CN106163069A - Carbon-brush-free rotary plasma electrode structure and coating system - Google Patents
Carbon-brush-free rotary plasma electrode structure and coating system Download PDFInfo
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- CN106163069A CN106163069A CN201510171039.4A CN201510171039A CN106163069A CN 106163069 A CN106163069 A CN 106163069A CN 201510171039 A CN201510171039 A CN 201510171039A CN 106163069 A CN106163069 A CN 106163069A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 30
- 238000000576 coating method Methods 0.000 title claims abstract description 30
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 28
- 238000002955 isolation Methods 0.000 claims description 7
- 238000003801 milling Methods 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 14
- 238000010586 diagram Methods 0.000 description 8
- 239000000428 dust Substances 0.000 description 7
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 239000004568 cement Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a carbon-brush-free rotating plasma electrode structure and a coating system. The carbon-brush-free rotating plasma electrode structure comprises a body, a plurality of guide parts and a plurality of conducting pieces. The body includes a plurality of electrode portions. The periphery of the electrode part is provided with a first bulge. The guiding part penetrates through the electrode part. Each conducting piece comprises a second protruding part, and a gap is formed between the first protruding part and the second protruding part.
Description
Technical field
The present invention relates to a kind of electrode structure and coating system, and particularly relate to a kind of non-carbonate rotation etc.
Gas ions electrode structure and the coating system comprising non-carbonate rotating plasma electrode structure.
Background technology
Fig. 1 is the schematic diagram of the carbon brush type rotating plasma electrode structure of prior art.Refer to Fig. 1.
The carbon brush type rotating plasma electrode structure 10 of prior art is by two electrode portion 11, two guidance parts
12, isolation part 13, carbon brush 14, RF generator 15 and ground electrode 16 institute by made by graphite
Constitute.Isolation part 13 is between two electrode portions 11.Guidance part 12 is through two electrode portions 12.Carbon
Brush 14 is configured at the periphery in electrode portion 11.RF generator 15 is respectively coupled to phase with ground electrode 16
One end of corresponding carbon brush 14, and the other end of carbon brush 14 contacts with each other with electrode portion 11.
At this under configuration, electrode portion 11 rotates around axle center A1, by carbon brush 14 with by RF
Radio-frequency power produced by generator 15 (RF Power) is transferred to electrode portion 11, and then self-aiming portion 12
Produce plasma so that workpiece (workpiece) is carried out surface process.But, the electrode portion 11 in rotation
Can be rubbed carbon brush 14, therefore can cause frictional heat and produce high temperature, probably has on fire under long time running
Dangerous.
Furthermore, rubbed after carbon brush 14 also can produce dust (particle), and these dust can fall to
Workpiece and produce pollution, and cause the workpiece after Cement Composite Treated by Plasma to have the problem that yield is the best.Existing
Technology has and utilizes dust cover collection dust to fall to the probability of workpiece to reduce dust, but still cannot solve
Electrode portion 11 rubs the problem of the produced high temperature of carbon brush 14 in turn result in impedance rise.It follows that
The carbon brush type rotating plasma electrode structure 10 of prior art also has the problem that impedance is high, so will
The RF energy that can result in is the best.
Summary of the invention
It is an object of the invention to provide a kind of non-carbonate rotating plasma electrode structure, it is that a nothing connects
Touch power coupled structure, can the efficiency of hoisting power coupling, and can avoid dust and produce pollution and
The generation of high temperature and impedance can be reduced.
It is still another object of the present invention to provide a kind of coating system, it includes non-carbonate rotating plasma
Electrode structure, and can be with the efficiency of hoisting power coupling, to produce higher RF energy, and then increase
The intensity that plasma produces.
For reaching above-mentioned purpose, one embodiment of the invention proposes a kind of non-carbonate rotating plasma electrode knot
Structure, including a body, multiple guidance part, multiple conduction element.Body rotates around an axle center, body
Including multiple spaced electrode portions, the periphery in each electrode portion arranges the first protuberance.Guidance part runs through
In electrode portion.Each conduction element includes one second protuberance, the first protuberance and the second corresponding protuberance
There is one first interval.
One embodiment of the invention proposes a kind of coating system, including above-mentioned non-carbonate rotating plasma
Electrode structure.
Based on above-mentioned, in the non-carbonate rotating plasma electrode structure of the present invention, by above-mentioned conducting
The design of part so that conduction element does not contact with electrode portion and forms a high power RF power coupled structure,
The thus efficiency of hoisting power coupling, and then produce higher RF energy.Further by non-carbonate rotation
Turn plasma electrode structure when being used in coating system, the intensity that plasma produces can be increased.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the carbon brush type rotating plasma electrode structure of prior art；
Fig. 2 is the schematic diagram of the non-carbonate rotating plasma electrode structure of the present invention；
Fig. 3 to Fig. 7 is showing of the different embodiments of the non-carbonate rotating plasma electrode structure of the present invention
It is intended to；
Fig. 8 is the schematic diagram of another embodiment of the non-carbonate rotating plasma electrode structure of the present invention；
Fig. 9 is the schematic diagram of the coating system of the present invention.
Symbol description
10 carbon brush type rotating plasma electrode knots
Structure
14 carbon brush
50 coating systems
60 workpiece
100,200,300,400,500,600,700 non-carbonate rotating plasma electrode knot
Structure
110 bodies
11,112,114,212,312,412,512 electrode portion
113 annular slabs
112a, 212a, 312a, 512a first protuberance
12,120 guidance part
13,130 isolation part
140,240,340,440 conduction element
142,242,442 second protuberance
15,150 RF generator
16,160 ground electrode
The area of A flat board
A1 axle center
C electric capacity
D bis-flat board is spaced apart
D1 first is spaced
D2 second is spaced
ε dielectric constant
ω angular frequency
J imaginary unit
The Q quantity of electric charge
V voltage
Z impedance
Detailed description of the invention
Below the most in conjunction with the accompanying drawings and embodiments, the detailed description of the invention of the present invention is further described.With
Lower embodiment is only used for clearly illustrating technical scheme, and can not limit the present invention with this
Protection domain.
Fig. 2 is the schematic diagram of the non-carbonate rotating plasma electrode structure of the present invention.Refer to Fig. 2.
In the present embodiment, non-carbonate rotating plasma electrode structure 100 includes a body 110, multiple leads
Draw isolation part 130, portion 120, multiple conduction element 140, RF generator 150 and ground connection electricity
Pole 160.
Body 110 rotates around an axle center A1, and body 110 includes that multiple (being illustrated as two) is spaced
The electrode portion 112,114 arranged, wherein isolation part 130 is between two electrode portions 112.
Guidance part 120 is through electrode portion 112.Guidance part 120 is e.g. by made by dielectric material
One hollow pipe fitting, forms plasma with guiding ionized gas such as by above-mentioned electrode portion 112,114
Body.
In the present embodiment, described conduction element 140 lays respectively at the periphery in electrode portion 112,114.?
In the present embodiment, the number of conduction element 140 is 4, and two of which conduction element 140 is positioned at the electricity of upper end
The two ends in pole portion 112, two other conduction element 140 is then in the two ends in the electrode portion 114 of lower end.
It should be noted that, above-mentioned conduction element 140 does not contact with electrode portion 112,114.
In the present embodiment, the periphery in electrode portion 112,114 is fin-like.Each electrode portion 112,114
Periphery the first protuberance 112a is set.
In the present embodiment, one end of conduction element 140 is fin-like.Each conduction element 140 includes that second is convex
Go out portion 142.The quantity of the second protuberance 142 that each conduction element 140 is had is 3, and each is years old
Two protuberances 142 between two the first corresponding protuberance 112a, the first protuberance 112a and phase
The second corresponding protuberance 142 has one first interval d1, and wherein the first interval d1 is less than 2mm, with
Produce enough electric capacity.It should be noted that, the present embodiment is not to the quantity of the first protuberance, second convex
The quantity going out portion is any limitation as.
In the present embodiment, the second protuberance 142 of each conduction element 140 to corresponding electrode portion 112,
114 have one second interval d2, and wherein said second interval d2 is more than 2mm, to avoid producing spark.
In the present embodiment, RF generator 150 is coupled to corresponding conduction element 140, i.e. with Fig. 2
For, RF generator 150 is connected to conduction element 140 above, this RF generator 150 frequency
More than 13.56MHZ.Ground electrode 160 is then coupled to be positioned at the conduction element 140 of lower section, using as connecing
Be used.
Below by way of impedance (electrical impedance) relative formula, the present embodiment is described
Non-carbonate rotating plasma electrode structure 100 can form a high power RF power coupled structure.Relevant
Formula is as described below:
In formula (1), Z represents that impedance, j represent that imaginary unit, ω represent that angular frequency, c represent electricity
Hold.
In formula (2), c represents that electric capacity, V represent that voltage, Q represent the quantity of electric charge.Electric capacity c is to measure
When the potential difference at capacitor two ends or voltage V are unit value, it is stored in the quantity of electric charge Q of electrode for capacitors.
Further, for the capacitance of plane-parallel capacitor, ε represents that dielectric constant, A represent flat board
Area, and d is that two flat boards are spaced apart.
From above-mentioned formula (1), the size of impedance Z can change along with the size of capacitance, namely
Saying, if capacitance is the highest, resistance value also can and then reduce, and the most just can produce higher RF energy.
And from above-mentioned formula (2), the area A of capacitance and flat board is directly proportional, and between two flat boards
Distance d is inversely proportional to.
Corresponding above-mentioned formula (1), (2) understand, and in the present embodiment, the first protuberance 112a is with corresponding
The second protuberance 142 there is the first interval d1, each first protuberance 112a and corresponding
Two protuberances 142 have the capacitance of a correspondence.Further, if the area of the first protuberance 112a and phase
The area of the second corresponding protuberance 142 is the biggest, then capacitance is the highest.Furthermore, these first protuberances
112a forms a kenel in parallel with these second protuberances 142, the most again by each capacitance
It is added, and bigger capacitance can be obtained.At this under configuration, when body 100 enters around axle center A1
Row rotate time, by the design of above-mentioned conduction element 140 so that conduction element 140 not with electrode portion 112
Contact, can obtain higher capacitance to form a high power RF power coupled structure, and then fall
Low impedance value, thus carrys out the efficiency of hoisting power coupling, and produces higher RF energy.
Fig. 3 to Fig. 7 is the signal of the different embodiments of the present invention non-carbonate rotating plasma electrode structure
Figure.It should be noted that, the non-carbonate rotating plasma electrode structure of Fig. 3 to Fig. 7 200,300,400,
500,600 element similar, the most identical to the non-carbonate rotating plasma electrode structure 100 of Fig. 2
Represent with identical label and there is identical effect and explanation is not repeated, and, for convenience of description,
Fig. 3 to Fig. 7 only shows at electrode portion and the partial component relevant to electrode portion, the most only explanation difference.
The difference of Fig. 3 with Fig. 2 is, the first protuberance 242 that each conduction element 240 is had
Quantity is 4, and it is corresponding first convex that the first protuberance 212a in each electrode portion 212 is positioned at two
Go out between portion 242.
The difference of Fig. 4 with Fig. 3 is, conduction element 340 does not have leading as shown in Figure 2 to Figure 3
One end of logical part 140,240 is in fin-like.Conduction element 340 inherently the second protuberance, and lead
Logical part 340 is between the two first corresponding protuberance 312a in electrode portion 312, to form electrode
The first protuberance 312a covered section conduction element 340 in portion 312, and the first protuberance 312a do not connects
Touch in conduction element 340.
The difference of Fig. 5 with Fig. 4 is, one end of conduction element 440 is ㄇ font, i.e. a conduction element
440 include two the second protuberances 442, and the first protuberance 312a in electrode portion 312 to be positioned at second convex
Go out between portion 442, convex to form the second protuberance 442 covered section first that conduction element 440 had
Go out portion 312a, and the second protuberance 442 is not contacted with the first protuberance 312a.
The difference of Fig. 6 with Fig. 5 is, there is not electricity as shown in Figures 2 to 5 in electrode portion 412
The periphery in pole portion 112,212,312 is in fin-like.Electrode portion 412 inherently the first protuberance,
And electrode portion 412 is between two the second corresponding protuberances 442, to form the second protuberance 442
Covered section electrode portion 412, and the second protuberance 442 is not contacted with electrode portion 412.
The difference of Fig. 7 with Fig. 6 is, conduction element 340 inherently the second protuberance, and electrode
Portion 412 inherently the first protuberance, conduction element 340 not in contact with electrode portion 412.It should be noted that,
Above-mentioned Fig. 2 to Fig. 7 is merely illustrative, but is not limited to above-described embodiment, it is possible to by different in Fig. 2 to Fig. 7
The conduction element of embodiment is collocated with each other with electrode portion.
It should be noted that, the first protuberance 112a in above-mentioned Fig. 2 is enclosed within electrode by an annular slab 113
Portion 112 is formed, and the first protuberance in first protuberance 212a, Fig. 4 in Fig. 3 and Fig. 5
312a is also to be enclosed within electrode portion 212,312 via annular slab 113 to be formed.First it is not intended to convex at this
Go out the generation type in portion, illustrate it with Fig. 8 below.
Fig. 8 is the schematic diagram of another embodiment of the non-carbonate rotating plasma electrode structure of the present invention.
It should be noted that, the non-carbonate rotating plasma electrode structure of Fig. 2 to Fig. 7 100,200,300,
400,500,600 is similar to the non-carbonate rotating plasma electrode structure 700 of Fig. 8, the most identical
Element represent with identical label and there is identical effect and explanation is not repeated.Fig. 8 Yu Fig. 2 is extremely
Fig. 7 difference is.In the present embodiment, the first protuberance 512a is processed by electrode portion 512
Groove milling and formed, in other words, will electrode portion 512 periphery processing and form multiple groove so that
The periphery in electrode portion 512 is formed has multiple first protuberance 512a and in fin-like, each is second years old
Protuberance 142 also is located between two the first corresponding protuberance 512a.So it also is able to form one high
Power RF power coupled structure and higher capacitance can be obtained, and then reduce resistance value, thus come
The efficiency of hoisting power coupling, and produce higher RF energy.Additionally, the conduction element 140 in Fig. 8
Merely illustrative, but it is not limited to above-described embodiment, it is possible to by the conduction element of embodiments different in Fig. 2 to Fig. 7
It is collocated with each other with the electrode portion 512 in Fig. 8.Similarly, the electrode portion that the present invention is also not intended in Fig. 8
The form of the first protuberance 512a of 512, it is possible to formed such as via the periphery in electrode portion 512 is processed
The first protuberance shown in Fig. 2 to Fig. 5.
Fig. 9 is the schematic diagram of the coating system of the present invention.In the present embodiment, coating system 50 in order to
Coating film treatment or thin film deposition are carried out for a workpiece 60.Described workpiece 60 e.g. wafer or can plate
Base material.Coating system 50 includes non-carbonate rotating plasma electrode structure 100.Non-carbonate rotate wait from
Daughter electrode structure 100 specific embodiment structure such as Fig. 2 coordinates described above described, is not repeated at this
Explanation.Additionally, in other embodiments, it is possible to by the non-carbonate rotating plasma shown in Fig. 3 to Fig. 8
Body electrode structure 200,300,400,500,600,700 applies to coating system 50, also has identical
Effect.
When coating system 50 operates, due to non-carbonate rotating plasma electrode structure 100
Figure becomes high power RF power coupled structure, to produce higher RF energy, the most just can increase
The intensity that plasma produces, carries out coating film treatment or thin film deposition to described workpiece 60.
In sum, in the non-carbonate rotating plasma electrode structure of the present invention, by above-mentioned conducting
The design of part so that conduction element does not contact with electrode portion and forms a high power RF power coupled structure,
The thus efficiency of hoisting power coupling, and then produce higher RF energy.Furthermore, due to conduction element also
Do not contact with electrode portion, therefore dust can be avoided and produce the generation of pollution and high temperature and cause impedance rise.
When further non-carbonate rotating plasma electrode structure being used in coating system, plasma can be increased
The intensity that body produces.
The above, being preferable to carry out of the technological means that only notebook invention is used by presenting solution problem
Mode or embodiment, be not used for limiting the scope of patent working of the present invention.The most all special with the present invention
Profit application range context is consistent, or the equalization done according to the scope of the claims of the present invention changes and modifies, and is all this
Patent of invention scope is contained.
Claims (24)
1. a non-carbonate rotating plasma electrode structure, including:
Body, it rotates around an axle center, and this body includes multiple spaced electrode portion, respectively should
The periphery in electrode portion arranges one first protuberance；
Multiple guidance parts, through those electrode portions；
Multiple conduction elements, respectively this conduction element includes the second protuberance, and this first protuberance should with corresponding
Second protuberance has the first interval.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, also includes:
RF generator, is coupled to this corresponding conduction element.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, also includes:
Isolation part, between those electrode portions.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
One end be fin-like, respectively the periphery in this electrode portion is fin-like, and this second protruding parts is corresponding in two
This first protuberance between.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
One end be fin-like, respectively the periphery in this electrode portion is fin-like, and this first protruding parts is corresponding in two
This second protuberance between.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
Between two these corresponding first protuberances, respectively this first protuberance this conduction element of covered section, and
This first protuberance is not contacted with this conduction element.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
One end is ㄇ font, this this first protuberance of the second protuberance covered section that this conduction element is had, and
This second protuberance is not contacted with this first protuberance.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
One end is ㄇ font, this electrode area between two these corresponding second protuberances, respectively this second protrude
This electrode portion of portion's covered section, and this second protuberance is not contacted with this electrode portion.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, respectively this conduction element
Have one second interval to this corresponding electrode portion, this second interval is more than 2mm.
Non-carbonate rotating plasma electrode structure the most as claimed in claim 1, wherein this is first convex
Going out portion is to be enclosed within this electrode portion via an annular slab to be formed.
11. non-carbonate rotating plasma electrode structures as claimed in claim 1, wherein this is first convex
Going out portion is to be formed by the processed groove milling in electrode portion.
12. non-carbonate rotating plasma electrode structures as claimed in claim 1, wherein this is between first
Every less than 2mm.
13. 1 kinds of coating systems, including:
Non-carbonate rotating plasma electrode structure, including:
Body, it rotates around an axle center, and this body includes multiple spaced electrode portion,
Respectively the periphery in this electrode portion arranges one first protuberance；
Multiple guidance parts, through those electrode portions；And
Multiple conduction elements, respectively this conduction element includes the second protuberance, and this first protuberance is with corresponding
This second protuberance there is the first interval.
14. coating systems as claimed in claim 13, also include:
RF generator, is coupled to this corresponding conduction element.
15. coating systems as claimed in claim 13, also include:
Isolation part, between those electrode portions.
16. coating systems as claimed in claim 13, respectively one end of this conduction element is fin-like,
Respectively the periphery in this electrode portion is fin-like, this second protruding parts in two these corresponding first protuberances it
Between.
17. coating systems as claimed in claim 13, respectively one end of this conduction element is fin-like,
Respectively the periphery in this electrode portion is fin-like, this first protruding parts in two these corresponding second protuberances it
Between.
18. coating systems as claimed in claim 13, respectively this conduction element is positioned at two corresponding being somebody's turn to do
Between first protuberance, respectively this first protuberance this conduction element of covered section, and this first protuberance is not
It is contacted with this conduction element.
19. coating systems as claimed in claim 13, respectively this conduction element one end is ㄇ font, should
This this first protuberance of the second protuberance covered section that conduction element is had, and this second protuberance is not
It is contacted with this first protuberance.
20. coating systems as claimed in claim 13, respectively this conduction element one end is ㄇ font, should
Electrode area between two these corresponding second protuberances, respectively this second protuberance this electrode of covered section
Portion, and this second protuberance is not contacted with this electrode portion.
21. coating systems as claimed in claim 13, respectively this conduction element is to this corresponding electrode
Portion has the second interval, and this second interval is more than 2mm.
22. coating systems as claimed in claim 13, wherein this first protuberance is via an annular slab
It is enclosed within this electrode portion to be formed.
23. coating systems as claimed in claim 13, wherein this first protuberance is through adding by electrode portion
Work groove milling and formed.
24. coating systems as claimed in claim 13, wherein this first interval is less than 2mm.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104101506 | 2015-01-16 | ||
| TW104101506A TWI530584B (en) | 2015-01-16 | 2015-01-16 | Brushless rotray plasma electrode structure and film coating system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106163069A true CN106163069A (en) | 2016-11-23 |
| CN106163069B CN106163069B (en) | 2018-10-26 |
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ID=56361495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510171039.4A Active CN106163069B (en) | 2015-01-16 | 2015-04-13 | Carbon-brush-free rotary plasma electrode structure and coating system |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20160208403A1 (en) |
| CN (1) | CN106163069B (en) |
| TW (1) | TWI530584B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108461387A (en) * | 2018-03-19 | 2018-08-28 | 北京北方华创微电子装备有限公司 | RF power fed-in mechanism, rotating basis device and semiconductor processing equipment |
| WO2019179159A1 (en) * | 2018-03-19 | 2019-09-26 | 北京北方华创微电子装备有限公司 | Power feeding mechanism, rotating base apparatus, and semiconductor processing device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3246935A1 (en) * | 2016-05-20 | 2017-11-22 | Meyer Burger (Germany) AG | Plasma processing device with a contactless rf voltage feed to a movable plasma electrode unit and method for operating such a plasma processing device |
| JP2020177756A (en) * | 2019-04-16 | 2020-10-29 | 株式会社アルバック | Plasma processing apparatus |
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| JP3295310B2 (en) * | 1995-08-08 | 2002-06-24 | 三洋電機株式会社 | High-speed film forming method and apparatus using rotating electrode |
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| JP4319755B2 (en) * | 2000-01-28 | 2009-08-26 | Ｔｄｋ株式会社 | Plasma processing equipment |
| JP2010141194A (en) * | 2008-12-12 | 2010-06-24 | Seiko Epson Corp | Plasma processing apparatus and plasma processing method |
| DE202014100594U1 (en) * | 2014-02-11 | 2014-03-10 | Von Ardenne Gmbh | End block assembly |
-
2015
- 2015-01-16 TW TW104101506A patent/TWI530584B/en active
- 2015-04-13 CN CN201510171039.4A patent/CN106163069B/en active Active
- 2015-09-01 US US14/842,316 patent/US20160208403A1/en not_active Abandoned
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|---|---|---|---|---|
| JP3295310B2 (en) * | 1995-08-08 | 2002-06-24 | 三洋電機株式会社 | High-speed film forming method and apparatus using rotating electrode |
| JP4319755B2 (en) * | 2000-01-28 | 2009-08-26 | Ｔｄｋ株式会社 | Plasma processing equipment |
| CN1719964A (en) * | 2005-05-31 | 2006-01-11 | 王晓臣 | Rotary corona discharge low temp plasma source apparatus |
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| DE202014100594U1 (en) * | 2014-02-11 | 2014-03-10 | Von Ardenne Gmbh | End block assembly |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108461387A (en) * | 2018-03-19 | 2018-08-28 | 北京北方华创微电子装备有限公司 | RF power fed-in mechanism, rotating basis device and semiconductor processing equipment |
| WO2019179159A1 (en) * | 2018-03-19 | 2019-09-26 | 北京北方华创微电子装备有限公司 | Power feeding mechanism, rotating base apparatus, and semiconductor processing device |
| CN108461387B (en) * | 2018-03-19 | 2020-06-19 | 北京北方华创微电子装备有限公司 | Power feed-in mechanism, rotating base device and semiconductor processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201627527A (en) | 2016-08-01 |
| CN106163069B (en) | 2018-10-26 |
| TWI530584B (en) | 2016-04-21 |
| US20160208403A1 (en) | 2016-07-21 |
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