TW201316425A - Detection method of wafer breaking - Google Patents
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- TW201316425A TW201316425A TW100136855A TW100136855A TW201316425A TW 201316425 A TW201316425 A TW 201316425A TW 100136855 A TW100136855 A TW 100136855A TW 100136855 A TW100136855 A TW 100136855A TW 201316425 A TW201316425 A TW 201316425A
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本發明是關於一種晶圓劈裂檢知方法,尤指一種利用晶圓劈裂前與劈裂作用時之影像明暗灰階差異比值或晶圓劈裂作用時切割道兩側影像明暗灰階差異比值的分析判斷而檢知晶圓是否完整劈斷的晶圓劈裂檢知方法。The invention relates to a wafer cracking detection method, in particular to a method for utilizing a difference ratio of image light and dark gray scales before wafer splitting and splitting, or a difference between light and dark gray scales on both sides of a cut track during wafer splitting. The analysis of the ratio is used to determine whether the wafer is completely broken or not.
目前在半導體元件的構裝製程中,其主要是利用劈裂手段將晶圓分割成多數顆晶粒,再將晶粒移置固定於載體上並電性連接,接續進行封膠成形等步驟,而完成一具有特定功能的半導體元件。At present, in the fabrication process of a semiconductor device, the wafer is mainly divided into a plurality of crystal grains by means of splitting, and the crystal grains are displaced and fixed on the carrier and electrically connected, and the steps of sealing and forming are successively performed. A semiconductor component having a specific function is completed.
在前述的晶圓劈裂步驟中,為了判斷晶圓是否完整劈裂,早期是藉由入眼透過高倍率的放大鏡加以檢視,此人眼判斷方式因有作業速度速,以及判斷錯誤率偏高等諸多問題。目前有人改用電腦搭配如CCD等影像擷取器以視覺化檢視晶圓劈裂前後的切割道尺寸變化的判斷技術,取代人眼檢視判斷作業,以提高晶圓劈裂檢視作業效率。In the above-mentioned wafer splitting step, in order to judge whether the wafer is completely split or not, the early inspection is performed by a high-magnification magnifying glass through the eye, and the human eye judges the mode because of the speed of the work and the high error rate. problem. At present, some people use a computer with a video capture device such as CCD to visually examine the judgment technique of the change of the size of the scribe line before and after the wafer splitting, instead of the human eye inspection operation, to improve the efficiency of wafer splitting inspection.
惟前述利用電腦搭配如CCD等影像擷取器以視覺化檢視晶圓劈裂前後的切割道尺寸變化的判斷技術,雖可達到檢知晶圓是否劈裂的目的,但是,晶圓劈裂前後的切割道尺寸變化甚小,以致易影響該電腦視覺化自動檢視系統於影像比對判斷上的正確性。However, the above-mentioned computer using a video capture device such as a CCD to visually examine the change in the size of the scribe line before and after the wafer splitting can achieve the purpose of detecting whether the wafer is split or not, but before and after the wafer is split. The size of the scribe line changes very little, so that it is easy to affect the correctness of the computer visual automatic inspection system in image comparison judgment.
本發明之主要目的在於提供一晶圓劈裂檢知方法,希藉此提供另一種判斷正確性高的晶圓劈裂檢知方法。The main object of the present invention is to provide a wafer splitting detection method, and to provide another method for detecting wafer cracking with high accuracy.
為達成前揭目的,本發明所提出的晶圓劈裂檢知方法是包含:一晶圓劈裂前的取像步驟,係於晶圓劈裂機承載台上的晶圓未進行劈裂作用前,由電腦控制影像擷取器自承載台下方向上擷取位於承載台劈裂空間處之晶圓待劈裂切割道及劈裂切割道兩側區域影像,並將該晶圓裂片前的影像資料傳送至電腦中儲存;一晶圓劈裂步驟,係由電腦控制晶圓劈裂機之劈刀由上而下對晶圓的預定切割道位置施以一衝擊作用力,使晶圓沿受衝擊之切割道產生分裂,並定義劈刀下降至劈裂高度衝擊晶圓預定切割道位置而使晶圓分裂的時段為劈裂作用時間區段;一晶圓劈裂作用時的取像步驟,係由電腦控制影像擷取器於所述劈裂作用時間區段自承載台下方向上擷取位於承載台劈裂空間處之晶圓劈裂切割道及劈裂切割道兩側影像,並將該晶圓劈裂作用時間區段的影像資料傳送至電腦中儲存;以及一電腦分析影像步驟,係由電腦以明暗灰階比對手段分析晶圓劈裂前與劈裂作用時間區段之晶圓劈裂切割道及劈裂切割道兩側區域影像的明暗灰階度差異比值,當分析判斷晶圓劈裂前與劈裂作用時間區段之晶圓劈裂切割道及其兩側區域影像的明暗灰階度差異比值大於或等於5%時,判定晶圓被劈裂的切割道完全劈裂;若分析判斷晶圓劈裂前與劈裂作用時間區段之晶圓劈裂切割道及其兩側的影像的明暗灰階度比值小於5%時,判定晶圓被劈裂的切割道未完全劈裂。In order to achieve the foregoing object, the wafer splitting detection method proposed by the present invention comprises: an image capturing step before a wafer splitting, and the wafer on the wafer splitting machine carrier is not splitting. Before, the computer-controlled image picker picks up the image of the wafer to be split and cut at the cracking space of the carrier and the side of the splitting and cutting road from the bottom of the carrying platform, and the front of the wafer is split. The image data is transferred to the computer for storage; a wafer splitting step is performed by a computer controlled wafer splitting machine, and the upper cutting edge applies an impact force to the predetermined cutting track position of the wafer to make the wafer edge The impacted cleavage path splits, and defines the time when the boring tool descends to the cleavage height to impact the predetermined scribe line position of the wafer and splits the wafer to be the splitting action time section; the image taking step when the wafer is splitting The computer-controlled image picker picks up the image of the wafer splitting cleavage and the splitting cleavage road at the cracking space of the bearing platform from the bottom of the cleavage time zone. Image data of the time zone of the wafer splitting action Send to the computer for storage; and a computer analysis image step, the computer analyzes the wafer splitting and splitting of the wafer before and after the splitting of the wafer by the light and dark gray scale comparison means. The contrast ratio of the light and dark gray scale of the regional image. When analyzing and judging the wafer splitting and cutting time of the wafer before the splitting and the splitting time zone, the difference between the light and dark gray scales of the image of the two sides is greater than or equal to 5%. When it is determined that the cleavage of the wafer is completely split, if the analysis determines that the ratio of the light-dark gray gradation of the wafer splitting cleavage and the images on both sides of the wafer before the splitting and the splitting time zone is smaller than At 5%, it was determined that the cleavage of the wafer was not completely split.
本發明所提出的另一晶圓劈裂檢知方法是包含:一晶圓劈裂步驟,係由電腦控制晶圓劈裂機之劈刀由上而下對晶圓的預定切割道位置施以一衝擊作用力,使晶圓沿受衝擊之切割道產生分裂,並定義劈刀下降至劈裂高度衝擊晶圓預定切割道位置而使晶圓分裂的時段為劈裂作用時間區段;一晶圓劈裂作用時的取像步驟,係由電腦控制影像擷取器於所述劈裂作用時間區段自承載台下方向上擷取位於承載台劈裂空間處之晶圓劈裂切割道兩側影像,並將該晶圓劈裂作用時間區段的影像資料傳送至電腦中儲存;以及一電腦分析影像步驟,係由電腦以明暗灰階比對手段分析晶圓劈裂前與劈裂作用時間區段之晶圓劈裂切割道兩側區域影像的明暗灰階度差異比值,當分析判斷晶圓劈裂作用時間區段之晶圓劈裂切割道兩側區域影像的明暗灰階度差異比值大於或等於5%時,判定晶圓被劈裂的切割道完全劈裂;若分析判斷晶圓劈裂作用時間區段之晶圓劈裂切割道兩側的影像的明暗灰階度比值小於5%時,判定晶圓被劈裂的切割道未完全劈裂。Another wafer splitting detection method proposed by the present invention comprises: a wafer splitting step, wherein the computer-controlled wafer splitting machine is configured to apply a predetermined cutting path position of the wafer from top to bottom. An impact force that causes the wafer to split along the impacted scribe line, and defines a time during which the cleavage to the cleavage height impacts the predetermined scribe line of the wafer and causes the wafer to split to be a splitting time section; The image capturing step of the circular splitting action is performed by a computer controlled image picker in the splitting action time section from the lower side of the carrying platform to take up the wafer splitting cutting path at the cracking space of the carrying platform. Side image, and the image data of the wafer splitting time section is transmitted to the computer for storage; and a computer analysis image step is performed by the computer to analyze the pre-cracking and splitting action of the wafer by the light and dark gray scale comparison means The difference between the brightness and darkness of the image on both sides of the wafer in the time segment is analyzed. The difference between the brightness and darkness of the image on both sides of the wafer splitting and cutting channel in the wafer splitting time zone is analyzed and judged. When the ratio is greater than or equal to 5% Determining that the cleavage of the wafer is completely split by the cleavage of the wafer; if the analysis determines that the ratio of the light and dark gradation of the image on both sides of the wafer cleavage scribe line of the wafer splitting time zone is less than 5%, the wafer is judged to be The splitting of the cutting path is not completely split.
藉由前揭晶圓劈裂檢知方法設計,其係採取自動化檢知方式結合於晶圓劈裂機構上使用,縮短判斷晶圓劈裂的檢知時間,更重要的是,本發明晶圓劈裂檢知方法利用電腦對晶圓劈裂前與作用時間區段所擷取影像,以明暗灰階度差異比值的分析判斷手段晶圓劈裂切割道及/或晶圓劈裂切割道兩側區域影像明暗灰階度比值判斷晶圓是否完整被劈裂,或是直接利用電腦對晶圓劈裂作用時間區段所擷取影像,以明暗灰階度差異比值的分析判斷手段晶圓劈裂切割道兩側區域影像明暗灰階度比值判斷晶圓是否完整被劈裂,使其可以有效提高判斷晶圓是否被完全劈裂的精確度。The wafer cleaving detection method is designed by using the automatic detection method combined with the wafer splitting mechanism to shorten the detection time for determining the wafer splitting, and more importantly, the wafer of the present invention. The cleaving detection method uses the computer to capture the image before the cleaving and the action time segment of the wafer, and analyzes and judges the ratio of the difference between the dark and the gray gradation, the wafer cleaving dicing and/or the wafer cleaving dicing The ratio of the light and dark gray scales of the side area image determines whether the wafer is completely cleaved, or directly uses the computer to capture the image of the wafer splitting time section, and analyzes and judges the difference ratio of the light and dark gray scales. The ratio of light and dark gray scales on both sides of the cracked scribe line determines whether the wafer is completely cleaved, which makes it possible to effectively improve the accuracy of determining whether the wafer is completely split.
如圖1所示,是揭示本發明晶圓劈裂檢知方法之一較佳實施例的流程圖,本發明之晶圓劈裂檢知方法是用於對置放定位於劈裂機承載台上的晶圓判斷其預設切割道被劈裂作用後是否完整斷裂者,該晶圓劈裂檢知方法之實施步驟是包含:一晶圓劈裂前的取像步驟、一晶圓劈裂步驟、一晶圓劈裂作用時的取像步驟以及一電腦分析影像步驟,其中:FIG. 1 is a flow chart showing a preferred embodiment of the wafer splitting detection method of the present invention. The wafer splitting detection method of the present invention is used for positioning and positioning on a splitting machine carrier. The wafer on the wafer is determined to be completely broken after the pre-cutting cleavage is cleaved. The implementation step of the wafer cleavage detection method includes: an image taking step before the wafer is split, and a wafer splitting a step, an image taking step when a wafer is split, and a computer analysis image step, wherein:
所述晶圓劈裂前的取像步驟,係於定位於劈裂機承載台上的晶圓未進行劈裂作用前,由電腦控制影像擷取器(如:CCD...等)自承載台下方由下向上擷取位於承載台劈裂空間處之晶圓待劈裂切割道及其兩側的影像,並將該晶圓裂片前的影像資料傳送至電腦中儲存,於擷取影像的同時,可自承載台下方之影像擷取器一側對承載台劈裂空間處投射輔助正向側光源,或者,亦可自晶圓上方對劈裂切割道位置投射輔助背光源。The image capturing step before the wafer splitting is performed by a computer controlled image capturing device (eg, CCD, etc.) before the wafer positioned on the carrier of the splitting machine is not split. The image of the wafer to be split and cut at the cracking space of the carrier and the two sides of the wafer are taken from the bottom to the bottom of the table, and the image data before the wafer is transferred to a computer for storage. At the same time, an auxiliary forward side light source may be projected from the image picker side below the carrying platform to the splitting space of the carrying platform, or an auxiliary backlight may be projected from the top of the wafer to the splitting cutting track position.
所述晶圓劈裂步驟,係由電腦控制該晶圓劈裂機之劈刀由上而下對晶圓的預定切割道位置施以一衝擊作用力,使晶圓沿受衝擊之切割道產生分裂,並定義劈刀下降劈裂高度衝擊晶圓預定切割道位置而使晶圓分裂的時段為劈裂作用時間區段。The wafer splitting step is performed by a computer controlled by the computer. The file of the wafer splitting machine applies an impact force to the predetermined cutting track position of the wafer from top to bottom, so that the wafer is generated along the impacted cutting path. Splitting, and defining the falling edge of the file to impact the predetermined scribe line position of the wafer and splitting the wafer for a period of time.
所述晶圓劈裂作用時的取像步驟,係由電腦控制影像擷取器於所述劈裂作用時間區段自承載台下方由下向上擷取位於承載台劈裂空間處之晶圓劈裂切割道及其兩側的影像,並將該晶圓劈裂作用後的影像資料傳送至電腦中儲存,於擷取影像的同時,可自承載台下方之影像擷取器一側對承載台劈裂空間處投射輔助正向側光源,或者,亦可自晶圓上方對劈裂切割道位置投射輔助背光源,所述之電腦分析影像步驟,係由電腦以明暗灰階比對手段分析晶圓劈裂前、後之晶圓劈裂切割道及其兩側的影像的明暗灰階度差異比值,當差異比值分析判斷晶圓劈裂前、後之晶圓劈裂切割道及其兩側的影像的明暗灰階度差異比值大於或等於5%時,即判定晶圓被劈裂的切割道完全劈裂,若分析判斷晶圓劈裂前、後之晶圓劈裂切割道及其兩側的影像的明暗灰階度差異比值小於5%時,即判定晶圓被劈裂的切割道未完全劈裂,則須重新進行晶圓劈裂步驟。The image capturing step of the wafer splitting action is performed by a computer-controlled image picker to draw the wafer at the cracking space of the carrying platform from the bottom to the bottom of the splitting time zone. The image of the dicing road and the two sides thereof are split, and the image data after the splitting of the wafer is transmitted to the computer for storage, and the image can be taken from the image picker side under the carrying platform The auxiliary side light source is projected at the cleft space, or the auxiliary backlight may be projected from the top of the wafer to the position of the cleaving scribe line. The computer analyzes the image step, and the computer analyzes the crystal by light and dark gray scale comparison means. The difference between the light and dark gray scales of the image of the wafer splitting cleavage and the images on both sides before and after the splitting, when the difference ratio analysis determines the wafer splitting cleavage and its sides before and after the wafer splitting When the ratio of light and dark gray scale difference of the image is greater than or equal to 5%, it is determined that the cleavage of the wafer is completely split, and if the analysis determines the wafer splitting cleavage before and after the wafer splitting, The difference between the brightness and darkness of the image on the side is less than 5%. When it is determined that the cleavage of the wafer is not completely split, the wafer splitting step must be performed again.
以下進一步以實例加以說明,如圖2所示,係揭示晶圓2劈裂前的取像步驟,其中於定位於劈裂機承載台1上的晶圓2未進行劈裂作用前,由電腦控制影像擷取器3自承載台1下方由下向上擷取位於承載台1劈裂空間處之晶圓2待劈裂切割道20及其兩側的影像,並將該晶圓2裂片前的影像資料傳送至電腦中儲存,於擷取影像時,可由輔助正向側光源4或輔助背光源5提供照明,該晶圓2裂片前的影像如圖3所示(參照附件一圖片A)。The following further illustrates by way of example, as shown in FIG. 2, the method of taking the image before the splitting of the wafer 2 is disclosed, wherein the wafer 2 positioned on the splitting machine carrier 1 is not cleaved before being used by the computer. The image capturing device 3 controls the image of the wafer 2 to be split and the dicing street 20 and the two sides of the wafer 2 at the cracking space of the carrier 1 from the bottom of the carrier 1 and the wafer 2 is ruptured. The image data is transmitted to the computer for storage. When capturing the image, the auxiliary forward side light source 4 or the auxiliary backlight source 5 can provide illumination. The image before the split of the wafer 2 is as shown in FIG. 3 (refer to Appendix A, picture A).
於晶圓劈裂作用時,可區分以下數種狀態,其中:In the case of wafer splitting, the following states can be distinguished, among which:
如圖4所示,當劈刀6未劈裂晶圓2時,由電腦控制影像擷取器3自承載台1下方由下向上擷取位於承載台1劈裂空間處之晶圓2待劈裂切割道20及其兩側的影像,並將該晶圓2劈裂作用時的影像資料傳送至電腦中儲存,於擷取影像時,可由輔助正向側光源4或輔助背光源5提供照明,該晶圓劈裂作用時的影像如圖5所示(參照附件一圖片B),接續由電腦以明暗灰階比對手段分析晶圓2劈裂前、後之晶圓2劈裂切割道20及其兩側的影像的明暗灰階度差異比值,其中因晶圓2劈裂後之晶圓2劈裂切割道20處無裂痕,故電腦依據所擷取的影像分析判斷晶圓2劈裂前後之影像無明顯差異,亦即彼此間的明暗灰階度差異比值小於5%時,即判定晶圓未劈裂。As shown in FIG. 4, when the boring tool 6 does not split the wafer 2, the image pickup device 3 is controlled by the computer to draw the wafer 2 at the cracking space of the carrying platform 1 from the bottom of the carrying platform 1 from below. The image of the dicing street 20 and the two sides thereof are split, and the image data of the wafer 2 is split and transferred to a computer for storage. When the image is captured, the auxiliary side light source 4 or the auxiliary backlight source 5 can be illuminated. The image of the wafer splitting action is shown in Figure 5 (refer to Appendix B, picture B). The wafer is analyzed by the computer to analyze the wafer 2 before and after the splitting of the wafer. The difference between the brightness and darkness of the image on the 20th and the two sides of the image, wherein the wafer 2 is cracked after the wafer 2 is cracked, and there is no crack in the 20 cleavage road. Therefore, the computer judges the wafer according to the image analysis obtained. There is no significant difference between the images before and after the cracking, that is, when the ratio of the difference between the light and dark gray scales is less than 5%, it is determined that the wafer is not split.
如圖6所示,當劈刀6劈裂晶圓2時,晶圓2自劈裂切割道20產生裂痕而晶圓2單側區段翹起,此時電腦控制影像擷取器自承載台1下方由下向上擷取位於承載台1劈裂空間處之晶圓待劈裂切割道20及其兩側的影像,並將該晶圓2劈裂作用時的影像資料傳送至電腦中儲存,於擷取影像時,可由輔助正向側光源4或輔助背光源5提供照明,該晶圓2劈裂作用時的影像如圖7所示(參照附件一圖片C),接續由電腦以明暗灰階比對手段分析晶圓2劈裂前、後之晶圓劈裂切割道20及其兩側的影像的明暗灰階度差異比值,其中因晶圓2劈裂後之晶圓劈裂切割道20處有裂痕,經由晶圓2劈裂切割道20處一側斷裂面在光線折射下產生明顯的暗帶8,另一側維持亮帶7,且與晶圓劈裂前相應區段產生明暗差異,故電腦依據所擷取的影像分析判斷晶圓2劈裂前後之影像有明顯明暗的灰階差異,亦即彼此間的明暗灰階度差異比值大於5%,進而判定晶圓2已完全劈裂。As shown in FIG. 6, when the boring tool 6 splits the wafer 2, the wafer 2 is cracked from the split cleavage trajectory 20 and the wafer 2 is lifted in one side, and the computer controlled image picker is self-supporting. 1 below, the image of the wafer to be cleaved and secrated at the cracking space of the carrying platform 1 and the two sides thereof are captured from the bottom to the top, and the image data of the wafer 2 is split and transferred to a computer for storage. When the image is captured, illumination can be provided by the auxiliary forward side light source 4 or the auxiliary backlight source 5, and the image of the wafer 2 when splitting is shown in FIG. 7 (refer to the attached picture C), and then connected by the computer to the light and dark gray. The step ratio method is used to analyze the difference ratio of the light and dark gray scales of the wafer splitting trajectory 20 and the images on both sides of the wafer before and after the splitting of the wafer 2, wherein the wafer splitting and cutting channel after the wafer 2 is split There are cracks in 20, and the fracture surface on one side of the cleavage trajectory 20 through the wafer 2 produces a distinct dark band 8 under the refracting of the light, and the bright band 7 is maintained on the other side, and the corresponding section produces a light and dark before the wafer is split. Difference, so the computer judges that the image before and after the cleaving of the wafer 2 has a distinct gray-dark difference, that is, the other The difference between the brightness and darkness of the gray scale is greater than 5%, and it is determined that the wafer 2 is completely split.
如圖8所示,當劈刀6劈裂晶圓2時,晶圓2自劈裂切割道20產生裂痕而晶圓2兩側區段分別翹起,此時電腦控制影像擷取器3自承載台1下方由下向上擷取位於承載台1劈裂空間處之晶圓2待劈裂切割道20及其兩側的影像,並將該晶圓2劈裂作用時的影像資料傳送至電腦中儲存,於擷取影像時,可由輔助正向側光源4或輔助背光源5提供照明,該晶圓2劈裂作用時的影像如圖9所示(參照附件一圖片D),接續由電腦以明暗灰階比對手段分析晶圓2劈裂前、後之晶圓劈裂切割道20及其兩側的影像的明暗灰階度差異比值,其中因晶圓2劈裂後之晶圓劈裂切割道20處有裂痕,經由晶圓2劈裂切割道20處兩側斷裂面在光線折射下產生明顯的暗帶8,若劈刀深入晶圓劈切割道20,則於晶圓劈切割道20處產生亮帶9,與晶圓劈裂前相應的區段產生明暗差異,故電腦依據所擷取的影像分析判斷晶圓2劈裂前後之影像有明顯明暗的灰階差異,亦即彼此間的明暗灰階度差異比值大於5%,進而判定晶圓2已完全劈裂。As shown in FIG. 8, when the trowel 6 splits the wafer 2, the wafer 2 is cracked from the cleavage cutting channel 20, and the two sides of the wafer 2 are respectively lifted up, and the computer controls the image picker 3 at this time. The image of the wafer 2 to be cleaved on the cleavage cutting path 20 and the two sides of the wafer 2 at the cracking space of the carrying platform 1 is taken up from the bottom of the loading platform 1 and the image data of the wafer 2 is split and transmitted to the computer. The medium is stored, and when the image is captured, the auxiliary forward side light source 4 or the auxiliary backlight source 5 can be provided with illumination. The image of the wafer 2 when splitting is shown in FIG. 9 (refer to the attached picture D), followed by the computer. The difference between the brightness and darkness of the image of the wafer splitting trajectory 20 and the images on both sides of the wafer 2 before and after the splitting of the wafer 2 is analyzed by the light and dark gray scale alignment method, wherein the wafer 劈 after the wafer 2 is split There are cracks in the cracked trajectory 20, and the fracture surface on both sides of the cleavage trajectory 20 through the wafer 2 produces a distinct dark band 8 under the refracting of the light. If the boring tool penetrates the wafer 劈 scribe line 20, the wafer 劈 is cut. The bright band 9 is generated at the road 20, and the corresponding section of the wafer before the splitting produces a difference in brightness and darkness, so the computer judges the crystal according to the captured image analysis. 2 before and after the image splitting significant difference in shade of gray, i.e. gray scale brightness differences between each other ratio greater than 5%, and further determines the wafer 2 has been completely cleaved.
如圖10所示,是揭示本發明晶圓劈裂檢知方法之另一較佳實施例的流程圖,該晶圓劈裂檢知方法之實施步驟是包含:一晶圓劈裂步驟、一晶圓劈裂作用時的取像步驟以及一電腦分析影像步驟,其中:As shown in FIG. 10, it is a flowchart showing another preferred embodiment of the wafer splitting detection method of the present invention. The implementation step of the wafer splitting detection method includes: a wafer splitting step, a The image capturing step during wafer splitting and a computer analysis image step, wherein:
該晶圓劈裂步驟係由電腦控制晶圓劈裂機之劈刀由上而下對晶圓的預定切割道位置施以一衝擊作用力,使晶圓沿受衝擊之切割道產生分裂,並定義劈刀下降至劈裂高度衝擊晶圓預定切割道位置而使晶圓分裂的時段為劈裂作用時間區段。The wafer splitting step is performed by a computer controlled wafer splitting machine. The upper razor applies an impact force to the predetermined scribe line position of the wafer to cause the wafer to split along the impacted cutting channel, and The period during which the cleavage to the cleavage height impacts the predetermined scribe line of the wafer and the wafer is split is defined as the cleavage time zone.
所述晶圓劈裂作用時的取像步驟係由電腦控制影像擷取器於所述劈裂作用時間區段自承載台下方向上擷取位於承載台劈裂空間處之晶圓劈裂切割道兩側的影像,並將該晶圓劈裂作用時間區段的影像資料傳送至電腦中儲存,於擷取影像的同時,可自承載台下方之影像擷取器一側對承載台劈裂空間處投射輔助正向側光源,或者,亦可自晶圓上方對劈裂切割道位置投射輔助背光源。The image capturing step of the wafer splitting is performed by a computer controlled image picker in the splitting time section from the lower side of the carrying platform to take up the wafer splitting and cutting at the cracking space of the carrying platform. The image on both sides of the road, and the image data of the wafer splitting time section is transmitted to the computer for storage, and the image can be taken from the image picker side under the carrying platform The auxiliary side light source is projected at the space, or the auxiliary backlight may be projected from the top of the wafer to the position of the splitting scribe line.
所述電腦分析影像步驟係由電腦以明暗灰階比對手段分析晶圓劈裂作用時間區段之晶圓劈裂切割道兩側區域影像的明暗灰階度差異比值,如圖7所示以及參照附件一圖片C所示,當分析判斷晶圓劈裂時間區段之晶圓劈裂切割道兩側區域影像的明暗灰階度差異比值大於或等於5%時,判定晶圓被劈裂的切割道完全劈裂;若分析判斷晶圓劈裂時間區段之晶圓劈裂切割道兩側的影像的明暗灰階度比值小於5%時,判定晶圓被劈裂的切割道未完全劈裂。The computer analysis image step is performed by a computer to analyze the difference ratio of the light and dark gray scales of the image on both sides of the wafer splitting scribe line in the wafer splitting time section by the light and dark gray scale comparison means, as shown in FIG. 7 and Referring to Figure C of Annex I, when the analysis determines that the ratio of the difference between the light and dark gray scales of the image on both sides of the wafer splitting scribe line in the wafer splitting time section is greater than or equal to 5%, it is determined that the wafer is split. The scribe line is completely cleaved; if the ratio of the light and dark gradation of the image on both sides of the wafer splitting scribe line in the wafer splitting time section is less than 5%, the cleavage of the wafer is not completely determined. crack.
由前述中說明中可知,本發明以前揭晶圓劈裂檢知方法設計,係採取自動化檢知方式並結合於晶圓劈裂機構上使用,可有效縮短晶圓劈裂成多數顆晶粒的製程時間,更重要的是,本發明晶圓劈裂檢知方法係利用電腦以明暗灰階度的比對分析判斷手段對晶圓劈裂前與劈裂作用時間區段所擷取影像作明暗灰階度差異比值的比對分析判斷,或是對晶圓劈裂作用時間區段所擷取影像中之晶圓切割道兩側影像的明暗灰階度差異比值作,使其可以提高判斷晶圓是否被完全劈裂的精確度,為半導體元件構裝製程中的晶圓劈裂程序提供一項自動化且精確高的晶圓劈裂檢知方法。It can be seen from the foregoing description that the method for detecting the crack detection of the wafer in the prior art is adopted by the automatic detection method and combined with the wafer splitting mechanism, which can effectively shorten the cracking of the wafer into a plurality of crystal grains. Process time, and more importantly, the wafer cleaving detection method of the present invention uses a computer to compare and determine the light and dark gray scale alignment analysis means for the image captured by the wafer before the splitting and splitting time zone The ratio of the gray scale difference ratio is judged or judged, or the difference ratio of the light and dark gray scales of the images on both sides of the wafer scribe line in the image captured by the wafer splitting time section is made, so that the judgment crystal can be improved The accuracy of whether the circle is completely split provides an automated and accurate method for wafer cleaving detection for wafer cleaving in semiconductor component fabrication processes.
以上所述,僅是揭示本發明之較佳實施例,並非對本發明作任何形式上的限制,任何所屬技術領域中具有通常知識者在不脫離本發明所提出的技術特徵的範圍內,利用本發明所揭示技術內容所作出局部更動或修飾的等效實施例,均仍屬於本發明技術特徵的範圍內。The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any one of ordinary skill in the art can use the present invention without departing from the technical features of the present invention. Equivalent embodiments of the local changes or modifications made by the disclosed technology are still within the scope of the technical features of the present invention.
1...承載台1. . . Carrying platform
2...晶圓2. . . Wafer
20...劈裂切割道20. . . Splitting and cutting
3...影像擷取器3. . . Image capture device
4...輔助正向側光源4. . . Auxiliary positive side source
5...輔助背光源5. . . Auxiliary backlight
6...劈刀6. . . chopper
7...亮帶7. . . Bright band
8...暗帶8. . . Dark band
9...亮帶9. . . Bright band
圖1是本發明晶圓劈裂檢知方法之一較佳實施例的流程圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a flow chart showing a preferred embodiment of the wafer splitting detection method of the present invention.
圖2是本發明晶圓劈裂檢知方法於晶圓劈裂前取像步驟之平面示意圖。2 is a schematic plan view showing the wafer cleavage detecting method of the present invention before the wafer splitting.
圖3是圖2所示晶圓劈裂前所擷取之影像示意圖。FIG. 3 is a schematic view of the image taken before the wafer is cracked in FIG. 2. FIG.
圖4是本發明於晶圓未劈裂時擷取影像之平面示意圖。4 is a schematic plan view of the present invention for capturing an image when the wafer is not split.
圖5是圖4所示晶圓未劈裂時擷取之影像示意圖。FIG. 5 is a schematic view of the image taken when the wafer shown in FIG. 4 is not split.
圖6是本發明於晶圓劈裂時擷取影像之平面示意圖(一)。FIG. 6 is a schematic plan view (1) of the present invention for capturing an image when the wafer is cleaved.
圖7是圖6所示晶圓劈裂作用時擷取之影像示意圖。Fig. 7 is a schematic view showing the image taken during the splitting action of the wafer shown in Fig. 6.
圖8是本發明於晶圓劈裂作用時擷取影像之平面示意圖(二)。FIG. 8 is a schematic plan view (2) of the present invention for capturing images during wafer splitting.
圖9是圖8所示晶圓劈裂作用時擷取之影像示意圖。FIG. 9 is a schematic view showing the image taken during the splitting action of the wafer shown in FIG. 8. FIG.
圖10是本發明晶圓劈裂檢知方法之另一較佳實施例的流程圖。Figure 10 is a flow chart showing another preferred embodiment of the wafer splitting detection method of the present invention.
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