TW201414880A - Substrate holding device - Google Patents

Substrate holding device Download PDF

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Publication number
TW201414880A
TW201414880A TW102124930A TW102124930A TW201414880A TW 201414880 A TW201414880 A TW 201414880A TW 102124930 A TW102124930 A TW 102124930A TW 102124930 A TW102124930 A TW 102124930A TW 201414880 A TW201414880 A TW 201414880A
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Taiwan
Prior art keywords
substrate
arm
holder
holding device
attachment
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TW102124930A
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Chinese (zh)
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TWI575114B (en
Inventor
Toshio Nara
Harumi Takematsu
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Plant Co Ltd I
Tokyo Kakoki Co Ltd
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Publication of TW201414880A publication Critical patent/TW201414880A/en
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Publication of TWI575114B publication Critical patent/TWI575114B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The topic of the present invention lies in providing a substrate holding device, which can hold the substrate without causing warpage at all of the areas of the substrate, and can be simply prepared under low costs. The above-mentioned substrate holding device 1 contains a toggle clamp 30 which is disposed alongside the edge part P1 of the substrate and clamps the edge part P1 of the substrate to hold the substrate, and which is characterized in that the toggle clamp 30, using the center P2 of the substrate P as the reference, is disposed into the opposite direction and presented as a radial shape to extend the above-mentioned substrate along the opposite direction at each opposite part and simultaneously hold the substrate P.

Description

基板保持裝置 Substrate holding device

本發明係關於基板的保持技術,其係關於一種基板保持裝置,適用於例如非電解的顯影處理、蝕刻處理、剝離處理或電解液覆蓋處理等的基板的水平搬送。 The present invention relates to a substrate holding technique for a substrate holding device which is suitable for horizontal transfer of a substrate such as an electroless development process, an etching process, a lift-off process, or an electrolyte cover process.

作為這種現有技術,公知有如下的專利文獻1所示的搬送系統(參照圖9)。 As such a conventional technique, the following transfer system (refer to FIG. 9) is disclosed.

該搬送系統100包括持握裝置101,該持握裝置101具有從基板W的內側和外側夾持基板的輥101a、101b。另外,持握裝置101在基板W的左、右兩側相互對向而設置。而且,如圖10所示,在輥101a、101b的間隙中插入基板W的狀態下,使各輥往相反的方向旋轉,則可將基板W拉入輥101a、101b內而進行持握。另外,對於持握裝置101、101,在基板的左、右其控制的方向為相反,基板W以其中心線W1為邊界,在沿左、右寬度方向拉伸。即,由於產生以中心線W1為邊界而相反的方向的拉力,故基板W可藉該拉力而不發生撓曲的被保持。 The transport system 100 includes a gripping device 101 having rollers 101a and 101b that sandwich a substrate from the inside and the outside of the substrate W. Further, the grip device 101 is disposed to face each other on the left and right sides of the substrate W. Further, as shown in FIG. 10, in a state where the substrate W is inserted into the gap between the rolls 101a and 101b, and the respective rolls are rotated in the opposite directions, the substrate W can be pulled into the rolls 101a and 101b and held. Further, with respect to the holding devices 101 and 101, the direction in which the control is performed on the left and right sides of the substrate is reversed, and the substrate W is stretched in the left and right width directions with the center line W1 as a boundary. That is, since the pulling force in the opposite direction with the center line W1 as a boundary is generated, the substrate W can be held by the pulling force without being bent.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1 日本特開第2010-529294號公報 Patent Document 1 Japanese Patent Laid-Open Publication No. 2010-529294

但是,在上述搬送系統100中,雖然以基板W的中心線W1為邊界,在其左、右寬度方向可抑制基板的撓曲,但是,在基板W的長邊方向拉力產生偏差,基板會產生波狀起伏。特別是,在供給電解液覆蓋處理等的水平搬送裝置中,由於因其撓曲,處理液殘留於基板上,故圖求在確保品質方面進行改善。 However, in the above-described transport system 100, the deflection of the substrate can be suppressed in the left and right width directions with the center line W1 of the substrate W as a boundary. However, the tensile force is generated in the longitudinal direction of the substrate W, and the substrate is generated. Wavy and undulating. In particular, in the horizontal transfer device that supplies the electrolytic solution covering treatment or the like, since the processing liquid remains on the substrate due to the deflection, it is desired to improve the quality.

另外,在上述搬送系統中,必須有用於分別驅動各輥的驅動裝置以及用於正確地控制各輥的旋轉量的控制裝置,但是,所述裝置複雜且價格昂貴。另外,由於處理液的附著,使輥的保持力發生變化,故無法獲得穩定的保持力,而必須定期更換和維修零件。 Further, in the above-described conveying system, it is necessary to have a driving device for driving each roller and a control device for accurately controlling the amount of rotation of each roller, but the device is complicated and expensive. Further, since the holding force of the roller changes due to the adhesion of the treatment liquid, a stable holding force cannot be obtained, and the parts must be periodically replaced and repaired.

本發明是在考慮了上述的技術課題而提出的,本發明的目的在於提供一種基板保持裝置,其可在使基板其全部區域不撓曲的情況下保持基板,並且可簡單而低價地製作。 The present invention has been made in view of the above-described technical problems, and an object of the present invention is to provide a substrate holding device capable of holding a substrate while the entire region of the substrate is not bent, and which can be easily and inexpensively produced.

為了實現上述目的,本發明採取如下構成。 In order to achieve the above object, the present invention takes the following constitution.

一種基板保持裝置,該基板保持裝置具有保持件,該保持件沿基板的邊緣部而設置,並且夾持該基板的邊緣部而保持基板,其特徵為:該保持件以上述基板的中心為基準,相對向且呈放射狀設置,在相對向部位,沿相反方向拉伸上述基板的同時夾持基板。 A substrate holding device having a holder that is disposed along an edge portion of the substrate and that holds an edge portion of the substrate to hold the substrate, wherein the holder is based on the center of the substrate The radiation is placed in a relatively radial direction, and the substrate is sandwiched while stretching the substrate in the opposite direction at the opposite portion.

在此,「基板」主要指印刷電路基板,但是其並不限於印刷電路基板,其係廣泛地包括比如薄膜、玻璃等的薄板狀的零件之概念。 Here, the "substrate" mainly refers to a printed circuit board, but it is not limited to a printed circuit board, and includes a concept of a thin plate-shaped member such as a film or glass.

按照上述構成的本發明,以基板的中心為基準,相對向且呈放射狀設置保持件。另外,由於在各相對向部位,沿相反方向拉伸基板的同時夾持基板,故在該相對向部位之間產生的張力以基板的中心為基準,沿相反方向作用。另外,由於保持件以基板的中心為基準呈放射狀設置,故在基板的各方向保持拉力的平衡,基板在其全部區域內不發生撓曲的情況下被保持。 According to the invention having the above configuration, the holder is provided in a radial direction with respect to the center of the substrate. Further, since the substrate is sandwiched while stretching the substrate in the opposite direction at each of the opposing portions, the tension generated between the opposing portions acts in the opposite direction with respect to the center of the substrate. Further, since the holder is radially provided with respect to the center of the substrate, the balance of the tensile force is maintained in each direction of the substrate, and the substrate is held without being deflected in all of the regions.

即,在本發明中,以基板的中心為基準,以點對稱的方式設置各保持件,保持基板的各方向的張力的平衡。 That is, in the present invention, each of the holders is provided in a point-symmetric manner with respect to the center of the substrate, and the balance of the tension in each direction of the substrate is maintained.

另外,上述保持件也可為,對該基板使角度可自由變更的方式設置的構成。 Further, the holder may be configured such that the angle of the substrate can be freely changed.

根據此構成,由於對基板可自由地改變保持件的角度,故即使在基板的外形尺寸改變的情況下,仍可將基準與基板的中心正確地對準。 According to this configuration, since the angle of the holder can be freely changed for the substrate, the reference can be correctly aligned with the center of the substrate even in the case where the outer shape of the substrate is changed.

又,上述保持件亦可為具有用於調整其保持力的保持力調整機構的構成。 Further, the holder may be configured to have a holding force adjustment mechanism for adjusting the holding force.

根據此構成,由於可在設置保持件的各部位分別調節基板的保持力,故可抑制由於保持力的差異所造成的拉力的偏差。 According to this configuration, since the holding force of the substrate can be adjusted in each of the portions where the holder is provided, variations in the tensile force due to the difference in the holding force can be suppressed.

此外,上述保持件也可為下述的構成,其具有用於夾持上述基板的臂,上述臂相對上述基板,以可從其表面側自由旋轉的方式設置。 Further, the holder may be configured to have an arm for holding the substrate, and the arm is provided to be rotatable from the surface side with respect to the substrate.

根據此構成,在臂旋轉而倒向基板側時,由於臂相對基板沿臂的延伸方向稍微錯開,故在本構成中,利用該「錯開」拉動基板。另外,由於利用在臂的旋轉時產生的「錯開」拉動基板,故可簡單而低價地製作。另外,在上面描述中,表面側與基板的內、外無關,僅指基板的面。 According to this configuration, when the arm is rotated and turned toward the substrate side, since the arm is slightly displaced from the substrate in the extending direction of the arm, in the present configuration, the substrate is pulled by the "stagger". Further, since the substrate is pulled by the "stagger" generated when the arm is rotated, it can be easily and inexpensively produced. In addition, in the above description, the surface side is independent of the inside and outside of the substrate, and refers only to the face of the substrate.

再者,其特徵為,在上述臂上設置與上述基板接觸的附件,其接觸面在沿上述臂的長邊方向的直線上呈圓弧狀鼓起。 Further, the arm is provided with an attachment that is in contact with the substrate, and the contact surface thereof is swelled in an arc shape on a straight line along the longitudinal direction of the arm.

按照具有這樣的表面形狀的附件,即使在附件和基板之間的角度發生改變的情況下,附件的邊緣仍不會鉤掛於基板上,另外,由於接觸點均錯開相對固定位置,故可在固定位置以良好的精度夾持基板。即,在基板和附件之間,沒有作用不合理的力,還能抑制保持位置的偏差。 According to the attachment having such a surface shape, even if the angle between the attachment and the substrate is changed, the edge of the attachment is not caught on the substrate, and since the contact points are staggered relative to the fixed position, The fixed position holds the substrate with good precision. That is, there is no unreasonable force acting between the substrate and the attachment, and variation in the holding position can be suppressed.

另外,其特徵為,上述臂可向遠離上述基板的方向開放,並且該開放時的臂的角度係相對基板的表面,以打開90°以上的方式而設定。 Further, the arm is openable in a direction away from the substrate, and the angle of the arm at the time of opening is set to be 90° or more with respect to the surface of the substrate.

根據此構成,由於相對基板的表面,臂打開90°以上,故可對本裝置,其正面側裝卸基板。 According to this configuration, since the arm is opened by 90 or more with respect to the surface of the substrate, the substrate can be attached or detached to the front side of the device.

此外,上述保持件亦可為肘節夾具。 In addition, the above retaining member may also be a toggle clamp.

即,由於肘節夾具具有增力機構,故通過採用肘節夾具,即使通過微小的力,仍可保持基板。 That is, since the toggle clamp has a boosting mechanism, by using the toggle clamp, the substrate can be held even by a slight force.

如上所述,按照本發明,其可在基板全部區域不發生撓曲的情況下保持基板,另外,可提供簡單且低價地製作的基板保持裝置。特別是,還具有廣泛地適用於實施強力的噴淋處理、強力的吹氣除液處理等的場合的優點。 As described above, according to the present invention, the substrate can be held without deflection in the entire area of the substrate, and a substrate holding device which is simple and inexpensive to manufacture can be provided. In particular, it has an advantage that it is widely applied to a case where a strong shower treatment, a strong air blower treatment, or the like is performed.

1‧‧‧基板保持裝置 1‧‧‧Substrate holder

2‧‧‧支架 2‧‧‧ bracket

30‧‧‧肘節夾具 30‧‧‧Toggle clamp

31‧‧‧固定臂 31‧‧‧Fixed Arm

32‧‧‧受動臂 32‧‧‧ by the boom

32a‧‧‧受動臂的支承軸 32a‧‧‧Supported shaft of the arm

33‧‧‧肘式機構 33‧‧‧Elbow mechanism

33a‧‧‧第1連杆 33a‧‧‧1st link

33b‧‧‧第2連杆 33b‧‧‧2nd link

33c‧‧‧滑動件 33c‧‧‧Sliding parts

34‧‧‧操作杆 34‧‧‧Operator

35‧‧‧受動臂側的附件 35‧‧‧Attachment on the arm side

35a‧‧‧附件的支承軸 35a‧‧‧Auxiliary shaft of the attachment

35b‧‧‧鎖定螺母 35b‧‧‧Lock nut

36‧‧‧固定臂側的附件 36‧‧‧Attachment on the fixed arm side

36a‧‧‧鎖定螺母 36a‧‧‧Lock nut

36b‧‧‧鎖定螺母 36b‧‧‧Lock nut

100‧‧‧搬送系統 100‧‧‧Transportation system

101‧‧‧持握裝置 101‧‧‧ Holding device

101a、101b‧‧‧輥 101a, 101b‧‧‧ Roll

P‧‧‧基板 P‧‧‧Substrate

P1‧‧‧基板的邊緣部 P1‧‧‧ edge of the substrate

P2‧‧‧基板的中心 The center of the P2‧‧‧ substrate

W‧‧‧基板 W‧‧‧Substrate

W1‧‧‧基板的中心線 The centerline of the W1‧‧‧ substrate

圖1為本實施型態所示的基板保持裝置的俯視圖;圖2為本實施型態所示的保持件的側視圖;圖3為表示圖2所示的保持件的開放狀態的側視圖;圖4為圖2所示的保持件的俯視圖;圖5為設置於保持件前端的附件的放大圖;圖6為表示本實施型態所示的附件和基板的接觸狀態的主要部分的放大圖;圖7為表示經過圖6的步驟,保持基板的狀態的主要部分的放大圖;圖8為表示作用於基板上的拉力的示意圖;圖9為表示現有的搬送系統的前視圖;圖10為組裝於現有的搬送系統中的輥的放大圖; 1 is a plan view of a substrate holding device of the present embodiment; FIG. 2 is a side view of the holder shown in the embodiment; FIG. 3 is a side view showing the opening of the holder shown in FIG. 4 is a plan view of the holder shown in FIG. 2; FIG. 5 is an enlarged view of the attachment provided at the front end of the holder; and FIG. 6 is an enlarged view showing a main part of the contact state of the attachment and the substrate shown in the present embodiment. Fig. 7 is an enlarged view showing a main portion of a state in which a substrate is held by the step of Fig. 6, Fig. 8 is a schematic view showing a tensile force acting on a substrate, and Fig. 9 is a front view showing a conventional transfer system; An enlarged view of a roller assembled in an existing conveying system;

下面參照附圖,對本發明的基板保持裝置1進行說明。 The substrate holding device 1 of the present invention will now be described with reference to the drawings.

本實施型態所示的基板保持裝置1如圖1所示,由框狀的支架2和肘節夾具30(保持件)所構成,該支架2 沿基板P的邊緣部P1而設置;該肘節夾具30以基板P的中心P2為基準相對向且呈放射狀設置。 As shown in FIG. 1, the substrate holding device 1 shown in this embodiment is composed of a frame-shaped holder 2 and a toggle clamp 30 (holder), which is 2 It is provided along the edge portion P1 of the substrate P; the toggle clamp 30 is radially opposed to the center P2 of the substrate P as a reference.

支架2由富含耐腐蝕性的金屬性的板所構成,其外形尺寸按照與搬送對象的基板P吻合的方式設計。另外,在支架2的各部位安裝肘節夾具30,通過該多個肘節夾具30將基板P保持於支架2內部。 The holder 2 is made of a metal plate rich in corrosion resistance, and its outer shape is designed to match the substrate P to be conveyed. Further, the toggle clamp 30 is attached to each portion of the bracket 2, and the substrate P is held inside the bracket 2 by the plurality of toggle clamps 30.

肘節夾具(在下面簡稱為夾具30)如圖2所示,包括:固定臂31,該固定臂31從內面側支承基板P;受動臂32,該受動臂32以可旋轉的方式支承該固定臂31;肘式機構33,該肘式機構33使該受動臂32朝向固定臂31按壓;操作杆34,該操作杆34與組裝於該肘式機構33中的連杆33a連接。另外形成下述的結構,其中,在固定臂31和受動臂32的前端組裝橡膠制的附件35、36,固定臂和受動臂31、32分別經由附件35、36,將基板P夾持於其前端部分。 As shown in FIG. 2, the toggle clamp (hereinafter simply referred to as the clamp 30) includes a fixed arm 31 that supports the substrate P from the inner surface side, and a driven arm 32 that rotatably supports the substrate The fixed arm 31 includes an elbow mechanism 33 that presses the driven arm 32 toward the fixed arm 31, and an operating lever 34 that is coupled to a link 33a assembled in the toggle mechanism 33. Further, a configuration is adopted in which rubber attachments 35 and 36 are assembled to the distal ends of the fixed arm 31 and the driven arm 32, and the fixed arm and the driven arms 31 and 32 are respectively clamped to the substrate P via the attachments 35 and 36. Front end part.

上述受動臂32以設置於其基端的支承軸32a為中心,以可旋轉的方式設置於固定臂31側。另外,受動臂32經由肘式機構33的連杆33a、33b與操作杆34連接,操作杆34的操作力經由肘式機構33,使受動臂32旋轉到固定臂31側。即,通過操作杆34的操作,受動臂32倒向基板P側。 The driven arm 32 is rotatably provided on the side of the fixed arm 31 around the support shaft 32a provided at the base end thereof. Further, the driven arm 32 is connected to the operating lever 34 via the links 33a and 33b of the toggle mechanism 33, and the operating force of the operating lever 34 is rotated by the toggle mechanism 33 to the fixed arm 31 side. That is, the driven arm 32 is turned toward the substrate P side by the operation of the operating lever 34.

另外,固定臂和受動臂31、32以及夾具30可使用例如金屬、樹脂而形成。 Further, the fixed arm and the driven arms 31, 32 and the jig 30 can be formed using, for example, metal or resin.

此外,對肘式機構33進行說明,該肘式機構33係使操作力倍增的連杆機構的一種,包括輸入操作力 的第1連杆33a;第2連杆33b,該第2連杆33b與該第1連杆33a連接,且其長度大於第1連杆;滑動件33c,該滑動件33c將第2連杆33b的運動轉換為直線運動。 Further, an elbow mechanism 33 which is one type of link mechanism that doubles the operating force, including an input operation force, will be described. The first link 33a; the second link 33b, the second link 33b is connected to the first link 33a, and has a longer length than the first link; the slider 33c, the slider 33c is the second link The motion of 33b is converted into a linear motion.

另外,該夾具30中,第1連杆33a和操作杆34成一體地設置,滑動件33c相當於受動臂32。此外,滑動件33c原本為進行直線運動的零件,但經由支承軸32a,以可旋轉的方式設置滑動件33c,由此,可將該直線運動轉換為旋轉運動。即,作為滑動件33c的受動臂32係通過操作杆34的操作而旋轉。 Further, in the jig 30, the first link 33a and the operating lever 34 are integrally provided, and the slider 33c corresponds to the driven arm 32. Further, the slider 33c is originally a component for linear movement, but the slider 33c is rotatably provided via the support shaft 32a, whereby the linear motion can be converted into a rotary motion. That is, the driven arm 32 as the slider 33c is rotated by the operation of the operating lever 34.

又,該連杆比係使輸入到該第1連杆33a中的操作力倍增的比例,如果對滑動件33c施加負荷,則可使大於該負荷的相反方向的力作用於該滑動件33c上。另外,由於操作力的倍增原理依據普通的“杠杆原理”,故在本說明書中省略其說明。 Further, the link ratio is such that the operating force input to the first link 33a is multiplied, and when a load is applied to the slider 33c, a force larger than the load in the opposite direction can be applied to the slider 33c. . In addition, since the principle of multiplication of the operating force is based on the ordinary "lever principle", the description thereof is omitted in the present specification.

接著,參照圖2和圖3對受動臂32進行說明。 Next, the driven arm 32 will be described with reference to Figs. 2 and 3 .

以可旋轉的方式設置於固定臂31上的受動臂32在倒向固定臂31側時,將基板P拉於夾具內側的同時倒入。即,由於在受動臂32旋轉時,相對固定臂31側的附件36,使受動臂32側的附件35在臂的延伸方向前後移動的同時進行旋轉,故在附件36、附件35之間,產生使基板P相對固定臂31進行前後運動的力。 When the driven arm 32 rotatably provided on the fixed arm 31 is turned to the side of the fixed arm 31, the substrate P is pulled while being pulled inside the jig. In other words, when the driven arm 32 rotates, the attachment 36 on the side of the fixed arm 31 is rotated relative to the attachment 36 on the side of the fixed arm 31 while moving forward and backward in the extending direction of the arm, so that it is generated between the attachment 36 and the attachment 35. The force that causes the substrate P to move back and forth relative to the fixed arm 31.

此外,與此有關,在本實施型態中,以在受動臂32和固定臂31之間夾持基板P的狀態為基準,以使夾具向內的力(圖2中的箭頭A)作用於基板P上的方式設定連杆的長度。即,由於基板P對固定臂31前後運 動的力係受動臂32的操作量達到一定量時會往相反的方向作用,故考慮這一點而決定連杆的長度。於是,夾持於受動臂32和固定臂31之間的基板P承受夾具向內的力,在被拉向於夾具內部的同時受到夾持。 Further, in connection with this, in the present embodiment, the force in which the jig is inward (arrow A in Fig. 2) acts on the basis of the state in which the substrate P is sandwiched between the driven arm 32 and the fixed arm 31. The length of the link is set in a manner on the substrate P. That is, since the substrate P is transported to the fixed arm 31 When the amount of movement of the movable arm 32 reaches a certain amount, it acts in the opposite direction, so the length of the link is determined in consideration of this. Then, the substrate P sandwiched between the driven arm 32 and the fixed arm 31 receives the force inward of the jig, and is clamped while being pulled toward the inside of the jig.

接著,參照圖5和圖7,對分別設置於固定臂和受動臂31、32的前端的附件35、36進行說明。另外,由於受動臂31側的附件35、與固定臂32側的附件36為相同結構,以相同方式組裝,故在下面以受動臂32側的附件35為主進行說明。 Next, the attachments 35 and 36 provided at the distal ends of the fixed arm and the driven arms 31 and 32 will be described with reference to Figs. 5 and 7 . In addition, since the attachment 35 on the side of the driven arm 31 and the attachment 36 on the side of the fixed arm 32 have the same configuration and are assembled in the same manner, the attachment 35 on the side of the driven arm 32 will be mainly described below.

附件35(36)由橡膠製成,在其中心部分設置支承軸35a(36a),該支承軸35a(36a)的外周上形成有螺紋。另外,附件35(36)經由支承軸35a(36a),與臂31(32)螺紋連接。此外,支承軸35a(36a)以上下貫通臂31(32)的方式設置(參照圖2),如果在將支承軸35a(36a)組裝於臂31(32)上的狀態使支承軸35a(36a)旋轉,則可調整附件35(36)的突出量。另外,圖5中的符號35b(36b)表示支承軸35a(36a)用的鎖定螺母。 The attachment 35 (36) is made of rubber, and a support shaft 35a (36a) is provided at a central portion thereof, and a thread is formed on the outer circumference of the support shaft 35a (36a). Further, the attachment 35 (36) is screwed to the arm 31 (32) via the support shaft 35a (36a). Further, the support shaft 35a (36a) is provided above and below the through arm 31 (32) (see Fig. 2), and if the support shaft 35a (36a) is assembled to the arm 31 (32), the support shaft 35a (36a) is provided. ) Rotate to adjust the amount of protrusion of the attachment 35 (36). Further, reference numeral 35b (36b) in Fig. 5 denotes a lock nut for supporting the shaft 35a (36a).

此外,橡膠製成的附件35(36)的前端呈半球面狀,與基板P的接觸狀態保持良好。另外,關於這一點,如果著眼於受動臂32的附件35,則即使在附件35的支承軸35a和基板P之間所成角度θ1變化的情況下,接觸角θ2(θ2<θ1)一般是保持在90°左右。由此,與附件35的角度無關,在基板P上始終作用有垂直方向的壓力。 Further, the front end of the attachment 35 (36) made of rubber has a hemispherical shape, and the contact state with the substrate P is kept good. Further, in this regard, if attention is paid to the attachment 35 of the driven arm 32, the contact angle θ2 (θ2 < θ1) is generally maintained even when the angle θ1 between the support shaft 35a of the attachment 35 and the substrate P is changed. At around 90°. Thereby, regardless of the angle of the attachment 35, a vertical pressure acts on the substrate P at all times.

關於此點,在本實施型態所示的夾具30中,由於將基板P拉到內側而夾持,故附件35的接觸角θ2 已成為極小而為銳角的方式設定。另外,作為將接觸角θ2設定在銳角側的方法,係使受動臂32側的附件35稍多地突出。 In this regard, in the jig 30 shown in this embodiment, since the substrate P is pulled to the inside and clamped, the contact angle θ2 of the attachment 35 is obtained. It has become a very small and sharp angle setting. Further, as a method of setting the contact angle θ2 on the acute angle side, the attachment 35 on the side of the driven arm 32 is slightly protruded.

即,在附件35與基板P之間所成的角度θ1滿足90°時,在該狀態,將附件35的支承軸35a向基板P側稍稍延伸,由此,其接點在基板邊緣部側錯開,附件35的接觸角θ2設定在銳角側。另外,如果根據該設定,將附件35與基板P之間所成的角度θ1保持在90°,則基板P在因該接點的錯開,沿夾具向內(圖7中的箭頭A方向)受到拉伸的同時,受到夾持。 In other words, when the angle θ1 formed between the attachment 35 and the substrate P satisfies 90°, the support shaft 35a of the attachment 35 is slightly extended toward the substrate P side in this state, whereby the contact is staggered on the side of the substrate edge portion. The contact angle θ2 of the attachment 35 is set on the acute angle side. Further, according to this setting, the angle θ1 between the attachment 35 and the substrate P is maintained at 90°, and the substrate P is received inward along the jig (in the direction of the arrow A in Fig. 7) due to the displacement of the contact. While being stretched, it is clamped.

另外,通過接觸角θ2的調整,基板P和附件35的接點也稍稍錯開,但是由於附件35的前端由半球形狀的橡膠製成,具有柔性,故通過附件35的微小變形,將其錯位吸收。由此,即使調整接觸角θ2,基板P仍可在不歪斜的情況下保持於附件35的中間處。 Further, by the adjustment of the contact angle θ2, the joints of the substrate P and the attachment 35 are also slightly shifted, but since the front end of the attachment 35 is made of hemispherical rubber and has flexibility, it is displaced by the slight deformation of the attachment 35. . Thereby, even if the contact angle θ2 is adjusted, the substrate P can be held in the middle of the attachment 35 without being skewed.

像這樣,在本實施型態中,由於具有可將基板P的接觸角θ2調整到任意值的附件35(36),故可將基板P的保持力在夾具各部位調整到所需的強度。 As described above, in the present embodiment, since the attachment 35 (36) can adjust the contact angle θ2 of the substrate P to an arbitrary value, the holding force of the substrate P can be adjusted to a desired strength at each portion of the jig.

此外,由於基板P的保持力與附件35(36)的緊固轉矩成比例,故如果通過扳手等對該緊固轉矩的數值進行管理,則可在各方向以更加良好的精度調節作用於基板P上的拉力。 Further, since the holding force of the substrate P is proportional to the tightening torque of the attachment 35 (36), if the value of the tightening torque is managed by a wrench or the like, the adjustment effect can be adjusted with better precision in each direction. The pulling force on the substrate P.

還有,像這樣構成的夾具30設置於支架2的各部位。設置於支架2的各部位的夾具30以基板P的中心P2為基準,相對向且呈放射狀設置。即,各夾具 30朝向基板P的中心P2而設置,並且以基板P的中心P2為基準,設置為點對稱。另外,各夾具30按照如圖4所示,對基板P而角度自由的方式設置,可以所需的角度而保持基板P。 Further, the jig 30 configured as described above is provided at each part of the holder 2. The jigs 30 provided at the respective portions of the holder 2 are radially opposed to each other with respect to the center P2 of the substrate P. That is, each fixture 30 is disposed toward the center P2 of the substrate P, and is set to be point symmetrical with respect to the center P2 of the substrate P. Further, each of the jigs 30 is provided so as to be free from the angle of the substrate P as shown in FIG. 4, and the substrate P can be held at a desired angle.

接著,對夾具30的操作方法進行說明。 Next, a method of operating the jig 30 will be described.

在打開夾具30時,拉起操作杆34(參照圖3),沿遠離固定臂31的方向,操作受動臂32。另外,打開時的臂角度以相對基板表面,成打開90°以上的方式設定。因此,由於在夾具30打開時,基板P的正面側的整個面打開,故容易進行基板P的更換。 When the jig 30 is opened, the operating lever 34 (see FIG. 3) is pulled up, and the driven arm 32 is operated in a direction away from the fixed arm 31. Further, the arm angle at the time of opening is set to be 90° or more in relation to the surface of the substrate. Therefore, since the entire surface of the front side of the substrate P is opened when the jig 30 is opened, the replacement of the substrate P is facilitated.

另外,如果通過設置在各部分上的夾具30夾持基板P的邊緣部P1,使操作杆34倒入,則基板P在以其中心為基準,向各方向拉伸的同時被保持。因此,相對基板P,在各方向產生拉力,基板P以在全部區域內不發生撓曲的情況下被保持。 Further, when the operation portion 34 is poured by sandwiching the edge portion P1 of the substrate P by the jig 30 provided on each portion, the substrate P is held while being stretched in all directions with respect to the center thereof. Therefore, a tensile force is generated in each direction with respect to the substrate P, and the substrate P is held without being deflected in all the regions.

此外,如上所述,基板P的保持力可分別設定於各個夾具上,由此,如圖8中的各箭頭A、B、W1(A>B>W1)所示,在基板P的相對向部位中,在其跨度大的部位設定較大的拉力,與此相反,在其跨度短的部位設定較小的拉力,由此,基板的全部區域中的拉力能以更加良好的精度保持平衡。如此,在本實施型態中,可在其全部區域內不發生撓曲的情況下保持基板P,另外,由於保持件採用零件數量少的夾具30,故可簡單且低價地製作。 Further, as described above, the holding force of the substrate P can be set to each of the jigs, respectively, whereby the relative directions of the substrates P are as shown by arrows A, B, and W1 (A>B>W1) in FIG. In the portion, a large pulling force is set at a portion where the span is large. On the contrary, a small pulling force is set at a portion where the span is short, whereby the tensile force in the entire region of the substrate can be balanced with more excellent precision. As described above, in the present embodiment, the substrate P can be held without being bent in all of the regions, and since the holder is made of the jig 30 having a small number of components, it can be easily and inexpensively produced.

尚且,上述實施型態僅是一個舉例,其細部可因應於各種樣式而改變。例如,在本實施型態中,以長方形的基板P為例而進行說明,但是,也可通過改變支架2的形狀,以對應圓形、長條形等各種形狀。又,保持件可採用具有增力機構的肘節夾具30,也可採用不具有增力機構的夾具。 Moreover, the above embodiment is merely an example, and the details thereof may vary depending on various styles. For example, in the present embodiment, the rectangular substrate P is described as an example. However, the shape of the holder 2 may be changed to correspond to various shapes such as a circular shape and an elongated shape. Further, the retaining member may be a toggle clamp 30 having a boosting mechanism, or a clamp having no boosting mechanism.

1‧‧‧基板保持裝置 1‧‧‧Substrate holder

2‧‧‧支架 2‧‧‧ bracket

30‧‧‧肘節夾具 30‧‧‧Toggle clamp

P‧‧‧基板 P‧‧‧Substrate

P1‧‧‧基板的邊緣部 P1‧‧‧ edge of the substrate

P2‧‧‧基板的中心 The center of the P2‧‧‧ substrate

Claims (7)

一種基板保持裝置,該基板保持裝置具有保持件,該保持件沿基板的邊緣部而設置,並且夾持該基板的邊緣部而保持基板,其特徵為:上述保持件以上述基板的中心為基準,呈相對向且放射狀配置,在各相對向部位,沿相反方向拉伸上述基板的同時夾持基板。 A substrate holding device having a holder that is disposed along an edge portion of the substrate and that holds an edge portion of the substrate to hold the substrate, wherein the holder is based on the center of the substrate The particles are arranged in a relatively radial direction, and the substrate is sandwiched while stretching the substrate in the opposite direction at each of the opposing portions. 如申請專利範圍第1項之基板保持裝置,其中,上述保持件係以對該基板能自由調整角度的方式設置。 The substrate holding device of claim 1, wherein the holder is provided to be freely adjustable in angle to the substrate. 如申請專利範圍第1或2項之基板保持裝置,其中,上述保持件具有用於調整其保持力的保持力調整機構。 The substrate holding device of claim 1 or 2, wherein the holder has a holding force adjustment mechanism for adjusting a holding force thereof. 如申請專利範圍第1至3項中任一項之基板保持裝置,其中,上述保持件具有用於夾持上述基板的臂;上述臂係對上述基板,以能從其表面側自由旋轉的方式設置。 The substrate holding device according to any one of claims 1 to 3, wherein the holder has an arm for holding the substrate; and the arm is rotatably movable from a surface side thereof to the substrate Settings. 如申請專利範圍第4項之基板保持裝置,其中,在上述臂上設置與上述基板接觸的附件,其接觸面在沿上述臂的長邊方向的直線上呈圓弧狀鼓起。 The substrate holding device according to claim 4, wherein the attachment to the substrate is provided on the arm, and a contact surface thereof is swelled in an arc shape on a straight line along a longitudinal direction of the arm. 如申請專利範圍第4或5項之基板保持裝置,其中,上述臂可於遠離上述基板的方向開放,並且其開放時的臂的角度係設定成相對基板表面打開90°以上。 The substrate holding device according to claim 4, wherein the arm is openable in a direction away from the substrate, and an angle of the arm when opened is set to be 90° or more with respect to the surface of the substrate. 如申請專利範圍第1至6項中的任一項之基板保持裝置,其中,上述保持件為肘節夾具。 The substrate holding device according to any one of claims 1 to 6, wherein the holder is a toggle clamp.
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KR20140048793A (en) 2014-04-24
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CN103726096B (en) 2016-07-06
JP2014080645A (en) 2014-05-08
CN103726096A (en) 2014-04-16

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