TW201512309A - Curable resin composition and semiconductor device using same - Google Patents

Curable resin composition and semiconductor device using same Download PDF

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TW201512309A
TW201512309A TW103123394A TW103123394A TW201512309A TW 201512309 A TW201512309 A TW 201512309A TW 103123394 A TW103123394 A TW 103123394A TW 103123394 A TW103123394 A TW 103123394A TW 201512309 A TW201512309 A TW 201512309A
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resin composition
curable resin
polyorganosiloxane
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TWI547525B (en
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Hiroto Takenaka
Ryo Itaya
Shigeaki Kamuro
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Daicel Corp
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
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    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477Six-membered rings
    • C08K5/3492Triazines
    • C08K5/34924Triazines containing cyanurate groups; Tautomers thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/045Polysiloxanes containing less than 25 silicon atoms
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin

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  • Chemical & Material Sciences (AREA)
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Abstract

Provided are: a curable resin composition provided with transparency, heat resistance, and flexibility, as well as with re-flow resistance, and also barrier properties with respect to hydrogen sulfide (H2S) gas and barrier properties with respect to sulfur oxide (SOX) gas, and that is useful in sealing applications for semiconductor elements (particularly optical semiconductor elements); a cured product using the same; a sealing material; and a semiconductor device.; A curable resin composition, and a cured product, sealing material, and semiconductor device using the same, the curable resin composition including a polyorganosiloxane (A), an isocyanurate compound (B), and a zinc compound (E), the polyorganosiloxane (A) being a polyorganosiloxane having an aryl group, the curable resin composition potentially further including a silsesquioxane (D), and the content of the zinc compound (E) being less than 0.01 part by weight to 0.1 part by weight with respect to the total amount (100 parts by weight) of the polyorganosiloxane (A) and the silsesquioxane (D).

Description

硬化性樹脂組成物及使用其之半導體裝置 Curable resin composition and semiconductor device using the same

本發明係關於一種硬化性樹脂組成物、使用該硬化性樹脂組成物而得到的硬化物、密封材、以及使用該密封材而得到的半導體裝置。本案係主張在2013年8月2日於日本申請的特願2013-161865號之優先權,並在此援用其內容。 The present invention relates to a curable resin composition, a cured product obtained by using the curable resin composition, a sealing material, and a semiconductor device obtained by using the sealing material. The priority of Japanese Patent Application No. 2013-161865, which is filed on Jan. 2, 2013, in Japan, is hereby incorporated by reference.

在需要高耐熱.高耐電壓的半導體裝置中,於被覆半導體元件的材料中,一般係需要150℃左右以上的耐熱性。特別是在被覆光半導體元件等之光學材料的材料(密封材)中,除了耐熱性以外,也需要透明性、柔軟性等之物性佳。例如,作為在液晶顯示器之背光單元的密封材,目前使用環氧系樹脂材料或矽酮系樹脂材料。 In need of high heat resistance. In a semiconductor device having a high withstand voltage, heat resistance of about 150 ° C or higher is generally required for a material covering a semiconductor element. In particular, in the material (sealing material) of the optical material such as the optical semiconductor element, the physical properties such as transparency and flexibility are required in addition to heat resistance. For example, as a sealing material for a backlight unit of a liquid crystal display, an epoxy resin material or an anthrone resin material is currently used.

在專利文獻1中,作為耐熱性高且散熱性佳的材料,有揭露含有分子量為2萬至80萬的第3有機矽聚合物之1種以上的合成高分子化合物,其中該第3有機矽聚合物係使具有矽氧烷(Si-O-Si鍵結體)的交聯結構之至少1種的第1有機矽聚合物與具有矽氧烷的線狀連結結構之至少1種的第2有機矽聚合物,藉由矽氧烷鍵連結。然而,該等之材料的物性,仍無法滿足。 In Patent Document 1, as a material having high heat resistance and good heat dissipation property, one or more synthetic polymer compounds containing a third organic ruthenium polymer having a molecular weight of 20,000 to 800,000 are disclosed, wherein the third organic oxime The polymer is a second type of at least one of a first organic ruthenium polymer having at least one crosslinked structure of a decane (Si-O-Si bond) and a linear connection structure having a siloxane. An organic ruthenium polymer linked by a decane bond. However, the physical properties of these materials are still not met.

又,在專利文獻2中,作為透明性、耐UV性 、耐熱著色性優異的光元件密封用樹脂組成物,有揭露包含倍半矽氧烷(silsesquioxane)作為樹脂成分的光元件密封用樹脂組成物,其中該倍半矽氧烷係選自於包含含有脂肪族碳-碳不飽和鍵且未包含H-Si鍵的籠型結構體之液狀的倍半矽氧烷、及含有H-Si鍵且未包含脂肪族碳-碳不飽和鍵的籠型結構體之液狀的倍半矽氧烷之群組中的至少1種。然而,包含籠型之倍半矽氧烷的樹脂組成物之硬化物,因為比較硬且缺乏柔軟性,所以有容易產生裂縫或破裂的問題。 Further, in Patent Document 2, transparency and UV resistance are exhibited. And a resin composition for optical element sealing which is excellent in heat-resistant coloring property, and a resin composition for optical element sealing containing a silsesquioxane as a resin component, wherein the sesquiterpene oxide is selected from the group consisting of a liquid sesquioxane having an aliphatic carbon-carbon unsaturated bond and a cage structure not containing an H-Si bond, and a cage containing an H-Si bond and not containing an aliphatic carbon-carbon unsaturated bond At least one of the group of liquid sesquiterpene oxides of the structure. However, since the cured product of the resin composition containing the cage type sesquiterpene oxide is hard and lacks flexibility, there is a problem that cracks or cracks easily occur.

又,在專利文獻3中,有揭露包含在1分子中含有至少2個與SiH基具有反應性之碳-碳雙鍵的三烯丙基異三聚氰酸酯等之有機化合物、在1分子中至少含有2個SiH基之鏈狀及/或環狀聚有機矽氧烷等之化合物、氫矽烷化觸媒作為必要成分的硬化性組成物。然而,該等之材料的耐裂縫性等之物性,仍無法滿足。 Further, Patent Document 3 discloses an organic compound such as triallyl isocyanurate containing at least two carbon-carbon double bonds reactive with an SiH group in one molecule, in one molecule. A curable composition containing at least two SiH-based chain-like and/or cyclic polyorganosiloxanes and a hydroquinone-forming catalyst as essential components. However, the physical properties such as the crack resistance of these materials are still unsatisfactory.

另一方面,光半導體裝置的電極等之金屬材料,容易因為腐蝕性氣體而腐蝕,且有通電特性(例如,高溫環境的通電特性)隨時間惡化的問題。因此,光半導體用的密封材料中,需要相對於腐蝕性氣體的高阻隔性。然而,使用專利文獻1~3等所揭露之以往的矽酮系樹脂材料之密封材料,對於腐蝕性氣體之阻隔性,不能說是十分足夠。 On the other hand, a metal material such as an electrode of an optical semiconductor device is likely to be corroded by a corrosive gas, and there is a problem that electric conduction characteristics (for example, energization characteristics of a high-temperature environment) deteriorate with time. Therefore, in the sealing material for an optical semiconductor, high barrier property with respect to a corrosive gas is required. However, the sealing material of the conventional anthrone-based resin material disclosed in Patent Documents 1 to 3 and the like cannot be said to be sufficiently sufficient for the barrier property of the corrosive gas.

專利文獻4中,有揭露一種矽酮樹脂組成物,其係包含(A)具有至少2個鍵結於矽原子之烯基的聚矽氧烷、(B)具有至少2個鍵結於矽原子之氫基的聚矽氧烷交 聯劑、(C)氫矽烷化反應觸媒、以及(D)鋅化合物,相對於前述(A)成分及前述(B)成分之合計100質量份,含有前述(D)成分0.1~5質量份,且耐硫化性佳。然而,雖有揭露對於硫化氫(H2S)的耐腐蝕性,但關於對於其他腐蝕性氣體的耐腐蝕性,並沒有記載。 Patent Document 4 discloses a fluorenone resin composition comprising (A) a polyoxyalkylene having at least two alkenyl groups bonded to a ruthenium atom, and (B) having at least two bonded to a ruthenium atom. The hydrogen-based polyoxyalkylene crosslinking agent, the (C) hydroalkylation reaction catalyst, and the (D) zinc compound are contained in the above-mentioned (A) component and the total amount of the component (B) in an amount of 100 parts by mass. The component (D) is 0.1 to 5 parts by mass, and the sulfur resistance is good. However, although the corrosion resistance to hydrogen sulfide (H 2 S) has been disclosed, there is no description about the corrosion resistance to other corrosive gases.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2006-206721號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-206721

[專利文獻2]日本特開2007-031619號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-031619

[專利文獻3]日本特開2002-314140號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2002-314140

[專利文獻4]日本特開2011-178983號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2011-178983

使半導體裝置腐蝕的腐蝕性氣體存在有多個種類,且仍沒有揭露如相對於作為代表的腐蝕性氣體之硫化氫(H2S)氣體或硫氧化物(SOX)氣體等多個腐蝕性氣體之任一者均具有足夠的阻隔性之密封材料。 There are many types of corrosive gases that corrode semiconductor devices, and there is still no disclosure of a plurality of corrosive properties such as hydrogen sulfide (H 2 S) gas or sulfur oxide (SO X ) gas as a representative corrosive gas. Any of the gases has a sealing material that is sufficiently barrier.

因此,本發明的目的在於提供一種對於半導體元件(特別是光半導體元件)之密封用途為有用的硬化物,其係具備透明性、耐熱性、柔軟性,同時兼具對於腐蝕性氣體之阻隔性(特別是相對於硫化氫(H2S)氣體的阻隔性(耐H2S腐蝕性)及相對於硫氧化物(SOX)氣體的阻隔性(耐SOX腐蝕性))。又,本發明之另一目的在於提供一種對於半導體元件之密封用途為有用的硬化性樹脂組 成物,其係具備透明性、耐熱性、柔軟性,同時具備耐迴焊性(迴焊步驟之耐裂縫性、相對於封裝體之密合性等),並且兼具相對於腐蝕性氣體之阻隔性。又,本發明之另一目的在於提供一種硬化物及密封材,其係具有優異的耐熱性、透明性、柔軟性,特別是耐迴焊性、相對於腐蝕性氣體之阻隔性佳。又,本發明之另一目的在於提供一種半導體裝置,其係具有該等之硬化物及/或密封材。 Therefore, an object of the present invention is to provide a cured product which is useful for sealing applications of a semiconductor element (particularly an optical semiconductor element), which has transparency, heat resistance, flexibility, and also has barrier properties against corrosive gases. (especially the barrier property against hydrogen sulfide (H 2 S) gas (H 2 S corrosion resistance) and the barrier property against sulfur oxide (SO X ) gas (SO X corrosion resistance). Moreover, another object of the present invention is to provide a curable resin composition useful for sealing applications of a semiconductor element, which has transparency, heat resistance, flexibility, and reflow resistance (resistance to a reflow step) It has crack resistance, adhesion to the package, etc., and also has barrier properties against corrosive gases. Further, another object of the present invention is to provide a cured product and a sealing material which have excellent heat resistance, transparency, and flexibility, and particularly have excellent reflow resistance and good barrier properties against corrosive gases. Still another object of the present invention is to provide a semiconductor device having the cured product and/or the sealing material.

本案發明人發現:對於具有芳基的聚有機矽氧烷添加異三聚氰酸酯化合物、及鋅化合物的硬化性樹脂組成物,具有優異的耐熱性、透明性,特別是可形成對於腐蝕性氣體之阻隔性優異的硬化物,進而完成本發明。 The inventors of the present invention have found that a polycyanate compound having an aryl group and a curable resin composition of a zinc compound have excellent heat resistance and transparency, and in particular, can form corrosive properties. The cured product excellent in gas barrier properties further completes the present invention.

亦即,本發明提供一種硬化性樹脂組成物,其係包含聚有機矽氧烷(A)、異三聚氰酸酯化合物(B)、及鋅化合物(E)的硬化性樹脂組成物,其特徵為:聚有機矽氧烷(A)為具有芳基的聚有機矽氧烷,並且亦可更包含倍半矽氧烷(D),鋅化合物(E)之含量係相對於聚有機矽氧烷(A)及倍半矽氧烷(D)之合計量(100重量份)為0.01重量份以上小於0.1重量份。 That is, the present invention provides a curable resin composition comprising a polyorganosiloxane (A), an isocyanurate compound (B), and a zinc compound (E), which is a curable resin composition. The polyorganosiloxane (A) is a polyorganosiloxane having an aryl group, and may further comprise a sesquiterpene oxide (D), and the content of the zinc compound (E) is relative to the polyorganosiloxane. The total amount (100 parts by weight) of the alkane (A) and the sesquioxane (D) is 0.01 parts by weight or more and less than 0.1 parts by weight.

又,本發明提供如前述硬化性樹脂組成物,其中聚有機矽氧烷(A)之利用凝膠滲透層析的標準聚苯乙烯換算之數量平均分子量(Mn)為500~4000。 Further, the present invention provides the curable resin composition as described above, wherein the polyorganosiloxane (A) has a number average molecular weight (Mn) in terms of standard polystyrene by gel permeation chromatography of 500 to 4,000.

又,本發明提供如前述硬化性樹脂組成物, 其中將聚有機矽氧烷(A)之利用凝膠滲透層析的標準聚苯乙烯換算之重量平均分子量作為Mw、數量平均分子量作為Mn時之分子量分散度(Mw/Mn)為0.95~6.00。 Further, the present invention provides a curable resin composition as described above, The molecular weight dispersion (Mw/Mn) when the weight average molecular weight of the polyorganosiloxane (A) by gel permeation chromatography is Mw and the number average molecular weight is Mn is 0.95 to 6.00.

又,本發明提供如前述硬化性樹脂組成物,其中聚有機矽氧烷(A)為具有脂肪族碳-碳雙鍵的聚有機矽氧烷(A1)。 Further, the present invention provides a curable resin composition as described above, wherein the polyorganosiloxane (A) is a polyorganosiloxane (A1) having an aliphatic carbon-carbon double bond.

又,本發明提供如前述硬化性樹脂組成物,其中聚有機矽氧烷(A)為具有Si-H鍵的聚有機矽氧烷(A2)。 Further, the present invention provides a curable resin composition as described above, wherein the polyorganosiloxane (A) is a polyorganosiloxane (A2) having a Si-H bond.

又,本發明提供如前述硬化性樹脂組成物,其中作為異三聚氰酸酯化合物(B)係包含式(1)所示的異三聚氰酸酯化合物; [式(1)中,Rx、Ry、Rz可相同或不同,並表示式(2)所示的基、或式(3)所示的基; Further, the present invention provides the curable resin composition as described above, wherein the isomeric isocyanate compound (B) comprises an isomeric cyanurate compound represented by the formula (1); [In the formula (1), R x , R y , and R z may be the same or different, and represent a group represented by the formula (2) or a group represented by the formula (3);

[式(2)及式(3)中,R1及R2可相同或不同,並表示氫原子或碳數1~8之直鏈狀或分支鏈狀的烷基]]。 In the formulae (2) and (3), R 1 and R 2 may be the same or different and each represent a hydrogen atom or a linear or branched alkyl group having 1 to 8 carbon atoms]].

又,本發明提供如前述硬化性樹脂組成物, 其中式(1)的Rx、Ry、Rz之中任一個以上為式(3)所示的基。 Furthermore, the present invention provides the curable resin composition, wherein one or more of R x , R y and R z in the formula (1) is a group represented by the formula (3).

又,本發明提供如前述硬化性樹脂組成物,其中作為鋅化合物(E)係包含羧酸鋅。 Moreover, the present invention provides the curable resin composition as described above, wherein the zinc compound (E) contains zinc carboxylate.

又,本發明提供如前述硬化性樹脂組成物,其中聚有機矽氧烷(A)係包含式(6)所示的結構之聚有機矽氧烷; [式(6)中,R21~R26可相同或不同,並表示氫原子、芳基、一價烴基、或一價雜環式基;但是,R21~R26中之1個以上為包含脂肪族碳-碳不飽和鍵的一價基;又,R21~R26中之1個以上為芳基;R27表示二價烴基;r、s各別表示1以上的整數]。 Furthermore, the present invention provides a curable resin composition as described above, wherein the polyorganosiloxane (A) comprises a polyorganooxynitane having a structure represented by the formula (6); [In the formula (6), R 21 to R 26 may be the same or different and each represents a hydrogen atom, an aryl group, a monovalent hydrocarbon group or a monovalent heterocyclic group; however, one or more of R 21 to R 26 are a monovalent group containing an aliphatic carbon-carbon unsaturated bond; further, one or more of R 21 to R 26 is an aryl group; R 27 represents a divalent hydrocarbon group; and r and s each represent an integer of 1 or more].

又,本發明提供如前述硬化性樹脂組成物,其中更包含矽烷偶合劑(C)。 Further, the present invention provides a curable resin composition as described above, which further comprises a decane coupling agent (C).

又,本發明提供如前述硬化性樹脂組成物,其中作為倍半矽氧烷(D)係包含梯型倍半矽氧烷。 Moreover, the present invention provides the curable resin composition as described above, wherein the sesquiterpene oxide (D) system contains a ladder type sesquiterpene alkane.

又,本發明提供一種硬化物,其係將前述硬化性樹脂組成物硬化而得到。 Moreover, the present invention provides a cured product obtained by curing the curable resin composition.

又,本發明提供一種密封材,其係使用前述硬化性樹脂組成物而得到。 Moreover, the present invention provides a sealing material obtained by using the curable resin composition described above.

又,本發明提供一種半導體裝置,其係使用前述密封材而得到。 Moreover, the present invention provides a semiconductor device obtained by using the above-described sealing material.

又,本發明的硬化性樹脂組成物係與下述有 關。 Further, the curable resin composition of the present invention is as follows turn off.

[1]一種硬化性樹脂組成物,其係包含聚有機矽氧烷(A)、異三聚氰酸酯化合物(B)、及鋅化合物(E)的硬化性樹脂組成物,其特徵為:聚有機矽氧烷(A)為具有芳基的聚有機矽氧烷,並且亦可更包含倍半矽氧烷(D),鋅化合物(E)之含量係相對於聚有機矽氧烷(A)及倍半矽氧烷(D)之合計量(100重量份)為0.01重量份以上小於0.1重量份。 [1] A curable resin composition comprising a polyorganosiloxane (A), an isocyanurate compound (B), and a curable resin composition of a zinc compound (E), which is characterized by: The polyorganosiloxane (A) is a polyorganosiloxane having an aryl group, and may further contain a sesquioxane (D), and the content of the zinc compound (E) is relative to the polyorganosiloxane (A). And the total amount (100 parts by weight) of the sesquioxane (D) is 0.01 parts by weight or more and less than 0.1 parts by weight.

[2]如[1]記載之硬化性樹脂組成物,其中聚有機矽氧烷(A)係具有分支鏈的聚有機矽氧烷。 [2] The curable resin composition according to [1], wherein the polyorganosiloxane (A) is a polyorganosiloxane having a branched chain.

[3]如[1]或[2]記載之硬化性樹脂組成物,其中聚有機矽氧烷(A)係包含式(6)所示的結構(特別是R27為碳數1~5之直鏈狀或分支鏈狀的伸烷基較佳,更佳為伸乙基)的聚有機矽氧烷。 [3] The curable resin composition according to [1] or [2] wherein the polyorganosiloxane (A) comprises a structure represented by the formula (6) (particularly, R 27 is a carbon number of 1 to 5). A linear or branched chain alkyl group is preferred, and a polyethyl oxane of an ethyl group is more preferred.

[4]如[1]至[3]中任一項記載之硬化性樹脂組成物,其中聚有機矽氧烷(A)之含量(摻合量)係相對於硬化性樹脂組成物之全量(100重量%)為60~99.5重量%。 [4] The curable resin composition according to any one of [1] to [3] wherein the content (mixing amount) of the polyorganosiloxane (A) is relative to the total amount of the curable resin composition ( 100% by weight) is 60 to 99.5% by weight.

[5]如[3]或[4]記載之硬化性樹脂組成物,其中相對於聚有機矽氧烷(A)全量(合計含量、100重量%)之包含式(6)所示的結構(特別是R27為碳數1~5之直鏈狀或分支鏈狀的伸烷基較佳,更佳為伸乙基)的聚有機矽氧烷之比例為60~100重量%。 [5] The curable resin composition according to [3] or [4], wherein the total amount (total content, 100% by weight) of the polyorganosiloxane (A) is contained in the structure represented by the formula (6) ( In particular, R 27 is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, more preferably an ethyl group having a polyorganosiloxane having a ratio of 60 to 100% by weight.

[6]如[3]至[5]中任一項記載之硬化性樹脂組成物,其中作為聚有機矽氧烷(A)係使用具有脂肪族碳-碳雙鍵且具有芳基的聚有機矽氧烷基矽烷基烯、與具有脂肪族 碳-碳雙鍵及Si-H鍵且具有芳基的聚有機矽氧烷基矽烷基烯之2種。 [6] The curable resin composition according to any one of [3] to [5] wherein polyorganosiloxane having an aliphatic carbon-carbon double bond and having an aryl group is used as the polyorganosiloxane (A) Alkoxyalkylalkylene, with aliphatic Two kinds of polyorganophosphonylalkylene alkylenes having a carbon-carbon double bond and a Si-H bond and having an aryl group.

[7]如[1]至[6]中任一項記載之硬化性樹脂組成物,其中作為異三聚氰酸酯化合物(C)係包含式(1)所示的異三聚氰酸酯化合物;[式(1)中,Rx、Ry、Rz可相同或不同,並表示式(2)所示的基、或式(3)所示的基;[式(2)及式(3)中,R1及R2可相同或不同,並表示氫原子或碳數1~8之直鏈狀或分支鏈狀的烷基。]] [7] The curable resin composition according to any one of [1] to [6] wherein the isocyanurate compound (C) contains the isomeric cyanurate represented by the formula (1) a compound; [in the formula (1), R x , R y , and R z may be the same or different, and represent a group represented by the formula (2) or a group represented by the formula (3); [formula (2) and formula In (3), R 1 and R 2 may be the same or different and each represents a hydrogen atom or a linear or branched alkyl group having 1 to 8 carbon atoms. ]]

[8]如[1]至[7]中任一項記載之硬化性樹脂組成物,其中異三聚氰酸酯化合物(B)為單烯丙基二環氧丙基異三聚氰酸酯。 [8] The curable resin composition according to any one of [1] to [7] wherein the isocyanurate compound (B) is monoallyl digoxypropyl isomeric cyanurate .

[9]如[1]至[8]中任一項記載之硬化性樹脂組成物,其中異三聚氰酸酯化合物(B)之含量係相對於硬化性樹脂組成物之全量(100重量%)為0.01~10重量%。 [9] The curable resin composition according to any one of [1] to [8] wherein the content of the isocyanurate compound (B) is relative to the total amount of the curable resin composition (100% by weight) ) is 0.01 to 10% by weight.

[10]如[1]至[9]中任一項記載之硬化性樹脂組成物,其中異三聚氰酸酯化合物(B)之比例係相對於聚有機矽氧烷(A)與倍半矽氧烷(D)之合計量(100重量份)為0.01~0.5重量份。 [10] The curable resin composition according to any one of [1] to [9] wherein the ratio of the isocyanurate compound (B) is relative to the polyorganosiloxane (A) and the half The total amount (100 parts by weight) of the decane (D) is 0.01 to 0.5 parts by weight.

[11]如[1]至[10]中任一項記載之硬化性樹脂組成物,其中更包含矽烷偶合劑(C)。 [11] The curable resin composition according to any one of [1] to [10] further comprising a decane coupling agent (C).

[12]如[11]記載之硬化性樹脂組成物,其中矽烷偶合劑(C)為3-環氧丙氧基丙基三甲氧基矽烷。 [12] The curable resin composition according to [11], wherein the decane coupling agent (C) is 3-glycidoxypropyltrimethoxydecane.

[13]如[1]至[12]中任一項記載之硬化性樹脂組成物,其中包含倍半矽氧烷(D)。 [13] The curable resin composition according to any one of [1] to [12] wherein a sesquioxane (D) is contained.

[14]如[1]至[13]中任一項記載之硬化性樹脂組成物,其中倍半矽氧烷(D)係梯型倍半矽氧烷。 [14] The curable resin composition according to any one of [1] to [13] wherein the sesquioxane (D) is a ladder sesquioxane.

[15]如[1]至[14]中任一項記載之硬化性樹脂組成物,其中倍半矽氧烷(D)之含量係相對於硬化性樹脂組成物之全量(100重量%)為0.01~30重量%。 [15] The curable resin composition according to any one of [1] to [14] wherein the content of the sesquioxane (D) is based on the total amount (100% by weight) of the curable resin composition. 0.01 to 30% by weight.

[16]如[1]至[15]中任一項記載之硬化性樹脂組成物,其中鋅化合物(E)為羧酸鋅。 [16] The curable resin composition according to any one of [1] to [15] wherein the zinc compound (E) is zinc carboxylate.

[17]如[1]至[16]中任一項記載之硬化性樹脂組成物,其中鋅化合物(E)為環烷酸鋅、或辛酸鋅。 [17] The curable resin composition according to any one of [1] to [16] wherein the zinc compound (E) is zinc naphthenate or zinc octoate.

[18]如[1]至[17]中任一項記載之硬化性樹脂組成物,其中鋅化合物(E)之含量係相對於硬化性樹脂組成物之全量(100重量%)為0.02~0.085重量%。 [18] The curable resin composition according to any one of [1] to [17] wherein the content of the zinc compound (E) is 0.02 to 0.085 based on the total amount (100% by weight) of the curable resin composition. weight%.

[19]如[1]至[18]中任一項記載之硬化性樹脂組成物,其中鋅化合物(E)相對於化合物全重量(100重量%)之鋅含量為2~30重量%。 [19] The curable resin composition according to any one of [1] to [18] wherein the zinc compound (E) has a zinc content of 2 to 30% by weight based on the total weight (100% by weight) of the compound.

本發明的硬化性樹脂組成物,由於具有前述構成,故可形成具有優異的耐熱性、透明性之硬化物。特別是前述硬化物對於H2S氣體或SOX氣體等之多種腐蝕性氣體之阻隔性也優異。又,得到的硬化物,有柔軟性或耐迴焊性也佳的情況。因此,本發明的硬化性樹脂組成物,尤可作為半導體元件(例如,LED元件、半導體雷射元件、太陽光發電元件、CCD元件等)之密封材使用,且利用本發明的硬化性樹脂組成物之硬化物密封光半導體元件而得到的光半導體裝置,係具備優異的品質與 耐久性。特別是本發明的硬化性樹脂組成物,作為需要至今為止沒有的高溫(例如180℃以上)之耐熱性的次世代光源用的密封材為有用。 Since the curable resin composition of the present invention has the above-described configuration, it is possible to form a cured product having excellent heat resistance and transparency. In particular, the cured product is excellent in barrier properties against various corrosive gases such as H 2 S gas or SO X gas. Further, the obtained cured product may have good flexibility or reflow resistance. Therefore, the curable resin composition of the present invention can be used particularly as a sealing material for a semiconductor element (for example, an LED element, a semiconductor laser element, a solar power generation element, a CCD element, etc.), and is composed of the curable resin of the present invention. The optical semiconductor device obtained by sealing the optical semiconductor element with the cured material has excellent quality and durability. In particular, the curable resin composition of the present invention is useful as a sealing material for a next-generation light source which requires heat resistance at a high temperature (for example, 180 ° C or higher) which has not been hitherto.

100‧‧‧反射器(光反射用樹脂組成物) 100‧‧‧Reflector (resin composition for light reflection)

101‧‧‧金屬配線 101‧‧‧Metal wiring

102‧‧‧光半導體元件 102‧‧‧Optical semiconductor components

103‧‧‧接合導線 103‧‧‧bonding wire

104‧‧‧硬化物(密封材) 104‧‧‧ hardened material (sealing material)

第1圖係顯示使用本發明的硬化性樹脂組成物密封光半導體元件之光半導體裝置的一實施形態之概略圖。左側的圖(a)為立體圖,右側的圖(b)為剖面圖。 Fig. 1 is a schematic view showing an embodiment of an optical semiconductor device in which an optical semiconductor device is sealed using the curable resin composition of the present invention. The figure (a) on the left side is a perspective view, and the figure (b) on the right side is a cross-sectional view.

[實施發明之形態] [Formation of the Invention]

本發明的硬化性樹脂組成物,係包含聚有機矽氧烷(A)、異三聚氰酸酯化合物(B)、及鋅化合物(E)的硬化性樹脂組成物,其中聚有機矽氧烷(A)為具有芳基的聚有機矽氧烷,並且亦可更包含倍半矽氧烷(D),鋅化合物(E)之含量係相對於聚有機矽氧烷(A)及倍半矽氧烷(D)之合計量(100重量份)為0.01重量份以上小於0.1重量份。 The curable resin composition of the present invention is a curable resin composition comprising a polyorganosiloxane (A), an isocyanurate compound (B), and a zinc compound (E), wherein the polyorganosiloxane (A) is a polyorganosiloxane having an aryl group, and may further contain a sesquioxane (D), and the content of the zinc compound (E) is relative to the polyorganooxane (A) and sesquiterpene The total amount (100 parts by weight) of the oxyalkylene (D) is 0.01 parts by weight or more and less than 0.1 parts by weight.

[聚有機矽氧烷(A)] [polyorganooxane (A)]

本發明的硬化性樹脂組成物之聚有機矽氧烷(A),係具有矽氧烷鍵(Si-O-Si)所構成之主鏈的聚有機矽氧烷,且為具有芳基作為前述主鏈之取代基的聚有機矽氧烷。聚有機矽氧烷(A)亦可為含有氫矽烷基或具有脂肪族碳-碳不飽和鍵的基之直鏈狀或分支鏈狀的聚有機矽氧烷。作為聚有機矽氧烷(A),例如,可舉出苯基矽酮骨架(聚二苯基矽氧烷)、苯基甲基矽酮骨架(聚甲基苯基矽氧烷) 等之周知慣用的矽酮骨架。再者,在聚有機矽氧烷(A)中,並未包含倍半矽氧烷(D)。 The polyorganosiloxane (A) of the curable resin composition of the present invention is a polyorganosiloxane having a main chain composed of a siloxane chain (Si-O-Si), and has an aryl group as the aforementioned A polyorganosiloxane having a substituent of the main chain. The polyorganosiloxane (A) may also be a linear or branched polyorganosiloxane containing a hydroquinone group or a group having an aliphatic carbon-carbon unsaturated bond. Examples of the polyorganosiloxane (A) include a phenyl fluorenone skeleton (polydiphenyl siloxane) and a phenyl methyl fluorenone skeleton (polymethyl phenyl siloxane). A well-known fluorenone skeleton. Further, in the polyorganosiloxane (A), sesquioxane (D) is not contained.

前述聚有機矽氧烷(A),亦可為具有直鏈及/或分支鏈的聚有機矽氧烷。其中,從硬化物的強度之觀點,係以具有分支鏈的聚有機矽氧烷(分支鏈狀的聚有機矽氧烷)為較佳。 The polyorganosiloxane (A) may also be a polyorganosiloxane having a linear chain and/or a branched chain. Among them, from the viewpoint of the strength of the cured product, a polyorganosiloxane (branched polyorganosiloxane) having a branched chain is preferred.

作為聚有機矽氧烷(A)之芳基,並沒有特別限定,例如,可舉出苯基、萘基等之C6-14芳(特別是C6-10芳基)基等。該等芳基亦可為聚有機矽氧烷(A)之矽原子具有的取代基(直接鍵結於矽原子的基)。 The aryl group of the polyorganosiloxane (A) is not particularly limited, and examples thereof include a C 6-14 aryl (particularly a C 6-10 aryl) group such as a phenyl group or a naphthyl group. The aryl group may also be a substituent possessed by a ruthenium atom of the polyorganosiloxane (A) (a group directly bonded to a ruthenium atom).

聚有機矽氧烷(A)之芳基,亦可具有1個以上的取代基。作為前述取代基,可舉出鹵原子、取代或無取代之烴基、羥基、烷氧基、烯氧基、芳氧基、芳烷氧基、醯氧基、巰基(硫醇基)、烷硫基、烯硫基、芳硫基、芳烷硫基、羧基、烷氧羰基、芳氧羰基、芳烷氧羰基、胺基或取代胺基(單或二烷胺基、醯胺基等)、環氧基、氰基、異氰酸酯基、胺甲醯基、異硫氰酸酯基等。 The aryl group of the polyorganosiloxane (A) may have one or more substituents. Examples of the substituent include a halogen atom, a substituted or unsubstituted hydrocarbon group, a hydroxyl group, an alkoxy group, an alkenyloxy group, an aryloxy group, an aralkyloxy group, a decyloxy group, a decyl group (thiol group), and an alkyl sulfide. Alkyl, arylthio, arylthio, aralkylthio, carboxy, alkoxycarbonyl, aryloxycarbonyl, aralkyloxycarbonyl, amine or substituted amine (mono or dialkylamino, guanylamino, etc.), An epoxy group, a cyano group, an isocyanate group, an amine formazan group, an isothiocyanate group or the like.

作為前述取代或無取代之烴基,例如,可舉出脂肪族烴基、脂環式烴基、芳香族烴基、該等鍵結2種以上的基等。 Examples of the substituted or unsubstituted hydrocarbon group include an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a bond of two or more kinds.

作為前述脂肪族烴基,例如,可舉出烷基、烯基、炔基等。作為烷基,例如,可舉出甲基、乙基、丙基、異丙基、丁基、己基、辛基、異辛基、癸基、十二基等之C1-20烷基(較佳為C1-10烷基,更佳為C1-4烷基)等。作為烯基,例如,可舉出乙烯基、烯丙基、甲代烯 丙基、1-丙烯基、異丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、5-己烯基等之C2-20烯基(較佳為C2-10烯基,更佳為C2-4烯基)等。作為炔基,例如,可舉出乙炔基、丙炔基等之C2-20炔基(較佳為C2-10炔基,更佳為C2-4炔基)等。 The aliphatic hydrocarbon group may, for example, be an alkyl group, an alkenyl group or an alkynyl group. The alkyl group may, for example, be a C 1-20 alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a hexyl group, an octyl group, an isooctyl group, a decyl group or a dodecyl group. Preferably, it is a C 1-10 alkyl group, more preferably a C 1-4 alkyl group). Examples of the alkenyl group include a vinyl group, an allyl group, a methallyl group, a 1-propenyl group, an isopropenyl group, a 1-butenyl group, a 2-butenyl group, a 3-butenyl group, and 1 a C 2-20 alkenyl group having a pentenyl group, a 2-pentenyl group, a 3-pentenyl group, a 4-pentenyl group, a 5-hexenyl group or the like (preferably a C 2-10 alkenyl group, more preferably C 2-4 alkenyl) and the like. The alkynyl group may, for example, be a C 2-20 alkynyl group such as an ethynyl group or a propynyl group (preferably a C 2-10 alkynyl group, more preferably a C 2-4 alkynyl group).

作為前述脂環式烴基,例如,可舉出環丙基、環丁基、環戊基、環己基、環十二基等之C3-12的環烷基;環己烯基等之C3-12的環烯基;雙環庚基、雙環庚烯基等之C4-15的交聯環式烴基等。 Examples of the alicyclic hydrocarbon group include a C 3-12 cycloalkyl group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group or a cyclododecyl group; and a C 3 such as a cyclohexenyl group; a cycloalkenyl group of -12 ; a C 4-15 crosslinked cyclic hydrocarbon group such as a bicycloheptyl group or a bicycloheptenyl group; and the like.

作為前述芳香族烴基,例如,可舉出苯基、萘基等之C6-14芳基(特別是、C6-10芳基)等。 The aromatic hydrocarbon group may, for example, be a C 6-14 aryl group (particularly, a C 6-10 aryl group) such as a phenyl group or a naphthyl group.

又,作為前述脂肪族烴基與脂環式烴基鍵結的基,例如,可舉出環己基甲基、甲基環己基等。再者,作為前述脂肪族烴基與前述芳香族烴基鍵結的基,例如,可舉出苯甲基、苯乙基等之C7-18芳烷基(特別是C7-10芳烷基)、肉桂基等之C6-10芳基-C2-6烯基、甲苯基等之C1-4烷基取代芳基、苯乙烯基等之C2-4烯基取代芳基等。作為前述取代之烴基(經取代的烴基)具有的取代基,例如,可舉出與前述芳基可具有的取代基相同者。 In addition, examples of the group in which the aliphatic hydrocarbon group and the alicyclic hydrocarbon group are bonded to each other include a cyclohexylmethyl group and a methylcyclohexyl group. In addition, examples of the group in which the aliphatic hydrocarbon group is bonded to the aromatic hydrocarbon group include a C 7-18 aralkyl group such as a benzyl group or a phenethyl group (particularly a C 7-10 aralkyl group). , cinnamyl, etc. C 6-10 aryl -C 2-6 alkenyl group, a tolyl group, etc. C 1-4 alkyl substituted aryl group, a styryl group, etc. C 2-4 alkenyl group substituted with an aryl group. The substituent which the above-mentioned substituted aryl group (substituted hydrocarbon group) has may be, for example, the same as the substituent which the aryl group may have.

又,作為聚有機矽氧烷(A)之芳基具有之1個以上的取代基,可舉出式(4)所示的基作為其他的例。 In addition, as the aryl group of the polyorganosiloxane (A), one or more substituents may be mentioned, and a group represented by the formula (4) may be mentioned as another example.

式(4)中之複數個R',可各別相同,亦可不同。式(4) 中的R',可舉出氫原子、鹵原子、取代或無取代之烴基、羥基、烷氧基、烯氧基、芳氧基、芳烷氧基、醯氧基、巰基(硫醇基)、烷硫基、烯硫基、芳硫基、芳烷硫基、羧基、烷氧羰基、芳氧羰基、芳烷氧羰基、胺基或取代胺基(單或二烷胺基、醯胺基等)、環氧基、氰基、異氰酸酯基、胺甲醯基、異硫氰酸酯基等。 The plurality of R ' in the formula (4) may be the same or different. R ' in the formula (4) may, for example, be a hydrogen atom, a halogen atom, a substituted or unsubstituted hydrocarbon group, a hydroxyl group, an alkoxy group, an alkenyloxy group, an aryloxy group, an aralkyloxy group, a decyloxy group or a fluorenyl group ( Thiol group), alkylthio group, alkenylthio group, arylthio group, aralkylthio group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, amine group or substituted amine group (mono or dialkylamino group) , amidino group, etc.), an epoxy group, a cyano group, an isocyanate group, an amine formazan group, an isothiocyanate group, and the like.

在式(4)所示的基中,作為各R',各別為氫原子、C1-10烷基(特別是C1-4烷基)、C2-10烯基(特別是C2-4烯基)、C3-12環烷基、C3-12環烯基、可在芳香環具有C1-4烷基、C2-4烯基、鹵原子、C1-4烷氧基等之取代基的C6-14芳基、C7-18芳烷基、C6-10芳基-C2-6烯基、羥基、C1-6烷氧基、鹵原子較為理想。 In the group represented by the formula (4), each R ' is each a hydrogen atom, a C 1-10 alkyl group (particularly a C 1-4 alkyl group), a C 2-10 alkenyl group (particularly C 2 ). -4 alkenyl), C 3-12 cycloalkyl, C 3-12 cycloalkenyl, may have C 1-4 alkyl, C 2-4 alkenyl, halogen atom, C 1-4 alkoxy in the aromatic ring A C 6-14 aryl group, a C 7-18 aralkyl group, a C 6-10 aryl-C 2-6 alkenyl group, a hydroxyl group, a C 1-6 alkoxy group or a halogen atom of a substituent such as a group is preferable.

相對於聚有機矽氧烷(A)之全量(100重量%)的芳基(苯基換算)之含量,並沒有特別限定,但35重量%以上(例如,35~70重量%)較佳,40重量%以上更佳,44重量%以上最佳。前述芳基之含量低於35重量%時,有得到的硬化物相對於腐蝕性氣體之阻隔性低的情況。又,聚有機矽氧烷(A)之矽氧烷鍵(Si-O-Si)所構成的主鏈之取代基的全部可為芳基,或者前述取代基之一部分可為芳基。再者,前述芳基之含量,例如,可藉由1H-NMR等進行測定。 The content of the total amount (100% by weight) of the aryl group (in terms of phenyl group) of the polyorganosiloxane (A) is not particularly limited, but is preferably 35% by weight or more (for example, 35 to 70% by weight). More preferably, 40% by weight or more, and most preferably 44% by weight or more. When the content of the aryl group is less than 35% by weight, the obtained cured product may have a low barrier property against a corrosive gas. Further, all of the substituents of the main chain composed of the siloxane chain (Si-O-Si) of the polyorganosiloxane (A) may be an aryl group, or one of the substituents may be an aryl group. Further, the content of the aryl group can be measured, for example, by 1 H-NMR or the like.

在本發明的硬化性樹脂組成物中,聚有機矽氧烷(A),可單獨使用1種,亦可組合2種以上而使用。 In the curable resin composition of the present invention, the polyorganosiloxane (A) may be used singly or in combination of two or more.

聚有機矽氧烷(A)之數量平均分子量(Mn)為500~4000較佳,550~2800更佳,600~1500特佳。又, 重量平均分子量(Mw)為500~20000較佳,600~10000更佳,700~6500特佳。數量平均分子量(Mn)及/或重量平均分子量(Mw)小於500時,有得到的硬化物之耐熱性下降的情況。另一方面,數量平均分子量(Mn)超過4000及/或重量平均分子量(Mw)超過20000時,聚有機矽氧烷(A)與其他成分之相溶性下降,或者組合聚有機矽氧烷(A)2種以上而使用時,有聚有機矽氧烷相互之相溶性下降的情況。再者,聚有機矽氧烷(A),亦可為具有前述範圍之種種數量平均分子量(Mn)及/或重量平均分子量(Mw)者的混合物。再者,前述數量平均分子量(Mn)及/或重量平均分子量(Mw),例如,可作為利用凝膠滲透層析之聚苯乙烯換算的分子量而算出。 The polyorganosiloxane (A) has a number average molecular weight (Mn) of preferably from 500 to 4,000, more preferably from 550 to 2,800, and particularly preferably from 600 to 1,500. also, The weight average molecular weight (Mw) is preferably from 500 to 20,000, more preferably from 600 to 10,000, and particularly preferably from 700 to 6,500. When the number average molecular weight (Mn) and/or the weight average molecular weight (Mw) is less than 500, the heat resistance of the obtained cured product may be lowered. On the other hand, when the number average molecular weight (Mn) exceeds 4,000 and/or the weight average molecular weight (Mw) exceeds 20,000, the compatibility of the polyorganosiloxane (A) with other components is lowered, or a polyorganosiloxane (A) is combined. When two or more types are used, the compatibility of the polyorganosiloxanes may be lowered. Further, the polyorganosiloxane (A) may be a mixture of various number average molecular weights (Mn) and/or weight average molecular weights (Mw) having the above-mentioned ranges. Further, the number average molecular weight (Mn) and/or the weight average molecular weight (Mw) can be calculated, for example, as a polystyrene-converted molecular weight by gel permeation chromatography.

聚有機矽氧烷(A)之利用重量平均分子量(Mw)與數量平均分子量(Mn)算出的分子量分散度(Mw/Mn),並沒有特別限定,但0.95~6.00較佳,0.95~4.00更佳,1.00~3.80特佳,1.20~3.50最佳。前述分子量分散度(Mw/Mn)超過3.50時,有得到的硬化物之耐熱性或相對於腐蝕性氣體之阻隔性下降的情況。 The molecular weight dispersion (Mw/Mn) calculated from the weight average molecular weight (Mw) and the number average molecular weight (Mn) of the polyorganosiloxane (A) is not particularly limited, but is preferably 0.95 to 6.00, and more preferably 0.95 to 4.00. Good, 1.00~3.80 is especially good, 1.20~3.50 is the best. When the molecular weight dispersion degree (Mw/Mn) exceeds 3.50, the heat resistance of the obtained cured product or the barrier property against the corrosive gas may be lowered.

本發明的硬化性樹脂組成物之聚有機矽氧烷(A)的含量(摻合量,使用2種以上時為合計含量),並沒有特別限定,相對於硬化性樹脂組成物之全量(100重量%)為55~99.5重量%較佳,70~99.0重量%更佳,85~98.5重量%特佳。含量小於55重量%時,有得到的硬化物之耐裂縫性下降的情況。另一方面,含量超過99.5重量%時,有得到的硬化物相對於腐蝕性氣體之阻隔性變低的情況。 The content of the polyorganosiloxane (A) of the curable resin composition of the present invention (the total amount of the compounding amount when two or more kinds are used) is not particularly limited, and the total amount of the curable resin composition (100) The weight %) is preferably 55 to 99.5% by weight, more preferably 70 to 99.0% by weight, and particularly preferably 85 to 98.5% by weight. When the content is less than 55% by weight, the crack resistance of the obtained cured product may be lowered. On the other hand, when the content exceeds 99.5% by weight, the barrier properties of the obtained cured product with respect to the corrosive gas may be lowered.

聚有機矽氧烷(A),可具有芳基以外之取代基,且前述芳基以外之取代基,亦可為聚有機矽氧烷(A)之矽原子具有的取代基。作為前述芳基以外之取代基,可舉出氫原子、鹵原子、具有Si-H鍵的基、取代或無取代之烴基(較佳為烷基、烯基、環烷基、或環烯基)、羥基、烷氧基、烯氧基、醯氧基、巰基(硫醇基)、烷硫基、烯硫基、羧基、烷氧羰基、胺基或取代胺基(單或二烷胺基、醯胺基等)、環氧基、氰基、異氰酸酯基、胺甲醯基、異硫氰酸酯基等。 The polyorganosiloxane (A) may have a substituent other than the aryl group, and the substituent other than the aryl group may be a substituent of a ruthenium atom of the polyorganosiloxane (A). Examples of the substituent other than the above aryl group include a hydrogen atom, a halogen atom, a group having a Si-H bond, a substituted or unsubstituted hydrocarbon group (preferably an alkyl group, an alkenyl group, a cycloalkyl group, or a cycloalkenyl group). ), hydroxy, alkoxy, alkenyloxy, decyloxy, decyl (thiol), alkylthio, alkylthio, carboxy, alkoxycarbonyl, amine or substituted amine (mono or dialkylamino) , amidino group, etc.), an epoxy group, a cyano group, an isocyanate group, an amine formazan group, an isothiocyanate group, and the like.

作為聚有機矽氧烷(A)之前述芳基以外的取代基,選自於氫原子、具有Si-H鍵的基(氫矽烷基等)、取代或無取代之烴基(較佳為烷基或具有脂肪族碳-碳雙鍵的基(烯基等))中之至少1種以上的取代基特為理想。聚有機矽氧烷(A),例如,亦可為含有芳基及具有脂肪族碳-碳雙鍵的基之聚有機矽氧烷;含有芳基及具有Si-H鍵的基之聚有機矽氧烷;含有芳基、具有脂肪族碳-碳雙鍵的基、及具有Si-H鍵的基之聚有機矽氧烷等。 The substituent other than the aforementioned aryl group of the polyorganosiloxane (A) is selected from a hydrogen atom, a group having a Si-H bond (hydroalkylene group, etc.), a substituted or unsubstituted hydrocarbon group (preferably an alkyl group). At least one or more substituents of a group having an aliphatic carbon-carbon double bond (alkenyl group or the like) are particularly preferred. The polyorganosiloxane (A) may, for example, be a polyorganosiloxane containing an aryl group and a group having an aliphatic carbon-carbon double bond; a polyorganoquinone containing an aryl group and a group having a Si-H bond; An oxane; a polyorganosiloxane containing an aryl group, a group having an aliphatic carbon-carbon double bond, and a group having a Si-H bond.

作為前述聚有機矽氧烷(A),例如,可舉出包含式(6)所示的結構之聚有機矽氧烷。在本說明書中,係將包含式(6)所示的結構之聚有機矽氧烷稱為「聚有機矽氧烷基矽烷基烯」。 The polyorganosiloxane (A) is, for example, a polyorganosiloxane containing a structure represented by the formula (6). In the present specification, the polyorganosiloxane containing the structure represented by the formula (6) is referred to as "polyorganophosphonylalkylene alkylene".

式(6)中,R21~R26可相同或不同,並表示氫原子、前述芳基、前述芳基以外的取代基、一價烴基、 或一價雜環式基。但是,R21~R26中之1個以上為包含脂肪族碳-碳不飽和鍵的一價基。再者,R21~R26並非全部為包含脂肪族碳-碳不飽和鍵的一價基較為理想。又,R21~R26中之至少1個以上為芳基(苯基、萘基等之C6-14芳基(特別是C6-10芳基),特別是苯基)較為理想。再者,R21~R26之芳基,亦可具有一種以上的取代基。作為R21~R26之芳基的取代基,可舉出與前述聚有機矽氧烷(A)之芳基的取代基相同者。 In the formula (6), R 21 to R 26 may be the same or different and each represent a hydrogen atom, the above aryl group, a substituent other than the above aryl group, a monovalent hydrocarbon group, or a monovalent heterocyclic group. However, one or more of R 21 to R 26 are monovalent groups containing an aliphatic carbon-carbon unsaturated bond. Further, it is preferable that all of R 21 to R 26 are monovalent groups containing an aliphatic carbon-carbon unsaturated bond. Further, at least one of R 21 to R 26 is preferably an aryl group (a C 6-14 aryl group such as a phenyl group or a naphthyl group (particularly a C 6-10 aryl group), particularly a phenyl group). Further, the aryl group of R 21 to R 26 may have one or more substituents. The substituent of the aryl group of R 21 to R 26 may be the same as the substituent of the aryl group of the polyorganosiloxane (A).

作為前述一價烴基,例如,可舉出一價脂肪族烴基;一價脂環式烴基;一價芳香族烴基;脂肪族烴基、脂環式烴基、及芳香族烴基之2種以上鍵結的一價基等。作為前述一價雜環式基,例如,可舉出吡啶基、呋喃基、噻吩基等。 Examples of the monovalent hydrocarbon group include a monovalent aliphatic hydrocarbon group; a monovalent alicyclic hydrocarbon group; a monovalent aromatic hydrocarbon group; and an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group. One price base and so on. Examples of the monovalent heterocyclic group include a pyridyl group, a furyl group, a thienyl group and the like.

作為前述一價脂肪族烴基,例如,可舉出烷基、烯基、炔基等。作為前述烷基,例如,可舉出甲基、乙基、丙基、異丙基、丁基、己基、辛基、異辛基、癸基、十二基等之直鏈狀或分支鏈狀的C1-20烷基(較佳為C1-10烷基,更佳為C1-4烷基)等。作為前述烯基,例如,可舉出乙烯基、烯丙基、甲代烯丙基、1-丙烯基、異丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、5-己烯基等之C2-20烯基(較佳為C2-10烯基,更佳為C2-4烯基)等。作為前述炔基,例如,可舉出乙炔基、丙炔基等之C2-20炔基(較佳為C2-10炔基,更佳為C2-4炔基)等。 The monovalent aliphatic hydrocarbon group may, for example, be an alkyl group, an alkenyl group or an alkynyl group. The alkyl group may, for example, be a linear or branched chain such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a hexyl group, an octyl group, an isooctyl group, a decyl group or a dodecyl group. A C 1-20 alkyl group (preferably a C 1-10 alkyl group, more preferably a C 1-4 alkyl group) or the like. Examples of the alkenyl group include a vinyl group, an allyl group, a methallyl group, a 1-propenyl group, an isopropenyl group, a 1-butenyl group, a 2-butenyl group, and a 3-butenyl group. C 2-20 alkenyl group (preferably C 2-10 alkenyl group), preferably 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 5-hexenyl or the like Is C 2-4 alkenyl) and the like. The alkynyl group may, for example, be a C 2-20 alkynyl group such as an ethynyl group or a propynyl group (preferably a C 2-10 alkynyl group, more preferably a C 2-4 alkynyl group).

作為前述一價脂環式烴基,例如,可舉出環 丙基、環丁基、環戊基、環己基、環十二基等之C3-12的環烷基;環己烯基等之C3-12的環烯基;雙環庚基、雙環庚烯基等之C4-15的交聯環式烴基等。 Examples of the monovalent alicyclic hydrocarbon group include a C 3-12 cycloalkyl group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group or a cyclododecyl group; a cyclohexenyl group; a C 4-12 cycloalkenyl group; a C 4-15 crosslinked cyclic hydrocarbon group such as a bicycloheptyl group or a bicycloheptenyl group; and the like.

作為前述一價芳香族烴基,例如,可舉出苯基、萘基、蒽基等之C6-14芳基(特別是C6-10芳基)等。 The monovalent aromatic hydrocarbon group may, for example, be a C 6-14 aryl group (particularly a C 6-10 aryl group) such as a phenyl group, a naphthyl group or a fluorenyl group.

又,作為脂肪族烴基與脂環式烴基鍵結的基,例如,可舉出環己基甲基、甲基環己基等。作為脂肪族烴基與芳香族烴基鍵結的基,可舉出苯甲基、苯乙基等之C7-18芳烷基(特別是C7-10芳烷基)、肉桂基等之C6-10芳基-C2-6烯基、甲苯基等之C1-4烷基取代芳基、苯乙烯基等之C2-4烯基取代芳基等。 In addition, examples of the group in which the aliphatic hydrocarbon group and the alicyclic hydrocarbon group are bonded include a cyclohexylmethyl group and a methylcyclohexyl group. Examples of the group bonded to the aromatic hydrocarbon group and the aromatic hydrocarbon group include a C 7-18 aralkyl group (particularly a C 7-10 aralkyl group) such as a benzyl group or a phenethyl group, and a C 6 such as a cinnamyl group. a C 2-4 alkenyl-substituted aryl group such as a C 1-4 alkyl group-substituted aryl group such as -10 aryl-C 2-6 alkenyl group or a tolyl group;

前述一價烴基,亦可具有取代基。亦即,前述一價烴基,亦可為前述所示列的一價烴基之至少1個的氫原子取代為取代基之一價烴基。前述取代基的碳數為0~20較佳,更佳為0~10。作為前述取代基,具體而言,例如,可舉出鹵原子;羥基;烷氧基;烯氧基;芳氧基;芳烷氧基;醯氧基;巰基;烷硫基;烯硫基;芳硫基;芳烷硫基;羧基;烷氧羰基;芳氧羰基;芳烷氧羰基;胺基;單或二烷胺基;單或二苯胺基;醯胺基;含有環氧基的基;含有氧雜環丁烷基的基;醯基;側氧基;異氰酸酯基;該等之2種以上視需要經由C1-6伸烷基鍵結的基等。 The aforementioned monovalent hydrocarbon group may have a substituent. That is, the monovalent hydrocarbon group may be substituted with at least one hydrogen atom of the monovalent hydrocarbon group listed above as a one-valent hydrocarbon group of the substituent. The carbon number of the above substituent is preferably from 0 to 20, more preferably from 0 to 10. Specific examples of the substituent include, for example, a halogen atom; a hydroxyl group; an alkoxy group; an alkenyloxy group; an aryloxy group; an aralkyloxy group; a decyloxy group; an anthracenyl group; an alkylthio group; Arylthio; arylalkylthio; carboxy; alkoxycarbonyl; aryloxycarbonyl; aralkyloxycarbonyl; amine; mono or dialkylamino; mono or diphenylamino; decylamino; A group containing an oxetane group; a fluorenyl group; a pendant oxy group; an isocyanate group; and two or more groups which are bonded via a C 1-6 alkyl group as needed.

作為前述烷氧基,例如,可舉出甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基等之C1-6烷氧基(較佳為C1-4烷氧基)等。作為前述烯氧基,例如, 可舉出烯丙氧基等之C2-6烯氧基(較佳為C2-4烯氧基)等。作為前述芳氧基,例如,可舉出苯氧基、甲苯氧基、萘氧基等之可在芳香環具有C1-4烷基、C2-4烯基、鹵原子、C1-4烷氧基等之取代基的C6-14芳氧基等。作為前述芳烷氧基,例如,可舉出苯甲氧基、苯乙氧基等之C7-18芳烷氧基等。作為前述醯氧基,例如,可舉出乙醯氧基、丙醯氧基、(甲基)丙烯醯氧基、苯甲醯氧基等之C1-12醯氧基等。 The alkoxy group may, for example, be a C 1-6 alkoxy group such as a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group or an isobutoxy group (preferably C). 1-4 alkoxy) and the like. The above-mentioned alkenyloxy group may, for example, be a C 2-6 alkenyloxy group (preferably a C 2-4 alkenyloxy group) such as an allyloxy group. The aryloxy group may, for example, be a phenoxy group, a tolyloxy group or a naphthyloxy group, and may have a C 1-4 alkyl group, a C 2-4 alkenyl group, a halogen atom or a C 1-4 in the aromatic ring. A C 6-14 aryloxy group or the like which is a substituent of an alkoxy group or the like. Examples of the aralkyloxy group include a C 7-18 aralkyloxy group such as a benzyloxy group or a phenethyloxy group. Examples of the above-mentioned decyloxy group include a C 1-12 decyloxy group such as an ethoxycarbonyl group, a propyl decyloxy group, a (meth) acryloxy group, or a benzyl methoxy group.

作為前述烷硫基,例如,可舉出甲硫基、乙硫基等之C1-6烷硫基(較佳為C1-4烷硫基)等。作為前述烯硫基,例如,可舉出烯丙硫基等之C2-6烯硫基(較佳為C2-4烯硫基)等。作為前述芳硫基,例如,可舉出苯硫基、甲苯硫基、萘硫基等之可在芳香環具有C1-4烷基、C2-4烯基、鹵原子、C1-4烷氧基等之取代基的C6-14芳硫基等。作為前述芳烷硫基,例如,可舉出苯甲硫基、苯乙硫基等之C7-18芳烷硫基等。作為前述烷氧羰基,例如,可舉出甲氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等之C1-6烷氧基-羰基等。作為前述芳氧羰基,例如,可舉出苯氧羰基、甲苯氧羰基、萘氧羰基等之C6-14芳氧-羰基等。作為前述芳烷氧羰基,例如,可舉出苯甲氧羰基等之C7-18芳烷氧基-羰基等。作為前述單或二烷胺基,可舉出甲胺基、乙胺基、二甲胺基、二乙胺基等之單或二-C1-6烷胺基等。作為前述醯胺基,例如,可舉出乙醯胺基、丙醯胺基、苯甲醯胺基等之C1-11醯胺基等。作為前述含有環氧基的基,例如,可舉出環氧丙基、環氧丙氧基、3,4-環氧環 己基等。作為前述含有氧雜環丁烷基的基,例如,可舉出乙基氧雜環丁烷氧基等。作為前述醯基,例如,可舉出乙醯基、丙醯基、苯甲醯基等。作為前述鹵原子,可舉出氯原子、溴原子、碘原子等。 The alkylthio group may, for example, be a C 1-6 alkylthio group such as a methylthio group or an ethylthio group (preferably a C 1-4 alkylthio group). The above-mentioned olefinyl group may, for example, be a C 2-6 olefinyl group (preferably a C 2-4 olefinyl group) such as an allylthio group. The arylthio group may, for example, be a phenylthio group, a tolylthio group or a naphthylthio group, and may have a C 1-4 alkyl group, a C 2-4 alkenyl group, a halogen atom, or a C 1-4 in the aromatic ring. A C 6-14 arylthio group or the like of a substituent such as an alkoxy group. Examples of the aralkylthio group include a C 7-18 aralkylthio group such as a phenylmethylthio group or a phenethylthio group. The alkoxycarbonyl group may, for example, be a C 1-6 alkoxy-carbonyl group such as a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group or a butoxycarbonyl group. Examples of the aryloxycarbonyl group include a C 6-14 aryloxy-carbonyl group such as a phenoxycarbonyl group, a tolyloxycarbonyl group or a naphthyloxycarbonyl group. The aralkyloxycarbonyl group may, for example, be a C 7-18 aralkyloxy-carbonyl group such as a benzyloxycarbonyl group. The mono- or dialkylamino group may, for example, be a mono- or di-C 1-6 alkylamino group such as a methylamino group, an ethylamino group, a dimethylamino group or a diethylamino group. Examples of the guanamine group include a C 1-11 guanamine group such as an acetamino group, a acrylamide group, or a benzylamino group. Examples of the epoxy group-containing group include a glycidyl group, a glycidoxy group, and a 3,4-epoxycyclohexyl group. The oxetane group-containing group may, for example, be an ethyloxetaneoxy group or the like. Examples of the thiol group include an ethyl fluorenyl group, a propyl fluorenyl group, and a benzamidine group. Examples of the halogen atom include a chlorine atom, a bromine atom, and an iodine atom.

前述一價雜環式基,亦可具有取代基。作為前述取代基,可示列出與前述一價烴基可具有的取代基同樣者。 The above monovalent heterocyclic group may have a substituent. The substituent may be the same as the substituent which the above-mentioned monovalent hydrocarbon group may have.

作為前述一價烴基、一價雜環式基,更具體而言,例如,可舉出甲基、乙基、丙基、異丙基、丁基、己基、辛基、癸基、苯基、萘基、蒽基、苯甲基、苯乙基、吡啶基、呋喃基、噻吩基、乙烯基、烯丙基、苯乙烯基(例如,p-苯乙烯基)、具有取代基的烴基(例如,2-(3,4-環氧環己基)乙基、3-環氧丙基丙基、3-甲基丙烯醯氧丙基、3-丙烯醯氧丙基、N-2-(胺乙基)-3-胺丙基、3-胺丙基、N-苯基-3-胺丙基、3-巰丙基、3-異氰酸酯丙基等)等。 Specific examples of the monovalent hydrocarbon group and the monovalent heterocyclic group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a hexyl group, an octyl group, a decyl group, and a phenyl group. Naphthyl, anthracenyl, benzyl, phenethyl, pyridyl, furyl, thienyl, vinyl, allyl, styryl (eg, p-styryl), substituted hydrocarbyl (eg , 2-(3,4-epoxycyclohexyl)ethyl, 3-epoxypropylpropyl, 3-methylpropenyloxypropyl, 3-propenyloxypropyl, N-2-(amine B ))-3-aminopropyl, 3-aminopropyl, N-phenyl-3-aminopropyl, 3-mercaptopropyl, 3-isocyanatepropyl, etc.).

前述式(6)中之R21~R26可各別相同,亦可不同。 R 21 to R 26 in the above formula (6) may be the same or different.

式(6)中,R27表示二價烴基。作為前述二價烴基,例如,可舉出直鏈狀或分支鏈狀的伸烷基、二價脂環式烴基、二價芳香族烴基等。作為直鏈狀或分支鏈狀的伸烷基,例如,可舉出亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基等之碳數為1~18的直鏈狀或分支鏈狀之伸烷基。作為二價脂環式烴基,例如,可舉出1,2-伸環戊基、1,3-伸環戊基、亞環戊基、 1,2-伸環己基、1,3-伸環己基、1,4-伸環己基、亞環己基等之二價伸環烷基(包含亞環烷基)。作為二價芳香族烴基,例如,可舉出1,2-伸苯基、1,3-伸苯基、1,4-伸苯基、4,4’-聯伸苯基、伸萘基等。其中,作為R27,碳數1~8(特別是碳數1~5)之直鏈狀或分支鏈狀的伸烷基較佳,更佳為伸乙基。 In the formula (6), R 27 represents a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include a linear or branched alkyl group, a divalent alicyclic hydrocarbon group, and a divalent aromatic hydrocarbon group. Examples of the linear alkyl group or the branched alkyl group include a methylene group, a methylmethylene group, a dimethylmethylene group, an exoethyl group, a propyl group, and a trimethylene group. It is a linear or branched chain alkyl group of 1 to 18. The divalent alicyclic hydrocarbon group may, for example, be a 1,2-cyclopentyl group, a 1,3-cyclopentyl group, a cyclopentylene group, a 1,2-cyclohexylene group, or a 1,3-extension ring. A divalent cycloalkylene group (including a cycloalkylene group) of a hexyl group, a 1,4-cyclohexylene group, a cyclohexylene group or the like. Examples of the divalent aromatic hydrocarbon group include a 1,2-phenylene group, a 1,3-phenylene group, a 1,4-phenylene group, a 4,4'-linked phenyl group, an extended naphthyl group, and the like. . Among them, as R 27 , a linear or branched alkyl group having 1 to 8 carbon atoms (particularly, a carbon number of 1 to 5) is preferred, and an ethyl group is more preferred.

式(6)中,r表示1以上的整數。r為2以上的整數時,附有r之括弧內的結構,各別可為相同,亦可為不同。附有r之括弧內的結構各別不同時,各結構之間的附加形態並沒有特別限定,可為無規型,亦可為嵌段型。又,式(6)中,s表示1以上的整數。s為2以上的整數時,附有s之括弧內的結構,各別可為相同,亦可為不同。附有s之括弧內的結構各別不同時,各結構之間的附加形態並沒有特別限定,可為無規型,亦可為嵌段型。再者,在式(6)中,附有r之括弧內的結構與附有s之括弧內的結構之附加形態並沒有特別限定,可為無規型,亦可為嵌段型。再者,r與s,可為相同,亦可為不同。亦即,式(6)中,r、s可相同或不同,且各別表示1以上的整數。 In the formula (6), r represents an integer of 1 or more. When r is an integer of 2 or more, the structure enclosed in the parentheses of r may be the same or different. When the structures in the brackets with r are different, the additional form between the structures is not particularly limited, and may be a random type or a block type. Further, in the formula (6), s represents an integer of 1 or more. When s is an integer of 2 or more, the structure enclosed in the brackets of s may be the same or different. When the structures in the brackets attached with s are different from each other, the additional form between the structures is not particularly limited, and may be a random type or a block type. Further, in the formula (6), the configuration in which the structure in the brackets of r is attached and the structure in which the structure in the brackets are attached is not particularly limited, and may be a random type or a block type. Furthermore, r and s may be the same or different. That is, in the formula (6), r and s may be the same or different, and each represents an integer of 1 or more.

前述聚有機矽氧烷基矽烷基烯之末端結構,並沒有特別限定,例如,可舉出矽烷醇基、烷氧矽烷基、三烷基矽烷基(例如,三甲基矽基)等。在前述聚有機矽氧烷基矽烷基烯的末端,亦可導入包含脂肪族碳-碳雙鍵的基或氫矽烷基等之各種的基。 The terminal structure of the polyorganophosphonylalkylene alkylene is not particularly limited, and examples thereof include a decyl alcohol group, an alkoxyalkyl group, and a trialkylalkyl group (for example, trimethyl fluorenyl group). At the terminal of the polyorganophosphonylalkylene alkylene, various groups including an aliphatic carbon-carbon double bond group or a hydroalkylene group may be introduced.

前述聚有機矽氧烷基矽烷基烯,如前述,亦可為具有直鏈、分支鏈中之任一者的鏈狀結構者。作為 前述聚有機矽氧烷基矽烷基烯,例如,具有分支鏈,且具有芳基的聚有機矽氧烷基矽烷基烯較為理想。 The polyorganophosphonylalkylene alkylene may be a chain structure having either a linear chain or a branched chain as described above. As The above polyorganophosphonylalkylene alkylene, for example, a polyorganophosphonylalkylene alkylene having a branched chain and having an aryl group is preferred.

作為前述聚有機矽氧烷基矽烷基烯,例如,可舉出GD-1130A(長興化學工業(股)製)、GD-1130B(長興化學工業(股)製)等。 For example, GD-1130A (manufactured by Changxing Chemical Industry Co., Ltd.), GD-1130B (manufactured by Changxing Chemical Industry Co., Ltd.), and the like can be given as the polyorganophosphonylalkylene alkylene.

作為聚有機矽氧烷(A),使用2種以上(特別是2種)的前述聚有機矽氧烷基矽烷基烯較為理想。其中,從相對於腐蝕性氣體的阻隔性之觀點,使用含有具有脂肪族碳-碳雙鍵的基且具有芳基的聚有機矽氧烷基矽烷基烯,與含有具有脂肪族碳-碳雙鍵的基、具有Si-H鍵的基、及芳基的聚有機矽氧烷基矽烷基烯之2種較為理想。 As the polyorganosiloxane (A), two or more (particularly two) of the above polyorganophosphonylalkylene alkylenes are preferably used. Among them, from the viewpoint of barrier property against a corrosive gas, a polyorganophosphonium alkylene alkylene having a group having an aliphatic carbon-carbon double bond and having an aryl group is used, and contains an aliphatic carbon-carbon double Two types of a bond group, a group having a Si-H bond, and a polyorganooxyalkylalkylalkylene group having an aryl group are preferred.

使用聚有機矽氧烷(A)2種以上時,相對於本發明的硬化性樹脂組成物之聚有機矽氧烷(A)的全量(100重量%)之聚有機矽氧烷基矽烷基烯的比例,並沒有特別限定,但60重量%以上(例如,60~100重量%)較佳,更佳為80重量%以上(例如,80~99.5重量%),特佳為90重量%以上。聚有機矽氧烷基矽烷基烯之比例小於60重量%時,有硬化物容易黃變,表面容易具有黏著性之處理性下降的傾向。 When the polyorganosiloxane (A) is used in two or more kinds, the total amount (100% by weight) of the polyorganooxyalkylene alkylene of the polyorganosiloxane (A) of the curable resin composition of the present invention is 100% by weight. The ratio is not particularly limited, but is preferably 60% by weight or more (for example, 60 to 100% by weight), more preferably 80% by weight or more (for example, 80 to 99.5% by weight), and particularly preferably 90% by weight or more. When the proportion of the polyorganooxyalkylalkylalkylene is less than 60% by weight, the cured product tends to be yellowish, and the surface tends to have a tendency to be lowered in adhesion.

[具有脂肪族碳-碳雙鍵的聚有機矽氧烷(A1)] [Polyorganosiloxane (A1) having an aliphatic carbon-carbon double bond]

本發明的硬化性樹脂組成物,亦可包含具有脂肪族碳-碳雙鍵的聚有機矽氧烷(A1)(在本說明書中,有時簡稱為「聚有機矽氧烷(A1)」)作為聚有機矽氧烷(A)。只要構成聚有機矽氧烷(A1)之任何一個部分結構及/或構成成分具有前述脂肪族碳-碳雙鍵即可。亦可聚有機矽氧 烷(A1)之取代基(例如,矽原子具有的取代基)具有前述脂肪族碳-碳雙鍵。又,前述脂肪族碳-碳雙鍵,亦可存在於聚有機矽氧烷(A1)之矽氧烷鍵(Si-O-Si)所構成的主鏈(直鏈及/或分支鏈)之末端。 The curable resin composition of the present invention may further comprise a polyorganosiloxane (A1) having an aliphatic carbon-carbon double bond (in the present specification, it may be simply referred to as "polyorganosiloxane (A1)"). As polyorganosiloxane (A). Any one of the partial structures and/or constituent components constituting the polyorganosiloxane (A1) may have the aforementioned aliphatic carbon-carbon double bond. Polyorgano-oxygen The substituent of the alkane (A1) (for example, a substituent possessed by a ruthenium atom) has the aforementioned aliphatic carbon-carbon double bond. Further, the aliphatic carbon-carbon double bond may be present in a main chain (straight chain and/or branched chain) composed of a decane bond (Si-O-Si) of a polyorganosiloxane (A1). End.

作為前述具有脂肪族碳-碳雙鍵的基,例如,可舉出乙烯基、烯丙基、甲代烯丙基、1-丙烯基、異丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、5-己烯基等之C2-20烯基(較佳為C2-10烯基,更佳為C2-4烯基);環己烯基等之C3-12的環烯基;雙環庚烯基等之C4-15交聯環式不飽和烴基;苯乙烯基等之C2-4烯基取代芳基;肉桂基等。再者,在前述具有脂肪族碳-碳雙鍵的基中,於前述式(4)所示的基中,也包含3個R'中之至少1個為前述之C2-20烯基、C3-12的環烯基、C4-15的交聯環式不飽和烴基、C2-4烯基取代芳基、肉桂基等之基。其中,烯基較佳,更佳為C2-20烯基,特佳為乙烯基。 Examples of the group having an aliphatic carbon-carbon double bond include a vinyl group, an allyl group, a methallyl group, a 1-propenyl group, an isopropenyl group, a 1-butenyl group, and a 2-butene group. a C 2-20 alkenyl group (preferably C, 3-butenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 5-hexenyl, etc.) C2-10 alkenyl, more preferably C 2-4 alkenyl); cyclohexenyl, etc. the C 3-12 cycloalkenyl; bicyclic heptenyl group of crosslinking a 4-15 C cyclic unsaturated hydrocarbon group; a C 2-4 alkenyl group substituted with an aryl group or the like; a cinnamyl group or the like. Further, in the foregoing having aliphatic carbon - carbon double bonds, in the group represented by formula (4) it was also included three R 'is at least one of the aforementioned C 2-20 alkenyl group, a group of a C 3-12 cycloalkenyl group, a C 4-15 crosslinked cyclic unsaturated hydrocarbon group, a C 2-4 alkenyl substituted aryl group, a cinnamyl group or the like. Among them, an alkenyl group is preferred, and a C 2-20 alkenyl group is more preferred, and a vinyl group is particularly preferred.

相對於聚有機矽氧烷(A)之全量(100重量%)的前述脂肪族碳-碳雙鍵之含量(乙烯基換算),並沒有特別限定,但1.5~15.0重量%較佳,2.0~13.0重量%更佳,3.0~12.0重量%特佳。藉由在前述範圍具有前述脂肪族碳-碳雙鍵,有容易得到所得之硬化物的耐熱性等之各種物性、耐裂縫性、相對於腐蝕性氣體之阻隔性均佳的硬化物之傾向。再者,前述脂肪族碳-碳雙鍵之含量,例如,可藉由1H-NMR等進行測定。 The content of the aliphatic carbon-carbon double bond (vinyl equivalent) of the total amount (100% by weight) of the polyorganosiloxane (A) is not particularly limited, but is preferably 1.5 to 15.0% by weight, 2.0~. More preferably, it is 13.0% by weight, and particularly preferably 3.0 to 12.0% by weight. By having the aliphatic carbon-carbon double bond in the above range, it is easy to obtain a cured product having various physical properties such as heat resistance of the obtained cured product, crack resistance, and barrier property against a corrosive gas. Further, the content of the aliphatic carbon-carbon double bond can be measured, for example, by 1 H-NMR or the like.

[具有Si-H鍵的聚有機矽氧烷(A2)] [Polyorganosiloxane (A2) having Si-H bond]

本發明的硬化性樹脂組成物,亦可包含具有Si-H鍵的聚有機矽氧烷(A2)(在本說明書中,有時簡稱為「聚有機矽氧烷(A2)」)作為聚有機矽氧烷(A)。只要構成聚有機矽氧烷(A2)之任何一個部分結構及/或構成成分具有前述Si-H鍵即可。再者,亦可聚有機矽氧烷(A2)之取代基(例如,矽原子具有的取代基)具有前述Si-H鍵。又,前述Si-H鍵,亦可存在於聚有機矽氧烷(A2)之矽氧烷鍵(Si-O-Si)所構成的主鏈(直鏈及/或分支鏈)之末端。 The curable resin composition of the present invention may further comprise a polyorganosiloxane (A2) having a Si-H bond (in the present specification, sometimes referred to as "polyorganosiloxane (A2)") as a polyorganic organic compound. Oxane (A). Any one of the partial structures and/or constituent components constituting the polyorganosiloxane (A2) may have the aforementioned Si-H bond. Further, a substituent of the polyorganosiloxane (A2) (for example, a substituent possessed by a ruthenium atom) may have the aforementioned Si-H bond. Further, the Si-H bond may be present at the end of a main chain (straight chain and/or branched chain) composed of a decane bond (Si-O-Si) of a polyorganosiloxane (A2).

作為前述具有Si-H鍵的基,並沒有特別限定,例如,可舉出在前述式(4)所示的基中,3個R'中之至少1個為氫原子的基等。 As the group having a Si-H bond is not particularly limited, and examples thereof include the groups represented by the formula (4), the three R 'is at least one of the hydrogen atoms of the group.

相對於聚有機矽氧烷(A)之全量(100重量%)的前述Si-H鍵之含量,並沒有特別限定,但以氫原子或Si-H鍵之H(氫化物)的重量換算(H換算)為0.01~0.50重量%較佳,0.05~0.30重量%更佳,0.08~0.20重量%特佳。藉由在前述範圍具有前述Si-H鍵,有容易得到所得之硬化物的耐熱性等之各種物性、耐裂縫性、相對於腐蝕性氣體之阻隔性均佳的硬化物之傾向。再者,前述Si-H鍵之含量,例如,可藉由1H-NMR等進行測定。 The content of the Si-H bond in the total amount (100% by weight) of the polyorganosiloxane (A) is not particularly limited, but is converted by the weight of hydrogen atom or H (hydride) of Si-H bond ( The H conversion is preferably 0.01 to 0.50% by weight, more preferably 0.05 to 0.30% by weight, and particularly preferably 0.08 to 0.20% by weight. By having the Si-H bond in the above range, it is easy to obtain a cured product having various physical properties such as heat resistance of the obtained cured product, crack resistance, and barrier property against a corrosive gas. Further, the content of the Si-H bond can be measured, for example, by 1 H-NMR or the like.

相對於聚有機矽氧烷(A)之全量(合計含量,100重量%)的聚有機矽氧烷(A2)之含量,並沒有特別限定,但50重量%以上較佳,80重量%以上更佳。藉由在前述範圍含有聚有機矽氧烷(A2),有容易得到所得之硬化物的耐熱性等之各種物性、耐裂縫性、相對於腐蝕性氣體之阻隔性均佳的硬化物之傾向。 The content of the polyorganosiloxane (A2) based on the total amount (total content, 100% by weight) of the polyorganosiloxane (A) is not particularly limited, but is preferably 50% by weight or more, and more preferably 80% by weight or more. good. By containing the polyorganosiloxane (A2) in the above range, it is easy to obtain a cured product having various physical properties such as heat resistance of the obtained cured product, crack resistance, and barrier property against a corrosive gas.

聚有機矽氧烷(A)之脂肪族碳-碳雙鍵的含量(乙烯基換算)a1(mol/g)與Si-H鍵的含量(H換算)a2(mol/g)之比率a1/a2為0.80~1.10較佳,0.90~1.05更佳,0.95~1.00特佳。藉由使a1/a2成為1.10以下,尤可提高相對於腐蝕性氣體之阻隔性。又,藉由使a1/a2成為0.80以上,尤可提高耐裂縫性等之強度。 The ratio of the aliphatic carbon-carbon double bond of the polyorganosiloxane (A) (vinyl equivalent) a1 (mol/g) to the content of the Si-H bond (in terms of H) a2 (mol/g) a1/ A2 is preferably 0.80~1.10, 0.90~1.05 is better, and 0.95~1.00 is especially good. By making a1/a2 1.10 or less, the barrier property with respect to a corrosive gas can be improved especially. Further, by setting a1/a2 to 0.80 or more, the strength such as crack resistance can be particularly improved.

再者,聚有機矽氧烷(A1)可同時為具有Si-H鍵的聚有機矽氧烷(A2),或者,聚有機矽氧烷(A2)亦可同時為具有脂肪族碳-碳雙鍵的聚有機矽氧烷(A1)。 Furthermore, the polyorganosiloxane (A1) may be a polyorganosiloxane (A2) having a Si-H bond, or the polyorganosiloxane (A2) may also have an aliphatic carbon-carbon double Key polyorganooxane (A1).

又,聚有機矽氧烷(A),可僅以聚有機矽氧烷(A1)或聚有機矽氧烷(A2)中之任一方構成,或者,聚有機矽氧烷(A)亦可以相互不同之2種以上的聚有機矽氧烷(A1)及/或聚有機矽氧烷(A2)構成。 Further, the polyorganosiloxane (A) may be constituted by only one of polyorganosiloxane (A1) or polyorganosiloxane (A2), or the polyorganosiloxane (A) may be mutually It is composed of two or more kinds of polyorganosiloxane (A1) and/or polyorganosiloxane (A2).

又,聚有機矽氧烷(A)以相互不同之2種以上的聚有機矽氧烷構成時,前述2種以上的聚有機矽氧烷之中,至少1種為聚有機矽氧烷(A2)的情況中,排除聚有機矽氧烷(A2)之前述2種以上的聚有機矽氧烷為聚有機矽氧烷(A1)較佳。 Further, when the polyorganosiloxane (A) is composed of two or more kinds of polyorganosiloxanes different from each other, at least one of the two or more polyorganosiloxanes is a polyorganosiloxane (A2). In the case of the polyorganosiloxane (A2), it is preferred to use the polyorganosiloxane (A1).

[異三聚氰酸酯化合物(B)] [Iso-cyanurate compound (B)]

本發明的硬化性樹脂組成物係包含異三聚氰酸酯化合物(B)。本發明的硬化性樹脂組成物,藉由包含異三聚氰酸酯化合物(B),特別是利用硬化形成的硬化物相對於腐蝕性氣體的阻隔性會提升,再者,對於包覆體之密合性將提升。其中,異三聚氰酸酯化合物(B)包含式(1)所示的異三聚氰酸酯化合物較為理想。尤其,異三聚氰酸酯 化合物(B)僅為式(1)所示的異三聚氰酸酯化合物較佳。 The curable resin composition of the present invention contains the isomeric cyanurate compound (B). The curable resin composition of the present invention, by containing the isomeric cyanurate compound (B), particularly the cured product formed by hardening, has an improved barrier property against corrosive gas, and further, for the covering body The adhesion will increase. Among them, the isomeric isocyanate compound (B) preferably contains an isomeric cyanurate compound represented by the formula (1). In particular, isomeric cyanurate The compound (B) is preferably only an isomeric cyanurate compound represented by the formula (1).

式(1)中,Rx、Ry、Rz可相同或不同,並表示前述式(2)所示的基、或前述式(3)所示的基。其中,式(1)的Rx、Ry、Rz之中,任一個以上(較佳為1個或2個,更佳為1個)為前述式(3)所示的基較佳。 In the formula (1), R x , R y and R z may be the same or different, and represent a group represented by the above formula (2) or a group represented by the above formula (3). Among them, one or more (preferably one or two, more preferably one) of R x , R y and R z in the formula (1) is preferably a group represented by the above formula (3).

式(2)及式(3)中,R1、R2可相同或不同,且表示氫原子或碳數1~8之直鏈狀或分支鏈狀的烷基。作為碳數1~8之直鏈狀或分支鏈狀的烷基,例如,可舉出甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、戊基、己基、庚基、辛基、乙基己基等。前述烷基之中,尤以甲基、乙基、丙基、異丙基等之碳數1~3的直鏈狀或分支鏈狀之烷基較為理想。式(2)及式(3)之R1、R2各別為氫原子特為理想。 In the formulae (2) and (3), R 1 and R 2 may be the same or different and each represents a hydrogen atom or a linear or branched alkyl group having 1 to 8 carbon atoms. Examples of the linear or branched chain alkyl group having 1 to 8 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, and a pentyl group. , hexyl, heptyl, octyl, ethylhexyl and the like. Among the alkyl groups, a linear or branched alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group or an isopropyl group is preferable. It is particularly preferable that each of R 1 and R 2 in the formula (2) and the formula (3) is a hydrogen atom.

作為前述異三聚氰酸酯化合物(B),並沒有特別限定,例如,可舉出單烯丙基二甲基異三聚氰酸酯、二烯丙基單甲基異三聚氰酸酯、三烯丙基異三聚氰酸酯、單烯丙基二環氧丙基異三聚氰酸酯、二烯丙基單環氧丙基異三聚氰酸酯、三環氧丙基異三聚氰酸酯、1-烯丙基-3,5-雙(2-甲基環氧丙基)異三聚氰酸酯、1-(2-甲基丙烯基)-3,5-二環氧丙基異三聚氰酸酯、1-(2-甲基丙烯基)-3,5-雙(2-甲基環氧丙基)異三聚氰酸酯、1,3-二烯丙基-5-(2-甲基環氧丙基)異三聚氰酸酯、1,3-雙(2-甲基丙烯基)-5-環氧丙基異三聚氰酸酯、1,3-雙(2-甲基丙烯基)-5-(2-甲基環氧丙基)異三聚氰酸酯、參(2-甲基丙烯基)異三聚氰酸酯等。其中尤以單烯丙基二環氧丙基異三聚 氰酸酯較為理想。再者,前述異三聚氰酸酯化合物(B),可各別單獨使用1種,或者組合2種以上而使用。 The heteropolycyanate compound (B) is not particularly limited, and examples thereof include monoallyldimethylisophthalocyanate and diallyl monomethylisocyanate. , triallyl isocyanurate, monoallyl propylene oxide isopropyl isocyanate, diallyl monoepoxy propyl isocyanurate, trisepoxypropyl Cyanurate, 1-allyl-3,5-bis(2-methylepoxypropyl)isocyanate, 1-(2-methylpropenyl)-3,5-di Epoxypropyl iso-isocyanate, 1-(2-methylpropenyl)-3,5-bis(2-methylepoxypropyl)isocyanate, 1,3-dienes Propyl-5-(2-methylepoxypropyl)isocyanate, 1,3-bis(2-methylpropenyl)-5-epoxypropyl isocyanate, 1 , 3-bis(2-methacryl)-5-(2-methylepoxypropyl)isocyanate, ginseng (2-methacryl)isomeric cyanurate, and the like. Monoallyl epoxypropyl isotrimer Cyanate esters are preferred. In addition, the above-mentioned isocyanurate compound (B) may be used alone or in combination of two or more.

從提升與其他成分之相溶性的觀點,如後述,異三聚氰酸酯化合物(B)亦可與矽烷偶合劑預先混合之後與其他成分摻合。 From the viewpoint of improving the compatibility with other components, the isomeric cyanurate compound (B) may be previously mixed with a decane coupling agent and then blended with other components as will be described later.

異三聚氰酸酯化合物(B)之含量,並沒有特別限定,但相對於硬化性樹脂組成物之全量(100重量%)為0.01~10重量%較佳,0.05~5重量%更佳,0.1~3重量%最佳。異三聚氰酸酯化合物(B)之含量小於0.01重量%時,有硬化物相對於腐蝕性氣體之阻隔性、相對於包覆體之密合性下降的情況。另一方面,異三聚氰酸酯化合物(B)之含量超過10重量%時,有在硬化性樹脂組成物中析出固體,硬化物白濁的情況。前述異三聚氰酸酯化合物(B)之比例,並沒有特別限定,但從硬化物相對於腐蝕性氣體的阻隔性之觀點,例如,相對於聚有機矽氧烷(A)與倍半矽氧烷(D)之合計量(100重量份)為0.01~0.5重量份較佳。 The content of the isocyanurate compound (B) is not particularly limited, but is preferably 0.01 to 10% by weight, more preferably 0.05 to 5% by weight, based on the total amount (100% by weight) of the curable resin composition. 0.1 to 3 wt% is optimal. When the content of the isocyanurate compound (B) is less than 0.01% by weight, the barrier property of the cured product with respect to the corrosive gas and the adhesion to the coating body may be lowered. On the other hand, when the content of the isocyanurate compound (B) exceeds 10% by weight, solids may be precipitated in the curable resin composition, and the cured product may be cloudy. The ratio of the above heteropolycyanate compound (B) is not particularly limited, but from the viewpoint of the barrier property of the cured product with respect to the corrosive gas, for example, with respect to the polyorganosiloxane (A) and the sesquiterpene The total amount (100 parts by weight) of the oxyalkylene (D) is preferably 0.01 to 0.5 part by weight.

[矽烷偶合劑(C)] [decane coupling agent (C)]

本發明的硬化性樹脂組成物,亦可包含矽烷偶合劑(C)。本發明的硬化性樹脂組成物藉由包含矽烷偶合劑(C),硬化物相對於腐蝕性氣體之阻隔性會進一步提升,且特別是相對於包覆體之密合性將提升。 The curable resin composition of the present invention may further contain a decane coupling agent (C). When the curable resin composition of the present invention contains the decane coupling agent (C), the barrier property of the cured product with respect to the corrosive gas is further improved, and in particular, the adhesion to the coating body is improved.

矽烷偶合劑(C)與聚有機矽氧烷(A)及異三聚氰酸酯化合物(B)等之相溶性為良好,因此例如為了提升相對於異三聚氰酸酯化合物(B)之其他成分的相溶性,以 預先形成異三聚氰酸酯化合物(B)與矽烷偶合劑(C)之組成物為前提,與其他成分摻合的話,容易得到均勻的硬化性樹脂組成物。 The compatibility of the decane coupling agent (C) with the polyorganosiloxane (A) and the isocyanurate compound (B) is good, and thus, for example, for the purpose of enhancing the relative isocyanate compound (B) Compatibility of other ingredients, It is premised that the composition of the isomeric cyanurate compound (B) and the decane coupling agent (C) is formed in advance, and when it is blended with other components, a uniform curable resin composition is easily obtained.

作為矽烷偶合劑(C),可使用周知乃至慣用的矽烷偶合劑,且沒有特別限定,例如,可舉出3-環氧丙氧基丙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷等之含有環氧基的矽烷偶合劑;N-2-(胺乙基)-3-胺丙基甲基二甲氧基矽烷、N-2-(胺乙基)-3-胺丙基三甲氧基矽烷、N-2-(胺乙基)-3-胺丙基三乙氧基矽烷、3-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基)丙胺、N-苯基-3-胺丙基三甲氧基矽烷、N-(乙烯基苯甲基)-2-胺乙基-3-胺丙基三甲氧基矽烷之鹽酸鹽、N-(β-胺乙基)-γ-胺丙基甲基二乙氧基矽烷等之含有胺基的矽烷偶合劑;四甲氧基矽烷、四乙氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、甲基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基參(甲氧基乙氧基矽烷)、苯基三甲氧基矽烷、二苯基二甲氧基矽烷、乙烯基三乙醯氧基矽烷、γ-(甲基)丙烯醯氧丙基三乙氧基矽烷、γ-(甲基)丙烯醯氧丙基三甲氧基矽烷、γ-(甲基)丙烯醯氧丙基甲基二甲氧基矽烷、γ-(甲基)丙烯醯氧丙基甲基二乙氧基矽烷、巰基伸丙基三甲氧基矽烷、巰基伸丙基三乙氧基矽烷等。其中,尤能適用含有環氧基的矽烷偶合劑(特別是3-環氧丙氧基丙基三甲氧基矽烷)。再者,前述 矽烷偶合劑(C),可單獨使用1種,或者組合2種以上而使用。 As the decane coupling agent (C), a known or even a conventional decane coupling agent can be used, and is not particularly limited, and examples thereof include 3-glycidoxypropyltrimethoxydecane and 2-(3,4-ring). Epoxy-containing decane such as oxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, 3-glycidoxypropyltriethoxydecane, etc. Coupling agent; N-2-(aminoethyl)-3-aminopropylmethyldimethoxydecane, N-2-(aminoethyl)-3-aminopropyltrimethoxydecane, N-2- (Amineethyl)-3-aminopropyltriethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-triethoxydecyl-N-( 1,3-Dimethyl-butylidene)propylamine, N-phenyl-3-aminopropyltrimethoxydecane, N-(vinylbenzyl)-2-amineethyl-3-aminepropyltrimethyl An amine group-containing decane coupling agent such as oxydecane hydrochloride or N-(β-aminoethyl)-γ-aminopropylmethyldiethoxy decane; tetramethoxy decane, tetraethoxy矽, methyl triethoxy decane, dimethyl diethoxy decane, methyl triethoxy decane, vinyl triethoxy decane, vinyl three Oxydecane, vinyl ginseng (methoxyethoxy decane), phenyl trimethoxy decane, diphenyl dimethoxy decane, vinyl triethoxy decane, γ-(methyl) propylene oxime Oxypropyl triethoxy decane, γ-(meth) propylene oxypropyl trimethoxy decane, γ-(methyl) propylene methoxypropyl methyl dimethoxy decane, γ-(methyl) Propylene oxime propyl methyl diethoxy decane, decyl propyl trimethoxy decane, decyl propyl triethoxy decane, and the like. Among them, a decane coupling agent containing an epoxy group (particularly 3-glycidoxypropyltrimethoxydecane) can be suitably used. Furthermore, the foregoing The decane coupling agent (C) may be used alone or in combination of two or more.

矽烷偶合劑(C)之含量,並沒有特別限定,但相對於硬化性樹脂組成物之全量(100重量%)為0.01~15重量%較佳,0.1~10重量%更佳,0.5~5重量%特佳。矽烷偶合劑(C)之含量小於0.01重量%時,有相對於包覆體之密合性下降,特別是在與異三聚氰酸酯化合物(B)相溶而使用之際無法得到充分的效果(例如,硬化物相對於腐蝕性氣體之阻隔性等)之情況。另一方面,矽烷偶合劑之含量超過15重量%時,有硬化變不足夠,且硬化物之韌性、耐熱性、相對於腐蝕性氣之阻隔性均下降的情況。 The content of the decane coupling agent (C) is not particularly limited, but is preferably 0.01 to 15% by weight, more preferably 0.1 to 10% by weight, and preferably 0.5 to 5 parts by weight based on the total amount (100% by weight) of the curable resin composition. % is particularly good. When the content of the decane coupling agent (C) is less than 0.01% by weight, the adhesion to the coating body is lowered, and in particular, it is not sufficiently obtained when it is used in combination with the isocyanurate compound (B). The effect (for example, the barrier property of a hardened substance with respect to a corrosive gas, etc.). On the other hand, when the content of the decane coupling agent exceeds 15% by weight, the curing is insufficient, and the toughness, heat resistance, and barrier property against the corrosive gas of the cured product are both lowered.

[倍半矽氧烷(D)] [sesquioxane (D)]

本發明的硬化性樹脂組成物亦可進一步包含倍半矽氧烷(D)。前述倍半矽氧烷(D),並沒有特別限定,可舉出具有無規結構、籠狀結構、梯型結構的倍半矽氧烷,且將具有梯型結構的倍半矽氧烷作為主成分的倍半矽氧烷較為理想。倍半矽氧烷(D)包含梯型倍半矽氧烷作為主成分較為理想。其中,倍半矽氧烷(D)僅為梯型倍半矽氧烷更為理想。 The curable resin composition of the present invention may further contain sesquiterpene oxide (D). The sesquioxane (D) is not particularly limited, and examples thereof include a sesquioxane having a random structure, a cage structure, and a ladder structure, and a sesquiterpene having a ladder structure is used. The sesquioxanes of the main component are preferred. The sesquiterpene oxide (D) preferably contains ladder type sesquiterpene oxide as a main component. Among them, the sesquioxane (D) is more preferably a ladder type sesquioxane.

倍半矽氧烷為聚矽氧烷之一種。聚矽氧烷一般為具有矽氧烷鍵(Si-O-Si)所構成之主鏈的化合物,作為其基本構成單元,可舉出M單元(包含矽原子與1個氧原子鍵結之1價基的單元)、D單元(包含矽原子與2個氧原子鍵結之2價基的單元)、T單元(包含矽原子與3個氧原子鍵結之3價基的單元)、Q單元(包含矽原子與4個氧原子鍵結 之4價基的單元)。 The sesquioxane is one of polyoxyalkylenes. The polyoxyalkylene is generally a compound having a main chain composed of a siloxane chain (Si-O-Si), and as its basic constituent unit, an M unit (including a ruthenium atom bonded to one oxygen atom) a unit of a valence group, a unit D (a unit containing a divalent group in which a deuterium atom is bonded to two oxygen atoms), a T unit (a unit containing a trivalent group in which a deuterium atom is bonded to three oxygen atoms), and a Q unit. (contains a helium atom bonded to 4 oxygen atoms) The 4 valence unit).

倍半矽氧烷(D)係將前述T單元作為基本構成單元的聚矽氧烷,其實驗式(基本結構式)以RSiO1.5表示。作為倍半矽氧烷之Si-O-Si骨架的結構,可舉出無規結構、籠狀結構、梯型結構,梯型倍半矽氧烷係具有梯型結構之Si-O-Si骨架的結構之倍半矽氧烷。 The sesquiterpene oxide (D) is a polydecane which has the above T unit as a basic constituent unit, and its experimental formula (basic structural formula) is represented by RSiO 1.5 . Examples of the structure of the Si-O-Si skeleton of sesquioxane include a random structure, a cage structure, and a ladder structure, and a ladder type sesquiterpene oxide-based Si-O-Si skeleton having a ladder structure. The structure of sesquiterpene oxide.

前述倍半矽氧烷(D)亦可在分子內(一分子中)具有2個以上之脂肪族碳-碳雙鍵。又,前述倍半矽氧烷(D)亦可在分子內(一分子中)具有2個以上之具有Si-H鍵的基。再者,前述倍半矽氧烷(D)並沒有特別限定,但在室溫為液狀較為理想。前述倍半矽氧烷(D)可單獨使用1種,或者組合2種以上而使用。 The sesquioxane (D) may have two or more aliphatic carbon-carbon double bonds in a molecule (in one molecule). Further, the sesquiterpene oxide (D) may have two or more groups having a Si-H bond in a molecule (in one molecule). Further, the sesquiterpene oxide (D) is not particularly limited, but is preferably liquid at room temperature. The sesquioxane (D) may be used singly or in combination of two or more.

本發明的硬化性樹脂組成物包含倍半矽氧烷(D)時,特別是利用硬化形成的硬化物相對於腐蝕性氣體的阻隔性會提升,並且有強韌性(特別是耐裂縫性)提升的傾向。本發明的硬化性樹脂組成物之倍半矽氧烷(D)的含量(摻合量),並沒有特別限定,但相對於硬化性樹脂組成物之全量(100重量%)為0.01~30重量%較佳,0.1~20重量%更佳,0.5~10重量%特佳。 When the curable resin composition of the present invention contains sesquiterpene oxide (D), particularly, the cured product formed by hardening is improved in barrier property against corrosive gas, and has high toughness (especially crack resistance). Propensity. The content (doping amount) of the sesquiterpene oxide (D) of the curable resin composition of the present invention is not particularly limited, but is 0.01 to 30 by weight based on the total amount (100% by weight) of the curable resin composition. % is more preferable, 0.1 to 20% by weight is more preferable, and 0.5 to 10% by weight is particularly preferable.

[鋅化合物(E)] [Zinc compound (E)]

本發明的硬化性樹脂組成物係包含鋅化合物(E)。本發明的硬化性樹脂組成物,藉由包含前述鋅化合物(E),特別是有相對於H2S氣體之阻隔性提升的傾向。 The curable resin composition of the present invention contains a zinc compound (E). The curable resin composition of the present invention tends to have a higher barrier property against H 2 S gas by including the zinc compound (E).

作為前述鋅化合物(E),並沒有特別限定,例如,可舉出含有鋅的錯合物或金屬鹽等。例如,可舉出 雙乙醯基丙酮酸鋅、雙(辛烷-2,4-二酮基)鋅等之鋅二酮錯合物或環烷酸鋅、辛酸鋅、乙醯乙酸鋅、(甲基)丙烯酸鋅、新癸酸鋅等之羧酸鋅等所代表的有機鋅化合物、氧化鋅、錫酸鋅等之鋅氧化物所代表的無機鋅化合物、及該等之混合物。其中,尤以羧酸鋅較佳,特佳為環烷酸鋅、辛酸鋅。鋅化合物(E)至少包含羧酸鋅(特別是環烷酸鋅、辛酸鋅)較為理想。其中,鋅化合物(E)僅為羧酸鋅(特別是環烷酸鋅、辛酸鋅)更為理想。 The zinc compound (E) is not particularly limited, and examples thereof include a compound or a metal salt containing zinc. For example, Zinc diketone complex of zinc acetoacetate, bis(octane-2,4-dione)zinc or zinc naphthenate, zinc octoate, zinc acetate, zinc (meth)acrylate An inorganic zinc compound represented by a zinc carboxylate such as zinc neodecanoate or a zinc oxide represented by zinc oxide or zinc stannate, or a mixture thereof. Among them, zinc carboxylate is preferred, and zinc naphthenate and zinc octoate are particularly preferred. The zinc compound (E) preferably contains at least zinc carboxylate (particularly zinc naphthenate or zinc octoate). Among them, the zinc compound (E) is more preferably only a zinc carboxylate (particularly zinc naphthenate or zinc octoate).

前述鋅化合物(E),並沒有特別限定,但從相對於腐蝕性氣體的阻隔性之觀點,相對於化合物全重量(100重量%)之鋅含量,例如,2~30重量%較佳,更佳為5~20重量%,特佳為6~17重量%。 The zinc compound (E) is not particularly limited, but is preferably 2 to 30% by weight, based on the total weight (100% by weight) of the zinc compound, from the viewpoint of the barrier property against the corrosive gas. Preferably, it is 5 to 20% by weight, and particularly preferably 6 to 17% by weight.

前述鋅化合物(E)之含量,並沒有特別限定,但相對於前述聚有機矽氧烷(A)與前述倍半矽氧烷(D)之合計量(100重量份)(未包含倍半矽氧烷(D)時,聚有機矽氧烷(A)全量)為0.01重量份以上小於0.1重量份,0.03重量份以上小於0.1重量份較佳,0.05重量份以上小於0.1重量份更為理想,0.07重量份以上小於0.1重量份特佳。前述鋅化合物(E)之含量小於0.01重量份時,有相對於H2S氣體之阻隔性下降的情況。另一方面,前述鋅化合物(E)之含量為0.1重量份以上時,有相對於SOX氣體之阻隔性下降的情況。 The content of the zinc compound (E) is not particularly limited, but is a total amount (100 parts by weight) based on the polyorganosiloxane (A) and the sesquioxane (D) (excluding sesquiterpene). In the case of the oxyalkylene (D), the polyorganosiloxane (A) is preferably 0.01 parts by weight or more and less than 0.1 parts by weight, 0.03 parts by weight or more and less than 0.1 parts by weight, more preferably 0.05 parts by weight or more and less than 0.1 parts by weight. 0.07 parts by weight or more and less than 0.1 parts by weight is particularly preferred. When the content of the zinc compound (E) is less than 0.01 part by weight, the barrier property against the H 2 S gas may be lowered. On the other hand, when the content of the zinc compound (E) is 0.1 part by weight or more, the barrier property against the SO X gas may be lowered.

本發明的硬化性樹脂組成物之前述鋅化合物(E)的含量,並沒有特別限定,例如,相對於硬化性樹脂組成物之全量(100重量%)為0.01~0.1重量%較佳,更佳 為0.05~0.085重量%。 The content of the zinc compound (E) in the curable resin composition of the present invention is not particularly limited. For example, the total amount (100% by weight) of the curable resin composition is preferably 0.01 to 0.1% by weight, more preferably It is 0.05 to 0.085% by weight.

[氫矽烷化觸媒] [hydrogenated catalyzed catalyst]

本發明的硬化性樹脂組成物,亦可進一步包含氫矽烷化觸媒。本發明的硬化性樹脂組成物,藉由包含氫矽烷化觸媒,可有效率地進行硬化反應(氫矽烷化反應)。作為前述氫矽烷化觸媒,可示列出鉑系觸媒、銠系觸媒、鈀系觸媒等之周知的氫矽烷化反應用觸媒。具體而言,可舉出鉑微粉末、鉑黑、載持鉑的二氧化矽微粉末、載持鉑的活性碳、氯化鉑酸、氯化鉑酸與醇、醛、酮等之錯合物、鉑之烯烴錯合物、鉑-羰基乙烯基甲基錯合物等之鉑的羰基錯合物、鉑-二乙烯基四甲基二矽氧烷錯合物或鉑-環乙烯基甲基矽氧烷錯合物等之鉑乙烯基甲基矽氧烷錯合物、鉑-膦錯合物、鉑-亞磷酸鹽錯合物等之鉑系觸媒、以及在前述鉑系觸媒中含有鈀原子或銠原子代替鉑原子的鈀系觸媒或銠系觸媒。再者,前述氫矽烷化觸媒,可單獨使用1種,或者組合2種以上而使用。 The curable resin composition of the present invention may further contain a hydroquinone catalyst. The curable resin composition of the present invention can efficiently carry out a hardening reaction (hydrogenation reaction) by including a hydroquinone catalyst. As the hydrohaloalkylation catalyst, a known catalyst for hydroquinonelation reaction such as a platinum-based catalyst, a rhodium-based catalyst, or a palladium-based catalyst can be listed. Specific examples thereof include platinum fine powder, platinum black, platinum-supporting cerium oxide micropowder, platinum-carrying activated carbon, chloroplatinic acid, chloroplatinic acid, and alcohol, aldehyde, ketone, and the like. Platinum carbonyl complex of platinum, olefin olefin complex, platinum-carbonylvinylmethyl complex, platinum-divinyltetramethyldioxane complex or platinum-cyclovinyl a platinum-based catalyst such as a platinum-vinyl oxane complex, a platinum-phosphine complex, a platinum-phosphite complex, or the like, and a platinum-based catalyst as described above. A palladium-based catalyst or a ruthenium-based catalyst containing a palladium atom or a ruthenium atom in place of a platinum atom. In addition, the hydrohalogenated catalyst may be used singly or in combination of two or more.

本發明的硬化性樹脂組成物之前述氫矽烷化觸媒的含量,並沒有特別限定,例如,氫矽烷化觸媒中之鉑、鈀、或銠為重量單元且成為0.01~1,000ppm之範圍內的量較佳,成為0.1~500ppm之範圍內的量更佳。氫矽烷化觸媒之含量在如前述的範圍時,交聯速度不會顯著地變慢,且硬化物產生著色等之問題的可能性少,因此較為理想。 The content of the hydrohalogenation catalyst in the curable resin composition of the present invention is not particularly limited. For example, in the hydroquinone catalyst, platinum, palladium or rhodium is a weight unit and is in the range of 0.01 to 1,000 ppm. The amount is preferably in a range of from 0.1 to 500 ppm. When the content of the hydroquinone catalyst is within the above range, the crosslinking rate is not remarkably slowed, and the cured product is less likely to cause problems such as coloring, which is preferable.

[氫矽烷化反應抑制劑] [hydrogenation reaction inhibitor]

本發明的硬化性樹脂組成物,為了調整硬化反應( 氫矽烷化反應)之速度,亦可包含氫矽烷化反應抑制劑。作為前述氫矽烷化反應抑制劑,例如,可舉出3-甲基-1-丁炔-3-醇、3,5-二甲基-1-己炔-3-醇、苯基丁炔醇等之炔醇;3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔等之烯炔化合物;噻唑、苯并噻唑、苯并三唑等。前述氫矽烷化反應抑制劑,可單獨使用1種,或者組合2種以上而使用。作為前述氫矽烷化反應抑制劑之含量,根據硬化性樹脂組成物之交聯條件而不同,但實用上作為硬化性樹脂組成物中之含量,0.00001~5重量%之範圍內較為理想。 The curable resin composition of the present invention is used to adjust the hardening reaction ( The rate of the hydroquinonelation reaction may also include a hydroquinone reaction inhibitor. Examples of the hydrohaloalkylation reaction inhibitor include 3-methyl-1-butyn-3-ol, 3,5-dimethyl-1-hexyn-3-ol, and phenylbutynol. Alkenynyl; 3-methyl-3-penten-1-yne, 3,5-dimethyl-3-hexene-1-yne and the like; alkyne, benzothiazole, benzotriene Oxazole and the like. The hydrohaloalkylation reaction inhibitor may be used singly or in combination of two or more. The content of the hydroquinonelation reaction inhibitor varies depending on the crosslinking conditions of the curable resin composition, but it is preferably in the range of 0.00001 to 5% by weight in the curable resin composition.

[其他的矽氧烷化合物] [Other alkoxylate compounds]

本發明的硬化性樹脂組成物,亦可進一步包含在分子內(一分子中)具有2個以上之脂肪族碳-碳雙鍵的環狀矽氧烷作為其他的矽氧烷化合物。又,本發明的硬化性樹脂組成物,亦可進一步包含含有在分子內(一分子中)具有2個以上之Si-H鍵的基之環狀矽氧烷作為其他的矽氧烷化合物。前述環狀矽氧烷,可單獨使用1種,或者組合2種以上而使用。本發明的硬化性樹脂組成物之環狀矽氧烷的含量(摻合量),並沒有特別限定,但相對於硬化性樹脂組成物之全量(100重量%)為0.01~30重量%較佳,0.1~20重量%更佳,0.5~10重量%特佳。 The curable resin composition of the present invention may further contain a cyclic oxirane having two or more aliphatic carbon-carbon double bonds in a molecule (in one molecule) as another oxoxane compound. Further, the curable resin composition of the present invention may further contain a cyclic siloxane having a group having two or more Si-H bonds in one molecule (in one molecule) as another siloxane compound. The above-mentioned cyclic oxime may be used singly or in combination of two or more. The content (mixing amount) of the cyclic oxirane of the curable resin composition of the present invention is not particularly limited, but is preferably 0.01 to 30% by weight based on the total amount (100% by weight) of the curable resin composition. 0.1 to 20% by weight is more preferably 0.5 to 10% by weight.

[其他的矽烷化合物] [Other decane compounds]

本發明的硬化性樹脂組成物,亦可包含其他的矽烷化合物(例如,具有氫矽烷基的化合物)。作為前述其他的矽烷化合物,例如,可舉出甲基(參二甲基矽烷氧基) 矽烷、肆(二甲基矽烷氧基)矽烷、1,1,3,3-四甲基二矽氧烷、1,1,3,3,5,5-六甲基三矽氧烷、1,1,1,3,5,5,5-七甲基三矽氧烷、1,1,3,3,5,5,7,7-八甲基四矽氧烷、1,1,1,3,5,5,7,7,7-九甲基四矽氧烷、1,1,3,3,5,5,7,7,9,9-十甲基五矽氧烷、1,1,1,3,5,5,7,7,9,9,9-十一甲基五矽氧烷等之具有Si-H基的直鏈狀或分支鏈狀矽氧烷等。再者,前述矽烷化合物,可單獨使用1種,或者組合2種以上而使用。前述矽烷化合物之含量,並沒有特別限定,但相對於硬化性樹脂組成物之全量(100重量%)為0~5重量%以下較佳,0~1.5重量%更佳。 The curable resin composition of the present invention may further contain another decane compound (for example, a compound having a hydrofluorenyl group). As the other decane compound, for example, a methyl group (dimethyl dimethyl decyloxy group) may be mentioned. 矽, 肆 (dimethyl decyloxy) decane, 1,1,3,3-tetramethyldioxane, 1,1,3,3,5,5-hexamethyltrioxane, 1 1,1,3,5,5,5-heptamethyltrioxane, 1,1,3,3,5,5,7,7-octamethyltetraoxane, 1,1,1 ,3,5,5,7,7,7-nonamethyltetraoxane, 1,1,3,3,5,5,7,7,9,9-decamethylpentaoxane, 1 A linear or branched chain oxirane having a Si-H group such as 1,1,3,5,5,7,7,9,9,9-undecylpentaoxane or the like. In addition, the decane compound may be used alone or in combination of two or more. The content of the decane compound is not particularly limited, but is preferably 0 to 5% by weight or less, more preferably 0 to 1.5% by weight based on the total amount (100% by weight) of the curable resin composition.

[溶媒] [Solvent]

本發明的硬化性樹脂組成物,亦可包含溶媒。作為前述溶媒,例如,可舉出甲苯、己烷、異丙醇、甲基異丁酮、環戊酮、丙二醇單甲醚乙酸酯等之以往周知的溶媒。前述溶媒,可單獨使用1種,或者組合2種以上而使用。 The curable resin composition of the present invention may further contain a solvent. Examples of the solvent include conventionally known solvents such as toluene, hexane, isopropyl alcohol, methyl isobutyl ketone, cyclopentanone, and propylene glycol monomethyl ether acetate. The solvent may be used singly or in combination of two or more.

[添加劑] [additive]

本發明的硬化性樹脂組成物,亦可包含沉降二氧化矽、濕式二氧化矽、燻矽(fumed silica)、燒成二氧化矽、氧化鈦、氧化鋁、玻璃、石英、鋁矽酸鹽、氧化鐵、氧化鋅、碳酸鈣、碳黑、碳化矽、氮化矽、氮化硼等之無機質填充劑、將該等之填充劑利用有機鹵矽烷、有機烷氧基矽烷、有機矽氮烷等之有機矽化合物進行處理的無機質填充劑;矽酮樹脂、環氧樹脂、氟樹脂等之有機樹脂微粉末;銀、銅等之導電性金屬粉末等之填充劑、 安定化劑(抗氧化劑、紫外線吸收劑、耐光安定劑、熱安定化劑等)、阻燃劑(磷系阻燃劑、鹵系阻燃劑、無機系阻燃劑等)、阻燃助劑、補強材(其他的填充劑等)、晶核劑、偶合劑、滑劑、蠟、塑化劑、脫模劑、耐衝擊改良劑、色相改良劑、流動性改良劑、著色劑(染料、顏料等)、分散劑、消泡劑、脫泡劑、抗菌劑、防腐劑、黏度調整劑、增黏劑等之慣用的添加劑作為其他任意的成分。該等之添加劑,可單獨使用1種,或者組合2種以上而使用。 The curable resin composition of the present invention may further comprise precipitated cerium oxide, wet cerium oxide, fumed silica, calcined cerium oxide, titanium oxide, aluminum oxide, glass, quartz, aluminosilicate. Inorganic fillers such as iron oxide, zinc oxide, calcium carbonate, carbon black, tantalum carbide, tantalum nitride, boron nitride, etc., and organic fillers, organohaloxanes, organic decazins An inorganic filler which is treated with an organic hydrazine compound; an organic resin fine powder such as an anthrone resin, an epoxy resin or a fluororesin; a filler such as a conductive metal powder such as silver or copper; Anti-setting agent (antioxidant, UV absorber, light stabilizer, thermal stabilizer, etc.), flame retardant (phosphorus flame retardant, halogen flame retardant, inorganic flame retardant, etc.), flame retardant Reinforcing materials (other fillers, etc.), crystal nucleating agents, coupling agents, slip agents, waxes, plasticizers, mold release agents, impact modifiers, hue modifiers, fluidity improvers, colorants (dyes, A conventional additive such as a pigment, a dispersant, an antifoaming agent, a defoaming agent, an antibacterial agent, a preservative, a viscosity adjuster, and a tackifier is used as the other optional component. These additives may be used alone or in combination of two or more.

[硬化性樹脂組成物] [Curable resin composition]

本發明的硬化性樹脂組成物,並沒有特別限定,相對於存在於硬化性樹脂組成物中之氫矽烷基1莫耳,如脂肪族碳-碳雙鍵成為0.2~4莫耳的組成(摻合組成)較佳,更佳為0.5~1.5莫耳,最佳0.8~1.2莫耳。藉由將氫矽烷基與脂肪族碳-碳雙鍵之比例控制在前述範圍,有硬化物之耐熱性、透明性、柔軟性、耐迴焊性、及對於腐蝕性氣體之阻隔性進一步提升的傾向。 The curable resin composition of the present invention is not particularly limited, and is a composition of 0.2 to 4 moles with respect to the hydroquinone 1 molar which is present in the curable resin composition, such as an aliphatic carbon-carbon double bond. The composition is preferably, more preferably 0.5 to 1.5 m, and most preferably 0.8 to 1.2 m. By controlling the ratio of the hydroquinone alkyl group to the aliphatic carbon-carbon double bond within the above range, the heat resistance, transparency, flexibility, reflow resistance, and barrier property against corrosive gas of the cured product are further improved. tendency.

本發明的硬化性樹脂組成物,並沒有特別限定,可藉由在室溫進行攪拌.混合前述各成分而進行製備。再者,本發明的硬化性樹脂組成物,也可作為直接使用各成分預先混合者的1液系之組成物使用,例如,也可作為將各別保管之2種以上的成分在使用前以所定之比例混合而使用的多液系(例如,2液系)之組成物使用。 The curable resin composition of the present invention is not particularly limited and can be stirred at room temperature. The above components were mixed and prepared. In addition, the curable resin composition of the present invention may be used as a one-component composition in which each component is directly mixed, and for example, two or more components to be separately stored may be used before use. A composition of a multi-liquid system (for example, a two-liquid system) used in a predetermined ratio is used.

本發明的硬化性樹脂組成物,並沒有特別限定,但在常溫(約25℃)為液體較佳。更具體而言,本發 明的硬化性樹脂組成物,作為23℃之黏度,300~20000mPa.s較佳,更佳為500~10000mPa.s,特佳為1000~8000mPa.s。黏度小於300mPa.s時,有硬化物之耐熱性下降的情況。另一方面,黏度超過20000mPa.s時,有硬化性樹脂組成物之製備或處理變困難,且容易在硬化物殘留氣泡的情況。再者,硬化性樹脂組成物之黏度,例如,可使用流變計(商品名「PhysicaUDS-200」、AntonPaar公司製)與錐板(圓錐直徑:16mm、圓錐角度=0°),以溫度:23℃、旋轉數:20rpm的條件進行測定。 The curable resin composition of the present invention is not particularly limited, but is preferably a liquid at normal temperature (about 25 ° C). More specifically, this issue The curable resin composition of Ming, as the viscosity at 23 ° C, 300 ~ 20000 mPa. s is better, more preferably 500~10000mPa. s, especially good for 1000~8000mPa. s. Viscosity is less than 300mPa. In the case of s, there is a case where the heat resistance of the cured product is lowered. On the other hand, the viscosity exceeds 20,000 mPa. In the case of s, the preparation or treatment of the curable resin composition becomes difficult, and it is easy to leave bubbles in the cured product. Further, as the viscosity of the curable resin composition, for example, a rheometer (trade name "PhysicaUDS-200", manufactured by Anton Paar Co., Ltd.) and a cone plate (cone diameter: 16 mm, cone angle = 0) can be used, and the temperature is: The measurement was carried out under the conditions of 23 ° C and the number of rotations: 20 rpm.

[硬化物] [hardened material]

藉由利用硬化反應(氫矽烷化反應)使本發明的硬化性樹脂組成物硬化,可得到硬化物(以下有時稱為「本發明的硬化物」)。硬化反應之際的條件,並沒有特別限定,可根據以往周知的條件適當選擇,例如,從反應速度之觀點,溫度(硬化溫度)為25~180℃(更佳為60℃~150℃)較佳,時間(硬化時間)為5~720分鐘較佳。本發明的硬化物,其耐熱性、透明性、柔軟性等之各種物性均佳,再者,迴焊步驟之耐裂縫性、相對於封裝體之密合性等之耐迴焊性佳,且相對於腐蝕性氣體之阻隔性也優異。 The curable resin composition of the present invention is cured by a curing reaction (hydrogenation reaction) to obtain a cured product (hereinafter sometimes referred to as "the cured product of the present invention"). The conditions at the time of the hardening reaction are not particularly limited, and can be appropriately selected according to conventionally known conditions. For example, from the viewpoint of the reaction rate, the temperature (hardening temperature) is 25 to 180 ° C (more preferably 60 to 150 ° C). Preferably, the time (hardening time) is preferably 5 to 720 minutes. The cured product of the present invention is excellent in various physical properties such as heat resistance, transparency, and flexibility, and further excellent in reflow resistance such as crack resistance in the reflow step and adhesion to the package, and It is also excellent in barrier properties against corrosive gases.

[密封材及半導體裝置] [Sealing material and semiconductor device]

本發明的密封材,係包含本發明的硬化性樹脂組成物作為必要成分的密封材。藉由使本發明的硬化性樹脂組成物硬化而得到的密封材(硬化物),其耐熱性、透明性、柔軟性等之各種物性均優,再者,耐迴焊性、相對 於腐蝕性氣體之阻隔性均佳。因此,本發明的密封材,尤可作為半導體裝置之半導體元件的密封材使用,特別是作為光半導體裝置之光半導體元件(特別是高亮度、短波長的光半導體元件)的密封材等。藉由使用本發明的密封材進行密封半導體元件(特別是光半導體元件),可得到耐久性及品質均優異的半導體裝置(特別是光半導體裝置)。 The sealing material of the present invention is a sealing material containing the curable resin composition of the present invention as an essential component. The sealing material (cured material) obtained by curing the curable resin composition of the present invention is excellent in various physical properties such as heat resistance, transparency, and flexibility, and further, reflow resistance and relative resistance are obtained. It has good barrier properties to corrosive gases. Therefore, the sealing material of the present invention can be used particularly as a sealing material for a semiconductor element of a semiconductor device, and particularly as a sealing material for an optical semiconductor element (particularly, a high-brightness, short-wavelength optical semiconductor element) of an optical semiconductor device. By sealing a semiconductor element (particularly an optical semiconductor element) by using the sealing material of the present invention, a semiconductor device (particularly an optical semiconductor device) excellent in durability and quality can be obtained.

[實施例] [Examples]

以下根據實施例更詳細地說明本發明,但本發明並沒有限定於該等之實施例。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to the examples.

反應生成物及製品之1H-NMR分析,係利用JEOL ECA500(500MHz)而實施。又,反應生成物及製品的數量平均分子量及重量平均分子量之測定,係於Alliance HPLC系統2695(Waters製)、Refractive Index Detector 2414(Waters製)、管柱:Tskgel GMHHR-M×2(TOSOH(股)製)、保護管柱:Tskgel guardcolumn HHRL(TOSOH(股)製)、管柱烘箱:COLUMN HEATER U-620(Sugai製)、溶媒:THF、測定條件:40℃進行。 The 1 H-NMR analysis of the reaction product and the product was carried out using JEOL ECA500 (500 MHz). Further, the measurement of the number average molecular weight and the weight average molecular weight of the reaction product and the product was carried out in an Alliance HPLC system 2695 (manufactured by Waters), a Refractive Index Detector 2414 (manufactured by Waters), and a column: Tskgel GMH HR - M × 2 (TOSOH). (manufacturing system), protective column: Tskgel guardcolumn H HR L (manufactured by TOSOH), column oven: COLUMN HEATER U-620 (manufactured by Sugai), solvent: THF, measurement conditions: 40 °C.

[聚有機矽氧烷(A)] [polyorganooxane (A)]

作為聚有機矽氧烷(A),係使用以下的製品。 As the polyorganosiloxane (A), the following products were used.

GD-1130A:長興化學工業(股)製、乙烯基含量4.32重量%、苯基含量44.18重量%、SiH基含量(氫化物換算)0重量%、數量平均分子量1107、重量平均分子量6099 GD-1130A: manufactured by Changxing Chemical Industry Co., Ltd., vinyl content 4.32% by weight, phenyl content 44.18% by weight, SiH group content (calculated by hydride) 0% by weight, number average molecular weight 1107, weight average molecular weight 6099

GD-1130B:長興化學工業(股)製、乙烯基含量3.45重量%、苯基含量50.96重量%、SiH基含量(氫化物換算) 0.17重量%、數量平均分子量631、重量平均分子量1305 GD-1130B: Changxing Chemical Industry Co., Ltd., vinyl content 3.45 wt%, phenyl content 50.96 wt%, SiH group content (hydrogen conversion) 0.17 wt%, number average molecular weight 631, weight average molecular weight 1305

OE-6630A:Dow Corning Toray(股)製、乙烯基含量2.17重量%、苯基含量51.94重量%、SiH基含量(氫化物換算)0重量%、數量平均分子量2532、重量平均分子量4490 OE-6630A: manufactured by Dow Corning Toray, having a vinyl content of 2.17 wt%, a phenyl content of 51.94 wt%, a SiH group content (calculated by hydride) of 0 wt%, a number average molecular weight of 2532, a weight average molecular weight of 4490

OE-6630B:Dow Corning Toray(股)製、乙烯基含量3.87重量%、苯基含量50.11重量%、SiH基含量(氫化物換算)0.17重量%、數量平均分子量783、重量平均分子量1330 OE-6630B: manufactured by Dow Corning Toray Co., Ltd., vinyl content 3.87 wt%, phenyl content 50.11 wt%, SiH group content (calculated by hydride) 0.17 wt%, number average molecular weight 783, weight average molecular weight 1330

[異三聚氰酸酯化合物(B)] [Iso-cyanurate compound (B)]

作為異三聚氰酸酯化合物(B)係使用以下的製品。 The following products were used as the isocyanurate compound (B).

單烯丙基二環氧丙基異三聚氰酸酯:四國化成工業(股)製 Monoallyl epoxypropyl isomeric cyanurate: Shikoku Chemical Industry Co., Ltd.

[矽烷偶合劑(C)] [decane coupling agent (C)]

作為矽烷偶合劑(C)係使用以下的製品。 The following products were used as the decane coupling agent (C).

3-環氧丙氧基丙基三甲氧基矽烷:Dow Corning Toray(股)製 3-glycidoxypropyltrimethoxydecane: Dow Corning Toray

[倍半矽氧烷(D)之合成] [Synthesis of sesquioxane (D)]

<合成例1> <Synthesis Example 1>

在反應容器加入苯基三乙氧基矽烷(信越化學工業(股)製)15.86g及甲基異丁酮(MIBK)6.16g,將該等之混合物冷卻直到10℃。在前述混合物花費1小時滴加水4.32g及5N之鹽酸0.16g(氯化氫為2.4毫莫耳)。滴加後,將該等之混合物於10℃保持1小時。之後,添加MIBK26.67g,將反應溶液稀釋。 To the reaction vessel were added 15.86 g of phenyltriethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd.) and 6.16 g of methyl isobutyl ketone (MIBK), and the mixture was cooled to 10 °C. To the foregoing mixture, 4.32 g of water and 0.16 g of hydrochloric acid of 5 N (hydrogen chloride of 2.4 mmol) were added dropwise over 1 hour. After the dropwise addition, the mixture was kept at 10 ° C for 1 hour. Thereafter, 26.78 g of MIBK was added, and the reaction solution was diluted.

其次,將反應容器之溫度升溫直到70℃,在成為70℃ 的時間點添加5N之鹽酸0.16g(氯化氫為25毫莫耳),在氮氣下進行聚縮合反應4小時。 Next, the temperature of the reaction vessel is raised to 70 ° C, at 70 ° C At the time point, 0.16 g of 5N hydrochloric acid (hydrogen chloride of 25 mmol) was added, and a polycondensation reaction was carried out under nitrogen for 4 hours.

接著,在前述反應溶液添加二乙烯基四甲基二矽氧烷11.18g及六甲基二矽氧烷3.25g,在70℃進行4小時矽烷基化反應。之後,將反應溶液冷卻,進行水洗直到下層液成為中性,之後,分取上層液。其次,自該上層液於1mmHg、40℃之條件餾去溶媒,得到無色透明之液狀的反應生成物(在末端具有乙烯基的梯型倍半矽氧烷,13.0g)。前述反應的數量平均分子量(Mn)為840,分子量分散度為1.06。 Next, 11.18 g of divinyltetramethyldioxane and 3.25 g of hexamethyldioxane were added to the reaction solution, and the oximation reaction was carried out at 70 ° C for 4 hours. Thereafter, the reaction solution was cooled, washed with water until the lower layer became neutral, and then the supernatant liquid was taken. Then, the solvent was distilled off from the supernatant liquid at a temperature of 1 mmHg and 40 ° C to obtain a colorless transparent liquid reaction product (a ladder type sesquiterpene oxide having a vinyl group at the end, and 13.0 g). The above reaction had a number average molecular weight (Mn) of 840 and a molecular weight dispersion of 1.06.

[鋅化合物(E)] [Zinc compound (E)]

作為鋅化合物(E),係使用以下的製品。 As the zinc compound (E), the following products were used.

環烷酸鋅:日本化學產業(股)製、商品名「NAPHTHEX鋅」(Zn:8%) Zinc naphthenate: manufactured by Nippon Chemical Industry Co., Ltd. under the trade name "NAPHTHEX Zinc" (Zn: 8%)

辛酸鋅:日本化學產業(股)製、商品名「NIKKA OCTHIX鋅」(Zn:15%) Zinc octoate: manufactured by Japan Chemical Industry Co., Ltd. under the trade name "NIKKA OCTHIX Zinc" (Zn: 15%)

<實施例及比較例> <Examples and Comparative Examples>

依據以下順序實施實施例1~7及比較例1~6。 Examples 1 to 7 and Comparative Examples 1 to 6 were carried out in the following order.

依據表1及表2,將異三聚氰酸酯化合物(B)及矽烷偶合劑(C)以所定重量比率(表1及表2中之各成分的摻合量之單元為重量份)混合後,將鋅化合物(E)及倍半矽氧烷(D)混合,在60℃攪拌2小時。之後,冷卻直到室溫後,混合聚有機矽氧烷(A),在室溫攪拌30分鐘,得到硬化性樹脂組成物。 According to Tables 1 and 2, the isocyanurate compound (B) and the decane coupling agent (C) are mixed at a predetermined weight ratio (units of the amounts of the components in Tables 1 and 2). Thereafter, the zinc compound (E) and the sesquiterpene oxide (D) were mixed and stirred at 60 ° C for 2 hours. Thereafter, after cooling to room temperature, the polyorganosiloxane (A) was mixed and stirred at room temperature for 30 minutes to obtain a curable resin composition.

再者,表1及表2中,關於環烷酸鋅及辛酸鋅,係顯 示各別自「NAPHTHEX鋅」及「NIKKA OCTHIX鋅」除去礦油精的量。 Furthermore, in Tables 1 and 2, regarding zinc naphthenate and zinc octoate, Show the amount of mineral spirits removed from "NAPHTHEX Zinc" and "NIKKA OCTHIX Zinc".

[光度維持率之測定] [Measurement of photometric maintenance rate]

在第1圖所示之LED封裝體(InGaN元件、3.5mm×2.8mm)注入實施例1~7、比較例1~6所得到的硬化性樹脂組成物,在60℃加熱1小時,接著在80℃加熱1小時且在150℃加熱4小時,作成試料。再者,亦可在LED封裝 體注入硬化性樹脂組成物後,在150℃加熱1小時,作成試料。 The curable resin composition obtained in Examples 1 to 7 and Comparative Examples 1 to 6 was injected into the LED package (InGaN element, 3.5 mm × 2.8 mm) shown in Fig. 1 and heated at 60 ° C for 1 hour, followed by The mixture was heated at 80 ° C for 1 hour and at 150 ° C for 4 hours to prepare a sample. Furthermore, it can also be in LED package After the body was injected with a curable resin composition, it was heated at 150 ° C for 1 hour to prepare a sample.

針對前述各試料,使用全光束測定機(Optronic Laboratories公司製、多分光放射測定系統「OL771」),測定流通20mA的電流之際的全光束(單元:1m),並將其作為腐蝕性試驗前的全光束。 For the above-mentioned samples, a full beam (manufactured by Optronic Laboratories Co., Ltd., multi-spectrophotometry system "OL771") was used, and a total beam (unit: 1 m) at a current of 20 mA was measured and used as a corrosive test. Full beam.

其次,針對前述各試料,供於後述的SOX腐蝕性試驗及H2S腐蝕性試驗,與前述同樣進行測定全光束,並將其作為腐蝕性試驗後之全光束。 Next, the respective samples were subjected to the SO X corrosivity test and the H 2 S corrosivity test described later, and the total light beam was measured in the same manner as described above, and this was used as the total light beam after the corrosive test.

之後,依據下式,算出光度維持率。 Thereafter, the luminosity maintenance ratio was calculated according to the following formula.

光度維持率(%)=(腐蝕試驗前之全光束/腐蝕試驗後之全光束)×100 Photometric maintenance rate (%) = (full beam after corrosion test / full beam after corrosion test) × 100

[SOX腐蝕性試驗] [SO X Corrosion Test]

將前述各試料與硫粉末(KISHIDA化學(股)製)0.3g放入450ml的玻璃瓶,並且將前述玻璃瓶放入鋁製的箱中。接著,將前述鋁製的箱放入烘箱(Yamato科學(股)製、型號「DN-64」),將烘箱溫度設定為80℃後,在24小時後取出,並如前述測定全光束。 Each of the above samples and 0.3 g of sulfur powder (KISHIDA Chemical Co., Ltd.) were placed in a 450 ml glass bottle, and the glass bottle was placed in a box made of aluminum. Next, the aluminum box was placed in an oven (manufactured by Yamato Scientific Co., Ltd., model number "DN-64"), and after the oven temperature was set to 80 ° C, it was taken out after 24 hours, and the total light beam was measured as described above.

[H2S腐蝕性試驗] [H 2 S Corrosion Test]

將前述試料放入調整為硫化氫濃度25ppm、溫度50℃、濕度80%RH的氣體腐蝕試驗機(Suga試驗機(股)製、型號「GS-UV」),在96小時後取出,並如前述測定全光束。 The sample was placed in a gas corrosion tester (manufactured by Suga Tester Co., Ltd., model "GS-UV") adjusted to a hydrogen sulfide concentration of 25 ppm, a temperature of 50 ° C, and a humidity of 80% RH, and taken out after 96 hours. The aforementioned full beam was measured.

[耐腐蝕性之評價] [Evaluation of corrosion resistance]

關於耐腐蝕性之評價基準,係如下述。 The evaluation criteria for corrosion resistance are as follows.

A:SOX腐蝕性試驗之光度維持率為85%以上,且H2S腐蝕性試驗之光度維持率為99%以上 A: The photometric maintenance rate of the SO X corrosion test is 85% or more, and the luminosity maintenance rate of the H 2 S corrosion test is 99% or more.

B:SOX腐蝕性試驗之光度維持率為85%以上,且H2S腐蝕性試驗之光度維持率小於99% B: The photometric maintenance rate of the SO X corrosion test is 85% or more, and the luminosity maintenance rate of the H 2 S corrosivity test is less than 99%.

C:SOX腐蝕性試驗之光度維持率小於85% C: SO X corrosion test luminosity maintenance rate is less than 85%

比較例1~3中,耐SOX腐蝕性足夠,但H2S腐蝕性不足。 In Comparative Examples 1 to 3, the SO X corrosion resistance was sufficient, but the H 2 S corrosion resistance was insufficient.

相對於此,比較例4~6中,添加記載於專利文獻4之範圍的鋅化合物(E)時,雖耐H2S腐蝕性提升,但意外地耐SOX腐蝕性反而下降。 On the other hand, in the comparative examples 4 to 6, when the zinc compound (E) described in the range of Patent Document 4 was added, although the H 2 S corrosion resistance was improved, the SO X corrosion resistance unexpectedly decreased.

因此,實施例中,相對於比較例4~6,將比較例4~6調整為少量側時,可保持耐H2S腐蝕性,同時確認耐SOX腐蝕性提升。 Therefore, in the examples, when Comparative Examples 4 to 6 were adjusted to a small amount on the comparative examples 4 to 6, the H 2 S corrosion resistance was maintained, and the SO X corrosion resistance was confirmed to be improved.

又,根據實施例2、4、6之比較,係確認藉由倍半矽氧烷(B)之增量,不會使耐H2S腐蝕性下降,且耐SOX腐蝕性會提升。 Further, according to the comparison of Examples 2, 4, and 6, it was confirmed that the increase in the corrosion resistance of H 2 S was not caused by the increase in the sesquioxane (B), and the SO X corrosion resistance was improved.

再者,根據實施例5與實施例4之比較,係確認藉由實施例5與實施例4之添加,不會使耐H2S腐蝕性下降,且耐SOX腐蝕性會提升。 Further, according to the comparison between Example 5 and Example 4, it was confirmed that the addition of Example 5 and Example 4 did not lower the corrosion resistance to H 2 S and the SO X corrosion resistance was improved.

根據前述,藉由添加限制範圍的鋅化合物(E),可得到兼具耐SOX腐蝕性與耐H2S腐蝕性的硬化性樹脂組成物。 According to the above, by adding the zinc compound (E) in a limited range, a curable resin composition having both SO X corrosion resistance and H 2 S corrosion resistance can be obtained.

[產業上之可利用性] [Industrial availability]

本發明的硬化性樹脂組成物及硬化物,在需要耐熱性、透明性、柔軟性、相對於腐蝕性氣體之阻隔 性的接著劑、塗布劑、密封材等之用途為有用。特別是本發明的硬化性樹脂組成物及硬化物,可適合作為光半導體元件(例如,LED元件、半導體雷射元件、太陽光發電元件、CCD元件等)的密封材。 The curable resin composition and cured product of the present invention require heat resistance, transparency, flexibility, and barrier against corrosive gases. The use of a sexual adhesive, a coating agent, a sealing material, etc. is useful. In particular, the curable resin composition and the cured product of the present invention can be suitably used as a sealing material for an optical semiconductor element (for example, an LED element, a semiconductor laser element, a photovoltaic power generation element, a CCD element, or the like).

Claims (14)

一種硬化性樹脂組成物,其係包含聚有機矽氧烷(A)、異三聚氰酸酯化合物(B)、及鋅化合物(E)的硬化性樹脂組成物,其特徵為:聚有機矽氧烷(A)為具有芳基的聚有機矽氧烷,並且亦可更包含倍半矽氧烷(D),該鋅化合物(E)之含量係相對於聚有機矽氧烷(A)及倍半矽氧烷(D)之合計量(100重量份)為0.01重量份以上小於0.1重量份。 A curable resin composition comprising a polyorganosiloxane (A), an isocyanurate compound (B), and a zinc compound (E), which is characterized by a polyorganoquinone. The oxane (A) is a polyorganosiloxane having an aryl group, and may further comprise a sesquiterpene oxide (D) in an amount relative to the polyorganosiloxane (A) and The total amount (100 parts by weight) of the sesquioxane (D) is 0.01 parts by weight or more and less than 0.1 parts by weight. 如請求項1之硬化性樹脂組成物,其中聚有機矽氧烷(A)之利用凝膠滲透層析的標準聚苯乙烯換算之數量平均分子量(Mn)為500~4000。 The curable resin composition of claim 1, wherein the polyorganosiloxane (A) has a number average molecular weight (Mn) of 500 to 4,000 in terms of standard polystyrene by gel permeation chromatography. 如請求項1或2之硬化性樹脂組成物,其中將聚有機矽氧烷(A)之利用凝膠滲透層析的標準聚苯乙烯換算之重量平均分子量作為Mw、數量平均分子量作為Mn時之分子量分散度(Mw/Mn)為0.95~6.00。 The curable resin composition of claim 1 or 2, wherein the polyorganosiloxane (A) has a weight average molecular weight in terms of standard polystyrene by gel permeation chromatography as Mw and a number average molecular weight as Mn The molecular weight dispersion (Mw/Mn) is from 0.95 to 6.00. 如請求項1至3中任一項之硬化性樹脂組成物,其中聚有機矽氧烷(A)為具有脂肪族碳-碳雙鍵的聚有機矽氧烷(A1)。 The curable resin composition according to any one of claims 1 to 3, wherein the polyorganosiloxane (A) is a polyorganosiloxane (A1) having an aliphatic carbon-carbon double bond. 如請求項1至4中任一項之硬化性樹脂組成物,其中聚有機矽氧烷(A)為具有Si-H鍵的聚有機矽氧烷(A2)。 The curable resin composition according to any one of claims 1 to 4, wherein the polyorganosiloxane (A) is a polyorganosiloxane (A2) having a Si-H bond. 如請求項1至5中任一項之硬化性樹脂組成物,其中作為異三聚氰酸酯化合物(B)係包含式(1)所示的異三聚氰酸酯化合物; [式(1)中,Rx、Ry、Rz可相同或不同,並表示式(2)所示的基、或式(3)所示的基; [式(2)及式(3)中,R1及R2可相同或不同,並表示氫原子或碳數1~8之直鏈狀或分支鏈狀的烷基]]。 The curable resin composition according to any one of claims 1 to 5, wherein the isomeric isocyanate compound (B) comprises an isomeric cyanurate compound represented by the formula (1); [In the formula (1), R x , R y , and R z may be the same or different, and represent a group represented by the formula (2) or a group represented by the formula (3); In the formulae (2) and (3), R 1 and R 2 may be the same or different and each represent a hydrogen atom or a linear or branched alkyl group having 1 to 8 carbon atoms]]. 如請求項6之硬化性樹脂組成物,其中式(1)的Rx、Ry、Rz之中任一個以上為式(3)所示的基。 The curable resin composition of claim 6, wherein one or more of R x , R y and R z in the formula (1) is a group represented by the formula (3). 如請求項1至7中任一項之硬化性樹脂組成物,其中作為鋅化合物(E)係包含羧酸鋅。 The curable resin composition according to any one of claims 1 to 7, wherein the zinc compound (E) contains zinc carboxylate. 如請求項1至8中任一項之硬化性樹脂組成物,其中聚有機矽氧烷(A)係包含式(6)所示的結構之聚有機矽氧烷; [式(6)中,R21~R26可相同或不同,並表示氫原子、芳基、一價烴基、或一價雜環式基;但是,R21~R26中之1個以上為包含脂肪族碳-碳不飽和鍵的一價基;又,R21~R26中之1個以上為芳基;R27表示二價烴基;r、s各別表示1以上的整數]。 The curable resin composition according to any one of claims 1 to 8, wherein the polyorganosiloxane (A) is a polyorganosiloxane comprising a structure represented by the formula (6); [In the formula (6), R 21 to R 26 may be the same or different and each represents a hydrogen atom, an aryl group, a monovalent hydrocarbon group or a monovalent heterocyclic group; however, one or more of R 21 to R 26 are a monovalent group containing an aliphatic carbon-carbon unsaturated bond; further, one or more of R 21 to R 26 is an aryl group; R 27 represents a divalent hydrocarbon group; and r and s each represent an integer of 1 or more]. 如請求項1至9中任一項之硬化性樹脂組成物,其中更包含矽烷偶合劑(C)。 The curable resin composition according to any one of claims 1 to 9, which further comprises a decane coupling agent (C). 如請求項1至10中任一項之硬化性樹脂組成物,其中作為該倍半矽氧烷(D)係包含梯型倍半矽氧烷。 The curable resin composition according to any one of claims 1 to 10, wherein the sesquiterpene oxide (D) contains ladder type sesquiterpene oxide. 一種硬化物,其係將如請求項1至11中任一項之硬化性樹脂組成物硬化而得到。 A cured product obtained by hardening the curable resin composition according to any one of claims 1 to 11. 一種密封材,其係使用如請求項1至11中任一項之硬化性樹脂組成物而得到。 A sealing material obtained by using the curable resin composition according to any one of claims 1 to 11. 一種半導體裝置,其係使用如請求項13之密封材而得到。 A semiconductor device obtained by using the sealing material of claim 13.
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