TW201422645A - Styryl-based compound, coloring agent comprising styryl-based compound, photoresist resin composition comprising coloring agent, photosensitive material manufactured by using the photoresist resin composition, color filter comprising the same and display - Google Patents

Styryl-based compound, coloring agent comprising styryl-based compound, photoresist resin composition comprising coloring agent, photosensitive material manufactured by using the photoresist resin composition, color filter comprising the same and display Download PDF

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TW201422645A
TW201422645A TW102131255A TW102131255A TW201422645A TW 201422645 A TW201422645 A TW 201422645A TW 102131255 A TW102131255 A TW 102131255A TW 102131255 A TW102131255 A TW 102131255A TW 201422645 A TW201422645 A TW 201422645A
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substituted
unsubstituted
carbon atoms
resin composition
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Jon-Gho Park
Han-Soo Kim
Sung-Hyun Kim
Chan-Gho Cho
Sun-Hwa Kim
Jang-Hyun Ryu
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Lg Chemical Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/01Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/34Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by unsaturated carbon chains
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/01Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/42Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being further bound to other hetero atoms
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C09B23/005Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being a COOH and/or a functional derivative thereof
    • C09B23/0058Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being a COOH and/or a functional derivative thereof the substituent being CN
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/10The polymethine chain containing an even number of >CH- groups
    • C09B23/105The polymethine chain containing an even number of >CH- groups two >CH- groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/14Styryl dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • C09B57/008Triarylamine dyes containing no other chromophores
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0041Photosensitive materials providing an etching agent upon exposure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present disclosure relates to a styryl-based compound, a coloring agent comprising the styryl-based compound, a photosensitive resin composition comprising the coloring agent, a photosensitive material manufactured by using the photosensitive resin composition, a color filter comprising the same and a display device having the color filter.

Description

苯乙烯系化合物、包含苯乙烯系化合物之著色劑、包含著色劑之光阻樹脂組成物、使用該光阻樹脂組成物所製備之光敏材料、包含其之彩色濾光片及具有該彩色濾光片之顯示 裝置 a styrene-based compound, a coloring agent containing a styrene-based compound, a photoresist resin composition containing a coloring agent, a photosensitive material prepared using the photoresist resin composition, a color filter containing the same, and having the color filter Slice display Device

本發明係關於一種苯乙烯系化合物,一包括苯乙烯系化合物之著色劑,一包括著色劑之光阻樹脂組合物,使用該光阻樹脂組合物所製備之光敏材料,包括其之彩色濾光片及一具有彩色濾光片之顯示裝置。 The present invention relates to a styrenic compound, a coloring agent comprising a styrenic compound, a photoresist resin composition comprising a coloring agent, a photosensitive material prepared using the photoresist resin composition, including color filtering thereof A sheet and a display device having a color filter.

本發明所揭示之請求項於2012年8月31日向韓國智慧財產局主張優先權,韓國專利申請號為10-2012-0096343,其中全部內容在此作為參考。此外,本發明所揭示之請求項於2013年1月2日向韓國智慧財產局主張優先權,韓國專利申請號為10-2013-0000370,其中全部內容在此作為參考。 The claims disclosed in the present invention claim priority from the Korean Intellectual Property Office on August 31, 2012, and the Korean Patent Application No. 10-2012-0096343, the entire contents of which is hereby incorporated by reference. In addition, the claims disclosed in the present invention claim priority from the Korean Intellectual Property Office on January 2, 2013, and the Korean Patent Application No. 10-2013-0000370, the entire contents of which is hereby incorporated by reference.

近來,液晶顯示器(LCD)、自發光的LED或OLED裝置的光源已被廣泛地使用來代替目前之CCFL,其不是藉由驅動器也不是經由液晶而發光。一般而言,當使用一LED或OLED作為光源,因LED或OLED本身發出紅色、綠色、或藍色的光而不需要使用一彩色濾光片。 Recently, light sources of liquid crystal displays (LCDs), self-illuminating LEDs, or OLED devices have been widely used in place of current CCFLs, which do not emit light by a driver or via liquid crystal. In general, when an LED or OLED is used as the light source, it is not necessary to use a color filter because the LED or the OLED itself emits red, green, or blue light.

然而,彩色濾光片通常藉由改善LED或OLED的光源所發射光之色純度來實現高度色再現範圍。特別是,使用OLED光源所產生之白光必須以彩色濾光片來分離該顏色。 However, color filters typically achieve a high color reproduction range by improving the color purity of the light emitted by the light source of the LED or OLED. In particular, white light generated using an OLED source must be separated by a color filter.

僅有適當地組合從一光源所發射之光譜及一彩色濾光片之吸收光譜及透射光譜達到改善發光色純度、光再現性及亮度。 Only the spectrum emitted from a light source and the absorption and transmission spectra of a color filter are appropriately combined to achieve improved luminescent color purity, light reproducibility, and brightness.

[先前技術文獻] [Previous Technical Literature]

韓國專利申請公開號2001-0018075。 Korean Patent Application Publication No. 2001-0018075.

本發明係關於一種苯乙烯系化合物,一包括苯乙烯系化合物之著色劑,一包括著色劑之光阻樹脂組合物,使用該光阻樹脂組合物所製備之光敏材料,包括其之彩色濾光片及一具有彩色濾光片之顯示裝置。 The present invention relates to a styrenic compound, a coloring agent comprising a styrenic compound, a photoresist resin composition comprising a coloring agent, a photosensitive material prepared using the photoresist resin composition, including color filtering thereof A sheet and a display device having a color filter.

本發明之實施例係提供由以下化學式1所表示之苯乙烯系化合物。 The embodiment of the present invention provides a styrene-based compound represented by the following Chemical Formula 1.

其中,n為1至3的整數,m為1至4的整數,X為NR或O,R係選自由下:氫、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、及具有2至25個碳原子之經取代或未經取代的烯基所組成之群組;L1為直接鍵合、或具有1至10個碳原子之經取代或未經取代的亞烷基;R1及R2為彼此相同或不同,且各自獨立地為氫、含有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、具有7至50個碳原子之經取代或未經取代的芳烷基、具有6至40個碳原子之經取代或未經取代的芳基、取代或未取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、或包括一個或多個N、 O及S原子之經取代或未經取代的雜環基;R3為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、或具有1至25個碳原子之經取代或未經取代的烷氧基;R4為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、經取代或未經取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、包括一個或多個N、O和S原子之經取代或未經取代的雜環基;R5為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、具有3至40個碳原子之經取代或未經取代的丙烯醯基團、經取代或未經取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、經取代或未經取代的丙烯酸酯基團、含有1至40個碳原子之經取代或未經取代的羰基、或包括一個或多個N、O及S原子之經取代或未經取代的雜環基。 Wherein n is an integer of 1 to 3, m is an integer of 1 to 4, X is NR or O, and R is selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, and a substituted or 2 to 25 carbon atom or a group consisting of unsubstituted alkenyl groups; L1 is a directly bonded or substituted or unsubstituted alkylene group having 1 to 10 carbon atoms; R1 and R2 are the same or different from each other, and are each independently Is hydrogen, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and having 1 to 25 carbon atoms. a substituted or unsubstituted alkoxy group, a substituted or unsubstituted alkenyl group having 2 to 25 carbon atoms, a substituted or unsubstituted aralkyl group having 7 to 50 carbon atoms, having 6 to a substituted or unsubstituted aryl group of 40 carbon atoms, a substituted or unsubstituted fluorenyl group, a substituted or unsubstituted carbazolyl group, or One or more N, a substituted or unsubstituted heterocyclic group of O and S atoms; R3 is hydrogen, deuterium, halo, nitrile, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 25 carbon atoms a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms or a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms; R 4 is hydrogen, hydrazine, halogen, nitrile a nitro group, a hydroxy group, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, having 1 to 25 carbons a substituted or unsubstituted alkoxy group of an atom, a substituted or unsubstituted alkenyl group having 2 to 25 carbon atoms, a substituted or unsubstituted aryl group having 6 to 40 carbon atoms, a substituted or unsubstituted fluorenyl group, a substituted or unsubstituted carbazolyl group, a substituted or unsubstituted heterocyclic group including one or more N, O and S atoms; R5 is hydrogen , hydrazine, halogen, nitrile, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 25 carbon atoms, having 3 to 20 carbon atoms a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 25 carbon atoms, containing 6 a substituted or unsubstituted aryl group of up to 40 carbon atoms, a substituted or unsubstituted propylene oxime group having 3 to 40 carbon atoms, a substituted or unsubstituted fluorenyl group, a substituted or unsubstituted carbazolyl group, a substituted or unsubstituted acrylate group, a substituted or unsubstituted carbonyl group having 1 to 40 carbon atoms, or one or more N, O and A substituted or unsubstituted heterocyclic group of the S atom.

本發明之實施例係提供一種著色劑,其係包括苯乙烯系化合物。 Embodiments of the present invention provide a color former comprising a styrenic compound.

本發明之實施例係提供一種光阻樹脂組合物,其係包括著色劑。 Embodiments of the present invention provide a photoresist resin composition comprising a colorant.

本發明之實施例係提供使用該光阻樹脂組合物所製造之光敏材料。 Embodiments of the present invention provide a photosensitive material produced using the photoresist resin composition.

本發明之實施例係提供一種彩色濾光片,其係包括光敏材料。 Embodiments of the present invention provide a color filter that includes a photosensitive material.

本發明之實施例係提供一種具有彩色濾光器的顯示裝置。 Embodiments of the present invention provide a display device having a color filter.

根據本發明之實施例,其係提供一種著色劑具有優異的耐熱性及/或在有機溶劑中具有優異的溶解度。 According to an embodiment of the present invention, it is provided that the coloring agent has excellent heat resistance and/or has excellent solubility in an organic solvent.

根據本發明之實施例,光阻樹脂組合物可得到適合用於光源之吸收或透射光譜,且該結果可以得到較高的色再現範圍、高亮度、高對比度範圍等。 According to an embodiment of the present invention, the photoresist resin composition can be obtained as an absorption or transmission spectrum suitable for a light source, and the result can be obtained with a higher color reproduction range, high luminance, high contrast range, and the like.

根據本發明之實施例的光阻樹脂組合物具有交聯程度高、優異的耐熱性。因此,根據本發明之實施例,當通過加熱處理時光阻樹脂組合物的色彩稍有變化。 The photoresist resin composition according to the embodiment of the present invention has a high degree of crosslinking and excellent heat resistance. Therefore, according to an embodiment of the present invention, the color of the resist resin composition is slightly changed when it is treated by heat.

圖1為化學式1-1、1-3、1-5及1-7的吸收光譜。 Figure 1 shows the absorption spectra of Chemical Formulas 1-1, 1-3, 1-5, and 1-7.

圖2為化學式1-1、1-3及1-7的透射光譜。 2 is a transmission spectrum of Chemical Formulas 1-1, 1-3, and 1-7.

圖3為實施例3及比較例1的透射光譜。 3 is a transmission spectrum of Example 3 and Comparative Example 1.

圖4為實施例3及比較例1的透射光譜放大 圖。 4 is a transmission spectrum amplification of Example 3 and Comparative Example 1. Figure.

圖5為實施例4及比較例2的透射光譜。 5 is a transmission spectrum of Example 4 and Comparative Example 2.

以下更詳細地說明本發明之內容。 The contents of the present invention are explained in more detail below.

本發明係提供化學式1所表示之苯乙烯系化合物。 The present invention provides a styrene-based compound represented by Chemical Formula 1.

本發明之實施例中,由化學式1所表示之苯乙烯系化合物係由以下化學式2所表示。 In the examples of the present invention, the styrene-based compound represented by Chemical Formula 1 is represented by the following Chemical Formula 2.

其中,n、M、R1至R4、X、及L1與上述定義相同,R6為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、經取代或未經取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、包括一個或多個N、O及S原子之經取代或未經取代的雜環基。 Wherein n, M, R1 to R4, X, and L1 are the same as defined above, and R6 is hydrogen, deuterium, halogen, nitrile, nitro, hydroxy, substituted or unsubstituted having 1 to 25 carbon atoms. Alkyl group, substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, having 2 to 25 carbon atoms Substituted or unsubstituted alkenyl group, substituted or unsubstituted aryl group having 6 to 40 carbon atoms, substituted or unsubstituted fluorenyl group, substituted or unsubstituted carbazole A substituted or unsubstituted heterocyclic group comprising one or more N, O and S atoms.

本發明之實施例,R1及R2為彼此相同或不同,且各自獨立地為具有1至25個碳原子之經取代或未經取代的烷基、含有6至40個碳原子之經取代或未經取代的芳基、或具有7至50個碳原子之經取代或未經取代的芳烷基。 In an embodiment of the present invention, R1 and R2 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or not containing 6 to 40 carbon atoms. Substituted aryl, or substituted or unsubstituted aralkyl having 7 to 50 carbon atoms.

本發明之之實施例中,R1及R2為彼此相同或不同,且各自獨立地為具有6至40個碳原子之經取代或未經取代的芳基、或具有7至50個碳原子之經取代或未經取代的芳烷基。 In an embodiment of the present invention, R1 and R2 are the same or different from each other, and each independently is a substituted or unsubstituted aryl group having 6 to 40 carbon atoms, or a group having 7 to 50 carbon atoms. Substituted or unsubstituted aralkyl.

本發明中,當R1及R2為胺取代基,具有6至40個碳原子之經取代或未經取代的芳基,或具有7至50個碳原子之經取代或未經取代的芳烷基,包括此具有高分子量之苯乙烯系化合物因而具有優異的耐熱性。 In the present invention, when R1 and R2 are an amine substituent, a substituted or unsubstituted aryl group having 6 to 40 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 50 carbon atoms. This styrene-based compound having a high molecular weight and thus has excellent heat resistance.

本發明之實施例,R4為腈基、含有6至40個碳原子之經取代或經未取代的烷基,該烷基由一個或多個取代基所未取代或取代,該烷基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基所未取代或取代者,或包括一個或多個N、O及S原子之雜環基,該雜環基由一個或多個取代基所未取代或取代,該雜環基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基。 In an embodiment of the invention, R4 is a nitrile group, a substituted or unsubstituted alkyl group having 6 to 40 carbon atoms, the alkyl group being unsubstituted or substituted by one or more substituents selected from the group consisting of Free group of the following: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group, alkylamine group, carbazolyl, fluorenyl Group), a nitrile group, and a heterocyclic group including one or more N, O and S atoms, which are unsubstituted or substituted, or a heterocyclic group including one or more N, O and S atoms, the heterocyclic group Unsubstituted or substituted by one or more substituents selected from the group consisting of halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group And an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic group including one or more N, O and S atoms.

本發明之實施例,L1為具有1至10個碳原子之直鏈或支鏈亞烷基,該亞烷基由一個或多個取代基所未取代或取代者,該取代基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、丙烯醯基、丙烯酸酯基、腈基、及包括一個或多個N、O及S原子之雜環基。 In an embodiment of the invention, L1 is a linear or branched alkylene group having from 1 to 10 carbon atoms which is unsubstituted or substituted by one or more substituents selected from the group consisting of Group consisting of: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group, alkylamine group, carbazolyl, fluorenyl group An acryloyl group, an acrylate group, a nitrile group, and a heterocyclic group including one or more N, O and S atoms.

本發明之實施例,R5為氫、氫、由一個或多個取代基所未取代或取代之丙烯酸酯基,該取代基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基、由一個或多個取代基所未取代或取代之羰基,該取代基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子的雜環基、或由一個或多個未取代或取代之丙烯醯基,該取代基係選自由下列所組成之群組:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基。 In an embodiment of the invention, R5 is hydrogen, hydrogen, acrylate group unsubstituted or substituted by one or more substituents selected from the group consisting of halo, alkyl, alkenyl , cycloalkyl, aryl, arylamine group, alkylamine group, carbazolyl, fluorenyl group, nitrile group, and including one or more N, O and a heterocyclic group of the S atom, a carbonyl group unsubstituted or substituted by one or more substituents selected from the group consisting of halo, alkyl, alkenyl, cycloalkyl, aryl , an arylamine group, an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic group including one or more N, O and S atoms, Or from one or more unsubstituted or substituted acryloyl groups, the substituents being selected from the group consisting of halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine Group), an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and one or more N, O and a heterocyclic group of the S atom.

取代基的實施例描述如下,但不僅限於此。 Examples of the substituent are described below, but are not limited thereto.

本發明之中「取代或未取代」一詞係指由一個 或多個取代基所取代,該取代基係選自由下列所組成之群組:氘、鹵素、烷基、烯基、烷氧基、環烷基、甲矽烷基、芳基烯基、芳基、芳氧基、烷硫基、烷基硫磺基、芳基硫磺基、硼基、烷基胺基(alkylamine group)、芳烷基胺基(aralkylamine group)、芳基胺基(arylamine group)、雜芳基、咔唑基、丙烯醯基、丙烯酸酯基、醚基、茀基(fluorenyl group)、腈基、硝基、羥基、氰基、及包括一個或一個以上之N、O、S或P原子、或不具有取代基之氰基或雜環基。 The term "substituted or unsubstituted" in the present invention means Substituted by a plurality of substituents selected from the group consisting of hydrazine, halogen, alkyl, alkenyl, alkoxy, cycloalkyl, germyl, arylalkenyl, aryl , aryloxy, alkylthio, alkylthio, arylsulfonyl, boron, alkylamine group, aralkylamine group, arylamine group, Heteroaryl, carbazolyl, acryloyl, acrylate, ether, fluorenyl group, nitrile, nitro, hydroxy, cyano, and including one or more N, O, S or A P atom or a cyano group or a heterocyclic group having no substituent.

本發明中,烷基為直鏈或支鏈,且雖然沒有特別限制,碳原子數1至25個為佳。如甲基、乙基、丙基、異丙基、丁基、第三丁基、戊基、己基、庚基等,但不限於此。 In the present invention, the alkyl group is a straight chain or a branched chain, and although not particularly limited, a carbon number of from 1 to 25 is preferred. For example, methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, hexyl, heptyl, and the like, but are not limited thereto.

本發明中,烯基為直鏈或支鏈,且雖然沒有特別限制,碳原子數2至25個為佳。較佳例為烯基,該烯基中之芳基係由苯乙烯卞(stylbenyl)基、苯乙烯基、或類似基團所取代,但不限於此。 In the present invention, the alkenyl group is a straight chain or a branched chain, and although not particularly limited, a carbon number of 2 to 25 is preferred. A preferred example is an alkenyl group in which the aryl group is substituted by a stylbenyl group, a styryl group, or the like, but is not limited thereto.

本發明中,烷氧基為直鏈或支鏈,且雖然沒有特別限制,碳原子數1至25個為佳。 In the present invention, the alkoxy group is a straight chain or a branched chain, and although not particularly limited, a carbon number of from 1 to 25 is preferred.

本發明中,環烷基沒有特別限定,但是,碳原子數3至20個為佳,尤其是環戊基或環己基為佳。 In the present invention, the cycloalkyl group is not particularly limited, but preferably has 3 to 20 carbon atoms, particularly preferably a cyclopentyl group or a cyclohexyl group.

本發明之中丙烯醯基沒有特別限定,但是,碳原子數3至40為佳,尤其是丙烯酸甲酯、丙烯酸乙酯、丙烯酸甲酯、3-(丙烯醯基氧基)丙基甲基丙烯酸酯、或其類似物,但不限於此。 The propylene fluorenyl group in the invention is not particularly limited, but preferably has 3 to 40 carbon atoms, particularly methyl acrylate, ethyl acrylate, methyl acrylate, 3-(acrylenyloxy) propyl methacrylate. An ester, or an analog thereof, but is not limited thereto.

本發明之中,鹵素基包括氟、氯、溴或碘。 In the present invention, the halogen group includes fluorine, chlorine, bromine or iodine.

本發明之中,茀基(fluorenyl group)是兩個環狀 有機化合物經由一個原子所連結之結構,例如包括 、或其類似物。 In the present invention, a fluorenyl group is a structure in which two cyclic organic compounds are linked via one atom, for example, including Or its analogues.

本發明之中,茀基(fluorenyl group)包括一個開環茀基(fluorenyl group)的結構,並且本發明之開環茀基(fluorenyl group)是一種破壞一個環狀化合物之鍵結藉由一 個原子連接兩個環狀化合物之結構,如或其類似物。 In the present invention, the fluorenyl group includes a structure of a fluorenyl group, and the fluorenyl group of the present invention is a bond which destroys a cyclic compound by one atom. a structure that connects two cyclic compounds, such as Or an analogue thereof.

本發明之中,芳烷基為特別具有在芳基部分6至49個碳原子、及在烷基部分有1至44個碳原子。具體的例子包括苯甲基、對-甲基苯甲基、間-甲基苯甲基、對-乙基苯甲基、間-乙基苯甲基、3,5-二甲基苯甲基、α-甲基苯甲基、α,α-二甲基苯甲基、α,α-甲基苯基苯甲基、1-萘基苯甲基、2-萘基苯甲基、對-氟苯甲基、3,5-二氟苯甲基、α,α-二三氟基甲基苯甲基、對甲氧基苯甲基、間甲氧基苯甲基、α-苯氧基苯甲基、α-芐氧基苯甲基氨基、萘甲基、萘乙基、萘基異丙基、吡咯基甲基、吡咯基乙基、氨基苯甲基、硝基苯甲基、氰基苯甲基、1-羥基-2-苯基異丙基、 1-氯-2-苯基異丙基等,但不限於此。 In the present invention, the aralkyl group particularly has 6 to 49 carbon atoms in the aryl moiety and 1 to 44 carbon atoms in the alkyl moiety. Specific examples include benzyl, p-methylbenzyl, m-methylbenzyl, p-ethylbenzyl, m-ethylbenzyl, 3,5-dimethylbenzyl. , α-methylbenzyl, α,α-dimethylbenzyl, α,α-methylphenylbenzyl, 1-naphthylbenzyl, 2-naphthylbenzyl, p- Fluorobenzyl, 3,5-difluorobenzyl, α,α-ditrifluoromethylbenzyl, p-methoxybenzyl, m-methoxybenzyl, α-phenoxy Benzyl, α-benzyloxybenzylamino, naphthylmethyl, naphthylethyl, naphthylisopropyl, pyrrolylmethyl, pyrrolylethyl, aminobenzyl, nitrobenzyl, cyanide Benzomethyl, 1-hydroxy-2-phenylisopropyl, 1-chloro-2-phenylisopropyl, etc., but is not limited thereto.

本發明之中,芳基可為單環芳基或稠環芳基。 In the present invention, the aryl group may be a monocyclic aryl group or a fused ring aryl group.

當芳基為單環的芳基時,碳原子數沒有特別限定,碳原子數6至40個為佳。具體而言,該單環芳基如苯基、聯苯基、三聯苯基等,但並不限於此。 When the aryl group is a monocyclic aryl group, the number of carbon atoms is not particularly limited, and a carbon number of 6 to 40 is preferred. Specifically, the monocyclic aryl group is, for example, a phenyl group, a biphenyl group, a terphenyl group, or the like, but is not limited thereto.

當芳基是多環芳基,碳原子數沒有特別限定,但碳原子數10至40個為佳。具體而言,多環芳基如萘基、蒽基、菲基、芘基、苝基、crycenyl基、茀基(fluorenyl group)等,但不限於此。 When the aryl group is a polycyclic aryl group, the number of carbon atoms is not particularly limited, but a carbon number of 10 to 40 is preferred. Specifically, the polycyclic aryl group is, for example, a naphthyl group, an anthracenyl group, a phenanthryl group, an anthracenyl group, a fluorenyl group, a cryenyl group, a fluorenyl group, or the like, but is not limited thereto.

本發明之中,雜環基是包括O、N或S作為雜原子的雜環基,且雖然沒有特別限制,碳原子數2至40個為佳。雜環基的實例如噻吩基、呋喃基、吡咯基、咪唑基、噻唑基、噁唑基、惡二唑基、三唑基、吡啶基、聯吡啶基、三嗪基、acridyl基、噠嗪基、喹啉基、異喹啉基、吲哚基、咔唑基、苯並噁唑基、苯並咪唑基、苯並噻唑基、苯並咔唑基、苯並噻吩基、二苯並噻吩基、苯並呋喃基、二苯並呋喃基等,但不限於此。 In the present invention, the heterocyclic group is a heterocyclic group including O, N or S as a hetero atom, and although not particularly limited, a carbon number of 2 to 40 is preferred. Examples of heterocyclic groups such as thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, triazolyl, pyridyl, bipyridyl, triazinyl, acridyl, pyridazine , quinolyl, isoquinolyl, fluorenyl, oxazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzoxazolyl, benzothienyl, dibenzothiophene The group is a benzofuranyl group, a dibenzofuranyl group or the like, but is not limited thereto.

本發明之中之亞烷基為具有兩個結合點之烷烴。該亞烷基可為直鏈、支鏈、或有一個環鏈。該亞烷基中碳原子的數目沒有特別限定,但碳原子數1至6個為佳。 The alkylene group in the present invention is an alkane having two bonding points. The alkylene group may be linear, branched, or have a cyclic chain. The number of carbon atoms in the alkylene group is not particularly limited, but preferably 1 to 6 carbon atoms are preferred.

本發明之實施例,n為1。 In an embodiment of the invention, n is one.

本發明之實施例,化學式X為O。 In an embodiment of the invention, the chemical formula X is O.

本發明之實施例,R1及R2為彼此相同或不同,且各自獨立地為具有1至25個碳原子之經取代或未經取代的烷基、含有6至40個碳原子之經取代或未經取代的芳基、或具有7至50個碳原子之經取代或未經取代的芳烷基。 In an embodiment of the present invention, R1 and R2 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or not containing 6 to 40 carbon atoms. Substituted aryl, or substituted or unsubstituted aralkyl having 7 to 50 carbon atoms.

本發明之實施例,R1為具有1至25個碳原子之經取代或未經取代的烷基。 In an embodiment of the invention, R1 is a substituted or unsubstituted alkyl group having from 1 to 25 carbon atoms.

本發明之實施例,R1為經取代或未經取代的甲基。 In an embodiment of the invention, R1 is substituted or unsubstituted methyl.

本發明之實施例中R1為甲基。 In the examples of the present invention, R1 is a methyl group.

本發明之實施例中,R1為經取代或未經取代的乙基。 In an embodiment of the invention, R1 is substituted or unsubstituted ethyl.

本發明之實施例中,R1為乙基。 In an embodiment of the invention, R1 is ethyl.

本發明之實施例中,R1為具有6至40個碳原子之經取代或未經取代的芳基。 In an embodiment of the invention, R1 is a substituted or unsubstituted aryl group having 6 to 40 carbon atoms.

本發明之實施例中,R1為經取代或未經取代的苯基。 In an embodiment of the invention, R1 is substituted or unsubstituted phenyl.

本發明之實施例中,R1為苯基。 In an embodiment of the invention, R1 is phenyl.

本發明之實施例中,R1為具有7至50個碳原子之經取代或未經取代的芳烷基。 In an embodiment of the invention, R1 is a substituted or unsubstituted aralkyl group having from 7 to 50 carbon atoms.

本發明之實施例中,R1為經取代或未經取代的苯甲基。 In an embodiment of the invention, R1 is substituted or unsubstituted benzyl.

本發明之實施例中,R1為苯甲基。 In an embodiment of the invention, R1 is benzyl.

本發明之實施例中,R2為具有1至25個碳原子之經取代或未經取代的烷基。 In an embodiment of the invention, R2 is a substituted or unsubstituted alkyl group having from 1 to 25 carbon atoms.

本發明之實施例中,R2為經取代或未經取代的甲基。 In an embodiment of the invention, R2 is a substituted or unsubstituted methyl group.

本發明之實施例中R2為甲基。 In the embodiment of the invention, R2 is a methyl group.

本發明之實施例中,R2為經取代或未經取代的乙基。 In an embodiment of the invention, R2 is substituted or unsubstituted ethyl.

本發明之實施例,R2為乙基。 In an embodiment of the invention, R2 is ethyl.

本發明之實施例中,R2為具有6至40個碳原子之經取代或未經取代的芳基。 In an embodiment of the invention, R2 is a substituted or unsubstituted aryl group having 6 to 40 carbon atoms.

本發明之實施例中,R2為經取代或未經取代的苯基。 In an embodiment of the invention, R2 is substituted or unsubstituted phenyl.

本發明之實施例中,R2為苯基。 In an embodiment of the invention, R2 is phenyl.

本發明之實施例中,R2為具有7至50個碳原子之經取代或未經取代的芳烷基。 In an embodiment of the invention, R2 is a substituted or unsubstituted aralkyl group having from 7 to 50 carbon atoms.

本發明之實施例中,R2為經取代或未經取代的苯甲基。 In an embodiment of the invention, R2 is substituted or unsubstituted benzyl.

本發明之實施例中,R2為苯甲基。 In an embodiment of the invention, R2 is benzyl.

本發明之實施例中,L1為具有1至10個碳原子之經取代或未經取代的亞烷基。 In an embodiment of the invention, L1 is a substituted or unsubstituted alkylene group having from 1 to 10 carbon atoms.

另一個實施例中,L1為直鏈或支鏈的亞乙基。 In another embodiment, L1 is a linear or branched ethylene group.

本發明之實施例中,L1為經取代或未經取代 的直鏈或支鏈的丙烯基。 In an embodiment of the invention, L1 is substituted or unsubstituted Linear or branched propylene group.

本發明之實施例中,L1為經取代或未經取代的支鍊的丙烯基。 In an embodiment of the invention, L1 is a substituted or unsubstituted branched propylene group.

另一個實施例中,L1為一個丙烯酸酯基所取代的支鏈丙烯基。 In another embodiment, L1 is a branched propylene group substituted with an acrylate group.

本發明之實施例中,L1為(甲基)丙烯酸酯所取代基之亞異丙基。 In an embodiment of the invention, L1 is an isopropylidene group substituted with a (meth) acrylate.

本發明之實施例中,化學式1之R3為氫。 In an embodiment of the present invention, R3 of Chemical Formula 1 is hydrogen.

本發明之實施例中,化學式1中之R4為腈基。 In the examples of the present invention, R4 in Chemical Formula 1 is a nitrile group.

本發明之實施例中,化學式1之R5為取代或未取代的羰基。 In the examples of the present invention, R5 of Chemical Formula 1 is a substituted or unsubstituted carbonyl group.

本發明之實施例中,化學式1之R5為經取代或未經取代的丙烯醯基。 In an embodiment of the present invention, R5 of Chemical Formula 1 is a substituted or unsubstituted acrylonitrile group.

本發明之實施例中,化學式1之R5由烷基所取代之丙烯醯基。 In an embodiment of the present invention, R5 of Chemical Formula 1 is an acryloyl group substituted by an alkyl group.

本發明之一個實施例中,化學式1中的R5是由甲基所取代的丙烯醯基。 In one embodiment of the present invention, R5 in Chemical Formula 1 is an acryloyl group substituted by a methyl group.

此外,化學式1由以下化學式1-1至1-8中任一者所表示,但不限於此。 Further, Chemical Formula 1 is represented by any one of Chemical Formulas 1-1 to 1-8 below, but is not limited thereto.

本發明之實施例中,苯乙烯系化合物的最大吸收波長(λmax)的範圍為400nm至500nm。 In the examples of the present invention, the maximum absorption wavelength (λ max ) of the styrene-based compound ranges from 400 nm to 500 nm.

本發明之一個實施例中,苯乙烯系化合物的吸 收光譜範圍為350nm至500nm。 In one embodiment of the invention, the absorption of the styrenic compound The spectral range is from 350 nm to 500 nm.

圖1為化學式1-1、1-3、1-5及1-7之吸收光譜。圖1可以證實,苯乙烯系化合物在一個實施例中的最大吸收波長(λmax)的範圍為400nm至500nm。在此情況下,光阻樹脂組合物呈現綠色。 Figure 1 shows the absorption spectra of Chemical Formulas 1-1, 1-3, 1-5, and 1-7. 1 can confirm that the maximum absorption wavelength (λ max ) of the styrenic compound in one embodiment ranges from 400 nm to 500 nm. In this case, the photoresist resin composition appears green.

圖2為化學式1-1、1-3及1-7之透射光譜。 2 is a transmission spectrum of Chemical Formulas 1-1, 1-3, and 1-7.

圖3為實施例3及比較例1的透射光譜。 3 is a transmission spectrum of Example 3 and Comparative Example 1.

圖4為實施例3及比較例1之透射光譜的放大圖。 4 is an enlarged view of a transmission spectrum of Example 3 and Comparative Example 1.

圖5為實施例4及比較例2之透射光譜。 5 is a transmission spectrum of Example 4 and Comparative Example 2.

此外,圖4為實施例3及比較例1的透射光譜。本發明之實施例中,苯乙烯系化合物之透射率的範圍在波長500nm至800nm為90%至100%。 4 is a transmission spectrum of Example 3 and Comparative Example 1. In the examples of the present invention, the transmittance of the styrene-based compound is in the range of 90% to 100% at a wavelength of 500 nm to 800 nm.

圖5為實施例4及比較例2之透射光譜的放大圖。如上所述,可以得知當顯現綠色時亮度增加。 Fig. 5 is an enlarged view showing transmission spectra of Example 4 and Comparative Example 2. As described above, it can be known that the brightness increases when green appears.

化學式1之苯乙烯系化合物,可製備一具有咔唑基、氰基、及丙烯酸基之結構,該結構係藉由反應一含有三級胺結構之起始原料、及一包括氰基或丙烯酸基之化合物,如NCCH2COOH。必要時,附加之丙烯酸基可被引入到該丙烯酸基。 The styrenic compound of Chemical Formula 1 can be prepared by a structure having a carbazolyl group, a cyano group, and an acrylic group, which is obtained by reacting a starting material containing a tertiary amine structure, and a cyano group or an acrylic group. a compound such as NCCH 2 COOH. An additional acrylic group may be introduced to the acrylic group as necessary.

根據本發明之實施例,苯乙烯系化合物可以藉由光或熱鍵結到其它的取代基。 According to an embodiment of the present invention, the styrenic compound may be bonded to other substituents by light or heat.

本發明之實施例係提供一種著色劑,其係包括苯乙烯系化合物。 Embodiments of the present invention provide a color former comprising a styrenic compound.

本發明實施例之光阻樹脂組合物包括著色劑,該著色劑係包括由化學式1所表示之苯乙烯系化合物。 The photoresist resin composition of the embodiment of the present invention includes a colorant comprising the styrene compound represented by Chemical Formula 1.

對於使用僅包括現有顏料的顏料型光阻樹脂組合物之彩色濾光片,該具有吸收及透射光譜的顏料適合於光源的數量有限,不容易微調吸收及透射光譜。 For a color filter using a pigment type resist resin composition containing only an existing pigment, the pigment having an absorption and transmission spectrum is suitable for a limited number of light sources, and it is not easy to finely adjust the absorption and transmission spectra.

根據本發明實施例之著色劑,可以簡單微調透射光譜。 According to the coloring agent of the embodiment of the present invention, the transmission spectrum can be simply fine-tuned.

本發明之實施例中,該著色劑為單獨苯乙烯系化合物所組成之染料類型的著色劑。 In an embodiment of the present invention, the colorant is a dye type coloring agent composed of a styrene-based compound alone.

本發明之實施例,著色劑係包括苯乙烯系化合物、及一個、兩個、或多個選自由包括顏料及染料所組成之群組的附加著色劑。 In an embodiment of the invention, the colorant comprises a styrenic compound, and one, two, or more additional colorants selected from the group consisting of pigments and dyes.

具體而言,根據本發明之實施例,苯乙烯系化合物可單獨使用為著色劑、或藉由混合苯乙烯系化合物、苯乙烯系化合物以外之顏料、染料、或其混合物之著色劑。 Specifically, according to an embodiment of the present invention, the styrene-based compound may be used singly as a coloring agent or as a coloring agent by mixing a styrene-based compound, a pigment other than a styrene-based compound, a dye, or a mixture thereof.

具體而言,本實施例中,著色劑為包括苯乙烯系化合物之混合型著色劑的染料、及不包括苯乙烯系化合物之染料。另一個實施例中,著色劑為一種染料/顏料之混合式的著色劑,其中包括苯乙烯基化合物之染料及顏料。另一個實施例中,著色劑為一種染料/顏料之混合式的著色劑,該著色劑係包括苯乙烯基化合物之染料、及不包括苯乙烯系化合物之染料及顏料。 Specifically, in the present embodiment, the colorant is a dye including a mixed colorant of a styrene compound, and a dye not including a styrene compound. In another embodiment, the colorant is a dye/pigment blend of colorants including dyes and pigments of styryl based compounds. In another embodiment, the colorant is a dye/pigment mixed coloring agent comprising a dye of a styryl compound and a dye and pigment excluding a styrenic compound.

本發明實施例之彩色濾光片,其係使用含有苯乙烯系化合物之光阻樹脂組合物,使用各種染料及顏料可 得到一種適合光源之吸收及透射光譜,因此,可達到高著色再現範圍、高亮度及高對比度之範圍。 The color filter of the embodiment of the present invention uses a photoresist resin composition containing a styrene compound, and various dyes and pigments can be used. A suitable absorption and transmission spectrum of the light source is obtained, so that a range of high color reproduction range, high brightness, and high contrast can be achieved.

顏料為一種粉末狀的著色劑,其係不溶於水及有機溶劑。 The pigment is a powdery coloring agent which is insoluble in water and an organic solvent.

染料為溶解在水中及有機溶劑之著色劑,分散到單個分子,鍵結到一個分子,如纖維,並且被著色者。 A dye is a colorant dissolved in water and an organic solvent, dispersed to a single molecule, bonded to a molecule such as a fiber, and colored.

本發明之“著色劑”為顏料、染料、或顏料及染料之混合物。 The "colorant" of the present invention is a pigment, a dye, or a mixture of a pigment and a dye.

本發明之“著色劑”為苯乙烯系化合物及/或著色劑的混合物。 The "colorant" of the present invention is a mixture of a styrenic compound and/or a colorant.

作為黑色顏料可為炭黑、石墨、金屬氧化物、或其類似物。炭黑可舉例如Cisto 5HIISAF-HS、Cisto KH、Cisto 3HHAF-HS、Cisto NH、Cisto 3M、Cisto 300HAF-LS、Cisto 116HMMAF-HS、Cisto 116MAF、Cisto FMFEF-HS、Cisto SOFEF、Cisto VGPF、Cisto SVHSRF-HS、及Cisto SSRF(東海碳素股份有限公司製)、圖黑II、圖黑N339、圖黑SH、圖黑H、圖LH、圖HA、圖SF、圖N550M、圖M、圖E、圖G、圖R、圖N760M、圖LR、# 2700、# 2600、# 2400、# 2350、# 2300、# 2200、# 1000、# 980、# 900、MCF88、# 52、# 50、# 47、# 45、# 45L、# 25、# CF9、# 95、# 3030、# 3050、MA7、MA77、MA8、MA11、MA100、MA40、OIL7B、OIL9B、OIL11B、OIL30B、及OIL31B(三菱化學股份有限公司製)、PRINTEX-U、PRINTEX-V、PRINTEX-140U、PRINTEX-140V、PRINTEX-95、PRINTEX-85、PRINTEX-75、 PRINTEX-55、PRINTEX-45、PRINTEX-300、PRINTEX-35、PRINTEX-25、PRINTEX-200、PRINTEX-40、PRINTEX-30、PRINTEX-3、PRINTEX-A、SPECIAL BLACK-550、SPECIAL BLACK-350、SPECIAL BLACK-250、SPECIAL BLACK-100、及LAMP BLACK-101(Evonik Degusa股份有限公司製)、RAVEN-1100ULTRA、RAVEN-1080ULTRA、RAVEN-1060ULTRA、RAVEN-1040、RAVEN-1035、RAVEN-1020、RAVEN-1000、RAVEN-890H、RAVEN-890、RAVEN-880 ULTRA、RAVEN-860 ULTRA、RAVEN-850、RAVEN-RAVEN-820、RAVEN-790 ULTRA、RAVEN-780 ULTRA、RAVEN-760 ULTRA、RAVEN-520、RAVEN-500、RAVEN-460、RAVEN-450、RAVEN-430 ULTRA、RAVEN-420、RAVEN-410、RAVEN-2500ULTRA、RAVEN 2000、RAVEN-1500、RAVEN-1255、RAVEN-1250、RAVEN-1200、RAVEN-1190 ULTRA、RAVEN-1170(哥倫比亞化學品股份有限公司製)、及其混合物或類似物等。此外,呈現出顏色之著色劑,如胭脂紅6B(C.I.12490)、酚酞綠(C.I.74260)、酚藍(C.I.74160)、苝黑(BASF K0084.K0086)、花青基苷黑色Linol黃色(C.I.21090)、Linol黃色GRO(C.I.21090)、聯苯胺黃4T-564D、維多利亞純藍(C.I.42595)、C.I.顏料紅3,23,97,108,122,139,140,141,142,143,144,149,166,168,175,177,180,185,189,190,192,202,214,215,220,221,224,230,235,242,254,255,260,262,264,272、C.I.顏料綠7,10,36,37,58、C.I.顏料藍1,1:2,1:3,2,2:1,2:2,3,8,9,10,10:1,11,12,15,15:1,15:2,15:3,15:4, 15:6,16,18,19,22,24,24:1,53,56,56:1,57,58,59,60,61,62,64,C.I.顏料黃1,2,3,4,5,6,10,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214、C.I顏料紫1,19,23,27,29,30,32,37,40,42,50、或其類似物,此外,也可使用白色顏料、螢光顏料、及其類似物。作為顏料之酞氰系混合化合物也可以使用鋅作為中心金屬之材料。 As the black pigment, it may be carbon black, graphite, metal oxide, or the like. Carbon blacks such as Cisto 5HIISAF-HS, Cisto KH, Cisto 3HHAF-HS, Cisto NH, Cisto 3M, Cisto 300HAF-LS, Cisto 116HMMAF-HS, Cisto 116MAF, Cisto FMFEF-HS, Cisto SOFEF, Cisto VGPF, Cisto SVHSRF -HS, and Cisto SSRF (made by Tokai Carbon Co., Ltd.), Tho Black II, Tho Black N339, Takuro SH, Tak H, LH, HA, SF, N550M, M, E Figure G, Figure R, Figure N760M, Figure LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45,#45L,#25,#CF9,#95,#3030, #3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B (Mitsubishi Chemical Co., Ltd. ), PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (made by Evonik Degusa Co., Ltd.), RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN- 1000, RAVEN-890H, RAVEN-890, RAVEN-880 ULTRA, RAVEN-860 ULTRA, RAVEN-850, RAVEN-RAVEN-820, RAVEN-790 ULTRA, RAVEN-780 ULTRA, RAVEN-760 ULTRA, RAVEN-520, RAVEN -500, RAVEN-460, RAVEN-450, RAVEN-430 ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN 2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190 ULTRA, RAVEN-1170 (manufactured by Columbia Chemical Co., Ltd.), and mixtures or the like thereof. In addition, color-developing coloring agents such as Carmine 6B (CI12490), phenolphthalein green (CI74260), phenol blue (CI74160), ruthenium black (BASF K0084.K0086), and cyanine glycosides black Linol yellow (CI) 21090), Linol Yellow GRO (CI21090), benzidine yellow 4T-564D, Victoria Pure Blue (CI42595), CI Pigment Red 3,23,97,108,122,139,140,141,142,143,144,149,166,168,175,177,180,185,189,190,192,202,214,215,220,221,224,230,235,242,254,255,260,262,264,272, CI Pigment Green 7,10,36,37,58,CI Pigment Blue 1,1:2, 1:3,2,2:1,2:2,3,8,9,10,10:1,11,12,15,15:1,15:2,15:3 , 15:4, 15:6,16,18,19,22,24,24:1,53,56,56:1,57,58,59,60,61,62,64,CI Pigment Yellow 1,2,3,4 ,5,6,10,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40 , 42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214, CI pigment violet 1,19,23, 27, 29, 30, 32, 37, 40, 42, 50, or the like, in addition, white pigments, fluorescent pigments, and the like can also be used. As the cyanide-based mixed compound of the pigment, zinc can also be used as the material of the center metal.

本發明之實施例,著色劑包括一種、兩種、或多個附加著色劑,該附加著色劑係選自由下列所組成之群組:苯乙烯系化合物、顏料、及染料,且著色劑及苯乙烯系化合物之重量比範圍為1:99至99:1。另一個實施例中,著色劑及苯乙烯系化合物之重量比為3:97至97:3。另一個實施例中,著色劑及苯乙烯系化合物之重量比為95:5至5:95。前述內容中,其優點為具有高透射率。 In an embodiment of the invention, the colorant comprises one, two, or more additional colorants selected from the group consisting of styrenic compounds, pigments, and dyes, and colorants and benzene. The weight ratio of the vinyl compound ranges from 1:99 to 99:1. In another embodiment, the weight ratio of the colorant to the styrenic compound is from 3:97 to 97:3. In another embodiment, the weight ratio of the colorant to the styrenic compound is from 95:5 to 5:95. Among the foregoing, it is advantageous in that it has high transmittance.

本發明之實施例中,顏料為PG58或PY138。 In an embodiment of the invention, the pigment is PG58 or PY138.

本發明之實施例中,著色劑由PG58所組成,其係一種顏料、及苯乙烯系化合物。 In the examples of the present invention, the colorant is composed of PG58, which is a pigment and a styrene compound.

本發明之實施例中,著色劑係由PG58及PY138所組成,其係顏料、及苯乙烯系化合物。 In the examples of the present invention, the colorant is composed of PG58 and PY138, which are pigments and styrene compounds.

本發明之實施例中,該染料在丙二醇甲基醚乙酸酯(PGMEA)中的溶解度為10%或以上。 In an embodiment of the invention, the dye has a solubility in propylene glycol methyl ether acetate (PGMEA) of 10% or more.

本發明之實施例提供一種包括著色劑之光阻樹脂組合物。 Embodiments of the present invention provide a photoresist resin composition comprising a colorant.

本發明之實施例中,光阻樹脂組合物更包括一種黏著劑樹脂、多官能基單體、光起始劑、及溶劑。 In an embodiment of the invention, the photoresist resin composition further comprises an adhesive resin, a polyfunctional monomer, a photoinitiator, and a solvent.

該黏著劑樹脂沒有特別限制,只要該膜使用之光阻樹脂組合物顯示出強度及可製備性之物理性能。 The adhesive resin is not particularly limited as long as the photoresist resin composition used for the film exhibits physical properties of strength and manufacturability.

作為黏著劑樹脂,一多官能單體之共聚物樹脂賦予機械強度,也可使用一單體賦予鹼溶解度,且黏著劑更包括在現有技術領域中常使用者。 As the adhesive resin, a copolymer resin of a polyfunctional monomer imparts mechanical strength, and a single monomer can be used to impart alkali solubility, and the adhesive is further included in the prior art.

該多官能單體給予膜之機械強度,其係包括任何一種或多種的不飽和羧酸酯、芳香族乙烯化合物、不飽和醚、不飽和醯亞胺、及酸酐。 The polyfunctional monomer imparts mechanical strength to the film, including any one or more of unsaturated carboxylic acid esters, aromatic vinyl compounds, unsaturated ethers, unsaturated quinone imines, and anhydrides.

不飽和羧酸酯的具體例子係選自由下列所組成之群組:苯甲基(甲基)丙烯酸酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、二甲基氨基乙基(甲基)丙烯酸酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、環己基(甲基)丙烯酸酯、異莰基(isobornyl)(甲基)丙烯酸酯、乙基己基(甲基)丙烯酸酯、2-苯氧基乙基(甲基)丙烯酸酯、四氫糠基(furfuryl)(甲基)丙烯酸酯、羥乙基(甲基)丙烯酸酯、2-羥丙基(甲基)丙烯酸酯、2-羥-3-氯丙基(甲基)丙烯酸酯、4-羥丁基(甲基)丙烯酸酯、醯基辛基氧基-2-羥丙基(甲基)丙烯酸酯、甘油(甲基)丙烯酸酯、2-甲氧基乙基(甲基)丙烯酸 酯、3-甲氧基丁基(甲基)丙烯酸酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基三丙二醇(甲基)丙烯酸酯、聚(乙二醇)甲基醚(甲基)丙烯酸酯、苯氧基二甘醇(甲基)丙烯酸酯、對-壬基苯氧基聚乙二醇(甲基)丙烯酸酯、對-壬基苯氧基聚丙二醇(甲基)丙烯酸酯、環氧丙基(甲基)丙烯酸酯、四氟丙基(甲基)丙烯酸酯、1,1,1,3,3,3-六氟異丙基(甲基)丙烯酸酯、八氟戊基(甲基)丙烯酸酯、十七氟癸基(甲基)丙烯酸酯、三溴苯基(甲基)丙烯酸酯、α-甲基羥甲基丙烯酸酯、α-乙基羥甲基丙烯酸酯、α-丙基羥甲基丙烯酸酯、及α-丁基羥甲基丙烯酸酯,但不限於此。 Specific examples of the unsaturated carboxylic acid ester are selected from the group consisting of benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, and (meth) acrylate Ester, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (isobornyl) Methyl) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetrafurfuryl (meth) acrylate, hydroxyethyl (methyl) Acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, decyl octyloxy 2-hydroxypropyl (meth) acrylate, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate Ester, 3-methoxybutyl (meth) acrylate, ethoxy diethylene glycol (meth) acrylate, methoxy triethylene glycol (meth) acrylate, methoxy tripropylene glycol ( Methyl) acrylate, poly(ethylene glycol) methyl ether (meth) acrylate, phenoxy diglycol (meth) acrylate, p-nonyl phenoxy polyethylene glycol (methyl) Acrylate, p-nonylphenoxy polypropylene glycol (meth) acrylate, epoxy propyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, 1, 1, 1, 3, 3 , 3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate, α - methyl hydroxy methacrylate, α-ethyl hydroxy methacrylate, α-propyl hydroxy methacrylate, and α-butyl hydroxy methacrylate, but is not limited thereto.

芳香族乙烯單體的具體例子係選自由下列所組成之群組:苯乙烯、α-甲基苯乙烯、(鄰,間,對)-乙烯甲苯、(鄰,間,對)-甲氧基苯乙烯、及(鄰,間,對)-氯苯乙烯,但不限於此。 Specific examples of the aromatic vinyl monomer are selected from the group consisting of styrene, α-methylstyrene, (o-, m-, p-)-vinyltoluene, (o-, m-, p-)-methoxy Styrene, and (o-, m-, p-)-chlorostyrene, but are not limited thereto.

不飽和醚的具體例子係選自由下列所組成之群組:乙烯甲基醚、乙烯乙基醚、及烯丙基縮水甘油基醚,但不限於此。 Specific examples of the unsaturated ether are selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.

不飽和醯亞胺的具體例子係選自由下列所組成之群組:N-苯基馬來醯亞胺、N-(4-氯苯基)馬來醯亞胺、N-(4-羥基苯基)馬來醯亞胺、及N-環己基馬來醯亞胺,但不限於此。 Specific examples of the unsaturated quinone imine are selected from the group consisting of N-phenylmaleimide, N-(4-chlorophenyl)maleimide, N-(4-hydroxybenzene) Base) maleimide, and N-cyclohexylmaleimide, but is not limited thereto.

酸酐係包括馬來酸酐、甲基馬來酸酐、四氫鄰苯二甲酸酐等,但不限於此。 The acid anhydride includes maleic anhydride, methyl maleic anhydride, tetrahydrophthalic anhydride, and the like, but is not limited thereto.

提供鹼溶解度之單體沒有特別限制,只要該單 體包括酸基團,例如,單體較佳係選自由一個或多個下列所組成之群組者:(甲基)丙烯酸、巴豆酸、馬來酸、富馬酸、單甲基馬來酸、5-降莰烯-2-羧酸、單-2-((甲基)丙烯醯基氧基)乙基二甲酸酯、單-2-((甲基)丙烯醯基氧基)乙基琥珀酸酯、ω-羧基聚己內酯單(甲基)丙烯酸酯,但不限於此。 The monomer which provides alkali solubility is not particularly limited as long as the single The body includes an acid group, for example, the monomer is preferably selected from the group consisting of one or more of the following: (meth)acrylic acid, crotonic acid, maleic acid, fumaric acid, monomethyl maleic acid , 5-northene-2-carboxylic acid, mono-2-((meth)propenyloxy)ethyl dicarboxylate, mono-2-((meth)acrylenyloxy)B The succinic acid ester, ω-carboxypolycaprolactone mono(meth)acrylate, but is not limited thereto.

本發明之實施例中,黏著劑樹脂的酸值為50~130 KOH毫克/克,且重量平均分子量之範圍為1,000~50,000。 In an embodiment of the present invention, the adhesive resin has an acid value of 50 to 130 KOH mg/g and a weight average molecular weight ranging from 1,000 to 50,000.

該多官能基單體為單體中扮演藉由光形成光阻相之角色,且可具體地包括一種、兩種、或多種之混合物係選自由下列所組成之群組者:丙二醇甲基丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇丙烯酸酯、新戊二醇二丙烯酸酯、6-己二醇二丙烯酸酯、1,6-己二醇丙烯酸酯四甘醇甲基丙烯酸酯、雙苯氧乙醇二丙烯酸酯、參羥乙基異氰脲酸酯三甲基丙烯酸酯、三甲基丙烷三甲基丙烯酸酯、二苯基戊丁四醇六丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、及二季戊四醇六甲基丙烯酸酯。 The polyfunctional monomer is a monomer that plays a role of forming a photoresist phase by light, and may specifically include one, two, or a mixture of a plurality selected from the group consisting of propylene glycol methacrylic acid. Ester, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl glycol diacrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxy Ethanol diacrylate, hydroxyethyl isocyanurate trimethacrylate, trimethyl propane trimethacrylate, diphenylpentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol IV Methacrylate, and dipentaerythritol hexamethacrylate.

光起始劑沒有特別限制,只要它是由藉由光所產生之自由基來誘發交聯,實際例子係選自由一種或多種下列所組成之群組:苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物、及肟系化合物。 The photoinitiator is not particularly limited as long as it induces crosslinking by a radical generated by light, and practical examples are selected from the group consisting of one or more of the following: an acetophenone-based compound, a biimidazole-based compound. , a triazine-based compound, and an anthraquinone compound.

苯乙酮系化合物如2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥 基乙氧基)-苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、安息香甲基醚、安息香乙醚、安息香異丁基醚、安息香丁基醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲基硫基)苯基-2-嗎啉基-1-丙烷-1-酮、2-苯甲基-2-二甲基氨基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(4-溴-苯甲基-2-二甲基氨基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-甲基-1-[4-(甲基硫基)苯基]-2-嗎啉基丙烷-1-酮等,但不限於此。 Acetophenone-based compounds such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one 4-(2-hydroxyl Ethyloxy)-phenyl-(2-hydroxy-2-propyl)one, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin butyl ether, 2 , 2-dimethoxy-2-phenylacetophenone, 2-methyl-(4-methylthio)phenyl-2-morpholinyl-1-propan-1-one, 2-phenyl 2--2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, 2-(4-bromo-benzyl-2-dimethylamino-1-(4) -morpholinylphenyl)-butan-1-one, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, etc., but not limited thereto this.

聯咪唑系化合物如2,2-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-肆(3,4,5-三甲氧基苯基)-1,2'-聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰-氯苯基)-4,4,5,5'-四苯基-1,2'-聯咪唑等,但不限於此。 Biimidazole compounds such as 2,2-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4,4 ',5,5'-肆(3,4,5-trimethoxyphenyl)-1,2'-biimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4 ',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4,4,5,5'-tetraphenyl-1,2'-biimidazole, etc. Not limited to this.

三嗪系化合物,舉例如3-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}丙酸、1,1,1,3,3,3-六氟-3-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}丙酸乙酯、乙基-2-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}乙酸甲酯、2-環氧乙基-2-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}乙酸甲酯、環己基-2-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}乙酸酯、苯甲基-2-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}乙酸甲酯、3-{氯-4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}丙醯鞍、2,4-雙(三氯甲基)-6-p-甲氧基苯乙烯基-s-三嗪、2,4-雙(三氯甲基)-6-(1-p-二甲基氨基苯基)-1,3-丁二烯基-s-三嗪、2-三氯甲基-4-氨基-6-p-甲氧基苯乙烯基-s-三嗪等,但不限於此。 肟基化合物可舉例如1,2-辛二酮-1-(4-苯硫基)苯基-2-(o-苯甲醯基肟)(Ciba-Geigy股份有限公司製,CGI124)、乙酮-1-(9-乙基)-6-(2-甲基苯甲醯基-3-基)-1-(O-乙醯肟)(CGI242)、N-1919(ADEKA股份有限公司製)、及其類似物等,但不限於此。 Triazine-based compounds, for example, 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 1,1,1,3,3 ,3-hexafluoro-3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid ethyl ester, ethyl-2-{4- [2,4-Bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetic acid methyl ester, 2-epoxyethyl-2-{4-[2,4-double (three Methyl chloromethyl)-s-triazin-6-yl]phenylthio}acetate, cyclohexyl-2-{4-[2,4-bis(trichloromethyl)-s-triazine-6- Methyl]phenylthio}acetate, benzyl-2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}methyl acetate, 3 -{Chloro-4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2,4-bis(trichloromethyl) -S-triazin-6-yl]phenylthio}propanoid saddle, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazine, 2, 4-bis(trichloromethyl)-6-(1-p-dimethylaminophenyl)-1,3-butadienyl-s-triazine, 2-trichloromethyl-4-amino- 6-p-methoxystyryl-s-triazine, etc., but is not limited thereto. The mercapto compound may, for example, be 1,2-octanedione-1-(4-phenylthio)phenyl-2-(o-benzhydrylhydrazine) (manufactured by Ciba-Geigy Co., Ltd., CGI124), Ketone-1-(9-ethyl)-6-(2-methylbenzimidyl-3-yl)-1-(O-acetyl) (CGI242), N-1919 (made by ADEKA CORPORATION) ), its analogs, etc., but are not limited thereto.

溶劑係包括一種或多種選自由下列所組成之群組:丙酮、甲基乙基酮、甲基異丁基酮、甲基溶纖劑、乙基溶纖劑、四氫呋喃、1,4-二氧六環、乙二醇二甲醚、乙二醇二乙醚、丙二醇二甲醚、丙二醇二乙醚、二甘醇二甲醚、二甘醇二乙醚、二乙二醇甲乙醚、氯仿、二氯甲烷、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2-三氯乙烷、1,1,2-三氯乙烯、己烷、庚烷、辛烷、環己烷、苯、甲苯、二甲苯、甲醇、乙醇、異丙醇、丙醇、丁醇、第三丁醇、2-乙氧基丙醇、2-甲氧基丙醇、3-甲氧基丁醇、環己酮、環戊酮、丙二醇甲基醚乙酸酯、丙二醇乙醚乙酸酯、3-甲氧基丁基乙酸酯、乙基-3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、乙酸丁酯、丙二醇單甲醚、及二丙二醇單甲醚,但並不限於於此。 The solvent system comprises one or more selected from the group consisting of acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane. Hexacyclohexane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diglyme, diethylene glycol diethyl ether, diethylene glycol methyl ether, chloroform, dichloromethane 1,2-Dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, hexane, heptane, octane , cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tert-butanol, 2-ethoxypropanol, 2-methoxypropanol, 3-methyl Oxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, 3-methoxybutyl acetate, ethyl-3-ethoxypropionate And ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether, but are not limited thereto.

本發明之實施例中,基於光阻樹脂組合物之固體含量的總重,包括苯乙烯系化合物之著色劑的含量係由化學式1所表示為5重量百分比至60重量百分比,黏著劑樹脂的含量由1重量百分比至60重量百分比時,起始劑的含量由0.1重量百分比至20重量百分比,及多官能基單體的含量由0.1重量百分比~50重量百分比。 In the embodiment of the present invention, the content of the coloring agent including the styrene-based compound is represented by Chemical Formula 1 as 5 to 60% by weight based on the total weight of the solid content of the resist resin composition, and the content of the adhesive resin. The content of the initiator is from 0.1% by weight to 20% by weight, and the content of the polyfunctional monomer is from 0.1% by weight to 50% by weight, from 1% by weight to 60% by weight.

固體成分的總重量意指該光阻樹脂組合物不包括溶劑之組成份的總重量。重量標準百分比係指基於固體成分及各組成的固體含量可使用在相關領域中常用的分析方法,例如液相層析法或氣相層析法來測定。 The total weight of the solid component means that the photoresist resin composition does not include the total weight of the component parts of the solvent. The weight standard percentage means that the solid content based on the solid content and each composition can be determined using an analytical method commonly used in the related art, such as liquid chromatography or gas chromatography.

前述範圍內可以得到具有高亮度的綠色彩色濾光片。 A green color filter having high luminance can be obtained within the foregoing range.

本發明之實施例中,光阻樹脂組合物更包括一種、兩種、或多種添加劑係選自由下列所組成之群組:光聯敏化劑、固化促進劑、黏合促進劑、表面活性劑、抗氧化劑、熱聚合抑製劑、紫外線吸收劑、分散劑、及調平劑(leveling agent)。 In an embodiment of the present invention, the photoresist resin composition further comprises one, two or more additives selected from the group consisting of: an optical sensitizer, a curing accelerator, a adhesion promoter, a surfactant, Antioxidants, thermal polymerization inhibitors, UV absorbers, dispersants, and leveling agents.

本發明之實施例中,基於光阻樹脂組合物的固體成分的總重量,添加劑的含量為0.1重量百分比至20重量百分比。 In the embodiment of the invention, the content of the additive is from 0.1% by weight to 20% by weight based on the total weight of the solid content of the photoresist resin composition.

作為光聯敏化劑,其係選自由一種或多種包括二苯甲酮系化合物所組成之群組者:二苯甲酮、4,4-雙(二甲氨基)二苯甲酮、4,4-雙(二乙基氨基)二苯甲酮、2,4,6-三甲基胺基二苯甲酮、甲基-o-苯甲醯基苯甲酸酯、3,3-二甲基-4-甲氧基二苯甲酮、或3,3,4,4-四(第三丁基過氧羰基)二苯甲酮;茀酮系化合物,例如9-茀酮、2-氯-9-茀酮、2-甲基-9-茀酮;硫雜蒽酮系化合物,例如硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙氧基硫雜蒽酮、異丙基硫雜蒽酮、或二異丙基硫雜蒽酮;氧葱酮化合物,如氧葱酮、或2-甲基氧葱酮;蒽醌系化合物,如蒽醌、2-甲基蒽醌、2- 乙基蒽醌、第三丁基蒽醌、或2,6-二氯-9,10-蒽醌;吖啶系化合物,如9-苯基吖啶、1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基戊烷)、或1,3-雙(9-吖啶基)丙烷;二羰基化合物,如苯甲基、1,7,7-三甲基-二環[2,2,1]庚烷-2,3-二酮、或9,10-菲醌;亞磷酸酯氧化物,如2,4,6-三甲基苯甲醯基二苯基氧化膦、或雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基苯基氧化物;苯甲酸酯系化合物,例如甲基-4-(二甲基氨基)苯甲酸酯、乙基-4-(二甲基氨基)苯甲酸甲酯、或2-正丁氧基乙基-4-(二甲基氨基)苯甲酸酯;氨基增效劑如2,5-雙(4-二乙基氨基亞苯甲基)環戊酮、2,6-雙(4-二乙基氨基苯亞甲基)環己酮、或2,6-雙(4-二乙基氨基亞甲基)-4-甲基-環戊酮;香豆素系化合物,如3,3-羰基乙烯-7-(二乙基氨基)香豆素、3-(2-苯並噻唑基)-7-(二乙基氨基)香豆素、3-苯甲醯基-7-(二乙基氨基)香豆素、3-苯甲醯基-7-甲氧基香豆素、10,10-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫-1H,5H,11H-C1]-苯並吡喃[6,7,8]-喹-11-酮;或查耳酮化合物,如4-二乙基氨基查耳酮、4-azid亞苯苯乙酮、2-苯甲醯基、及3-甲基-β-萘並三唑(naphthotiazoline)。 As the light-sensitizer, it is selected from the group consisting of one or more benzophenone-based compounds: benzophenone, 4,4-bis(dimethylamino)benzophenone, 4, 4-bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzylidene benzoate, 3,3-dimethyl 4-methoxybenzophenone, or 3,3,4,4-tetra(t-butylperoxycarbonyl)benzophenone; anthrone-based compound, such as 9-fluorenone, 2-chloro -9-fluorenone, 2-methyl-9-fluorenone; thioxanthone-based compounds such as thioxanthone, 2,4-diethylthiazinone, 2-chlorothiazinone, 1 - chloro-4-propoxythiazinone, isopropyl thioxanthone, or diisopropyl thioxanthone; an onion ketone compound, such as oxalyl ketone, or 2-methyl oxalyl ketone; Lanthanide compounds such as hydrazine, 2-methyl hydrazine, 2- Ethyl hydrazine, tert-butyl hydrazine, or 2,6-dichloro-9,10-fluorene; acridine compounds such as 9-phenyl acridine, 1,7-bis (9-acridine) Heptane, 1,5-bis(9-acridinylpentane), or 1,3-bis(9-acridinyl)propane; dicarbonyl compounds such as benzyl, 1,7,7- Trimethyl-bicyclo[2,2,1]heptane-2,3-dione, or 9,10-phenanthrenequinone; phosphite oxides such as 2,4,6-trimethylbenzamide Diphenylphosphine oxide, or bis(2,6-dimethoxybenzylidene)-2,4,4-trimethylphenyl oxide; benzoate compound, such as methyl-4 -(Dimethylamino)benzoate, methyl ethyl-4-(dimethylamino)benzoate, or 2-n-butoxyethyl-4-(dimethylamino)benzoate Amino synergist such as 2,5-bis(4-diethylaminobenzylidene)cyclopentanone, 2,6-bis(4-diethylaminobenzylidene)cyclohexanone, or 2 , 6-bis(4-diethylaminomethylene)-4-methyl-cyclopentanone; coumarin compounds such as 3,3-carbonylethene-7-(diethylamino)coumarin , 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzylidenyl-7-(diethylamino)coumarin, 3-benzylidene- 7-methoxy ,10,10-carbonylbis[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H,5H,11H-C1]-benzopyran [6,7, 8]-quino-11-one; or chalcone compounds such as 4-diethylaminochalcone, 4-azid benzophenone, 2-benzylidene, and 3-methyl-β- Naphthotiazoline.

固化促進劑用於提高固化性及機械強度,具體而言,係選自由一種或多種類型下列所組成之群組:2-巰基苯並咪唑、2-巰基苯並噻唑、2-巰基苯並噁唑噻唑2,5-二巰基-1,3,4-噻二唑、2-巰基-4,6-二甲基氨基吡啶、季戊四醇-肆(3-巰基丙酸酯)、季戊四醇參(3-巰基丙酸酯)、季戊四醇-肆(2-巰基乙酸酯)、季戊四醇-參(2-巰基乙酸酯)、三羥甲基 丙烷-參(2-巰基乙酸酯)、及三羥甲基丙烷-參(3-巰基丙酸酯)。 The curing accelerator is used for improving curability and mechanical strength, and specifically, is selected from the group consisting of one or more types: 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzopyrene Azothiazole 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-indole (3-mercaptopropionate), pentaerythritol ginseng (3- Mercaptopropionate, pentaerythritol-indole (2-mercaptoacetate), pentaerythritol-gin (2-mercaptoacetate), trimethylol Propane-gin (2-mercaptoacetate), and trimethylolpropane-gin (3-mercaptopropionate).

作為本發明中所使用之黏合促進劑,可使用一種或多種甲基丙烯醯基氧基的矽烷偶聯劑,可選擇或使用如甲基丙烯醯基氧基丙基三甲氧基矽烷、甲基丙烯醯基氧基丙基甲基二甲氧基矽烷、甲基丙烯醯基氧基丙基三乙氧基矽烷、或甲基丙烯醯基氧基丙基甲基二甲氧基矽烷,及一種或多種類型之正辛基三甲氧基矽烷可選擇或使用辛基三甲氧基矽烷、十二烷基三甲氧基矽烷、十八烷基三甲氧基矽烷、及其類似物。 As the adhesion promoter used in the present invention, one or more methacryloxycarbonyl decane coupling agents may be used, and methacryloxypropyltrimethoxydecane, methyl group such as methacryloxypropyltrimethoxydecane may be selected or used. Propylene decyloxypropylmethyldimethoxydecane, methacryloxypropyltriethoxydecane, or methacryloxypropylmethyldimethoxydecane, and a Or a plurality of types of n-octyltrimethoxydecane may be selected or used as octyltrimethoxydecane, dodecyltrimethoxydecane, octadecyltrimethoxydecane, and the like.

表面活性劑可為矽系表面活性劑或氟系表面活性劑,具體而言由BYK-Chemie GmbH所製造之BYK-077、BYK-085、BYK-300、BYK-301、BYK-302、BYK-306、BYK-307、BYK-310、BYK-320、BYK-322、BYK-323、BYK-325、BYK-330、BYK-331、BYK-333、BYK-335、BYK-341v344、BYK-345v346、BYK-348、BYK-354、BYK-355、BYK-356、BYK-358、BYK-361、BYK-370、BYK-371、BYK-375、BYK-380、BYK-390、及其類似物可作為矽系表面活性劑,及由DIC(大日本油墨化學)股份有限公司所製造之F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF1132、 TF1027SF、TF-1441、TF-1442、及其類似物可作為氟系表面活性劑,然而,矽系表面活性劑及氟系表面活性劑並不限於此。 The surfactant may be a lanthanide surfactant or a fluorosurfactant, specifically BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK- manufactured by BYK-Chemie GmbH. 306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, and the like are available as Lanthanide surfactants, and F-114, F-177, F-410, F-411, F-450, F-493, F-494, F manufactured by DIC (Japan Pharmaceutical Co., Ltd.) -443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF , F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF -1129, TF-1126, TF-1130, TF-1116SF, TF-1131, TF1132 TF1027SF, TF-1441, TF-1442, and the like can be used as the fluorine-based surfactant, however, the lanthanoid surfactant and the fluorine-based surfactant are not limited thereto.

抗氧化劑係選自由一種或多種類型下列所組成之群組:受阻酚系抗氧化劑、胺系抗氧化劑、硫系抗氧化劑、及膦系抗氧化劑,但不限於此。 The antioxidant is selected from the group consisting of one or more types of the following: a hindered phenol-based antioxidant, an amine-based antioxidant, a sulfur-based antioxidant, and a phosphine-based antioxidant, but is not limited thereto.

抗氧化劑的具體例子可包括磷酸鹽系熱穩定劑如磷酸、磷酸三甲酯、或磷酸三乙酯,受阻酚系初級抗氧化劑,如2,6-二-第三丁基-p-甲酚、十八烷基-3-(4-羥基-3,5-二第三丁基苯基)丙酸酯、四雙[亞甲基-3-(3,5-二第三丁基-4-羥基苯基)丙酸酯]甲烷、1,3,5-三甲基-2-2,4,6-三(3,5-二第三丁基-4-羥基苯甲基)苯、3,5-二-第三丁基-4-羥苯甲基亞磷酸酯二乙酯、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-g-第三丁基苯酚、4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)、雙[3,3-雙-(4'-羥基-3'-第三丁基苯基)丁酸]乙二醇酯;胺系二次抗氧化劑如苯基-α-萘胺、苯基-β-萘胺、N,N'-二苯基-對苯二胺、或N,N'-二-β-萘基-對苯二胺;硫代系二次抗氧化劑,如二月桂基二硫醚、雙十二烷基硫代丙酸酯、二硬脂基硫代丙酸酯、巰基苯、或四甲基二硫化甲硫碳醯胺四雙[亞甲基-3-(月桂基)丙酸酯]甲烷;或亞磷酸酯系二次抗氧化劑,如亞磷酸三苯酯、磷酸三(壬基苯基)酯、亞磷酸三異癸酯、亞磷酸雙(2,4-二丁基苯基)季戊四醇二亞磷酸酯、或(1,1'-聯苯)-4,4'-二雙亞磷酸四[2,4-雙(1,1-二甲基乙基)苯基]酯。 Specific examples of the antioxidant may include a phosphate-based heat stabilizer such as phosphoric acid, trimethyl phosphate, or triethyl phosphate, and a hindered phenol-based primary antioxidant such as 2,6-di-t-butyl-p-cresol , octadecyl-3-(4-hydroxy-3,5-di-t-butylphenyl)propionate, tetra-bis[methylene-3-(3,5-di-t-butyl-4) -hydroxyphenyl)propionate]methane, 1,3,5-trimethyl-2-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, 3,5-di-t-butyl-4-hydroxybenzyl phosphite diethyl ester, 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6- G-t-butylphenol, 4,4'-butylene-bis(3-methyl-6-tert-butylphenol), 4,4'-thiobis(3-methyl-6-third Butylphenol), bis[3,3-bis-(4'-hydroxy-3'-t-butylphenyl)butyrate]ethylene glycol ester; amine secondary antioxidant such as phenyl-α-naphthalene Amine, phenyl-β-naphthylamine, N,N'-diphenyl-p-phenylenediamine, or N,N'-di-β-naphthyl-p-phenylenediamine; thio-based secondary antioxidant, Such as dilauryl disulfide, dodecyl thiopropionate, distearyl thiopropionate, mercapto benzene, or tetramethyl disulfide methyl carbamide Base-3-(lauryl)propionate]methane; or phosphite secondary antioxidant such as triphenyl phosphite, tris(nonylphenyl) phosphate, triisodecyl phosphite, phosphorous acid Bis(2,4-dibutylphenyl)pentaerythritol diphosphite, or (1,1'-biphenyl)-4,4'-bisbisphosphite tetra[2,4-bis(1,1- Dimethylethyl)phenyl]ester.

作為紫外線吸收劑,可舉例如2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯-苯並三唑、烷氧基二苯甲酮、或其類似物,紫外線吸收劑不限於此,且在相關領域中可使用該常用之成分。 As the ultraviolet absorber, for example, 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotriazole, alkoxybenzophenone, or the like can be mentioned. The ultraviolet absorber is not limited thereto, and the usual ingredients can be used in the related art.

熱聚合抑製劑之實例可包括一種或多種係選自由下列群組中所組成:p-茴香醚、對苯二酚、鄰苯二酚、第三丁基兒茶酚、N-亞硝基苯基羥胺銨鹽、N-亞硝基苯基羥胺銨鹽、p-甲氧基苯酚、二第三丁基-對甲酚、鄰苯三酚、苯醌、4,4-硫代雙(3-甲基-6-第三丁基苯酚)、2,2-甲基雙(4-甲基-6-第三丁基苯酚)、2-巰基咪唑、及噻嗪,但不限於此,且可包括其於現有技術領域中。 Examples of thermal polymerization inhibitors may include one or more selected from the group consisting of p-anisole, hydroquinone, catechol, tert-butylcatechol, N-nitrosobenzene Hydroxylamine ammonium salt, N-nitrosophenylhydroxylamine ammonium salt, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, benzoquinone, 4,4-thiobis (3 -methyl-6-tert-butylphenol), 2,2-methylbis(4-methyl-6-tert-butylphenol), 2-mercaptoimidazole, and thiazine, but are not limited thereto, and It may be included in the prior art.

分散劑可使用內部添加分散劑於表面形式的顏料來優先處理該顏料的方法,或外部添加分散劑至顏料的方法。作為分散劑,可使用化合物型、非離子型、陰離子型、或陽離子型的分散劑,及可使用包括氟系、酯系、陽離子系、陰離子系、非離子系、兩性表面活性劑、或其類似物者。這些可以單獨使用或兩種或多種的組合。 The dispersant may be a method of preferentially treating the pigment by internally adding a dispersant to the pigment in the surface form, or a method of externally adding a dispersant to the pigment. As the dispersing agent, a compound type, a nonionic type, an anionic type, or a cationic type dispersing agent can be used, and a fluorine-based, ester-based, cationic-based, anionic-based, nonionic-based, amphoteric surfactant, or Analog. These may be used singly or in combination of two or more.

具體而言,該分散劑係選自由下列一種或多種下列所組成之群組:聚亞烷基二醇及其酯類、聚氧化烯多元醇、酯烯化氧加成物、醇烯化氧加合物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺烯氧化加成物、及烷基胺,但不限於此。 Specifically, the dispersing agent is selected from the group consisting of one or more of the following: polyalkylene glycol and esters thereof, polyoxyalkylene polyol, ester alkylene oxide adduct, alcohol alkylene oxide An adduct, a sulfonate, a sulfonate, a carboxylate, a carboxylate, an alkyl amidene oxide adduct, and an alkylamine, but is not limited thereto.

調平劑(leveling agent)可為聚合或非聚合。聚合物之調平劑(leveling agent)可舉例如:聚乙烯亞胺、聚醯胺 胺、胺、及環氧化物之反應產物,及該非聚合調平劑(leveling agent)之具體例如非聚合的含硫及非聚合的含氮化合物,但不限於此,且可使用該常見化合物於相關領域中。 The leveling agent can be polymeric or non-polymeric. The leveling agent of the polymer may, for example, be polyethyleneimine or polyamine. a reaction product of an amine, an amine, and an epoxide, and a specific non-polymerizable sulfur-containing and non-polymerizable nitrogen-containing compound of the non-polymerized leveling agent, but is not limited thereto, and the common compound can be used. In related fields.

本發明之實施例係提供一種使用光阻樹脂組合物所製造之光敏材料。 Embodiments of the present invention provide a photosensitive material produced using a photoresist resin composition.

更詳細而言,膜型或圖案型光敏材料是將本發明之光阻樹脂組合物使用適當的方法形成於一基質。 More specifically, the film type or pattern type photosensitive material is formed by forming a photoresist resin composition of the present invention on a substrate by a suitable method.

塗佈方法,沒有特別的限定,可使用噴塗法、輥塗法、旋塗法、或其類似方法,且廣泛地使用旋塗法。此外在某些情況下,形成塗膜後殘餘溶劑藉由減壓而部分移除。 The coating method is not particularly limited, and a spray coating method, a roll coating method, a spin coating method, or the like can be used, and a spin coating method is widely used. Further, in some cases, the residual solvent after the formation of the coating film is partially removed by pressure reduction.

根據本發明之實施例,固化光阻樹脂組合物之光源可舉例如汞蒸氣弧、碳弧、或氙弧,其發射具有250nm至450nm波長的光,但不限於此。 According to an embodiment of the present invention, the light source of the cured photoresist resin composition may be, for example, a mercury vapor arc, a carbon arc, or a xenon arc, which emits light having a wavelength of from 250 nm to 450 nm, but is not limited thereto.

根據本發明之光阻樹脂組合物,可使用顏料分散型光敏材料製造薄膜電晶體液晶顯示器(TFT LCD)的彩色濾光器、用於形成有機發光二極體的黑色矩陣之光敏材料或薄膜電晶體液晶顯示器(TFT LCD)、用於形成外塗層之光敏材料、柱狀間隔物之光敏材料、光固化性塗料、光固化性油墨、光固化性黏接劑、印刷板、用於印刷電路板之光敏材料、用於電漿顯示面板(PDP)之光敏材料、或其類似之光敏材料,且該應用沒有特別限制。 According to the photoresist resin composition of the present invention, a color filter of a thin film transistor liquid crystal display (TFT LCD), a photosensitive material for forming a black matrix of an organic light emitting diode, or a thin film electricity can be produced using a pigment dispersion type photosensitive material. Crystal liquid crystal display (TFT LCD), photosensitive material for forming an overcoat layer, photosensitive material for column spacers, photocurable coating, photocurable ink, photocurable adhesive, printing plate, for printed circuit A photosensitive material for a sheet, a photosensitive material for a plasma display panel (PDP), or the like photosensitive material, and the application is not particularly limited.

本發明之實施例係提供一種彩色濾光片,其包括光敏材料。 Embodiments of the present invention provide a color filter that includes a photosensitive material.

彩色濾光片可以使用由化學式1所表示包括苯乙烯系化合物之光阻樹脂組合物來製備。彩色濾光片可使用光敏組合物於基板上形成塗佈膜,且通過曝光、顯影及固化塗膜。 The color filter can be prepared using a photoresist resin composition including a styrene compound represented by Chemical Formula 1. The color filter can form a coating film on the substrate using the photosensitive composition, and exposes, develops, and cures the coating film.

根據本發明之一實施例的光阻樹脂組合物具有優異的耐熱性,由熱處理產生些微顏色變化。因此,當製造彩色濾光片時,即使經由固化製程可提供高再現性、高亮度及高對比度。 The photoresist resin composition according to an embodiment of the present invention has excellent heat resistance, and some slight color change is caused by heat treatment. Therefore, when a color filter is manufactured, high reproducibility, high brightness, and high contrast can be provided even through a curing process.

基板可包括玻璃基板、矽晶片、塑料材料板、聚醚砜(PES)、或聚碳酸酯(PC)、或其類似物,其種類沒有特別限制。 The substrate may include a glass substrate, a tantalum wafer, a plastic material plate, polyethersulfone (PES), or polycarbonate (PC), or the like, and the kind thereof is not particularly limited.

彩色濾光片可包括紅色圖案、綠色圖案、藍色圖案、或黑色矩陣。 The color filter may include a red pattern, a green pattern, a blue pattern, or a black matrix.

另一實施例中,彩色濾光片更包括一覆蓋層。 In another embodiment, the color filter further includes a cover layer.

為改善對比度,在晶格上的一黑色圖案,即所謂黑色矩陣,可設置於彩色濾光片之彩色像素之間。鉻可作為黑色矩陣的材料。在此情況,可使用沉積鉻於整個玻璃基板及使用蝕刻處理形成圖案之方法。然而,考量因鉻廢液導致之製程的高成本、高反射率鉻及環境汙染,可使用一顏料分散體之樹脂黑色矩陣用的方法及微機械加工。 To improve contrast, a black pattern on the crystal lattice, the so-called black matrix, can be placed between the color pixels of the color filter. Chromium can be used as a material for the black matrix. In this case, a method of depositing chromium on the entire glass substrate and patterning using an etching process can be used. However, in consideration of the high cost, high reflectivity chromium and environmental pollution caused by the chromium waste liquid, a method and micromachining of a resin black matrix of a pigment dispersion can be used.

根據本發明之一實施例的黑色矩陣,可使用黑色顏料或作為著色劑之黑色染料。例如炭黑可單獨使用或碳黑及著色顏料可混合使用,且在此情況下,有薄膜的強度或黏合性基材即使著色劑的量相對地增加而不降低的優 點,因為該著色顏料缺乏遮光性。 According to the black matrix of one embodiment of the present invention, a black pigment or a black dye as a colorant can be used. For example, carbon black may be used alone or carbon black and color pigment may be used in combination, and in this case, the strength or adhesiveness of the film may be improved even if the amount of the colorant is relatively increased without being lowered. Point because the coloring pigment lacks light blocking properties.

本發明係提供一種顯示裝置,其係包括本發明之彩色濾光器。 The present invention provides a display device comprising the color filter of the present invention.

顯示裝置係為下列中任一者:電漿顯示面板(PDP)、發光二極體(LED)、有機發光二極體(OLED)、液晶顯示器(LCD)、薄膜電晶體液晶顯示器(LCD-TFT)、及陰極射線管(CRT)。 The display device is any one of the following: a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal display (LCD-TFT) ), and cathode ray tube (CRT).

根據本發明之一實施例的顯示裝置,其係具有高彩色再現性、高亮度及高對比度,因而具有高光阻斷特性。由於這些特性可製成細長之顯示裝置。 A display device according to an embodiment of the present invention has high color reproducibility, high brightness, and high contrast, and thus has high light blocking characteristics. Due to these characteristics, an elongated display device can be produced.

此外,本發明之一實施例中,顯示模組本身可為細長且該顯示器可使用頂部的密封部分及最小化的模組底部而最大化。 Moreover, in one embodiment of the invention, the display module itself can be elongated and the display can be maximized using the top sealing portion and the minimized module bottom.

接者,本發明內容將詳細參照實施例來說明。然而,應瞭解以下實施例僅用於說明之目的,並且本發明所揭示之範圍包括請求項所記載的範圍及替換或修改其內容且不限於該實施例。 The contents of the present invention will be described in detail with reference to the embodiments. However, it is to be understood that the following examples are for illustrative purposes only, and the scope of the present invention includes the scope of the claims and the substitution or modification thereof, and is not limited to the embodiment.

<製備例> <Preparation example>

(1)製備化學式1-1所示之化合物: (1) Preparation of a compound represented by Chemical Formula 1-1:

1)製備化學式1b 1) Preparation of chemical formula 1b

將5克的1a(33.51毫莫爾)、3.136克(36.866毫莫爾)之氰基乙酸、及0.571克(6.703毫莫爾)之哌啶置於110毫升的乙醇(EtOH),在85℃下攪拌混合物8小時,加入1毫升之鹽酸(HCl)至該混合物中,攪拌30分鐘並冷卻至室溫。析出的固體過濾、乾燥,得到3.985克(8.43毫莫爾)由化學式1b所表示之化合物(產率:55%)。 5 grams of 1a (33.51 millimoles), 3.136 grams (36.866 millimoles) of cyanoacetic acid, and 0.571 grams (6.703 millimoles) of piperidine were placed in 110 milliliters of ethanol (EtOH) at 85 ° C The mixture was stirred for 8 hours, and 1 ml of hydrochloric acid (HCl) was added to the mixture, stirred for 30 minutes and cooled to room temperature. The precipitated solid was filtered and dried to give 3.985 g (8.43 mmol) of the compound represented by the formula 1b (yield: 55%).

以下為使用1H-NMR之1b的測定結果。 The measurement results of 1b using 1 H-NMR are shown below.

1H NMR(500MHz,丙酮-d6,ppm):8.10(1H,S,CH),8.03-7.99(2H,D,ARH),6.87-6.85(2H,D,ARH),3.14(6H,S,CH3)。 1 H NMR (500MHz, acetone -d6, ppm): 8.10 (1H , S, CH), 8.03-7.99 (2H, D, ARH), 6.87-6.85 (2H, D, ARH), 3.14 (6H, S, CH3).

2)製備化學式1-1 2) Preparation of chemical formula 1-1

將1.5克的1b化合物(6.937毫莫爾)、1.44克(11.098毫莫爾)1c、1.648克(6.601毫莫爾)的乙基碳二亞胺鹽酸鹽(EDC-HCl)、及0.169克(1.387毫莫爾)之二甲基氨基吡啶(DMAP)置於0~4℃之40毫升四氫呋喃(THF),攪拌混合物2小時,然後在室溫下攪拌24小時。加入150ml的水到反應混合物中,並將結果用600毫升的二氯甲烷(MC)進行萃取。使有機層通過硫酸鎂(MgSO4)除去在萃取有機層的水,在真空下除去溶劑,使用管柱(己烷/乙酸乙酯=4/1)得到 化學式1-1所表示之1.140克(3.468毫莫爾)化合物。回收率(50%)。 1.5 g of 1b compound (6.937 mmol), 1.44 g (11.098 mmol) 1c, 1.648 g (6.601 mmol) of ethyl carbodiimide hydrochloride (EDC-HCl), and 0.169 g (1.387 mmol) of dimethylaminopyridine (DMAP) was placed in 40 ml of tetrahydrofuran (THF) at 0 to 4 ° C, and the mixture was stirred for 2 hours and then stirred at room temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the result was extracted with 600 ml of dichloromethane (MC). The organic layer was subjected to removal of water in an organic layer by magnesium sulfate (MgSO 4 ), and the solvent was removed in vacuo, using a column (hexane/ethyl acetate = 4/1) to give 1.140 g of the formula 1-1 ( 3.468 millimoles) compound. Recovery rate (50%).

以下表示使用1H-NMR之化學式1-1的測定結果。 The measurement results of Chemical Formula 1-1 using 1 H-NMR are shown below.

1H NMR(500MHz,丙酮-d6,ppm):8.10(1H,S,CH),8.01-7.99(2H,D,ARH),6.87-6.85(2H,D,ARH),6.10(1H,S,CH2),5.64(1H,S,CH2),4.55-4.53(2H,M,CH 2),4.46-4.44(2H,M,CH 2),3.16(6H,S,CH 3),1.92(3H,S,CH 3)。 1 H NMR (500 MHz, acetone-d6, ppm): 8.10 (1H, S, CH), 8.01-7.99 (2H, D, ARH), 6.87-6.85 (2H, D, ARH), 6.10 (1H, S, CH2), 5.64 (1H, S, CH2), 4.55-4.53 (2H, M, CH 2), 4.46-4.44 (2H, M, CH 2), 3.16 (6H, S, CH 3), 1.92 (3H, S, CH 3).

(2)製備化學式1-2所示之化合物 (2) Preparation of a compound represented by Chemical Formula 1-2

在(1)製得2克(9.249毫莫爾)之1b化合物、3.963克(18.4986毫莫爾)之1e、1.7736克(9.246毫莫爾)乙基碳二亞胺鹽酸鹽(EDC-HCl)、及0.227克(1.859毫莫爾)的二甲氨基吡啶(DMAP)在0至4℃下於40毫升四氫呋喃(THF)中,攪拌混合物2小時,接者在室溫下攪拌24小時。150ml之水加到該反應混合物中,並將產物以600毫升的二氯甲烷(MC)進行萃取。將有機層經過硫酸鎂來除去有機層的水,且該溶劑在真空下除去,使用管柱(己烷/乙酸乙酯=6/1)純化後得到由化學式1-2所表示之2.67克的化合物(6.474毫莫 爾)。回收率(70%)。 2 g (9.249 mmol) of 1b compound, 3.963 g (18.4986 mmol) of 1e, 1.7736 g (9.246 mmol) of ethyl carbodiimide hydrochloride (EDC-HCl) were prepared in (1). And 0.227 g (1.859 mmol) of dimethylaminopyridine (DMAP) were stirred at 0 to 4 ° C in 40 ml of tetrahydrofuran (THF) for 2 hours, and then stirred at room temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the product was extracted with 600 ml of dichloromethane (MC). The organic layer was subjected to magnesium sulfate to remove water of the organic layer, and the solvent was removed under vacuum, and purified using a column (hexane/ethyl acetate = 6/1) to give 2.67 g of the formula 1-2. Compound (6.474 mmol) Seoul). Recovery rate (70%).

以下表示使用1H-NMR之化學式1-2的測定結果。 The measurement results of Chemical Formula 1-2 using 1 H-NMR are shown below.

1H NMR(500MHz,丙酮-d6,ppm):8.09(1H,S,CH),8.00-7.99(2H,D,ARH),6.87-6.85(2H,D,ARH),6.42-6.39(1H,D,CH2),6.22-6.19(1H,Q,CH),6.11(1H,S,CH2),5.97-5.95(1H,D,CH 2),5.64(1H,S,CH2),5.58-5.55(1H,m,CH),4.60-4.40(4H,m,CH2),3.16(6H,S,CH3),1.92(3H,S,CH3)。 1 H NMR (500MHz, acetone -d6, ppm): 8.09 (1H , S, CH), 8.00-7.99 (2H, D, ARH), 6.87-6.85 (2H, D, ARH), 6.42-6.39 (1H, D, CH2), 6.22-6.19 (1H, Q, CH), 6.11 (1H, S, CH2), 5.97-5.95 (1H, D, CH 2), 5.64 (1H, S, CH2), 5.58-5.55 ( 1H, m, CH), 4.60-4.40 (4H, m, CH2), 3.16 (6H, S, CH3), 1.92 (3H, S, CH3).

(3))製備化學式1-3所示之化合物 (3)) Preparation of a compound represented by Chemical Formula 1-3

1)製備化學式2b 1) Preparation of chemical formula 2b

將5克的2a(28.21毫莫爾)、2.640克(31.03毫 莫爾)之氰基乙酸、及0.480克(5.642毫莫爾)之哌啶置於110毫升的乙醇中,在85℃下攪拌混合物8小時。加入1毫升鹽酸(HCl)到混合物中,攪拌該產物30分鐘,接者冷卻至室溫,過濾及乾燥析出的固體,得到4.135克(16.93毫莫爾)由化學式所表示之化合物2b。回收率(60%)。 Will be 5 grams of 2a (28.21 millimoles), 2.640 grams (31.03 millimeters) The cyanoacetic acid of Mohr) and 0.480 g (5.642 mmol) of piperidine were placed in 110 ml of ethanol, and the mixture was stirred at 85 ° C for 8 hours. 1 ml of hydrochloric acid (HCl) was added to the mixture, and the product was stirred for 30 minutes, and then cooled to room temperature, and the precipitated solid was filtered and dried to give 4.135 g (16.93 mM) of compound 2b represented by the chemical formula. Recovery rate (60%).

使用1H-NMR之2b的測定結果表示如下: 1H NMR(500MHz,,CDCl3,ppm):8.08(1H,S,CH), 7.96-7.94(2H,D,ARH),6.69-6.68(2H,ARH), 3.49-3.45(4H,Q,CH2),1.25-1.22(6H,T,CH3)。 The results of 2b measurement using 1 H-NMR are as follows: 1 H NMR (500 MHz, CDCl 3 , ppm): 8.08 (1H, S, CH), 7.96-7.94 (2H, D, ARH), 6.69-6.68 (2H , ARH), 3.49-3.45 (4H, Q, CH2), 1.25-1.22 (6H, T, CH3).

2)製備化學式1-3 2) Preparation of Chemical Formulas 1-3

將1.5g的2b(6.14毫莫爾)化合物、1.279克的2c(9.824毫莫爾)、1.450克(7.614毫莫爾)之乙基碳二亞胺鹽酸鹽(EDC-HCl)、及0.150克(1.228毫莫爾)之二甲基氨基吡啶(DMAP)在0~4℃下置於40毫升之四氫呋喃(THF)中,攪拌混合物2小時,接者在室溫下攪拌24小時。加入150ml的水到反應混合物中,將該產物以600毫升的二氯甲烷(MC)進行萃取。將有機層經過硫酸鎂來除去有機層的水,且該溶劑在真空下除去,使用管柱(己烷/乙酸乙酯=4/1)純化後得到由化學式1-3所表示之1.439克的化合物(4.060毫莫爾)。回收率(66%)。 1.5 g of 2b (6.14 mmol) compound, 1.279 g of 2c (9.824 mmol), 1.450 g (7.614 mmol) of ethyl carbodiimide hydrochloride (EDC-HCl), and 0.150 Glucan (1.228 mmol) of dimethylaminopyridine (DMAP) was placed in 40 ml of tetrahydrofuran (THF) at 0 to 4 ° C, and the mixture was stirred for 2 hours, and then stirred at room temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the product was extracted with 600 ml of dichloromethane (MC). The organic layer was subjected to magnesium sulfate to remove water of the organic layer, and the solvent was removed under vacuum, and purified using a column (hexane/ethyl acetate = 4/1) to give 1.439 g of the formula 1-3. Compound (4.060 mmol). Recovery rate (66%).

使用1H-NMR之化學式1-3的測定結果表示如下:1H NMR(500MHz,CDCl3,ppm):8.02(1H,S,CH),7.91-7.89(2H,D,ARH),6.66-6.64(2H,D,ARH),6.14(1H,S,CH2),5.57(1H,S,CH2),4.51-4.49(2H,M,CH2),4.43-4.41(2H,M,CH2),3.45-3.41(4H,Q,CH2),1.93(3H,S,CH3),1.22-1.19(6H,T,CH3)。 The results of the measurement of Chemical Formula 1-3 using 1 H-NMR are as follows: 1 H NMR (500 MHz, CDCl 3 , ppm): 8.02 (1H, S, CH), 7.91-7.89 (2H, D, ARH), 6.66-6.64 (2H, D, ARH), 6.14 (1H, S, CH2), 5.57 (1H, S, CH2), 4.51-4.49 (2H, M, CH2), 4.43-4.41 (2H, M, CH2), 3.45- 3.41 (4H, Q, CH2), 1.93 (3H, S, CH3), 1.22-1.19 (6H, T, CH3).

(4))製備化學式1-4所示之化合物 (4)) Preparation of a compound represented by Chemical Formula 1-4

將(3)中得到之2克的2b(8.187毫莫爾)化合物、2.055克(9.006毫莫爾)的2e、1.736克(9.006毫莫爾)之乙基碳二亞胺鹽酸鹽(EDC-HCl)、及0.2克(1.637毫莫爾)的二甲基氨基吡啶(DMAP),在0至4℃下放置於40毫升之四氫呋喃(THF)中,將混合物攪拌2小時,接者在室溫下攪拌24小時。加入150ml的水到該反應混合物中,並將該產物以600毫升的二氯甲烷(MC)進行萃取。將有機層經過硫酸鎂來除去有機層的水,且該溶劑在真空下除去,使用管柱(己烷/乙酸乙酯=6/1)純化後得到由化學式1-4所表示之3.102克的化合物(6.825毫莫爾)。回收率(83%)。 2 g of 2b (8.187 mmol) compound obtained in (3), 2.055 g (9.006 mmol) of 2e, 1.736 g (9.006 mmol) of ethylcarbodiimide hydrochloride (EDC) -HCl), and 0.2 g (1.637 mmol) of dimethylaminopyridine (DMAP), placed in 40 ml of tetrahydrofuran (THF) at 0 to 4 ° C, and the mixture was stirred for 2 hours. Stir under temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the product was extracted with 600 ml of dichloromethane (MC). The organic layer was subjected to magnesium sulfate to remove water of the organic layer, and the solvent was removed under vacuum, and purified using a column (hexane/ethyl acetate = 6/1) to give 3.102 g of the formula 1-4. Compound (6.825 mmol). Recovery rate (83%).

使用1H-NMR之化學式1-4的測定結果表示如下:1H NMR(500MHz,CDCl3,ppm):7.97(1H,S,CH),7.86-7.84(2H,D,ARH),6.62-6.60(2H,D,ARH),6.08(2H,S,CH2),5.54(2H,S,CH2),5.48-5.46(1H,m,CH),4.46-4.33(4H,m,CH2),3.41-3.37(4H,Q,CH2),1.88(6H,S,CH3),1.17-1.15(6H,T,CH3)。 The results of the measurement of Chemical Formulas 1-4 using 1 H-NMR are as follows: 1 H NMR (500 MHz, CDCl 3 , ppm): 7.97 (1H, S, CH), 7.86-7.84 (2H, D, ARH), 6.62-6.60 (2H, D, ARH), 6.08 (2H, S, CH2), 5.54 (2H, S, CH2), 5.48-5.46 (1H, m, CH), 4.46-4.33 (4H, m, CH2), 3.41 3.37 (4H, Q, CH2), 1.88 (6H, S, CH3), 1.17.15 (6H, T, CH3).

(5)製備由化學式1-5所表示之化合物 (5) Preparation of a compound represented by Chemical Formula 1-5

將1.5g的3a化合物(4.407毫莫爾)、0.917克 (7.05毫莫爾)的3b、1.047克(5.464毫莫爾)之乙基碳二亞胺鹽酸鹽(EDC-HCl)、及0.070克(0.573毫莫爾)之二甲氨基吡啶(DMAP)置於50毫升之四氫呋喃(THF)中,在0~4℃下攪拌混合物2小時,接者在室溫下攪拌24小時。加入150ml的水到反應混合物中,將該產物以700ml的二氯甲烷(MC)進行萃取。將有機層經過硫酸鎂來除去有機層的水,且在真空下除去該溶劑,使用管柱(己烷/乙酸乙酯=4/1)純化後得到由化學式1-5所表示之1.595克的化合物(3.526毫莫爾)。回收率(80%)。 1.5 g of 3a compound (4.407 mmol), 0.917 g (7.05 mmol) of 3b, 1.047 g (5.464 mmol) of ethyl carbodiimide hydrochloride (EDC-HCl), and 0.070 g (0.573 mmol) of dimethylaminopyridine (DMAP) The mixture was placed in 50 ml of tetrahydrofuran (THF), and the mixture was stirred at 0 to 4 ° C for 2 hours, and then stirred at room temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the product was extracted with 700 ml of dichloromethane (MC). The organic layer was subjected to magnesium sulfate to remove water of the organic layer, and the solvent was removed under vacuum, and purified using a column (hexane/ethyl acetate = 4/1) to give 1.595 g of the formula 1-5. Compound (3.526 mmol). Recovery rate (80%).

使用1H-NMR之化學式1-5的測定結果表示如下:1H NMR(500MHz,CDCl3,ppm):8.14(1H,S,CH),7.88-7.79(2H,D,ARH),7.39-7.31(4H,m,ARH),7.24-7.14(6H,m,ARH),6.97-6.88(2H,D,ARH),4.52-4.49(2H,M,CH2),4.43-4.40(2H,M,CH2),1.94(3H,S,CH3)。 The results of the measurement of Chemical Formula 1-5 using 1 H-NMR are as follows: 1 H NMR (500 MHz, CDCl 3 , ppm): 8.14 (1H, S, CH), 7.88-7.79 (2H, D, ARH), 7.39-7.31 (4H, m, ARH), 7.24-7.14 (6H, m, ARH), 6.97-6.88 (2H, D, ARH), 4.52-4.49 (2H, M, CH2), 4.43-4.40 (2H, M, CH2 ), 1.94 (3H, S, CH3).

(6)製備化學式1-7所示之化合物 (6) Preparation of a compound represented by Chemical Formula 1-7

將1.25克的4a化合物(3.393毫莫爾)、0.706克的4b(5.428毫莫爾)、0.806克(4.207毫莫爾)之乙基碳二 亞胺鹽酸鹽(EDC-HCl)、及0.051克(0.441毫莫爾)之二甲氨基吡啶(DMAP)置於40毫升之四氫呋喃(THF)中,在0~4℃下攪拌混合物2小時,接者在室溫下攪拌24小時。加入150ml的水到反應混合物中,將該產物以600毫升之二氯甲烷(MC)進行萃取。將有機層經過硫酸鎂來除去有機層的水,且在真空下除去該溶劑,使用管柱(己烷/乙酸乙酯=4/1)純化後得到由化學式1-7所表示之1.197克的化合物(2.491毫莫爾)。回收率(73%)。 1.25 g of 4a compound (3.393 mmol), 0.706 g of 4b (5.428 mmol), 0.806 g (4.207 mmol) of ethyl carbon two The imine hydrochloride (EDC-HCl), and 0.051 g (0.441 mmol) of dimethylaminopyridine (DMAP) were placed in 40 ml of tetrahydrofuran (THF), and the mixture was stirred at 0 to 4 ° C for 2 hours. The stirrer was stirred at room temperature for 24 hours. 150 ml of water was added to the reaction mixture, and the product was extracted with 600 ml of dichloromethane (MC). The organic layer was subjected to magnesium sulfate to remove water of the organic layer, and the solvent was removed under vacuum, and purified using a column (hexane/ethyl acetate = 4/1) to give 1.97 g of the formula 1-7. Compound (2.491 mmol). Recovery rate (73%).

使用1H-NMR之化學式1-7的測定結果表示如下:1H NMR(500MHz,CDCl3,ppm):8.03(1H,S,CH),7.88-7.86(2H,D,ARH),7.35-7.32(4H,t,ARH),7.29-7.26(2H,t,ARH),7.19-7.17(4H,D,ARH),6.78-6.76(2H,D,ARH),6.13(1H,S,CH2),5.57(1H,S,CH2),4.74(4H,S,CH2),4.51-4.48(2H,M,CH2),4.42-4.40(2H,M,CH2),1.93(3H,S,CH3)。 The results of the measurement of Chemical Formula 1-7 using 1 H-NMR are as follows: 1 H NMR (500 MHz, CDCl 3 , ppm): 8.03 (1H, S, CH), 7.88-7.86 (2H, D, ARH), 7.35-7.32 (4H, t, ARH), 7.29-7.26 (2H, t, ARH), 7.19-7.17 (4H, D, ARH), 6.78-6.76 (2H, D, ARH), 6.13 (1H, S, CH2), 5.57 (1H, S, CH2), 4.74 (4H, S, CH2), 4.51-4.48 (2H, M, CH2), 4.42-4.40 (2H, M, CH2), 1.93 (3H, S, CH3).

<實施例1~3及比較例1>綠色光阻樹脂組合物的顏色成分之比較 <Examples 1 to 3 and Comparative Example 1> Comparison of color components of green photoresist resin composition

根據各實施例及比較例中所製備之綠色光阻樹脂組合物的著色組合物之比較,其結果表示於下表1。 The results are shown in Table 1 below, based on comparison of the coloring compositions of the green photoresist resin compositions prepared in the respective Examples and Comparative Examples.

1)重量比 1) Weight ratio

黏著劑樹脂:甲基丙烯酸苯甲酯及甲基丙烯酸之共聚物,其莫爾比為70:30,酸值為113 KOH毫克/克,以GPC20,000,分子量分佈(PDI)2.0測得該重量平均分子量,固體含量(S.C)為25%。 Adhesive resin: a copolymer of benzyl methacrylate and methacrylic acid having a molar ratio of 70:30 and an acid value of 113 KOH mg/g as measured by GPC20,000 and molecular weight distribution (PDI) 2.0. The weight average molecular weight and solid content (SC) were 25%.

溶劑:丙二醇單甲醚乙酸酯(PGMEA) Solvent: propylene glycol monomethyl ether acetate (PGMEA)

光起始劑:I-369(BASF股份有限公司製) Photoinitiator: I-369 (manufactured by BASF Corporation)

多官能基單體:二苯基戊丁四醇六丙烯酸酯(DPHA) Polyfunctional monomer: diphenylpentaerythritol hexaacrylate (DPHA)

<實施例4及比較實施例2>綠色光阻樹脂組合物的顏色組成之比較 <Example 4 and Comparative Example 2> Comparison of color compositions of green photoresist resin compositions

根據各實施例及比較例所製備之綠色光阻樹脂組合物的著色組合物之比較,其結果表示於下表2。 The results of the coloring compositions of the green photoresist resin compositions prepared in the respective examples and comparative examples are shown in Table 2 below.

黏著劑樹脂:甲基丙烯酸苯甲酯及甲基丙烯酸之共聚物,其莫爾比為70:30,酸值為113 KOH毫克/克,以GPC20,000,分子量分佈(PDI)2.0測得重量平均分子量,固體含量(S.C)為25%。 Adhesive resin: a copolymer of benzyl methacrylate and methacrylic acid having a molar ratio of 70:30, an acid value of 113 KOH mg/g, and a weight measured by GPC20,000, molecular weight distribution (PDI) 2.0. The average molecular weight and solid content (SC) were 25%.

<實施例5>亮度(Y)及色坐標(Gx,Gy)之比較 <Example 5> Comparison of brightness (Y) and color coordinates (G x , G y )

光阻樹脂組合物旋轉塗布於5×5cm(康寧股份有限公司製)大小的玻璃且薄膜是在90℃下預烘烤約100秒,該光罩及基質之間格中所形成的薄膜為300μm,使用一步進器(HOYA-shott製)照射40mJ/cm2的光。該暴露之基質於顯影溶液進行60秒的曝光(KOH,0.05%),230℃下烘乾20分鐘後獲得一彩色圖案。 The photoresist resin composition was spin-coated on a glass of 5×5 cm (manufactured by Corning Co., Ltd.) and the film was prebaked at 90 ° C for about 100 seconds, and the film formed between the mask and the substrate was 300 μm. A light of 40 mJ/cm 2 was irradiated using a stepper (manufactured by HOYA-shott). The exposed substrate was exposed to a developing solution for 60 seconds (KOH, 0.05%), and dried at 230 ° C for 20 minutes to obtain a color pattern.

經光譜儀通過彩色圖案而獲得具有380nm至780nm範圍的可見光區域的透射光譜。使用所得之透射光譜及一C光的背光,使用下面的公式得到該三刺激值(X,Y,Z值),並從CIE1931坐標之值x,y,Y使用下式來進行計算。 A transmission spectrum having a visible light region in the range of 380 nm to 780 nm is obtained by a spectrometer through a color pattern. Using the obtained transmission spectrum and a C-light backlight, the tristimulus values (X, Y, Z values) were obtained using the following formula, and were calculated from the values of CIE 1931 coordinates x, y, Y using the following formula.

S:C光源 S: C light source

R:綠色光阻樹脂組合物之模式透射光譜 R: Mode transmission spectrum of green photoresist resin composition

:色彩匹配功能 : Color matching function

下面的表3中,使用綠色光阻樹脂組合物計算在C光源的顏色坐標,如下面表3所示。 In Table 3 below, the color coordinates of the C light source were calculated using the green photoresist resin composition as shown in Table 3 below.

如表3所示,與比較例相較下在亮度方面具有更好的效果。與比較例相比,亮度的增加是由於透射由450nm增加至680nm。 As shown in Table 3, it has a better effect in terms of brightness as compared with the comparative example. The increase in brightness compared to the comparative example is due to the increase in transmission from 450 nm to 680 nm.

<實施例6>溶解度 <Example 6> Solubility

以丙二醇甲醚乙酸酯(PGMEA)溶劑作為標準測定各化合物1-1至1-5及1-7之溶解度,其結果表示於以下表4。 The solubility of each of the compounds 1-1 to 1-5 and 1-7 was measured using a propylene glycol methyl ether acetate (PGMEA) solvent as a standard, and the results are shown in Table 4 below.

Claims (22)

一種苯乙烯系化合物,係由下述化學式1所表示: 其中,n為1至3的整數,m為1至4的整數,X為NR或O,R係選自由:氫、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、及具有2至25個碳原子之經取代或未取代的烯基所組成之群組;L1為直接鍵結、或具有1至10個碳原子之經取代或未經取代的亞烷基;R1及R2為彼此相同或不同,且各自獨立地為氫、含有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、具有7至50個碳原子之經取代或未經取 代的芳烷基、具有6至40個碳原子之經取代或未經取代的芳基、經取代或未經取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、或包括一個或多個N、O及S原子之經取代或未經取代的雜環基;R3為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、或具有1至25個碳原子之經取代或未經取代的烷氧基;R4為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、經取代或經未取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、包括一個或多個N、O和S原子之經取代或未經取代的雜環基;及R5為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代的環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、具有3至40個碳原子之經取代或未經取代的丙烯醯基團、經取代或未經取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、經取代或未經取代的丙烯酸酯基團、具 有1至40個碳原子之經取代或未經取代的羰基、或包括一個或多個N、O及S原子之經取代或未經取代的雜環基。 A styrenic compound represented by the following Chemical Formula 1: Wherein n is an integer of 1 to 3, m is an integer of 1 to 4, X is NR or O, and R is selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group of 3 to 20 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, and a substituted or unsubstituted carbon having 2 to 25 carbon atoms a group consisting of substituted alkenyl groups; L1 is a direct bond or a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms; R1 and R2 are the same or different from each other, and are each independently Hydrogen, substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, substituted with 1 to 25 carbon atoms or Unsubstituted alkoxy group, substituted or unsubstituted alkenyl group having 2 to 25 carbon atoms, substituted or unsubstituted aralkyl group having 7 to 50 carbon atoms, having 6 to 40 a substituted or unsubstituted aryl group of a carbon atom, a substituted or unsubstituted fluorenyl group, a substituted or unsubstituted carbazolyl group, or a substituted or unsubstituted heterocyclic group of one or more N, O and S atoms; R3 is hydrogen, deuterium, halo, nitrile, nitro, hydroxy, substituted with 1 to 25 carbon atoms or An unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, or a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms; R 4 is hydrogen, An anthracene, a halogen group, a nitrile group, a nitro group, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 25 carbon atoms, a substituted or 6 to 40 carbon atom substituted or unsubstituted Substituted aryl, substituted or unsubstituted fluorenyl group, substituted or unsubstituted carbazolyl, substituted or unsubstituted hetero including one or more N, O and S atoms a cyclic group; and R5 is hydrogen, hydrazine, a halogen group, a nitrile group, a nitro group, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, a substituted or unsubstituted cycloalkyl group of 3 to 20 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, a substituted or 2 to 25 carbon atom substituted or unsubstituted Substituted alkenyl group, substituted or unsubstituted aryl group having 6 to 40 carbon atoms, substituted or unsubstituted propylene group having 3 to 40 carbon atoms, substituted or unsubstituted a fluorenyl group, a substituted or unsubstituted carbazolyl group, a substituted or unsubstituted acrylate group, a substituted or unsubstituted carbonyl group having 1 to 40 carbon atoms, or a Or a plurality of substituted or unsubstituted heterocyclic groups of N, O and S atoms. 如申請專利範圍第1項所述之苯乙烯系化合物,其中,化學式1所表示之苯乙烯系化合物係由以下化學式2所表示: 其中,N、M、R1至R4、X、及L1與上述之定義相同,R6為氫、氘、鹵素基、腈基、硝基、羥基、具有1至25個碳原子之經取代或未經取代的烷基、具有3至20個碳原子之經取代或未經取代環烷基、具有1至25個碳原子之經取代或未經取代的烷氧基、具有2至25個碳原子之經取代或未經取代的烯基、含有6至40個碳原子之經取代或未經取代的芳基、經取代或經未取代的茀基(fluorenyl group)、經取代或未經取代的咔唑基、包括一個或多個N、O及S原子之經取代或未經取代的雜環基。 The styrene-based compound according to the first aspect of the invention, wherein the styrene-based compound represented by Chemical Formula 1 is represented by the following Chemical Formula 2: Wherein N, M, R1 to R4, X, and L1 are the same as defined above, and R6 is hydrogen, deuterium, halogen, nitrile, nitro, hydroxy, substituted or unsubstituted having 1 to 25 carbon atoms. a substituted alkyl group, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 25 carbon atoms, having 2 to 25 carbon atoms Substituted or unsubstituted alkenyl group, substituted or unsubstituted aryl group having 6 to 40 carbon atoms, substituted or unsubstituted fluorenyl group, substituted or unsubstituted anthracene Azolyl, substituted or unsubstituted heterocyclic group comprising one or more N, O and S atoms. 如申請專利範圍第1項所述之苯乙烯基化合物,其中,R1及R2為彼此相同或不同,且各自獨立地為具有1至25個碳原子之經取代或未經取代的烷基、含有6至40個碳原子之經 取代或未經取代的芳基、或具有7至50個碳原子之經取代或未經取代的芳烷基。 The styryl compound according to claim 1, wherein R1 and R2 are the same or different from each other, and each independently is a substituted or unsubstituted alkyl group having 1 to 25 carbon atoms, and contains 6 to 40 carbon atoms A substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group having 7 to 50 carbon atoms. 如申請專利範圍第1項所述之苯乙烯系化合物,其中,R4為腈基、含有6至40個碳原子之經取代或未經取代的烷基,該烷基由一個或多個取代基所未取代或取代,且該取代基係選自由:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基所未取代或取代者所組成之群組,或包括一個或多個N、O及S原子之雜環基,該雜環基由一個或多個取代基所未取代或取代,該取代基係選自由:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基所組成之群組。 The styrenic compound according to claim 1, wherein R4 is a nitrile group, a substituted or unsubstituted alkyl group having 6 to 40 carbon atoms, and the alkyl group is composed of one or more substituents. Unsubstituted or substituted, and the substituent is selected from the group consisting of: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group, alkylamine group, carbazole a group consisting of a fluorenyl group, a nitrile group, and a heterocyclic group comprising one or more N, O and S atoms, or a group of one or more N, O and a heterocyclic group of the S atom, which is unsubstituted or substituted by one or more substituents selected from the group consisting of: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine Group consisting of an arylamine group, an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic group including one or more N, O, and S atoms. . 如申請專利範圍第1項所述之苯乙烯系化合物,其中,L1為具有1至10個碳原子之直鏈或支鏈亞烷基,該亞烷基由一個或多個取代基所未取代或取代,該取代基係選自由:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、丙烯醯基、丙烯酸酯基、腈基、及包括一個或多個N、O及S原子之雜環基所組成之群組。 The styrenic compound according to claim 1, wherein L1 is a linear or branched alkylene group having 1 to 10 carbon atoms, and the alkylene group is unsubstituted by one or more substituents. Or substituted, the substituent is selected from the group consisting of: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group, alkylamine group, carbazolyl, fluorenyl A group consisting of a fluorenyl group, an acryloyl group, an acrylate group, a nitrile group, and a heterocyclic group including one or more N, O, and S atoms. 如申請專利範圍第1項所述之苯乙烯系化合物,其中R5為氫、氫、由一個或多個取代基所未取代或取代之丙烯酸酯基,該取代基係選自由:鹵基、烷基、烯基、環烷基、 芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基所組成之群組、由一個或多個取代基所未取代或取代之羰基,該取代基係選自由:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子的雜環基所組成之群組、或由一個或多個未取代或取代之丙烯醯基,該取代基係選自由:鹵基、烷基、烯基、環烷基、芳基、芳基胺基(arylamine group)、烷基胺基(alkylamine group)、咔唑基、茀基(fluorenyl group)、腈基、及包括一個或多個N、O及S原子之雜環基所組成之群組。 The styrenic compound according to claim 1, wherein R5 is hydrogen, hydrogen, or an acrylate group which is unsubstituted or substituted by one or more substituents selected from the group consisting of: a halogen group, an alkane Base, alkenyl, cycloalkyl, An aryl group, an arylamine group, an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic ring including one or more N, O and S atoms. a group consisting of a group, a carbonyl group unsubstituted or substituted by one or more substituents selected from the group consisting of: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine ( An arylamine group), an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic group including one or more N, O, and S atoms, or From one or more unsubstituted or substituted propylene thiol groups selected from: halo, alkyl, alkenyl, cycloalkyl, aryl, arylamine group, alkylamino group A group consisting of an alkylamine group, a carbazolyl group, a fluorenyl group, a nitrile group, and a heterocyclic group including one or more N, O, and S atoms. 如申請專利範圍第1項所述之苯乙烯系化合物,其中,化學式1所表示之苯乙烯系化合物係由以下化學式1-1至1-8中任一者所表示, The styrene-based compound according to the first aspect of the invention, wherein the styrene-based compound represented by Chemical Formula 1 is represented by any one of the following Chemical Formulas 1-1 to 1-8. 如申請專利範圍第1項所述之苯乙烯系化合物,其中,苯乙烯系化合物之最大吸收波長(λmax)為400nm至500nm。 The styrenic compound according to claim 1, wherein the styrene compound has a maximum absorption wavelength (λ max ) of from 400 nm to 500 nm. 如申請專利範圍第1項所述之苯乙烯系化合物,其中,苯乙烯系化合物之吸收光譜為350nm至500nm。 The styrenic compound according to claim 1, wherein the styrene compound has an absorption spectrum of from 350 nm to 500 nm. 一種著色劑,其係包括申請專利範圍第1項至申請專利範圍第9項中任一項之苯乙烯系化合物。 A coloring agent comprising the styrenic compound according to any one of claim 1 to claim 9. 如申請專利範圍第10項所述之著色劑,其中,該著色劑係單獨由該苯乙烯系化合物所組成。 The coloring agent according to claim 10, wherein the coloring agent is composed of the styrene compound alone. 如申請專利範圍第10項所述之著色劑,包括:該苯乙烯系化合物,及一種、兩種、或多種附加著色劑係選自由含有顏料及染料所組成之群組。 The coloring agent according to claim 10, comprising: the styrenic compound, and one, two or more additional colorants are selected from the group consisting of pigments and dyes. 如申請專利範圍第10項所述之著色劑,其中,苯乙烯系化合物及著色劑之分子量的比例係從1:99至99:1。 The coloring agent according to claim 10, wherein the ratio of the molecular weight of the styrene compound and the coloring agent is from 1:99 to 99:1. 一種光阻樹脂組合物,其包括申請專利範圍第10項之著色劑。 A photoresist resin composition comprising the coloring agent of claim 10 of the patent application. 如申請專利範圍第14項所述之光阻樹脂組合物,更包括:一黏著劑樹脂;一多官能基單體;一光起始劑;以及一溶劑。 The photoresist resin composition of claim 14, further comprising: an adhesive resin; a polyfunctional monomer; a photoinitiator; and a solvent. 如申請專利範圍第15項所述之光阻樹脂組合物,其中,基於該光阻樹脂組合物之固體成分的總重量為準,該著色劑之含量為5重量百分比至60重量百分比;該黏著劑樹脂之含量為1重量百分比至60重量百分比;該起始劑之含量為0.1重量百分比至20重量百分比;以及該多官能基單體之含量為0.1重量百分比至50重量百分比。 The photoresist resin composition according to claim 15, wherein the colorant is contained in an amount of 5 to 60% by weight based on the total weight of the solid content of the photoresist resin composition; The content of the resin is from 1% by weight to 60% by weight; the content of the initiator is from 0.1% by weight to 20% by weight; and the content of the polyfunctional monomer is from 0.1% by weight to 50% by weight. 如申請專利範圍第15項所述之光阻樹脂組合物,更包括:一種、兩種、或多種添加劑,其係選自由:光聯敏化劑、固化促進劑、黏合促進劑、表面活性劑、抗氧化劑、熱聚合抑製劑、紫外線吸收劑、分散劑、及調平劑(leveling agent)所組成之群組。 The photoresist resin composition according to claim 15, further comprising: one, two or more additives selected from the group consisting of: a light sensitizer, a curing accelerator, a adhesion promoter, a surfactant A group consisting of an antioxidant, a thermal polymerization inhibitor, a UV absorber, a dispersant, and a leveling agent. 如申請專利範圍第17項所述之光阻樹脂組合物,其中,基於該光阻樹脂組合物之固體成分的總重量為準,該該添加劑之含量為0.1重量百分比至20重量百分比。 The photoresist resin composition according to claim 17, wherein the additive is contained in an amount of from 0.1% by weight to 20% by weight based on the total mass of the solid content of the resist resin composition. 一種光敏材料,其係由申請專利範圍第14項之光阻樹脂組合物所製備而成。 A photosensitive material prepared by the photoresist resin composition of claim 14 of the patent application. 一種彩色濾光片,其係包括申請專利範圍第19項之光敏材料。 A color filter comprising the photosensitive material of claim 19 of the patent application. 如申請專利範圍第20項所述之彩色濾光片,其中該彩色濾光片係包括紅色圖案、綠色圖案、藍色圖案、及黑矩陣。 The color filter of claim 20, wherein the color filter comprises a red pattern, a green pattern, a blue pattern, and a black matrix. 一種顯示裝置,其係包括申請專利範圍第21項之彩色濾光片。 A display device comprising the color filter of claim 21 of the patent application.
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