WO2019194384A1 - Composé à base de xanthène, composition de résine photosensible, matériau photosensible, filtre coloré et dispositif d'affichage comprenant ledit composé - Google Patents

Composé à base de xanthène, composition de résine photosensible, matériau photosensible, filtre coloré et dispositif d'affichage comprenant ledit composé Download PDF

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WO2019194384A1
WO2019194384A1 PCT/KR2018/013706 KR2018013706W WO2019194384A1 WO 2019194384 A1 WO2019194384 A1 WO 2019194384A1 KR 2018013706 W KR2018013706 W KR 2018013706W WO 2019194384 A1 WO2019194384 A1 WO 2019194384A1
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group
substituted
unsubstituted
formula
compound
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PCT/KR2018/013706
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Korean (ko)
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박종호
최상아
이다미
정지혜
양승진
이영희
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주식회사 엘지화학
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Priority claimed from KR1020180135250A external-priority patent/KR102156478B1/ko
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to CN201880084202.5A priority Critical patent/CN111527075B/zh
Priority to JP2020533813A priority patent/JP6940231B2/ja
Publication of WO2019194384A1 publication Critical patent/WO2019194384A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78—Ring systems having three or more relevant rings
    • C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
    • C07D311/82—Xanthenes
    • C07D311/90—Xanthenes with hydrocarbon radicals, substituted by amino radicals, directly attached in position 9
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present specification relates to a xanthene compound and a photosensitive resin composition including the same.
  • the present specification relates to a photosensitive material manufactured using the photosensitive resin composition, a color filter, and a display device including the same.
  • the performance of the color filter characterized by high brightness and high contrast ratio has been demanded.
  • one of the main purposes of the display device development is to differentiate the display device performance through the improvement of color purity and to improve the productivity in the manufacturing process.
  • the pigment type conventionally used as the color material of the color filter exists in the color photoresist in the state of particle dispersion, it is difficult to control the brightness and contrast ratio according to the pigment particle size and distribution control.
  • the light particles are aggregated in the color filter, resulting in poor dissolution and dispersibility, and multiple scattering of light occurs due to the aggregation of large particles.
  • the scattering of the polarized light has been pointed out as a main factor for lowering the contrast ratio.
  • Efforts have been made to improve the luminance and contrast ratio through ultrafine atomization and dispersion stabilization of pigments, but the degree of freedom in selecting colorants to implement color coordinates for high color purity display devices is limited.
  • the pigment dispersion method using the already developed color material especially pigment has reached the limit to improve the color purity, brightness and contrast ratio of the color filter using the same.
  • the present inventors provide a xanthene compound having a novel structure, a photosensitive resin composition comprising the same, a photosensitive material manufactured using the same, a color filter, and a display device including the same.
  • An exemplary embodiment of the present specification provides a compound represented by the following formula (1).
  • L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted alkylene group,
  • R1 and R2 are the same or different from each other, and each independently a dianhydride group containing a nitrogen atom,
  • R3 and R4 are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group,
  • R5 to R12 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And it is selected from the group consisting of a substituted or unsubstituted heteroaryl group,
  • R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group,
  • M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure,
  • M1, M2 and Y are the same as or different from each other, and each independently a substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, at least one of R13 to R17 is an anionic group,
  • X is an anionic group
  • a 0 or 1
  • r5 and r6 are integers of 0 to 4, and when R5 is 2 or more, R5 is the same or different from each other. When r6 is 2 or more, R6 is the same or different from each other.
  • the compound represented by Formula 1 is represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And it provides a photosensitive resin composition comprising a solvent.
  • An exemplary embodiment of the present specification provides a photosensitive material manufactured using the photosensitive resin composition.
  • An exemplary embodiment of the present specification provides a color filter including the photosensitive material.
  • An exemplary embodiment of the present specification provides a display device including the color filter.
  • the compound according to one embodiment of the present specification may be used as a colorant in the photosensitive resin composition, and may have a solubility in an organic solvent, thereby reducing a dispersing process, unlike when a conventional pigment is applied, a dispersion process may be required.
  • Compounds can be used as colorants in an economical way.
  • the contrast ratio can be improved without additionally adding a dye.
  • the xanthene compound according to one embodiment of the present specification may be used as a color material to improve color reproduction, brightness, and contrast ratio.
  • 1 is a view showing the detected fluorescence intensity of a substrate prepared using a compound according to some embodiments and comparative examples of the present specification.
  • Figure 2 illustrates the ligation of the compound according to one embodiment of the present specification.
  • Figure 3 shows the transmittance of the substrate prepared using the compound according to some examples and comparative examples of the present specification.
  • Chemical Formula 1 is an organic solvent, in which an aryl group substituted with nitrogen having a xanthene structure is substituted with a substituent including sulfur (S), and includes a bulky substituent such as a dianhydride group containing a nitrogen atom. Solubility in organic solvents by including the compound represented by the formula (1).
  • Chemical Formula 1 is an organic solvent, in which an aryl group substituted with nitrogen having a xanthene structure is substituted with a substituent including sulfur (S), and includes a bulky substituent such as a dianhydride group containing a nitrogen atom. Solubility in
  • the solubility is increased, so that aggregation between color materials can be prevented, and economic efficiency can be improved by reducing the amount of material required for dispersing the color materials.
  • contrast ratio (CR) can be improved and excellent heat resistance can be obtained.
  • CR contrast ratio
  • a method of reducing the planarity in the molecule or introducing a molecule that absorbs the light emission When a molecule that absorbs light emission is introduced, it is difficult to selectively absorb only light of an emission wavelength because it absorbs both light and external light of a desired light emitting molecule.
  • a bulky group having a steric hindrance is introduced.
  • Non-radiative decay occurs when a molecule that absorbs light in the ground state and enters an excited state transfers energy through a vibration mode or a rotation mode. Can happen. That is, the emission can be reduced.
  • alkoxy and amine groups can act as electron donation groups to change the absorption wavelength of light absorbing molecules.
  • And Means a site which is bonded to another substituent or binding moiety.
  • substituted or unsubstituted is deuterium; Halogen group; Nitrile group; Nitro group; -OH; Carbonyl group; Ester group; -COOH; Imide group; Amide group; Anionic group; An alkoxy group; An alkyl group; Cycloalkyl group; Alkenyl groups; Cycloalkenyl group; Arylalkyl group; Phosphine groups; Sulfonate groups; Amine group; Aryl group; Heteroaryl group; Silyl groups; Boron group; Acryloyl group; Acrylate group; Ether group; It means that it is substituted with one or more substituents selected from the group comprising an anionic group and a heterocyclic group containing one or more of N, O, S or P atoms or have no substituents.
  • adjacent means a substituent substituted on an atom directly connected to an atom to which the substituent is substituted, a substituent positioned closest to the substituent, or another substituent substituted on an atom to which the substituent is substituted.
  • two substituents substituted at the ortho position in the benzene ring and two substituents substituted at the same carbon in the aliphatic ring may be interpreted as "adjacent" groups.
  • the ring refers to an aromatic or aliphatic ring in that adjacent groups can combine to form a “ring”.
  • the ring may be an aromatic ring, it may be an aryl group or a heteroaryl group. The following description may be applied to the aryl group and heteroaryl group.
  • examples of the halogen group include fluorine, chlorine, bromine or iodine.
  • the carbonyl group may be represented by -COR, and R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
  • R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
  • carbon number of the said carbonyl group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
  • the ester group may be represented by -COOR, wherein R is hydrogen; heavy hydrogen; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Or a substituted or unsubstituted aryl group.
  • the ester group may be substituted with oxygen of the ester group having 1 to 25 carbon atoms, a linear, branched or cyclic alkyl group or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
  • carbon number of an imide group is not specifically limited, It is preferable that it is C1-C30. Specifically, it may be a compound having a structure as follows, but is not limited thereto.
  • the amide group may be substituted with nitrogen of the amide group is hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms or an aryl group having 6 to 30 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
  • the phosphine group means an alkyl phosphine group or an aryl phosphine group
  • the alkyl phosphine group means a phosphine group substituted with an alkyl group.
  • carbon number of the said alkyl phosphine group is not specifically limited, It is preferable that it is 1-20.
  • the alkylphosphine group include dimethylphosphine group, diethylphosphine group, di-n-propylphosphine group, diisopropylphosphine group, di-n-butylphosphine group, di-sec-butylphosphine group and di-tert.
  • arylphosphine group refers to a phosphine group substituted with an aryl group. Although carbon number of the said aryl phosphine group is not specifically limited, It is preferable that it is 6-30.
  • arylphosphine group examples include, but are not limited to, a diphenylphosphine group, a dibenzylphosphine group, a methylphenylphosphine group, a benzylhexylphosphine group, a bistrimethylsilylphosphine group, and the like.
  • the anionic group has a chemical bond with the structure of Formula 1, and the chemical bond may mean an ionic bond.
  • the anionic group is not particularly limited, and for example, US Patent No. 7,939,644, Japanese Patent Laid-Open No. 2006-003080, Japanese Patent Laid-Open 2006-001917, Japanese Patent Laid-Open No. 2005-159926, Japanese Patent Laid-Open No. 2007-7028897, Japan
  • the anions described in Japanese Patent Application Laid-Open No. 2005-071680, Korean Patent Application Publication No. 2007-7000693, Japanese Patent Application No. 2005-111696, Japanese Patent Application No. 2008-249663, and Japanese Patent Application No. 2014-199436 can be applied.
  • anionic group examples include trifluoromethanesulfonic acid anion, bis (trifluoromethylsulfonyl) amide anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, tetraphenylborate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tris trifluoromethane sulfonyl nilme suited to, SO 3 -, CO 2 - , SO 2 N - SO 2 CF 3, SO 2 N - SO 2 CF 2 CF 3, but include a halogen group such as fluorine group, an iodo group, a chlorine group, it is not limited thereto.
  • the anionic group may have an anion per se, or may exist in complex form with other cations. Therefore, the sum of the total charge of the compound molecules of the present invention may vary depending on the number of substituted anionic groups. For example, if Formula 1 includes an ammonium structure, the total charge of the molecule may have a value from an anion to 0 minus 1 from the number of substituted anionic groups since the ammonium structure has a cation. have.
  • the alkoxy group may be linear or branched, and the number of carbon atoms is not particularly limited, but may be 1 to 30, specifically 1 to 20, and more specifically 1 to 10.
  • the alkyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 1 to 60. According to an exemplary embodiment, the alkyl group has 1 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 1 to 10 carbon atoms.
  • the alkyl group examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group and n-jade And the like, but are not limited thereto.
  • the cycloalkyl group is not particularly limited, but preferably has 3 to 30 carbon atoms, and particularly preferably cyclopentyl group and cyclohexyl group, but is not limited thereto. .
  • the cycloalkyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms. Specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group and the like, but is not limited thereto.
  • the alkenyl group may be linear or branched chain, carbon number is not particularly limited, but is preferably 2 to 60. According to an exemplary embodiment, the alkyl group has 2 to 30 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 20 carbon atoms. According to another exemplary embodiment, the alkyl group has 2 to 10 carbon atoms. Specific examples of the alkenyl group include, but are not limited to, alkenyl groups substituted with aryl groups such as stylbenyl and styrenyl groups.
  • the cycloalkenyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to one embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 20 carbon atoms. According to another exemplary embodiment, the cycloalkyl group has 3 to 6 carbon atoms.
  • Examples of the cycloalkenyl group include, but are not limited to, a cyclopentenylene group and a cyclohexenylene group.
  • the aryl group is not particularly limited, but preferably has 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to an exemplary embodiment, the aryl group has 6 to 30 carbon atoms. According to an exemplary embodiment, the aryl group has 6 to 20 carbon atoms.
  • the aryl group may be a monocyclic aryl group, but may be a phenyl group, a biphenyl group, a terphenyl group, etc., but is not limited thereto.
  • the polycyclic aryl group may be naphthyl group, anthracenyl group, indenyl group, phenanthrenyl group, pyrenyl group, perrylenyl group, triphenyl group, chrysenyl group, fluorenyl group and the like, but is not limited thereto.
  • the fluorenyl group may be substituted, and two substituents may be bonded to each other to form a spiro structure.
  • Spirofluorenyl groups such as (9,9-dimethylfluorenyl group
  • Substituted fluorenyl groups such as (9,9-diphenylfluorenyl group
  • the present invention is not limited thereto.
  • the arylalkyl group may specifically include an aryl portion having 6 to 30 carbon atoms and an alkyl portion having 1 to 30 carbon atoms.
  • Specific examples include benzyl group, p-methylbenzyl group, m-methylbenzyl group, p-ethylbenzyl group, m-ethylbenzyl group, 3,5-dimethylbenzyl group, ⁇ -methylbenzyl group, ⁇ , ⁇ -dimethylbenzyl Group, ⁇ , ⁇ -methylphenylbenzyl group, 1-naphthylbenzyl group, 2-naphthylbenzyl group, p-fluorobenzyl group, 3,5-difluorobenzyl group, ⁇ , ⁇ -ditrifluoromethylbenzyl group , p-methoxybenzyl group, m-methoxybenzyl group, ⁇ -phenoxybenzyl group, ⁇ -benzyl groupoxybenzyl group,
  • the heterocyclic group is a heterocyclic group containing O, N or S as a hetero atom, and the carbon number is not particularly limited, but is 2 to 30 carbon atoms, specifically 2 to 20 carbon atoms.
  • the heterocyclic group include thiophene group, furan group, pyrrole group, imidazole group, thiazole group, oxazole group, oxadiazole group, triazole group, pyridyl group, bipyridyl group, triazine group, acridil group, pyridazine group , Quinolinyl group, isoquinoline group, indole group, carbazole group, benzoxazole group, benzoimidazole group, benzothiazole group, benzocarbazole group, benzothiophene group, dibenzothiophene group, benzofuranyl group, dibenzofuran And the like, but are not limited thereto.
  • heterocyclic group may be applied except that the heteroaryl group is aromatic.
  • the silyl group may be represented by a chemical formula of -SiZ1Z2Z3, wherein Z1, Z2 and Z3 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group.
  • Specific examples of the silyl group include trimethylsilyl group (TMS), triethylsilyl group, t-butyldimethylsilyl group, vinyldimethylsilyl group, propyldimethylsilyl group, triphenylsilyl group, diphenylsilyl group, and phenylsilyl group. It is not limited to this.
  • the alkyl sulfoxy group includes methyl sulfoxy group, ethyl sulfoxy group, propyl sulfoxy group, butyl sulfoxy group, and the like, but is not limited thereto.
  • the alkyl group in the alkyl sulfoxy group may be applied to the description of the alkyl group described above.
  • the boron group may be represented by the formula of -BW4W5, wherein W4 and W5 are each hydrogen; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group.
  • the boron group may include, but is not limited to, trimethylboron group, triethylboron group, t-butyldimethylboron group, triphenylboron group, and phenylboron group.
  • the acryloyl group means a photopolymerizable unsaturated group, and for example, (meth) acryloyl group may be mentioned, but is not limited thereto.
  • the acrylate group refers to a photopolymerizable unsaturated group, and examples thereof include (meth) acrylate groups, but are not limited thereto.
  • (meth) acryloyl represents at least 1 sort (s) chosen from the group which consists of acryloyl and methacryloyl.
  • the description of '(meth) acrylate' also has the same meaning.
  • the ether group may be represented by -COR.
  • R is a substituted or unsubstituted alkyl group.
  • the alkyl group may be applied to the description of the alkyl group described above.
  • the sulfonate group may be an alkylsulfonate group or an arylsulfonate group.
  • the description of the aforementioned alkyl group may be applied to the 'alkyl', and the description of the aforementioned aryl group may be applied to the 'aryl'.
  • the amine group is -NH 2 ; Alkylamine group; N-alkylarylamine group; Arylamine group; N-aryl heteroaryl amine group; It may be selected from the group consisting of an N-alkylheteroarylamine group and a heteroarylamine group, and carbon number is not particularly limited, but is preferably 1 to 30.
  • Specific examples of the amine group include methylamine group, dimethylamine group, ethylamine group, diethylamine group, phenylamine group, naphthylamine group, biphenylamine group, anthracenylamine group, and 9-methyl-anthracenylamine group.
  • Diphenylamine group N-phenylnaphthylamine group, ditolylamine group, N-phenyltolylamine group, triphenylamine group, N-phenylbiphenylamine group; N-phenylnaphthylamine group; N-biphenyl naphthylamine group; N-naphthylfluorenylamine group; N-phenylphenanthrenylamine group; N-biphenylphenanthrenylamine group; N-phenyl fluorenyl amine group; N-phenylterphenylamine group; N-phenanthrenyl fluorenyl amine group; N-biphenyl fluorenyl amine group and the like, but is not limited thereto.
  • the carbon number of the dianhydride group including the nitrogen atom is not particularly limited, but may be 4 to 30, specifically 4 to 20, and more specifically 4 to 15.
  • an alkylene group means that there are two bonding positions in an alkane.
  • the alkylene group may be straight, branched or cyclic.
  • carbon number of an alkylene group is not specifically limited, For example, it is C1-C30, Specifically, 1-20, More specifically, it is 1-10.
  • the heteroalkylene group means that there are two bonding positions in an alkane including O, N or S as a hetero atom.
  • the heteroalkylene group may be linear, branched or cyclic.
  • carbon number of a heteroalkylene group is not specifically limited, For example, it is C2-C30, Specifically, it is C2-C20, More specifically, it is C2-C10.
  • the arylene group refers to a divalent group having two bonding positions in the aryl group.
  • the description of the aforementioned aryl group can be applied except that they are each divalent.
  • the heteroarylene group means a divalent group having two bonding positions in the heteroaryl group.
  • the description of the aforementioned heteroaryl group can be applied except that they are each divalent.
  • L1 and L2 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group.
  • L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 30 carbon atoms.
  • L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 20 carbon atoms.
  • L1 and L2 of Chemical Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted linear or branched alkylene group having 1 to 10 carbon atoms.
  • L1 and L2 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methylene group; Substituted or unsubstituted ethylene group; Substituted or unsubstituted propylene group; Or a substituted or unsubstituted butylene group.
  • L1 and L2 of Formula 1 are the same as or different from each other, and each independently methylene group; Ethylene group; Propylene group; Or butylene group.
  • R1 and R2 of the general formula (1) are the same as or different from each other, and each independently an dianhydride group including a nitrogen atom having 4 to 30 carbon atoms.
  • R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 20 carbon atoms.
  • R1 and R2 of the general formula (1) are the same as or different from each other, and each independently a dianhydride group containing a nitrogen atom of 4 to 15 carbon atoms.
  • the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
  • X1, X2 and Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups combine to form a substituted or unsubstituted ring.
  • X1 and X2 may combine with each other to form a substituted or unsubstituted ring.
  • X1 and X2 are bonded to each other to form a substituted or unsubstituted benzene ring; Or a substituted or unsubstituted naphthalene ring.
  • X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or it may form a substituted or unsubstituted naphthalene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
  • X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
  • X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
  • X1 and X2 are combined with each other -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY; Or -SO 3 M; Or a naphthalene ring unsubstituted or substituted with -SO 2 NHY, wherein M is hydrogen; Na; K; Rb; Cs; Fr; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
  • the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted ring.
  • the Y1 and Y2; And Y2 and Y3 may combine to form a substituted or unsubstituted benzene ring.
  • the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or it may form a substituted or unsubstituted benzene ring with -SO 2 NHY, wherein M and Y are as defined in the formula (1).
  • the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted alkyl group.
  • the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is a substituted or unsubstituted n-hexyl group.
  • the Y1 and Y2; And Y2 and Y3 combine to form -SO 3 M; Or a benzene ring unsubstituted or substituted with -SO 2 NHY, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound containing an ammonium structure, wherein Y is an n-hexyl group substituted with an ethyl group.
  • the dianhydride group including the nitrogen atom may be represented by any one of the following substituents.
  • X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -SO 3 M; -SO 2 NHY; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
  • X3 to X5 and Y4 are the same as or different from each other, and each independently hydrogen; -SO 3 M; Or -SO 2 NHY, wherein M and Y are as defined in Formula 1, x3 is an integer of 0 to 4, x4, x5 and y4 is an integer of 0 to 6.
  • R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
  • R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
  • R3 and R4 of Formula 1 are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
  • R3 and R4 of Formula 1 are the same as or different from each other, and each independently a substituted or unsubstituted methyl group; Or a substituted or unsubstituted phenyl group.
  • R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; A methyl group substituted with a halogen group; Or a phenyl group.
  • R3 and R4 of Formula 1 are the same as or different from each other, and each independently a methyl group; Trifluoromethyl group (-CF 3 ); Or a phenyl group.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; Hydroxyl group; -COR; -COOR; Imide group; Amide group; Anionic group; A substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; A substituted or unsubstituted alkenyl group having 2 to 30 carbon atoms; A substituted or unsubstituted cycloalkenyl group having 3 to 30 carbon atoms; Substituted or unsubstituted sulfonate group; A substituted or unsubstituted amine group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon
  • R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; A substituted or unsubstituted cycloalkyl group having 3 to 30 carbon atoms; Or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted cycloalkenyl group; Substituted or unsubstituted aryl group; And a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group, and Y is a substituted or unsubstituted alkyl group.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a substituted or unsubstituted methyl group, wherein Y is a hexyl group unsubstituted or substituted with carbon of 1 to 10 carbon atoms.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a methyl group unsubstituted or substituted with a halogen group, and Y is a hexyl group unsubstituted or substituted with an ethyl group.
  • R5 to R12 of Formula 1 are the same as or different from each other, and each independently hydrogen; -SO 2 NHY; Or a trifluoromethyl group (-CF 3 ), and Y is a hexyl group substituted with an ethyl group.
  • R5 of Chemical Formula 1 is hydrogen; Or a trifluoromethyl group.
  • R6 of Chemical Formula 1 is hydrogen; -SO 2 NHY; Or a trifluoromethyl group, and Y is a hexyl group substituted with an ethyl group.
  • R7 of Formula 1 is hydrogen
  • R8 of Formula 1 is hydrogen
  • R9 of Formula 1 is hydrogen
  • R10 of Formula 1 is hydrogen
  • R11 of Formula 1 is hydrogen
  • R12 of Formula 1 is hydrogen
  • R13 to R17 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; -OH; -SO 3 -; -SO 3 H; -SO 3 M; -SO 2 NM1M2; -SO 2 NHY; -COOH; Anionic group; Substituted or unsubstituted alkyl group; A substituted or unsubstituted cycloalkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted heteroaryl group, wherein M is Na + ; K + ; Rb + ; Cs + ; Fr + ; And it is selected from the group consisting of a compound comprising an ammonium structure, wherein M1, M2 and Y are the same as or different from each other, each independently represent a substituted or unsubstituted alkyl group; Substituted or unsubstituted or unsubstitute
  • R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R 13 to R 17 is an anionic group.
  • R13 to R17 are the same as or different from each other, and each independently hydrogen; -SO 3 -; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above and at least one of R13 to R17 is —SO 3 — .
  • R13 is -SO 3 - a.
  • R14 is hydrogen
  • R15 is hydrogen; -SO 3 M; Or —SO 2 NHY, wherein M and Y are as defined above.
  • R16 is hydrogen
  • R17 is hydrogen
  • X is an anionic group.
  • X is an anion of a compound containing oxygen and at least one element selected from the group consisting of tungsten, molybdenum, silicon and phosphorus; Trifluoromethanesulfonic acid anion; Bis (trifluoromethylsulfonyl) amide anion; Bistrifluoromethanesulfonimide anion; Bisperfluoroethylsulfonimide anion; Tetraphenylborate anion; Tetrakis (4-fluorophenyl) borate; Tetrakis (pentafluorophenyl) borate; Tristrifluoromethanesulfonylmethide; And it is a compound selected from the group consisting of halogen groups.
  • X may be SO 3 ⁇ .
  • r5 and r6 are integers of 0 to 4, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
  • r5 and r6 are integers of 0 to 3, when r5 is 2 or more, R5 is the same as or different from each other, and when r6 is 2 or more, R6 is the same or different from each other.
  • r5 and r6 are integers of 0 to 2, when r5 is 2, R5 is the same as or different from each other, and when r6 is 2, R6 is the same or different from each other.
  • r5 and r6 are 0 or 1.
  • r5 and r6 are zero.
  • r5 and r6 are one.
  • Chemical Formula 1 may be represented by the following structures, the following structures represent an isomer of Formula 1, wherein Formula 1 represents a representative structure.
  • Isomers refer to molecules having the same molecular formula but different physical / chemical properties.
  • L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
  • -SO 3 M may mean that -SO 3 - and M is an ionic bond or a salt bond.
  • M is Na + ; K + ; Rb + ; Cs + ; Fr + ;
  • a compound including an ammonium structure and the compound including the ammonium structure may include a unit represented by the following Formula A or represented by the following Formula B.
  • Ra to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Substituted or unsubstituted arylalkyl group; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, wherein L 1 and L 2 is a substituted or unsubstituted alkylene group,
  • Rb to Rd are the same as or different from each other, and each independently hydrogen; Substituted or unsubstituted alkyl group; Substituted or unsubstituted alkenyl group; Substituted or unsubstituted aryl group; Or a substituted or unsubstituted arylalkyl group, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group; Substituted or unsubstituted arylene group; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group, and Re to Rg are the same as or different from each other, and each independently hydrogen; Or a substituted or unsubstituted alkyl group.
  • Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted
  • Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 30 carbon atoms; Substituted or unsubstituted aryl group having 6 to 30 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 30 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms; A substituted or unsubstituted arylene group having 6 to 30 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms
  • Ra to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms; -L 1 -NHCO-R; Or -L 2 -OCO-R, or two of Ra to Rd combine with each other to form a substituted or unsubstituted ring, wherein R is hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted
  • Rb to Rd are the same as or different from each other, and each independently hydrogen; A substituted or unsubstituted alkyl group having 1 to 20 carbon atoms; Substituted or unsubstituted alkenyl group having 1 to 20 carbon atoms; Substituted or unsubstituted aryl group having 6 to 20 carbon atoms; Or a substituted or unsubstituted arylalkyl group having 6 to 20 carbon atoms, or two of Rb to Rd combine with each other to form a substituted or unsubstituted ring, Z is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms; Substituted or unsubstituted arylene group having 6 to 20 carbon atoms; -L 3 -NHCO-; Or -L 4 -OCO-, wherein L 3 and L 4 is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms;
  • the unit means a repeating structure in which the monomer is included in the polymer, and the unit may be included in the main chain in the polymer to constitute the polymer.
  • the compound including a unit represented by Formula B may be a polymer.
  • the compound represented by the formula (B) may include within the range of 1 to 500.
  • the weight average molecular weight of the compound including the unit represented by Formula (B) may be 1000 to 10,000, preferably 3,000 to 8,000, more preferably 5,000 to 7,000.
  • the terminal of the compound containing a unit represented by the formula (B) is hydrogen; Halogen group; Or a substituted or unsubstituted alkyl group.
  • Chemical Formula 1 may be represented by the following Chemical Formula 2.
  • L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
  • Chemical Formula 1 may be represented by the following Chemical Formula 3.
  • L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
  • Chemical Formula 1 may be represented by the following Chemical Formula 4.
  • L1, L2, R1 to R17, X, a, r5 and r6 are the same as defined in Chemical Formula 1.
  • the dianhydride group including the nitrogen atom of Formula 1 may be a compound represented by any one of the following substituents.
  • X1, X2, Y1 to Y3 are the same as or different from each other, and each independently hydrogen; heavy hydrogen; Halogen group; Nitro group; -OH; -SO 3 H ;; -COOH; Phosphine groups; Anionic group; Substituted or unsubstituted alkyl group; Or a substituted or unsubstituted aryl group, or adjacent groups may be bonded to form a substituted or unsubstituted ring.
  • the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas.
  • M and Y are as defined in the formula (1).
  • the substituent in the ring of the formula is not specified means that the substituent may be substituted for any portion of the carbon included in the ring.
  • benzene ring substituted with -CF 3 it may be substituted with any one of carbons other than the carbon substituted with -SCH 3 , and may be represented by the following four structures.
  • naphthalene ring substituted with -SO 2 NHY it means that can be substituted with any one of the carbon included in the naphthalene, it can be represented by the following six structures.
  • Y is as defined above.
  • the color material composition may further include at least one of dyes and pigments in addition to the compound of Formula 1.
  • the colorant composition may include only the compound of Formula 1, but may include the compound of Formula 1 and one or more dyes, or may include the compound of Formula 1 and one or more pigments, or the compound of Formula 1 And at least one dye and at least one pigment.
  • the photosensitive resin composition is a compound represented by Formula 1; Binder resins; Polyfunctional monomers; Photoinitiators; And a solvent may be further included.
  • the binder resin is not particularly limited as long as it can exhibit physical properties such as strength, developability, and the like of the film made of the photosensitive resin composition.
  • the binder resin may use a copolymer resin of a polyfunctional monomer imparting mechanical strength and a monomer imparting alkali solubility, and may further include a binder generally used in the art.
  • Polyfunctional monomers to impart the mechanical strength of the membrane include unsaturated carboxylic acid esters; Aromatic vinyls; Unsaturated ethers; Unsaturated imides; And acid anhydrides.
  • unsaturated carboxylic acid esters include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, and isobutyl ( Meta) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetra Hydroperpril (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl ( Meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate
  • aromatic vinyls include styrene, ⁇ -methylstyrene, (o, m, p) -vinyl toluene, (o, m, p) -methoxy styrene, and (o, m, p) -chloro styrene. It may be selected from the group consisting of, but is not limited to these.
  • unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.
  • unsaturated imides are selected from the group consisting of N-phenyl maleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexyl maleimide It may be, but is not limited to these.
  • acid anhydride examples include maleic anhydride, methyl maleic anhydride, tetrahydro phthalic anhydride, and the like, but are not limited thereto.
  • the monomer which imparts the alkali solubility is not particularly limited as long as it contains an acid group.
  • the acid value of the binder resin is 50 to 130 KOH mg / g
  • the weight average molecular weight is 1,000 to 50,000.
  • the polyfunctional monomer is a monomer that forms a photoresist image by light, specifically, propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl glycol di Acrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethyleneglycol methacrylate, bisphenoxy ethylalcohol diacrylate, trishydroxyethylisocyanurate trimethacrylate, trimethyl 1 selected from the group consisting of propane trimethacrylate, diphenylpentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate and dipentaerythritol hexamethacrylate Species or a mixture of two or more thereof.
  • the photoinitiator is not particularly limited as long as it is an initiator that generates radicals by light to trigger crosslinking. It may be one or more kinds.
  • the acetophenone-based compound is 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenylketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin Butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholino-1-propan-1-one, 2-benzyl-2-dimethylamino -1- (4-morpholinophenyl) -butan-1-one, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one or 2-methyl-1- [4- (methylthio)
  • biimidazole-based compound 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4 , 4 ', 5,5'-tetrakis (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl) -4, 4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, It is not limited to this.
  • the triazine compound is 3- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ propionic acid, 1,1,1,3,3,3- Hexafluoroisopropyl-3- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ propionate, ethyl-2- ⁇ 4- [2,4 -Bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ acetate, 2-epoxyethyl-2- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazine-6 -Yl] phenylthio ⁇ acetate, cyclohexyl-2- ⁇ 4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio ⁇ acetate,
  • the oxime-based compound is 1,2-octadione, -1- (4-phenylthio) phenyl, -2- (o-benzoyloxime) (Shibagai Co., Shijiai 124), ethanone, -1- (9 -Ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime) (CGII242), N-1919 (Adeca Co.), and the like.
  • the solvent is acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether , Propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, chloroform, methylene chloride, 1,2-dichloroethane, 1,1,1-trichloroethane, 1 , 1,2-trichloroethane, 1,1,2-trichloroethene, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropano
  • the content of the compound represented by Formula 1 is 5% by weight to 60% by weight
  • the content of the binder resin is 1% by weight to 60% by weight %
  • the content of the photoinitiator is 0.1% to 20% by weight
  • the content of the multifunctional monomer is 0.1% to 50% by weight
  • the content of the solvent is 10% to 80% by weight.
  • the content of the compound represented by Formula 1 is 5% by weight to 60% by weight
  • the content of the binder resin is 1% by weight
  • the content of the photoinitiator is 0.1% to 20% by weight
  • the content of the multifunctional monomer is 0.1% to 50% by weight.
  • the photosensitive resin composition is based on the total weight of solids in the photosensitive resin composition, the content of the compound represented by Formula 1 is 5% by weight to 50% by weight, the content of the binder resin is 1% by weight to 50 Wt%, the content of the photoinitiator is 0.1% to 10% by weight, and the content of the multifunctional monomer is 0.1% to 45% by weight.
  • the total weight of the solid content means the sum of the total weight of the components excluding the solvent in the resin composition.
  • the weight percentages based on solids and solids of each component can be measured by common analytical means used in the art, such as liquid chromatography or gas chromatography.
  • the photosensitive resin composition may further include an additive.
  • the additive may further comprise 0.1% by weight to 20% by weight.
  • the content of the additive is 0.1 wt% to 20 wt% based on the total weight of solids in the photosensitive resin composition.
  • the content of the additive is 0.1 wt% to 10 wt% based on the total weight of solids in the photosensitive resin composition.
  • the photosensitive resin composition is 1 or 2 selected from the group consisting of photocrosslinking sensitizers, curing accelerators, antioxidants, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents.
  • photocrosslinking sensitizers curing accelerators, antioxidants, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents.
  • the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
  • the photosensitive resin composition may include one or two or more additives selected from the group consisting of photocrosslinking sensitizers, curing accelerators, adhesion promoters, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, dispersants, and leveling agents. Additionally included.
  • the content of the additive is 0.1% by weight to 20% by weight based on the total weight of solids in the photosensitive resin composition.
  • the photocrosslinking sensitizer is benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl Benzophenone compounds such as benzoate, 3,3-dimethyl-4-methoxybenzophenone, 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Thioxanthones such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone and diisopropyl thioxanthone compound; Xanthone compounds such as
  • the curing accelerator is used to increase the curing and mechanical strength, specifically 2-mercaptobenzoimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3 , 4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), pentaerythritol-tris (3-mercaptopropionate), penta Erythritol-tetrakis (2-mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), and trimethylolpropane-tris (3-mercaptopropio Nate) can be used one or more selected from the group consisting of.
  • methacryloyloxy propyltrimethoxy silane methacryloyloxy propyldimethoxy silane
  • methacryloyloxy propyltriethoxy silane methacryloyloxy propyldimethoxysilane
  • methacryloyl silane coupling agents such as these, can be selected and used, and at least 1 type can be selected from octyl trimethoxy silane, dodecyl trimethoxy silane, and octadecyl trimethoxy silane as an alkyl trimethoxy silane. You can choose to use it.
  • the surfactant is a silicone-based surfactant or a fluorine-based surfactant, specifically, the silicone-based surfactant is BYK-Chemie's BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307 , BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK -354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, and the like.
  • F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446 , F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F -486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF , TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc. may be used, but is not limited thereto.
  • the antioxidant may be one or more selected from the group consisting of hindered phenol antioxidants, amine antioxidants, thio antioxidants, and phosphine antioxidants, but is not limited thereto.
  • antioxidants include phosphoric acid thermal stabilizers such as phosphoric acid, trimethyl phosphate or triethyl phosphate; 2,6-di-t-butyl-p-cresol, octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, tetrabis [methylene-3- (3, 5-di-t-butyl-4-hydroxyphenyl) propionate] methane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxy Benzyl) benzene, 3,5-di-t-butyl-4-hydroxybenzylphosphite diethyl ester, 2,2-thiobis (4-methyl-6-t-butylphenol), 2,6-g, t-butylphenol 4,4'-butylidene-bis (3-methyl-6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-t-
  • UV absorbent 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxy benzophenone, etc. may be used, but is not limited thereto. All commonly used ones can be used.
  • thermal polymerization inhibitor examples include p-anisole, hydroquinone, pyrocatechol, t-butyl catechol, N-nitrosophenylhydroxyamine ammonium salt and N-nitrosophenylhydroxy Amine aluminum salt, p-methoxyphenol, di-t-butyl-p-cresol, pyroggarol, benzoquinone, 4,4-thiobis (3-methyl-6-t-butylphenol), 2,2- It may include one or more selected from the group consisting of methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole and phenothiazine, but is not limited thereto. It may include those generally known in the art.
  • the dispersant may be used as a method of internally adding to the pigment in the form of surface treatment of the pigment in advance or externally adding to the pigment.
  • a compound type, nonionic, anionic or cationic dispersant may be used, and examples thereof include fluorine, ester, cationic, anionic, nonionic and amphoteric surfactants. These can be used individually or in combination of 2 or more types.
  • the dispersant may be polyalkylene glycol and esters thereof, polyoxyalkylene polyhydric alcohols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonate salts, carboxylic acid esters, carboxylate salts, At least one selected from the group consisting of alkylamide alkylene oxide adducts and alkylamines is not limited thereto.
  • the leveling agent may be polymeric or nonpolymeric.
  • polymeric leveling agents include polyethyleneimine, polyamideamine, reaction products of amines and epoxides
  • nonpolymeric leveling agents include non-polymeric sulfur-containing and non-polymeric nitrogen-containing. Including but not limited to the compounds, all generally used in the art can be used.
  • a photosensitive material manufactured using the photosensitive resin composition is provided.
  • the photosensitive resin composition of this specification is apply
  • a spray method, a roll coating method, a spin coating method, etc. can be used, Generally, a spin coating method is used widely.
  • some residual solvent can be removed in some cases under reduced pressure.
  • Light sources for curing the photosensitive resin composition according to the present specification include, but are not limited to, mercury vapor arcs, carbon arcs, Xe arcs, etc., which emit light having a wavelength of 250 nm to 450 nm.
  • the photosensitive resin composition according to the present disclosure is a pigment-dispersed photosensitive material for manufacturing a thin film transistor liquid crystal display device (TFT LCD) color filter, a thin film transistor liquid crystal display device (TFT LCD) or a photosensitive material for forming a black matrix of an organic light emitting diode.
  • TFT LCD thin film transistor liquid crystal display device
  • TFT LCD thin film transistor liquid crystal display device
  • photosensitive material for forming a black matrix of an organic light emitting diode.
  • PDP plasma display panel
  • a color filter including the photosensitive material is provided.
  • the color filter may be prepared using the photosensitive resin composition including the compound represented by Chemical Formula 1.
  • the color filter may be formed by applying the photosensitive resin composition on a substrate to form a coating film and exposing, developing and curing the coating film.
  • the photosensitive resin composition according to the exemplary embodiment of the present specification is excellent in heat resistance, so that there is little change in color by heat treatment, thereby providing a color filter having high color reproducibility and high luminance and contrast ratio even during the curing process during the manufacture of the color filter. Can be.
  • the substrate may be a glass plate, a silicon wafer, a plate of a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
  • a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
  • the photosensitive resin composition according to an exemplary embodiment of the present specification may be spincoated on glass (5 ⁇ 5 cm 2 ), and subjected to prebake at 100 ° C. for 100 seconds to form a film. .
  • the distance between the substrate on which the film is formed and the photo mask is set to 250 um, and 40 mJ / cm 2 exposure dose is irradiated to the entire surface of the substrate using an exposure machine.
  • the exposed substrate may be developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
  • KOH potassium hydroxide
  • the heat resistance evaluation can be measured by the method described below.
  • the substrate manufactured according to the exemplary embodiment of the present invention obtains a transmittance spectrum of a visible light region in the range of 380 nm to 780 nm.
  • the prebake substrate is further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
  • the spectrometer may be that of MCPD-Otsuka, but is not limited thereto.
  • the color change (hereinafter, ⁇ Eab) is calculated using the obtained values E (L *, a *, b *).
  • ⁇ Eab ⁇ 3
  • E L *, a *, b *
  • the contrast ratio can be measured by the method described below.
  • the substrate produced according to the substrate manufacturing method was measured using a contrast ratio measuring device, and the luminance produced when two polarizing plates were orthogonal and the luminance when two polarizing plates were orthogonal to each other. To calculate the contrast ratio by the following formula (2).
  • Contrast ratio luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
  • the contrast ratio measuring instrument may be CT-1, ZOENTECH, but is not limited thereto.
  • Fluorescence intensity of the color filter according to an exemplary embodiment of the present specification is the substrate using the Sinco FS-2 fluorescence measuring apparatus at room temperature (25 °C), the excitation wavelength of 545nm, emission wavelength of 560nm to 720nm It can be measured.
  • the color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
  • the color filter may further include an overcoat layer.
  • a black pattern on a lattice called a black matrix can be disposed between the color pixels of the color filter for the purpose of improving contrast.
  • Chromium can be used as the material of the black matrix.
  • a method of depositing chromium over the entire glass substrate and forming a pattern by etching may be used.
  • a resin black matrix by a pigment dispersion method capable of fine processing can be used.
  • the black matrix may use a black pigment or a black dye as a colorant.
  • a black pigment or a black dye for example, carbon black may be used alone, or carbon black and coloring pigments may be used.
  • coloring pigments lacking light shielding properties may be mixed, even if the amount of colorant is increased, the strength of the film or the adhesion to the substrate may be reduced. There is no advantage.
  • a display device including a color filter according to the present specification.
  • the display device may be a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor.
  • the liquid crystal display device may be any one of a liquid crystal display (LCD-TFT) and a cathode ray tube (CRT).
  • A-1 5g (12.34mmol), B-1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • NMP N-methyl-2-pyrrolidone
  • RBF Round Bottom Flask
  • A-1 5g (12.34mmol), B-2 14.90g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • NMP N-methyl-2-pyrrolidone
  • RBF Round Bottom Flask
  • A-1 5g (12.34mmol), B-3 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred.
  • the mixture was heated to 150 ° C. and stirred for 4 hours.
  • the reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • A-1 5g (12.34mmol), B-4 1 10.31g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl) in 250ml 2-neck Round Bottom Flask (RBF) -2-pyrrolidone) 80g was added and stirred.
  • the mixture was heated to 150 ° C. and stirred for 4 hours.
  • the reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • A-1 5g (12.34mmol), B-5 14.30g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • NMP N-methyl-2-pyrrolidone
  • RBF Round Bottom Flask
  • A-1 5g (12.34mmol), B-6 15.33g (74.03mmol) and N-methyl-2-pyrrolidone (NMP, N-Methyl-) in 250ml 2-neck Round Bottom Flask (RBF) 2-pyrrolidone) 80g was added and stirred. The mixture was heated to 150 ° C. and stirred for 4 hours. The reaction solution was cooled to room temperature, and then poured into 800 ml of 1M hydrochloric acid (HCl) and stirred for 30 minutes.
  • NMP N-methyl-2-pyrrolidone
  • RBF Round Bottom Flask
  • Comparative Compound 1 3 g (4.553 mmol) of Comparative Compound 1 was dissolved in 50 g of 10% 98% sulfuric acid. Thereafter, 0.807 g (4.553 mmol) of N-hydroxymethylphthalimide was added thereto, and the temperature was raised to 45 ° C. and stirred for 2 hours. The reaction solution was added to 500 g of water to precipitate crystals, and the precipitate was filtered under reduced pressure to obtain Comparative Compound 4.
  • Example 1 the compound 1 was changed into the compound 2-18, and the photosensitive resin composition 2-18 was respectively manufactured by the same composition except that.
  • Comparative Compound 1 a copolymer of benzyl methacrylate and methacrylic acid with a binder resin (molar ratio 70:30, acid value of 113 KOH mg / g, weight average molecular weight 20,000 g measured by gel permeation chromatography (GPC)) / mol, molecular weight distribution (PDI) 2.0 g, solid content (SC) 25%, solvent polypropylene glycol monomethyl ether acetate (PGMEA) 10.376 g, photoinitiator as I-369 (BASF) 2.018 g, polyfunctional monomer
  • the photosensitive resin composition of Comparative Example 1 was prepared by mixing 12.443 g of DPHA, 68.593 g of solvent PGMEA (polypropylene glycol monomethyl ether acetate), and 1.016 g of DIC F-475 as an additive surfactant. .
  • Comparative Example 1 Comparative Compound 1 was changed to Comparative Compounds 2 to 4, except that the photosensitive resin compositions of Comparative Examples 2 to 4 were prepared with the same composition.
  • the photosensitive resin composition concerning Examples 1-18 and Comparative Examples 1-4 was used for the board
  • the distance between the substrate on which the film was formed and the photo mask was set at 250 um, and the exposure amount of 40 mJ / cm 2 was irradiated on the entire surface of the substrate using an exposure machine. Thereafter, the exposed substrate was developed in a developer (potassium hydroxide (KOH), 0.05%) for 60 seconds, and postbake at 230 ° C. for 20 minutes to prepare a substrate.
  • KOH potassium hydroxide
  • the substrate produced according to the substrate manufacturing method was obtained using a spectrometer (MCPD-Otsuka Co., Ltd.) to obtain a transmittance spectrum of the visible light range of 380nm to 780nm.
  • the prebake substrate was further postbake at 230 ° C. for 20 minutes to obtain transmittance spectra in the same equipment and measurement range.
  • a small ⁇ Eab value indicates excellent color heat resistance.
  • ⁇ Eab ⁇ 3 When ⁇ Eab ⁇ 3, it can be used as a color filter dye, and it can be said that it is a color material having excellent heat resistance.
  • the formula for calculating ⁇ Eab is as follows.
  • Example 1 1.28
  • Example 2 1.27
  • Example 3 0.85
  • Example 4 1.36
  • Example 5 1.75
  • Example 6 0.94
  • Example 7 1.45
  • Example 8 1.39
  • Example 9 1.12
  • Example 10 1.47
  • Example 11 1.68
  • Example 12 1.27
  • Example 13 0.97
  • Example 14 1.54
  • Example 15 1.98
  • Example 16 1.76
  • Example 17 1.64
  • Example 18 1.44
  • the color pattern substrate formed by using the photosensitive resin composition of Examples 1 to 18 of the present invention the difference in the transmittance spectrum ( ⁇ Eab) after the post-heat treatment and post-heat treatment is less than 3, the color stability It was confirmed that the heat resistance was very high because it is very small.
  • the substrate produced according to the substrate manufacturing method was put in between the two polarizing plates using a contrast ratio measuring instrument (CT-1, ZOENTECH Co., Ltd.) and the brightness when two polarizing plates are horizontal and two polarizing plates The brightness
  • Contrast ratio luminance when two polarizing plates are horizontal / luminance when two polarizing plates are vertical
  • Contrast ratio calculated by the above formula 2 was calculated by the following formula 3 contrast ratio improvement, it is shown in Table 2 below.
  • Contrast ratio improvement rate (Example contrast ratio-Comparative example 1, 2 or 4 contrast ratio) / Comparative example 1, 2 or 4 contrast ratio * 100)
  • the substrate produced according to the substrate fabrication method was measured at room temperature (25 ° C.) using a Sinco FS-2 fluorescence measuring apparatus, and the fluorescence intensity was measured using an excitation wavelength of 545 nm and an emission wavelength of 560 nm to 720 nm. It was.
  • the transmittance spectrum of the visible light range of 380 nm-780 nm was obtained with respect to the board
  • the blue color filter may exhibit better luminance when the maximum transmittance is high at 380 nm to 480 nm at luminous x, luminous y, and luminous z.

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Abstract

La présente invention concerne un composé représenté par la formule chimique 1, et une composition de résine photosensible, un matériau photosensible, un filtre coloré et un dispositif d'affichage comprenant chacun ledit composé.
PCT/KR2018/013706 2018-04-05 2018-11-12 Composé à base de xanthène, composition de résine photosensible, matériau photosensible, filtre coloré et dispositif d'affichage comprenant ledit composé WO2019194384A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201880084202.5A CN111527075B (zh) 2018-04-05 2018-11-12 呫吨系化合物及包含其的感光性树脂组合物、感光材料、滤色器、以及显示装置
JP2020533813A JP6940231B2 (ja) 2018-04-05 2018-11-12 キサンテン系化合物、これを含む感光性樹脂組成物、感光材、カラーフィルタ、およびディスプレイ装置

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KR10-2018-0039901 2018-04-05
KR20180039901 2018-04-05
KR1020180135250A KR102156478B1 (ko) 2018-04-05 2018-11-06 잔텐계 화합물, 이를 포함하는 감광성 수지 조성물, 감광재, 컬러필터, 및 디스플레이 장치
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN112980213A (zh) * 2019-12-17 2021-06-18 保土谷化学工业株式会社 呫吨色素、含有该色素的着色组合物、滤色器用着色剂及滤色器以及该色素的制造方法

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US4304834A (en) * 1979-12-26 1981-12-08 Polaroid Corporation Novel xanthene compounds and photographic products and processes employing the same
JPH09255882A (ja) * 1996-03-22 1997-09-30 Konica Corp キサンテン系色素及びそれを含有するインクジェット記録液
JP2016047907A (ja) * 2014-03-27 2016-04-07 富士フイルム株式会社 化合物、着色組成物、インクジェット記録用インク、インクジェット記録方法、インクジェットプリンタカートリッジ、インクジェット記録物、カラーフィルタ、カラートナー、及び転写用インク
KR20160149168A (ko) * 2015-06-17 2016-12-27 주식회사 엘지화학 잔텐계 화합물 및 이를 포함하는 감광성 수지 조성물
KR20180012094A (ko) * 2016-07-26 2018-02-05 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터

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Publication number Priority date Publication date Assignee Title
US4304834A (en) * 1979-12-26 1981-12-08 Polaroid Corporation Novel xanthene compounds and photographic products and processes employing the same
JPH09255882A (ja) * 1996-03-22 1997-09-30 Konica Corp キサンテン系色素及びそれを含有するインクジェット記録液
JP2016047907A (ja) * 2014-03-27 2016-04-07 富士フイルム株式会社 化合物、着色組成物、インクジェット記録用インク、インクジェット記録方法、インクジェットプリンタカートリッジ、インクジェット記録物、カラーフィルタ、カラートナー、及び転写用インク
KR20160149168A (ko) * 2015-06-17 2016-12-27 주식회사 엘지화학 잔텐계 화합물 및 이를 포함하는 감광성 수지 조성물
KR20180012094A (ko) * 2016-07-26 2018-02-05 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 컬러필터

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112980213A (zh) * 2019-12-17 2021-06-18 保土谷化学工业株式会社 呫吨色素、含有该色素的着色组合物、滤色器用着色剂及滤色器以及该色素的制造方法

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