TW201400463A - Curing agent for anionically curable compounds, curable composition, cured product, novel imidazole-based compound and use of same - Google Patents

Curing agent for anionically curable compounds, curable composition, cured product, novel imidazole-based compound and use of same Download PDF

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TW201400463A
TW201400463A TW102116795A TW102116795A TW201400463A TW 201400463 A TW201400463 A TW 201400463A TW 102116795 A TW102116795 A TW 102116795A TW 102116795 A TW102116795 A TW 102116795A TW 201400463 A TW201400463 A TW 201400463A
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imidazole
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curing agent
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Kenji Kudo
Koji Arimitsu
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Nippon Synthetic Chem Ind
Univ Tokyo Science Foundation
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/12Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • C08G59/5046Amines heterocyclic
    • C08G59/5053Amines heterocyclic containing only nitrogen as a heteroatom
    • C08G59/5073Amines heterocyclic containing only nitrogen as a heteroatom having two nitrogen atoms in the ring
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
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    • C08G75/08Polythioethers from cyclic thioethers from thiiranes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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Abstract

The present invention provides: a curing agent for anionically curable compounds, which is composed of an imidazole-based compound wherein the 1-position of the imidazole skeleton is protected with a protecting group (A) that can be eliminated at a temperature of 50 DEG C or more; a curable composition which contains the curing agent and an anionically curable compound; a cured product which is obtained by curing the composition; the above-mentioned novel imidazole-based compound; and use of the imidazole-based compound. The present invention provides a novel imidazole-based curing agent which is easily handled and has excellent storage stability and good curability even in cases where the curing agent is used as a one-pack type curing agent. This imidazole-based compound is exemplified by an imidazole-based compound represented by general formula (1). In formula (1), A represents a protecting group that can be eliminated at a temperature of 50 DEG C or more; and each of R1-R3 independently represents a hydrogen atom, an alkyl group having 1-15 carbon atoms or a phenyl group.

Description

陰離子硬化性化合物用硬化劑、硬化性組成物、硬化物及新穎咪唑系化合物及其用途 Hardener, curable composition, cured product and novel imidazole compound for anion curable compound and use thereof

本發明係關於使環氧化物或環硫化物等陰離子硬化性化合物硬化所用之陰離子硬化性化合物用硬化劑,並係關於含有該硬化劑及陰離子硬化性化合物之硬化性組成物,並係關於使該組成物硬化而成的硬化物,再者,係關於作為該陰離子硬化性化合物用硬化劑有用之新穎咪唑系化合物。又,本發明亦關於前述新穎咪唑系化合物作為陰離子硬化性化合物用硬化劑之用途。 The present invention relates to a curing agent for an anion curable compound used for curing an anion curable compound such as an epoxide or an episulfide compound, and a curable composition containing the curing agent and the anionic curable compound, and The cured product obtained by curing the composition is a novel imidazole compound which is useful as a curing agent for the anion-curable compound. Further, the present invention relates to the use of the novel imidazole compound as a curing agent for an anionic curing compound.

由咪唑系化合物所構成之陰離子硬化性化合物用硬化劑(以下,亦稱咪唑系硬化劑)一般被利用作為使環氧化物或環硫化物等陰離子硬化性化合物硬化之硬化劑。但,液狀之咪唑系硬化劑,作為一液型硬化劑使用時,有顯著保存穩定性低的問題。 A curing agent for an anion-curable compound (hereinafter also referred to as an imidazole-based curing agent) composed of an imidazole-based compound is generally used as a curing agent for curing an anion-curable compound such as an epoxide or an episulfide. However, when the liquid imidazole-based curing agent is used as a one-pack type curing agent, there is a problem that the storage stability is remarkably low.

已知有利用環氧-咪唑加合物型之硬化劑來作為改善咪唑系硬化劑之保存穩定性之方法(例如,參照專利文獻1)。但,此硬化劑有諸如:「需繁雜的混合步驟」、「有分散安定性上的問題」、「硬化劑達不到基材的細部而引起硬化不良」等問題。 A curing agent using an epoxy-imidazole adduct type is known as a method for improving the storage stability of an imidazole-based curing agent (for example, see Patent Document 1). However, such a hardening agent has problems such as "a complicated mixing step", "a problem of dispersion stability", and "the hardening agent does not reach the details of the base material and causes hardening failure".

另一方面,作為一種同時兼顧硬化性及保存穩定性之陰離子發生型硬化劑,已知有藉由水分而生成一級胺作為硬化活性物質的酮亞胺(ketimine) 型潛在性硬化劑(例如,參照專利文獻2)。但,就使此硬化劑具有潛在性之機制而言,只有一級胺才能使其發生,對於不帶有一級胺之咪唑系硬化劑而言,是無法應用此一機制的。又,此類硬化劑亦有於硬化時產生釋出氣體(outgas)的問題。 On the other hand, as an anion-generating curing agent which simultaneously satisfies both hardenability and storage stability, a ketimine which forms a primary amine as a hardening active material by moisture is known. A latent type hardener (for example, refer to Patent Document 2). However, in terms of the potential mechanism of this hardener, only a primary amine can make it happen, and for an imidazole hardener without a primary amine, this mechanism cannot be applied. Moreover, such hardeners also have the problem of producing outgas when hardened.

因此,期盼開發作為一液型硬化劑使用時也能具有優異之保存穩定性及良好硬化性的新穎咪唑系硬化劑。 Therefore, it has been desired to develop a novel imidazole-based hardener which can have excellent storage stability and good hardenability when used as a one-pack type hardener.

【先前技術文獻】 [Previous Technical Literature] 【專利文獻】 [Patent Literature]

【專利文獻1】:日本特開2000-1526號公報 [Patent Document 1]: JP-A-2000-1526

【專利文獻2】:日本特開2002-249544號公報 [Patent Document 2]: JP-A-2002-249544

本發明之目的在於提供:作為一液型硬化劑使用時,亦能具有優異之保存穩定性及良好硬化性,而且使用簡便之新穎咪唑系硬化劑;含有該硬化劑及陰離子硬化性化合物之硬化性組成物;使該組成物硬化而成之硬化物;再者,作為該陰離子硬化性化合物用硬化劑有用之新穎咪唑系化合物。 An object of the present invention is to provide a novel imidazole hardener which is excellent in storage stability and good hardenability and which is easy to use as a one-part curing agent, and which is hardened by the hardening agent and an anionic hardening compound. A composition: a cured product obtained by curing the composition; and a novel imidazole compound which is useful as a curing agent for the anion-curable compound.

本案發明人們創意巧思的結果,發現:藉由將咪唑骨架編號1的位置以指定之保護基予以保護,可得到解決上述課題之咪唑系硬化劑。 As a result of the ingenuity of the inventors of the present invention, it was found that an imidazole-based curing agent which solves the above problems can be obtained by protecting the position of the imidazole skeleton number 1 with a predetermined protecting group.

即,本發明提供一種陰離子硬化性化合物用硬化劑,其係用以使陰離子硬化性化合物硬化,係由咪唑系化合物所構成,且該咪唑系化合物之咪唑骨架編號1的位置受到可於50℃以上之溫度條件下脫離之保護基A所保護。 That is, the present invention provides a curing agent for an anionic curing compound which is formed by curing an anionic curing compound, and is composed of an imidazole compound, and the position of the imidazole skeleton No. 1 of the imidazole compound is at 50 ° C. Protected by the protecting group A which is detached under the above temperature conditions.

又,本發明亦提供:含有該陰離子硬化性化合物用硬化劑及陰離子硬 化性化合物之硬化性組成物、使該硬化性組成物硬化而成之硬化物、及作為該陰離子硬化性化合物用硬化劑有用之新穎咪唑系化合物。而且,本發明亦提供前述新穎咪唑系化合物作為陰離子硬化性化合物用硬化劑之用途。 Moreover, the present invention also provides a hardener and an anion hard containing the anion hardening compound. A curable composition of the compound, a cured product obtained by curing the curable composition, and a novel imidazole compound useful as a curing agent for the anion curable compound. Moreover, the present invention also provides the use of the aforementioned novel imidazole compound as a hardener for an anionic hardening compound.

本發明之咪唑系化合物係設計成:保護基A與咪唑骨架編號1之氮原子之間的C-N鍵結受熱會斷裂,而形成硬化劑活性物質。即,本發明之咪唑系化合物係依據以下之技術思想而設計:建構一種C-N鍵受熱容易斷裂之結構,例如,以受熱容易形成共軛雙鍵之基作為保護基A,使其鍵結至咪唑骨架編號1之氮原子上。 The imidazole-based compound of the present invention is designed such that the C-N bond between the protecting group A and the nitrogen atom of the imidazole skeleton number 1 is broken by heat to form a hardener active material. That is, the imidazole-based compound of the present invention is designed according to the following technical idea: constructing a structure in which a CN bond is easily broken by heat, for example, a group which is apt to form a conjugated double bond by heat as a protective group A, and is bonded to an imidazole Skeleton number 1 on the nitrogen atom.

本發明之陰離子硬化性化合物用硬化劑,除了具有良好硬化性外,相較於習知之咪唑系硬化劑,其保存穩定性更高,故作為一液型硬化劑使用時,亦可使其保存穩定性提升。再者,本發明之陰離子硬化性化合物用硬化劑,於常態下大多為液體,毋需溶解步驟,混合均勻性亦優,故使用簡便。 The curing agent for an anionic curing compound of the present invention has good storage stability, and has higher storage stability than a conventional imidazole curing agent, so that it can be stored as a one-liquid curing agent. Increased stability. Further, the curing agent for an anionic curing compound of the present invention is usually a liquid in a normal state, and requires a dissolution step, and has excellent mixing uniformity, so that it is easy to use.

圖1係由合成例8所得之2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)之1H-NMR頻譜圖。 Figure 1 is a 2-((2,4-dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5) obtained in Synthesis Example 8. 1 H-NMR spectrum of -methylhexyl).

以下對本發明詳細說明,但此等說明係展示理想之實施態樣之一例。又,本發明中,所謂之陰離子硬化性化合物用硬化劑,不只包含有作為硬化劑之作用者,概念上而言,亦包含作為硬化促進劑(硬化助劑)之作用者。 The invention is described in detail below, but such descriptions are illustrative of one embodiment of the preferred embodiments. Further, in the present invention, the curing agent for an anionic curing compound includes not only a function as a curing agent but also a function as a curing accelerator (hardening aid).

本發明之陰離子硬化性化合物用硬化劑,係使陰離子硬化性化合物硬 化所用之硬化劑,係由咪唑系化合物所構成,且該咪唑系化合物之咪唑骨架編號1之位置受於50℃以上之溫度條件下可脫離之保護基A所保護。 The hardening agent for an anionic hardening compound of the present invention is an anionic hardening compound hard The hardener used for the chemical conversion is composed of an imidazole compound, and the position of the imidazole skeleton number 1 of the imidazole compound is protected by the protective group A which can be detached at a temperature of 50 ° C or higher.

本發明中,保護基A,係於常壓條件下,在溫度未滿50℃時不脫離,溫度50℃以上時脫離的保護基;硬化反應將由於保護基之脫離而開始進行。 In the present invention, the protective group A is a protective group which is not desorbed when the temperature is less than 50 ° C under normal pressure conditions, and is desorbed at a temperature of 50 ° C or more; the hardening reaction is started by the detachment of the protective group.

保護基A,於50℃以上,較佳於55℃以上,特佳於60℃以上之溫度條件下可脫離。又,從硬化時之溫度條件的觀點來看,保護基A較佳係在300℃以下,特別在295℃以下之溫度條件下可脫離。 The protecting group A can be detached at a temperature of 50 ° C or higher, preferably 55 ° C or higher, and particularly preferably at a temperature of 60 ° C or higher. Further, from the viewpoint of temperature conditions at the time of curing, the protective group A is preferably detachable at 300 ° C or lower, particularly at a temperature of 295 ° C or lower.

又,保護基A的脫離溫度可透過DSC(微差掃描熱分析)予以測定;保護基A是否已從咪唑骨架編號1之位置脫離,可藉由NMR(核磁共振)或GC(氣相層析)分析等予以確認。 Further, the detachment temperature of the protecting group A can be determined by DSC (Wide Differential Scanning Thermal Analysis); whether the protecting group A has been detached from the position of the imidazole skeleton number 1, by NMR (nuclear magnetic resonance) or GC (gas chromatography) ) Analysis, etc. to confirm.

咪唑系化合物於保護基A脫離後,若單獨存在的話,大多係結晶態;但本發明中,保護基A脫離後,會形成咪唑系化合物與已脫離之保護基A所衍生而成之化合物的混合狀態,而形成咪唑系化合物溶解於已脫離之保護基A所衍生而成之化合物中的狀態。因此,本發明中,通常可以液體形態使用。 When the imidazole-based compound is liberated from the protective group A, if it is present alone, it is mostly in a crystalline state; however, in the present invention, after the protective group A is detached, a compound derived from the imidazole-based compound and the liberated protecting group A is formed. In a mixed state, a state in which an imidazole-based compound is dissolved in a compound derived from the protective group A which has been removed is formed. Therefore, in the present invention, it is usually used in a liquid form.

作為該咪唑系化合物,可舉例如下之通式(1)所示之咪唑系化合物。 As the imidazole-based compound, an imidazole-based compound represented by the following formula (1) can be exemplified.

式中,A係於50℃以上之溫度條件下可脫離之保護基。R1~R3係各自獨立而為氫原子、碳數1~15之烷基、或苯基。 In the formula, A is a protecting group which can be detached at a temperature of 50 ° C or higher. R 1 to R 3 are each independently a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or a phenyl group.

碳數1~15之烷基係鏈狀或分支狀,可舉例如:甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、癸基、十一基、十三基、十四基、十五基等。 以烷基之碳數而言,較佳係碳數1~14,更佳係碳數1~13。上述烷基及苯基可以有取代基,可舉例鹵素原子、羥基、烷氧基、胺基、硫烷基(sulfanyl)、芳基、雜芳基等作為取代基。 The alkyl group having 1 to 15 carbon atoms is chain-like or branched, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a decyl group, an eleven group, and a tenth group. Three bases, fourteen bases, fifteen bases, and the like. In terms of the carbon number of the alkyl group, the carbon number is preferably from 1 to 14, more preferably from 1 to 13. The alkyl group and the phenyl group may have a substituent, and examples thereof include a halogen atom, a hydroxyl group, an alkoxy group, an amine group, a sulfanyl group, an aryl group, a heteroaryl group and the like.

又,咪唑骨架編號1之位置未以保護基置換的咪唑化合物,已知係用作為環氧樹脂等陰離子硬化性樹脂之硬化劑;由於通式(1)中,保護基A以外的咪唑結構部份係構成本發明之前提部分,故本發明之陰離子硬化性化合物用硬化劑,不限於以通式(1)所示之咪唑系化合物,只要通式(1)中的取代基R1~R3為公開周知之咪唑系硬化劑中所使用之取代基即可,亦可以是氫原子、碳數1~15之烷基、及苯基以外者。 Further, an imidazole compound which is not substituted with a protective group at the position of the imidazole skeleton No. 1 is known to be used as a curing agent for an anion-curable resin such as an epoxy resin; and in the general formula (1), an imidazole moiety other than the protective group A In the present invention, the curing agent for an anionic curing compound of the present invention is not limited to the imidazole compound represented by the formula (1), and the substituents R 1 to R in the formula (1) are not limited thereto. 3 is a substituent which is used in the imidazole-based curing agent which is known in the art, and may be a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or a phenyl group.

本發明中的保護基A,如同上述,例如,以受熱容易形成共軛雙鍵之基為宜。為了建構一受熱容易形成共軛雙鍵之基,有效方法係於保護基A中導入拉電子基。又,即使於保護基A中僅導入一個拉電子基的情況下,C-N鍵受熱斷裂之反應(保護基脫離反應)亦會進行;不過,藉由導入二個以上之拉電子基,雖然脫離反應會傾向在稍高溫度下進行,但保存穩定性則有提升之傾向。 The protecting group A in the present invention is preferably, for example, a group which forms a conjugated double bond by heat, as described above. In order to construct a group which is heated to easily form a conjugated double bond, an effective method is to introduce a pull electron group into the protecting group A. Further, even in the case where only one electron-withdrawing group is introduced into the protective group A, the reaction of the CN bond by thermal cleavage (protective group detachment reaction) proceeds; however, by introducing two or more electron-withdrawing groups, the detachment reaction is carried out. It tends to proceed at a slightly higher temperature, but the storage stability tends to increase.

本發明中,保護基A之分子量,較佳係100~1000,更佳係200~900。若相關之分子量過大時,陰離子硬化性化合物將出現難以密集交聯之傾向,故而得到玻璃轉化溫度高的硬化物,以這樣的咪唑系化合物作為硬化劑使用時,其效果將變得不易彰顯。 In the present invention, the molecular weight of the protecting group A is preferably from 100 to 1,000, more preferably from 200 to 900. When the molecular weight is too large, the anion hardening compound tends to be difficult to be crosslinked intensively, so that a cured product having a high glass transition temperature is obtained, and when such an imidazole compound is used as a curing agent, the effect is less likely to be manifested.

作為相關之保護基A,可舉例如下之通式(2)所示之保護基A1。 As the relevant protecting group A, the protecting group A1 represented by the following formula (2) can be exemplified.

式中,R4~R6各自獨立而為氫原子或拉電子基,R4~R6中之至少兩者為拉電子基。但,R4亦可為碳數1~15之烷基或碳數6~18之芳香環殘基。該情況下,R5及R6各自為拉電子基。 In the formula, R 4 to R 6 are each independently a hydrogen atom or a pull electron group, and at least two of R 4 to R 6 are a pull electron group. However, R 4 may be an alkyl group having 1 to 15 carbon atoms or an aromatic ring residue having 6 to 18 carbon atoms. In this case, each of R 5 and R 6 is a electron withdrawing group.

碳數1~15之烷基係鏈狀或分支狀,可舉例如:甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、癸基、十三基、十四基、十五基等。以烷基之碳數而言,較佳係碳數1~13,更佳係碳數1~10。上述烷基及芳香環殘基可以有取代基,可舉例如:鹵素原子、羥基、烷氧基、胺基、硫烷基、芳基、雜芳基等作為取代基。 The alkyl group having 1 to 15 carbon atoms is chain-like or branched, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a decyl group, a thirteen group, and a tenth group. Four bases, fifteen bases, etc. In terms of the carbon number of the alkyl group, the carbon number is preferably from 1 to 13, more preferably from 1 to 10. The alkyl group and the aromatic ring residue may have a substituent, and examples thereof include a halogen atom, a hydroxyl group, an alkoxy group, an amine group, a sulfanyl group, an aryl group, and a heteroaryl group as a substituent.

作為碳數6~18之芳香環殘基,以具有推電子性者為宜,例如,以含有甲氧基、苯氧基、羥基、碳數1~6之烷基、二烷基胺基之芳香族殘基為宜。 The aromatic ring residue having 6 to 18 carbon atoms is preferably one having electron withdrawing property, for example, a methoxy group, a phenoxy group, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, or a dialkylamine group. Aromatic residues are preferred.

作為拉電子基,以不會形成氫鍵之拉電子基為宜。若拉電子基含有會形成氫鍵之官能基(例如,羧酸基、醛基、醯胺基等)的話,由於會在分子內或分子間形成氫鍵,故容易結晶化,而有難以獲得液狀之潛在性硬化劑之傾向。 As the electron withdrawing group, it is preferred to use a pull electron group which does not form a hydrogen bond. If the electron group contains a functional group that forms a hydrogen bond (for example, a carboxylic acid group, an aldehyde group, a guanamine group, etc.), since a hydrogen bond is formed in or between molecules, it is easily crystallized, and it is difficult to obtain. The tendency of liquid latent hardeners.

作為拉電子基,可舉例如:硝基;氰基;含有溴原子、氯原子、碘原子、氟原子等鹵素原子之官能基;含有羰基之官能基,例如含有碳數1~20之飽和或不飽和烴基之酯基、含有碳數1~20之飽和或不飽和烴基之硫酯基、含有碳數1~20之飽和或不飽和烴基之醯基、含有碳數1~20之飽和或不飽和烴基之胺甲醯基、含有碳數1~20之飽和或不飽和烴基之羰氧基、含有碳數1~20之飽和或不飽和烴基之硫代羰氧基;含有磺醯基或亞磺醯基之官能基,例如碳數1~20之烷基磺醯基、碳數6~18之芳基磺醯基、碳數1~20之烷基亞磺醯基、碳數1~20之烷基磺醯基氧基、碳數1~20之烷基亞磺醯基氧基;含有官能基之芳基,例如含有選自氯原子、溴原子、碘原子、及氟原子所成之群組的1~5個鹵素原子之芳基、含有選自氰基及硝基之群組的1~5個拉電子基之芳基。 Examples of the electron withdrawing group include a nitro group; a cyano group; a functional group containing a halogen atom such as a bromine atom, a chlorine atom, an iodine atom or a fluorine atom; and a functional group having a carbonyl group, for example, a saturated group having a carbon number of 1 to 20 or An ester group of an unsaturated hydrocarbon group, a thioester group having a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, a sulfhydryl group having a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, or a saturated or non-carbon number of 1 to 20 carbon atoms a hydrocarbyl group of a saturated hydrocarbyl group, a carbonyloxy group having a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, a thiocarbonyloxy group having a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms; containing a sulfonyl group or a sub a functional group of a sulfonyl group, for example, an alkylsulfonyl group having 1 to 20 carbon atoms, an arylsulfonyl group having 6 to 18 carbon atoms, an alkylsulfinyl group having 1 to 20 carbon atoms, and a carbon number of 1 to 20 An alkylsulfonyloxy group, an alkylsulfinyloxy group having 1 to 20 carbon atoms; an aryl group having a functional group, for example, containing a chlorine atom, a bromine atom, an iodine atom, and a fluorine atom An aryl group of 1 to 5 halogen atoms in the group, and an aryl group having 1 to 5 electron withdrawing groups selected from the group consisting of a cyano group and a nitro group.

作為上述烷基磺醯基、烷基亞磺醯基、烷基磺醯基氧基、及烷基亞磺醯基氧基中的烷基,可舉例上述碳數1~15之鏈狀或分支狀之烷基。又,作為碳數1~15之飽和或不飽和烴基,可舉例上述之碳數1~15之鏈狀或分支狀之烷基、碳數2~15之鏈狀或分支狀之烯基。作為芳基磺醯基中的芳基,及作為含有拉電子基之芳基中的芳基,可舉例如苯基、苄基、甲苯基、二甲苯基、萘基。 As the alkyl group in the above alkylsulfonyl group, alkylsulfinyl group, alkylsulfonyloxy group, and alkylsulfinyloxy group, the above chain or branch having a carbon number of 1 to 15 can be exemplified. Alkyl group. Further, examples of the saturated or unsaturated hydrocarbon group having 1 to 15 carbon atoms include the above-mentioned chain-like or branched alkyl group having 1 to 15 carbon atoms and a chain-like or branched alkenyl group having 2 to 15 carbon atoms. Examples of the aryl group in the arylsulfonyl group and the aryl group in the aryl group having a vinyl group include a phenyl group, a benzyl group, a tolyl group, a xylyl group, and a naphthyl group.

於上述芳基磺醯基中的芳基,係碳數6~18之單環鏈、雙環或參環之芳基。可舉例如苯基、苄基、甲苯基、二甲苯基、萘基作為芳基。 The aryl group in the above arylsulfonyl group is a monocyclic chain, a bicyclic ring or a cyclized aryl group having 6 to 18 carbon atoms. For example, a phenyl group, a benzyl group, a tolyl group, a xylyl group, and a naphthyl group are mentioned as an aryl group.

之中,又就可簡便地合成、或可得到液狀化合物之觀點來看,較佳係以酯基、氰基、烷基磺醯基、芳基作為拉電子基;特佳係以酯基、氰基、芳基作為拉電子基。 Among them, from the viewpoint of simple synthesis or the availability of a liquid compound, it is preferred to use an ester group, a cyano group, an alkylsulfonyl group or an aryl group as a pull electron group; A cyano group or an aryl group is used as a pull electron group.

又,作為相關之保護基A,亦可舉例如下之通式(3)所示之保護基A2。 Further, as the related protective group A, the protective group A2 represented by the following formula (3) can also be exemplified.

式中,R7係碳數1~15之烷基或碳數6~18之芳香環殘基;R8及R9各自係拉電子基。 In the formula, R 7 is an alkyl group having 1 to 15 carbon atoms or an aromatic ring residue having 6 to 18 carbon atoms; and each of R 8 and R 9 is an electron-withdrawing group.

碳數1~15之烷基及拉電子基可舉例與上述者相同者。碳數6~18之芳香環殘基可舉例如苯基、苄基、甲苯基、二甲苯基等單環芳香族衍生物之殘基,萘、薁、山欖烯(sapotalin)、蒽、乙烷合萘、聯苯等多環芳香族衍生物之殘基。 The alkyl group having 1 to 15 carbon atoms and the electron withdrawing group can be exemplified by the same as the above. The aromatic ring residue having 6 to 18 carbon atoms may, for example, be a residue of a monocyclic aromatic derivative such as a phenyl group, a benzyl group, a tolyl group or a xylyl group; naphthalene, anthracene, sapotalin, oxime, and ethyl A residue of a polycyclic aromatic derivative such as an alkylene naphthalene or a biphenyl group.

作為碳數6~18之芳香環殘基,以具有推電子性者為宜,例如,以含有甲氧基、苯氧基、羥基、碳數1~6之烷基、二烷基胺基之芳香族殘基為宜。 The aromatic ring residue having 6 to 18 carbon atoms is preferably one having electron withdrawing property, for example, a methoxy group, a phenoxy group, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, or a dialkylamine group. Aromatic residues are preferred.

再者,作為相關之保護基A,亦可舉例如下之通式(4)所示之保護基A3。 Further, as the related protective group A, the protective group A3 represented by the following formula (4) can also be exemplified.

式中,R10及R11係各自獨立而為碳數1~15之烷基。作為碳數1~15之烷基,可舉例與上述者相同者。 In the formula, R 10 and R 11 are each independently an alkyl group having 1 to 15 carbon atoms. Examples of the alkyl group having 1 to 15 carbon atoms are the same as those described above.

又,式中之R10及R11,就原料容易取得、可容易且廉價地合成等觀點而言,以碳數相同之烷基為宜。 Further, in the formula, R 10 and R 11 are preferably an alkyl group having the same carbon number from the viewpoint that the raw material is easily obtained and can be easily and inexpensively synthesized.

作為通式(4)所示之保護基的具體例,可舉例如:琥珀酸二甲酯殘基、琥珀酸二(2-異丙基-5-甲基己基)酯殘基、2-[1-(2,4-二甲氧苯基)乙基]丙二酸雙(2-異丙基-5-甲基己基)酯殘基。 Specific examples of the protective group represented by the formula (4) include a dimethyl succinate residue, a di(2-isopropyl-5-methylhexyl) succinate residue, and 2-[ Residue of bis(2-isopropyl-5-methylhexyl) ester of 1-(2,4-dimethoxyphenyl)ethyl]malonate.

通式(1)所示之咪唑系化合物,可依據公開周知之合成條件製造。 The imidazole compound represented by the formula (1) can be produced according to the synthesis conditions well known in the art.

本發明進一步提供上述、及如下之通式(5)所示之新穎咪唑系化合物。 The present invention further provides the novel imidazole compound represented by the above formula (5).

式中,R12及R13係各自獨立而為碳數1~15之烷基;R14~R16係各自獨立而為氫原子、碳數1~15之烷基、或苯基,Ar係碳數6~18之芳香環殘基。 作為碳數1~15之烷基、碳數6~18之芳香環殘基,可舉例與上述者相同者。 In the formula, R 12 and R 13 are each independently an alkyl group having 1 to 15 carbon atoms; and R 14 to R 16 are each independently a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or a phenyl group, and an Ar system. An aromatic ring residue having 6 to 18 carbon atoms. Examples of the aromatic ring residue having an alkyl group having 1 to 15 carbon atoms and 6 to 18 carbon atoms are the same as those described above.

就原料容易取得、可容易且廉價地合成等觀點而言,R12及R13以碳數相同之烷基為宜。 From the viewpoints of easy availability of raw materials, easy and inexpensive synthesis, and the like, R 12 and R 13 are preferably an alkyl group having the same carbon number.

又,作為R14~R16,較佳係甲基、乙基、丙基、異丙基、丁基、十一基、苯基;作為Ar,較佳係苯基、4-甲氧苯基、3-甲氧苯基、2-甲氧苯基、2,4-二甲氧苯基、2,3-二甲氧苯基、2,5-二甲氧苯基、2,6-二甲氧苯基、3,4-二甲氧苯基、3,5-二甲氧苯基、2,3,4-三甲氧苯基、2,4,5-三甲氧苯基、2,4,6-三甲氧苯基、3,4,5-三甲氧苯基、2-羥苯基、3-羥苯基、4-羥苯基、2,3-二羥苯基、2,4-二羥苯基、2,5-二羥苯基、3,4-二羥苯基、3-苯氧苯基、4-苯氧苯基、鄰甲苯基、間甲苯基、對甲苯基、2,3-二甲苯基、2,4-二甲苯基、2,6-二甲苯基、3,4-二甲苯基、3,5-二甲苯基、2,4,5-三甲苯基、2,4,6-三甲苯基、4-三級丁苯基、4-二甲胺苯基、4-二乙胺苯基。 Further, R 14 to R 16 are preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an undecyl group or a phenyl group; and as Ar, a preferred one is a phenyl group or a 4-methoxyphenyl group. , 3-methoxyphenyl, 2-methoxyphenyl, 2,4-dimethoxyphenyl, 2,3-dimethoxyphenyl, 2,5-dimethoxyphenyl, 2,6-di Methoxyphenyl, 3,4-dimethoxyphenyl, 3,5-dimethoxyphenyl, 2,3,4-trimethoxyphenyl, 2,4,5-trimethoxyphenyl, 2,4 ,6-trimethoxyphenyl, 3,4,5-trimethoxyphenyl, 2-hydroxyphenyl, 3-hydroxyphenyl, 4-hydroxyphenyl, 2,3-dihydroxyphenyl, 2,4- Dihydroxyphenyl, 2,5-dihydroxyphenyl, 3,4-dihydroxyphenyl, 3-phenoxyphenyl, 4-phenoxyphenyl, o-tolyl, m-tolyl, p-tolyl, 2 , 3-dimethylphenyl, 2,4-dimethylphenyl, 2,6-dimethylphenyl, 3,4-xylyl, 3,5-dimethylphenyl, 2,4,5-trimethylphenyl, 2 4,6-trimethylphenyl, 4-tris-butylphenyl, 4-dimethylaminephenyl, 4-diethylaminephenyl.

作為本發明通式(5)之具體化合物,可舉例如2-[(2,4-二甲氧苯基)-(2-甲咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(2-十一基咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(2-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-咪唑-1-基-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(2-乙基-4-甲咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(4,5-二苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(4-苯咪唑-1-基)-(2,4,6-三甲氧苯基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(4-苯咪唑-1-基)-(3,4,5-三甲氧苯基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸二己酯、2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸二丁酯、2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸二丙酯、2-[(4-甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(2-甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(4-苯咪唑-1-基)-對甲苯基-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[(4-苯咪唑-1-基)-鄰甲苯基-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯、2-[苯基-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯。 Specific examples of the compound of the formula (5) of the present invention include, for example, 2-[(2,4-dimethoxyphenyl)-(2-methylimidazol-1-yl)-methyl]malonic acid bis (2) -isopropyl-5-methylhexyl)ester, 2-[(2,4-dimethoxyphenyl)-(2-undecyl imidazol-1-yl)-methyl]malonic acid bis (2 -isopropyl-5-methylhexyl)ester, 2-[(2,4-dimethoxyphenyl)-(2-benzimidazol-1-yl)-methyl]malonic acid bis (2-iso Propyl-5-methylhexyl)ester, 2-[(2,4-dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl -5-Methylhexyl)ester, 2-[(2,4-dimethoxyphenyl)-imidazol-1-yl-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) Ester, 2-[(2,4-dimethoxyphenyl)-(2-ethyl-4-methylimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-- Ethyl) ester, 2-[(2,4-dimethoxyphenyl)-(4,5-dibenzimidazole-1-yl)-methyl]malonic acid bis(2-isopropyl-5-) Methylhexyl)ester, 2-[(4-benzimidazol-1-yl)-(2,4,6-trimethoxyphenyl)-methyl]malonic acid bis(2-isopropyl-5-- Ethyl) ester, 2-[(4-benzimidazol-1-yl)-(3,4,5-trimethoxyphenyl)-methyl]malonic acid bis(2-isopropyl-5-methyl Hexyl)ester, 2-[(2,4-dimethoxyphenyl)-(4-benzimidazol-1-yl) -methyl]dihexyl malonate, 2-[(2,4-dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonate dibutyl ester, 2-[ (2,4-Dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid dipropyl ester, 2-[(4-methoxyphenyl)-(4-benzimidazole -1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ester, 2-[(2-methoxyphenyl)-(4-benzimidazol-1-yl) -methyl] bis(2-isopropyl-5-methylhexyl)malonate, 2-[(4-benzimidazol-1-yl)-p-tolyl-methyl]malonic acid bis (2 -isopropyl-5-methylhexyl)ester, 2-[(4-benzimidazol-1-yl)-o-tolyl-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) Ester, 2-[phenyl-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ester.

關於上述以通式所示之咪唑系化合物,亦可依據公開周知之合成條件製造。 The imidazole-based compound represented by the above formula can also be produced according to the well-known synthesis conditions.

本發明之硬化性組成物含有本發明之陰離子硬化性化合物用硬化劑,及作為硬化對象之陰離子硬化性化合物。作為陰離子硬化性化合物,可舉例如環氧化物或環硫化物。 The curable composition of the present invention contains the curing agent for an anionic curing compound of the present invention and an anion curable compound as a curing target. The anion hardening compound may, for example, be an epoxide or an episulfide compound.

環氧化物係平均一個分子內含有2個以上之環氧基者。作為代表性之環氧化物,可舉例如:將雙酚A、雙酚F、雙酚AD、雙酚S、四甲基雙酚A、四甲基雙酚F、四甲基雙酚AD、四甲基雙酚S、四溴基雙酚A等雙酚類予以環氧丙基化而得之雙酚型環氧樹脂;將聯苯酚、二羥萘、9,9-雙(4-羥苯)茀等其他二元酚類予以環氧丙基化而得之環氧樹脂;將1,1,1-參(4-羥苯)甲烷、4,4-(1-(4-(1-(4-羥苯)-1-甲基乙基)苯基)亞乙基)雙酚等參苯酚類予以環氧丙基化而得之環氧樹脂;將1,1,2,2-肆(4-羥苯)乙烷等肆苯酚類予以環氧丙基化而得之環氧樹脂;將苯酚酚醛清漆、甲酚酚醛清漆、雙酚A酚醛清漆、溴化苯酚酚醛清漆、溴化雙酚A酚醛清漆等予以環氧丙基化而得之酚醛清漆型環氧樹脂;將丙三醇或聚乙二醇等多元醇予以環氧丙基化而得之脂肪族醚型環氧樹脂;將對羥基苯甲酸、β-羥萘甲酸等羥羧酸予以環氧丙基化而得之醚酯型環氧樹脂;將諸如鄰酞酸、對酞酸等多元羧酸予以環氧丙基化而得之酯型環氧樹脂;4,4'-二胺二苯甲烷或間胺苯酚等胺化合物的環氧丙基化物、或異氰尿酸三縮水甘油酯等胺型環氧樹脂;3,4-環氧環己基甲基-3’,4’-環氧環己基甲酸酯等脂環式環氧化物。可採用此等環氧化物之1種或2種以上混合者。 The epoxide group has an average of two or more epoxy groups in one molecule. Typical examples of the epoxide include bisphenol A, bisphenol F, bisphenol AD, bisphenol S, tetramethyl bisphenol A, tetramethyl bisphenol F, and tetramethyl bisphenol AD. Bisphenol type epoxy resin obtained by epoxypropylation of bisphenols such as tetramethylbisphenol S and tetrabromobisphenol A; biphenol, dihydroxynaphthalene, 9,9-bis (4-hydroxyl) Epoxy resin obtained by epoxy propylation of other dihydric phenols such as phenyl) hydrazine; 1,1,1-paraxyl (4-hydroxyphenyl)methane, 4,4-(1-(4-(1) Epoxy resin obtained by epoxy-propylation of -(4-hydroxyphenyl)-1-methylethyl)phenyl)ethylidene bisphenol and other phenols; 1,1,2,2- Epoxy resin obtained by epoxy propylation of hydrazine phenol such as hydrazine (4-hydroxyphenyl)ethane; phenol novolac, cresol novolac, bisphenol A novolac, brominated phenol novolac, bromination A novolac type epoxy resin obtained by epoxy propylation of a bisphenol A novolak or the like; an aliphatic ether type epoxy resin obtained by epoxypropylating a polyhydric alcohol such as glycerol or polyethylene glycol An ether ester type epoxy resin obtained by epoxy-propylating a hydroxycarboxylic acid such as p-hydroxybenzoic acid or β-hydroxynaphthoic acid; An ester type epoxy resin obtained by epoxy-propylating a polycarboxylic acid such as phthalic acid or citric acid; an epoxy propyl compound of an amine compound such as 4,4'-diamine diphenylmethane or m-aminophenol; Or an amine type epoxy resin such as triglycidyl isocyanurate; an alicyclic epoxide such as 3,4-epoxycyclohexylmethyl-3', 4'-epoxycyclohexylcarboxylate. One type or a mixture of two or more types of these epoxides may be used.

又,環硫化物係具有包含硫原子在內的三員雜環結構之化合物。作為代表性之環硫化物,可舉例如:環己硫醚、環硫丙烷、2,2-雙(4-(2,3-環硫丙氧基)苯基)丙烷、雙(4-(2,3-環硫丙氧基)苯基)甲烷、1,6-二(2,3-環硫丙氧基)萘、1,1,1-參-(4-(2,3-環硫丙氧基)苯基)乙烷、1-(2-(2,3-環硫丙氧基)苯基)-1,1-雙-(4-(2,3-環硫丙氧基)苯基)乙烷、1,1,2,2-肆-(4-(2,3-環硫丙氧基)苯基)乙烷等。 Further, the episulfide compound is a compound having a three-membered heterocyclic structure including a sulfur atom. Typical cyclosulfides include, for example, cyclohexyl sulfide, episulfide, 2,2-bis(4-(2,3-cyclosulfoxy)phenyl)propane, and bis(4-( 2,3-Cyclothiopropoxy)phenyl)methane, 1,6-bis(2,3-cyclothiopropoxy)naphthalene, 1,1,1-para-(4-(2,3-ring) Thiopoxy)phenyl)ethane, 1-(2-(2,3-cyclothiopropoxy)phenyl)-1,1-bis-(4-(2,3-cyclothiopropoxy) Phenyl)ethane, 1,1,2,2-indolyl-(4-(2,3-cyclosulfoxy)phenyl)ethane, and the like.

再者,可舉例:2,2-雙(4-(2,3-環硫丙氧基)環己基)丙烷、雙(4-(2,3-環硫丙氧基)環己基)甲烷、4,8-雙(4-(2,3-環硫丙氧基甲基)-參環[5.2.1.02.6]癸烷、3,9-雙(4-(2,3-環硫丙氧基甲基)-參環[5.2.1.02.6]癸烷、3,8-雙(4-(2,3-環硫丙氧基甲基)-參環[5.2.1.02.6]癸烷、4,8-雙(4-(2,3-環硫丙氧基)-參環[5.2.1.02.6]癸烷、3,9-雙(4-(2,3-環硫丙氧基)-參環[5.2.1.02.6]癸烷、3,8-雙(4-(2,3-環硫丙氧基)-參環[5.2.1.02.6]癸烷、1,1,1-參-(4-(2,3-環硫丙氧基)環己基)乙烷、1-(2-(2,3-環硫丙氧基)環己基)-1,1-雙-(4-(2,3-環硫丙氧基)環己基)乙烷、1,1,2,2-肆-(4-(2,3-環硫丙氧基)環己基)乙烷等。可採用此等環硫化物之1種或2種以上混合者。 Further, examples thereof include: 2,2-bis(4-(2,3-cyclothiopropoxy)cyclohexyl)propane, bis(4-(2,3-cyclothiopropoxy)cyclohexyl)methane, 4,8-bis(4-(2,3-cyclosulfoxymethyl)-shencyclo [5.2.1.0 2.6 ]decane, 3,9-bis(4-(2,3-cyclosulfoxy) Methyl)-Shenmene [5.2.1.0 2.6 ]decane, 3,8-bis(4-(2,3-cyclosulfoxymethyl)-shencyclo [5.2.1.0 2.6 ]decane, 4 , 8-bis(4-(2,3-cyclothiopropoxy)-shencyclo [5.2.1.0 2.6 ]decane, 3,9-bis(4-(2,3-cyclothiopropoxy)- Cyclone [5.2.1.0 2.6 ] decane, 3,8-bis(4-(2,3-cyclothiopropoxy)-septene [5.2.1.0 2.6 ]decane, 1,1,1-parameter- (4-(2,3-Cyclothiopropoxy)cyclohexyl)ethane, 1-(2-(2,3-cyclothiopropoxy)cyclohexyl)-1,1-bis-(4-( 2,3-Cyclothiopropoxy)cyclohexyl)ethane, 1,1,2,2-indolyl-(4-(2,3-cyclothiopropoxy)cyclohexyl)ethane, etc. One or a mixture of two or more kinds of cyclic sulfides.

又,亦可併用上述之環氧化物及環硫化物。 Further, the above epoxide and episulfide may be used in combination.

本發明之硬化性組成物,相對於陰離子硬化性化合物100重量份,通常含有本發明之硬化劑0.1~50重量份,較佳係含有0.2~45重量份,特佳係含有0.3~40重量份。若硬化劑含量過多時,硬化劑的物性會有降低的傾向;若含量過少時,則硬化反應將傾向變得不易進行。 The curable composition of the present invention usually contains 0.1 to 50 parts by weight of the curing agent of the present invention, preferably 0.2 to 45 parts by weight, and particularly preferably 0.3 to 40 parts by weight, based on 100 parts by weight of the anionic curing compound. . When the content of the curing agent is too large, the physical properties of the curing agent tend to be lowered. When the content is too small, the curing reaction tends to be difficult to proceed.

於本發明之硬化性組成物中,視需要可加入稀釋劑、增韌劑、矽烷類偶聯劑、消泡劑、均染劑、補強劑、充填劑、阻燃劑、著色劑、顏料、染料等各種添加劑。 In the curable composition of the present invention, a diluent, a toughening agent, a decane coupling agent, an antifoaming agent, a leveling agent, a reinforcing agent, a filler, a flame retardant, a coloring agent, a pigment, and the like may be added as needed. Various additives such as dyes.

作為上述稀釋劑,可舉例如:正丁基環氧丙基醚、2-乙基己基環氧丙基醚、苯基環氧丙基醚、烯丙基環氧丙基醚、氧化苯乙烯、α-氧化蒎烯、甲基丙烯酸環氧丙酯、1-乙烯基-3,4-環氧環己烷等反應性稀釋劑,或甲基乙基酮、環己酮、甲苯、二甲苯、環己烷、甲醇、異丙醇、甲賽璐蘇、乙酸乙酯、乙酸丁酯等非反應性稀釋劑。 Examples of the diluent include n-butyl epoxypropyl ether, 2-ethylhexyl epoxypropyl ether, phenylepoxypropyl ether, allyl epoxypropyl ether, and styrene oxide. a reactive diluent such as α-pinene oxide, glycidyl methacrylate, 1-vinyl-3,4-epoxycyclohexane, or methyl ethyl ketone, cyclohexanone, toluene, xylene, A non-reactive diluent such as cyclohexane, methanol, isopropanol, acesulfame, ethyl acetate or butyl acetate.

作為上述增韌劑,可舉例如鄰酞酸二辛酯、或鄰酞酸二異丙酯等鄰酞酸酯、或聚丙二醇等。 Examples of the toughening agent include ortho-nonanoic acid esters such as dioctyl phthalate or diisopropyl ortho-nonanoate, and polypropylene glycol.

作為上述之矽烷類偶聯劑,可舉例如咪唑系矽烷偶聯劑、胺系矽烷偶聯劑、巰系矽烷偶聯劑等。 Examples of the decane coupling agent include an imidazole decane coupling agent, an amine decane coupling agent, and an oxime olefin coupling agent.

作為上述消泡劑,可舉例如醇消泡劑、金屬肥皂消泡劑、磷酸酯消泡劑、脂肪酸酯消泡劑、聚醚消泡劑、矽酮消泡劑、氟系消泡劑、礦物油消泡劑、丙烯酸系消泡劑等。 Examples of the antifoaming agent include an alcohol defoaming agent, a metal soap defoaming agent, a phosphate antifoaming agent, a fatty acid ester defoaming agent, a polyether antifoaming agent, an anthrone defoaming agent, and a fluorine defoaming agent. , mineral oil defoamer, acrylic defoamer, etc.

作為上述均染劑,可舉例如丙烯酸系均染劑、矽酮系均染劑等。 Examples of the leveling agent include an acrylic leveling agent and an anthrone-based leveling agent.

作為上述補強劑及充填劑,可舉例如氧化鋁或氧化鎂等金屬氧化物;碳酸鈣,碳酸鎂等金屬碳酸鹽;矽藻土粉、鹼性矽酸鎂、煅燒黏土、微粉二氧化矽、熔融二氧化矽、結晶二氧化矽等矽化合物;氫氧化鋁等金屬氫氧化物等粉末材料;或玻璃纖維、陶瓷纖維、碳纖維、氧化鋁纖維、碳化矽纖維、硼纖維、聚酯纖維等纖維質材料等。 Examples of the reinforcing agent and the filler include metal oxides such as alumina or magnesia; metal carbonates such as calcium carbonate and magnesium carbonate; diatomaceous earth powder, basic magnesium citrate, calcined clay, and fine powder of cerium oxide. a cerium compound such as molten cerium oxide or crystalline cerium oxide; a powder material such as a metal hydroxide such as aluminum hydroxide; or a fiber such as glass fiber, ceramic fiber, carbon fiber, alumina fiber, cerium carbide fiber, boron fiber or polyester fiber. Material, etc.

作為上述之阻燃劑,可舉例如:四溴雙酚A、三溴酚、六溴苯等鹵化物;磷酸三苯酯、多磷酸鹽等磷化物;氫氧化鋁、氫氧化鎂等金屬氫氧化物;三氧化二銻、五氧化二銻等銻系化物等。 Examples of the flame retardant include halides such as tetrabromobisphenol A, tribromophenol, and hexabromobenzene; phosphides such as triphenyl phosphate and polyphosphate; and metal hydrogen such as aluminum hydroxide and magnesium hydroxide. Oxide; lanthanide such as antimony trioxide or antimony pentoxide.

作為上述之著色劑、顏料及染料,可舉例如二氧化鈦、鐵墨、鉬紅、紺青、群青、鎘黃、鎘紅、三氧化二銻、紅磷等。 Examples of the above-mentioned coloring agent, pigment, and dye include titanium dioxide, iron ink, molybdenum red, indigo, ultramarine blue, cadmium yellow, cadmium red, antimony trioxide, and red phosphorus.

本發明之陰離子硬化性化合物用硬化劑可單獨使用,亦可與胺類、多胺類、肼類、酸酐、二氰二胺、鎓鹽、多硫醇類、酚類、酮亞胺等一般所使用之硬化劑併用。又,亦可併用公開周知乃至一般的陰離子硬化性化合物用硬化促進劑(硬化助劑)。又,本發明之陰離子硬化性化合物用硬化劑,為了催化促進其硬化性能,可與上述公開周知之一般硬化劑合併使用。 The curing agent for an anionic curing compound of the present invention may be used singly or in combination with an amine, a polyamine, an anthracene, an acid anhydride, a dicyandiamide, a phosphonium salt, a polythiol, a phenol or a ketimine. The hardener used is used in combination. Further, a curing accelerator (hardening aid) for an anionic curing compound which is known or even general can be used in combination. Further, the curing agent for an anion-curable compound of the present invention can be used in combination with a general curing agent known in the art for catalyzing the promotion of the curing property.

就本發明之陰離子硬化性化合物用硬化劑與陰離子硬化性化合物的混合方法而言,例如使用滾輪混練機、捏合機、或擠製機等,將含有指定量 之硬化劑及陰離子硬化性化合物的硬化性組成物進行混練。接著,藉由將該混練後之硬化性組成物加熱,可獲得陰離子硬化性化合物之硬化物。就加熱條件而言,可考慮陰離子硬化性化合物的種類、硬化劑的種類、添加劑的種類、各成分的掺合量等,而適當地選擇加熱溫度及加熱時間。 In the method for mixing the curing agent for an anionic curing compound of the present invention with an anionic curing compound, for example, a roller kneader, a kneader, an extruder, or the like is used, and a specified amount is contained. The hardening agent and the curable composition of the anion curable compound are kneaded. Next, by heating the kneaded composition after kneading, a cured product of the anion curable compound can be obtained. In the heating conditions, the type of the anion curable compound, the type of the curing agent, the type of the additive, the blending amount of each component, and the like can be considered, and the heating temperature and the heating time can be appropriately selected.

[實施例] [Examples]

以下,舉實施例以更具體說明本發明,但只要不超出其要旨,本發明不限於以下之實施例。 Hereinafter, the present invention will be more specifically described by way of examples, but the invention is not limited to the examples below, without departing from the spirit thereof.

[合成例1:2-(2-丁咪唑-1-基)琥珀酸二甲酯之合成] [Synthesis Example 1: Synthesis of dimethyl 2-(2-butyrazole-1-yl)succinate]

將1,8-二氮雜雙環[5.4.0]十一碳-7-烯(DBU)9.5g(0.06mol)、乙腈18ml、2-丁咪唑17.1g(0.14mol)裝入100ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸二甲酯18.0g(0.12mol),於25℃使其反應3小時。反應終了後,於減壓下去除溶劑,然後以二氯甲烷70ml與水50ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=1/1),將取得的濃縮液進行提純,而得到液狀之2-(2-丁咪唑-1-基)琥珀酸二甲酯。取得之2-(2-丁咪唑-1-基)琥珀酸二甲酯為13.1g,產率為39%。 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU) 9.5 g (0.06 mol), acetonitrile 18 ml, 2-butyrazole 17.1 g (0.14 mol) were charged in 100 ml of four The flask was stirred at 25 ° C. Here, 18.0 g (0.12 mol) of dimethyl fumarate was added dropwise, and the mixture was reacted at 25 ° C for 3 hours. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with dichloromethane (70 ml) and 50 ml of water. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate/hexane = 1/1) to give liquid 2-(2- Dimethyl imidazol-1-yl)succinate. The obtained dimethyl 2-(2-butylimid-1-yl)succinate was 13.1 g, and the yield was 39%.

2-(2-丁咪唑-1-基)琥珀酸二甲酯之保護基的脫離反應,會於179℃的溫度條件下開始,可以藉由NMR分析,確認2-(2-丁咪唑-1-基)琥珀酸二甲酯中的琥珀酸二甲酯之脫離。又,亦可藉由GC分析,確認生成來自已脫離之保護基A的反丁烯二酸二甲酯。 The deprotection reaction of the protecting group of dimethyl 2-(2-butyrazole-1-yl)succinate starts at a temperature of 179 ° C. It can be confirmed by NMR analysis that 2-(2-butyrazole-1 Decomposition of dimethyl succinate in dimethyl succinate. Further, it was confirmed by GC analysis that dimethyl fumarate derived from the protective group A which had been removed was produced.

[合成例2:2-(2-十一基咪唑-1-基)琥珀酸二甲酯之合成] [Synthesis Example 2: Synthesis of dimethyl 2-(2-undecyl imidazol-1-yl) succinate]

將DBU 7.9g(0.05mol)、乙腈15ml、2-十一基咪唑25.5g(0.11mol)裝入100ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸二甲酯15.0g(0.10mol),於25℃使其反應3小時。反應終了後,於減壓下去除溶劑,然後以二氯甲烷70ml與水50ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=3/2),將取得的濃縮液進行提純,而得到液狀之2-(2-十一基咪唑-1-基)琥珀酸二甲酯。取得之2-(2-十一基咪唑-1-基)琥珀酸二甲酯為12.1g,產率為32%。 DBU 7.9 g (0.05 mol), acetonitrile 15 ml, and 2-undecylimid 25.5 g (0.11 mol) were placed in a 100 ml four-necked flask and stirred at 25 °C. Here, 15.0 g (0.10 mol) of dimethyl fumarate was added dropwise, and the mixture was reacted at 25 ° C for 3 hours. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with dichloromethane (70 ml) and 50 ml of water. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate/hexane = 3/2) to give liquid 2-(2- Dimethyl decyl imidazol-1-yl)succinate. The obtained dimethyl 2-(2-undecidazol-1-yl)succinate was 12.1 g, and the yield was 32%.

2-(2-十一基咪唑-1-基)琥珀酸二甲酯之保護基的脫離反應,會於194℃的溫度條件下開始,可以藉由NMR分析,確認2-(2-十一基咪唑-1-基)琥珀酸二甲酯中的珀酸二甲酯之脫離。又,亦可藉由GC分析,確認生成來自已脫離之保護基A的反丁烯二酸二甲酯。 The cleavage reaction of the protecting group of dimethyl 2-(2-undecyl imidazol-1-yl)succinate will start at a temperature of 194 ° C, and it can be confirmed by NMR analysis that 2-(2-Eleven Detachment of dimethyl benzoate in dimethyl imidazol-1-yl)succinate. Further, it was confirmed by GC analysis that dimethyl fumarate derived from the protective group A which had been removed was produced.

[合成例3:2-咪唑-1-基琥珀酸雙(2-異丙基-5-甲基己基)酯之合成] [Synthesis Example 3: Synthesis of 2-imidazol-1-ylsuccinic acid bis(2-isopropyl-5-methylhexyl) ester]

將DBU 3.8g(0.03mol)、乙腈20ml、咪唑3.8g(0.06mol)裝入100ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸雙(2-異丙基-5-甲基己基)酯20.0g(0.05mol),於25℃使其反應2小時。反應終了後,於減壓下去除溶劑,然後以二氯甲烷60ml與水40ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=2/3),將取得的濃縮液進行提純,而得到液狀之2-咪唑-1-基琥珀酸雙(2-異丙基-5-甲基己基)酯。取得之2-咪唑-1-基琥珀酸雙(2-異丙基-5-甲基己基)酯為9.4g,產率為40%。 DBU 3.8 g (0.03 mol), acetonitrile 20 ml, and imidazole 3.8 g (0.06 mol) were placed in a 100 ml four-necked flask and stirred at 25 °C. Here, 20.0 g (0.05 mol) of bis(2-isopropyl-5-methylhexyl) fumarate was added dropwise, and the mixture was reacted at 25 ° C for 2 hours. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with dichloromethane (60 ml) and water 40 ml. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate /hexane = 2 / 3) to give liquid 2-imidazole-1. - bis(2-isopropyl-5-methylhexyl) succinate. The obtained 2-imidazol-1-ylsuccinic acid bis(2-isopropyl-5-methylhexyl) ester was 9.4 g in a yield of 40%.

2-咪唑-1-基琥珀酸雙(2-異丙基-5-甲基己基)酯之保護基的脫離反應,會於259℃的溫度條件下開始,可以藉由NMR分析,確認2-咪唑-1-基琥珀酸雙(2-異丙基-5-甲基己基)酯中的琥珀酸雙(2-異丙基-5-甲基己基)酯之脫離。 The deprotection reaction of the protecting group of 2-imidazol-1-ylsuccinate bis(2-isopropyl-5-methylhexyl) ester starts at a temperature of 259 ° C, and can be confirmed by NMR analysis. Detachment of bis(2-isopropyl-5-methylhexyl) succinate in bis(2-isopropyl-5-methylhexyl) imidazole-1-ylsuccinate.

[合成例4:2-(4-苯咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯之合成] [Synthesis Example 4: Synthesis of bis(2-isopropyl-5-methylhexyl) 2-(4-benzimidazole-1-yl)succinate]

將DBU 1.7g(0.01mol)、乙腈10ml、4-苯咪唑3.3g(0.02mol)裝入50ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸雙(2-異丙基-5-甲基己基)酯9.0g(0.02mol),於25℃使其反應30分鐘。反應終了後,於減壓下去除溶劑,然後以二氯甲烷30ml與水20ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=1/4),將取得的濃縮液進行提純,而得到液狀之2-(4-苯咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯。取得之2-(4-苯咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯為6.9g,產率為56%。 DBU 1.7 g (0.01 mol), acetonitrile 10 ml, and 4-benzimidazole 3.3 g (0.02 mol) were placed in a 50 ml four-necked flask, and stirred at 25 °C. Here, 9.0 g (0.02 mol) of bis(2-isopropyl-5-methylhexyl) fumarate was added dropwise thereto, and the mixture was reacted at 25 ° C for 30 minutes. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with 30 ml of dichloromethane and 20 ml of water. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate / hexane = 1/4) to give liquid 2-(4- Benzimidazol-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) ester. The obtained bis(2-isopropyl-5-methylhexyl) 2-(4-benzimidazole-1-yl)succinate was 6.9 g in a yield of 56%.

2-(4-苯咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯之保護基的脫離反應,會於292℃的溫度條件下開始,可以藉由NMR分析,確認2-(4-苯咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯中的琥珀酸雙(2-異丙基-5-甲基己基)酯之脫離。 The deprotection reaction of the protecting group of 2-(4-benzimidazole-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) ester starts at a temperature of 292 ° C and can be obtained by NMR Analysis to confirm bis(2-isopropyl-5-methylhexyl) succinate in bis(2-isopropyl-5-methylhexyl) 2-(4-benzimidazole-1-yl)succinate Ester separation.

[合成例5:2-(4-苯咪唑-1-基)琥珀酸雙(2-乙基己基)酯之合成] [Synthesis Example 5: Synthesis of bis(2-ethylhexyl) 2-(4-benzimidazole-1-yl)succinate]

將DBU 2.6g(0.02mol)、乙腈15ml、4-苯基咪唑5.0g(0.04mol)裝入100ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸雙(2-乙基己基)酯11.8g(0.04mol),於25℃使其反應30分鐘。反應終了後,於減壓下去除溶劑,然後以二氯甲烷60ml與水40ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=1/4),將取得的濃縮液進行提純,而得到液狀之2-(4-苯咪唑-1-基)琥珀酸雙(2-乙基己基)酯。取得之2-(4-苯咪唑-1-基)琥珀酸雙(2-乙基己基)酯為10.8g,產率為64%。 DBU 2.6 g (0.02 mol), acetonitrile 15 ml, and 4-phenylimidazole 5.0 g (0.04 mol) were placed in a 100 ml four-necked flask and stirred at 25 °C. Here, 11.8 g (0.04 mol) of bis(2-ethylhexyl) fumarate was added dropwise, and the mixture was reacted at 25 ° C for 30 minutes. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with dichloromethane (60 ml) and water 40 ml. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate / hexane = 1/4) to give liquid 2-(4- Bis(2-ethylhexyl) ester of benzimidazole-1-yl)succinate. The obtained bis(2-ethylhexyl) 2-(4-benzimidazole-1-yl)succinate was 10.8 g in a yield of 64%.

2-(4-苯咪唑-1-基)琥珀酸雙(2-乙基己基)酯之保護基的脫離反應,會於287℃的溫度條件下開始,可以藉由NMR分析,確認2-(4-苯咪唑-1-基)琥珀酸雙(2-乙基己基)酯中的琥珀酸雙(2-乙基己基)酯之脫離。 The deprotection reaction of the protecting group of 2-(4-benzimidazole-1-yl)succinic acid bis(2-ethylhexyl) acrylate starts at a temperature of 287 ° C, and can be confirmed by NMR analysis to confirm 2-( Detachment of bis(2-ethylhexyl) succinate in bis(2-ethylhexyl) 4-benzimidazol-1-yl)succinate.

[合成例6:2-(4-苯咪唑-1-基)琥珀酸二丁酯之合成] [Synthesis Example 6: Synthesis of dibutyl 2-(4-benzimidazol-1-yl)succinate]

將DBU 5.0g(0.03mol)、乙腈15ml、4-苯咪唑9.5g(0.06mol)裝入100ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸二丁酯15.0g(0.07mol),於25℃使其反應30分鐘。反應終了後,於減壓下去除溶劑,然後以二氯甲烷60ml與水40ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=1/4),將取得的濃縮液進行提純,而得到液狀之2-(4-苯咪唑-1-基)琥珀酸二丁酯。取得之2-(4-苯咪唑-1-基)琥珀酸二丁酯為12.6g,產率為51%。 5.0 g (0.03 mol) of DBU, 15 ml of acetonitrile, and 9.5 g (0.06 mol) of 4-benzimidazole were placed in a 100 ml four-necked flask, and stirred at 25 °C. Here, 15.0 g (0.07 mol) of dibutyl fumarate was added dropwise, and the mixture was reacted at 25 ° C for 30 minutes. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with dichloromethane (60 ml) and water 40 ml. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate / hexane = 1/4) to give liquid 2-(4- Dibutyl imidazole-1-yl)succinate. The obtained dibutyl 2-(4-benzimidazole-1-yl)succinate was 12.6 g, and the yield was 51%.

2-(4-苯咪唑-1-基)琥珀酸二丁酯之保護基的脫離反應,會於254℃的溫度條件下開始,可以藉由NMR分析,確認2-(4-苯咪唑-1-基)琥珀酸二丁酯中的琥珀酸二丁酯之脫離。 The deprotection reaction of the protecting group of 2-(4-benzimidazol-1-yl)succinate is started at a temperature of 254 ° C, and it can be confirmed by NMR analysis that 2-(4-benzimidazole-1 Separation of dibutyl succinate in di-butyl succinate.

[合成例7:2-(2-乙基-4-甲咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯之合成] [Synthesis Example 7: Synthesis of 2-(2-ethyl-4-methylimidazol-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) ester]

將DBU 1.5g(0.01mol)、乙腈10ml、2-乙基-4-甲咪唑2.2g(0.02mol)裝入50ml之四口燒瓶內,於25℃攪拌。於此,滴入反丁烯二酸雙(2-異丙基-5-甲基己基)酯8.0g(0.02mol),於25℃使其反應20小時。反應終了後,於減 壓下去除溶劑,然後以二氯甲烷30ml與水20ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=2/3),將取得的濃縮液進行提純,而得到液狀之2-(2-乙基-4-甲咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯。取得之2-(2-乙基-4-甲咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯為5.5g,產率為54%。 1.5 g (0.01 mol) of DBU, 10 ml of acetonitrile, and 2.2 g (0.02 mol) of 2-ethyl-4-methylimidazole were placed in a 50 ml four-necked flask, and stirred at 25 °C. Here, 8.0 g (0.02 mol) of bis(2-isopropyl-5-methylhexyl) fumarate was added dropwise thereto, and the mixture was reacted at 25 ° C for 20 hours. After the end of the reaction, The solvent was removed by pressing, and then extracted with 30 ml of dichloromethane and 20 ml of water. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate /hexane = 2 / 3) to give liquid 2-(2- Ethyl-4-methylimidazol-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) ester. The obtained bis(2-isopropyl-5-methylhexyl) 2-(2-ethyl-4-methylimidazol-1-yl)succinate was 5.5 g, and the yield was 54%.

2-(2-乙基-4-甲咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯之保護基的脫離反應,會於284℃的溫度條件下開始,可以藉由NMR分析,確認2-(2-乙基-4-甲咪唑-1-基)琥珀酸雙(2-異丙基-5-甲基己基)酯中的琥珀酸雙(2-異丙基-5-甲基己基)酯之脫離。 The deprotection reaction of the protecting group of 2-(2-ethyl-4-methylimidazol-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) succinate starts at 284 ° C The succinic acid bis(2- in 2-(2-ethyl-4-methylimidazol-1-yl)succinic acid bis(2-isopropyl-5-methylhexyl) ester can be confirmed by NMR analysis. Detachment of isopropyl-5-methylhexyl) ester.

[合成例8:2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯之合成] [Synthesis Example 8: 2-[(2,4-Dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ) Synthesis of esters]

將4-苯咪唑2.7g(0.02mol)、THF 50ml、三級丁醇鉀0.4g(3.6mmol)裝入200ml之四口燒瓶內,於25℃攪拌。於此,滴入2-(2,4-二甲氧苯亞基)丙二酸雙(2-異丙基-5-甲基己基)酯10.0g(0.02mol),於25℃使其反應30分鐘。反應終了後,於減壓下去除溶劑,然後以二氯甲烷100ml與水50ml進行萃取。將分取得到的有機層予以濃縮,然後藉由矽膠管柱層析法(乙酸乙酯/己烷=1/4),將取得的濃縮液進行提純,而得到液狀之2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯。取得之2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯為5.8g,產率為45%。 2.7 g (0.02 mol) of 4-benzimidazole, 50 ml of THF, and 0.4 g of potassium tertiary butylate (3.6 mmol) were placed in a 200 ml four-necked flask, and stirred at 25 °C. Here, 10.0 g (0.02 mol) of 2-(2,4-dimethoxyphenylene)malonate bis(2-isopropyl-5-methylhexyl) ester was added dropwise, and the reaction was carried out at 25 ° C. 30 minutes. After the completion of the reaction, the solvent was removed under reduced pressure, and then extracted with 100 ml of dichloromethane and 50 ml of water. The obtained organic layer was concentrated, and then the obtained concentrate was purified by silica gel column chromatography (ethyl acetate / hexane = 1/4) to obtain a liquid 2-[(2) , 4-Dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ester. 2-[(2,4-Dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ester was obtained 5.8 g, yield 45%.

2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯之保護基的脫離反應,會於130℃的溫度條件下開始,可以藉由NMR分析,確認2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯中的2-[1-(2,4-二甲氧苯基)乙基]丙二酸雙(2-異丙基-5-甲基己基)酯之脫離。 Protected groups of 2-[(2,4-dimethoxyphenyl)-(4-benzimidazole-1-yl)-methyl]malonic acid bis(2-isopropyl-5-methylhexyl) ester The detachment reaction starts at a temperature of 130 ° C, and it can be confirmed by NMR analysis that 2-[(2,4-dimethoxyphenyl)-(4-benzimidazole-1-yl)-methyl] 2-[1-(2,4-Dimethoxyphenyl)ethyl]malonic acid bis(2-isopropyl-) in bis(2-isopropyl-5-methylhexyl) malonate Detachment of 5-methylhexyl) ester.

又,由合成例8所得之2-[(2,4-二甲氧苯基)-(4-苯咪唑-1-基)-甲基]丙二酸雙(2-異丙基-5-甲基己基)酯之1H-NM頻譜圖(使用Bruker公司所製造之「Ascend 400」,內部標準物質:四甲氧矽烷,溶劑:CDCl3)如圖1所示, 其所屬如下。 Further, 2-[(2,4-dimethoxyphenyl)-(4-benzimidazol-1-yl)-methyl]malonic acid bis(2-isopropyl-5-) obtained in Synthesis Example 8 1 H-NM spectrogram of methylhexyl) ester (using "Ascend 400" manufactured by Bruker, internal standard substance: tetramethoxysilane, solvent: CDCl 3 ) as shown in Fig. 1, which belongs to the following.

7.70 ppm(d,2H,Ar-H) 7.70 ppm (d, 2H, Ar-H)

7.61 ppm(s,1H,N-C(H)=N) 7.61 ppm(s,1H,N-C(H)=N)

7.17-7.33 ppm(m,5H,Ar-H,N-C(CH)=C) 7.17-7.33 ppm(m,5H,Ar-H,N-C(CH)=C)

6.41-6.42 ppm(m,2H,Ar-H) 6.41-6.42 ppm(m, 2H, Ar-H)

6.17 ppm(d,1H,-CH-) 6.17 ppm(d,1H,-CH-)

4.60 ppm(d,1H,-CH-) 4.60 ppm(d,1H,-CH-)

3.92-3.96 ppm(m,4H,-OCH2-) 3.92-3.96 ppm(m,4H,-OCH2-)

3.80 ppm(s,3H,-OCH3) 3.80 ppm(s,3H,-OCH3)

3.78 ppm(s,3H,-OCH3) 3.78 ppm(s,3H,-OCH3)

0.72-1.60 ppm(m,38H,-CH- -CH2-,-CH3) 0.72-1.60 ppm (m, 38H, -CH- -CH2-, -CH3)

藉由以下方法以進行保護基脫離溫度之測定、保護基脫離與否之確認及脫離後之產物之分析。 The determination of the protection group detachment temperature, the confirmation of the detachment of the protecting group, and the analysis of the product after detachment were carried out by the following methods.

[脫離溫度之測定] [Measurement of detachment temperature]

將依據合成例所合成之硬化劑放入有蓋之鋁盤中,進行差示掃描熱分析(DSC),(使用Parkin Elmer公司所製造之「Diamond DSC」型差示掃描熱析儀,測定溫度範圍:30℃~350℃,升溫速度:10℃/min)。 The hardener synthesized according to the synthesis example was placed in a covered aluminum pan for differential scanning calorimetry (DSC), and the temperature range was measured using a "Diamond DSC" type differential scanning pyrolyzer manufactured by Parkin Elmer. : 30 ° C ~ 350 ° C, heating rate: 10 ° C / min).

[保護基脫離與否之確認及脫離後之產物之分析] [Analysis of the confirmation of the detachment of the protective group and the analysis of the product after the detachment]

將依據合成例所合成之硬化劑放入圓底燒瓶(附活塞)內,然後將圓底燒瓶浸泡於已加熱至接近保護基之脫離開始溫度的油浴中,加熱10分鐘後,使其返回室溫以進行1H-NMR(使用Bruker公司所製造之「Ascend 400」,內部標準物質:四甲氧矽烷,溶劑:CDCl3)及GC(使用島津製造所製造之「GCMS-GP2010」)之分析。 The hardener synthesized according to the synthesis example was placed in a round bottom flask (with a piston), and then the round bottom flask was immersed in an oil bath heated to a separation start temperature close to the protective group, and heated for 10 minutes, and then returned. 1 H-NMR (using "Ascend 400" manufactured by Bruker, internal standard substance: tetramethoxysilane, solvent: CDCl 3 ) and GC (using "GCMS-GP2010" manufactured by Shimadzu Corporation) at room temperature analysis.

[實施例1~8,比較例1~6] [Examples 1 to 8, Comparative Examples 1 to 6]

使用於合成例1~8中所得之各化合物作為實施例1~8,又,使用相當於合成例所得之各化合物之活性物質的咪唑系化合物(比較例1~4及6)及習知品之咪唑系潛在性硬化劑微粉(商品名:2MI-AZ,日本合成化學工業(股)公司製)(比較例5)作為比較例,進行以下之評價。 Each of the compounds obtained in Synthesis Examples 1 to 8 was used as Examples 1 to 8, and an imidazole compound (Comparative Examples 1 to 4 and 6) and a conventional imidazole of the active materials of each compound obtained in the synthesis example were used. A latent hardener fine powder (trade name: 2MI-AZ, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) (Comparative Example 5) was used as a comparative example, and the following evaluation was performed.

[保存穩定性試驗(適用期試驗)] [Storage Stability Test (Applicable Period Test)]

藉由將實施例1~8及比較例1~6之硬化劑添加至雙酚A型環氧樹脂(商品名:jER828,Japan Epoxy Resin公司製)中並予以混合,以調製環氧樹脂組成物。又,相對於雙酚A型環氧樹脂100重量份,實施例1~8之硬化劑添加量為5重量份;或相對於樹脂100g,硬化劑添加量為30mmol。比較例1~6之硬化劑添加量則為與所對應之實施例1~8之硬化劑添加量相同莫耳數之相當重量。 The curing agents of Examples 1 to 8 and Comparative Examples 1 to 6 were added to a bisphenol A type epoxy resin (trade name: jER828, manufactured by Japan Epoxy Resin Co., Ltd.) and mixed to prepare an epoxy resin composition. . Further, the amount of the curing agent added in Examples 1 to 8 was 5 parts by weight based on 100 parts by weight of the bisphenol A type epoxy resin; or the amount of the curing agent added was 30 mmol based on 100 g of the resin. The amount of the hardener added in Comparative Examples 1 to 6 was equivalent to the same amount of the hardener added to the corresponding Examples 1 to 8.

將此等組成物裝入可密閉之150ml玻璃容器內,於23℃實施適用期試驗。以布氏黏度計測量黏度,將相對於剛調製好的組成物之初期黏度,達到該黏度之2倍所需要之時間作為適用期值。將保存穩定性試驗之結果示於表1~5中。 These compositions were placed in a closable 150 ml glass vessel and subjected to a pot life test at 23 °C. The viscosity is measured by a Brookfield viscometer, and the time required to reach the initial viscosity of the just-formed composition to twice the viscosity is taken as the pot life value. The results of the storage stability test are shown in Tables 1 to 5.

[硬化性試驗] [Sclerosing test]

與上述之保存穩定性試驗同樣進行,使用實施例1~8及比較例1~6之硬化劑,以調製環氧樹脂組成物。關於此等組成物,於150℃實施硬化性試驗。硬化性試驗係透過以下方式進行:各組成物各自使用2g,採用膠化時間試驗機(安田精機製造所製)測定膠化時間。將硬化性試驗之結果一併示於表1~5中。 The epoxy resin composition was prepared by using the curing agents of Examples 1 to 8 and Comparative Examples 1 to 6 in the same manner as the storage stability test described above. The curability test was carried out at 150 ° C for these compositions. The sclerosing test was carried out by using 2 g of each composition and measuring the gelation time using a gelation time tester (manufactured by Yasuda Seiki Co., Ltd.). The results of the sclerosing test are shown together in Tables 1 to 5.

從表1、2、4及5所示之結果可知,相較於相當於各硬化劑之活性部位之比較例1、2、4及6之硬化劑,當使用實施例1、2及4~8之硬化劑時,雖然膠化時間些許變長,但與通常之環氧樹脂所需之硬化時間相較為相同程度,而可充分適用於實際之使用。再者,實施例1、2及4~8之硬化劑,相較於比較例1、2、4及6之硬化劑,其適用期更加延長,因此即使作為一液型硬化劑使用時,亦具有非常優異之保存穩定性。 From the results shown in Tables 1, 2, 4 and 5, it is understood that Examples 1, 2 and 4 are used as compared with the hardeners of Comparative Examples 1, 2, 4 and 6 which correspond to the active sites of the respective hardeners. In the case of the hardener of 8, the gelation time is somewhat long, but it is the same as the hardening time required for the usual epoxy resin, and can be sufficiently applied to practical use. Further, the hardeners of Examples 1, 2, and 4 to 8 have a longer pot life than the hardeners of Comparative Examples 1, 2, 4, and 6, so that even when used as a one-pack type hardener, Has excellent storage stability.

又,由表3所示之結果可知,實施例3之硬化劑之保存穩定性及硬化性能皆優於比較例3之硬化劑。 Further, as is clear from the results shown in Table 3, the storage stability and the hardening performance of the curing agent of Example 3 were superior to those of Comparative Example 3.

再者,由表4所示之結果可知,相較比較例5中的微粉狀潛在性咪唑,當使用實施例4~6之硬化劑時,雖然膠化時間些許變長,但與通常之環氧樹脂所需之硬化時間相較為相同程度,而可充分適用於實際之使用;再者,相較於比較例5之硬化劑,實施例4~6之硬化劑具有同樣優異的保存穩定性。又,比較例5中的硬化劑因為是粉末狀,而有需要繁雜的混合步驟、或得不到均勻的混合而引起硬化不良等問題發生的情形;相較於此,實施例4~6之硬化劑因為是液狀,具有優異的混合均勻性,使用也容易。 Further, as is apparent from the results shown in Table 4, when the hardening agent of the examples 4 to 6 was used as compared with the fine powdery latent imidazole of Comparative Example 5, although the gelation time was somewhat long, it was usual. The hardening time required for the epoxy resin is relatively the same, and can be sufficiently applied to practical use; further, the hardeners of Examples 4 to 6 have the same excellent storage stability as compared with the hardener of Comparative Example 5. . Further, since the curing agent in Comparative Example 5 is in the form of a powder, there is a case where a complicated mixing step is required, or a problem that hardening is not caused by uniform mixing is caused; in contrast, Examples 4 to 6 Since the hardener is liquid, it has excellent mixing uniformity and is easy to use.

由以上可知,本發明之陰離子硬化性化合物用硬化劑,作為一液型硬 化劑使用時,亦具有優異之保存穩定性及良好硬化性。再者,由於本發明之陰離子硬化性化合物用硬化劑,於常態下多為液體,毋須溶解步驟,混合均勻性亦優,因此使用簡便。 From the above, it can be seen that the curing agent for an anionic curing compound of the present invention is used as a one-pack type hard. When used, the agent also has excellent storage stability and good hardenability. Further, since the curing agent for an anion-curable compound of the present invention is usually a liquid in a normal state, it does not require a dissolution step, and the mixing uniformity is also excellent, so that it is easy to use.

又,本申請案係根據2012年5月10日提出申請之日本專利申請案(特願2012-108169),在此採用其內容作為參照。 Further, the present application is based on Japanese Patent Application No. 2012-108169, filed on May 10, 2012, the content of which is hereby incorporated by reference.

[產業上利用性] [Industrial use]

本發明之陰離子硬化性化合物用硬化劑,作為一液型硬化劑使用時亦具有優異之保存穩定性及良好硬化性,因此可用作為環氧樹脂或環硫樹脂等陰離子硬化性化合物之硬化劑。特別可用作為電子材料領域中的陰離子硬化性化合物之硬化劑。 The curing agent for an anionic curing compound of the present invention has excellent storage stability and good curability when used as a one-part curing agent, and thus can be used as a curing agent for an anionic curing compound such as an epoxy resin or an episulfide resin. It is particularly useful as a hardener for an anionic hardening compound in the field of electronic materials.

Claims (11)

一種陰離子硬化性化合物用硬化劑,係由咪唑系化合物所構成,且該咪唑系化合物之咪唑骨架編號1的位置受於50℃以上之溫度條件下可脫離之保護基A所保護。 A curing agent for an anionic curing compound is composed of an imidazole compound, and the position of the imidazole skeleton number 1 of the imidazole compound is protected by a protecting group A which can be detached at a temperature of 50 ° C or higher. 如申請專利範圍第1項之陰離子硬化性化合物用硬化劑,其中,該咪唑系化合物係如以下之通式(1)所示之咪唑系化合物; (A係於50℃以上之溫度條件下可脫離之保護基;R1~R3係各自獨立而為氫原子、碳數1~15之烷基、或苯基)。 The sclerosing agent for an anionic curing compound according to the first aspect of the invention, wherein the imidazole compound is an imidazole compound represented by the following formula (1); (A is a protecting group which can be detached at a temperature of 50 ° C or higher; R 1 to R 3 are each independently a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or a phenyl group). 如申請專利範圍第1項或第2項之陰離子硬化性化合物用硬化劑,其中,該可脫離的保護基A係如以下之通式(2)所示之保護基A1; (R4~R6係各自獨立而為氫原子或拉電子基,R4~R6中之至少兩者係拉電子基;但,R4亦可為碳數6~18之芳香環殘基或碳數1~15之烷基,於該情況下,R5及R6則各自係拉電子基)。 The hardening agent for an anionic hardening compound according to claim 1 or 2, wherein the detachable protecting group A is a protecting group A1 represented by the following formula (2); (R 4 to R 6 are each independently a hydrogen atom or a electron withdrawing group, and at least two of R 4 to R 6 are an electron withdrawing group; however, R 4 may also be an aromatic ring residue having a carbon number of 6 to 18. Or an alkyl group having 1 to 15 carbon atoms, in which case R 5 and R 6 each are an electron-donating group). 如申請專利範圍第1項或第2項之陰離子硬化性化合物用硬化劑,其中,該可脫離之保護基A係如以下之通式(3)所示之保護基A2; (R7係碳數1~15之烷基或碳數6~18之芳香環殘基,R8及R9各自係拉電子基)。 The curing agent for an anionic hardening compound according to claim 1 or 2, wherein the detachable protecting group A is a protecting group A2 represented by the following formula (3); (R 7 is an alkyl group having 1 to 15 carbon atoms or an aromatic ring residue having 6 to 18 carbon atoms, and each of R 8 and R 9 is an electron-donating group). 如申請專利範圍第1項或第2項之陰離子硬化性化合物用硬化劑,其中,該可脫離之保護基A係如以下之通式(4)所示之保護基A3; (R10及R11係各自獨立而為碳數1~15之烷基)。 The sclerosing agent for an anionic hardening compound according to claim 1 or 2, wherein the detachable protecting group A is a protecting group A3 represented by the following formula (4); (R 10 and R 11 are each independently an alkyl group having 1 to 15 carbon atoms). 如申請專利範圍第1項或第2項之陰離子硬化性化合物用硬化劑,其中,陰離子硬化性化合物係環氧化物或環硫化物。 A curing agent for an anionic curing compound according to the first or second aspect of the invention, wherein the anionic curing compound is an epoxide or an episulfide compound. 一種硬化性組成物,係含有如申請專利範圍第1項或第2項之陰離子硬化性化合物用硬化劑及陰離子硬化性化合物。 A curable composition containing the curing agent for an anionic curing compound and the anionic curing compound according to Item 1 or Item 2 of the patent application. 一種硬化物,係將如申請專利範圍第7項之硬化性組成物硬化而成者。 A cured product obtained by hardening a hardenable composition according to item 7 of the patent application. 一種如申請專利範圍第1項或第2項之咪唑系化合物之用途,係將其作為陰離子硬化性化合物用硬化劑。 An application of the imidazole-based compound according to the first or second aspect of the patent application is as a curing agent for an anionic curing compound. 一種如以下之通式(5)所示之咪唑系化合物; (R12及R13係各自獨立而為碳數1~15之烷基;R14~R16係各自獨立而為氫原子、碳數1~15之烷基、或苯基;Ar係碳數6~18之芳香環殘基)。 An imidazole compound represented by the following formula (5); (R 12 and R 13 are each independently an alkyl group having 1 to 15 carbon atoms; and R 14 to R 16 are each independently a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or a phenyl group; 6~18 aromatic ring residue). 一種如申請專利範圍第10項之咪唑系化合物之用途,係將其作為陰離子硬化性化合物用硬化劑。 An application of the imidazole-based compound according to claim 10 of the patent application is as a curing agent for an anionic curing compound.
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