CN106163069B - Carbon-brush-free rotary plasma electrode structure and coating system - Google Patents
Carbon-brush-free rotary plasma electrode structure and coating system Download PDFInfo
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- CN106163069B CN106163069B CN201510171039.4A CN201510171039A CN106163069B CN 106163069 B CN106163069 B CN 106163069B CN 201510171039 A CN201510171039 A CN 201510171039A CN 106163069 B CN106163069 B CN 106163069B
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- 239000011248 coating agent Substances 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims abstract description 29
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 37
- 238000002955 isolation Methods 0.000 claims description 7
- 238000003801 milling Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 14
- 238000010586 diagram Methods 0.000 description 10
- 239000000428 dust Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 230000005611 electricity Effects 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
Abstract
The invention discloses a carbon-brush-free rotating plasma electrode structure and a coating system. The carbon-brush-free rotating plasma electrode structure comprises a body, a plurality of guide parts and a plurality of conducting pieces. The body includes a plurality of electrode portions. The periphery of the electrode part is provided with a first bulge. The guiding part penetrates through the electrode part. Each conducting piece comprises a second protruding part, and a gap is formed between the first protruding part and the second protruding part.
Description
Technical field
The present invention relates to a kind of electrode structure and coating systems, and more particularly to a kind of non-carbonate rotating plasma electricity
Pole structure and the coating system for including non-carbonate rotating plasma electrode structure.
Background technology
Fig. 1 is the schematic diagram of the carbon brush type rotating plasma electrode structure of the prior art.It please refers to Fig.1.
The carbon brush type rotating plasma electrode structure 10 of the prior art is by two electrode portions 11, two guidance parts 12, isolation part
13, it is made of carbon brush 14, RF generators 15 and the grounding electrode 16 made by graphite.Isolation part 13 is located at two electrode portions 11
Between.Guidance part 12 is through two electrode portions 12.Carbon brush 14 is configured at the periphery of electrode portion 11.RF generators 15 and grounding electrode
16 are respectively coupled to one end of corresponding carbon brush 14, and the other end of carbon brush 14 is in contact with each other with electrode portion 11.
Herein under configuration, electrode portion 11 is rotated around axle center A1, by carbon brush 14 with will be produced by RF generators 15
Radio-frequency power (RF Power) be transferred to electrode portion 11, and then self-aiming portion 12 generates plasma with to workpiece
(workpiece) it is surface-treated.However, the electrode portion 11 in rotation can rub to carbon brush 14, therefore frictional heat can be led to
And high temperature is generated, probably there is danger on fire under long time running.
Furthermore the carbon brush 14 after rubbed also will produce dust (particle), and these dust can fall to workpiece and
Pollution is generated, and the workpiece after corona treatment is caused to have the bad problem of yield.Have in the prior art and utilizes dust cover
Dust is collected to reduce the probability that dust falls to workpiece, but still high temperature produced by the friction carbon brush 14 of electrode portion 11 can not be solved
Problem simultaneously in turn results in impedance rise.It follows that the carbon brush type rotating plasma electrode structure 10 of the prior art also has
The high problem of impedance will so cause the RF energy generated bad.
Invention content
The purpose of the present invention is to provide a kind of non-carbonate rotating plasma electrode structures, are a non-contact type power
Coupled structure, can hoisting power coupling efficiency, and can avoid dust and generate pollution and the generation of high temperature and resistance can be reduced
It is anti-.
It is still another object of the present invention to provide a kind of coating systems comprising non-carbonate rotating plasma electrode knot
Structure, and the efficiency that can be coupled with hoisting power, to generate higher RF energy, and then increase the intensity that plasma generates.
In order to achieve the above object, one embodiment of the invention proposes a kind of non-carbonate rotating plasma electrode structure, including
One ontology, multiple guidance parts, multiple conduction elements.Ontology is rotated around an axle center, and ontology includes multiple spaced electrodes
The first protrusion is arranged in the periphery in portion, each electrode portion.Guidance part is through electrode portion.Each conduction element includes one second protrusion,
First protrusion has one first interval with corresponding second protrusion.
One embodiment of the invention proposes a kind of coating system, including above-mentioned non-carbonate rotating plasma electrode knot
Structure.
Based on above-mentioned, in the non-carbonate rotating plasma electrode structure of the present invention, by the design of above-mentioned conduction element,
So that conduction element does not contact with electrode portion and forms a high power RF power coupled structures, the effect that thus hoisting power couples
Rate, and then generate higher RF energy.When non-carbonate rotating plasma electrode structure being further used in coating system,
The intensity of plasma generation can be increased.
Description of the drawings
Fig. 1 is the schematic diagram of the carbon brush type rotating plasma electrode structure of the prior art；
Fig. 2 is the schematic diagram of the non-carbonate rotating plasma electrode structure of the present invention；
Fig. 3 to Fig. 7 is the schematic diagram of the different embodiments of the non-carbonate rotating plasma electrode structure of the present invention；
Fig. 8 is the schematic diagram of another embodiment of the non-carbonate rotating plasma electrode structure of the present invention；
Fig. 9 is the schematic diagram of the coating system of the present invention.
Symbol description
10 carbon brush type rotating plasma electrode knots
Structure
14 carbon brush
50 coating systems
60 workpiece
100,200,300,400,500,600,700 non-carbonate rotating plasma electrode structure
110 ontologies
11,112,114,212,312,412,512 electrode portion
113 annular slabs
The first protrusion of 112a, 212a, 312a, 512a
12,120 guidance part
13,130 isolation part
140,240,340,440 conduction element
142,242,442 second protrusion
15,150 RF generators
16,160 grounding electrode
The area of A tablets
The axle center A1
C capacitances
The distance at the bis- tablet intervals d
D1 first is spaced
D2 second is spaced
ε dielectric constants
ω angular frequencies
J imaginary units
The Q quantities of electric charge
V voltages
Z impedances
Specific implementation mode
Below sincerely in conjunction with the accompanying drawings and embodiments, the specific implementation mode of the present invention is further described.Following embodiment
It is only used for clearly illustrating technical scheme of the present invention, and cannot be limited the scope of the invention with this.
Fig. 2 is the schematic diagram of the non-carbonate rotating plasma electrode structure of the present invention.Please refer to Fig. 2.In the present embodiment
In, non-carbonate rotating plasma electrode structure 100 includes an ontology 110, multiple guidance parts 120, an isolation part 130, multiple
Conduction element 140, a RF generators 150 and a grounding electrode 160.
Ontology 110 is rotated around an axle center A1, and ontology 110 includes multiple (being illustrated as two) spaced electrode portions
112,114, wherein isolation part 130 is between two electrode portions 112.
Guidance part 120 is through electrode portion 112.Guidance part 120 be, for example, by the hollow pipe fitting made by dielectric material,
With guiding such as ionized gas plasma is formed by above-mentioned electrode portion 112,114.
In the present embodiment, the conduction element 140 is located at the periphery of electrode portion 112,114.In the present embodiment, it leads
The number of parts 140 is 4, and two of which conduction element 140 is located at the both ends of the electrode portion 112 of upper end, and other two is connected
Part 140 is then the both ends of the electrode portion 114 positioned at lower end.It should be noted that above-mentioned conduction element 140 not with electrode portion 112,
114 contacts.
In the present embodiment, the periphery of electrode portion 112,114 is in fin-like.The periphery setting the of each electrode portion 112,114
One protrusion 112a.
In the present embodiment, one end of conduction element 140 is in fin-like.Each conduction element 140 includes the second protrusion 142.Respectively
The quantity of second protrusion 142 possessed by conduction element 140 is 3, each second protrusion 142 is located at two corresponding the
Between one protrusion 112a, the first protrusion 112a has one first interval d1 with corresponding second protrusion 142, wherein the
One interval d1 is less than 2mm, to generate enough capacitances.It should be noted that the present embodiment is not to the quantity of the first protrusion,
The quantity of two protrusions limits.
In the present embodiment, the second protrusion 142 of each conduction element 140 to corresponding electrode portion 112,114 has one
Second interval d2, wherein the second interval d2 is more than 2mm, to avoid spark is generated.
In the present embodiment, RF generators 150 are coupled to corresponding conduction element 140, i.e., with Fig. 2 for, RF generators
150 are connected to the conduction element 140 being located above, which is more than 13.56MHZ.Grounding electrode 160 then couples
In underlying conduction element 140, to be used as ground connection.
Illustrate the carbon-free of the present embodiment below by way of impedance (electrical impedance) relative formula
Brush rotating plasma electrode structure 100 can form a high power RF power coupled structures.Correlation formula is as described below：
In formula (1), Z indicates that impedance, j indicate that imaginary unit, ω indicate that angular frequency, c indicate capacitance.
In formula (2), c indicates that capacitance, V indicate that voltage, Q indicate the quantity of electric charge.Capacitance c is to measure to work as capacitor both ends
When potential difference or voltage V are unit value, it is stored in the quantity of electric charge Q of electrode for capacitors.Further, in the electricity of plane-parallel capacitor
For capacity, ε indicates dielectric constant, and A indicates the area of tablet, and d is the distance at two tablet intervals.
By above-mentioned formula (1) it is found that the size of impedance Z can change with the size of capacitance, that is to say, that capacitance
If higher, impedance value also can be reduced and then, just can so generate higher RF energy.And by above-mentioned formula (2) it is found that electricity
The area A of capacity and tablet is directly proportional and the distance between two tablets d is inversely proportional.
Corresponding above-mentioned formula (1), (2) are it is found that in the present embodiment, the first protrusion 112a and corresponding second protrudes
There is the first interval d1, each first protrusion 112a to have a corresponding electricity with corresponding second protrusion 142 in portion 142
Capacity.Also, if the area of the first protrusion 112a and the area of corresponding second protrusion 142 are bigger, and capacitance is got over
It is high.Furthermore these the first protrusion 112a form a kenel in parallel with these second protrusions 142, thus again will be every
One capacitance is added, and can obtain larger capacitance.Herein under configuration, when ontology 100 is rotated around axle center A1
When, pass through the design of above-mentioned conduction element 140 so that conduction element 140 is not contacted with electrode portion 112, to form a high power RF
Power coupled structure and higher capacitance can be obtained, and then reduce impedance value, thus come hoisting power coupling efficiency, and
Generate higher RF energy.
Fig. 3 to Fig. 7 is the schematic diagram of the different embodiments of the non-carbonate rotating plasma electrode structure of the present invention.It needs to illustrate
, the non-carbonate rotation of the non-carbonate rotating plasma electrode structure 200,300,400,500,600 and Fig. 2 of Fig. 3 to Fig. 7
Plasma electrode structure 100 is similar, wherein identical element indicated with identical label and effect having the same and no longer
Repeated explanation, also, for convenience of description, Fig. 3 to Fig. 7 only show electrode portion and with the relevant partial component of electrode portion, with
Under only illustrate at difference.
Fig. 3 the difference from Fig. 2 is that, the quantity of the first protrusion 242 possessed by each conduction element 240 be 4, often
First protrusion 212a of one electrode portion 212 is between two corresponding first protrusions 242.
Fig. 4 the difference from Fig. 3 is that, conduction element 340 is not just like Fig. 2 to conduction element 140,240 shown in Fig. 3
One end is in fin-like.Inherently the second protrusion of conduction element 340, and two that conduction element 340 is located at electrode portion 312 are corresponding
The first protrusion 312a between, to form the first protrusion 312a covered sections conduction element 340 of electrode portion 312, and first
Protrusion 312a is not contacted with conduction element 340.
Fig. 5 the difference from Fig. 4 is that, one end of conduction element 440 is in a ㄇ fonts, i.e., conduction element 440 includes two
Second protrusion 442, and the first protrusion 312a of electrode portion 312 is between the second protrusion 442, to form conduction element
Second protrusion, 442 covered section the first protrusion 312a possessed by 440, and the second protrusion 442 is not contacted with first
Protrusion 312a.
Fig. 6 the difference from Fig. 5 is that, electrode portion 412 not just like electrode portion shown in Fig. 2 to Fig. 5 112,212,
312 periphery is in fin-like.Inherently the first protrusion of electrode portion 412, and electrode portion 412 is located at two corresponding second
Between protrusion 442, to form 442 covered section electrode portion 412 of the second protrusion, and the second protrusion 442 is not contacted with
Electrode portion 412.
Fig. 7 the difference from Fig. 6 is that, inherently the second protrusion of conduction element 340, and electrode portion 412 is inherently
It is the first protrusion, conduction element 340 and not in contact with electrode portion 412.It should be noted that above-mentioned Fig. 2 to Fig. 7 is merely illustrative, but not
It is limited to above-described embodiment, the conduction element of different embodiments in Fig. 2 to Fig. 7 can be also collocated with each other with electrode portion.
It should be noted that the first protrusion 112a in above-mentioned Fig. 2 is sleeved on electrode portion 112 by an annular slab 113 and is formed,
And the first protrusion 312a in first protrusion 212a, Fig. 4 and Fig. 5 in Fig. 3 is also to be sleeved on electrode portion via annular slab 113
212, it 312 is formed.It does not limit the generation type of the first protrusion herein, it is illustrated with Fig. 8 below.
Fig. 8 is the schematic diagram of another embodiment of the non-carbonate rotating plasma electrode structure of the present invention.It should be noted
It is the non-carbonate rotation of the non-carbonate rotating plasma electrode structure 100,200,300,400,500,600 and Fig. 8 of Fig. 2 to Fig. 7
It is similar to turn plasma electrode structure 700, wherein identical element indicated with identical label and effect having the same without
Repeat explanation.Fig. 8 and Fig. 2 to Fig. 7 the difference is that.In the present embodiment, the first protrusion 512a is passed through by electrode portion 512
It processes groove milling and is formed, in other words, the periphery of electrode portion 512 is processed and forms multiple grooves so that in electrode portion 512
Periphery, which is formed, to be had multiple first protrusion 512a and is in fin-like, and it is corresponding that each second protrusion 142 also is located at two
Between first protrusion 512a.So it can also form a high power RF power coupled structure and higher capacitance can be obtained
Amount, and then impedance value is reduced, thus carry out the efficiency of hoisting power coupling, and generate higher RF energy.In addition, leading in Fig. 8
Parts 140 are merely illustrative, but are not limited to the above embodiments, also can will be in Fig. 2 to Fig. 7 in the conduction element and Fig. 8 of different embodiments
Electrode portion 512 be collocated with each other.Similarly, the present invention also it is unlimited drawing 8 in electrode portion 512 the first protrusion 512a shape
Formula also can form the first protrusion as shown in Figures 2 to 5 via the periphery of electrode portion 512 is processed.
Fig. 9 is the schematic diagram of the coating system of the present invention.In the present embodiment, coating system 50 is to for a workpiece 60
Carry out coating film treatment or film deposition.The e.g. chip of the workpiece 60 can plate base material.Coating system 50 includes non-carbonate
Rotating plasma electrode structure 100.Such as Fig. 2 cooperations of 100 specific embodiment structures of non-carbonate rotating plasma electrode structure
Described above described, this will not be repeated here.It, also can be by Fig. 3 to shown in Fig. 8 non-carbonate in addition, in other embodiments
Rotating plasma electrode structure 200,300,400,500,600,700 applies to coating system 50, also there is identical effect.
When coating system 50 is operated, since non-carbonate rotating plasma electrode structure 100 itself forms Gao Gong
Rate RF power coupled structures just can so increase the intensity of plasma generation, to described to generate higher RF energy
Workpiece 60 carries out coating film treatment or film deposition.
In conclusion in the non-carbonate rotating plasma electrode structure of the present invention, by the design of above-mentioned conduction element,
So that conduction element does not contact with electrode portion and forms a high power RF power coupled structures, the effect that thus hoisting power couples
Rate, and then generate higher RF energy.Furthermore since conduction element is not contacted with electrode portion, therefore it can avoid dust and generate dirt
It contaminates the generation with high temperature and causes impedance rise.Non-carbonate rotating plasma electrode structure is further used in plating membrane system
When system, the intensity of plasma generation can be increased.
The above only records the preferred embodiment or reality of technological means used by the present invention solves the problems, such as presentation
Example is applied, not is used for limiting the range of patent working of the present invention.It is i.e. all to be consistent with present patent application range context, or
According to the equivalent changes and modifications that the scope of the claims of the present invention is done, all covered by the scope of the claims of the present invention.
Claims (24)
1. a kind of non-carbonate rotating plasma electrode structure, including：
Ontology is rotated around an axle center, which includes multiple spaced electrode portions, and respectively the periphery of the electrode portion is set
Set one first protrusion；
Multiple guidance parts form plasma with directing ion gas through those electrode portions by above-mentioned electrode portion；
Multiple conduction elements, respectively the conduction element includes the second protrusion, which has with corresponding second protrusion
There is the first interval, to generate a capacitance；
When the ontology rotates, multiple conduction element is not contacted with the electrode portion, to form a high power RF power coupled structures
And obtain high-capacitance.
2. non-carbonate rotating plasma electrode structure as described in claim 1, further includes：
RF generators are coupled to the corresponding conduction element.
3. non-carbonate rotating plasma electrode structure as described in claim 1, further includes：
Isolation part, between those electrode portions.
4. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively one end of the conduction element is in fin
Shape, respectively the periphery of the electrode portion is in fin-like, and second protruding parts is between two corresponding first protrusions.
5. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively one end of the conduction element is in fin
Shape, respectively the periphery of the electrode portion is in fin-like, and first protruding parts is between two corresponding second protrusions.
6. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively the conduction element is corresponding positioned at two
First protrusion between, each the first protrusion covered section conduction element, and first protrusion is not contacted with this
Conduction element.
7. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively the conduction element one end is in ㄇ fonts,
The second protrusion covered section, first protrusion possessed by the conduction element, and second protrusion be not contacted with this
One protrusion.
8. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively the conduction element one end is in ㄇ fonts,
The electrode area is between two corresponding second protrusions, each the second protrusion covered section electrode portion, and this
Two protrusions are not contacted with the electrode portion.
9. non-carbonate rotating plasma electrode structure as described in claim 1, wherein respectively the conduction element is somebody's turn to do to corresponding
Electrode portion has one second interval, which is more than 2mm.
10. non-carbonate rotating plasma electrode structure as described in claim 1, wherein first protrusion is via a ring
Shape sleeve-board is formed in the electrode portion.
11. non-carbonate rotating plasma electrode structure as described in claim 1, wherein first protrusion is by electrode portion
Processed groove milling and formed.
12. non-carbonate rotating plasma electrode structure as described in claim 1, wherein first interval are less than 2mm.
13. a kind of coating system, including：
Non-carbonate rotating plasma electrode structure, including：
Ontology is rotated around an axle center, which includes multiple spaced electrode portions, and respectively the periphery of the electrode portion is set
Set one first protrusion；
Multiple guidance parts form plasma with directing ion gas through those electrode portions by above-mentioned electrode portion；
And
Multiple conduction elements, respectively the conduction element includes the second protrusion, which has with corresponding second protrusion
There is the first interval, to generate a capacitance；
When the ontology rotates, multiple conduction element is not contacted with the electrode portion, to form a high power RF power coupled structures
And obtain high-capacitance.
14. coating system as claimed in claim 13, further includes：
RF generators are coupled to the corresponding conduction element.
15. coating system as claimed in claim 13, further includes：
Isolation part, between those electrode portions.
16. coating system as claimed in claim 13, wherein respectively one end of the conduction element is in fin-like, each week of the electrode portion
Edge is in fin-like, and second protruding parts is between two corresponding first protrusions.
17. coating system as claimed in claim 13, wherein respectively one end of the conduction element is in fin-like, each week of the electrode portion
Edge is in fin-like, and first protruding parts is between two corresponding second protrusions.
18. coating system as claimed in claim 13, wherein respectively the conduction element be located at two corresponding first protrusions it
Between, each the first protrusion covered section conduction element, and first protrusion is not contacted with the conduction element.
19. coating system as claimed in claim 13, wherein respectively the conduction element one end is in ㄇ fonts, possessed by the conduction element
The second protrusion covered section, first protrusion, and second protrusion is not contacted with first protrusion.
20. coating system as claimed in claim 13, wherein respectively the conduction element one end is in ㄇ fonts, the electrode area is in two-phase
Between corresponding second protrusion, each the second protrusion covered section electrode portion, and second protrusion and not in contact with
In the electrode portion.
21. coating system as claimed in claim 13, wherein respectively the conduction element to corresponding electrode portion has between second
Every second interval is more than 2mm.
22. coating system as claimed in claim 13, wherein first protrusion are to be sleeved on the electrode portion via an annular slab
It is formed.
23. coating system as claimed in claim 13, wherein first protrusion are formed by the processed groove milling of electrode portion.
24. coating system as claimed in claim 13, wherein first interval are less than 2mm.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104101506 | 2015-01-16 | ||
| TW104101506A TWI530584B (en) | 2015-01-16 | 2015-01-16 | Brushless rotray plasma electrode structure and film coating system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106163069A CN106163069A (en) | 2016-11-23 |
| CN106163069B true CN106163069B (en) | 2018-10-26 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510171039.4A Active CN106163069B (en) | 2015-01-16 | 2015-04-13 | Carbon-brush-free rotary plasma electrode structure and coating system |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20160208403A1 (en) |
| CN (1) | CN106163069B (en) |
| TW (1) | TWI530584B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3246935A1 (en) * | 2016-05-20 | 2017-11-22 | Meyer Burger (Germany) AG | Plasma processing device with a contactless rf voltage feed to a movable plasma electrode unit and method for operating such a plasma processing device |
| SG11202008819VA (en) * | 2018-03-19 | 2020-10-29 | Beijing Naura Microelectronics Equipment Co Ltd | Power feeding mechanism, rotary base device and semiconductor processing equipment |
| CN108461387B (en) * | 2018-03-19 | 2020-06-19 | 北京北方华创微电子装备有限公司 | Power feed-in mechanism, rotating base device and semiconductor processing equipment |
| JP2020177756A (en) * | 2019-04-16 | 2020-10-29 | 株式会社アルバック | Plasma processing apparatus |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3295310B2 (en) * | 1995-08-08 | 2002-06-24 | 三洋電機株式会社 | High-speed film forming method and apparatus using rotating electrode |
| CN1719964A (en) * | 2005-05-31 | 2006-01-11 | 王晓臣 | Rotary corona discharge low temp plasma source apparatus |
| JP4319755B2 (en) * | 2000-01-28 | 2009-08-26 | Ｔｄｋ株式会社 | Plasma processing equipment |
| JP2010141194A (en) * | 2008-12-12 | 2010-06-24 | Seiko Epson Corp | Plasma processing apparatus and plasma processing method |
| DE202014100594U1 (en) * | 2014-02-11 | 2014-03-10 | Von Ardenne Gmbh | End block assembly |
-
2015
- 2015-01-16 TW TW104101506A patent/TWI530584B/en active
- 2015-04-13 CN CN201510171039.4A patent/CN106163069B/en active Active
- 2015-09-01 US US14/842,316 patent/US20160208403A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3295310B2 (en) * | 1995-08-08 | 2002-06-24 | 三洋電機株式会社 | High-speed film forming method and apparatus using rotating electrode |
| JP4319755B2 (en) * | 2000-01-28 | 2009-08-26 | Ｔｄｋ株式会社 | Plasma processing equipment |
| CN1719964A (en) * | 2005-05-31 | 2006-01-11 | 王晓臣 | Rotary corona discharge low temp plasma source apparatus |
| JP2010141194A (en) * | 2008-12-12 | 2010-06-24 | Seiko Epson Corp | Plasma processing apparatus and plasma processing method |
| DE202014100594U1 (en) * | 2014-02-11 | 2014-03-10 | Von Ardenne Gmbh | End block assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106163069A (en) | 2016-11-23 |
| US20160208403A1 (en) | 2016-07-21 |
| TW201627527A (en) | 2016-08-01 |
| TWI530584B (en) | 2016-04-21 |
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