TW201612250A - Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel - Google Patents

Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel

Info

Publication number
TW201612250A
TW201612250A TW104131743A TW104131743A TW201612250A TW 201612250 A TW201612250 A TW 201612250A TW 104131743 A TW104131743 A TW 104131743A TW 104131743 A TW104131743 A TW 104131743A TW 201612250 A TW201612250 A TW 201612250A
Authority
TW
Taiwan
Prior art keywords
display device
cured film
resin composition
photosensitive resin
liquid crystal
Prior art date
Application number
TW104131743A
Other languages
English (en)
Inventor
Takeshi Ando
Daisuke Kashiwagi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201612250A publication Critical patent/TW201612250A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
TW104131743A 2014-09-29 2015-09-25 Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel TW201612250A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014198679 2014-09-29

Publications (1)

Publication Number Publication Date
TW201612250A true TW201612250A (en) 2016-04-01

Family

ID=55630426

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104131743A TW201612250A (en) 2014-09-29 2015-09-25 Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel

Country Status (2)

Country Link
TW (1) TW201612250A (zh)
WO (1) WO2016052390A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI826592B (zh) * 2018-11-20 2023-12-21 南韓商Ｌｇ化學股份有限公司 液晶配向組成物、製備液晶配向膜之方法以及使用其之液晶配向膜與液晶顯示器

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102035434B1 (ko) * 2015-07-09 2019-10-22 도쿄 오카 고교 가부시키가이샤 규소 함유 수지 조성물
US11884839B2 (en) * 2016-08-29 2024-01-30 Nissan Chemical Corporation Acetal-protected silanol group-containing polysiloxane composition
CN112831025A (zh) * 2021-01-29 2021-05-25 江苏泰仓农化有限公司 一种meko封闭的tdi聚合物及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8168371B2 (en) * 2007-01-22 2012-05-01 Nissan Chemical Industries, Ltd. Positive photosensitive resin composition
JP2013092633A (ja) * 2011-10-25 2013-05-16 Adeka Corp ポジ型感光性組成物
JP2013114238A (ja) * 2011-12-01 2013-06-10 Toray Ind Inc ポジ型感光性組成物、そのポジ型感光性組成物から形成された硬化膜、およびその硬化膜を有する素子。
JP6064570B2 (ja) * 2012-12-10 2017-01-25 Jsr株式会社 表示素子用感放射線性樹脂組成物、硬化膜、硬化膜の製造方法、半導体素子および表示素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI826592B (zh) * 2018-11-20 2023-12-21 南韓商Ｌｇ化學股份有限公司 液晶配向組成物、製備液晶配向膜之方法以及使用其之液晶配向膜與液晶顯示器

Also Published As

Publication number Publication date
WO2016052390A1 (ja) 2016-04-07

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