TWI789368B - Photosensitive resin composition, color filter and image display device - Google Patents

Abstract

The present invention provides a photosensitive resin composition comprising a photoluminescence quantum dot particle, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a photostabilizer and a solvent, wherein the photostabilizer includes a hindered amine compound, a color filter and an image display device prepared by using the same. The photosensitive resin composition according to the present invention maintains a high quantum efficiency without deteriorating luminescent property during a hard-bake process and exhibits excellent luminescent property.

Description

Photosensitive resin composition, color filter and image display device

The invention relates to a photosensitive resin composition, a color filter and an image display device. In particular, the present invention relates to a photosensitive resin composition that can maintain a high quantum efficiency (quantum efficiency) without deteriorating photoluminescent properties during a hard-bake process, and can exhibit excellent luminescent properties, and the use of the A color filter of the photosensitive resin composition and an image display device.

The color filter is a thin-film optical element, which can extract three colors of red, green and blue from white light, and can be used as a fine unit pixel, and the size of a pixel is tens to hundreds of microns. The color filter has a structure in which a black matrix layer having a predetermined pattern is formed on a transparent substrate to shield a boundary area between individual pixels, and the pixel parts are stacked in order, in which a plurality of color The three main colors in the pixel (typically red (R), green (G) and blue (B)) are arranged in a predetermined pattern to form each pixel. In general, color filters can be coated with three or more colors by dyeing, electrodeposition, printing, pigment dispersion, etc. Colors are fabricated on a transparent substrate. In recent years, the pigment dispersion method, one of the photosensitive resins using the pigment dispersion type, has become the mainstream.

The pigment dispersion method, which is one of the methods of forming a color filter, is a method of forming a colored film by repeating the following series of steps to coat a photosensitive resin composition comprising a Alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a solvent and an additive, and a colorant are coated on a transparent substrate providing a black matrix, and after exposing the pattern to be formed, a solvent is used to remove It is actively used in the manufacture of liquid crystal display screens (LCDs) for mobile phones, laptops, monitors, televisions, etc. unless exposed and heat cured. In recent years, for the photosensitive resin composition used in the color filter produced by the pigment dispersion method which has many advantages, not only excellent pattern characteristics are required, but also high color reproducibility and more improved performance such as high luminance and high performance such as contrast.

However, the color reproducibility is achieved by the light irradiated by the light source passing through a color filter. During this process, part of the light is absorbed by the color filter, resulting in a decrease in luminous efficiency. Furthermore, due to the pigment properties of color filters, there is a fundamental limitation in achieving a perfect color reproducibility.

As one solution to such problems, a method of manufacturing a color filter has been proposed, wherein the color filter is made using a photosensitive resin composition including quantum dots (Korean Patent Publication No. 10-2016- 0086739 disclosure). In this example, by narrowing the emission waveform by using quantum dots, a high ability to realize light color and excellent emission characteristics that cannot be transmitted through the pigment is exhibited. However, this method exists One problem, that is, during a hard-bake process under high-temperature operation during the manufacture of color filters, the quantum dots will be oxidized, thus causing a decline in luminous efficiency. Therefore, there is a need for how to develop a method that can suppress the above-mentioned problems.

An object of the present invention is to provide a photosensitive resin composition, which can maintain a high quantum efficiency (quantum efficiency) without deteriorating the photoluminescent property (luminescent property) during the hard-bake process, and can exhibit excellent luminescent properties .

Another object of the present invention is to propose a color filter using a photosensitive resin composition.

Another object of the present invention is to provide an image display device with a color filter.

In another aspect, the present invention provides a photosensitive resin composition, comprising a photoluminescence quantum dot particle, a photopolymerizable compound, a photopolymerization initiator, a An alkali-soluble resin, a photostabilizer and a solvent, wherein the photostabilizer includes a hindered amine compound.

In one embodiment of the present invention, the hindered amine compound is represented by the following chemical formula 1.

；以及 R"為C1-C10之烷基、C3-C12之環烷基或C6-C15芳基。 Wherein, R _a and R _b are each independently hydrogen or methyl; R _c and R _d are each independently hydrogen, C1-C4 alkyl (alkyl) or C6-C10 aryl (aryl); R _e is Hydrogen, C1-C18 alkyl, C1-C18 alkoxy, C2-C7 alkyl or C2-C7 alkoxy substituted by hydroxyl, C2-C18 alkenyl ), C2-C18 alkenyloxy (alkenyloxy), C3-C18 alkynyl (alkynyl), C3-C18 alkynyloxy (alkynyloxy), C3-C12 cycloalkyl (cycloalkyl), C3-C12 ring Alkoxy (cycloalkoxy), C6-C10 bicycloalkyl (bicycloalkyl), C6-C10 bicycloalkoxy (bicycloalkoxy), C3-C8 cycloalkenyl (cycloalkenyl), C3-C8 cycloalkenyloxy Cycloalkcnyloxy, C6-C20 aryl substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen, substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen Substituted C6-C20 aryloxy (aryloxy); selected from -C(=O)-H, C1-C19 alkylcarbonyl (-C(=O)-C _1-19 alkyl), C2-C19 Alkenylcarbonyl (-C(=O)-C _2-19 alkenyl), C6-C10 aryl C2-C4 alkenylcarbonyl (-C(=O)-C _2-4 alkenyl-C _6-10 aryl) , C6-C10 aryl carbonyl (-C(=O)-C _6-10 aryl), C1-C6 alkyl ester group (-C(=O)-OC _1-6 alkyl), C6-C10 Aryl ester group (-C(=O)-OC _6-10 aryl), C1-C6 alkylaminocarbonyl group (-C(=O)-NH-C _1-6 alkyl), C6-C10 aromatic Aminocarbonyl (-C(=O)-NH-C _6-10 aryl) and C1-C6 alkyl amido group (-C(=O)-N(C _1-6 alkyl) ₂ ) acyl (acyl); or selected from C1-C19 alkyl acyloxy (-OC(=O)-C _1-19 alkyl), C2-C19 alkenyl acyloxy (-OC(=O)- C _2-19 alkenyl) and C6-C10 aryl acyloxy (-OC(=O)-C _6-10 aryl) acyloxy (acyloxy); Y is -OC(=O)-R'- C(=O)-O-; R' is C1-C10 alkyl, C3-C12 cycloalkyl, C6-C15 aryl or

and R "is C1-C10 alkyl, C3-C12 cycloalkyl or C6-C15 aryl.

In one embodiment of the present invention, the hindered amine compound is represented by the following chemical formula 2.

； R_a和R_b各自獨立地為氫或甲基；R_c和R_d各自獨立地為氫、C1-C4之烷基(alkyl)或C6-C10之芳基(aryl)；以及R_e為氫、C1-C18之烷基、C1-C18之烷氧基(alkoxy)、被羥基(hydroxy)取代的C2-C7之烷基或C2-C7之烷氧基、C2-C18之烯基(alkenyl)、C2-C18之烯氧基(alkenyloxy)、C3-C18之炔基(alkynyl)、C3-C18之炔氧基(alkynyloxy)、C3-C12之環烷基(cycloalkyl)、C3-C12之環烷氧基(cycloalkoxy)、C6-C10之二環烷基(bicycloalkyl)、C6-C10之二環烷氧基(bicycloalkoxy)、C3-C8之環烯基(cycloalkenyl)、C3-C8之環烯氧基(cycloalkenyloxy)、被C1-C4烷基或C1-C4烷氧基或鹵素取代或未取代之C6-C20之芳基、被C1-C4烷基或C1-C4烷氧基或鹵素取代或未取代之C6-C20之芳氧基(aryloxy)；選自-C(=O)-H、C1-C19之烷基羰基(-C(=O)-C_1-19 alkyl)、C2-C19之烯基羰基(-C(=O)-C_2-19 alkenyl)、C6-C10之芳基C2-C4烯基羰基(-C(=O)-C_2-4 alkenyl-C_6-10 aryl)、C6-C10之芳基羰基(-C(=O)-C_6-10 aryl)、C1-C6之烷基酯基(-C(=O)-O-C_1-6 alkyl)、C6-C10之芳基酯基(-C(=O)-O-C_6-10 aryl)、 C1-C6之烷基胺基羰基(-C(=O)-NH-C_1-6 alkyl)、C6-C10之芳基胺基羰基(-C(=O)-NH-C_6-10 aryl)和C1-C6之烷基醯胺基(-C(=O)-N(C_1-6 alkyl)₂)的醯基(acyl)；或是選自C1-C19之烷基醯氧基(-O-C(=O)-C_1-19 alkyl)、C2-C19之烯基醯氧基(-O-C(=O)-C_2-19 alkenyl)和C6-C10之芳基醯氧基(-O-C(=O)-C_6-10 aryl)的醯氧基(acyloxy)。 Among them, R is

R _a and R _b are each independently hydrogen or methyl; R _c and R _d are each independently hydrogen, C1-C4 alkyl (alkyl) or C6-C10 aryl (aryl); and R _e is Hydrogen, C1-C18 alkyl, C1-C18 alkoxy, C2-C7 alkyl or C2-C7 alkoxy substituted by hydroxyl, C2-C18 alkenyl ), C2-C18 alkenyloxy (alkenyloxy), C3-C18 alkynyl (alkynyl), C3-C18 alkynyloxy (alkynyloxy), C3-C12 cycloalkyl (cycloalkyl), C3-C12 ring Alkoxy (cycloalkoxy), C6-C10 bicycloalkyl (bicycloalkyl), C6-C10 bicycloalkoxy (bicycloalkoxy), C3-C8 cycloalkenyl (cycloalkenyl), C3-C8 cycloalkenyloxy Cycloalkenyloxy, C6-C20 aryl substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen, substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen Substituted C6-C20 aryloxy (aryloxy); selected from -C(=O)-H, C1-C19 alkylcarbonyl (-C(=O)-C _1-19 alkyl), C2-C19 Alkenylcarbonyl (-C(=O)-C _2-19 alkenyl), C6-C10 aryl C2-C4 alkenylcarbonyl (-C(=O)-C _2-4 alkenyl-C _6-10 aryl) , C6-C10 aryl carbonyl (-C(=O)-C _6-10 aryl), C1-C6 alkyl ester group (-C(=O)-OC _1-6 alkyl), C6-C10 Aryl ester group (-C(=O)-OC _6-10 aryl), C1-C6 alkylaminocarbonyl group (-C(=O)-NH-C _1-6 alkyl), C6-C10 aromatic Aminocarbonyl (-C(=O)-NH-C _6-10 aryl) and C1-C6 alkyl amido group (-C(=O)-N(C _1-6 alkyl) ₂ ) acyl (acyl); or selected from C1-C19 alkyl acyloxy (-OC(=O)-C _1-19 alkyl), C2-C19 alkenyl acyloxy (-OC(=O)- C _2-19 alkenyl) and C6-C10 aryl acyloxy (-OC(=O)-C _6-10 aryl) acyloxy (acyloxy).

In one embodiment of the present invention, the light stabilizer may further include at least one light stabilizer selected from a benzotriazole-based photostabilizer, a triazine-based photostabilizer A group consisting of a benzophenone-based photostabilizer.

In another aspect, the present invention provides a color filter formed using the above-mentioned photosensitive resin composition.

In another aspect, the present invention provides an image display device, including the above-mentioned color filter.

The photosensitive resin composition according to the present invention, including a hindered amine compound as a light stabilizer, can suppress the photoluminescent quantum dot particles from being oxidized during a hard-baking process, thus without deteriorating the photoluminescent properties A high quantum efficiency can be maintained, and excellent light emitting properties can be exhibited.

The present invention will be described in more detail below.

One embodiment of the present invention relates to a photosensitive resin composition, including a photoluminescence quantum dot particle (A), a photopolymerizable compound (B), a photopolymerization initiator agent (photopolymerization initiator) (C), an alkali-soluble resin (alkali-soluble resin) (D), a photostabilizer (photostabilizer) (E) and a solvent (F), wherein the aforementioned photostabilizer includes a hindered amine compound (hindered amine compound).

Photoluminescent quantum dot particles (A)

The photosensitive resin composition of the present invention includes photoluminescent quantum dot particles.

Quantum dots are nanometer-sized semiconductor substances. Atoms form molecules, and multiple molecules form aggregates composed of multiple small molecules. These aggregates are called clusters and form nanoparticles. When such nanoparticles have semiconductor properties, they are called quantum dots.

When the quantum dot absorbs energy from the outside to make the quantum dot enter the excited state, the quantum dot will release energy corresponding to the energy band gap by itself.

The photosensitive resin composition of the present invention includes, for example, photoluminescent quantum dot particles, so a color filter prepared by using the photosensitive resin composition can emit light (photoluminescence) when irradiated with light.

In a conventional image display device including a color filter, white light passes through the color filter to display colors. During this process, since part of the light is absorbed by the color filter, the light efficiency will be reduced. However, when a color filter is prepared using the photosensitive resin composition according to the present invention, when the color filter is irradiated with light from a light source, the color filter will spontaneously emit light, so more excellent luminescence can be achieved efficiency.

Furthermore, since it emits colored light, it has excellent color reproducibility (color reproducibility), and the light is emitted in all directions due to photoluminescence, so the viewing angle can also be improved.

The quantum dot particles according to the present invention are not particularly limited, as long as the quantum dot particles can emit light when excited by light. For example, quantum dots can be selected from the group consisting of II-VI semiconductor compounds, III-V semiconductor compounds, IV-VI semiconductor compounds, IV elements or compounds containing IV elements, and any combination of the above group, and these compounds can be used alone or in combination of two or more.

The above-mentioned II-VI group semiconductor compound may be a binary compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and a mixture thereof; selected from CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe and a ternary compound selected from the group consisting of CdZnSeS, CdZnSeTe , CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, Quaternary compounds of the group consisting of HgZnSeS, HgZnSeTe, HgZnSTe and mixtures thereof. The aforementioned III-V semiconductor compound may be a binary compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; A ternary compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, and mixtures thereof; and a ternary compound selected from the group consisting of GaAlNP, GaAlNAs, Quaternary compounds of the group consisting of GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof. The above-mentioned Group IV-VI semiconductor compounds may be binary compounds selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof; selected from SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS , a ternary compound selected from the group consisting of SnPbSe, SnPbTe, and mixtures thereof; and a quaternary compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof. The above-mentioned group IV elements or compounds containing group IV elements may be compounds of elements selected from the group consisting of Si, Ge, and mixtures thereof; and binary compounds selected from the group consisting of SiC, SiGe, and mixtures thereof.

Quantum dots can have a homogeneous single structure; a double structure such as a core-shell structure, a gradient structure and the like; or a mixture of one of the foregoing structure.

In a dual core-shell structure, each material constituting the core and the shell can be composed of the above-mentioned different types of semiconductor compounds, respectively. For example, the core may include at least one material selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but the present invention is not limited thereto. The shell may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but the present invention is not limited thereto.

A color photosensitive resin composition system used to prepare a typical color filter includes red, green and blue colorants to express colors. And, the photoluminescent quantum dot particles can be classified into red quantum dot particles, green quantum dot particles and blue quantum dot particles. The quantum dot particles according to the present invention can be red quantum dot particles, green quantum dot particles or blue quantum dot particles.

Quantum dot particles can be synthesized by wet chemical process, metal organic chemical vapor deposition process, or molecular beam epitaxy process.

Wet chemical processing is a method of adding a precursor material to an organic solvent to grow particles. When the grains grow, the organic solvent naturally coordinates to the surface of the quantum dot grains and acts as a dispersant, thereby controlling the growth of the grains. Thus, the growth of nanoparticles can be controlled by an easier and less expensive process than vapor deposition methods such as Metal Organic Chemical Vapor Deposition (MOCVD) or Molecular Beam Epitaxy (MBE).

The content of photoluminescent quantum dot particles is not particularly limited, for example, based on the weight of the total solid content of the photosensitive resin composition as 100% by weight, the content of photoluminescent quantum dot particles can be, for example, 3% to 80% by weight Percentage, or such as 5% to 70% weight percentage. If the content of photoluminescent quantum dot particles is less than 3% by weight, the luminous efficiency may be insufficient. If the content of the photoluminescent quantum dot particles exceeds 80% by weight, the content of other components may be relatively insufficient, making it difficult to form a pixel pattern.

Photopolymerizable compound (B)

The photopolymerizable compound contained in the photosensitive resin composition of the present invention is a compound that can be polymerized through the action of light and a photopolymerization initiator described below, which includes monofunctional monomers, difunctional monomers, other polyfunctional Functional monomers and their analogs.

Some specific examples of monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethyl 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, N-vinylpyrrolidone, and the like.

Some specific examples of difunctional monomers include 1,6-hexanediol di(meth)acrylate, ethyleneglycol di(meth)acrylate (meth)acrylate), neopentyl glycol di(meth)acrylate (neopentylglycol di(meth)acrylate), triethylene glycol di(meth)acrylate Triethyleneglycol di(meth)acrylate, bis(acryloyloxyethyl)ether of bisphenol A, 3-methylpentanediol di(meth)acrylate ( 3-methylpentandiol di(meth)acrylate) and its analogues.

Some specific examples of other polyfunctional monomers include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol Pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate ), dipentaerythritol pentaacrylate and succinic acid monoester (dipentaerythritol pentaacrylate succinic acid monoester) and the like.

Among the above-mentioned monomers, bifunctional monomers or polyfunctional monomers are preferably used.

Relative to 100% by weight of the total solid content of the photosensitive resin composition, the content of the photopolymerizable compound may range from 5% to 50% by weight, such as 7% to 45% by weight. If the content of the photopolymerizable compound is within the above-mentioned range, it is favorable for the intensity and smoothness of the pixel portion to become good.

Photopolymerization Initiator (C)

The photopolymerization initiator (C) contained in the photosensitive resin composition of the present invention is not particularly limited, and may be selected from In the group consisting of a triazine-based compound, an acetophenone-based compound, a biimidazole-based compound and an oxime compound At least one of these compounds. The photosensitive resin composition containing the above-mentioned photopolymerization initiator (C) has high sensitivity, and a pixel formed by using this composition has relatively good intensity and smoothness in the pixel part.

Furthermore, when the photopolymerization initiator (C) is used together with a photopolymerization initiation auxiliary agent (C-1), the photosensitive resin composition comprising the two becomes more sensitive Therefore, the productivity of the color filter formed using this composition is improved, so it is preferable.

For example, triazine compounds such as 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine (2,4-bis(trichloromethyl )-6-(4-methoxyphenyl)-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine Azine (2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5 -Triazine (2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-(4-methoxystyryl) -1,3,5-triazine (2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine), 2,4-bis(trichloromethyl)-6- [2-(5-methylfuran-2-yl)vinyl]-1,3,5-triazine(2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl) ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine (2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-[2 -(4-diethylamino-2-methylphenyl)vinyl]-1,3,5-triazine(2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2 -methylphenyl)ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1, 3,5-triazine (2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine) and its analogues.

For example, acetophenone compounds such as diethoxyacetophenone (diethoxyacetophenone), 2-hydroxy-2-methyl-1-phenylpropane-1-one (2-hydroxy-2-methyl-1 -phenylpropan-1-one), benzyldimethylketal, 2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one (2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one), 1-hydroxycyclohexylphenylketone (1-hydroxycyclohexylphenylketone), 2-methyl-1-(4 -Methylthiophenyl)-2-morpholinopropan-1-one (2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one), 2-benzyl-2-dimethyl Amino-1-(4-morpholinophenyl)butan-1-one (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one), 2-hydroxyl-2-methyl Base-1-[4-(1-methylvinyl)phenyl]propan-1-one (2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one) and oligomers of their analogues. Furthermore, a compound represented by Chemical Formula 3 may also be included.

Wherein, R ₁ to R ₄ are each independently hydrogen, halogen, a hydroxyl group, phenyl substituted or unsubstituted by C1~C12 alkyl, benzyl substituted or unsubstituted by C1~C12 alkyl A group, or a naphthyl group substituted or unsubstituted by a C1~C12 alkyl group.

Some specific examples of the compound represented by the above chemical formula 3 include 2-methyl-2-amino (4-morpholinophenyl) ethane-1-ketone (2-methyl-2-amino (4-morpholinophenyl) ethan-1-one), 2-ethyl-2-amino(4-morpholinophenyl)ethan-1-one (2-ethyl-2-amino(4-morpholinophenyl)ethan-1-one) , 2-propyl-2-amino (4-morpholinophenyl) ethane-1-one (2-propyl-2-amino (4-morpholinophenyl) ethan-1-one), 2-butyl- 2-amino (4-morpholinophenyl) ethane-1-one (2-butyl-2-amino (4-morpholinophenyl) ethan-1-one), 2-methyl-2-amino (4 -Morpholinophenyl)propan-1-one (2-methyl-2-amino(4-morpholinophenyl)propan-1-one), 2-methyl-2-amino(4-morpholinophenyl) Butan-1-one (2-methyl-2-amino(4-morpholinophenyl)butan-1-one), 2-ethyl-2- Amino (4-morpholinophenyl) propan-1-one (2-ethyl-2-amino(4-morpholinophenyl) propan-1-one), 2-ethyl-2-amino (4-morpholine Substituted phenyl) butan-1-one (2-ethyl-2-amino(4-morpholinophenyl) butan-1-one), 2-methyl-2-methylamino(4-morpholinophenyl) Propan-1-one (2-methyl-2-methylamino(4-morpholinophenyl)propan-1-one), 2-methyl-2-dimethylamino(4-morpholinophenyl)propan-1- Ketone (2-methyl-2-dimethylamino(4-morpholinophenyl) propan-1-one), 2-methyl-2-diethylamino (4-morpholinophenyl) propan-1-one (2- methyl-2-diethylamino (4-morpholinophenyl) propan-1-one) and its analogs.

For example, biimidazole-based compounds such as 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (2,2' -bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole), 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenyl Subimidazole (2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole), 2,2'-bis(2-chlorophenyl)-4,4', 5,5'-tetra(alkoxyphenyl)biimidazole (2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole), 2,2'- Bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole (2,2'-bis(2-chlorophenyl)-4,4',5, 5'-tetra(trialkoxyphenyl)biimidazole), an imidazole compound in which one of the phenyl groups at the 4,4',5,5' positions is replaced by a carboalkoxy group, and the like. Among them, 2,2'-bis(2-chloro Phenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenyl Biimidazole.

For example, the oxime compound is one of the compounds represented by the following chemical formula 4, chemical formula 5 or chemical formula 6, etc.

In addition, other photopolymerization initiators generally used in this art and the like may be further used without impairing the effect of the present invention. That Other photopolymerization initiators include, for example, a benzoin-based compound, a benzophenone-based compound, an anthracene-based compound, and a thioxanthone thioxanthone-based compounds, and analogues thereof; and these compounds may be used alone or in combination of two or more.

The above-mentioned benzoin compounds are, for example, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin benzoin isobutyl ether, and its analogues.

The above-mentioned benzophenone compounds are, for example, benzophenone (benzophenone), methyl o-benzoylbenzoate (methyl o-benzoylbenzoate), 4-phenylbenzophenone (4-phenylbenzophenone), 4-benzene Formyl-4'-methyldiphenyl sulfide (4-benzoyl- 4' -methyldiphenyl sulfide), 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone (3,3 ' ,4,4 ' -tetra(tert-butylperoxycarbonyl)benzophenone), 2,4,6-trimethylbenzophenone (2,4,6-trimethylbenzophenone), 4,4'-di( N,N'-dimethylamino)-benzophenone (4,4'-di(N,N'-dimethylamino)-benzophenone), and analogs thereof.

The above-mentioned thioxanthone-based compounds are, for example, 2-isopropylthioxantone (2-isopropylthioxantone), 2,4-diethylthioxantone (2,4-diethylthioxantone), 2,4 - Dichlorothioxanthone (2,4-dichlorothioxantone), 1-chloro-4-propoxythioxantone (1-chloro-4-propoxythioxantone), and the like.

The above-mentioned anthracene-based compounds are, for example, 9,10-dimethoxyanthracene (9,10-dimethoxyanthracene), 2-ethyl-9,10-dimethoxyanthracene (2-ethyl-9 ,10-dimethoxyanthracene), 9,10-diethoxyanthracene (9,10-diethoxyanthracene), 2-ethyl-9,10-diethoxyanthracene (2-ethyl-9,10-diethoxyanthracene) and other analog.

Other photopolymerization initiators mentioned above, such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide (2,4,6-trimethylbenzoyl diphenylphosphine oxide), 10-butyl-2-chloroacridine Ketone (10-butyl-2-chloroacridone), 2-ethylanthraquinone (2-ethylanthraquinone), 9,10-phenanthrenequinone (9,10-phenanthrenequinone), camphorquinone (camphorquinone), methyl phenylglyoxylate (methylphenylglyoxylate), titanocene compound, and the like.

Furthermore, in the present invention, when the photopolymerization initiation auxiliary agent (C-1) is used together with the photopolymerization initiator (C), it is preferable to use an amine compound selected from and at least one compound of the group consisting of a carboxylic acid compound.

Specific examples of the amine compound in the photopolymerization initiation auxiliary agent include, for example: an aliphatic amine compound, such as triethanolamine, methyldiethanolamine, and triisopropanolamine and their analogues; an aromatic amine compound (aromatic amine compound), such as 4-dimethylaminobenzoate (methyl 4-dimethylaminobenzoate), 4-dimethylaminobenzoate ethyl ester (ethyl 4- dimethylaminobenzoate), isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-benzoic acid Dimethylaminoethyl benzoate (2-dimethylaminoethyl benzoate), N,N-dimethylparatoluidine (N,N-dimethylparatoluidine), 4,4'-bis(dimethylamino)benzophenone (4 , 4' -bis(dimethylamino)benzophenone, commonly known as Michler's ketone), ( 4,4' -bis(diethylamino)benzophenone) and their analogs. As the amine compound, an aromatic amine compound is preferably used.

Specific examples of the above-mentioned carboxylic acid compounds include aromatic heteroacetic acids, such as phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, Acetic acid (ethylphenylthioacetic acid), methylethylphenylthioacetic acid (methylethylphenylthioacetic acid), dimethylphenylthioacetic acid (dimethylphenylthioacetic acid), methoxyphenylthioacetic acid (methoxyphenylthioacetic acid), dimethoxy Dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid (phenoxyacetic acid), naphthyl thioacetic acid (naphthylthioacetic acid), N-naphthylglycine, naphthoxy acetic acid, and the like.

Relative to the weight of the total solid content of the photosensitive resin composition as 100% by weight, the content of the photopolymerization initiator (C) may be in the range of 0.1% to 20% by weight, such as 1% to 10% by weight between. Relative to the weight of the total solid content of the photosensitive resin composition as 100% by weight, the content of the photopolymerization initiation auxiliary agent (C-1) may be in the range of 0.1% to 20% by weight, such as 1% to 10% by weight. % by weight.

If the content of the photopolymerization initiator (C) is within the above range, the intensity of the pixel part or the smoothness of the surface of the pixel part will be improved because the photosensitive resin composition is highly sensitive. Furthermore, if the content of the photopolymerization initiation auxiliary agent (C-1) is within the above range, the sensitivity efficiency of the photosensitive resin composition will be improved, and the productivity of the color filter formed using this composition will be improved. Improve even more.

Alkali-soluble resin (alkali-soluble resin) (D)

The alkali-soluble resin (D) can be polymerized from a carboxyl-containing ethylenically unsaturated monomer. The alkali-soluble resin is a component having solubility to an alkaline developer used in a developing process when forming a pattern.

The above-mentioned ethylenically unsaturated monomers having a carboxyl group are not particularly limited, and examples thereof include monocarboxylic acids, such as acrylic acid, methacrylic acid, crotonic acid and Analogs thereof; dicarboxylic acids such as fumaric acid (fumaric acid), mesaconic acid (mesaconic acid), itaconic acid (itaconic acid) and one of the aforementioned acid anhydrides; mono(meth)acrylic acid esters of polymers having a carboxyl group and a hydroxyl group at both ends, such as ω- Carboxypolycaprolactone mono(meth)acrylate (ω-carboxy polycaprolactone mono(meth)acrylate) and analogues thereof. Preferred are acrylic acid and methacrylic acid. These may be used alone, or in admixture of two or more.

The alkali-soluble resin according to the present invention may further include at least one other monomer copolymerizable with the aforementioned monomers to be polymerized. Examples thereof may include an aromatic vinyl compound such as styrene, vinyl toluene, methyl styrene, p-chlorostyrene, o-methyl styrene Oxystyrene (o-methoxystyrene), m-methoxystyrene (m-methoxystyrene), p-methoxystyrene (p-methoxystyrene), o-vinylbenzyl methyl ether (o-vinylbenzyl methyl ether), m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether , m-vinylbenzyl glycidyl ether (m-vinylbenzyl glycidyl ether), p-vinylbenzyl glycidyl ether (p-vinylbenzyl glycidyl ether) and their analogs; an N-substituted maleimide compound (N -substituted maleimide-based compound), such as N-cyclohexylmaleimide (N-cyclohexylmaleimide), N-benzylmaleimide (N-benzylmaleimide), N-phenylmaleimide (N -phenylmaleimide), N-o-hydroxyphenylmaleimide (No-hydroxyphenylmaleimide), N-m-hydroxyphenylmaleimide (Nm-hydroxyphenylmaleimide), N-p-hydroxyphenylmaleimide Imine (Np-hydroxyphenylmaleimide), N-o-methylphenylmaleimide (No-methylphenylmaleimide), N-m-methylphenylmaleimide (Nm-methylphenylmaleimide), N-p- Methylphenylmaleimide (Np-methylphenylmaleimide), N-o-methoxyphenylmaleimide (No-methoxyphenylmaleimide), N-m-methoxyphenylmaleimide ( Nm-methoxyphenylmaleimide), N-p-methoxyphenylmaleimide (Np-methoxyphenylmaleimide) and their analogues; one (meth) acrylate alkyl ester (alkyl (meth) acrylate), For example (meth) methyl acrylate (methyl (meth) acrylate), (meth) ethyl acrylate (ethyl (meth) acrylate), (meth) n-propyl (meth) acrylate (n-propyl (meth) acrylate), ( Meth) acrylate isopropyl (i-propyl (meth) acrylate), (meth) acrylate n-butyl (n-butyl (meth) acrylate), (meth) acrylate isobutyl (i-butyl (meth) acrylate), (sec-butyl(meth)acrylate), tert-butyl(meth)acrylate (t-butyl(meth)acrylate) and their analogs; a cycloaliphatic (meth)acrylate ) acrylate (alicyclic(meth)acrylate), such as (meth)cyclopentyl(meth)acrylate, (meth)cyclohexyl(meth)acrylate, 2-methylcyclohexyl (Meth)acrylate (2-methylcyclohexyl(meth)acrylate), tricyclo[5.2.1.0 ^2,6 ]dec-8-yl (meth)acrylate (tricyclo[5.2.1.0 ^2,6 ]decan-8 -yl (meth) acrylate), 2-dicyclopentyloxyethyl (meth) acrylate (2-dicyclopentanyloxyethyl (meth) acrylate), (meth) acrylate isobornyl (isobornyl (meth) acrylate) and Its analogues; aryl (meth)acrylate (aryl (meth)acrylate), such as phenyl (meth)acrylate (meth)acrylate, benzyl (meth)acrylate (meth)acrylate ) and their analogues; an unsaturated oxetane compound (unsaturated oxetane compound), such as 3-(methacryloyloxymethyl)oxetane (3-(methacryloyloxymethyl)oxetane), 3- (Methacryloxymethyl)-3-ethyloxetane (3-(methacryloyloxymethyl)-3-ethyloxetane), 3-(methacryloxymethyl)-2-trifluoromethane 3-(methacryloyloxymethyl)-2-trifluoromethyloxetane), 3-(methacryloxymethyl)-2-phenyloxetane (3-(metha cryloyloxymethyl)-2-phenyloxetane), 2-(methacryloxymethyl)oxetane (2-(methacryloyloxymethyl)oxetane), 2-(methacryloxymethyl)-4-tri Fluoromethyloxetane (2-(methacryloyloxymethyl)-4-trifluoromethyloxetane) and its analogues. These may be used alone, or in admixture of two or more.

As used herein, (meth)acrylate refers to an acrylate or a methacrylate.

The content of the alkali-soluble resin is not particularly limited, for example, relative to the weight of the total solid content of the photosensitive resin composition is 100% by weight, the content of the alkali-soluble resin can be in the range of 5% to 80% by weight, for example Between 10% and 70% by weight. If the content of the alkali-soluble resin is within the above-mentioned range, the solubility in an alkaline developing solution is sufficient, so it is easy to form a pattern, and The film reduction of the pixel portion exposed in development can be avoided, so that the solubility of the non-pixel portion can be improved.

Photostabilizer (E)

Light stabilizers include a hindered amine compound. The photosensitive resin composition of the present invention includes a hindered amine compound, which can inhibit photoluminescent quantum dot particles from being oxidized during a hard-bake process, thereby maintaining a high quantum efficiency without deteriorating photoluminescent properties (luminescent property), and can exhibit excellent photoluminescent properties.

In an embodiment of the present invention, the hindered amine compound may be a compound represented by the following chemical formula 1.

；以及 R"為C1-C10之烷基、C3-C12之環烷基或C6-C15芳基。 Wherein, R _a and R _b are each independently hydrogen or methyl; R _c and R _d are each independently hydrogen, C1-C4 alkyl (alkyl) or C6-C10 aryl (aryl); R _e is Hydrogen, C1-C18 alkyl, C1-C18 alkoxy, C2-C7 alkyl or C2-C7 alkoxy substituted by hydroxyl, C2-C18 alkenyl ), C2-C18 alkenyloxy (alkenyloxy), C3-C18 alkynyl (alkynyl), C3-C18 alkynyloxy (alkynyloxy), C3-C12 cycloalkyl (cycloalkyl), C3-C12 ring Alkoxy (cycloalkoxy), C6-C10 bicycloalkyl (bicycloalkyl), C6-C10 bicycloalkoxy (bicycloalkoxy), C3-C8 cycloalkenyl (cycloalkenyl), C3-C8 cycloalkenyloxy Cycloalkenyloxy, C6-C20 aryl substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen, substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen Substituted C6-C20 aryloxy (aryloxy); selected from -C(=O)-H, C1-C19 alkylcarbonyl (-C(=O)-C _1-19 alkyl), C2-C19 Alkenylcarbonyl (-C(=O)-C _2-19 alkenyl), C6-C10 aryl C2-C4 alkenylcarbonyl (-C(=O)-C _2-4 alkenyl-C6 _-10 aryl), C6-C10 aryl carbonyl (-C(=O)-C _6-10 aryl), C1-C6 alkyl ester group (-C(=O)-OC _1-6 alkyl), C6-C10 aromatic Ester group (-C(=O)-OC _6-10 aryl), C1-C6 alkylaminocarbonyl group (-C(=O)-NH-C _1-6 alkyl), C6-C10 aryl group Aminocarbonyl (-C(=O)-NH-C _6-10 aryl) and C1-C6 alkyl amido group (-C(=O)-N(C _1-6 alkyl) ₂ ) acyl group (acyl); or selected from C1-C19 alkyl acyloxy (-OC(=O)-C _1-19 alkyl), C2-C19 alkenyl acyloxy (-OC(=O)-C _2-19 alkenyl) and C6-C10 aryl acyloxy (-OC(=O)-C _6-10 aryl) acyloxy (acyloxy); Y is -OC(=O)-R'-C (=O)-O-; R' is C1-C10 alkyl, C3-C12 cycloalkyl, C6-C15 aryl or

and R "is C1-C10 alkyl, C3-C12 cycloalkyl or C6-C15 aryl.

In an embodiment of the present invention, the hindered amine compound may be a compound represented by the following chemical formula 2.

； R_a和R_b各自獨立地為氫或甲基；R_c和R_d各自獨立地為氫、C1-C4之烷基(alkyl)或C6-C10之芳基(aryl)；以及R_e為氫、C1-C18之烷基、C1-C18之烷氧基(alkoxy)、被羥基(hydroxy)取代的C2-C7之烷基或C2-C7之烷氧基、C2-C18之烯基(alkenyl)、C2-C18之烯氧基(alkenyloxy)、C3-C18之炔基(alkynyl)、C3-C18之炔氧基(alkynyloxy)、C3-C12之環烷基(cycloalkyl)、C3-C12之環烷氧基(cycloalkoxy)、C6-C10之二環烷基(bicycloalkyl)、C6-C10之二環烷氧基(bicycloalkoxy)、C3-C8之 環烯基(cycloalkenyl)、C3-C8之環烯氧基(cycloalkenyloxy)、被C1-C4烷基或C1-C4烷氧基或鹵素取代或未取代之C6-C20之芳基、被C1-C4烷基或C1-C4烷氧基或鹵素取代或未取代之C6-C20之芳氧基(aryloxy)；選自-C(=O)-H、C1-C19之烷基羰基(-C(=O)-C_1-19 alkyl)、C2-C19之烯基羰基(-C(=O)-C_2-19 alkenyl)、C6-C10之芳基C2-C4烯基羰基(-C(=O)-C_2-4 alkenyl-C_6-10 aryl)、C6-C10之芳基羰基(-C(=O)-C_6-10 aryl)、C1-C6之烷基酯基(-C(=O)-O-C_1-6 alkyl)、C6-C10之芳基酯基(-C(=O)-O-C_6-10 aryl)、C1-C6之烷基胺基羰基(-C(=O)-NH-C_1-6 alkyl)、C6-C10之芳基胺基羰基(-C(=O)-NH-C_6-10 aryl)和C1-C6之烷基醯胺基(-C(=O)-N(C_1-6 alkyl)₂)的醯基(acyl)；或是選自C1-C19之烷基醯氧基(-O-C(=O)-C_1-19 alkyl)、C2-C19之烯基醯氧基(-O-C(=O)-C_2-19 alkenyl)和C6-C10之芳基醯氧基(-O-C(=O)-C_6-10 aryl)的醯氧基(acyloxy)。 Among them, R is

R _a and R _b are each independently hydrogen or methyl; R _c and R _d are each independently hydrogen, C1-C4 alkyl (alkyl) or C6-C10 aryl (aryl); and R _e is Hydrogen, C1-C18 alkyl, C1-C18 alkoxy, C2-C7 alkyl or C2-C7 alkoxy substituted by hydroxyl, C2-C18 alkenyl ), C2-C18 alkenyloxy (alkenyloxy), C3-C18 alkynyl (alkynyl), C3-C18 alkynyloxy (alkynyloxy), C3-C12 cycloalkyl (cycloalkyl), C3-C12 ring Alkoxy (cycloalkoxy), C6-C10 bicycloalkyl (bicycloalkyl), C6-C10 bicycloalkoxy (bicycloalkoxy), C3-C8 cycloalkenyl (cycloalkenyl), C3-C8 cycloalkenyloxy Cycloalkenyloxy, C6-C20 aryl substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen, substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen Substituted C6-C20 aryloxy (aryloxy); selected from -C(=O)-H, C1-C19 alkylcarbonyl (-C(=O)-C _1-19 alkyl), C2-C19 Alkenylcarbonyl (-C(=O)-C _2-19 alkenyl), C6-C10 aryl C2-C4 alkenylcarbonyl (-C(=O)-C _2-4 alkenyl-C _6-10 aryl) , C6-C10 aryl carbonyl (-C(=O)-C _6-10 aryl), C1-C6 alkyl ester group (-C(=O)-OC _1-6 alkyl), C6-C10 Aryl ester group (-C(=O)-OC _6-10 aryl), C1-C6 alkylaminocarbonyl group (-C(=O)-NH-C _1-6 alkyl), C6-C10 aromatic Aminocarbonyl (-C(=O)-NH-C _6-10 aryl) and C1-C6 alkyl amido group (-C(=O)-N(C _1-6 alkyl) ₂ ) acyl (acyl); or selected from C1-C19 alkyl acyloxy (-OC(=O)-C _1-19 alkyl), C2-C19 alkenyl acyloxy (-OC(=O)- C _2-19 alkenyl) and C6-C10 aryl acyloxy (-OC(=O)-C _6-10 aryl) acyloxy (acyloxy).

The alkyl group referred to in the present invention includes a straight chain or a branched chain, and includes methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, n-octyl, n-decyl and their analogs.

Furthermore, alkenyl is an alkyl group having at least one carbon-carbon double bond, and alkynyl is an alkyl group having at least one carbon-carbon triple bond.

Aryl (aryl) referred to in the present invention includes phenyl (phenyl), biphenyl (biphenyl), terphenyl (terphenyl), stilbene (stilbene), naphthyl (naphthyl), anthracenyl (anthracenyl), phenanthrene phenanthryl, pyrenyl and their analogs.

The cycloalkyl (cycloalkyl) referred to in the present invention includes cyclopropyl (cyclopropyl), cyclopropylmethyl (cyclopropylmethyl), cyclopentyl (cyclopentyl), cyclohexyl (cyclohexyl), adamantyl (damantyl), and substituted And unsubstituted bornyl (substituted and unsubstituted bornyl), norbornyl (norbornyl) and norbornenyl (norbornenyl), etc.

The alkoxy group (alkoxy) referred to in the present invention includes methoxy (methoxy), ethoxy (ethoxy), n-propoxy (n-propoxy), isopropoxy (i-propoxy), tert-butoxy (t-butoxy), n-butoxy, pentoxy and the like.

The acyl group referred to in the present invention can be, for example, formyl (formyl), acetyl (acetyl), trifluoroacetyl (trifluoroacetyl), pivaloyl (pivaloyl), acryl (acryloyl) , methacryloyl (methacryloyl), oleoyl (oleoyl), cinnamoyl (cinnamoyl), benzoyl (benzoyl), 2,6-xylyl (2,6-xyloyl), tert-butyl Oxycarbonyl (tert-butoxycarbonyl), ethylcarbamoyl (ethylcarbamoyl), phenylcarbamoyl (phenylcarbamoyl) and the like.

Acyloxy can be acetoxy, trifluoroacetoxy, pivaloyloxy, acryloyloxy, methacryloxy ( methacryloyloxy), benzoyloxy (benzoyloxy) and their analogs.

In Chemical Formula 1, R _a , R _b , R _c and R _d can be hydrogen, R _e can be hydrogen or C1-C18 alkoxy, Y can be -OC(=O)-R'-C(=O )-O-, and R' can be C1-C10 alkyl.

In Chemical Formula 2, R _a , R _b , R _c and R _d may be hydrogen, and R _e may be hydrogen or a C1-C18 alkyl group.

Commercially available products of the compound represented by Chemical Formula 1 include, for example, TINUVIN 123, TINUVIN 770DF, TINUVIN 292 (manufactured by BASF, trade name), and the like.

Commercially available products of the compound represented by Chemical Formula 2 include, for example, LA-52, LA-57 (manufactured by Adeka Corporation, trade name) and the like.

Furthermore, in addition to the hindered amine compound, the light stabilizer further includes at least one known light stabilizer. For example, the photostabilizer may further include a photostabilizer selected from a benzotriazole-based photostabilizer, a triazine-based photostabilizer and a benzophenone photostabilizer. -based photostabilizer) at least one photostabilizer of the group consisting of.

As for the benzotriazole light stabilizer, a known benzotriazole derivative can be used and can be obtained from a commercial product. Specific examples include 2-(2'-hydroxy-5'-methylphenyl)benzotriazole (2-(2'-hydroxy-5'-methylphenyl)benzotriazole), 2-(2'-hydroxy-5' -tert-butylphenyl)benzotriazole (2-(2'-hydroxy-5'-tert-butylphenyl)benzotriazole), 2-(2'-hydroxy-3',5- Di-tert-butylphenyl)benzotriazole (2-(2'-hydroxy-3',5-di-tert-butylphenyl)benzotriazole), 2-(2'-hydroxy-5'-tert-octylphenyl ) benzotriazole (2-(2'-hydroxy-5'-tert-octylphenyl)benzotriazole) or 2-(2'-hydroxy-3', 5'-di-tert-octylphenyl)benzotriazole ( 2-(2'-hydroxy-3',5'-di-tert-octylphenyl)benzotriazole); commercially available products include TINUVIN PS, TINUVIN 99-2, TINUVIN 109, TINUVIN 384-2, TINUBIN 571, TINUVIN 900, TINUVIN 928 or TINUVIN 1130 (manufactured by BASF Corporation, trade name).

As the triazine-based light stabilizer, a hydroxyphenyl triazine-based ultraviolet absorber (a hydroxyphenyl triazine-based ultraviolet absorber) can be preferably used. And it can be obtained from a commercially available commodity. Examples include TINUVIN 400, TINUVIN 405, TINUVIN 460, TINUVIN 479 or TINUVIN 1577 (manufactured by BASF AG, trade name) and the like.

As for the benzophenone-based light stabilizer, a known benzophenone-based derivative can be used, and can be obtained from a commercial product. Specific examples include 2,4-dihydroxybenzophenone (2,4-dihydroxybenzophenone), 2-hydroxy-4-methoxybenzophenone (2-hydroxy-4-methoxybenzophenone), 2-hydroxy-4- Methoxybenzophenone-5-sulfonic acid (2-hydroxy-4-methoxybenzophenone-5-sulfonic acid), 2-hydroxy-4-n-octyloxybenzophenone (2-hydroxy-4-n- octyloxybenzophenone), 2-hydroxy-4-n-dodecyloxybenzophenone (2-hydroxy-4-n-dodecyloxybenzophenone), 2-hydroxy-4-benzyloxybenzophenone (2-hydroxy-4 -benzoyloxybenzophenone), 5,5'-methylene bis(2-hydroxy-4-methoxybenzophenone) (bis(5-benzoyl-4-hydroxy-2-methoxyphenyl)methane), 2,2'- Dihydroxy-4-methoxybenzophenone (2,2'-dihydroxy-4-methoxybenzophenone) or 2,2'-dihydroxy-4,4'-dimethoxybenzophenone (2,2 ' -dihydroxy- 4,4' -dimethoxybenzophenone), and commercially available items include, for example, CHIMASSORB81 (manufactured by BASF Corporation, trade name) and the like.

The content of the additional light stabilizer may be 0.2 to 2 parts by weight of the additional light stabilizer per 1 part by weight of the hindered amine compound.

Relative to the weight of the total solid content of the photosensitive resin composition as 100% by weight, the content of the light stabilizer can be, for example, in the range of 0.025% to 10% by weight, for example, in the range of 0.01% to 7% by weight between. If the content of the light stabilizer is within the above range, the degradation of the luminous efficiency of the photosensitive resin composition can be avoided, and a pattern can be properly formed without interfering with the action of the photopolymerization initiator.

Solvent (F)

The solvent of the present invention is not particularly limited, and may be a conventionally used organic solvent.

Specific examples of the solvent may include ethylene glycol monoalkyl ethers (ethyleneglycolmonoalkylether), such as ethylene glycol monomethyl ether (ethyleneglycolmonomethylether), ethylene glycol monoethyl ether (ethyleneglycolmonoethylenether), ethyleneglycolmonopropylether, ethyleneglycolmonobutylether, and their analogs; diethyleneglycol dialkylethers, such as diethylene glycol dimethyl Diethylene glycol diethylether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether and their analogues; glycol alkanes Ethyl ether acetates, such as methylcellosolve acetate, ethylcellosolve acetate, and the like; propylene glycol monoalkyl ethers, such as propylene glycol monomethyl Ether (propylene glycol monomethylether) and its analogues; alkylene glycol alkyl ether acetate alcohol (alkyleneglycolalkyletheracetate), such as propylene glycol monomethyl ether acetate (propylene glycol monomethyl ether acetate), propylene glycol monoethyl ether acetate (propylene glycol monoethyl ether acetate), propylene glycol monopropyl ether acetate ( propyleneglycolmonopropyletheracetate), methoxybutylacetate, methoxypentylacetate and their analogs; aromatic hydrocarbons such as benzene, toluene, xylene, mesitylene and Analogues; ketones such as methylethylketone, acetone, methylamylketone, methylisobutylketone, cyclohexylketone Ketones (cyclohexanone) and their analogs; Alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethyleneglycol and glycerin and their analogs; Esters, Examples are 3-ethoxypropionic acid ethyl, 3-methoxypropionic acid methyl and their analogs; cyclic esters such as γ-butyrol Esters (γ-butyrolactone) and their analogs. These solvents may be used alone or in combination of two or more.

The content of the solvent is not particularly limited, and can be, for example, relative to the weight of the total solid content of the photosensitive resin composition. The solvent content can be in the range of 60% to 90% by weight, such as 70% to 85% by weight. between ranges. If the content of the solvent is within the above range, better coating properties will be obtained.

The photosensitive resin composition of the present invention may further include an additive (G) as required. For example, fillers, other polymer compounds, adhesion promoters, anti-agglomeration agents, and the like can be used as additives.

Fillers include, for example, glass, silica, alumina, and the like.

Other polymer compounds, specifically, can include a thermosetting resin, such as epoxy resin, maleimide resin and the like; a thermoplastic resin, such as polyvinyl alcohol (polyvinyl alcohol), polyacrylic acid (polyacrylic acid) acid), polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, polyurethane and the like.

As for the adhesion promoter, for example, it can be vinyltrimethoxysilane (vinyltrimethoxysilane), vinyltriethoxysilane (vinyltriethoxysilane), vinyltris (2-methoxyethoxy) silane (vinyltris (2-methoxyethoxy) silane), N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane (N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane), N-(2-aminoethyl )-3-aminopropyltrimethoxysilane (N-(2-aminoethyl)-3-aminopropyltrimethoxysilane), 3-aminopropyltriethoxysilane (3-aminopropyltriethoxysilane), 3-glycidyloxypropyl 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane), 3-chloropropylmethyldimethoxysilane (3-chloropropylmethyldimethoxysilane), 3-chloropropyltrimethoxysilane (3-chloropropyltrimethoxysilane), 3-methyl 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and their analogs.

As for the anticoagulant, specific examples include sodium polyacrylate and the like.

One embodiment of the present invention relates to a color filter manufactured using the photosensitive resin composition of the present invention.

When the color filter of the present invention is applied to an image display device, it is excited by the light emitted by a light source of the display device to emit light, thereby achieving more excellent luminous efficiency. Furthermore, due to the emission of colored light, the color reproducibility is very good, and the light is emitted in all directions due to photoluminescence, so the viewing angle can also be improved.

The color filter may include a substrate and a pattern layer formed on the substrate.

The substrate may be a substrate of the color filter itself, or may be a part for disposing the color filter on a display device, or the like; therefore, it is not particularly limited. The substrate may include, for example, glass, silicon (Si), silicon oxide (SiO _x ), or a polymer substrate. The polymeric substrate may comprise, for example, polyethersulfone (PES) or polycarbonate (PC).

The pattern layer is a film layer including the photosensitive resin composition of the present invention, and may be a film layer formed by exposing, developing and curing the photosensitive resin in a predetermined pattern.

In one embodiment of the present invention, the patterned layer formed by the photosensitive resin composition can provide a red patterned layer comprising red quantum dot particles (red quantum dot particles), a pattern layer comprising green quantum dot particles (green quantum dot particles) A green pattern layer or a blue pattern layer including blue quantum dot particles. When irradiated with light, the red patterned layer can emit red light, the green patterned layer can emit green light, and the blue patterned layer can emit blue light. In this example, when the pattern layer is applied to an image display device, the light emitted from the light source There is no particular limitation, but more excellent color reproducibility can be achieved by using a light source that emits blue light.

In an embodiment of the present invention, the pattern layer may be a pattern layer including only two light colors among the red pattern layer, the green pattern layer and the blue pattern layer. In this example, the pattern layer may further include a transparent pattern layer not containing quantum dot particles. In the case of providing only two color pattern layers, a light source may be used which emits light at a wavelength representing the remaining colors not included. For example, when a red pattern layer and a green pattern layer are included, a light source that emits blue light can be used; and in this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the blue light passes through the transparent The pattern layer appears blue.

As mentioned above, in addition to the substrate and the pattern layer, the color filter may further include a blocking layer formed between related patterns, and may also include a black matrix. Moreover, the color filter may further include a protective film formed on the pattern layers.

An embodiment of the present invention relates to an image display device including the aforementioned color filter.

The color filter of the present invention can be applied not only to general liquid crystal display devices, but also to various image display devices, such as electroluminescence display devices (electroluminescence display devices), plasma display devices (plasma display devices), field Field emission display device and the like.

Hereinafter, more details related to the present invention will be described through the following examples, comparative examples and experimental examples. However, these Examples, Comparative Examples, and Experimental Examples are illustrative only. It is for the purpose of clarity, and it is obvious to those skilled in the art that it is not intended to limit the scope of the present invention.

Preparation Example 1: Synthesis of photoluminescent green quantum dot particles with CdSe (core)/ZnS (shell) structure

0.4mmol of CdO, 4mmol of zinc acetate, and 5.5mL of oleic acid were placed in a reactor together with 20mL of 1-octadecene, then heated to 150°C and allowed to react. Then, the above reaction mixture was allowed to stand in a vacuum of 100 mTorr for 20 minutes to remove acetic acid generated after zinc was replaced by oleic acid. Thereafter, the reaction mixture was heated to 310°C to obtain a transparent mixture, and then the transparent mixture was kept at 310°C for 20 minutes. Then, a solution of Se and S, including 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine, and quickly injected into the solution containing Cd(OA) ₂ and Zn(OA) ₂ solution in a reactor. The resulting mixture was grown at 310° C. for 5 minutes and then stopped using an ice bath. Next, precipitation was carried out in ethanol, and then the quantum dots were separated using a centrifuge, and additional impurities were washed away with chloroform and ethanol, thus obtaining quantum dots with a CdSe (core)/ZnS (shell) structure and stabilized with oleic acid , wherein the quantum dot particles have a sum of core particle diameter and shell thickness of 3 to 5 nm.

Preparation Example 2: Synthesis of Alkali-Soluble Resin

Prepare a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen inlet tube. Separately, add 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate (tricyclodecyl methacrylate), 4 parts by weight of Oxidized tert-butyl-2-ethylhexanoate (t-butylperoxy-2-ethylhexanoate), 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) were mixed in a flask and stirred to prepare a monomer Drops. 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added and then stirred and mixed to prepare a chain transfer agent drop. Thereafter, 395 parts by weight of PGMEA were introduced into the flask, and after replacing the air in the flask with nitrogen, the temperature of the flask was raised to 90° C. while stirring. Then, the monomer drop and the chain transfer agent drop are added drop by drop through the dropping funnel. The steps of dropping drop by drop were respectively performed for 2 hours under the condition of maintaining 90°C. After 1 hour, the temperature was raised to 110°C and maintained for 3 hours, then the gas inlet tube was introduced, and the blowing of oxygen/nitrogen = 5/95 (v/v) mixed gas was started. Next, 10 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol) (2,2'- Methylenebis (4-methyl-6-t-butylphenol)) and 0.8 parts by weight of triethylamine (triethylamine) were added into the flask, and the reaction was continued at 110° C. for 8 hours. Thereafter, the reaction was cooled to room temperature, and an alkali-soluble resin having a solid content of 29.1% by weight, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH/g was obtained.

Examples 1-7 and Comparative Examples 1-2: Preparation of photosensitive resin composition

The mixed components (units) are shown in Table 1, then diluted with propylene glycol monomethyl ether acetate to make the total solids content 20% by weight, and fully stirred to obtain the photosensitive resin composition .

【Table 1】

A-1: Quantum dots with CdSe (core)/ZnS (shell) structure in Preparation Example 1

B-1: Dipentaerythritol pentaacrylate succinic acid monoester (pentafunctional photopolymerizable compound containing carboxylic acid) (trade name TO-1382, manufactured by Dong-A)

B-2: Dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by NIPPON KAYAKU Co., Ltd.)

C-1: Irgaqure-907 (manufactured by BASF)

D-1: the alkali-soluble resin of preparation example 2

E-1: TINUVIN 123 (manufactured by BASF) - hindered amine compound (the compound of chemical formula 1, wherein R _a , R _b , R _c and R _d are hydrogen, R _e is octyloxy, Y is -OC (=O) -R'-C(=O)-O-, and R' is octane)

E-2: TINUVIN 770DF (manufactured by BASF) - hindered amine compound (compound of chemical formula 1, wherein R _a , R _b , R _c and R _d are hydrogen, R _e is hydrogen, Y is -OC(=O)-R '-C(=O)-O-, and R' is octane)

E-3: LA-52 (manufactured by ADEKA)-hindered amine compound (compound of chemical formula 2, wherein R _a , R _b , R _c and R _d are hydrogen, R _e is methyl)

E-4: LA-57 (manufactured by ADEKA)-hindered amine compound (compound of chemical formula 2, wherein Ra, _Rb , _Rc and _Rd are hydrogen, R _e is hydrogen ₎

E-5: TINUVIN 109 (manufactured by BASF) - benzotriazole compound

E-6: DABCO (1,4-diazabicyclo[2.2.2]octane (1,4-diazabicyclo[2,2,2]octane))

Experimental example 1

By using the photosensitive resin compositions prepared in Examples and Comparative Examples, a color filter was prepared as described below. Here, the development speed, sensitivity and adhesion were measured by the following methods, and the measurement results are listed in Table 2 as follows.

<Preparation of color filter>

Each of the above photosensitive resin compositions was coated on a glass substrate by a spin coating method, and then placed on a heating plate and maintained at a temperature of 100° C. for 3 minutes to form a thin film. Next, place a square light-transmitting pattern with a length and width of 20mm x 20mm and a pattern with 1 One of the line/space patterns from μm to 100μm is used to test the mask, and the film is set at a distance of 100μm from the test mask, and then irradiated with ultraviolet rays.

Among them, an ultra-high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki was used as the ultraviolet light source, and light irradiation was performed at an exposure amount (365 nm) of 200 mJ/cm ² , and no special optical filter was used. The film irradiated with ultraviolet rays was immersed in an aqueous KOH solution having a pH of 10.5 for 80 seconds, and then developed. The glass plate coated with the film was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150° C. for 10 minutes to prepare a color filter. The film thickness of the color filter manufactured above was 3.0 µm.

(1) Pattern accuracy

Regarding the color filter made of photosensitive resin composition, the pattern size obtained through the mask with 100 μm line/space pattern is measured by OM instrument (model ECLIPSE LV100POL, Nikon). Pattern error can be calculated by comparing the width of the light transmission pattern with the measured width of the color filter (measured pattern width). That is, the pattern error can be obtained by Equation 1 below.

[Equation 1] Pattern Error (△) = (Width of Light Penetrating Pattern) - (Width of Measuring Pattern)

If the value of the pattern error is greater than 20 μm, it is difficult to form a fine pattern, which also makes it difficult to form a fine pixel. And if the value of the pattern error is a negative value, a process defect may occur.

(2) Luminescence intensity (Luminescence intensity) and luminescence intensity retention (heat resistance)

A 365 nm tube type 4W UV lamp (model: VL-4LC, manufactured by VILBER LOURMAT) was used to irradiate the pattern portion of the color filter having a square pattern of 20 mm x 20 mm. And the light intensity in the wavelength (550 nm) region emitted by photoluminescence was measured using a spectrometer (manufactured by OCEAN OPTICS Co.).

In addition, a hard bake step was performed at 230° C. for 60 minutes, and the luminous intensity was measured before and after the hard bake, and the luminous intensity retention rate was compared with Comparative Example 1. The results are listed in Table 2 below.

As shown in Table 2, the results confirm that, compared with the photosensitive resin compositions of Comparative Examples 1 and 2 that do not include a light stabilizer, the photosensitive resin compositions that include hindered amine compounds according to Examples 1-7 of the present invention, Among them, the hindered amine compound is used as a light stabilizer, which can indeed realize the production of a fine pattern; and the present invention can inhibit the quantum dot particles from being oxidized, even after the hard baking process, so that the luminous intensity can be maintained at a higher level.

Although some specific parts of the present invention are described in detail above, those in the technical field will obviously understand that these specific technologies are only a preferred embodiment, and the protection scope of the present invention is not limited to these contents. Furthermore, as understood by those skilled in the art, various applications and modifications are possible without departing from the spirit and scope of the present invention based on the above.

Therefore, the scope of protection of the present invention should be defined by the appended patent claims and their equivalents.

Claims (6)

A photosensitive resin composition, comprising a photoluminescence quantum dot particle, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin resin), a photostabilizer (photostabilizer) and a solvent, wherein the photostabilizer includes a hindered amine compound (hindered amine compound), and the photopolymerization initiator includes a triazine-based compound (triazine-based compound), At least one compound in the group consisting of acetophenone-based compound, biimidazole-based compound and oxime compound, wherein the hindered amine The compound is represented by the following chemical formula 2:

Among them, R is

R _a and R _b are each independently hydrogen or methyl; R _c and R _d are each independently hydrogen, C1-C4 alkyl (alkyl) or C6-C10 aryl (aryl); and R _e is Hydrogen, C1-C18 alkyl, C1-C18 alkoxy, C2-C7 alkyl or C2-C7 alkoxy substituted by hydroxyl, C2-C18 alkenyl ), C2-C18 alkenyloxy (alkenyloxy), C3-C18 alkynyl (alkynyl), C3-C18 alkynyloxy (alkynyloxy), C3-C12 cycloalkyl (cycloalkyl), C3-C12 ring Alkoxy (cycloalkoxy), C6-C10 bicycloalkyl (bicycloalkyl), C6-C10 bicycloalkoxy (bicycloalkoxy), C3-C8 cycloalkenyl (cycloalkenyl), C3-C8 cycloalkenyloxy Cycloalkenyloxy, C6-C20 aryl substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen, substituted or unsubstituted by C1-C4 alkyl or C1-C4 alkoxy or halogen Substituted C6-C20 aryloxy (aryloxy); selected from -C(=O)-H, C1-C19 alkylcarbonyl (-C(=O)-C _1-19 alkyl), C2-C19 Alkenylcarbonyl (-C(=O)-C _2-19 alkenyl), C6-C10 aryl C2-C4 alkenylcarbonyl (-C(=O)-C _2-4 alkenyl-C _6-10 aryl) , C6-C10 aryl carbonyl (-C(=O)-C _6-10 aryl), C1-C6 alkyl ester group (-C(=O)-OC _1-6 alkyl), C6-C10 Aryl ester group (-C(=O)-OC _6-10 aryl), C1-C6 alkylaminocarbonyl group (-C(=O)-NH-C _1-6 alkyl), C6-C10 aromatic Aminocarbonyl (-C(=O)-NH-C _6-10 aryl) and C1-C6 alkyl amido group (-C(=O)-N(C _1-6 alkyl) ₂ ) acyl (acyl); or selected from C1-C19 alkyl acyloxy (-OC(=O)-C _1-19 alkyl), C2-C19 alkenyl acyloxy (-OC(=O)- C _2-19 alkenyl) and C6-C10 aryl acyloxy (-OC(=O)-C _6-10 aryl) acyloxy (acyloxy). The photosensitive resin composition described in claim 1 of the patent application, wherein R _a , R _b , R _c and R _d are hydrogen, and R _e is hydrogen or a C1-C18 alkyl group. The photosensitive resin composition as described in Item 1 of the scope of the patent application, wherein the light stabilizer further includes at least one light stabilizer selected from a benzotriazole-based photostabilizer (benzotriazole-based photostabilizer), a triazine A group consisting of a triazine-based photostabilizer and a benzophenone-based photostabilizer. The photosensitive resin composition as described in item 1 of the scope of the patent application, wherein based on the weight of the total solid content of the photosensitive resin composition is 100% by weight, the photostabilizer is contained in an amount of 0.025% to 10% by weight. A color filter formed using the photosensitive resin composition described in any one of the first to fourth items of the patent application. An image display device, including the color filter described in item 5 of the patent application.