TW201701419A - Package structure and the manufacture thereof - Google Patents

Package structure and the manufacture thereof Download PDF

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Publication number
TW201701419A
TW201701419A TW104120916A TW104120916A TW201701419A TW 201701419 A TW201701419 A TW 201701419A TW 104120916 A TW104120916 A TW 104120916A TW 104120916 A TW104120916 A TW 104120916A TW 201701419 A TW201701419 A TW 201701419A
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TW
Taiwan
Prior art keywords
layer
package structure
insulating protective
protective layer
circuit
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Application number
TW104120916A
Other languages
Chinese (zh)
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TWI624011B (en
Inventor
邱士超
林俊賢
白裕呈
范植文
陳嘉成
洪祝寶
何祈慶
Original Assignee
矽品精密工業股份有限公司
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Application filed by 矽品精密工業股份有限公司 filed Critical 矽品精密工業股份有限公司
Priority to TW104120916A priority Critical patent/TWI624011B/en
Priority to CN201510403793.6A priority patent/CN106298728A/en
Publication of TW201701419A publication Critical patent/TW201701419A/en
Application granted granted Critical
Publication of TWI624011B publication Critical patent/TWI624011B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

Provided is a package structure, comprising: a dielectric layer, a first circuit layer embedded in the dielectric layer while being exposed from the surface of the dielectric layer, a plurality of conductive bumps disposed on the first circuit layer, and a first insulating protective layer formed on the dielectric layer, conductive bumps and the first circuit layer, wherein partial surfaces of the conductive bumps are exposed from the first insulating protective layer such that the conductive bumps are exposed from the first insulating protective layer while the first circuit layer is still covered by the first insulating protective layer to thereby prevent bridging between the solder material and the first circuit layer when disposing electronic elements thereon and thus increase good yield. This invention further provides a method for fabricating the package structure as described above.

Description

封裝結構及其製法 Package structure and its manufacturing method

本發明係有關一種封裝結構,尤指一種能提高產品良率之封裝結構及其製法。 The invention relates to a package structure, in particular to a package structure capable of improving product yield and a preparation method thereof.

隨著電子產業的蓬勃發展,許多高階電子產品都逐漸朝往輕、薄、短、小等高集積度方向發展,且隨著封裝技術之演進,晶片的封裝技術也越來越多樣化,半導體封裝件之尺寸或體積亦隨之不斷縮小,藉以使該半導體封裝件達到輕薄短小之目的。 With the rapid development of the electronics industry, many high-end electronic products are gradually moving toward light, thin, short, and small high integration. With the evolution of packaging technology, the packaging technology of wafers is becoming more and more diversified. The size or volume of the package is also shrinking, so that the semiconductor package is light, thin and short.

第1圖係為習知封裝結構1的剖視圖。如第1圖所示,該封裝結構1包括:封裝基板10、嵌埋於該封裝基板10中之線路層11、以及設於該封裝基板10上並藉由複數銲料凸塊13電性連接該線路層11之半導體晶片12。 1 is a cross-sectional view of a conventional package structure 1. As shown in FIG. 1 , the package structure 1 includes a package substrate 10 , a circuit layer 11 embedded in the package substrate 10 , and a package layer 10 disposed on the package substrate 10 and electrically connected by a plurality of solder bumps 13 . The semiconductor wafer 12 of the wiring layer 11.

惟,習知封裝結構1中,由於該線路層11之線距愈來愈小,致使該銲料凸塊13的間距也日益縮小,故於封裝基板10接置該半導體晶片12後,該銲料凸塊13之銲料於回銲後容易與相鄰的線路層11之線路或接觸墊橋接(bridge),因而發生短路,導致產品良率下降。 However, in the conventional package structure 1, since the line pitch of the circuit layer 11 is getting smaller and smaller, the pitch of the solder bumps 13 is also increasingly reduced. Therefore, after the package substrate 10 is attached to the semiconductor wafer 12, the solder bumps are formed. The solder of block 13 is easily bridged with the lines or contact pads of adjacent circuit layers 11 after reflow, resulting in a short circuit, resulting in a decrease in product yield.

因此,如何克服上述習知技術的問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the problems of the above-mentioned prior art has become a problem that is currently being solved.

鑒於上述習知技術之缺失,本發明提供一種封裝結構,係包括:介電層,係具有相對之第一表面與第二表面;第一線路層,係嵌埋於該介電層中並外露於該第一表面;複數導電凸塊,係設於該第一線路層上;以及第一絕緣保護層,係形成於該介電層之第一表面、導電凸塊與該第一線路層上,且該導電凸塊之部分表面外露於該第一絕緣保護層。 In view of the above-mentioned prior art, the present invention provides a package structure comprising: a dielectric layer having opposite first and second surfaces; and a first circuit layer embedded in the dielectric layer and exposed On the first surface; a plurality of conductive bumps are disposed on the first circuit layer; and a first insulating protective layer is formed on the first surface of the dielectric layer, the conductive bumps and the first circuit layer And a part of the surface of the conductive bump is exposed to the first insulating protective layer.

前述之封裝結構中,復包括第二線路層,係形成於該介電層之第二表面上且電性連接該第一線路層。 In the foregoing package structure, the second circuit layer is formed on the second surface of the dielectric layer and electrically connected to the first circuit layer.

本發明復提供一種封裝結構之製法,係包括:提供一承載件;形成第一線路層於該承載件上;形成一介電層於該承載件上,以令該介電層覆蓋該第一線路層;形成第二線路層於該介電層上,且該第二線路層電性連接該第一線路層;移除該承載件,且形成複數導電凸塊於該第一線路層上;以及形成第一絕緣保護層於該介電層、導電凸塊與該第一線路層上,且令該導電凸塊之部分表面外露於該第一絕緣保護層。 The invention provides a method for manufacturing a package structure, comprising: providing a carrier; forming a first circuit layer on the carrier; forming a dielectric layer on the carrier, so that the dielectric layer covers the first a circuit layer; a second circuit layer is formed on the dielectric layer, and the second circuit layer is electrically connected to the first circuit layer; the carrier is removed, and a plurality of conductive bumps are formed on the first circuit layer; And forming a first insulating protective layer on the dielectric layer, the conductive bump and the first circuit layer, and exposing a portion of the surface of the conductive bump to the first insulating protective layer.

前述之製法中,該導電凸塊係以電鍍方式形成者。 In the above method, the conductive bump is formed by electroplating.

前述之製法中,復包括藉由顯影方式移除該第一絕緣保護層之部分材質,令該導電凸塊之部分表面外露於該第一絕緣保護層。 In the above method, a part of the material of the first insulating protective layer is removed by development, and a part of the surface of the conductive bump is exposed to the first insulating protective layer.

前述之封裝結構及其製法中,該導電凸塊凸出該第一絕緣保護層。 In the foregoing package structure and method of manufacturing the same, the conductive bump protrudes from the first insulating protective layer.

前述之封裝結構及其製法中,該第一絕緣保護層形成有凹部,且該些導電凸塊位於該凹部中。又包括設置至少一電子元件於該第一絕緣保護層上,且形成底膠於該第一絕緣保護層與該電子元件之間,使該底膠填充於該凹部中。 In the foregoing package structure and method of manufacturing the same, the first insulating protective layer is formed with a recess, and the conductive bumps are located in the recess. The method further includes disposing at least one electronic component on the first insulating protective layer, and forming a primer between the first insulating protective layer and the electronic component, so that the underfill is filled in the recess.

前述之封裝結構及其製法中,復包括形成第二絕緣保護層於該介電層與該第二線路層上。例如,該第二絕緣保護層係為防銲層,且該第二線路層之部分表面外露於該第二絕緣保護層。又包括形成複數導電元件於該第二線路層上。 In the foregoing package structure and method of fabricating the same, the second insulating protective layer is formed on the dielectric layer and the second circuit layer. For example, the second insulating protective layer is a solder resist layer, and a part of the surface of the second wiring layer is exposed to the second insulating protective layer. Also included is the formation of a plurality of conductive elements on the second circuit layer.

前述之封裝結構及其製法中,形成該介電層之材質係為模壓樹脂、預浸材、ABF或感光型介電材。 In the above package structure and method of manufacturing the same, the material forming the dielectric layer is a molded resin, a prepreg, an ABF or a photosensitive dielectric.

前述之封裝結構及其製法中,該第一絕緣保護層係為防銲層。 In the foregoing package structure and method of manufacturing the same, the first insulating protective layer is a solder resist layer.

前述之封裝結構及其製法中,復包括設置至少一電子元件於該第一絕緣保護層上,且該電子元件係電性連接至該些導電凸塊。又包括形成封裝膠體於該第一絕緣保護層上,使該封裝膠體包覆該電子元件;或者,包括形成底膠於該第一絕緣保護層與該電子元件之間。 In the above package structure and method of manufacturing the same, at least one electronic component is disposed on the first insulating protective layer, and the electronic component is electrically connected to the conductive bumps. The method further includes forming an encapsulant on the first insulating protective layer to encapsulate the encapsulant to the electronic component, or comprising forming a primer between the first insulating protective layer and the electronic component.

本發明另提供一種封裝結構,係包括:介電層,係具有相對之第一表面與第二表面,且形成該介電層之材質係為ABF;以及第一線路層,係嵌埋於該介電層中並外露於該第一表面。 The present invention further provides a package structure, comprising: a dielectric layer having a first surface and a second surface opposite to each other, wherein the material forming the dielectric layer is ABF; and the first circuit layer is embedded in the The dielectric layer is exposed to the first surface.

前述之封裝結構中,復包括第二線路層,係形成於該介電層之第二表面上且電性連接該第一線路層。 In the foregoing package structure, the second circuit layer is formed on the second surface of the dielectric layer and electrically connected to the first circuit layer.

前述之封裝結構中,復包括一承載件,係供該第一線路層與該介電層形成於其上。 In the foregoing package structure, a carrier is included to form the first circuit layer and the dielectric layer thereon.

前述之封裝結構中,復包括複數導電凸塊,係設於該第一線路層上。 In the foregoing package structure, a plurality of conductive bumps are included on the first circuit layer.

由上可知,本發明之封裝結構及其製法中,主要藉由該第一線路層上形成有該導電凸塊,使該導電凸塊外露於該第一絕緣保護層,而該第一線路層仍受該第一絕緣保護層覆蓋,故於接置該電子元件後,可避免銲料與該第一線路層發生橋接的問題,因而能避免發生短路,進而提高產品良率。 It can be seen that, in the package structure of the present invention, the conductive bump is formed on the first circuit layer, and the conductive bump is exposed to the first insulating protective layer, and the first circuit layer is formed. Still covered by the first insulating protective layer, after the electronic component is connected, the problem that the solder is bridged with the first circuit layer can be avoided, thereby avoiding a short circuit and thereby improving product yield.

1,2,2’,2”,2a,2a’,2a”‧‧‧封裝結構 1,2,2',2",2a,2a',2a"‧‧‧Package structure

10‧‧‧封裝基板 10‧‧‧Package substrate

11‧‧‧線路層 11‧‧‧Line layer

12‧‧‧半導體晶片 12‧‧‧Semiconductor wafer

13,260‧‧‧銲料凸塊 13,260‧‧‧ solder bumps

20‧‧‧介電層 20‧‧‧Dielectric layer

20a‧‧‧第一表面 20a‧‧‧ first surface

20b‧‧‧第二表面 20b‧‧‧second surface

200‧‧‧盲孔 200‧‧ ‧ blind hole

21‧‧‧第一線路層 21‧‧‧First line layer

22‧‧‧第二線路層 22‧‧‧Second circuit layer

23‧‧‧導電凸塊 23‧‧‧Electrical bumps

220‧‧‧導電體 220‧‧‧Electrical conductor

24,24’‧‧‧第一絕緣保護層 24,24’‧‧‧first insulating coating

240‧‧‧凹部 240‧‧‧ recess

25‧‧‧第二絕緣保護層 25‧‧‧Second insulation protection layer

250‧‧‧開孔 250‧‧‧ openings

26‧‧‧電子元件 26‧‧‧Electronic components

27‧‧‧封裝膠體 27‧‧‧Package colloid

28‧‧‧導電元件 28‧‧‧Conductive components

29‧‧‧底膠 29‧‧‧Bottom glue

9‧‧‧承載件 9‧‧‧Carrier

9a,9b‧‧‧表面 9a, 9b‧‧‧ surface

90‧‧‧板體 90‧‧‧ board

91‧‧‧金屬層 91‧‧‧metal layer

T,t‧‧‧厚度 T, t‧‧‧ thickness

第1圖係為習知封裝結構的剖面示意圖;以及第2A至2H圖係為本發明之封裝結構之製法的剖面示意圖;其中,第2G’圖係為第2G圖之另一態樣,第2H’及2H”係為第2H圖之其它態樣。 1 is a schematic cross-sectional view of a conventional package structure; and 2A to 2H are schematic cross-sectional views showing a method of fabricating the package structure of the present invention; wherein the 2G' image is another aspect of the 2Gth image, 2H' and 2H" are other aspects of the 2H diagram.

以下係藉由特定的具體實例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。 The embodiments of the present invention are described below by way of specific examples, and those skilled in the art can readily appreciate other advantages and functions of the present invention from the disclosure herein. The present invention may be embodied or applied in various other specific embodiments, and various modifications and changes may be made without departing from the spirit and scope of the invention.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本創作可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本創作所能產生之功效及所能達成之目的下,均應仍落在本創作所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「一」、「第一」、「第二」等之用語,亦僅為便於敘述之明瞭,而非用以限定本創作可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本創作可實施之範疇。 It is to be understood that the structure, the proportions, the size and the like of the drawings are only used in conjunction with the disclosure of the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effectiveness and the purpose of the creation. The technical content revealed by the creation can be covered. In the meantime, the terms "upper", "one", "first" and "second" as used in this specification are for convenience only, and are not intended to limit the scope of the creation. Changes or adjustments in their relative relationship are considered to be within the scope of the creation of the creation of the product without substantial changes.

請參閱第2A至2H圖係顯示本發明之封裝結構2之製法的剖面示意圖。 Please refer to FIGS. 2A to 2H for a schematic cross-sectional view showing the manufacturing method of the package structure 2 of the present invention.

如第2A圖所示,提供一具有相對之兩表面9a,9b之承載件9,且形成第一線路層21於該承載件9之兩表面9a,9b上。 As shown in Fig. 2A, a carrier member 9 having opposite surfaces 9a, 9b is provided and a first wiring layer 21 is formed on both surfaces 9a, 9b of the carrier member 9.

於本實施例中,該承載件9之兩表面9a,9b係為金屬表面。具體地,該承載件9具有如金屬板、半導體晶圓或玻璃板之板體90與設於該板體90兩側之金屬層91,如銅箔,且於該板體90與該金屬層91之間亦可依需求設有如離形膜、黏著材或絕緣材等之結合層(圖略)。再者,係以電鍍或沉積方式形成該第一線路層21。 In this embodiment, the two surfaces 9a, 9b of the carrier 9 are metal surfaces. Specifically, the carrier member 9 has a plate body 90 such as a metal plate, a semiconductor wafer or a glass plate, and a metal layer 91 disposed on both sides of the plate body 90, such as a copper foil, and the plate body 90 and the metal layer. A bonding layer such as a release film, an adhesive material or an insulating material may be provided between the 91s (not shown). Furthermore, the first wiring layer 21 is formed by electroplating or deposition.

如第2B圖所示,形成一介電層20於該承載件9之兩表面9a,9b上,以令該介電層20覆蓋該第一線路層21。 As shown in FIG. 2B, a dielectric layer 20 is formed on both surfaces 9a, 9b of the carrier 9 such that the dielectric layer 20 covers the first wiring layer 21.

於本實施例中,形成該介電層20之材質如模壓樹脂(molding compound)、預浸材(prepreg)、ABF(Ajinomoto Build-up Film)或感光型介電材,但不限於此。 In the present embodiment, the material of the dielectric layer 20 is formed, for example, a molding compound, a prepreg, an ABF (Ajinomoto Build-up Film) or a photosensitive dielectric material, but is not limited thereto.

再者,該介電層20係具有相對之第一表面20a與第二表面20b,且該介電層20以其第一表面20a結合於該承載件9之兩表面9a,9b上。 Moreover, the dielectric layer 20 has opposite first and second surfaces 20a, 20b, and the dielectric layer 20 is bonded to the two surfaces 9a, 9b of the carrier 9 with its first surface 20a.

又,對應該第二表面20b,於該介電層20中形成複數盲孔200,以令該第一線路層21之部分表面外露於該些盲孔200中。例如,該些盲孔200係以雷射、曝光顯影或蝕刻等方式形成者。 Moreover, corresponding to the second surface 20b, a plurality of blind holes 200 are formed in the dielectric layer 20 to expose a part of the surface of the first circuit layer 21 to the blind holes 200. For example, the blind vias 200 are formed by laser, exposure development, etching, or the like.

如第2C圖所示,形成圖案化導電材於該介電層20之第二表面20b上,以令該導電材作為第二線路層22,且該導電材復形成於該盲孔200中,使該第二線路層22具有延伸於該介電層20中之導電體220,以令該第二線路層22藉由該導電體220電性連接該第一線路層21。 As shown in FIG. 2C, a patterned conductive material is formed on the second surface 20b of the dielectric layer 20 such that the conductive material is used as the second wiring layer 22, and the conductive material is formed in the blind via 200. The second circuit layer 22 has the electrical conductors 220 extending in the dielectric layer 20 such that the second circuit layer 22 is electrically connected to the first circuit layer 21 by the electrical conductors 220.

如第2D圖所示,移除該承載件9以外露出該第一線路層21。 As shown in FIG. 2D, the first wiring layer 21 is exposed except for the removal of the carrier 9.

於本實施例中,該第一線路層21與該介電層20之第一表面20a齊平。 In the embodiment, the first circuit layer 21 is flush with the first surface 20a of the dielectric layer 20.

如第2E圖所示,形成複數導電凸塊23於該第一線路層21上。 As shown in FIG. 2E, a plurality of conductive bumps 23 are formed on the first wiring layer 21.

於本實施例中,該些導電凸塊23係以電鍍銅之方式形成者。 In the embodiment, the conductive bumps 23 are formed by electroplating copper.

如第2F圖所示,形成第一絕緣保護層24於該介電層 20之第一表面20a、導電凸塊23與該第一線路層21上,以使該第一絕緣保護層24覆蓋該第一線路層21及該導電凸塊23,且形成第二絕緣保護層25於該介電層20之第二表面20b與該第二線路層22上,以使該第二絕緣保護層25覆蓋該第二線路層22。 Forming a first insulating protective layer 24 on the dielectric layer as shown in FIG. 2F a first surface 20a, a conductive bump 23 and the first wiring layer 21, such that the first insulating protective layer 24 covers the first wiring layer 21 and the conductive bump 23, and forms a second insulating protective layer 25 on the second surface 20b of the dielectric layer 20 and the second wiring layer 22 such that the second insulating protective layer 25 covers the second wiring layer 22.

於本實施例中,該第一絕緣保護層24與該第二絕緣保護層25係為防銲層。 In the embodiment, the first insulating protective layer 24 and the second insulating protective layer 25 are solder resist layers.

如第2G圖所示,移除該第一與第二絕緣保護層24,25之部分材質,使該導電凸塊23之部分表面外露於該第一絕緣保護層24,且該第一線路層21未外露於該第一絕緣保護層24,而該第二線路層22之部分表面係外露於該第二絕緣保護層25。 As shown in FIG. 2G, a portion of the first and second insulating protective layers 24, 25 are removed, such that a portion of the surface of the conductive bump 23 is exposed to the first insulating protective layer 24, and the first circuit layer 21 is not exposed to the first insulating protective layer 24, and part of the surface of the second wiring layer 22 is exposed to the second insulating protective layer 25.

於本實施例中,係藉由顯影方式移除該第一絕緣保護層24之部分材質,使該導電凸塊23凸出該第一絕緣保護層24(即該導電凸塊23之頂面與部分側面外露於該第一絕緣保護層24),而該第一絕緣保護層24仍覆蓋該第一線路層21。 In this embodiment, a portion of the material of the first insulating protective layer 24 is removed by a developing method, so that the conductive bumps 23 protrude from the first insulating protective layer 24 (ie, the top surface of the conductive bumps 23 and A portion of the side is exposed to the first insulating protective layer 24), and the first insulating protective layer 24 still covers the first wiring layer 21.

再者,該第二絕緣保護層25係形成有複數開孔250以供外露該第二線路層22之部分表面;或者,藉由該第二絕緣保護層25之表面齊平該第二線路層22之表面,使該第二線路層22之頂面外露於該第二絕緣保護層25。 Furthermore, the second insulating protective layer 25 is formed with a plurality of openings 250 for exposing a portion of the surface of the second wiring layer 22; or, by the surface of the second insulating protective layer 25, the second wiring layer is flushed The top surface of the second circuit layer 22 is exposed to the second insulating protective layer 25.

又,於另一實施例中,如第2G’圖所示,可保留該些導電凸塊23周圍之第一絕緣保護層24’,使該第一絕緣保護層24’形成有凹部240,且該些導電凸塊23位於該凹部 240中並外露於該第一絕緣保護層24’,故該第一絕緣保護層24’成為具有不同厚度T,t之結構。 In another embodiment, as shown in FIG. 2G′, the first insulating protective layer 24 ′ around the conductive bumps 23 may be retained, so that the first insulating protective layer 24 ′ is formed with the concave portion 240 , and The conductive bumps 23 are located in the recess The first insulating protective layer 24' is exposed to the first insulating protective layer 24', so that the first insulating protective layer 24' has a structure having different thicknesses T, t.

如第2H圖所示,設置至少一電子元件26於該第一絕緣保護層24上,且該電子元件26係電性連接至該些導電凸塊23,再形成封裝膠體27於該第一絕緣保護層24上,使該封裝膠體27包覆該電子元件26。之後,形成複數如銲球之導電元件28於該開孔250中之第二線路層22上。 As shown in FIG. 2H, at least one electronic component 26 is disposed on the first insulating protective layer 24, and the electronic component 26 is electrically connected to the conductive bumps 23, and the encapsulant 27 is formed on the first insulating layer. The encapsulant 27 covers the electronic component 26 on the protective layer 24. Thereafter, a plurality of conductive elements 28, such as solder balls, are formed on the second wiring layer 22 in the opening 250.

於本實施例中,該電子元件26係為主動元件、被動元件或其組合者,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。 In this embodiment, the electronic component 26 is an active component, a passive component, or a combination thereof, and the active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor.

再者,該電子元件26藉由複數銲料凸塊260電性連接至該導電凸塊23,且該封裝膠體27包覆該些導電凸塊23與銲料凸塊260。於其它方式中,該電子元件26亦可依需求藉由打線方式(wire bonding)電性連接該導電凸塊23,圖未示。 Moreover, the electronic component 26 is electrically connected to the conductive bump 23 by a plurality of solder bumps 260, and the encapsulant 27 covers the conductive bumps 23 and the solder bumps 260. In other manners, the electronic component 26 can be electrically connected to the conductive bump 23 by wire bonding as needed, which is not shown.

又,如第2H’圖所示,亦可先形成底膠29於該第一絕緣保護層24與該電子元件26之間,使該底膠29包覆該些導電凸塊23與銲料凸塊260並固定該電子元件26,再形成封裝膠體27於該第一絕緣保護層24上,使該封裝膠體27包覆該電子元件26與該底膠29。 In addition, as shown in FIG. 2H', a primer 29 may be formed between the first insulating protective layer 24 and the electronic component 26, so that the primer 29 covers the conductive bumps 23 and the solder bumps. The electronic component 26 is fixed 260, and the encapsulant 27 is formed on the first insulating protective layer 24, so that the encapsulant 27 covers the electronic component 26 and the primer 29.

另外,如第2H”圖所示,若接續第2G’圖之製程,該底膠29會形成於該凹部240中,以限制該底膠29之流動。 Further, as shown in Fig. 2H", if the process of the 2G' drawing is continued, the primer 29 is formed in the recess 240 to restrict the flow of the primer 29.

本發明之製法係先於該第一線路層21上形成該導電凸塊23,再形成該第一絕緣保護層24,接著移除部分第一 絕緣保護層24,使該導電凸塊23外露,而該第一線路層21仍受該第一絕緣保護層24覆蓋,故於接置該電子元件26後,可避免該銲料凸塊260之銲料與該第一線路層21發生橋接(bridge)的問題,因而能避免發生短路,進而提高產品良率。 The method of the present invention forms the conductive bump 23 on the first circuit layer 21, and then forms the first insulating protective layer 24, and then removes the first portion. The insulating protective layer 24 exposes the conductive bumps 23, and the first circuit layer 21 is still covered by the first insulating protective layer 24. Therefore, after the electronic component 26 is attached, the solder of the solder bumps 260 can be avoided. The problem of bridging with the first circuit layer 21 can avoid short circuits and improve product yield.

本發明提供一種封裝結構2,2’,2”,係包括:一介電層20、一第一線路層21、複數導電凸塊23、一第一絕緣保護層24,24’、一第二線路層22以及一第二絕緣保護層25。 The present invention provides a package structure 2, 2', 2", comprising: a dielectric layer 20, a first circuit layer 21, a plurality of conductive bumps 23, a first insulating protective layer 24, 24', a second The circuit layer 22 and a second insulating protective layer 25.

所述之介電層20係具有相對之第一表面20a與第二表面20b,且形成該介電層20之材質係為模壓樹脂、預浸材、ABF或感光型介電材。 The dielectric layer 20 has a first surface 20a and a second surface 20b opposite to each other, and the material forming the dielectric layer 20 is a molded resin, a prepreg, an ABF or a photosensitive dielectric.

所述之第一線路層21係嵌埋於該介電層20中並外露於該第一表面20a,且該第一線路層21與該介電層20之第一表面20a齊平。 The first circuit layer 21 is embedded in the dielectric layer 20 and exposed on the first surface 20a, and the first circuit layer 21 is flush with the first surface 20a of the dielectric layer 20.

所述之導電凸塊23係位於該介電層20之第一表面20a上並結合於該第一線路層21上。 The conductive bumps 23 are located on the first surface 20a of the dielectric layer 20 and bonded to the first circuit layer 21.

所述之第一絕緣保護層24,24’係為防銲層,其形成於該介電層20之第一表面20a、導電凸塊23與該第一線路層21上,且該導電凸塊23之部分表面外露於該第一絕緣保護層24,24’。 The first insulating protective layer 24, 24' is a solder resist layer formed on the first surface 20a of the dielectric layer 20, the conductive bump 23 and the first wiring layer 21, and the conductive bump A portion of the surface of the portion 23 is exposed to the first insulating protective layer 24, 24'.

所述之第二線路層22係形成於該介電層20之第二表面20b上且電性連接該第一線路層21。 The second circuit layer 22 is formed on the second surface 20b of the dielectric layer 20 and electrically connected to the first circuit layer 21.

所述之第二絕緣保護層25係為防銲層,其形成於該介電層20之第二表面20b與該第二線路層22上,且該第二 線路層22之部分表面外露於該第二絕緣保護層25。 The second insulating protective layer 25 is a solder resist layer formed on the second surface 20b of the dielectric layer 20 and the second wiring layer 22, and the second A portion of the surface of the wiring layer 22 is exposed to the second insulating protective layer 25.

於一實施例中,該導電凸塊23凸出該第一絕緣保護層24,24’。 In one embodiment, the conductive bumps 23 protrude from the first insulating protective layer 24, 24'.

於一實施例中,該第一絕緣保護層24’形成有凹部240,且該些導電凸塊23位於該凹部240中。例如,該封裝結構2”可包括設於該第一絕緣保護層24’上之至少一電子元件26、及形成於該第一絕緣保護層24’與該電子元件26之間的底膠29,且該底膠29復形成於該凹部240中。 In one embodiment, the first insulating protective layer 24' is formed with a recess 240, and the conductive bumps 23 are located in the recess 240. For example, the package structure 2 ′′ may include at least one electronic component 26 disposed on the first insulating protective layer 24 ′ and a primer 29 formed between the first insulating protective layer 24 ′ and the electronic component 26 . And the primer 29 is formed in the recess 240.

於一實施例中,該封裝結構2,2’,2”復包括形成於該第二線路層22上之複數導電元件28。 In one embodiment, the package structure 2, 2', 2" includes a plurality of conductive elements 28 formed on the second circuit layer 22.

於一實施例中,該封裝結構2,2’復包括設於該第一絕緣保護層24上之至少一電子元件26,且該電子元件26係電性連接至該些導電凸塊23。例如,該封裝結構2可包括形成於該第一絕緣保護層24上之封裝膠體27,且該封裝膠體27包覆該電子元件26。或者,該封裝結構2’亦可包括形成於該第一絕緣保護層24與該電子元件26之間的底膠29。 In one embodiment, the package structure 2, 2' includes at least one electronic component 26 disposed on the first insulating protective layer 24, and the electronic component 26 is electrically connected to the conductive bumps 23. For example, the package structure 2 may include an encapsulant 27 formed on the first insulating protective layer 24, and the encapsulant 27 covers the electronic component 26. Alternatively, the package structure 2' may include a primer 29 formed between the first insulating protective layer 24 and the electronic component 26.

本發明另提供一種封裝結構2a,2a’,2a”,如第2C至2E圖所示,係包括:一介電層20以及第一線路層21。 The present invention further provides a package structure 2a, 2a', 2a", as shown in Figures 2C through 2E, comprising a dielectric layer 20 and a first wiring layer 21.

所述之介電層20係具有相對之第一表面20a與第二表面20b,且形成該介電層20之材質係為ABF。 The dielectric layer 20 has a first surface 20a and a second surface 20b opposite to each other, and the material forming the dielectric layer 20 is ABF.

所述之第一線路層21係嵌埋於該介電層20中並外露於該第一表面20a。 The first circuit layer 21 is embedded in the dielectric layer 20 and exposed to the first surface 20a.

於一實施例中,該封裝結構2a,2a’,2a”復包括第二線路 層22,係形成於該介電層20之第二表面20b上且電性連接該第一線路層21。 In an embodiment, the package structure 2a, 2a', 2a" includes a second line The layer 22 is formed on the second surface 20b of the dielectric layer 20 and electrically connected to the first circuit layer 21.

於一實施例中,該封裝結構2a’復包括一承載件9,係供該第一線路層21與該介電層20形成於其上。 In one embodiment, the package structure 2a' includes a carrier member 9 on which the first circuit layer 21 and the dielectric layer 20 are formed.

於一實施例中,該封裝結構2a”復包括複數導電凸塊23,係設於該第一線路層21上。 In one embodiment, the package structure 2a" includes a plurality of conductive bumps 23 disposed on the first circuit layer 21.

綜上所述,本發明封裝結構及其製法,係藉由先於該第一線路層上形成該導電凸塊,再形成該第一絕緣保護層,使該導電凸塊外露,而該第一線路層仍受該第一絕緣保護層覆蓋,故於接置該電子元件後,可避免該銲料凸塊之銲料與該第一線路層發生橋接的問題,因而能避免發生短路,進而提高產品良率。 In summary, the package structure of the present invention is formed by forming the conductive bump on the first circuit layer, and then forming the first insulating protective layer to expose the conductive bump, and the first The circuit layer is still covered by the first insulating protective layer, so that after the electronic component is connected, the solder of the solder bump can be prevented from bridging with the first circuit layer, thereby avoiding a short circuit and improving the product. rate.

上述實施例僅例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與改變。因此,本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-described embodiments are merely illustrative of the principles of the invention and its effects, and are not intended to limit the invention. Modifications and variations of the above-described embodiments can be made by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the scope of the claims described below.

2‧‧‧封裝結構 2‧‧‧Package structure

20‧‧‧介電層 20‧‧‧Dielectric layer

21‧‧‧第一線路層 21‧‧‧First line layer

22‧‧‧第二線路層 22‧‧‧Second circuit layer

23‧‧‧導電凸塊 23‧‧‧Electrical bumps

24‧‧‧第一絕緣保護層 24‧‧‧First insulation protection layer

25‧‧‧第二絕緣保護層 25‧‧‧Second insulation protection layer

250‧‧‧開孔 250‧‧‧ openings

26‧‧‧電子元件 26‧‧‧Electronic components

260‧‧‧銲料凸塊 260‧‧‧ solder bumps

27‧‧‧封裝膠體 27‧‧‧Package colloid

28‧‧‧導電元件 28‧‧‧Conductive components

Claims (32)

一種封裝結構,係包括:介電層,係具有相對之第一表面與第二表面;第一線路層,係嵌埋於該介電層中並外露於該第一表面;複數導電凸塊,係設於該第一線路層上;以及第一絕緣保護層,係形成於該介電層之第一表面、導電凸塊與該第一線路層上,且該導電凸塊之部分表面外露於該第一絕緣保護層。 A package structure includes: a dielectric layer having opposite first and second surfaces; a first circuit layer embedded in the dielectric layer and exposed on the first surface; a plurality of conductive bumps, The first insulating layer is formed on the first surface of the dielectric layer, the conductive bump and the first circuit layer, and a part of the surface of the conductive bump is exposed The first insulating protective layer. 如申請專利範圍第1項所述之封裝結構,其中,該導電凸塊凸出該第一絕緣保護層。 The package structure of claim 1, wherein the conductive bump protrudes from the first insulating protective layer. 如申請專利範圍第1項所述之封裝結構,其中,該第一絕緣保護層形成有凹部,且該些導電凸塊位於該凹部中。 The package structure of claim 1, wherein the first insulating protective layer is formed with a recess, and the conductive bumps are located in the recess. 如申請專利範圍第3項所述之封裝結構,復包括設於該第一絕緣保護層上之至少一電子元件、及形成於該第一絕緣保護層與該電子元件之間的底膠,且該底膠填充於該凹部中。 The package structure of claim 3, further comprising at least one electronic component disposed on the first insulating protective layer, and a primer formed between the first insulating protective layer and the electronic component, and The primer is filled in the recess. 如申請專利範圍第1項所述之封裝結構,復包括第二線路層,係形成於該介電層之第二表面上且電性連接該第一線路層。 The package structure of claim 1, further comprising a second circuit layer formed on the second surface of the dielectric layer and electrically connected to the first circuit layer. 如申請專利範圍第5項所述之封裝結構,復包括第二絕緣保護層,係形成於該介電層之第二表面與該第二線路層上,且該第二線路層之部分表面外露於該第二 絕緣保護層。 The package structure of claim 5, further comprising a second insulating protective layer formed on the second surface of the dielectric layer and the second circuit layer, and a portion of the surface of the second circuit layer is exposed In the second Insulation protection layer. 如申請專利範圍第6項所述之封裝結構,其中,該第二絕緣保護層係為防銲層。 The package structure of claim 6, wherein the second insulating protective layer is a solder resist layer. 如申請專利範圍第5項所述之封裝結構,復包括形成於該第二線路層上之複數導電元件。 The package structure of claim 5, comprising a plurality of conductive elements formed on the second circuit layer. 如申請專利範圍第1項所述之封裝結構,復包括設於該第一絕緣保護層上之至少一電子元件,且該電子元件係電性連接至該些導電凸塊。 The package structure of claim 1, further comprising at least one electronic component disposed on the first insulating protective layer, and the electronic component is electrically connected to the conductive bumps. 如申請專利範圍第9項所述之封裝結構,復包括形成於該第一絕緣保護層上之封裝膠體,且該封裝膠體包覆該電子元件。 The package structure as claimed in claim 9 further comprising an encapsulant formed on the first insulating protective layer, and the encapsulant encapsulates the electronic component. 如申請專利範圍第9項所述之封裝結構,復包括形成於該第一絕緣保護層與該電子元件之間的底膠。 The package structure of claim 9, comprising a primer formed between the first insulating protective layer and the electronic component. 如申請專利範圍第1項所述之封裝結構,其中,形成該介電層之材質係為模壓樹脂、預浸材、ABF或感光型介電材。 The package structure according to claim 1, wherein the material for forming the dielectric layer is a molded resin, a prepreg, an ABF or a photosensitive dielectric. 如申請專利範圍第1項所述之封裝結構,其中,該第一絕緣保護層係為防銲層。 The package structure of claim 1, wherein the first insulating protective layer is a solder resist layer. 一種封裝結構之製法,係包括:提供一承載件;形成第一線路層於該承載件上;形成一介電層於該承載件上,以令該介電層覆蓋該第一線路層;形成第二線路層於該介電層上,且該第二線路層 電性連接該第一線路層;移除該承載件,且形成複數導電凸塊於該第一線路層上;以及形成第一絕緣保護層於該介電層、導電凸塊與該第一線路層上,且令該導電凸塊之部分表面外露於該第一絕緣保護層。 A method for fabricating a package structure includes: providing a carrier member; forming a first circuit layer on the carrier member; forming a dielectric layer on the carrier member to allow the dielectric layer to cover the first circuit layer; forming a second circuit layer on the dielectric layer, and the second circuit layer Electrically connecting the first circuit layer; removing the carrier and forming a plurality of conductive bumps on the first circuit layer; and forming a first insulating protective layer on the dielectric layer, the conductive bumps, and the first line And forming a portion of the surface of the conductive bump exposed to the first insulating protective layer. 如申請專利範圍第14項所述之封裝結構之製法,其中,該導電凸塊凸出該第一絕緣保護層。 The method of fabricating a package structure according to claim 14, wherein the conductive bump protrudes from the first insulating protective layer. 如申請專利範圍第14項所述之封裝結構之製法,其中,該導電凸塊係以電鍍方式形成者。 The method of fabricating a package structure according to claim 14, wherein the conductive bump is formed by electroplating. 如申請專利範圍第14項所述之封裝結構之製法,其中,該第一絕緣保護層形成有凹部,且該些導電凸塊位於該凹部中。 The method of fabricating a package structure according to claim 14, wherein the first insulating protective layer is formed with a recess, and the conductive bumps are located in the recess. 如申請專利範圍第17項所述之封裝結構之製法,復包括設置至少一電子元件於該第一絕緣保護層上,且形成底膠於該第一絕緣保護層與該電子元件之間,使該底膠填充於該凹部中。 The method for manufacturing a package structure according to claim 17 further comprising: providing at least one electronic component on the first insulating protective layer, and forming a primer between the first insulating protective layer and the electronic component; The primer is filled in the recess. 如申請專利範圍第14項所述之封裝結構之製法,復包括藉由顯影方式移除該第一絕緣保護層之部分材質,令該導電凸塊之部分表面外露於該第一絕緣保護層。 The method for manufacturing a package structure according to claim 14, further comprising removing a portion of the material of the first insulating protective layer by developing, exposing a portion of the surface of the conductive bump to the first insulating protective layer. 如申請專利範圍第14項所述之封裝結構之製法,復包括形成第二絕緣保護層於該介電層與該第二線路層上。 The method of fabricating the package structure of claim 14, further comprising forming a second insulating protective layer on the dielectric layer and the second wiring layer. 如申請專利範圍第20項所述之封裝結構之製法,其 中,該第二線路層之部分表面外露於該第二絕緣保護層。 The method for manufacturing a package structure as described in claim 20, A portion of the surface of the second circuit layer is exposed to the second insulating protective layer. 如申請專利範圍第21項所述之封裝結構之製法,復包括形成複數導電元件於該第二線路層上。 The method of fabricating the package structure of claim 21, comprising forming a plurality of conductive elements on the second circuit layer. 如申請專利範圍第20項所述之封裝結構之製法,其中,該第二絕緣保護層係為防銲層。 The method of manufacturing a package structure according to claim 20, wherein the second insulating protective layer is a solder resist layer. 如申請專利範圍第14項所述之封裝結構之製法,復包括設置至少一電子元件於該第一絕緣保護層上,且該電子元件係電性連接至該些導電凸塊。 The method of fabricating the package structure of claim 14, further comprising providing at least one electronic component on the first insulating protective layer, and the electronic component is electrically connected to the conductive bumps. 如申請專利範圍第24項所述之封裝結構之製法,復包括形成封裝膠體於該第一絕緣保護層上,使該封裝膠體包覆該電子元件。 The method for manufacturing a package structure according to claim 24, further comprising forming an encapsulant on the first insulating protective layer, so that the encapsulant encapsulates the electronic component. 如申請專利範圍第24項所述之封裝結構之製法,復包括形成底膠於該第一絕緣保護層與該電子元件之間。 The method for fabricating a package structure according to claim 24, further comprising forming a primer between the first insulating protective layer and the electronic component. 如申請專利範圍第14項所述之封裝結構之製法,其中,形成該介電層之材質係為模壓樹脂、預浸材、ABF或感光型介電材。 The method for fabricating a package structure according to claim 14, wherein the material for forming the dielectric layer is a molded resin, a prepreg, an ABF or a photosensitive dielectric. 如申請專利範圍第14項所述之封裝結構之製法,其中,該第一絕緣保護層係為防銲層。 The method of fabricating a package structure according to claim 14, wherein the first insulating protective layer is a solder resist layer. 一種封裝結構,係包括:介電層,係具有相對之第一表面與第二表面,且形成該介電層之材質係為ABF;以及第一線路層,係嵌埋於該介電層中並外露於該第一表面。 A package structure includes: a dielectric layer having opposite first and second surfaces, and the material forming the dielectric layer is ABF; and a first circuit layer embedded in the dielectric layer And exposed to the first surface. 如申請專利範圍第29項所述之封裝結構,復包括第二線路層,係形成於該介電層之第二表面上且電性連接該第一線路層。 The package structure of claim 29, further comprising a second circuit layer formed on the second surface of the dielectric layer and electrically connected to the first circuit layer. 如申請專利範圍第29項所述之封裝結構,復包括一承載件,係供該第一線路層與該介電層形成於其上。 The package structure of claim 29, further comprising a carrier for forming the first circuit layer and the dielectric layer thereon. 如申請專利範圍第29項所述之封裝結構,復包括複數導電凸塊,係設於該第一線路層上。 The package structure as claimed in claim 29, further comprising a plurality of conductive bumps disposed on the first circuit layer.
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