KR102511820B1 - Photosensitive Resin Composition and Color Filter Using the Same - Google Patents

Abstract

The present invention is a photosensitive resin composition comprising photoluminescent quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a light stabilizer and a solvent, wherein the light stabilizer comprises a hindered amine compound, using the same To provide a color filter and an image display device manufactured by the. The photosensitive resin composition according to the present invention maintains high quantum efficiency without deterioration of light emitting properties during the hard bake process and has excellent light emitting properties.

Description

Photosensitive Resin Composition and Color Filter Using the Same

The present invention relates to a photosensitive resin composition and a color filter using the same, and more particularly, to a photosensitive resin composition that maintains high quantum efficiency without deterioration of light emitting properties during a hard bake process and has excellent light emitting properties, and a color filter using the same.

A color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and functions as a fine pixel unit, and the size of one pixel is about tens to hundreds of micrometers. These color filters include a black matrix layer formed in a predetermined pattern on a transparent substrate to block light at the boundary between each pixel and a plurality of colors (generally, red (R), green (G)) to form each pixel. and blue (B)) have a structure in which pixel units in which three primary colors are arranged in a predetermined order are sequentially stacked. In general, color filters can be produced by coating three or more colors on a transparent substrate by dyeing, electrodeposition, printing, pigment dispersion, etc. Recently, pigment dispersion using pigment dispersion type photosensitive resin is the mainstream. achieve

The pigment dispersion method, which is one of the methods for realizing a color filter, coats a photosensitive resin composition including a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a solvent, and additives on a transparent substrate provided with a black matrix, and forms the It is a method of forming a colored thin film by repeating a series of processes of exposing a pattern in the form of exposure, removing the non-exposed area with a solvent and curing it with heat. there is. In recent years, even in the photosensitive resin composition for color filters using a pigment dispersion method having various advantages, not only excellent pattern characteristics but also improved performance such as high brightness and high contrast ratio along with high color reproduction is required.

However, color reproduction is implemented by passing light emitted from a light source through a color filter. In this process, some of the light is absorbed by the color filter, reducing light efficiency, and due to the characteristics of pigments as color filters, perfect color reproduction is not possible. There are fundamental limits to its impact.

As a solution to this problem, there is a method for manufacturing a color filter using a photosensitive resin composition containing quantum dots [Republic of Korea Patent Publication No. 10-2016-0086739]. By using quantum dots, the emission waveform can be narrowed, it has a high color implementation ability that cannot be implemented with pigments, and it can exhibit excellent luminance characteristics. However, quantum dots are oxidized during a hard bake process performed at a high temperature for the manufacture of color filters, resulting in a decrease in light efficiency. Therefore, it is necessary to develop a method capable of suppressing this problem.

Republic of Korea Patent Publication No. 10-2016-0086739

One object of the present invention is to provide a photosensitive resin composition that maintains high quantum efficiency without deterioration of light emitting properties during a hard bake process and has excellent light emitting properties.

Another object of the present invention is to provide a color filter formed using the photosensitive resin composition.

Another object of the present invention is to provide an image display device having the color filter.

On the other hand, the present invention is a photosensitive resin composition comprising photoluminescence quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a light stabilizer and a solvent, wherein the light stabilizer comprises a hindered amine compound. provides

In one embodiment of the present invention, the hindered amine compound may be a compound represented by Formula 1 below.

[Formula 1]

In the above formula,

R _a and R _b are each independently hydrogen or methyl;

R _c and R _d are _each independently _hydrogen , C _1-4 alkyl or C _6-10 aryl;

R _e is hydrogen; C _1-18 alkyl _; C _1-18 alkoxy _; C _2-7 alkyl or _{C 2-7} alkoxy substituted with hydroxy _{; C 2-18} alkenyl; _{C 2-18} alkenyloxy; _{C 3-18} alkynyl; _{C 3-18} alkynyloxy; C _3-12 cycloalkyl _; C _3-12 cycloalkoxy _; C _6-10 bicycloalkyl _; C _6-10 bicycloalkoxy _; C _3-8 cycloalkenyl _{; C 3-8} cycloalkenyloxy; C _6-20 aryl unsubstituted or substituted _with C _1-4 alkyl, _{C 1-4} alkoxy or halogen _; C _6-20 aryloxy _{unsubstituted} or substituted with C _1-4 alkyl, _{C 1-4} alkoxy or halogen _; -C(=O)-H, -C(=O)-C _{1 -19} Alkyl, -C(=O)-C _{2 -19} Alkenyl, -C(=O)-C _{2 -4} Alkenyl- C _6-10 aryl, -C(=O)-C _{6 -10} aryl, -C(=O)-OC _{1 -6} alkyl, -C(=O)-OC _{6 -10} aryl, -C(=O )-NH-C _{1-6 alkyl} , -C(=O)-NH-C _6-10 aryl and -C(=O) _-N (C _1-6 alkyl) ₂ acyl; or -OC(=O)-C _1-19 alkyl _, -OC(=O)-C _2-19 alkenyl and -OC(=O)-C _6-10 aryl _;

Y is -O-C(=O)-R'-C(=O)-O-;

이고, _R ' is C _1-10 alkyl _, C _3-12 cycloalkyl, C _{6-15 aryl} or

ego,

R″ is C _1-10 alkyl _, C _3-12 cycloalkyl or C _{6-15 aryl .}

In one embodiment of the present invention, the hindered amine compound may be a compound represented by Formula 2 below.

[Formula 2]

In the above formula,

이며, R is

is,

R _a and R _b are each independently hydrogen or methyl;

R _c and R _d are _each independently _hydrogen , C _1-4 alkyl or C _6-10 aryl;

R _e is hydrogen; C _1-18 alkyl _; C _1-18 alkoxy _; C _2-7 alkyl or _{C 2-7} alkoxy substituted with hydroxy _{; C 2-18} alkenyl; _{C 2-18} alkenyloxy; _{C 3-18} alkynyl; _{C 3-18} alkynyloxy; C _3-12 cycloalkyl _; C _3-12 cycloalkoxy _; C _6-10 bicycloalkyl _; C _6-10 bicycloalkoxy _; C _3-8 cycloalkenyl _{; C 3-8} cycloalkenyloxy; C _6-20 aryl unsubstituted or substituted _with C _1-4 alkyl, _{C 1-4} alkoxy or halogen _; C _6-20 aryloxy _{unsubstituted} or substituted with C _1-4 alkyl, _{C 1-4} alkoxy or halogen _; -C(=O)-H, -C(=O)-C _{1 -19} Alkyl, -C(=O)-C _{2 -19} Alkenyl, -C(=O)-C _{2 -4} Alkenyl- C _6-10 aryl, -C(=O)-C _{6 -10} aryl, -C(=O)-OC _{1 -6} alkyl, -C(=O)-OC _{6 -10} aryl, -C(=O )-NH-C _{1-6 alkyl} , -C(=O)-NH-C _6-10 aryl and -C(=O) _-N (C _1-6 alkyl) ₂ acyl; or -OC(=O ₎ -C _1-19 alkyl _, -OC(=O)-C _2-19 alkenyl and -OC(=O)-C _6-10 aryl.

In one embodiment of the present invention, the light stabilizer may further include at least one light stabilizer selected from the group consisting of a benzotriazole-based light stabilizer, a triazine-based light stabilizer, and a benzophenone-based light stabilizer.

On the other hand, the present invention provides a color filter formed using the photosensitive resin composition.

On the other hand, the present invention provides an image display device characterized in that the color filter is provided.

The photosensitive resin composition according to the present invention contains a hindered amine compound as a light stabilizer, thereby suppressing photoluminescence quantum dot particles from being oxidized during a hard bake process, maintaining high quantum efficiency without deterioration of light emitting properties, and exhibiting high light emitting properties. great.

Hereinafter, the present invention will be described in more detail.

One embodiment of the present invention is a photoluminescent quantum dot particle (A), a photopolymerizable compound (B), a photopolymerization initiator (C), an alkali-soluble resin (D), a light stabilizer (E) and a solvent (F) comprising As a photosensitive resin composition, the light stabilizer relates to a photosensitive resin composition containing a hindered amine compound.

Luminescence quantum dot particle (A)

The photosensitive resin composition of the present invention contains photoluminescence quantum dot particles.

Quantum dots are nano-sized semiconductor materials. Atoms make up molecules, and molecules make up aggregates of small molecules called clusters to form nanoparticles. When these nanoparticles have semiconductor properties, they are called quantum dots.

When the quantum dot receives energy from the outside and reaches an excited state, it emits energy according to the corresponding energy bandgap.

The photosensitive resin composition of the present invention includes such photoluminescent quantum dot particles, and a color filter prepared therefrom can emit light (photoluminescence) by light irradiation.

In a typical image display device including a color filter, white light passes through the color filter to realize color. In this process, light efficiency is lowered because a part of the light is absorbed by the color filter. However, in the case of including a color filter made of the photosensitive resin composition of the present invention, since the color filter emits light by itself by light from a light source, more excellent light efficiency can be implemented.

In addition, color reproducibility is better because light with a color is emitted, and a viewing angle can be improved because light is emitted in all directions by photoluminescence.

Quantum dot particles according to the present invention are not particularly limited as long as they can emit light when stimulated by light, and for example, II-VI group semiconductor compounds; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; Group IV elements or compounds containing them; And it may be selected from the group consisting of combinations thereof. These can be used individually or in mixture of 2 or more types.

The II-VI group semiconductor compound is a binary element compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and a quaternary compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof, wherein the group III-V semiconductor compound is GaN , GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and binary element compounds selected from the group consisting of mixtures thereof; A ternary compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; And it may be selected from the group consisting of quaternary compounds selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof, , The group IV-VI semiconductor compound is a binary element compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; a ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a quaternary compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof, and the group IV element or compound containing the same is a group consisting of Si, Ge, and mixtures thereof. An element selected from; and a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

Quantum dot particles have a homogeneous unitary structure; dual structures such as core-shell and gradient structures; or a mixture thereof.

In the core-shell dual structure, materials constituting each core and shell may be made of different semiconductor compounds mentioned above. For example, the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.

As the colored photosensitive resin composition used in the manufacture of conventional color filters includes red, green, and blue colorants for color implementation, photoluminescence quantum dot particles can be classified into red quantum dot particles, green quantum dot particles, and blue quantum dot particles. And, the quantum dot particle according to the present invention may be a red quantum dot particle, a green quantum dot particle, or a blue quantum dot particle.

Quantum dot particles may be synthesized by a wet chemical process, an organometallic chemical vapor deposition process, or a molecular beam epitaxy process.

The wet chemical process is a method of growing particles by putting a precursor material in an organic solvent. When the crystal grows, the organic solvent is naturally coordinated on the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, metal organic chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE) The growth of nanoparticles can be controlled through a process that is easier and cheaper than vapor deposition such as epitaxy.

The content of the photoluminescent quantum dot particles is not particularly limited, and may be, for example, 3 to 80% by weight, for example, 5 to 70% by weight, based on 100% by weight of the total solid content of the photosensitive resin composition. If the content of the photoluminescence quantum dot particles is less than 3% by weight, the luminous efficiency may be insignificant, and if the content of the photoluminescence quantum dot particles exceeds 80% by weight, it may be difficult to form a pixel pattern due to a relatively insufficient content of other components.

photopolymerization Compound (B)

The photopolymerizable compound (B) contained in the quantum dot photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described later, and includes monofunctional monomers, bifunctional monomers, and other multifunctional monomers. there is.

Specific examples of the monofunctional monomer include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, N-vinylpyrroly money, etc.

Specific examples of the bifunctional monomer include 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, Bis(acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di(meth)acrylate, etc. are mentioned.

Specific examples of other polyfunctional monomers include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, Pentaerythritol hexa(meth)acrylate, dipentaerythritol pentaacrylate succinic acid monoester, etc. are mentioned.

Among these, bifunctional or higher functional monomers are preferably used.

The amount of the photopolymerizable compound may be in the range of 5 to 50% by weight, for example, 7 to 45% by weight, based on 100% by weight of the total solid content in the photosensitive resin composition. When the content of the photopolymerizable compound is within the above range, it is preferable because the strength and smoothness of the pixel portion tend to be good.

light polymerization initiator (C)

The photopolymerization initiator (C) contained in the photosensitive resin composition of the present invention is not particularly limited, but may be at least one compound selected from the group consisting of triazine-based compounds, acetophenone-based compounds, biimidazole-based compounds, and oxime compounds. . The photosensitive resin composition containing the photopolymerization initiator (C) described above is highly sensitive, and a pixel pixel formed using this composition has good strength and pattern properties of its pixel portion.

In addition, when the photopolymerization initiator (C) is used in combination with the photopolymerization initiation auxiliary agent (C-1), the photosensitive resin composition containing them becomes more sensitive, and the productivity at the time of forming a color filter using this composition is improved, so it is preferable.

As a triazine compound, for example, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6 -(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2- yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl )-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine; and the like.

As an acetophenone compound, for example, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1-[4-(2-) Hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one , 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan- A 1-one oligomer etc. are mentioned. In addition, compounds represented by the following formula (3) may be mentioned.

[Formula 3]

In the above formula,

R ₁ to R ₄ are each independently hydrogen, halogen, a hydroxy group, a phenyl group unsubstituted or substituted with a C ₁ -C ₁₂ alkyl group, a benzyl group unsubstituted or substituted with a C ₁ -C ₁₂ alkyl group, or a C ₁ -C ₁₂ represents a naphthyl group unsubstituted or substituted with an alkyl group.

Specific examples of the compound represented by Formula 3 include 2-methyl-2-amino(4-morpholinophenyl)ethan-1-one, 2-ethyl-2-amino(4-morpholinophenyl)ethane- 1-one, 2-propyl-2-amino(4-morpholinophenyl)ethan-1-one, 2-butyl-2-amino(4-morpholinophenyl)ethan-1-one, 2-methyl- 2-amino(4-morpholinophenyl)propan-1-one, 2-methyl-2-amino(4-morpholinophenyl)butan-1-one, 2-ethyl-2-amino(4-morpholino Nophenyl) propan-1-one, 2-ethyl-2-amino (4-morpholinophenyl) butan-1-one, 2-methyl-2-methylamino (4-morpholinophenyl) propan-1- one, 2-methyl-2-dimethylamino(4-morpholinophenyl)propan-1-one, 2-methyl-2-diethylamino(4-morpholinophenyl)propan-1-one, etc. there is.

Examples of the biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2, 3-dichlorophenyl) -4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl) Biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole, 4,4',5,5'-position phenyl group The imidazole compound etc. which are substituted by the carboalkoxy group are mentioned. Among these, 2,2'bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4', 5,5'-tetraphenylbiimidazole is preferably used.

Examples of the oxime compound include compounds represented by the following formula (4), formula (5) or formula (6).

[Formula 4]

[Formula 5]

[Formula 6]

In addition, to the extent that the effect of the present invention is not impaired, other photopolymerization initiators commonly used in this field may be additionally used in combination. Examples of other photopolymerization initiators include benzoin-based compounds, benzophenone-based compounds, thioxanthone-based compounds, and anthracene-based compounds. These can be used individually or in combination of 2 or more types, respectively.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.

Examples of the benzophenone compound include benzophenone, methyl 0-benzoylbenzoate, 4-phenyl benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, and 3,3',4,4'-tetra (tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-di(N,N'-dimethylamino)-benzophenone, and the like.

Examples of the thioxanthone-based compound include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone. etc. can be mentioned.

Examples of the anthracene-based compounds include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9,10-diethoxyanthracene. can be heard

In addition, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, phenylclioxylic acid Methyl, a titanocene compound, etc. are mentioned as other photoinitiators.

Further, as the photopolymerization initiation aid (C-1) that can be used in combination with the photopolymerization initiator (C) in the present invention, one or more compounds selected from the group consisting of amine compounds and carboxylic acid compounds may be preferably used.

Specific examples of the amine compound in the photopolymerization initiation aid include aliphatic amine compounds such as triethanolamine, methyldiethanolamine, and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N,N-dimethylparatoluidine, 4,4'-bis(dimethylamino)benzophenone (common name: Michler's ketone), 4,4'- Aromatic amine compounds, such as bis (diethylamino) benzophenone, are mentioned. As the amine compound, an aromatic amine compound is preferably used.

Specific examples of the carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, and dichlorophenyl. and aromatic heteroacetic acids such as thioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid.

The content of the photopolymerization initiator (C) is 0.1 to 20% by weight, for example, 1 to 10% by weight, based on 100% by weight of the total solid content of the photosensitive resin composition, and the content of the photopolymerization initiation auxiliary agent (C-1) is the photosensitive resin composition. It may be usually 0.1 to 20% by weight, for example, 1 to 10% by weight based on 100% by weight of the total solid content of.

When the content of the photopolymerization initiator (C) is within the above range, the sensitivity of the photosensitive resin composition tends to increase, and the strength of the pixel portion and the smoothness on the surface of the pixel portion tend to be good, which is preferable. In addition, when the content of the photopolymerization initiation auxiliary agent (C-1) is within the above range, the sensitivity efficiency of the photosensitive resin composition is further increased, and the productivity of color filters formed using this composition tends to be improved, so it is preferable.

Alkali-soluble resin (D)

The alkali-soluble resin (D) may be polymerized by including an ethylenically unsaturated monomer having a carboxy group. This is a component that imparts solubility to an alkali developing solution used in the developing treatment step at the time of forming a pattern.

The ethylenically unsaturated monomer having a carboxyl group is not particularly limited, and examples thereof include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid, and their anhydrides; and mono(meth)acrylates of polymers having carboxyl groups and hydroxyl groups at both ends, such as ω-carboxypolycaprolactone mono(meth)acrylate, and the like, preferably acrylic acid and methacrylic acid. These can be used individually or in mixture of 2 or more types.

The alkali-soluble resin according to the present invention may be polymerized by further including at least one other monomer copolymerizable with the above monomers. For example, styrene, vinyltoluene, methyl styrene, p-chlorostyrene, o-methoxy styrene, m-methoxy styrene, p-methoxy styrene, o-vinylbenzylmethyl ether, m-vinylbenzylmethyl ether, p - Aromatic vinyl compounds, such as vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, and p-vinyl benzyl glycidyl ether; N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, No-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, No-methylphenylmaleimide, Nm - N-substituted maleimide compounds such as methylphenylmaleimide, Np-methylphenylmaleimide, no-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, and Np-methoxyphenylmaleimide; Methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, i-propyl (meth)acrylate, n-butyl (meth)acrylate, i-butyl (meth)acrylate, Alkyl (meth)acrylates, such as sec-butyl (meth)acrylate and t-butyl (meth)acrylate; Cyclopentyl(meth)acrylate, cyclohexyl(meth)acrylate, 2-methylcyclohexyl(meth)acrylate, tricyclo[5.2.1.0 ^2,6 ]decan-8-yl(meth)acrylate, 2- alicyclic (meth)acrylates such as dicyclopentanyloxyethyl (meth)acrylate and isobornyl (meth)acrylate; aryl (meth)acrylates such as phenyl (meth)acrylate and benzyl (meth)acrylate; 3-(methacryloyloxymethyl)oxetane, 3-(methacryloyloxymethyl)-3-ethyloxetane, 3-(methacryloyloxymethyl)-2-trifluoromethyloxetane, 3-(methacryloyloxymethyl)-2-phenyloxetane, 2-(methacryloyloxymethyl)oxetane, 2-(methacryloyloxymethyl)-4-trifluoromethyloxetane, etc. The unsaturated oxetane compound of , etc. are mentioned. These can be used individually or in mixture of 2 or more types.

In this specification, (meth)acrylate means acrylate or methacrylate.

The content of the alkali-soluble resin is not particularly limited, and may be, for example, 5 to 80% by weight, for example, 10 to 70% by weight based on 100% by weight of the total solid content of the photosensitive resin composition. When the content of the alkali-soluble resin is within the above range, the solubility in the developing solution is sufficient to facilitate pattern formation, and film reduction of the pixel portion of the exposed portion is prevented during development, so that the omission of the non-pixel portion can be improved.

light stabilizer (E)

The light stabilizer includes a hindered amine compound. The photosensitive resin composition of the present invention contains a hindered amine compound, thereby suppressing photoluminescence quantum dot particles from being oxidized during a hard bake process, maintaining high quantum efficiency without deterioration of light emitting properties and having excellent light emitting properties do.

In one embodiment of the present invention, the hindered amine compound may be a compound represented by Formula 1 below.

[Formula 1]

In the above formula,

R _a and R _b are each independently hydrogen or methyl;

R _c and R _{d are each independently hydrogen, C 1-4 alkyl or C 6-10 aryl ,}

R _e is hydrogen; C _1-18 alkyl _; C _1-18 alkoxy _; hydroxy- _substituted C _2-7 alkyl or C _2-7 alkoxy _{; C 2-18} alkenyl; _{C 2-18} alkenyloxy; _{C 3-18} alkynyl; _{C 3-18} alkynyloxy; C _3-12 cycloalkyl _; C _3-12 cycloalkoxy _; C _6-10 bicycloalkyl; C _{6-10 bicycloalkoxy} ; _{C 3-8} cycloalkenyl; _{C 3-8} cycloalkenyloxy; _{C 1-4} alkyl, C _1-4 alkoxy or halogen-substituted or _{unsubstituted} C _6-20 aryl _; C _1-4 alkyl, C _1-4 alkoxy or halogen- _substituted or _{unsubstituted} C _6-20 aryloxy _; -C(=O)-H, -C(=O)-C _{1 -19} Alkyl, -C(=O)-C _{2 -19} Alkenyl, -C(=O)-C _{2 -4} alkenyl-C _{6 -10} aryl, -C(=O)-C _{6 -10} aryl, -C(=O)-OC _{1 -6} alkyl, -C(=O)-OC _{6 -10} Aryl, -C(=O)-NH-C _{1 -6} Alkyl, -C(=O)-NH-C _{6 -10} Aryl ₎ and -C(=0)-N(C _1-6 alkyl) ₂ ; or from -OC(=O)-C _{1 -19} alkyl, -OC(=O)-C _{2 -19} alkenyl and -OC(=O)-C _6-10 aryl acyloxy selected;

Y is -O-C(=O)-R'-C(=O)-O-;

이고, R' is C _{1 -10} alkyl (alkyl), C _{3 -12} cycloalkyl (cycloalkyl), C _{6 -15} aryl (aryl) or

ego,

R" is C _1-10 alkyl, _{C 3-12} cycloalkyl _or C _6-15 aryl _.

In one embodiment of the present invention, the hindered amine compound may be a compound represented by Formula 2 below.

[Formula 2]

In the above formula,

이며, R is

is,

R _a and R _b are each independently hydrogen or methyl;

R _c and R _{d are} each independently hydrogen _, C _1-4 alkyl or C _6-10 aryl,

R _e is hydrogen; C _1-18 alkyl _; C _1-18 alkoxy _; hydroxy- _substituted C _2-7 alkyl or C _2-7 alkoxy _{; C 2-18} alkenyl; _{C 2-18} alkenyloxy; _{C 3-18} alkynyl; _{C 3-18} alkynyloxy; C _3-12 cycloalkyl _; C _3-12 cycloalkoxy _; C _6-10 bicycloalkyl; C _{6-10 bicycloalkoxy} ; _{C 3-8} cycloalkenyl; _{C 3-8} cycloalkenyloxy; a C _1-4 alkyl, C _1-4 alkoxy _{, or halogen-substituted or unsubstituted C 6-20 aryl group ;} C _1-4 alkyl, C _1-4 alkoxy or halogen- _substituted or _{unsubstituted} C _6-20 aryloxy _; -C(=O)-H, -C(=O)-C _{1 -19} Alkyl, -C(=O)-C _{2 -19} Alkenyl, -C(=O)-C _{2 -4} alkenyl-C _{6 -10} aryl, -C(=O)-C _{6 -10} aryl, -C(=O)-OC _{1 -6} alkyl, -C(=O)-OC _{6 -10} Aryl, -C(=O)-NH-C _{1 -6} Alkyl, -C(=O)-NH-C _{6 -10} Aryl ₎ and -C(=0)-N(C _1-6 alkyl) ₂ ; or from -OC(=O)-C _{1 -19} alkyl, -OC(=O)-C _{2 -19} alkenyl and -OC(=O)-C _6-10 aryl acyloxy of choice.

Alkyl referred to in the present invention includes straight chain or branched chain, and includes methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, n-pentyl, n-hexyl, n- octyl, n-decyl, and the like.

Also, alkenyl is an alkyl having one or more carbon-carbon double bonds, and alkynyl is an alkyl having one or more carbon-carbon triple bonds.

Aryl referred to in the present invention includes phenyl, biphenyl, terphenyl, stilbene, naphthyl, anthracenyl, phenanthryl, pyrenyl and the like.

Cycloalkyl mentioned in the present invention includes cyclopropyl, cyclopropylmethyl, cyclopentyl, cyclohexyl, adamantyl, and substituted and unsubstituted bornyl, norbornyl, norbornenyl, and the like.

Alkoxy referred to in the present invention includes methoxy, ethoxy, n-propoxy, i-propoxy, t-butoxy, n-butoxy, pentoxy and the like.

The acyl is, for example, formyl, acetyl, trifluoroacetyl, pivaloyl, acryloyl, methacryloyl, oleoyl, cinamoyl, benzoyl, 2,6-xyloyl, tert-butoxycarbonyl, ethylcarbamoyl, phenylcarba Moyl (phenylcarbamoyl) and the like.

The acyloxy is acetoxy, trifluoroacetoxy, pivaloyloxy, acryloyloxy, methacryloyloxy, benzoyloxy, etc. can

In Formula 1, R _a , R _b , R _c and R _d are hydrogen, R _e is hydrogen or C ₁ -C ₁₈ alkoxy, and Y is -OC(=O)-R'-C(=O) -O-, and R' may be C ₁ -C ₁₀ alkyl.

In Formula 2, R _a , R _b , R _c and R _d are hydrogen, and R _e may be hydrogen or C ₁ -C ₁₈ alkyl.

Examples of commercial products of the compound represented by Formula 1 include TINUVIN 123, TINUVIN 770DF, and TINUVIN 292 (above, manufactured by BASF).

Examples of commercially available products of the compound represented by Formula 2 include LA-52 and LA-57 (above, Adecas).

In addition, the light stabilizer may further include a known light stabilizer in addition to the hindered amine compound. For example, the light stabilizer may further include at least one light stabilizer selected from the group consisting of a benzotriazole-based light stabilizer, a triazine-based light stabilizer, and a benzophenone-based light stabilizer.

As the benzotriazole-based light stabilizer, known benzotriazole-based derivatives can be used, and are available from commercial products. Specifically, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(2'-hydroxy-5'-tert-butylphenyl)benzotriazole, 2-(2'-hydroxy- 3',5-di-tert-butylphenyl)benzotriazole, 2-(2'-hydroxy-5'-tert-octylphenyl)benzotriazole or 2-(2'-hydroxy-3',5 '-di-tert-octylphenyl) benzotriazole, or commercially available TINUVIN PS, TINUVIN 99-2, INUVIN 109, TINUVIN 384-2, TINUBIN 571, TINUVIN 900, TINUVIN 928 or TINUVIN 1130 (above, Ciba Specialty Chemicals) and the like can be exemplified.

As the triazine-based light stabilizer, a hydroxyphenyltriazine-based ultraviolet absorber is preferable. It may be a commercially available thing, for example, TINUVIN 400, TINUVIN 405, TINUVIN 460, TINUVIN 479 or TINUVIN 1577 (above, Ciba Specialty Chemicals Co., Ltd.), etc. are mentioned.

As the benzophenone-based light stabilizer, benzophenone-based derivatives known as light stabilizers can be used, and can be obtained from commercial products. Specifically, 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxy benzophenone, 2-hydroxy-4-methoxy benzophenone-5-sulfonic acid, 2-hydroxy-4-n-octyl Oxybenzophenone, 2-hydroxy-4-n-dodecyloxybenzophenone, 2-hydroxy-4-benzyloxy benzophenone, bis(5-benzoyl-4-hydroxy-2-methoxyphenyl)methane, 2,2'-dihydroxy-4-methoxy benzophenone or 2,2'-dihydroxy-4,4'-dimethoxy benzophenone, commercially available CHIMASSORB81 (above, Ciba Specialty Chemicals Co., Ltd.) ) and the like.

The additional light stabilizer may be mixed and used in an amount of 0.2 to 2 parts by weight per 1 part by weight of the hindered amine compound.

The amount of the light stabilizer may be 0.025 to 10% by weight, for example, 0.01 to 7% by weight based on 100% by weight of the total solid content of the photosensitive resin composition. When contained within the above range, it is possible to prevent a decrease in light efficiency of the photosensitive resin composition, and it is possible to form a pattern well without interfering with the action of the photopolymerization initiator.

Solvent (F)

The solvent is not particularly limited and may be an organic solvent commonly used in the art.

Specific examples include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether; alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate and methoxypentyl acetate; Aromatic hydrocarbons, such as benzene, toluene, xylene, and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; cyclic esters such as γ-butyrolactone; etc. can be mentioned. These can be used individually or in mixture of 2 or more types.

The content of the solvent is not particularly limited, and may be included in, for example, 60 to 90% by weight, for example, 70 to 85% by weight, based on the total weight of the photosensitive resin composition. When the content of the solvent is within the above range, coating properties may be good.

In the photosensitive resin composition of the present invention, additives (G) such as fillers, other polymer compounds, adhesion accelerators, and aggregation inhibitors may be used in combination as needed.

Specific examples of the filler include glass, silica, alumina, and the like.

As said other high molecular compound, specifically, curable resins, such as an epoxy resin and a maleimide resin; Thermoplastic resins, such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, and polyurethane, etc. are mentioned.

As said adhesion promoter, for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned.

Specifically as said aggregation inhibitor, sodium polyacrylate etc. are mentioned.

One embodiment of the present invention relates to a color filter formed using the photosensitive resin composition described above.

When the color filter of the present invention is applied to an image display device, since it emits light from a light source of the display device, superior light efficiency can be realized. In addition, color reproducibility is better because light with a color is emitted, and a viewing angle can be improved because light is emitted in all directions by photoluminescence.

The color filter includes a substrate and a pattern layer formed on the substrate.

The substrate may be a substrate of the color filter itself, or may be a portion where the color filter is positioned, such as a display device, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiO _x ) or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).

The pattern layer is a layer containing the photosensitive resin composition of the present invention, and may be a layer formed by applying the photosensitive resin composition and exposing, developing, and thermally curing the photosensitive resin composition in a predetermined pattern.

In one embodiment of the present invention, the pattern layer formed of the photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. can When light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light. In this case, the emission light of the light source is not particularly limited when applied to the image display device, but a light source emitting blue light may be used in terms of better color reproducibility.

In one embodiment of the present invention, the pattern layer may include only pattern layers of two colors among a red pattern layer, a green pattern layer, and a blue pattern layer. In this case, the pattern layer further includes a transparent pattern layer that does not contain quantum dot particles. In the case of having only two color pattern layers, a light source emitting light of a wavelength representing the colors other than those not included may be used. For example, when a red pattern layer and a green pattern layer are included, a light source emitting blue light may be used. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer transmits blue light as it is, showing a blue color.

The color filter including the substrate and the pattern layer as described above may further include barrier ribs formed between the respective patterns, and may further include a black matrix. In addition, a protective film formed on the upper portion of the pattern layer of the color filter may be further included.

One embodiment of the present invention relates to an image display device provided with the color filter described above.

The color filter of the present invention can be applied to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device as well as a general liquid crystal display device.

Hereinafter, the present invention will be described in more detail by Examples, Comparative Examples and Experimental Examples. These Examples, Comparative Examples and Experimental Examples are only for explaining the present invention, and it is obvious to those skilled in the art that the scope of the present invention is not limited thereto.

manufacturing example One: CdSe (core)/ ZnS (shell) structure Luminescence rust quantum dot synthesis of particles

Put CdO (0.4 mmol), zinc acetate (4 mmol), and oleic acid (5.5 mL) together with 1-octadecene (20 mL) into a reactor and heat to 150 ° C. reacted Thereafter, in order to remove acetic acid generated by replacing zinc with oleic acid, the reactant was left under a vacuum of 100 mTorr for 20 minutes. Then, heat was applied at 310 ° C to obtain a transparent mixture, which was maintained at 310 ° C for 20 minutes, and then 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine. and S solutions were rapidly injected into the reactor containing the Cd(OA) ₂ and Zn(OA) ₂ solutions. The mixture obtained therefrom was grown at 310° C. for 5 minutes, and then growth was stopped using an ice water bath. Then, by precipitating with ethanol to separate the quantum dots using a centrifuge, and washing off excess impurities using chloroform and ethanol, stabilized with oleic acid, the sum of the core particle size and the shell thickness is 3 to 5 nm. Quantum dot particles having a CdSe (core)/ZnS (shell) structure in which the particles are distributed were obtained.

manufacturing example 2: synthesis of alkali-soluble resin

A flask equipped with a stirrer, thermometer, reflux condenser, dropping funnel and nitrogen inlet tube was prepared. Separately, 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, propylene glycol monomethyl ether After adding 40 parts by weight of acetate (hereinafter referred to as PGMEA) and stirring and mixing to prepare a monomer loading lot, 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and stirred and mixed to prepare a dropping lot of chain transfer agent. Thereafter, 395 parts by weight of PGMEA was introduced into the flask, the atmosphere in the flask was changed from air to nitrogen, and the temperature of the flask was raised to 90° C. while stirring. Subsequently, loading of the monomer and chain transfer agent from the loading lot was started. Dropping proceeded for 2 hours while maintaining 90 ° C. After 1 hour, the temperature was raised to 110 ° C. ring started. Subsequently, 10 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were put into a flask and kept at 110°C for 8 hours. While the reaction was continued, and then cooled to room temperature, an alkali-soluble resin having a solid content of 29.1% by weight, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH/g was obtained.

Example 1 to 7 and comparative example 1 to 2: Preparation of photosensitive resin composition

As shown in Table 1 below, each component was mixed (unit: wt%), diluted with propylene glycol monomethyl ether acetate to a total solid content of 20 wt%, and then sufficiently stirred to obtain a photosensitive resin composition.

Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Comparative Example 1 Comparative Example 2 Quantum Dot (A) A-1 30 30 30 30 30 30 30 30 30 Photopolymerizable Compound (B) B-1 9 9 9 9 9 9 9 10 9 B-2 24 24 24 24 24 24 24 25 24 Photopolymerization Initiator (C) C-1 5 5 5 5 5 5 5 5 5 Alkali-soluble resin (D) D-1 30 30 30 30 30 30 30 30 30 light stabilizer (E) E-1 2 - - - One One One - - E-2 - 2 - - - - E-3 - - 2 - One One - - E-4 - - - 2 - - E-5 - - - - One One - - E-6 - - - - - - - - 2

A-1: CdSe (core) / ZnS (shell) structure quantum dots of Preparation Example 1

B-1: dipentaerythritol pentaacrylate succinic acid monoester (a carboxylic acid-containing five-functional photopolymerizable compound) (TO-1382, manufactured by Donga Chemical)

B-2: dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

C-1: Irgaqure-907 (manufactured by BASF)

D-1: Alkali-soluble resin of Production Example 2

E-1: TINUVIN 123 (manufactured by BASF) - hindered amine compound (R _a , R _b , R _c and R _d are hydrogen, R _e is octoxy, and Y is -OC(=O)-R'- C(=O)-O-, and R' is octyl; a compound of Formula 1)

E-2: TINUVIN 770DF (manufactured by BASF) - hindered amine compound (R _a , R _b , R _c and R _d are hydrogen, R _e is hydrogen, and Y is -OC(=O)-R'-C (=O)-O-, and R' is octyl; a compound of Formula 1)

E-3: LA-52 (manufactured by Adeka) - hindered amine compound (compound of Formula 2 in which R _a , R _b , R _c and R _d are hydrogen and R _e is methyl)

E-4: LA-57 (manufactured by Adeka) - hindered amine compound (compound of Formula 2 wherein R _a , R _b , R _c and R _d are hydrogen and R _e is hydrogen)

E-5: TINUVIN 109 (manufactured by BASF) - benzotriazole compound

E-6: DABCO (1,4-diazabicyclo[2,2,2]octane)

Experimental Example One

A color filter was prepared as follows using the photosensitive resin composition prepared in the above Examples and Comparative Examples, and the developing speed, sensitivity and adhesion were measured in the following manner, and the results are shown in Table 2 below.

<Manufacture of color filter>

Each photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a 20 mm × 20 mm square transmission pattern and a line/space pattern of 1 μm to 100 μm was placed on the thin film, and ultraviolet rays were irradiated at a distance of 100 μm from the test photomask.

At this time, the ultraviolet light source was irradiated with light at an exposure amount of 200 mJ/cm 2 (365 nm) in an air atmosphere using an ultra-high pressure mercury lamp (trade name: USH-250D) manufactured by Ushio Electric Co., Ltd., and no special optical filter was used. The thin film irradiated with ultraviolet light was developed by immersing it in a KOH aqueous solution of pH 10.5 for 80 seconds. The glass substrate coated with the thin film was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150° C. for 10 minutes to prepare a color filter. The film thickness of the color filter prepared above was 3.0 μm.

(1) Pattern precision

The size of the pattern obtained through the line/space pattern mask designed to be 100 μm among the color filters prepared using the photosensitive resin composition was measured using OM equipment (ECLIPSE LV100POL, Nikon Co.). Pattern error was calculated by comparing the width of the light transmission pattern formed on the pattern mask with the measured width of the color filter pattern (measured pattern width). That is, the pattern error is obtained by Equation 1 below.

[Equation 1]

Pattern error (Δ) = (width of light transmission pattern) - (measured pattern width)

If the value of the pattern error is greater than 20 μm, it is difficult to implement a fine pattern and it is difficult to implement a fine pixel, and if it has a negative value, process defects may be caused.

(2) Luminous intensity and luminous intensity retention rate (heat resistance)

A 365nm tube-type 4W UV irradiator (VL-4LC, VILBER LOURMAT) irradiates light on the pattern part formed in a 20mm×20mm square pattern among the color filters, and emits light in the wavelength (550nm) region emitted by photoluminescence. Intensity was measured using a spectrum meter (Ocean Optics).

A hard bake was performed at 230° C. for 60 minutes, the emission intensity before and after the hard bake was measured, and the emission intensity retention rate compared to Comparative Example 1 was compared and shown in Table 2.

pattern error luminous intensity Luminous intensity retention rate (%) Comparative Example 1 30 23512 STD Comparative Example 2 27 24456 104 Example 1 12 52135 130 Example 2 13 53258 135 Example 3 11 58954 133 Example 4 12 54875 138 Example 5 10 60427 142 Example 6 11 60328 141 Example 7 9 63542 149

As shown in Table 2, the photosensitive resin compositions of Examples 1 to 7 containing the hindered amine compound according to the present invention as a light stabilizer were compared with the photosensitive resin compositions of Comparative Examples 1 to 2 without the same as light stabilizers. It was confirmed that implementation is possible, and even after hard baking, oxidation of the quantum dots can be suppressed to maintain a higher emission intensity.

Having described specific parts of the present invention in detail above, it is clear that these specific techniques are only preferred embodiments for those skilled in the art to which the present invention belongs, and the scope of the present invention is not limited thereto. do. Those skilled in the art to which the present invention pertains will be able to make various applications and modifications within the scope of the present invention based on the above information.

Accordingly, the substantial scope of the present invention will be defined by the appended claims and equivalents thereof.

Claims (9)

A photosensitive resin composition comprising photoluminescent quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a light stabilizer and a solvent, wherein the light stabilizer comprises a hindered amine compound represented by Formula 2 below. :
[Formula 2]

In the above formula,
R is

is,
R _a and R _b are each independently hydrogen or methyl;
R _c and R _d are each independently hydrogen, C _1-4 alkyl or C _6-10 aryl;
R _e is hydrogen; C _1-18 alkyl; C _1-18 alkoxy; C _2-7 alkyl or C _2-7 alkoxy substituted with hydroxy; C _2-18 alkenyl; C _2-18 alkenyloxy; C _3-18 alkynyl; C _3-18 alkynyloxy; C _3-12 cycloalkyl; C _3-12 cycloalkoxy; C _6-10 bicycloalkyl; C _6-10 bicycloalkoxy; C _3-8 cycloalkenyl; C _3-8 cycloalkenyloxy; C _6-20 aryl unsubstituted or substituted with C _1-4 alkyl, C _1-4 alkoxy or halogen; C _6-20 aryloxy unsubstituted or substituted with C _1-4 alkyl, C _1-4 alkoxy or halogen; -C(=O)-H, -C(=O)-C _1-19 Alkyl, -C(=O)-C _2-19 Alkenyl, -C(=O)-C _2-4 Alkenyl- C _6-10 Aryl, -C(=O)-C _6-10 Aryl, -C(=O)-OC _1-6 Alkyl, -C(=O)-OC _6-10 Aryl, -C(=O )-NH-C _1-6 alkyl, -C(=O)-NH-C _6-10 aryl and -C(=O)-N(C _1-6 alkyl) ₂ acyl; or -OC(=O)-C _1-19 alkyl, -OC(=O)-C _2-19 alkenyl and -OC(=O)-C _6-10 aryl. delete delete delete The photosensitive resin composition according to claim 1, wherein R _a , R _b , R _c and R _d are hydrogen, and R _e is hydrogen or C ₁ -C ₁₈ alkyl. The photosensitive resin composition according to claim 1, wherein the light stabilizer further comprises at least one light stabilizer selected from the group consisting of a benzotriazole-based light stabilizer, a triazine-based light stabilizer, and a benzophenone-based light stabilizer. The photosensitive resin composition according to claim 1, wherein the amount of the light stabilizer is 0.025 to 10% by weight based on 100% by weight of the total solid content of the photosensitive resin composition. A color filter formed using the photosensitive resin composition according to any one of claims 1 and 5 to 7. An image display device characterized in that the color filter according to claim 8 is provided.