳為單羧酸,即使在併用單羧酸與多元羧酸時,單羧酸的總合計莫耳量/多元羧酸的總合計莫耳量所表示之值較佳為15以上。 Among these, when considering the stability of the reaction of the epoxy resin (a) with the compound (b) and the compound (c), the compound (b) and the compound (c) The monocarboxylic acid is preferably a combination of a monocarboxylic acid and a polycarboxylic acid, and the total amount of the monocarboxylic acid and the total amount of the polycarboxylic acid are preferably 15 or more.

該反應中,環氧樹脂(a)與化合物(b)及視需要所使用的化合物(c)之羧酸總合計的添加比率,應視用途而適當改變。亦即,將全部環氧基予以羧酸酯化時,因不殘存未反應的環氧基,故作為反應性環氧基羧酸酯化合物的保存安定性高。此時,只會利用到由所導入的雙鍵所致的反應性。 In the reaction, the addition ratio of the total of the carboxylic acid of the epoxy resin (a) to the compound (b) and, if necessary, the compound (c), is appropriately changed depending on the use. In other words, when all the epoxy groups are carboxylic acid esterified, since the unreacted epoxy group does not remain, the storage stability of the reactive epoxy carboxylic acid ester compound is high. At this time, only the reactivity due to the introduced double bond is utilized.

另一方面,藉由刻意去減量羧酸化合物的添加量並留下未反應的殘存環氧基,即可複合性地利用由所導入的不飽和鍵所致的反應性與由殘存的環氧基所致的反應,例如由光陽離子觸媒所致的聚合反應及熱聚合反應。然而,此時應留意檢討反應性環氧基羧酸酯化合物(E)的保存及製造條件。 On the other hand, by deliberately reducing the amount of the carboxylic acid compound added and leaving the unreacted residual epoxy group, the reactivity due to the introduced unsaturated bond and the residual epoxy can be utilized in combination. The reaction caused by the group, for example, a polymerization reaction and a thermal polymerization reaction by a photocationic catalyst. However, at this time, attention should be paid to reviewing the storage and production conditions of the reactive epoxy carboxylic acid ester compound (E).

製造不殘存環氧基的反應性環氧基羧酸酯化合物(E)時,化合物(b)及視需要所使用之化合物(c)的總合計,相對於前述環氧樹脂(a)1當量,較佳為90至120當量%。只要位於此範圍就可以較安定的條件進行製造。當化合物(b)及視需要所使用之化合物(c)的總添加量較前述範圍還多時,會殘存過量的化合物(b)及化合物(c),而較為不佳。 When the reactive epoxy carboxylic acid ester compound (E) which does not retain an epoxy group is produced, the total of the compound (b) and the compound (c) used as needed is 1 equivalent to the epoxy resin (a). It is preferably from 90 to 120 equivalent%. As long as it is within this range, it can be manufactured under relatively stable conditions. When the total amount of the compound (b) and the compound (c) to be used as required is more than the above range, the excess of the compound (b) and the compound (c) remains, which is not preferable.

又,刻意使環氧基殘留時,化合物(b)及視需要所使用之化合物(c)的總合計,相較於前述環氧樹脂(a)1當量,較佳為20至90當量%。若超出此範圍,就不 會充分進行更進一步的由環氧基所致的反應。此時,必需充分留意反應中的皂化、反應性環氧基羧酸酯化合物(E)的歷時安定性。 Further, when the epoxy group is deliberately left, the total of the compound (b) and, if necessary, the compound (c) is preferably 20 to 90 equivalent % based on 1 equivalent of the epoxy resin (a). If it is outside this range, it will not Further, the reaction caused by the epoxy group is sufficiently carried out. At this time, it is necessary to sufficiently pay attention to the saponification during the reaction and the stability of the reactive epoxy carboxylic acid ester compound (E).

使用化合物(b)與化合物(c)時的使用比例,相對於羧酸的莫耳比,化合物(b):化合物(c)為95:5至5:95,繼而較佳為95:5至40:60的範圍。只要位於此範圍,對活性能量線的敏感度就會良好,且可導入充分的羥基以使反應性環氧基羧酸酯化合物(E)與多元酸酐(d)反應。 The ratio of use of the compound (b) to the compound (c) is, relative to the molar ratio of the carboxylic acid, the compound (b): the compound (c) is 95:5 to 5:95, and then preferably 95:5 to 40:60 range. As long as it is in this range, the sensitivity to the active energy ray is good, and a sufficient hydroxyl group can be introduced to react the reactive epoxy carboxylic acid ester compound (E) with the polybasic acid anhydride (d).

羧酸酯化反應可於無溶劑下進行反應,或可使用溶劑加以稀釋而進行反應。在此,可使用的溶劑只要是對於羧酸酯化反應為惰性的溶劑者就無特別限定。 The carboxylic acid esterification reaction can be carried out without a solvent, or can be carried out by diluting with a solvent. Here, the solvent which can be used is not particularly limited as long as it is a solvent inert to the carboxylic acid esterification reaction.

較佳的溶劑使用量應視所得之樹脂的黏度或用途而適當調整,惟較佳為相對於固形份100質量份而以使其為90至30質量份,更佳為80至50質量份的方式使用。 The amount of the solvent to be used is preferably adjusted depending on the viscosity or use of the obtained resin, but it is preferably from 90 to 30 parts by mass, more preferably from 80 to 50 parts by mass, per 100 parts by mass of the solid part. Way to use.

若具體地列示,可列舉例如:甲苯、二甲苯、乙基苯、四甲基苯等芳香族系烴溶劑;己烷、辛烷、癸烷等脂肪族系烴溶劑;及屬於該等的混合物之石油醚、白汽油(white gasoline)、溶劑石油腦(solvent naphtha)等、酯系溶劑、醚系溶劑、酮系溶劑等。 Specific examples thereof include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene; aliphatic hydrocarbon solvents such as hexane, octane, and decane; and the like. Petroleum ether, white gasoline, solvent naphtha, etc., ester solvent, ether solvent, ketone solvent, and the like.

酯系溶劑可列舉:乙酸乙酯、乙酸丙酯、乙酸丁酯等乙酸烷基酯類;γ-丁內酯等環狀酯類、乙二醇單甲基醚乙酸酯、二乙二醇單甲基醚單乙酸酯、二乙二醇單乙基醚單乙酸酯、三乙二醇單乙基醚單乙酸酯、二乙二 醇單丁基醚單乙酸酯、丙二醇單甲基醚乙酸酯、丁二醇單甲基醚乙酸酯等單或聚烷二醇單烷基醚單乙酸酯類;戊二酸二烷基酯、丁二酸二烷基酯、己二酸二烷基酯等多元羧酸烷基酯類等。 Examples of the ester solvent include alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate; cyclic esters such as γ-butyrolactone; ethylene glycol monomethyl ether acetate; and diethylene glycol. Monomethyl ether monoacetate, diethylene glycol monoethyl ether monoacetate, triethylene glycol monoethyl ether monoacetate, diethylene Mono- or polyalkylene glycol monoalkyl ether monoacetate such as alcohol monobutyl ether monoacetate, propylene glycol monomethyl ether acetate, butanediol monomethyl ether acetate; glutaric acid dioxane A polyvalent alkyl carboxylate such as a base ester, a dialkyl succinate or a dialkyl adipate.

醚系溶劑可列舉:二乙基醚、乙基丁基醚等烷基醚類;乙二醇二甲基醚、乙二醇二乙基醚、二丙二醇二甲基醚、二丙二醇二乙基醚、三乙二醇二甲基醚、三乙二醇二乙基醚等二醇醚類;四氫呋喃等環狀醚類等。 Examples of the ether solvent include alkyl ethers such as diethyl ether and ethyl butyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, and dipropylene glycol diethyl ether. a glycol ether such as ether, triethylene glycol dimethyl ether or triethylene glycol diethyl ether; or a cyclic ether such as tetrahydrofuran.

酮系溶劑可列舉:丙酮、甲基乙基酮、甲基丙基酮、甲基異丁基酮、環己酮、異佛酮等。 Examples of the ketone solvent include acetone, methyl ethyl ketone, methyl propyl ketone, methyl isobutyl ketone, cyclohexanone, and isophorone.

除此之外,亦可在後述的其他反應性化合物(B)等的單獨或混合的有機溶劑中進行。此時,使用作為硬化性組成物時可直接利用作為組成物,因而較佳。 In addition, it can also be carried out in a single or mixed organic solvent such as the other reactive compound (B) to be described later. In this case, when it is used as a curable composition, it can be used as a composition as it is, and it is preferable.

反應時為了促進反應,以使用觸媒為較佳,該觸媒的使用量相對於反應物(亦即環氧樹脂(a)、羧酸化合物(b)、視需要所使用之化合物(c)及視情況而添加之溶劑等的反應物)的總量100質量份,通常為0.1至10質量份。此時的反應溫度通常為60至150℃,且反應時間較佳為5至60小時。可使用的觸媒之具體例,可列舉例如:三乙基胺、苯甲基二甲基胺、氯化三乙基銨、溴化苯甲基三甲基銨、碘化苯甲基三甲基銨、三苯基膦、三苯基氫化銻、甲基三苯基氫化銻、辛酸鉻、辛酸鋯等已知的一般鹼性觸媒等。 In order to promote the reaction during the reaction, it is preferred to use a catalyst, and the amount of the catalyst used is relative to the reactant (that is, the epoxy resin (a), the carboxylic acid compound (b), and the compound (c) used as needed. The total amount of the reactants, such as a solvent added as the case may be, is usually 0.1 to 10 parts by mass. The reaction temperature at this time is usually from 60 to 150 ° C, and the reaction time is preferably from 5 to 60 hours. Specific examples of the catalyst which can be used include, for example, triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethyl iodide. Known general alkaline catalysts such as ammonium amide, triphenylphosphine, triphenylphosphonium hydride, methyltriphenylhydrogen hydride, chromium octoate, and zirconium octylate.

又,熱聚合抑制劑係以使用氫醌單甲基 醚、2-甲基氫醌、氫醌、二苯基苦味基聯胺(diphenylpicrylhydrazine)、二苯基胺、3,5-二-第三丁基-4-羥基甲苯等為較佳。 In addition, the thermal polymerization inhibitor uses hydroquinone monomethyl Ether, 2-methylhydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-di-t-butyl-4-hydroxytoluene or the like is preferred.

本反應係在進行適當抽樣的情況下,以樣本的酸價達到5mg.KOH/g以下,較佳為3mg.KOH/g以下時的時間點作為終點。 This reaction is based on the appropriate sampling, the acid value of the sample reaches 5mg. Below KOH/g, preferably 3 mg. The time point when KOH/g or less is used as the end point.

如此所得之反應性環氧基羧酸酯化合物(E)之較佳的分子量範圍,係經GPC測定之聚苯乙烯換算重量平均分子量為1,000至50,000的範圍,更佳為2,000至30,000。 The preferred molecular weight range of the reactive epoxy oxy carboxylate compound (E) thus obtained is a polystyrene-equivalent weight average molecular weight measured by GPC of from 1,000 to 50,000, more preferably from 2,000 to 30,000.

在小於此分子量時,硬化物的強靭性未充分發揮,而大於此時,黏度變高而使塗怖等變困難。 When the molecular weight is less than this, the toughness of the cured product is not sufficiently exerted, and when it is larger than this, the viscosity becomes high and the coating is difficult to be formed.

其次,詳述酸加成步驟。酸加成步驟係以將羧基導入至前步驟所得之反應性環氧基羧酸酯化合物(E)中並得到反應性多元羧酸化合物(A)為目的而進行。亦即,使羧酸酯化反應所產生的羥基與多元酸酐(d)進行加成反應,藉此經由酯鍵而導入羧基。 Next, the acid addition step will be described in detail. The acid addition step is carried out for the purpose of introducing a carboxyl group into the reactive epoxy carboxylic acid ester compound (E) obtained in the previous step and obtaining the reactive polycarboxylic acid compound (A). In other words, the hydroxyl group generated by the carboxylic acid esterification reaction is subjected to an addition reaction with the polybasic acid anhydride (d), whereby a carboxyl group is introduced via an ester bond.

多元酸酐(d)的具體例,只要是例如分子中具有酸酐結構的化合物均可使用,較佳係鹼性水溶液顯像性、耐熱性、水解耐性等優異之丁二酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、衣康酸酐、3-甲基-四氫鄰苯二甲酸酐、4-甲基-六氫鄰苯二甲酸酐、偏苯三甲酸酐或順丁烯二酸酐。 Specific examples of the polybasic acid anhydride (d) include, for example, a compound having an acid anhydride structure in a molecule, and are preferably succinic anhydride or phthalic anhydride excellent in alkali aqueous solution developability, heat resistance, and hydrolysis resistance. , tetrahydrophthalic anhydride, hexahydrophthalic anhydride, itaconic anhydride, 3-methyl-tetrahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, trimellitic acid Anhydride or maleic anhydride.

使多元酸酐(d)加成的反應,可藉由在前述 羧酸酯化反應液中添加多元酸酐(d)來進行。添加量應視用途作適當變更。 The reaction of adding the polybasic acid anhydride (d) can be carried out by the aforementioned The polycarboxylic acid anhydride (d) is added to the carboxylic acid esterification reaction liquid. The amount added should be changed as appropriate.

多元酸酐(d)的添加量,例如在欲將本發明的反應性多元羧酸化合物(A)作為鹼性顯像型光阻使用時,較佳係以使最終所得之反應性多元羧酸化合物(A)的固形份酸價(根據JISK5601-2-1:1999)成為40至120mg.KOH/g,更佳為成為60至120mg.KOH/g的計算值之方式來添加多元酸酐(d)。此時的固形份酸價若位於此範圍時,本發明之感光性樹脂組成物的鹼性水溶液顯像性會顯示良好的顯像性。亦即,對良好的圖案化性與過度顯像之管理範圍亦廣,且不會殘留過量的酸酐。 When the amount of the polybasic acid anhydride (d) to be added is, for example, when the reactive polycarboxylic acid compound (A) of the present invention is to be used as a basic development type photoresist, it is preferred to obtain the finally obtained reactive polycarboxylic acid compound. The solid acid value of (A) (according to JIS K5601-2-1:1999) is 40 to 120 mg. KOH / g, more preferably 60 to 120 mg. The polybasic acid anhydride (d) is added in such a manner as to calculate the KOH/g. When the solid acid value at this time is in this range, the photosensitive aqueous solution of the photosensitive resin composition of the present invention exhibits good developability. That is, the management of good patterning and over-exposure is also wide, and excess acid anhydride does not remain.

反應時為了促進反應,以使用觸媒為較佳,該觸媒的使用量,相對於反應物(亦即由環氧化合物(a)、羧酸化合物(b)、視需要使用之化合物(c)所得之反應性環氧基羧酸酯化合物(E)、及多元酸酐(d)、視情況而添加之溶劑等的反應物)之總量100質量份,通常為0.1至10質量份。此時的反應溫度通常為60至150℃,且反應時間較佳為5至60小時。可使用的觸媒之具體例,可列舉例如:三乙基胺、苯甲基二甲基胺、氯化三乙基銨、溴化苯甲基三甲基銨、碘化苯甲基三甲基銨、三苯基膦、三苯基氫化銻、甲基三苯基氫化銻、辛酸鉻、辛酸鋯等。 In order to promote the reaction during the reaction, it is preferred to use a catalyst, and the amount of the catalyst used is relative to the reactant (that is, the epoxy compound (a), the carboxylic acid compound (b), and the compound to be used as needed (c). The total amount of the obtained reactive epoxy carboxylic acid ester compound (E) and the polybasic acid anhydride (d), and a solvent to be added as the case may be 100 parts by mass, usually 0.1 to 10 parts by mass. The reaction temperature at this time is usually from 60 to 150 ° C, and the reaction time is preferably from 5 to 60 hours. Specific examples of the catalyst which can be used include, for example, triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethyl iodide. Alkyl ammonium, triphenylphosphine, triphenylhydroquinone, methyltriphenylhydrogen hydride, chromium octoate, zirconium octoate, and the like.

本發明之酸加成反應可於無溶劑下進行反應,或可利用溶劑加以稀釋而進行反應。在此,可使用的溶劑,只要是對於酸加成反應為惰性溶劑者就無特別限 定。又,在作為前步驟之羧酸酯化反應中使用溶劑進行製造時,亦能以對該兩反應為惰性為條件,不去除溶劑就直接供應至作為後續步驟之酸加成反應。可使用的溶劑係與羧酸酯化反應中可使用者為相同者。 The acid addition reaction of the present invention can be carried out without a solvent, or can be carried out by diluting with a solvent. Here, the solvent which can be used is not particularly limited as long as it is an inert solvent for the acid addition reaction. set. Further, when it is produced by using a solvent in the carboxylic acid esterification reaction as the preceding step, the acid addition reaction can be directly supplied to the subsequent step without removing the solvent on the condition that the reaction is inert. The solvent which can be used is the same as that which can be used by the user in the esterification reaction of the carboxylic acid.

較佳的溶劑使用量應視所得之樹脂的黏度或用途作適當調整,惟較佳係以相對於固形份100質量份而使其成為90至30質量份,更佳係成為80至50質量份的方式使用。 The amount of the solvent to be used is preferably adjusted depending on the viscosity or use of the obtained resin, but it is preferably 90 to 30 parts by mass, more preferably 80 to 50 parts by mass, per 100 parts by mass of the solid portion. The way to use.

除此之外,亦可在後述的反應性化合物(B)等的單獨或混合的有機溶劑中進行。此時,以硬化性組成物之形式使用時,因可直接作為組成物使用而為較佳。 In addition, it can also be carried out in a single or mixed organic solvent such as the reactive compound (B) to be described later. In this case, when it is used in the form of a curable composition, it is preferably used as a composition.

又,熱聚合抑制劑等較佳係使用與在前述羧酸酯化反應中所列示同樣者。 Further, a thermal polymerization inhibitor or the like is preferably used in the same manner as listed in the above-mentioned carboxylic acid esterification reaction.

本反應係在進行適當抽樣的情況下,以反應物的酸價成為設定的酸價之正負10%的範圍之點作為終點。 In the case of performing the appropriate sampling, the reaction is based on the point that the acid value of the reactant is within a range of plus or minus 10% of the set acid value.

反應性多元羧酸化合物(A)之較佳的分子量範圍,係經GPC測定之聚苯乙烯換算重量平均分子量為500至50,000的範圍,更佳為1,000至20,000。 The preferred molecular weight range of the reactive polycarboxylic acid compound (A) is a polystyrene-equivalent weight average molecular weight measured by GPC of from 500 to 50,000, more preferably from 1,000 to 20,000.

反應性多元羧酸化合物(A)在該樹脂組成物中的使用比率為5至70質量%,較佳為10至65質量%。 The use ratio of the reactive polycarboxylic acid compound (A) in the resin composition is from 5 to 70% by mass, preferably from 10 to 65% by mass.

於本發明中可使用的反應性化合物(B),可列舉:自由基反應型的丙烯酸酯類、陽離子反應型之其他環氧化合物類、感應該兩者的乙烯基系化合物類等所謂的 反應性低聚物類。 The reactive compound (B) which can be used in the present invention includes so-called radical-reactive acrylates, cationically reactive other epoxy compounds, and vinyl compounds which induce the two. Reactive oligomers.

自由基反應型的丙烯酸酯類,可列舉例如:單官能(甲基)丙烯酸酯、2官能(甲基)丙烯酸酯、3官能以上的(甲基)丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯低聚物(urethane(meth)acrylate oligomer)、聚酯(甲基)丙烯酸酯低聚物、環氧基(甲基)丙烯酸酯低聚物等。 Examples of the radical-reactive acrylates include monofunctional (meth) acrylates, bifunctional (meth) acrylates, trifunctional or higher (meth) acrylates, and urethanes (methyl groups). ) urethane (meth) acrylate oligomer, polyester (meth) acrylate oligomer, epoxy (meth) acrylate oligomer, and the like.

單官能(甲基)丙烯酸酯,可列舉例如:丙烯醯基嗎啉(acryloylmorpholine);(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯等含羥基的(甲基)丙烯酸酯;環己烷-1,4-二甲醇單(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯基氧基乙酯等脂肪族(甲基)丙烯酸酯;(甲基)丙烯酸苯氧基乙酯、(聚)乙氧基(甲基)丙烯酸苯酯、(甲基)丙烯酸對異丙苯基苯氧基乙酯、(甲基)丙烯酸三溴苯基氧基乙酯、(甲基)丙烯酸苯基硫基乙酯、(甲基)丙烯酸2-羥基-3-苯基氧基丙酯、苯基酚(聚)乙氧基(甲基)丙烯酸酯、苯基酚環氧基(甲基)丙烯酸酯等芳香族(甲基)丙烯酸酯。 The monofunctional (meth) acrylate may, for example, be acryloylmorpholine; 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, or (meth)acrylic acid 4 Hydroxy-containing (meth) acrylate such as hydroxybutyl ester; cyclohexane-1,4-dimethanol mono(meth) acrylate, tetrahydrofurfuryl (meth) acrylate, isophthalic acid (meth) acrylate An aliphatic (meth) acrylate such as ester, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate or dicyclopentenyloxyethyl (meth) acrylate; Phenyloxyethyl acrylate, phenyl (poly)ethoxy (meth) acrylate, p-cumyl phenoxyethyl (meth) acrylate, tribromophenyloxy (meth) acrylate Ester, phenylthioethyl (meth)acrylate, 2-hydroxy-3-phenyloxypropyl (meth)acrylate, phenylphenol (poly)ethoxy (meth) acrylate, phenyl An aromatic (meth) acrylate such as a phenol epoxy (meth) acrylate.

2官能(甲基)丙烯酸酯,可列舉:1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、三環癸烷二甲醇(甲基)丙烯酸酯、雙酚A(聚)乙氧基二(甲基)丙烯酸酯、雙酚A(聚)丙氧基二(甲基)丙烯酸酯、雙酚F(聚)乙氧基二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸 酯、羥基三甲基乙酸新戊二醇的ε-己內醇加成物之二(甲基)丙烯酸酯(例如、日本化藥股份有限公司製之KAYARAD HX-220、HX-620等)等。 Examples of the bifunctional (meth) acrylate include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, and 1,9-nonanediol II. (Meth) acrylate, tricyclodecane dimethanol (meth) acrylate, bisphenol A (poly) ethoxy di(meth) acrylate, bisphenol A (poly) propoxy bis (methyl) Acrylate, bisphenol F (poly) ethoxy di(meth) acrylate, ethylene glycol di(meth) acrylate, (poly) ethylene glycol di (meth) acrylate Di(meth)acrylate of ε-caprolactone adduct of ester, hydroxytrimethylacetic acid neopentyl glycol (for example, KAYARAD HX-220, HX-620, etc., manufactured by Nippon Kayaku Co., Ltd.) .

3官能以上的多官能(甲基)丙烯酸酯,可列舉:二-三羥甲基丙烷四(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基辛烷三(甲基)丙烯酸酯、三羥甲基丙烷聚乙氧基三(甲基)丙烯酸酯、三羥甲基丙烷(聚)丙氧基三(甲基)丙烯酸酯、三羥甲基丙烷(聚)乙氧基(聚)丙氧基三(甲基)丙烯酸酯等羥甲基類;新戊四醇三(甲基)丙烯酸酯、新戊四醇聚乙氧基四(甲基)丙烯酸酯、新戊四醇(聚)丙氧基四(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯等新戊四醇類;參[(甲基)丙烯醯基氧基乙基]三聚異氰酸酯、己內酯改質參[(甲基)丙烯醯基氧基乙基]三聚異氰酸酯等;丁二酸改質新戊四醇三丙烯酸酯、丁二酸改質二新戊四醇五丙烯酸酯類。 Examples of the trifunctional or higher polyfunctional (meth) acrylate include di-trimethylolpropane tetra(meth)acrylate, trimethylolpropane tri(meth)acrylate, and trimethylol octane. Tris(meth)acrylate, trimethylolpropane polyethoxy tri(meth)acrylate, trimethylolpropane (poly)propoxy tri(meth)acrylate, trimethylolpropane ( Poly) hydroxymethyl groups such as ethoxy (poly) propoxy tri(meth) acrylate; neopentyl alcohol tri(meth) acrylate, neopentyl alcohol poly ethoxy tetra (meth) acrylate Ester, neopentyl alcohol (poly) propoxy tetra (meth) acrylate, neopentyl alcohol tetra (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol Neopentyl alcohols such as penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate; ginseng [(meth)acryloyloxyethyl]trimeric isocyanate, caprolactone modification Reference to [(meth)acryloyloxyethyl]trimeric isocyanate; succinic acid modified pentaerythritol triacrylate, succinic acid modified dipentaerythritol pentaacrylate.

(聚)酯(甲基)丙烯酸酯低聚物,可列舉例如:作為乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、新戊二醇、聚乙二醇、(聚)丙二醇等二醇類,1,4-丁二醇、1,6-己二醇、1,8-辛二醇、1,9-壬二醇、2-甲基-1,8-辛二醇、3-甲基-1,5-戊二醇、2,4-二乙基-1,5-戊二醇、2-丁基-2-乙基-1,3-丙二醇等直鏈或分支烷二醇類,環己烷-1,4-二甲醇等脂環式烷二醇類,雙酚A(聚)乙氧基二醇、或雙酚A(聚)丙氧基二醇等二醇化合物與前述二元酸 或其酸酐之反應物的(聚)酯二醇,與(甲基)丙烯酸之反應物等。 Examples of the (poly)ester (meth) acrylate oligomer include ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, neopentyl glycol, and polyethylene glycol. , (poly) propylene glycol and other glycols, 1,4-butanediol, 1,6-hexanediol, 1,8-octanediol, 1,9-nonanediol, 2-methyl-1,8 -octanediol, 3-methyl-1,5-pentanediol, 2,4-diethyl-1,5-pentanediol, 2-butyl-2-ethyl-1,3-propanediol, etc. Linear or branched alkanediols, alicyclic alkanediols such as cyclohexane-1,4-dimethanol, bisphenol A (poly)ethoxy glycol, or bisphenol A (poly)propoxy a diol compound such as a diol and the aforementioned dibasic acid A (poly)ester diol of a reactant thereof or an anhydride thereof, a reaction product with (meth)acrylic acid, or the like.

胺基甲酸酯(甲基)丙烯酸酯低聚物,可列舉例如:使作為二醇化合物(例如乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,4-丁二醇、新戊二醇、1,6-己二醇、1,8-辛二醇、1,9-壬二醇、2-甲基-1,8-辛二醇、3-甲基-1,5-戊二醇、2,4-二乙基-1,5-戊二醇、2-丁基-2-乙基-1,3-丙二醇、環己烷-1,4-二甲醇、聚乙二醇、聚丙二醇、雙酚A聚乙氧基二醇、雙酚A聚丙氧基二醇等)或該等二醇化合物與二元酸或酸酐(例如丁二酸、己二酸、壬二酸、二聚酸、間苯二甲酸、對苯二甲酸、鄰苯二甲酸或該等的酸酐)之反應物的聚酯二醇,與有機聚異氰酸酯(例如四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、2,2,4-三甲基六亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯等鏈狀飽和烴異氰酸酯;異佛酮二異氰酸酯、降莰烷二異氰酸酯、二環己基甲烷二異氰酸酯、亞甲基雙(4-環己基異氰酸酯)、氫化二苯基甲烷二異氰酸酯、氫化二甲苯二異氰酸酯、氫化甲苯二異氰酸酯等環狀飽和烴異氰酸酯;2,4-伸甲苯基二異氰酸酯、1,3-伸二甲苯基二異氰酸酯、對伸苯基二異氰酸酯、3,3’-二甲基-4,4’-二異氰酸酯、6-異丙基-1,3-苯基二異氰酸酯、1,5-萘二異氰酸酯等芳香族聚異氰酸酯)反應並繼而加成含羥基的(甲基)丙烯酸酯而成之反應物等。 The urethane (meth) acrylate oligomer may, for example, be a diol compound (for example, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1, 4-butanediol, neopentyl glycol, 1,6-hexanediol, 1,8-octanediol, 1,9-nonanediol, 2-methyl-1,8-octanediol, 3- Methyl-1,5-pentanediol, 2,4-diethyl-1,5-pentanediol, 2-butyl-2-ethyl-1,3-propanediol, cyclohexane-1,4 - dimethanol, polyethylene glycol, polypropylene glycol, bisphenol A polyethoxy diol, bisphenol A polypropoxy diol, etc.) or such diol compounds with dibasic acids or anhydrides (eg succinic acid, a polyester diol of a reactant of adipic acid, sebacic acid, dimer acid, isophthalic acid, terephthalic acid, phthalic acid or such anhydrides, and an organic polyisocyanate (for example, tetramethylene Chain-like saturated hydrocarbon isocyanate such as bis-isocyanate, hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate or 2,4,4-trimethylhexamethylene diisocyanate; Carbaryl diisocyanate, norbornane diisocyanate, dicyclohexylmethane diisocyanate, methylene double ( a cyclic saturated hydrocarbon isocyanate such as 4-cyclohexyl isocyanate), hydrogenated diphenylmethane diisocyanate, hydrogenated xylene diisocyanate or hydrogenated toluene diisocyanate; 2,4-tolyl diisocyanate, 1,3-extended xylylene Aromatic esters such as isocyanate, p-phenylene diisocyanate, 3,3'-dimethyl-4,4'-diisocyanate, 6-isopropyl-1,3-phenyl diisocyanate, 1,5-naphthalene diisocyanate The reaction is carried out by reacting a polyisocyanate with a hydroxyl group-containing (meth) acrylate.

環氧基(甲基)丙烯酸酯低聚物係具有環氧 基之化合物與(甲基)丙烯酸的羧酸酯化合物。可列舉例如:酚酚醛清漆(phenol novolac)型環氧基(甲基)丙烯酸酯、甲酚酚醛清漆(cresol novolac)型環氧基(甲基)丙烯酸酯、參羥基苯基甲烷型環氧基(甲基)丙烯酸酯、二環戊二烯酚型環氧基(甲基)丙烯酸酯、雙酚A型環氧基(甲基)丙烯酸酯、雙酚F型環氧基(甲基)丙烯酸酯、聯酚型環氧基(甲基)丙烯酸酯、雙酚A酚醛清漆型環氧基(甲基)丙烯酸酯、含萘骨架的環氧基(甲基)丙烯酸酯、乙二醛型環氧基(甲基)丙烯酸酯、雜環式環氧基(甲基)丙烯酸酯等。 Epoxy (meth) acrylate oligomers have epoxy a compound of a base and a carboxylate compound of (meth)acrylic acid. For example, a phenol novolac type epoxy (meth) acrylate, a cresol novolac type epoxy (meth) acrylate, and a hydroxy phenyl methane type epoxy group may be mentioned. (Meth) acrylate, dicyclopentadiene phenol type epoxy (meth) acrylate, bisphenol A type epoxy (meth) acrylate, bisphenol F type epoxy (meth) acrylate Ester, biphenol type epoxy (meth) acrylate, bisphenol A novolac type epoxy (meth) acrylate, naphthalene skeleton-containing epoxy (meth) acrylate, glyoxal ring An oxy (meth) acrylate, a heterocyclic epoxy (meth) acrylate, or the like.

乙烯基系化合物類可列舉:乙烯基醚類、苯乙烯類、其他乙烯基化合物。乙烯基醚類可列舉:乙基乙烯基醚、丙基乙烯基醚、羥基乙基乙烯基醚、乙二醇二乙烯基醚等。苯乙烯類可列舉:苯乙烯、甲基苯乙烯、乙基苯乙烯等。其他乙烯基化合物可列舉:三烯丙基三聚異氰酸酯、三甲基烯丙基三聚異氰酸酯等。 Examples of the vinyl compound include vinyl ethers, styrenes, and other vinyl compounds. Examples of the vinyl ethers include ethyl vinyl ether, propyl vinyl ether, hydroxyethyl vinyl ether, and ethylene glycol divinyl ether. Examples of the styrenes include styrene, methylstyrene, and ethylstyrene. Examples of the other vinyl compound include triallyl tripolyisocyanate and trimethylallyl trimer isocyanate.

又,陽離子反應型單體只要是一般具有環氧基的化合物就無特別限定。可列舉例如:(甲基)丙烯酸縮水甘油酯、甲基縮水甘油醚、乙基縮水甘油醚、丁基縮水甘油醚、雙酚A二縮水甘油醚、3,4-環氧基環己基甲基-3,4,-環氧基環己烷羧酸酯(Union Carbide公司製「Cyracure UVR-6110」等)、3,4-環氧基環己基乙基-3,4-環氧基環己烷羧酸酯、二氧化乙烯基環己烯(Union Carbide公司製「ELR-4206」等)、二氧化薴烯(limonenedioxide)(Daicel股份有限公司製「Celloxide 3000」等)、二氧化烯丙基環己烯、 3,4,-環氧基-4-甲基環己基-2-環氧丙烷、2-(3,4-環氧基環己基-5,5-螺-3,4-環氧基)環己烷-間二烷、雙(3,4-環氧基環己基)己二酸酯(Union Carbide公司製「CyracureUVR-6128」等)、雙(3,4-環氧基環己基甲基)己二酸酯、雙(3,4-環氧基環己基)醚、雙(3,4-環氧基環己基甲基)醚、雙(3,4-環氧基環己基)二乙基矽氧烷等。 Further, the cationically reactive monomer is not particularly limited as long as it is a compound having an epoxy group in general. Examples thereof include glycidyl (meth)acrylate, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, bisphenol A diglycidyl ether, and 3,4-epoxycyclohexylmethyl group. -3,4,-epoxycyclohexanecarboxylate ("Cyracure UVR-6110", manufactured by Union Carbide Co., Ltd.), 3,4-epoxycyclohexylethyl-3,4-epoxycyclohexane Alkyl carboxylate, vinyl cyclohexene oxide ("ELR-4206" manufactured by Union Carbide Co., Ltd.), limonenedioxide ("Celloxide 3000" manufactured by Daicel Co., Ltd.), etc. Cyclohexene, 3,4,-epoxy-4-methylcyclohexyl-2-epoxypropane, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-ring Oxy)cyclohexane-intermediate Alkane, bis(3,4-epoxycyclohexyl) adipate (Cyracure UVR-6128, manufactured by Union Carbide Co., Ltd.), bis(3,4-epoxycyclohexylmethyl) adipate, Bis(3,4-epoxycyclohexyl)ether, bis(3,4-epoxycyclohexylmethyl)ether, bis(3,4-epoxycyclohexyl)diethyloxane, and the like.

該等之中,就反應性化合物(B)而言,以聚合性良好且提升所得之間隔物等的強度之觀點來看,最佳為單官能、2官能、3官能以上之(甲基)丙烯酸酯等。 Among these, the reactive compound (B) is preferably a monofunctional, bifunctional or trifunctional or higher (meth) from the viewpoint of improving the polymerizability and increasing the strength of the obtained spacer or the like. Acrylate and the like.

本發明之反應性化合物(B)可單獨使用或混合2種以上而使用。該組成物中的反應性化合物(B)之使用比率,相對於反應性多元羧酸化合物(A)100質量份,較佳為30至250質量份,更佳為50至200質量份。反應性化合物(B)的使用量為30至250質量份時,該組成物的感度、所得之硬化物等的耐熱性以及彈性特性變得更為良好。 The reactive compound (B) of the present invention can be used singly or in combination of two or more. The use ratio of the reactive compound (B) in the composition is preferably from 30 to 250 parts by mass, more preferably from 50 to 200 parts by mass, per 100 parts by mass of the reactive polycarboxylic acid compound (A). When the amount of the reactive compound (B) used is from 30 to 250 parts by mass, the sensitivity of the composition, the heat resistance and the elastic properties of the obtained cured product and the like are further improved.

本發明之光聚合起始劑(C),係可感應活性能量線而產生使反應性多元羧酸化合物(A)與反應性多元羧酸化合物(A)以外的反應性化合物(B)的聚合開始之活性種的成分。此種光聚合起始劑(C)可列舉:醯基膦化合物、苯甲醯基肟化合物、苯乙酮化合物、聯咪唑化合物等。 The photopolymerization initiator (C) of the present invention is capable of inducing polymerization of a reactive polyvalent carboxylic acid compound (A) and a reactive compound (B) other than the reactive polycarboxylic acid compound (A) by inducing an active energy ray. The ingredients of the active species that started. Examples of such a photopolymerization initiator (C) include a mercaptophosphine compound, a benzammonium compound, an acetophenone compound, a biimidazole compound, and the like.

其中,光聚合起始劑係藉由併用醯基膦化合物與苯甲醯基肟化合物,即使在利用曝光進行的光硬化步驟後不進行熱處理步驟,仍可得而到反射率、焊料耐熱性、密著性及塗膜硬度等諸多特性優異的硬化物。 Wherein, the photopolymerization initiator is obtained by using a mercaptophosphine compound and a benzammonium compound in combination, and the reflectance, solder heat resistance, and the like are obtained even if the heat treatment step is not performed after the photohardening step by exposure. A cured product excellent in many properties such as adhesion and film hardness.

醯基膦系光聚合起始劑只要是具備醯基膦結構的光聚合起始劑就無特別限定,可列舉例如:2,4,6-三甲基苯甲醯基-二苯基-氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦、雙(2,6-二甲基苯甲醯基)-2,4,4-三甲基-戊基氧化膦、(2,4,6-三甲基苯甲醯基)乙氧基苯基氧化膦等醯基氧化膦化合物。 The mercaptophosphine-based photopolymerization initiator is not particularly limited as long as it is a photopolymerization initiator having a mercaptophosphine structure, and examples thereof include 2,4,6-trimethylbenzylidene-diphenyl-oxidation. Phosphine, bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide, bis(2,6-dimethylbenzylidene)-2,4,4-trimethyl-pentyl A fluorenylphosphine oxide compound such as phosphine oxide or (2,4,6-trimethylbenzylidene)ethoxyphenylphosphine oxide.

苯甲醯基肟系光聚合起始劑只要是具備苯甲醯基肟結構的光聚合起始劑就無特別限定,可列舉例如:1,2-辛二酮,1-[4-(苯基硫基)-2-(O-苯甲醯基肟)]、2-丙二酮-2-O-苯甲醯基肟、1-苯基-1,2-丙二酮-2-O-苯甲醯基肟等肟酯化合物。 The benzamidine-based photopolymerization initiator is not particularly limited as long as it is a photopolymerization initiator having a benzammonium fluorene structure, and examples thereof include 1,2-octanedione and 1-[4-(benzene. , thiol)-2-(O-benzylidene hydrazide), 2-propanedione-2-O-benzimidoxime, 1-phenyl-1,2-propanedione-2-O - an oxime ester compound such as benzamidine.

醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑的調配比率並無特別限定,但例如相對於苯甲醯基肟系光聚合起始劑1質量份,關於醯基膦系光聚合起始劑的調配量之下限值,就防止硬化物的反射率降低的觀點來看,該下限值較佳為2質量份,就使內部硬化充分進行以更加提升密著性的觀點來看,該下限值較佳為3質量份,就確實地防止硬化物的反射率降低的觀點來看,該下限值特佳為4質量份。另一方面,相對於苯甲醯基肟系光聚合起始劑1質量份,關於醯基膦系光聚合起始劑的調配量之上限值,就確實地提升焊料耐熱性與密著性的觀點來看,該上限值較佳為100質量份,就確實地防止塗膜硬度降低之觀點來看,該上限值更佳為50質量份,就使焊料耐熱性與密著性以良好平衡來提升的觀點來看,該上限值特 佳為10質量份。 The blending ratio of the mercaptophosphine-based photopolymerization initiator to the benzamidine-based photopolymerization initiator is not particularly limited, but, for example, 1 part by mass based on the benzamidine-based photopolymerization initiator, The lower limit of the amount of the compounding amount of the phosphine-based photopolymerization initiator is preferably 2 parts by mass in view of preventing a decrease in the reflectance of the cured product, so that the internal hardening is sufficiently performed to further enhance the density. From the viewpoint of the property, the lower limit is preferably 3 parts by mass, and the lower limit is particularly preferably 4 parts by mass from the viewpoint of reliably preventing the reflectance of the cured product from being lowered. On the other hand, with respect to 1 part by mass of the benzamidine-based photopolymerization initiator, the upper limit of the amount of the mercaptophosphine-based photopolymerization initiator increases the solder heat resistance and adhesion. In view of the above, the upper limit is preferably 100 parts by mass, and from the viewpoint of reliably preventing the hardness of the coating film from being lowered, the upper limit is more preferably 50 parts by mass, and the solder heat resistance and adhesion are made. From the standpoint of good balance to improve, the upper limit Good for 10 parts by mass.

亦即,醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑的調配比率,係相對於苯甲醯基肟系光聚合起始劑1質量份,醯基膦系光聚合起始劑通常為2至100質量份左右,較佳為3至50質量份左右,特佳為4至10質量份程度。 That is, the ratio of the mercaptophosphine-based photopolymerization initiator to the benzamidine-based photopolymerization initiator is 1 part by mass relative to the benzamidine-based photopolymerization initiator, and the mercaptophosphine system is The photopolymerization initiator is usually from about 2 to 100 parts by mass, preferably from about 3 to 50 parts by mass, particularly preferably from 4 to 10 parts by mass.

醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑的調配量之合計並無特別限定,但例如相對於反應性多元羧酸化合物(A)100質量份,就確實賦予光硬化性而提升硬化物的機械強度之觀點來看,其下限值較佳為1質量份,就提升耐熱性的觀點來看,該下限值特佳為2質量份。另一方面,就抑制因上述光聚合起始劑的氧化分解造成的變色而使反射率降低之觀點來看,其上限值較佳為30質量份,就與基板的密著性之觀點來看,該上限值特佳為20質量份。 The total amount of the fluorenylphosphine-based photopolymerization initiator and the benzamidine-based photopolymerization initiator is not particularly limited. For example, it is true that it is 100 parts by mass based on the reactive polycarboxylic acid compound (A). From the viewpoint of imparting photocurability and improving the mechanical strength of the cured product, the lower limit thereof is preferably 1 part by mass, and the lower limit is particularly preferably 2 parts by mass from the viewpoint of improving heat resistance. On the other hand, from the viewpoint of suppressing discoloration due to oxidative decomposition of the photopolymerization initiator and lowering the reflectance, the upper limit is preferably 30 parts by mass, and the adhesion to the substrate is considered. It is to be noted that the upper limit is particularly preferably 20 parts by mass.

亦即,醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑的調配量之合計,係相對於反應性多元羧酸化合物(A)100質量份,而較佳為1至30質量份,更以使用2至20質量份左右為特佳。 In other words, the total amount of the fluorenylphosphine-based photopolymerization initiator and the benzamidine-based photopolymerization initiator is 100 parts by mass based on 100 parts by mass of the reactive polycarboxylic acid compound (A). It is particularly preferably from 1 to 30 parts by mass, more preferably from 2 to 20 parts by mass.

氧化鈦(D)係用以將塗膜等硬化物予以白色化而調配者,可列舉:銳鈦礦型氧化鈦、具有金紅石結晶結構的金紅石型氧化鈦等。該等之中,就白色度的觀點來看,較佳為金紅石型氧化鈦。金紅石型氧化鈦係可列舉例如:富士Titanium工業股份有限公司製「TR-600」、 「TR-700」、「TR-750」、「TR-840」;石原產業股份有限公司製「R-550」、「R-580」、「R-630」、「R-820」、「CR-50」、「CR-60」、「CR-80」、「CR-90」、「CR-93」;Titan工業股份有限公司製「KR-270」、「KR-310」、「KR-380」等。該等可單獨使用或混合2種以上而使用。 The titanium oxide (D) is prepared by whitening a cured product such as a coating film, and examples thereof include anatase-type titanium oxide and rutile-type titanium oxide having a rutile crystal structure. Among these, from the viewpoint of whiteness, rutile-type titanium oxide is preferred. The rutile-type titanium oxide system is, for example, "TR-600" manufactured by Fuji Titanium Industrial Co., Ltd. "TR-700", "TR-750", "TR-840"; "R-550", "R-580", "R-630", "R-820", "CR" manufactured by Ishihara Sangyo Co., Ltd. -50", "CR-60", "CR-80", "CR-90", "CR-93"; "KR-270", "KR-310" and "KR-380" manufactured by Titan Industrial Co., Ltd. "Wait. These may be used alone or in combination of two or more.

氧化鈦(D)的調配量並無特別限定,但相對於反應性多元羧酸化合物(A)100質量份,就硬化物的白色度與強度平衡之觀點來看,較佳為30至200質量份左右,特佳為50至150質量份左右。 The amount of the titanium oxide (D) to be added is not particularly limited, but is preferably from 30 to 200% from the viewpoint of the whiteness and strength balance of the cured product with respect to 100 parts by mass of the reactive polycarboxylic acid compound (A). It is about 50 to 150 parts by mass.

本發明之白色活性能量線硬化型樹脂組成物中,除了上述成分以外,可視需要而適當含有各種添加成分,例如消泡劑、分散劑、溶劑、體質顏料等。 In addition to the above components, the white active energy ray-curable resin composition of the present invention may contain various additives such as an antifoaming agent, a dispersing agent, a solvent, and an extender pigment as necessary.

消泡劑可使用公知者,可列舉例如:聚矽氧系、烴系、丙烯酸系等。分散劑可列舉例如:矽烷系、鈦酸酯系、氧化鋁系等耦合劑。 A known one can be used as the antifoaming agent, and examples thereof include polyoxymethylene, hydrocarbon, and acrylic. The dispersing agent may, for example, be a coupling agent such as a decane system, a titanate system or an alumina system.

溶劑係用以調節白色活性能量線硬化型樹脂組成物的黏度或乾燥性者,可列舉例如:甲基乙基酮、環己烷等酮類;甲苯、二甲苯等芳香族烴類;甲醇、異丙醇、環己醇等醇類;環己烷、甲基環己烷等脂環式烴類;石油醚、石腦油等石油系溶劑;賽珞蘇(cellosolve)、丁基賽珞蘇等賽珞蘇類;卡必醇(carbitol)、丁基卡必醇等卡必醇類;乙酸乙酯、乙酸丁酯、賽珞蘇乙酸酯、丁基賽珞蘇乙酸酯、卡必醇乙酸酯、丁基卡必醇乙酸酯等乙酸酯類等。該等可單獨使用或混合2種以上而使用。 The solvent is used to adjust the viscosity or dryness of the white active energy ray-curable resin composition, and examples thereof include ketones such as methyl ethyl ketone and cyclohexane; aromatic hydrocarbons such as toluene and xylene; and methanol. Alcohols such as isopropanol and cyclohexanol; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; petroleum solvents such as petroleum ether and naphtha; cellosolve and butyl celesta Such as celsin; carbitol, butyl carbitol and other carbitol; ethyl acetate, butyl acetate, cyanidin acetate, butyl cyproterone acetate, carbene Acetate such as alcohol acetate or butyl carbitol acetate. These may be used alone or in combination of two or more.

體質顏料係用以輔助性地提升硬化物(例如塗佈後的防焊膜)的機械強度者,可列舉例如:氧化矽、硫酸鋇、氧化鋁、氫氧化鋁、滑石、雲母等。 The extender pigment is used to assist in enhancing the mechanical strength of the cured product (for example, the solder resist film after coating), and examples thereof include cerium oxide, barium sulfate, aluminum oxide, aluminum hydroxide, talc, and mica.

又,本發明中係使用氧化鈦將活性能量線硬化型樹脂組成物予以著色成白色,但亦可因應用途,在不影響本發明的效果之範圍內,適當添加藍色著色劑、黃色著色劑、黑色著色劑等著色劑。白色以外的著色劑之具體例可列舉:酞菁綠、酞菁藍等酞菁(phthalocyanine)系、蒽醌系、偶氮系等有機顏料、碳黑等無機顏料。 Further, in the present invention, the active energy ray-curable resin composition is colored white using titanium oxide, but a blue coloring agent or a yellow coloring agent may be appropriately added to the extent that the effects of the present invention are not affected depending on the application. , colorants such as black colorants. Specific examples of the coloring agent other than white include an organic pigment such as a phthalocyanine system such as phthalocyanine green or phthalocyanine blue, an anthraquinone or an azo-based organic pigment, and an inorganic pigment such as carbon black.

上述的本發明之活性能量線硬化型樹脂組成物的製造方法並不侷限於特定的方法,但例如可將上述各成分依預定比率調配後,在室溫利用三輥研磨機、球磨機、混砂機等混練手段、或超級混合機、行星式混合機等攪拌手段進行混練或混合而製造。又,在前述混練或混合之前,亦可視需要而進行預備混練或預備混合。 The method for producing the active energy ray-curable resin composition of the present invention is not limited to a specific method. For example, the above components may be blended at a predetermined ratio, and then a three-roll mill, a ball mill, or a sand mixture may be used at room temperature. A kneading means such as a machine or a stirring means such as a super mixer or a planetary mixer is kneaded or mixed to produce. Further, before the kneading or mixing, preliminary kneading or preliminary mixing may be performed as needed.

其次,說明上述的本發明之白色活性能量線硬化型樹脂組成物的使用方法。在此,將本發明之白色活性能量線硬化型樹脂組成物塗佈於電路基板上以作為防焊膜的情況作為例子來說明。 Next, a method of using the above-described white active energy ray-curable resin composition of the present invention will be described. Here, the case where the white active energy ray-curable resin composition of the present invention is applied onto a circuit board as a solder resist film will be described as an example.

將依上述方式所得之本發明的白色活性能量線硬化型樹脂組成物,利用網版印刷、噴霧塗佈機、棒式塗佈機、塗敷器(applicator)、刮刀塗佈機(blade coater)、氣刀塗佈機(knife coater)、輥式塗佈機、凹版塗佈機等公知的塗佈方法,塗佈於例如具有經蝕刻銅箔後所形成的電 路圖案之印刷配線板上,使成為期望的厚度。此外,塗布後,必要時為了使白色活性能量線硬化型樹脂組成物中的溶劑揮發,亦可進行以60至80℃左右的溫度加熱15至60分鐘左右之預備乾燥,而形成無黏性的塗膜。使具有除了迴路圖案的連接盤(land)以外為透光性的圖案之負片,密著於在使用公知的塗工方法所塗佈的白色活性能量線硬化型樹脂組成物上,從其上方照射活性能量線(例如紫外線)使塗膜進行光硬化。其次,將對應於前述連接盤(land)的非曝光區域以弱鹼性水溶液去除,藉此而使塗膜顯像,便可使作為目標的防焊膜形成於印刷配線板上。上述顯像方法中係使用噴霧法、沐浴法等,且所使用的弱鹼性水溶液並無特別限定,可列舉例如0.5至5%的碳酸鈉水溶液。此外,不需顯像塗膜時,可在不使用負片之情形下就使白色活性能量線硬化型樹脂組成物進行光硬化。 The white active energy ray-curable resin composition of the present invention obtained in the above manner is used by screen printing, a spray coater, a bar coater, an applicator, or a blade coater. A known coating method such as a knife coater, a roll coater, or a gravure coater is applied to, for example, an electric charge formed by etching a copper foil. The printed wiring board of the road pattern is made to have a desired thickness. Further, after the application, if necessary, in order to volatilize the solvent in the white active energy ray-curable resin composition, it may be heated at a temperature of about 60 to 80 ° C for about 15 to 60 minutes to form a non-sticky form. Coating film. A negative film having a light transmissive pattern other than the land pattern of the circuit pattern is adhered to the white active energy ray-curable resin composition coated by a known coating method, and irradiated thereon The active energy ray (for example, ultraviolet ray) causes the coating film to be photohardened. Next, the non-exposed area corresponding to the land is removed by a weakly alkaline aqueous solution, whereby the coating film is developed, and the target solder resist film can be formed on the printed wiring board. In the above development method, a spray method, a bath method, or the like is used, and the weakly alkaline aqueous solution to be used is not particularly limited, and examples thereof include a 0.5 to 5% sodium carbonate aqueous solution. Further, when the coating film is not required to be applied, the white active energy ray-curable resin composition can be photocured without using a negative film.

於依如此的方式所得之經防焊膜被覆的電路基板,藉由利用噴流焊接方法、回焊(reflow soldering)方法等進行焊接電子零件,而形成電子電路單元。 The circuit board coated with the solder resist film obtained in such a manner is formed by soldering an electronic component by a jet welding method, a reflow soldering method, or the like to form an electronic circuit unit.

經光硬化的白色活性能量線硬化型樹脂組成物之硬化物及硬化皮膜、以及具有該硬化物或該硬化皮膜的電路基板或印刷配線板亦包含在本發明內。 A cured product and a cured film of a photohardenable white active energy ray-curable resin composition, and a circuit board or a printed wiring board having the cured product or the cured film are also included in the present invention.

(實施例) (Example)

以下,藉由實施例更詳細說明本發明,惟本發明並不侷限於該等實施例。又,實施例中,只要沒有特別的聲明,就以「份」表示質量份,「%」表示質量%。 Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited to the examples. Further, in the examples, unless otherwise stated, the parts are represented by "parts", and "%" means mass%.

軟化點、環氧當量、酸價係根據以下的條件測定。 The softening point, epoxy equivalent, and acid value were measured according to the following conditions.

1)環氧當量:以按照JISK7236:2001的方法進行測定。 1) Epoxy equivalent: It was measured by the method according to JIS K7236:2001.

2)軟化點:以按照JISK7234:1986的方法進行測定。 2) Softening point: Measurement was carried out in accordance with the method of JIS K7234:1986.

3)酸價:以按照JISK0070:1992的方法進行測定。 3) Acid value: It was measured in accordance with the method of JIS K0070:1992.

實施例1-1至1-3 Examples 1-1 to 1-3

[反應性多元羧酸化合物(A)的調製] [Preparation of Reactive Polycarboxylic Acid Compound (A)]

添加表1的記載量之作為環氧樹脂(a)的NC-6300H(日本化藥製;通式(1)的n=0(64%),n=1(23%),n=2以上(13%);環氧當量230g/eq.)、表1的記載量之作為化合物(b)的丙烯酸(簡稱AA,Mw=72)、及表1的記載量之作為化合物(c)的二羥甲基丙酸(簡稱DMPA,Mw=134)。以使固形份成為反應液的80質量%的方式添加作為觸媒之三苯基膦3g、及作為溶劑之丙二醇單甲基醚單乙酸酯,在100℃使其反應24小時,得到反應性環氧基羧酸酯化合物(E)溶液。以固形份酸價(AV:mg.KOH/g)5以下作為反應終點,而進入下個反應。酸價測定係在反應溶液中進行測定,且換算成以固形份計之酸價。 NC-6300H (manufactured by Nippon Kasei Co., Ltd.; n=0 (64%) of the general formula (1), n=1 (23%), n=2 or more as the epoxy resin (a) in the amount shown in Table 1 was added. (13%); epoxy equivalent: 230 g/eq.), acrylic acid (abbreviated as AA, Mw=72) as the compound (b) and the amount of the compound (c) as described in Table 1 in the amounts shown in Table 1. Hydroxymethylpropionic acid (DMPA, Mw = 134). 3 g of triphenylphosphine as a catalyst and propylene glycol monomethyl ether monoacetate as a solvent were added so that the solid content became 80% by mass of the reaction liquid, and the reaction was carried out at 100 ° C for 24 hours to obtain reactivity. A solution of an epoxy carboxylic acid ester compound (E). The solid acid value (AV: mg.KOH/g) 5 or less was used as the reaction end point, and the next reaction was carried out. The acid value was measured in the reaction solution and converted to the acid value in terms of the solid content.

其次,於反應性環氧基羧酸酯化合物(E)溶液中,以使固形份成為65質量%的方式添加表1記載量之作為多元酸酐(d)的四氫鄰苯二甲酸酐(簡稱THPA)、及作為溶劑的丙二醇單甲基醚單乙酸酯,並加熱至100℃後,使其進行酸加成反應,而得到反應性多元羧酸化合物(A)溶液。固形份酸價(AV:mg.KOH/g)記載於表1中。 Next, in the solution of the reactive epoxy carboxylic acid ester compound (E), tetrahydrophthalic anhydride (abbreviated as the polybasic acid anhydride (d)) in the amount shown in Table 1 was added so that the solid content was 65% by mass. THPA) and propylene glycol monomethyl ether monoacetate as a solvent are heated to 100 ° C and then subjected to an acid addition reaction to obtain a reactive polycarboxylic acid compound (A) solution. The solid acid value (AV: mg.KOH/g) is shown in Table 1.

比較例1-1、1-2 Comparative Example 1-1, 1-2

[比較用之反應性多元羧酸化合物的調製〕 [Preparation of a reactive polycarboxylic acid compound for comparison]

除了將環氧樹脂由實施例1-1至1-3的環氧樹脂(a)改為表1的記載量之甲酚酚醛清漆型環氧樹脂EOCN-103S(日本化藥製,環氧當量200g/eq.)以外,其餘與實施例1-1至1-3同樣地進行,得到羧酸酯化合物溶液。 Except that the epoxy resin of Examples 1-1 to 1-3 was changed from the epoxy resin (a) of Examples 1-1 to 1-3 to the cresol novolac type epoxy resin EOCN-103S (manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent) The same procedure as in Examples 1-1 to 1-3 except for 200 g/eq.) was carried out to obtain a carboxylic acid ester compound solution.

其次,與實施例1-1至1-3同樣地進行,得到比較用之反應性多元羧酸化合物溶液。固形份酸價(AV:mgKOH/g)記載於表1中。 Then, in the same manner as in Examples 1-1 to 1-3, a reactive polycarboxylic acid compound solution for comparison was obtained. The solid acid value (AV: mgKOH/g) is shown in Table 1.

比較例1-3 Comparative Example 1-3

[比較用之不具有芳香環之反應性多元羧酸化合物的調製] [Comparison of Reactive Polycarboxylic Acid Compounds Without Aromatic Rings]

於具有攪拌機、溫度計、回流冷卻器、滴下漏斗及氮氣導入管之2公升的可分離式燒瓶中,添加作為溶劑之二乙二醇二甲基醚900g、及作為聚合起始劑之過氧化-2-乙基己酸第三丁酯(日本油脂股份有限公司製Perbutyl®O)21.4g後,加熱至90℃。加熱後,於其中將甲基丙烯酸309.9g、甲基丙烯酸甲酯116.4g、及內脂改質甲基丙烯酸2-羥基乙酯(Daicel股份有限公司製的Placcel FM1)109.8g與作為聚合起始劑的過氧化二碳酸雙(4-第三丁基環己基)酯(日本油脂股份有限公司製的Peroyl TCP)21.4g一起花費3小時滴加,再進行熟成6小時,藉此得到含羧基的共聚合樹脂。此外,反應係在氮氣環境下進行。 In a 2 liter separable flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction tube, 900 g of diethylene glycol dimethyl ether as a solvent and peroxidation as a polymerization initiator were added. After 21.4 g of tert-butyl 2-ethylhexanoate (Perbutyl® O manufactured by Nippon Oil & Fat Co., Ltd.), it was heated to 90 °C. After heating, 309.9 g of methacrylic acid, 116.4 g of methyl methacrylate, and 109.8 g of lactam-modified 2-hydroxyethyl methacrylate (Placcel FM1 manufactured by Daicel Co., Ltd.) were used as a polymerization initiation. 21.4 g of bis(4-tert-butylcyclohexyl) peroxydicarbonate (Peroyl TCP, manufactured by Nippon Oil & Fat Co., Ltd.) was added dropwise for 3 hours, and then matured for 6 hours to obtain a carboxyl group-containing Copolymerized resin. Further, the reaction was carried out under a nitrogen atmosphere.

其次,對於所得之含羧基的共聚合樹脂,添加甲基丙烯酸3,4-環氧基環己酯(Daicel股份有限公司製 的Cyclomer A200)363.9g、作為開環觸媒之二甲基苯甲基胺3.6g、及作為聚合抑制劑之氫醌單甲基醚1.80g,並加熱至100℃,進行攪拌,藉此進行環氧基的開環加成反應。16小時後,得到固形份的酸價為108.9mg.KOH/g、重量平均分子量為25,000之含有65質量%(固形份)之不具有芳香環的含羧基的樹脂之溶液。 Next, 3,4-epoxycyclohexyl methacrylate (manufactured by Daicel Co., Ltd.) was added to the obtained carboxyl group-containing copolymer resin. 363.9 g of Cyclomer A200), 3.6 g of dimethylbenzylamine as a ring-opening catalyst, and 1.80 g of hydroquinone monomethyl ether as a polymerization inhibitor, and heated to 100 ° C, and stirred. A ring-opening addition reaction of an epoxy group. After 16 hours, the acid value of the solid fraction was 108.9 mg. KOH/g, a solution of a carboxyl group-containing resin having a weight average molecular weight of 25,000 and containing 65 mass% (solid content) without an aromatic ring.

<本發明組成物的調製> <Modulation of Composition of the Invention>

將下述表2所示之各成分依下述表2所示之調配比率調配,使用三輥研磨機於室溫進行混合分散,調製實施例2-1至2-3、比較例2-1至2-3使用的白色活性能量線硬化型樹脂組成物。 Each component shown in the following Table 2 was prepared according to the mixing ratio shown in the following Table 2, and mixed and dispersed at room temperature using a three-roll mill to prepare Examples 2-1 to 2-3 and Comparative Example 2-1. A white active energy ray-curable resin composition used up to 2-3.

表示實施例及比較例所用的各成分之詳細內容。 The details of each component used in the examples and comparative examples are shown.

<反應性化合物(B)> <Reactive Compound (B)>

B-1:二新戊四醇六丙烯酸酯與二新戊四醇五丙烯酸酯之混 合物(KAYARAD DPHA,日本化藥製) B-1: Mix of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate Compound (KAYARAD DPHA, manufactured by Nippon Kasei Co., Ltd.)

<光聚合起始劑(C)> <Photopolymerization initiator (C)>

C-1:醯基膦系光聚合起始劑 C-1: mercaptophosphine photopolymerization initiator

‧雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦(IRGACURE 819,BASF製) ‧Bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide (IRGACURE 819, manufactured by BASF)

C-2:苯甲醯基肟系光聚合起始劑 C-2: benzylidene oxime photopolymerization initiator

‧1,2-辛二酮,1-[4-(苯基硫基)-2-(O-苯甲醯基肟)](IRGACURE OXE 01,BASF製) ‧1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzhydrylhydrazine)] (IRGACURE OXE 01, manufactured by BASF)

<氧化鈦(D)> <Titanium oxide (D)>

D-1:金紅石型氧化鈦(CR-80,石原產業股份有限公司製) D-1: rutile-type titanium oxide (CR-80, manufactured by Ishihara Sangyo Co., Ltd.)

<試驗片的作成> <Preparation of test piece>

將於覆銅積層板(FR-4,厚度1.6mm、導體厚35μm)形成有電路圖案的印刷配線板,利用拋光輪(研磨輪)研磨(對應英文:mopping或buffing或polishing)進行表面處理。其次,將實施例2-1至2-3及比較例2-1至2-3的本發明組成物分別以網版印刷法塗佈於印刷配線板。然後,使作成的印刷配線板於80℃在熱風循環式乾燥爐中乾燥30分鐘。對於乾燥後的印刷配線板之塗膜上,利用曝光裝置(ORC製作所股份有限公司製之型號HMW-680GW)曝光2000mJ/cm2的紫外線(波長300至400nm)(光硬化步驟),於印刷配線板上形成本發明組成物的硬化塗膜,製作試驗片。硬化塗膜的厚度為15至20μm。 A printed wiring board having a circuit pattern formed on a copper clad laminate (FR-4, thickness 1.6 mm, conductor thickness 35 μm) was subjected to surface treatment by polishing (polishing wheel) polishing (corresponding to English: mopping or buffing or polishing). Next, the compositions of the present invention of Examples 2-1 to 2-3 and Comparative Examples 2-1 to 2-3 were each applied to a printed wiring board by a screen printing method. Then, the prepared printed wiring board was dried at 80 ° C for 30 minutes in a hot air circulating drying oven. On the coating film of the printed wiring board after drying, an ultraviolet ray (wavelength 300 to 400 nm) of 2000 mJ/cm 2 was exposed by an exposure apparatus (model HMW-680GW manufactured by ORC Co., Ltd.) (printing step) A cured coating film of the composition of the present invention was formed on the sheet to prepare a test piece. The thickness of the hard coat film is 15 to 20 μm.

<評價> <evaluation>

針對實施例2-1至2-3及比較例2-1至2-3的組成物、以及由其塗膜所形成的試驗片,進行下述的評價。評價結果一併表示於表3。 The composition of Examples 2-1 to 2-3 and Comparative Examples 2-1 to 2-3 and the test piece formed of the coating film thereof were subjected to the following evaluations. The evaluation results are shown together in Table 3.

(1)反射率 (1) Reflectance

使用分光光度計U-3310H(日立製作所股份有限公司製:φ 60mm積分球),測定被覆有硬化塗膜的試驗片的於450nm的反射率。 The reflectance at 450 nm of the test piece coated with the cured coating film was measured using a spectrophotometer U-3310H (manufactured by Hitachi, Ltd.: φ 60 mm integrating sphere).

(2)耐光性 (2) Light resistance

對所得之試驗片再照射Super UV(90mW)的光24小時,使其加速劣化後,使用分光光度計U-3310H(日立製作 所股份有限公司製:φ 60mm積分球),測定顏色的變化。ΔE*ab表示顏色的變化。此值愈小時,表示顏色的變化就愈小。 The obtained test piece was further irradiated with Super UV (90 mW) light for 24 hours to accelerate deterioration, and then a spectrophotometer U-3310H (manufactured by Hitachi) was used. Co., Ltd.: φ 60mm integrating sphere), measuring the change in color. ΔE*ab represents a change in color. The smaller the value, the smaller the change in color.

(3)焊料耐熱性 (3) Solder heat resistance

根據JIS C-6481的試驗方法將試驗片的硬化塗膜浸漬於260℃的焊料槽10秒後,將利用賽璐凡膠帶(cellophane tape)進行的剝離試驗(peeling test)設為1循環,以目視觀察反覆操作1至2次循環後的塗膜狀態,按照以下的基準進行評價。 The hardened coating film of the test piece was immersed in a solder bath of 260 ° C for 10 seconds according to the test method of JIS C-6481, and then a peeling test by a cellophane tape was set to 1 cycle to The state of the coating film after the 1 to 2 cycles of the repeated operation was visually observed, and the evaluation was performed according to the following criteria.

○:反覆操作2循環後亦未確認到塗膜產生變化。 ○: No change in the coating film was observed after 2 cycles of repeated operations.

△:確認到反覆操作2循環後的塗膜產生變化。 △: It was confirmed that the coating film after the two cycles of the repeated operation was changed.

×:確認到反覆操作1循環後的塗膜產生剝離。 ×: It was confirmed that the coating film after one cycle of the repeated operation was peeled off.

(4)密著性 (4) Adhesion

依照JIS K-5600-5-6,於試驗片設置1mm的方格100個(10×10),進行利用賽璐凡膠帶的剝離試驗,並以目視觀察方格的剝離狀態,計算在100個方格中未從基板剝離之方格的個數。 In accordance with JIS K-5600-5-6, 100 (10 × 10) squares of 1 mm were placed on the test piece, and a peeling test using a celluloid tape was performed, and the peeling state of the square was visually observed, and the calculation was performed at 100 The number of squares in the square that are not peeled off from the substrate.

(5)塗膜硬度 (5) Coating hardness

依照JIS K-5600-5-4的試驗方法,將芯的尖端研磨成平整之3B至9H的鉛筆以45°的角度抵壓在試驗片的銅箔上之硬化塗膜,記錄未發生塗膜剝落之鉛筆的硬度。 According to the test method of JIS K-5600-5-4, the tip of the core was ground to a flat 3B to 9H pencil, and the hardened coating film on the copper foil of the test piece was pressed at an angle of 45°, and no coating film was recorded. The hardness of the peeling pencil.

從上述的結果可知,實施例2-1至2-3的本發明之含有反應性多元羧酸化合物(A)的白色活性能量線硬化型組成物,係相較於比較例2-1至2-3的組成物,其反射率、耐光性、焊料耐熱性表現良好,且密著性、塗膜硬度優異。而且,可觀察到在反應性多元羧酸化合物(A)的調製中使用有DMPA(化合物(c))的實施例2-1與實施例2-2,係相較於未使用化合物(c)的實施例2-3,其顯示更優異的密著性。 From the above results, the white active energy ray-curable composition containing the reactive polycarboxylic acid compound (A) of the present invention of Examples 2-1 to 2-3 was compared with Comparative Examples 2-1 to 2 The composition of -3 exhibits excellent reflectance, light resistance, and solder heat resistance, and is excellent in adhesion and coating film hardness. Further, Example 2-1 in which DMPA (Compound (c)) was used in the preparation of the reactive polycarboxylic acid compound (A) was observed, and Example 2-2 was observed, compared with the unused Compound (c). Example 2-3, which showed more excellent adhesion.

(產業上之可利用性) (industrial availability)

本發明之白色活性能量線硬化型樹脂組成物係即使在光硬化步驟後不進行熱硬化步驟,仍可得到反射率、焊料耐熱性、密著性及塗膜硬度優異的硬化物,故在例如印刷配線板的防焊膜、覆蓋膜的領域中有高利用價值。 The white active energy ray-curable resin composition of the present invention can obtain a cured product excellent in reflectance, solder heat resistance, adhesion, and coating film hardness without performing a heat curing step after the photo-curing step, and thus, for example, The use of the solder mask and the cover film of the printed wiring board has high use value.

Claims (6)

一種白色活性能量線硬化型樹脂組成物,係含有:反應性多元羧酸化合物(A)、反應性多元羧酸化合物(A)以外的反應性化合物(B)、光聚合起始劑(C)、及氧化鈦(D),其中,反應性多元羧酸化合物(A)係使反應物(E)與多元酸酐(d)反應而得到者,該反應物(E)係通式(1)所示之環氧樹脂(a)與一分子中具有1個以上的可聚合之乙烯性不飽和基與1個以上的羧基之化合物(b)及視需要之一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的反應物; 式中,n表示0至2的正數。 A white active energy ray-curable resin composition containing a reactive polycarboxylic acid compound (A), a reactive compound (B) other than the reactive polycarboxylic acid compound (A), and a photopolymerization initiator (C) And a titanium oxide (D), wherein the reactive polycarboxylic acid compound (A) is obtained by reacting a reactant (E) with a polybasic acid anhydride (d), and the reactant (E) is a compound of the formula (1) The epoxy resin (a) and the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule, and at least one or more of the hydroxyl groups in one molecule as required a reactant of compound (c) with one or more carboxyl groups; Where n represents a positive number from 0 to 2. 如申請專利範圍第1項所述之白色活性能量線硬化型樹脂組成物,其中,反應性多元羧酸化合物(A)係使反應物(E)與多元酸酐(d)反應而得到者,該反應物(E)係通式(1)所示之環氧樹脂(a)與一分子中具有1個以上的可聚 合之乙烯性不飽和基與1個以上的羧基之化合物(b)及一分子中至少具有2個以上的羥基與一個以上的羧基之化合物(c)的反應物。 The white active energy ray-curable resin composition according to the first aspect of the invention, wherein the reactive polycarboxylic acid compound (A) is obtained by reacting a reactant (E) with a polybasic acid anhydride (d). The reactant (E) is an epoxy resin (a) represented by the formula (1) and has one or more polymerizable groups in one molecule. A compound (b) having an ethylenically unsaturated group and one or more carboxyl groups, and a reaction product of a compound (c) having at least two or more hydroxyl groups and one or more carboxyl groups in one molecule. 如申請專利範圍第1或2項所述之白色活性能量線硬化型樹脂組成物,其中,光聚合起始劑(C)為醯基膦系光聚合起始劑與苯甲醯基肟系光聚合起始劑,其調配比率係相對於苯甲醯基肟系光聚合起始劑1質量份而使醯基膦系光聚合起始劑為2至100質量份。 The white active energy ray-curable resin composition according to claim 1 or 2, wherein the photopolymerization initiator (C) is a mercaptophosphine-based photopolymerization initiator and a benzamidine-based photopolymer The polymerization initiator is blended in an amount of from 2 to 100 parts by mass based on 1 part by mass of the benzamidine-based photopolymerization initiator and the mercaptophosphine-based photopolymerization initiator. 如申請專利範圍第3項所述之白色活性能量線硬化型樹脂組成物,其中,醯基膦系光聚合起始劑係選自由2,4,6-三甲基苯甲醯基-二苯基-氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦、雙(2,6-二甲基苯甲醯基)-2,4,4-三甲基-戊基氧化膦及(2,4,6-三甲基苯甲醯基)乙氧基苯基氧化膦所組成群組之1種以上,苯甲醯基肟系光聚合起始劑係選自由1,2-辛二酮,1-[4-(苯基硫基)-,2-(O-苯甲醯基肟)]、2-丙二酮-2-O-苯甲醯基肟、1-苯基-1,2-丙二酮-2-O-苯甲醯基肟所組成群組之1種以上。 The white active energy ray-curable resin composition according to claim 3, wherein the mercaptophosphine-based photopolymerization initiator is selected from the group consisting of 2,4,6-trimethylbenzimidyl-diphenyl -phosphine oxide, bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide, bis(2,6-dimethylbenzylidene)-2,4,4-trimethyl One or more groups consisting of keto-pentylphosphine oxide and (2,4,6-trimethylbenzylidene)ethoxyphenylphosphine oxide, a benzamidine-based photopolymerization initiator Free choice of 1,2-octanedione, 1-[4-(phenylthio)-, 2-(O-benzylidene fluorenyl)], 2-propanedione-2-O-benzylidene One or more groups consisting of hydrazine and 1-phenyl-1,2-propanedione-2-O-benzylidene fluorene. 一種硬化物,其係申請專利範圍第1項所述之白色活性能量線硬化型樹脂組成物的硬化物。 A cured product which is a cured product of a white active energy ray-curable resin composition according to claim 1 of the patent application. 一種印刷配線板,其具有申請專利範圍第1項所述之白色活性能量線硬化型樹脂組成物的硬化被膜。 A printed wiring board comprising a cured film of a white active energy ray-curable resin composition according to claim 1 of the patent application.
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Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
EP0346522A3 (en) * 1988-06-16 1991-04-03 Nippon CMK Corp. Printed wiring board
JP2704661B2 (en) * 1989-09-13 1998-01-26 日本化薬株式会社 Unsaturated group-containing polycarboxylic acid resin, resin composition containing the same, solder resist resin composition and cured product thereof
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JP4994922B2 (en) 2007-04-06 2012-08-08 太陽ホールディングス株式会社 Solder resist composition and cured product thereof
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JP5472692B2 (en) * 2009-07-06 2014-04-16 日立化成株式会社 Photosensitive resin composition capable of alkali development and photosensitive film using the same
CN102483571B (en) * 2009-09-10 2013-10-23 积水化学工业株式会社 Photosensitive composition and printed wiring board
JP2011256271A (en) * 2010-06-09 2011-12-22 Jnc Corp Curable composition, use thereof and new compound
JP5806491B2 (en) * 2011-03-31 2015-11-10 太陽インキ製造株式会社 Curable resin composition, dry film and printed wiring board using the same
WO2014077171A1 (en) * 2012-11-16 2014-05-22 富士フイルム株式会社 White photosensitive resin composition, white cured film, white pattern, and method for producing white pattern
CN102944977B (en) * 2012-11-28 2014-08-27 惠州市容大油墨有限公司 Photosensitive solder resist composite, application thereof and printed circuit board (PCB) containing same
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