TW201400989A - Pattern drawing apparatus, pattern drawing method - Google Patents

Pattern drawing apparatus, pattern drawing method Download PDF

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Publication number
TW201400989A
TW201400989A TW101149899A TW101149899A TW201400989A TW 201400989 A TW201400989 A TW 201400989A TW 101149899 A TW101149899 A TW 101149899A TW 101149899 A TW101149899 A TW 101149899A TW 201400989 A TW201400989 A TW 201400989A
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Taiwan
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light
emitting
illuminance
pattern drawing
substrate
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TW101149899A
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Chinese (zh)
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TWI479279B (en
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Masahiko Kokubo
Shoichi Umakoshi
Daisuke Kishiwaki
Kohei Omori
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Dainippon Screen Mfg
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Abstract

The uniformity of the illumination distribution of irradiation light (Re) on a substrate (S) may be improved for a pattern drawing device (1) wherein light incident on a spatial modulator (80) through a rod integrator (70) is modulated by a spatial light modulator (80) and irradiated onto the substrate (S). Provided is a light source array (60) having a plurality of light-emitting elements (601) which emits light with the brightness in accordance with the magnitude of a driving current (Id). The rod integrator (70) equalizes the illumination distribution for the light entering from the light source array (60). Also provided is an irradiation control unit (130) which individually controls the magnitude of the driving signal (Id) for each light-emitting element (601). Therefore, by individually controlling the brightness of the light-emitting element (601) the illumination distribution of the light incident on the subsequent rod integrator (70) can be suitably adjusted. As a result, it is possible to improve the uniformity of the illumination distribution of the irradiation light on an irradiation region (Re) using an optical head (6).

Description

圖案描繪裝置、圖案描繪方法 Pattern drawing device, pattern drawing method

本發明係關於一種圖案描繪裝置及圖案描繪方法,其係將經由照度均勻化元件入射空間光調變器之光,利用空間調變器調變而照射基板。 The present invention relates to a pattern drawing device and a pattern drawing method for illuminating a substrate by modulating a light incident on a spatial light modulator via an illuminance uniformizing element by a spatial modulator.

先前,已知有將塗布了抗蝕劑等感光性材料之基板等描繪對象,曝光成圖案狀,且於描繪對象上描繪圖案之描繪之圖案描繪裝置。又,於日本特開2006-337475號公報之圖案描繪裝置中,設置有以DMD(Digital Micromirror Device:數位微鏡裝置)構成之空間光調變器,藉由該空間光調變器將來自超高壓水銀燈之光,按照應形成之圖案調變並向描繪對象照射,來將圖案描繪於描繪對象上。 Conventionally, a pattern drawing device that draws a target such as a substrate coated with a photosensitive material such as a resist and exposes it into a pattern and draws a pattern on the drawing object is known. Further, in the pattern drawing device of Japanese Laid-Open Patent Publication No. 2006-337475, a spatial light modulator including a DMD (Digital Micromirror Device) is provided, and the spatial light modulator will be derived from the super The light of the high-pressure mercury lamp is modulated in accordance with the pattern to be formed and irradiated to the object to be drawn, and the pattern is drawn on the object to be drawn.

順便一提,於此種圖案描繪裝置中,為了均勻地形成圖案,而要求照射描繪對象之光之照度分佈必需均勻。因此,日本特開2006-337475號公報中,於自超高壓水銀燈到空間光調變器之光路中,設置有照度均勻化元件即積分器,將利用積分器之功能而照度分佈之均勻性提高後之光,照射空間光調變器。藉此,可謀求照射描繪對象之光之照度分佈之均勻化。 Incidentally, in such a pattern drawing device, in order to uniformly form a pattern, it is required that the illuminance distribution of the light to be irradiated to the drawing object must be uniform. Therefore, in Japanese Laid-Open Patent Publication No. 2006-337475, an illuminance uniformizing element, that is, an integrator, is provided in an optical path from an ultrahigh pressure mercury lamp to a spatial light modulator, and the uniformity of illuminance distribution is improved by the function of the integrator. After the light, the space light modulator is illuminated. Thereby, it is possible to uniformize the illuminance distribution of the light to be irradiated.

然而,超高壓水銀燈之發光點之亮度分佈未必相同,會有不均之情形,一旦以橢圓鏡等光學系統將其聚光並導入如積分器般之照度均勻化元件,於積分器入射端照度分佈 便會產生嚴重之不均。又,即使在使用各個光纖任意排列而成之光纖束,將來自光源之光導入積分器之情形,有時亦未能使積分器入射端照度分佈相同。如此,於積分器入射端照度分佈不均之情形下,積分器之將照度分佈均勻化之能力有限。因此,一旦不均之情形嚴重,就未必能充分確保照射描繪對象之光之照度分佈之均勻性。意即,當積分器入射端照度分佈,為不能以積分器之能力來彌補般嚴重之程度時,照射描繪對象之光之照度分佈之均勻性會變得不足。或者,積分器本身具有製造誤差而功能較差之情形、或由於光路中之光學元件之透過率或反射率之不均,而使得照射描繪對象之光之照度分佈之均勻性變得不足。 However, the luminance distribution of the light-emitting points of the ultra-high pressure mercury lamp may not be the same, and there may be unevenness. Once the optical system is condensed by an optical system such as an elliptical mirror and introduced into an illuminance equalizing element such as an integrator, the illuminance at the incident end of the integrator is obtained. distributed There will be serious unevenness. Further, even in the case where the optical fiber bundle arbitrarily arranged using the respective optical fibers is used to introduce light from the light source into the integrator, the illuminance distribution at the incident end of the integrator may not be the same. Thus, in the case where the illuminance distribution at the incident end of the integrator is uneven, the integrator has a limited ability to homogenize the illuminance distribution. Therefore, once the situation of unevenness is severe, it is not always possible to sufficiently ensure the uniformity of the illuminance distribution of the light that illuminates the object to be drawn. That is, when the illuminance distribution at the incident end of the integrator is such that the inability of the integrator cannot be compensated for, the uniformity of the illuminance distribution of the light that illuminates the object to be drawn becomes insufficient. Alternatively, the integrator itself may have a manufacturing error and a poor function, or the uniformity of the illuminance distribution of the light irradiated to the drawing object may be insufficient due to the unevenness of the transmittance or the reflectance of the optical element in the optical path.

本發明係鑑於上述課題而完成者,其目的在於提供一種將經由照度均勻化元件而入射至空間光調變器之光,利用空間光調變器調變而照射描繪對象之圖案描繪裝置及圖案描繪方法中,不僅可提高照度均勻化元件之能力,亦可提高向描繪對象之照射光之照度分佈之均勻性之技術。 The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a pattern drawing device and a pattern that illuminate a light to be irradiated by a spatial light modulator by illuminating a device to illuminate a spatial light modulator. In the drawing method, not only the ability of the illuminance equalizing element but also the uniformity of the illuminance distribution of the illumination light to the drawing object can be improved.

本發明之圖案描繪裝置為了達成上述目的,其特徵為具備:發光單元,其具有複數個以與驅動信號之大小對應之亮度發光之發光部;照度均勻化元件,其係將自發光單元入射之光,於將光之照度分佈均勻化後射出;空間光調變器,其係將自照度均勻化元件射出之光調變並照射至描繪對象;及驅動控制部,其係就每個發光部個別地控制驅動信號之大小。 In order to achieve the above object, a pattern drawing device according to the present invention includes: a light-emitting unit having a plurality of light-emitting portions that emit light in accordance with a brightness corresponding to a magnitude of a driving signal; and an illuminance equalizing element that is incident on the self-light-emitting unit Light is emitted after homogenizing the illuminance distribution of the light; the spatial light modulator is configured to modulate and illuminate the light emitted by the self-illumination uniformizing element to the drawing object; and drive the control unit to each of the light emitting parts Individually control the size of the drive signal.

於如此構成之發明(圖案描繪裝置)中,設有發光單元, 其具有複數個以與驅動信號之大小對應之亮度發光之發光部;且照度均勻化元件對自發光單元入射之光,進行照度分佈之均勻化。並且,於本發明中,設置有驅動控制部,其係就每個發光部個別地控制驅動信號之大小。因此,可個別地控制每個發光部之亮度,並適當地調整入射至照度均勻化元件之光之照度分佈。其結果,不僅可提高照度均勻化元件之能力,亦可提高向描繪對象之照射光之照度分佈之均勻性。 In the invention (pattern drawing device) thus constituted, a light emitting unit is provided. The light-emitting portion has a plurality of light-emitting portions that emit light at a luminance corresponding to the magnitude of the drive signal; and the illuminance-homogenizing device uniformizes the illuminance distribution on the light incident from the light-emitting unit. Further, in the present invention, a drive control unit that individually controls the magnitude of the drive signal for each of the light-emitting portions is provided. Therefore, the brightness of each of the light-emitting portions can be individually controlled, and the illuminance distribution of the light incident to the illuminance-homogenizing element can be appropriately adjusted. As a result, not only the ability of the illuminance equalizing element but also the uniformity of the illuminance distribution of the illumination light to the drawing object can be improved.

然而,在一邊使發光單元相對於描繪對象向第1方向相對移動,一邊使發光單元所射出之光由空間光調變器予以調變,而將圖案描繪於描繪對象上之圖案描繪裝置中,複數個發光部可以將光照射至與第1方向正交之第2方向上相互不同之位置之方式構成圖案描繪裝置。於如此之構成中,照射描繪對象之光之照度不均產生於第2方向之情形下,由於在描繪對象上會顯現曝光量分佈之差,故並不理想。對此,只要如上所述以就每個發光部個別地控制驅動信號之大小之方式而構成,即可有效抑制如此之向第2方向之照度不均之發生。 However, while the light-emitting unit is relatively moved in the first direction with respect to the drawing object, the light emitted from the light-emitting unit is modulated by the spatial light modulator, and the pattern is drawn on the drawing device on the drawing target. The plurality of light-emitting portions may constitute a pattern drawing device so that the light is irradiated to a position different from each other in the second direction orthogonal to the first direction. In such a configuration, when the illuminance unevenness of the light to be irradiated is generated in the second direction, the difference in the exposure amount distribution is exhibited on the object to be drawn, which is not preferable. On the other hand, as long as the configuration of the driving signal is individually controlled for each of the light-emitting portions as described above, the occurrence of such illuminance unevenness in the second direction can be effectively suppressed.

具體而言,亦可以由複數個發光部對於照度均勻化元件入射端於第2方向上相互不同之位置照射光之方式,構成圖案描繪裝置。於如此之構成中,藉由就每個發光部個別地控制驅動信號之大小,而可使入射至照度均勻化元件入射端之光之照度分佈於第2方向上變化。此時,若照度均勻化元件入射端照度分佈向第2方向變化,則配合此,於 照度均勻化元件出射端,照度分佈亦會向第2方向些許變化。因此,藉由利用如此之照度均勻化元件之特性,可就每個發光部個別地控制驅動信號之大小,而可調整照度均勻化元件出射端之後之光之照度分佈,並可有效地抑制向上述之第2方向之照度不均之發生。 Specifically, the pattern drawing device may be configured by a plurality of light-emitting portions that illuminate light at positions where the incident ends of the illuminance-homogenizing elements are different from each other in the second direction. In such a configuration, by individually controlling the size of the drive signal for each of the light-emitting portions, the illuminance of the light incident on the incident end of the illuminance-homogenizing element can be varied in the second direction. At this time, if the illuminance uniformity element incident end illuminance distribution changes in the second direction, Illumination equalizes the exit end of the component, and the illumination distribution also changes slightly in the second direction. Therefore, by utilizing the characteristics of the illuminance equalizing element, the size of the driving signal can be individually controlled for each of the light-emitting portions, and the illuminance distribution of the light after the illuminating uniformizing element exits the end can be adjusted, and the illuminance can be effectively suppressed. The illuminance unevenness in the second direction described above occurs.

此時,亦可如下述地構成圖案描繪裝置:發光部各自以與驅動信號之大小對應之亮度發光,且係以複數個各自將光照射於第1方向上直線狀排列之位置之發光元件構成;且驅動控制部對於屬於相同之發光部之複數個發光元件共同地進行驅動信號之大小之控制。於如此之構成中,屬於相同發光部之複數個發光元件照射光之區域,係排列在相對於描繪對象發光單元相對移動之方向(第1方向)上。因此,屬於相同發光部之複數個發光元件藉由一邊相對於描繪對象向第1方向移動,一邊照射光,而向累計於相同區域之方向進行曝光。因此,即便於該等發光元件之照射光彼此具有照度之不均,但對於最終形成之圖案帶來之影響少。因此,亦可對於複數個屬於相同發光部之發光元件共同地進行驅動信號之大小之控制,來謀求驅動控制之簡化。 In this case, the pattern drawing device may be configured such that each of the light-emitting portions emits light at a luminance corresponding to the magnitude of the drive signal, and a plurality of light-emitting elements each illuminating the light in the first direction are arranged. And the drive control unit collectively controls the magnitude of the drive signal for the plurality of light-emitting elements belonging to the same light-emitting portion. In such a configuration, the light-emitting regions of the plurality of light-emitting elements belonging to the same light-emitting portion are arranged in a direction (first direction) relative to the relative movement of the light-emitting unit to be drawn. Therefore, a plurality of light-emitting elements belonging to the same light-emitting portion are irradiated with light while moving in the first direction with respect to the drawing target, and are exposed in the same direction. Therefore, even if the illumination light of the light-emitting elements has uneven illuminance, the influence on the finally formed pattern is small. Therefore, it is also possible to control the size of the drive signal for a plurality of light-emitting elements belonging to the same light-emitting portion to simplify the drive control.

具體而言,亦可如下述地構成圖案描繪裝置:發光部各自以與驅動信號之大小對應之亮度發光,且係以複數個發光元件構成,該等發光元件係各自將光照射於照度均勻化元件入射端於第1方向上直線狀排列之位置;且驅動控制部對於屬於相同之發光部之複數個發光元件共同地進行驅 動信號之大小之控制。於如此之構成中,屬於相同發光部之複數個發光元件照射光之區域,係排列在相對於描繪對象發光單元相對移動之方向(第1方向)上。因此,屬於相同發光部之複數個發光元件藉由一邊相對於描繪對象向第1方向移動,一邊照射光,而向累計於相同區域之方向進行曝光。因此,即便於該等發光元件之照射光彼此具有照度之不均,但對於最終形成之圖案帶來之影響少。因此,亦可對於複數個屬於相同發光部之發光元件,共同地進行驅動信號之大小之控制,來謀求驅動控制之簡化。 Specifically, the pattern drawing device may be configured such that each of the light-emitting portions emits light at a luminance corresponding to the magnitude of the drive signal, and is configured by a plurality of light-emitting elements that respectively illuminate the light with illumination. a position where the element incident ends are linearly arranged in the first direction; and the drive control unit drives the plurality of light-emitting elements belonging to the same light-emitting portion in common Control of the size of the motion signal. In such a configuration, the light-emitting regions of the plurality of light-emitting elements belonging to the same light-emitting portion are arranged in a direction (first direction) relative to the relative movement of the light-emitting unit to be drawn. Therefore, a plurality of light-emitting elements belonging to the same light-emitting portion are irradiated with light while moving in the first direction with respect to the drawing target, and are exposed in the same direction. Therefore, even if the illumination light of the light-emitting elements has uneven illuminance, the influence on the finally formed pattern is small. Therefore, it is also possible to collectively control the magnitude of the drive signal for a plurality of light-emitting elements belonging to the same light-emitting portion, thereby simplifying the drive control.

又,亦可以如下方式構成圖案描繪裝置:進而具備照度檢測器,其係檢測自照度均勻化元件射出後之光之照度分佈,且驅動控制部係以按照照度檢測器之檢測結果,而就每個發光部個別地控制驅動信號之大小。於如此之構成中,由於基於自檢測照度均勻化元件射出後之光之照度分佈之結果,來控制對各發光部之驅動信號之大小,故可更確實地提高向描繪對象之照射光之照度分佈之均勻性。 Further, the pattern drawing device may be configured to further include an illuminance detector that detects the illuminance distribution of the light emitted from the illuminance uniformizing element, and the driving control unit performs the detection result according to the illuminance detector. The light emitting sections individually control the magnitude of the drive signal. In such a configuration, since the size of the driving signal for each of the light-emitting portions is controlled based on the result of the illuminance distribution of the light after the illuminance uniformizing element is emitted, the illuminance of the illumination light to the drawing object can be more surely improved. Uniformity of distribution.

此時,亦可以由照度檢測器檢測照射於描繪對象之光之照度分佈之方式,構成圖案描繪裝置。藉此,可更確實地提高向描繪對象之照射光之照度分佈之均勻性。 At this time, the illuminance detector may detect the illuminance distribution of the light that is irradiated on the drawing object to form a pattern drawing device. Thereby, the uniformity of the illuminance distribution of the illumination light to the drawing object can be more reliably improved.

另外,作為空間光調變器,可使用各種者。因此,亦可以空間光調變器為DMD之方式,構成圖案描繪裝置。 In addition, as the spatial light modulator, various types can be used. Therefore, the spatial light modulator can be configured as a DMD to form a pattern drawing device.

又,本發明之圖案描繪方法為了達成上述目的,其特徵為具備如下步驟:就每個發光部個別地控制驅動信號之大小之步驟,驅動信號係提供給以與驅動信號之大小對應之 亮度發光之複數個發光部;使來自複數個發光部之光入射至將入射而來之光均勻化並射出之照度均勻化元件之步驟;及將自照度均勻化元件射出之光,以空間光調變器調變並照射於描繪對象之步驟。 Further, in order to achieve the above object, the pattern drawing method of the present invention is characterized in that the step of individually controlling the magnitude of the driving signal for each of the light-emitting portions is provided, and the driving signal is supplied to correspond to the magnitude of the driving signal. a plurality of light-emitting portions that emit light with luminance; a step of causing light from a plurality of light-emitting portions to be incident on an illuminance-homogenizing element that homogenizes and emits the incident light; and a light that emits the self-illuminating uniformizing element to the spatial light The modulator modulates and illuminates the step of rendering the object.

於如此構成之發明(圖案描繪方法)中,設置有複數個以按照驅動信號之大小之亮度而發光之發光部,且照度均勻化元件係對於自複數個發光部入射之光進行照度分佈之均勻化。並且,本發明中,設置有就每個發光部個別地控制驅動信號之大小之步驟。因此,就每個發光部可個別地控制亮度,且可適當地調整入射至照度均勻化元件之光之照度分佈。其結果,不僅可提高照度均勻化元件之能力,亦可提高向描繪對象之照射光之照度分佈之均勻性。 In the invention (pattern drawing method) configured as described above, a plurality of light-emitting portions that emit light in accordance with the brightness of the magnitude of the driving signal are provided, and the illuminance-homogenizing device uniformly distributes the illuminance distribution of the light incident from the plurality of light-emitting portions. Chemical. Further, in the present invention, a step of individually controlling the magnitude of the drive signal for each of the light-emitting portions is provided. Therefore, the brightness can be individually controlled for each of the light-emitting portions, and the illuminance distribution of the light incident to the illuminance-homogenizing element can be appropriately adjusted. As a result, not only the ability of the illuminance equalizing element but also the uniformity of the illuminance distribution of the illumination light to the drawing object can be improved.

根據本發明,將經由照度均勻化元件而入射至空間光調變器之光利用空間光調變器加以調變而照射於描繪對象之圖案描繪裝置及圖案描繪方法,不僅可提高照度均勻化元件之能力,亦可提高向描繪對象之照射光之度分佈之均勻性。 According to the present invention, the light that is incident on the spatial light modulator via the illuminance equalizing element is modulated by the spatial light modulator to illuminate the pattern drawing device and the pattern drawing method of the drawing object, thereby not only improving the illuminance uniformizing element The ability to improve the uniformity of the distribution of the illumination to the object to be drawn.

[實施形態] [Embodiment]

圖1係模式性表示可適用本發明之圖案描繪裝置之一例之側面圖。圖2係模式性表示圖1之圖案描繪裝置之部分俯視圖。圖3係表示光學感測器之搬送機構之部分俯視圖。為了顯示圖案描繪裝置1之各部分之位置關係,於該等之圖中,適宜顯示以Z軸方向為垂直方向之XYZ正交座標 軸。又,視需要而將各座標軸之圖中箭頭側,稱為正側;且將各座標軸之圖中箭頭之相反側,稱為負側。 Fig. 1 is a side view schematically showing an example of a pattern drawing device to which the present invention is applicable. Fig. 2 is a partial plan view schematically showing the pattern drawing device of Fig. 1. Fig. 3 is a partial plan view showing the conveying mechanism of the optical sensor. In order to display the positional relationship of each part of the pattern drawing device 1, in the figures, it is suitable to display the XYZ orthogonal coordinates in the vertical direction of the Z-axis direction. axis. Further, the side of the arrow in the graph of each coordinate axis is referred to as a positive side as needed, and the side opposite to the arrow in the figure of each coordinate axis is referred to as a negative side.

圖案描繪裝置1係自Y軸方向之負側之搬入口11,搬入裝置內部之基板S並執行利用曝光之圖案描繪,且自Y軸方向之正側之搬出口12,將圖案描繪完成之基板S搬出者。基板S係於其上表面(一方主平面)塗布了抗蝕劑等感光材料之半導體基板或FPC(Flexible Printed Circuits:可撓式印刷電路)用基板,電漿顯示裝置或有機EL(Electro-Luminescence:電致發光)顯示裝置等表面顯示裝置用之玻璃基板,或者印刷電路板等。該圖案描繪裝置1係具有一種概略構成,其包含:支撐被搬入之基板S之支撐部3;將受支撐部3支撐之基板S曝光之曝光部5;拍攝基板S之對準標記之攝像部9;及控制3、5、9各部之控制器100。 The pattern drawing device 1 is a substrate 11 that is loaded from the negative side of the Y-axis direction, and is loaded into the substrate S inside the device, and is patterned by the pattern of the exposure, and the substrate 12 is drawn from the positive side in the Y-axis direction. S moved out. The substrate S is a semiconductor substrate coated with a photosensitive material such as a resist or a substrate for FPC (Flexible Printed Circuits) on its upper surface (one main plane), a plasma display device or an organic EL (Electro-Luminescence) : electroluminescence) A glass substrate for a surface display device such as a display device, or a printed circuit board or the like. The pattern drawing device 1 has a schematic configuration including a support portion 3 that supports the substrate S loaded therein, an exposure portion 5 that exposes the substrate S supported by the support portion 3, and an imaging portion that photographs the alignment mark of the substrate S. 9; and controller 100 of each of the 3, 5, and 9 controls.

支撐部3中,設置有:吸附並支撐載置於其上表面之基板S之支撐台31;及設置於支撐台31之Y軸方向兩側之一對剝離滾輪32。意即,支撐台31係於水平形成之上表面上具有多個吸引孔,藉由省略圖示之吸引機構吸引各吸引孔,而將載置於支撐台31上表面之基板S吸附於支撐台上。藉此,可利用支撐台31確實地支撐被搬入之基板S,並安定地執行對基板S之圖案描繪。又,結束圖案描繪後搬出基板S時,藉由停止吸引孔之吸引,且一對剝離滾輪32上升頂起基板S,來使基板S自支撐台31剝離。 The support portion 3 is provided with a support table 31 that adsorbs and supports the substrate S placed on the upper surface thereof, and a pair of peeling rollers 32 that are provided on both sides of the support table 31 on the Y-axis direction. That is, the support table 31 has a plurality of suction holes on the horizontally formed upper surface, and the suction holes are attracted by the suction mechanism (not shown), and the substrate S placed on the upper surface of the support table 31 is adsorbed to the support table. on. Thereby, the substrate S loaded therein can be reliably supported by the support table 31, and the pattern drawing of the substrate S can be performed stably. When the substrate S is finished and the substrate S is finished, the suction of the suction holes is stopped, and the pair of peeling rollers 32 are lifted up to lift the substrate S, thereby peeling off the substrate S from the support table 31.

又,支撐部3中,支撐台31係介隔升降台33、旋轉台34及支撐板35而連接於線性馬達37之可動子37a。因此,支 撐台31係利用升降台33自由升降,且利用旋轉台34自由旋轉。此外,藉由沿著於Y軸方向延伸之線性馬達37之固定子37b驅動可動子37a,而可於自搬入口11至搬出口12之範圍內,於Y軸方向驅動支撐台31。另外,係以隨著支撐台31,一對剝離滾輪32亦移動之方式而構成。 Further, in the support portion 3, the support base 31 is connected to the movable member 37a of the linear motor 37 via the lift table 33, the turntable 34, and the support plate 35. Therefore, The support 31 is freely movable up and down by the lift table 33, and is freely rotatable by the turntable 34. Further, by driving the movable member 37a along the stator 37b of the linear motor 37 extending in the Y-axis direction, the support table 31 can be driven in the Y-axis direction within the range from the inlet 11 to the outlet 12. Further, the pair of peeling rollers 32 are also moved in accordance with the support table 31.

此外,支撐台31係如圖3所示,於該支撐台31之Y軸方向前端部具備檢測光學頭6照射於受該支撐台31支撐之基板S之表面(相當之位置)之光之照度分佈之光學感測器SC、及於X軸方向移動光學感測器SC之搬送機構20。光學感測器SC係配置於支撐台31之上表面之支撐台31之(+Y)側。後面會明白於進行利用光學頭6調整光之照度分佈之動作時,藉由將支撐台31沿著主掃描方向(Y軸方向)移動,使光學頭6成為配置於光學感測器SC之正上方之狀態。 Further, as shown in FIG. 3, the support table 31 is provided with illumination at the front end portion of the support table 31 in the Y-axis direction to detect the light that the optical head 6 is irradiated on the surface (equivalent position) of the substrate S supported by the support table 31. The distributed optical sensor SC and the transport mechanism 20 that moves the optical sensor SC in the X-axis direction. The optical sensor SC is disposed on the (+Y) side of the support table 31 on the upper surface of the support table 31. As will be understood later, when the operation of adjusting the illuminance distribution of the light by the optical head 6 is performed, the optical head 6 is placed in the optical sensor SC by moving the support table 31 in the main scanning direction (Y-axis direction). The state above.

光學感測器SC係具有將針孔、擴散板、受光元件即光電二極體配置於框體41之內部之構造。自光學頭6所照射之二維區域之調變光,會被導入框體41內部檢測其光量。搬送機構20係具備配設於副掃描方向(X軸方向)之滾珠螺桿21、固定於支撐台31上且配設於支撐框體41之副掃描方向之2根導軌22、及連接於滾珠螺桿21之馬達23。 The optical sensor SC has a structure in which a pinhole, a diffusion plate, and a photodiode which is a light receiving element are disposed inside the casing 41. The modulated light of the two-dimensional region irradiated from the optical head 6 is introduced into the inside of the casing 41 to detect the amount of light. The transport mechanism 20 includes a ball screw 21 disposed in the sub-scanning direction (X-axis direction), two guide rails 22 fixed to the support table 31 and disposed in the sub-scanning direction of the support frame 41, and a ball screw connected thereto. 21 motor 23.

圖案描繪裝置1係於後述之檢測光之照度分佈之動作時,滾珠螺桿21利用搬送機構20之馬達23而旋轉,光學感測器SC則沿著導軌22,即沿著副掃描方向而向特定方向移動。藉此,自光學頭6照射之調變光,係利用光學感測器SC之光電二極體,依每個發光元件601依序受光及檢測。 將檢測出之光信號,分別發送至照射控制部130進行記憶且進行特定之運算處理。 When the pattern drawing device 1 is operated by the illuminance distribution of the detection light described later, the ball screw 21 is rotated by the motor 23 of the conveying mechanism 20, and the optical sensor SC is specified along the guide rail 22, that is, along the sub-scanning direction. Move in direction. Thereby, the modulated light irradiated from the optical head 6 is sequentially received and detected by each of the light-emitting elements 601 by the photodiode of the optical sensor SC. The detected optical signals are sent to the illumination control unit 130 for storage and subjected to specific arithmetic processing.

另外,此處,光學感測器SC係藉由一邊受光,一邊利用搬送機構20之驅動而移動,來檢測出光。然而,檢測光之具體形態,並不限於此。因此,亦可不設置搬送機構20,而使光學感測器SC相對於支撐台31為固定設置之形態。該情形時,光學感測器SC藉由支撐台31之主掃描方向及支撐台51之副掃描方向之移動,相對於光學頭6相對移動地檢測光。 Here, the optical sensor SC detects light by moving by the driving of the transport mechanism 20 while receiving light. However, the specific form of the detection light is not limited to this. Therefore, the optical sensor SC may be fixedly disposed with respect to the support base 31 without providing the transport mechanism 20. In this case, the optical sensor SC detects light relative to the optical head 6 by relative movement of the main scanning direction of the support table 31 and the sub-scanning direction of the support table 51.

曝光部5係具有複數個光學頭6,該等光學頭6係相對於支撐台31之可動區域而配置於上方側。各光學頭6係向於其下方受支撐台31支撐之基板S射出光,使基板S曝光者。另外,複數個光學頭6係排列設置於X軸方向,於X軸方向擔當相互不同之區域之曝光。又,支撐複數個光學頭6之支撐台51,係沿著於X軸方向延伸之一對線性導件52而自由移動。因此,利用省略圖示之線性馬達,沿著線性導件52驅動支撐台,而可使複數個光學頭6共同地於X軸方向移動。 The exposure unit 5 has a plurality of optical heads 6 that are disposed on the upper side with respect to the movable area of the support base 31. Each of the optical heads 6 emits light to the substrate S supported by the support table 31 below, and exposes the substrate S. Further, a plurality of optical heads 6 are arranged in the X-axis direction, and are exposed to mutually different regions in the X-axis direction. Further, the support table 51 supporting the plurality of optical heads 6 is freely movable to the linear guide 52 along one of the X-axis directions. Therefore, the support table is driven along the linear guide 52 by a linear motor (not shown), and the plurality of optical heads 6 can be moved in the X-axis direction in common.

攝像部9係具有於X軸方向隔著間隔而排列之2個CCD(Charge Coupled Device:電荷耦合裝置)攝像機91。該等之CCD攝像機91係利用省略圖示之驅動機構,而向X軸方向自由移動地構成,移動至形成於基板S之對準標記之上方,拍攝該對準標記。 The imaging unit 9 has two CCD (Charge Coupled Device) cameras 91 arranged at intervals in the X-axis direction. These CCD cameras 91 are configured to be freely movable in the X-axis direction by a drive mechanism (not shown), and are moved above the alignment marks formed on the substrate S to take the alignment marks.

以上係圖案描繪裝置1之機械性構成之概要。接著,就 圖案描繪裝置1之電性構成即控制器100進行說明。控制器100係主要執行使來自光學頭6之照射光於受支撐台31支撐之基板S表面上掃描,並於基板S表面描繪圖案之動作者,係以資料處理部110、掃描控制部120及照射控制部130而構成。 The outline of the mechanical configuration of the above-described pattern drawing device 1. Then, just The controller 100 will be described as an electrical configuration of the pattern drawing device 1. The controller 100 mainly performs an operation of scanning the surface of the substrate S supported by the support table 31 by the irradiation of the optical head 6 and drawing a pattern on the surface of the substrate S, and the data processing unit 110 and the scanning control unit 120 are The illumination control unit 130 is configured.

資料處理部110係將由CAD(computer aided design:電腦輔助設計)等生成之圖像資料,轉換成描繪資料而輸出至掃描控制部120。另一方面,掃描控制部120係基於描繪資料來控制支撐台31及光學頭6於圖案描繪動作中之移動。又,照射控制部130係控制圖案描繪動作中光學頭6之光之照射。更具體而言,圖案描繪動作係如下般執行。 The data processing unit 110 converts image data generated by CAD (computer aided design) or the like into drawing data, and outputs the image data to the scan control unit 120. On the other hand, the scan control unit 120 controls the movement of the support table 31 and the optical head 6 in the pattern drawing operation based on the drawing data. Further, the irradiation control unit 130 controls the irradiation of the light of the optical head 6 in the pattern drawing operation. More specifically, the pattern drawing operation is performed as follows.

開始圖案描繪動作之際,控制器100係使攝像部9拍攝附加在基板S上之對準標記。並且,控制器100藉由基於攝像部9之拍攝結果,調整支撐台31與光學頭6之位置關係,而將複數個光學頭6定位於開始對支撐台31上之基板S曝光之位置。 When the pattern drawing operation is started, the controller 100 causes the imaging unit 9 to take an alignment mark attached to the substrate S. Further, the controller 100 adjusts the positional relationship between the support table 31 and the optical head 6 based on the imaging result of the imaging unit 9, and positions the plurality of optical heads 6 at positions where the exposure of the substrate S on the support table 31 is started.

當該定位結束,支撐台31便開始向Y軸方向之一側(例如Y軸負側)移動。並且,複數個光學頭6之各者對於隨著該支撐台31移動之基板S之表面照射與描繪資料對應之圖案之光。藉此,複數個光學頭6各自將照射光對基板S於Y軸方向(主掃描方向)掃描,並將1線份之圖案(線圖)形成於基板S表面。如此,於X軸方向空開間隔排列而形成與光學頭6之個數對應之複數個線圖。 When the positioning is completed, the support table 31 starts moving toward one side in the Y-axis direction (for example, the negative side of the Y-axis). Further, each of the plurality of optical heads 6 illuminates the surface of the substrate S that moves with the support table 31 with the pattern corresponding to the drawing material. Thereby, each of the plurality of optical heads 6 scans the substrate S in the Y-axis direction (main scanning direction), and forms a pattern (line diagram) of one line on the surface of the substrate S. In this manner, a plurality of line patterns corresponding to the number of the optical heads 6 are formed at intervals in the X-axis direction.

該複數個線圖之形成結束後,控制器100使光學頭6於X 軸方向(副掃描方向)移動。藉此,複數個光學頭6之各者對向於預先形成之複數個線圖之間。並且,若支撐台31開始向與剛才相反側之Y軸方向之另一側(例如Y軸正側)移動,則複數個光學頭6之各者對於隨著該支撐台31而移動之基板S之表面照射與描繪資料對應之圖案之光。 After the formation of the plurality of line graphs, the controller 100 causes the optical head 6 to be X. The axis direction (sub-scan direction) moves. Thereby, each of the plurality of optical heads 6 is opposed to a plurality of pre-formed line patterns. Further, when the support table 31 starts moving toward the other side (for example, the Y-axis positive side) of the Y-axis direction opposite to the opposite side, each of the plurality of optical heads 6 moves the substrate S with the support table 31. The surface illuminates the light of the pattern corresponding to the data.

如此,使光學頭6之照射光於預先形成之複數個線圖之彼此之間掃描,形成新的線圖。如此地,藉由一邊使光學頭6於X軸方向間歇移動,一邊依序形成複數個線圖,而對基板S之表面整體描繪圖案。 In this manner, the illumination light of the optical head 6 is scanned between the plurality of line patterns formed in advance to form a new line pattern. In this manner, a plurality of line patterns are sequentially formed while intermittently moving the optical head 6 in the X-axis direction, and a pattern is drawn on the entire surface of the substrate S.

以上係圖案描繪裝置1之概要。接著,就光學頭6之詳細進行說明。另外,因複數個光學頭6互相具備相同之構成,故此處僅就1個光學頭6進行說明。圖4係模式性表示光學頭所具備之概略構成之立體圖。 The outline of the above-described pattern drawing device 1. Next, the details of the optical head 6 will be described. Further, since the plurality of optical heads 6 have the same configuration, only one optical head 6 will be described here. Fig. 4 is a perspective view schematically showing a schematic configuration of an optical head.

光學頭6係具備如下之概略構成:將光源陣列60所射出之光經由棒狀之積分器即桿積算器70入射至光調變器即空間光調變器80,且將利用空間光調變器80予以空間調變後之光照射至基板S表面之照射區域Re。如圖4所示,於光學頭6設置有2個光學陣列60,相對於該等各個光源陣列60,對向配置有透鏡陣列61。並且,彼此對向之光源陣列60與透鏡陣列61係作為光源面板62而一體化。 The optical head 6 has a schematic configuration in which light emitted from the light source array 60 is incident on a spatial light modulator 80, which is a light modulator, via a rod integrator 70, and is modulated by spatial light. The light 80 that has been spatially modulated by the device 80 is irradiated to the irradiation region Re of the surface of the substrate S. As shown in FIG. 4, two optical arrays 60 are provided in the optical head 6, and a lens array 61 is disposed opposite to each of the light source arrays 60. Further, the light source array 60 and the lens array 61 that face each other are integrated as the light source panel 62.

圖5係模式性表示光源面板之概略構成之側視圖。圖6係模式性表示光源面板之概略構成之俯視圖。圖7係模式性表示光源面板之概略構成之立體圖。於該等之圖中,符號Aoa係表示光學頭6之光軸方向。另外,2個光源面板62僅 在自發光元件射出之光之波長方面不同,其他之構成彼此相同。因此,以下基本上顯示1個光源面板62而進行說明。如圖5~圖7所示,光源面板62之光源陣列60具有將12個發光元件601於平板狀之電極基板602上以二維排列3列4行之構成。此時,不論於列方向或行方向之任一者,鄰接之發光元件601之間隔皆相等,且複數個發光元件601均同樣地配置。此處,特別將由排列於行方向上之3個發光元件601所構成之集合稱為發光元件行601C。 Fig. 5 is a side view schematically showing a schematic configuration of a light source panel. Fig. 6 is a plan view schematically showing a schematic configuration of a light source panel. Fig. 7 is a perspective view schematically showing a schematic configuration of a light source panel. In the figures, the symbol Aoa indicates the optical axis direction of the optical head 6. In addition, the two light source panels 62 are only The wavelengths of the light emitted from the light-emitting elements are different, and the other configurations are identical to each other. Therefore, the following description basically shows one light source panel 62. As shown in FIGS. 5 to 7, the light source array 60 of the light source panel 62 has twelve light-emitting elements 601 arranged in two rows and four rows on the flat electrode substrate 602. At this time, the interval between the adjacent light-emitting elements 601 is equal regardless of the column direction or the row direction, and a plurality of light-emitting elements 601 are equally arranged. Here, in particular, a set of three light-emitting elements 601 arranged in the row direction is referred to as a light-emitting element row 601C.

各發光元件601係以與驅動電流Id(圖1)對應之亮度發光者,具體而言,係以射出紫外線光之LED(Light Emitting Diode:發光二極體)之裸晶片而構成。即,於本實施形態中,將複數個LED排列使用。更詳細而言,發光元件601係由陶瓷封裝構成,該陶瓷封裝係將具有方形之發光區域之LED晶片收納於內部。並且,於各陶瓷封裝之前面,設置有用於保護內部之覆蓋玻璃。 Each of the light-emitting elements 601 is configured to emit light having a luminance corresponding to the driving current Id (FIG. 1), specifically, a bare wafer of an LED (Light Emitting Diode) that emits ultraviolet light. That is, in the present embodiment, a plurality of LEDs are arranged and used. More specifically, the light-emitting element 601 is composed of a ceramic package in which an LED chip having a square light-emitting region is housed. Further, a cover glass for protecting the inside is provided in front of each ceramic package.

如此地將複數個LED排列使用的理由之一,係如下所述。先前,一般係將超高壓水銀燈作為光源來使用。另一方面,相對於該種超高壓水銀燈,LED具有效率高、壽命長、單色發光及節省空間等優點。本實施形態係著眼於如此之優點,而使用LED作為光源者。但,單一之LED係恐有曝光所需之光量不足之虞。因此,藉由排列複數個LED,來確保充足之光量。而且,由於LED與超高壓水銀燈比明顯為小型,故即便排列複數個LED,亦無損節省空間之優點。如此,本實施形態係藉由排列複數個LED來使 用,而可邊確保充足之光量,邊有效發揮LED所持有之優點。 One of the reasons for arranging a plurality of LEDs in this manner is as follows. Previously, an ultrahigh pressure mercury lamp was generally used as a light source. On the other hand, compared with the ultra-high pressure mercury lamp, the LED has the advantages of high efficiency, long life, monochromatic illumination and space saving. This embodiment focuses on such an advantage and uses an LED as a light source. However, a single LED system may lack the amount of light required for exposure. Therefore, a sufficient amount of light is ensured by arranging a plurality of LEDs. Moreover, since the ratio of the LED to the ultra-high pressure mercury lamp is obviously small, even if a plurality of LEDs are arranged, the advantage of saving space is not lost. Thus, this embodiment is achieved by arranging a plurality of LEDs. Use, while ensuring a sufficient amount of light, while effectively playing the advantages of LED.

另一方面,光源面板62之透鏡陣列61,係一對一地對應於12個發光元件601,且使形成各LED晶片之發光區域之像之透鏡群,與LED晶片之排列對應,排列成相同縱橫二維3×4之12個而成者,且每1個發光元件601從發光元件601側觀察,係具有以雙凸之第1透鏡611及平凸之第2透鏡612之2枚而構成之透鏡群,將該等安裝於框上而構成。意即,與光源陣列60之發光元件601之排列相同,透鏡陣列61中,12個第1透鏡611及12個第2透鏡612係分別以3列4行而排列著。如此,於各個12個發光元件601,2個透鏡611、612成為對向,來自於各發光元件601之光透過第1透鏡611、第2透鏡612而向光源面板62之外側射出。另外,如上所述,於光學頭6設置有2個光源面板62。該等中,光源面板62a之發光元件601,係射出中心波長385[nm]之光,光源面板62b之發光元件601,則射出中心波長365[nm]之光。意即,光源面板62a、62b會射出中心波長彼此不同之光。 On the other hand, the lens array 61 of the light source panel 62 corresponds to the twelve light-emitting elements 601 one-to-one, and the lens groups forming the image of the light-emitting areas of the respective LED chips are arranged in the same manner as the arrangement of the LED chips. 12 vertical and horizontal two-dimensional 3×4, and each of the light-emitting elements 601 is formed of two of the first lens 611 and the second convex lens 612 which are biconvex, as viewed from the side of the light-emitting element 601. The lens group is configured by being mounted on a frame. That is, in the same manner as the arrangement of the light-emitting elements 601 of the light source array 60, in the lens array 61, the twelve first lenses 611 and the twelve second lenses 612 are arranged in three rows and four rows, respectively. As described above, in each of the twelve light-emitting elements 601, the two lenses 611 and 612 are opposed to each other, and the light from each of the light-emitting elements 601 is transmitted through the first lens 611 and the second lens 612 to the outside of the light source panel 62. Further, as described above, two light source panels 62 are provided in the optical head 6. In these cases, the light-emitting element 601 of the light source panel 62a emits light having a center wavelength of 385 [nm], and the light-emitting element 601 of the light source panel 62b emits light having a center wavelength of 365 [nm]. That is, the light source panels 62a, 62b emit light having different center wavelengths from each other.

返回至圖4繼續光學6之說明。分別自2個光源面板62射出之光係入射至雙色鏡63。該雙色鏡63係一邊將其一面(透過側)朝向光源面板62a,一邊將其另一面(反側面)朝向光源面板62b。並且,來自光源面板62a之各發光元件601之光(12個光),係自雙色鏡63之一面向另一面透過;又,來自光源面板62b之各發光元件601之光(12個光),係在雙 色鏡63之另一面反射。如此,利用雙色鏡63,合成各個中心波長不同之光。 Returning to Figure 4, the description of Continuation Optics 6 is continued. The light beams respectively emitted from the two light source panels 62 are incident on the dichroic mirror 63. The dichroic mirror 63 faces the light source panel 62a while facing the other side (reverse side) of the light source panel 62a. Further, light (12 lights) from each of the light-emitting elements 601 of the light source panel 62a is transmitted from one surface of the dichroic mirror 63 to the other surface; and light (12 light) from each of the light-emitting elements 601 of the light source panel 62b, In the double The other side of the color mirror 63 reflects. In this manner, light of different center wavelengths is synthesized by the dichroic mirror 63.

順便一提,由於雙色鏡63所合成之光之中心波長之差係20[nm]程度,故雙色鏡63需要具有較傾斜之邊緣之分光反射率(分光透過率)之特性。對此,一旦向雙色鏡63之入射角為45度以上,PS偏極分量之光學特性便會產生分離而無法獲得傾斜之特性。因此,將分別自光源面板62a、62b射出之光,設定為向雙色鏡63入射之入射角為小於40度。 Incidentally, since the difference in the center wavelength of the light synthesized by the dichroic mirror 63 is about 20 [nm], the dichroic mirror 63 is required to have the characteristic of the spectral reflectance (the spectral transmittance) of the inclined edge. On the other hand, when the incident angle to the dichroic mirror 63 is 45 degrees or more, the optical characteristics of the PS polarized component are separated and the tilt property is not obtained. Therefore, the light beams respectively emitted from the light source panels 62a and 62b are set such that the incident angle incident on the dichroic mirror 63 is less than 40 degrees.

自雙色鏡63射出之12個光係向透鏡陣列64入射。該透鏡陣列64與透鏡陣列61相同,具有與12個發光元件601一對一地對應而排列之12個透鏡641之構成。意即,於透鏡陣列64,設置有與自雙色鏡63射出之12個光一對一地對應之12個透鏡641。又,於各透鏡641上,形成有所對應之各發光元件601之擴大投影像,各發光元件601與所對應之各透鏡641,於光學上具有共軛關係,各透鏡641係作為場透鏡而發揮功能者。因此,於自雙色鏡63射出之各光透過透鏡641後,主光線與光軸方向平行進行。如此,成為自透鏡陣列64射出的係,主光線與光軸平行之12個光束。 The twelve light beams emitted from the dichroic mirror 63 are incident on the lens array 64. The lens array 64 has the same configuration as the lens array 61, and has twelve lenses 641 arranged in a one-to-one correspondence with the twelve light-emitting elements 601. That is, the lens array 64 is provided with twelve lenses 641 that correspond one-to-one with the twelve lights emitted from the dichroic mirror 63. Further, an enlarged projection image of each of the corresponding light-emitting elements 601 is formed on each of the lenses 641, and each of the light-emitting elements 601 and the corresponding lenses 641 are optically conjugated, and each lens 641 is used as a field lens. Play the function. Therefore, after the respective lights emitted from the dichroic mirror 63 pass through the lens 641, the chief ray is parallel to the optical axis direction. In this way, it becomes the system which is emitted from the lens array 64, and the main beam is 12 beams parallel to the optical axis.

自透鏡陣列64射出之光係入射至以3枚透鏡65a、65b、65c構成之光學系統65。該光學系統65係兩側遠心之光學系統,將透鏡陣列64之像縮小投影至桿積算器70之入射端70a,且以主光線與光軸平行之方式,將自光學系統65射出之光入射至桿積算器70。 The light emitted from the lens array 64 is incident on the optical system 65 composed of the three lenses 65a, 65b, and 65c. The optical system 65 is a telecentric optical system on both sides, and the image of the lens array 64 is reduced and projected onto the incident end 70a of the rod accumulator 70, and the light emitted from the optical system 65 is incident in such a manner that the chief ray is parallel to the optical axis. To the rod totalizer 70.

圖8係入射至桿積算器70之光之光路圖。於該圖中,符 號Aoa係表示光學頭6之光軸方向。如該圖所示,自光源陣列60射出之光,係利用透鏡陣列61而成像於透鏡陣列64上。此時之成像倍率,係以光源陣列60之發光元件601之像,成為透鏡陣列64之透鏡641之外形以上之大小之方式來設定。又,透鏡陣列64之形狀,係與桿積算器70之入射端70a之形狀相似。透過該透鏡陣列64之光,係作為主光線與光軸方向Aoa平行之平行光,入射至兩側遠心光學系統65。並且,自光學系統65射出之光,係作為主光線與光軸方向Aoa平行之平行光,而縮小投影於桿積算器70之入射端70a。 FIG. 8 is an optical path diagram of light incident on the rod totalizer 70. In the figure, the symbol No. Aoa indicates the optical axis direction of the optical head 6. As shown in the figure, the light emitted from the light source array 60 is imaged on the lens array 64 by the lens array 61. The imaging magnification at this time is set such that the image of the light-emitting element 601 of the light source array 60 is equal to or larger than the shape of the lens 641 of the lens array 64. Further, the shape of the lens array 64 is similar to the shape of the incident end 70a of the rod totalizer 70. The light transmitted through the lens array 64 is incident on the bilateral telecentric optical system 65 as parallel light in which the chief ray is parallel to the optical axis direction Aoa. Further, the light emitted from the optical system 65 is reduced as parallel light which is parallel to the optical axis direction Aoa, and is projected and projected on the incident end 70a of the rod totalizer 70.

返回至圖4繼續說明。桿積算器70係將入射至入射端70a後之光均勻化其光之照度分佈,而自出射端70b射出。另外,作為桿積算器70,可使用空心桿型或實心桿型等各種者。又,雖然桿積算器70之入射端70a與出射端70b成為彼此相似之形狀,但彼此之尺寸無需相同,可使用自入射端70a到70b形成錐形之桿積算器70。 Returning to Figure 4, the description continues. The rod totalizer 70 homogenizes the light incident on the incident end 70a to illuminate the light, and emits it from the exit end 70b. Further, as the rod totalizer 70, various types such as a hollow rod type or a solid rod type can be used. Further, although the incident end 70a and the exit end 70b of the rod totalizer 70 are similar to each other, the sizes of the rod totalizers 70a need not be the same, and the rod-shaped totalizer 70 may be formed from the incident ends 70a to 70b.

自桿積算器70之出射端70b射出之光,係經由2枚透鏡66、平面鏡67a及凹面鏡67b,而入射至空間光調變器80。另外,桿積算器70之出射端70b與空間光調變器80,在光學上係共軛關係。該空間光調變器80係以將許多微鏡排列成格子狀之DMD所構成。空間光調變器80之微鏡,係利用來自於照射控制部130之控制信號來控制,而採取對應於打開狀態或關閉狀態之任一者之姿態。對應於打開狀態之姿態之微鏡,係將來自於桿積算器70之光向第1投影透鏡 68反射。另一方面,對應於關閉狀態之姿態之微透鏡,係將來自於桿積算器70之光,向偏離第1投影透鏡68之方向反射。因此,來自桿積算器70之光係利用空間光調變器80之處於打開狀態之微鏡反射,而向第1投影透鏡68入射。 The light emitted from the exit end 70b of the rod totalizer 70 is incident on the spatial light modulator 80 via the two lenses 66, the plane mirror 67a, and the concave mirror 67b. In addition, the exit end 70b of the rod totalizer 70 is optically conjugated to the spatial light modulator 80. The spatial light modulator 80 is constructed by a DMD in which a plurality of micromirrors are arranged in a lattice shape. The micromirror of the spatial light modulator 80 is controlled by a control signal from the illumination control unit 130, and adopts a posture corresponding to either the open state or the closed state. The micromirror corresponding to the posture of the open state, the light from the rod totalizer 70 is directed to the first projection lens 68 reflections. On the other hand, the microlens corresponding to the posture of the closed state reflects the light from the rod totalizer 70 in a direction deviating from the first projection lens 68. Therefore, the light from the rod totalizer 70 is reflected by the micromirror in the open state of the spatial light modulator 80, and is incident on the first projection lens 68.

並且,第1投影透鏡68與第2投影透鏡69係具有作為一對投影透鏡之功能,藉由變更彼此間之間隔來調整倍率後,將空間光調變器80之像投影於基板S表面之照射區域Re。另外,空間光調變器80之微鏡與基板S表面之照射區域Re於光學上係共軛關係。又,圖4所示之光學頭6,係具備自動調整聚焦之自動對焦機構95。該自動對焦機構95係以將光照射於照射區域Re之照射部96、及接收來自於照射區域Re之反射光之受光部97所構成,且基於受光部97之受光結果,於上下方向驅動第2投影透鏡69,藉此自動調整聚焦。 Further, the first projection lens 68 and the second projection lens 69 have a function as a pair of projection lenses, and after adjusting the magnification by changing the interval therebetween, the image of the spatial light modulator 80 is projected on the surface of the substrate S. Irradiation area Re. In addition, the micromirror of the spatial light modulator 80 and the illumination region Re of the surface of the substrate S are optically conjugated. Further, the optical head 6 shown in Fig. 4 is provided with an autofocus mechanism 95 for automatically adjusting the focus. The autofocus mechanism 95 is configured by an illuminating unit 96 that illuminates the irradiation area Re and a light receiving unit 97 that receives reflected light from the irradiation area Re, and is driven in the vertical direction based on the light receiving result of the light receiving unit 97. 2 Projection lens 69, whereby the focus is automatically adjusted.

圖9係模式性表示照射桿積算器70之發光元件601之像之俯視圖。該圖中,單位像IM係將來自於1個發光元件601之光照射桿積算器70所獲得之像。如該圖所示,於桿積算器70中,以3列4行排列有12個單位像,其係對應於光源陣列60之12個發光元件601之3列4行配置。其結果,屬於相同發光元件行之601C之3個發光元件601所照射之3個單位像IM,係於相當於基板S之Y軸方向之方向上,以直線狀排列而構成單位像行IMC。意即,屬於相同之單位像行IMC之3個單位像IM,會排列於相當於基板S之光之掃描方向,即基板S之Y軸方向之方向上。 FIG. 9 is a plan view schematically showing an image of the light-emitting element 601 of the illumination rod totalizer 70. In the figure, the unit image IM is irradiated with light from one light-emitting element 601 to an image obtained by the rod totalizer 70. As shown in the figure, in the rod totalizer 70, twelve unit images are arranged in three rows and four rows, which are arranged in three rows and four rows corresponding to the twelve light-emitting elements 601 of the light source array 60. As a result, the three unit images IM irradiated by the three light-emitting elements 601 belonging to the 601C of the same light-emitting element row are linearly arranged in the direction corresponding to the Y-axis direction of the substrate S to constitute the unit image line IMC. That is, the three unit images IM belonging to the same unit image line IMC are arranged in the scanning direction of the light corresponding to the substrate S, that is, in the direction of the Y-axis direction of the substrate S.

並且,本實施形態中,如圖9所示,為了調整照射桿積算器70之光之照度分佈,單位像IM之照度係可個別地變更。具體而言,照射控制部130係就每個發光元件601個別地控制驅動電流Id之大小。藉此,就每個發光元件601個別地控制其亮度,而個別地控制單位像IM之照度。藉此,可調整照射區域Re之照度分佈。此時,照射控制部130係基於光學感測器SC所檢測出之照射區域Re之照度分佈之結果,來控制各發光元件601之驅動電流Id。 Further, in the present embodiment, as shown in Fig. 9, in order to adjust the illuminance distribution of the light of the illumination rod totalizer 70, the illuminance of the unit image IM can be individually changed. Specifically, the illumination control unit 130 individually controls the magnitude of the drive current Id for each of the light-emitting elements 601. Thereby, the luminance of the unit image IM is individually controlled for each of the light-emitting elements 601 by individually controlling the luminance thereof. Thereby, the illuminance distribution of the irradiation area Re can be adjusted. At this time, the irradiation control unit 130 controls the driving current Id of each of the light-emitting elements 601 based on the result of the illuminance distribution of the irradiation region Re detected by the optical sensor SC.

如上所述,於本實施形態中,設置有光源陣列60,其具有複數個以按照驅動電流Id之大小之亮度發光之發光元件601,且桿積算器70對於自光源陣列60入射之光,進行照度分佈之均勻化。並且,於本實施形態中,設置有照射控制部130,其係就每個發光元件601個別地控制驅動信號Id之大小。桿積算器70係具有如下特性:於桿積算器70之入射端70a之一方向具有照度不均之情形時,於桿積算器70之出射端70b亦會於相同方向產生些許照度分佈。因此,可就每個發光元件601個別地控制亮度,且可適當地調整桿積算器70之出射端70b之照度分佈。其結果,不僅可提高桿積算器70之能力,亦可提高桿積算器70之出射端70b之照度分佈之均勻性。 As described above, in the present embodiment, the light source array 60 is provided having a plurality of light-emitting elements 601 that emit light in accordance with the luminance of the driving current Id, and the rod totalizer 70 performs light incident on the light source array 60. Uniformity of illuminance distribution. Further, in the present embodiment, the illumination control unit 130 is provided to individually control the magnitude of the drive signal Id for each of the light-emitting elements 601. The rod totalizer 70 has a characteristic that when the illuminance is uneven in one of the incident ends 70a of the rod totalizer 70, the exit end 70b of the rod totalizer 70 also produces a slight illuminance distribution in the same direction. Therefore, the brightness can be individually controlled for each of the light-emitting elements 601, and the illuminance distribution of the exit end 70b of the rod totalizer 70 can be appropriately adjusted. As a result, not only the ability of the rod totalizer 70 but also the uniformity of the illuminance distribution of the exit end 70b of the rod totalizer 70 can be improved.

不過,本實施形態之圖案描繪裝置1係一邊相對於基板S之表面使光源陣列60向Y軸方向相對移動,一邊將光源陣列60所射出之光於空間光調變器80調變,而於基板S表面描繪圖案。此時,於照射基板S表面之光之照度不均係產 生於X軸方向之情形,由於在基板S表面會顯現曝光量分佈之差,故並不理想。相對於此,本實施形態中,於將桿積算器70之出射端70b投影於空間調變元件80,且進而利用第1投影透鏡68、第2投影透鏡69投影於照射區域Re之構成中,因曝光X軸方向之相互不同區域之4個發光元件601之驅動信號Id之大小,係就每個發光元件601個別地控制,故可有效地抑制向X軸方向之照度不均之發生。 However, the pattern drawing device 1 of the present embodiment modulates the light emitted from the light source array 60 to the spatial light modulator 80 while relatively moving the light source array 60 in the Y-axis direction with respect to the surface of the substrate S. The surface of the substrate S is patterned. At this time, the illuminance of the light irradiated on the surface of the substrate S is uneven. When the X-axis direction is generated, the difference in the exposure amount distribution appears on the surface of the substrate S, which is not preferable. On the other hand, in the present embodiment, the emission end 70b of the rod totalizer 70 is projected onto the spatial modulation element 80, and further, the first projection lens 68 and the second projection lens 69 are projected onto the irradiation region Re. Since the size of the drive signal Id of the four light-emitting elements 601 in the mutually different regions in the X-axis direction is individually controlled for each of the light-emitting elements 601, the occurrence of illuminance unevenness in the X-axis direction can be effectively suppressed.

又,本實施形態中,設置有光學感測器SC,其檢測自光學頭6射出後之光之照度分佈。並且,照射控制部130係按照光學感測器SC之檢測結果,而就每個發光元件601個別地控制驅動信號Id之大小。如此之構成中,由於可基於所檢測出之自桿積算器70射出後之光之照度分佈之結果,來控制對各發光元件601之驅動信號Id之大小,故可更確實地提高向基板S表面之照射光之照度分佈之均勻性。 Further, in the present embodiment, an optical sensor SC that detects the illuminance distribution of the light emitted from the optical head 6 is provided. Further, the illumination control unit 130 individually controls the magnitude of the drive signal Id for each of the light-emitting elements 601 in accordance with the detection result of the optical sensor SC. In such a configuration, since the magnitude of the illumination signal Id for each of the light-emitting elements 601 can be controlled based on the detected illuminance distribution of the light emitted from the rod totalizer 70, the substrate S can be more surely improved. The uniformity of the illuminance distribution of the illumination of the surface.

尤其,於本實施形態中,光學感測器SC係檢測照射於基板S表面之光之照度分佈。藉此,可更確實地提高向基板S表面之照射光之照度分佈之均勻性。 In particular, in the present embodiment, the optical sensor SC detects the illuminance distribution of the light irradiated on the surface of the substrate S. Thereby, the uniformity of the illuminance distribution of the irradiation light to the surface of the substrate S can be more surely improved.

如此,於本實施形態中,圖案描繪裝置1相當於本發明之「圖案描繪裝置」,基板S相當於本發明之「描繪對象」,發光元件601或發光元件行601C相當於本發明之「發光部」,光源陣列60相當於本發明之「發光單元」,桿積算器70相當於本發明之「照度均勻化元件」,空間光調變器80相當於本發明之「空間光調變器」,照射控制部130相當於本發明之「驅動控制部」,驅動電流Id相當於本發明之 「驅動信號」,Y軸方向相當於本發明之「第1方向」,X軸方向相當於本發明之「第2方向」,光學感測器SC相當於本發明之「照度檢測器」。 In the present embodiment, the pattern drawing device 1 corresponds to the "pattern drawing device" of the present invention, the substrate S corresponds to the "drawing object" of the present invention, and the light-emitting element 601 or the light-emitting element row 601C corresponds to the "lighting" of the present invention. The light source array 60 corresponds to the "light-emitting unit" of the present invention, the rod totalizer 70 corresponds to the "illuminance equalization element" of the present invention, and the spatial light modulator 80 corresponds to the "space light modulator" of the present invention. The illumination control unit 130 corresponds to the "drive control unit" of the present invention, and the drive current Id corresponds to the present invention. In the "drive signal", the Y-axis direction corresponds to the "first direction" of the present invention, the X-axis direction corresponds to the "second direction" of the present invention, and the optical sensor SC corresponds to the "illuminance detector" of the present invention.

另外,本發明並不限於上述之實施形態者,只要不背離其宗旨,便可於上述者以外進行各種變更。例如,上述實施形態中,係就設置於光源陣列60之12個發光元件601之全體,進行驅動電流Id之個別控制。然而,本發明之適用態樣並不限於此,亦可於例如下述之態樣適用本發明。 Further, the present invention is not limited to the above-described embodiments, and various modifications can be made in addition to the above without departing from the spirit thereof. For example, in the above embodiment, the entirety of the twelve light-emitting elements 601 provided in the light source array 60 is individually controlled by the drive current Id. However, the application of the present invention is not limited thereto, and the present invention can also be applied to, for example, the following aspects.

如上所述,屬於相同之發光元件行601C之3個發光元件601,對於基板S表面係一邊相對移動一邊照射光,於相同區域進行重複曝光。因此,即便該等發光元件601之各個照射光有照度不均,但對於最終形成之圖案之影響少。因此,對於屬於相同發光元件行601C之3個發光元件601,亦可共同地進行驅動電流Id之大小之控制,來謀求驅動控制之簡化。順便一提,於相關之變化例中,發光元件行601C係相當於本發明之「發光部」。 As described above, the three light-emitting elements 601 belonging to the same light-emitting element row 601C are irradiated with light while moving relative to the surface of the substrate S, and are repeatedly exposed in the same region. Therefore, even if the respective illumination lights of the light-emitting elements 601 have illuminance unevenness, the influence on the finally formed pattern is small. Therefore, for the three light-emitting elements 601 belonging to the same light-emitting element row 601C, the magnitude of the drive current Id can be collectively controlled to simplify the drive control. Incidentally, in the related variation, the light-emitting element row 601C corresponds to the "light-emitting portion" of the present invention.

另外,於該變化例中,亦可藉由個別地控制不同之發光元件行601C之驅動電流Id之大小,來達到與上述相同之效果。圖10係個別控制發光元件601之照射控制部130之電路之方塊圖。屬於相同發光元件行601C之3個發光元件601係串聯連接,其輸入端及輸出端係經由DC-DC轉換器102而連接於電源100。又,於該等之3個發光元件601之輸出側串聯連接有電流檢測部103,基於電流檢測部103之檢測結果,於照射控制部130內變更送往DC-DC轉換器101之控制 電壓,藉此控制提供給該等之3個發光元件601之驅動電流Id。並且,對於4行之發光元件行601C之各者設置具有相同構成之電路。因此,可就每個發光元件行601C個別地控制提供給發光元件601之驅動電流Id。另外,對應於相互不同之發光元件行601C之4個DC-DC轉換器101係經由AC-DC轉換器102連接於電源100,而接收電源供給。 Further, in this modification, the same effects as described above can be achieved by individually controlling the magnitudes of the driving currents Id of the different light-emitting element rows 601C. FIG. 10 is a block diagram showing the circuits of the illumination control unit 130 for individually controlling the light-emitting elements 601. The three light-emitting elements 601 belonging to the same light-emitting element row 601C are connected in series, and the input end and the output end thereof are connected to the power source 100 via the DC-DC converter 102. Further, the current detecting unit 103 is connected in series to the output side of the three light-emitting elements 601, and the control sent to the DC-DC converter 101 is changed in the irradiation control unit 130 based on the detection result of the current detecting unit 103. The voltage, thereby controlling the drive current Id supplied to the three light-emitting elements 601. Further, a circuit having the same configuration is provided for each of the four rows of the light-emitting element rows 601C. Therefore, the driving current Id supplied to the light-emitting element 601 can be individually controlled for each of the light-emitting element rows 601C. Further, four DC-DC converters 101 corresponding to mutually different light-emitting element rows 601C are connected to the power source 100 via the AC-DC converter 102, and receive power supply.

又,於上述實施形態中,係基於檢測出照度分佈之結果而控制送往發光元件601之驅動信號Id。藉此,可使利用曝光而照射之光量之累計值(累計光量)於基板S之大致全區域皆均勻。此時,亦可預先計測表示驅動信號Id與累計光量之關係之累計光量設定檔,並預先儲存於照射控制部130等。並且,藉由基於該累計光量設定檔而控制驅動信號Id,可在基板S之大致全區域使累計光量均勻,執行更良好之圖案描繪。 Further, in the above embodiment, the drive signal Id sent to the light-emitting element 601 is controlled based on the result of detecting the illuminance distribution. Thereby, the integrated value (accumulated light amount) of the amount of light irradiated by the exposure can be made uniform over substantially the entire area of the substrate S. In this case, the integrated light amount profile indicating the relationship between the drive signal Id and the integrated light amount may be measured in advance, and stored in the illumination control unit 130 or the like in advance. Further, by controlling the drive signal Id based on the integrated light amount setting, the integrated light amount can be made uniform over substantially the entire area of the substrate S, and better pattern drawing can be performed.

又,於上述實施形態中,係控制提供給發光元件601之驅動電流Id之大小而調整發光元件601之亮度。然而,亦可控制提供給發光元件601之驅動電壓Vd,而調整發光元件601之亮度。 Further, in the above embodiment, the brightness of the light-emitting element 601 is adjusted by controlling the magnitude of the drive current Id supplied to the light-emitting element 601. However, the driving voltage Vd supplied to the light-emitting element 601 can also be controlled to adjust the brightness of the light-emitting element 601.

又,有關驅動電流Id、驅動電壓Vd之具體值雖未特別言及,但該等之值亦可進行各種變化。因此,亦可將例如驅動電流Id、驅動電壓Vd之值設為大於額定電流、額定電壓之值,具體而言,亦可設為額定電流、額定電壓之2倍以上或3倍以上。藉此,可顯著提升發光元件601之亮度。 Further, although specific values of the drive current Id and the drive voltage Vd are not particularly mentioned, the values may be variously changed. Therefore, for example, the values of the drive current Id and the drive voltage Vd may be set to be larger than the rated current and the rated voltage. Specifically, the rated current and the rated voltage may be twice or more or three times or more. Thereby, the brightness of the light-emitting element 601 can be remarkably improved.

又,上述實施形態中,使屬於相同之單位像行IMC之3 個單位像IM於基板S表面之相同區域相對移動而執行曝光。然而,亦可不使用如此之曝光之方法而曝光基板S表面。具體而言,亦可以於基板S每移動朝向單位像行IMC之X軸方向之距離時,使12個發光元件601點亮,而對圖9所示之12個單位像IM之基板S進行照射之方式構成。 Further, in the above embodiment, the same unit image line IMC is made 3 The exposure of the unit like IM on the same area of the surface of the substrate S is performed. However, it is also possible to expose the surface of the substrate S without using such a method of exposure. Specifically, when the substrate S is moved toward the X-axis direction of the unit image line IMC, the twelve light-emitting elements 601 are turned on, and the substrate S of the 12 unit images IM shown in FIG. 9 is irradiated. The way it is structured.

又,光源陣列60之複數個發光元件601之排列態樣並不限於上述者。因此,可將複數個發光元件601所排列之列數及行數適當地變更,或適當變更鄰接之發光元件601之間隔。或者,亦可以行列態樣以外之態樣,排列複數個發光元件601。 Further, the arrangement of the plurality of light-emitting elements 601 of the light source array 60 is not limited to the above. Therefore, the number of rows and the number of rows in which the plurality of light-emitting elements 601 are arranged can be appropriately changed, or the interval between the adjacent light-emitting elements 601 can be appropriately changed. Alternatively, a plurality of light-emitting elements 601 may be arranged in a manner other than the aspect of the array.

又,上述實施形態中,係藉由使基板S於Y軸方向移動,使基板S及光學頭6相對移動。然而,亦可藉由使光學頭6向Y軸方向移動,而使基板S及光學頭6相對移動。 Further, in the above embodiment, the substrate S and the optical head 6 are relatively moved by moving the substrate S in the Y-axis direction. However, the substrate S and the optical head 6 can be relatively moved by moving the optical head 6 in the Y-axis direction.

又,檢測光照度分佈之光學感測器SC之構成亦不限於上述者。亦可利用另外設置之二維影像感測器來檢測照度分佈。又,光學感測器SC檢測照度分佈之位置不限於基板S表面。因此,亦可以將入射至空間光調變器80之光之一部分分支,而以光學感測器SC或另外設置之二維影像感測器來檢測照度分佈之方式構成。 Further, the configuration of the optical sensor SC that detects the illuminance distribution is not limited to the above. An illuminance distribution can also be detected using a separately provided two-dimensional image sensor. Further, the position at which the optical sensor SC detects the illuminance distribution is not limited to the surface of the substrate S. Therefore, one of the light incident on the spatial light modulator 80 can also be branched, and the optical sensor SC or a separately provided two-dimensional image sensor can be used to detect the illuminance distribution.

又,光學頭6之光學性之構成亦不限於上述者,可適當執行構成其之各光學元件之追加、變更、削減。因此,亦可排除自光源陣列60至桿積算器70之光學系統65,而緊接著透鏡陣列64之後配置桿積算器70。或者,亦可將自光源陣列60至桿積算器70之所有的光學性構成皆排除,而緊接 著光源陣列60之後配置桿積算器70。 Moreover, the optical configuration of the optical head 6 is not limited to the above, and the addition, modification, and reduction of the optical elements constituting the optical element can be appropriately performed. Therefore, the optical system 65 from the light source array 60 to the rod totalizer 70 can also be excluded, and the rod totalizer 70 is disposed immediately after the lens array 64. Alternatively, all of the optical components from the light source array 60 to the rod totalizer 70 can be excluded, and immediately The rod totalizer 70 is disposed after the light source array 60.

又,可使用桿積算器70以外之積分器,例如亦可使用以蠅眼透鏡所構成之蠅眼透鏡積分器。意即,蠅眼透鏡積分器亦可發揮作為使照度分佈均勻化之積分器之功能。此時,最好將蠅眼透鏡積分器配置於光學系統65內光之主光線與光軸相交之位置。又,構成蠅眼透鏡積分器之各透鏡之形狀,最好構成與DMD80相似之形狀。 Further, an integrator other than the rod totalizer 70 may be used. For example, a fly-eye lens integrator composed of a fly-eye lens may be used. That is to say, the fly-eye lens integrator can also function as an integrator that homogenizes the illuminance distribution. At this time, it is preferable to arrange the fly-eye lens integrator at a position where the chief ray of the light in the optical system 65 intersects the optical axis. Further, the shape of each of the lenses constituting the fly-eye lens integrator preferably forms a shape similar to that of the DMD 80.

又,上述實施形態中,係將不同波長之2個光合成。然而,亦可以不進行如此之光之合成之方式來構成。或者,亦可以將不同波長之3個光合成之方式構成。該情形時,亦可使用複數個雙色鏡,亦可使用二向色稜鏡(正交稜鏡、菲利浦型稜鏡、寇斯特稜鏡等)。或者,亦可組合該等來使用。 Further, in the above embodiment, two lights of different wavelengths are combined. However, it is also possible to construct without such a combination of light. Alternatively, three light beams of different wavelengths may be combined. In this case, a plurality of dichroic mirrors may be used, and a dichroic color (orthogonal chirp, Phillips type, Worcester, etc.) may also be used. Alternatively, these may be used in combination.

發光元件601之種類並不限於LED,可使用其他各種光源。 The type of the light-emitting element 601 is not limited to the LED, and various other light sources can be used.

本發明係可利用於將經由如桿積算器70之照度均勻化元件而入射至空間光調變器之光,利用空間光調變器調變,而照射基板之圖案描繪裝置、圖案描繪方法。 The present invention is applicable to a pattern drawing device and a pattern drawing method for illuminating a substrate by modulating light incident on a spatial light modulator through an illuminance equalizing element such as the rod totalizer 70 by a spatial light modulator.

1‧‧‧圖案描繪裝置 1‧‧‧ pattern drawing device

3‧‧‧支撐部 3‧‧‧Support

5‧‧‧曝光部 5‧‧‧Exposure Department

6‧‧‧光學頭 6‧‧‧ Optical head

9‧‧‧攝像部 9‧‧‧Photography Department

11‧‧‧搬入口 11‧‧‧ Move in

12‧‧‧搬出口 12‧‧‧Moving out

20‧‧‧搬送機構 20‧‧‧Transportation agency

21‧‧‧滾珠螺桿 21‧‧‧Rolling screw

22‧‧‧導軌 22‧‧‧ rails

23‧‧‧馬達 23‧‧‧Motor

31‧‧‧支撐台 31‧‧‧Support table

32‧‧‧剝離滾輪 32‧‧‧ peeling roller

33‧‧‧升降台 33‧‧‧ lifting platform

34‧‧‧旋轉台 34‧‧‧Rotating table

35‧‧‧支撐板 35‧‧‧Support board

37‧‧‧線性馬達 37‧‧‧Linear motor

37a‧‧‧可動子 37a‧‧‧ movable

37b‧‧‧固定子 37b‧‧‧fixer

41‧‧‧框體 41‧‧‧ frame

51‧‧‧支撐台 51‧‧‧Support table

52‧‧‧線性導件 52‧‧‧Linear Guides

60‧‧‧光學陣列 60‧‧‧Optical array

61‧‧‧透鏡陣列 61‧‧‧ lens array

62‧‧‧光源面板 62‧‧‧Light source panel

62a‧‧‧光源面板 62a‧‧‧Light source panel

62b‧‧‧光源面板 62b‧‧‧Light source panel

63‧‧‧雙色鏡 63‧‧‧Dual color mirror

64‧‧‧透鏡陣列 64‧‧‧ lens array

65‧‧‧光學系統 65‧‧‧Optical system

65a‧‧‧透鏡 65a‧‧ lens

65b‧‧‧透鏡 65b‧‧ lens

65c‧‧‧透鏡 65c‧‧ lens

66‧‧‧透鏡 66‧‧‧ lens

67a‧‧‧光學鏡 67a‧‧‧Optical mirror

67b‧‧‧光學鏡 67b‧‧‧Optical mirror

68‧‧‧變焦透鏡 68‧‧‧ zoom lens

69‧‧‧物鏡 69‧‧‧ Objective lens

70‧‧‧桿積算器 70‧‧‧ rod totalizer

70a‧‧‧入射端 70a‧‧‧Injected end

70b‧‧‧出射端 70b‧‧‧Outlet

80‧‧‧空間光調變器 80‧‧‧Space light modulator

91‧‧‧攝像機 91‧‧‧Camera

95‧‧‧自動對焦機構 95‧‧‧Autofocus mechanism

96‧‧‧照射部 96‧‧‧ Department of Irradiation

97‧‧‧受光部 97‧‧‧Receiving Department

100‧‧‧控制器 100‧‧‧ Controller

101‧‧‧DC-DC轉換器 101‧‧‧DC-DC converter

102‧‧‧AC-DC轉換器A 102‧‧‧AC-DC Converter A

103‧‧‧電流檢測部 103‧‧‧ Current Detection Department

110‧‧‧資料處理部 110‧‧‧Data Processing Department

120‧‧‧掃描控制部 120‧‧‧Scan Control Department

130‧‧‧照射控制部 130‧‧‧Emission Control Department

601‧‧‧發光元件 601‧‧‧Lighting elements

601C‧‧‧發光元件行 601C‧‧‧Lighting element line

611‧‧‧第1透鏡 611‧‧‧1st lens

612‧‧‧第1透鏡 612‧‧‧1st lens

641‧‧‧透鏡 641‧‧‧ lens

IM‧‧‧單位像 IM‧‧‧ unit image

IMC‧‧‧單位像行 IMC‧‧‧ units like

Re‧‧‧照射區域 Re‧‧‧illuminated area

S‧‧‧基板 S‧‧‧Substrate

SC‧‧‧光學感測器 SC‧‧‧Optical Sensor

圖1係模式性表示可適用本發明之圖案描繪裝置之一例之側視圖。 Fig. 1 is a side view schematically showing an example of a pattern drawing device to which the present invention is applicable.

圖2係模式性表示圖1之圖案描繪裝置之部分俯視圖。 Fig. 2 is a partial plan view schematically showing the pattern drawing device of Fig. 1.

圖3係表示光學感測器之搬送機構之部分俯視圖。 Fig. 3 is a partial plan view showing the conveying mechanism of the optical sensor.

圖4係模式性表示具備光學頭之概略構成之立體圖。 Fig. 4 is a perspective view schematically showing a schematic configuration of an optical head.

圖5係模式性表示光源面板之概略構成之側視圖。 Fig. 5 is a side view schematically showing a schematic configuration of a light source panel.

圖6係模式性表示光源面板之概略構成之俯視圖。 Fig. 6 is a plan view schematically showing a schematic configuration of a light source panel.

圖7係模式性表示光源面板之概略構成之立體圖。 Fig. 7 is a perspective view schematically showing a schematic configuration of a light source panel.

圖8係表示入射至桿積算器之光之光線圖之圖。 Fig. 8 is a view showing a ray diagram of light incident on a rod totalizer.

圖9係模式性表示照射桿積算器之發光元件之像之一例之俯視圖。 Fig. 9 is a plan view schematically showing an example of an image of a light-emitting element of an illumination rod totalizer.

圖10係表示個別控制發光元件之電路之一例之區塊圖。 Fig. 10 is a block diagram showing an example of a circuit for individually controlling a light-emitting element.

6‧‧‧光學頭 6‧‧‧ Optical head

60‧‧‧發光元件 60‧‧‧Lighting elements

61‧‧‧透鏡陣列 61‧‧‧ lens array

62‧‧‧光源面板 62‧‧‧Light source panel

62a‧‧‧光源面板 62a‧‧‧Light source panel

62b‧‧‧光源面板 62b‧‧‧Light source panel

63‧‧‧雙色鏡 63‧‧‧Dual color mirror

64‧‧‧透鏡陣列 64‧‧‧ lens array

65‧‧‧光學系統 65‧‧‧Optical system

65a‧‧‧透鏡 65a‧‧ lens

65b‧‧‧透鏡 65b‧‧ lens

65c‧‧‧透鏡 65c‧‧ lens

66‧‧‧透鏡 66‧‧‧ lens

67a‧‧‧光學鏡 67a‧‧‧Optical mirror

67b‧‧‧光學鏡 67b‧‧‧Optical mirror

68‧‧‧變焦透鏡 68‧‧‧ zoom lens

69‧‧‧物鏡 69‧‧‧ Objective lens

70‧‧‧桿積算器 70‧‧‧ rod totalizer

70a‧‧‧入射端 70a‧‧‧Injected end

70b‧‧‧出射端 70b‧‧‧Outlet

80‧‧‧空間光調變器 80‧‧‧Space light modulator

95‧‧‧自動對焦機構 95‧‧‧Autofocus mechanism

96‧‧‧照射部 96‧‧‧ Department of Irradiation

97‧‧‧受光部 97‧‧‧Receiving Department

641‧‧‧透鏡 641‧‧‧ lens

Re‧‧‧照射區域 Re‧‧‧illuminated area

Claims (7)

一種圖案描繪裝置,其特徵為包含:發光單元,其包含複數個以與驅動信號之大小對應之亮度發光之發光部;照度均勻化元件,其係將自上述發光單元入射之光,於將上述光之照度分佈均勻化後射出;空間光調變器,其係將自上述照度均勻化元件射出之上述光調變並照射至描繪對象;驅動控制部,其係就每個上述發光部個別地控制上述驅動信號之大小。 A pattern drawing device, comprising: a light emitting unit comprising a plurality of light emitting portions that emit light in brightness corresponding to a size of a driving signal; and an illuminance equalizing device that emits light from the light emitting unit The illuminance distribution of the light is uniformized and emitted; the spatial light modulator modulates and emits the light emitted from the illuminance equalizing element to the drawing object; and the driving control unit individually for each of the light emitting parts The size of the above drive signal is controlled. 如請求項1之圖案描繪裝置,其中一邊使上述發光單元相對於上述描繪對象向第1方向相對移動,一邊使上述發光單元所射出之上述光由上述空間光調變器予以調變,而於上述描繪對象上描繪圖案;且上述複數個發光部係將光照射至與上述第1方向正交之第2方向上相互不同之位置。 The pattern drawing device of claim 1, wherein the light emitted from the light-emitting unit is modulated by the spatial light modulator while the light-emitting unit is relatively moved in the first direction with respect to the drawing object; The pattern is drawn on the drawing target; and the plurality of light-emitting portions irradiate light to positions different from each other in the second direction orthogonal to the first direction. 如請求項2之圖案描繪裝置,其中上述發光部係以複數個發光元件構成,該複數個發光元件係各自以與上述驅動信號之大小對應之亮度發光,且各自將光照射於上述第1方向上直線狀排列之位置;且上述驅動控制部對於屬於相同之上述發光部之上述複數個發光元件共同地進行上述驅動信號之大小之控制。 The pattern drawing device of claim 2, wherein the light-emitting portion is formed by a plurality of light-emitting elements, each of which emits light at a luminance corresponding to a magnitude of the driving signal, and each of which illuminates the first direction The driving control unit collectively controls the magnitude of the driving signal for the plurality of light-emitting elements belonging to the same light-emitting unit. 如請求項1之圖案描繪裝置,其中 進而包含檢測自上述照度均勻化元件射出後之上述光之照度分佈之照度檢測器;且上述驅動控制部係按照上述照度檢測器之檢測結果,而就每個上述發光部個別地控制上述驅動信號之大小。 A pattern drawing device as claimed in claim 1, wherein Furthermore, the illuminance detector for detecting the illuminance distribution of the light after the illuminance equalizing element is emitted is included; and the driving control unit individually controls the driving signal for each of the light emitting units according to the detection result of the illuminance detector. The size. 如請求項4之圖案描繪裝置,其中上述照度檢測器係檢測照射於上述描繪對象之上述光之照度分佈。 The pattern drawing device of claim 4, wherein the illuminance detector detects an illuminance distribution of the light that is irradiated onto the drawing object. 如請求項1至5中任一項之圖案描繪裝置,其中上述空間光調變器係DMD。 The pattern drawing device of any one of claims 1 to 5, wherein the spatial light modulator is a DMD. 一種圖案描繪方法,其特徵為包含:就每個發光部個別地控制驅動信號之大小之步驟,上述驅動信號係提供給以與上述驅動信號之大小對應之亮度發光之複數個上述發光部;使來自上述複數個發光部之光入射至將入射而來之光均勻化並射出之照度均勻化元件之步驟;及將自上述照度均勻化元件射出之光,以空間光調變器調變並照射於描繪對象之步驟。 A pattern drawing method comprising the steps of individually controlling a size of a driving signal for each of the light-emitting portions, wherein the driving signal is supplied to a plurality of the light-emitting portions that emit light at a luminance corresponding to a magnitude of the driving signal; a step of illuminating the light from the plurality of light-emitting portions into an illuminance equalizing element that equalizes and emits the incident light; and modulating and illuminating the light emitted from the illuminance equalizing element by the spatial light modulator The step of depicting the object.
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