TW201304893A - Laser scribing device - Google Patents
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- TW201304893A TW201304893A TW101115274A TW101115274A TW201304893A TW 201304893 A TW201304893 A TW 201304893A TW 101115274 A TW101115274 A TW 101115274A TW 101115274 A TW101115274 A TW 101115274A TW 201304893 A TW201304893 A TW 201304893A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
- B23K37/04—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
- B23K37/0408—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work for planar work
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- Materials Engineering (AREA)
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- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Description
本發明係關於一種用以對玻璃基板、藍寶石基板、半導體基板等脆性材料基板照射雷射光束而形成劃線溝槽之雷射劃線裝置。 The present invention relates to a laser scribing apparatus for irradiating a brittle material substrate such as a glass substrate, a sapphire substrate, or a semiconductor substrate with a laser beam to form a scribe groove.
一般而言,已知有如下方法:於分割脆性材料基板之過程中,一邊沿著劃線預定線來對脆性材料基板之表面照射雷射光一邊使其等相對地移動,藉此,形成劃線溝槽,且上述方法已公開在例如專利文獻1中。 In general, in the process of dividing a brittle material substrate, the surface of the brittle material substrate is irradiated with laser light while moving along the line of the scribe line, thereby forming a scribe line. The groove, and the above method has been disclosed, for example, in Patent Document 1.
在雷射劃線裝置中,將脆性材料基板載置於可在相互正交的X方向與Y方向上移動的X-Y平台上的工作台上,一邊照射雷射光一邊使工作台在X方向及Y方向上移動,從而在脆性材料基板上形成劃線溝槽。支撐對大型基板進行處理的X-Y平台的台盤使用的是溫度變化小且物理性、機械強度優異的石壓盤。石壓盤與精密機械加工領域中所使用的類型相同,是由花崗岩(granite)形成為厚板狀,且上下表面的水平度經過精密加工。 In a laser scribing device, a brittle material substrate is placed on a table on an XY stage that is movable in mutually orthogonal X and Y directions, and the table is illuminated in the X direction and Y while irradiating the laser light. The direction is moved to form a scribe groove on the brittle material substrate. The plate for the X-Y platform that supports the processing of large substrates uses a stone platen with small temperature changes and excellent physical and mechanical strength. The stone platen is of the same type used in the field of precision machining. It is formed of granite as a thick plate and the level of the upper and lower surfaces is precisely machined.
圖4是表示組裝了石壓盤的先前之雷射劃線裝置的概略前視圖。 Fig. 4 is a schematic front view showing a conventional laser scribing apparatus in which a stone platen is assembled.
在由金屬製的框材組成的下部框架31之上表面,通過可調整高度的連結部32而固定有以石壓盤33為基台的金屬製的上部框架34。在石壓盤33之上表面設置有包含X平台36及Y平台38的X-Y平台39,上述X平台36配置成可沿著在X 方向(圖4的前後方向)上延伸設置的軌道35移動,上述Y平台38配置成在該X平台上可沿著在Y方向(圖4的左右方向)上延伸設置的軌道37移動。在Y平台38上隔著圍繞垂直軸(縱軸)旋轉的旋轉機構40而設置有工作台41,在工作台41上載置有應加工的脆性材料基板W。 On the upper surface of the lower frame 31 composed of a metal frame material, a metal upper frame 34 having a stone platen 33 as a base is fixed by a height-adjustable connecting portion 32. An X-Y platform 39 including an X platform 36 and a Y platform 38 is disposed on the upper surface of the stone platen 33, and the X platform 36 is configured to be along the X The rails 35 extending in the direction (the front-rear direction of FIG. 4) are moved, and the Y-platform 38 is disposed to be movable along the rails 37 extending in the Y direction (the left-right direction of FIG. 4) on the X-platform. A table 41 is provided on the Y stage 38 via a rotating mechanism 40 that rotates about a vertical axis (vertical axis), and a brittle material substrate W to be processed is placed on the table 41.
在上部框架34的最上部安裝有雷射光源42或用來確認位置的觀察部(未圖示)。雷射光源42的內部設置有雷射振盪源、將來自雷射振盪源的光引導至雷射光照射部43的反射鏡或聚光透鏡等光學元件。構成為:將脆性材料基板W載置於工作台41上,使雷射光自雷射光照射部43照射至脆性材料基板W,並且利用X-Y平台39而使工作台41在X方向以及Y方向上移動,藉此,可在脆性材料基板W上加工出X方向以及Y方向的劃線溝槽。 A laser light source 42 or an observation portion (not shown) for confirming the position is attached to the uppermost portion of the upper frame 34. Inside the laser light source 42, a laser oscillation source and an optical element such as a mirror or a condenser lens that guides the light from the laser oscillation source to the laser beam irradiation unit 43 are provided. The brittle material substrate W is placed on the table 41, the laser beam is irradiated from the laser beam irradiation unit 43 to the brittle material substrate W, and the table 41 is moved in the X direction and the Y direction by the XY stage 39. Thereby, the scribe groove in the X direction and the Y direction can be processed on the brittle material substrate W.
[專利文獻1]日本專利特開2010-089143號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-089143
在上述雷射劃線裝置中,石壓盤33配置在下部框架31的上方,在石壓盤33之上表面組裝有上部框架34。下部框架31係為了將石壓盤載置面之高度L1設為800~850 mm左右而設置者,藉此,使石壓盤之上表面之高度達到人員方便操作之高度。上部框架34係為了將雷射光源42或雷射光照射部43安裝於上方而組裝者,以自上方對載置於工作台41上 之脆性材料基板W照射雷射光束。 In the above-described laser scribing device, the stone pressure plate 33 is disposed above the lower frame 31, and the upper frame 34 is assembled on the upper surface of the stone pressure plate 33. The lower frame 31 is provided so as to set the height L 1 of the stone platen mounting surface to about 800 to 850 mm, thereby making the height of the upper surface of the stone platen to a height that is convenient for the person to operate. The upper frame 34 is assembled by the projector for mounting the laser light source 42 or the laser beam irradiation unit 43 upward, and irradiates the brittle material substrate W placed on the table 41 from above with a laser beam.
上部框架34與下部框架31係分別用於不同之目的,因此針對每個裝置獨立地設計上部框架34與下部框架31,由上述上部框架34與下部框架31以及石壓盤33形成裝置之骨架。 The upper frame 34 and the lower frame 31 are used for different purposes, respectively, so the upper frame 34 and the lower frame 31 are independently designed for each device, and the upper frame 34 and the lower frame 31 and the stone platen 33 form the skeleton of the device.
因此,必需對應於所使用之石壓盤33來變更組裝於其上之上部框架34之大小、或變更支撐石壓盤33之下部框架,從而先前乃針對每個裝置分別設計上部框架34與下部框架31。 Therefore, it is necessary to change the size of the upper frame 34 assembled thereto or to change the lower frame of the support stone plate 33 corresponding to the stone platen 33 used, so that the upper frame 34 and the lower portion are separately designed for each device. Frame 31.
再者,若上部框架34之大小、形狀不同,則針對雷射光學系統亦必需相應地設計安裝位置。 Furthermore, if the size and shape of the upper frame 34 are different, it is necessary to design the mounting position accordingly for the laser optical system.
進而,若作為加工對象之脆性材料基板之種類或厚度不同,則必需變更適合於加工之雷射光源之種類或輸出大小、雷射光照射部之光學系統,因此還必需根據該等雷射光學系統之使用機種之不同來設計對上部框架34的安裝方法。 Further, if the type or thickness of the brittle material substrate to be processed is different, it is necessary to change the type of the laser light source to be processed, the output size, and the optical system of the laser beam irradiation unit. Therefore, it is necessary to use the laser system according to the laser system. The method of mounting the upper frame 34 is designed using different models.
此外,有時是由搬送機器人自動進行將脆性材料基板W搬送至工作台41上、或者搬出加工後之脆性材料基板W的步驟,有時則是手動進行該等步驟,當在試製階段手動進行基板搬送而在生產階段自動進行時,便需要變更搬送方式。該情形下,先前亦需配合上部框架34、下部框架31及石壓盤33來設計搬送機器人。 Further, the transfer robot may automatically perform the step of transporting the brittle material substrate W onto the stage 41 or carrying out the processed brittle material substrate W. In some cases, the steps may be performed manually, and may be manually performed during the trial production stage. When the substrate is transported and automatically carried out during the production phase, the transport method needs to be changed. In this case, it is also necessary to design the transport robot with the upper frame 34, the lower frame 31, and the stone platen 33.
如此,必需配合包括上部框架34、下部框架31、石壓盤33、X-Y平台39之雷射劃線裝置之主體部分(稱為加工單 元)的大小、形狀來選擇雷射光學系統、自動化時之搬送機構,並且個別設計安裝方法,且每次都必需對框架進行專門設計。 Thus, it is necessary to cooperate with the main body portion of the laser scribing device including the upper frame 34, the lower frame 31, the stone platen 33, and the X-Y platform 39 (referred to as a processing order) The size and shape of the element are selected to be the laser optical system, the transport mechanism at the time of automation, and the installation method is individually designed, and the frame must be specially designed each time.
對此,本發明之目的在於實現配合雷射劃線裝置之主體部分(加工單元)、雷射種類、搬送機構之變更(variation)而容易地應對之結構的裝置構成。 In view of the above, an object of the present invention is to realize a device configuration that can easily cope with a main body portion (processing unit) of a laser scribing device, a laser type, and a variation of a transport mechanism.
為了解決上述課題而完成之本發明之雷射劃線裝置包括加工單元及雷射單元,上述加工單元由加工單元框架包圍,該加工單元框架以由框材構成長方體外觀之方式組成;上述雷射單元由雷射單元框架包圍,該雷射單元框架以構成具有與上述加工單元框架之上表面相同形狀之底面形狀的長方體外觀之方式組成;上述加工單元包括:石壓盤,其被支撐於由上述加工單元框架包圍之內側空間內;移動平台,其安裝於上述石壓盤之上表面;以及工作台,其可移動地由上述移動平台支撐並且載置基板;且,上述雷射單元包括由上述雷射單元框架支撐之雷射光源及雷射光照射部,上述雷射單元框架與上述加工單元框架以可裝卸之方式單元化。 The laser scribing apparatus of the present invention completed to solve the above problems includes a processing unit and a laser unit, the processing unit being surrounded by a processing unit frame, the processing unit frame being constituted by a frame material forming a rectangular parallelepiped appearance; The unit is surrounded by a laser unit frame that is configured to form a rectangular parallelepiped shape having a shape of a bottom surface having the same shape as the upper surface of the processing unit frame; the processing unit includes: a stone pressure plate supported by a working space surrounded by the processing unit frame; a moving platform mounted on the upper surface of the stone platen; and a table movably supported by the moving platform and mounting the substrate; and the laser unit includes The laser light source and the laser beam irradiation unit supported by the laser unit frame, the laser unit frame and the processing unit frame are detachably unitized.
再者,本發明之雷射劃線裝置進而包括搬送單元,上述搬送單元由搬送單元框架包圍,該搬送單元框架以由框材構成長方體外觀之方式組成;在由上述搬送單元框架所包圍之內側空間內,包括用以將基板對上述工作台搬送之搬送機構;上述搬送單元框架係與上述加工單元框架以可裝 卸之方式單元化。 Furthermore, the laser scribing apparatus of the present invention further includes a transport unit that is surrounded by a transport unit frame that is configured to have a rectangular parallelepiped appearance by a frame material, and is surrounded by the transport unit frame. a space for transporting a substrate to the table; the transfer unit frame and the processing unit frame are mountable The way of unloading is unitized.
於本發明中,雷射單元(或雷射單元與搬送單元)組裝成經由框架而可對加工單元連結、分離,因此可因應被加工之脆性材料基板之厚度及素材之種類,選擇性地組合具備具有各自合適之輸出之其他雷射光源之雷射單元、或具備搬送方式及搬送方向不同之其他搬送單元而組成加工單元,從而可藉由各種變更而有效使用。 In the present invention, the laser unit (or the laser unit and the transport unit) is assembled to be coupled and separated to the processing unit via the frame, so that the thickness of the substrate of the brittle material to be processed and the type of the material can be selectively combined. A laser unit having another laser light source having an appropriate output or a transport unit having a different transport mode and a different transport direction can be used as a processing unit, and can be effectively used by various modifications.
而且,先前係利用下部框架將石壓盤支撐於「高腰處」,將與下部框架分離之上部框架組裝於石壓盤上來支撐雷射單元,然而,在本發明中,係利用以由框材構成長方體外觀之方式所組成之一個加工單元框架來支撐石壓盤,因此可降低石壓盤之高度。結果,可降低自設置面至石壓盤之高度。 Moreover, in the prior art, the stone platen was supported at the "high waist" by the lower frame, and the upper frame separated from the lower frame was assembled on the stone platen to support the laser unit. However, in the present invention, the frame is utilized. The processing unit frame formed by the material forming the rectangular shape supports the stone platen, thereby reducing the height of the stone platen. As a result, the height from the setting surface to the stone platen can be lowered.
一般來說,因由移動平台(X-Y平台)驅動之工作台急速停止時的慣性力而產生水平方向上之振動,該水平方向上之振動經由載置有移動平台之石壓盤而傳遞至框架,石壓盤之高度離設置面越遠(重心越高)則振動週期越長,離設置面越近則週期越短。一般來說,振動週期越長,則至衰減為止越耗費時間,因此藉由縮短振動之頻率可縮短衰減時間。 Generally, the vibration in the horizontal direction is generated by the inertial force at the time of the rapid stop of the table driven by the moving platform (XY platform), and the vibration in the horizontal direction is transmitted to the frame via the stone platen on which the moving platform is placed. The farther the height of the stone platen is from the setting surface (the higher the center of gravity), the longer the vibration period is, and the closer to the setting surface, the shorter the period. In general, the longer the vibration period, the more time it takes to decay, so the decay time can be shortened by shortening the frequency of the vibration.
因此,於本發明中,可縮短自設置面至石壓盤之載置面之高度,藉此,即便因工作台之急速停止而產生振動,但由於為短週期振動,故而短時間內可衰減,於下一次工作 台開始移動之前,前一次振動會完全停止,從而可實現受振動影響較小之劃線加工。 Therefore, in the present invention, the height from the installation surface to the placement surface of the stone platen can be shortened, whereby vibration can be generated even if the table is rapidly stopped, but it can be attenuated in a short time due to short-cycle vibration. For the next job Before the stage starts moving, the previous vibration will completely stop, so that the scribing process with less influence on the vibration can be realized.
藉此,可高精度地加工出劃線溝槽,並且慣性力變大之移動平台亦可高速運轉,從而可提高裝置性能。 Thereby, the scribe groove can be processed with high precision, and the moving platform whose inertial force is increased can also be operated at a high speed, thereby improving the performance of the device.
以下,根據圖1~圖3詳細說明本發明之雷射劃線裝置。如圖2所示,雷射劃線裝置包括可相互連結、分離地組成之加工單元A、雷射單元B、以及自動搬送基板時安裝之搬送單元C。 Hereinafter, the laser scribing apparatus of the present invention will be described in detail with reference to Figs. 1 to 3 . As shown in FIG. 2, the laser scribing apparatus includes a processing unit A that can be connected to and separated from each other, a laser unit B, and a transport unit C that is mounted when the substrate is automatically transported.
加工單元A係以外觀呈長方體之方式被框架1包圍,且上表面呈方形。雷射單元B亦係以外觀呈長方體之方式被框架22包圍,其底面形成為與加工單元A之上表面相同形狀的方形。雷射單元B係固定於加工單元A之上表面。 The processing unit A is surrounded by the frame 1 in a rectangular parallelepiped appearance, and the upper surface is square. The laser unit B is also surrounded by the frame 22 in the form of a rectangular parallelepiped, and the bottom surface thereof is formed in a square shape having the same shape as the upper surface of the processing unit A. The laser unit B is fixed to the upper surface of the processing unit A.
而且,搬送單元C係以外觀形成長方體之方式被框架23包圍,並且固定於加工單元A之側面。 Further, the transport unit C is surrounded by the frame 23 so as to form a rectangular parallelepiped in appearance, and is fixed to the side surface of the processing unit A.
首先,說明加工單元A。圖1係表示加工單元A之框架部分之立體圖。加工單元A之框架1係由垂直立設於四角之四根柱框1a、將該等柱框1a之間水平連結之下部橫框1b及上部橫框1c、以及為了加固而視需要設置之中部橫框1d組成為立方體狀(亦可以為長方體)。該等框材1a、1b、1c、1d係由相同金屬材料之角管、例如板厚9 mm左右之鐵或不鏽鋼而形成。 First, the processing unit A will be described. Fig. 1 is a perspective view showing a frame portion of the machining unit A. The frame 1 of the processing unit A is composed of four column frames 1a that are vertically erected at the four corners, and the lower horizontal frame 1b and the upper horizontal frame 1c are horizontally connected between the column frames 1a, and the middle portion is provided as needed for reinforcement. The horizontal frame 1d is formed in a cubic shape (may also be a rectangular parallelepiped). The frame members 1a, 1b, 1c, and 1d are formed of an angle tube of the same metal material, for example, iron or stainless steel having a thickness of about 9 mm.
於本實施方式中,下部橫框1b係由合計五根框材構成,其中,除了將相鄰接之柱框1a之最下部之間水平連結的四 根框材以外,進而有將相對向之一對下部橫框1b、1b之中央之間水平連結的另一根下部橫截橫框1e(參照圖2)。於柱框1a之下端面安裝有對設置面R進行高度調整之調節器18,而且,於下部橫框1b安裝有移動用之腳輪19。 In the present embodiment, the lower horizontal frame 1b is composed of a total of five frame members, in which four are horizontally connected between the lowermost portions of the adjacent column frames 1a. In addition to the root frame material, there is another lower cross-sectional transverse frame 1e (see FIG. 2) that is horizontally connected to the center of one of the lower horizontal frames 1b and 1b. A regulator 18 for adjusting the height of the installation surface R is attached to the lower end surface of the column frame 1a, and a caster 19 for movement is attached to the lower horizontal frame 1b.
而且,於接近設置面R之位置上,石壓盤3隔著底部支撐板2(加工單元之一部分)而由下部橫框1b(以及下部橫截橫框1e)水平地支撐。 Further, at a position close to the installation surface R, the stone pressure plate 3 is horizontally supported by the lower horizontal frame 1b (and the lower cross-sectional horizontal frame 1e) via the bottom support plate 2 (one part of the processing unit).
上部橫框1c係構成為利用將相鄰接的柱框1a的最上部之間水平連結的四根框材而形成為方形,在其上載置有上部支撐板20(雷射單元之一部分)而得到固定。於上部支撐板20上載置有下述雷射光源16,進而以雷射光照射部17自形成於上部支撐板20上之開口部21朝向下方照射雷射之方式支撐。 The upper horizontal frame 1c is formed in a square shape by four frame members that horizontally connect the uppermost portions of the adjacent column frames 1a, and the upper support plate 20 (one part of the laser unit) is placed thereon. Get fixed. The laser light source 16 described below is placed on the upper support plate 20, and is further supported by the laser beam irradiation unit 17 from the opening 21 formed in the upper support plate 20 toward the lower side.
而且,中部橫框1d係構成為由將柱框1a之中央部彼此水平連結之四根框材而形成為方形。 Further, the middle horizontal frame 1d is formed in a square shape by four frame members that horizontally connect the central portions of the column frame 1a to each other.
石壓盤3係由溫度變化小且物理性、機械強度優異之花崗岩(granite)形成為厚板狀,並且上下表面之水平度經過精密加工。 The stone platen 3 is formed into a thick plate shape by granite having a small temperature change and excellent physical and mechanical strength, and the level of the upper and lower surfaces is precisely processed.
底部支撐板2大於石壓盤3所佔之面(投影面),而能夠完全載置石壓盤3之底面,且框架1與石壓盤3係以不直接接觸之方式安裝於由框架1包圍之內側空間內。而且,如圖2所示,以石壓盤3之一側面經由角狀(angle)之安裝片4以及螺栓5而固定於底部支撐板2上之方式進行安裝,石壓盤3之相反側之側緣部未由按壓片6固定而可自由膨脹,而使 上表面輕輕地與按壓片6接觸。藉此,當周圍溫度產生變化時,底部支撐板2不會受到石壓盤3之約束而容許熱膨脹,從而不會因與石壓盤3之熱膨脹係數之差所致的影響而產生偏向底部支撐板2之變形,進而不會使框架1受到由與石壓盤3之熱膨脹係數之差所致的影響。 The bottom support plate 2 is larger than the surface (projection surface) occupied by the stone pressure plate 3, and can completely mount the bottom surface of the stone pressure plate 3, and the frame 1 and the stone pressure plate 3 are attached to the frame 1 without being in direct contact. Inside the inner space. Further, as shown in FIG. 2, one side of the stone platen 3 is attached to the bottom support plate 2 via the angled mounting piece 4 and the bolt 5, and the opposite side of the stone platen 3 is attached. The side edge portion is not fixed by the pressing piece 6 and is free to expand, so that The upper surface is gently brought into contact with the pressing piece 6. Thereby, when the ambient temperature changes, the bottom support plate 2 is not restrained by the stone pressure plate 3 to allow thermal expansion, so that the bottom support is not caused by the influence of the difference in thermal expansion coefficient of the stone platen 3. The deformation of the plate 2 does not cause the frame 1 to be affected by the difference in thermal expansion coefficient from the stone platen 3.
至今為止,就人員操作性之觀點來說,先前將自設置面R至石壓盤3下表面之石壓盤載置高度L2設為800 mm左右,但由於因下述之工作台之移動而產生之振動頻率依存於與設置面R相距之高度,故而較佳為將石壓盤載置高度L2設為50 mm~400 mm,更佳為設為50 mm~200 mm以下,從而可充分提高所產生之振動頻率而使振動能夠於短時間內衰減。 As far as the operability is concerned, the stone platen mounting height L 2 from the setting surface R to the lower surface of the stone platen 3 has been set to about 800 mm, but due to the movement of the table below The generated vibration frequency depends on the height from the installation surface R. Therefore, it is preferable to set the stone platen mounting height L 2 to 50 mm to 400 mm, and more preferably to 50 mm to 200 mm or less. The vibration frequency generated is sufficiently increased to allow the vibration to be attenuated in a short time.
如圖2以及圖3所示,於石壓盤3之上表面設置有包含X平台9及Y平台12之X-Y平台13,上述X平台9配置成可藉由驅動軸8而沿著在X方向上延伸設置之軌道7移動,上述Y平台12配置成在上述X平台9上可藉由驅動軸11而沿著與X方向在平面上正交之Y方向延伸設置的軌道10移動。於Y平台12上經由圍繞縱軸旋轉之旋轉機構14而設置有工作台15,於工作台15上載置應加工之脆性材料基板W。 As shown in FIG. 2 and FIG. 3, an XY stage 13 including an X platform 9 and a Y platform 12 is disposed on the upper surface of the stone platen 3, and the X stage 9 is disposed to be along the X direction by the drive shaft 8. The rail 7 extending upward is moved, and the Y stage 12 is disposed so as to be movable on the X platform 9 by the drive shaft 11 along the rail 10 extending in the Y direction orthogonal to the plane in the X direction. A table 15 is provided on the Y stage 12 via a rotating mechanism 14 that rotates about a longitudinal axis, and a brittle material substrate W to be processed is placed on the table 15.
其次,說明雷射單元B。上部支撐板20(雷射單元的一部分)係經由螺釘等而裝卸自如地安裝於加工單元A之上部橫框1c上。上部支撐板20形成雷射單元B之底面,並且與上部橫框1c所形成之方形之形狀相同(相同面積)。而上部支撐板20係固定於雷射單元B之框架22上,藉此形成長方 體。框架22使用與框架1相同之金屬框材。如上所述,於上部支撐板20上安裝有雷射光源16及雷射光照射部17。雖省略圖示,但雷射光源16中包含雷射振盪源、用以將來自雷射振盪源之雷射光引導至雷射光照射部17之反射鏡或聚光透鏡等光學系統元件。再者,於上部支撐板20上亦具備用於檢測照射雷射光之點而修正偏差的光學系統觀察部(攝像機)。進而,當藉由利用雷射照射加熱且在加熱後立即進行冷卻而利用熱應力進行劃線加工時,亦會在上部支撐板20上安裝冷媒噴射機構。雷射光照射部17可自形成於上部支撐板20上之開口部21對加工單元框架1內進行雷射照射。 Next, the laser unit B will be explained. The upper support plate 20 (a part of the laser unit) is detachably attached to the upper horizontal frame 1c of the machining unit A via a screw or the like. The upper support plate 20 forms the bottom surface of the laser unit B and has the same shape (same area) as the square formed by the upper horizontal frame 1c. The upper support plate 20 is fixed to the frame 22 of the laser unit B, thereby forming a rectangular shape. body. The frame 22 uses the same metal frame as the frame 1. As described above, the laser light source 16 and the laser light irradiation portion 17 are mounted on the upper support plate 20. Although not shown in the drawings, the laser light source 16 includes a laser oscillation source and an optical system element such as a mirror or a condenser lens for guiding the laser light from the laser oscillation source to the laser beam irradiation unit 17. Further, the upper support plate 20 is also provided with an optical system observation portion (camera) for detecting a point at which the laser light is irradiated to correct the deviation. Further, when the scribing process is performed by thermal stress by heating by laser irradiation and cooling immediately after heating, a refrigerant injection mechanism is also attached to the upper support plate 20. The laser beam irradiation unit 17 can perform laser irradiation into the processing unit frame 1 from the opening 21 formed in the upper support plate 20.
其次,說明搬送單元C。搬送單元C係由與框架1為相同金屬材料之搬送單元框架23包圍,其內側空間內包括在與加工單元A之間搬送脆性材料基板W之搬送機器人24、以及用以堆疊未處理基板或已處理基板之卡匣25。 Next, the transport unit C will be described. The transport unit C is surrounded by a transport unit frame 23 of the same metal material as the frame 1, and the inner space includes a transport robot 24 that transports the brittle material substrate W between the processing unit A, and an unprocessed substrate for stacking or The cassette 25 of the substrate is processed.
在以上構成中,當在脆性材料基板W上加工劃線溝槽時,搬送機器人24自卡匣25中取出脆性材料基板W,將脆性材料基板W載置於加工單元A之工作台15上,一面自雷射光照射部17將雷射光照射至脆性材料基板W上,一面藉由X-Y平台13使工作台15於X方向以及Y方向上移動,藉此在脆性材料基板W上加工出X方向以及Y方向上之劃線溝槽。 In the above configuration, when the scribe groove is processed on the brittle material substrate W, the transfer robot 24 takes out the brittle material substrate W from the cassette 25, and mounts the brittle material substrate W on the table 15 of the processing unit A. The laser light is irradiated onto the brittle material substrate W from the laser beam irradiation unit 17, and the table 15 is moved in the X direction and the Y direction by the XY stage 13, whereby the X direction is processed on the brittle material substrate W and A scribe groove in the Y direction.
加工單元A中由於是在框架1之內部且接近於設置面R之底部支撐板2上配置有石壓盤3,因此,由X-Y平台13所產 生之振動頻率會相應於石壓盤3與設置面R之間隔L2較短而減小,從而可抑制X-Y平台13之反覆運動所引起之振動的放大。藉此,可更高精度地加工出劃線溝槽,並且亦可以實現X-Y平台13之高速運轉,從而可提高裝置性能。再者,藉由降低裝置之重心而改善裝置之穩定性,可抑制振動之產生,從而可加工出高精度之劃線溝槽。 In the processing unit A, since the stone pressure plate 3 is disposed on the bottom support plate 2 inside the frame 1 and close to the setting surface R, the vibration frequency generated by the XY stage 13 corresponds to the stone pressure plate 3 and the setting. The interval L 2 of the face R is shortened and reduced, so that the amplification of the vibration caused by the repetitive motion of the XY stage 13 can be suppressed. Thereby, the scribe groove can be processed with higher precision, and the high speed operation of the XY stage 13 can also be realized, thereby improving the device performance. Furthermore, by reducing the center of gravity of the device and improving the stability of the device, vibration generation can be suppressed, and a highly precise scribe groove can be processed.
而且,於本發明中,加工單元A、雷射單元B、搬送單元C係獨立的,可將雷射單元B或另外的搬送單元C選擇性地與加工單元A組合而組成,上述雷射單元B中設有根據被加工之脆性材料基板W之厚度及素材之種類而具有各自所適合的輸出之另外的雷射光源,上述另外的搬送單元C中設有搬送方式及搬送方向不同之搬送機構,因此可通過各種變化而有效使用。 Further, in the present invention, the processing unit A, the laser unit B, and the transport unit C are independent, and the laser unit B or another transport unit C may be selectively combined with the processing unit A, and the above-described laser unit B is provided with another laser light source having an output suitable for each of the thickness of the brittle material substrate W to be processed and the type of material, and the other transport unit C is provided with a transport mechanism having a different transport mode and transport direction. Therefore, it can be effectively used through various changes.
以上,已說明本發明之代表實施例,但本發明未必僅特定為上述實施例結構。例如,亦可以在加工單元A中去除設置於加工單元框架1底面之腳輪19及調節器18而將框架1直接設置於設置面R上。 The representative embodiments of the present invention have been described above, but the present invention is not necessarily limited to the configuration of the above embodiment. For example, the caster 19 and the adjuster 18 provided on the bottom surface of the machining unit frame 1 may be removed from the machining unit A, and the frame 1 may be directly disposed on the installation surface R.
而且,移動平台亦可為僅於一個方向上移動之X平台,以此代替X-Y平台。 Moreover, the mobile platform can also be an X platform that moves in only one direction instead of the X-Y platform.
而且,係使用搬送單元C而搬送經劃線處理之脆性材料基板W,但亦可省略搬送單元C而手動輸送。 Further, the swarf-treated brittle material substrate W is transported by the transport unit C, but the transport unit C may be omitted and the manual transport may be omitted.
此外,於本發明中,可在達成其目的並且不脫離申請專利範圍之範圍內進行適當的修正、變更。 Further, in the present invention, appropriate modifications and changes can be made without departing from the scope of the invention.
本發明可應用於為了在玻璃基板、藍寶石基板、半導體基板等脆性材料基板上形成劃線溝槽之劃線裝置中。 The present invention can be applied to a scribing apparatus for forming a scribe groove on a brittle material substrate such as a glass substrate, a sapphire substrate, or a semiconductor substrate.
1‧‧‧加工單元框架 1‧‧‧Processing unit framework
1a‧‧‧柱框 1a‧‧‧ column frame
1b‧‧‧下部橫框 1b‧‧‧lower horizontal frame
1c‧‧‧上部橫框 1c‧‧‧ upper horizontal frame
1d‧‧‧中部橫框 1d‧‧‧Central frame
1e‧‧‧下部橫截橫框 1e‧‧‧lower transverse frame
2‧‧‧底部支撐板 2‧‧‧Bottom support plate
3‧‧‧石壓盤 3‧‧‧stone plate
4‧‧‧安裝片 4‧‧‧Installation
5‧‧‧螺栓 5‧‧‧ bolt
6‧‧‧按壓片 6‧‧‧Pressing tablets
7‧‧‧軌道 7‧‧‧ Track
8‧‧‧驅動軸 8‧‧‧Drive shaft
9‧‧‧X平台 9‧‧‧X platform
10‧‧‧軌道 10‧‧‧ Track
11‧‧‧驅動軸 11‧‧‧Drive shaft
12‧‧‧Y平台 12‧‧‧Y platform
13‧‧‧X-Y平台(移動平台) 13‧‧‧X-Y platform (mobile platform)
14‧‧‧旋轉機構 14‧‧‧Rotating mechanism
15‧‧‧工作台 15‧‧‧Workbench
16‧‧‧雷射光源 16‧‧‧Laser light source
17‧‧‧雷射光照射部 17‧‧‧Laser Light Irradiation Department
18‧‧‧調節器 18‧‧‧Regulator
19‧‧‧腳輪 19‧‧‧ casters
20‧‧‧上部支撐板 20‧‧‧Upper support plate
22‧‧‧雷射單元框架 22‧‧‧Laser unit frame
23‧‧‧搬送單元框架 23‧‧‧Transport unit frame
24‧‧‧搬送機器人 24‧‧‧Transfer robot
25‧‧‧卡匣 25‧‧‧Carmen
31‧‧‧下部框架 31‧‧‧ Lower frame
32‧‧‧連結部 32‧‧‧Connecting Department
33‧‧‧石壓盤 33‧‧‧stone plate
34‧‧‧上部框架 34‧‧‧ upper frame
35‧‧‧軌道 35‧‧‧ Track
36‧‧‧X平台 36‧‧‧X platform
37‧‧‧軌道 37‧‧‧ Track
38‧‧‧Y平台 38‧‧‧Y platform
39‧‧‧X-Y平台 39‧‧‧X-Y platform
40‧‧‧旋轉機構 40‧‧‧Rotating mechanism
41‧‧‧工作台 41‧‧‧Workbench
42‧‧‧雷射光源 42‧‧‧Laser light source
43‧‧‧雷射光照射部 43‧‧‧Laser Light Irradiation Department
A‧‧‧加工單元 A‧‧‧Processing unit
B‧‧‧雷射單元 B‧‧‧Laser unit
C‧‧‧搬送單元 C‧‧‧Transport unit
L1‧‧‧石壓盤載置面之高度 L 1 ‧‧‧ Height of stone plate loading surface
L2‧‧‧石壓盤載置高度 L 2 ‧‧‧stone plate loading height
R‧‧‧設置面 R‧‧‧Setting surface
W‧‧‧脆性材料基板 W‧‧‧Battery material substrate
圖1係表示本發明之雷射劃線裝置之加工單元之框架部分的立體圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a frame portion of a processing unit of a laser scribing apparatus of the present invention.
圖2係本發明之雷射劃線裝置之局部剖面前視圖。 Figure 2 is a partial cross-sectional front elevational view of the laser scribing apparatus of the present invention.
圖3係表示上述劃線裝置之X-Y平台部分之概略俯視圖。 Fig. 3 is a schematic plan view showing an X-Y platform portion of the scribing device.
圖4係先前之劃線裝置之前視圖。 Figure 4 is a front view of a prior scribing device.
1‧‧‧加工單元框架 1‧‧‧Processing unit framework
1a‧‧‧柱框 1a‧‧‧ column frame
1b‧‧‧下部橫框 1b‧‧‧lower horizontal frame
1c‧‧‧上部橫框 1c‧‧‧ upper horizontal frame
1d‧‧‧中部橫框 1d‧‧‧Central frame
1e‧‧‧下部橫截橫框 1e‧‧‧lower transverse frame
2‧‧‧底部支撐板 2‧‧‧Bottom support plate
3‧‧‧石壓盤 3‧‧‧stone plate
4‧‧‧安裝片 4‧‧‧Installation
5‧‧‧螺栓 5‧‧‧ bolt
6‧‧‧按壓片 6‧‧‧Pressing tablets
7‧‧‧軌道 7‧‧‧ Track
8‧‧‧驅動軸 8‧‧‧Drive shaft
9‧‧‧X平台 9‧‧‧X platform
10‧‧‧軌道 10‧‧‧ Track
11‧‧‧驅動軸 11‧‧‧Drive shaft
12‧‧‧Y平台 12‧‧‧Y platform
13‧‧‧X-Y平台(移動平台) 13‧‧‧X-Y platform (mobile platform)
14‧‧‧旋轉機構 14‧‧‧Rotating mechanism
15‧‧‧工作台 15‧‧‧Workbench
16‧‧‧雷射光源 16‧‧‧Laser light source
17‧‧‧雷射光照射部 17‧‧‧Laser Light Irradiation Department
18‧‧‧調節器 18‧‧‧Regulator
19‧‧‧腳輪 19‧‧‧ casters
20‧‧‧上部支撐板 20‧‧‧Upper support plate
22‧‧‧雷射單元框架 22‧‧‧Laser unit frame
23‧‧‧搬送單元框架 23‧‧‧Transport unit frame
24‧‧‧搬送機器人 24‧‧‧Transfer robot
25‧‧‧卡匣 25‧‧‧Carmen
A‧‧‧加工單元 A‧‧‧Processing unit
B‧‧‧雷射單元 B‧‧‧Laser unit
C‧‧‧搬送單元 C‧‧‧Transport unit
L2‧‧‧石壓盤載置高度 L 2 ‧‧‧stone plate loading height
R‧‧‧設置面 R‧‧‧Setting surface
W‧‧‧脆性材料基板 W‧‧‧Battery material substrate
Claims (2)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2011158884A JP5271394B2 (en) | 2011-07-20 | 2011-07-20 | Laser scribing equipment |
Publications (2)
Publication Number | Publication Date |
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TW201304893A true TW201304893A (en) | 2013-02-01 |
TWI445587B TWI445587B (en) | 2014-07-21 |
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TW101115274A TWI445587B (en) | 2011-07-20 | 2012-04-27 | Lightning scribing device |
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JP (1) | JP5271394B2 (en) |
KR (1) | KR101398792B1 (en) |
CN (1) | CN102886608B (en) |
TW (1) | TWI445587B (en) |
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CN105479013A (en) * | 2015-12-25 | 2016-04-13 | 苏州爱能杰节能科技有限公司 | Automatic laser marking machine |
CN105479012A (en) * | 2015-12-25 | 2016-04-13 | 苏州爱能杰节能科技有限公司 | Laser marking device for automatic laser marking machine |
CN105428968A (en) * | 2015-12-25 | 2016-03-23 | 苏州智合源电子科技有限公司 | Laser device for laser marking machine |
CN110449744A (en) * | 2019-08-12 | 2019-11-15 | 安徽龙芯微科技有限公司 | A kind of chip manufacture marking machine and its operating method |
CN114889336B (en) * | 2022-05-24 | 2024-05-03 | 珠海海平办公设备有限公司 | Auxiliary feeding equipment convenient for laser printing |
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JP3257157B2 (en) * | 1993-07-16 | 2002-02-18 | 松下電器産業株式会社 | CO2 laser drilling device and method |
JP3457370B2 (en) * | 1993-12-27 | 2003-10-14 | 株式会社アマダ | Laser processing machine |
JP2002361411A (en) * | 2001-06-05 | 2002-12-18 | Matsushita Electric Ind Co Ltd | Machining device |
JP4006968B2 (en) * | 2001-09-28 | 2007-11-14 | 松下電器産業株式会社 | Laser processing equipment |
JP2003225786A (en) * | 2002-01-30 | 2003-08-12 | Uht Corp | Laser beam machining unit and machining device equipped therewith |
JP2006061979A (en) | 2004-08-30 | 2006-03-09 | Sunx Ltd | Laser machining apparatus |
JP2009291815A (en) * | 2008-06-05 | 2009-12-17 | Kyushu Mitoyo Kk | Laser beam machining apparatus |
JP2010089143A (en) * | 2008-10-10 | 2010-04-22 | Mitsuboshi Diamond Industrial Co Ltd | Method and device for cutting brittle material substrate |
CN201324912Y (en) * | 2008-11-19 | 2009-10-14 | 深圳市大族激光科技股份有限公司 | Amorphous silicon film solar battery laser marking device |
JP5416445B2 (en) * | 2009-03-25 | 2014-02-12 | 三星ダイヤモンド工業株式会社 | Laser scribing equipment |
JP2011020161A (en) * | 2009-07-17 | 2011-02-03 | Kataoka Seisakusho:Kk | Laser beam machine |
JP5438422B2 (en) * | 2009-07-31 | 2014-03-12 | 三星ダイヤモンド工業株式会社 | Method and apparatus for processing brittle material substrate |
JP5123923B2 (en) * | 2009-12-08 | 2013-01-23 | 三星ダイヤモンド工業株式会社 | Method and apparatus for processing brittle substrate |
CN101894883A (en) * | 2010-06-03 | 2010-11-24 | 江西赛维Best太阳能高科技有限公司 | Novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process |
CN101983825A (en) * | 2010-10-09 | 2011-03-09 | 苏州德龙激光有限公司 | Picosecond laser scribing device for light emitting diode (LED) wafer |
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TWI445587B (en) | 2014-07-21 |
JP2013022612A (en) | 2013-02-04 |
KR101398792B1 (en) | 2014-05-30 |
CN102886608A (en) | 2013-01-23 |
KR20130011912A (en) | 2013-01-30 |
JP5271394B2 (en) | 2013-08-21 |
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