TW201614007A - Composition for forming silica layer, silica layer, and electronic device - Google Patents

Composition for forming silica layer, silica layer, and electronic device

Info

Publication number
TW201614007A
TW201614007A TW104117087A TW104117087A TW201614007A TW 201614007 A TW201614007 A TW 201614007A TW 104117087 A TW104117087 A TW 104117087A TW 104117087 A TW104117087 A TW 104117087A TW 201614007 A TW201614007 A TW 201614007A
Authority
TW
Taiwan
Prior art keywords
silica layer
composition
electronic device
forming
forming silica
Prior art date
Application number
TW104117087A
Other languages
English (en)
Other versions
TWI575024B (zh
Inventor
Hui-Chan Yun
Woo-Han Kim
Sang-Ran Koh
Taek-Soo Kwak
Bo-Sun Kim
Jin-Gyo Kim
Yoong-Hee Na
Kun-Bae Noh
Sae-Mi Park
Jin-Hee Bae
Jun Sakong
Eun-Seon Lee
Wan-Hee Lim
Jun-Young Jang
Il Jung
Byeong-Gyu Hwang
Original Assignee
Samsung Sdi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Sdi Co Ltd filed Critical Samsung Sdi Co Ltd
Publication of TW201614007A publication Critical patent/TW201614007A/zh
Application granted granted Critical
Publication of TWI575024B publication Critical patent/TWI575024B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Inorganic Insulating Materials (AREA)
  • Silicon Compounds (AREA)
TW104117087A 2014-10-07 2015-05-28 用於形成二氧化矽層的組成物、二氧化矽層及電子裝置 TWI575024B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20140135157 2014-10-07
KR1020140188905A KR101806328B1 (ko) 2014-10-07 2014-12-24 실리카계 막 형성용　조성물, 실리카계 막, 및 전자 디바이스

Publications (2)

Publication Number Publication Date
TW201614007A true TW201614007A (en) 2016-04-16
TWI575024B TWI575024B (zh) 2017-03-21

Family

ID=55916785

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104117087A TWI575024B (zh) 2014-10-07 2015-05-28 用於形成二氧化矽層的組成物、二氧化矽層及電子裝置

Country Status (4)

Country Link
JP (1) JP6599640B2 (zh)
KR (1) KR101806328B1 (zh)
CN (1) CN106189267A (zh)
TW (1) TWI575024B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105838034B (zh) * 2016-05-24 2018-01-02 中国广州分析测试中心 一种聚硅氮烷原位生成二氧化硅增强环氧树脂复合材料
KR102015404B1 (ko) * 2016-12-08 2019-08-28 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 실리카 막의 제조방법 및 실리카 막을 포함하는 전자소자
KR102194975B1 (ko) * 2017-10-13 2020-12-24 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 실리카 막의 제조방법 및 실리카 막
KR102471747B1 (ko) * 2017-12-26 2022-11-25 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 실리카 막, 및 전자소자
KR102432933B1 (ko) 2019-05-17 2022-08-12 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 그로부터 형성된 실리카 막, 및 상기 실리카 막을 포함하는 전자 소자

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651464B2 (ja) * 1987-08-13 1997-09-10 財団法人石油産業活性化センター 改質ポリシラザン、その製造方法及びその用途
JPH06136130A (ja) * 1992-10-26 1994-05-17 Sumitomo Electric Ind Ltd ポリシラザンの高分子量化方法、高分子量化されたポリシラザン、及び該ポリシラザンを塗布焼付けた耐熱絶縁電線
JP3364691B2 (ja) * 1992-12-28 2003-01-08 東燃ゼネラル石油株式会社 ポリシラザンの低分子量化方法
US6218497B1 (en) * 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6177199B1 (en) * 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
JP5020425B2 (ja) * 2000-04-25 2012-09-05 Ａｚエレクトロニックマテリアルズ株式会社 微細溝をシリカ質材料で埋封する方法
JP5172867B2 (ja) * 2010-01-07 2013-03-27 ＡｚエレクトロニックマテリアルズＩｐ株式会社 ポリシラザンを含むコーティング組成物
KR101432606B1 (ko) * 2011-07-15 2014-08-21 제일모직주식회사 갭필용 충전제, 이의 제조 방법 및 이를 사용한 반도체 캐패시터의 제조 방법
US20150093545A1 (en) * 2013-10-01 2015-04-02 Samsung Sdi Co., Ltd. Composition for a silica based layer, silica based layer, and method of manufacturing a silica based layer
JP6104785B2 (ja) * 2013-12-09 2017-03-29 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ ペルヒドロポリシラザン、およびそれを含む組成物、ならびにそれを用いたシリカ質膜の形成方法

Also Published As

Publication number Publication date
CN106189267A (zh) 2016-12-07
JP2016074875A (ja) 2016-05-12
KR101806328B1 (ko) 2017-12-07
TWI575024B (zh) 2017-03-21
JP6599640B2 (ja) 2019-10-30
KR20160041728A (ko) 2016-04-18

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