TW201642039A - Self-emission type photosensitive resin composition, color filter, and image display device - Google Patents

Abstract

The present invention relates to a self-emission type photosensitive resin composition, a color filter, and an image display device, and more particularly, a self-emission type photosensitive resin composition that comprises an alkali-soluble resin, photo-luminescent quantum dot particles, a photo-polymerizable compound, a photo-polymerization initiator, and a solvent. The alkali-soluble resin comprises, in the structure thereof, polymerizable unsaturated bonds and acryl group equivalent of 300-2,000 g/eq. The present invention provides a self-emission type photosensitive resin composition that has no problem concerning deterioration of light efficiency and poor photosensitivity property and providing a high quality color filter having excellent brightness property.

Description

Self-luminous photosensitive resin composition, color filter, and image display device

The present invention relates to a self-luminous photosensitive resin composition, a color filter manufactured therewith, and a video display device.

The color filter is a thin film film type optical member capable of forming fine pixel units by extracting three colors of red, green, and blue from white light, and the size of one pixel is about several tens to several hundreds of micrometers. Such a color filter has a black matrix layer for shielding a boundary portion between pixels and a predetermined pattern on a transparent substrate, and a plurality of colors (usually red (R), green) for forming each pixel. (G) and blue (B) 3 primary colors) A structure in which pixel portions arranged in a predetermined order are stacked in this order. In general, a color filter can be produced by applying three or more kinds of hue on a transparent substrate by a dyeing method, an electrodeposition method, a printing method, a pigment dispersion method, or the like. Recently, a pigment dispersion method using a pigment-dispersed photosensitive resin is used. Become the mainstream.

A pigment dispersion method as one of methods for realizing a color filter is to apply a coloring agent and an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, on a transparent substrate provided with a black matrix. A photosensitive resin composition of a solvent or another additive is obtained by exposing a pattern to be formed, removing a non-exposed portion with a solvent, and performing heat curing, thereby repeating the series of processes to form a colored film, which is active It is used in the manufacture of LCDs for portable phones, notebook computers, monitors, televisions, etc. In recent years, the photosensitive resin composition for a color filter using a pigment dispersion method having various advantages requires not only excellent pattern characteristics but also improved performance such as high color reproduction ratio and high brightness and high contrast.

However, the reproduction of the color is achieved by the light illuminating the color filter from the light source, but in the process, a part of the light is absorbed by the color filter, so that the light efficiency is lowered, and further, there is a pigment as a color filter. The fundamental limitation of the characteristics that make perfect color reproduction insufficient.

Korean Patent Publication No. 2009-0036373 discloses that by replacing a color filter of a liquid crystal display device with a light-emitting layer formed of a quantum dot fluorescent material, luminous efficiency can be improved and display quality can be improved. However, the radical generated in the hard baking process performed in the manufacturing process of the color filter causes oxidation of the surface of the quantum dot, and as a result, there is a problem that the light-emitting property is lowered.

Further, Japanese Laid-Open Patent Publication No. 10-2013-0000506 discloses a display device including a light source and a display panel on which light emitted from the light source is incident, the display panel including a plurality of color conversion sections, and the color conversion. The unit includes a plurality of wavelength-converting particles that convert the wavelength of the light, and a plurality of color filter particles that absorb light of a predetermined wavelength band in the light.

However, the above prior art is similar in that it contains quantum dots, but the content of the photosensitive resin composition is not specifically described, and only a display device having high color reproduction ratio and brightness is disclosed. Therefore, it is necessary to additionally develop a photosensitive resin composition. .

Prior technical literature Patent literature

Patent Document 1: Korean Patent Publication No. 10-2009-0036373

Patent Document 2: Korean Patent Publication No. 10-2013-0000506

The present invention has been made to solve the above problems, and an object of the invention is to provide a quantum-soluble resin which is uniformly dispersed by an alkali-soluble resin having a polymerizable unsaturated bond, and which is not produced in the color filter manufacturing process. A self-luminous photosensitive resin composition having an excellent color filter can be produced by a problem of a decrease in light efficiency and a problem of poor photosensitive properties.

Further, another object of the present invention is to provide a color filter manufactured from the above self-luminous photosensitive resin composition and an image display device including the same.

A self-luminous photosensitive resin composition according to an embodiment of the present invention for achieving the above object, comprising an alkali-soluble resin, a photoluminescence quantum dot particle, a photopolymerizable compound, a photopolymerization initiator, and a solvent, The alkali-soluble resin has a polymerizable unsaturated bond in the structure, and the propylene oxime equivalent is 300 to 2,000 g/eq.

Further, the present invention is characterized by a color filter manufactured from the above self-luminous photosensitive resin composition and an image display device including the same.

As described above, the self-luminous photosensitive resin composition of the present invention has an effect of providing light-free efficiency in a hard baking process by including an alkali-soluble resin having an acrylonitrile equivalent of 300 to 2,000 g/eq. A problem of low density and poor photosensitive characteristics, and a high-quality color filter excellent in brightness characteristics.

The self-luminous photosensitive resin composition of the present invention contains an alkali-soluble resin, photoluminescence quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, and a solvent.

Hereinafter, the self-luminous photosensitive resin composition will be described in detail.

The alkali-soluble resin contained in the self-luminous photosensitive resin composition of the present invention functions to remove the non-exposed portion of the photosensitive resin layer and to remove the exposed region. Further, the alkali-soluble resin of the present invention can form a protective layer on the periphery of the surface of the quantum dot at the exposure stage by having a polymerizable unsaturated bond, thereby maximizing the influence of high temperature and oxygen radicals in the POB process. Exclude and maintain high brightness.

The above alkali-soluble resin is not required to have an unsaturated bond capable of being polymerized in the structure. Specific examples of the monomer include 3-(acryloxy)-2-hydroxypropyl (meth) acrylate and 2-methoxy-3-propen-2- oxy group. -propyl-2-methyl-2-propionate, 2-oxiranyl-3-propen-2-methoxy-propyl-2-butyrate, 1,3-propanediol di(A) Acrylate, 1,3-butanediol di(meth)acrylate, hydroquinone di(meth)acrylate, 1,4-phenylene di(meth)acrylate, 1,4-ring Hexanediol di(meth)acrylate, 2-propenyloxymethyl-2-propionate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,12-dodecanediol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, bisphenol A di( Methyl) acrylate, dicarbamate di(meth) acrylate, neopentyl glycol diacrylate, and the like.

The alkali-soluble resin may be a homopolymer or may be used in a form of a copolymer with a copolymer of another unsaturated monomer or a polymer obtained by polymerization of another unsaturated monomer. In this case, in the case of a copolymer, it may be in the form of an alternating copolymer, a random copolymer or a block copolymer, and is not particularly limited in the present invention.

The type of the monomer copolymerizable is not particularly limited, and specific examples thereof include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, and (meth)acrylic acid 2. An unsubstituted or substituted alkyl ester compound of an unsaturated carboxylic acid such as hydroxyethyl ester or aminoethyl (meth)acrylate; cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, methyl ring Hexyl (meth) acrylate, cycloheptyl (meth) acrylate, cyclooctyl (meth) acrylate, 2-isopropyl-5-methylcyclohexyl (meth) acrylate, (meth) acrylate Cyclopentenyl ester, cyclohexenyl (meth) acrylate, cycloheptenyl (meth) acrylate, cyclooctene (meth) acrylate, 2-isopropyl-5-methylcyclohexadienyl (meth) acrylate, isobornyl (meth) acrylate, tetrahydromethane (meth) acrylate, adamantyl (meth) acrylate, norbornene (meth) acrylate, (meth) acrylate An unsaturated carboxylic acid ester compound containing an alicyclic substituent such as tetrahydrofurfuryl ester or tricyclodecyl methacrylate; single saturation of a diol such as oligoethylene glycol monoalkyl (meth) acrylate Ester compounds; (meth) acrylate, benzyl (meth An oxyalkyl ester compound containing a substituent having an aromatic ring; an aromatic vinyl compound such as styrene, α-methylstyrene or vinyltoluene; vinyl acetate or vinyl propionate; a vinyl cyanide compound such as a vinyl carboxylate, (meth)acrylonitrile or α-chloroacrylonitrile; N-cyclohexyl maleimide, N-phenyl maleimide, N - a maleic acid imide compound such as benzyl maleimide or the like.

In the present invention, the alkali-soluble resin preferably has a polystyrene-equivalent weight average molecular weight of from 3,000 to 100,000, more preferably from 5,000 to 50,000. When the weight average molecular weight of the alkali-soluble resin is within the above range, the film of the exposed portion is less likely to be reduced during development, and the solubility in the non-exposed portion tends to be good, which is preferable.

The acid value of the alkali-soluble resin of the present invention is preferably in the range of 30 to 150 mg KOH/g based on the solid content. When the acid value is less than 30 mg KOH/g, the solubility in the alkaline developing solution may be lowered, and the residue may remain on the substrate. When the acid value exceeds 150 mg KOH/g, the possibility of pattern peeling may change. high.

The molecular weight distribution of the alkali-soluble resin is preferably from 1.0 to 6.0, more preferably from 1.5 to 4.0. When the molecular weight distribution of the alkali-soluble resin is within the above range, the developability is excellent.

The alkali-soluble resin of the present invention preferably has an acrylonitrile equivalent of 300 to 2,000 g/eq, and more preferably 400 to 1,000 g/eq. In the case where the alkali-soluble resin acrylonitrile equivalent is within the above range, development by matting in the color filter step can be prevented. On the other hand, in the case where the alkali-soluble resin acrylonitrile group equivalent exceeds 2,000 g/eq, the ability to effectively protect the quantum dots is insufficient, and therefore it is not suitable, and in the case where the acryl oxime equivalent is less than the above range, although the luminous efficiency is It is good in terms of it, but it has a problem of being insoluble and peeling off during development.

The alkali-soluble resin of the present invention is preferably contained in an amount of 5 to 80% by weight, more preferably 10 to 70% by weight, based on the solid content of the self-luminous photosensitive resin composition. When the content of the alkali-soluble resin is within the above range, the dispersion of the quantum dots is easy, and the luminous efficiency can be maintained high in the process.

The self-luminous photosensitive resin composition of the present invention contains photoluminescence quantum dot particles.

The so-called quantum dots are semiconductor materials of nanometer size. An atom forms a molecule, and a molecule forms a collection of small molecules such as a cluster to form a nanoparticle. Such nanoparticles are referred to as quantum dots, especially when they have semiconductor properties. If a quantum dot receives an energy from the outside and becomes an excited state, it releases its own energy in accordance with the corresponding energy band gap.

The photosensitive resin composition of the present invention contains such photoluminescent quantum dot particles, and a color filter produced therefrom can emit light (photoluminescence) by irradiation of light. Further, since light having color is released, further color reproducibility is excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

The quantum dot particles according to the present invention are not particularly limited as long as they can illuminate the quantum dot particles by light stimulation, and may be selected, for example, from a group II-VI semiconductor compound; a group III-V semiconductor compound; a group IV-VI semiconductor compound; a group consisting of a Group IV element or a compound comprising the same; and combinations thereof. They can be used singly or in combination of two or more.

The above Group II-VI semiconductor compound may be selected from the group consisting of two elements selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof. a compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof An elemental compound, and a four-element compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof; the above III-V semiconductor compound may be selected from the following materials Group: a two-element compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof, selected from the group consisting of GaNP, GaNAs, and GaNSb , GaPAs, GaPSb, AlNP, AlNAs, a three-element compound in the group consisting of AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof, and selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, a four-element compound in a group consisting of GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and a mixture thereof; the above IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, a di-element compound in a group consisting of PbS, PbSe, PbTe, and a mixture thereof, selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof a compound, and a four-element compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof; the above Group IV element or a compound comprising the same may be selected from the group consisting of Si, Ge, and An elemental compound in the group consisting of the mixture, and a di-element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

The quantum dot particles may be a homogeneous single structure; a double structure such as a core-shell, a gradient structure, or the like; or a mixed structure thereof.

Substances which form a core and a shell in a core-shell double structure, respectively, may be formed of mutually different semiconductor compounds mentioned above. For example, the core may include one or more selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.

A colored photosensitive resin composition used for the production of a usual color filter contains red, green, and blue colorants in order to express color. Similarly, photoluminescent quantum dot particles can be classified into red quantum dot particles. , green quantum dot particles and blue quantum dot particles, the quantum dot particles according to the present invention may be red quantum dot particles, green quantum dot particles Or blue quantum dot particles.

Quantum dot particles can be synthesized by a wet chemical process, an organometallic chemical vapor deposition process, or a molecular beam epitaxy process.

The wet chemical process is a method of growing a precursor by adding a precursor substance to an organic solvent. In the crystal growth, the organic solvent is naturally located on the surface of the quantum dot crystal, which acts as a dispersing agent to adjust the growth of the crystal. Therefore, it is combined with metal organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). Compared to vapor phase evaporation methods such as molecular beam epitaxy, the growth of nanoparticles can be controlled by an easier and cheaper process.

The content of the photoluminescence quantum dot particles according to the present invention is not particularly limited. For example, the total weight of the solid content of the self-luminous photosensitive resin composition is preferably 3 to 80% by weight, more preferably 5 to 70. % by weight included. When the content of the quantum dot particles is less than the above range, the light-emitting efficiency may be extremely weak. When the content is more than the above range, the content of the other components may be insufficient to form a pixel pattern.

The photopolymerizable compound contained in the self-luminous photosensitive resin composition of the present invention is a compound which can be polymerized by the action of light and a photopolymerization initiator described later, and examples thereof include a monofunctional monomer and a difunctional monomer. Other polyfunctional monomers and the like.

Specific examples of the monofunctional monomer include mercaptophenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, and acrylic acid 2- Hydroxyethyl ester, N-vinylpyrrolidone, and the like.

Specific examples of the difunctional monomer include 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, Triethylene glycol di(meth)acrylate, bis(acryloxyethyl)ether of bisphenol A, 3-methylpentanediol di(meth)acrylate, and the like.

Specific examples of other polyfunctional monomers include trimethylolpropane tri(methyl) Acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like. Among them, a difunctional or higher polyfunctional monomer is preferably used.

The photopolymerizable compound is preferably contained in an amount of 5 to 50% by mass, more preferably 7 to 45% by mass, based on the solid content of the self-luminous photosensitive resin composition. When the photopolymerizable compound is contained within the above range, the strength and smoothness of the pixel portion can be improved.

The photopolymerization initiator contained in the self-luminous photosensitive resin composition of the present invention is not limited, but is selected from the group consisting of a triazine compound, an acetophenone compound, a biimidazole compound, and an anthracene compound. One or more compounds. The self-luminous photosensitive resin composition containing the photopolymerization initiator described above is highly sensitive, and the pixel formed using the composition causes the strength and pattern property of the pixel portion to be good.

In addition, when a photopolymerization initiator is used in combination with a photopolymerization initiator, the self-luminous photosensitive resin composition containing the composition becomes more sensitive, and productivity when forming a color filter using the composition is improved. .

The triazine-based compound may, for example, be 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine or 2,4-bis (three) Chloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperidin-1,3,5-three Pyrazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6- [2-(5-Methylfuran-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl) )vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl] -1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-three And so on.

Examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzoin dimethyl ketal, and 2- Hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-(4-methyl) Thiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2- An oligomer of hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one or the like. Further, a compound represented by the following Chemical Formula 1 can be mentioned.

In the above Chemical Formula 1, R ₁ to R ₄ are each independently the same or different and each represents a hydrogen atom, a halogen atom, a hydroxyl group, a C1 to C12 alkyl group substituted or unsubstituted phenyl group, or a C1 to C12 alkyl group or Unsubstituted benzyl, or naphthyl substituted or unsubstituted with C1 to C12 alkyl.

The kind of the compound represented by the above Chemical Formula 1 is not particularly limited, and specific examples thereof include 2-methyl-2-amino (4-morpholinophenyl)ethane-1-one and 2-ethyl. 2-amino (4-morpholinophenyl)ethane-1-one, 2-propyl-2-amino (4-morpholinophenyl)ethane-1-one, 2-butyl 2-amino (4-morpholinophenyl)ethane-1-one, 2-methyl-2-amino (4-morpholinophenyl)propan-1-one, 2-methyl- 2-Amino (4-morpholinophenyl)butan-1-one, 2-ethyl-2-amino (4-morpholinophenyl)propan-1-one, 2-ethyl-2 -Amino (4-morpholinophenyl)butan-1-one, 2-methyl-2-methylamino (4-morpholinophenyl)propan-1-one, 2-methyl- 2-Dimethylamino (4-morpholinophenyl)propan-1-one, 2-methyl-2-diethylamino (4-morpholinophenyl)propan-1-one, and the like.

The biimidazole compound may, for example, be 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole or 2,2'-bis (2,3). -dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis Oxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole, 4,4',5 An imidazole compound substituted with an alkoxycarbonyl group of a phenyl group at the 5' position. Among them, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl) is preferably used. -4,4',5,5'-tetraphenylbiimidazole.

The above chemical formula is exemplified as the above hydrazine compound.

Further, other photopolymerization initiators and the like which are generally used in the art may be further included as long as the effects of the present invention are not impaired. Examples of the other photopolymerization initiator include a benzoin compound, a benzophenone compound, and 9-oxosulfuric acid. A compound, an oxime compound, or the like. They can be used alone or in combination of two or more.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.

Examples of the benzophenone-based compound include benzophenone, methyl orthobenzoate, 4-phenylbenzophenone, and 4-benzylidene-4'-methyldiphenyl sulfide. , 3,3',4,4'-tetra(t-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-di(N, N'-dimethylamino)-benzophenone and the like.

9-oxosulfur a compound, for example, 2-isopropyl 9-oxosulfur 2,4-diethyl 9-oxosulfur 2,4-dichloro 9-oxosulfur 1-chloro-4-propoxy 9-oxosulfur Wait.

The lanthanoid compound may, for example, be 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene or 2-ethyl-9. , 10-diethoxyanthracene, and the like.

Other examples include 2,4,6-trimethylbenzimidium diphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylhydrazine, benzoin, 9,10- As a other photopolymerization initiator, phenanthrenequinone, camphorquinone, benzamidine methyl formate, titanocene compound, and the like.

In addition, as the photopolymerization initiation aid which can be used in combination with the photopolymerization initiator in the present invention, one or more compounds selected from the group consisting of an amine compound, a carboxylic acid compound and the like can be preferably used.

Specific examples of the amine compound in the photopolymerization initiation aid include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine, and 4-dimethylaminobenzoic acid. Methyl ester, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethyl benzoate Aminoethyl ester, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (alias: Michler's ketone), 4,4'-double (two An aromatic amine compound such as ethylamino)benzophenone. As the amine compound, an aromatic amine compound is preferably used.

The carboxylic acid compound may, for example, be phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, or Oxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthio An aromatic heteroacetic acid such as acetic acid, N-naphthylglycine or naphthyloxyacetic acid.

The content of the photopolymerization initiator in the self-luminous photosensitive resin composition of the present invention is preferably 0.1 to 20% by mass, more preferably 1 to 10% by mass based on the total solid content. When the amount of the photopolymerization initiator to be used is within the above range, the self-luminous photosensitive resin composition is highly sensitive, and the strength of the pixel portion and the smoothness of the surface of the pixel portion are excellent.

Further, the amount of the photopolymerization initiation aid to be used is preferably from 0.1 to 20% by mass, more preferably from 1 to 10% by mass, based on the above criteria. When the amount of use of the photopolymerization-initiating aid is included in the above range, the sensitivity efficiency of the self-luminous photosensitive resin composition is further increased, and the productivity of the color filter formed using the composition can be improved. .

The solvent contained in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may be an organic solvent generally used in the art.

Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Diethylene glycol dialkyl ethers such as diol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether; methyl cellosolve B Ethylene glycol alkyl ether acetate such as acid ester or ethyl cellosolve acetate; propylene glycol dialkyl ether such as propylene glycol monomethyl ether; propylene glycol single Methyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, methoxypentyl acetate, etc. Ether acetates; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; , alcohols such as propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerol; esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; γ-butane a cyclic ester such as an ester; They can be used singly or in combination of two or more.

In the solvent, the viscosity can be changed according to the coating method and the apparatus. Therefore, the content of the solvent can be appropriately adjusted so that the concentration of the self-luminous photosensitive resin composition having the above-mentioned composition can be 10 to 50% by weight. Good is 10~30% by weight.

The content of the solvent in the present invention is not particularly limited, and may be, for example, 60 to 90% by weight, based on the total weight of the self-luminous photosensitive resin composition, and may be preferably 70 to 85% by weight. When the solvent is contained in the above range, the coatability is good.

Further, the present invention provides a color filter produced from the above self-luminous photosensitive resin composition.

When the color filter of the present invention is applied to an image display device, since light is emitted by light of a light source of the image display device, excellent light efficiency can be achieved. Further, since the light having the color is released, the color reproducibility is excellent, and since the light is emitted in all directions by photoluminescence, the viewing angle can be improved.

More specifically, in a conventional image display device including a color filter, white light passes through a color filter to express a color, and part of the light is absorbed by the color filter in the process, and thus light efficiency is sometimes lowered. However, in the case of the color filter manufactured from the self-luminous type photosensitive resin composition of the present invention, the color filter self-illuminates due to the light of the light source, so that excellent light efficiency can be achieved.

The color filter includes a substrate and a pattern layer formed on an upper portion of the substrate.

Regarding the substrate, the color filter itself may be a substrate, or may be a portion where the color filter is located in a display device or the like, and is not particularly limited. The substrate may be glass, germanium (Si), germanium oxide (SiO _x ) or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).

The pattern layer is a layer containing the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the above-described self-light-emitting photosensitive resin composition, exposing, developing, and thermally curing in a predetermined pattern.

The pattern layer formed of the self-luminous photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. When illuminated by light, the red pattern layer releases red light, the green pattern layer releases green light, and the blue pattern layer releases blue light.

In this case, when applied to the image display device, the light emitted from the light source is not particularly limited, but a light source that emits blue light can be used from the viewpoint of excellent color reproducibility.

According to another embodiment of the present invention, the pattern layer may include only a pattern layer of two colors of a red pattern layer, a green pattern layer, and a blue pattern layer. In this case, the pattern layer further includes a transparent pattern layer containing no quantum dot particles.

In the case of a pattern layer having only two colors, a light source that emits light of a wavelength of a remaining color that is not included in the display can be used. For example, in the case of including a red pattern layer and a green pattern layer, a light source that emits blue light can be used. In this case, the red quantum dot particles release red light, the green quantum dot particles release green light, and the transparent pattern layer directly transmits blue light to display blue.

The color filter including the substrate and the pattern layer described above may further include a spacer formed between the patterns, and may further include a black matrix. Further, a protective film formed on the upper portion of the pattern layer of the color filter may be further included.

Further, the present invention provides an image display device including the above color filter.

The color filter of the present invention can be applied not only to a common liquid crystal display device but also to It is used in various image display devices such as electroluminescence display devices, plasma display devices, and field emission display devices.

The image display device of the present invention may include a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. In this case, the light emitted from the light source is not particularly limited when applied to the image display device, but it is preferable to use a light source that emits blue light from the viewpoint of excellent color reproducibility.

According to another embodiment of the present invention, the image display device of the present invention may include a color filter including only a pattern layer of two colors of a red pattern layer, a green pattern layer, and a blue pattern layer. In this case, the color filter further includes a transparent pattern layer that does not contain quantum dot particles.

In the case of a pattern layer having only two colors, a light source that emits light of a wavelength of a remaining color that is not included in the display can be used. For example, in the case of including a red pattern layer and a green pattern layer, a light source that emits blue light can be used. In this case, the red quantum dot particles release red light, the green quantum dot particles release green light, and the transparent pattern layer directly transmits blue light to display blue.

The image display device of the present invention is excellent in light efficiency, exhibits high luminance, is excellent in color reproducibility, and has a wide viewing angle.

Hereinafter, the present invention will be described in detail by way of examples. However, the following examples are intended to further illustrate the invention, and the scope of the invention is not limited by the following examples. The following embodiments can be appropriately modified and changed by those skilled in the art within the scope of the invention.

Production Example 1. Photoluminescence Green Quantum Dot Particle A Synthesized CdSe (Nuclear) / ZnS (Shell) Structure

CdO (0.4 mmol), zinc acetate (4 mmol), oleic acid (5.5 mL) and 1-octadecene (20 mL) were added to the reactor and heated. The reaction was carried out at 150 °C. Then, in order to remove acetic acid generated by substituting zinc for oleic acid, the above reactant was allowed to stand under a vacuum of 100 mTorr for 20 minutes. Then, after applying a heat of 310 ° C to obtain a transparent mixture, after maintaining it at 310 ° C for 20 minutes, 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine. The Se and S solutions were quickly injected into a reactor to which Cd(OA) ₂ and Zn(OA) ₂ solutions were added. After the mixture thus obtained was grown at 310 ° C for 5 minutes, growth was interrupted by an ice bath. Then, it is precipitated with ethanol and centrifuged to separate quantum dots. The excess impurities are washed with chloroform and ethanol to obtain a liquefied acid stabilized, distributed nuclear particle size and shell thickness of 3~ Quantum dot particles A of CdSe (nuclear)/ZnS (shell) structure of 5 nm particles.

Production Example 2-1. Synthesis of alkali-soluble resin (D1)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 40 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 50 parts by weight of acrylic acid, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), and 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed, and a monomer dropping funnel was prepared. 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from the air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were started to be dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 h, and after 1 h, the temperature was raised to 110 ° C for 3 h, and then cooled to room temperature to obtain 29.1% by weight of a solid component, a weight average molecular weight of 10,000, and an acid value of 140 mg KOH / g resin D1.

Production Example 2-2: Synthesis of alkali-soluble resin (D2)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 40 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 50 parts by weight of acrylic acid, 4 parts by weight of the third butyl peroxide - 2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol monomethyl ether, and then stirred and mixed to prepare a monomer dropping funnel, and added 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were stirred and mixed to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from the air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C for 3 hours, and then the gas introduction tube was introduced to start bubbling of the oxygen/nitrogen=5/95 (v/v) mixed gas. Next, 5 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 parts by weight of triethylamine were placed in a flask. The reaction was continued at 110 ° C for 8 hours, and then cooled to room temperature to obtain 29.1% by weight of a resin D2 having a solid content of 10,000, an acid value of 130 mg KOH/g, and an acrylonitrile equivalent of 4,300 g/eq.

Production Example 2-3: Synthesis of alkali-soluble resin (D3)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 40 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 50 parts by weight of acrylic acid, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), and 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed, and a monomer dropping funnel was prepared. 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from the air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C for 3 hours, and then the gas introduction tube was introduced to start bubbling of the oxygen/nitrogen=5/95 (v/v) mixed gas. Next, 15 parts by weight of methyl group was placed in the flask. Glycidyl acrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), 0.8 parts by weight of triethylamine, the reaction was continued at 110 ° C for 8 hours, and then cooled. To room temperature, 29.1% by weight of a solid component, a resin D3 having a weight average molecular weight of 10,000, an acid value of 110 mg KOH/g, and an acrylonitrile equivalent of 1450 g/eq was obtained.

Production Example 2-4: Synthesis of alkali-soluble resin (D4)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 40 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 50 parts by weight of acrylic acid, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), and 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed, and a monomer dropping funnel was prepared. 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from the air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C for 3 hours, and then the gas introduction tube was introduced to start bubbling of the oxygen/nitrogen=5/95 (v/v) mixed gas. Next, 30 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 part by weight of triethylamine were placed in a flask. The reaction was continued at 110 ° C for 8 hours, and then cooled to room temperature to obtain 29.1% by weight of a resin D4 having a solid content of 10,000, an acid value of 85 mg KOH/g, and an acrylonitrile equivalent of 725 g/eq.

Production Example 2-5: Synthesis of alkali-soluble resin (D5)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 35 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 55 parts by weight of acrylic acid, 4 parts by weight of inter-t-butylperoxy-2-ethylhexanoate, and 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol monomethyl ether, stirred and mixed, preparing a monomer dropping funnel, adding 6 parts by weight of n-dodecyl mercaptan, 24 parts by weight of PGMEA, and stirring and mixing to prepare a chain transfer agent drip funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen by air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C for 3 hours, and then the gas introduction tube was introduced to start bubbling of the oxygen/nitrogen=5/95 (v/v) mixed gas. Next, 50 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 part by weight of triethylamine were placed in a flask. The reaction was continued at 110 ° C for 8 hours, and then cooled to room temperature to obtain 29.1% by weight of a solid component, a weight average molecular weight of 10,000, an acid value of 60 mg KOH / g, and an acrylonitrile equivalent of 435 g / eq of the resin D5.

Production Example 2-6: Synthesis of alkali-soluble resin (D6)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared, and on the other hand, 10 parts by weight of N-benzyl maleimide and 10 parts by weight of tricyclodecyl methacrylate were charged. 80 parts by weight of glycidyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, and 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") After 20 parts by weight of propylene glycol monomethyl ether, the mixture was stirred and mixed to prepare a monomer dropping funnel, and 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from the air, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C for 3 hours, and then the gas introduction tube was introduced to start bubbling of the oxygen/nitrogen=5/95 (v/v) mixed gas. Next, 85 parts by weight of acrylic acid, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 parts by weight were placed in a flask. Triethylamine was further reacted at 110 ° C for 8 hours, and then cooled to room temperature to obtain 29.1% by weight of a solid component, a weight average molecular weight of 10,000, an acid value of 60 mg KOH/g, and an acrylonitrile equivalent of 270 g/eq. D6.

Examples 1 to 3 and Comparative Examples 1 to 3: Production of a self-luminous photosensitive resin composition

After mixing the respective components, the mixture was diluted with propylene glycol monomethyl ether acetate so as to have a total solid content of 20% by weight, and then sufficiently stirred to obtain a self-luminous photosensitive resin composition.

Color filter (glass substrate) manufacturing example

The color filter was produced using the self-luminous photosensitive resin compositions produced in the above Examples 1 to 3 and Comparative Examples 1 to 3. In other words, each of the self-luminous photosensitive resin compositions described above was applied onto a glass substrate by a spin coating method, and then placed on a hot plate, and maintained at a temperature of 100 ° C for 3 minutes to form a film. Next, a test of a transmission pattern having a length × width of 20 mm × 20 mm regular square and a line/gap pattern of 1 μm to 100 μm was placed on the film. The photomask was irradiated with ultraviolet rays by a distance of 100 μm from the test photomask.

At this time, the ultraviolet light source was irradiated with an ultrahigh pressure mercury lamp (trade name: USH-250D) manufactured by Ushio Electric Co., Ltd. at an exposure amount (365 nm) of 200 mJ/cm ² in an air atmosphere, and a special optical filter was not used. The film irradiated with ultraviolet rays as described above was developed by immersing in a developing solution of KOH aqueous solution at pH 10.5 for 80 seconds. The glass plate to which the film was applied was washed with distilled water, and then dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C for 10 minutes to produce a color filter pattern. The film thickness of the self-luminous color pattern manufactured by the above was 3.0 μm.

Intensity measurement

The region where the light conversion was performed using a 365 nm Tube type 4W UV illuminator (VL-4LC, VILBER LOURMAT) in the pattern portion formed of the 20 mm × 20 mm regular square pattern in the color filter forming the above self-luminous pixel, in Example 1 In ~3 and Comparative Examples 1 to 2, the luminescence intensity (Intensity) in the 550 nm region was measured by a spectrometer (Spectrum meter, Ocean Optics). It can be judged that the higher the measured luminescence intensity (Intensity), the more excellent the self-luminous property is exhibited, and the measurement results of the luminescence intensity (Intensity) are shown in Table 2 below.

Further, hard bake was performed at 230 ° C for 60 minutes, and the intensity of the luminescence before the hard baking and the intensity of the luminescence after the hard baking were measured, and the level of the luminescence efficiency was confirmed, and the luminescence intensity was maintained in Table 2 Rate display.

Development type determination of self-luminous photosensitive resin composition

The self-luminous photosensitive resin compositions of the above Examples 1 to 3 and Comparative Examples 1 to 3 were applied onto a glass substrate by a spin coating method, and then placed on a hot plate and maintained at a temperature of 100 ° C. After forming a film for 3 minutes, it was immersed in a KOH aqueous solution developing solution having a pH of 10.5, and it was confirmed that the coated self-luminous photosensitive resin composition layer was in a dissolved form or a peeled form at the time of development. In Table 2 below.

In the case of a dissolved form, the formation of the pixel pattern becomes good, but in the form of peeling In the case of a state, there is a feature that the formation of a pixel pattern is difficult and cannot be used.

As is apparent from the above Table 2, in the case of Examples 1 to 3 and Comparative Example 3 in which a resin having an acryl oxime equivalent of 2,000 g/eq or less was used, it was confirmed that the luminescence intensity (Intensity) was superior to that of Comparative Examples 1 and 2. After the baking process at 230 ° C, the luminescence intensity was also maintained high.

In particular, in Examples 1 to 3 and Comparative Example 3, the more the acryl oxime equivalent is increased, the more the luminescence intensity (Intensity) and the maintenance ratio are increased. Therefore, it has been confirmed that the acryl oxime in the structure is obtained. The base acts as a protective layer of the quantum dots, and suppresses development by matting in the process. However, in the case of Comparative Example 3 in which a resin having an acrylonitrile equivalent of 300 g/eq or less was used, it was confirmed that the luminescence intensity and the maintenance ratio were high, whereas peeling occurred during development, which was not suitable for pattern formation.

Claims (9)

A self-luminous photosensitive resin composition comprising an alkali-soluble resin, photoluminescence quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, and a solvent, wherein the alkali-soluble resin has a polymerizable structure The saturated bond has an acrylonitrile equivalent of 300 to 2,000 g/eq. The self-luminous photosensitive resin composition of claim 1, which comprises 3 to 80% by weight of photoluminescence quantum dot particles, 5 to 10% by weight based on the total weight of the solid content in the self-luminous photosensitive resin composition. 50% by weight of a photopolymerizable compound, 0.1 to 20% by weight of a photopolymerization initiator, and 5 to 80% by weight of an alkali-soluble resin. The self-luminous type photosensitive resin composition of claim 1, wherein the alkali-soluble resin is selected from the group consisting of 3-(acryloxy)-2-hydroxypropyl (meth) acrylate, 2-methoxy- 3-propen-2-oxo-propyl-2-methyl-2-propionate, 2-oxiranyl-3-propen-2-oxooxy-propyl-2-butyrate , 1,3-propanediol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, hydroquinone di(meth)acrylate, 1,4-phenylene di(methyl) Acrylate, 1,4-cyclohexanediol di(meth)acrylate, 2-propenyloxymethyl-2-propionate, triethylene glycol di(meth)acrylate, tetraethylene Alcohol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,12-dodecanediol di(meth)acrylate, trimethylolpropane tris(methyl) One or more of the group consisting of acrylate, bisphenol A di(meth) acrylate, dicarbamate di(meth) acrylate, and neopentyl glycol diacrylate. The self-luminous photosensitive resin composition of claim 1, wherein the alkali-soluble resin has a polystyrene-equivalent weight average molecular weight of 3,000 to 100,000. The self-luminous type photosensitive resin composition of claim 1, wherein the alkali-soluble resin has an acid value of 30 to 150 mg KOH/g. The self-luminous type photosensitive resin composition of claim 1, wherein the photoluminescent quantum dot particles are red quantum dot particles, green quantum dot particles, or blue quantum dot particles. The self-luminous type photosensitive resin composition of claim 1, wherein the photoluminescent quantum dot particles comprise a compound selected from the group consisting of a II-VI semiconductor compound, a III-V semiconductor compound, an IV-VI semiconductor compound, and a group IV element. Or one of a group consisting of a compound thereof, and combinations thereof. A color filter manufactured by the self-luminous type photosensitive resin composition according to any one of claims 1 to 7. An image display device comprising the color filter of claim 8.