TW201630980A - Polyimide precursor composition and method for producing insulating coating layer using same - Google Patents

Polyimide precursor composition and method for producing insulating coating layer using same Download PDF

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TW201630980A
TW201630980A TW105102766A TW105102766A TW201630980A TW 201630980 A TW201630980 A TW 201630980A TW 105102766 A TW105102766 A TW 105102766A TW 105102766 A TW105102766 A TW 105102766A TW 201630980 A TW201630980 A TW 201630980A
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polyimide
coating layer
precursor composition
insulating coating
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TWI699387B (en
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寺田武史
中山剛成
長尾圭吾
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宇部興產股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B17/00Insulators or insulating bodies characterised by their form
    • H01B17/56Insulating bodies
    • H01B17/60Composite insulating bodies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes

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  • Organic Insulating Materials (AREA)
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Abstract

The present invention relates to a polyimide precursor composition for forming a polyimide insulating coating layer, the polyimide precursor composition comprising a specific polyamic acid and a specific phosphorus compound, wherein by performing a heat treatment under conditions where the maximum heating temperature is within a range from 300 to 500 DEG C, the polyamic acid can produce a polyimide film having a water vapor permeability coefficient that is greater than 1.0 g.mm/(m2*24h).

Description

聚醯亞胺前驅體組成物及利用此組成物之絕緣被覆層之製造方法Polyimine precursor composition and method for producing insulating coating using the same

本發明關於能夠有效率地製造具優異之耐熱性的聚醯亞胺絕緣被覆層的聚醯亞胺前驅體組成物、及利用此組成物之絕緣被覆層之製造方法。The present invention relates to a polyimide composition precursor composition capable of efficiently producing a polyimide ink insulating coating layer having excellent heat resistance, and a method for producing an insulating coating layer using the composition.

已知聚醯亞胺樹脂為耐熱性非常優異之樹脂,已廣泛利用在各種領域。例如,耐熱性高,此外,低介電率、機械特性亦優異,所以可作為要求特性高的電線之絕緣層使用。專利文獻1記載一種絕緣被覆電線,其特徵為於芯線上設置有將由聯苯四羧酸二酐與4,4’-二胺基二苯醚之反應而得之聚醯胺酸予以醯亞胺化而成之絕緣層,並記載該聚醯亞胺絕緣被覆電線具有對熱劣化的優異之抵抗性。Polyimine resins are known as resins which are excellent in heat resistance and have been widely used in various fields. For example, since it has high heat resistance and is excellent in low dielectric constant and mechanical properties, it can be used as an insulating layer of a wire having high characteristics. Patent Document 1 describes an insulated coated electric wire characterized in that a polyamine acid obtained by reacting biphenyltetracarboxylic dianhydride with 4,4'-diaminodiphenyl ether is provided on a core wire. The insulating layer is formed, and it is described that the polyimide-coated insulated electric wire has excellent resistance to thermal deterioration.

聚醯亞胺,視四羧酸成分與二胺成分之組合有時會具有結晶性,其結果,有時會限制將為聚醯亞胺前驅體的聚醯胺酸進行醯亞胺化時之條件。例如,若使用3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分,容易獲得結晶性之聚醯亞胺樹脂,視醯亞胺化之條件,尤其欲以急速升溫之短時間熱處理進行醯亞胺化時,容易引起局部的結晶化。因此,將使用3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分而得之聚醯胺酸予以醯亞胺化而形成聚醯亞胺層時,有無法提高升溫速度並提高生產性之情形。Polyimine may have crystallinity depending on the combination of the tetracarboxylic acid component and the diamine component, and as a result, it may limit the imidization of the polyamic acid which is a polyimide precursor. condition. For example, when 3,3',4,4'-biphenyltetracarboxylic dianhydride is used as the tetracarboxylic acid component, a crystalline polyimine resin is easily obtained, and the conditions of the imidization are particularly desirable. When the heat treatment is performed for a short time, the crystallization of the oxime is likely to cause local crystallization. Therefore, when the polyglycine which is obtained by using 3,3',4,4'-biphenyltetracarboxylic dianhydride as a tetracarboxylic acid component is imidized to form a polyimine layer, it cannot be improved. Speed up and increase productivity.

專利文獻2記載一種聚醯亞胺絕緣被覆層之製造方法,係將上述使用3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分而得之聚醯胺酸予以醯亞胺化而形成聚醯亞胺絕緣被覆層的方法,該方法即使實施急速升溫,仍可不引起結晶化而形成聚醯亞胺絕緣被覆層。具體而言,專利文獻2記載一種絕緣被覆層之製造方法,係具有於基材塗佈聚醯亞胺前驅體組成物並進行烘烤之步驟的聚醯亞胺絕緣被覆層之製造方法,其特徵為:聚醯亞胺前驅體組成物含有使用3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分而得之聚醯胺酸、及選自於由咪唑類及胺化合物構成之群組中之鹼性化合物,且在烘烤步驟中,加熱聚醯亞胺前驅體組成物的時間為10~180秒,100℃至280℃之平均升溫速度為5℃/s以上,最高加熱溫度為300~500℃。 [先前技術文獻]  [專利文獻]Patent Document 2 describes a method for producing a polyimide coating layer, wherein the polyglycine obtained by using the 3,3',4,4'-biphenyltetracarboxylic dianhydride as a tetracarboxylic acid component is used. A method in which a ruthenium is imidized to form a polyimide-based insulating coating layer, and this method can form a polyimide-based insulating coating layer without causing crystallization even if a rapid temperature rise is performed. Specifically, Patent Document 2 describes a method for producing an insulating coating layer, which is a method for producing a polyimide coating layer having a step of coating a substrate with a polyimide composition precursor and baking the substrate. The polyiminoimine precursor composition contains a polyglycine which is obtained by using 3,3',4,4'-biphenyltetracarboxylic dianhydride as a tetracarboxylic acid component, and is selected from the group consisting of imidazoles. And a basic compound in the group consisting of amine compounds, and in the baking step, heating the polyimide precursor composition for 10 to 180 seconds, and the average temperature rising rate from 100 ° C to 280 ° C is 5 ° C / Above s, the maximum heating temperature is 300~500 °C. [Prior Technical Literature] [Patent Literature]

[專利文獻1] 日本特開昭61-273806號公報 [專利文獻2] 國際公開第2014/142173號小冊[Patent Document 1] JP-A-61-273806 [Patent Document 2] International Publication No. 2014/142173

[發明所欲解決之課題] 本發明之目的為:提供一種聚醯亞胺絕緣被覆層之製造方法,係將作為容易提供結晶性之聚醯亞胺的四羧酸成分與二胺成分之組合的聚醯胺酸,尤其,使用了3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分而得之聚醯胺酸予以醯亞胺化而形成聚醯亞胺絕緣被覆層,該方法即使實施急速升溫仍可無缺陷地形成聚醯亞胺絕緣被覆層。亦即,本發明之目的為:提供能於短時間、不引起結晶化而形成耐熱性、機械特性優異之聚醯亞胺樹脂之絕緣被覆層的聚醯亞胺前驅體組成物(聚醯胺酸組成物),並提供使用該組成物之工業上有利的絕緣被覆層之製造方法。 [解決課題之手段][Problem to be Solved by the Invention] An object of the present invention is to provide a method for producing a polyimide-based insulating coating layer which is a combination of a tetracarboxylic acid component and a diamine component which is a polyimine which is easy to provide crystallinity. Polylysine, in particular, polyglycine, which is obtained by using 3,3',4,4'-biphenyltetracarboxylic dianhydride as a tetracarboxylic acid component, is imidized to form a polyimine. The insulating coating layer forms a polyimide-based insulating coating layer without defects even if a rapid temperature rise is performed. In other words, the object of the present invention is to provide a polyimide composition precursor (polyamide) capable of forming an insulating coating layer of a polyimide resin having excellent heat resistance and mechanical properties in a short period of time without causing crystallization. An acid composition) and a method of producing an industrially advantageous insulating coating layer using the composition. [Means for solving the problem]

1.一種聚醯亞胺絕緣被覆層形成用之聚醯亞胺前驅體組成物,包含聚醯胺酸、溶劑、與磷化合物,其特徵為: 該聚醯胺酸為由含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐且該等之合計含量為50~100莫耳%的四羧酸成分、與含有4,4’-二胺基二苯醚50~100莫耳%的二胺成分獲得之聚醯胺酸; 該磷化合物為選自於由磷酸酯及下列通式(1)表示之磷化合物構成之群組中之至少1種類; 該聚醯胺酸為能藉由在設定最高加熱溫度為300~500℃之條件下進行加熱處理以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜者;A polyimine precursor composition for forming a polyimide coating comprising a polyaminic acid, a solvent, and a phosphorus compound, characterized in that the polyamine contains 3,3'4,4'-biphenyltetracarboxylic dianhydride and 2,3,3',4'-biphenyltetracarboxylic dianhydride, and the total content of the tetracarboxylic acid component is 50 to 100 mol%, a polyamic acid obtained from a diamine component containing 50 to 100 mol% of 4,4'-diaminodiphenyl ether; the phosphorus compound is selected from the group consisting of phosphates and phosphorus represented by the following formula (1) At least one of the group consisting of compounds; the polyglycolic acid is capable of being subjected to heat treatment at a maximum heating temperature of 300 to 500 ° C to produce a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24h) of the polyimide film;

【化1】(式中,R1 為碳數1~6之伸烷基,R2 為苯基或環己基)。 2.如第1項之聚醯亞胺絕緣被覆層形成用之聚醯亞胺前驅體組成物,其中,該四羧酸成分含有3,3’,4,4’-聯苯四羧酸二酐50~95莫耳%。【化1】 (wherein R 1 is an alkylene group having 1 to 6 carbon atoms, and R 2 is a phenyl group or a cyclohexyl group). 2. The polyimine imide precursor composition for forming a polyimide-based insulating coating layer according to Item 1, wherein the tetracarboxylic acid component contains 3,3',4,4'-biphenyltetracarboxylic acid Anhydride 50~95 mol%.

3.一種絕緣被覆層之製造方法,係具有於基材塗佈聚醯亞胺前驅體組成物並烘烤的步驟的聚醯亞胺絕緣被覆層之製造方法,其特徵為: 該聚醯亞胺前驅體組成物含有聚醯胺酸、溶劑、與磷化合物, 該聚醯亞胺前驅體組成物含有之聚醯胺酸為由含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐且該等之合計含量為50~100莫耳%的四羧酸成分、與含有4,4’-二胺基二苯醚50~100莫耳%的二胺成分獲得之聚醯胺酸, 該磷化合物為選自於由磷酸酯及下列通式(1)表示之磷化合物構成之群組中之至少1種類, 且,該聚醯胺酸為能藉由在設定最高加熱溫度為300~500℃之條件下進行加熱處理以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜者; 在該烘烤步驟中, 加熱該聚醯亞胺前驅體組成物的時間為10~180秒, 100℃至280℃之平均升溫速度為5℃/s以上, 最高加熱溫度為300~500℃;A method for producing an insulating coating layer, which is a method for producing a polyimide coating having a step of coating a substrate with a polyimide composition precursor and baking, characterized in that: The amine precursor composition contains polylysine, a solvent, and a phosphorus compound, and the polyamidene precursor composition contains polyglycolic acid containing 3,3',4,4'-biphenyltetracarboxylic acid. a dianhydride and a 2,3,3',4'-biphenyltetracarboxylic dianhydride having a total content of 50 to 100 mol% of a tetracarboxylic acid component and a 4,4'-diamino group a polyamic acid obtained from a diamine component having 50 to 100 mol% of a phenyl ether, the phosphorus compound being at least one selected from the group consisting of a phosphate ester and a phosphorus compound represented by the following general formula (1). Moreover, the polylysine is capable of producing a polythenimine having a water vapor transmission coefficient of more than 1.0 g·mm/(m 2 ‧24 h) by heat treatment at a maximum heating temperature of 300 to 500 ° C. In the baking step, the time of heating the polyimide precursor composition is 10 to 180 seconds, and the average temperature rising rate of 100 ° C to 280 ° C is 5 ° C / s or more, the highest heating temperature Degree is 300~500 °C;

【化2】(式中,R1 為碳數1~6之伸烷基,R2 為苯基或環己基)。 4.如第3項之絕緣被覆層之製造方法,其中,該四羧酸成分含有3,3’,4,4’-聯苯四羧酸二酐50~95莫耳%。[Chemical 2] (wherein R 1 is an alkylene group having 1 to 6 carbon atoms, and R 2 is a phenyl group or a cyclohexyl group). 4. The method for producing an insulating coating layer according to Item 3, wherein the tetracarboxylic acid component contains 50 to 95 mol% of 3,3',4,4'-biphenyltetracarboxylic dianhydride.

又,本說明書中,聚醯亞胺絕緣被覆層、聚醯亞胺層、聚醯亞胺被膜、聚醯亞胺薄膜意指以聚醯亞胺為主成分而成者,亦包括含有磷等者。 [發明之效果]In addition, in the present specification, the polyimide coating layer, the polyimide layer, the polyimide film, and the polyimide film are mainly composed of polyimine, and include phosphorus. By. [Effects of the Invention]

依本發明,可提供能於短時間、不引起結晶化而形成耐熱性、機械特性優異的聚醯亞胺樹脂之絕緣被覆層的聚醯亞胺前驅體組成物。能藉由使用本發明之聚醯亞胺前驅體組成物,以於短時間、不引起結晶化而形成耐熱性、機械特性優異的聚醯亞胺樹脂之絕緣被覆層。又,尤可藉由使用本發明之聚醯亞胺前驅體組成物,以形成抑制高溫時之熱分解且與基材之接著強度優異、可靠性高的絕緣被覆層。本發明之聚醯亞胺前驅體組成物、及利用此組成物之本發明之絕緣被覆層之製造方法,尤可理想地應用於絕緣電線之製造,能有效率地製造具有優異之耐熱性且絕緣被覆層無缺陷、可靠性高的絕緣電線。According to the present invention, it is possible to provide a polyimide composition precursor composition which can form an insulating coating layer of a polyimide resin having excellent heat resistance and mechanical properties in a short period of time without causing crystallization. By using the polyimine precursor composition of the present invention, an insulating coating layer of a polyimide resin excellent in heat resistance and mechanical properties can be formed in a short time without causing crystallization. In addition, by using the polyimide intermediate precursor composition of the present invention, it is possible to form an insulating coating layer which is excellent in thermal strength at the time of high temperature and excellent in adhesion strength to a substrate and high in reliability. The polyimine precursor composition of the present invention and the method for producing the insulating coating layer of the present invention using the composition are particularly preferably used for the production of insulated wires, and can be efficiently produced with excellent heat resistance. Insulated coatings have no defects and high reliability of insulated wires.

本發明之聚醯亞胺前驅體組成物之特徵為:使用提供具特定之水蒸氣透過係數的聚醯亞胺薄膜的特定之聚醯胺酸,並添加特定之磷化合物。The polyimine precursor composition of the present invention is characterized by using a specific polyaminic acid which provides a polyimine film having a specific water vapor transmission coefficient, and adding a specific phosphorus compound.

本發明使用之聚醯胺酸可藉由在溶劑中,例如在水或有機溶劑中,或在水與有機溶劑之混合溶劑中使四羧酸成分(四羧酸成分亦包含四羧酸二酐)與二胺成分反應以獲得。此聚醯胺酸係由含有聯苯四羧酸二酐50~100莫耳%的四羧酸成分、與含有4,4’-二胺基二苯醚50~100莫耳%的二胺成分獲得者。所謂聯苯四羧酸二酐為包含多數之異構物的總稱,其中包含3,3’,4,4’-聯苯四羧酸二酐、2,3,3’,4’-聯苯四羧酸二酐、及2,2’,3,3’-聯苯四羧酸二酐。The polyamic acid used in the present invention can be a tetracarboxylic acid component (the tetracarboxylic acid component also contains a tetracarboxylic dianhydride in a solvent, for example, in water or an organic solvent, or in a mixed solvent of water and an organic solvent. ) is reacted with a diamine component to obtain. The polyamic acid is a tetracarboxylic acid component containing 50 to 100 mol% of biphenyltetracarboxylic dianhydride and a diamine component containing 50 to 100 mol% of 4,4'-diaminodiphenyl ether. Winner. The term "biphenyltetracarboxylic dianhydride" is a generic term for a majority of isomers, including 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-biphenyl. Tetracarboxylic dianhydride and 2,2',3,3'-biphenyltetracarboxylic dianhydride.

又,此聚醯胺酸為能藉由在設定最高加熱溫度為300~500℃之條件下進行加熱處理,尤其藉由費時30分鐘從室溫(25℃)升溫至400℃並於400℃加熱處理10分鐘,以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜者。Moreover, the polyglycolic acid can be heated by setting the maximum heating temperature to 300 to 500 ° C, especially by heating from room temperature (25 ° C) to 400 ° C for 30 minutes and heating at 400 ° C. It was treated for 10 minutes to produce a polyimide film having a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24 h).

本發明使用之四羧酸成分含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐,該等之合計含量宜為50~100莫耳%。尤其,從耐熱性、機械特性之觀點,宜使用3,3’,4,4’-聯苯四羧酸二酐50莫耳%以上。如前述,通常當使用3,3’,4,4’-聯苯四羧酸二酐作為四羧酸成分時,欲利用急速升溫之短時間熱處理以進行醯亞胺化的話,易引起局部的結晶化;而依本發明,即使實施急速升溫仍可不引起結晶化而形成聚醯亞胺層。四羧酸成分中之3,3’,4,4’-聯苯四羧酸二酐之含量更佳為50~95莫耳%。The tetracarboxylic acid component used in the present invention contains 3,3',4,4'-biphenyltetracarboxylic dianhydride and 2,3,3',4'-biphenyltetracarboxylic dianhydride, and the total content thereof It should be 50~100% by mole. In particular, from the viewpoint of heat resistance and mechanical properties, it is preferred to use 50 mol% or more of 3,3',4,4'-biphenyltetracarboxylic dianhydride. As described above, when 3,3',4,4'-biphenyltetracarboxylic dianhydride is usually used as the tetracarboxylic acid component, it is easy to cause localized if it is to be subjected to a short-time heat treatment for rapid temperature rise for hydrazylation. Crystallization; according to the present invention, even if a rapid temperature rise is performed, the polyimine layer can be formed without causing crystallization. The content of 3,3',4,4'-biphenyltetracarboxylic dianhydride in the tetracarboxylic acid component is more preferably from 50 to 95 mol%.

本發明中,亦可在50莫耳%以下之範圍使用係3,3’,4,4’-聯苯四羧酸二酐及2,3,3’,4’-聯苯四羧酸二酐以外之聯苯四羧酸二酐的2,2’,3,3’-聯苯四羧酸二酐作為四羧酸成分,亦可在50莫耳%以下之範圍使用聯苯四羧酸二酐以外之四羧酸成分(四羧酸二酐)。本發明中能與聯苯四羧酸二酐組合使用的四羧酸二酐不特別限定,但考量獲得之聚醯亞胺之特性,以芳香族四羧酸二酐、脂環族四羧酸二酐為較佳。例如較佳可舉例:苯均四酸二酐、3,3’,4,4’-二苯基酮四羧酸二酐、氧基二鄰苯二甲酸二酐、二苯基碸四羧酸二酐、對聯三苯基四羧酸二酐、間聯三苯基四羧酸二酐、環丁烷-1,2,3,4-四羧酸二酐、1,2,4,5-環己烷四羧酸二酐等。當使用聯苯四羧酸二酐以外之四羧酸成分時,其中,從獲得之聚醯亞胺之特性,以使用4,4’-氧基二鄰苯二甲酸二酐或苯均四酸二酐為特佳。前述四羧酸二酐不一定為一種,亦可為多種之混合物。In the present invention, the 3,3',4,4'-biphenyltetracarboxylic dianhydride and the 2,3,3',4'-biphenyltetracarboxylic acid may be used in the range of 50 mol% or less. As the tetracarboxylic acid component, the 2,2',3,3'-biphenyltetracarboxylic dianhydride of the biphenyltetracarboxylic dianhydride other than the anhydride may be used in the range of 50 mol% or less. A tetracarboxylic acid component other than dianhydride (tetracarboxylic dianhydride). The tetracarboxylic dianhydride which can be used in combination with the biphenyltetracarboxylic dianhydride in the present invention is not particularly limited, but the aromatic carboxylic acid dianhydride and the alicyclic tetracarboxylic acid are considered in consideration of the properties of the obtained polyfluorene imide. A dianhydride is preferred. For example, preferred are: pyromellitic dianhydride, 3,3',4,4'-diphenyl ketone tetracarboxylic dianhydride, oxydiphthalic dianhydride, diphenylphosphonium tetracarboxylic acid Di-anhydride, conjugated triphenyltetracarboxylic dianhydride, cross-linked triphenyltetracarboxylic dianhydride, cyclobutane-1,2,3,4-tetracarboxylic dianhydride, 1,2,4,5- Cyclohexane tetracarboxylic dianhydride or the like. When a tetracarboxylic acid component other than biphenyltetracarboxylic dianhydride is used, among them, the characteristics of the obtained polyfluorene imide are used to use 4,4'-oxydiphthalic dianhydride or pyromellitic acid. The dianhydride is particularly good. The above tetracarboxylic dianhydride is not necessarily one type, and may be a mixture of a plurality of types.

本發明使用的二胺成分,如前述,含有4,4’-二胺基二苯醚50~100莫耳%,再者,亦可在50莫耳%以下之範圍使用其他二胺。其他二胺不特別限定,可舉例:4,4’-二胺基二苯基甲烷、間苯二胺、對苯二胺、2,4-二胺基甲苯、1,3-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、間亞二甲苯二胺、對亞二甲苯二胺、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4’-亞甲基雙(2,6-二甲苯胺)、α,α’-雙(4-胺基苯基)-1,4-二異丙基苯等芳香族二胺、六亞甲基二胺、七亞甲基二胺、八亞甲基二胺、九亞甲基二胺、十亞甲基二胺、二胺基丙基四亞甲基、3-甲基七亞甲基二胺、2,11-二胺基十二烷、1,12-二胺基十八烷等脂肪族二胺。前述二胺不一定為一種,亦可為多種之混合物。The diamine component used in the present invention contains 50 to 100 mol% of 4,4'-diaminodiphenyl ether as described above, and further, another diamine may be used in the range of 50 mol% or less. The other diamine is not particularly limited and can be exemplified by 4,4'-diaminodiphenylmethane, m-phenylenediamine, p-phenylenediamine, 2,4-diaminotoluene, and 1,3-bis(4- Aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, m-xylene Diamine, p-xylylenediamine, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 4,4'-methylenebis(2,6-xylyleneamine) An aromatic diamine such as α,α'-bis(4-aminophenyl)-1,4-diisopropylbenzene, hexamethylenediamine, heptamethylenediamine, octamethylene Amine, nonamethylenediamine, decamethyldiamine, diaminopropyltetramethylene, 3-methylhexamethylenediamine, 2,11-diaminododecane, 1, An aliphatic diamine such as 12-diaminooctadecane. The diamines are not necessarily one type, and may be a mixture of plural kinds.

本發明使用之聚醯胺酸必須能藉由在設定最高加熱溫度為300~500℃的條件下進行加熱處理,尤其藉由費時30分鐘從室溫(25℃)升溫至400℃並於400℃加熱處理10分鐘,以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜。尤以能製造水蒸氣透過係數大於1.2g‧mm/(m2 ‧24h)的聚醯亞胺薄膜為較佳。獲得之聚醯亞胺薄膜之水蒸氣透過係數若為比此小的值時,在聚醯亞胺絕緣被覆層之製造中,欲以急速升溫之短時間熱處理進行醯亞胺化時容易引起局部的結晶化。The polylysine used in the present invention must be heat-treated by setting the maximum heating temperature at 300 to 500 ° C, especially from room temperature (25 ° C) to 400 ° C and 400 ° C for 30 minutes. The heat treatment was carried out for 10 minutes to produce a polyimide film having a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24 h). In particular, it is preferred to produce a polyimide film having a water vapor transmission coefficient of more than 1.2 g ‧ mm / (m 2 ‧ 24 h). When the water vapor transmission coefficient of the obtained polyimide film is smaller than this, in the production of the polyimide coating, it is easy to cause localization in the short-time heat treatment by rapid heating. Crystallization.

在此,就醯亞胺化過程中之結晶化加以説明。醯亞胺化過程中,溶劑蒸發與醯亞胺化反應係平行發生。升溫速度若大,溶劑蒸發量相對於醯亞胺化反應之進行減少,殘存溶劑量相對較多。聚醯胺酸之醯亞胺化進行並生成醯亞胺鍵時,分子鏈對溶劑的溶解性減小。因此,於殘存溶劑量較多的狀態下,分子鏈容易結晶化而析出。另一方面,當升溫速度小時,溶劑蒸發量相對於醯亞胺化反應之進行增多,殘存溶劑少,故不易發生結晶化。由於可從用於本發明之聚醯亞胺前驅體組成物的聚醯胺酸獲得易透氣的聚醯亞胺樹脂,故溶劑容易蒸發,在升溫速度大的條件下不易發生結晶化之問題。Here, the crystallization in the imidization process will be explained. During the imidization of the hydrazine, solvent evaporation occurs in parallel with the hydrazide reaction. When the temperature increase rate is large, the evaporation amount of the solvent is reduced with respect to the ruthenium iodide reaction, and the amount of residual solvent is relatively large. When the polyaminic acid is imidized and the quinone bond is formed, the solubility of the molecular chain in the solvent is reduced. Therefore, in a state where the amount of residual solvent is large, the molecular chain is easily crystallized and precipitated. On the other hand, when the rate of temperature rise is small, the amount of evaporation of the solvent increases with respect to the ruthenium imidization reaction, and the amount of residual solvent is small, so that crystallization is less likely to occur. Since the gas permeable polyimide resin can be obtained from the polyaminic acid used in the polyimide composition of the present invention, the solvent is easily evaporated, and the problem of crystallization is less likely to occur under conditions of a high temperature increase rate.

藉由在設定最高加熱溫度為300~500℃的條件下進行加熱處理而得之聚醯亞胺薄膜之水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯胺酸,例如,以由含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐之四羧酸成分、及含有4,4’-二胺基二苯醚之二胺成分構成之聚醯胺酸為較佳。此時,更佳係四羧酸成分中之3,3’,4,4’-聯苯四羧酸二酐之含量為95~50莫耳%,2,3,3’,4’-聯苯四羧酸二酐之含量為5~50莫耳%。The polyaminic acid having a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24 h) obtained by heat-treating at a maximum heating temperature of 300 to 500 ° C, for example a tetracarboxylic acid component containing 3,3',4,4'-biphenyltetracarboxylic dianhydride and 2,3,3',4'-biphenyltetracarboxylic dianhydride, and 4,4 A polyglycolic acid composed of a diamine component of '-diaminodiphenyl ether is preferred. At this time, the content of 3,3',4,4'-biphenyltetracarboxylic dianhydride in the tetracarboxylic acid component is preferably 95 to 50 mol%, 2, 3, 3', 4'-linked. The content of the benzenetetracarboxylic dianhydride is 5 to 50 mol%.

在溶劑中,為了抑制醯亞胺化反應在100℃以下,較佳為在80℃以下之較低溫使約等莫耳之四羧酸二酐與二胺反應,藉此能以聚醯胺酸溶液之形式獲得本發明使用之聚醯胺酸。In the solvent, in order to inhibit the ruthenium iodide reaction at 100 ° C or lower, preferably at a lower temperature of 80 ° C or lower, about equimolar tetracarboxylic dianhydride is reacted with a diamine, whereby polylysine can be used. The polylysine used in the present invention is obtained in the form of a solution.

並不限定,但通常反應溫度為25℃~100℃,較佳為40℃~80℃,更佳為50℃~80℃;反應時間為約0.1~24小時,較佳為約2~12小時。將反應溫度及反應時間設定為前述範圍內,藉此可容易地以良好的生產效率獲得高分子量之聚醯胺酸溶液。It is not limited, but usually the reaction temperature is from 25 ° C to 100 ° C, preferably from 40 ° C to 80 ° C, more preferably from 50 ° C to 80 ° C; and the reaction time is from about 0.1 to 24 hours, preferably from about 2 to 12 hours. . The reaction temperature and the reaction time are set within the above range, whereby a high molecular weight polyamine solution can be easily obtained with good production efficiency.

又,反應也可在空氣環境下進行,但通常宜在鈍性氣體環境下,較佳為在氮氣環境下進行。Further, the reaction can also be carried out under an air atmosphere, but it is usually carried out under a passive gas atmosphere, preferably under a nitrogen atmosphere.

所謂約等莫耳之四羧酸二酐與二胺,具體而言,該等之莫耳比[四羧酸二酐/二胺]為約0.90~1.10,較佳為約0.95~1.05。The molar ratio of the tetracarboxylic dianhydride to the diamine is specifically about 0.90 to 1.10, preferably about 0.95 to 1.05.

本發明使用之溶劑,只要能將聚醯胺酸聚合,任何溶劑皆可,可為水溶劑,也可為有機溶劑。溶劑亦可為2種以上之混合物,亦能理想地使用2種以上之有機溶劑之混合溶劑、或水與1種以上之有機溶劑之混合溶劑。The solvent used in the present invention may be any solvent as long as it can polymerize polylysine, and may be an aqueous solvent or an organic solvent. The solvent may be a mixture of two or more kinds, and a mixed solvent of two or more kinds of organic solvents or a mixed solvent of water and one or more organic solvents may be preferably used.

本發明能使用的有機溶劑不特別限定,例如可舉例:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N-甲基-2-吡咯烷酮、N-乙基-2-吡咯烷酮、1,3-二甲基-2-咪唑啶酮、N-甲基己內醯胺、六甲基磷酸三醯胺、1,2-二甲氧基乙烷、雙(2-甲氧基乙基)醚、1,2-雙(2-甲氧基乙氧基)乙烷、四氫呋喃、雙[2-(2-甲氧基乙氧基)乙基]醚、1,4-二烷、二甲基亞碸、二甲基碸、二苯醚、環丁碸、二苯基碸、四甲基尿素、苯甲醚、間甲酚、苯酚、γ-丁內酯等。The organic solvent which can be used in the present invention is not particularly limited, and examples thereof include N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, and N- Methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N-methylcaprolactam, trimethylamine hexamethylphosphate, 1,2 -dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, tetrahydrofuran, bis[2-(2-methoxy) Ethoxy)ethyl]ether, 1,4-two Alkane, dimethyl hydrazine, dimethyl hydrazine, diphenyl ether, cyclobutyl hydrazine, diphenyl hydrazine, tetramethyl urea, anisole, m-cresol, phenol, γ-butyrolactone and the like.

又,此用於反應的溶劑可為本發明之聚醯亞胺前驅體組成物所含之溶劑。Further, the solvent used for the reaction may be a solvent contained in the polyimide composition precursor composition of the present invention.

本發明使用之聚醯胺酸並不限定,但於溫度30℃、濃度0.5g/100mL測定的對數黏度宜為0.2以上。對數黏度若低於前述範圍時,由於聚醯胺酸之分子量低,故有難以獲得高度特性之聚醯亞胺之情形。The polyamic acid used in the present invention is not limited, but the logarithmic viscosity measured at a temperature of 30 ° C and a concentration of 0.5 g / 100 mL is preferably 0.2 or more. When the logarithmic viscosity is lower than the above range, since the molecular weight of the polylysine is low, it is difficult to obtain a polyimine having a high degree of characteristics.

本發明使用之聚醯亞胺前驅體組成物,由聚醯胺酸而來之固體成分濃度並不限定,相對於聚醯胺酸與溶劑之總量較佳為為5質量%~50質量%,更佳為5質量%~45質量%,更佳為10質量%~45質量%,再更佳為大於15質量% ~40質量%。固體成分濃度若低於5質量%,使用時之操作性有變差之情形;若高於45質量%,溶液變得無流動性。The polyimine precursor composition used in the present invention has a solid content concentration of polyamic acid which is not limited, and is preferably from 5% by mass to 50% by mass based on the total amount of the polyamic acid and the solvent. More preferably, it is 5 mass% to 45 mass%, more preferably 10 mass% to 45 mass%, still more preferably 15 mass% to 40 mass%. When the solid content concentration is less than 5% by mass, the workability at the time of use may be deteriorated; if it is more than 45% by mass, the solution becomes fluid-free.

又,本發明使用之聚醯亞胺前驅體組成物於30℃時之溶液黏度並不限定,較佳為1000Pa‧sec以下,更佳為0.5~500Pa‧sec,再更佳為1~300Pa‧sec,特佳為2~200Pa‧sec時,在操作上為理想。Further, the viscosity of the solution of the polyimine precursor composition used in the present invention at 30 ° C is not limited, and is preferably 1,000 Pa sec or less, more preferably 0.5 to 500 Pa sec, and still more preferably 1 to 300 Pa ‧ Sec, especially when it is 2~200Pa‧sec, it is ideal for operation.

本發明之聚醯亞胺前驅體組成物含有聚醯胺酸與溶劑,此外還含有磷化合物。可藉由添加磷化合物以抑制所形成之聚醯亞胺絕緣被覆層在高溫下熱分解並且提高與基材之接著強度。The polyimine precursor composition of the present invention contains polylysine and a solvent, and further contains a phosphorus compound. The addition of the phosphorus compound can suppress the thermal decomposition of the formed polyimide polyimide insulating coating layer at a high temperature and improve the adhesion strength to the substrate.

本發明使用之磷化合物較佳為選自於由磷酸酯及下列化學式(1)表示之磷化合物構成之群組者。The phosphorus compound used in the present invention is preferably selected from the group consisting of a phosphate ester and a phosphorus compound represented by the following chemical formula (1).

【化3】(式中,R1 為碳數1~6之伸烷基,R2 為苯基或環己基。)[化3] (wherein R 1 is an alkylene group having 1 to 6 carbon atoms, and R 2 is a phenyl group or a cyclohexyl group.)

化學式(1)之R1 較佳為碳數1~4之伸烷基。R 1 of the formula (1) is preferably an alkylene group having 1 to 4 carbon atoms.

前述化學式(1)表示之磷化合物之中,可舉例雙(二苯基膦基)甲烷、1,2-雙(二苯基膦基)乙烷、1,3-雙(二苯基膦基)丙烷、1,4-雙(二苯基膦基)丁烷、1,4-雙(二環己基膦基)丁烷為特佳者。Among the phosphorus compounds represented by the above chemical formula (1), bis(diphenylphosphino)methane, 1,2-bis(diphenylphosphino)ethane, and 1,3-bis(diphenylphosphino) can be exemplified. Propane, 1,4-bis(diphenylphosphino)butane, and 1,4-bis(dicyclohexylphosphino)butane are particularly preferred.

磷酸酯為從磷酸與醇衍生而得者,結構無特別限制。本發明使用之磷酸酯,可為單酯、二酯、三酯中之任一者,較佳為從碳數1~18之脂肪族或芳香族醇衍生而得者。又,單酯及二酯亦可與胺等形成鹽。The phosphate ester is derived from phosphoric acid and an alcohol, and the structure is not particularly limited. The phosphate ester used in the present invention may be any of a monoester, a diester or a triester, and is preferably derived from an aliphatic or aromatic alcohol having 1 to 18 carbon atoms. Further, the monoester and the diester may form a salt with an amine or the like.

磷酸酯可舉例磷酸三甲酯、磷酸三乙酯、磷酸三苯酯、及下列化學式(2)表示之磷酸酯化合物及其鹽。與下列化學式(2)表示之磷酸酯化合物形成鹽的化合物,可舉例下列化學式(3)表示之胺。The phosphate ester can be exemplified by trimethyl phosphate, triethyl phosphate, triphenyl phosphate, and a phosphate compound represented by the following chemical formula (2) and salts thereof. The compound which forms a salt with the phosphate compound represented by the following chemical formula (2) can be exemplified by the amine represented by the following chemical formula (3).

【化4】(式中,R3 為氫原子或碳數6~18之烷基或聚氧伸乙基,R4 為碳數6~18之烷基或聚氧伸乙基。)【化4】 (wherein R 3 is a hydrogen atom or an alkyl group having 6 to 18 carbon atoms or a polyoxyalkylene group, and R 4 is an alkyl group having 6 to 18 carbon atoms or a polyoxyalkylene group.)

【化5】(式中,R5 、R6 、R7 為氫原子、羥基乙基或碳數1~4之烷基。)【化5】 (wherein R 5 , R 6 and R 7 are a hydrogen atom, a hydroxyethyl group or an alkyl group having 1 to 4 carbon atoms.)

又,本發明使用之磷酸酯亦可舉例下列化學式(4)表示之磷酸酯化合物。Further, the phosphate ester used in the present invention can also be exemplified by the phosphate compound represented by the following chemical formula (4).

【化6】(式中,R8 為具有反應性官能基的碳數3~12之有機基。)【化6】 (wherein R 8 is an organic group having 3 to 12 carbon atoms having a reactive functional group.)

化學式(4) 之R8 為反應性官能基,具體而言,為具有碳-碳不飽和鍵的碳數3~12之有機基,R8 可舉例丙烯醯基、甲基丙烯醯基、丙烯醯氧基乙基、甲基丙烯醯氧基乙基等。R 8 of the formula (4) is a reactive functional group, specifically, an organic group having a carbon number of 3 to 12 having a carbon-carbon unsaturated bond, and R 8 is exemplified by an acrylonitrile group, a methacryl fluorenyl group, or a propylene group. Alkoxyethyl, methacryloxyethyl and the like.

化學式(4)表示之磷酸酯化合物,具體而言,可舉例磷酸2-(甲基丙烯醯氧基)乙酯、磷酸雙(2-(甲基丙烯醯氧基)乙酯)。The phosphate compound represented by the chemical formula (4), specifically, 2-(methacryloxy)ethyl phosphate and bis(2-(methacryloxy)ethyl phosphate) can be exemplified.

又,該等磷化合物可使用1種,也可併用2種以上。又,亦可併用其他磷化合物。In addition, one type of these phosphorus compounds may be used, or two or more types may be used in combination. Further, other phosphorus compounds may be used in combination.

聚醯亞胺前驅體組成物中之磷化合物之添加量,相對於聚醯胺酸之質量宜為0.1~10質量%,更佳為0.5~5質量%。聚醯亞胺前驅體組成物中之磷化合物之濃度若過少,難以充分獲得在400℃以上之溫度範圍抑制熱分解之效果。另一方面,磷化合物之濃度若過多,會有多量的磷殘留於獲得之聚醯亞胺絕緣被覆層,而有成為揮發成分(散逸氣體)之原因的情形,故不理想。The amount of the phosphorus compound added to the polyimide precursor composition is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass based on the mass of the polyamic acid. If the concentration of the phosphorus compound in the polyimide precursor composition is too small, it is difficult to sufficiently obtain the effect of suppressing thermal decomposition in a temperature range of 400 ° C or higher. On the other hand, if the concentration of the phosphorus compound is too large, a large amount of phosphorus remains in the obtained polyimide-based insulating coating layer, which may cause a volatile component (dissipating gas), which is not preferable.

磷化合物可於聚醯胺酸之製備前添加亦可於製備後添加。亦即,在溶劑中使四羧酸成分與二胺成分反應而獲得聚醯胺酸溶液後,於該溶液添加磷化合物,藉此可獲得含磷化合物的本發明之聚醯亞胺前驅體組成物。又,亦可藉由對於溶劑添加四羧酸成分、二胺成分、與磷化合物,在溶劑中、在磷化合物存在下使四羧酸成分與二胺成分反應,從而獲得含磷化合物的本發明之聚醯亞胺前驅體組成物。The phosphorus compound may be added before the preparation of the polyamic acid or may be added after the preparation. That is, after a tetracarboxylic acid component and a diamine component are reacted in a solvent to obtain a polyaminic acid solution, a phosphorus compound is added to the solution, whereby a polyphosphorimide precursor composition of the present invention containing a phosphorus-containing compound can be obtained. Things. Further, the present invention can be obtained by adding a tetracarboxylic acid component, a diamine component, and a phosphorus compound to a solvent, and reacting a tetracarboxylic acid component with a diamine component in a solvent in the presence of a phosphorus compound to obtain a phosphorus-containing compound. Polyimine precursor composition.

聚醯亞胺前驅體組成物,利用加熱處理去除溶劑並同時進行醯亞胺化(脫水閉環),藉此形成聚醯亞胺,但藉由使用如上述本發明之聚醯亞胺前驅體組成物,可採用於短時間升溫並於高溫烘烤之步驟以形成聚醯亞胺絕緣被覆層。在此,所謂於短時間升溫並於高溫進行烘烤,例如為:加熱聚醯亞胺前驅體組成物之時間為10~180秒,且以100℃至280℃之平均升溫速度為5℃/s以上之條件進行升溫,最高加熱溫度為300~500℃之步驟。The polyimide precursor composition is removed by heat treatment and simultaneously subjected to hydrazide (dehydration ring closure), thereby forming a polyimine, but by using the polyimine precursor of the present invention as described above The material can be heated in a short time and baked at a high temperature to form a polyimide coating. Here, the temperature is raised in a short time and baked at a high temperature, for example, the time for heating the polyimide precursor composition is 10 to 180 seconds, and the average temperature increase rate at 100 ° C to 280 ° C is 5 ° C / The temperature is raised above s, and the maximum heating temperature is 300 to 500 °C.

本發明係藉由將如上述含有聚醯胺酸、溶劑、與磷化合物的聚醯亞胺前驅體組成物以公知方法塗佈於基材並實施加熱(烘烤)以形成聚醯亞胺絕緣被覆層。在該烘烤步驟中,可設定加熱聚醯亞胺前驅體組成物的時間(以加熱爐加熱時,意指在加熱爐內的時間)為10~180秒,設定100℃至280℃之平均升溫速度為5℃/s以上,設定最高加熱溫度為300~500℃。100℃至280℃之平均升溫速度之上限不特別限定,但以例如50℃/s以下為宜。In the present invention, a polyamidene precursor composition containing a polyphthalic acid, a solvent, and a phosphorus compound as described above is applied to a substrate by a known method and heated (baked) to form a polyimide insulation. Covered layer. In the baking step, the time for heating the polyimide precursor composition (in the heating furnace, meaning the time in the heating furnace) can be set to 10 to 180 seconds, and the average of 100 ° C to 280 ° C is set. The heating rate is 5 ° C / s or more, and the maximum heating temperature is set to 300 to 500 ° C. The upper limit of the average temperature increase rate from 100 ° C to 280 ° C is not particularly limited, but is preferably, for example, 50 ° C / s or less.

本發明中,亦可進一步將100℃至300℃之平均升溫速度設定為5℃/s以上(亦即,從100℃升溫至300℃為40秒以內),亦可將100℃至最高加熱溫度(300~500℃)之平均升溫速度設定為5℃/s以上。至100℃之平均升溫速度亦不特別限定,亦可設定為5℃/s以上。In the present invention, the average temperature increase rate from 100 ° C to 300 ° C may be further set to 5 ° C / s or more (that is, from 100 ° C to 300 ° C for 40 seconds), or from 100 ° C to the highest heating temperature The average temperature increase rate (300 to 500 ° C) is set to 5 ° C / s or more. The average temperature increase rate to 100 ° C is also not particularly limited, and may be set to 5 ° C / s or more.

本發明中,100℃至280℃之平均升溫速度為5℃/s以上(亦即,從100℃升溫至280℃為36秒以內)即可,對於室溫至最高加熱溫度之升溫條件並無限制,可以一定之升溫速度升溫,又亦可於加熱處理中改變升溫速度,亦可階段升溫。In the present invention, the average temperature increase rate from 100 ° C to 280 ° C is 5 ° C / s or more (that is, the temperature is raised from 100 ° C to 280 ° C within 36 seconds), and the temperature rise from room temperature to the maximum heating temperature is not The limitation can be increased by a certain heating rate, or the heating rate can be changed during the heating process, and the temperature can be raised in stages.

此用以醯亞胺化之加熱處理,例如可於空氣環境下、或鈍性氣體環境下實施。This heat treatment for hydrazine imidation can be carried out, for example, in an air atmosphere or in a passive gas atmosphere.

又,亦能夠以上述以外之條件加熱處理本發明之聚醯亞胺前驅體組成物而形成聚醯亞胺絕緣被覆層。Further, the polyimine imide precursor composition of the present invention can be heat-treated under the conditions other than the above to form a polyimide conductive coating layer.

又,基材不特別限定,可視用途適當選擇。又,形成之聚醯亞胺絕緣被覆層之厚度亦不特別限定,可視用途適當選擇。Further, the substrate is not particularly limited and may be appropriately selected depending on the intended use. Further, the thickness of the formed polyimide coating layer is not particularly limited, and may be appropriately selected depending on the application.

依本發明獲得之聚醯亞胺絕緣被覆層為具有高度之耐電壓性、耐熱性、及耐濕熱性的絕緣構件(被覆層)。因此,尤適合使用在電氣‧電子零件相關、汽車領域、航太領域等,亦可使用於HV車馬達用線圈或超小型馬達之領域。 [實施例]The polyimide coating layer obtained by the present invention is an insulating member (coating layer) having high voltage resistance, heat resistance, and moist heat resistance. Therefore, it is particularly suitable for use in electric, electronic parts, automotive, aerospace, etc., and can also be used in the field of HV motor coils or ultra-small motors. [Examples]

以下,以實施例更具體説明本發明,但本發明不限定於該等實施例。Hereinafter, the present invention will be specifically described by way of Examples, but the present invention is not limited to the Examples.

將下例中用到的特性之測定方法表示於下。 <固體成分濃度> 將試樣溶液(令其質量為w1 )於熱風乾燥機中於120℃加熱10分鐘,於250℃加熱10分鐘,其次於350℃加熱30分鐘,測定加熱處理後之質量(令其質量為w2 )。依下式計算出固體成分濃度[質量%]。The measurement method of the characteristics used in the following examples is shown below. <Solid component concentration> The sample solution (having the mass of w 1 ) was heated in a hot air dryer at 120 ° C for 10 minutes, heated at 250 ° C for 10 minutes, and then heated at 350 ° C for 30 minutes, and the mass after heat treatment was measured. (Let its quality be w 2 ). The solid content concentration [% by mass] was calculated according to the following formula.

固體成分濃度[質量%]=(w2 /w1 )×100 <溶液黏度(旋轉黏度)> 使用Tokimec公司製E型黏度計於30℃進行測定。 <絕緣被覆層之狀態觀察(被覆膜評價)> 針對獲得之被覆層以目視進行狀態觀察。完全無混濁者評為良好,有混濁之區域超過10%者評為有混濁。「有混濁」代表聚醯亞胺樹脂至少一部分結晶化。         <升溫速度之測定> 在被覆層形成步驟中,使用Keyence (股)公司製之計測單元NR-TH08及解析軟體WAVE LOGGER,測定樣品溫度從100℃變化至280℃所需之時間。         <水蒸氣透過係數> 依據JIS K7129之B法,於40℃、相對濕度90%進行測定。 <490℃加熱時重量變化量(減少量)> 將25μm厚之聚醯亞胺被膜裁切成10cm×10cm四方,測定重量。然後,於空氣環境中於490℃熱處理30分鐘(0.5小時),測定薄膜之重量減少量。同樣地再於490℃熱處理60分鐘(合算1.5小時)後測定薄膜之重量減少量;然後再於490℃熱處理60分鐘(合算2.5小時)後測定薄膜之重量減少量。又,熱處理前之薄膜之重量為368mg/100cm2 。 <接著強度> 將由聚醯亞胺層與銅箔構成之疊層體裁切成10mm寬,以剝離速度50mm/分鐘之條件實施90°剝離試驗,定義3個樣品之平均值為接著強度。Solid content concentration [% by mass] = (w 2 / w 1 ) × 100 <solution viscosity (rotational viscosity)> Measurement was carried out at 30 ° C using an E-type viscometer manufactured by Tokimec Co., Ltd. <Observation of State of Insulating Coating Layer (Evaluation of Coating Film)> The obtained coating layer was visually observed. Those who were completely turbid were rated as good, and those with more than 10% of turbidity were rated as turbid. "Having turbidity" means that at least a portion of the polyimide resin is crystallized. <Measurement of Temperature Increase Rate> In the coating layer forming step, the measurement unit NR-TH08 manufactured by Keyence Co., Ltd. and the analysis software WAVE LOGGER were used to measure the time required for the sample temperature to change from 100 ° C to 280 ° C. <Water vapor transmission coefficient> The measurement was carried out at 40 ° C and a relative humidity of 90% in accordance with the method B of JIS K7129. <Amount of change in weight at the time of heating at 490 ° C (reduction amount)> A 25 μm-thick polyimide film was cut into a square of 10 cm × 10 cm, and the weight was measured. Then, it was heat-treated at 490 ° C for 30 minutes (0.5 hours) in an air atmosphere, and the weight loss of the film was measured. Similarly, the weight reduction of the film was further measured after heat treatment at 490 ° C for 60 minutes (1.5 hours); and then the weight reduction of the film was measured after heat treatment at 490 ° C for 60 minutes (2.5 hours). Further, the weight of the film before the heat treatment was 368 mg/100 cm 2 . <Continuing Strength> A laminate composed of a polyimide layer and a copper foil was cut into a width of 10 mm, and a 90° peeling test was carried out under the conditions of a peeling speed of 50 mm/min, and the average value of the three samples was defined as the bonding strength.

針對下例中用到的化合物之簡稱加以説明。         s-BPDA:3,3’,4,4’-聯苯四羧酸二酐 a-BPDA:2,3,3’,4’-聯苯四羧酸二酐 ODA:4,4’-二胺基二苯醚 NMP:N-甲基-2-吡咯烷酮 DPPE:1,2-雙(二苯基膦基)乙烷 TEP:磷酸三乙酯The abbreviations of the compounds used in the following examples are explained. s-BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride a-BPDA: 2,3,3',4'-biphenyltetracarboxylic dianhydride ODA: 4,4'- Aminodiphenyl ether NMP: N-methyl-2-pyrrolidone DPPE: 1,2-bis(diphenylphosphino)ethane TEP: triethyl phosphate

[實施例1] 於具備攪拌機、氮氣導入‧排出管的內容積500mL之玻璃製反應容器,加入NMP300g作為溶劑,於此加入ODA 60.08g(0.3莫耳),於50℃攪拌1小時使其溶解。於此溶液加入s-BPDA 70.61g(0.24莫耳)、a-BPDA 17.65g(0.06莫耳)、水1.62g(0.09莫耳),於50℃攪拌3小時,獲得固體成分濃度30.6質量%、溶液黏度7.0Pa‧s之聚醯亞胺前驅體組成物。於此聚醯亞胺前驅體組成物添加作為磷化合物之DPPE 3.37g(相對於組成物為0.75質量%,相對於聚醯胺酸之質量為2.27質量%),獲得聚醯亞胺前驅體組成物。[Example 1] In a glass reaction vessel having a 500 mL internal volume of a mixer, a nitrogen gas introduction, and a discharge tube, NMP (300 g) was added as a solvent, and ODA 60.08 g (0.3 mol) was added thereto, and the mixture was stirred at 50 ° C for 1 hour to dissolve. . To this solution, 70.61 g (0.24 mol) of s-BPDA, 17.65 g (0.06 mol) of a-BPDA, and 1.62 g (0.09 mol) of water were added, and the mixture was stirred at 50 ° C for 3 hours to obtain a solid concentration of 30.6 mass %. Polyimine precursor composition having a solution viscosity of 7.0 Pa ‧ s. In this polyimine precursor composition, 3.37 g of DPPE as a phosphorus compound (0.75 mass% with respect to the composition and 2.27 mass% with respect to the mass of the polyglycolic acid) was added to obtain a polyimide precursor composition. Things.

將此聚醯亞胺前驅體組成物塗佈於膜厚50μm之聚醯亞胺薄膜上,置於已加熱至350℃的SUS板上並保持1分鐘,製作成絕緣被覆層(聚醯亞胺被膜)。此時之樣品溫度從100℃升溫至280℃之時間為12秒 (升溫速度15℃/s)。針對獲得之絕緣被覆層,將狀態觀察之評價結果示於表1。The polyimide precursor composition was applied onto a polyimide film having a thickness of 50 μm, placed on a SUS plate heated to 350 ° C and held for 1 minute to prepare an insulating coating layer (polyimine). Membrane). At this time, the temperature of the sample was raised from 100 ° C to 280 ° C for 12 seconds (temperature rising rate 15 ° C / s). The evaluation results of the state observation are shown in Table 1 for the obtained insulating coating layer.

又,將此聚醯亞胺前驅體組成物塗佈於作為基材之玻璃板上,費時30分鐘從室溫升溫至400℃,於400℃加熱處理10分鐘,獲得厚度25μm之聚醯亞胺被膜。將獲得之聚醯亞胺被膜(聚醯亞胺薄膜)從基材剝離,測定水蒸氣透過係數及490℃加熱時重量變化量。將評價結果示於表1。Further, the polyimide precursor composition was applied onto a glass plate as a substrate, heated from room temperature to 400 ° C for 30 minutes, and heat-treated at 400 ° C for 10 minutes to obtain a polyimide having a thickness of 25 μm. Membrane. The obtained polyimide film (polyimine film) was peeled off from the substrate, and the water vapor transmission coefficient and the weight change amount at 490 ° C during heating were measured. The evaluation results are shown in Table 1.

又,以獲得之聚醯亞胺層之厚度為25μm之方式將此聚醯亞胺前驅體組成物塗佈於厚度18μm之銅箔(三井金屬礦業製,3EC-VLP)之平滑面上,費時30分鐘從室溫升溫至400℃,於400℃加熱處理10分鐘,獲得疊層體。針對獲得之疊層體,測定聚醯亞胺層與銅箔之間之接著強度。將評價結果示於表1。Further, the obtained polyimide phase precursor composition was applied to a smooth surface of a copper foil (manufactured by Mitsui Mining & Mining Co., Ltd., 3EC-VLP) having a thickness of 18 μm so that the obtained polyimide layer having a thickness of 25 μm was time-consuming. The temperature was raised from room temperature to 400 ° C for 30 minutes, and heat treatment was performed at 400 ° C for 10 minutes to obtain a laminate. The adhesion strength between the polyimide layer and the copper foil was measured for the obtained laminate. The evaluation results are shown in Table 1.

[實施例2] 使用DPPE 6.74g(相對於組成物為1.5質量%,相對於聚醯胺酸之質量為4.54質量%)作為磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Example 2] Polyfluorene was prepared in the same manner as in Example 1 except that 6.74 g (1.5% by mass of the composition and 4.54% by mass based on the mass of the polyglycolic acid) of the DPPE was used as the phosphorus compound. The imine precursor composition is produced by producing an insulating coating layer on a polyimide film, producing a polyimide film, and manufacturing a laminate comprising a polyimide layer and a copper foil, and performing State observation and measurement of characteristics ‧ Evaluation. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[實施例3] 使用JPA-514(城北化學工業製,磷酸2-(甲基丙烯醯氧基)乙酯與磷酸雙(2-(甲基丙烯醯氧基)乙酯)之混合物)3.37g(相對於組成物為0.75質量%,相對於聚醯胺酸之質量為2.27質量%)作為磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Example 3] Using JPA-514 (manufactured by Seongbuk Chemical Industry, a mixture of 2-(methacryloxy)ethyl phosphate and bis(2-(methacryloxy)ethyl) phosphate) 3.37 g (Polyimide precursor composition was prepared in the same manner as in Example 1 except that the composition was 0.75% by mass based on the mass of the polyamic acid and 2.27 mass% based on the mass of the polyglycolic acid). Production of an insulating coating layer on a polyimide film, production of a polyimide film, and production of a laminate comprising a polyimide layer and a copper foil, and observation of the state and measurement of characteristics. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[實施例4] 使用JPA-514 6.74g(相對於組成物為1.5質量%,相對於聚醯胺酸之質量為4.54質量%)作為磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Example 4] Prepared in the same manner as in Example 1 except that 6.74 g (1.5% by mass based on the composition and 4.54% by mass based on the mass of the polyglycolic acid) of JPA-514 was used as the phosphorus compound. The polyimide composition precursor composition, the production of an insulating coating layer on a polyimide film, the production of a polyimide film, and the production of a laminate comprising a polyimide layer and a copper foil. The state observation and the measurement of the characteristics were evaluated. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[實施例5] 使用TEP 3.37g(相對於組成物為0.75質量%,相對於聚醯胺酸之質量為2.27質量%)作為磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Example 5] Polyfluorene was prepared in the same manner as in Example 1 except that 3.37 g of TEP (0.75 mass% based on the composition and 2.27 mass% based on the mass of the polyglycolic acid) was used as the phosphorus compound. The imine precursor composition is produced by producing an insulating coating layer on a polyimide film, producing a polyimide film, and manufacturing a laminate comprising a polyimide layer and a copper foil, and performing State observation and measurement of characteristics ‧ Evaluation. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[實施例6] 使用TEP 6.74g(相對於組成物為1.5質量%,相對於聚醯胺酸之質量為4.54質量%)作為磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Example 6] Polyfluorene was prepared in the same manner as in Example 1 except that 6.74 g of TEP (1.5 mass% based on the composition and 4.54 mass% based on the mass of the polyglycolic acid) was used as the phosphorus compound. The imine precursor composition is produced by producing an insulating coating layer on a polyimide film, producing a polyimide film, and manufacturing a laminate comprising a polyimide layer and a copper foil, and performing State observation and measurement of characteristics ‧ Evaluation. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[比較例1] 不添加磷化合物,除此以外,以與實施例1同樣方式製備聚醯亞胺前驅體組成物,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。[Comparative Example 1] A polyimide composition precursor was prepared in the same manner as in Example 1 except that the phosphorus compound was not added, and the insulating coating layer was formed on the polyimide film, and the polyimide was coated. The production of a film and the production of a laminate comprising a polyimide layer and a copper foil, and observation of the state and measurement of characteristics were evaluated. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

[比較例2] 於具備攪拌機、氮氣導入‧排出管的內容積500mL之玻璃製反應容器,加入NMP 396g作為溶劑,於此加入ODA 40.05g(0.2莫耳),於50℃攪拌1小時使其溶解。於此溶液加入s-BPDA 58.84g(0.2莫耳),於50℃攪拌3小時,獲得固體成分濃度18.5質量%、溶液黏度5.0Pa‧s之聚醯亞胺前驅體組成物。於此聚醯亞胺前驅體組成物添加作為磷化合物之TEP 4.50g(相對於組成物為1.0質量%,相對於聚醯胺酸之質量為4.55質量%),獲得聚醯亞胺前驅體組成物。[Comparative Example 2] Into a reaction vessel made of glass containing 500 mL of an internal volume of a stirrer, a nitrogen gas introduction, and a discharge tube, 396 g of NMP was added as a solvent, and ODA (40.05 g (0.2 mol) was added thereto, and the mixture was stirred at 50 ° C for 1 hour. Dissolved. To the solution, 58.84 g (0.2 mol) of s-BPDA was added, and the mixture was stirred at 50 ° C for 3 hours to obtain a polyimine precursor composition having a solid concentration of 18.5% by mass and a solution viscosity of 5.0 Pa s. In the polyimine precursor composition, a TEP of 4.50 g (1.0% by mass based on the composition and 4.55% by mass based on the mass of the polyglycolic acid) as a phosphorus compound was added to obtain a polyimide precursor composition. Things.

使用此聚醯亞胺前驅體組成物,以與實施例1同樣方式,實施於聚醯亞胺薄膜上之絕緣被覆層之製造、聚醯亞胺薄膜之製造、及由聚醯亞胺層與銅箔構成之疊層體之製造,並進行狀態觀察及特性之測定‧評價。又,於聚醯亞胺薄膜上製造絕緣被覆層時100℃至280℃之升溫速度為15℃/s。將結果示於表1。Using this polyimide intermediate precursor composition, in the same manner as in Example 1, the production of an insulating coating layer on a polyimide film, the production of a polyimide film, and a polyimide layer and a polyimide layer were used. The laminate of the copper foil was produced, and the state observation and the measurement of the characteristics were evaluated. Further, when the insulating coating layer was formed on the polyimide film, the temperature rising rate at 100 ° C to 280 ° C was 15 ° C / s. The results are shown in Table 1.

【表1】 【Table 1】

no

Claims (4)

一種聚醯亞胺絕緣被覆層形成用之聚醯亞胺前驅體組成物,包含聚醯胺酸、溶劑、與磷化合物,其特徵為: 該聚醯胺酸為由含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐且該等之合計含量為50~100莫耳%的四羧酸成分、與含有4,4’-二胺基二苯醚50~100莫耳%的二胺成分獲得之聚醯胺酸; 該磷化合物為選自於由磷酸酯及下列通式(1)表示之磷化合物構成之群組中之至少1種類; 該聚醯胺酸為能藉由在設定最高加熱溫度為300~500℃之條件下進行加熱處理以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜者; 【化1】式中,R1 為碳數1~6之伸烷基,R2 為苯基或環己基。A polyimine precursor composition for forming a polyimide polyimide insulating coating layer, comprising a poly-proline, a solvent, and a phosphorus compound, wherein: the polyamine contains 3, 3', 4 4'-biphenyltetracarboxylic dianhydride and 2,3,3',4'-biphenyltetracarboxylic dianhydride, and the total content of the tetracarboxylic acid component and the content of 50 to 100 mol% a polyamic acid obtained from a diamine component of 4,4'-diaminodiphenyl ether of 50 to 100 mol%; the phosphorus compound is selected from the group consisting of a phosphate compound and a phosphorus compound represented by the following formula (1) At least one of the group; the polyglycolic acid can be heated by a maximum heating temperature of 300 to 500 ° C to produce a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24h) of the polyimide film; [Chemical 1] In the formula, R 1 is an alkylene group having 1 to 6 carbon atoms, and R 2 is a phenyl group or a cyclohexyl group. 如申請專利範圍第1項之聚醯亞胺絕緣被覆層形成用之聚醯亞胺前驅體組成物,其中,該四羧酸成分含有3,3’,4,4’-聯苯四羧酸二酐50~95莫耳%。A polyimine precursor composition for forming a polyimide-based insulating coating layer according to the first aspect of the invention, wherein the tetracarboxylic acid component contains 3,3',4,4'-biphenyltetracarboxylic acid The dianhydride is 50~95 mol%. 一種絕緣被覆層之製造方法,係具有於基材塗佈聚醯亞胺前驅體組成物並烘烤的步驟的聚醯亞胺絕緣被覆層之製造方法,其特徵為: 該聚醯亞胺前驅體組成物含有聚醯胺酸、溶劑、與磷化合物, 該聚醯亞胺前驅體組成物含有之聚醯胺酸為由含有3,3’,4,4’-聯苯四羧酸二酐與2,3,3’,4’-聯苯四羧酸二酐且該等之合計含量為50~100莫耳%的四羧酸成分、與含有4,4’-二胺基二苯醚50~100莫耳%的二胺成分獲得之聚醯胺酸, 該磷化合物為選自於由磷酸酯及下列通式(1)表示之磷化合物構成之群組中之至少1種類, 且,該聚醯胺酸為能藉由在設定最高加熱溫度為300~500℃之條件下進行加熱處理以製造水蒸氣透過係數大於1.0g‧mm/(m2 ‧24h)的聚醯亞胺薄膜者; 在該烘烤步驟中, 加熱該聚醯亞胺前驅體組成物的時間為10~180秒, 100℃至280℃之平均升溫速度為5℃/s以上, 最高加熱溫度為300~500℃; 【化2】式中,R1 為碳數1~6之伸烷基,R2 為苯基或環己基。A method for producing an insulating coating layer, which is a method for producing a polyimide coating having a step of coating a substrate with a polyimide composition precursor and baking, characterized in that: the polyimide precursor The bulk composition contains polyamic acid, a solvent, and a phosphorus compound, and the polyamidene precursor composition contains polyglycine which contains 3,3',4,4'-biphenyltetracarboxylic dianhydride. And a 2,3,3',4'-biphenyltetracarboxylic dianhydride having a total content of 50 to 100 mol% of a tetracarboxylic acid component and a 4,4'-diaminodiphenyl ether a polyamic acid obtained by a diamine component of 50 to 100 mol%, which is at least one selected from the group consisting of a phosphate ester and a phosphorus compound represented by the following general formula (1), and The polylysine is a polyimine film capable of producing a water vapor transmission coefficient of more than 1.0 g ‧ mm / (m 2 ‧ 24 h) by heat treatment at a maximum heating temperature of 300 to 500 ° C In the baking step, the time of heating the polyimide precursor composition is 10 to 180 seconds, and the average temperature rising rate of 100 ° C to 280 ° C is 5 ° C / s or more, the highest heating temperature Of 300 ~ 500 ℃; [Chemical 2] In the formula, R 1 is an alkylene group having 1 to 6 carbon atoms, and R 2 is a phenyl group or a cyclohexyl group. 如申請專利範圍第3項之絕緣被覆層之製造方法,其中,該四羧酸成分含有3,3’,4,4’-聯苯四羧酸二酐50~95莫耳%。The method for producing an insulating coating layer according to claim 3, wherein the tetracarboxylic acid component contains 50 to 95 mol% of 3,3',4,4'-biphenyltetracarboxylic dianhydride.
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