WO2019194384A1 - Xanthene-based compound, and photosensitive resin composition, photosensitive material, color filter and display device including same - Google Patents
Xanthene-based compound, and photosensitive resin composition, photosensitive material, color filter and display device including same Download PDFInfo
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- WO2019194384A1 WO2019194384A1 PCT/KR2018/013706 KR2018013706W WO2019194384A1 WO 2019194384 A1 WO2019194384 A1 WO 2019194384A1 KR 2018013706 W KR2018013706 W KR 2018013706W WO 2019194384 A1 WO2019194384 A1 WO 2019194384A1
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- 0 CN(C(C(*)C1*)O)C1=O Chemical compound CN(C(C(*)C1*)O)C1=O 0.000 description 2
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/78—Ring systems having three or more relevant rings
- C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
- C07D311/82—Xanthenes
- C07D311/90—Xanthenes with hydrocarbon radicals, substituted by amino radicals, directly attached in position 9
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Definitions
- the present specification relates to a xanthene compound and a photosensitive resin composition including the same.
- the present specification relates to a photosensitive material manufactured using the photosensitive resin composition, a color filter, and a display device including the same.
- the performance of the color filter characterized by high brightness and high contrast ratio has been demanded.
- one of the main purposes of the display device development is to differentiate the display device performance through the improvement of color purity and to improve the productivity in the manufacturing process.
- the pigment type conventionally used as the color material of the color filter exists in the color photoresist in the state of particle dispersion, it is difficult to control the brightness and contrast ratio according to the pigment particle size and distribution control.
- the light particles are aggregated in the color filter, resulting in poor dissolution and dispersibility, and multiple scattering of light occurs due to the aggregation of large particles.
- the scattering of the polarized light has been pointed out as a main factor for lowering the contrast ratio.
- Efforts have been made to improve the luminance and contrast ratio through ultrafine atomization and dispersion stabilization of pigments, but the degree of freedom in selecting colorants to implement color coordinates for high color purity display devices is limited.
- the pigment dispersion method using the already developed color material especially pigment has reached the limit to improve the color purity, brightness and contrast ratio of the color filter using the same.
- the present inventors provide a xanthene compound having a novel structure, a photosensitive resin composition comprising the same, a photosensitive material manufactured using the same, a color filter, and a display device including the same.
- An exemplary embodiment of the present specification provides a compound represented by the following formula (1).
- L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted alkylene group,
- R1 and R2 are the same or different from each other, and each independently a dianhydride group containing a nitrogen atom,
- R3 and R4 are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group,
- R5 to R12 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group,
- R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group,
- M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure,
- M1, M2 and Y are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, at least one of R13 to R17 is an anionic group,
- X is an anionic group
- a 0 or 1
- r5 and r6 are integers of 0 to 4, and when R5 is 2 or more, R5 is the same or different from each other. When r6 is 2 or more, R6 is the same or different from each other.
- the compound represented by Formula 1 is represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And it provides a photosensitive resin composition comprising a solvent.
- An exemplary embodiment of the present specification provides a photosensitive material manufactured using the photosensitive resin composition.
- An exemplary embodiment of the present specification provides a color filter including the photosensitive material.
- An exemplary embodiment of the present specification provides a display device including the color filter.
- the compound according to one embodiment of the present specification may be used as a colorant in the photosensitive resin composition, and may have a solubility in an organic solvent, thereby reducing a dispersing process, unlike when a conventional pigment is applied, a dispersion process may be required.
- Compounds can be used as colorants in an economical way.
- the contrast ratio can be improved without additionally adding a dye.
- the xanthene compound according to one embodiment of the present specification may be used as a color material to improve color reproduction, brightness, and contrast ratio.
- 1 is a view showing the detected fluorescence intensity of a substrate prepared using a compound according to some embodiments and comparative examples of the present specification.
- Figure 2 illustrates the ligation of the compound according to one embodiment of the present specification.
- Figure 3 shows the transmittance of the substrate prepared using the compound according to some examples and comparative examples of the present specification.
- Chemical Formula 1 is an organic solvent, in which an aryl group substituted with nitrogen having a xanthene structure is substituted with a substituent including sulfur (S), and includes a bulky substituent such as a dianhydride group containing a nitrogen atom. Solubility in organic solvents by including the compound represented by the formula (1).
- Chemical Formula 1 is an organic solvent, in which an aryl group substituted with nitrogen having a xanthene structure is substituted with a substituent including sulfur (S), and includes a bulky substituent such as a dianhydride group containing a nitrogen atom. Solubility in
- the solubility is increased, so that aggregation between color materials can be prevented, and economic efficiency can be improved by reducing the amount of material required for dispersing the color materials.
- contrast ratio (CR) can be improved and excellent heat resistance can be obtained.
- CR contrast ratio
- a method of reducing the planarity in the molecule or introducing a molecule that absorbs the light emission When a molecule that absorbs light emission is introduced, it is difficult to selectively absorb only light of an emission wavelength because it absorbs both light and external light of a desired light emitting molecule.
- a bulky group having a steric hindrance is introduced.
- Non-radiative decay occurs when a molecule that absorbs light in the ground state and enters an excited state transfers energy through a vibration mode or a rotation mode. Can happen. That is, the emission can be reduced.
- alkoxy and amine groups can act as electron donation groups to change the absorption wavelength of light absorbing molecules.
- And Means a site which is bonded to another substituent or binding moiety.
- substituted or unsubstituted is deuterium; Halogen group; Nitrile group; Nitro group; -OH; Carbonyl group; Ester group; -COOH; Imide group; Amide group; Anionic group; An alkoxy group; An alkyl group; Cycloalkyl group; Alkenyl groups; Cycloalkenyl group; Arylalkyl group; Phosphine groups; Sulfonate groups; Amine group; Aryl group; Heteroaryl group; Silyl groups; Boron group; Acryloyl group; Acrylate group; Ether group; It means that it is substituted with one or more substituents selected from the group comprising an anionic group and a heterocyclic group containing one or more of N, O, S or P atoms or have no substituents.
- adjacent means a substituent substituted on an atom directly connected to an atom to which the substituent is substituted, a substituent positioned closest to the substituent, or another substituent substituted on an atom to which the substituent is substituted.
- two substituents substituted at the ortho position in the benzene ring and two substituents substituted at the same carbon in the aliphatic ring may be interpreted as "adjacent" groups.
- the ring refers to an aromatic or aliphatic ring in that adjacent groups can combine to form a “ring”.
- the ring may be an aromatic ring, it may be an aryl group or a heteroaryl group. The following description may be applied to the aryl group and heteroaryl group.
- examples of the halogen group include fluorine, chlorine, bromine or iodine.
- the carbonyl group may be represented by -COR, and R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
- R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
- carbon number of the said carbonyl group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
- the ester group may be represented by -COOR, wherein R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
- the ester group may be substituted with oxygen of the ester group having 1 to 25 carbon atoms, a linear, branched or cyclic alkyl group or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
- carbon number of an imide group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
- the amide group may be substituted with nitrogen of the amide group is hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
- the phosphine group means an alkyl phosphine group or an aryl phosphine group
- the alkyl phosphine group means a phosphine group substituted with an alkyl group.
- carbon number of the said alkyl phosphine group is not specifically limited, It is preferable that it is 1-20.
- the alkylphosphine group include dimethylphosphine group, diethylphosphine group, di-n-propylphosphine group, diisopropylphosphine group, di-n-butylphosphine group, di-sec-butylphosphine group and di-tert.
- arylphosphine group refers to a phosphine group substituted with an aryl group. Although carbon number of the said aryl phosphine group is not specifically limited, It is preferable that it is 6-30.
- arylphosphine group examples include, but are not limited to, a diphenylphosphine group, a dibenzylphosphine group, a methylphenylphosphine group, a benzylhexylphosphine group, a bistrimethylsilylphosphine group, and the like.
- the anionic group has a chemical bond with the structure of Formula 1, and the chemical bond may mean an ionic bond.
- the anionic group is not particularly limited, and for example, US Patent No. 7,939,644, Japanese Patent Laid-Open No. 2006-003080, Japanese Patent Laid-Open 2006-001917, Japanese Patent Laid-Open No. 2005-159926, Japanese Patent Laid-Open No. 2007-7028897, Japan
- the anions described in Japanese Patent Application Laid-Open No. 2005-071680, Korean Patent Application Publication No. 2007-7000693, Japanese Patent Application No. 2005-111696, Japanese Patent Application No. 2008-249663, and Japanese Patent Application No. 2014-199436 can be applied.
- anionic group examples include trifluoromethanesulfonic acid anion, bis (trifluoromethylsulfonyl) amide anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, tetraphenylborate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tris trifluoromethane sulfonyl nilme suited to, SO 3 -, CO 2 - , SO 2 N - SO 2 CF 3, SO 2 N - SO 2 CF 2 CF 3, but include a halogen group such as fluorine group, an iodo group, a chlorine group, it is not limited thereto.
- the anionic group may have an anion per se, or may exist in complex form with other cations. Therefore, the sum of the total charge of the compound molecules of the present invention may vary depending on the number of substituted anionic groups. For example, if Formula 1 includes an ammonium structure, the total charge of the molecule may have a value from an anion to 0 minus 1 from the number of substituted anionic groups since the ammonium structure has a cation. have.
- the alkoxy group may be linear or branched, and the number of carbon atoms is not particularly limited, but may be 1 to 30, specifically 1 to 20, and more specifically 1 to 10.
- the alkyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 1 to 60. According to an exemplary embodiment, the alkyl group has 1 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 10 carbon atoms.
- the alkyl group examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group and n-jade And the like, but are not limited thereto.
- the cycloalkyl group is not particularly limited, but preferably has 3 to 30 carbon atoms, and particularly preferably cyclopentyl group and cyclohexyl group, but is not limited thereto. .
- the cycloalkyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms. Specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group and the like, but is not limited thereto.
- the alkenyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 2 to 60. According to an exemplary embodiment, the alkyl group has 2 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 10 carbon atoms. Specific examples of the alkenyl group include, but are not limited to, alkenyl groups substituted with aryl groups such as stylbenyl and styrenyl groups.
- the cycloalkenyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms.
- Examples of the cycloalkenyl group include, but are not limited to, a cyclopentenylene group and a cyclohexenylene group.
- the aryl group is not particularly limited, but preferably has 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to an exemplary embodiment, the aryl group has 6 to 30 carbon atoms. According to an exemplary embodiment, the aryl group has 6 to 20 carbon atoms.
- the aryl group may be a monocyclic aryl group, but may be a phenyl group, a biphenyl group, a terphenyl group, etc., but is not limited thereto.
- the polycyclic aryl group may be naphthyl group, anthracenyl group, indenyl group, phenanthrenyl group, pyrenyl group, perrylenyl group, triphenyl group, chrysenyl group, fluorenyl group and the like, but is not limited thereto.
- the fluorenyl group may be substituted, and two substituents may be bonded to each other to form a spiro structure.
- Spirofluorenyl groups such as (9,9-dimethylfluorenyl group
- Substituted fluorenyl groups such as (9,9-diphenylfluorenyl group
- the present invention is not limited thereto.
- the arylalkyl group may specifically include an aryl portion having 6 to 30 carbon atoms and an alkyl portion having 1 to 30 carbon atoms.
- Specific examples include benzyl group, p-methylbenzyl group, m-methylbenzyl group, p-ethylbenzyl group, m-ethylbenzyl group, 3,5-dimethylbenzyl group, ⁇ -methylbenzyl group, ⁇ , ⁇ -dimethylbenzyl Group, ⁇ , ⁇ -methylphenylbenzyl group, 1-naphthylbenzyl group, 2-naphthylbenzyl group, p-fluorobenzyl group, 3,5-difluorobenzyl group, ⁇ , ⁇ -ditrifluoromethylbenzyl group , p-methoxybenzyl group, m-methoxybenzyl group, ⁇ -phenoxybenzyl group, ⁇ -benzyl groupoxybenzyl group,
- the heterocyclic group is a heterocyclic group containing O, N or S as a hetero atom, and the carbon number is not particularly limited, but is 2 to 30 carbon atoms, specifically 2 to 20 carbon atoms.
- the heterocyclic group include thiophene group, furan group, pyrrole group, imidazole group, thiazole group, oxazole group, oxadiazole group, triazole group, pyridyl group, bipyridyl group, triazine group, acridil group, pyridazine group , Quinolinyl group, isoquinoline group, indole group, carbazole group, benzoxazole group, benzoimidazole group, benzothiazole group, benzocarbazole group, benzothiophene group, dibenzothiophene group, benzofuranyl group, dibenzofuran And the like, but are not limited thereto.
- heterocyclic group may be applied except that the heteroaryl group is aromatic.
- the silyl group may be represented by a chemical formula of -SiZ1Z2Z3, wherein Z1, Z2 and Z3 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group.
- Specific examples of the silyl group include trimethylsilyl group (TMS), triethylsilyl group, t-butyldimethylsilyl group, vinyldimethylsilyl group, propyldimethylsilyl group, triphenylsilyl group, diphenylsilyl group, and phenylsilyl group. It is not limited to this.
- the alkyl sulfoxy group includes methyl sulfoxy group, ethyl sulfoxy group, propyl sulfoxy group, butyl sulfoxy group, and the like, but is not limited thereto.
- the alkyl group in the alkyl sulfoxy group may be applied to the description of the alkyl group described above.
- the boron group may be represented by the formula of -BW4W5, wherein W4 and W5 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group.
- the boron group may include, but is not limited to, trimethylboron group, triethylboron group, t-butyldimethylboron group, triphenylboron group, and phenylboron group.
- the acryloyl group means a photopolymerizable unsaturated group, and for example, (meth) acryloyl group may be mentioned, but is not limited thereto.
- the acrylate group refers to a photopolymerizable unsaturated group, and examples thereof include (meth) acrylate groups, but are not limited thereto.
- (meth) acryloyl represents at least 1 sort (s) chosen from the group which consists of acryloyl and methacryloyl.
- the description of '(meth) acrylate' also has the same meaning.
- the ether group may be represented by -COR.
- R is a substituted or unsubstituted alkyl group.
- the alkyl group may be applied to the description of the alkyl group described above.
- the sulfonate group may be an alkylsulfonate group or an arylsulfonate group.
- the description of the aforementioned alkyl group may be applied to the 'alkyl', and the description of the aforementioned aryl group may be applied to the 'aryl'.
- the amine group is -NH 2 ; Alkylamine group; N-alkylarylamine group; Arylamine group; N-aryl heteroaryl amine group; It may be selected from the group consisting of an N-alkylheteroarylamine group and a heteroarylamine group, and carbon number is not particularly limited, but is preferably 1 to 30.
- Specific examples of the amine group include methylamine group, dimethylamine group, ethylamine group, diethylamine group, phenylamine group, naphthylamine group, biphenylamine group, anthracenylamine group, and 9-methyl-anthracenylamine group.
- Diphenylamine group N-phenylnaphthylamine group, ditolylamine group, N-phenyltolylamine group, triphenylamine group, N-phenylbiphenylamine group; N-phenylnaphthylamine group; N-biphenyl naphthylamine group; N-naphthylfluorenylamine group; N-phenylphenanthrenylamine group; N-biphenylphenanthrenylamine group; N-phenyl fluorenyl amine group; N-phenylterphenylamine group; N-phenanthrenyl fluorenyl amine group; N-biphenyl fluorenyl amine group and the like, but is not limited thereto.
- the carbon number of the dianhydride group including the nitrogen atom is not particularly limited, but may be 4 to 30, specifically 4 to 20, and more specifically 4 to 15.
- an alkylene group means that there are two bonding positions in an alkane.
- the alkylene group may be straight, branched or cyclic.
- carbon number of an alkylene group is not specifically limited, For example, it is C1-C30, Specifically, 1-20, More specifically, it is 1-10.
- the heteroalkylene group means that there are two bonding positions in an alkane including O, N or S as a hetero atom.
- the heteroalkylene group may be linear, branched or cyclic.
- carbon number of a heteroalkylene group is not specifically limited, For example, it is C2-C30, Specifically, it is C2-C20, More specifically, it is C2-C10.
- the arylene group refers to a divalent group having two bonding positions in the aryl group.
- the description of the aforementioned aryl group can be applied except that they are each divalent.
- the heteroarylene group means a divalent group having two bonding positions in the heteroaryl group.
- the description of the aforementioned heteroaryl group can be applied except that they are each divalent.
- L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group.
- L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 30 carbon atoms.
- L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 20 carbon atoms.
- L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 10 carbon atoms.
- L1 and L2 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methylene group; Substituted or unsubstituted ethylene group; Substituted or unsubstituted propylene group; Or a substituted or unsubstituted butylene group.
- L1 and L2 of Formula 1 are the same as or different from each other, and each independently methylene group; Ethylene group; Propylene group; Or butylene group.
- R1 and R2 of the general formula (1) are the same as or different from each other, and each independently an dianhydride group including a nitrogen atom having 4 to 30 carbon atoms.
- R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 20 carbon atoms.
- R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 15 carbon atoms.
- the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
- X1, X2 and Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups combine to form a substituted or unsubstituted ring.
- X1 and X2 may combine with each other to form a substituted or unsubstituted ring.
- X1 and X2 are bonded to each other to form a substituted or unsubstituted benzene ring; Or a substituted or unsubstituted naphthalene ring.
- X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or it may form a substituted or unsubstituted naphthalene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
- X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
- X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
- X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
- the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted ring.
- the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted benzene ring.
- the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or it may form a substituted or unsubstituted benzene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
- the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
- the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
- the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
- the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
- X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -SO 3 M; -SO 2 NHY; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
- X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; -SO 3 M; Or -SO 2 NHY, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
- R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
- R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
- R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
- R3 and R4 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methyl group; Or a substituted or unsubstituted phenyl group.
- R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; A methyl group substituted with a halogen group; Or a phenyl group.
- R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; Trifluoromethyl group (-CF 3 ); Or a phenyl group.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; Hydroxyl group; -COR; -COOR; Imide group; Amide group; Anionic group; A substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; A substituted or unsubstituted alkenyl group having 2 to 30 carbon atoms; A substituted or unsubstituted cycloalkenyl group having 3 to 30 carbon atoms; Substituted or unsubstituted sulfonate group; A substituted or unsubstituted amine group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon
- R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group, and Y is a substituted or unsubstituted alkyl group.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted methyl group, wherein Y is a hexyl group unsubstituted or substituted with carbon of 1 to 10 carbon atoms.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a methyl group unsubstituted or substituted with a halogen group, and Y is a hexyl group unsubstituted or substituted with an ethyl group.
- R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a trifluoromethyl group (-CF 3 ), and Y is a hexyl group substituted with an ethyl group.
- R5 of Chemical Formula 1 is hydrogen; Or a trifluoromethyl group.
- R6 of Chemical Formula 1 is hydrogen; -SO 2 NHY; Or a trifluoromethyl group, and Y is a hexyl group substituted with an ethyl group.
- R7 of Formula 1 is hydrogen
- R8 of Formula 1 is hydrogen
- R9 of Formula 1 is hydrogen
- R10 of Formula 1 is hydrogen
- R11 of Formula 1 is hydrogen
- R12 of Formula 1 is hydrogen
- R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group; Substituted or unsubstituted or unsubstitute
- R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R 13 to R 17 is an anionic group.
- R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R13 to R17 is —SO 3 — .
- R13 is -SO 3 - a.
- R14 is hydrogen
- R15 is hydrogen; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above.
- R16 is hydrogen
- R17 is hydrogen
- X is an anionic group.
- X is an anion of a compound containing oxygen and at least one element selected from the group consisting of tungsten, molybdenum, silicon and phosphorus; Trifluoromethanesulfonic acid anion; Bis (trifluoromethylsulfonyl) amide anion; Bistrifluoromethanesulfonimide anion; Bisperfluoroethylsulfonimide anion; Tetraphenylborate anion; Tetrakis (4-fluorophenyl) borate; Tetrakis (pentafluorophenyl) borate; Tristrifluoromethanesulfonylmethide; And it is a compound selected from the group consisting of halogen groups.
- X may be SO 3 ⁇ .
- r5 and r6 are integers of 0 to 4, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
- r5 and r6 are integers of 0 to 3, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
- r5 and r6 are integers of 0 to 2, when r5 is 2, R5 is the same as or different from each other, and when r6 is 2, R6 is the same or different from each other.
- r5 and r6 are 0 or 1.
- r5 and r6 are zero.
- r5 and r6 are one.
- Chemical Formula 1 may be represented by the following structures, the following structures represent an isomer of Formula 1, wherein Formula 1 represents a representative structure.
- Isomers refer to molecules having the same molecular formula but different physical / chemical properties.
- L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- -SO 3 M may mean that -SO 3 - and M is an ionic bond or a salt bond.
- M is Na + ; K + ; Rb + ; Cs + ; Fr + ;
- a compound including an ammonium structure and the compound including the ammonium structure may include a unit represented by the following Formula A or represented by the following Formula B.
- Ra to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Substituted or unsubstituted arylalkyl group; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, wherein L 1 and L 2 is a substituted or unsubstituted alkylene group,
- Rb to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group; Substituted or unsubstituted arylene group; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group, and Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group.
- Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted
- Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms; A substituted or unsubstituted arylene group having 6 to 30 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms
- Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted
- Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms; Substituted or unsubstituted arylene group having 6 to 20 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms;
- the unit means a repeating structure in which the monomer is included in the polymer, and the unit may be included in the main chain in the polymer to constitute the polymer.
- the compound including a unit represented by Formula B may be a polymer.
- the compound represented by the formula (B) may include within the range of 1 to 500.
- the weight average molecular weight of the compound including the unit represented by Formula (B) may be 1000 to 10,000, preferably 3,000 to 8,000, more preferably 5,000 to 7,000.
- the terminal of the compound containing a unit represented by the formula (B) is hydrogen; Halogen group; Or a substituted or unsubstituted alkyl group.
- Chemical Formula 1 may be represented by the following Chemical Formula 2.
- L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- Chemical Formula 1 may be represented by the following Chemical Formula 3.
- L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- Chemical Formula 1 may be represented by the following Chemical Formula 4.
- L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- the dianhydride group including the nitrogen atom of Formula 1 may be a compound represented by any one of the following substituents.
- X1, X2, Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups may be bonded to form a substituted or unsubstituted ring.
- the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas.
- M and Y are as defined in the formula (1).
- the substituent in the ring of the formula is not specified means that the substituent may be substituted for any portion of the carbon included in the ring.
- benzene ring substituted with -CF 3 it may be substituted with any one of carbons other than the carbon substituted with -SCH 3 , and may be represented by the following four structures.
- naphthalene ring substituted with -SO 2 NHY it means that can be substituted with any one of the carbon included in the naphthalene, it can be represented by the following six structures.
- Y is as defined above.
- the color material composition may further include at least one of dyes and pigments in addition to the compound of Formula 1.
- the colorant composition may include only the compound of Formula 1, but may include the compound of Formula 1 and one or more dyes, or may include the compound of Formula 1 and one or more pigments, or the compound of Formula 1 And at least one dye and at least one pigment.
- the photosensitive resin composition is a compound represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And a solvent may be further included.
- the binder resin is not particularly limited as long as it can exhibit physical properties such as strength, developability, and the like of the film made of the photosensitive resin composition.
- the binder resin may use a copolymer resin of a polyfunctional monomer imparting mechanical strength and a monomer imparting alkali solubility, and may further include a binder generally used in the art.
- Polyfunctional monomers to impart the mechanical strength of the membrane include unsaturated carboxylic acid esters; Aromatic vinyls; Unsaturated ethers; Unsaturated imides; And acid anhydrides.
- unsaturated carboxylic acid esters include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, and isobutyl ( Meta) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetra Hydroperpril (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl ( Meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate
- aromatic vinyls include styrene, ⁇ -methylstyrene, (o, m, p) -vinyl toluene, (o, m, p) -methoxy styrene, and (o, m, p) -chloro styrene. It may be selected from the group consisting of, but is not limited to these.
- unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.
- unsaturated imides are selected from the group consisting of N-phenyl maleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexyl maleimide It may be, but is not limited to these.
- acid anhydride examples include maleic anhydride, methyl maleic anhydride, tetrahydro phthalic anhydride, and the like, but are not limited thereto.
- the monomer which imparts the alkali solubility is not particularly limited as long as it contains an acid group.
- the acid value of the binder resin is 50 to 130 KOH mg / g
- the weight average molecular weight is 1,000 to 50,000.
- the polyfunctional monomer is a monomer that forms a photoresist image by light, specifically, propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl glycol di Acrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethyleneglycol methacrylate, bisphenoxy ethylalcohol diacrylate, trishydroxyethylisocyanurate trimethacrylate, trimethyl 1 selected from the group consisting of propane trimethacrylate, diphenylpentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate and dipentaerythritol hexamethacrylate Species or a mixture of two or more thereof.
- the photoinitiator is not particularly limited as long as it is an initiator that generates radicals by light to trigger crosslinking. It may be one or more kinds.
- the acetophenone-based compound is 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenylketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin Butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholino-1-propan-1-one, 2-benzyl-2-dimethylamino -1- (4-morpholinophenyl) -butan-1-one, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one or 2-methyl-1- [4- (methylthio)
- biimidazole-based compound 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4 , 4 ', 5,5'-tetrakis (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl) -4, 4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, It is not limited to this.
- the triazine compound is 3- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ propionic acid, 1,1,1,3,3,3- Hexafluoroisopropyl-3- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ propionate, ethyl-2- ⁇ 4- [2,4 -Bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ acetate, 2-epoxyethyl-2- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazine-6 -Yl] phenylthio ⁇ acetate, cyclohexyl-2- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ acetate,
- the oxime-based compound is 1,2-octadione, -1- (4-phenylthio) phenyl, -2- (o-benzoyloxime) (Shibagai Co., Shijiai 124), ethanone, -1- (9 -Ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime) (CGII242), N-1919 (Adeca Co.), and the like.
- the solvent is acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether , Propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, chloroform, methylene chloride, 1,2-dichloroethane, 1,1,1-trichloroethane, 1 , 1,2-trichloroethane, 1,1,2-trichloroethene, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropano
- the content of the compound represented by Formula 1 is 5% by weight to 60% by weight
- the content of the binder resin is 1% by weight to 60% by weight %
- the content of the photoinitiator is 0.1% to 20% by weight
- the content of the multifunctional monomer is 0.1% to 50% by weight
- the content of the solvent is 10% to 80% by weight.
- the content of the compound represented by Formula 1 is 5% by weight to 60% by weight
- the content of the binder resin is 1% by weight
- the content of the photoinitiator is 0.1% to 20% by weight
- the content of the multifunctional monomer is 0.1% to 50% by weight.
- the photosensitive resin composition is based on the total weight of solids in the photosensitive resin composition, the content of the compound represented by Formula 1 is 5% by weight to 50% by weight, the content of the binder resin is 1% by weight to 50 Wt%, the content of the photoinitiator is 0.1% to 10% by weight, and the content of the multifunctional monomer is 0.1% to 45% by weight.
- the total weight of the solid content means the sum of the total weight of the components excluding the solvent in the resin composition.
- the weight percentages based on solids and solids of each component can be measured by common analytical means used in the art, such as liquid chromatography or gas chromatography.
- the photosensitive resin composition may further include an additive.
- the additive may further comprise 0.1% by weight to 20% by weight.
- the content of the additive is 0.1 wt% to 20 wt% based on the total weight of solids in the photosensitive resin composition.
- the content of the additive is 0.1 wt% to 10 wt% based on the total weight of solids in the photosensitive resin composition.
- the photosensitive resin composition is 1 or 2 selected from the group consisting of photocrosslinking sensitizers, curing accelerators, antioxidants, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents.
- photocrosslinking sensitizers curing accelerators, antioxidants, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents.
- the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
- the photosensitive resin composition may include one or two or more additives selected from the group consisting of photocrosslinking sensitizers, curing accelerators, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents. Additionally included.
- the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
- the photocrosslinking sensitizer is benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl Benzophenone compounds such as benzoate, 3,3-dimethyl-4-methoxybenzophenone, 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Thioxanthones such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone and diisopropyl thioxanthone compound; Xanthone compounds such as
- the curing accelerator is used to increase the curing and mechanical strength, specifically 2-mercaptobenzoimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3 , 4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), pentaerythritol-tris (3-mercaptopropionate), penta Erythritol-tetrakis (2-mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), and trimethylolpropane-tris (3-mercaptopropio Nate) can be used one or more selected from the group consisting of.
- methacryloyloxy propyltrimethoxy silane methacryloyloxy propyldimethoxy silane
- methacryloyloxy propyltriethoxy silane methacryloyloxy propyldimethoxysilane
- methacryloyl silane coupling agents such as these, can be selected and used, and at least 1 type can be selected from octyl trimethoxy silane, dodecyl trimethoxy silane, and octadecyl trimethoxy silane as an alkyl trimethoxy silane. You can choose to use it.
- the surfactant is a silicone-based surfactant or a fluorine-based surfactant, specifically, the silicone-based surfactant is BYK-Chemie's BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307 , BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK -354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, and the like.
- F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446 , F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F -486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF , TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc. may be used, but is not limited thereto.
- the antioxidant may be one or more selected from the group consisting of hindered phenol antioxidants, amine antioxidants, thio antioxidants, and phosphine antioxidants, but is not limited thereto.
- antioxidants include phosphoric acid thermal stabilizers such as phosphoric acid, trimethyl phosphate or triethyl phosphate; 2,6-di-t-butyl-p-cresol, octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, tetrabis [methylene-3- (3, 5-di-t-butyl-4-hydroxyphenyl) propionate] methane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxy Benzyl) benzene, 3,5-di-t-butyl-4-hydroxybenzylphosphite diethyl ester, 2,2-thiobis (4-methyl-6-t-butylphenol), 2,6-g, t-butylphenol 4,4'-butylidene-bis (3-methyl-6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-t-
- UV absorbent 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxy benzophenone, etc. may be used, but is not limited thereto. All commonly used ones can be used.
- thermal polymerization inhibitor examples include p-anisole, hydroquinone, pyrocatechol, t-butyl catechol, N-nitrosophenylhydroxyamine ammonium salt and N-nitrosophenylhydroxy Amine aluminum salt, p-methoxyphenol, di-t-butyl-p-cresol, pyroggarol, benzoquinone, 4,4-thiobis (3-methyl-6-t-butylphenol), 2,2- It may include one or more selected from the group consisting of methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole and phenothiazine, but is not limited thereto. It may include those generally known in the art.
- the dispersant may be used as a method of internally adding to the pigment in the form of surface treatment of the pigment in advance or externally adding to the pigment.
- a compound type, nonionic, anionic or cationic dispersant may be used, and examples thereof include fluorine, ester, cationic, anionic, nonionic and amphoteric surfactants. These can be used individually or in combination of 2 or more types.
- the dispersant may be polyalkylene glycol and esters thereof, polyoxyalkylene polyhydric alcohols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonate salts, carboxylic acid esters, carboxylate salts, At least one selected from the group consisting of alkylamide alkylene oxide adducts and alkylamines is not limited thereto.
- the leveling agent may be polymeric or nonpolymeric.
- polymeric leveling agents include polyethyleneimine, polyamideamine, reaction products of amines and epoxides
- nonpolymeric leveling agents include non-polymeric sulfur-containing and non-polymeric nitrogen-containing. Including but not limited to the compounds, all generally used in the art can be used.
- a photosensitive material manufactured using the photosensitive resin composition is provided.
- the photosensitive resin composition of this specification is apply
- a spray method, a roll coating method, a spin coating method, etc. can be used, Generally, a spin coating method is used widely.
- some residual solvent can be removed in some cases under reduced pressure.
- Light sources for curing the photosensitive resin composition according to the present specification include, but are not limited to, mercury vapor arcs, carbon arcs, Xe arcs, etc., which emit light having a wavelength of 250 nm to 450 nm.
- the photosensitive resin composition according to the present disclosure is a pigment-dispersed photosensitive material for manufacturing a thin film transistor liquid crystal display device (TFT LCD) color filter, a thin film transistor liquid crystal display device (TFT LCD) or a photosensitive material for forming a black matrix of an organic light emitting diode.
- TFT LCD thin film transistor liquid crystal display device
- TFT LCD thin film transistor liquid crystal display device
- photosensitive material for forming a black matrix of an organic light emitting diode.
- PDP plasma display panel
- a color filter including the photosensitive material is provided.
- the color filter may be prepared using the photosensitive resin composition including the compound represented by Chemical Formula 1.
- the color filter may be formed by applying the photosensitive resin composition on a substrate to form a coating film and exposing, developing and curing the coating film.
- the photosensitive resin composition according to the exemplary embodiment of the present specification is excellent in heat resistance, so that there is little change in color by heat treatment, thereby providing a color filter having high color reproducibility and high luminance and contrast ratio even during the curing process during the manufacture of the color filter. Can be.
- the substrate may be a glass plate, a silicon wafer, a plate of a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
- a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
- the photosensitive resin composition according to an exemplary embodiment of the present specification may be spincoated on glass (5 ⁇ 5 cm 2 ), and subjected to prebake at 100 ° C. for 100 seconds to form a film. .
- the distance between the substrate on which the film is formed and the photo mask is set to 250 um, and 40 mJ / cm 2 exposure dose is irradiated to the entire surface of the substrate using an exposure machine.
- the exposed substrate may be developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
- KOH potassium hydroxide
- the heat resistance evaluation can be measured by the method described below.
- the substrate manufactured according to the exemplary embodiment of the present invention obtains a transmittance spectrum of a visible light region in the range of 380 nm to 780 nm.
- the prebake substrate is further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
- the spectrometer may be that of MCPD-Otsuka, but is not limited thereto.
- the color change (hereinafter, ⁇ Eab) is calculated using the obtained values E (L *, a *, b *).
- ⁇ Eab ⁇ 3
- E L *, a *, b *
- the contrast ratio can be measured by the method described below.
- the substrate produced according to the substrate manufacturing method was measured using a contrast ratio measuring device, and the luminance produced when two polarizing plates were orthogonal and the luminance when two polarizing plates were orthogonal to each other. To calculate the contrast ratio by the following formula (2).
- Contrast ratio luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
- the contrast ratio measuring instrument may be CT-1, ZOENTECH, but is not limited thereto.
- Fluorescence intensity of the color filter according to an exemplary embodiment of the present specification is the substrate using the Sinco FS-2 fluorescence measuring apparatus at room temperature (25 °C), the excitation wavelength of 545nm, emission wavelength of 560nm to 720nm It can be measured.
- the color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
- the color filter may further include an overcoat layer.
- a black pattern on a lattice called a black matrix can be disposed between the color pixels of the color filter for the purpose of improving contrast.
- Chromium can be used as the material of the black matrix.
- a method of depositing chromium over the entire glass substrate and forming a pattern by etching may be used.
- a resin black matrix by a pigment dispersion method capable of fine processing can be used.
- the black matrix may use a black pigment or a black dye as a colorant.
- a black pigment or a black dye for example, carbon black may be used alone, or carbon black and coloring pigments may be used.
- coloring pigments lacking light shielding properties may be mixed, even if the amount of colorant is increased, the strength of the film or the adhesion to the substrate may be reduced. There is no advantage.
- a display device including a color filter according to the present specification.
- the display device may be a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor.
- the liquid crystal display device may be any one of a liquid crystal display (LCD-TFT) and a cathode ray tube (CRT).
- A-1 5g (12.34mmol), B-1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- NMP N-methyl-2-pyrrolidone
- RBF Round Bottom Flask
- A-1 5g (12.34mmol), B-2 14.90g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- NMP N-methyl-2-pyrrolidone
- RBF Round Bottom Flask
- A-1 5g (12.34mmol), B-3 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred.
- the mixture was heated to 150 ° C. and stirred for 4 hours.
- the reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- A-1 5g (12.34mmol), B-4 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred.
- the mixture was heated to 150 ° C. and stirred for 4 hours.
- the reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- A-1 5g (12.34mmol), B-5 14.30g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- NMP N-methyl-2-pyrrolidone
- RBF Round Bottom Flask
- A-1 5g (12.34mmol), B-6 15.33g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
- NMP N-methyl-2-pyrrolidone
- RBF Round Bottom Flask
- Comparative Compound 1 3 g (4.553 mmol) of Comparative Compound 1 was dissolved in 50 g of 10% 98% sulfuric acid. Thereafter, 0.807 g (4.553 mmol) of N-hydroxymethylphthalimide was added thereto, and the temperature was raised to 45 ° C. and stirred for 2 hours. The reaction solution was added to 500 g of water to precipitate crystals, and the precipitate was filtered under reduced pressure to obtain Comparative Compound 4.
- Example 1 the compound 1 was changed into the compound 2-18, and the photosensitive resin composition 2-18 was respectively manufactured by the same composition except that.
- Comparative Compound 1 a copolymer of benzyl methacrylate and methacrylic acid with a binder resin (molar ratio 70:30, acid value of 113 KOH mg / g, weight average molecular weight 20,000 g measured by gel permeation chromatography (GPC)) / mol, molecular weight distribution (PDI) 2.0 g, solid content (SC) 25%, solvent polypropylene glycol monomethyl ether acetate (PGMEA) 10.376 g, photoinitiator as I-369 (BASF) 2.018 g, polyfunctional monomer
- the photosensitive resin composition of Comparative Example 1 was prepared by mixing 12.443 g of DPHA, 68.593 g of solvent PGMEA (polypropylene glycol monomethyl ether acetate), and 1.016 g of DIC F-475 as an additive surfactant. .
- Comparative Example 1 Comparative Compound 1 was changed to Comparative Compounds 2 to 4, except that the photosensitive resin compositions of Comparative Examples 2 to 4 were prepared with the same composition.
- the photosensitive resin composition concerning Examples 1-18 and Comparative Examples 1-4 was used for the board
- the distance between the substrate on which the film was formed and the photo mask was set at 250 um, and the exposure amount of 40 mJ / cm 2 was irradiated on the entire surface of the substrate using an exposure machine. Thereafter, the exposed substrate was developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
- KOH potassium hydroxide
- the substrate produced according to the substrate manufacturing method was obtained using a spectrometer (MCPD-Otsuka Co., Ltd.) to obtain a transmittance spectrum of the visible light range of 380nm to 780nm.
- the prebake substrate was further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
- a small ⁇ Eab value indicates excellent color heat resistance.
- ⁇ Eab ⁇ 3 When ⁇ Eab ⁇ 3, it can be used as a color filter dye, and it can be said that it is a color material having excellent heat resistance.
- the formula for calculating ⁇ Eab is as follows.
- Example 1 1.28
- Example 2 1.27
- Example 3 0.85
- Example 4 1.36
- Example 5 1.75
- Example 6 0.94
- Example 7 1.45
- Example 8 1.39
- Example 9 1.12
- Example 10 1.47
- Example 11 1.68
- Example 12 1.27
- Example 13 0.97
- Example 14 1.54
- Example 15 1.98
- Example 16 1.76
- Example 17 1.64
- Example 18 1.44
- the color pattern substrate formed by using the photosensitive resin composition of Examples 1 to 18 of the present invention the difference in the transmittance spectrum ( ⁇ Eab) after the post-heat treatment and post-heat treatment is less than 3, the color stability It was confirmed that the heat resistance was very high because it is very small.
- the substrate produced according to the substrate manufacturing method was put in between the two polarizing plates using a contrast ratio measuring instrument (CT-1, ZOENTECH Co., Ltd.) and the brightness when two polarizing plates are horizontal and two polarizing plates The brightness
- Contrast ratio luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
- Contrast ratio calculated by the above formula 2 was calculated by the following formula 3 contrast ratio improvement, it is shown in Table 2 below.
- Contrast ratio improvement rate (Example contrast ratio-Comparative example 1, 2 or 4 contrast ratio) / Comparative example 1, 2 or 4 contrast ratio * 100)
- the substrate produced according to the substrate fabrication method was measured at room temperature (25 ° C.) using a Sinco FS-2 fluorescence measuring apparatus, and the fluorescence intensity was measured using an excitation wavelength of 545 nm and an emission wavelength of 560 nm to 720 nm. It was.
- the transmittance spectrum of the visible light range of 380 nm-780 nm was obtained with respect to the board
- the blue color filter may exhibit better luminance when the maximum transmittance is high at 380 nm to 480 nm at luminous x, luminous y, and luminous z.
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Abstract
The present specification provides a compound represented by chemical formula 1, and a photosensitive resin composition, a photosensitive material, a color filter and a display device which include same.
Description
본 출원은 2018년 04월 05일에 한국특허청에 제출된 한국 특허 출원 제10-2018-0039901호의 출원일의 이익을 주장하며, 그 내용 전부는 본 명세서에 포함된다.This application claims the benefit of the application date of Korean Patent Application No. 10-2018-0039901 filed with the Korea Intellectual Property Office on April 05, 2018, the entire contents of which are incorporated herein.
본 출원은 2018년 11월 06일에 한국특허청에 제출된 한국 특허 출원 제10-2018-0135250호의 출원일의 이익을 주장하며, 그 내용 전부는 본 명세서에 포함된다.This application claims the benefit of the filing date of Korean Patent Application No. 10-2018-0135250 filed with the Korea Intellectual Property Office on November 06, 2018, the entire contents of which are incorporated herein.
본 명세서는 잔텐계 화합물 및 이를 포함하는 감광성 수지 조성물에 관한 것이다. 또한, 본 명세서는 상기 감광성 수지 조성물을 이용하여 제조된 감광재, 컬러필터 및 이를 포함하는 디스플레이 장치에 관한 것이다.The present specification relates to a xanthene compound and a photosensitive resin composition including the same. In addition, the present specification relates to a photosensitive material manufactured using the photosensitive resin composition, a color filter, and a display device including the same.
최근 컬러필터에 있어서 고휘도, 고명암비를 특징으로 하는 성능이 요구되고 있다. 또한, 디스플레이 장치 개발의 주 목적 중 하나는 색순도 향상을 통한 표시소자 성능의 차별화 및 제조 공정상의 생산성 향상에 있다. In recent years, the performance of the color filter characterized by high brightness and high contrast ratio has been demanded. In addition, one of the main purposes of the display device development is to differentiate the display device performance through the improvement of color purity and to improve the productivity in the manufacturing process.
기존에 컬러필터의 색재로 사용되는 안료 타입은 입자 분산 상태로 컬러 포토레지스트에 존재하기 때문에, 안료 입자 크기와 분포 조절에 따른 휘도 및 명암비 조절에 어려움이 있었다. 안료 입자의 경우 컬러 필터 내에서 응집되어 용해 및 분산성이 떨어지며 응집(aggregation)되어 있는 큰 입자들로 인하여 빛의 다중 산란(multiple scattering)이 일어난다. 이러한 편광된 빛의 산란은 명암비를 저하시키는 주 요인으로 지목되고 있다. 안료의 초미립화 및 분산 안정화를 통해 휘도 및 명암비 향상을 위한 노력이 계속되고 있으나, 고색순도 표시장치용 색좌표를 구현하기 위한 색재 선정에 있어 자유도가 제한된다. 또한, 이미 개발된 색재료 특히 안료를 이용한 안료분산법은 이를 이용한 컬러필터의 색순도, 휘도 및 명암비를 향상시키는데 한계에 도달했다.Since the pigment type conventionally used as the color material of the color filter exists in the color photoresist in the state of particle dispersion, it is difficult to control the brightness and contrast ratio according to the pigment particle size and distribution control. In the case of pigment particles, the light particles are aggregated in the color filter, resulting in poor dissolution and dispersibility, and multiple scattering of light occurs due to the aggregation of large particles. The scattering of the polarized light has been pointed out as a main factor for lowering the contrast ratio. Efforts have been made to improve the luminance and contrast ratio through ultrafine atomization and dispersion stabilization of pigments, but the degree of freedom in selecting colorants to implement color coordinates for high color purity display devices is limited. In addition, the pigment dispersion method using the already developed color material, especially pigment has reached the limit to improve the color purity, brightness and contrast ratio of the color filter using the same.
이에 따라서, 색순도를 높여 색재현, 휘도 및 명암비를 향상시킬 수 있는 신규 색재 개발이 요구되고 있다.Accordingly, there is a demand for the development of a new color material that can improve color purity and improve color reproduction, brightness, and contrast ratio.
본 발명자들은 신규한 구조의 잔텐계 화합물, 이를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광재, 컬러필터 및 이를 포함하는 디스플레이 장치를 제공하고자 한다. The present inventors provide a xanthene compound having a novel structure, a photosensitive resin composition comprising the same, a photosensitive material manufactured using the same, a color filter, and a display device including the same.
본 명세서의 일 실시상태는, 하기 화학식 1로 표시되는 화합물을 제공한다.An exemplary embodiment of the present specification provides a compound represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에 있어서,In Chemical Formula 1,
L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬렌기이며,L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted alkylene group,
R1 및 R2는 서로 같거나 상이하고, 각각 독립적으로 질소 원자를 포함하는 이무수물기이고, R1 and R2 are the same or different from each other, and each independently a dianhydride group containing a nitrogen atom,
R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이며, R3 and R4 are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group,
R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 시클로알케닐기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되고, R5 to R12 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group,
R13 내지 R17은 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3
-; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 음이온성기; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 헤테로아릴기이고,R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group,
상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고,M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure,
상기 M1, M2 및 Y는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되며,상기 R13 내지 R17 중 적어도 하나는 음이온성기이며, M1, M2 and Y are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, at least one of R13 to R17 is an anionic group,
X는 음이온성기이고, X is an anionic group,
a는 0 또는 1이며, a is 0 or 1,
r5 및 r6는 0 내지 4의 정수이고, r5가 2 이상인 경우 R5는 서로 같거나 상이하고, r6이 2 이상인 경우, R6은 서로 같거나 상이하다.r5 and r6 are integers of 0 to 4, and when R5 is 2 or more, R5 is the same or different from each other. When r6 is 2 or more, R6 is the same or different from each other.
본 명세서의 일 실시상태는, 상기 화학식 1로 표시되는 화합물; 바인더 수지; 다관능성 모노머; 광개시제; 및 용매를 포함하는 감광성 수지 조성물을 제공한다.An exemplary embodiment of the present specification, the compound represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And it provides a photosensitive resin composition comprising a solvent.
본 명세서의 일 실시상태는, 상기 감광성 수지 조성물을 이용하여 제조된 감광재를 제공한다.An exemplary embodiment of the present specification provides a photosensitive material manufactured using the photosensitive resin composition.
본 명세서의 일 실시상태는, 상기 감광재를 포함하는 컬러필터를 제공한다.An exemplary embodiment of the present specification provides a color filter including the photosensitive material.
본 명세서의 일 실시상태는, 상기 컬러필터를 포함하는 디스플레이 장치를 제공한다.An exemplary embodiment of the present specification provides a display device including the color filter.
본 명세서의 일 실시상태에 따른 화합물은 감광성 수지 조성물에서 색재로 사용될 수 있으며, 유기 용제에 대한 용해도를 가짐으로써 분산 공정을 줄일 수 있어, 종래의 안료를 적용하는 경우 분산 공정을 거쳐야 하는 것과 다르게, 경제적인 방법으로 화합물을 색재로 사용할 수 있다. 또한, 형광 세기를 줄임으로써, 추가적으로 염료를 첨가하지 않고, 명암비를 향상시킬 수 있다. The compound according to one embodiment of the present specification may be used as a colorant in the photosensitive resin composition, and may have a solubility in an organic solvent, thereby reducing a dispersing process, unlike when a conventional pigment is applied, a dispersion process may be required. Compounds can be used as colorants in an economical way. In addition, by reducing the fluorescence intensity, the contrast ratio can be improved without additionally adding a dye.
또한, 본 명세서의 일 실시상태에 따른 잔텐계 화합물은 색재료로 사용되어 색재현, 휘도 및 명암비를 향상시킬 수 있다.In addition, the xanthene compound according to one embodiment of the present specification may be used as a color material to improve color reproduction, brightness, and contrast ratio.
도 1은 본 명세서의 일부 실시예 및 비교예에 따른 화합물을 이용하여 제조된 기판의 검출된 형광 세기를 나타내는 도면이다.1 is a view showing the detected fluorescence intensity of a substrate prepared using a compound according to some embodiments and comparative examples of the present specification.
도 2는 본 명세서의 일 실시상태에 따른 화합물의 시감을 나타낸 것이다. Figure 2 illustrates the ligation of the compound according to one embodiment of the present specification.
도 3은 본 명세서의 일부 실시예 및 비교예에 따른 화합물을 이용하여 제조된 기판의 투과도를 나타낸 것이다.Figure 3 shows the transmittance of the substrate prepared using the compound according to some examples and comparative examples of the present specification.
이하, 본 명세서에 대하여 더욱 상세하게 설명한다.Hereinafter, this specification is demonstrated in detail.
본 명세서에 있어서, 어떤 부재가 다른 부재 “상에” 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.In this specification, when a member is located “on” another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
본 명세서에서 어떤 부분이 어떤 구성요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성 요소를 더 포함할 수 있는 것을 의미한다. In the present specification, when a part "contains" a certain component, this means that the component may further include other components, except for the case where there is no contrary description.
본 명세서의 일 실시상태에 따르면, 상기 화학식 1로 표시되는 화합물을 제공한다. According to an exemplary embodiment of the present specification, a compound represented by Formula 1 is provided.
본 발명은 상기 화학식 1로 표시되는 화합물을 포함함으로써, 유기 용매에 우수한 용해도를 가진다. 구체적으로, 상기 화학식 1은 잔텐(Xanthene) 구조의 질소에 치환되는 아릴기가 황(S)을 포함하는 치환기로 치환되고, 질소원자를 포함하는 이무수물기와 같은 부피가 큰 치환기를 포함함으로써, 유기 용매에의 용해도를 증가시킬 수 있다. The present invention has excellent solubility in organic solvents by including the compound represented by the formula (1). Specifically, Chemical Formula 1 is an organic solvent, in which an aryl group substituted with nitrogen having a xanthene structure is substituted with a substituent including sulfur (S), and includes a bulky substituent such as a dianhydride group containing a nitrogen atom. Solubility in
또한, 상기 화학식 1이 잔텐 구조의 질소에 치환되는 아릴기가 황(S)을 포함하는 치환기로 치환되는 경우, 황(S)을 포함하지 않는 치환기로 치환되는 경우보다 형광 세기가 감소하여, 추가적인 염료를 첨가하지 않고서도 우수한 명암비를 얻을 수 있다.In addition, when the aryl group substituted in the nitrogen of the xanthene structure is substituted with a substituent containing sulfur (S), the formula 1 is reduced in fluorescence intensity than when substituted with a substituent containing no sulfur (S), further dye Excellent contrast ratio can be obtained without adding.
이에 따른 용해도 증가로, 색재 간의 응집이 되는 것을 방지할 수 있고, 색재 분산에 필요한 재료의 양을 줄임으로써, 경제성을 높일 수 있다. As a result, the solubility is increased, so that aggregation between color materials can be prevented, and economic efficiency can be improved by reducing the amount of material required for dispersing the color materials.
또한, 명암비(CR, Contrast Ratio) 향상이 가능하고, 우수한 내열성을 가질 수 있다. 분자의 발광(형광 또는 인광)을 감소시키기 위해서는 분자내의 평면성을 감소시키거나 발광을 흡수하는 분자를 도입하는 방법이 있다. 발광을 흡수하는 분자를 도입할 경우 원하는 발광하는 분자의 빛의 흡수와 외부의 빛을 모두 흡수하기 때문에 선택적으로 발광 파장의 빛만을 흡수하기가 어렵다. 그래서 분자내의 평면성을 감소시키기 위해 입체장애가 큰 치환기(bulky group)를 도입한다.In addition, contrast ratio (CR) can be improved and excellent heat resistance can be obtained. In order to reduce the light emission (fluorescence or phosphorescence) of the molecule, there is a method of reducing the planarity in the molecule or introducing a molecule that absorbs the light emission. When a molecule that absorbs light emission is introduced, it is difficult to selectively absorb only light of an emission wavelength because it absorbs both light and external light of a desired light emitting molecule. Thus, in order to reduce the planarity in the molecule, a bulky group having a steric hindrance is introduced.
기저상태(ground state)에서 빛을 흡수하여 여기상태(excited state)가 된 분자가, 진동모드(vibration mode) 또는 회전모드(rotation mode)를 통해 에너지를 이동시키면 비방사 복사(non-radiative decay)가 일어날 수 있다. 즉, 발광을 감소 시킬 수 있다.Non-radiative decay occurs when a molecule that absorbs light in the ground state and enters an excited state transfers energy through a vibration mode or a rotation mode. Can happen. That is, the emission can be reduced.
평면성이 클수록 비방사 복사가 어려워 발광의 세기가 증가하며, 큰 치환기를 도입하여 평면적을 줄 일수록 비방사 복사를 통해 발광의 세기를 줄 일 수 있다. 비방사 복사를 위해 길이가 긴 알킬그룹(alkyl group), 분지형 알킬(branched alkyl group), 알콕시(alkoxy group), 아민(amine group)를 도입 할 수 있다. 그러나 알킬(alkyl)의 경우 내열성이 부족한 단점을 가지고 있다.The greater the planarity, the more difficult the radiant radiation is, so that the intensity of light emission increases, and as the planar area is reduced by introducing a large substituent, the intensity of light emission can be reduced through the non-radiative radiation. Longer alkyl groups, branched alkyl groups, alkoxy groups and amine groups can be introduced for non-radiative radiation. However, alkyl has a disadvantage in that heat resistance is insufficient.
그리고 알콕시(alkoxy)와 아민(amine group)의 경우 전자주개(electron donationg group)로 작용하여 빛을 흡수하는 분자의 흡수 파장을 변화 시킬 수 있다.In addition, alkoxy and amine groups can act as electron donation groups to change the absorption wavelength of light absorbing molecules.
이에 비해, 황(S)을 포함하는 분자를 도입할 경우 빛을 흡수하는 분자에 전자주개(electron donating group)의 역할 등이 감소되고, 내열성을 유지시킬 수 있다.In contrast, when a molecule including sulfur (S) is introduced, a role of an electron donating group in the light absorbing molecule may be reduced, and heat resistance may be maintained.
탄소, 질소, 산소에 비해 원자 크기가 큰 황 원자(sulfur atom)를 도입할 경우 여기된 분자의 에너지가 다양한 에너지 준위를 갖는 황 원자(sulfur atom)로 이동하게 되고, 황 원자의 다양한 에너지 준위를 이동하면서, 즉 진동모드(vibration mode), 회전모드(rotation mode)를 따라 이동하게 되면서, 비방사 복사(non-radiative decay)가 일어날 수 있다. 이러한 특성으로 인해 황 원자(sulfur atom)을 도입 할 경우 분자내의 발광의 세기를 감소 시킬 수 있다.When introducing a sulfur atom having a larger atomic size than carbon, nitrogen, and oxygen, the energy of the excited molecule is transferred to a sulfur atom having various energy levels. Non-radiative decay may occur while moving, ie moving along a vibration mode, a rotation mode. Due to these characteristics, the introduction of sulfur atoms can reduce the intensity of luminescence in the molecule.
발광을 갖는 분자를 액정 디스플레이(LCD)에 적용 할 경우, 명암비(CR, Contrast Ratio)의 감소를 일으켜 품질 저하의 문제가 될 수 있다. 따라서, 발광을 감소시키는 방법에 대하여 다양한 접근을 하고 있다. When a light emitting molecule is applied to a liquid crystal display (LCD), it may cause a decrease in contrast ratio (CR), which may be a problem of deterioration of quality. Therefore, various approaches have been taken to reduce the light emission.
현재 명암비(CR, Contrast Ratio) 감소를 억제하기 위해 발광을 흡수하는 분자를 투입하고 있다. 그러나 색 순도 저하 및 색재 사용량의 증가가 발생되고 있다.Currently, molecules are absorbed to absorb light emission in order to suppress a decrease in contrast ratio (CR). However, there is a decrease in color purity and an increase in colorant usage.
상기 화학식 1로 표시되는 화합물의 치환기들의 예시는 아래에서 설명하나, 이에 한정되는 것은 아니다.Examples of substituents of the compound represented by Formula 1 are described below, but are not limited thereto.
본 명세서에 있어서, 및 는 다른 치환기 또는 결합부에 결합되는 부위를 의미한다.In the present specification, And Means a site which is bonded to another substituent or binding moiety.
본 명세서에서 "치환 또는 비치환된" 이라는 용어는 중수소; 할로겐기; 니트릴기; 니트로기; -OH; 카보닐기; 에스테르기; -COOH; 이미드기; 아미드기; 음이온성기; 알콕시기; 알킬기; 시클로알킬기; 알케닐기; 시클로알케닐기; 아릴알킬기; 포스핀기; 설포네이트기; 아민기; 아릴기; 헤테로아릴기; 실릴기; 붕소기; 아크릴로일기; 아크릴레이트기; 에테르기; N, O, S 또는 P 원자 중 1개 이상을 포함하는 헤테로 고리기 및 음이온성기를 포함하는 군에서 선택된 1개 이상의 치환기로 치환되었거나 또는 어떠한 치환기도 갖지 않는 것을 의미한다. As used herein, the term "substituted or unsubstituted" is deuterium; Halogen group; Nitrile group; Nitro group; -OH; Carbonyl group; Ester group; -COOH; Imide group; Amide group; Anionic group; An alkoxy group; An alkyl group; Cycloalkyl group; Alkenyl groups; Cycloalkenyl group; Arylalkyl group; Phosphine groups; Sulfonate groups; Amine group; Aryl group; Heteroaryl group; Silyl groups; Boron group; Acryloyl group; Acrylate group; Ether group; It means that it is substituted with one or more substituents selected from the group comprising an anionic group and a heterocyclic group containing one or more of N, O, S or P atoms or have no substituents.
본 명세서에 있어서, "인접한" 기는 해당 치환기가 치환된 원자와 직접 연결된 원자에 치환된 치환기, 해당 치환기와 입체구조적으로 가장 가깝게 위치한 치환기, 또는 해당 치환기가 치환된 원자에 치환된 다른 치환기를 의미할 수 있다. 예컨대, 벤젠고리에서 오르토(ortho)위치로 치환된 2개의 치환기 및 지방족 고리에서 동일 탄소에 치환된 2개의 치환기는 서로 "인접한" 기로 해석될 수 있다.As used herein, the term "adjacent" means a substituent substituted on an atom directly connected to an atom to which the substituent is substituted, a substituent positioned closest to the substituent, or another substituent substituted on an atom to which the substituent is substituted. Can be. For example, two substituents substituted at the ortho position in the benzene ring and two substituents substituted at the same carbon in the aliphatic ring may be interpreted as "adjacent" groups.
본 명세서에 있어서, 인접한 기는 결합하여 “고리”를 형성할 수 있다는 것에서 상기 고리란, 방향족 또는 지방족 고리를 의미한다. 구체적으로, 상기 고리는 방향족 고리일 수 있으며, 아릴기 또는 헤테로아릴기일 수 있다. 상기 아릴기 및 헤테로아릴기는 후술하는 설명이 적용될 수 있다.In the present specification, the ring refers to an aromatic or aliphatic ring in that adjacent groups can combine to form a “ring”. Specifically, the ring may be an aromatic ring, it may be an aryl group or a heteroaryl group. The following description may be applied to the aryl group and heteroaryl group.
본 명세서에 있어서, 할로겐기의 예로는 불소, 염소, 브롬 또는 요오드가 있다. In the present specification, examples of the halogen group include fluorine, chlorine, bromine or iodine.
본 명세서에 있어서, 상기 카보닐기는 -COR로 표시될 수 있고, 상기 R은 수소; 중수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 또는 치환 또는 비치환된 아릴기일 수 있다. 상기 카르보닐기의 탄소수는 특별히 한정되지 않으나, 탄소수 1 내지 30인 것이 바람직하다. 구체적으로 하기와 같은 구조의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the carbonyl group may be represented by -COR, and R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group. Although carbon number of the said carbonyl group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
본 명세서에 있어서, 상기 에스테르기는 -COOR로 표시될 수 있고, 상기 R은 수소; 중수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 또는 치환 또는 비치환된 아릴기일 수 있다. 상기 에스테르기는 에스테르기의 산소가 탄소수 1 내지 25의 직쇄, 분지쇄 또는 고리쇄 알킬기 또는 탄소수 6 내지 30의 아릴기로 치환될 수 있다. 구체적으로, 하기 구조식의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the ester group may be represented by -COOR, wherein R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group. The ester group may be substituted with oxygen of the ester group having 1 to 25 carbon atoms, a linear, branched or cyclic alkyl group or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
본 명세서에 있어서, 이미드기의 탄소수는 특별히 한정되지 않으나, 탄소수 1 내지 30인 것이 바람직하다. 구체적으로 하기와 같은 구조의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In this specification, although carbon number of an imide group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
본 명세서에 있어서, 아미드기는 아미드기의 질소가 수소, 탄소수 1 내지 30의 직쇄, 분지쇄 또는 고리쇄 알킬기 또는 탄소수 6 내지 30의 아릴기로 치환될 수 있다. 구체적으로, 하기 구조식의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the amide group may be substituted with nitrogen of the amide group is hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
본 명세서에 있어서, 포스핀기는 알킬포스핀기 또는 아릴포스핀기를 의미하며, 상기 알킬포스핀기는 알킬기로 치환된 포스핀기를 의미한다. 상기 알킬포스핀기의 탄소수는 특별히 한정되지 않으나 1 내지 20인 것이 바람직하다. 상기 알킬포스핀기의 예로는, 디메틸포스핀기, 디에틸포스핀기, 디-n-프로필포스핀기, 디이소프로필포스핀기, 디-n-부틸포스핀기, 디-sec-부틸포스핀기, 디-tert-부틸포스핀기, 디이소부틸포스핀기, tert-부틸이소프로필포스핀기, 디-n-헥실포스핀기, 디-n-옥틸포스핀기, 디-n-메실포스핀기 등이 있으나, 이에 한정되지 않는다. 상기 아릴포스핀기는 아릴기로 치환된 포스핀기를 의미한다. 상기 아릴포스핀기의 탄소수는 특별히 한정되지 않으나 6 내지 30인 것이 바람직하다. 상기 아릴포스핀기의 예로는, 디페닐포스핀기, 디벤질포스핀기, 메메틸페닐포스핀기, 벤질헥실포스핀기, 비스트리메틸실릴포스핀기 등이 있으나, 이에 한정되지 않는다.In the present specification, the phosphine group means an alkyl phosphine group or an aryl phosphine group, and the alkyl phosphine group means a phosphine group substituted with an alkyl group. Although carbon number of the said alkyl phosphine group is not specifically limited, It is preferable that it is 1-20. Examples of the alkylphosphine group include dimethylphosphine group, diethylphosphine group, di-n-propylphosphine group, diisopropylphosphine group, di-n-butylphosphine group, di-sec-butylphosphine group and di-tert. -Butyl phosphine group, diisobutyl phosphine group, tert- butyl isopropyl phosphine group, di-n-hexyl phosphine group, di-n-octyl phosphine group, di-n- mesyl phosphine group and the like, but is not limited thereto . The arylphosphine group refers to a phosphine group substituted with an aryl group. Although carbon number of the said aryl phosphine group is not specifically limited, It is preferable that it is 6-30. Examples of the arylphosphine group include, but are not limited to, a diphenylphosphine group, a dibenzylphosphine group, a methylphenylphosphine group, a benzylhexylphosphine group, a bistrimethylsilylphosphine group, and the like.
본 명세서에서 음이온성기는 화학식 1의 구조와 화학적인 결합을 가지며, 상기 화학적인 결합은 이온 결합을 의미할 수 있다. 상기 음이온성기는, 특별히 한정되지 않으며, 예컨대 미국 특허 제7,939,644호, 일본 특개 제2006-003080호, 일본 특개 제2006-001917호, 일본 특개 제2005-159926호, 일본 특개 제2007-7028897호, 일본 특개 제2005-071680호, 한국 출원 공개 제2007-7000693호, 일본 특개 제2005-111696호, 일본 특개 제2008-249663호, 일본 특개 제2014-199436에 기재되어 있는 음이온들이 적용될 수 있다. In the present specification, the anionic group has a chemical bond with the structure of Formula 1, and the chemical bond may mean an ionic bond. The anionic group is not particularly limited, and for example, US Patent No. 7,939,644, Japanese Patent Laid-Open No. 2006-003080, Japanese Patent Laid-Open 2006-001917, Japanese Patent Laid-Open No. 2005-159926, Japanese Patent Laid-Open No. 2007-7028897, Japan The anions described in Japanese Patent Application Laid-Open No. 2005-071680, Korean Patent Application Publication No. 2007-7000693, Japanese Patent Application No. 2005-111696, Japanese Patent Application No. 2008-249663, and Japanese Patent Application No. 2014-199436 can be applied.
상기 음이온성기의 구체적인 예로는, 트리플루오르메탄설폰산 음이온, 비스(트리플루오로메틸술포닐)아미드 음이온, 비스트리플루오르메탄설폰이미드 음이온, 비스퍼플루오르에틸설폰이미드 음이온, 테트라페닐보레이트 음이온, 테트라키스(4-플루오로페닐)보레이트, 테트라키스(펜타플루오로페닐)보레이트, 트리스트리플루오로메탄설포닐메티드, SO3
-, CO2
-, SO2N-SO2CF3, SO2N-SO2CF2CF3, 할로겐기, 예컨대 불소기, 요오드기, 염소기 등이 있으나, 이에만 한정되는 것은 아니다.Specific examples of the anionic group include trifluoromethanesulfonic acid anion, bis (trifluoromethylsulfonyl) amide anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, tetraphenylborate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tris trifluoromethane sulfonyl nilme suited to, SO 3 -, CO 2 - , SO 2 N - SO 2 CF 3, SO 2 N - SO 2 CF 2 CF 3, but include a halogen group such as fluorine group, an iodo group, a chlorine group, it is not limited thereto.
본 명세서에 있어서, 음이온성기는 그 자체로 음이온을 가질 수 있으며, 또는 다른 양이온과 함께 착화합물 형태로 존재할 수 있다. 따라서 치환된 음이온성기의 개수에 따라서 본 발명의 화합물 분자 전체 전하의 합이 변할 수 있다. 예컨대, 상기 화학식 1이 암모늄 구조를 포함한다면, 상기 암모늄 구조 하나에 양이온을 갖고 있기 때문에 분자 전체 전하의 합은 치환된 음이온성기의 개수에서 1을 뺀 값만큼의 음이온부터 0까지의 값을 가질 수 있다.In the present specification, the anionic group may have an anion per se, or may exist in complex form with other cations. Therefore, the sum of the total charge of the compound molecules of the present invention may vary depending on the number of substituted anionic groups. For example, if Formula 1 includes an ammonium structure, the total charge of the molecule may have a value from an anion to 0 minus 1 from the number of substituted anionic groups since the ammonium structure has a cation. have.
본 명세서에 있어서, 상기 알콕시기는 직쇄 또는 분지쇄일 수 있고, 탄소수는 특별히 한정되지 않으나, 1 내지 30일 수 있으며, 구체적으로는 1 내지 20일 수 있고, 더욱 구체적으로는 1 내지 10일 수 있다. In the present specification, the alkoxy group may be linear or branched, and the number of carbon atoms is not particularly limited, but may be 1 to 30, specifically 1 to 20, and more specifically 1 to 10.
본 명세서에 있어서, 상기 알킬기는 직쇄 또는 분지쇄일 수 있고, 탄소수는 특별히 한정되지 않으나 1 내지 60인 것이 바람직하다. 일 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 30이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 20이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 10이다. 알킬기의 구체적인 예로는 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, 이소부틸기, tert-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기 등이 있으나, 이들에 한정되지 않는다.본 명세서에 있어서, 시클로알킬기는 특별히 한정되지 않으나, 탄소수 3 내지 30인 것이 바람직하며, 특히 시클로펜틸기, 시클로헥실기가 바람직하나, 이들에 한정되지 않는다.In the present specification, the alkyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 1 to 60. According to an exemplary embodiment, the alkyl group has 1 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 10 carbon atoms. Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group and n-jade And the like, but are not limited thereto. In the present specification, the cycloalkyl group is not particularly limited, but preferably has 3 to 30 carbon atoms, and particularly preferably cyclopentyl group and cyclohexyl group, but is not limited thereto. .
본 명세서에 있어서, 시클로알킬기는 특별히 한정되지 않으나, 탄소수 3 내지 60인 것이 바람직하며, 일 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 30이다. 또 하나의 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 20이다. 또 하나의 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 6이다. 구체적으로 시클로프로필기, 시클로부틸기, 시클로펜틸기, 시클로헥실기, 시클로헵틸기, 시클로옥틸기 등이 있으나, 이에 한정되지 않는다.In the present specification, the cycloalkyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms. Specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group and the like, but is not limited thereto.
본 명세서에 있어서, 상기 알케닐기는 직쇄 또는 분지쇄일 수 있고, 탄소수는 특별히 한정되지 않으나, 2 내지 60인 것이 바람직하다. 일 실시상태에 따르면, 상기 알킬기의 탄소수는 2 내지 30이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 2 내지 20이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 2 내지 10이다. 알케닐기의 구체적인 예로는 스틸베닐기(stylbenyl), 스티레닐기(styrenyl)기 등의 아릴기가 치환된 알케닐기가 바람직하나 이들에 한정되지 않는다. In the present specification, the alkenyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 2 to 60. According to an exemplary embodiment, the alkyl group has 2 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 10 carbon atoms. Specific examples of the alkenyl group include, but are not limited to, alkenyl groups substituted with aryl groups such as stylbenyl and styrenyl groups.
본 명세서에 있어서, 시클로알케닐기는 특별히 한정되지 않으나, 탄소수 3 내지 60인 것이 바람직하며, 일 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 30이다. 또 하나의 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 20이다. 또 하나의 실시상태에 따르면, 상기 시클로알킬기의 탄소수는 3 내지 6이다. 시클로알케닐기의 예로는 시클로펜테닐렌기, 시클로헥세닐렌기가 바람직하나, 이들에 한정되지 않는다. In the present specification, the cycloalkenyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms. Examples of the cycloalkenyl group include, but are not limited to, a cyclopentenylene group and a cyclohexenylene group.
본 명세서에 있어서, 아릴기는 특별히 한정되지 않으나 탄소수 6 내지 60인 것이 바람직하며, 단환식 아릴기 또는 다환식 아릴기일 수 있다. 일 실시상태에 따르면, 상기 아릴기의 탄소수는 6 내지 30이다. 일 실시상태에 따르면, 상기 아릴기의 탄소수는 6 내지 20이다. 상기 아릴기가 단환식 아릴기로는 페닐기, 바이페닐기, 터페닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다. 상기 다환식 아릴기로는 나프틸기, 안트라세닐기, 인데닐기, 페난트레닐기, 파이레닐기, 페릴레닐기, 트리페닐기, 크라이세닐기, 플루오레닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the aryl group is not particularly limited, but preferably has 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to an exemplary embodiment, the aryl group has 6 to 30 carbon atoms. According to an exemplary embodiment, the aryl group has 6 to 20 carbon atoms. The aryl group may be a monocyclic aryl group, but may be a phenyl group, a biphenyl group, a terphenyl group, etc., but is not limited thereto. The polycyclic aryl group may be naphthyl group, anthracenyl group, indenyl group, phenanthrenyl group, pyrenyl group, perrylenyl group, triphenyl group, chrysenyl group, fluorenyl group and the like, but is not limited thereto.
본 명세서에 있어서, 플루오레닐기는 치환될 수 있고, 치환기 2개가 서로 결합하여 스피로 구조를 형성할 수 있다.In the present specification, the fluorenyl group may be substituted, and two substituents may be bonded to each other to form a spiro structure.
상기 플루오레닐기가 치환되는 경우, 등의 스피로플루오레닐기, (9,9-디메틸플루오레닐기), 및 (9,9-디페닐플루오레닐기) 등의 치환된 플루오레닐기가 될 수 있다. 다만, 이에 한정되는 것은 아니다.When the fluorenyl group is substituted, Spirofluorenyl groups, such as (9,9-dimethylfluorenyl group), and Substituted fluorenyl groups such as (9,9-diphenylfluorenyl group). However, the present invention is not limited thereto.
본 명세서에 있어서, 상기 아릴알킬기는 구체적으로 아릴부분은 탄소수 6 내지 30이고, 알킬 부분은 탄소수 1 내지 30일 수 있다. 구체적인 예로는 벤질기, p-메틸벤질기, m-메틸벤질기, p-에틸벤질기, m-에틸벤질기, 3,5-디메틸벤질기, α-메틸벤질기, α,α-디메틸벤질기, α,α-메틸페닐벤질기, 1-나프틸벤질기, 2-나프틸벤질기, p-플루오르벤질기, 3,5-디플루오르벤질기, α,α-디트리플루오로메틸벤질기, p-메톡시벤질기, m-메톡시벤질기, α-페녹시벤질기, α-벤질기옥시벤질기, 나프틸메틸기, 나프틸에틸기, 나프틸이소프로필기, 피롤릴메틸기, 피롤렐에틸기, 아미노벤질기, 니트로벤질기, 시아노벤질기, 1-히드록시-2-페닐이소프로필기, 1-클로로-2-페닐이소프로필기 등이 있으나, 이에 한정되지 않는다.In the present specification, the arylalkyl group may specifically include an aryl portion having 6 to 30 carbon atoms and an alkyl portion having 1 to 30 carbon atoms. Specific examples include benzyl group, p-methylbenzyl group, m-methylbenzyl group, p-ethylbenzyl group, m-ethylbenzyl group, 3,5-dimethylbenzyl group, α-methylbenzyl group, α, α-dimethylbenzyl Group, α, α-methylphenylbenzyl group, 1-naphthylbenzyl group, 2-naphthylbenzyl group, p-fluorobenzyl group, 3,5-difluorobenzyl group, α, α-ditrifluoromethylbenzyl group , p-methoxybenzyl group, m-methoxybenzyl group, α-phenoxybenzyl group, α-benzyl groupoxybenzyl group, naphthylmethyl group, naphthylethyl group, naphthylisopropyl group, pyrrolylmethyl group, pyrrole Ethyl group, aminobenzyl group, nitrobenzyl group, cyanobenzyl group, 1-hydroxy-2-phenyl isopropyl group, 1-chloro-2-phenyl isopropyl group and the like, but is not limited thereto.
본 명세서에 있어서, 상기 헤테로고리기는 이종원자로 O, N 또는 S를 포함하는 헤테고리기로서, 탄소수는 특별히 한정되지 않으나 탄소수 2 내지 30, 구체적으로는 탄소수 2 내지 20이다. 헤테로고리기의 예로는 티오펜기, 퓨란기, 피롤기, 이미다졸기, 티아졸기, 옥사졸기, 옥사디아졸기, 트리아졸기, 피리딜기, 비피리딜기, 트리아진기, 아크리딜기, 피리다진기, 퀴놀리닐기, 이소퀴놀린기, 인돌기, 카바졸기, 벤조옥사졸기, 벤조이미다졸기, 벤조티아졸기, 벤조카바졸기, 벤조티오펜기, 디벤조티오펜기, 벤조퓨라닐기, 디벤조퓨란기 등이 있으나, 이들에만 한정되는 것은 아니다.In the present specification, the heterocyclic group is a heterocyclic group containing O, N or S as a hetero atom, and the carbon number is not particularly limited, but is 2 to 30 carbon atoms, specifically 2 to 20 carbon atoms. Examples of the heterocyclic group include thiophene group, furan group, pyrrole group, imidazole group, thiazole group, oxazole group, oxadiazole group, triazole group, pyridyl group, bipyridyl group, triazine group, acridil group, pyridazine group , Quinolinyl group, isoquinoline group, indole group, carbazole group, benzoxazole group, benzoimidazole group, benzothiazole group, benzocarbazole group, benzothiophene group, dibenzothiophene group, benzofuranyl group, dibenzofuran And the like, but are not limited thereto.
본 명세서에 있어서, 헤테로아릴기는 방향족인 것을 제외하고는 전술한 헤테로고리기에 관한 설명이 적용될 수 있다. In the present specification, the description of the aforementioned heterocyclic group may be applied except that the heteroaryl group is aromatic.
본 명세서에 있어서, 실릴기는 -SiZ1Z2Z3의 화학식으로 표시될 수 있고, 상기 Z1, Z2 및 Z3는 각각 수소; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기일 수 있다. 상기 실릴기는 구체적으로 트리메틸실릴기(TMS), 트리에틸실릴기, t-부틸디메틸실릴기, 비닐디메틸실릴기, 프로필디메틸실릴기, 트리페닐실릴기, 디페닐실릴기, 페닐실릴기 등이 있으나 이에 한정되지 않는다.In the present specification, the silyl group may be represented by a chemical formula of -SiZ1Z2Z3, wherein Z1, Z2 and Z3 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group. Specific examples of the silyl group include trimethylsilyl group (TMS), triethylsilyl group, t-butyldimethylsilyl group, vinyldimethylsilyl group, propyldimethylsilyl group, triphenylsilyl group, diphenylsilyl group, and phenylsilyl group. It is not limited to this.
본 명세서에 있어서, 알킬술폭시기로는 메틸술폭시기, 에틸술폭시기, 프로필술폭시기, 부틸술폭시기 등이 있으나, 이에 한정되는 것은 아니다. 상기 알킬술폭시기 중의 알킬기는 전술한 알킬기에 대한 설명이 적용될 수 있다. In the present specification, the alkyl sulfoxy group includes methyl sulfoxy group, ethyl sulfoxy group, propyl sulfoxy group, butyl sulfoxy group, and the like, but is not limited thereto. The alkyl group in the alkyl sulfoxy group may be applied to the description of the alkyl group described above.
본 명세서에 있어서, 붕소기는 -BW4W5의 화학식으로 표시될 수 있고, 상기 W4 및 W5는 각각 수소; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기일 수 있다. 상기 붕소기는 구체적으로 트리메틸붕소기, 트리에틸붕소기, t-부틸디메틸붕소기, 트리페닐붕소기, 페닐붕소기 등이 있으나 이에 한정되지 않는다.In the present specification, the boron group may be represented by the formula of -BW4W5, wherein W4 and W5 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group. The boron group may include, but is not limited to, trimethylboron group, triethylboron group, t-butyldimethylboron group, triphenylboron group, and phenylboron group.
본 명세서에 있어서, 아크릴로일기는 광중합성 불포화기를 의미하며, 예컨대, (메타)아크릴로일기를 들 수 있으나 이에 한정되는 것은 아니다. In the present specification, the acryloyl group means a photopolymerizable unsaturated group, and for example, (meth) acryloyl group may be mentioned, but is not limited thereto.
본 명세서에 있어서, 아크릴레이트기는 광중합성 불포화기를 의미하며, 예컨대 (메타)아크릴레이트기를 들 수 있으나 이에 한정되는 것은 아니다. In the present specification, the acrylate group refers to a photopolymerizable unsaturated group, and examples thereof include (meth) acrylate groups, but are not limited thereto.
본 명세서에 있어서, '(메타)아크릴로일'이란, 아크릴로일 및 메타아크릴로일로 이루어지는 군으로부터 선택되는 적어도 1종을 나타낸다. '(메타)아크릴레이트' 의 표기도 마찬가지의 의미를 갖는다.In this specification, "(meth) acryloyl" represents at least 1 sort (s) chosen from the group which consists of acryloyl and methacryloyl. The description of '(meth) acrylate' also has the same meaning.
본 명세서에 있어서, 에테르기는 -COR로 표시될 수 있다. 상기 R은 치환 또는 비치환된 알킬기이다. 상기 알킬기는 전술한 알킬기의 설명이 적용될 수 있다. In the present specification, the ether group may be represented by -COR. R is a substituted or unsubstituted alkyl group. The alkyl group may be applied to the description of the alkyl group described above.
본 명세서에 있어서, 설포네이트기는 알킬설포네이트기 또는 아릴설포네이트기일 수 있다. 상기 '알킬'은 전술한 알킬기에 대한 설명이 적용될 수 있으며, 상기 '아릴'은 전술한 아릴기에 대한 설명이 적용될 수 있다. In the present specification, the sulfonate group may be an alkylsulfonate group or an arylsulfonate group. The description of the aforementioned alkyl group may be applied to the 'alkyl', and the description of the aforementioned aryl group may be applied to the 'aryl'.
본 명세서에 있어서, 아민기는 -NH2; 알킬아민기; N-알킬아릴아민기; 아릴아민기; N-아릴헤테로아릴아민기; N-알킬헤테로아릴아민기 및 헤테로아릴아민기로 이루어진 군으로부터 선택될 수 있으며, 탄소수는 특별히 한정되지 않으나, 1 내지 30인 것이 바람직하다. 아민기의 구체적인 예로는 메틸아민기, 디메틸아민기, 에틸아민기, 디에틸아민기, 페닐아민기, 나프틸아민기, 바이페닐아민기, 안트라세닐아민기, 9-메틸-안트라세닐아민기, 디페닐아민기, N-페닐나프틸아민기, 디톨릴아민기, N-페닐톨릴아민기, 트리페닐아민기, N-페닐바이페닐아민기; N-페닐나프틸아민기; N-바이페닐나프틸아민기; N-나프틸플루오레닐아민기; N-페닐페난트레닐아민기; N-바이페닐페난트레닐아민기; N-페닐플루오레닐아민기; N-페닐터페닐아민기; N-페난트레닐플루오레닐아민기; N-바이페닐플루오레닐아민기 등이 있으나, 이에 한정되는 것은 아니다.In the present specification, the amine group is -NH 2 ; Alkylamine group; N-alkylarylamine group; Arylamine group; N-aryl heteroaryl amine group; It may be selected from the group consisting of an N-alkylheteroarylamine group and a heteroarylamine group, and carbon number is not particularly limited, but is preferably 1 to 30. Specific examples of the amine group include methylamine group, dimethylamine group, ethylamine group, diethylamine group, phenylamine group, naphthylamine group, biphenylamine group, anthracenylamine group, and 9-methyl-anthracenylamine group. Diphenylamine group, N-phenylnaphthylamine group, ditolylamine group, N-phenyltolylamine group, triphenylamine group, N-phenylbiphenylamine group; N-phenylnaphthylamine group; N-biphenyl naphthylamine group; N-naphthylfluorenylamine group; N-phenylphenanthrenylamine group; N-biphenylphenanthrenylamine group; N-phenyl fluorenyl amine group; N-phenylterphenylamine group; N-phenanthrenyl fluorenyl amine group; N-biphenyl fluorenyl amine group and the like, but is not limited thereto.
본 명세서에 있어서, 질소원자를 포함하는 이무수물기의 탄소수는 특별히 한정되지 않으나, 4 내지 30, 구체적으로는 4 내지 20, 더욱 구체적으로는 4 내지 15일 수 있다.In the present specification, the carbon number of the dianhydride group including the nitrogen atom is not particularly limited, but may be 4 to 30, specifically 4 to 20, and more specifically 4 to 15.
본 명세서에서 알킬렌기는 알칸(alkane)에 결합위치가 두 개 있는 것을 의미한다. 상기 알킬렌기는 직쇄, 분지쇄 또는 고리쇄일 수 있다. 알킬렌기의 탄소수는 특별히 한정되지 않으나, 예컨대 탄소수 1 내지 30, 구체적으로는 1 내지 20, 더욱 구체적으로는 1 내지 10이다.In the present specification, an alkylene group means that there are two bonding positions in an alkane. The alkylene group may be straight, branched or cyclic. Although carbon number of an alkylene group is not specifically limited, For example, it is C1-C30, Specifically, 1-20, More specifically, it is 1-10.
본 명세서에 있어서, 헤테로알킬렌기는 이종원자로 O, N 또는 S를 포함하는 알칸(alkane)에 결합위치가 두 개 있는 것을 의미한다. 상기 헤테로알킬렌기는 직쇄, 분지쇄 또는 고리쇄일 수 있다. 헤테로알킬렌기의 탄소수는 특별히 한정되지 않으나, 예컨대 탄소수 2 내지 30, 구체적으로는 탄소수 2 내지 20, 더욱 구체적으로는 탄소수 2 내지 10이다.In the present specification, the heteroalkylene group means that there are two bonding positions in an alkane including O, N or S as a hetero atom. The heteroalkylene group may be linear, branched or cyclic. Although carbon number of a heteroalkylene group is not specifically limited, For example, it is C2-C30, Specifically, it is C2-C20, More specifically, it is C2-C10.
본 명세서에 있어서, 아릴렌기는 아릴기에 결합 위치가 두 개 있는 것 즉 2가기를 의미한다. 이들은 각각 2가기인 것을 제외하고는 전술한 아릴기의 설명이 적용될 수 있다.In the present specification, the arylene group refers to a divalent group having two bonding positions in the aryl group. The description of the aforementioned aryl group can be applied except that they are each divalent.
본 명세서에 있어서, 헤테로아릴렌기는 헤테로아릴기에 결합 위치가 두 개 있는 것 즉 2가기를 의미한다. 이들은 각각 2가기인 것을 제외하고는 전술한 헤테로아릴기의 설명이 적용될 수 있다.In the present specification, the heteroarylene group means a divalent group having two bonding positions in the heteroaryl group. The description of the aforementioned heteroaryl group can be applied except that they are each divalent.
본 명세서의 일 실시상태에 있어서, 상기 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 직쇄 또는 분지쇄의 알킬렌기이다. In one embodiment of the present specification, L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 30의 치환 또는 비치환된 직쇄 또는 분지쇄의 알킬렌기이다. In one embodiment of the present specification, L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 30 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 20의 치환 또는 비치환된 직쇄 또는 분지쇄의 알킬렌기이다. In one embodiment of the present specification, L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄의 알킬렌기이다. In one embodiment of the present specification, L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 10 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 메틸렌기; 치환 또는 비치환된 에틸렌기; 치환 또는 비치환된 프로필렌기; 또는 치환 또는 비치환된 부틸렌기이다. In one embodiment of the present specification, L1 and L2 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methylene group; Substituted or unsubstituted ethylene group; Substituted or unsubstituted propylene group; Or a substituted or unsubstituted butylene group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 메틸렌기; 에틸렌기; 프로필렌기; 또는 부틸렌기이다. In one embodiment of the present specification, L1 and L2 of Formula 1 are the same as or different from each other, and each independently methylene group; Ethylene group; Propylene group; Or butylene group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R1 및 R2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 4 내지 30의 질소 원자를 포함하는 이무수물기이다. In an exemplary embodiment of the present specification, R1 and R2 of the general formula (1) are the same as or different from each other, and each independently an dianhydride group including a nitrogen atom having 4 to 30 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R1 및 R2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 4 내지 20의 질소 원자를 포함하는 이무수물기이다. In one embodiment of the present specification, R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R1 및 R2는 서로 같거나 상이하고, 각각 독립적으로 탄소수 4 내지 15의 질소 원자를 포함하는 이무수물기이다. In one embodiment of the present specification, R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 15 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 질소 원자를 포함하는 이무수물기는 하기 치환기 중 어느 하나로 표시될 수 있다. In one embodiment of the present specification, the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
상기 치환기에 있어서, 는 상기 화학식 1에 연결되는 부위를 나타내고, In the substituent, Represents a site linked to the formula (1),
X1, X2 및 Y1 내지 Y3는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; 니트로기; -OH; -SO3H;; -COOH; 포스핀기; 음이온성기; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이거나, 인접하는 기는 결합하여 치환 또는 비치환된 고리를 형성한다. X1, X2 and Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups combine to form a substituted or unsubstituted ring.
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 치환 또는 비치환된 고리를 형성할 수 있다. In one embodiment of the present specification, X1 and X2 may combine with each other to form a substituted or unsubstituted ring.
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 치환 또는 비치환된 벤젠고리; 또는 치환 또는 비치환된 나프탈렌 고리를 형성할 수 있다. In one embodiment of the present specification, X1 and X2 are bonded to each other to form a substituted or unsubstituted benzene ring; Or a substituted or unsubstituted naphthalene ring.
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠고리; 또는 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 나프탈렌 고리를 형성할 수 있고, 상기 M 및 Y는 상기 화학식 1에서 정의한 바와 같다. In one embodiment of the present specification, X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or it may form a substituted or unsubstituted naphthalene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠고리; 또는 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 나프탈렌 고리를 형성할 수 있고, 상기 M은 수소; Na; K; Rb; Cs; Fr; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠고리; 또는 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 나프탈렌 고리를 형성할 수 있고, 상기 M은 수소; Na; K; Rb; Cs; Fr; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 치환 또는 비치환된 n-헥실기이다. In one embodiment of the present specification, X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
본 명세서의 일 실시상태에 있어서, 상기 X1 및 X2는 서로 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠고리; 또는 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 나프탈렌 고리를 형성할 수 있고, 상기 M은 수소; Na; K; Rb; Cs; Fr; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 에틸기로 치환된 n-헥실기이다. In one embodiment of the present specification, X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 치환 또는 비치환된 고리를 형성할 수 있다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted ring.
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 치환 또는 비치환된 벤젠 고리를 형성할 수 있다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted benzene ring.
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠 고리를 형성할 수 있고, 상기 M 및 Y는 상기 화학식 1에서 정의한 바와 같다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or it may form a substituted or unsubstituted benzene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠 고리를 형성할 수 있고, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠 고리를 형성할 수 있고, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 치환 또는 비치환된 n-헥실기이다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
본 명세서의 일 실시상태에 있어서, 상기 Y1과 Y2; 및 Y2와 Y3은 결합하여 -SO3M; 또는 -SO2NHY로 치환 또는 비치환된 벤젠 고리를 형성할 수 있고, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되며, 상기 Y는 에틸기로 치환된 n-헥실기이다. In one embodiment of the present specification, the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
본 명세서의 일 실시상태에 있어서, 상기 질소 원자를 포함하는 이무수물기는 하기 치환기 중 어느 하나로 표시될 수 있다. In one embodiment of the present specification, the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
상기 치환기에 있어서, 는 상기 화학식 1에 연결되는 부위를 나타내고, X3 내지 X5 및 Y4는 서로 같거나 상이하고 각각 독립적으로 수소; 중수소; 할로겐기; 니트로기; -OH; -SO3H;; -SO3M; -SO2NHY; -COOH; 포스핀기; 음이온성기; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이며, 상기 M 및 Y는 상기 화학식 1에서 정의한 바와 같고, x3는 0 내지 4의 정수, x4, x5 및 y4는 0 내지 6의 정수이다. In the substituent, Represents a moiety linked to Formula 1, X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -SO 3 M; -SO 2 NHY; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
상기 치환기에 있어서, 는 상기 화학식 1에 연결되는 부위를 나타내고, X3 내지 X5 및 Y4는 서로 같거나 상이하고 각각 독립적으로 수소; -SO3M; 또는 -SO2NHY이며, 상기 M 및 Y는 상기 화학식 1에서 정의한 바와 같고, x3는 0 내지 4의 정수, x4, x5 및 y4는 0 내지 6의 정수이다. In the substituent, Represents a moiety linked to Formula 1, X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; -SO 3 M; Or -SO 2 NHY, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 또는 탄소수 6 내지 30의 치환 또는 비치환된 아릴기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 20의 치환 또는 비치환된 알킬기; 또는 탄소수 6 내지 20의 치환 또는 비치환된 아릴기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 탄소수 1 내지 10의 치환 또는 비치환된 알킬기; 또는 탄소수 6 내지 20의 치환 또는 비치환된 아릴기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 메틸기; 또는 치환 또는 비치환된 페닐기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methyl group; Or a substituted or unsubstituted phenyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 메틸기; 할로겐기로 치환된 메틸기; 또는 페닐기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; A methyl group substituted with a halogen group; Or a phenyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 메틸기; 트리플루오르메틸기(-CF3); 또는 페닐기이다. In one embodiment of the present specification, R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; Trifluoromethyl group (-CF 3 ); Or a phenyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; 니트로기; 히드록시기; -COR; -COOR; 이미드기; 아미드기; 음이온성기; 탄소수 1 내지 30의 치환 또는 비치환된 알콕시기; 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 탄소수 3 내지 30의 치환 또는 비치환된 시클로알킬기; 탄소수 2 내지 30의 치환 또는 비치환된 알케닐기; 탄소수 3 내지 30의 치환 또는 비치환된 시클로알케닐기; 치환 또는 비치환된 설포네이트기; 탄소수 1 내지 30의 치환 또는 비치환된 아민기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴기; 및 탄소수 2 내지 30의 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되고, In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; Hydroxyl group; -COR; -COOR; Imide group; Amide group; Anionic group; A substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; A substituted or unsubstituted alkenyl group having 2 to 30 carbon atoms; A substituted or unsubstituted cycloalkenyl group having 3 to 30 carbon atoms; Substituted or unsubstituted sulfonate group; A substituted or unsubstituted amine group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group having 2 to 30 carbon atoms,
상기 R은 수소; 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 탄소수 3 내지 30의 치환 또는 비치환된 시클로알킬기; 또는 탄소수 6 내지 30의 치환 또는 비치환된 아릴기이다. R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 시클로알케닐기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되고, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고, 상기 M1, M2 및 Y는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택된다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 치환 또는 비치환된 알킬기이고, 상기 Y는 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group, and Y is a substituted or unsubstituted alkyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 탄소수 1 내지 30의 치환 또는 비치환된 알킬기이고, 상기 Y는 탄소수 1 내지 30의 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 탄소수 1 내지 20의 치환 또는 비치환된 알킬기이고, 상기 Y는 탄소수 1 내지 20의 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 탄소수 1 내지 10의 치환 또는 비치환된 알킬기이고, 상기 Y는 탄소수 1 내지 10의 치환 또는 비치환된 알킬기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 치환 또는 비치환된 메틸기이고, 상기 Y는 탄소수 1 내지 10의 탄소로 치환 또는 비치환된 헥실기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted methyl group, wherein Y is a hexyl group unsubstituted or substituted with carbon of 1 to 10 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 할로겐기로 치환 또는 비치환된 메틸기이고, 상기 Y는 에틸기로 치환 또는 비치환된 헥실기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a methyl group unsubstituted or substituted with a halogen group, and Y is a hexyl group unsubstituted or substituted with an ethyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; -SO2NHY; 또는 트리플루오르메틸기(-CF3)이고, 상기 Y는 에틸기로 치환된 헥실기이다. In one embodiment of the present specification, R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a trifluoromethyl group (-CF 3 ), and Y is a hexyl group substituted with an ethyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R5는 수소; 또는 트리플루오르메틸기이다. In one embodiment of the present specification, R5 of Chemical Formula 1 is hydrogen; Or a trifluoromethyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R6는 수소; -SO2NHY; 또는 트리플루오르메틸기이고, 상기 Y는 에틸기로 치환된 헥실기이다. In one embodiment of the present specification, R6 of Chemical Formula 1 is hydrogen; -SO 2 NHY; Or a trifluoromethyl group, and Y is a hexyl group substituted with an ethyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R7는 수소이다. In one embodiment of the present specification, R7 of Formula 1 is hydrogen.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R8은 수소이다. In one embodiment of the present specification, R8 of Formula 1 is hydrogen.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R9는 수소이다. In one embodiment of the present specification, R9 of Formula 1 is hydrogen.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R10은 수소이다. In one embodiment of the present specification, R10 of Formula 1 is hydrogen.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R11은 수소이다. In one embodiment of the present specification, R11 of Formula 1 is hydrogen.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 R12는 수소이다. In one embodiment of the present specification, R12 of Formula 1 is hydrogen.
또한, 본 명세서의 일 실시상태에 있어서, R13 내지 R17은 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3
-; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 음이온성기; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 헤테로아릴기이고, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고, 상기 M1, M2 및 Y는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되며, 상기 R13 내지 R17 중 적어도 하나는 음이온성기이다. In addition, in an exemplary embodiment of the present specification, R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group, at least one of the R13 to R17 is an anionic group.
본 명세서의 일 실시상태에 있어서, R13 내지 R17은 서로 같거나 상이하고, 각각 독립적으로 수소; -SO3
-; -SO3M; 또는 -SO2NHY이고, 상기 M 및 Y는 앞에서 정의한 바와 같으며, 상기 R13 내지 R17 중 적어도 하나는 음이온성기이다. In one embodiment of the present specification, R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R 13 to R 17 is an anionic group.
본 명세서의 일 실시상태에 있어서, R13 내지 R17은 서로 같거나 상이하고, 각각 독립적으로 수소; -SO3
-; -SO3M; 또는 -SO2NHY이고, 상기 M 및 Y는 앞에서 정의한 바와 같으며, 상기 R13 내지 R17 중 적어도 하나는 -SO3
-이다. In one embodiment of the present specification, R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R13 to R17 is —SO 3 — .
본 명세서의 일 실시상태에 있어서, R13은 -SO3
-이다.In one embodiment of this disclosure, R13 is -SO 3 - a.
본 명세서의 일 실시상태에 있어서, R14는 수소이다. In one embodiment of the present specification, R14 is hydrogen.
본 명세서의 일 실시상태에 있어서, R15는 수소; -SO3M; 또는 -SO2NHY이고, 상기 M 및 Y는 앞에서 정의한 바와 같다. In one embodiment of the present specification, R15 is hydrogen; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above.
본 명세서의 일 실시상태에 있어서, R16은 수소이다. In one embodiment of the present specification, R16 is hydrogen.
본 명세서의 일 실시상태에 있어서, R17은 수소이다. In one embodiment of the present specification, R17 is hydrogen.
본 명세서의 일 실시상태에 있어서, X는 음이온성기이다. In one embodiment of the present specification, X is an anionic group.
본 명세서의 일 실시상태에 있어서, X는 텅스텐, 몰리브덴, 규소 및 인으로 이루어지는 군에서 선택되는 적어도 1개의 원소와 산소를 함유하는 화합물의 음이온; 트리플루오르메탄설폰산 음이온; 비스(트리플루오로메틸술포닐)아미드 음이온; 비스트리플루오르메탄설폰이미드 음이온; 비스퍼플루오르에틸설폰이미드 음이온; 테트라페닐보레이트 음이온; 테트라키스(4-플루오로페닐)보레이트; 테트라키스(펜타플루오로페닐)보레이트; 트리스트리플루오로메탄설포닐메티드; 및 할로겐기로 이루어진 군에서 선택되는 것인 화합물이다. In one embodiment of the present specification, X is an anion of a compound containing oxygen and at least one element selected from the group consisting of tungsten, molybdenum, silicon and phosphorus; Trifluoromethanesulfonic acid anion; Bis (trifluoromethylsulfonyl) amide anion; Bistrifluoromethanesulfonimide anion; Bisperfluoroethylsulfonimide anion; Tetraphenylborate anion; Tetrakis (4-fluorophenyl) borate; Tetrakis (pentafluorophenyl) borate; Tristrifluoromethanesulfonylmethide; And it is a compound selected from the group consisting of halogen groups.
본 명세서의 일 실시상태에 있어서, X는 SO3
-일 수 있다.In one embodiment of the present specification, X may be SO 3 − .
또한, 본 명세서의 일 실시상태에 있어서, r5 및 r6는 0 내지 4의 정수이고, r5가 2 이상인 경우 R5는 서로 같거나 상이하고, r6이 2 이상인 경우, R6은 서로 같거나 상이하다.In addition, in an exemplary embodiment of the present specification, r5 and r6 are integers of 0 to 4, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
본 명세서의 일 실시상태에 있어서, r5 및 r6는 0 내지 3의 정수이고, r5가 2 이상인 경우 R5는 서로 같거나 상이하고, r6이 2 이상인 경우, R6은 서로 같거나 상이하다.In one embodiment of the present specification, r5 and r6 are integers of 0 to 3, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
본 명세서의 일 실시상태에 있어서, r5 및 r6는 0 내지 2의 정수이고, r5가 2인 경우 R5는 서로 같거나 상이하고, r6이 2인 경우, R6은 서로 같거나 상이하다.In one embodiment of the present specification, r5 and r6 are integers of 0 to 2, when r5 is 2, R5 is the same as or different from each other, and when r6 is 2, R6 is the same or different from each other.
본 명세서의 일 실시상태에 있어서, r5 및 r6는 0 또는 1이다. In one embodiment of the present specification, r5 and r6 are 0 or 1.
본 명세서의 일 실시상태에 있어서, r5 및 r6는 0이다. In one embodiment of the present specification, r5 and r6 are zero.
본 명세서의 일 실시상태에 있어서, r5 및 r6는 1이다. In one embodiment of the present specification, r5 and r6 are one.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1은 하기 구조들로 표시될 수 있으며, 하기 구조들은 상기 화학식 1의 이성질체를 나타내는 것이고, 상기 화학식 1이 대표 구조를 나타낸다. 이성질체란, 분자식은 같으나 서로 다른 물리/화학적 성질을 갖는 분자들을 의미한다.In one embodiment of the present specification, Chemical Formula 1 may be represented by the following structures, the following structures represent an isomer of Formula 1, wherein Formula 1 represents a representative structure. Isomers refer to molecules having the same molecular formula but different physical / chemical properties.
상기 구조들에 있어서, L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다.In the above structures, L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
상기 이성질체에 대한 설명은 본 명세서에 기재된 잔텐계 염료 구조 모두에 적용될 수 있다.The description of the isomers can be applied to all of the xanthene dye structures described herein.
본 명세서의 일 실시상태에 있어서, 상기 -SO3M은 -SO3
-와 M이 이온 결합 또는 염 결합된 것을 의미할 수 있다. In one embodiment of the present specification, -SO 3 M may mean that -SO 3 - and M is an ionic bond or a salt bond.
본 명세서의 일 실시상태에 있어서, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고, 상기 암모늄 구조를 포함하는 화합물은 하기 화학식 A로 표시되거나 하기 화학식 B로 표시되는 단위를 포함할 수 있다. In one embodiment of the present specification, M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And a compound including an ammonium structure, and the compound including the ammonium structure may include a unit represented by the following Formula A or represented by the following Formula B.
[화학식 A][Formula A]
[화학식 B][Formula B]
상기 화학식 A에 있어서, In Chemical Formula A,
Ra 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 아릴기; 치환 또는 비치환된 아릴알킬기; -L1-NHCO-R; 또는 -L2-OCO-R이거나, Ra 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, 상기 R은 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 아릴알킬기이며, 상기 L1 및 L2은 치환 또는 비치환된 알킬렌기이고, Ra to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Substituted or unsubstituted arylalkyl group; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, wherein L 1 and L 2 is a substituted or unsubstituted alkylene group,
상기 화학식 B에 있어서,In Chemical Formula B,
Rb 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 아릴알킬기이거나, Rb 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, Z는 치환 또는 비치환된 알킬렌기; 치환 또는 비치환된 아릴렌기; -L3-NHCO-; 또는 -L4-OCO-이며, 상기 L3 및 L4은 치환 또는 비치환된 알킬렌기이고, Re 내지 Rg는 서로 같거나 상이하고, 각각 독립적으로 수소; 또는 치환 또는 비치환된 알킬기이다. Rb to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group; Substituted or unsubstituted arylene group; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group, and Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group.
본 명세서의 일 실시상태에 따르면, 상기 화학식 A에 있어서, Ra 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 탄소수 1 내지 30의 치환 또는 비치환된 알케닐기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴알킬기; -L1-NHCO-R; 또는 -L2-OCO-R이거나, Ra 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, 상기 R은 수소; 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴기; 또는 탄소수 6 내지 30의 치환 또는 비치환된 아릴알킬기이며, 상기 L1 및 L2은 탄소수 1 내지 30의 치환 또는 비치환된 알킬렌기이고, According to an exemplary embodiment of the present specification, in the general formula A, Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms, wherein L 1 and L 2 is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms,
상기 화학식 B에 있어서, Rb 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 탄소수 1 내지 30의 치환 또는 비치환된 알킬기; 탄소수 1 내지 30의 치환 또는 비치환된 알케닐기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴기; 또는 탄소수 6 내지 30의 치환 또는 비치환된 아릴알킬기이거나, Rb 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, Z는 탄소수 1 내지 30의 치환 또는 비치환된 알킬렌기; 탄소수 6 내지 30의 치환 또는 비치환된 아릴렌기; -L3-NHCO-; 또는 -L4-OCO-이며, 상기 L3 및 L4은 탄소수 1 내지 30의 치환 또는 비치환된 알킬렌기이고, Re 내지 Rg는 서로 같거나 상이하고, 각각 독립적으로 수소; 또는 탄소수 1 내지 30의 치환 또는 비치환된 알킬기이다. In Formula B, Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms; A substituted or unsubstituted arylene group having 6 to 30 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms, and Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
본 명세서의 일 실시상태에 따르면, 상기 화학식 A에 있어서, Ra 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 탄소수 1 내지 20의 치환 또는 비치환된 알킬기; 탄소수 1 내지 20의 치환 또는 비치환된 알케닐기; 탄소수 6 내지 20의 치환 또는 비치환된 아릴기; 탄소수 6 내지 20의 치환 또는 비치환된 아릴알킬기; -L1-NHCO-R; 또는 -L2-OCO-R이거나, Ra 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, 상기 R은 수소; 탄소수 1 내지 20의 치환 또는 비치환된 알킬기; 탄소수 6 내지 20의 치환 또는 비치환된 아릴기; 또는 탄소수 6 내지 20의 치환 또는 비치환된 아릴알킬기이며, 상기 L1 및 L2은 탄소수 1 내지 20의 치환 또는 비치환된 알킬렌기이고, According to an exemplary embodiment of the present specification, in the general formula A, Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms, wherein L 1 and L 2 is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms,
상기 화학식 B에 있어서, Rb 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 탄소수 1 내지 20의 치환 또는 비치환된 알킬기; 탄소수 1 내지 20의 치환 또는 비치환된 알케닐기; 탄소수 6 내지 20의 치환 또는 비치환된 아릴기; 또는 탄소수 6 내지 20의 치환 또는 비치환된 아릴알킬기이거나, Rb 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, Z는 탄소수 1 내지 20의 치환 또는 비치환된 알킬렌기; 탄소수 6 내지 20의 치환 또는 비치환된 아릴렌기; -L3-NHCO-; 또는 -L4-OCO-이며, 상기 L3 및 L4은 탄소수 1 내지 20의 치환 또는 비치환된 알킬렌기이고, Re 내지 Rg는 서로 같거나 상이하고, 각각 독립적으로 수소; 또는 탄소수 1 내지 20의 치환 또는 비치환된 알킬기이다. In Formula B, Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms; Substituted or unsubstituted arylene group having 6 to 20 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, and Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
본 명세서의 일 실시상태에 있어서, 상기 단위란 단량체가 중합체에 포함되는 반복 구조를 의미하며, 상기 단위는 중합체 내 주쇄에 포함되어 중합체를 구성할 수 있다.In one embodiment of the present specification, the unit means a repeating structure in which the monomer is included in the polymer, and the unit may be included in the main chain in the polymer to constitute the polymer.
본 명세서의 일 실시상태에 있어서, 상기 화학식 B로 표시되는 단위를 포함하는 화합물은 고분자일 수 있다. In one embodiment of the present specification, the compound including a unit represented by Formula B may be a polymer.
상기 화학식 B로 표시되는 단위를 포함하는 화합물이 고분자인 경우, 상기 화학식 B로 표시되는 단위를 1 내지 500개의 범위 내에서 포함할 수 있다.When the compound including the unit represented by the formula (B) is a polymer, the compound represented by the formula (B) may include within the range of 1 to 500.
본 명세서의 일 실시상태에 있어서, 상기 화학식 B로 표시되는 단위를 포함하는 화합물의 중량평균 분자량은 1000 내지 10000일 수 있고, 바람직하게는 3,000 내지 8,000이며, 더 바람직하게는 5,000 내지 7,000이다.In one embodiment of the present specification, the weight average molecular weight of the compound including the unit represented by Formula (B) may be 1000 to 10,000, preferably 3,000 to 8,000, more preferably 5,000 to 7,000.
본 명세서의 일 실시상태에 따르면, 상기 화학식 B로 표시되는 단위를 포함하는 화합물의 말단은 수소; 할로겐기; 또는 치환 또는 비치환된 알킬기일 수 있다. According to an exemplary embodiment of the present specification, the terminal of the compound containing a unit represented by the formula (B) is hydrogen; Halogen group; Or a substituted or unsubstituted alkyl group.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1은 하기 화학식 2로 표시될 수 있다.In one embodiment of the present specification, Chemical Formula 1 may be represented by the following Chemical Formula 2.
[화학식 2] [Formula 2]
상기 화학식 2에 있어서,In Chemical Formula 2,
L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1은 하기 화학식 3으로 표시될 수 있다.In one embodiment of the present specification, Chemical Formula 1 may be represented by the following Chemical Formula 3.
[화학식 3][Formula 3]
상기 화학식 3에 있어서,In Chemical Formula 3,
L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1은 하기 화학식 4로 표시될 수 있다.In one embodiment of the present specification, Chemical Formula 1 may be represented by the following Chemical Formula 4.
[화학식 4][Formula 4]
상기 화학식 4에 있어서, In Chemical Formula 4,
L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1의 질소원자를 포함하는 이무수물기는 하기 치환기 중 어느 하나로 표시되는 것인 화합물일 수 있다. In one embodiment of the present specification, the dianhydride group including the nitrogen atom of Formula 1 may be a compound represented by any one of the following substituents.
상기 치환기에 있어서, 는 상기 화학식 1에 연결되는 부위를 나타내고, In the substituent, Represents a site linked to the formula (1),
X1, X2, Y1 내지 Y3는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; 니트로기; -OH; -SO3H;; -COOH; 포스핀기; 음이온성기; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이거나, 인접하는 기는 결합하여 치환 또는 비치환된 고리를 형성할 수 있다X1, X2, Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups may be bonded to form a substituted or unsubstituted ring.
본 명세서의 일 실시상태에 있어서, 상기 화학식 1로 표시되는 화합물은 하기 화학식 중 어느 하나로 표시될 수 있다.In one embodiment of the present specification, the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas.
상기 화학식에 있어서, M 및 Y는 상기 화학식 1에서 정의한 바와 같다. In the above formula, M and Y are as defined in the formula (1).
본 명세서의 일 실시상태에 있어서, 상기 화학식의 고리 중 치환 위치가 지정되지 않은 치환기는 고리에 포함되는 탄소 어느 부분에라도 치환될 수 있다는 것을 의미한다. In one embodiment of the present specification, the substituent in the ring of the formula is not specified means that the substituent may be substituted for any portion of the carbon included in the ring.
예컨대, 에 있어서, 는 -CF3로 치환된 벤젠 고리에 있어서, -SCH3로 치환된 탄소를 제외한 나머지 탄소 중 어느 하나에 치환될 수 있다는 것을 의미하며, 구체적으로 하기 4개의 구조로 표시될 수 있다.for example, To Means that in the benzene ring substituted with -CF 3 , it may be substituted with any one of carbons other than the carbon substituted with -SCH 3 , and may be represented by the following four structures.
또 다른 예시로서, 에 있어서, 는 -SO2NHY로 치환된 나프탈렌 고리에 있어서, 나프탈렌에 포함되는 탄소 중 어느 하나에 치환될 수 있다는 것을 의미하며, 구체적으로 하기 6개의 구조로 표시될 수 있다.As another example, To In the naphthalene ring substituted with -SO 2 NHY, it means that can be substituted with any one of the carbon included in the naphthalene, it can be represented by the following six structures.
상기 6개의 구조에 있어서, Y는 앞에서 정의한 바와 같다.In the above six structures, Y is as defined above.
또한, 본 명세서의 일 실시상태에 따르면, 상기 화합물을 포함하는 색재 조성물을 제공할 수 있다. In addition, according to an exemplary embodiment of the present specification, it is possible to provide a color material composition comprising the compound.
상기 색재 조성물은 상기 화학식 1의 화합물 이외에 염료 및 안료 중 적어도 1종을 더 포함할 수 있다. 예컨대, 상기 색재 조성물은 상기 화학식 1의 화합물만을 포함할 수도 있으나, 상기 화학식 1의 화합물과 1종 이상의 염료를 포함하거나, 상기 화학식 1의 화합물과 1종 이상의 안료를 포함하거나, 상기 화학식 1의 화합물, 1종 이상의 염료 및 1종 이상의 안료를 포함할 수도 있다. The color material composition may further include at least one of dyes and pigments in addition to the compound of Formula 1. For example, the colorant composition may include only the compound of Formula 1, but may include the compound of Formula 1 and one or more dyes, or may include the compound of Formula 1 and one or more pigments, or the compound of Formula 1 And at least one dye and at least one pigment.
본 명세서의 일 실시상태에 따르면, 상기 색재 조성물을 포함하는 감광성 수지 조성물을 제공할 수 있다.According to an exemplary embodiment of the present specification, it is possible to provide a photosensitive resin composition comprising the color material composition.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물은 상기 화학식 1로 표시되는 화합물; 바인더 수지; 다관능성 모노머; 광개시제; 및 용매를 더 포함할 수 있다.According to an exemplary embodiment of the present specification, the photosensitive resin composition is a compound represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And a solvent may be further included.
상기 바인더 수지는 감광성 수지 조성물로 제조된 막의 강도, 현상성 등의 물성을 나타낼 수 있다면, 특별히 한정하지 않는다. The binder resin is not particularly limited as long as it can exhibit physical properties such as strength, developability, and the like of the film made of the photosensitive resin composition.
상기 바인더 수지는 기계적 강도를 부여하는 다관능성 모노머와 알칼리 용해성을 부여하는 모노머의 공중합 수지를 이용할 수 있으며, 당 기술분야에서 일반적으로 사용하는 바인더를 더 포함할 수 있다. The binder resin may use a copolymer resin of a polyfunctional monomer imparting mechanical strength and a monomer imparting alkali solubility, and may further include a binder generally used in the art.
상기 막의 기계적 강도를 부여하는 다관능성 모노머는 불포화 카르복시산 에스테류; 방향족 비닐류; 불포화 에테르류; 불포화 이미드류; 및 산 무수물 중 어느 하나 이상일 수 있다. Polyfunctional monomers to impart the mechanical strength of the membrane include unsaturated carboxylic acid esters; Aromatic vinyls; Unsaturated ethers; Unsaturated imides; And acid anhydrides.
상기 불포화 카르복시산 에스테르류의 구체적인 예로는, 벤질(메타)아크릴레이트, 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 디메틸아미노에틸(메타)아크릴레이트, 이소부틸(메타)아크릴레이트, t-부틸(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트, 이소보닐(메타)아크릴레이트, 에틸헥실(메타)아크릴레이트, 2-페녹시에틸(메타)아크릴레이트, 테트라히드로퍼프릴(메타)아크릴레이트, 히드록시에틸(메타)아크릴레이트, 2-히드록시프로필(메타)아크릴레이트, 2-히드록시-3-클로로프로필(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 아실옥틸옥시-2-히드록시프로필(메타)아크릴레이트, 글리세롤(메타)아크릴레이트, 2-메톡시에틸(메타)아크릴레이트, 3-메톡시부틸(메타)아크릴레이트, 에톡시디에틸렌글리콜 (메타)아크릴레이트, 메톡시트리에틸렌글리콜(메타)아크릴레이트, 메톡시트리프로필렌글리콜(메타)아크릴레이트, 폴리(에틸렌 글리콜) 메틸에테르(메타)아크릴레이트, 페녹시디에틸렌글리콜(메타)아크릴레이트, p-노닐페녹시폴리에틸렌글리콜(메타)아크릴레이트, p-노닐페녹시폴리프로필렌글리콜(메타)아크릴레이트, 글리시딜(메타)아크릴레이트, 테트라플루오로프로필(메타)아크릴레이트, 1,1,1,3,3,3-헥사플루오로이소프로필 (메타)아크릴레이트, 옥타플루오로펜틸(메타)아크릴레이트, 헵타데카플루오로데실(메타)아크릴레이트, 트리브로모페닐(메타)아크릴레이트, 메틸 α-히드록시메틸 아크릴레이트, 에틸 α-히드록시메틸 아크릴레이트, 프로필 α-히드록시메틸 아크릴레이트 및 부틸 α-히드록시메틸 아크릴레이트로 이루어진 그룹으로부터 선택될 수 있으나, 이들에만 한정되는 것은 아니다.Specific examples of the unsaturated carboxylic acid esters include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, and isobutyl ( Meta) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetra Hydroperpril (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl ( Meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxy CD-ethyleneglycol (Meth) acrylate, methoxy triethylene glycol (meth) acrylate, methoxy tripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (meth) acrylate, phenoxydiethylene glycol (meth) acrylate , p-nonylphenoxypolyethylene glycol (meth) acrylate, p-nonylphenoxypolypropylene glycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, 1,1 , 1,3,3,3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate , Methyl α-hydroxymethyl acrylate, ethyl α-hydroxymethyl acrylate, propyl α-hydroxymethyl acrylate and butyl α-hydroxymethyl acrylate It is, but is not limited thereto.
상기 방향족 비닐류의 구체적인 예로는, 스티렌, α-메틸스티렌, (o,m,p)-비닐 톨루엔, (o,m,p)-메톡시 스티렌, 및 (o,m,p)-클로로 스티렌으로 이루어진 그룹으로부터 선택될 수 있으나, 이들에만 한정되는 것은 아니다.Specific examples of the aromatic vinyls include styrene, α-methylstyrene, (o, m, p) -vinyl toluene, (o, m, p) -methoxy styrene, and (o, m, p) -chloro styrene. It may be selected from the group consisting of, but is not limited to these.
상기 불포화 에테르류의 구체적인 예로는, 비닐 메틸 에테르, 비닐 에틸 에테르, 및 알릴 글리시딜 에테르로 이루어진 그룹으로부터 선택될 수 있으나, 이들에만 한정되는 것은 아니다.Specific examples of the unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.
상기 불포화 이미드류의 구체적인 예로는, N-페닐 말레이미드, N-(4-클로로페닐) 말레이미드, N-(4-히드록시페닐) 말레이미드, 및 N-시클로헥실 말레이미드로 이루어진 그룹으로부터 선택될 수 있으나, 이들에만 한정되는 것은 아니다.Specific examples of the unsaturated imides are selected from the group consisting of N-phenyl maleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexyl maleimide It may be, but is not limited to these.
상기 산 무수물로는 무수 말레인산, 무수 메틸 말레인산, 테트라하이드로 프탈산 무수물 등이 있으나, 이들에만 한정되는 것은 아니다.Examples of the acid anhydride include maleic anhydride, methyl maleic anhydride, tetrahydro phthalic anhydride, and the like, but are not limited thereto.
상기 알칼리 용해성을 부여하는 모노머는 산기를 포함한다면 특별히 한정되지 않으며, 예를 들면, (메타)아크릴산, 크로톤산, 이타콘산, 말레인산, 푸마르산, 모노메틸 말레인산, 5-노보넨-2-카복실산, 모노-2-((메타)아크릴로일옥시)에틸 프탈레이트, 모노-2-((메타)아크릴로일옥시)에틸 숙시네이트, ω-카르복시 폴리카프로락톤 모노(메타)아크릴레이트로 이루어지는 군으로부터 선택되는 1 종 이상을 사용하는 것이 바람직하나, 이들에만 한정되는 것은 아니다.The monomer which imparts the alkali solubility is not particularly limited as long as it contains an acid group. For example, (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, 5-norbornene-2-carboxylic acid, mono 2-((meth) acryloyloxy) ethyl phthalate, mono-2-((meth) acryloyloxy) ethyl succinate, ω-carboxy polycaprolactone mono (meth) acrylate selected from the group consisting of Although it is preferable to use 1 or more types, it is not limited to these.
본 명세서의 일 실시상태에 따르면, 상기 바인더 수지의 산가는 50 내지 130 KOH mg/g이고, 중량 평균 분자량은 1,000 내지 50,000이다. According to an exemplary embodiment of the present specification, the acid value of the binder resin is 50 to 130 KOH mg / g, the weight average molecular weight is 1,000 to 50,000.
상기 다관능성 모노머는 광에 의해 포토레지스트상을 형성하는 역할을 하는 모노머로서, 구체적으로는 프로필렌글리콜 메타크릴레이트, 디펜타에리쓰리톨 헥사아크릴레이트, 디펜타에리쓰리톨 아크릴레이트, 네오펜틸글리콜 디아크릴레이트, 6-헥산디올 디아크릴레이트, 1,6-헥산디올 아크릴레이트 테트라에틸렌글리콜 메타크릴레이트, 비스페녹시 에틸알콜 디아크릴레이트, 트리스히드록시에틸이소시아누레이트 트리메타크릴레이트, 트리메틸프로판 트리메타크릴레이트, 디페닐펜타에리스톨리톨 헥사아크릴레이트, 펜타에리 쓰리톨 트리메타 크릴레이트, 펜타에리쓰리톨 테트라메타크릴레이트 및 디펜타에리쓰리톨 헥사메타 크릴레이트로 이루어진 그룹 중에서 선택되는 1종 또는 2종 이상의 혼합물일 수 있다.The polyfunctional monomer is a monomer that forms a photoresist image by light, specifically, propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl glycol di Acrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethyleneglycol methacrylate, bisphenoxy ethylalcohol diacrylate, trishydroxyethylisocyanurate trimethacrylate, trimethyl 1 selected from the group consisting of propane trimethacrylate, diphenylpentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate and dipentaerythritol hexamethacrylate Species or a mixture of two or more thereof.
상기 광개시제는 빛에 의해 라디칼을 발생시켜 가교를 촉발하는 개시제이면, 특별히 한정되지 않으나, 예를 들면, 아세토페논계 화합물, 비이미다졸계 화합물, 트리아진계 화합물, 및 옥심계 화합물로 이루어진 군으로부터 선택되는 1종 이상일 수 있다. The photoinitiator is not particularly limited as long as it is an initiator that generates radicals by light to trigger crosslinking. It may be one or more kinds.
상기 아세토페논계 화합물은 2-히드록시-2-메틸-1-페닐프로판-1-온, 1-(4-이소프로필페닐)-2-히드록시-2-메틸프로판-1-온, 4-(2-히드록시에톡시)-페닐-(2-히드록시-2-프로필)케톤, 1-히드록시시클로헥실페닐케톤, 벤조인메틸 에테르, 벤조인에틸 에테르, 벤조인이소부틸 에테르, 벤조인부틸 에테르, 2,2-디메톡시-2-페닐아세토페논, 2-메틸-(4-메틸티오)페닐-2-몰폴리노-1-프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-몰폴리노페닐)-부탄-1-온, 2-(4-브로모-벤질-2-디메틸아미노-1-(4-몰폴리노페닐)-부탄-1-온 또는 2-메틸-1-[4-(메틸티오)페닐]-2-몰폴리노프로판-1-온 등이 있으며, 이에 한정되지 않는다. The acetophenone-based compound is 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenylketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin Butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholino-1-propan-1-one, 2-benzyl-2-dimethylamino -1- (4-morpholinophenyl) -butan-1-one, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one or 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, and the like.
상기 비이미다졸계 화합물로는 2,2-비스(2-클로로페닐)-4,4',5,5'-테트라페닐 비이미다졸, 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라키스(3,4,5-트리메톡시페닐)-1,2'-비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐 비이미다졸, 2,2'-비스(o-클로로페닐)-4,4,5,5'-테트라페닐-1,2'-비이미다졸 등이 있으며, 이에 한정되지 않는다. As the biimidazole-based compound, 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4 , 4 ', 5,5'-tetrakis (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl) -4, 4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, It is not limited to this.
상기 트리아진계 화합물은 3-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}프로피오닉산, 1,1,1,3,3,3-헥사플로로이소프로필-3-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}프로피오네이트, 에틸-2-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}아세테이트, 2-에폭시에틸-2-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}아세테이트, 시클로헥실-2-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}아세테이트, 벤질-2-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}아세테이트, 3-{클로로-4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}프로피오닉산, 3-{4-[2,4-비스(트리클로로메틸)-s-트리아진-6-일]페닐티오}프로피온아미드, 2,4-비스(트리클로로메틸)-6-p-메톡시스티릴-s-트리아진, 2,4-비스(트리클로로메틸)-6-(1-p-디메틸아미노페닐)-1,3,-부타디에닐-s-트리아진, 2-트리클로로메틸-4-아미노-6-p-메톡시스티릴-s-트리아진 등이 있으며, 이에 한정되지 않는다. The triazine compound is 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionic acid, 1,1,1,3,3,3- Hexafluoroisopropyl-3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionate, ethyl-2- {4- [2,4 -Bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 2-epoxyethyl-2- {4- [2,4-bis (trichloromethyl) -s-triazine-6 -Yl] phenylthio} acetate, cyclohexyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, benzyl-2- {4- [ 2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 3- {chloro-4- [2,4-bis (trichloromethyl) -s-triazine-6 -Yl] phenylthio} propionic acid, 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionamide, 2,4-bis (trichloro Methyl) -6-p-methoxystyryl-s-triazine, 2,4-bis (trichloromethyl) -6- (1-p-di Methylaminophenyl) -1,3, -butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, and the like, but is not limited thereto. .
상기 옥심계 화합물은 1,2-옥타디온,-1-(4-페닐치오)페닐,-2-(o-벤조일옥심)(시바가이기사, 시지아이124), 에타논,-1-(9-에틸)-6-(2-메틸벤조일-3-일)-,1-(O-아세틸옥심)(씨지아이242), N-1919(아데카사) 등이 있으며, 이에 한정되지 않는다. The oxime-based compound is 1,2-octadione, -1- (4-phenylthio) phenyl, -2- (o-benzoyloxime) (Shibagai Co., Shijiai 124), ethanone, -1- (9 -Ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime) (CGII242), N-1919 (Adeca Co.), and the like.
상기 용매는 아세톤, 메틸 에틸 케톤, 메틸 이소부틸 케톤, 메틸셀로솔브, 에틸셀로솔브, 테트라히드로퓨란, 1,4-디옥산, 에틸렌글리콜 디메틸 에테르, 에틸렌글리콜 디에틸 에테르, 프로필렌글리콜 디메틸 에테르, 프로필렌글리콜 디에틸 에테르, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜 메틸 에틸 에테르, 클로로포름, 염화메틸렌, 1,2-디클로로에탄, 1,1,1-트리클로로에탄, 1,1,2-트리클로로에탄, 1,1,2-트리클로로에텐, 헥산, 헵탄, 옥탄, 시클로헥산, 벤젠, 톨루엔, 크실렌, 메탄올, 에탄올, 이소프로판올, 프로판올, 부탄올, t-부탄올, 2-에톡시 프로판올, 2-메톡시 프로판올, 3-메톡시 부탄올, 시클로헥사논, 시클로펜타논, 프로필렌글리콜 메틸 에테르 아세테이트, 프로펠렌글리콜 에틸 에테르 아세테이트, 3-메톡시부틸 아세테이트, 에틸 3-에톡시프로피오네이트, 에틸 셀로솔브아세테이트, 메틸 셀로솔브아세테이트, 부틸 아세테이트, 프로필렌글리콜 모노메틸에테르 및 디프로필렌글리콜 모노메틸에테르로 이루어지는 군으로부터 선택되는 1종 이상일 수 있으나, 이에만 한정되는 것은 아니다.The solvent is acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether , Propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, chloroform, methylene chloride, 1,2-dichloroethane, 1,1,1-trichloroethane, 1 , 1,2-trichloroethane, 1,1,2-trichloroethene, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, t-butanol, 2 Ethoxy propanol, 2-methoxy propanol, 3-methoxy butanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, 3-methoxybutyl ah Cetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether and dipropylene glycol monomethyl ether, but may be It is not limited only.
본 명세서의 일 실시상태에 있어서, 상기 감광성 수지 조성물 총 중량을 기준으로, 상기 화학식 1로 표시되는 화합물의 함량은 5 중량% 내지 60 중량%이고, 상기 바인더 수지의 함량은 1 중량% 내지 60 중량%이고, 상기 광개시제의 함량은 0.1 중량% 내지 20 중량%이며, 상기 다관능성 모노머의 함량은 0.1 중량% 내지 50 중량%이고, 상기 용매의 함량은 10 중량% 내지 80 중량%이다. In one embodiment of the present specification, based on the total weight of the photosensitive resin composition, the content of the compound represented by Formula 1 is 5% by weight to 60% by weight, the content of the binder resin is 1% by weight to 60% by weight %, The content of the photoinitiator is 0.1% to 20% by weight, the content of the multifunctional monomer is 0.1% to 50% by weight, the content of the solvent is 10% to 80% by weight.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로, 상기 화학식 1로 표시되는 화합물의 함량은 5 중량% 내지 60 중량%이고, 상기 바인더 수지의 함량은 1 중량% 내지 60 중량%이고, 상기 광개시제의 함량은 0.1 중량% 내지 20 중량%이며, 상기 다관능성 모노머의 함량은 0.1 중량% 내지 50 중량%이다.According to an exemplary embodiment of the present specification, based on the total weight of solids in the photosensitive resin composition, the content of the compound represented by Formula 1 is 5% by weight to 60% by weight, the content of the binder resin is 1% by weight To 60% by weight, the content of the photoinitiator is 0.1% to 20% by weight, and the content of the multifunctional monomer is 0.1% to 50% by weight.
구체적으로 상기 감광성 수지 조성물은 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로, 상기 화학식 1로 표시되는 화합물의 함량은 5 중량% 내지 50 중량%이고, 상기 바인더 수지의 함량은 1 중량% 내지 50 중량%이고, 상기 광개시제의 함량은 0.1 중량% 내지 10 중량%이며, 상기 다관능성 모노머의 함량은 0.1 중량% 내지 45 중량%이다.Specifically, the photosensitive resin composition is based on the total weight of solids in the photosensitive resin composition, the content of the compound represented by Formula 1 is 5% by weight to 50% by weight, the content of the binder resin is 1% by weight to 50 Wt%, the content of the photoinitiator is 0.1% to 10% by weight, and the content of the multifunctional monomer is 0.1% to 45% by weight.
상기 고형분의 총 중량이란, 수지 조성물에서 용매를 제외한 성분 총 중량의 합을 의미한다. 고형분 및 각 성분의 고형분을 기준으로 한 중량%의 기준은 액체크로마토그래피 또는 가스크로마토그래피 등의 당업계에서 쓰이는 일반적인 분석 수단으로 측정할 수 있다. The total weight of the solid content means the sum of the total weight of the components excluding the solvent in the resin composition. The weight percentages based on solids and solids of each component can be measured by common analytical means used in the art, such as liquid chromatography or gas chromatography.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물은 첨가제를 더 포함할 수 있다.According to an exemplary embodiment of the present specification, the photosensitive resin composition may further include an additive.
본 명세서의 일 실시상태에 있어서, 상기 감광성 수지 조성물 총 중량을 기준으로, 첨가제를 0.1 중량% 내지 20 중량%를 더 포함할 수 있다.In one embodiment of the present specification, based on the total weight of the photosensitive resin composition, the additive may further comprise 0.1% by weight to 20% by weight.
본 명세서의 또 다른 일 실시상태에 따르면, 상기 첨가제의 함량은 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로 0.1 중량% 내지 20 중량%이다.According to another exemplary embodiment of the present specification, the content of the additive is 0.1 wt% to 20 wt% based on the total weight of solids in the photosensitive resin composition.
구체적으로 상기 첨가제의 함량은 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로 0.1 중량% 내지 10 중량%이다.Specifically, the content of the additive is 0.1 wt% to 10 wt% based on the total weight of solids in the photosensitive resin composition.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물은 광가교증감제, 경화촉진제, 산화방지제, 밀착촉진제, 계면활성제, 열중합방지제, 자외선흡수제, 분산제 및 레벨링제로 이루어진 군으로부터 선택되는 1 또는 2 이상의 첨가제를 추가로 포함한다.According to one embodiment of the present specification, the photosensitive resin composition is 1 or 2 selected from the group consisting of photocrosslinking sensitizers, curing accelerators, antioxidants, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents. The above additive is further included.
본 명세서의 일 실시상태에 따르면, 상기 첨가제의 함량은 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로 0.1 중량% 내지 20 중량%이다.According to an exemplary embodiment of the present specification, the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물은 광가교증감제, 경화촉진제, 밀착촉진제, 계면활성제, 열중합방지제, 자외선흡수제, 분산제 및 레벨링제로 이루어진 군으로부터 선택되는 1 또는 2 이상의 첨가제를 추가로 포함한다.According to one embodiment of the present specification, the photosensitive resin composition may include one or two or more additives selected from the group consisting of photocrosslinking sensitizers, curing accelerators, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents. Additionally included.
본 명세서의 일 실시상태에 따르면, 상기 첨가제의 함량은 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로 0.1 중량% 내지 20 중량%이다.According to an exemplary embodiment of the present specification, the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
상기 광가교증감제는 벤조페논, 4,4-비스(디메틸아미노)벤조페논, 4,4-비스(디에틸아미노)벤조페논, 2,4,6-트리메틸아미노벤조페논, 메틸-o-벤조일벤조에이트, 3,3-디메틸-4-메톡시벤조페논, 3,3,4,4-테트라(t-부틸퍼옥시카보닐)벤조페논 등의 벤조페논계 화합물; 9-플로레논, 2-크로로-9-프로레논, 2-메틸-9-플로레논 등의 플로레논계 화합물; 티옥산톤, 2,4-디에틸 티옥산톤, 2-클로로 티옥산톤, 1-클로로-4-프로필옥시 티옥산톤, 이소프로필티옥산톤, 디이소프로필티옥산톤 등의 티옥산톤계 화합물; 크산톤, 2-메틸크산톤 등의 크산톤계 화합물; 안트라퀴논, 2-메틸 안트라퀴논, 2-에틸 안트라퀴논, t-부틸 안트라퀴논, 2,6-디클로로-9,10- 안트라퀴논 등의 안트라퀴논계 화합물; 9-페닐아크리딘, 1,7-비스(9-아크리디닐)헵탄, 1,5-비스(9-아크리디닐펜탄), 1,3-비스(9-아크리디닐)프로판 등의 아크리딘계 화합물; 벤질, 1,7,7-트리메틸-비시클로[2,2,1]헵탄-2,3-디온, 9,10-펜안트렌퀴논 등의 디카보닐 화합물; 2,4,6-트리메틸벤조일 디페닐포스핀 옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸 포스핀 옥사이드 등의 포스핀 옥사이드계 화합물; 메틸-4-(디메틸아미노)벤조에이트, 에틸-4-(디메틸아미노)벤조에이트, 2-n-부톡시에틸-4-(디메틸아미노)벤조에이트 등의 벤조에이트계 화합물; 2,5-비스(4-디에틸아미노벤잘)시클로펜타논, 2,6-비스(4-디에틸아미노벤잘)시클로헥사논, 2,6-비스(4-디에틸아미노벤잘)-4-메틸-시클로펜타논 등의 아미노 시너지스트; 3,3-카본닐비닐-7-(디에틸아미노)쿠마린, 3-(2-벤조티아졸일)-7-(디에틸아미노)쿠마린, 3-벤조일-7-(디에틸아미노)쿠마린, 3-벤조일-7-메톡시-쿠마린, 10,10-카르보닐비스[1,1,7,7-테트라메틸-2,3,6,7-테트라히드로-1H,5H,11H-C1]-벤조피라노[6,7,8-ij]-퀴놀리진-11-온 등의 쿠마린계 화합물; 4-디에틸아미노 칼콘, 4-아지드벤잘아세토페논 등의 칼콘 화합물; 2-벤조일메틸렌, 3-메틸-b-나프토티아졸린;으로 이루어진 군으로부터 선택되는 1종 이상을 사용할 수 있다.The photocrosslinking sensitizer is benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl Benzophenone compounds such as benzoate, 3,3-dimethyl-4-methoxybenzophenone, 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Thioxanthones such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone and diisopropyl thioxanthone compound; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinylpentane), 1,3-bis (9-acridinyl) propane Acridine-based compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, 9,10-phenanthrenequinone; Phosphine oxide compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentyl phosphine oxide; Benzoate compounds such as methyl-4- (dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate and 2-n-butoxyethyl-4- (dimethylamino) benzoate; 2,5-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-diethylaminobenzal) cyclohexanone, 2,6-bis (4-diethylaminobenzal) -4- Amino synergists such as methyl-cyclopentanone; 3,3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7- (diethylamino) coumarin, 3 -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H-C1] -benzo Coumarin-based compounds such as pyrano [6,7,8-ij] -quinolizine-11-one; Chalcone compounds such as 4-diethylamino chalcone and 4-azidebenzalacetophenone; 2-benzoylmethylene, 3-methyl-b-naphthothiazoline; one or more selected from the group consisting of can be used.
상기 경화촉진제로는 경화 및 기계적 강도를 높이기 사용되며, 구체적으로 2-머캅토벤조이미다졸, 2-머캅토벤조티아졸, 2-머캅토벤조옥사졸, 2,5-디머캅토-1,3,4-티아디아졸, 2-머캅토-4,6-디메틸아미노피리딘, 펜타에리스리톨-테트라키스(3-머캅토프로피오네이트), 펜타에리스리톨-트리스(3-머캅토프로피오네이트), 펜타에리스리톨-테트라키스(2-머캅토아세테이트), 펜타에리스리톨-트리스(2-머캅토아세테이트), 트리메틸올프로판-트리스(2-머캅토아세테이트), 및 트리메틸올프로판-트리스(3-머캅토프로피오네이트)로 이루어진 군으로부터 선택되는 1종 이상을 사용할 수 있다.The curing accelerator is used to increase the curing and mechanical strength, specifically 2-mercaptobenzoimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3 , 4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), pentaerythritol-tris (3-mercaptopropionate), penta Erythritol-tetrakis (2-mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), and trimethylolpropane-tris (3-mercaptopropio Nate) can be used one or more selected from the group consisting of.
본 명세서에서 사용되는 밀착촉진제로는 메타아크릴로일옥시 프로필트리메톡시 실란, 메타아크릴로일옥시 프로필디메톡시 실란, 메타아크릴로일옥시 프로필트리에톡시 실란, 메타아크릴로일옥시 프로필디메톡시실란 등의 메타 아크릴로일 실란 커플링제 중 1종 이상을 선택하여 사용할 수 있고, 알킬 트리메톡시 실란으로서 옥틸트리메톡시 실란, 도데실트리메톡시 실란, 옥타데실트리메톡시 실란 등에서 1종 이상을 선택하여 사용할 수 있다.As the adhesion promoter used in the present specification, methacryloyloxy propyltrimethoxy silane, methacryloyloxy propyldimethoxy silane, methacryloyloxy propyltriethoxy silane, methacryloyloxy propyldimethoxysilane One or more types of methacryloyl silane coupling agents, such as these, can be selected and used, and at least 1 type can be selected from octyl trimethoxy silane, dodecyl trimethoxy silane, and octadecyl trimethoxy silane as an alkyl trimethoxy silane. You can choose to use it.
상기 계면활성제는 실리콘계 계면활성제 또는 불소계 계면활성제이며, 구체적으로 실리콘계 계면활성제는 BYK-Chemie 사의 BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390 등을 사용할 수 있으며, 불소계 계면활성제로는 DIC(DaiNippon Ink & Chemicals) 사의 F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF, TF-1131, TF1132, TF1027SF, TF-1441, TF-1442 등을 사용할 수 있으나, 이에만 한정되는 것은 아니다.The surfactant is a silicone-based surfactant or a fluorine-based surfactant, specifically, the silicone-based surfactant is BYK-Chemie's BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307 , BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK -354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, and the like. (DaiNippon Ink & Chemicals) F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446 , F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F -486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF , TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc. may be used, but is not limited thereto.
상기 산화방지제로는 힌더드 페놀계(Hindered phenol) 산화 방지제, 아민계 산화 방지제, 티오계 산화 방지제 및 포스핀계 산화 방지제로 이루어지는 군으로부터 선택되는 1종 이상일 수 있으나, 이에만 한정되는 것은 아니다. The antioxidant may be one or more selected from the group consisting of hindered phenol antioxidants, amine antioxidants, thio antioxidants, and phosphine antioxidants, but is not limited thereto.
상기 산화방지제의 구체적인 예로는, 인산, 트리메틸포스페이트 또는 트리에틸포스페이트와 같은 인산계 열안정제; 2,6-디-t-부틸-p-크레졸, 옥타데실-3-(4-하이드록시-3,5-디-t-부틸페닐)프로피오네이트, 테트라비스[메틸렌-3-(3,5-디-t-부틸-4-하이드록시페닐)프로피오네이트]메탄, 1,3,5-트리메틸-2,4,6-트리스(3,5-디-t-부틸-4-하이드록시벤질)벤젠, 3,5-디-t-부틸-4-하이드록시벤질포스파이트 디에틸에스테르, 2,2-티오비스(4-메틸-6-t-부틸페놀), 2,6-g,t-부틸페놀 4,4'-부틸리덴-비스(3-메틸-6-t-부틸페놀), 4,4'-티오비스(3-메틸-6-t-부틸페놀) 또는 비스[3,3-비스-(4'-히드록시-3'-터트-부틸페닐)부탄산]글리콜 에스테르 (Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid]glycol ester)와 같은 힌더드 페놀(Hindered phenol)계 1차 산화방지제; 페닐-α-나프틸아민, 페닐-β-나프틸아민, N,N'-디페닐-p-페닐렌디아민 또는 N,N'-디-β-나프틸-p-페닐렌디아민과 같은 아민계 2차 산화방지제; 디라우릴디설파이드, 디라우릴티오프로피오네이트, 디스테아릴티오프로피오네이트, 머캡토벤조티아졸 또는 테트라메틸티우람디설파이드 테트라비스[메틸렌-3-(라우릴티오)프로피오네이트]메탄 등의 Thio계 2차 산화방지제; 또는 트리페닐 포스파이트, 트리스(노닐페닐)포스파이트, 트리이소데실포스파이트, 비스(2,4-디부틸페닐) 펜타에리스톨 디포스파이트(Bis (2,4-ditbutylphenyl)Pentaerythritol Diphosphite 또는 (1,1'-비페닐)-4,4'-디일비스포스포노산 테트라키스 [2,4-비스(1,1-디메틸에틸)페닐]에스테르((1,1'-Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl] ester)와 같은 포스파이트계 2차 산화방지제를 들 수 있다.Specific examples of the antioxidant include phosphoric acid thermal stabilizers such as phosphoric acid, trimethyl phosphate or triethyl phosphate; 2,6-di-t-butyl-p-cresol, octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, tetrabis [methylene-3- (3, 5-di-t-butyl-4-hydroxyphenyl) propionate] methane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxy Benzyl) benzene, 3,5-di-t-butyl-4-hydroxybenzylphosphite diethyl ester, 2,2-thiobis (4-methyl-6-t-butylphenol), 2,6-g, t-butylphenol 4,4'-butylidene-bis (3-methyl-6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol) or bis [3 , 3-bis- (4'-hydroxy-3'-tert-butylphenyl) butanoic acid] glycol ester (Bis [3,3-bis- (4'-hydroxy-3'-tert-butylphenyl) butanoicacid] glycol hindered phenol-based primary antioxidants such as esters; Amines such as phenyl-α-naphthylamine, phenyl-β-naphthylamine, N, N'-diphenyl-p-phenylenediamine or N, N'-di-β-naphthyl-p-phenylenediamine System secondary antioxidants; Thio such as dilauryl disulfide, dilaurylthiopropionate, distearylthiopropionate, mercaptobenzothiazole or tetramethylthiuram disulfide tetrabis [methylene-3- (laurylthio) propionate] methane System secondary antioxidants; Or triphenyl phosphite, tris (nonylphenyl) phosphite, triisodecylphosphite, bis (2,4-dibutylphenyl) pentaerythritol diphosphite (Bis (2,4-ditbutylphenyl) Pentaerythritol Diphosphite or (1, 1'-biphenyl) -4,4'-diylbisphosphonoic acid tetrakis [2,4-bis (1,1-dimethylethyl) phenyl] ester ((1,1'-Biphenyl) -4,4 ' Phosphite-based secondary antioxidants such as -diylbisphosphonous acid tetrakis [2,4-bis (1,1-dimethylethyl) phenyl] ester).
상기 자외선흡수제로는 2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로-벤조트리아졸, 알콕시 벤조페논 등을 사용할 수 있으나, 이에 한정되지 않고, 당업계에서 일반적으로 쓰이는 것들이 모두 사용될 수 있다. As the ultraviolet absorbent, 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxy benzophenone, etc. may be used, but is not limited thereto. All commonly used ones can be used.
상기 열중합방지제로는 예컨대 p-아니솔, 히드로퀴논, 피로카테콜(pyrocatechol), t-부틸카테콜(t-butyl catechol), N-니트로소페닐히드록시아민 암모늄염, N-니트로소페닐히드록시아민 알루미늄염, p-메톡시페놀, 디-t-부틸-p-크레졸, 피로가롤, 벤조퀴논, 4,4-티오비스(3-메틸-6-t-부틸페놀), 2,2-메틸렌비스(4-메틸-6-t-부틸페놀), 2-머캅토이미다졸 및 페노티아진(phenothiazine)으로 이루어진 군으로부터 선택된 1 종 이상을 포함할 수 있으나, 이들로만 한정되는 것은 아니며 당 기술분야에 일반적으로 알려져 있는 것들을 포함할 수 있다.Examples of the thermal polymerization inhibitor include p-anisole, hydroquinone, pyrocatechol, t-butyl catechol, N-nitrosophenylhydroxyamine ammonium salt and N-nitrosophenylhydroxy Amine aluminum salt, p-methoxyphenol, di-t-butyl-p-cresol, pyroggarol, benzoquinone, 4,4-thiobis (3-methyl-6-t-butylphenol), 2,2- It may include one or more selected from the group consisting of methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole and phenothiazine, but is not limited thereto. It may include those generally known in the art.
상기 분산제는 미리 안료를 표면 처리하는 형태로 안료에 내부 첨가시키는 방법, 또는 안료에 외부 첨가시키는 방법으로 사용할 수 있다. 상기 분산제로는 화합물형, 비이온성, 음이온성 또는 양이온성 분산제를 사용할 수 있으며, 불소계, 에스테르계, 양이온계, 음이온계, 비이온계, 양쪽성 계면활성제 등을 들 수 있다. 이들은 각각 또는 2종 이상을 조합하여 사용될 수 있다. The dispersant may be used as a method of internally adding to the pigment in the form of surface treatment of the pigment in advance or externally adding to the pigment. As the dispersant, a compound type, nonionic, anionic or cationic dispersant may be used, and examples thereof include fluorine, ester, cationic, anionic, nonionic and amphoteric surfactants. These can be used individually or in combination of 2 or more types.
구체적으로 상기 분산제는 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌 다가 알코올, 에스테르알킬렌옥사이드 부가물, 알코올알킬렌옥사이드 부가물, 설폰산 에스테르, 설폰산염, 카르복실산에스테르, 카르복실산염, 알킬아미드알킬렌옥사이드 부가물 및 알킬아민으로 이루어진 그룹으로부터 선택된 1종 이상이 있으나, 이에 한정되는 것은 아니다.Specifically, the dispersant may be polyalkylene glycol and esters thereof, polyoxyalkylene polyhydric alcohols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonate salts, carboxylic acid esters, carboxylate salts, At least one selected from the group consisting of alkylamide alkylene oxide adducts and alkylamines is not limited thereto.
상기 레벨링제로는 폴리머성이거나 비폴리머성일 수 있다. 폴리머성의 레벨링제의 구체적인 예로는 폴리에틸렌이민, 폴리아미드아민, 아민과 에폭사이드의 반응 생성물을 예로 들 수 있고, 비폴리머성의 레벨링제의 구체적인 예로는 비-폴리머 황-함유 및 비-폴리머 질소-함유 화합물을 포함하지만, 이에 한정되지는 않으며, 당업계에서 일반적으로 쓰이는 것들이 모두 사용될 수 있다.The leveling agent may be polymeric or nonpolymeric. Specific examples of polymeric leveling agents include polyethyleneimine, polyamideamine, reaction products of amines and epoxides, and specific examples of nonpolymeric leveling agents include non-polymeric sulfur-containing and non-polymeric nitrogen-containing. Including but not limited to the compounds, all generally used in the art can be used.
본 명세서의 일 실시상태에 따르면, 상기 감광성 수지 조성물을 이용하여 제조된 감광재를 제공한다. According to one embodiment of the present specification, a photosensitive material manufactured using the photosensitive resin composition is provided.
더 자세히는, 본 명세서의 감광성 수지 조성물을 기재 위에 적절한 방법으로 도포하고 경화하여 박막 또는 패턴형태의 감광재를 형성한다.In more detail, the photosensitive resin composition of this specification is apply | coated and hardened | cured by a suitable method on a base material, and forms the photosensitive material of a thin film or a pattern form.
상기 도포 방법으로는 특별히 제한되지는 않지만 스프레이 법, 롤 코팅법, 스핀 코팅법 등을 사용할 수 있으며, 일반적으로 스핀 코팅법을 널리 사용한다. 또한, 도포막을 형성한 후 경우에 따라서 감압 하에 잔류 용매를 일부 제거할 수 있다.Although it does not restrict | limit especially as said coating method, A spray method, a roll coating method, a spin coating method, etc. can be used, Generally, a spin coating method is used widely. In addition, after forming a coating film, some residual solvent can be removed in some cases under reduced pressure.
본 명세서에 따른 감광성 수지 조성물을 경화시키기 위한 광원으로는, 예컨대 파장이 250 nm 내지 450 ㎚의 광을 발산하는 수은 증기 아크(arc), 탄소 아크, Xe 아크 등이 있으나 반드시 이에 국한되지는 않는다.Light sources for curing the photosensitive resin composition according to the present specification include, but are not limited to, mercury vapor arcs, carbon arcs, Xe arcs, etc., which emit light having a wavelength of 250 nm to 450 nm.
본 명세서에 따른 감광성 수지 조성물은 박막 트랜지트터 액정 표시장치(TFT LCD) 컬러필터 제조용 안료분산형 감광재, 박막 트랜지트터 액정 표시장치(TFT LCD) 또는 유기 발광 다이오드의 블랙 매트릭스 형성용 감광재, 오버코트층 형성용 감광재, 컬럼 스페이서 감광재, 광경화형 도료, 광경화성 잉크, 광경화성 접착제, 인쇄판, 인쇄배선반용 감광재, 플라즈마 디스플레이 패널(PDP)용 감광재 등에 사용할 수 있으며, 그 용도에 제한을 특별히 두지는 않는다.The photosensitive resin composition according to the present disclosure is a pigment-dispersed photosensitive material for manufacturing a thin film transistor liquid crystal display device (TFT LCD) color filter, a thin film transistor liquid crystal display device (TFT LCD) or a photosensitive material for forming a black matrix of an organic light emitting diode. Photoresist for forming overcoat layer, column spacer photoresist, photocurable paint, photocurable ink, photocurable adhesive, printing plate, photoresist for printed circuit board, photoresist for plasma display panel (PDP), etc. There is no restriction in particular.
본 명세서의 일 실시상태에 따르면, 상기 감광재를 포함하는 컬러필터를 제공한다.According to an exemplary embodiment of the present specification, a color filter including the photosensitive material is provided.
상기 컬러필터는 상기 화학식 1로 표시되는 화합물을 포함하는 감광성 수지 조성물을 이용하여, 제조될 수 있다. 상기 감광성 수지 조성물을 기판상에 도포하여 코팅막을 형성하고, 상기 코팅막을 노광, 현상 및 경화를 함으로써 컬러필터를 형성할 수 있다.The color filter may be prepared using the photosensitive resin composition including the compound represented by Chemical Formula 1. The color filter may be formed by applying the photosensitive resin composition on a substrate to form a coating film and exposing, developing and curing the coating film.
본 명세서의 일 실시상태에 따른 감광성 수지 조성물은 내열성이 우수하여, 열처리에 의한 색의 변화가 적어, 컬러 필터의 제조시 경화 과정에 의해서도 색재현율이 높고, 휘도 및 명암비가 높은 컬러필터를 제공할 수 있다. The photosensitive resin composition according to the exemplary embodiment of the present specification is excellent in heat resistance, so that there is little change in color by heat treatment, thereby providing a color filter having high color reproducibility and high luminance and contrast ratio even during the curing process during the manufacture of the color filter. Can be.
상기 기판은 유리판, 실리콘 웨이퍼 및 폴리에테르설폰(Polyethersulfone, PES), 폴리카보네이트(Polycarbonate, PC) 등의 플라스틱 기재의 판 등일 수 있으며, 그 종류가 특별히 제한되는 것은 아니다. The substrate may be a glass plate, a silicon wafer, a plate of a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
구체적으로, 본 명세서의 일 실시상태에 따른 감광성 수지 조성물을 유리 (5 X 5 cm2) 위에 스핀코팅(spincoating)하고, 100℃에서 100초간 전열처리(prebake)를 실시하여 필름을 형성할 수 있다. 필름이 형성된 기판과 포토마스크(photo mask)사이 간격을 250um로 하고, 노광기를 이용하여 기판 전면에 40mJ/cm2 노광량을 조사한다. 이후 노광된 기판을 현상액(수산화칼륨(KOH), 0.05%)에 60초간 현상하고, 230℃로 20분간 후열처리(postbake)하여 기판을 제작할 수 있다.Specifically, the photosensitive resin composition according to an exemplary embodiment of the present specification may be spincoated on glass (5 × 5 cm 2 ), and subjected to prebake at 100 ° C. for 100 seconds to form a film. . The distance between the substrate on which the film is formed and the photo mask is set to 250 um, and 40 mJ / cm 2 exposure dose is irradiated to the entire surface of the substrate using an exposure machine. Thereafter, the exposed substrate may be developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
상기 내열성 평가는 후술하는 방법에 의해 측정될 수 있다. 상기 일 실시상태에 따라 제작된 기판을 분광기를 이용하여 380nm 내지 780nm 범위의 가시광 영역의 투과율 스펙트럼을 얻는다. 또한, 전열처리(prebake) 기판을 추가적으로 230℃에 20분간 후열처리(postbake)를 시켜 동일한 장비와 측정범위에서 투과율 스펙트럼을 얻는다. The heat resistance evaluation can be measured by the method described below. Using a spectrometer, the substrate manufactured according to the exemplary embodiment of the present invention obtains a transmittance spectrum of a visible light region in the range of 380 nm to 780 nm. In addition, the prebake substrate is further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
상기 분광기는 MCPD-오츠카 社의 것일 수 있으나, 이에 한정되는 것은 아니다. The spectrometer may be that of MCPD-Otsuka, but is not limited thereto.
상기 얻어진 투과율 스펙트럼과 C광원 백라이트를 이용하고, 얻어진 값 E(L*, a*, b*)을 이용해 색변화(이하, ΔEab)를 계산한다. ΔEab값이 작다는 것은 색내열성이 우수함을 말한다. ΔEab < 3값을 가지면 컬러필터용 색소로 사용이 가능하며, 내열성이 우수한 색재라고 말할 수 있다. 구체적으로 ΔEab를 계산하는 식은 하기와 같다.Using the obtained transmittance spectrum and the C light source backlight, the color change (hereinafter, ΔEab) is calculated using the obtained values E (L *, a *, b *). A small ΔEab value indicates excellent color heat resistance. When ΔEab <3, it can be used as a color filter dye, and it can be said that it is a color material having excellent heat resistance. Specifically, the formula for calculating ΔEab is as follows.
[계산식 1][Calculation 1]
ΔEab(L*, a*, b*) = {(ΔL*)2+(Δa*)2+(Δb*)2}1/2
ΔEab (L *, a *, b *) = {(ΔL *) 2 + (Δa *) 2 + (Δb *) 2 } 1/2
상기 명암비는 후술하는 방법에 의해 측정될 수 있다. 상기 기판 제작 방법에 따라 제작된 기판을 명암비 측정기를 이용하여, 2매의 편광판 사이에 제작된 기판을 넣고 2매의 편광판이 수평일 때의 휘도와 2매의 편광판이 직교일 때의 휘도를 측정하여 하기 계산식 2로 명암비를 계산한다. The contrast ratio can be measured by the method described below. The substrate produced according to the substrate manufacturing method was measured using a contrast ratio measuring device, and the luminance produced when two polarizing plates were orthogonal and the luminance when two polarizing plates were orthogonal to each other. To calculate the contrast ratio by the following formula (2).
[계산식 2][Calculation 2]
명암비=2매의 편광판이 수평일 때의 휘도/ 2매의 편광판이 수직일 때의 휘도Contrast ratio = luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
상기 명암비 측정기는 CT-1, ZOENTECH사의 것일 수 있으나, 이에 한정되는 것은 아니다. The contrast ratio measuring instrument may be CT-1, ZOENTECH, but is not limited thereto.
본 명세서의 일 실시상태에 따른 컬러필터의 형광세기는 상기 기판을 Sinco사 FS-2 형광측정장비를 이용하여 상온(25℃)에서, excitation wavelength를 545nm, emission wavelength 560nm 내지 720nm로 하여 형광세기를 측정할 수 있다. Fluorescence intensity of the color filter according to an exemplary embodiment of the present specification is the substrate using the Sinco FS-2 fluorescence measuring apparatus at room temperature (25 ℃), the excitation wavelength of 545nm, emission wavelength of 560nm to 720nm It can be measured.
상기 컬러필터는 적색 패턴, 녹색 패턴, 청색 패턴, 블랙 매트릭스를 포함할 수 있다. The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
또 하나의 실시상태에 따르면, 상기 컬러필터는 오버코트층를 더 포함할 수 있다. According to another exemplary embodiment, the color filter may further include an overcoat layer.
컬러필터의 컬러픽셀 사이에는 콘트라스트를 향상시킬 목적으로 블랙 매트릭스라고 불리는 격자상의 흑색패턴을 배치할 수 있다. 블랙 매트릭스의 재료로서 크롬을 사용할 수 있다. 이 경우, 크롬을 유리기판 전체에 증착시키고 에칭 처리에 의해 패턴을 형성하는 방식을 이용할 수 있다. 그러나, 공정상의 고비용, 크롬의 고반사율, 크롬 폐액에 의한 환경오염을 고려하여, 미세가공이 가능한 안료분산법에 의한 레진 블랙 매트릭스를 사용할 수 있다. A black pattern on a lattice called a black matrix can be disposed between the color pixels of the color filter for the purpose of improving contrast. Chromium can be used as the material of the black matrix. In this case, a method of depositing chromium over the entire glass substrate and forming a pattern by etching may be used. However, in consideration of high process cost, high reflectance of chromium, and environmental pollution caused by chromium waste liquid, a resin black matrix by a pigment dispersion method capable of fine processing can be used.
상기 블랙 매트릭스는 색재로서 블랙안료 또는 블랙 염료를 사용할 수 있다. 예컨대, 카본블랙을 단독으로 사용하거나, 카본블랙과 착색안료를 혼합하여 사용할 수 있으며, 이때 차광성이 부족한 착색안료를 혼합하기 때문에 상대적으로 색재의 양이 증가하더라도 막의 강도 또는 기판에 대한 밀착성이 저하되지 않는 장점이 있다. The black matrix may use a black pigment or a black dye as a colorant. For example, carbon black may be used alone, or carbon black and coloring pigments may be used. At this time, since coloring pigments lacking light shielding properties may be mixed, even if the amount of colorant is increased, the strength of the film or the adhesion to the substrate may be reduced. There is no advantage.
본 명세서에 따른 컬러필터를 포함하는 디스플레이 장치를 제공한다. Provided is a display device including a color filter according to the present specification.
상기 디스플레이 장치는 플라즈마 디스플레이 패널(Plasma Display Panel, PDP), 발광 다이오드(Light Emitting Diode, LED), 유기 발광 소자(Organic Light Emitting Diode, OLED), 액정 표시 장치(Liquid Crystal Display, LCD), 박막 트랜지스터 액정 표시 장치(Thin FIlm Transistor- Liquid Crystal Display, LCD-TFT) 및 음극선관(Cathode Ray Tube, CRT) 중 어느 하나일 수 있다.The display device may be a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor. The liquid crystal display device may be any one of a liquid crystal display (LCD-TFT) and a cathode ray tube (CRT).
<실시예><Example>
<화합물의 합성 실시예>Synthesis Example of Compound
합성예 1: 화합물 1의 합성Synthesis Example 1 Synthesis of Compound 1
중간체 1의 합성Synthesis of Intermediate 1
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-1 10.31g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간동안 교반시키고, 반응용액을 상온으로 식힌 후 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다. A-1 5g (12.34mmol), B-1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
이후 얻어진 석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 1 7g(11.46mmol)을 얻었다.The precipitate thus obtained was filtered and washed with water under reduced pressure, dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7 g of intermediate 1 (11.46 mmol).
이온화 모드 APCI+: m/z=611{M+H], Exact Mass: 610Ionization mode APCI +: m / z = 611 {M + H], Exact Mass: 610
화합물 1의 합성Synthesis of Compound 1
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 1 1.5g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone)에 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다. 석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 1, 1.3g(1.358mmol)을 얻었다.In a 100 ml 2-neck Round Bottom Flask (RBF), 1.5 g (2.46 mmol) of intermediate 1, 2.958 g (9.82 mmol) of C-1, and 1.358 g (9.82 mmol) of potassium carbonate (K 2 CO 3 ) were added to N. 30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes. The precipitate was filtered and washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.3 g (1.358 mmol) of compound 1.
이온화 모드 APCI+: m/z=957{M+H], Exact Mass: 956Ionization mode APCI +: m / z = 957 {M + H], Exact Mass: 956
합성예 2: 화합물 2의 합성Synthesis Example 2 Synthesis of Compound 2
중간체 2의 합성Synthesis of Intermediate 2
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-2 14.90g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간동안 교반시키고, 반응용액을 상온으로 식힌 후 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다.A-1 5g (12.34mmol), B-2 14.90g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
이후 석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 2, 7.2g(9.80mmol)을 얻었다.The precipitate was then filtered and washed with water under reduced pressure and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.2 g (9.80 mmol) of intermediate 2.
이온화 모드 APCI+: m/z=735{M+H], Exact Mass: 734Ionization mode APCI +: m / z = 735 {M + H], Exact Mass: 734
화합물 2의 합성Synthesis of Compound 2
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 2 1.808g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간 동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.1.100g (2.46mmol) of intermediate 2, 2.958g (9.82mmol) of C-1, 1.358g (9.82mmol) of potassium carbonate (K 2 CO 3 ) were added to a 100ml 2-neck Round Bottom Flask (RBF). -30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
이후 얻어진 석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 2, 1g(0.925mmol)을 얻었다.The precipitate thus obtained was filtered and washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain compound 2, 1 g (0.925 mmol).
이온화 모드 APCI+: m/z=1081[M+H], Exact Mass: 1081Ionization mode APCI +: m / z = 1081 [M + H], Exact Mass: 1081
합성예 3: 화합물 3의 합성Synthesis Example 3 Synthesis of Compound 3
중간체 3의 합성Synthesis of Intermediate 3
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-3 1 10.31g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간동안 교반시키고, 반응용액을 상온으로 식힌 후, 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다.A-1 5g (12.34mmol), B-3 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
이후, 석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 3, 6.8g(11.130mmol)을 얻었다.Thereafter, the precipitate was filtered and washed with water under reduced pressure, dried in a vacuum oven at 60 ° C. for 12 hours to obtain 6.8 g (11.130 mmol) of an intermediate 3.
이온화 모드 APCI+: m/z=611{M+H], Exact Mass: 610Ionization mode APCI +: m / z = 611 {M + H], Exact Mass: 610
화합물 3의 합성Synthesis of Compound 3
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 3 1.502g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.100 ml 2-neck Round Bottom Flask (RBF), Intermediate 3 1.502g (2.46mmol), C-1 2.958g (9.82mmol), Potassium Carbonate (K 2 CO 3 ) 1.358 g (9.82 mmol) was added to 30 g of N-methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
이후 석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 3, 1.4g(1.463mmol)을 얻었다.The precipitate was then filtered and washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.4 g (1.463 mmol) of compound 3.
이온화 모드 APCI+: m/z=957[M+H], Exact Mass: 956Ionization Mode APCI +: m / z = 957 [M + H], Exact Mass: 956
합성예 4: 화합물 4의 합성Synthesis Example 4 Synthesis of Compound 4
중간체 4의 합성Synthesis of Intermediate 4
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-4 1 10.31g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간 동안 교반시키고, 반응 용액을 상온으로 식힌 후 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다.A-1 5g (12.34mmol), B-4 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
이후, 석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 4 6.5g(10.64mmol)을 얻었다.Thereafter, the precipitate was filtered and washed with water under reduced pressure, dried in a vacuum oven at 60 ° C. for 12 hours to obtain 6.5 g (10.64 mmol) of an intermediate 4.
이온화 모드 APCI+: m/z=611{M+H], Exact Mass: 610Ionization mode APCI +: m / z = 611 {M + H], Exact Mass: 610
화합물 4의 합성Synthesis of Compound 4
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 4 1.502g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.In a 100 ml 2-neck Round Bottom Flask (RBF), Intermediate 4 1.502 g (2.46 mmol), C-1 2.958 g (9.82 mmol), potassium carbonate (K 2 CO 3 ) 1.358 g (9.82 mmol) N -30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 4, 1.7g(1.776mmol)을 얻었다.The precipitate was filtered and washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 1.7 g (1.776 mmol) of compound 4.
이온화 모드 APCI+: m/z=957[M+H], Exact Mass: 956Ionization Mode APCI +: m / z = 957 [M + H], Exact Mass: 956
합성예 5: 화합물 5의 합성Synthesis Example 5 Synthesis of Compound 5
중간체 5의 합성Synthesis of Intermediate 5
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-5 14.30g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간동안 교반시키고, 반응 용액을 상온으로 식힌 후 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다. A-1 5g (12.34mmol), B-5 14.30g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
이후, 석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 5, 7.2g(10.02mmol)을 얻었다.Thereafter, the precipitate was filtered and washed with water under reduced pressure, dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.2 g (10.02 mmol) of an intermediate 5.
이온화 모드 APCI+: m/z=719{M+H], Exact Mass: 718Ionization mode APCI +: m / z = 719 {M + H], Exact Mass: 718
화합물 5의 합성Synthesis of Compound 5
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 5 1.768g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.100 ml 2-neck Round Bottom Flask (RBF), Intermediate 5 1.768 g (2.46 mmol), C-1 2.958 g (9.82 mmol), potassium carbonate (K 2 CO 3 ) 1.358 g (9.82 mmol) N -30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 5, 2.1g(1.972mmol)을 얻었다.The precipitate was filtered and washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 2.1 g (1.972 mmol) of compound 5.
이온화 모드 APCI+: m/z=1065[M+H], Exact Mass: 1064Ionization mode APCI +: m / z = 1065 [M + H], Exact Mass: 1064
합성예 6: 화합물 6의 합성Synthesis Example 6 Synthesis of Compound 6
중간체 6의 합성Synthesis of Intermediate 6
250ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 A-1 5g(12.34mmol), B-6 15.33g(74.03mmol)과 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 80g을 넣고 교반시켰다. 150℃로 승온하여 4시간동안 교반시키고, 반응용액을 상온으로 식힌 후 1M 염산(HCl) 800ml에 넣고 30분간 교반시켰다.A-1 5g (12.34mmol), B-6 15.33g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 60℃ 진공오븐에서 12시간 건조시켜, 중간체 6, 7.4g(9.91mmol)을 얻었다.The precipitate was filtered and washed with water under reduced pressure, dried in a vacuum oven at 60 ° C. for 12 hours to obtain 7.4 g (9.91 mmol) of an intermediate 6.
이온화 모드 APCI+: m/z=747{M+H], Exact Mass: 746Ionization mode APCI +: m / z = 747 {M + H], Exact Mass: 746
화합물 6의 합성Synthesis of Compound 6
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 중간체 6 1.837g (2.46mmol), C-1 2.958g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간 동안 교반시키고, 반응 용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.In a 100 ml 2-neck Round Bottom Flask (RBF), intermediate 6 1.837 g (2.46 mmol), C-1 2.958 g (9.82 mmol), potassium carbonate (K 2 CO 3 ) 1.358 g (9.82 mmol) N -30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 화합물 6, 2.5g(2.287mmol)을 얻었다.The precipitate was filtered, washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain 2.5 g (2.287 mmol) of compound 6.
이온화 모드 APCI+: m/z=1093[M+H], Exact Mass: 1092Ionization mode APCI +: m / z = 1093 [M + H], Exact Mass: 1092
합성예 7: 화합물 7의 합성Synthesis Example 7 Synthesis of Compound 7
상기 화합물 1의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 7을 얻었다. In the preparation of Compound 1, C-1 was changed to C-2, and otherwise, Compound 7 was obtained by the same method.
이온화 모드 APCI+: m/z=985[M+H], Exact Mass: 984Ionization Mode APCI +: m / z = 985 [M + H], Exact Mass: 984
합성예 8: 화합물 8의 합성Synthesis Example 8 Synthesis of Compound 8
상기 화합물 2의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 8을 얻었다.In the preparation of Compound 2, C-1 was changed to C-2, and Compound 8 was obtained through the same method except for the above.
이온화 모드 APCI+: m/z=1109[M+H], Exact Mass: 1108Ionization mode APCI +: m / z = 1109 [M + H], Exact Mass: 1108
합성예 9: 화합물 9의 합성Synthesis Example 9 Synthesis of Compound 9
상기 화합물 3의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 9를 얻었다.In the preparation of Compound 3, C-1 was changed to C-2, and Compound 9 was obtained through the same method except for the above.
이온화 모드 APCI+: m/z=985[M+H], Exact Mass: 984Ionization Mode APCI +: m / z = 985 [M + H], Exact Mass: 984
합성예 10: 화합물 10의 합성Synthesis Example 10 Synthesis of Compound 10
상기 화합물 4의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 10을 얻었다.In the preparation of Compound 4, C-1 was changed to C-2, and Compound 10 was obtained by the same method except for the above.
이온화 모드 APCI+: m/z=985[M+H], Exact Mass: 984Ionization Mode APCI +: m / z = 985 [M + H], Exact Mass: 984
합성예 11: 화합물 11의 합성Synthesis Example 11 Synthesis of Compound 11
상기 화합물 5의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 11을 얻었다.In the preparation of Compound 5, C-1 was changed to C-2, and Compound 11 was obtained through the same method except for the above.
이온화 모드 APCI+: m/z=1093[M+H], Exact Mass: 1092Ionization mode APCI +: m / z = 1093 [M + H], Exact Mass: 1092
합성예 12: 화합물 12의 합성Synthesis Example 12 Synthesis of Compound 12
상기 화합물 6의 제조에서 C-1을 C-2로 변경하고, 그 이외는 동일한 방법을 통해 화합물 12를 얻었다.In the preparation of Compound 6, C-1 was changed to C-2, and Compound 12 was obtained through the same method except for the above.
이온화 모드 APCI+: m/z=1121[M+H], Exact Mass: 1120Ionization mode APCI +: m / z = 1121 [M + H], Exact Mass: 1120
합성예 13 내지 18: 화합물 13 내지 18의 합성Synthesis Examples 13 to 18 Synthesis of Compounds 13 to 18
화합물 1 내지 6의 제조에서 C-1을 C-3으로 변경하고, 그 이외는 동일한 방법을 통해 하기와 같이 화합물 13 내지 18을 얻었다. In the preparation of compounds 1 to 6, C-1 was changed to C-3, and compounds 13 to 18 were obtained through the same method except for the following.
화합물 13: 이온화 모드 APCI+: m/z=1085[M+H], Exact Mass: 1084Compound 13: Ionization Mode APCI +: m / z = 1085 [M + H], Exact Mass: 1084
화합물 14: 이온화 모드 APCI+: m/z=1209[M+H], Exact Mass: 1208Compound 14: Ionization Mode APCI +: m / z = 1209 [M + H], Exact Mass: 1208
화합물 15: 이온화 모드 APCI+: m/z=1085[M+H], Exact Mass: 1084Compound 15: Ionization Mode APCI +: m / z = 1085 [M + H], Exact Mass: 1084
화합물 16: 이온화 모드 APCI+: m/z=11085[M+H], Exact Mass: 1084Compound 16: Ionization Mode APCI +: m / z = 11085 [M + H], Exact Mass: 1084
화합물 17: 이온화 모드 APCI+: m/z=1193[M+H], Exact Mass: 1192Compound 17: Ionization Mode APCI +: m / z = 1193 [M + H], Exact Mass: 1192
화합물 18: 이온화 모드 APCI+: m/z=1221[M+H], Exact Mass: 1220Compound 18: Ionization Mode APCI +: m / z = 1221 [M + H], Exact Mass: 1220
비교화합물 1. Comparative Compound 1.
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 S1 1.414g (2.46mmol), bromopropane 1.21g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.S1 1.414 g (2.46 mmol), bromopropane 1.21 g (9.82 mmol), potassium carbonate (K 2 CO 3 ) 1.358 g (9.82 mmol) in a 100 ml 2-neck Round Bottom Flask (N-methyl-) 30 g of 2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added thereto and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 비교화합물 1을 얻었다.The precipitate was filtered, washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain Comparative Compound 1.
이온화 모드 APCI+: m/z=659 [M+H], Exact Mass: 658Ionization mode APCI +: m / z = 659 [M + H], Exact Mass: 658
비교화합물 2 Comparative Compound 2
100ml 2-neck 둥근바닥플라스크(RBF, Round Bottom Flask)에 S2 1.4234g (2.46mmol), C-2 3.094g(9.82mmol), 탄산칼륨(K2CO3) 1.358g(9.82mmol)을 N-메틸-2-피롤리돈(NMP, N-Methyl-2-pyrrolidone) 30g 넣고 교반시켰다. 100℃로 승온하여 6시간동안 교반시키고, 반응용액을 상온으로 식힌 후 증류수(DI-Water) 500ml에 넣고 30분간 교반시켰다.S2 1.4234g (2.46mmol), C-2 3.094g (9.82mmol), potassium carbonate (K 2 CO 3 ) 1.358g (9.82mmol) in 100ml 2-neck Round Bottom Flask 30 g of methyl-2-pyrrolidone (NMP, N-Methyl-2-pyrrolidone) was added thereto and stirred. The mixture was heated to 100 ° C. and stirred for 6 hours. The reaction solution was cooled to room temperature, and then poured into 500 ml of distilled water (DI-Water) and stirred for 30 minutes.
석출물을 감압하에서 여과 및 수세하고, 컬럼크로마토그래피를 통해 분리하고, 60℃ 진공오븐에서 12시간 건조시켜, 비교화합물 2을 얻었다.The precipitate was filtered, washed with water under reduced pressure, separated through column chromatography, and dried in a vacuum oven at 60 ° C. for 12 hours to obtain Comparative Compound 2.
이온화 모드 APCI+: m/z=953 [M+H], Exact Mass: 952Ionization Mode APCI +: m / z = 953 [M + H], Exact Mass: 952
비교화합물 3Comparative Compound 3
합성예 1에서 중간체 1의 합성과 동일한 방법으로, A-1와 B-1 대신 S3와 S4를 이용하여 비교화합물 3을 합성하였다.In the same manner as in the synthesis of Intermediate 1 in Synthesis Example 1, Comparative Compound 3 was synthesized using S3 and S4 instead of A-1 and B-1.
비교화합물 4Comparative Compound 4
10℃ 98%황산 50g에 비교화합물 1 3g(4.553mmol)을 넣고 용해시켰다. 이후 N-hydroxymethylphthalimide 0.807g(4.553mmol)을 넣고 45℃로 승온하여 2시간동안 교반하였다. 반응용액을 물 500g에 첨가하여 결정을 석출시키고, 석출물을 감압하에서 여과시켜 비교화합물 4를 얻었다.3 g (4.553 mmol) of Comparative Compound 1 was dissolved in 50 g of 10% 98% sulfuric acid. Thereafter, 0.807 g (4.553 mmol) of N-hydroxymethylphthalimide was added thereto, and the temperature was raised to 45 ° C. and stirred for 2 hours. The reaction solution was added to 500 g of water to precipitate crystals, and the precipitate was filtered under reduced pressure to obtain Comparative Compound 4.
실시예 1Example 1
화합물 1을 5.554g, 바인더 수지로 벤질메타크릴레이트와 메타크릴산의 공중합체(몰비 70:30, 산가는 113 KOH mg/g, 겔투과크로마토그래피(GPC)로 측정한 중량평균분자량 20,000g/mol, 분자량분포(PDI) 2.0g, 고형분(S.C) 25%, 용매 폴리프로필렌글리콜모노메틸에테르아세테이트(PGMEA) 포함) 10.376g, 광개시제로는 I-369 (BASF사) 2.018g, 다관능성모노머인 DPHA(일본화약) 12.443g, 용매 PGMEA(폴리프로필렌 글리콜 모노메틸 에테르 아세테이트) 68.593g, 및 첨가제인 계면활성제로 DIC社 F-475, 1.016g을 혼합하여 감광성 수지 조성물 1을 제조하였다.5.554 g of compound 1, a copolymer of benzyl methacrylate and methacrylic acid with a binder resin (molar ratio 70:30, acid value of 113 KOH mg / g, gel permeation chromatography (GPC) measured by weight average molecular weight 20,000 g / mol, molecular weight distribution (PDI) 2.0 g, solid content (SC) 25%, solvent polypropylene glycol monomethyl ether acetate (PGMEA) 10.376 g, photoinitiator as I-369 (BASF) 2.018 g, polyfunctional monomer Photosensitive resin composition 1 was prepared by mixing 12.443 g of DPHA, 68.593 g of solvent PGMEA (polypropylene glycol monomethyl ether acetate), and 1.016 g of DIC F-475 with an additive surfactant.
실시예 2 내지 18Examples 2-18
실시예 1에서 화합물 1을 화합물 2 내지 18로 변경하고, 그 이외는 동일한 조성으로 감광성 수지 조성물 2 내지 18을 각각 제조하였다.In Example 1, the compound 1 was changed into the compound 2-18, and the photosensitive resin composition 2-18 was respectively manufactured by the same composition except that.
비교예 1Comparative Example 1
비교화합물 1을 5.554g, 바인더 수지로 벤질메타크릴레이트와 메타크릴산의 공중합체(몰비 70:30, 산가는 113 KOH mg/g, 겔투과크로마토그래피(GPC)로 측정한 중량평균분자량 20,000g/mol, 분자량분포(PDI) 2.0g, 고형분(S.C) 25%, 용매 폴리프로필렌글리콜모노메틸에테르아세테이트(PGMEA) 포함) 10.376g, 광개시제로는 I-369 (BASF사) 2.018g, 다관능성 모노머로 DPHA(일본화약) 12.443g, 용매 PGMEA(폴리프로필렌 글리콜 모노메틸 에테르 아세테이트) 68.593g, 및 첨가제인 계면활성제로 DIC社 F-475, 1.016g을 혼합하여 비교예 1의 감광성 수지 조성물을 제조하였다.5.554 g of Comparative Compound 1, a copolymer of benzyl methacrylate and methacrylic acid with a binder resin (molar ratio 70:30, acid value of 113 KOH mg / g, weight average molecular weight 20,000 g measured by gel permeation chromatography (GPC)) / mol, molecular weight distribution (PDI) 2.0 g, solid content (SC) 25%, solvent polypropylene glycol monomethyl ether acetate (PGMEA) 10.376 g, photoinitiator as I-369 (BASF) 2.018 g, polyfunctional monomer The photosensitive resin composition of Comparative Example 1 was prepared by mixing 12.443 g of DPHA, 68.593 g of solvent PGMEA (polypropylene glycol monomethyl ether acetate), and 1.016 g of DIC F-475 as an additive surfactant. .
비교예 2 내지 4Comparative Examples 2 to 4
상기 비교예 1에서, 비교화합물 1을 비교화합물 2 내지 4로 각각 변경하고, 그 이외는 동일한 조성으로 비교예 2 내지 4의 감광성 수지 조성물을 제조하였다.In Comparative Example 1, Comparative Compound 1 was changed to Comparative Compounds 2 to 4, except that the photosensitive resin compositions of Comparative Examples 2 to 4 were prepared with the same composition.
<실험예>Experimental Example
기판 제작PCB Fabrication
상기 실시예 1 내지 18, 비교예 1 내지 4에 따른 감광성 수지 조성물을 기판 제작에 각각 사용하였다. 구체적으로, 상기 실시예 1 내지 18, 비교예 1 내지 4에 따른 감광성 수지 조성물을 유리 (5 X 5 cm2) 위에 스핀코팅(spin coating)하고, 100℃에서 100초간 전열처리(prebake)를 실시하여 필름을 형성시켰다.The photosensitive resin composition concerning Examples 1-18 and Comparative Examples 1-4 was used for the board | substrate preparation, respectively. Specifically, the photosensitive resin composition according to Examples 1 to 18 and Comparative Examples 1 to 4 was spin coated on glass (5 × 5 cm 2 ), and prebake at 100 ° C. for 100 seconds. To form a film.
필름을 형성시킨 기판과 포토마스크(photo mask)사이 간격을 250um로 하고, 노광기를 이용하여 기판 전면에 40mJ/cm2 노광량을 조사하였다. 이후 노광된 기판을 현상액(수산화칼륨(KOH), 0.05%)에 60초간 현상하고, 230℃로 20분간 후열처리(postbake)하여 기판을 제작하였다.The distance between the substrate on which the film was formed and the photo mask was set at 250 um, and the exposure amount of 40 mJ / cm 2 was irradiated on the entire surface of the substrate using an exposure machine. Thereafter, the exposed substrate was developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
내열성 평가Heat resistance rating
상기 기판 제작 방법에 따라 제작된 기판을 분광기(MCPD-오츠카 社)를 이용하여 380nm 내지 780nm 범위의 가시광 영역의 투과율 스펙트럼을 얻었다. 또한, 전열처리(prebake) 기판을 추가적으로 230℃에 20분간 후열처리(postbake)를 시켜 동일한 장비와 측정범위에서 투과율 스펙트럼을 얻었다. The substrate produced according to the substrate manufacturing method was obtained using a spectrometer (MCPD-Otsuka Co., Ltd.) to obtain a transmittance spectrum of the visible light range of 380nm to 780nm. In addition, the prebake substrate was further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
얻어진 투과율 스펙트럼과 C광원 백라이트를 이용하고, 얻어진 값 E(L*, a*, b*)을 이용해 색변화(이하, ΔEab)를 계산하고, 하기 표 1에 나타내었다.Using the obtained transmittance spectrum and the C light source backlight, the color change (hereinafter, referred to as ΔEab) was calculated using the obtained values E (L *, a *, b *) and is shown in Table 1 below.
ΔEab값이 작다는 것은 색내열성이 우수함을 말한다.A small ΔEab value indicates excellent color heat resistance.
ΔEab < 3값을 가지면 컬러필터용 색소로 사용이 가능하며, 내열성이 우수한 색재라고 말할 수 있다. 구체적으로 ΔEab를 계산하는 식은 하기와 같다.When ΔEab <3, it can be used as a color filter dye, and it can be said that it is a color material having excellent heat resistance. Specifically, the formula for calculating ΔEab is as follows.
[계산식 1][Calculation 1]
ΔEab(L*, a*, b*) = {(ΔL*)2+(Δa*)2+(Δb*)2}1/2
ΔEab (L *, a *, b *) = {(ΔL *) 2 + (Δa *) 2 + (Δb *) 2 } 1/2
ΔEab (후열 처리-전열 처리)ΔEab (Post Heat Treatment-Heat Treatment) | |
실시예 1Example 1 | 1.281.28 |
실시예 2Example 2 | 1.271.27 |
실시예 3Example 3 | 0.850.85 |
실시예 4Example 4 | 1.361.36 |
실시예 5Example 5 | 1.751.75 |
실시예 6Example 6 | 0.940.94 |
실시예 7Example 7 | 1.451.45 |
실시예 8Example 8 | 1.391.39 |
실시예 9Example 9 | 1.121.12 |
실시예 10Example 10 | 1.471.47 |
실시예 11Example 11 | 1.681.68 |
실시예 12Example 12 | 1.271.27 |
실시예 13Example 13 | 0.970.97 |
실시예 14Example 14 | 1.541.54 |
실시예 15Example 15 | 1.981.98 |
실시예 16Example 16 | 1.761.76 |
실시예 17Example 17 | 1.641.64 |
실시예 18Example 18 | 1.441.44 |
상기 표 1을 참고하면, 본 발명의 실시예 1 내지 18의 감광성 수지 조성물을 이용하여 형성한 컬러 패턴 기판은, 후열 처리와 후열 처리 후 투과율 스펙트럼의 차이(ΔEab)가 3 미만으로서, 색안정성이 높으며 매우 적어 내열성이 우수한 것을 확인할 수 있었다. Referring to Table 1, the color pattern substrate formed by using the photosensitive resin composition of Examples 1 to 18 of the present invention, the difference in the transmittance spectrum (ΔEab) after the post-heat treatment and post-heat treatment is less than 3, the color stability It was confirmed that the heat resistance was very high because it is very small.
명암비 측정Contrast Ratio Measurement
상기 기판 제작 방법에 따라 제작된 기판을 명암비 측정기(CT-1, ZOENTECH사)를 이용하여, 2매의 편광판 사이에 제작된 기판을 넣고 2매의 편광판이 수평일 때의 휘도와 2매의 편광판이 직교일 때의 휘도를 측정하여 하기 계산식 2로 명암비를 계산하였다. The substrate produced according to the substrate manufacturing method was put in between the two polarizing plates using a contrast ratio measuring instrument (CT-1, ZOENTECH Co., Ltd.) and the brightness when two polarizing plates are horizontal and two polarizing plates The brightness | luminance in this orthogonality was measured, and the contrast ratio was computed by following formula (2).
[계산식 2][Calculation 2]
명암비=2매의 편광판이 수평일 때의 휘도/ 2매의 편광판이 수직일 때의 휘도Contrast ratio = luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
상기 계산식 2에 의해 계산된 명암비를 하기 계산식 3으로 명암비 개선율을 계산하여, 하기 표 2에 기재하였다. Contrast ratio calculated by the above formula 2 was calculated by the following formula 3 contrast ratio improvement, it is shown in Table 2 below.
[계산식 3][Calculation 3]
명암비 개선율=(실시예 명암비-비교예 1, 2 또는 4 명암비)/비교예 1, 2 또는 4 명암비*100)Contrast ratio improvement rate = (Example contrast ratio-Comparative example 1, 2 or 4 contrast ratio) / Comparative example 1, 2 or 4 contrast ratio * 100)
명암비 개선율(%)Contrast ratio improvement rate (%) | |||
비교예 1 기준Based on Comparative Example 1 | 비교예 2 기준Based on Comparative Example 2 | 비교예 4 기준Comparative Example 4 Standard | |
실시예 1Example 1 | 511.75511.75 | 316.8316.8 | 510.21510.21 |
실시예 2Example 2 | 494.10494.10 | 305.87305.87 | 471.21471.21 |
실시예 3Example 3 | 319.60319.60 | 197.85197.85 | 300.46300.46 |
실시예 4Example 4 | 332.66332.66 | 205.93205.93 | 314.57314.57 |
실시예 5Example 5 | 352.59352.59 | 218.27218.27 | 331.67331.67 |
실시예 6Example 6 | 532.38532.38 | 329.57329.57 | 510.43510.43 |
실시예 7Example 7 | 384.80384.80 | 238.21238.21 | 329.81329.81 |
실시예 8Example 8 | 355.13355.13 | 219.84219.84 | 329.47329.47 |
실시예 9Example 9 | 282.61282.61 | 174.95174.95 | 244.93244.93 |
실시예 10Example 10 | 303.05303.05 | 187.6187.6 | 286.42286.42 |
실시예 11Example 11 | 335.79335.79 | 207.87207.87 | 308.78308.78 |
실시예 12Example 12 | 401.65401.65 | 248.64248.64 | 377.56377.56 |
실시예 13Example 13 | 324.43324.43 | 200.84200.84 | 209.47209.47 |
실시예 14Example 14 | 300.17300.17 | 185.82185.82 | 254.38254.38 |
실시예 15Example 15 | 220.47220.47 | 136.48136.48 | 197.83197.83 |
실시예 16Example 16 | 230.29230.29 | 142.56142.56 | 201.49201.49 |
실시예 17Example 17 | 256.39256.39 | 158.72158.72 | 223.83223.83 |
실시예 18Example 18 | 335.48335.48 | 207.68207.68 | 319.52319.52 |
상기 표 2를 참고하면, 상기 비교예 1에 비하여, 상기 실시예 1 내지 18의 명암비가 220.47% 내지 532.38% 개선되었음을 확인할 수 있었다. 또한 상기 비교예 2에 비하여, 상기 실시예 1 내지 18의 명암비가 136.48% 내지 329.57% 개선되었음을 확인할 수 있었다. 또한 상기 비교예 4에 비하여, 상기 실시예 1 내지 18의 명암비가 197.83% 내지 510.43% 개선되었음을 확인 할 수 있었다.Referring to Table 2, compared with Comparative Example 1, it was confirmed that the contrast ratio of Examples 1 to 18 was improved 220.47% to 532.38%. In addition, it was confirmed that the contrast ratio of Examples 1 to 18 was improved by 136.48% to 329.57% compared to Comparative Example 2. In addition, it was confirmed that the contrast ratio of Examples 1 to 18 was improved from 197.83% to 510.43% compared to Comparative Example 4.
형광세기 측정Fluorescence intensity measurement
상기 기판 제작 방법에 따라 제작된 기판을 Sinco사 FS-2 형광측정장비를 이용하여 상온(25℃)에서, excitation wavelength를 545nm, emission wavelength 560nm 내지 720nm로 하여 형광세기를 측정하여, 도 1에 나타내었다.The substrate produced according to the substrate fabrication method was measured at room temperature (25 ° C.) using a Sinco FS-2 fluorescence measuring apparatus, and the fluorescence intensity was measured using an excitation wavelength of 545 nm and an emission wavelength of 560 nm to 720 nm. It was.
도 1에 따르면, 본 명세서의 일 실시상태에 따른 실시예 6, 7 및 12의 형광세기는 비교예 1 및 2보다 낮아, 추가적인 염료를 첨가하지 않고서도 우수한 명암비를 얻을 수 있음을 확인할 수 있었다. According to Figure 1, the fluorescence intensity of Examples 6, 7 and 12 according to one embodiment of the present specification was lower than Comparative Examples 1 and 2, it was confirmed that excellent contrast ratio can be obtained without adding an additional dye.
투과도 평가Permeability Evaluation
상기 기판 제작 방법에 따라 제작된 기판을 분광기(MCPD-오츠카 社)를 이용하여, 230℃로 20분간 후열처리(postbake)한 기판에 대하여 380nm 내지 780nm 범위의 가시광 영역의 투과율 스펙트럼을 얻었다The transmittance spectrum of the visible light range of 380 nm-780 nm was obtained with respect to the board | substrate which postbakeed the board | substrate produced by the said board | substrate manufacturing method at 230 degreeC for 20 minutes using the spectrometer (MCPD-Otsuka Co., Ltd.).
특히 청색 컬러필터의 경우 시감x, 시감y, 시감z에서 380nm~480nm에서 최대투과도가 높을 경우 보다 우수한 휘도를 나타낼 수 있다.In particular, the blue color filter may exhibit better luminance when the maximum transmittance is high at 380 nm to 480 nm at luminous x, luminous y, and luminous z.
도 2는 시감x, 시감y, 시감z를 나타낸다.2 shows the luminous sense x, luminous sensitivity and luminous sensitivity z.
투과도 %(380nm~480nm에서의 최대 투과도 %)Transmittance% (maximum transmittance% from 380nm to 480nm) | |
실시예 1Example 1 | 95.75695.756 |
실시예 7Example 7 | 92.90692.906 |
실시예 13Example 13 | 95.72195.721 |
비교예 3Comparative Example 3 | 88.52888.528 |
상기 표 3를 참고하면, 상기 비교예 3에 비하여, 상기 실시예 1 및 7, 13의 380nm~480nm에서의 최대투과도가 높음을 알 수 있다.Referring to Table 3, it can be seen that the maximum transmittance at 380nm ~ 480nm of Examples 1 and 7, 13 compared with the Comparative Example 3.
도 3에 따르면, 본 명세서의 일 실시상태에 따른 실시예 1, 7 및 13의 380nm~480nm에서의 투과도가 비교예 3 보다 커 청색컬러필터에서 보다 우수한 휘도를 나타낼 수 있음을 확인할 수 있었다. According to FIG. 3, it was confirmed that the transmittance at 380 nm to 480 nm of Examples 1, 7 and 13 according to one embodiment of the present specification was greater than that of Comparative Example 3, thereby indicating better luminance in the blue color filter.
Claims (14)
- 하기 화학식 1로 표시되는 화합물:Compound represented by the following formula (1):[화학식 1][Formula 1]상기 화학식 1에 있어서,In Chemical Formula 1,L1 및 L2는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬렌기이며,L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted alkylene group,R1 및 R2는 서로 같거나 상이하고, 각각 독립적으로 질소 원자를 포함하는 이무수물기이고, R1 and R2 are the same or different from each other, and each independently a dianhydride group containing a nitrogen atom,R3 및 R4는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이며, R3 and R4 are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group,R5 내지 R12는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 시클로알케닐기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되고, R5 to R12 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group,R13 내지 R17은 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; -OH; -SO3 -; -SO3H; -SO3M; -SO2NM1M2; -SO2NHY; -COOH; 음이온성기; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 시클로알킬기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 헤테로아릴기이고,R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group,상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고,M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure,상기 M1, M2 및 Y는 서로 같거나 상이하고, 각각 독립적으로 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 및 치환 또는 비치환된 헤테로아릴기로 이루어진 군에서 선택되며,M1, M2 and Y are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group,상기 R13 내지 R17 중 적어도 하나는 음이온성기이며, At least one of the R13 to R17 is an anionic group,X는 음이온성기이고, X is an anionic group,a는 0 또는 1이며, a is 0 or 1,r5 및 r6는 0 내지 4의 정수이고, r5가 2 이상인 경우 R5는 서로 같거나 상이하고, r6이 2 이상인 경우, R6은 서로 같거나 상이하다.r5 and r6 are integers of 0 to 4, and when R5 is 2 or more, R5 is the same or different from each other. When r6 is 2 or more, R6 is the same or different from each other.
- 청구항 1에 있어서, 상기 X는 텅스텐, 몰리브덴, 규소 및 인으로 이루어지는 군에서 선택되는 적어도 1개의 원소와 산소를 함유하는 화합물의 음이온; 트리플루오르메탄설폰산 음이온; 비스(트리플루오로메틸술포닐)아미드 음이온; 비스트리플루오르메탄설폰이미드 음이온; 비스퍼플루오르에틸설폰이미드 음이온; 테트라페닐보레이트 음이온; 테트라키스(4-플루오로페닐)보레이트; 테트라키스(펜타플루오로페닐)보레이트; 트리스트리플루오로메탄설포닐메티드; 및 할로겐기로 이루어진 군에서 선택되는 것인 화합물.The method of claim 1, wherein X is an anion of a compound containing oxygen and at least one element selected from the group consisting of tungsten, molybdenum, silicon and phosphorus; Trifluoromethanesulfonic acid anion; Bis (trifluoromethylsulfonyl) amide anion; Bistrifluoromethanesulfonimide anion; Bisperfluoroethylsulfonimide anion; Tetraphenylborate anion; Tetrakis (4-fluorophenyl) borate; Tetrakis (pentafluorophenyl) borate; Tristrifluoromethanesulfonylmethide; And halogen groups.
- 청구항 1에 있어서, 상기 M은 Na+; K+; Rb+; Cs+; Fr+; 및 암모늄 구조를 포함하는 화합물로 이루어진 군에서 선택되고,The method according to claim 1, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure,상기 암모늄 구조를 포함하는 화합물은 하기 화학식 A로 표시되거나 하기 화학식 B로 표시되는 단위를 포함하는 화합물:The compound containing the ammonium structure is a compound comprising a unit represented by the following formula (A) or formula (B):[화학식 A][Formula A][화학식 B][Formula B]상기 화학식 A에 있어서, In Chemical Formula A,Ra 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 아릴기; 치환 또는 비치환된 아릴알킬기; -L1-NHCO-R; 또는 -L2-OCO-R이거나, Ra 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, Ra to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Substituted or unsubstituted arylalkyl group; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring,상기 R은 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 아릴알킬기이며, R is hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group,상기 L1 및 L2은 치환 또는 비치환된 알킬렌기이고, L 1 and L 2 are a substituted or unsubstituted alkylene group,상기 화학식 B에 있어서,In Chemical Formula B,Rb 내지 Rd는 서로 같거나 상이하고, 각각 독립적으로 수소; 치환 또는 비치환된 알킬기; 치환 또는 비치환된 알케닐기; 치환 또는 비치환된 아릴기; 또는 치환 또는 비치환된 아릴알킬기이거나, Rb 내지 Rd 중 2개가 서로 결합하여 치환 또는 비치환된 고리를 형성하고, Rb to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring,Z는 치환 또는 비치환된 알킬렌기; 치환 또는 비치환된 아릴렌기; -L3-NHCO-; 또는 -L4-OCO-이며,Z is a substituted or unsubstituted alkylene group; Substituted or unsubstituted arylene group; -L 3 -NHCO-; Or -L 4 -OCO-,상기 L3 및 L4은 치환 또는 비치환된 알킬렌기이고, L 3 and L 4 is a substituted or unsubstituted alkylene group,Re 내지 Rg는 서로 같거나 상이하고, 각각 독립적으로 수소; 또는 치환 또는 비치환된 알킬기이다.Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group.
- 청구항 1에 있어서, 상기 화학식 1은 하기 화학식 2로 표시되는 화합물:The compound of claim 1, wherein Formula 1 is represented by Formula 2:[화학식 2][Formula 2]상기 화학식 2에 있어서,In Chemical Formula 2,L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- 청구항 1에 있어서, 상기 화학식 1은 하기 화학식 3으로 표시되는 화합물:The compound of claim 1, wherein Formula 1 is represented by Formula 3:[화학식 3][Formula 3]상기 화학식 3에 있어서,In Chemical Formula 3,L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- 청구항 1에 있어서, 상기 화학식 1은 하기 화학식 4로 표시되는 화합물:The compound of claim 1, wherein Formula 1 is represented by Formula 4:[화학식 4][Formula 4]상기 화학식 4에 있어서, In Chemical Formula 4,L1, L2, R1 내지 R17, X, a, r5 및 r6은 상기 화학식 1에서 정의한 바와 같다. L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
- 청구항 1에 있어서, 상기 질소 원자를 포함하는 이무수물기는 하기 치환기 중 어느 하나로 표시되는 것인 화합물:The compound according to claim 1, wherein the dianhydride group containing the nitrogen atom is represented by any one of the following substituents:상기 치환기에 있어서, 는 상기 화학식 1에 연결되는 부위를 나타내고, In the substituent, Represents a site linked to the formula (1),X1, X2 및 Y1 내지 Y3는 서로 같거나 상이하고, 각각 독립적으로 수소; 중수소; 할로겐기; 니트로기; -OH; -SO3H;; -COOH; 포스핀기; 음이온성기; 치환 또는 비치환된 알킬기; 또는 치환 또는 비치환된 아릴기이거나, 인접하는 기는 결합하여 치환 또는 비치환된 고리를 형성한다. X1, X2 and Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups combine to form a substituted or unsubstituted ring.
- 청구항 1에 있어서, 상기 화학식 1로 표시되는 화합물은 하기 화학식 중 어느 하나로 표시되는 화합물:The compound of claim 1, wherein the compound represented by Chemical Formula 1 is represented by any one of the following Chemical Formulas:상기 화학식에 있어서,In the above formula,M 및 Y는 상기 화학식 1에서 정의한 바와 같다. M and Y are as defined in the formula (1).
- 청구항 1 내지 8 중 어느 한 항의 화합물; 바인더 수지; 다관능성 모노머; 광개시제; 및 용매를 포함하는 감광성 수지 조성물.A compound of any one of claims 1-8; Binder resins; Polyfunctional monomers; Photoinitiators; And a photosensitive resin composition comprising a solvent.
- 청구항 9에 있어서, 상기 감광성 수지 조성물 중 고형분의 총 중량을 기준으로 상기 화학식 1로 표시되는 화합물의 함량은 5 중량% 내지 60 중량%이고, The method according to claim 9, wherein the content of the compound represented by Formula 1 based on the total weight of solids in the photosensitive resin composition is 5% by weight to 60% by weight,상기 바인더 수지의 함량은 1 중량% 내지 60 중량%이고, The binder resin content is 1% by weight to 60% by weight,상기 광개시제의 함량은 0.1 중량% 내지 20 중량%이며, The content of the photoinitiator is 0.1% by weight to 20% by weight,상기 다관능성 모노머의 함량은 0.1 중량% 내지 50 중량%인 것인 감광성 수지 조성물.The content of the multifunctional monomer is 0.1% by weight to 50% by weight of the photosensitive resin composition.
- 청구항 9에 있어서, 첨가제를 더 포함하는 감광성 수지 조성물.The photosensitive resin composition of Claim 9 which further contains an additive.
- 청구항 9에 따른 수지 조성물을 이용하여 제조된 감광재.The photosensitive material manufactured using the resin composition of Claim 9.
- 청구항 12에 따른 감광재를 포함하는 컬러필터.A color filter comprising the photosensitive material according to claim 12.
- 청구항 13에 따른 컬러필터를 포함하는 디스플레이 장치.Display device including a color filter according to claim 13.
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CN112980213A (en) * | 2019-12-17 | 2021-06-18 | 保土谷化学工业株式会社 | Xanthene dye, coloring composition containing the dye, coloring agent for color filter, and method for producing the dye |
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