Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unimicron Technology CorpfiledCriticalUnimicron Technology Corp
Priority to TW103135365ApriorityCriticalpatent/TWI572268B/zh
Publication of TW201615074ApublicationCriticalpatent/TW201615074A/zh
Application grantedgrantedCritical
Publication of TWI572268BpublicationCriticalpatent/TWI572268B/zh
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device