TW201338893A - Silver powder - Google Patents

Silver powder Download PDF

Info

Publication number
TW201338893A
TW201338893A TW102102302A TW102102302A TW201338893A TW 201338893 A TW201338893 A TW 201338893A TW 102102302 A TW102102302 A TW 102102302A TW 102102302 A TW102102302 A TW 102102302A TW 201338893 A TW201338893 A TW 201338893A
Authority
TW
Taiwan
Prior art keywords
silver
sem
silver powder
aqueous solution
powder
Prior art date
Application number
TW102102302A
Other languages
Chinese (zh)
Inventor
Keisuke Miyanohara
Toshikazu Matsuyama
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Publication of TW201338893A publication Critical patent/TW201338893A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • B22F1/052Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Conductive Materials (AREA)
  • Powder Metallurgy (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

The present invention provides a novel silver powder, capable of enhancing silver concentration of a silver paste and forming a homogeneous with sintering conductor lower resistance. In the silver powder, D50 (referred to ''SEMD50'') obtained from image analysis of scanning type electron microscope (SEM) is 2.50 μ m to 7.50 μ m, a relationship of D10 (referred to ''SEMD10''), D50 (referred to ''SEMD50''), and D90 (referred to ''SEMD90'') obtained from image analysis of scanning type electron microscope (SEM) is shown in the relation formula: (SEMD90-SEMD10)/SEMD50 ≤ 0.50.

Description

銀粉 Silver powder

本發明係關於可適用於燒結型導電性膏之銀粉。 The present invention relates to a silver powder which can be applied to a sintered conductive paste.

導電性膏係在由樹脂系黏合劑與溶媒構成之媒質(vehicle)中分散有導電填料之流動性組成物,廣泛使用於電氣電路之形成或陶瓷電容之外部電極之形成等。此種導電性膏有藉由樹脂硬化壓著導電性填料而確保導通之樹脂硬化型、及藉由高溫燒結揮發有機成分並燒結導電性填料而確保導通之燒結型。 The conductive paste is a fluid composition in which a conductive filler is dispersed in a vehicle composed of a resin-based adhesive and a solvent, and is widely used for formation of an electric circuit or formation of an external electrode of a ceramic capacitor. Such a conductive paste has a resin-cured type in which a conductive paste is pressed by a resin to ensure conduction, and a sintered type in which an organic component is volatilized by high-temperature sintering and a conductive filler is sintered to ensure conduction.

其中之燒結型導電性膏一般係在有機媒質中分散導電填料(金屬粉末)與玻璃料而成之膏狀組成物,藉由在400至800℃燒結以揮發有機媒質,復藉由燒結導電填料而確保導通性。此時,玻璃料具有將該導電膜接著於基板之作用,有機媒質之作用係作為使金屬粉末及玻璃料可印刷之有機液體媒體。 The sintered conductive paste is generally a paste composition in which an electrically conductive filler (metal powder) and a glass frit are dispersed in an organic medium, and is volatilized at 400 to 800 ° C to volatilize the organic medium, and the sintered conductive filler is recombined. And ensure continuity. At this time, the glass frit has a function of attaching the conductive film to the substrate, and the organic medium acts as an organic liquid medium which can print the metal powder and the glass frit.

如此燒結型導電性膏所使用之銀粉,以往為了對應電極或電路之細線化(fine line),一般要求為微粒且具有集中粒度分佈之銀粉,故提出對應之新穎技術。 The silver powder used in the sintered conductive paste is conventionally required to be a fine particle of a specific electrode or a circuit, and is generally required to be fine particles and has a silver particle having a concentrated particle size distribution. Therefore, a corresponding novel technique has been proposed.

此外,此種銀粉有以乾式法製作之乾式銀粉以及以濕式法製作之濕式銀粉,但濕式銀粉係由小微晶集合形成之單一粒子,故與乾式銀粉相比有燒成溫度低之特徵。 In addition, the silver powder has a dry silver powder prepared by a dry method and a wet silver powder produced by a wet method, but the wet silver powder is a single particle formed by a small crystallite collection, so that the firing temperature is lower than that of the dry silver powder. Characteristics.

在此,有關濕式銀粉,以往例如在專利文獻1中提出一種微粒銀粉,係藉由粉粒凝集少之單分散而具有接近之分散性,以掃描型電子顯微鏡像之圖像分析所得之一次粒子之平均粒徑DIA為0.6μm以下,使用前述一次粒子之平均粒徑DIA與藉由雷射繞射散射式粒度分佈測定法測得之平均粒徑D50以D50/DIA表示之凝集度為1.5以下,微晶徑為10nm以下,有機不純物含有量係以碳量換算為0.25wt%以下者。 Here, in the case of the wet silver powder, for example, Patent Document 1 proposes a fine particle silver powder which is obtained by image analysis of a scanning electron microscope image by monodispersion in which agglomeration of particles is small and has close dispersibility. the average particle diameter of D IA is 0.6μm or less, the use of the primary particles of an average particle diameter D IA and scattering particle size distribution determined by the method represented by the average particle diameter D 50 to D 50 by laser diffraction / D IA The degree of agglomeration is 1.5 or less, the crystallite diameter is 10 nm or less, and the organic impurity content is 0.25 wt% or less in terms of carbon amount.

此外,專利文獻2中提出一種球狀銀粉,係平均粒徑為0.1μm以上、未滿1μm,粒度分佈集中且高分散性,以雷射繞射法測定之累積10質量%粒徑表示為D10、累積50質量%粒徑表示為D50、累積90質量%粒徑表示為D90,以掃描型電子顯微鏡像之圖像分析所得之一次粒子之平均粒徑表示為DSEM時,D50為0.1μm以上、未滿1μm,且D50/DSEM之值為1.3以下,且(D90-D10)/D50之值為0.8以下者。 Further, Patent Document 2 proposes a spherical silver powder having an average particle diameter of 0.1 μm or more and less than 1 μm, a fine particle size distribution and high dispersibility, and a cumulative 10 mass% particle diameter measured by a laser diffraction method is represented as D10. The cumulative 50% by mass particle diameter is represented by D50, and the cumulative 90% by mass particle diameter is represented by D90. When the average particle diameter of the primary particles obtained by image analysis of the scanning electron microscope image is DSEM, the D50 is 0.1 μm or more. It is less than 1 μm, and the value of D50/DSEM is 1.3 or less, and the value of (D90-D10)/D50 is 0.8 or less.

(先行技術文獻) (prior technical literature)

專利文獻1:日本特開2005-48237號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2005-48237

專利文獻2:日本特開2010-70793號公報 Patent Document 2: Japanese Laid-Open Patent Publication No. 2010-70793

使用導電性膏形成電極或電路等之燒結導體時,形成均質且電阻更低之燒結導體為重要課題之一,其手段可考慮提高銀膏中之銀濃度之方法。 When a sintered conductor such as an electrode or a circuit is formed using a conductive paste, it is one of the important subjects to form a sintered conductor which is homogeneous and has a lower electric resistance, and a means for increasing the concentration of silver in the silver paste can be considered.

在此,本發明提供可提高銀膏中之銀濃度,並可形成均質且電阻更低之燒結導體之新穎銀粉。 Here, the present invention provides novel silver powder which can increase the concentration of silver in the silver paste and form a sintered conductor which is homogeneous and has a lower electrical resistance.

本發明提出一種銀粉,以掃描型電子顯微鏡像(SEM)之圖像分析所得之D50(稱為「SEMD50」)為2.50μm至7.50μm,以掃描型電子顯微鏡像(SEM)之圖像分析所得之D10(稱為「SEMD10」)、D50(稱為「SEMD50」)及D90(稱為「SEMD90」)之關係以關係式:(SEMD90-SEMD10)/SEMD50≦0.50表示。 The present invention provides a silver powder having a D50 (referred to as " SEM D50") obtained by image analysis of a scanning electron microscope image (SEM) of 2.50 μm to 7.50 μm, and image analysis by scanning electron microscope image (SEM). The relationship between the obtained D10 (referred to as " SEM D10"), D50 (referred to as " SEM D50"), and D90 (referred to as " SEM D90") is expressed by the relationship: ( SEM D90- SEM D10) / SEM D50 ≦ 0.50 .

本發明提出之銀粉可提高銀膏中之銀濃度,並可形成均質且電阻更低之燒結導體。 The silver powder proposed by the invention can increase the concentration of silver in the silver paste and form a sintered conductor which is homogeneous and has lower electrical resistance.

以往銀粉粒子因含多量微粒子,故總比表面積大,調製銀膏時需要大量之樹脂,因此難以提高膏中之銀濃度,其結果會提高燒結導體之電阻。相對於此,本發明所提出之銀粉因為粒徑較大同時粒徑趨於一致,故可提高銀膏中之銀濃度,可形成均質且電阻更低之燒結導體。 In the past, since the silver powder particles contain a large amount of fine particles, the total specific surface area is large, and a large amount of resin is required for preparing the silver paste. Therefore, it is difficult to increase the concentration of silver in the paste, and as a result, the electric resistance of the sintered conductor is increased. On the other hand, since the silver powder proposed by the present invention has a large particle diameter and a uniform particle diameter, the silver concentration in the silver paste can be increased, and a sintered conductor having a homogeneous and lower electric resistance can be formed.

接著根據實施形態例說明本發明,但本發明並不限定於以下說明之實施形態。 Next, the present invention will be described based on the embodiments, but the present invention is not limited to the embodiments described below.

<本銀粉> <本银粉>

本實施形態之銀粉(以下稱為「本銀粉」),以掃描型電子顯微鏡像(SEM)之圖像分析所得之D50(稱為「SEMD50」)為2.50μm至7.50μm,以掃描型電子顯微鏡像(SEM)之圖像分析所得之D10(稱為「SEMD10」)、D50(稱為「SEMD50」)及D90(稱為「SEMD90」)之關係為關係式:(SEMD90-SEMD10)/SEMD50≦0.50所示。 The silver powder (hereinafter referred to as "the present silver powder") of the present embodiment has a D50 (referred to as " SEM D50") obtained by image analysis of a scanning electron microscope image (SEM) of 2.50 μm to 7.50 μm, and is a scanning electron. The relationship between D10 (called " SEM D10"), D50 (called " SEM D50"), and D90 (referred to as " SEM D90") obtained by image analysis of a microscope image (SEM) is the relationship: ( SEM D90- SEM D10) / SEM D50 ≦ 0.50.

以下說明本銀粉之特徵。 The characteristics of the silver powder are described below.

(濕式銀粉) (wet silver powder)

本銀粉包含以濕式法製作之濕式銀粉、以乾式法製作之銀粉之任一者。其中較佳為濕式銀粉。 The present silver powder includes either a wet silver powder produced by a wet method or a silver powder produced by a dry method. Among them, wet silver powder is preferred.

濕式銀粉之特徵係由小微晶集合形成單一粒子,故與以乾式法製作之銀粉相比,具有在TMA測定中於500℃之收縮率大之特徵。若本銀粉為濕式銀粉,在TMA測定中於500℃之收縮為1.0至23.0%,其中宜為3.0%以上或23.0%以下,其中較佳為5.0%以上或23.0%以下。 The wet silver powder is characterized by the formation of a single particle from a small crystallite collection, and thus has a characteristic of a large shrinkage ratio at 500 ° C in the TMA measurement as compared with the silver powder produced by the dry method. If the present silver powder is a wet silver powder, the shrinkage at 500 ° C in the TMA measurement is 1.0 to 23.0%, preferably 3.0% or more or 23.0% or less, and preferably 5.0% or more or 23.0% or less.

此時,上述之TMA測定之收縮率可以如下方式測定。 At this time, the shrinkage ratio measured by the above TMA can be measured as follows.

使用銀粉(樣品)0.2g,施加493kg之荷重使成形為φ 3.8mm之圓柱狀。使用IKO-INSTRUMENTS公司製熱機械分析裝置(TMA)(EXSTAR6000TMA/SS6200), 一邊施加98mN之荷重一邊在空氣環境中以20℃/分之昇溫速度測定該成形體之縱方向之線收縮率(%),可求得500℃之熱收縮率(%)。 0.2 g of silver powder (sample) was used, and a load of 493 kg was applied to form a cylindrical shape of φ 3.8 mm. IKO-INSTRUMENTS thermomechanical analyzer (TMA) (EXSTAR6000TMA/SS6200), The linear shrinkage (%) in the longitudinal direction of the molded body was measured at a temperature increase rate of 20 ° C /min in an air atmosphere while applying a load of 98 mN, and a heat shrinkage ratio (%) at 500 ° C was obtained.

此外,根據濕式法可製作真球狀或略真球狀且大粒徑之粒子。即使是乾式法,藉由噴霧法或PVD法可製作球狀粒子,但噴霧法難以製作真球粒子,PVD法中即使可獲得真球也難以製作如本發明規定般大小的粒子。 Further, according to the wet method, particles having a true spherical shape or a slightly spherical shape and having a large particle diameter can be produced. Even in the dry method, spherical particles can be produced by a spray method or a PVD method. However, it is difficult to produce true spherical particles by a spray method, and it is difficult to produce particles having a size as specified in the present invention even in a PVD method.

(D50) (D50)

本銀粉中,以掃描型電子顯微鏡(SEM)像之圖像分析所得之D50(稱為「SEMD50」)為2.50μm至7.50μm係重要的。 In the present silver powder, it is important that the D50 (referred to as " SEM D50") obtained by image analysis of a scanning electron microscope (SEM) image is 2.50 μm to 7.50 μm.

若本銀粉之SEMD50為2.50μm以上,則可減少膏調製時之樹脂量,其結果可降低形成之燒結導體之電阻。此外,若SEMD50為7.50μm以下則可較安定地製造。 When the SEM D50 of the present silver powder is 2.50 μm or more, the amount of the resin at the time of paste preparation can be reduced, and as a result, the electric resistance of the formed sintered conductor can be lowered. Further, when the SEM D50 is 7.50 μm or less, it can be produced relatively stably.

因此,以相關觀點來看,本銀粉之SEMD50係宜為3.00μm以上或6.50μm以下,其中更佳為3.00μm以上或5.50μm以下。 Therefore, from the related viewpoint, the SEM D50 of the present silver powder is preferably 3.00 μm or more or 6.50 μm or less, more preferably 3.00 μm or more or 5.50 μm or less.

(粒度分佈) (Particle size distribution)

本銀粉中,掃描型電子顯微鏡(SEM)像之圖像分析所得之D10(稱為「SEMD10」)、D50(稱為「SEMD50」)及D90(稱為「SEMD90」)之關係為關係式:(SEMD90-SEMD10)/SEMD50≦0.50所示,此係重要的。 In the silver powder, the relationship between D10 (referred to as " SEM D10"), D50 (referred to as " SEM D50"), and D90 (referred to as " SEM D90") obtained by image analysis of a scanning electron microscope (SEM) image is The relationship: ( SEM D90- SEM D10) / SEM D50 ≦ 0.50, this is important.

在此,D10係表示以掃描型電子顯微鏡(SEM)像之圖像分析所得之粒度分佈中個數基準累積度 數10%之粒子徑,D50係表示該個數基準累積度數50%之粒子徑,D90係表示該個數基準累積度數90%之粒子徑。 Here, D10 represents the number-based cumulative degree in the particle size distribution obtained by image analysis of a scanning electron microscope (SEM) image. The particle diameter is 10%, D50 is the particle diameter of 50% of the number of bases, and D90 is the particle diameter of 90% of the number of bases.

若(SEMD90-SEMD10)/SEMD50的值為0.50以下,則可形成粒度分佈趨於一致且均質之導電性膏,可在某溫度域下於短時間中燒結。由此觀點來看,(SEMD90-SEMD10)/SEMD50的值較佳為0.20以上或0.44以下,其中更佳為0.20以上或0.40以下。 When the value of ( SEM D90- SEM D10)/ SEM D50 is 0.50 or less, a conductive paste having a uniform particle size distribution and uniformity can be formed, and it can be sintered in a short temperature in a certain temperature range. From this point of view, the value of ( SEM D90- SEM D10) / SEM D50 is preferably 0.20 or more or 0.44 or less, more preferably 0.20 or more or 0.40 or less.

但是即使含有些許微粒子或粗粒子對效果之影響亦少,大致來看粒度趨於一致即可。此代表若(SEMD90-SEMD10)/SEMD50之值為0.50以下,則亦可含微粒子或粗粒子。 However, even if a small amount of fine particles or coarse particles have little effect on the effect, the particle size tends to be uniform. If the value of ( SEM D90- SEM D10) / SEM D50 is 0.50 or less, fine particles or coarse particles may be contained.

此外,(SEMD90-SEMD10)/SEMD50之分佈係具有一頂點及兩側平滑傾斜之單峰性波峰所示者,與藉由分級而區隔之分佈有別。 In addition, the distribution of ( SEM D90- SEM D10) / SEM D50 has a apex and a singular peak with smooth slopes on both sides, which is different from the distribution by grading.

<製法> <Method>

接著以濕式法說明本銀粉較佳之製造方法之具體製造方法。但並不限定於如上述之濕式法。 Next, a specific manufacturing method of the preferred method for producing the silver powder will be described by a wet method. However, it is not limited to the wet method as described above.

若要用以往之濕式還元法製造大粒徑銀粉,則需要緩緩進行還元反應使粒子成長之過程。但若如此則會混有小粒徑或小粒徑之凝集體,故難以獲得集中之粒度分佈。此外,以噴霧法可製造大粒徑,但因粒子過於安定而燒結溫度變高,會變成不適合於燒結型導電性膏所使用之銀粉。除此之外,藉由分級可得大粒徑且集中之粒度分佈,但有生產性之問題。 In order to manufacture large-size silver powder by the conventional wet-reduction method, it is necessary to slowly carry out a process of regenerating the particles to grow the particles. However, if agglomerates having a small particle size or a small particle diameter are mixed, it is difficult to obtain a concentrated particle size distribution. Further, a large particle diameter can be produced by a spray method, but the sintering temperature becomes high due to excessively stable particles, and it becomes a silver powder which is not suitable for use in a sintered conductive paste. In addition to this, a large particle size and a concentrated particle size distribution can be obtained by classification, but there is a problem of productivity.

在此,本發明藉由提高還元反應所使用之還元劑溶液之溶氧,使銀原料溶液、還元劑溶液及其他添加劑在靜止狀態下反應,成功獲得大粒徑且粒徑趨於一致之銀粉。亦即,若還元劑溶液中之溶氧較少則還元反應立即開始並形成微粒子,但溶氧較多則首先為溶氧之還元反應,故可爭取銀反應至還元析出為止之時間。因此,在該期間還元劑溶液之液組成成為均質且沉靜之狀態,結果可使還元析出之粒度趨於一致,可得一次粒子之粒徑大且粒徑趨於一致之濕式銀粉。 Here, the present invention succeeds in obtaining a silver powder having a large particle diameter and a uniform particle diameter by increasing the dissolved oxygen of the reductant solution used in the reductive reaction, and reacting the silver raw material solution, the reductant solution, and other additives in a static state. . That is, if the dissolved oxygen in the reductant solution is less, the reductive reaction starts immediately and forms fine particles. However, if the dissolved oxygen is large, the dissolved oxygen is first reacted, so that the silver reaction can be obtained until the time of precipitation. Therefore, during this period, the liquid composition of the reductant solution becomes a homogeneous and quiet state, and as a result, the particle size of the reductive precipitation tends to be uniform, and a wet silver powder having a large particle diameter of the primary particles and a uniform particle diameter can be obtained.

在此說明本銀粉之製造方法之一具體例。 Here, a specific example of the method for producing the present silver powder will be described.

首先在硝酸銀等銀水溶液加入錯化劑,視需要加入硬脂酸Na或K等硬脂酸鹽並攪拌後,添加已提高溶氧量之還元劑溶液,接著視需要添加分散劑後一邊攪拌一邊反應使銀粒子還元析出,其後經過過濾、洗淨、乾燥等步驟可得本銀粉。 First, a staggering agent is added to a silver aqueous solution such as silver nitrate, and stearic acid such as Na or K stearate is added as needed, and after stirring, a resolving agent solution having an increased dissolved oxygen amount is added, and then a dispersing agent is added as needed, followed by stirring. The reaction causes the silver particles to be precipitated in a predetermined manner, and then the silver powder is obtained by a step of filtration, washing, drying, and the like.

在此,還元劑溶液係於純水中添加還元劑(聯胺)而調製,此時,藉由在純水中添加還元劑(聯胺)起至添加於銀水溶液為止之時間,可調整還元劑溶液中之溶氧量。亦即若在純水中添加還元劑(聯胺),則原本在純水所含之溶氧會因還元劑(聯胺)之還元作用而消費,並隨著經過時間而變少,故在純水添加還元劑(聯胺)後,較佳為盡量在短時間內添加於銀溶液。 Here, the reductant solution is prepared by adding a reductant (a hydrazine) to pure water, and at this time, the reductive amount can be adjusted by adding a reductant (a hydrazine) to the silver aqueous solution in pure water. The amount of dissolved oxygen in the solution. That is, if a reductant (diammine) is added to pure water, the dissolved oxygen originally contained in the pure water will be consumed by the reductive action of the reductant (the hydrazine), and will become less as time passes, so After the pure water is added to the reductant (diammine), it is preferably added to the silver solution as soon as possible in a short time.

但是也可對純水進行通氣等使溶液中之溶氧量增加。 However, it is also possible to ventilate pure water to increase the amount of dissolved oxygen in the solution.

上述之製法中,硝酸銀等銀水溶液可使用含有硝酸銀、銀鹽錯合物及銀中間體之任一者之水溶液或漿液。 In the above production method, an aqueous solution or slurry containing any one of silver nitrate, a silver salt complex, and a silver intermediate can be used as the silver aqueous solution such as silver nitrate.

此外,錯化劑例如可舉出氨水,銨鹽,螯合化合物等。 Further, examples of the neutralizing agent include ammonia water, an ammonium salt, a chelate compound and the like.

還元劑可舉出含有抗壞血酸、亞硫酸鹽、烷醇胺、過氧化氫水、甲酸、甲酸銨、甲酸鈉、乙二醛、酒石酸、次亞磷酸鈉、氫化硼金屬鹽、二甲基胺硼烷、聯胺、聯胺化合物、氫醌、鄰苯三酚(pyrogallol)、葡萄糖、沒食子酸(gallic acid)、福馬林、無水亞硫酸鈉、雕白粉(rongalite)等之水溶液。 Examples of the reductant include ascorbic acid, sulfite, alkanolamine, hydrogen peroxide water, formic acid, ammonium formate, sodium formate, glyoxal, tartaric acid, sodium hypophosphite, metal hydride, dimethylamine borane An aqueous solution of a hydrazine, a hydrazine compound, hydroquinone, pyrogallol, glucose, gallic acid, formalin, anhydrous sodium sulfite, rongalite, or the like.

分散劑可舉出脂肪酸、脂肪酸鹽、界面活性劑、有機金屬、螯合劑、保護膠體等。 The dispersing agent may, for example, be a fatty acid, a fatty acid salt, a surfactant, an organic metal, a chelating agent, a protective colloid or the like.

(形狀加工) (shape processing)

本銀粉可直接利用,但也可以將本銀粉進行形狀加工處理後利用。 The silver powder can be directly used, but the silver powder can also be used after being processed into a shape.

例如可將球狀粒子粉末(:含有80%以上球狀粒子之粉末)進行機械性形狀加工,亦可將薄片狀、鱗片狀、平板狀等之非球狀粒子粉末(:含有80%以上非球狀粒子之粉末)進行加工。 For example, a spherical particle powder (a powder containing 80% or more of spherical particles) may be subjected to mechanical shape processing, and a non-spherical particle powder such as a flake, a scaly or a flat plate may be used (: 80% or more of non-containing powder) The powder of spherical particles is processed.

更具體來說係使用珠磨機、球磨機、磨碎機(attritor)、振動研磨機等進行機械性扁平化加工(壓伸延或展伸),藉此可進行形狀加工成為薄片狀粒子粉末(:含有80%以上薄片狀粒子之粉末)。此時為了一邊防止粒子 彼此凝集或結合一邊將各粒子以獨立狀態加工,故較佳為添加例如硬脂酸等脂肪酸或界面活性劑等助劑。 More specifically, it is mechanically flattened (press-stretched or stretched) using a bead mill, a ball mill, an attritor, a vibrating mill, or the like, whereby the shape can be processed into a flaky particle powder (: a powder containing 80% or more of flaky particles). At this time, in order to prevent particles Since the particles are processed in an independent state while being agglomerated or bonded to each other, it is preferred to add an auxiliary agent such as a fatty acid such as stearic acid or a surfactant.

於是可利用如此經形狀加工處理之銀粉,此外也可將其與未經形狀加工之元粉混合利用。 Thus, the silver powder thus processed by the shape can be used, and it can also be used in combination with the unprocessed elemental powder.

本銀粉因粒徑趨於一致,故可有效地選擇適宜該粒徑之媒體,因此即使作為薄片粉亦可得均質之薄片粉粒子。 Since the silver powder tends to have a uniform particle size, it is possible to effectively select a medium suitable for the particle size, so that even if it is a flake powder, homogeneous flake powder particles can be obtained.

亦可為球形粉與薄片粉之混合粉。 It can also be a mixed powder of spherical powder and flake powder.

<用途> <Use>

本銀粉係適合於導電膏用銀粉,尤其是燒結型導電性膏用銀粉。 The silver powder is suitable for silver powder for conductive paste, especially silver powder for sintered conductive paste.

例如可在有機媒質中將本銀粉與玻璃料一起混合,藉此調製燒結型導電性膏。 For example, the present silver powder may be mixed with a glass frit in an organic medium to prepare a sintered conductive paste.

此時玻璃料可舉出例如鉛硼矽玻璃、或鋅硼矽等無鉛玻璃。 In this case, the glass frit may be, for example, lead-boron-glass or lead-free glass such as zinc-boron.

此外,樹脂黏合劑可使用例如任意之樹脂黏合劑。例如較佳為採用含有由環氧樹脂、聚酯樹脂、矽樹脂、尿素樹脂、丙烯酸系樹脂、纖維素樹脂選出之1種以上之組成。 Further, as the resin binder, for example, any resin binder can be used. For example, it is preferable to use a composition containing one or more selected from the group consisting of epoxy resin, polyester resin, enamel resin, urea resin, acrylic resin, and cellulose resin.

<語句之說明> <Description of statement>

本說明書中表現「X至Y」(X、Y係任意數字)時,在未特別說明下包括「X以上Y以下」之意思及「較佳為大於X」或「較佳為小於Y」之意思。 In the present specification, the expression "X to Y" (X, Y is any number) includes "X or above Y" and "preferably greater than X" or "preferably less than Y" unless otherwise specified. meaning.

此外表現「X以上」(X為任意數字)或「Y 以下」(Y為任意數字)時,也包括「較佳為大於X_或「較佳為未滿Y」之意思。 In addition, the performance "X or above" (X is an arbitrary number) or "Y" The following "(Y is an arbitrary number)" also includes "preferably greater than X_ or "preferably less than Y".

實施例Example

以下根據下述實施例及比較例更詳述本發明。 Hereinafter, the present invention will be described in more detail based on the following examples and comparative examples.

實施例及比較例所得之銀粉,係用以下所示方法評價各特性。 The silver powder obtained in the examples and the comparative examples was evaluated for each characteristic by the method shown below.

(1)SEMD10、SEMD50、SEMD90 (1) SEM D10, SEM D50, SEM D90

使用掃描型電子顯微鏡(SEM)(PHILIPS公司製XL30)於1000至3000倍下拍攝任意3視野之掃描型電子顯微鏡(SEM)圖像,變更為BMP檔,以ASAHI-ENGINEERING股份有限公司製IP-1000PC之統合應用軟體之A像君讀取,以圓度閾值50、重疊度30、標本數150至350進行圓形粒子分析,不加以手動修正而計測SEMD10、SEMD50、SEMD90。 A scanning electron microscope (SEM) image of any three fields of view was taken at 1000 to 3000 times using a scanning electron microscope (SEM) (SEM30 manufactured by PHILIPS), and changed to a BMP file, and IP-made by ASAHI-ENGINEERING Co., Ltd. SEM D10, SEM D50, and SEM D90 were measured without a manual correction.

(2)溶氧 (2) Dissolved oxygen

使用HORIBA製作所製DO(溶氧)計(OM-51),測定聯胺水溶液中之溶氧濃度。 The dissolved oxygen concentration in the aqueous hydrazine solution was measured using a DO (dissolved oxygen) meter (OM-51) manufactured by HORIBA.

(3)均質性之評價 (3) Evaluation of homogeneity

在銀粉3.5g中一邊少量分次添加含有5%乙基纖維素(100cp)之萜品醇,一邊攪拌混合,在樹脂溶合一致之時點測定樹脂添加量(Xg)。以下式求膏中之銀濃度,將95%以上之值判讀為均質性高。 While adding a small amount of terpineol containing 5% ethylcellulose (100 cp) in a small amount of 3.5 g of silver powder, the mixture was stirred and mixed, and the amount of resin added (Xg) was measured at the time when the resin was dissolved. The following formula is used to determine the silver concentration in the paste, and the value of 95% or more is judged to be high in homogeneity.

(膏中之銀濃度(%))={(銀粉3.5g)/(銀粉3.5g +樹脂添加量Xg)}×100 (silver concentration (%) in the paste) = {(silver powder 3.5g) / (silver powder 3.5g) + resin addition amount Xg)}×100

<實施例1> <Example 1>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液6mL並攪拌,混合溶氧濃度調整為6.00至8.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 6 mL of an aqueous solution of a 1%-concentration amine dispersant (average molecular weight 10000) was added to an aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 6.00 to 8.00 mg/L of 11.9 g/ 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。所得銀粉粒子係略真球狀。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying. The obtained silver powder particles are slightly spherical.

<實施例2> <Example 2>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液10mL並攪拌,混合溶氧濃度調整為6.00至8.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 10 mL of a 1% aqueous solution of an amine-based dispersant (average molecular weight 10,000) was added to the aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 6.00 to 8.00 mg/L of 11.9 g/ 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。所得銀 粉粒子係略真球狀。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying. Silver obtained The powder particles are slightly spherical.

<實施例3> <Example 3>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20℃之銀氨錯合物水溶液中添加溶氧濃度調整為6.00至8.00mg/L之濃度11.9g/L之聯胺水溶液1L與濃度2.9g/L之脂肪酸鹽水溶液35mL(對銀1mol相當為1.76×10-3mol)之混合溶液,不攪拌使反應而還元析出銀粒子。 Then, 1 L of a hydrazine aqueous solution having a dissolved oxygen concentration of 6.00 to 8.00 mg/L and a concentration of 2.9 g/L of a fatty acid salt aqueous solution of 35 mL (concentration of 1 mol of silver) was added to an aqueous solution of silver ammonia complex at 20 ° C. A mixed solution of approximately 1.76 × 10 -3 mol) was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。所得銀粉粒子係略真球狀。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying. The obtained silver powder particles are slightly spherical.

<實施例4> <Example 4>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。接著在20℃之銀氨錯合物水溶液中添加溶氧濃度調整為6.00至8.00mg/L之濃度11.9g/L之聯胺水溶液1L與濃度5g/L之明膠水溶液48mL(對銀1mol相當為1.29g)之混合溶液,不攪拌使反應而還元析出銀粒子。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex. Then, 1 L of a hydrazine aqueous solution having a dissolved oxygen concentration of 6.00 to 8.00 mg/L and a concentration of 5 g/L of a gelatin aqueous solution of 48 mL (adjusted to 1 mol of silver) was added to an aqueous solution of silver ammonia complex at 20 ° C. 1.29 g) of the mixed solution, the reaction was carried out without stirring to precipitate silver particles.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。所得銀粉粒子係略真球狀。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying. The obtained silver powder particles are slightly spherical.

<比較例1> <Comparative Example 1>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液6mL並攪拌,混合溶氧濃度調整為3.00至5.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 6 mL of an aqueous solution of an amine-based dispersant (average molecular weight 10000) of 1% concentration was added to an aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 1.00 g / 5.00 mg / L of 11.9 g / 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

<比較例2> <Comparative Example 2>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液6mL並攪拌,混合溶氧濃度調整為0.20至2.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 6 mL of a 1% strength aqueous solution of an amine dispersant (average molecular weight 10000) was added to an aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 12.0 to 2.00 mg/L of 11.9 g/ 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

<比較例3> <Comparative Example 3>

將銀濃度400g/L之硝酸銀水溶液50mL溶解 於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 Dissolve 50 mL of silver nitrate solution with a silver concentration of 400 g/L In 1 L of pure water, a silver nitrate aqueous solution was prepared, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous silver ammonia complex solution.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液10mL並攪拌,混合溶氧濃度調整為3.00至5.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 10 mL of a 1% aqueous solution of an amine-based dispersant (average molecular weight 10,000) was added to the aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 1.00 g/5.00 mg/L of 11.9 g/ 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

<比較例4> <Comparative Example 4>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20至30℃之銀氨錯合物水溶液中添加1%濃度之胺系分散劑(平均分子量10000)水溶液10mL並攪拌,混合溶氧濃度調整為0.20至2.00mg/L之濃度11.9g/L之聯胺水溶液1L,不攪拌使反應而還元析出銀粒子。 Next, 10 mL of an aqueous solution of a 1%-concentration amine dispersant (average molecular weight 10000) was added to an aqueous solution of silver ammonia complex at 20 to 30 ° C and stirred, and the mixed dissolved oxygen concentration was adjusted to a concentration of 0.20 to 2.00 mg/L of 11.9 g/ 1 L of the aqueous hydrazine solution of L was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

<比較例5> <Comparative Example 5>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水60mL並攪拌,藉此獲得銀氨錯合物水溶液。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 60 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous solution of silver ammonia complex.

接著在20℃之銀氨錯合物水溶液中添加溶氧濃度調整為0.20至2.00mg/L之濃度11.9g/L之聯胺水溶液1L與濃度2.9g/L之脂肪酸鹽水溶液35mL(對銀1mol相當為1.76×10-3mol)之混合溶液,不攪拌使反應而還元析出銀粒子。 Then, 1 L of a hydrazine aqueous solution having a dissolved oxygen concentration of 0.20 to 2.00 mg/L and a concentration of 2.9 g/L of a fatty acid salt solution of 35 mL (1 mol of silver) was added to an aqueous solution of silver ammonia complex at 20 ° C. A mixed solution of approximately 1.76 × 10 -3 mol) was used to precipitate the silver particles without stirring.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

<比較例6> <Comparative Example 6>

將銀濃度400g/L之硝酸銀水溶液50mL溶解於純水1L以調製硝酸銀水溶液,添加濃度25質量%之氨水50mL並攪拌,藉此獲得銀氨錯合物水溶液。接著在20℃之銀氨錯合物水溶液中添加溶氧濃度調整為0.20至2.00mg/L之濃度11.9g/L之聯胺水溶液1L與濃度5g/L之明膠水溶液48mL(對銀1mol相當為1.29g)之混合溶液,不攪拌使反應而還元析出銀粒子。 50 mL of a silver nitrate aqueous solution having a silver concentration of 400 g/L was dissolved in 1 L of pure water to prepare a silver nitrate aqueous solution, and 50 mL of ammonia water having a concentration of 25% by mass was added thereto and stirred to obtain an aqueous silver ammonia complex solution. Then, 1 L of a hydrazine aqueous solution having a dissolved oxygen concentration of 0.20 to 2.00 mg/L and a concentration of 5 g/L of a gelatin aqueous solution of 48 mL (adjusted to 1 mol of silver) was added to an aqueous solution of silver ammonia complex at 20 ° C. 1.29 g) of the mixed solution, the reaction was carried out without stirring to precipitate silver particles.

接著過濾該銀粒子,水洗至濾液之導電率為40μS/cm以下後,藉由乾燥而獲得銀粉(樣品)。 Subsequently, the silver particles were filtered, washed with water until the conductivity of the filtrate was 40 μS/cm or less, and then silver powder (sample) was obtained by drying.

(考察) (examine)

實施例之銀粉與比較例之銀粉及以往所知銀粉相比為大粒子,同時粒徑趨於一致,故若用其製作銀膏可提高銀濃度,並可形成均質且電阻更低之燒結導體。 The silver powder of the embodiment is larger than the silver powder of the comparative example and the silver powder of the prior art, and the particle diameter tends to be uniform. Therefore, if the silver paste is used for the purpose, the silver concentration can be increased, and a sintered conductor having a homogeneous and lower electrical resistance can be formed. .

由如此觀點來看,認為本銀粉中較佳為SEMD50為2.50μm至7.50μm,且(SEMD90-SEMD10)/SEMD50≦0.50。 From this point of view, it is considered that the SEM D50 of the present silver powder is 2.50 μm to 7.50 μm, and ( SEM D90- SEM D10) / SEM D50 ≦ 0.50.

Claims (4)

一種銀粉,係掃描型電子顯微鏡像(SEM)之圖像分析所得之D50(稱為「SEMD50」)為2.50μm至7.50μm,且掃描型電子顯微鏡像(SEM)之圖像分析所得之D10(稱為「SEMD10」)、D50(稱為「SEMD50」)及D90(稱為「SEMD90」)之關係以關係式:(SEMD90-SEMD10)/SEMD50≦0.50表示。 A silver powder obtained by image analysis of a scanning electron microscope image (SEM) has a D50 (referred to as " SEM D50") of 2.50 μm to 7.50 μm, and a D10 obtained by image analysis of a scanning electron microscope image (SEM). The relationship between (referred to as " SEM D10"), D50 (referred to as " SEM D50"), and D90 (referred to as " SEM D90") is expressed by the relationship: ( SEM D90- SEM D10) / SEM D50 ≦ 0.50. 如申請專利範圍第1項所述之銀粉,其係濕式銀粉。 The silver powder described in claim 1 is a wet silver powder. 一種銀粉,係將申請專利範圍第1項或第2項所述之銀粉進行形狀加工處理而形成。 A silver powder is formed by subjecting a silver powder according to item 1 or 2 of the patent application to a shape processing. 一種燒結型導電性膏,係使用申請專利範圍第1至3項中任一項所述之銀粉構成。 A sintered conductive paste comprising the silver powder according to any one of claims 1 to 3.
TW102102302A 2012-03-12 2013-01-22 Silver powder TW201338893A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012054119A JP5985216B2 (en) 2012-03-12 2012-03-12 Silver powder

Publications (1)

Publication Number Publication Date
TW201338893A true TW201338893A (en) 2013-10-01

Family

ID=49160568

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102102302A TW201338893A (en) 2012-03-12 2013-01-22 Silver powder

Country Status (5)

Country Link
JP (1) JP5985216B2 (en)
KR (1) KR20140089365A (en)
CN (1) CN103930226B (en)
TW (1) TW201338893A (en)
WO (1) WO2013136615A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6282616B2 (en) * 2014-07-30 2018-02-21 Dowaエレクトロニクス株式会社 Silver powder and method for producing the same
KR101930285B1 (en) * 2016-10-31 2018-12-19 엘에스니꼬동제련 주식회사 Electrode Paste For Solar Cell's Electrode And Solar Cell using the same
CN110586959A (en) * 2019-10-28 2019-12-20 苏州银瑞光电材料科技有限公司 Preparation method of flake silver powder with high tap density

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4352121B2 (en) * 2003-04-02 2009-10-28 Dowaエレクトロニクス株式会社 Copper powder manufacturing method
JP2007270312A (en) * 2006-03-31 2007-10-18 Mitsui Mining & Smelting Co Ltd Method for manufacturing silver powder, and silver powder
JP4879762B2 (en) * 2007-01-24 2012-02-22 三井金属鉱業株式会社 Silver powder manufacturing method and silver powder
JP5305789B2 (en) * 2007-08-31 2013-10-02 Dowaエレクトロニクス株式会社 Silver powder manufacturing method
JP5355007B2 (en) * 2008-09-17 2013-11-27 Dowaエレクトロニクス株式会社 Method for producing spherical silver powder
JP5725699B2 (en) * 2009-08-21 2015-05-27 Dowaエレクトロニクス株式会社 Silver powder and method for producing silver powder
JP2011052300A (en) * 2009-09-04 2011-03-17 Dowa Electronics Materials Co Ltd Flaky silver powder, method for producing the same, and conductive paste
JP2011208278A (en) * 2010-03-10 2011-10-20 Dowa Holdings Co Ltd Flaky silver powder and method for producing the same
CN102157220B (en) * 2011-02-28 2013-09-18 张振中 Special Ag paste for grid line electrode at front surface of crystalline silicon solar battery

Also Published As

Publication number Publication date
JP5985216B2 (en) 2016-09-06
KR20140089365A (en) 2014-07-14
CN103930226B (en) 2016-03-02
WO2013136615A1 (en) 2013-09-19
JP2013185251A (en) 2013-09-19
CN103930226A (en) 2014-07-16

Similar Documents

Publication Publication Date Title
KR101193762B1 (en) Process for making highly dispersible spherical silver powder particles and silver particles formed therefrom
JP6274444B2 (en) Method for producing copper powder
CN101801568B (en) Process for producing copper powder and copper powder
KR100954425B1 (en) Method for preparation of silver powder by continuous solution reduction
US7534283B2 (en) Method of producing copper powder and copper powder
KR101927476B1 (en) Silver powder and manufacturing method of the same
KR100713241B1 (en) Method of manufacturing silver powder by chemical reduction
JP2012525506A (en) Silver particles and method for producing the same
KR20150028970A (en) Silver powder
JP6857166B2 (en) Spherical silver powder and its manufacturing method
TW201338893A (en) Silver powder
KR101061841B1 (en) Method for producing monodisperse spherical silver powder by chemical reduction method
JP2017039991A (en) Silver-coated copper powder, method for producing the same, and conductive paste using the same
JP2017166048A (en) Copper powder and manufacturing method therefor, and conductive paste
KR101853420B1 (en) Silver powder sintered at high temperature and method of manufacturing the same
JP6577316B2 (en) Copper powder for conductive paste and method for producing the same
JP2002115001A (en) Fine copper powder for forming circuit
JP2019186225A (en) Copper powder for conductive paste and manufacturing method therefor
WO2017179524A1 (en) Silver-coated copper powder and method for producing same
WO2020017564A1 (en) Method for producing spherical silver powder
WO2019117235A1 (en) Spherical silver powder and method for producing same
JP2018076597A (en) Silver coated copper powder and conductive paste, as well as production method thereof
JP2021088756A (en) Production method of copper particle
JP2021501267A (en) Method of manufacturing silver powder and conductive paste containing silver powder