TW201424088A - Electrode substrate and dye-sensitized solar cell - Google Patents

Electrode substrate and dye-sensitized solar cell Download PDF

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TW201424088A
TW201424088A TW102134918A TW102134918A TW201424088A TW 201424088 A TW201424088 A TW 201424088A TW 102134918 A TW102134918 A TW 102134918A TW 102134918 A TW102134918 A TW 102134918A TW 201424088 A TW201424088 A TW 201424088A
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porous film
electrode substrate
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TWI596824B (en
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Daisuke Tokita
Junichiro Anzai
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Sekisui Chemical Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20Light-sensitive devices
    • H01G9/2022Light-sensitive devices characterized by he counter electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20Light-sensitive devices
    • H01G9/2027Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2031Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20Light-sensitive devices
    • H01G9/2059Light-sensitive devices comprising an organic dye as the active light absorbing material, e.g. adsorbed on an electrode or dissolved in solution
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/542Dye sensitized solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

This invention provides an electrode substrate that comprises a conductive substrate, a porous membrane formed on the conductive substrate, and a catalytic layer coated on the porous membrane.

Description

電極基板及染料敏化太陽電池 Electrode substrate and dye-sensitized solar cell

本發明係關於一種可用作染料敏化太陽電池之對向電極之電極基板及使用該電極基板之染料敏化太陽電池。 The present invention relates to an electrode substrate which can be used as a counter electrode of a dye-sensitized solar cell and a dye-sensitized solar cell using the electrode substrate.

本申請案基於2012年12月14日在日本提出申請之日本特願2012-273719號而主張優先權,其內容引用於本文中。 The present application claims priority based on Japanese Patent Application No. 2012-273719, filed on Jan.

作為染料敏化太陽電池,已知有所謂之Graetzel型之系統(非專利文獻1)。若對吸附於構成光電極之多孔質氧化物半導體層之敏化染料照射光,則產生電子。該電子依次向染料、多孔質氧化物半導體層、透明導電膜、外部電路流動,作為電流被提取。另一方面,釋出電子之染料藉由電解質中之氧化還原對而被還原,並且經氧化之氧化還原對藉由構成對向電極之觸媒層而再生為還原體。 A so-called Graetzel type system is known as a dye-sensitized solar cell (Non-Patent Document 1). When light is irradiated to the sensitizing dye adsorbed to the porous oxide semiconductor layer constituting the photoelectrode, electrons are generated. The electrons sequentially flow to the dye, the porous oxide semiconductor layer, the transparent conductive film, and an external circuit, and are extracted as a current. On the other hand, the dye which emits electrons is reduced by the redox pair in the electrolyte, and the oxidized redox pair is regenerated into a reduced body by the catalyst layer constituting the counter electrode.

作為習知之構成染料敏化太陽電池之對向電極之觸媒層,廣泛使用形成於基板上之鉑電極(鉑薄膜)。作為鉑電極之形成方法,已知於基板上塗佈氯鉑酸溶液並加熱處理之方法、真空蒸鍍、濺鍍等方法。然而,由於鉑為高價之貴金屬,故而鉑電極之使用有增加染料敏化太陽電池之製造成本之問題。進而,有於水分存在下鉑對I-離子(碘化物離子)之耐久性並不足夠之問題。 As a conventional catalyst layer constituting a counter electrode of a dye-sensitized solar cell, a platinum electrode (platinum film) formed on a substrate is widely used. As a method of forming a platinum electrode, a method of applying a chloroplatinic acid solution to a substrate and heat-treating the method, vacuum vapor deposition, sputtering, or the like is known. However, since platinum is a noble metal of high price, the use of a platinum electrode has a problem of increasing the manufacturing cost of the dye-sensitized solar cell. Further, there is a problem that platinum does not have sufficient durability against I - ions (iodide ions) in the presence of moisture.

為了解決該問題,研究有代替鉑電極之新觸媒層之材料,例如,揭示有將使用聚噻吩、聚苯胺、聚吡咯等導電性高分子作為觸媒層之對向電極應用於染料敏化太陽電池之例(非專利文獻2、專利文獻1~2)。 In order to solve this problem, a material having a new catalyst layer instead of a platinum electrode has been studied. For example, it has been disclosed that a counter electrode using a conductive polymer such as polythiophene, polyaniline or polypyrrole as a catalyst layer is applied to dye sensitization. Examples of solar cells (Non-Patent Document 2, Patent Documents 1 to 2).

然而,使用具有該等導電性高分子之觸媒層之情形之發電效率較使用由鉑電極所構成之觸媒層之情形之發電效率明顯更低。其原因係由於導電性高分子之導電性及作為觸媒之還原能力(I3 -→I-之還原能力)較鉑之導電性及還原能力更低。 However, the power generation efficiency in the case of using a catalyst layer having such a conductive polymer is significantly lower than that in the case of using a catalyst layer composed of a platinum electrode. The reason for this is that the conductivity of the conductive polymer and the reducing ability (I 3 - → I - reducing ability) as a catalyst are lower than those of platinum.

觸媒層之還原能力係根據『觸媒活性』×『觸媒層之比表面積』決定,導電性高分子之觸媒活性較鉑更低。因此,於由導電性高分子所構成之觸媒層具有與鉑電極相同程度之比表面積之情形時,相較於鉑電極,由導電性高分子所構成之觸媒層之還原能力較差。因此,亦揭示有藉由於由導電性高分子所構成之觸媒層混合奈米碳管或碳粒子等碳材料,而提高觸媒層之比表面積或導電性,從而提高觸媒層之還原能力之方法(專利文獻3~4)。例如,習知之觸媒層之構成如圖1之模式圖所示。圖1之觸媒層具有於導電性基板21之上,形成包埋碳材料22之導電性高分子23之膜之構成。 The reducing power of the catalyst layer is determined by the "catalytic activity" × "specific surface area of the catalyst layer", and the catalytic activity of the conductive polymer is lower than that of platinum. Therefore, when the catalyst layer composed of the conductive polymer has a specific surface area similar to that of the platinum electrode, the catalytic ability of the catalyst layer composed of the conductive polymer is inferior to that of the platinum electrode. Therefore, it has also been disclosed that a carbon material such as a carbon nanotube or a carbon particle is mixed by a catalyst layer made of a conductive polymer to improve the specific surface area or conductivity of the catalyst layer, thereby improving the reducing power of the catalyst layer. Method (Patent Documents 3 to 4). For example, the composition of a conventional catalyst layer is as shown in the schematic diagram of FIG. The catalyst layer of FIG. 1 has a structure in which a film of a conductive polymer 23 encapsulating the carbon material 22 is formed on the conductive substrate 21.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1] 日本特開2003-313317號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-313317

[專利文獻2] 日本特開2003-317814號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2003-317814

[專利文獻3] 日本特開2006-147411號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2006-147411

[專利文獻4] 日本特開2011-14411號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2011-14411

[非專利文獻] [Non-patent literature]

[非專利文獻1] Nature,第353卷,第737頁,1991年 [Non-Patent Document 1] Nature, Vol. 353, p. 737, 1991

[非專利文獻2] Electrochemistry 71,No.11 (2003) 944-946 [Non-Patent Document 2] Electrochemistry 71, No. 11 (2003) 944-946

然而,即便於使用以專利文獻3~4之方法製造之觸媒層之情形時,由於觸媒層之比表面積不足夠,故而觸媒層之還原能力未達到鉑電極之同等以上。又,專利文獻3~4之觸媒層中,導電性高分子與上述碳材料以雜亂之狀態加以混合,故而觸媒層之構造(多孔度)控制性較低,因此,擔憂每批次之觸媒層之還原能力之差異或膜強度之差異。又,上述觸媒層中,碳材料彼此不直接接觸而經由導電性高分子結合,進而,存在多個碳材料不與導電性基板直接接觸之區域,故而電阻增大,關於導電性亦不及鉑電極。因此,尋求使用具有導電性高分子之觸媒層之電極基板之性能提高及使用上述電極基板作為對向電極之染料敏化太陽電池之發電效率之提高。 However, even in the case of using the catalyst layer manufactured by the methods of Patent Documents 3 to 4, since the specific surface area of the catalyst layer is insufficient, the reducing ability of the catalyst layer is not equal to or higher than that of the platinum electrode. Further, in the catalyst layers of Patent Documents 3 to 4, since the conductive polymer and the carbon material are mixed in a disordered state, the structure (porosity) of the catalyst layer is low in controllability, and therefore, each batch is worried. The difference in the reducing power of the catalyst layer or the difference in film strength. Further, in the catalyst layer, the carbon materials are not directly in contact with each other and are bonded via the conductive polymer, and further, a region in which a plurality of carbon materials are not in direct contact with the conductive substrate is formed, so that the electric resistance is increased and the conductivity is not as good as platinum. electrode. Therefore, improvement in performance of an electrode substrate using a catalyst layer having a conductive polymer and improvement in power generation efficiency of a dye-sensitized solar cell using the electrode substrate as a counter electrode have been sought.

本發明係鑒於上述情況而成者,其課題在於:提供一種可實現習知之用作染料敏化太陽電池之對向電極之鉑電極的同等以上之發電效率之電極基板及染料敏化太陽電池。 The present invention has been made in view of the above circumstances, and an object of the invention is to provide an electrode substrate and a dye-sensitized solar cell which can achieve a power generation efficiency equivalent to or higher than that of a platinum electrode used as a counter electrode of a dye-sensitized solar cell.

(1)一種電極基板,其具有導電性基板、製膜於上述導電性 基板上之多孔質膜、及塗佈於上述多孔質膜之觸媒層。 (1) An electrode substrate having a conductive substrate and film forming the above conductivity a porous film on the substrate and a catalyst layer applied to the porous film.

(2)如上述(1)所記載之電極基板,其中,沿上述多孔質膜之三維結構而塗佈有上述觸媒層。 (2) The electrode substrate according to the above (1), wherein the catalyst layer is applied along a three-dimensional structure of the porous film.

(3)如上述(1)或(2)所記載之電極基板,其中,於塗佈有上述觸媒層之多孔質膜含有複數個單一孔連結而成之連胞結構。 (3) The electrode substrate according to the above (1) or (2), wherein the porous film coated with the catalyst layer contains a plurality of single pores connected to each other.

(4)如上述(3)所記載之電極基板,其中,於塗佈有上述觸媒層之多孔質膜,上述連胞結構之個數大於上述單一孔之個數。 (4) The electrode substrate according to the above (3), wherein the number of the unitary structures is larger than the number of the single holes in the porous film coated with the catalyst layer.

(5)如上述(1)至(4)中任一項所記載之電極基板,其中,上述多孔質膜係由金屬或金屬化合物所構成。 The electrode substrate according to any one of the above aspects, wherein the porous film is made of a metal or a metal compound.

(6)如上述(1)至(4)中任一項所記載之電極基板,其中,上述多孔質膜係由碳材料所構成。 The electrode substrate according to any one of the above aspects, wherein the porous film is made of a carbon material.

(7)如上述(1)至(6)中任一項所記載之電極基板,其中,上述觸媒層係由導電性高分子所構成。 (7) The electrode substrate according to any one of the above-mentioned (1), wherein the catalyst layer is made of a conductive polymer.

(8)如上述(7)所記載之電極基板,其中,上述導電性高分子為如以下之通式(1)所示之噻吩化合物之聚合物。 (8) The electrode substrate according to the above (7), wherein the conductive polymer is a polymer of a thiophene compound represented by the following formula (1).

[式中,R1及R2為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、磺醯基中之任一者。當R1及 R2為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環]。 Wherein R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; Any of a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group. When R 1 and R 2 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the above alkyl group or alkoxy group may be bonded to each other to form a ring].

(9)如上述(7)所記載之電極基板,其中,上述導電性高分子為如以下通式(2)所示之吡咯化合物之聚合物。 (9) The electrode substrate according to the above (7), wherein the conductive polymer is a polymer of a pyrrole compound represented by the following formula (2).

[式中,R3及R4為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基或磺醯基。當R3及R4為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環]。 Wherein R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; A group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group or a sulfonyl group. When R 3 and R 4 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the above alkyl group or alkoxy group may be bonded to each other to form a ring].

(10)如上述(7)所記載之電極基板,其中上述導電性高分子為如下之通式(3)所示之苯胺化合物之聚合物。 (10) The electrode substrate according to the above (7), wherein the conductive polymer is a polymer of an aniline compound represented by the following formula (3).

[式中,R5~R8為分別獨立地表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基或磺醯基。當R5及R6、或R7及R8為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵 結而形成環]。 In the formula, R 5 to R 8 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, or a carboxyl group. Ester group, aldehyde group, hydroxyl group, halogen atom, cyano group, amine group, nitro group, azo group, sulfo group or sulfonyl group. When R 5 and R 6 or R 7 and R 8 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the alkyl group or the alkoxy group may be bonded to each other to form a ring].

(11)如上述(1)至(10)中任一項所記載之電極基板,其中,上述導電性基板之表面與上述多孔質膜接觸。 The electrode substrate according to any one of the above aspects, wherein the surface of the conductive substrate is in contact with the porous film.

(12)如上述(7)至(11)中任一項所記載之電極基板,其中,上述導電性高分子係經由使用上述多孔質膜作為作用極之電解聚合法塗佈於上述多孔質膜。 (12) The electrode substrate according to any one of the above aspects, wherein the conductive polymer is applied to the porous film via an electrolytic polymerization method using the porous film as a working electrode. .

(13)一種染料敏化太陽電池,係具備由上述(1)至(12)中任一項所記載之電極基板所構成之對向電極、吸附染料之光電極、及電解液。 (13) A dye-sensitized solar cell comprising the counter electrode comprising the electrode substrate according to any one of the above (1) to (12), a photoelectrode for adsorbing a dye, and an electrolytic solution.

關於本發明之電極基板,於具有較寬之比表面積之多孔質膜塗佈有導電性高分子等觸媒層,故而具有作為觸媒發揮功能之較寬之比表面積。又,於本發明之電極基板具有沿著具有較寬之比表面積之多孔質膜之三維構造塗佈有導電性高分子等觸媒層之構造之情形時,具有作為觸媒發揮功能之更寬之比表面積。其結果是,可提高根據『觸媒活性』×『觸媒層之比表面積』而決定之觸媒之還原能力,並且提高使用本發明之電極基板之染料敏化太陽電池的發電效率。 In the electrode substrate of the present invention, a porous film having a wide specific surface area is coated with a catalyst layer such as a conductive polymer, and therefore has a wide specific surface area which functions as a catalyst. Further, when the electrode substrate of the present invention has a structure in which a catalyst layer such as a conductive polymer is applied to a three-dimensional structure having a porous film having a wide specific surface area, it has a wider function as a catalyst. Specific surface area. As a result, the reducing power of the catalyst determined by the "catalytic activity" × "specific surface area of the catalyst layer" can be improved, and the power generation efficiency of the dye-sensitized solar cell using the electrode substrate of the present invention can be improved.

又,關於本發明之電極基板,導電性基板與多孔質膜之電性接觸部分及多孔質膜與導電性高分子等觸媒層之塗佈之電性接觸部分分別均質且確實地形成,故而導電性優異。其結果是,可提高使用本發明之電極基板之染料敏化太陽電池之發電效率。 Further, in the electrode substrate of the present invention, the electrical contact portion between the conductive substrate and the porous film and the electrical contact portion between the porous film and the catalyst layer such as the conductive polymer are uniformly and surely formed, respectively. Excellent in electrical conductivity. As a result, the power generation efficiency of the dye-sensitized solar cell using the electrode substrate of the present invention can be improved.

進而,關於本發明之電極基板,製膜於導電性基板上之多孔質膜之三維構造作為導電性高分子等觸媒層之塗佈之支撐構件而發揮功能,故而相 較於習知(相較於導電性高分子單獨(觸媒層單獨)之膜)構造性強度提高。其結果是,可提高使用本發明之電極基板製造染料敏化太陽電池之情形之製造良率,並且即便於上述染料敏化太陽電池之使用環境為朝對向電極施加外力之環境之情形時,亦可對上述染料敏化太陽電池提供優異之耐久性。 Further, in the electrode substrate of the present invention, the three-dimensional structure of the porous film formed on the conductive substrate functions as a supporting member for coating the catalyst layer such as a conductive polymer, and thus the phase The structural strength is improved as compared with the conventional one (the film of the conductive polymer alone (the catalyst layer alone)). As a result, the manufacturing yield in the case of producing the dye-sensitized solar cell using the electrode substrate of the present invention can be improved, and even when the use environment of the dye-sensitized solar cell is an environment in which an external force is applied to the opposite electrode, It can also provide excellent durability to the above dye-sensitized solar cells.

由於本發明之染料敏化太陽電池使用本發明之電極基板,故而發電效率優異,並且於朝對向電極施加外力之使用環境中亦發揮優異之耐久性。 Since the dye-sensitized solar cell of the present invention uses the electrode substrate of the present invention, it is excellent in power generation efficiency and exhibits excellent durability in an environment in which an external force is applied to the counter electrode.

1‧‧‧導電性基板 1‧‧‧Electrically conductive substrate

1a‧‧‧導電性膜 1a‧‧‧ Conductive film

1b‧‧‧基板 1b‧‧‧Substrate

2‧‧‧多孔質膜 2‧‧‧Porous membrane

2a‧‧‧具有導電性或半導體特性之微粒子 2a‧‧‧Microparticles with conductive or semiconducting properties

3‧‧‧導電性高分子(觸媒層) 3‧‧‧ Conductive polymer (catalyst layer)

4‧‧‧密封材 4‧‧‧ Sealing material

5‧‧‧電解液 5‧‧‧ electrolyte

6‧‧‧透明基板 6‧‧‧Transparent substrate

7‧‧‧透明導電膜 7‧‧‧Transparent conductive film

8‧‧‧多孔質氧化物半導體層 8‧‧‧Porous oxide semiconductor layer

10‧‧‧染料敏化太陽電池 10‧‧‧Dye-sensitized solar cells

11‧‧‧光電極(光電極基板) 11‧‧‧Photoelectrode (photoelectrode substrate)

12‧‧‧對向電極(對向電極基板) 12‧‧‧ Counter electrode (opposite electrode substrate)

21‧‧‧導電性基板 21‧‧‧Electrically conductive substrate

21a‧‧‧透明導電膜 21a‧‧‧Transparent conductive film

21b‧‧‧玻璃基板 21b‧‧‧ glass substrate

22‧‧‧碳材料 22‧‧‧Carbon materials

23‧‧‧導電性高分子 23‧‧‧ Conductive polymer

圖1係習知之對向電極之剖面模式圖。 Figure 1 is a schematic cross-sectional view of a conventional counter electrode.

圖2係第一實施形態之電極基板(對向電極)之剖面模式圖。 Fig. 2 is a schematic cross-sectional view showing an electrode substrate (opposing electrode) of the first embodiment.

圖3係第二實施形態之染料敏化太陽電池之剖面模式圖。 Fig. 3 is a schematic cross-sectional view showing the dye-sensitized solar cell of the second embodiment.

圖4A係觀察實施例9之對向電極之表面之SEM圖像。 Fig. 4A is an SEM image of the surface of the counter electrode of Example 9.

圖4B係觀察於實施例9之對向電極之表面塗佈PEDOT前之多孔質膜的表面之SEM圖像。 4B is an SEM image of the surface of the porous film before PEDOT coating on the surface of the counter electrode of Example 9.

圖4C係觀察實施例9之對向電極之剖面之SEM圖像。 4C is an SEM image of a cross section of the counter electrode of Example 9.

圖4D係圖4C之剖面之放大圖像。 Figure 4D is an enlarged image of the section of Figure 4C.

圖5A係觀察實施例10之對向電極之表面之SEM圖像。 Fig. 5A is an SEM image of the surface of the counter electrode of Example 10.

圖5B係觀察於實施例10之對向電極之表面塗佈PEDOT前之多孔質膜的表面之SEM圖像。 Fig. 5B is an SEM image of the surface of the porous film before PEDOT coating on the surface of the counter electrode of Example 10.

圖6A係觀察實施例7之對向電極之表面之SEM圖像。 Fig. 6A is an SEM image of the surface of the counter electrode of Example 7.

圖6B係觀察於實施例7之對向電極之表面塗佈PEDOT前之多孔質膜的表面之SEM圖像。 Fig. 6B is an SEM image of the surface of the porous film before PEDOT coating on the surface of the counter electrode of Example 7.

圖7A係觀察實施例8之對向電極之表面之SEM圖像。 Fig. 7A is an SEM image of the surface of the counter electrode of Example 8.

圖7B係觀察於實施例8之對向電極之表面塗佈PEDOT前之多孔質膜的表面之SEM圖像。 Fig. 7B is an SEM image of the surface of the porous film before PEDOT coating on the surface of the counter electrode of Example 8.

圖8係觀察比較例6之對向電極之表面之SEM圖像。 Fig. 8 is a view showing an SEM image of the surface of the counter electrode of Comparative Example 6.

圖9係觀察比較例7之對向電極之表面之SEM圖像。 Fig. 9 is a view showing an SEM image of the surface of the counter electrode of Comparative Example 7.

圖10係觀察比較例11之對向電極之表面之SEM圖像。 Fig. 10 is a view showing an SEM image of the surface of the counter electrode of Comparative Example 11.

以下,根據較佳之實施形態,參照圖式說明本發明,但本發明並非限定於該實施形態。 Hereinafter, the present invention will be described with reference to the drawings based on preferred embodiments, but the present invention is not limited to the embodiments.

《電極基板》 Electrode Substrate

本發明之第一實施形態之電極基板如圖2所示,具備製膜於導電性基板1上之多孔質膜2。多孔質膜2不僅於面對外部之表面,於膜內部亦具有三維地連通外部之孔。較佳為多孔質膜2含有複數個單一獨立之孔(單一孔)連結而成之連胞結構。於多孔質膜2中,較佳為連胞結構之個數(存在比率)大於單一孔之個數(存在比率)。 As shown in FIG. 2, the electrode substrate according to the first embodiment of the present invention includes a porous film 2 formed on a conductive substrate 1. The porous film 2 has a hole that communicates three-dimensionally with respect to the outside not only on the surface facing the outside but also on the inside. Preferably, the porous membrane 2 comprises a unitary structure in which a plurality of single independent pores (single pores) are joined. In the porous membrane 2, it is preferred that the number of the unitary structures (the ratio of existence) is larger than the number of the single pores (the ratio of existence).

於具有連胞結構之多孔質膜2,電解液所含之氧化還原對可自表面至內部充分地浸透,故而較佳。進而,於具有連胞結構之多孔質膜2,多孔質膜之表面與電解液接觸之面積(發生電化學反應之表面積)變多,作為其結果,有還原反應更有效率地推進之優勢。 In the porous membrane 2 having a continuous structure, the redox pair contained in the electrolytic solution can be sufficiently permeated from the surface to the inside, which is preferable. Further, in the porous membrane 2 having a continuous structure, the area of the surface of the porous membrane in contact with the electrolytic solution (the surface area where the electrochemical reaction occurs) is increased, and as a result, the reduction reaction is more efficiently promoted.

於多孔質膜2之表面塗佈(被覆)有導電性高分子等觸媒層3。此處, 於多孔質膜2之表面,亦含有與外部連通之內部之多孔質構造之表面。又,較佳為沿著藉由多孔質膜2之上述連胞結構而構成之三維多孔質膜構造而塗佈觸媒層3。藉由觸媒層3以此方式塗佈於三維之多孔質構造之表面(內壁面),有助於觸媒層3之觸媒活性之比表面積較習知顯著地變大。 A catalyst layer 3 such as a conductive polymer is applied (coated) on the surface of the porous film 2. Here, The surface of the porous membrane 2 also contains a surface of a porous structure that communicates with the outside. Further, it is preferable to apply the catalyst layer 3 along the three-dimensional porous film structure formed by the above-described cell structure of the porous film 2. By applying the catalyst layer 3 to the surface (inner wall surface) of the three-dimensional porous structure in this manner, the specific surface area of the catalytic activity of the catalyst layer 3 is significantly increased as compared with the conventional one.

於第一實施形態之電極基板,多孔質膜2具有三維地連通之構造,故而多孔質膜內部之電阻降低,而導電性優異。又,多孔質膜2之下表面整體直接與構成導電性基板1之導電性膜1a接觸,故而均質且確實地形成導電性基板1與多孔質膜2之電性接觸部分。又,於多孔質膜2未與導電性基板1接觸之區域之幾乎整體部分,多孔質膜2與導電性高分子3(觸媒層3)之塗佈層接觸,故而均質且確實地形成多孔質膜2與導電性高分子3(觸媒層3)之電性接觸部分。如此,均質且確實地形成電性接觸部分,故而第一實施形態之電極基板之導電性優異。 In the electrode substrate of the first embodiment, since the porous film 2 has a three-dimensional structure, the electric resistance inside the porous film is lowered, and the electrical conductivity is excellent. Further, since the entire lower surface of the porous film 2 is in direct contact with the conductive film 1a constituting the conductive substrate 1, the electrical contact portion between the conductive substrate 1 and the porous film 2 is uniformly and surely formed. Further, the porous film 2 is in contact with the coating layer of the conductive polymer 3 (catalyst layer 3) in almost the entire region of the region where the porous film 2 is not in contact with the conductive substrate 1, so that the porous film 2 is homogeneously and surely formed. The electrical contact portion between the plasma film 2 and the conductive polymer 3 (the catalyst layer 3). Since the electrical contact portion is formed homogeneously and surely, the electrode substrate of the first embodiment is excellent in conductivity.

(導電性基板) (conductive substrate)

導電性基板1藉由賦予導電性之導電性膜1a及基板1b而構成。 The conductive substrate 1 is configured by imparting a conductive conductive film 1a and a substrate 1b.

上述導電性膜之種類並無特別限制,例如可應用透明導電膜或金屬膜。 The type of the conductive film is not particularly limited, and for example, a transparent conductive film or a metal film can be applied.

上述透明導電膜之種類並無特別限制,可應用習知公知之染料敏化太陽電池所使用之透明導電膜,例如可列舉由金屬氧化物所構成之薄膜。 The type of the transparent conductive film is not particularly limited, and a transparent conductive film used in a conventionally known dye-sensitized solar cell can be applied, and examples thereof include a film composed of a metal oxide.

作為上述金屬氧化物,可列舉摻錫氧化銦(ITO)、摻氟氧化錫(FTO)、摻銻氧化錫(ATO)、摻銦氧化鋅(IZO)、摻鎵氧化鋅(GZO)、摻鋁氧化鋅(AZO)、氧化鋅、氧化錫等。該等之中,特佳為比電阻較小且導電率較高之ITO、以及耐熱性及耐候性優異之FTO。 Examples of the metal oxide include tin-doped indium oxide (ITO), fluorine-doped tin oxide (FTO), antimony-doped tin oxide (ATO), indium-doped zinc oxide (IZO), gallium-doped zinc oxide (GZO), and aluminum doping. Zinc oxide (AZO), zinc oxide, tin oxide, and the like. Among these, ITO which is smaller in specific resistance and higher in electrical conductivity, and FTO which is excellent in heat resistance and weather resistance are particularly preferable.

作為上述金屬膜,可列舉金(Au)、鉑(Pt)、銀(Ag)、銅(Cu)、鉻 (Cr)、鎢(W)、鋁(Al)、鎂(Mg)、鈦(Ti)、鎳(Ni)、錳(Mn)、鋅(Zn)、鐵(Fe)及其合金等,特佳為導電率、耐候性優異之Au、Pt、Cr、Ti、Ni。 Examples of the metal film include gold (Au), platinum (Pt), silver (Ag), copper (Cu), and chromium. (Cr), tungsten (W), aluminum (Al), magnesium (Mg), titanium (Ti), nickel (Ni), manganese (Mn), zinc (Zn), iron (Fe) and alloys thereof, etc. It is Au, Pt, Cr, Ti, and Ni which are excellent in electrical conductivity and weather resistance.

關於基板1b之種類,若可於表面形成上述導電性膜或金屬膜,則並無特別限制。例如,可列舉玻璃基板、金屬基板、樹脂基板等。 The type of the substrate 1b is not particularly limited as long as the conductive film or the metal film can be formed on the surface. For example, a glass substrate, a metal substrate, a resin substrate, etc. are mentioned.

關於第一實施形態之導電性基板1,由於其基板表面具有導電性即可,故而並非必須具備上述導電性膜。作為導電性基板1,例如可列舉金屬製之基板、導電性樹脂製之基板。又,構成第一實施形態之電極基板之導電性基板1中,含有具有可撓性之導電性膜或導電性片。將導電性膜或導電性片用作導電性基板1之情形,可將導電性基板1替換為導電性基材。 In the conductive substrate 1 of the first embodiment, since the surface of the substrate is electrically conductive, the conductive film is not necessarily required. Examples of the conductive substrate 1 include a substrate made of a metal or a substrate made of a conductive resin. Further, the conductive substrate 1 constituting the electrode substrate of the first embodiment contains a conductive film or a conductive sheet having flexibility. When a conductive film or a conductive sheet is used as the conductive substrate 1, the conductive substrate 1 can be replaced with a conductive substrate.

(多孔質膜) (porous membrane)

第一實施形態之多孔質膜2為具有三維之多孔質構造之膜(層),其構造可列舉微粒子2a接合之構造、利用相分離構造形成之單一構造、或使奈米網格積層之構造等。 The porous film 2 of the first embodiment is a film (layer) having a three-dimensional porous structure, and its structure includes a structure in which the fine particles 2a are joined, a single structure formed by a phase separation structure, or a structure in which a nano mesh is laminated. Wait.

構成微粒子2a之材料只要具有導電性或半導體特性,則並無特別限制,就獲得構造性強度較高之多孔質膜之觀點而言,較佳為鈦或鉑、金、銀、銅、鋁、鈷、鐵、鎂、鎳、鋅等金屬,或者氧化鈦或氧化錫、氧化鋅、氧化鎵、氧化銦、氧化鋁、氧化鉻、氧化鈷、氧化銅、氧化鐵、碳化鈦、碳化釩、碳化鎢、氮化鈦、氮化釩等金屬化合物,或者碳黑或奈米碳管、碳纖維、活性碳、石墨等碳材料等。 The material constituting the fine particles 2a is not particularly limited as long as it has conductivity or semiconductor characteristics, and from the viewpoint of obtaining a porous film having high structural strength, titanium, platinum, gold, silver, copper, aluminum, or preferably Metals such as cobalt, iron, magnesium, nickel, zinc, or titanium oxide or tin oxide, zinc oxide, gallium oxide, indium oxide, aluminum oxide, chromium oxide, cobalt oxide, copper oxide, iron oxide, titanium carbide, vanadium carbide, carbonization Metal compounds such as tungsten, titanium nitride, and vanadium nitride, or carbon materials such as carbon black or carbon nanotubes, carbon fibers, activated carbon, and graphite.

其中就低成本及大量生產之觀點而言,較佳為使用由包含金屬氧化物之金屬化合物,或碳材料所構成之微粒子。作為構成上述微粒子之材料, 特佳為氧化鈦、氧化錫、氧化鋅、碳黑。 Among them, from the viewpoint of low cost and mass production, it is preferred to use a fine particle composed of a metal compound containing a metal oxide or a carbon material. As a material constituting the above fine particles, Particularly preferred are titanium oxide, tin oxide, zinc oxide, and carbon black.

微粒子2a之形狀並無特別限定,可列舉球狀、針狀、纖維狀、袋狀、海膽狀之微粒子。 The shape of the fine particles 2a is not particularly limited, and examples thereof include spherical, needle-shaped, fibrous, bag-shaped, and urchin-shaped fine particles.

關於球狀微粒子之一次粒徑,有較佳之範圍根據將上述微粒子於導電性基板1上製膜之方法而有所不同之情形,通常較佳為1nm~500μm,更佳為1nm~250μm,進而較佳為5nm~100μm,特佳為10nm~10μm,最佳為10nm~1μm。再者,作為求出上述微粒子之一次粒徑之方法,例如可列舉以藉由雷射繞射式粒度分佈測定裝置之測定而獲得之體積平均徑之分佈之峰值之形式而決定之方法,或藉由SEM觀察而測定複數個微粒子之長徑而進行平均之方法。上述微粒子之一次粒徑較佳為藉由上述SEM觀察進行測定。 The preferred range of the primary particle diameter of the spherical fine particles varies depending on the method of forming the fine particles on the conductive substrate 1, and is usually preferably from 1 nm to 500 μm, more preferably from 1 nm to 250 μm. Preferably, it is 5 nm to 100 μm, particularly preferably 10 nm to 10 μm, and most preferably 10 nm to 1 μm. In addition, as a method of obtaining the primary particle diameter of the fine particles, for example, a method of determining the peak value of the distribution of the volume average diameter obtained by measurement by a laser diffraction type particle size distribution measuring apparatus, or A method of averaging the long diameters of a plurality of fine particles by SEM observation. The primary particle diameter of the above fine particles is preferably measured by the above SEM observation.

關於針狀、纖維狀、袋狀微粒子之一次粒徑,有較佳之範圍根據將上述微粒子於導電性基板1上製膜之方法而有所不同之情形,通常於長軸方向,較佳為1nm~500μm,更佳為1nm~250μm,進而較佳為5nm~100μm,特佳為10nm~10μm,最佳為10nm~5μm。於短軸方向較佳為1nm~500μm,更佳為1nm~250μm,進而較佳為5nm~100μm,特佳為10nm~10μm,最佳為10nm~1μm。 The preferred primary particle diameter of the acicular, fibrous or bag-like fine particles differs depending on the method of forming the fine particles on the conductive substrate 1, and is usually in the long axis direction, preferably 1 nm. 500 μm, more preferably 1 nm to 250 μm, further preferably 5 nm to 100 μm, particularly preferably 10 nm to 10 μm, and most preferably 10 nm to 5 μm. The direction of the minor axis is preferably from 1 nm to 500 μm, more preferably from 1 nm to 250 μm, further preferably from 5 nm to 100 μm, particularly preferably from 10 nm to 10 μm, and most preferably from 10 nm to 1 μm.

構成多孔質膜2之微粒子可單獨使用1種,亦可併用2種以上。 The fine particles constituting the porous membrane 2 may be used singly or in combination of two or more.

多孔質膜2之厚度並無特別限制,例如於0.1μm~100μm之範圍,考慮構造性強度並進行適當調整。亦根據微粒子之材料,就提高導電性之觀點而言,多孔質膜2之厚度較佳為0.1μm~10μm。 The thickness of the porous film 2 is not particularly limited, and is, for example, in the range of 0.1 μm to 100 μm, and is appropriately adjusted in consideration of the structural strength. The thickness of the porous film 2 is preferably from 0.1 μm to 10 μm from the viewpoint of improving the conductivity depending on the material of the fine particles.

關於多孔質膜2之空孔率(空隙率),為了提高比表面積而越大越佳,但若空孔率過大,則有多孔質膜2之構造性強度變弱之可能性。考慮該情況,多孔質膜2之空孔率較佳為50~80%。上述空孔率(空隙率)例如可藉由氣體吸附法或水銀壓入法等公知之方法進行測定。 The porosity (void ratio) of the porous film 2 is preferably larger in order to increase the specific surface area. However, if the porosity is too large, the structural strength of the porous film 2 may be weak. In view of this, the porosity of the porous membrane 2 is preferably from 50 to 80%. The porosity (void ratio) can be measured by a known method such as a gas adsorption method or a mercury intrusion method.

此處,藉由氣體吸附法測定塗佈有觸媒層3之狀態之多孔質膜2的比表面積之情形,較佳為0.1m2/g以上,更佳為1m2/g以上,進而較佳為3m2/g以上。藉由為3m2/g以上,可提高所塗佈之觸媒層3與電解質之接觸效率,可有效地還原電解質。即,可進一步提高觸媒效率。又,上述比表面積之上限值並無特別限制,例如可將300m2/g設為上限值之標準。 Here, the specific surface area of the porous film 2 in which the catalyst layer 3 is applied is measured by a gas adsorption method, and is preferably 0.1 m 2 /g or more, more preferably 1 m 2 /g or more, and further Good is 3m 2 /g or more. By being 3 m 2 /g or more, the contact efficiency between the applied catalyst layer 3 and the electrolyte can be improved, and the electrolyte can be efficiently reduced. That is, the catalyst efficiency can be further improved. Further, the upper limit of the specific surface area is not particularly limited, and for example, 300 m 2 /g can be set as the upper limit.

對於將構成第一實施形態之電極基板之多孔質膜2製膜於導電性基板1上之方法,若為可製造具有適當之空隙率之多孔質膜之方法,則並無特別限制,可應用習知公知之製膜方法。例如,可將包含具有導電性或半導體特性之微粒子2a及公知之黏合劑樹脂之糊劑塗佈於導電性基板1上,進而進行煅燒,藉此製膜。此處,作為微粒子2a,例如可列舉導電性微粒子或金屬氧化物微粒子。 The method of forming the porous film 2 constituting the electrode substrate of the first embodiment on the conductive substrate 1 is not particularly limited as long as it can produce a porous film having an appropriate porosity. A well-known film forming method is known. For example, a paste containing fine particles 2a having conductivity or semiconductor characteristics and a known binder resin can be applied onto the conductive substrate 1 and further calcined to form a film. Here, examples of the fine particles 2a include conductive fine particles or metal oxide fine particles.

又,藉由利用搬送氣體將具有導電性或半導體特性之微粒子2a吹送至導電性基板1上,具有導電性或半導體特性之微粒子2a與導電性基板1接合,從而獲得具有導電性或半導體特性之微粒子2a彼此接合之多孔質膜。作為吹送具有導電性或半導體特性之微粒子2a而形成多孔質膜2之方法,例如可列舉氣溶膠沈積法(AD法)。 In addition, the fine particles 2a having conductivity or semiconductor characteristics are blown onto the conductive substrate 1 by the carrier gas, and the fine particles 2a having conductivity or semiconductor characteristics are bonded to the conductive substrate 1 to obtain conductivity or semiconductor characteristics. A porous film in which the microparticles 2a are bonded to each other. As a method of forming the porous film 2 by blowing the fine particles 2a having conductivity or semiconductor characteristics, for example, an aerosol deposition method (AD method) can be mentioned.

(觸媒層) (catalyst layer)

於第一實施形態之電極基板,作為構成沿多孔質膜2之三維構造塗佈 之觸媒層3之材料,若為可將公知之構成電解質之氧化還原對加以還原之導電性物質,則並無特別限制。具體而言,例如除下述之導電性高分子之外,可列舉鉑,導電性碳材料,碳化鈦TiC、氮化鈦TiN等鈦化合物,氧化釩V2O3、氮化釩VN等釩化合物等。 In the electrode substrate of the first embodiment, as a material constituting the catalyst layer 3 applied along the three-dimensional structure of the porous film 2, a conductive material capable of reducing a redox pair of a known electrolyte is used. There are no special restrictions. Specifically, for example, in addition to the conductive polymer described below, a titanium compound such as platinum, a conductive carbon material, titanium carbide TiC or titanium nitride TiN, vanadium oxide V 2 O 3 or vanadium nitride VN may be mentioned. Compounds, etc.

構成觸媒層3之材料可僅為1種,亦可為2種以上。 The material constituting the catalyst layer 3 may be one type or two or more types.

對於藉由鉑等具有觸媒活性之金屬而形成觸媒層3之方法,若為可沿多孔質膜2之三維構造之表面形成鉑之層的方法,則並無特別限制。作為具體例,可列舉利用多孔質膜2及導電性基板1之導電性之電解鍍敷法、無電鍍敷法等。 The method of forming the catalyst layer 3 by a catalyst-active metal such as platinum is not particularly limited as long as it forms a layer of platinum along the surface of the three-dimensional structure of the porous film 2. Specific examples thereof include electrolytic plating using the conductivity of the porous film 2 and the conductive substrate 1, electroless plating, and the like.

塗佈於多孔質膜2之觸媒層3之厚度之下限值可根據觸媒層3之材料而發生變化,通常較佳為0.01nm以上,更佳為0.1nm以上,進而較佳為1nm以上。藉由為0.01nm以上,可充分地獲得觸媒活性。觸媒層3之厚度之上限值並無特別限制,較佳為未達將多孔質膜2之多孔質構造完全填埋之程度的厚度,具體而言,更佳為1000nm以下。 The lower limit of the thickness of the catalyst layer 3 applied to the porous film 2 may vary depending on the material of the catalyst layer 3, and is usually preferably 0.01 nm or more, more preferably 0.1 nm or more, and still more preferably 1 nm. the above. Catalyst activity can be sufficiently obtained by being 0.01 nm or more. The upper limit of the thickness of the catalyst layer 3 is not particularly limited, and is preferably a thickness that does not reach the extent that the porous structure of the porous membrane 2 is completely filled. Specifically, it is more preferably 1000 nm or less.

此處所例示之觸媒層3之厚度意指形成於多孔質膜2面對外部之表面(外表面)(即,自上方觀察多孔質膜2之時所識別之表面)之上的觸媒層3之厚度。作為檢查形成於該外表面上之觸媒層3之厚度之方法,較佳為以電子顯微鏡觀察形成有觸媒層3之多孔質膜2之剖面。 The thickness of the catalyst layer 3 exemplified herein means a catalyst layer formed on the surface (outer surface) of the porous film 2 facing the outside (that is, the surface recognized when the porous film 2 is observed from above) 3 thickness. As a method of inspecting the thickness of the catalyst layer 3 formed on the outer surface, it is preferable to observe the cross section of the porous film 2 on which the catalyst layer 3 is formed by an electron microscope.

以下,對使用導電性高分子作為構成觸媒層3之材料之情形進行說明。 Hereinafter, a case where a conductive polymer is used as a material constituting the catalyst layer 3 will be described.

(導電性高分子) (conductive polymer)

於第一實施形態之電極基板,藉由以導電性高分子3(觸媒層3)塗佈 多孔質膜2而構成觸媒層。藉由上述塗佈,於多孔質膜2之表面形成導電性高分子3之層。 The electrode substrate of the first embodiment is coated with a conductive polymer 3 (catalyst layer 3) The porous film 2 constitutes a catalyst layer. A layer of the conductive polymer 3 is formed on the surface of the porous film 2 by the above coating.

上述導電性高分子之種類並無特別限制,可應用習知公知之導電性高分子,例如可列舉下述通式(1)所示之噻吩化合物聚合而成之導電性高分子。 The type of the conductive polymer is not particularly limited, and a known conductive polymer can be used. For example, a conductive polymer obtained by polymerizing a thiophene compound represented by the following formula (1) can be used.

[式中,R1及R2為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、磺醯基中之任一者。當R1及R2為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環]。 Wherein R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; Any of a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group. When R 1 and R 2 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the above alkyl group or alkoxy group may be bonded to each other to form a ring].

上述烷基較佳為直鏈狀或支鏈狀烷基,更佳為直鏈狀烷基。 The above alkyl group is preferably a linear or branched alkyl group, more preferably a linear alkyl group.

上述烷基之碳原子數較佳為1~8,更佳為1~5,進而較佳為1~3。 The number of carbon atoms of the above alkyl group is preferably from 1 to 8, more preferably from 1 to 5, still more preferably from 1 to 3.

作為上述烷氧基,較佳為甲氧基、乙氧基、丙氧基、丁氧基,更佳為甲氧基或乙氧基。 The alkoxy group is preferably a methoxy group, an ethoxy group, a propoxy group or a butoxy group, more preferably a methoxy group or an ethoxy group.

作為上述芳基,可列舉苯基、苄基、甲苯基、萘基等。 Examples of the aryl group include a phenyl group, a benzyl group, a tolyl group, and a naphthyl group.

作為上述鹵原子,可列舉氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

當R1及R2為上述烷基或烷氧基時,亦可除鍵結於上述烷基或烷氧基末端之碳原子之1個氫原子以外,上述烷基或烷氧基末端之碳原 子彼此鍵結而形成環。 When R 1 and R 2 are the above alkyl group or alkoxy group, the carbon of the above alkyl group or alkoxy group may be removed in addition to one hydrogen atom bonded to a carbon atom at the terminal of the above alkyl group or alkoxy group. The atoms are bonded to each other to form a ring.

作為上述通式(1)所示之噻吩化合物之具體例,可列舉下述式(1-1)~(1-4)所示之化合物。 Specific examples of the thiophene compound represented by the above formula (1) include compounds represented by the following formulas (1-1) to (1-4).

又,作為上述導電性高分子,例如可列舉下述通式(2)所示之吡咯化合物聚合而成之導電性高分子。 In addition, as the conductive polymer, for example, a conductive polymer obtained by polymerizing a pyrrole compound represented by the following formula (2) can be mentioned.

[式中,R3及R4為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、磺醯基中之任一者。當R3及R4為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環]。 Wherein R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; Any of a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group. When R 3 and R 4 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the above alkyl group or alkoxy group may be bonded to each other to form a ring].

上述烷基較佳為直鏈狀或支鏈狀烷基,更佳為直鏈狀烷基。上述烷基之碳原子數較佳為1~8,更佳為1~5,進而較佳為1~3。 The above alkyl group is preferably a linear or branched alkyl group, more preferably a linear alkyl group. The number of carbon atoms of the above alkyl group is preferably from 1 to 8, more preferably from 1 to 5, still more preferably from 1 to 3.

作為上述烷氧基,較佳為甲氧基、乙氧基、丙氧基、丁氧基,更佳為甲氧基或乙氧基。 The alkoxy group is preferably a methoxy group, an ethoxy group, a propoxy group or a butoxy group, more preferably a methoxy group or an ethoxy group.

作為上述芳基,可列舉苯基、苄基、甲苯基、萘基等。 Examples of the aryl group include a phenyl group, a benzyl group, a tolyl group, and a naphthyl group.

作為上述鹵原子,可列舉氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

當R3及R4為上述烷基或烷氧基時,亦可除鍵結於上述烷基或烷氧基末端之碳原子之1個氫原子以外,上述烷基或烷氧基末端之碳原子彼此鍵結而形成環。 When R 3 and R 4 are the above alkyl group or alkoxy group, the carbon of the above alkyl group or alkoxy group may be removed in addition to one hydrogen atom bonded to a carbon atom at the terminal of the above alkyl group or alkoxy group. The atoms are bonded to each other to form a ring.

作為上述通式(2)所示之吡咯化合物之具體例,可列舉下述式(2-1)~(2-4)所示之化合物。 Specific examples of the pyrrole compound represented by the above formula (2) include compounds represented by the following formulas (2-1) to (2-4).

又,作為上述導電性高分子,例如可列舉下述通式(3)所示之苯胺化合物聚合而成之導電性高分子。 In addition, as the conductive polymer, for example, a conductive polymer obtained by polymerizing an aniline compound represented by the following formula (3) can be mentioned.

[式中,R5~R8為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、磺醯基中之任一者。當R5及R6、或R7及R8為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環]。 In the formula, R 5 to R 8 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group, and an ester. Any of a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group. When R 5 and R 6 or R 7 and R 8 are the above alkyl group or alkoxy group, the carbon atom at the terminal of the alkyl group or the alkoxy group may be bonded to each other to form a ring].

上述烷基較佳為直鏈狀或支鏈狀烷基,更佳為直鏈狀烷基。上述烷基之碳原子數較佳為1~8,更佳為1~5,進而較佳為1~3。 The above alkyl group is preferably a linear or branched alkyl group, more preferably a linear alkyl group. The number of carbon atoms of the above alkyl group is preferably from 1 to 8, more preferably from 1 to 5, still more preferably from 1 to 3.

作為上述烷氧基,較佳為甲氧基、乙氧基、丙氧基、丁氧基,更佳為甲氧基或乙氧基。 The alkoxy group is preferably a methoxy group, an ethoxy group, a propoxy group or a butoxy group, more preferably a methoxy group or an ethoxy group.

作為上述芳基,可列舉苯基、苄基、甲苯基、萘基等。 Examples of the aryl group include a phenyl group, a benzyl group, a tolyl group, and a naphthyl group.

作為上述鹵原子,可列舉氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

當R5~R8為上述烷基或烷氧基時,亦可除鍵結於上述烷基或烷氧基末端之碳原子之1個氫原子以外,上述烷基或烷氧基末端之碳原子彼此鍵結而形成環。 When R 5 to R 8 are the above alkyl group or alkoxy group, the carbon of the above alkyl group or alkoxy group may be removed in addition to one hydrogen atom bonded to a carbon atom at the terminal of the above alkyl group or alkoxy group. The atoms are bonded to each other to form a ring.

作為上述通式(3)所示之苯胺化合物之具體例,可列舉下述式(3-1)~(3-4)所示之化合物。 Specific examples of the aniline compound represented by the above formula (3) include compounds represented by the following formulas (3-1) to (3-4).

於構成第一實施形態之電極基板之多孔質膜2塗佈導電性高分子之方法並無特別限制,例如可列舉下述(a)~(d)之方法。 The method of applying the conductive polymer to the porous film 2 constituting the electrode substrate of the first embodiment is not particularly limited, and examples thereof include the following methods (a) to (d).

(a)將多孔質膜浸漬於包含構成導電性高分子之未聚合單體之溶液中,將上述多孔質膜作為作用極,進行上述單體之電解聚合,於上述多孔質膜上合成導電性高分子,藉此進行塗佈。 (a) immersing the porous membrane in a solution containing an unpolymerized monomer constituting the conductive polymer, using the porous membrane as a working electrode, performing electrolytic polymerization of the monomer, and synthesizing conductivity on the porous membrane The polymer is coated by this.

(b)將包含預先聚合之導電性高分子之溶液塗佈於多孔質膜,使溶劑揮發,藉此進行塗佈。 (b) Coating is carried out by applying a solution containing a prepolymerized conductive polymer to a porous film and volatilizing the solvent.

(c)將包含預先聚合之導電性高分子與其他公知之黏合劑樹脂之混合物塗佈於多孔質膜,將上述混合物固化,藉此進行塗佈。 (c) Applying a mixture containing a prepolymerized conductive polymer and another known binder resin to a porous film, and curing the mixture to coat the mixture.

(d)藉由將多孔質膜浸漬於包含構成導電性高分子之未聚合單體之溶液中,於上述溶液中添加公知之氧化劑(例如氯化鐵等),於多孔質膜上合成導電性高分子,藉此進行塗佈。 (d) by immersing the porous membrane in a solution containing an unpolymerized monomer constituting the conductive polymer, adding a known oxidizing agent (for example, ferric chloride or the like) to the solution to synthesize conductivity on the porous membrane The polymer is coated by this.

上述(a)~(c)之方法之中,較佳為(a)或(b)之方法,更佳為(a)之方法。關於(c)之方法,由於黏合劑樹脂殘留於多孔質膜上,故而有導電性高分子與多孔質膜之電性接觸變弱之虞。關於(d)之方法,有導電性高分子過聚合之可能性,其結果有填埋多孔質膜之內部之空孔之虞。另一方面,關於(a)及(b)之方法,由於多孔質膜與導電性高分子直接接觸,故而可充分地獲得兩者之電性接觸。進而,根據(a)之方法,於多孔質膜之內部之空孔(多孔質構造)(即,多孔質膜之三維構造之內部)中亦發生聚合反應,故而對於構成空孔之內壁面,亦可充分地塗佈導電性高分子。故而,更佳為(a)之方法。 Among the above methods (a) to (c), the method (a) or (b) is preferred, and the method (a) is more preferred. In the method (c), since the binder resin remains on the porous film, the electrical contact between the conductive polymer and the porous film is weak. Regarding the method (d), there is a possibility that the conductive polymer is superpolymerized, and as a result, there is a void in the inside of the porous film. On the other hand, in the methods (a) and (b), since the porous film is in direct contact with the conductive polymer, electrical contact between the two can be sufficiently obtained. Further, according to the method (a), a polymerization reaction occurs also in the pores (porous structure) inside the porous membrane (that is, inside the three-dimensional structure of the porous membrane), so that the inner wall surface constituting the pores is The conductive polymer can also be sufficiently coated. Therefore, it is better to be the method of (a).

塗佈多孔質膜2之導電性高分子之莫耳濃度就提高作為觸媒之還原能力之觀點而言,較佳為0.00001~1mol/cm3,更佳為0.0001~0.1mol/cm3,進而較佳為0.001~0.01mol/cm3The molar concentration of the conductive polymer to which the porous film 2 is applied is preferably from 0.00001 to 1 mol/cm 3 , more preferably from 0.0001 to 0.1 mol/cm 3 , from the viewpoint of improving the reducing ability of the catalyst. It is preferably 0.001 to 0.01 mol/cm 3 .

於第一實施形態之電極基板中,作為觸媒發揮功能之區域(觸媒層)之比表面積增大,導電性及構造性強度提高,故而將上述電極基板用作染料敏化太陽電池之對向電極之情形,較大地有助於發電效率之提高。 In the electrode substrate of the first embodiment, the specific surface area of the region (catalyst layer) functioning as a catalyst is increased, and the conductivity and the structural strength are improved. Therefore, the electrode substrate is used as a pair of dye-sensitized solar cells. In the case of an electrode, it contributes greatly to an increase in power generation efficiency.

以下,對使用第一實施形態之電極之染料敏化太陽電池進行說明。 Hereinafter, a dye-sensitized solar cell using the electrode of the first embodiment will be described.

《染料敏化太陽電池》 Dye Sensitized Solar Cell

本發明之第二實施形態之染料敏化太陽電池具備第一實施形態之電極基板作為對向電極(對向電極基板),進而具有吸附染料之光電極(光電極基板)、及電解液。作為此種染料敏化太陽電池之例,可列舉圖3所示之染料敏化太陽電池10。 A dye-sensitized solar cell according to a second embodiment of the present invention includes the electrode substrate of the first embodiment as a counter electrode (counter electrode substrate), a photoelectrode (photoelectrode substrate) that adsorbs a dye, and an electrolyte solution. As an example of such a dye-sensitized solar cell, the dye-sensitized solar cell 10 shown in Fig. 3 can be cited.

染料敏化太陽電池10具有由積層於透明基板6上之透明導電膜7及多孔質氧化物半導體層8構成之光電極11、對向電極12、及電解液5。電解液5藉由密封材4而密封於光電極11與對向電極12之間。 The dye-sensitized solar cell 10 has a photoelectrode 11 composed of a transparent conductive film 7 and a porous oxide semiconductor layer 8 laminated on a transparent substrate 6, a counter electrode 12, and an electrolytic solution 5. The electrolytic solution 5 is sealed between the photoelectrode 11 and the counter electrode 12 by the sealing member 4.

(光電極) (photoelectrode)

光電極11由作為透明基板6之玻璃基板、透明導電膜7及多孔質氧化物半導體層8構成。於電解液5所接觸之多孔質氧化物半導體層8之表面(亦包含多孔質膜(多孔質體)之內部之表面)上,吸附有公知之敏化染料。 The photoelectrode 11 is composed of a glass substrate as the transparent substrate 6, a transparent conductive film 7, and a porous oxide semiconductor layer 8. A well-known sensitizing dye is adsorbed on the surface of the porous oxide semiconductor layer 8 which is in contact with the electrolytic solution 5 (including the surface inside the porous film (porous body)).

構成光電極11之基板(基材)不限於玻璃製造,若為具有可見光之穿透性之基板,則並無特別限制。例如,除玻璃基板之外,可列舉透明之樹脂製之基板或膜或者片材。 The substrate (substrate) constituting the photoelectrode 11 is not limited to glass production, and is not particularly limited as long as it is a substrate having visible light transmittance. For example, a substrate or a film or a sheet made of a transparent resin may be mentioned in addition to the glass substrate.

作為上述玻璃,較佳為具有可見光之穿透性之玻璃,可列舉鈉鈣玻璃、石英玻璃、硼矽酸玻璃、維柯玻璃、無鹼玻璃、青板玻璃、白板玻璃等。 As the glass, a glass having a visible light transmittance is preferable, and examples thereof include soda lime glass, quartz glass, borosilicate glass, Vico glass, alkali-free glass, blue plate glass, and white glass.

作為上述樹脂(塑膠),較佳為具有可見光之穿透性之樹脂,例如可列舉聚丙烯酸、聚碳酸酯、聚酯、聚醯亞胺、聚苯乙烯、聚氯乙烯、聚醯胺等。該等之中,聚酯,尤其是聚對苯二甲酸乙二酯(PET)或聚萘二甲酸乙二酯(PEN)作為透明耐熱膜而被大量地生產及使用。就製造薄且輕 之撓性染料敏化太陽電池之觀點而言,較佳為上述基材為塑膠製之透明基材,更佳為PET或PEN膜。 The resin (plastic) is preferably a resin having visible light transmittance, and examples thereof include polyacrylic acid, polycarbonate, polyester, polyimine, polystyrene, polyvinyl chloride, and polyamine. Among these, polyester, especially polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), is widely produced and used as a transparent heat-resistant film. Made thin and light In view of the flexible dye-sensitized solar cell, the substrate is preferably a transparent substrate made of plastic, more preferably a PET or PEN film.

作為構成多孔質氧化物半導體層8之氧化物半導體,可應用先前公知之材料,為可吸附敏化染料之材料即可。例如可列舉氧化鈦、氧化鋅、鈦酸鍶等。 As the oxide semiconductor constituting the porous oxide semiconductor layer 8, a conventionally known material can be applied, and a material which can adsorb the sensitizing dye can be used. For example, titanium oxide, zinc oxide, barium titanate, etc. are mentioned.

藉由氧化物半導體之微粒子構成多孔質氧化物半導體層8(多孔質層)之情形,上述多孔質層亦可為藉由於上述基板上煅燒包含上述微粒子之公知之糊劑而形成之多孔質層。又,亦可應用藉由利用搬送氣體將上述微粒子吹送至上述基板上,於上述微粒子與上述基板接合且上述微粒子彼此接合之狀態形成之多孔質層。作為吹送微粒子而形成多孔質層之方法,可例示氣溶膠沈積法(AD法)。 When the porous oxide semiconductor layer 8 (porous layer) is formed of fine particles of an oxide semiconductor, the porous layer may be a porous layer formed by firing a known paste containing the fine particles on the substrate. . Further, a porous layer formed by blowing the fine particles onto the substrate by a carrier gas, bonding the fine particles to the substrate, and joining the fine particles to each other may be applied. As a method of forming a porous layer by blowing fine particles, an aerosol deposition method (AD method) can be exemplified.

關於上述微粒子之一次粒徑,有較佳之範圍根據將上述微粒子於上述基板上製膜之方法而有所不同之情形,通常較佳為1nm~500μm,更佳為1nm~250μm,進而較佳為5nm~100μm,特佳為10nm~10μm。再者,作為求出上述微粒子之一次粒徑之方法,例如可列舉以藉由雷射繞射式粒度分佈測定裝置之測定而獲得之體積平均徑之分佈之峰值之形式而決定之方法,或藉由SEM觀察而測定複數個微粒子之長徑而進行平均之方法。上述微粒子之一次粒徑較佳為藉由上述SEM觀察而進行測定。 The preferred range of the primary particle diameter of the fine particles is preferably from 1 nm to 500 μm, more preferably from 1 nm to 250 μm, even more preferably from 5 nm, depending on the method of forming the fine particles on the substrate. ~100μm, particularly preferably 10nm~10μm. In addition, as a method of obtaining the primary particle diameter of the fine particles, for example, a method of determining the peak value of the distribution of the volume average diameter obtained by measurement by a laser diffraction type particle size distribution measuring apparatus, or A method of averaging the long diameters of a plurality of fine particles by SEM observation. The primary particle diameter of the above fine particles is preferably measured by the above SEM observation.

[電解液] [electrolyte]

電解液5可應用先前公知之染料敏化太陽電池所使用之電解液。 The electrolyte 5 can be applied to an electrolyte used in a previously known dye-sensitized solar cell.

於電解液5中,溶解有氧化還原對(電解質)。氧化還原對可應用先前公知之氧化還原對。再者,於電解液5中,亦可於不脫離本發明之主旨之 範圍內,包含填料或增黏劑等其他添加劑。 In the electrolytic solution 5, a redox pair (electrolyte) is dissolved. Redox pairs can be applied to previously known redox couples. Furthermore, in the electrolyte 5, it is possible not to deviate from the gist of the present invention. Within the scope, it contains other additives such as fillers or tackifiers.

作為上述氧化還原對,例如可列舉碘分子與碘化物之組合,或溴分子與溴化合物之組合。 Examples of the redox pair include a combination of an iodine molecule and an iodide, or a combination of a bromine molecule and a bromine compound.

作為上述碘化物,例如可列舉碘化鈉(NaI)、碘化鉀(KI)等金屬碘化物,或四烷基銨碘化物、吡啶鎓碘化物、咪唑鎓碘化物等碘鹽作為較佳之碘化物。 Examples of the iodide include a metal iodide such as sodium iodide (NaI) or potassium iodide (KI), or an iodide salt such as a tetraalkylammonium iodide, a pyridinium iodide or an imidazolium iodide as a preferred iodide.

作為上述溴化合物,例如可列舉溴化鈉(NaBr)、溴化鉀(KBr)等金屬溴化物,或四烷基銨溴化物、吡啶鎓溴化物、咪唑鎓溴化物等溴鹽作為較佳之溴化合物。 The bromine compound may, for example, be a metal bromide such as sodium bromide (NaBr) or potassium bromide (KBr) or a bromine salt such as a tetraalkylammonium bromide, a pyridinium bromide or an imidazolium bromide as a preferred bromine. Compound.

電解液5中之上述氧化還原對之濃度並無特別限制,較佳為0.1~10莫耳/L,更佳為0.2~2莫耳/L。又,電解液5之溶劑中添加碘之情形之較佳碘濃度為0.01~1莫耳/L。 The concentration of the above redox couple in the electrolytic solution 5 is not particularly limited, but is preferably 0.1 to 10 mol/L, more preferably 0.2 to 2 mol/L. Further, in the case where iodine is added to the solvent of the electrolytic solution 5, the preferred iodine concentration is 0.01 to 1 mol/L.

亦可應用電解質層(固體電解質層)代替電解液5。上述電解質層具有與電解液5相同之功能,為凝膠狀或固體狀中之任一狀態。作為上述電解質層,例如可應用於電解液5中加入凝膠化劑或增黏劑,視需要去除溶劑,藉此將電解液5凝膠化或固體化而獲得之電解質層。使用凝膠狀或固體狀之電解質層之情形,無電解液自染料敏化太陽電池10漏出之虞。 Instead of the electrolytic solution 5, an electrolyte layer (solid electrolyte layer) may also be applied. The electrolyte layer has the same function as the electrolytic solution 5, and is in any of a gel state or a solid state. As the electrolyte layer, for example, an electrolyte layer obtained by adding a gelling agent or a tackifier to the electrolytic solution 5, and removing the solvent as needed, thereby gelling or solidifying the electrolytic solution 5 can be used. In the case of using a gel-like or solid electrolyte layer, no electrolyte leaks from the dye-sensitized solar cell 10.

於電解液5或上述電解質層中,亦可包含先前公知之導電性高分子。 The electrolyte solution 5 or the above electrolyte layer may also contain a previously known conductive polymer.

作為上述密封材,較佳為可將電解液保持於電池單元內部之構件。作為此種密封材,例如可應用先前公知之熱塑性樹脂、熱硬化性樹脂等合成樹脂。 As the sealing material, a member capable of holding the electrolytic solution inside the battery unit is preferable. As such a sealing material, for example, a synthetic resin such as a conventionally known thermoplastic resin or thermosetting resin can be applied.

(對向電極) (opposite electrode)

第二實施形態之染料敏化太陽電池中之對向電極12為第一實施形態之電極基板。 The counter electrode 12 in the dye-sensitized solar cell of the second embodiment is the electrode substrate of the first embodiment.

(染料敏化太陽電池之製造方法) (Manufacturing method of dye-sensitized solar cell)

關於第二實施形態之染料敏化太陽電池,除使用第一實施形態之電極基板(對向電極12)以外,可藉由常法製造。 The dye-sensitized solar cell of the second embodiment can be produced by a usual method in addition to the electrode substrate (counter electrode 12) of the first embodiment.

由於作為對向電極12之第一實施形態之電極基板之導電性高分子(觸媒層)的塗佈層藉由多孔質膜而受到支撐,故而具有較高之構造性強度。因此,於製造時冶具等接觸上述塗佈層之情形時,亦降低上述塗佈層損傷之虞。因此,藉由將第一實施形態之電極基板用作對向電極,可提高第二實施形態之染料敏化太陽電池之製造良率。 Since the coating layer of the conductive polymer (catalyst layer) which is the electrode substrate of the first embodiment of the counter electrode 12 is supported by the porous film, it has high structural strength. Therefore, when the coating tool or the like is brought into contact with the coating layer at the time of manufacture, the damage of the coating layer is also reduced. Therefore, by using the electrode substrate of the first embodiment as a counter electrode, the manufacturing yield of the dye-sensitized solar cell of the second embodiment can be improved.

[實施例] [Examples]

繼而,利用實施例進一步詳細地說明本發明,但本發明並不受該等例之限定。 Hereinafter, the present invention will be described in further detail by way of examples, but the invention is not limited by the examples.

[實施例1] [Example 1]

(多孔質氧化物半導體層之形成) (Formation of porous oxide semiconductor layer)

使用由氧化鈦粒子(粒徑Φ19nm)19質量%、乙基纖維素9質量%、松脂醇72質量%所構成之糊劑,形成多孔質氧化物半導體層(厚度8μm)。作為透明導電基板,使用配有FTO膜之表面電阻10歐姆(Ω)之玻璃基板,將上述糊劑利用網版印刷法以4mm×4mm之面積,塗佈於FTO膜上之後,於空氣氣氛下在500℃煅燒30分鐘,於透明導電膜上形成多孔質氧化物半導體層(透明層)。 A porous oxide semiconductor layer (thickness: 8 μm) was formed using a paste composed of 19% by mass of titanium oxide particles (particle diameter Φ19 nm), 9% by mass of ethyl cellulose, and 72% by mass of rosin. As a transparent conductive substrate, a glass substrate having a surface resistance of 10 ohms (Ω) of an FTO film was used, and the paste was applied onto an FTO film by a screen printing method at an area of 4 mm × 4 mm, and then in an air atmosphere. The porous oxide semiconductor layer (transparent layer) was formed on the transparent conductive film by calcination at 500 ° C for 30 minutes.

(染料吸附) (dye adsorption)

於將敏化染料N719以0.3mM之濃度溶解於乙腈與第三丁醇之1:1之混合液而成之染料溶液中,將形成有上述多孔質氧化物半導體層之基板浸漬20小時,藉此使敏化染料吸附於光電極之多孔質氧化物半導體層。 The sensitizing dye N719 was dissolved in a dye solution of 1:1 mixture of acetonitrile and third butanol at a concentration of 0.3 mM, and the substrate on which the porous oxide semiconductor layer was formed was immersed for 20 hours. This causes the sensitizing dye to be adsorbed to the porous oxide semiconductor layer of the photoelectrode.

(對向電極之製作) (production of counter electrode)

使用由氧化鈦粒子(粒徑Φ19nm)19質量%、乙基纖維素9質量%、松脂醇72質量%所構成之糊劑,形成多孔質膜。作為透明導電基板,使用配有FTO膜之表面電阻10歐姆(Ω)之玻璃基板,將上述糊劑利用網版印刷法以4mm×4mm之面積,塗佈於FTO膜上之後,於空氣氣氛下在500℃煅燒30分鐘,於透明導電膜上形成氧化鈦之多孔質膜(厚度1.5μm)。構成如此形成之多孔質膜之氧化鈦粒子與FTO膜直接接觸,故而多孔質膜與FTO膜之間之導電性優異。 A porous film was formed using a paste composed of 19% by mass of titanium oxide particles (particle diameter Φ19 nm), 9% by mass of ethyl cellulose, and 72% by mass of rosin alcohol. As a transparent conductive substrate, a glass substrate having a surface resistance of 10 ohms (Ω) of an FTO film was used, and the paste was applied onto an FTO film by a screen printing method at an area of 4 mm × 4 mm, and then in an air atmosphere. After calcination at 500 ° C for 30 minutes, a porous film of titanium oxide (thickness: 1.5 μm) was formed on the transparent conductive film. Since the titanium oxide particles constituting the porous film thus formed are in direct contact with the FTO film, the conductivity between the porous film and the FTO film is excellent.

繼而,藉由電解聚合法將導電性高分子塗佈於多孔質膜。使用上述多孔質膜及FTO膜作為作用極,使用鉑線作為相對電極,使用Ag/Ag+電極作為參照極,從而進行導電性高分子之電解聚合。電解聚合時,於包含10-2M之EDOT(3,4-伸乙二氧基噻吩:上述式(1-1)所示之化合物)、10-1M之LiTFSI(雙三氟甲烷磺醯亞胺鋰)之乙腈溶液中,浸漬上述作用極、相對電極、參照極,使用恆電位器(IVIUM公司製造),以1.2V施加電壓40秒,於多孔質膜表面上形成導電性高分子(PEDOT:TFSI)。即,可形成如圖2中模式性地所示之沿多孔質膜之三維結構之觸媒層3(上述導電性高分子之層)。 Then, the conductive polymer is applied to the porous film by electrolytic polymerization. The porous film and the FTO film were used as the working electrode, and a platinum wire was used as a counter electrode, and an Ag/Ag + electrode was used as a reference electrode to carry out electrolytic polymerization of the conductive polymer. In electrolytic polymerization, it contains 10 -2 M EDOT (3,4-extended ethylenedioxythiophene: a compound represented by the above formula (1-1)), 10 -1 M of LiTFSI (bistrifluoromethanesulfonate) In the acetonitrile solution of lithium imide), the working electrode, the counter electrode, and the reference electrode were immersed, and a constant potential device (manufactured by IVIUM) was used, and a voltage was applied at 1.2 V for 40 seconds to form a conductive polymer on the surface of the porous film ( PEDOT: TFSI). That is, the catalyst layer 3 (layer of the above-mentioned conductive polymer) having a three-dimensional structure along the porous film as schematically shown in Fig. 2 can be formed.

(膜強度之評價) (Evaluation of film strength)

將製作而成之對向電極浸漬於乙醇,以超音波(振盪頻率42kHz)提供5分鐘刺激之後,觀察利用上述對向電極之導電性高分子塗佈之多孔質膜之表面,藉此評價膜強度。評價以下述之二階段進行。將其結果一併記於表1。 The prepared counter electrode was immersed in ethanol, and after 5 minutes of stimulation with ultrasonic waves (oscillation frequency of 42 kHz), the surface of the porous film coated with the conductive polymer of the counter electrode was observed, thereby evaluating the film. strength. The evaluation was carried out in the following two stages. The results are shown in Table 1.

良好(A):幾乎未見剝離或損傷。 Good (A): almost no peeling or damage was observed.

不良(B):可以無法忽視之程度看見剝離或損傷。 Poor (B): Peeling or damage can be seen to the extent that it cannot be ignored.

(電池之裝配及發電性能評價) (Battery assembly and power generation performance evaluation)

將以上述方法製作而成之對向電極與光電極介隔厚度30μm之樹脂性墊片(分隔件)而重合並夾住,向兩電極間注入電解液,藉此裝配染料敏化太陽電池(電池)。作為電解液,使用將碘0.03M、碘化1,3-二甲基-2-丙基咪唑鎓0.6M、碘化鋰0.10M、第三丁基吡啶0.5M溶解於作為溶劑之乙腈而獲得之電解液。 The counter electrode and the photoelectrode formed by the above method are separated by sandwiching a resin spacer (separator) having a thickness of 30 μm, and an electrolyte solution is injected between the electrodes to assemble a dye-sensitized solar cell ( battery). As the electrolytic solution, 0.03 M of iodine, 0.6 M of 1,3-dimethyl-2-propylimidazolium iodide, 0.10 M of lithium iodide, and 0.5 M of a third butylpyridine were dissolved in acetonitrile as a solvent. The electrolyte.

作為所製作之電池之發電性能,利用太陽模擬器(AM1.5)評價光電轉換效率η、短路電流Isc、開路電壓Voc、填充因數FF。將其結果示於表1。 As the power generation performance of the produced battery, the photoelectric conversion efficiency η, the short-circuit current Isc, the open circuit voltage Voc, and the fill factor FF were evaluated by a solar simulator (AM 1.5). The results are shown in Table 1.

[實施例2] [Embodiment 2]

除將構成對向電極之微粒子變更為氧化鋅粒子(粒徑Φ23nm)以外,以與實施例1相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 1 except that the fine particles constituting the counter electrode were changed to zinc oxide particles (particle diameter Φ 23 nm), and the power generation performance was evaluated. The results are shown in Table 1.

[實施例3] [Example 3]

除將構成對向電極之微粒子變更為碳黑(粒徑Φ23nm)以外,以與實施例1相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 1 except that the fine particles constituting the counter electrode were changed to carbon black (particle diameter Φ 23 nm), and the power generation performance was evaluated. The results are shown in Table 1.

[比較例1] [Comparative Example 1]

除使用藉由濺鍍法於玻璃基板形成鉑薄膜之鉑電極基板作為對向電極以外,以與實施例1相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 1 except that a platinum electrode substrate in which a platinum film was formed on a glass substrate by a sputtering method was used as a counter electrode, and power generation performance was evaluated. The results are shown in Table 1.

[比較例2] [Comparative Example 2]

使用與實施例1相同之配有FTO膜之玻璃基板作為作用極,以與實施例1相同之方式進行電解聚合,於FTO膜上形成導電性高分子,從而製作對向電極。 A glass substrate having an FTO film similar to that of Example 1 was used as a working electrode, and electrolytic polymerization was carried out in the same manner as in Example 1, and a conductive polymer was formed on the FTO film to prepare a counter electrode.

除對向電極以外,以與實施例1相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 1 except for the counter electrode, and evaluation of power generation performance was performed. The results are shown in Table 1.

[比較例3] [Comparative Example 3]

除於構成對向電極之多孔質膜未塗佈導電性高分子以外,以與實施例1相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 1 except that the porous film constituting the counter electrode was not coated with a conductive polymer, and the power generation performance was evaluated. The results are shown in Table 1.

[比較例4] [Comparative Example 4]

除於構成對向電極之多孔質膜未塗佈導電性高分子以外,以與實施例2相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 2 except that the porous film constituting the counter electrode was not coated with a conductive polymer, and the power generation performance was evaluated. The results are shown in Table 1.

[比較例5] [Comparative Example 5]

除於構成對向電極之多孔質膜未塗佈導電性高分子以外,以與實施例3相同之方式製作染料敏化太陽電池,並進行發電性能之評價。將其結果示於表1。 A dye-sensitized solar cell was produced in the same manner as in Example 3 except that the porous film constituting the counter electrode was not coated with a conductive polymer, and the power generation performance was evaluated. The results are shown in Table 1.

由表1之結果明白,本發明之實施例1~3之光電轉換效率(發電效率)η具有與比較例1~5同等,或其以上之性能。 As is apparent from the results of Table 1, the photoelectric conversion efficiency (power generation efficiency) η of Examples 1 to 3 of the present invention has the same performance as Comparative Examples 1 to 5 or higher.

[實施例4] [Example 4]

於光電極之製作中,在以與實施例1相同之方式形成之多孔質氧化物半導體層(透明層)(膜厚8μm)之上,積層由粒徑400nm之氧化鈦粒子所構成之反射層(膜厚4μm)後,使染料吸附於上述透明層及反射層,除此以外,以與實施例1相同之方式製作電池(染料敏化太陽電池)。 In the production of the photoelectrode, a reflective layer composed of titanium oxide particles having a particle diameter of 400 nm was laminated on a porous oxide semiconductor layer (transparent layer) (film thickness: 8 μm) formed in the same manner as in Example 1. A battery (dye-sensitized solar cell) was produced in the same manner as in Example 1 except that the dye was adsorbed on the transparent layer and the reflective layer.

對於上述反射層,以與形成上述透明層之情形相同之方式,於將由氧化鈦(粒徑Φ400nm)19質量%、乙基纖維素9質量%、及松脂醇72質量%所構成之糊劑印刷於上述透明層之上後,於500℃煅燒,藉此形成。 In the same manner as in the case of forming the above-mentioned transparent layer, the paste is printed with a paste composed of titanium oxide (particle diameter Φ400 nm) of 19% by mass, ethylcellulose 9% by mass, and rosinol 72% by mass. After being over the above transparent layer, it was calcined at 500 ° C, thereby being formed.

此處,上述透明層與上述反射層所含有之氧化鈦之粒徑不同。可將上述透明層替換為第一層,上述反射層替換為第二層。 Here, the transparent layer and the titanium oxide contained in the reflective layer have different particle diameters. The transparent layer may be replaced by a first layer, and the reflective layer may be replaced by a second layer.

再者,染料之吸附係於將上述第一層及第二層積層、煅燒後,以與實施例1相同之方式進行。 Further, the adsorption of the dye was carried out in the same manner as in Example 1 after the first layer and the second layer were laminated and fired.

[實施例5] [Example 5]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑30nm之氧化鈦粒子以外,以與實施例4相同之方式製作電池。 A battery was fabricated in the same manner as in Example 4 except that the titanium oxide particles having a particle diameter of 19 nm were changed to titanium oxide particles having a particle diameter of 30 nm in the production of the counter electrode.

[實施例6] [Embodiment 6]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑200nm之氧化鈦粒子以外,以與實施例4相同之方式製作電池。 A battery was fabricated in the same manner as in Example 4 except that the titanium oxide particles having a particle diameter of 19 nm were changed to titanium oxide particles having a particle diameter of 200 nm in the production of the counter electrode.

[實施例7] [Embodiment 7]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑10~30nm之ATO(銻錫氧化物)粒子以外,以與實施例4相同之方式製作電池。 A battery was fabricated in the same manner as in Example 4 except that the titanium oxide particles having a particle diameter of 19 nm were changed to ATO (antimony tin oxide) particles having a particle diameter of 10 to 30 nm in the production of the counter electrode.

[實施例8] [Embodiment 8]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為長軸粒徑200~2000nm、短軸粒徑10~20nm之ATO針狀粒子以外,以與實施例4相同之方式製作電池。 In the production of the counter electrode, in the same manner as in Example 4, except that the titanium oxide particles having a particle diameter of 19 nm were changed to ATO needle-like particles having a major axis diameter of 200 to 2000 nm and a short-axis particle diameter of 10 to 20 nm. battery.

[實施例9] [Embodiment 9]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為被覆有粒徑200~500nm之ATO之氧化鈦粒子以外,以與實施例4相同之方式製作電池。 In the production of the counter electrode, a battery was produced in the same manner as in Example 4 except that the titanium oxide particles having a particle diameter of 19 nm were changed to the titanium oxide particles coated with ATO having a particle diameter of 200 to 500 nm.

[實施例10] [Embodiment 10]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑23nm之碳黑粒子以外,以與實施例4相同之方式製作電池。 A battery was fabricated in the same manner as in Example 4 except that the titanium oxide particles having a particle diameter of 19 nm were changed to carbon black particles having a particle diameter of 23 nm in the production of the counter electrode.

[實施例11] [Example 11]

於對向電極之製作中,除將以粒徑19nm之氧化鈦粒子形成之多孔質 膜變更為網眼8μm、線徑8μm、厚度3μm之鎳網格以外,以與實施例4相同之方式製作電池。 In the fabrication of the counter electrode, except for the porous material formed by the titanium oxide particles having a particle diameter of 19 nm A battery was fabricated in the same manner as in Example 4 except that the film was changed to a nickel mesh having a mesh size of 8 μm, a wire diameter of 8 μm, and a thickness of 3 μm.

[實施例12] [Embodiment 12]

於對向電極之製作中,作為觸媒層之塗佈材料,將上述式(1-1)之EDOT聚合而成之PEDOT變更為上述式(2-2)之吡咯聚合而成之聚吡咯,除此以外,以與實施例10相同之方式製作電池。 In the production of the counter electrode, the PEDOT obtained by polymerizing the EDOT of the above formula (1-1) is changed to the polypyrrole obtained by polymerizing the pyrrole of the above formula (2-2) as a coating material for the catalyst layer. A battery was fabricated in the same manner as in Example 10 except for the above.

[實施例13] [Example 13]

於對向電極之製作中,作為觸媒層之塗佈材料,將上述式(1-1)之EDOT聚合而成之PEDOT變更為上述式(3-1)之苯胺聚合而成之聚苯胺,除此以外,以與實施例10相同之方式製作電池。 In the production of the counter electrode, the PEDOT obtained by polymerizing the EDOT of the above formula (1-1) is changed to the polyaniline obtained by polymerizing the aniline of the above formula (3-1). A battery was fabricated in the same manner as in Example 10 except for the above.

[實施例14] [Embodiment 14]

於對向電極之製作中,代替藉由電解聚合法形成PEDOT之觸媒層,而藉由將多孔質膜浸漬於10mM之氯鉑酸之2-丙醇溶液後,於450℃煅燒,於多孔質膜之表面形成由鉑所構成之觸媒層,除此以外,以與實施例4相同之方式製作電池。 In the fabrication of the counter electrode, instead of forming a catalyst layer of PEDOT by electrolytic polymerization, the porous membrane is immersed in a 2-propanol solution of 10 mM chloroplatinic acid, and then calcined at 450 ° C to be porous. A battery was fabricated in the same manner as in Example 4 except that a catalyst layer made of platinum was formed on the surface of the plasma film.

[實施例15] [Example 15]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑10~30nm之ATO(銻錫氧化物)粒子以外,以與實施例14相同之方式製作電池。 A battery was fabricated in the same manner as in Example 14 except that the titanium oxide particles having a particle diameter of 19 nm were changed to ATO (antimony tin oxide) particles having a particle diameter of 10 to 30 nm in the production of the counter electrode.

[實施例16] [Example 16]

於對向電極之製作中,除將粒徑19nm之氧化鈦粒子變更為粒徑23nm之碳黑粒子以外,以與實施例14相同之方式製作電池。 A battery was fabricated in the same manner as in Example 14 except that the titanium oxide particles having a particle diameter of 19 nm were changed to carbon black particles having a particle diameter of 23 nm in the production of the counter electrode.

[比較例6] [Comparative Example 6]

於光電極之製作中,在以與比較例1相同之方式形成之多孔質氧化物半導體層(透明層)(膜厚8μm)之上,積層由粒徑400nm之氧化鈦粒子所構成之反射層(膜厚4μm)後,使染料吸附於上述透明層及反射層,除此以外,以與比較例1相同之方式製作電池。上述反射層以與實施例4相同之方法形成。 In the production of the photoelectrode, a reflective layer composed of titanium oxide particles having a particle diameter of 400 nm was laminated on a porous oxide semiconductor layer (transparent layer) (thickness: 8 μm) formed in the same manner as in Comparative Example 1. (The film thickness was 4 μm), and a battery was produced in the same manner as in Comparative Example 1, except that the dye was adsorbed on the transparent layer and the reflective layer. The above reflective layer was formed in the same manner as in Example 4.

[比較例7] [Comparative Example 7]

於光電極之製作中,在以與比較例2相同之方式形成之多孔質氧化物半導體層(透明層)(膜厚8μm)之上,積層由粒徑400nm之氧化鈦粒子所構成之反射層(膜厚4μm)後,使染料吸附於上述透明層及反射層,除此以外,以與比較例2相同之方式製作電池。上述反射層以與實施例4相同之方法形成。 In the production of the photoelectrode, a reflective layer composed of titanium oxide particles having a particle diameter of 400 nm was laminated on a porous oxide semiconductor layer (transparent layer) (film thickness: 8 μm) formed in the same manner as in Comparative Example 2. (The film thickness was 4 μm), and a battery was produced in the same manner as in Comparative Example 2 except that the dye was adsorbed on the transparent layer and the reflective layer. The above reflective layer was formed in the same manner as in Example 4.

[比較例8] [Comparative Example 8]

於對向電極之製作中,作為觸媒層之塗佈材料,將上述式(1-1)之EDOT聚合而成之PEDOT變更為上述式(2-2)之吡咯聚合而成之聚吡咯,除此以外,以與比較例7相同之方式製作電池。 In the production of the counter electrode, the PEDOT obtained by polymerizing the EDOT of the above formula (1-1) is changed to the polypyrrole obtained by polymerizing the pyrrole of the above formula (2-2) as a coating material for the catalyst layer. A battery was fabricated in the same manner as in Comparative Example 7, except the above.

[比較例9] [Comparative Example 9]

於對向電極之製作中,作為觸媒層之塗佈材料,將上述式(1-1)之EDOT聚合而成之PEDOT變更為上述式(3-1)之苯胺聚合而成之聚苯胺,除此以外,以與比較例7相同之方式製作電池。 In the production of the counter electrode, the PEDOT obtained by polymerizing the EDOT of the above formula (1-1) is changed to the polyaniline obtained by polymerizing the aniline of the above formula (3-1). A battery was fabricated in the same manner as in Comparative Example 7, except the above.

[比較例10] [Comparative Example 10]

於對向電極之製作中,代替藉由電解聚合法形成PEDOT之觸媒層,而 將使PEDOT、碳黑粒子(粒徑23nm)及乙醇以重量比2:1:16混合而成之分散液塗佈於在表面配有FTO膜之玻璃基板,於120℃進行60分鐘乾燥,藉此於導電性玻璃基板之表面形成由PEDOT及碳黑所構成之觸媒層,除此以外,以與實施例4相同之方式製作電池。 In the fabrication of the counter electrode, instead of forming the catalyst layer of PEDOT by electrolytic polymerization, A dispersion obtained by mixing PEDOT, carbon black particles (particle diameter: 23 nm) and ethanol at a weight ratio of 2:1:16 was applied to a glass substrate having an FTO film on the surface, and dried at 120 ° C for 60 minutes. A battery was fabricated in the same manner as in Example 4 except that a catalyst layer composed of PEDOT and carbon black was formed on the surface of the conductive glass substrate.

[比較例11] [Comparative Example 11]

於對向電極之製作中,除使用由ATO被覆之氧化鈦粒子(粒徑200~500nm)代替碳黑粒子以外,以與比較例10相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Comparative Example 10 except that the titanium oxide particles (particle diameter: 200 to 500 nm) coated with ATO were used instead of the carbon black particles.

[比較例12] [Comparative Example 12]

於對向電極之製作中,除不對多孔質膜進行導電性高分子之被覆以外,以與實施例4相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Example 4 except that the porous film was not coated with a conductive polymer.

[比較例13] [Comparative Example 13]

於對向電極之製作中,除不對多孔質膜進行導電性高分子之被覆以外,以與實施例7相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Example 7 except that the porous film was not coated with a conductive polymer.

[比較例14] [Comparative Example 14]

於對向電極之製作中,除不對多孔質膜進行導電性高分子之被覆以外,以與實施例10相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Example 10 except that the porous film was not coated with a conductive polymer.

對於以上實施例4~16及比較例6~14所製作之各電池,進行與實施例1相同之評價。將其結果示於表2。 The same evaluation as in Example 1 was carried out for each of the batteries produced in the above Examples 4 to 16 and Comparative Examples 6 to 14. The results are shown in Table 2.

由以上之結果可知,於多孔質膜上塗佈觸媒層之實施例之電極基板無論觸媒層之種類、多孔質膜之種類,均可獲得優異之發電效率。 From the above results, it is understood that the electrode substrate of the embodiment in which the catalyst layer is coated on the porous film can obtain excellent power generation efficiency regardless of the type of the catalyst layer and the type of the porous film.

於實施例4~6中,可知比表面積較大之電極基板之發電效率提高。 In Examples 4 to 6, it was found that the power generation efficiency of the electrode substrate having a large specific surface area was improved.

關於比較例10~11之電極基板,雖於導電性玻璃之表面塗佈有導電性高分子,但塗佈面並非多孔質構造,故而較實施例4發電效率差。 In the electrode substrates of Comparative Examples 10 to 11, the conductive polymer was applied to the surface of the conductive glass, but the coated surface was not a porous structure, and thus the power generation efficiency was inferior to that of the fourth embodiment.

將觀察實施例9之對向電極之表面之SEM圖像示於圖4A。又,將觀察於實施例9之對向電極之表面塗佈PEDOT前之多孔質膜之表面 的SEM圖像示於圖4B。若對比圖4A及圖4B,則可知於圖4A之多孔質膜之表面上,沿三維多孔質構造而塗佈PEDOT之情況。 An SEM image of the surface of the counter electrode of Example 9 is shown in Fig. 4A. Further, the surface of the counter electrode of Example 9 was coated with the surface of the porous film before PEDOT. The SEM image is shown in Figure 4B. 4A and 4B, it can be seen that PEDOT is applied along the three-dimensional porous structure on the surface of the porous film of FIG. 4A.

將觀察實施例9之對向電極之剖面的SEM圖像示於圖4C。又,將該剖面之放大圖像示於圖4D。於圖4C及圖4D中,可知在多孔質膜內,存在單一孔連結而成之連胞結構。又,於圖4D之放大圖像中,黑虛線所示之範圍表示由ATO被覆之氧化鈦之表面(邊界),白虛線所示之範圍表示由PEDOT所構成之觸媒層之表面(邊界)。黑虛線與白虛線之距離表示觸媒層之厚度。 An SEM image of a cross section of the counter electrode of Example 9 is shown in Fig. 4C. Further, an enlarged image of the cross section is shown in Fig. 4D. In FIG. 4C and FIG. 4D, it is understood that a continuous structure in which a single pore is connected is formed in the porous membrane. Further, in the enlarged image of Fig. 4D, the range indicated by the black dotted line indicates the surface (boundary) of the titanium oxide coated with ATO, and the range indicated by the white dotted line indicates the surface (boundary) of the catalyst layer composed of PEDOT. . The distance between the black dashed line and the white dashed line indicates the thickness of the catalyst layer.

將觀察實施例10之對向電極之表面的SEM圖像示於圖5A。又,將觀察於實施例10之對向電極之表面塗佈PEDOT前之多孔質膜之表面的SEM圖像示於圖5B。若對比圖5A及圖5B,則可知於圖5A之多孔質膜之表面,沿三維多孔質構造而塗佈PEDOT之情況。 An SEM image of the surface of the counter electrode of Example 10 was observed in Fig. 5A. Further, an SEM image of the surface of the porous film before the PEDOT was applied to the surface of the counter electrode of Example 10 is shown in Fig. 5B. 5A and 5B, it can be seen that PEDOT is applied along the three-dimensional porous structure on the surface of the porous film of FIG. 5A.

將觀察實施例7之對向電極之表面的SEM圖像示於圖6A。又,將觀察於實施例7之對向電極之表面塗佈PEDOT前之多孔質膜之表面的SEM圖像示於圖6B。若對比圖6A及圖6B,則可知於圖6A之多孔質膜之表面,沿三維多孔質構造而塗佈PEDOT之情況。 An SEM image of the surface of the counter electrode of Example 7 is shown in Fig. 6A. Further, an SEM image of the surface of the porous film before the PEDOT was applied to the surface of the counter electrode of Example 7 is shown in Fig. 6B. 6A and 6B, it can be seen that PEDOT is applied along the three-dimensional porous structure on the surface of the porous film of FIG. 6A.

將觀察實施例8之對向電極之表面的SEM圖像示於圖7A。又,將觀察於實施例8之對向電極之表面塗佈PEDOT前之多孔質膜之表面的SEM圖像示於圖7B。若對比圖7A及圖7B,則可知於圖7A之多孔質膜之表面,沿三維多孔質構造而塗佈PEDOT之情況。 An SEM image of the surface of the counter electrode of Example 8 is shown in Fig. 7A. Further, an SEM image of the surface of the porous film before the PEDOT was applied to the surface of the counter electrode of Example 8 is shown in Fig. 7B. 7A and 7B, it can be seen that PEDOT is applied along the three-dimensional porous structure on the surface of the porous film of FIG. 7A.

將觀察比較例6之對向電極之表面的SEM圖像示於圖8。可知由鉑所構成之膜平坦地製膜之情況。又,將觀察比較例7之對向電極 之表面的SEM圖像示於圖9。可知包含PEDOT之膜平坦地製膜之情況。又,將觀察比較例11之對向電極之表面的SEM圖像示於圖10。可知雖於包含PEDOT之膜之表面上觀察到粗糙程度,但大致為平坦地製膜之情況。可知於該等之任一比較例之對向電極,未形成具有三維之深度之膜結構。 An SEM image of the surface of the counter electrode of Comparative Example 6 is shown in Fig. 8. It can be seen that the film made of platinum is formed flat. Also, the counter electrode of Comparative Example 7 will be observed. The SEM image of the surface is shown in Fig. 9. It can be seen that the film containing PEDOT is formed into a film flat. Further, an SEM image of the surface of the counter electrode of Comparative Example 11 is shown in Fig. 10 . It is understood that although the degree of roughness is observed on the surface of the film containing PEDOT, the film is formed substantially flat. It is understood that the counter electrode of any of the comparative examples does not have a film structure having a three-dimensional depth.

[實施例17] [Example 17]

以與實施例9相同之方式製作電池。於該電池之對向電極,由被覆有ATO之氧化鈦粒子所構成之多孔質膜之膜厚為2.2μm。再者,膜厚係藉由以觸針式表面形狀測定器測定膜厚階差之方法進行測定。 A battery was fabricated in the same manner as in Example 9. The thickness of the porous film made of the ATO-coated titanium oxide particles was 2.2 μm in the counter electrode of the battery. Further, the film thickness was measured by a method of measuring the film thickness step by a stylus type surface shape measuring device.

[實施例18] [Embodiment 18]

於對向電極之製作中,除藉由增加網版印刷之次數,將所形成之多孔質膜之膜厚變更為5.6μm以外,以與實施例17(實施例9)相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Example 17 (Example 9) except that the film thickness of the formed porous film was changed to 5.6 μm by increasing the number of times of screen printing.

[實施例19] [Embodiment 19]

於對向電極之製作中,除藉由增加網版印刷之次數,將所形成之多孔質膜之膜厚變更為10.1μm以外,以與實施例17(實施例9)相同之方式製作電池。 In the production of the counter electrode, a battery was fabricated in the same manner as in Example 17 (Example 9) except that the film thickness of the formed porous film was changed to 10.1 μm by increasing the number of times of screen printing.

[比較例15] [Comparative Example 15]

以與比較例6相同之方式製作電池。於該電池之對向電極,以濺鍍法形成之鉑薄膜(鉑電極)之膜厚為20nm。再者,膜厚係利用SEM觀察鉑電極之剖面影像,從而進行估算。 A battery was fabricated in the same manner as in Comparative Example 6. The film thickness of the platinum film (platinum electrode) formed by sputtering on the counter electrode of the battery was 20 nm. Further, the film thickness was estimated by observing a cross-sectional image of the platinum electrode by SEM.

[比較例16] [Comparative Example 16]

除將鉑薄膜之膜厚變更為50nm以外,以與比較例15(比較例6)相同 之方式製作電池。 The same as Comparative Example 15 (Comparative Example 6) except that the film thickness of the platinum film was changed to 50 nm. The way to make a battery.

[比較例17] [Comparative Example 17]

除將鉑薄膜之膜厚變更為100nm以外,以與比較例15(比較例6)相同之方式製作電池。 A battery was fabricated in the same manner as in Comparative Example 15 (Comparative Example 6) except that the film thickness of the platinum film was changed to 100 nm.

[比較例18] [Comparative Example 18]

以與比較例7相同之方式製作電池。於該電池之對向電極中,以電解聚合法形成之由PEDOT所構成之膜之膜厚為20nm。再者,膜厚係利用SEM觀察PEDOT電極之剖面影像,從而進行估算。 A battery was fabricated in the same manner as in Comparative Example 7. In the counter electrode of the battery, the film thickness of the film composed of PEDOT formed by electrolytic polymerization was 20 nm. Further, the film thickness was estimated by observing the cross-sectional image of the PEDOT electrode by SEM.

[比較例19] [Comparative Example 19]

於對向電極之製作中,除藉由加長電解聚合法之聚合時間,將形成之由PEDOT所構成之膜之膜厚變更為40nm以外,以與比較例18(比較例7)相同之方式製作電池。 In the production of the counter electrode, the film thickness of the film formed of PEDOT was changed to 40 nm by the polymerization time of the electrolytic polymerization method, and was produced in the same manner as in Comparative Example 18 (Comparative Example 7). battery.

[比較例20] [Comparative Example 20]

於對向電極之製作中,除藉由加長電解聚合法之聚合時間,將形成之由PEDOT所構成之膜之膜厚變更為100nm以外,以與比較例18(比較例7)相同之方式製作電池。 In the production of the counter electrode, the film thickness of the film formed of PEDOT was changed to 100 nm by the polymerization time of the electrolytic polymerization method, and the film was produced in the same manner as in Comparative Example 18 (Comparative Example 7). battery.

[比較例21] [Comparative Example 21]

於對向電極之製作中,除藉由加長電解聚合法之聚合時間,將形成之由PEDOT所構成之膜之膜厚變更為200nm以外,以與比較例18(比較例7)相同之方式製作電池。 In the production of the counter electrode, the film thickness of the film formed of PEDOT was changed to 200 nm by the polymerization time of the electrolytic polymerization method, and the film was produced in the same manner as in Comparative Example 18 (Comparative Example 7). battery.

對於以上實施例17~19及比較例15~21所製作之各電池,進行與實施例1相同之評價。將其結果示於表3。 The same evaluation as in Example 1 was carried out for each of the batteries produced in the above Examples 17 to 19 and Comparative Examples 15 to 21. The results are shown in Table 3.

由上述表之實施例17~19之結果可知,對向電極之觸媒層之厚度(膜厚)越增加,電池之發電效率越提高。作為其理由,可考慮實施例之觸媒層具有沿多孔質構造而三維連結之構造,故而隨著膜厚之增加,觸媒反應面積增加。 From the results of Examples 17 to 19 of the above table, it is understood that as the thickness (film thickness) of the catalyst layer of the counter electrode increases, the power generation efficiency of the battery increases. For this reason, it is conceivable that the catalyst layer of the embodiment has a structure in which the porous structure is three-dimensionally connected. Therefore, as the film thickness increases, the catalyst reaction area increases.

另一方面,使用鉑薄膜作為對向電極之比較例15~17之電池之情形,即便增加鉑電極之膜厚,發電效率亦幾乎無變化。於此方面,將於導電性玻璃基板之表面直接形成之由PEDOT所構成之膜設為對向電極之比較例18~21之電池之情形亦相同。其發電效率不發生變化之原因在於即便增加比較例之對向電極之膜厚,觸媒反應面積亦不增加。再者,於將PEDOT設為200nm左右之膜厚之比較例21的電池中,由於膜之強度不足會使膜剝離。 On the other hand, in the case of using the platinum film as the counter electrode of Comparative Examples 15 to 17, even if the film thickness of the platinum electrode was increased, the power generation efficiency hardly changed. On the other hand, in the case of the batteries of Comparative Examples 18 to 21 in which the film made of PEDOT formed directly on the surface of the conductive glass substrate was used as the counter electrode, the same was also the case. The reason why the power generation efficiency does not change is that the catalyst reaction area does not increase even if the film thickness of the counter electrode of the comparative example is increased. Further, in the battery of Comparative Example 21 in which PEDOT was set to a film thickness of about 200 nm, the film was peeled off due to insufficient strength of the film.

以上所說明之各實施形態中之各構成及該等之組合等為一 例,可於不脫離本發明之主旨之範圍內,進行構成之附加、省略、置換、及其他變更。又,本發明並非受各實施形態之限定,僅受申請專利範圍(claim)限定。 Each of the above-described embodiments and combinations thereof are one In addition, the additions, omissions, substitutions, and other changes may be made without departing from the scope of the invention. Further, the present invention is not limited by the embodiments, but is limited only by the claimed patent.

[產業上之可利用性] [Industrial availability]

本發明之電極基板及使用該電極基板之染料敏化太陽電池可廣泛應用於太陽電池之領域。 The electrode substrate of the present invention and the dye-sensitized solar cell using the same can be widely used in the field of solar cells.

Claims (13)

一種電極基板,係具有導電性基板、製膜於上述導電性基板上之多孔質膜、及塗佈於上述多孔質膜之觸媒層。 An electrode substrate comprising a conductive substrate, a porous film formed on the conductive substrate, and a catalyst layer applied to the porous film. 如申請專利範圍第1項之電極基板,其中,沿上述多孔質膜之三維結構塗佈有上述觸媒層。 The electrode substrate according to claim 1, wherein the catalyst layer is applied along a three-dimensional structure of the porous film. 如申請專利範圍第1或2項之電極基板,其中,於塗佈有上述觸媒層之多孔質膜含有複數個單一孔連結而成之連胞結構。 The electrode substrate according to claim 1 or 2, wherein the porous film coated with the catalyst layer contains a plurality of single pores connected to each other. 如申請專利範圍第3項之電極基板,其中,於塗佈有上述觸媒層之多孔質膜,上述連胞結構之個數大於上述單一孔之個數。 The electrode substrate of claim 3, wherein the number of the unitary structures is larger than the number of the single holes in the porous film coated with the catalyst layer. 如申請專利範圍第1或2項之電極基板,其中,上述多孔質膜係由金屬或金屬化合物所構成。 The electrode substrate according to claim 1 or 2, wherein the porous film is made of a metal or a metal compound. 如申請專利範圍第1或2項之電極基板,其中,上述多孔質膜係由碳材料所構成。 The electrode substrate according to claim 1 or 2, wherein the porous film is made of a carbon material. 如申請專利範圍第1或2項之電極基板,其中,上述觸媒層係由導電性高分子所構成。 The electrode substrate according to claim 1 or 2, wherein the catalyst layer is made of a conductive polymer. 如申請專利範圍第7項之電極基板,其中,上述導電性高分子為如下之通式(1)所示之噻吩化合物之聚合物; 〔式中,R1及R2為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、或磺醯基;當R1及 R2為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環〕。 The electrode substrate according to claim 7, wherein the conductive polymer is a polymer of a thiophene compound represented by the following formula (1); Wherein R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group; when R 1 and R 2 are the above alkyl group or alkoxy group, the above alkyl group Or the carbon atoms at the terminal of the alkoxy group may be bonded to each other to form a ring]. 如申請專利範圍第7項之電極基板,其中,上述導電性高分子為如下之通式(2)所示之吡咯化合物之聚合物; 〔式中,R3及R4為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、或磺醯基;當R3及R4為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環〕。 The electrode substrate according to claim 7, wherein the conductive polymer is a polymer of a pyrrole compound represented by the following formula (2); Wherein R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; a group, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group; when R 3 and R 4 are the above alkyl group or alkoxy group, the above alkyl group Or the carbon atoms at the terminal of the alkoxy group may be bonded to each other to form a ring]. 如申請專利範圍第7項之電極基板,其中,上述導電性高分子為如下之通式(3)所示之苯胺化合物之聚合物; 〔式中,R5~R8為分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數1~4之烷氧基、碳原子數6或8之芳基、羧基、酯基、醛基、羥基、鹵原子、氰基、胺基、硝基、偶氮基、磺基、或磺醯基;當R5及R6、或R7及R8為上述烷基或烷氧基時,上述烷基或烷氧基末端之碳原子彼此亦可鍵結而形成環〕。 The electrode substrate of the seventh aspect of the invention, wherein the conductive polymer is a polymer of an aniline compound represented by the following formula (3); Wherein R 5 to R 8 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group having 6 or 8 carbon atoms, a carboxyl group or an ester; a base, an aldehyde group, a hydroxyl group, a halogen atom, a cyano group, an amine group, a nitro group, an azo group, a sulfo group, or a sulfonyl group; when R 5 and R 6 or R 7 and R 8 are the above alkyl group or alkane In the case of an oxy group, the carbon atoms at the terminal of the above alkyl group or alkoxy group may be bonded to each other to form a ring]. 如申請專利範圍第1或2項之電極基板,其中,上述導電性基板之表面與上述多孔質膜接觸。 The electrode substrate according to claim 1 or 2, wherein the surface of the conductive substrate is in contact with the porous film. 如申請專利範圍第7項之電極基板,其中,上述導電性高分子係經由使用上述多孔質膜作為作用極之電解聚合法而塗佈於上述多孔質膜。 The electrode substrate of the seventh aspect of the invention, wherein the conductive polymer is applied to the porous film via an electrolytic polymerization method using the porous film as a working electrode. 一種染料敏化太陽電池,係具備由申請專利範圍第1或2項之電極基板所構成之對向電極、吸附染料之光電極、及電解液。 A dye-sensitized solar cell comprising a counter electrode comprising an electrode substrate according to claim 1 or 2, a photoelectrode for adsorbing a dye, and an electrolyte.
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