TW201627527A - Brushless rotary plasma electrode structure and film coating system - Google Patents

Abstract

A brushless rotary plasma electrode structure is provided. The brushless rotary plasma electrode structure includes a main body, a plurality of guiding portions and a plurality of conductive members. The main body includes a plurality of electrode portions. A plurality of first protrusions are located the periphery of the plurality of electrode portions. The conductive members pass through the plurality of electrode portions. The conductive members include a plurality of second protrusions. A gap is form between the first protrusion and the second protrusion. Additional, a film coating system is also provided.

Description

Brushless rotating plasma electrode structure and coating system

The present invention relates to an electrode structure and a coating system, and more particularly to a carbonless brush rotating plasma electrode structure and a coating system comprising a carbonless brush rotating plasma electrode structure.

Fig. 1 is a schematic view showing the structure of a carbon brush type rotary plasma electrode of the prior art. Please refer to Figure 1.

The carbon brush rotary plasma electrode structure 10 of the prior art is composed of a two-electrode portion 11, two guide portions 12, a partition portion 13, a carbon brush 14 made of graphite, an RF generator 15, and a ground electrode 16. The partition portion 13 is located between the two electrode portions 11. The guiding portion 12 penetrates through the two electrode portions 12. The carbon brush 14 is disposed on the periphery of the electrode portion 11. The RF generator 15 and the ground electrode 16 are respectively coupled to one end of the corresponding carbon brush 14, and the other end of the carbon brush 14 and the electrode portion 11 are in contact with each other.

In this configuration, the electrode portion 11 is rotated about the axis A1, and the RF power is generated by the carbon brush 14 to transmit the RF power generated by the RF generator 15 to the electrode portion 11, thereby generating the self-guide portion 12. The plasma is surface treated to the workpiece. However, the rotating electrode portion 11 rubs against the carbon brush 14, so that heat is generated by friction and heat is generated, and there is a fear of fire during long-term operation.

Furthermore, the rubbed carbon brush 14 also generates dust, and the dust will fall to the workpiece to cause pollution, and the workpiece after the plasma treatment will have poor yield. question. In the prior art, dust is collected by a dust cover to reduce the probability of dust falling to the workpiece, but the problem that the electrode portion 11 rubs the high temperature generated by the carbon brush 14 cannot be solved, and the impedance is increased. It can be seen that the carbon brush rotary plasma electrode structure 10 of the prior art also has a problem of high impedance, which will result in poor RF energy.

The invention provides a carbonless brush rotating plasma electrode structure, which is a contactless power coupling structure, which can improve the efficiency of power coupling, and can avoid dust pollution and high temperature generation, thereby reducing impedance.

The present invention provides a coating system that includes a carbonless brush rotating plasma electrode structure that increases the efficiency of power coupling to produce higher RF energy, thereby increasing the strength of the plasma.

An embodiment of the invention provides a carbonless brush rotating plasma electrode structure, comprising a body, a plurality of guiding portions, and a plurality of conducting members. The body rotates about an axis, and the body includes a plurality of electrode portions spaced apart from each other, and a peripheral portion of each electrode portion is provided with a first protruding portion. The guiding portion penetrates through the electrode portion. Each of the conductive members includes a second protruding portion, and the first protruding portion has a first interval from the corresponding second protruding portion.

An embodiment of the invention provides a coating system comprising the above-described carbonless brush rotating plasma electrode structure.

Based on the above, in the brushless rotary plasma electrode structure of the present invention, the conductive member is not in contact with the electrode portion to form a high-power RF power coupling structure by the design of the conductive member, thereby improving power coupling. Efficiency, which in turn produces higher RF energy. Further, when the brushless rotating plasma electrode structure is applied to the coating system, the strength generated by the plasma can be increased.

10‧‧‧Carbon brush rotary plasma electrode structure

14‧‧‧Carbon brush

50‧‧‧ coating system

60‧‧‧Workpiece

100, 200, 300, 400, 500, 600, 700‧‧‧Non-carbon brush rotating plasma electrode structure

110‧‧‧ body

11, 112, 114, 212, 312, 412, 512‧‧ ‧ electrode parts

113‧‧‧ ring plate

112a, 212a, 312a, 512a‧‧‧ first projection

12. 120‧‧‧ Guidance Department

13, 130‧‧ ‧ Isolation Department

140, 240, 340, 440‧‧ ‧ conduction parts

142, 242, 442‧‧‧ second bulge

15, 150‧‧‧RF generator

16, 160‧‧‧ Grounding electrode

A‧‧‧ area of the tablet

A1‧‧‧ Axis

C‧‧‧ Capacitance

d‧‧‧Two plate spacing distance

D1‧‧‧ first interval

D2‧‧‧second interval

Ε‧‧‧ dielectric constant

ω ‧‧‧ angular frequency

J‧‧‧ imaginary unit

Q‧‧‧Charge

V‧‧‧ voltage

Z‧‧‧ impedance

Fig. 1 is a schematic view showing the structure of a carbon brush type rotary plasma electrode of the prior art.

Fig. 2 is a schematic view showing the structure of the brushless rotating plasma electrode of the present invention.

3 to 7 are schematic views of different embodiments of the brushless rotating plasma electrode structure of the present invention.

Figure 8 is a schematic view of another embodiment of the brushless rotating plasma electrode structure of the present invention.

Figure 9 is a schematic view of the coating system of the present invention.

The specific embodiments of the present invention are further described below in conjunction with the drawings and embodiments. The following examples are only used to more clearly illustrate the technical solutions of the present invention, and are not intended to limit the scope of the present invention.

Fig. 2 is a schematic view showing the structure of the brushless rotating plasma electrode of the present invention. Please refer to Figure 2. In the present embodiment, the brushless rotary plasma electrode structure 100 includes a body 110, a plurality of guiding portions 120, a spacer portion 130, a plurality of conductive members 140, an RF generator 150, and a ground electrode 160.

The body 110 rotates about an axis A1. The body 110 includes a plurality of (illustrated as two) spaced electrode portions 112, 114, wherein the isolation portion 130 is located between the two electrode portions 112.

The guiding portion 120 penetrates through the electrode portion 112. The guiding portion 120 is, for example, a hollow tube member made of a dielectric material to guide plasma such as ionized gas through the electrode portions 112, 114 to form a plasma.

In this embodiment, the conductive members 140 are respectively located at the electrode portions 112 and 114. Periphery. In the present embodiment, the number of the conductive members 140 is four, wherein the two conductive members 140 are located at both ends of the electrode portion 112 at the upper end, and the other two conductive members 140 are at both ends of the electrode portion 114 at the lower end. It should be noted that the above-described conductive member 140 is not in contact with the electrode portions 112 and 114.

In the present embodiment, the peripheral edges of the electrode portions 112 and 114 are fin-shaped. The first convex portion 112a is provided on the periphery of each of the electrode portions 112 and 114.

In the embodiment, one end of the conducting member 140 is fin-shaped. Each of the conductive members 140 includes a second protruding portion 142. Each of the conductive members 140 has three second protruding portions 142, and each of the second protruding portions 142 is located between the corresponding first protruding portions 112a. The first protruding portions 112a correspond to each other. The second protrusion 142 has a first interval d1, wherein the first interval d1 is less than 2 mm to generate sufficient capacitance. It should be noted that this embodiment does not limit the number of the first protruding portions and the number of the second protruding portions.

In the present embodiment, the second protrusions 142 of the respective conductive members 140 have a second interval d2 to the corresponding electrode portions 112, 114, wherein the second interval d2 is greater than 2 mm to avoid sparking.

In the present embodiment, the RF generator 150 is coupled to the corresponding conductive member 140. In the second embodiment, the RF generator 150 is connected to the upper conductive member 140. The RF generator 150 has a frequency greater than 13.56 MHz. . The ground electrode 160 is coupled to the underlying conductive member 140 for grounding.

Hereinafter, the carbonless brush rotating plasma electrode structure 100 of the present embodiment can be used to form a high power RF power coupling structure by an electrical impedance and its associated formula. The relevant formula is as follows:

In the formula (1), Z represents an impedance, j represents an imaginary unit, ω represents an angular frequency, and c represents a capacitance.

In the formula (2), c represents a capacitance, V represents a voltage, and Q represents a charge amount. The capacitance c is a quantity Q of charge stored in the capacitor electrode when the potential difference across the capacitor or the voltage V is a unit value. Further, in the capacitance of the parallel plate capacitor, ε represents a dielectric constant, A represents the area of the flat plate, and d is the distance between the two flat plates.

It can be seen from the above formula (1) that the magnitude of the impedance Z changes with the magnitude of the capacitance, that is, the higher the capacitance, the lower the impedance value, so that higher RF energy can be generated. And from the above formula (2), the capacitance is proportional to the area A of the flat plate, and inversely proportional to the distance d between the two plates.

Corresponding to the above formulas (1) and (2), in the present embodiment, the first protruding portion 112a and the corresponding second protruding portion 142 have a first interval d1, and each of the first protruding portions 112a and the phase The corresponding second protrusion 142 has a corresponding capacitance. Further, as the area of the first protruding portion 112a and the area of the corresponding second protruding portion 142 are larger, the capacitance is higher. Moreover, the first protruding portions 112a and the second protruding portions 142 form a parallel configuration, so that each of the capacitances is added, and a larger capacitance can be obtained. Under this configuration, when the body 100 is rotated about the axis A1, the conduction member 140 is not in contact with the electrode portion 112 by the design of the above-mentioned conductive member 140 to form a high-power RF power coupling structure. Higher capacitance, which in turn lowers the impedance value, thereby increasing the efficiency of power coupling and producing higher RF energy.

3 to 7 are schematic views showing different embodiments of the carbon brushless rotary plasma electrode structure of the present invention. It should be noted that the carbonless brush rotating plasma electrode structures 200, 300, 400, 500, 600 of FIGS. 3 to 7 are similar to the carbonless brush rotating plasma electrode structure 100 of FIG. 2, wherein the same components are used. The same reference numerals are given to have the same functions and the description thereof will not be repeated, and for convenience of explanation, FIGS. 3 to 7 only show the electrode portion and some members related to the electrode portion, and only differences will be described below.

The difference between FIG. 3 and FIG. 2 is that the number of the first protrusions 242 of each of the conductive members 240 is four, and the first protrusions 212a of each of the electrode portions 212 are located at two corresponding positions. Between the protrusions 242.

4 is different from FIG. 3 in that the conduction member 340 does not have fins in one of the ends of the conduction members 140, 240 as shown in FIGS. 2 to 3. The conducting member 340 is itself a second protruding portion, and the conducting member 340 is located between the corresponding first protruding portions 312a of the electrode portion 312 to form a first protruding portion 312a of the electrode portion 312 to cover a portion of the conducting portion. 340, and the first protrusion 312a does not contact the conduction member 340.

5 is different from FIG. 4 in that one end of the conducting member 440 has a U-shape, that is, the conducting member 440 includes two second protruding portions 442, and the first protruding portion 312a of the electrode portion 312 is located at the first portion. Between the two protrusions 442, a portion of the first protrusion 312a is covered by the second protrusion 442 formed by the through member 440, and the second protrusion 442 does not contact the first protrusion 312a.

The difference between Fig. 6 and Fig. 5 is that the electrode portions 412 are not fin-shaped as in the periphery of the electrode portions 112, 212, and 312 as shown in Figs. 2 to 5 . The electrode portion 412 is itself a first protruding portion, and the electrode portion 412 is located between the two corresponding second protruding portions 442 to form a second protruding portion 442 to cover a portion of the electrode portion 412, and the second protruding portion 442 is not in contact with the electrode 412.

The difference between FIG. 7 and FIG. 6 is that the conduction member 340 itself is the second projection, and the electrode portion 412 itself is the first projection, and the conduction member 340 does not contact the electrode portion 412. It should be noted that the above-mentioned FIGS. 2 to 7 are merely examples, but are not limited to the above embodiments, and the conduction members and the electrode portions of the different embodiments in FIGS. 2 to 7 may be matched with each other.

It should be noted that the first protruding portion 112a in the above FIG. 2 is formed by the annular plate 113 being formed on the electrode portion 112, and the first protruding portion 212a, FIG. 4 and FIG. 5 in FIG. The first protruding portion 312a is also formed by the annular plate 113 being fitted over the electrode portions 212, 312. The manner in which the first projections are formed is not limited here, and is exemplified in Fig. 8 below.

Figure 8 is a schematic view of another embodiment of the brushless rotating plasma electrode structure of the present invention. It should be noted that the carbonless brush rotating plasma electrode structures 100, 200, 300, 400, 500, 600 of FIGS. 2 to 7 are similar to the carbonless brush rotating plasma electrode structure 700 of FIG. The elements are denoted by the same reference numerals and have the same functions and are not repeated. The difference between Fig. 8 and Figs. 2 to 7 is that it is. In the present embodiment, the first protruding portion 512a is formed by processing the milling portion of the electrode portion 512, in other words, the peripheral edge of the electrode portion 512 is processed to form a plurality of grooves, so that a plurality of grooves are formed on the periphery of the electrode portion 512. The first protrusions 512a are fin-shaped, and each of the second protrusions 142 is also located between the two corresponding first protrusions 512a. In this way, a high-power RF power coupling structure can be formed to obtain a higher capacitance, thereby lowering the impedance value, thereby improving the efficiency of power coupling and generating higher RF energy. In addition, the conduction member 140 in FIG. 8 is merely an example, but is not limited to the above embodiment, and the conduction members of the different embodiments in FIGS. 2 to 7 may be matched with the electrode portion 512 in FIG. Similarly, the present invention does not limit the form of the first protruding portion 512a of the electrode portion 512 in FIG. 8, and may also process the peripheral edge of the electrode portion 512. The first projections as shown in Figs. 2 to 5 are formed.

Figure 9 is a schematic view of the coating system of the present invention. In the present embodiment, the coating system 50 is used to perform a coating process or a film deposition on a workpiece 60. The workpiece 60 is, for example, a wafer or a plateable substrate. The coating system 50 includes a carbonless brush rotating plasma electrode structure 100. The structure of the brushless rotating plasma electrode structure 100 is as described in the second embodiment in conjunction with the above description, and the description thereof will not be repeated here. In addition, in other embodiments, the carbonless brush rotating plasma electrode structures 200, 300, 400, 500, 600, 700 shown in FIGS. 3 to 8 may also be applied to the coating system 50, and have the same efficacy.

When the coating system 50 is in operation, since the brushless rotating plasma electrode structure 100 itself forms a high-power RF power coupling structure to generate higher RF energy, the strength of the plasma generation can be increased to the workpiece. 60 is subjected to coating treatment or film deposition.

In summary, in the brushless rotary plasma electrode structure of the present invention, the conductive member is not in contact with the electrode portion to form a high-power RF power coupling structure, thereby improving power. The efficiency of the coupling, which in turn produces higher RF energy. Further, since the conduction member is not in contact with the electrode portion, it is possible to prevent dust from being generated and causing contamination and high temperature to cause an increase in impedance. Further, when the brushless rotating plasma electrode structure is applied to the coating system, the strength generated by the plasma can be increased.

The above description is only intended to describe the preferred embodiments or embodiments of the present invention, which are not intended to limit the scope of the invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.

100‧‧‧Non-carbon brush rotating plasma electrode structure

110‧‧‧ body

112, 114‧‧‧Electrical Department

112a‧‧‧First bulge

113‧‧‧ ring plate

120‧‧‧Guidance

130‧‧‧Isolation Department

140‧‧‧Connecting parts

142‧‧‧second bulge

150‧‧‧RF generator

160‧‧‧Ground electrode

A1‧‧‧ Axis

D1‧‧‧ first interval

D2‧‧‧second interval

Claims (24)

A brushless rotating plasma electrode structure comprising: a body rotating around an axis, the body comprising a plurality of spaced electrode portions, each of the electrode portions being provided with a first protruding portion; a plurality of The guiding portion extends through the electrode portions; the plurality of conducting members, each of the conducting members includes a second protruding portion, and the first protruding portion has a first spacing from the corresponding second protruding portion. The carbon brushless rotary plasma electrode structure of claim 1, further comprising: an RF generator coupled to the corresponding conductive member. The carbon brushless rotary plasma electrode structure of claim 1, further comprising: a partition between the electrode portions. The carbon brushless rotary plasma electrode structure according to claim 1, wherein one end of each of the conducting members has a fin shape, and a peripheral edge of each of the electrode portions is fin-shaped, and the second protruding portion is located at two Corresponding between the first protrusions. The carbon brushless rotary plasma electrode structure according to claim 1, wherein one end of each of the conductive members is fin-shaped, and a periphery of each of the electrode portions is fin-shaped, and the first protruding portion is located at two Corresponding between the second protrusions. The carbon brushless rotary plasma electrode structure of claim 1, wherein each of the conductive members is located between the corresponding first protruding portions, and each of the first protruding portions covers the conductive portion. And the first protrusion is not in contact with the conductive member. The carbon brushless rotary plasma electrode structure according to claim 1, wherein each of the conductive members has a U shape at one end, and the second protruding portion of the conductive member covers the first protruding portion. And the second protrusion does not contact the first protrusion. The carbon brushless rotary plasma electrode structure according to claim 1, wherein each of the conductive members One end of the U-shaped portion, the electrode portion is located between the two corresponding second protruding portions, each of the second protruding portions covers a portion of the electrode portion, and the second protruding portion does not contact the electrode portion . The carbon brushless rotary plasma electrode structure of claim 1, wherein each of the conductive members has a second interval to the corresponding electrode portion, the second interval being greater than 2 mm. The brushless rotating plasma electrode structure of claim 1, wherein the first protrusion is formed on the electrode portion via an annular sleeve. The carbon brushless rotary plasma electrode structure according to claim 1, wherein the first protrusion is formed by machining the groove portion of the electrode portion. The brushless rotating plasma electrode structure of claim 1, wherein the first interval is less than 2 mm. A coating system comprising: a carbonless brush rotating plasma electrode structure, comprising: a body rotating about an axis, the body comprising a plurality of spaced electrode portions, each of the electrode portions having a first periphery a plurality of guiding portions penetrating the electrode portions; and a plurality of conducting members, each of the conducting members comprising a second protruding portion, the first protruding portion and the corresponding second protruding portion The portion has a first interval. The coating system of claim 13 further comprising: an RF generator coupled to the corresponding conductive member. The coating system of claim 13, further comprising: a partition between the electrode portions. The coating system of claim 13, wherein one end of each of the conducting members is in the shape of a fin, the peripheral edge of each of the electrode portions is fin-shaped, and the second protruding portion is located at the corresponding first of the two Between the projections. The coating system of claim 13, wherein one end of each of the conducting members is fin-shaped, the peripheral edge of each of the electrode portions is fin-shaped, and the first protruding portion is located at two corresponding second portions. Between the projections. The coating system of claim 13, wherein each of the conductive members is located between the two corresponding first protruding portions, and each of the first protruding portions covers a portion of the conductive member, and the first The projection is not in contact with the conductive member. The coating system of claim 13, wherein each of the conductive members has a U-shape at one end, and the second protruding portion of the conductive member covers a portion of the first protruding portion, and the second convex portion The outlet does not contact the first projection. The coating system of claim 13, wherein each of the conducting members has a U-shape at one end, the electrode portion is located between the corresponding second protruding portions, and each of the second protruding portions is covered. The electrode portion is not in contact with the electrode portion. The coating system of claim 13, wherein each of the conductive members has a second interval to the corresponding electrode portion, the second interval being greater than 2 mm. The coating system of claim 13, wherein the first projection is formed on the electrode portion via an annular sleeve. The coating system of claim 13, wherein the first projection is formed by machining the milling groove of the electrode portion. The coating system of claim 13, wherein the first interval is less than 2 mm.