TW201341087A - Silver fine particles, production process therefor, and conductive paste, conductive membrane and electronic device, containing said silver fine particles - Google Patents

Silver fine particles, production process therefor, and conductive paste, conductive membrane and electronic device, containing said silver fine particles Download PDF

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TW201341087A
TW201341087A TW101150527A TW101150527A TW201341087A TW 201341087 A TW201341087 A TW 201341087A TW 101150527 A TW101150527 A TW 101150527A TW 101150527 A TW101150527 A TW 101150527A TW 201341087 A TW201341087 A TW 201341087A
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fine particles
silver fine
silver
solution
conductive paste
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Keisuke Iwasaki
Yasuo Kakihara
Tetsuji Handa
Mineko Ohsugi
Yosuke Yamamoto
Seiji Ishitani
Hiroko Morii
Kazuyuki Hayashi
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Toda Kogyo Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • B22F1/054Nanosized particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • B22F1/054Nanosized particles
    • B22F1/056Submicron particles having a size above 100 nm up to 300 nm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102Metallic powder coated with organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2301/00Metallic composition of the powder or its coating
    • B22F2301/25Noble metals, i.e. Ag Au, Ir, Os, Pd, Pt, Rh, Ru
    • B22F2301/255Silver or gold
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2304/00Physical aspects of the powder
    • B22F2304/05Submicron size particles
    • B22F2304/054Particle size between 1 and 100 nm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures

Abstract

The present invention pertains to: silver fine particles with excellent low-temperature sinterability; a production process therefor; and a conductive paste, a conductive membrane and an electronic device, containing the silver fine particles. In a process for producing silver fine particles which comprises preparing an alcoholic solution (A) of a silver nitrate-amine complex prepared using silver nitrate and at least one water-soluble C2-4 aliphatic amine, preparing, separately from the solution (A), an aqueous solution (B) in which either ascorbic acid or erythorbic acid and a halide are dissolved, adding a mixture of the solution (A) with the solution (B) into a vessel in which water has been put, stirring the resulting mixture, and then subjecting the thus obtained silver fine particles to washing and drying, at least 1.610-3 mol of a halide per mol of silver nitrate is added to the solution (B), whereby an aggregate silver fine particle slurry can be obtained to facilitate the subsequent washing. Thus, silver fine particles which have a carbon content of 0.25wt% or less and thus exhibit excellent low-temperature sinterability can be obtained.

Description

銀微粒子及其製造法與含有該銀微粒子之導電性糊劑、導電性膜及電子裝置 Silver microparticles, manufacturing method thereof, and conductive paste, conductive film and electronic device containing the same

本發明係關於低溫燒結性優異之平均粒徑30~120nm之銀微粒子及其製造方法以及含有該銀微粒子之導電性糊劑、導電性膜及電子裝置。 The present invention relates to a silver fine particle having an average particle diameter of 30 to 120 nm which is excellent in low-temperature sinterability, a method for producing the same, a conductive paste containing the silver fine particles, a conductive film, and an electronic device.

電子裝置之電極或電路圖型之形成係使用含金屬粒子之導電性糊劑將電極或電路圖型印刷於基板上後,經加熱燒成並使導電性糊劑中所含之金屬粒子燒結而進行,但近年來,其加熱燒成溫度有低溫化之傾向。 The electrode or circuit pattern of the electronic device is formed by printing an electrode or a circuit pattern on a substrate using a conductive paste containing metal particles, and then firing the metal particles contained in the conductive paste by heating. However, in recent years, the heating and firing temperature tends to decrease.

例如,電子裝置之安裝基板一般可加熱至300℃左右,為了耐熱性優異雖使用了聚醯亞胺製之可撓性基板,但由於昂貴,故最近已檢討以更便宜之PET(聚對苯二甲酸乙二酯)基板或PEN(聚萘二甲酸乙二酯)基板作為替代材料。然而,PET基板或PEN基板相較於聚醯亞胺製可撓性基板其耐熱性較低,尤其,膜配線板中所用之PET薄膜基板須在150℃以下進行加熱燒成。 For example, the mounting substrate of an electronic device can be generally heated to about 300 ° C, and a flexible substrate made of polyimide is used for excellent heat resistance. However, since it is expensive, PET (polyphenylene terephthalate) has been recently reviewed. A polyethylene dicarboxylate substrate or a PEN (polyethylene naphthalate) substrate is used as an alternative material. However, the PET substrate or the PEN substrate has lower heat resistance than the flexible substrate made of polyimide. In particular, the PET film substrate used in the film wiring board must be heated and fired at 150 ° C or lower.

又,若能在比200℃更低之溫度下進行加熱燒成,則亦可能於聚碳酸酯或紙等基板形成電極或電路圖型,故擴大各種電極材等之用途受到期待。 Further, if the heating and firing can be performed at a temperature lower than 200 ° C, an electrode or a circuit pattern may be formed on a substrate such as polycarbonate or paper. Therefore, it is expected to expand the use of various electrode materials and the like.

作為此種可低溫燒成之導電性糊劑之原料的金屬粒子,奈米級之銀微粒子受到期待。其理由可列舉為金屬粒子之大小成為奈米級時表面活性變高,熔點相較於金屬塊 體亦更為降低,故可在低的溫度燒結。且,相較於銅等之其他導電性粒子,銀微粒子雖有昂貴,且即使於金屬粒子中亦易引起遷移之缺點,但相較於具有相同程度之比電阻的銅,則由於不易氧化故作業較容易。 As the metal particles of the raw material of such a low-temperature-fireable conductive paste, nano-sized silver fine particles are expected. The reason for this is that the surface activity becomes higher when the size of the metal particles becomes nanometer, and the melting point is compared with the metal block. The body is also reduced, so it can be sintered at a low temperature. Moreover, compared with other conductive particles such as copper, the silver fine particles are expensive, and even if they are easily caused to migrate in the metal particles, they are less susceptible to oxidation than copper having the same specific resistance. Homework is easier.

且,奈米級之銀微粒子可在低溫下燒結,同時一次燒結時可維持耐熱性,故亦被期待利用以往之焊料所沒有之性質作為無鉛焊料之替代材料。 Further, the nano-sized silver fine particles can be sintered at a low temperature and can maintain heat resistance at the time of primary sintering, and therefore it is expected to use a property which is not possessed by conventional solders as a substitute for lead-free solder.

迄今為止,作為安定且效率地製造分散性優異之微細銀粒子之方法,提案有在鹵化物離子存在下使銀離子還原之方法(專利文獻1)、在樹脂型糊劑之硬化加熱溫度下之收縮率高之含有鹵素之銀粉、及可簡單且低價地獲得含有該鹵素之銀粉之製造方法(專利文獻2)。且,作為可在低溫(600℃前後)進行燒結,用以製造優異延展性之燒結構件之金屬粉末,則已知有在金屬粉末表面含有5~2,000ppm之鹵素元素或鹵化物(專利文獻3)。 Heretofore, as a method for stably and efficiently producing fine silver particles having excellent dispersibility, a method of reducing silver ions in the presence of halide ions has been proposed (Patent Document 1), and at a hardening heating temperature of a resin paste. A halogen-containing silver powder having a high shrinkage ratio and a method for producing a silver powder containing the halogen at a simple and low cost (Patent Document 2). Further, as a metal powder which can be sintered at a low temperature (before and after 600 ° C) to produce a sintered member having excellent ductility, it is known that a halogen element or a halide is contained in the surface of the metal powder of 5 to 2,000 ppm (Patent Document) 3).

另外,藉由將自反應至乾燥為止之所有步驟控制在30℃以下,而成為可低溫燒成之導電性糊劑等原料的平均粒徑30~100nm之多結晶化之銀粒子(專利文獻4)為已知。 In addition, all the steps from the reaction to the drying are controlled to 30° C. or less, and the crystal particles having an average particle diameter of 30 to 100 nm of a raw material such as a conductive paste which can be fired at a low temperature (Patent Document 4) ) is known.

先前技術文獻 Prior technical literature

專利文獻 Patent literature

專利文獻1:特開2008-274423號公報 Patent Document 1: JP-A-2008-274423

專利文獻2:特開2010-77493號公報 Patent Document 2: JP-A-2010-77493

專利文獻3:特開2005-325411號公報 Patent Document 3: JP-A-2005-325411

專利文獻4:特開2011-80094號公報 Patent Document 4: JP-A-2011-80094

前述專利文獻1中,雖揭示在鹵化物離子之存在下使銀離子還原之方法,但專利文獻1記載之製造方法中,如後述之比較例所示,由於鹵化物之添加量少故所生成之銀微粒子成為分散系,於隨後之洗淨不完全,故所得銀微粒子之碳量無法成為0.25重量%以下,難以獲得低溫燒結性優異之銀微粒子。 In the above-described Patent Document 1, a method of reducing silver ions in the presence of a halide ion is disclosed. However, in the production method described in Patent Document 1, as shown in the comparative example described later, the amount of halide added is small. Since the silver fine particles are dispersed, and the subsequent washing is incomplete, the amount of carbon of the obtained silver fine particles cannot be 0.25 wt% or less, and it is difficult to obtain silver fine particles excellent in low-temperature sintering property.

又,專利文獻2中雖揭示含有鹵素之銀粉,但添加鹵化物之時期係在銀之還原反應之後,故相較於還原反應時形成氯化銀而不溶化之情況,為所含有之鹵素容易脫離或離子化者,尤其是作為本發明之電極或電路圖型形成中所用之用於導電性糊劑及導電性薄膜用途之銀微粒子,由於鹵素係簡單地以離子化狀態附著於粒子表面,故而不佳。 Further, although Patent Document 2 discloses a silver powder containing a halogen, the period of adding a halide is after the reduction reaction of silver, so that the halogen contained is easily desorbed compared to the case where silver chloride is formed during the reduction reaction. Or an ionizer, in particular, silver fine particles used for the use of the conductive paste and the conductive film used in the formation of the electrode or circuit pattern of the present invention, since the halogen is simply attached to the particle surface in an ionized state, good.

專利文獻3雖揭示於金屬粉末之表面含有5~2,000ppm之鹵素元素或鹵化物,但專利文獻3中記載之金屬粉末係將金屬粉末加壓成形製作壓粉體並在500~900℃下燒結而使用者,由於鹵素之添加目的係為了燒結構件之延展性及尺寸收縮,故與上述同樣,尤其是作為本發明之電極或電路圖型之形成所用之導電性糊劑及導電性薄膜用途所用之銀微粒子,由於鹵素係簡單地以離子化狀態附著於粒子表面,故而不佳。 Patent Document 3 discloses that the metal powder contains 5 to 2,000 ppm of a halogen element or a halide on the surface of the metal powder. However, the metal powder described in Patent Document 3 press-forms a metal powder to produce a green compact and is sintered at 500 to 900 ° C. On the other hand, since the purpose of adding halogen is for the ductility and dimensional shrinkage of the sintered member, it is used in particular as the conductive paste and the conductive film used for forming the electrode or circuit pattern of the present invention. The silver fine particles are not preferable because the halogen is simply attached to the surface of the particles in an ionized state.

專利文獻4雖揭示藉由將反應至乾燥之所有步驟均控制在30℃以下,而獲得作為可低溫燒成之導電性糊劑等的原料之平均粒徑30~100nm之多結晶化銀粒子,但如後述之比較例所示,由於未添加鹵化物故生成之銀微粒子成為分散系,隨後之洗淨會不完全,故所得銀微粒子之碳量無法成為0.25重量%以下,難以獲得低溫燒結性更優異之銀微粒子。另外,由於乾燥溫度亦需要控制在30℃以下,故於工業上不利。 In Patent Document 4, it is disclosed that all the steps of the reaction to drying are controlled to 30° C. or less, and a plurality of crystallized silver particles having an average particle diameter of 30 to 100 nm which is a raw material of a conductive paste which can be fired at a low temperature are obtained. However, as shown in the comparative example described later, since the silver fine particles formed without adding a halide are dispersed, the subsequent washing may be incomplete, so that the amount of carbon of the obtained silver fine particles cannot be 0.25 wt% or less, and it is difficult to obtain low-temperature sinterability. Excellent silver particles. In addition, since the drying temperature needs to be controlled below 30 ° C, it is industrially disadvantageous.

此處,本發明之技術課題係提供一種低溫燒結性優異之平均粒徑30~120nm之銀微粒子及效率良好地製造該銀微粒子之方法。 Here, the technical problem of the present invention is to provide a silver fine particle having an average particle diameter of 30 to 120 nm which is excellent in low-temperature sinterability and a method for efficiently producing the silver fine particle.

前述技術課題可藉由如下述之本發明達成。 The above technical problems can be achieved by the present invention as described below.

亦即,本發明為一種銀微粒子之製造方法,其特徵為調製使用硝酸銀、一種以上之水溶性或水可溶性的碳數2~4之脂肪族胺所調製之硝酸銀之胺錯合物之醇溶液(A液),與前述A液另外地調製使抗壞血酸或異抗壞血酸(erythorbic acid)與鹵化物溶解而成之水溶液(B液),將使用靜止型混合機混合前述A液與前述B液而成者添加於已置入水之容器中並攪拌後,使所得銀微粒子經洗淨.乾燥之銀微粒子之製造方法,其中於前述B液中添加對硝酸銀1莫耳而言為1.6×10-3莫耳以上之鹵化物(本發明1)。 That is, the present invention is a method for producing silver microparticles, which is characterized in that an alcohol solution of silver nitrate amine complex prepared by using silver nitrate or more than one water-soluble or water-soluble aliphatic amine having 2 to 4 carbon atoms is prepared. (A liquid), an aqueous solution (B liquid) obtained by dissolving ascorbic acid or erythorbic acid and a halide is prepared separately from the liquid A, and the liquid A and the liquid B are mixed by using a static mixer. After being added to a container that has been placed in water and stirred, the obtained silver particles are washed. A method for producing dry silver fine particles, wherein a halide of 1.6 × 10 -3 mol or more is added to the liquid B of the silver nitrate (the present invention 1).

又,本發明為一種以本發明之方法獲得銀微粒子,其 特徵為銀微粒子之碳量為0.25重量%以下(本發明2)。 Further, the present invention is a method of obtaining silver fine particles by the method of the present invention, The amount of carbon of the silver fine particles is 0.25 wt% or less (Invention 2).

且,本發明為本發明2之銀微粒子,其中銀微粒子之粒子表面被分子量10,000以上之高分子化合物所被覆(本發明3)。 Further, the present invention is the silver fine particles of the invention 2, wherein the surface of the particles of the silver fine particles is coated with a polymer compound having a molecular weight of 10,000 or more (Invention 3).

另外,本發明為如本發明2或本發明3之銀微粒子,其平均粒徑(DSEM)為30nm以上120nm以下(本發明4)。 Further, the present invention is the silver fine particles according to the invention 2 or the invention 3, which has an average particle diameter (D SEM ) of 30 nm or more and 120 nm or less (Invention 4).

另外,本發明係一種導電性糊劑,其係含有本發明2至本發明4中任一項之銀微粒子(本發明5)。 Further, the present invention is a conductive paste comprising the silver fine particles of any one of Invention 2 to Invention 4 (Invention 5).

另外,本發明為一種導電性膜,其係使用本發明5之導電性糊劑所形成(本發明6)。 Further, the present invention is a conductive film formed using the conductive paste of the present invention 5 (Invention 6).

且,本發明為一種電子裝置,其係具有本發明6之導電性膜(本發明7)。 Further, the present invention is an electronic device comprising the conductive film of the present invention 6 (Invention 7).

本發明之銀微粒子由於還原反應後之碳含量低,故適合作為可低溫燒成之導電性糊劑等之原料。 Since the silver fine particles of the present invention have a low carbon content after the reduction reaction, they are suitable as a raw material for a conductive paste which can be fired at a low temperature.

又,本發明之銀微粒子之製造方法可減低還原反應後之銀微粒子之碳含量,同時可以高收率獲得銀微粒子,故適合作為低溫燒結性優異之銀微粒子之製造方法。 Further, the method for producing silver fine particles of the present invention can reduce the carbon content of the silver fine particles after the reduction reaction and obtain silver fine particles in a high yield. Therefore, it is suitable as a method for producing silver fine particles excellent in low-temperature sintering property.

若更詳細說明本發明之構成則係如下。 The structure of the present invention will be described in more detail below.

首先,針對本發明之銀微粒子之製造方法加以敘述。 First, a method of producing the silver fine particles of the present invention will be described.

本發明之銀微粒子可調製使用硝酸銀、一種以上之水 溶性或水可溶性的碳數2~4之脂肪族胺所調製之硝酸銀之胺錯合物之醇溶液(A液),與前述A液另外地調製使抗壞血酸或異抗壞血酸與鹵化物溶解而成之水溶液(B液),將使用靜止型混合機混合前述A液與前述B液而成者添加於已置入水之容器中並攪拌後,使所得銀微粒子經洗淨.乾燥而獲得。 The silver microparticles of the invention can be prepared by using silver nitrate and more than one kind of water. An alcohol solution (solution A) of a silver nitrate amine complex prepared by a soluble or water-soluble aliphatic amine having 2 to 4 carbon atoms, which is additionally prepared by dissolving ascorbic acid or isoascorbic acid and a halide. The aqueous solution (solution B) is obtained by mixing the liquid A and the liquid B with a static mixer, and adding the mixture to the container in which the water has been placed, and stirring, and then the obtained silver fine particles are washed. Obtained by drying.

本發明中之硝酸銀之胺錯合物的醇溶液(A液)可藉由在醇溶液中混合硝酸銀與一種以上之水溶性或水可溶性之碳數2~4之脂肪族胺而獲得。脂肪族胺之添加量相對於硝酸銀1莫耳較好為2.0~2.5莫耳,更好為2.0~2.3莫耳。脂肪族胺之量相對於硝酸銀1莫耳未達2.0莫耳時,有容易生成較大粒子之傾向。 The alcohol solution (solution A) of the silver nitrate amine complex in the present invention can be obtained by mixing silver nitrate with one or more water-soluble or water-soluble aliphatic amines having 2 to 4 carbon atoms in an alcohol solution. The amount of the aliphatic amine added is preferably from 2.0 to 2.5 mol, more preferably from 2.0 to 2.3 mol, based on 1 mol of silver nitrate. When the amount of the aliphatic amine is less than 2.0 mol per mol of silver nitrate, there is a tendency that large particles are easily formed.

本發明之碳數2~4之脂肪族胺重要的是使用水溶性或水可溶性者,具體而言可使用乙基胺、正丙基胺、異丙基胺、正丁基胺、異丁基胺等,但若考慮銀微粒子之低溫燒結性及操作性,則以正丙基胺及正丁基胺較佳。 The aliphatic amine having 2 to 4 carbon atoms of the present invention is important to use water-soluble or water-soluble ones, specifically ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutyl. An amine or the like is preferable to n-propylamine and n-butylamine in consideration of low-temperature sinterability and handleability of silver fine particles.

本發明之醇可使用與水具有相溶性者。具體而言可使用甲醇、乙醇、丙醇及異丙醇等,較好為甲醇及乙醇。該等醇類可單獨亦可混合使用。 The alcohol of the present invention can be used in accordance with water. Specifically, methanol, ethanol, propanol, isopropanol or the like can be used, and methanol and ethanol are preferred. These alcohols may be used singly or in combination.

本發明中,與上述A液另外地調製使抗壞血酸或異抗壞血酸與鹵化物溶解而成之水溶液(B液)。相對於使其混合之A液中之硝酸銀1莫耳抗壞血酸或異抗壞血酸之添加量較好為1.0~2.0莫耳,更好為1.0~1.8莫耳。相對於硝酸銀1莫耳抗壞血酸或異抗壞血酸超過2.0莫耳時,由 於生成之銀微粒子彼此有凝聚之傾向故較不佳。 In the present invention, an aqueous solution (solution B) obtained by dissolving ascorbic acid or erythorbic acid and a halide is prepared separately from the liquid A. The amount of silver nitrate 1 mol ascorbic acid or isoascorbic acid added in the liquid A to be mixed is preferably 1.0 to 2.0 mol, more preferably 1.0 to 1.8 mol. When compared to silver nitrate 1 mol ascorbic acid or isoascorbic acid exceeding 2.0 mol, The tendency of the generated silver particles to agglomerate with each other is less preferred.

本發明之鹵化物可使用由氯化鉀(KCl)、氯化鈉(NaCl)、氯化銨(NH4Cl)、溴化鉀(KBr)、溴化鈉(NaBr)、溴化銨(NH4Br)、碘化鉀(KI)、碘化鈉(NaI)及碘化銨(NH4I)所選出之一種或兩種以上,但較好為氯化鉀(KCl)、氯化鈉(NaCl)等氯化物。 The halide of the present invention can be used from potassium chloride (KCl), sodium chloride (NaCl), ammonium chloride (NH 4 Cl), potassium bromide (KBr), sodium bromide (NaBr), ammonium bromide (NH). One or more selected from 4 Br), potassium iodide (KI), sodium iodide (NaI) and ammonium iodide (NH 4 I), but preferably potassium chloride (KCl) or sodium chloride (NaCl) Etc. chloride.

鹵化物之添加量係相對於使其混合之A液中之硝酸銀1莫耳較好為鹵化物1.6×10-3~8.0×10-3莫耳,更好為1.7×10-3~6.0×10-3莫耳,又更好為1.8×10-3~4.0×10-3莫耳,鹵化物之添加量相對於硝酸銀1莫耳若超過8.0×10-3莫耳時,藉由添加鹵化物所得之銀微粒子之漿液成為凝聚狀態之效果已飽和,且存在必要量以上之鹵化物時,對於作為電極或電路圖型之形成所用之導電性糊劑及導電性薄膜用途中所用之銀微粒子較不好。且,鹵化物之添加量相對於硝酸銀1莫耳未達1.6×10-3莫耳時,由於鹵化物之存在量太少,故所得銀微粒子之漿液成為分散狀態,會使隨後之洗淨不完全,故難以使銀微粒子之碳量成為0.25重量%以下。 The amount of the halide added is preferably from 1.6 × 10 -3 to 8.0 × 10 -3 mol, more preferably from 1.7 × 10 -3 to 6.0 ×, relative to the silver nitrate in the liquid A to be mixed. 10 - 3 moles, more preferably 1.8 × 10 -3 ~ 4.0 × 10 -3 moles, the amount of halide added is more than 8.0 × 10 -3 moles relative to silver nitrate 1 mole, by adding halogenation When the effect of the slurry of the silver fine particles obtained by the material is saturated, and the halide of the necessary amount or more is present, the silver fine particles used in the use of the conductive paste and the conductive film used for forming the electrode or the circuit pattern are compared. not good. Further, when the amount of the halide added is less than 1.6 × 10 -3 mol with respect to 1 mol of silver nitrate, since the amount of the halide is too small, the slurry of the obtained silver fine particles becomes dispersed, and the subsequent washing is not performed. Since it is complete, it is difficult to make the amount of carbon of the silver fine particles 0.25 wt% or less.

硝酸銀之胺錯合物之醇溶液(A液)與使抗壞血酸或異抗化血酸與鹵化物溶解而成之水溶液(B液)使用靜止型混合機予以混合,且添加於已置入水之容器中並攪拌。與使溶解抗壞血酸或異抗壞血酸與鹵化物之水溶液(B液)滴加於硝酸銀之胺錯合物的醇溶液(A液)中之方法,或者將硝酸銀之胺錯合物之醇溶液(A液)滴加於溶解異抗壞血酸與 鹵化物之水溶液(B液)中之方法相較,由於初期之還原反應生成之A液與B液之混合濃度為一定,故容易獲得所得銀微粒子之粒度分佈更均勻者。 An alcohol solution of the silver nitrate amine complex (liquid A) and an aqueous solution (solution B) obtained by dissolving ascorbic acid or iso-hydro-humic acid and a halide are mixed using a static mixer, and added to the water which has been placed. Stir in the container. a method of adding an aqueous solution (solution B) of dissolved ascorbic acid or erythorbic acid and a halide to an alcohol solution (solution A) of silver nitrate, or an alcohol solution of an amine complex of silver nitrate (solution A) ) added to the dissolved isoascorbic acid In the method of the aqueous solution of the halide (solution B), since the mixed concentration of the liquid A and the liquid B produced by the initial reduction reaction is constant, it is easy to obtain a uniform particle size distribution of the obtained silver fine particles.

使用靜止型混合機混合硝酸銀之胺錯合物的醇溶液(A液)與溶解抗壞血酸或異抗壞血酸與鹵化物之水溶液(B液),且將所得反應溶液添加於已置入水之容器中,將銀之濃度調整成0.1~1.0mol/L之範圍,進行30分鐘以上攪拌後,將所得銀微粒子使用醇及水,以慣用方法進行過濾.水洗。此時,進行洗淨直至濾液之導電度成為60μS/cm以下。 Mixing an alcohol solution of the silver nitrate amine complex (liquid A) with an aqueous solution of the ascorbic acid or erythorbic acid and the halide (solution B) using a static mixer, and adding the obtained reaction solution to the container which has been placed in the water, The concentration of silver is adjusted to a range of 0.1 to 1.0 mol/L, and after stirring for 30 minutes or more, the obtained silver fine particles are filtered by a conventional method using an alcohol and water. Washed. At this time, washing was performed until the conductivity of the filtrate became 60 μS/cm or less.

將上述經洗淨之銀微粒子之濾餅再分散於親水性有機溶劑中,將銀微粒子表面之水分置換成親水性有機溶劑後,使以慣用方法過濾之銀微粒子在溫度40℃以下,較好在30℃以下乾燥,或者經真空乾燥後,以慣用方法粉碎,可獲得本發明之銀微粒子。藉由將銀微粒子表面之水分置換成親水性有機溶劑,可防止乾燥後之銀微粒子成為彼此堅固凝聚之狀態,而使隨後之粉碎處理或表面處理.粉碎處理等變得容易。 The filter cake of the washed silver fine particles is redispersed in a hydrophilic organic solvent, and the water on the surface of the silver fine particles is replaced with a hydrophilic organic solvent, and then the silver fine particles filtered by a conventional method are preferably at a temperature of 40 ° C or lower. After drying at 30 ° C or lower, or by vacuum drying, it is pulverized by a conventional method to obtain silver fine particles of the present invention. By replacing the moisture on the surface of the silver microparticles with a hydrophilic organic solvent, it is possible to prevent the silver microparticles after drying from being in a state of solid agglomeration with each other, so that the subsequent pulverization treatment or surface treatment. The pulverization process and the like become easy.

親水性有機溶劑可使用甲醇、乙醇、丙醇等醇類及丙酮等。若考慮藉乾燥去除溶劑,則以甲醇及乙醇較佳。 As the hydrophilic organic solvent, an alcohol such as methanol, ethanol or propanol, acetone or the like can be used. If it is considered to remove the solvent by drying, methanol and ethanol are preferred.

本發明之銀微粒子係在粉碎處理前事先以分子量10,000以上之高分子化合物進行表面處理較好。以分子量10,000以上之高分子化合物進行之被覆量相對於銀微粒子較好為0.2~4重量%,更好為0.3~3重量%。藉由使高分 子化合物之處理量落在上述範圍,可獲得藉由粉碎處理之充分處理效果。藉由事先以高分子化合物進行表面處理,在隨後進行之粉碎處理中可獲得高的粉碎處理效果,可使粉碎處理更均。另一方面,將高分子化合物添加於銀微粒子之還原析出反應中時,在處理量及處理效果之均一性會有問題,由於在隨後所進行之粉碎處理中會產生凝聚,使所得銀微粒子在導電糊劑中之分散性變困難故較不佳。 The silver fine particles of the present invention are preferably surface-treated with a polymer compound having a molecular weight of 10,000 or more before the pulverization treatment. The coating amount of the polymer compound having a molecular weight of 10,000 or more is preferably 0.2 to 4% by weight, more preferably 0.3 to 3% by weight based on the silver fine particles. By making high scores The amount of the sub-compound treated falls within the above range, and a sufficient treatment effect by the pulverization treatment can be obtained. By subjecting the surface treatment with a polymer compound in advance, a high pulverization treatment effect can be obtained in the subsequent pulverization treatment, and the pulverization treatment can be more uniform. On the other hand, when a polymer compound is added to the reduction precipitation reaction of silver fine particles, there is a problem in the uniformity of the treatment amount and the treatment effect, and aggregation occurs in the subsequent pulverization treatment, so that the obtained silver fine particles are The dispersibility in the conductive paste becomes difficult, which is less preferred.

以高分子化合物進行之銀微粒子之表面處理係使以親水性有機溶劑置換.乾燥後之銀微粒子再分散於使高分子化合物溶解於有機溶劑中而成之高分子化合物溶液中,緩慢攪拌30~300分鐘後,去除有機溶劑且進行乾燥。 The surface treatment of the silver microparticles by the polymer compound is replaced by a hydrophilic organic solvent. The dried silver fine particles are redispersed in a polymer compound solution obtained by dissolving the polymer compound in an organic solvent, and the mixture is slowly stirred for 30 to 300 minutes, and then the organic solvent is removed and dried.

以高分子化合物進行表面處理之銀微粒子之粉碎較好使用噴射式粉碎機。 The pulverization of the silver fine particles surface-treated with the polymer compound is preferably carried out using a jet mill.

接著,針對本發明之銀微粒子加以敘述。 Next, the silver fine particles of the present invention will be described.

本發明之銀微粒子係以上述製造方法獲得之銀微粒子,其特徵為使還原反應後之銀微粒子漿液洗淨.乾燥後之銀微粒子之碳量為0.25重量%以下。 The silver microparticles of the present invention are silver microparticles obtained by the above-mentioned manufacturing method, which are characterized in that the silver microparticle slurry after the reduction reaction is washed. The amount of carbon of the silver fine particles after drying is 0.25 wt% or less.

使還原反應後之銀微粒子漿液洗淨.乾燥之銀微粒子之碳量超過0.25重量%時,由於損及低溫燒結性故較不佳。且,下限值通常為0.15重量%,低於該下限時,會有對溶劑及樹脂之濡濕性降低之傾向。更好為0.15~0.24重量%,又更好為0.16~0.23重量%。 Wash the silver microparticle slurry after the reduction reaction. When the amount of carbon of the dried silver fine particles exceeds 0.25% by weight, it is less preferable because the low-temperature sintering property is impaired. Further, the lower limit is usually 0.15% by weight, and when it is less than the lower limit, the wettability to the solvent and the resin tends to be lowered. More preferably, it is 0.15 to 0.24% by weight, more preferably 0.16 to 0.23% by weight.

本發明之銀微粒子之平均粒徑(DSEM)較好為30nm以上、120nm以下,更好為35nm以上、110nm以下,又更 好為40nm以上、100nm以下。藉由使平均粒徑(DSEM)成為上述範圍,使利用其所得之電子裝置之微細化變容易。平均粒徑(DSEM)未達30nm時,銀微粒子具有之表面活性變高,為了安定地維持其微細粒徑而有必要附著大量有機物等故而不佳。 The average particle diameter (D SEM ) of the silver fine particles of the present invention is preferably 30 nm or more and 120 nm or less, more preferably 35 nm or more and 110 nm or less, and still more preferably 40 nm or more and 100 nm or less. By setting the average particle diameter (D SEM ) to the above range, it is easy to refine the electronic device obtained by the above. When the average particle diameter (D SEM ) is less than 30 nm, the surface activity of the silver fine particles is high, and it is not preferable to adhere a large amount of organic substances in order to maintain the fine particle diameter stably.

本發明之銀微粒子之結晶直徑(DX)較好為30nm以下,更好為10~29nm,又更好為10~28nm。結晶直徑(DX)超過30nm時,銀微粒子中之反應性降低,且損及低溫燒結性故而不佳。且,結晶直徑(DX)未達10nm時,銀微粒子變不安定,即使於常溫下亦會開始產生部分燒結.熔著故而不佳。 The crystal diameter (D X ) of the silver fine particles of the present invention is preferably 30 nm or less, more preferably 10 to 29 nm, still more preferably 10 to 28 nm. When the crystal diameter (D X ) exceeds 30 nm, the reactivity in the silver fine particles is lowered, and the low-temperature sintering property is impaired, which is not preferable. Moreover, when the crystal diameter (D X ) is less than 10 nm, the silver fine particles become unstable, and partial sintering starts to occur even at normal temperature. It is not good to melt.

本發明之銀微粒子之多結晶化度[平均粒徑(DSEM)與結晶直徑(DX)之比(DSEM/DX)為2.8以上,較好為3.0以上,更好為3.2以上。多結晶化度未達2.8時,銀微粒子中之結晶直徑變大而接近單結晶故銀微粒子中之反應性下降,損及低溫燒結性故而不佳。前述多結晶化度之上限值為10左右,更好為8左右。 The present invention as much as the silver microparticles degree of crystallinity [average particle diameter (D SEM) and a crystalline diameter (D X) ratio (D SEM / D X) is 2.8 or more, preferably 3.0 or more, more preferably 3.2 or more. When the degree of polycrystallization is less than 2.8, the crystal diameter in the silver fine particles becomes large, and the reactivity in the silver fine particles is lowered as it is close to the single crystal, which is disadvantageous in that the low-temperature sintering property is impaired. The upper limit of the degree of polycrystallization is about 10, more preferably about 8.

本發明之銀微粒子之低溫燒結性係以藉由後述之加熱所致之結晶直徑(DX)之變化率[(150℃下加熱30分鐘後之銀微粒子之結晶直徑(Dx)/加熱前之銀微粒子之結晶直徑(DX))×100]進行評價,於150℃之加熱所致之結晶直徑(DX)之變化率較好為130%以上,更好為135%以上。結晶直徑(DX)之變化率未達130%時,無法稱為低溫燒結性優異。本發明中,在210℃加熱30分鐘時,結晶直徑(DX)之變化 率較好為140%以上,更好為150%以上。 The low-temperature sinterability of the silver fine particles of the present invention is a rate of change of the crystal diameter (D X ) by heating described later [(the crystal diameter (D x ) of the silver fine particles after heating at 150 ° C for 30 minutes / before heating The crystal diameter (D X ) of the silver fine particles × 100] was evaluated, and the rate of change of the crystal diameter (D X ) by heating at 150 ° C was preferably 130% or more, more preferably 135% or more. When the rate of change of the crystal diameter (D X ) is less than 130%, it cannot be said that it is excellent in low-temperature sinterability. In the present invention, when heated at 210 ° C for 30 minutes, the rate of change of the crystal diameter (D X ) is preferably 140% or more, more preferably 150% or more.

本發明之銀微粒子之BET比表面積值較好為10m2/g以下,更好為8m2/g以下。BET比表面積值超過10m2/g時,使用其所得之導電性糊劑之黏度會變高故而不佳。 The silver fine particles of the present invention preferably have a BET specific surface area value of 10 m 2 /g or less, more preferably 8 m 2 /g or less. When the BET specific surface area value exceeds 10 m 2 /g, the viscosity of the conductive paste obtained by using it becomes high, which is not preferable.

本發明之銀微粒子之鹵素含量相對於銀1莫耳較好為鹵素1.6×10-3~8.0×10-3莫耳,更好為1.7×10-3~6.0×10-3莫耳,又更好為1.8×10-3~4.0×10-3莫耳。鹵素之含量相對於銀1莫耳超過8.0×10-3莫耳時,鹵素含量過多,故作為電極或電路圖型之形成所用之導電性糊劑及導電性薄膜用途中所用之銀微粒子並不佳。 The halogen content of the silver fine particles of the present invention is preferably from 1.6 × 10 -3 to 8.0 × 10 -3 mol, more preferably from 1.7 × 10 -3 to 6.0 × 10 -3 mol, relative to the silver 1 molar. More preferably 1.8 x 10 -3 ~ 4.0 x 10 -3 mol. When the content of the halogen exceeds 8.0 × 10 -3 mol with respect to the silver 1 mol, the halogen content is too large, so the silver paste used for the use of the conductive paste and the conductive film for forming an electrode or a circuit pattern is not preferable. .

本發明之銀微粒子之粒子形狀較好為球狀或粒狀。 The particle shape of the silver fine particles of the present invention is preferably spherical or granular.

本發明之銀微粒子較好在使上述還原反應後之銀微粒子漿液洗淨.乾燥之銀微粒子之粒子表面以分子量10,000以上之高分子化合物被覆。分子量未達10,000時,在隨後進行之粉碎處理中會產生凝聚塊,使所得銀微粒子在導電糊劑中之分散性變困難故而不佳。且,高分子化合物之分子量上限為100,000左右,若提高至其以上之分子量則黏度變高,使對銀微粒子表面之均一處理變困難。若考慮對銀微粒子表面之高分子化合物之處理均一性及處理效果,則較好為具有酸性官能基與鹼性官能基之二種官能基之分散劑,或者併用具有酸價之分散劑與具有胺價之分散劑。 The silver microparticles of the present invention are preferably washed after the above-mentioned reduction reaction of the silver microparticle slurry. The surface of the particles of the dried silver fine particles is coated with a polymer compound having a molecular weight of 10,000 or more. When the molecular weight is less than 10,000, agglomerates are generated in the subsequent pulverization treatment, and the dispersion of the obtained silver fine particles in the conductive paste becomes difficult, which is not preferable. Further, the upper limit of the molecular weight of the polymer compound is about 100,000, and if the molecular weight is increased to be higher than the above, the viscosity is increased, and uniform treatment of the surface of the silver fine particles becomes difficult. When considering the treatment uniformity and treatment effect of the polymer compound on the surface of the silver fine particles, it is preferably a dispersing agent having two functional groups of an acidic functional group and a basic functional group, or a dispersing agent having an acid value and having Amine valence dispersant.

至於前述高分子系分散劑可使用一般市售作為顏料分散劑者,具體而言列舉為ANTI-TERRA-U、ANTI-TERRA- 205、DISPERBYK-101、DISPERBYK-102、DISPERBYK-106、DISPERBYK-108、DISPERBYK-109、DISPERBYK-110、DISPERBYK-111、DISPERBYK-112、DISPERBYK-116、DISPERBYK-130、DISPERBYK-140、DISPERBYK-142、DISPERBYK-145、DISPERBYK-161、DISPERBYK-162、DISPERBYK-163、DISPERBYK-164、DISPERBYK-166、DISPERBYK-167、DISPERBYK-168、DISPERBYK-170、DISPERBYK-171、DISPERBYK-174、DISPERBYK-180、DISPERBYK-182、DISPERBYK-183、DISPERBYK-184、DISPERBYK-185、DISPERBYK-2000、DISPERBYK-2001、DISPERBYK-2008、DISPERBYK-2009、DISPERBYK-2022、DISPERBYK-2025、DISPERBYK-2050、DISPERBYK-2070、DISPERBYK-2096、DISPERBYK-2150、DISPERBYK-2155、DISPERBYK-2163、DISPERBYK-2164、BYK-P104、BYK-P104S、BYK-P105、BYK-9076、BYK-9077、BYK-220S(日本BYK化學股份有限公司製造);EFKA 4008、EFKA 4009、EFKA 4046、EFKA 4047、EFKA 4010、EFKA 4015、EFKA 4020、EFKA 4050、EFKA 4055、EFKA 4060、EFKA 4080、EFKA 4300、EFKA 4330、EFKA 4400、EFKA 4401、EFKA 4402、EFKA 4403、EFKA 4406、EFKA 4800、EFKA 5010、EFKA 5044、EFKA 5244、EFKA 5054、EFKA 5055、EFKA 5063、EFKA 5064、EFKA 5065、EFKA 5066、EFKA 5070(日本BASF股份有限公司製造);SOLSPERSE 3000、SOLSPERSE 13240、SOLSPERSE 13940、SOLSPERSE 16000、SOLSPERSE 17000、SOLSPERSE 18000、SOLSPERSE 20000、SOLSPERSE 21000、SOLSPERSE 24000SC、SOLSPERSE 24000GR、SOLSPERSE 26000、SOLSPERSE 27000、SOLSPERSE 28000、SOLSPERSE 31845、SOLSPERSE 32000、SOLSPERSE 32500、SOLSPERSE 32550、SOLSPERSE 34750、SOLSPERSE 35100、SOLSPERSE 35200、SOLSPERSE 36000、SOLSPERSE 36600、SOLSPERSE 37500、SOLSPERSE 38500、SOLSPERSE 39000、SOLSPERSE 41000(日本LUBRIZOL股份有限公司製造);AJISUPER PB821、AJISUPER PB822、AJISUPER PB881、AJISUPER PN-411、AJISUPER PA-111(Ajinomoto Fine-Techno Co.,Inc製造);DISPARLON KS-860、DISPARLON KS-873N、DISPARLON 7004、DISPARLON 1831、DISPARLON 1850、DISPARLON 1860、DISPARLON DA-7301、DISPARLON DA-325、DISPARLON DA-375、DISPARLON DA-234(楠本化成股份有限公司製造);FLOREN DOPA-15B、FLOREN DOPA-17HF、FLOREN DOPA-22、FLOREN DOPA-33、FLOREN G-700、FLOREN G-820、FLOREN G-900(共榮社化學股份有限公司製造)等。該等顏料分散劑可使用一種或組合兩種以上使用。 As the above-mentioned polymer-based dispersant, those generally commercially available as a pigment dispersant can be used, and specifically, they are listed as ANTI-TERRA-U, ANTI-TERRA- 205, DISPERBYK-101, DISPERBYK-102, DISPERBYK-106, DISPERBYK-108, DISPERBYK-109, DISPERBYK-110, DISPERBYK-111, DISPERBYK-112, DISPERBYK-116, DISPERBYK-130, DISPERBYK-140, DISPERBYK-142, DISPERBYK-145, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-166, DISPERBYK-167, DISPERBYK-168, DISPERBYK-170, DISPERBYK-171, DISPERBYK-174, DISPERBYK-180, DISPERBYK- 182, DISPERBYK-183, DISPERBYK-184, DISPERBYK-185, DISPERBYK-2000, DISPERBYK-2001, DISPERBYK-2008, DISPERBYK-2009, DISPERBYK-2022, DISPERBYK-2025, DISPERBYK-2050, DISPERBYK-2070, DISPERBYK-2096, DISPERBYK-2150, DISPERBYK-2155, DISPERBYK-2163, DISPERBYK-2164, BYK-P104, BYK-P104S, BYK-P105, BYK-9076, BYK-9077, BYK-220S (made by BYK Chemical Co., Ltd.); EFKA 4008, EFKA 4009, EFKA 4046, EFKA 4047, EFKA 4010, EFKA 4015, EFKA 4020, EFKA 4050, EFKA 4055, EFKA 4060, EFKA 4080, EFKA 4300, EFKA 4330, EFKA 4400, EFKA 4401, EFKA 4402, EFKA 4403, EFKA 4406, E FKA 4800, EFKA 5010, EFKA 5044, EFKA 5244, EFKA 5054, EFKA 5055, EFKA 5063, EFKA 5064, EFKA 5065, EFKA 5066, EFKA 5070 (manufactured by BASF, Japan); SOLSPERSE 3000, SOLSPERSE 13240, SOLSPERSE 13940, SOLSPERSE 16000, SOLSPERSE 17000, SOLSPERSE 18000, SOLSPERSE 20000, SOLSPERSE 21000, SOLSPERSE 24000SC, SOLSPERSE 24000GR, SOLSPERSE 26000, SOLSPERSE 27000, SOLSPERSE 28000, SOLSPERSE 31845, SOLSPERSE 32000, SOLSPERSE 32500, SOLSPERSE 32550, SOLSPERSE 34750, SOLSPERSE 35100, SOLSPERSE 35200, SOLSPERSE 36000, SOLSPERSE 36600, SOLSPERSE 37500, SOLSPERSE 38500, SOLSPERSE 39000, SOLSPERSE 41000 (manufactured by LUBRIZOL Co., Ltd.); AJISUPER PB821, AJISUPER PB822, AJISUPER PB881, AJISUPER PN-411, AJISUPER PA-111 (Ajinomoto Fine-Techno Co., Inc.); DISPARLON KS-860, DISPARLON KS-873N, DISPARLON 7004, DISPARLON 1831, DISPARLON 1850, DISPARLON 1860, DISPARLON DA-7301, DISPARLON DA-325, DISPARLON DA-375, DISPARLON DA-234 (manufactured by Nanben Chemical Co., Ltd.); FLOREN DOPA-15B, FLOREN DOPA-17HF, FLOREN DOPA-22, FLOREN DOPA-33, FLOREN G-700, FLOREN G-820, FLOREN G-900 Chemical Co., Ltd.) and so on. These pigment dispersants may be used alone or in combination of two or more.

接著,針對含本發明之銀微粒子之導電性糊劑加以敘述。 Next, the conductive paste containing the silver fine particles of the present invention will be described.

本發明之導電性糊劑可為燒成型糊劑及聚合物型糊劑 之任一形態,於燒成型糊劑之情況,係由本發明銀微粒及玻璃質所組成,亦可視需要調配黏結劑樹脂、溶劑等其他成分。又,於聚合物型糊劑之情況,係由本發明之銀微粒子及溶劑組成,且可視需要調配黏結劑樹脂、硬化劑、分散劑、流變調整劑等其他成分。 The conductive paste of the present invention may be a fire-forming paste and a polymer paste. In any case, in the case of a baked paste, the silver fine particles and the glassy material of the present invention are used, and other components such as a binder resin and a solvent may be blended as needed. Further, in the case of the polymer type paste, it is composed of the silver fine particles and the solvent of the present invention, and other components such as a binder resin, a curing agent, a dispersing agent, and a rheology adjusting agent may be blended as needed.

至於黏結劑樹脂可使用該領域中習知者,列舉為例如乙基纖維素、硝基纖維素等纖維素系樹脂,聚酯樹脂、胺基甲酸酯改質之聚酯樹脂、環氧改質之聚酯樹脂、丙烯酸改質之聚酯等各種改質聚酯樹脂、聚胺基甲酸酯樹脂、氯化乙烯.乙酸乙烯酯共聚物、丙烯酸樹脂、環氧樹脂、酚樹脂、醇酸樹脂、丁醛樹脂、聚乙烯醇、聚醯亞胺、聚醯胺醯亞胺等。該等黏結劑樹脂可單獨或併用兩種以上。 As the binder resin, those known in the art can be used, and are exemplified by cellulose resins such as ethyl cellulose and nitrocellulose, polyester resins, urethane-modified polyester resins, and epoxy resins. Various polyester resin, acrylic modified polyester and other modified polyester resin, polyurethane resin, vinyl chloride. Vinyl acetate copolymer, acrylic resin, epoxy resin, phenol resin, alkyd resin, butyral resin, polyvinyl alcohol, polyimide, polyamidimide, and the like. These binder resins may be used alone or in combination of two or more.

至於溶劑可使用該領域中習知者,列舉為例如十四烷、甲苯、二甲苯、乙基苯、二乙基苯、異丙基苯、戊基苯、對-異丙基甲苯(cymene)、四氫萘及石油系芳香族烴混合物等之烴系溶劑;乙二醇單乙基醚、乙二醇單丁基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單正丁基醚、丙二醇單第三丁基醚、二乙二醇單乙基醚、二乙二醇單丁基醚、二丙二醇單甲基醚、二丙二醇單丁基醚、三丙二醇單甲基醚等醚類,或二醇醚系溶劑;乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丁基醚乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯等之二醇酯系溶劑;甲基異丁基酮、環己酮等之酮系溶劑;松油醇(terpineol)、沉香醇(linalool)、香葉醇(geraniol)、香茅醇 (citronellol)等之萜烯醇(terpene alcohol);正丁醇、第二丁醇、第三丁醇等之醇系溶劑;乙二醇、二乙二醇等之二醇系溶劑;γ-丁內酯及水等。溶劑可單獨使用或併用兩種以上。 As the solvent, those skilled in the art can be used, for example, tetradecane, toluene, xylene, ethylbenzene, diethylbenzene, cumene, pentylbenzene, p-isopropyltoluene (cymene). Hydrocarbon solvent such as tetrahydronaphthalene and petroleum aromatic hydrocarbon mixture; ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl Ethers such as ether, propylene glycol mono-tert-butyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether Class, or glycol ether solvent; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate a glycol ester solvent such as propylene glycol monoethyl ether acetate; a ketone solvent such as methyl isobutyl ketone or cyclohexanone; terpineol, linalool, geraniol ( Geraniol), citronellol a terpene alcohol such as (citronellol); an alcohol solvent such as n-butanol, a second butanol or a third butanol; a glycol solvent such as ethylene glycol or diethylene glycol; and γ-butyl Lactone and water. The solvent may be used singly or in combination of two or more.

導電性糊劑中之銀微粒子之含量係依據用途而不同,但例如配線形成用途之情況等較好儘可能接近100重量%。 The content of the silver fine particles in the conductive paste varies depending on the application, but it is preferably as close as possible to 100% by weight, for example, in the case of wiring formation.

本發明之導電性糊劑可藉由使用雷管機、罐研磨機、三軸輥研磨機、旋轉式混合機、二軸混練機等之各種混練機、分散機,使各成分混合.分散而獲得。 The conductive paste of the present invention can be mixed by using various kneading machines and dispersing machines such as a detonator, a can grinder, a triaxial roll grinder, a rotary mixer, and a two-axis kneading machine. Obtained by dispersion.

本發明之導電性糊劑可使用於網版印刷、噴墨法、凹版印刷、轉印印刷、輥塗、流動塗佈、噴霧塗佈、旋轉塗佈、浸漬、刮板塗佈、鍍敷等各種塗佈方法中。 The conductive paste of the present invention can be used for screen printing, inkjet printing, gravure printing, transfer printing, roll coating, flow coating, spray coating, spin coating, dipping, blade coating, plating, etc. Among various coating methods.

另外,本發明之導電性糊劑可作為FPD(平面面板顯示器)、太陽能電池、有機EL等之電極形成或LSI基板之配線形成,尤其微細凹槽、貫穿孔、接觸孔之埋入等之配線形成材料使用。又,可較好地用於層合陶瓷電容器或層合感應器之內部電極形成用等之在高溫之燒成用途中,當然由於可低溫燒成故亦適合作為於可撓性基板或IC卡、其他基板上之配線形成材料及電極形成材料。又,亦可作為導電性被膜使用於電磁波保護膜或紅外線反射遮蔽等。在電子安裝中亦可使用作為零件安裝用接合材。 Further, the conductive paste of the present invention can be formed as an electrode formation of an FPD (flat panel display), a solar cell, an organic EL or the like, or a wiring of an LSI substrate, in particular, wiring of fine grooves, through holes, and buried holes of contact holes. Forming materials used. Moreover, it can be suitably used for high-temperature baking applications for forming an internal electrode of a laminated ceramic capacitor or a laminated inductor, and of course, it can be suitably used as a flexible substrate or an IC card because it can be fired at a low temperature. And wiring forming materials and electrode forming materials on other substrates. Further, it can be used as a conductive film for an electromagnetic wave protective film or infrared reflection shielding. It is also possible to use a bonding material for component mounting in electronic mounting.

〈作用〉 <effect>

本發明之重點為調製使用硝酸銀、與水溶性或水可溶性之碳數2~4之脂肪族胺之一種以上所調製之硝酸銀之胺錯合物的醇溶劑(A液),與前述A液另外地調製使抗壞血酸或異抗壞血酸、與鹵化物溶解而成之水溶液(B液),將使用靜止型混合機混合前述A液與前述B液而成者添加於已置入水之容器中並攪拌後,將所得銀微粒子洗淨.乾燥獲得之本發明之銀微粒子具有優異的低溫燒結性之事實。 The present invention is directed to preparing an alcohol solvent (solution A) using silver nitrate and an amine complex of silver nitrate prepared by one or more kinds of water-soluble or water-soluble aliphatic amines having 2 to 4 carbon atoms, and the above-mentioned liquid A An aqueous solution (B liquid) obtained by dissolving ascorbic acid or isoascorbic acid and a halide is prepared, and the liquid A and the liquid B are mixed by using a static mixer, and are added to a container in which water has been placed and stirred. , the silver particles obtained are washed. The fact that the silver fine particles of the present invention obtained by drying have excellent low-temperature sinterability.

關於以上述製造法獲得之本發明之銀微粒子之低溫燒結性優異之理由,本發明人等認為係藉由將對硝酸銀1莫耳而言為1.6×10-3莫耳之鹵化物添加於還原反應溶液中,而使所得之銀微粒子之漿液成為凝聚系,使隨後之洗淨變容易,故可使銀微粒子之碳量成為0.25重量%以下。又,依據上述製造法,即使乾燥溫度超過30℃,所得銀微粒子亦具有結晶化度為2.8以上之多結晶性。 The reason why the silver fine particles of the present invention obtained by the above-mentioned production method are excellent in the low-temperature sinterability is considered to be a reduction of 1.6 × 10 -3 mol of a halide to silver nitrate 1 mol. In the reaction solution, the slurry of the obtained silver fine particles is agglomerated, and subsequent washing is facilitated, so that the amount of carbon of the silver fine particles can be made 0.25% by weight or less. Further, according to the above production method, even if the drying temperature exceeds 30 ° C, the obtained silver fine particles have a crystallinity of 2.8 or more.

實施例 Example

以下列示本發明之實施例,具體說明本發明。 The invention is specifically illustrated by the following examples of the invention.

銀微粒子之平均粒徑係使用掃描型電子顯微鏡照片「S-4800」(HITACHI製造)拍攝粒子之照片,使用該照片對100個以上之粒子測定相當於球之粒徑,算出其平均值作為平均粒徑(DSEM)。 The average particle diameter of the silver particles was photographed using a scanning electron micrograph "S-4800" (manufactured by HITACHI), and the particle size of the ball was measured for 100 or more particles using the photograph, and the average value was calculated as an average. Particle size (D SEM ).

銀微粒子之比表面積係使用「Monosorb MS-11」(Quantachrome股份有限公司製造),以BET法測定之值表 示。 The specific surface area of the silver particles is determined by the BET method using "Monosorb MS-11" (manufactured by Quantachrome Co., Ltd.). Show.

還原反應後之銀微粒子漿液經洗淨.乾燥之銀微粒子之碳量係使用「堀場金屬碳.硫分析裝置EMIA-2200型」(堀場製作所股份有限公司製造)求得。 The silver microparticle slurry after the reduction reaction is washed. The amount of the carbon of the dried silver granules was determined by using the "Essence Metal Carbon and Sulfur Analyzer EMIA-2200" (manufactured by Horiba, Ltd.).

銀微粒子之結晶直徑(DX)係使用X射線繞射裝置「RINT2500」(RIGAKU股份有限公司製造),以Cu之Kα線作為線源求得面指數(1,1,1)面之波峰之半值寬,且由Scherrer之式計算結晶直徑。 The crystal diameter (D X ) of the silver fine particles was obtained by using an X-ray diffraction device "RINT 2500" (manufactured by RIGAKU Co., Ltd.), and the peak of the surface index (1, 1, 1) was obtained by using the Kα line of Cu as a line source. The half value is wide and the crystal diameter is calculated by Scherrer's formula.

銀微粒子之多結晶化度係以平均粒徑(DSEM)與結晶直徑(DX)之比(DSEM/DX)表示。 The degree of crystallinity of the silver fine particles is expressed by the ratio of the average particle diameter (D SEM ) to the crystal diameter (D X ) (D SEM /D X ).

銀微粒子中之鹵素含量係在燃燒管內以1100℃燃燒測定試料20mg,收集產生之氣體,以離子層析測定,以燃燒管式氧燃燒/離子層析法求得。 The halogen content in the silver fine particles was measured by burning 20 mg of the sample at 1100 ° C in a combustion tube, and the generated gas was collected and determined by ion chromatography using a combustion tube type oxycombustion/ion chromatography.

因銀微粒子之加熱所致之結晶直徑之變化率(%)係使用在150℃加熱銀微粒子30分鐘後之結晶直徑(DX)與加熱前之銀微粒子之結晶直徑(DX),依下述數1算出之值。又,加熱條件變更為在210℃歷時30分鐘時亦同樣求得結晶直徑之變化率。 (%) Caused by heating of the silver particles to crystallize the rate of change in the crystal diameter of the silver fine particles using the system before the silver crystal particles 150 heating deg.] C after 30 minutes of the diameter (D X) is heated with a diameter (D X), according to the The value calculated by the number 1 is described. Further, the heating condition was changed to a rate of change in crystal diameter in the same manner at 210 ° C for 30 minutes.

〈數1〉結晶直徑之變化率(%)=加熱後之銀微粒子之結晶直徑(DX)/加熱前之銀微粒子之結晶子徑(DX)×100 <Number 1> Rate of change of crystal diameter (%) = crystal diameter (D X ) of silver fine particles after heating / crystal seed diameter (D X ) of the silver fine particles before heating × 100

導電性塗膜之比電阻係針對將後述之導電性糊劑塗佈 於聚醯亞胺薄膜上,在120℃預乾燥後,由在150℃、210℃及300℃之各溫度下加熱硬化30分鐘而得之各導電性塗膜,使用4端子電阻測定裝置「ROLESTA GP/MCP-T600」(三菱化學分析股份有限公司製造)測定,由薄片電阻與膜厚算出比電阻。 The specific resistance of the conductive coating film is applied to a conductive paste to be described later. After pre-drying at 120 ° C on a polyimide film, each conductive coating film obtained by heat-hardening at 150 ° C, 210 ° C, and 300 ° C for 30 minutes was used as a 4-terminal resistance measuring device "ROLESTA". GP/MCP-T600" (manufactured by Mitsubishi Chemical Corporation) measured the specific resistance from the sheet resistance and the film thickness.

〈實施例1-1:銀微粒子之製造〉 <Example 1-1: Production of silver fine particles>

於50L容器中添加硝酸銀5.16kg與甲醇25.8L及正丁基胺4.89kg後,邊冷卻為15℃以下邊混合.攪拌,調製A液。另外,於50L容器中量取水27.8L與異抗壞血酸8.03kg並攪拌溶解後,添加氯化鈉3.78g且邊冷卻為15℃以下邊進行混合.攪拌,調製B液。 Add 5.16 kg of silver nitrate to 25.8 L of methanol and 4.89 kg of n-butylamine in a 50 L vessel, and then mix while cooling to 15 ° C or less. Stir and prepare solution A. In addition, 27.8 L of water and 8.03 kg of isoascorbic acid were weighed and dissolved in a 50 L vessel, and then 3.78 g of sodium chloride was added and the mixture was cooled to 15 ° C or lower. Stir and prepare solution B.

接著,使用靜止型混合機邊混合A液與B液,邊添加至已置入水7L之容器中,邊使反應系冷卻至25℃以下邊攪拌5小時後,靜置30分鐘使固體成分沉降。以傾析去除上澄液後,使用濾紙抽氣過濾,接著,使用甲醇與純水洗淨並過濾。 Then, while mixing the liquid A and the liquid B with a static mixer, the mixture was stirred in a vessel having a water of 7 L, and the reaction system was cooled to 25 ° C or lower and stirred for 5 hours, and then allowed to stand for 30 minutes to settle the solid components. . After the supernatant was removed by decantation, it was suction-filtered using a filter paper, followed by washing with methanol and pure water, and filtering.

所得銀微粒子之固體成分之一部分在乾燥機中於40℃乾燥6小時後,經粉碎獲得實施例1-1之銀微粒子。 One part of the solid content of the obtained silver fine particles was dried in a dryer at 40 ° C for 6 hours, and then pulverized to obtain silver fine particles of Example 1-1.

所得銀微粒子之粒子形狀為粒狀,碳量為0.20重量%,平均粒徑(DSEM)為81.7nm,結晶直徑DX為23.8nm,多結晶化度(DSEM/DX)為3.4,BET比表面積為5.3m2/g,鹵素含量為690ppm,結晶直徑之變化率(150℃×30分鐘)為138%,結晶直徑之變化率(210℃×30分鐘)為161%。 The particle shape of the obtained silver fine particles was granular, the carbon amount was 0.20% by weight, the average particle diameter (D SEM ) was 81.7 nm, the crystal diameter D X was 23.8 nm, and the degree of polycrystallization (D SEM /D X ) was 3.4. The BET specific surface area was 5.3 m 2 /g, the halogen content was 690 ppm, the rate of change in crystal diameter (150 ° C × 30 minutes) was 138%, and the rate of change in crystal diameter (210 ° C × 30 minutes) was 161%.

〈實施例2-1:導電性糊劑之製造〉 <Example 2-1: Production of Conductive Paste>

對實施例1-1之銀微粒子100重量份添加聚酯樹脂11.0重量份及硬化劑1.4重量份,添加二乙二醇單乙基醚以使導電性糊劑中之銀微粒子之含量成為70wt%,使用自轉.公轉混練機「AWATORY練太郎ARE-310」(THINKY股份有限公司製造,註冊商標)進行預混合後,使用三軸輥進行均勻混練.分散處理,獲得導電性糊劑。 To 100 parts by weight of the silver fine particles of Example 1-1, 11.0 parts by weight of a polyester resin and 1.4 parts by weight of a curing agent were added, and diethylene glycol monoethyl ether was added so that the content of silver fine particles in the conductive paste became 70% by weight. , use rotation. The remixing machine "AWATORY ritaro ARE-310" (manufactured by THINKY Co., Ltd., registered trademark) is premixed and then uniformly kneaded using a triaxial roller. Dispersion treatment to obtain a conductive paste.

將上述獲得之導電性糊劑塗佈於膜厚50μm之聚醯亞胺薄膜上,分別在120℃、210℃及300℃下加熱30分鐘獲得導電性塗膜。 The conductive paste obtained above was applied onto a polyimide film having a thickness of 50 μm, and heated at 120 ° C, 210 ° C, and 300 ° C for 30 minutes to obtain a conductive coating film.

所得導電性塗膜在120℃加熱處理30分鐘時之比電阻為9.5×10-6Ω.cm,在210℃加熱處理30分鐘時之比電阻為4.1×10-6Ω.cm,在300℃加熱處理30分鐘時之比電阻為2.6×10-6Ω.cm。 The specific resistance of the obtained conductive coating film after heat treatment at 120 ° C for 30 minutes is 9.5 × 10 -6 Ω. Cm, the specific resistance at a temperature of 210 ° C for 30 minutes is 4.1 × 10 -6 Ω. Cm, the specific resistance is 2.6×10 -6 Ω when heat treated at 300 ° C for 30 minutes. Cm.

依據前述實施例1-1及實施例2-1製作銀微粒子及導電性糊劑。列示各製造條件及所得銀微粒子以及導電性糊劑之諸特性。 Silver fine particles and a conductive paste were produced in accordance with the above Examples 1-1 and 2-1. The properties of each of the production conditions and the obtained silver fine particles and the conductive paste are listed.

實施例1-2~1-3及比較粒1-1~1-2: Examples 1-2 to 1-3 and comparative particles 1-1 to 1-2:

藉由分別改變銀微粒子之各種生成條件,獲得銀微粒子。 Silver fine particles are obtained by changing various generation conditions of silver fine particles, respectively.

此時之製造條件示於表1,所得銀微粒子之諸特性示於表3。 The manufacturing conditions at this time are shown in Table 1, and the characteristics of the obtained silver fine particles are shown in Table 3.

〈實施例1-4:銀微粒子之製造〉 <Example 1-4: Production of silver fine particles>

將高分子化合物「DISPERBYK-106」(商品名:日本BYK化學股份有限公司製造)60g添加於已置入甲醇與水之混合溶液(甲醇:水=10:1)5.17kg之容器中。接著,測定實施例1-1所得之經洗淨.過濾後之銀微粒子之固體成分中之銀微粒子之含有濃度,以銀微粒子計成為3kg之方式計量.添加前述銀微粒子之固體成分後,經攪拌.混合100分鐘後,蒸餾去除甲醇,在真空乾燥機中於30℃乾燥7小時後,以噴射式粉碎機粉碎獲得實施例1-4之銀微粒子。 60 g of a polymer compound "DISPERBYK-106" (trade name: manufactured by BYK Chemical Co., Ltd., Japan) was placed in a container in which 5.17 kg of a mixed solution of methanol and water (methanol: water = 10:1) was placed. Next, the washing obtained in Example 1-1 was measured. The concentration of the silver fine particles in the solid content of the filtered silver fine particles is measured in a manner of 3 kg in terms of silver fine particles. After adding the solid component of the aforementioned silver microparticles, it is stirred. After mixing for 100 minutes, methanol was distilled off, and dried in a vacuum dryer at 30 ° C for 7 hours, and then pulverized by a jet mill to obtain silver fine particles of Example 1-4.

實施例1-5~1-6: Examples 1-5~1-6:

藉由分別改變高分子化合物之種類及處理條件,獲得銀微粒子。 Silver fine particles are obtained by changing the type of the polymer compound and the processing conditions, respectively.

此時之製造條件示於表2,所得銀微粒子之諸特性示於表3。 The manufacturing conditions at this time are shown in Table 2, and the characteristics of the obtained silver fine particles are shown in Table 3.

〈導電性塗料之製造〉 <Manufacture of Conductive Coatings> 實施例2-2~2-6及比較例2-1~2-2: Examples 2-2 to 2-6 and Comparative Examples 2-1 to 2-2:

除分別改變銀微粒子之種類以外,餘依據前述實施例2-1之導電性塗料之製作方法而製造導電性塗料及導電性膜。 In addition to the type of the silver fine particles, the conductive paint and the conductive film were produced in accordance with the method for producing the conductive paint of the above-described Example 2-1.

此時之製造條件及所得導電性塗膜之諸特性示於表4。 The production conditions at this time and the properties of the obtained conductive coating film are shown in Table 4.

產業上之可利用性 Industrial availability

本發明之銀微粒子係由於還原反應後之碳含量低,故適合作為可低溫燒成之導電性糊劑等之原料。 Since the silver fine particle system of the present invention has a low carbon content after the reduction reaction, it is suitable as a raw material for a conductive paste which can be fired at a low temperature.

且,本發明之銀微粒子之製造方法由於可降低還原反應後之銀微粒子之碳含量,同時可以高收率獲得銀微粒子,故適合作為低溫燒結性優異之銀微粒子之製造方法。 In addition, since the method for producing silver fine particles of the present invention can reduce the carbon content of the silver fine particles after the reduction reaction and obtain silver fine particles in a high yield, it is suitable as a method for producing silver fine particles excellent in low-temperature sinterability.

Claims (7)

一種銀微粒子之製造方法,其特徵為調製使用硝酸銀、一種以上之水溶性或水可溶性的碳數2~4之脂肪族胺所調製之硝酸銀之胺錯合物之醇溶液(A液),調製與前述A液不同之使抗壞血酸或異抗壞血酸(erythorbic acid)與鹵化物溶解而成之水溶液(B液),將使用靜止型混合機混合前述A液與前述B液而成者添加於加入水之容器中並攪拌後,使所得銀微粒子經洗淨.乾燥,其中藉由於前述B液中添加對硝酸銀1莫耳而言為1.6×10-3莫耳以上之鹵化物。 A method for producing silver microparticles, which comprises preparing an alcohol solution (solution A) of silver nitrate amine complex prepared by using silver nitrate or more than one water-soluble or water-soluble aliphatic amine having 2 to 4 carbon atoms, and preparing An aqueous solution (solution B) obtained by dissolving ascorbic acid or erythorbic acid and a halide different from the above-mentioned liquid A, and mixing the liquid A and the liquid B with a static mixer to add water. After stirring in the container, the obtained silver particles are washed. The drying is carried out by adding a halide of 1.6 × 10 -3 mol or more to silver nitrate 1 mol in the liquid B described above. 一種以如請求項1之製造方法所得的銀微粒子,其特徵為銀微粒子之碳量為0.25重量%以下。 A silver fine particle obtained by the production method of claim 1, characterized in that the amount of carbon of the silver fine particles is 0.25 wt% or less. 如請求項2之銀微粒子,其中銀微粒子之粒子表面被分子量10,000以上之高分子化合物所被覆。 The silver fine particles of claim 2, wherein the surface of the particles of the silver fine particles is coated with a polymer compound having a molecular weight of 10,000 or more. 如請求項2或3之銀微粒子,其中平均粒徑(DSEM)為30nm以上120nm以下。 The silver fine particles of claim 2 or 3, wherein the average particle diameter (D SEM ) is 30 nm or more and 120 nm or less. 一種導電性糊劑,其係含有如請求項2~4中任一項之銀微粒子。 A conductive paste containing the silver fine particles according to any one of claims 2 to 4. 一種導電性膜,其係使用如請求項5之導電性糊劑所形成。 A conductive film formed using the conductive paste of claim 5. 一種電子裝置,其係具有如請求項6之導電性膜。 An electronic device having the conductive film of claim 6.
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