TW201311935A - Electrolytic device - Google Patents
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Abstract
Description
本發明係關於一種包含電解槽之電解裝置。 The present invention relates to an electrolysis apparatus comprising an electrolysis cell.
先前,於半導體之製造步驟等中,氟氣被用於材料之清洗及表面改質等各種用途中。於此情形時,存在使用氟氣自身之情況,亦存在使用以氟氣為基礎而合成之NF3(三氟化氮)氣體、NeF(氟化氖)氣體及ArF(氟化氬)氣體等各種氟系氣體之情況。 Conventionally, in the manufacturing steps of semiconductors and the like, fluorine gas has been used in various applications such as cleaning of materials and surface modification. In this case, there is a case where fluorine gas itself is used, and NF 3 (nitrogen trifluoride) gas, NeF (fluorene fluoride) gas, ArF (argon fluoride) gas, etc. synthesized using fluorine gas are also used. The case of various fluorine-based gases.
為了穩定地供給氟氣,通常使用電解HF(氟化氫)而產生氟氣之電解裝置。此種電解裝置中,例如,於電解槽內形成包含KF-HF(鉀-氟化氫)系之混合熔鹽之電解浴。電解槽內之電解浴藉由電解而產生氟氣。 In order to stably supply the fluorine gas, an electrolysis device that generates fluorine gas by electrolyzing HF (hydrogen fluoride) is usually used. In such an electrolysis apparatus, for example, an electrolytic bath containing a KF-HF (potassium-hydrogen fluoride)-based mixed molten salt is formed in an electrolytic bath. The electrolytic bath in the electrolytic cell generates fluorine gas by electrolysis.
例如,專利文獻1中所記載之熔鹽電解裝置具有包含電解槽本體及上蓋之電解槽。電解槽之內部藉由隔板分離成位於電解槽之中心部之陽極室與包圍該陽極室之陰極室。於陽極室中配置有陽極,於陰極室中設置有陰極。於上蓋之大致中央部,形成有用以將陽極插入至電解槽本體內之開口部,以覆蓋開口部之方式設置有蓋體。於蓋體與上蓋之間介隔有氣體密封材料。於蓋體垂直地設置有保持陽極之連結棒。 For example, the molten salt electrolysis device described in Patent Document 1 has an electrolytic cell including an electrolytic cell body and an upper lid. The inside of the electrolytic cell is separated by a separator into an anode chamber located at a central portion of the electrolytic cell and a cathode chamber surrounding the anode chamber. An anode is disposed in the anode chamber, and a cathode is disposed in the cathode chamber. At a substantially central portion of the upper cover, an opening for inserting the anode into the electrolytic cell body is formed, and a cover is provided to cover the opening. A gas sealing material is interposed between the cover and the upper cover. A connecting rod for holding the anode is vertically disposed on the cover body.
如上述般,於電解槽內一併產生氟氣與氫氣。因此,於電解槽內設置有用以將所產生之氟氣與氫氣分離之隔板。於專利文獻2所記載之電解槽中,為了防止氣體之混合而 使用具有多孔性或纖維狀之構成之隔板。於此情形時,電解浴可透過隔板。因此,防止配置於電解槽內之陽極與陰極之間之通電電阻之增加。 As described above, fluorine gas and hydrogen gas are generated together in the electrolytic cell. Therefore, a separator for separating the generated fluorine gas from the hydrogen gas is provided in the electrolytic cell. In the electrolytic cell described in Patent Document 2, in order to prevent mixing of gases A separator having a porous or fibrous structure is used. In this case, the electrolytic bath can pass through the separator. Therefore, an increase in the electric resistance between the anode and the cathode disposed in the electrolytic cell is prevented.
[專利文獻1]日本專利特開2005-48290號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-48290
[專利文獻2]日本專利特開2000-104187號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2000-104187
於專利文獻1所記載之熔鹽電解裝置中,藉由將蓋體自上蓋卸除,可容易地將陽極與上蓋一併自電解槽本體卸除。藉此,即便於陽極消耗之情形時,亦可容易地更換陽極。 In the molten salt electrolysis device described in Patent Document 1, the anode and the upper lid can be easily removed from the electrolytic cell body by removing the lid from the upper lid. Thereby, the anode can be easily replaced even in the case of anode consumption.
然而,於上述熔鹽電解裝置中,介隔於蓋體與上蓋之間之氣體密封材料要求有對氟氣之耐蝕性。又,即便為對氟氣具有耐蝕性之氣體密封材料,亦會因長期地接觸氟氣而腐蝕。因此,必需頻繁地更換氣體密封材料。其結果為,保養之成本增加。又,因更換氣體密封材料之頻度多於更換陽極之頻度,故保養之作業效率較差。 However, in the above molten salt electrolysis device, the gas sealing material interposed between the lid body and the upper lid is required to have corrosion resistance to fluorine gas. Further, even a gas sealing material having corrosion resistance to fluorine gas may be corroded by contact with fluorine gas for a long period of time. Therefore, it is necessary to frequently change the gas sealing material. As a result, the cost of maintenance increases. Moreover, since the frequency of replacing the gas sealing material is more than the frequency of replacing the anode, the maintenance work efficiency is poor.
又,本發明者發現,於專利文獻2之電解槽中,因產生之氣泡堵塞隔板之孔而阻礙電解浴之透過。藉此,使電解浴之電解反應無法穩定地進行。 Moreover, the inventors of the present invention found that in the electrolytic cell of Patent Document 2, the generated bubbles block the pores of the separator and hinder the permeation of the electrolytic bath. Thereby, the electrolysis reaction of the electrolytic bath cannot be stably performed.
本發明之目的在於提供一種可降低保養之成本及提高保養之作業效率之電解裝置。 It is an object of the present invention to provide an electrolysis apparatus which can reduce the cost of maintenance and improve the efficiency of maintenance work.
本發明之其他目的在於提供一種可防止氣體之混合並且可穩定地進行電解反應之電解裝置。 Another object of the present invention is to provide an electrolysis apparatus which can prevent mixing of gases and can stably perform an electrolysis reaction.
(1)本發明之一態樣之電解裝置係用以藉由對電解浴進行電解而產生氟氣及其他氣體者,且包括收容電解浴之電解槽;電解槽包括:電解槽本體,其於上部具有第1開口;第1蓋體,其具有小於第1開口之第2開口,且以閉合第1開口之方式設置於電解槽本體;第1密封構件,其以包圍第2開口之方式設置於第1蓋體;第2蓋體,其以閉合第2開口之方式隔著第1密封構件而設置於第1蓋體上;第1電極,其安裝於第2蓋體;及隔板,其將電解槽本體內產生氟氣之第1室與產生其他氣體之第2室分離;隔板係以第1室配置於第1密封構件之內側區域之方式形成。 (1) An electrolysis device according to an aspect of the present invention is for generating fluorine gas and other gases by electrolysis of an electrolytic bath, and includes an electrolytic cell for accommodating an electrolytic bath; the electrolytic cell includes: an electrolytic cell body, wherein The upper portion has a first opening; the first cover has a second opening smaller than the first opening, and is provided in the electrolytic cell body so as to close the first opening; and the first sealing member is provided to surround the second opening a first lid body; the second lid body is provided on the first lid body via the first sealing member so as to close the second opening; the first electrode is attached to the second lid body; and the separator is The first chamber that generates fluorine gas in the electrolytic cell body is separated from the second chamber that generates other gas; and the separator is formed such that the first chamber is disposed in the inner region of the first sealing member.
於該電解裝置中,電解槽本體之上部之第1開口藉由第1蓋體而閉合。第1蓋體之第2開口隔著第1密封構件而藉由第2蓋體閉合。第1電極安裝於第2蓋體。第2開口小於第1開口,因此第2蓋體成為較第1蓋體小型且輕量之構成。因此,即便於第1電極消耗之情形時,亦可藉由將第2蓋體自第1蓋體卸除而容易地更換第1電極。 In the electrolysis device, the first opening of the upper portion of the electrolytic cell body is closed by the first lid. The second opening of the first cover is closed by the second cover via the first sealing member. The first electrode is attached to the second lid. Since the second opening is smaller than the first opening, the second cover is smaller and lighter than the first cover. Therefore, even when the first electrode is consumed, the first electrode can be easily replaced by removing the second lid from the first lid.
又,第1室係藉由隔板而配置於第1密封構件之內側區域。於此情形時,第1室中所產生之氟氣不會接觸第1密封構件,因此防止第1密封構件之腐蝕。藉此,更換第1密封構件之頻度減少。 Further, the first chamber is disposed in the inner region of the first sealing member by the partition plate. In this case, since the fluorine gas generated in the first chamber does not contact the first sealing member, corrosion of the first sealing member is prevented. Thereby, the frequency of replacing the first sealing member is reduced.
該等之結果為,電解裝置之保養之成本降低,並且保養之作業效率提高。 As a result of this, the cost of maintenance of the electrolysis device is reduced, and the efficiency of maintenance work is improved.
(2)隔板亦可以包圍第1電極之周圍之方式而一體地設 置於第1蓋體。於此情形時,可藉由將第2蓋體自第1蓋體卸除而容易地檢查隔板。藉此,電解裝置之保養之成本進一步降低,並且保養之作業效率進一步提高。 (2) The separator may be integrally provided in such a manner as to surround the periphery of the first electrode Placed in the first cover. In this case, the separator can be easily inspected by removing the second lid from the first lid. Thereby, the cost of maintenance of the electrolysis device is further reduced, and the work efficiency of maintenance is further improved.
(3)電解槽本體亦可作為第2電極發揮功能。於此情形時,無需另行設置第2電極。藉此,可簡化電解裝置之構成。 (3) The electrolytic cell body can also function as a second electrode. In this case, it is not necessary to separately provide the second electrode. Thereby, the constitution of the electrolysis device can be simplified.
(4)電解裝置進而包括以包圍第1開口之方式設置於電解槽本體之第2密封構件,第1蓋體亦可隔著第2密封構件而設置於電解槽本體上。 (4) The electrolysis device further includes a second sealing member that is provided in the electrolytic cell body so as to surround the first opening, and the first cover may be provided on the electrolytic cell body via the second sealing member.
於此情形時,可將第1蓋體自電解槽本體卸除。因此,可藉由將第1蓋體自電解槽本體卸除而檢查電解裝置之內部。 In this case, the first lid body can be removed from the electrolytic cell body. Therefore, the inside of the electrolysis device can be inspected by removing the first lid from the electrolytic cell body.
(5)本發明之其他態樣之電解裝置包括:電解槽,其收容電解浴;隔板,其以將電解槽內區劃為陽極室與陰極室之方式而設置且具有電解浴中之離子可通過之開口;陽極,其設置於電解槽之陽極室;及陰極,其設置於電解槽之陰極室;隔板之開口具有朝向陽極室及陰極室之至少一者而向斜上方延伸之上表面。 (5) The electrolysis apparatus according to another aspect of the present invention includes: an electrolytic cell that houses an electrolytic bath; and a separator that is disposed in such a manner that the inside of the electrolytic cell is divided into an anode chamber and a cathode chamber and has ions in the electrolytic bath. An opening through which an anode is disposed in an anode chamber of the electrolytic cell; and a cathode disposed in a cathode chamber of the electrolytic cell; the opening of the separator having an upper surface extending obliquely upward toward at least one of the anode chamber and the cathode chamber .
於該電解裝置中,電解槽內藉由隔板區劃為陽極室與陰極室。藉由對設置於陽極室之陽極與設置於陰極室之陰極之間施加電壓,電解槽內之電解浴得以電解。藉此,於陽極室及陰極室中產生氣體。 In the electrolysis device, the electrolytic cell is partitioned into an anode chamber and a cathode chamber by a separator. The electrolytic bath in the electrolytic cell is electrolyzed by applying a voltage between the anode disposed in the anode chamber and the cathode disposed in the cathode chamber. Thereby, gas is generated in the anode chamber and the cathode chamber.
於隔板上設置有電解浴中之離子可通過之開口。開口具有朝向陽極室及陰極室之至少一者而向斜上方延伸之上表 面。因此,即便所產生之氣泡自陽極室及陰極室之上述之至少一者進入開口內,該氣泡亦會沿開口之上表面返回至陽極室或陰極室。因此,藉由以所產生之氣泡無法通過之方式設定開口之大小,可防止陽極室中產生之氣體與陰極室中產生之氣體混合,並且可防止開口由產生之氣泡堵塞。其結果為,可防止氣體之混合,並且可使電解浴之電解反應穩定地進行。 An opening through which ions in the electrolytic bath can pass is disposed on the separator. The opening has an upper surface that extends obliquely upward toward at least one of the anode chamber and the cathode chamber surface. Therefore, even if the generated bubble enters the opening from at least one of the anode chamber and the cathode chamber, the bubble returns to the anode chamber or the cathode chamber along the upper surface of the opening. Therefore, by setting the size of the opening in such a manner that the generated bubble cannot pass, the gas generated in the anode chamber can be prevented from being mixed with the gas generated in the cathode chamber, and the opening can be prevented from being clogged by the generated bubble. As a result, mixing of the gas can be prevented, and the electrolytic reaction of the electrolytic bath can be stably performed.
(6)於陽極室中產生氟氣,於陰極室中產生氫氣,開口之上表面亦可以朝向陰極室側而向斜上方延伸之方式而設置。 (6) Fluorine gas is generated in the anode chamber, and hydrogen gas is generated in the cathode chamber, and the upper surface of the opening may be disposed to extend obliquely upward toward the cathode chamber side.
氫氣與氟氣相比,不易溶解於電解浴中,因此氫氣之氣泡滯留於開口內而容易堵塞開口。因此,藉由開口之上表面以朝向陰極室側而向斜上方延伸之方式設置,即便陰極室中產生之氫氣之氣泡進入開口內,該氣泡亦會沿開口之上表面返回至陰極室。藉此,防止開口被氫氣堵塞。 Hydrogen is less likely to be dissolved in the electrolytic bath than the fluorine gas, so that the bubbles of hydrogen remain in the opening and easily block the opening. Therefore, by providing the upper surface of the opening to extend obliquely upward toward the cathode chamber side, even if the bubble of hydrogen gas generated in the cathode chamber enters the opening, the bubble returns to the cathode chamber along the upper surface of the opening. Thereby, the opening is prevented from being clogged with hydrogen.
(7)陽極室側之開口之端部之面積亦可小於陰極室側之開口之端部之面積。 (7) The area of the end of the opening on the anode chamber side may be smaller than the area of the end of the opening on the cathode chamber side.
於此情形時,防止陽極室中所產生之氟氣進入開口內。藉此,防止氟氣向陰極室移動,防止氟氣與氫氣混合。 In this case, the fluorine gas generated in the anode chamber is prevented from entering the opening. Thereby, the fluorine gas is prevented from moving to the cathode chamber, and the fluorine gas is prevented from being mixed with the hydrogen gas.
(8)隔板包含浸漬於電解浴中之液體隔板,開口設置於液體隔板,液體隔板亦可由全氟樹脂而形成。 (8) The separator comprises a liquid separator immersed in an electrolytic bath, and the opening is provided in the liquid separator, and the liquid separator may be formed of a perfluoro resin.
於此情形時,可防止液體隔板因電解浴而腐蝕。又,形成開口時之液體隔板之加工變得容易。進而,液體隔板之材料成本降低。 In this case, the liquid separator can be prevented from being corroded by the electrolytic bath. Moreover, the processing of the liquid separator at the time of forming the opening becomes easy. Further, the material cost of the liquid separator is lowered.
(9)亦可對陽極之表面實施導電性鑽石塗佈。於此情形時,因於陽極中不易產生極化,故氣體之產生效率提高。 即便氣體之產生量增多,亦可防止隔板之開口由氣泡堵塞,故可穩定地進行電解反應。 (9) Conductive diamond coating can also be applied to the surface of the anode. In this case, since the polarization is less likely to occur in the anode, the gas generation efficiency is improved. Even if the amount of gas generated is increased, the opening of the separator can be prevented from being clogged by the bubbles, so that the electrolytic reaction can be stably performed.
根據本發明,可降低電解裝置之保養之成本及提高保養之作業效率。 According to the present invention, the cost of maintenance of the electrolysis device can be reduced and the work efficiency of maintenance can be improved.
又,根據本發明,可防止氣體之混合並且可使電解反應穩定地進行。 Further, according to the present invention, mixing of gases can be prevented and the electrolysis reaction can be stably performed.
以下,一面參照圖式一面對本發明之第1實施形態之電解裝置(氣體產生裝置)進行說明。 Hereinafter, an electrolysis device (gas generating device) according to a first embodiment of the present invention will be described with reference to the drawings.
圖1係本發明之第1實施形態之電解裝置之模式性剖面圖。圖1之電解裝置10係產生氟氣之氣體產生裝置。如圖1所示,電解裝置10包括電解槽11。電解槽11包括電解槽本體11a、第1蓋體11b、密封構件11c、第2蓋體11d及密封構件11e。於第2蓋體11d之下表面,以包圍電解槽本體11a內之中心部之空間之方式一體地設置有隔板13。電解槽本體11a、第1蓋體11b、第2蓋體11d及隔板13係由例如Ni(鎳)、蒙乃爾合金(monel)、純鐵或不鏽鋼等金屬或合金而形成。 Fig. 1 is a schematic cross-sectional view showing an electrolysis apparatus according to a first embodiment of the present invention. The electrolysis device 10 of Fig. 1 is a gas generating device that generates fluorine gas. As shown in FIG. 1, the electrolysis device 10 includes an electrolysis cell 11. The electrolytic cell 11 includes an electrolytic cell body 11a, a first lid 11b, a sealing member 11c, a second lid 11d, and a sealing member 11e. A partition plate 13 is integrally provided on the lower surface of the second lid body 11d so as to surround the space in the center portion of the electrolytic cell body 11a. The electrolytic cell main body 11a, the first lid body 11b, the second lid body 11d, and the separator 13 are formed of a metal or an alloy such as Ni (nickel), monel, pure iron, or stainless steel.
於電解槽11中操作高電流之電力。又,於在陰極室14b內存在氫氣等氣體之情形時,必需防止由靜電或放電而導 致陰極室14b內之放電。因此,陰極室14b之第1蓋體11b藉由接地線E1而接地。藉此,可防止自電解槽11之漏電而導致觸電等,並且可防止氫氣等氣體爆炸。 High current power is operated in the electrolytic cell 11. Further, in the case where a gas such as hydrogen is present in the cathode chamber 14b, it is necessary to prevent conduction by static electricity or discharge. The discharge in the cathode chamber 14b is caused. Therefore, the first cover 11b of the cathode chamber 14b is grounded by the ground line E1. Thereby, electric leakage from the electrolytic cell 11 can be prevented to cause electric shock or the like, and gas such as hydrogen gas can be prevented from being exploded.
於電解槽11內形成有包含KF-HF(鉀-氟化氫)系混合熔鹽之電解浴(電解液)12。於電解槽11內,陽極室14a形成於隔板13之內側,陰極室14b形成於隔板13之外側。 An electrolytic bath (electrolyte) 12 containing a KF-HF (potassium-hydrogen fluoride) mixed molten salt is formed in the electrolytic cell 11. In the electrolytic cell 11, the anode chamber 14a is formed inside the separator 13, and the cathode chamber 14b is formed on the outer side of the separator 13.
於陽極室14a內配置有陽極15a。隔板13之一部分及陽極15a浸漬於電解浴12中。於電解槽本體11a之內面形成陰極15b。作為陰極15b之材料,例如較佳為使用Ni。 An anode 15a is disposed in the anode chamber 14a. A portion of the separator 13 and the anode 15a are immersed in the electrolytic bath 12. A cathode 15b is formed on the inner surface of the electrolytic cell body 11a. As a material of the cathode 15b, for example, Ni is preferably used.
用以供給HF之HF供給管線18a連接於第1蓋體11b。HF供給管線18a係由溫度調整用加熱器18b覆蓋。藉此,可防止HF於HF供給管線18a中液化。電解浴12之液面之高度藉由液面檢測裝置(未圖示)進行檢測。若由液面檢測裝置所檢測之液面之高度變得低於特定值,則通過HF供給管線18a向電解槽11內供給HF。 The HF supply line 18a for supplying HF is connected to the first lid 11b. The HF supply line 18a is covered by the temperature adjustment heater 18b. Thereby, HF can be prevented from being liquefied in the HF supply line 18a. The height of the liquid surface of the electrolytic bath 12 is detected by a liquid level detecting device (not shown). When the height of the liquid surface detected by the liquid level detecting device becomes lower than a specific value, HF is supplied into the electrolytic cell 11 through the HF supply line 18a.
該電解裝置10包含控制部23。電解槽11內之電解浴12於室溫且大氣壓下保持固體狀態。因此,為進行電解浴12之電解,必需將電解浴12加熱至80~90℃,使其溶解為液體狀態。控制部23基於由溫度感測器(未圖示)所檢測之電解浴12之溫度而控制溫度控制部(未圖示),將電解浴12之溫度維持於80~90℃。 This electrolysis device 10 includes a control unit 23. The electrolytic bath 12 in the electrolytic cell 11 is maintained in a solid state at room temperature and atmospheric pressure. Therefore, in order to perform electrolysis of the electrolytic bath 12, it is necessary to heat the electrolytic bath 12 to 80 to 90 ° C to dissolve it into a liquid state. The control unit 23 controls the temperature control unit (not shown) based on the temperature of the electrolytic bath 12 detected by the temperature sensor (not shown), and maintains the temperature of the electrolytic bath 12 at 80 to 90 °C.
藉由控制部23對陽極15a與陰極15b之間施加電壓。藉此,電解槽11內之電解浴12得以電解。其結果為,於陽極室14a中主要產生氟氣。又,於陰極室14b中主要產生氫 氣。 A voltage is applied between the anode 15a and the cathode 15b by the control unit 23. Thereby, the electrolytic bath 12 in the electrolytic cell 11 is electrolyzed. As a result, fluorine gas is mainly generated in the anode chamber 14a. Also, hydrogen is mainly generated in the cathode chamber 14b. gas.
於第2蓋體11d設置有氣體排出口16a,於第1蓋體11b設置有氣體排出口16b。於氣體排出口16a連接有排氣管17a,於氣體排出口16b連接有排氣管17b。氣體排出口16a連通於陽極室14a,氣體排出口16b連通於陰極室14b。陽極室14a中產生之氣體係自氣體排出口16a通過排氣管17a排出,陰極室14b中產生之氣體係自氣體排出口16b通過排氣管17b排出。 A gas discharge port 16a is provided in the second lid body 11d, and a gas discharge port 16b is provided in the first lid body 11b. An exhaust pipe 17a is connected to the gas discharge port 16a, and an exhaust pipe 17b is connected to the gas discharge port 16b. The gas discharge port 16a communicates with the anode chamber 14a, and the gas discharge port 16b communicates with the cathode chamber 14b. The gas system generated in the anode chamber 14a is discharged from the gas discharge port 16a through the exhaust pipe 17a, and the gas system generated in the cathode chamber 14b is discharged from the gas discharge port 16b through the exhaust pipe 17b.
圖2係圖1之電解槽11之分解立體圖。圖3係第2蓋體11d之仰視圖。 Figure 2 is an exploded perspective view of the electrolytic cell 11 of Figure 1. Fig. 3 is a bottom view of the second cover 11d.
如圖2所示,電解槽本體11a具有底面部及4個側面部,且於上部具有矩形之開口H1。密封構件11c係以包圍開口H1之方式設置於4個側面部之上端面上。密封構件11c例如為包含氟橡膠之O形環。第1蓋體11b具有矩形形狀並且具有大於開口H1之尺寸。該第1蓋體11b係以閉合電解槽本體11a之開口H1之方式配置於密封構件11c上。藉此,電解槽本體11a與第1蓋體11b藉由密封構件11c而相互電性地絕緣並且密封。 As shown in Fig. 2, the electrolytic cell body 11a has a bottom surface portion and four side surface portions, and has a rectangular opening H1 at the upper portion. The sealing member 11c is provided on the upper end faces of the four side faces so as to surround the opening H1. The sealing member 11c is, for example, an O-ring including a fluororubber. The first cover 11b has a rectangular shape and has a size larger than the opening H1. The first lid body 11b is disposed on the sealing member 11c so as to close the opening H1 of the electrolytic cell body 11a. Thereby, the electrolytic cell main body 11a and the first lid body 11b are electrically insulated and sealed from each other by the sealing member 11c.
第1蓋體11b於大致中央部具有矩形之開口H2。密封構件11e係以沿開口H2之第1蓋體11b之緣部包圍開口H2之方式設置於第1蓋體11b之上表面。密封構件11e例如為包含氟橡膠之O形環。第2蓋體11d具有矩形形狀並且具有大於開口H2之尺寸。該第2蓋體11d係以閉合第1蓋體11b之開口 H2之方式配置於密封構件11e上。藉此,第1蓋體11b與第2蓋體11d藉由密封構件11e而相互電性絕緣並且密封。於第1蓋體11b設置有插入HF供給管線18a之HF供給孔18c。 The first lid body 11b has a rectangular opening H2 at a substantially central portion. The sealing member 11e is provided on the upper surface of the first lid body 11b so as to surround the opening H2 along the edge of the first lid body 11b of the opening H2. The sealing member 11e is, for example, an O-ring including a fluororubber. The second cover 11d has a rectangular shape and has a size larger than the opening H2. The second cover 11d is configured to close the opening of the first cover 11b The H2 is disposed on the sealing member 11e. Thereby, the first lid body 11b and the second lid body 11d are electrically insulated from each other by the sealing member 11e and sealed. The HF supply hole 18c inserted into the HF supply line 18a is provided in the first lid body 11b.
隔板13包含4個側壁13a、13b、13c、13d。如圖3所示,隔板13係與第2蓋體11d一體地設置於第2蓋體11d之下表面。隔板13之4個側壁13a~13d例如包含Ni或蒙乃爾合金。於第2蓋體11d之下表面側,矩形板狀之陽極15a經由圖2之安裝構件19安裝於由隔板13之4個側壁13a~13d包圍之空間內。作為陽極15a之材料,例如使用低極化性碳電極。 The partition 13 includes four side walls 13a, 13b, 13c, and 13d. As shown in FIG. 3, the partition plate 13 is integrally provided with the second lid body 11d on the lower surface of the second lid body 11d. The four side walls 13a to 13d of the separator 13 include, for example, Ni or a Monel alloy. On the lower surface side of the second lid body 11d, a rectangular plate-shaped anode 15a is attached to a space surrounded by the four side walls 13a to 13d of the separator 13 via the mounting member 19 of Fig. 2 . As a material of the anode 15a, for example, a low-polarity carbon electrode is used.
於本實施形態之圖1之電解裝置10中,密封構件11c、11e配置於陽極室14a之外側。因此,陽極室14a內所產生之氟氣不會接觸密封構件11c、11e。藉此,可防止密封構件11c、11e之腐蝕。其結果為,密封構件11c、11e之檢查及更換之頻度降低。 In the electrolysis device 10 of Fig. 1 of the present embodiment, the sealing members 11c and 11e are disposed on the outer side of the anode chamber 14a. Therefore, the fluorine gas generated in the anode chamber 14a does not contact the sealing members 11c, 11e. Thereby, corrosion of the sealing members 11c and 11e can be prevented. As a result, the frequency of inspection and replacement of the sealing members 11c and 11e is lowered.
又,藉由將第2蓋體11d自第1蓋體11b卸除,可容易地將陽極15a與第2蓋體11d一併自電解槽本體11a卸除。藉此,即便於陽極15a消耗之情形時,亦可容易地更換陽極15a。尤其,於電解槽11大型化之情形時,電解槽本體11a及第1蓋體11b大型化並且重量化。於此種情形時,因無需將第2蓋體11d大型化,故亦可將第2蓋體11d自第1蓋體11b容易地卸除。 Further, by removing the second lid body 11d from the first lid body 11b, the anode 15a and the second lid body 11d can be easily removed from the electrolytic cell main body 11a. Thereby, even when the anode 15a is consumed, the anode 15a can be easily replaced. In particular, when the electrolytic cell 11 is enlarged, the electrolytic cell main body 11a and the first lid body 11b are increased in size and weight. In this case, since the second lid body 11d does not need to be enlarged, the second lid body 11d can be easily removed from the first lid body 11b.
進而,於長期地使用電解裝置10之情形時,必需對隔板13消耗與否進行檢查。於此種情形時,亦可藉由將第2蓋 體11d自第1蓋體11b卸除而將隔板13自第1蓋體11b卸除。藉此,可容易檢查隔板13。 Further, in the case where the electrolysis device 10 is used for a long period of time, it is necessary to check whether the separator 13 is consumed or not. In this case, the second cover can also be used The body 11d is removed from the first lid body 11b, and the separator 13 is removed from the first lid body 11b. Thereby, the separator 13 can be easily inspected.
該等之結果為,可降低電解裝置10之保養之成本,並且可提高保養之作業效率。 As a result of this, the cost of maintenance of the electrolysis device 10 can be reduced, and the efficiency of maintenance work can be improved.
於上述實施形態中,電解槽本體11a具有底面部及4個側面部,且於上部具有矩形之開口H1,但並不限定於此。例如,電解槽本體11a亦可具有底面部及圓筒狀之側面部,於上部具有圓形之開口。於此情形時,電解槽本體11a之開口係藉由具有圓形形狀之第1蓋體11b而閉合。 In the above embodiment, the electrolytic cell main body 11a has a bottom surface portion and four side surface portions, and has a rectangular opening H1 at the upper portion, but is not limited thereto. For example, the electrolytic cell body 11a may have a bottom surface portion and a cylindrical side surface portion, and have a circular opening at the upper portion. In this case, the opening of the electrolytic cell body 11a is closed by the first lid body 11b having a circular shape.
第1蓋體11b具有矩形之開口H2,但並不限定於此。例如,第1蓋體11b亦可具有圓形之開口。於此情形時,第1蓋體11b之開口係藉由具有圓形形狀之第2蓋體11d而閉合。 The first lid body 11b has a rectangular opening H2, but is not limited thereto. For example, the first cover 11b may have a circular opening. In this case, the opening of the first lid body 11b is closed by the second lid body 11d having a circular shape.
隔板13包括4個側壁13a~13d,但並不限定於此。例如,隔板13亦可包括圓筒狀之側壁。又,較佳為隔板13與第2蓋體11d一體地設置,更佳為由不同之金屬材料所形成之隔板13及第2蓋體11d藉由焊接而一體地設置,但並不限定於此。隔板13與第2蓋體11d亦可藉由鑄造而一體地設置。 The partition plate 13 includes four side walls 13a to 13d, but is not limited thereto. For example, the partition 13 may also include a cylindrical side wall. Further, it is preferable that the separator 13 and the second lid 11d are integrally provided, and it is more preferable that the separator 13 and the second lid 11d formed of different metal materials are integrally provided by welding, but are not limited thereto. herein. The partition plate 13 and the second lid body 11d may be integrally provided by casting.
若確保與第2蓋體11d之間之密接性,而保持陽極室14a之氣密性,則隔板13亦可與第2蓋體11d分開設置。於此情形時,較佳為,藉由於隔板13與第2蓋體11d之間設置密封金屬等耐蝕性較高之密封材料而確保密接性。 When the adhesion to the second lid 11d is ensured and the airtightness of the anode chamber 14a is maintained, the separator 13 may be provided separately from the second lid 11d. In this case, it is preferable to provide a sealing material having a high corrosion resistance such as a sealing metal between the separator 13 and the second lid 11d to ensure adhesion.
以下,對技術方案之各構成要素與實施形態之各部分之對應例進行說明,但本發明並不限定於下述之例。 Hereinafter, the respective constituent elements of the technical means and the corresponding examples of the respective portions of the embodiment will be described, but the present invention is not limited to the following examples.
上述實施形態中,電解浴12為電解浴之例,電解裝置10為電解裝置,氫氣為其他氣體之例,電解槽11為電解槽之例,電解槽本體11a為電解槽本體之例。開口H1為第1開口之例,開口H2為第2開口之例,第1蓋體11b為第1蓋體之例,第2蓋體11d為第2蓋體之例,密封構件11e為第1密封構件之例,密封構件11c為第2密封構件之例。陽極15a為第1電極之例,陰極15b為第2電極之例,陽極室14a為第1室之例,陰極室14b為第2室之例,隔板13為隔板之例。 In the above embodiment, the electrolytic bath 12 is an example of an electrolytic bath, the electrolysis device 10 is an electrolysis device, hydrogen is an example of another gas, the electrolytic cell 11 is an example of an electrolytic cell, and the electrolytic cell main body 11a is an example of an electrolytic cell main body. The opening H1 is an example of a first opening, the opening H2 is an example of a second opening, the first lid 11b is an example of a first lid, the second lid 11d is an example of a second lid, and the sealing member 11e is first. In the example of the sealing member, the sealing member 11c is an example of the second sealing member. The anode 15a is an example of a first electrode, the cathode 15b is an example of a second electrode, the anode chamber 14a is an example of a first chamber, the cathode chamber 14b is an example of a second chamber, and the separator 13 is an example of a separator.
作為技術方案之各構成要素,亦可使用具有技術方案中所記載之構成或功能之其他各種要素。 As each component of the technical solution, various other elements having the configuration or function described in the claims can be used.
以下,一面參照圖式一面說明本發明之第2實施形態之電解裝置。 Hereinafter, an electrolysis device according to a second embodiment of the present invention will be described with reference to the drawings.
圖4係本發明之第2實施形態之電解裝置之模式性剖面圖。圖4之電解裝置10為產生氟氣之電解裝置。如圖4所示,電解裝置10包括電解槽11。電解槽11包含電解槽本體11a及上部蓋體11f。 Fig. 4 is a schematic cross-sectional view showing an electrolysis apparatus according to a second embodiment of the present invention. The electrolysis device 10 of Fig. 4 is an electrolysis device that generates fluorine gas. As shown in FIG. 4, the electrolysis device 10 includes an electrolytic cell 11. The electrolytic cell 11 includes an electrolytic cell body 11a and an upper lid 11f.
電解槽本體11a及上部蓋體11f係由例如Ni(鎳)、蒙乃爾合金、純鐵或不鏽鋼等金屬或合金而形成。電解槽本體11a具有底面部及側面部,且於上部具有開口。以覆蓋底 面部之上表面之方式配置絕緣構件11g。於側面部之上端面上安裝絕緣構件(密封構件)11h。絕緣構件11g、11h包含樹脂等絕緣材料。以閉合電解槽本體11a之開口之方式,於絕緣構件11h上配置上部蓋體11f。藉此,電解槽本體11a與上部蓋體11f藉由絕緣構件11h而相互電性絕緣。 The electrolytic cell body 11a and the upper lid body 11f are formed of a metal or an alloy such as Ni (nickel), monel, pure iron or stainless steel. The electrolytic cell body 11a has a bottom surface portion and a side surface portion, and has an opening at the upper portion. Cover the bottom The insulating member 11g is disposed in such a manner as to face the upper surface of the face. An insulating member (sealing member) 11h is attached to the upper end surface of the side surface portion. The insulating members 11g and 11h contain an insulating material such as a resin. The upper cover 11f is placed on the insulating member 11h so as to close the opening of the electrolytic cell body 11a. Thereby, the electrolytic cell main body 11a and the upper cover body 11f are electrically insulated from each other by the insulating member 11h.
於電解槽11內收容有包含KF-HF(鉀-氟化氫)系混合熔鹽之電解浴12。以自上部蓋體11f之下表面向下方延伸之方式設置圓筒狀之隔板13。隔板13包含圓筒狀之氣體隔板13A及圓筒狀之液體隔板13B。氣體隔板13A一體地設置於上部蓋體11f。氣體隔板13A之下端部之高度係以與電解浴12之液面之高度大致相等之方式設定。作為氣體隔板13A之材料,較佳為使用Ni(鎳)、Ni合金、蒙乃爾合金、純鐵或不鏽鋼等金屬或合金。於此情形時,由氟氣及氟化氫蒸汽所導致氣體隔板13A之腐蝕得到抑制。氣體隔板13A亦可設置為可自上部蓋體11f卸除。 An electrolytic bath 12 containing a KF-HF (potassium-hydrogen fluoride) mixed molten salt is accommodated in the electrolytic cell 11. A cylindrical partition plate 13 is provided to extend downward from the lower surface of the upper cover 11f. The separator 13 includes a cylindrical gas separator 13A and a cylindrical liquid separator 13B. The gas separator 13A is integrally provided to the upper lid body 11f. The height of the lower end portion of the gas separator 13A is set to be substantially equal to the height of the liquid surface of the electrolytic bath 12. As the material of the gas separator 13A, a metal or an alloy such as Ni (nickel), a Ni alloy, a Monel alloy, pure iron or stainless steel is preferably used. In this case, the corrosion of the gas separator 13A caused by the fluorine gas and the hydrogen fluoride vapor is suppressed. The gas partition 13A may also be provided to be detachable from the upper cover 11f.
液體隔板13B係以浸漬於電解浴12中之方式安裝於氣體隔板13A之下端部。於液體隔板13B形成有用以確保電解浴12之透過性之複數個貫通孔H(下述之圖5)。下文對液體隔板13B之詳情進行敍述。作為液體隔板13B之材料,較佳為使用PTFE(polytetrafluorethylene,聚四氟乙烯)或PFA(polyfluoroalkoxy,四氟乙烯-全氟烷基乙烯基醚共聚物)等全氟樹脂,尤佳為使用PTFE。於此情形時,與使用金屬作為液體隔板13B之材料之情形相比,由電解浴12所導致之液體隔板13B之腐蝕得到抑制。又,形成上述貫通 孔H時之加工變得容易。進而,液體隔板13B之材料成本降低。 The liquid separator 13B is attached to the lower end portion of the gas separator 13A so as to be immersed in the electrolytic bath 12. A plurality of through holes H (FIG. 5 described below) for ensuring the permeability of the electrolytic bath 12 are formed in the liquid separator 13B. Details of the liquid separator 13B will be described below. As the material of the liquid separator 13B, a perfluoro resin such as PTFE (polytetrafluoroethylene) or PFA (polyfluoroalkoxy) is preferably used, and PTFE is particularly preferably used. . In this case, the corrosion of the liquid separator 13B caused by the electrolytic bath 12 is suppressed as compared with the case where metal is used as the material of the liquid separator 13B. Also, forming the above-mentioned through Processing at the hole H becomes easy. Further, the material cost of the liquid separator 13B is lowered.
於電解槽11內,陽極室14a形成於隔板13之內側,陰極室14b形成於隔板13之外側。於陽極室14a內以浸漬於電解浴12中之方式配置陽極15a。作為陽極15a之材料,例如較佳為使用低極化性碳電極。 In the electrolytic cell 11, the anode chamber 14a is formed inside the separator 13, and the cathode chamber 14b is formed on the outer side of the separator 13. The anode 15a is disposed in the anode chamber 14a so as to be immersed in the electrolytic bath 12. As a material of the anode 15a, for example, a low-polarity carbon electrode is preferably used.
於陽極15a之表面,較佳為實施導電性鑽石塗佈。具體而言,使用氫氣及碳源之混合氣體作為鑽石原料,並且於該混合氣體中添加微量原子價與碳不同之元素(以下稱為摻雜劑),藉此可形成具有導電性之鑽石塗佈層。作為摻雜劑,較佳為使用硼、磷或氮,尤佳為使用硼。添加之摻雜劑之重量相對於鑽石塗佈層之總重量,較佳為1 ppm以上且30000 ppm以下,更佳為100 ppm以上且10000 ppm以下。藉由對陽極15a之表面實施導電性鑽石塗佈,於陽極15a中不易產生極化。因此,氟氣之生成效率提高。於本實施形態中,電解槽本體11a之側面部作為陰極發揮功能。 Preferably, conductive diamond coating is applied to the surface of the anode 15a. Specifically, a mixed gas of hydrogen gas and a carbon source is used as a diamond raw material, and an element (hereinafter referred to as a dopant) having a small atomic valence different from carbon is added to the mixed gas, whereby a conductive diamond coating can be formed. Cloth layer. As the dopant, boron, phosphorus or nitrogen is preferably used, and boron is particularly preferably used. The weight of the dopant to be added is preferably 1 ppm or more and 30,000 ppm or less, more preferably 100 ppm or more and 10,000 ppm or less, based on the total weight of the diamond coating layer. Polarization is less likely to occur in the anode 15a by applying conductive diamond coating to the surface of the anode 15a. Therefore, the fluorine gas generation efficiency is improved. In the present embodiment, the side surface portion of the electrolytic cell main body 11a functions as a cathode.
用以向電解槽11內供給HF之HF供給管線18a連接於上部蓋體11f。HF供給管線18a係由溫度調整用加熱器18b覆蓋。藉此,防止HF於HF供給管線18a中液化。電解浴12之液面之高度係藉由液面檢測裝置(未圖示)進行檢測。若由液面檢測裝置所檢測之液面之高度變得低於特定值,則通過HF供給管線18a向電解槽11內供給HF。 The HF supply line 18a for supplying HF into the electrolytic cell 11 is connected to the upper lid 11f. The HF supply line 18a is covered by the temperature adjustment heater 18b. Thereby, HF is prevented from being liquefied in the HF supply line 18a. The height of the liquid level of the electrolytic bath 12 is detected by a liquid level detecting device (not shown). When the height of the liquid surface detected by the liquid level detecting device becomes lower than a specific value, HF is supplied into the electrolytic cell 11 through the HF supply line 18a.
於上部蓋體11f設置有氣體排出口16a、16b。於氣體排 出口16a連接有排氣管17a,於氣體排出口16b連接有排氣管17b。氣體排出口16a連通於陽極室14a,氣體排出口16b連通於陰極室14b。 Gas discharge ports 16a and 16b are provided in the upper lid body 11f. Gas row An exhaust pipe 17a is connected to the outlet 16a, and an exhaust pipe 17b is connected to the gas discharge port 16b. The gas discharge port 16a communicates with the anode chamber 14a, and the gas discharge port 16b communicates with the cathode chamber 14b.
藉由對陽極15a與電解槽本體11a之間施加電壓,電解浴12得以電解。於此情形時,於陽極15a之表面上氟氣產生,於電解槽本體11a之側面部之內面上氫氣產生。電解槽本體11a之底面部之上表面由絕緣構件11g覆蓋,因此於底面部之上表面上,電解浴12之電解反應無法進行,不會產生氫氣。 The electrolytic bath 12 is electrolyzed by applying a voltage between the anode 15a and the electrolytic cell body 11a. In this case, fluorine gas is generated on the surface of the anode 15a, and hydrogen gas is generated on the inner surface of the side surface portion of the electrolytic cell body 11a. Since the upper surface of the bottom surface portion of the electrolytic cell body 11a is covered with the insulating member 11g, the electrolytic reaction of the electrolytic bath 12 cannot be performed on the upper surface of the bottom surface portion, and hydrogen gas is not generated.
陽極室14a中所產生之氟氣自氣體排出口16a通過排氣管17a導入至電解槽11之外部。陰極室14b中所產生之氫氣自氣體排出口16b通過排氣管17b導入至電解槽11之外部。 The fluorine gas generated in the anode chamber 14a is introduced from the gas discharge port 16a to the outside of the electrolytic cell 11 through the exhaust pipe 17a. The hydrogen gas generated in the cathode chamber 14b is introduced from the gas discharge port 16b to the outside of the electrolytic cell 11 through the exhaust pipe 17b.
圖5係液體隔板13B之外觀立體圖,圖6係形成於液體隔板13B之貫通孔H之放大圖。圖6(a)係貫通孔H之縱截面圖,圖6(b)係自陽極室14a觀察貫通孔H之側面圖,圖6(c)係自陰極室14b觀察貫通孔H之側面圖。圖6(a)係表示圖6(b)及圖6(c)之A-A線截面。 Fig. 5 is an external perspective view of the liquid separator 13B, and Fig. 6 is an enlarged view of the through hole H formed in the liquid separator 13B. Fig. 6(a) is a longitudinal cross-sectional view of the through hole H, Fig. 6(b) is a side view showing the through hole H from the anode chamber 14a, and Fig. 6(c) is a side view showing the through hole H from the cathode chamber 14b. Fig. 6(a) is a cross-sectional view taken along line A-A of Fig. 6(b) and Fig. 6(c).
如圖5所示,於液體隔板13B形成有複數個圓形之貫通孔H。圖5之例中,複數個貫通孔H沿液體隔板13B之圓周方向形成2排。於此情形時,電解浴12中之離子通過複數個貫通孔H而可於陽極室14a與陰極室14b之間移動。藉此,於陽極室14a及陰極室14b中,電解反應穩定且順利地進行。 As shown in FIG. 5, a plurality of circular through holes H are formed in the liquid separator 13B. In the example of Fig. 5, a plurality of through holes H are formed in two rows along the circumferential direction of the liquid separator 13B. In this case, the ions in the electrolytic bath 12 can move between the anode chamber 14a and the cathode chamber 14b through the plurality of through holes H. Thereby, in the anode chamber 14a and the cathode chamber 14b, the electrolysis reaction proceeds stably and smoothly.
於此情形時,若藉由電解反應而產生之氟氣及氫氣通過貫通孔H移動,則於陽極室14a或陰極室14b中,氟氣與氫氣混合。藉此,氟氣與氫氣反應而導致氟氣之生成效率降低,並且亦考慮到由氟氣及氫氣之比可能會生成爆炸性之混合氣體。 In this case, when the fluorine gas and the hydrogen gas generated by the electrolytic reaction move through the through hole H, the fluorine gas is mixed with the hydrogen gas in the anode chamber 14a or the cathode chamber 14b. Thereby, the fluorine gas reacts with the hydrogen gas to cause a decrease in the generation efficiency of the fluorine gas, and it is also considered that an explosive mixed gas may be generated from the ratio of the fluorine gas to the hydrogen gas.
因此,各貫通孔H之直徑設定為如氟氣及氫氣之氣泡無法通過之大小。然而,藉此存在氣泡滯留於貫通孔H內,貫通孔H堵塞之情況。尤其,氫氣與氟氣相比不易溶解於電解浴12中,因此氫氣之氣泡容易滯留於貫通孔H內,而容易堵塞貫通孔H。若貫通孔H堵塞,則電解浴12無法通過貫通孔H而移動。藉此,使電解反應無法穩定地進行。 Therefore, the diameter of each through hole H is set to such a size that bubbles of fluorine gas and hydrogen gas cannot pass. However, there is a case where the air bubbles are retained in the through hole H and the through hole H is blocked. In particular, since hydrogen gas is less likely to be dissolved in the electrolytic bath 12 than the fluorine gas, bubbles of hydrogen gas are likely to remain in the through holes H, and the through holes H are easily blocked. When the through hole H is clogged, the electrolytic bath 12 cannot move through the through hole H. Thereby, the electrolysis reaction cannot be stably performed.
因此,於本實施形態中,如圖6所示,各貫通孔H具有自陽極室14a側之端部向斜上方延伸至陰極室14b側之端部為止之上表面L1。以下,將陽極室14a側之貫通孔H之端部稱為陽極側端,將陰極室14b側之貫通孔H之端部稱為陰極側端。貫通孔H之下表面L2自陽極側端水平地延伸至陰極側端為止。此處,所謂貫通孔H之上表面係指貫通孔H之內周面中朝向下方之區域,所謂貫通孔H之下表面係指貫通孔H之內周面中朝向上方之區域。 Therefore, in the present embodiment, as shown in FIG. 6, each of the through holes H has an upper surface L1 extending obliquely upward from the end portion on the anode chamber 14a side to the end portion on the cathode chamber 14b side. Hereinafter, the end portion of the through hole H on the anode chamber 14a side is referred to as an anode side end, and the end portion of the through hole H on the cathode chamber 14b side is referred to as a cathode side end. The lower surface H2 of the through hole H extends horizontally from the anode side end to the cathode side end. Here, the upper surface of the through hole H refers to a region in the inner circumferential surface of the through hole H that faces downward, and the lower surface of the through hole H refers to a region in the inner circumferential surface of the through hole H that faces upward.
貫通孔H之陽極側端之上下方向之直徑D1設為如電解浴可通過且氟氣及氫氣之氣泡無法通過之大小。直徑D1例如為1 mm以上且3 mm以下,較佳為1 mm以上且2 mm以下。貫通孔H之陰極側端之上下方向之直徑D2大於直徑D1。直徑D2例如為5 mm以上且10 mm以下,較佳為5 mm以上且8 mm以下。液體隔板13B之厚度TH例如為5 mm以上且10 mm以下,較佳為5 mm以上且8 mm以下。 The diameter D1 of the upper and lower sides of the anode side end of the through hole H is set to such a size that the electrolytic bath can pass and the bubbles of fluorine gas and hydrogen cannot pass. The diameter D1 is, for example, 1 mm or more and 3 mm or less, preferably 1 mm or more and 2 mm or less. The diameter D2 of the upper side of the cathode side end of the through hole H is larger than the diameter D1. The diameter D2 is, for example, 5 mm or more and 10 mm or less, preferably 5 mm or more and 8 Below mm. The thickness TH of the liquid separator 13B is, for example, 5 mm or more and 10 mm or less, preferably 5 mm or more and 8 mm or less.
於本實施形態之電解裝置10中,即便氫氣之氣泡自陰極室14b進入貫通孔H內,該氣泡亦會沿貫通孔H之上表面返回至陰極室14b中,並上浮至液面。因此,防止自陰極室14b進入貫通孔H內之氫氣之氣泡堵塞貫通孔H。又,陽極室14a側之貫通孔H之上下方向之直徑小於陰極室14b側之貫通孔H之上下方向之直徑。進而,如上所述,氟氣與氫氣相比容易溶解於電解浴12中。因此,防止氟氣之氣泡自陽極室14a進入貫通孔H內。 In the electrolysis device 10 of the present embodiment, even if bubbles of hydrogen gas enter the through hole H from the cathode chamber 14b, the bubbles return to the cathode chamber 14b along the upper surface of the through hole H and float up to the liquid surface. Therefore, the air bubbles of the hydrogen gas entering the through hole H from the cathode chamber 14b are prevented from clogging the through hole H. Further, the diameter of the through hole H on the anode chamber 14a side in the vertical direction is smaller than the diameter of the through hole H on the cathode chamber 14b side. Further, as described above, the fluorine gas is easily dissolved in the electrolytic bath 12 as compared with the hydrogen gas. Therefore, the bubble of the fluorine gas is prevented from entering the through hole H from the anode chamber 14a.
如此,防止氟氣及氫氣之氣泡通過貫通孔H而移動,並且防止氟氣及氫氣之氣泡堵塞貫通孔H。藉此,可不使氟氣之生成效率降低,而穩定且順利地進行電解反應。 In this manner, the bubbles of the fluorine gas and the hydrogen gas are prevented from moving through the through holes H, and the bubbles of the fluorine gas and the hydrogen gas are prevented from clogging the through holes H. Thereby, the electrolytic reaction can be stably and smoothly performed without lowering the production efficiency of the fluorine gas.
液體隔板13B之貫通孔H之形狀並不限定於圖5及圖6之例。圖7係表示形成於液體隔板13B之貫通孔H之其他例之圖。關於圖7(a)及圖7(b)之例,對與圖5及圖6之例不同之方面進行說明。 The shape of the through hole H of the liquid separator 13B is not limited to the examples of FIGS. 5 and 6. Fig. 7 is a view showing another example of the through hole H formed in the liquid separator 13B. 7(a) and 7(b), differences from the examples of FIGS. 5 and 6 will be described.
於圖7(a)之例中,貫通孔H之上表面L1係自陽極側端水平地延伸至陽極側端與陰極側端之中間點P1為止,自中間點P1向斜上方延伸至陰極側端為止。於此情形時,亦防止自陰極室14b進入貫通孔H內之氫氣之氣泡堵塞貫通孔H,並且防止氟氣之氣泡自陽極室14a進入貫通孔H內。 In the example of Fig. 7(a), the upper surface L1 of the through hole H extends horizontally from the anode side end to the intermediate point P1 between the anode side end and the cathode side end, and extends obliquely upward from the intermediate point P1 to the cathode side. So far. In this case as well, the bubbles of hydrogen gas entering the through hole H from the cathode chamber 14b block the through hole H, and the bubbles of the fluorine gas are prevented from entering the through hole H from the anode chamber 14a.
於圖7(b)之例中,貫通孔H之上表面L1自陽極側端向斜下方延伸至中間點P1,自中間點P1向斜上方延伸至陰極側端。於此情形時,亦防止自陰極室14b進入貫通孔H內之氫氣之氣泡堵塞貫通孔H。又,即便氟氣之氣泡自陽極室14a進入貫通孔H,該氣泡亦會沿貫通孔H之上表面L1返回至陽極室14a中,上浮至液面。因此,防止自陽極室14a進入貫通孔H內之氟氣之氣泡堵塞貫通孔H。 In the example of Fig. 7(b), the upper surface L1 of the through hole H extends obliquely downward from the anode side end to the intermediate point P1, and extends obliquely upward from the intermediate point P1 to the cathode side end. In this case as well, the gas bubbles of hydrogen gas entering the through hole H from the cathode chamber 14b are prevented from clogging the through hole H. Further, even if the bubble of the fluorine gas enters the through hole H from the anode chamber 14a, the bubble returns to the anode chamber 14a along the upper surface L1 of the through hole H, and floats up to the liquid surface. Therefore, the air bubbles of the fluorine gas entering the through hole H from the anode chamber 14a are prevented from clogging the through hole H.
於上述之例中,貫通孔H具有圓形之縱截面,但貫通孔H亦可具有橢圓形狀、三角形或四邊形等其他形狀之縱截面。 In the above example, the through hole H has a circular vertical cross section, but the through hole H may have a longitudinal cross section of another shape such as an elliptical shape, a triangular shape, or a quadrangular shape.
上述之例中,貫通孔H之上表面L1係以朝向陰極側端而向斜上方直線狀地延伸之方式設置,但並不限定於此,例如貫通孔H之上表面L1亦可以朝向陰極側端而向斜上方彎曲地延伸之方式設置。 In the above-described example, the upper surface L1 of the through hole H is provided to extend linearly obliquely upward toward the cathode end. However, the surface L1 is not limited thereto. For example, the upper surface L1 of the through hole H may be directed toward the cathode side. The end is arranged to extend obliquely upward obliquely.
圖8係用以說明液體隔板13B之其他例之剖面圖。圖8中表示有氣體隔板13A之下端部及液體隔板13B之上端部。關於圖8之例,對與圖5及圖6之例不同之方面進行說明。 Fig. 8 is a cross-sectional view for explaining another example of the liquid separator 13B. Fig. 8 shows the lower end portion of the gas partition 13A and the upper end portion of the liquid partition 13B. Regarding the example of Fig. 8, differences from the examples of Figs. 5 and 6 will be described.
於圖8之例中,液體隔板13B之上端部以覆蓋氣體隔板13A之外周面(陰極室14b側之面)之下端部之方式設置。於以氣體隔板13A之下端部浸漬於電解浴12中之狀態進行電解浴12之電解反應之情形時,於電解浴12內氣體隔板13A 發生極化,氣體隔板13A之外周面帶有正電荷。於該情形時,金屬自帶有正電荷之氣體隔板13A之外周面離子化而於電解浴12中溶出,容易腐蝕氣體隔板13A之外周面。因此,於本例中,浸漬於電解浴12中之氣體隔板13A之外周面之部分藉由液面隔板13B而覆蓋。藉此,防止電解浴12接觸氣體隔板13A之外周面,防止浸漬於電解浴12中之氣體隔板13A之外周面之部分之腐蝕。 In the example of Fig. 8, the upper end portion of the liquid separator 13B is provided so as to cover the lower end portion of the outer peripheral surface (the surface on the cathode chamber 14b side) of the gas separator 13A. When the electrolytic reaction of the electrolytic bath 12 is performed in a state where the lower end of the gas separator 13A is immersed in the electrolytic bath 12, the gas separator 13A in the electrolytic bath 12 Polarization occurs, and the outer surface of the gas separator 13A has a positive charge. In this case, the metal is ionized from the outer peripheral surface of the positively-charged gas separator 13A and eluted in the electrolytic bath 12, and the outer peripheral surface of the gas separator 13A is easily corroded. Therefore, in this example, the portion of the outer peripheral surface of the gas separator 13A immersed in the electrolytic bath 12 is covered by the liquid-surface separator 13B. Thereby, the electrolytic bath 12 is prevented from coming into contact with the outer peripheral surface of the gas separator 13A, and corrosion of a portion of the outer peripheral surface of the gas separator 13A immersed in the electrolytic bath 12 is prevented.
又,液面隔板13B之上端部較佳為延伸至電解浴12之液面之上方。於此情形時,可確實地防止電解浴12接觸氣體隔板13A之外周面。再者,液面隔板13B之上端部位於陰極室14b側,因此即便液面隔板13B之上端部延伸至電解浴12之液面之上方為止,氟氣及氟化氫蒸氣亦不會接觸液面隔板13B。因此,防止液面隔板13B之腐蝕。 Further, the upper end portion of the liquid level separator 13B preferably extends above the liquid surface of the electrolytic bath 12. In this case, it is possible to surely prevent the electrolytic bath 12 from contacting the outer peripheral surface of the gas separator 13A. Further, since the upper end portion of the liquid level separator 13B is located on the side of the cathode chamber 14b, the fluorine gas and the hydrogen fluoride vapor do not contact the liquid surface even if the upper end portion of the liquid surface partition plate 13B extends above the liquid surface of the electrolytic bath 12. Separator 13B. Therefore, corrosion of the liquid level partition 13B is prevented.
於上述實施形態中,氣體隔板13A與液體隔板13B作為不同體而設置,但於氣體隔板13A及液體隔板13B之腐蝕得到防止之情形或氣體隔板13A及液體隔板13B之腐蝕不成為問題之情形時,氣體隔板13A及液體隔板13B亦可一體地設置。 In the above embodiment, the gas separator 13A and the liquid separator 13B are provided as separate bodies, but corrosion of the gas separator 13A and the liquid separator 13B is prevented or corrosion of the gas separator 13A and the liquid separator 13B is prevented. When it is not a problem, the gas separator 13A and the liquid separator 13B may be integrally provided.
於上述實施形態中,氣體隔板13A及液體隔板13B分別為圓筒狀,但並不限定於此,氣體隔板13A及液體隔板13B亦可分別為角形柱狀或平板狀等其他形狀。 In the above embodiment, the gas separator 13A and the liquid separator 13B are each cylindrical. However, the gas separator 13A and the liquid separator 13B may have other shapes such as an angular column shape or a flat plate shape. .
上述實施形態係將本發明應用於產生氟氣之電解裝置之例,但亦可將本發明同樣地應用於產生氧氣等其他氣體之電解裝置。 The above embodiment is an example in which the present invention is applied to an electrolysis device that generates fluorine gas, but the present invention can also be applied to an electrolysis device that generates other gases such as oxygen.
以下,對技術方案之各構成要素與實施形態之各部分之對應例進行說明,但本發明並不限定於下述之例。 Hereinafter, the respective constituent elements of the technical means and the corresponding examples of the respective portions of the embodiment will be described, but the present invention is not limited to the following examples.
於上述實施形態中,電解浴12為電解浴之例,電解槽11為電解槽之例,貫通孔H為開口之例,上表面L1為上表面之例,隔板13為隔板之例,陽極室14a為陽極室之例,陽極15a為陽極之例,陰極室14b為陰極室之例,陰極15b為陰極之例,液體隔板13B為液體隔板之例。 In the above embodiment, the electrolytic bath 12 is an example of an electrolytic bath, the electrolytic cell 11 is an example of an electrolytic cell, the through hole H is an opening, the upper surface L1 is an upper surface, and the separator 13 is an example of a separator. The anode chamber 14a is an example of an anode chamber, the anode 15a is an anode, the cathode chamber 14b is a cathode chamber, the cathode 15b is a cathode, and the liquid separator 13B is a liquid separator.
作為技術方案之各構成要素,亦可使用具有技術方案中所記載之構成或功能之其他各種要素。 As each component of the technical solution, various other elements having the configuration or function described in the claims can be used.
本發明可有效地利用於氣體產生裝置等各種電解裝置。 The present invention can be effectively utilized in various electrolysis devices such as gas generating devices.
10‧‧‧電解裝置 10‧‧‧Electrolytic device
11‧‧‧電解槽 11‧‧‧ Electrolyzer
11a‧‧‧電解槽本體 11a‧‧‧ Electrolytic cell body
11b‧‧‧第1蓋體 11b‧‧‧1st cover
11c‧‧‧密封構件 11c‧‧‧ Sealing member
11d‧‧‧第2蓋體 11d‧‧‧2nd cover
11e‧‧‧密封構件 11e‧‧‧ Sealing member
11f‧‧‧上部蓋體 11f‧‧‧Upper cover
11g‧‧‧絕緣構件 11g‧‧‧Insulating components
11h‧‧‧絕緣構件 11h‧‧‧Insulating components
12‧‧‧電解浴 12‧‧Electrical bath
13‧‧‧隔板 13‧‧‧Baffle
13A‧‧‧氣體隔板 13A‧‧‧ gas partition
13a、13b、13c、13d‧‧‧側壁 13a, 13b, 13c, 13d‧‧‧ side walls
13B‧‧‧液體隔板 13B‧‧‧Liquid partition
14a‧‧‧陽極室 14a‧‧‧Anode chamber
14b‧‧‧陰極室 14b‧‧‧Cathode chamber
15a‧‧‧陽極 15a‧‧‧Anode
15b‧‧‧陰極 15b‧‧‧ cathode
16a‧‧‧氣體排出口 16a‧‧‧ gas discharge
16b‧‧‧氣體排出口 16b‧‧‧ gas discharge
17a‧‧‧排氣管 17a‧‧‧Exhaust pipe
17b‧‧‧排氣管 17b‧‧‧Exhaust pipe
18a‧‧‧供給管線 18a‧‧‧Supply pipeline
18b‧‧‧溫度調整用加熱器 18b‧‧‧heating heater
18c‧‧‧HF供給孔 18c‧‧‧HF supply hole
19‧‧‧安裝構件 19‧‧‧Installation components
23‧‧‧控制部 23‧‧‧Control Department
D1‧‧‧直徑 D1‧‧‧ diameter
D2‧‧‧直徑 D2‧‧‧ diameter
E1‧‧‧接地線 E1‧‧‧ Grounding wire
F2‧‧‧氟氣 F 2 ‧‧‧Fluorine
H‧‧‧貫通孔 H‧‧‧through hole
H2‧‧‧氫氣 H 2 ‧‧‧hydrogen
H1‧‧‧開口 H1‧‧‧ openings
H2‧‧‧開口 H2‧‧‧ openings
L1‧‧‧上表面 L1‧‧‧ upper surface
L2‧‧‧下表面 L2‧‧‧ lower surface
P1‧‧‧中間點 P1‧‧‧ intermediate point
TH‧‧‧厚度 TH‧‧‧ thickness
圖1係本發明之第1實施形態之電解裝置之模式性剖面圖。 Fig. 1 is a schematic cross-sectional view showing an electrolysis apparatus according to a first embodiment of the present invention.
圖2係圖1之電解槽之分解立體圖。 Figure 2 is an exploded perspective view of the electrolytic cell of Figure 1.
圖3係第2蓋體之仰視圖。 Fig. 3 is a bottom view of the second cover.
圖4係本發明之第2實施形態之電解裝置之模式性剖面圖。 Fig. 4 is a schematic cross-sectional view showing an electrolysis apparatus according to a second embodiment of the present invention.
圖5係液體隔板之外觀立體圖。 Figure 5 is a perspective view showing the appearance of a liquid separator.
圖6(a)~(c)係形成於液體隔板之貫通孔之放大圖。 6(a) to 6(c) are enlarged views of the through holes formed in the liquid separator.
圖7(a)及(b)係表示形成於液體隔板之貫通孔之其他例之圖。 7(a) and 7(b) are views showing another example of a through hole formed in a liquid separator.
圖8係用以說明液體隔板之其他例之剖面圖。 Fig. 8 is a cross-sectional view for explaining another example of the liquid separator.
10‧‧‧電解裝置 10‧‧‧Electrolytic device
11‧‧‧電解槽 11‧‧‧ Electrolyzer
11a‧‧‧電解槽本體 11a‧‧‧ Electrolytic cell body
11b‧‧‧第1蓋體 11b‧‧‧1st cover
11c‧‧‧密封構件 11c‧‧‧ Sealing member
11d‧‧‧第2蓋體 11d‧‧‧2nd cover
11e‧‧‧密封構件 11e‧‧‧ Sealing member
12‧‧‧電解浴 12‧‧Electrical bath
13‧‧‧隔板 13‧‧‧Baffle
14a‧‧‧陽極室 14a‧‧‧Anode chamber
14b‧‧‧陰極室 14b‧‧‧Cathode chamber
15a‧‧‧陽極 15a‧‧‧Anode
15b‧‧‧陰極 15b‧‧‧ cathode
16a‧‧‧氣體排出口 16a‧‧‧ gas discharge
16b‧‧‧氣體排出口 16b‧‧‧ gas discharge
17a‧‧‧排氣管 17a‧‧‧Exhaust pipe
17b‧‧‧排氣管 17b‧‧‧Exhaust pipe
18a‧‧‧供給管線 18a‧‧‧Supply pipeline
18b‧‧‧溫度調整用加熱器 18b‧‧‧heating heater
18c‧‧‧HF供給孔 18c‧‧‧HF supply hole
19‧‧‧安裝構件 19‧‧‧Installation components
23‧‧‧控制部 23‧‧‧Control Department
E1‧‧‧接地線 E1‧‧‧ Grounding wire
H1‧‧‧開口 H1‧‧‧ openings
H2‧‧‧開口 H2‧‧‧ openings
Claims (9)
Applications Claiming Priority (2)
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JP2011143908A JP5824256B2 (en) | 2011-06-29 | 2011-06-29 | Electrolyzer |
JP2011155066A JP2013019035A (en) | 2011-07-13 | 2011-07-13 | Gas generator |
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TW201311935A true TW201311935A (en) | 2013-03-16 |
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TW101123625A TW201311935A (en) | 2011-06-29 | 2012-06-29 | Electrolytic device |
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KR (1) | KR20140035957A (en) |
CN (1) | CN103635609A (en) |
DE (1) | DE112012002702T8 (en) |
TW (1) | TW201311935A (en) |
WO (1) | WO2013001800A1 (en) |
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TWI759030B (en) * | 2019-12-27 | 2022-03-21 | 日商昭和電工股份有限公司 | Fluorine gas production method and fluorine gas production device |
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WO2015162868A1 (en) * | 2014-04-24 | 2015-10-29 | 東洋炭素株式会社 | Reaction device |
JP6096258B1 (en) * | 2015-09-11 | 2017-03-15 | 株式会社ウォーターエージェンシー | Ozone water production equipment |
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WO2019087885A1 (en) * | 2017-10-31 | 2019-05-09 | 関東電化工業株式会社 | Electrolytic bath for producing nitrogen trifluoride gas, and partition therefor |
WO2020085066A1 (en) * | 2018-10-24 | 2020-04-30 | 昭和電工株式会社 | Fluorine gas production device |
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DE69018761T2 (en) * | 1989-10-26 | 1995-12-07 | Mitsui Toatsu Chemicals | Method of producing nitrogen trifluoride. |
JP2766845B2 (en) * | 1991-08-19 | 1998-06-18 | 三井化学株式会社 | Electrolytic cell |
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- 2012-06-27 WO PCT/JP2012/004145 patent/WO2013001800A1/en active Application Filing
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TWI600800B (en) * | 2015-10-02 | 2017-10-01 | 厚成精工有限公司 | Collector of electrolyzer for manufacturing nitrogen trifluoride and manufacturing method the same |
TWI759030B (en) * | 2019-12-27 | 2022-03-21 | 日商昭和電工股份有限公司 | Fluorine gas production method and fluorine gas production device |
US12152308B2 (en) | 2019-12-27 | 2024-11-26 | Resonac Corporation | Method for producing fluorine gas and device for producing fluorine gas |
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WO2013001800A1 (en) | 2013-01-03 |
KR20140035957A (en) | 2014-03-24 |
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