TW201400415A - Ammonia purification system - Google Patents

Ammonia purification system Download PDF

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TW201400415A
TW201400415A TW101150685A TW101150685A TW201400415A TW 201400415 A TW201400415 A TW 201400415A TW 101150685 A TW101150685 A TW 101150685A TW 101150685 A TW101150685 A TW 101150685A TW 201400415 A TW201400415 A TW 201400415A
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adsorption
ammonia
adsorbent
layer
pipe
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Shinichi Tai
Shigeru Morimoto
Shuji Tsuno
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Sumitomo Seika Chemicals
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • C01CAMMONIA; CYANOGEN; COMPOUNDS THEREOF
    • C01C1/00Ammonia; Compounds thereof
    • C01C1/02Preparation, purification or separation of ammonia
    • C01C1/024Purification
    • BPERFORMING OPERATIONS; TRANSPORTING
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Abstract

Provided is an ammonia purification system which can purify ammonia by a simplified method, and which can purify ammonia efficiently by suppressing energy consumption. In this ammonia purification system (100), a first adsorption tower (31) and a second adsorption tower (32) adsorb and remove impurities contained in crude ammonia introduced from a raw material storage tank (1). The first adsorption tower (31) and the second adsorption tower (32) each have a laminated structure comprising a tower top adsorption layer, a first intermediate adsorption layer, a second intermediate adsorption layer and a tower bottom adsorption layer. By partially condensing the ammonia introduced from the first adsorption tower (31) and the second adsorption tower (32) to separate a gas-phase component and a liquid-phase component, a condenser (4) separates and removes highly-volatile impurities as the gas-phase component.

Description

氨純化系統 Ammonia purification system

本發明係關於一種將粗氨純化之氨純化系統。 The present invention relates to an ammonia purification system for purifying crude ammonia.

於半導體製造步驟及液晶製造步驟中,一直利用高純度之氨作為氮化物皮膜之製作等中所使用之處理劑。此種高純度之氨係藉由對粗氨進行純化將雜質去除而獲得。 In the semiconductor manufacturing process and the liquid crystal manufacturing process, high-purity ammonia is used as a processing agent used in the production of a nitride film. Such high-purity ammonia is obtained by purifying impurities by purifying crude ammonia.

粗氨中含有氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等低沸點氣體,烴等有機化合物,水分等作為雜質,通常可獲取之粗氨之純度為98~99重量%左右。 The crude ammonia contains low-boiling gas such as hydrogen, nitrogen, oxygen, argon, carbon monoxide or carbon dioxide, an organic compound such as a hydrocarbon, water or the like as an impurity, and the purity of the crude ammonia which can be usually obtained is about 98 to 99% by weight.

粗氨中所含之烴等有機化合物通常主要為碳數1~4者,但若於製造用作氨之合成原料之氫氣時裂解氣體中之油分之分離不充分,或者於製造時受到來自泵類之泵油之油污染,則亦有混入沸點較高且分子量較大之烴類的情況。又,若氨中含有較多水分,則有使利用該氨製造的半導體等之功能大幅度降低之情況,故而必需儘可能地減少氨中之水分。 The organic compound such as a hydrocarbon contained in the crude ammonia is usually mainly a carbon number of 1 to 4, but if the hydrogen used as a synthetic raw material for ammonia is produced, the separation of the oil in the cracked gas is insufficient, or it is received from the pump at the time of manufacture. Oil contamination of the pump oil of the type may also be mixed with hydrocarbons having a higher boiling point and a larger molecular weight. Further, when a large amount of water is contained in the ammonia, the function of a semiconductor or the like produced by the ammonia is greatly reduced. Therefore, it is necessary to reduce the moisture in the ammonia as much as possible.

雖根據半導體製造步驟及液晶製造步驟中使用氨之步驟之種類不同而氨中雜質之影響方式不同,但作為氨之純度,要求為99.9999重量%以上(各雜質濃度為100 ppb以下)、更佳為99.99999重量%左右。近年來,於氮化鎵之類的發光體製造用途中,要求水分濃度未達30 ppb。 Although the influence of impurities in ammonia differs depending on the type of the semiconductor manufacturing step and the step of using ammonia in the liquid crystal production step, the purity of ammonia is required to be 99.9999% by weight or more (each impurity concentration is 100 ppb or less), and more preferably It is about 99.99999% by weight. In recent years, in the production of illuminants such as gallium nitride, the water concentration is required to be less than 30 ppb.

作為將粗氨中所含之雜質去除之方法,已知有使用矽膠、合成沸石、活性碳等吸附劑將雜質吸附去除的方法, 將雜質蒸餾去除的方法等。又,亦已知有將吸附與蒸餾組合的方法。 As a method of removing impurities contained in the crude ammonia, a method of adsorbing and removing impurities by using an adsorbent such as tannin extract, synthetic zeolite or activated carbon is known. A method of distilling off impurities, and the like. Further, a method of combining adsorption with distillation is also known.

例如,專利文獻1中揭示有包含下述部分之氨純化系統:第1蒸餾塔,自液體狀之粗氨中將揮發性較低之雜質去除;吸附塔,藉由吸附劑將自第1蒸餾塔導出之氣體狀之氨中所含的雜質(主要是水分)吸附去除;及第2蒸餾塔,從自吸附塔導出之氣體狀之氨中將揮發性較高之雜質去除。 For example, Patent Document 1 discloses an ammonia purification system including a first distillation column in which impurities having a lower volatility are removed from a liquid crude ammonia, and an adsorption column which is subjected to a first distillation by an adsorbent. The impurities (mainly moisture) contained in the gaseous ammonia derived from the tower are adsorbed and removed; and the second distillation column removes the highly volatile impurities from the gaseous ammonia derived from the adsorption tower.

又,專利文獻2中揭示有氨之純化方法,其係將水分之吸附塔、烴之吸附塔及蒸餾塔組合而獲得高純度之氨。又,專利文獻3中揭示有氨之純化方法,其係利用蒸餾塔將沸點較低之雜質去除之後,利用吸附塔將水分自氣體狀之氨中去除,利用觸媒部將氧分離去除,藉此獲得高純度之氨。 Further, Patent Document 2 discloses a method for purifying ammonia by combining a water adsorption column, a hydrocarbon adsorption column, and a distillation column to obtain high-purity ammonia. Further, Patent Document 3 discloses a method for purifying ammonia, which removes impurities having a low boiling point by a distillation column, and then removes moisture from the gaseous ammonia by an adsorption tower, and separates and removes oxygen by a catalyst portion. This gives high purity ammonia.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2006-206410號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-206410

[專利文獻2]日本專利特表2008-505830號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-505830

[專利文獻3]日本專利特開2005-162546號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2005-162546

專利文獻1~3中所揭示之純化氨之技術中,係將粗氨中所含之雜質利用吸附塔進行吸附去除、或利用觸媒部中之觸媒反應而去除,進而利用蒸餾塔進行蒸餾去除,藉此將 氨純化。於如上所述之專利文獻1~3中所揭示的氨之純化方法中,自蒸餾塔導出之經純化後之氣體狀之氨係凝結成液體狀之氨而加以回收。即,於專利文獻1~3中所揭示之氨之純化方法中,係將粗氨中所含之雜質吸附去除、蒸餾去除,進而凝結而獲得經純化之液體狀之氨,因此作為純化氨之方法而言不能謂為簡化者,為將氨純化需要較多能量。 In the technique of purifying ammonia disclosed in Patent Documents 1 to 3, the impurities contained in the crude ammonia are removed by adsorption in an adsorption tower, or removed by a catalyst reaction in a catalyst unit, and further distilled by a distillation column. Remove, by this will Ammonia purification. In the method for purifying ammonia disclosed in Patent Documents 1 to 3 as described above, the purified gaseous ammonia derived from the distillation column is condensed into liquid ammonia and recovered. In other words, in the method for purifying ammonia disclosed in Patent Documents 1 to 3, the impurities contained in the crude ammonia are adsorbed and removed, distilled, and coagulated to obtain purified liquid ammonia, and thus, as a purified ammonia. The method cannot be said to be a simplification, and more energy is required for purifying ammonia.

因此,本發明之目的在於提供一種可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化的氨純化系統。 Accordingly, it is an object of the present invention to provide an ammonia purification system which can purify ammonia by a simplified method and can efficiently purify ammonia by suppressing energy consumption.

本發明係一種氨純化系統,其係將含有雜質之粗氨純化者,其特徵在於包括:貯存部,其貯存粗氨,並將其所貯存之粗氨導出;吸附部,其藉由選自活性碳、親水性沸石、疏水性沸石、矽膠、及活性氧化鋁中之吸附劑將自上述貯存部導出之粗氨中所含之雜質吸附去除而純化,並將經純化之氨導出,該吸附部包含一個或複數個吸附部分,該吸附部分沿粗氨之流動方向積層有以下各吸附劑層:第1吸附劑層,其含有第1吸附劑,複數層第2吸附劑層,其含有種類與上述第1吸附劑不同之第2吸附劑,及第3吸附劑層,其含有種類與上述第2吸附劑不同之第3吸附劑;以及 分凝部,其將自上述吸附部導出之經純化之氨分凝而分離為氣相成分與液相成分,藉此將揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。 The present invention relates to an ammonia purification system which is a crude ammonia purifier containing impurities, characterized by comprising: a storage portion for storing crude ammonia and discharging the stored crude ammonia; and an adsorption portion selected from the group consisting of The adsorbent in the activated carbon, the hydrophilic zeolite, the hydrophobic zeolite, the silicone, and the activated alumina is purified by adsorbing and removing impurities contained in the crude ammonia derived from the storage portion, and purifying the purified ammonia. The portion includes one or a plurality of adsorption portions, and the adsorption portion is laminated with the following adsorbent layers in the flow direction of the crude ammonia: a first adsorbent layer containing a first adsorbent, and a plurality of second adsorbent layers containing types a second adsorbent different from the first adsorbent and a third adsorbent layer containing a third adsorbent different in type from the second adsorbent; a segregation unit that separates and purifies the purified ammonia derived from the adsorption unit into a gas phase component and a liquid phase component, thereby separating and removing the highly volatile impurities in the form of a gas phase component. The form of the component obtained purified ammonia in the form of a liquid.

又,本發明之氨純化系統較佳為進而包括氣化部,其將自上述貯存部導出之液體狀之粗氨的一部分氣化,並將氣體狀之氨導出,且上述吸附部藉由上述吸附部分將自上述氣化部導出之氣體狀之氨中所含的雜質吸附去除。 Further, the ammonia purification system of the present invention preferably further includes a vaporization unit that vaporizes a part of the liquid crude ammonia derived from the storage portion, and exports the gaseous ammonia, and the adsorption unit is configured by the above The adsorption portion adsorbs and removes impurities contained in the gaseous ammonia derived from the vaporization portion.

又,於本發明之氨純化系統中,較佳為上述第1吸附劑為對水具有較高之吸附能力的吸附劑,上述第2吸附劑為對碳數未達5之有機化合物具有較高之吸附能力的吸附劑,上述第3吸附劑為對碳數5以上之有機化合物及水具有較高之吸附能力的吸附劑。 Further, in the ammonia purification system of the present invention, preferably, the first adsorbent is an adsorbent having a high adsorption capacity for water, and the second adsorbent is higher for an organic compound having a carbon number of less than 5. The adsorbent having an adsorption capacity, the third adsorbent is an adsorbent having a high adsorption capacity for an organic compound having 5 or more carbon atoms and water.

又,於本發明之氨純化系統中,較佳為上述吸附部分自粗氨之流動方向上游側向下游側依序積層有上述第1吸附劑層、上述複數層第2吸附劑層、及上述第3吸附劑層。 Further, in the ammonia purification system of the present invention, it is preferable that the adsorption portion partially stacks the first adsorbent layer, the plurality of second adsorbent layers, and the above-mentioned first adsorbent layer from the upstream side to the downstream side in the flow direction of the crude ammonia. The third adsorbent layer.

又,於本發明之氨純化系統中,較佳為上述吸附部包含複數個上述吸附部分,複數個吸附部分係串列或並列地連接。 Further, in the ammonia purification system of the present invention, preferably, the adsorption unit includes a plurality of the adsorption portions, and the plurality of adsorption portions are connected in series or in parallel.

根據本發明,氨純化系統係將含有雜質之粗氨純化之系統,包括貯存部、吸附部、及分凝部。貯存部係貯存粗氨 並將其所貯存之粗氨導出。吸附部係將自貯存部導出之粗氨中所含之雜質吸附去除而純化者,包含沿粗氨之流動方向積層有第1吸附劑層、複數層第2吸附劑層、及第3吸附劑層之吸附部分。於吸附部之吸附部分中,第1吸附劑層為含有第1吸附劑之層,第2吸附劑層為含有第2吸附劑之層,第3吸附劑層為含有第3吸附劑之層。此處,第1吸附劑、第2吸附劑、及第3吸附劑分別為選自活性碳、親水性沸石、疏水性沸石、矽膠、及活性氧化鋁中之吸附劑。 According to the present invention, an ammonia purification system is a system for purifying crude ammonia containing impurities, including a storage portion, an adsorption portion, and a segregation portion. Storage department stores crude ammonia And export the crude ammonia it stores. The adsorption unit removes and removes impurities contained in the crude ammonia derived from the storage unit, and includes a first adsorbent layer, a plurality of second adsorbent layers, and a third adsorbent laminated in the flow direction of the crude ammonia. The adsorption portion of the layer. In the adsorption portion of the adsorption unit, the first adsorbent layer is a layer containing a first adsorbent, the second adsorbent layer is a layer containing a second adsorbent, and the third adsorbent layer is a layer containing a third adsorbent. Here, each of the first adsorbent, the second adsorbent, and the third adsorbent is an adsorbent selected from the group consisting of activated carbon, hydrophilic zeolite, hydrophobic zeolite, silicone, and activated alumina.

自此種包含至少積層有第1吸附劑層、複數層第2吸附劑層、及第3吸附劑層之吸附部分的吸附部導出之氨係供給至分凝部。分凝部將自吸附部導出之氨分凝而分離為氣相成分與液相成分,藉此將揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。 The ammonia derived from the adsorption portion including at least the first adsorbent layer, the plurality of second adsorbent layers, and the adsorption portion of the third adsorbent layer is supplied to the branching portion. The fractionation unit separates the ammonia derived from the adsorption section into a gas phase component and a liquid phase component, thereby separating and removing the highly volatile impurities in the form of a gas phase component, and obtaining the purified component in the form of a liquid phase component. Liquid ammonia.

於本發明之氨純化系統中,係藉由積層有含有作為選自活性碳、親水性沸石、疏水性沸石、及矽膠中之吸附劑的第1吸附劑、第2吸附及第3吸附劑之吸附劑層的吸附部分對粗氨中所含之雜質進行吸附去除,故而可將粗氨中所含之雜質(主要是水及有機化合物)效率良好地吸附去除。並且,分凝部將自吸附部導出之氨分凝而分離為氣相成分與液相成分,故而可將氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,本發明之氨純化系統無需如先前技術般進行伴隨回流 之蒸餾,而可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化。 In the ammonia purification system of the present invention, the first adsorbent, the second adsorbent and the third adsorbent which are contained as adsorbents selected from the group consisting of activated carbon, hydrophilic zeolite, hydrophobic zeolite, and silicone are laminated. The adsorbed portion of the adsorbent layer adsorbs and removes impurities contained in the crude ammonia, so that impurities (mainly water and organic compounds) contained in the crude ammonia can be efficiently adsorbed and removed. Further, the segregation unit separates the ammonia derived from the adsorption unit into a gas phase component and a liquid phase component, so that a highly volatile impurity such as hydrogen, nitrogen, oxygen, argon, carbon monoxide or carbon dioxide can be used as a gas phase. The form of the component is separated and removed, and the purified liquid ammonia is obtained in the form of a liquid phase component. Therefore, the ammonia purification system of the present invention does not need to be accompanied by reflux as in the prior art. The distillation is carried out, and the ammonia can be purified by a simplified method, and ammonia can be efficiently purified by suppressing energy consumption.

又,根據本發明,氨純化系統進而包括氣化部。該氣化部係將自貯存部導出之液體狀之粗氨的一部分氣化,並將氣體狀之氨導出。並且,吸附部藉由積層有第1吸附劑層、複數層第2吸附劑層、及第3吸附劑層之吸附部分將自氣化部導出之氣體狀之氨中所含的雜質吸附去除。由於氣化部係構成為將自貯存部導出之液體狀之粗氨的一部分氣化,並將氣體狀之氨導出,因此可使粗氨中所含之揮發性較低之雜質(例如,水分、碳數6以上之烴等)殘留於液相中,將揮發性較低之雜質減少的氣體狀之氨導出。 Further, according to the present invention, the ammonia purification system further includes a gasification portion. The gasification unit vaporizes a part of the liquid crude ammonia derived from the storage unit, and exports the gaseous ammonia. Further, the adsorption unit adsorbs and removes impurities contained in the gaseous ammonia derived from the vaporization unit by the first adsorbent layer, the plurality of second adsorbent layers, and the adsorption portion of the third adsorbent layer. Since the vaporization unit is configured to vaporize a part of the liquid crude ammonia derived from the reservoir and to export the gaseous ammonia, the volatile impurities contained in the crude ammonia (for example, moisture) can be obtained. A hydrocarbon having a carbon number of 6 or more remains in the liquid phase, and a gaseous ammonia having a reduced volatility is derived.

又,根據本發明,吸附部之吸附部分中,第1吸附劑層中所含之第1吸附劑為對水具有較高之吸附能力的吸附劑,第2吸附劑層中所含之第2吸附劑為對碳數未達5之有機化合物具有較高之吸附能力的吸附劑,第3吸附劑層中所含之第3吸附劑為對碳數5以上之有機化合物及水具有較高之吸附能力的吸附劑。如此,由於係藉由積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層的吸附部分對粗氨中所含之雜質進行吸附去除,因此可將粗氨中所含之雜質(主要是水及有機化合物)效率良好地吸附去除。 Further, according to the present invention, in the adsorption portion of the adsorption unit, the first adsorbent contained in the first adsorbent layer is an adsorbent having a high adsorption capacity for water, and the second adsorbent layer is included in the second adsorbent layer. The adsorbent is an adsorbent having a high adsorption capacity for an organic compound having a carbon number of less than 5, and the third adsorbent contained in the third adsorbent layer is higher for an organic compound having a carbon number of 5 or more and water. Adsorption capacity of the adsorbent. In this way, the impurities contained in the crude ammonia are adsorbed and removed by the adsorption portion of the adsorbent layer having different adsorption capacities for water, carbon compounds having less than 5 carbon atoms, and organic compounds having a carbon number of 5 or more. Therefore, impurities (mainly water and organic compounds) contained in the crude ammonia can be efficiently adsorbed and removed.

又,根據本發明,吸附部之吸附部分係自粗氨之流動方向上游側向下游側依序積層有第1吸附劑層、第2吸附劑層、及第3吸附劑層。供給至吸附部之粗氨於吸附部分中 以第1吸附劑層、第2吸附劑層、第3吸附劑層之順序流動。由於第1吸附劑層中含有對水具有較高之吸附能力的第1吸附劑,故而流經吸附部分之粗氨首先於第1吸附劑層中將水之大部分吸附去除。藉此,相對於第1吸附劑層配置於氨之流動方向下游側之第2吸附劑層及第3吸附劑層對有機化合物之吸附能力可得到充分發揮,可提高吸附部分自粗氨中對雜質之吸附去除性。 Moreover, according to the present invention, the adsorption portion of the adsorption unit sequentially deposits the first adsorbent layer, the second adsorbent layer, and the third adsorbent layer from the upstream side to the downstream side in the flow direction of the crude ammonia. The crude ammonia supplied to the adsorption section is in the adsorption section The first adsorbent layer, the second adsorbent layer, and the third adsorbent layer flow in this order. Since the first adsorbent layer contains the first adsorbent having a high adsorption capacity for water, the crude ammonia flowing through the adsorbed portion first adsorbs and removes most of the water in the first adsorbent layer. Thereby, the adsorption capacity of the second adsorbent layer and the third adsorbent layer disposed on the downstream side in the flow direction of ammonia with respect to the first adsorbent layer can be sufficiently exhibited, and the adsorption portion can be improved from the crude ammonia. Adsorption removal of impurities.

又,根據本發明,吸附部包含複數個積層有第1吸附劑層、第2吸附劑層、及第3吸附劑層之吸附部分。複數個吸附部分係串列或並列地連接。於吸附部包含串列連接之複數個吸附部分之情形時,可提高對粗氨中所含之雜質之吸附去除能力。又,於吸附部包含並列連接之複數個吸附部分之情形時,可對並列連接之複數個吸附部分以分別區分開之狀態導入自貯存部導出之粗氨,因此可於以1個吸附部分進行吸附去除期間,對使用完畢之其他吸附部分進行再生處理以使得使用完畢之其他吸附部分可再次進行吸附去除動作。 Further, according to the invention, the adsorption unit includes a plurality of adsorption portions in which the first adsorbent layer, the second adsorbent layer, and the third adsorbent layer are laminated. A plurality of adsorbed portions are connected in series or in parallel. When the adsorption portion includes a plurality of adsorption portions connected in series, the adsorption removal ability of impurities contained in the crude ammonia can be improved. Further, in the case where the adsorption portion includes a plurality of adsorption portions connected in parallel, the plurality of adsorption portions connected in parallel may be introduced into the crude ammonia derived from the storage portion in a state of being separately separated, so that the adsorption portion may be carried out by one adsorption portion. During the adsorption removal, the other adsorbed portions that have been used are subjected to regeneration treatment so that the other adsorbed portions that have been used can be subjected to the adsorption removal operation again.

本發明之目的、特色及優點可藉由下述詳細說明與圖式而更為明確。 The objects, features, and advantages of the invention will be apparent from the description and drawings.

以下,參考圖式,詳細地說明本發明之較佳之實施形態。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

圖1係表示本發明之第1實施形態之氨純化系統100之構成的圖。本實施形態之氨純化系統100係將含有雜質之液 體狀之粗氨純化之系統。氨純化系統100係包括作為貯存部之原料貯存槽1、作為氣化部之氣化器2、作為吸附部之吸附單元3、作為分凝部之冷凝器4、及回收槽5而構成。 Fig. 1 is a view showing the configuration of an ammonia purification system 100 according to a first embodiment of the present invention. The ammonia purification system 100 of the present embodiment is a liquid containing impurities. System for the purification of crude ammonia. The ammonia purification system 100 includes a raw material storage tank 1 as a storage unit, a vaporizer 2 as a vaporization unit, an adsorption unit 3 as an adsorption unit, a condenser 4 as a partial condensation unit, and a recovery tank 5.

原料貯存槽1係貯存粗氨者。於本實施形態中,貯存於原料貯存槽1中之粗氨為純度99重量%以上,較佳為純度99.0~99.9重量%。 The raw material storage tank 1 is used for storing crude ammonia. In the present embodiment, the crude ammonia stored in the raw material storage tank 1 has a purity of 99% by weight or more, preferably 99.0 to 99.9% by weight.

原料貯存槽1只要為具有耐壓性及耐腐蝕性之保溫容器,則並無特別限制。該原料貯存槽1係將粗氨以液體狀之氨之形態貯存,並控制為特定之溫度及壓力。原料貯存槽1具有圓柱狀之內部空間,於在其內部空間中貯存有液體狀之粗氨之狀態下,原料貯存槽1之上部形成氣相,下部形成液相。 The raw material storage tank 1 is not particularly limited as long as it is a heat-resistant container having pressure resistance and corrosion resistance. The raw material storage tank 1 stores crude ammonia in the form of liquid ammonia and is controlled to a specific temperature and pressure. The raw material storage tank 1 has a cylindrical internal space, and in a state in which liquid ammonia is stored in the internal space thereof, a gas phase is formed in the upper portion of the raw material storage tank 1, and a liquid phase is formed in the lower portion.

原料貯存槽1上連接有排氣配管80,該排氣配管80成為用以將原料貯存槽1與外部連通,將分配於氣相中之揮發性較高之雜質(例如,氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等)排出至外部之流路。該排氣配管80上設置有使排氣配管80中之流路開放或封閉之排氣閥801。本實施形態之氨純化系統100係構成為藉由使排氣閥801開放而可實施自原料貯存槽1內所貯存之粗氨中將揮發性較高之雜質排出去除之排出動作。具體而言,將液體狀之粗氨於原料貯存槽1中貯存0.5~3天之後,使排氣閥801開放10~300分鐘。藉此,可將分配於原料貯存槽1中所形成之氣相中的粗氨中之揮發性較高之雜質經由排氣配管80而排出。 An exhaust pipe 80 is connected to the raw material storage tank 1, and the exhaust pipe 80 serves to exchange the raw material storage tank 1 with the outside, and is highly volatile (for example, hydrogen, nitrogen, and oxygen) distributed in the gas phase. , argon, carbon monoxide, carbon dioxide, etc.) are discharged to the external flow path. The exhaust pipe 80 is provided with an exhaust valve 801 that opens or closes a flow path in the exhaust pipe 80. In the ammonia purification system 100 of the present embodiment, the discharge operation of the high-volatility impurities from the crude ammonia stored in the raw material storage tank 1 can be performed by opening the exhaust valve 801. Specifically, after the liquid crude ammonia is stored in the raw material storage tank 1 for 0.5 to 3 days, the exhaust valve 801 is opened for 10 to 300 minutes. Thereby, the highly volatile impurities in the crude ammonia distributed in the gas phase formed in the raw material storage tank 1 can be discharged through the exhaust pipe 80.

將貯存於原料貯存槽1中之粗氨導出至氣化器2。自原料貯存槽1向氣化器2導出粗氨時,係自原料貯存槽1中所形成之液相中以液體狀之粗氨之形式導出。原料之粗氨存在根據製品批次之不同而雜質濃度之偏差較大的情況。如此,於將雜質濃度之偏差較大之粗氨自原料貯存槽1之氣相導出之情形時,有氣相中之成分組成之偏差較大,最終純化所得之氨之純度產生較大偏差之虞。本實施形態之氨純化系統100係構成為自原料貯存槽1之液相將液體狀之粗氨導出,因此即便於使用雜質濃度之偏差較大之粗氨作為原料之情形時,亦可防止最終純化所得之氨之純度產生較大之偏差。 The crude ammonia stored in the raw material storage tank 1 is led to the gasifier 2. When the crude ammonia is discharged from the raw material storage tank 1 to the gasifier 2, it is derived as a liquid crude ammonia from the liquid phase formed in the raw material storage tank 1. The crude ammonia of the raw material may have a large variation in impurity concentration depending on the batch of the product. In this case, when the crude ammonia having a large deviation in the impurity concentration is derived from the gas phase of the raw material storage tank 1, the composition of the gas phase has a large variation, and the purity of the ammonia obtained by the final purification is largely deviated. Hey. In the ammonia purification system 100 of the present embodiment, since the liquid crude ammonia is led out from the liquid phase of the raw material storage tank 1, even when crude ammonia having a large variation in impurity concentration is used as a raw material, the final prevention can be prevented. The purity of the ammonia obtained by the purification produces a large deviation.

於原料貯存槽1與氣化器2之間連接有第1配管81,自原料貯存槽1導出之液體狀之粗氨係流經第1配管81而供給至氣化器2。第1配管81上設置有使第1配管81中之流路開放或封閉之第1閥811。於向氣化器2供給液體狀之粗氨時,使第1閥811開放,從而使液體狀之粗氨自原料貯存槽1通過第1配管81內向氣化器2流動。 The first pipe 81 is connected between the raw material storage tank 1 and the gasifier 2, and the liquid crude ammonia derived from the raw material storage tank 1 flows through the first pipe 81 and is supplied to the vaporizer 2. The first pipe 81 is provided with a first valve 811 that opens or closes the flow path in the first pipe 81. When the liquid ammonia is supplied to the vaporizer 2, the first valve 811 is opened, and the liquid crude ammonia flows from the raw material storage tank 1 into the vaporizer 2 through the inside of the first pipe 81.

氣化器2將自原料貯存槽1導出之液體狀之粗氨的一部分氣化。即,氣化器2係將液體狀之粗氨加熱而以特定之氣化率將其氣化,從而分離為氣相成分與液相成分,並將氣體狀之氨導出。氣化器2將液體狀之粗氨的一部分氣化,因此可使粗氨中所含之揮發性較低之雜質(例如,水分、碳數6以上之烴等)殘留於液相中,將揮發性較低之雜質減少的氣體狀之氨導出。 The gasifier 2 vaporizes a part of the liquid crude ammonia derived from the raw material storage tank 1. That is, the vaporizer 2 heats the liquid crude ammonia and vaporizes it at a specific gasification rate, thereby separating into a gas phase component and a liquid phase component, and deriving the gaseous ammonia. The gasifier 2 vaporizes a part of the liquid crude ammonia, so that impurities having low volatility (for example, moisture, hydrocarbons having a carbon number of 6 or more) contained in the crude ammonia remain in the liquid phase. The gaseous ammonia which is reduced by the less volatile impurities is derived.

於本實施形態中,氣化器2將自原料貯存槽1導出之液體狀之粗氨以90~95體積%之氣化率氣化而分離為氣相成分與液相成分。於此情形時,自原料貯存槽1導出之液體狀之粗氨之90~95體積%成為氣相成分,5~10體積%成為液相成分。 In the present embodiment, the vaporizer 2 vaporizes the liquid crude ammonia derived from the raw material storage tank 1 at a gasification rate of 90 to 95% by volume to separate into a gas phase component and a liquid phase component. In this case, 90 to 95% by volume of the liquid crude ammonia derived from the raw material storage tank 1 is a gas phase component, and 5 to 10% by volume is a liquid phase component.

氣化器2上連接有設置有第2閥821之第2配管82、與設置有排出閥801A之排出配管80A。再者,第2配管82係使自氣化器2導出之氣體狀之氨向吸附單元3流動之配管,且連接於流量調整器71。於氣化器2中以液相成分之形式自氨中分離去除之揮發性較低之雜質係於使排出閥801A開放之狀態下,流經排出配管80A而排出至系統外部。又,於氣化器2中以氣相成分之形式獲得之氣體狀之氨於使第2閥821開放之狀態下,流經第2配管82而供給至流量調整器71。 The vaporizer 2 is connected to a second pipe 82 provided with a second valve 821 and a discharge pipe 80A provided with a discharge valve 801A. In addition, the second pipe 82 is a pipe through which the gaseous ammonia derived from the gasifier 2 flows to the adsorption unit 3, and is connected to the flow rate adjuster 71. The low-volatility impurities separated from the ammonia in the form of a liquid phase component in the vaporizer 2 are discharged to the outside of the system through the discharge pipe 80A while the discharge valve 801A is opened. In addition, the gaseous ammonia obtained as a gas phase component in the vaporizer 2 flows through the second pipe 82 and is supplied to the flow rate adjuster 71 in a state where the second valve 821 is opened.

流量調整器71上連接有第3配管83,該第3配管83之與連接於流量調整器71之側相反之側的端部分支。第3配管83之上述端部的一分支連接於後述之第1吸附塔31之塔頂部上所連接之第4配管84,另一分支連接於後述之第2吸附塔32之塔頂部上所連接之第5配管85。 A third pipe 83 is connected to the flow rate adjuster 71, and the third pipe 83 is branched from an end portion on the side opposite to the side connected to the flow rate adjuster 71. One branch of the end portion of the third pipe 83 is connected to the fourth pipe 84 connected to the top of the first adsorption tower 31, which will be described later, and the other branch is connected to the top of the tower of the second adsorption tower 32, which will be described later. The fifth pipe 85.

第4配管84上設置有使第4配管84中之流路開放或封閉之第4閥841。又,第5配管85上設置有使第5配管85中之流路開放或封閉之第5閥851。流量經流量調整器71調整之氣體狀之氨於使第4閥841開放且使第5閥851封閉之狀態下,流經第3配管83及第4配管84而供給至第1吸附塔31。又,流 量經流量調整器71調整之氣體狀之氨於使第5閥851開放且使第4閥841封閉之狀態下,流經第3配管83及第5配管85而供給至第2吸附塔32。即,第1吸附塔31與第2吸附塔32係經由第4配管84及第5配管85而並列連接。 The fourth pipe 84 is provided with a fourth valve 841 that opens or closes the flow path in the fourth pipe 84. Further, the fifth pipe 85 is provided with a fifth valve 851 that opens or closes the flow path in the fifth pipe 85. The gaseous ammonia whose flow rate is adjusted by the flow rate adjuster 71 is supplied to the first adsorption tower 31 in a state where the fourth valve 841 is opened and the fifth valve 851 is closed, and flows through the third pipe 83 and the fourth pipe 84. Again, flow The gaseous ammonia which is adjusted by the flow rate adjuster 71 is supplied to the second adsorption tower 32 while the fifth valve 851 is opened and the fourth valve 841 is closed, and flows through the third pipe 83 and the fifth pipe 85. In other words, the first adsorption tower 31 and the second adsorption tower 32 are connected in parallel via the fourth pipe 84 and the fifth pipe 85.

吸附單元3係將自氣化器2導出之氣體狀之氨中所含的雜質吸附去除而純化。吸附單元3係包含作為吸附部分的第1吸附塔31及第2吸附塔32而構成。 The adsorption unit 3 purifies and removes impurities contained in the gaseous ammonia derived from the gasifier 2 by adsorption. The adsorption unit 3 includes a first adsorption tower 31 and a second adsorption tower 32 as adsorption portions.

第1吸附塔31具有自塔頂部向塔底部(自氨之流動方向上游側向下游側)依序積層有塔頂吸附層311、第1中間吸附層312、第2中間吸附層313、及塔底吸附層314之積層構造。 The first adsorption tower 31 has an overhead adsorption layer 311, a first intermediate adsorption layer 312, a second intermediate adsorption layer 313, and a column sequentially stacked from the top of the column to the bottom of the column (upstream from the upstream side to the downstream side in the flow direction of ammonia). The laminated structure of the bottom adsorption layer 314.

塔頂吸附層311係含有第1吸附劑之層,具有作為第1吸附劑層之功能。第1吸附劑為對水具有較高之吸附能力的多孔質吸附劑。作為此種第1吸附劑,例如可列舉:活性碳、MS-13X(孔徑9 Å之多孔質合成沸石)、活性氧化鋁等。本實施形態中係使用活性碳作為第1吸附劑。 The column top adsorption layer 311 is a layer containing a first adsorbent and has a function as a first adsorbent layer. The first adsorbent is a porous adsorbent having a high adsorption capacity for water. Examples of such a first adsorbent include activated carbon, MS-13X (porous synthetic zeolite having a pore size of 9 Å), activated alumina, and the like. In the present embodiment, activated carbon is used as the first adsorbent.

第1中間吸附層312係含有第2吸附劑之層,具有作為第2吸附劑層之功能。第2吸附劑為對碳數未達5之有機化合物(烴、醇、醚等)具有較高之吸附能力的多孔質吸附劑。作為此種第2吸附劑,例如可列舉:MS-3A(孔徑3 Å之多孔質合成沸石)、MS-4A(孔徑4 Å之多孔質合成沸石)、MS-5A(孔徑5 Å之多孔質合成沸石)、MS-13X(孔徑9 Å之多孔質合成沸石)等親水性沸石,高矽型(二氧化矽/氧化鋁比較高之)沸石等疏水性沸石,矽膠等。又,第2中間吸附層 313與第1中間吸附層312同樣地為含有第2吸附劑之層,具有作為第2吸附劑層之功能。但是,雖然第1中間吸附層312與第2中間吸附層313同為含有第2吸附劑之層,但係使用種類互不相同之吸附劑。 The first intermediate adsorption layer 312 is a layer containing a second adsorbent and has a function as a second adsorbent layer. The second adsorbent is a porous adsorbent having a high adsorption capacity for an organic compound (hydrocarbon, alcohol, ether, etc.) having a carbon number of less than 5. Examples of such a second adsorbent include MS-3A (porous synthetic zeolite having a pore diameter of 3 Å), MS-4A (porous synthetic zeolite having a pore size of 4 Å), and MS-5A (porous having a pore diameter of 5 Å). Hydrophobic zeolite such as synthetic zeolite), MS-13X (porous synthetic zeolite having a pore size of 9 Å), hydrophobic zeolite such as sorghum-type (cerium dioxide/aluminum oxide) zeolite, silicone or the like. Also, the second intermediate adsorption layer Similarly to the first intermediate adsorption layer 312, 313 is a layer containing the second adsorbent and has a function as a second adsorbent layer. However, the first intermediate adsorption layer 312 and the second intermediate adsorption layer 313 are the same layer containing the second adsorbent, but different types of adsorbents are used.

塔底吸附層314係含有第3吸附劑之層,具有作為第3吸附劑層之功能。第3吸附劑為對碳數5以上之有機化合物(烴等)及水具有較高之吸附能力的多孔質吸附劑。作為此種第3吸附劑,可列舉:活性碳、MS-13X等。 The bottom adsorption layer 314 is a layer containing a third adsorbent and has a function as a third adsorbent layer. The third adsorbent is a porous adsorbent having a high adsorption capacity for an organic compound (hydrocarbon or the like) having a carbon number of 5 or more and water. Examples of such a third adsorbent include activated carbon and MS-13X.

列舉具體例對第1吸附塔31中之積層構造進行說明。於第1具體例中,塔頂吸附層311係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層312係含有親水性沸石(MS-3A,Tosoh股份有限公司製造)作為第2吸附劑之層,第2中間吸附層313係含有矽膠(Silbead N,水澤化學工業股份有限公司製造)作為第2吸附劑之層,塔底吸附層314係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第3吸附劑之層。 The laminated structure in the first adsorption tower 31 will be described with reference to specific examples. In the first specific example, the column top adsorption layer 311 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 312 contains a hydrophilic zeolite (MS-3A, In the second adsorbent layer 313, the second intermediate adsorbing layer 313 contains tantalum (Silbead N, manufactured by Mizusawa Chemical Co., Ltd.) as a layer of the second adsorbent, and the bottom adsorbent layer 314 contains Activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) was used as a layer of the third adsorbent.

於第2具體例中,塔頂吸附層311係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層312係含有親水性沸石(MS-3A,Tosoh股份有限公司製造)作為第2吸附劑之層,第2中間吸附層313係含有矽膠(Silbead N,水澤化學工業股份有限公司製造)作為第2吸附劑之層,塔底吸附層314係含有MS-13X(SA-600A,Tosoh股份有限公司製造)作為第3吸附劑之層。 In the second specific example, the column top adsorption layer 311 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 312 contains a hydrophilic zeolite (MS-3A, In the second adsorbent layer 313, the second intermediate adsorbing layer 313 contains tantalum (Silbead N, manufactured by Mizusawa Chemical Co., Ltd.) as a layer of the second adsorbent, and the bottom adsorbent layer 314 contains MS-13X (SA-600A, manufactured by Tosoh Co., Ltd.) was used as a layer of the third adsorbent.

於第3具體例中,塔頂吸附層311係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層312係含有親水性沸石(MS-4A,Tosoh股份有限公司製造)作為第2吸附劑之層,第2中間吸附層313係含有疏水性沸石(HSZ-300,二氧化矽/氧化鋁比=10,Tosoh股份有限公司製造)作為第2吸附劑之層,塔底吸附層314係含有MS-13X(SA-600A,Tosoh股份有限公司製造)作為第3吸附劑之層。 In the third embodiment, the column top adsorption layer 311 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 312 contains a hydrophilic zeolite (MS-4A, As a layer of the second adsorbent, the second intermediate adsorption layer 313 contains a hydrophobic zeolite (HSZ-300, cerium oxide/alumina ratio = 10, manufactured by Tosoh Co., Ltd.) as the second adsorption. In the layer of the agent, the bottom adsorption layer 314 contains MS-13X (SA-600A, manufactured by Tosoh Co., Ltd.) as a layer of the third adsorbent.

於第4具體例中,塔頂吸附層311係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層312係含有親水性沸石(MS-4A,Tosoh股份有限公司製造)作為第2吸附劑之層,第2中間吸附層313係含有疏水性沸石(HSZ-300,二氧化矽/氧化鋁比=10,Tosoh股份有限公司製造)作為第2吸附劑之層,塔底吸附層314係含有MS-13X(SA-600A,Tosoh股份有限公司製造)與活性碳(GG,Kuraray Chemical股份有限公司製造)之積層體作為第3吸附劑之層。 In the fourth embodiment, the column top adsorption layer 311 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 312 contains a hydrophilic zeolite (MS-4A, As a layer of the second adsorbent, the second intermediate adsorption layer 313 contains a hydrophobic zeolite (HSZ-300, cerium oxide/alumina ratio = 10, manufactured by Tosoh Co., Ltd.) as the second adsorption. In the layer of the agent, the bottom adsorption layer 314 is a layer containing a laminate of MS-13X (SA-600A, manufactured by Tosoh Co., Ltd.) and activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a third adsorbent.

第2吸附塔32具有自塔頂部向塔底部(自氨之流動方向上游側向下游側)依序積層有塔頂吸附層321、第1中間吸附層322、第2中間吸附層323、及塔底吸附層324之積層構造。 The second adsorption tower 32 has an overhead adsorption layer 321 , a first intermediate adsorption layer 322 , a second intermediate adsorption layer 323 , and a tower sequentially stacked from the top of the tower to the bottom of the tower (upstream from the upstream side to the downstream side in the flow direction of ammonia). The laminated structure of the bottom adsorption layer 324.

塔頂吸附層321係以與上述之第1吸附塔31之塔頂吸附層311相同之方式構成的含有第1吸附劑之層,具有作為第1吸附劑層之功能。第1中間吸附層322係以與上述之第1吸 附塔31之第1中間吸附層312相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。第2中間吸附層323係以與上述之第1吸附塔31之第2中間吸附層313相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。塔底吸附層324係以與上述之第1吸附塔31之塔底吸附層314相同之方式構成的含有第3吸附劑之層,具有作為第3吸附劑層之功能。 The column top adsorption layer 321 is a layer containing the first adsorbent, which is configured in the same manner as the column top adsorption layer 311 of the first adsorption column 31 described above, and has a function as a first adsorbent layer. The first intermediate adsorption layer 322 is combined with the first absorption described above The layer containing the second adsorbent configured in the same manner as the first intermediate adsorption layer 312 of the tower 31 has a function as a second adsorbent layer. The second intermediate adsorption layer 323 has a second adsorbent-containing layer configured in the same manner as the second intermediate adsorption layer 313 of the first adsorption tower 31 described above, and has a function as a second adsorbent layer. The bottom adsorption layer 324 is a layer containing a third adsorbent which is configured in the same manner as the bottom adsorption layer 314 of the first adsorption tower 31 described above, and has a function as a third adsorbent layer.

第1吸附塔31及第2吸附塔32中所使用之第1吸附劑、第2吸附劑及第3吸附劑可藉由加熱、減壓、加熱及減壓之任一種處理使所吸附之雜質(水分及烴等有機化合物)脫離而再生。例如,於藉由加熱處理使吸附於吸附劑之雜質脫離之情形時,只要於200~350℃之溫度下進行加熱即可。 The first adsorbent, the second adsorbent, and the third adsorbent used in the first adsorption tower 31 and the second adsorption tower 32 can be treated by any one of heating, decompression, heating, and decompression to adsorb the impurities. (Organic compounds such as moisture and hydrocarbons) are detached and regenerated. For example, when the impurities adsorbed to the adsorbent are removed by heat treatment, heating may be carried out at a temperature of 200 to 350 °C.

又,於本實施形態之氨純化系統100中,第1吸附塔31及第2吸附塔32係將溫度控制為0~60℃,壓力控制為0.1~1.0 MPa。於第1吸附塔31及第2吸附塔32之溫度未達0℃之情形時,必需進行將雜質之吸附去除時所產生之吸附熱去除之冷卻,有能量效率降低之虞。於第1吸附塔31及第2吸附塔32之溫度超過60℃之情形時,有吸附劑對雜質之吸附能力降低之虞。又,於第1吸附塔31及第2吸附塔32之壓力未達0.1 MPa之情形時,有吸附劑對雜質之吸附能力降低之虞,於壓力超過1.0 MPa之情形時,需要較多能量以維持於固定壓力,有能量效率降低之虞。 Further, in the ammonia purification system 100 of the present embodiment, the first adsorption tower 31 and the second adsorption tower 32 control the temperature to 0 to 60 ° C and the pressure control to 0.1 to 1.0 MPa. When the temperature of the first adsorption tower 31 and the second adsorption tower 32 is less than 0 ° C, it is necessary to perform cooling for removing the adsorption heat generated when the impurities are adsorbed and removed, and the energy efficiency is lowered. When the temperature of the first adsorption tower 31 and the second adsorption tower 32 exceeds 60 ° C, the adsorption capacity of the adsorbent for impurities is lowered. Further, when the pressures of the first adsorption tower 31 and the second adsorption tower 32 are less than 0.1 MPa, there is a possibility that the adsorption capacity of the adsorbent to the impurities is lowered, and when the pressure exceeds 1.0 MPa, more energy is required. Maintained at a fixed pressure, there is a drop in energy efficiency.

又,第1吸附塔31及第2吸附塔32之線速度(linear velocity)較佳為0.1~10.0 m/s。於線速度未達0.1 m/s之情形 時,雜質之吸附去除需要長時間,故而欠佳,於線速度超過10.0 m/s之情形時,有雜質之吸附去除時所產生之吸附熱未充分去除,而吸附劑對雜質之吸附能力降低之虞。再者,上述線速度係以如下方式求得之值:將每單位時間內向第1吸附塔31或第2吸附塔32供給的氣體狀之氨之量換算為NTP(normal temperature and pressure,標準溫壓)下之氣體體積,並除以各吸附塔31、32之空塔剖面積。 Further, the linear velocity of the first adsorption tower 31 and the second adsorption tower 32 is preferably 0.1 to 10.0 m/s. At a line speed of less than 0.1 m/s When the adsorption of impurities is removed for a long time, it is not preferable. When the linear velocity exceeds 10.0 m/s, the adsorption heat generated by the adsorption removal of impurities is not sufficiently removed, and the adsorption capacity of the adsorbent for impurities is lowered. After that. In addition, the linear velocity is obtained by converting the amount of gaseous ammonia supplied to the first adsorption tower 31 or the second adsorption tower 32 per unit time to NTP (normal temperature and pressure). The volume of gas under pressure is divided by the cross-sectional area of the empty towers of each of the adsorption columns 31, 32.

又,於本實施形態之氨純化系統100中,較佳為對自第1吸附塔31及第2吸附塔32導出之氨中所含之雜質之濃度進行分析。作為對氨中所含之雜質之濃度進行分析之裝置,可列舉氣相層析分析裝置(GC-PDD:脈衝放電型檢測器)。作為該氣相層析分析裝置之具體例,例如可列舉:GL Science股份有限公司製造之GC-4000。可根據利用氣相層析分析裝置獲得之分析結果,設定後述之冷凝器4之分凝條件(凝結率之設定等)。 Further, in the ammonia purification system 100 of the present embodiment, it is preferable to analyze the concentration of impurities contained in the ammonia derived from the first adsorption tower 31 and the second adsorption tower 32. As a device for analyzing the concentration of impurities contained in ammonia, a gas chromatography analyzer (GC-PDD: pulse discharge type detector) can be cited. Specific examples of the gas chromatography analysis apparatus include, for example, GC-4000 manufactured by GL Science Co., Ltd. The condensation condition (setting of the condensation rate, etc.) of the condenser 4 to be described later can be set based on the analysis result obtained by the gas chromatography analyzer.

第1吸附塔31之塔底部連接有第6配管86,該第6配管86之與連接於第1吸附塔31之側相反之側的端部分支。第6配管86之上述端部之一分支連接於後述之冷凝器4上所連接之第7配管87,另一分支連接於第2吸附塔32之塔頂部上所連接之第8配管88。 The sixth pipe 86 is connected to the bottom of the tower of the first adsorption tower 31, and the sixth pipe 86 is branched from the end portion on the side opposite to the side connected to the first adsorption tower 31. One of the ends of the sixth pipe 86 is branched and connected to the seventh pipe 87 connected to the condenser 4 to be described later, and the other branch is connected to the eighth pipe 88 connected to the top of the tower of the second adsorption tower 32.

第7配管87上設置有使第7配管87中之流路開放或封閉之第7閥871。又,第8配管88上設置有使第8配管88中之流路開放或封閉之第8閥881。藉由第1吸附塔31而雜質經吸附去除之氣體狀之氨於使第7閥871開放且使第8閥881封閉之 狀態下,流經第6配管86及第7配管87而供給至冷凝器4。又,藉由第1吸附塔31而雜質經吸附去除之氣體狀之氨於使第8閥881開放且使第7閥871封閉之狀態下,流經第6配管86及第8配管88而供給至第2吸附塔32。即,第1吸附塔31與第2吸附塔32係經由第6配管86及第8配管88而串列連接。 The seventh pipe 87 is provided with a seventh valve 871 that opens or closes the flow path in the seventh pipe 87. Further, the eighth pipe 88 is provided with an eighth valve 881 that opens or closes the flow path in the eighth pipe 88. The gaseous ammonia which is adsorbed and removed by the first adsorption tower 31 causes the seventh valve 871 to be opened and the eighth valve 881 to be closed. In the state, it flows through the sixth pipe 86 and the seventh pipe 87 and is supplied to the condenser 4. In addition, the gaseous ammonia which is adsorbed and removed by the first adsorption tower 31 is supplied to the sixth pipe 881 and the eighth valve 871 is closed, and flows through the sixth pipe 86 and the eighth pipe 88. To the second adsorption tower 32. In other words, the first adsorption tower 31 and the second adsorption tower 32 are connected in series via the sixth pipe 86 and the eighth pipe 88.

又,第2吸附塔32之塔底部連接有第9配管89,該第9配管89之與連接於第2吸附塔32之側相反之側的端部係連接於冷凝器4。第9配管89上設置有使第9配管89中之流路開放或封閉之第9閥891。該第9配管89上相對於第9閥891的氨之流動方向下游側,設置有自第9配管89分支之第10配管90。該第10配管90上設置有使第10配管90中之流路開放或封閉之第10閥901。進而,該第10配管90之與連接於第9配管89之側相反之側的端部係連接於第1吸附塔31之塔頂部。 Further, a ninth pipe 89 is connected to the bottom of the tower of the second adsorption tower 32, and an end of the ninth pipe 89 opposite to the side connected to the second adsorption tower 32 is connected to the condenser 4. The ninth valve 89 is provided with a ninth valve 891 that opens or closes the flow path in the ninth pipe 89. The ninth pipe 89 is provided with a tenth pipe 90 branched from the ninth pipe 89 on the downstream side in the flow direction of the ammonia of the ninth valve 891. The tenth pipe 90 is provided with a tenth valve 901 that opens or closes the flow path in the tenth pipe 90. Further, the end of the tenth pipe 90 opposite to the side connected to the ninth pipe 89 is connected to the top of the tower of the first adsorption tower 31.

藉由第2吸附塔32而雜質經吸附去除之氣體狀之氨於使第9閥891開放且使第10閥901封閉之狀態下,流經第9配管89而供給至冷凝器4。又,藉由第2吸附塔32而雜質經吸附去除之氣體狀之氨於使第9閥891開放且使第10閥901開放之狀態下,流經第9配管89及第10配管90而供給至第1吸附塔31。 The gaseous ammonia which is adsorbed and removed by the second adsorption tower 32 flows through the ninth pipe 89 and is supplied to the condenser 4 in a state where the ninth valve 891 is opened and the tenth valve 901 is closed. In addition, the gaseous ammonia which is adsorbed and removed by the second adsorption tower 32 is supplied to the ninth pipe 89 and the tenth pipe 90 in a state where the ninth valve 891 is opened and the tenth valve 901 is opened. To the first adsorption tower 31.

於以如上方式構成之吸附單元3中,可以4種模式變更第1吸附塔31與第2吸附塔32之連接。 In the adsorption unit 3 configured as described above, the connection between the first adsorption tower 31 and the second adsorption tower 32 can be changed in four modes.

第1連接模式係使第4閥841及第7閥871開放,使第5閥 851、第8閥881、第9閥891、及第10閥901封閉。於該第1連接模式中,自氣化器2導出並流量經流量調整器71調整之氣體狀之氨係流經第4配管84而供給至第1吸附塔31。繼而,自第1吸附塔31導出之純化後之氣體狀之氨係流經第6配管86及第7配管87而供給至冷凝器4。於此種第1連接模式中,僅利用第1吸附塔31對自氣化器2導出之氣體狀之氨進行純化。於利用第1吸附塔31進行吸附去除期間,可對使用完畢之第2吸附塔32進行再生處理,以使得可利用使用完畢之第2吸附塔32再次進行吸附去除動作。 In the first connection mode, the fourth valve 841 and the seventh valve 871 are opened, and the fifth valve is opened. 851, the eighth valve 881, the ninth valve 891, and the tenth valve 901 are closed. In the first connection mode, the gaseous ammonia which is led out from the gasifier 2 and whose flow rate is adjusted by the flow rate adjuster 71 flows through the fourth pipe 84 and is supplied to the first adsorption tower 31. Then, the purified gaseous ammonia derived from the first adsorption tower 31 flows through the sixth pipe 86 and the seventh pipe 87 and is supplied to the condenser 4. In the first connection mode, the gaseous ammonia derived from the gasifier 2 is purified only by the first adsorption tower 31. During the adsorption removal by the first adsorption tower 31, the second adsorption tower 32 that has been used can be regenerated so that the adsorption removal operation can be performed again by the used second adsorption tower 32.

第2連接模式係使第5閥851及第9閥891開放,使第4閥841、第7閥871、第8閥881、及第10閥901封閉。於該第2連接模式中,自氣化器2導出並流量經流量調整器71調整之氣體狀之氨係流經第5配管85而供給至第2吸附塔32。繼而,自第2吸附塔32導出之純化後之氣體狀之氨係流經第9配管89而供給至冷凝器4。於此種第2連接模式中,僅利用第2吸附塔32對自氣化器2導出之氣體狀之氨進行純化。於利用第2吸附塔32進行吸附去除期間,可對使用完畢之第1吸附塔31進行再生處理,以使得可利用使用完畢之第1吸附塔31再次進行吸附去除動作。 In the second connection mode, the fifth valve 851 and the ninth valve 891 are opened, and the fourth valve 841, the seventh valve 871, the eighth valve 881, and the tenth valve 901 are closed. In the second connection mode, the gaseous ammonia which is led out from the gasifier 2 and whose flow rate is adjusted by the flow rate adjuster 71 flows through the fifth pipe 85 and is supplied to the second adsorption tower 32. Then, the purified gaseous ammonia derived from the second adsorption tower 32 flows through the ninth piping 89 and is supplied to the condenser 4. In the second connection mode, the gaseous ammonia derived from the gasifier 2 is purified only by the second adsorption tower 32. During the adsorption removal by the second adsorption tower 32, the used first adsorption tower 31 can be regenerated so that the adsorption removal operation can be performed again by the used first adsorption tower 31.

第3連接模式係使第4閥841、第8閥881、及第9閥891開放,使第5閥851、第7閥871、及第10閥901封閉。於該第3連接模式中,自氣化器2導出並流量經流量調整器71調整之氣體狀之氨係流經第4配管84而供給至第1吸附塔31。自第1吸附塔31導出之純化後之氣體狀之氨係流經第6配管86 及第8配管88而供給至第2吸附塔3。繼而,自第2吸附塔32導出之純化後之氣體狀之氨係流經第9配管89而供給至冷凝器4。於此種第3連接模式中,係利用第1吸附塔31及第2吸附塔32對自氣化器2導出之氣體狀之氨進行純化。由於可利用串列連接之第1吸附塔31及第2吸附塔32對自氣化器2導出之氣體狀之氨中所含的雜質進行吸附去除,故而可提高對雜質之吸附去除能力。 In the third connection mode, the fourth valve 841, the eighth valve 881, and the ninth valve 891 are opened, and the fifth valve 851, the seventh valve 871, and the tenth valve 901 are closed. In the third connection mode, the gaseous ammonia derived from the vaporizer 2 and adjusted in flow rate by the flow rate adjuster 71 flows through the fourth pipe 84 and is supplied to the first adsorption tower 31. The purified gaseous ammonia derived from the first adsorption tower 31 flows through the sixth pipe 86 The eighth pipe 88 is supplied to the second adsorption tower 3 . Then, the purified gaseous ammonia derived from the second adsorption tower 32 flows through the ninth piping 89 and is supplied to the condenser 4. In the third connection mode, the gaseous ammonia derived from the vaporizer 2 is purified by the first adsorption tower 31 and the second adsorption tower 32. Since the impurities contained in the gaseous ammonia derived from the vaporizer 2 can be adsorbed and removed by the first adsorption tower 31 and the second adsorption tower 32 connected in series, the adsorption and removal ability to impurities can be improved.

第4連接模式係使第4閥841、第8閥881、第9閥891、及第10閥901開放,使第5閥851及第7閥871封閉。於該第4連接模式中,自氣化器2導出且流量經流量調整器71調整之氣體狀之氨係流經第4配管84而供給至第1吸附塔31。自第1吸附塔31導出之純化後之氣體狀之氨係流經第6配管86及第8配管88而供給至第2吸附塔32。自第2吸附塔32導出之純化後之氣體狀之氨係流經第9配管89及第10配管90而再次供給至第1吸附塔31,反覆由第1吸附塔31及第2吸附塔32進行吸附去除動作。繼而,於使開放之第10閥901封閉之時間點,自第2吸附塔32導出之氣體狀之氨流經第9配管89而供給至冷凝器4。於此種第4連接模式中,可利用第1吸附塔31及第2吸附塔32對自氣化器2導出之氣體狀之氨反覆進行純化。 In the fourth connection mode, the fourth valve 841, the eighth valve 881, the ninth valve 891, and the tenth valve 901 are opened, and the fifth valve 851 and the seventh valve 871 are closed. In the fourth connection mode, the gaseous ammonia which is led out from the gasifier 2 and whose flow rate is adjusted by the flow rate adjuster 71 flows through the fourth pipe 84 and is supplied to the first adsorption tower 31. The purified gaseous ammonia derived from the first adsorption tower 31 is supplied to the second adsorption tower 32 through the sixth pipe 86 and the eighth pipe 88. The purified gaseous ammonia derived from the second adsorption tower 32 flows through the ninth piping 89 and the tenth piping 90 and is again supplied to the first adsorption tower 31, and the first adsorption tower 31 and the second adsorption tower 32 are repeated. The adsorption removal operation is performed. Then, at the time when the open tenth valve 901 is closed, the gaseous ammonia derived from the second adsorption tower 32 flows through the ninth pipe 89 and is supplied to the condenser 4. In the fourth connection mode, the gaseous ammonia derived from the vaporizer 2 can be repeatedly purified by the first adsorption tower 31 and the second adsorption tower 32.

自第1吸附塔31或第2吸附塔32導出之氣體狀之氨係供給至冷凝器4。冷凝器4將自第1吸附塔31或第2吸附塔32導出之氣體狀之氨分凝而分離為氣相成分與液相成分,藉此將氨中所含之氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化 碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。 The gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 is supplied to the condenser 4. The condenser 4 separates the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 into a gas phase component and a liquid phase component, thereby hydrogen, nitrogen, oxygen, and argon contained in the ammonia. Gas, carbon monoxide, dioxide The highly volatile impurities such as carbon are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained as a liquid phase component.

作為冷凝器4,可列舉多管式冷凝器、板式熱交換器等,本實施形態中係使用多管式冷凝器作為冷凝器4。冷凝器4係將自第1吸附塔31或第2吸附塔32導出之氣體狀之氨的70~99體積%凝結而分離為氣相成分與液相成分。此時,即以使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨之一部分即1~30體積%成為氣相成分之方式凝結而分離為氣相成分與液相成分。藉此,可將吸附去除後之氣體狀之氨中所含的揮發性較高之雜質以氣相成分之形式分離去除,且以液相成分之形式產率良好地獲得經純化之液體狀之氨。 Examples of the condenser 4 include a multitubular condenser and a plate heat exchanger. In the present embodiment, a multitubular condenser is used as the condenser 4. The condenser 4 condenses 70 to 99% by volume of the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32, and separates it into a gas phase component and a liquid phase component. In this case, the gas phase component and the liquid phase component are separated by being condensed so that one part to 30% by volume of the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 is a gas phase component. Thereby, the highly volatile impurities contained in the gaseous ammonia after the adsorption removal can be separated and removed in the form of a gas phase component, and the purified liquid form can be obtained in a good yield in the form of a liquid phase component. ammonia.

又,作為冷凝器4中之凝結條件,只要為可使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨之一部分成為液體之條件,則並無特別限定,只要適當設定溫度、壓力及時間即可。於本實施形態中,冷凝器4較佳為構成為使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨於-77~40℃之溫度下凝結而分離為氣相成分與液相成分。藉此,可使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨效率良好地凝結而獲得經純化之液體狀之氨,並且可提高該液體狀之氨之純度。於冷凝器4中之對氣體狀之氨進行凝結時之溫度未達-77℃之情形時,冷卻需要較多能量,故而欠佳,於超過40℃之情形時,氨之一部分凝結而獲得之液體狀之氨中所含之雜質濃度變高,故而欠佳。 In addition, the condensation condition in the condenser 4 is not particularly limited as long as it is a condition that a part of the gaseous ammonia which can be derived from the first adsorption tower 31 or the second adsorption tower 32 is liquid, and the temperature is appropriately set. , pressure and time can be. In the present embodiment, the condenser 4 is preferably configured such that the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 is condensed at a temperature of -77 to 40 ° C to be separated into a gas phase component and Liquid phase composition. Thereby, the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 can be efficiently condensed to obtain purified liquid ammonia, and the purity of the liquid ammonia can be improved. When the temperature at which the gaseous ammonia in the condenser 4 is condensed is less than -77 ° C, cooling requires more energy, which is not preferable. When the temperature exceeds 40 ° C, a part of ammonia is condensed to obtain The concentration of impurities contained in the liquid ammonia is high, which is not preferable.

又,冷凝器4較佳為構成為使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨於0.007~2.0 MPa之壓力下凝結而分離為氣相成分與液相成分。於冷凝器4中之對氣體狀之氨進行凝結時之壓力未達0.007 MPa之情形時,可使氨凝結之溫度變低,因此冷卻需要較多能量,故而欠佳,於超過2.0 MPa之情形時,可使氨凝結之溫度變高,因此氨之一部分凝結而獲得之液體狀之氨中所含之雜質濃度變高,故而欠佳。 Further, the condenser 4 is preferably configured such that the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 is condensed under a pressure of 0.007 to 2.0 MPa to be separated into a gas phase component and a liquid phase component. When the pressure at the time of coagulation of the gaseous ammonia in the condenser 4 is less than 0.007 MPa, the temperature at which the ammonia is condensed becomes low, so that cooling requires more energy, and thus is not preferable, in the case of exceeding 2.0 MPa. At this time, since the temperature at which the ammonia is condensed becomes high, the concentration of impurities contained in the liquid ammonia obtained by partially coagulation of ammonia becomes high, which is not preferable.

於本實施形態之氨純化系統100中,冷凝器4使自第1吸附塔31或第2吸附塔32導出之氣體狀之氨之一部分凝結而分離為氣相成分與液相成分,因此可將揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,即便不如先前技術般設置蒸餾部,亦可利用簡化之系統將氨純化。 In the ammonia purification system 100 of the present embodiment, the condenser 4 partially condenses a part of the gaseous ammonia derived from the first adsorption tower 31 or the second adsorption tower 32, and separates it into a gas phase component and a liquid phase component. The highly volatile impurities are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained as a liquid phase component. Therefore, even if the distillation section is not provided as in the prior art, the ammonia can be purified by a simplified system.

於藉由精密蒸餾將粗氨中所含之雜質分離去除之情形時,由於係伴隨回流而進行之蒸餾,故而反覆進行如下操作:利用蒸餾塔使液體狀之氨加熱蒸發而成為氣體狀之氨,另一方面,利用蒸餾塔之塔頂部之冷凝器使來自精餾塔之氣體狀之氨凝結而成為液體狀之氨。因此,於精餾操作中將較大能量投入至該操作中。 When the impurities contained in the crude ammonia are separated and removed by precision distillation, since the distillation is carried out by reflux, the operation is repeated as follows: the liquid ammonia is heated and evaporated by the distillation column to become a gaseous ammonia. On the other hand, the gaseous ammonia from the rectification column is condensed by the condenser at the top of the column of the distillation column to form a liquid ammonia. Therefore, a large amount of energy is put into the operation in the rectification operation.

相對於此,於藉由冷凝器4之分凝將氨中所含之雜質分離去除之情形時,由於僅使氣體狀之氨凝結1次,故而其所需之能量較少。如此,可知與利用精餾之氨之純化方法相比,利用冷凝器4之分凝之純化方法不僅可於短時間內 獲得高純度之氨,而且於能量方面上亦具有很大優點。 On the other hand, when the impurities contained in the ammonia are separated and removed by the condensation of the condenser 4, since only the gaseous ammonia is condensed once, the energy required is small. Thus, it can be seen that the purification method using the condensation of the condenser 4 can be performed not only in a short time but also in the purification method using the ammonia of the rectification. High purity ammonia is obtained, and it also has great advantages in terms of energy.

為獲得高純度氨,必需以使藉由冷凝器4之分凝而以液相成分之形式獲得的液體狀之氨快速地自冷凝器4導出,於冷凝器4之內部僅存在未凝結之氣相成分的方式使冷凝器4運轉。 In order to obtain high-purity ammonia, it is necessary to rapidly extract the liquid ammonia obtained in the form of a liquid phase component by the condensation of the condenser 4 from the condenser 4, and only the uncondensed gas exists inside the condenser 4. The phase composition is such that the condenser 4 is operated.

冷凝器4上連接有設置有第11閥911之第11配管91、及設置有第12閥921之第12配管92。再者,第11配管91係連接於冷凝器4與回收槽5之間。 The eleventh pipe 91 provided with the eleventh valve 911 and the twelfth pipe 92 provided with the twelfth valve 921 are connected to the condenser 4. Further, the eleventh pipe 91 is connected between the condenser 4 and the recovery tank 5.

於冷凝器4中以氣相成分之形式自氨中分離去除之揮發性較高之雜質係於使第12閥921開放之狀態下,通過第12配管92而排出至系統外。又,於冷凝器4中以液相成分之形式獲得之液體狀之氨係於使第11閥911開放之狀態下,通過第11配管91而供給至回收槽5。 The highly volatile impurities which are separated from the ammonia in the form of a gas phase component in the condenser 4 are discharged to the outside of the system through the 12th pipe 92 while the 12th valve 921 is opened. In addition, the liquid ammonia obtained as a liquid phase component in the condenser 4 is supplied to the recovery tank 5 through the eleventh pipe 91 while the eleventh valve 911 is opened.

回收槽5貯存利用冷凝器4以液相成分之形式獲得之液體狀之氨。回收槽5上連接有將回收槽5與外部連通,成為用以將氣相成分排出至外部之流路的第13配管93。該第13配管93上設置有使第13配管93中之流路開放或封閉之第13閥931。本實施形態之氨純化系統100係構成為藉由在使第11閥911封閉之狀態下使第13閥931開放,而可實施自貯存於回收槽5內之液體狀之氨中將揮發性較高之雜質排出去除之排出動作。藉由實施該回收槽5中之排出動作,可進一步提高貯存於回收槽5中之液體狀之氨之純度。 The recovery tank 5 stores the liquid ammonia obtained by the condenser 4 in the form of a liquid phase component. The collection tank 5 is connected to a thirteenth pipe 93 that communicates the recovery tank 5 with the outside to form a flow path for discharging the gas phase component to the outside. The thirteenth pipe 931 is provided with a thirteenth valve 931 that opens or closes the flow path in the thirteenth pipe 93. In the ammonia purification system 100 of the present embodiment, the third valve 931 is opened while the eleventh valve 911 is closed, and the volatility can be realized from the liquid ammonia stored in the recovery tank 5. The discharge of high impurities is removed and removed. By performing the discharge operation in the recovery tank 5, the purity of the liquid ammonia stored in the recovery tank 5 can be further improved.

又,回收槽5係於一定條件下控制溫度及壓力,以可將氨以液體狀態貯存。回收槽5及冷凝器4上經由第14配管94 而連接有冷卻液送液裝置72。第14配管94中流通有自冷卻液送液裝置72中送出之冷卻液,藉由該冷卻液之冷卻能力而使回收槽5及冷凝器4維持於特定之溫度。 Further, the recovery tank 5 controls the temperature and pressure under certain conditions to store ammonia in a liquid state. The recovery tank 5 and the condenser 4 are passed through the 14th piping 94. A coolant liquid supply device 72 is connected. The coolant sent from the coolant liquid supply device 72 flows through the fourth pipe 94, and the recovery tank 5 and the condenser 4 are maintained at a specific temperature by the cooling capacity of the coolant.

回收槽5上經由設置有第15閥951之第15配管95而連接有填充裝置6。貯存於回收槽5中之液體狀之氨藉由使第15閥951開放而流經第15配管95供給至填充裝置6。如此般供給至填充裝置6之氨藉由填充裝置6而填充至製品填充容器等中。 The charging device 6 is connected to the recovery tank 5 via a 15th pipe 95 provided with a 15th valve 951. The liquid ammonia stored in the recovery tank 5 is supplied to the filling device 6 through the 15th pipe 95 by opening the 15th valve 951. The ammonia supplied to the filling device 6 in this manner is filled into the product filling container or the like by the filling device 6.

於以如上方式構成的本實施形態之氨純化系統100中,係藉由積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層的第1吸附塔31及第2吸附塔32對粗氨中所含之雜質進行吸附去除,因此可效率良好地將粗氨中所含之雜質(主要是水及有機化合物)吸附去除。並且,冷凝器4將自第1吸附塔31或第2吸附塔32導出之氨分凝而分離為氣相成分與液相成分,因此可將氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,於本實施形態之氨純化系統100中,無需如先前技術般進行伴隨回流之蒸餾,而可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化。 In the ammonia purification system 100 of the present embodiment configured as described above, the adsorbent layer having different adsorption capacities for water, an organic compound having a carbon number of less than 5, and an organic compound having a carbon number of 5 or more is laminated. Since the first adsorption tower 31 and the second adsorption tower 32 adsorb and remove impurities contained in the crude ammonia, impurities (mainly water and organic compounds) contained in the crude ammonia can be efficiently removed by adsorption. Further, the condenser 4 separates the ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 into a gas phase component and a liquid phase component, so that hydrogen, nitrogen, oxygen, argon, carbon monoxide, carbon dioxide, or the like can be used. The highly volatile impurities are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained as a liquid phase component. Therefore, in the ammonia purification system 100 of the present embodiment, it is not necessary to carry out distillation with reflux as in the prior art, and the ammonia can be purified by a simplified method, and ammonia can be efficiently purified by suppressing energy consumption.

又,吸附單元3之第1吸附塔31及第2吸附塔32中,自粗氨之流動方向上游側向下游側,依序積層有含有第1吸附劑之塔頂吸附層311、321,含有第2吸附劑之第1中間吸附 層312、322,含有第2吸附劑之第2中間吸附層313、323,及含有第3吸附劑之塔底吸附層314、324。由於塔頂吸附層311、321中含有對水具有較高之吸附能力之第1吸附劑,故而流經第1吸附塔31及第2吸附塔32之粗氨首先於塔頂吸附層311、321中將水之大部分吸附去除。藉此,相對於塔頂吸附層311、321配置於氨之流動方向下游側之第1中間吸附層312、322,第2中間吸附層313、323,及塔底吸附層314、324對有機化合物之吸附能力可得到充分發揮,可提高第1吸附塔31及第2吸附塔32自粗氨對雜質之吸附去除性。 Further, in the first adsorption tower 31 and the second adsorption tower 32 of the adsorption unit 3, the column top adsorption layers 311 and 321 containing the first adsorbent are sequentially stacked from the upstream side to the downstream side in the flow direction of the crude ammonia. The first intermediate adsorption of the second adsorbent The layers 312 and 322 include the second intermediate adsorption layers 313 and 323 of the second adsorbent and the bottom adsorption layers 314 and 324 containing the third adsorbent. Since the top adsorption layers 311 and 321 contain the first adsorbent having a high adsorption capacity for water, the crude ammonia flowing through the first adsorption tower 31 and the second adsorption tower 32 is first applied to the adsorption adsorption layers 311 and 321 at the top. Most of the water in the middle of the adsorption is removed. Thereby, the first intermediate adsorption layers 312 and 322 disposed on the downstream side in the flow direction of ammonia with respect to the column top adsorption layers 311 and 321 , the second intermediate adsorption layers 313 and 323 , and the bottom adsorption layers 314 and 324 are organic compounds. The adsorption capacity can be sufficiently exerted, and the adsorption removal property of the first adsorption tower 31 and the second adsorption tower 32 from impurities by the crude ammonia can be improved.

於本實施形態中,如上所述,第1吸附塔31及第2吸附塔32具有積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層之積層構造。作為與如此構成之第1吸附塔31及第2吸附塔32相同的發揮對氨中所含之雜質之吸附去除能力的吸附塔之構成,可考慮具有含有第1吸附劑之塔頂吸附層、及較該塔頂吸附層配置於粗氨之流動方向下游側的混合有第2吸附劑及第3吸附劑之混合層的吸附塔。 In the present embodiment, as described above, the first adsorption tower 31 and the second adsorption tower 32 have an adsorption property in which an organic compound having water, a carbon number of less than 5, and an organic compound having a carbon number of 5 or more are laminated. The layered structure of the agent layer. The adsorption tower having the same adsorption and removal ability as the first adsorption tower 31 and the second adsorption tower 32, which exhibits adsorption and removal of impurities contained in ammonia, can be considered to have an adsorption adsorption layer containing a first adsorbent. And an adsorption tower in which the top adsorption layer is disposed on the downstream side of the flow direction of the crude ammonia, and the mixed layer of the second adsorbent and the third adsorbent is mixed.

於此種具有塔頂吸附層及混合層之吸附塔中,構成混合層之第2吸附劑及第3吸附劑只要為以均勻分散之狀態填充於層內,則無需將各吸附劑積層填充。 In such an adsorption tower having an adsorption layer and a mixed layer, the second adsorbent and the third adsorbent constituting the mixed layer are filled in the layer in a state of being uniformly dispersed, so that it is not necessary to fill each adsorbent layer.

又,作為與第1吸附塔31及第2吸附塔32相同的發揮對氨中所含之雜質之吸附去除能力之構成,亦可考慮將分別單獨填充有第1吸附劑、第2吸附劑、及第3吸附劑之複數個 吸附塔串列連接之構成。該方法亦對雜質之吸附去除性完全無影響。於使複數個吸附塔串列連接之構成中,若使該複數個吸附塔於水平方向上串列排列,則會產生設置面積變大之問題,但若於鉛垂方向上串列排列,則不會產生設置面積變大之問題。於使複數個吸附塔串列連接時,只要考慮吸附塔之大小、塔數之增加、連接配管之長度等之設備費用而選擇吸附塔之構成方式即可。 In addition, as for the adsorption and removal ability of the impurities contained in ammonia, which are the same as those of the first adsorption tower 31 and the second adsorption tower 32, it is also possible to separately fill the first adsorbent and the second adsorbent separately. And a plurality of third adsorbents The structure of the adsorption tower series connection. This method also has no effect on the adsorption and removal of impurities. In the configuration in which a plurality of adsorption towers are connected in series, if the plurality of adsorption towers are arranged in series in the horizontal direction, there is a problem that the installation area becomes large. However, if they are arranged in series in the vertical direction, There is no problem that the setting area becomes large. When a plurality of adsorption towers are connected in series, the configuration of the adsorption tower may be selected in consideration of the equipment cost such as the size of the adsorption tower, the increase in the number of towers, and the length of the connection piping.

圖2係表示本發明之第2實施形態之氨純化系統150之構成的圖。本實施形態之氨純化系統150與上述之氨純化系統100類似,對相對應之部分標附相同參照符號且省略說明。氨純化系統150中,吸附單元151之構成與上述之吸附單元3之構成不同,除此以外均與氨純化系統100相同。 Fig. 2 is a view showing the configuration of an ammonia purification system 150 according to a second embodiment of the present invention. The ammonia purification system 150 of the present embodiment is similar to the above-described ammonia purification system 100, and the same reference numerals will be given to the corresponding parts, and the description will be omitted. In the ammonia purification system 150, the configuration of the adsorption unit 151 is different from that of the above-described adsorption unit 3, and is the same as the ammonia purification system 100.

吸附單元151係將自氣化器2導出之氣體狀之氨中所含的雜質吸附去除而純化。於本實施形態中,吸附單元151係包含第1吸附塔1511、第2吸附塔1512、及第3吸附塔1513而構成。 The adsorption unit 151 purifies and removes impurities contained in the gaseous ammonia derived from the gasifier 2 by adsorption. In the present embodiment, the adsorption unit 151 includes the first adsorption tower 1511, the second adsorption tower 1512, and the third adsorption tower 1513.

第1吸附塔1511、第2吸附塔1512及第3吸附塔1513係以與上述之第1吸附塔31相同之方式構成。具體而言,第1吸附塔1511具有自塔頂部向塔底部(自氨之流動方向上游側向下游側)依序積層有塔頂吸附層15111、第1中間吸附層15112、第2中間吸附層15113、及塔底吸附層15114之積層構造。 The first adsorption tower 1511, the second adsorption tower 1512, and the third adsorption tower 1513 are configured in the same manner as the first adsorption tower 31 described above. Specifically, the first adsorption tower 1511 has an overhead adsorption layer 15111, a first intermediate adsorption layer 15112, and a second intermediate adsorption layer sequentially stacked from the top of the column to the bottom of the column (upstream from the upstream side to the downstream side in the flow direction of ammonia). 15113, and a laminated structure of the bottom adsorption layer 15114.

塔頂吸附層15111係含有第1吸附劑之層,具有作為第1吸附劑層之功能。第1吸附劑為對水具有較高之吸附能力 的多孔質吸附劑。作為此種第1吸附劑,例如可列舉活性碳等。 The column top adsorption layer 15111 is a layer containing a first adsorbent and has a function as a first adsorbent layer. The first adsorbent has a high adsorption capacity for water Porous adsorbent. Examples of such a first adsorbent include activated carbon and the like.

第1中間吸附層15112係含有第2吸附劑之層,具有作為第2吸附劑層之功能。第2吸附劑為對碳數未達5之有機化合物(烴、醇、醚等)具有較高之吸附能力的多孔質吸附劑。作為此種第2吸附劑,例如可列舉:MS-3A(孔徑3 Å之多孔質合成沸石)、MS-4A(孔徑4 Å之多孔質合成沸石)、MS-5A(孔徑5 Å之多孔質合成沸石)、MS-13X(孔徑9 Å之多孔質合成沸石)等親水性沸石,高矽型(二氧化矽/氧化鋁比較高之)沸石等疏水性沸石,矽膠等。又,第2中間吸附層15113與第1中間吸附層15112同樣地為含有第2吸附劑之層,具有作為第2吸附劑層之功能。但是,雖然第1中間吸附層15112與第2中間吸附層15113同為含有第2吸附劑之層,但係使用種類互不相同之吸附劑。 The first intermediate adsorption layer 15112 is a layer containing a second adsorbent and has a function as a second adsorbent layer. The second adsorbent is a porous adsorbent having a high adsorption capacity for an organic compound (hydrocarbon, alcohol, ether, etc.) having a carbon number of less than 5. Examples of such a second adsorbent include MS-3A (porous synthetic zeolite having a pore diameter of 3 Å), MS-4A (porous synthetic zeolite having a pore size of 4 Å), and MS-5A (porous having a pore diameter of 5 Å). Hydrophobic zeolite such as synthetic zeolite), MS-13X (porous synthetic zeolite having a pore size of 9 Å), hydrophobic zeolite such as sorghum-type (cerium dioxide/aluminum oxide) zeolite, silicone or the like. In addition, the second intermediate adsorption layer 15113 is a layer containing the second adsorbent similarly to the first intermediate adsorption layer 15112, and has a function as a second adsorbent layer. However, although the first intermediate adsorption layer 15112 and the second intermediate adsorption layer 15113 are the same layer containing the second adsorbent, the adsorbents having different types are used.

塔底吸附層15114係含有第3吸附劑之層,具有作為第3吸附劑層之功能。第3吸附劑為對碳數5以上之有機化合物(烴等)及水具有較高之吸附能力的多孔質吸附劑。作為此種第3吸附劑,可列舉:活性碳、MS-13X等。 The bottom adsorption layer 15114 is a layer containing a third adsorbent and has a function as a third adsorbent layer. The third adsorbent is a porous adsorbent having a high adsorption capacity for an organic compound (hydrocarbon or the like) having a carbon number of 5 or more and water. Examples of such a third adsorbent include activated carbon and MS-13X.

第2吸附塔1512具有自塔頂部向塔底部(自氨之流動方向上游側向下游側)依序積層有塔頂吸附層15121、第1中間吸附層15122、第2中間吸附層15123、及塔底吸附層15124之積層構造。 The second adsorption tower 1512 has an overhead adsorption layer 15121, a first intermediate adsorption layer 15122, a second intermediate adsorption layer 15123, and a column sequentially stacked from the top of the column to the bottom of the column (upstream from the upstream side to the downstream side in the flow direction of ammonia). The laminated structure of the bottom adsorption layer 15124.

塔頂吸附層15121係以與上述之第1吸附塔31之塔頂吸附層311相同之方式構成的含有第1吸附劑之層,具有作為第 1吸附劑層之功能。第1中間吸附層15122係以與上述之第1吸附塔31之第1中間吸附層312相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。第2中間吸附層15123係以與上述之第1吸附塔31之第2中間吸附層313相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。塔底吸附層15124係以與上述之第1吸附塔31之塔底吸附層314相同之方式構成的含有第3吸附劑之層,具有作為第3吸附劑層之功能。 The column top adsorption layer 15121 is a layer containing the first adsorbent, which is configured in the same manner as the column top adsorption layer 311 of the first adsorption column 31 described above, and has 1 function of the adsorbent layer. The first intermediate adsorption layer 15122 is a layer containing the second adsorbent and configured to be the same as the first intermediate adsorption layer 312 of the first adsorption tower 31 described above, and has a function as a second adsorbent layer. The second intermediate adsorption layer 15123 is a layer containing the second adsorbent, which is configured in the same manner as the second intermediate adsorption layer 313 of the first adsorption tower 31 described above, and has a function as a second adsorbent layer. The bottom adsorption layer 15124 is a layer containing a third adsorbent which is configured in the same manner as the bottom adsorption layer 314 of the first adsorption tower 31 described above, and has a function as a third adsorbent layer.

於本實施形態中,自氣化器2導出之氣體狀之氨流通之第3配管83上連接有自第3配管83分支之第15A配管152、第15B配管153及第15C配管154。 In the present embodiment, the 15A pipe 152, the 15B pipe 153, and the 15C pipe 154 branched from the third pipe 83 are connected to the third pipe 83 through which the gaseous ammonia derived from the gasifier 2 flows.

第15A配管152係自第3配管83分支並連接於第1吸附塔1511之塔頂部。該第15A配管152上設置有使第15A配管152中之流路開放或封閉之第15A閥1521。第15B配管153係自第3配管83分支並連接於第2吸附塔1512之塔頂部。該第15B配管153上設置有使第15B配管153中之流路開放或封閉之第15B閥1531。第15C配管154係自第3配管83分支並連接於第3吸附塔1513之塔頂部。該第15C配管154上連接有使第15C配管154中之流路開放或封閉之第15C閥1541。 The 15A pipe 152 is branched from the third pipe 83 and connected to the top of the tower of the first adsorption tower 1511. The 15A valve 15a is provided with a 15A valve 1521 that opens or closes the flow path in the 15A pipe 152. The 15B pipe 153 is branched from the third pipe 83 and connected to the top of the tower of the second adsorption tower 1512. The 15B valve 1531 is provided with a 15B valve 1531 that opens or closes the flow path in the 15B pipe 153. The 15C pipe 154 is branched from the third pipe 83 and connected to the top of the third adsorption tower 1513. A 15C valve 1541 that opens or closes the flow path in the 15Cth pipe 154 is connected to the 15C pipe 154.

又,第1吸附塔1511之塔底部連接有使自第1吸附塔1511導出之氣體狀之氨流通之第15D配管155。該第15D配管155上設置有使第15D配管155中之流路開放或封閉之第15D閥1551。第2吸附塔1512之塔底部連接有使自第2吸附 塔1512導出之氣體狀之氨流通之第15E配管156。該第15E配管156上設置有使第15E配管156中之流路開放或封閉之第15E閥1561。第3吸附塔1513之塔底部連接有使自第3吸附塔1513導出之氣體狀之氨流通之第15F配管157。該第15F配管157上設置有使第15F配管157中之流路開放或封閉之第15F閥1571。 Further, a 15D pipe 155 through which the gaseous ammonia derived from the first adsorption tower 1511 flows is connected to the bottom of the first adsorption tower 1511. The 15D valve 155 is provided with a 15D valve 1551 that opens or closes the flow path in the 15D pipe 155. The second adsorption tower 1512 is connected to the bottom of the tower to make the second adsorption The 15E pipe 156 through which the gaseous ammonia derived from the column 1512 flows. The 15E valve 156 is provided with a 15E valve 1561 that opens or closes the flow path in the 15E pipe 156. A 15F pipe 157 through which the gaseous ammonia derived from the third adsorption column 1513 flows is connected to the bottom of the third adsorption column 1513. The 15Fth pipe 157 is provided with a 15F valve 1571 that opens or closes the flow path in the 15Fth pipe 157.

又,第15D配管155上連接有自第15D配管155分支之第15G配管158。該第15G配管158係自第15D配管155分支並連接於第15B配管153,成為用以將自第1吸附塔1511導出之氣體狀之氨導入至第2吸附塔1512之流路。第15G配管158上設置有使第15G配管158中之流路開放或封閉之第15G閥1581。該第15G配管158上連接有自第15G配管158分支之第15H配管159。該第25H配管159係自第15G配管158分支並連接於第15C配管154,成為用以將自第1吸附塔1511導出之氣體狀之氨導入至第3吸附塔1513之流路。第15H配管159上設置有使第15H配管159中之流路開放或封閉之第15H閥1591。 Further, a 15G pipe 158 branched from the 15D pipe 155 is connected to the 15D pipe 155. The 15G branch pipe 158 is branched from the 15D pipe 155 and connected to the 15B pipe 153, and is a flow path for introducing the gaseous ammonia derived from the first adsorption tower 1511 into the second adsorption tower 1512. The 15G valve 1581 is provided with a 15G valve 1581 that opens or closes the flow path in the 15Gth pipe 158. A 15H pipe 159 branched from the 15G pipe 158 is connected to the 15G pipe 158. The 25H pipe 159 is branched from the 15G pipe 158 and connected to the 15C pipe 154, and is a flow path for introducing the gaseous ammonia derived from the first adsorption tower 1511 into the third adsorption tower 1513. The 15Hth pipe 159 is provided with a 15H valve 1591 that opens or closes the flow path in the 15Hth pipe 159.

又,第15E配管156上連接有自第15E配管156分支之第15I配管160及第15J配管161。第15I配管160係自第15E配管156分支並連接於第15A配管152,成為用以將自第2吸附塔1512導出之氣體狀之氨導入至第1吸附塔1511之流路。第15I配管160上設置有使第15I配管160中之流路開放或封閉之第15I閥1601。第15J配管161係自第15E配管156分支並連接於第15C配管154,成為用以將自第2吸附塔1512導出 之氣體狀之氨導入至第3吸附塔1513之流路。第15J配管161上設置有使第15J配管161中之流路開放或封閉之第15J閥1611。 Further, the 15th pipe 160 and the 15th pipe 161 branched from the 15E pipe 156 are connected to the 15E pipe 156. The 15I pipe 160 is branched from the 15E pipe 156 and connected to the 15A pipe 152, and is a flow path for introducing the gaseous ammonia derived from the second adsorption tower 1512 into the first adsorption tower 1511. The 15Ith pipe 1601 is provided with a 15I valve 1601 that opens or closes the flow path in the 15I pipe 160. The 15th pipe 161 is branched from the 15E pipe 156 and connected to the 15C pipe 154 to be used to be discharged from the second adsorption tower 1512. The gaseous ammonia is introduced into the flow path of the third adsorption column 1513. The 15Jth pipe 1611 is provided with a 15Jth valve 1611 that opens or closes the flow path in the 15Jth pipe 161.

又,第15F配管157上連接有自第15F配管157分支之第15K配管162。該第15K配管162係自第15F配管157分支並連接於第15A配管152,成為用以將自第3吸附塔1513導出之氣體狀之氨導入至第1吸附塔1511之流路。第15K配管162上設置有使第15K配管162中之流路開放或封閉之第15K閥1621。該第15K配管162上連接有自第15K配管162分支之第15L配管163。該第15L配管163係自第15K配管162分支並連接於第15B配管153,成為用以將自第3吸附塔1513導出之氣體狀之氨導入至第2吸附塔1512之流路。第15L配管163上設置有使第15L配管163中之流路開放或封閉之第15L閥1631。 Further, a 15Kth pipe 162 branched from the 15F pipe 157 is connected to the 15F pipe 157. The 15Kth pipe 162 is branched from the 15F pipe 157 and connected to the 15A pipe 152, and is a flow path for introducing the gaseous ammonia derived from the third adsorption tower 1513 into the first adsorption tower 1511. The 15Kth pipe 162 is provided with a 15K valve 1621 that opens or closes the flow path in the 15Kth pipe 162. A 15L pipe 163 branched from the 15K pipe 162 is connected to the 15Kth pipe 162. The 15L L pipe 163 is branched from the 15K pipe 162 and connected to the 15B pipe 153, and is a flow path for introducing the gaseous ammonia derived from the third adsorption tower 1513 into the second adsorption tower 1512. The 15th L1 pipe 1631 is provided with a 15L valve 1631 that opens or closes the flow path in the 15L L pipe 163.

又,第15D配管155、第15E配管156及第15F配管157上,於氣體狀之氨之流動方向下游側端部連接有第15M配管164。該第15M配管164中供給有自第1吸附塔1511、第2吸附塔1512及第3吸附塔1513中之任一吸附塔導出的氣體狀之氨。並且,第15M配管164上設置有自第15M配管164分支並連接於冷凝器4之第15N配管165。 In the 15D pipe 155, the 15E pipe 156, and the 15F pipe 157, the 15th M pipe 164 is connected to the downstream end portion in the flow direction of the gaseous ammonia. The 15M pipe 164 is supplied with gaseous ammonia derived from any one of the first adsorption tower 1511, the second adsorption tower 1512, and the third adsorption tower 1513. Further, the 15th M pipe 164 is provided with a 15Nth pipe 165 branched from the 15M pipe 164 and connected to the condenser 4.

於以如上方式構成之氨純化系統150中,關於第1吸附塔1511、第2吸附塔1512及第3吸附塔1513之連接,有以下6種連接模式。 In the ammonia purification system 150 configured as described above, the connection of the first adsorption column 1511, the second adsorption column 1512, and the third adsorption column 1513 has the following six connection modes.

第1連接模式係使自氣化器2導出之氣體狀之氨依序通過 第1吸附塔1511、第2吸附塔1512之連接模式。於第1連接模式中,使第15A閥1521、第15E閥1561及第15G閥1581開放,使第15B閥1531、第15C閥1541、第15D閥1551、第15F閥1571、第15H閥1591、第15I閥1601、第15J閥1611、第15K閥1621及第15L閥1631封閉。 The first connection mode is such that the gaseous ammonia derived from the gasifier 2 is sequentially passed. The connection mode of the first adsorption tower 1511 and the second adsorption tower 1512. In the first connection mode, the 15A valve 1521, the 15E valve 1561, and the 15G valve 1581 are opened, and the 15B valve 1531, the 15C valve 1541, the 15D valve 1551, the 15F valve 1571, and the 15H valve 1591 are opened. The 15th valve 1601, the 15Jth valve 1611, the 15Kth valve 1621, and the 15Lth valve 1631 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15A配管152而導入至第1吸附塔1511,自第1吸附塔1511導出之氣體狀之氨流經第15D配管155及第15G配管158而導入至第2吸附塔1512,自第2吸附塔1512導出之氣體狀之氨流經第15E配管156而供給至第15M配管164,並自該第15M配管164將氣體狀之氨導入至冷凝器4。 In this way, the gaseous ammonia derived from the gasifier 2 is introduced into the first adsorption column 1511 via the 15A pipe 152, and the gaseous ammonia derived from the first adsorption column 1511 flows through the 15D pipe 155 and the 15G. The piping 158 is introduced into the second adsorption tower 1512, and the gaseous ammonia derived from the second adsorption tower 1512 flows through the 15E pipe 156 and is supplied to the 15M pipe 164, and the gaseous ammonia is introduced from the 15M pipe 164. To condenser 4.

於此種第1連接模式中,可利用第1吸附塔1511及第2吸附塔1512將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第1連接模式中,由於不實施第3吸附塔1513之吸附去除動作,故而可對該第3吸附塔1513進行再生處理。 In the first connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the first adsorption tower 1511 and the second adsorption tower 1512, so that the adsorption and removal ability to impurities can be improved. Further, in the first connection mode, since the adsorption removal operation of the third adsorption column 1513 is not performed, the third adsorption column 1513 can be regenerated.

第2連接模式係使自氣化器2導出之氣體狀之氨依序通過第1吸附塔1511、第3吸附塔1513之連接模式。於第2連接模式中,使第15A閥1521、第15F閥1571及第15H閥1591開放,使第15B閥1531、第15C閥1541、第15D閥1551、第15E閥1561、第15G閥1581、第15I閥1601、第15J閥1611、第15K閥1621及第15L閥1631封閉。 In the second connection mode, the gaseous ammonia derived from the gasifier 2 is sequentially passed through the connection mode of the first adsorption column 1511 and the third adsorption column 1513. In the second connection mode, the 15A valve 1521, the 15F valve 1571, and the 15H valve 1591 are opened, and the 15B valve 1531, the 15C valve 1541, the 15D valve 1551, the 15E valve 1561, and the 15G valve 1581 are opened. The 15th valve 1601, the 15Jth valve 1611, the 15Kth valve 1621, and the 15Lth valve 1631 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15A配管152而導入至第1吸附塔1511,自第1吸附塔1511導出之氣體狀 之氨流經第15D配管155、第15G配管158及第15H配管159而導入至第3吸附塔1513,自第3吸附塔1513導出之氣體狀之氨流經第15F配管157而供給至第15M配管164,並自該第15M配管164將氣體狀之氨導入至冷凝器4。 By this, the gaseous ammonia derived from the gasifier 2 is introduced into the first adsorption tower 1511 through the 15A pipe 152, and the gas is discharged from the first adsorption tower 1511. The ammonia flows through the 15D pipe 155, the 15G pipe 158, and the 15H pipe 159, and is introduced into the third adsorption column 1513. The gaseous ammonia derived from the third adsorption column 1513 flows through the 15F pipe 157 and is supplied to the 15M. The pipe 164 introduces gaseous ammonia into the condenser 4 from the 15M pipe 164.

於此種第2連接模式中,可利用第1吸附塔1511及第3吸附塔1513將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第2連接模式中,由於不實施第2吸附塔1512之吸附去除動作,故而可對該第2吸附塔1512進行再生處理。 In the second connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the first adsorption column 1511 and the third adsorption column 1513, so that the adsorption and removal ability to impurities can be improved. Further, in the second connection mode, since the adsorption removal operation of the second adsorption tower 1512 is not performed, the second adsorption tower 1512 can be regenerated.

第3連接模式係使自氣化器2導出之氣體狀之氨依序通過第2吸附塔1512、第1吸附塔1511之連接模式。於第3連接模式中,使第15B閥1531、第15D閥1551及第15I閥1601開放,使第15A閥1521、第15C閥1541、第15E閥1561、第15F閥1571、第15G閥1581、第15H閥1591、第15J閥1611、第15K閥1621及第15L閥1631封閉。 In the third connection mode, the gaseous ammonia derived from the gasifier 2 is sequentially passed through the connection mode of the second adsorption column 1512 and the first adsorption column 1511. In the third connection mode, the 15B valve 1531, the 15D valve 1551, and the 15th valve 1601 are opened, and the 15A valve 1521, the 15C valve 1541, the 15E valve 1561, the 15F valve 1571, and the 15G valve 1581 are opened. The 15th H valve 1591, the 15th J valve 1611, the 15Kth valve 1621, and the 15th L valve 1631 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15B配管153而導入至第2吸附塔1512,自第2吸附塔1512導出之氣體狀之氨流經第15E配管156及第15I配管160而導入至第1吸附塔1511,自第1吸附塔1511導出之氣體狀之氨流經第15D配管155而供給至第15M配管164,並自該第15M配管164將氣體狀之氨導入至冷凝器4。 By this, the gaseous ammonia derived from the gasifier 2 is introduced into the second adsorption tower 1512 via the 15B pipe 153, and the gaseous ammonia derived from the second adsorption tower 1512 flows through the 15E pipe 156 and the 15I. The piping 160 is introduced into the first adsorption tower 1511, and the gaseous ammonia derived from the first adsorption tower 1511 flows through the 15D pipe 155 and is supplied to the 15M pipe 164, and the gaseous ammonia is introduced from the 15M pipe 164. To condenser 4.

於此種第3連接模式中,可利用第1吸附塔1511及第2吸附塔1512將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第3連接模式中,由 於不實施第3吸附塔1513之吸附去除動作,故而可對該第3吸附塔1513進行再生處理。 In the third connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the first adsorption tower 1511 and the second adsorption tower 1512, so that the adsorption and removal ability to impurities can be improved. Furthermore, in the third connection mode, Since the adsorption removal operation of the third adsorption column 1513 is not performed, the third adsorption column 1513 can be regenerated.

第4連接模式係使自氣化器2導出之氣體狀之氨依序通過第2吸附塔1512、第3吸附塔1513之連接模式。於第4連接模式中,使第15B閥1531、第15F閥1571及第15J閥1611開放,使第15A閥1521、第15C閥1541、第15D閥1551、第15E閥1561、第15G閥1581、第15H閥1591、第15I閥1601、第15K閥1621及第15L閥1631封閉。 In the fourth connection mode, the gaseous ammonia derived from the gasifier 2 is sequentially passed through the connection mode of the second adsorption column 1512 and the third adsorption column 1513. In the fourth connection mode, the 15B valve 1531, the 15Fth valve 1571, and the 15th J valve 1611 are opened, and the 15A valve 1521, the 15C valve 1541, the 15D valve 1551, the 15E valve 1561, and the 15G valve 1581 are opened. The 15th H valve 1591, the 15th valve 1601, the 15Kth valve 1621, and the 15Lth valve 1631 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15B配管153而導入至第2吸附塔1512,自第2吸附塔1512導出之氣體狀之氨流經第15E配管156及第15J配管161而導入至第3吸附塔1513,自第3吸附塔1513導出之氣體狀之氨流經第15F配管157而供給至第15M配管164,並將氣體狀之氨自該第15M配管164導入至冷凝器4。 By this, the gaseous ammonia derived from the gasifier 2 is introduced into the second adsorption tower 1512 via the 15B pipe 153, and the gaseous ammonia derived from the second adsorption tower 1512 flows through the 15E pipe 156 and the 15J. The pipe 161 is introduced into the third adsorption column 1513, and the gaseous ammonia derived from the third adsorption column 1513 flows through the 15F pipe 157 and is supplied to the 15M pipe 164, and the gaseous ammonia is introduced from the 15M pipe 164. To condenser 4.

於此種第4連接模式中,可利用第2吸附塔1512及第3吸附塔1513將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第4連接模式中,由於不實施第1吸附塔1511之吸附去除動作,故而可對該第1吸附塔1511進行再生處理。 In the fourth connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the second adsorption column 1512 and the third adsorption column 1513, so that the adsorption and removal ability to impurities can be improved. Further, in the fourth connection mode, since the adsorption removal operation of the first adsorption column 1511 is not performed, the first adsorption column 1511 can be subjected to regeneration treatment.

第5連接模式係使自氣化器2導出之氣體狀之氨依序通過第3吸附塔1513、第1吸附塔1511之連接模式。於第5連接模式中,使第15C閥1541、第15D閥1551及第15K閥1621開放,使第15A閥1521、第15B閥1531、第15E閥1561、第15F閥1571、第15G閥1581、第15H閥1591、第15I閥 1601、第15J閥1611及第15L閥1631封閉。 In the fifth connection mode, the gaseous ammonia derived from the gasifier 2 is sequentially passed through the connection mode of the third adsorption column 1513 and the first adsorption column 1511. In the fifth connection mode, the 15th C valve 1541, the 15D valve 1551, and the 15Kth valve 1621 are opened, and the 15A valve 1521, the 15B valve 1531, the 15E valve 1561, the 15F valve 1571, and the 15G valve 1581 are opened. 15H valve 1591, 15I valve 1601, 15J valve 1611 and 15L valve 1631 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15C配管154而導入至第3吸附塔1513,自第3吸附塔1513導出之氣體狀之氨流經第15F配管157及第15K配管162而導入至第1吸附塔1511,自第1吸附塔1511導出之氣體狀之氨流經第15D配管155而供給至第15M配管164,並自該第15M配管164將氣體狀之氨導入至冷凝器4。 In this way, the gaseous ammonia derived from the gasifier 2 is introduced into the third adsorption column 1513 via the 15C pipe 154, and the gaseous ammonia derived from the third adsorption column 1513 flows through the 15F pipe 157 and the 15K. The piping 162 is introduced into the first adsorption tower 1511, and the gaseous ammonia derived from the first adsorption tower 1511 flows through the 15D pipe 155 and is supplied to the 15M pipe 164, and the gaseous ammonia is introduced from the 15M pipe 164. To condenser 4.

於此種第5連接模式中,可利用第1吸附塔1511及第3吸附塔1513將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第5連接模式中,由於不實施第2吸附塔1512之吸附去除動作,故而可對該第2吸附塔1512進行再生處理。 In the fifth connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the first adsorption column 1511 and the third adsorption column 1513, so that the adsorption and removal ability to impurities can be improved. Further, in the fifth connection mode, since the adsorption removal operation of the second adsorption tower 1512 is not performed, the second adsorption tower 1512 can be regenerated.

第6連接模式係使自氣化器2導出之氣體狀之氨依序通過第3吸附塔1513、第2吸附塔1512之連接模式。於第6連接模式中,使第15C閥1541、第15E閥1561及第15L閥1631開放,使第15A閥1521、第15B閥1531、第15D閥1551、第15F閥1571、第15G閥1581、第15H閥1591、第15I閥1601、第15J閥1611及第15K閥1621封閉。 In the sixth connection mode, the gaseous ammonia derived from the gasifier 2 is sequentially passed through the connection mode of the third adsorption column 1513 and the second adsorption column 1512. In the sixth connection mode, the 15Cth valve 1541, the 15Eth valve 1561, and the 15Lth valve 1631 are opened, and the 15A valve 1521, the 15B valve 1531, the 15D valve 1551, the 15F valve 1571, and the 15G valve 1581 are opened. The 15th H valve 1591, the 15th valve 1601, the 15th J valve 1611, and the 15Kth valve 1621 are closed.

藉此,自氣化器2導出之氣體狀之氨流經第15C配管154而導入至第3吸附塔1513,自第3吸附塔1513導出之氣體狀之氨流經第15F配管157、第15K配管162及第15L配管163而導入至第2吸附塔1512,自第2吸附塔1512導出之氣體狀之氨流經第15E配管156而供給至第15M配管164,並自該第15M配管164將氣體狀之氨導入至冷凝器4。 In this way, the gaseous ammonia derived from the gasifier 2 is introduced into the third adsorption column 1513 via the 15C pipe 154, and the gaseous ammonia derived from the third adsorption column 1513 flows through the 15F pipe 157, 15K. The pipe 162 and the 15L pipe 163 are introduced into the second adsorption tower 1512, and the gaseous ammonia derived from the second adsorption tower 1512 flows through the 15E pipe 156 and is supplied to the 15M pipe 164, and the 15M pipe 164 is supplied from the 15M pipe 164. The gaseous ammonia is introduced into the condenser 4.

於此種第6連接模式中,可利用第2吸附塔1512及第3吸附塔1513將氣體狀之氨中所含之雜質吸附去除,因此可提高對雜質之吸附去除能力。再者,於第6連接模式中,由於不實施第1吸附塔1511之吸附去除動作,故而可對該第1吸附塔1511進行再生處理。 In the sixth connection mode, the impurities contained in the gaseous ammonia can be adsorbed and removed by the second adsorption column 1512 and the third adsorption column 1513, so that the adsorption and removal ability to impurities can be improved. Further, in the sixth connection mode, since the adsorption removal operation of the first adsorption tower 1511 is not performed, the first adsorption tower 1511 can be regenerated.

圖3係表示本發明之第3實施形態之氨純化系統200之構成的圖。本實施形態之氨純化系統200與上述之氨純化系統100類似,對相對應之部分標附相同參照符號且省略說明。氨純化系統200中,吸附單元201之構成與上述之吸附單元3之構成不同,除此以外均與氨純化系統100相同。 Fig. 3 is a view showing the configuration of an ammonia purification system 200 according to a third embodiment of the present invention. The ammonia purification system 200 of the present embodiment is similar to the above-described ammonia purification system 100, and the same reference numerals will be given to the corresponding parts, and description thereof will be omitted. In the ammonia purification system 200, the configuration of the adsorption unit 201 is different from that of the adsorption unit 3 described above, and is the same as the ammonia purification system 100.

吸附單元201係將自氣化器2導出之氣體狀之氨中所含的雜質吸附去除而純化。於本實施形態中,吸附單元201係包含第1吸附塔2011、第2吸附塔2012、第3吸附塔2013及第4吸附塔2014而構成。 The adsorption unit 201 purifies and removes impurities contained in the gaseous ammonia derived from the gasifier 2 by adsorption. In the present embodiment, the adsorption unit 201 includes the first adsorption tower 2011, the second adsorption tower 2012, the third adsorption tower 2013, and the fourth adsorption tower 2014.

第1吸附塔2011及第3吸附塔2013係並列連接於第20配管202。第20配管202上設置有使第20配管202中之流路開放或封閉之第21閥2021及第22閥2022。於第20配管202中,第21閥2021係配置於第1吸附塔2011之上游側(即,第1吸附塔2011之塔頂部側),第22閥2022係配置於第3吸附塔2013之上游側(即,第3吸附塔2013之塔頂部側)。於將自氣化器2導出之氣體狀之氨向第1吸附塔2011供給時,使第21閥2021開放,使第22閥2022封閉,從而使氣體狀之氨自氣化器2通過第20配管202內向第1吸附塔2011流動。又,於將自氣化器2導出之氣體狀之氨向第3吸附塔2013供給時, 使第22閥2022開放,使第21閥2021封閉,從而使氣體狀之氨自氣化器2通過第20配管202內向第3吸附塔2013流動。 The first adsorption tower 2011 and the third adsorption tower 2013 are connected in parallel to the 20th piping 202. The 20th pipe 202 is provided with a 21st valve 2021 and a 22nd valve 2022 which open or close the flow path in the 20th pipe 202. In the 20th pipe 202, the 21st valve 2021 is disposed on the upstream side of the first adsorption tower 2011 (that is, on the top side of the first adsorption tower 2011), and the 22nd valve 2022 is disposed upstream of the third adsorption tower 2013. Side (ie, the top side of the tower of the third adsorption tower 2013). When the gaseous ammonia derived from the gasifier 2 is supplied to the first adsorption tower 2011, the 21st valve 2021 is opened, and the 22nd valve 2022 is closed, and the gaseous ammonia is passed through the gasifier 2 through the 20th. The inside of the pipe 202 flows into the first adsorption tower 2011. Moreover, when the gaseous ammonia derived from the gasifier 2 is supplied to the third adsorption tower 2013, When the 22nd valve 2022 is opened, the 21st valve 2021 is closed, and gaseous ammonia is flowed from the vaporizer 2 to the 3rd adsorption tower 2013 through the 20th piping 202.

如此,吸附單元201具有並列連接之第1吸附塔2011及第3吸附塔2013,藉此可對並列連接之第1吸附塔2011及第3吸附塔2013以分別區分開之狀態導入自氣化器2導出之氣體狀之氨,因此,例如可於利用第1吸附塔2011進行吸附去除期間,對使用完畢之第3吸附塔2013進行再生處理,以使得可利用使用完畢之第3吸附塔2013再次進行吸附去除動作。 In this way, the adsorption unit 201 has the first adsorption tower 2011 and the third adsorption tower 2013 that are connected in parallel, whereby the first adsorption tower 2011 and the third adsorption tower 2013 that are connected in parallel can be introduced into the gasifier in a state of being separated from each other. In the case where the ammonia is desorbed by the first adsorption tower 2011, the third adsorption tower 2013 that has been used can be regenerated so that the third adsorption tower 2013 can be used again. The adsorption removal operation is performed.

第2吸附塔2012係經由第21配管203而與第1吸附塔2011串列連接。即,第21配管203的一端部連接於第1吸附塔2011之塔底部,另一端部連接於第2吸附塔2012之塔頂部。藉此,自氣化器2導出後導入至第1吸附塔2011之氣體狀之氨於使第23閥2031開放之狀態下,流經第21配管203而導入至第2吸附塔2012。如此,吸附單元201具有串列連接之第1吸附塔2011及第2吸附塔2012,藉此可利用第1吸附塔2011及第2吸附塔2012將自氣化器2導出之氣體狀之氨中所含的雜質吸附去除,因此可提高對雜質之吸附去除能力。 The second adsorption tower 2012 is connected in series to the first adsorption tower 2011 via the 21st pipe 203. In other words, one end of the 21st pipe 203 is connected to the bottom of the tower of the first adsorption tower 2011, and the other end is connected to the top of the tower of the second adsorption tower 2012. In this way, the gaseous ammonia introduced into the first adsorption tower 2011 after being led out from the gasifier 2 flows through the 21st pipe 203 and is introduced into the second adsorption tower 2012 while the 23rd valve 2031 is opened. In this way, the adsorption unit 201 has the first adsorption tower 2011 and the second adsorption tower 2012 connected in series, whereby the first adsorption tower 2011 and the second adsorption tower 2012 can be used to extract the gaseous ammonia derived from the gasifier 2. The impurities contained are adsorbed and removed, so that the adsorption and removal ability to impurities can be improved.

自第2吸附塔2012導出之氣體狀之氨於使第24閥2041開放之狀態下,流經第22配管204而供給至冷凝器4。 The gaseous ammonia derived from the second adsorption tower 2012 flows through the 22nd pipe 204 and is supplied to the condenser 4 in a state where the 24th valve 2041 is opened.

第4吸附塔2014係經由第23配管205而與第3吸附塔2013串列連接。即,第23配管205的一端部連接於第3吸附塔2013之塔底部,另一端部連接於第4吸附塔2014之塔頂 部。藉此,自氣化器2導出後導入至第3吸附塔2013之氣體狀之氨於使第25閥2051開放之狀態下,流經第23配管205而導入至第4吸附塔2014。如此,吸附單元201具有串列連接之第3吸附塔2013及第4吸附塔2014,藉此可利用第3吸附塔2013及第4吸附塔2014將自氣化器2導出之氣體狀之氨中所含的雜質吸附去除,因此可提高對雜質之吸附去除能力。 The fourth adsorption tower 2014 is connected in series to the third adsorption tower 2013 via the 23rd piping 205. In other words, one end of the 23rd pipe 205 is connected to the bottom of the third adsorption tower 2013, and the other end is connected to the top of the 4th adsorption tower 2014. unit. In this way, the gaseous ammonia introduced into the third adsorption tower 2013 after being led out from the gasifier 2 flows through the 23rd pipe 205 and is introduced into the fourth adsorption tower 2014 while the 25th valve 2051 is opened. In this way, the adsorption unit 201 has the third adsorption tower 2013 and the fourth adsorption tower 2014 connected in series, whereby the third adsorption tower 2013 and the fourth adsorption tower 2014 can be used to extract the gaseous ammonia derived from the gasifier 2. The impurities contained are adsorbed and removed, so that the adsorption and removal ability to impurities can be improved.

自第4吸附塔2014導出之氣體狀之氨於使第26閥2061開放之狀態下,流經第24配管206而供給至冷凝器4。 The gaseous ammonia derived from the fourth adsorption tower 2014 flows through the 24th pipe 206 and is supplied to the condenser 4 in a state where the 26th valve 2061 is opened.

氨純化系統200之吸附單元201中之第1吸附塔2011具有自塔頂部向塔底部(自氨之流動方向上游側向下游側)依序積層有塔頂吸附層20111、第1中間吸附層20112、第2中間吸附層20113、第3中間吸附層20114、及塔底吸附層20115之積層構造。 The first adsorption tower 2011 in the adsorption unit 201 of the ammonia purification system 200 has a column top adsorption layer 20111 and a first intermediate adsorption layer 20112 sequentially stacked from the top of the column to the bottom of the column (upstream side to the downstream side from the flow direction of ammonia). The laminated structure of the second intermediate adsorption layer 20113, the third intermediate adsorption layer 20114, and the bottom adsorption layer 20115.

塔頂吸附層20111係以與上述之吸附單元3中之第1吸附塔31之塔頂吸附層311相同之方式構成的含有第1吸附劑之層,具有作為第1吸附劑層之功能。第1中間吸附層20112係以與上述之第1吸附塔31之第1中間吸附層312相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。第2中間吸附層20113係以與上述之第1吸附塔31之第2中間吸附層313相同之方式構成的含有第2吸附劑之層,具有作為第2吸附劑層之功能。第3中間吸附層20114係以與上述之第1吸附塔31之第1中間吸附層312及第2中間吸附層313相同之方式構成的含有第2吸附劑之層,具有作為第2 吸附劑層之功能。但是,雖然第1中間吸附層20112、第2中間吸附層20113、及第3中間吸附層20114同為含有第2吸附劑之層,但係使用種類互不相同之吸附劑。塔底吸附層20115係以與上述之第1吸附塔31之塔底吸附層314相同之方式構成的含有第3吸附劑之層,具有作為第3吸附劑層之功能。 The column top adsorption layer 20111 is a layer containing the first adsorbent and configured to be the same as the column top adsorption layer 311 of the first adsorption column 31 in the adsorption unit 3 described above, and has a function as a first adsorbent layer. The first intermediate adsorption layer 20112 has a second adsorbent-containing layer configured in the same manner as the first intermediate adsorption layer 312 of the first adsorption tower 31 described above, and has a function as a second adsorbent layer. The second intermediate adsorption layer 20113 is a layer containing the second adsorbent configured to be the same as the second intermediate adsorption layer 313 of the first adsorption tower 31 described above, and has a function as a second adsorbent layer. The third intermediate adsorption layer 20114 is a layer containing the second adsorbent, which is configured in the same manner as the first intermediate adsorption layer 312 and the second intermediate adsorption layer 313 of the first adsorption tower 31 described above, and has a second adsorption layer. The function of the sorbent layer. However, the first intermediate adsorption layer 20112, the second intermediate adsorption layer 20113, and the third intermediate adsorption layer 20114 are the same layers containing the second adsorbent, but different types of adsorbents are used. The bottom adsorption layer 20115 is a layer containing a third adsorbent which is configured in the same manner as the bottom adsorption layer 314 of the first adsorption tower 31 described above, and has a function as a third adsorbent layer.

列舉具體例對第1吸附塔2011中之積層構造進行說明。於第1具體例中,塔頂吸附層20111係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層20112係含有矽膠(Silbead N,水澤化學工業股份有限公司製造)作為第2吸附劑之層,第2中間吸附層20113係含有親水性沸石(MS-3A,Tosoh股份有限公司製造)作為第2吸附劑之層,第3中間吸附層20114係含有疏水性沸石(HSZ-300,二氧化矽/氧化鋁比=10,Tosoh股份有限公司製造)作為第2吸附劑之層,塔底吸附層20115係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第3吸附劑之層。 The laminated structure in the first adsorption tower 2011 will be described with reference to specific examples. In the first specific example, the top adsorption layer 20111 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 20112 contains tannin (Silbead N, Mizusawa Chemical Industry). The second intermediate adsorption layer 20113 is a layer containing a hydrophilic zeolite (MS-3A, manufactured by Tosoh Co., Ltd.) as a second adsorbent, and a third intermediate adsorption layer 20114 is a layer of the second adsorbent. Hydrophobic zeolite (HSZ-300, cerium oxide/alumina ratio = 10, manufactured by Tosoh Co., Ltd.) as a layer of the second adsorbent, and the bottom adsorbent layer 20115 contains activated carbon (GG, Kuraray Chemical Co., Ltd.) Manufactured as a layer of the third adsorbent.

於第2具體例中,塔頂吸附層20111係含有活性碳(GG,Kuraray Chemical股份有限公司製造)作為第1吸附劑之層,第1中間吸附層20112係含有親水性沸石(MS-3A,Tosoh股份有限公司製造)作為第2吸附劑之層,第2中間吸附層20113係含有矽膠(Silbead N,水澤化學工業股份有限公司製造)作為第2吸附劑之層,第3中間吸附層20114係含有疏水性沸石(HiSiv,Union Showa股份有限公司製造)作 為第2吸附劑之層,塔底吸附層20115係含有MS-13X(Tosoh股份有限公司製造)作為第3吸附劑之層。 In the second specific example, the column top adsorption layer 20111 contains activated carbon (GG, manufactured by Kuraray Chemical Co., Ltd.) as a layer of the first adsorbent, and the first intermediate adsorption layer 20112 contains a hydrophilic zeolite (MS-3A, As a layer of the second adsorbent, the second intermediate adsorption layer 20113 contains tantalum (Silbead N, manufactured by Mizusawa Chemical Co., Ltd.) as a layer of the second adsorbent, and the third intermediate adsorbent layer 20114 is a layer. Containing hydrophobic zeolite (HiSiv, manufactured by Union Showa Co., Ltd.) In the layer of the second adsorbent, the bottom adsorption layer 20115 contains MS-13X (manufactured by Tosoh Co., Ltd.) as a layer of the third adsorbent.

於以如上方式構成的本實施形態之氨純化系統200中,係藉由積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層的第1吸附塔2011、第2吸附塔2012、第3吸附塔2013、及第4吸附塔2014對粗氨中所含之雜質進行吸附去除,因此可將粗氨中所含之雜質(主要是水及有機化合物)效率良好地吸附去除。並且,冷凝器4將自第2吸附塔2012或第4吸附塔2014導出之氨分凝而分離為氣相成分與液相成分,因此可將氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,於本實施形態之氨純化系統200中,無需如先前技術般進行伴隨回流之蒸餾,而可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化。 In the ammonia purification system 200 of the present embodiment configured as described above, the adsorbent layer having different adsorption capacities for water, an organic compound having a carbon number of less than 5, and an organic compound having a carbon number of 5 or more is laminated. The first adsorption tower 2011, the second adsorption tower 2012, the third adsorption tower 2013, and the fourth adsorption tower 2014 adsorb and remove impurities contained in the crude ammonia, so that impurities (mainly water) contained in the crude ammonia can be contained. And organic compounds) are efficiently adsorbed and removed. Further, the condenser 4 separates the ammonia derived from the second adsorption tower 2012 or the fourth adsorption tower 2014 into a gas phase component and a liquid phase component, so that hydrogen, nitrogen, oxygen, argon, carbon monoxide, carbon dioxide, or the like can be used. The highly volatile impurities are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained as a liquid phase component. Therefore, in the ammonia purification system 200 of the present embodiment, it is not necessary to carry out distillation with reflux as in the prior art, and the ammonia can be purified by a simplified method, and ammonia can be efficiently purified by suppressing energy consumption.

圖4係表示本發明之第4實施形態之氨純化系統300之構成的圖。本實施形態之氨純化系統300與上述之氨純化系統100類似,對相對應之部分標附相同參照符號且省略說明。氨純化系統300中,原料貯存槽1A之構成與上述之原料貯存槽1之構成不同,除此以外均與氨純化系統100相同。 Fig. 4 is a view showing the configuration of an ammonia purification system 300 according to a fourth embodiment of the present invention. The ammonia purification system 300 of the present embodiment is similar to the above-described ammonia purification system 100, and the same reference numerals will be given to the corresponding parts, and the description thereof will be omitted. In the ammonia purification system 300, the configuration of the raw material storage tank 1A is the same as that of the above-described raw material storage tank 1, and is the same as the ammonia purification system 100.

氨純化系統300中所包括之原料貯存槽1A係將粗氨以液體狀之氨之形態貯存,並控制為特定之溫度及壓力。原料 貯存槽1A具有圓柱狀之內部空間,於在其內部空間貯存有液體狀之粗氨之狀態下,原料貯存槽1A之上部形成氣相,下部形成液相。 The raw material storage tank 1A included in the ammonia purification system 300 stores crude ammonia in the form of liquid ammonia and is controlled to a specific temperature and pressure. raw material The storage tank 1A has a cylindrical internal space, and in a state in which liquid ammonia is stored in the internal space thereof, a gas phase is formed in the upper portion of the raw material storage tank 1A, and a liquid phase is formed in the lower portion.

於本實施形態中,原料貯存槽1A將所貯存之粗氨向吸附單元3導出。再者,氨純化系統300中不具備上述氣化器2。於將粗氨自原料貯存槽1A向吸附單元3導出時,揮發性較低之雜質(例如,水分、碳數超過6之烴等)之大部分殘留於液相中,自原料貯存槽1A中所形成之氣相中以氣體狀之粗氨之形式導出。為將貯存於原料貯存槽1A內之液體狀之粗氨的一部分氣化,使氣相中之氨濃度上升,而於原料貯存槽1A上設置有對液體狀之粗氨進行加熱之加熱裝置302。 In the present embodiment, the raw material storage tank 1A discharges the stored crude ammonia to the adsorption unit 3. Further, the vaporizer 2 described above is not provided in the ammonia purification system 300. When the crude ammonia is led out from the raw material storage tank 1A to the adsorption unit 3, most of the impurities having low volatility (for example, water, hydrocarbons having more than 6 carbon atoms) remain in the liquid phase, from the raw material storage tank 1A. The formed gas phase is derived in the form of gaseous crude ammonia. In order to vaporize a part of the liquid crude ammonia stored in the raw material storage tank 1A to increase the ammonia concentration in the gas phase, the raw material storage tank 1A is provided with a heating device 302 for heating the liquid crude ammonia. .

原料貯存槽1A之上部(形成氣相之部分)連接有氣體狀氨導出配管301。氣體狀氨導出配管301之與連接於原料貯存槽1A之側相反之側的端部連接有流量調整器71。又,氣體狀氨導出配管301上設置有使氣體狀氨導出配管301中之流路開放或封閉之開閉閥3011。 A gas-like ammonia outlet pipe 301 is connected to the upper portion of the raw material storage tank 1A (the portion where the gas phase is formed). A flow rate adjuster 71 is connected to an end of the gaseous ammonia-derived piping 301 on the side opposite to the side connected to the raw material storage tank 1A. Further, the gas-like ammonia outlet pipe 301 is provided with an opening and closing valve 3011 that opens or closes the flow path in the gaseous ammonia-outflow pipe 301.

貯存於原料貯存槽1A中之粗氨於使開閉閥3011開放之狀態下,自原料貯存槽1A中所形成之氣相中以氣體狀之粗氨之形式導出。如此般自原料貯存槽1A導出之氣體狀之粗氨流經氣體狀氨導出配管301而供給至流量調整器71。繼而,氣體狀之粗氨經流量調整器71調整流量後供給至包含第1吸附塔31及第2吸附塔32之吸附單元3。供給至吸附單元3之氣體狀之粗氨由第1吸附塔31及第2吸附塔32將雜質 吸附去除而純化。進而,於第1吸附塔31及第2吸附塔32中經純化之氣體狀之氨於冷凝器4中分凝並將揮發性較高之雜質分離去除。 The crude ammonia stored in the raw material storage tank 1A is taken out from the gas phase formed in the raw material storage tank 1A in the form of gaseous crude ammonia in a state where the opening and closing valve 3011 is opened. The gaseous crude ammonia derived from the raw material storage tank 1A flows through the gaseous ammonia-extracting pipe 301 and is supplied to the flow rate adjuster 71. Then, the gaseous crude ammonia is supplied to the adsorption unit 3 including the first adsorption tower 31 and the second adsorption tower 32 by the flow rate adjuster 71. The gaseous crude ammonia supplied to the adsorption unit 3 is contaminated by the first adsorption tower 31 and the second adsorption tower 32. Purified by adsorption removal. Further, the purified gaseous ammonia in the first adsorption tower 31 and the second adsorption tower 32 is segregated in the condenser 4, and impurities having higher volatility are separated and removed.

於以如上方式構成的本實施形態之氨純化系統300中,係藉由積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層的第1吸附塔31及第2吸附塔32對氣體狀之粗氨中所含之雜質進行吸附去除,因此可將粗氨中所含之雜質(主要是水及有機化合物)效率良好地吸附去除。並且,冷凝器4將自第1吸附塔31或第2吸附塔32導出之氨分凝而分離為氣相成分與液相成分,因此可將氫氣、氮氣、氧氣、氬氣、一氧化碳、二氧化碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,於本實施形態之氨純化系統300中,無需如先前技術般進行伴隨回流之蒸餾,而可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化。 In the ammonia purification system 300 of the present embodiment configured as described above, the adsorbent layer having different adsorption capacities for water, an organic compound having less than 5 carbon atoms, and an organic compound having 5 or more carbon atoms is laminated. Since the first adsorption tower 31 and the second adsorption tower 32 adsorb and remove impurities contained in the gaseous crude ammonia, impurities (mainly water and organic compounds) contained in the crude ammonia can be efficiently adsorbed and removed. Further, the condenser 4 separates the ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 into a gas phase component and a liquid phase component, so that hydrogen, nitrogen, oxygen, argon, carbon monoxide, carbon dioxide, or the like can be used. The highly volatile impurities are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained as a liquid phase component. Therefore, in the ammonia purification system 300 of the present embodiment, it is not necessary to carry out distillation with reflux as in the prior art, and the ammonia can be purified by a simplified method, and ammonia can be efficiently purified by suppressing energy consumption.

圖5係表示本發明之第5實施形態之氨純化系統400之構成的圖。本實施形態之氨純化系統400與上述之氨純化系統100類似,對相對應之部分標附相同參照符號且省略說明。氨純化系統400中,原料貯存槽1B之構成與上述之原料貯存槽1之構成不同,除此以外均與氨純化系統100相同。 Fig. 5 is a view showing the configuration of an ammonia purification system 400 according to a fifth embodiment of the present invention. The ammonia purification system 400 of the present embodiment is similar to the above-described ammonia purification system 100, and the same reference numerals will be given to the corresponding parts, and the description thereof will be omitted. In the ammonia purification system 400, the configuration of the raw material storage tank 1B is the same as that of the above-described raw material storage tank 1, and is the same as the ammonia purification system 100.

氨純化系統400中所包括之原料貯存槽1B係將粗氨以液體狀之氨之形態貯存,並控制為特定之溫度及壓力。原料 貯存槽1B具有圓柱狀之內部空間,於在其內部空間中貯存有液體狀之粗氨之狀態下,原料貯存槽1B之上部形成氣相,下部形成液相。又,為將貯存於原料貯存槽1B內之液體狀之粗氨的一部分氣化,使氣相中之氨濃度上升,而於原料貯存槽1B上設置對液體狀之粗氨進行加熱之加熱裝置403。 The raw material storage tank 1B included in the ammonia purification system 400 stores crude ammonia in the form of liquid ammonia and is controlled to a specific temperature and pressure. raw material The storage tank 1B has a cylindrical internal space, and in a state in which liquid ammonia is stored in the internal space thereof, a gas phase is formed in the upper portion of the raw material storage tank 1B, and a liquid phase is formed in the lower portion. In addition, in order to vaporize a part of the liquid crude ammonia stored in the raw material storage tank 1B, the ammonia concentration in the gas phase is increased, and a heating device for heating the liquid crude ammonia is provided in the raw material storage tank 1B. 403.

於本實施形態中,原料貯存槽1B係構成為可自氣相及液相之任一相導出所貯存之粗氨。 In the present embodiment, the raw material storage tank 1B is configured to be capable of deriving the stored crude ammonia from any of the gas phase and the liquid phase.

根據原料貯存槽1B內之液體狀之粗氨之填充量(貯存量)之不同,原料貯存槽1B中所形成之氣相之雜質(尤其是揮發性較高之雜質)濃度不同。原料貯存槽1B內之液體狀之粗氨之填充量越多,原料貯存槽1B中所形成之氣相中揮發性較高之雜質濃度越高。又,原料貯存槽1B內之液體狀之粗氨之填充量越少,原料貯存槽1B中所形成之液相中揮發性較低之雜質(例如,水、碳數較大之有機化合物)之濃度越高。即,於自原料貯存槽1B中所形成之液相導出液體狀之粗氨之情形時,隨著原料貯存槽1B內之液體狀之粗氨之填充量減少,逐漸成為將揮發性較低之雜質濃度較高的粗氨自原料貯存槽1B之液相導出。 The concentration of impurities (especially impurities having a higher volatility) in the gas phase formed in the raw material storage tank 1B is different depending on the filling amount (storage amount) of the liquid crude ammonia in the raw material storage tank 1B. The higher the filling amount of the liquid crude ammonia in the raw material storage tank 1B, the higher the concentration of impurities having higher volatility in the gas phase formed in the raw material storage tank 1B. Further, the smaller the filling amount of the liquid crude ammonia in the raw material storage tank 1B, the less volatile impurities (for example, water and organic compounds having a large carbon number) in the liquid phase formed in the raw material storage tank 1B. The higher the concentration. In other words, when liquid ammonia is derived from the liquid phase formed in the raw material storage tank 1B, the amount of liquid ammonia in the raw material storage tank 1B is reduced, and the volatility is gradually lowered. The crude ammonia having a higher impurity concentration is derived from the liquid phase of the raw material storage tank 1B.

因此,本實施形態之氨純化系統400係構成為根據原料貯存槽1B內之液體狀之粗氨之填充量而切換粗氨之導出狀態(自氣相及液相之哪一相導出粗氨之導出動作之控制)。氨純化系統400係構成如下:算出原料貯存槽1B內作為液相之容積相對於內部空間之容積的比之容積比,當該容積 比為預先規定之閥值以上時,自原料貯存槽1B中所形成之液相導出液體狀之粗氨,於未達上述閥值之情形時,自原料貯存槽1B中所形成之氣相導出氣體狀之粗氨。 Therefore, the ammonia purification system 400 of the present embodiment is configured to switch the export state of the crude ammonia according to the filling amount of the liquid crude ammonia in the raw material storage tank 1B (which phase of the crude gas is derived from the gas phase and the liquid phase) Export action control). The ammonia purification system 400 is configured to calculate a volume ratio of a ratio of a volume of a liquid phase to a volume of an internal space in the raw material storage tank 1B, when the volume is When the ratio is equal to or greater than a predetermined threshold, the liquid ammonia is derived from the liquid phase formed in the raw material storage tank 1B, and when the above threshold is not reached, the gas phase formed in the raw material storage tank 1B is derived. Crude ammonia in the form of a gas.

具體而言,於氨純化系統400中,檢測出原料貯存槽1B內所貯存之液體狀之粗氨於內部空間中之液面高度。若預先已知內部空間之大小的尺寸,則可使用液面高度算出上述容積比。尤其是於與底面平行之剖面為固定之內部空間內,液面高度相對於內部空間之高度的比與上述容積比相同,因此容易算出容積比。 Specifically, in the ammonia purification system 400, the liquid level of the liquid-like crude ammonia stored in the raw material storage tank 1B in the internal space is detected. If the size of the internal space is known in advance, the volume ratio can be calculated using the liquid level. In particular, in the internal space in which the cross section parallel to the bottom surface is fixed, the ratio of the height of the liquid surface to the height of the internal space is the same as the volume ratio described above, so that the volume ratio can be easily calculated.

於本實施形態中,原料貯存槽1B中所形成之內部空間由於為圓柱狀,因此為與圓形之底面平行之剖面為固定之內部空間。故而,液面高度相對於內部空間之高度的比與上述容積比相同。因此,氨純化系統400係使用原料貯存槽1B之內部空間之高度之值與液面高度之值,算出液面高度相對於內部空間之高度的比((液面高度/內部空間之高度),以下稱為「高度比」)作為相當於上述容積比之值。 In the present embodiment, since the internal space formed in the raw material storage tank 1B has a columnar shape, the cross section parallel to the bottom surface of the circular shape is a fixed internal space. Therefore, the ratio of the liquid level to the height of the internal space is the same as the above volume ratio. Therefore, the ammonia purification system 400 calculates the ratio of the liquid level height to the height of the internal space (the liquid level height / the height of the internal space) using the value of the height of the internal space of the raw material storage tank 1B and the value of the liquid level height. Hereinafter, it is referred to as "height ratio" as a value corresponding to the above volume ratio.

進而,氨純化系統400中,於上述高度比為預先規定之閥值(本實施形態中,閥值=1/2)以上時,以自原料貯存槽1B中所形成之液相導出液體狀之粗氨之方式,控制原料貯存槽1B之粗氨之導出動作。又,氨純化系統400中,於上述高度比未達預先規定之閥值時,以自原料貯存槽1B中所形成之氣相導出氣體狀之粗氨之方式,控制原料貯存槽1B之粗氨之導出動作。 Further, in the ammonia purification system 400, when the height ratio is equal to or greater than a predetermined threshold (in the present embodiment, the threshold value is 1/2), the liquid phase is derived from the liquid phase formed in the raw material storage tank 1B. The method of crude ammonia controls the derivation of crude ammonia in the raw material storage tank 1B. Further, in the ammonia purification system 400, when the height ratio is less than a predetermined threshold value, the crude ammonia of the raw material storage tank 1B is controlled so that the gaseous ammonia is derived from the gas phase formed in the raw material storage tank 1B. The export action.

換言之,本實施形態之氨純化系統400係構成為,當檢 測出原料貯存槽1B內液體狀之粗氨係填充至原料貯存槽1B之高度之1/2(相當於上述閥值)以上之高度位置時,自原料貯存槽1B中所形成之液相導出液體狀之粗氨。又,氨純化系統400係構成為,當檢測出原料貯存槽1B內液體狀之粗氨係填充至未達原料貯存槽1B之高度之1/2(相當於上述閥值)之高度位置時,自原料貯存槽1B中所形成之氣相導出氣體狀之粗氨。 In other words, the ammonia purification system 400 of the present embodiment is configured to be inspected. When it is measured that the liquid ammonia in the raw material storage tank 1B is filled to a height position of 1/2 or more (corresponding to the above-mentioned threshold value) of the raw material storage tank 1B, the liquid phase formed from the raw material storage tank 1B is derived. Crude ammonia in liquid form. Further, the ammonia purification system 400 is configured to detect that the liquid-like crude ammonia in the raw material storage tank 1B is filled to a height position that is less than 1/2 of the height of the raw material storage tank 1B (corresponding to the above-described threshold value). The gaseous ammonia is derived from the gas phase formed in the raw material storage tank 1B.

如此般,係構成為根據原料貯存槽1B內之液體狀之粗氨之填充量而切換粗氨之導出狀態,藉此可以雜質濃度之偏差較少之狀態自原料貯存槽1B導出粗氨。藉此,可防止最終純化所得之氨之純度產生較大偏差。 In this manner, the crude ammonia is switched in accordance with the filling amount of the liquid crude ammonia in the raw material storage tank 1B, whereby the crude ammonia can be led out from the raw material storage tank 1B in a state where the variation in the impurity concentration is small. Thereby, it is possible to prevent a large deviation in the purity of the ammonia obtained by the final purification.

於原料貯存槽1B之下部(形成液相之部分)連接有液體狀氨導出配管401。液體狀氨導出配管401之與連接於原料貯存槽1B之側相反側的端部連接於氣化器2。又,液體狀氨導出配管401上設置有使液體狀氨導出配管401中之流路開放或封閉之開閉閥4011。貯存於原料貯存槽1B中之粗氨於使開閉閥4011開放之狀態下,自原料貯存槽1B中所形成之液相中以液體狀之粗氨之形式導出。如此般自原料貯存槽1B導出之液體狀之粗氨流經液體狀氨導出配管401而供給至氣化器2。自原料貯存槽1B導出之液體狀之粗氨由氣化器2氣化後,以氣體狀之氨之形式供給至流量調整器71。如此般由氣化器2氣化所得之氣體狀之氨由流量調整器71調整流量後,供給至包含第1吸附塔31及第2吸附塔32之吸附單元3。 A liquid ammonia-extracting pipe 401 is connected to a lower portion of the raw material storage tank 1B (a portion where a liquid phase is formed). The end of the liquid ammonia-derived piping 401 opposite to the side connected to the raw material storage tank 1B is connected to the vaporizer 2. Further, the liquid ammonia-derived piping 401 is provided with an opening and closing valve 4011 that opens or closes the flow path in the liquid ammonia-extracting pipe 401. The crude ammonia stored in the raw material storage tank 1B is taken out from the liquid phase formed in the raw material storage tank 1B in the form of liquid crude ammonia in a state where the opening and closing valve 4011 is opened. The liquid crude ammonia derived from the raw material storage tank 1B flows through the liquid ammonia-extracting pipe 401 and is supplied to the vaporizer 2 . The liquid crude ammonia derived from the raw material storage tank 1B is vaporized by the vaporizer 2, and then supplied to the flow rate adjuster 71 in the form of gaseous ammonia. The gaseous ammonia obtained by vaporization of the vaporizer 2 is adjusted in flow rate by the flow rate adjuster 71, and then supplied to the adsorption unit 3 including the first adsorption tower 31 and the second adsorption tower 32.

又,於原料貯存槽1B之上部(形成氣相之部分)連接有氣體狀氨導出配管402。氣體狀氨導出配管402之與連接於原料貯存槽1B之側相反之側的端部連接於流量調整器71。又,氣體狀氨導出配管402上設置有使氣體狀氨導出配管402中之流路開放或封閉之開閉閥4021。 Further, a gaseous ammonia outlet pipe 402 is connected to the upper portion of the raw material storage tank 1B (the portion where the gas phase is formed). An end portion of the gaseous ammonia-derived piping 402 opposite to the side connected to the raw material storage tank 1B is connected to the flow rate adjuster 71. Further, the gas-like ammonia outlet pipe 402 is provided with an opening and closing valve 4021 that opens or closes the flow path in the gaseous ammonia-outlet pipe 402.

貯存於原料貯存槽1B中之粗氨於使開閉閥4021開放之狀態下,自原料貯存槽1B中所形成之氣相中以氣體狀之粗氨之形式導出。如此般自原料貯存槽1B導出之氣體狀之粗氨流經氣體狀氨導出配管402而供給至流量調整器71。繼而,氣體狀之粗氨經流量調整器71調整流量後供給至包含第1吸附塔31及第2吸附塔32之吸附單元3。 The crude ammonia stored in the raw material storage tank 1B is taken out from the gas phase formed in the raw material storage tank 1B in the form of gaseous crude ammonia in a state where the opening and closing valve 4021 is opened. The gaseous crude ammonia derived from the raw material storage tank 1B flows through the gaseous ammonia-extracting pipe 402 and is supplied to the flow rate adjuster 71. Then, the gaseous crude ammonia is supplied to the adsorption unit 3 including the first adsorption tower 31 and the second adsorption tower 32 by the flow rate adjuster 71.

於本實施形態之氨純化系統400中,供給至吸附單元3之氣體狀之氨由第1吸附塔31及第2吸附塔32將雜質吸附去除而純化。進而,於第1吸附塔31及第2吸附塔32中經純化之氣體狀之氨於冷凝器4中分凝並將揮發性較高之雜質分離去除。 In the ammonia purification system 400 of the present embodiment, the gaseous ammonia supplied to the adsorption unit 3 is purified by adsorbing and removing impurities from the first adsorption tower 31 and the second adsorption tower 32. Further, the purified gaseous ammonia in the first adsorption tower 31 and the second adsorption tower 32 is segregated in the condenser 4, and impurities having higher volatility are separated and removed.

於以如上方式構成的本實施形態之氨純化系統400中,係藉由積層有對水、碳數未達5之有機化合物、碳數5以上之有機化合物之吸附能力分別不同之吸附劑層的第1吸附塔31及第2吸附塔32對氣體狀之粗氨中所含之雜質進行吸附去除,因此可將粗氨中所含之雜質(主要是水及有機化合物)效率良好地吸附去除。並且,冷凝器4將自第1吸附塔31或第2吸附塔32導出之氨分凝而分離為氣相成分與液相成分,因此可將氫氣、氮氣、氧氣、氬氣、一氧化碳、 二氧化碳等揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。因此,於本實施形態之氨純化系統400中,無需如先前技術般進行伴隨回流之蒸餾,而可以簡化之方法將氨純化,並且可抑制能量消耗而將氨高效率地純化。 In the ammonia purification system 400 of the present embodiment configured as described above, the adsorbent layer having different adsorption capacities for water, an organic compound having less than 5 carbon atoms, and an organic compound having 5 or more carbon atoms is laminated. Since the first adsorption tower 31 and the second adsorption tower 32 adsorb and remove impurities contained in the gaseous crude ammonia, impurities (mainly water and organic compounds) contained in the crude ammonia can be efficiently adsorbed and removed. Further, the condenser 4 separates the ammonia derived from the first adsorption tower 31 or the second adsorption tower 32 into a gas phase component and a liquid phase component, so that hydrogen, nitrogen, oxygen, argon, carbon monoxide, or the like can be used. The highly volatile impurities such as carbon dioxide are separated and removed in the form of a gas phase component, and the purified liquid ammonia is obtained in the form of a liquid phase component. Therefore, in the ammonia purification system 400 of the present embodiment, it is not necessary to carry out distillation with reflux as in the prior art, and the ammonia can be purified by a simplified method, and ammonia can be efficiently purified by suppressing energy consumption.

本發明可於不脫離其精神或主要特徵之情況下以其他各種形態實施。因此,上述實施形態於所有方面均僅為例示,本發明之範圍係申請專利範圍所示者,不受說明書正文任何限定。進而,屬於申請專利範圍之變形或變更全部在本發明之範圍內。 The present invention may be embodied in other various forms without departing from the spirit or essential characteristics thereof. Therefore, the above-described embodiments are merely illustrative in all aspects, and the scope of the present invention is not limited by the scope of the specification. Further, all modifications or alterations belonging to the scope of the claims are within the scope of the invention.

1‧‧‧原料貯存槽 1‧‧‧Material storage tank

1A‧‧‧原料貯存槽 1A‧‧‧Material storage tank

1B‧‧‧原料貯存槽 1B‧‧‧Material storage tank

2‧‧‧氣化器 2‧‧‧ gasifier

3‧‧‧吸附單元 3‧‧‧Adsorption unit

4‧‧‧冷凝器 4‧‧‧Condenser

5‧‧‧回收槽 5‧‧‧Recycling tank

6‧‧‧填充裝置 6‧‧‧Filling device

31‧‧‧第1吸附塔 31‧‧‧1st adsorption tower

32‧‧‧第2吸附塔 32‧‧‧2nd adsorption tower

71‧‧‧流量調整器 71‧‧‧Flow Regulator

72‧‧‧冷卻液送液裝置 72‧‧‧Cooling liquid feeding device

80‧‧‧排氣配管 80‧‧‧Exhaust piping

80A‧‧‧排出配管 80A‧‧‧ discharge piping

81‧‧‧第1配管 81‧‧‧1st piping

82‧‧‧第2配管 82‧‧‧2nd piping

83‧‧‧第3配管 83‧‧‧3rd piping

84‧‧‧第4配管 84‧‧‧4th piping

85‧‧‧第5配管 85‧‧‧5th piping

86‧‧‧第6配管 86‧‧‧6th piping

87‧‧‧第7配管 87‧‧‧7th piping

88‧‧‧第8配管 88‧‧‧8th piping

89‧‧‧第9配管 89‧‧‧9th piping

90‧‧‧第10配管 90‧‧‧10th piping

91‧‧‧第11配管 91‧‧‧11th piping

92‧‧‧第12配管 92‧‧‧12th piping

93‧‧‧第13配管 93‧‧‧13th piping

94‧‧‧第14配管 94‧‧‧14th piping

95‧‧‧第15配管 95‧‧‧15th piping

100‧‧‧氨純化系統 100‧‧‧Ammonia Purification System

150‧‧‧氨純化系統 150‧‧‧Ammonia Purification System

151‧‧‧吸附單元 151‧‧‧Adsorption unit

200‧‧‧氨純化系統 200‧‧‧Ammonia Purification System

201‧‧‧吸附單元 201‧‧‧Adsorption unit

300‧‧‧氨純化系統 300‧‧‧Ammonia Purification System

311‧‧‧塔頂吸附層 311‧‧‧ top adsorption layer

312‧‧‧第1中間吸附層 312‧‧‧1st intermediate adsorption layer

313‧‧‧第2中間吸附層 313‧‧‧2nd intermediate adsorption layer

314‧‧‧塔底吸附層 314‧‧‧ bottom adsorption layer

321‧‧‧塔頂吸附層 321‧‧‧ top adsorption layer

322‧‧‧第1中間吸附層 322‧‧‧1st intermediate adsorption layer

323‧‧‧第2中間吸附層 323‧‧‧2nd intermediate adsorption layer

324‧‧‧塔底吸附層 324‧‧‧ bottom adsorption layer

400‧‧‧氨純化系統 400‧‧‧Ammonia Purification System

801‧‧‧排氣閥 801‧‧‧Exhaust valve

801A‧‧‧排出閥 801A‧‧‧ discharge valve

811‧‧‧第1閥 811‧‧‧1st valve

821‧‧‧第2閥 821‧‧‧2nd valve

841‧‧‧第4閥 841‧‧‧4th valve

851‧‧‧第5閥 851‧‧‧5th valve

871‧‧‧第7閥 871‧‧‧7th valve

881‧‧‧第8閥 881‧‧‧8th valve

891‧‧‧第9閥 891‧‧‧9th valve

901‧‧‧第10閥 901‧‧‧10th valve

911‧‧‧第11閥 911‧‧‧11th valve

921‧‧‧第12閥 921‧‧‧12th valve

931‧‧‧第13閥 931‧‧‧13th valve

951‧‧‧第15閥 951‧‧‧15th valve

1511‧‧‧第1吸附塔 1511‧‧‧1st adsorption tower

1512‧‧‧第2吸附塔 1512‧‧‧2nd adsorption tower

1513‧‧‧第3吸附塔 1513‧‧‧3rd adsorption tower

2011‧‧‧第1吸附塔 2011‧‧‧1st adsorption tower

2012‧‧‧第2吸附塔 2012‧‧‧Second adsorption tower

2013‧‧‧第3吸附塔 2013‧‧‧3rd adsorption tower

2014‧‧‧第4吸附塔 2014‧‧‧4th adsorption tower

15111‧‧‧塔頂吸附層 15111‧‧‧ top adsorption layer

15112‧‧‧第1中間吸附層 15112‧‧‧1st intermediate adsorption layer

15113‧‧‧第2中間吸附層 15113‧‧‧2nd intermediate adsorption layer

15114‧‧‧塔底吸附層 15114‧‧‧ bottom adsorption layer

15121‧‧‧塔頂吸附層 15121‧‧‧ top adsorption layer

15122‧‧‧第1中間吸附層 15122‧‧‧1st intermediate adsorption layer

15123‧‧‧第2中間吸附層 15123‧‧‧2nd intermediate adsorption layer

15124‧‧‧塔底吸附層 15124‧‧‧ bottom adsorption layer

15131‧‧‧塔頂吸附層 15131‧‧‧ top adsorption layer

15132‧‧‧第1中間吸附層 15132‧‧‧1st intermediate adsorption layer

15133‧‧‧第2中間吸附層 15133‧‧‧2nd intermediate adsorption layer

15134‧‧‧塔底吸附層 15134‧‧‧ bottom adsorption layer

20111‧‧‧塔頂吸附層 20111‧‧‧ top adsorption layer

20112‧‧‧第1中間吸附層 20112‧‧‧1st intermediate adsorption layer

20113‧‧‧第2中間吸附層 20113‧‧‧2nd intermediate adsorption layer

20114‧‧‧第3中間吸附層 20114‧‧‧3rd intermediate adsorption layer

20115‧‧‧塔底吸附層 20115‧‧‧ bottom adsorption layer

20121‧‧‧塔頂吸附層 20121‧‧ ‧ top adsorption layer

20122‧‧‧第1中間吸附層 20122‧‧‧1st intermediate adsorption layer

20123‧‧‧第2中間吸附層 20123‧‧‧2nd intermediate adsorption layer

20124‧‧‧第3中間吸附層 20124‧‧‧3rd intermediate adsorption layer

20125‧‧‧塔底吸附層 20125‧‧‧ bottom adsorption layer

20131‧‧‧塔頂吸附層 20131‧‧‧ top adsorption layer

20132‧‧‧第1中間吸附層 20132‧‧‧1st intermediate adsorption layer

20133‧‧‧第2中間吸附層 20133‧‧‧2nd intermediate adsorption layer

20134‧‧‧第3中間吸附層 20134‧‧‧3rd intermediate adsorption layer

20135‧‧‧塔底吸附層 20135‧‧‧ bottom adsorption layer

20141‧‧‧塔頂吸附層 20141‧‧ ‧ top adsorption layer

20142‧‧‧第1中間吸附層 20142‧‧‧1st intermediate adsorption layer

20143‧‧‧第2中間吸附層 20143‧‧‧2nd intermediate adsorption layer

20144‧‧‧第3中間吸附層 20144‧‧‧3rd intermediate adsorption layer

20145‧‧‧塔底吸附層 20145‧‧‧ bottom adsorption layer

圖1係表示本發明之第1實施形態之氨純化系統100之構成的圖。 Fig. 1 is a view showing the configuration of an ammonia purification system 100 according to a first embodiment of the present invention.

圖2係表示本發明之第2實施形態之氨純化系統150之構成的圖。 Fig. 2 is a view showing the configuration of an ammonia purification system 150 according to a second embodiment of the present invention.

圖3係表示本發明之第3實施形態之氨純化系統200之構成的圖。 Fig. 3 is a view showing the configuration of an ammonia purification system 200 according to a third embodiment of the present invention.

圖4係表示本發明之第4實施形態之氨純化系統300之構成的圖。 Fig. 4 is a view showing the configuration of an ammonia purification system 300 according to a fourth embodiment of the present invention.

圖5係表示本發明之第5實施形態之氨純化系統400之構成的圖。 Fig. 5 is a view showing the configuration of an ammonia purification system 400 according to a fifth embodiment of the present invention.

1‧‧‧原料貯存槽 1‧‧‧Material storage tank

2‧‧‧氣化器 2‧‧‧ gasifier

3‧‧‧吸附單元 3‧‧‧Adsorption unit

4‧‧‧冷凝器 4‧‧‧Condenser

5‧‧‧回收槽 5‧‧‧Recycling tank

6‧‧‧填充裝置 6‧‧‧Filling device

31‧‧‧第1吸附塔 31‧‧‧1st adsorption tower

32‧‧‧第2吸附塔 32‧‧‧2nd adsorption tower

71‧‧‧流量調整器 71‧‧‧Flow Regulator

72‧‧‧冷卻液送液裝置 72‧‧‧Cooling liquid feeding device

80‧‧‧排氣配管 80‧‧‧Exhaust piping

80A‧‧‧排出配管 80A‧‧‧ discharge piping

81‧‧‧第1配管 81‧‧‧1st piping

82‧‧‧第2配管 82‧‧‧2nd piping

83‧‧‧第3配管 83‧‧‧3rd piping

84‧‧‧第4配管 84‧‧‧4th piping

85‧‧‧第5配管 85‧‧‧5th piping

86‧‧‧第6配管 86‧‧‧6th piping

87‧‧‧第7配管 87‧‧‧7th piping

88‧‧‧第8配管 88‧‧‧8th piping

89‧‧‧第9配管 89‧‧‧9th piping

90‧‧‧第10配管 90‧‧‧10th piping

91‧‧‧第11配管 91‧‧‧11th piping

92‧‧‧第12配管 92‧‧‧12th piping

93‧‧‧第13配管 93‧‧‧13th piping

94‧‧‧第14配管 94‧‧‧14th piping

95‧‧‧第15配管 95‧‧‧15th piping

100‧‧‧氨純化系統 100‧‧‧Ammonia Purification System

311‧‧‧塔頂吸附層 311‧‧‧ top adsorption layer

312‧‧‧第1中間吸附層 312‧‧‧1st intermediate adsorption layer

313‧‧‧第2中間吸附層 313‧‧‧2nd intermediate adsorption layer

314‧‧‧塔底吸附層 314‧‧‧ bottom adsorption layer

321‧‧‧塔頂吸附層 321‧‧‧ top adsorption layer

322‧‧‧第1中間吸附層 322‧‧‧1st intermediate adsorption layer

323‧‧‧第2中間吸附層 323‧‧‧2nd intermediate adsorption layer

324‧‧‧塔底吸附層 324‧‧‧ bottom adsorption layer

801‧‧‧排氣閥 801‧‧‧Exhaust valve

801A‧‧‧排出閥 801A‧‧‧ discharge valve

811‧‧‧第1閥 811‧‧‧1st valve

821‧‧‧第2閥 821‧‧‧2nd valve

841‧‧‧第4閥 841‧‧‧4th valve

851‧‧‧第5閥 851‧‧‧5th valve

871‧‧‧第7閥 871‧‧‧7th valve

881‧‧‧第8閥 881‧‧‧8th valve

891‧‧‧第9閥 891‧‧‧9th valve

901‧‧‧第10閥 901‧‧‧10th valve

911‧‧‧第11閥 911‧‧‧11th valve

921‧‧‧第12閥 921‧‧‧12th valve

931‧‧‧第13閥 931‧‧‧13th valve

951‧‧‧第15閥 951‧‧‧15th valve

Claims (5)

一種氨純化系統,其係將含有雜質之粗氨純化者,其特徵在於包括:貯存部,其貯存粗氨,並將其所貯存之粗氨導出;吸附部,其藉由選自活性碳、親水性沸石、疏水性沸石、矽膠、及活性氧化鋁中之吸附劑將自上述貯存部導出之粗氨中所含之雜質吸附去除而純化,並將經純化之氨導出,該吸附部包含一個或複數個吸附部分,該吸附部分係沿粗氨之流動方向積層有:第1吸附劑層,其含有第1吸附劑,複數層第2吸附劑層,其含有種類與上述第1吸附劑不同之第2吸附劑,及第3吸附劑層,其含有種類與上述第2吸附劑不同之第3吸附劑;以及分凝部,其將自上述吸附部導出之經純化之氨分凝而分離為氣相成分與液相成分,藉此將揮發性較高之雜質以氣相成分之形式分離去除,以液相成分之形式獲得經純化之液體狀之氨。 An ammonia purification system for purifying crude ammonia containing impurities, comprising: a storage portion for storing crude ammonia and discharging the stored crude ammonia; and an adsorption portion selected from activated carbon, The adsorbent in the hydrophilic zeolite, the hydrophobic zeolite, the tannin extract, and the activated alumina is purified by adsorbing and removing impurities contained in the crude ammonia derived from the storage portion, and purifying the purified ammonia, and the adsorption portion includes a Or a plurality of adsorption portions, wherein the adsorption portion is laminated along the flow direction of the crude ammonia: a first adsorbent layer containing a first adsorbent, and a plurality of second adsorbent layers having a different species than the first adsorbent a second adsorbent and a third adsorbent layer containing a third adsorbent different in type from the second adsorbent; and a partial condensation unit that separates and purifies the purified ammonia derived from the adsorption unit It is a gas phase component and a liquid phase component, whereby impurities with higher volatility are separated and removed in the form of a gas phase component, and purified liquid ammonia is obtained in the form of a liquid phase component. 如請求項1之氨純化系統,其進而包括氣化部,其將自上述貯存部導出之液體狀之粗氨的一部分氣化,並導出氣體狀之氨,且上述吸附部藉由上述吸附部分將自上述氣化部導出之氣體狀之氨中所含的雜質吸附去除。 The ammonia purification system of claim 1, further comprising a gasification portion that vaporizes a portion of the liquid crude ammonia derived from the storage portion, and derives gaseous ammonia, and the adsorption portion passes through the adsorption portion The impurities contained in the gaseous ammonia derived from the vaporization section are adsorbed and removed. 如請求項1之氨純化系統,其中 上述第1吸附劑為對水具有較高之吸附能力的吸附劑,上述第2吸附劑為對碳數未達5之有機化合物具有較高之吸附能力的吸附劑,上述第3吸附劑為對碳數5以上之有機化合物及水具有較高之吸附能力的吸附劑。 An ammonia purification system as claimed in claim 1, wherein The first adsorbent is an adsorbent having a high adsorption capacity for water, and the second adsorbent is an adsorbent having a high adsorption capacity for an organic compound having a carbon number of less than 5, and the third adsorbent is a pair. An organic compound having a carbon number of 5 or more and an adsorbent having a high adsorption capacity with water. 如請求項1之氨純化系統,其中上述吸附部分係自粗氨之流動方向上游側向下游側依序積層有上述第1吸附劑層、上述複數層第2吸附劑層、及上述第3吸附劑層。 The ammonia purification system according to claim 1, wherein the adsorption portion sequentially deposits the first adsorbent layer, the plurality of second adsorbent layers, and the third adsorbent from the upstream side to the downstream side in the flow direction of the crude ammonia. Agent layer. 如請求項1之氨純化系統,其中上述吸附部包含複數個上述吸附部分,複數個吸附部分係串列或並列地連接。 The ammonia purification system of claim 1, wherein the adsorption portion comprises a plurality of the adsorption portions, and the plurality of adsorption portions are connected in series or in parallel.
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