JP6768278B2 - Photosensitive resin composition - Google Patents
Photosensitive resin composition Download PDFInfo
- Publication number
- JP6768278B2 JP6768278B2 JP2015198716A JP2015198716A JP6768278B2 JP 6768278 B2 JP6768278 B2 JP 6768278B2 JP 2015198716 A JP2015198716 A JP 2015198716A JP 2015198716 A JP2015198716 A JP 2015198716A JP 6768278 B2 JP6768278 B2 JP 6768278B2
- Authority
- JP
- Japan
- Prior art keywords
- butyl
- photosensitive resin
- resin composition
- bis
- quantum dot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 title claims description 64
- 239000002245 particle Substances 0.000 claims description 72
- 239000002096 quantum dot Substances 0.000 claims description 72
- -1 N-substituted maleimide Chemical class 0.000 claims description 62
- 150000001875 compounds Chemical class 0.000 claims description 51
- 239000003963 antioxidant agent Substances 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 29
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 21
- 230000003078 antioxidant effect Effects 0.000 claims description 20
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 18
- 239000003999 initiator Substances 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 229920005989 resin Polymers 0.000 claims description 15
- 239000004065 semiconductor Substances 0.000 claims description 15
- 239000007787 solid Substances 0.000 claims description 15
- 239000000178 monomer Substances 0.000 claims description 14
- 238000005424 photoluminescence Methods 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 13
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 9
- 239000007983 Tris buffer Substances 0.000 claims description 9
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 8
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims description 8
- 239000011574 phosphorus Substances 0.000 claims description 8
- 239000011593 sulfur Substances 0.000 claims description 8
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 7
- 229910004613 CdTe Inorganic materials 0.000 claims description 7
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 claims description 7
- 229910007709 ZnTe Inorganic materials 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000000049 pigment Substances 0.000 claims description 7
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 6
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 claims description 6
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 claims description 6
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 claims description 5
- 239000011258 core-shell material Substances 0.000 claims description 5
- 230000009977 dual effect Effects 0.000 claims description 5
- 239000002530 phenolic antioxidant Substances 0.000 claims description 5
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 claims description 4
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 claims description 4
- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 claims description 4
- 229910002601 GaN Inorganic materials 0.000 claims description 4
- 229910005540 GaP Inorganic materials 0.000 claims description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 4
- 229910004262 HgTe Inorganic materials 0.000 claims description 4
- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 4
- FQUNFJULCYSSOP-UHFFFAOYSA-N bisoctrizole Chemical compound N1=C2C=CC=CC2=NN1C1=CC(C(C)(C)CC(C)(C)C)=CC(CC=2C(=C(C=C(C=2)C(C)(C)CC(C)(C)C)N2N=C3C=CC=CC3=N2)O)=C1O FQUNFJULCYSSOP-UHFFFAOYSA-N 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 229910021480 group 4 element Inorganic materials 0.000 claims description 4
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 4
- FGHOOJSIEHYJFQ-UHFFFAOYSA-N (2,4-ditert-butylphenyl) dihydrogen phosphite Chemical compound CC(C)(C)C1=CC=C(OP(O)O)C(C(C)(C)C)=C1 FGHOOJSIEHYJFQ-UHFFFAOYSA-N 0.000 claims description 3
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 claims description 3
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 claims description 3
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 claims description 3
- YLUZWKKWWSCRSR-UHFFFAOYSA-N 3,9-bis(8-methylnonoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCC(C)C)OCC21COP(OCCCCCCCC(C)C)OC2 YLUZWKKWWSCRSR-UHFFFAOYSA-N 0.000 claims description 3
- PRWJPWSKLXYEPD-UHFFFAOYSA-N 4-[4,4-bis(5-tert-butyl-4-hydroxy-2-methylphenyl)butan-2-yl]-2-tert-butyl-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(C)CC(C=1C(=CC(O)=C(C=1)C(C)(C)C)C)C1=CC(C(C)(C)C)=C(O)C=C1C PRWJPWSKLXYEPD-UHFFFAOYSA-N 0.000 claims description 3
- ONTIGGPRJSEVGB-UHFFFAOYSA-N 6-decoxybenzo[c][2,1]benzoxaphosphinine 6-oxide Chemical compound C1=CC=C2P(OCCCCCCCCCC)(=O)OC3=CC=CC=C3C2=C1 ONTIGGPRJSEVGB-UHFFFAOYSA-N 0.000 claims description 3
- NLRVQGZDJHUKOM-UHFFFAOYSA-N 6-methyl-4,6-bis(octylsulfanylmethoxy)cyclohexa-1,3-dien-1-ol Chemical compound C(CCCCCCC)SCOC1(CC(=CC=C1O)OCSCCCCCCCC)C NLRVQGZDJHUKOM-UHFFFAOYSA-N 0.000 claims description 3
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 claims description 3
- HUUJFOGLCYMPCS-UHFFFAOYSA-N C(C)(C)(C)C(CC(C(O[P])OC1=CC=CC=C1)CC)CCC(C)(C)C Chemical compound C(C)(C)(C)C(CC(C(O[P])OC1=CC=CC=C1)CC)CCC(C)(C)C HUUJFOGLCYMPCS-UHFFFAOYSA-N 0.000 claims description 3
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052949 galena Inorganic materials 0.000 claims description 3
- CSWFWSPPZMEYAY-UHFFFAOYSA-N octadecyl dihydrogen phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(O)O CSWFWSPPZMEYAY-UHFFFAOYSA-N 0.000 claims description 3
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims description 3
- 229910052950 sphalerite Inorganic materials 0.000 claims description 3
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- SUXIKHBBPQWLHO-UHFFFAOYSA-N trihydroxy-(8-methylnonyl)-(8-methyl-1-phenylnonyl)-lambda5-phosphane Chemical compound CC(C)CCCCCCCP(O)(O)(O)C(CCCCCCC(C)C)C1=CC=CC=C1 SUXIKHBBPQWLHO-UHFFFAOYSA-N 0.000 claims description 3
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 3
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 claims description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 2
- SFIRFYRWCFNIAJ-UHFFFAOYSA-N 2,6-bis(dodecylsulfanylmethyl)-4,4-bis(3-dodecylsulfanylpropanoyloxymethyl)heptanedioic acid Chemical compound CCCCCCCCCCCCSCCC(=O)OCC(CC(CSCCCCCCCCCCCC)C(O)=O)(CC(CSCCCCCCCCCCCC)C(O)=O)COC(=O)CCSCCCCCCCCCCCC SFIRFYRWCFNIAJ-UHFFFAOYSA-N 0.000 claims description 2
- ZUEQUQSNOMEMJR-UHFFFAOYSA-N 4-[[3,5-bis[(4-hydroxyphenyl)methyl]phenyl]methyl]phenol Chemical compound C1=CC(O)=CC=C1CC1=CC(CC=2C=CC(O)=CC=2)=CC(CC=2C=CC(O)=CC=2)=C1 ZUEQUQSNOMEMJR-UHFFFAOYSA-N 0.000 claims description 2
- ZVVFVKJZNVSANF-UHFFFAOYSA-N 6-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]hexyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCCCCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 ZVVFVKJZNVSANF-UHFFFAOYSA-N 0.000 claims description 2
- MXFVKYNQQHVOQP-UHFFFAOYSA-N C(CCCCCCC)P(O)(O)OC1=CC=C(C=C1C(C)(C)C)C(C)(C)C Chemical compound C(CCCCCCC)P(O)(O)OC1=CC=C(C=C1C(C)(C)C)C(C)(C)C MXFVKYNQQHVOQP-UHFFFAOYSA-N 0.000 claims description 2
- BEIOEBMXPVYLRY-UHFFFAOYSA-N [4-[4-bis(2,4-ditert-butylphenoxy)phosphanylphenyl]phenyl]-bis(2,4-ditert-butylphenoxy)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(C=1C=CC(=CC=1)C=1C=CC(=CC=1)P(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C BEIOEBMXPVYLRY-UHFFFAOYSA-N 0.000 claims description 2
- RIGJHQFSJDRFFJ-UHFFFAOYSA-N 3-(2-methylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC=CC=C1C1=CC(=O)NC1=O RIGJHQFSJDRFFJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000975 dye Substances 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 34
- 238000000034 method Methods 0.000 description 21
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 3
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 239000005642 Oleic acid Substances 0.000 description 3
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000002542 deteriorative effect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000004649 discoloration prevention Methods 0.000 description 3
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 3
- 238000004020 luminiscence type Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 2
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- HOADWBBFXCDCTC-UHFFFAOYSA-N 2-(dimethylamino)-2-methyl-1-(4-morpholin-4-ylphenyl)propan-1-one Chemical compound C1=CC(C(=O)C(C)(C)N(C)C)=CC=C1N1CCOCC1 HOADWBBFXCDCTC-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- BERJMFPEDDOMCI-UHFFFAOYSA-N 2-amino-2-methyl-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C1=CC(C(=O)C(C)(N)CC)=CC=C1N1CCOCC1 BERJMFPEDDOMCI-UHFFFAOYSA-N 0.000 description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 2
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
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- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
- C09B67/0041—Blends of pigments; Mixtured crystals; Solid solutions mixtures containing one azo dye
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G02—OPTICS
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- G02B5/00—Optical elements other than lenses
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G03F7/004—Photosensitive materials
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- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Description
本発明は、感光性樹脂組成物に関する。 The present invention relates to a photosensitive resin composition.
カラーフィルタは、白色光から赤、緑、青の3種の色を抽出して微細な画素単位を可能とする薄膜フィルタ型光学部品として、一つの画素の大きさが数十から数百マイクロメートル程度である。このようなカラーフィルタは、各々の画素の間の境界部分を遮光するために透明基板上に決まったパターンで形成されたブラックマトリックス層、及び各々の画素を形成するために複数の色(通常、赤色(R)、緑色(G)及び青色(B))の3原色を決まった手順で配列した画素部が順に積層された構造を取っている。一般的に、カラーフィルタは、染色法、電着法、印刷法、顔料分散法などにより3種以上の色相を透明基板上にコーティングして製造することができる。最近は、顔料分散型の感光性樹脂を利用した顔料分散法が主に用いられている。 The color filter is a thin film filter type optical component that extracts three kinds of colors of red, green, and blue from white light to enable fine pixel units, and the size of one pixel is several tens to several hundreds of micrometers. Degree. Such a color filter has a black matrix layer formed in a fixed pattern on a transparent substrate to block the boundary between each pixel, and a plurality of colors (usually, usually) to form each pixel. It has a structure in which pixel portions in which the three primary colors (red (R), green (G), and blue (B)) are arranged in a predetermined procedure are laminated in order. Generally, a color filter can be manufactured by coating three or more kinds of hues on a transparent substrate by a dyeing method, an electrodeposition method, a printing method, a pigment dispersion method, or the like. Recently, a pigment dispersion method using a pigment dispersion type photosensitive resin has been mainly used.
カラーフィルタを具現する方法の一つである顔料分散法は、黒色マトリックスが提供された透明な基質上に着色剤及びアルカリ可溶性樹脂、光重合単量体、光重合開始剤、エポキシ樹脂、溶剤、その他添加剤を含む感光性樹脂組成物をコーティングし、形成しようとする形態のパターンを露光した後、非露光部位を溶剤で除去して熱硬化させる一連の過程を繰り返すことで着色薄膜を形成する方法である。この方法は、携帯電話、ノート型PC、モニター、TVなどのLCDの製造において活発に応用されている。近来は、さまざまな長所を有する顔料分散法を利用したカラーフィルタ用感光性樹脂組成物においても、優秀なパターン特性だけではなく、高い色再現率、高輝度及び高明暗比などが一層向上された性能が要求されていることが実情である。 The pigment dispersion method, which is one of the methods for embodying a color filter, comprises a colorant and an alkali-soluble resin, a photopolymerization monomer, a photopolymerization initiator, an epoxy resin, and a solvent on a transparent substrate provided with a black matrix. A colored thin film is formed by coating a photosensitive resin composition containing other additives, exposing the pattern of the form to be formed, and then repeating a series of processes of removing the unexposed portion with a solvent and thermally curing the non-exposed portion. The method. This method has been actively applied in the manufacture of LCDs for mobile phones, notebook PCs, monitors, TVs and the like. Recently, not only excellent pattern characteristics but also high color reproduction rate, high brightness and high brightness / darkness ratio have been further improved in the photosensitive resin composition for color filters using the pigment dispersion method having various advantages. The reality is that performance is required.
しかし、色再現は、光源から照射された光がカラーフィルタを透過して具現されるが、この過程で光の一部がカラーフィルタに吸収されるので、光効率が低下され、また、色フィルタとしての顔料特性によって完璧な色再現は不可能であるという根本的な限界がある。 However, color reproduction is realized by passing the light emitted from the light source through the color filter, but in this process, a part of the light is absorbed by the color filter, so that the light efficiency is lowered and the color filter is also used. There is a fundamental limitation that perfect color reproduction is not possible due to the pigment characteristics as.
大韓民国公開特許第2012−112188号公報には、カラーフィルタ用赤色着色組成物及びカラーフィルタが開示されているが、前記問題点に対する代案は提示していない。 The Republic of Korea Publication No. 2012-12188 discloses a red coloring composition for a color filter and a color filter, but does not present an alternative to the above problem.
本発明は、発光特性の低下なしに量子効率を高めることができる感光性樹脂組成物を提供することを目的とする。 An object of the present invention is to provide a photosensitive resin composition capable of increasing quantum efficiency without deteriorating light emission characteristics.
また、本発明は、パターンの形成性及び発光特性が改善されたカラーフィルタを製造することができる感光性樹脂組成物を提供することを目的とする。 Another object of the present invention is to provide a photosensitive resin composition capable of producing a color filter having improved pattern formability and light emitting characteristics.
また、本発明は、前記感光性樹脂組成物で製造されたカラーフィルタ及びそれを含む画像表示装置を提供することを目的とする。 Another object of the present invention is to provide a color filter manufactured of the photosensitive resin composition and an image display device including the color filter.
<1>フォトルミネッセンス量子ドットの粒子、光重合性化合物、光重合開始剤、アルカリ可溶性樹脂、溶剤及び酸化防止剤を含み、前記酸化防止剤は、組成物の固形分総重量中0.1〜10重量%で含まれる感光性樹脂組成物。 <1> Photoluminescence Quantum dot particles, photopolymerizable compound, photopolymerization initiator, alkali-soluble resin, solvent and antioxidant are included, and the antioxidant is 0.1 to 0.1 to the total solid weight of the composition. A photosensitive resin composition contained in an amount of 10% by weight.
<2>前記フォトルミネッセンス量子ドットは、コア−シェル二重構造を有するものであって、前記コアは、CdSe、CdS、ZnS、ZnSe、ZnTe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS、HgS、HgSe、HgTe、GaN、GaP、GaAs、InP、InAs及びZnOからなる群から選択される一つ以上であり、前記シェルは、CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及びHgSeからなる群から選択される一つ以上である前記<1>に記載の感光性樹脂組成物。 <2> The photoluminescence quantum dot has a core-shell dual structure, and the core has CdSe, CdS, ZnS, ZnSe, ZnTe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, HgS, HgSe. , HgTe, GaN, GaP, GaAs, InP, InAs and ZnO, the shell consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe and HgSe. The photosensitive resin composition according to <1>, which is one or more selected from the group.
<3>前記フォトルミネッセンス量子ドットの前記粒子は、赤色量子ドット粒子、緑色量子ドット粒子または青色量子ドット粒子である前記<1>に記載の感光性樹脂組成物。 <3> The photosensitive resin composition according to <1>, wherein the particles of the photoluminescence quantum dots are red quantum dot particles, green quantum dot particles, or blue quantum dot particles.
<4>前記フォトルミネッセンス量子ドットの前記粒子は、II−VI族半導体化合物;III−V族半導体化合物;IV−VI族半導体化合物;IV族元素またはこれを含む化合物;またはこれらの組合せで構成されている前記<1>に記載の感光性樹脂組成物。 <4> The particles of the photoluminescence quantum dots are composed of a group II-VI semiconductor compound; a group III-V semiconductor compound; a group IV-VI semiconductor compound; a group IV element or a compound containing the same; or a combination thereof. The photosensitive resin composition according to <1>.
<5>前記酸化防止剤は、リン系、硫黄系及びフェノール系酸化防止剤からなる群から選択される少なくとも一つを含む前記<1>に記載の感光性樹脂組成物。 <5> The photosensitive resin composition according to <1>, wherein the antioxidant contains at least one selected from the group consisting of phosphorus-based, sulfur-based and phenol-based antioxidants.
<6>前記リン系酸化防止剤は、3,9−ビス(2,6−ジ−tert−ブチル−4−メチルフェノキシ)−2,4,8,10−テトラオキサ−3,9−ジホスファスピロ[5.5]ウンデカン、ジイソデシルペンタエリスリトールジホスファイト、ビス(2,4−ジ−t−ブチルフェニル)ペンタエリスリトールジホスファイト、2,2’−メチレンビス(4,6−ジ−t−ブチル−1−フェニルオキシ)(2−エチルヘキシルオキシ)ホスホラス、6−[3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロポキシ]−2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1,3,2]ジオキサホスフェピン、トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、4,4’−ブチリデン−ビス(3−メチル−6−t−ブチルフェニルジトリデシル)ホスファイト、オクタデシルホスファイト、トリス(ノニルフェニル)ホスファイト、9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−デシルオキシ−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,6−ジ−t−ブチルフェニル)ホスファイト、2,2−メチレンビス(4,6−ジ−t−ブチルフェニル)オクチルホスファイト、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、テトラキス(2,4−ジ−t−ブチルフェニル)[1,1−ビフェニル]−4,4’−ジイルビスホスホナイト、ビス[2,4−ビス(1,1−ジメチルエチル)−6−メチルフェニル]エチルエステル及びホスホン酸からなる群から選択される1種以上である前記<5>に記載の感光性樹脂組成物。 <6> The phosphorus-based antioxidant is 3,9-bis (2,6-di-tert-butyl-4-methylphenoxy) -2,4,8,10-tetraoxa-3,9-diphosphaspiro [5]. .5] Undecane, diisodecylpentaerythritol diphosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, 2,2'-methylenebis (4,6-di-t-butyl-1- Phenyloxy) (2-ethylhexyloxy) phosphorus, 6- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-t-butyldibenz [d] , F] [1,3,2] dioxaphosphepine, triphenylphosphite, diphenylisodecylphosphite, phenyldiisodecylphosphite, 4,4'-butylidene-bis (3-methyl-6-t-butyl) Phenylditridecyl) phosphite, octadecylphosphite, tris (nonylphenyl) phosphite, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t-) Butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- Oxide, Tris (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetraylbis (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetraylbis (2, 6-di-t-butylphenyl) phosphite, 2,2-methylenebis (4,6-di-t-butylphenyl) octylphosphite, tris (2,4-di-t-butylphenyl) phosphite, tetrakis (2,4-di-t-Butylphenyl) [1,1-biphenyl] -4,4'-diylbisphosphonite, bis [2,4-bis (1,1-dimethylethyl) -6-methylphenyl ] The photosensitive resin composition according to <5>, which is one or more selected from the group consisting of ethyl ester and phosphonic acid.
<7>前記硫黄系酸化防止剤は、2,2−ビス({[3−(ドデシルチオ)プロピオニル]オキシ}メチル)−1,3−プロパンジイル−ビス[3−(ドデシルチオ)プロピオネート]、2−メルカプトベンズイミダゾール、ジラウリル−3,3’−チオジプロピオネート、ジミリスチル−3,3’−チオジプロピオネート、ジステアリル−3,3’−チオジプロピオネート、ペンタエリスリチル−テトラキス(3−ラウリルチオプロピオネート)及び2−メルカプトベンズイミダゾールからなる群から選択される1種以上である前記<5>に記載の感光性樹脂組成物。 <7> The sulfur-based antioxidant is 2,2-bis ({[3- (dodecylthio) propionyl] oxy} methyl) -1,3-propanediyl-bis [3- (dodecylthio) propionate], 2-. Mercaptobenzimidazole, dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate, pentaerythricyl-tetrakis (3-lauryl) The photosensitive resin composition according to <5> above, which is one or more selected from the group consisting of thiopropionate) and 2-mercaptobenzimidazole.
<8>前記フェノール系酸化防止剤は、3,9−ビス[2−〔3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ〕−1,1−ジメチルエトキシ]−2,4,8,10−テトラオキサスピロ[5.5]ウンデカン、ペンタエリスリチル・テトラキス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、1,3,5−トリメチル−2,4,6−トリス(3’, 5’−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、トリエチレングリコール−ビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)、トリス−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−イソシアヌレート、1,3,5−トリス(4−t−ブチル−3−ヒドロキシ−2,6−ジメチルベンジル)−イソシアヌレート、1,6−ヘキサンジオール−ビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、2,2−チオ−ジエチレンビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナムアミド)、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、2,4−ビス[(オクチルチオ)メチル]−O−クレゾール、1,6−ヘキサンジオール−ビス−[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、オクタデシル−[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、4,4’−ブチリデン−ビス(3−メチル−6−t−ブチルフェノール)、1,1,3−トリス(2−メチル−4−ヒドロキシ−5−t−ブチルフェニル)ブタン、1,3,5−トリス(4−ヒドロキシベンジル)ベンゼン及びテトラキス[メチレン−3−(3,5’−ジ−t−ブチル−4’−ヒドロキシフェニルプロピオネート)]メタンからなる群から選択される1種以上である前記<5>に記載の感光性樹脂組成物。 <8> The phenolic antioxidant is 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy] -1,1-dimethylethoxy]-. 2,4,8,10-Tetraoxaspiro [5.5] undecane, pentaerythrityl tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 1,3,5 -Trimethyl-2,4,6-tris (3', 5'-di-t-butyl-4-hydroxybenzyl) benzene, triethylene glycol-bis [3- (3-t-butyl-5-methyl-4) -Hydroxyphenyl) propionate], 4,4'-thiobis (6-t-butyl-3-methylphenol), tris- (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanurate, 1, 3,5-Tris (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -isocyanurate, 1,6-hexanediol-bis [3- (3,5-di-t-butyl-4) -Hydroxyphenyl) propionate], 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], N, N'-hexamethylenebis (3,5-) Di-t-butyl-4-hydroxy-hydrocinnamamide), 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene, 2 , 4-bis [(octylthio) methyl] -O-cresol, 1,6-hexanediol-bis- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], octadecyl- [3 -(3,5-di-t-butyl-4-hydroxyphenyl) propionate, 2,2'-methylenebis (4-methyl-6-t-butylphenol), 4,4'-butylidene-bis (3-methyl- 6-t-Butylphenol), 1,1,3-tris (2-methyl-4-hydroxy-5-t-butylphenyl) butane, 1,3,5-tris (4-hydroxybenzyl) benzene and tetrakis [methylene -3- (3,5'-di-t-butyl-4'-hydroxyphenylpropionate)] The photosensitive resin composition according to <5>, which is one or more selected from the group consisting of methane.
<9>前記組成物の固形分総重量中、前記フォトルミネッセンス量子ドットの前記粒子は、3〜80重量%、前記光重合性化合物は、5〜70重量%、前記光重合開始剤は、0.1〜20重量%、前記アルカリ可溶性樹脂は、5〜80重量%で含まれる前記<1>に記載の感光性樹脂組成物。 <9> In the total solid content weight of the composition, the particles of the photoluminescence quantum dots are 3 to 80% by weight, the photopolymerizable compound is 5 to 70% by weight, and the photopolymerization initiator is 0. The photoluminescent resin composition according to <1>, wherein the alkali-soluble resin is contained in an amount of 1 to 20% by weight and 5 to 80% by weight.
<10>前記組成物の総重量中、前記溶剤は、60〜90重量%で含まれる前記<1>に記載の感光性樹脂組成物。 <10> The photosensitive resin composition according to <1>, wherein the solvent is contained in an amount of 60 to 90% by weight based on the total weight of the composition.
<11>前記<1>〜<10>のうちいずれか一つに記載の前記感光性樹脂組成物で製造されたカラーフィルタ。 <11> A color filter produced by the photosensitive resin composition according to any one of <1> to <10>.
<12>前記カラーフィルタは、赤色量子ドット粒子を含有した赤色パターン層、緑色量子ドット粒子を含有した緑色パターン層及び量子ドット粒子を含有しない透明パターン層を含む前記<11>に記載のカラーフィルタ。 <12> The color filter according to <11>, wherein the color filter includes a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a transparent pattern layer not containing quantum dot particles. ..
<13>前記<11>に記載のカラーフィルタを含む画像表示装置。 <13> An image display device including the color filter according to <11>.
<14>前記画像表示装置は、青色光を放出する光源及び、赤色量子ドット粒子を含有した赤色パターン層、緑色量子ドット粒子を含有した緑色パターン層及び量子ドット粒子を含まない透明パターン層を含む前記カラーフィルタを備えた前記<13>に記載の画像表示装置。 <14> The image display device includes a light source that emits blue light, a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a transparent pattern layer not containing quantum dot particles. The image display device according to <13>, which includes the color filter.
本発明の感光性樹脂組成物は、発光特性の低下なしに量子効率を高めることができる。 The photosensitive resin composition of the present invention can increase the quantum efficiency without deteriorating the light emitting characteristics.
本発明の感光性樹脂組成物でカラーフィルタを製造する場合、パターン形成性が優秀であり、発光特性が顕著に改善される。 When a color filter is produced from the photosensitive resin composition of the present invention, the pattern forming property is excellent and the light emitting characteristics are remarkably improved.
本発明は、フォトルミネッセンス量子ドットの粒子、光重合性化合物、光重合開始剤、アルカリ可溶性樹脂、溶剤及び酸化防止剤を含み、前記酸化防止剤は、組成物の固形分総重量中0.1〜10重量%で含まれることで、発光特性の低下なしに量子効率を高めて、パターン形成性及び発光特性が改善されたカラーフィルタを製造することができる感光性樹脂組成物に関する。 The present invention includes particles of photoluminescent quantum dots, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a solvent and an antioxidant, and the antioxidant is 0.1 in the total solid weight of the composition. The present invention relates to a photoluminescent resin composition capable of producing a color filter having improved pattern forming property and light emitting property by increasing quantum efficiency without deteriorating light emitting property by containing 10% by weight.
以下、本発明を詳しく説明する。 Hereinafter, the present invention will be described in detail.
<感光性樹脂組成物>
本発明の感光性樹脂組成物は、フォトルミネッセンス量子ドットの粒子、光重合性化合物、光重合開始剤、アルカリ可溶性樹脂、溶剤及び組成物の固形分総重量中0.1〜10重量%で含まれる酸化防止剤を含む。
<Photosensitive resin composition>
The photosensitive resin composition of the present invention contains 0.1 to 10% by weight of the total solid content of the photoluminescent quantum dot particles, photopolymerizable compound, photopolymerization initiator, alkali-soluble resin, solvent and composition. Contains antioxidants.
フォトルミネッセンス量子ドットの粒子
本発明の感光性樹脂組成物は、フォトルミネッセンス量子ドットの粒子を含む。
Particles of Photoluminescent Quantum Dots The photosensitive resin composition of the present invention contains particles of photoluminescent quantum dots.
量子ドットとは、ナノサイズの半導体物質である。原子が分子を成して、分子は、クラスタという小さい分子の集合体を構成してナノ粒子を形成する。このようなナノ粒子が特に半導体特性を示しているとき、これを量子ドットと言う。 Quantum dots are nano-sized semiconductor materials. Atoms form molecules, which form an aggregate of small molecules called clusters to form nanoparticles. When such nanoparticles exhibit particularly semiconductor properties, they are called quantum dots.
量子ドットは、外部からエネルギーを受けて浮き立った状態に至ると、自体(自律)的に該当するエネルギーバンドギャップによるエネルギーを放出する。 When a quantum dot receives energy from the outside and reaches a floating state, it emits energy due to its own (autonomously) corresponding energy band gap.
本発明の感光性樹脂組成物は、このようなフォトルミネッセンス量子ドットの粒子を含むことで、それから製造されたカラーフィルタは、光の照射によって発光(フォトルミネッセンス)できる。 The photosensitive resin composition of the present invention contains such particles of photoluminescence quantum dots, so that the color filter produced from the photosensitive resin composition can emit light (photoluminescence) by irradiation with light.
カラーフィルタを含む通常の画像表示装置では、白色光がカラーフィルタを透過してカラーが具現される。この過程で、光の一部がカラーフィルタに吸収されるので、光効率が低下される。しかし、本発明の感光性樹脂組成物で製造されたカラーフィルタを含む場合には、カラーフィルタが光源の光により自体発光するので、一層優れた光効率を具現することができる。 In a normal image display device including a color filter, white light passes through the color filter to realize color. In this process, a part of the light is absorbed by the color filter, so that the light efficiency is lowered. However, when the color filter produced by the photosensitive resin composition of the present invention is included, the color filter itself emits light by the light of the light source, so that more excellent light efficiency can be realized.
また、色相を有した光が放出されることなので、色再現性がより優秀であり、フォトルミネッセンスにより全方向に光が放出されることで、視野角も改善できる。 Further, since light having a hue is emitted, the color reproducibility is more excellent, and the viewing angle can be improved by emitting light in all directions by photoluminescence.
本発明による量子ドット粒子は、光による刺激によって発光できる量子ドット粒子であれば、特別に限定されず、例えば、II−VI族半導体化合物;III−V族半導体化合物;IV−VI族半導体化合物;IV族元素またはこれを含む化合物;及びこれらの組合せからなる群から選択されることができる。これらは、単独または2種以上を混合して使用することができる。 The quantum dot particles according to the present invention are not particularly limited as long as they are quantum dot particles that can emit light when stimulated by light, and are, for example, II-VI group semiconductor compounds; III-V group semiconductor compounds; IV-VI group semiconductor compounds; It can be selected from the group consisting of group IV elements or compounds containing them; and combinations thereof. These can be used alone or in combination of two or more.
前記II−VI族半導体化合物は、CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe及びこれらの混合物からなる群から選択される二元化合物;CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe及びこれらの混合物からなる群から選択される三元化合物;及びCdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe及びこれらの混合物からなる群から選択される四元化合物からなる群から選択されることができる。前記III−V族半導体化合物は、GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb及びこれらの混合物からなる群から選択される二元化合物;GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP及びこれらの混合物からなる群から選択される三元化合物;及びGaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb及びこれらの混合物からなる群から選択される四元化合物からなる群から選択されることができる。前記IV−VI族半導体化合物は、SnS、SnSe、SnTe、PbS、PbSe、PbTe及びこれらの混合物からなる群から選択される二元化合物;SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe及びこれらの混合物からなる群から選択される三元化合物;及びSnPbSSe、SnPbSeTe、SnPbSTe及びこれらの混合物からなる群から選択される四元化合物からなる群から選択されることができる。前記IV族元素またはこれを含む化合物は、Si、Ge及びこれらの混合物からなる群から選択される元素化合物;及びSiC、SiGe及びこれらの混合物からなる群から選択される二元化合物からなる群から選択されることができる。 The II-VI group semiconductor compound is a binary compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS. , ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe and a mixture thereof, CdZnS It can be selected from the group consisting of quaternary compounds selected from the group consisting of CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe and mixtures thereof. The group III-V semiconductor compound is a binary compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb and a mixture thereof; , GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and ternary compounds selected from the group consisting of mixtures thereof; and GaAlNAs, GaAlNSb, GaAlPA. It can be selected from the group consisting of quaternary compounds selected from the group consisting of GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof. The IV-VI group semiconductor compound is a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof; SnSeS, SnSeTe, SnSte, PbSeS, PbSeTe, PbSe, SnPbS, SnP. , SnPbTe and ternary compounds selected from the group consisting of mixtures thereof; and can be selected from the group consisting of quaternary compounds selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe and mixtures thereof. The Group IV element or a compound containing the same is an element compound selected from the group consisting of Si, Ge and a mixture thereof; and a binary compound selected from the group consisting of SiC, SiGe and a mixture thereof. Can be selected.
量子ドット粒子は、均質の(homogeneous)単一構造;コア−シェル(core−shell)、勾配(gradient)構造などのような二重構造;またはこれらの混合構造であることができる。 Quantum dot particles can be a homogeneous single structure; a dual structure such as a core-shell, gradient structure, or a mixed structure thereof.
コア−シェル(core−shell)の二重構造において、各々のコア(core)とシェル(shell)を構成する物質は、前記言及された互いに相異なっている半導体化合物からなることができる。例えば、前記コアは、CdSe、CdS、ZnS、ZnSe、ZnTe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS、HgS、HgSe、HgTe、GaN、GaP、GaAs、InP、InAs及びZnOからなる群より選択された一つ以上の物質を含むことができるが、これに限定されるものではない。前記シェルは、CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及びHgSeからなる群より選択された一つ以上の物質を含むことができるが、これに限定されるものではない。 In the core-shell dual structure, the materials that make up each core and shell can consist of the aforementioned semiconductor compounds that are different from each other. For example, the core was selected from the group consisting of CdSe, CdS, ZnS, ZnSe, ZnTe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and ZnO. It can contain, but is not limited to, one or more substances. The shell may contain, but is not limited to, one or more substances selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe and HgSe.
通常のカラーフィルタの製造に使用される着色感光性樹脂組成物が色相の具現のために赤、緑、青の着色剤を含むように、フォトルミネッセンス量子ドットの粒子も赤色量子ドット粒子、緑色量子ドット粒子及び青色量子ドット粒子に分類されることができる。本発明による量子ドット粒子は、赤色量子ドット粒子、緑色量子ドット粒子または青色量子ドット粒子であることができる。 Just as the colored photosensitive resin compositions used in the manufacture of ordinary color filters contain red, green, and blue colorants to embody the hue, the photoluminescent quantum dot particles are also red quantum dot particles, green quantum. It can be classified into dot particles and blue quantum dot particles. The quantum dot particles according to the present invention can be red quantum dot particles, green quantum dot particles, or blue quantum dot particles.
本発明による量子ドット粒子の直径は、特別に限定されない。 The diameter of the quantum dot particles according to the present invention is not particularly limited.
前記赤、緑及び青色の量子ドット粒子は、粒径によって分類されることができ、赤、緑、青の手順に粒径が小さくなる。具体的に、赤色量子ドット粒子は、粒径が、5nm以上〜10nm以下、緑色量子ドット粒子は、3nm超過〜5nm以下、青色量子ドット粒子は、1nm以上〜3nm以下であることができる。 The red, green and blue quantum dot particles can be classified by particle size, and the particle size becomes smaller in the procedure of red, green and blue. Specifically, the red quantum dot particles can have a particle size of 5 nm or more and 10 nm or less, the green quantum dot particles can have a particle size of more than 3 nm to 5 nm or less, and the blue quantum dot particles can have a particle size of 1 nm or more and 3 nm or less.
光の照射時に、赤色量子ドット粒子は、赤色光を放出し、緑色量子ドット粒子は、緑色光を放出し、青色量子ドット粒子は、青色光を放出する。 Upon irradiation with light, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the blue quantum dot particles emit blue light.
量子ドット粒子は、湿式化学工程(wet chemical process)、有機金属化学蒸着工程または分子ビームエピタキシー工程により合成されることができる。湿式化学工程は、有機溶剤に前駆体物質を入れて粒子を成長させる方法である。結晶が成長される時、有機溶剤が自然に量子ドット結晶の表面に配位されて分散剤としての役目をして結晶の成長を調節するようになるので、有機金属化学蒸着(MOCVD:metal organic chemical vapor deposition)や分子ビームエピタキシー(MBE:molecular beam epitaxy)のような気相蒸着法より容易で安価の工程を通じてナノ粒子の成長を制御することができる。 Quantum dot particles can be synthesized by a wet chemical process, an organometallic chemical deposition step or a molecular beam epitaxy step. The wet chemical process is a method of growing particles by putting a precursor substance in an organic solvent. When a crystal is grown, the organic solvent is naturally coordinated to the surface of the quantum dot crystal and acts as a dispersant to regulate the growth of the crystal, resulting in metalorganic vapor deposition (MOCVD). The growth of nanoparticles can be controlled through steps that are easier and cheaper than vapor deposition methods such as chemical vapor deposition () and molecular beam epitaxy (MBE).
本発明による量子ドット粒子の含量は、特別に限定されず、例えば、感光性樹脂組成物の固形分総重量中、3〜80重量%、好ましくは、5〜70重量%で含まれることができる。含量が前記範囲内であれば、発光効率が高くて、画素パターンの形成が容易である。 The content of the quantum dot particles according to the present invention is not particularly limited, and can be contained, for example, in an amount of 3 to 80% by weight, preferably 5 to 70% by weight, based on the total solid weight of the photosensitive resin composition. .. When the content is within the above range, the luminous efficiency is high and the pixel pattern can be easily formed.
光重合性化合物
本発明による光重合性化合物は、後述する光重合開始剤の作用により重合することができる化合物として、単官能単量体、2官能単量体、その他の多官能単量体などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。
Photopolymerizable Compound The photopolymerizable compound according to the present invention includes a monofunctional monomer, a bifunctional monomer, and other polyfunctional monomers as compounds that can be polymerized by the action of a photopolymerization initiator described later. Can be mentioned. These can be used alone or in combination of two or more.
前記単官能単量体の具体例としては、ノニルフェニルカルビトルアクリレート、2−ヒドロキシ−3−フェノキシプロピルアクリレート、2−エチルヘキシルカルビトルアクリレート、2−ヒドロキシエチルアクリレート、N−ビニルピロリドンなどを挙げることができる。 Specific examples of the monofunctional monomer include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, N-vinylpyrrolidone and the like. it can.
前記2官能単量体の具体例としては、1,6−ヘキサンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ビスフェノールAのビス(アクリロイルオキシエチル)エーテル、3−エチルペンタンジオールジ(メタ)アクリレートなどを挙げることができる。 Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene glycol di (meth) acrylate. Examples thereof include bis (acryloyloxyethyl) ether of bisphenol A and 3-ethylpentanediol di (meth) acrylate.
その他の多官能単量体の具体例としては、トリメチロールプロパントリ(メタ)アクリレート、エトキシル化トリメチロールプロパントリ(メタ)アクリレート、プロポキシル化トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、エトキシル化ジペンタエリスリトールヘキサ(メタ)アクリレート、プロポキシル化ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタアクリレートコハク酸モノエステルなどを挙げることができる。 Specific examples of other polyfunctional monomers include trimethylolpropantri (meth) acrylate, ethoxylated trimethylolpropanetri (meth) acrylate, propoxylated trimethylolpropanetri (meth) acrylate, and pentaerythritol tri (meth). ) Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) Examples thereof include acrylate, dipentaerythritol pentaacrylate succinic acid monoester.
本発明による光重合性化合物の含量は、特別に限定されず、例えば、感光性樹脂組成物の固形分総重量中5〜70重量%、好ましくは、10〜60重量%で含まれることができる。前記範囲内で、画素パターンの形成が容易であり、パターンの剥離を防止することができる。 The content of the photopolymerizable compound according to the present invention is not particularly limited, and can be contained, for example, in an amount of 5 to 70% by weight, preferably 10 to 60% by weight, based on the total solid content of the photosensitive resin composition. .. Within the above range, the pixel pattern can be easily formed and the pattern can be prevented from peeling off.
光重合開始剤
本発明による光重合開始剤は、特別に限定されず、例えば、トリアジン系化合物、アセトフェノン系化合物、ビイミダゾール系化合物、オキシム系化合物などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。
Photopolymerization Initiator The photopolymerization initiator according to the present invention is not particularly limited, and examples thereof include triazine-based compounds, acetophenone-based compounds, biimidazole-based compounds, and oxime-based compounds. These can be used alone or in combination of two or more.
トリアジン系化合物の種類は、特別に限定されず、具体的には、2,4−ビス(トリクロロメチル)−6−(4−メトキシフェニル)−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−(4−メトキシナフチル)−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−ピペロニル−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−(4−メトキシスチリル)−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−[2−(5−メチルフラン−2−イル)エテニル]−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−[2−(フラン−2−イル)エテニル]−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−[2−(4−ジエチルアミノ−2−メチルフェニル)エテニル]−1,3,5−トリアジン、2,4−ビス(トリクロロメチル)−6−[2−(3,4−ジメトキシフェニル)エテニル]−1,3,5−トリアジンなどを挙げることができる。 The type of triazine-based compound is not particularly limited, and specifically, 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis. (Trichloromethyl) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis ( Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1 , 3,5-Triazine, 2,4-bis (trichloromethyl) -6- [2- (fran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl)- 6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl ] -1,3,5-Triazine and the like.
前記アセトフェノン系化合物の種類は、特別に限定されず、具体的には、ジエトキシアセトフェノン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン、ベンジルジメチルケータル、2−ヒドロキシ−1−[4−(2−ヒドロキシエトキシ)フェニル]−2−メチルプロパン−1−オン、1−ヒドロキシシクロヘキシルフェニルケトン、2−メチル−1−(4−メチルチオフェニル)−2−モルホリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)ブタン−1−オン、2−ヒドロキシ−2−メチル−1−[4−(1−メチルビニル)フェニル]プロパン−1−オンのオリゴマーなどを挙げることができる。 The type of the acetophenone-based compound is not particularly limited, and specifically, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylcatal, 2-hydroxy-1. -[4- (2-Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1-one , 2-Benzyl-2-dimethylamino-1- (4-morpholinophenyl) butane-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one Benzyl and the like can be mentioned.
また、下記化学式1で表示される化合物を挙げることができる。 Moreover, the compound represented by the following chemical formula 1 can be mentioned.
前記式中、R1〜R4は、各々独立的に水素原子、ハロゲン原子、水酸基、炭素数1〜12のアルキル基で置換されるか非置換されたフェニル基、炭素数1〜12のアルキル基で置換されるか非置換されたベンジル基、または炭素数1〜12のアルキル基で置換されるか非置換されたナフチル基を示す。 In the above formula, R 1 to R 4 are independently substituted or unsubstituted phenyl group with hydrogen atom, halogen atom, hydroxyl group, alkyl group having 1 to 12 carbon atoms, and alkyl having 1 to 12 carbon atoms, respectively. Indicates a benzyl group substituted or unsubstituted by a group, or a naphthyl group substituted or unsubstituted by an alkyl group having 1 to 12 carbon atoms.
前記化学式1で表示される化合物の種類は、特別に限定されず、具体的には、2−メチル−2−アミノ(4−モルホリノフェニル)エタン−1−オン、2−エチル−2−アミノ(4−モルホリノフェニル)エタン−1−オン、2−プロピル−2−アミノ(4−モルホリノフェニル)エタン−1−オン、2−ブチル−2−アミノ(4−モルホリノフェニル)エタン−1−オン、2−メチル−2−アミノ(4−モルホリノフェニル)プロパン−1−オン、2−メチル−2−アミノ(4−モルホリノフェニル)ブタン−1−オン、2−エチル−2−アミノ(4−モルホリノフェニル)プロパン−1−オン、2−エチル−2−アミノ(4−モルホリノフェニル)ブタン−1−オン、2−メチル−2−メチルアミノ(4−モルホリノフェニル)プロパン−1−オン、2−メチル−2−ジメチルアミノ(4−モルホリノフェニル)プロパン−1−オン、2−メチル−2−ジメチルアミノ(4−モルホリノフェニル)プロパン−1−オンなどを挙げることができる。 The type of the compound represented by the chemical formula 1 is not particularly limited, and specifically, 2-methyl-2-amino (4-morpholinophenyl) ethane-1-one, 2-ethyl-2-amino ( 4-Molholinophenyl) ethane-1-one, 2-propyl-2-amino (4-morpholinophenyl) ethane-1-one, 2-butyl-2-amino (4-morpholinophenyl) ethane-1-one, 2 -Methyl-2-amino (4-morpholinophenyl) propan-1-one, 2-methyl-2-amino (4-morpholinophenyl) butane-1-one, 2-ethyl-2-amino (4-morpholinophenyl) Propane-1-one, 2-ethyl-2-amino (4-morpholinophenyl) butane-1-one, 2-methyl-2-methylamino (4-morpholinophenyl) propan-1-one, 2-methyl-2 -Dimethylamino (4-morpholinophenyl) propan-1-one, 2-methyl-2-dimethylamino (4-morpholinophenyl) propan-1-one and the like can be mentioned.
前記ビイミダゾール系化合物の種類は、特別に限定されず、具体的には、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2,3−ジクロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラ(アルコキシフェニル)ビイミダゾール、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラ(トリアルコキシフェニル)ビイミダゾール、4,4’,5,5’位置のフェニル基がカルボアルコキシ基によって置換されているイミダゾール化合物などを挙げることができる。このうち、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2,3−ジクロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾールが好ましい。 The type of the biimidazole-based compound is not particularly limited, and specifically, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2. '-Bis (2,3-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra ( Alkoxyphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (trialkoxyphenyl) biimidazole, phenyl group at 4,4', 5,5'positions Examples thereof include an imidazole compound in which is substituted with a carboalkoxy group. Of these, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4', 5 , 5'-Tetraphenylbiimidazole is preferred.
前記オキシム系化合物の種類は、特別に限定されず、具体的には、下記化学式2、化学式3及び化学式4で表示される化合物を挙げることができる。
The type of the oxime compound is not particularly limited, and specific examples thereof include compounds represented by the following
市販品としては、BASF社のIrgaqure−907などを挙げることができる。 Examples of commercially available products include Irgaque-907 manufactured by BASF.
また、本発明の感光性樹脂組成物は、本発明の目的を害しない範囲内において、当分野で通常使用されるその他の光重合開始剤などをさらに併用することができ、具体的には、ベンゾイン系化合物、ベンゾフェノン系化合物、チオキサントン系化合物、アントラセン系化合物などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。 In addition, the photosensitive resin composition of the present invention can be further used in combination with other photopolymerization initiators usually used in the art as long as the object of the present invention is not impaired. Examples thereof include benzoin compounds, benzophenone compounds, thioxanthone compounds, and anthracene compounds. These can be used alone or in combination of two or more.
ベンゾイン系化合物としては、その種類は、特別に限定されず、具体的には、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテルなどを挙げることができる。 The type of the benzoin compound is not particularly limited, and specific examples thereof include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.
ベンゾフェノン系化合物としては、その種類は、特別に限定されず、具体的には、ベンゾフェノン、o−ベンゾイル安息香酸メチル、4−フェニルベンゾフェノン、4−ベンゾイル−4’−メチルジフェニルスルフィド、3,3’,4,4’−テトラ(tert−ブチルパーオキシカルボニル)ベンゾフェノン、2,4,6−トリメチルベンゾフェノン、4,4'−ジ(N,N'−ジメチルアミノ)−ベンゾフェノンなどを挙げることができる。 The types of benzophenone compounds are not particularly limited, and specifically, benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3'. , 4,4'-tetra (tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-di (N, N'-dimethylamino) -benzophenone and the like.
チオキサントン系化合物としては、その種類は、特別に限定されず、具体的には、2−イソプロピルチオキサントン、2,4−ジエチルチオキサントン、2,4−ジクロロチオキサントン、1−クロロ−4−プロポキシチオキサントンなどを挙げることができる。 The type of the thioxanthone-based compound is not particularly limited, and specific examples thereof include 2-isopropylthioxanthone, 2,4-dichlorothioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like. Can be mentioned.
アントラセン系化合物としては、その種類は、特別に限定されず、具体的には、9,10−ジメトキシアントラセン、2−エチル−9,10−ジメトキシアントラセン、9,10−ジエトキシアントラセン、2−エチル−9,10−ジエトキシアントラセンなどを挙げることができる。 The type of anthracene compound is not particularly limited, and specifically, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl. -9,10-diethoxyanthracene and the like can be mentioned.
その他に、2,4,6−トリメチルベンゾイルジフェニルホスフィンオキシド、10−ブチル−2−クロロアクリドン、2−エチルアントラキノン、ベンジル、9,10−フェナンスレンキノン、カンファーキノン、フェニルグリオキシル酸メチル、チタノセン化合物などをさらに例示することができる。 In addition, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 10-butyl-2-chloroacrydone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenquinone, camphorquinone, methyl phenylglioxylate, titanosen Compounds and the like can be further exemplified.
本発明による光重合開始剤の含量は、特別に限定されず、例えば、感光性樹脂組成物の固形分総重量中、0.1〜20重量%、好ましくは、0.5〜15重量%で含まれることができる。前記範囲内で、自発性感光性樹脂組成物が高感度化されて画素部の強度が向上することができ、画素部表面での平滑性が改善され、微細画素パターンの形成が容易である。 The content of the photopolymerization initiator according to the present invention is not particularly limited, and is, for example, 0.1 to 20% by weight, preferably 0.5 to 15% by weight, based on the total solid content of the photosensitive resin composition. Can be included. Within the above range, the spontaneous photosensitive resin composition is made highly sensitive, the strength of the pixel portion can be improved, the smoothness on the surface of the pixel portion is improved, and the formation of a fine pixel pattern is easy.
また、本発明の感光性樹脂組成物は、光重合開始補助剤をさらに含むことができる。この場合、組成物の感度効率性がより高くなり、前記組成物を使用して形成されるカラーフィルタの生産性が向上される。光重合開始補助剤の種類としては、当分野で一般的に用いられるものであれば、特別に限定されず、具体的には、アミン化合物、カルボン酸化合物などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。 In addition, the photosensitive resin composition of the present invention may further contain a photopolymerization initiator. In this case, the sensitivity efficiency of the composition becomes higher, and the productivity of the color filter formed by using the composition is improved. The type of the photopolymerization initiator is not particularly limited as long as it is generally used in the art, and specific examples thereof include an amine compound and a carboxylic acid compound. These can be used alone or in combination of two or more.
アミン化合物の具体例としては、トリエタノールアミン、メチルジエタノールアミン、トリイソプロパノールアミンなどの脂肪族アミン化合物、4−ジメチルアミノ安息香酸メチル、4−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸イソアミル、4−ジメチルアミノ安息香酸2−エチルヘキシル、安息香酸2−ジメチルアミノエチル、N,N−ジメチルパラトルイジン、4,4’−ビス(ジメチルアミノ)ベンゾフェノン(通称、ミヒラーズケトン)、4,4’−ビス(ジエチルアミノ)ベンゾフェノンのような芳香族アミン化合物を挙げることができる。 Specific examples of the amine compound include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4 -Dimethylamino 2-ethylhexyl benzoate, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as Michler's ketone), 4,4'-bis (diethylamino) ) Aromatic amine compounds such as benzophenone can be mentioned.
カルボン酸化合物の具体例としては、フェニルチオ酢酸、メチルフェニルチオ酢酸、エチルフェニルチオ酢酸、メチルエチルフェニルチオ酢酸、ジメチルフェニルチオ酢酸、メトキシフェニルチオ酢酸、ジメトキシフェニルチオ酢酸、クロロフェニルチオ酢酸、ジクロロフェニルチオ酢酸、N−フェニルグリシン、フェノキシ酢酸、ナフチルチオ酢酸、N−ナフチルグリシン、ナフトキシ酢酸などの芳香族ヘテロ酢酸類を挙げることができる。 Specific examples of the carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, and dichlorophenylthioacetic acid. , N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid and other aromatic heteroacetic acids.
本発明による光重合開始補助剤の含量は、特別に限定されず、例えば、感光性樹脂組成物の固形分総重量中、0.1〜20重量%、好ましくは、1〜10重量%で含まれることができる。前記範囲内で、組成物の感度効率性がより高くなり、前記組成物を使用して形成されるカラーフィルタの生産性が向上される。 The content of the photopolymerization initiator according to the present invention is not particularly limited, and is, for example, 0.1 to 20% by weight, preferably 1 to 10% by weight, based on the total solid content of the photosensitive resin composition. Can be Within the above range, the sensitivity efficiency of the composition is higher and the productivity of the color filter formed using the composition is improved.
アルカリ可溶性樹脂
アルカリ可溶性樹脂は、カルボキシ基を有するエチレン性不飽和単量体を含んで重合される。これは、パターン形成時の現像処理工程で利用されるアルカリ現像液に対して可溶性を付与する成分である。
Alkali-soluble resin The alkali-soluble resin is polymerized containing an ethylenically unsaturated monomer having a carboxy group. This is a component that imparts solubility to the alkaline developer used in the developing process at the time of pattern formation.
カルボキシ基を有するエチレン性不飽和単量体は、特別に限定されず、例えば、アクリル酸、メタアクリル酸、クロトン酸などのモノカルボン酸類;フマル酸、メサコン酸、イタコン酸などのジカルボン酸類及びこれらの無水物;ω−カルボキシポリカプロラクトンモノ(メタ)アクリレートなどの両末端にカルボキシ基と水酸基とを有するポリマーのモノ(メタ)アクリレート類などを挙げることができ、好ましくは、アクリル酸及びメタアクリル酸であることができる。これらは、単独または2種以上を混合して使用することができる。 The ethylenically unsaturated monomer having a carboxy group is not particularly limited, and is, for example, monocarboxylic acids such as acrylic acid, methacrylic acid and crotonic acid; dicarboxylic acids such as fumaric acid, mesaconic acid and itaconic acid and these. Anhydrous; ω-carboxypolycaprolactone Mono (meth) acrylate and other polymer mono (meth) acrylates having carboxy groups and hydroxyl groups at both ends can be mentioned, and acrylic acid and methacrylic acid are preferable. Can be. These can be used alone or in combination of two or more.
本発明によるアルカリ可溶性樹脂は、前記単量体と共重合可能な少なくとも1種の他の単量体をさらに含んで重合されたものであることができる。例えば、スチレン、ビニルトルエン、メチルスチレン、p−クロロスチレン、o−メトキシスチレン、m−メトキシスチレン、p−メトキシスチレン、o−ビニルベンジルメチルエーテル、m−ビニルベンジルメチルエーテル、p−ビニルベンジルメチルエーテル、o−ビニルベンジルグリシジルエーテル、m−ビニルベンジルグリシジルエーテル、p−ビニルベンジルグリシジルエーテルなどの芳香族ビニル化合物;N−シクロヘキシルマレイミド、N−ベンジルマレイミド、N−フェニルマレイミド、N−o−ヒドロキシフェニルマレイミド、N−m−ヒドロキシフェニルマレイミド、N−p−ヒドロキシフェニルマレイミド、N−o−メチルフェニルマレイミド、N−m−メチルフェニルマレイミド、N−p−メチルフェニルマレイミド、N−o−メトキシフェニルマレイミド、N−m−メトキシフェニルマレイミド、N−p−メトキシフェニルマレイミドなどのN−置換マレイミド系化合物;メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−プロピル(メタ)アクリレート、i−プロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、i−ブチル(メタ)アクリレート、sec−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレートなどのアルキル(メタ)アクリレイト類;シクロペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2−メチルシクロヘキシル(メタ)アクリレート、トリシクロ[5.2.1.02,6]デカン−8−イル(メタ)アクリレート、2−ジシクロペンタニルオキシエチル(メタ)アクリレート、イソボニル(メタ)アクリレートなどの脂環族(メタ)アクリレート類;フェニル(メタ)アクリレート、ベンジル(メタ)アクリレートなどのアリール(メタ)アクリレート類;3−(メタクリロイルオキシメチル)オキセタン、3−(メタクリロイルオキシメチル)−3−エチルオキセタン、3−(メタクリロイルオキシメチル)−2−トリフルオロメチルオキセタン、3−(メタクリロイルオキシメチル)−2−フェニルオキセタン、2−(メタクリロイルオキシメチル)オキセタン、2−(メタクリロイルオキシメチル)−4−トリフルオロメチルオキセタンなどの不飽和オキセタン化合物などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。 The alkali-soluble resin according to the present invention can be polymerized by further containing at least one other monomer copolymerizable with the monomer. For example, styrene, vinyltoluene, methylstyrene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl ether, m-vinylbenzylmethyl ether, p-vinylbenzylmethyl ether. , O-Vinylbenzylglycidyl ether, m-vinylbenzylglycidyl ether, p-vinylbenzylglycidyl ether and other aromatic vinyl compounds; N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, No-o-hydroxyphenylmaleimide , Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, No-methylphenylmaleimide, Nm-methylphenylmaleimide, Np-methylphenylmaleimide, NO-methoxyphenylmaleimide, N N-substituted maleimide compounds such as -m-methoxyphenyl maleimide and N-p-methoxyphenyl maleimide; methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate Alkyl (meth) acylates such as n-butyl (meth) acrylate, i-butyl (meth) acrylate, sec-butyl (meth) acrylate, t-butyl (meth) acrylate; cyclopentyl (meth) acrylate, cyclohexyl (meth) ) Acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decane-8-yl (meth) acrylate, 2-dicyclopentanyloxyethyl (meth) acrylate, isobonyl ( Alicyclic (meth) acrylates such as meta) acrylate; aryl (meth) acrylates such as phenyl (meth) acrylate and benzyl (meth) acrylate; 3- (methacryloyloxymethyl) oxetane, 3- (methacryloyloxymethyl) -3-ethyloxetane, 3- (methacryloyloxymethyl) -2-trifluoromethyloxetane, 3- (methacryloyloxymethyl) -2-phenyloxetane, 2- (methacryloyloxymethyl) oxetane, 2- (methacryloyloxymethyl) Examples thereof include unsaturated oxetane compounds such as -4-trifluoromethyloxetane. These can be used alone or in combination of two or more.
本明細書で、(メタ)アクリレートは、アクリレートまたはメタクリレートを意味する。 As used herein, (meth) acrylate means acrylate or methacrylate.
本発明によるアルカリ可溶性樹脂の含量は、特別に限定されず、例えば、感光性樹脂組成物の固形分総重量中、5〜80重量%、好ましくは、10〜70重量%で含まれることができる。前記範囲内で、現像液への溶解性が十分なのでパターン形成が容易であり、現像時に露光部の画素部分の膜減少が防止されて非画素部分の抜け落ち性が良好になる。 The content of the alkali-soluble resin according to the present invention is not particularly limited, and can be contained, for example, in an amount of 5 to 80% by weight, preferably 10 to 70% by weight, based on the total solid content of the photosensitive resin composition. .. Within the above range, the solubility in the developing solution is sufficient, so that pattern formation is easy, the film reduction of the pixel portion of the exposed portion is prevented during development, and the removal property of the non-pixel portion is improved.
溶剤
本発明による溶剤は、特別に限定されず、当分野で通常的に使用される有機溶剤であることができる。
Solvent The solvent according to the present invention is not particularly limited and can be an organic solvent commonly used in the art.
前記溶剤の具体例としては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテルなどのエチレングリコールモノアルキルエーテル類;ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテルなどのジエチレングリコールジアルキルエーテル類;メチルセロソルブアセテート、エチルセロソルブアセテートなどのアルキレングリコールアルキルエーテルアセテート類;プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、メトキシブチルアセテート、メトキシペンチルアセテートなどのアルキレングリコールアルキルエーテルアセテート類;ベンゼン、トルエン、キシレン、メシチレンなどの芳香族炭化水素類;メチルエチルケトン、アセトン、メチルアミルケトン、メチルイソブチルケトン、シクロヘキサノンなどのケトン類;エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、グリセリンなどのアルコール類;3−エトキシプロピオン酸エチル、3−メトキシプロピオン酸メチルなどのエステル類、γ−ブチロールラクトンなどの環状エステル類;などを挙げることができる。これらは、単独または2種以上を混合して使用することができる。 Specific examples of the solvent include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol dipropyl ether. Diethylene glycol dialkyl ethers such as diethylene glycol dibutyl ether; alkylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, Alkylene glycol alkyl ether acetates such as methoxypentyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene, mesityrene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone; ethanol, propanol, butanol , Alcohols such as hexanol, cyclohexanol, ethylene glycol, glycerin; esters such as ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, cyclic esters such as γ-butyrol lactone; and the like. .. These can be used alone or in combination of two or more.
本発明による溶剤の含量は、特別に限定されず、例えば、感光性樹脂組成物の総重量中、60〜90重量%で含まれることができ、好ましくは、70〜85重量%で含まれることができる。前記溶剤の含量が前記範囲内である場合、塗布性が良好になる効果を提供する。 The content of the solvent according to the present invention is not particularly limited, and can be contained in, for example, 60 to 90% by weight, preferably 70 to 85% by weight, based on the total weight of the photosensitive resin composition. Can be done. When the content of the solvent is within the above range, the effect of improving the coatability is provided.
酸化防止剤
フォトミネッセンス量子ドットの粒子を含む感光性樹脂組成物は、ハードベーク工程時に生成されたラジカルが量子ドットの表面酸化を誘発し、この場合、発光特性が低下される問題がある。
In the photosensitive resin composition containing particles of the antioxidant photominescence quantum dots, there is a problem that radicals generated during the hard baking process induce surface oxidation of the quantum dots, and in this case, the light emitting characteristics are deteriorated. ..
さて、本発明は、酸化防止剤を特定範囲の含量で含むことで前記問題点を解決する。すなわち、本発明の感光性樹脂組成物は、発光強度及び発光強度の維持率がいずれも著しく優秀である。 Now, the present invention solves the above-mentioned problems by containing an antioxidant in a specific range of content. That is, the photosensitive resin composition of the present invention is remarkably excellent in both emission intensity and maintenance rate of emission intensity.
図1は、本発明の具現例と比較例の発光強度及び発光強度の維持率を比較した図である。 FIG. 1 is a diagram comparing the emission intensity and the maintenance rate of the emission intensity of the embodiment of the present invention and the comparative example.
本発明による酸化防止剤の含量は、感光性樹脂組成物の固形分総重量中、0.1〜10重量%で含まれる。酸化防止剤の含量が0.1重量%未満であれば、ハードベーク工程における消光現象を抑制しにくいし、10重量%を超過すれば、パターン剥離が発生する問題がある。 The content of the antioxidant according to the present invention is 0.1 to 10% by weight based on the total solid weight of the photosensitive resin composition. If the content of the antioxidant is less than 0.1% by weight, it is difficult to suppress the quenching phenomenon in the hard baking process, and if it exceeds 10% by weight, there is a problem that pattern peeling occurs.
酸化防止剤は、感光性樹脂組成物の固形分総重量中、0.5〜8重量%で含まれることが、カラー具現及びパターン形成の側面で好ましくて、1〜5重量%で含まれることがより好ましい。 The antioxidant is preferably contained in an amount of 0.5 to 8% by weight based on the total solid content of the photosensitive resin composition in terms of color realization and pattern formation, and is preferably contained in an amount of 1 to 5% by weight. Is more preferable.
本発明で使用可能な酸化防止剤は、その種類が特別な限定されないが、好ましくは、リン系、硫黄系及びフェノール系酸化防止剤からなる群より選択された少なくとも一つを含むことができる。 The type of antioxidant that can be used in the present invention is not particularly limited, but preferably includes at least one selected from the group consisting of phosphorus-based, sulfur-based and phenol-based antioxidants.
リン系酸化防止剤の種類は、特別に限定されず、具体的には、3,9−ビス(2,6−ジ−tert−ブチル−4−メチルフェノキシ)−2,4,8,10−テトラオキサ−3,9−ジホスファスピロ[5.5]ウンデカン、ジイソデシルペンタエリスリトールジホスファイト、ビス(2,4−ジ−t−ブチルフェニル)ペンタエリスリトールジホスファイト、2,2’−メチレンビス(4,6−ジ−t−ブチル−1−フェニルオキシ)(2−エチルヘキシルオキシ)ホスホラス、6−[3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロポキシ]−2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1,3,2]ジオキサホスフェピン、トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、4,4’−ブチリデン−ビス(3−メチル−6−t−ブチルフェニルジトリデシル)ホスファイト、オクタデシルホスファイト、トリス(ノニルフェニル)ホスファイト、9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−デシルオキシ−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,6−ジ−t−ブチルフェニル)ホスファイト、2,2−メチレンビス(4,6−ジ−t−ブチルフェニル)オクチルホスファイト、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、テトラキス(2,4−ジ−t−ブチルフェニル)[1,1−ビフェニル]−4,4’−ジイルビスホスホナイト、ビス[2,4−ビス(1,1−ジメチルエチル)−6−メチルフェニル]エチルエステル及びホスホン酸などを挙げることができる。 The type of phosphorus-based antioxidant is not particularly limited, and specifically, 3,9-bis (2,6-di-tert-butyl-4-methylphenoxy) -2,4,8,10-. Tetraoxa-3,9-diphosphaspiro [5.5] undecane, diisodecylpentaerythritol diphosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, 2,2'-methylenebis (4,6) -Di-t-butyl-1-phenyloxy) (2-ethylhexyloxy) phosphorus, 6- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8, 10-Tetra-t-butyldibenz [d, f] [1,3,2] dioxaphosfepine, triphenylphosphite, diphenylisodecylphosphite, phenyldiisodecylphosphite, 4,4'-butylidene-bis ( 3-Methyl-6-t-Butylphenylditridecyl) phosphite, octadecylphosphite, tris (nonylphenyl) phosphite, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10-phosphaphenylantrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa -10-Phosphaphenanthrene-10-oxide, tris (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetraylbis (2,4-di-t-butylphenyl) phosphite, cy Clickneopentanetetraylbis (2,6-di-t-butylphenyl) phosphite, 2,2-methylenebis (4,6-di-t-butylphenyl) octylphosphite, tris (2,4-di- t-butylphenyl) phosphite, tetrakis (2,4-di-t-butylphenyl) [1,1-biphenyl] -4,4'-diylbisphosphonite, bis [2,4-bis (1,1) -Dimethylethyl) -6-methylphenyl] ethyl ester, phosphonic acid and the like can be mentioned.
前記リン系酸化防止剤のうち、耐熱性及び耐熱変色防止の側面で、2,2’−メチレンビス(4,6−ジ−t−ブチル−1−フェニルオキシ)(2−エチルヘキシルオキシ)ホスホラス、3,9−ビス(2,6−ジ−tert−ブチル−4−メチルフェノキシ)−2,4,8,10−テトラオキサ−3,9−ジホスファスピロ[5.5]ウンデカン、及び6−[3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロポキシ]−2,4,8,10−テトラ−t−ブチルジベンズ[d,f][1,3,2]ジオキサホスフェピンなどが好ましい。 Among the phosphorus-based antioxidants, 2,2'-methylenebis (4,6-di-t-butyl-1-phenyloxy) (2-ethylhexyloxy) phosphorus, 3 in terms of heat resistance and heat discoloration prevention. , 9-bis (2,6-di-tert-butyl-4-methylphenoxy) -2,4,8,10-tetraoxa-3,9-diphosphaspiro [5.5] undecane, and 6- [3-( 3-t-Butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-t-butyldibenz [d, f] [1,3,2] dioxaphosphepine, etc. preferable.
リン系酸化防止剤の市販品としては、Irgafos 168(BASF社製)、Sumilizer GP(住友化学社製)などを挙げることができる。 Examples of commercially available phosphorus-based antioxidants include Irgafos 168 (manufactured by BASF) and Sumilizer GP (manufactured by Sumitomo Chemical Co., Ltd.).
硫黄系酸化防止剤の種類は、特別に限定されず、具体的には、2,2−ビス({[3−(ドデシルチオ)プロピオニル]オキシ}メチル)−1,3−プロパンジイル−ビス[3−(ドデシルチオ)プロピオネート]、2−メルカプトベンズイミダゾール、ジラウリル−3,3’−チオジプロピオネート、ジミリスチル−3,3’−チオジプロピオネート、ジステアリル−3,3’−チオジプロピオネート、ペンタエリスリチル−テトラキス(3−ラウリルチオプロピオネート)、2−メルカプトベンズイミダゾールなどを挙げることができる。 The type of sulfur-based antioxidant is not particularly limited, and specifically, 2,2-bis ({[3- (dodecylthio) propionyl] oxy} methyl) -1,3-propanediyl-bis [3]. -(Dodecylthio) propionate], 2-mercaptobenzimidazole, dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate, Examples thereof include pentaerythricyl-tetrakis (3-laurylthiopropionate) and 2-mercaptobenzimidazole.
前記硫黄系酸化防止剤のうち、耐熱性及び耐熱変色防止の側面で、2,2−ビス({3−(ドデシルチオ)プロピオニル}オキシ)メチル)1,3−プロパンジイル−ビス[3−(ドデシルチオ)プロピオネート]、2−メルカプトベンズイミダゾールなどが好ましい。 Among the sulfur-based antioxidants, 2,2-bis ({3- (dodecylthio) propionyl} oxy) methyl) 1,3-propanediyl-bis [3- (dodecylthio) is used in terms of heat resistance and heat discoloration prevention. ) Propionate], 2-mercaptobenzimidazole and the like are preferable.
硫黄系酸化防止剤の市販品としては、Irganox 1035(BASF社製)などを挙げることができる。 Examples of commercially available sulfur-based antioxidants include Irganox 1035 (manufactured by BASF).
フェノール系酸化防止剤の種類は、特別に限定されず、具体的には、3,9−ビス[2−〔3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ〕−1,1−ジメチルエトキシ]−2,4,8,10−テトラオキサスピロ[5.5]ウンデカン、ペンタエリスリチル・テトラキス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、1,3,5−トリメチル−2,4,6−トリス(3’, 5’−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、トリエチレングリコール−ビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)、トリス−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−イソシアヌレート、1,3,5−トリス(4−t−ブチル−3−ヒドロキシ−2,6−ジメチルベンジル)−イソシアヌレート、1,6−ヘキサンジオール−ビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、2,2−チオ−ジエチレンビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナムアミド)、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、2,4−ビス[(オクチルチオ)メチル]−O−クレゾール、1,6−ヘキサンジオール−ビス−[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、オクタデシル−[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、4,4’−ブチリデン−ビス(3−メチル−6−t−ブチルフェノール)、1,1,3−トリス(2−メチル−4−ヒドロキシ−5−t−ブチルフェニル)ブタン、1,3,5−トリス(4−ヒドロキシベンジル)ベンゼン及びテトラキス[メチレン−3−(3,5’−ジ−t−ブチル−4’−ヒドロキシフェニルプロピオネート)]メタンなどを挙げることができる。 The type of phenolic antioxidant is not particularly limited, and specifically, 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy]. -1,1-dimethylethoxy] -2,4,8,10-tetraoxaspiro [5.5] undecane, pentaerythrityl tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) ) Propionate], 1,3,5-trimethyl-2,4,6-tris (3', 5'-di-t-butyl-4-hydroxybenzyl) benzene, triethylene glycol-bis [3- (3- (3- (3-) t-Butyl-5-methyl-4-hydroxyphenyl) propionate], 4,4'-thiobis (6-t-butyl-3-methylphenol), tris- (3,5-di-t-butyl-4- Hydroxybenzyl) -isocyanurate, 1,3,5-tris (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -isocyanurate, 1,6-hexanediol-bis [3- (3,3) 5-di-t-Butyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], N, N' -Hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamamide), 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl) -4-Hydroxybenzyl) benzene, 2,4-bis [(octylthio) methyl] -O-cresol, 1,6-hexanediol-bis- [3- (3,5-di-t-butyl-4-hydroxy) Phenyl) propionate], octadecyl- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, 2,2'-methylenebis (4-methyl-6-t-butylphenol), 4,4' -Butylidene-bis (3-methyl-6-t-butylphenol), 1,1,3-tris (2-methyl-4-hydroxy-5-t-butylphenyl) butane, 1,3,5-tris (4) -Hydroxybenzyl) benzene and tetrakis [methylene-3- (3,5'-di-t-butyl-4'-hydroxyphenylpropionate)] methane and the like can be mentioned.
前記フェノール系酸化防止剤のうち、耐熱性及び耐熱変色防止の側面で、3,9−ビス[2−〔3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ〕−1,1−ジメチルエトキシ]−2,4,8,10−テトラオキサスピロ[5.5]ウンデカン、1,3,5−トリメチル−2,4,6−トリス(3’,5’−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、ペンタエリスリチル・テトラキス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、トリエチレングリコール−ビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)、トリス−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−イソシアヌレート、1,3,5−トリス(4−t−ブチル−3−ヒドロキシ−2,6−ジメチルベンジル)−イソシアヌレート、1,6−ヘキサンジオール−ビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、2,2−チオ−ジエチレンビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナムアミド)、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン及び2,4−ビス[(オクチルチオ)メチル]−O−クレゾールなどが好ましい。 Among the phenolic antioxidants, 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy]-in terms of heat resistance and heat discoloration prevention. 1,1-dimethylethoxy] -2,4,8,10-tetraoxaspiro [5.5] undecane, 1,3,5-trimethyl-2,4,6-tris (3', 5'-di- t-butyl-4-hydroxybenzyl) benzene, pentaerythrityl tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], triethylene glycol-bis [3- (3-t) -Butyl-5-methyl-4-hydroxyphenyl) propionate], 4,4'-thiobis (6-t-butyl-3-methylphenol), tris- (3,5-di-t-butyl-4-hydroxy) Benzyl) -isocyanurate, 1,3,5-tris (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -isocyanurate, 1,6-hexanediol-bis [3- (3,5) -Di-t-butyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], N, N'- Hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamamide), 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-) 4-Hydroxybenzyl) benzene and 2,4-bis [(octylthio) methyl] -O-cresol are preferred.
フェノール系酸化防止剤の市販品としては、Irganox 1010(BASF社製)、ADK STAB AO−80(ADEKA社製)などを挙げることができる。 Examples of commercially available phenolic antioxidants include Irganox 1010 (manufactured by BASF) and ADK STAB AO-80 (manufactured by ADEKA).
<カラーフィルタ>
また、本発明は、前記感光性樹脂組成物で製造されたカラーフィルタを提供する。
<Color filter>
The present invention also provides a color filter produced of the photosensitive resin composition.
本発明のカラーフィルタは、画像表示装置に適用される場合に、表示装置光源の光によって発光することで、より優れた光効率を具現することができる。また、色相を有した光が放出されるので、色再現性がより優秀であり、フォトルミネッセンスにより全方向に光が放出されるので、視野角が改善されて輝度特性が優秀である。 When applied to an image display device, the color filter of the present invention can realize more excellent light efficiency by emitting light from a light source of the display device. Further, since light having a hue is emitted, the color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, the viewing angle is improved and the luminance characteristic is excellent.
カラーフィルタは、基板及び前記基板の上部に形成されたパターン層を含む。 The color filter includes a substrate and a pattern layer formed on the upper portion of the substrate.
基板は、カラーフィルタ自体基板であるか、またはディスプレイ装置などにカラーフィルタが位置される部位であることができ、特別に限定されるものではない。前記基板は、ガラス、シリコン(Si)、シリコン酸化物(SiOx)または高分子基板であることができ、前記高分子基板は、ポリエーテルスルホン(PES:polyethersulfone)またはポリカーボネート(PC:polycarbonate)などであることができる。 The substrate can be the substrate of the color filter itself or a portion where the color filter is located in a display device or the like, and is not particularly limited. The substrate can be glass, silicon (Si), silicon oxide (SiOx) or a polymer substrate, and the polymer substrate can be made of polyethersulfone (PES), polycarbonate (PC) or the like. There can be.
パターン層は、本発明の感光性樹脂組成物を含む層として、前記感光性樹脂組成物を塗布し、所定のパターンで露光、現像及び熱硬化して形成された層であることができる。 The pattern layer can be a layer containing the photosensitive resin composition of the present invention, which is formed by applying the photosensitive resin composition and exposing, developing and thermosetting the photosensitive resin composition in a predetermined pattern.
前記感光性樹脂組成物で形成されたパターン層は、赤色量子ドット粒子を含んだ赤色パターン層、緑色量子ドット粒子を含んだ緑色パターン層及び青色量子ドット粒子を含んだ青色パターン層を備えることができる。光の照射時に、赤色パターン層は赤色光を放出し、緑色パターン層は緑色光を放出し、青色パターン層は青色光を放出する。 The pattern layer formed of the photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. it can. When irradiated with light, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light.
このような場合に、画像表示装置への適用時の光源の放出光は、特別に限定されないが、より優秀な輝度及び色再現性の側面で、好ましくは、青色光を放出する光源を使用することができる。 In such a case, the emitted light of the light source at the time of application to the image display device is not particularly limited, but in terms of better brightness and color reproducibility, a light source that emits blue light is preferably used. be able to.
本発明の他の一具現例によれば、前記パターン層は、赤色パターン層、緑色パターン層及び量子ドット粒子を含まない透明パターン層を備える。この場合に、これを含む画像表示装置の光源では、青色光を放出する光源を使用することができる。この時、赤色パターン層は、赤色光を放出し、緑色パターン層は、緑色光を放出し、透明パターン層は、青色光がそのまま透過して青色を示す。 According to another embodiment of the present invention, the pattern layer includes a red pattern layer, a green pattern layer, and a transparent pattern layer containing no quantum dot particles. In this case, as the light source of the image display device including this, a light source that emits blue light can be used. At this time, the red pattern layer emits red light, the green pattern layer emits green light, and the transparent pattern layer transmits blue light as it is and shows blue.
前記のような基板及びパターン層を含むカラーフィルタは、各パターンの間に形成された隔壁をさらに含むことができ、ブラックマトリックスをさらに含んでもよい。また、カラーフィルタのパターン層の上部に形成された保護膜をさらに含むこともできる。 The color filter including the substrate and the pattern layer as described above can further include a partition wall formed between each pattern, and may further include a black matrix. Further, a protective film formed on the upper part of the pattern layer of the color filter can be further included.
<画像表示装置>
また、本発明は、前記カラーフィルタを含む画像表示装置を提供する。
<Image display device>
The present invention also provides an image display device including the color filter.
本発明のカラーフィルタは、通常の液晶表示装置だけではなく、電界発光表示装置、プラズマ表示装置、電界放出表示装置など各種画像表示装置に適用が可能である。 The color filter of the present invention can be applied not only to a normal liquid crystal display device but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device.
本発明の画像表示装置は、赤色量子ドット粒子を含有した赤色パターン層、緑色量子ドット粒子を含有した緑色パターン層及び青色量子ドット粒子を含有した青色パターン層を含むカラーフィルタを備えることができる。この場合に、画像表示装置への適用時の光源の放出光は、特別に限定されないが、より優秀な色再現性の側面で、好ましくは、青色光を放出する光源を使用することができる。 The image display device of the present invention can include a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. In this case, the emitted light of the light source at the time of application to the image display device is not particularly limited, but in terms of better color reproducibility, a light source that emits blue light can be preferably used.
本発明の他の一具現例によれば、本発明の画像表示装置は、赤色パターン層、緑色パターン層及び量子ドット粒子を含まない透明パターン層を含むカラーフィルタを備えることができる。 According to another embodiment of the present invention, the image display device of the present invention can include a color filter including a red pattern layer, a green pattern layer, and a transparent pattern layer containing no quantum dot particles.
この時、光源としては、青色光を放出する光源を使用することができる。この場合に、赤色量子ドット粒子は、赤色光を放出し、緑色量子ドット粒子は、緑色光を放出し、透明パターン層は、青色光がそのまま透過して青色を示す。 At this time, as the light source, a light source that emits blue light can be used. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer shows blue through the blue light as it is.
本発明の画像表示装置は、光効率が優秀なので高い輝度を示し、色再現性が優秀であり、広い視野角を有する。 Since the image display device of the present invention has excellent light efficiency, it exhibits high brightness, has excellent color reproducibility, and has a wide viewing angle.
以下、本発明の理解を助けるために好ましい実施例を提示する。しかし、これは本発明の好ましい実施態様に過ぎず、本発明の実施の範囲を限定するものではなく、本発明の明細書及び図面内容に基づいてなされた均等な変更および付加は、いずれも本発明の特許請求の範囲内に含まれるものとする。 Hereinafter, preferred examples will be presented to aid understanding of the present invention. However, this is merely a preferred embodiment of the present invention and does not limit the scope of the present invention, and any equal changes and additions made based on the description and drawings of the present invention are made in the present invention. It shall be included in the claims of the invention.
製造例1.CdSe(コア)/ZnS(シェル)構造のフォトルミネッセンスの緑色量子ドット粒子A−1の合成
CdO(0.4mmol)と酢酸亜鉛(Zinc acetate)(4mmol)、オレイン酸(Oleic acid)(5.5mL)を1−オクタデセン(1−Octadecene)(20mL)と一緒に反応器に入れて、150℃に加熱して反応させた。以後、亜鉛にオレイン酸が置換されることで生成された酢酸を除去するために、前記反応物を100mTorrの真空下に20分間放置した。
Production example 1. Synthesis of green quantum dot particles A-1 of photoluminescence of CdSe (core) / ZnS (shell) structure CdO (0.4 mmol), zinc acetate (4 mmol), oleic acid (5.5 mL) ) Was placed in a reactor together with 1-octadecene (20 mL) and heated to 150 ° C. for reaction. Subsequently, the reaction was allowed to stand under vacuum at 100 mTorr for 20 minutes in order to remove the acetic acid produced by the substitution of zinc with oleic acid.
その後、310℃の熱を加えて透明な混合物を得た。その後、これを20分間310℃で維持した後、0.4mmolのSe粉末と2.3mmolのS粉末を3mLのトリオクチルホスフィン(trioctylphosphine)に溶解させたSe及びS溶液を、酢酸カドミウム(Cd(OAc)2)及び酢酸亜鉛(Zn(OAc)2)溶液が入っている反応器に速く注入した。 Then, heat of 310 ° C. was applied to obtain a transparent mixture. Then, after maintaining this at 310 ° C. for 20 minutes, a Se and S solution prepared by dissolving 0.4 mmol of Se powder and 2.3 mmol of S powder in 3 mL of trioctylphosphine was added to cadmium acetate (Cd (Cd). It was rapidly injected into a reactor containing OAc) 2 ) and zinc acetate (Zn (OAc) 2 ) solutions.
これから得た混合物を310℃で5分間成長させた後、氷浴(ice bath)を利用して成長を中断させた。その後、エタノールで沈澱させて遠心分離機を利用して量子ドットを分離し、余分の不純物はクロロホルム(chloroform)とエタノールを利用して洗浄した。こうすることで、オレイン酸に安定化された、コア粒径とシェル厚さの和が3〜5nmである粒子が分布されたCdSe(コア)/ZnS(シェル)構造の量子ドット粒子(A)を得た。 The resulting mixture was grown at 310 ° C. for 5 minutes and then growth was interrupted using an ice bath. Then, it was precipitated with ethanol and quantum dots were separated using a centrifuge, and excess impurities were washed with chloroform (chloroform) and ethanol. By doing so, the quantum dot particles (A) having a CdSe (core) / ZnS (shell) structure in which particles having a sum of the core particle size and the shell thickness of 3 to 5 nm, which are stabilized by oleic acid, are distributed. Got
製造例2.アルカリ可溶性樹脂の合成
撹拌機、温度計還流冷却管、滴下ロート及び窒素導入管を備えたフラスコを準備し、N−ベンジルマレイミド45重量部、メタクリル酸45重量部、トリサイクロデシルメタクリレート10重量部、t−ブチルパーオキシ−2−エチルヘキサノエート4重量部、プロピレングリコールモノメチルエーテルアセテート(以下、PGMEA)40重量部を投入した。その後、撹拌混合してモノマー滴下ロートを準備し、n−ドデカンチオール6重量部、PGMEA24重量部を入れて撹拌混合して連鎖移動剤滴下ロートを準備した。以後、フラスコにPGMEA395重量部を導入し、フラスコ内の雰囲気を空気から窒素にした後、撹拌しながらフラスコの温度を90℃まで昇温した。
Production example 2. Prepare a flask equipped with an alkali-soluble resin synthetic stirrer, a thermometer reflux condenser, a dropping funnel and a nitrogen introduction tube, and prepare 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter, PGMEA) were added. Then, the monomer dropping funnel was prepared by stirring and mixing, and 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and mixed by stirring to prepare a chain transfer agent dropping funnel. After that, 395 parts by weight of PGMEA was introduced into the flask, the atmosphere in the flask was changed from air to nitrogen, and then the temperature of the flask was raised to 90 ° C. with stirring.
その後、滴下ロートからモノマー及び連鎖移動剤の滴下を開始した。滴下は、90℃を維持しながら各々2時間の間進行し、1時間後に110℃に昇温して3時間維持した。その後、ガス導入管を導入させて、酸素/窒素=5/95(v/v)混合ガスのバブリングを開始した。その後、グリシジルメタクリレート10重量部、2,2‘−メチレンビス(4−メチル−6−t−ブチルフェノール)0.4重量部、トリエチルアミン0.8重量部をフラスコ内に投入して、110℃で8時間反応させた。その後、室温まで冷却しながら固形分29.1重量%、重量平均分子量32,000、酸価が114mgKOH/gであるアルカリ可溶性樹脂を得た。 Then, dropping of the monomer and the chain transfer agent was started from the dropping funnel. The dropping proceeded for 2 hours each while maintaining 90 ° C., and after 1 hour, the temperature was raised to 110 ° C. and maintained for 3 hours. Then, a gas introduction pipe was introduced, and bubbling of the oxygen / nitrogen = 5/95 (v / v) mixed gas was started. Then, 10 parts by weight of glycidyl methacrylate and 0.4 parts by weight of 2,2'-methylenebis (4-methyl-6-t-butylphenol) and 0.8 parts by weight of triethylamine were put into the flask, and the temperature was 110 ° C. for 8 hours. It was reacted. Then, while cooling to room temperature, an alkali-soluble resin having a solid content of 29.1% by weight, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH / g was obtained.
実施例及び比較例
(1) 感光性樹脂組成物の製造
下記表1に記載された組成(重量部)を添加し、固形分が20重量%になるように、プロピレングリコールモノメチルエーテルアセテートで希釈した後、撹拌して感光性樹脂組成物を製造した。
Examples and Comparative Examples
(1) Production of Photosensitive Resin Composition The composition (part by weight) shown in Table 1 below is added, diluted with propylene glycol monomethyl ether acetate so that the solid content becomes 20% by weight, and then stirred. A photosensitive resin composition was produced.
(2) カラーフィルタの製造
ガラス基板上に実施例及び比較例の感光性樹脂組成物をスピンコーティング法で塗布した後、加熱板上に置いて、100℃の温度で3分間維持して薄膜を形成した。前記薄膜上に、20mm×20mmの正四角形の透過パターンと、1〜100μmのライン/スペースパターンとを有する試験フォトマスクとを置いて、試験フォトマスクとの間隔を100μmにして紫外線を照射した。
(2) Manufacture of color filter After applying the photosensitive resin compositions of Examples and Comparative Examples on a glass substrate by a spin coating method, the thin film is placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Formed. A test photomask having a 20 mm × 20 mm regular quadrangular transmission pattern and a line / space pattern of 1 to 100 μm was placed on the thin film, and ultraviolet rays were irradiated with a distance of 100 μm from the test photomask.
この時、紫外線の光源は、ウシオ電機社の超高圧水銀ランプ(USH−250D)を利用して、大気雰囲気下で、200mJ/cm2の露光量(365nm)で光を照射し、光学フィルタは使わなかった。その後、前記薄膜をpH10.5のKOH水溶液に80秒間つけて現像した。 At this time, the light source of the ultraviolet rays is an ultra-high pressure mercury lamp (USH-250D) manufactured by Ushio, Inc., which irradiates light with an exposure amount (365 nm) of 200 mJ / cm 2 in an atmospheric atmosphere, and the optical filter is used. I didn't use it. Then, the thin film was immersed in a KOH aqueous solution having a pH of 10.5 for 80 seconds for development.
蒸溜水で洗浄した後、窒素ガスを吹いて乾燥し、150℃のオーブンで10分間加熱してカラーフィルタを製造した。製造されたカラーパターンの厚さは、3.0μmであった。 After washing with distilled water, it was dried by blowing nitrogen gas and heated in an oven at 150 ° C. for 10 minutes to produce a color filter. The thickness of the produced color pattern was 3.0 μm.
実験例
1.発光強度(Intensity)測定
前記実施例及び比較例の組成物で製造されたカラーフィルタにおいて、20mm×20mmのパターン部に365nmTube型4W UV照射機(VL−4LC、VILBERLOURMAT)で光を照射し、フォトルミネッセンスにより放出される波長(550nm)領域の光の強度(intensity)をスペクトラムメートル(Ocean Optics社)で測定し、下記表2及び図1に示した。
Experimental example
1. 1. Emission Intensity Measurement In the color filters produced with the compositions of the above-mentioned Examples and Comparative Examples, a 20 mm × 20 mm pattern portion is irradiated with light by a 365 nm Tube type 4W UV irradiator (VL-4LC, VILBERLOURMAT), and a photo The intensity of light in the wavelength (550 nm) region emitted by photoluminescence was measured by spectrum meters (Ocean Optics) and is shown in Table 2 and FIG. 1 below.
測定された光の強度が強いほど優秀なフォトルミネッセンス特性を発揮することと判断できる。 It can be judged that the stronger the measured light intensity, the more excellent photoluminescence characteristics are exhibited.
発光強度の維持率と関連して、ハードベーク(Hard bake)を200℃で60分間進行し、ハードベーク前の発光強度と後の強度を各々測定し、発光効率が維持される水準を確認した。結果は、下記表2及び図1に示した。 In relation to the maintenance rate of luminescence intensity, hard bake was advanced at 200 ° C. for 60 minutes, and the luminescence intensity before and after the hard bake were measured respectively to confirm the level at which the luminous efficiency was maintained. .. The results are shown in Table 2 and FIG. 1 below.
2.パターン特性
パターン剥離の有無を確認するため、光学顕微鏡(ECLIPSE LV100POL)を利用して50倍率で拡大して測定した。結果は、下記表2のようである。
2. Pattern characteristics In order to confirm the presence or absence of pattern peeling, measurement was performed at a magnification of 50 using an optical microscope (ECLIPSE LV100POL). The results are shown in Table 2 below.
前記表2を参考すれば、本発明の範囲に含まれる実施例が比較例1に比べて優秀な発光特性を有することを確認することができた。 With reference to Table 2 above, it was confirmed that the examples included in the scope of the present invention had excellent luminescence characteristics as compared with Comparative Example 1.
比較例1、2、3及び実施例1、6、7の結果を比較すると、酸化防止剤の量が増加するほど高い発光強度(intensity)を有し、発光強度がハードべーク後にも高く維持されることを確認することができた。 Comparing the results of Comparative Examples 1, 2, 3 and Examples 1, 6 and 7, the higher the amount of the antioxidant, the higher the intensity, and the higher the emission intensity even after hard baking. I was able to confirm that it would be maintained.
比較例2及び比較例3を参考すれば、酸化防止剤の含量が0.1%未満の場合は、発光光度を維持する効果が不備であった。また、その含量が10%超過の場合には、発光光度は高く維持されるが、現像した以後に画素部パターン剥離を確認することができた。 With reference to Comparative Example 2 and Comparative Example 3, when the content of the antioxidant was less than 0.1%, the effect of maintaining the luminous intensity was inadequate. Further, when the content exceeds 10%, the luminosity of light emission is maintained high, but the peeling of the pixel pattern can be confirmed after the development.
Claims (14)
フォトルミネッセンス量子ドットの粒子、光重合性化合物、光重合開始剤、アルカリ可溶性樹脂、溶剤及び酸化防止剤を含み、
前記アルカリ可溶性樹脂は、カルボキシ基を有するエチレン性不飽和単量体およびN−置換マレイミド系化合物を含んで重合され、
前記N−置換マレイミド系化合物は、N−シクロヘキシルマレイミド、N−ベンジルマレイミド、N−フェニルマレイミド、N−o−ヒドロキシフェニルマレイミド、N−m−ヒドロキシフェニルマレイミド、N−p−ヒドロキシフェニルマレイミド、N−o−メチルフェニルマレイミド、N−m−メチルフェニルマレイミド、N−p−メチルフェニルマレイミド、N−o−メトキシフェニルマレイミド、N−m−メトキシフェニルマレイミド、およびN−p−メトキシフェニルマレイミドからなる群より選択される少なくとも一つを含み、
前記酸化防止剤は、組成物の固形分総重量中0.1〜10重量%で含まれることを特徴とする感光性樹脂組成物。 A photosensitive resin composition for forming a color pattern that does not contain dyes and pigments contained in a color filter.
Contains photoluminescent quantum dot particles, photopolymerizable compounds, photopolymerization initiators, alkali-soluble resins, solvents and antioxidants.
The alkali-soluble resin is polymerized by containing an ethylenically unsaturated monomer having a carboxy group and an N-substituted maleimide-based compound.
The N-substituted maleimide-based compounds include N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, No-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, and N-. From the group consisting of o-methylphenylmaleimide, Nm-methylphenylmaleimide, Np-methylphenylmaleimide, NO-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, and Np-methoxyphenylmaleimide. Including at least one selected
The photosensitive resin composition is characterized in that the antioxidant is contained in an amount of 0.1 to 10% by weight based on the total solid content of the composition.
前記コアは、CdSe、CdS、ZnS、ZnSe、ZnTe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS、HgS、HgSe、HgTe、GaN、GaP、GaAs、InP、InAs及びZnOからなる群から選択される一つ以上であり、
前記シェルは、CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及びHgSeからなる群から選択される一つ以上であることを特徴とする請求項1に記載の感光性樹脂組成物。 The photoluminescent quantum dot has a core-shell dual structure and has a core-shell dual structure.
The core is selected from the group consisting of CdSe, CdS, ZnS, ZnSe, ZnTe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and ZnO. That's it,
The photosensitive resin composition according to claim 1, wherein the shell is one or more selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe and HgSe.
赤色量子ドット粒子を含有した赤色パターン層、緑色量子ドット粒子を含有した緑色パターン層及び量子ドット粒子を含まない透明パターン層を含む前記カラーフィルタを備えたことを特徴とする請求項13に記載の画像表示装置。 The image display device includes a light source that emits blue light and
The thirteenth aspect of claim 13, wherein the color filter includes the red pattern layer containing the red quantum dot particles, the green pattern layer containing the green quantum dot particles, and the transparent pattern layer not containing the quantum dot particles. Image display device.
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