CN111527075A - Xanthene compound, photosensitive resin composition containing the same, photosensitive material, color filter, and display device - Google Patents
Xanthene compound, photosensitive resin composition containing the same, photosensitive material, color filter, and display device Download PDFInfo
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- CN111527075A CN111527075A CN201880084202.5A CN201880084202A CN111527075A CN 111527075 A CN111527075 A CN 111527075A CN 201880084202 A CN201880084202 A CN 201880084202A CN 111527075 A CN111527075 A CN 111527075A
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- 239000011342 resin composition Substances 0.000 title claims abstract description 46
- 239000000463 material Substances 0.000 title claims abstract description 34
- -1 Xanthene compound Chemical class 0.000 title claims description 86
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 title description 5
- 239000000126 substance Substances 0.000 claims abstract description 135
- 150000001875 compounds Chemical class 0.000 claims abstract description 93
- 125000000217 alkyl group Chemical group 0.000 claims description 76
- 125000003118 aryl group Chemical group 0.000 claims description 63
- 229910052739 hydrogen Inorganic materials 0.000 claims description 59
- 239000001257 hydrogen Substances 0.000 claims description 59
- 150000002431 hydrogen Chemical class 0.000 claims description 34
- 125000001424 substituent group Chemical group 0.000 claims description 31
- 125000000129 anionic group Chemical group 0.000 claims description 27
- 125000002947 alkylene group Chemical group 0.000 claims description 22
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 20
- 125000005843 halogen group Chemical group 0.000 claims description 18
- 125000001072 heteroaryl group Chemical group 0.000 claims description 17
- 229910052757 nitrogen Inorganic materials 0.000 claims description 17
- 239000000178 monomer Substances 0.000 claims description 16
- 125000003342 alkenyl group Chemical group 0.000 claims description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 15
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 14
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 14
- 229910052805 deuterium Inorganic materials 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 11
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- 125000006159 dianhydride group Chemical group 0.000 claims description 11
- 239000003999 initiator Substances 0.000 claims description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 11
- 229910006069 SO3H Inorganic materials 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 10
- 230000000996 additive effect Effects 0.000 claims description 9
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 8
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 8
- 150000001450 anions Chemical group 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 125000000732 arylene group Chemical group 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 claims description 3
- PHBVXHIVWULVNF-UHFFFAOYSA-N (4-fluorophenoxy)boronic acid Chemical compound OB(O)OC1=CC=C(F)C=C1 PHBVXHIVWULVNF-UHFFFAOYSA-N 0.000 claims description 3
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 claims description 3
- UQWLFOMXECTXNQ-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F UQWLFOMXECTXNQ-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 125000005346 substituted cycloalkyl group Chemical group 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 description 98
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 82
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 44
- 238000003786 synthesis reaction Methods 0.000 description 32
- 230000015572 biosynthetic process Effects 0.000 description 31
- 239000000758 substrate Substances 0.000 description 31
- 230000000052 comparative effect Effects 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 30
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 21
- 239000000049 pigment Substances 0.000 description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 239000012153 distilled water Substances 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 16
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 15
- 239000002244 precipitate Substances 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 238000003756 stirring Methods 0.000 description 14
- 238000004040 coloring Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 12
- 229910052717 sulfur Inorganic materials 0.000 description 12
- 239000003963 antioxidant agent Substances 0.000 description 11
- 235000006708 antioxidants Nutrition 0.000 description 11
- 239000003086 colorant Substances 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 125000003277 amino group Chemical group 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000004440 column chromatography Methods 0.000 description 8
- 239000002270 dispersing agent Substances 0.000 description 8
- 229910000027 potassium carbonate Inorganic materials 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- 238000000411 transmission spectrum Methods 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 229940125904 compound 1 Drugs 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- 125000004434 sulfur atom Chemical group 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 6
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000004020 luminiscence type Methods 0.000 description 5
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 5
- 150000002790 naphthalenes Chemical group 0.000 description 5
- 230000010287 polarization Effects 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229910052701 rubidium Inorganic materials 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 125000003368 amide group Chemical group 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 230000003078 antioxidant effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 229940125782 compound 2 Drugs 0.000 description 4
- 229940126214 compound 3 Drugs 0.000 description 4
- 125000004185 ester group Chemical group 0.000 description 4
- 230000005284 excitation Effects 0.000 description 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 4
- 229920001451 polypropylene glycol Polymers 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 4
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 229910052792 caesium Inorganic materials 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 229910052730 francium Inorganic materials 0.000 description 3
- 125000004474 heteroalkylene group Chemical group 0.000 description 3
- 125000005462 imide group Chemical group 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 2
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 2
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 2
- WDBQJSCPCGTAFG-QHCPKHFHSA-N 4,4-difluoro-N-[(1S)-3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-pyridin-3-ylpropyl]cyclohexane-1-carboxamide Chemical compound FC1(CCC(CC1)C(=O)N[C@@H](CCN1CCC(CC1)N1C(=NN=C1C)C(C)C)C=1C=NC=CC=1)F WDBQJSCPCGTAFG-QHCPKHFHSA-N 0.000 description 2
- BWGRDBSNKQABCB-UHFFFAOYSA-N 4,4-difluoro-N-[3-[3-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)-8-azabicyclo[3.2.1]octan-8-yl]-1-thiophen-2-ylpropyl]cyclohexane-1-carboxamide Chemical compound CC(C)C1=NN=C(C)N1C1CC2CCC(C1)N2CCC(NC(=O)C1CCC(F)(F)CC1)C1=CC=CS1 BWGRDBSNKQABCB-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- LFZAGIJXANFPFN-UHFFFAOYSA-N N-[3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-thiophen-2-ylpropyl]acetamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CCC(C=1SC=CC=1)NC(C)=O)C LFZAGIJXANFPFN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- CWBLMSQPWRHFFH-UHFFFAOYSA-N [dimethoxy(propyl)silyl] 2-methylprop-2-enoate Chemical compound CCC[Si](OC)(OC)OC(=O)C(C)=C CWBLMSQPWRHFFH-UHFFFAOYSA-N 0.000 description 2
- 150000008062 acetophenones Chemical class 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/78—Ring systems having three or more relevant rings
- C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
- C07D311/82—Xanthenes
- C07D311/90—Xanthenes with hydrocarbon radicals, substituted by amino radicals, directly attached in position 9
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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Abstract
The present specification provides a compound represented by chemical formula 1, and a photosensitive resin composition, a photosensitive material, a color filter and a display device including the same.
Description
Technical Field
The present application claims priority to korean patent application No. 10-2018-0039901, filed by the korean patent office at 05.04.2018, the entire contents of which are incorporated herein.
The present application claims priority of korean patent application No. 10-2018-0135250, which was filed in 2018 on 06.11.2018, the entire contents of which are incorporated in the present specification.
The present specification relates to a xanthene compound and a photosensitive resin composition containing the same. The present specification also relates to a photosensitive material and a color filter produced using the photosensitive resin composition, and a display device including the photosensitive material and the color filter.
Background
In recent years, color filters are required to have high brightness and high contrast. In addition, one of the main purposes of development of display devices is to achieve differentiation of display element performance and increase productivity in manufacturing processes by improving color purity.
Since pigment types that have been used conventionally as colorants for color filters exist in a particle-dispersed state in color photoresists, there is a difficulty in adjusting brightness and contrast by adjusting the size and distribution of pigment particles. In the case of pigment particles, dissolution and dispersibility are reduced by agglomeration in the color filter, and multiple scattering (multiple scattering) of light occurs due to agglomerated large particles. Scattering of light of this polarization is considered to be a major cause of reduced contrast. Although there have been continuous efforts to improve brightness and contrast by ultrafine particle formation and dispersion stabilization of pigments, there is a limit to the degree of freedom in selecting coloring materials for realizing color coordinates for high color purity display devices. In addition, the pigment dispersion method using the coloring materials, especially pigments, which has been developed, reaches a limit in improving color purity, brightness, and contrast of the color filter using the same.
Thus, development of a novel coloring material capable of improving color reproduction, brightness and contrast by improving color purity has been demanded.
Disclosure of Invention
Technical subject
The present inventors have aimed to provide a xanthene compound having a novel structure, a photosensitive resin composition containing the same, a photosensitive material produced using the same, a color filter, and a display device containing the same.
Means for solving the problems
One embodiment of the present specification provides a compound represented by the following chemical formula 1.
[ chemical formula 1]
In the above-described chemical formula 1,
l1 and L2, which are identical to or different from each other, are each independently a substituted or unsubstituted alkylene group,
r1 and R2, which may be the same or different from each other, are each independently a dianhydride group containing a nitrogen atom,
r3 and R4, which are the same or different from each other, are each independently a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group,
r5 to R12 are the same or different from each otherEach independently selected from hydrogen, deuterium, halogen groups, -OH, -SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
r13 to R17, equal to or different from each other, are each independently hydrogen, deuterium, a halogen group, -OH, -SO3 -、-SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, an anionic group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group,
m is selected from Na+、K+、Rb+、Cs+、Fr+And a compound comprising an ammonium structure,
m1, M2 and Y are the same as or different from each other and each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group and a substituted or unsubstituted heteroaryl group, at least one of R13 to R17 is an anionic group,
x is an anionic group, and X is an anionic group,
a is 0 or 1, and a is,
r5 and R6 are integers of 0 to 4, and when R5 is 2 or more, R5 are the same as or different from each other, and when R6 is 2 or more, R6 are the same as or different from each other.
One embodiment of the present specification provides a photosensitive resin composition including a compound represented by the above chemical formula 1, a binder resin, a polyfunctional monomer, a photopolymerization initiator, and a solvent.
One embodiment of the present specification provides a photosensitive material produced using the photosensitive resin composition.
One embodiment of the present specification provides a color filter including the photosensitive material.
One embodiment of the present specification provides a display device including the color filter.
Effects of the invention
The compound according to one embodiment of the present specification can be used as a coloring material in a photosensitive resin composition, and has solubility in an organic solvent, whereby a dispersion step can be reduced, and unlike the case where a conventional pigment is used and a dispersion step is required, the compound can be used as a coloring material in an economical manner. In addition, by reducing the fluorescence intensity, the contrast can be improved without adding an additional pigment.
Further, the xanthene compound according to one embodiment of the present specification is used as a coloring material, and can improve color reproduction, brightness, and contrast.
Drawings
Fig. 1 is a graph showing the detected fluorescence intensity of substrates manufactured using compounds according to some of examples and comparative examples in the present specification.
FIG. 2 shows the visual perception of a compound according to one embodiment of the present description
Fig. 3 shows the transmittance of substrates manufactured using the compounds according to some of the examples and comparative examples of the present specification.
Detailed Description
The present specification will be described in more detail below.
In the present specification, when a member is referred to as being "on" another member, it includes not only a case where the member is in contact with the another member but also a case where the another member is present between the two members.
In the present specification, when a part is referred to as "including" a certain component, unless specifically stated to the contrary, it means that the other component may be further included, and the other component is not excluded.
According to an embodiment of the present specification, there is provided a compound represented by the above chemical formula 1.
The present invention has excellent solubility in organic solvents by including the compound represented by the above chemical formula 1. Specifically, the above chemical formula 1 can increase the solubility in an organic solvent by substituting an aryl group substituted on nitrogen of a Xanthene (Xanthene) structure with a substituent containing sulfur (S) and containing a large substituent of the same volume as a dianhydride group containing a nitrogen atom.
In addition, in the case where the aryl group substituted on the nitrogen of the xanthene structure of chemical formula 1 is substituted with a substituent containing sulfur (S), the fluorescence intensity is reduced as compared with the case where the aryl group is substituted with a substituent not containing sulfur (S), and an excellent contrast can be obtained without adding an additional pigment.
This increases the solubility, prevents the coloring materials from coagulating, reduces the amount of the material required for dispersing the coloring materials, and improves the economy.
In addition, Contrast Ratio (CR) can be improved, and excellent heat resistance can be provided. In order to reduce luminescence (fluorescence or phosphorescence) of molecules, there are methods of reducing planarity in molecules or introducing molecules that absorb light. When introducing a molecule that absorbs light, it is difficult to selectively absorb only light of an emission wavelength because all of the light of a molecule that emits light and external light that are necessary are absorbed. Therefore, a substituent (bulk group) having a large steric hindrance is introduced in order to reduce the planarity in the molecule.
When a molecule that absorbs light in a ground state (excited state) and becomes an excited state (excited state) moves energy in a vibration mode or a rotation mode, non-radiative decay (non-radiative decay) may occur. That is, light emission can be reduced.
The larger the planarity, the more difficult the non-radiative decay, thereby increasing the intensity of luminescence, and the smaller the planar area by introducing large substituents, the more the intensity of luminescence can be reduced by non-radiative decay. For non-radiative decay, long-length alkyl (alkyl group), branched alkyl (branched alkyl group), alkoxy (alkoxy group), and amine (amine group) may be introduced. However, alkyl (alkyl) has a disadvantage of insufficient heat resistance.
In the case of an alkoxy group (alkoxy) and an amine group (amine group), the alkoxy group (alkoxy) and the amine group (amine group) function as electron donating groups (electron donating groups) and can change the absorption wavelength of a molecule that absorbs light.
In contrast, when a molecule containing sulfur (S) is introduced, the action of electron donating groups (electron donating groups) in the molecule that absorbs light is reduced, and heat resistance can be maintained.
When sulfur atoms (sulfur atoms) having a larger atomic size than carbon, nitrogen, and oxygen are introduced, the energy of the excited molecules moves to sulfur atoms (sulfur atoms) having various energy levels, and moves between the various energy levels of the sulfur atoms, that is, moves in accordance with a vibration mode (vibration mode) and a rotation mode (rotation mode), and non-radiative decay (non-radiative decay) can occur. Due to such characteristics, when a sulfur atom (sulfur atom) is introduced, the intensity of light emission in the molecule can be reduced.
When molecules having luminescence are applied to a Liquid Crystal Display (LCD), a decrease in Contrast Ratio (CR) is caused and may become a problem of quality degradation. Therefore, various methods have been taken in an attempt to reduce the light emission.
Molecules that absorb luminescence are currently put in order to suppress a decrease in Contrast Ratio (CR). But a decrease in color purity and an increase in the amount of coloring material used occur.
Examples of the substituent of the compound represented by the above chemical formula 1 are illustrated below, but not limited thereto.
In the context of the present specification,refers to a site that binds to another substituent or a binding moiety.
The term "substituted or unsubstituted" in this specification means that the compound is selected from deuterium; a halogen group; a nitrile group; a nitro group; -OH; a carbonyl group; an ester group; -COOH; an imide group; an amide group; an anionic group; an alkoxy group; an alkyl group; a cycloalkyl group; an alkenyl group; a cycloalkenyl group; aralkyl group; a phosphine group; sulfonate/salt groups; an amine group; an aryl group; a heteroaryl group; a silyl group; a boron group; an acryloyl group; an acrylate group; an ether group; containing N, O, S or 1 or more heterocyclic groups among P atoms and 1 or more substituents among anionic groups, or having no substituent.
In the present specification, an "adjacent" group may represent a substituent substituted on an atom directly connected to an atom substituted with the substituent, a substituent closest in steric structure to the substituent, or another substituent substituted on an atom substituted with the substituent. For example, 2 substituents substituted at the ortho (ortho) position in the phenyl ring and 2 substituents substituted on the same carbon in the aliphatic ring may be interpreted as groups "adjacent" to each other.
In the present specification, the ring in which adjacent groups may be bonded to form a "ring" means an aromatic or aliphatic ring. Specifically, the ring may be an aromatic ring, and may be an aryl group or a heteroaryl group. The aryl and heteroaryl groups can be used as described below.
In the present specification, examples of the halogen group include fluorine, chlorine, bromine, and iodine.
In the present specification, the carbonyl group may be represented by — COR, and the R may be hydrogen, deuterium, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, or a substituted or unsubstituted aryl group. The carbon number of the carbonyl group is not particularly limited, but is preferably 1 to 30. Specifically, the compound may have the following structure, but is not limited thereto.
In the present specification, the ester group may be represented by-COOR, and the R may be hydrogen, deuterium, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, or a substituted or unsubstituted aryl group. In the above ester group, the oxygen of the ester group may be substituted with a linear, branched or cyclic alkyl group having 1 to 25 carbon atoms or an aryl group having 6 to 30 carbon atoms. Specifically, the compound may be a compound of the following structural formula, but is not limited thereto.
In the present specification, the number of carbon atoms in the imide group is not particularly limited, but is preferably 1 to 30. Specifically, the compound may have the following structure, but is not limited thereto.
In the amide group in the present specification, the nitrogen of the amide group may be substituted with hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, or an aryl group having 6 to 30 carbon atoms. Specifically, the compound may be a compound of the following structural formula, but is not limited thereto.
In the present specification, phosphino refers to an alkylphosphino group or an arylphosphino group, and the above-mentioned alkylphosphino group refers to a phosphino group substituted with an alkyl group. The number of carbon atoms of the above-mentioned alkylphosphino group is not particularly limited, but is preferably 1 to 20. Examples of the alkyl phosphino group include, but are not limited to, dimethylphosphino, diethylphosphino, di-n-propylphosphino, diisopropylphosphino, di-n-butylphosphino, di-sec-butylphosphino, di-tert-butylphosphino, diisobutylphosphino, tert-butylisopropylphosphino, di-n-hexylphosphino, di-n-octylphosphino, di-n-methylphosphino, and the like. The above-mentioned arylphosphino group means a phosphino group substituted with an aryl group. The number of carbon atoms of the above-mentioned arylphosphino group is not particularly limited, but is preferably 6 to 30. Examples of the above-mentioned arylphosphino group include, but are not limited to, diphenylphosphino, dibenzylphosphino, methylphenylphosphino, benzylhexylphosphino, bistrimethylsilylphosphino, and the like.
In the present specification, the anionic group has a chemical bond with the structure of chemical formula 1, and the chemical bond may be an ionic bond. The anionic group is not particularly limited, and examples thereof include those described in U.S. Pat. No. 7,939,644, Japanese patent application laid-open No. 2006-.
Specific examples of the anionic group include trifluoromethanesulfonate anion, bis (trifluoromethylsulfonyl) amide anion, bistrifluoromethanesulfonylimide anion, bisperfluoroethylsulfonylimide anion, tetraphenylborate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tris (trifluoromethylsulfonyl) methide, SO3 -、CO2 -、SO2N-SO2CF3、SO2N-SO2CF2CF3Halogen groups such as fluorine groups, iodine groups, chlorine groups, etc., but are not limited thereto.
In the present specification, the anionic group may have an anion itself or may be present in a complex form together with other cations. Therefore, the sum of the overall charge of the molecule of the compound of the present invention may vary depending on the number of substituted anionic groups. For example, when the chemical formula 1 includes an ammonium structure, since one ammonium structure has a cation, the sum of the overall charges of the molecules may have a value of about 1 minus the number of substituted anionic groups to a value of 0.
In the present specification, the alkoxy group may be a linear or branched one, and the number of carbon atoms is not particularly limited, but is preferably 1 to 30, specifically 1 to 20, and more specifically 1 to 10.
In the present specification, the alkyl group may be linear or branched, and the number of carbon atoms is not particularly limited, but is preferably 1 to 60. According to one embodiment, the alkyl group has 1 to 30 carbon atoms. According to another embodiment, the alkyl group has 1 to 20 carbon atoms. According to another embodiment, the alkyl group has 1 to 10 carbon atoms. Specific examples of the alkyl group include, but are not limited to, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, and n-octyl. In the present specification, the cycloalkyl group is not particularly limited, but is preferably a cycloalkyl group having 3 to 30 carbon atoms, and is particularly preferably a cyclopentyl group or a cyclohexyl group, but is not limited thereto.
In the present specification, the cycloalkyl group is not particularly limited, but is preferably a cycloalkyl group having 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another embodiment, the number of carbon atoms of the above cycloalkyl group is 3 to 6. Specifically, there are, but not limited to, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl.
In the present specification, the alkenyl group may be linear or branched, and the number of carbon atoms is not particularly limited, but is preferably 2 to 60. According to one embodiment, the alkyl group has 2 to 30 carbon atoms. According to another embodiment, the alkyl group has 2 to 20 carbon atoms. According to another embodiment, the alkyl group has 2 to 10 carbon atoms. Specific examples of the alkenyl group include, but are not limited to, aryl-substituted alkenyl groups such as stilbene (styryl) and styryl (styrenyl).
In the present specification, the cycloalkenyl group is not particularly limited, but is preferably a cycloalkenyl group having 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another embodiment, the number of carbon atoms of the above cycloalkyl group is 3 to 6. Examples of the cycloalkenyl group include, but are not limited to, cyclopentenyl and cyclohexenyl.
In the present specification, the aryl group is not particularly limited, but is preferably an aryl group having 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to one embodiment, the aryl group has 6 to 30 carbon atoms. According to one embodiment, the aryl group has 6 to 20 carbon atoms. The aryl group may be a monocyclic aryl group such as a phenyl group, a biphenyl group, or a terphenyl group, but is not limited thereto. The polycyclic aromatic group may be a naphthyl group, an anthryl group, an indenyl group, a phenanthryl group, a pyrenyl group, a perylenyl group, a perylene group,Triphenyl radicals,And a fluorenyl group, but is not limited thereto.
In the present specification, the fluorenyl group may be substituted, and 2 substituents may be combined with each other to form a spiro structure.
When the fluorenyl group is substituted, the compound may beIsospirofluorene group,(9, 9-dimethylfluorenyl group) andand substituted fluorenyl groups such as (9, 9-diphenylfluorenyl) and the like. But is not limited thereto.
In the present specification, specifically, the number of carbon atoms in the aryl portion of the aralkyl group may be 6 to 30, and the number of carbon atoms in the alkyl portion may be 1 to 30. Specific examples thereof include, but are not limited to, benzyl, p-methylbenzyl, m-methylbenzyl, p-ethylbenzyl, m-ethylbenzyl, 3, 5-dimethylbenzyl, α -methylbenzyl, α -dimethylbenzyl, α -methylphenylbenzyl, 1-naphthylbenzyl, 2-naphthylbenzyl, p-fluorobenzyl, 3, 5-difluorobenzyl, α -bistrifluoromethylbenzyl, p-methoxybenzyl, m-methoxybenzyl, α -phenoxybenzyl, α -benzyloxybenzyl, naphthylmethyl, naphthylethyl, naphthylisopropyl, pyrrolylmethyl, pyrrolylethyl, aminobenzyl, nitrobenzyl, cyanobenzyl, 1-hydroxy-2-phenylisopropyl, and 1-chloro-2-phenylisopropyl.
In the present specification, the heterocyclic group is a heterocyclic group containing O, N or S as a heteroatom, and the number of carbon atoms is not particularly limited, but is 2 to 30, specifically 2 to 20. Examples of the heterocyclic group include thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, and the like,Azolyl group,Oxadiazolyl, triazolyl, pyridyl, bipyridyl, triazinyl, acridinyl, pyridazinyl, quinolyl, isoquinolyl, indolyl, carbazolyl, benzoquinoylOxazolyl, benzimidazolyl, benzothiazolyl, benzocarbazolyl, benzothienyl, dibenzothienyl, benzofuryl, dibenzofuryl and the like, but are not limited thereto.
In the present specification, the heteroaryl group is an aromatic group, and the above description of the heterocyclic group can be applied thereto.
In the present specification, the silyl group may be represented by the formula of — SiZ1Z2Z3, and each of the above-mentioned Z1, Z2, and Z3 may be hydrogen, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group. Specific examples of the silyl group include, but are not limited to, a trimethylsilyl group (TMS), a triethylsilyl group, a t-butyldimethylsilyl group, a vinyldimethylsilyl group, a propyldimethylsilyl group, a triphenylsilyl group, a diphenylsilyl group, and a phenylsilyl group.
In the present specification, the "alkylsulfonyl group" ((ii))Alkyl sulfonyl), there are methylsulfonyl, ethylsulfonyl, propylsulfonyl, butylsulfonyl and the like, but not limited thereto. As the alkyl group in the above alkylsulfonyl group, the above explanation concerning the alkyl group can be applied.
In the present specification, a boron group may be represented by the formula of — BW4W5, and each of the above W4 and W5 may be hydrogen, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group. The boron group includes, but is not limited to, a trimethylboron group, a triethylboron group, a t-butyldimethylboron group, a triphenylboron group, and a phenylboron group.
In the present specification, an acryloyl group means a photopolymerizable unsaturated group, and for example, a (meth) acryloyl group is mentioned, but the present invention is not limited thereto.
In the present specification, the acrylate group refers to a photopolymerizable unsaturated group, and examples thereof include, but are not limited to, (meth) acrylate groups.
In the present specification, "(meth) acryloyl group" means at least one selected from acryloyl groups and methacryloyl groups. The symbol "(meth) acrylate" has the same meaning.
In the present specification, an ether group may be represented by — COR. The above R is a substituted or unsubstituted alkyl group. The alkyl group can be used as described above.
In the present specification, sulfonate group may be alkyl sulfonate group or aryl sulfonate group. The above description of the alkyl group can be applied to the "alkyl group", and the above description of the aryl group can be applied to the "aryl group".
In the present specification, the amine group may be selected from-NH2The number of carbon atoms of the alkylamino group, the N-alkylarylamino group, the arylamine group, the N-arylheteroarylamino group, the N-alkylheteroarylamino group and the heteroarylamino group is not particularly limited, but is preferably 1 to 30. Specific examples of the amine group include, but are not limited to, a methylamino group, a dimethylamino group, an ethylamino group, a diethylamino group, a phenylamino group, a naphthylamino group, a biphenylamino group, an anthrylamino group, a 9-methyl-anthrylamino group, a diphenylamino group, an N-phenylnaphthylamino group, a ditolylamino group, an N-phenyltolylamino group, a triphenylamino group, an N-phenylbiphenylamino group, an N-phenylnaphthylamino group, an N-biphenylnaphthylamino group, an N-naphthylfluorenylamino group, an N-phenylphenanthrylamino group, an N-biphenylphenanthrylamino group, an N-phenylfluorenylamino group, an N-phenylterphenylamino group, an N-phenanthrylfluorenylamino group, and an N-biphenylfluorenylamino group.
In the present specification, the number of carbon atoms of the dianhydride group containing a nitrogen atom is not particularly limited, but may be 4 to 30, specifically 4 to 20, more specifically 4 to 15.
In the present specification, alkylene means a group having two binding sites on an alkane (alkane). The alkylene group may be linear, branched or cyclic. The number of carbon atoms of the alkylene group is not particularly limited, and for example, the number of carbon atoms is 1 to 30, specifically 1 to 20, more specifically 1 to 10.
In the present specification, heteroalkylene means a group having two binding sites on an alkane (alkane) containing O, N or S as a heteroatom. The above-mentioned heteroalkylene group may be linear, branched or cyclic. The number of carbon atoms of the heteroalkylene group is not particularly limited, and for example, the number of carbon atoms is 2 to 30, specifically 2 to 20, more specifically 2 to 10.
In the present specification, arylene means a group having two binding sites on an aryl group, i.e., a 2-valent group. The above description of aryl groups applies, except that they are each a 2-valent group.
In this specification, heteroarylene refers to a group having two binding sites on the heteroaryl group, i.e., a 2-valent group. The above description of heteroaryl groups applies, except that they are each a 2-valent group.
In one embodiment of the present specification, L1 and L2, which may be the same or different from each other, are each independently a substituted or unsubstituted straight or branched alkylene group.
In one embodiment of the present specification, L1 and L2 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 30 carbon atoms.
In one embodiment of the present specification, L1 and L2 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms.
According to one embodiment of the present disclosure, L1 and L2 of chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 10 carbon atoms.
In one embodiment of the present specification, L1 and L2 of chemical formula 1, which are the same or different from each other, are each independently a substituted or unsubstituted methylene group, a substituted or unsubstituted ethylene group, a substituted or unsubstituted propylene group, or a substituted or unsubstituted butylene group.
In one embodiment of the present specification, L1 and L2 of chemical formula 1 are the same as or different from each other, and each is independently a methylene group, an ethylene group, a propylene group, or a butylene group.
In one embodiment of the present specification, R1 and R2 in the chemical formula 1 are the same as or different from each other, and each independently represents a nitrogen atom-containing dianhydride group having 4 to 30 carbon atoms.
In one embodiment of the present specification, R1 and R2 in the chemical formula 1 are the same as or different from each other, and each independently represents a nitrogen atom-containing dianhydride group having 4 to 20 carbon atoms.
In one embodiment of the present specification, R1 and R2 in the chemical formula 1 are the same as or different from each other, and each independently represents a nitrogen atom-containing dianhydride group having 4 to 15 carbon atoms.
In one embodiment of the present specification, the nitrogen atom-containing dianhydride group may be represented by any of the following substituents.
Among the above-mentioned substituents, the above-mentioned,represents a site linked to the above chemical formula 1,
x1, X2 and Y1 to Y3, which are identical to or different from one another, are each independently hydrogen, deuterium, a halogen group, nitro, -OH, -SO3H. -COOH, a phosphine group, an anionic group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, or adjacent groups are combined to form a substituted or unsubstituted ring.
In one embodiment of the present specification, X1 and X2 may be bonded to each other to form a substituted or unsubstituted ring.
In one embodiment of the present specification, X1 and X2 may be bonded to each other to form a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring.
An implementation of the present specificationWherein the above-mentioned X1 and X2 may be bonded to each other to form a quilt-SO3M or-SO2NHY-substituted or unsubstituted benzene ring, or by-SO3M or-SO2NHY substituted or unsubstituted naphthalene ring, and the above M and Y are the same as defined in the above chemical formula 1.
In one embodiment of the present disclosure, the above-mentioned X1 and X2 may be combined with each other to form SO-coated film3M or-SO2NHY-substituted or unsubstituted benzene ring, or by-SO3M or-SO2And NHY, wherein M is selected from hydrogen, Na, K, Rb, Cs, Fr, and a compound containing an ammonium structure, and Y is substituted or unsubstituted alkyl.
In one embodiment of the present disclosure, the above-mentioned X1 and X2 may be combined with each other to form SO-coated film3M or-SO2NHY-substituted or unsubstituted benzene ring, or by-SO3M or-SO2NHY substituted or unsubstituted naphthalene ring, the M selected from the group consisting of hydrogen, Na, K, Rb, Cs, Fr, and containing ammonium structure compounds, the Y is substituted or unsubstituted n-hexyl.
In one embodiment of the present disclosure, the above-mentioned X1 and X2 may be combined with each other to form SO-coated film3M or-SO2NHY-substituted or unsubstituted benzene ring, or by-SO3M or-SO2And (b) a substituted or unsubstituted naphthalene ring of NHY, wherein M is selected from the group consisting of hydrogen, Na, K, Rb, Cs, Fr, and a compound containing an ammonium structure, and Y is n-hexyl substituted with ethyl.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a substituted or unsubstituted ring.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a substituted or unsubstituted benzene ring.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a quilt-SO3M or-SO2NHY substituted or unsubstituted benzene ring, and the above M and Y are the same as defined in the above chemical formula 1.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a quilt-SO3M or-SO2NHY substituted or unsubstituted benzene ring, said M being selected from Na+、K+、Rb+、Cs+、Fr+And a compound having an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a quilt-SO3M or-SO2NHY substituted or unsubstituted benzene ring, said M being selected from Na+、K+、Rb+、Cs+、Fr+And a compound containing an ammonium structure, the above Y being a substituted or unsubstituted n-hexyl group.
In one embodiment of the present specification, the above-mentioned Y1 and Y2, and Y2 and Y3 may be combined to form a quilt-SO3M or-SO2NHY substituted or unsubstituted benzene ring, said M being selected from Na+、K+、Rb+、Cs+、Fr+And a compound containing an ammonium structure, the above Y being n-hexyl substituted with ethyl.
In one embodiment of the present specification, the nitrogen atom-containing dianhydride group may be represented by any of the following substituents.
Among the above-mentioned substituents, the above-mentioned,x3 to X5 and Y4, which are the same or different from each other, are each independently hydrogen, deuterium, a halogen group, nitro, -OH, -SO3H、-SO3M、-SO2NHY, -COOH, a phosphine group, an anionic group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, M and Y are the same as defined in the above chemical formula 1, x3 is an integer of 0 to 4, and x4, x5, and Y4 are integers of 0 to 6.
Among the above-mentioned substituents, the above-mentioned,x3 to X5 and Y4 are the same or different and each is independently hydrogen or-SO3M, or-SO2NHY, the above M and Y are as defined in the above chemical formula 1, x3 is an integer of 0 to 4, and x4, x5 and Y4 are integers of 0 to 6.
In one embodiment of the present specification, R3 and R4 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
In one embodiment of the present specification, R3 and R4 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
In one embodiment of the present specification, R3 and R4 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
In one embodiment of the present specification, R3 and R4 in chemical formula 1 are the same as or different from each other, and each independently represents a substituted or unsubstituted methyl group or a substituted or unsubstituted phenyl group.
In one embodiment of the present specification, R3 and R4 of chemical formula 1 are the same as or different from each other, and each independently represents a methyl group, a methyl group substituted with a halogen group, or a phenyl group.
In one embodiment of the present specification, R3 and R4 in the above chemical formula 1 are the same or different from each other, and each independently represents a methyl group or a trifluoromethyl group (-CF)3) Or phenyl.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same as or different from each other, and are each independently selected from the group consisting of hydrogen, deuterium, a halogen group, a nitro group, a hydroxyl group, -COR, -COOR, an imide group, an amide group, an anionic group, a substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 30 carbon atoms, a substituted or unsubstituted cycloalkenyl group having 3 to 30 carbon atoms, a substituted or unsubstituted sulfonate group, a substituted or unsubstituted amine group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted heteroaryl group having 2 to 30 carbon atoms,
the above R is hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each is independently selected from hydrogen, deuterium, a halogen group, -OH, -SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, wherein M is selected from Na+、K+、Rb+、Cs+、Fr+And a compound containing an ammonium structure, wherein M1, M2 and Y are the same or different from each other and each is independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group and a substituted or unsubstituted heteroaryl group.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or a substituted or unsubstituted alkyl group, said Y being a substituted or unsubstituted alkyl group.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, wherein Y is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, wherein Y is a substituent having 1 to 20 carbon atomsSubstituted or unsubstituted alkyl.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, wherein Y is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or a substituted or unsubstituted methyl group, and the above Y is a hexyl group substituted or unsubstituted with a carbon having 1 to 10 carbon atoms.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or methyl substituted or unsubstituted with a halogen group, the above Y being hexyl substituted or unsubstituted with ethyl.
In one embodiment of the present specification, R5 to R12 of the above chemical formula 1 are the same or different and each independently represents hydrogen, -SO2NHY, or trifluoromethyl (-CF)3) The above Y is a hexyl group substituted by an ethyl group.
In one embodiment of the present specification, R5 in chemical formula 1 is hydrogen or trifluoromethyl.
In one embodiment of the present specification, R6 in the above chemical formula 1 is hydrogen or-SO2NHY, or trifluoromethyl, the above Y being a hexyl group substituted by ethyl.
In one embodiment of the present specification, R7 in chemical formula 1 is hydrogen.
In one embodiment of the present specification, R8 in chemical formula 1 is hydrogen.
In one embodiment of the present specification, R9 in chemical formula 1 is hydrogen.
In one embodiment of the present specification, R10 in chemical formula 1 is hydrogen.
In one embodiment of the present specification, R11 in chemical formula 1 is hydrogen.
In one embodiment of the present specification, R12 in chemical formula 1 is hydrogen.
In addition, the present inventionIn one embodiment of the specification, R13 to R17, which are the same or different from each other, are each independently hydrogen, deuterium, a halogen group, -OH, -SO3 -、-SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, an anionic group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group, wherein M is selected from Na+、K+、Rb+、Cs+、Fr+And a compound having an ammonium structure, wherein M1, M2, and Y are the same or different from each other and each independently selected from a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group, and at least one of R13 to R17 is an anionic group.
In one embodiment of the specification, R13 to R17, which may be the same or different from each other, are each independently hydrogen, -SO3 -、-SO3M or-SO2NHY, the above M and Y are the same as defined above, and at least one of the above R13 to R17 is an anionic group.
In one embodiment of the specification, R13 to R17, which may be the same or different from each other, are each independently hydrogen, -SO3 -、-SO3M, or-SO2NHY, the above M and Y are the same as defined above, and at least one of the above R13 to R17 is-SO3 -。
In one embodiment of the present disclosure, R13 is-SO3 -。
In one embodiment of the specification, R4 is hydrogen.
In one embodiment of the specification, R15 is hydrogen or-SO3M or-SO2NHY, M and Y above are as defined above.
In one embodiment of the specification, R16 is hydrogen.
In one embodiment of the specification, R17 is hydrogen.
In one embodiment of the present specification, X is an anionic group.
In one embodiment of the present specification, X is selected from an anion of a compound containing oxygen and at least one element selected from tungsten, molybdenum, silicon, and phosphorus; a triflate anion; bis (trifluoromethylsulfonyl) amide anion; bis (trifluoromethanesulfonyl) imide anion; bis-perfluoroethylsulfonimide anion; tetraphenylborate anion; tetrakis (4-fluorophenyl) borate; tetrakis (pentafluorophenyl) borate; tris (trifluoromethanesulfonyl) methide; and a compound in a halogen group.
In one embodiment of the present disclosure, X may be SO3 -。
In one embodiment of the present specification, R5 and R6 are integers of 0 to 4, R5 is 2 or more, R5 are the same or different from each other, and R6 is 2 or more, R6 is the same or different from each other.
In one embodiment of the present specification, R5 and R6 are integers of 0 to 3, R5 is 2 or more, R5 are the same or different from each other, and R6 is 2 or more, R6 are the same or different from each other.
In one embodiment of the present specification, R5 and R6 are integers of 0 to 2, R5 is 2 or more, R5 are the same or different from each other, and R6 is 2, R6 are the same or different from each other.
In one embodiment of the present specification, r5 and r6 are 0 or 1.
In one embodiment of the present specification, r5 and r6 are 0.
In one embodiment of the present specification, r5 and r6 are 1.
In one embodiment of the present specification, the chemical formula 1 may be represented by the following structure, the following structure represents an isomer of the chemical formula 1, and the chemical formula 1 represents a representative structure. Isomers refer to molecules of the same molecular formula but having different physical/chemical properties from each other.
In the above structure, L1, L2, R1 to R17, X, a, R5 and R6 are the same as defined in the above chemical formula 1.
The description of the isomers can be applied to all the xanthene dye structures described in the present specification.
In one embodiment of the present specification, the above-SO3M may represent-SO3 -And M ion binding or salt binding.
In one embodiment of the present specification, M is Na+、K+、Rb+、Cs+、Fr+And a compound containing an ammonium structure, which may contain a unit represented by the following chemical formula a or B.
[ chemical formula A ]
[ chemical formula B ]
In the above-mentioned chemical formula a,
ra to Rd, equal to or different from each other, are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, -L1-NHCO-R, or-L2-OCO-R, or two of Ra to Rd, wherein R is hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, and L is1And L2Is a substituted or unsubstituted alkylene group, and is,
in the above-mentioned chemical formula B,
rb to Rd are the same as or different from each other, and each independently is hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group, or two of Rb to Rd are combined with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, -L3-NHCO-, or-L4-OCO-, above-mentioned L3And L4Is a substituted or unsubstituted alkylene groupRe to Rg are the same or different from each other, and are each independently hydrogen or substituted or unsubstituted alkyl.
According to an embodiment of the present specification, in the chemical formula a, Ra to Rd are the same or different from each other, and each independently represents hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, a substituted or unsubstituted aralkyl group having 6 to 30 carbon atoms, -L1-NHCO-R, or-L2-OCO-R, wherein R is hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 30 carbon atoms, or two of Ra to Rd are bonded to each other to form a substituted or unsubstituted ring, and L is1And L2Is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms,
in the above chemical formula B, Rb to Rd are the same as or different from each other, and each independently is hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 30 carbon atoms, or two of Rb to Rd are combined with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms, a substituted or unsubstituted arylene group having 6 to 30 carbon atoms, -L3-NHCO-, or-L4-OCO-, above-mentioned L3And L4Is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms, and Re to Rg are the same or different from each other and each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
According to an embodiment of the present disclosure, in the chemical formula a, Ra to Rd are the same or different from each other, and each independently represents hydrogen, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted aralkyl group having 6 to 20 carbon atoms, -L1-NHCO-R, or-L2-OCO-R, or 2 of Ra to RdR is hydrogen, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 20 carbon atoms, and L is1And L2Is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms,
in the above chemical formula B, Rb to Rd are the same as or different from each other, and each independently is hydrogen, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 6 to 20 carbon atoms, or 2 of Rb to Rd are combined with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, -L3-NHCO-, or-L4-OCO-, above-mentioned L3And L4Is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, and Re to Rg are the same or different from each other and each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
In one embodiment of the present specification, the unit refers to a repeating structure in which a monomer is contained in a polymer, and the unit may be contained in a main chain in the polymer to constitute the polymer.
In one embodiment of the present specification, the compound including the unit represented by the above chemical formula B may be a polymer.
When the compound including the unit represented by the above chemical formula B is a polymer, the unit represented by the above chemical formula B may be included in a range of 1 to 500.
In one embodiment of the present specification, the weight average molecular weight of the compound including the unit represented by the above chemical formula B may be 1000 to 10000, preferably 3000 to 8000, more preferably 5000 to 7000.
According to an embodiment of the present specification, the terminal of the compound including the unit represented by the above chemical formula B may be hydrogen, a halogen group, or a substituted or unsubstituted alkyl group.
In one embodiment of the present specification, chemical formula 1 may be represented by chemical formula 2 below.
[ chemical formula 2]
In the above-described chemical formula 2,
l1, L2, R1 to R17, X, a, R5 and R6 are the same as defined in the above chemical formula 1.
In one embodiment of the present specification, chemical formula 1 may be represented by chemical formula 3 below.
[ chemical formula 3]
In the above-mentioned chemical formula 3,
l1, L2, R1 to R17, X, a, R5 and R6 are the same as defined in the above chemical formula 1.
In one embodiment of the present specification, chemical formula 1 may be represented by chemical formula 4 below.
[ chemical formula 4]
In the above-mentioned chemical formula 4,
l1, L2, R1 to R17, X, a, R5 and R6 are the same as defined in the above chemical formula 1.
In one embodiment of the present specification, the nitrogen atom-containing dianhydride group of chemical formula 1 may be a compound represented by any one of the following substituents.
Among the above-mentioned substituents, the above-mentioned,represents a site linked to the above chemical formula 1,
x1, X2, Y1 to Y3, which are identical to or different from one another, are each independently hydrogen, deuterium, a halogen group, nitro, -OH, -SO3H. -COOH, a phosphine group, an anionic group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, or adjacent groups may combine to form a substituted or unsubstituted ring.
In one embodiment of the present specification, the compound represented by the above chemical formula 1 may be represented by any one of the following chemical formulae.
In the above chemical formula, M and Y are the same as defined in the above chemical formula 1.
In one embodiment of the present specification, a substituent having no specified substitution position in a ring in the above chemical formula represents a substituent that may be substituted for any part of carbon contained in the ring.
In thatIn (1),is represented by-CF3In substituted benzene rings, except by-SCH3The carbon other than the substituted carbon may be substituted with any of the remaining carbons, and specifically, may be represented by the following 4 structures.
As another example, inIn (1),is represented by-SO2The NHY-substituted naphthalene ring may be substituted at any one of carbons included in naphthalene, and specifically, may be represented by the following 6 structures.
In the above 6 structures, Y is the same as defined above.
In addition, according to an embodiment of the present specification, a colorant composition containing the above compound can be provided.
The colorant composition may further include at least 1 of a dye and a pigment in addition to the compound of chemical formula 1. For example, the colorant composition may contain only the compound of the above chemical formula 1, but may contain the compound of the above chemical formula 1 and 1 or more kinds of dyes, or contain the compound of the above chemical formula 1 and 1 or more kinds of pigments, or contain the compound of the above chemical formula 1,1 or more kinds of dyes, and 1 or more kinds of pigments.
According to an embodiment of the present specification, a photosensitive resin composition containing the colorant composition can be provided.
According to an embodiment of the present disclosure, the photosensitive resin composition may further include a compound represented by the chemical formula 1, a binder resin, a polyfunctional monomer, a photopolymerization initiator, and a solvent.
The binder resin is not particularly limited as long as it can exhibit physical properties such as strength and developability of a film produced from the photosensitive resin composition.
The binder resin may be a copolymer resin of a polyfunctional monomer imparting mechanical strength and a monomer imparting alkali solubility, and may further include a binder generally used in the art.
The polyfunctional monomer for imparting mechanical strength to the film may be at least one of unsaturated carboxylic acid esters, aromatic vinyl compounds, unsaturated ethers, unsaturated imides, and acid anhydrides.
Specific examples of the unsaturated carboxylic acid ester include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate, and the like, Glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxyethyleneglycol (meth) acrylate, methoxytriethyleneglycol (meth) acrylate, methoxytripropyleneglycol (meth) acrylate, poly (ethyleneglycol) methyl ether (meth) acrylate, phenoxydiethyleneglycol (meth) acrylate, p-nonylphenoxypolyethyleneglycol (meth) acrylate, p-nonylphenoxypolypropyleneglycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, 1,1,1,3,3, 3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate, methyl (alpha-hydroxymethyl) acrylate, heptadecafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate, and mixtures thereof, Ethyl (α -hydroxymethyl) acrylate, propyl (α -hydroxymethyl) acrylate, and butyl (α -hydroxymethyl) acrylate, but are not limited thereto.
Specific examples of the aromatic vinyl group include, but are not limited to, styrene, α -methylstyrene, (o, m, p) -vinyltoluenes, (o, m, p) -methoxystyrenes, and (o, m, p) -chlorostyrenes.
Specific examples of the unsaturated ethers include, but are not limited to, vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether.
Specific examples of the unsaturated imides include, but are not limited to, N-phenylmaleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexylmaleimide.
Examples of the acid anhydride include, but are not limited to, maleic anhydride, methylmaleic anhydride, and tetrahydrophthalic anhydride.
The monomer for imparting alkali solubility is not particularly limited as long as it contains an acid group, and for example, one or more selected from (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethylmaleic acid, 5-norbornene-2-carboxylic acid, mono (2- ((meth) acryloyloxy) ethyl phthalate, mono-2- ((meth) acryloyloxy) ethyl succinate, and ω -carboxy polycaprolactone mono (meth) acrylate are preferably used, but not limited thereto.
According to one embodiment of the present disclosure, the binder resin has an acid value of 50 to 130KOHmg and a weight average molecular weight of 1000 to 50000.
The polyfunctional monomer is a monomer that functions to form a photoresist image by light, and specifically may be one or a mixture of two or more selected from the group consisting of propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl glycol diacrylate, 6-hexanediol diacrylate, 1, 6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxyethanol diacrylate, trihydroxyethyl isocyanurate trimethacrylate, trimethylpropane trimethacrylate, diphenyl pentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, and dipentaerythritol hexamethacrylate.
The photopolymerization initiator is not particularly limited as long as it is an initiator that generates a radical by light to trigger crosslinking, and may be, for example, one or more selected from acetophenone compounds, biimidazole compounds, triazine compounds, and oxime compounds.
The acetophenone compounds include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) one, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin butyl ether, 2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholino-1-propane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1-one Ketones, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2-methyl-1- [4- (methylthio) phenyl ] -2-morpholinopropan-1-one, and the like, but is not limited thereto.
Examples of the biimidazole compound include, but are not limited to, 2-bis (2-chlorophenyl) -4, 4', 5, 5' -tetraphenylbiimidazole, 2 '-bis (o-chlorophenyl) -4, 4', 5,5 '-tetrakis (3,4, 5-trimethoxyphenyl) -1, 2' -biimidazole, 2 '-bis (2, 3-dichlorophenyl) -4, 4', 5,5 '-tetraphenylbiimidazole, and 2, 2' -bis (o-chlorophenyl) -4,4,5,5 '-tetraphenyl-1, 2' -biimidazole.
The triazine compound includes 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 1,1,1,3,3, 3-hexafluoroisopropyl-3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid ester, ethyl 2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid ester, 2-epoxyethyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } ethanoic acid ester, cyclohexyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } ethanoic, Benzyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, 3- { chloro-4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanamide, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2,4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl) -1, 3-butadiene-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, and the like, but is not limited thereto.
Examples of the oxime compounds include, but are not limited to, 1- (4-phenylthio) phenyl-1, 2-octanedione-2- (O-benzoyloxime) (CIBA-GEIGY Co., Ltd., CGI 124), 1- (9-ethyl) -6- (2-methylbenzoyl-3-yl) -ethanone-1- (O-acetyloxime) (CGI 242), and N-1919(ADECA Co., Ltd.).
The solvent is selected from acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, and 1, 4-bisAlkane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, chloroform, methylene chloride, 1, 2-dichloroethane, 1,1, 1-trichloroethane, 1,1, 2-trichloroethylene, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tert-butanol, 2-ethoxypropanol, 2-methoxypropanol, 3-methoxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, methyl cellosolve acetate, ethyl cellosolve, ethyl, One or more of propylene glycol monomethyl ether and dipropylene glycol monomethyl ether, but not limited thereto.
In one embodiment of the present specification, the content of the compound represented by the chemical formula 1 is 5 to 60% by weight, the content of the binder resin is 1 to 60% by weight, the content of the photopolymerization initiator is 0.1 to 20% by weight, the content of the polyfunctional monomer is 0.1 to 50% by weight, and the content of the solvent is 10 to 80% by weight, based on the total weight of the photosensitive resin composition.
According to one embodiment of the present disclosure, the content of the compound represented by the chemical formula 1 is 5 to 60% by weight, the content of the binder resin is 1 to 60% by weight, the content of the photopolymerization initiator is 0.1 to 20% by weight, and the content of the polyfunctional monomer is 0.1 to 50% by weight, based on the total weight of solid components in the photosensitive resin composition.
Specifically, in the photosensitive resin composition, the content of the compound represented by the chemical formula 1 is 5 to 50% by weight, the content of the binder resin is 1 to 50% by weight, the content of the photopolymerization initiator is 0.1 to 10% by weight, and the content of the polyfunctional monomer is 0.1 to 45% by weight, based on the total weight of solid components in the photosensitive resin composition.
The total weight of the solid components means the sum of the total weight of the components other than the solvent in the resin composition. The amount of the solid component or the weight% of the solid component of each component can be measured by a general analytical means used in the art such as liquid chromatography or gas chromatography.
According to an embodiment of the present disclosure, the photosensitive resin composition may further include an additive.
In one embodiment of the present specification, the photosensitive resin composition may further include an additive in an amount of 0.1 to 20 wt% based on the total weight of the photosensitive resin composition.
According to another embodiment of the present specification, the content of the additive is 0.1 to 20% by weight based on the total weight of solid components in the photosensitive resin composition.
Specifically, the content of the additive is 0.1 to 10% by weight based on the total weight of the solid content in the photosensitive resin composition.
According to one embodiment of the present disclosure, the photosensitive resin composition further includes 1 or 2 or more additives selected from a photocrosslinking sensitizer, a curing accelerator, an antioxidant, an adhesion promoter, a surfactant, a thermal polymerization inhibitor, an ultraviolet absorber, a dispersant, and a leveling agent.
According to an embodiment of the present disclosure, the content of the additive is 0.1 to 20% by weight based on the total weight of the solid content in the photosensitive resin composition.
According to one embodiment of the present disclosure, the photosensitive resin composition further includes 1 or 2 or more additives selected from a photocrosslinking sensitizer, a curing accelerator, an adhesion promoter, a surfactant, a thermal polymerization inhibitor, an ultraviolet absorber, a dispersant, and a leveling agent.
According to an embodiment of the present disclosure, the content of the additive is 0.1 to 20% by weight based on the total weight of the solid content in the photosensitive resin composition.
As the photo-crosslinking sensitizer, benzophenone-based compounds selected from benzophenone, 4, 4-bis (dimethylamino) benzophenone, 4, 4-bis (diethylamino) benzophenone, 2,4, 6-trimethylaminobenzophenone, methyl o-benzoylbenzoate, 3-dimethyl-4-methoxybenzophenone, 3,4, 4-tetrakis (t-butylperoxycarbonyl) benzophenone, and the like; fluorenone compounds such as 9-fluorenone, 2-chloro-9-fluorenone, and 2-methyl-9-fluorenone; thioxanthone compounds such as thioxanthone, 2, 4-diethylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone and diisopropylthioxanthone; xanthone-based compounds such as xanthone and 2-methylxanthone; anthraquinone compounds such as anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, tert-butylanthraquinone, and 2, 6-dichloro-9, 10-anthraquinone; acridine compounds such as 9-phenylacridine, 1, 7-bis (9-acridinyl) heptane, 1, 5-bis (9-acridinylpentane), 1, 3-bis (9-acridinyl) propane and the like; dicarbonyl compounds such as benzil, 1,7, 7-trimethyl-bicyclo [2,2,1] heptane-2, 3-dione, and 9, 10-phenanthrenequinone; phosphine oxide compounds such as 2,4, 6-trimethylbenzoyldiphenylphosphine oxide and bis (2, 6-dimethoxybenzoyl) -2,4, 4-trimethylpentylphosphine oxide; benzoate compounds such as methyl 4- (dimethylamino) benzoate, ethyl 4- (dimethylamino) benzoate, and 2-n-butoxyethyl-4- (dimethylamino) benzoate; amino synergists such as 2, 5-bis (4-diethylaminobenzylidene) cyclopentanone, 2, 6-bis (4-diethylaminobenzylidene) cyclohexanone, and 2, 6-bis (4-diethylaminobenzylidene) -4-methyl-cyclopentanone; coumarin-based compounds such as 3, 3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7-methoxy-coumarin, and 10, 10-carbonylbis [1,1,7, 7-tetramethyl-2, 3,6, 7-tetrahydro-1H, 5H,11H-C1] -benzopyrano [6,7,8-ij ] -quinolizin-11-one; chalcone compounds such as 4-diethylaminochalcone and 4-azidobenzalacetophenone; more than 1 of 2-benzoyl methylene and 3-methyl-b-naphthothiazoline.
The above-mentioned curing accelerator is used for curing and improving mechanical strength, and specifically, it is possible to use a curing accelerator selected from the group consisting of 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, and 2-mercaptobenzothiazole1 or more of oxazole, 2, 5-dimercapto-1, 3, 4-thiadiazole, 2-mercapto-4, 6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), pentaerythritol-tris (3-mercaptopropionate), pentaerythritol-tetrakis (2-mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), and trimethylolpropane-tris (3-mercaptopropionate).
As the adhesion promoter used in the present specification, 1 or more species selected from methacryloxy-propyl-trimethoxysilane, methacryloxy-propyl-dimethoxysilane, methacryloxy-propyl-triethoxysilane, methacryloxy-propyl-dimethoxysilane and other methacryloxy-silane coupling agents can be used, and as the alkyl-trimethoxysilane, 1 or more species selected from octyl-trimethoxysilane, dodecyl-trimethoxysilane, octadecyl-trimethoxysilane and the like can be used.
The surfactant is a silicon surfactant or a fluorine surfactant, and specifically, BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-375, BYK-380, BYK-390, etc. of BYK-Chemicals, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-177, BYK-390, etc. of BYK-Chemicals, etc. of BYK-177, etc. can be used as the fluorine surfactant, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116-1121, TF-1132, TF1027SF, TF-1441, TF-1442, and the like, but not limited thereto.
The antioxidant may be at least 1 kind selected from Hindered phenol (Hindered phenol) antioxidants, amine antioxidants, sulfur antioxidants, and phosphine antioxidants, but is not limited thereto.
Specific examples of the antioxidant include phosphoric acid-based heat stabilizers such as phosphoric acid, trimethyl phosphate and triethyl phosphate; such as 2, 6-di-tert-butyl-p-cresol, octadecyl-3- (4-hydroxy-3, 5-di-tert-butylphenyl) propionate, tetrakis [ methylene-3- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionate ] methane, 1,3, 5-trimethyl-2, 4, 6-tris (3, 5-di-tert-butyl-4-hydroxybenzyl) benzene, diethyl 3, 5-di-tert-butyl-4-hydroxybenzylphosphite, 2-thiobis (4-methyl-6-tert-butylphenol), 2,6-g, t-butylphenol 4,4 '-butylidene-bis (3-methyl-6-tert-butylphenol), 4' -thiobis (3-methyl-6-tert-butylphenol) or bis [3 ", hindered phenol (hinded phenol) primary antioxidants such as 3-Bis- (4 '-hydroxy-3' -t-butylphenyl) butanoic acid ethylene glycol ester (Bis [3,3-Bis- (4 '-hydroxy-3' -tert-butyl-phenyl) butanoic acid ] glycol ester); amine-based auxiliary antioxidants such as phenyl- α -naphthylamine, phenyl- β -naphthylamine, N '-diphenyl-p-phenylenediamine or N, N' -di- β -naphthyl-p-phenylenediamine; a sulfur-based auxiliary antioxidant such as dilauryl disulfide, dilauryl thiopropionate, distearyl thiopropionate, mercaptobenzothiazole, or tetramethylthiuram disulfide tetrakis [ methylene-3- (laurylthio) propionate ] methane; or phosphite-based auxiliary antioxidants such as triphenyl phosphite, tris (nonylphenyl) phosphite, triisodecyl phosphite, Bis (2, 4-dibutylphenyl) pentaerythritol Diphosphite (Bis (2, 4-dittouylphenyl) pentaerythrityl Diphosphite) or tetrakis [2,4-Bis (1,1-dimethylethyl) phenyl ] 1,1 ' -diyl diphosphonite ((1,1 ' -Biphenyl) -4, 4' -diylbisphosphous acid tetrakis [2,4-Bis (1, 1-dimethyllethyl) phenyl ] ester).
Examples of the ultraviolet absorber include, but are not limited to, 2- (3-tert-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole and alkoxybenzophenone, and any materials commonly used in the art can be used.
The thermal polymerization inhibitor may include, for example, 1 or more selected from the group consisting of p-anisole, hydroquinone, catechol (pyrocathol), t-butylcatechol (t-butyl cathol), N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, benzoquinone, 4-thiobis (3-methyl-6-t-butylphenol), 2-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole, and phenothiazine (phenothiazine), but is not limited thereto, and may include a thermal polymerization inhibitor generally known in the art.
The dispersant may be used by a method of internally adding the dispersant to the pigment in a form in which the pigment is surface-treated in advance, or a method of externally adding the dispersant to the pigment. As the dispersant, a compound type, nonionic, anionic or cationic dispersant can be used, and examples thereof include fluorine type, ester type, cationic type, anionic type, nonionic type, amphoteric surfactant and the like. These may be used individually or in combination of two or more.
Specifically, the dispersant includes at least 1 kind selected from the group consisting of polyalkylene glycol and esters thereof, polyoxyalkylene polyol, ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonate, carboxylate, alkylamide alkylene oxide adduct, and alkylamine, but is not limited thereto.
The leveling agent may be polymerizable or non-polymerizable. Specific examples of the polymerizable leveling agent include polyethyleneimine, polyamidoamine, and a reaction product of an amine and an epoxide, and specific examples of the non-polymerizable leveling agent include a non-polymerizable sulfur-containing compound and a non-polymerizable nitrogen-containing compound, but the non-polymerizable leveling agent is not limited thereto, and any leveling agent commonly used in the art can be used.
According to one embodiment of the present specification, there is provided a photosensitive material produced using the photosensitive resin composition.
More specifically, the photosensitive resin composition of the present specification is applied to a substrate by an appropriate method and cured to form a photosensitive material in the form of a thin film or a pattern.
The coating method is not particularly limited, and a spray coating method, a roll coating method, a spin coating method, and the like can be used, and a spin coating method is generally widely used. Further, after the coating film is formed, part of the residual solvent may be removed under reduced pressure according to circumstances.
Examples of the light source for curing the photosensitive resin composition according to the present specification include, but are not limited to, a mercury vapor arc (arc), a carbon arc, and a Xe arc, which emit light having a wavelength of 250 to 450 nm.
The photosensitive resin composition according to the present specification can be used for a pigment dispersion type photosensitive material for manufacturing a color filter of a thin film transistor liquid crystal display device (TFT LCD), a photosensitive material for forming a black matrix of a thin film transistor liquid crystal display device (TFT LCD) or an organic light emitting diode, a photosensitive material for forming an overcoat layer, a photosensitive material for a column spacer, a photocurable coating material, a photocurable ink, a photocurable adhesive, a printing plate, a photosensitive material for a printed wiring board, a photosensitive material for a Plasma Display Panel (PDP), and the like, but the use thereof is not particularly limited.
According to one embodiment of the present specification, a color filter including the photosensitive material is provided.
The color filter may be manufactured using a photosensitive resin composition including the compound represented by chemical formula 1. The color filter can be formed by applying the photosensitive resin composition on a substrate to form a coating film, and exposing, developing and curing the coating film.
The photosensitive resin composition according to one embodiment of the present description has excellent heat resistance and little color change due to heat treatment, and thus can provide a color filter having high color reproducibility and high brightness and contrast even after a curing process in the production of the color filter.
The substrate may be a glass plate, a silicon wafer, a plastic-based plate such as Polyethersulfone (PES) or Polycarbonate (PC), and the like, and the type thereof is not particularly limited.
Specifically, the photosensitive resin composition according to one embodiment of the present specification may be applied to glass (5 × 5 cm)2) Spin coating (spinning) was performed thereon, and a film was formed by performing a 100-second prebaking process (prebake) at 100 ℃. The distance between the substrate on which the film was formed and a photomask (photo mask) was set to 250 μm, and the entire surface of the substrate was irradiated with 40mJ/cm by an exposure machine2The amount of exposure. Then, the exposed substrate was developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and post-baking treatment (postbake) was performed at 230 ℃ for 20 minutes to fabricate a substrate.
The heat resistance evaluation can be measured by a method described later, and the substrate manufactured according to the above embodiment is used to obtain a transmittance spectrum in the visible light region in the range of 380nm to 780nm by a spectrometer. In addition, the pre-bake treated (prebake) substrate was further subjected to post-bake treatment (postbake) at 230 ℃ for 20 minutes, and a transmittance spectrum was obtained in the same apparatus and measurement range.
The spectrometer may be a spectrometer from MCPD-tsukamur corporation, but is not limited thereto.
Using the transmittance spectrum and C light source obtained above, the backlight was used, and the obtained value E (L, a, b) was used to calculate the color change (hereinafter referred to as Δ Eab). A small value of Δ Eab indicates excellent color heat resistance. When Δ Eab <3, the colorant can be used as a color filter colorant and is excellent in heat resistance. Specifically, the equation for calculating Δ Eab is as follows.
[ calculation formula 1]
ΔEab(L*,a*,b*)={(ΔL*)2+(Δa*)2+(Δb*)2}1/2
The contrast can be measured by the method described later. The substrate produced by the above-described substrate production method was placed between 2 polarizing plates using a contrast measuring instrument, and the brightness when the 2 polarizing plates were horizontal and the brightness when the 2 polarizing plates were orthogonal were measured, and the contrast was calculated by the following equation 2.
[ calculation formula 2]
Contrast ratio of 2 pieces of polarization plate horizontal brightness/2 pieces of polarization plate vertical brightness
The contrast measuring instrument may be a measuring instrument of ZOENTECH, CT-1, but is not limited thereto.
The fluorescence intensity of the color filter according to one embodiment of the present specification can be measured by setting an excitation wavelength (excitation wavelength) to 545nm and an emission wavelength (emission wavelength) to 560nm to 720nm at normal temperature (25 ℃) with FS-2 fluorescence measuring equipment available from Sinco corporation.
The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
According to another embodiment, the color filter may further include an overcoat layer.
For the purpose of improving contrast, a lattice-like black pattern called a black matrix may be arranged between the color pixels of the color filter. As a material of the black matrix, chromium may be used. In this case, a method of forming a pattern by depositing chromium on the entire glass substrate and performing etching treatment may be used. However, a resin black matrix obtained by a microfabricatable pigment dispersion method can be used in consideration of high process costs, high reflectance of chromium, and environmental pollution caused by chromium waste liquid.
The black matrix may use a black pigment or a black dye as a coloring material. For example, carbon black may be used alone or carbon black and a coloring pigment may be used in combination, and in this case, since the coloring pigment having insufficient light-shielding property is mixed, there is an advantage that even if the amount of the coloring material is relatively increased, the strength of the film and the adhesion to the substrate are not reduced.
A display device including a color filter according to the present specification is provided.
The Display device may be any one of a Plasma Display (PDP), a Light Emitting Diode (LED), an Organic Light Emitting Diode (OLED), a Liquid Crystal Display (LCD), a Thin film transistor-Liquid Crystal Display (LCD-TFT), and a Cathode Ray Tube (CRT).
Modes for carrying out the invention
< example >
< Synthesis example of Compound >
Synthesis example 1: synthesis of Compound 1
Synthesis of intermediate 1
A250 ml two-necked Round Bottom Flask (RBF, Round Bottom flash) was charged with 5g (12.34mmol) of A-1, 10.31g (74.03mmol) of B-1 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
Then, the resulting precipitate was filtered and washed under reduced pressure, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 7g (11.46mmol) of intermediate 1.
Ionization mode APCI +: m/z 611[ M + H ], Exact Mass (Exact Mass): 610
Synthesis of Compound 1
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.5g (2.46mmol) of intermediate 1, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes. The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, to give 1.3g (1.358mmol) of compound 1.
Ionization mode APCI +: m/z 957[ M + H ], Exact Mass (Exact Mass): 956
Synthesis example 2: synthesis of Compound 2
Synthesis of intermediate 2
A250 ml two-necked Round Bottom Flask (RBF, Round Bottom flash) was charged with 5g (12.34mmol) of A-1, 14.90g (74.03mmol) of B-2 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
Then, the precipitate was filtered under reduced pressure and washed with water, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 7.2g (9.80mmol) of intermediate 2.
Ionization mode APCI +: m/z 735[ M + H ], Exact Mass (Exact Mass): 734
Synthesis of Compound 2
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.808g (2.46mmol) of intermediate 2, 2.958g (9) were placed.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
Then, the resulting precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 1g (0.925mmol) of compound 2.
Ionization mode APCI +: m/z 1081[ M + H ], Exact Mass (Exact Mass): 1081
Synthesis example 3: synthesis of Compound 3
Synthesis of intermediate 3
A250 ml two-necked Round Bottom Flask (RBF, Round Bottom flash) was charged with 5g (12.34mmol) of A-1, 10.31g (74.03mmol) of B-3 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
Then, the precipitate was filtered under reduced pressure and washed with water, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 6.8g (11.130mmol) of intermediate 3.
Ionization mode APCI +: m/z 611[ M + H ], Exact Mass (Exact Mass): 610
Synthesis of Compound 3
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.502g (2.46mmol) of intermediate 3, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyroli)done) was stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
Then, the precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 1.4g (1.463mmol) of compound 3.
Ionization mode APCI +: m/z 957[ M + H ], Exact Mass (Exact Mass): 956
Synthesis example 4: synthesis of Compound 4
Synthesis of intermediate 4
A250 ml two-necked Round Bottom Flask (RBF, Round Bottom flash) was charged with 5g (12.34mmol) of A-1, 10.31g (74.03mmol) of B-41 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
Then, the precipitate was filtered under reduced pressure and washed with water, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 6.5g (10.64mmol) of intermediate 4.
Ionization mode APCI +: 611{ M + H ═ M/z]Exact Mass (Exact Mass): 610Synthesis of Compound 4
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.502g (2.46mmol) of intermediate 4, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, to give 1.7g (1.776mmol) of compound 4.
Ionization mode APCI +: m/z 957[ M + H ], Exact Mass (Exact Mass): 956
Synthesis example 5: synthesis of Compound 5
Synthesis of intermediate 5
In a 250ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 5g (12.34mmol) of A-1, 14.30g (74.03mmol) of B-5 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) were added and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
Then, the precipitate was filtered under reduced pressure and washed with water, and dried in a vacuum oven at 60 ℃ for 12 hours, thereby obtaining 7.2g (10.02mmol) of intermediate 5.
Ionization mode APCI +: m/z 719[ M + H ], Exact Mass (Exact Mass): 718
Synthesis of Compound 5
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.768g (2.46mmol) of intermediate 5, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, to give 2.1g (1.972mmol) of compound 5.
Ionization mode APCI +: m/z 1065[ M + H ], Exact Mass (Exact Mass): 1064
Synthesis example 6: synthesis of Compound 6
Synthesis of intermediate 6
In a 250ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 5g (12.34mmol) of A-1, 15.33g (74.03mmol) of B-6 and 80g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) were added and stirred. After the reaction solution was cooled to normal temperature by heating to 150 ℃ and stirring for 4 hours, 800ml of 1M hydrochloric acid (HCl) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, and dried in a vacuum oven at 60 ℃ for 12 hours, whereby 7.4g (9.91mmol) of intermediate 6 was obtained.
Ionization mode APCI +: m/z 747[ M + H ], Exact Mass (Exact Mass): 746
Synthesis of Compound 6
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.837g (2.46mmol) of intermediate 6, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours to obtain 2.5g (2.287mmol) of compound 6.
Ionization mode APCI +: m/z 1093[ M + H]Exact Mass (Exact Mass): 1092Synthesis example 7: chemical combination Synthesis of substance 7
Compound 7 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 1.
Ionization mode APCI +: m/z 985[ M + H ], Exact Mass (Exact Mass): 984
Synthesis example 8: synthesis of Compound 8
Compound 8 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 2.
Ionization mode APCI +: m/z 1109[ M + H ], Exact Mass (Exact Mass): 1108
Synthesis example 9: synthesis of Compound 9
Compound 9 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 3.
Ionization mode APCI +: m/z 985[ M + H ], Exact Mass (Exact Mass): 984
Synthesis example 10: synthesis of Compound 10
Compound 10 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 4.
Ionization mode APCI +: m/z 985[ M + H ], Exact Mass (Exact Mass): 984
Synthesis example 11: synthesis of Compound 11
Compound 11 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 5.
Ionization mode APCI +: m/z 1093[ M + H ], Exact Mass (Exact Mass): 1092
Synthesis example 12: synthesis of Compound 12
Compound 12 was obtained in the same manner as described above except that C-1 was changed to C-2 in the production of Compound 6.
Ionization mode APCI +: m/z 1121[ M + H ], Exact Mass (Exact Mass): 1120
Synthesis examples 13 to 18: synthesis of Compounds 13 to 18
Except that C-1 was changed to C-3 in the production of compounds 1 to 6, compounds 13 to 18 shown below were obtained by the same method.
Compound 13: ionization mode APCI +: m/z 1085[ M + H ], Exact Mass (Exact Mass): 1084
Compound 14: ionization mode APCI +: m/z 1209[ M + H ], Exact Mass (Exact Mass): 1208
Compound 15: ionization mode APCI +: m/z 1085[ M + H ], Exact Mass (Exact Mass): 1084
Compound 16: ionization mode APCI +: m/z 11085[ M + H ], Exact Mass (Exact Mass): 1084
Compound 17: ionization mode APCI +: m/z 1193[ M + H ], Exact Mass (Exact Mass): 1192
Compound 18: ionization mode APCI +: m/z 1221[ M + H ], Exact Mass (Exact Mass): 1220
Comparative compound 1.
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.414g (2.46mmol) of S1, 1.21g (9.82mmol) of bromopropane (bromopropane), 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, to obtain comparative compound 1.
Ionization mode APCI +: m/z 659[ M + H ], Exact Mass (Exact Mass): 658
In a 100ml two-necked Round Bottom Flask (RBF, Round Bottom flash), 1.4234g (2.46mmol) of S2, 3.094g (9.82mmol) of C-2, 1.358g (9.82mmol) of potassium carbonate (K)2CO3) Was added to 30g of N-Methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. After the reaction solution was cooled to normal temperature by heating to 100 ℃ and stirring for 6 hours, 500ml of distilled Water (DI-Water) was added and stirred for 30 minutes.
The precipitate was filtered under reduced pressure and washed with water, separated by column chromatography, and dried in a vacuum oven at 60 ℃ for 12 hours, to obtain comparative compound 2.
Ionization mode APCI +: m/z 953[ M + H ], Exact Mass (Exact Mass): 952
Comparative Compound 3
In synthetic example 1, comparative compound 3 was synthesized by the same method as the synthesis of intermediate 1, using S3 and S4 instead of a-1 and B-1.
Comparative Compound 4
To 50g of 98% sulfuric acid at 10 ℃ was added 3g (4.553mmol) of comparative compound 1 to dissolve it. Then, 0.807g (4.553mmol) of N-hydroxymethylphthalimide (N-hydroxymethyphthalamide) was added, and the mixture was heated to 45 ℃ and stirred for 2 hours. The reaction solution was added to 500g of water to precipitate crystals, and the precipitate was filtered under reduced pressure to obtain comparative compound 4.
Example 1
5.554g of compound 1, 10.376g of a copolymer of benzyl methacrylate and methacrylic acid as a binder resin (molar ratio 70:30, acid value 113KOH mg/g, weight average molecular weight 20000g/mol measured by Gel Permeation Chromatography (GPC)), molecular weight distribution (PDI)2.0g, solid content (S.C) 25% including Polypropylene Glycol Monomethyl Ether Acetate (PGMEA) as a solvent, 2.018g of I-369(BASF Co.) as a photopolymerization initiator, 12.443g of DPHA (Japan chemical agent) as a polyfunctional monomer, 68.593g of PGMEA (polypropylene glycol monomethyl ether acetate) as a solvent, and 1.016g of F-475 (DIC Co.) as a surfactant as an additive were mixed, thereby producing photosensitive resin composition 1.
Examples 2 to 18
Comparative example 1
5.554g of comparative compound 1, 10.376g of a copolymer of benzyl methacrylate and methacrylic acid as a binder resin (molar ratio 70:30, acid value 113KOH mg/g, weight average molecular weight 20000g/mol measured by Gel Permeation Chromatography (GPC)), molecular weight distribution (PDI)2.0g, solid content (S.C) 25% including Polypropylene Glycol Monomethyl Ether Acetate (PGMEA) as a solvent, 2.018g of I-369(BASF corporation) as a photopolymerization initiator, 12.443g of DPHA (Japan chemical agent) as a polyfunctional monomer, 68.593g of PGMEA (polypropylene glycol monomethyl ether acetate) as a solvent, and 1.016g of F-475 (DIC corporation) as a surfactant as an additive were mixed to produce the photosensitive resin composition of comparative example 1.
Comparative examples 2 to 4
Photosensitive resin compositions of comparative examples 2 to 4 were produced with the same composition except that comparative compound 1 was changed to comparative compounds 2 to 4 in comparative example 1.
< Experimental example >
Substrate fabrication
The photosensitive resin compositions according to examples 1 to 18 and comparative examples 1 to 4 were used for substrate production, respectively, specifically, the photosensitive resin compositions according to examples 1 to 18 and comparative examples 1 to 4 were coated on glass (5 × 5 cm. about.2) Spin coating (spinning) was performed thereon, and prebaking (prebake) was performed at 100 ℃ for 100 seconds to form a film.
The distance between the substrate on which the film was formed and a photomask (photo mask) was set to 250 μm, and the entire surface of the substrate was irradiated with 40mJ/cm by an exposure machine2The amount of exposure. Then, the exposed substrate was developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and post-baking treatment (post cake) was performed at 230 ℃ for 20 minutes to fabricate a substrate.
Evaluation of Heat resistance
The substrate produced by the above-described substrate production method was used to obtain a transmittance spectrum in the visible light region in the range of 380nm to 780nm by a spectrometer (MCPD-tsukamur corporation). In addition, the pre-bake treated (prebake) substrate was further subjected to post-bake treatment (post-bake) at 230 ℃ for 20 minutes, and a transmittance spectrum was obtained in the same apparatus and measurement range.
Using the obtained transmittance spectrum and C light source backlight, the color change (hereinafter referred to as Δ Eab) was calculated from the obtained value E (L, a, b), and is shown in table 1 below.
A small value of Δ Eab indicates excellent color heat resistance.
When the amount of the colorant has a value of Δ Eab <3, the colorant can be used as a color filter colorant and is excellent in heat resistance. Specifically, the equation for calculating Δ Eab is as follows.
[ calculation formula 1]
ΔEab(L*,a*,b*)={(ΔL*)2+(Δa*)2+(Δb*)2}1/2
[ Table 1]
Delta Eab (post-bake treatment-pre-bake treatment) | |
Example 1 | 1.28 |
Example 2 | 1.27 |
Example 3 | 0.85 |
Example 4 | 1.36 |
Example 5 | 1.75 |
Example 6 | 0.94 |
Example 7 | 1.45 |
Example 8 | 1.39 |
Example 9 | 1.12 |
Example 10 | 1.47 |
Example 11 | 1.68 |
Example 12 | 1.27 |
Example 13 | 0.97 |
Example 14 | 1.54 |
Example 15 | 1.98 |
Example 16 | 1.76 |
Example 17 | 1.64 |
Example 18 | 1.44 |
Referring to table 1 above, it was confirmed that the color pattern substrates formed using the photosensitive resin compositions of examples 1 to 18 of the present invention had a difference (Δ Eab) between the transmission spectra after the post-baking treatment and the post-baking treatment of less than 3, and had high color stability, very little color difference, and excellent heat resistance.
Contrast determination
The substrate produced by the above-described substrate production method was placed between 2 polarizing plates by using a contrast measuring instrument (CT-1, ZOENTECH corporation), and the brightness when the 2 polarizing plates were horizontal and the brightness when the 2 polarizing plates were orthogonal were measured, and the contrast was calculated by the following equation 2.
[ calculation formula 2]
Contrast ratio of 2 pieces of polarization plate horizontal brightness/2 pieces of polarization plate vertical brightness
The contrast improvement ratio was calculated from the contrast calculated by the above equation 2 by the following equation 3, and is shown in the following table 2.
[ calculation formula 3]
Contrast improvement rate (contrast of example-contrast of comparative example 1,2 or 4)/contrast of comparative example 1,2 or 4 100)
[ Table 2]
Referring to the above table 2, it can be confirmed that the contrast of the above examples 1 to 18 is improved by 220.47% to 532.38% as compared to the above comparative example 1. Further, it was confirmed that the contrast of the above examples 1 to 18 was improved by 136.48% to 329.57% as compared with the above comparative example 2. Further, it was confirmed that the contrast of the above examples 1 to 18 was improved by 197.83% to 510.43% as compared with the above comparative example 4.
Measurement of fluorescence intensity
The fluorescence intensity of the substrate produced by the above-described substrate production method was measured at room temperature (25 ℃) using FS-2 fluorescence measuring equipment from Sinco corporation, with an excitation wavelength (excitation wavelength) of 545nm and an emission wavelength (emission wavelength) of 560nm to 720nm, and is shown in fig. 1.
From fig. 1, it was confirmed that examples 6,7 and 12 according to an embodiment of the present specification have a lower fluorescence intensity than comparative examples 1 and 2, and an excellent contrast can be obtained without adding an additional dye.
Evaluation of transmittance
The substrate prepared by the above-described substrate preparation method was subjected to post-baking treatment (postbake) at 230 ℃ for 20 minutes by a spectrometer (MCPD-tsukamur corporation), and a transmittance spectrum in the visible light region in the range of 380nm to 780nm was obtained.
Particularly, in the case of a blue color filter, when the maximum transmittance is high at 380nm to 480nm in the visual x, visual y, and visual z, more excellent luminance can be displayed.
Fig. 2 shows visual x, visual y, and visual z.
[ Table 3]
Transmittance (% maximum transmittance at 380nm to 480 nm) | |
Example 1 | 95.756 |
Example 7 | 92.906 |
Example 13 | 95.721 |
Comparative example 3 | 88.528 |
Referring to table 3, it is understood that the maximum transmittances at 380nm to 480nm are higher in examples 1,7 and 13 than in comparative example 3.
From fig. 3, it can be confirmed that examples 1,7 and 13 according to an embodiment of the present specification can exhibit more excellent luminance in the blue color filter than comparative example 3 in transmittance at 380nm to 480 nm.
Claims (14)
1. A compound represented by the following chemical formula 1:
chemical formula 1
In the chemical formula 1, the first and second organic solvents,
l1 and L2, which are identical to or different from each other, are each independently a substituted or unsubstituted alkylene group,
r1 and R2, which may be the same or different from each other, are each independently a dianhydride group containing a nitrogen atom,
r3 and R4, which are the same or different from each other, are each independently a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group,
r5 to R12, equal to or different from each other, are each independently selected from hydrogen, deuterium, a halogen group, -OH, -SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
r13 to R17, equal to or different from each other, are each independently hydrogen, deuterium, a halogen group, -OH, -SO3 -、-SO3H、-SO3M、-SO2NM1M2、-SO2NHY, -COOH, anionic group, substituted or unsubstituted alkyl, substituted or unsubstitutedA substituted cycloalkyl, substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl,
m is selected from Na+、K+、Rb+、Cs+、Fr+And a compound comprising an ammonium structure,
m1, M2 and Y, which are the same or different from each other, are each independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group,
at least one of the R13 to R17 is an anionic group,
x is an anionic group, and X is an anionic group,
a is 0 or 1, and a is,
r5 and R6 are integers of 0 to 4, and when R5 is 2 or more, R5 are the same as or different from each other, and when R6 is 2 or more, R6 are the same as or different from each other.
2. The compound according to claim 1, wherein X is selected from anions of compounds containing oxygen and at least one element selected from tungsten, molybdenum, silicon, and phosphorus; a triflate anion; bis (trifluoromethylsulfonyl) amide anion; bis (trifluoromethanesulfonyl) imide anion; bis-perfluoroethylsulfonimide anion; tetraphenylborate anion; tetrakis (4-fluorophenyl) borate; tetrakis (pentafluorophenyl) borate; tris (trifluoromethanesulfonyl) methide; and a halogen group.
3. The compound of claim 1, wherein said M is selected from Na+、K+、Rb+、Cs+、Fr+And a compound comprising an ammonium structure,
the compound including an ammonium structure includes a unit represented by the following chemical formula a or represented by the following chemical formula B:
chemical formula A
Chemical formula B
In the chemical formula A, the compound represented by the formula A,
ra to Rd, equal to or different from each other, are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, -L1-NHCO-R, or-L2-OCO-R, or 2 of Ra to Rd, in combination with each other, form a substituted or unsubstituted ring,
r is hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl,
said L1And L2Is a substituted or unsubstituted alkylene group, and is,
in the chemical formula B, the compound represented by the formula,
rb to Rd, which are the same as or different from each other, are each independently hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group, or 2 of Rb to Rd are combined with each other to form a substituted or unsubstituted ring,
z is a substituted or unsubstituted alkylene, substituted or unsubstituted arylene, -L3-NHCO-, or-L4-OCO-,
Said L3And L4Is a substituted or unsubstituted alkylene group, and is,
re to Rg are the same or different from each other, and are each independently hydrogen, or substituted or unsubstituted alkyl.
7. The compound of claim 1, wherein the dianhydride group containing a nitrogen atom is represented by any of the following substituents:
among the substituents mentioned above, the group of the substituted,represents a site linked to the chemical formula 1,
x1, X2 and Y1 to Y3, which are identical to or different from one another, are each independently hydrogen, deuterium, a halogen group, nitro, -OH, -SO3H. -COOH, phosphino, anionic group, substituted or unsubstituted alkyl groupOr substituted or unsubstituted aryl, or adjacent groups combine to form a substituted or unsubstituted ring.
9. A photosensitive resin composition comprising the compound according to any one of claims 1 to 8, a binder resin, a polyfunctional monomer, a photopolymerization initiator, and a solvent.
10. The photosensitive resin composition according to claim 9, wherein the content of the compound represented by chemical formula 1 is 5 to 60% by weight based on the total weight of solid components in the photosensitive resin composition,
the content of the binder resin is 1 to 60% by weight,
the photopolymerization initiator is contained in an amount of 0.1 to 20 wt%,
the content of the polyfunctional monomer is 0.1 to 50% by weight.
11. The photosensitive resin composition according to claim 9, further comprising an additive.
12. A photosensitive material produced using the resin composition according to claim 9.
13. A color filter comprising the photosensitive material of claim 12.
14. A display device comprising the color filter of claim 13.
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CN107656421A (en) * | 2016-07-26 | 2018-02-02 | 株式会社Lg化学 | Photosensitive polymer combination and the colour filter containing the photosensitive polymer combination |
CN107656422A (en) * | 2016-07-26 | 2018-02-02 | 株式会社Lg化学 | Photosensitive polymer combination and the colour filter comprising the photosensitive polymer combination |
CN107656423A (en) * | 2016-07-26 | 2018-02-02 | 株式会社Lg化学 | Photosensitive polymer combination and the colour filter containing the photosensitive polymer combination |
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