JP2012220643A - Touch panel attached color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a touch panel attached color filter having a protective layer with excellent hardness and adhesion on the outermost surface of a touch panel.SOLUTION: A touch panel attached color filter includes: a transparent substrate; a touch panel including a touch panel sensor layer formed on one surface of the transparent substrate and a protective layer formed on the touch panel sensor layer; and a color filter formed on the other surface of the transparent substrate. The protective layer includes an adhesion layer including a resin for the adhesion layer and formed into a pattern, and a hardness layer including a resin for the hardness layer and formed into a pattern, in which the adhesion layer and the hardness layer are formed in this order. The hardness layer is formed inside the outer periphery of the adhesion layer in a planar view.

Description

  The present invention relates to a color filter with a touch panel having a protective layer having excellent hardness and adhesion on the outermost surface of the touch panel.

  Today, touch panels are widely used as input means. In many cases, a touch panel is used together with a display device as an input means for various devices in which a display device such as a liquid crystal display or a plasma display is incorporated (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). Yes. In such a device, the touch panel is placed on the display surface of the display device, which allows the touch panel to make a very direct input to the display device.

  Various types of touch panels have been put into practical use. Among them, what is called a capacitance method is a touch panel having a layer structure of a first transparent electrode / interelectrode insulating layer / second transparent electrode, and further protecting to cover the second transparent electrode. It is known that a layer is formed, a weak current is passed through the touch panel surface of the touch panel to form an electric field, and the change in capacitance value when a finger or other conductor is touched lightly It is converted into a drop or the like and detected, and the contact position is detected.

In addition, a conventional touch panel is usually manufactured separately from a display device, and is used by being placed on the display device (for example, Patent Document 1). However, the touch panel itself must be used by adhering to the entire surface of the display device, which increases the thickness of the display device itself or increases the cost.
Therefore, in order to solve these problems, there has been proposed an attempt to share the base material of the display device and the touch panel so that the thickness and cost of the display device itself can be reduced. As one of them, a color filter with a touch panel in which a capacitive touch panel is formed on one surface of a transparent substrate and a color filter is formed on the other surface of the transparent substrate has been proposed.
In the production of the color filter with a touch panel, in order to reduce the influence on the display performance, generally, after the touch panel is formed on the transparent substrate, a color filter is formed on the back surface.
However, this method has a problem in that the touch panel surface is scratched or peeled off due to conveyance during the manufacture of the color filter, resulting in disconnection or poor sensitivity.

JP 2006-23904 A

  This invention is made | formed in view of the said problem, and it aims at providing the color filter with a touchscreen which has the protective layer excellent in hardness and adhesiveness in the outermost surface of a touchscreen.

  In order to solve the above problems, the present invention provides a transparent substrate, a touch panel sensor layer formed on one surface of the transparent substrate, a touch panel having a protective layer formed on the touch panel sensor layer, and the transparent substrate. A color filter with a touch panel having a color filter formed on the other surface of the substrate, wherein the protective layer is made of a resin for the adhesion layer and a resin for the hardness layer formed in a pattern. Provided is a color filter with a touch panel, in which hardness layers formed in a pattern are laminated in this order, and the hardness layer is formed inside the outer periphery of the adhesion layer in a plan view. To do.

According to the present invention, the protective layer is composed of a hardness layer having excellent hardness and an adhesive layer having excellent adhesion, whereby the protective layer can be excellent in both hardness and adhesion.
Further, since the hardness layer is formed on the inner side of the outer periphery of the adhesion layer in plan view, the hardness layer can be excellent in adhesion, and the protective layer is excellent in stability. Can be.
Therefore, it can have a protective layer excellent in both hardness and adhesion and excellent in stability.

  In the present invention, the tapered portion of the hardness layer is preferably formed on the tapered portion of the adhesion layer. For example, the adhesion layer and the hardness layer can be formed using the same mask, and can be formed at low cost.

  In this invention, it is preferable that the static friction coefficient of the said hardness layer exists in the range of 0.25-0.37, and pencil hardness is 4H or more. This is because the hardness layer can be excellent in hardness and slipperiness.

  In this invention, it is preferable that the adhesive force with respect to the said touch-panel sensor layer of the said adhesion layer is evaluation classification 0 or 1 in the crosscut part in the crosscut evaluation prescribed | regulated by JISK5600-5-6. It is because the said protective layer can make it hard to peel from the said touch-panel sensor layer because the adhesive force of the said contact | adherence layer is in the above-mentioned range.

  In the present invention, the above resin for hardness layer uses a composition for forming a hardness layer containing a polymer for forming a hardness layer having a structural unit (1) having an unsaturated double bond and a polyfunctional monomer for forming a hardness layer. The adhesive layer resin is formed by using an adhesive layer forming composition containing an adhesive layer forming polymer having the structural unit (1) having an unsaturated double bond, and having the hardness described above. The content of the structural unit (1) of the layer forming polymer is 70 mol% or more of all the structural units constituting the hardness layer forming polymer, and the polymerizable functional group of the polyfunctional monomer for forming the hardness layer is used. It is preferable that the number of groups is 5 or more, and the content of the structural unit (1) of the adhesion layer forming polymer is 45 mol% or less in all the structural units constituting the adhesion layer forming polymer. This is because when the protective layer is made of the above-described material, it can be excellent in hardness and adhesion.

  In the present invention, the above resin for hardness layer uses a composition for forming a hardness layer containing a polymer for forming a hardness layer having a structural unit (1) having an unsaturated double bond and a polyfunctional monomer for forming a hardness layer. The resin for adhesion layer is formed by using a composition for forming an adhesion layer containing a polyfunctional monomer for forming an adhesion layer, and the structural unit (1) of the polymer for forming a hardness layer. Is at least 70 mol% in all structural units constituting the polymer for forming a hardness layer, the number of polymerizable functional groups of the polyfunctional monomer for forming a hardness layer is 5 or more, and the adhesion layer The number of polymerizable functional groups of the polyfunctional monomer for formation is preferably in the range of 2 to 4. This is because when the protective layer is made of the above-described material, it can be excellent in hardness and adhesion.

  The present invention provides an adhesion layer forming step of forming an adhesion layer by exposing a coating film of the composition for the adhesion layer on the touch panel sensor layer formed on one surface of the transparent substrate, and on the adhesion layer. And a hardness layer forming step of forming a hardness layer by exposing a coating film of the composition for the hardness layer, wherein the hardness layer forming step is the adhesion layer forming step. Using the same mask as the mask used for the exposure, the amount of exposure to the diffracted light region of the coating film of the hardness layer composition is the diffraction of the coating film of the composition for the adhesion layer in the adhesion layer forming step. Provided is a method for manufacturing a color filter with a touch panel, wherein the exposure is performed so that the amount of exposure to the light region is smaller.

  According to the present invention, by having the hardness layer forming step, it is possible to easily and inexpensively manufacture a color filter with a touch panel in which the hardness layer is formed inside the outer periphery of the adhesion layer in a plan view. it can.

  The present invention produces an effect that a color filter with a touch panel having a protective layer having excellent hardness and adhesion on the outermost surface of the touch panel can be provided.

It is a schematic plan view which shows an example of the color filter with a touchscreen of this invention. It is the sectional view on the AA line of FIG. It is explanatory drawing explaining the relationship between the contact | adherence layer and hardness layer in this invention. It is explanatory drawing explaining the diffracted light area | region in this invention. It is process drawing which shows an example of the manufacturing method of the color filter with a touchscreen of this invention.

The present invention relates to a color filter with a touch panel and a method for manufacturing the same.
Hereinafter, the manufacturing method of the color filter with a touch panel and the color filter with a touch panel of the present invention will be described.

A. First, a color filter with a touch panel will be described.
The color filter with a touch panel of the present invention includes a transparent substrate, a touch panel having a touch panel sensor layer formed on one surface of the transparent substrate and a protective layer formed on the touch panel sensor layer, and the other of the transparent substrates. A color filter with a touch panel having a color filter formed on the surface of the adhesive layer, wherein the protective layer is made of a resin for the adhesion layer and a resin for the hardness layer formed in a pattern. The formed hardness layers are laminated in this order, and the hardness layer is formed inside the outer periphery of the adhesion layer in a plan view.

Such a color filter with a touch panel of the present invention will be described with reference to the drawings. FIG. 1 is a schematic plan view showing an example of a color filter with a touch panel according to the present invention. FIG. 2 is a cross-sectional view taken along line AA in FIG. As illustrated in FIGS. 1 and 2, the color filter 50 with a touch panel of the present invention includes a transparent substrate 1, a first transparent electrode 11 formed on one surface of the transparent substrate 1, and the first transparent electrode. 11 is formed on the touch panel sensor layer 10 and the second transparent electrode 13 laminated in this order, the interelectrode insulating layer 12 formed on the electrode 11 and the second transparent electrode 13 formed on the interelectrode insulating layer 12. A touch panel 30 having a protective layer 20 having a hardness layer 22 formed on the inner side of the outer periphery of the adhesion layer 21 in a plan view made of an adhesion layer 21 made of an adhesion layer resin and a hardness layer resin, and the transparent substrate 1. A light shielding part 31 having an opening formed on the other surface, and a color filter 40 having a colored layer 32 formed in the opening of the light shielding part 31.
Further, in this example, the touch panel sensor layer 10 has a takeout electrode 14 formed on the transparent substrate 1 around the interelectrode insulating layer 12, and the adhesion layer 21 and the hardness layer 22 are A pattern is formed so that the extraction electrode 14 is exposed.
In FIG. 1, the interelectrode insulating layer 12 and the protective layer 20 are not shown for ease of explanation.

  According to the present invention, the protective layer is composed of a hardness layer and an adhesion layer having excellent hardness, so that each layer mainly has only excellent curability, and the touch panel sensor layer, specifically, A material having excellent adhesion to the second transparent electrode made of a metal material included in the touch panel sensor layer in which the first transparent electrode, the interelectrode insulating layer, and the second transparent electrode are laminated in this order on the transparent substrate is used. Can be formed.

On the other hand, when the protective layer is composed of a single layer, if a material having excellent curability is used as a material constituting the protective layer, the touch panel sensor layer, more specifically, due to curing shrinkage is used. In particular, the adhesiveness with the second transparent electrode made of a metal material is lowered, and on the other hand, if the adhesiveness with the touch panel sensor layer is excellent, it becomes difficult to have sufficient hardness. .
In particular, as described later, when a color filter is formed after the touch panel is formed, the colored layers of the respective colors constituting the color filter are usually formed by a photolithography method. At this time, every time the colored layer of each color is formed, exposure, development, and heat treatment are applied, and each time the material constituting the protective layer is subjected to thermal degradation, etc., each performance of the material is reduced. Become. For this reason, if the material is not extremely excellent in both hardness and adhesion, either or both of hardness and adhesion may become less than desired performance during the formation of the color filter and may not function as a protective layer. There is.
On the other hand, as described above, the protective layer is composed of an adhesive layer excellent in adhesiveness with the touch panel sensor layer and a hardness layer disposed on the outermost surface of the touch panel. Any material suitable for the layer can be used. Therefore, the protective layer can be excellent in both hardness and adhesion, and maintain sufficiently high performance even if the performance deteriorates due to thermal deterioration during the formation of the color filter as described above. Can do it.

Further, the hardness layer is formed on the inner side of the outer periphery of the adhesion layer in a plan view, that is, the hardness layer having lower adhesion than the adhesion layer is formed so as not to be in direct contact with the touch panel sensor layer. By being formed on the touch panel sensor layer via the adhesion layer, it is possible to prevent the hardness layer from peeling off from the adhesive surface between the touch panel layer and the hardness layer. Further, since both the adhesion layer and the hardness layer are made of a resin, the adhesion between the adhesion layer and the hardness layer can be sufficiently high.
For this reason, the said protective layer can be made excellent in both hardness and adhesiveness, and can be made excellent in stability.

  Further, by having such a protective layer, for example, when forming a color filter with a touch panel having a touch panel on one surface of the transparent substrate and having a color filter on the other surface of the transparent substrate, Form the touch panel, and then place the transparent substrate on the base or pointed pin-shaped support with the touch panel side as the back side, or slide and transport the transparent substrate on the other side. Even when the color filter is formed in a state where it is in contact with or rubbed with the member, the protective layer has sufficient hardness and adhesion, and is excellent in stability, and the above-mentioned during the formation of the color filter. Since problems such as peeling of the hardness layer do not occur, the occurrence of scratches and peeling on each component of the touch panel sensor layer included in the touch panel is stable. It is possible to prevent. As a result, it is possible to prevent scratches and the like from being generated on the electrodes and the like included in the touch panel sensor layer, and it is possible to prevent occurrence of disconnection or poor sensitivity.

The color filter with a touch panel of the present invention has at least the transparent substrate, the touch panel, and the color filter.
Hereinafter, each structure of the color filter with a touchscreen of this invention is demonstrated in detail.

1. Touch panel The touch panel used in the present invention has the touch panel sensor layer and the protective layer.

(1) Protective layer The protective layer used in the present invention is obtained by laminating an adhesion layer and a hardness layer formed in a pattern in this order. Moreover, the said hardness layer is formed inside the outer periphery of the said contact | adherence layer by planar view.

(A) Adhesion layer The adhesion layer used in the present invention is formed in a pattern on the touch panel sensor layer. Moreover, it consists of said resin for adhesion layers.

  The adhesion strength of such an adhesion layer to the touch panel sensor layer is preferably evaluation classification 0 or 1 in the crosscut portion in the crosscut evaluation defined by JIS K 5600-5-6. It is because peeling of the protective layer can be more reliably prevented when the adhesion strength of the adhesion layer is within the above range.

The transmittance in the visible light region of the adhesion layer used in the present invention is not particularly limited as long as a protective layer having a desired transparency can be formed, and specifically, 80% or more. It is preferable that it is 90% or more. It is because the protective layer excellent in transparency can be formed by the said transmittance | permeability being in the said range.
Here, the transmittance of the adhesion layer is determined by using standard light C (JIS Z 8720 (standard illuminant for colorimetry (standard light) and standard light source)) and JIS Z 8701 (color display method-XYZ color system). And the Y value among the tristimulus values X, Y, and Z of the object color due to transmission, which is obtained by an equation defined by (X ₁₀ Y ₁₀ Z ₁₀ color system). As a measuring method of such transmittance, for example, it can be measured by JIS K7361-1 (Testing method of total light transmittance of plastic-transparent material). More specifically, a spectrophotometer OSP-SP2000 manufactured by Olympus Corporation can be used.

The thickness of the adhesion layer used in the present invention is not particularly limited as long as the desired adhesion can be exhibited. For example, it can be within a range of 1.5 μm or less, Especially, it can be in the range of 0.1 micrometer-1.5 micrometers, and can be in the range of 0.5 micrometer-0.75 micrometer especially. This is because when the thickness is within the above range, sufficient adhesion to the touch panel sensor layer can be exhibited.
The thickness of the adhesive layer refers to the distance from the surface of the touch panel sensor layer to the surface of the adhesive layer.

  As the formation part of the adhesion layer used in the present invention, the touch panel can detect the contact position stably and can stably protect each component of the touch panel sensor layer. Although there is no particular limitation as long as it is, only a connection terminal portion formed to connect to another substrate, such as a part of the extraction electrode connected to the electrode included in the touch panel sensor layer, is exposed. Preferably it is formed. It is because it is easy to protect each structure of the said touch-panel sensor layer stably and to be able to operate | move the said touch panel stably by forming in the said formation part.

The adhesive layer resin used in the present invention is not particularly limited as long as it has a desired adhesive property and can form a transparent adhesive layer in a pattern shape. It is preferable that it consists of a property material. This is because the pattern-like adhesion layer can be easily formed.
Such a photosensitive material is not particularly limited as long as it has photosensitivity and can form an adhesive layer having desired adhesiveness and transparency. For example, the above-mentioned polymer for forming an adhesive layer is used. Alternatively, it is preferable to use a composition for forming an adhesion layer containing at least a polyfunctional monomer for forming an adhesion layer, and in particular, the composition for forming an adhesion layer includes the polymer for forming an adhesion layer and the formation of an adhesion layer. It is preferable that it contains both the polyfunctional monomers for use. This is because an adhesion layer having better adhesion can be formed.

  Such a polymer for forming an adhesion layer is not particularly limited as long as it can form an adhesion layer having desired adhesion, but has a structural unit (1) having an unsaturated double bond. And it is preferable that content of the said structural unit (1) is 45 mol% or less in all the structural units which comprise the said polymer for adhesion layer formation, Especially content of the said structural unit (1) The amount is preferably in the range of 10 mol% to 40 mol%, particularly preferably in the range of 15 mol% to 35 mol% in the above-mentioned all structural units. This is because when the content of the structural unit (1) is within the above range, the adhesiveness can be improved.

  The structural unit (1) used in the present invention is not particularly limited as long as it has a saturated double bond that can be polymerized with the polyfunctional monomer for forming an adhesion layer at the time of exposure. The thing formed by making the carboxyl group of the structural unit (2) which has the said carboxyl group react with the epoxy group of the epoxy group containing compound which has an epoxy group and an unsaturated double bond can be mentioned.

  The structural unit (2) used in the present invention is not particularly limited as long as it has a carboxyl group and can form the structural unit (1), and examples thereof include a carboxyl group and an unsaturated double group. The thing formed by superposing | polymerizing the unsaturated double bond of the carboxyl group-containing monomer which has a bond can be mentioned.

  Specific examples of such a carboxyl group-containing monomer include acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, vinyl benzoic acid, caprolactone adduct of (meth) acrylic acid, and hydroxyalkyl (meth). An acrylate obtained by adding an acid anhydride such as phthalic anhydride can be used, and among them, acrylic acid and methacrylic acid are preferable. It is because it is excellent in the reactivity with the said epoxy group containing compound, and the said structural unit (1) can be formed stably.

As the epoxy group-containing compound in the present invention, an epoxy group capable of reacting with the carboxyl group of the structural unit (2) is particularly preferable as long as it can have an unsaturated double bond. For example, glycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, 2-methyl-3,4-epoxy-cyclohexyl (meth) acrylate, and the like can be given.
In the present invention, glycidyl (meth) acrylate is particularly preferable. This is because by using the above-mentioned compound as the epoxy group-containing compound, it is possible to form a protective layer superior in hardness.

The polymer for forming an adhesion layer used in the present invention preferably contains the structural unit (2) in addition to the structural unit (1), that is, has a carboxyl group in the side chain. This is because the adhesion layer forming polymer can be made excellent in developability.
The content of the structural unit (2) contained in the adhesion layer forming polymer used in the present invention is not particularly limited as long as the desired developability can be exhibited. Is preferably in the range of 5 mol% to 40 mol% in all the structural units constituting, and more preferably in the range of 10 mol% to 30 mol%. This is because when the content is within the above range, the developability can be improved.

  In addition, the polymer for forming an adhesion layer used in the present invention may include a structural unit (3) having an alkyl group.

The alkyl group in the present invention is not particularly limited as long as it can be a polymer for forming an adhesion layer that exhibits desired adhesion, and may be aliphatic, may be an aromatic ring, or other Those containing the functional group can be used.
In the present invention, an alkyl group having 1 to 12 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is particularly preferable. This is because when the alkyl group is the substituent, the adhesion layer-forming polymer can be synthesized stably.

  The structural unit (3) in the present invention is not particularly limited as long as it has the above alkyl group, and specifically, the unsaturated group of the alkyl group-containing monomer having the above alkyl group and an unsaturated double bond. The thing formed by superposing | polymerizing a double bond can be mentioned.

Specific examples of such an alkyl group-containing monomer include aliphatic (meth) acrylates such as methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and cyclohexyl (meth) acrylate, phenyl (meth) ) Aromatic-containing (meth) acrylates such as acrylate and phenoxyethyl (meth) acrylate, functional group (meth) acrylates such as hydroxyethyl (meth) acrylate, methoxyethyl (meth) acrylate, and the like can be used.
In the present invention, among these, cyclohexyl (meth) acrylate and phenyl (meth) acrylate are preferable. This is because by using the above-mentioned compound as the alkyl group-containing monomer, the adhesion layer forming polymer can be made more excellent in adhesion.

  The content of the structural unit (3) in the present invention is preferably in the range of 20 mol% to 60 mol% of the total structural units constituting the adhesion layer forming polymer, and in particular, 30 mol% to 50 mol. It is preferably within the range of mol%. This is because when the content is within the above range, the adhesion layer forming polymer can be more excellent in adhesion.

The content of the adhesion layer-forming polymer used in the present invention is not particularly limited as long as it can exhibit desired curability, developability, and the like. It is preferable that it exists in the range of 25 mass%-60 mass% in solid content of, and it is preferable that it exists in the range of 30 mass%-50 mass% especially. This is because when the content is within the above range, the adhesiveness can be excellent.
Here, the term “in the solid content” means all components other than the solvent contained in the composition for forming an adhesion layer.

The method for forming the adhesion layer-forming polymer used in the present invention is not particularly limited as long as it can accurately form a polymer having a desired structural unit. In the case of having the structural unit (1), a carboxyl group-containing monomer capable of forming the structural unit (2) is polymerized, and then the epoxy group-containing compound is converted to the carboxyl of the structural unit (2). A method of reacting with a group can be used.
In addition, it can have the said structural unit (1) and a structural unit (2) by making the said epoxy group containing compound react with a part of said structural unit (2).

  The polyfunctional monomer for forming an adhesion layer used in the present invention has a plurality of polymerizable functional groups, and the above-mentioned adhesion layer forming monomer and the above-mentioned adhesion layer forming polymer can be polymerized by light irradiation. Anything is fine.

  The number of functional groups of the polymerizable functional group of the polyfunctional monomer for forming an adhesion layer used in the present invention is not particularly limited as long as it is 2 or more, but 2 to 4 is preferable, 4 is preferable. This is because when the number of functional groups is within the above range, the adhesiveness can be improved.

  As the polyfunctional monomer for forming an adhesion layer used in the present invention, a polyfunctional (meth) acrylate having an acryloyl group or a methacryloyl group is usually used.

  Examples of such polyfunctional (meth) acrylates include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, hexanediol (meth) acrylate, long chain aliphatic di (meth) acrylate, neopentyl glycol di ( (Meth) acrylate, hydroxypivalate neopentyl glycol di (meth) acrylate, stearic acid modified pentaerythritol di (meth) acrylate, propylene di (meth) acrylate, glycerol (meth) acrylate, triethylene glycol di (meth) acrylate, tetra Ethylene glycol di (meth) acrylate, tetramethylene glycol di (meth) acrylate, butylene glycol di (meth) acrylate, dicyclopentanyl di (meth) acrylate Rate, polyethylene glycol di (meth) acrylate, polypropylene di (meth) acrylate, triglycerol di (meth) acrylate, neopentyl glycol modified trimethylolpropane di (meth) acrylate, allylated cyclohexyl di (meth) acrylate, methoxylated cyclohexyl Di (meth) acrylate, acrylated isocyanurate, bis (acryloxyneopentyl glycol) adipate, bisphenol A di (meth) acrylate, tetrabromobisphenol A di (meth) acrylate, bisphenol S di (meth) acrylate, butanediol di Bifunctional (meth) acrylates such as (meth) acrylate, di (meth) acrylate phthalate, di (meth) acrylate phosphate, zinc di (meth) acrylate Door and the like.

  Examples of the polyfunctional (meth) acrylate include trimethylolpropane tri (meth) acrylate, trimethylolethane tri (meth) acrylate, glycerol tri (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri ( (Meth) acrylate, alkyl-modified dipentaerythritol tri (meth) acrylate, tri (meth) acrylate phosphate, tris (acryloxyethyl) isocyanurate, tris (methacryloxyethyl) isocyanurate, pentaerythritol tetra (meth) acrylate, di Pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetraacrylate, alkyl-modified dipentaerythritol tetra (meth) acrylate, di Entaerythritol monohydroxypenta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, alkyl-modified dipentaerythritol penta (meth) acrylate, carboxylic acid-modified dipentaerythritol penta (meth) Trifunctional or higher functional (meth) acrylates such as acrylate, urethane tri (meth) acrylate, ester tri (meth) acrylate, urethane hexa (meth) acrylate, and ester hexa (meth) acrylate may be mentioned.

  These polyfunctional (meth) acrylates may be used alone or in combination of two or more.

  The content of the polyfunctional monomer for forming an adhesive layer used in the present invention may be any as long as it can form an adhesive layer having a desired adhesive property, and the solid content of the composition for forming an adhesive layer The content is preferably in the range of 15% by mass to 50% by mass, and more preferably in the range of 20% by mass to 45% by mass. This is because if it is less than the above range, the photocuring does not proceed sufficiently and the exposed part may be eluted, and if it exceeds the above range, it may be impossible to develop even the unexposed part.

  The composition for forming an adhesive layer used in the present invention contains the above-mentioned polymer for forming an adhesive layer and / or a polyfunctional monomer for forming an adhesive layer, and usually contains a photopolymerization initiator and a solvent. Moreover, it is preferable that an epoxy resin is included. This is because the inclusion of the epoxy resin can improve the adhesion with a metal, specifically, the second transparent electrode or the like constituting the touch panel sensor layer. Moreover, various additives and polymers and monomers other than the above-mentioned adhesion layer-forming polymer and adhesion layer-forming polyfunctional monomer can be included as necessary.

  The photopolymerization initiator used in the present invention is not particularly limited as long as it can polymerize the adhesive layer forming polyfunctional monomer and the adhesive layer forming polymer by light irradiation. A general thing can be used.

  Specifically, aromatic ketones such as benzophenone, Michler ketone, 4,4′-bisdiethylaminobenzophenone, 4-methoxy-4′-dimethylaminobenzophenone, 2-ethylanthraquinone, phenanthrene, benzoin methyl ether, benzoin ethyl ether, benzoin Benzoin ethers such as phenyl ether, benzoin such as methylbenzoin and ethylbenzoin, 2- (o-chlorophenyl) -4,5-phenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (m -Methoxyphenyl) imidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2,4 , 5-Triarylimidazole Dimer, 2- (o-chlorophenyl) -4,5-di (m-methylphenyl) imidazole dimer, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2 -Trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (p-cyanostyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- ( halomethylthiazole compounds such as p-methoxystyryl) -1,3,4-oxadiazole, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-S-triazine, 2,4-bis (trichloro) Methyl) -6- (1-p-dimethylaminophenyl-1,3-butadienyl) -S-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyrene Ru-S-triazine, 2- (naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- (4-ethoxy-naphth-1-yl) -4,6-bis-trichloro Halomethyl-S-triazine compounds such as methyl-S-triazine, 2- (4-butoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2,2-dimethoxy-1, 2-diphenylethane-1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone, 1,2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -Butanone-1,1-hydroxy-cyclohexyl-phenyl ketone, benzyl, benzoylbenzoic acid, methyl benzoylbenzoate, 4-benzoyl-4'-methyldiphenyl Rufide, benzylmethyl ketal, dimethylaminobenzoate, isoamyl P-dimethylaminobenzoate, 2-n-butoxyethyl-4-dimethylaminobenzoate, 2-chlorothioxanthone, 2,4 diethylthioxanthone, 2,4 dimethylthioxanthone, isopropylthioxanthone, Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -1- (o-acetyloxime), 4-benzoyl-methyldiphenyl sulfide, 1-hydroxy-cyclohexyl- Phenyl ketone, 2-benzyl-2- (dimethylamino) -1- [4- (4-morpholinyl) phenyl] -1-butanone, 2- (dimethylamino) -2-[(4-methylphenyl) methyl]- 1- [4- (4-mol Linyl) phenyl] -1-butanone, α-dimethoxy-α-phenylacetophenone, phenylbis (2,4,6-trimethylbenzoyl) phosphine oxide, 2-methyl-1- [4- (methylthio) phenyl] -2 Examples include photopolymerization initiators such as-(4-morpholinyl) -1-propanone and 1,2-octadione. In this invention, these photoinitiators can be used individually or in mixture of 2 or more types.

  As content of such a photoinitiator, what is necessary is just what can photocure the said composition for contact | adherence layer formation with a desired hardening rate, and 0.1 mass%-20 in solid content. It is preferably in the range of mass%, and particularly preferably in the range of 0.7 mass% to 10 mass%.

  The solvent contained in the composition for forming an adhesion layer used in the present invention is not particularly limited as long as it does not react with each component in the composition for forming an adhesion layer and can dissolve or disperse them. It is not a thing.

  Specifically, alcohols such as methanol and ethanol; ethers such as tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, and ethylene glycol monoethyl ether; methyl cellosolve acetate, ethyl Ethylene glycol alkyl ether acetates such as cellosolve acetate; diethylene glycols such as diethylene glycol monomethyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether; propylene glycol methyl ether Propylene glycol alkyl ether acetates such as cetate and propylene glycol ethyl ether acetate; aromatic hydrocarbons such as toluene and xylene; ketones such as methyl ethyl ketone, methyl amyl ketone, cyclohexanone and 4-hydroxy-4-methyl-2-pentanone And ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-2-methylbutanoate, Methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, 3-metho Shi butyl acetate, esters such as 3-methyl-3-methoxybutyl acetate; and the like. These solvents may be used alone or in combination of two or more.

  The content of the solvent used in the present invention in the composition for forming an adhesion layer is not particularly limited as long as the desired coatability can be obtained, but is 60% to 95% by mass. It is preferably within the range, and more preferably within the range of 70% by mass to 90% by mass. It is because it can be set as the viscosity suitable for application | coating with such content.

The epoxy resin used in the present invention is not particularly limited as long as the desired adhesion can be exhibited after the composition for forming an adhesion layer is cured. For example, a novolak epoxy, an alicyclic epoxy, a cardo epoxy, etc. that are liquid at room temperature can be mentioned. Eporide GT300, GT400 (manufactured by Daicel Chemical Industries), jer901, 801P, 802, 802XA, 806, 806L, 807, 815, 819, 825, 827, 828, 815XA, 828EL, 828XA, 152, 604, 630 (and above) And oil-coated shell epoxy), SPCA-35X (manufactured by Showa Polymer Co., Ltd.), and the like.
In the present invention, among others, Epolide GT300, GT400, and SPCA-35X can be preferably used. This is because an adhesion layer having excellent adhesion can be formed.

The content of the epoxy resin in the composition for forming an adhesion layer in the present invention is not particularly limited as long as desired adhesion can be obtained, but the solid content of the composition for forming an adhesion layer is not limited. The content is preferably in the range of 20% by mass to 40% by mass, and more preferably in the range of 30% by mass to 40% by mass. This is because when the content is within the above range, the adhesiveness can be excellent.
In addition, an epoxy equivalent can be calculated | required based on JISK7236.

  Examples of the additive used in the present invention include pigments, light-shielding fine particles, polymerization terminators, chain transfer agents, leveling agents, plasticizers, surfactants, antifoaming agents, silane coupling agents, and the like.

  The method for forming the composition for forming an adhesion layer used in the present invention is not particularly limited as long as it is a method capable of uniformly dispersing the respective components in the solvent. A dispersion method can be used.

The method for forming the adhesion layer used in the present invention is not particularly limited as long as the adhesion layer can be formed with high pattern accuracy, and more specifically, a method using the composition for adhesion layer formation, more specifically. It is preferable to use a method in which the adhesive layer forming composition is applied and dried to form a coating film, and then the pattern is exposed to the coating film and developed. This is because an adhesive layer having excellent adhesion can be formed with high pattern accuracy.
Further, when the adhesion layer resin is made of a non-photosensitive material, a method of forming a resist in a pattern and etching after forming a coating film made of the non-photosensitive material is used. it can.

(B) Hardness layer The hardness layer used for this invention consists of said resin for hardness layers. The hardness layer is formed inside the outer periphery of the adhesion layer in plan view.

As the formation location of the hardness layer used in the present invention, the hardness layer is formed inside the outer periphery of the adhesion layer in plan view, and the touch panel can stably detect the contact position. It is not particularly limited as long as it is a place that can stably protect each configuration of the touch panel sensor layer.
In the present invention, as illustrated in FIG. 3, the taper portion b of the hardness layer 22 is formed on the taper portion b of the adhesion layer 21, that is, the hardness layer 22 and adhesion The boundary between the flat part a where the film thickness of the layer 21 is uniform and the tapered part b where the film thickness is thinner than the flat part a is substantially the same in plan view. preferable. This is because the adhesive layer and the hardness layer formed inside the outer periphery of the adhesive layer can be easily and inexpensively formed using the same mask in plan view.
Specifically, when the adhesion layer and the hardness layer are formed using the composition for the adhesion layer and the composition for the hardness layer that have the same degree of photosensitivity, that is, the curability to exposure is the same, The amount of exposure of the coating film for the adhesion layer composition and the coating film for the hardness layer composition to the diffracted light region of the coating film for the hardness layer composition in the step of forming the adhesion layer By exposing so that the exposure amount to the diffracted light region of the coating film of the composition for the adhesion layer is smaller, the adhesion layer and the hardness layer of the above relationship can be easily and cost-effectively using a mask having the same opening. It is because it can form.
In addition, the said flat part is a site | part with a uniform film thickness, and includes the center part of each said layer. The tapered portion is formed at the outer peripheral end of the adhesion layer and the protective layer as shown in FIG. 3 and has been compared with a flat portion having a uniform film thickness. In the case where the film thickness is reduced and formed by irradiation with diffracted light, the film thickness is usually gradually decreased toward the end.
In addition, as shown in FIG. 4, the diffracted light region is a region around the opening of the mask in a plan view, and is a region that receives irradiation of diffracted light.
The exposure amount to the diffracted light region refers to an exposure amount for forming a tapered portion of each layer formed after exposure. Usually, as the exposure amount to the tapered portion increases, the taper portion increases. The area of the part in plan view is large. Therefore, when using a composition having the same degree of photosensitivity as the composition for the hardness layer and the composition for the adhesion layer, the exposure amount to the diffracted light region of the coating film of the composition for the hardness layer is determined in the adhesion layer forming step. By exposing so that the amount of exposure to the diffracted light region of the coating film of the adhesion layer composition of the adhesive layer is less than the planar view area of the taper portion of the hardness layer, the planar view area of the taper portion of the adhesion layer It can be narrow.
In addition, the planar view area of such a tapered portion is not limited to the above-described exposure amount, that is, the method of adjusting the intensity and time of the exposure light to be irradiated, and as described later, the difference in photosensitivity between the two compositions, etc. Accordingly, it is possible to control by using a method of adjusting an exposure gap which is a distance between the mask and the coating film.
Furthermore, the boundary between the hardness layer and the adhesion layer is substantially the same in a plan view. The boundary between the hardness layer and the adhesion layer formed when the adhesion layer and the hardness layer as described above are formed using the same mask. This means that the width is within the range of the deviation width. More specifically, it means that the deviation width of the boundary between the hardness layer and the adhesion layer is within 1 μm in plan view.

  The distance from the outer periphery of the adhesion layer of the outer periphery of the hardness layer in the present invention is not particularly limited as long as the hardness layer is formed inside the outer periphery of the adhesion layer in plan view, Specifically, it is preferably 1 μm or more, particularly preferably within a range of 1 μm to 10 μm, and particularly preferably within a range of 1 μm to 5 μm. This is because when the distance between the end portions is within the above-described range, the hardness layer can be stably formed on the inner side of the outer periphery of the adhesion layer in plan view.

As the pencil hardness of the hardness layer used in the present invention, each structure included in the touch panel should have few scratches and peeling even when the color filter is formed after the touch panel including the hardness layer is formed. However, it is preferably 4H or more, and more preferably in the range of 4H to 6H. This is because when the pencil hardness is within the above-described range, the hardness can be improved, and each component included in the touch panel can be less scratched or peeled off.
In addition, the hardness measuring method forms a hardness layer on a glass substrate, and can measure it based on prescription | regulation of JISK5600-5-4.

As the coefficient of static friction of such a hardness layer, even when the color filter is formed after the touch panel including the hardness layer is formed, each component included in the touch panel can be reduced in scratches and peeling. Although it will not specifically limit if it is a thing, It is preferable to exist in the range of 0.25-0.37, and it is preferable to exist in the range of 0.25-0.30 especially, and it is 0.8. It is preferable to be in the range of 25 to 0.28. This is because, when the static friction coefficient is within the above-described range, the slipperiness can be improved, and each configuration included in the touch panel can be made less scratched.
Here, the method for measuring the static friction coefficient is not particularly limited as long as it can be measured with high accuracy. For example, HEIDON Tribogear Muse TYPE manufactured by Shinto Kagaku Co., Ltd. is used for the hardness layer formed on glass. : A method of measuring using 94 i can be used. The slider (contactor) may be made of brass (hard chrome treatment) of 40 g, and the detector may be a method using a voice coil motor photosensor.

  The transmittance in the visible light region of the hardness layer used in the present invention is not particularly limited as long as a protective layer having a desired transparency can be formed, and specifically, 80% or more. It is preferable that it is 90% or more. It is because the protective layer excellent in transparency can be formed by the said transmittance | permeability being in the said range.

The thickness of the hardness layer used in the present invention is not particularly limited as long as it can exhibit desired hardness and slipperiness, but specifically, 1.0 μm to 5.0 μm. It is preferable to be within the range, and in particular, it is preferable to be within the range of 1.0 μm to 1.75 μm. This is because each component included in the touch panel can be less scratched or peeled off.
The thickness of the hardness layer refers to the distance from the surface of the adhesion layer to the surface of the hardness layer.

The hardness layer resin constituting the hardness layer used in the present invention is not particularly limited as long as the hardness layer having desired hardness and transparency can be formed in a pattern, but has a photosensitivity. It is preferably made of a photosensitive material. This is because the pattern-like hardness layer can be easily formed.
Such a photosensitive material is not particularly limited as long as it has photosensitivity and can form a hardness layer having desired hardness and transparency. For example, the above-mentioned polymer for forming a hardness layer or It is preferable to use a composition for forming a hardness layer containing at least a polyfunctional monomer for forming a hardness layer. Among these, the composition for forming a hardness layer is used for forming the polymer for forming a hardness layer and for forming a hardness layer. It is preferable that both of the polyfunctional monomers are included. This is because a hardness layer having higher hardness can be formed.

Such a polymer for forming a hardness layer is not particularly limited as long as it can form a hardness layer having a desired hardness, but has a structural unit (1) having an unsaturated double bond. And it is preferable that content of the said structural unit (1) is a thing of 70 mol% or more in all the structural units which comprise the said polymer for hardness layer formation, Especially, it is 75 mol%-90 mol%. It is preferable to be within the range. It is because the hardness layer excellent in hardness can be formed when the content of the structural unit (1) is within the above range.
The structural unit (1) may be any unit having an unsaturated double bond, and may be the same as that described in the section “(a) Adhesion layer”.

The polymer for forming a hardness layer in the present invention preferably contains the structural unit (2) in addition to the structural unit (1). This is because the hardness layer forming polymer can be made excellent in developability.
The content of the structural unit (2) contained in the polymer for forming a hardness layer used in the present invention is not particularly limited as long as the desired developability can be obtained. The content is preferably in the range of 10 mol% to 25 mol% in all the structural units to be constituted, and particularly preferably in the range of 15 mol% to 20 mol%. This is because when the content is within the above range, the developability can be improved.
The structural unit (2) may be any unit having a carboxyl group, and may be the same as that described in the above section “(a) Adhesion layer”.

In addition, the polymer for forming a hardness layer used in the present invention may include the structural unit (3) and the structural unit (4) having a fluorine-containing group.
In the present invention, it is particularly preferable to include the structural unit (4). This is because the hardness layer can be made excellent in slipperiness.

The content of the structural unit (3) in the present invention is not particularly limited as long as a hardness layer having a desired hardness can be obtained, but 5 of all the structural units constituting the polymer for forming a hardness layer. It is preferably in the range of mol% to 10 mol%. This is because, when the content is within the above range, the polymer for forming a hardness layer can be excellent in dispersion stability in a solvent.
The structural unit (3) may be the same as that described in the section “(a) Adhesion layer”.

The fluorine-containing group in the present invention is not particularly limited as long as it can impart slipperiness to the surface of the hardness layer, and specific examples include trifluoromethyl (CF ₃ ) and the like. be able to. It is because the hardness layer excellent in slipperiness can be formed by including the functional group as the fluorine-containing group.

  The structural unit (4) in the present invention is not particularly limited as long as it has the fluorine-containing group and can exhibit a desired slip property. The thing formed by superposing | polymerizing the unsaturated double bond of the fluorine-containing group containing monomer which has a saturated double bond can be mentioned.

  Such a fluorine-containing group-containing monomer is not particularly limited as long as it can have the above-described fluorine-containing group. For example, 2,2,2-trifluoroethyl methacrylate, 2- (Perfluorobutyl) ethyl methacrylate, 2- (perfluorohexyl) ethyl methacrylate, α-butyl-ω- (3-methacryloxypropyl) -polydimethylsiloxane can be mentioned, among others, 2- (perfluorohexyl) ) Ethyl methacrylate, α-butyl-ω- (3-methacryloxypropyl) -polydimethylsiloxane. This is because the structural unit (4) having the fluorine-containing group can be accurately introduced into the polymer by using the above-mentioned compound as the fluorine-containing group-containing monomer.

  The content of the structural unit (4) in the present invention is not particularly limited as long as it can form a hardness layer having excellent hardness and slipperiness. It is preferably in the range of 0.1 mol% to 8 mol% in the structural unit, more preferably in the range of 1 mol% to 6 mol%, and in particular 2 mol% to 4 mol%. It is preferable to be within the range. This is because when the content is within the above-described range, a hardness layer having particularly excellent slipperiness can be formed.

  The content of the polymer for forming a hardness layer used in the present invention is not particularly limited as long as it can exhibit desired curability, developability, and the like. Is preferably in the range of 10% by mass to 50% by mass, and more preferably in the range of 15% by mass to 35% by mass. It is because it can be set as the hardness layer excellent in hardness because the said content is in the above-mentioned range.

  The method for forming the polymer for forming a hardness layer used in the present invention is not particularly limited as long as it can accurately form a polymer having a desired structural unit. In the case of having the structural unit (1) and the structural unit (4), the carboxyl group-containing monomer and the fluorine-containing group-containing monomer capable of forming the structural unit (2) are polymerized, and then the epoxy A method of reacting the group-containing compound with the carboxyl group of the structural unit (2) can be used.

The polyfunctional monomer for forming a hardness layer used in the present invention has a plurality of polymerizable functional groups, and the above-mentioned monomer for forming a hardness layer and the above polymer for forming a hardness layer can be polymerized by light irradiation. Anything is fine.
The number of functional groups of such a polyfunctional monomer for forming a hardness layer is not particularly limited as long as it is 2 or more, but is preferably 5 or more, and more preferably 5 to 6. preferable. This is because when the number of functional groups is within the above range, the hardness can be improved.

  As the polyfunctional monomer for forming a hardness layer used in the present invention, a polyfunctional (meth) acrylate having an acryloyl group or a methacryloyl group is usually used. Such a polyfunctional (meth) acrylate may be the same as that described in the above section “(a) Adhesion layer”.

  The content of the polyfunctional monomer for forming a hardness layer used in the present invention is not particularly limited as long as it can form a hardness layer having a desired hardness, and the solid content of the composition for forming a hardness layer is not particularly limited. In addition, it is preferably within a range of 40% by mass to 90% by mass, and particularly preferably within a range of 50% by mass to 80% by mass, and particularly within a range of 60% by mass to 75% by mass. It is preferable. This is because if it is less than the above range, photocuring does not proceed sufficiently and the exposed part may be eluted, and if it exceeds the above range, it may become impossible to develop even in an unexposed part.

The composition for forming a hardness layer used in the present invention contains the above-mentioned polymer for forming a hardness layer and a polyfunctional monomer for forming a hardness layer, but usually contains a photopolymerization initiator and a solvent. In addition, various additives and polymers and monomers other than the above-mentioned hardness layer forming polymer and hardness layer forming polyfunctional monomer can be included as necessary.
Such a photopolymerization initiator, a solvent and an additive, and the contents thereof can be the same as the contents described in the above section “(a) Adhesion layer”.

  The method for forming the hardness layer used in the present invention is not particularly limited as long as it is a method capable of forming the hardness layer with high pattern accuracy, and the same method as that of the “(a) adhesion layer” is used. Can be used.

(2) Touch panel sensor layer The touch panel sensor layer used in the present invention is formed on the transparent substrate.
As such a touch panel sensor layer, a material used for a general touch panel can be used. For example, a first transparent electrode formed on the transparent substrate and made of a transparent metal material, the first first electrode, and the like. The inter-electrode insulating layer formed on the transparent electrode, and the second transparent electrode formed on the inter-electrode insulating layer and made of a transparent metal material, that is, the touch panel is the first transparent electrode , An insulating layer between electrodes, a second transparent electrode, and a protective layer may be laminated in this order. Moreover, the extraction electrode formed on the said transparent substrate is included.
Such a first transparent electrode, an interelectrode insulating layer, a second transparent electrode and an extraction electrode, and a method for forming the first transparent electrode and the insulating layer can be the same as those used for a general touch panel.
Specifically, examples of the metal material constituting the first transparent electrode and the second transparent electrode include indium tin oxide (ITO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, and aluminum. Examples thereof include added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, and metal oxides such as zinc oxide-tin oxide system, indium oxide-tin oxide system, and zinc oxide-indium oxide-magnesium oxide system. In the present invention, two or more of these metal oxides may be combined.
Further, as the opaque electrode material such as the extraction electrode, a metal material having a higher electric conductivity than the transparent electrode material may be used. Examples include metals such as aluminum, molybdenum, palladium, silver, chromium, and copper, alloys based on them, and laminates containing these alloys.
When the electrode is made of the metal material, the surface thereof may be subjected to surface treatment such as UV ozone or oxygen plasma. However, as described above, the electrode is used in the present invention. Since the adhesion layer to be formed exhibits high adhesion with the electrode material, it is possible to eliminate these treatments.

2. Color filter The color filter used in the present invention is formed on the other surface of the transparent substrate.
Such a color filter can be the same as that generally used for a liquid crystal display device, an electroluminescence display device, etc., and is usually formed on the transparent substrate and has a light-shielding portion having an opening, It has a colored layer, a spacer, an overcoat layer, a transparent electrode, an alignment film and the like formed in the opening of the light shielding portion.
About each structure and formation method of such a color filter, it can be made the same as that of what is used for a general color filter, for example, can be made the same as the content of Unexamined-Japanese-Patent No. 2010-014870.

3. Transparent substrate The transparent substrate used in the present invention supports the touch panel and the color filter.
The material constituting such a transparent substrate can be the same as that of a transparent substrate used for a touch panel or a color filter, and can be the same as, for example, the content described in JP 2010-014870 A.

  The thickness of the transparent substrate in the present invention is not particularly limited as long as it can support the touch panel and the color filter. For example, the thickness of the transparent substrate is within a range of 0.3 μm to 1.6 μm, for example. Can be the same as those generally used for

4). Color filter with a touch panel The color filter with a touch panel of the present invention includes at least the transparent substrate, the touch panel, and a color filter, but may have other configurations as necessary.

  The method for producing a color filter with a touch panel of the present invention is not particularly limited as long as it is a method that can stably form each of the above-described structures. For example, the adhesion layer and the hardness layer may be formed in the size of the opening. Although a method of forming by exposing through a different mask can be mentioned, a method of forming using the same mask described later is preferably used. This is because a color filter with a touch panel in which the hardness layer is formed on the inner side of the outer periphery of the adhesion layer in a plan view can be manufactured easily and at low cost.

  Applications of the color filter with a touch panel of the present invention include, for example, a display device with a touch panel, specifically, a liquid crystal display device with a touch panel, an organic electroluminescent display device with a touch panel, and the like. It is preferable to use this for a display device with a touch panel that has no flaws / peeling in each of the components and has few sensitivity defects.

B. Next, a method for manufacturing a color filter with a touch panel according to the present invention will be described.
In the method for producing a color filter with a touch panel of the present invention, the adhesion layer is formed by exposing the coating film of the composition for adhesion layer on the touch panel sensor layer formed on one surface of the transparent substrate. A method of manufacturing a color filter with a touch panel, comprising: a step, and a hardness layer forming step of forming a hardness layer by exposing a coating film of the composition for a hardness layer on the adhesion layer, wherein the hardness layer is formed Using the same mask as the mask used for the exposure in the adhesion layer forming step, the exposure amount to the diffracted light region of the coating film of the hardness layer composition is the adhesion layer in the adhesion layer forming step. It is what exposes so that it may become less than the exposure amount to the diffracted-light area | region of the coating film of the composition for a thing.

The manufacturing method of such a color filter with a touch panel of the present invention will be described with reference to the drawings. FIG. 5 is a process diagram showing an example of a method for producing a color filter with a touch panel according to the present invention. As illustrated in FIG. 5, the transparent substrate 1 is prepared, and the touch panel sensor layer having the first transparent electrode, the interelectrode insulating layer, the second transparent electrode, and the extraction electrode on one surface of the transparent substrate 1. 10 is then applied and dried on the second transparent electrode to form the adhesion layer coating film 21 'to be exposed (FIG. 5 (a)). Then, the adhesion layer 21 is formed by developing, and then the hardness layer forming composition is coated and dried on the adhesion layer 21 to form the hardness layer coating film 22 ′. The coating film 22 ′ is exposed with a narrower gap than that used when the coating film 21 ′ is exposed with the same mask and exposure intensity as those used for the exposure to the coating film 21 ′ for the adhesion layer. By doing so, the amount of exposure to the diffracted light region of the hardness layer coating film 22 ′ is as described above. It exposes so that it may become less than the exposure amount to the diffracted-light area | region of the coating film 21 'for layering (FIG.5 (b)), and it develops so that it may become in the said contact | adherence layer 21 on planar view. Then, the hardness layer 22 is formed to obtain the protective layer 20. Thereby, the touch panel 30 is formed (FIG. 5C). Thereafter, as shown in FIG. 5D, a color filter having a light shielding part 31 having the opening and a colored layer 32 formed in the opening of the light shielding part 31 on the other surface of the transparent substrate 1. 40 is formed, and the color filter 50 with a touch panel is manufactured.
FIG. 5A shows the adhesion layer forming step, and FIG. 5B shows the hardness layer forming step.

  According to the present invention, by having the hardness layer forming step, it is possible to easily and inexpensively manufacture a color filter with a touch panel in which the hardness layer is formed inside the outer periphery of the adhesion layer in a plan view. it can.

The method for producing a color filter with a touch panel of the present invention includes at least the adhesion layer forming step and the hardness layer forming step.
Hereinafter, each process included in the manufacturing method of the color filter with a touchscreen of this invention is demonstrated in detail.

1. Adhesion layer formation process The adhesion layer formation process in this invention is a process of forming an adhesion layer by exposing the coating film of the composition for adhesion layers.

  In this step, the method for forming the adhesive layer by exposing the coating film of the adhesive layer composition is not particularly limited as long as it can form an adhesive layer having a desired pattern with high accuracy. However, the method of forming the coating film of the said composition for contact | adherence layers, exposing and developing the said coating film is mentioned.

  The adhesive layer composition used in this step is not particularly limited as long as the adhesive layer having a desired pattern can be formed by a photolithography method, but the above-mentioned “A. Color filter with touch panel” Those described in the section can be used.

  In this step, the method for forming the coating film of the adhesive layer composition is not particularly limited as long as it is a method capable of forming the coating film having a uniform film thickness by applying the adhesive layer composition. However, known coating methods such as a die coating method, a spin coating method, a dip coating method, a roll coating method, a bead coating method, a spray coating method, a bar coating method, and a gravure coating method can be used.

Moreover, in this process, you may give the drying process which dries the formed coating film after application | coating of the said composition for contact | adherence layers. It is because productivity can be improved by removing the solvent etc. which are contained in the said composition for contact | adherence layers at an early stage.
As a method for the drying treatment, for example, a general method such as heat drying, air drying, vacuum drying, infrared heat drying, or the like can be used.

In this step, as a method of exposing the coating film of the adhesive layer composition, a method used in a general photolithography method can be used. For example, the adhesive layer composition is a negative type photosensitive. In the case of an adhesive material, it is possible to use a method of exposing through a mask having an opening at a location where the adhesion layer is formed.
In this step, it is preferable to use a method in which the mask is exposed with a predetermined gap from the coating film of the adhesive layer composition. This is because an adhesive layer having a larger area in plan view than the hardness layer can be easily formed using one mask.

  The gap between the coating film and the mask in this step is not particularly limited as long as an adhesive layer having a desired pattern can be formed, but specifically, a range of 100 μm to 400 μm. It is preferable to be within, and it is particularly preferable to be within the range of 150 μm to 350 μm. This is because when the gap is within the above range, it is easy to stably form an adhesion layer having a larger area in plan view than the hardness layer.

  In this step, as a method for developing the coating film after the exposure, a method generally used in a photolithography method can be used, and a method of dipping or applying a developer in a developer can be used. . Further, an alkaline aqueous solution can be used as the developer.

  The adhesion layer formed in this step may be any layer that has good adhesion on the touch panel sensor layer, and is the same as the content described in the section “A. Color filter with touch panel”. it can.

2. Hardness layer forming step The hardness layer forming step in the present invention is a step of forming a hardness layer on the adhesive layer by exposing a coating film of the composition for hardness layer, and is used for the exposure of the adhesive layer forming step. The exposure amount to the diffracted light region of the coating film of the hardness layer composition is the same as the mask used for the diffracted light region of the coating layer of the adhesive layer composition in the adhesion layer forming step. It exposes so that it may become less than exposure amount.

In this step, as a method of forming the hardness layer by exposing the coating film of the composition for hardness layer, the method can form the hardness layer with high accuracy inside the outer periphery of the adhesion layer in plan view. Although there is no particular limitation as long as it is present, a method of forming a coating film of the above-mentioned composition for hardness layer and exposing and developing the above-mentioned coating film can be mentioned.
In addition, about the method of forming the said coating film, and the method of developing the said coating film, it can be made to be the same as that of the method as described in the term of the said "1. adhesion layer formation process."

  The composition for the hardness layer used in this step is not particularly limited as long as it can form a hardness layer having a desired pattern by a photolithography method, but the above-mentioned “A. Color filter with touch panel” Those described in the section can be used.

  In this step, the method for exposing the coating film of the hardness layer composition uses the same mask as that used for the exposure in the adhesion layer forming step, and the coating film of the hardness layer composition is applied to the diffracted light region. In this method, the exposure is performed so that the exposure amount is less than the exposure amount to the diffracted light region of the coating film of the adhesion layer composition in the adhesion layer forming step.

  In this step, the exposure amount to the diffracted light region of the coating film of the hardness layer composition is less than the exposure amount to the diffracted light region of the coating layer of the adhesion layer composition in the adhesion layer forming step. As an exposure method, the exposure amount to the diffracted light region can be reduced using the same mask, and the taper portion of the hardness layer can be formed in the taper portion of the adhesion layer in plan view. It is not particularly limited, for example, as shown in FIG. 5 described above, from the gap between the coating film of the adhesion layer composition and the mask, the coating film of the hardness layer composition and the mask A method of narrowing the gap, a method of making the gap between the coating film and the mask the same, and making an exposure time shorter than an exposure time in the adhesion layer forming step, a gap between the coating film and the mask and exposure The time is the same The strength can be mentioned a method in which weaker than the exposure strength at the adhesive layer forming step.

  The hardness layer formed in this step is not particularly limited as long as it is accurately formed inside the outer periphery of the adhesion layer, and is the same as the content described in the section “A. Color filter with touch panel”. Can do.

3. Manufacturing method of color filter with touch panel The manufacturing method of the color filter with touch panel of the present invention includes at least the adhesion layer forming step and the hardness layer forming step. A touch panel sensor layer forming step of forming a sensor layer on one surface of the transparent substrate and a color filter forming step of forming a color filter on the other surface of the transparent substrate are provided. Moreover, it can have another process as needed.

  In addition, about such a touch panel sensor layer, a color filter, and these formation methods, it can be made to be the same as that of the content described in the above-mentioned item of "A. Color filter with a touch panel."

  In the present invention, it is preferable that the color filter forming step is performed after the hardness layer forming step, that is, the color filter is formed after the touch panel including the protective layer is formed. This is because the color filter can be stably formed. In addition, as a method of forming the color filter in the color filter forming step at that time, the formation of each component of the color filter is performed such that the transparent substrate after the hardness layer forming step has the touch panel side as the back side and a stand or the like. It is preferable to be performed in a state of being placed on the top, that is, in a state where the protective layer is in contact with another member. This is because the color filter can be stably formed. Moreover, since the said adhesion layer formation process and the hardness layer formation process can form the protective layer excellent in hardness and adhesiveness, this process is in the state which the said protective layer contacted with the other member. This is because even if it is performed, it is possible to prevent scratches and peeling on each component included in the touch panel. Therefore, the effect of the present invention can be exhibited more effectively.

  As another process in this invention, it is preferable to include the conveyance process which mounts and transfers the transparent substrate after the said hardness layer formation process on conveyance members, such as a stand, with the said touch panel side as a back surface, for example. As described above, since the adhesive layer forming step and the hardness layer forming step have a touch panel having the protective layer having the adhesive layer and the hardness layer on the outermost surface, the touch panel side is the back surface, and on the conveying member. Even when it is placed on the touch panel, it is possible to prevent the components included in the touch panel from being scratched or peeled. For this reason, even if it has a conveyance process as mentioned above, it is because the color filter with a touch panel excellent in quality can be manufactured stably.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

1. Method for producing polymer
[Synthesis Example 1]
In a flask equipped with a stirrer, a nitrogen gas inlet tube, a thermometer and a reflux condenser, 120 parts by mass of propylene glycol monomethyl ether (PGME), 10 parts by mass of methyl methacrylate (MMA), 80 parts by mass of methacrylic acid (MAA), 2 After charging 10 parts by mass of-(perfluorohexyl) ethyl methacrylate and introducing nitrogen gas into the flask and stirring for 30 minutes to perform nitrogen substitution, the contents of the flask were heated to 90 ° C. Next, while maintaining the contents in the flask at 90 ° C., 4 parts by mass of β-mercaptopropionic acid (BMPA) and 0.1 parts by mass of dimethyl 2,2-azobis (2-methylpropionate) were added to initiate polymerization. did. 0.4 parts by mass of 2,2-azobis (2-methylpropinate) was added 3 times in total every hour from the start of polymerization. Six hours after the start of polymerization, 50 parts by mass of PGME was added and cooled to room temperature.
After allowing the polymer to stand for about 10 hours, after confirming that the oxygen concentration in the flask has returned to about 20%, 0.1 parts by mass of methoquinone (MEHQ) and 140 parts by mass of glycidyl methacrylate (GMA) are contained in the flask. And 100 parts by mass of PGME were added, and the temperature was raised to 95 ° C. Then, 7 parts after adding 1 part by mass of triethylamine (TEA) while maintaining the contents of the flask at 95 ° C., the mixture was cooled to room temperature. After cooling, 22 parts by mass of maleic anhydride, 0.3 parts by mass of MEHQ, and 10 parts by mass of PGME were added, and the temperature was raised to 95 ° C. again. Then, while maintaining the contents of the flask at 95 ° C., 7 parts after adding 1 part by weight of dimethylaminopyridine (DMAP), 80 parts by weight of PGME was added, and the polymer (A) was cooled to room temperature. Obtained. The polymer concentration was 38%.
The weight average molecular weight of the obtained polymer was 15,000, and the resin acid value was 70 mgKOH / g.

[Synthesis Example 2]
A flask equipped with a stirrer, a nitrogen gas inlet tube, a thermometer and a reflux condenser is charged with 120 parts by mass of PGME, 60 parts by mass of methyl methacrylate (MMA) and 40 parts by mass of methacrylic acid (MAA), and nitrogen gas is introduced into the flask. The mixture was stirred for 30 minutes and purged with nitrogen, and then the contents of the flask were heated to 90 ° C. Next, while maintaining the contents in the flask at 90 ° C., 4 parts by mass of BMPA and 0.1 part by mass of dimethyl 2,2-azobis (2-methylpropinate) were added to initiate polymerization. 0.4 parts by mass of 2,2-azobis (2-methylpropinate) was added 3 times in total every hour from the start of polymerization. Six hours after the start of polymerization, 50 parts by mass of PGME was added and cooled to room temperature.
After allowing the polymer to stand for about 10 hours, after confirming that the oxygen concentration in the flask had returned to about 20%, MEHQ 0.1 parts by mass, GMA 25 parts by mass and PGME 100 parts by mass were added to the flask. The temperature was raised to ° C. Next, 7 parts after adding 1 part by mass of TEA while maintaining the contents of the flask at 95 ° C., the mixture was cooled to room temperature to obtain a polymer (B). The polymer concentration was 38%.
The weight average molecular weight of the obtained polymer was 27,000, and the resin acid value was 95 mgKOH / g.

2. Resist blending method Resist A and resist B were prepared according to the following blending.
(Resist A)
Solvent: PGME content 80% by mass
Polymer: Polymer A content 4% by mass (in terms of solid content)
Monomer: Compound name DPHA (dipentaerythritol hexaacrylate) manufactured by Nippon Kayaku Content: 14% by mass
Initiator: Product name Irg.907, manufactured by BASF Inc. Content 1% by mass
Epoxy resin: Product name GT401 Made by Daicel Chemical Industries Content 1% by mass
(Resist B)
Solvent: PGME content 80% by mass
Polymer: Polymer B content 6% by mass (in terms of solid content)
Monomer: Compound name M408 (ditrimethylolpropane tetraacrylate) manufactured by Toa Gosei Co., Ltd. Content: 7% by mass
Initiator: Product name Irg. 819, manufactured by BASF Inc. Content 1% by mass
Epoxy resin: Product name GT401 Made by Daicel Chemical Industries Content 6% by mass

[Example 1]
The resist B obtained above was spin-coated on an ITO electrode substrate so that the thickness after drying was 1.0 μm, and left on a 90 ° C. hot plate for 3 minutes (preliminary drying), under the following conditions: Then, exposure was performed using a square mask with a side of 50 μm. Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a square pattern. Thereby, an adhesion layer was formed.
(Resist B exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 350 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

Next, the resist A is spin-coated on the substrate obtained above so that the thickness after drying becomes 1.5 μm, and left to stand on a 90 ° C. hot plate for 3 minutes (preliminary drying). Exposure was performed using a mask under the following conditions. Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a relief pattern. Thereby, a hardness layer was formed, and a protective layer composed of an adhesion layer and a hardness layer was formed.
(Resist A exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 100 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

[Example 2]
A protective layer composed of an adhesion layer and a hardness layer was formed in the same manner as in Example 1 except that the exposure conditions for the resists A and B were as follows.
(Resist B exposure conditions)
Exposure gap: 150 μm
Exposure amount: 200 mJ / cm ²
(Resist A exposure conditions)
Exposure gap: 150 μm
Exposure amount: 30 mJ / cm ²

[Comparative Example 1]
Resist B was spin-coated on the ITO electrode substrate so that the thickness after drying was 1.0 μm, and left on a 90 ° C. hot plate for 3 minutes (preliminary drying), and mask exposure was performed under the following conditions. . Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a relief pattern. This formed the protective layer which consists only of an adhesion layer.
(Resist B exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 350 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

[Comparative Example 2]
The resist A was spin-coated on the ITO electrode substrate so that the thickness after drying was 1.5 μm, left on a 90 ° C. hot plate for 3 minutes (preliminary drying), and mask exposure was performed under the following conditions. . Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a relief pattern. Thus, the protective layer which consists only of a hardness layer was formed.
(Resist A exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 150 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

[Comparative Example 3]
A protective layer composed of an adhesion layer and a hardness layer was formed in the same manner as in Example 1 except that the exposure conditions for the resists A and B were as follows.
(Resist B exposure conditions)
Exposure gap: 150 μm
Exposure amount: 50 mJ / cm ²
(Resist A exposure conditions)
Exposure gap: 150 μm
Exposure amount: 100 mJ / cm ²

[Comparative Example 4]
A protective layer composed of an adhesion layer and a hardness layer was formed in the same manner as in Example 1 except that the exposure conditions for the resists A and B were as follows.
(Resist B exposure conditions)
Exposure gap: 150 μm
Exposure amount: 50 mJ / cm ²
(Resist A exposure conditions)
Exposure gap: 300 μm
Exposure amount: 50 mJ / cm ²

[Comparative Example 5]
The resist A was spin-coated on the ITO electrode substrate so that the thickness after drying was 1.0 μm, and left on a 90 ° C. hot plate for 3 minutes (preliminary drying). Exposure was performed using a square mask. Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a square pattern. Thereby, an adhesion layer was formed.

(Resist B exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 350 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

  Next, the resist B is spin-coated on the substrate obtained above so that the thickness after drying is 1.5 μm, and left on a 90 ° C. hot plate for 3 minutes (preliminary drying). Exposure was performed using a mask under the following conditions. Next, development was performed for 60 seconds using a 0.05% aqueous potassium hydroxide solution as a developing solution to remove uncured portions. Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment to form a relief pattern. Thereby, a hardness layer was formed, and a protective layer composed of an adhesion layer and a hardness layer was formed.

(Resist A exposure conditions)
Exposure machine: Proximity aligner Exposure machine Mask: Chromium mask Exposure gap: 100 μm
Light source: Ultra high pressure mercury lamp Exposure amount: 50 mJ / cm ²

[Evaluation]
About the board | substrate obtained by the Example and the comparative example, it evaluated about the adhesiveness of an ITO board | substrate and a protective layer, and the pencil hardness of the protective layer surface.
(1) Adhesiveness The evaluation method of adhesiveness was performed according to JIS K 5600-5-6. The evaluation was judged according to the following criteria. The results are shown in Table 1 below.
○: Evaluation classification 0 or 1
X: 2 to 5 in the evaluation classification

(2) Pencil hardness The hardness was measured with respect to the protective layer formed on the ITO electrode substrate in accordance with JIS K 5600-5-4. The results are shown in Table 1 below.

  As shown in Table 1, it was confirmed that the protective layers obtained in Examples 1 and 2 were excellent in both adhesion and hardness. Further, the protective layers obtained in Examples 1 and 2 are such that the width of the hardness layer is narrower than the width of the adhesion layer, and the hardness layer is formed inside the outer periphery of the adhesion layer in plan view. I was able to.

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 10 ... Touch-panel sensor layer 11 ... 1st transparent electrode 12 ... Interelectrode insulating layer 13 ... 2nd transparent electrode 14 ... Extraction electrode 20 ... Protective layer 21 ... Adhesion layer 22 ... Hardness layer 30 ... Touch panel 31 ... Light-shielding part 32 ... Color layer 40 ... Color filter 50 ... Color filter with touch panel

Claims (7)

A transparent substrate;
A touch panel having a touch panel sensor layer formed on one surface of the transparent substrate and a protective layer formed on the touch panel sensor layer;
A color filter formed on the other surface of the transparent substrate;
A color filter with a touch panel having
The protective layer is formed by laminating an adhesive layer made of an adhesive layer resin in a pattern and a hardness layer made of a resin for a hardness layer and formed in a pattern in this order,
The color filter with a touch panel, wherein the hardness layer is formed inside the outer periphery of the adhesion layer in a plan view.   The color filter with a touch panel according to claim 1, wherein the tapered portion of the hardness layer is formed on the tapered portion of the adhesion layer.   The color filter with a touch panel according to claim 1 or 2, wherein a static friction coefficient of the hardness layer is in a range of 0.25 to 0.37, and a pencil hardness is 4H or more.   The adhesion force of the adhesion layer to the touch panel sensor layer is evaluation classification 0 or 1 in a crosscut portion in a crosscut evaluation defined by JIS K 5600-5-6. The color filter with a touch panel according to claim 3. The resin for hardness layer is formed by using a composition for forming a hardness layer including a polymer for forming a hardness layer having the structural unit (1) having an unsaturated double bond and a polyfunctional monomer for forming the hardness layer. ,
The adhesion layer resin is formed by using an adhesion layer forming composition containing an adhesion layer forming polymer having a structural unit (1) having an unsaturated double bond,
The content of the structural unit (1) of the hardness layer forming polymer is 70 mol% or more in all the structural units constituting the hardness layer forming polymer,
The number of polymerizable functional groups of the polyfunctional monomer for forming the hardness layer is 5 or more,
The content of the structural unit (1) in the adhesion layer forming polymer is 45 mol% or less in all the structural units constituting the adhesion layer forming polymer. The color filter with a touchscreen as described in any one of Claims. The resin for hardness layer is formed by using a composition for forming a hardness layer including a polymer for forming a hardness layer having the structural unit (1) having an unsaturated double bond and a polyfunctional monomer for forming the hardness layer. ,
The adhesive layer resin is formed by using an adhesive layer forming composition containing an adhesive layer forming polyfunctional monomer,
The content of the structural unit (1) of the hardness layer forming polymer is 70 mol% or more in all the structural units constituting the hardness layer forming polymer,
The number of polymerizable functional groups of the polyfunctional monomer for forming the hardness layer is 5 or more,
The color with a touch panel according to any one of claims 1 to 4, wherein the number of polymerizable functional groups of the polyfunctional monomer for forming the adhesion layer is in the range of 2 to 4. filter. An adhesion layer forming step of forming an adhesion layer by exposing a coating film of the composition for adhesion layer on the touch panel sensor layer formed on one surface of the transparent substrate;
A hardness layer forming step of forming a hardness layer by exposing a coating film of the composition for a hardness layer on the adhesion layer, and a method for producing a color filter with a touch panel,
In the adhesion layer forming step, the hardness layer forming step uses the same mask as the mask used for the exposure in the adhesion layer forming step, and the exposure amount to the diffracted light region of the coating film of the hardness layer composition is the adhesion layer forming step. A method for producing a color filter with a touch panel, wherein the exposure is carried out so as to be less than the amount of exposure to the diffracted light region of the coating film of the adhesive layer composition.

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