TW201412461A - Method of supplying injection grains in direct pressure abrasive blasting machine, and direct pressure abrasive blasting machine - Google Patents

Method of supplying injection grains in direct pressure abrasive blasting machine, and direct pressure abrasive blasting machine Download PDF

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TW201412461A
TW201412461A TW102126188A TW102126188A TW201412461A TW 201412461 A TW201412461 A TW 201412461A TW 102126188 A TW102126188 A TW 102126188A TW 102126188 A TW102126188 A TW 102126188A TW 201412461 A TW201412461 A TW 201412461A
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granular
granular body
buffer chamber
pressure
tank
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TW102126188A
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TWI577504B (en
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Shinji Kanda
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Elfo Tec Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C7/00Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
    • B24C7/0046Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a gaseous carrier
    • B24C7/0069Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a gaseous carrier with means for preventing clogging of the equipment or for preventing abrasive entering the airway

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Air Transport Of Granular Materials (AREA)

Abstract

This direct pressure abrasive blasting machine supplies fine grains to an injection nozzle without causing said grains to agglomerate. This direct pressure abrasive blasting machine (1) is provided with: a pressurization tank (11), a grain acceleration path (12) into which grains in the pressurization tank (11) are introduced; a grain supply tube (13) communicating between the grain acceleration path (12) and an injection nozzle (40); and a compressed gas supply source (not shown) for introducing a compressed gas (2) into the pressurization tank (11) and the grain acceleration path (12), wherein the pressure of the compressed gas introduced into the pressurization tank (11) and the grain acceleration path (12) is repeatedly fluctuated by at least a prescribed pressure difference. By means of these pressure fluctuations, the gas present in the gaps between the grains is repeatedly compressed and expanded, preventing agglomeration of the grains and ensuring flowability.

Description

直壓式噴珠加工裝置之噴射粒狀體供給方法及直壓式噴珠加工裝置 Spray granular material supply method and direct pressure type bead processing device for direct pressure type bead processing device

本發明係關於對設置於直壓式噴珠加工裝置之噴射噴嘴供給噴射粒狀體之方法、及用以實現上述方法之直壓式噴珠加工裝置。更詳細而言,本發明係關於適合用以在直壓式噴珠加工裝置中供給微粉之噴射粒狀體之粒狀體供給方法及直壓式噴珠加工裝置。 The present invention relates to a method of supplying a sprayed granule to an injection nozzle provided in a direct pressure type bead processing apparatus, and a direct pressure type bead processing apparatus for realizing the above method. More specifically, the present invention relates to a granular material supply method and a direct pressure type bead processing apparatus which are suitable for a sprayed granular body for supplying fine powder in a direct pressure type bead processing apparatus.

再者,於本發明中,「噴珠加工」除了包含噴砂處理、珠擊處理及噴丸加工以外,還包含為了使粒狀體本身或粒狀體之成分附著或擴散浸透於被加工物的表面而進行之粒狀體噴射等,與壓縮氣體一併噴射粒狀體而進行之全部加工或處理方法。 Further, in the present invention, the "bead processing" includes, in addition to the blasting treatment, the bead blasting treatment, and the shot peening, in order to adhere or diffuse the components of the granules or the granules to the workpiece. All of the processing or processing methods are performed by spraying the granular body together with the compressed gas, such as the granular body spraying performed on the surface.

於習知之一般之直壓式噴珠加工裝置中,如圖9所示,使具備粒狀體導入孔212a之管路貫通於加壓箱211底部之粒狀體之堆積位置,藉由該管路形成粒狀體加速路徑212。而且,上述直壓式噴珠加工裝置具備粒狀體供給裝置210,該粒狀體供給裝置210將來自未圖示之壓縮氣體供給源之壓縮氣體分別供給至上述加壓箱211與上述粒狀體加速路徑212的一端212',藉此,將加壓箱211內之粒狀體導入至粒狀體加速路徑212內,並且藉由流經粒狀體加速路徑212內之壓縮氣體流對該粒狀體進行加壓且使該粒狀體加速,將該粒狀體供給至噴射噴嘴。 In the conventional direct pressure type bead processing apparatus, as shown in FIG. 9, the pipe having the granular body introduction hole 212a is passed through the deposition position of the granular body at the bottom of the pressure tank 211, by the tube. The road forms a granular acceleration path 212. Further, the direct-pressure type bead processing apparatus includes a granular material supply device 210 that supplies compressed gas from a compressed gas supply source (not shown) to the pressurizing tank 211 and the granular material. One end 212' of the body acceleration path 212, whereby the granular body in the pressurized tank 211 is introduced into the granule acceleration path 212, and is passed through the flow of compressed gas flowing through the granule acceleration path 212. The granules are pressurized and the granules are accelerated, and the granules are supplied to the injection nozzle.

於圖8所示之例子中,此種具備粒狀體供給裝置210之直壓 式噴珠加工裝置200採用如下構成:使上述粒狀體加速路徑212的另一端212b經由粒狀體供給管213而連通於噴射噴嘴240,並且使收容有噴射噴嘴240之加工室230的漏斗233的下端經由粒狀體回收管237而連通於配置在加壓箱211上方之旋風分離器222,並且設置有對旋風分離器222內進行抽吸之集塵機238。 In the example shown in FIG. 8, such a direct pressure with the granular body supply device 210 is provided. The bead processing apparatus 200 is configured such that the other end 212b of the granular acceleration path 212 communicates with the injection nozzle 240 via the granular material supply pipe 213, and the funnel 233 that houses the processing chamber 230 of the injection nozzle 240 is provided. The lower end communicates with the cyclone separator 222 disposed above the pressurized tank 211 via the granular body recovery pipe 237, and is provided with a dust collector 238 that sucks the inside of the cyclone separator 222.

而且,於上述構成之直壓式噴珠加工裝置200中,若一面利用集塵機238對旋風分離器222內進行抽吸,一面自噴射噴嘴240噴射粒狀體,則自噴射噴嘴240噴射出之粒狀體會與對被加工物進行切削時所產生之切削粉等一併經由粒狀體回收管237,導入至配置於加壓箱211上方之旋風分離器222內。繼而,可藉由風力分選,將可再使用之粒狀體回收至設置於旋風分離器222底部之粒狀體箱229內,另一方面,可將切削粉等粉塵抽吸至集塵機238而將其除去。 Further, in the direct-pressure type bead processing apparatus 200 having the above-described configuration, when the inside of the cyclone 222 is sucked by the dust collector 238, the granular body is ejected from the ejection nozzle 240, and the particles ejected from the ejection nozzle 240 are ejected. The cutting body is introduced into the cyclone 222 disposed above the pressurized tank 211 via the granular body collecting pipe 237 together with the cutting powder or the like generated when the workpiece is cut. Then, the reusable granules can be recovered into the granule box 229 provided at the bottom of the cyclone 222 by wind sorting, and on the other hand, dust such as cutting powder can be sucked to the dust collector 238. Remove it.

而且,若加壓箱211內之粒狀體因噴射而耗盡,則在停止對加壓箱211及粒狀體加速路徑212導入壓縮氣體之後,打開設置於粒狀體箱229與加壓箱211間之放卸閥227,將藉由旋風分離器222而回收至粒狀體箱229內之粒狀體導入至加壓箱211內。其後,再次關閉上述放卸閥227,將壓縮氣體導入至加壓箱211與粒狀體加速路徑212內,藉此,可將加壓箱211內之粒狀體壓送至噴射噴嘴240而進行噴射。 When the granular material in the pressurizing tank 211 is exhausted by the ejection, the compressed gas is introduced into the pressurizing tank 211 and the granular acceleration path 212, and then the granular body box 229 and the pressurizing tank are opened. The 211 discharge valve 227 introduces the granular body collected in the granular container 229 by the cyclone 222 into the pressurized tank 211. Thereafter, the discharge valve 227 is closed again, and the compressed gas is introduced into the pressurized tank 211 and the granular acceleration path 212, whereby the granular body in the pressurized tank 211 can be pressure-fed to the injection nozzle 240. Spray.

於以上述方式構成之直壓式噴珠加工裝置20中,導入至加壓箱211內之粒狀體因加壓箱211內之壓力而被壓縮,因此,粒子彼此結合而達到穩定狀態,從而失去流動性。其結果,若設置於粒狀體加速路徑212之粒狀體導入孔212a上之粒狀體被搬出,則會於堆積之粒狀體中形成研缽 狀的孔,從而無法進一步將粒狀體導入至粒狀體加速路徑212,儘管加壓箱211內殘留有粒狀體,卻無法自噴射噴嘴240噴射出粒狀體。 In the direct-pressure type bead processing apparatus 20 configured as described above, the granular material introduced into the pressurizing tank 211 is compressed by the pressure in the pressurizing tank 211, so that the particles are coupled to each other to reach a stable state, thereby Loss of mobility. As a result, when the granular body provided on the granular body introduction hole 212a of the granular body acceleration path 212 is carried out, a mortar is formed in the deposited granular body. In the shape of the hole, the granular body cannot be further introduced into the granular body acceleration path 212, and although the granular body remains in the pressurized tank 211, the granular body cannot be ejected from the ejection nozzle 240.

因此,對於直壓式噴珠加工裝置200而言,為了防止粒狀體彼此結合並且凝聚而失去流動性,一般藉由設置於加壓箱211之敲擊器或振動器而施加振動,藉此確保粒狀體之流動性。 Therefore, in the direct-pressure type bead processing apparatus 200, in order to prevent the granular bodies from being bonded to each other and agglomerating and losing fluidity, vibration is generally applied by a tapper or a vibrator provided in the pressurizing tank 211. Ensure the fluidity of the granules.

然而,會產生如下問題:此種藉由敲擊器或振動器而施加振動之方法對於平均粒子徑超過10 μm之粒狀體而言有效果,但對於平均粒子徑為10 μm以下之粒狀體而言,由於各個粒狀體之質量小,若粒狀體之間因凡得瓦爾力而結合則難以分離,即使施加振動,凝聚之粒狀體亦會成塊地維持穩定狀態,從而產生粒狀體之供給不良。 However, there is a problem in that the method of applying vibration by a tap or a vibrator is effective for a granular body having an average particle diameter of more than 10 μm, but for a granular shape having an average particle diameter of 10 μm or less. In the body, since the mass of each granule is small, it is difficult to separate the granules due to the combination of the van der Waals force. Even if vibration is applied, the condensed granules will maintain a stable state in a block, thereby producing Poor supply of granules.

又,即使可供給粒狀體,由於粒狀體以凝聚而成之塊狀態自噴射噴嘴240噴出,因此,存在加工狀態產生偏差之問題。 In addition, even if the granular material can be supplied, since the granular body is ejected from the ejection nozzle 240 in a state of being aggregated, there is a problem that the processing state varies.

另一方面,近年來,隨著各種製品之小型輕量化,要求噴珠加工亦為微細且精密之加工,加工時所使用之粒狀體之粒徑進一步變小,並且要求提高加工精度,於利用習知之供給方法供給粒狀體之情形時,已無法對應於上述要求,因此,需要即便粒狀體為微粉,亦可順暢且確實地將定量之粒狀體供給至噴射噴嘴之直壓式噴珠加工裝置之噴射粒狀體供給方法。 On the other hand, in recent years, with the miniaturization and weight reduction of various products, it is required that the bead processing is also fine and precise processing, the particle size of the granular body used in the processing is further reduced, and the processing precision is required to be improved. When the granular material is supplied by a conventional supply method, the above requirements cannot be met. Therefore, even if the granular material is fine powder, it is necessary to smoothly and surely supply the quantitative granular material to the direct injection type of the spray nozzle. A method of supplying a granulated body of a bead processing apparatus.

為了解決如上所述之隨著使用微粉粒狀體而產生之問題,亦提出有如下方法:將壓縮空氣噴射口朝上地設置於加壓箱的底部,將壓縮空氣自該噴射口導入至加壓箱內,藉此,將槽內之粒狀體吹起,並且將已吹起之粒狀體與加壓箱內之壓縮氣體一併經由配置於噴射口上方之粒狀體 供給口搬出,且供給至噴射噴嘴(日本專利申請公開2003-25228(JP200325228A))。 In order to solve the problem associated with the use of the fine powder granules as described above, a method is also proposed in which the compressed air injection port is disposed upward at the bottom of the pressure tank, and the compressed air is introduced from the injection port to the addition. In the pressure box, the granular body in the tank is blown up, and the blown granular body and the compressed gas in the pressurized tank are passed through the granular body disposed above the ejection opening. The supply port is carried out and supplied to the injection nozzle (Japanese Patent Application Laid-Open No. 2003-25228 (JP200325228A)).

再者,雖與微粉粒狀體之供給無關,但已提出有如下定量供給裝置作為使用於直壓式噴珠加工裝置之粒狀體之定量供給裝置,該定量供給裝置於加壓箱的粒狀體層中設置有被部分掩埋之捕集轉盤,且將進入至該捕集轉盤的圓周面上所形成之計量用凹部而被捕集之粒狀體,自接近於捕集轉盤的圓周面而設置之粒狀體供給管的壓送口壓送至加壓箱外,藉此,可將定量之粒狀體供給至噴射噴嘴(JP2000326230A)。 Further, although it is not related to the supply of the fine powder granules, the following quantitative supply device has been proposed as a quantitative supply device for a granular body used in a direct pressure type bead processing device, and the quantitative supply device is used in a pressurized box. a granular body in which a partially-occluded collecting turntable is disposed and which is trapped into a measuring recess formed on a circumferential surface of the collecting turntable, is close to a circumferential surface of the collecting turntable The pressure feed port of the granular material supply tube is pressure-fed to the outside of the pressure tank, whereby the quantitative granular body can be supplied to the injection nozzle (JP2000326230A).

於‘228中所揭示之習知之粒狀體供給方法中,由於經由設置於加壓箱底部之噴射口將壓縮空氣導入至加壓箱,因此,藉由空氣流使堆積於噴射口上之粒狀體飛升擴散,並且於該狀態下,將粒狀體與加壓箱內之壓力一併經由配置於上述噴射口上方之供給口而搬出,因此,該習知之粒狀體供給方法可對噴射噴嘴順暢地供給噴射粒狀體。 In the conventional granular material supply method disclosed in '228, since the compressed air is introduced into the pressurized tank through the injection port provided at the bottom of the pressurized tank, the granularity deposited on the injection port by the air flow In this state, the granular body and the pressure in the pressurized tank are carried out together through the supply port disposed above the injection port. Therefore, the conventional granular body supply method can be applied to the spray nozzle. The sprayed granules are smoothly supplied.

然而,於該方法中,隨著殘存於加壓箱內之粒狀體之量減少,壓縮氣體中所含之粒狀體量(粒狀體濃度)亦減少,因此,導致對噴射噴嘴供給之粒狀體之供給量隨著時間而發生變化。 However, in this method, as the amount of the granules remaining in the pressurized tank is reduced, the amount of granules (granular body concentration) contained in the compressed gas is also reduced, thereby causing supply to the spray nozzle. The supply of granules changes with time.

又,如上所述,該方法係欲將在加壓箱內飛升且分散於圧縮空氣中之狀態下的粒狀體搬出至加壓箱外之方法,其無法與如‘230所揭示之定量地計量且搬送處於堆積狀態之粒狀體之定量供給裝置組合使用,難以總是以固定量正確地供給粒狀體。 Further, as described above, the method is a method of carrying out the granular body in a state of being lifted up in the pressurized tank and dispersed in the collapsed air to the outside of the pressurized tank, which cannot be quantitatively disclosed as disclosed in '230 The quantitative supply device that measures and transports the granular material in a stacked state is used in combination, and it is difficult to always supply the granular body with a fixed amount.

因此,本發明係為了消除上述先前技術之缺點而成之發明, 其目的在於提供即使於藉由較簡單之方法使用微粉粒狀體之情形時,亦可防止粒狀體凝聚而確保粒狀體之流動性之噴射粒狀體供給方法及噴射粒狀體供給裝置。 Accordingly, the present invention is an invention made to eliminate the disadvantages of the prior art described above. It is an object of the present invention to provide a sprayed granule supply method and a sprayed granule supply device which can prevent the granules from agglomerating and ensure the fluidity of the granules even when the fine granules are used in a relatively simple manner. .

以下,與用以實施發明之形態中所使用之符號一併記載用以解決問題之技術手段。該符號係用以使申請專利範圍之記載與用以實施發明之形態之記載之對應關係變得明確之符號,當然其並不限制性地用於解釋本申請案發明之技術範圍。 Hereinafter, the technical means for solving the problem will be described together with the symbols used in the embodiment for carrying out the invention. The symbol is used to clarify the correspondence between the description of the invention and the description of the form of the invention, and is not intended to limit the technical scope of the invention.

用以實現上述目的之本發明的直壓式噴珠加工裝置1之粒狀體供給方法,直壓式噴珠加工裝置1具備:加壓箱11;粒狀體加速路徑12,其導入有上述加壓箱11內之粒狀體;粒狀體供給管13,其使上述粒狀體加速路徑12與噴射噴嘴40連通;以及壓縮氣體供給源(未圖示),其將壓縮氣體2導入至上述加壓箱11及上述粒狀體加速路徑12;其特徵在於:使導入至上述加壓箱11及粒狀體加速路徑12之壓縮氣體之壓力以既定之壓力差,例如以0.03 MPa以上,且例如以1秒以下之間隔反復地變動。 In the granular material supply method of the direct pressure type bead processing apparatus 1 of the present invention for achieving the above object, the direct pressure type bead processing apparatus 1 includes a pressure tank 11 and a granular body acceleration path 12 into which the above-described introduction a granular body in the pressurizing tank 11; a granular body supply pipe 13 that communicates the granular body acceleration path 12 with the injection nozzle 40; and a compressed gas supply source (not shown) that introduces the compressed gas 2 to The pressurizing tank 11 and the granular acceleration path 12 are characterized in that the pressure of the compressed gas introduced into the pressurizing tank 11 and the granular acceleration path 12 is set to a predetermined pressure difference, for example, 0.03 MPa or more. Further, for example, it is repeatedly changed at intervals of 1 second or shorter.

上述任一種粒狀體供給方法均可以如下方式構成:以與上述加壓箱11內之粒狀體層或自上述加壓箱11擠出之粒狀體層相接觸之方式,配置輥142的外周面之一部分,該輥142於上述外周面上,以既定圖案形成有粒狀體捕集用的槽或孔,並且於上述輥142的外周面之旋轉軌跡上,形成有將相對於該輥142的外周面之切線方向作為長度方向之狹縫狀的上述粒狀體加速路徑12,藉由上述輥142之旋轉,定量地將捕集至上述輥142的外周面之粒狀體導入至上述粒狀體加速路徑12內。 Any of the above-described granular material supply methods may be configured such that the outer peripheral surface of the roller 142 is disposed in contact with the granular body layer in the pressurizing tank 11 or the granular body layer extruded from the pressurizing tank 11 In a part of the roller 142, a groove or a hole for collecting a granular body is formed in a predetermined pattern on the outer peripheral surface, and a rotation trajectory of the outer peripheral surface of the roller 142 is formed with respect to the roller 142. The tangential direction of the outer peripheral surface is the slit-shaped granular acceleration path 12 in the longitudinal direction, and the granular body collected on the outer peripheral surface of the roller 142 is quantitatively introduced into the granular shape by the rotation of the roller 142. The body accelerates within the path 12.

又,可設置連通於上述加壓箱11上之緩衝室21、與連通於上述緩衝室21上之粒狀體補充源(於圖示之例子中為旋風分離器)22,並且設置使上述加壓箱11與上述緩衝室21之間開閉之下側閥23、使上述緩衝室11與粒狀體補充源之間開閉之上側閥24、及對上述緩衝室21內進行加壓及排氣之緩衝室供排氣機構25;於將壓縮氣體導入至上述加壓箱11及粒狀體加速路徑12之過程中,藉由反復地進行一連串之動作而連續地將粒狀體導入至加壓箱11,上述一連串之動作係指自將來自上述下側閥23已關閉且上側閥24已打開之上述粒狀體補充源(旋風分離器)22之粒狀體導入至上述緩衝室21內之狀態(參照圖7之T1)起,於關閉上述上側閥24,且藉由上述緩衝室供排氣機構25將壓縮氣體導入至上述緩衝室21內並加壓之後(圖7之T2),打開上述下側閥23,使上述緩衝室21內之粒狀體落下至上述加壓箱11內(圖7之T3),其後,於再次關閉上述下側閥23,且藉由上述緩衝室供排氣機構25釋放上述緩衝室21內之壓縮氣體之後(圖7之T4),使上述上側閥24開放,將上述粒狀體補充源22內之粒狀體導入至上述緩衝室21內。 Further, a buffer chamber 21 that communicates with the pressure tank 11 and a granular material supplement source (in the illustrated example, a cyclone separator) 22 that communicates with the buffer chamber 21 may be provided, and the above-described addition may be provided. The lower side valve 23 is opened and closed between the pressure tank 11 and the buffer chamber 21, the upper side valve 24 is opened and closed between the buffer chamber 11 and the granular body replenishing source, and the inside of the buffer chamber 21 is pressurized and exhausted. The buffer chamber supply and exhaust mechanism 25; in the process of introducing the compressed gas into the pressurizing tank 11 and the granular acceleration path 12, continuously introducing the granular body into the pressurizing tank by repeating a series of operations 11. The above-described series of operations refers to a state in which the granular body of the granular body replenishing source (cyclone) 22 from which the lower side valve 23 is closed and the upper side valve 24 is opened is introduced into the buffer chamber 21. (refer to T1 of FIG. 7), after the upper side valve 24 is closed, and the compressed gas is introduced into the buffer chamber 21 by the buffer chamber supply and exhaust mechanism 25 and pressurized (T2 of FIG. 7), the above is opened. The lower side valve 23 causes the granular body in the buffer chamber 21 to fall to the pressurizing tank 1 1 (T3 of FIG. 7), after which the lower side valve 23 is closed again, and after the buffer chamber supply and exhaust mechanism 25 releases the compressed gas in the buffer chamber 21 (T4 of FIG. 7), The upper side valve 24 is opened, and the granular body in the granular body replenishing source 22 is introduced into the buffer chamber 21.

又,實現上述粒狀體供給方法之本發明之直壓式噴珠加工裝置1具備:加壓箱11:粒狀體加速路徑12,其導入有上述加壓箱11內之粒狀體;粒狀體供給管13,其使上述粒狀體加速路徑12與噴射噴嘴40連通;以及壓縮氣體供給源,其將壓縮氣體2導入至上述加壓箱11及上述粒狀體 加速路徑12;其特徵在於:設置有壓力變動機構(未圖示),使導入至上述加壓箱11及粒狀體加速路徑12之壓縮氣體之壓力以既定之壓力差以上反復地變動。 Further, the direct pressure type bead processing apparatus 1 of the present invention for realizing the above-described method of supplying a granular material includes a pressurizing tank 11: a granular body acceleration path 12 into which a granular body in the pressurizing tank 11 is introduced; a shape supply pipe 13 that communicates the granular body acceleration path 12 with the injection nozzle 40, and a compressed gas supply source that introduces the compressed gas 2 to the pressure tank 11 and the granular body The acceleration path 12 is characterized in that a pressure fluctuation mechanism (not shown) is provided, and the pressure of the compressed gas introduced into the pressure tank 11 and the granular body acceleration path 12 is repeatedly changed by a predetermined pressure difference or more.

於上述構成之直壓式噴珠加工裝置1中,可於上述加壓箱11與上述粒狀體供給管13之間設置定量供給裝置14,該定量供給裝置14具備:導入路徑14a,其連通於上述加壓箱11的出口11a;圓形輥室14b,其與上述導入路徑14a連通;外殼141,其於內部形成有狹縫狀的上述粒狀體加速路徑12,該狹縫狀的上述粒狀體加速路徑12沿著相對於上述輥室14b的外周之切線方向延伸且與上述輥室14b連通;以及輥142,其於外周面上,以既定圖案形成有粒狀體捕集用的槽或孔,且於上述輥室14b內旋轉。 In the direct pressure type bead processing apparatus 1 having the above configuration, a quantitative supply device 14 may be provided between the pressure tank 11 and the granular material supply tube 13, and the quantitative supply device 14 may include an introduction path 14a for communication. The outlet 11a of the pressurizing tank 11; the circular roll chamber 14b communicating with the introduction path 14a; and the outer casing 141 having a slit-shaped granular acceleration path 12 formed therein. The granular body acceleration path 12 extends in a tangential direction with respect to the outer circumference of the roll chamber 14b and communicates with the above-described roll chamber 14b, and a roller 142 which is formed on the outer peripheral surface with a predetermined pattern to form a granular body for collecting a groove or a hole and rotating in the above-described roll chamber 14b.

進而,亦可採用如下構成:設置有連通於上述加壓箱11上之緩衝室21、與連通於上述緩衝室21上之粒狀體補充源(旋風分離器)22,並且設置有使上述加壓箱11與上述緩衝室21之間開閉之下側閥23、使上述緩衝室11與粒狀體補充源之間開閉之上側閥24、及對上述緩衝室21內進行加壓及排氣之緩衝室供排氣機構25;且設置有由微控制器等電子控制裝置構成之控制機構26,該控制機構26於將壓縮氣體導入至上述加壓箱11及粒狀體加速路徑12之過程中,控制上述上側及下側閥23、24以及緩衝室供排氣機構25之動作,且進行一連串之動作,上述一連串之動作係指自上述下側閥23已關閉且上側閥24已打開之狀態起,於關閉上述上側閥24,且藉由上述緩衝室供排氣機構25將壓縮氣體導 入至上述緩衝室21內並加壓之後,打開上述下側閥23,使上述緩衝室21內之粒狀體落下至上述加壓箱11內,其後,於再次關閉上述下側閥23,且藉由上述緩衝室供排氣機構25釋放上述緩衝室21內之壓縮氣體之後,使上述上側閥24開放,將上述粒狀體補充源22內之粒狀體導入至上述緩衝室21內。 Further, a configuration may be adopted in which a buffer chamber 21 that communicates with the pressurizing tank 11 and a particulate replenishing source (cyclone) 22 that communicates with the buffer chamber 21 are provided, and the above-described addition is provided. The lower side valve 23 is opened and closed between the pressure tank 11 and the buffer chamber 21, the upper side valve 24 is opened and closed between the buffer chamber 11 and the granular body replenishing source, and the inside of the buffer chamber 21 is pressurized and exhausted. a buffer chamber supply and exhaust mechanism 25; and a control mechanism 26 composed of an electronic control device such as a microcontroller, which is configured to introduce compressed gas into the pressurizing tank 11 and the particulate acceleration path 12 Controlling the operations of the upper and lower valves 23, 24 and the buffer chamber supply and exhaust mechanism 25, and performing a series of operations, the series of operations refer to a state in which the lower valve 23 is closed and the upper valve 24 is opened. Starting, the upper side valve 24 is closed, and the compressed gas is guided by the buffer chamber supply and exhaust mechanism 25 After being introduced into the buffer chamber 21 and pressurized, the lower valve 23 is opened, the granular body in the buffer chamber 21 is dropped into the pressurizing tank 11, and thereafter, the lower valve 23 is closed again. After the compressed air in the buffer chamber 21 is released by the buffer chamber supply and exhaust mechanism 25, the upper valve 24 is opened, and the granular material in the granular material supplement source 22 is introduced into the buffer chamber 21.

藉由以上所說明之本發明之構成,根據本發明之直壓式噴珠加工裝置之粒狀體供給方法、及實施上述方法之直壓式噴珠加工裝置1,可獲得以下顯著效果。 According to the configuration of the present invention described above, according to the granular material supply method of the direct pressure type bead processing apparatus of the present invention and the direct pressure type bead processing apparatus 1 which performs the above method, the following remarkable effects can be obtained.

使導入至加壓箱11及粒狀體加速路徑12之壓縮氣體以既定之壓力差以上反復地變動,藉此,存在於粒狀體P之間的間隙S中之氣體以如下方式發揮作用,即,於加壓時受到壓縮,而於減壓時膨脹,從而使欲結合之粒狀體P之間的間隙S對抗凡得瓦爾力而擴張。因此,藉由使導入至加壓箱11及粒狀體加速路徑12內之壓縮氣體之壓力反復地變動,即使於使用微粉粒狀體之情形時,因粒狀體之間的氣體反復地膨脹、壓縮而不會產生凝聚,從而可確保粒狀體之流動性。 The compressed gas introduced into the pressurizing tank 11 and the granular body acceleration path 12 is repeatedly changed by a predetermined pressure difference or more, whereby the gas existing in the gap S between the granular bodies P functions as follows. That is, it is compressed at the time of pressurization, and expands under reduced pressure, so that the gap S between the granular bodies P to be joined expands against the van der Waals force. Therefore, by repeatedly changing the pressure of the compressed gas introduced into the pressurizing tank 11 and the granular body accelerating path 12, the gas between the granules is repeatedly expanded even when the fine granules are used. It is compressed without causing agglomeration, thereby ensuring the fluidity of the granules.

尤其,於將上述壓力差設定為0.03 MPa以上之情形時,可更確實地發揮防止凝聚之效果。 In particular, when the pressure difference is set to 0.03 MPa or more, the effect of preventing aggregation can be more surely exhibited.

又,以1秒以下之間隔進行上述壓力變動,藉此,亦可確實地防止於壓力變動與壓力變動之間歇中產生暫時之凝聚。 Further, by performing the pressure fluctuation at intervals of 1 second or less, it is possible to reliably prevent temporary aggregation in the interval between the pressure fluctuation and the pressure fluctuation.

再者,本發明之噴珠加工裝置係將積存於加壓箱11底部之狀態下的粒狀體供給至噴射噴嘴40,因此,可於加壓箱11與粒狀體供給管13之間設置上述定量供給裝置14,將經正確計量之粒狀體供給至噴射噴嘴40,上述定量供給裝置14具備於外周面具有粒狀體捕集用的槽或孔之輥142。 Further, in the bead processing apparatus of the present invention, the granular body stored in the state of the bottom of the pressurizing tank 11 is supplied to the injection nozzle 40, so that it can be disposed between the pressurizing tank 11 and the granular material supply pipe 13. The quantitative supply device 14 supplies the accurately measured granular material to the injection nozzle 40, and the quantitative supply device 14 includes a roller 142 having a groove or a hole for collecting the granular body on the outer peripheral surface.

進而,如下之構成可一面將加壓箱11內維持為加壓狀態,一面將來自粒狀體補充源22之粒狀體供給至加壓箱內,該構成設置有連通於上述加壓箱11上之緩衝室21、與連通於上述緩衝室21上之粒狀體補充源(旋風分離器)22,並且設置有使上述加壓箱11與上述緩衝室21之間開閉之下側閥23、使上述緩衝室21與粒狀體補充源22之間開閉之上側閥24、對上述緩衝室21內進行加壓及排氣之緩衝室供排氣機構25、及控制該等構件之動作之控制機構26。進而,可不中斷由噴射噴嘴40進行之粒狀體之噴射而連續地將粒狀體導入至加壓箱11。 Further, the configuration is such that the granular body from the granular body replenishing source 22 is supplied to the pressurizing tank while maintaining the inside of the pressurizing tank 11 in a pressurized state, and the configuration is provided to communicate with the pressurizing tank 11 a buffer chamber 21, a particulate replenishing source (cyclone) 22 connected to the buffer chamber 21, and a side valve 23 for opening and closing between the pressurizing tank 11 and the buffer chamber 21, Opening and closing the upper side valve 24 between the buffer chamber 21 and the granular body replenishing source 22, the buffer chamber supply and exhaust mechanism 25 for pressurizing and exhausting the inside of the buffer chamber 21, and controlling the operation of the members Agency 26. Further, the granular body can be continuously introduced into the pressurizing tank 11 without interrupting the ejection of the granular body by the spray nozzle 40.

1‧‧‧(直壓式)噴珠加工裝置 1‧‧‧(Direct pressure type) bead processing device

2‧‧‧壓縮氣體(粒狀體加壓用) 2‧‧‧Compressed gas (for granular pressurization)

3‧‧‧壓縮氣體(粒狀體搬送用) 3‧‧‧Compressed gas (for granular transport)

10‧‧‧粒狀體供給裝置 10‧‧‧Party body supply device

11‧‧‧加壓箱 11‧‧‧ Pressurized box

11a‧‧‧出口 11a‧‧‧Export

12‧‧‧粒狀體加速路徑(狹縫) 12‧‧‧Grain body acceleration path (slit)

13‧‧‧粒狀體供給管 13‧‧‧Grain body supply tube

13a‧‧‧(粒狀體供給管的)一端 13a‧‧‧ (one end of the granular supply tube)

13b‧‧‧(粒狀體供給管的)另一端 13b‧‧‧ (the other end of the granule supply tube)

14‧‧‧定量供給裝置 14‧‧‧Quantitative supply device

14a‧‧‧導入路徑 14a‧‧‧Importing path

14b‧‧‧輥室 14b‧‧‧ Roll Room

141‧‧‧外殼 141‧‧‧ Shell

142‧‧‧輥 142‧‧‧roll

20‧‧‧粒狀體補充機構 20‧‧‧Grain body supplementation mechanism

21‧‧‧緩衝室 21‧‧‧ buffer room

22‧‧‧旋風分離器(粒狀體補充源) 22‧‧‧Cyclone separator (granular body supplement source)

23‧‧‧下側閥 23‧‧‧Bottom valve

24‧‧‧上側閥 24‧‧‧Upper valve

25‧‧‧緩衝室供排氣機構 25‧‧‧buffer room supply and exhaust mechanism

26‧‧‧控制機構 26‧‧‧Control agency

27‧‧‧放卸閥 27‧‧‧Dumping valve

28‧‧‧振動器 28‧‧‧Vibrator

29‧‧‧粒狀體箱 29‧‧‧Grain box

30‧‧‧加工室 30‧‧‧Processing room

33‧‧‧漏斗 33‧‧‧ funnel

37‧‧‧粒狀體回收管 37‧‧‧Grain recovery tube

38‧‧‧集塵機 38‧‧‧ dust collector

39‧‧‧輸送機 39‧‧‧Conveyor

40‧‧‧噴射噴嘴 40‧‧‧jet nozzle

P‧‧‧粒狀體 P‧‧‧Grain

S‧‧‧間隙 S‧‧‧ gap

200‧‧‧(直壓式)噴珠加工裝置 200‧‧‧(Direct pressure type) bead processing device

210‧‧‧粒狀體供給裝置 210‧‧‧Grain body supply device

211‧‧‧加壓箱 211‧‧‧pressure box

212‧‧‧粒狀體加速路徑 212‧‧ ‧ granule acceleration path

212a‧‧‧粒狀體導入孔 212a‧‧‧granular body introduction hole

212'‧‧‧(粒狀體加速路徑的)一端 212'‧‧‧ (one end of the granulocyte acceleration path)

212b‧‧‧(粒狀體加速路徑的)另一端 212b‧‧‧ (the end of the granulocyte acceleration path)

213‧‧‧粒狀體供給管 213‧‧‧granular body supply tube

222‧‧‧旋風分離器 222‧‧‧Cyclone separator

227‧‧‧放卸閥 227‧‧‧Dumping valve

229‧‧‧粒狀體箱 229‧‧‧Grain box

230‧‧‧加工室 230‧‧‧Processing room

233‧‧‧漏斗 233‧‧‧ funnel

237‧‧‧粒狀體回收管 237‧‧‧granular body recovery tube

238‧‧‧集塵機 238‧‧‧ dust collector

240‧‧‧噴射噴嘴 240‧‧‧jet nozzle

圖1係應用了本發明之粒狀體供給方法之直壓式噴珠加工裝置之概略說明圖。 Fig. 1 is a schematic explanatory view of a direct pressure type bead processing apparatus to which a granular material supply method of the present invention is applied.

圖2係粒狀體供給裝置之說明圖。 Fig. 2 is an explanatory view of a granular material supply device.

圖3係粒狀體之示意圖,(A)係大量集合狀態之說明圖,(B)係壓力變動對於(A)中的由虛線包圍之部分之粒狀體P及間隙S之作用的說明圖。 Fig. 3 is a schematic view of a granular body, (A) is an explanatory diagram of a large number of aggregated states, and (B) is an explanatory diagram of the action of pressure fluctuation on a granular body P and a gap S of a portion surrounded by a broken line in (A). .

圖4係狹縫噴嘴之參考立體圖。 Figure 4 is a reference perspective view of a slit nozzle.

圖5係具備粒狀體補充機構之粒狀體供給裝置之說明圖。 Fig. 5 is an explanatory view of a granular material supply device including a granular body replenishing mechanism.

圖6係具備粒狀體補充機構之粒狀體供給裝置之示意圖。 Fig. 6 is a schematic view of a granular material supply device having a granular body replenishing mechanism.

圖7係表示粒狀體補充機構的各部分之動作之時序圖。 Fig. 7 is a timing chart showing the operation of each part of the granular body replenishing mechanism.

圖8係習知之直壓式噴珠加工裝置之說明圖。 Fig. 8 is an explanatory view of a conventional direct pressure type bead processing apparatus.

圖9係習知之直壓式噴珠加工裝置的粒狀體供給裝置部分之放大說明圖。 Fig. 9 is an enlarged explanatory view showing a portion of a granular body supply device of a conventional direct pressure type bead processing device.

其次,一面參照圖式,一面對本發明之實施形態進行以下說明。 Next, the embodiments of the present invention will be described below with reference to the drawings.

圖1中,符號1為應用了本發明之粒狀體供給方法之直壓式噴珠加工裝置。該直壓式噴珠加工裝置1具備:粒狀體供給裝置10,其由加壓箱11與粒狀體加速路徑12構成;粒狀體供給管13,其將上述粒狀體供給裝置10所搬送之粒狀體導入至噴射噴嘴40;未圖示之壓縮氣體供給源,其將粒狀體加壓用之壓縮氣體2導入至上述加壓箱11與粒狀體加速路徑12;粒狀體補充機構20,其將粒狀體補充至上述加壓箱11內;以及上述噴射噴嘴40。 In Fig. 1, reference numeral 1 denotes a direct pressure type bead processing apparatus to which the granular material supply method of the present invention is applied. The direct pressure type bead processing apparatus 1 includes a granular body supply device 10 including a pressurizing tank 11 and a granular body acceleration path 12, and a granular body supply pipe 13 for the granular material supply device 10 The transported granular material is introduced into the spray nozzle 40; a compressed gas supply source (not shown) that introduces the compressed gas 2 for granular body pressurization into the pressurizing tank 11 and the particulate acceleration path 12; A replenishing mechanism 20 that replenishes the granular body into the above-described pressurized tank 11; and the above-described spray nozzle 40.

其中,粒狀體供給裝置10將粒狀體與壓縮氣體一併經由上述粒狀體供給管13而供給至噴射噴嘴40,若將粒狀體加壓用之壓縮氣體2導入至構成粒狀體供給裝置10之加壓箱11與粒狀體加速路徑12該兩者,且將加壓箱11內之粒狀體導入至粒狀體加速路徑12,則可藉由流經粒狀體加速路徑12內之壓縮氣體對該粒狀體進行加壓,並且使該粒狀體加速,繼而將該粒狀體供給至噴射噴嘴40。 In the granular material supply device 10, the granular material and the compressed gas are supplied to the spray nozzle 40 via the granular material supply pipe 13, and the compressed gas 2 for pressurizing the granular material is introduced into the granular body. Both the pressurizing tank 11 of the supply device 10 and the granular body accelerating path 12, and introducing the granular body in the pressurizing tank 11 into the granular body accelerating path 12, can flow through the granular acceleration path The compressed gas in 12 pressurizes the granules, accelerates the granules, and then supplies the granules to the spray nozzles 40.

此種粒狀體供給裝置10之構成亦可與參照圖9所說明之習知之粒狀體供給裝置210相同,貫通加壓箱211底部之粒狀體堆積位置而設 置管路,該管路設置有粒狀體導入孔212a,將該管路設置為上述粒狀體加速路徑。又,於本實施形態中,於加壓箱11的出口11a處設置有粒狀體之定量供給裝置14,於該定量供給裝置14中設置有使自加壓箱11導入之粒狀體加速之粒狀體加速路徑12。 The configuration of the granular material supply device 10 may be the same as that of the conventional granular material supply device 210 described with reference to Fig. 9, and may be provided through the granular body deposition position at the bottom of the pressure tank 211. A pipe is provided, and the pipe is provided with a granular body introduction hole 212a, and the pipe is provided as the above-mentioned granular body acceleration path. Further, in the present embodiment, the granular material supply device 14 is provided at the outlet 11a of the pressurizing tank 11, and the quantitative supply device 14 is provided with the granular body introduced from the pressurizing tank 11 to be accelerated. The granule accelerates the path 12.

作為此種定量供給裝置14之構成,於本實施形態中,如圖2所示,將加壓箱11的底部形成為剖面形狀朝下方變細之漏斗狀,並且在形成於加壓箱11的最下端部之出口11a處,安裝有上述形成有粒狀體加速路徑12之定量供給裝置14的外殼141。 In the present embodiment, as shown in FIG. 2, the bottom portion of the pressurizing tank 11 is formed in a funnel shape in which the cross-sectional shape is tapered downward, and is formed in the pressurizing tank 11. The outer casing 141 of the quantitative supply device 14 in which the granular body acceleration path 12 is formed is attached to the outlet 11a at the lowermost end.

於該外殼141內,設置有與上述加壓箱11的出口11a連通之導入路徑14a、用以收容下述輥142之圓形空間即輥室14b、及與上述輥室14b連通且沿著相對於上述輥室14b的外周之切線方向延伸之狹縫狀的粒狀體加速路徑12,將輥142收容於上述輥室14b內,藉此,導入路徑14a與粒狀體加速路徑12分離。 The casing 141 is provided with an introduction path 14a that communicates with the outlet 11a of the pressurizing tank 11, a circular chamber 14b that accommodates a circular space 142, and a roller chamber 14b that communicates with the roller chamber 14b and The slit-shaped granular acceleration path 12 extending in the tangential direction of the outer circumference of the roll chamber 14b accommodates the roller 142 in the roll chamber 14b, whereby the introduction path 14a is separated from the granular acceleration path 12.

用以捕集並計量粒狀體之槽或孔係以既定之深度及圖案,形成於上述輥室14b內所收容之輥142的外周面,輥142於輥室內旋轉,藉此,將自加壓箱11導入至導入路徑14a內之粒狀體捕集至形成於旋轉之輥142的表面之槽或孔,並且若輥142進一步旋轉,則以上述方式捕集之粒狀體會被導入至狹縫狀的粒狀體加速路徑12。 The groove or hole for collecting and measuring the granular body is formed on the outer circumferential surface of the roller 142 accommodated in the roller chamber 14b at a predetermined depth and pattern, and the roller 142 is rotated in the roller chamber, thereby adding The granular body introduced into the introduction path 14a by the pressure box 11 is collected into a groove or a hole formed in the surface of the rotating roller 142, and if the roller 142 is further rotated, the granular body trapped in the above manner is introduced into the narrow portion. The slit-like granular body accelerates the path 12.

因此,如圖1、2所示,將來自未圖示之壓縮氣體供給源之粒狀體加壓用之壓縮氣體2分別導入至設置於加壓箱11與定量供給裝置14之粒狀體加速路徑12,藉此,以被輥142的表面捕集之狀態而導入至狹縫狀的粒狀體加速路徑12內之粒狀體,藉由流經粒狀體加速路徑12內之壓縮 氣體而被自形成於輥142的外周之槽或孔取出,並且隨著該壓縮氣體流被加壓、加速之後被搬出,且被導入至粒狀體供給管13,從而自噴射噴嘴40噴出。 Therefore, as shown in FIGS. 1 and 2, the compressed gas 2 for pressurizing the granular material from the compressed gas supply source (not shown) is introduced into the granular body acceleration provided in the pressurizing tank 11 and the dosing device 14, respectively. The path 12 is introduced into the granular body in the slit-shaped granular acceleration path 12 in a state of being trapped by the surface of the roller 142, and is compressed by the flow in the granular acceleration path 12. The gas is taken out from a groove or a hole formed in the outer circumference of the roller 142, and is pressurized, accelerated, and then carried out, and introduced into the granular material supply pipe 13, and ejected from the injection nozzle 40.

於圖示之實施形態中,將自未圖示之壓縮氣體供給源導入之粒狀體搬送用壓縮氣體3導入至上述粒狀體供給管13的一端13a側,產生自粒狀體供給管13的一端13a側流向噴射噴嘴40之壓縮氣體流,並且將來自粒狀體加速路徑12之粒狀體導入至該粒狀體供給管13的中間位置,藉此,可使已於粒狀體加速路徑12中加速之粒狀體與粒狀體供給管13內之壓縮氣體流匯合而供給至噴射噴嘴40。 In the embodiment shown in the drawing, the compressed gas 3 for particulate matter conveyance introduced from a compressed gas supply source (not shown) is introduced into the one end 13a side of the granular material supply pipe 13, and is generated from the granular material supply pipe 13 The one end 13a side flows toward the compressed gas flow of the spray nozzle 40, and introduces the granular body from the granular body acceleration path 12 to the intermediate position of the granular body supply pipe 13, whereby the granular body can be accelerated The granular body accelerated in the path 12 merges with the compressed gas flow in the granular material supply pipe 13 and is supplied to the injection nozzle 40.

導入至上述加壓箱11及粒狀體加速路徑12內之粒狀體加壓用的壓縮氣體2之壓力會以既定之壓力差而反復地變動,為了產生此種壓力變動,於未圖示之壓縮氣體供給源、或自壓縮氣體供給源至加壓箱11及粒狀體加速路徑12之管路中設置未圖示之壓力變動機構。 The pressure of the compressed gas 2 for pressurizing the granular material introduced into the pressurizing tank 11 and the granular body acceleration path 12 is repeatedly changed by a predetermined pressure difference, and in order to generate such a pressure fluctuation, it is not shown. A pressure fluctuation mechanism (not shown) is provided in the compressed gas supply source or the pipeline from the compressed gas supply source to the pressurizing tank 11 and the particulate acceleration path 12.

此種壓力變動機構亦可為如下壓力變動機構,該壓力變動機構在如將例如往復型或伸縮型壓縮機用作壓縮氣體供給源之情形般,由壓縮氣體供給源本身產生脈動之壓縮氣體流時,不對來自壓縮氣體供給源之壓縮氣體進行整流,或不完全地進行整流,而是將該壓縮氣體以保留脈動之狀態導入至加壓箱11或粒狀體加速路徑12,從而獲得上述壓力變動。又,亦可採用如下壓力變動機構,該壓力變動機構於自壓縮氣體供給源至加壓箱11及粒狀體加速路徑12之迴路中設置有放氣閥,藉由使該放氣閥間歇地開閉而獲得上述壓力變動。進而,亦可採用如下壓力變動機構,該壓力變動機構將流路面積不同之2個管路並列地連接於自壓縮氣體供給源至加壓 箱11及粒狀體加速路徑12之迴路中,藉由使任一條流路反復地開閉,或藉由僅交替地打開任一條流路而獲得上述壓力變動。又,亦可使用電動氣動調節器,根據來自定序器之指令而使電動氣動調節器之壓力以一定間隔發生變動。只要可使導入至加壓箱11及粒狀體加速路徑12之粒狀體加壓用的壓縮氣體2獲得既定之壓力變動,則可採用使用任何構成之壓力變動機構。 Such a pressure varying mechanism may be a pressure varying mechanism that generates a pulsating compressed gas flow from the compressed gas supply source itself, as in the case of using, for example, a reciprocating type or a telescopic type compressor as a compressed gas supply source. When the compressed gas from the compressed gas supply source is not rectified or is not completely rectified, the compressed gas is introduced into the pressurizing tank 11 or the particulate acceleration path 12 in a state of remaining pulsation, thereby obtaining the above pressure. change. Further, a pressure varying mechanism may be employed in which a purge valve is provided in a circuit from the compressed gas supply source to the pressurizing tank 11 and the particulate acceleration path 12, by intermittently making the purge valve intermittently The above pressure change is obtained by opening and closing. Further, a pressure varying mechanism may be employed in which two pipes having different flow path areas are connected in parallel to the self-compressed gas supply source to pressurization In the circuit of the tank 11 and the granular body acceleration path 12, the pressure fluctuation is obtained by repeatedly opening and closing either of the flow paths or by alternately opening only one of the flow paths. Further, an electro-pneumatic regulator may be used to vary the pressure of the electro-pneumatic regulator at regular intervals in accordance with commands from the sequencer. As long as the predetermined pressure fluctuation can be obtained by the compressed gas 2 for pressurizing the granular material introduced into the pressurizing tank 11 and the granular body acceleration path 12, a pressure varying mechanism using any configuration can be employed.

例如,可使用電動氣動調節器(SMC製造之ITV3030),根據來自定序器之指令而使壓力以一定間隔發生變動,該電動氣動調節器(SMC製造之ITV3030)可根據來自定序器之訊號而設定壓力。 For example, an electro-pneumatic regulator (ITV3030 manufactured by SMC) can be used to vary the pressure at regular intervals according to instructions from the sequencer. The electropneumatic regulator (ITV3030 manufactured by SMC) can be based on the signal from the sequencer. And set the pressure.

如此,使導入至加壓箱11及粒狀體加速路徑12之壓縮氣體之壓力反復地變動,藉此,自加壓箱11至噴射噴嘴40之粒狀體搬送路徑內之壓力不會保持固定而是會反復地變動。 In this manner, the pressure of the compressed gas introduced into the pressurizing tank 11 and the granular body acceleration path 12 is repeatedly changed, whereby the pressure in the granular body transport path from the pressurizing tank 11 to the jetting nozzle 40 is not kept constant. It will change over and over again.

其結果,作為一例,處於堆積狀態之粒狀體P如圖3(A)所示,達到於各粒狀體P之間隙S中封閉有氣體之狀態,該氣體S以如下方式發揮作用,即,隨著加壓用的壓縮氣體2之壓力變動,該氣體S於壓力高之狀態下受到壓縮,若壓力降低,則該氣體S會膨脹而使粒狀體P之間的間隙S擴張(參照圖3(B)),因此,藉由反復地進行此種壓縮與膨脹,即使於使用微粉粒狀體之情形時,粒狀體彼此亦不會凝聚成塊。 As a result, as shown in FIG. 3(A), the granular body P in a stacked state is in a state in which a gas is sealed in the gap S of each granular body P, and the gas S functions as follows. When the pressure of the compressed gas 2 for pressurization fluctuates, the gas S is compressed in a state where the pressure is high, and when the pressure is lowered, the gas S expands to expand the gap S between the granular bodies P (refer to Fig. 3(B)), therefore, by repeating such compression and expansion, even when the fine powder granules are used, the granules do not aggregate into a block.

如此,對於導入至加壓箱11及粒狀體加速路徑12內之壓縮氣體之壓力變動而言,若高壓時與低壓時之壓力差小,則粒狀體P之間隙S中之氣體之膨脹與收縮亦微小,因此,防止凝聚之效果減弱,故而較佳為產生0.03 MPa以上。 As described above, in the pressure fluctuation of the compressed gas introduced into the pressurizing tank 11 and the granular body acceleration path 12, if the pressure difference between the high pressure and the low pressure is small, the gas expansion in the gap S of the granular body P Since the shrinkage is also small, the effect of preventing aggregation is weakened, so that it is preferable to generate 0.03 MPa or more.

又,於採用長壓力變動間隔之情形時,存在如下情形,即, 粒狀體會於變化與變化之間歇中凝聚,並且於此期間,無法噴射出粒狀體,因此,較佳為以1秒以下之間隔對高壓狀態與低壓狀態進行切換。 Moreover, when a long pressure variation interval is employed, there are cases where The granular material is agglomerated in the intermittent change and change, and the granular body cannot be ejected during this period. Therefore, it is preferable to switch the high pressure state and the low pressure state at intervals of 1 second or shorter.

如上所述,搬送至噴射噴嘴40之粒狀體與壓縮氣體一併,以未產生凝聚且各個粒狀體分離之狀態在加工室內噴射,對被加工物進行加工。 As described above, the granular material conveyed to the injection nozzle 40 is injected together with the compressed gas in a state in which the aggregates are not aggregated and the respective granular bodies are separated, and the workpiece is processed.

藉由上述粒狀體補充機構20將粒狀體補充至上述加壓箱11,該粒狀體補充機構20至少包含粒狀體補充源22與放卸閥27等開閉機構,該放卸閥27使上述粒狀體補充源22與加壓箱11之間開閉,從而控制對於加壓箱11之粒狀體之導入。 The granular body is replenished to the pressurizing tank 11 by the granular body replenishing mechanism 20, and the granular body replenishing mechanism 20 includes at least an opening and closing mechanism such as a granular body replenishing source 22 and a discharge valve 27, and the discharge valve 27 The introduction of the granular body replenishing source 22 and the pressurizing tank 11 is performed to control the introduction of the granular body to the pressurizing tank 11.

於圖1所示之實施形態中,可使收容有噴射噴嘴40之加工室30中所設置之漏斗33的下端經由粒狀體回收管37而連通於旋風分離器22,並且可使集塵機38連通於該旋風分離器22而對旋風分離器22內進行抽吸,藉此,於加工室30內噴射之粒狀體與切削粉等一併導入至旋風分離器22,可再使用之粒狀體被回收至設置於旋風分離器的底部之粒狀體箱29內。另一方面,可藉由集塵機38除去回收切削粉等粉塵,藉此,將該旋風分離器22所回收之粒狀體補充至加壓箱11。 In the embodiment shown in FIG. 1, the lower end of the funnel 33 provided in the processing chamber 30 in which the injection nozzle 40 is housed can be communicated to the cyclone 22 via the granular body recovery pipe 37, and the dust collector 38 can be connected. The cyclone separator 22 sucks the inside of the cyclone separator 22, whereby the granular body sprayed in the processing chamber 30 is introduced into the cyclone 22 together with the cutting powder or the like, and the reusable granular body can be used. It is recovered into a granular box 29 provided at the bottom of the cyclone. On the other hand, the dust such as the cutting powder can be removed by the dust collector 38, whereby the granular body recovered by the cyclone 22 can be replenished to the pressurizing tank 11.

因此,於圖示之實施形態中,該旋風分離器22均作為對於加壓箱11之粒狀體補充源。 Therefore, in the illustrated embodiment, the cyclone separator 22 serves as a source of particulate matter for the pressurized tank 11.

對於噴射噴嘴40之粒狀體之供給亦可為分批式作業,該分批式作業係將直至投入至加壓箱11內之既定量之粒狀體之供給完成為止作為一次,每當一次之粒狀體之供給結束時使作業停止,並將粒狀體投入至加壓箱11。 The supply of the granular body to the spray nozzle 40 may also be a batch operation, which is performed once until the supply of the predetermined amount of granular material into the pressurization tank 11 is completed, once every time. When the supply of the granular material is completed, the operation is stopped, and the granular body is put into the pressurizing tank 11.

於該情形時,如圖1所示,亦可使加壓箱11與上述旋風分離器22經由粒狀體箱29而連通,並且預先設置使加壓箱11與粒狀體箱29之間開閉之放卸閥27,每當一次之粒狀體之噴射結束時,打開放卸閥27而使一次之粒狀體落下至加壓箱11。 In this case, as shown in FIG. 1, the pressure tank 11 and the cyclone separator 22 may be communicated via the granular body box 29, and the pressure box 11 and the granular body box 29 may be opened and closed in advance. The discharge valve 27 opens the discharge valve 27 every time the injection of the granular body is completed, and the primary granular body is dropped to the pressurizing tank 11.

於此情形時,上述旋風分離器22、粒狀體箱29及放卸閥27成為將粒狀體補充至加壓箱11之上述粒狀體補充機構20(參照圖1、2)。 In this case, the cyclone separator 22, the granular body box 29, and the discharge valve 27 are the granular body replenishing mechanism 20 that replenishes the granular body to the pressurizing tank 11 (see FIGS. 1 and 2).

又,代替上述分批式構成,該粒狀體補充機構20亦可不停止粒狀體之噴射而連續地將粒狀體補充至加壓箱11。 Further, instead of the above-described batch type configuration, the granular body replenishing mechanism 20 may continuously replenish the granular body to the pressurizing tank 11 without stopping the ejection of the granular body.

作為此種粒狀體補充機構20,於圖5及圖6所示之構成例中,於上述加壓箱11與旋風分離器22之間設置緩衝室21,並設置使加壓箱11與緩衝室21之間開閉之下側閥23,並且於緩衝室21與旋風分離器22之間設置有使兩者之間開閉之上側閥24。 In the configuration example shown in FIGS. 5 and 6, the granular body replenishing mechanism 20 is provided with a buffer chamber 21 between the pressurizing tank 11 and the cyclone 22, and is provided with a pressurizing tank 11 and a buffer. The lower side valve 23 is opened and closed between the chambers 21, and the upper side valve 24 is opened and closed between the buffer chamber 21 and the cyclone separator 22.

而且,設置對緩衝室21內進行加壓與放氣之供排氣機構25,並且設置控制上述上側及下側閥23、24與供排氣機構25之動作且由定序器或微控制器等電子控制裝置構成之控制機構26。藉此,藉由構成上述粒狀體補充機構20,可一面將加壓箱11內維持為加壓狀態,一面將粒狀體補充至加壓箱11內,從而可連續地自噴射噴嘴40噴射出粒狀體。 Further, an air supply and exhaust mechanism 25 for pressurizing and deflation in the buffer chamber 21 is provided, and an operation of controlling the upper and lower valves 23, 24 and the air supply and exhaust mechanism 25 is provided and is performed by a sequencer or a microcontroller The control mechanism 26 is constituted by an electronic control device. By constituting the granular body replenishing mechanism 20, the granular body can be replenished into the pressurizing tank 11 while maintaining the inside of the pressurizing tank 11 in a pressurized state, so that it can be continuously ejected from the jetting nozzle 40. Granulated.

此處,使用定序器,以電子控制來控制時序。 Here, the sequencer is used to control the timing with electronic control.

於圖7中,以時序圖表示用以使此種連續噴射成為可能之上述控制機構26對於各部分之控制之狀態。 In Fig. 7, the state of control of each portion by the above-described control mechanism 26 for making such continuous ejection is shown in a timing chart.

如圖7所示,粒狀體補充機構20於噴珠加工裝置1之停止狀態下,處於既不供給粒狀體加壓用的壓縮氣體2亦不供給粒狀體搬送用 的壓縮氣體3之狀態,並且於上側、下側之閥23、24均打開之狀態下,緩衝室21內處於未加壓之狀態(圖7之T0)。 As shown in Fig. 7, the granular body replenishing mechanism 20 is not supplied with the compressed gas 2 for the granular body pressurization or the granular body for transport in the stopped state of the bead processing apparatus 1. In the state of the compressed gas 3, and in the state in which the valves 23 and 24 on the upper side and the lower side are both opened, the inside of the buffer chamber 21 is in an unpressurized state (T0 in Fig. 7).

又,因上側及下側之兩個閥23、24開放,存在於旋風分離器22及緩衝室21內之粒狀體全部處於落下至加壓箱11內之狀態。 Further, since the two valves 23 and 24 on the upper side and the lower side are opened, all of the granular bodies existing in the cyclone 22 and the buffer chamber 21 are in a state of being dropped into the pressurizing tank 11.

若於該狀態下起動噴珠加工裝置1,則控制機構26會關閉下側閥23,並且開始自粒狀體供給管13的一端13a導入粒狀體搬送用的壓縮氣體3,且開始將粒狀體加壓用的壓縮氣體2導入至加壓箱11及粒狀體加速路徑12,自加壓箱11至噴射噴嘴40之粒狀體搬送路徑內之壓力上升,開始自噴射噴嘴40噴射出粒狀體(圖7之T1)。 When the bead processing apparatus 1 is started in this state, the control unit 26 closes the lower side valve 23, and starts to introduce the compressed gas 3 for the granular material transfer from the one end 13a of the granular material supply tube 13, and starts the granulation. The compressed gas 2 for pressurizing the body is introduced into the pressurizing tank 11 and the granular acceleration path 12, and the pressure in the granular body transport path from the pressurizing tank 11 to the spray nozzle 40 rises, and the injection from the injection nozzle 40 is started. Granular body (T1 of Figure 7).

於開始噴射出粒狀體之後,若經過了既定時間,則控制機構26關閉已打開之上側閥24,並且將壓縮氣體導入至緩衝室21,使緩衝室21內之壓力上升,直至達到與加壓箱11內之壓力相同之壓力為止(圖7之T2)。 After the granules are started to be ejected, if a predetermined time has elapsed, the control mechanism 26 closes the upper side valve 24 and opens the compressed gas to the buffer chamber 21, so that the pressure in the buffer chamber 21 rises until it reaches and increases. The pressure in the pressure tank 11 is the same as the pressure (T2 in Fig. 7).

如此,若緩衝室21內之壓力上升至與加壓箱11內之壓力相同之壓力為止,則控制機構26打開下側閥23,使緩衝室21內之粒狀體落下至加壓箱11內,從而將因噴射而減少之粒狀體補充至加壓箱11內(圖7之T3)。 As described above, when the pressure in the buffer chamber 21 rises to the same pressure as the pressure in the pressurizing tank 11, the control mechanism 26 opens the lower valve 23 to drop the granular body in the buffer chamber 21 into the pressurizing tank 11. Thereby, the granular body reduced by the ejection is replenished into the pressurizing tank 11 (T3 of Fig. 7).

若對於加壓箱11之粒狀體之補充結束,則控制機構26關閉已打開之下側閥23,並且對緩衝室21內進行放氣(圖7之T4)。 When the replenishment of the granular body of the pressurizing tank 11 is completed, the control mechanism 26 closes the opened lower side valve 23, and deflates the inside of the buffer chamber 21 (T4 of Fig. 7).

若緩衝室21內之放氣結束,則控制機構26打開上側閥24,使旋風分離器22所回收之粒狀體落下至緩衝室21內(圖7之T1)。其後,藉由反復地進行上述動作,將加壓箱11內維持為加壓狀態,且將粒狀體補充至加壓箱11,藉此,可連續地自噴射噴嘴40噴射出粒狀體。 When the deflation in the buffer chamber 21 is completed, the control unit 26 opens the upper valve 24 to drop the granular body recovered by the cyclone 22 into the buffer chamber 21 (T1 of Fig. 7). Thereafter, by repeating the above operation, the inside of the pressurizing tank 11 is maintained in a pressurized state, and the granular body is replenished to the pressurizing tank 11, whereby the granular body can be continuously ejected from the jetting nozzle 40. .

再者,於噴珠加工裝置1停止時,停止將粒狀體搬送用的壓縮氣體3導入至粒狀體供給管13,且停止將粒狀體加壓用的壓縮氣體2導入至加壓箱11及粒狀體加速路徑12,並且對緩衝室21內進行放氣,其後,上側、下側閥23、24均打開,恢復至初始狀態(圖7之T0)。 When the bead processing apparatus 1 is stopped, the compressed gas 3 for transporting the granular material is stopped from being introduced into the granular material supply tube 13, and the compressed gas 2 for pressurizing the granular material is stopped from being introduced into the pressurized tank. 11 and the granular body acceleration path 12, and the inside of the buffer chamber 21 is deflated, and thereafter, the upper and lower valves 23, 24 are both opened, and return to the initial state (T0 of Fig. 7).

[實施例] [Examples]

其次,對使用本發明之直壓式噴珠加工裝置1進行加工之加工實施例進行以下說明。 Next, a processing example in which the direct pressure type bead processing apparatus 1 of the present invention is processed will be described below.

再者,加工條件分別如下所述。 Furthermore, the processing conditions are as follows.

[加工例1] [Processing Example 1]

使用粒狀體:氧化鋁#5000(平均粒徑:3 μm) Use of granules: alumina #5000 (average particle size: 3 μm)

使用壓縮氣體:高壓空氣 Use compressed gas: high pressure air

壓力1:使0.23 MPa與0.28 MPa之壓力以1秒之週期變動 Pressure 1: The pressure of 0.23 MPa and 0.28 MPa is changed in a period of 1 second.

壓力2:0.2 MPa Pressure 2: 0.2 MPa

粒狀體供給量:30 g/min Granular supply: 30 g/min

加工基板:矽晶圓 Processing substrate: silicon wafer

使用乾膜:NCM155(Nichigo-Morton股份有限公司製造) Dry film: NCM155 (manufactured by Nichigo-Morton Co., Ltd.)

噴嘴移動速度:8 m/min Nozzle moving speed: 8 m/min

噴嘴移動寬度:200 mm Nozzle movement width: 200 mm

噴嘴距離:100 mm Nozzle distance: 100 mm

噴嘴口徑:Φ8 mm Nozzle diameter: Φ8 mm

輸送機移動速度:20 mm/min Conveyor moving speed: 20 mm/min

輸送機流程數:8個流程 Conveyor flow: 8 processes

切削加工深度:30 μm Cutting depth: 30 μm

[加工例2] [Processing Example 2]

使用粒狀體:平均粒徑為1.8 μm之銅粉末(Epson Atmix製造之超微細Cu粉PF-1F) Use of granular material: copper powder with an average particle diameter of 1.8 μm (ultrafine Cu powder PF-1F manufactured by Epson Atmix)

使用壓縮氣體:氮氣 Use compressed gas: nitrogen

氣壓1:使0.23 MPa與0.26 MPa之壓力以0.7秒之週期變動 Air pressure 1: The pressure of 0.23 MPa and 0.26 MPa is changed in a period of 0.7 seconds.

氣壓2:0.2 MPa Air pressure 2: 0.2 MPa

粒狀體供給量:120 g/min Granular supply: 120 g/min

加工基板:氧化鋁 Processing substrate: alumina

使用乾膜:NCM155(Nichigo-Morton股份有限公司製造) Dry film: NCM155 (manufactured by Nichigo-Morton Co., Ltd.)

噴嘴移動速度:8 m/min Nozzle moving speed: 8 m/min

噴嘴移動寬度:200 mm Nozzle movement width: 200 mm

噴嘴距離:10 mm Nozzle distance: 10 mm

噴嘴口徑:狹縫為1 mm且寬度為30 mm之狹縫噴嘴 Nozzle diameter: slit nozzle with a slit of 1 mm and a width of 30 mm

輸送機移動速度:5 mm/min Conveyor moving speed: 5 mm/min

輸送機流程數:1個流程 Conveyor flow: 1 process

銅厚度:約6 μm Copper thickness: about 6 μm

[加工例3] [Processing Example 3]

使用粒狀體:平均粒徑為2.5 μm之玻璃料(旭硝子製造之ASF-6001) Use of granules: glass frit with an average particle size of 2.5 μm (ASF-6001 manufactured by Asahi Glass)

使用壓縮氣體:高壓空氣 Use compressed gas: high pressure air

壓力1:使0.23 MPa與0.28 MPa之壓力以0.5秒之週期變動 Pressure 1: The pressure of 0.23 MPa and 0.28 MPa is changed by a period of 0.5 second.

壓力2:0.2 MPa Pressure 2: 0.2 MPa

粒狀體供給量:120 g/min Granular supply: 120 g/min

加工基板:不銹鋼 Processing substrate: stainless steel

使用乾膜:NCM155(Nichigo-Morton股份有限公司製造) Dry film: NCM155 (manufactured by Nichigo-Morton Co., Ltd.)

噴嘴移動速度:8 m/min Nozzle moving speed: 8 m/min

噴嘴移動寬度:200 mm Nozzle movement width: 200 mm

噴嘴距離:10 mm Nozzle distance: 10 mm

噴嘴口徑:狹縫為1 mm且寬度為30 mm之狹縫噴嘴 Nozzle diameter: slit nozzle with a slit of 1 mm and a width of 30 mm

噴嘴往復:往復30次 Nozzle reciprocating: 30 reciprocating

玻璃厚度:約10 μm Glass thickness: about 10 μm

再者,上述條件中,「壓力1」係導入至加壓箱11及粒狀體加速路徑12之粒狀體加壓用的壓縮氣體(圖1、2中之符號「2」)之壓力,「壓力2」係導入至粒狀體供給管13的一端之粒狀體搬送用的壓縮氣體(圖1、2中之符號「3」)之壓力。 In the above-mentioned conditions, "pressure 1" is the pressure of the compressed gas (symbol "2" in FIGS. 1 and 2) introduced into the pressurized tank 11 and the granular acceleration path 12 by the granular body. The "pressure 2" is the pressure of the compressed gas (symbol "3" in FIGS. 1 and 2) introduced into the granular body of one end of the granular material supply pipe 13.

又,「噴嘴口徑」中的「狹縫噴嘴」如圖4所示,係對於具備狹縫狀噴射口之噴嘴之說明。 In addition, the "slot nozzle" in the "nozzle diameter" is a description of the nozzle which has a slit-shaped injection port, as shown in FIG.

於以上條件下進行加工所得之結果係於任一個加工例中,均未確認產生由凝聚引起之粒狀體之供給不良,且亦未確認噴射出凝聚之粒狀體。 The results of the processing under the above conditions were not observed in any of the processing examples, and it was not confirmed that the supply of the granular material due to aggregation was caused, and the granulated body in which the aggregation was ejected was not confirmed.

又,對於被加工物之加工狀態亦良好,且亦未確認出產生加工不均等加工不良,已確認本發明之方法適合於搬送微粉粒狀體。 Moreover, the processing state of the workpiece was also good, and processing defects such as processing unevenness were not confirmed, and it was confirmed that the method of the present invention is suitable for conveying fine powder granules.

2‧‧‧壓縮氣體(粒狀體加壓用) 2‧‧‧Compressed gas (for granular pressurization)

3‧‧‧壓縮氣體(粒狀體搬送用) 3‧‧‧Compressed gas (for granular transport)

11‧‧‧加壓箱 11‧‧‧ Pressurized box

11a‧‧‧出口 11a‧‧‧Export

12‧‧‧粒狀體加速路徑(狹縫) 12‧‧‧Grain body acceleration path (slit)

13‧‧‧粒狀體供給管 13‧‧‧Grain body supply tube

13a‧‧‧(粒狀體供給管的)一端 13a‧‧‧ (one end of the granular supply tube)

14a‧‧‧導入路徑 14a‧‧‧Importing path

14b‧‧‧輥室 14b‧‧‧ Roll Room

20‧‧‧粒狀體補充機構 20‧‧‧Grain body supplementation mechanism

22‧‧‧旋風分離器(粒狀體補充源) 22‧‧‧Cyclone separator (granular body supplement source)

27‧‧‧放卸閥 27‧‧‧Dumping valve

28‧‧‧振動器 28‧‧‧Vibrator

29‧‧‧粒狀體箱 29‧‧‧Grain box

40‧‧‧噴射噴嘴 40‧‧‧jet nozzle

141‧‧‧外殼 141‧‧‧ Shell

142‧‧‧輥 142‧‧‧roll

Claims (8)

一種直壓式噴珠加工裝置之粒狀體供給方法,該直壓式噴珠加工裝置具備:加壓箱;粒狀體加速路徑,其導入有該加壓箱內之粒狀體;粒狀體供給管,其使該粒狀體加速路徑與噴射噴嘴連通;以及壓縮氣體供給源,其將壓縮氣體導入至該加壓箱及該粒狀體加速路徑;其特徵在於:使導入至該加壓箱及粒狀體加速路徑之壓縮氣體之壓力以既定之壓力差以上反復地變動。 A granular body supply method for a direct pressure type bead processing apparatus, the direct pressure type bead processing apparatus comprising: a pressure tank; a granular body acceleration path into which a granular body in the pressurized tank is introduced; a body supply pipe that communicates the granule acceleration path with the injection nozzle; and a compressed gas supply source that introduces the compressed gas into the pressure tank and the granule acceleration path; The pressure of the compressed gas in the pressure tank and the granular body acceleration path is repeatedly changed by a predetermined pressure difference or more. 如申請專利範圍第1項之直壓式噴珠加工裝置之粒狀體供給方法,其中,將該既定之壓力差設為0.03 MPa以上。 The granular material supply method of the direct pressure type bead processing apparatus according to the first aspect of the invention, wherein the predetermined pressure difference is set to 0.03 MPa or more. 如申請專利範圍第1或2項之直壓式噴珠加工裝置之粒狀體供給方法,其中,該壓力以1秒以下之間隔變動。 The method of supplying a granular material to a direct pressure type bead processing apparatus according to claim 1 or 2, wherein the pressure is varied at intervals of 1 second or shorter. 如申請專利範圍第1或2項之直壓式噴珠加工裝置之粒狀體供給方法,其中,以與該加壓箱內之粒狀體層或自該加壓箱擠出之粒狀體層相接觸之方式,配置輥的外周面之一部分,該輥於該外周面上,以既定圖案形成有粒狀體捕集用的槽或孔,並且於該輥的外周面之旋轉軌跡上,形成有將相對於該輥的外周面之切線方向作為長度方向之狹縫狀的該粒狀體加速路徑,藉由該輥之旋轉,定量地將捕集至該輥的外周面之粒狀體導入至該粒狀體加速路徑內。 The method of supplying a granular body of a direct pressure type bead processing apparatus according to claim 1 or 2, wherein the granular body layer in the pressurized box or the granular body layer extruded from the pressurized box is In a contact manner, a part of the outer peripheral surface of the roller is disposed, and the roller is formed with a groove or a hole for collecting the granular body in a predetermined pattern on the outer peripheral surface, and is formed on a rotation locus of the outer peripheral surface of the roller. The tangential direction with respect to the outer peripheral surface of the roller is defined as a slit-like granular acceleration path in the longitudinal direction, and the granular body collected on the outer peripheral surface of the roller is quantitatively introduced by the rotation of the roller to The granules accelerate within the path. 如申請專利範圍第1或2項之直壓式噴珠加工裝置之粒狀體供給方法,其中,設置有連通於該加壓箱上之緩衝室、與連通於該緩衝室上之粒狀體補充源且設置有使該加壓箱與該緩衝室之間開閉之下側閥、使該緩衝室與粒 狀體補充源之間開閉之上側閥、及對該緩衝室內進行加壓及排氣之緩衝室供排氣機構;於將壓縮氣體導入至該加壓箱及粒狀體加速路徑之過程中,藉由反復地進行一連串之動作而連續地將粒狀體導入至加壓箱,該一連串之動作係指自將來自該下側閥已關閉且上側閥已打開之該粒狀體補充源之粒狀體導入至該緩衝室內之狀態起,於關閉該上側閥,且藉由該緩衝室供排氣機構將壓縮氣體導入至該緩衝室內並加壓之後,打開該下側閥,使該緩衝室內之粒狀體落下至該加壓箱內,其後,於再次關閉該下側閥,且藉由該緩衝室供排氣機構釋放該緩衝室內之壓縮氣體之後,使該上側閥開放,將該粒狀體補充源內之粒狀體導入至該緩衝室內。 The method of supplying a granular body of a direct pressure type bead processing apparatus according to claim 1 or 2, wherein a buffer chamber connected to the pressure tank and a granular body connected to the buffer chamber are provided a supplement source and a side valve that opens and closes between the pressure tank and the buffer chamber, and the buffer chamber and the grain Opening and closing the upper side valve between the supplemental sources and the buffer chamber supply and exhaust mechanism for pressurizing and exhausting the buffer chamber; during the process of introducing the compressed gas into the pressurizing tank and the granular acceleration path, The granules are continuously introduced into the pressurized tank by repeatedly performing a series of actions, which refer to the granules from the source of the granules from which the lower valve is closed and the upper valve is opened. After the state is introduced into the buffer chamber, the upper side valve is closed, and after the compressed air is introduced into the buffer chamber by the buffer chamber supply and exhaust mechanism and pressurized, the lower side valve is opened to make the buffer chamber The granular body is dropped into the pressurized tank, and thereafter, the lower side valve is closed again, and after the compressed air in the buffer chamber is released by the buffer chamber supply and exhaust mechanism, the upper side valve is opened, and the upper side valve is opened. The granules in the granule supplement source are introduced into the buffer chamber. 一種直壓式噴珠加工裝置,具備:加壓箱;粒狀體加速路徑,其導入有該加壓箱內之粒狀體;粒狀體供給管,其使該粒狀體加速路徑與噴射噴嘴連通;以及壓縮氣體供給源,其將壓縮氣體導入至該加壓箱及該粒狀體加速路徑;其特徵在於:設置有壓力變動機構,使導入至該加壓箱及粒狀體加速路徑之壓縮氣體之壓力以既定之壓力差以上反復地變動。 A direct pressure type bead processing device comprising: a pressure tank; a granular body acceleration path into which a granular body in the pressurized tank is introduced; and a granular body supply pipe which accelerates the granular body and sprays a nozzle communicating; and a compressed gas supply source for introducing the compressed gas into the pressurizing tank and the granular acceleration path; wherein a pressure varying mechanism is provided to introduce the pressurized tank and the granular acceleration path The pressure of the compressed gas is repeatedly changed by a predetermined pressure difference or more. 如申請專利範圍第6項之直壓式噴珠加工裝置,其中,於該加壓箱與該粒狀體供給管之間設置有定量供給裝置,該定量供給裝置具備:導入路徑,其連通於該加壓箱的出口;圓形輥室,其與該導入路徑連通;外殼,其於內部形成有狹縫狀的該粒狀體加速路徑,沿著相對於該輥室的外周之切線方向延伸且與該輥室連通;以及輥,其於外周面上,以既定圖案形成有粒狀體捕集用的槽或孔,且於該輥室內旋轉。 The direct pressure type bead processing apparatus according to claim 6, wherein a quantitative supply device is provided between the pressure tank and the granular material supply tube, and the quantitative supply device includes an introduction path that communicates with An outlet of the pressure tank; a circular roller chamber communicating with the introduction path; and an outer casing having a slit-shaped acceleration path of the granular body formed therein, extending along a tangential direction with respect to an outer circumference of the roller chamber And communicating with the roller chamber; and a roller having a groove or a hole for collecting the granular body in a predetermined pattern on the outer peripheral surface, and rotating in the roller chamber. 如申請專利範圍第6或7項之直壓式噴珠加工裝置,其中, 設置有連通於該加壓箱上之緩衝室、與連通於該緩衝室上之粒狀體補充源且設置有使該加壓箱與該緩衝室之間開閉之下側閥、使該緩衝室與粒狀體補充源之間開閉之上側閥、及對該緩衝室內進行加壓及排氣之緩衝室供排氣機構;且設置有控制機構,該控制機構於將壓縮氣體導入至該加壓箱及粒狀體加速路徑之過程中,控制該上側及下側閥以及緩衝室供排氣機構之動作,且進行一連串之動作,該一連串之動作係指自該下側閥已關閉且上側閥已打開之狀態起,於關閉該上側閥,且藉由該緩衝室供排氣機構將壓縮氣體導入至該緩衝室內並加壓之後,打開該下側閥,使該緩衝室內之粒狀體落下至該加壓箱內,其後,於再次關閉該下側閥,且藉由該緩衝室供排氣機構釋放該緩衝室內之壓縮氣體之後,使該上側閥開放,將該粒狀體補充源內之粒狀體導入至該緩衝室內。 For example, the direct pressure type bead processing device of the sixth or seventh patent application, wherein Providing a buffer chamber connected to the pressure tank, a granular body replenishing source connected to the buffer chamber, and a side valve for opening and closing between the pressure tank and the buffer chamber, and the buffer chamber is provided An upper side opening and closing valve and a buffer chamber supply and exhaust mechanism for pressurizing and exhausting the buffer chamber; and a control mechanism for introducing the compressed gas into the pressurization During the acceleration path of the tank and the granular body, controlling the actions of the upper and lower valves and the buffer chamber supply and exhaust mechanism, and performing a series of actions, the series of actions means that the lower side valve is closed and the upper side valve In the opened state, after the upper side valve is closed, and the compressed air is introduced into the buffer chamber by the buffer chamber supply and exhaust mechanism and pressurized, the lower side valve is opened to cause the granular body in the buffer chamber to fall. After the pressure tank is closed, the lower side valve is closed again, and after the buffer chamber supply and exhaust mechanism releases the compressed gas in the buffer chamber, the upper side valve is opened to supplement the granular body. The introduction of the granules into the Indoor.
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