TW201500731A - Method for discriminating defect of optical films - Google Patents
Method for discriminating defect of optical films Download PDFInfo
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- TW201500731A TW201500731A TW103117379A TW103117379A TW201500731A TW 201500731 A TW201500731 A TW 201500731A TW 103117379 A TW103117379 A TW 103117379A TW 103117379 A TW103117379 A TW 103117379A TW 201500731 A TW201500731 A TW 201500731A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9511—Optical elements other than lenses, e.g. mirrors
Abstract
Description
本發明係關於一種薄膜缺陷檢出方法。更詳言之係關於一種光學薄膜中之叢集缺陷檢出方法。
The present invention relates to a film defect detecting method. More specifically, it relates to a method of detecting cluster defects in an optical film.
近年來，廣泛開發並運用各種圖像顯示裝置，諸如液晶顯示器、有機發光顯示器、場發射顯示器(FED)、電漿顯示面板(PDP)等。
另一方面，圖像顯示裝置在流通於市面前，於製造過程中會發生各種瑕疵，因此須經過許多檢查過程，其中圖像顯示裝置使用最多之零件之一為偏光薄膜、相位差薄膜等各種光學薄膜，因此光學薄膜的缺陷為圖像顯示裝置故障的主要原因之一。光學薄膜缺陷檢出若從製造步驟的生產良率面來看，首先鑑別是否為缺陷，進行正確的判斷，其後若判斷是缺陷，則修復(repair)缺陷或報廢，進而去除缺陷原因等，無疑為重要的部分。
於光學薄膜製造中，為了產業上的大量生產，一般採用生產線製程。因此，缺陷檢出係藉由在生產線的特定位置，連續拍攝光學薄膜，以拍攝的部分來鑑別缺陷而進行。
關於缺陷鑑別，以往重點在於確實檢出各種缺陷。關於此，於韓國公開專利第10-2010-0024753號公報，揭示了比較包含異物之閉合曲線與異物面積，以鑑別線狀異物的方法。
然而，近來，伴隨著大型化的趨勢，光學薄膜之零件成本亦上升，隨之而尋求更正確的缺陷鑑別方法，因而仍在尋求可正確鑑別缺陷的方法。
先行技術文獻
專利文獻
[專利文獻1]韓國公開專利第10-2010-0024753號公報
In recent years, various image display devices such as a liquid crystal display, an organic light emitting display, a field emission display (FED), a plasma display panel (PDP), and the like have been widely developed and utilized.
On the other hand, the image display device is in front of the market, and various flaws occur in the manufacturing process. Therefore, many inspection processes are required, and one of the most used components of the image display device is a polarizing film, a retardation film, and the like. Optical films, and thus defects in optical films are one of the main causes of image display device failure. When the optical film defect detection is from the production yield point of the manufacturing step, it is first identified whether it is a defect, and a correct judgment is made, and if it is judged to be a defect, the defect or scrap is repaired, and the cause of the defect is removed. Undoubtedly an important part.
In the production of optical films, in order to mass production in the industry, a production line process is generally employed. Therefore, the defect detection is performed by continuously photographing the optical film at a specific position of the production line and identifying the defect with the photographed portion.
Regarding defect identification, the past focus has been on the detection of various defects. In the Korean Patent Publication No. 10-2010-0024753, a method of comparing a closed curve containing a foreign matter with a foreign matter area to discriminate a linear foreign matter is disclosed.
However, recently, along with the trend of large-scale, the cost of parts for optical films has also increased, and a more accurate method of defect identification has been sought, and a method for correctly identifying defects has been sought.
Advanced technical literature patent literature
[Patent Document 1] Korean Laid-Open Patent Publication No. 10-2010-0024753
發明所欲解決之問題
本發明的目的在於提供一種正確鑑別光學薄膜缺陷中之叢集缺陷的方法。
解決問題之技術手段
1.一種光學薄膜缺陷鑑別方法，備有以下階段：拍攝移送之光學薄膜，取得前述光學薄膜之圖像的階段(S1)；及從前述圖像檢出異物，以前述異物中之任一異物為中心，在半徑5mm之圓內，若異物存在有2個以上，則判斷包含中心異物之前述異物的集合為叢集缺陷的階段(S2)。
2.如前述項目1之光學薄膜缺陷鑑別方法，其中前述半徑為4mm、3mm、2mm或1mm。
3.如前述項目1之光學薄膜缺陷鑑別方法，其中前述異物之長軸長度為30～100μm。
4.如前述項目1之光學薄膜缺陷鑑別方法，其中前述異物之長軸長度為30～50μm。
5.如前述項目1之光學薄膜缺陷鑑別方法，其中前述階段(S1)之拍攝係藉由反射光學系統方式、穿透光學系統方式、或雙方方式來完成。
6.如前述項目1之光學薄膜缺陷鑑別方法，其中進一步備有於前述階段(S2)判斷為叢集缺陷時，於前述光學薄膜之對應部分予以標記的階段。
發明之效果
本發明之光學薄膜缺陷鑑別方法係就個別單位的缺陷而言雖非缺陷，但於預定的區域內，前述異物集中時，該類集中所造成之負面的增效效果，可能成為不良品的原因，因此藉由提供將該類狀態(叢集缺陷)判斷為缺陷的方法，可減低光學薄膜的不良率。
本發明之光學薄膜缺陷鑑別方法並非強化檢出裝置之檢出條件的方法，其藉由揭示判斷異物叢集化的方法，無須交換檢出裝置或強化檢出條件，即可檢出叢集缺陷。
SUMMARY OF THE INVENTION Problems to be Solved by the Invention An object of the present invention is to provide a method for correctly identifying cluster defects in defects of optical films.
Technical means of solving problems
A method for discriminating an optical film defect, comprising: photographing a transferred optical film to obtain an image of the optical film (S1); and detecting a foreign matter from the image, and using any foreign matter in the foreign matter In the circle having a radius of 5 mm, if there are two or more foreign substances, it is determined that the set of the foreign matter including the center foreign matter is a cluster defect stage (S2).
2. The optical film defect identification method according to item 1, wherein the radius is 4 mm, 3 mm, 2 mm or 1 mm.
3. The optical film defect identifying method according to item 1, wherein the long axis length of the foreign matter is 30 to 100 μm.
4. The optical film defect identifying method according to item 1, wherein the foreign matter has a major axis length of 30 to 50 μm.
5. The optical film defect identification method according to item 1, wherein the photographing of the foregoing stage (S1) is performed by a reflective optical system method, a penetrating optical system method, or both.
6. The optical film defect discriminating method according to item 1, wherein the step of marking the corresponding portion of the optical film when the layer (S2) is determined to be a cluster defect is further provided.
Advantageous Effects of Invention The optical film defect identifying method of the present invention is not defective in terms of individual unit defects, but in the predetermined region, when the foreign matter is concentrated, the negative synergistic effect caused by the concentration may become The reason for the good product is that the defect rate of the optical film can be reduced by providing a method of determining such a state (cluster defect) as a defect.
The optical film defect identification method of the present invention is not a method for enhancing the detection condition of the detection device, and by revealing a method for judging foreign matter clustering, cluster defects can be detected without exchanging the detection device or enhancing the detection condition.
a‧‧‧側面圖
b‧‧‧俯視圖
1、2、3、4‧‧‧異物a‧‧‧Side view
B‧‧‧Top view
1, 2, 3, 4‧‧‧ foreign objects
第1圖係表示反射光學系統檢查裝置之概略構造之圖式。
第2圖係表示穿透光學系統檢查裝置之概略構造之圖式。
第3圖係實際拍攝叢集缺陷之一例示之照片。
第4圖係概略表示叢集缺陷之一例示之圖式。
Fig. 1 is a view showing a schematic configuration of a reflection optical system inspection device.
Fig. 2 is a view showing a schematic configuration of a penetrating optical system inspection device.
Figure 3 is a photograph of one of the actual shooting cluster defects.
Fig. 4 is a schematic diagram showing an example of a cluster defect.
用以實施發明之形態
本發明係有關一種光學薄膜缺陷鑑別方法。本發明之光學薄膜缺陷鑑別方法備有以下階段：拍攝移送之光學薄膜，取得前述光學薄膜之圖像的階段(S1)；及從前述圖像檢出異物，以前述異物中之任一異物為中心，在半徑5mm之圓內，若異物存在有2個以上，則判斷包含中心異物之前述異物的集合為叢集缺陷的階段(S2)；藉由備有上述階段，不強化檢出條件，即可減低光學薄膜的不良率。
以下參考圖式，更詳細說明有關本發明。
首先拍攝移送的光學薄膜，取得前述光學薄膜的圖像(S1)。
一般而言，光學薄膜的製造係透過連續步驟，例如輥對輥(Roll-to-Roll)步驟移送而進行。因此，為了鑑別光學薄膜的缺陷，於朝一定方向移送之光學薄膜的上部，拍攝光學薄膜，取得光學薄膜的圖像。若於取得的圖像中，有存在異物的區域，則篩選該區域，實施鑑別是否為缺陷的步驟。
為了檢出光學薄膜缺陷所用攝影裝置的方式，可採用例如反射光學系統方式或穿透光學系統方式、或者雙方。
反射光學系統方式的檢查裝置意味以檢查對象反射的光完成檢查的裝置。具體而言，光源位於檢查薄膜的一側，對檢查薄膜照射光，攝影機器係以前述檢查薄膜為基準，在與前述光源同一側拍攝檢查薄膜(收集由檢查薄膜反射的光)，取得檢查影像的裝置。
於第1圖(a：側面圖，b：俯視圖)概略表示利用反射光學系統檢查裝置之薄膜缺陷檢出方法。參考第1圖，反射光學系統檢查裝置係光源之光照射方向及攝影機器之攝影方向，位於對於檢查對象之檢查薄膜之移送方向呈平行的方向。然後，利用在前述位置拍攝的影像作為檢查影像，檢出缺陷。
穿透光學系統檢查裝置意味以穿透檢查對象的光完成檢查的裝置。具體而言，光源配置於檢查薄膜的一側，對檢查薄膜照射光，攝影機器係以前述檢查薄膜為基準，在與光源相反側拍攝檢查薄膜(收集穿透檢查薄膜的光)，取得檢查影像的裝置。
於第2圖概略表示利用穿透光學系統檢查裝置之薄膜缺陷檢出方法。參考第2圖，穿透光學系統檢查裝置係光源及攝影機器，位於對於檢查對象之檢查薄膜呈垂直的方向。然後，利用在前述位置拍攝的影像作為檢查影像，檢出缺陷。
穿透光學系統檢查裝置可依所檢查的光學薄膜的具體種類，進一步追加構造。例如檢查對象之光學薄膜為偏光薄膜時，可於檢查對象薄膜的上部，配置與檢查對象試料之偏光薄膜之偏光方向呈垂直的其他偏光薄膜。此時，若檢查對象的偏光薄膜為良品，則通過偏光方向互呈垂直之2個偏光薄膜的光會消失，因此獲得黑色的影像，若於檢查對象之偏光薄膜存在異物，則於該部分，偏光方向會改變，結果發生光漏洩，獲得存在有明亮部分(亦即異物部分)的影像。
接著，從前述圖像檢出異物，以前述異物中任一異物為中心，若於半徑5mm之圓內存在2個以上之異物，則判斷包含中心異物之前述異物之集合體為叢集缺陷(S2)。
於本發明，「異物」係指光學薄膜從平均的均一性脫離的部分，依據鑑別結果可判斷為正常範圍內(良品性異物)，或為製品瑕疵原因之「缺陷」的部分。
從取得之圖像篩選存在異物的區域，係於設定光學薄膜之平均的均一性之後，利用圖像處理軟體等，完成包含脫離該均一性之部分(異物部分)的區域之圖像。
本發明定義之異物種類可區分為拍攝的圖像中，比週邊明亮的部分(亮點)與昏暗的部分(暗點)。該類亮點或暗點不僅止於光學薄膜上所見之光學亮點或暗點，亦包含因凹凸而產生之亮點或暗點。
如前述，檢出之異物可分類為良品性異物與缺陷異物。良品性異物之代表例可舉出其大小過小，不會成為缺陷的情況。因此，依據對光學薄膜所要求的基準，預定大小以下之異物不判斷為缺陷。
另一方面，若個別而言為良品性異物之微小異物成為叢集狀態，則實際上在製品使用時，會有辨識為瑕疵的情況，有時會導致問題。然而，習知的光學薄膜缺陷鑑別方法係個別篩選單位異物，依據預定基準來判斷是否為缺陷，因此即便良品性缺陷之微小異物成為叢集狀態，仍舊無法將其判斷為缺陷。於第3圖表示如此微小異物形成叢集狀態的例示。如第3圖所示，微小異物若為叢集狀態，則實際上在製品使用時辨識為瑕疵，但於習知以個別異物作為對象之缺陷鑑別方法，難以辨識為缺陷。
本發明係提供異物在預先決定的區域內集中而形成叢集時，將其鑑別為缺陷的方法，以解決如前述之問題點。具體而言，從檢查用攝影裝置所拍攝的圖像檢出之異物，於某一異物為中心，若於半徑5mm之圓內，異物存在有2個以上，則判斷包含中心異物之前述異物的集合體為缺陷(以下稱為叢集缺陷)。
判斷是否為叢集缺陷之叢集區域係以中心異物為基準之半徑5mm的圓形。若半徑超過5mm，幾無在實際上使用時被辨識為瑕疵的情況。
另一方面，依製造之光學薄膜的具體用途，叢集區域之半徑可進一步縮小。叢集區域之半徑越小，判斷為叢集缺陷的情況變少，若須對於光學薄膜要求無缺陷，則叢集半徑進一步縮小。例如叢集區域之半徑亦可為4mm、3mm、2mm、1mm，但不限定於此。
於本發明，形成叢集缺陷之單位異物的大小並未特別限定。較宜具有在圖像中辨識作為異物之大小以上的大小，並且具有在叢集區域內存在2個以上的大小。例如異物的長軸長度為100μm以下，較宜為50μm以下。於本發明，異物大小的下限係依攝影裝置的種類而不同，由於無論如何微小的良品性異物均可檢出，只要集合於叢集區域內，即成為本發明之判斷對象，因此並未特別限定，可為例如30μm。因此，本發明之異物大小例如以異物之長軸為基準，可為30～100μm，較宜為30～50μm，但不限定於此。
於第4圖表示前述叢集缺陷之概略例示。參考第4圖，由於異物1、2、3存在於以異物2為中心所預先決定的半徑之圓內部，因此於叢集區域內，異物存在有2個以上，判斷為叢集缺陷。
於本發明，可進一步備有在前述階段S2判斷為叢集缺陷時，於前述光學薄膜之對應部分予以標記的階段。
標記係於光學薄膜實際使用的區域完成，或於加工為最終製品時去除的剩餘區域(實際上不使用的區域)完成均可。
藉由於產生叢集缺陷的部分進行標記，其後可容易用在分類或去除叢集缺陷產生部分。
又，將前述標記的個數予以計數，藉此算出缺陷發生率，不僅可控制製造步驟，亦可作為對比圖像與實際之光學薄膜之指數，用於確認叢集缺陷的判斷是否正確完成。
本發明之缺陷鑑別方法可視用於各種光學薄膜。該類光學薄膜包括例如偏光薄膜、相位差薄膜等，但不限定於此。
如前述，由於異物集中於預定區域內時，因前述集中而進一步叢集化，可能成為不良品的原因，本發明提供將該類狀態(叢集缺陷)判斷為缺陷的方法；本發明之缺陷鑑別方法可檢出就個別單位的缺陷而言雖非缺陷，但於預定的區域內，前述異物集中而引起瑕疵的情況，因此可減低光學薄膜的不良率。
如以上，本發明已藉由揭示之實施形態及圖式來說明，但本發明不受其限定，無須贅述當可由具有本發明所屬技術領域之一般知識者，在本發明之技術思想與下述申請專利範圍的同等範圍內，施以各種修正及變形。
MODE FOR CARRYING OUT THE INVENTION The present invention relates to an optical film defect identification method. The optical film defect identifying method of the present invention comprises the steps of: photographing a transferred optical film to obtain an image of the optical film (S1); and detecting a foreign matter from the image, wherein any foreign matter in the foreign matter is In the center of the circle having a radius of 5 mm, if there are two or more foreign substances, it is determined that the set of the foreign matter including the center foreign matter is a stage of cluster defects (S2); by providing the above stage, the detection condition is not enhanced, that is, The defect rate of the optical film can be reduced.
The invention is described in more detail below with reference to the drawings.
First, the transferred optical film is imaged, and an image of the optical film is obtained (S1).
In general, the manufacture of optical films is carried out by successive steps, such as a roll-to-roll step transfer. Therefore, in order to discriminate the defect of the optical film, an optical film is imaged on the upper portion of the optical film transferred in a certain direction to obtain an image of the optical film. If there is an area where foreign matter exists in the acquired image, the area is screened and a step of identifying whether it is a defect is performed.
For the manner of detecting the photographing device used for the defect of the optical film, for example, a reflective optical system method or a penetrating optical system method, or both.
The inspection apparatus of the reflective optical system means a device that performs inspection by examining the light reflected by the object. Specifically, the light source is located on one side of the inspection film, and the inspection film is irradiated with light, and the imaging device takes an inspection film (collects the light reflected by the inspection film) on the same side as the light source to obtain an inspection image based on the inspection film. s installation.
Fig. 1 (a: side view, b: plan view) schematically shows a film defect detecting method using a reflective optical system inspection device. Referring to Fig. 1, the reflection optical system inspection device is a light irradiation direction of the light source and a photographing direction of the photographing machine, and is located in a direction parallel to the transfer direction of the inspection film to be inspected. Then, the image taken at the aforementioned position is used as an inspection image to detect a defect.
The penetrating optical system inspection device means a device that performs inspection by penetrating the light of the inspection object. Specifically, the light source is disposed on one side of the inspection film, and the inspection film is irradiated with light, and the imaging device takes an inspection film (collecting the light penetrating the inspection film) on the side opposite to the light source based on the inspection film to obtain an inspection image. s installation.
Fig. 2 schematically shows a film defect detecting method using a penetrating optical system inspection device. Referring to Fig. 2, the penetrating optical system inspection device is a light source and a photographing machine located in a direction perpendicular to the inspection film to be inspected. Then, the image taken at the aforementioned position is used as an inspection image to detect a defect.
The penetrating optical system inspection device can be further structured depending on the specific type of the optical film to be inspected. For example, when the optical film to be inspected is a polarizing film, another polarizing film perpendicular to the polarizing direction of the polarizing film of the sample to be inspected may be disposed on the upper portion of the inspection target film. In this case, if the polarizing film to be inspected is a good product, the light of the two polarizing films that are perpendicular to each other in the polarizing direction disappears, so that a black image is obtained, and if there is foreign matter in the polarizing film to be inspected, in this portion, The direction of the polarized light changes, and as a result, light leaks, and an image in which a bright portion (i.e., a foreign matter portion) exists is obtained.
Then, the foreign matter is detected from the image, and if there are two or more foreign objects in a circle having a radius of 5 mm centered on any foreign matter in the foreign matter, it is determined that the aggregate of the foreign matter including the center foreign matter is a cluster defect (S2) ).
In the present invention, the term "foreign matter" means a portion from which the optical film is separated from the average uniformity, and can be judged to be within a normal range (good foreign matter) or a "defect" of the cause of the product.
The region in which the foreign matter is present is selected from the acquired image, and after the uniformity of the optical film is set, the image including the portion (the foreign matter portion) which is separated from the uniformity is completed by the image processing software or the like.
The foreign matter type defined by the present invention can be distinguished as a bright portion (bright spot) and a dark portion (dark dot) in the captured image. Such bright or dark spots not only end to optical bright spots or dark spots seen on optical films, but also bright or dark spots due to irregularities.
As described above, the detected foreign matter can be classified into a good foreign matter and a defective foreign matter. A representative example of a good foreign matter may be a case where the size is too small and it does not become a defect. Therefore, foreign matter of a predetermined size or less is not judged to be defective based on the standard required for the optical film.
On the other hand, if a small foreign matter that is a good foreign object is in a cluster state, it is actually recognized as a flaw when the product is used, which may cause a problem. However, the conventional optical film defect discriminating method is to individually screen a unit foreign matter, and judge whether it is a defect based on a predetermined standard. Therefore, even if a small foreign matter of a good defect becomes a cluster state, it cannot be judged as a defect. Fig. 3 shows an example of the state in which such a small foreign matter is formed into a cluster state. As shown in Fig. 3, if the micro foreign matter is in a cluster state, it is actually recognized as a flaw when the product is used, but it is difficult to recognize the defect as a defect identification method which is known as an individual foreign matter.
The present invention provides a method of identifying a foreign matter as a defect when it is concentrated in a predetermined area to form a cluster to solve the problem as described above. Specifically, the foreign matter detected from the image captured by the inspection imaging device is centered on a certain foreign matter, and if there are two or more foreign substances in a circle having a radius of 5 mm, the foreign matter including the center foreign matter is determined. The aggregate is a defect (hereinafter referred to as a cluster defect).
The cluster area for judging whether or not the cluster defect is a circle having a radius of 5 mm based on the center foreign matter. If the radius exceeds 5 mm, there are few cases where it is recognized as 瑕疵 when actually used.
On the other hand, the radius of the cluster region can be further reduced depending on the specific use of the manufactured optical film. The smaller the radius of the cluster region, the less the case where the cluster defect is judged to be small, and if the optical film is required to be free from defects, the cluster radius is further reduced. For example, the radius of the cluster region may be 4 mm, 3 mm, 2 mm, or 1 mm, but is not limited thereto.
In the present invention, the size of the unit foreign matter forming the cluster defect is not particularly limited. It is preferable to have a size that is larger than the size of the foreign matter in the image, and that there are two or more sizes in the cluster area. For example, the long axis length of the foreign matter is 100 μm or less, and preferably 50 μm or less. In the present invention, the lower limit of the size of the foreign matter varies depending on the type of the photographing device, and since any small foreign matter can be detected in any case, it is determined in the present invention as long as it is collected in the cluster region, and thus is not particularly limited. It can be, for example, 30 μm. Therefore, the size of the foreign matter of the present invention may be, for example, 30 to 100 μm, preferably 30 to 50 μm, based on the long axis of the foreign matter, but is not limited thereto.
A schematic illustration of the aforementioned cluster defects is shown in Fig. 4. With reference to Fig. 4, since the foreign matter 1, 2, and 3 exist inside the circle having a predetermined radius around the foreign matter 2, there are two or more foreign substances in the cluster region, and it is determined as a cluster defect.
In the present invention, it is possible to further provide a step of marking the corresponding portion of the optical film when the clustering defect is determined in the above-described stage S2.
The marking is done in the area where the optical film is actually used, or in the remaining area (area that is not actually used) that is removed when processing into the final product.
By marking the portion where the cluster defect is generated, it can be easily used to classify or remove the cluster defect generating portion thereafter.
Further, by counting the number of the aforementioned marks, the defect occurrence rate is calculated, and not only the manufacturing process but also the index of the comparison image and the actual optical film can be used to confirm whether or not the determination of the cluster defect is correctly completed.
The defect identification method of the present invention can be applied to various optical films. Such an optical film includes, for example, a polarizing film or a retardation film, but is not limited thereto.
As described above, since the foreign matter concentrates in the predetermined region and is further clustered due to the above-described concentration, which may become a defective product, the present invention provides a method for determining the state (cluster defect) as a defect; the defect identification method of the present invention It is possible to detect that the defect of the individual unit is not defective, but in the predetermined region, the foreign matter is concentrated to cause flaws, so that the defect rate of the optical film can be reduced.
As described above, the present invention has been described by the embodiments and the drawings, but the present invention is not limited thereto, and it is not necessary to recite the technical idea of the present invention as described below with the general knowledge of the technical field to which the present invention pertains. Various corrections and modifications are applied within the equivalent scope of the patent application.
1、2、3、4‧‧‧異物 1, 2, 3, 4‧‧‧ foreign objects
Claims (1)
一種光學薄膜缺陷鑑別方法，備有以下階段：
拍攝移送之光學薄膜，取得前述光學薄膜之圖像的階段(S1)；及
從前述圖像檢出異物，以前述異物中之任一異物為中心，在半徑5mm之圓內，若異物存在有2個以上，則判斷包含中心異物之前述異物的集合為叢集缺陷的階段(S2)。
2.如申請專利範圍第1項之光學薄膜缺陷鑑別方法，其中前述半徑為4mm、3mm、2mm或1mm。
3.如申請專利範圍第1項之光學薄膜缺陷鑑別方法，其中前述異物之長軸長度為30～100μm。
4.如申請專利範圍第1項之光學薄膜缺陷鑑別方法，其中前述異物之長軸長度為30～50μm。
5.如申請專利範圍第1項之光學薄膜缺陷鑑別方法，其中前述階段(S1)之拍攝係藉由反射光學系統方式、穿透光學系統方式、或雙方方式來完成。
6.如申請專利範圍第1項之光學薄膜缺陷鑑別方法，其中進一步備有於前述階段(S2)判斷為叢集缺陷時，於前述光學薄膜之對應部分予以標記的階段。
An optical film defect identification method has the following stages:
a step of photographing the transferred optical film to obtain an image of the optical film (S1); and
When a foreign matter is detected from the image, and any two or more foreign substances are present in a circle having a radius of 5 mm centering on any foreign matter in the foreign matter, it is determined that the set of the foreign matter including the center foreign matter is a stage of cluster defects ( S2).
2. The optical film defect identification method according to claim 1, wherein the aforementioned radius is 4 mm, 3 mm, 2 mm or 1 mm.
3. The optical film defect identifying method according to claim 1, wherein the long-axis length of the foreign matter is 30 to 100 μm.
4. The optical film defect identification method according to claim 1, wherein the long-axis length of the foreign matter is 30 to 50 μm.
5. The optical film defect identification method according to claim 1, wherein the photographing of the foregoing stage (S1) is performed by a reflective optical system method, a penetrating optical system method, or both.
6. The method for discriminating an optical film defect according to the first aspect of the invention, further comprising the step of marking a corresponding portion of the optical film when the cluster (S2) is determined to be a cluster defect.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20130071495A KR20140148067A (en) | 2013-06-21 | 2013-06-21 | Method for discriminating defect of optical films |
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| Publication Number | Publication Date |
|---|---|
| TW201500731A true TW201500731A (en) | 2015-01-01 |
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|---|---|---|---|
| TW103117379A TW201500731A (en) | 2013-06-21 | 2014-05-16 | Method for discriminating defect of optical films |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2015004674A (en) |
| KR (1) | KR20140148067A (en) |
| CN (1) | CN104237246A (en) |
| TW (1) | TW201500731A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI714923B (en) * | 2018-12-06 | 2021-01-01 | 住華科技股份有限公司 | Automated optical inspection system and automated optical inspection method using the same |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101733017B1 (en) * | 2015-02-25 | 2017-05-24 | 동우 화인켐 주식회사 | Apparatus and method for detecting defect of optical film |
| KR101748208B1 (en) * | 2016-03-07 | 2017-06-19 | 동우 화인켐 주식회사 | Polarizing and system and method for inspection of sheet-shaped product |
| TWI676797B (en) * | 2019-03-12 | 2019-11-11 | 住華科技股份有限公司 | Optical film detecting device and optical film detecting method |
| CN116818786A (en) * | 2023-06-14 | 2023-09-29 | 成都瑞波科材料科技有限公司 | Foreign matter detection device and method for optical film and optical film coating device |
-
2013
- 2013-06-21 KR KR20130071495A patent/KR20140148067A/en not_active Application Discontinuation
-
2014
- 2014-05-16 TW TW103117379A patent/TW201500731A/en unknown
- 2014-06-17 JP JP2014124204A patent/JP2015004674A/en active Pending
- 2014-06-18 CN CN201410273073.8A patent/CN104237246A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI714923B (en) * | 2018-12-06 | 2021-01-01 | 住華科技股份有限公司 | Automated optical inspection system and automated optical inspection method using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104237246A (en) | 2014-12-24 |
| JP2015004674A (en) | 2015-01-08 |
| KR20140148067A (en) | 2014-12-31 |
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