TW201543977A - Method of forming silver-containing conductive pattern - Google Patents

Abstract

Provided is a method of forming a silver-containing conductive pattern including the following steps. A photo-sensitive composition is coated on a substrate. The photo-sensitive composition coated on the substrate is UV-cured so as to form a silver-containing conductive pattern, wherein the photo-sensitive composition includes a solvent, a photo-initiator, a fluorinated-organic complex of silver ion, a material having a low reflectivity, and a photo-curable monomer and/or oligomer thereof.

Description

Method of forming a silver-containing conductive pattern layer

This invention relates to a method of forming a wire, and more particularly to a method of forming a silver-containing conductive pattern layer.

A touch screen is a device that allows a user to control a component by touching the screen; since it provides an effective, natural, and lively human-computer interaction interface, it has been widely used in many electronic products. application.

FIG. 1 is a top view of a conventional touch panel. Referring to FIG. 1, the touch panel 10 includes a substrate 110 that can be divided into a display area 112 and a peripheral area 114. A plurality of sensing electrodes E are disposed in the display region 112, and adjacent sensing electrodes E are electrically connected through the longitudinal or lateral bridge wires C. The traces 130 disposed in the peripheral region 114 connect the series of the sensing electrodes E and the bridge wires C to the connecting portion 130a to be electrically connected to an external circuit (not shown). Wherein, the bridge wire C may be made of a fine metal wire; the material of the sensing electrode E may be indium tin oxide (ITO) in some cases, or, as shown in a partial enlarged view of FIG. 1, or may be made of a fine metal wire. M (for example, a copper wire or a silver wire).

The problem to be overcome with the use of fine metal wires is that, due to the highly reflective nature of the metal material itself, even if the width of the metal wire drops to the tens of microns, it may be observed by the user. feel. Therefore, researchers have studied methods for reducing the visibility of metal wires. For example, referring to Figures 2 and 3, these figures illustrate two known techniques for reducing the visibility of metal wires. The technique shown in FIG. 2 is to first form a metal wire 402 on the substrate 400, and then form a low-reflection layer 404 on the surface of the metal wire 402. The technique shown in FIG. 3 first forms a low-reflection layer 504 on the cover plate 500. A metal wire 502 is then formed on the low reflective layer 504, both of which are characterized by the placement of a low reflective layer between the metal wire and the observer's position, making the metal wire less noticeable. However, these techniques have problems such as cumbersome steps and difficulty in controlling the size of the film layer.

The present invention provides a method of forming a silver-containing conductive pattern layer, which can reduce the visibility of a silver-containing conductive pattern layer.

The method of forming a silver-containing conductive pattern layer of the present invention comprises the following steps. The photosensitive composition is coated on a substrate. The photosensitive composition on the substrate is subjected to UV light curing to form a silver-containing conductive pattern layer. Among them, the photosensitive composition includes a solvent, a photoinitiator, a fluorine-containing organic silver complex, a low reflectance material, and a photopolymerizable monomer and/or an oligomer thereof.

In one embodiment, the fluorine-containing organic silver complex accounts for 50 to 90% by weight based on the total solid content of the photosensitive composition.

In one embodiment, the fluorine-containing organic silver complex is silver trifluoroacetate, silver 1,1,1-trifluoro-2,4-pentanedione, or a combination thereof.

In one embodiment, the low reflectivity material is a material having a reflectance to visible light of less than 80%.

In one embodiment, the low reflectivity material comprises carbon black; chromium, titanium or zirconium Mononitride or monooxide; or a combination of the foregoing.

In one embodiment, the low reflectivity material comprises an azo dye, an anthraquinone dye, a phthalocyanine dye, a quinone imine dye, a quinoline dye, a nitro dye, a carbonyl dye, a methine dye, or a combination thereof.

In one embodiment, the method of applying the photosensitive composition to a substrate is inkjet printing, offset printing, transfer printing or screen printing.

In one embodiment, the photosensitive composition on the substrate has a thickness of between 0.1 and 5 [mu]m and a line width of between 0.5 and 50 [mu]m.

A method of manufacturing a touch display device of the present invention includes forming a silver-containing conductive pattern layer by the aforementioned method.

The touch display device of the present invention is fabricated by the method of manufacturing the touch display device.

Based on the above, the technical solution of the present invention can produce a silver wire with low visibility (ie, a conductive pattern layer containing silver) through a simple program, so that the touch panel has better performance.

The above described features and advantages of the present invention will be more apparent from the following description.

10‧‧‧Touch panel

100, 110, 400‧‧‧ base

112‧‧‧ display area

114‧‧‧The surrounding area

130‧‧‧Wiring

130a‧‧‧Connecting Department

200‧‧‧Photosensitive composition

300‧‧‧conductive pattern layer

302‧‧‧Metal silver

304‧‧‧Low reflective material

306‧‧‧Other ingredients

402, 502‧‧‧Metal wire

404, 504‧‧‧ low reflection layer

500‧‧‧covering board

C‧‧‧Bridge wiring

E‧‧‧Induction electrode

M‧‧‧Micro metal wire

FIG. 1 is a top view of a conventional touch panel.

Figures 2 and 3 show the combination of two conventional metal wires and a low reflection layer.

4 is a flow chart of forming a silver-containing conductive pattern layer according to a first embodiment of the present invention.

In the present specification, the range represented by "a value to another value" is a schematic representation that avoids enumerating all the values in the range in the specification. Therefore, a particular numerical range is recited and is equivalent to the disclosure of any numerical value in the range of the value and the numerical range defined by any value in the numerical range, as the The smaller value range is the same. For example, the description of the "size of 10 to 100 μm" is equivalent to the disclosure of the "size of 20 μm to 50 μm" regardless of whether other values are listed in the specification.

In accordance with an embodiment of the present invention, FIG. 4 presents a flow of forming a silver-containing conductive pattern layer. Referring to FIG. 4, in the present embodiment, first, the photosensitive composition 200 is coated on the substrate 100.

The photosensitive composition 200 is a composition which can be cured by irradiation with UV light; and is preferably a composition in which the contained component is converted into metallic silver by irradiation of UV light. In this regard, the photosensitive composition 200 includes a solvent, a photoinitiator, a fluorine-containing organic silver complex, a low reflectance material, and a photopolymerizable monomer and/or an oligomer thereof. These components will be described separately below.

Solvent

The solvent is not particularly limited, and may be any solvent known in the art to which the composition of the photosensitive composition 200 is dispersed or dissolved, such as methylethylketone, acetone, cyclohexanone, acetonitrile, Ethyl acetate, chloroform, methanol, ethanol, n-propanol, isopropanol, diacetone alcohol, 3-methoxy propanol, toluene, xylene, tetramethyl Base benzene, ethyl lactate, methylcellosolve, ethyl cellosolve (ethylcellosolve), propylcellosolve, ethylene glycol dimethylether, ethylene glycol diethylether, ethylene glycol methylethylether, propylene glycol Propylene glycol dimethylether, propylglycol diethylether, propylene glycol methylethylether, 2-ethoxypropanol, 2-methoxypropanol, 3-methoxybutanol, cyclopentanone, cyclohexanone, propyleneglycol methylether acetate (PGMEA), propylene glycol ethyl ether acetate, 3-methoxybutyl acetate, ethoxyethylpropionate (EEP), ethyl 3-ethoxy propionate, Ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate or dipropylene glycol monomethyl ether (d Ipropylene glycol monomethylether). One solvent may be used alone or two or more solvents may be used in combination.

<Photoinitiator>

The photoinitiator is not particularly limited as long as it has the ability to initiate polymerization of the photopolymerizable monomer and/or its oligomeric polymerization, and examples thereof include: Ciba's product Darocur 1173 (2-hydroxy-2-methyl-) 1-phenyl-propan-1-one, 2-hydroxy-2-methyl-1-phenyl-1-propanone); product of Irfaacure 184 (1-hydroxy-cyclohexyl-phenyl-ketone, 1-hydroxyl ring) Benzyl phenyl ketone), Irgacure 369 (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone, 2-benzyl-2-dimethylamino-1-(4-morpholinylbenzene Butanone), Irgacure 651 (2,2-dimethoxy-1,2-diphenylethan-1-one, benzoin dimethyl ether), Irgacure 2959 (1-[4-(2-hydroxyethoxy)-phenyl]-2- Hydroxy-2-methyl-1- Propane-1-one, 2-hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone), Irgacure 819 (phenyl bis(2,4,6-trimethylbenzoyl)phosphine oxide, phenyl double (2,4,6-trimethylbenzimidyl)phosphine oxide), Irgacure 1700 (25% bis(2,6-dimethoxybenzylidene) (2,4,4-trimethyl) Mixture of pentylphosphine oxide and 75% 2-hydroxy-2-methyl-1-phenyl-1-propanone; Mixture of 25% bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl Pentyl)phosphineoxide and 75% 2-hydroxy-2-methyl-1-phenyl-propan-1-one), Irgacure TPO (diphenyl(2,4,6-trimethylbenzoyl)-phosphineoxide, (2,4,6-trimethyl) Benzobenzino)diphenylphosphine oxide). A photoinitiator may be used alone or in combination of two or more photoinitiators.

<Fluorine-containing organic silver complex>

The fluorine-containing organic silver complex is an organic complex which is soluble in the aforementioned solvent and whose silver ions are reduced to metallic silver under irradiation of UV light; and the kind thereof is, for example, silver fluorinated-silver fluorinated- Acetate type), silver fluorinated-sulfonate type, fluorine-containing β-carbonylketone type silver(I) complex, fluorine-containing A fluoro beta (β)-carbonylester type silver (I) complex or a combination of the foregoing complexes. Specific examples thereof include, but are not limited to, silver trifluoroacetate, 1,5-cyclooctadien-hexafluoroacetylacetonato silver (I) complex, 1,1,1-three. Fluorinated silver, 1,1,1-trifluoro-2,4-pentanedionatosilver (I) complex, 5,5-dimethyl-1,1,1-trifluoro-2,4 -5,5-dimethyl-1,1,1-trifluoro-2,4-hexanedionatosilver (I) complex, 1-(4-methoxyphenyl)-4,4,4-tri 1-(4-methoxyphenyl)-4,4,4-trifluoro butanedionatosilver (I) complex), 5,5,6,6,7,7,8,8,9,9,10, 10,11,11,12,12,12-heptadecafluorononane-2,4-dione silver (5,5,6,6,7,7,8,8,9,9,10,10, 11,11,12,12,12-heptadecafluorodecane-2,4- Dionatosilver (I) complex), 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedione silver (1,1,1,2,2 ,3,3-heptafluoro-7,7-dimethyl-4,6-octanedionatosilver (I) complex), 1,1,1,3,5,5,5-heptafluoropentane-2,4-dione silver (1,1,1,3,5,5,5-heptafluoropentane-2,4-dionatosilver(I)complex), 1,1,1,5,5,5-hexafluoropentane-2,4-di Ketone silver (1,1,1,5,5,5-hexafluoropentane-2,4-dionatosilver(I) complex), 5,5,6,6,7,7,8,8,8-nonafluorooctane -2,4-dione silver (5,5,6,6,7,7,8,8,8-nonafluorooctane-2,4-dionatosilver (I) complex), 5H, 5H-perfluorodecane-two Ketone silver (5H, 5H-perfluorononane-4, 6-dionatosilver (I) complex), 8H, 8H-perfluoropentadecane-7,8-dione silver (8H, 8H-perfluoropentadecane-7, 8-dionatosilver ( I) complex), 6H, 6H-perfluoroundecane-5,7-dione silver (6H, 6H-perfluoroundecane-5, 7-dionatosilver (I) complex), 1-phenyl-2H, 2H-all Fluorine-1,3-dione silver (1-phenyl-2H, 2H-perfluorohexane-1,3-dionatosilver (I) complex), 1-phenyl-2H, 2H-perfluoroundecane-1, 3-Dimethyl ketone (1-phenyl-2H, 2H-perfluoroundecane-1,3-dionatosilver (I) complex), 5,6,6,6-tetrafluoro-5-(heptafluoropropoxy)hexane- 2,4-two Silver (5,6,6,6-tetrafluoro-5-(heptafluoropropoxy)hexane-2,4-dionatosilver(I) complex), 1,1,5,5-tetrafluoropentane-2,4-dione silver ( 1,1,5,5-tetrafluoropentane-2,4-dionatosilver(I)complex), 5,5,6,6,7,7,8,8,9,9,9-undefluoro-decane- Silver 2,4-dione (5,5,6,6,7,7,8,8,9,9,9-undecafluorononane-2,4-dionatosilver(I) complex), ethyl 3-chloro-4 , 4,4-trifluoroacetate silver (ethyl 3-chloro-4,4,4-trifluoroacetoacetatosilver (I) complex), ethyl-4,4-difluoroacetic acid silver (ethyl-4,4- Difluoroacetoacetatosilver (I) complex), ethyl-4,4,4-trifluoroacetate (I) complex, isopropyl-4,4,4-trifluoro Acetylacetate (isopropyl-4,4,4-trifluoroacetoacetatosilver (I) complex), methyl-4,4,5,5,5-pentafluoro-3-oxopentanoate methyl silver (methyl-4, 4,5,5,5-pentafluoro-3- Oxopentanonatosilver (I) complex), ethyl-4,4,5,5,5-pentafluoro-3-oxopentanoate methyl silver (ethyl-4,4,5,5,5-pentafluoro-3-oxo -pentanonatosilver(I)complex) and silver 1,1,1,5,5,6,6,6-octafluoro-2,4-hexanedione (1,1,1,5,5,6,6, 6-octafluoro-2, 4-hexanedionatosilver (I) complex). Preferably, the fluorine-containing organic silver complex is silver trifluoroacetate, silver 1,1,1-trifluoro-2,4-pentanedione or a combination thereof.

The content of the fluorine-containing organic silver complex in the photosensitive composition 200 is not particularly limited in principle, and for example, the fluorine-containing organic silver complex may account for 1% by weight to 90% by weight based on the total solid content of the photosensitive composition. %, preferably from 50% by weight to 90% by weight.

<Low reflectivity material>

The term "low" reflectance material as used herein refers to a material having a reflectance of visible light of less than 80%, which may be an inorganic or organic material such as carbon black; a single nitride or a mono-oxide of chromium, titanium or zirconium; azo Dye; anthraquinone dye; phthalocyanine dye; quinone imine dye; quinoline dye; nitro dye; carbonyl dye; methine dye or a combination thereof.

<Photopolymerizable monomer and/or its oligomer>

The photopolymerizable monomer and/or its oligomer may be a monomer and/or oligomer which initiates polymerization by catalysis by a photoinitiator, and the material may be light known in the art to which the present invention pertains. Polymerizable monomers and/or oligomers thereof, such as monofunctional, difunctional, trifunctional, tetrafunctional or hexafunctional compounds. Monofunctional compounds such as Isobornylacrylate (IBOA, such as SR506D from Sartomer), Octyl decyl acrylate (ODA, such as Sartomer's SR484), Caprolactone acrylatem (Sartomer's SR495) ) or Lauryl acrylate (such as Sartomer's SR335). Bifunctional compounds such as Tripropylene glycol diacrylate (TPGDA, such as Actilane 424 from AKZO Nobel Resins), 1,6-hexanediol diacrylate (1,6-hexanediol diacrylate, HDDA, such as Actilane 425 of AKZO Nobel Resins, Dipropylene glycol diacrylate (DPGDA, such as SR508 from Sartomer), Propoxylated (2) neopentyl glycol diacrylate, PONPGDA, such as Sartomer's SR9003), Tricyclodecanedimethanol diacrylate (TCDDMDA, such as Sartomer's SR833S) or polyethylene glycol (400) diacrylate (Polyethylene glycol 400 diacrylate, PEG400DA, such as Sartomer's) SR344). Trifunctional compounds such as trimethylol propane triacrylate (TMPTA, such as Actilane 431 of AKZO Nobel Resins), ethoxylated (3) trimethylol propane triacrylate, Such as Sartomer's SR454) or ethoxylated (6) trimethylol propane triacrylate (such as Sartomer's SR499). Tetrafunctional compounds such as tetrafunctional polyester acrylate oligomer (Actilane 505 of AKZO Nobel Resins), ethoxylated pentaerythritol tetraacrylate (PPTTA, Actilane 440 such as AKZO Nobel Resins) Or ditrimethylolpropane tetraacrylate (di TMPTA, such as Actilane 44 from AKZO Nobel Resins). A hexafunctional compound such as dipentaerythritol hexaacrylate (DPHA, such as Actilane 450 from AKZO Nobel Resins).

In addition to the various ingredients described in the preceding paragraphs, the photosensitive composition 200 may also include other ingredients such as adhesive promoters and the like.

The ratio of the various components in the photosensitive composition 200 is not particularly limited in principle. When the photosensitive composition 200 is prepared, the relative proportion can be adjusted depending on various factors, such as the solvent dispersing ability of each component, and the light initiation. Agent promotes photopolymerizable monomers and/or their oligomers The tradeoff between the ability to carry out the polymerization reaction, the adhesion of the UV photohardenable product to the substrate 100, and the conductive properties of the photohardenable product, and the like.

The material of the substrate 100 is not particularly limited. For example, the manufacturing of the touch display device may be any transparent material suitable for the application, such as glass or plastic materials; and the plastic material may also be a polyethylene terephthalate (PET) or a polyphthalate. Examples of polyethylene naphthalate (PEN) and polycarbonate (polycarbonate). Further, the substrate 100 may be a rigid substrate or may have flexibility.

In the present embodiment, the method of applying the photosensitive composition 200 on the substrate 100 is not particularly limited, and in the aspect shown in FIG. 4, inkjet printing, offset printing, transfer printing or screen printing may be used. A patterned photosensitive composition 200 is formed on the substrate 100. In such an embodiment, since the photosensitive composition 200 is not required to be subjected to a developing process, the photosensitive composition 200 may not contain an alkali-soluble resin.

After coating, the photosensitive composition 200 has a thickness of between 0.1 μm and 5 μm; and a line width of between 0.5 μm and 50 μm.

As shown in FIG. 4, after the photosensitive composition 200 is applied, the photosensitive composition 200 is converted into a conductive pattern layer 300 by irradiating UV light; wherein the conductive pattern layer 300 includes metallic silver 302, a low reflective material 304, and other components. 306.

The conductive pattern layer 300 has a thickness of between 0.1 μm and 2 μm and a width of between 0.5 μm and 50 μm.

When the photosensitive composition 200 is exposed to UV light, the photopolymerizable monomer and/or its oligomer are polymerized by a photoinitiator to form a polymer matrix of the conductive pattern layer 300 (for All or a portion of the other components 306 may have a UV irradiation energy density of 1500 to 10000 J/cm ² . Further, the photosensitive composition 200 may be baked before UV light curing.

The metallic silver 302 is a product of the fluorine-containing organic silver complex in the photosensitive composition 200 irradiated with UV light, which is dispersed in the polymer matrix to provide electrical conductivity to the conductive pattern layer 300. If the content of the fluorine-containing organic silver complex in the photosensitive composition 200 is sufficiently high, after the UV light curing step, the conductivity of the conductive pattern layer 300 can satisfy the requirements of the touch display device for the fine metal wire, without Additional metal deposition steps (such as electroless plating) are performed. In this regard, the content of the fluorine-containing organic silver complex should be more than 50% by weight, for example, 50% by weight to 90% by weight based on the total solid content of the photosensitive composition 200.

As for the low-reflection material 304, it is one of the low-reflection materials described in paragraph 0030. The method for forming the silver-containing conductive pattern layer of the present embodiment is suitable for the production of the touch display device, and the display quality of the touch display device can be improved. For this reason, the present invention also relates to a method of manufacturing a touch display device and a touch display device obtained by the method.

The method for manufacturing a touch display device according to the present invention is characterized in that the method of forming a silver-containing conductive pattern layer in the first embodiment is used, and other steps and materials can be arbitrarily selected from known techniques. For example, the manufacturing method of the touch display device may include forming a wire on the transparent substrate, forming a wire on the cover plate (at least one of the two steps uses the method of the first embodiment), and insulating the adhesive layer The step of joining the cover sheet and the transparent substrate.

While the present invention has been described above by way of exemplary embodiments, it is not intended to limit the invention. Any changes and modifications may be made without departing from the spirit and scope of the invention. Therefore, the scope of protection of this application is subject to the definition of the scope of the patent application attached.

100‧‧‧Base

200‧‧‧Photosensitive composition

300‧‧‧conductive pattern layer

302‧‧‧Metal silver

304‧‧‧Low reflective material

306‧‧‧Other ingredients

Claims (10)

A method of forming a silver-containing conductive pattern layer comprising coating a photosensitive composition on a substrate and subjecting the photosensitive composition on the substrate to UV light curing to form a silver-containing conductive pattern layer, wherein the photosensitive property The composition includes a solvent, a photoinitiator, a fluorine-containing organic silver complex, a low reflectivity material, and a photopolymerizable monomer and/or an oligomer thereof. The method of forming a silver-containing conductive pattern layer according to claim 1, wherein the fluorine-containing organic silver complex accounts for 50 to 90% by weight based on the total solid content of the photosensitive composition. The method for forming a silver-containing conductive pattern layer according to claim 1, wherein the fluorine-containing organic silver complex is silver(I)trifluoroacetate, 1,1,1-trifluorocarbon. -2,4-pentanedione silver (1,1,1-trifluoro-2,4-pentanedionatosilver (I)) or a combination thereof. The method of forming a silver-containing conductive pattern layer according to claim 1, wherein the low reflectance material is a material having a reflectance of visible light of 80% or less. The method of forming a silver-containing conductive pattern layer according to claim 1, wherein the low reflectivity material comprises carbon black; a single nitride or a mono-oxide of chromium, titanium or zirconium; or a combination of the foregoing. The method of forming a silver-containing conductive pattern layer according to claim 1, wherein the low reflectance material comprises azo dyes, anthraquinone dyes, and phthalocyanine dyes. , quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, methine dyes, or combinations thereof. A method of forming a silver-containing conductive pattern layer as described in claim 1, wherein the method of coating the photosensitive composition on the substrate comprises inkjet printing, offset printing, transfer printing or screen printing. The method of forming a silver-containing conductive pattern layer according to claim 1, wherein the photosensitive composition on the substrate has a thickness of between 0.1 and 5 μm and a line width of between 0.5 and 50 μm. A method of manufacturing a touch display device, comprising the method of forming a silver-containing conductive pattern layer according to any one of claims 1 to 8. A touch display device is produced by the method for manufacturing a touch display device according to claim 9.