TW201302877A - Method and apparatus for treating film surface - Google Patents
Method and apparatus for treating film surface Download PDFInfo
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- TW201302877A TW201302877A TW101110895A TW101110895A TW201302877A TW 201302877 A TW201302877 A TW 201302877A TW 101110895 A TW101110895 A TW 101110895A TW 101110895 A TW101110895 A TW 101110895A TW 201302877 A TW201302877 A TW 201302877A
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- reaction gas
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000012495 reaction gas Substances 0.000 claims abstract description 123
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 114
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 114
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 98
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 72
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims abstract description 63
- 229910052786 argon Inorganic materials 0.000 claims abstract description 50
- 238000004381 surface treatment Methods 0.000 claims abstract description 32
- 239000007789 gas Substances 0.000 claims description 146
- 239000012159 carrier gas Substances 0.000 claims description 27
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 230000008016 vaporization Effects 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 abstract description 15
- 230000001070 adhesive effect Effects 0.000 abstract description 15
- 239000010408 film Substances 0.000 description 130
- 208000028659 discharge Diseases 0.000 description 124
- 230000007246 mechanism Effects 0.000 description 34
- 238000006116 polymerization reaction Methods 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 239000004372 Polyvinyl alcohol Substances 0.000 description 18
- 229920002451 polyvinyl alcohol Polymers 0.000 description 18
- 238000012545 processing Methods 0.000 description 17
- 239000007921 spray Substances 0.000 description 17
- 238000005259 measurement Methods 0.000 description 15
- 239000000178 monomer Substances 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 238000009833 condensation Methods 0.000 description 9
- 230000005494 condensation Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 229920002125 Sokalan® Polymers 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000004584 polyacrylic acid Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000006200 vaporizer Substances 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 150000001485 argon Chemical class 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000002309 gasification Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 description 1
- -1 acryl Chemical group 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 description 1
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
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- Chemical & Material Sciences (AREA)
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- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- General Health & Medical Sciences (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
本發明係關於一種對光學樹脂膜之表面進行處理之方法及裝置,特別係關於一種適於提高以聚甲基丙烯酸甲酯(Polymethylmethacrylate,以下稱為「PMMA」)為主要成分之樹脂膜(以下稱為「PMMA膜」)之接著性的表面處理方法及裝置。 The present invention relates to a method and apparatus for treating the surface of an optical resin film, and more particularly to a resin film suitable for improving polymethylmethacrylate (hereinafter referred to as "PMMA") as a main component (hereinafter A surface treatment method and apparatus called "PMMA film".
例如,於專利文獻1、2中,為了提高偏光板之保護膜之接著性,而使含有聚合性單體之氣體接觸上述保護膜並照射電漿。作為聚合性單體,例如使用丙烯酸。作為保護膜之一例,可列舉PMMA膜。作為電漿生成用氣體之一例,可列舉氬。藉由將處理結束之保護膜經由接著劑而與偏光膜貼合從而構成偏光板。作為接著劑,可使用聚乙烯醇(以下稱為「PVA」,polyvinyl alcohol)系或聚醚系等水系接著劑。作為偏光膜,可使用以PVA為主要成分之樹脂膜(以下稱為「PVA膜」)。 For example, in Patent Documents 1 and 2, in order to improve the adhesion of the protective film of the polarizing plate, a gas containing a polymerizable monomer is brought into contact with the protective film and irradiated with plasma. As the polymerizable monomer, for example, acrylic acid is used. An example of the protective film is a PMMA film. An example of the gas for plasma generation is argon. The protective film which has been subjected to the treatment is bonded to the polarizing film via an adhesive to form a polarizing plate. As the adhesive, a water-based adhesive such as polyvinyl alcohol (hereinafter referred to as "PVA", polyvinyl alcohol) or a polyether-based adhesive can be used. As the polarizing film, a resin film containing PVA as a main component (hereinafter referred to as "PVA film") can be used.
[專利文獻1]日本專利特開2010-150372號公報(0013、0017)[專利文獻2]日本專利特開2010-150373號公報(0011、0018) [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-150372 (0013, 0017) [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-150373 (0011, 0018)
然而,PMMA膜係極難接著性之膜。雖亦進行電暈放電處理或對接著劑進行研究而作為接著性之提高處理,但於該等之處理中接著性均不充分。 However, the PMMA film is extremely difficult to bond to the film. Although the corona discharge treatment or the adhesion of the adhesive was carried out to improve the adhesion, the adhesion was not sufficient in the treatment.
本發明方法之特徵在於:其係對PMMA膜之表面進行處理之膜表面處理方法;且包括如下步驟:第1接觸步驟,其係令使丙烯酸於載氣中氣化而成之第1反應氣體接觸PMMA膜;第1照射步驟,其係於上述第1接觸步驟後或與上述第1接觸步驟同時地,將於大氣壓附近下生成之氬電漿照射至上述PMMA膜;第2接觸步驟,其係於上述第1照射步驟後,使丙烯酸於載氣中氣化而成之第2反應氣體接觸上述PMMA膜;及第2照射步驟,其係於上述第2接觸步驟後或與上述第2接觸步驟同時地,將於大氣壓附近下生成之氬電漿照射至上述PMMA膜。 The method of the present invention is characterized in that it is a film surface treatment method for treating the surface of a PMMA film; and includes the following steps: a first contacting step of first reacting a gas obtained by vaporizing acrylic acid in a carrier gas Contacting the PMMA film; the first irradiation step is performed after the first contacting step or simultaneously with the first contacting step, irradiating the argon plasma generated near the atmospheric pressure to the PMMA film; and the second contacting step After the first irradiation step, the second reaction gas obtained by vaporizing acrylic acid in the carrier gas is brought into contact with the PMMA film; and the second irradiation step is performed after the second contact step or the second contact At the same time, an argon plasma generated under the vicinity of atmospheric pressure is irradiated to the above PMMA film.
藉由第1接觸步驟,可於PMMA膜之表面形成丙烯酸之第1凝縮層。其次,藉由第1照射步驟,可使上述第1凝縮層電漿聚合,從而形成聚丙烯酸之第1電漿聚合膜。其次,藉由第2接觸步驟,可於上述第1電漿聚合膜上形成丙烯酸之第2凝縮層。接著,藉由第2照射步驟,可使上述第2凝縮層電漿聚合,從而於上述第1電漿聚合膜上積層形成聚丙烯酸之第2電漿聚合膜。該等第1、第2電漿聚合膜成 為PMMA膜之接著性促進層。藉此,可提高難接著性之PMMA膜之接著強度,進而可充分地提高接著耐久性。此處,所謂接著耐久性,係指將接著後之對象物暴露於高濕度且高溫之濕熱環境下後接著強度不下降之程度。 By the first contacting step, the first condensed layer of acrylic acid can be formed on the surface of the PMMA film. Next, the first condensation layer is plasma-polymerized by the first irradiation step to form a first plasma polymerization film of polyacrylic acid. Next, a second condensed layer of acrylic acid can be formed on the first plasma polymer film by the second contacting step. Next, the second condensation layer is plasma-polymerized by the second irradiation step to form a second plasma polymerization film of polyacrylic acid on the first plasma polymerization film. The first and second plasma polymerization membranes are formed It is an adhesion promoting layer of the PMMA film. Thereby, the adhesion strength of the PMMA film which is difficult to bond can be improved, and the adhesion durability can be sufficiently improved. Here, the term "adhesive durability" refers to the extent to which the subsequent object is exposed to a high-humidity, high-temperature moist heat environment, and then the strength is not lowered.
本發明裝置之特徵在於:其係對PMMA膜之表面進行處理之膜表面處理裝置;且包括:第1、第2、第3輥電極,其相互平行地排列,且於相鄰者彼此間之間隙內在大氣壓附近下生成放電;第1反應氣體噴嘴,其面向上述第1輥電極之周面而噴出含有丙烯酸之第1反應氣體;第1放電氣體噴嘴,其將氬噴出至上述第1輥電極與上述第2輥電極之間的間隙內;第2反應氣體噴嘴,其面向上述第2輥電極之周面而噴出含有丙烯酸之第2反應氣體;及第2放電氣體噴嘴,其將氬噴出至上述第2輥電極與上述第3輥電極之間的間隙內;且上述PMMA膜纏繞於上述第1、第2、第3輥電極上,且藉由上述第1、第2、第3輥電極之旋轉而按照上述第1輥電極、上述第2輥電極、上述第3輥電極之順序搬送上述PMMA膜。 The apparatus of the present invention is characterized in that it is a film surface treatment apparatus for treating the surface of a PMMA film; and includes: first, second, and third roller electrodes which are arranged in parallel with each other and adjacent to each other a discharge is generated in the vicinity of the atmospheric pressure in the gap; the first reaction gas nozzle faces the peripheral surface of the first roller electrode to eject a first reaction gas containing acrylic acid; and the first discharge gas nozzle ejects argon to the first roller electrode a second reaction gas nozzle that discharges a second reaction gas containing acrylic acid toward a circumferential surface of the second roller electrode; and a second discharge gas nozzle that ejects argon into the gap between the second roller electrode and the second roller electrode a gap between the second roller electrode and the third roller electrode; and the PMMA film is wound around the first, second, and third roller electrodes, and the first, second, and third roller electrodes are The PMMA film is transferred in the order of the first roller electrode, the second roller electrode, and the third roller electrode in the order of rotation.
一面按照第1輥電極、第2輥電極、第3輥電極之順序搬送PMMA膜,一面於第1輥電極之周面上將第1反應氣體自第1反應氣體噴嘴噴附至PMMA膜。藉此,可於PMMA膜之表面形成丙烯酸之第1凝縮層。繼而,於第1、第2輥電極 間之間隙內對PMMA膜照射氬電漿。藉此,可使上述第1凝縮層電漿聚合,從而形成聚丙烯酸之第1電漿聚合膜。繼而,於第2輥電極之周面上將第2反應氣體自第2反應氣體噴嘴噴附至PMMA膜。藉此,可於上述第1電漿聚合膜上形成丙烯酸之第2凝縮層。其後,於第2、第3輥電極間之間隙內對PMMA膜照射氬電漿。藉此,可使上述第2凝縮層電漿聚合,從而於上述第1電漿聚合膜上積層形成聚丙烯酸之第2電漿聚合膜。其結果,可提高難接著性之PMMA膜之接著強度,進而可充分地提高接著耐久性。第1、第2、第3輥電極兼作PMMA膜之支持機構及搬送機構。 While the PMMA film is being transferred in the order of the first roller electrode, the second roller electrode, and the third roller electrode, the first reaction gas is sprayed from the first reaction gas nozzle onto the PMMA film on the circumferential surface of the first roller electrode. Thereby, the first condensed layer of acrylic acid can be formed on the surface of the PMMA film. Then, at the first and second roller electrodes The PMMA film was irradiated with argon plasma in the gap therebetween. Thereby, the first condensation layer can be plasma-polymerized to form a first plasma polymerization film of polyacrylic acid. Then, the second reaction gas is sprayed from the second reaction gas nozzle onto the PMMA film on the circumferential surface of the second roller electrode. Thereby, the second condensed layer of acrylic acid can be formed on the first plasma polymer film. Thereafter, the PMMA film was irradiated with argon plasma in the gap between the second and third roll electrodes. Thereby, the second condensation layer can be plasma-polymerized to form a second plasma polymerization film of polyacrylic acid on the first plasma polymerization film. As a result, the adhesion strength of the PMMA film which is difficult to bond can be improved, and the adhesion durability can be sufficiently improved. The first, second, and third roller electrodes also serve as a support mechanism and a transport mechanism for the PMMA film.
較佳為上述第1、第2反應氣體之載氣為氬。藉此,即便載氣流入至進行第1、第2照射步驟之空間(例如輥電極間之間隙)內,亦可防止放電狀態改變。又,為了降低運轉成本,上述載氣亦可為氮。 Preferably, the carrier gas of the first and second reaction gases is argon. Thereby, even if the carrier gas flows into the space where the first and second irradiation steps are performed (for example, the gap between the roller electrodes), the discharge state can be prevented from changing. Further, in order to reduce the running cost, the carrier gas may be nitrogen.
上述表面處理較佳為於大氣壓附近下進行。此處,所謂大氣壓附近係指1.013×104~50.663×104 Pa之範圍,若考慮到壓力調整之容易化或裝置構成之簡便化,則較佳為1.333×104~10.664×104 Pa,更佳為9.331×104~10.397×104 Pa。 The above surface treatment is preferably carried out in the vicinity of atmospheric pressure. Here, the vicinity of the atmospheric pressure means a range of 1.013 × 10 4 to 50.663 × 10 4 Pa, and in consideration of ease of pressure adjustment or simplification of the device configuration, it is preferably 1.333 × 10 4 to 10.664 × 10 4 Pa. More preferably, it is 9.331 × 10 4 ~ 10.397 × 10 4 Pa.
根據本發明,可提高難接著性之PMMA膜之接著強度,進而可充分地提高接著耐久性。 According to the present invention, the adhesion strength of the PMMA film which is difficult to bond can be improved, and the adhesion durability can be sufficiently improved.
以下,根據圖式對本發明之實施形態進行說明。 Hereinafter, embodiments of the present invention will be described based on the drawings.
圖1係表示本發明之第1實施形態。被處理物為用作偏光板之保護膜的PMMA膜9。PMMA膜9包含PMMA作為主要成分,且為極難接著性。此處,所謂包含PMMA作為主要成分係指膜9中所佔之PMMA之比率為60 wt%~100 wt%。換言之,係指膜原料中所佔之甲基丙烯酸甲酯(MMA,methyl methacrylate)之比率為60 wt%~100 wt%。作為膜9之除PMMA以外之含有成分,可列舉:紫外線吸收劑、穩定劑、潤滑劑、加工助劑、可塑劑、耐衝擊助劑、發泡劑、填充劑、著色劑、消光劑等。 Fig. 1 shows a first embodiment of the present invention. The object to be treated is a PMMA film 9 serving as a protective film for a polarizing plate. The PMMA film 9 contains PMMA as a main component and is extremely difficult to bond. Here, the term "containing PMMA as a main component" means that the ratio of PMMA in the film 9 is 60 wt% to 100 wt%. In other words, it means that the ratio of methyl methacrylate (MMA) in the film raw material is 60 wt% to 100 wt%. Examples of the component other than PMMA of the film 9 include an ultraviolet absorber, a stabilizer, a lubricant, a processing aid, a plasticizer, an impact-resistant auxiliary, a foaming agent, a filler, a colorant, and a matting agent.
如圖1及圖2所示,膜表面處理裝置1包括電極構造10及氣體供給機構20~50。電極構造10包含第1輥電極11、第2輥電極12、及第3輥電極13。該等輥電極11~13為彼此相同直徑、相同軸長之圓筒體。輥電極11~13之至少外周部包含金屬,且於該金屬製之外周部之外周面覆蓋有固體介電層。各輥電極11、12、13之軸線朝向與圖1之紙面正交之水平方向(以下稱為「處理寬度方向」)。3個輥電極11、12、13依此順序且平行地排列。於圖1中,左側之第1輥電極11與中央之第2輥電極12之間的第1間隙14係與中央之第2輥電極12與右側之第3輥電極13之間的第2間隙15之厚度等尺寸形狀彼此相等。間隙14、15之最窄部位之厚度較佳為0.5 mm~1.0 mm左右。 As shown in FIGS. 1 and 2, the film surface treatment apparatus 1 includes an electrode structure 10 and gas supply mechanisms 20 to 50. The electrode structure 10 includes a first roller electrode 11 , a second roller electrode 12 , and a third roller electrode 13 . The roller electrodes 11 to 13 are cylindrical bodies having the same diameter and the same axial length. At least the outer peripheral portion of the roller electrodes 11 to 13 includes a metal, and a peripheral surface of the outer periphery of the metal is covered with a solid dielectric layer. The axis of each of the roller electrodes 11, 12, and 13 is oriented in a horizontal direction orthogonal to the plane of the paper of Fig. 1 (hereinafter referred to as "processing width direction"). The three roller electrodes 11, 12, 13 are arranged in this order and in parallel. In FIG. 1, the first gap 14 between the first roller electrode 11 on the left side and the second roller electrode 12 in the center is the second gap between the second roller electrode 12 at the center and the third roller electrode 13 at the right side. The thicknesses and the like of 15 are equal to each other. The thickness of the narrowest portion of the gaps 14, 15 is preferably about 0.5 mm to 1.0 mm.
雖省略圖示,但電源連接於中央之輥電極12,且左右之輥電極11、13電性接地。相反,亦可使電源分別連接於左 右之輥電極11、13,且中央之輥電極12電性接地。電源輸出例如脈衝波狀之高頻電力。藉由該電力供給,而於左側之輥電極11與中央之輥電極12之間在大氣壓附近之壓力下生成電漿放電,間隙14成為大氣壓附近之第1放電空間。又,藉由上述電力供給,而於中央之輥電極12與右側之輥電極13之間在大氣壓附近之壓力下生成電漿放電,間隙15成為大氣壓附近之第2放電空間。間隙14、15間之施加電壓較佳為Vpp=6.0 kV~7.0 kV左右。上述高頻電力之頻率較佳為50 kHz~70 kHz左右。上述脈衝之上升時間及下降時間較佳為10 μsec以下。上述脈衝之持續時間較佳為1~1000 μsec。上述高頻並不限定於脈衝波,亦可為連續波。 Although not shown, the power source is connected to the center roller electrode 12, and the left and right roller electrodes 11, 13 are electrically grounded. Instead, you can also connect the power supply to the left. The right roller electrodes 11, 13 and the central roller electrode 12 are electrically grounded. The power supply outputs, for example, a pulse wave of high frequency power. By this power supply, a plasma discharge is generated between the roller electrode 11 on the left side and the roller electrode 12 on the center at a pressure near atmospheric pressure, and the gap 14 becomes the first discharge space in the vicinity of the atmospheric pressure. Further, by the power supply, a plasma discharge is generated between the center roller electrode 12 and the right roller electrode 13 at a pressure near atmospheric pressure, and the gap 15 becomes a second discharge space in the vicinity of the atmospheric pressure. The applied voltage between the gaps 14 and 15 is preferably about Vpp = 6.0 kV to 7.0 kV. The frequency of the above high frequency power is preferably about 50 kHz to 70 kHz. The rise time and fall time of the above pulse are preferably 10 μsec or less. The duration of the above pulses is preferably from 1 to 1000 μsec. The high frequency is not limited to a pulse wave, and may be a continuous wave.
於輥電極11、12之下方配置有複數個(圖中為2個)前段導輥16、16。於輥電極12、13之下方配置有複數個(圖中為2個)後段導輥17、17。 A plurality of (two in the drawing) front guide rollers 16, 16 are disposed below the roller electrodes 11, 12. A plurality of (two in the figure) rear guide rolls 17, 17 are disposed below the roller electrodes 12, 13.
連續片狀之PMMA膜9係使寬度方向朝向上述處理寬度方向(圖1之紙面正交方向),且分別以半周左右纏繞於3個輥電極11、12、13之上側之周面。包含各輥電極11、12、13之上側之周面及形成間隙14、15之部分在內的約半周部分由PMMA膜9覆蓋。 The continuous sheet-shaped PMMA film 9 has a width direction which faces the processing width direction (the direction perpendicular to the paper surface of FIG. 1), and is wound around the circumferential surface of the upper side of the three roller electrodes 11, 12, 13 in about half a week. Approximately half of the circumferential surface including the upper surface of each of the roller electrodes 11, 12, and 13 and the portion where the gaps 14 and 15 are formed is covered by the PMMA film 9.
輥電極11、12間之PMMA膜9係自間隙14向下方下垂,且纏繞於導輥16、16上。間隙14與導輥16、16之間的PMMA膜9形成折回部分9a。 The PMMA film 9 between the roller electrodes 11 and 12 is suspended downward from the gap 14 and wound around the guide rolls 16 and 16. The PMMA film 9 between the gap 14 and the guide rolls 16, 16 forms a folded-back portion 9a.
輥電極12、13間之PMMA膜9係自間隙15向下方下垂, 且纏繞於導輥17、17。間隙15與導輥17、17之間的PMMA膜9形成折回部分9b。 The PMMA film 9 between the roller electrodes 12 and 13 hangs downward from the gap 15 And wound around the guide rolls 17, 17. The PMMA film 9 between the gap 15 and the guide rolls 17, 17 forms a folded-back portion 9b.
雖省略圖示,但各輥電極11、12、13連接於旋轉機構。旋轉機構包括馬達、內燃機等驅動部及將該驅動部之驅動力傳遞至輥電極11、12、13之軸之傳遞機構。傳遞機構包括例如皮帶輪機構或齒輪列。如於圖1中由中空圓弧狀箭頭所示般,藉由旋轉機構,而使輥電極11、12、13分別圍繞各自之軸線且相互同步地向相同方向(於圖1中向順時針方向)旋轉。藉此,將PMMA膜9按照第1輥電極11、第2輥電極12、第3輥電極13之順序向大致右方向搬送。 Although not shown in the drawings, each of the roller electrodes 11, 12, and 13 is connected to a rotating mechanism. The rotation mechanism includes a drive unit such as a motor or an internal combustion engine, and a transmission mechanism that transmits the driving force of the drive unit to the shafts of the roller electrodes 11, 12, and 13. The transmission mechanism includes, for example, a pulley mechanism or a gear train. As shown by the hollow arc-shaped arrow in Fig. 1, the roller electrodes 11, 12, 13 are respectively rotated in the same direction around the respective axes by the rotation mechanism (clockwise in Fig. 1). ) Rotate. Thereby, the PMMA film 9 is conveyed in the substantially right direction in the order of the first roller electrode 11, the second roller electrode 12, and the third roller electrode 13.
電極構造10兼具作為支持PMMA膜9之支持機構、及搬送PMMA膜9之搬送機構之功能。 The electrode structure 10 has a function as a support mechanism for supporting the PMMA film 9 and a transport mechanism for transporting the PMMA film 9.
於各輥電極11、12、13中設置有調溫機構(省略圖示)。調溫機構包含例如形成於輥電極11、12、13內之調溫路。可藉由使經調溫之水等媒體流經調溫路而對輥電極11、12、13進行調溫。甚至,可對輥電極11、12、13之周面上之PMMA膜9進行調溫。輥電極11、12、13之設定溫度較佳為低於聚合性單體(丙烯酸)之凝縮溫度。PMMA膜9之設定溫度較佳為25℃~45℃左右。 A temperature adjustment mechanism (not shown) is provided in each of the roller electrodes 11, 12, and 13. The temperature adjustment mechanism includes, for example, a temperature regulation path formed in the roller electrodes 11, 12, and 13. The roller electrodes 11, 12, 13 can be tempered by flowing a medium such as tempered water through a temperature regulating path. Even the PMMA film 9 on the circumferential surface of the roller electrodes 11, 12, 13 can be tempered. The set temperature of the roller electrodes 11, 12, 13 is preferably lower than the condensation temperature of the polymerizable monomer (acrylic acid). The set temperature of the PMMA film 9 is preferably about 25 ° C to 45 ° C.
第1反應氣體供給機構20包括第1反應氣體之供給源21及第1反應氣體噴嘴23。第1反應氣體含有聚合性單體及載氣。作為聚合性單體係使用丙烯酸(AA,acrylic acid)。作為載氣係使用氮(N2)。第1反應氣體包含丙烯酸與氮之混合氣體。 The first reaction gas supply mechanism 20 includes a supply source 21 of the first reaction gas and a first reaction gas nozzle 23 . The first reaction gas contains a polymerizable monomer and a carrier gas. Acrylic acid (AA) is used as the polymerizable single system. Nitrogen (N 2 ) is used as the carrier gas system. The first reaction gas contains a mixed gas of acrylic acid and nitrogen.
雖省略詳細之圖示,但第1反應氣體供給源21包含氣化器。於氣化器中,液體之丙烯酸於載氣中氣化。氣化既可為起泡方式,亦可為擠出方式。藉由將經氣化之丙烯酸與載氣混合,而生成第1反應氣體。此處,所謂起泡方式,係指將載氣注入至氣化器內之液體丙烯酸之液中,而使丙烯酸於載氣之氣泡中氣化之方式。所謂擠出方式,係指將載氣導入至氣化器內之較液體丙烯酸之液面更上側之空間部分,而使上述空間部分之飽和丙烯酸蒸氣與載氣混合並擠出之方式。 Although the detailed illustration is omitted, the first reaction gas supply source 21 includes a vaporizer. In the gasifier, the liquid acrylic acid is vaporized in the carrier gas. Gasification can be either foaming or extrusion. The first reaction gas is produced by mixing the vaporized acrylic acid with a carrier gas. Here, the foaming method refers to a method in which a carrier gas is injected into a liquid acrylic liquid in a vaporizer to vaporize acrylic acid in a bubble of a carrier gas. The extrusion method refers to a method in which a carrier gas is introduced into a space portion on the upper side of a liquid surface of a liquid acrylic acid in a vaporizer, and a saturated acrylic vapor in the space portion is mixed with a carrier gas and extruded.
第1反應氣體供給源21經由氣體路22而連接於第1反應氣體噴嘴23。第1反應氣體噴嘴23配置於第1輥電極11之上方。第1反應氣體噴嘴23沿處理寬度方向較長地延伸,且於第1輥電極11之周方向(圖1之左右)上具有某種程度之寬度。於第1反應氣體噴嘴23之下表面設置有噴出口。噴出口係以分佈於第1反應氣體噴嘴23之下表面的較廣之範圍(處理寬度方向及輥周方向)之方式形成。第1反應氣體噴嘴23之噴出面(下表面)面向第1輥電極11上之PMMA膜9。來自第1反應氣體供給源21之第1反應氣體被供給至第1反應氣體噴嘴23,並藉由第1反應氣體噴嘴23內之整流部(省略圖示)而均一化,之後,自第1反應氣體噴嘴23之噴出口噴出。第1反應氣體之噴出氣流成為均一地分佈於處理寬度方向之氣流。 The first reaction gas supply source 21 is connected to the first reaction gas nozzle 23 via the gas path 22 . The first reaction gas nozzle 23 is disposed above the first roller electrode 11 . The first reaction gas nozzle 23 extends long in the processing width direction and has a certain width in the circumferential direction of the first roller electrode 11 (left and right in FIG. 1). A discharge port is provided on a lower surface of the first reaction gas nozzle 23. The discharge port is formed to be distributed over a wide range (process width direction and roll circumferential direction) of the lower surface of the first reaction gas nozzle 23. The discharge surface (lower surface) of the first reaction gas nozzle 23 faces the PMMA film 9 on the first roller electrode 11. The first reaction gas from the first reaction gas supply source 21 is supplied to the first reaction gas nozzle 23, and is uniformed by a rectifying unit (not shown) in the first reaction gas nozzle 23, and thereafter, from the first The discharge port of the reaction gas nozzle 23 is ejected. The discharge gas stream of the first reaction gas is a gas stream uniformly distributed in the treatment width direction.
於氣體路22及第1反應氣體噴嘴23中設置有調溫機構(省略圖示)。氣體路22之調溫機構包含電熱帶等。第1反應氣 體噴嘴23之調溫機構包含供調溫水通過之調溫路等。氣體路22及第1反應氣體噴嘴23之設定溫度高於丙烯酸之凝縮溫度。藉此,可防止丙烯酸於噴出前凝縮。氣體路22及第1反應氣體噴嘴23之設定溫度較佳為60℃~80℃左右。 A temperature adjustment mechanism (not shown) is provided in the gas path 22 and the first reaction gas nozzle 23. The temperature regulating mechanism of the gas path 22 includes a heating belt or the like. First reaction gas The temperature regulating mechanism of the body nozzle 23 includes a temperature regulating path through which the temperature-regulating water passes. The set temperatures of the gas path 22 and the first reaction gas nozzle 23 are higher than the condensation temperature of acrylic acid. Thereby, the acrylic acid can be prevented from being condensed before being ejected. The set temperature of the gas path 22 and the first reaction gas nozzle 23 is preferably about 60 to 80 °C.
於第1反應氣體噴嘴23之底部之兩側設置有遮蔽構件24。遮蔽構件24係形成為沿第1輥電極11之周方向的圓弧狀之剖面,且成為沿處理寬度方向以與輥電極11大致相同之長度延伸之彎曲板狀。遮蔽構件24較第1反應氣體噴嘴23更向第1輥電極11之周方向延伸出。於圖1中,左側之遮蔽構件24之左端部開放。於圖1中,右側之遮蔽構件24之右端部與下述噴嘴34抵接或接近。 A shielding member 24 is provided on both sides of the bottom of the first reaction gas nozzle 23. The shielding member 24 is formed in an arcuate cross section along the circumferential direction of the first roller electrode 11, and has a curved plate shape extending in substantially the same length as the roller electrode 11 in the processing width direction. The shielding member 24 extends in the circumferential direction of the first roller electrode 11 from the first reaction gas nozzle 23 . In Fig. 1, the left end portion of the shielding member 24 on the left side is open. In FIG. 1, the right end portion of the shielding member 24 on the right side abuts or approaches the nozzle 34 described below.
於第1反應氣體噴嘴23與第1輥電極11之間形成有第1噴附空間25。第1噴附空間25成為沿第1輥電極11之上側之周面的剖面圓弧狀之空間。藉由遮蔽構件24,而使第1噴附空間25較第1反應氣體噴嘴23更向第1輥電極11之周方向之兩側延長。於圖1中,第1噴附空間25之左側之端部與輥電極11之左側(與輥電極12側相反側)之外部空間相連。於圖1中,第1噴附空間25之右側之端部經由下述噴嘴34與輥電極11之間的間隙而與間隙14相連。 A first spray space 25 is formed between the first reaction gas nozzle 23 and the first roller electrode 11. The first spray space 25 is a space having a circular arc shape along the circumferential surface of the upper side of the first roller electrode 11. By the shielding member 24, the first injection space 25 is extended toward both sides in the circumferential direction of the first roller electrode 11 from the first reaction gas nozzle 23. In Fig. 1, the left end portion of the first spray space 25 is connected to the outer space of the left side (the side opposite to the roll electrode 12 side) of the roller electrode 11. In FIG. 1, the end portion on the right side of the first spray space 25 is connected to the gap 14 via a gap between the nozzle 34 and the roller electrode 11 described below.
第1放電氣體供給機構30包括第1放電氣體供給源31及第1放電氣體噴嘴33、34。於氣體供給源31中儲存有氬(Ar)作為第1放電生成氣體。 The first discharge gas supply mechanism 30 includes a first discharge gas supply source 31 and first discharge gas nozzles 33 and 34. Argon (Ar) is stored in the gas supply source 31 as the first discharge generating gas.
來自氣體供給源31之氣體路32連接於第1放電氣體噴嘴33、34。第1放電氣體噴嘴33、34隔著間隙14而上下地形 成一對。下側之第1放電氣體噴嘴33配置於PMMA膜9之折回部分9a之內部。上側之第1放電氣體噴嘴34配置於較間隙14更上側之輥電極11、12間。該等第1放電氣體噴嘴33、34於處理寬度方向上較長地延伸,且與該延伸方向正交之剖面朝向彼此之對向側且逐漸變細。各第1放電氣體噴嘴33、34之前端之噴出口面向間隙14。來自氣體供給源31之氬氣於藉由第1放電氣體噴嘴33、34內之整流部(省略圖示)而於處理寬度方向上均一化後,自第1放電氣體噴嘴33、34之噴出口向間隙14噴出。該噴出氣流成為均一地分佈於處理寬度方向之氣流。 The gas path 32 from the gas supply source 31 is connected to the first discharge gas nozzles 33 and 34. The first discharge gas nozzles 33 and 34 are vertically moved up and down via the gap 14 In a pair. The lower first discharge gas nozzle 33 is disposed inside the folded-back portion 9a of the PMMA film 9. The upper first discharge gas nozzle 34 is disposed between the roller electrodes 11 and 12 on the upper side of the gap 14. The first discharge gas nozzles 33 and 34 extend long in the processing width direction, and the cross sections orthogonal to the extending direction are tapered toward the opposite sides of each other. The discharge port at the front end of each of the first discharge gas nozzles 33, 34 faces the gap 14. The argon gas from the gas supply source 31 is uniformed in the processing width direction by the rectifying portion (not shown) in the first discharge gas nozzles 33 and 34, and is discharged from the first discharge gas nozzles 33 and 34. It is ejected to the gap 14. The jet stream is a gas stream uniformly distributed in the width direction of the treatment.
於第1放電氣體噴嘴33、34內,設置有未圖示之調溫路。水等調溫媒體通過第1放電氣體噴嘴33、34內之上述調溫路。藉此,可對第1放電氣體噴嘴33、34進行調溫,甚至可調節氬氣(第1放電氣體)之噴出溫度。第1放電氣體噴嘴33、34之設定溫度較佳為25℃~45℃左右。 A temperature control path (not shown) is provided in the first discharge gas nozzles 33 and 34. The temperature control medium such as water passes through the temperature adjustment path in the first discharge gas nozzles 33, 34. Thereby, the first discharge gas nozzles 33 and 34 can be tempered, and the discharge temperature of the argon gas (first discharge gas) can be adjusted. The set temperatures of the first discharge gas nozzles 33 and 34 are preferably about 25 to 45 °C.
第2反應氣體供給機構40包括第2反應氣體之供給源41及第2反應氣體噴嘴43。第2反應氣體包含與第1反應氣體相同之氣體。即,第2反應氣體含有聚合性單體及載氣。作為聚合性單體係使用丙烯酸(AA)。作為載氣係使用氮(N2)。第2反應氣體包含丙烯酸與氮之混合氣體。 The second reaction gas supply mechanism 40 includes a supply source 41 of the second reaction gas and a second reaction gas nozzle 43. The second reaction gas contains the same gas as the first reaction gas. That is, the second reaction gas contains a polymerizable monomer and a carrier gas. Acrylic acid (AA) is used as a polymerizable single system. Nitrogen (N 2 ) is used as the carrier gas system. The second reaction gas contains a mixed gas of acrylic acid and nitrogen.
雖省略詳細之圖示,但第2反應氣體供給源41包含氣化器。於氣化器中,液體之丙烯酸於載氣中氣化。氣化既可為起泡方式,亦可為擠出方式。藉由將經氣化之丙烯酸與載氣混合,而生成第2反應氣體。第1反應氣體供給源21與 第2反應氣體供給源41亦可包含共通之丙烯酸供給源。 Although the detailed illustration is omitted, the second reaction gas supply source 41 includes a vaporizer. In the gasifier, the liquid acrylic acid is vaporized in the carrier gas. Gasification can be either foaming or extrusion. The second reaction gas is produced by mixing the vaporized acrylic acid with a carrier gas. The first reaction gas supply source 21 and The second reaction gas supply source 41 may also include a common acrylic acid supply source.
第2反應氣體供給源41經由氣體路42而連接於第2反應氣體噴嘴43。第2反應氣體噴嘴43配置於第2輥電極12之上方。第2反應氣體噴嘴43於處理寬度方向上較長地延伸,且於第2輥電極12之周方向(圖1之左右)上具有某種程度之寬度。於第2反應氣體噴嘴43之下表面設置有噴出口。噴出口以分佈於第2反應氣體噴嘴43之下表面的較廣之範圍(處理寬度方向及輥周方向)之方式形成。第2反應氣體噴嘴43之噴出面(下表面)面向第2輥電極12上之PMMA膜9。來自第2反應氣體供給源41之第2反應氣體被供給至第2反應氣體噴嘴43,並藉由第2反應氣體噴嘴43內之整流部(省略圖示)而均一化,之後,自第2反應氣體噴嘴43之噴出口噴出。第2反應氣體之噴出氣流成為均一地分佈於處理寬度方向之氣流。 The second reaction gas supply source 41 is connected to the second reaction gas nozzle 43 via the gas path 42 . The second reaction gas nozzle 43 is disposed above the second roller electrode 12. The second reaction gas nozzle 43 extends long in the processing width direction and has a certain width in the circumferential direction of the second roller electrode 12 (left and right in FIG. 1). A discharge port is provided on a lower surface of the second reaction gas nozzle 43. The discharge port is formed to be distributed over a wide range (process width direction and roll circumferential direction) of the lower surface of the second reaction gas nozzle 43. The discharge surface (lower surface) of the second reaction gas nozzle 43 faces the PMMA film 9 on the second roller electrode 12. The second reaction gas from the second reaction gas supply source 41 is supplied to the second reaction gas nozzle 43 and is uniformized by a rectifying unit (not shown) in the second reaction gas nozzle 43. Thereafter, the second reaction gas is supplied from the second reaction gas nozzle 43. The discharge port of the reaction gas nozzle 43 is ejected. The discharged gas stream of the second reaction gas is a gas stream uniformly distributed in the processing width direction.
於氣體路42及第2反應氣體噴嘴43中設置有調溫機構(省略圖示)。氣體路42之調溫機構包含電熱帶等。第2反應氣體噴嘴43之調溫機構包含供調溫水通過之調溫路等。氣體路42及第2反應氣體噴嘴43之設定溫度為高於丙烯酸之凝縮溫度之高溫。藉此,可防止丙烯酸於噴出前凝縮。氣體路42及第2反應氣體噴嘴43之設定溫度較佳為60℃~80℃左右。 A temperature adjustment mechanism (not shown) is provided in the gas path 42 and the second reaction gas nozzle 43. The temperature regulating mechanism of the gas path 42 includes a heating belt or the like. The temperature adjustment mechanism of the second reaction gas nozzle 43 includes a temperature adjustment path through which the temperature control water passes. The set temperatures of the gas path 42 and the second reaction gas nozzle 43 are higher than the condensation temperature of acrylic acid. Thereby, the acrylic acid can be prevented from being condensed before being ejected. The set temperature of the gas path 42 and the second reaction gas nozzle 43 is preferably about 60 to 80 °C.
於第2反應氣體噴嘴43之底部設置有遮蔽構件44。遮蔽構件44係形成為沿第2輥電極12之周方向的圓弧狀之剖面,且成為於處理寬度方向上以與輥電極12大致相同之長 度延伸之彎曲板狀。遮蔽構件44較第2反應氣體噴嘴43更向第2輥電極12之周方向延伸出。於圖1中,左側之遮蔽構件44之左端部與第1放電氣體噴嘴34之側部抵接或接近。於圖1中,右側之遮蔽構件44之右端部與下述噴嘴54抵接或接近。 A shielding member 44 is provided at the bottom of the second reaction gas nozzle 43. The shielding member 44 is formed in an arcuate cross section along the circumferential direction of the second roller electrode 12, and is substantially the same length as the roller electrode 12 in the processing width direction. The curved plate is extended. The shielding member 44 extends further in the circumferential direction of the second roller electrode 12 than the second reaction gas nozzle 43. In FIG. 1, the left end portion of the shield member 44 on the left side abuts or approaches the side portion of the first discharge gas nozzle 34. In FIG. 1, the right end portion of the shielding member 44 on the right side abuts or approaches the nozzle 54 described below.
於遮蔽構件44與第2輥電極12之間形成有第2噴附空間45。第2噴附空間45成為沿第2輥電極12之上側之周面之剖面圓弧狀之空間。藉由遮蔽構件44,而使第2噴附空間45較第2反應氣體噴嘴43更向第2輥電極12之周方向之兩側延長。於圖1中,第2噴附空間45之左側之端部經由第1放電氣體噴嘴34與輥電極12之間的間隙,而與第1放電空間14相連。於圖1中,第2噴附空間45之右側之端部經由下述噴嘴54與輥電極12之間的間隙而與間隙15相連。 A second spray space 45 is formed between the shield member 44 and the second roller electrode 12. The second injection space 45 is a space having an arcuate cross section along the circumferential surface of the upper side of the second roller electrode 12. By the shielding member 44, the second injection space 45 is extended toward both sides in the circumferential direction of the second roller electrode 12 from the second reaction gas nozzle 43. In FIG. 1, the end portion on the left side of the second spray space 45 is connected to the first discharge space 14 via a gap between the first discharge gas nozzle 34 and the roller electrode 12. In FIG. 1, the end portion on the right side of the second spray space 45 is connected to the gap 15 via a gap between the nozzle 54 and the roller electrode 12 described below.
第2放電氣體供給機構50包括第2放電氣體供給源51及第2放電氣體噴嘴53、54。於第2放電氣體供給源51中儲存有氬(Ar)作為第2放電生成氣體。第1放電氣體供給源31與第2放電氣體供給源51亦可包含共通之氬氣供給源。 The second discharge gas supply mechanism 50 includes a second discharge gas supply source 51 and second discharge gas nozzles 53 and 54. Argon (Ar) is stored as the second discharge generating gas in the second discharge gas supply source 51. The first discharge gas supply source 31 and the second discharge gas supply source 51 may also include a common argon gas supply source.
來自氣體供給源51之氣體路52連接於第2放電氣體噴嘴53、54。第2放電氣體噴嘴53、54隔著間隙15而上下地形成一對。下側之第2放電氣體噴嘴53配置於PMMA膜9之折回部分9b之內部。上側之第2放電氣體噴嘴54配置於較間隙15更上側之輥電極11、12間。該等第2放電氣體噴嘴53、54於處理寬度方向上較長地延伸,且與該延伸方向正交之剖面朝向彼此之對向側且逐漸變細。各第2放電氣體 噴嘴53、54之前端之噴出口面向間隙15。來自氣體供給源51之氬氣於藉由第2放電氣體噴嘴53、54內之整流部(省略圖示)而於處理寬度方向上均一化後,自第2放電氣體噴嘴53、54之噴出口向間隙15噴出。該噴出氣流成為均一地分佈於處理寬度方向之氣流。 The gas path 52 from the gas supply source 51 is connected to the second discharge gas nozzles 53, 54. The second discharge gas nozzles 53 and 54 are vertically formed in a pair with a gap 15 interposed therebetween. The lower second discharge gas nozzle 53 is disposed inside the folded-back portion 9b of the PMMA film 9. The upper second discharge gas nozzle 54 is disposed between the roller electrodes 11 and 12 on the upper side of the gap 15. The second discharge gas nozzles 53 and 54 extend long in the processing width direction, and the cross sections orthogonal to the extending direction are tapered toward the opposite sides of each other. Each second discharge gas The discharge ports at the front ends of the nozzles 53, 54 face the gap 15. The argon gas from the gas supply source 51 is uniformed in the processing width direction by the rectifying portion (not shown) in the second discharge gas nozzles 53, 54, and is discharged from the second discharge gas nozzles 53, 54. It is ejected to the gap 15. The jet stream is a gas stream uniformly distributed in the width direction of the treatment.
於第2放電氣體噴嘴53、54內,設置有未圖示之調溫路。水等調溫媒體通過第2放電氣體噴嘴53、54內之上述調溫路。藉此,可對第2放電氣體噴嘴53、54進行調溫,甚至可調節氬氣(第2放電氣體)之噴出溫度。第2放電氣體噴嘴53、54之設定溫度較佳為25℃~45℃左右。 A temperature control path (not shown) is provided in the second discharge gas nozzles 53, 54. The temperature control medium such as water passes through the temperature adjustment path in the second discharge gas nozzles 53, 54. Thereby, the second discharge gas nozzles 53, 54 can be tempered, and the discharge temperature of the argon gas (second discharge gas) can be adjusted. The set temperature of the second discharge gas nozzles 53, 54 is preferably about 25 ° C to 45 ° C.
關於藉由上述構成之膜表面處理裝置1而對PMMA膜9進行表面處理之方法、甚至是製造偏光板之方法進行說明。 A method of surface-treating the PMMA film 9 by the film surface treatment apparatus 1 configured as described above, or a method of manufacturing a polarizing plate will be described.
將連續片狀之PMMA膜9纏繞於輥電極11~13及導輥16、17上。 The continuous sheet-shaped PMMA film 9 is wound around the roll electrodes 11 to 13 and the guide rolls 16, 17.
使輥電極11~13向圖1中之順時針方向旋轉,將PMMA膜9按照第1輥電極11、第2輥電極12、第3輥電極13之順序向圖1中之大致右方向搬送。搬送速度較佳為1 m/min~30 m/min左右。 The roller electrodes 11 to 13 are rotated clockwise in FIG. 1, and the PMMA film 9 is conveyed in the substantially right direction in FIG. 1 in the order of the first roller electrode 11, the second roller electrode 12, and the third roller electrode 13. The transport speed is preferably from about 1 m/min to about 30 m/min.
於第1反應氣體供給機構20中,使丙烯酸(AA)於載氣(N2)中氣化而生成第1反應氣體(AA+N2)。第1反應氣體中之丙烯酸之體積濃度較佳為2%~8%。將該第1反應氣體自反應氣體噴嘴23噴出至第1噴附空間25。使第1反應氣體接 觸第1噴附空間25內之PMMA膜9之表面。藉此,第1反應氣體中之丙烯酸單體凝縮並附著於PMMA膜9上,從而,於PMMA膜9之表面形成包含丙烯酸單體之第1凝縮層。 In the first reaction gas supply unit 20, acrylic acid (AA) is vaporized in a carrier gas (N 2 ) to generate a first reaction gas (AA+N 2 ). The volume concentration of acrylic acid in the first reaction gas is preferably from 2% to 8%. This first reaction gas is discharged from the reaction gas nozzle 23 to the first spray space 25. The first reaction gas is brought into contact with the surface of the PMMA film 9 in the first spray space 25. Thereby, the acrylic monomer in the first reaction gas is condensed and adhered to the PMMA film 9, and a first condensed layer containing an acrylic monomer is formed on the surface of the PMMA film 9.
隨著第1輥電極11之旋轉,PMMA膜9中之經過上述第1接觸步驟之部分向間隙14即第1放電空間14搬送。於第1放電氣體供給機構30中,將氬作為第1放電氣體自第1放電氣體噴嘴33、34噴出至第1放電空間14。可自上下兩個第1放電氣體噴嘴33、34噴出氬,亦可僅自1個第1放電氣體噴嘴33或34噴出氬。較佳為,自下側之第1放電氣體噴嘴33噴出氬。同時,將電力供給至輥電極12,於第1放電空間14內生成大氣壓附近之放電,從而使氬(第1放電氣體)電漿化。使該氬電漿接觸第1放電空間14內之PMMA膜9之表面。藉此,上述第1凝縮層之丙烯酸單體電漿聚合,從而於PMMA膜9之表面形成包含聚丙烯酸之第1電漿聚合膜。認為藉由使用氬作為放電氣體而可提高電漿密度,且可提高上述第1電漿聚合膜之聚合度。PMMA膜9藉由導輥16而折回,藉此,於第1放電空間14內往復,並由第1放電氣體供給機構30進行2次處理。 As the first roller electrode 11 rotates, the portion of the PMMA film 9 that has passed through the first contact step is transported to the first discharge space 14 which is the gap 14. In the first discharge gas supply mechanism 30, argon is discharged as the first discharge gas from the first discharge gas nozzles 33 and 34 to the first discharge space 14. Argon may be ejected from the first and second first discharge gas nozzles 33 and 34, or argon may be ejected from only one of the first discharge gas nozzles 33 or 34. Preferably, argon is ejected from the lower first discharge gas nozzle 33. At the same time, electric power is supplied to the roller electrode 12, and a discharge in the vicinity of the atmospheric pressure is generated in the first discharge space 14, thereby argonizing the argon (first discharge gas). The argon plasma is brought into contact with the surface of the PMMA film 9 in the first discharge space 14. Thereby, the acrylic monomer of the first condensation layer is plasma-polymerized to form a first plasma polymerization film containing polyacrylic acid on the surface of the PMMA film 9. It is considered that the plasma density can be increased by using argon as a discharge gas, and the degree of polymerization of the first plasma polymerization film can be improved. The PMMA film 9 is folded back by the guide roller 16, whereby it reciprocates in the first discharge space 14, and is processed twice by the first discharge gas supply mechanism 30.
其後,PMMA膜9中之經過第1照射步驟之部分隨著第2輥電極12向第2噴附空間45搬送。於第2反應氣體供給機構40中,使丙烯酸(AA)於載氣(N2)中氣化而生成第2反應氣體(AA+N2)。第2反應氣體中之丙烯酸之體積濃度較佳為 2%~8%。第2反應氣體之丙烯酸濃度可與第1反應氣體之丙烯酸濃度相同,亦可高於第1反應氣體之丙烯酸濃度,亦可低於第1反應氣體之丙烯酸濃度。將該第2反應氣體自第2反應氣體噴嘴43噴出至第2噴附空間45。使第2反應氣體接觸第2噴附空間45內之PMMA膜9之表面。該第2反應氣體中之丙烯酸單體凝縮並附著於PMMA膜9上,從而於上述第1電漿聚合膜上進而形成包含丙烯酸單體之第2凝縮層。 Thereafter, the portion of the PMMA film 9 that has passed through the first irradiation step is transported to the second spray space 45 along with the second roller electrode 12. In the second reaction gas supply mechanism 40, acrylic acid (AA) is vaporized in the carrier gas (N 2 ) to generate a second reaction gas (AA+N 2 ). The volume concentration of acrylic acid in the second reaction gas is preferably from 2% to 8%. The acrylic acid concentration of the second reaction gas may be the same as the acrylic acid concentration of the first reaction gas, or may be higher than the acrylic acid concentration of the first reaction gas, or may be lower than the acrylic acid concentration of the first reaction gas. This second reaction gas is discharged from the second reaction gas nozzle 43 to the second injection space 45. The second reaction gas is brought into contact with the surface of the PMMA film 9 in the second spray space 45. The acrylic monomer in the second reaction gas is condensed and adhered to the PMMA film 9, and a second condensed layer containing an acrylic monomer is further formed on the first plasma polymerization film.
隨著第2輥電極12之旋轉,PMMA膜9中之經過上述第2接觸步驟之部分向間隙15即第2放電空間15搬送。於第2放電氣體供給機構50中,將氬作為第2放電氣體自第2放電氣體噴嘴53、54噴出至第2放電空間15。可自上下兩個第2放電氣體噴嘴53、54噴出氬,亦可僅自1個第2放電氣體噴嘴53或54噴出氬。較佳為,自下側之第2放電氣體噴嘴53噴出氬。於第2放電空間15內,藉由向輥電極12之電力供給而生成大氣壓附近之放電,從而使氬(第2放電氣體)電漿化。使該氬電漿接觸第2放電空間15內之PMMA膜9之表面。藉此,進一步提高上述第1電漿聚合膜之聚合度,並且使上述第2凝縮層之丙烯酸單體電漿聚合,從而於上述第1電漿聚合膜上進而積層形成包含聚丙烯酸之第2電漿聚合膜。藉由上述第1、第2電漿聚合膜而構成接著性促進層。第1電漿聚合膜不僅藉由第1照射步驟促進聚合而且亦藉由第2照射步驟促進聚合,故聚合度高於第2電漿聚合 膜。認為可藉由使用氬作為第2照射步驟之放電氣體而提高第2放電空間15內之電漿密度,且提高上述第1、第2電漿聚合膜之聚合度。PMMA膜9藉由導輥16而折回,藉此,於第2放電空間15內往復,並藉由第2放電氣體供給機構50而進行2次處理。於第2放電空間內往復後之PMMA膜9隨著第3輥電極13搬送,並自裝置1搬出。 As the second roller electrode 12 rotates, the portion of the PMMA film 9 that has passed through the second contact step is transported to the second discharge space 15 which is the gap 15. In the second discharge gas supply mechanism 50, argon is discharged as a second discharge gas from the second discharge gas nozzles 53 and 54 to the second discharge space 15. Argon may be ejected from the upper and lower second discharge gas nozzles 53, 54 or may be ejected from only one of the second discharge gas nozzles 53 or 54. Preferably, argon is ejected from the lower second discharge gas nozzle 53. In the second discharge space 15, a discharge near the atmospheric pressure is generated by the supply of electric power to the roller electrode 12, and argon (second discharge gas) is plasma-formed. The argon plasma is brought into contact with the surface of the PMMA film 9 in the second discharge space 15. Thereby, the polymerization degree of the first plasma polymerization film is further increased, and the acrylic monomer of the second condensation layer is plasma-polymerized to form a second layer containing polyacrylic acid on the first plasma polymerization film. Plasma polymer film. The adhesion promoting layer is formed by the first and second plasma polymerization films. The first plasma polymerization film not only promotes polymerization by the first irradiation step but also promotes polymerization by the second irradiation step, so the polymerization degree is higher than that of the second plasma polymerization. membrane. It is considered that the plasma density in the second discharge space 15 can be increased by using argon as the discharge gas in the second irradiation step, and the degree of polymerization of the first and second plasma polymerization films can be improved. The PMMA film 9 is folded back by the guide roller 16, thereby reciprocating in the second discharge space 15, and is processed twice by the second discharge gas supply mechanism 50. The PMMA film 9 reciprocated in the second discharge space is carried along the third roller electrode 13 and carried out from the apparatus 1.
使上述表面處理後之PMMA膜9經由PVA系接著劑而與PVA膜接著,製作偏光板。藉由在接著之前進行上述表面處理,可提高難接著性之PMMA膜9與PVA接著劑之接著強度,進而可充分地提高將PMMA膜9或偏光板暴露於高溫且高濕度環境下之情形時的接著耐久性。特別是可藉由使用丙烯酸作為反應成分之聚合性單體,並使用氬作為放電氣體,而確實地提高上述接著強度甚至接著耐久性。關於接著耐久性,若將PMMA膜暴露於高溫且高濕度環境下,則較暴露之前反而更可提高接著強度(參照下述實施例1~4)。藉此,可防止偏光板之剝離,從而可提高品質。 The surface-treated PMMA film 9 was then passed through a PVA-based adhesive to a PVA film to prepare a polarizing plate. By performing the above surface treatment before the subsequent step, the adhesion strength of the PMMA film 9 and the PVA adhesive which are difficult to adhere can be improved, and the PMMA film 9 or the polarizing plate can be sufficiently improved when exposed to a high temperature and high humidity environment. The durability of the joint. In particular, by using a polymerizable monomer using acrylic acid as a reaction component and using argon as a discharge gas, the above-mentioned bonding strength and even durability can be surely improved. Regarding the durability, if the PMMA film is exposed to a high-temperature and high-humidity environment, the adhesion strength can be increased more than before the exposure (see Examples 1 to 4 below). Thereby, peeling of a polarizing plate can be prevented, and quality can be improved.
本發明並不限定於上述實施形態,可於不脫離其主旨之範圍內進行各種改變。 The present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit and scope of the invention.
例如,第1、第2反應氣體之載氣並不限定於氮(N2),亦可為氬(Ar)。上述載氣亦可為與第1、第2放電生成氣體相同成分。若如此,則即便載氣(Ar)流入至放電空間14、15內,亦可防止放電狀態改變,從而可維持穩定之放電。進而,上述載氣亦可為氦、氖等其他稀有氣體。 For example, the carrier gas of the first and second reaction gases is not limited to nitrogen (N 2 ), and may be argon (Ar). The carrier gas may be the same component as the first and second discharge generating gases. In this case, even if the carrier gas (Ar) flows into the discharge spaces 14 and 15, the discharge state can be prevented from changing, and stable discharge can be maintained. Further, the carrier gas may be other rare gases such as helium or neon.
亦可同時進行第1接觸步驟與第1照射步驟。亦可省略氣 體噴嘴23,而將包含丙烯酸與氬之第1反應氣體自氣體噴嘴33、34噴出至第1放電空間14。該氬兼作第1反應氣體之載氣與第1放電生成氣體。 The first contact step and the first irradiation step can also be performed simultaneously. Can also omit gas The body nozzle 23 discharges the first reaction gas containing acrylic acid and argon from the gas nozzles 33 and 34 to the first discharge space 14. This argon also serves as a carrier gas for the first reaction gas and a first discharge generating gas.
亦可同時進行第2接觸步驟與第2照射步驟。亦可省略氣體噴嘴43,而將包含丙烯酸與氬之第2反應氣體自氣體噴嘴53、54噴出至第2放電空間15。該氬兼作第2反應氣體之載氣與第2放電生成氣體。 The second contact step and the second irradiation step can also be performed simultaneously. The gas nozzle 43 may be omitted, and the second reaction gas containing acrylic acid and argon may be ejected from the gas nozzles 53, 54 to the second discharge space 15. This argon also serves as a carrier gas for the second reaction gas and a second discharge generation gas.
於偏光板之製造步驟中,亦可將PMMA膜暴露於高溫且高濕度環境下。藉此,可提高PMMA膜之接著耐久性。 In the manufacturing steps of the polarizing plate, the PMMA film can also be exposed to a high temperature and high humidity environment. Thereby, the adhesion durability of the PMMA film can be improved.
亦可排列4個以上之輥電極,並進行3次以上之含有丙烯酸之反應氣體之噴附及氬電漿照射。於該情形時,於連續2次之含有丙烯酸之反應氣體噴附及氬電漿照射中,先行之含有丙烯酸之反應氣體噴附為「第1接觸步驟」,先行之氬電漿照射為「第1照射步驟」,之後進行之含有丙烯酸之反應氣體噴附為「第2接觸步驟」,之後進行之氬電漿照射為「第2照射步驟」。 It is also possible to arrange four or more roller electrodes, and perform three or more injections of a reaction gas containing acrylic acid and argon plasma irradiation. In this case, in the case of the reaction gas spray containing acryl and the argon plasma irradiation for two consecutive times, the first reaction gas containing acrylic acid is sprayed as the "first contact step", and the first argon plasma irradiation is "the first In the "irradiation step", the reaction gas containing acrylic acid is then sprayed as "second contact step", and the subsequent argon plasma irradiation is "second irradiation step".
以下對實施例進行說明,但本發明並不限定於以下實施例。 The examples are described below, but the present invention is not limited to the following examples.
使用光學用膜(OP-PMMA)作為PMMA膜9。膜9之寬度為320 mm。 An optical film (OP-PMMA) was used as the PMMA film 9. The width of the film 9 is 320 mm.
作為預處理,將N2及O2之混合氣體電漿化並照射至上述PMMA膜9上,洗淨上述膜9之表面(有機雜質之去除)。 As a pretreatment, a mixed gas of N 2 and O 2 is plasma-treated and irradiated onto the PMMA film 9 to wash the surface of the film 9 (removal of organic impurities).
其次,使用與圖1之表面處理裝置1之構造實質上相同之 裝置,對上述PMMA膜9依序進行第1接觸步驟、第1照射步驟、第2接觸步驟、第2照射步驟。表面處理裝置1之尺寸構成及處理條件如下。 Next, the configuration is substantially the same as that of the surface treatment apparatus 1 of FIG. In the apparatus, the first contact step, the first irradiation step, the second contact step, and the second irradiation step are sequentially performed on the PMMA film 9. The dimensional configuration and processing conditions of the surface treatment apparatus 1 are as follows.
輥電極11、12、13之處理寬度方向之軸長:390 mm輥電極11、12、13之直徑:310 mm對於輥電極12之供給電力:250 W(將直流電壓120 V×直流電流2.1 A進行高頻轉換)供給頻率:50 kHz輥電極11、12間及輥電極12、13間之施加電壓:Vpp=6.5 kV PMMA膜9之搬送速度:20 m/min PMMA膜9之設定溫度:40℃第1反應氣體(AA+N2)之噴出溫度:75℃第1反應氣體(AA+N2)之流量:30 slm第1反應氣體中之丙烯酸之體積濃度:7.8%來自第1放電氣體噴嘴33之氬流量:15 slm來自第1放電氣體噴嘴34之氬流量:0 slm第2反應氣體(AA+N2)之噴出溫度:75℃第2反應氣體(AA+N2)之流量:30 slm第2反應氣體中之丙烯酸之體積濃度:7.8%來自第2放電氣體噴嘴53之氬流量:15 slm來自第2放電氣體噴嘴54之氬流量:0 slm The axial length of the roller electrodes 11, 12, 13 in the processing width direction: 390 mm The diameter of the roller electrodes 11, 12, 13: 310 mm The power supplied to the roller electrode 12: 250 W (DC voltage 120 V × DC current 2.1 A) High-frequency conversion) Supply frequency: 50 kHz between the roller electrodes 11, 12 and between the roller electrodes 12, 13: Vpp = 6.5 kV PMMA film 9 transport speed: 20 m / min PMMA film 9 set temperature: 40 °C discharge temperature of first reaction gas (AA+N 2 ): 75 ° C Flow rate of first reaction gas (AA+N 2 ): 30 slm Volume concentration of acrylic acid in the first reaction gas: 7.8% from the first discharge gas Argon flow rate of the nozzle 33: 15 slm Argon flow rate from the first discharge gas nozzle 34: 0 slm Second reaction gas (AA+N 2 ) ejection temperature: 75 ° C Flow rate of the second reaction gas (AA + N 2 ): Volume concentration of acrylic acid in the 30 slm second reaction gas: 7.8% Argon flow rate from the second discharge gas nozzle 53: 15 slm Argon flow rate from the second discharge gas nozzle 54: 0 slm
於表面處理後之PMMA膜9之被處理面上塗佈PVA系接著劑,並使之與PVA膜貼合。作為PVA系接著劑,使用將(A) 聚合度500之PVA 5 wt%水溶液與(B)羧甲基纖維素鈉2 wt%水溶液混合而成之水溶液。(A)及(B)之混合比設為(A):(B)=20:1。接著劑之乾燥條件設為80℃、5分鐘。 A PVA-based adhesive was applied to the surface to be treated of the PMMA film 9 after the surface treatment, and bonded to the PVA film. As a PVA-based adhesive, use (A) An aqueous solution of a PVA 5 wt% aqueous solution having a degree of polymerization of 500 and (B) a sodium carboxymethylcellulose 2 wt% aqueous solution. The mixing ratio of (A) and (B) is set to (A): (B) = 20:1. The drying conditions of the subsequent agent were set to 80 ° C for 5 minutes.
另外,對TAC膜噴附丙烯酸,且照射N2電漿。藉由與上述相同之PVA系接著劑而使該TAC膜貼合於PVA膜之相反側之面。藉此,製作複數個3層構造之偏光板樣本。偏光板樣本之寬度設為25 mm。 Further, acrylic acid was sprayed on the TAC film, and N 2 plasma was irradiated. The TAC film was bonded to the opposite side of the PVA film by the same PVA-based adhesive as described above. Thereby, a plurality of polarized plate samples having a three-layer structure were produced. The width of the polarizer sample is set to 25 mm.
於上述PVA系接著劑硬化後,對於未實施下述濕熱處理之偏光板樣本,測定PMMA膜9與PVA膜之接著強度(稱為「初期接著強度」)。測定方法係依據浮動輥法(JIS K6854)。結果為,平均為2.9 N/inch。 After the PVA-based adhesive was cured, the adhesion strength of the PMMA film 9 and the PVA film (referred to as "initial adhesion strength") was measured for the polarizing plate sample which was not subjected to the wet heat treatment described below. The measurement method is based on the floating roll method (JIS K6854). As a result, the average is 2.9 N/inch.
對於剩餘之偏光板樣本,於PVA接著劑硬化後,進行濕熱處理。將濕熱處理槽之內部設為60℃、95%RH之高溫高濕度環境,使偏光板樣本於該濕熱處理槽內留置1小時。其後,自濕熱處理槽中取出偏光板樣本,於室溫下冷卻3分鐘。然後,藉由與上述初期接著強度相同之浮動輥法(JIS K6854)而測定PMMA膜9與PVA膜之接著強度(稱為「耐久接著強度」)。結果為,於8.4 N/inch下材料斷裂。因此,將PMMA膜暴露於濕熱環境下接著強度反而變高。 For the remaining polarizer samples, after the PVA adhesive was hardened, a wet heat treatment was performed. The inside of the wet heat treatment tank was set to a high temperature and high humidity environment of 60 ° C and 95% RH, and the polarizing plate sample was left in the wet heat treatment tank for 1 hour. Thereafter, the polarizing plate sample was taken out from the wet heat treatment tank and cooled at room temperature for 3 minutes. Then, the bonding strength (referred to as "durable bonding strength") of the PMMA film 9 and the PVA film was measured by a floating roll method (JIS K6854) having the same initial adhesion strength as described above. As a result, the material broke at 8.4 N/inch. Therefore, the PMMA film is exposed to a hot and humid environment and the strength is instead increased.
再者,於實施例1中,將PMMA膜9之表面處理、偏光板樣本之製作、及評價(初期接著強度測定、耐久接著強度測定)全部於同一天中進行。 Further, in Example 1, the surface treatment of the PMMA film 9, the preparation of the polarizing plate sample, and the evaluation (initial strength measurement and durability bonding strength measurement) were all performed on the same day.
於實施例2中,將第1反應氣體中之丙烯酸濃度設為5.8%,且將第2反應氣體中之丙烯酸濃度設為5.8%。除此以外之條件係與實施例1相同。表面處理後之偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序均與實施例1相同。初期接著強度係平均為1.8 N/inch。於耐久接著強度之測定中,於8.4 N/inch下材料斷裂。 In Example 2, the acrylic acid concentration in the first reaction gas was 5.8%, and the acrylic acid concentration in the second reaction gas was 5.8%. The other conditions are the same as in the first embodiment. The procedure for preparing the polarizing plate sample after the surface treatment, and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 1.8 N/inch. The material broke at 8.4 N/inch in the measurement of durable bond strength.
於實施例3中,將PMMA膜9之搬送速度設為10 m/min。除此以外之條件係與實施例2相同。表面處理後之偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序均與實施例1、2相同。初期接著強度係平均為2.9 N/inch。於耐久接著強度之測定中,於8.7 N/inch下材料斷裂。 In Example 3, the transport speed of the PMMA film 9 was set to 10 m/min. The other conditions are the same as in the second embodiment. The procedure for preparing the polarizing plate sample after the surface treatment and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in Examples 1 and 2. The initial strength was 2.9 N/inch on average. The material fractured at 8.7 N/inch in the measurement of durable bond strength.
根據實施例1~實施例3之結果,可確認藉由第1、第2反應氣體中之丙烯酸濃度之設定、或搬送速度之設定可調節初期接著強度。即,可藉由使丙烯酸濃度升高、或延緩搬送速度,而提高初期接著強度。又,關於耐久接著強度,不論丙烯酸濃度及搬送速度如何,均可充分地提高。 According to the results of Examples 1 to 3, it was confirmed that the initial adhesion strength can be adjusted by setting the acrylic acid concentration in the first and second reaction gases or setting the transport speed. That is, the initial adhesion strength can be improved by increasing the concentration of acrylic acid or retarding the conveyance speed. Moreover, the durability adhesive strength can be sufficiently improved regardless of the acrylic acid concentration and the transport speed.
於實施例4中,在與實施例1相同之條件下進行PMMA膜9(OP-PMMA)之表面處理。將表面處理後之PMMA膜9捲成輥狀,並將其於室溫下留置38天。然後,以與實施例1相同之程序製作偏光板樣本,並測定初期接著強度及耐久接 著強度。初期接著強度係平均為2.8 N/inch。於耐久接著強度之測定中,於9.9 N/inch下材料斷裂。 In Example 4, the surface treatment of PMMA film 9 (OP-PMMA) was carried out under the same conditions as in Example 1. The surface-treated PMMA film 9 was wound into a roll and left at room temperature for 38 days. Then, a polarizing plate sample was prepared in the same procedure as in Example 1, and the initial bonding strength and durability were measured. Strength. The initial strength was 2.8 N/inch on average. The material was broken at 9.9 N/inch in the measurement of durable bond strength.
可確認幾乎未產生表面處理後之經時變化。 It was confirmed that the change with time after the surface treatment was hardly produced.
表1中彙總表示實施例1~4之主要之處理條件及評價。 Table 1 summarizes the main processing conditions and evaluations of Examples 1 to 4.
作為比較例1,對於未進行上述表面處理之PMMA膜9(OP-PMMA),製作偏光板樣本,並測定初期接著強度及耐久接著強度。偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序均與實施例1相同。初期接著強度係平均為0.4 N/inch。耐久接著強度係平均為0.5 N/inch。 As Comparative Example 1, a polarizing plate sample was prepared for the PMMA film 9 (OP-PMMA) which was not subjected to the above surface treatment, and the initial adhesion strength and the durability bonding strength were measured. The procedure for preparing the polarizing plate sample and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 0.4 N/inch. The durability strength is an average of 0.5 N/inch.
作為比較例2,於PMMA膜9(OP-PMMA)之表面處理中,省略第2接觸步驟及第2照射步驟,而僅進行第1接觸步驟及第1照射步驟。除此以外之表面處理條件、偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序係與實施例1相同。初期接著強度係平均為1.2 N/inch。耐久接著強度係平均為2.7 N/inch。 In Comparative Example 2, in the surface treatment of the PMMA film 9 (OP-PMMA), the second contact step and the second irradiation step were omitted, and only the first contact step and the first irradiation step were performed. The surface treatment conditions, the preparation procedure of the polarizing plate sample, and the measurement procedure of the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 1.2 N/inch. The durable bond strength averaged 2.7 N/inch.
根據上述實施例及比較例2之結果可確認,藉由反覆進 行丙烯酸噴附及氬電漿照射可提高初期接著強度及耐久接著強度。 According to the results of the above embodiments and Comparative Example 2, it can be confirmed that by repeating Acrylic spray and argon plasma irradiation can improve initial adhesion strength and durability.
作為比較例3,使用氮(N2)作為第1、第2放電生成氣體。除此以外之表面處理條件包含第1、第2放電生成氣體之流量在內係設為與實施例1相同。偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序均與實施例1相同。初期接著強度係平均為1.3 N/inch。耐久接著強度係平均為6.3 N/inch。 As Comparative Example 3, nitrogen (N 2 ) was used as the first and second discharge generating gases. The surface treatment conditions other than the above include the flow rates of the first and second discharge generating gases, and are the same as in the first embodiment. The procedure for preparing the polarizing plate sample and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 1.3 N/inch. The durability strength is 6.3 N/inch on average.
根據上述實施例及比較例3之結果可確認,藉由使用氬作為放電生成氣體可提高初期接著強度及耐久接著強度。 From the results of the above examples and Comparative Example 3, it was confirmed that the initial adhesion strength and the durable bonding strength can be improved by using argon as the discharge generating gas.
於比較例4中,省略比較例3中之第2接觸步驟及第2照射步驟,而僅進行第1接觸步驟及第1照射步驟。除此以外之表面處理條件、偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序係與比較例3相同。初期接著強度係平均為1.2 N/inch。耐久接著強度係平均為1.6 N/inch。 In Comparative Example 4, the second contact step and the second irradiation step in Comparative Example 3 were omitted, and only the first contact step and the first irradiation step were performed. The surface treatment conditions, the procedure for preparing the polarizing plate sample, and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in Comparative Example 3. The initial strength was an average of 1.2 N/inch. The durability strength is an average of 1.6 N/inch.
於以上實施例1~4及比較例1~4中,使用OP-PMMA作為PMMA膜,但於以下比較例5~7中,使用積水化學工業股份有限公司製造之OS-PMMA作為PMMA膜。於比較例5中,對於未進行表面處理之PMMA膜(積水化學工業股份有限公司製造之OS-PMMA),製作偏光板樣本,並測定初期 接著強度及耐久接著強度。偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序係與實施例1相同。初期接著強度係平均為0.4 N/inch。耐久接著強度係平均為0.5 N/inch。 In the above Examples 1 to 4 and Comparative Examples 1 to 4, OP-PMMA was used as the PMMA film. However, in the following Comparative Examples 5 to 7, OS-PMMA manufactured by Sekisui Chemical Co., Ltd. was used as the PMMA film. In Comparative Example 5, a PMMA film (OS-PMMA manufactured by Sekisui Chemical Co., Ltd.) which was not subjected to surface treatment was used to prepare a polarizing plate sample, and the initial measurement was performed. Then strength and durability followed by strength. The procedure for preparing the polarizing plate sample and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 0.4 N/inch. The durability strength is an average of 0.5 N/inch.
於比較例6中,於對PMMA膜(積水化學工業股份有限公司製造之OS-PMMA)之表面處理中,省略第2接觸步驟及第2照射步驟,而僅進行第1接觸步驟及第1照射步驟。除此以外之表面處理條件、偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序係與實施例1相同。初期接著強度係平均為2.7 N/inch。耐久接著強度係平均為4.8 N/inch。 In the surface treatment of the PMMA film (OS-PMMA manufactured by Sekisui Chemical Co., Ltd.), the second contact step and the second irradiation step were omitted, and only the first contact step and the first irradiation were performed. step. The surface treatment conditions, the preparation procedure of the polarizing plate sample, and the measurement procedure of the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 2.7 N/inch. The durable bond strength averaged 4.8 N/inch.
於比較例7中,使用氮(N2)作為比較例6中之第1放電生成氣體。除此以外之處理條件包含第1放電生成氣體之流量在內係設為與比較例6相同。偏光板樣本之製作程序、及初期接著強度及耐久接著強度之測定程序係與實施例1相同。初期接著強度係平均為2.7 N/inch。耐久接著強度係平均為4.8 N/inch。 In Comparative Example 7, nitrogen (N 2 ) was used as the first discharge generating gas in Comparative Example 6. The processing conditions other than the above include the flow rate of the first discharge generating gas as in Comparative Example 6. The procedure for preparing the polarizing plate sample and the measurement procedure for the initial adhesion strength and the durability bonding strength were the same as in the first embodiment. The initial strength was an average of 2.7 N/inch. The durable bond strength averaged 4.8 N/inch.
表2中彙總表示比較例1~7之主要之處理條件及評價。表2之「處理數」這一欄中之「single」係表示僅進行第1接觸步驟及第1照射步驟作為表面處理步驟,「twin」係表示進行第1接觸步驟及第1照射步驟、以及第2接觸步驟及第2照射步驟作為表面處理步驟。 Table 2 summarizes the main processing conditions and evaluations of Comparative Examples 1 to 7. The "single" in the column of "processing number" in Table 2 indicates that only the first contact step and the first irradiation step are performed as the surface treatment step, and "twin" indicates that the first contact step and the first irradiation step are performed, and The second contact step and the second irradiation step serve as a surface treatment step.
本發明可應用於例如平板顯示器(FPD,Flat Panel Display)之偏光板中。 The present invention can be applied to a polarizing plate such as a flat panel display (FPD).
1‧‧‧膜表面處理裝置 1‧‧‧ Film surface treatment device
9‧‧‧被處理膜(PMMA膜) 9‧‧‧Processed film (PMMA film)
10‧‧‧電極構造 10‧‧‧Electrode construction
11‧‧‧第1輥電極 11‧‧‧1st roller electrode
12‧‧‧第2輥電極 12‧‧‧2nd roller electrode
13‧‧‧第3輥電極 13‧‧‧3rd roller electrode
14‧‧‧間隙、第1放電空間 14‧‧‧ gap, first discharge space
15‧‧‧間隙、第2放電空間 15‧‧‧ gap, second discharge space
16‧‧‧導輥 16‧‧‧guide roller
17‧‧‧導輥 17‧‧‧guide roller
20‧‧‧第1反應氣體供給機構 20‧‧‧1st reaction gas supply mechanism
21‧‧‧第1反應氣體供給源 21‧‧‧1st reactive gas supply source
22‧‧‧氣體路 22‧‧‧ gas road
23‧‧‧第1反應氣體噴嘴 23‧‧‧1st reaction gas nozzle
24‧‧‧遮蔽構件 24‧‧‧Shielding members
25‧‧‧第1噴附空間 25‧‧‧1st spray space
30‧‧‧第1放電氣體供給機構 30‧‧‧1st discharge gas supply mechanism
31‧‧‧第1放電氣體供給源 31‧‧‧1st discharge gas supply source
32‧‧‧氣體路 32‧‧‧ gas road
33‧‧‧下側之第1放電氣體噴嘴 33‧‧‧1st discharge gas nozzle on the lower side
34‧‧‧上側之第1放電氣體噴嘴 34‧‧‧1st discharge gas nozzle on the upper side
40‧‧‧第2反應氣體供給機構 40‧‧‧2nd reaction gas supply mechanism
41‧‧‧第2反應氣體供給源 41‧‧‧2nd reactive gas supply source
42‧‧‧氣體路 42‧‧‧ gas road
43‧‧‧第2反應氣體噴嘴 43‧‧‧2nd reaction gas nozzle
44‧‧‧遮蔽構件 44‧‧‧Shielding members
45‧‧‧第2噴附空間 45‧‧‧2nd spray space
50‧‧‧第2放電氣體供給機構 50‧‧‧2nd discharge gas supply mechanism
51‧‧‧第2放電氣體供給源 51‧‧‧2nd discharge gas supply source
52‧‧‧氣體路 52‧‧‧ gas road
53‧‧‧下側之第2放電氣體噴嘴 53‧‧‧2nd discharge gas nozzle on the lower side
54‧‧‧上側之第2放電氣體噴嘴 54‧‧‧Second discharge gas nozzle on the upper side
圖1係表示本發明之一實施形態之表面處理裝置之側視圖。 Fig. 1 is a side view showing a surface treatment apparatus according to an embodiment of the present invention.
圖2係上述表面處理裝置之電極部及噴嘴部之立體圖。 Fig. 2 is a perspective view showing an electrode portion and a nozzle portion of the surface treatment apparatus.
1‧‧‧膜表面處理裝置 1‧‧‧ Film surface treatment device
9‧‧‧被處理膜(PMMA膜) 9‧‧‧Processed film (PMMA film)
9a‧‧‧折回部分 9a‧‧‧Return part
9b‧‧‧折回部分 9b‧‧‧return part
10‧‧‧電極構造 10‧‧‧Electrode construction
11‧‧‧第1輥電極 11‧‧‧1st roller electrode
12‧‧‧第2輥電極 12‧‧‧2nd roller electrode
13‧‧‧第3輥電極 13‧‧‧3rd roller electrode
14‧‧‧間隙、第1放電空間 14‧‧‧ gap, first discharge space
15‧‧‧間隙、第2放電空間 15‧‧‧ gap, second discharge space
16‧‧‧導輥 16‧‧‧guide roller
17‧‧‧導輥 17‧‧‧guide roller
20‧‧‧第1反應氣體供給機構 20‧‧‧1st reaction gas supply mechanism
21‧‧‧第1反應氣體供給源 21‧‧‧1st reactive gas supply source
22‧‧‧氣體路 22‧‧‧ gas road
23‧‧‧第1反應氣體噴嘴 23‧‧‧1st reaction gas nozzle
24‧‧‧遮蔽構件 24‧‧‧Shielding members
25‧‧‧第1噴附空間 25‧‧‧1st spray space
30‧‧‧第1放電氣體供給機構 30‧‧‧1st discharge gas supply mechanism
31‧‧‧第1放電氣體供給源 31‧‧‧1st discharge gas supply source
32‧‧‧氣體路 32‧‧‧ gas road
33‧‧‧下側之第1放電氣體噴嘴 33‧‧‧1st discharge gas nozzle on the lower side
34‧‧‧上側之第1放電氣體噴嘴 34‧‧‧1st discharge gas nozzle on the upper side
40‧‧‧第2反應氣體供給機構 40‧‧‧2nd reaction gas supply mechanism
41‧‧‧第2反應氣體供給源 41‧‧‧2nd reactive gas supply source
42‧‧‧氣體路 42‧‧‧ gas road
43‧‧‧第2反應氣體噴嘴 43‧‧‧2nd reaction gas nozzle
44‧‧‧遮蔽構件 44‧‧‧Shielding members
45‧‧‧第2噴附空間 45‧‧‧2nd spray space
50‧‧‧第2放電氣體供給機構 50‧‧‧2nd discharge gas supply mechanism
51‧‧‧第2放電氣體供給源 51‧‧‧2nd discharge gas supply source
52‧‧‧氣體路 52‧‧‧ gas road
53‧‧‧下側之第2放電氣體噴嘴 53‧‧‧2nd discharge gas nozzle on the lower side
54‧‧‧上側之第2放電氣體噴嘴 54‧‧‧Second discharge gas nozzle on the upper side
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