TW201329587A - Production apparatus of optical film, method for producing optical film, and optical film - Google Patents

Production apparatus of optical film, method for producing optical film, and optical film Download PDF

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TW201329587A
TW201329587A TW102100306A TW102100306A TW201329587A TW 201329587 A TW201329587 A TW 201329587A TW 102100306 A TW102100306 A TW 102100306A TW 102100306 A TW102100306 A TW 102100306A TW 201329587 A TW201329587 A TW 201329587A
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alignment
exposure
optical film
layer
film
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TW102100306A
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Chinese (zh)
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Kazuhiro Ura
Tatsuya Sato
Ryosuke Yasui
Koji Imayoshi
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Arisawa Seisakusho Kk
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Publication of TW201329587A publication Critical patent/TW201329587A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/007Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3016Polarising elements involving passive liquid crystal elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • G02F1/133631Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • G02F1/133633Birefringent elements, e.g. for optical compensation using mesogenic materials
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • G02F1/133638Waveplates, i.e. plates with a retardation value of lambda/n

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Coating Apparatus (AREA)
  • Laminated Bodies (AREA)

Abstract

It is known that a pattern is formed on a film by coating an optical alignment resin on a film and processing an exposure through a photomask. However, a boundary of an alignment pattern can not clearly be formed in a situation that an elongated film is transported while the exposure is processed in a roll-to-roll process. A production apparatus of an optical film is provided, which transported the elongated film continuously while the optical film with a plurality of alignment areas is produced, wherein the production apparatus of the optical film includes a support roll supporting the film, and an exposuring part which is disposed opposite to the support roll and exposes the photoalignment resin of the film using a polarized light through a mask, so as to produce the plurality of alignment areas in which molecular alignment directions are different from each other in the photoalignment resin. The support roll has a suppressing part which suppresses a reflection of an exposuring light.

Description

光學膜製造裝置、光學膜的製造方法及光學膜 Optical film manufacturing apparatus, optical film manufacturing method, and optical film

本發明涉及光學膜製造裝置、光學膜的製造方法及光學膜。 The present invention relates to an optical film manufacturing apparatus, a method of producing an optical film, and an optical film.

以前所知的技術是:在長條狀的膜上塗布抗蝕劑,一邊使用多個輥對膜進行支撐,一邊通過光掩膜(photo mask)進行曝光,從而在膜上形成圖案(例如專利文獻1)。另外還知道的技術是:為了更加精確地形成用於對設置在太陽能電池等上的薄膜層進行分割的槽(Scribe),使用基板支撐裝置在薄膜層上形成槽,該基板支撐裝置具有用於使雷射透過或衰減的介電層以及用於對雷射進行吸收的光吸收層的雙層構成(例如專利文獻2)。 A technique known in the prior art is to apply a resist on a long film, and to support a film by using a plurality of rollers while exposing through a photo mask to form a pattern on the film (for example, a patent) Document 1). It is also known that in order to more accurately form a groove for dividing a film layer provided on a solar cell or the like, a groove is formed on the film layer using a substrate supporting device, the substrate supporting device having A two-layer structure of a dielectric layer that transmits or attenuates a laser and a light absorbing layer that absorbs a laser (for example, Patent Document 2).

專利文獻1:日本專利特開平4-97155號公報 Patent Document 1: Japanese Patent Laid-Open No. Hei 4-97155

專利文獻2:日本專利特開平10-27918號公報 Patent Document 2: Japanese Patent Laid-Open No. Hei 10-27918

然而,根據專利文獻1的方法,由於要對膜中位於輥間的區域進行曝光,因此會在被曝光的膜上產生皺紋。於是,雖然亦考慮在輥上對膜進行曝光,但此時,由於來自於輥的多餘的反射光會再次入射到膜上,從而造成無法清晰地形成配向圖案的邊界的問題。另外,專利文獻2的方法高精度地形成用於分割太陽能電池等的薄膜層的槽,且具有不同的配向圖案,但不能製造出清晰地形成有配向圖案的邊界的光學膜。 However, according to the method of Patent Document 1, since the region between the rolls in the film is exposed, wrinkles are generated on the film to be exposed. Therefore, although it is also considered to expose the film on the roll, at this time, since the excess reflected light from the roll is again incident on the film, there is a problem that the boundary of the alignment pattern cannot be clearly formed. Further, the method of Patent Document 2 forms a groove for dividing a thin film layer of a solar cell or the like with high precision, and has a different alignment pattern, but cannot produce an optical film in which a boundary of an alignment pattern is clearly formed.

在本發明的第一實施方式中提供一種光學膜製造裝置,用以一邊連續搬送長條狀的膜,一邊製造具有多個配向區域的光學膜,其中包括:支撐輥,支撐設置有光配向性樹脂的膜;以及曝光部,與支撐輥相對向設置,且通過掩膜以偏振光對膜的光配向性樹脂進行曝光,藉此在光配向性樹脂上顯現出分子配向方向互異的多個配向區域;支撐輥具有輥本體及抑制部,抑制部抑制在輥本體處的曝光的反射。 In a first embodiment of the present invention, there is provided an optical film manufacturing apparatus for manufacturing an optical film having a plurality of alignment regions while continuously conveying an elongated film, including: a support roller, and a support is provided with optical alignment a film of the resin; and an exposure portion disposed opposite to the support roller, and exposing the photo-alignment resin of the film with polarized light through the mask, thereby exhibiting a plurality of molecular alignment directions on the photo-alignment resin An alignment region; the support roller has a roller body and a suppressing portion, and the suppressing portion suppresses reflection of exposure at the roller body.

在本發明的第二實施方式中提供一種光學膜的製造方法,包括:塗佈步驟:在長條狀的膜上塗佈光配向性樹脂並進行乾燥;以及曝光步驟:一邊沿長度方向連續搬送膜,一邊通過掩膜以偏振光對光配向性樹脂進行曝光,藉此在光配向性樹脂上顯現出分子配向方向互異的多個配向區域;曝光步驟是對膜中與支撐輥相接觸的區域進行曝光的步驟;支撐輥包括輥本體及抑制部,抑制部設置於輥本體的表面,並抑制曝光的反射。 In a second embodiment of the present invention, there is provided a method of producing an optical film comprising: a coating step of applying a photo-alignment resin on a long film and drying; and an exposing step: continuously conveying along a length direction The film exposes the photo-alignment resin with polarized light through a mask, thereby exhibiting a plurality of alignment regions having different molecular alignment directions on the photo-alignment resin; and the exposing step is to contact the support roller in the film. The step of exposing the region; the support roller includes a roller body and a suppressing portion, and the suppressing portion is provided on a surface of the roller body to suppress reflection of exposure.

在本發明的第三實施方式中提供一種光學膜,包括:配向層,由光配向性樹脂形成,且具有分子配向方向互異的多個配向區域;透明的基材,支撐配向層;以及光吸收層,設置於比配向層更靠近基材側,且吸收使光配向性樹脂硬化的波長光。 In a third embodiment of the present invention, there is provided an optical film comprising: an alignment layer formed of a photo-alignment resin and having a plurality of alignment regions having mutually different molecular alignment directions; a transparent substrate supporting the alignment layer; and light The absorbing layer is disposed closer to the substrate side than the alignment layer, and absorbs wavelength light that hardens the photoalignment resin.

另外,上述發明的內容並未列舉出本發明的全部必要特徵,所述特徵組的子組合也有可能構成發明。 Further, the above-described invention does not cite all the essential features of the present invention, and sub-combinations of the feature sets may also constitute the invention.

以下通過本發明實施方式對本發明進行說明,但以下實施方式並非對申請專利範圍所涉及的發明進行限定。而且,實施方式中說明的特徵組合也並非全部為本發明的必要特徵。 The present invention will be described below by way of embodiments of the present invention, but the following embodiments are not intended to limit the invention as claimed. Moreover, not all of the combinations of features described in the embodiments are essential features of the invention.

圖1顯示第一實施方式中的所述光學膜10的構成。光學膜10例如設置在立體顯示裝置的圖像光的出射側。光學膜10的一例是相位差膜,將入射的圖像光變換為左眼用偏振光圖像及右眼用偏振光圖像並進行輸出。 Fig. 1 shows the configuration of the optical film 10 in the first embodiment. The optical film 10 is provided, for example, on the exit side of the image light of the stereoscopic display device. An example of the optical film 10 is a retardation film, and the incident image light is converted into a left-eye polarized light image and a right-eye polarized light image and output.

光學膜10包括:基材20、配向層30和液晶層40。基材20為用於支撐配向層30的長條狀的膜。基材20至少對可見光是透明的,最好是在光學上各向同性。基材20例如為環烯烴聚合物(Cyclo-olefin Polymer,COP)膜或三醋酸纖維素(Triacetyl Cellulose,TAC)膜。 The optical film 10 includes a substrate 20, an alignment layer 30, and a liquid crystal layer 40. The substrate 20 is an elongated film for supporting the alignment layer 30. Substrate 20 is at least transparent to visible light, preferably optically isotropic. The substrate 20 is, for example, a Cyclo-olefin Polymer (COP) film or a Triacetyl Cellulose (TAC) film.

配向層30是層疊在基材20面上的硬化的光配向性樹脂。配向層30例如可以為使光分解型、光二聚型或光異性型等光配向性樹脂的分子由直線偏振光的紫外線沿所定的方向進行配向並硬化的物質。配向層30具有分子配向方向彼此互異的多個配向區域32及34。在圖1所示的例子中,配向層30具有將沿Y方向延伸的條狀配向區域32及34沿X方向反復設置的圖案。 The alignment layer 30 is a cured photoalignment resin laminated on the surface of the substrate 20. For example, the alignment layer 30 may be such that molecules of a photo-alignment resin such as a photodecomposition type, a photodimerization type, or an optically-isotropic type are aligned and hardened by ultraviolet rays of linearly polarized light in a predetermined direction. The alignment layer 30 has a plurality of alignment regions 32 and 34 whose molecular alignment directions are different from each other. In the example shown in FIG. 1, the alignment layer 30 has a pattern in which strip-shaped alignment regions 32 and 34 extending in the Y direction are repeatedly arranged in the X direction.

液晶層40是層疊在配向層30面上的液晶化合物。液晶層40例如由向列型(Nematic)液晶化合物構成。液晶層40中包含的液晶化合物的高分子沿配向層30的配向區域32及34的配向方向配向。藉此,使液晶層40具有高分 子配向方向彼此互異的多個配向區域42及44。在圖1所示的例子中,液晶層40具有將沿Y方向延伸的條狀的配向區域42及44沿X方向反復設置的圖案。配向區域42的配向方向50及配向區域44的配向方向60在XY平面內互相垂直。由這樣的構成構成的光學膜10可以具有例如1/4波長板的功能。 The liquid crystal layer 40 is a liquid crystal compound laminated on the surface of the alignment layer 30. The liquid crystal layer 40 is composed of, for example, a nematic liquid crystal compound. The polymer of the liquid crystal compound contained in the liquid crystal layer 40 is aligned along the alignment direction of the alignment regions 32 and 34 of the alignment layer 30. Thereby, the liquid crystal layer 40 has a high score. A plurality of alignment regions 42 and 44 whose sub-orientation directions are different from each other. In the example shown in FIG. 1, the liquid crystal layer 40 has a pattern in which strip-shaped alignment regions 42 and 44 extending in the Y direction are repeatedly arranged in the X direction. The alignment direction 50 of the alignment area 42 and the alignment direction 60 of the alignment area 44 are perpendicular to each other in the XY plane. The optical film 10 composed of such a configuration may have a function of, for example, a quarter-wave plate.

圖2表示設置有光學膜10的立體顯示裝置1000的分解斜視圖。立體顯示裝置1000依次設置有光源1200、圖像顯示部1300和光學膜10。圖像顯示部1300包括光源側偏光板1500、圖像生成部1600及出射側偏光板1700。當觀察者對該立體顯示裝置1000所顯示的立體圖像進行觀察時,從圖2中比光學膜10更右側進行觀察。 FIG. 2 shows an exploded perspective view of the stereoscopic display device 1000 provided with the optical film 10. The stereoscopic display device 1000 is provided with a light source 1200, an image display portion 1300, and an optical film 10 in this order. The image display unit 1300 includes a light source side polarizing plate 1500, an image generating unit 1600, and an exit side polarizing plate 1700. When the observer observes the stereoscopic image displayed on the stereoscopic display device 1000, it is observed from the right side of the optical film 10 in FIG.

光源1200在觀察者看來設置於立體顯示裝置1000的最後側,在使用立體顯示裝置1000的狀態(以下簡稱為“立體顯示裝置1000的使用狀態”)下,將白色的無偏振光朝光源側偏光板1500的一面照射。 The light source 1200 is disposed on the rear side of the stereoscopic display device 1000 as seen by the observer, and in the state in which the stereoscopic display device 1000 is used (hereinafter simply referred to as "the use state of the stereoscopic display device 1000"), the white unpolarized light is directed toward the light source side. One side of the polarizing plate 1500 is irradiated.

光源側偏光板1500設置於圖像生成部1600中的光源1200側。當有從光源1200射出的無偏振光入射時,光源側偏光板1500在使該無偏振光中偏振方向與透過軸方向相平行的直線偏振光透過的同時,阻擋偏振方向與吸收軸方向相平行的直線偏振光。光源側偏光板1500中的透過軸方向如圖2的箭頭所示,是從觀察者在看立體顯示裝置1000時的水平方向偏向右上45度的方向。 The light source side polarizing plate 1500 is provided on the light source 1200 side in the image generating unit 1600. When the non-polarized light emitted from the light source 1200 is incident, the light source side polarizing plate 1500 transmits the linearly polarized light in which the polarization direction of the unpolarized light is parallel to the transmission axis direction, and the blocking polarization direction is parallel to the absorption axis direction. Linearly polarized light. The transmission axis direction of the light source side polarizing plate 1500 is a direction which is 45 degrees upper rightward from the horizontal direction when the observer views the stereoscopic display device 1000 as indicated by an arrow in FIG. 2 .

圖像生成部1600具有右眼圖像生成區域1620及左眼 圖像生成區域1640。如圖2所示,該右眼圖像生成區域1620及左眼圖像生成區域1640是將圖像生成部1600沿水平方向進行劃分後得到的區域,多個右眼圖像生成區域1620及左眼圖像生成區域1640沿鉛直方向互相交替配置。 The image generation unit 1600 has a right eye image generation area 1620 and a left eye. Image generation area 1640. As shown in FIG. 2, the right-eye image generation area 1620 and the left-eye image generation area 1640 are areas obtained by dividing the image generation unit 1600 in the horizontal direction, and a plurality of right-eye image generation areas 1620 and left. The eye image generation regions 1640 are alternately arranged in the vertical direction.

在立體顯示裝置1000的使用狀態下,在圖像生成部1600的右眼圖像生成區域1620及左眼圖像生成區域1640上分別生成右眼用圖像及左眼用圖像。此時,當透過光源側偏光板1500的光入射到圖像生成部1600的右眼圖像生成區域1620時,右眼圖像生成區域1620的透過光便成為右眼用圖像的圖像光(以下簡稱“右眼用圖像光”)。同樣地,當透過光源側偏光板1500的光入射到圖像生成部1600的左眼圖像生成區域1640時,左眼圖像生成區域1640的透過光便成為左眼用圖像的圖像光(以下簡稱“左眼用圖像光”)。 In the use state of the stereoscopic display device 1000, a right-eye image and a left-eye image are generated in the right-eye image generation region 1620 and the left-eye image generation region 1640 of the image generation unit 1600, respectively. At this time, when the light transmitted through the light source side polarizing plate 1500 is incident on the right eye image generating area 1620 of the image generating unit 1600, the transmitted light of the right eye image generating area 1620 becomes the image light of the right eye image. (hereinafter referred to as "image light for right eye"). Similarly, when the light transmitted through the light source side polarizing plate 1500 is incident on the left eye image generating region 1640 of the image generating portion 1600, the transmitted light of the left eye image generating region 1640 becomes the image light of the image for the left eye. (hereinafter referred to as "image light for the left eye").

另外,透過右眼圖像生成區域1620的右眼用圖像光及透過左眼圖像生成區域1640的左眼用圖像光成為偏振方向與例如後述出射側偏光板1700中的透過軸的方向相同的直線偏振光。這種圖像生成部1600例如可以使用沿水平方向及垂直方向設置有多個二維的小單元且在各個單元中在配向膜之間密封有液晶的LCD(液晶顯示器)。 The right-eye image light that has passed through the right-eye image generation region 1620 and the left-eye image light that has passed through the left-eye image generation region 1640 are polarized and the direction of the transmission axis in the emission-side polarizing plate 1700, which will be described later. The same linearly polarized light. Such an image generation unit 1600 can use, for example, an LCD (Liquid Crystal Display) in which a plurality of two-dimensional small cells are provided in the horizontal direction and the vertical direction, and liquid crystals are sealed between the alignment films in the respective cells.

出射側偏光板1700設置於圖像生成部1600中的觀察者側。當透過上述右眼圖像生成區域1620的右眼用圖像光及透過上述左眼圖像生成區域1640的左眼用圖像光入射時,該出射側偏光板1700在使這些光中偏振方向與透過軸 相平行的直線偏振光透過的同時,阻擋偏振方向與吸收軸相平行的直線偏振光。此處,在出射側偏光板1700中的透過軸的方向如圖2的箭頭所示,是從觀察者看立體顯示裝置1000時的水平方向偏向左上45度的方向。 The exit-side polarizing plate 1700 is provided on the observer side in the image generating unit 1600. When the right-eye image light that has passed through the right-eye image generation region 1620 and the left-eye image light that has passed through the left-eye image generation region 1640 are incident, the exit-side polarizing plate 1700 polarizes the light. And transmission axis The parallel linearly polarized light is transmitted while blocking linearly polarized light whose polarization direction is parallel to the absorption axis. Here, the direction of the transmission axis in the exit-side polarizing plate 1700 is a direction in which the horizontal direction when the stereoscopic display device 1000 is viewed from the observer is shifted to the upper left by 45 degrees as indicated by the arrow in FIG. 2 .

光學膜10相對於出射側偏光板1700而設置於觀察者側。光學膜10包括具有箭頭所示配向方向的配向區域42及配向區域44,且作為1/4波長板而發揮功能。如圖2所示,該光學膜10中的配向區域42及配向區域44的位置及大小與圖像生成部1600的右眼圖像生成區域1620及左眼圖像生成區域1640的位置及大小相對應。因此,在立體顯示裝置1000的使用狀態下,透過上述右眼圖像生成區域1620的右眼用圖像光入射到右眼用的配向區域42,同時,透過上述左眼圖像生成區域1640的左眼用圖像光入射到左眼用的配向區域44。 The optical film 10 is provided on the observer side with respect to the exit-side polarizing plate 1700. The optical film 10 includes an alignment region 42 and an alignment region 44 having an alignment direction indicated by an arrow, and functions as a quarter-wave plate. As shown in FIG. 2, the position and size of the alignment region 42 and the alignment region 44 in the optical film 10 are different from the positions and sizes of the right-eye image generation region 1620 and the left-eye image generation region 1640 of the image generation portion 1600. correspond. Therefore, in the use state of the stereoscopic display device 1000, the right-eye image light transmitted through the right-eye image generation region 1620 is incident on the alignment region 42 for the right eye, and is transmitted through the left-eye image generation region 1640. The image light for the left eye is incident on the alignment region 44 for the left eye.

配向區域42將入射的右眼用圖像光變換為右旋的圓偏振光後使其透過。而且,配向區域44將入射的左眼用圖像光變換為左旋的圓偏振光後使其透過。因此,透過配向區域42的右眼用圖像光的圓偏振光的旋轉方向與透過配向區域44的左眼用圖像光的圓偏振光的旋轉方向相反。 The alignment area 42 converts the incident right-eye image light into right-handed circularly polarized light and transmits it. Further, the alignment region 44 converts the incident left-eye image light into left-handed circularly polarized light and transmits it. Therefore, the rotational direction of the circularly polarized light of the right-eye image light transmitted through the alignment region 42 is opposite to the rotational direction of the circularly polarized light of the left-eye image light transmitted through the alignment region 44.

觀察者佩戴的偏振光眼鏡的左眼濾光片及右眼濾光片選擇性地使該旋轉方向互異的圓偏振光分別透過。而且,觀察者以左眼及右眼觀察通過各自的濾光片的圖像藉此能夠識別出立體圖像。 The left-eye filter and the right-eye filter of the polarized glasses worn by the observer selectively transmit the circularly polarized lights having mutually different rotational directions. Further, the observer can recognize the stereoscopic image by observing the images of the respective filters with the left eye and the right eye.

圖3表示本實施方式所述光學膜製造裝置100的整體 構成。光學膜製造裝置100一邊將長條狀的膜沿箭頭方向無縫地連續搬送,即一邊以所謂的輥到輥方式進行搬送,一邊經過塗布、乾燥及曝光等製程而製造出具有多個配向區域的光學膜10。在以下的說明中,“上游側”是指與膜的搬送方向相反方向側的意思;“下游側”是指與膜的搬送方向相同側的意思。圖3的光學膜製造裝置100包括:供給部108、捲取部126、配向層塗布部112、配向層乾燥部114、配向處理部116、液晶層塗布部120、液晶層乾燥部122及液晶層硬化部124。 FIG. 3 shows the entire optical film manufacturing apparatus 100 according to the present embodiment. Composition. In the optical film manufacturing apparatus 100, a long film is continuously conveyed continuously in the direction of the arrow, that is, a so-called roll-to-roll method is used, and a plurality of alignment regions are produced by a process such as coating, drying, and exposure. Optical film 10. In the following description, the "upstream side" means the side opposite to the direction in which the film is conveyed, and the "downstream side" means the side which is the same as the direction in which the film is conveyed. The optical film manufacturing apparatus 100 of FIG. 3 includes a supply unit 108, a winding unit 126, an alignment layer applying unit 112, an alignment layer drying unit 114, an alignment processing unit 116, a liquid crystal layer coating unit 120, a liquid crystal layer drying unit 122, and a liquid crystal layer. Hardened portion 124.

供給部108設置於光學膜10的搬送方向的最上游側,且供給作為光學膜10支撐體的基材20。供給部108的一例為送出輥。此時,在送出輥的外圍預先捲設有基材20,通過送出輥的旋轉而將基材20捲出。 The supply unit 108 is provided on the most upstream side in the transport direction of the optical film 10, and supplies the substrate 20 as a support of the optical film 10. An example of the supply unit 108 is a delivery roller. At this time, the base material 20 is wound up on the outer periphery of the feed roller, and the base material 20 is wound up by the rotation of the feed roller.

配向層塗布部112設置於供給部108的下游側,在基材20的單面上塗布光配向性樹脂。配向層塗布部112只要是能夠對搬送中的膜進行塗布的塗布裝置即可,例如為:模具塗布機(die coater)、微型凹版塗布機(mirco-gravure coater)或輥式塗布機等。 The alignment layer application portion 112 is provided on the downstream side of the supply portion 108, and a photo-alignment resin is applied to one surface of the substrate 20. The alignment layer application unit 112 may be any coating device that can apply a film to be conveyed, and is, for example, a die coater, a mirco-gravure coater, or a roll coater.

配向層乾燥部114設置於配向層塗布部112的下游側,用於對塗布在基材20上的光配向性樹脂28進行乾燥。配向層乾燥部114例如為能夠對搬送中的膜進行乾燥的烘箱或送風裝置等乾燥裝置。 The alignment layer drying unit 114 is provided on the downstream side of the alignment layer application unit 112 and serves to dry the photo-alignment resin 28 coated on the substrate 20. The alignment layer drying unit 114 is, for example, a drying device such as an oven or a blower that can dry the film being conveyed.

配向處理部116設置於配向層乾燥部114的下游側,且一邊將基材20沿長度方向連續搬送,一邊由直線偏振光 的紫外線對乾燥後的光配向性樹脂28進行曝光。藉此,配向處理部116形成具有所定配向圖案的配向層30。 The alignment processing unit 116 is provided on the downstream side of the alignment layer drying unit 114, and is linearly polarized while continuously transporting the substrate 20 in the longitudinal direction. The ultraviolet ray exposes the dried photo-alignment resin 28. Thereby, the alignment processing unit 116 forms the alignment layer 30 having a predetermined alignment pattern.

液晶層塗布部120設置於配向處理部116的下游側,並且用以在配向層30的面上塗布液晶化合物38。液晶層塗布部120只要是能夠對搬送中的膜進行塗布的塗布裝置即可,例如為:模具塗布機、微型凹版塗布機或輥式塗布機等。 The liquid crystal layer coating portion 120 is provided on the downstream side of the alignment processing portion 116, and is used to apply the liquid crystal compound 38 on the surface of the alignment layer 30. The liquid crystal layer application unit 120 may be any coating device that can apply a film to be conveyed, and is, for example, a die coater, a micro gravure coater, or a roll coater.

液晶層乾燥部122設置於液晶層塗布部120的下游側,並且用以對塗布在配向層30上的液晶化合物38進行乾燥。液晶層乾燥部122例如為能夠對搬送中的膜進行乾燥的烘箱或送風裝置等乾燥裝置。 The liquid crystal layer drying portion 122 is provided on the downstream side of the liquid crystal layer applying portion 120, and serves to dry the liquid crystal compound 38 coated on the alignment layer 30. The liquid crystal layer drying unit 122 is, for example, a drying device such as an oven or a blower that can dry the film being conveyed.

液晶層硬化部124設置於液晶層乾燥部122的下游側,並且用以通過向乾燥後的液晶化合物38照射紫外線而使其硬化。藉此,液晶層硬化部124形成沿配向層30配向的液晶層40。當液晶化合物為熱硬化性時,液晶層硬化部124可以為烘箱等加熱裝置。 The liquid crystal layer curing portion 124 is provided on the downstream side of the liquid crystal layer drying portion 122, and is used to cure the liquid crystal compound 38 after drying by irradiating ultraviolet rays. Thereby, the liquid crystal layer hardened portion 124 forms the liquid crystal layer 40 aligned along the alignment layer 30. When the liquid crystal compound is thermosetting, the liquid crystal layer hardening portion 124 may be a heating device such as an oven.

捲取部126設置於光學膜製造裝置100的最下游側,並且用以捲取經過上游各階段後製成的光學膜10。捲取部126例如為捲取輥。通過捲取部126的旋轉,將光學膜10捲取在捲取部126的外周。 The take-up portion 126 is provided on the most downstream side of the optical film manufacturing apparatus 100, and is used to take up the optical film 10 which is formed after the upstream stages. The take-up portion 126 is, for example, a take-up roll. The optical film 10 is wound around the outer circumference of the winding portion 126 by the rotation of the winding portion 126.

供給部108與捲取部126同步旋轉,而且至少其中之一具有電動機等旋轉驅動裝置。當在其中之一的輥上具有旋轉驅動裝置時,具有旋轉驅動裝置的輥主動驅動膜的搬送,不具有旋轉驅動裝置的輥隨著具有旋轉驅動裝置的輥 從動旋轉。當在兩個輥上均具有旋轉驅動裝置時,供給部108和捲取部126使送出速度與捲取速度同步,以便平穩地對膜進行搬送。除此之外,供給部108與捲取部126不同步,且以獨立的旋轉速度進行旋轉也是可以的。另外,光學膜製造裝置100也可以在膜搬送路徑中具有其他帶有電動機的輥等膜驅動裝置。 The supply unit 108 rotates in synchronization with the winding unit 126, and at least one of them has a rotation driving device such as a motor. When there is a rotary drive on one of the rollers, the roller having the rotary drive actively drives the transport of the film, and the roller without the rotary drive follows the roller having the rotary drive Driven by rotation. When both of the rollers have the rotation driving means, the supply portion 108 and the winding portion 126 synchronize the delivery speed with the take-up speed to smoothly convey the film. In addition to this, the supply unit 108 and the winding unit 126 are not synchronized, and it is also possible to rotate at an independent rotation speed. Further, the optical film manufacturing apparatus 100 may have another film driving device such as a roller with a motor in the film transport path.

圖4表示本實施方式所述配向處理部116的構成。配向處理部116對沿箭頭方向連續供給的基材20上塗布的光配向性樹脂28進行曝光。配向處理部116具有:支撐輥130、搬送輥132、曝光部134、曝光部136、掩膜138。 FIG. 4 shows the configuration of the alignment processing unit 116 according to the present embodiment. The alignment processing unit 116 exposes the photo-alignment resin 28 applied on the substrate 20 continuously supplied in the direction of the arrow. The alignment processing unit 116 includes a support roller 130, a conveyance roller 132, an exposure unit 134, an exposure unit 136, and a mask 138.

支撐輥130能夠旋轉,且用以對由供給部108供給的設置有光配向性樹脂28的基材20進行支撐。支撐輥130通過使膜的搬送路徑沿其表面彎曲,從而給膜帶來張力。藉此,支撐輥130防止膜沿寬度方向發生錯位,也防止在與膜的接觸區域產生皺紋等。另外,支撐輥130也會抑制在輥之間的膜產生皺紋。 The support roller 130 is rotatable and supports the base material 20 provided with the photo-alignment resin 28 supplied from the supply portion 108. The support roller 130 brings tension to the film by bending the film transport path along its surface. Thereby, the support roller 130 prevents the film from being displaced in the width direction, and also prevents wrinkles and the like from occurring in the contact area with the film. In addition, the support roller 130 also suppresses wrinkles in the film between the rollers.

搬送輥132能夠旋轉,用於對來自於配向層乾燥部114的基材20進行支撐,並向支撐輥130進行搬送。另外,搬送輥132還用於將基材20向液晶層塗布部120進行搬送。 The conveyance roller 132 is rotatable, and supports the base material 20 from the directional layer drying part 114, and conveys it to the support roll 130. Moreover, the conveyance roller 132 is also used to convey the base material 20 to the liquid-crystal layer application part 120.

曝光部134及136與支撐輥130相對向設置。曝光部134及136輸出偏振方向互異的直線偏振光,通過掩膜138對基材20上的光配向性樹脂進行曝光,從而能夠顯現出配向方向互異的多個配向區域。 The exposure portions 134 and 136 are disposed to face the support roller 130. The exposed portions 134 and 136 output linearly polarized light having mutually different polarization directions, and the photo-alignment resin on the substrate 20 is exposed through the mask 138, whereby a plurality of alignment regions having different alignment directions can be expressed.

掩膜138設置於曝光部134及曝光部136與基材20 之間。掩膜138將來自於曝光部134及曝光部136的偏振光的一部分遮擋,而使一部分透過。 The mask 138 is disposed on the exposure portion 134 and the exposure portion 136 and the substrate 20 between. The mask 138 blocks a part of the polarized light from the exposure portion 134 and the exposure portion 136, and partially transmits the polarized light.

圖5表示本實施方式所述掩膜138的平面圖。箭頭148表示曝光時膜的搬送方向,箭頭149表示長條狀膜的寬度方向。掩膜138上設置有:設置有多個開口142的第一曝光區域140以及設置有多個開口146的第二曝光區域144。由曝光部134輸出的直線偏振光入射到第一曝光區域140,由曝光部136輸出的直線偏振光入射到第二曝光區域144。 Fig. 5 is a plan view showing the mask 138 of the present embodiment. Arrow 148 indicates the transport direction of the film during exposure, and arrow 149 indicates the width direction of the elongated film. The mask 138 is provided with a first exposure region 140 provided with a plurality of openings 142 and a second exposure region 144 provided with a plurality of openings 146. The linearly polarized light outputted from the exposure portion 134 is incident on the first exposure region 140, and the linearly polarized light output from the exposure portion 136 is incident on the second exposure region 144.

開口142對應於配向層30的配向區域34,在膜的寬度方向上具有與配向區域34的寬度相同的尺寸。開口146對應於配向層30的配向區域32,在膜的寬度方向上具有與配向區域32的寬度相同的尺寸。開口146在膜的搬送方向上遠離開口142,且在膜的寬度方向上位於開口142之間。另外,如開口內的箭頭所示,開口142與開口146使偏振方向互異的直線偏振光透過。藉此,本實施方式所述配向處理部116能夠形成無縫地設置有條狀的配向區域32及34的配向層30。 The opening 142 corresponds to the alignment region 34 of the alignment layer 30 and has the same size as the width of the alignment region 34 in the width direction of the film. The opening 146 corresponds to the alignment region 32 of the alignment layer 30 and has the same size as the width of the alignment region 32 in the width direction of the film. The opening 146 is away from the opening 142 in the conveying direction of the film, and is located between the openings 142 in the width direction of the film. Further, as indicated by the arrow in the opening, the opening 142 and the opening 146 transmit linearly polarized light having mutually different polarization directions. Thereby, the alignment processing unit 116 of the present embodiment can form the alignment layer 30 in which the strip-shaped alignment regions 32 and 34 are seamlessly provided.

圖6表示本實施方式所述配向處理部116的曝光部分的截面示意圖。圖6對應於圖4的虛線所包圍的A部分。箭頭表示透過掩膜138的曝光154的照射方向。支撐輥130包括輥本體150及設置於輥本體150表面上的抑制部152。 FIG. 6 is a schematic cross-sectional view showing an exposed portion of the alignment processing unit 116 according to the present embodiment. Fig. 6 corresponds to the portion A surrounded by the broken line of Fig. 4. The arrows indicate the direction of illumination of the exposure 154 through the mask 138. The support roller 130 includes a roller body 150 and a restraining portion 152 provided on the surface of the roller body 150.

輥本體150為圓筒形狀的輥,例如由不銹鋼等金屬製成。抑制部152形成於輥本體150的外周部,用於抑制入 射的曝光154的反射。 The roller body 150 is a cylindrical roller, and is made of, for example, a metal such as stainless steel. The restraining portion 152 is formed on the outer peripheral portion of the roller body 150 for suppressing entry The reflection of the exposure 154.

如圖6所示,曝光部136對塗布有光配向性樹脂28的基材20中與支撐輥130相接觸的區域進行曝光。藉此,由於是在將膜沿寬度方向張設的狀態下進行曝光,因此,本實施方式的配向處理部116能夠防止在膜上產生皺紋等。 As shown in FIG. 6, the exposure portion 136 exposes a region of the substrate 20 coated with the photo-alignment resin 28 in contact with the support roller 130. By this, since the film is exposed in a state in which the film is stretched in the width direction, the alignment processing unit 116 of the present embodiment can prevent wrinkles and the like from occurring on the film.

圖7中表示本實施方式所述支撐輥130的放大截面圖。圖7對應於圖6中的虛線所包圍的B部分。在該實施方式中,抑制部152是設置於輥本體150表面上的曝光吸收層。曝光吸收層用於吸收曝光154,從而抑制位於支撐輥130表面的曝光154的反射。 Fig. 7 is an enlarged cross-sectional view showing the support roller 130 of the present embodiment. Fig. 7 corresponds to the portion B surrounded by the broken line in Fig. 6. In this embodiment, the restraining portion 152 is an exposure absorbing layer provided on the surface of the roller body 150. The exposure absorbing layer serves to absorb the exposure 154, thereby suppressing reflection of the exposure 154 located on the surface of the support roller 130.

曝光吸收層例如為由黑色塗料構成的層。由黑色塗料構成的層例如可以藉由在支撐輥130的表面將黑色塗料進行塗布、噴塗、熱接或蒸鍍等方式而形成。黑色塗料是分散有黑色顏料等的塗料。黑色塗料可以在輥本體150的外周形成為均勻膜厚,從而能夠防止搬送中的基材20發生滑動。另外,抑制部152還可以在黑色塗料的外周進一步具有防止磨損用的樹脂等,從而可以防止黑色塗料的磨損。另外,除此之外,曝光吸收層也可以為由有色或無色的紫外線吸收樹脂等構成的層。 The exposure absorbing layer is, for example, a layer composed of a black paint. The layer composed of the black paint can be formed, for example, by coating, spraying, thermally bonding, or vapor-depositing a black paint on the surface of the support roll 130. The black paint is a paint in which black pigment or the like is dispersed. The black paint can be formed to have a uniform film thickness on the outer circumference of the roller body 150, and it is possible to prevent the substrate 20 during conveyance from slipping. Further, the suppressing portion 152 may further have a resin for preventing abrasion or the like on the outer periphery of the black paint, so that abrasion of the black paint can be prevented. Further, in addition to this, the exposure absorption layer may be a layer composed of a colored or colorless ultraviolet absorbing resin or the like.

藉此,抑制部152能夠防止光配向性樹脂28由曝光154的反射光進行配向,從而造成配向層30的配向圖案的邊界不清晰的現象。因此,本實施方式的配向處理部116能夠得到具有清晰邊界的配向圖案的配向層30。 Thereby, the suppressing portion 152 can prevent the photo-alignment resin 28 from being aligned by the reflected light of the exposure 154, thereby causing a phenomenon that the boundary of the alignment pattern of the alignment layer 30 is not clear. Therefore, the alignment processing unit 116 of the present embodiment can obtain the alignment layer 30 having the alignment pattern of the sharp boundary.

進一步地,通過使配向層30的配向圖案的邊界變得清晰,從而使配向層30面上形成的液晶層40的配向圖案的邊界也變得清晰。因此,由光學膜製造裝置100製造的光學膜10當被設置於立體顯示裝置中時,能夠顯示出左右視差圖像的串擾較少的高品質立體圖像。為了充分地達到這種效果,最好將支撐輥130相對於紫外線的反射率設置於5%以下。 Further, by making the boundary of the alignment pattern of the alignment layer 30 clear, the boundary of the alignment pattern of the liquid crystal layer 40 formed on the surface of the alignment layer 30 is also made clear. Therefore, when the optical film 10 manufactured by the optical film manufacturing apparatus 100 is provided in the stereoscopic display device, it is possible to display a high-quality stereoscopic image in which crosstalk of the left and right parallax images is small. In order to sufficiently achieve this effect, it is preferable to set the reflectance of the support roller 130 with respect to ultraviolet rays to 5% or less.

用於測定反射率的機器為分光光度計U-4100(日立高科技公司製造)。測定時使用的波長光是光配向性樹脂能夠感光的波長光,測定入射角為5度時的反射率。此處的反射率是指測定樣本相對於基準樣本板的反射率(相對反射率)。將其作為支撐輥130相對於紫外線的反射率。雖然基準樣本板使用了由硫酸鋇構成的板子,但也可以使用其他材料的板子。測定樣本為包括設置在支撐輥上的光吸收層的玻璃板。另外,在本測定中,為了求出紫外線區域的反射率,在分光光度計上安裝高靈敏度積分球後進行測定。 The machine for measuring the reflectance was a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation). The wavelength light used for the measurement was a wavelength light which the light-aligning resin was able to receive light, and the reflectance when the incident angle was 5 degrees was measured. The reflectance here refers to the reflectance (relative reflectance) of the measured sample relative to the reference sample plate. This is taken as the reflectance of the support roller 130 with respect to ultraviolet rays. Although the reference sample plate uses a plate made of barium sulfate, plates of other materials can also be used. The measurement sample was a glass plate including a light absorbing layer provided on a support roller. Further, in the present measurement, in order to obtain the reflectance of the ultraviolet region, a high-sensitivity integrating sphere was attached to the spectrophotometer and then measured.

在圖8中表示本實施方式的第一變形例所述支撐輥130的放大截面圖。圖8對應於圖6的虛線所包圍的B部分。在本變形例中,抑制部152為設置於輥本體150表面的曝光干涉層。曝光干涉層以使在界面反射的曝光154變弱的方式發生干涉,從而抑制在支撐輥130表面上的曝光154的反射。 FIG. 8 is an enlarged cross-sectional view showing the support roller 130 according to the first modification of the embodiment. Fig. 8 corresponds to the portion B surrounded by the broken line of Fig. 6. In the present modification, the restraining portion 152 is an exposure interference layer provided on the surface of the roller body 150. The exposure interference layer interferes in such a manner that the exposure 154 reflected at the interface becomes weak, thereby suppressing reflection of the exposure 154 on the surface of the support roller 130.

曝光干涉層例如為各層膜厚均為1/4曝光波長的氧化 金屬多層膜。除此之外,曝光干涉層亦可以為單層氧化金屬膜、單層或多層樹脂膜等。曝光干涉層可以在輥本體150的外周形成為均勻的膜厚,從而能夠確實地抑制曝光154的反射,防止搬送中基材20的滑動。 The exposure interference layer is, for example, an oxide having a film thickness of 1/4 exposure wavelength. Metal multilayer film. In addition, the exposure interference layer may be a single-layer oxide metal film, a single-layer or a multilayer resin film, or the like. The exposure interference layer can be formed to have a uniform film thickness on the outer circumference of the roller body 150, so that the reflection of the exposure 154 can be surely suppressed, and the sliding of the substrate 20 during transportation can be prevented.

圖9中表示本實施方式的第二變形例所述支撐輥130的放大截面圖。圖9對應於圖6的虛線所包圍的B部分。在本變形例中,抑制部152是設置於輥本體150表面的曝光散射層。抑制部152通過曝光散射層使曝光154發生散射,從而抑制支撐輥130表面上的曝光154的反射。 Fig. 9 is an enlarged cross-sectional view showing the support roller 130 according to a second modification of the embodiment. Figure 9 corresponds to the portion B surrounded by the broken line of Figure 6. In the present modification, the restraining portion 152 is an exposure scattering layer provided on the surface of the roller body 150. The suppression portion 152 scatters the exposure 154 by exposing the scattering layer, thereby suppressing reflection of the exposure 154 on the surface of the support roller 130.

曝光散射層例如可以由分散有使光發生散射的微粒子等的樹脂形成。分散有微粒子等的樹脂在輥本體150的外周以均勻的膜厚良好地形成著,藉此防止搬送中基材20的滑動。除此之外,曝光散射層可以是在輥本體150的表面通過紋理加工等形成的凹凸。 The exposure scattering layer can be formed, for example, of a resin in which fine particles or the like that scatter light is dispersed. The resin in which fine particles or the like are dispersed is formed on the outer circumference of the roll main body 150 with a uniform film thickness, thereby preventing the sliding of the base material 20 during conveyance. In addition to this, the exposure scattering layer may be irregularities formed by texture processing or the like on the surface of the roller body 150.

在圖7~9中,分別對抑制部152為曝光吸收層、曝光干涉層及曝光散射層之一的情形進行了說明,但除此之外,抑制部152也可以由曝光吸收層、曝光干涉層及曝光散射層的兩個以上層疊而成。例如,抑制部152可以由設置在曝光吸收層及曝光吸收層上的曝光干涉層或曝光散射層構成。 In FIGS. 7 to 9, the case where the suppression portion 152 is one of the exposure absorption layer, the exposure interference layer, and the exposure diffusion layer has been described. However, the suppression portion 152 may be an exposure absorption layer or an exposure interference. Two or more layers and an exposure scattering layer are laminated. For example, the suppression portion 152 may be composed of an exposure interference layer or an exposure scattering layer provided on the exposure absorption layer and the exposure absorption layer.

圖10之(a)~(c)及圖11之(d)~(f)表示本實施方式所述光學膜10的製造方法。本實施方式所述光學膜的製造方法可以由圖3所示的光學膜製造裝置100實施。 (a) to (c) of FIG. 10 and (d) to (f) of FIG. 11 show a method of manufacturing the optical film 10 according to the present embodiment. The method for producing an optical film according to the present embodiment can be carried out by the optical film manufacturing apparatus 100 shown in Fig. 3 .

首先,在圖10之(a)中,供給部108連續供給長條 狀的TAC膜的基材20。此處,基材20的單面或雙面上可以預先設置有光吸收層、反射防止層或防眩層。另外,基材20也以用COP膜代替TAC膜。 First, in (a) of FIG. 10, the supply portion 108 continuously supplies strips. The substrate 20 of the TAC film. Here, a light absorbing layer, an antireflection layer, or an antiglare layer may be provided in advance on one side or both sides of the substrate 20. Further, the substrate 20 is also replaced with a COP film instead of the TAC film.

然後,在圖10之(b)中,配向層塗布部112將基材20一邊沿長度方向連續搬送,一邊在其單面上塗布液體塗料形式的光配向性樹脂28。進一步地,配向層乾燥部114將基材20一邊沿長度方向連續搬送,一邊使光配向性樹脂28乾燥並去除溶劑。 Then, in the (b) of FIG. 10, the alignment layer applying portion 112 applies the photo-alignment resin 28 in the form of a liquid coating material on one surface thereof while continuously conveying the substrate 20 in the longitudinal direction. Further, the alignment layer drying unit 114 continuously transports the substrate 20 in the longitudinal direction while drying the photo-alignment resin 28 to remove the solvent.

然後,在圖10之(c)中,配向處理部116利用與Y方向平行的直線偏振光,通過掩膜138的第一曝光區域140對光配向性樹脂28的一部分區域進行第一曝光。第一曝光例如為以20~200 mW/cm2的強度照射280~340 nm波長的直線偏振光的紫外線。在光配向性樹脂28中被曝光的區域顯現出沿與Y方向相平行的方向配向的配向區域34並進行硬化。 Then, in (c) of FIG. 10, the alignment processing unit 116 performs the first exposure of a part of the photo-alignment resin 28 through the first exposure region 140 of the mask 138 by linearly polarized light parallel to the Y direction. The first exposure is, for example, ultraviolet ray irradiation of linearly polarized light having a wavelength of 280 to 340 nm at an intensity of 20 to 200 mW/cm 2 . The exposed region in the photo-alignment resin 28 exhibits an alignment region 34 aligned in a direction parallel to the Y direction and is hardened.

在第一曝光過程中,配向處理部116一邊在包含抑制部152的支撐輥130上連續搬送基材20,一邊對膜中與支撐輥130相接觸的區域進行曝光。藉此防止曝光中的膜上產生皺紋等。另外,由於抑制部152抑制了在支撐輥130表面的曝光154的反射,從而可以防止由曝光154的反射光造成的配向圖案邊界的不清晰。 In the first exposure process, the alignment processing unit 116 exposes the region in contact with the support roller 130 in the film while continuously conveying the substrate 20 on the support roller 130 including the suppression portion 152. Thereby, wrinkles and the like are prevented from occurring on the film during exposure. In addition, since the suppression portion 152 suppresses the reflection of the exposure 154 on the surface of the support roller 130, it is possible to prevent the blur of the alignment pattern boundary caused by the reflected light of the exposure 154.

然後,在圖11之(d)中,配向處理部116使用與X方向相平行的直線偏振光,通過掩膜138的第二曝光區域144對光配向性樹脂28中未被曝光的區域進行第二曝光。 在第二曝光的直線偏振光中,可以使用與第一曝光相同波長且相同強度的紫外線。在光配向性樹脂28中被曝光的區域中顯現出沿與X方向相平行的方向配向的配向區域32並進行硬化。 Then, in (d) of FIG. 11, the alignment processing unit 116 uses the linearly polarized light parallel to the X direction, and passes through the second exposure region 144 of the mask 138 to the unexposed region of the photoalignment resin 28. Two exposures. In the linearly polarized light of the second exposure, ultraviolet rays having the same wavelength and the same intensity as the first exposure can be used. In the exposed region of the photo-alignment resin 28, the alignment region 32 aligned in the direction parallel to the X direction appears to be hardened.

在第二曝光過程中,配向處理部116一邊在支撐輥130連續搬送基材20,一邊對支撐輥130與基材20相接觸的區域照射曝光。藉此,防止曝光中的膜上產生皺紋等。另外,在第二曝光中,支撐輥130的抑制部152也能夠防止由曝光154的反射光造成的配向圖案的不清晰。藉此,根據本實施方式的光學膜的製造方法,在兩個曝光過程的任意一個中都由抑制部152防止曝光的反射,因此由配向區域32及配向區域34構成的邊界可形成清晰的配向圖案的配向層30。 In the second exposure process, the alignment processing unit 116 irradiates the region where the support roller 130 and the substrate 20 are in contact with each other while continuously conveying the substrate 20 to the support roller 130. Thereby, wrinkles and the like are prevented from occurring on the film during exposure. Further, in the second exposure, the suppressing portion 152 of the support roller 130 can also prevent the unclear alignment pattern caused by the reflected light of the exposure 154. Thereby, according to the method of manufacturing an optical film of the present embodiment, the reflection of the exposure is prevented by the suppression portion 152 in any of the two exposure processes, so that the boundary formed by the alignment region 32 and the alignment region 34 can form a clear alignment. Patterned alignment layer 30.

然後,在圖11之(e)中,液晶層塗布部120在配向層30上塗布紫外線硬化性或熱硬化性的液晶化合物38。然後,液晶層乾燥部122對塗布於配向層30上的液晶化合物38進行乾燥。液晶化合物38形成與配向層30的配向區域32及配向區域34相對應的邊界清晰的配向圖案,並進行配向。 Then, in (e) of FIG. 11, the liquid crystal layer applying portion 120 applies an ultraviolet curable or thermosetting liquid crystal compound 38 to the alignment layer 30. Then, the liquid crystal layer drying unit 122 dries the liquid crystal compound 38 applied on the alignment layer 30. The liquid crystal compound 38 forms an alignment pattern having a clear boundary with the alignment region 32 and the alignment region 34 of the alignment layer 30, and is aligned.

然後,由圖11之(f)的液晶層硬化部124通過照射紫外線而使液晶化合物38硬化,從而形成具有配向區域42及44的液晶層40。對液晶化合物38照射的紫外線可以與在圖10之(c)及圖11之(d)中對光配向性樹脂照射的紫外線的波長相同,也可以不同。另外除此之外,液晶 層硬化部124也可以通過加熱來硬化液晶化合物38。 Then, the liquid crystal layer 38 is cured by irradiation of ultraviolet rays by the liquid crystal layer curing portion 124 of (f) of FIG. 11 to form the liquid crystal layer 40 having the alignment regions 42 and 44. The ultraviolet ray to be applied to the liquid crystal compound 38 may be the same as or different from the wavelength of the ultraviolet ray irradiated to the photo-alignment resin in (c) of FIG. 10 and (d) of FIG. 11 . In addition, LCD The layer hardened portion 124 can also harden the liquid crystal compound 38 by heating.

這樣一來,通過圖10之(a)~圖11之(f)所示的製造方法,便得到了具有配向圖案邊界清晰的液晶層40的光學膜10。所得到的光學膜10被捲取部126捲取。此後,可以將長條狀的光學膜10切割成適於顯示裝置等使用的適當長度。 Thus, the optical film 10 having the liquid crystal layer 40 having a clear alignment pattern boundary is obtained by the manufacturing method shown in FIGS. 10(a) to 11(f). The obtained optical film 10 is taken up by the winding portion 126. Thereafter, the elongated optical film 10 can be cut into an appropriate length suitable for use in a display device or the like.

圖12之(a)及(b)表示使用偏振光顯微鏡觀察光學膜10的液晶層40的配向圖案而成的照片。圖12之(a)是使用偏振光顯微鏡觀察到的利用不含抑制部152的支撐輥130製造的光學膜10的液晶層40的配向圖案的照片。觀察到的配向圖案由第一配向區域300及第二配向區域310大致形成為帶狀。然而,在第一配向區域300與第二配向區域310之間產生了微小的凹凸,邊界不清晰。 (a) and (b) of FIG. 12 show photographs in which the alignment pattern of the liquid crystal layer 40 of the optical film 10 is observed using a polarizing microscope. (a) of FIG. 12 is a photograph of an alignment pattern of the liquid crystal layer 40 of the optical film 10 produced by the support roller 130 containing no suppression portion 152 observed using a polarizing microscope. The observed alignment pattern is formed substantially in a strip shape by the first alignment region 300 and the second alignment region 310. However, minute irregularities are generated between the first alignment region 300 and the second alignment region 310, and the boundary is not clear.

圖12之(b)是使用偏振光顯微鏡觀察到的利用包含抑制部152的支撐輥130製造的光學膜10的液晶層40的配向圖案的照片。觀察到的第一配向區域300與第二配向區域310之間沒有凹凸,邊界很清晰。 (b) of FIG. 12 is a photograph of an alignment pattern of the liquid crystal layer 40 of the optical film 10 produced by the support roller 130 including the suppression portion 152 observed using a polarizing microscope. There is no unevenness between the first alignment region 300 and the second alignment region 310 observed, and the boundary is clear.

圖13表示本實施方式的第三變形例所述光學膜12的構成。光學膜12除了在比配向層30更靠近基材20側設置有光吸收層70以外,均與圖1所示的光學膜10相同。 FIG. 13 shows the configuration of the optical film 12 according to the third modification of the embodiment. The optical film 12 is the same as the optical film 10 shown in FIG. 1 except that the light absorbing layer 70 is provided closer to the substrate 20 than the alignment layer 30.

光吸收層70是用於對使形成配向層30的光配向性樹脂28硬化的波長光、例如紫外線進行吸收的層。光吸收層70可以由硬質塗布材料形成,例如由以含有(甲基)丙烯醯氧基的多官能單體為主要成分的聚合物形成。 The light absorbing layer 70 is a layer for absorbing light of a wavelength, for example, ultraviolet light, which cures the photo-alignment resin 28 forming the alignment layer 30. The light absorbing layer 70 may be formed of a hard coating material, for example, a polymer mainly composed of a polyfunctional monomer containing a (meth) acryloxy group.

光吸收層70,在對光配向性樹脂28進行曝光期間,對透過光配向性樹脂28的曝光154及在支撐輥130反射的曝光154進行吸收,因此能夠在其上面形成具有清晰邊界的配向圖案的配向層30。另外,由於光吸收層70可透過可見光,因此不會損害光學膜12的光學特性。藉此,將光學膜12設置於圖像輸出側的立體顯示裝置能夠顯示串擾較少的高品質立體圖像。另外,光吸收層70也可以不設置在基材20與配向層30之間,而是設置在基材20的兩個面中與配向層30相對側的面上。 The light absorbing layer 70 absorbs the exposure 154 that transmits the light-aligning resin 28 and the exposure 154 that is reflected by the support roller 130 during exposure of the photo-alignment resin 28, so that an alignment pattern having a sharp boundary can be formed thereon. Alignment layer 30. In addition, since the light absorbing layer 70 can transmit visible light, the optical characteristics of the optical film 12 are not impaired. Thereby, the stereoscopic display device in which the optical film 12 is provided on the image output side can display a high-quality stereoscopic image with less crosstalk. Further, the light absorbing layer 70 may not be provided between the substrate 20 and the alignment layer 30, but may be provided on a surface of the two faces of the substrate 20 opposite to the alignment layer 30.

圖14表示本實施方式的第四變形例所述光學膜14的構成。光學膜14除了在基材20的兩個面中與設置有配向層30的一側相反側的面上進一步設置有反射防止層80以外,均與圖13所示光學膜12相同。反射防止層80通過進行光干涉來抑制反射光。反射防止層80由比基材20更低折射率的樹脂形成為1/4可見光波長(例如550nm)的膜厚。作為低折射率的樹脂例如可以採用分散有通過內部中空構成而低折射化的平均粒徑為0.5 nm~200nm的氧化矽粒子的紫外線硬化樹脂等。 FIG. 14 shows the configuration of the optical film 14 according to the fourth modification of the embodiment. The optical film 14 is the same as the optical film 12 shown in FIG. 13 except that the antireflection layer 80 is further provided on the surface of the substrate 20 opposite to the side on which the alignment layer 30 is provided. The reflection preventing layer 80 suppresses reflected light by performing light interference. The anti-reflection layer 80 is formed of a resin having a lower refractive index than the substrate 20 to have a film thickness of 1/4 visible light wavelength (for example, 550 nm). As the resin having a low refractive index, for example, an ultraviolet curable resin obtained by dispersing cerium oxide particles having an average particle diameter of 0.5 nm to 200 nm which is reduced in refractive by an internal hollow structure can be used.

不僅僅是可見光,反射防止層80使在光配向性樹脂28的曝光過程中通過光配向性樹脂28而入射的紫外線在層界面發生反射及干涉,從而可以防止在基材20與支撐輥130的界面處反射的曝光154入射到光配向性樹脂28。這樣一來,通過本變形例,光吸收層70及反射防止層80有助於實現配向層30的配向圖案的邊界清晰化。 In addition to the visible light, the anti-reflection layer 80 causes the ultraviolet rays incident through the photo-alignment resin 28 during the exposure of the photo-alignment resin 28 to reflect and interfere at the layer interface, thereby preventing the substrate 20 and the support roller 130 from being disposed. The exposure 154 reflected at the interface is incident on the photo-alignment resin 28. As described above, according to the present modification, the light absorbing layer 70 and the reflection preventing layer 80 contribute to the sharpening of the boundary of the alignment pattern of the alignment layer 30.

另外,光學膜14可以具有防眩層來代替反射防止層80。防眩層由分散有使光發生散射的微粒子等的樹脂等形成,用以對在曝光過程中入射的曝光154進行光散射。藉此,由於防眩層能夠抑制曝光154在支撐輥130上的反射光,因此能夠起到與反射防止層80同樣的效果。 In addition, the optical film 14 may have an anti-glare layer instead of the anti-reflection layer 80. The anti-glare layer is formed of a resin or the like in which fine particles or the like which scatter light is dispersed, and is used for light-scattering the exposure 154 incident during exposure. Thereby, since the anti-glare layer can suppress the reflected light of the exposure 154 on the support roller 130, the same effect as the anti-reflection layer 80 can be obtained.

另外,光學膜14可以進一步設置有其他的光吸收層來代替反射防止層80。其他的光吸收層可以與第三變形例所述光吸收層70相同。 In addition, the optical film 14 may be further provided with another light absorbing layer instead of the reflection preventing layer 80. The other light absorbing layer may be the same as the light absorbing layer 70 described in the third modification.

表1至表3表示本實施方式的比較例1~8及實施例1~13。表中的“膜”一欄表示在各比較例及實施例中塗布有光配向性樹脂28並形成配向層30的膜構成。TAC對應於分別用作各個基材20的TAC膜,LR對應於反射防止層80,AG對應於防眩層,HC對應於光吸收層70等。光配向性樹脂28塗布於膜(配向層)側。例如比較例5的(配向層)/HC/TAC/AG是指在TAC膜的單面設置防眩層,在TAC膜的與防眩層相反側的面設置光吸收層,在光吸收層上塗布光配向性樹脂28的意思。 Tables 1 to 3 show Comparative Examples 1 to 8 and Examples 1 to 13 of the present embodiment. The column of "film" in the table indicates a film configuration in which the photo-alignment resin 28 is applied and the alignment layer 30 is formed in each of the comparative examples and the examples. The TAC corresponds to a TAC film respectively serving as each of the substrates 20, LR corresponds to the anti-reflection layer 80, AG corresponds to the anti-glare layer, HC corresponds to the light absorbing layer 70, and the like. The photo-alignment resin 28 is applied to the film (alignment layer) side. For example, the (alignment layer)/HC/TAC/AG of Comparative Example 5 means that an anti-glare layer is provided on one surface of the TAC film, and a light absorbing layer is provided on the surface of the TAC film opposite to the anti-glare layer, on the light absorbing layer. The meaning of the photo-alignment resin 28 is applied.

此後,由支撐輥130對膜進行支撐,對光配向性樹脂進行曝光,從而形成配向層30。此處,表中的“曝光吸收層”一欄中的“有”表示支撐輥130包含曝光吸收層作為抑制部152,“無”表示支撐輥130不含抑制部152。“曝光位置”一欄的“支撐輥之間”表示對在膜中張設於兩個支撐輥130之間的區域進行曝光(輥間曝光),“支撐輥上”表示對膜中與支撐輥130相接觸的區域進行曝光(背輥曝光)。 Thereafter, the film is supported by the support roller 130, and the photo-alignment resin is exposed to form the alignment layer 30. Here, "Yes" in the column of "exposure absorbing layer" in the table indicates that the support roller 130 includes the exposure absorbing layer as the suppression portion 152, and "None" indicates that the support roller 130 does not include the suppression portion 152. The "between support rolls" in the column of "exposure position" means that the area stretched between the two support rolls 130 in the film is exposed (exposure between rolls), and the "on the support roll" means the support roll in the film. The 130-contact area is exposed (back roll exposure).

此後,在配向層30上塗布液晶層40,並進行乾燥及紫外線硬化,從而得到各比較例及實施例的光學膜。接著,將各比較例及實施例所得到的光學膜切割成所定尺寸,以將液晶層40配置成為上面,與偏光板相重合,並進行觀察,從是否發生皺紋以及配向圖案邊界部的清晰性的角度來評價各個光學膜。 Thereafter, the liquid crystal layer 40 was applied onto the alignment layer 30, and dried and ultraviolet-cured to obtain an optical film of each of Comparative Examples and Examples. Next, the optical film obtained in each of the comparative examples and the examples was cut into a predetermined size so that the liquid crystal layer 40 was placed on the upper surface, and the polarizing plate was superposed on the polarizing plate, and the wrinkles and the sharpness of the boundary portion of the alignment pattern were observed. The angle is used to evaluate each optical film.

表中的“皺紋的發生”一欄中的“×”表示在製造出的光學膜上發生了皺紋,“○”表示沒有發生皺紋。“邊界部的清晰性”一欄中的“×”表示在液晶層40的配向圖案的邊界處產生了從平均線超出10μm的凹凸,“△”表示產生了5~10μm的凹凸,“○”表示產生了5μm以下的凹凸。凹凸越小,在將光學膜對LCD的圖像顯示部1300進行對位貼合時,能夠確保有較大的對位允許誤差。例如相對於在像素之間形成有寬度為30μm的黑矩陣的圖像顯示部1300,如果凹凸為10μm以下,則允許有10μm以上的貼合位置誤差,如果凹凸為5μm以下,則允許有20μm以上的貼合誤差。另外,在貼合光學膜時,通過貼合應力而使光學膜產生伸縮,但凹凸越小,越能減輕該伸縮的影響。當凹凸為5μm以下時,通過顯微鏡幾乎看不到凹凸。 "X" in the column "Occurrence of wrinkles" in the table indicates that wrinkles occurred on the produced optical film, and "○" indicates that wrinkles did not occur. "X" in the column of "clearness of the boundary portion" indicates that unevenness exceeding 10 μm from the average line is generated at the boundary of the alignment pattern of the liquid crystal layer 40, and "△" indicates that unevenness of 5 to 10 μm is generated, "○" It indicates that unevenness of 5 μm or less was generated. The smaller the unevenness is, the more the alignment error can be ensured when the optical film is aligned to the image display unit 1300 of the LCD. For example, when the unevenness is 10 μm or less, the image display portion 1300 having a black matrix having a width of 30 μm is allowed to have a bonding position error of 10 μm or more, and if the unevenness is 5 μm or less, 20 μm or more is allowed. Fit error. Further, when the optical film is bonded, the optical film is stretched and contracted by the bonding stress, but the smaller the unevenness, the more the influence of the expansion and contraction can be alleviated. When the unevenness is 5 μm or less, unevenness is hardly observed by the microscope.

如表1所示,在支撐輥130之間對光配向性樹脂28進行曝光的比較例1~7中,所製造的光學膜上均產生了皺紋。另外,在不含抑制部152的支撐輥130上對光配向性樹脂28進行曝光的比較例8中,所製造的光學膜的液晶層40的配向圖案的邊界不清晰。 As shown in Table 1, in Comparative Examples 1 to 7 in which the photo-alignment resin 28 was exposed between the support rolls 130, wrinkles were formed on the produced optical film. Further, in Comparative Example 8 in which the photo-alignment resin 28 was exposed on the support roller 130 containing no suppression portion 152, the boundary of the alignment pattern of the liquid crystal layer 40 of the produced optical film was not clear.

圖15表示將比較例8得到的光學膜的液晶層40的配向圖案的邊界由光學顯微鏡放大500倍後通過偏振光顯微鏡觀察到的照片。如圖所示,在液晶層40的配向圖案之間產生了凹凸,從而使邊界不清晰。配向圖案邊界處的凹凸從平均線(圖中的粗線)超過了10μm。平均線例如是指在凹凸中最突出的凸部分設置的平行於配向圖案邊界線的凸基準線與在凹凸中最下陷的凹部分設置的平行於配向圖案邊界線的凹基準線之間的中間線。 Fig. 15 is a photograph showing the boundary of the alignment pattern of the liquid crystal layer 40 of the optical film obtained in Comparative Example 8 which was magnified 500 times by an optical microscope and observed by a polarizing microscope. As shown in the figure, irregularities are generated between the alignment patterns of the liquid crystal layer 40, so that the boundary is not clear. The unevenness at the boundary of the alignment pattern is more than 10 μm from the average line (thick line in the figure). The average line is, for example, the middle between the convex reference line which is disposed in the convex portion which is the most prominent in the unevenness and which is parallel to the boundary line of the alignment pattern and the concave reference line which is disposed in the concave portion which is the most depressed in the unevenness and which is parallel to the boundary line of the alignment pattern. line.

另外,在將光學膜用於立體顯示裝置時,為了盡可能地充分抑制串擾,最好使多個配向區域間邊界的始於平均線的凹凸處於10μm以內,更好的是處於5μm以內。 Further, when the optical film is used for a stereoscopic display device, in order to sufficiently suppress crosstalk as much as possible, it is preferable that the unevenness of the boundary between the plurality of alignment regions starting from the average line is within 10 μm, more preferably within 5 μm.

與此相對,在支撐輥130上對光配向性樹脂28進行曝光的實施例1~13中,所製造的光學膜上沒有產生皺紋。另外,在基材20上設置有光吸收層、反射防止層及防眩層中的一個以上的實施例1~6及使用含有曝光吸收層的支撐輥130製造的實施例7~13中,所製造的光學膜的液晶層40的配向圖案邊界上也沒有產生超過10μm的凹凸。 On the other hand, in Examples 1 to 13 in which the photo-alignment resin 28 was exposed on the support roller 130, no wrinkles were formed on the optical film produced. Further, in Examples 1 to 6 in which one or more of the light absorbing layer, the antireflection layer, and the antiglare layer were provided on the substrate 20, and Examples 7 to 13 manufactured by using the support roller 130 including the exposure absorption layer, The unevenness of the alignment pattern of the liquid crystal layer 40 of the produced optical film did not occur more than 10 μm.

尤其是,通過在基材20上設置光吸收層、反射防止層及防眩層中的一個以上,並進一步使用含有曝光吸收層的支撐輥130製造的實施例8~13的光學膜,使液晶層40的配向圖案的邊界清晰性非常優良,且在邊界處沒有觀察到凹凸。 In particular, by providing one or more of the light absorbing layer, the antireflection layer, and the antiglare layer on the substrate 20, and further using the optical films of Examples 8 to 13 manufactured by using the support roller 130 containing the exposure absorbing layer, the liquid crystal is made. The boundary pattern of the alignment pattern of the layer 40 was excellent in sharpness, and no unevenness was observed at the boundary.

圖16表示通過偏振光顯微鏡對實施例10得到的光學 膜的液晶層40的配向圖案的邊界進行觀察時的照片。如圖所示,在液晶層40的配向圖案之間幾乎沒有凹凸,邊界非常地清晰。 Figure 16 shows the optical obtained in Example 10 by a polarizing microscope. A photograph when the boundary of the alignment pattern of the liquid crystal layer 40 of the film was observed. As shown in the figure, there is almost no unevenness between the alignment patterns of the liquid crystal layer 40, and the boundary is extremely clear.

以上,使用本發明的實施方式進行了說明,但本發明的技術範圍不限於上述實施方式所記載的範圍。本領域技術人員應當清楚,在上述實施方式的基礎上可加以增加各種變更和改進。由權利要求的記載可知,這種加以變更和改進的實施方式也包含在本發明的技術範圍內。 Although the embodiments of the present invention have been described above, the technical scope of the present invention is not limited to the scope described in the above embodiments. It will be apparent to those skilled in the art that various changes and modifications can be added to the above embodiments. It is apparent from the description of the claims that such modified and improved embodiments are also included in the technical scope of the present invention.

應當注意的是,權利要求書、說明書及附圖中所示的裝置、系統、程序以及方法中的動作、順序、步驟及階段等各個處理的執行順序,只要沒有特別明示“更早”、“早於”等,或者只要前面處理的輸出並不用在後面的處理中,則可以以任意順序實現。關於權利要求書、說明書及附圖中 的動作流程,為方便而使用“首先”、“然後”等進行了說明,但並不意味著必須按照這樣的順序實施。 It should be noted that the order of execution of the processes, the procedures, the steps, the stages, and the like in the devices, the systems, the procedures, and the methods in the claims, the description, and the drawings are as long as "early", " Earlier than "etc., or as long as the previously processed output is not used in later processing, it can be implemented in any order. In the claims, the description and the figures The operation flow has been described using "first", "then", etc. for convenience, but it does not mean that it must be implemented in this order.

10‧‧‧光學膜 10‧‧‧Optical film

12‧‧‧光學膜 12‧‧‧Optical film

14‧‧‧光學膜 14‧‧‧Optical film

20‧‧‧基材 20‧‧‧Substrate

28‧‧‧光配向性樹脂 28‧‧‧Photoalignment Resin

30‧‧‧配向層 30‧‧‧Alignment layer

32‧‧‧配向區域 32‧‧‧Alignment area

34‧‧‧配向區域 34‧‧‧Alignment area

38‧‧‧液晶化合物 38‧‧‧Liquid Crystal Compounds

40‧‧‧液晶層 40‧‧‧Liquid layer

42‧‧‧配向區域 42‧‧‧Alignment area

44‧‧‧配向區域 44‧‧‧Alignment area

50‧‧‧配向方向 50‧‧‧Orientation direction

60‧‧‧配向方向 60‧‧‧Alignment direction

70‧‧‧光吸收層 70‧‧‧Light absorbing layer

80‧‧‧反射防止層 80‧‧‧reflection prevention layer

100‧‧‧光學膜製造裝置 100‧‧‧Optical film manufacturing equipment

108‧‧‧供給部 108‧‧‧Supply Department

112‧‧‧配向層塗布部 112‧‧‧Alignment layer coating department

114‧‧‧配向層乾燥部 114‧‧‧Alignment layer drying department

116‧‧‧配向處理部 116‧‧‧Alignment Processing Department

120‧‧‧液晶層塗布部 120‧‧‧Liquid layer coating department

122‧‧‧液晶層乾燥部 122‧‧‧Liquid layer drying department

124‧‧‧液晶層硬化部 124‧‧‧Liquid layer hardening department

126‧‧‧捲取部 126‧‧‧Winding Department

130‧‧‧支撐輥 130‧‧‧Support roller

132‧‧‧搬送輥 132‧‧‧Transport roller

134、136‧‧‧曝光部 134, 136‧ ‧ exposure department

138‧‧‧掩膜 138‧‧‧ mask

140‧‧‧第一曝光區域 140‧‧‧First exposure area

142‧‧‧開口 142‧‧‧ openings

144‧‧‧第二曝光區域 144‧‧‧second exposure area

146‧‧‧開口 146‧‧‧ openings

148‧‧‧箭頭 148‧‧‧ arrow

149‧‧‧箭頭 149‧‧‧ arrow

150‧‧‧輥本體 150‧‧‧roll body

152‧‧‧抑制部 152‧‧‧Suppression Department

154‧‧‧曝光 154‧‧‧ exposure

300‧‧‧第一配向區域 300‧‧‧First alignment area

310‧‧‧第二配向區域 310‧‧‧Second alignment area

1000‧‧‧立體顯示裝置 1000‧‧‧ Stereo display device

1200‧‧‧光源 1200‧‧‧Light source

1300‧‧‧圖像顯示部 1300‧‧‧Image Display Department

1500‧‧‧光源側偏光板 1500‧‧‧Light source side polarizer

1600‧‧‧圖像生成部 1600‧‧‧Image Generation Department

1620‧‧‧右眼圖像生成區域 1620‧‧‧Right eye image generation area

1640‧‧‧左眼圖像生成區域 1640‧‧‧Left eye image generation area

1700‧‧‧出射側偏光板 1700‧‧‧Outlet side polarizer

A、B‧‧‧部分 Part A, B‧‧‧

圖1是表示第一實施方式所述的光學膜10的構成。 FIG. 1 shows the configuration of an optical film 10 according to the first embodiment.

圖2是表示設置有光學膜10的立體顯示裝置1000的分解斜視圖。 FIG. 2 is an exploded perspective view showing the stereoscopic display device 1000 in which the optical film 10 is provided.

圖3是表示本實施方式所述光學膜製造裝置100的整體構成。 FIG. 3 shows the overall configuration of the optical film manufacturing apparatus 100 according to the present embodiment.

圖4是表示本實施方式所述配向處理部116的構成。 FIG. 4 shows the configuration of the alignment processing unit 116 according to the present embodiment.

圖5是表示本實施方式所述掩膜138的平面圖。 FIG. 5 is a plan view showing the mask 138 of the present embodiment.

圖6是表示本實施方式所述配向處理部116的曝光部分的截面示意圖。 FIG. 6 is a schematic cross-sectional view showing an exposure portion of the alignment processing unit 116 according to the present embodiment.

圖7是表示本實施方式所述支撐輥130的放大截面圖。 FIG. 7 is an enlarged cross-sectional view showing the support roller 130 according to the embodiment.

圖8是表示本實施方式的第一變形例所述支撐輥130的放大截面圖。 FIG. 8 is an enlarged cross-sectional view showing the support roller 130 according to the first modification of the embodiment.

圖9是表示本實施方式的第二變形例所述支撐輥130的放大截面圖。 FIG. 9 is an enlarged cross-sectional view showing the support roller 130 according to a second modification of the embodiment.

圖10是表示本實施方式所述光學膜10的製造方法。 FIG. 10 shows a method of manufacturing the optical film 10 according to the embodiment.

圖11是表示本實施方式所述光學膜10的製造方法。 FIG. 11 shows a method of manufacturing the optical film 10 according to the embodiment.

圖12是表示通過偏振光顯微鏡對光學膜10的液晶層40的配向圖案進行觀察時的照片。 FIG. 12 is a photograph showing an alignment pattern of the liquid crystal layer 40 of the optical film 10 observed by a polarizing microscope.

圖13是表示本實施方式的第三變形例所述光學膜12的構成。 FIG. 13 shows a configuration of an optical film 12 according to a third modification of the embodiment.

圖14是表示本實施方式的第四變形例所述光學膜14的構成。 FIG. 14 shows a configuration of an optical film 14 according to a fourth modification of the embodiment.

圖15是表示通過偏振光顯微鏡對比較例8得到的光學膜的液晶層40的配向圖案的邊界進行觀察時的照片。 FIG. 15 is a photograph showing a boundary of an alignment pattern of the liquid crystal layer 40 of the optical film obtained in Comparative Example 8 by a polarizing microscope.

圖16是表示通過偏振光顯微鏡對實施例10得到的光學膜的液晶層40的配向圖案的邊界進行觀察時的照片。 FIG. 16 is a photograph showing the boundary of the alignment pattern of the liquid crystal layer 40 of the optical film obtained in Example 10 by a polarizing microscope.

20‧‧‧基材 20‧‧‧Substrate

28‧‧‧光配向性樹脂 28‧‧‧Photoalignment Resin

30‧‧‧配向層 30‧‧‧Alignment layer

130‧‧‧支撐輥 130‧‧‧Support roller

136‧‧‧曝光部 136‧‧‧Exposure Department

138‧‧‧掩膜 138‧‧‧ mask

150‧‧‧輥本體 150‧‧‧roll body

152‧‧‧抑制部 152‧‧‧Suppression Department

154‧‧‧曝光 154‧‧‧ exposure

A、B‧‧‧部分 Part A, B‧‧‧

Claims (12)

一種光學膜製造裝置,用以一邊連續搬送長條狀的膜,一邊製造具有多個配向區域的光學膜,其中包括:支撐輥,支撐設置有光配向性樹脂的所述膜;以及曝光部,與所述支撐輥相對向設置,且通過掩膜以偏振光對所述膜的所述光配向性樹脂進行曝光,藉此在所述光配向性樹脂上顯現出分子配向方向互異的所述多個配向區域,所述支撐輥具有輥本體及抑制部,所述抑制部用於抑制在所述輥本體處的所述曝光的反射。 An optical film manufacturing apparatus for manufacturing an optical film having a plurality of alignment regions while continuously conveying a long film, comprising: a support roller supporting the film provided with a photo-alignment resin; and an exposure portion, Opposite the support roller, and exposing the photo-alignment resin of the film with polarized light through a mask, thereby exhibiting the molecular alignment directions on the photo-alignment resin a plurality of alignment regions, the support roller having a roller body and a suppressing portion for suppressing reflection of the exposure at the roller body. 如申請專利範圍第1項所述的光學膜製造裝置,其中:所述抑制部是吸收所述曝光而抑制所述偏振光反射的曝光吸收層。 The optical film manufacturing apparatus according to claim 1, wherein the suppressing portion is an exposure absorbing layer that absorbs the exposure to suppress reflection of the polarized light. 如申請專利範圍第1項所述的光學膜製造裝置,其中:所述抑制部是使所述曝光發生干涉而抑制所述曝光反射的曝光干涉層。 The optical film manufacturing apparatus according to claim 1, wherein the suppressing portion is an exposure interference layer that interferes with the exposure to suppress the exposure and reflection. 如申請專利範圍第1項所述的光學膜製造裝置,其中:所述抑制部是使所述曝光發生散射而抑制所述曝光反射的曝光散射層。 The optical film manufacturing apparatus according to claim 1, wherein the suppressing portion is an exposure scattering layer that scatters the exposure to suppress the exposure and reflection. 一種光學膜的製造方法,包括:塗佈步驟:在長條狀的膜上塗佈光配向性樹脂並進行乾燥;以及曝光步驟:一邊沿長度方向連續搬送所述膜,一邊通過掩膜以偏振光對所述光配向性樹脂進行曝光,藉此在所 述光配向性樹脂上顯現出分子配向方向互異的所述多個配向區域,所述曝光步驟是對所述膜中與支撐輥相接觸的區域進行曝光的步驟,所述支撐輥包括輥本體及抑制部,所述抑制部設置於所述輥本體的表面,而抑制所述曝光的反射。 A method for producing an optical film, comprising: a coating step of: coating a photo-alignment resin on a long film and drying; and an exposing step of continuously transferring the film along a length direction while polarizing through a mask Light exposure of the photo-alignment resin, thereby The plurality of alignment regions in which the molecular alignment directions are different from each other are exhibited on the photo-alignment resin, and the exposing step is a step of exposing a region of the film that is in contact with the support roller, the support roller including the roller body And a suppressing portion that is provided on a surface of the roller body to suppress reflection of the exposure. 如申請專利範圍第5項所述的光學膜的製造方法,其中:所述抑制部是吸收所述曝光而抑制所述曝光反射的曝光吸收層。 The method for producing an optical film according to claim 5, wherein the suppressing portion is an exposure absorbing layer that absorbs the exposure to suppress the exposure and reflection. 如申請專利範圍第5項所述的光學膜的製造方法,其中:所述抑制部是使所述曝光發生干涉而抑制所述曝光反射的曝光干涉層。 The method for producing an optical film according to claim 5, wherein the suppressing portion is an exposure interference layer that interferes with the exposure to suppress the exposure and reflection. 如申請專利範圍第5項所述的光學膜的製造方法,其中:所述抑制部是使所述曝光發生散射而抑制所述曝光反射的曝光散射層。 The method for producing an optical film according to claim 5, wherein the suppressing portion is an exposure scattering layer that scatters the exposure to suppress the exposure and reflection. 一種光學膜,其是由如申請專利範圍第5項所述的製造方法製造而成。 An optical film produced by the production method as described in claim 5 of the patent application. 一種光學膜,包括:配向層,由光配向性樹脂形成,且具有分子配向方向互異的多個配向區域;透明的基材,支撐所述配向層;以及光吸收層,設置於為比所述配向層更靠近基材側,且吸收使所述光配向性樹脂硬化的波長光。 An optical film comprising: an alignment layer formed of a photo-alignment resin and having a plurality of alignment regions having mutually different molecular alignment directions; a transparent substrate supporting the alignment layer; and a light absorbing layer disposed at a ratio The alignment layer is closer to the substrate side and absorbs wavelength light that hardens the photoalignment resin. 一種光學膜,具有分子配向方向互異的多個配向 區域,其中:在所述多個配向區域間的邊界處,從平均線的凹凸為10μm以內。 An optical film having multiple alignments with different molecular alignment directions a region, wherein: at a boundary between the plurality of alignment regions, the unevenness from the average line is within 10 μm. 如申請專利範圍第11項所述的光學膜,其中:在所述多個配向區域間的邊界處,從平均線的凹凸為5μm以內。 The optical film according to claim 11, wherein the unevenness of the average line is within 5 μm at a boundary between the plurality of alignment regions.
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