TWI679200B - Xanthene-based compound, photosensitive resin composition, photoresist, color filter, and display device comprising the same - Google Patents

Abstract

This specification provides a compound represented by Chemical Formula 1 and a photosensitive resin composition including the same, a photosensitive material, a color filter, and a display device.

Description

Dibenzopiperans and photosensitive resin group including the same Product, photosensitive material, color filter and display device

This application claims the benefit of the filing date of Korean Patent Application No. 10-2018-0039901 filed with the Korean Patent Office on April 5, 2018, and incorporates the entire content into this specification.

This application claims the benefit of the filing date of Korean Patent Application No. 10-2018-0135250 filed with the Korean Patent Office on November 6, 2018, and incorporates the entire content into this specification.

The present specification relates to a dibenzopiperan compound and a photosensitive resin composition including the same. In addition, the present specification relates to a photosensitive material manufactured using the photosensitive resin composition, a color filter, and a display device including the color filter.

Recently, a color filter is required to be characterized by high brightness and high contrast ratio. In addition, one of the main goals of display device development The improvement in display element performance brought about by the improvement and the improvement in productivity in manufacturing steps.

Previously, the type of pigment used as a coloring material of a color filter exists in a color photoresist in a dispersed state of particles, so it is difficult to adjust brightness and contrast ratio by adjusting the size and distribution of pigment particles. In the case of pigment particles, aggregation in a color filter reduces solubility and dispersibility, and causes multiple scattering of light due to aggregation of large particles. The scattering of such polarized light becomes the main cause of the decrease in contrast ratio. Efforts are being made to improve brightness and contrast ratios by ultra-micronization and dispersion stabilization of pigments, but the degree of freedom in selecting coloring materials to achieve color coordinates for high-color purity display devices is limited. In addition, a pigment dispersion method using a developed coloring material, particularly a pigment, has reached a limit in terms of improving the color purity, brightness, and contrast ratio of a color filter using the color filter.

Therefore, it is required to develop a novel coloring material that improves color purity to improve color reproduction, brightness, and contrast ratio.

The present inventors and others provide a dibenzopiperan compound having a novel structure, a photosensitive resin composition including the same, a photosensitive material manufactured using the photosensitive resin composition, a color filter, and the color Filter display device.

An embodiment of the present specification provides a compound represented by the following Chemical Formula 1. Thing.

In the chemical formula 1, L1 and L2 are the same or different from each other, and are independently substituted or unsubstituted alkylene groups, R1 and R2 are the same or different from each other, and are each independently a dianhydride group containing a nitrogen atom, R3 And R4 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, and R5 to R12 are the same or different from each other, and are independently selected from hydrogen, deuterium, and halogen Group, -OH, -SO ₃ H, -SO ₃ M, -SO ₂ NM1M2, -SO ₂ NHY, -COOH, substituted or unsubstituted alkyl group, substituted or unsubstituted cycloalkyl group, In the group consisting of substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, R13 to R17 the same or different, are each independently hydrogen, deuterium, ^{_{halogen, -OH, -SO 3 -, -SO}} 3 H, -SO 3 M, -SO 2 NM1M2, -SO 2 NHY, -COOH, anionic Group, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or substituted or unsubstituted Substituted heteroaryl, the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, and the M1, M2, and Y are the same or different from each other, Each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group, at least one of the R13 to R17 One is an anionic group, X is an anionic group, a is 0 or 1, and r5 and r6 are integers of 0 to 4. When r5 is 2 or more, R5 is the same or different from each other, and when r6 is 2 or more In the following, R6 is the same or different from each other.

One embodiment of the present specification provides a photosensitive resin composition including the compound represented by the chemical formula 1, a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent.

An embodiment of the present specification provides a photosensitive material manufactured using the photosensitive resin composition.

An embodiment of the present specification provides a color filter including the photosensitive material.

An embodiment of the present specification provides a display device including the color filter.

The compound according to an embodiment of the present specification can be used as a coloring material in a photosensitive resin composition, and can reduce the dispersing step due to its solubility in organic solvents. This is different from the case where a dispersing step must be performed when a previous pigment is applied The compound can be used as a coloring material in an economical method. In addition, by reducing the fluorescence intensity, the contrast ratio can be increased without adding a dye.

In addition, a dibenzopiperan compound according to an embodiment of the present specification can be used as a coloring material, and color reproduction, brightness, and contrast ratio can be improved.

FIG. 1 is a diagram showing the detected fluorescence intensity of a substrate manufactured using compounds of Examples and Comparative Examples, which are part of the present specification.

FIG. 2 is a view showing a visual sense of a compound according to an embodiment of the present specification.

FIG. 3 is a diagram showing the transmittance of a substrate manufactured using compounds of Examples and Comparative Examples, which are part of the present specification.

Hereinafter, this specification will be described in more detail.

In this specification, when a certain component is “on” another component, the case includes not only a case where a certain component is in contact with another component, but also a case where there are other components between the two components.

In this specification, when a certain element is "included" in a certain part, as long as there is no particularly contrary description, the above-mentioned situation means that other constituent elements may be further included and other constituent elements are not excluded.

According to an aspect of the present specification, a compound represented by the chemical formula 1 is provided.

The present invention has excellent solubility in an organic solvent by including the compound represented by the chemical formula 1. Specifically, regarding the chemical formula 1, a nitrogen-substituted aryl group of a dibenzopiperan (Xanthene) structure is substituted with a substituent including sulfur (S), and includes a bulk as large as a dianhydride group including a nitrogen atom. , Which can increase the solubility in organic solvents.

In addition, with respect to the chemical formula 1, the nitrogen-substituted aryl group of the dibenzopiperan structure is substituted with a substituent containing sulfur (S), compared with the case where it is substituted with a substituent containing no sulfur (S). In other words, the fluorescence intensity is reduced, and an excellent contrast ratio can be obtained without adding an additional dye.

The increase in the solubility can prevent the aggregation between the coloring materials and reduce the amount of material required for dispersion of the coloring materials, thereby improving the economy.

In addition, it can improve the contrast ratio (CR) and can have excellent heat resistance. In order to reduce the light emission (fluorescence or phosphorescence) of a molecule, there are methods for reducing the planarity within the molecule or introducing a molecule that absorbs light. When a molecule that absorbs light is introduced, it is difficult to selectively absorb only light of a light-emitting wavelength because all of the light of the molecule that emits light and external light are absorbed. So in order to make points The planarity within the daughter is reduced and a bulky group having a large steric hindrance is introduced.

If a molecule that absorbs light in the ground state and becomes an excited state moves energy through vibration mode or rotation mode, it causes non-radiative attenuation. decay). That is, light emission can be reduced.

The greater the planarity, the more difficult non-radiative attenuation and the greater the intensity of light emission. The larger the substituent is introduced and the flat area is reduced, the more non-radiative attenuation can be used to reduce the intensity of light emission. For non-radiative attenuation, long-length alkyl groups, branched alkyl groups, alkoxy groups, and amine groups can be introduced. However, in the case of an alkyl group, there is a disadvantage that heat resistance is insufficient.

Furthermore, in the case of an alkoxy group and an amine group, it can function as an electron donating group and change the absorption wavelength of a molecule that absorbs light.

In contrast, when a molecule containing sulfur (S) is introduced, the effect of an electron donating group on a molecule that absorbs light is reduced, and heat resistance can be maintained.

When a sulfur atom having a larger atomic size than that of carbon, nitrogen, and oxygen is introduced, the energy of the excited molecule moves to a sulfur atom having a plurality of energy levels, and a variety of sulfur atoms are moved while moving. Energy level, that is, one side may cause non-radiative decay while moving by vibration mode or rotation mode. With the characteristics, When a sulfur atom is introduced, the intensity of light emission in the molecule can be reduced.

When a molecule having light emission is applied to a liquid crystal display (Liquid Crystal Display, LCD), a problem such as a decrease in a contrast ratio (CR) may be caused, which may result in a decrease in quality. Therefore, various studies have been conducted on methods for reducing light emission.

At present, in order to suppress a decrease in the contrast ratio (CR), molecules that absorb light are introduced. However, a decrease in color purity and an increase in the amount of coloring material used will occur.

Examples of the substituents of the compound represented by the chemical formula 1 are described below, but the present invention is not limited thereto.

及

是指與其他取代基或鍵結部鍵結的部位。 In this manual,

and

It refers to a site bonded to another substituent or a bonding site.

In the present specification, the term "substituted or unsubstituted" refers to a group selected from the group consisting of deuterium, halo, nitrile, nitro, -OH, carbonyl, ester, -COOH, amido, and amidine. Radical, anionic radical, alkoxy, alkyl, cycloalkyl, alkenyl, cycloalkenyl, aralkyl, phosphine, sulfonate, amine, aryl, heteroaryl, silyl, boron Group, one or more substituents in the group consisting of one or more heterocyclic groups and anionic groups containing one, N, O, S or P atoms Has any substituent.

In the present specification, an "adjacent" group may refer to a substituent substituted on an atom directly connected to an atom to which the substituent is substituted, and a stereostructure with the substituent. The substituent closest to the upper position or other substituent substituted on the atom to which the substituent is substituted. For example, two substituents substituted at the ortho position in a benzene ring and two substituents substituted on the same carbon in an aliphatic ring can be interpreted as "adjacent" groups to each other.

In the present specification, when adjacent groups may be bonded to form a "ring", the ring refers to an aromatic ring or an aliphatic ring. Specifically, the ring may be an aromatic ring, and may be an aryl group or a heteroaryl group. As the aryl group and the heteroaryl group, descriptions to be described later can be applied.

Examples of the halogen group in this specification are: fluorine, chlorine, bromine or iodine.

In the present specification, the carbonyl group may be represented by -COR, and the R may be hydrogen, deuterium, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, or a substituted or unsubstituted group. Aryl. The carbon number of the carbonyl group is not particularly limited, and it is preferably one having 1 to 30 carbon numbers. Specifically, the compound may be a compound having the following structure, but is not limited thereto.

In this specification, the ester group may be represented by -COOR, and R may be Hydrogen, deuterium, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, or substituted or unsubstituted aryl. In the ester group, the oxygen of the ester group may be substituted by a linear, branched or cyclic alkyl group having 1 to 25 carbon atoms, or an aryl group having 6 to 30 carbon atoms. Specifically, although it may be a compound of the following structural formula, it is not limited to this.

In this specification, the carbon number of a fluorene imino group is not specifically limited, It is preferable that it is a carbon number of 1-30. Specifically, it may be a compound having a structure such as the following, but it is not limited thereto.

In the present specification, in the amidino group, the nitrogen of the amidino group may be substituted by hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, or an aryl group having 6 to 30 carbon atoms. Specifically, although it may be a compound of the following structural formula, it is not limited to this.

In the present specification, the phosphine group refers to an alkylphosphino group or an arylphosphino group, and the alkylphosphino group refers to a phosphine group substituted with an alkyl group. The carbon number of the alkylphosphine group is not particularly limited, and an alkylphosphine group of 1 to 20 is preferred. Examples of the alkylphosphino group include dimethylphosphino, diethylphosphino, di-n-propylphosphino, diisopropylphosphino, di-n-butylphosphino, di-second Butylphosphino, di-tertiary butylphosphino, diisobutylphosphino, tertiary butyl isopropylphosphino, di-n-hexylphosphino, di-n-octylphosphino, di-n-methyl But not limited to these. The arylphosphino refers to a aryl substituted phosphine. The carbon number of the arylphosphine group is not particularly limited, and an arylphosphine group of 6 to 30 is preferred. Examples of the arylphosphino group include, but are not limited to, diphenylphosphino, dibenzylphosphino, methylphenylphosphino, benzylhexylphosphino, bistrimethylsilylphosphino, and the like In that.

In this specification, the anionic group has a chemical bond with the structure of Chemical Formula 1, and the chemical bond may represent an ionic bond. The anionic group is not particularly limited, and for example, US Patent No. 7,939,644, Japanese Patent Laid-Open No. 2006-003080, Japanese Patent Laid-Open No. 2006-001917, and Japanese Patent Laid-Open No. 2005-159926 can be applied. No., Japanese Patent Laid-Open No. 2007-7028897, Japanese Patent Laid-Open No. 2005-071680, Korean Application Laid-Open No. 2007-7000693, Japanese Patent Laid-Open No. 2005-111696, and Japanese Patent Laid-Open No. 2008-249663 An anion described in Japanese Patent Laid-Open No. 2014-199436.

Specific examples of the anionic group include trifluoromethanesulfonate anion, bis (trifluoromethylsulfonyl) sulfonium anion, bistrifluoromethanesulfonimide anion, and bisperfluoroethylsulfonimide anion. , tetraphenyl borate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tri - trifluoromethanesulfonic methide _{^{acyl, SO 3 -, CO 2 -}} , SO ₂ N ^- SO ₂ CF ₃ , SO ₂ N ^- SO ₂ CF ₂ CF ₃ , and a halogen group such as a fluoro group, an iodo group, and a chloro group are not limited thereto.

In this specification, an anionic group may have an anion by itself, or may exist in the form of a compound with other cations. Therefore, depending on the number of substituted anionic groups, the total of the overall charge of the compound molecule of the present invention may vary. For example, if the chemical formula 1 includes an ammonium structure, the one ammonium structure has a cation, so the total of the overall charge of the molecule may have a value corresponding to the value obtained by subtracting 1 from the number of substituted anionic groups. Values up to 0 for anions.

In this specification, the alkoxy group may be a straight chain or a branched chain, and the number of carbons is not particularly limited, and may be 1 to 30, specifically 1 to 20, and further specifically 1 to 10.

In the present specification, the alkyl group may be a straight chain or a branched chain, and the number of carbons is not particularly limited, but is preferably 1 to 60. According to an embodiment, the carbon number of the alkyl group is 1-30. According to another aspect, the carbon number of the alkyl group is 1-20. According to yet another implementation In one aspect, the carbon number of the alkyl group is 1 to 10. Specific examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, third butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, etc. But it is not limited to these. In the present specification, the cycloalkyl group is not particularly limited, but preferably one having 3 to 30 carbon atoms. Particularly preferred are cyclopentyl and cyclohexyl, but they are not limited to these.

In the present specification, the cycloalkyl group is not particularly limited, but preferably one having 3 to 60 carbon atoms. According to one embodiment, the carbon number of the cycloalkyl group is 3 to 30 carbon atoms. According to another aspect, the carbon number of the cycloalkyl group is 3-20. According to still another aspect, the carbon number of the cycloalkyl group is 3 to 6. Specific examples include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl, but are not limited to these.

In the present specification, the alkenyl group may be a straight chain or a branched chain, and the number of carbon atoms is not particularly limited, but is preferably 2 to 60. According to an embodiment, the carbon number of the alkenyl group is 2-30. According to another aspect, the carbon number of the alkenyl group is 2-20. According to another aspect, the carbon number of the alkenyl group is 2-10. Specific examples of the alkenyl group are preferably an alkenyl group substituted with an aryl group, such as a stylbenyl group and a styrenyl group, but are not limited thereto.

In the present specification, the cycloalkenyl group is not particularly limited, and it is preferably one having 3 to 60 carbon atoms. According to one embodiment, the cycloalkenyl group has 3 to 30 carbon atoms. According to another aspect, the carbon number of the cycloalkenyl group is 3-20. According to another aspect, the carbon number of the cycloalkenyl group is 3 to 6. Examples of cycloalkenyl are preferably cyclopentenyl and cyclohexenyl, but they are not limited thereto.

基、茀基等，但並不限定於該些。 In this specification, the aryl group is not particularly limited, but preferably one having 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to an embodiment, the carbon number of the aryl group is 6-30. According to an embodiment, the carbon number of the aryl group is 6-20. Regarding the aryl group, the monocyclic aryl group may be a phenyl group, a biphenyl group, a bitriphenyl group, and the like, but is not limited thereto. The polycyclic aryl group may be naphthyl, anthracenyl, indenyl, phenanthryl, fluorenyl, fluorenyl, triphenyl,

But not limited to these.

、

等螺環茀 基、

(9,9-二甲基茀基)及

(9,9-二苯基茀基)等經取代的茀基。但是，並不限定於此。 In this specification, a fluorenyl group may be substituted, and two substituents may be bonded to each other to form a spiro ring structure. In the case where the fluorenyl group is substituted, it may be

,

Isospiro ring,

(9,9-dimethylfluorenyl) and

(9,9-diphenylfluorenyl) and other substituted fluorenyl groups. However, it is not limited to this.

In the present specification, the aralkyl group may be specifically that the aryl part has 6 to 30 carbons, and the alkyl part has 1 to 30 carbons. Specific examples include benzyl, p-methylbenzyl, m-methylbenzyl, p-ethylbenzyl, m-ethylbenzyl, 3,5-dimethylbenzyl, α-methylbenzyl, α , α-dimethylbenzyl, α, α-methylphenylbenzyl, 1-naphthylbenzyl, 2-naphthylbenzyl, p-fluorobenzyl, 3,5-difluorobenzyl, α, α-Di-trifluoromethylbenzyl, p-methoxybenzyl, m-methoxybenzyl, α-phenoxybenzyl, α-benzyloxybenzyl, naphthylmethyl, naphthylethyl Methyl, naphthylisopropyl, pyrrolylmethyl, pyrrolylethyl, aminobenzyl, nitrobenzyl, cyanobenzyl, 1-hydroxy-2-phenylisopropyl, 1-chloro-2 -Phenyl isopropyl and the like, but are not limited to these.

In the present specification, the heterocyclic group includes O, N or S as a heterogeneous species. The number of carbon atoms of the heterocyclic group is not particularly limited, but is 2 to 30 carbon atoms, specifically 2 to 20 carbon atoms. Examples of heterocyclic groups are: thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, triazolyl, pyridyl, bipyridyl, triazinyl, acridinyl, Pyridazinyl, quinolinyl, isoquinolinyl, indolyl, carbazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzocarbazolyl, benzothienyl, diphenyl A benzothienyl group, a benzofuranyl group, a dibenzofuranyl group, etc. are not limited to these.

In this specification, as for the heteroaryl group, in addition to being aromatic, the description related to the heterocyclic group can be applied.

In this specification, a silane group may be represented by a chemical formula of -SiZ1Z2Z3, and the Z1, Z2, and Z3 may be hydrogen, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, respectively. Specifically, the silyl group includes: Trimethylsilyl (TMS), triethylsilyl, third butyldimethylsilyl, vinyldimethylsilyl, propyldimethyl Silyl, triphenylsilyl, diphenylsilyl, phenylsilyl, and the like are not limited to these.

In the present specification, the alkylsulfonic acid group includes, but is not limited to, a methylsulfonic acid group, an ethylsulfonic acid group, a propylsulfonic acid group, and a butylsulfonic acid group. As the alkyl group in the alkylsulfonic acid oxy group, the description related to the alkyl group can be applied.

In this specification, a boron group may be represented by a chemical formula of -BW4W5, and W4 and W5 may be hydrogen, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, respectively. Specifically, the boron group includes a trimethylboryl group, a triethylboryl group, a third butyldimethylboryl group, a triphenylboryl group, a phenylboryl group, and the like, but is not Limited to these.

In this specification, an acrylfluorenyl group means a photopolymerizable unsaturated group, For example, a (meth) acrylfluorenyl group is mentioned, It is not limited to this.

In this specification, an acrylate group means a photopolymerizable unsaturated group, For example, a (meth) acrylate group is mentioned, It is not limited to this.

In the present specification, "(meth) acrylfluorenyl" means at least one selected from the group consisting of acrylfluorenyl and methacrylfluorenyl. The expression "(meth) acrylate" has the same meaning.

In this specification, an ether group may be represented by -COR. The R is a substituted or unsubstituted alkyl group. The description of the alkyl group can be applied to the alkyl group.

In the present specification, the sulfonate group may be an alkylsulfonate group or an arylsulfonate group. The "alkyl" may be applied to the description related to the alkyl group, and the "aryl" may be applied to the description related to the aryl group.

In this specification, the amine group may be selected from the group consisting of -NH ₂ , alkylamino, N-alkylarylamino, arylamino, N-arylheteroarylamine, and N-alkylheteroarylamine. The number of carbon atoms in the group consisting of a group and a heteroarylamino group is not particularly limited, but is preferably 1 to 30. Specific examples of the amino group include methylamino group, dimethylamino group, ethylamino group, diethylamino group, phenylamino group, naphthylamino group, biphenylamino group, anthracenylamino group, 9-methyl-anthrylamido, diphenylamino, N-phenylnaphthylamino, xylylamino, N-phenyltolylamino, triphenylamino, N-phenyl Biphenylamino, N-phenylnaphthylamino, N-biphenylnaphthylamino, N-naphthylfluorenylamino, N-phenylphenanthrylamino, N-biphenylphenanthryl Amino group, N-phenylfluorenylamino group, N-phenylbitriphenylamino group, N-phenanthrylamino group, N-biphenylfluorenylamino group, etc., but it is not limited to these .

In this specification, the carbon number of a dianhydride group containing a nitrogen atom is not particularly limited, but may be 4 to 30, specifically 4 to 20, and more specifically 4 to 15.

In the present specification, an alkylene group refers to a group having two bonding positions on an alkane. The alkylene group may be linear, branched, or cyclic. The number of carbon atoms of the alkylene group is not particularly limited, and is, for example, 1 to 30 carbon atoms, specifically 1 to 20 carbon atoms, and more specifically 1 to 10 carbon atoms.

In the present specification, a heteroalkyl group refers to a group having two bonding positions on an alkane containing O, N, or S as a hetero atom. The heteroalkyl group may be linear, branched, or cyclic. The number of carbon atoms of the heteroalkyl group is not particularly limited, and is, for example, 2 to 30 carbon atoms, specifically 2 to 20 carbon atoms, and more specifically 2 to 10 carbon atoms.

In the present specification, an arylene group refers to a divalent group having two bonding positions on the aryl group. With regard to these groups, in addition to the divalent groups, the description of the aryl group can be applied.

In the present specification, a heteroaryl group refers to a divalent group having two bonding positions on the heteroaryl group. With regard to these groups, in addition to the divalent groups, the description of the heteroaryl group can be applied.

In one embodiment of the present specification, the L1 and L2 are the same or different from each other, and are each independently a substituted or unsubstituted linear or branched alkylene.

In one embodiment of the present specification, L1 and L2 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 30 carbon atoms.

In one aspect of the present specification, L1 and L2 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 20 carbon atoms.

In one embodiment of the present specification, L1 and L2 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 10 carbon atoms.

In an embodiment of the present specification, L1 and L2 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted methylene group, a substituted or unsubstituted ethylene group, or a substituted group. Or unsubstituted propylene, or substituted or unsubstituted butyl.

In one embodiment of the present specification, L1 and L2 of the chemical formula 1 are the same or different from each other, and are each independently a methylene group, an ethylidene group, a propylidene group, or a butylene group.

In one embodiment of the present specification, R1 and R2 of the chemical formula 1 are the same as or different from each other, and are each independently a dianhydride group containing a nitrogen atom having 4 to 30 carbon atoms.

In an embodiment of the present specification, R1 and R2 of the chemical formula 1 are the same or different from each other, and are each independently a dianhydride group containing a nitrogen atom having 4 to 20 carbon atoms.

In an embodiment of the present specification, R1 and R2 of the chemical formula 1 are the same or different from each other, and are each independently a dianhydride group containing a nitrogen atom having 4 to 15 carbon atoms.

In an embodiment of the present specification, the dianhydride group containing a nitrogen atom may be It is represented by any of the following substituents.

表示與所述化學式1連結的部位，X1、X2及Y1~Y3相互相同或不同，分別獨立地為氫、重氫、鹵素基、硝基、-OH、-SO₃H、-COOH、膦基、陰離子性基、經取代或未經取代的烷基、或者經取代或未經取代的芳基，或者鄰接的基鍵結而形成經取代或未經取代的環。 In the substituent,

X1, X2, and Y1 to Y3 are the same or different from each other, and are independently hydrogen, deuterium, halogen, nitro, -OH, -SO ₃ H, -COOH, and phosphine , Anionic groups, substituted or unsubstituted alkyl groups, or substituted or unsubstituted aryl groups, or adjacent groups are bonded to form a substituted or unsubstituted ring.

In one embodiment of the present specification, X1 and X2 may be bonded to each other to form a substituted or unsubstituted ring.

In an embodiment of the present specification, X1 and X2 may be bonded to each other to form a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring.

In an embodiment of the present specification, X1 and X2 may be bonded to each other to form a benzene ring substituted with -SO ₃ M or -SO ₂ NHY or unsubstituted or substituted with -SO ₃ M or -SO ₂ NHY Or an unsubstituted naphthalene ring, the M and Y are as defined in the chemical formula 1.

In an embodiment of the present specification, the X1 and X2 may be bonded to each other to form a benzene ring substituted with -SO ₃ M or -SO ₂ NHY or unsubstituted or substituted with -SO ₃ M or -SO ₂ NHY Or an unsubstituted naphthalene ring, the M is selected from the group consisting of hydrogen, Na, K, Rb, Cs, Fr, and a compound containing an ammonium structure, and the Y is a substituted or unsubstituted alkyl group .

In an embodiment of the present specification, X1 and X2 may be bonded to each other to form a benzene ring substituted with -SO ₃ M or -SO ₂ NHY or unsubstituted or substituted with -SO ₃ M or -SO ₂ NHY Or an unsubstituted naphthalene ring, the M is selected from the group consisting of hydrogen, Na, K, Rb, Cs, Fr, and a compound containing an ammonium structure, and the Y is a substituted or unsubstituted n-hexyl group .

In an embodiment of the present specification, X1 and X2 may be bonded to each other to form a benzene ring substituted with -SO ₃ M or -SO ₂ NHY or unsubstituted or substituted with -SO ₃ M or -SO ₂ NHY Or an unsubstituted naphthalene ring, the M is selected from the group consisting of hydrogen, Na, K, Rb, Cs, Fr, and a compound containing an ammonium structure, and the Y is an ethyl-substituted n-hexyl group.

In one embodiment of the present specification, the Y1 and Y2 and the Y2 and Y3 may be bonded to form a substituted or unsubstituted ring.

In one embodiment of the present specification, the Y1 and Y2 and the Y2 and Y3 may be bonded to form a substituted or unsubstituted benzene ring.

In an embodiment of the present specification, the Y1 and Y2 and the Y2 and Y3 may be bonded to form a benzene ring substituted or unsubstituted by -SO ₃ M or -SO ₂ NHY. The M and Y are as described above. As defined in Chemical Formula 1.

In an embodiment of the present specification, the Y1 and Y2 and Y2 and Y3 may be bonded to form a benzene ring substituted or unsubstituted by -SO ₃ M or -SO ₂ NHY, and the M is selected from the group consisting of Na ⁺ , In the group consisting of K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, the Y is a substituted or unsubstituted alkyl group.

In an embodiment of the present specification, the Y1 and Y2 and Y2 and Y3 may be bonded to form a benzene ring substituted or unsubstituted by -SO ₃ M or -SO ₂ NHY, and the M is selected from the group consisting of Na ⁺ , In the group consisting of K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, the Y is a substituted or unsubstituted n-hexyl group.

In an embodiment of the present specification, the Y1 and Y2 and Y2 and Y3 may be bonded to form a benzene ring substituted or unsubstituted by -SO ₃ M or -SO ₂ NHY, and the M is selected from the group consisting of Na ⁺ , In the group consisting of K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, the Y is an ethyl-substituted n-hexyl group.

In one embodiment of the present specification, the dianhydride group containing a nitrogen atom may be represented by any one of the following substituents.

表示與所述化學式1連結的部位，X3~X5及Y4相互相同或不同，分別獨立地為氫、重氫、鹵素基、硝基、-OH、-SO₃H、-SO₃M、-SO₂NHY、-COOH、膦基、陰離子性基、經取代或未經取代的烷基、或者經取代或未經取代的芳基， 所述M及Y如所述化學式1中所定義般，x3為0~4的整數，x4、x5及y4為0~6的整數。 In the substituent,

X3 ~ X5 and Y4 are the same or different from each other, and are independently hydrogen, deuterium, halogen, nitro, -OH, -SO ₃ H, -SO ₃ M, -SO ₂ NHY, -COOH, phosphine, anionic group, substituted or unsubstituted alkyl group, or substituted or unsubstituted aryl group, the M and Y are as defined in the chemical formula 1, x3 It is an integer from 0 to 4, and x4, x5, and y4 are integers from 0 to 6.

表示與所述化學式1連結的部位，X3~X5及Y4相互相同或不同，分別獨立地為氫、-SO₃M或-SO₂NHY，所述M及Y如所述化學式1中所定義般，x3為0~4的整數，x4、x5及y4為0~6的整數。 In the substituent,

X3 to X5 and Y4 are the same or different from each other, and are independently hydrogen, -SO ₃ M or -SO ₂ NHY, and M and Y are as defined in the chemical formula 1 , X3 is an integer from 0 to 4, and x4, x5, and y4 are integers from 0 to 6.

In an embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms or a substituted group having 6 to 30 carbon atoms. Or unsubstituted aryl.

In an embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms or a substituted group having 6 to 20 carbon atoms. Or unsubstituted aryl.

In an embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are independently a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted group having 6 to 20 carbon atoms Or unsubstituted aryl.

In one embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are each independently a substituted or unsubstituted methyl group or a substituted or unsubstituted phenyl group.

In one embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are each independently a methyl group, a methyl group substituted with a halogen group, or a phenyl group.

In one embodiment of the present specification, R3 and R4 of the chemical formula 1 are the same or different from each other, and are each independently a methyl group, a trifluoromethyl group (-CF ₃ ), or a phenyl group.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently selected from the group consisting of hydrogen, deuterium, halogen, nitro, hydroxyl, -COR, -COOR, and imino , Amido group, anionic group, substituted or unsubstituted alkoxy group with 1 to 30 carbon atoms, substituted or unsubstituted alkyl group with 1 to 30 carbon atoms, substituted with 3 to 30 carbon atoms Or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl with 2 to 30 carbons, substituted or unsubstituted cycloalkenyl with 3 to 30 carbons, substituted or unsubstituted sulfo Acid ester group, substituted or unsubstituted amine group having 1 to 30 carbon atoms, substituted or unsubstituted aryl group having 6 to 30 carbon atoms, and substituted or unsubstituted heterocyclic group having 2 to 30 carbon atoms In the group of aryl groups, The R is hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms, or a substituted or unsubstituted group having 6 to 30 carbon atoms. Substituted aryl.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are independently selected from the group consisting of hydrogen, deuterium, halogen, -OH, -SO ₃ H, -SO ₃ M, and -SO. ₂ NM1M2, -SO ₂ NHY, -COOH, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted ring In the group consisting of alkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and In the group consisting of compounds containing an ammonium structure, the M1, M2, and Y are the same or different from each other, and are each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and A group of substituted or unsubstituted heteroaryl groups.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a substituted or unsubstituted alkyl group, and the Y is a substituted Or unsubstituted alkyl.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, The Y is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, The Y is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, The Y is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a substituted or unsubstituted methyl group, and the Y is a carbon atom. 1 to 10 carbon substituted or unsubstituted hexyl.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or a halogen-substituted or unsubstituted methyl group, and Y is Ethyl substituted or unsubstituted hexyl.

In an embodiment of the present specification, R5 to R12 of the chemical formula 1 are the same or different from each other, and are each independently hydrogen, -SO ₂ NHY, or trifluoromethyl (-CF ₃ ), and Y is an ethyl group. Substituted hexyl.

In an embodiment of the present specification, R5 of the chemical formula 1 is hydrogen or trifluoromethyl.

In one embodiment of the present specification, R6 in Chemical Formula 1 is hydrogen, -SO ₂ NHY, or trifluoromethyl, and Y is a hexyl group substituted with ethyl.

In one embodiment of the present specification, R7 in Chemical Formula 1 is hydrogen.

In one embodiment of the present specification, R8 in Chemical Formula 1 is hydrogen.

In one embodiment of the present specification, R9 of the chemical formula 1 is hydrogen.

In one embodiment of the present specification, R10 of the chemical formula 1 is hydrogen.

In one embodiment of the present specification, R11 of the chemical formula 1 is hydrogen.

In one embodiment of the present specification, R12 of the chemical formula 1 is hydrogen.

Further, an embodiment aspect of the present specification, R13 ~ R17 the same or different, are each independently hydrogen, deuterium, ^{_{halogen, -OH, -SO 3 -, -SO}} 3 H, -SO 3 M, - SO ₂ NM1M2, -SO ₂ NHY, -COOH, anionic group, substituted or unsubstituted alkyl group, substituted or unsubstituted cycloalkyl group, substituted or unsubstituted aryl group, or substituted Or unsubstituted heteroaryl, the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, and the M1, M2, and Y are the same as each other Or different, each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group, the R13 to R17 At least one of them is an anionic group.

An embodiment aspect of the present specification, R13 ~ R17 the same or different, are each independently hydrogen, -SO ₃ ^-, -SO ₃ M or -SO ₂ NHY, the M and Y are as defined as before, the At least one of R13 to R17 is an anionic group.

An embodiment aspect of the present specification, R13 ~ R17 the same or different, are each independently hydrogen, -SO ₃ ^-, -SO ₃ M or -SO ₂ NHY, the M and Y are as defined as before, the R13 ~ R17 in at least one of -SO ₃ ^-.

An embodiment aspect of the present specification, R13 is -SO ₃ ^-.

In one embodiment of the present specification, R14 is hydrogen.

In an embodiment of the present specification, R15 is hydrogen, -SO ₃ M, or -SO ₂ NHY, and M and Y are as defined above.

In one embodiment of the present specification, R16 is hydrogen.

In one embodiment of the present specification, R17 is hydrogen.

In one embodiment of the present specification, X is an anionic group.

In one embodiment of the present specification, X is a compound selected from the group consisting of a compound containing at least one element selected from the group consisting of tungsten, molybdenum, silicon, and phosphorus and oxygen. Anion; trifluoromethanesulfonate anion, bis (trifluoromethylsulfonyl) sulfonium anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, tetraphenylborate anion , Tetrakis (4-fluorophenyl) borate, Tetrakis (pentafluorophenyl) borate, Tris-trifluoromethanesulfonylmethylate and halogen composition.

An embodiment aspect of the present specification, X may be -SO ₃ ^-.

In addition, in an embodiment of the present specification, r5 and r6 are integers of 0 to 4. When r5 is 2 or more, R5 is the same or different from each other, and when r6 is 2 or more, R6 is the same or different from each other. .

In one embodiment of the present specification, r5 and r6 are integers of 0 to 3. When r5 is 2 or more, R5 is the same or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.

In one embodiment of the present specification, r5 and r6 are integers of 0 to 2. When r5 is 2 or more, R5 is the same or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.

In one embodiment of the present specification, r5 and r6 are 0 or 1.

In one embodiment of the present specification, r5 and r6 are zero.

In one embodiment of the present specification, r5 and r6 are 1.

In an embodiment of the present specification, the chemical formula 1 may be represented by the following structure, the following structure represents an isomer of the chemical formula 1, and the chemical formula 1 represents a representative structure. The so-called isomers are molecules having the same molecular formula but different physical / chemical properties from each other.

In the structure, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1.

The descriptions related to the isomers can be applied to all dibenzopiperan-type dye structures described in this specification.

In an embodiment of the present specification, the -SO ₃ M may represent -SO ₃ ^- formed by ionic bonding or salt bonding with M.

In an embodiment of the present specification, the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, and the compound containing an ammonium structure may include The unit represented by the following chemical formula A or the unit represented by the following chemical formula B.

[Chemical Formula A]

In the chemical formula A, Ra to Rd are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, A substituted or unsubstituted aralkyl group, -L ₁ -NHCO-R or -L ₂ -OCO-R, or two of Ra ~ Rd are bonded to each other to form a substituted or unsubstituted ring, so R is hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, and L ₁ and L ₂ are substituted or unsubstituted Substituted alkylene, in the chemical formula B, Rb ~ Rd are the same or different from each other, and are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted A substituted aryl group, or a substituted or unsubstituted aralkyl group, or two of Rb ~ Rd are bonded to each other to form a substituted or unsubstituted ring, and Z is a substituted or unsubstituted extension group. Alkyl, substituted or unsubstituted arylene, -L ₃ -NHCO-, or -L ₄ -OCO-, where L ₃ and L ₄ are substituted or unsubstituted alkylene, Re ~ Rg The same or different from each other, they are each independently hydrogen or a substituted or unsubstituted alkyl group.

According to an embodiment of the present specification, in the chemical formula A, Ra to Rd are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, and 1 to 30 carbon atoms. Substituted or unsubstituted alkenyl, substituted or unsubstituted aryl having 6 to 30 carbon atoms, substituted or unsubstituted aralkyl having 6 to 30 carbon atoms, -L ₁ -NHCO- R or -L ₂ -OCO-R, or two of Ra ~ Rd are bonded to each other to form a substituted or unsubstituted ring, R is hydrogen, substituted or unsubstituted with 1 to 30 carbon atoms An alkyl group, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 30 carbon atoms, wherein L ₁ and L ₂ are carbon numbers 1 to 30 substituted or unsubstituted alkylene groups, in the chemical formula B, Rb ~ Rd are the same or different from each other, and are each independently hydrogen or substituted or unsubstituted alkyl or carbon having 1 to 30 carbon atoms Substituted or unsubstituted alkenyl having 1 to 30, substituted or unsubstituted aryl having 6 to 30 carbon, or substituted or unsubstituted aralkyl having 6 to 30 carbon, or Two of Rb ~ Rd are bonded to each other to form a substituted or unsubstituted A substituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms, a substituted or unsubstituted alkylene group having 6 to 30 carbon atoms, -L ₃ -NHCO-, or- L ₄ -OCO-, wherein L ₃ and L ₄ are substituted or unsubstituted alkylene groups having 1 to 30 carbon atoms, and Re to Rg are the same or different from each other, and are each independently hydrogen or 1 to 3 carbon atoms 30 substituted or unsubstituted alkyl.

According to an embodiment of the present specification, in the chemical formula A, Ra to Rd are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and 1 to 20 carbon atoms. Substituted or unsubstituted alkenyl, substituted or unsubstituted aryl having 6 to 20 carbon atoms, substituted or unsubstituted aralkyl having 6 to 20 carbon atoms, -L ₁ -NHCO- R or -L ₂ -OCO-R, or two of Ra ~ Rd are bonded to each other to form a substituted or unsubstituted ring, R is hydrogen, substituted or unsubstituted with 1 to 20 carbon atoms An alkyl group, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 20 carbon atoms, wherein L ₁ and L ₂ are carbon numbers 1 to A substituted or unsubstituted alkylene group of 20, in the chemical formula B, Rb ~ Rd are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group, carbon having 1 to 20 carbon atoms, Substituted or unsubstituted alkenyl having 1 to 20, substituted or unsubstituted aryl having 6 to 20 carbons, or substituted or unsubstituted aralkyl having 6 to 20 carbons, or Two of Rb ~ Rd are bonded to each other to form a substituted or unsubstituted A substituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, a substituted or unsubstituted alkylene group having 6 to 20 carbon atoms, -L ₃ -NHCO-, or- L ₄ -OCO-, the L ₃ and L ₄ are substituted or unsubstituted alkylene groups having 1 to 20 carbon atoms, and Re to Rg are the same or different from each other, and are each independently hydrogen or 1 to 3 carbon atoms 20 substituted or unsubstituted alkyl.

In an embodiment of the present specification, the unit refers to a repeated structure in which a single body is included in a polymer, and the unit may be included in a main chain of the polymer to constitute a polymer.

In one embodiment of the present specification, the compound including the unit represented by the chemical formula B may be a polymer.

When the compound containing the unit represented by the chemical formula B is a polymer, the unit represented by the chemical formula B may be included in a range of 1 to 500.

In one embodiment of the present specification, the weight average molecular weight of the compound including the unit represented by the chemical formula B may be 1,000 to 10,000, preferably 3,000 to 8,000, and even more preferably 5,000 to 7,000.

According to an embodiment of the present specification, the terminal of the compound containing the unit represented by the chemical formula B may be hydrogen, a halogen group, or a substituted or unsubstituted alkyl group.

In one embodiment of the present specification, the chemical formula 1 may be represented by the following chemical formula 2.

In the chemical formula 2, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1.

In one embodiment of the present specification, the chemical formula 1 may be represented by the following chemical formula 3.

In the chemical formula 3, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1.

In one embodiment of the present specification, the chemical formula 1 may be represented by the following chemical formula 4.

[Chemical Formula 4]

In the chemical formula 4, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1.

In one embodiment of the present specification, the dianhydride group containing a nitrogen atom in Chemical Formula 1 may be a compound represented by any one of the following substituents.

表示與所述化學式1連結的部位，X1、X2、Y1~Y3相互相同或不同，分別獨立地為氫、重氫、鹵素基、硝基、-OH、-SO₃H、-COOH、膦基、陰離子性基、經取代或未經取代的烷基、或者經取代或未經取代的芳基，或者鄰接 的基可鍵結而形成經取代或未經取代的環。 In the substituent,

X1, X2, Y1 to Y3 are the same as or different from each other, and are each independently hydrogen, deuterium, halogen, nitro, -OH, -SO ₃ H, -COOH, and phosphine , Anionic group, substituted or unsubstituted alkyl group, or substituted or unsubstituted aryl group, or adjacent groups may be bonded to form a substituted or unsubstituted ring.

In one embodiment of the present specification, the compound represented by the chemical formula 1 may be represented by any one of the following chemical formulas.

In the chemical formula, M and Y are as defined in the chemical formula 1.

In an embodiment of the present specification, the unspecified substituent in the substitution position in the ring of the chemical formula means that it may be substituted by any part of the carbon contained in the ring.

中，

是指於經-CF₃取代的苯環中可被取代為除去經-SCH₃取代的碳以外的剩餘的碳中的任一者，具體而言可由下述4個結構表示。 E.g,

in,

The benzene ring substituted with -CF ₃ refers to any of carbons other than the carbon substituted with -SCH ₃ , and can be specifically represented by the following four structures.

中，

是指於經-SO₂NHY取代的萘環中可被取代為萘中所含的碳中的任一者，具體而言可由下述6個結構表示。 As another example, in

in,

The naphthalene ring substituted with -SO ₂ NHY is any of carbons contained in naphthalene, and specifically, it can be represented by the following six structures.

In the six structures, Y is as defined before.

Moreover, according to one aspect of this specification, the coloring material composition containing the said compound can be provided.

The coloring material composition may include at least one of a dye and a pigment in addition to the compound of Chemical Formula 1. For example, the coloring material group The product may include only the compound of Chemical Formula 1, or the compound of Chemical Formula 1 and one or more dyes, or the compound of Chemical Formula 1 and one or more pigments, or the compound of Chemical Formula 1, More than one dye and more than one pigment.

According to an embodiment of the present specification, a photosensitive resin composition including the coloring material composition can be provided.

According to an embodiment of the present specification, the photosensitive resin composition may further include the compound represented by the chemical formula 1, a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent.

The binder resin is not particularly limited as long as it exhibits physical properties such as strength and developability of a film made of a photosensitive resin composition.

The binder resin may be a copolymerized resin of a polyfunctional monomer that imparts mechanical strength and a monomer that imparts alkali solubility, and may further include a binder commonly used in the technical field.

The polyfunctional monomer that imparts mechanical strength to the film may be any one or more of unsaturated carboxylic acid esters, aromatic vinyls, unsaturated ethers, unsaturated sulfonimines, and acid anhydrides.

Specific examples of the unsaturated carboxylic acid esters can be selected from the group consisting of benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, (methyl) ) Butyl acrylate, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, tertiary butyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) Isobornyl acrylate, ethylhexyl (meth) acrylate, (meth) acrylic acid-2- Phenoxyethyl ester, tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloro (meth) acrylate Propyl ester, 4-hydroxybutyl (meth) acrylate, fluorenyl octyloxy-2-hydroxypropyl (meth) acrylate, glycerol (meth) acrylate, (meth) acrylic acid-2 -Methoxyethyl, 3-methoxybutyl (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methyl Oxytripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, p-nonylphenoxy polyethylene glycol (Meth) acrylate, p-nonylphenoxy polypropylene glycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, -1,1 (meth) acrylate , 1,3,3,3-Hexafluoroisopropyl, octafluoropentyl (meth) acrylate, heptafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate, α-hydroxymethyl Methyl acrylate, α-hydroxyethyl methacrylate, α-hydroxypropyl methacrylate, and α-hydroxy Butyl methacrylate, but is not limited to only the plurality.

Specific examples of the aromatic vinyls include free styrene, α-methylstyrene, (o-, m-, p-)-vinyltoluene, (o-, m-, p-)-methoxystyrene, and ( The group consisting of ortho, meta, and para) -chlorostyrene is not limited to these.

Specific examples of the unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ether, and allyl glycidyl ether, but are not limited to these.

Specific examples of the unsaturated fluorene imines can be selected from N-phenylcis butylene diimide, N- (4-chlorophenyl) cis butylene diimide, and N- (4-hydroxybenzene Group), but is not limited to the group consisting of maleimide and N-cyclohexylmaleimide Limited to these.

The acid anhydride includes maleic anhydride, methyl maleic anhydride, tetrahydrophthalic anhydride, and the like, but is not limited to these.

The monomer for imparting alkali solubility is not particularly limited as long as it contains an acid group. For example, it is preferable to use a monomer selected from (meth) acrylic acid, butenoic acid, itaconic acid, maleic acid, and fumaric acid. Diacid, monomethylmaleic acid, 5-norbornene-2-carboxylic acid, phthalic acid mono-2-((meth) acrylfluorenyloxy) ethyl ester, succinic acid mono- One or more members of the group consisting of 2-((meth) acrylfluorenyloxy) ethyl ester and ω-carboxy polycaprolactone mono (meth) acrylate are not limited thereto.

According to an embodiment of the present specification, the acid value of the binder resin is 50 KOHmg / g to 130 KOHmg / g, and the weight average molecular weight is 1,000 to 50,000.

The polyfunctional monomer is a monomer that exhibits a photoresist effect formed by light, and may be specifically selected from propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl Alcohol diacrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxyethanol diacrylate, trihydroxyethyl isocyanurate Group of trimethacrylate, trimethylpropane trimethacrylate, diphenyl pentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, and dipentaerythritol hexamethacrylate One or a mixture of two or more of them.

The photoinitiator is not particularly limited as long as it is an initiator that generates free radicals by light to promote cross-linking. And one of the group consisting of oxime compounds More than that.

The acetophenone-based compounds include 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane- 1-ketone, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenyl ketone, benzoin methyl ether, benzoin ether, benzoin isobutyl ether , Benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholinyl-1-propane-1-one 2-benzyl-2-dimethylamino-1- (4-morpholinylphenyl) -butane-1-one, 2- (4-bromo-benzyl-2-dimethylamino) 1- (4-morpholinylphenyl) -butane-1-one or 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinylpropane-1-one, etc. Is not limited to these.

The biimidazole-based compounds include: 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl)- 4,4 ', 5,5'-tetra (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl)- 4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, etc. Is not limited to these.

The triazine-based compound includes: 3- {4- [2,4-bis (trichloromethyl) -s-triazine-6-yl] phenylthio} propionic acid, 1,1,1,3,3 , 3-hexafluoroisopropyl-3- {4- [2,4-bis (trichloromethyl) -s-triazine-6-yl] phenylthio} propionate, ethyl-2- {4 -[2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 2-epoxyethyl-2- {4- [2,4-bis ( Trichloromethyl) -mesytriazin-6-yl] phenylthio} acetate, cyclohexyl-2- {4- [2,4-bis (trichloromethyl) -mesytriazin-6-yl ] Benzylthio} acetate, benzyl-2- {4- [2,4-bis (trichloromethyl) -mesatriazin-6-yl] phenylthio} acetate, 3- {chloro -4- [2,4-bis (trichloromethyl) -mesytriazin-6-yl] phenylthio} propanoic acid, 3- {4- [2,4-bis (trichloromethyl) -isocyanate Triazine-6-yl] phenylthio} propanamide, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2,4-bis (trichloromethyl) -6- (1-p-dimethylaminobenzene Group) -1,3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, and the like are not limited to these.

The oxime-based compounds include: 1,2-octanedione-1- (4-phenylthio) phenyl-2- (o-benzoyl oxime) (Ciba-Geigy), CGI124), ethyl ketone-1- (9-ethyl) -6- (2-methylbenzylidene-3-yl) -1- (O-acetamidooxime) (CGI242), N-1919 ( ADEKA, etc.) is not limited to these.

The solvent may be one or more selected from the group consisting of acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1, 4-Dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl Ether, chloroform, dichloromethane, 1,2-dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, Hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tertiary butanol, 2-ethoxypropanol, 2-methyl Oxypropanol, 3-methoxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, 3-methoxybutyl acetate, 3-ethoxy Ethyl propionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether are not limited thereto.

In an embodiment of the present specification, based on the total weight of the photosensitive resin composition, the content of the compound represented by the chemical formula 1 is 5% to 60% by weight, and the content of the binder resin is 1% to 60% by weight The content of the photoinitiator is 0.1% to 20% by weight, the content of the polyfunctional monomer is 0.1% to 50% by weight, and the content of the solvent is 10% to 80% by weight.

According to an embodiment of the present specification, a content of the compound represented by the chemical formula 1 is 5 to 60% by weight based on a total weight of solid components in the photosensitive resin composition, and the adhesive The content of the resin is 1% to 60% by weight, the content of the photoinitiator is 0.1% to 20% by weight, and the content of the polyfunctional monomer is 0.1% to 50% by weight.

Specifically, regarding the photosensitive resin composition, based on the total weight of solid components in the photosensitive resin composition, the content of the compound represented by the chemical formula 1 is 5% to 50% by weight. The content of the binder resin is 1% to 50% by weight, the content of the photoinitiator is 0.1% to 10% by weight, and the content of the polyfunctional monomer is 0.1% to 45% by weight. .

The total weight of the solid content refers to the sum of the total weight of the components in the resin composition other than the solvent. The solid content and the basis weight percentage of each component based on the solid content can be measured by a general analysis method used in the art such as liquid chromatography or gas chromatography.

According to an embodiment of the present specification, the photosensitive resin composition may further include an additive.

In an embodiment of the present specification, based on the total weight of the photosensitive resin composition, it may further contain 0.1% to 20% by weight of an additive.

According to another embodiment of the present specification, the photosensitive resin is composed of The total weight of solid components in the substance is used as a reference, and the content of the additive is 0.1% to 20% by weight.

Specifically, based on the total weight of solid components in the photosensitive resin composition, the content of the additive is 0.1% to 10% by weight.

According to an embodiment of the present specification, the photosensitive resin composition additionally includes a member selected from the group consisting of a photocrosslinking sensitizer, a hardening accelerator, an antioxidant, an adhesion promoter, a surfactant, a thermal polymerization inhibitor, and ultraviolet absorption. One or two or more additives in a group consisting of an agent, a dispersant, and a leveling agent.

According to an embodiment of the present specification, the content of the additive is 0.1% to 20% by weight based on the total weight of solid components in the photosensitive resin composition.

According to an embodiment of the present specification, the photosensitive resin composition additionally includes a member selected from the group consisting of a photocrosslinking sensitizer, a hardening accelerator, an adhesion promoter, a surfactant, a thermal polymerization inhibitor, an ultraviolet absorber, and a dispersion. One or two or more additives in the group consisting of an agent and a leveling agent.

According to an embodiment of the present specification, the content of the additive is 0.1% to 20% by weight based on the total weight of solid components in the photosensitive resin composition.

As the photocrosslinking sensitizer, one or more members selected from the group consisting of benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4- Bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl benzoate, 3,3-dimethyl- 4-methoxybenzophenone, 3,3,4,4-tetra (third Butyl peroxide compounds such as benzophenone; benzophenone compounds such as 9-fluorenone, 2-chloro-9-fluorenone, 2-methyl-9-fluorenone; thioanthracene Ketones, 2,4-diethylthiaxanthone, 2-chlorothiaxanthone, 1-chloro-4-propyloxythioxanthone, isopropylthioxanthone, diisopropylthio Thioxanthone compounds such as heteroanthrone; xanthone compounds such as xanthone, 2-methylxanthone; anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, Anthraquinone compounds such as tributylanthraquinone, 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis (9-acridyl) heptane, 1,5 -Acridine compounds such as bis (9-acridylpentane), 1,3-bis (9-acridyl) propane; benzodiazone, 1,7,7-trimethyl-bicyclo [2,2 , 1] Dicarbonyl compounds such as heptane-2,3-dione, 9,10-phenanthrenequinone; 2,4,6-trimethylbenzylidene diphenylphosphine oxide, bis (2,6-di Phosphonium methoxybenzyl) -2,4,4-trimethylpentylphosphine oxide and other phosphine oxide compounds; methyl-4- (dimethylamino) benzoate, ethyl-4- (Dimethylamino) benzoate, 2-n-butoxyethyl-4- (dimethylamino) benzoate, etc. Products; 2,5-bis (4-diethylaminobenzylidene) cyclopentanone, 2,6-bis (4-diethylaminobenzylidene) cyclohexanone, 2,6-bis ( 4-Diethylaminobenzylidene) -4-methyl-cyclopentanone and other amine synergists; 3,3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzylidene-7- (diethylamino) coumarin, 3-benzylidene-7 -Methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H-C1] -benzo Coumarin compounds such as pyrano [6,7,8-ij] -quinazine-11-one; 4-diethylaminochalcone, 4-azidobenzylideneacetophenone, etc. Otoketone compounds; 2-benzylidenemethylene, 3-methyl-b-naphthothiazoline.

The hardening accelerator is used for improving hardening and mechanical strength. Specifically, one or more members selected from the group consisting of the following compounds can be used: 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-4,6-dimethyl Aminopyridine, Pentaerythritol-tetrakis (3-mercaptopropionate), Pentaerythritol-tris (3-mercaptopropionate), Pentaerythritol-tetrakis (2-mercaptoacetate), Pentaerythritol-tris (2-mercaptoacetate) ), Trimethylolpropane-tris (2-mercaptoacetate) and trimethylolpropane-tris (3-mercaptopropionate).

The adhesion promoter used in this specification may be selected from methacrylfluorenyloxypropyltrimethoxysilane, methacrylfluorenyloxypropyldimethoxysilane, and methacrylfluorenyloxypropyl One or more of methacrylfluorenylsilane coupling agents such as triethoxysilane, methacrylmethyloxypropyldimethoxysilane, and the like can be used. The alkyltrimethoxysilane can be obtained from octyltrimethoxysilane. , Dodecyltrimethoxysilane, octadecyltrimethoxysilane, etc., one or more are selected and used.

The surfactant is a silicone-based surfactant or a fluorine-based surfactant. Specifically, the silicone-based surfactant can be used: BYK-077, BYK-085, BYK-Chemie, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK- 333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, etc., fluorine-based surfactants can be used: F-114, F-177, F-410, F-411, F-411 of Dai Nippon Ink & Chemicals 450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF- 1127, TF-1129, TF-1126, TF-1130, TF-1116SF, TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc., but it is not limited to these.

The antioxidant may be one or more selected from the group consisting of a hindered phenol-based antioxidant, an amine-based antioxidant, a sulfur-based antioxidant, and a phosphine-based antioxidant, but is not limited thereto.

Specific examples of the antioxidant include phosphoric acid-based thermal stabilizers such as phosphoric acid, trimethyl phosphate, and triethyl phosphate; 2,6-di-third-butyl-p-cresol, and octadecane 3- (4-hydroxy-3,5-di-tert-butylphenyl) propionate, tetrabis [methylene-3- (3,5-di-tert-butyl-4-hydroxy) Phenyl) propionate] methane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-third-butyl-4-hydroxybenzyl) benzene, 3,5- Diethyl tertiary butyl-4-hydroxybenzyl phosphite, 2,2-thiobis (4-methyl-6-third butylphenol), 2,6-g, t-butyl Phenol 4,4'-butylene-bis (3-methyl-6-third butylphenol), 4,4'-thiobis (3-methyl-6-third butylphenol) or bis [ 3,3-bis- (4'-hydroxy-3'-tert-butylphenyl) butanoic acid] glycol ester (Bis [3,3-bis- (4'-hydroxy-3'-tert-butylphenyl) Hindered phenol such as butanoicacid] glycol ester) is a primary antioxidant; phenyl-α-naphthylamine, phenyl-β-naphthylamine, N, N'-diphenyl-p-phenylenediamine Or N, N'-di-β-naphthyl-p-phenylenediamine, such as amine secondary antioxidants; dilauryl disulfide, dilauryl thiopropionate, distearyl thiopropane Acid ester Mercapto thiazole or tetramethyl thiuram disulfide four pairs [methylene-3- (lauryl-thio) propionate] methane, sulfur (Thio) based Secondary antioxidant; or triphenylphosphite, tri (nonylphenyl) phosphite, triisodecylphosphite, bis (2,4-dibutylphenyl) pentaerythritol diphosphite ( Bis (2,4-dibutylphenyl) Pentaerythritol Diphosphite) or (1,1'-biphenyl) -4,4'-diylbisphosphonic acid tetra [2,4-bis (1,1-dimethylethyl) ) Phenyl] esters ((1,1'-Biphenyl) -4,4'-Diylbisphosphonous acid tetrakis [2,4-bis (1,1-dimethylethyl) phenyl) ester) Oxidant.

The ultraviolet absorber can be used: 2- (3-third butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxybenzophenone, etc., but It is not limited to these, and can be generally used by users in the art.

The thermal polymerization inhibitor may include, for example, one or more members selected from the group consisting of p-anisole, hydroquinone, pyrocatechol, and tert-butylcatechol. (tert-butyl catechol), N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, p-methoxyphenol, di-third-butyl-p-cresol, o-benzene Triphenol, benzoquinone, 4,4-thiobis (3-methyl-6-third butylphenol), 2,2-methylenebis (4-methyl-6-third butylphenol) , 2-mercaptoimidazole and phenothiazine, but are not limited to these, and may include those generally known in the technical field.

The dispersant may be used in a method of internally adding to the pigment or a method of externally adding to the pigment in a state where the pigment is surface-treated in advance. As the dispersant, a compound-type, nonionic, anionic or cationic dispersant can be used, and examples thereof include fluorine-based, ester-based, cationic, anionic, and non-ionic. System, amphoteric surfactant, etc. These can be used individually or in combination of 2 or more types.

Specifically, the dispersant is selected from the group consisting of polyalkylene glycols and their esters, polyoxyalkylene polyols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonate esters, and sulfonate salts. One or more of the group consisting of carboxylic acid esters, carboxylic acid salts, alkylamidoalkylene oxide adducts, and alkylamines, but is not limited thereto.

The leveling agent may be polymeric or non-polymeric. Specific examples of the polymerizable leveling agent include polyethyleneimine, polyamidoamine, a reaction product of an amine and an epoxide. Specific examples of the non-polymeric leveling agent include a non-polymer sulfur compound. And non-polymeric nitrogen-containing compounds, but it is not limited thereto, and can be generally used by users in the art.

According to an aspect of the present specification, a photosensitive material manufactured using the photosensitive resin composition is provided.

In more detail, the photosensitive resin composition of this specification is apply | coated to a base material by an appropriate method, and it hardens | cures to form the photosensitive material of a film or a pattern form.

The coating method is not particularly limited, and a spray method, a roll coating method, a spin coating method, or the like can be used, and a spin coating method is generally widely used. In addition, after forming the coating film, a part of the residual solvent can be removed under reduced pressure as appropriate.

Examples of the light source for curing the photosensitive resin composition of the present specification include mercury vapor arcs (arc), carbon arcs, Xe arcs, and the like that emit light having a wavelength of 250 nm to 450 nm, but are not necessarily limited to these.

The photosensitive resin composition of this specification can be used in a thin film transistor-liquid crystal display (TFT LCD) color filter manufacturing pigment dispersion type photosensitive material, and a thin-film transistor liquid crystal display (TFT LCD). Photosensitive material for black matrix or organic light emitting diode, Photosensitive material for overcoat layer formation, Columnar spacer photosensitive material, Photocurable paint, Photocurable ink, Photocurable adhesive, Printing plate, Printing Among the photosensitive materials for wiring boards, and photosensitive materials for plasma display panels (PDP), the use thereof is not particularly limited.

According to an aspect of the present specification, a color filter including the photosensitive material is provided.

The color filter can be produced using a photosensitive resin composition containing the compound represented by the chemical formula 1. The photosensitive resin composition is coated on a substrate to form a coating film, and the coating film is exposed, developed, and cured to form a color filter.

The photosensitive resin composition according to an embodiment of the present specification is excellent in heat resistance and has little color change due to heat treatment. When manufacturing a color filter, it can provide high color reproducibility, brightness, and contrast when using a hardening process. High color filter.

The substrate may be a glass plate, a silicon wafer, a plate of a plastic substrate such as polyethersulfone (PES), polycarbonate (Polycarbonate, PC), and the like, and the type thereof is not particularly limited.

Specifically, the photosensitive resin composition according to one embodiment of the present specification may be spin-coated on glass (5 × 5 cm ² ) and subjected to prebake at 100 ° C. for 100 seconds to form a film. The interval between the film-formed substrate and a photo mask was set to 250 μm, and the entire surface of the substrate was irradiated with an exposure device at an exposure amount of 40 mJ / cm ² . Thereafter, the exposed substrate is developed in a developing solution (potassium hydroxide (KOH), 0.05%) for 60 seconds, and then subjected to postbake at 230 ° C for 20 minutes to prepare a substrate.

The heat resistance evaluation can be measured by a method described later. With respect to the substrate produced by the above-mentioned one embodiment, a spectroscope was used to obtain a transmittance spectrum in a visible light range of 380 nm to 780 nm. In addition, a prebake substrate was additionally subjected to a postbake for 20 minutes at 230 ° C, and a transmittance spectrum was obtained with the same equipment and measurement range.

The spectroscope may be a manufacturer of MCPD-Otsuka, but is not limited thereto.

The obtained transmittance spectrum and the C light source backlight are used, and the obtained values E (L *, a *, b *) are used to calculate a color change (hereinafter ΔEab). A small ΔEab value indicates excellent color heat resistance. If it has a value of ΔEab <3, it can be used as a pigment for a color filter, and can be called a coloring material excellent in heat resistance. Specifically, the formula for calculating ΔEab is as follows.

[Calculation formula 1] ΔEab (L *, a *, b *) = {(ΔL *) ² + (Δa *) ² + (Δb *) ² } ^1/2

The contrast ratio can be measured by a method described later. With respect to a substrate produced by the substrate manufacturing method, a contrast ratio measuring device was used to place the produced substrate between two polarizing plates, and the brightness when the two polarizing plates were horizontal and the two polarizing plates were measured. For the brightness at the time of crossover, the contrast ratio was calculated using the following calculation formula 2.

[Calculation formula 2] Contrast ratio = Brightness when two polarizers are horizontal / Brightness when two polarizers are vertical

The contrast ratio measuring device may be manufactured by CT-1 or ZOENTECH, but is not limited thereto.

Regarding the fluorescence intensity of the color filter according to an embodiment of the present specification, for the substrate, FS-2 fluorescence measurement equipment from Sinco can be used, and the excitation wavelength is at normal temperature (25 ° C). (Excitation wavelength) was set to 545 nm and emission wavelength (emission wavelength) was set to 560 nm to 720 nm to measure the fluorescence intensity.

The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.

According to another aspect, the color filter may further include an overcoat layer.

Between the color pixels of the color filter, a grid-like black pattern called a black matrix can be arranged for the purpose of improving contrast. The material of the black matrix can use chromium. In this case, a method can be used in which chromium is deposited on the entire glass substrate and a pattern is formed by an etching process. However, considering the high cost of the steps For use, high reflectance of chromium, and environmental pollution caused by chromium waste liquid, a resin black matrix using a pigment dispersion method capable of fine processing can be used.

The black matrix may use a black pigment or a black dye as a coloring material. For example, carbon black can be used alone, or carbon black can be mixed with colored pigments. At this time, because colored pigments with insufficient light-shielding properties are mixed, it has the following advantages: Even if the amount of coloring material is relatively increased, the strength of the film or the substrate The adhesion is not reduced.

A display device including the color filter of the present specification is provided.

The display device may be a plasma display panel (PDP), a light emitting diode (Light Emitting Diode, LED), an organic light emitting element (Organic Light Emitting Diode, OLED), or a liquid crystal display (Liquid Crystal Display, LCD), Thin Film Transistor-Liquid Crystal Display (LCD-TFT), and Cathode Ray Tube (CRT).

[Example]

<Example>

<Synthesis Example of Compound>

Synthesis Example 1: Synthesis of Compound 1

Synthesis of intermediate 1

In a 250 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 5 g (12.34 mmol) of A-1, 10.31 g (74.03 mmol) of B-1 and 80 g of N-methyl N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

Thereafter, the obtained precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7 g (11.46 mmol) of Intermediate 1.

Ionization mode Atmospheric Pressure Chemical Ionization (APCI) +: m / z = 611 [M + H], Exact Mass: 610

Synthesis of compound 1

In a 100 ml 2-neck round bottom flask (Round Bottom Flask (RBF)), 1.5 g (2.46 mmol) of intermediate 1, 1.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes. The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.3 g (1.358 mmol) of Compound 1.

Ionization mode APCI +: m / z = 957 [M + H], Exact Mass: 956

Synthesis Example 2: Synthesis of Compound 2

Synthesis of intermediate 2

In a 250 ml 2-neck round bottom flask (Round Bottom Flask (RBF)), 5 g (12.34 mmol) of A-1 and 14.90 g (74.03 mmol) were placed. B-2 and 80 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

Thereafter, the precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.2 g (9.80 mmol) of Intermediate 2.

Ionization mode APCI +: m / z = 735 [M + H], Exact Mass: 734

Synthesis of compound 2

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.808 g (2.46 mmol) of the intermediate 2, 2.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

Thereafter, the obtained precipitate was filtered under reduced pressure and washed with water. It was separated by column chromatography and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1 g (0.925 mmol) of Compound 2.

Ionization mode APCI +: m / z = 1081 [M + H], Exact Mass: 1081

Synthesis Example 3: Synthesis of Compound 3

Synthesis of intermediate 3

In a 250 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 5 g (12.34 mmol) of A-1, 10.31 g (74.03 mmol) of B-3, and 80 g of N-methyl N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

Thereafter, the precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 6.8 g (11.130 mmol) of Intermediate 3.

Ionization mode APCI +: m / z = 611 [M + H], Exact Mass: 610

Synthesis of compound 3

In a 100 ml 2-neck round bottom flask (Round Bottom Flask (RBF)), 1.502 g (2.46 mmol) of Intermediate 3, 2.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

Thereafter, the precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.4 g (1.463 mmol) of Compound 3.

Ionization mode APCI +: m / z = 957 [M + H], Exact Mass: 956

Synthesis Example 4: Synthesis of Compound 4

Synthesis of intermediate 4

In a 250 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 5 g (12.34 mmol) of A-1, 10.31 g (74.03 mmol) of B-4 and 80 g of N-methyl N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

Thereafter, the precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 6.5 g (10.64 mmol) of Intermediate 4.

Ionization mode APCI +: m / z = 611 [M + H], Exact Mass: 610

Synthesis of compound 4

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.502 g (2.46 mmol) of Intermediate 4, 2.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.7 g (1.776 mmol) of Compound 4.

Ionization mode APCI +: m / z = 957 [M + H], Exact Mass: 956

Synthesis Example 5: Synthesis of Compound 5

Synthesis of intermediate 5

In a 250 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 5 g (12.34 mmol) of A-1, 14.30 g (74.03 mmol) of B-5, and 80 g of N-methyl 2-pyrrolidone (N-Methyl-2-pyrrolidone, NMP) and stir. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

Thereafter, the precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.2 g (10.02 mmol) of Intermediate 5.

Ionization mode APCI +: m / z = 719 [M + H], Exact Mass: 718

Synthesis of compound 5

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.768 g (2.46 mmol) of Intermediate 5, 2.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 2.1 g (1.972 mmol) of compound 5.

Ionization mode APCI +: m / z = 1065 [M + H], Exact Mass: 1064

Synthesis Example 6: Synthesis of Compound 6

Synthesis of intermediate 6

In a 250 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 5 g (12.34 mmol) of A-1, 15.33 g (74.03 mmol) of B-6, and 80 g of N-methyl N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 150 ° C. and stirred for 4 hours. After the reaction solution was cooled to normal temperature, it was put into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.4 g (9.91 mmol) of Intermediate 6.

Ionization mode APCI +: m / z = 747 [M + H], Exact Mass: 746

Synthesis of compound 6

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.837 g (2.46 mmol) of Intermediate 6, 2.958 g (9.82 mmol) of C-1, 1.358 g (9.82 mmol) Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 2.5 g (2.287 mmol) of Compound 6.

Ionization mode APCI +: m / z = 1093 [M + H], Exact Mass: 1092

Synthesis Example 7: Synthesis of Compound 7

In the production of the compound 1, the compound 7 was obtained by the same method except that C-1 was changed to C-2.

Ionization mode APCI +: m / z = 985 [M + H], Exact Mass: 984

Synthesis Example 8: Synthesis of Compound 8

In the production of the compound 2, C-1 was changed to C-2, Compound 8 was obtained by the same method.

Ionization mode APCI +: m / z = 1109 [M + H], Exact Mass: 1108

Synthesis Example 9: Synthesis of Compound 9

In the production of the compound 3, except that the C-1 was changed to C-2, the compound 9 was obtained by the same method.

Ionization mode APCI +: m / z = 985 [M + H], Exact Mass: 984

Synthesis Example 10: Synthesis of Compound 10

In the production of the compound 4, the compound 10 was obtained by the same method except that C-1 was changed to C-2.

Ionization mode APCI +: m / z = 985 [M + H], Exact Mass: 984

Synthesis Example 11: Synthesis of Compound 11

In the production of the compound 5, the compound 11 was obtained by the same method except that C-1 was changed to C-2.

Ionization mode APCI +: m / z = 1093 [M + H], Exact Mass: 1092

Synthesis Example 12: Synthesis of Compound 12

In the production of the compound 6, the compound 12 was obtained by the same method except that C-1 was changed to C-2.

Ionization mode APCI +: m / z = 1121 [M + H], Exact Mass: 1120

Synthesis Examples 13 to 18: Synthesis of Compound 13 to Compound 18

In the production of compound 1 to compound 6, except that C-1 was changed to C-3, the following compounds 13 to 18 were obtained by the same method.

Compound 13: Ionization mode APCI +: m / z = 1085 [M + H], Exact Mass: 1084

Compound 14: Ionization mode APCI +: m / z = 1209 [M + H], Exact Mass: 1208

Compound 15: Ionization mode APCI +: m / z = 1085 [M + H], Exact Mass: 1084

Compound 16: Ionization mode APCI +: m / z = 1085 [M + H], Exact Mass: 1084

Compound 17: Ionization mode APCI +: m / z = 1193 [M + H], Exact Mass: 1192

Compound 18: Ionization mode APCI +: m / z = 1221 [M + H], Exact Mass: 1220

Comparative Compound 1

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.414 g (2.46 mmol) of S1, 1.21 g (9.82 mmol) of bromopropane, and 1.358 g (9.82 mmol) of Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain Comparative Compound 1.

Ionization mode APCI +: m / z = 659 [M + H], Exact Mass: 658

Comparative Compound 2

In a 100 ml 2-neck round bottom flask (Round Bottom Flask, RBF), 1.4234 g (2.46 mmol) of S2, 3.094 g (9.82 mmol) of C-2, 1.358 g (9.82 mmol) of Potassium carbonate (K ₂ CO ₃ ) was put into 30 g of N-Methyl-2-pyrrolidone (NMP) and stirred. The temperature was raised to 100 ° C. and stirred for 6 hours. After the reaction solution was cooled to normal temperature, it was put into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.

The precipitate was filtered under reduced pressure, washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain Comparative Compound 2.

Ionization mode APCI +: m / z = 953 [M + H], Exact Mass: 952

Comparative compound 3

In Synthesis Example 1, a comparative compound 3 was synthesized by using the same method as in the synthesis of the intermediate 1 and using S3 and S4 instead of A-1 and B-1.

Comparative compound 4

Add 3 g (4.553 mmol) of 50 g of 98% sulfuric acid at 10 ° C. Compare Compound 1 and dissolve it. Thereafter, 0.807 g (4.553 mmol) of N-hydroxymethyl phthalimide was added, and the temperature was raised to 45 ° C. and stirred for 2 hours. The reaction solution was added to 500 g of water to precipitate crystals, and the precipitate was filtered under reduced pressure to obtain Comparative Compound 4.

Example 1

5.554 g of compound 1 as a binder resin, a copolymer of benzyl methacrylate and methacrylic acid (Molar ratio 70:30, acid value 113 KOHmg / g, Gel Permeation Chromatography (GPC), and a weight average molecular weight of 20,000 g / mol, a molecular weight distribution (PDI) of 2.0 g, a solid content (SC) of 25%, and a solvent containing polypropylene glycol monomethyl ether acetate (PGMEA)) 10.376 g, I-369 (BASF) 2.018 g as a photoinitiator, 12.443 g DPHA (Japanese Chemical) as a polyfunctional monomer, and polypropylene glycol monomethyl ether acetate (PGMEA) as a solvent 68.593 g and 1.016 g of DIC's F-475 as a surfactant were mixed to produce a photosensitive resin composition 1.

Example 2 to Example 18

In Example 1, except that the compound 1 was changed to the compound 2 to the compound 18, the photosensitive resin composition 2 to the photosensitive resin composition 18 were manufactured with the same composition, respectively.

Comparative Example 1

5.554 g of Comparative Compound 1, a copolymer of benzyl methacrylate and methacrylic acid as a binder resin (molar ratio 70:30, acid value 113 KOHmg / g, Weight average molecular weight measured by colloidal permeation chromatography (GPC) 20,000 g / mol, molecular weight distribution (PDI) 2.0 g, solid content (SC) 25%, solvent containing polypropylene glycol monomethyl ether acetate (PGMEA) ) 10.376 g, 2.018 g of I-369 (BASF) as a photoinitiator, 12.443 g of DPHA (Nippon Kayaku) as a polyfunctional monomer, PGMEA (polypropylene glycol monomethyl ether acetate) ) 68.593 g and 1.016 g of DIC's F-475 as a surfactant were mixed to produce a photosensitive resin composition of Comparative Example 1.

Comparative Example 2 to Comparative Example 4

In Comparative Example 1, the photosensitive resin composition of Comparative Examples 2 to 4 was manufactured with the same composition except that Comparative Compound 1 was changed to Comparative Compound 2 to Comparative Compound 4, respectively.

<Experimental example>

Substrate production

The photosensitive resin compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were used in the production of a substrate, respectively. Specifically, the photosensitive resin compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were spin-coated on glass (5 × 5 cm ² ), and 100 ° C. was performed at 100 ° C. The film was prebake to form a film.

The interval between the film-formed substrate and a photo mask was set to 250 μm, and the entire surface of the substrate was irradiated with an exposure device at an exposure amount of 40 mJ / cm ² . Thereafter, the exposed substrate was developed in a developing solution (potassium hydroxide (KOH), 0.05%) for 60 seconds, and subjected to postbake at 230 ° C for 20 minutes to prepare a substrate.

Evaluation of heat resistance

With respect to a substrate manufactured by the substrate manufacturing method, a spectroscope (MCPD-Otsuka) was used to obtain a transmittance spectrum in a visible light region in a range of 380 nm to 780 nm. In addition, a prebake substrate was additionally subjected to a postbake for 20 minutes at 230 ° C, and a transmittance spectrum was obtained with the same equipment and measurement range.

Using the obtained transmittance spectrum and the C light source backlight, the obtained values E (L *, a *, b *) were used to calculate a color change (hereinafter ΔEab), and are shown in Table 1 below.

A small ΔEab value indicates excellent color heat resistance.

If it has a value of ΔEab <3, it can be used as a pigment for a color filter, and can be called a coloring material excellent in heat resistance. Specifically, the formula for calculating ΔEab is as follows

[Calculation formula 1] ΔEab (L *, a *, b *) = {(ΔL *) ² + (Δa *) ² + (Δb *) ² } ^1/2

With reference to Table 1, it can be confirmed that the difference in transmittance spectrum (ΔEab) between the post-heat treatment and the pre-heat treatment of the color pattern substrate formed using the photosensitive resin composition of Examples 1 to 18 of the present invention ) Is less than 3, and has high color stability and excellent heat resistance.

Determination of contrast ratio

Contrast measuring device (CT-1, ZOENTECH) was used for the substrate produced by the substrate production method, and the produced substrate was placed between two polarizing plates to measure the two pieces. The brightness when the polarizers are horizontal and the brightness when the two polarizers are orthogonal are calculated using the following calculation formula 2.

[Calculation formula 2] Contrast ratio = brightness when two polarizing plates are horizontal / brightness when two polarizing plates are vertical

Regarding the contrast ratio calculated by the above-mentioned calculation formula 2, the contrast ratio improvement rate is calculated using the following calculation formula 3, and is described in Table 2 below.

[Calculation formula 3] Contrast ratio improvement rate = (Contrast ratio of the example-Contrast ratio of Comparative Example 1, Comparative Example 2, or Comparative Example 4) / Contrast ratio of Comparative Example 1, Comparative Example 2, or Comparative Example 4 * 100

With reference to Table 2, it can be confirmed that compared with the comparative example 1, the contrast ratios of the examples 1 to 18 are improved by 220.47% to 532.38%. In addition, it was confirmed that the contrast ratios of Examples 1 to 18 were improved by 136.48% to 329.57% compared to Comparative Example 2. Furthermore, it was confirmed that compared with the comparative example 4, the contrast ratios of the examples 1 to 18 were improved by 197.83% to 510.43%.

Determination of fluorescence intensity

For the substrate manufactured by the method for manufacturing the substrate, an FS-2 fluorescence measurement equipment from Sinco was used, and the excitation wavelength was set to 545 nm and the emission wavelength at room temperature (25 ° C). (emission wavelength) The fluorescence intensity was measured at 560 nm to 720 nm, and is shown in FIG. 1.

According to FIG. 1, it can be confirmed that the fluorescence intensity of Examples 6, 7, and 12 of one embodiment of the present specification is lower than that of Comparative Examples 1 and 2, and excellent results can be obtained even without adding an additional dye. Contrast ratio.

Transmission Evaluation

For a substrate manufactured by the substrate manufacturing method, a spectroscope (MCPD-Otsuka Corporation) was used for a substrate subjected to postbake at 230 ° C for 20 minutes to obtain a visible light region in a range of 380 nm to 780 nm. Transmission spectrum.

Especially in the case of a blue color filter, it can be displayed when the maximum transmittance of 380nm to 480nm is high among visual perception x, visual perception y, and visual perception z More excellent brightness.

FIG. 2 shows visual perception x, visual perception y, and visual perception z.

Referring to Table 3, it can be seen that the maximum transmittances of 380 nm to 480 nm of Examples 1 and 7 and 13 are higher than those of Comparative Example 3.

According to FIG. 3, it can be confirmed that the transmittance of 380 nm to 480 nm of Example 1, Example 7 and Example 13 of one embodiment of this specification is greater than that of Comparative Example 3, and it is more excellent in a blue color filter. Of brightness.

Claims (13)

A compound represented by the following Chemical Formula 1: In the chemical formula 1, L1 and L2 are the same or different from each other, and are independently substituted or unsubstituted alkylene groups, R1 and R2 are the same or different from each other, and are each independently a dianhydride group containing a nitrogen atom, R3 And R4 are the same or different from each other, and are each independently a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, and R5 to R12 are the same or different from each other, and are independently selected from hydrogen, deuterium, and halogen Group, -OH, -SO ₃ H, -SO ₃ M, -SO ₂ NM1M2, -SO ₂ NHY, -COOH, substituted or unsubstituted alkyl group, substituted or unsubstituted cycloalkyl group, In the group consisting of substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, R13 to R17 the same or different, are each independently hydrogen, deuterium, ^{_{halogen, -OH, -SO 3 -, -SO}} 3 H, -SO 3 M, -SO 2 NM1M2, -SO 2 NHY, -COOH, anionic Group, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or substituted or unsubstituted Substituted heteroaryl, the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, and the M1, M2, and Y are the same or different from each other, Each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group, at least one of the R13 to R17 One is an anionic group, X is an anionic group, a is 0 or 1, and r5 and r6 are integers of 0 to 4. When r5 is 2 or more, R5 is the same or different from each other, and when r6 is 2 or more In the following, R6 is the same or different from each other; the dianhydride group containing a nitrogen atom is represented by any one of the following substituents: In the substituent, X1, X2, and Y1 to Y3 are the same or different from each other, and are independently hydrogen, deuterium, halogen, nitro, -OH, -SO ₃ H, -COOH, and phosphine , Anionic groups, substituted or unsubstituted alkyl groups, or substituted or unsubstituted aryl groups, or adjacent groups are bonded to form a substituted or unsubstituted ring. The compound according to item 1 of the patent application scope, wherein the X is selected from the group consisting of at least one selected from the group consisting of tungsten, molybdenum, silicon, and phosphorus Anion of element and oxygen compound; trifluoromethanesulfonate anion, bis (trifluoromethylsulfonyl) sulfonium anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, Phenylborate anion, tetra (4-fluorophenyl) borate, tetra (pentafluorophenyl) borate, tris-trifluoromethanesulfonylmethylate, and a halogen group. The compound according to item 1 of the patent application range, wherein the M is selected from the group consisting of Na ⁺ , K ⁺ , Rb ⁺ , Cs ⁺ , Fr ^+, and a compound containing an ammonium structure, and the ammonium structure-containing compound The compound includes a unit represented by the following Chemical Formula A or a unit represented by the following Chemical Formula B: [Chemical Formula B] In the chemical formula A, Ra to Rd are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, A substituted or unsubstituted aralkyl group, -L ₁ -NHCO-R or -L ₂ -OCO-R, or two of Ra ~ Rd are bonded to each other to form a substituted or unsubstituted ring, so R is hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, and L ₁ and L ₂ are substituted or unsubstituted Substituted alkylene, in the chemical formula B, Rb ~ Rd are the same or different from each other, and are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted A substituted aryl group, or a substituted or unsubstituted aralkyl group, or two of Rb ~ Rd are bonded to each other to form a substituted or unsubstituted ring, and Z is a substituted or unsubstituted extension group. Alkyl, substituted or unsubstituted arylene, -L ₃ -NHCO-, or -L ₄ -OCO-, where L ₃ and L ₄ are substituted or unsubstituted alkylene, Re ~ Rg phase They are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group. The compound according to item 1 of the scope of patent application, wherein the chemical formula 1 is represented by the following chemical formula 2: In the chemical formula 2, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1. The compound according to item 1 of the scope of patent application, wherein the chemical formula 1 is represented by the following chemical formula 3: [Chemical formula 3] In the chemical formula 3, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1. The compound according to item 1 of the scope of patent application, wherein the chemical formula 1 is represented by the following chemical formula 4: In the chemical formula 4, L1, L2, R1 to R17, X, a, r5, and r6 are as defined in the chemical formula 1. The compound according to item 1 of the scope of patent application, wherein the compound represented by Chemical Formula 1 is represented by any one of the following chemical formulas: In the chemical formula, M and Y are as defined in the chemical formula 1. A photosensitive resin composition comprising the compound according to any one of claims 1 to 7 of the scope of patent application, a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent. The photosensitive resin composition according to item 8 of the scope of application for a patent, wherein a content of the compound represented by the chemical formula 1 is 5% by weight based on a total weight of solid components in the photosensitive resin composition. 60% by weight, the content of the binder resin is 1% to 60% by weight, the content of the photoinitiator is 0.1% to 20% by weight, and the content of the polyfunctional monomer is 0.1% by weight ~ 50% by weight. The photosensitive resin composition according to item 8 of the scope of patent application, further comprising an additive. A photosensitive material manufactured using the resin composition as described in claim 8 of the scope of patent application. A color filter includes the photosensitive material according to item 11 of the scope of patent application. A display device includes a color filter according to item 12 of the scope of patent application.