TW201529316A - Surface protection film, method for manufacturing surface protection film, and optical member - Google Patents

Surface protection film, method for manufacturing surface protection film, and optical member Download PDF

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TW201529316A
TW201529316A TW103140524A TW103140524A TW201529316A TW 201529316 A TW201529316 A TW 201529316A TW 103140524 A TW103140524 A TW 103140524A TW 103140524 A TW103140524 A TW 103140524A TW 201529316 A TW201529316 A TW 201529316A
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TWI643749B (en
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Kenichi Kataoka
Hiromoto Haruta
Tatsumi Amano
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Nitto Denko Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D165/00Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/21Anti-static
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/416Reflective
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/42Polarizing, birefringent, filtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/202LCD, i.e. liquid crystal displays
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10Definition of the polymer structure
    • C08G2261/14Side-groups
    • C08G2261/142Side-chains containing oxygen
    • C08G2261/1424Side-chains containing oxygen containing ether groups, including alkoxy
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/32Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
    • C08G2261/322Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed
    • C08G2261/3223Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed containing one or more sulfur atoms as the only heteroatom, e.g. thiophene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/50Physical properties
    • C08G2261/51Charge transport
    • C08G2261/512Hole transport
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/70Post-treatment
    • C08G2261/79Post-treatment doping
    • C08G2261/794Post-treatment doping with polymeric dopants
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    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/302Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2433/00Presence of (meth)acrylic polymer
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2475/00Presence of polyurethane
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2477/00Presence of polyamide
    • C09J2477/006Presence of polyamide in the substrate
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    • C09J2479/00Presence of polyamine or polyimide
    • C09J2479/08Presence of polyamine or polyimide polyimide
    • C09J2479/086Presence of polyamine or polyimide polyimide in the substrate
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  • Physics & Mathematics (AREA)
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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Wood Science & Technology (AREA)
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  • Polymers & Plastics (AREA)
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  • Polarising Elements (AREA)

Abstract

Provided are a surface protection film capable of achieving antistatic properties and durable stability in peeling electrostatic potential, a method for manufacturing the surface protection film, and an optical member. This surface protection film is provided with a substrate having a first surface and a second surface, an antistatic layer provided on the first surface of the substrate, and a pressure-sensitive adhesive layer provided on the second surface of the substrate, and is characterized in that the antistatic layer is formed from an antistatic composition containing polyaniline sulfonic acid as an electroconductive polymer component, a polyester resin as a binder, and an isocyanate crosslinking agent as a crosslinking agent.

Description

表面保護膜、表面保護膜之製造方法及光學構件 Surface protective film, method for producing surface protective film, and optical member

本發明係關於一種表面保護膜、表面保護膜之製造方法及光學構件。 The present invention relates to a surface protective film, a method of producing a surface protective film, and an optical member.

本發明係關於一種具備具有第一面及第二面之基材、設置於上述基材之上述第一面之防靜電層、及設置於上述基材之上述第二面之黏著劑層之表面保護膜,詳細而言,本發明係關於一種具有防靜電功能之表面保護膜。本發明之表面保護膜對於貼附於容易產生靜電之塑膠製品等之用途而言較佳。其中,尤其是作為以保護光學構件(例如,用於液晶顯示器等之偏光板、波片、相位差板、光學補償膜、反射片、增亮膜)等之表面之目的而使用之表面保護膜有用。 The present invention relates to a surface provided with a substrate having a first surface and a second surface, an antistatic layer provided on the first surface of the substrate, and an adhesive layer provided on the second surface of the substrate Protective film, in detail, the present invention relates to a surface protective film having an antistatic function. The surface protective film of the present invention is preferred for use in attaching to a plastic article or the like which is liable to generate static electricity. Among them, in particular, it is used as a surface protective film for the purpose of protecting the surface of a member such as a polarizing plate, a wave plate, a phase difference plate, an optical compensation film, a reflection sheet, or a brightness enhancement film for a liquid crystal display or the like. it works.

表面保護膜(亦稱為表面保護片材)通常具有於膜狀基材(支持體)上設置有黏著劑層之構成。該保護膜經由上述黏著劑層而貼合於被黏著體(被保護體),藉此用於保護被黏著體以免受到加工、搬送時等之損傷或污染。例如,液晶顯示器之面板係藉由經由黏著劑層將偏光板或波片等光學構件貼合於液晶單元而形成。於該液晶顯示器面板之製造中,將貼合於液晶單元之偏光板暫時製成捲筒形態後,自該捲筒捲出並切割為與液晶單元之形狀相對應之所需尺寸而使用。此處,為了防止偏光板於中間步驟中與搬送輥等發生摩擦受損,現採用對偏光板之單面或雙面(典型而言為單面)貼合表面保護膜之方案。於不需要之階段將該表面保護膜剝離去除。 The surface protective film (also referred to as a surface protective sheet) usually has a structure in which an adhesive layer is provided on a film-form substrate (support). The protective film is bonded to the adherend (protected body) via the adhesive layer, thereby protecting the adherend from damage or contamination during processing, transportation, and the like. For example, a panel of a liquid crystal display is formed by bonding an optical member such as a polarizing plate or a wave plate to a liquid crystal cell via an adhesive layer. In the manufacture of the liquid crystal display panel, the polarizing plate bonded to the liquid crystal cell is temporarily formed into a roll form, and then taken out from the roll and cut into a desired size corresponding to the shape of the liquid crystal cell. Here, in order to prevent the polarizing plate from being damaged by friction with the conveying roller or the like in the intermediate step, a method of bonding the surface protective film to one side or both sides (typically, one side) of the polarizing plate is employed. The surface protective film is peeled off at an unnecessary stage.

由於表面保護膜或光學構件通常由塑膠材料構成,因此電氣絕緣性較高,因摩擦或剝離而產生靜電。因此,於將表面保護膜自偏光板等光學構件剝離時亦容易產生靜電,若於殘留該靜電之狀態下對液晶施加電壓,則有液晶分子之配向受到損失、或產生面板之缺陷之虞。又,靜電之存在亦可成為吸引灰塵、或降低作業性之要因。就該情況出發,而對表面保護膜實施防靜電處理,例如,藉由形成防靜電層或實施防靜電塗佈作為表面保護膜之表面層(面塗層、背面層)而賦予防靜電功能(參照專利文獻1及2)。 Since the surface protective film or the optical member is usually made of a plastic material, electrical insulation is high, and static electricity is generated by friction or peeling. Therefore, when the surface protective film is peeled off from an optical member such as a polarizing plate, static electricity is likely to be generated. When a voltage is applied to the liquid crystal in a state where the static electricity remains, the alignment of the liquid crystal molecules is lost or the defects of the panel are caused. Moreover, the presence of static electricity can also be a cause of attracting dust or reducing workability. In this case, the surface protective film is subjected to an antistatic treatment, for example, by forming an antistatic layer or performing antistatic coating as a surface layer (top coat layer, back layer) of the surface protective film to impart an antistatic function ( Refer to Patent Documents 1 and 2).

又,近年來,作為用以對表面保護膜之表面層賦予防靜電功能之導電性聚合物,係使用PEDOT(聚(3,4-乙二氧基噻吩))/PSS(聚苯乙烯磺酸)(聚噻吩型)系之水分散型者。然而,上述水分散型若以溶液狀態保管,則會產生凝聚物,無法形成均勻之防靜電層,而產生作業性較差之問題。又,於使用上述導電性聚合物形成防靜電層之情形時,有以下之虞:隨著時間推移,PSS(相當於摻雜劑)自PEDOT脫離,產生表面電阻值或剝離靜電壓之上升等,又,伴隨氧化劣化或光劣化,產生表面電阻值之上升(劣化)等問題。 Further, in recent years, as a conductive polymer for imparting an antistatic function to the surface layer of the surface protective film, PEDOT (poly(3,4-ethylenedioxythiophene))/PSS (polystyrenesulfonic acid) is used. (Polythiophene type) is a water-dispersible type. However, when the water-dispersed type is stored in a solution state, aggregates are generated, and a uniform antistatic layer cannot be formed, which causes a problem of poor workability. Further, when the antistatic layer is formed using the above conductive polymer, there is a case where the PSS (corresponding to a dopant) is detached from the PEDOT over time, and a surface resistance value or a peeling static voltage is increased. Further, problems such as an increase in the surface resistance value (deterioration) occur along with oxidative degradation or photodegradation.

又,若產生表面電阻值等之上升(劣化),則於將表面保護膜自被黏著體剝離時會產生靜電,有產生問題之虞。 In addition, when the surface resistance value or the like is increased (deteriorated), static electricity is generated when the surface protective film is peeled off from the adherend, and there is a problem.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2004-223923號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-223923

[專利文獻2]日本專利特開2008-255332號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-255332

因此,本發明鑒於上述情況進行了銳意研究,結果提供一種可達成防靜電性與剝離靜電壓之經時穩定性之表面保護膜、表面保護膜 之製造方法及光學構件。 Therefore, the present invention has been intensively studied in view of the above circumstances, and as a result, provides a surface protective film and a surface protective film which can achieve antistatic property and time stability of peeling static voltage. Manufacturing method and optical member.

即,本發明之表面保護膜之特徵在於:其具備具有第一面及第二面之基材、設置於上述基材之上述第一面之防靜電層、及於上述基材之上述第二面上由黏著劑組合物形成之黏著劑層,且上述防靜電層係由含有作為導電性聚合物成分之聚苯胺磺酸、作為黏合劑之聚酯樹脂及作為交聯劑之異氰酸酯系交聯劑之防靜電劑組合物所形成。 That is, the surface protection film of the present invention is characterized in that it comprises a substrate having a first surface and a second surface, an antistatic layer provided on the first surface of the substrate, and the second surface of the substrate An adhesive layer formed of an adhesive composition on the surface, and the antistatic layer is crosslinked by a polyaniline sulfonic acid as a conductive polymer component, a polyester resin as a binder, and an isocyanate crosslinking agent as a crosslinking agent. The antistatic agent composition of the agent is formed.

本發明之表面保護膜較佳為上述防靜電劑組合物進一步含有脂肪醯胺作為潤滑劑。 In the surface protective film of the present invention, it is preferred that the antistatic agent composition further contains a fatty guanamine as a lubricant.

本發明之表面保護膜較佳為上述基材為聚酯膜。 The surface protective film of the present invention preferably has the above substrate as a polyester film.

本發明之表面保護膜較佳為上述黏著劑組合物含有選自由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所組成之群中之至少一種。 In the surface protection film of the present invention, it is preferable that the pressure-sensitive adhesive composition contains at least one selected from the group consisting of an acrylic pressure-sensitive adhesive, an urethane-based pressure-sensitive adhesive, and a polyoxymethylene-based pressure-sensitive adhesive.

本發明之表面保護膜較佳為上述黏著劑組合物含有防靜電成分。 In the surface protective film of the present invention, it is preferred that the above adhesive composition contains an antistatic component.

本發明之光學構件較佳為由上述表面保護膜保護。 The optical member of the present invention is preferably protected by the above surface protective film.

本發明之表面保護膜之製造方法較佳為:其係上述表面保護膜之製造方法,且包括製備含有上述防靜電劑組合物之水溶液之步驟、及將上述水溶液塗佈於上述基材之第一面並乾燥而製備防靜電層之步驟。 The method for producing a surface protective film of the present invention is preferably a method for producing the surface protective film, and includes a step of preparing an aqueous solution containing the antistatic agent composition, and applying the aqueous solution to the substrate. The step of preparing an antistatic layer while drying on one side.

本發明之表面保護膜藉由使設置於上述基材之上述第一面(背面)之防靜電層由含有特定之導電性聚合物成分、黏合劑及交聯劑之防靜電劑組合物所形成,可形成均勻之防靜電層,作業性亦優異,進而可提供可達成基於上述防靜電層之防靜電性及剝離靜電壓之經時穩定性之表面保護膜、表面保護膜之製造方法及光學構件,故而較有用。 The surface protection film of the present invention is formed by using an antistatic layer provided on the first surface (back surface) of the substrate from an antistatic agent composition containing a specific conductive polymer component, a binder, and a crosslinking agent. A uniform antistatic layer can be formed, and workability is also excellent, and a surface protective film capable of achieving antistatic property and peeling static voltage stability based on the above-mentioned antistatic layer, a method for producing a surface protective film, and optical can be provided. Components are therefore more useful.

1‧‧‧表面保護膜 1‧‧‧Surface protection film

10‧‧‧丙烯酸板 10‧‧‧Acrylic board

11‧‧‧防靜電層 11‧‧‧Antistatic layer

12‧‧‧基材 12‧‧‧Substrate

13‧‧‧黏著劑層 13‧‧‧Adhesive layer

20‧‧‧偏光板 20‧‧‧Polar plate

30‧‧‧樣品固定台 30‧‧‧sample fixed table

40‧‧‧電位測定機 40‧‧‧potentiometer

圖1係表示本發明之表面保護膜之一構成例的模式性剖視圖。 Fig. 1 is a schematic cross-sectional view showing a configuration example of a surface protective film of the present invention.

圖2係表示剝離靜電壓之測定方法之說明圖。 Fig. 2 is an explanatory view showing a method of measuring the peeling static voltage.

以下,對本發明之實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail.

<表面保護膜之整體結構> <Overall structure of surface protective film>

此處所揭示之表面保護膜通常係被稱為黏著片、膠帶、黏著標籤、黏著膜等之形態者,尤佳為作為於光學零件(例如,用作偏光板、波片等液晶顯示器面板構成元件之光學零件)之加工時或搬送時保護光學零件之表面之表面保護膜。上述表面保護膜中之黏著劑層典型而言為連續形成,但並不限定於該形態,例如亦可為形成為點狀、條紋狀等規則或無規之圖案之黏著劑層。又,此處所揭示之表面保護膜可為捲筒狀,亦可為單片狀。 The surface protective film disclosed herein is generally referred to as an adhesive sheet, an adhesive tape, an adhesive label, an adhesive film, or the like, and is particularly preferably used as an optical component (for example, as a component of a liquid crystal display panel such as a polarizing plate or a wave plate). The surface protective film that protects the surface of the optical component during processing or during transport. The adhesive layer in the surface protective film is typically formed continuously, but is not limited to this form, and may be, for example, an adhesive layer formed into a regular or random pattern such as a dot or a stripe. Further, the surface protective film disclosed herein may be in the form of a roll or a single piece.

將此處所揭示之表面保護膜之典型之構成例模式性示於圖1。該表面保護膜1具備:基材(例如聚酯膜)12;防靜電層11,其設置於其第一面12上;及黏著劑層13,其設置於基材12之第二面(與防靜電層11為相反側之表面)。表面保護膜1係將該黏著劑層13貼附於被黏著體(保護對象,例如偏光板等光學零件之表面)而使用。使用前(即,貼附至被黏著體前)之表面保護膜1亦可為黏著劑層13之表面(貼附於被黏著體之面)由至少黏著劑層13側成為剝離面之剝離襯墊所保護之形態。或者亦可為如下形態:將表面保護膜1捲繞成捲筒狀,藉此黏著劑層13抵接於基材12之背面(防靜電層11之表面),其表面受到保護。 A typical configuration example of the surface protective film disclosed herein is schematically shown in FIG. The surface protection film 1 includes a substrate (for example, a polyester film) 12, an antistatic layer 11 provided on the first surface 12 thereof, and an adhesive layer 13 disposed on the second surface of the substrate 12 (and The antistatic layer 11 is the surface on the opposite side). The surface protective film 1 is used by attaching the adhesive layer 13 to an adherend (protection target such as a surface of an optical component such as a polarizing plate). The surface protective film 1 before use (that is, before being attached to the adherend) may be a surface of the adhesive layer 13 (attached to the surface of the adherend) and a release liner which is a release surface from at least the adhesive layer 13 side. The form protected by the mat. Alternatively, the surface protective film 1 may be wound into a roll shape, whereby the adhesive layer 13 abuts against the back surface of the substrate 12 (the surface of the antistatic layer 11), and the surface thereof is protected.

如圖1所示,防靜電層11直接(未介隔其他層)形成於基材12之第一面上,該防靜電層11露出至表面保護膜1之背面之態樣(即,防靜電層11兼為面塗層之態樣)與面塗層外另行設置防靜電層之構成相比,於基材12上設置有防靜電層11之附有防靜電層之膜(進而使用該膜而 成之表面保護膜)由於可減少構成表面保護膜之層數,因此就提高生產性等觀點而言亦較為有利。 As shown in FIG. 1 , the antistatic layer 11 is directly formed on the first surface of the substrate 12 (without intervening other layers), and the antistatic layer 11 is exposed to the back surface of the surface protective film 1 (ie, antistatic). The layer 11 is also a surface coating layer. The film 12 is provided with an antistatic layer 11 with an antistatic layer on the substrate 12 (the film is further used). and Since the surface protective film can reduce the number of layers constituting the surface protective film, it is also advantageous from the viewpoint of improving productivity.

<基材> <Substrate>

本發明之表面保護膜之特徵在於具有含有第一面(背面)及第二面(與第一面為相反側之面)之基材。於此處所揭示之技術中,構成基材之樹脂材料可並無特別限制地使用,例如,較佳為使用透明性、機械強度、熱穩定性、防水性、各向同性、可撓性、尺寸穩定性等特性優異者。尤其是藉由基材具有可撓性,可藉由捲筒式塗佈機等塗佈黏著劑組合物,並可捲繞成捲筒狀,較有用。 The surface protective film of the present invention is characterized in that it has a substrate comprising a first surface (back surface) and a second surface (surface opposite to the first surface). In the technique disclosed herein, the resin material constituting the substrate can be used without particular limitation, and for example, transparency, mechanical strength, thermal stability, water repellency, isotropy, flexibility, and size are preferably used. Excellent in stability and other characteristics. In particular, since the substrate has flexibility, the adhesive composition can be applied by a roll coater or the like, and can be wound into a roll shape, which is useful.

作為上述基材(支持體),例如,可較佳地使用包含以如下聚合物為主要樹脂成分(樹脂成分中之主成分,典型而言為占50質量%以上之成分)之樹脂材料之塑膠膜作為上述基材:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯等聚酯系聚合物;二乙醯纖維素、三乙醯纖維素等纖維素系聚合物;聚碳酸酯系聚合物;聚甲基丙烯酸甲酯等丙烯酸系聚合物;等。作為上述樹脂材料之其他例,可列舉以如下聚合物作為樹脂材料者:聚苯乙烯、丙烯腈-苯乙烯共聚物等苯乙烯系聚合物;聚乙烯、聚丙烯、具有環狀或降烯結構之聚烯烴、乙烯-丙烯共聚物等烯烴系聚合物;氯乙烯系聚合物;尼龍6、尼龍6,6、芳香族聚醯胺等醯胺系聚合物;等。作為上述樹脂材料之進而其他例,可列舉醯亞胺系聚合物、碸系聚合物、聚醚碸系聚合物、聚醚醚酮系聚合物、聚苯硫醚系聚合物、乙烯醇系聚合物、偏二氯乙烯系聚合物、乙烯丁醛系聚合物、芳酯系聚合物、聚甲醛系聚合物、環氧系聚合物等。亦可為包含兩種以上之上述聚合物之混合物之基材。 As the substrate (support), for example, a plastic material containing a resin material having a polymer as a main resin component (a main component of a resin component, typically a component of 50% by mass or more) is preferably used. The film is used as the above substrate: a polyester-based polymer such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polybutylene terephthalate; A cellulose-based polymer such as triacetonitrile cellulose; a polycarbonate-based polymer; an acrylic polymer such as polymethyl methacrylate; and the like. As another example of the above-mentioned resin material, a polymer such as a styrene polymer such as polystyrene or an acrylonitrile-styrene copolymer; a polyethylene or a polypropylene having a ring shape or a drop may be mentioned. An olefin polymer such as an olefin structure or an ethylene-propylene copolymer; a vinyl chloride polymer; a phthalamide polymer such as nylon 6, nylon 6,6 or an aromatic polyamine; and the like. Further examples of the resin material include a quinone imine polymer, a fluorene polymer, a polyether fluorene polymer, a polyether ether ketone polymer, a polyphenylene sulfide polymer, and a vinyl alcohol polymerization. A vinylidene chloride polymer, an ethylene butyral polymer, an aryl ester polymer, a polyoxymethylene polymer, or an epoxy polymer. It may also be a substrate comprising a mixture of two or more of the above polymers.

作為上述基材,可較佳地採用包含透明之熱塑性樹脂材料之塑膠膜。上述塑膠膜中,更佳之態樣為使用聚酯膜。此處,所謂聚酯膜 係指以聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯等具有以酯鍵為基本之主骨架之聚合物材料(聚酯樹脂)作為主要樹脂成分者。該聚酯膜具有光學特性或尺寸穩定性優異等作為表面保護膜之基材而言較佳之特性,但另一方面,若直接使用則具有容易帶電之性質。 As the above substrate, a plastic film containing a transparent thermoplastic resin material can be preferably used. In the above plastic film, a more preferable aspect is to use a polyester film. Here, the so-called polyester film Means a polymer material having a main skeleton based on an ester bond such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polybutylene terephthalate (poly Ester resin) as a main resin component. The polyester film has preferable properties as a substrate of the surface protective film, such as excellent optical properties or dimensional stability, but on the other hand, if it is used as it is, it has a property of being easily charged.

於構成上述基材之樹脂材料中,可視需要而調配抗氧化劑、紫外線吸收劑、塑化劑、著色劑(顏料、染料等)等各種添加劑。亦可對上述聚酯膜之第一面(設置有防靜電層一側之表面)實施公知或慣用之表面處理,例如電暈放電處理、電漿處理、紫外線照射處理、酸處理、鹼處理、底塗劑之塗佈等。此種表面處理例如可為用以提高基材與防靜電層之密接性之處理。可較佳地採用如於基材之表面導入羥基(-OH基)等極性基之表面處理。又,亦可對基材之第二面(形成黏著劑層一側之表面)實施與上述相同之表面處理。該表面處理可為用以提高膜與黏著劑層之密接性(黏著劑層之固著性)之處理。 Various additives such as an antioxidant, an ultraviolet absorber, a plasticizer, and a colorant (pigment, dye, etc.) may be blended in the resin material constituting the substrate. The surface of the first surface of the polyester film (the surface on which the antistatic layer is provided) may be subjected to a known or conventional surface treatment such as corona discharge treatment, plasma treatment, ultraviolet irradiation treatment, acid treatment, alkali treatment, Coating of the primer, and the like. Such a surface treatment may be, for example, a treatment for improving the adhesion between the substrate and the antistatic layer. Surface treatment such as introduction of a polar group such as a hydroxyl group (-OH group) onto the surface of the substrate can be preferably employed. Further, the same surface treatment as described above may be applied to the second surface of the substrate (the surface on the side where the adhesive layer is formed). The surface treatment may be a treatment for improving the adhesion between the film and the adhesive layer (adhesion of the adhesive layer).

本發明之表面保護膜藉由於基材上具有防靜電層而具有防靜電功能,進而亦可使用實施防靜電處理而成之塑膠膜作為上述基材。由於藉由使用上述基材可抑制剝離時之表面保護膜本身之帶電,故而較佳。又,基材為塑膠膜,藉由對上述塑膠膜實施防靜電處理,而減少表面保護膜本身之帶電,且可獲得對被黏著體之防靜電能力優異者。再者,作為賦予防靜電功能之方法並無特別限制,可使用先前公知之方法,例如,可列舉如下方法:塗佈含有防靜電劑與樹脂成分之防靜電性樹脂或含有導電性聚合物、導電性物質之導電性樹脂之方法;蒸鍍或鍍敷導電性物質之方法;以及混練防靜電劑等之方法等。 The surface protective film of the present invention has an antistatic function by having an antistatic layer on the substrate, and a plastic film obtained by performing an antistatic treatment can also be used as the substrate. It is preferable to use the above substrate to suppress charging of the surface protective film itself at the time of peeling. Further, the substrate is a plastic film, and the plastic film is subjected to an antistatic treatment to reduce the charging of the surface protective film itself, and an antistatic property to the adherend can be obtained. In addition, the method of providing an antistatic function is not particularly limited, and a conventionally known method can be used. For example, a method of applying an antistatic resin containing an antistatic agent and a resin component or containing a conductive polymer, A method of conductive resin of a conductive material; a method of vapor-depositing or plating a conductive material; and a method of kneading an antistatic agent or the like.

作為上述基材之厚度,通常為5~200μm,較佳為10~100μm左右。若上述基材之厚度處於上述範圍內,則於被黏著體上之貼合作業性及自被黏著體之剝離作業性優異,故而較佳。 The thickness of the substrate is usually 5 to 200 μm, preferably about 10 to 100 μm. When the thickness of the base material is in the above range, the adhesion to the adherend and the peeling workability from the adherend are excellent, which is preferable.

<防靜電層(面塗層)> <antistatic layer (top coat)>

本發明之表面保護膜之特徵在於:其具備具有第一面(背面)及第二面(與第一面為相反側之面)之基材、設置於上述基材之上述第一面(背面)之防靜電層、及於上述基材之上述第二面上由黏著劑組合物所形成之黏著劑層,且上述防靜電層係由含有作為導電性聚合物成分之聚苯胺磺酸、作為黏合劑之聚酯樹脂及作為交聯劑之異氰酸酯系交聯劑之防靜電劑組合物所形成。上述表面保護膜藉由具有防靜電層(面塗層),表面保護膜之防靜電性與剝離靜電壓之經時穩定性有所提高,成為較佳之態樣。 The surface protection film of the present invention is characterized in that it comprises a substrate having a first surface (back surface) and a second surface (surface opposite to the first surface), and is provided on the first surface of the substrate (back surface) An antistatic layer and an adhesive layer formed of the adhesive composition on the second surface of the substrate, wherein the antistatic layer contains polyaniline sulfonic acid as a conductive polymer component. It is formed of a polyester resin of a binder and an antistatic agent composition of an isocyanate crosslinking agent as a crosslinking agent. The surface protective film has an antistatic layer (top coat layer), and the antistatic property of the surface protective film and the stability over time of the peeling static voltage are improved, which is a preferable aspect.

<導電性聚合物> <Electrically conductive polymer>

上述防靜電層之特徵在於含有聚苯胺磺酸作為導電性聚合物成分。藉由使用上述導電性聚合物,可滿足基於防靜電層之防靜電性及經時剝離靜電壓。又,上述聚苯胺磺酸係「水溶性」,藉由使用下文所述之異氰酸酯系交聯劑,可固定於防靜電層中,提高耐水性。藉由使用含有上述水溶性之導電性聚合物之水溶液,可獲得經時表面電阻值優異之防靜電層,成為較佳之態樣。另一方面,於在形成防靜電層時所使用之導電性聚合物為「水分散性」之情形時,若使用含有上述水分散性導電性聚合物之溶液形成防靜電層,則變得容易產生凝聚物,無法均勻塗佈,有經時表面電阻值顯著變差之傾向,故而欠佳。 The antistatic layer is characterized by containing polyaniline sulfonic acid as a conductive polymer component. By using the above conductive polymer, the antistatic property based on the antistatic layer and the peeling static voltage with time can be satisfied. Further, the polyaniline sulfonic acid-based "water-soluble" can be fixed to the antistatic layer by using an isocyanate-based crosslinking agent described below to improve water resistance. By using an aqueous solution containing the above water-soluble conductive polymer, an antistatic layer excellent in surface resistance over time can be obtained, which is preferable. On the other hand, when the conductive polymer used for forming the antistatic layer is "water-dispersible", it is easy to form an antistatic layer using a solution containing the water-dispersible conductive polymer. Aggregates are generated, they are not uniformly coated, and the surface resistance value tends to deteriorate significantly over time, which is not preferable.

上述導電性聚合物之使用量相對於防靜電層(面塗層)中所含之黏合劑100質量份,較佳為10~200質量份,更佳為25~150質量份,進而較佳為40~120質量份。若上述導電性聚合物之使用量過少,則存在防靜電效果變小之情況,若導電性聚合物之使用量過多,則有防靜電層對基材之密接性降低、或透明性降低之虞,故而欠佳。 The amount of the conductive polymer to be used is preferably 10 to 200 parts by mass, more preferably 25 to 150 parts by mass, even more preferably 100 to 150 parts by mass, based on 100 parts by mass of the binder contained in the antistatic layer (top coat layer). 40 to 120 parts by mass. When the amount of the conductive polymer used is too small, the antistatic effect may be small. When the amount of the conductive polymer used is too large, the adhesion of the antistatic layer to the substrate may be lowered or the transparency may be lowered. Therefore, it is not good.

用作上述導電性聚合物成分之聚苯胺磺酸較佳為聚苯乙烯換算之重量平均分子量(Mw)為5×105以下者,更佳為3×105以下。又,該等 導電性聚合物之重量平均分子量通常較佳為1×103以上,更佳為5×103以上。 The polyaniline sulfonic acid used as the conductive polymer component is preferably a polystyrene-equivalent weight average molecular weight (Mw) of 5 × 10 5 or less, more preferably 3 × 10 5 or less. Further, the weight average molecular weight of the conductive polymers is usually preferably 1 × 10 3 or more, more preferably 5 × 10 3 or more.

作為形成上述防靜電層之方法,可採用將防靜電層形成用之塗佈材料塗佈於基材(支持體)之第一面並將其乾燥(或硬化)之方法,作為用於製備塗佈材料之導電性聚合物成分,係含有聚苯胺磺酸、作為黏合劑之聚酯樹脂及作為交聯劑之異氰酸酯系交聯劑作為必需成分者,可較佳地使用上述必需成分溶解於水中而得之形態者(稱為導電性聚合物水溶液,或簡稱為水溶液)。該導電性聚合物水溶液例如可藉由將具有親水性官能基之導電性聚合物(可藉由使分子內具有親水性官能基之單體共聚合等方法而合成)溶解於水中而製備。作為上述親水性官能基,可例示磺基、胺基、醯胺基、亞胺基、羥基、巰基、肼基、羧基、四級銨基、硫酸酯基(-O-SO3H)、磷酸酯基(例如-O-PO(OH)2)等。該親水性官能基亦可形成鹽。 As a method of forming the above-described antistatic layer, a method of applying a coating material for forming an antistatic layer to a first surface of a substrate (support) and drying (or hardening) it may be employed as a method for preparing a coating. The conductive polymer component of the cloth material contains polyaniline sulfonic acid, a polyester resin as a binder, and an isocyanate crosslinking agent as a crosslinking agent as an essential component, and the above-mentioned essential component can be preferably dissolved in water. The resulting form (called an aqueous conductive polymer solution, or simply an aqueous solution). The conductive polymer aqueous solution can be prepared, for example, by dissolving a conductive polymer having a hydrophilic functional group (which can be synthesized by a method of copolymerizing a monomer having a hydrophilic functional group in the molecule) in water. Examples of the hydrophilic functional group include a sulfo group, an amine group, a decylamino group, an imido group, a hydroxyl group, a decyl group, a decyl group, a carboxyl group, a quaternary ammonium group, a sulfate group (-O-SO 3 H), and a phosphoric acid group. An ester group (for example, -O-PO(OH) 2 ) or the like. The hydrophilic functional group can also form a salt.

又,作為上述聚苯胺磺酸水溶液之市售品,可例示Mitsubishi Rayon公司製造之商品名「aqua-PASS」等。 In addition, as a commercial item of the above-mentioned polyaniline sulfonic acid aqueous solution, the brand name "aqua-pass" manufactured by Mitsubishi Rayon Co., Ltd., etc. can be illustrated.

此處所揭示之防靜電層中,作為導電性聚合物成分,係含有聚苯胺磺酸(聚苯胺型)作為必需成分,但亦可例如一併含有其他一種或兩種以上之防靜電成分(導電性聚合物以外之有機導電性物質、無機導電性物質、防靜電劑等)。再者,作為較佳之一態樣,可更佳地實施上述防靜電層實質上不含上述導電性聚合物以外之防靜電成分、即上述防靜電層中所含之防靜電成分實質上僅由導電性聚合物構成之態樣。 In the antistatic layer disclosed herein, the conductive polymer component contains polyaniline sulfonic acid (polyaniline type) as an essential component, but may contain, for example, one or two or more kinds of antistatic components (conductive). An organic conductive substance other than a polymer, an inorganic conductive substance, an antistatic agent, etc.). Furthermore, it is preferable that the antistatic layer is substantially free of an antistatic component other than the conductive polymer, that is, the antistatic component contained in the antistatic layer is substantially only The aspect in which the conductive polymer is formed.

作為上述有機導電性物質,可列舉:四級銨鹽、吡啶鎓鹽、具有一級胺基、二級胺基、三級胺基等陽離子性官能基之陽離子型防靜電劑;磺酸鹽或硫酸酯鹽、膦酸鹽、磷酸酯鹽等具有陰離子性官能基之陰離子型防靜電劑;烷基甜菜鹼及其衍生物、咪唑啉及其衍生物、 丙胺酸及其衍生物等兩性離子型防靜電劑;胺基醇及其衍生物、甘油及其衍生物、聚乙二醇及其衍生物等非離子型防靜電劑;將上述具有陽離子型、陰離子型、兩性離子型之離子導電性基(例如四級銨鹽基)之單體聚合或共聚合而得之離子導電性聚合物;聚噻吩、聚苯胺、聚吡咯、聚伸乙基亞胺、烯丙胺系聚合物等導電性聚合物。此種防靜電劑可單獨使用一種,亦可組合兩種以上而使用。 Examples of the organic conductive material include a quaternary ammonium salt, a pyridinium salt, a cationic antistatic agent having a cationic functional group such as a primary amino group, a secondary amino group, and a tertiary amino group; a sulfonate or sulfuric acid; An anionic antistatic agent having an anionic functional group such as an ester salt, a phosphonate or a phosphate salt; an alkylbetaine and a derivative thereof, an imidazoline and a derivative thereof, a zwitterionic antistatic agent such as alanine and a derivative thereof; a nonionic antistatic agent such as an amino alcohol and a derivative thereof, glycerin and a derivative thereof, polyethylene glycol and a derivative thereof; An ionically conductive polymer obtained by polymerizing or copolymerizing monomers of an anionic, zwitterionic ionic conductive group (for example, a quaternary ammonium salt group); polythiophene, polyaniline, polypyrrole, polyethyleneimine A conductive polymer such as an allylamine polymer. These antistatic agents may be used alone or in combination of two or more.

作為上述無機導電性物質,可列舉:氧化錫、氧化銻、氧化銦、氧化鎘、氧化鈦、氧化鋅、銦、錫、銻、金、銀、銅、鋁、鎳、鉻、鈦、鐵、鈷、碘化銅、ITO(氧化銦/氧化錫)、ATO(氧化銻/氧化錫)等。此種無機導電性物質可單獨使用一種,亦可組合兩種以上而使用。 Examples of the inorganic conductive material include tin oxide, antimony oxide, indium oxide, cadmium oxide, titanium oxide, zinc oxide, indium, tin, antimony, gold, silver, copper, aluminum, nickel, chromium, titanium, iron, and the like. Cobalt, copper iodide, ITO (indium oxide/tin oxide), ATO (antimony oxide/tin oxide), and the like. These inorganic conductive materials may be used alone or in combination of two or more.

作為上述防靜電劑,可列舉陽離子型防靜電劑、陰離子型防靜電劑、兩性離子型防靜電劑、非離子型防靜電劑、將上述具有陽離子型、陰離子型、兩性離子型之離子導電性基之單體聚合或共聚合而得之離子導電性聚合物等。 Examples of the antistatic agent include a cationic antistatic agent, an anionic antistatic agent, a zwitterionic antistatic agent, and a nonionic antistatic agent, and the above-described cationic, anionic, and zwitterionic ionic conductivity. An ion conductive polymer obtained by polymerizing or copolymerizing a monomer.

<黏合劑> <Binder>

上述防靜電層之特徵在於:作為必需成分,含有聚酯樹脂作為黏合劑。上述聚酯樹脂較佳為含有聚酯作為主成分(典型而言為占超過50質量%、較佳為75質量%以上、例如90質量%以上之成分)之樹脂材料。典型而言,上述聚酯較佳為具有選自1分子中具有2個以上羧基之多元羧酸類(典型而言為二羧酸類)及其衍生物(該多元羧酸之酸酐、酯化物、鹵化物等)中之一種或兩種以上化合物(多元羧酸成分)、與選自1分子中具有2個以上羥基之多元醇類(典型而言為二醇類)中之一種或兩種以上化合物(多元醇成分)縮合而成之結構。 The antistatic layer is characterized in that it contains a polyester resin as a binder as an essential component. The polyester resin is preferably a resin material containing a polyester as a main component (typically, it accounts for more than 50% by mass, preferably 75% by mass or more, for example, 90% by mass or more). Typically, the above polyester preferably has a polycarboxylic acid (typically a dicarboxylic acid) having two or more carboxyl groups selected from one molecule and a derivative thereof (an acid anhydride, an esterified product, and a halogenated polycarboxylic acid) One or two or more compounds (polycarboxylic acid component) and one or more compounds selected from polyhydric alcohols (typically diols) having two or more hydroxyl groups in one molecule (Polyol component) condensed structure.

作為可用作上述多元羧酸成分之化合物之例,可列舉:草酸、丙二酸、二氟丙二酸、烷基丙二酸、丁二酸、四氟丁二酸、烷基丁二 酸、(為可用蘋果酸、內消旋酒石酸、伊康酸、順丁烯二酸、甲基順丁烯二酸、反丁烯二酸、甲基反丁烯二酸、乙炔二羧酸、戊二酸、六氟戊二酸、甲基戊二酸、戊烯二酸、己二酸、二硫代己二酸、甲基己二酸、二甲基己二酸、四甲基己二酸、亞甲基己二酸、黏康酸、半乳糖二酸、庚二酸、辛二酸、全氟辛二酸、3,3,6,6-四甲基辛二酸、壬二酸、癸二酸、全氟癸二酸、十三烷二酸、十二烷基二羧酸、十三烷基二羧酸、十四烷基二羧酸等脂肪族二羧酸類;環烷基二羧酸(例如,1,4-環己烷二羧酸、1,2-環己烷二羧酸)、1,4-(2-降烯)二羧酸、5-降烯-2,3-二羧酸(雙環庚烯二甲酸)、金剛烷二羧酸、螺庚烷二羧酸等脂環式二羧酸類;鄰苯二甲酸、間苯二甲酸、二硫代間苯二甲酸、甲基間苯二甲酸、二甲基間苯二甲酸、氯間苯二甲酸、二氯間苯二甲酸、對苯二甲酸、甲基對苯二甲酸、二甲基對苯二甲酸、氯對苯二甲酸、溴對苯二甲酸、萘二羧酸、氧代茀二羧酸、蒽二羧酸、聯苯二羧酸、伸聯苯基二羧酸、二甲基伸聯苯基二羧酸、4,4"-對伸聯三苯二羧酸、4,4"-對聯四苯二羧酸、聯苄二羧酸、偶氮苯二羧酸、高鄰苯二甲酸、伸苯基二乙酸、伸苯基二丙酸、萘二丙酸、聯苯二乙酸、聯苯二丙酸、3,3'-[4,4'-(亞甲基二對伸聯苯基)二丙酸、4,4'-聯苄二乙酸、3,3'-(4,4'-聯苄)二丙酸、氧二對伸苯基二乙酸等芳香族二羧酸類;上述任一多元羧酸之酸酐;上述任一多元羧酸之酯(例如烷基酯。可為單酯、二酯等);與上述任一多元羧酸相對應之酸鹵化物(例如二甲醯氯);等。 Examples of the compound which can be used as the above polyvalent carboxylic acid component include oxalic acid, malonic acid, difluoromalonic acid, alkylmalonic acid, succinic acid, tetrafluorosuccinic acid, and alkyl succinic acid. (for malic acid, meso-tartaric acid, itaconic acid, maleic acid, methyl maleic acid, fumaric acid, methyl fumaric acid, acetylene dicarboxylic acid, pentane Diacid, hexafluoroglutaric acid, methyl glutaric acid, glutaconic acid, adipic acid, dithioadipate, methyl adipic acid, dimethyl adipate, tetramethyl adipate , methylene adipate, muconic acid, galactosuccinic acid, pimelic acid, suberic acid, perfluorooctanoic acid, 3,3,6,6-tetramethyloctanedioic acid, sebacic acid, An aliphatic dicarboxylic acid such as sebacic acid, perfluorosebacic acid, tridecanedioic acid, dodecyl dicarboxylic acid, tridecyl dicarboxylic acid or tetradecyl dicarboxylic acid; cycloalkyl Carboxylic acid (for example, 1,4-cyclohexanedicarboxylic acid, 1,2-cyclohexanedicarboxylic acid), 1,4-(2-lower) Alkene dicarboxylic acid, 5-nor Ethylene-2,3-dicarboxylic acid (bicycloheptylene dicarboxylic acid), adamantane dicarboxylic acid, octane dicarboxylic acid, etc. alicyclic dicarboxylic acid; phthalic acid, isophthalic acid, dithio Isophthalic acid, methyl isophthalic acid, dimethyl isophthalic acid, chloroisophthalic acid, dichloroisophthalic acid, terephthalic acid, methyl terephthalic acid, dimethyl p-benzene Dicarboxylic acid, chloroterephthalic acid, bromine terephthalic acid, naphthalene dicarboxylic acid, oxophthalic dicarboxylic acid, stilbene dicarboxylic acid, biphenyl dicarboxylic acid, extended biphenyl dicarboxylic acid, dimethyl extension Biphenyldicarboxylic acid, 4,4"-pair extended triphenyl dicarboxylic acid, 4,4"-paraphenylene dicarboxylic acid, bibenzyl dicarboxylic acid, azobenzene dicarboxylic acid, high phthalic acid Formic acid, phenyldiacetic acid, phenyldipropionic acid, naphthalene dipropionic acid, biphenyl diacetic acid, biphenyl dipropionic acid, 3,3'-[4,4'-(methylene two pairs of extension An aromatic dicarboxylic acid such as phenyl)dipropionic acid, 4,4'-bibenzyl diacetic acid, 3,3'-(4,4'-bibenzyl) dipropionic acid or oxydi-p-phenylenediacetic acid; An acid anhydride of any of the above polycarboxylic acids; an ester of any of the above polycarboxylic acids (for example, an alkyl ester, which may be a monoester, a diester, etc.); An acid halide corresponding to any polycarboxylic acid (for example, dimethyl hydrazine); and the like.

作為可用作上述多元羧酸成分之化合物之較佳例,可列舉:對苯二甲酸、間苯二甲酸、萘二羧酸等芳香族二羧酸類及其酸酐;己二酸、癸二酸、壬二酸、丁二酸、反丁烯二酸、順丁烯二酸、雙環庚烯二甲酸、1,4-環己烷二羧酸等脂肪族二羧酸類及其酸酐;以及上述二羧酸類之低級烷基酯(例如,與碳原子數1~3之單醇之酯)等。 Preferred examples of the compound which can be used as the polyvalent carboxylic acid component include aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid and naphthalene dicarboxylic acid, and acid anhydrides thereof; adipic acid and sebacic acid; An aliphatic dicarboxylic acid such as azelaic acid, succinic acid, fumaric acid, maleic acid, bicycloheptene dicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and an anhydride thereof; a lower alkyl ester of a carboxylic acid (for example, an ester of a monool having 1 to 3 carbon atoms).

另一方面,作為可用作上述多元醇成分之化合物之例,可列舉:乙二醇、丙二醇、1,2-丙二醇、1,3-丙二醇、1,3-丁二醇、1,4-丁二醇、新戊二醇、1,5-戊二醇、1,6-己二醇、3-甲基戊二醇、二乙二醇、1,4-環己烷二甲醇、3-甲基-1,5-戊二醇、2-甲基-1,3-丙二醇、2,2-二乙基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、苯二甲醇、氫化雙酚A、雙酚A等二醇類。作為其他例,可列舉該等化合物之環氧烷加成物(例如,環氧乙烷加成物、環氧丙烷加成物等)。 On the other hand, examples of the compound which can be used as the above polyol component include ethylene glycol, propylene glycol, 1,2-propylene glycol, 1,3-propanediol, 1,3-butanediol, and 1,4- Butylene glycol, neopentyl glycol, 1,5-pentanediol, 1,6-hexanediol, 3-methylpentanediol, diethylene glycol, 1,4-cyclohexanedimethanol, 3- Methyl-1,5-pentanediol, 2-methyl-1,3-propanediol, 2,2-diethyl-1,3-propanediol, 2-butyl-2-ethyl-1,3- Glycols such as propylene glycol, benzenedimethanol, hydrogenated bisphenol A, and bisphenol A. As another example, an alkylene oxide adduct of such a compound (for example, an ethylene oxide adduct, a propylene oxide adduct, etc.) is mentioned.

上述聚酯樹脂之分子量以藉由凝膠滲透層析法(GPC)所測定之標準聚苯乙烯換算之重量平均分子量(Mw)計,例如可為5×103~1.5×105左右(較佳為1×104~6×104左右)。又,上述聚酯樹脂之玻璃轉移溫度(Tg)例如可為0~120℃(較佳為10~80℃)。 The molecular weight of the above polyester resin is, for example, from 5 × 10 3 to 1.5 × 10 5 by weight average molecular weight (Mw) in terms of standard polystyrene measured by gel permeation chromatography (GPC). Good is 1×10 4 ~6×10 4 or so). Further, the glass transition temperature (Tg) of the polyester resin may be, for example, 0 to 120 ° C (preferably 10 to 80 ° C).

作為上述聚酯樹脂,可使用市售之東洋紡公司製造之商品名「Vylonal」等。 As the polyester resin, a commercially available product name "Vylonal" manufactured by Toyobo Co., Ltd., or the like can be used.

於未大幅損及此處所揭示之表面保護膜之性能(例如,防靜電性等性能)之限度下,上述防靜電層(面塗層)可進一步含有聚酯樹脂以外之樹脂(例如,選自丙烯酸系樹脂、丙烯酸胺基甲酸酯樹脂、丙烯酸苯乙烯樹脂、丙烯酸聚矽氧樹脂、聚矽氧樹脂、聚矽氮烷樹脂、聚胺基甲酸酯樹脂、氟樹脂、聚烯烴樹脂等中之一種或兩種以上之樹脂)作為黏合劑。作為此處所揭示之技術之較佳之一態樣,為防靜電層之黏合劑實質上僅由聚酯樹脂所構成之情形。例如,較佳為聚酯樹脂占黏合劑之比率為98~100質量%之防靜電層。黏合劑占防靜電層整體之比率例如可設為50~95質量%,通常設為60~90質量%為宜。 The antistatic layer (top coat layer) may further contain a resin other than the polyester resin (for example, selected from the group consisting of the properties of the surface protective film disclosed herein (for example, performance such as antistatic property). Acrylic resin, urethane acrylate resin, acrylic styrene resin, acrylic polyoxyn resin, polyoxyn oxy resin, polyazide resin, polyurethane resin, fluororesin, polyolefin resin, etc. One or two or more kinds of resins) are used as a binder. As a preferred aspect of the technology disclosed herein, the adhesive of the antistatic layer is substantially composed only of a polyester resin. For example, an antistatic layer in which the ratio of the binder of the polyester resin to the binder is 98 to 100% by mass is preferable. The ratio of the binder to the entire antistatic layer can be, for example, 50 to 95% by mass, and usually 60 to 90% by mass.

<潤滑劑> <Lubricant>

此處所揭示之技術中之防靜電層(面塗層)之較佳之態樣為使用脂肪醯胺作為潤滑劑。藉由使用脂肪醯胺作為潤滑劑,即便於不對防靜電層之表面實施進一步之剝離處理(例如,塗佈聚矽氧系剝離劑、長 鏈烷基系剝離劑等公知之剝離處理劑並將其乾燥之處理)之態樣中,亦可獲得兼具充分之滑動性與印字密接性之防靜電層(面塗層),故而可成為較佳之態樣。如此般不對防靜電層之表面實施進一步之剝離處理之態樣就可將由剝離處理劑引起之白化(例如,因保存於加熱加濕條件下而引起之白化)防患於未然等方面而言較佳。又,就耐溶劑性之方面而言亦較為有利。 A preferred aspect of the antistatic layer (top coat) in the techniques disclosed herein is the use of fatty guanamine as a lubricant. By using fatty guanamine as a lubricant, even if the surface of the antistatic layer is not subjected to further release treatment (for example, coating a polysiloxane stripper, long In the aspect of the treatment of drying a known release treatment agent such as an alkyl group-based release agent, the antistatic layer (top coat layer) having sufficient slidability and printing adhesion can be obtained. The best way. In such a manner that the surface of the antistatic layer is not further subjected to the release treatment, the whitening caused by the release treatment agent (for example, whitening caused by storage under heating and humidification conditions) can be prevented. good. Moreover, it is also advantageous in terms of solvent resistance.

作為上述脂肪醯胺之具體例,可列舉:月桂醯胺、棕櫚醯胺、硬脂醯胺、山萮醯胺、羥基硬脂醯胺、油醯胺、芥醯胺、N-油基棕櫚醯胺、N-硬脂基硬脂醯胺、N-硬脂基油醯胺、N-油基硬脂醯胺、N-硬脂基芥醯胺、羥甲基硬脂醯胺、亞甲基雙硬脂醯胺、伸乙基雙癸醯胺、伸乙基雙月桂醯胺、伸乙基雙硬脂醯胺、伸乙基雙羥基硬脂醯胺、伸乙基雙山萮醯胺、六亞甲基雙硬脂醯胺、六亞甲基雙山萮醯胺、六亞甲基羥基硬脂醯胺、N,N'-二硬脂基己二醯胺、N,N'-二硬脂基癸二醯胺、伸乙基雙油醯胺、伸乙基雙芥醯胺、六亞甲基雙油醯胺、N,N'-二油基己二醯胺、N,N'-二油基癸二醯胺、對苯二甲基雙硬脂醯胺、對苯二甲基雙羥基硬脂醯胺、N,N'-硬脂基間苯二甲醯胺等。該等潤滑劑可單獨使用一種,亦可組合兩種以上而使用。 Specific examples of the above fatty guanamine include laurylamine, palm decylamine, stearylamine, behenamide, hydroxystearate, ceramide, sucrose, and N-oil palmitoyl. Amine, N-stearyl stearylamine, N-stearyl decylamine, N-oleyl stearylamine, N-stearyl glucosamine, hydroxymethyl stearylamine, methylene Bistearate, ethylidene, exoethyl bis-lauroside, ethyl bis-stearylamine, ethyl bishydroxystearylamine, ethyl bis-decylamine Hexamethylene distearylamine, hexamethylenebisammoniumamine, hexamethylene hydroxystearamide, N,N'-distearylhexamethyleneamine, N,N'-di Stearyl diamine, diethylamine, exoethylcandamine, hexamethylenebisoleamide, N,N'-dioleyl decylamine, N,N' - Dioleyl quinone diamine, p-xylylene bis stearylamine, p-xylylene bishydroxystearylamine, N, N'-stearyl methacrylamide, and the like. These lubricants may be used alone or in combination of two or more.

潤滑劑占上述防靜電層整體之比率可設為1~50質量%,通常設為5~40質量%較合適。若潤滑劑之含有比率過少,則有滑動性變得容易降低之傾向。若潤滑劑之含有比率過多,則存在印字密接性降低之可能性。 The ratio of the lubricant to the entire antistatic layer can be 1 to 50% by mass, and usually 5 to 40% by mass. When the content ratio of the lubricant is too small, the slidability tends to be lowered. If the content ratio of the lubricant is too large, there is a possibility that the printing adhesion is lowered.

於未大幅損及其應用效果之限度下,此處所揭示之技術可以防靜電層(面塗層)除了含有上述脂肪醯胺以外亦含有其他潤滑劑之態樣而實施。作為該其他潤滑劑之例,可列舉石油系蠟(石蠟等)、礦物系蠟(褐煤蠟等)、高級脂肪酸(蠟酸等)、中性脂肪(棕櫚酸三甘油酯等)之類之各種蠟。或者除上述蠟以外,亦可使其輔助性地含有通常之聚 矽氧系潤滑劑、氟系潤滑劑等。此處所揭示之技術可以實質上不含該聚矽氧系潤滑劑、氟系潤滑劑等之態樣而較佳地實施。但於未大幅損及此處所揭示之技術之應用效果之限度下,並不排除含有除作為潤滑劑外用於其他目的(例如,作為下文所述之防靜電層形成用塗佈材料之消泡劑)之聚矽氧系化合物。 The technique disclosed herein can be carried out in such a manner that the antistatic layer (top coat layer) contains other lubricants in addition to the above-mentioned fatty guanamine, without being greatly impaired and its application effect. Examples of the other lubricants include petroleum waxes (such as paraffin), mineral waxes (such as montan wax), higher fatty acids (such as waxy acid), and neutral fats (such as palmitic acid triglyceride). wax. Or in addition to the above wax, it may also be auxiliary to contain the usual aggregation An oxygen-based lubricant, a fluorine-based lubricant, or the like. The technique disclosed herein can be preferably carried out without substantially including the aspect of the polyfluorene-based lubricant, the fluorine-based lubricant or the like. However, without detracting from the application effect of the technology disclosed herein, it is not excluded to contain an antifoaming agent for other purposes other than as a lubricant (for example, as a coating material for forming an antistatic layer described below). a polyoxygen compound.

<交聯劑> <crosslinker>

上述防靜電層之特徵在於含有異氰酸酯系交聯劑作為交聯劑。藉由使用上述異氰酸酯系交聯劑,可於形成防靜電層時將作為必需成分之水溶性聚苯胺磺酸固定於黏合劑中,耐水性優異,進而可實現提高印字密接性等之效果。 The above antistatic layer is characterized by containing an isocyanate crosslinking agent as a crosslinking agent. By using the above-mentioned isocyanate-based crosslinking agent, the water-soluble polyaniline sulfonic acid, which is an essential component, can be fixed to the binder when the antistatic layer is formed, and the water resistance is excellent, and the effect of improving the printing adhesion and the like can be achieved.

又,較佳之態樣為使用即便在水溶液中亦穩定之封端化異氰酸酯系交聯劑作為上述異氰酸酯系交聯劑。作為上述封端化異氰酸酯系交聯劑之具體例,可使用以醇類、酚類、苯硫酚類、胺類、醯亞胺類、肟類、內醯胺類、活性亞甲基化合物類、硫醇類、亞胺類、脲類、二芳基化合物類及亞硫酸氫鈉等將通常之黏著劑層或防靜電層(面塗層)製備時可使用之異氰酸酯系交聯劑(例如,用於下文所述之黏著劑層之異氰酸酯化合物(異氰酸酯系交聯劑))封端而成者。 Moreover, it is preferable to use a blocked isocyanate type crosslinking agent which is stable even in an aqueous solution as the said isocyanate type crosslinking agent. Specific examples of the blocked isocyanate crosslinking agent include alcohols, phenols, thiophenols, amines, quinones, anthraquinones, indoleamines, and active methylene compounds. An isocyanate-based crosslinking agent which can be used in the preparation of a usual adhesive layer or an antistatic layer (top coat) such as a mercaptan, an imine, a urea, a diaryl compound or sodium hydrogen sulfite (for example) The isocyanate compound (isocyanate crosslinking agent) used for the adhesive layer described below is blocked.

此處所揭示之技術中之防靜電層可視需要而含有其他防靜電成分、抗氧化劑、著色劑(顏料、染料等)、流動性調整劑(觸變劑、增黏劑等)、造膜助劑、界面活性劑(消泡劑等)、防腐劑等添加劑。 The antistatic layer in the technology disclosed herein may contain other antistatic components, antioxidants, colorants (pigments, dyes, etc.), fluidity adjusters (thixotropic agents, tackifiers, etc.), and film forming aids as needed. Additives such as surfactants (antifoaming agents, etc.) and preservatives.

<防靜電層之形成> <Formation of antistatic layer>

上述防靜電層(面塗層)可藉由包括如下步驟之方法而較佳地形成:將上述導電性聚合物成分等必需成分及視需要而使用之添加劑溶解於適當之溶劑(水等)中,並將由此而得之液狀組合物(防靜電層形成用塗佈材料、防靜電劑組合物)賦予至基材。例如,可較佳地採用如下方法:將上述塗佈材料塗佈於基材之第一面並將其乾燥,並且視需 要而進行硬化處理(熱處理、紫外線處理等)。上述塗佈材料之NV(不揮發分)例如可設為5質量%以下(典型而言為0.05~5質量%),通常設為1質量%以下(典型而言為0.10~1質量%)較合適。於形成厚度較小之防靜電層之情形時,較佳為將上述塗佈材料之NV設為例如0.05~0.50質量%(例如0.10~0.40質量%)。如上所述,藉由使用低NV之塗佈材料,可形成更均勻之防靜電層。 The antistatic layer (top coat layer) can be preferably formed by dissolving an essential component such as the conductive polymer component and an additive used as needed in an appropriate solvent (water, etc.). The liquid composition (the coating material for forming an antistatic layer, the antistatic agent composition) thus obtained is applied to the substrate. For example, a method of applying the above coating material to the first side of the substrate and drying it, and optionally Hardening treatment (heat treatment, ultraviolet treatment, etc.) is required. The NV (nonvolatile content) of the coating material can be, for example, 5% by mass or less (typically 0.05 to 5% by mass), and usually 1% by mass or less (typically 0.10 to 1% by mass). Suitable. In the case of forming an antistatic layer having a small thickness, it is preferable that the NV of the coating material is, for example, 0.05 to 0.50% by mass (for example, 0.10 to 0.40% by mass). As described above, a more uniform antistatic layer can be formed by using a coating material of low NV.

作為構成上述防靜電層形成用塗佈材料之溶劑,較佳為可穩定地溶解防靜電層之形成成分者。該溶劑可為有機溶劑、水、或該等之混合溶劑。作為上述有機溶劑,例如,可使用選自下述溶劑中之一種或兩種以上:乙酸乙酯等酯類;甲基乙基酮、丙酮、環己酮等酮類;四氫呋喃(THF)、二烷等環狀醚類;正己烷、環己烷等脂肪族或脂環族烴類;甲苯、二甲苯等芳香族烴類;甲醇、乙醇、正丙醇、異丙醇、環己醇等脂肪族或脂環族醇類;伸烷基二醇單烷基醚(例如,乙二醇單甲醚、乙二醇單乙醚)、二伸烷基二醇單烷基醚等二醇醚類;等。於較佳之一態樣中,上述塗佈材料之溶劑係水或以水為主成分之混合溶劑(例如,水與乙醇之混合溶劑)。 The solvent constituting the coating material for forming an antistatic layer is preferably one which can stably dissolve the constituent component of the antistatic layer. The solvent may be an organic solvent, water, or a mixed solvent of these. As the organic solvent, for example, one or two or more selected from the group consisting of esters such as ethyl acetate; ketones such as methyl ethyl ketone, acetone, and cyclohexanone; tetrahydrofuran (THF) and two can be used. a cyclic ether such as an alkane; an aliphatic or alicyclic hydrocarbon such as n-hexane or cyclohexane; an aromatic hydrocarbon such as toluene or xylene; or a fat such as methanol, ethanol, n-propanol, isopropanol or cyclohexanol. a family or alicyclic alcohol; alkylene glycol monoalkyl ether (for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether), dialkyl alkyl glycol monoalkyl ether and other glycol ethers; Wait. In a preferred embodiment, the solvent of the coating material is water or a mixed solvent containing water as a main component (for example, a mixed solvent of water and ethanol).

<防靜電層之性狀> <Properties of antistatic layer>

此處所揭示之技術中之防靜電層之厚度典型而言為3~500nm,較佳為3~100nm,更佳為3~60nm。若防靜電層之厚度過小,則變得難以均勻地形成防靜電層(例如,於防靜電層之厚度方面,不同部位之厚度之偏差變大),因此,有存在表面保護膜之外觀變得容易產生不均之情況之可能性。另一方面,若過厚,則存在對基材之特性(光學特性、尺寸穩定性等)造成影響之情況。 The thickness of the antistatic layer in the technique disclosed herein is typically from 3 to 500 nm, preferably from 3 to 100 nm, more preferably from 3 to 60 nm. When the thickness of the antistatic layer is too small, it becomes difficult to form an antistatic layer uniformly (for example, the thickness of the antistatic layer varies greatly depending on the thickness of the antistatic layer), and therefore, the appearance of the surface protective film becomes The possibility of an uneven situation. On the other hand, if it is too thick, it may affect the characteristics (optical characteristics, dimensional stability, etc.) of the substrate.

於此處所揭示之表面保護膜之較佳之一態樣中,作為於防靜電層之表面所測定之表面電阻值(Ω/□),較佳為未達1.0×1011,更佳為未達5.0×1010,進而較佳為未達1.0×1010。顯示上述範圍內之表面電阻 值之表面保護膜可較佳地用作例如液晶單元或半導體裝置等般避忌靜電之物品之加工或搬送過程等中所使用之表面保護膜。再者,上述表面電阻值可根據使用市售之絕緣電阻測定裝置於23℃、50%RH之環境下測定之表面電阻值而算出。 In a preferred aspect of the surface protective film disclosed herein, the surface resistance value (Ω/□) measured as the surface of the antistatic layer is preferably less than 1.0×10 11 , more preferably less than 5.0 × 10 10 , and further preferably less than 1.0 × 10 10 . The surface protective film which exhibits the surface resistance value in the above range can be preferably used as a surface protective film used in processing or transporting of articles such as liquid crystal cells or semiconductor devices. Further, the surface resistance value can be calculated from the surface resistance value measured in an environment of 23 ° C and 50% RH using a commercially available insulation resistance measuring device.

此處所揭示之表面保護膜較佳為具有其背面(防靜電層之表面)可利用水性油墨或油性油墨(例如,使用油性馬克筆)而容易地印字之性質。該表面保護膜適於如下情形:於在貼附有表面保護膜之狀態下進行之被黏著體(例如光學零件)之加工或搬送等過程中,將作為保護對象之被黏著體之識別編號等記載並顯示於上述表面保護膜。因此,較佳為印字性優異之表面保護膜。例如,較佳為對於溶劑為醇系且包含顏料之類型之油性油墨具有較高之印字性。又,較佳為所印字之油墨不易因摩擦或轉接著而脫落(即,印字密接性優異)。又,此處所揭示之表面保護膜較佳為具有在修正或消除印字時,即便利用醇(例如乙醇)擦拭印字,外觀亦不會產生顯著變化之程度之耐溶劑性。 The surface protective film disclosed herein preferably has a property that the back surface (the surface of the antistatic layer) can be easily printed by using an aqueous ink or an oily ink (for example, using an oily marker). The surface protective film is suitable for the identification number of the adherend to be protected, etc. in the process of processing or transporting the adherend (for example, an optical component) in a state in which the surface protective film is attached. It is described and displayed on the above surface protective film. Therefore, a surface protective film excellent in printability is preferred. For example, it is preferred that the oil-based ink of the type in which the solvent is alcohol-based and contains a pigment has high printing property. Further, it is preferable that the ink to be printed is not easily peeled off due to rubbing or turning (that is, excellent in printing adhesion). Further, the surface protective film disclosed herein preferably has solvent resistance to such an extent that the appearance does not change significantly even when printing is corrected by printing with an alcohol (for example, ethanol).

此處所揭示之表面保護膜可以除了基材、黏著劑層及防靜電層以外進而亦包含其他層之態樣而實施。作為該「其他層」之配置,可例示基材之第一面(背面)與防靜電層之間、基材之第二面(正面)與黏著劑層之間等。配置於基材背面與防靜電層之間之層例如可為含有防靜電成分之層(上述之防靜電層)。配置於基材正面與黏著劑層之間之層例如可為提高黏著劑層對上述第二面之固著性之底塗層(錨固層)、防靜電層等。亦可為於基材正面配置有防靜電層、於防靜電層上配置有錨固層、於其上配置有黏著劑層之構成之表面保護膜。 The surface protective film disclosed herein can be implemented in addition to the substrate, the adhesive layer, and the antistatic layer, and further includes other layers. The arrangement of the "other layer" may be, for example, between the first surface (back surface) of the substrate and the antistatic layer, between the second surface (front surface) of the substrate, and the adhesive layer. The layer disposed between the back surface of the substrate and the antistatic layer may be, for example, a layer containing an antistatic component (the above-described antistatic layer). The layer disposed between the front surface of the substrate and the adhesive layer may be, for example, an undercoat layer (an anchor layer), an antistatic layer, or the like which improves the adhesion of the adhesive layer to the second surface. A surface protective film having an antistatic layer disposed on the front surface of the substrate, an anchor layer disposed on the antistatic layer, and an adhesive layer disposed thereon may be used.

<黏著劑組合物> <Adhesive Composition>

本發明之表面保護膜具有上述黏著劑層,上述黏著劑層係由黏著劑組合物形成,作為上述黏著劑組合物,只要為具有黏著性者,則可無特別限制地使用,例如亦可使用丙烯酸系黏著劑、胺基甲酸酯系 黏著劑、合成橡膠系黏著劑、天然橡膠系黏著劑、聚矽氧系黏著劑等,其中,更佳為選自由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所組成之群中之至少一種,尤佳為使用丙烯酸系黏著劑,且該丙烯酸系黏著劑使用(甲基)丙烯酸系聚合物。 The surface protective film of the present invention has the above-mentioned pressure-sensitive adhesive layer, and the pressure-sensitive adhesive layer is formed of an adhesive composition. The adhesive composition can be used without any particular limitation as long as it has adhesiveness. For example, it can also be used. Acrylic adhesive, urethane system An adhesive, a synthetic rubber adhesive, a natural rubber adhesive, a polyoxygen adhesive, and the like, and more preferably selected from the group consisting of an acrylic adhesive, an urethane adhesive, and a polyoxygen adhesive. It is preferable to use an acrylic adhesive in at least one of the group consisting of, and a (meth)acrylic-type polymer is used for this acrylic adhesive.

於上述黏著劑層使用丙烯酸系黏著劑之情形時,構成上述丙烯酸系黏著劑之(甲基)丙烯酸系聚合物可使用具有碳數1~14之烷基之(甲基)丙烯酸系單體作為構成其之原料單體。作為上述(甲基)丙烯酸系單體,可使用一種或兩種以上作為主成分。藉由使用上述具有碳數為1~14之烷基之(甲基)丙烯酸系單體,變得容易將對被黏著體(被保護體)之黏著力控制為較低,而可獲得輕剝離性或再剝離性優異之表面保護膜。再者,本發明中之所謂(甲基)丙烯酸系聚合物係指丙烯酸系聚合物及/或甲基丙烯酸系聚合物,又,所謂(甲基)丙烯酸酯係指丙烯酸酯及/或甲基丙烯酸酯。又,本發明中之所謂「主成分」意指於構成之成分總量中最多之成分,係指較佳為超過40質量%,更佳為超過50質量%,進而較佳為超過60質量%。 When an acrylic pressure-sensitive adhesive is used as the pressure-sensitive adhesive layer, the (meth)acrylic polymer constituting the acrylic pressure-sensitive adhesive may be a (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms. The raw material monomer constituting it. As the (meth)acrylic monomer, one type or two or more types may be used as a main component. By using the above (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms, it is easy to control the adhesion to the adherend (protected body) to be low, and light peeling can be obtained. A surface protective film excellent in properties or removability. In the present invention, the (meth)acrylic polymer refers to an acrylic polymer and/or a methacrylic polymer, and the term "(meth)acrylate" refers to an acrylate and/or a methyl group. Acrylate. In addition, the term "main component" in the present invention means the component which is the most abundant in the total amount of components, and preferably means more than 40% by mass, more preferably more than 50% by mass, and still more preferably more than 60% by mass. .

作為上述具有碳數1~14之烷基之(甲基)丙烯酸系單體之具體例,例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二烷基酯、(甲基)丙烯酸正十三烷基酯、(甲基)丙烯酸正十四烷基酯等。 Specific examples of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms include, for example, methyl (meth)acrylate, ethyl (meth)acrylate, and (meth)acrylic acid. Butyl ester, second butyl (meth) acrylate, tert-butyl (meth) acrylate, isobutyl (meth) acrylate, hexyl (meth) acrylate, 2-ethyl methacrylate Ester, n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, (methyl) Isodecyl acrylate, n-dodecyl (meth)acrylate, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, and the like.

其中,對於本發明之表面保護膜而言,可列舉(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正 癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二烷基酯、(甲基)丙烯酸正十三烷基酯、(甲基)丙烯酸正十四烷基酯等具有碳數6~14之烷基之(甲基)丙烯酸系單體作為適宜者。尤其藉由使用具有碳數6~14之烷基之(甲基)丙烯酸系單體,變得容易將對被黏著體之黏著力控制為較低,而成為再剝離性優異者。 Among them, examples of the surface protective film of the present invention include hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, and isooctyl (meth)acrylate. Ester, n-decyl (meth)acrylate, isodecyl (meth)acrylate, (meth)acrylic acid Anthracene ester, isodecyl (meth)acrylate, n-dodecyl (meth)acrylate, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, etc. A (meth)acrylic monomer having an alkyl group of 6 to 14 is suitable. In particular, by using a (meth)acrylic monomer having an alkyl group having 6 to 14 carbon atoms, it is easy to control the adhesion to the adherend to be low, and it is excellent in removability.

尤其是相對於構成上述(甲基)丙烯酸系聚合物之單體成分總量100質量%,較佳為含有50質量%以上、更佳為60質量%以上、進而較佳為70質量%以上、最佳為80~93質量%之具有碳數為1~14之烷基之(甲基)丙烯酸系單體。若未達50質量%,則黏著劑組合物之適度之潤濕性、或黏著劑層之凝聚力變差,故而欠佳。 In particular, it is preferably 50% by mass or more, more preferably 60% by mass or more, and still more preferably 70% by mass or more, based on 100% by mass of the total of the monomer components constituting the (meth)acrylic polymer. The (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms is preferably 80 to 93% by mass. If it is less than 50% by mass, the appropriate wettability of the adhesive composition or the cohesive force of the adhesive layer may be deteriorated, which is not preferable.

又,本發明之黏著劑組合物較佳為上述(甲基)丙烯酸系聚合物含有具有羥基之(甲基)丙烯酸系單體作為原料單體。作為上述具有羥基之(甲基)丙烯酸系單體,可使用一種或兩種以上作為主成分。 Moreover, in the adhesive composition of the present invention, it is preferred that the (meth)acrylic polymer contains a (meth)acrylic monomer having a hydroxyl group as a raw material monomer. As the (meth)acrylic monomer having a hydroxyl group, one type or two or more types may be used as a main component.

藉由使用上述具有羥基之(甲基)丙烯酸系單體,變得容易控制黏著劑組合物之交聯等,進而容易控制因流動引起之潤濕性之改善與剝離中黏著力之降低的平衡。進而,與通常可作為交聯部位而發揮作用之羧基或磺酸酯基等不同,羥基與作為防靜電成分(防靜電劑)之離子性化合物或具有氧伸烷基鏈之有機聚矽氧烷具有適度之相互作用,因此於防靜電性之方面亦可適宜地使用。 By using the above-mentioned (meth)acrylic monomer having a hydroxyl group, it is easy to control the crosslinking of the adhesive composition, etc., and it is easy to control the improvement of the wettability due to the flow and the balance of the adhesive force in the peeling. . Further, unlike a carboxyl group or a sulfonate group which can function as a crosslinking site, a hydroxyl group and an ionic compound as an antistatic component (antistatic agent) or an organopolyoxane having an oxygen alkyl chain It has a moderate interaction, and therefore can be suitably used in terms of antistatic property.

作為上述具有羥基之(甲基)丙烯酸系單體,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、丙烯酸(4-羥基甲基環己基)甲酯、N-羥甲基(甲基)丙烯醯胺、乙烯醇、烯丙醇、2-羥基乙基乙烯基醚、4-羥基丁基乙烯基醚、二乙二醇單乙烯基醚等。尤其是藉由使用烷基之碳數為4以上之具有羥基之(甲基)丙烯酸系單體,高速 剝離時之輕剝離化變得容易,故而較佳。 Examples of the (meth)acrylic monomer having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. , 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, acrylic acid (4-hydroxyl) Methylcyclohexyl)methyl ester, N-methylol (meth) acrylamide, vinyl alcohol, allyl alcohol, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol Monovinyl ether and the like. In particular, by using a (meth)acrylic monomer having a hydroxyl group of 4 or more and having a hydroxyl group, a high speed It is preferable that the light peeling at the time of peeling becomes easy.

相對於上述具有碳數為1~14之烷基之(甲基)丙烯酸系單體100質量份,較佳為含有15質量%以下、更佳為1~13質量%、進而較佳為2~11質量%、最佳為3.5~10質量%之上述具有羥基之(甲基)丙烯酸系單體。若處於上述範圍內,則變得容易控制黏著劑組合物之潤濕性與所獲得之黏著劑層之凝聚力的平衡,故而較佳。 100 parts by mass of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms is preferably 15% by mass or less, more preferably 1 to 13% by mass, still more preferably 2% by mass. 11% by mass, and most preferably 3.5 to 10% by mass of the above-mentioned (meth)acrylic monomer having a hydroxyl group. If it is in the above range, it becomes easy to control the balance between the wettability of the adhesive composition and the cohesive force of the obtained adhesive layer, which is preferable.

又,作為其他聚合性單體成分,基於容易取得黏著性能之平衡之理由,可以Tg成為0℃以下(通常-100℃以上)之方式,於無損本發明之效果之範圍內使用用以調整(甲基)丙烯酸系聚合物之玻璃轉移溫度或剝離性之聚合性單體等。 In addition, as the other polymerizable monomer component, Tg can be used in the range of 0 ° C or less (usually -100 ° C or more) for the purpose of not impairing the effect of the present invention for the purpose of easily obtaining the balance of the adhesive performance. A polymerizable monomer such as a glass transition temperature or a releasable property of a methyl)acrylic polymer.

作為上述(甲基)丙烯酸系聚合物中使用之上述具有碳數1~14之烷基之(甲基)丙烯酸系單體及上述具有羥基之(甲基)丙烯酸系單體以外之其他聚合性單體,可使用具有羧基之(甲基)丙烯酸系單體。 The (meth)acrylic monomer having the alkyl group having 1 to 14 carbon atoms used in the (meth)acrylic polymer and the (meth)acrylic monomer having the hydroxyl group as described above As the monomer, a (meth)acrylic monomer having a carboxyl group can be used.

作為上述具有羧基之(甲基)丙烯酸系單體,例如可列舉(甲基)丙烯酸、(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸等。 Examples of the (meth)acrylic monomer having a carboxyl group include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, and maleic acid. , fumaric acid, etc.

上述具有羧基之(甲基)丙烯酸系單體相對於上述具有碳數為1~14之烷基之(甲基)丙烯酸系單體100質量份,較佳為10質量份以下,更佳為5質量份以下,進而較佳為未達3質量份,最佳為0.01質量份以上且未達1質量份。若超過10質量份,則大量存在極性作用較大之羧基之類的酸官能基,於調配離子性化合物作為防靜電成分之情形時,有因羧基等酸官能基與上述離子性化合物相互作用而妨礙離子傳導,從而導電效率降低,而變得無法獲得充分之防靜電性之虞,故而欠佳。 The (meth)acrylic monomer having a carboxyl group is preferably 10 parts by mass or less, more preferably 10 parts by mass or less, based on 100 parts by mass of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms. The amount is preferably not more than 3 parts by mass, more preferably 0.01 parts by mass or more and less than 1 part by mass. When the amount is more than 10 parts by mass, an acid functional group such as a carboxyl group having a large polarity is present in a large amount, and when an ionic compound is used as an antistatic component, an acid functional group such as a carboxyl group interacts with the ionic compound. The ion conduction is hindered, and the electric conduction efficiency is lowered, so that sufficient antistatic property cannot be obtained, which is not preferable.

進而,作為上述(甲基)丙烯酸系聚合物中使用之上述具有碳數1~14之烷基之(甲基)丙烯酸系單體、具有羥基之(甲基)丙烯酸系單體 及具有羧基之(甲基)丙烯酸系單體以外之其他聚合性單體,只要為無損本發明之特性之範圍內,則可無特別限定地使用。例如,可適當使用含氰基單體、乙烯酯單體、芳香族乙烯基單體等提高凝聚力、耐熱性之成分,或含醯胺基單體、含醯亞胺基單體、含胺基單體、含環氧基單體、N-丙烯醯基啉、乙烯基醚單體等提高黏著力或具有作為交聯化基點而發揮作用之官能基之成分。該等聚合性單體可單獨使用,亦可將兩種以上混合而使用。 Further, as the (meth)acrylic polymer, the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms, a (meth)acrylic monomer having a hydroxyl group, and a carboxyl group are used. The polymerizable monomer other than the (meth)acrylic monomer can be used without particular limitation as long as it does not detract from the characteristics of the present invention. For example, a component containing a cyano group-containing monomer, a vinyl ester monomer, an aromatic vinyl monomer or the like to improve cohesive force and heat resistance, or a guanidine-containing monomer, a ruthenium-containing monomer, and an amine group may be suitably used. Monomer, epoxy-containing monomer, N-propylene fluorenyl A component such as a phenyl group or a vinyl ether monomer which has an adhesive property or a functional group which functions as a crosslinking crosslinking point. These polymerizable monomers may be used singly or in combination of two or more.

作為含氰基單體,例如可列舉丙烯腈、甲基丙烯腈。 Examples of the cyano group-containing monomer include acrylonitrile and methacrylonitrile.

作為乙烯酯單體,例如可列舉乙酸乙烯酯、丙酸乙烯酯、月桂酸乙烯酯等。 Examples of the vinyl ester monomer include vinyl acetate, vinyl propionate, and vinyl laurate.

作為芳香族乙烯基單體,例如可列舉苯乙烯、氯苯乙烯、氯甲基苯乙烯、α-甲基苯乙烯、其他取代苯乙烯等。 Examples of the aromatic vinyl monomer include styrene, chlorostyrene, chloromethylstyrene, α-methylstyrene, and other substituted styrenes.

作為含醯胺基單體,例如可列舉丙烯醯胺、甲基丙烯醯胺、二乙基丙烯醯胺、N-乙烯基吡咯啶酮、N,N-二甲基丙烯醯胺、N,N-二甲基甲基丙烯醯胺、N,N-二乙基丙烯醯胺、N,N-二乙基甲基丙烯醯胺、N,N'-亞甲基雙丙烯醯胺、N,N-二甲基胺基丙基丙烯醯胺、N,N-二甲基胺基丙基甲基丙烯醯胺、二丙酮丙烯醯胺等。 Examples of the guanamine-containing monomer include acrylamide, methacrylamide, diethyl acrylamide, N-vinyl pyrrolidone, N,N-dimethyl decylamine, N, N. - dimethyl methacrylamide, N,N-diethyl acrylamide, N,N-diethyl methacrylamide, N,N'-methylenebis acrylamide, N,N - dimethylaminopropyl acrylamide, N,N-dimethylaminopropyl methacrylamide, diacetone acrylamide, and the like.

作為含醯亞胺基單體,例如可列舉環己基順丁烯二醯亞胺、異丙基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺、伊康醯亞胺等。 Examples of the quinone imine group-containing monomer include cyclohexylmethyleneimine, isopropyl maleimide, N-cyclohexylmethyleneimine, and iconimine. Wait.

作為含胺基單體,例如可列舉(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基丙酯等。 Examples of the amine group-containing monomer include aminoethyl (meth)acrylate, N,N-dimethylaminoethyl (meth)acrylate, and N,N-dimethylamine (meth)acrylate. Propyl ester and the like.

作為含環氧基單體,例如可列舉(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯、烯丙基縮水甘油基醚等。 Examples of the epoxy group-containing monomer include glycidyl (meth)acrylate, methyl glycidyl (meth)acrylate, and allyl glycidyl ether.

作為乙烯基醚單體,例如可列舉甲基乙烯基醚、乙基乙烯基醚、異丁基乙烯基醚等。 Examples of the vinyl ether monomer include methyl vinyl ether, ethyl vinyl ether, and isobutyl vinyl ether.

於本發明中,具有碳數1~14之烷基之(甲基)丙烯酸系單體、具 有羥基之(甲基)丙烯酸系單體、具有羧基之(甲基)丙烯酸系單體以外之其他聚合性單體相對於上述具有碳數為1~14之烷基之(甲基)丙烯酸系單體100質量份,較佳為0~40質量份,更佳為0~30質量份。藉由於上述範圍內使用上述其他聚合性單體,於使用離子性化合物作為防靜電劑之情形時,可適當調節與上述離子性化合物之良好之相互作用及良好之再剝離性。 In the present invention, a (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms a (meth)acrylic acid having a hydroxyl group-containing (meth)acrylic monomer or a carboxyl group-containing (meth)acrylic monomer other than the above-mentioned alkyl group having an alkyl group having 1 to 14 carbon atoms The monomer is 100 parts by mass, preferably 0 to 40 parts by mass, more preferably 0 to 30 parts by mass. When the above-mentioned other polymerizable monomer is used in the above range, when an ionic compound is used as an antistatic agent, a good interaction with the above ionic compound and good removability can be appropriately adjusted.

上述(甲基)丙烯酸系聚合物可進而含有含環氧烷基之反應性單體作為單體成分。 The (meth)acrylic polymer may further contain a reactive monomer containing an alkylene oxide group as a monomer component.

又,作為上述含環氧烷基之反應性單體之氧伸烷基單元之平均加成莫耳數,就與作為防靜電成分之離子性化合物之相溶性之觀點而言,較佳為1~40,更佳為3~40,進而較佳為4~35,尤佳為5~30。於上述平均加成莫耳數為1以上之情形時,有高效率地獲得減少被黏著體(被保護體)之污染之效果之傾向。又,於上述平均加成莫耳數大於40之情形時,有與離子性化合物之相互作用較大,黏著劑組合物之黏度上升而變得難以塗佈之傾向,故而欠佳。再者,氧伸烷基鏈之末端可直接為羥基,亦可經其他官能基等所取代。 Further, the average addition mole number of the oxygen-extended alkyl unit as the epoxy group-containing reactive monomer is preferably 1 from the viewpoint of compatibility with the ionic compound as an antistatic component. ~40, more preferably 3~40, further preferably 4~35, especially preferably 5~30. When the average addition molar number is 1 or more, the effect of reducing the contamination by the adherend (protected body) tends to be obtained with high efficiency. Further, when the average addition molar number is more than 40, the interaction with the ionic compound is large, and the viscosity of the adhesive composition is increased to make it difficult to apply, which is not preferable. Further, the terminal of the oxygen alkyl chain may be directly a hydroxyl group, or may be substituted by another functional group or the like.

上述含環氧烷基之反應性單體可單獨使用,亦可混合兩種以上而使用,作為整體之含量於上述(甲基)丙烯酸系聚合物之單體成分總量中較佳為20質量%以下,更佳為10質量%以下,進而較佳為5質量%以下,進而更佳為4質量%以下,尤佳為3質量%以下,更進而較佳為1質量%以下。若含環氧烷基之反應性單體之含量超過10質量%,則與離子性化合物之相互作用變大,妨礙離子傳導,防靜電性降低,故而欠佳。 The epoxy group-containing reactive monomer may be used singly or in combination of two or more. The total content of the monomer component of the (meth)acrylic polymer is preferably 20% by mass. % or less is more preferably 10% by mass or less, further preferably 5% by mass or less, further preferably 4% by mass or less, particularly preferably 3% by mass or less, and still more preferably 1% by mass or less. When the content of the epoxy group-containing reactive monomer exceeds 10% by mass, the interaction with the ionic compound becomes large, and ion conduction is hindered, and the antistatic property is lowered, which is not preferable.

作為上述含環氧烷基之反應性單體之氧伸烷基單元,可列舉具有碳數1~6之伸烷基者,例如可列舉:氧基亞甲基、氧基伸乙基、氧基伸丙基、氧基伸丁基等。氧伸烷基鏈之烴基可為直鏈,亦可為支 鏈。 Examples of the oxygen-extended alkyl unit of the above-mentioned epoxy group-containing reactive monomer include those having a C 1 to 6 alkyl group, and examples thereof include an oxymethylene group, an oxyethyl group, and an oxy group. Propyl, oxybutylene, and the like. The hydrocarbyl group of the alkyl chain may be linear or branched. chain.

又,更佳為上述含環氧烷基之反應性單體為具有環氧乙烷基之反應性單體。藉由使用包含具有環氧乙烷基之反應性單體之(甲基)丙烯酸系聚合物作為基礎聚合物,基礎聚合物與離子性化合物之相溶性提高,適宜地抑制向被黏著體之滲出,可獲得低污染性之黏著劑組合物。 Further, it is more preferred that the epoxy group-containing reactive monomer is a reactive monomer having an oxiranyl group. By using a (meth)acrylic polymer containing a reactive monomer having an oxiranyl group as a base polymer, the compatibility of the base polymer with the ionic compound is improved, and the bleeding to the adherend is suitably suppressed. A low-contaminant adhesive composition can be obtained.

作為上述含環氧烷基之反應性單體,例如,可列舉(甲基)丙烯酸環氧烷加成物、或分子中具有丙烯醯基、甲基丙烯醯基、烯丙基等反應性取代基之反應性界面活性劑等。 Examples of the epoxy group-containing reactive monomer include a (meth)acrylic acid alkylene oxide adduct or a reactive substitution such as an acrylonitrile group, a methacryl fluorenyl group, or an allyl group in the molecule. Based on reactive surfactants and the like.

作為上述(甲基)丙烯酸環氧烷加成物之具體例,例如可列舉:聚乙二醇(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、聚乙二醇-聚丙二醇(甲基)丙烯酸酯、聚乙二醇-聚丁二醇(甲基)丙烯酸酯、聚丙二醇-聚丁二醇(甲基)丙烯酸酯、甲氧基聚乙二醇(甲基)丙烯酸酯、乙氧基聚乙二醇(甲基)丙烯酸酯、丁氧基聚乙二醇(甲基)丙烯酸酯、辛氧基聚乙二醇(甲基)丙烯酸酯、月桂氧基聚乙二醇(甲基)丙烯酸酯、硬脂氧基聚乙二醇(甲基)丙烯酸酯、苯氧基聚乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯、辛氧基聚乙二醇-聚丙二醇(甲基)丙烯酸酯等。 Specific examples of the (meth)acrylic acid alkylene oxide adduct include polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, and polyethylene glycol-polypropylene glycol (A). Acrylate, polyethylene glycol-polybutylene glycol (meth) acrylate, polypropylene glycol-polybutylene glycol (meth) acrylate, methoxy polyethylene glycol (meth) acrylate, B Oxypoly polyethylene glycol (meth) acrylate, butoxy polyethylene glycol (meth) acrylate, octyloxy polyethylene glycol (meth) acrylate, lauryl oxy polyethylene glycol (A Acrylate, stearyloxy polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, octyloxy poly Ethylene glycol-polypropylene glycol (meth) acrylate or the like.

又,作為上述反應性界面活性劑之具體例,例如,可列舉具有(甲基)丙烯醯基或烯丙基之陰離子型反應性界面活性劑、非離子型反應性界面活性劑、陽離子型反應性界面活性劑等。 Moreover, as a specific example of the reactive surfactant, for example, an anionic reactive surfactant having a (meth)acryl fluorenyl group or an allyl group, a nonionic reactive surfactant, and a cationic reaction can be mentioned. Sexual surfactants, etc.

上述(甲基)丙烯酸系聚合物之重量平均分子量(Mw)較佳為10萬~500萬,更佳為20萬~400萬,進而較佳為30萬~300萬。於重量平均分子量小於10萬之情形時,由於黏著劑層之凝聚力變小而有產生糊劑殘留之傾向。另一方面,於重量平均分子量超過500萬之情形時,聚合物之流動性降低,對被黏著體(例如,偏光板)之潤濕不充分,而有 導致於被黏著體與表面保護膜之黏著劑層之間產生之起泡的傾向。再者,重量平均分子量係指藉由GPC(凝膠滲透層析法)所測得者。 The weight average molecular weight (Mw) of the (meth)acrylic polymer is preferably from 100,000 to 5,000,000, more preferably from 200,000 to 4,000,000, and still more preferably from 300,000 to 3,000,000. When the weight average molecular weight is less than 100,000, the cohesive force of the adhesive layer becomes small, and the paste tends to remain. On the other hand, when the weight average molecular weight exceeds 5 million, the fluidity of the polymer is lowered, and the wetting of the adherend (for example, a polarizing plate) is insufficient, and This causes a tendency to foam between the adhesive layer and the adhesive layer of the surface protective film. Further, the weight average molecular weight means those measured by GPC (gel permeation chromatography).

又,上述(甲基)丙烯酸系聚合物之玻璃轉移溫度(Tg)較佳為0℃以下,更佳為-10℃以下(通常-100℃以上)。於玻璃轉移溫度高於0℃之情形時,聚合物難以流動,有例如對偏光板之潤濕不充分,而導致於偏光板與表面保護膜之黏著劑層之間產生之起泡的傾向。尤其是藉由將玻璃轉移溫度設為-61℃以下,容易獲得對偏光板之潤濕性與輕剝離性優異之黏著劑層。再者,(甲基)丙烯酸系聚合物之玻璃轉移溫度可藉由適當改變所使用之單體成分或組成比而調整至上述範圍內。 Further, the glass transition temperature (Tg) of the (meth)acrylic polymer is preferably 0 ° C or lower, more preferably -10 ° C or lower (normally -100 ° C or higher). When the glass transition temperature is higher than 0 ° C, the polymer is difficult to flow, and there is, for example, insufficient wetting of the polarizing plate, resulting in a tendency to foam between the polarizing plate and the adhesive layer of the surface protective film. In particular, by setting the glass transition temperature to -61 ° C or lower, it is easy to obtain an adhesive layer which is excellent in wettability and light peelability to a polarizing plate. Further, the glass transition temperature of the (meth)acrylic polymer can be adjusted to the above range by appropriately changing the monomer component or composition ratio used.

上述(甲基)丙烯酸系聚合物之聚合方法並無特別限制,可藉由溶液聚合、乳化聚合、塊狀聚合、懸浮聚合等公知之方法進行聚合,尤其就作業性之觀點、或對被黏著體(被保護體)之低污染性等特性方面而言,溶液聚合為更佳之態樣。又,所獲得之聚合物可為無規共聚物、嵌段共聚物、交替共聚物、接枝共聚物等中之任一種。 The polymerization method of the (meth)acrylic polymer is not particularly limited, and polymerization can be carried out by a known method such as solution polymerization, emulsion polymerization, bulk polymerization or suspension polymerization, in particular, from the viewpoint of workability or adhesion. Solution polymerization is a better aspect in terms of characteristics such as low contamination of the body (protected body). Further, the obtained polymer may be any of a random copolymer, a block copolymer, an alternating copolymer, a graft copolymer and the like.

於上述黏著劑層使用胺基甲酸酯系黏著劑之情形時,作為胺基甲酸酯系黏著劑,可採用任意之適宜之胺基甲酸酯系黏著劑。作為此種胺基甲酸酯系黏著劑,較佳為可列舉含有使多元醇與聚異氰酸酯化合物反應而獲得之胺基甲酸酯樹脂者。作為多元醇,例如,可列舉聚醚多元醇、聚酯多元醇、聚碳酸酯多元醇、聚己內酯多元醇等。作為聚異氰酸酯化合物,例如,可列舉二苯基甲烷二異氰酸酯、甲苯二異氰酸酯、六亞甲基二異氰酸酯等。 When a urethane-based pressure-sensitive adhesive is used as the pressure-sensitive adhesive layer, any suitable urethane-based pressure-sensitive adhesive can be used as the urethane-based pressure-sensitive adhesive. As such a urethane-based pressure-sensitive adhesive, those containing a urethane resin obtained by reacting a polyol with a polyisocyanate compound are preferably used. Examples of the polyhydric alcohol include a polyether polyol, a polyester polyol, a polycarbonate polyol, and a polycaprolactone polyol. Examples of the polyisocyanate compound include diphenylmethane diisocyanate, toluene diisocyanate, and hexamethylene diisocyanate.

於上述黏著劑層使用聚矽氧系黏著劑之情形時,作為聚矽氧系黏著劑,可採用任意之適宜之聚矽氧系黏著劑。作為此種聚矽氧系黏著劑,較佳為可採用藉由使聚矽氧樹脂混合或凝聚而獲得者。 When a polyfluorene-based adhesive is used for the above-mentioned adhesive layer, any suitable polyoxygen-based adhesive can be used as the polyoxygen-based adhesive. As such a polyoxynitride-based adhesive, those obtained by mixing or agglomerating a polyoxyxylene resin can be preferably used.

又,作為上述聚矽氧系黏著劑,可列舉加成反應硬化型聚矽氧系黏著劑或過氧化物硬化型聚矽氧系黏著劑。於該等聚矽氧系黏著劑 中,就不使用過氧化物(過氧化苯甲醯等),不產生分解物之方面而言,較佳為加成反應硬化型聚矽氧系黏著劑。 In addition, examples of the polyoxygenated adhesive include an addition reaction-curable polyoxynoxy adhesive or a peroxide-curable polyoxynoxy adhesive. In these polyoxygenated adhesives Among them, a peroxide (benzaldehyde peroxide, etc.) is not used, and an addition reaction hardening type polyoxynoxy adhesive is preferable from the viewpoint of not producing a decomposition product.

作為上述加成反應硬化型聚矽氧系黏著劑之硬化反應,例如於獲得聚烷基聚矽氧系黏著劑之情形時,通常可列舉藉由鉑觸媒使聚烷基氫矽氧烷組合物硬化之方法。 In the case of obtaining a polyalkyl polyoxynitride-based adhesive as a curing reaction of the addition reaction-curable polyoxynoxy adhesive, for example, a polyalkylhydroquinone is usually combined by a platinum catalyst. The method of hardening the object.

<黏著劑層中之防靜電成分> <Antistatic component in the adhesive layer>

本發明之表面保護膜較佳為構成上述黏著劑層之黏著劑組合物含有防靜電成分,更佳為含有離子性化合物作為上述防靜電成分。作為上述離子性化合物,可列舉鹼金屬鹽、及/或離子液體。藉由含有該等離子性化合物,可賦予優異之防靜電性。再者,如上述般將含有防靜電成分之黏著劑組合物交聯而成之黏著劑層(使用防靜電成分)於剝離時實現對未經防靜電之被黏著體(例如,偏光板)之防靜電,成為對被黏著體之污染得以降低之表面保護膜。因此,作為靜電或污染成為尤其深刻之問題之光學、電子零件相關之技術領域中之防靜電性表面保護膜非常有用。 In the surface protection film of the present invention, it is preferable that the adhesive composition constituting the pressure-sensitive adhesive layer contains an antistatic component, and more preferably contains an ionic compound as the antistatic component. Examples of the ionic compound include an alkali metal salt and/or an ionic liquid. By containing the ionic compound, excellent antistatic properties can be imparted. Further, as described above, the adhesive layer (using an antistatic component) obtained by crosslinking an adhesive composition containing an antistatic component is used to achieve an antistatic coating (for example, a polarizing plate) at the time of peeling. Anti-static, it becomes a surface protective film that reduces the contamination of the adherend. Therefore, it is very useful as an antistatic surface protective film in the technical field related to optical and electronic parts, which is a problem that is particularly problematic in terms of static electricity or contamination.

上述鹼金屬鹽由於離子解離性較高,因此就即便以微量之添加量亦表現出優異之防靜電能力之方面而言較佳。作為上述鹼金屬鹽,例如可適宜地使用含有包含Li+、Na+、K+之陽離子與包含Cl-、Br-、I-、AlCl4 -、Al2Cl7 -、BF4 -、PF6 -、SCN-、ClO4 -、NO3 -、CH3COO-、C9H19COO-、CF3COO-、C3F7COO-、CH3SO3 -、CF3SO3 -、C4F9SO3 -、C2H5OSO3 -、C6H13OSO3 -、C8H17OSO3 -、(CF3SO2)2N-、(C2F5SO2)2N-、(C3F7SO2)2N-、(C4F9SO2)2N-、(CF3SO2)3C-、AsF6 -、SbF6 -、NbF6 -、TaF6 -、HF2 -、(CN)2N-、(CF3SO2)(CF3CO)N-、(CH3)2PO4 -、(C2H5)2PO4 -、CH3(OC2H4)2OSO3 -、C6H4(CH3)SO3 -、(C2F5)3PF3 -、CH3CH(OH)COO-及(FSO2)2N-之陰離子之金屬鹽。更佳為使用LiBr、LiI、LiBF4、LiPF6、LiSCN、LiClO4、LiCF3SO3、Li(CF3SO2)2N、 Li(C2F5SO2)2N、Li(FSO2)2N、Li(CF3SO2)3C等鋰鹽,進而較佳為使用LiCF3SO3、Li(CF3SO2)2N、Li(C2F5SO2)2N、Li(C3F7SO2)2N、Li(C4F9SO2)2N、Li(FSO2)2N、Li(CF3SO2)3C。該等鹼金屬鹽可單獨使用,亦可混合兩種以上而使用。 Since the above-mentioned alkali metal salt has high ion dissociation property, it is preferable in terms of an excellent antistatic property even in a small amount of addition. As the above alkali metal salt, for example, a cation containing Li + , Na + , K + and containing Cl - , Br - , I - , AlCl 4 - , Al 2 Cl 7 - , BF 4 - , PF 6 can be suitably used. - , SCN - , ClO 4 - , NO 3 - , CH 3 COO - , C 9 H 19 COO - , CF 3 COO - , C 3 F 7 COO - , CH 3 SO 3 - , CF 3 SO 3 - , C 4 F 9 SO 3 - , C 2 H 5 OSO 3 - , C 6 H 13 OSO 3 - , C 8 H 17 OSO 3 - , (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - , (C 4 F 9 SO 2 ) 2 N - , (CF 3 SO 2 ) 3 C - , AsF 6 - , SbF 6 - , NbF 6 - , TaF 6 - , HF 2 - , (CN) 2 N - , (CF 3 SO 2 )(CF 3 CO)N - , (CH 3 ) 2 PO 4 - , (C 2 H 5 ) 2 PO 4 - , CH 3 (OC 2 H 4) 2 OSO 3 -, C 6 H 4 (CH 3) SO 3 -, (C 2 F 5) 3 PF 3 -, CH 3 CH (OH) COO - and (FSO 2) 2 N - The metal salt of the anion. More preferably, LiBr, LiI, LiBF 4 , LiPF 6 , LiSCN, LiClO 4 , LiCF 3 SO 3 , Li(CF 3 SO 2 ) 2 N, Li(C 2 F 5 SO 2 ) 2 N, Li (FSO 2 ) a lithium salt such as 2 N or Li(CF 3 SO 2 ) 3 C, more preferably LiCF 3 SO 3 , Li(CF 3 SO 2 ) 2 N, Li(C 2 F 5 SO 2 ) 2 N, Li (C 3 F 7 SO 2 ) 2 N, Li(C 4 F 9 SO 2 ) 2 N, Li(FSO 2 ) 2 N, Li(CF 3 SO 2 ) 3 C. These alkali metal salts may be used singly or in combination of two or more.

又,藉由使用上述離子液體作為防靜電成分(防靜電劑),可於無損黏著特性之情況下獲得防靜電效果較高之黏著劑層。藉由使用離子液體可獲得優異之防靜電特性之詳細原因尚不明確,認為如下:離子液體與通常之離子性化合物相比為低熔點(熔點100℃以下),因此分子運動較容易,可獲得優異之防靜電能力。尤其認為於謀求對被黏著體之防靜電時,離子液體極微量地轉印至被黏著體上,藉此會實現被黏著體上之優異之防剝離靜電性。尤其是熔點為室溫(25℃)以下之離子液體可更有效率地進行向被黏著體之轉印,因此可獲得優異之防靜電性。 Further, by using the above ionic liquid as an antistatic component (antistatic agent), an adhesive layer having a high antistatic effect can be obtained without damaging the adhesive properties. The detailed reason for obtaining excellent antistatic properties by using an ionic liquid is not clear, and it is considered that the ionic liquid has a low melting point (melting point of 100 ° C or less) as compared with a usual ionic compound, so molecular motion is easy to obtain. Excellent anti-static ability. In particular, it is considered that when the antistatic property against the adherend is sought, the ionic liquid is extremely transferred to the adherend, whereby excellent anti-peeling electrostatic properties on the adherend are achieved. In particular, an ionic liquid having a melting point of room temperature (25 ° C) or less can be more efficiently transferred to an adherend, and thus excellent antistatic properties can be obtained.

又,由於上述離子液體於100℃以下之任一溫度下為液狀,因此與固體之鹽相比,容易進行向黏著劑中之添加及分散或溶解。進而,由於離子液體無蒸氣壓(不揮發性),因此具有不會經時消失,可持續獲得防靜電特性之特徵。再者,所謂離子液體係指熔點為100℃以下且呈現液狀之熔融鹽(離子性化合物)。 Further, since the ionic liquid is liquid at any temperature of 100 ° C or lower, it is easier to add, disperse or dissolve into the adhesive than the solid salt. Further, since the ionic liquid has no vapor pressure (non-volatile), it has a feature that it does not disappear with time and can stably obtain antistatic properties. In addition, the ionic liquid system means a molten salt (ionic compound) having a melting point of 100 ° C or less and exhibiting a liquid state.

作為上述離子液體,較佳為使用包含下述通式(A)~(E)所表示之有機陽離子成分與陰離子成分者。利用具有該等陽離子之離子液體,可獲得防靜電能力進一步優異者。 As the ionic liquid, those containing an organic cation component and an anion component represented by the following general formulae (A) to (E) are preferably used. By using the ionic liquid having such cations, it is possible to obtain further excellent antistatic ability.

[化1] [Chemical 1]

上述式(A)中之Ra表示碳數4至20之烴基,亦可為上述烴基之一部分經雜原子取代之官能基,Rb及Rc相同或不同,表示氫或碳數1至16之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。其中,於氮原子含有雙鍵之情形時不存在RcR a in the above formula (A) represents a hydrocarbon group having 4 to 20 carbon atoms, and may be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom, and R b and R c are the same or different and represent hydrogen or a carbon number of 1 to 16. The hydrocarbon group may also be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom. Wherein, in the case where the nitrogen atom contains a double bond, R c does not exist.

上述式(B)中之Rd表示碳數2至20之烴基,亦可為上述烴基之一部分經雜原子取代之官能基,Re、Rf、及Rg相同或不同,表示氫或碳數1至16之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。 R d in the above formula (B) represents a hydrocarbon group having 2 to 20 carbon atoms, and may be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom, and R e , R f and R g are the same or different and represent hydrogen or carbon. The hydrocarbon group of 1 to 16 may also be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom.

上述式(C)中之Rh表示碳數2至20之烴基,亦可為上述烴基之一部分經雜原子取代之官能基,Ri、Rj、及Rk相同或不同,表示氫或碳數1至16之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。 R h in the above formula (C) represents a hydrocarbon group having 2 to 20 carbon atoms, and may be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom, and R i , R j and R k are the same or different and represent hydrogen or carbon. The hydrocarbon group of 1 to 16 may also be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom.

上述式(D)中之Z表示氮、硫、或磷原子,Rl、Rm、Rn、及Ro相同或不同,表示碳數1至20之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。其中於Z為硫原子之情形時不存在RoZ in the above formula (D) represents a nitrogen, sulfur, or phosphorus atom, and R l , R m , R n , and R o are the same or different and each represents a hydrocarbon group having 1 to 20 carbon atoms, and may be a part of the above hydrocarbon group. A functional group substituted with a hetero atom. Wherein in the case where Z is a sulfur atom, there is no R o .

上述式(E)中之RP表示碳數1至18之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。 R P in the above formula (E) represents a hydrocarbon group having 1 to 18 carbon atoms, and may be a functional group in which a part of the above hydrocarbon group is substituted with a hetero atom.

作為式(A)所表示之陽離子,例如可列舉:吡啶鎓陽離子、哌啶鎓陽離子、吡咯啶鎓陽離子、具有吡咯啉骨架之陽離子、具有吡咯骨架之陽離子、啉鎓陽離子等。 Examples of the cation represented by the formula (A) include a pyridinium cation, a piperidinium cation, a pyrrolidinium cation, a cation having a pyrroline skeleton, a cation having a pyrrole skeleton, and the like. A porphyrin cation or the like.

作為具體例,例如可列舉:1-乙基吡啶鎓陽離子、1-丁基吡啶鎓陽離子、1-己基吡啶鎓陽離子、1-丁基-3-甲基吡啶鎓陽離子、1-丁基-4-甲基吡啶鎓陽離子、1-己基-3-甲基吡啶鎓陽離子、1-丁基-3,4-二甲 基吡啶鎓陽離子、1,1-二甲基吡咯啶鎓陽離子、1-乙基-1-甲基吡咯啶鎓陽離子、1-甲基-1-丙基吡咯啶鎓陽離子、1-甲基-1-丁基吡咯啶鎓陽離子、1-甲基-1-戊基吡咯啶鎓陽離子、1-甲基-1-己基吡咯啶鎓陽離子、1-甲基-1-庚基吡咯啶鎓陽離子、1-乙基-1-丙基吡咯啶鎓陽離子、1-乙基-1-丁基吡咯啶鎓陽離子、1-乙基-1-戊基吡咯啶鎓陽離子、1-乙基-1-己基吡咯啶鎓陽離子、1-乙基-1-庚基吡咯啶鎓陽離子、1,1-二丙基吡咯啶鎓陽離子、1-丙基-1-丁基吡咯啶鎓陽離子、1,1-二丁基吡咯啶鎓陽離子、吡咯啶鎓-2-酮陽離子、1-丙基哌啶鎓陽離子、1-戊基哌啶鎓陽離子、1,1-二甲基哌啶鎓陽離子、1-甲基-1-乙基哌啶鎓陽離子、1-甲基-1-丙基哌啶鎓陽離子、1-甲基-1-丁基哌啶鎓陽離子、1-甲基-1-戊基哌啶鎓陽離子、1-甲基-1-己基哌啶鎓陽離子、1-甲基-1-庚基哌啶鎓陽離子、1-乙基-1-丙基哌啶鎓陽離子、1-乙基-1-丁基哌啶鎓陽離子、1-乙基-1-戊基哌啶鎓陽離子、1-乙基-1-己基哌啶鎓陽離子、1-乙基-1-庚基哌啶鎓陽離子、1,1-二丙基哌啶鎓陽離子、1-丙基-1-丁基哌啶鎓陽離子、1,1-二丁基哌啶鎓陽離子、2-甲基-1-吡咯啉陽離子、1-乙基-2-苯基吲哚陽離子、1,2-二甲基吲哚陽離子、1-乙基咔唑陽離子、N-乙基-N-甲基啉鎓陽離子等。 Specific examples thereof include 1-ethylpyridinium cation, 1-butylpyridinium cation, 1-hexylpyridinium cation, 1-butyl-3-methylpyridinium cation, and 1-butyl-4. -methylpyridinium cation, 1-hexyl-3-methylpyridinium cation, 1-butyl-3,4-dimethylpyridinium cation, 1,1-dimethylpyrrolidinium cation, 1-B 1-methylpyrrolidinium cation, 1-methyl-1-propylpyrrolidinium cation, 1-methyl-1-butylpyrrolidinium cation, 1-methyl-1-pentylpyrrolidine Ruthenium cation, 1-methyl-1-hexylpyrrolidinium cation, 1-methyl-1-heptylpyrrolidinium cation, 1-ethyl-1-propylpyrrolidinium cation, 1-ethyl-1 - butyl pyrrolidine cation, 1-ethyl-1-pentyl pyrrolidine cation, 1-ethyl-1-hexyl pyrrolidine cation, 1-ethyl-1-heptylpyrrolidinium cation, 1 , 1-dipropylpyrrolidinium cation, 1-propyl-1-butylpyrrolidinium cation, 1,1-dibutylpyrrolidinium cation, pyrrolidin-2-one cation, 1-propyl Piperidinium cation, 1-pentylpiperidinium cation, 1,1-dimethylpiperidinium cation , 1-methyl-1-ethylpiperidinium cation, 1-methyl-1-propylpiperidinium cation, 1-methyl-1-butylpiperidinium cation, 1-methyl-1- Pentamylpyridinium cation, 1-methyl-1-hexylpiperidinium cation, 1-methyl-1-heptylpiperidinium cation, 1-ethyl-1-propylpiperidinium cation, 1- Ethyl-1-butylpiperidinium cation, 1-ethyl-1-pentylpiperidinium cation, 1-ethyl-1-hexylpiperidinium cation, 1-ethyl-1-heptylpiperidine Ruthenium cation, 1,1-dipropyl piperidinium cation, 1-propyl-1-butylpiperidinium cation, 1,1-dibutylpiperidinium cation, 2-methyl-1-pyrroline Cation, 1-ethyl-2-phenylphosphonium cation, 1,2-dimethylhydrazine cation, 1-ethylcarbazole cation, N-ethyl-N-methyl A porphyrin cation or the like.

作為式(B)所表示之陽離子,例如可列舉:咪唑鎓陽離子、四氫嘧啶鎓陽離子、二氫嘧啶鎓陽離子等。 Examples of the cation represented by the formula (B) include an imidazolium cation, a tetrahydropyrimidinium cation, and a dihydropyrimidinium cation.

作為具體例,例如可列舉:1,3-二甲基咪唑鎓陽離子、1,3-二乙基咪唑鎓陽離子、1-乙基-3-甲基咪唑鎓陽離子、1-丁基-3-甲基咪唑鎓陽離子、1-己基-3-甲基咪唑鎓陽離子、1-辛基-3-甲基咪唑鎓陽離子、1-癸基-3-甲基咪唑鎓陽離子、1-十二烷基-3-甲基咪唑鎓陽離子、1-十四烷基-3-甲基咪唑鎓陽離子、1,2-二甲基-3-丙基咪唑鎓陽離子、1-乙基-2,3-二甲基咪唑鎓陽離子、1-丁基-2,3-二甲基咪唑鎓陽離子、1-己基-2,3-二甲基咪唑鎓陽離子、1-(2-甲氧基乙基)-3-甲基咪唑 鎓陽離子、1,3-二甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3-三甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,5-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,3-二甲基-1,4-二氫嘧啶鎓陽離子、1,3-二甲基-1,6-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,4-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,6-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,6-二氫嘧啶鎓陽離子等。 Specific examples include, for example, 1,3-dimethylimidazolium cation, 1,3-diethylimidazolium cation, 1-ethyl-3-methylimidazolium cation, 1-butyl-3- Methylimidazolium cation, 1-hexyl-3-methylimidazolium cation, 1-octyl-3-methylimidazolium cation, 1-mercapto-3-methylimidazolium cation, 1-dodecyl 3-methylimidazolium cation, 1-tetradecyl-3-methylimidazolium cation, 1,2-dimethyl-3-propylimidazolium cation, 1-ethyl-2,3-di Methylimidazolium cation, 1-butyl-2,3-dimethylimidazolium cation, 1-hexyl-2,3-dimethylimidazolium cation, 1-(2-methoxyethyl)-3 -methylimidazole Ruthenium cation, 1,3-dimethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3-trimethyl-1,4,5,6-tetrahydropyrimidinium cation, 1 , 2,3,4-tetramethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3,5-tetramethyl-1,4,5,6-tetrahydropyrimidinium cation , 1,3-dimethyl-1,4-dihydropyrimidinium cation, 1,3-dimethyl-1,6-dihydropyrimidinium cation, 1,2,3-trimethyl-1,4 - dihydropyrimidinium cation, 1,2,3-trimethyl-1,6-dihydropyrimidinium cation, 1,2,3,4-tetramethyl-1,4-dihydropyrimidinium cation, 1 , 2,3,4-tetramethyl-1,6-dihydropyrimidinium cation, and the like.

作為式(C)所表示之陽離子,例如可列舉:吡唑鎓陽離子、吡唑啉鎓陽離子等。 Examples of the cation represented by the formula (C) include a pyrazolium cation, a pyrazolinium cation, and the like.

作為具體例,例如可列舉:1-甲基吡唑鎓陽離子、3-甲基吡唑鎓陽離子、1-乙基-2-甲基吡唑啉鎓陽離子、1-乙基-2,3,5-三甲基吡唑鎓陽離子、1-丙基-2,3,5-三甲基吡唑鎓陽離子、1-丁基-2,3,5-三甲基吡唑鎓陽離子、1-乙基-2,3,5-三甲基吡唑啉鎓陽離子、1-丙基-2,3,5-三甲基吡唑啉鎓陽離子、1-丁基-2,3,5-三甲基吡唑啉鎓陽離子等。 Specific examples include 1-methylpyrazolium cation, 3-methylpyrazolium cation, 1-ethyl-2-methylpyrazolinium cation, and 1-ethyl-2,3. 5-trimethylpyrazolium cation, 1-propyl-2,3,5-trimethylpyrazolium cation, 1-butyl-2,3,5-trimethylpyrazolium cation, 1- Ethyl-2,3,5-trimethylpyrazolinium cation, 1-propyl-2,3,5-trimethylpyrazolinium cation, 1-butyl-2,3,5-three Methylpyrazolium cations and the like.

作為式(D)所表示之陽離子,例如可列舉:四烷基銨陽離子、三烷基鋶陽離子、四烷基鏻陽離子,或者上述烷基之一部分被取代為烯基或烷氧基、進而環氧基而成者等。 Examples of the cation represented by the formula (D) include a tetraalkylammonium cation, a trialkylsulfonium cation, a tetraalkylphosphonium cation, or a part of the above alkyl group is substituted with an alkenyl group or an alkoxy group, and further a ring. Oxygen is the same as that.

作為具體例,例如可列舉:四甲基銨陽離子、四乙基銨陽離子、四丁基銨陽離子、四戊基銨陽離子、四己基銨陽離子、四庚基銨陽離子、三乙基甲基銨陽離子、三丁基乙基銨陽離子、三甲基癸基銨陽離子、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨陽離子、縮水甘油基三甲基銨陽離子、三甲基鋶陽離子、三乙基鋶陽離子、三丁基鋶陽離子、三己基鋶陽離子、二乙基甲基鋶陽離子、二丁基乙基鋶陽離子、二甲基癸基鋶陽離子、四甲基鏻陽離子、四乙基鏻陽離子、四丁基鏻陽離子、四己基鏻陽離子、四辛基鏻陽離子、三乙基甲基鏻陽離子、三丁基乙基鏻陽離子、三甲基癸基鏻陽離子、二烯丙基二甲基銨 陽離子、三丁基-(2-甲氧基乙基)鏻陽離子等。其中,較佳為使用三乙基甲基銨陽離子、三丁基乙基銨陽離子、三甲基癸基銨陽離子、二乙基甲基鋶陽離子、二丁基乙基鋶陽離子、二甲基癸基鋶陽離子、三乙基甲基鏻陽離子、三丁基乙基鏻陽離子、三甲基癸基鏻陽離子等非對稱之四烷基銨陽離子、三烷基鋶陽離子、四烷基鏻陽離子,或N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨陽離子、縮水甘油基三甲基銨陽離子、二烯丙基二甲基銨陽離子、N,N-二甲基-N-乙基-N-丙基銨陽離子、N,N-二甲基-N-乙基-N-丁基銨陽離子、N,N-二甲基-N-乙基-N-戊基銨陽離子、N,N-二甲基-N-乙基-N-己基銨陽離子、N,N-二甲基-N-乙基-N-庚基銨陽離子、N,N-二甲基-N-乙基-N-壬基銨陽離子、N,N-二甲基-N,N-二丙基銨陽離子、N,N-二乙基-N-丙基-N-丁基銨陽離子、N,N-二甲基-N-丙基-N-戊基銨陽離子、N,N-二甲基-N-丙基-N-己基銨陽離子、N,N-二甲基-N-丙基-N-庚基銨陽離子、N,N-二甲基-N-丁基-N-己基銨陽離子、N,N-二乙基-N-丁基-N-庚基銨陽離子、N,N-二甲基-N-戊基-N-己基銨陽離子、N,N-二甲基-N,N-二己基銨陽離子、三甲基庚基銨陽離子、N,N-二乙基-N-甲基-N-丙基銨陽離子、N,N-二乙基-N-甲基-N-戊基銨陽離子、N,N-二乙基-N-甲基-N-庚基銨陽離子、N,N-二乙基-N-丙基-N-戊基銨陽離子、三乙基丙基銨陽離子、三乙基戊基銨陽離子、三乙基庚基銨陽離子、N,N-二丙基-N-甲基-N-乙基銨陽離子、N,N-二丙基-N-甲基-N-戊基銨陽離子、N,N-二丙基-N-丁基-N-己基銨陽離子、N,N-二丙基-N,N-二己基銨陽離子、N,N-二丁基-N-甲基-N-戊基銨陽離子、N,N-二丁基-N-甲基-N-己基銨陽離子、三辛基甲基銨陽離子、N-甲基-N-乙基-N-丙基-N-戊基銨陽離子。 Specific examples include tetramethylammonium cation, tetraethylammonium cation, tetrabutylammonium cation, tetraamylammonium cation, tetrahexylammonium cation, tetraheptyl ammonium cation, and triethylmethylammonium cation. , tributylethylammonium cation, trimethylsulfonium ammonium cation, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium cation, glycidyl trimethyl Ammonium cation, trimethyl phosphonium cation, triethyl phosphonium cation, tributyl phosphonium cation, trihexyl phosphonium cation, diethyl methyl phosphonium cation, dibutyl ethyl phosphonium cation, dimethyl fluorenyl cation, Tetramethyl phosphonium cation, tetraethyl phosphonium cation, tetrabutyl phosphonium cation, tetrahexyl phosphonium cation, tetraoctyl phosphonium cation, triethylmethyl phosphonium cation, tributyl ethyl phosphonium cation, trimethyl fluorenyl Ruthenium cation, diallyldimethylammonium A cation, a tributyl-(2-methoxyethyl)phosphonium cation or the like. Among them, it is preferred to use a triethylmethylammonium cation, a tributylethylammonium cation, a trimethylsulfonium ammonium cation, a diethylmethyl phosphonium cation, a dibutylethyl phosphonium cation, a dimethyl hydrazine. An asymmetric tetraalkylammonium cation such as a cation, a triethylmethyl phosphonium cation, a tributylethyl phosphonium cation, a trimethylsulfonium cation, a trialkyl phosphonium cation, a tetraalkyl phosphonium cation, or N,N-Diethyl-N-methyl-N-(2-methoxyethyl)ammonium cation, glycidyl trimethylammonium cation, diallyldimethylammonium cation, N,N- Dimethyl-N-ethyl-N-propylammonium cation, N,N-dimethyl-N-ethyl-N-butylammonium cation, N,N-dimethyl-N-ethyl-N - amyl ammonium cation, N,N-dimethyl-N-ethyl-N-hexylammonium cation, N,N-dimethyl-N-ethyl-N-heptyl ammonium cation, N,N-di Methyl-N-ethyl-N-decyl ammonium cation, N,N-dimethyl-N,N-dipropylammonium cation, N,N-diethyl-N-propyl-N-butyl Ammonium cation, N,N-dimethyl-N-propyl-N-amyl ammonium cation, N,N-dimethyl-N-propyl-N-hexylammonium cation, N,N-dimethyl- N-propyl-N-g Ammonium cation, N,N-dimethyl-N-butyl-N-hexylammonium cation, N,N-diethyl-N-butyl-N-heptyl ammonium cation, N,N-dimethyl- N-pentyl-N-hexylammonium cation, N,N-dimethyl-N,N-dihexyl ammonium cation, trimethylheptyl ammonium cation, N,N-diethyl-N-methyl-N -propylammonium cation, N,N-diethyl-N-methyl-N-amylammonium cation, N,N-diethyl-N-methyl-N-heptyl ammonium cation, N,N- Diethyl-N-propyl-N-pentylammonium cation, triethylpropylammonium cation, triethylammonium ammonium cation, triethylheptyl ammonium cation, N,N-dipropyl-N- Methyl-N-ethylammonium cation, N,N-dipropyl-N-methyl-N-amylammonium cation, N,N-dipropyl-N-butyl-N-hexylammonium cation, N , N-dipropyl-N,N-dihexyl ammonium cation, N,N-dibutyl-N-methyl-N-amyl ammonium cation, N,N-dibutyl-N-methyl-N a hexyl ammonium cation, a trioctylmethyl ammonium cation, an N-methyl-N-ethyl-N-propyl-N-amyl ammonium cation.

作為式(E)所表示之陽離子,例如可列舉鋶陽離子等。又,作為上述式(E)中之RP之具體例,可列舉甲基、乙基、丙基、丁基、己 基、辛基、壬基、癸基、十二烷基、十三烷基、十四烷基、十八烷基等。 Examples of the cation represented by the formula (E) include a phosphonium cation and the like. Further, specific examples of R P in the above formula (E) include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a decyl group, a dodecyl group, and a tridecyl group. , tetradecyl, octadecyl and the like.

另一方面,作為陰離子成分,只要為滿足成為離子液體者,則無特別限定,例如可使用:Cl-、Br-、I-、AlCl4 -、Al2Cl7 -、BF4 -、PF6 -、ClO4 -、NO3 -、CH3COO-、CF3COO-、CH3SO3 -、CF3SO3 -、C4F9SO3 -、(CF3SO2)2N-、(C2F5SO2)2N-、(C3F7SO2)2N-、(C4F9SO2)2N-、(CF3SO2)3C-、AsF6 -、SbF6 -、NbF6 -、TaF6 -、HF2 -、(CN)2N-、C4F9SO3 -、(C2F5SO2)2N-、C3F7COO-、(CF3SO2)(CF3CO)N-、C9H19COO-、(CH3)2PO4 -、(C2H5)2PO4 -、C2H5OSO3 -、C6H13OSO3 -、C8H17OSO3 -、CH3(OC2H4)2OSO3 -、C6H4(CH3)SO3 -、(C2F5)3PF3 -、CH3CH(OH)COO-及(FSO2)2N-等。 On the other hand, the anion component is not particularly limited as long as it satisfies the ionic liquid, and for example, Cl - , Br - , I - , AlCl 4 - , Al 2 Cl 7 - , BF 4 - , PF 6 can be used. - , ClO 4 - , NO 3 - , CH 3 COO - , CF 3 COO - , CH 3 SO 3 - , CF 3 SO 3 - , C 4 F 9 SO 3 - , (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - , (C 4 F 9 SO 2 ) 2 N - , (CF 3 SO 2 ) 3 C - , AsF 6 - , SbF 6 - , NbF 6 - , TaF 6 - , HF 2 - , (CN) 2 N - , C 4 F 9 SO 3 - , (C 2 F 5 SO 2 ) 2 N - , C 3 F 7 COO - , (CF 3 SO 2 )(CF 3 CO)N - , C 9 H 19 COO - , (CH 3 ) 2 PO 4 - , (C 2 H 5 ) 2 PO 4 - , C 2 H 5 OSO 3 - , C 6 H 13 OSO 3 - , C 8 H 17 OSO 3 - , CH 3 (OC 2 H 4 ) 2 OSO 3 - , C 6 H 4 (CH 3 )SO 3 - , (C 2 F 5 ) 3 PF 3 - , CH 3 CH(OH)COO - and (FSO 2 ) 2 N - and the like.

又,作為陰離子成分,亦可使用下述式(F)所表示之陰離子等。 Further, as the anion component, an anion or the like represented by the following formula (F) can also be used.

又,作為陰離子成分,其中,尤其就獲得低熔點之離子液體之方面而言,較佳為使用含氟原子之陰離子成分。 Further, as the anion component, in particular, in terms of obtaining an ionic liquid having a low melting point, it is preferred to use an anion component of a fluorine atom.

作為本發明所使用之離子液體之具體例,可自上述陽離子成分與陰離子成分之組合中適當選擇使用,例如可列舉:1-丁基吡啶鎓四氟硼酸鹽、1-丁基吡啶鎓六氟磷酸鹽、1-丁基-3-甲基吡啶鎓四氟硼酸鹽、1-丁基-3-甲基吡啶鎓三氟甲磺酸鹽、1-丁基-3-甲基吡啶鎓雙(三氟甲磺醯)亞胺、1-丁基-3-甲基吡啶鎓雙(五氟乙磺醯)亞胺、1-己基吡啶鎓四氟硼酸鹽、1,1-二甲基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基- 1-乙基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-丙基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-丁基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-戊基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-己基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-庚基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-丙基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-丁基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-戊基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-己基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-庚基吡咯啶鎓雙(三氟甲磺醯)亞胺、1,1-二丙基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-丙基-1-丁基吡咯啶鎓雙(三氟甲磺醯)亞胺、1,1-二丁基吡咯啶鎓雙(三氟甲磺醯)亞胺、1-丙基哌啶鎓雙(三氟甲磺醯)亞胺、1-戊基哌啶鎓雙(三氟甲磺醯)亞胺、1,1-二甲基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-乙基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-丙基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-丁基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-戊基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-己基哌啶鎓雙(三氟甲磺醯)亞胺、1-甲基-1-庚基哌啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-丙基哌啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-丁基哌啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-戊基哌啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-己基哌啶鎓雙(三氟甲磺醯)亞胺、1-乙基-1-庚基哌啶鎓雙(三氟甲磺醯)亞胺、1,1-二丙基哌啶鎓雙(三氟甲磺醯)亞胺、1-丙基-1-丁基哌啶鎓雙(三氟甲磺醯)亞胺、1,1-二丁基哌啶鎓雙(三氟甲磺醯)亞胺、1,1-二甲基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-乙基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-丙基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-丁基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-戊基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-己基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-庚基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-丙基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-丁基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-戊基吡咯啶鎓雙(五氟 乙磺醯)亞胺、1-乙基-1-己基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-庚基吡咯啶鎓雙(五氟乙磺醯)亞胺、1,1-二丙基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-丙基-1-丁基吡咯啶鎓雙(五氟乙磺醯)亞胺、1,1-二丁基吡咯啶鎓雙(五氟乙磺醯)亞胺、1-丙基哌啶鎓雙(五氟乙磺醯)亞胺、1-戊基哌啶鎓雙(五氟乙磺醯)亞胺、1,1-二甲基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-乙基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-丙基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-丁基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-戊基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-己基哌啶鎓雙(五氟乙磺醯)亞胺、1-甲基-1-庚基哌啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-丙基哌啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-丁基哌啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-戊基哌啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-己基哌啶鎓雙(五氟乙磺醯)亞胺、1-乙基-1-庚基哌啶鎓雙(五氟乙磺醯)亞胺、1,1-二丙基哌啶鎓雙(五氟乙磺醯)亞胺、1-丙基-1-丁基哌啶鎓雙(五氟乙磺醯)亞胺、1,1-二丁基哌啶鎓雙(五氟乙磺醯)亞胺、2-甲基-1-吡咯啉四氟硼酸鹽、1-乙基-2-苯基吲哚四氟硼酸鹽、1,2-二甲基吲哚四氟硼酸鹽、1-乙基咔唑四氟硼酸鹽、1-乙基-3-甲基咪唑鎓四氟硼酸鹽、1-乙基-3-甲基咪唑鎓乙酸鹽、1-乙基-3-甲基咪唑鎓三氟乙酸鹽、1-乙基-3-甲基咪唑鎓七氟丁酸鹽、1-乙基-3-甲基咪唑鎓三氟甲磺酸鹽、1-乙基-3-甲基咪唑鎓全氟丁磺酸鹽、1-乙基-3-甲基咪唑鎓二氰胺鹽、1-乙基-3-甲基咪唑鎓雙(三氟甲磺醯)亞胺、1-乙基-3-甲基咪唑鎓雙(五氟乙磺醯)亞胺、1-乙基-3-甲基咪唑鎓三(三氟甲磺醯基)甲基化物、1-丁基-3-甲基咪唑鎓四氟硼酸鹽、1-丁基-3-甲基咪唑鎓六氟磷酸鹽、1-丁基-3-甲基咪唑鎓三氟乙酸鹽、1-丁基-3-甲基咪唑鎓七氟丁酸鹽、1-丁基-3-甲基咪唑鎓三氟甲磺酸鹽、1-丁基-3-甲基咪唑鎓全氟丁磺酸鹽、1-丁基-3-甲基咪唑鎓雙(三氟甲磺醯)亞胺、1-己基-3-甲基咪唑鎓溴化物、1-己基-3-甲基咪唑鎓氯化物、1-己基- 3-甲基咪唑鎓四氟硼酸鹽、1-己基-3-甲基咪唑鎓六氟磷酸鹽、1-己基-3-甲基咪唑鎓三氟甲磺酸鹽、1-辛基-3-甲基咪唑鎓四氟硼酸鹽、1-辛基-3-甲基咪唑鎓六氟磷酸鹽、1-己基-2,3-二甲基咪唑鎓四氟硼酸鹽、1,2-二甲基-3-丙基咪唑鎓雙(三氟甲磺醯)亞胺、1-甲基吡唑鎓四氟硼酸鹽、2-甲基吡唑鎓四氟硼酸鹽、1-乙基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯)亞胺、1-丙基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯)亞胺、1-丁基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯)亞胺、1-乙基-2,3,5-三甲基吡唑鎓雙(五氟乙磺醯)亞胺、1-丙基-2,3,5-三甲基吡唑鎓雙(五氟乙磺醯)亞胺、1-丁基-2,3,5-三甲基吡唑鎓雙(五氟乙磺醯)亞胺、1-乙基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯基)三氟乙醯胺、1-丙基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯基)三氟乙醯胺、1-丁基-2,3,5-三甲基吡唑鎓雙(三氟甲磺醯基)三氟乙醯胺、1-乙基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯)亞胺、1-丙基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯)亞胺、1-丁基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯)亞胺、1-乙基-2,3,5-三甲基吡唑啉鎓雙(五氟乙磺醯)亞胺、1-丙基-2,3,5-三甲基吡唑啉鎓雙(五氟乙磺醯)亞胺、1-丁基-2,3,5-三甲基吡唑啉鎓雙(五氟乙磺醯)亞胺、1-乙基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯基)三氟乙醯胺、1-丙基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯基)三氟乙醯胺、1-丁基-2,3,5-三甲基吡唑啉鎓雙(三氟甲磺醯基)三氟乙醯胺、三氟甲磺酸四戊基銨、四戊基銨雙(三氟甲磺醯)亞胺、三氟甲磺酸四己基銨、四己基銨雙(三氟甲磺醯)亞胺、三氟甲磺酸四庚基銨、四庚基銨雙(三氟甲磺醯)亞胺、四氟硼酸二烯丙基二甲基銨、三氟甲磺酸二烯丙基二甲基銨、二烯丙基二甲基銨雙(三氟甲磺醯)亞胺、二烯丙基二甲基銨雙(五氟乙磺醯)亞胺、四氟硼酸N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨、三氟甲磺酸N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨雙(三氟甲磺醯)亞胺、N,N-二乙基-N-甲基-N-(2- 甲氧基乙基)銨雙(五氟乙磺醯)亞胺、三氟甲磺酸縮水甘油基三甲基銨、縮水甘油基三甲基銨雙(三氟甲磺醯)亞胺、縮水甘油基三甲基銨雙(五氟乙磺醯)亞胺、四辛基鏻三氟甲磺酸鹽、四辛基鏻雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-丙基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-丁基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-戊基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-己基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-庚基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-乙基-N-壬基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N,N-二丙基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丙基-N-丁基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丙基-N-戊基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丙基-N-己基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丙基-N-庚基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丁基-N-己基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-丁基-N-庚基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N-戊基-N-己基銨雙(三氟甲磺醯)亞胺、N,N-二甲基-N,N-二己基銨雙(三氟甲磺醯)亞胺、三甲基庚基銨雙(三氟甲磺醯)亞胺、N,N-二乙基-N-甲基-N-丙基銨雙(三氟甲磺醯)亞胺、N,N-二乙基-N-甲基-N-戊基銨雙(三氟甲磺醯)亞胺、N,N-二乙基-N-甲基-N-庚基銨雙(三氟甲磺醯)亞胺、N,N-二乙基-N-丙基-N-戊基銨雙(三氟甲磺醯)亞胺、三乙基丙基銨雙(三氟甲磺醯)亞胺、三乙基戊基銨雙(三氟甲磺醯)亞胺、三乙基庚基銨雙(三氟甲磺醯)亞胺、N,N-二丙基-N-甲基-N-乙基銨雙(三氟甲磺醯)亞胺、N,N-二丙基-N-甲基-N-戊基銨雙(三氟甲磺醯)亞胺、N,N-二丙基-N-丁基-N-己基銨雙(三氟甲磺醯)亞胺、N,N-二丙基-N,N-二己基銨雙(三氟甲磺醯)亞胺、N,N-二丁基-N-甲基-N-戊基銨雙(三氟甲磺醯)亞胺、N,N-二丁基-N-甲基-N-己基銨雙(三氟甲磺醯)亞胺、三辛基甲基銨雙(三氟甲磺醯)亞胺、N-甲基-N-乙基-N-丙基-N-戊基銨雙(三氟甲磺醯)亞胺、1-丁基吡啶鎓(三氟甲磺醯基)三氟乙 醯胺、1-丁基-3-甲基吡啶鎓(三氟甲磺醯基)三氟乙醯胺、1-乙基-3-甲基咪唑鎓(三氟甲磺醯基)三氟乙醯胺、N-乙基-N-甲基啉鎓硫氰酸鹽、4-乙基-4-甲基啉鎓碳酸甲酯鹽等。 Specific examples of the ionic liquid used in the present invention can be appropriately selected from the combination of the above cationic component and anionic component, and examples thereof include 1-butylpyridinium tetrafluoroborate and 1-butylpyridinium hexafluorophosphate. Phosphate, 1-butyl-3-methylpyridinium tetrafluoroborate, 1-butyl-3-methylpyridinium trifluoromethanesulfonate, 1-butyl-3-methylpyridinium bis ( Iridin, 1-butyl-3-methylpyridinium bis(pentafluoroethanesulfonyl)imide, 1-hexylpyridinium tetrafluoroborate, 1,1-dimethylpyrrolidine Bis(trifluoromethanesulfonate)imide, 1-methyl-1-ethylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-propylpyrrolidinium bis (three Fluorosulphonium)imine, 1-methyl-1-butylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-pentylpyrrolidinium bis(trifluoromethanesulfonate) Imine, 1-methyl-1-hexylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-heptylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1 -ethyl-1-propylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-ethyl-1-butylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-ethyl- 1-pentylpyrrole Bis(trifluoromethanesulfonate)imide, 1-ethyl-1-hexylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-ethyl-1-heptylpyrrolidinium bis(trifluoro Methanesulfonate)imine, 1,1-dipropylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-propyl-1-butylpyrrolidinium bis(trifluoromethanesulfonate)imide 1,1-dibutylpyrrolidinium bis(trifluoromethanesulfonate)imide, 1-propylpiperidinium bis(trifluoromethanesulfonate)imide, 1-pentylpiperidinium bis (three Fluoromethanesulfonate, imine, 1,1-dimethylpiperidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-ethylpiperidinium bis(trifluoromethanesulfonate) Amine, 1-methyl-1-propylpiperidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-butylpiperidinium bis(trifluoromethanesulfonate)imide, 1- Methyl-1-pentylpiperidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1-hexylpiperidinium bis(trifluoromethanesulfonate)imide, 1-methyl-1- Heptyl piperidinium bis(trifluoromethanesulfonate)imide, 1-ethyl-1-propylpiperidinium bis(trifluoromethanesulfonate)imide, 1-ethyl-1-butylpiperidine Bis(trifluoromethanesulfonate)imide, 1-ethyl-1-pentylpiperidinium bis(trifluoromethanesulfonate)imide, 1-ethyl-1-hexylpiperidinium bis(trifluoro Methotrexate Amine, 1-ethyl-1-heptylpiperidinium bis(trifluoromethanesulfonate)imide, 1,1-dipropylpiperidinium bis(trifluoromethanesulfonate)imide, 1-propyl 1-butylpiperidinium bis(trifluoromethanesulfonate)imide, 1,1-dibutylpiperidinium bis(trifluoromethanesulfonate)imide, 1,1-dimethylpyrrolidinium Bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-ethylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-propylpyrrolidinium bis(pentafluoro Ethylene sulfonate) imine, 1-methyl-1-butylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-pentylpyrrolidinium bis(pentafluoroethanesulfonate) Imine, 1-methyl-1-hexylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-heptylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1- Ethyl-1-propylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-butylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1 -Pentylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-hexylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-heptylpyrrolidine Bis(pentafluoroethanesulfonyl)imide, 1,1-dipropylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-propyl-1-butylpyrrolidinium bis ( Isoammine, 1,1-dibutylpyrrolidinium bis(pentafluoroethanesulfonyl)imide, 1-propylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-pentyl Isopiperidine bis(pentafluoroethanesulfonyl)imide, 1,1-dimethylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-ethylpiperidinium bis ( Pentafluoroethanesulfonate)imine, 1-methyl-1-propylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-butylpiperidinium bis(pentafluoroethanesulfonate醯) imine, 1-methyl-1-pentylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-hexylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-methyl-1-heptylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-propylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl 1-butylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-pentylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-hexyl Piperidine bis(pentafluoroethanesulfonyl)imide, 1-ethyl-1-heptylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1,1-dipropylpiperidinium bis (five Isoammine, 1-propyl-1-butylpiperidinium bis(pentafluoroethanesulfonyl)imide, 1,1-dibutylpiperidinium bis(pentafluoroethanesulfonate) Amine, 2-methyl-1-pyrrole Porphyrin tetrafluoroborate, 1-ethyl-2-phenylindole tetrafluoroborate, 1,2-dimethylindole tetrafluoroborate, 1-ethylcarbazole tetrafluoroborate, 1-B 3-methylimidazolium tetrafluoroborate, 1-ethyl-3-methylimidazolium acetate, 1-ethyl-3-methylimidazolium trifluoroacetate, 1-ethyl-3- Methylimidazolium heptafluorobutyrate, 1-ethyl-3-methylimidazolium trifluoromethanesulfonate, 1-ethyl-3-methylimidazolium perfluorobutanesulfonate, 1-ethyl 3-methylimidazolium dicyanamide salt, 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonate)imide, 1-ethyl-3-methylimidazolium bis(pentafluoroethyl) Sulfo]imine, 1-ethyl-3-methylimidazolium tris(trifluoromethanesulfonyl)methide, 1-butyl-3-methylimidazolium tetrafluoroborate, 1-butyl 3-methylimidazolium hexafluorophosphate, 1-butyl-3-methylimidazolium trifluoroacetate, 1-butyl-3-methylimidazolium heptafluorobutyrate, 1-butyl- 3-methylimidazolium trifluoromethanesulfonate, 1-butyl-3-methylimidazolium perfluorobutanesulfonate, 1-butyl-3-methylimidazolium bis(trifluoromethanesulfonate) Imine, 1-hexyl-3-methylimidazolium bromide, 1-hexyl-3-methylimidazolium , 1-hexyl-3-methylimidazolium tetrafluoroborate, 1-hexyl-3-methylimidazolium hexafluorophosphate, 1-hexyl-3-methylimidazolium trifluoromethanesulfonate, 1 -octyl-3-methylimidazolium tetrafluoroborate, 1-octyl-3-methylimidazolium hexafluorophosphate, 1-hexyl-2,3-dimethylimidazolium tetrafluoroborate, 1 ,2-dimethyl-3-propylimidazolium bis(trifluoromethanesulfonate)imide, 1-methylpyrazolium tetrafluoroborate, 2-methylpyrazolium tetrafluoroborate, 1- Ethyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonate)imide, 1-propyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonate) Imine, 1-butyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonate)imide, 1-ethyl-2,3,5-trimethylpyrazolium double (pentafluoroethanesulfonate) imine, 1-propyl-2,3,5-trimethylpyrazolium bis(pentafluoroethanesulfonyl)imide, 1-butyl-2,3,5-three Methylpyrazolium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1- Propyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1-butyl-2,3,5-trimethylpyrazolium bis (three Fluoromethanesulfonyl)trifluoroethane Amine, 1-ethyl-2,3,5-trimethylpyrazolinium bis(trifluoromethanesulfonate)imide, 1-propyl-2,3,5-trimethylpyrazoline (trifluoromethanesulfonate) imine, 1-butyl-2,3,5-trimethylpyrazolinium bis(trifluoromethanesulfonate)imide, 1-ethyl-2,3,5- Trimethylpyrazolinium bis(pentafluoroethanesulfonyl)imide, 1-propyl-2,3,5-trimethylpyrazolium bis(pentafluoroethanesulfonyl)imide, 1-butyl Base-2,3,5-trimethylpyrazolinium bis(pentafluoroethanesulfonyl)imide, 1-ethyl-2,3,5-trimethylpyrazoline bis(trifluoromethanesulfonate Mercapto) trifluoroacetamide, 1-propyl-2,3,5-trimethylpyrazolinium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1-butyl-2,3 , 5-trimethylpyrazolinium bis(trifluoromethanesulfonyl)trifluoroacetamide, tetraamylammonium triflate, tetraamylammonium bis(trifluoromethanesulfonate)imide, Tetrahexylammonium trifluoromethanesulfonate, tetrahexylammonium bis(trifluoromethanesulfonate)imide, tetraheptyl ammonium trifluoromethanesulfonate, tetraheptyl ammonium bis(trifluoromethanesulfonate)imide, tetrafluoro Diallyldimethylammonium borate, diallyldimethylammonium triflate, diallyldimethylammonium bis(trifluoromethanesulfonate)imide, diallyldimethyl Ammonium Bis(pentafluoroethanesulfonyl)imide, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium tetrafluoroborate, N,N-difluoromethanesulfonate Ethyl-N-methyl-N-(2-methoxyethyl)ammonium, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(trifluoro Methanesulfonate)imine, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(pentafluoroethanesulfonyl)imide, glycidyl trifluoromethanesulfonate Trimethylammonium, glycidyl trimethylammonium bis(trifluoromethanesulfonate)imide, glycidyl trimethylammonium bis(pentafluoroethanesulfonyl)imide, tetraoctylfluorene trifluoromethane Acid salt, tetraoctyl bis(trifluoromethanesulfonate) imine, N,N-dimethyl-N-ethyl-N-propylammonium bis(trifluoromethanesulfonate)imide, N,N - dimethyl-N-ethyl-N-butylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-ethyl-N-amylammonium bis(trifluoromethanesulfonate醯) imine, N,N-dimethyl-N-ethyl-N-hexyl ammonium bis(trifluoromethanesulfonate) imine, N,N-dimethyl-N-ethyl-N-heptyl Ammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-ethyl-N-methylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N , N-dipropylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-propyl- N-butylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-propyl-N-amylammonium bis(trifluoromethanesulfonate)imide, N,N-di Methyl-N-propyl-N-hexylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-propyl-N-heptyl ammonium bis(trifluoromethanesulfonate) Amine, N,N-dimethyl-N-butyl-N-hexyl ammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N-butyl-N-heptyl ammonium double ( Trifluoromethanesulfonate)imine, N,N-dimethyl-N-pentyl-N-hexylammonium bis(trifluoromethanesulfonate)imide, N,N-dimethyl-N,N-di Hexyl ammonium bis(trifluoromethanesulfonate)imide, trimethylheptyl ammonium bis(trifluoromethanesulfonate)imide, N,N-diethyl-N-methyl-N-propylammonium bis ( Trifluoromethanesulfonate, imine, N,N-diethyl-N-methyl-N-pentyl ammonium bis(trifluoromethanesulfonate)imide, N,N-diethyl-N-methyl -N-heptyl ammonium bis(trifluoromethanesulfonate) imine, N,N-diethyl-N-propyl-N-pentyl ammonium bis(trifluoromethanesulfonate)imide, triethyl propyl Ammonium bis(trifluoromethanesulfonate)imide, triethylammonium bis(trifluoromethanesulfonate)imide, triethylheptylammonium bis(trifluoromethanesulfonate)imide, N,N -dipropyl-N-methyl-N-ethylammonium bis(trifluoromethanesulfonate)imide, N,N-dipropyl-N-methyl -N-amylammonium bis(trifluoromethanesulfonate)imide, N,N-dipropyl-N-butyl-N-hexylammonium bis(trifluoromethanesulfonate)imide, N,N-di propyl-N,N-dihexylammonium bis(trifluoromethanesulfonate)imide, N,N-dibutyl-N-methyl-N-amylammonium bis(trifluoromethanesulfonate)imide, N,N-dibutyl-N-methyl-N-hexyl ammonium bis(trifluoromethanesulfonate)imide, trioctylmethylammonium bis(trifluoromethanesulfonate)imide, N-methyl- N-ethyl-N-propyl-N-pentyl ammonium bis(trifluoromethanesulfonate)imide, 1-butylpyridinium (trifluoromethanesulfonyl)trifluoroacetamide, 1-butyl -3-methylpyridinium (trifluoromethanesulfonyl) trifluoroacetamide, 1-ethyl-3-methylimidazolium (trifluoromethanesulfonyl) trifluoroacetamide, N-ethyl -N-methyl Lanthanum thiocyanate, 4-ethyl-4-methyl Lanthanum methyl carbonate salt and the like.

如上述之離子液體可使用市售品,亦可以如下所述之方式合成。作為離子液體之合成方法,只要可獲得目標離子液體,則無特別限定,通常可使用文獻「離子液體-開發之最前線與未來-」[CMC(股)出版發行]中所記載之鹵化物法、氫氧化物法、酸酯法、錯合法、及中和法等。 As the ionic liquid described above, a commercially available product can be used, or it can be synthesized as follows. The method for synthesizing the ionic liquid is not particularly limited as long as the target ionic liquid can be obtained, and the halide method described in the document "Ion Liquid - The Forefront and Future of Development -" (CMC) is generally used. , hydroxide method, acid ester method, wrong law, and neutralization method.

以下,關於鹵化物法、氫氧化物法、酸酯法、錯合法、及中和法,以含氮鎓鹽為例對其合成方法進行說明,對於其他含硫鎓鹽、含磷鎓鹽等其他離子液體亦可藉由同樣之方法獲得。 Hereinafter, the halide method, the hydroxide method, the acid ester method, the wrong method, and the neutralization method will be described by taking a nitrogen-containing phosphonium salt as an example thereof, and other sulfur-containing phosphonium salts, phosphorus-containing phosphonium salts, and the like. Other ionic liquids can also be obtained by the same method.

鹵化物法係藉由如下述式(1)~(3)所示之反應而進行之方法。首先,使三級胺與烷基鹵化物反應而獲得鹵化物(反應式(1),鹵素係使用氯、溴、碘)。使所獲得之鹵化物與具有目標離子液體之陰離子結構(A-)之酸(HA)或鹽(MA,M為銨、鋰、鈉、鉀等與目標陰離子形成鹽之陽離子)反應而獲得目標離子液體(R4NA)。 The halide method is a method which is carried out by a reaction represented by the following formulas (1) to (3). First, a tertiary amine is reacted with an alkyl halide to obtain a halide (reaction formula (1), and halogen is chlorine, bromine, or iodine). The obtained halide is reacted with an acid (HA) or a salt (MA, M is a cation which forms a salt with a target anion such as ammonium, lithium, sodium or potassium) having an anionic structure (A - ) of a target ionic liquid to obtain a target. Ionic liquid (R 4 NA).

[化3](1)R3N+RX→R4NX (X:Cl,Br,I) (2)R4NX+HA→R4NA+HX (3)R4NX+MA→R4NA+MX (M:NH4,Li,Na,K,Ag等) (1) R 3 N+RX→R 4 NX (X:Cl, Br, I) (2) R 4 NX+HA→R 4 NA+HX (3)R 4 NX+MA→R 4 NA+MX (M: NH 4 , Li, Na, K, Ag, etc.)

氫氧化物法係藉由如(4)~(8)所示之反應而進行之方法。首先,使鹵化物(R4NX)藉由離子交換膜法電解(反應式(4))、OH型離子交換樹脂法(反應式(5))或與氧化銀(Ag2O)之反應(反應式(6))而獲得氫氧化物(R4NOH)(鹵素係使用氯、溴、碘)。將所獲得之氫氧化物與上述鹵 化法同樣地利用反應式(7)~(8)之反應而獲得目標離子液體(R4NA)。 The hydroxide method is a method carried out by a reaction as shown in (4) to (8). First, the halide (R 4 NX) is subjected to ion exchange membrane method electrolysis (reaction formula (4)), OH type ion exchange resin method (reaction formula (5)) or reaction with silver oxide (Ag 2 O) ( The hydroxide (R 4 NOH) is obtained by the reaction formula (6)) (halogen is chlorine, bromine or iodine). The obtained hydroxide is obtained by the reaction of the reaction formulas (7) to (8) in the same manner as the above-described halogenation method to obtain a target ionic liquid (R 4 NA).

[化4](4)R4NX+H2O→R4NOH+1/2H2+1/2X2 (X:Cl,Br,I) (5)R4NX+P-OH→R4NOH+P-X (P-OH:OH型離子交換樹脂) (6)R4NX+1/2Ag2O+1/2H2O→R4NOH+AgX (7)R4NOH+HA→R4NA+H2O (8)R4NOH+MA→R4NA+MOH (M:NH4,Li,Na,K,Ag等) (4) R 4 NX+H 2 O→R 4 NOH+1/2H 2 +1/2X 2 (X:Cl,Br,I) (5)R 4 NX+P-OH→R 4 NOH+PX (P-OH: OH type ion exchange resin) (6) R 4 NX+1/2Ag 2 O+1/2H 2 O→R 4 NOH+AgX (7)R 4 NOH+HA→R 4 NA +H 2 O (8)R 4 NOH+MA→R 4 NA+MOH (M:NH 4 , Li, Na, K, Ag, etc.)

酸酯法係藉由如(9)~(11)所示之反應而進行之方法。首先,使三級胺(R3N)與酸酯反應而獲得酸酯化物(反應式(9),酸酯係使用硫酸、亞硫酸、磷酸、亞磷酸、碳酸等無機酸之酯或甲磺酸、甲基膦酸、甲酸等有機酸之酯等)。將所獲得之酸酯化物與上述鹵化法同樣地利用反應式(10)~(11)之反應而獲得目標離子液體(R4NA)。又,亦可藉由使用三氟甲磺酸甲酯、三氟乙酸甲酯等作為酸酯而直接獲得離子液體。 The acid ester method is a method carried out by a reaction as shown in (9) to (11). First, a tertiary amine (R 3 N) is reacted with an acid ester to obtain an acid ester compound (reaction formula (9). The acid ester is an ester of a mineral acid such as sulfuric acid, sulfurous acid, phosphoric acid, phosphorous acid or carbonic acid or methanesulfonic acid. Acid, methylphosphonic acid, acid esters such as formic acid, etc.). The obtained acid ester compound is subjected to a reaction of the reaction formulas (10) to (11) in the same manner as the above halogenation method to obtain a target ionic liquid (R 4 NA). Further, an ionic liquid can be directly obtained by using methyl trifluoromethanesulfonate, methyl trifluoroacetate or the like as an acid ester.

錯合法係藉由如(12)~(15)所示之反應而進行之方法。首先,使四級銨之鹵化物(R4NX)、四級銨之氫氧化物(R4NOH)、四級銨之碳酸酯化物(R4NOCO2CH3)等與氟化氫(HF)或氟化銨(NH4F)反應而獲得氟化四級銨鹽(反應式(12)~(14))。藉由使所獲得之氟化四級銨鹽與BF3、AlF3、PF5、AsF5、SbF5、NbF5、TaF5等氟化物進行錯合反應,可獲得離子液體(反應式(15))。 The wrong law is a method performed by a reaction as shown in (12) to (15). First, a quaternary ammonium halide (R 4 NX), a quaternary ammonium hydroxide (R 4 NOH), a quaternary ammonium carbonate (R 4 NOCO 2 CH 3 ), etc., and hydrogen fluoride (HF) or Ammonium fluoride (NH 4 F) is reacted to obtain a fluorinated quaternary ammonium salt (reaction formulae (12) to (14)). An ionic liquid can be obtained by subjecting the obtained fluorinated quaternary ammonium salt to a fluorine compound such as BF 3 , AlF 3 , PF 5 , AsF 5 , SbF 5 , NbF 5 or TaF 5 (reaction formula (15). )).

[化6](12)R4NX+HF→R4NF+HX (X:Cl,Br,I) (13)R4NY+HF→R4NF+HY (Y:OH,OCO2CH3) (14)R4NY+NH4F→R4NF+NH3+HY (Y:OH,OCO2CH3) (15)R4NF+MFn-1→R4NMFn (MFn-1:BF3,AlF3,PF5,AsF5,SbF5,NbF5,TaF5等) (12) R 4 NX+HF→R 4 NF+HX (X:Cl,Br,I) (13)R 4 NY+HF→R 4 NF+HY (Y:OH, OCO 2 CH 3 (14) R 4 NY+NH 4 F→R 4 NF+NH 3 +HY (Y:OH, OCO 2 CH 3 ) (15)R 4 NF+MF n-1 →R 4 NMF n (MF n- 1 : BF 3 , AlF 3 , PF 5 , AsF 5 , SbF 5 , NbF 5 , TaF 5 , etc.)

中和法係藉由如(16)所示之反應而進行之方法。可藉由使三級胺與HBF4、HPF6、CH3COOH、CF3COOH、CF3SO3H、(CF3SO2)2NH、(CF3SO2)3CH、(C2F5SO2)2NH等有機酸反應而獲得。 The neutralization method is carried out by a reaction as shown in (16). By subjecting the tertiary amine to HBF 4 , HPF 6 , CH 3 COOH, CF 3 COOH, CF 3 SO 3 H, (CF 3 SO 2 ) 2 NH, (CF 3 SO 2 ) 3 CH, (C 2 F 5 SO 2 ) 2 NH and other organic acids are obtained by reaction.

[化7](16)R3N+HZ→R3HN+Z- [HZ:HBF4,HPF6,CH3COOH,CF3COOH,CF3SO3H,(CF3SO2)2NH,(CF3SO2)3CH,(C2F5SO2)2NH等有機酸] [7] (16) R 3 N+HZ→R 3 HN + Z - [HZ:HBF 4 , HPF 6 , CH 3 COOH, CF 3 COOH, CF 3 SO 3 H, (CF 3 SO 2 ) 2 NH , (CF 3 SO 2 ) 3 CH, (C 2 F 5 SO 2 ) 2 NH and other organic acids]

上述式(1)~(16)所記載之R表示氫或碳數1至20之烴基,亦可為上述烴基之一部分經雜原子取代之官能基。 R represented by the above formulas (1) to (16) represents hydrogen or a hydrocarbon group having 1 to 20 carbon atoms, and may be a functional group in which one of the above hydrocarbon groups is substituted with a hetero atom.

再者,上述離子液體可單獨使用,亦可混合兩種以上而使用。 Further, the ionic liquid may be used singly or in combination of two or more.

又,相對於上述(甲基)丙烯酸系聚合物100質量份,上述離子性化合物之含量較佳為1質量份以下,更佳為0.001~0.9質量份,更佳為0.005~0.8質量份,最佳為0.01~0.5質量份。若為上述範圍內,則容易兼具防靜電性與低污染性,故而較佳。 In addition, the content of the ionic compound is preferably 1 part by mass or less, more preferably 0.001 to 0.9 part by mass, even more preferably 0.005 to 0.8 part by mass, based on 100 parts by mass of the (meth)acrylic polymer. Preferably, it is 0.01 to 0.5 parts by mass. If it is in the above range, it is easy to have both antistatic property and low pollution property, and therefore it is preferable.

<具有氧伸烷基鏈之有機聚矽氧烷> <Organic polyoxane having an oxygen alkyl chain>

本發明之表面保護膜較佳為上述黏著劑組合物含有具有氧伸烷基鏈之有機聚矽氧烷,更佳為含有具有氧伸烷基主鏈之有機聚矽氧烷。推測藉由使用上述有機聚矽氧烷,黏著劑表面之表面自由能降低,而實現輕剝離化。 In the surface protective film of the present invention, it is preferred that the above-mentioned adhesive composition contains an organic polyoxyalkylene having an oxygen-extended alkyl chain, and more preferably an organic polyoxyalkylene having an oxygen-extended alkyl main chain. It is presumed that by using the above organopolyoxane, the surface free energy of the surface of the adhesive is lowered, and light peeling is achieved.

上述有機聚矽氧烷可適當使用公知之具有聚氧伸烷基主鏈之有機聚矽氧烷,較佳為下述式所表示者。 As the above organopolyoxane, a known organopolyoxyalkylene having a polyoxyalkylene chain main chain can be suitably used, and it is preferably represented by the following formula.

(式中,R1及/或R2具有碳數1~6之氧伸烷基鏈,上述氧伸烷基鏈中之伸烷基可為直鏈或支鏈,上述氧伸烷基鏈之末端可為烷氧基或羥基。又,R1或R2中之任一者可為羥基,或可為烷基、烷氧基,亦可為上述烷基、烷氧基之一部分經雜原子取代之官能基。n為1~300之整數) (wherein R 1 and/or R 2 has an alkylene chain having a carbon number of 1 to 6, and the alkyl group in the above alkyl chain may be a straight chain or a branched chain, and the above oxygen alkyl chain The terminal may be an alkoxy group or a hydroxyl group. Further, any of R 1 or R 2 may be a hydroxyl group, or may be an alkyl group or an alkoxy group, or may be a part of the above alkyl group or alkoxy group through a hetero atom. Substituted functional group. n is an integer from 1 to 300)

上述有機聚矽氧烷係使用以含有矽氧烷之部位(矽氧烷部位)作為主鏈,且於該主鏈之末端鍵結有氧伸烷基鏈者。推測藉由使用上述具有氧伸烷基鏈之有機矽氧烷,獲得與(甲基)丙烯酸系聚合物及離子性 化合物之相溶性之平衡,而實現輕剝離化。 The above organopolyoxyalkylene is used as a main chain having a site containing a decane (a decane moiety), and an alkylene chain is bonded to the terminal of the main chain. It is presumed that the (meth)acrylic polymer and ionicity are obtained by using the above organic siloxane having an oxygen alkyl chain. The balance of the compatibility of the compounds enables light stripping.

又,作為本發明中之上述有機聚矽氧烷,例如可使用如以下之構成。具體而言,式中之R1及/或R2具有含有碳數1~6之烴基之氧伸烷基鏈,作為上述氧伸烷基鏈,可列舉氧基亞甲基、氧基伸乙基、氧基伸丙基、氧基伸丁基等,其中,較佳為氧基伸乙基或氧基伸丙基。再者,於R1及R2均具有氧伸烷基鏈之情形時,可相同亦可不同。 Moreover, as the above-mentioned organopolyoxane in the present invention, for example, the following constitution can be used. Specifically, R 1 and/or R 2 in the formula has an oxygen-extended alkyl chain having a hydrocarbon group having 1 to 6 carbon atoms, and examples of the oxygen-extended alkyl chain include an oxymethylene group and an oxyethyl group. And an oxypropyl group, an oxybutyl group or the like, and among them, an oxy group or an oxypropyl group is preferred. Further, in the case where both of R 1 and R 2 have an oxygen-extended alkyl chain, they may be the same or different.

又,上述氧伸烷基鏈之烴基可為直鏈,亦可為支鏈。 Further, the hydrocarbon group of the above oxygen alkyl chain may be a straight chain or a branched chain.

進而,上述氧伸烷基鏈之末端可為烷氧基或羥基,其中,更佳為烷氧基。於為了保護黏著面而於黏著劑層表面貼合隔片之情形時,末端為羥基之有機聚矽氧烷有時會產生與隔片之相互作用,將隔片自黏著劑層表面剝離時之黏著(剝離)力上升。 Further, the terminal of the above oxygen alkyl chain may be an alkoxy group or a hydroxyl group, and more preferably an alkoxy group. In the case where the separator is attached to the surface of the adhesive layer in order to protect the adhesive surface, the organic polyoxyalkylene having a hydroxyl group at the end sometimes causes interaction with the separator, and when the separator is peeled off from the surface of the adhesive layer Adhesion (peeling) force rises.

又,n為1~300之整數,較佳為10~200,更佳為20至150。若n為上述範圍內,則取得與基礎聚合物之相溶性之平衡,而成為較佳之態樣。進而,分子中亦可具有(甲基)丙烯醯基、烯丙基、羥基等反應性取代基。上述有機聚矽氧烷可單獨使用,亦可混合兩種以上而使用。 Further, n is an integer of 1 to 300, preferably 10 to 200, more preferably 20 to 150. When n is in the above range, the balance with the compatibility with the base polymer is obtained, which is a preferable aspect. Further, the molecule may have a reactive substituent such as a (meth)acrylinyl group, an allyl group or a hydroxyl group. The above organopolyoxane may be used singly or in combination of two or more.

作為上述具有氧伸烷基鏈之有機聚矽氧烷之具體例,例如作為市售品,可列舉商品名為X-22-4952、X-22-4272、X-22-6266、KF-6004、KF-889(以上由信越化學工業公司製造)、BY16-201、SF8427(以上由Dow Corning Toray公司製造)、IM22(旭化成瓦克公司 製造)等。該等化合物可單獨使用,亦可混合兩種以上而使用。 Specific examples of the organopolyoxane having an oxygen-extended alkyl chain include, for example, commercially available products, and the product names are X-22-4952, X-22-4272, X-22-6266, and KF-6004. , KF-889 (above manufactured by Shin-Etsu Chemical Co., Ltd.), BY16-201, SF8427 (above manufactured by Dow Corning Toray), IM22 (Asahi Kasei Wacker Co., Ltd.) Manufacturing) and so on. These compounds may be used singly or in combination of two or more.

又,除了主鏈具有(鍵結有)氧伸烷基鏈之有機矽氧烷以外,亦可使用側鏈具有(鍵結有)氧伸烷基鏈之有機矽氧烷,與主鏈具有氧伸烷基鏈之有機矽氧烷相比,使用側鏈具有氧伸烷基鏈之有機矽氧烷為更佳之態樣。上述有機聚矽氧烷可適當使用公知之具有聚氧伸烷基側鏈之有機聚矽氧烷,較佳為下述式所表示者。 Further, in addition to the organic siloxane having a main chain having an oxygen-extended alkyl chain, an organic oxane having a side chain having an oxygen-extended alkyl chain may be used, and the main chain has oxygen. A more preferred aspect is the use of an organic oxoxane having an oxygen-extended alkyl chain in the side chain as compared to the organic oxirane having an alkyl chain. As the above organopolyoxane, a known organopolyoxyalkylene having a polyoxyalkylene side chain can be suitably used, and it is preferably represented by the following formula.

(式中,R1為一價之有機基,R2、R3及R4為伸烷基,R5為氫或有機基,m及n為0~1000之整數。其中,m、n不同時為0。a及b為0~100之整數。其中,a、b不同時為0) (wherein R 1 is a monovalent organic group, R 2 , R 3 and R 4 are an alkylene group, R 5 is a hydrogen or an organic group, and m and n are integers of 0 to 1000. Among them, m and n are different The time is 0. a and b are integers from 0 to 100, where a and b are not 0)

又,作為本發明中之上述有機聚矽氧烷,例如可使用如以下之構成。具體而言,式中之R1為以甲基、乙基、丙基等烷基、苯基、甲苯基等芳基、或苄基、苯乙基等烷基所例示之一價之有機基,分別可具有羥基等取代基。R2、R3及R4可使用亞甲基、伸乙基、伸丙基等碳數1~8之伸烷基。此處,R3及R4為不同之伸烷基,R2與R3或R4可相同,亦可不同。為了提高該聚氧伸烷基側鏈中可溶解之離子性化合物之濃度,較佳為R3及R4中之任一者為伸乙基或伸丙基。R5可為以甲基、乙基、丙基等烷基或乙醯基、丙醯基等醯基所例示之一價之有機基,分別可具有羥基等取代基。該等化合物可單獨使用,亦可混合兩種以上而使用。又,分子中亦可具有(甲基)丙烯醯基、烯丙基、羥基 等反應性取代基。推測上述具有聚氧伸烷基側鏈之有機矽氧烷中,具有含有羥基末端之聚氧伸烷基側鏈之有機矽氧烷容易取得相溶性之平衡,故而較佳。 Moreover, as the above-mentioned organopolyoxane in the present invention, for example, the following constitution can be used. Specifically, R 1 in the formula is an organic group represented by an alkyl group such as a methyl group, an ethyl group or a propyl group, an aryl group such as a phenyl group or a tolyl group, or an alkyl group such as a benzyl group or a phenethyl group. Each may have a substituent such as a hydroxyl group. As R 2 , R 3 and R 4 , a methylene group having a carbon number of 1 to 8 such as a methylene group, an exoethyl group or a propyl group can be used. Here, R 3 and R 4 are different alkylene groups, and R 2 and R 3 or R 4 may be the same or different. In order to increase the concentration of the ionic compound soluble in the polyoxyalkylene side chain, it is preferred that either of R 3 and R 4 is an exoethyl or a propyl group. R 5 may be an organic group exemplified by an alkyl group such as a methyl group, an ethyl group or a propyl group, or a fluorenyl group such as an ethyl fluorenyl group or a propyl group, and each may have a substituent such as a hydroxyl group. These compounds may be used singly or in combination of two or more. Further, the molecule may have a reactive substituent such as a (meth)acrylinyl group, an allyl group or a hydroxyl group. It is presumed that among the above organic oxoxanes having a polyoxyalkylene side chain, an organic oxirane having a polyoxyalkylene-containing side chain having a hydroxyl group terminal is easy to obtain a balance of compatibility, and thus is preferable.

作為上述有機矽氧烷之具體例,例如可列舉:作為市售品之商品名KF-351A、KF-352A、KF-353、KF-354L、KF-355A、KF-615A、KF-945、KF-640、KF-642、KF-643、KF-6022、X-22-6191、X-22-4515、KF-6011、KF-6012、KF-6015、KF-6017、X-22-2516(以上由信越化學工業公司製造)、SF8428、FZ-2162、SH3749、FZ-77、L-7001、FZ-2104、FZ-2110、L-7002、FZ-2122、FZ-2164、FZ-2203、FZ-7001、SH8400、SH8700、SF8410、SF8422(以上由Dow Corning Toray公司製造)、TSF-4440、TSF-4441、TSF-4445、TSF-4450、TSF-4446、TSF-4452、TSF-4460(Momentive Performance Materials公司製造)、BYK-333、BYK-307、BYK-377、BYK-UV3500、BYK-UV3570(BYK-Chemie Japan公司製造)等。該等化合物可單獨使用,亦可將兩種以上混合而使用。 Specific examples of the above-mentioned organic decane are commercially available as KF-351A, KF-352A, KF-353, KF-354L, KF-355A, KF-615A, KF-945, KF. -640, KF-642, KF-643, KF-6022, X-22-6191, X-22-4515, KF-6011, KF-6012, KF-6015, KF-6017, X-22-2516 (above Manufactured by Shin-Etsu Chemical Co., Ltd.), SF8428, FZ-2162, SH3749, FZ-77, L-7001, FZ-2104, FZ-2110, L-7002, FZ-2122, FZ-2164, FZ-2203, FZ- 7001, SH8400, SH8700, SF8410, SF8422 (above manufactured by Dow Corning Toray), TSF-4440, TSF-4441, TSF-4445, TSF-4450, TSF-4446, TSF-4452, TSF-4460 (Momentive Performance Materials) Made by the company), BYK-333, BYK-307, BYK-377, BYK-UV3500, BYK-UV3570 (manufactured by BYK-Chemie Japan Co., Ltd.). These compounds may be used singly or in combination of two or more.

作為本發明所使用之上述有機矽氧烷,HLB(Hydrophile-Lipophile Balance,親水-親油平衡)值較佳為1~16,更佳為3~14。若HLB值為上述範圍以外,則對被黏著體之污染性變差,故而欠佳。 As the above-mentioned organic decane which is used in the present invention, the HLB (Hydrophile-Lipophile Balance) value is preferably from 1 to 16, more preferably from 3 to 14. If the HLB value is outside the above range, the contamination to the adherend is deteriorated, which is not preferable.

又,相對於上述(甲基)丙烯酸系聚合物100質量份,上述有機聚 矽氧烷之含量較佳為0.01~5質量份,更佳為0.03~3質量份,進而較佳為0.05~1質量份,最佳為0.05~0.5質量份。若為上述範圍內,則容易兼具防靜電性與輕剝離性(再剝離性),故而較佳。 Further, the above organic polymerization is carried out with respect to 100 parts by mass of the above (meth)acrylic polymer. The content of the decane is preferably 0.01 to 5 parts by mass, more preferably 0.03 to 3 parts by mass, still more preferably 0.05 to 1 part by mass, most preferably 0.05 to 0.5 part by mass. When it is in the above range, it is easy to have both antistatic property and light peelability (repeelability), which is preferable.

<交聯劑> <crosslinker>

本發明之表面保護膜較佳為上述黏著劑組合物含有交聯劑。又,於本發明中,使用上述黏著劑組合物製成黏著劑層。例如,於上述黏著劑含有上述(甲基)丙烯酸系聚合物之情形時,藉由適當調節上述(甲基)丙烯酸系聚合物之構成單元、構成比率、交聯劑之選擇及添加比率等進行交聯,可獲得耐熱性更優異之表面保護膜(黏著劑層)。 In the surface protective film of the present invention, it is preferred that the above adhesive composition contains a crosslinking agent. Further, in the present invention, the above adhesive composition is used to form an adhesive layer. For example, when the above-mentioned (meth)acrylic polymer is contained in the above-mentioned adhesive, the constituent unit of the (meth)acrylic polymer, the constituent ratio, the selection of the crosslinking agent, the addition ratio, and the like are appropriately adjusted. Cross-linking provides a surface protective film (adhesive layer) which is more excellent in heat resistance.

作為本發明所使用之交聯劑,可使用異氰酸酯化合物、環氧化合物、三聚氰胺系樹脂、氮丙啶衍生物、及金屬螯合化合物等,尤其使用異氰酸酯化合物成為較佳之態樣。又,該等化合物可單獨使用,亦可混合兩種以上而使用。 As the crosslinking agent used in the present invention, an isocyanate compound, an epoxy compound, a melamine resin, an aziridine derivative, a metal chelate compound or the like can be used, and in particular, an isocyanate compound is preferred. Further, these compounds may be used singly or in combination of two or more.

作為上述異氰酸酯化合物(異氰酸酯系交聯劑),例如可列舉:三亞甲基二異氰酸酯、伸丁基二異氰酸酯、六亞甲基二異氰酸酯(HDI)、二聚酸二異氰酸酯等脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯(IPDI)、1,3-雙(異氰酸酯基甲基)環己烷等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯(XDI)等芳香族異氰酸酯類;藉由脲基甲酸酯鍵、縮二脲鍵、異氰脲酸酯鍵、脲二酮鍵、脲鍵、碳二醯亞胺鍵、脲酮亞胺鍵、三酮鍵等將上述異氰酸酯化合物改性而成之聚異氰酸酯改性體。例如,作為市售品,可列舉商品名Takenate 300S、Takenate 500、Takenate 600、Takenate D165N、Takenate D178N(以上由武田藥品工業公司製造)、Sumidur T80、Sumidur L、Desmodur N3400(以上由Sumika Bayer Urethane公司製造)、Millionate MR、Millionate MT、Coronate L、Coronate HL、 Coronate HX(以上由日本聚氨酯工業公司製造)等。該等異氰酸酯化合物可單獨使用,亦可混合兩種以上而使用,亦可將2官能之異氰酸酯化合物與3官能以上之異氰酸酯化合物併用。藉由併用交聯劑,可兼具黏著性與耐彈斥性(對曲面之接著性),可獲得接著可靠性更優異之表面保護膜。 Examples of the isocyanate compound (isocyanate crosslinking agent) include aliphatic polyisocyanates such as trimethylene diisocyanate, butyl diisocyanate, hexamethylene diisocyanate (HDI), and dimer acid diisocyanate; Cycloaliphatic isocyanate such as cyclopentyl diisocyanate, cyclohexyl diisocyanate, isophorone diisocyanate (IPDI), 1,3-bis(isocyanatemethyl)cyclohexane; 2,4-toluene diisocyanate , 4,4'-diphenylmethane diisocyanate, benzene dimethyl diisocyanate (XDI) and other aromatic isocyanates; by allophanate bond, biuret bond, isocyanurate bond, urea Diketone bond, urea bond, carbodiimide bond, uretonimine bond, two A polyisocyanate modified product obtained by modifying the above isocyanate compound, such as a triketone bond. For example, as a commercial item, the product names Takenate 300S, Takenate 500, Takenate 600, Takenate D165N, Takenate D178N (above, manufactured by Takeda Pharmaceutical Co., Ltd.), Sumidur T80, Sumidur L, and Desmodur N3400 (above by Sumika Bayer Urethane) Manufacturing), Millionate MR, Millionate MT, Coronate L, Coronate HL, Coronate HX (above manufactured by Japan Polyurethane Industry Co., Ltd.) and the like. These isocyanate compounds may be used singly or in combination of two or more kinds, and a bifunctional isocyanate compound may be used in combination with a trifunctional or higher isocyanate compound. By using a crosslinking agent in combination, it is possible to have both adhesiveness and repellency (adhesion to a curved surface), and a surface protective film which is more excellent in reliability can be obtained.

又,於併用2官能之異氰酸酯化合物與3官能以上之異氰酸酯化合物作為上述異氰酸酯化合物(異氰酸酯系交聯劑)之情形時,作為兩化合物之調配比(重量比),較佳為以[2官能之異氰酸酯化合物]/[3官能以上之異氰酸酯化合物](重量比)為0.1/99.9~50/50進行調配,更佳為0.1/99.9~20/80,進而較佳為0.1/99.9~10/90,更佳為0.1/99.9~5/95,最佳為0.1/99.9~1/99。藉由調整至上述範圍內進行調配,成為黏著性與耐彈斥性優異之黏著劑層,而成為較佳之態樣。 In the case where a bifunctional isocyanate compound and a trifunctional or higher isocyanate compound are used in combination as the isocyanate compound (isocyanate crosslinking agent), the compounding ratio (weight ratio) of the two compounds is preferably [2 functional The isocyanate compound]/[3 functional or higher isocyanate compound] (weight ratio) is 0.1/99.9 to 50/50, more preferably 0.1/99.9 to 20/80, and still more preferably 0.1/99.9 to 10/90. More preferably, it is 0.1/99.9~5/95, and the best is 0.1/99.9~1/99. It is preferable to adjust to the above range and to form an adhesive layer excellent in adhesion and repellent resistance.

作為上述環氧化合物,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺(商品名TETRAD-X,三菱瓦斯化學公司製造)或1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷(商品名TETRAD-C,三菱瓦斯化學公司製造)等。 Examples of the epoxy compound include N, N, N', N'-tetraglycidyl-m-xylylenediamine (trade name: TETRAD-X, manufactured by Mitsubishi Gas Chemical Co., Ltd.) or 1,3-double (manufactured by Mitsubishi Gas Chemical Co., Ltd.). N,N-diglycidylaminomethyl)cyclohexane (trade name: TETRAD-C, manufactured by Mitsubishi Gas Chemical Co., Ltd.) and the like.

作為上述三聚氰胺系樹脂,可列舉六羥甲基三聚氰胺等。作為氮丙啶衍生物,例如,可列舉作為市售品之商品名HDU、TAZM、TAZO(以上由相互藥工公司製造)等。 Examples of the melamine-based resin include hexamethylol melamine and the like. The aziridine derivative is, for example, a commercially available product under the trade names of HDU, TAZM, TAZO (the above is manufactured by Mutual Pharmaceutical Co., Ltd.).

作為上述金屬螯合化合物,作為金屬成分可列舉鋁、鐵、錫、鈦、鎳等,作為螯合成分可列舉乙炔、乙醯乙酸甲酯、乳酸乙酯等。 Examples of the metal chelating compound include aluminum, iron, tin, titanium, and nickel. Examples of the chelating component include acetylene, ethyl acetacetate, and ethyl lactate.

本發明所使用之交聯劑之含量例如相對於上述(甲基)丙烯酸系聚合物100質量份,較佳為含有0.01~10質量份,更佳為含有0.1~8質量份,進而較佳為含有0.5~5質量份,最佳為含有1.0~2.5質量份。於上述含量少於0.01質量份之情形時,存在利用交聯劑進行之交聯形成變得不充分,所獲得之黏著劑層之凝聚力變小,而無法獲得充分之耐 熱性之情形,又,有導致糊劑殘留之傾向。另一方面,於含量超過10質量份之情形時,聚合物之凝聚力較大,流動性降低,對被黏著體(例如,偏光板)之潤濕變得不充分,而有導致於被黏著體與黏著劑層(黏著劑組合物層)之間產生起泡之傾向。進而,若交聯劑量較多,則有剝離靜電特性降低之傾向。又,該等交聯劑可單獨使用,亦可混合兩種以上而使用。 The content of the crosslinking agent used in the present invention is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 8 parts by mass, even more preferably 100 parts by mass based on 100 parts by mass of the (meth)acrylic polymer. It is contained in an amount of 0.5 to 5 parts by mass, preferably 1.0 to 2.5 parts by mass. When the content is less than 0.01 parts by mass, the crosslinking formation by the crosslinking agent becomes insufficient, and the cohesive force of the obtained adhesive layer becomes small, and sufficient resistance cannot be obtained. In the case of heat, there is a tendency to cause the paste to remain. On the other hand, when the content exceeds 10 parts by mass, the cohesive force of the polymer is large, the fluidity is lowered, the wetting of the adherend (for example, a polarizing plate) is insufficient, and the adherend is caused. There is a tendency to foam between the adhesive layer (adhesive composition layer). Further, when the amount of the crosslinking agent is large, the peeling static characteristics tend to be lowered. Further, these crosslinking agents may be used singly or in combination of two or more.

於上述黏著劑組合物中可進而含有用以使上述任一交聯反應更有效地進行之交聯觸媒。作為該交聯觸媒,例如可使用:二月桂酸二丁基錫、二月桂酸二辛基錫等錫系觸媒;三(乙醯丙酮)鐵、三(己烷-2,4-二酮)鐵、三(庚烷-2,4-二酮)鐵、三(庚烷-3,5-二酮)鐵、三(5-甲基己烷-2,4-二酮)鐵、三(辛烷-2,4-二酮)鐵、三(6-甲基庚烷-2,4-二酮)鐵、三(2,6-二甲基庚烷-3,5-二酮)鐵、三(壬烷-2,4-二酮)鐵、三(壬烷-4,6-二酮)鐵、三(2,2,6,6-四甲基庚烷-3,5-二酮)鐵、三(十三烷-6,8-二酮)鐵、三(1-苯基丁烷-1,3-二酮)鐵、三(六氟乙醯丙酮)鐵、三(乙醯乙酸乙酯)鐵、三(乙醯乙酸正丙酯)鐵、三(乙醯乙酸異丙酯)鐵、三(乙醯乙酸正丁酯)鐵、三(乙醯乙酸第二丁酯)鐵、三(乙醯乙酸第三丁酯)鐵、三(丙醯乙酸甲酯)鐵、三(丙醯乙酸乙酯)鐵、三(丙醯乙酸正丙酯)鐵、三(丙醯乙酸異丙酯)鐵、三(丙醯乙酸正丁酯)鐵、三(丙醯乙酸第二丁酯)鐵、三(丙醯乙酸第三丁酯)鐵、三(乙醯乙酸苄酯)鐵、三(丙二酸二甲酯)鐵、三(丙二酸二乙酯)鐵、三甲氧基鐵、三乙氧基鐵、三異丙氧基鐵、三氯化鐵等鐵系觸媒。該等交聯觸媒可使用一種,亦可併用兩種以上。 Further, the above-mentioned adhesive composition may further contain a crosslinking catalyst for allowing any of the above crosslinking reactions to proceed more efficiently. As the crosslinking catalyst, for example, tin-based catalyst such as dibutyltin dilaurate or dioctyltin dilaurate; tris(acetonitrile)iron and tris(hexane-2,4-dione) can be used. Iron, tris(heptane-2,4-dione) iron, tris(heptane-3,5-dione) iron, tris(5-methylhexane-2,4-dione) iron, tri ( Octane-2,4-dione)iron, tris(6-methylheptane-2,4-dione)iron, tris(2,6-dimethylheptane-3,5-dione)iron , tris(decane-2,4-dione)iron, tris(decane-4,6-dione)iron, tris(2,2,6,6-tetramethylheptane-3,5-di Ketone) iron, tris(tridecane-6,8-dione)iron, tris(1-phenylbutane-1,3-dione)iron, tris(hexafluoroacetamidine)iron, tris(b)醯 ethyl acetate) iron, tris(ethylene acetate acetate) iron, tris(acetate isopropyl acetate) iron, tris(ethylene acetoacetate n-butyl ester) iron, tris(ethylene acetate second butyl acetate) Iron, tris(ethylene acetoacetate), iron, tris(ethyl acetate) iron, tris(ethyl acetate) iron, tris(n-propyl acetate) iron, tris(propyl acetate) Isopropyl ester) iron, tris(n-butyl acetate) iron, tris(propylene diacetate) butyl, tris(trimethylene acetate), iron, tris(ethyl acetate) , iron (trimethyl malonate) iron, tris (diethyl malonate) iron, trimethoxy iron, triethoxy iron, triisopropoxy iron, ferric chloride and other iron-based catalysts . These crosslinking catalysts may be used alone or in combination of two or more.

上述交聯觸媒之含量(使用量)並無特別限制,例如,相對於上述(甲基)丙烯酸系聚合物100質量份,較佳為設為約0.0001~1質量份,更佳為0.001~0.5質量份。若為上述範圍內,則於形成黏著劑層時交聯反應之速度較快,黏著劑組合物之適用期亦變長,而成為較佳之態 樣。 The content (amount of use) of the cross-linking catalyst is not particularly limited. For example, it is preferably about 0.0001 to 1 part by mass, more preferably 0.001 to 100 parts by mass of the (meth)acryl-based polymer. 0.5 parts by mass. If it is within the above range, the crosslinking reaction speed is faster when the adhesive layer is formed, and the pot life of the adhesive composition becomes longer, which becomes a preferable state. kind.

於上述黏著劑組合物中亦可含有不含有機聚矽氧烷之含聚氧伸烷基鏈化合物。藉由於黏著劑中含有上述化合物,可獲得對被黏著體之潤濕性更優異之黏著劑。 The above-mentioned adhesive composition may also contain a polyoxyalkylene-containing chain compound containing no organopolyoxyalkylene. By containing the above compound in the adhesive, an adhesive which is more excellent in wettability to the adherend can be obtained.

作為上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物之具體例,例如可列舉:聚氧伸烷基烷基胺、聚氧伸烷基二胺、聚氧伸烷基脂肪酸酯、聚氧伸烷基山梨醇酐脂肪酸酯、聚氧伸烷基烷基苯基醚、聚氧伸烷基烷基醚、聚氧伸烷基烷基烯丙基醚、聚氧伸烷基烷基苯基烯丙基醚等非離子性界面活性劑;聚氧伸烷基烷基醚硫酸酯鹽、聚氧伸烷基烷基醚磷酸酯鹽、聚氧伸烷基烷基苯基醚硫酸酯鹽、聚氧伸烷基烷基苯基醚磷酸酯鹽等陰離子性界面活性劑;其他具有聚氧伸烷基鏈(聚環氧烷鏈)之陽離子性界面活性劑或兩離子性界面活性劑、具有聚氧伸烷基鏈之聚醚化合物(且包括其衍生物)、具有聚氧伸烷基鏈之丙烯酸系化合物(且包括其衍生物)等。又,可於丙烯酸系聚合物中調配含聚氧伸烷基鏈單體作為含聚氧伸烷基鏈化合物。該含聚氧伸烷基鏈化合物可單獨使用,亦可組合兩種以上而使用。 Specific examples of the polyoxyalkylene group-containing compound containing no organopolyoxyalkylene include polyoxyalkylene alkylamine, polyoxyalkylene diamine, and polyoxyalkylene fatty acid. Ester, polyoxyalkylene sorbitan fatty acid ester, polyoxyalkylene alkyl phenyl ether, polyoxyalkylene alkyl ether, polyoxyalkylene alkyl allylate, polyoxyalkylene Nonionic surfactants such as alkylalkyl phenyl allyl ether; polyoxyalkylene alkyl alkyl ether sulfate, polyoxyalkylene alkyl phosphate phosphate, polyoxyalkylene alkyl phenyl Anionic surfactants such as ether sulfates, polyoxyalkylene alkyl phenyl ether phosphates; other cationic surfactants or diionics having polyoxyalkylene chains (polyalkylene oxide chains) A surfactant, a polyether compound having a polyoxyalkylene chain (and derivatives thereof), an acrylic compound having a polyoxyalkylene chain (and derivatives thereof), and the like. Further, a polyoxyalkylene group-containing monomer may be formulated as a polyoxyalkylene-containing chain compound in the acrylic polymer. The polyoxyalkylene group-containing chain compound may be used singly or in combination of two or more.

作為上述具有聚氧伸烷基鏈之聚醚化合物之具體例,可列舉:聚丙二醇(PPG)-聚乙二醇(PEG)之嵌段共聚物、PPG-PEG-PPG之嵌段共聚物、PEG-PPG-PEG之嵌段共聚物等。作為上述具有聚氧伸烷基鏈之聚醚化合物之衍生物,可列舉末端經醚化之含氧基伸丙基化合物(PPG單烷基醚、PEG-PPG單烷基醚等)、末端經乙醯化之含氧基伸丙基化合物(末端乙醯化PPG等)等。 Specific examples of the polyether compound having a polyoxyalkylene chain include a block copolymer of polypropylene glycol (PPG)-polyethylene glycol (PEG), a block copolymer of PPG-PEG-PPG, and Block copolymer of PEG-PPG-PEG, and the like. Examples of the derivative of the polyether compound having a polyoxyalkylene chain include an etherified oxypropyl group-containing compound (PPG monoalkyl ether, PEG-PPG monoalkyl ether, etc.), and terminal B. An oxylated propyl-containing compound (terminal acetophenone PPG, etc.).

又,作為上述具有聚氧伸烷基鏈之丙烯酸系化合物之具體例,可列舉具有氧伸烷基之(甲基)丙烯酸酯聚合物。作為上述氧伸烷基,就配位離子性化合物之觀點而言,氧伸烷基單元之加成莫耳數較佳為1~50,更佳為2~30,進而較佳為2~20。又,上述氧伸烷基鏈之末 端可直接為羥基,亦可經烷基、苯基等取代。 Further, specific examples of the acrylic compound having a polyoxyalkylene chain include a (meth) acrylate polymer having an oxygen alkyl group. The oxygen-extended alkyl group has an addition molar number of from 1 to 50, more preferably from 2 to 30, still more preferably from 2 to 20, from the viewpoint of the coordination ionic compound. . Again, at the end of the above oxygen chain The terminal may be directly a hydroxyl group or may be substituted with an alkyl group, a phenyl group or the like.

上述具有氧伸烷基之(甲基)丙烯酸酯聚合物較佳為含有(甲基)丙烯酸環氧烷作為單體單元(成分)之聚合物,作為上述(甲基)丙烯酸環氧烷之具體例,可列舉含乙二醇基之(甲基)丙烯酸酯,例如:甲氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯等甲氧基聚乙二醇(甲基)丙烯酸酯型;乙氧基二乙二醇(甲基)丙烯酸酯、乙氧基三乙二醇(甲基)丙烯酸酯等乙氧基聚乙二醇(甲基)丙烯酸酯型;丁氧基二乙二醇(甲基)丙烯酸酯、丁氧基三乙二醇(甲基)丙烯酸酯等丁氧基聚乙二醇(甲基)丙烯酸酯型;苯氧基二乙二醇(甲基)丙烯酸酯、苯氧基三乙二醇(甲基)丙烯酸酯等苯氧基聚乙二醇(甲基)丙烯酸酯型;2-乙基己基聚乙二醇(甲基)丙烯酸酯、壬基苯酚聚乙二醇(甲基)丙烯酸酯型、甲氧基二丙二醇(甲基)丙烯酸酯等甲氧基聚丙二醇(甲基)丙烯酸酯型等。 The (meth) acrylate polymer having an oxygen alkyl group is preferably a polymer containing (meth)acrylic acid alkylene oxide as a monomer unit (component) as a specific one of the above (meth)acrylic acid alkylene oxide. Examples thereof include a (meth) acrylate having a glycol group, for example, a methoxy group such as methoxydiethylene glycol (meth) acrylate or methoxy triethylene glycol (meth) acrylate. Polyethylene glycol (meth) acrylate type; ethoxypolyethylene glycol (meth) acrylate, ethoxy triethylene glycol (meth) acrylate and other ethoxypolyethylene glycol (methyl Acrylate type; butoxy polyethylene glycol (meth) acrylate type such as butoxy diethylene glycol (meth) acrylate, butoxy triethylene glycol (meth) acrylate; phenoxy Phenoxy polyethylene glycol (meth) acrylate type such as diethylene glycol (meth) acrylate or phenoxy triethylene glycol (meth) acrylate; 2-ethylhexyl polyethylene glycol A methoxypolypropylene glycol (meth) acrylate type such as (meth) acrylate, nonylphenol polyethylene glycol (meth) acrylate type, or methoxy dipropylene glycol (meth) acrylate.

又,作為上述單體單元(成分),亦可使用上述(甲基)丙烯酸環氧烷以外之其他單體單元(成分)。作為其他單體成分之具體例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二烷基酯、(甲基)丙烯酸正十三烷基酯、(甲基)丙烯酸正十四烷基酯等具有碳數1~14之烷基之丙烯酸酯及/或甲基丙烯酸酯。 Further, as the monomer unit (component), other monomer units (components) other than the above (meth)acrylic acid alkylene oxide may be used. Specific examples of the other monomer component include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, and second butyl (meth)acrylate. ) Third butyl acrylate, isobutyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, (meth) acrylate Isooctyl ester, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-dodecyl (meth)acrylate An acrylate and/or methacrylate having an alkyl group having 1 to 14 carbon atoms such as an ester, n-tridecyl (meth)acrylate or n-tetradecyl (meth)acrylate.

進而,作為上述(甲基)丙烯酸環氧烷以外之其他單體單元(成分),亦可適當使用含羧基之(甲基)丙烯酸酯、含磷酸基之(甲基)丙烯酸酯、含氰基之(甲基)丙烯酸酯、乙烯酯類、芳香族乙烯基化合物、含酸酐基之(甲基)丙烯酸酯、含羥基之(甲基)丙烯酸酯、含醯胺基之 (甲基)丙烯酸酯、含胺基之(甲基)丙烯酸酯、含環氧基之(甲基)丙烯酸酯、N-丙烯醯基啉、乙烯基醚類等。 Further, as the monomer unit (component) other than the (meth)acrylic acid alkylene oxide, a carboxyl group-containing (meth) acrylate, a phosphate group-containing (meth) acrylate, or a cyano group may be suitably used. (meth) acrylate, vinyl ester, aromatic vinyl compound, acid anhydride group-containing (meth) acrylate, hydroxyl group-containing (meth) acrylate, guanamine-containing (meth) acrylate Amino group-containing (meth) acrylate, epoxy group-containing (meth) acrylate, N-propylene fluorenyl group Porphyrins, vinyl ethers, and the like.

作為更佳之一態樣,上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物係至少一部分具有(聚)環氧乙烷鏈之化合物。藉由調配上述含(聚)環氧乙烷鏈化合物,基礎聚合物與防靜電成分之相溶性提高,向被黏著體之滲出得以適當抑制,而可獲得低污染性之黏著劑組合物。其中,尤其是於使用PPG-PEG-PPG之嵌段共聚物之情形時,可獲得低污染性優異之黏著劑。作為上述含聚環氧乙烷鏈化合物,較佳為(聚)環氧乙烷鏈占上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物整體之重量為5~90質量%,更佳為5~85質量%,進而較佳為5~80質量%,最佳為5~75質量%。 As a more preferable aspect, the above polyoxyalkylene group-containing compound containing no organopolyoxyalkylene is a compound having at least a part of a (poly)ethylene oxide chain. By blending the above-mentioned (poly)ethylene oxide chain-containing compound, the compatibility between the base polymer and the antistatic component is improved, and the bleeding to the adherend is appropriately suppressed, whereby a low-pollution adhesive composition can be obtained. Among them, in particular, in the case of using a block copolymer of PPG-PEG-PPG, an adhesive excellent in low contamination is obtained. The polyoxyethylene oxide chain-containing compound preferably has a (poly)ethylene oxide chain in an amount of from 5 to 90% by mass based on the total of the polyoxyalkylene group-containing compound containing no organopolyoxyalkylene. More preferably, it is 5 to 85% by mass, further preferably 5 to 80% by mass, most preferably 5 to 75% by mass.

作為上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物之分子量,數平均分子量(Mn)為50000以下者較為適當,較佳為200~30000,進而更佳為200~10000,通常適宜使用200~5000者。若Mn較50000過大,則有與丙烯酸系聚合物之相溶性降低,黏著劑層發生白化之傾向。若Mn較200過小,則存在變得容易產生因上述聚氧伸烷基化合物引起之污染之可能性。再者,此處所謂Mn係指藉由GPC(凝膠滲透層析法)所獲得之聚苯乙烯換算之值。 The molecular weight of the polyoxyalkylene group-containing compound containing no organopolyoxyalkylene, the number average molecular weight (Mn) is preferably 50,000 or less, more preferably 200 to 30,000, and still more preferably 200 to 10,000. Suitable for use from 200 to 5000. When Mn is too large than 50,000, the compatibility with the acrylic polymer is lowered, and the adhesive layer tends to be whitened. If Mn is too small as 200, there is a possibility that contamination due to the above polyoxyalkylene alkyl compound is likely to occur. Here, the term "Mn" as used herein means a value in terms of polystyrene obtained by GPC (gel permeation chromatography).

又,作為上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物之市售品之具體例,例如可列舉Adeka Pluronic 17R-4、Adeka Pluronic 25R-2(以上均為ADEKA公司製造)、Emulgen 120(花王公司製造)等。 In addition, as a specific example of the commercial product containing the polyoxyalkylene chain-containing compound of the above-mentioned organic polyoxane, for example, Adeka Pluronic 17R-4 and Adeka Pluronic 25R-2 (all of which are manufactured by ADEKA Co., Ltd.) are mentioned. , Emulgen 120 (made by Kao Corporation) and so on.

作為上述不含有機聚矽氧烷之含聚氧伸烷基鏈化合物之調配量,相對於丙烯酸系聚合物100質量份,例如可設為0.005~20質量份,較佳為0.01~10質量份,更佳為0.05~5質量份,最佳為0.1~1質量份。若調配量過少,則防止防靜電成分之滲出之效果降低,若過多,則存在變得容易產生因上述聚氧伸烷基化合物引起之污染之可能 性。 The amount of the polyoxyalkylene group-containing compound containing no polyoxyalkylene oxide is, for example, 0.005 to 20 parts by mass, preferably 0.01 to 10 parts by mass, per 100 parts by mass of the acrylic polymer. More preferably, it is 0.05 to 5 parts by mass, and most preferably 0.1 to 1 part by mass. If the amount is too small, the effect of preventing the bleed out of the antistatic component is lowered, and if it is too large, there is a possibility that the contamination due to the polyoxyalkylene compound is likely to occur. Sex.

進而,於上述黏著劑組合物中亦可含有丙烯酸系低聚物。丙烯酸系低聚物之重量平均分子量較佳為1000以上且未達30000,更佳為1500以上且未達20000,進而較佳為2000以上且未達10000。作為上述丙烯酸系低聚物,係含有下述通式(17)所表示之具有脂環式結構之(甲基)丙烯酸系單體作為單體單元之(甲基)丙烯酸系聚合物,於用作丙烯酸系黏著劑之情形時,作為黏著賦予樹脂而發揮功能,提高接著性,而於抑制表面保護膜之隆起方面有效果。 Further, an acrylic oligomer may be contained in the above adhesive composition. The weight average molecular weight of the acrylic oligomer is preferably 1,000 or more and less than 30,000, more preferably 1,500 or more and less than 20,000, further preferably 2,000 or more and less than 10,000. The acrylic oligomer is a (meth)acrylic polymer containing a (meth)acrylic monomer having an alicyclic structure represented by the following formula (17) as a monomer unit, and is used. In the case of an acrylic-based adhesive, it functions as an adhesive-imparting resin, and improves adhesion, and is effective in suppressing the swelling of the surface protective film.

CH2=C(R1)COOR2 (17) CH 2 =C(R 1 )COOR 2 (17)

[式(17)中,R1為氫原子或甲基,R2為具有脂環式結構之脂環式烴基] [In the formula (17), R 1 is a hydrogen atom or a methyl group, and R 2 is an alicyclic hydrocarbon group having an alicyclic structure]

作為通式(17)中之脂環式烴基R2,可列舉環己基、異基、二環戊基等脂環式烴基等。作為具有此種脂環式烴基之(甲基)丙烯酸酯,例如可列舉:具有環己基之(甲基)丙烯酸環己酯、具有異基之(甲基)丙烯酸異酯、具有二環戊基之(甲基)丙烯酸二環戊基酯等(甲基)丙烯酸與脂環族醇之酯。如此藉由使丙烯酸系低聚物含有具有體積相對較大之結構之丙烯酸系單體作為單體單元,可提高接著性。 Examples of the alicyclic hydrocarbon group R 2 in the formula (17) include a cyclohexyl group and a different An alicyclic hydrocarbon group such as a dicyclopentyl group or the like. Examples of the (meth) acrylate having such an alicyclic hydrocarbon group include cyclohexyl (meth) acrylate having a cyclohexyl group, and having a different (meth)acrylic acid An ester, an ester of (meth)acrylic acid such as dicyclopentyl (meth)acrylate having a dicyclopentyl group, and an alicyclic alcohol. By making the acrylic oligomer contain an acrylic monomer having a relatively large volume as a monomer unit, the adhesion can be improved.

進而於本實施形態中,構成上述丙烯酸系低聚物之脂環式烴基較佳為具有橋接環結構。所謂橋接環結構係指三環以上之脂環式結構。藉由使丙烯酸系低聚物具有如橋接環結構般體積更大之結構,可進一步提高再剝離用丙烯酸系黏著劑組合物(再剝離用丙烯酸系表面保護膜)之接著性。 Further, in the present embodiment, the alicyclic hydrocarbon group constituting the acrylic oligomer preferably has a bridged ring structure. The bridge ring structure refers to an alicyclic structure of three or more rings. By making the acrylic oligomer have a structure having a larger volume as a bridge ring structure, the adhesion of the acrylic adhesive composition for re-peeling (acrylic surface protective film for re-peeling) can be further improved.

作為上述具有橋接環結構之脂環式烴基R2,例如可列舉:下述式(3a)所表示之二環戊基、下述式(3b)所表示之二環戊烯基、下述式(3c)所表示之金剛烷基、下述式(3d)所表示之三環戊基、下述式(3e)所表示之三環戊烯基等。再者,於合成丙烯酸系低聚物時或製作黏著劑組 合物時採用UV聚合之情形時,就不易引起聚合抑制之方面而言,含有具有橋接環結構之三環以上之脂環式結構之(甲基)丙烯酸系單體中,尤其可適宜地使用具有下述式(3a)所表示之二環戊基、或下述式(3c)所表示之金剛烷基、下述式(3d)所表示之三環戊基等飽和結構之(甲基)丙烯酸系單體作為構成丙烯酸系低聚物之單體。 Examples of the alicyclic hydrocarbon group R 2 having a bridged ring structure include a dicyclopentanyl group represented by the following formula (3a), a dicyclopentenyl group represented by the following formula (3b), and the following formula. (3c) The adamantyl group represented by the following formula (3d), a tricyclopentenyl group represented by the following formula (3e), and the like. Further, in the case of synthesizing an acrylic oligomer or when UV polymerization is used in the production of an adhesive composition, it is difficult to cause polymerization inhibition, and it has an alicyclic structure having a triple ring or more having a bridged ring structure. In the (meth)acrylic monomer, a dicyclopentyl group represented by the following formula (3a) or an adamantyl group represented by the following formula (3c), and the following formula (3d) can be suitably used. The (meth)acrylic monomer having a saturated structure such as a tricyclopentyl group represented as a monomer constituting the acrylic oligomer.

又,作為上述含有具有橋接環結構之三環以上之脂環式結構之(甲基)丙烯酸系單體之例,可列舉:甲基丙烯酸二環戊基酯、丙烯酸二環戊基酯、甲基丙烯酸二環戊基氧基乙酯、丙烯酸二環戊基氧基乙酯、甲基丙烯酸三環戊基酯、丙烯酸三環戊基酯、甲基丙烯酸1-金剛烷基酯、丙烯酸1-金剛烷基酯、甲基丙烯酸2-甲基-2-金剛烷基酯、丙烯酸2-甲基-2-金剛烷基酯、甲基丙烯酸2-乙基-2-金剛烷基酯、丙烯酸2-乙基-2-金剛烷基酯等(甲基)丙烯酸酯。該(甲基)丙烯酸系單體可單獨使用,或組合兩種以上而使用。 Further, examples of the (meth)acrylic monomer having an alicyclic structure having three or more rings having a bridged ring structure include dicyclopentyl methacrylate, dicyclopentyl acrylate, and A. Dicyclopentyloxyethyl acrylate, dicyclopentyloxyethyl acrylate, tricyclopentyl methacrylate, tricyclopentyl acrylate, 1-adamantyl methacrylate, acrylic acid 1- Adamantyl ester, 2-methyl-2-adamantyl methacrylate, 2-methyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl methacrylate, acrylic acid 2 (Meth) acrylate such as ethyl-2-adamantyl ester. These (meth)acrylic monomers may be used singly or in combination of two or more.

本實施形態之丙烯酸系低聚物可為具有脂環式結構之(甲基)丙烯酸系單體之均聚物,或者可為具有脂環式結構之(甲基)丙烯酸系單體 與其他(甲基)丙烯酸酯單體或共聚合性單體之共聚物。 The acrylic oligomer of the present embodiment may be a homopolymer of a (meth)acrylic monomer having an alicyclic structure, or may be a (meth)acrylic monomer having an alicyclic structure. Copolymer with other (meth) acrylate monomers or copolymerizable monomers.

作為上述(甲基)丙烯酸酯單體之例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯之類之(甲基)丙烯酸烷基酯; (甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯之類之(甲基)丙烯酸芳基酯; 由萜烯化合物衍生物醇獲得之(甲基)丙烯酸酯;等。此種(甲基)丙烯酸酯可單獨使用,或可組合兩種以上而使用。 Examples of the (meth) acrylate monomer include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, and isopropyl (meth) acrylate. Butyl methacrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, (meth)acrylic acid Amyl ester, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, (A) Ethyl acrylate, isodecyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, (meth) acrylate An alkyl (meth)acrylate such as an alkyl ester; An aryl (meth)acrylate such as phenyl (meth)acrylate or benzyl (meth)acrylate; a (meth) acrylate obtained from a terpene compound derivative alcohol; and the like. Such (meth) acrylate may be used singly or in combination of two or more.

又,除了上述(甲基)丙烯酸酯成分單元以外,上述丙烯酸系低聚物亦可使可與(甲基)丙烯酸酯共聚合之其他單體成分(共聚合性單體)共聚合而獲得。 Further, in addition to the above (meth) acrylate component unit, the acryl oligomer may be obtained by copolymerizing another monomer component (copolymerizable monomer) copolymerizable with (meth) acrylate.

作為上述可與(甲基)丙烯酸酯共聚合之其他單體,可列舉:丙烯酸、甲基丙烯酸、丙烯酸羧基乙酯、丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸、異丁烯酸等含羧基單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯、(甲基)丙烯酸丙氧基乙酯、(甲基)丙烯酸丁氧基乙酯、(甲基)丙烯酸乙氧基丙酯之類之(甲基)丙烯酸烷氧基烷基酯系單體;(甲基)丙烯酸鹼金屬鹽等鹽;乙二醇之二(甲基)丙烯酸酯、二乙二醇之二(甲基)丙烯酸酯、三乙二醇之二(甲基)丙烯酸酯、聚乙二醇之二(甲基)丙烯酸酯、丙二醇 之二(甲基)丙烯酸酯、二丙二醇之二(甲基)丙烯酸酯、三丙二醇之二(甲基)丙烯酸酯之類之(聚)伸烷基二醇之二(甲基)丙烯酸酯單體;三羥甲基丙烷三(甲基)丙烯酸酯之類之多元(甲基)丙烯酸酯單體;乙酸乙烯酯、丙酸乙烯酯等乙烯酯類;偏二氯乙烯、(甲基)丙烯酸2-氯乙酯之類之鹵化乙烯基化合物;2-乙烯基-2-唑啉、2-乙烯基-5-甲基-2-唑啉、2-異丙烯基-2-唑啉之類之含唑啉基之聚合性化合物;(甲基)丙烯醯基氮丙啶、(甲基)丙烯酸2-氮丙啶基乙酯之類之含氮丙啶基之聚合性化合物;烯丙基縮水甘油基醚、(甲基)丙烯酸縮水甘油醚、(甲基)丙烯酸2-乙酯縮水甘油基醚之類之含環氧基之乙烯基單體;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、內酯類與(甲基)丙烯酸2-羥基乙酯之加成物之類之含羥基之乙烯基單體;於聚丙二醇、聚乙二醇、聚四亞甲基二醇、聚丁二醇、聚乙二醇與聚丙二醇之共聚物、聚丁二醇與聚乙二醇之共聚物之類之聚伸烷基二醇之末端鍵結有(甲基)丙烯醯基、苯乙烯基、乙烯基等不飽和基之巨單體;氟取代(甲基)丙烯酸烷基酯之類之含氟乙烯基單體;順丁烯二酸酐、伊康酸酐等含酸酐基單體;苯乙烯、α-甲基苯乙烯、乙烯基甲苯等芳香族乙烯基化合物系單體;2-氯乙基乙烯基醚、單氯乙酸乙烯酯之類之反應性含鹵素乙烯基單體;(甲基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N,N-二乙基(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N- 羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺、N-甲氧基乙基(甲基)丙烯醯胺、N-丁氧基甲基(甲基)丙烯醯胺、N-丙烯醯基啉之類之含醯胺基乙烯基單體;N-(甲基)丙烯醯氧基亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-6-氧基六亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-8-氧基六亞甲基丁二醯亞胺等丁二醯亞胺系單體;N-環己基順丁烯二醯亞胺、N-異丙基順丁烯二醯亞胺、N-月桂基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺等順丁烯二醯亞胺系單體;N-甲基伊康醯亞胺、N-乙基伊康醯亞胺、N-丁基伊康醯亞胺、N-辛基伊康醯亞胺、N-2-乙基己基伊康醯亞胺、N-環己基伊康醯亞胺、N-月桂基伊康醯亞胺等伊康醯亞胺系單體;N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、N-乙烯基吡啶、N-乙烯基哌啶酮、N-乙烯基嘧啶、N-乙烯基哌、N-乙烯基吡、N-乙烯基吡咯、N-乙烯基咪唑、N-乙烯基唑、N-(甲基)丙烯醯基-2-吡咯啶酮、N-(甲基)丙烯醯基哌啶、N-(甲基)丙烯醯基吡咯啶、N-乙烯基啉、N-乙烯基吡唑、N-乙烯基異唑、N-乙烯基噻唑、N-乙烯基異噻唑、N-乙烯基嗒等含氮雜環系單體;N-乙烯基羧醯胺類;N-乙烯基己內醯胺等內醯胺系單體;(甲基)丙烯腈等氰基丙烯酸酯單體;(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等(甲基)丙烯酸胺基烷基酯系單體;環己基順丁烯二醯亞胺、異丙基順丁烯二醯亞胺等含醯亞胺基單體; (甲基)丙烯酸2-異氰酸基乙酯等含異氰酸酯基單體;乙烯基三甲氧基矽烷、γ-甲基丙烯醯氧丙基三甲氧基矽烷、烯丙基三甲氧基矽烷、三甲氧基矽烷基丙基烯丙胺、2-甲氧基乙氧基三甲氧基矽烷之類之有機含矽之乙烯基單體;(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯、(甲基)丙烯酸羥基己酯、(甲基)丙烯酸羥基辛酯、(甲基)丙烯酸羥基癸酯、(甲基)丙烯酸羥基月桂酯、甲基丙烯酸(4-羥基甲基環己基)甲酯等(甲基)丙烯酸羥基烷基酯等含羥基單體;(甲基)丙烯酸四氫糠酯、含氟原子之(甲基)丙烯酸酯、聚矽氧(甲基)丙烯酸酯等具有雜環、鹵素原子、矽原子等之丙烯酸酯系單體;異戊二烯、丁二烯、異丁烯等烯烴系單體;甲基乙烯基醚、乙基乙烯基醚等乙烯基醚系單體;乙烯、丁二烯、異戊二烯、異丁烯等烯烴或二烯類;乙烯基烷基醚等乙烯基醚類;氯乙烯;及將乙烯基聚合而獲得之單體末端具有自由基聚合性乙烯基之巨單體類等。該等單體可單獨或組合而與上述(甲基)丙烯酸酯共聚合。 Examples of the other monomer copolymerizable with the (meth) acrylate include acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxy amyl acrylate, itaconic acid, maleic acid, and antibutene. a carboxyl group-containing monomer such as acid, crotonic acid or methacrylic acid; methoxyethyl (meth)acrylate, ethoxyethyl (meth)acrylate, propoxyethyl (meth)acrylate, (methyl) a (meth)acrylic acid alkoxyalkyl ester monomer such as butoxyethyl acrylate or ethoxypropyl methacrylate; a salt such as an alkali metal salt of (meth)acrylic acid; Di(meth)acrylate, di(meth)acrylate of diethylene glycol, di(meth)acrylate of triethylene glycol, di(meth)acrylate of polyethylene glycol, propylene glycol a di(meth)acrylate monomer of di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate or the like (poly)alkylene glycol a poly (meth) acrylate monomer such as trimethylolpropane tri(meth) acrylate; a vinyl ester such as vinyl acetate or vinyl propionate; Ethylene, (meth) acrylate, 2-chloroethyl acrylate and the like halogenated vinyl compounds; vinyl-2- Oxazoline, 2-vinyl-5-methyl-2- Oxazoline, 2-isopropenyl-2- Oxazoline and the like Polymerizable compound of oxazoline group; polymerizable compound containing aziridine group such as (meth) acrylonitrile aziridine or 2-aziridine ethyl (meth)acrylate; allyl glycidol Ethylene ether, glycidyl (meth)acrylate, epoxy group-containing vinyl monomer such as 2-ethyl ester glycidyl (meth)acrylate; 2-hydroxyethyl (meth)acrylate, a hydroxyl group-containing vinyl monomer such as 2-hydroxypropyl methacrylate, a lactone and an addition product of 2-hydroxyethyl (meth) acrylate; in polypropylene glycol, polyethylene glycol, polytetraethylene a terminal bond of a methylene glycol, a polytetramethylene glycol, a copolymer of polyethylene glycol and polypropylene glycol, a copolymer of polytetramethylene glycol and polyethylene glycol, etc. a macromonomer of an unsaturated group such as an acrylonitrile group, a styryl group or a vinyl group; a fluorine-containing vinyl monomer such as a fluorine-substituted alkyl (meth)acrylate; maleic anhydride and itaconic anhydride; An acid group-containing monomer; an aromatic vinyl compound monomer such as styrene, α-methylstyrene or vinyl toluene; 2-chloroethyl vinyl ether, monochlorovinyl acetate Reactive halogen-containing vinyl monomers; (meth) acrylamide, N-isopropyl (meth) acrylamide, N-butyl (meth) acrylamide, N, N-di (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N-hydroxyethyl(meth)acrylamide, N-methylolpropane (meth) acrylamide, N-methoxyethyl (meth) acrylamide, N-butoxymethyl (meth) acrylamide, N-propylene fluorenyl Hydrazine-containing vinyl monomer such as porphyrin; N-(methyl) propylene oxymethylene butyl quinone imine, N-(methyl) propylene fluorenyl-6-oxy hexamethylene Butadiene imine monomer such as butadiene imine, N-(methyl)propenyl-8-oxyhexamethylenebutaneimine; N-cyclohexylmethyleneimine , N-isopropyl maleimide, N-lauryl maleimide, N-phenyl maleimide, etc., maleimide-based monomer; N -methyl Ikonide, N-ethyl Ikonide, N-butyl Ikonide, N-octyl Ikonide, N-2-ethylhexyl Iccomia Ikonide imine monomer such as amine, N-cyclohexyl Ikonium imine, N-lauryl Icinoimine; N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidine Ketone, N-vinylpyridine, N-vinylpiperidone, N-vinylpyrimidine, N-vinylpiperidone N-vinylpyrene , N-vinylpyrrole, N-vinylimidazole, N-vinyl Oxazole, N-(methyl)propenyl-2-pyrrolidone, N-(methyl)propenylpyridinium, N-(methyl)propenylpyrrolidine, N-vinyl Porphyrin, N-vinylpyrazole, N-vinyl iso Oxazole, N-vinylthiazole, N-vinylisothiazole, N-vinyl anthracene a nitrogen-containing heterocyclic monomer; N-vinyl carboxamide; an internal guanamine monomer such as N-vinyl caprolactam; a cyanoacrylate monomer such as (meth)acrylonitrile; Aminoethyl acrylate, N,N-dimethylaminoethyl (meth) acrylate, N,N-dimethylaminoethyl (meth) acrylate, third butyl (meth) acrylate Aminoalkyl (meth) acrylate monomer such as arylaminoethyl ester; quinone imine containing monomer such as cyclohexylmethyleneimine or isopropyl maleimide; Isocyanate group-containing monomer such as 2-isocyanatoethyl methacrylate; vinyl trimethoxy decane, γ-methyl propylene oxypropyl trimethoxy decane, allyl trimethoxy decane, trimethoxy An organic ruthenium-containing vinyl monomer such as alkyl propylallylamine or 2-methoxyethoxytrimethoxy decane; hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, Hydroxybutyl (meth)acrylate, hydroxyhexyl (meth)acrylate, hydroxyoctyl (meth)acrylate, hydroxydecyl (meth)acrylate, hydroxylauryl (meth)acrylate, methacrylic acid (4) -hydroxymethyl a hydroxyl group-containing monomer such as a hydroxyalkyl (meth) acrylate such as a methyl group; a tetrahydrofurfuryl (meth) acrylate, a (meth) acrylate having a fluorine atom, and a poly(oxy) (meth) acrylate. An acrylate monomer having a hetero ring, a halogen atom or a ruthenium atom; an olefin monomer such as isoprene, butadiene or isobutylene; and a vinyl ether such as methyl vinyl ether or ethyl vinyl ether. Monomer; olefin or diene such as ethylene, butadiene, isoprene, isobutylene; vinyl ethers such as vinyl alkyl ether; vinyl chloride; and free radicals at the end of the monomer obtained by polymerizing a vinyl group A macromonomer of a polymerizable vinyl group or the like. These monomers may be copolymerized with the above (meth) acrylate, either singly or in combination.

作為上述丙烯酸系低聚物,例如可列舉:甲基丙烯酸環己酯(CHMA)與甲基丙烯酸異丁酯(IBMA)之共聚物、甲基丙烯酸環己酯(CHMA)與甲基丙烯酸異酯(IBXMA)之共聚物、甲基丙烯酸甲酯(MMA)與甲基丙烯酸異酯(IBXMA)之共聚物、甲基丙烯酸環己酯(CHMA)與丙烯醯基啉(ACMO)之共聚物、甲基丙烯酸環己酯(CHMA)與二乙基丙烯醯胺(DEAA)之共聚物、丙烯酸1-金剛烷基酯(ADA)與甲基丙烯酸甲酯(MMA)之共聚物、甲基丙烯酸二環戊基酯(DCPMA)與甲基丙烯酸異酯(IBXMA)之共聚物、甲基丙烯酸二環戊 基酯(DCPMA)與甲基丙烯酸甲酯(MMA)之共聚物、甲基丙烯酸二環戊基酯(DCPMA)與N-乙烯基-2-吡咯啶酮(NVP)之共聚物、甲基丙烯酸二環戊基酯(DCPMA)與甲基丙烯酸羥基乙酯(HEMA)之共聚物、甲基丙烯酸二環戊基酯(DCPMA)與丙烯酸(AA)之共聚物、甲基丙烯酸二環戊基酯(DCPMA)、甲基丙烯酸環己酯(CHMA)、甲基丙烯酸異酯(IBXMA)、丙烯酸異酯(IBXA)、丙烯酸二環戊基酯(DCPA)、甲基丙烯酸1-金剛烷基酯(ADMA)、丙烯酸1-金剛烷基酯(ADA)、甲基丙烯酸甲酯(MMA)之各均聚物等。 Examples of the acrylic oligomer include a copolymer of cyclohexyl methacrylate (CHMA) and isobutyl methacrylate (IBMA), cyclohexyl methacrylate (CHMA) and methacrylic acid. Copolymer (IBXMA) copolymer, methyl methacrylate (MMA) and methacrylic acid Copolymer (IBXMA) copolymer, cyclohexyl methacrylate (CHMA) and acrylonitrile Copolymer of porphyrin (ACMO), copolymer of cyclohexyl methacrylate (CHMA) and diethyl acrylamide (DEAA), 1-adamantyl acrylate (ADA) and methyl methacrylate (MMA) Copolymer, dicyclopentyl methacrylate (DCPMA) and methacrylic acid Copolymer of ester (IBXMA), copolymer of dicyclopentyl methacrylate (DCPMA) and methyl methacrylate (MMA), dicyclopentyl methacrylate (DCPMA) and N-vinyl-2 a copolymer of pyrrolidone (NVP), a copolymer of dicyclopentyl methacrylate (DCPMA) and hydroxyethyl methacrylate (HEMA), dicyclopentyl methacrylate (DCPMA) and acrylic acid ( Copolymer of AA), dicyclopentyl methacrylate (DCPMA), cyclohexyl methacrylate (CHMA), methacrylic acid Ester (IBXMA), acrylic acid Ester (IBXA), dicyclopentyl acrylate (DCPA), 1-adamantyl methacrylate (ADMA), 1-adamantyl acrylate (ADA), methyl methacrylate (MMA) Polymer, etc.

進而,上述丙烯酸系低聚物亦可導入與環氧基或異氰酸酯基具有反應性之官能基。作為此種官能基之例,可列舉羥基、羧基、胺基、醯胺基、巰基,亦可於製造丙烯酸系低聚物時使用(共聚合)具有此種官能基之單體。 Further, the acrylic oligomer may be introduced with a functional group reactive with an epoxy group or an isocyanate group. Examples of such a functional group include a hydroxyl group, a carboxyl group, an amine group, a phosphonium group, and a mercapto group, and a monomer having such a functional group may be used (copolymerization) in the production of an acrylic oligomer.

於將上述丙烯酸系低聚物設為具有脂環式結構之(甲基)丙烯酸系單體與其他(甲基)丙烯酸酯單體、或共聚合性單體之共聚物之情形時,具有脂環式結構之(甲基)丙烯酸系單體之含有比率於構成丙烯酸系低聚物之全部單體中為5質量%以上,較佳為10質量%以上,更佳為20質量%以上,進而較佳為30質量%以上(通常未達100質量%,較佳為90質量%以下)。若含有5質量%以上之具有脂環式結構之(甲基)丙烯酸系單體,則可提高接著性而不降低透明性。 When the acrylic oligomer is a copolymer of a (meth)acrylic monomer having an alicyclic structure and another (meth) acrylate monomer or a copolymerizable monomer, it has a fat. The content ratio of the (meth)acrylic monomer having a ring structure is 5% by mass or more, preferably 10% by mass or more, and more preferably 20% by mass or more, based on the total of the monomers constituting the acrylic oligomer. It is preferably 30% by mass or more (usually less than 100% by mass, preferably 90% by mass or less). When the (meth)acrylic monomer having an alicyclic structure is contained in an amount of 5 mass% or more, the adhesion can be improved without lowering the transparency.

上述丙烯酸系低聚物之重量平均分子量為1000以上且未達30000,較佳為1500以上且未達20000,進而較佳為2000以上且未達10000。若重量平均分子量為30000以上,則接著性降低。又,若重量平均分子量未達1000,則成為低分子量,因此會引起表面保護膜之黏著力之降低。 The acrylic oligomer has a weight average molecular weight of 1,000 or more and less than 30,000, preferably 1,500 or more and less than 20,000, more preferably 2,000 or more and less than 10,000. When the weight average molecular weight is 30,000 or more, the adhesion is lowered. Further, when the weight average molecular weight is less than 1,000, the molecular weight is low, and thus the adhesion of the surface protective film is lowered.

作為上述丙烯酸系低聚物之調配量,相對於上述(甲基)丙烯酸系聚合物100質量份,較佳為含有0.01~10質量份,更佳為含有0.1~7質 量份,進而較佳為含有0.2~5質量份,最佳為含有0.3~2質量份。藉由以上述範圍之調配量使用,實現對被黏著體之黏著力提高,容易實現隆起之抑制,而成為較佳之態樣。 The amount of the acrylic oligomer to be added is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 7 parts by mass based on 100 parts by mass of the (meth)acrylic polymer. The amount of the component is preferably 0.2 to 5 parts by mass, more preferably 0.3 to 2 parts by mass. By using the blending amount in the above range, the adhesion to the adherend is improved, and the suppression of the bulge is easily achieved, which is a preferable aspect.

進而,於上述黏著劑組合物中亦可含有其他公知之添加劑,例如,可根據使用之用途而適當添加著色劑、顏料等之粉體、界面活性劑、塑化劑、黏著賦予劑、低分子量聚合物、表面潤滑劑、調平劑、抗氧化劑、防腐蝕劑、光穩定劑、紫外線吸收劑、聚合抑制劑、矽烷偶合劑、無機或有機之填充劑、金屬粉、粒子狀、箔狀物等。 Further, other additives may be contained in the above-mentioned adhesive composition. For example, a powder such as a coloring agent or a pigment, a surfactant, a plasticizer, an adhesion-imparting agent, and a low molecular weight may be appropriately added depending on the intended use. Polymers, surface lubricants, leveling agents, antioxidants, anticorrosives, light stabilizers, UV absorbers, polymerization inhibitors, decane coupling agents, inorganic or organic fillers, metal powders, particulates, foils, etc. .

<黏著劑層、表面保護膜> <Adhesive layer, surface protective film>

本發明之表面保護膜係於基材上形成上述黏著劑層而成者,此時,黏著劑組合物之交聯通常係於塗佈黏著劑組合物後進行,但亦可將包含交聯後之黏著劑組合物之黏著劑層轉印至基材等上。 The surface protective film of the present invention is formed by forming the above-mentioned adhesive layer on a substrate. In this case, the crosslinking of the adhesive composition is usually performed after the application of the adhesive composition, but it may also be carried out after crosslinking. The adhesive layer of the adhesive composition is transferred onto a substrate or the like.

又,於基材上形成黏著劑層之方法並無特別限制,例如,可藉由將上述黏著劑組合物(溶液)塗佈於基材上,將聚合溶劑等乾燥去除而於基材上形成黏著劑層而製作。其後,基於黏著劑層之成分轉移之調整或交聯反應之調整等目的,亦可進行熟化。又,於將黏著劑組合物塗佈於基材上而製作表面保護膜時,亦可於上述黏著劑組合物中新添加聚合溶劑以外之一種以上之溶劑,使得可均勻地塗佈於基材上。 Further, the method of forming the pressure-sensitive adhesive layer on the substrate is not particularly limited. For example, the above-mentioned pressure-sensitive adhesive composition (solution) can be applied onto a substrate, and a polymerization solvent or the like can be dried and removed to form a substrate. Made with an adhesive layer. Thereafter, aging may be performed for the purpose of adjusting the component transfer of the adhesive layer or adjusting the crosslinking reaction. Further, when the surface protective film is formed by applying the pressure-sensitive adhesive composition to a substrate, one or more solvents other than the polymerization solvent may be newly added to the pressure-sensitive adhesive composition, so that the substrate can be uniformly applied to the substrate. on.

又,作為製造本發明之表面保護膜時之黏著劑層之形成方法,可使用膠帶類之製造所使用之公知之方法。具體而言,例如可列舉:輥塗、凹版塗佈、反轉塗佈、輥刷、噴塗、氣刀塗佈法、利用模嘴塗佈機等之擠出塗佈法等。 Moreover, as a method of forming the adhesive layer in the production of the surface protective film of the present invention, a known method for producing a tape can be used. Specific examples thereof include roll coating, gravure coating, reverse coating, roll brushing, spray coating, air knife coating, and extrusion coating using a die coater.

本發明之表面保護膜通常以上述黏著劑層之厚度成為3~100μm、較佳為5~50μm左右之方式製作。若黏著劑層之厚度為上述範圍內,則容易獲得適度之再剝離性與接著性之平衡,故而較佳。 The surface protective film of the present invention is usually produced in such a manner that the thickness of the above-mentioned adhesive layer is from 3 to 100 μm, preferably from about 5 to 50 μm. When the thickness of the adhesive layer is within the above range, it is easy to obtain a balance between moderate removability and adhesion, which is preferable.

又,本發明之表面保護膜之總厚度較佳為1~400μm,更佳為10 ~200μm,最佳為20~100μm。若為上述範圍內,則黏著特性(再剝離性、接著性等)、作業性、外觀特性優異,而成為較佳之態樣。再者,上述所謂總厚度意指包括基材、黏著劑層、防靜電層等全部層之厚度之合計。 Further, the total thickness of the surface protective film of the present invention is preferably from 1 to 400 μm, more preferably 10 ~200μm, preferably 20~100μm. When it is in the above range, the adhesive properties (removability, adhesion, and the like), workability, and appearance characteristics are excellent, which is a preferable aspect. Incidentally, the above-mentioned total thickness means a total of thicknesses of all layers including a substrate, an adhesive layer, and an antistatic layer.

<隔片> <separator>

於本發明之表面保護膜中,視需要可為了保護黏著面而於黏著劑層表面貼合隔片。 In the surface protective film of the present invention, a spacer may be attached to the surface of the adhesive layer in order to protect the adhesive surface as needed.

作為構成上述隔片之材料,有紙或塑膠膜,就表面平滑性優異之方面而言,較佳為使用塑膠膜。作為該膜,只要為可保護上述黏著劑層之膜,則無特別限定,例如可列舉:聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、聚氯乙烯膜、氯乙烯共聚物膜、聚對苯二甲酸乙二酯膜、聚對苯二甲酸丁二酯膜、聚胺基甲酸酯膜、乙烯-乙酸乙烯酯共聚物膜等。 As the material constituting the separator, there is a paper or a plastic film, and in terms of excellent surface smoothness, a plastic film is preferably used. The film is not particularly limited as long as it is a film that can protect the pressure-sensitive adhesive layer, and examples thereof include a polyethylene film, a polypropylene film, a polybutene film, a polybutadiene film, and a polymethylpentene film. A polyvinyl chloride film, a vinyl chloride copolymer film, a polyethylene terephthalate film, a polybutylene terephthalate film, a polyurethane film, an ethylene-vinyl acetate copolymer film, or the like.

上述隔片之厚度通常為5~200μm,較佳為10~100μm左右。若為上述範圍內,則向黏著劑層之貼合作業性與自黏著劑層之剝離作業性優異,故而較佳。對上述隔片,亦可視需要而進行使用聚矽氧系、氟系、長鏈烷基系或脂肪醯胺系之脫模劑、二氧化矽粉末等之脫模及防污處理、或塗佈型、混練型、蒸鍍型等之防靜電處理。 The thickness of the separator is usually 5 to 200 μm, preferably about 10 to 100 μm. When it is in the above range, the adhesion to the adhesive layer and the workability of the self-adhesive layer are excellent, which is preferable. The release sheet may be subjected to mold release, antifouling treatment, or coating using a polyfluorene-based, fluorine-based, long-chain alkyl-based or fatty amide-based release agent, cerium oxide powder or the like as needed. Antistatic treatment of type, kneading type, vapor deposition type, etc.

本發明之光學構件較佳為由上述表面保護膜所保護。上述表面保護膜之防靜電性與剝離靜電壓之經時穩定性優異,故而可用於加工、搬送、出貨時等之表面保護用途(表面保護膜),因此對於保護上述光學構件(偏光板等)之表面有用。尤其可用於容易產生靜電之塑膠製品等,因此於靜電成為尤其嚴重之問題之光學、電子零件相關之技術領域,對於防靜電用途非常有用。 The optical member of the present invention is preferably protected by the above surface protective film. Since the surface protective film has excellent antistatic property and peeling static voltage stability over time, it can be used for surface protection applications (surface protective film) such as processing, transportation, and shipment, and therefore protects the optical member (polarizing plate, etc.). The surface is useful. In particular, it can be used for a plastic product or the like which is likely to generate static electricity. Therefore, it is very useful for antistatic use in the technical field related to optical and electronic parts where static electricity is a particularly serious problem.

[實施例] [Examples]

以下,對與本發明相關之若干實施例加以說明,但並無意將本 發明限定於該具體例所示者。再者,只要無特別聲明,則以下說明中之「份」及「%」為質量基準。又,表中之調配量(添加量)表示固形物成分或固形物成分比。 Hereinafter, some embodiments related to the present invention will be described, but it is not intended to The invention is limited to those shown in this specific example. In addition, as long as there is no special statement, the "parts" and "%" in the following descriptions are the quality standards. Further, the blending amount (addition amount) in the table indicates the ratio of the solid content or the solid content.

又,以下說明中之各特性係分別以如下方式進行測定或評價。 Moreover, each characteristic in the following description is measured or evaluated as follows.

<重量平均分子量(Mw)之測定> <Measurement of Weight Average Molecular Weight (Mw)>

重量平均分子量(Mw)係使用東曹股份有限公司製造之GPC裝置(HLC-8220GPC)進行測定。測定條件如下所述。 The weight average molecular weight (Mw) was measured using a GPC apparatus (HLC-8220GPC) manufactured by Tosoh Corporation. The measurement conditions are as follows.

樣品濃度:0.2質量%(THF溶液) Sample concentration: 0.2% by mass (THF solution)

樣品注入量:10μl Sample injection amount: 10μl

溶離液:THF Dissolution: THF

流速:0.6ml/min Flow rate: 0.6ml/min

測定溫度:40℃ Measuring temperature: 40 ° C

管柱:樣品管柱:TSKguardcolumn Super HZ-H(1根)+TSKgel Super HZM-H(2根) Column: Sample column: TSKguardcolumn Super HZ-H (1) + TSKgel Super HZM-H (2)

參考管柱:TSKgel Super H-RC(1根) Reference column: TSKgel Super H-RC (1 root)

檢測器:示差折射計(RI) Detector: Differential Refractometer (RI)

再者,重量平均分子量係藉由聚苯乙烯換算值而求出。 Further, the weight average molecular weight is determined by a value in terms of polystyrene.

<玻璃轉移溫度(Tg)> <glass transition temperature (Tg)>

玻璃轉移溫度Tg(℃)係使用下述之文獻值作為各單體之均聚物之玻璃轉移溫度Tgn(℃),並藉由下述式(18)而求出。 The glass transition temperature Tg (° C.) is obtained by using the following literature value as the glass transition temperature Tgn (° C.) of the homopolymer of each monomer, and is obtained by the following formula (18).

式(18):1/(Tg+273)=Σ[Wn/(Tgn+273)] Equation (18): 1/(Tg+273)=Σ[Wn/(Tgn+273)]

[式中,Tg(℃)表示共聚物之玻璃轉移溫度,Wn(-)表示各單體之重量分率,Tgn(℃)表示各單體之均聚物之玻璃轉移溫度,n表示各單體之種類] Wherein Tg(°C) represents the glass transition temperature of the copolymer, Wn(-) represents the weight fraction of each monomer, Tgn (°C) represents the glass transition temperature of the homopolymer of each monomer, and n represents each single Type of body]

文獻值: 丙烯酸2-乙基己酯(2EHA):-70℃ Literature value: 2-ethylhexyl acrylate (2EHA): -70 ° C

丙烯酸4-羥基丁酯(4HBA):-32℃ 4-hydroxybutyl acrylate (4HBA): -32 ° C

丙烯酸2-羥基乙酯(HEA):-15℃ 2-hydroxyethyl acrylate (HEA): -15 ° C

丙烯酸(AA):106℃ Acrylic acid (AA): 106 ° C

再者,作為文獻值,參考「丙烯酸系樹脂之合成、設計與新用途展開」(中央經營開發中心出版部發行)及「Polymer Handbook」(John Wiley & Sons)。 In addition, as a literature value, reference is made to "Synthesis, design, and new use of acrylic resin" (issued by the Central Business Development Center Publishing Department) and "Polymer Handbook" (John Wiley & Sons).

<表面電阻值之測定> <Measurement of surface resistance value>

於溫度23℃、濕度50%RH之環境下,使用電阻率計(三菱化學ANALYTECH製造,Hiresta UP MCP-HT450型),依照JIS-K-6911進行測定。 The measurement was carried out in accordance with JIS-K-6911 using a resistivity meter (manufactured by Mitsubishi Chemical Corporation, manufactured by Mitsubishi Chemical Corporation, Hiresta UP MCP-HT450) under an environment of a temperature of 23 ° C and a humidity of 50% RH.

再者,作為本發明中之表面電阻值(Ω/□),初期及於室溫(23℃×50%RH)下靜置1週(7天)之情形均較佳為未達1.0×1011,更佳為未達5.0×1010,進而較佳為未達1.0×1010。顯示上述範圍內之表面電阻值之表面保護膜可較佳地用作例如液晶單元或半導體裝置等般避忌靜電之物品之加工或搬送過程等中所使用之表面保護膜。 Further, as the surface resistance value (Ω/□) in the present invention, the initial period and the standing at room temperature (23 ° C × 50% RH) for one week (7 days) are preferably less than 1.0 × 10 11 is more preferably less than 5.0 × 10 10 , and further preferably less than 1.0 × 10 10 . The surface protective film which exhibits the surface resistance value in the above range can be preferably used as a surface protective film used in processing or transporting of articles such as liquid crystal cells or semiconductor devices.

<偏光板剝離靜電壓(偏光板側)之測定> <Measurement of polarizing plate peeling static voltage (polarizing plate side)>

將各例之表面保護膜1切割為寬70mm、長130mm之尺寸,將剝離襯墊剝離後,如圖2所示,以表面保護膜1之其中一端部自偏光板20一端伸出30mm之方式,藉由手壓輥壓合於貼合於預先去靜電之丙烯酸板10(Mitsubishi Rayon公司製造,商品名「Acrylite」,厚度:1mm,寬度:70mm,長度:100mm)上之偏光板20(日東電工公司製造,SEG1423DU偏光板,寬度:70mm,長度:100mm)之表面。 The surface protective film 1 of each example was cut into a size of 70 mm in width and 130 mm in length, and after peeling off the release liner, as shown in FIG. 2, one end portion of the surface protective film 1 was extended from the end of the polarizing plate 20 by 30 mm. , by a hand press roll, a polarizing plate 20 bonded to a pre-decomposed acrylic plate 10 (manufactured by Mitsubishi Rayon Co., Ltd., trade name "Acrylite", thickness: 1 mm, width: 70 mm, length: 100 mm) Surface manufactured by Electrician Company, SEG1423DU polarizing plate, width: 70mm, length: 100mm).

將該樣品於23℃×50%RH之環境下放置1天後,設置於高20mm之樣品固定台30之特定位置。將自偏光板20伸出30mm之表面保護膜1之端部固定於自動捲取機(未圖示)上,以剝離角度成為150°、剝離速 度成為10m/min之方式進行剝離。藉由固定於距偏光板20之中央高100mm之位置之電位測定機40(春日電機公司製造,型式「KSD-0103」)測定此時產生之被黏著體(偏光板)表面之電位作為「初期之偏光板剝離靜電壓」。測定係於23℃、50%RH之環境下進行。 The sample was allowed to stand in an environment of 23 ° C × 50% RH for one day, and then placed at a specific position of the sample fixing table 30 having a height of 20 mm. The end portion of the surface protective film 1 extending from the polarizing plate 20 by 30 mm is fixed to an automatic winder (not shown) so that the peeling angle becomes 150° and the peeling speed is set. Peeling was performed in such a manner that the degree became 10 m/min. The potential of the surface of the adherend (polarizing plate) generated at this time was measured as an "initial" by the potential measuring machine 40 (model "KSD-0103" manufactured by Kasuga Electric Co., Ltd.) which is fixed at a position 100 mm higher than the center of the polarizing plate 20. The polarizing plate peels off the static voltage." The measurement was carried out in an environment of 23 ° C and 50% RH.

又,於23℃×50%RH之環境下放置7天後,以與「初期之偏光板剝離靜電壓」同樣之方式測定「經時之偏光板剝離靜電壓」。測定係於23℃×50%RH之環境下進行。 In addition, after leaving it for 7 days in an environment of 23 ° C × 50% RH, the "polarized plate peeling static voltage over time" was measured in the same manner as in the "initial polarizing plate peeling static voltage". The measurement was carried out in an environment of 23 ° C × 50% RH.

再者,所謂偏光板剝離靜電壓係來自構成本發明之表面保護膜之防靜電層及黏著劑層之剝離靜電壓,有助於防靜電性。 Further, the polarizing plate peeling static voltage is derived from the peeling static voltage of the antistatic layer and the adhesive layer constituting the surface protective film of the present invention, and contributes to antistatic property.

作為本發明之偏光板剝離靜電壓(kV)(初期及經時均為絕對值),較佳為0.8以下,更佳為0.7以下,進而較佳為0.5以下。若為上述範圍內,則例如可防止液晶驅動器等之損傷,而成為較佳之態樣。 The polarizing plate peeling static voltage (kV) (initial and transit time is an absolute value) of the present invention is preferably 0.8 or less, more preferably 0.7 or less, still more preferably 0.5 or less. If it is in the above range, for example, it is possible to prevent damage of the liquid crystal driver or the like, and it is preferable.

<膜側剝離靜電壓(表面保護膜之防靜電層側)之測定> <Measurement of film side peeling static voltage (antistatic layer side of surface protective film)>

以與上述偏光板剝離靜電壓之測定相同之方式,以成為剝離角度150°、剝離速度10m/min之方式將表面保護膜1自偏光板20之表面剝離。藉由固定於距該表面保護膜1之中央高100mm之位置之電位測定機40(春日電機公司製造,型式「KSD-0103」)測定此時產生之表面保護膜1之電位作為「初期之膜側剝離靜電壓」。測定係於23℃、50%RH之環境下進行。 The surface protective film 1 was peeled off from the surface of the polarizing plate 20 so as to have a peeling angle of 150° and a peeling speed of 10 m/min, in the same manner as the measurement of the peeling static voltage of the polarizing plate. The potential of the surface protective film 1 generated at this time was measured by the potential measuring machine 40 (model "KSD-0103" manufactured by Kasuga Electric Co., Ltd.) which was fixed at a position 100 mm higher than the center of the surface protective film 1 as the "initial film". Side peeling static voltage". The measurement was carried out in an environment of 23 ° C and 50% RH.

又,於23℃×50%RH之環境下放置7天後,以與「初期之偏光板剝離靜電壓」相同之方式測定「經時之偏光板剝離靜電壓」。測定係於23℃×50%RH之環境下進行。 Further, after standing for 7 days in an environment of 23 ° C × 50% RH, the "polarization plate peeling static voltage over time" was measured in the same manner as in "initial polarizing plate peeling static voltage". The measurement was carried out in an environment of 23 ° C × 50% RH.

再者,所謂膜側剝離靜電壓係來自構成本發明之表面保護膜之防靜電層之剝離靜電壓,有助於防靜電性。 Further, the film side peeling static voltage is derived from the peeling static voltage of the antistatic layer constituting the surface protective film of the present invention, and contributes to antistatic property.

作為本發明之膜側剝離靜電壓(kV)(初期及經時均為絕對值),較佳為0.8以下,更佳為0.7以下,進而較佳為0.5以下。若為上述範圍 內,則剝離後之表面保護膜不帶電,作業性優異,故而成為較佳之態樣。 The film side peeling static voltage (kV) (initial and time-lapse absolute values) of the present invention is preferably 0.8 or less, more preferably 0.7 or less, still more preferably 0.5 or less. If it is the above range In the inside, the surface protective film after peeling is not charged, and the workability is excellent, so that it is preferable.

<滑動性(動摩擦力)之測定> <Measurement of slidability (dynamic friction)>

將表面保護膜切割為寬70mm、長100mm之尺寸,貼合至丙烯酸板(Mitsubishi Rayon公司製造,商品名「Acrylite」,厚度:1mm,寬度:70mm,長度:100mm)上而準備試片。以該試片之背面(防靜電層表面)朝下放置於保持為水平之平滑之PET膜上,於該試片上負載荷重1.5kg。使用無伸縮性之線將上述負載有荷重之試片安裝於拉力試驗機上,於測定溫度25℃下,以拉伸速度300mm/min、拉伸距離300mm之條件將試片水平拉伸,求出施加於試片上之動摩擦力(N)之平均值(n=3)。 The surface protective film was cut into a size of 70 mm in width and 100 mm in length, and bonded to an acrylic plate (manufactured by Mitsubishi Rayon Co., Ltd., trade name "Acrylite", thickness: 1 mm, width: 70 mm, length: 100 mm) to prepare a test piece. The back surface of the test piece (the surface of the antistatic layer) was placed downward on a smooth PET film which was kept horizontal, and a load of 1.5 kg was applied to the test piece. The test piece loaded with the load was mounted on a tensile tester using a non-stretchable wire, and the test piece was horizontally stretched at a measurement temperature of 25 ° C at a tensile speed of 300 mm/min and a tensile distance of 300 mm. The average value (n=3) of the dynamic frictional force (N) applied to the test piece.

再者,作為本發明中之滑動性(動摩擦力)(N),較佳為5以下,更佳為4.5以下,進而較佳為4以下。若為上述範圍內,則於處理貼附有表面保護膜之被黏著體時,基材背面(防靜電層表面)之滑動性良好,就作業性之方面而言有利。 Further, the slidability (dynamic frictional force) (N) in the present invention is preferably 5 or less, more preferably 4.5 or less, still more preferably 4 or less. When it is in the above range, when the adherend to which the surface protective film is attached is treated, the slidability of the back surface of the substrate (the surface of the antistatic layer) is good, which is advantageous in terms of workability.

<印字性(印字密接性)之評價> <Evaluation of printing (printing adhesion)>

於23℃×50%RH之測定環境下使用Shachihata公司製造之X壓模,於防靜電層表面上實施印字後,自該印字上方貼附Nichiban公司製造之Sellotape(註冊商標),繼而以剝離速度30m/min、剝離角度180°之條件進行剝離。其後,目視觀察剝離後之表面,將印字面積被剝離50%以上之情形評價為×(印字性不良),將印字面積之50%以上未被剝離而殘留之情形評價為○(印字性良好)。 After printing on the surface of the antistatic layer using an X stamper manufactured by Shachihata Co., Ltd. under the measurement environment of 23 ° C × 50% RH, attached Sellotape (registered trademark) manufactured by Nichiban Co., Ltd., and then peeling speed. Peeling was carried out under conditions of 30 m/min and a peeling angle of 180°. Then, the surface after the peeling was visually observed, and the case where the printing area was peeled off by 50% or more was evaluated as × (printing failure), and 50% or more of the printing area was not peeled off and remained as ○ (printing property was good) ).

<黏著劑層用丙烯酸系聚合物(I)之製備> <Preparation of Acrylic Polymer (I) for Adhesive Layer>

於具備攪拌翼、溫度計、氮氣導入管、冷卻器之四口燒瓶中,加入丙烯酸2-乙基己酯(2EHA)100質量份、丙烯酸4-羥基丁酯(4HBA)10質量份、丙烯酸(AA)0.02質量份、作為聚合起始劑之2,2'-偶 氮二異丁腈0.2質量份、乙酸乙酯157質量份,一面緩慢攪拌一面導入氮氣,將燒瓶內之液溫保持於65℃附近而進行6小時之聚合反應,從而製備丙烯酸系聚合物(I)溶液(40質量%)。上述丙烯酸系聚合物(I)之重量平均分子量為54萬,玻璃轉移溫度(Tg)為-67℃。 To a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, 100 parts by mass of 2-ethylhexyl acrylate (2EHA), 10 parts by mass of 4-hydroxybutyl acrylate (4HBA), and acrylic acid (AA) were added. 0.02 parts by mass of 2,2'-couple as a polymerization initiator 0.2 parts by mass of nitrogen diisobutyronitrile and 157 parts by mass of ethyl acetate, nitrogen gas was introduced while stirring slowly, and the liquid temperature in the flask was maintained at around 65 ° C for 6 hours to prepare an acrylic polymer (I). ) solution (40% by mass). The acrylic polymer (I) had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -67 °C.

<黏著劑層用丙烯酸系聚合物(II)之製備> <Preparation of Acrylic Polymer (II) for Adhesive Layer>

於具備攪拌翼、溫度計、氮氣導入管、冷卻器之四口燒瓶中,加入丙烯酸2-乙基己酯(2EHA)100質量份、丙烯酸2-羥基乙酯(HEA)4質量份、作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份、乙酸乙酯157質量份,一面緩慢攪拌一面導入氮氣,將燒瓶內之液溫保持於65℃附近而進行6小時之聚合反應,從而製備丙烯酸系聚合物(II)溶液(40質量%)。上述丙烯酸系聚合物(II)之重量平均分子量為54萬,玻璃轉移溫度(Tg)為-68℃。 Into a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, 100 parts by mass of 2-ethylhexyl acrylate (2EHA) and 4 parts by mass of 2-hydroxyethyl acrylate (HEA) were added as a polymerization. 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a starting agent and 157 parts by mass of ethyl acetate, and nitrogen gas was introduced while slowly stirring, and the liquid temperature in the flask was maintained at around 65 ° C for 6 hours. Thus, an acrylic polymer (II) solution (40% by mass) was prepared. The acrylic polymer (II) had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -68 °C.

<黏著劑層用丙烯酸系聚合物(III)之製備> <Preparation of Acrylic Polymer (III) for Adhesive Layer>

於具備攪拌翼、溫度計、氮氣導入管、冷卻器之四口燒瓶中,加入丙烯酸2-乙基己酯(2EHA)100質量份、丙烯酸4-羥基丁酯(4HBA)10質量份、丙烯酸(AA)0.05質量份、作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份、乙酸乙酯157質量份,一面緩慢攪拌一面導入氮氣,將燒瓶內之液溫保持於65℃附近而進行6小時之聚合反應,從而製備丙烯酸系聚合物(III)溶液(40質量%)。上述丙烯酸系聚合物(III)之重量平均分子量為54萬,玻璃轉移溫度(Tg)為-67℃。 To a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, 100 parts by mass of 2-ethylhexyl acrylate (2EHA), 10 parts by mass of 4-hydroxybutyl acrylate (4HBA), and acrylic acid (AA) were added. 0.05 parts by mass of 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator, and 157 parts by mass of ethyl acetate, and nitrogen gas was introduced while stirring slowly, and the temperature in the flask was maintained at 65 ° C. A polymerization reaction was carried out for 6 hours in the vicinity to prepare an acrylic polymer (III) solution (40% by mass). The acrylic polymer (III) had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -67 °C.

<黏著劑層用丙烯酸系聚合物(IV)之製備> <Preparation of Acrylic Polymer (IV) for Adhesive Layer>

於具備攪拌翼、溫度計、氮氣導入管、冷卻器之四口燒瓶中,加入丙烯酸2-乙基己酯(2EHA)100質量份、丙烯酸4-羥基丁酯(4HBA)10質量份、丙烯酸(AA)0.1質量份、作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份、乙酸乙酯157質量份,一面緩慢攪拌一面導入氮氣,將燒瓶內之液溫保持於65℃附近而進行6小時之聚合反應,從 而製備丙烯酸系聚合物(IV)溶液(40質量%)。上述丙烯酸系聚合物(IV)之重量平均分子量為54萬,玻璃轉移溫度(Tg)為-67℃。 To a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, 100 parts by mass of 2-ethylhexyl acrylate (2EHA), 10 parts by mass of 4-hydroxybutyl acrylate (4HBA), and acrylic acid (AA) were added. 0.1 parts by mass of 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator, and 157 parts by mass of ethyl acetate, and nitrogen gas was introduced while stirring slowly, and the temperature in the flask was maintained at 65 ° C. 6 hours of polymerization in the vicinity, from Further, an acrylic polymer (IV) solution (40% by mass) was prepared. The acrylic polymer (IV) had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -67 °C.

[丙烯酸系低聚物之製備] [Preparation of Acrylic Oligomers]

向具備攪拌翼、溫度計、氮氣導入管、冷卻器、滴液漏斗之四口燒瓶中,投入甲苯100質量份、甲基丙烯酸二環戊基酯(DCPMA)(商品名:FA-513M,日立化成工業公司製造)60質量份、甲基丙烯酸甲酯(MMA)40質量份及作為鏈轉移劑之巰基乙酸甲酯3.5質量份。然後,於70℃、氮氣環境下攪拌1小時後,投入作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份,於70℃下反應2小時,繼而於80℃下反應4小時後,於90℃下反應1小時,從而獲得丙烯酸系低聚物溶液(51質量%)。上述丙烯酸系低聚物之重量平均分子量為4000,玻璃轉移溫度(Tg)為144℃。 Into a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, a cooler, and a dropping funnel, 100 parts by mass of toluene and dicyclopentyl methacrylate (DCPMA) (trade name: FA-513M, Hitachi Chemical Co., Ltd.) were charged. 60 parts by mass, 40 parts by mass of methyl methacrylate (MMA) and 3.5 parts by mass of methyl thioglycolate as a chain transfer agent. Then, after stirring at 70 ° C for 1 hour in a nitrogen atmosphere, 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator was introduced, and the reaction was carried out at 70 ° C for 2 hours, followed by reaction at 80 ° C. After 4 hours, the reaction was carried out at 90 ° C for 1 hour to obtain an acrylic oligomer solution (51% by mass). The acrylic oligomer had a weight average molecular weight of 4,000 and a glass transition temperature (Tg) of 144 °C.

[丙烯酸系黏著劑溶液(A)之製備] [Preparation of Acrylic Adhesive Solution (A)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3.5質量份(固形物成分3.5質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(A)。 The acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and hexamethylene group as a crosslinking agent was added to 500 parts by mass of the solution (100 parts by mass of the solid content). 3.5 parts by mass of a diisocyanate isocyanurate body (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (3.5 parts by mass of a solid component), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst 3 parts by mass (0.03 parts by mass of the solid content) was mixed and stirred to prepare an acrylic pressure-sensitive adhesive solution (A).

[丙烯酸系黏著劑溶液(B)之製備] [Preparation of Acrylic Adhesive Solution (B)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分 0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3.5質量份(固形物成分3.5質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(B)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and an alkali metal salt of bis(trifluoroethylene) as an antistatic agent using ethyl acetate Methanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content: 0.15 parts by mass) as a crosslinking agent 3.5 parts by mass of an isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (3.5 parts by mass of solid content), and dibutyltin dilaurate (1% by mass) as a crosslinking catalyst 3 parts by mass of the ethyl acetate solution (0.03 parts by mass of the solid content) was mixed and stirred to prepare an acrylic adhesive solution (B).

[丙烯酸系黏著劑溶液(C)之製備] [Preparation of Acrylic Adhesive Solution (C)]

利用乙酸乙酯將上述丙烯酸系聚合物(II)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3.5質量份(固形物成分3.5質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(C)。 The acrylic polymer (II) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and hexamethylene group as a crosslinking agent was added to 500 parts by mass of the solution (100 parts by mass of the solid content). 3.5 parts by mass of a diisocyanate isocyanurate body (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (3.5 parts by mass of a solid component), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst 3 parts by mass (0.03 parts by mass of the solid content) was mixed and stirred to prepare an acrylic adhesive solution (C).

[丙烯酸系黏著劑溶液(D)之製備] [Preparation of Acrylic Adhesive Solution (D)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即離子性液體之1-乙基-3-甲基咪唑鎓雙(三氟甲磺醯)亞胺(EMITFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)2質量份(固形物成分2質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(D)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and 1-ethyl group as an antistatic agent, i.e., an ionic liquid, using ethyl acetate 5-methylimidazolium bis(trifluoromethanesulfonate)imide (EMITFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content of 0.15 parts by mass) as a crosslinking agent 2 parts by mass of the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (solid content: 2 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane (manufactured by Mitsui Chemicals, Takenate 600) 0.3 parts by mass (solid content: 0.3 parts by mass), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst, 3 parts by mass (solid content 0.03 mass) The mixture was stirred and mixed to prepare an acrylic adhesive solution (D).

[丙烯酸系黏著劑溶液(E)之製備] [Preparation of Acrylic Adhesive Solution (E)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即離子性液體之1-乙基-3-甲基咪唑鎓雙(氟磺醯)亞胺(EMIFSI,第一工業製藥公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)2質量份(固形物成分2質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(E)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and 1-ethyl group as an antistatic agent, i.e., an ionic liquid, using ethyl acetate 5-methylimidazolium bis(fluorosulfonyl)imide (EMIFSI, manufactured by Dai-Il Pharmaceutical Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content of 0.15 parts by mass) as a crosslinking agent 2 parts by mass of the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (solid content: 2 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane ( Manufactured by Mitsui Chemicals Co., Ltd., Takenate 600) 0.3 parts by mass (solid content: 0.3 parts by mass), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst, 3 parts by mass (solid content: 0.03 parts by mass) And mixing and stirring to prepare an acrylic adhesive solution (E).

[丙烯酸系黏著劑溶液(F)之製備] [Preparation of Acrylic Adhesive Solution (F)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即離子性液體之1-乙基-3-甲基咪唑鎓三氟甲磺酸鹽(EMITFS,第一工業製藥公司製造)稀釋至1%而成之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)2質量份(固形物成分2質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(F)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and 1-ethyl group as an antistatic agent, i.e., an ionic liquid, using ethyl acetate 15-Methylimidazolium trifluoromethanesulfonate (EMITFS, manufactured by First Industrial Pharmaceutical Co., Ltd.) diluted to 1% of a solution of 15 parts by mass (solid content of 0.15 parts by mass), as a crosslinking agent 2 parts by mass of methyl isocyanate isocyanurate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (solid content: 2 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane (Mitsui Chemicals) Made by the company, Takenate 600) 0.3 parts by mass (solid content: 0.3 parts by mass), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst, 3 parts by mass (solid content: 0.03 parts by mass), The mixture was stirred and mixed to prepare an acrylic adhesive solution (F).

[丙烯酸系黏著劑溶液(G)之製備] [Preparation of Acrylic Adhesive Solution (G)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-6004,信越化學工業公司製造)稀釋至1%而獲得之溶液20質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即離子性液體之1-丁基-3-甲基吡啶鎓雙(三氟甲磺醯)亞胺(BMPTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之三羥甲基丙烷/甲苯二異氰酸酯之三聚物加成物(日本聚氨酯工業公司製造,Coronate L)3質量份(固形物成分3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(G)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl 20 parts by mass of a solution obtained by diluting to 1% of an alkane (KF-6004, manufactured by Shin-Etsu Chemical Co., Ltd.) (0.2 parts by mass of a solid content), and 1-butyl group as an antistatic agent, that is, an ionic liquid, using ethyl acetate 3-5-methylpyridinium bis(trifluoromethanesulfonate)imide (BMPTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content: 0.15 parts by mass) as a crosslinking agent 3 parts by mass of a trimer adduct of trimethylolpropane/toluene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate L) (solid content: 3 parts by mass), dibutyltin dilaurate as a crosslinking catalyst (1 mass% of ethyl acetate solution) 3 parts by mass (0.03 parts by mass of the solid content), and the mixture was stirred and mixed to prepare an acrylic pressure-sensitive adhesive solution (G).

[丙烯酸系黏著劑溶液(H)之製備] [Preparation of Acrylic Adhesive Solution (H)]

利用乙酸乙酯將上述丙烯酸系聚合物(III)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液4質量份(固形物成分0.4質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液30質量份(固形物成分0.3質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3質量份(固形物成分3質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(H)。 The acrylic polymer (III) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 4 parts by mass of a solution (solid content 0.4 parts by mass), and an alkali metal salt bis (trifluoroethylene) as an antistatic agent using ethyl acetate Methanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 30 parts by mass of a solution (solid content: 0.3 parts by mass), as a crosslinking agent 3 parts by mass of the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (solid content: 3 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane ( Manufactured by Mitsui Chemicals Co., Ltd., Takenate 600) 0.3 parts by mass (solid content: 0.3 parts by mass), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst, 3 parts by mass (solid content: 0.03 parts by mass) And mixing and stirring to prepare an acrylic adhesive solution (H).

[丙烯酸系黏著劑溶液(I)之製備] [Preparation of Acrylic Adhesive Solution (I)]

利用乙酸乙酯將上述丙烯酸系聚合物(IV)溶液(40質量%)稀釋至 20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液4質量份(固形物成分0.4質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液30質量份(固形物成分0.3質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3質量份(固形物成分3質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.5質量份(固形物成分0.5質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(I)。 The above acrylic polymer (IV) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl oxide by using ethyl acetate. Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 4 parts by mass of a solution (solid content 0.4 parts by mass), and an alkali metal salt bis (trifluoroethylene) as an antistatic agent using ethyl acetate Methanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 30 parts by mass of a solution (solid content: 0.3 parts by mass), as a crosslinking agent 3 parts by mass of the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (solid content: 3 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane ( Manufactured by Mitsui Chemicals Co., Ltd., Takenate 600) 0.5 parts by mass (0.5 parts by mass of solid content), 3 parts by mass of dibutyltin dilaurate (1% by mass ethyl acetate solution) as cross-linking catalyst (solid content 0.03 parts by mass) And mixing and stirring to prepare an acrylic adhesive solution (I).

[丙烯酸系黏著劑溶液(J)之製備] [Preparation of Acrylic Adhesive Solution (J)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3.5質量份(固形物成分3.5質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之乙醯丙酮酸鐵(III)(1質量%乙酸乙酯溶液)0.5質量份(固形物成分0.005質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(J)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and an alkali metal salt of bis(trifluoroethylene) as an antistatic agent using ethyl acetate Methanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content: 0.15 parts by mass) as a crosslinking agent 3.5 parts by mass of the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) (3.5 parts by mass of the solid component) and 1,3-bis(isocyanatemethyl)cyclohexane ( Manufactured by Mitsui Chemicals Co., Ltd., Takenate 600) 0.3 parts by mass (solid content: 0.3 parts by mass), as a crosslinking catalyst, iron(III) pyruvate (1% by mass ethyl acetate solution) 0.5 parts by mass (solid content 0.005 parts by mass), and mixing and stirring were carried out to prepare an acrylic adhesive solution (J).

[丙烯酸系黏著劑溶液(K)之製備] [Preparation of Acrylic Adhesive Solution (K)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20 質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(x-22-6266,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3質量份(固形物成分3質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(K)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl oxide by using ethyl acetate. Alkane (x-22-6266, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and an alkali metal salt as an antistatic agent using ethyl acetate ( Trifluoromethanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% and obtained 15 parts by mass of a solution (solid content: 0.15 parts by mass) as cross-linking The isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., Coronate HX) 3 parts by mass (solid content: 3 parts by mass) and 1,3-bis(isocyanatemethyl)cyclohexane 0.3 parts by mass (solid content: 0.3 parts by mass) of alkane (manufactured by Mitsui Chemicals, Inc., Takenate 600), dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst, 3 parts by mass (solid content 0.03) The mass part) was mixed and stirred to prepare an acrylic adhesive solution (K).

[丙烯酸系黏著劑溶液(L)之製備] [Preparation of Acrylic Adhesive Solution (L)]

利用乙酸乙酯將上述丙烯酸系聚合物(I)溶液(40質量%)稀釋至20質量%,於該溶液500質量份(固形物成分100質量份)中添加利用乙酸乙酯將有機聚矽氧烷(KF-353,信越化學工業公司製造)稀釋至10%而獲得之溶液2質量份(固形物成分0.2質量份)、利用乙酸乙酯將作為防靜電劑即鹼金屬鹽之雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)稀釋至1%而獲得之溶液15質量份(固形物成分0.15質量份)、利用乙酸乙酯將上述丙烯酸系低聚物溶液稀釋至10質量%而獲得之溶液5質量份(固形物成分0.5質量份)、作為交聯劑之六亞甲基二異氰酸酯之異氰脲酸酯體(日本聚氨酯工業公司製造,Coronate HX)3.5質量份(固形物成分3.5質量份)及1,3-雙(異氰酸酯基甲基)環己烷(三井化學公司製造,Takenate 600)0.3質量份(固形物成分0.3質量份)、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份),並進行混合攪拌,從而製備丙烯酸系黏著劑溶液(L)。 The above acrylic polymer (I) solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 500 parts by mass of the solution (100 parts by mass of the solid content) was added to the organic polyoxyl Alkane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) diluted to 10% to obtain 2 parts by mass of a solution (0.2 parts by mass of solid content), and an alkali metal salt of bis(trifluoroethylene) as an antistatic agent using ethyl acetate Methanesulfonate) Lithium imide (LiN(CF 3 SO 2 ) 2 : LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) diluted to 1% to obtain 15 parts by mass of a solution (solid content: 0.15 parts by mass), using ethyl acetate 5 parts by mass of the solution obtained by diluting the above acrylic oligomer solution to 10% by mass (0.5 parts by mass of the solid content), and an isocyanurate body of hexamethylene diisocyanate as a crosslinking agent (Japanese polyurethane industry) Co., Ltd., Coronate HX) 3.5 parts by mass (3.5 parts by mass of solid content) and 1,3-bis(isocyanatemethyl)cyclohexane (manufactured by Mitsui Chemicals, Takenate 600) 0.3 parts by mass (solid content 0.3 mass) a part of dibutyltin dilaurate (1 mass% acetic acid) as a cross-linking catalyst Ester solution) 3 parts by mass (0.03 parts by mass of solid content), mixing and stirring, to prepare an acrylic adhesive solution (L).

[胺基甲酸酯系黏著劑溶液(M)之製備] [Preparation of urethane-based adhesive solution (M)]

調配作為多元醇之具有3個羥基之多元醇之Preminol S3011(旭硝子公司製造,Mn=10000)85質量份、具有3個羥基之多元醇之Sannix GP3000(三洋化成公司製造,Mn=3000)13質量份、具有3個羥基之多元醇之Sannix GP1000(三洋化成公司製造,Mn=1000)2質量份,及作為交聯劑之異氰酸酯化合物Coronate HX(日本聚氨酯公司製造)18質量份、作為觸媒之乙醯丙酮酸鐵(III)(東京化成工業公司製造)0.04質量份、作為稀釋溶劑之乙酸乙酯210質量份,從而獲得胺基甲酸酯系黏著劑溶液(M)。再者,作為胺基甲酸酯系黏著劑溶液之原料,除了溶劑以外全部為濃度100%之原料。 For the quality of the Sanminx GP3000 (manufactured by Sanyo Chemical Co., Ltd., Mn=3000) of 13 mass parts of a polyol having three hydroxyl groups as a polyol having three hydroxyl groups as a polyol, Mn = 3,000 (prepared by Asahi Glass Co., Ltd., Mn = 10000) 2 parts by mass of Sannix GP1000 (manufactured by Sanyo Chemical Co., Ltd., Mn = 1000) of a polyol having three hydroxyl groups, and 18 parts by mass of an isocyanate compound Coronate HX (manufactured by Nippon Polyurethane Co., Ltd.) as a crosslinking agent, as a catalyst 0.04 parts by mass of ethyl acetate (III) (manufactured by Tokyo Chemical Industry Co., Ltd.) and 210 parts by mass of ethyl acetate as a diluent solvent, thereby obtaining a urethane-based pressure-sensitive adhesive solution (M). Further, as a raw material of the urethane-based adhesive solution, all of the raw materials were 100% in concentration except for the solvent.

[胺基甲酸酯系黏著劑溶液(N)之製備] [Preparation of urethane-based adhesive solution (N)]

作為觸媒而使用錫系觸媒二月桂酸二丁基錫0.08質量份,除此以外,藉由與上述胺基甲酸酯系黏著劑溶液(M)同樣之方法而獲得胺基甲酸酯系黏著劑溶液(N)。 A urethane-based adhesive is obtained by the same method as the above-described urethane-based adhesive solution (M), except that 0.08 parts by mass of a tin-based catalyst dibutyltin dilaurate is used as a catalyst. Solution solution (N).

[胺基甲酸酯系黏著劑溶液(O)之製備] [Preparation of urethane-based adhesive solution (O)]

進一步調配作為潤濕性改善劑之肉豆蔻酸異丙酯(Exceparl IPM,花王公司製造)30質量份、作為抗氧化劑之Irganox1010(BASF公司製造)0.5質量份,除此以外,藉由與上述胺基甲酸酯系黏著劑溶液(M)同樣之方法而獲得胺基甲酸酯系黏著劑溶液(O)。 Further, 30 parts by mass of isopropyl myristate (Exceparl IPM, manufactured by Kao Corporation) as a wettability improver, and 0.5 parts by mass of Irganox 1010 (manufactured by BASF Corporation) as an antioxidant were added, in addition to the above amine. The urethane-based adhesive solution (O) is obtained in the same manner as the urethane-based adhesive solution (M).

[胺基甲酸酯系黏著劑溶液(P)之製備] [Preparation of urethane-based adhesive solution (P)]

進一步調配作為防靜電成分之有機聚矽氧烷(KF-6004,信越化學工業公司製造)0.1質量份、1-乙基-3-甲基咪唑鎓雙(氟磺醯)亞胺(EMIFSI,第一工業藥品公司製造)0.5質量份,除此以外,藉由與上述胺基甲酸酯系黏著劑溶液(O)同樣之方法而獲得胺基甲酸酯系黏著劑溶液(P)。 Further, 0.1 parts by mass of an organic polyoxane (KF-6004, manufactured by Shin-Etsu Chemical Co., Ltd.) as an antistatic component, 1-ethyl-3-methylimidazolium bis(fluorosulfonyl)imide (EMIFSI, A urethane-based pressure-sensitive adhesive solution (P) is obtained by the same method as the above-described urethane-based pressure-sensitive adhesive solution (O), except that the amount of the urethane-based adhesive solution (O) is 0.5 parts by mass.

[聚矽氧系黏著劑溶液(Q)之製備] [Preparation of polyoxygenated adhesive solution (Q)]

調配作為聚矽氧系黏著劑之以固形物成分計為100質量份之「X-40-3229](固形物成分60質量%,信越化學工業公司製造)、作為鉑觸媒之「CAT-PL-50T」(信越化學工業公司製造)0.5質量份、作為溶劑之甲苯100質量份,從而獲得聚矽氧系黏著劑溶液(Q)。 "X-40-3229" (solid content 60% by mass, manufactured by Shin-Etsu Chemical Co., Ltd.) and "CAT-PL" as a platinum catalyst, which are 100 parts by mass of the solid content of the polyoxynene-based adhesive -50T" (manufactured by Shin-Etsu Chemical Co., Ltd.) 0.5 parts by mass and 100 parts by mass of toluene as a solvent to obtain a polyoxynoxy-based adhesive solution (Q).

[聚矽氧系黏著劑溶液(R)之製備] [Preparation of polyoxygenated adhesive solution (R)]

調配作為聚矽氧系黏著劑之以固形物成分計為100質量份之「X-40-3229](固形物成分60質量%,信越化學工業公司製造)、作為鉑觸媒之「CAT-PL-50T」(信越化學工業公司製造)0.5質量份、有機聚矽氧烷(KF-353,信越化學工業公司製造)0.2質量份、雙(三氟甲磺醯)亞胺鋰(LiN(CF3SO2)2:LiTFSI,東京化成工業公司製造)0.3質量份、作為溶劑之甲苯100質量份,從而獲得聚矽氧系黏著劑溶液(R)。 "X-40-3229" (solid content 60% by mass, manufactured by Shin-Etsu Chemical Co., Ltd.) and "CAT-PL" as a platinum catalyst, which are 100 parts by mass of the solid content of the polyoxynene-based adhesive -50T" (manufactured by Shin-Etsu Chemical Co., Ltd.) 0.5 parts by mass, organic polyoxane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.2 parts by mass, lithium bis(trifluoromethanesulfonate)imide (LiN (CF 3 ) SO 2 ) 2 : LiTFSI (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.3 parts by mass of 100 parts by mass of toluene as a solvent to obtain a polyoxynoxy-based adhesive solution (R).

<防靜電層(C)、(G)及(H)用水溶液之製備> <Preparation of aqueous solution for antistatic layer (C), (G) and (H)>

於水/乙醇(1/3)之混合溶劑中添加以固形物成分量計為100質量份之作為黏合劑之聚酯樹脂Vylonal MD-1480(25%水溶液,東洋紡公司製造)、以固形物成分量計為75質量份之作為導電性聚合物之聚苯胺磺酸(aquapass,重量平均分子量4萬,Mitsubishi Rayon公司製造)、以固形物成分量計為10質量份之作為交聯劑之以二異丙基胺封端之六亞甲基二異氰酸酯之異氰脲酸酯體、以固形物成分量計30質量份之作為潤滑劑之油醯胺,攪拌約20分鐘而充分混合。由此製備NV約0.4%之防靜電層(C)用水溶液。 To a mixed solvent of water/ethanol (1/3), a polyester resin Vylonal MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.) as a binder in an amount of 100 parts by mass of the solid content component, and a solid content component are added. 75 parts by mass of polyaniline sulfonic acid (aquapass, weight average molecular weight 40,000 manufactured by Mitsubishi Rayon Co., Ltd.) as a conductive polymer, and 10 parts by mass of a solid content component as a crosslinking agent The isocyanuric acid-blocked hexamethylene diisocyanate isocyanurate body, and 30 parts by mass of the oily amide as a lubricant in an amount of the solid content, was stirred for about 20 minutes and thoroughly mixed. Thus, an aqueous solution for an antistatic layer (C) having an NV of about 0.4% was prepared.

又,基於表4之調配內容,藉由與防靜電層(C)用水溶液同樣之方法製備防靜電層(G)用水溶液及防靜電層(H)用水溶液。 Further, based on the contents of the formulation of Table 4, an aqueous solution for the antistatic layer (G) and an aqueous solution for the antistatic layer (H) were prepared in the same manner as the aqueous solution of the antistatic layer (C).

<防靜電層(D)用水溶液之製備> <Preparation of aqueous solution for antistatic layer (D)>

於水/乙醇(1/3)之混合溶劑中添加以固形物成分量計為100質量份之作為黏合劑之聚酯樹脂Vylonal MD-1480(25%水溶液,東洋紡公司製造)、以固形物成分量計為75質量份之作為導電性聚合物之聚苯胺 磺酸(aquapass,重量平均分子量4萬,Mitsubishi Rayon公司製造)、以固形物成分量計為10質量份之作為交聯劑之以二異丙基胺封端之六亞甲基二異氰酸酯之異氰脲酸酯體,攪拌約20分鐘而充分混合。由此製備NV約0.4%之防靜電層(D)用水溶液。 To a mixed solvent of water/ethanol (1/3), a polyester resin Vylonal MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.) as a binder in an amount of 100 parts by mass of the solid content component, and a solid content component are added. 75 parts by mass of polyaniline as a conductive polymer Sulfonic acid (aquapass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.), 10 parts by mass of the solid content component, and diisopropylamine-terminated hexamethylene diisocyanate as a crosslinking agent The cyanurate body was stirred for about 20 minutes and thoroughly mixed. Thus, an aqueous solution for an antistatic layer (D) having an NV of about 0.4% was prepared.

<防靜電層(E)用水溶液之製備> <Preparation of aqueous solution for antistatic layer (E)>

於水/乙醇(1/1)之混合溶劑中添加以固形物成分量計為100質量份之作為黏合劑之聚酯樹脂Vylonal MD-1480(25%水溶液,東洋紡公司製造)、以固形物成分量計為50質量份之作為導電性聚合物之含有聚(3,4-乙二氧基噻吩)(PEDOT)0.5%及聚苯乙烯磺酸(重量平均分子量15萬)(PSS)0.8%之水溶液(Bytron P,H.C.Stark公司製造)、及三聚氰胺系交聯劑,攪拌約20分鐘而充分混合。由此製備NV約0.4%之防靜電層(E)用水溶液。 To a mixed solvent of water/ethanol (1/1), a polyester resin Vylonal MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.) as a binder in an amount of 100 parts by mass of the solid content component, and a solid content component are added. 50 parts by mass of a conductive polymer containing poly(3,4-ethylenedioxythiophene) (PEDOT) 0.5% and polystyrenesulfonic acid (weight average molecular weight 150,000) (PSS) 0.8% An aqueous solution (Bytron P, manufactured by HC Stark Co., Ltd.) and a melamine-based crosslinking agent were stirred for about 20 minutes to be thoroughly mixed. Thus, an aqueous solution for an antistatic layer (E) having an NV of about 0.4% was prepared.

<防靜電層(F)用水溶液之製備> <Preparation of aqueous solution for antistatic layer (F)>

於水/乙醇(1/3)之混合溶劑中添加以固形物成分量計為100質量份之作為黏合劑之聚酯樹脂Vylonal MD-1480(25%水溶液,東洋紡公司製造)、以固形物成分量計為75質量份之作為導電性聚合物之聚苯胺磺酸(aquapass,重量平均分子量4萬,Mitsubishi Rayon公司製造),攪拌約20分鐘而充分混合。由此製備NV約0.4%之防靜電層(C)用水溶液。 To a mixed solvent of water/ethanol (1/3), a polyester resin Vylonal MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.) as a binder in an amount of 100 parts by mass of the solid content component, and a solid content component are added. 75 parts by mass of polyaniline sulfonic acid (aquapass, weight average molecular weight 40,000 manufactured by Mitsubishi Rayon Co., Ltd.) as a conductive polymer was weighed and mixed well for about 20 minutes. Thus, an aqueous solution for an antistatic layer (C) having an NV of about 0.4% was prepared.

<附有防靜電層之基材之製備> <Preparation of substrate with antistatic layer>

於其中一面(第一面)實施有電暈處理之厚38μm、寬30cm、長40cm之透明之聚對苯二甲酸乙二酯(PET)膜(聚酯膜)之電暈處理面,以乾燥後之厚度成為15、30、45nm之方式塗佈上述防靜電層(C)~(H)中之任一水溶液。將該塗佈物於130℃下加熱1分鐘而使其乾燥,藉此製作PET膜之第一面具有防靜電層之附有防靜電層之基材。 On one side (the first side), a corona-treated surface of a transparent polyethylene terephthalate (PET) film (polyester film) having a thickness of 38 μm, a width of 30 cm, and a length of 40 cm was subjected to corona treatment to dry. Any one of the antistatic layers (C) to (H) described above is applied so as to have a thickness of 15, 30, or 45 nm. The coated product was heated at 130 ° C for 1 minute and dried to prepare a substrate having an antistatic layer having an antistatic layer on the first side of the PET film.

<實施例1> <Example 1> [表面保護膜之製作] [Production of surface protective film]

將上述丙烯酸系黏著劑溶液(A)塗佈於上述具有防靜電層之基材(附有防靜電層之基材)之與防靜電層相反之面,於130℃下加熱1分鐘,從而形成厚度15μm之黏著劑層。繼而,於上述黏著劑層之表面貼合單面實施有聚矽氧處理之隔片即聚對苯二甲酸乙二酯膜(厚度25μm)之聚矽氧處理面,從而製作表面保護膜。 The acrylic pressure-sensitive adhesive solution (A) is applied to the surface of the substrate (antistatic layer-attached substrate) having the antistatic layer opposite to the antistatic layer, and heated at 130 ° C for 1 minute to form An adhesive layer having a thickness of 15 μm. Then, a polyfluorene-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which is a separator which is subjected to polyfluorination treatment was bonded to the surface of the above-mentioned pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例15> <Example 15>

將上述胺基甲酸酯系黏著劑溶液(N)塗佈於上述具有防靜電層之基材(附有防靜電層之基材)之與防靜電層相反之面,於130℃下加熱1分鐘,從而形成厚度10μm之黏著劑層。繼而,於上述黏著劑層之表面貼合單面實施有聚矽氧處理之隔片即聚對苯二甲酸乙二酯膜(厚度25μm)之聚矽氧處理面,從而製作表面保護膜。 Applying the above urethane-based adhesive solution (N) to the surface of the substrate (antistatic layer with an antistatic layer) having the antistatic layer opposite to the antistatic layer, and heating at 130 ° C Minutes to form an adhesive layer having a thickness of 10 μm. Then, a polyfluorene-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which is a separator which is subjected to polyfluorination treatment was bonded to the surface of the above-mentioned pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例19> <Example 19>

將上述聚矽氧系黏著劑溶液(Q)塗佈於上述具有防靜電層之基材(附有防靜電層之基材)之與防靜電層相反之面,於150℃下加熱1分鐘,從而形成厚度10μm之黏著劑層。繼而,於上述黏著劑層之表面貼合單面實施有聚矽氧處理之隔片即聚對苯二甲酸乙二酯膜(厚度25μm)之聚矽氧處理面,從而製作表面保護膜。 The polyoxygen-based adhesive solution (Q) is applied to the surface of the substrate (antistatic layer-attached substrate) having the antistatic layer opposite to the antistatic layer, and heated at 150 ° C for 1 minute. Thus, an adhesive layer having a thickness of 10 μm was formed. Then, a polyfluorene-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which is a separator which is subjected to polyfluorination treatment was bonded to the surface of the above-mentioned pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例2~14及比較例1~3> <Examples 2 to 14 and Comparative Examples 1 to 3>

基於表1、表4及表5之調配內容,以與實施例1相同之方式製作表面保護膜。 A surface protective film was produced in the same manner as in Example 1 based on the contents of the formulations of Table 1, Table 4, and Table 5.

<實施例16~18> <Examples 16 to 18>

基於表2、表4及表5之調配內容,以與實施例15相同之方式製作表面保護膜。 A surface protective film was produced in the same manner as in Example 15 based on the contents of the preparations of Table 2, Table 4, and Table 5.

<實施例20> <Example 20>

基於表3~表5之調配內容,以與實施例19相同之方式製作表面 保護膜。 Surfaces were produced in the same manner as in Example 19 based on the contents of Tables 3 to 5 Protective film.

對實施例及比較例之表面保護膜進行上述之各種測定及評價,並將結果示於表6。 The above various measurements and evaluations were performed on the surface protective films of the examples and the comparative examples, and the results are shown in Table 6.

根據表6可確認,於全部實施例中,防靜電層起到作用之表面電阻值及膜側剝離靜電壓優異,進而,藉由使用異氰酸酯系交聯劑作為防靜電層所使用之交聯劑,印字密接性亦優異。又,可確認到於在黏著劑層中調配有防靜電成分之實施例2等中,偏光板剝離靜電壓亦優異,於在防靜電層中調配有潤滑劑之實施例1等中,滑動性亦優異。 According to Table 6, it was confirmed that in all the examples, the surface resistance value and the film side peeling static voltage which the antistatic layer functions are excellent, and further, the isocyanate crosslinking agent is used as the crosslinking agent used for the antistatic layer. The printing is also excellent in adhesion. In addition, in the second embodiment in which the antistatic component is blended in the adhesive layer, the polarizing plate peeling static voltage is also excellent, and in the first embodiment in which the lubricant is blended in the antistatic layer, the slidability is obtained. Also excellent.

另一方面,根據表6可確認,於比較例1及2中,於使用水分散型之導電性聚合物(PEDOT/PSS)作為構成防靜電層之成分之情形時,在製備防靜電層時所使用之水溶液中可觀察到凝聚物,不僅防靜電層起到作用之經時下之表面電阻值(於室溫下1週後測定)、或來自防靜電層之膜側剝離靜電壓未獲得所需之效果,來自防靜電層及黏著劑層之 偏光板剝離靜電壓亦未獲得所需之效果。作為其理由,詳細內容尚不明確,推測由於防靜電層之劣化,表面保護膜整體之防靜電性發生惡化。又,與在黏著劑層中調配有防靜電成分之比較例1相比,於未調配之比較例2中,偏光板剝離靜電壓成為特別差之結果。 On the other hand, according to Table 6, it can be confirmed that in Comparative Examples 1 and 2, when a water-dispersible conductive polymer (PEDOT/PSS) is used as a component constituting the antistatic layer, when preparing an antistatic layer Agglomerates were observed in the aqueous solution used, not only the surface resistance value of the antistatic layer acting on time (measured after 1 week at room temperature), but also the film side peeling static voltage from the antistatic layer was not obtained. The desired effect comes from the antistatic layer and the adhesive layer. The polarizing plate peeling static voltage also did not achieve the desired effect. The reason for this is not clear, and it is presumed that the antistatic property of the entire surface protective film is deteriorated due to deterioration of the antistatic layer. Further, in Comparative Example 2 in which the antistatic component was blended in the adhesive layer, the polarizing plate peeling static voltage was particularly poor as a result.

又,於比較例3中,確認到雖然使用水溶性型之導電性聚合物(聚苯胺磺酸)作為構成防靜電層之成分,但未使用異氰酸酯系交聯劑作為交聯劑,因此印字密接性較差。 Further, in Comparative Example 3, it was confirmed that a water-soluble conductive polymer (polyaniline sulfonic acid) was used as a component constituting the antistatic layer, but an isocyanate crosslinking agent was not used as a crosslinking agent, so the printing was closely bonded. Poor sex.

[產業上之可利用性] [Industrial availability]

此處所揭示之表面保護膜於製造用作液晶顯示器面板、電漿顯示器面板(PDP)、有機電致發光(EL)顯示器等之構成元件之光學構件時,適宜作為搬送時等用以保護該光學構件之表面保護膜。尤其是作為應用於液晶顯示器面板用偏光板(偏光膜)、波片、相位差板、光學補償膜、增亮膜、光擴散片、反射片等光學構件之表面保護膜(光學用表面保護膜)有用。 When the surface protective film disclosed herein is used for manufacturing an optical member used as a constituent element of a liquid crystal display panel, a plasma display panel (PDP), an organic electroluminescence (EL) display or the like, it is suitably used as a carrier to protect the optical. Surface protection film for components. In particular, it is used as a surface protective film (optical surface protection film) for optical members such as a polarizing plate (polarizing film) for a liquid crystal display panel, a wave plate, a phase difference plate, an optical compensation film, a brightness enhancement film, a light diffusion sheet, and a reflection sheet. )it works.

Claims (7)

一種表面保護膜,其特徵在於:其具備具有第一面及第二面之基材、設置於上述基材之上述第一面之防靜電層、及於上述基材之上述第二面上由黏著劑組合物形成之黏著劑層,且上述防靜電層係由含有作為導電性聚合物成分之聚苯胺磺酸、作為黏合劑之聚酯樹脂及作為交聯劑之異氰酸酯系交聯劑之防靜電劑組合物所形成。 A surface protective film comprising: a substrate having a first surface and a second surface; an antistatic layer provided on the first surface of the substrate; and the second surface of the substrate The adhesive layer formed of the adhesive composition, and the antistatic layer is composed of polyaniline sulfonic acid as a conductive polymer component, a polyester resin as a binder, and an isocyanate crosslinking agent as a crosslinking agent. An electrostatic agent composition is formed. 如請求項1之表面保護膜,其中上述防靜電劑組合物進一步含有脂肪醯胺作為潤滑劑。 The surface protective film of claim 1, wherein the antistatic agent composition further contains a fatty guanamine as a lubricant. 如請求項1之表面保護膜,其中上述基材為聚酯膜。 The surface protective film of claim 1, wherein the substrate is a polyester film. 如請求項1之表面保護膜,其中上述黏著劑組合物含有選自由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所組成之群中之至少一種。 The surface protective film of claim 1, wherein the adhesive composition contains at least one selected from the group consisting of an acrylic adhesive, an urethane-based adhesive, and a polyoxygen-based adhesive. 如請求項1之表面保護膜,其中上述黏著劑組合物含有防靜電成分。 The surface protective film of claim 1, wherein the above adhesive composition contains an antistatic component. 一種光學構件,其特徵在於:其係由如請求項1至5中任一項之表面保護膜所保護。 An optical member characterized in that it is protected by a surface protective film according to any one of claims 1 to 5. 一種表面保護膜之製造方法,其特徵在於:其係如請求項1至5中任一項之表面保護膜之製造方法,且包括:製備含有上述防靜電劑組合物之水溶液之步驟、及將上述水溶液塗佈於上述基材之第一面並乾燥而製備防靜電層之步驟。 A method of producing a surface protective film according to any one of claims 1 to 5, comprising: a step of preparing an aqueous solution containing the above antistatic agent composition, and The aqueous solution is applied to the first surface of the substrate and dried to prepare an antistatic layer.
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