TW201346001A - Adhesive sheet used in dicing - Google Patents

Adhesive sheet used in dicing Download PDF

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TW201346001A
TW201346001A TW102106572A TW102106572A TW201346001A TW 201346001 A TW201346001 A TW 201346001A TW 102106572 A TW102106572 A TW 102106572A TW 102106572 A TW102106572 A TW 102106572A TW 201346001 A TW201346001 A TW 201346001A
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adhesive layer
dicing
adhesive sheet
adhesive
butene
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TW102106572A
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Chinese (zh)
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Toshimasa Sugimura
Takashi Habu
Katsutoshi Kamei
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Nitto Denko Corp
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Abstract

The present invention provides an adhesive sheet used in dicing, which can suppress the production of cutting scraps and debris in a dicing step. The adhesive sheet used in dicing according to the present invention has an adhesive layer containing amorphous propylene-(1-butene) copolymer. The weight average molecular weight (Mw) of the amorphous propylene-(1-butene) copolymer is 200,000 or more. The molecular weight distribution (Mw/Mn) of the amorphous propylene-(1-butene) copolymer is 3 or less. In a preferred embodiment, the adhesive layer further contains a crystalline polypropylene-based resin.

Description

切割用黏著片 Cutting adhesive sheet

本發明係關於一種切割用黏著片。 The present invention relates to an adhesive sheet for cutting.

包含矽、鎵、砷等之半導體晶圓係以大直徑狀態而製造,於在表面形成圖案後對背面進行研削,通常,使晶圓之厚度薄至100~600 μm左右,進而切割分離(dicing)為元件小片(半導體晶片),進而轉移至安裝步驟。於此種半導體晶圓之製造步驟中,廣泛使用黏著片。例如,於切割步驟中,為了固定半導體晶圓而使用切割用黏著片。 Semiconductor wafers containing germanium, gallium, arsenic, etc. are manufactured in a large diameter state, and the back surface is ground after patterning on the surface. Usually, the thickness of the wafer is as thin as about 100 to 600 μm, and then the cutting is separated (dicing). ) is a small piece of the component (semiconductor wafer) and then transferred to the mounting step. Adhesive sheets are widely used in the manufacturing steps of such semiconductor wafers. For example, in the dicing step, a dicing adhesive sheet is used in order to fix the semiconductor wafer.

切割步驟中通常利用切割刀片切割半導體晶圓。此時,若自切割用黏著片產生切削屑,則該切削屑污染半導體晶片及其他構件,降低電子零件之可靠性及良率。作為使自切割用黏著片產生之切削屑減少之技術,提出有如下者:藉由使用具有特定構造且具有高熔點之烯烴系熱塑性彈性體作為基材膜,而減少來自基材膜之切削屑(專利文獻1)。但,即便使用此種技術,仍無法消除黏著劑由切割刀片帶出而產生之來自黏著劑的切削屑。又,提出有具備高彈性模數之黏接著劑層之切割用黏著片(專利文獻2)。但,即便於該技術中,切削屑之減少效果亦不充分。又,高彈性模數之黏接著劑層不具有充分之黏著力,該技術中該問題亦無法解決。 The semiconductor wafer is typically cut using a dicing blade during the dicing step. At this time, if the chips are generated from the adhesive sheet for cutting, the chips contaminate the semiconductor wafer and other members, and the reliability and yield of the electronic parts are reduced. As a technique for reducing the amount of chips generated from the adhesive sheet for dicing, it is proposed to reduce chipping from the substrate film by using an olefin-based thermoplastic elastomer having a specific structure and having a high melting point as a base film. (Patent Document 1). However, even with this technique, it is impossible to eliminate the chips from the adhesive which are generated by the adhesive blade being taken out by the cutting blade. Further, an adhesive sheet for dicing having a high elastic modulus adhesive layer has been proposed (Patent Document 2). However, even in this technique, the reduction effect of the chips is insufficient. Moreover, the adhesive layer of high modulus of elasticity does not have sufficient adhesion, and this problem cannot be solved in this technique.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2003-7654號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-7654

[專利文獻2]日本專利特開2005-159069號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2005-159069

本發明係為了解決上述先前之課題而完成者,其目的在於提供一種切割步驟中切削屑之產生受到抑制之切割用黏著片。 The present invention has been made to solve the above-mentioned problems, and an object of the invention is to provide a cutting adhesive sheet in which generation of chips is suppressed in a cutting step.

本發明之切割用黏著片具備包含非晶質丙烯-(1-丁烯)共聚物之黏著劑層,且該非晶質丙烯-(1-丁烯)共聚物之重量平均分子量(Mw)為200,000以上,該丙烯-(1-丁烯)共聚物之分子量分佈(Mw/Mn)為3以下。 The dicing adhesive sheet of the present invention comprises an adhesive layer containing an amorphous propylene-(1-butene) copolymer, and the amorphous propylene-(1-butene) copolymer has a weight average molecular weight (Mw) of 200,000. As described above, the propylene-(1-butene) copolymer has a molecular weight distribution (Mw/Mn) of 3 or less.

於較佳之實施形態中,上述黏著劑層進而包含結晶性聚丙烯系樹脂。 In a preferred embodiment, the adhesive layer further contains a crystalline polypropylene resin.

於較佳之實施形態中,上述結晶性聚丙烯系樹脂之含有比率為相對於上述非晶質丙烯-(1-丁烯)共聚物與該結晶性聚丙烯系樹脂的合計量為50重量%以下。 In a preferred embodiment, the content ratio of the crystalline polypropylene-based resin is 50% by weight or less based on the total amount of the amorphous propylene-(1-butene) copolymer and the crystalline polypropylene-based resin. .

於較佳之實施形態中,上述黏著劑層於20℃下之貯存模數(G')為0.5×106 Pa~1.0×108 Pa。 In a preferred embodiment, the adhesive layer has a storage modulus (G') at 20 ° C of 0.5 × 10 6 Pa to 1.0 × 10 8 Pa.

於較佳之實施形態中,本發明之切割用黏著片進而具備基材層。 In a preferred embodiment, the dicing adhesive sheet of the present invention further comprises a substrate layer.

於較佳之實施形態中,上述基材層之厚度相對於上述黏著劑層與該基材層之合計厚度為10%~90%。 In a preferred embodiment, the thickness of the base material layer is 10% to 90% with respect to the total thickness of the adhesive layer and the base material layer.

於較佳之實施形態中,本發明之切割用黏著片係將上述黏著劑層與上述基材層一次性成形而得到。 In a preferred embodiment, the adhesive sheet for dicing of the present invention is obtained by molding the above-mentioned adhesive layer and the base material layer at one time.

根據本發明,藉由具備包含具有特定重量平均分子量及分子量分佈之非晶質丙烯-(1-丁烯)共聚物的黏著劑層,可提供切割步驟中切削屑之產生受到抑制之切割用黏著片。 According to the present invention, by providing an adhesive layer containing an amorphous propylene-(1-butene) copolymer having a specific weight average molecular weight and a molecular weight distribution, it is possible to provide a cutting adhesive which is suppressed in the generation of chips during the cutting step. sheet.

10‧‧‧黏著劑層 10‧‧‧Adhesive layer

20‧‧‧基材層 20‧‧‧Substrate layer

100‧‧‧切割用黏著片 100‧‧‧Cut adhesive sheets

圖1係本發明之較佳實施形態之切割用黏著片的概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing a cutting adhesive sheet according to a preferred embodiment of the present invention.

A.切割用黏著片之整體構成 A. The overall composition of the adhesive sheet for cutting

圖1係本發明之較佳實施形態之切割用黏著片的概略剖面圖。切割用黏著片100具備黏著劑層10。黏著劑層10包含非晶質丙烯-(1-丁烯)共聚物。本發明之切割用黏著片既可為黏著劑層10之單層片,亦可如圖1所示進而具備基材層20。 Fig. 1 is a schematic cross-sectional view showing a cutting adhesive sheet according to a preferred embodiment of the present invention. The adhesive sheet 100 for dicing has the adhesive layer 10. The adhesive layer 10 contains an amorphous propylene-(1-butene) copolymer. The dicing adhesive sheet of the present invention may be a single layer sheet of the adhesive layer 10, or may further include a base material layer 20 as shown in FIG.

切割用黏著片100之厚度較佳為50 μm~300 μm,進而較佳為75 μm~200 μm,尤佳為75 μm~125 μm。 The thickness of the adhesive sheet 100 for cutting is preferably 50 μm to 300 μm, more preferably 75 μm to 200 μm, and particularly preferably 75 μm to 125 μm.

黏著劑層10之厚度較佳為10 μm~300 μm,進而較佳為15 μm~150 μm,尤佳為30 μm~100 μm。切割用黏著片不具備基材層之情形時,黏著劑層之厚度較佳為50 μm~300 μm,進而較佳為75 μm~200 μm,尤佳為75 μm~125 μm。切割用黏著片100具備基材層20之情形時,黏著劑層10之厚度較佳為10 μm~150 μm,進而較佳為15 μm~100 μm,尤佳為15 μm~50 μm,最佳為30 μm~50 μm。本發明之切割用黏著片中,即便增厚黏著劑層之厚度,亦可抑制碎屑(半導體晶片之碎片)之產生。又,由於可增厚黏著劑層之厚度,故而若使用本發明之切割用黏著片,則可不將切痕切入至基材層而進行切割步驟,其結果為,可防止來自基材層之切削屑之產生。 The thickness of the adhesive layer 10 is preferably from 10 μm to 300 μm, more preferably from 15 μm to 150 μm, and even more preferably from 30 μm to 100 μm. When the adhesive sheet for dicing does not have a substrate layer, the thickness of the adhesive layer is preferably from 50 μm to 300 μm, more preferably from 75 μm to 200 μm, and particularly preferably from 75 μm to 125 μm. When the adhesive sheet 100 for dicing is provided with the base material layer 20, the thickness of the adhesive layer 10 is preferably 10 μm to 150 μm, more preferably 15 μm to 100 μm, and particularly preferably 15 μm to 50 μm. It is 30 μm~50 μm. In the adhesive sheet for dicing of the present invention, even if the thickness of the adhesive layer is increased, the generation of debris (fragments of the semiconductor wafer) can be suppressed. Further, since the thickness of the adhesive layer can be increased, when the adhesive sheet for dicing of the present invention is used, the cutting step can be performed without cutting the cut into the substrate layer, and as a result, cutting from the substrate layer can be prevented. The production of chips.

基材層20之厚度較佳為10 μm~150 μm,進而較佳為20 μm~100 μm。 The thickness of the substrate layer 20 is preferably from 10 μm to 150 μm, and more preferably from 20 μm to 100 μm.

基材層20之厚度相對於黏著劑層10與基材層20之合計厚度,較佳為10%~90%,進而較佳為15%~80%。 The thickness of the base material layer 20 is preferably from 10% to 90%, and more preferably from 15% to 80%, based on the total thickness of the adhesive layer 10 and the base material layer 20.

本發明之切割用黏著片進而可具備任意適當之其他層。作為其他層,例如可列舉於基材層之與黏著劑層相反側具備之、可對切割用黏 著片賦予耐熱性之表面層。又,於黏著劑層之與基材層相反側亦可具備接著劑層。本發明之切割用黏著片具備接著劑層之情形時,切割後之半導體晶片剝離時,將接著劑層自黏著劑層剝離(即,將接著劑層與半導體晶片剝離)。該接著劑層係作為將晶片安裝於基板上時之接著劑層、或作為將晶片多級積層時晶片間之接著劑而發揮作用。作為接著劑層中之接著劑,可使用先前公知之半導體用接著劑。 The dicing adhesive sheet of the present invention may further comprise any other suitable layer. The other layer may be, for example, a base layer which is provided on the opposite side of the adhesive layer and which is viscous for cutting. The sheet is provided with a surface layer that imparts heat resistance. Further, an adhesive layer may be provided on the side opposite to the base material layer of the adhesive layer. In the case where the dicing adhesive sheet of the present invention has an adhesive layer, when the diced semiconductor wafer is peeled off, the adhesive layer is peeled off from the adhesive layer (that is, the adhesive layer is peeled off from the semiconductor wafer). The adhesive layer functions as an adhesive layer when the wafer is mounted on the substrate or as an adhesive between the wafers when the wafer is stacked in multiple layers. As the adhesive in the adhesive layer, a previously known semiconductor adhesive can be used.

本發明之切割用黏著片可由隔片保護而提供。本發明之切割用黏著片可於由隔片保護之狀態下捲取為卷狀。隔片具有作為保護切割用黏著片直至供於實際使用前之保護材料的功能。作為隔片,例如可列舉經矽系剝離劑、氟系剝離劑、長鏈烷基丙烯酸酯系剝離劑等剝離劑進行表面塗佈之塑膠(例如,聚對苯二甲酸乙二酯(PET)、聚乙烯、聚丙烯)膜、不織布或紙等。 The dicing adhesive sheet of the present invention can be provided by a separator. The dicing adhesive sheet of the present invention can be wound into a roll shape in a state protected by a separator. The separator has a function as a protective sheet for protecting the cutting adhesive sheet until it is supplied for practical use. Examples of the separator include a plastic coated with a release agent such as a bismuth release agent, a fluorine release agent, or a long-chain alkyl acrylate release agent (for example, polyethylene terephthalate (PET). , polyethylene, polypropylene) film, non-woven fabric or paper.

本發明之切割用黏著片例如於不受隔片保護之情形時,亦可對與黏著劑層相反側之最外層進行背面處理。背面處理例如可使用矽系剝離劑、長鏈烷基丙烯酸酯系剝離劑等剝離劑進行。本發明之切割用黏著片藉由進行背面處理,可捲取為卷狀。 When the adhesive sheet for dicing of the present invention is not protected by the separator, for example, the outermost layer on the side opposite to the adhesive layer may be subjected to back treatment. The back surface treatment can be carried out, for example, using a release agent such as a ruthenium release agent or a long-chain alkyl acrylate release agent. The adhesive sheet for dicing of the present invention can be wound into a roll shape by performing back surface treatment.

B.黏著劑層 B. Adhesive layer

上述黏著劑層包含非晶質丙烯-(1-丁烯)共聚物。本發明之切割用黏著片藉由具備此種黏著劑層,而可抑制切割步驟中產生來自黏著劑層之切削屑。又,即便由於包含非晶質丙烯-(1-丁烯)共聚物而增厚黏著劑層之厚度,亦可抑制碎屑之產生。進而,由於可增厚黏著劑層之厚度,故而若使用本發明之切割用黏著片,則可不將切痕切入至基材層而進行切割步驟,其結果為,可防止來自基材層之切削屑之產生。再者,本說明書中,「非晶質」係指不具有如結晶質般明確之熔點的性質。 The above adhesive layer contains an amorphous propylene-(1-butene) copolymer. The adhesive sheet for dicing of the present invention can suppress the generation of chips from the adhesive layer in the cutting step by providing such an adhesive layer. Further, even if the thickness of the adhesive layer is increased by the inclusion of the amorphous propylene-(1-butene) copolymer, the generation of chips can be suppressed. Further, since the thickness of the adhesive layer can be increased, when the adhesive sheet for dicing of the present invention is used, the cutting step can be performed without cutting the cut into the substrate layer, and as a result, cutting from the substrate layer can be prevented. The production of chips. In the present specification, "amorphous" means a property which does not have a melting point as defined by crystallinity.

上述黏著劑層可為單層,亦可為包含成分含有比例(例如,非晶 質丙烯-(1-丁烯)共聚物及/或結晶性聚丙烯系樹脂(後述)之含有比例)不同之層的多層體。 The above adhesive layer may be a single layer or may contain a component containing ratio (for example, amorphous A multilayered body of a layer having a different propylene-(1-butene) copolymer and/or a crystalline polypropylene-based resin (described later).

如上所述,關於本申請案之切割用黏著片抑制切割步驟中來自黏著劑層之切削屑,推測其機制如下。切割步驟中來自黏著劑層之切削屑可認為是黏著劑層受加熱、其後藉由受冷卻而產生之來自黏著劑層的分離物。此處,加熱具體而言係指由與刀片之摩擦而產生之熱,由於該熱而黏著劑層被急劇加熱。上述冷卻具體而言係指利用冷卻水進行之冷卻。先前之切割用黏著片之黏著劑(例如丙烯酸系黏著劑)為確保凝聚性而由交聯之樹脂構成,藉由上述加熱而軟化但不具有流動性。因此,切割時,具有凝聚性之黏著劑被刀片帶出而附著於半導體晶片上,冷卻而以來自黏著劑層之切削屑之形式殘留於半導體晶片上。另一方面,本發明之切割用黏著片之黏著劑層具有非晶質丙烯-(1-丁烯)共聚物,即便不使其交聯,亦可確保所需之凝聚力。本發明之切割用黏著片之黏著劑層未以交聯之樹脂為主成分,因而藉由上述加熱,而黏著劑層具有流動性,並且推斷於切割時其被排出至體系外。其結果為,推斷不產生來自黏著劑層之切削屑而可防止半導體晶片之污染。 As described above, the dicing adhesive sheet of the present application suppresses the chips from the adhesive layer in the cutting step, and the mechanism is presumed as follows. The chips from the adhesive layer in the cutting step can be considered as the separator from the adhesive layer which is heated by the adhesive layer and then cooled by cooling. Here, heating specifically refers to heat generated by friction with a blade, and the adhesive layer is rapidly heated due to the heat. The above cooling specifically refers to cooling by cooling water. The adhesive for the previous adhesive sheet for dicing (for example, an acrylic adhesive) is composed of a crosslinked resin for ensuring cohesiveness, and is softened by the above heating without fluidity. Therefore, at the time of dicing, the cohesive adhesive is carried out by the blade and adheres to the semiconductor wafer, and is cooled to remain on the semiconductor wafer in the form of chips from the adhesive layer. On the other hand, the adhesive layer of the dicing adhesive sheet of the present invention has an amorphous propylene-(1-butene) copolymer, and the desired cohesive force can be ensured even without crosslinking. Since the adhesive layer of the dicing adhesive sheet of the present invention is not mainly composed of a crosslinked resin, the adhesive layer has fluidity by the above heating, and it is estimated that it is discharged to the outside of the system at the time of cutting. As a result, it is estimated that contamination of the semiconductor wafer can be prevented without generating chips from the adhesive layer.

上述非晶質丙烯-(1-丁烯)共聚物之分子量分佈(Mw/Mn)為3以下,較佳為2以下,進而較佳為1.1~2,尤佳為1.2~1.9。分子量分佈(Mw/Mn)處於此範圍之非晶質丙烯-(1-丁烯)共聚物低分子量成分較少,因而本發明之切割用黏著片係切割步驟中來自黏著劑層之切削屑之產生受到抑制,且耐碎屑性(半導體晶片碎片之抑制性)優異。又,可防止由低分子量成分之滲出造成之半導體晶片的污染。 The amorphous propylene-(1-butene) copolymer has a molecular weight distribution (Mw/Mn) of 3 or less, preferably 2 or less, more preferably 1.1 to 2, and still more preferably 1.2 to 1.9. The amorphous propylene-(1-butene) copolymer having a molecular weight distribution (Mw/Mn) in this range has a small amount of low molecular weight components, and thus the cutting adhesive sheet of the present invention has a cutting chip from the adhesive layer in the cutting step. The generation is suppressed, and the chipping resistance (inhibition of semiconductor wafer chips) is excellent. Further, contamination of the semiconductor wafer caused by bleeding of the low molecular weight component can be prevented.

上述非晶質丙烯-(1-丁烯)共聚物之重量平均分子量(Mw)為200,000以上,較佳為200,000~500,000,進而較佳為200,000~300,000。若處於此範圍內,則可獲得切割步驟中來自黏著劑層之切 削屑之產生受到抑制、且耐碎屑性優異的切割用黏著片。又,可防止由低分子量成分之滲出造成之半導體晶片的污染。進而,切割用黏著片之成形中採用共擠出成形時,可無加工不良地形成黏著劑層。再者,具備包含具有上述範圍之重量平均分子量(Mw)之非晶質丙烯-(1-丁烯)共聚物之黏著劑層的切割用黏著片,即便不具備基材層,亦具有可供於實際使用之處理性。 The amorphous propylene-(1-butene) copolymer has a weight average molecular weight (Mw) of 200,000 or more, preferably 200,000 to 500,000, more preferably 200,000 to 300,000. If it is within this range, the cut from the adhesive layer in the cutting step can be obtained. A cutting adhesive sheet which is suppressed in the generation of shavings and is excellent in chipping resistance. Further, contamination of the semiconductor wafer caused by bleeding of the low molecular weight component can be prevented. Further, when co-extrusion molding is used for forming the dicing adhesive sheet, the adhesive layer can be formed without processing. Further, the adhesive sheet for dicing having an adhesive layer containing an amorphous propylene-(1-butene) copolymer having a weight average molecular weight (Mw) in the above range is available without a base material layer. Rational in the actual use.

上述非晶質丙烯-(1-丁烯)共聚物係只要可獲得上述所需之特性,則可使用任意適當之共聚物。較佳為使用藉由使用茂金屬觸媒使丙烯與1-丁烯聚合而得到之非晶質丙烯-(1-丁烯)共聚物。此種非晶質丙烯-(1-丁烯)共聚物例如可藉由如下方式而獲得:進行使用茂金屬觸媒使丙烯與1-丁烯聚合之聚合步驟,於該聚合步驟後,進行殘留觸媒去除步驟、異物去除步驟等後處理步驟。該非晶質丙烯-(1-丁烯)共聚物經過上述步驟,例如可以粉末狀、顆粒狀等形狀而獲得。作為茂金屬觸媒,例如可列舉:包含茂金屬化合物與鋁氧烷之茂金屬均勻混合觸媒、於微粒狀之載體上載持有茂金屬化合物之茂金屬載持型觸媒等。 The amorphous propylene-(1-butene) copolymer may be any suitable copolymer as long as the desired properties are obtained. An amorphous propylene-(1-butene) copolymer obtained by polymerizing propylene with 1-butene by using a metallocene catalyst is preferably used. Such an amorphous propylene-(1-butene) copolymer can be obtained, for example, by carrying out a polymerization step of polymerizing propylene and 1-butene using a metallocene catalyst, after which the residue is carried out. Post-processing steps such as a catalyst removal step and a foreign matter removal step. The amorphous propylene-(1-butene) copolymer can be obtained, for example, in the form of a powder or a pellet by the above steps. Examples of the metallocene catalyst include a metallocene-supporting catalyst containing a metallocene compound and a metallocene uniformly mixed with a catalyst, and a metallocene-supporting catalyst having a metallocene compound supported on a particulate carrier.

上述非晶質丙烯-(1-丁烯)共聚物中,來自丙烯之構成單元之含有比率較佳為80 mol%~99 mol%,進而較佳為85 mol%~99 mol%,尤佳為90 mol%~99 mol%。 In the amorphous propylene-(1-butene) copolymer, the content ratio of the constituent unit derived from propylene is preferably from 80 mol% to 99 mol%, more preferably from 85 mol% to 99 mol%, particularly preferably 90 mol% to 99 mol%.

上述非晶質丙烯-(1-丁烯)共聚物中,來自1-丁烯之構成單元之含有比率較佳為1 mol%~15 mol%,進而較佳為1 mol%~10 mol%。若處於此種範圍內,則可獲得韌性與柔軟性之平衡優異、對凹凸面之追隨性優異之切割用黏著片。 In the amorphous propylene-(1-butene) copolymer, the content ratio of the constituent unit derived from 1-butene is preferably from 1 mol% to 15 mol%, more preferably from 1 mol% to 10 mol%. When it is in such a range, it is excellent in the balance of a toughness and a softness, and the adhesive sheet for cutting which is excellent in the followability of the uneven surface.

上述非晶質丙烯-(1-丁烯)共聚物可為嵌段共聚物,亦可為無規共聚物。 The above amorphous propylene-(1-butene) copolymer may be a block copolymer or a random copolymer.

上述非晶質丙烯-(1-丁烯)共聚物之於230℃、2.16 kgf時之熔融流動速率較佳為1 g/10 min~50 g/10 min,進而較佳為5 g/10 min~30 g/10 min,尤佳為5 g/10 min~20 g/10 min。若非晶質丙烯-(1-丁烯)共聚物之熔融流動速率處於此範圍內,則可成形性良好地形成黏著劑層,例如,切割用黏著片之成形中採用共擠出成形時,可無加工不良地形成厚度均勻之黏著劑層。熔融流動速率可利用依據JISK7210之方法進行測定。 The melt flow rate of the amorphous propylene-(1-butene) copolymer at 230 ° C and 2.16 kgf is preferably from 1 g/10 min to 50 g/10 min, and further preferably 5 g/10 min. ~30 g/10 min, especially 5 g/10 min~20 g/10 min. When the melt flow rate of the amorphous propylene-(1-butene) copolymer is within this range, the adhesive layer can be formed with good formability. For example, when co-extrusion molding is used for forming the adhesive sheet for dicing, An adhesive layer having a uniform thickness is formed without processing. The melt flow rate can be measured by the method according to JIS K7210.

上述非晶質丙烯-(1-丁烯)共聚物亦可以無損本發明之效果之範圍進而包含來自其他單體之構成單元。作為其他單體,例如可列舉:乙烯、1-戊烯、1-己烯、1-辛烯、1-癸烯、4-甲基-1-戊烯、3-甲基-1-戊烯等α-烯烴。 The amorphous propylene-(1-butene) copolymer may also contain constituent units derived from other monomers without departing from the effects of the present invention. Examples of the other monomer include ethylene, 1-pentene, 1-hexene, 1-octene, 1-decene, 4-methyl-1-pentene, and 3-methyl-1-pentene. And other alpha-olefins.

上述黏著劑層較佳為進而包含結晶性聚丙烯系樹脂。藉由包含結晶性聚丙烯系樹脂,可使黏著劑層之貯存模數增加。其結果為,可提高切割用黏著片之耐碎屑性。又,可獲得處理性優異之切割用黏著片。此種切割用黏著片即便不具備基材層處理性亦優異。進而,藉由包含結晶性聚丙烯系樹脂,可使黏著劑層之黏著力降低而獲得黏著力與剝離性之平衡優異之切割用黏著片。 The pressure-sensitive adhesive layer preferably further contains a crystalline polypropylene resin. By including a crystalline polypropylene-based resin, the storage modulus of the adhesive layer can be increased. As a result, the chipping resistance of the adhesive sheet for dicing can be improved. Further, an adhesive sheet for dicing excellent in handleability can be obtained. Such an adhesive sheet for dicing is excellent even if it does not have the handleability of a base material layer. Further, by including the crystalline polypropylene-based resin, the adhesive strength of the adhesive layer can be lowered to obtain a dicing adhesive sheet excellent in balance between adhesive strength and peelability.

上述結晶性聚丙烯系樹脂之含有比率較佳為相對於上述非晶質丙烯-(1-丁烯)共聚物與該結晶性聚丙烯系樹脂之合計重量,較佳為50重量%以下,進而較佳為40重量%以下,尤佳為30重量%以下。若處於此範圍,則可抑制切割步驟中來自黏著劑層之切削屑之產生,且可提高耐碎屑性。又,可獲得黏著力與剝離性之平衡優異之切割用黏著片,即,於切割時可充分固定半導體晶圓、於拾取半導體晶片時可容易地剝離之切割用黏著片。另一方面,若上述結晶性聚丙烯系樹脂之含有比率多於50重量%,則黏著劑層之貯存數数(G')提高,可提高耐碎屑性,但有黏著力降低、晶片之保持性降低之虞。 The content ratio of the crystalline polypropylene-based resin is preferably 50% by weight or less based on the total weight of the amorphous propylene-(1-butene) copolymer and the crystalline polypropylene-based resin. It is preferably 40% by weight or less, and particularly preferably 30% by weight or less. If it is in this range, the generation of chips from the adhesive layer in the cutting step can be suppressed, and the chipping resistance can be improved. Moreover, the dicing adhesive sheet which is excellent in the balance of adhesive force and peeling property, ie, the dicing adhesive sheet which can fully fix a semiconductor wafer at the time of dicing, and can be easily peeled off when picking up a semiconductor wafer is obtained. On the other hand, when the content ratio of the crystalline polypropylene-based resin is more than 50% by weight, the storage number (G') of the adhesive layer is improved, and the chipping resistance can be improved, but the adhesion is lowered, and the wafer is The maintenance is reduced.

上述結晶性聚丙烯系樹脂可為均聚丙烯,亦可為由丙烯和可與丙烯共聚合之單體得到之共聚物。作為可與丙烯共聚合之單體,例如 可列舉:乙烯、1-戊烯、1-己烯、1-辛烯、1-癸烯、4-甲基-1-戊烯、3-甲基-1-戊烯等α-烯烴等。 The above crystalline polypropylene-based resin may be a homopolypropylene or a copolymer obtained from a monomer copolymerizable with propylene and propylene. As a monomer copolymerizable with propylene, for example Examples thereof include α-olefins such as ethylene, 1-pentene, 1-hexene, 1-octene, 1-decene, 4-methyl-1-pentene, and 3-methyl-1-pentene.

上述結晶性聚丙烯系樹脂較佳為與上述非晶質丙烯-(1-丁烯)共聚物同樣地藉由使用茂金屬觸媒進行聚合而得到。若使用以此種方式得到之結晶性聚丙烯系樹脂,則可防止因低分子量成分之滲出而對半導體晶片造成污染。 The crystalline polypropylene-based resin is preferably obtained by polymerization using a metallocene catalyst as in the case of the amorphous propylene-(1-butene) copolymer. When the crystalline polypropylene-based resin obtained in this manner is used, contamination of the semiconductor wafer due to bleeding of the low molecular weight component can be prevented.

上述結晶性聚丙烯系樹脂之結晶度較佳為10%以上,進而較佳為20%以上。結晶度代表性地係利用差示掃描熱量分析(DSC)或X射線繞射而求得。 The crystallinity of the crystalline polypropylene-based resin is preferably 10% or more, and more preferably 20% or more. The degree of crystallinity is typically determined by differential scanning calorimetry (DSC) or X-ray diffraction.

上述黏著劑層於20℃下之貯存模數(G')較佳為0.5×106 Pa~1.0×108 Pa,進而較佳為1.0×106 Pa~8.0×107 Pa,尤佳為1.5×106 Pa~5.0×107 Pa。本發明之切割用黏著片具有處於此範圍之貯存模數(G'),並且黏著力與剝離性之平衡優異。若上述黏著劑層之貯存模數(G')處於上述範圍,則可獲得耐碎屑性優異、且具有充分黏著力之切割用黏著片。更詳細而言,若上述黏著劑層之貯存模數(G')為0.5×106 Pa以上,則可抑制切割時之黏著劑層之振動,防止碎屑之產生。又,若上述黏著劑層之貯存模數(G')為1.0×108 Pa以下,則具有充分之黏著力,可於切割時良好地固定半導體晶圓(晶片),防止晶片飛散。又,若上述黏著劑層之貯存模數(G')處於上述範圍,則可獲得處理性優異之切割用黏著片。進而,即便於半導體晶圓表面具有凹凸之情形時,亦可獲得可追隨該凹凸之切割用黏著片。若使用此種切割用黏著片,則可防止於切割步驟中由切削水造成半導體晶片之污染。再者,本發明中之貯存模數(G')可藉由動態黏彈性光譜測定而進行測定。 The storage modulus (G') of the above adhesive layer at 20 ° C is preferably from 0.5 × 10 6 Pa to 1.0 × 10 8 Pa, more preferably from 1.0 × 10 6 Pa to 8.0 × 10 7 Pa, particularly preferably 1.5 × 10 6 Pa ~ 5.0 × 10 7 Pa. The dicing adhesive sheet of the present invention has a storage modulus (G') in this range, and is excellent in balance between adhesion and peelability. When the storage modulus (G') of the pressure-sensitive adhesive layer is in the above range, a cutting adhesive sheet excellent in chipping resistance and having sufficient adhesion can be obtained. More specifically, when the storage modulus (G') of the pressure-sensitive adhesive layer is 0.5 × 10 6 Pa or more, the vibration of the adhesive layer during dicing can be suppressed and the generation of debris can be prevented. Further, when the storage modulus (G') of the pressure-sensitive adhesive layer is 1.0 × 10 8 Pa or less, it has sufficient adhesion, and the semiconductor wafer (wafer) can be satisfactorily fixed at the time of dicing to prevent the wafer from scattering. In addition, when the storage modulus (G') of the pressure-sensitive adhesive layer is in the above range, a cutting adhesive sheet excellent in handleability can be obtained. Further, even when the surface of the semiconductor wafer has irregularities, an adhesive sheet for cutting which can follow the irregularities can be obtained. If such an adhesive sheet for cutting is used, contamination of the semiconductor wafer by the cutting water during the cutting step can be prevented. Further, the storage modulus (G') in the present invention can be measured by dynamic viscoelastic spectroscopy.

上述黏著劑層之黏著力較佳為0.3 N/20 mm~3.0 N/20 mm,進而較佳為0.4 N/20 mm~2.5 N/20 mm,尤佳為0.4 N/20 mm~2.0 N/20 mm,最佳為0.9 N/20 mm~2.0 N/20 mm。若處於此種範圍內,則可 獲得黏著力與剝離性之平衡優異之切割用黏著片。再者,於本說明書中,黏著劑層之黏著力係指將本發明之切割用黏著片以50℃熟化2天後,以半導體鏡面晶圓(矽製造)作為試驗板,並利用依據JIS Z 0237(2000)之方法(溫度:23℃,貼合條件:2 kg輥往返一次,剝離速度:300 mm/min,剝離角度180°)測定之黏著力。 The adhesive layer preferably has an adhesion of 0.3 N/20 mm to 3.0 N/20 mm, more preferably 0.4 N/20 mm to 2.5 N/20 mm, and particularly preferably 0.4 N/20 mm to 2.0 N/ 20 mm, preferably 0.9 N/20 mm~2.0 N/20 mm. If it is within this range, A cutting adhesive sheet excellent in balance between adhesion and peelability is obtained. Further, in the present specification, the adhesive force of the adhesive layer means that the adhesive sheet for dicing of the present invention is aged at 50 ° C for 2 days, and then a semiconductor mirror wafer (manufactured by 矽) is used as a test plate, and the use is based on JIS Z. The method of 0237 (2000) (temperature: 23 ° C, bonding conditions: 2 kg roll back and forth, peeling speed: 300 mm / min, peeling angle 180 °) measured adhesion.

上述黏著劑層亦可以無損本發明之效果之範圍進而包含其他成分。作為該其他成分,例如可列舉:抗氧化劑、紫外線吸收劑、光穩定劑、耐熱穩定劑、抗靜電劑等。其他成分之種類及使用量可根據目的進行適當選擇。 The above adhesive layer may also contain other components without departing from the scope of the effects of the present invention. Examples of the other component include an antioxidant, an ultraviolet absorber, a light stabilizer, a heat stabilizer, and an antistatic agent. The types and amounts of other ingredients can be appropriately selected depending on the purpose.

C.基材層 C. substrate layer

作為構成上述基材層之材料,可採用任意適當之材料。作為構成基材層之材料,例如可列舉:聚對苯二甲酸乙二酯(PET)等聚酯系樹脂;聚乙烯(PE)、聚丙烯(PP)等聚烯烴系樹脂;聚醯亞胺(PI);乙烯-乙酸乙烯酯共聚物(EVA);聚醚醚酮(PEEK);聚氯乙烯(PVC)等聚氯乙烯系樹脂;聚苯乙烯系樹脂;丙烯酸系樹脂;氟系樹脂;纖維素系樹脂;聚碳酸酯系樹脂。就成形性方面而言,可較佳地使用熱塑性樹脂。基材層可為包含同種或不同種材料之多層構造。 As the material constituting the above substrate layer, any appropriate material can be employed. Examples of the material constituting the base material layer include polyester resins such as polyethylene terephthalate (PET); polyolefin resins such as polyethylene (PE) and polypropylene (PP); and polyimine. (PI); ethylene-vinyl acetate copolymer (EVA); polyetheretherketone (PEEK); polyvinyl chloride resin such as polyvinyl chloride (PVC); polystyrene resin; acrylic resin; fluorine resin; Cellulose resin; polycarbonate resin. As the formability, a thermoplastic resin can be preferably used. The substrate layer can be a multilayer construction comprising the same or different materials.

構成上述基材層之材料於190℃、2.16 kgf下之熔融流動速率較佳為2 g/10 min~20 g/10 min,進而較佳為5 g/10 min~15 g/10 min,尤佳為7 g/10 min~12 g/10 min。若構成基材層之材料之熔融流動速率處於此範圍內,則於切割用黏著片之成形中採用共擠出成形時,可無加工不良地形成基材層。 The melt flow rate of the material constituting the base material layer at 190 ° C and 2.16 kgf is preferably 2 g/10 min to 20 g/10 min, and more preferably 5 g/10 min to 15 g/10 min. Good for 7 g/10 min~12 g/10 min. When the melt flow rate of the material constituting the base material layer is within this range, when the co-extrusion molding is used for the formation of the dicing adhesive sheet, the base material layer can be formed without processing.

上述基材層亦可以無損本發明之效果之範圍進而包含其他成分。作為該其他成分,例如可使用與上述B項中所說明之黏著劑層可包含之其他成分相同之成分。 The base material layer may also contain other components without departing from the scope of the effects of the present invention. As the other component, for example, the same components as those which may be contained in the adhesive layer described in the above item B can be used.

D.切割用黏著片之製造方法 D. Method for manufacturing adhesive sheet for cutting

作為本發明之切割用黏著片之成型方法,例如可列舉:充氣成形、壓延成形、擠出成形等。 Examples of the method for molding the dicing adhesive sheet of the present invention include inflation molding, calender molding, and extrusion molding.

於本發明之切割用黏著片具備上述基材層之情形時,本發明之切割用黏著片較佳為將上述黏著劑層與上述基材層一次性成形而得到。作為此種成形方法,例如可列舉:充氣成形、壓延成形、共擠出成形。其中較佳採用共擠出成形。藉由共擠出成形,可以較少之步驟數、且不使用有機溶劑而製造層間黏接性良好之切割用黏著片。 In the case where the dicing adhesive sheet of the present invention has the above-mentioned base material layer, the dicing adhesive sheet of the present invention is preferably obtained by molding the above-mentioned pressure-sensitive adhesive layer and the above-mentioned base material layer at one time. Examples of such a molding method include inflation molding, calender molding, and coextrusion molding. Among them, coextrusion molding is preferred. By co-extrusion molding, a cutting adhesive sheet having good interlayer adhesion can be produced with a small number of steps and without using an organic solvent.

於上述共擠出成形中,上述黏著劑層及上述基材層之形成材料可使用以任意適當之方法將上述各層之成分混合而成之材料。 In the above coextrusion molding, a material obtained by mixing the components of the above layers by any appropriate method may be used as the material for forming the pressure-sensitive adhesive layer and the base material layer.

作為上述共擠出成形之具體方法,例如可列舉如下方法:於至少2台連接於模嘴(dies)之擠出機中,分別向1台供給黏著劑層形成材料,向另1台供給基材層形成材料,熔融後擠出,並利用接觸輥成形法進行拉取,使積層體成形。擠出時各形成材料合流之部分越接近模嘴出口(模唇)越佳。其原因在於在模嘴內難以產生各形成材料之合流不良。因此,作為上述模嘴,較佳地使用多歧管形式之模嘴。再者,於產生合流不良之情形時,發生合流不均等外觀不良,具體而言為擠出之黏著劑層與基材層之間產生波狀之外觀不均,欠佳。又,合流不良係例如由於不同種形成材料於模嘴內之流動性(熔融黏度)之差較大、及各層之形成材料之剪切速度之差較大而產生,因此若使用多歧管形式之模嘴,則比起其他形式(例如進料模組形式),有流動性差之不同種形成材料之材料選擇範圍擴大。用於各形成材料之熔融之擠出機的螺桿類型可為單軸或雙軸。擠出機亦可為3台以上。於使黏著劑層為多層體之情形時,使用3台以上擠出機。又,於擠出機為3台以上之情形時,進而可供給其他層之形成材料。於使用3台以上之擠出機製造雙層構造(基材層+黏著劑層)之切割用黏著片之情形時,向相鄰之2台以上之擠出機供給同一種形成材料即可,例如,使用3台擠出機 之情形時,可向相鄰2台擠出機供給同一種形成材料。 As a specific method of the co-extrusion molding, for example, in at least two extruders connected to a die, one of the adhesive layer forming materials is supplied to one, and the other is supplied to the other. The material forming material is melted, extruded, and drawn by a contact roll forming method to form a laminate. The closer the portion where the forming materials are joined during extrusion, the closer to the nozzle outlet (mould lip). The reason for this is that it is difficult to cause a merge failure of each of the formed materials in the nozzle. Therefore, as the above-mentioned nozzle, a nozzle in the form of a multi-manifold is preferably used. Further, in the case where the merging failure occurs, appearance defects such as merging unevenness occur, and specifically, the appearance of the wavy appearance between the extruded adhesive layer and the substrate layer is uneven, which is not preferable. Further, the merging failure occurs, for example, because the difference in fluidity (melt viscosity) between the different kinds of material forming materials in the nozzle is large, and the difference in the shear rate of the material forming the layers is large, so that a multi-manifold form is used. In the case of the nozzle, the material selection range of the different kinds of forming materials having poor fluidity is expanded compared to other forms (for example, in the form of a feed module). The type of screw used for the extruder for melting each of the formed materials may be uniaxial or biaxial. The extruder can also be three or more. When the adhesive layer is a multilayer body, three or more extruders are used. Further, when the number of extruders is three or more, the material for forming the other layers can be further supplied. When a two-layer extruder is used to produce a two-layer structure (base material layer + adhesive layer) for the cutting of the adhesive sheet, the same forming material may be supplied to two or more adjacent extruders. For example, using 3 extruders In the case of the case, the same forming material can be supplied to two adjacent extruders.

上述共擠出成形中之成形溫度較佳為160℃~220℃,進而較佳為170℃~200℃。若處於此範圍內,則成形穩定性優異。 The molding temperature in the above coextrusion molding is preferably from 160 ° C to 220 ° C, more preferably from 170 ° C to 200 ° C. When it exists in this range, it is excellent in shaping|molding stability.

上述黏著劑層形成材料與上述基材層形成材料於溫度180℃、剪切速度100 sec-1時之剪切黏度之差(黏著劑形成材料-基材層形成材料),較佳為-150 Pa.s~600 Pa.s,進而較佳為-100 Pa.s~550 Pa.s,尤佳為-50 Pa.s~500 Pa.s。若處於此範圍內,則上述黏著劑形成材料及基材層形成材料於模嘴內之流動性相近,可防止合流不良之產生。再者,剪切黏度可使用雙毛細管型之伸長黏度計進行測定。 The difference between the adhesive layer forming material and the base material forming material at a temperature of 180 ° C and a shear rate of 100 sec -1 (adhesive forming material - base material forming material), preferably -150 Pa. s~600 Pa. s, and further preferably -100 Pa. s~550 Pa. s, especially good for -50 Pa. s~500 Pa. s. When it is in this range, the adhesive forming material and the base material layer forming material have similar fluidity in the nozzle, and the occurrence of merging failure can be prevented. Further, the shear viscosity can be measured using a double capillary type elongational viscometer.

[實施例] [Examples]

以下,利用實施例具體說明本發明,但本發明不受該等實施例任何限制。又,於實施例中,只要未特別載明,則「份」及「%」為重量基準。 Hereinafter, the present invention will be specifically described by way of Examples, but the present invention is not limited by the Examples. Further, in the examples, "parts" and "%" are based on weight unless otherwise specified.

[實施例1] [Example 1]

作為黏著劑層形成材料,使用藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)。 As the adhesive layer forming material, an amorphous propylene-(1-butene) copolymer obtained by polymerization using a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002": composition from propylene is used. The unit 90 mol% / constituent unit from 1-butene 10 mol%, Mw = 230,000, Mw / Mn = 1.8).

作為基材層形成材料,使用乙烯-乙酸乙烯酯聚合物(EVA)(三井杜邦公司製造,商品名為「EVAFLEX P-1007」)。 As the base layer forming material, an ethylene-vinyl acetate polymer (EVA) (manufactured by Mitsui DuPont Co., Ltd., trade name "EVAFLEX P-1007") was used.

將上述黏著劑形成材料與基材層形成材料投入至各自之擠出機中,進行T型模嘴熔融共擠出(擠出機:GM ENGINEERING公司製造,商品名為「GM30-28」/T型模嘴:進料模組方式;擠出溫度180℃),得到黏著劑層之厚度為30 μm、基材層之厚度為70 μm之切割用黏著片。再者,各層之厚度係利用T型模嘴出口之形狀進行控制。 The adhesive forming material and the substrate layer forming material were placed in respective extruders, and T-die melt-co-extrusion was performed (extruder: GM ENGINEERING, trade name "GM30-28"/T Type die mouth: feeding module method; extrusion temperature: 180 ° C), a pressure-sensitive adhesive sheet having a thickness of 30 μm of the adhesive layer and a thickness of the substrate layer of 70 μm was obtained. Furthermore, the thickness of each layer is controlled by the shape of the T-die outlet.

[實施例2] [Embodiment 2]

作為黏著劑層形成材料,使用80份藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)、與20份藉由茂金屬觸媒進行聚合而成之結晶性聚丙烯系樹脂(Japan Polypropylene公司製造,商品名為「WINTEC WFX4」,Mw=363,000,Mw/Mn=2.87)的混合物,除此之外,以與實施例1相同之方式得到切割用黏著片。 As the adhesive layer forming material, 80 parts of an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002": from propylene was used. The constituent unit is 90 mol% / 10 mol% from 1-butene, Mw = 230,000, Mw / Mn = 1.8), and 20 parts of crystalline polypropylene resin polymerized by metallocene catalyst An adhesive sheet for dicing was obtained in the same manner as in Example 1 except that a mixture (manufactured by Japan Polypropylene Co., Ltd., trade name "WINTEC WFX4", Mw = 363,000, Mw/Mn = 2.87) was used.

[實施例3] [Example 3]

作為第1黏著劑層形成材料,使用80份藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)、與20份藉由茂金屬觸媒進行聚合而成之結晶性聚丙烯系樹脂(Japan Polypropylene公司製造,商品名為「WINTEC WFX4」,Mw=363,000,Mw/Mn=2.87)的混合物。 As the first adhesive layer forming material, 80 parts of an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002" was used: 90 mol% from propylene, 10 mol% from 1-butene, Mw=230,000, Mw/Mn=1.8), and 20 parts of crystalline polypropylene polymerized by metallocene catalyst A mixture of a resin (manufactured by Japan Polypropylene Co., Ltd., trade name "WINTEC WFX4", Mw = 363,000, Mw/Mn = 2.87).

作為第2黏著劑層形成材料,使用藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)。 As the second adhesive layer forming material, an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002": from propylene is used. The constituent unit is 90 mol% / 10 mol% from 1-butene, Mw = 230,000, Mw / Mn = 1.8).

作為基材層形成材料,使用乙烯-乙酸乙烯酯聚合物(三井杜邦公司製造,商品名為「EVAFLEX P-1007」)。 As the base layer forming material, an ethylene-vinyl acetate polymer (manufactured by Mitsui DuPont, trade name "EVAFLEX P-1007") was used.

將上述第1黏著劑層形成材料與第2黏著劑層形成材料、及基材層形成材料投入到各自之擠出機中,進行T型模嘴熔融共擠出(擠出機:GM ENGINEERING公司製造,商品名「GM30-28」/T型模嘴:進料模組方式;擠出溫度180℃),得到黏著劑層之厚度為30 μm(第1 黏著劑層之厚度:20 μm,第2黏著劑層之厚度:10 μm)、基材層之厚度為70 μm的切割用黏著片(第1黏著劑層/第2黏著劑層/基材層)。再者,各層之厚度係藉由T型模嘴出口之形狀進行控制。 The first adhesive layer forming material, the second adhesive layer forming material, and the base material layer forming material are placed in respective extruders to perform T-die melt co-extrusion (extruder: GM ENGINEERING Manufactured, the product name "GM30-28" / T-type nozzle: feeding module method; extrusion temperature 180 ° C), the thickness of the adhesive layer is 30 μm (1st Thickness of adhesive layer: 20 μm, thickness of second adhesive layer: 10 μm), adhesive sheet for cutting of 70 μm of substrate layer (first adhesive layer / second adhesive layer / substrate layer) ). Furthermore, the thickness of each layer is controlled by the shape of the T-die exit.

[實施例4] [Example 4]

作為第1黏著劑層形成材料,使用70份藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)、及30份藉由茂金屬觸媒進行聚合而成之結晶性聚丙烯系樹脂(Japan Polypropylene公司製造,商品名為「WINTEC WFX4」,Mw=363,000,Mw/Mn=2.87)的混合物,除此之外,以與實施例3相同之方式得到切割用黏著片。 As the first adhesive layer forming material, 70 parts of an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002" was used: 90 mol% of constituent units derived from propylene/10 mol% of constituent units derived from 1-butene, Mw=230,000, Mw/Mn=1.8), and 30 parts of crystalline polypropylene obtained by polymerization of a metallocene catalyst An adhesive sheet for dicing was obtained in the same manner as in Example 3 except that a mixture of a resin (manufactured by Japan Polypropylene Co., Ltd., trade name "WINTEC WFX4", Mw = 363,000, Mw/Mn = 2.87) was used.

[實施例5] [Example 5]

作為第1黏著劑層形成材料,使用60份藉由茂金屬觸媒進行聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名為「Tafthren H5002」:來自丙烯之構成單元90 mol%/來自1-丁烯之構成單元10 mol%,Mw=230,000,Mw/Mn=1.8)、與40份藉由茂金屬觸媒進行聚合而成之結晶性聚丙烯系樹脂(Japan Polypropylene公司製造,商品名為「WINTEC WFX4」,Mw=363,000,Mw/Mn=2.87)的混合物,除此之外,以與實施例3相同之方式得到切割用黏著片。 As the first adhesive layer forming material, 60 parts of an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002" was used: 90 mol% from propylene, 10 mol% from 1-butene, Mw=230,000, Mw/Mn=1.8), and 40 parts of crystalline polypropylene polymerized by metallocene catalyst An adhesive sheet for dicing was obtained in the same manner as in Example 3 except that a mixture of a resin (manufactured by Japan Polypropylene Co., Ltd., trade name "WINTEC WFX4", Mw = 363,000, Mw/Mn = 2.87) was used.

(比較例1) (Comparative Example 1)

作為黏著劑層形成材料,使用熱塑性丙烯酸系樹脂(KURARAY公司製造,商品名為「LA2140e」:Mw=74,000,Mw/Mn=1.3),除此以外,以與實施例1相同之方式得到黏著片。 An adhesive sheet was obtained in the same manner as in Example 1 except that a thermoplastic acrylic resin (trade name: "LA2140e": Mw = 74,000, Mw/Mn = 1.3) was used as the adhesive layer forming material. .

(比較例2) (Comparative Example 2)

於25℃下,向燒瓶中投入78份丙烯酸-2-乙基己酯、19份丙烯醯基啉、3份丙烯酸、0.1份2,2'-偶氮二異丁腈、200份作為稀釋溶劑 之乙酸乙酯。繼而,一面攪拌一面向燒瓶內導入氮氣約1小時,以氮氣置換內部之空氣。繼而,對燒瓶進行加溫,使燒瓶內之溫度上升至60℃,一面適當滴加乙酸乙酯,一面保持約6小時進行聚合,得到聚合物溶液。相對於所得之100份聚合物固形物成份,添加2份聚異氰酸酯化合物(Nippon Polyurethane Industry公司製造,商品名為「CORONATE L」)、1份多官能環氧化合物(三菱瓦斯化學製造,商品名為「Tetrad C」)後,一面以乙酸乙酯進行稀釋,一面攪拌至變均勻,得到黏著劑溶液。 78 parts of 2-ethylhexyl acrylate and 19 parts of acrylonitrile were added to the flask at 25 °C. Porphyrin, 3 parts of acrylic acid, 0.1 part of 2,2'-azobisisobutyronitrile, and 200 parts of ethyl acetate as a diluent solvent. Then, nitrogen gas was introduced into the flask while stirring for about 1 hour, and the inside air was replaced with nitrogen. Then, the flask was heated, the temperature in the flask was raised to 60 ° C, and ethyl acetate was added dropwise thereto for about 6 hours to carry out polymerization to obtain a polymer solution. Two parts of a polyisocyanate compound (manufactured by Nippon Polyurethane Industry Co., Ltd., trade name "CORONATE L") and one part of a polyfunctional epoxy compound (Mitsubishi Gas Chemical Co., Ltd., trade name) are added to 100 parts of the obtained polymer solid content. After "Tetrad C"), it was diluted with ethyl acetate and stirred until it became uniform to obtain an adhesive solution.

於PET隔片上塗佈所得之黏著劑溶液,利用乾燥烘箱於130℃下乾燥5分鐘,形成厚度30 μm之黏著劑層。 The obtained adhesive solution was coated on a PET separator, and dried at 130 ° C for 5 minutes in a drying oven to form an adhesive layer having a thickness of 30 μm.

將所得之黏著劑層轉印至乙烯-乙酸乙烯酯共聚物(EVA)膜上,獲得包含第1黏著劑層(丙烯酸系樹脂,厚度:30 μm)及基材層(EVA,厚度:70 μm)之切割用黏著片。再者,乙烯-乙酸乙烯酯共聚物(EVA)膜係將三井杜邦公司製造之商品名為「EVAFLEX P-1007」者擠出成形而得到。 The obtained adhesive layer was transferred onto an ethylene-vinyl acetate copolymer (EVA) film to obtain a first adhesive layer (acrylic resin, thickness: 30 μm) and a substrate layer (EVA, thickness: 70 μm). ) The adhesive sheet for cutting. Further, an ethylene-vinyl acetate copolymer (EVA) film was obtained by extrusion molding a product of the name "EVAFLEX P-1007" manufactured by Mitsui DuPont.

(比較例3) (Comparative Example 3)

於25℃下,向燒瓶中投入40份丙烯酸-2-乙基己酯、50份丙烯酸甲酯、10份丙烯酸、0.2份過氧化苯甲醯、100份作為稀釋溶劑之乙酸乙酯。繼而,一面攪拌一面向燒瓶內導入氮氣約1小時,以氮氣置換內部之空氣。繼而,對燒瓶進行加溫,使燒瓶內之溫度上升至65℃,一面適當滴加乙酸乙酯,一面保持約6小時進行聚合,得到聚合物溶液。相對於所得之100份聚合物固形物成份,添加50份二季戊四醇六丙烯酸酯(日本化藥公司製造,商品名為「DPHA」)、3份光聚合起始劑(BASF公司製造,商品名為「IRGACURE 651」)、3份聚異氰酸酯化合物(Nippon Polyurethane Industry公司製造,商品名為「CORONATE L」)、及0.5份多官能環氧化合物(三菱瓦斯化學製造, 商品名為「Tetrad C」)後,一面以乙酸乙酯進行稀釋,一面攪拌至變均勻,得到黏著劑溶液。 40 parts of 2-ethylhexyl acrylate, 50 parts of methyl acrylate, 10 parts of acrylic acid, 0.2 part of benzoyl peroxide, and 100 parts of ethyl acetate as a diluent solvent were placed in a flask at 25 °C. Then, nitrogen gas was introduced into the flask while stirring for about 1 hour, and the inside air was replaced with nitrogen. Then, the flask was heated, the temperature in the flask was raised to 65 ° C, and ethyl acetate was appropriately added dropwise thereto to carry out polymerization for about 6 hours to obtain a polymer solution. 50 parts of dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd., trade name "DPHA") and 3 parts of photopolymerization initiator (manufactured by BASF Corporation) were added to 100 parts of the obtained polymer solid content. "IRGACURE 651"), 3 parts of polyisocyanate compound (manufactured by Nippon Polyurethane Industry, trade name "CORONATE L"), and 0.5 part of polyfunctional epoxy compound (Mitsubishi Gas Chemical, After the product name is "Tetrad C", it was diluted with ethyl acetate and stirred until it became uniform to obtain an adhesive solution.

於PET隔片上塗佈所得之黏著劑溶液,利用乾燥烘箱於130℃下乾燥5分鐘,形成厚度30 μm之黏著劑層。 The obtained adhesive solution was coated on a PET separator, and dried at 130 ° C for 5 minutes in a drying oven to form an adhesive layer having a thickness of 30 μm.

將所得之黏著劑層轉印至乙烯-乙酸乙烯酯共聚物(EVA)膜上,獲得包含第1黏著劑層(丙烯酸系樹脂,厚度:30 μm)及基材層(EVA,厚度:70 μm)之切割用黏著片。再者,乙烯-乙酸乙烯酯共聚物(EVA)膜係將三井杜邦公司製造之商品名為「EVAFLEX P-1007」者擠出成形而得到。 The obtained adhesive layer was transferred onto an ethylene-vinyl acetate copolymer (EVA) film to obtain a first adhesive layer (acrylic resin, thickness: 30 μm) and a substrate layer (EVA, thickness: 70 μm). ) The adhesive sheet for cutting. Further, an ethylene-vinyl acetate copolymer (EVA) film was obtained by extrusion molding a product of the name "EVAFLEX P-1007" manufactured by Mitsui DuPont.

(比較例4) (Comparative Example 4)

於25℃下,向燒瓶中投入40份丙烯酸-2-乙基己酯、50份丙烯酸甲酯、10份丙烯酸、0.2份過氧化苯甲醯、100份作為稀釋溶劑之乙酸乙酯。繼而,一面攪拌一面向燒瓶內導入氮氣約1小時,以氮氣置換內部之空氣。繼而,對燒瓶進行加溫,使燒瓶內之溫度上升至65℃,一面適當滴加乙酸乙酯,一面保持約6小時進行聚合,得到聚合物溶液。相對於所得之100份之聚合物固形物成份,添加70份丙烯酸胺基甲酸酯(日本合成化學公司製造,商品名為「UV-1700B」)、30份丙烯酸胺基甲酸酯(日本合成化學公司製造,商品名為「UV-3000B」)、3份光聚合起始劑(BASF公司製造,商品名為「IRGACURE 651」)、及3份聚異氰酸酯化合物(Nippon Polyurethane Industry公司製造,商品名為「CORONATE L」)後,一面用乙酸乙酯進行稀釋一面攪拌至變均勻,得到黏著劑溶液。 40 parts of 2-ethylhexyl acrylate, 50 parts of methyl acrylate, 10 parts of acrylic acid, 0.2 part of benzoyl peroxide, and 100 parts of ethyl acetate as a diluent solvent were placed in a flask at 25 °C. Then, nitrogen gas was introduced into the flask while stirring for about 1 hour, and the inside air was replaced with nitrogen. Then, the flask was heated, the temperature in the flask was raised to 65 ° C, and ethyl acetate was appropriately added dropwise thereto to carry out polymerization for about 6 hours to obtain a polymer solution. 70 parts of acrylamide (manufactured by Nippon Synthetic Chemical Co., Ltd., trade name "UV-1700B") and 30 parts of urethane acrylate (made in Japan) were added to 100 parts of the obtained polymer solid content. Manufactured by Chemical Company, trade name "UV-3000B"), 3 parts of photopolymerization initiator (manufactured by BASF Corporation, trade name "IRGACURE 651"), and 3 parts of polyisocyanate compound (manufactured by Nippon Polyurethane Industry Co., Ltd., trade name After "CORONATE L", it was stirred while being diluted with ethyl acetate until it became uniform, and an adhesive solution was obtained.

於PET隔片上塗佈所得之黏著劑溶液,利用乾燥烘箱於130℃下乾燥5分鐘,形成厚度30 μm之黏著劑層。 The obtained adhesive solution was coated on a PET separator, and dried at 130 ° C for 5 minutes in a drying oven to form an adhesive layer having a thickness of 30 μm.

將所得之黏著劑層轉印至乙烯-乙酸乙烯酯共聚物(EVA)膜上,獲得包含第1黏著劑層(丙烯酸系樹脂,厚度:30 μm)及基材層(EVA,厚 度:70 μm)之切割用黏著片。再者,乙烯-乙酸乙烯酯共聚物(EVA)膜係將三井杜邦公司製造之商品名為「EVAFLEX P-1007」者擠出成形而得到。 The obtained adhesive layer was transferred onto an ethylene-vinyl acetate copolymer (EVA) film to obtain a first adhesive layer (acrylic resin, thickness: 30 μm) and a substrate layer (EVA, thick). Degree: 70 μm) The adhesive sheet for cutting. Further, an ethylene-vinyl acetate copolymer (EVA) film was obtained by extrusion molding a product of the name "EVAFLEX P-1007" manufactured by Mitsui DuPont.

(比較例5) (Comparative Example 5)

作為黏著劑層形成材料,使用藉由茂金屬觸媒進行聚合而成之結晶性聚丙烯系樹脂(Japan Polypropylene公司製造,商品名為「WINTEC WFX4」,Mw=363,000,Mw/Mn=2.87),除此以外,以與實施例1相同之方式得到切割用黏著片。 As the adhesive layer forming material, a crystalline polypropylene resin (manufactured by Japan Polypropylene Co., Ltd., trade name "WINTEC WFX4", Mw = 363,000, Mw/Mn = 2.87), which is polymerized by a metallocene catalyst, is used. Otherwise, an adhesive sheet for dicing was obtained in the same manner as in Example 1.

[評價] [Evaluation]

將實施例及比較例中所得之切割用黏著片藉由以下之方法進行評價。將結果示於表1。 The dicing adhesive sheets obtained in the examples and the comparative examples were evaluated by the following methods. The results are shown in Table 1.

(裸片飛濺) (die splash)

於切割用黏著片上安裝厚度250 μm之6英吋半導體晶圓,於以下條件下進行切割。 A 6-inch semiconductor wafer having a thickness of 250 μm was mounted on the adhesive sheet for dicing, and the dicing was performed under the following conditions.

<切割條件> <Cutting conditions>

切割機:DISCO公司製造DFD-651 Cutting machine: DISCO-651 manufactured by DISCO

刀片:DISCO公司製造NBC-ZH2050 27HECC Blade: DISCO company manufactures NBC-ZH2050 27HECC

刀片轉速:40000 rpm Blade speed: 40000 rpm

切割速度:80 mm/秒 Cutting speed: 80 mm / sec

切割尺寸:2.5 mm×2.5 mm Cutting size: 2.5 mm × 2.5 mm

切割模式:下切 Cutting mode: undercut

切割用黏著片切:20 μm Cutting with adhesive sheet: 20 μm

切割後,以光學顯微鏡(20倍)觀察藉由半導體晶圓之切割所得到之各半導體晶片有無向黏著片上之殘留,對裸片飛濺之數進行計數。再者,對由晶圓外周部產生之大致三角形狀之晶片之裸片飛濺、由晶圓內部產生之四角形狀之晶片之裸片飛濺的數進行計數。表1中示出 裸片飛濺之數相對於切割而成之半導體晶片之總數的比例。 After the dicing, the presence or absence of the remaining semiconductor wafers obtained by the dicing of the semiconductor wafer was observed with an optical microscope (20 times), and the number of splatters of the dies was counted. Further, the number of splatters of the wafer having a substantially triangular shape generated by the outer peripheral portion of the wafer and the number of splatters of the wafer of the quadrangular shape generated inside the wafer are counted. Table 1 shows The ratio of the number of splatter splats to the total number of diced semiconductor wafers.

(碎屑) (debris)

從上述裸片飛濺之評價中所得到之各半導體晶片中取100片晶片作為樣品,以最終被切斷之線(第4線)在上之方式將晶片立於玻璃板上貼附有雙面膠帶而成之樣品台上。以光學顯微鏡(200倍)自上部進行觀察,測定距晶圓背面之碎裂(碎屑)之深度。表1中示出100片晶片中最大之碎屑深度。 100 wafers were taken as samples from each of the semiconductor wafers obtained from the evaluation of the above-mentioned slab splash, and the wafer was placed on the glass plate with the double-sided line (fourth line) as shown above. Tape made on the sample stage. The depth of the chipping (debris) from the back side of the wafer was measured by observing it from the upper portion with an optical microscope (200 times). The largest crumb depth in 100 wafers is shown in Table 1.

(來自黏著劑層之切削屑) (chip from the adhesive layer)

以與上述碎屑之評價相同之方式,觀察100片晶片之半導體晶片之側面,確認半導體晶片側面有無來自黏著劑層之切削屑。再者,以長徑為5 μm以上之來自黏著劑層之切削屑為觀察之對象。 The side faces of the semiconductor wafer of 100 wafers were observed in the same manner as the evaluation of the above-mentioned chips, and it was confirmed whether or not the chips on the side faces of the semiconductor wafer were from the adhesive layer. Further, the chips from the adhesive layer having a long diameter of 5 μm or more were observed.

(拾取) (pick up)

將切割尺寸設為5 mm×5 mm,除此以外,與裸片飛濺之評價相同地實施切割。關於為紫外線硬化型黏著劑之比較例3及4,於以下所示之條件下自黏著面照射紫外線,作為拾取評價用工件。於以下所示之條件下實施拾取評價。再者,以針高為200 μm實施,於無法拾取之情形時,每次10 μm地增加針高,而以可連續拾取50片晶片時之針高作為拾取性之評價值。本評價值係值越小表示拾取性越佳,若針高為1000 μm以下,則被評為良好之拾取。 Cutting was performed in the same manner as the evaluation of the splatter of the slab except that the dicing size was set to 5 mm × 5 mm. In Comparative Examples 3 and 4 which are ultraviolet curable adhesives, ultraviolet rays were irradiated from the adhesive surface under the conditions shown below, and were used as pick-up evaluation workpieces. The pickup evaluation was carried out under the conditions shown below. Further, the needle height was 200 μm, and when the pickup could not be performed, the needle height was increased every 10 μm, and the needle height at the time of continuously picking 50 wafers was used as the evaluation value of the pickup property. The smaller the value of the evaluation value, the better the pick-up property, and if the needle height is 1000 μm or less, it is rated as a good pick.

(拾取條件) (pick condition)

裝置 FED-1870(芝浦公司製造) Device FED-1870 (made by Shibaura Co., Ltd.)

拾取速度 指數4 Picking speed index 4

拾取時間 100 msec Pick up time 100 msec

頂起量 200 μm起 Starting capacity from 200 μm

擴張量 3 mm Expansion amount 3 mm

針配置 3×3 mm Needle configuration 3 × 3 mm

針R 250 μm Needle R 250 μm

吸嘴尺寸 5×5 mm Nozzle size 5×5 mm

(UV照射條件) (UV irradiation conditions)

裝置 UM-810(日東精機公司製造) Device UM-810 (made by Nitto Seiki Co., Ltd.)

UV照度 50 mW/cm2 UV illumination 50 mW/cm 2

UV照射時間 6秒 UV irradiation time 6 seconds

UV光量 300 mJ/cm2 UV light amount 300 mJ/cm 2

(貯存模數) (storage modulus)

將實施例及比較例中所使用之黏著劑層之貯存模數(G')利用以下之方法進行評價。 The storage modulus (G') of the adhesive layer used in the examples and the comparative examples was evaluated by the following method.

使用實施例中使用之黏著劑層形成材料,製作試驗片(厚度2 mm×7.9 mm ),使用動態黏彈性測定裝置(Rheometric Scientific公司製造,製品名為「ARES」)以頻率1 Hz、升溫速度5℃/分鐘於-50℃~100℃之範圍測定剪切之貯存模數(G')。 A test piece (thickness 2 mm × 7.9 mm) was prepared using the adhesive layer forming material used in the examples. Using a dynamic viscoelasticity measuring device (manufactured by Rheometric Scientific, product name "ARES"), the storage modulus of the shear was measured at a frequency of 1 Hz, a temperature increase rate of 5 ° C / min, and a range of -50 ° C to 100 ° C (G). ').

由於一部分無法進行剪切之測定,故而對該樣品使用拉伸試驗進行測定。於23℃下,使用拉伸試驗機(島津製作所公司製造,TENSILON)於夾盤間距離50 mm、拉伸速度0.3 m/min之條件下將寬度10 mm、長度80 mm之黏著劑層之樣品沿長度方向進行拉伸,測定應力-應變曲線。拉伸彈性模數係利用下式(I)算出。 Since a part of the measurement was not possible, the sample was measured using a tensile test. A sample of an adhesive layer having a width of 10 mm and a length of 80 mm was used at 23 ° C using a tensile tester (manufactured by Shimadzu Corporation, TENSILON) at a distance of 50 mm between the chucks and a tensile speed of 0.3 m/min. The stretching was performed in the longitudinal direction, and the stress-strain curve was measured. The tensile modulus of elasticity is calculated by the following formula (I).

Et=(σ2-σ1)/(ε2-ε1).....(I) Et = (σ2-σ1) / (ε2-ε1). . . . . (I)

Et:拉伸彈性模數[MPa] Et: tensile elastic modulus [MPa]

σ1:應變ε1=0.05%之拉伸應力[MPa] Σ1: tensile stress [MPa] of strain ε1=0.05%

σ2:應變ε2=0.25%之拉伸應力[MPa] Σ2: tensile stress [MPa] of strain ε2=0.25%

(黏著力(剝離速度300 mm/min)) (adhesion (peeling speed 300 mm/min))

將所得之切割用黏著片以50℃熟化2天後,貼附於4英吋之半導體晶圓之鏡面(矽製造)上,利用依據JIS Z 0237(2000)之方法(溫度: 23℃,貼合條件:2 kg輥往復一次,剝離速度:300 mm/min,剝離角度:180°)進行測定。 The obtained adhesive sheet for dicing was aged at 50 ° C for 2 days, and then attached to a mirror surface of a 4 inch semiconductor wafer (manufactured by 矽), using a method according to JIS Z 0237 (2000) (temperature: 23 ° C, bonding conditions: 2 kg roller reciprocating once, peeling speed: 300 mm / min, peeling angle: 180 °) was measured.

根據實施例可明確,根據本案發明,藉由具備包含具有特定重量平均分子量及分子量分佈之非晶質丙烯-(1-丁烯)共聚物的黏著劑層,可獲得切割步驟中切削屑之產生受到抑制之切割用黏著片。 According to the embodiment, it is clear that according to the present invention, the generation of chips in the cutting step can be obtained by providing an adhesive layer containing an amorphous propylene-(1-butene) copolymer having a specific weight average molecular weight and a molecular weight distribution. Squeezed adhesive sheet for suppression.

10‧‧‧黏著劑層 10‧‧‧Adhesive layer

20‧‧‧基材層 20‧‧‧Substrate layer

100‧‧‧切割用黏著片 100‧‧‧Cut adhesive sheets

Claims (7)

一種切割用黏著片,其具備包含非晶質丙烯-(1-丁烯)共聚物之黏著劑層,且該非晶質丙烯-(1-丁烯)共聚物之重量平均分子量(Mw)為200,000以上,該丙烯-(1-丁烯)共聚物之分子量分佈(Mw/Mn)為3以下。 An adhesive sheet for dicing, comprising an adhesive layer containing an amorphous propylene-(1-butene) copolymer, and the amorphous propylene-(1-butene) copolymer has a weight average molecular weight (Mw) of 200,000 As described above, the propylene-(1-butene) copolymer has a molecular weight distribution (Mw/Mn) of 3 or less. 如請求項1之切割用黏著片,其中上述黏著劑層進而包含結晶性聚丙烯系樹脂。 The adhesive sheet for dicing according to claim 1, wherein the adhesive layer further comprises a crystalline polypropylene resin. 如請求項2之切割用黏著片,其中上述結晶性聚丙烯系樹脂之含有比率為相對於上述非晶質丙烯-(1-丁烯)共聚物與該結晶性聚丙烯系樹脂的合計量為50重量%以下。 The adhesive sheet for dicing according to claim 2, wherein a content ratio of the crystalline polypropylene-based resin is a total amount of the amorphous propylene-(1-butene) copolymer and the crystalline polypropylene-based resin. 50% by weight or less. 如請求項1或2之切割用黏著片,其中上述黏著劑層於20℃下之貯存模數(G')為0.5×106 Pa~1.0×108 Pa。 The adhesive sheet for cutting according to claim 1 or 2, wherein the storage modulus (G') of the adhesive layer at 20 ° C is 0.5 × 10 6 Pa to 1.0 × 10 8 Pa. 如請求項1或2之切割用黏著片,其進而具備基材層。 The dicing adhesive sheet according to claim 1 or 2, further comprising a substrate layer. 如請求項5之切割用黏著片,其中上述基材層之厚度相對於上述黏著劑層與該基材層之合計厚度為10%~90%。 The dicing adhesive sheet according to claim 5, wherein the thickness of the base material layer is 10% to 90% with respect to a total thickness of the adhesive layer and the base material layer. 如請求項5之切割用黏著片,其係將上述黏著劑層與上述基材層一次性成形而得到。 The dicing adhesive sheet according to claim 5, wherein the adhesive layer and the base material layer are formed at one time.
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