TWI522400B - Membrane surface treatment method and device - Google Patents

Membrane surface treatment method and device Download PDF

Info

Publication number
TWI522400B
TWI522400B TW101131620A TW101131620A TWI522400B TW I522400 B TWI522400 B TW I522400B TW 101131620 A TW101131620 A TW 101131620A TW 101131620 A TW101131620 A TW 101131620A TW I522400 B TWI522400 B TW I522400B
Authority
TW
Taiwan
Prior art keywords
gas
film
group
evaluation
nozzle
Prior art date
Application number
TW101131620A
Other languages
Chinese (zh)
Other versions
TW201313795A (en
Inventor
Junnosuke Murakami
Yoshinori Nakano
Taira Hasegawa
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Publication of TW201313795A publication Critical patent/TW201313795A/en
Application granted granted Critical
Publication of TWI522400B publication Critical patent/TWI522400B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/16Chemical modification with polymerisable compounds
    • C08J7/18Chemical modification with polymerisable compounds using wave energy or particle radiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B1/105
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Polarising Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)

Description

膜表面處理方法及裝置 Membrane surface treatment method and device

本發明係關於一種對樹脂製之膜進行表面處理之方法及裝置,尤其是關於一種不僅適於使膜的接著性提高,且適於使藉由接著而形成之膜積層體的耐溫水性提高的膜表面處理方法及裝置。 The present invention relates to a method and apparatus for surface treatment of a resin film, and more particularly to an improvement in temperature resistance of a film laminate formed by a film which is not only suitable for improving the adhesion of the film. Membrane surface treatment method and device.

例如,於液晶顯示裝置中搭載有偏光板。偏光板係形成為將偏光膜與保護膜積層而成之膜積層體。一般而言,偏光膜包含含有聚乙烯醇(PVA)作為主成分之樹脂膜(以下稱為「PVA膜」)。保護膜包含含有三乙酸纖維素(TAC)作為主成分之樹脂膜(以下稱為「TAC膜」)。作為接著該等膜之接著劑,係使用聚乙烯醇系或聚醚系等之水系接著劑。PVA膜與上述接著劑之接著性良好,但TAC膜的接著性不佳。因此,專利文獻1、2中,在上述接著步驟之前,於保護膜之表面形成丙烯酸等聚合性單體之薄膜(凝結層),之後照射大氣壓電漿,形成聚丙烯酸等之聚合膜。 For example, a polarizing plate is mounted on a liquid crystal display device. The polarizing plate is formed as a film laminate in which a polarizing film and a protective film are laminated. In general, the polarizing film contains a resin film (hereinafter referred to as "PVA film") containing polyvinyl alcohol (PVA) as a main component. The protective film contains a resin film containing a cellulose triacetate (TAC) as a main component (hereinafter referred to as "TAC film"). A water-based adhesive such as a polyvinyl alcohol-based or polyether-based adhesive is used as an adhesive for the film. The adhesion between the PVA film and the above-mentioned adhesive is good, but the adhesion of the TAC film is not good. Therefore, in Patent Documents 1 and 2, a film (coagulation layer) of a polymerizable monomer such as acrylic is formed on the surface of the protective film before the subsequent step, and then the atmospheric piezoelectric slurry is irradiated to form a polymer film such as polyacrylic acid.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2009-25604號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-25604

[專利文獻2]日本專利特開2010-150372號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-150372

本發明者將使上述大氣壓電漿照射後之TAC膜與PVA膜 接著而成之偏光板浸漬於溫水中,作為對於高溫或高濕度之耐久性評價之替代評價,結果產生褪色(color omission)或剝離(delamination),對於溫水之耐受性(耐溫水性)較低(參照下述比較例1)。尤其可想到若上述聚合膜為聚丙烯酸等水溶性聚合物,則耐溫水性會降低。 The present inventors will make the TAC film and the PVA film after the above-mentioned atmospheric piezoelectric slurry is irradiated. The polarizing plate thus formed is immersed in warm water as an alternative evaluation for durability evaluation of high temperature or high humidity, resulting in color omission or delamination, resistance to warm water (temperature resistance) Lower (refer to Comparative Example 1 below). In particular, it is conceivable that when the above-mentioned polymer film is a water-soluble polymer such as polyacrylic acid, the temperature resistance of water is lowered.

本發明係鑒於上述情況而完成者,其目的在於使得於構成偏光板等膜積層體之樹脂膜的表面處理中,不僅使上述樹脂膜的接著性提高,且使藉由接著而形成之膜積層體對於溫水之耐受性(耐溫水性)提高。 The present invention has been made in view of the above-described circumstances, and it is an object of the present invention to improve not only the adhesion of the resin film but also the film formation formed by the subsequent surface treatment of the resin film constituting the film laminate such as a polarizing plate. The body's tolerance to warm water (temperature resistance) is improved.

為解決上述問題,本發明方法之特徵在於:其係於樹脂製被處理膜之表面上使聚合性單體進行電漿聚合,而於上述表面被覆上述聚合性單體的聚合物之膜的膜表面處理方法,其包括:第1處理步驟,使含有氣化之上述聚合性單體、及可使上述聚合物進行電漿交聯之交聯性添加成分的第1氣體接觸上述被處理膜;及第2處理步驟,於上述第1處理步驟後或與上述第1處理步驟併行地,將放電生成氣體電漿化(包括激發、活化、自由基化、離子化等)並接觸上述被處理膜;且將上述第1氣體中之上述交聯性添加成分相對於上述聚合性單體的含有率調節於特定範圍內。 In order to solve the above problems, the method of the present invention is characterized in that it is a film obtained by plasma-polymerizing a polymerizable monomer on the surface of a resin-treated film, and coating a film of the polymer of the polymerizable monomer on the surface. a surface treatment method comprising: a first treatment step of contacting the first gas containing the vaporized polymerizable monomer and the crosslinkable additive component capable of plasma-crosslinking the polymer; And the second processing step of plasma-dissolving the discharge generating gas (including excitation, activation, radicalization, ionization, etc.) and contacting the treated film after the first processing step or in parallel with the first processing step Further, the content of the crosslinkable additive component in the first gas with respect to the polymerizable monomer is adjusted within a specific range.

藉由第1處理步驟及第2處理步驟,可於被處理膜之表面形成聚合性單體之電漿聚合物之膜。此時,藉由交聯性添 加成分可使上述聚合物交聯化(包括高交聯度化)。而且,上述聚合物之膜成為接著性促進層而可提高被處理膜的接著性,並且藉由上述交聯可提高上述接著性促進層的疏水性,進而可提高接著後之膜積層體的耐溫水性。即便上述聚合物為聚丙烯酸等水溶性聚合物,亦可充分提高疏水性,充分提高耐溫水性。藉由調節交聯性添加成分的含有率,可確實地表現出交聯化作用,且可確保接著性。若上述含有率過小,則無法表現交聯化作用。若上述含有率過大,則接著性降低。 By the first treatment step and the second treatment step, a film of a plasma polymer of a polymerizable monomer can be formed on the surface of the film to be treated. Crosslinking The addition of the components allows crosslinking of the above polymers (including high degree of crosslinking). Further, the film of the polymer is an adhesion promoting layer, and the adhesion of the film to be treated can be improved, and the hydrophobicity of the adhesion promoting layer can be improved by the crosslinking, and the resistance of the film laminate after the film can be improved. Warm water. Even if the above polymer is a water-soluble polymer such as polyacrylic acid, the hydrophobicity can be sufficiently improved, and the temperature resistance can be sufficiently improved. By adjusting the content ratio of the crosslinkable additive component, the cross-linking action can be surely exhibited, and the adhesion can be ensured. If the above content ratio is too small, the crosslinking effect cannot be exhibited. If the content ratio is too large, the adhesion is lowered.

此處,所謂耐溫水性,係指即便將使上述被處理膜與其他膜接著而成之偏光板等膜積層體在一定程度之溫度(例如50℃~80℃)之溫水中浸漬一定程度之時間(例如1 h~5 h),上述膜積層體亦不易產生褪色或剝離的程度。 Here, the term "temperature resistance" means that a film laminate such as a polarizing plate in which the film to be processed is formed next to another film is immersed to a certain degree in temperature (for example, 50 ° C to 80 ° C) in warm water to a certain extent. For the time (for example, 1 h to 5 h), the above-mentioned film laminate is also less likely to cause fading or peeling.

上述交聯性添加成分相對於聚合性單體的含有率較佳為0.5 wt%~10 wt%。藉由將上述含有率設為0.5 wt%以上,可確實地表現使聚合性單體交聯化之作用。藉由將上述含有率設為10 wt%以下,可維持對於接著劑之親和性,可確實地獲得接著強度。 The content of the crosslinkable additive component relative to the polymerizable monomer is preferably from 0.5% by weight to 10% by weight. By setting the content ratio to 0.5% by weight or more, the action of crosslinking the polymerizable monomer can be reliably exhibited. By setting the above content ratio to 10 wt% or less, the affinity for the adhesive can be maintained, and the adhesion strength can be surely obtained.

又,本發明裝置之特徵在於:其係於樹脂製被處理膜之表面上使聚合性單體進行電漿聚合,而於上述表面被覆上述聚合性單體的聚合物之膜的膜表面處理裝置,其包括:生成部,其生成含有上述聚合性單體、及可使上述聚合物進行電漿交聯之交聯性添加成分的第1氣體;第1噴嘴,其將上述第1氣體噴附至上述被處理膜上; 一對電極,其藉由於相互間之間隙內施加電場而生成大氣壓附近之放電;第2噴嘴,其對上述間隙供給放電生成氣體;及搬送機構,其將上述被處理膜以經過面向上述第1噴嘴之第1處理空間後通過上述間隙之方式搬送;且利用上述生成部,將上述第1氣體中之上述交聯性添加成分相對於上述聚合性單體的含有率調節於特定範圍內。 Further, the apparatus of the present invention is characterized in that it is a film surface treatment apparatus which is a plasma-polymerized monomer on a surface of a resin-treated film and which is coated with a polymer film of the above-mentioned polymerizable monomer. The present invention includes a generating unit that generates a first gas containing the polymerizable monomer and a crosslinkable additive component capable of plasma-crosslinking the polymer, and a first nozzle that sorbs the first gas To the above treated film; a pair of electrodes that generate an electric discharge in the vicinity of atmospheric pressure by applying an electric field in a gap between them; a second nozzle that supplies a discharge generating gas to the gap; and a transfer mechanism that passes the processed film to face the first The first processing space of the nozzle is transported by the gap, and the content of the crosslinkable additive component in the first gas with respect to the polymerizable monomer is adjusted within a specific range by the generating unit.

藉由將第1氣體噴附至被處理膜上,可於被處理膜之表面形成聚合性單體及交聯性添加成分之混合凝結層。繼而,藉由電極間之放電,可使上述混合凝結層中之聚合性單體進行電漿聚合,於被處理膜之表面形成聚合性單體之聚合物之膜,並且,藉由上述交聯性添加成分可使上述聚合物交聯化(包括高交聯度化)。而且,上述聚合物之膜成為接著性促進層而可提高被處理膜的接著性,並且藉由上述交聯可提高上述接著性促進層的疏水性,進而可提高接著後之膜積層體的耐溫水性。利用上述生成部調節交聯性添加成分的含有率,藉此可確實地表現交聯化作用,且可確保接著性。上述含有率較佳為0.5 wt%~10 wt%。若上述含有率未達0.5 wt%,則難以表現交聯化作用。若上述含有率超出10 wt%,則例如對於PVA系之接著劑之親和性降低,接著強度劣化。 By spraying the first gas onto the film to be treated, a mixed coagulation layer of a polymerizable monomer and a crosslinkable additive component can be formed on the surface of the film to be treated. Then, by the discharge between the electrodes, the polymerizable monomer in the mixed coagulation layer is subjected to plasma polymerization to form a film of a polymer of a polymerizable monomer on the surface of the film to be treated, and by crosslinking as described above. The sexually added component can crosslink the above polymer (including high degree of crosslinking). Further, the film of the polymer is an adhesion promoting layer, and the adhesion of the film to be treated can be improved, and the hydrophobicity of the adhesion promoting layer can be improved by the crosslinking, and the resistance of the film laminate after the film can be improved. Warm water. By adjusting the content ratio of the crosslinkable additive component by the above-described production unit, the cross-linking action can be reliably expressed, and the adhesion can be ensured. The above content ratio is preferably from 0.5 wt% to 10 wt%. If the above content ratio is less than 0.5% by weight, it is difficult to express cross-linking action. When the content rate exceeds 10% by weight, for example, the affinity for the PVA-based adhesive is lowered, and then the strength is deteriorated.

作為上述接著劑,例如較佳為使用水系接著劑。作為水系接著劑,可列舉:聚乙烯醇系接著劑、聚胺基甲酸酯系接著劑(可為單成分型,亦可為二成分型)、水性胺基甲酸 酯接著劑、丙烯酸系接著劑、多硫化物系接著劑、聚矽氧系接著劑(可為單成分型,亦可為二成分型)、改性聚矽氧系接著劑、環氧改性聚矽氧接著劑、丁基橡膠系接著劑等。 As the above-mentioned adhesive, for example, a water-based adhesive is preferably used. Examples of the water-based adhesive include a polyvinyl alcohol-based adhesive and a polyurethane-based adhesive (which may be a one-component type or a two-component type), and an aqueous urethane. An ester adhesive, an acrylic adhesive, a polysulfide adhesive, a polyoxynium adhesive (which may be a one-component type or a two-component type), a modified polyfluorene-based adhesive, and an epoxy modification A polyxylene adhesive, a butyl rubber-based adhesive, or the like.

本發明中,較佳為於大氣壓附近下進行表面處理。上述電漿化較佳為於大氣壓附近下進行。此處,所謂大氣壓附近,係指1.013×104~50.663×104 Pa之範圍,若考慮壓力調整之容易化或裝置構成之簡便化,則較佳為1.333×104~10.664×104 Pa,更佳為9.331×104~10.397×104 Pa。 In the present invention, it is preferred to carry out surface treatment in the vicinity of atmospheric pressure. The above plasma formation is preferably carried out in the vicinity of atmospheric pressure. Here, the vicinity of the atmospheric pressure means a range of 1.013 × 10 4 to 50.663 × 10 4 Pa, and in consideration of ease of pressure adjustment or simplification of the device configuration, it is preferably 1.333 × 10 4 to 10.664 × 10 4 Pa. More preferably, it is 9.331 × 10 4 ~ 10.397 × 10 4 Pa.

上述被處理膜較佳為難接著性之光學樹脂膜。本發明適合於將難接著性之光學樹脂膜接著於易接著性之光學樹脂膜時,使難接著性之光學樹脂膜的接著性及耐溫水性提高之表面處理。作為上述難接著性之光學樹脂膜之主成分,例如可列舉三乙酸纖維素(TAC)、聚丙烯(PP)、聚乙烯(PE)、環烯烴聚合物(COP)、環烯烴共聚物(COC)、聚對苯二甲酸乙二酯(PET)、聚甲基丙烯酸甲酯(PMMA)、聚醯亞胺(PI)等。上述被處理膜更佳為TAC膜。作為上述易接著性之光學樹脂膜之主成分,例如可列舉聚乙烯醇(PVA)、乙烯-乙酸乙烯酯共聚物(EVA)等。 The film to be treated is preferably an optical resin film which is difficult to bond. The present invention is suitable for a surface treatment in which the adhesion of the optical resin film which is difficult to adhere to the optical resin film which is easy to adhere, and the adhesion and temperature resistance of the optical resin film which is difficult to bond. Examples of the main component of the above-mentioned difficult-to-adhere optical resin film include cellulose triacetate (TAC), polypropylene (PP), polyethylene (PE), cycloolefin polymer (COP), and cyclic olefin copolymer (COC). ), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), polyimine (PI), and the like. The above treated film is more preferably a TAC film. The main component of the above-mentioned easy-to-adhere optical resin film is, for example, polyvinyl alcohol (PVA) or ethylene-vinyl acetate copolymer (EVA).

上述聚合性單體較佳為藉由電漿照射而產生聚合反應之單體。作為上述聚合性單體,可列舉具有不飽和鍵及特定之官能基之單體。特定之官能基較佳為選自羥基、羧基、乙醯基、碳數1~10之酯基、碸基、醛基,尤佳為羧基或羥 基等親水基。 The polymerizable monomer is preferably a monomer which is polymerized by irradiation with a plasma. The polymerizable monomer may, for example, be a monomer having an unsaturated bond and a specific functional group. The specific functional group is preferably selected from the group consisting of a hydroxyl group, a carboxyl group, an ethyl fluorenyl group, an ester group having a carbon number of 1 to 10, a mercapto group, an aldehyde group, and more preferably a carboxyl group or a hydroxyl group. A hydrophilic group such as a base.

作為具有不飽和鍵及羥基之單體,可列舉:乙二醇甲基丙烯酸酯、烯丙醇、甲基丙烯酸羥乙酯等。 Examples of the monomer having an unsaturated bond and a hydroxyl group include ethylene glycol methacrylate, allyl alcohol, and hydroxyethyl methacrylate.

作為具有不飽和鍵及羧基之單體,可列舉:丙烯酸、甲基丙烯酸、伊康酸、順丁烯二酸、2-甲基丙烯醯基丙酸等。 Examples of the monomer having an unsaturated bond and a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and 2-methylpropenylpropylpropionic acid.

作為具有不飽和鍵及乙醯基之單體,可列舉乙酸乙烯酯等。 Examples of the monomer having an unsaturated bond and an acetyl group include vinyl acetate and the like.

作為具有不飽和鍵及酯基之單體,可列舉:丙烯酸甲酯、丙烯酸乙酯、丙烯酸丁酯、丙烯酸第三丁酯、丙烯酸-2-乙基己酯、丙烯酸辛酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸異丙酯、甲基丙烯酸-2-乙酯等。 Examples of the monomer having an unsaturated bond and an ester group include methyl acrylate, ethyl acrylate, butyl acrylate, tributyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, and methacrylic acid. Ester, ethyl methacrylate, butyl methacrylate, tert-butyl methacrylate, isopropyl methacrylate, 2-ethyl methacrylate, and the like.

作為具有不飽和鍵及醛基之單體,可列舉:丙烯醛、丁烯醛等。 Examples of the monomer having an unsaturated bond and an aldehyde group include acrolein and crotonaldehyde.

於上述被處理膜為COP、COC、PP、PE等烯烴系單體聚合膜之情形時,上述聚合性單體亦可為水溶性單體及烯烴系單體。作為水溶性單體,可列舉:乙醛、乙烯醇、丙烯酸(AA)、甲基丙烯酸、苯乙烯磺酸、N,N-二甲胺基丙基丙烯醯胺、N,N-二甲基醯胺等。作為烯烴系單體,除1-戊烯、1-己烯、1-庚烯、1-辛烯、1-環戊烯、1-環己烯、1-環庚烯、1-環辛烯以外,可列舉環戊二烯、二環戊二烯(DCPD)等。 When the film to be treated is an olefin-based monomer polymerization film such as COP, COC, PP or PE, the polymerizable monomer may be a water-soluble monomer or an olefin-based monomer. Examples of the water-soluble monomer include acetaldehyde, vinyl alcohol, acrylic acid (AA), methacrylic acid, styrenesulfonic acid, N,N-dimethylaminopropylpropenylamine, and N,N-dimethyl group. Amidoxime and the like. As the olefin monomer, except 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-cyclopentene, 1-cyclohexene, 1-cycloheptene, 1-cyclooctene Other examples include cyclopentadiene and dicyclopentadiene (DCPD).

上述聚合性單體更佳為進行電漿聚合時與被處理膜之親 和性較高。作為該單體,可列舉上述聚合性單體中具有乙烯性不飽和雙鍵及羧基之單體,具體而言,可列舉丙烯酸(CH2=CHCOOH)、甲基丙烯酸(CH2=C(CH3)COOH)。上述第1氣體之聚合性單體及上述第3氣體之聚合性單體更佳為丙烯酸或甲基丙烯酸,進而較佳為丙烯酸。藉此,於進行電漿聚合時可表現與被處理膜之親和性。因此,可確實地提高被處理膜的接著性以及接著耐久性。 More preferably, the above polymerizable monomer has high affinity with the film to be treated when plasma polymerization is carried out. Examples of the monomer include a monomer having an ethylenically unsaturated double bond and a carboxyl group among the polymerizable monomers, and specific examples thereof include acrylic acid (CH 2 =CHCOOH) and methacrylic acid (CH 2 =C(CH). 3 ) COOH). The polymerizable monomer of the first gas and the polymerizable monomer of the third gas are more preferably acrylic acid or methacrylic acid, and further preferably acrylic acid. Thereby, affinity with the film to be treated can be exhibited when performing plasma polymerization. Therefore, the adhesion of the film to be processed and the subsequent durability can be surely improved.

上述第1氣體亦可含有搬送聚合性單體及交聯性添加成分之載氣。上述載氣較佳為選自氮氣、氬氣、氦氣等惰性氣體。就經濟性之觀點而言,較佳為使用氮氣作為上述載氣。上述載氣之成分可與上述放電生成氣體之成分相同,亦可不同。 The first gas may further contain a carrier gas that transports the polymerizable monomer and the crosslinkable additive component. The carrier gas is preferably an inert gas selected from the group consisting of nitrogen, argon, and helium. From the viewpoint of economy, it is preferred to use nitrogen as the above carrier gas. The component of the carrier gas may be the same as or different from the components of the discharge generating gas.

丙烯酸或甲基丙烯酸等聚合性單體大部分於常溫常壓下為液相。此種聚合性單體只要氣化於惰性氣體等載氣中即可。上述生成部亦可包含聚合性單體之氣化器。作為使聚合性單體氣化於載氣中之方法,可列舉:以載氣將聚合性單體之液面上之飽和蒸汽擠出的擠出方式;使載氣於聚合性單體液中起泡的起泡方式;將聚合性單體液加熱而促進蒸發的加熱方式等。亦可將擠出方式與加熱方式、或者起泡方式與加熱方式併用。可將載氣之一部分導入至氣化器中,剩餘部分不通過氣化器,亦可於氣化器之下游側使載氣之上述一部分與剩餘部分匯流。藉由氣化器之溫度或載氣之上述一部分與剩餘部分之分配比,可調節上述第1氣體中之聚合性單體濃度。 Most of the polymerizable monomers such as acrylic acid or methacrylic acid are in a liquid phase at normal temperature and normal pressure. Such a polymerizable monomer may be vaporized in a carrier gas such as an inert gas. The generating unit may further include a vaporizer of a polymerizable monomer. As a method of vaporizing a polymerizable monomer in a carrier gas, an extrusion method in which a saturated vapor on a liquid surface of a polymerizable monomer is extruded by a carrier gas; and a carrier gas in a polymerizable monomer liquid is mentioned Foaming method of foaming; heating method of heating a polymerizable monomer liquid to promote evaporation. The extrusion method and the heating method, or the foaming method and the heating method can also be used in combination. One part of the carrier gas may be introduced into the gasifier, the remainder may not pass through the gasifier, or the above part of the carrier gas may be merged with the remaining portion on the downstream side of the gasifier. The concentration of the polymerizable monomer in the first gas can be adjusted by the temperature of the gasifier or the distribution ratio of the above portion of the carrier gas to the remaining portion.

於加熱而氣化之情形時,考慮到加熱器之負擔,聚合性單體較佳為選擇沸點為300℃以下者。又,聚合性單體較佳為選擇不會因加熱而分解(化學變化)者。 In the case of heating and gasification, in consideration of the burden of the heater, the polymerizable monomer is preferably one having a boiling point of 300 ° C or less. Moreover, it is preferable that the polymerizable monomer is selected so as not to be decomposed (chemically changed) by heating.

上述交聯性添加成分較佳為具有藉由電漿照射而使聚合物產生交聯之性質。作為此種交聯性添加成分,例如可列舉:分子中具有2個以上不飽和鍵之不飽和烴化合物、具有三鍵之不飽和烴化合物、或者矽或鈦等的金屬烷氧化物化合物等。 The crosslinkable additive component preferably has a property of causing cross-linking of the polymer by irradiation with plasma. Examples of such a crosslinkable additive component include an unsaturated hydrocarbon compound having two or more unsaturated bonds in the molecule, an unsaturated hydrocarbon compound having a triple bond, or a metal alkoxide compound such as ruthenium or titanium.

作為上述具有2個以上不飽和鍵之不飽和烴化合物,例如可列舉二烯丙基化合物。作為二烯丙基化合物,可列舉:甲基丙烯酸烯丙酯、順丁烯二酸二烯丙酯、1,5-己二烯或1,7-辛二烯等。上述交聯性添加成分更佳為甲基丙烯酸烯丙酯,藉此,可獲得良好之耐溫水性。上述交聯性添加成分進而較佳為甲基丙烯酸烯丙酯,且相對於上述聚合性單體的含有率為0.5 wt%~10 wt%。藉此,可確實地表現交聯化作用,且可確實地獲得接著性。 The unsaturated hydrocarbon compound having two or more unsaturated bonds may, for example, be a diallyl compound. Examples of the diallyl compound include allyl methacrylate, diallyl maleate, 1,5-hexadiene or 1,7-octadiene. The crosslinkable additive component is more preferably allyl methacrylate, whereby good cold water resistance can be obtained. The crosslinkable component is more preferably allyl methacrylate, and the content of the polymerizable monomer is from 0.5% by weight to 10% by weight. Thereby, the cross-linking action can be surely exhibited, and the adhesion can be surely obtained.

作為上述具有三鍵之不飽和烴化合物,可列舉:3-甲基-1-丁炔-3-醇、3-甲基-1-戊炔-3-醇、乙炔等炔烴化合物。 Examples of the unsaturated hydrocarbon compound having a triple bond include an alkyne compound such as 3-methyl-1-butyn-3-ol, 3-methyl-1-pentyn-3-ol, and acetylene.

作為上述金屬烷氧化物化合物,可列舉:四乙氧基矽烷、四甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、第三丁基三甲氧基矽烷、 第三丁基三乙氧基矽烷等矽烷氧化物化合物,或乙氧化鈦、異丙氧化鈦等鈦烷氧化物化合物。矽烷氧化物化合物之沸點較低且容易氣化,因此作為上述交聯性添加成分較佳。作為構成上述交聯性添加成分之矽烷氧化物化合物,較佳為乙烯基三甲氧基矽烷,藉此可獲得良好之耐溫水性。 Examples of the metal alkoxide compound include tetraethoxydecane, tetramethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane, and 3-aminopropyltrimethoxydecane. - aminopropyl triethoxy decane, methyl trimethoxy decane, methyl triethoxy decane, ethyl trimethoxy decane, ethyl triethoxy decane, tert-butyl trimethoxy decane, A decane oxide compound such as a third butyl triethoxy decane or a titanium alkoxide compound such as titanium oxychloride or titanium oxychloride. Since the decane oxide compound has a low boiling point and is easily vaporized, it is preferably used as the crosslinkable additive component. The decane oxide compound constituting the crosslinkable additive component is preferably vinyltrimethoxydecane, whereby good temperature resistance can be obtained.

上述交聯性添加成分除上述列舉之化合物以外,亦可為烯丙基縮水甘油醚、甲基丙烯酸縮水甘油酯等縮水甘油基化合物,除此以外,亦可為丙烯腈、丙烯醯胺、二環戊二烯等。 The crosslinkable component may be a glycidyl compound such as allyl glycidyl ether or glycidyl methacrylate, in addition to the above-exemplified compounds, and may be acrylonitrile, acrylamide or the like. Cyclopentadiene and the like.

亦可將上述列舉之交聯性添加成分的複數種加以組合。 A plurality of the crosslinkable additive components listed above may also be combined.

上述交聯性添加成分亦可與聚合性單體同樣地具有聚合性。 The crosslinkable additive component may have polymerizability similarly to the polymerizable monomer.

上述交聯性添加成分之沸點可低於聚合性單體之沸點,可為相同程度,亦可高於聚合性單體之沸點。 The above-mentioned crosslinkable additive component may have a boiling point lower than the boiling point of the polymerizable monomer, may be the same degree, or may be higher than the boiling point of the polymerizable monomer.

上述交聯性添加成分亦可於常溫常壓下為液體。上述生成部亦可包含交聯性添加成分之氣化器。作為氣化方法,可列舉:以惰性氣體等載氣將上述交聯性添加成分之液面上之飽和蒸汽擠出的擠出方式;使載氣於上述交聯性添加成分之溶液中起泡的起泡方式;將上述交聯性添加成分之溶液加熱而促進蒸發的加熱方式等。亦可將擠出方式與加熱方式、或者起泡方式與加熱方式併用。可將上述載氣之一部分導入至上述交聯性添加成分之氣化器中,剩餘部分不通過上述氣化器,亦可於上述氣化器之下游側使載氣之 上述一部分與剩餘部分匯流。藉由上述氣化器之溫度或載氣之上述一部分與剩餘部分之分配比,可調節上述第1氣體中之交聯性添加成分的濃度。 The crosslinkable additive component may also be a liquid at normal temperature and pressure. The generating unit may further include a vaporizer that adds a crosslinkable component. Examples of the gasification method include an extrusion method in which a saturated vapor on a liquid surface of the crosslinkable additive component is extruded by a carrier gas such as an inert gas; and a carrier gas is foamed in a solution of the crosslinkable additive component. A foaming method; a heating method in which the solution of the crosslinkable additive component is heated to promote evaporation. The extrusion method and the heating method, or the foaming method and the heating method can also be used in combination. One part of the carrier gas may be introduced into the gasifier of the crosslinkable additive component, and the remainder may not pass through the gasifier, or the carrier gas may be disposed on the downstream side of the gasifier. The above part merges with the rest. The concentration of the crosslinkable additive component in the first gas can be adjusted by the temperature of the vaporizer or the distribution ratio of the portion of the carrier gas to the remaining portion.

可藉由將液相之聚合性單體與液相之交聯性添加成分混合,使該混合液氣化,而獲得第1氣體。藉由調節上述混合液之混合比或氣化溫度,可調節上述含有率。或者,亦可使液相之聚合性單體與液相之交聯性添加成分彼此單獨地氣化,然後將氣化之聚合性單體與氣化之交聯性添加成分混合,而獲得第1氣體。亦可於上述被處理膜之表面上將上述聚合性單體與上述交聯性添加成分混合。 The first gas can be obtained by mixing a polymerizable monomer in a liquid phase with a crosslinkable component in a liquid phase to vaporize the mixture. The above content ratio can be adjusted by adjusting the mixing ratio or vaporization temperature of the above mixed liquid. Alternatively, the crosslinkable additive component of the liquid phase polymerizable monomer and the liquid phase may be separately vaporized, and then the vaporized polymerizable monomer may be mixed with the vaporized crosslinkable additive component to obtain the first 1 gas. The polymerizable monomer may be mixed with the crosslinkable additive component on the surface of the film to be treated.

上述生成部亦可包含使上述聚合性單體與上述交聯性添加成分之混合液氣化的氣化器。上述生成部可包括:第1氣化器,其使上述聚合性單體氣化;第2氣化器,其使上述交聯性添加成分氣化;及混合部,其將來自上述第1氣化器之氣體與來自上述第2氣化器之氣體混合。 The production unit may include a vaporizer that vaporizes a mixed liquid of the polymerizable monomer and the crosslinkable additive component. The generating unit may include: a first vaporizer that vaporizes the polymerizable monomer; a second vaporizer that vaporizes the crosslinkable additive component; and a mixing unit that is derived from the first gas The gas of the catalyst is mixed with the gas from the second gasifier described above.

上述放電生成氣體較佳為惰性氣體。作為上述惰性氣體,除氮氣(N2)以外,亦可列舉氦氣(He)、氬氣(Ar)、氖氣(Ne)等稀有氣體。就經濟性之觀點而言,更佳為上述放電生成氣體為氮氣。上述放電生成氣體亦可為複數種氣體之混合氣體。 The discharge generating gas is preferably an inert gas. As the inert gas, in addition to nitrogen (N 2 ), a rare gas such as helium (He), argon (Ar) or helium (Ne) may be mentioned. From the viewpoint of economy, it is more preferable that the above-mentioned discharge generating gas is nitrogen. The discharge generating gas may be a mixed gas of a plurality of gases.

於上述第2處理步驟中,可將於上述放電生成氣體中添加氧氣而成之第2氣體電漿化,並接觸上述被處理膜。上述第2噴嘴可形成為將於上述放電生成氣體中添加氧氣而成之第2氣體供給於上述間隙。於此情形時,上述第2氣體 之氧氣含有率較佳為相對於上述放電生成氣體為0.5 vol%以下。藉此,可進一步提高耐溫水性,且可抑制被處理膜的接著性降低。 In the second processing step, the second gas obtained by adding oxygen to the discharge generating gas may be plasma-formed and contacted with the film to be processed. The second nozzle may be formed by supplying a second gas obtained by adding oxygen to the discharge generating gas to the gap. In this case, the second gas The oxygen content is preferably 0.5 vol% or less based on the discharge generating gas. Thereby, the temperature resistance to water can be further improved, and the decrease in the adhesion of the film to be treated can be suppressed.

根據本發明,可提高被處理膜的接著性,進而可提高藉由接著而形成之膜積層體對於溫水之耐受性(耐溫水性)。 According to the present invention, the adhesion of the film to be treated can be improved, and the resistance of the film laminate formed by the subsequent step to warm water (temperature resistance) can be improved.

以下,根據圖式說明本發明之實施形態。 Hereinafter, embodiments of the present invention will be described based on the drawings.

圖1及圖2係表示本發明之第1實施形態者。該實施形態之被處理膜9係應成為偏光板(膜積層體)的保護膜之樹脂膜。被處理膜9包含含有三乙酸纖維素(TAC)作為主成分之TAC膜,形成為連續片狀。膜9之厚度例如為100 μm左右。 1 and 2 show a first embodiment of the present invention. The film to be processed 9 of this embodiment is a resin film which is a protective film of a polarizing plate (film laminate). The film to be treated 9 contains a TAC film containing cellulose triacetate (TAC) as a main component, and is formed into a continuous sheet shape. The thickness of the film 9 is, for example, about 100 μm.

膜表面處理裝置1包括膜9之支持部兼搬送單元3、第1處理部91及第2處理部92。支持部兼搬送單元3包括第1輥31、第2輥32及導輥36,其兼具作為支持膜9之支持部的功能、與作為搬送膜9之搬送機構的功能。輥31、32係形成為彼此為相同直徑、相同軸長之圓筒體。各輥31、32之軸線朝向與圖1之紙面正交之處理寬度方向。2個輥31、32平行地排列。於該等輥31、32之間形成有狹窄之間隙39。間隙39最狹窄之部位的厚度例如為約1 mm~數mm左右。於間隙39之下方配置有2個導輥36、36。 The film surface treatment apparatus 1 includes a support portion and transport unit 3 of the film 9, a first processing unit 91, and a second processing unit 92. The support unit and the transport unit 3 include the first roller 31, the second roller 32, and the guide roller 36, and have a function as a support portion of the support film 9 and a function as a transport mechanism of the transport film 9. The rolls 31 and 32 are formed into a cylindrical body having the same diameter and the same axial length as each other. The axes of the rolls 31, 32 are oriented in a process width direction orthogonal to the plane of the paper of Fig. 1. The two rolls 31, 32 are arranged in parallel. A narrow gap 39 is formed between the rolls 31, 32. The thickness of the narrowest portion of the gap 39 is, for example, about 1 mm to several mm. Two guide rolls 36 and 36 are disposed below the gap 39.

各輥31、32之至少外周部分包含金屬,且於該金屬部分之外周面被覆有固體介電層。該等輥31、32兼作膜表面處 理裝置1之電漿放電生成用之一對電極。以下,適當地將輥31稱為第1電極31,將輥32稱為第2電極32。圖示省略,第1電極31係連接於電源。第2電極32電性接地。電源對第1電極31供給高頻電力。供給電力例如為脈衝等間歇波狀,但並不限定於此,亦可為正弦波等連續波狀。藉由該電力供給,於電極31、32間生成電漿放電,間隙39成為放電空間。 At least the outer peripheral portion of each of the rolls 31, 32 contains a metal, and a peripheral surface of the metal portion is covered with a solid dielectric layer. These rolls 31, 32 also serve as film surfaces A pair of electrodes for plasma discharge generation of the device 1. Hereinafter, the roller 31 is appropriately referred to as a first electrode 31, and the roller 32 is referred to as a second electrode 32. The illustration is omitted, and the first electrode 31 is connected to a power source. The second electrode 32 is electrically grounded. The power source supplies high frequency power to the first electrode 31. The supplied electric power is, for example, a intermittent wave such as a pulse, but is not limited thereto, and may be a continuous wave such as a sine wave. By this power supply, a plasma discharge is generated between the electrodes 31 and 32, and the gap 39 becomes a discharge space.

連續片狀之被處理膜9係將寬度方向朝向處理寬度方向(與圖1之紙面正交之方向),於輥31、32之上側之周面分別懸掛環繞半周左右。包含各輥31、32之上側之周面及形成間隙39之部分的約半周部分係由被處理膜9覆蓋。被處理膜9於輥31、32彼此之間自間隙39中垂向下方,懸掛環繞於導輥36、36上。藉此,間隙39與導輥36、36之間之被處理膜9自處理寬度方向觀察,形成三角形狀之折返部分9c。 The film-like processed film 9 in the continuous sheet shape has a width direction toward the processing width direction (a direction orthogonal to the paper surface of FIG. 1), and is circumferentially suspended around the circumference of the rolls 31 and 32, respectively. The peripheral surface including the upper surface of each of the rolls 31 and 32 and the portion of the half of the portion forming the gap 39 are covered by the film to be processed 9. The film to be treated 9 is vertically suspended from the gaps 39 between the rolls 31, 32, and is hung around the guide rolls 36, 36. Thereby, the processed film 9 between the gap 39 and the guide rolls 36 and 36 is formed in a triangular-shaped folded-back portion 9c as viewed from the processing width direction.

圖示省略,於各輥31、32上連結有旋轉機構。旋轉機構包括馬達等驅動部,及將該驅動部之驅動力傳導至輥31、32的軸之傳導機構。傳導機構例如包含傳送帶、滑輪機構或齒輪列。於圖1中,如中空圓弧狀箭頭所示,藉由旋轉機構,輥31、32分別繞各自之軸線、且相互同步同方向(圖1中之順時針方向)地旋轉。藉此,被處理膜9按第1輥31、第2輥32之順序向圖中之大致右方搬送。 Although not shown in the drawing, a rotation mechanism is connected to each of the rollers 31 and 32. The rotation mechanism includes a drive unit such as a motor, and a transmission mechanism that transmits the driving force of the drive unit to the shafts of the rollers 31 and 32. The transmission mechanism comprises, for example, a conveyor belt, a pulley mechanism or a gear train. In Fig. 1, as indicated by a hollow arc-shaped arrow, the rollers 31, 32 are rotated about their respective axes and synchronized with each other in the same direction (clockwise in Fig. 1) by a rotating mechanism. Thereby, the film to be processed 9 is conveyed to the substantially right side in the figure in the order of the first roll 31 and the second roll 32.

於各輥31、32設置有調溫單元(圖示省略)。調溫單元例如包含形成於輥31、32內之調溫管路。藉由於調溫管路中 流動經調溫之水等介質,可對輥31、32進行調溫。進一步,可對輥31、32之周面上之被處理膜9進行調溫。輥31、32之設定溫度較佳為低於後述聚合性單體及交聯性添加成分之凝結溫度的溫度。 A temperature control unit (not shown) is provided for each of the rollers 31 and 32. The temperature control unit includes, for example, a temperature control line formed in the rolls 31, 32. By adjusting the temperature in the pipeline The rollers 31 and 32 can be tempered by flowing a medium such as temperature-controlled water. Further, the film to be treated 9 on the circumferential surface of the rolls 31 and 32 can be tempered. The set temperatures of the rolls 31 and 32 are preferably lower than the condensation temperature of the polymerizable monomer and the crosslinkable additive component described later.

其次,對第1處理部91進行說明。第1處理部91包括第1氣體供給系統10。第1氣體供給系統10包括第1氣體生成部11及第1噴嘴14。生成部11包含氣化器。於氣化器11內儲存有原料液。原料液係於聚合性單體中混合特定量之交聯性添加成分而成者。此處,作為聚合性單體,係使用丙烯酸。作為交聯性添加成分,係使用甲基丙烯酸烯丙酯。於氣化器11附設有加熱器。可藉由加熱器調節原料液之溫度。 Next, the first processing unit 91 will be described. The first processing unit 91 includes a first gas supply system 10 . The first gas supply system 10 includes a first gas generating unit 11 and a first nozzle 14 . The generating unit 11 includes a gasifier. A raw material liquid is stored in the gasifier 11. The raw material liquid is obtained by mixing a specific amount of a crosslinkable additive component into a polymerizable monomer. Here, as the polymerizable monomer, acrylic acid is used. As the crosslinkable additive component, allyl methacrylate was used. A heater is attached to the gasifier 11. The temperature of the raw material liquid can be adjusted by a heater.

於氣化器11內導入特定流量之載氣。作為載氣,例如使用氮氣(N2)。將上述原料液成分(丙烯酸+甲基丙烯酸烯丙酯)氣化於該載氣(N2)中。氣化可為起泡方式,亦可為擠出方式。藉此,生成第1氣體。第1氣體包含丙烯酸(聚合性單體)、甲基丙烯酸烯丙酯(交聯性添加成分)及氮氣(載氣)。第1氣體中之甲基丙烯酸烯丙酯(交聯性添加成分)相對於丙烯酸(聚合性單體)的含有率係設定為少於丙烯酸之特定範圍,較佳為設定為0.5 wt%~10 wt%。上述含有率可藉由氣化器11中之原料液之混合比或氣化器11之設定溫度進行調節。 A carrier gas of a specific flow rate is introduced into the gasifier 11. As the carrier gas, for example, nitrogen (N 2 ) is used. The raw material liquid component (acrylic acid + allyl methacrylate) was vaporized into the carrier gas (N 2 ). The gasification can be a foaming method or an extrusion method. Thereby, the first gas is generated. The first gas contains acrylic acid (polymerizable monomer), allyl methacrylate (crosslinkable additive component), and nitrogen (carrier gas). The content ratio of allyl methacrylate (crosslinkable component) to acrylic acid (polymerizable monomer) in the first gas is set to be less than a specific range of acrylic acid, and is preferably set to 0.5 wt% to 10 Wt%. The above content ratio can be adjusted by the mixing ratio of the raw material liquid in the gasifier 11 or the set temperature of the gasifier 11.

第1氣體供給系統10亦可分別具有聚合性單體之氣化器與交聯性添加成分之氣化器。可藉由將於各氣化器中氣化 之氣體相互混合而生成第1氣體。 Each of the first gas supply systems 10 may have a vaporizer of a polymerizable monomer and a vaporizer of a crosslinkable additive component. Can be gasified in each gasifier The gases are mixed with each other to generate a first gas.

自氣化器11延伸出第1氣體供給管路13。於第1氣體供給管路13中設置有包含電熱帶等的調溫單元(圖示省略)。第1氣體供給管路13之設定溫度高於丙烯酸及甲基丙烯酸烯丙酯之凝結溫度。 The first gas supply line 13 extends from the gasifier 11 . A temperature control unit (not shown) including a heating belt or the like is provided in the first gas supply line 13. The set temperature of the first gas supply line 13 is higher than the condensation temperature of acrylic acid and allyl methacrylate.

於第1輥31之上側部配置有第1噴嘴14。第1氣體供給管路13與第1噴嘴14連接。第1噴嘴14係於處理寬度方向上較長地延伸,且於第1輥31之周方向(圖1之左右)上具有一定程度之寬度。於第1噴嘴14之底部設置有遮蔽構件15。遮蔽構件15係形成為具有沿第1輥31之周方向的圓弧狀剖面,且於處理寬度方向上與第1輥31延伸大致相同長度的彎曲板狀。遮蔽構件15之圓弧方向(圖1中之左右)之兩端部較第1噴嘴14沿第1輥31之周方向伸出。 The first nozzle 14 is disposed on the upper side of the first roller 31. The first gas supply line 13 is connected to the first nozzle 14 . The first nozzle 14 extends long in the processing width direction and has a certain width in the circumferential direction of the first roller 31 (left and right in FIG. 1). A shielding member 15 is provided at the bottom of the first nozzle 14. The shielding member 15 is formed in a curved plate shape having an arcuate cross section in the circumferential direction of the first roller 31 and extending substantially the same length as the first roller 31 in the processing width direction. Both end portions of the shielding member 15 in the arc direction (left and right in FIG. 1) project from the first nozzle 14 in the circumferential direction of the first roller 31.

於第1噴嘴14與第1輥31之間形成有第1處理空間93。第1噴嘴14之下表面係面向第1處理空間93。第1輥31係提供作為第1處理部91的第1處理空間形成部。第1處理空間93係形成為沿第1輥31之上側之周面的剖面圓弧狀之空間。第1處理空間93之厚度例如為1 mm~10 mm左右。藉由遮蔽構件15,第1處理空間93較第1噴嘴14向第1輥31之周方向的兩側延長。 A first processing space 93 is formed between the first nozzle 14 and the first roller 31. The lower surface of the first nozzle 14 faces the first processing space 93. The first roller 31 is provided with a first processing space forming portion as the first processing portion 91. The first processing space 93 is formed as a space having an arcuate cross section along the circumferential surface of the upper side of the first roller 31. The thickness of the first processing space 93 is, for example, about 1 mm to 10 mm. The first processing space 93 is extended toward the both sides in the circumferential direction of the first roller 31 by the shielding member 15 than the first nozzle 14 .

於第1噴嘴14之下表面設置有噴出口14e。噴出口14e貫通遮蔽構件15而與第1處理空間93連通。噴出口14e係沿第1噴嘴14之處理寬度方向(與圖1之紙面正交之方向)及輥周方向(圖1之左右方向)分佈配置。第1氣體自第1氣體供給管 路13供給至第1噴嘴14中。該第1氣體藉由第1噴嘴14內之整流部(圖示省略)而於處理寬度方向上均勻地分散後,自噴出口14e中噴出。第1氣體之噴出流形成為於處理寬度方向上均勻地分佈之氣流。 A discharge port 14e is provided on a lower surface of the first nozzle 14. The discharge port 14e passes through the shielding member 15 and communicates with the first processing space 93. The discharge port 14e is arranged to be distributed along the processing width direction (direction orthogonal to the paper surface of FIG. 1) of the first nozzle 14 and the roll circumferential direction (left-right direction of FIG. 1). First gas from the first gas supply pipe The path 13 is supplied to the first nozzle 14. The first gas is uniformly dispersed in the processing width direction by the rectifying portion (not shown) in the first nozzle 14, and is then ejected from the ejection port 14e. The discharge stream of the first gas is formed as a gas stream uniformly distributed in the processing width direction.

於第1噴嘴14中設置有調溫單元(圖示省略),其包含使調溫水通過之調溫管路。第1噴嘴14之設定溫度高於丙烯酸及甲基丙烯酸烯丙酯之凝結溫度。 A temperature control unit (not shown) is provided in the first nozzle 14, and includes a temperature control line through which the temperature control water passes. The set temperature of the first nozzle 14 is higher than the condensation temperature of acrylic acid and allyl methacrylate.

其次,對第2處理部92進行說明。第2處理部92包括第2氣體供給系統20。第2氣體供給系統20包括第2氣體供給源21、及第2噴嘴24。第2氣體供給源21供給作為放電生成氣體之氮氣(N2)。自第2氣體供給源21延伸出第2氣體供給管路23。第2氣體供給管路23與第2噴嘴24連接。 Next, the second processing unit 92 will be described. The second processing unit 92 includes a second gas supply system 20 . The second gas supply system 20 includes a second gas supply source 21 and a second nozzle 24 . The second gas supply source 21 supplies nitrogen gas (N 2 ) as a discharge generating gas. The second gas supply line 23 extends from the second gas supply source 21. The second gas supply line 23 is connected to the second nozzle 24 .

第2噴嘴24係設置於輥31、32彼此間之下側的被處理膜9之三角形狀之折返部分9c的內部。第2噴嘴24於處理寬度方向上較長地延伸,且與該延伸方向正交之剖面朝向上方逐漸變窄。第2噴嘴24之上端(頂端)之噴出口面對間隙39。間隙39之下端部由第2噴嘴24一定程度阻塞。來自第2氣體供給源21之放電生成氣體(N2)經過供給管路23後,藉由第2噴嘴24內之整流部(圖示省略)而於處理寬度方向上均勻地分散。該放電生成氣體自第2噴嘴24之上端的噴出口向間隙39中噴出,藉由間隙39內之電場施加而產生電漿放電。放電生成氣體自噴嘴24中之噴出流形成為於與圖1之紙面正交之處理寬度方向上均勻地分佈之氣流。間隙39構成第2處理部92之第2處理空間。輥31、32係提供作為第2處理 部92的第2處理空間形成部。 The second nozzle 24 is provided inside the triangular-shaped folded portion 9c of the film 9 to be processed on the lower side between the rollers 31 and 32. The second nozzle 24 extends long in the processing width direction, and the cross section orthogonal to the extending direction gradually narrows toward the upper side. The discharge port of the upper end (top end) of the second nozzle 24 faces the gap 39. The lower end of the gap 39 is blocked to some extent by the second nozzle 24. The discharge generating gas (N 2 ) from the second gas supply source 21 passes through the supply line 23, and is uniformly dispersed in the processing width direction by the rectifying portion (not shown) in the second nozzle 24. The discharge generated gas is ejected from the discharge port at the upper end of the second nozzle 24 into the gap 39, and a plasma discharge is generated by application of an electric field in the gap 39. The discharge flow of the discharge generating gas from the nozzle 24 is formed as a gas flow uniformly distributed in the processing width direction orthogonal to the paper surface of Fig. 1 . The gap 39 constitutes a second processing space of the second processing unit 92. The rollers 31 and 32 provide a second processing space forming portion as the second processing unit 92.

於第2噴嘴24內,設置有未圖示之調溫管路(放電生成氣體調溫單元)。水等調溫介質通過第2噴嘴24內之調溫管路。藉此,可對第2噴嘴24進行調溫,進一步可對放電生成氣體之噴出溫度進行調節。第2噴嘴24之設定溫度低於第1噴嘴14之設定溫度,較佳為低於丙烯酸(聚合性單體)及甲基丙烯酸烯丙酯(交聯性添加成分)之凝結溫度。 A temperature control line (discharge generation gas temperature adjustment unit) (not shown) is provided in the second nozzle 24. The temperature control medium such as water passes through the temperature control line in the second nozzle 24. Thereby, the second nozzle 24 can be tempered, and the discharge temperature of the discharge generating gas can be further adjusted. The set temperature of the second nozzle 24 is lower than the set temperature of the first nozzle 14, and is preferably lower than the condensation temperature of acrylic acid (polymerizable monomer) and allyl methacrylate (crosslinking additive component).

於較間隙39之上側的輥31、32彼此之間配置有阻塞部25。阻塞部25隔著間隙39而與第2噴嘴24上下對向。阻塞部25於處理寬度方向上較長地延伸,且與該延伸方向正交之剖面朝向下方逐漸變窄。阻塞部25之下端(頂端)面對間隙39。間隙39之上端部由阻塞部25一定程度地阻塞。阻塞部25亦可為與第2噴嘴24為相同結構之噴嘴。亦可將該噴嘴25與第2噴嘴24上下反轉設置,亦可構成為自噴嘴25中噴出放電生成氣體。 The blocking portion 25 is disposed between the rollers 31 and 32 on the upper side of the gap 39. The blocking portion 25 faces the second nozzle 24 up and down with the gap 39 interposed therebetween. The blocking portion 25 extends long in the processing width direction, and the cross section orthogonal to the extending direction is gradually narrowed downward. The lower end (top end) of the blocking portion 25 faces the gap 39. The upper end of the gap 39 is blocked to some extent by the blocking portion 25. The blocking portion 25 may be a nozzle having the same configuration as the second nozzle 24. The nozzle 25 and the second nozzle 24 may be vertically reversed or may be configured to eject a discharge generating gas from the nozzle 25.

對藉由上述構成之膜表面處理裝置1對被處理膜9進行表面處理之方法、及製造偏光板之方法進行說明。 A method of surface-treating the film to be processed 9 by the film surface treatment apparatus 1 configured as described above and a method of manufacturing a polarizing plate will be described.

[支持步驟、搬送步驟] [Support steps, transfer steps]

將被處理膜9懸掛環繞於輥31、32及導輥36、36上。 The film to be treated 9 is hung around the rolls 31, 32 and the guide rolls 36, 36.

使輥31、32繞圖1中之順時針方向旋轉,將被處理膜9向大致右方搬送。 The rollers 31 and 32 are rotated in the clockwise direction in Fig. 1, and the film to be processed 9 is conveyed to the substantially right side.

[第1處理步驟] [First Processing Step]

於第1氣體供給源11中,使丙烯酸(聚合性單體)及甲基丙烯酸烯丙酯(交聯性添加成分)氣化於載氣(N2)中,生成第1 氣體。第1氣體中之甲基丙烯酸烯丙酯的含有率相對於丙烯酸較佳為0.5 wt%~10 wt%。將該第1氣體藉由第1氣體供給管路13向第1噴嘴14搬送。藉由對第1氣體供給管路13及第1噴嘴14進行調溫,可防止第1氣體中之丙烯酸及甲基丙烯酸烯丙酯在第1氣體供給管路13及第1噴嘴14內凝結。 In the first gas supply source 11, acrylic acid (polymerizable monomer) and allyl methacrylate (crosslinkable additive component) are vaporized in a carrier gas (N 2 ) to form a first gas. The content of allyl methacrylate in the first gas is preferably 0.5% by weight to 10% by weight based on the acrylic acid. The first gas is transported to the first nozzle 14 by the first gas supply line 13 . By adjusting the temperature of the first gas supply line 13 and the first nozzle 14, it is possible to prevent the acrylic acid and the allyl methacrylate in the first gas from being condensed in the first gas supply line 13 and the first nozzle 14.

將上述第1氣體自噴出口14e噴出至第1處理空間93中。該第1氣體與第1處理空間93內之被處理膜9之表面接觸。繼而,第1氣體中之丙烯酸及甲基丙烯酸烯丙酯凝結而附著於被處理膜9上,於被處理膜9之表面形成凝結層。藉由對輥31進行調溫,進一步對被處理膜9進行調溫,可確實地產生上述凝結。凝結層之大部分由丙烯酸單體構成,於其中混入有微量或少量之甲基丙烯酸烯丙酯。藉由遮蔽構件15可抑制第1氣體擴散,可確保上述凝結層成分於被處理膜9上之附著量。 The first gas is discharged from the discharge port 14e into the first processing space 93. This first gas is in contact with the surface of the film to be processed 9 in the first processing space 93. Then, acrylic acid and allyl methacrylate in the first gas are condensed and adhered to the film to be treated 9, and a condensation layer is formed on the surface of the film to be treated 9. By adjusting the temperature of the roller 31, the film to be processed 9 is further tempered, and the above-described condensation can be surely produced. Most of the coagulation layer is composed of an acrylic monomer in which a trace amount or a small amount of allyl methacrylate is mixed. The first gas diffusion can be suppressed by the shielding member 15, and the amount of adhesion of the condensation layer component to the film to be treated 9 can be secured.

[第2處理步驟] [Second processing step]

隨著輥31、32之旋轉,經過上述第1處理步驟後之被處理膜9向第2處理空間39搬送。自第2噴嘴24向第2處理空間39中噴出氮氣(N2)作為放電生成氣體。併行地,對第1輥電極31供給電力,於第2處理空間39內生成大氣壓附近之放電,將氮氣電漿化而生成氮氣電漿。該氮氣電漿與第2處理空間39內之被處理膜9的表面接觸。藉此,構成上述凝結層之丙烯酸(聚合性單體)產生電漿聚合反應,且產生甲基丙烯酸烯丙酯(交聯性添加成分)之電漿交聯反應。藉由上述電漿聚合反應,可於被處理膜9之表面形成聚丙烯 酸之膜。聚丙烯酸與構成被處理膜9之TAC的親和性良好,且與TAC之表面分子充分地反應而與被處理膜9密接。該聚丙烯酸膜成為接著性促進層,可使TAC膜的接著性提高。另外,藉由上述電漿交聯反應,可使聚丙烯酸膜產生交聯,可提高聚合度。藉此,接著性促進層之疏水性提高。 As the rollers 31 and 32 rotate, the film 9 to be processed which has passed through the first processing step is transported to the second processing space 39. Nitrogen gas (N 2 ) is discharged from the second nozzle 24 into the second processing space 39 as a discharge generating gas. In parallel, electric power is supplied to the first roller electrode 31, and a discharge in the vicinity of the atmospheric pressure is generated in the second processing space 39, and the nitrogen gas is plasma-formed to generate a nitrogen gas plasma. This nitrogen plasma is in contact with the surface of the film to be processed 9 in the second processing space 39. Thereby, the acrylic acid (polymerizable monomer) constituting the coagulation layer is subjected to a plasma polymerization reaction, and a plasma cross-linking reaction of allyl methacrylate (crosslinking additive component) is produced. By the above plasma polymerization reaction, a film of polyacrylic acid can be formed on the surface of the film to be treated 9. The polyacrylic acid has good affinity with TAC constituting the film to be treated 9, and sufficiently reacts with the surface molecules of TAC to be in close contact with the film to be treated 9. The polyacrylic acid film serves as an adhesion promoting layer, and the adhesion of the TAC film can be improved. Further, by the above-mentioned plasma crosslinking reaction, the polyacrylic acid film can be crosslinked, and the degree of polymerization can be improved. Thereby, the hydrophobicity of the adhesion promoting layer is improved.

被處理膜9藉由導輥36而折返,藉此於第2處理空間39內往返,在第2處理空間39中受到2次處理。 The film to be processed 9 is folded back by the guide roller 36, and is reciprocated in the second processing space 39, and is subjected to secondary processing in the second processing space 39.

將上述表面處理後之被處理膜9經由PVA系接著劑與PVA膜接著,製作偏光板。由於被處理膜9之表面形成有包含上述電漿聚合膜之接著性促進層,因此可提高被處理膜9與PVA接著劑之接著強度。並且,上述接著性促進層產生交聯而使聚合度提高,因此可提高偏光板之耐溫水性。亦即,即便將偏光板長時間地浸漬於溫水中,亦可抑制或防止褪色或剝離。 The surface-treated film 9 after the surface treatment was passed through a PVA-based adhesive and a PVA film to prepare a polarizing plate. Since the adhesion promoting layer containing the above plasma polymerization film is formed on the surface of the film to be processed 9, the adhesion strength between the film to be treated 9 and the PVA adhesive can be improved. Further, since the adhesion promoting layer is crosslinked to increase the degree of polymerization, the temperature resistance of the polarizing plate can be improved. That is, even if the polarizing plate is immersed in warm water for a long period of time, fading or peeling can be suppressed or prevented.

藉由將甲基丙烯酸烯丙酯相對於丙烯酸的含有率設為0.5 wt%以上,可確實地表現交聯作用,進而可確實地提高偏光板之耐溫水性。藉由將甲基丙烯酸烯丙酯相對於丙烯酸的含有率設為10 wt%以下,可確保接著性促進層對於接著劑之親和性,可確實地提高接著強度。其結果,可提高偏光板之品質。 By setting the content of allyl methacrylate to acrylic acid to 0.5 wt% or more, the crosslinking action can be reliably exhibited, and the temperature resistance of the polarizing plate can be surely improved. By setting the content of allyl methacrylate to acrylic acid to 10 wt% or less, the affinity of the adhesion promoting layer to the adhesive can be ensured, and the adhesion strength can be surely improved. As a result, the quality of the polarizing plate can be improved.

其次,說明本發明之其他實施形態。於以下實施形態中,關於與上述之實施形態重複之構成,係於圖式上標附相同符號且省略說明。 Next, other embodiments of the present invention will be described. In the following embodiments, the same components as those in the above-described embodiments are denoted by the same reference numerals, and their description is omitted.

圖3係表示本發明之第2實施形態者。於第2實施形態中,第2氣體供給系統20之氣體組成與第1實施形態不同。第2實施形態之第2氣體供給源22係將於氮氣(放電生成氣體)中添加微量氧氣(O2)而成之第2氣體向供給管路23送出。自第2噴嘴24將該第2氣體(N2+O2)供給至間隙39中。第2氣體中之氧氣含有率較佳為相對於氮氣(放電生成氣體)為0.5 vol%以下。第2氣體供給源22可為儲存有氮氣與氧氣之混合氣體(N2+O2)的儲罐,亦可為分別具有儲存有氮氣之儲罐與儲存有氧氣之儲罐,將該等儲罐之氣體逐次適量地混合者。 Fig. 3 is a view showing a second embodiment of the present invention. In the second embodiment, the gas composition of the second gas supply system 20 is different from that of the first embodiment. In the second gas supply source 22 of the second embodiment, the second gas obtained by adding a trace amount of oxygen (O 2 ) to nitrogen gas (discharge generating gas) is sent to the supply line 23 . The second gas (N 2 + O 2 ) is supplied from the second nozzle 24 to the gap 39. The oxygen content in the second gas is preferably 0.5 vol% or less with respect to nitrogen (discharge generating gas). The second gas supply source 22 may be a storage tank storing a mixed gas of nitrogen and oxygen (N 2 + O 2 ), or may be a storage tank storing nitrogen gas and a storage tank storing oxygen, and storing the same. The gas of the tank is mixed in an appropriate amount.

於第2實施形態中,繼第1處理空間93中之凝結層之形成(第1處理步驟)之後,自第2噴嘴24將第2氣體(N2+O2)噴出至第2處理空間39中將其電漿化,並使之接觸被處理膜9(第2處理步驟)。藉此,可使上述凝結層進行電漿聚合而形成接著性促進層。藉由使第2氣體含有微量氧氣,可進一步提高上述接著性促進層的疏水性。其結果,可進一步提高偏光板之耐溫水性。 In the second embodiment, after the formation of the condensation layer in the first processing space 93 (first processing step), the second gas (N 2 + O 2 ) is ejected from the second nozzle 24 to the second processing space 39. It is plasma-treated and brought into contact with the film to be treated 9 (second processing step). Thereby, the above-mentioned coagulation layer can be subjected to plasma polymerization to form an adhesion promoting layer. By including a trace amount of oxygen in the second gas, the hydrophobicity of the adhesion promoting layer can be further improved. As a result, the temperature resistance of the polarizing plate can be further improved.

圖4及圖5係表示本發明之第3實施形態者。於第3實施形態之膜表面處理裝置1X中,支持部兼搬送單元3包含3個輥31、32、33,第1處理部91包含2個第1噴嘴14A、14B,第2處理部92包含2個第2噴嘴24A、24B。3個輥31、32、33係使彼此之軸線平行地對齊,且沿與軸線正交之方向依序排列。該等輥31~33兼作電漿放電生成用之電極。以下,適當地將輥31稱為第1電極31,將輥32稱為第2電極32,將 輥33稱為第3電極33。圖示省略,中央之第2電極32連接於電源,兩端之第1電極31及第3電極33電性接地。亦可代替此方式,使兩端之第1電極31及第3電極33分別連接於電源,中央之第2電極32電性接地。於電極31、32彼此之間形成有間隙39A(前段之第2處理空間)。於電極32、33之間形成有間隙39B(後段之第2處理空間)。 4 and 5 show a third embodiment of the present invention. In the film surface treatment apparatus 1X of the third embodiment, the support unit and transport unit 3 includes three rollers 31, 32, and 33. The first processing unit 91 includes two first nozzles 14A and 14B, and the second processing unit 92 includes Two second nozzles 24A, 24B. The three rollers 31, 32, 33 are aligned in parallel with each other and sequentially in a direction orthogonal to the axis. These rolls 31 to 33 also serve as electrodes for plasma discharge generation. Hereinafter, the roller 31 is appropriately referred to as a first electrode 31, and the roller 32 is referred to as a second electrode 32. The roller 33 is referred to as a third electrode 33. Although not shown, the second electrode 32 in the center is connected to the power source, and the first electrode 31 and the third electrode 33 at both ends are electrically grounded. Alternatively, the first electrode 31 and the third electrode 33 at both ends may be connected to the power source, and the second electrode 32 at the center may be electrically grounded. A gap 39A (a second processing space in the preceding stage) is formed between the electrodes 31 and 32. A gap 39B (a second processing space in the latter stage) is formed between the electrodes 32 and 33.

被處理膜9懸掛環繞於各輥31、32、33之上側的周面。被處理膜9中第1輥31與第2輥32之間的部分9c懸掛環繞於導輥36A、36A上而折返。被處理膜9中第2輥32與第3輥33之間的部分9d懸掛環繞於導輥36B、36B上而折返。 The film to be treated 9 is hung around the circumferential surface on the upper side of each of the rolls 31, 32, and 33. The portion 9c between the first roller 31 and the second roller 32 in the film to be processed 9 is suspended around the guide rollers 36A and 36A to be folded back. The portion 9d between the second roller 32 and the third roller 33 in the film to be processed 9 is suspended around the guide rollers 36B and 36B to be folded back.

於第1輥31之上側配置有第1噴嘴14A。第1噴嘴14A上附加有遮蔽構件15A。第1噴嘴14A及遮蔽構件15A之形狀及結構與第1實施形態的第1噴嘴14及遮蔽構件15相同。於第1噴嘴14A與第1輥31彼此之間形成有前段之第1處理空間93A。 The first nozzle 14A is disposed on the upper side of the first roller 31. A shielding member 15A is attached to the first nozzle 14A. The shape and configuration of the first nozzle 14A and the shielding member 15A are the same as those of the first nozzle 14 and the shielding member 15 of the first embodiment. A first processing space 93A of the front stage is formed between the first nozzle 14A and the first roller 31.

於第2輥32之上側配置有第1噴嘴14B。第1噴嘴14B上附加有遮蔽構件15B。第1噴嘴14B及遮蔽構件15B之形狀及結構與第1實施形態的第1噴嘴14及遮蔽構件15相同。於第1噴嘴14B與第2輥32彼此之間形成有後段之第1處理空間93B。 The first nozzle 14B is disposed on the upper side of the second roller 32. A shielding member 15B is attached to the first nozzle 14B. The shape and configuration of the first nozzle 14B and the shielding member 15B are the same as those of the first nozzle 14 and the shielding member 15 of the first embodiment. A first processing space 93B in the subsequent stage is formed between the first nozzle 14B and the second roller 32.

第1氣體供給管路13分支為2路,其中一路分支路13a與前段之第1噴嘴14A連接,另一路分支路13b與後段之第1噴嘴14B連接。來自供給源11之第1氣體分流至各分支路13a、13b中,自各噴嘴14A、14B導入至處理空間93A、 93B中。來自噴嘴14A、14B之噴出流量可相互相同,亦可不同。 The first gas supply line 13 is branched into two paths, and one of the branch passages 13a is connected to the first nozzle 14A of the preceding stage, and the other branching passage 13b is connected to the first nozzle 14B of the subsequent stage. The first gas from the supply source 11 is branched into the respective branch paths 13a and 13b, and introduced into the processing space 93A from each of the nozzles 14A and 14B. 93B. The discharge flows from the nozzles 14A, 14B may be the same or different.

再者,亦可對噴嘴14A、14B分別設置第1氣體供給源11。於此情形時,2個第1氣體供給源之第1氣體的組成、流量、交聯性添加成分的含有率等可相互相同,亦可相互不同。 Further, a first gas supply source 11 may be provided for each of the nozzles 14A and 14B. In this case, the composition, the flow rate, the content ratio of the crosslinkable additive component, and the like of the first gas of the two first gas supply sources may be the same or different from each other.

於較前段之輥間間隙39A更下側的折返部分9c內配置有第2噴嘴24A。於間隙39A之上側配置有阻塞部25A。第2噴嘴24A及阻塞部25A之形狀、結構分別與第1實施形態之噴嘴24及阻塞部25相同。 The second nozzle 24A is disposed in the folded portion 9c on the lower side of the inter-roll gap 39A. An obstruction portion 25A is disposed on the upper side of the gap 39A. The shape and structure of the second nozzle 24A and the damper portion 25A are the same as those of the nozzle 24 and the dam portion 25 of the first embodiment.

於較後段之輥間間隙39B更下側的折返部分9d內配置有第2噴嘴24B。於間隙39B之上側配置有阻塞部25B。第2噴嘴24B及阻塞部25B之形狀、結構分別與第1實施形態之噴嘴24及阻塞部25相同。 The second nozzle 24B is disposed in the folded portion 9d on the lower side of the inter-roll gap 39B in the latter stage. The blocking portion 25B is disposed on the upper side of the gap 39B. The shape and structure of the second nozzle 24B and the damper portion 25B are the same as those of the nozzle 24 and the dam portion 25 of the first embodiment.

第3實施形態之第2氣體源21與第1實施形態相同,僅供出放電生成氣體(N2)。自第2氣體源21之供給管路23分支為2路,其中一路分支路23a與前段之第2噴嘴24A連接,另一路分支路23b與後段之第2噴嘴24B連接。來自供給源21之放電生成氣體(N2)分流至各分支路23a、23b中,自各噴嘴24A、24B導入至電漿處理空間39A、39B中。來自噴嘴24A、24B之放電生成氣體(N2)之噴出流量可相互相同,亦可不同。再者,亦可對噴嘴24A、24B分別設置第2氣體供給源21。 The second gas source 21 of the third embodiment is the same as the first embodiment, and is only for the discharge generating gas (N 2 ). The supply line 23 of the second gas source 21 is branched into two paths, one of which is connected to the second nozzle 24A of the preceding stage, and the other branching line 23b is connected to the second nozzle 24B of the latter stage. The discharge generating gas (N 2 ) from the supply source 21 is branched into the respective branch paths 23a and 23b, and introduced into the plasma processing spaces 39A and 39B from the respective nozzles 24A and 24B. The discharge flow rates of the discharge generating gases (N 2 ) from the nozzles 24A and 24B may be the same or different. Further, a second gas supply source 21 may be provided for each of the nozzles 24A and 24B.

於第3實施形態中,將被處理膜9按第1輥31、第2輥32、 第2輥33之順序向圖4中之大致右方搬送。併行地,自第1噴嘴14A噴出第1氣體,於前段之第1處理空間93A內之被處理膜9的表面形成包含丙烯酸與甲基丙烯酸烯丙酯之混合液之第1凝結層(前段之第1處理步驟)。繼而,於前段之第2處理空間39A中進行電漿放電,藉此使上述凝結層成分產生電漿聚合反應及交聯反應,於被處理膜9之表面形成第1接著性促進層(前段之第2處理步驟)。進而,亦自第1噴嘴14B噴出第1氣體,於後段之第1處理空間93B內之被處理膜9的上述第1接著性促進層上形成包含丙烯酸與甲基丙烯酸烯丙酯之混合液之第2凝結層(後段之第1處理步驟)。繼而,藉由於後段之第2處理空間39B中進行電漿放電,而使上述第2凝結層進行電漿聚合,於第1接著性促進層上形成第2接著性促進層(後段之第2處理步驟)。藉此,可增大接著性促進層之厚度,並且可進一步提高聚合度,其結果,可進一步提高偏光板之耐溫水度。 In the third embodiment, the film to be processed 9 is placed on the first roll 31 and the second roll 32, The order of the second rolls 33 is conveyed to the right in FIG. In parallel, the first gas is ejected from the first nozzle 14A, and the first condensation layer containing a mixed liquid of acrylic acid and allyl methacrylate is formed on the surface of the film 9 to be processed in the first processing space 93A in the preceding stage (previous stage) First processing step). Then, plasma discharge is performed in the second processing space 39A of the preceding stage, whereby the condensed layer component is subjected to a plasma polymerization reaction and a crosslinking reaction, and a first adhesion promoting layer is formed on the surface of the film to be processed 9 (front stage The second processing step). Further, the first gas is ejected from the first nozzle 14B, and a mixed liquid containing acrylic acid and allyl methacrylate is formed on the first adhesion promoting layer of the film 9 to be processed in the first processing space 93B in the subsequent stage. The second coagulation layer (the first treatment step of the latter stage). Then, the second condensation layer is plasma-polymerized by the plasma discharge in the second processing space 39B in the subsequent stage, and the second adhesion promoting layer is formed on the first adhesion promoting layer (the second processing in the latter stage) step). Thereby, the thickness of the adhesion promoting layer can be increased, and the degree of polymerization can be further increased, and as a result, the temperature resistance of the polarizing plate can be further improved.

圖6係表示本發明之第4實施形態者。第4實施形態係關於第3實施形態之膜表面處理裝置1X中的第2氣體供給源之變形例。第4實施形態之第2氣體源22係供出於氮氣(N2)中添加微量氧氣(O2)而成之第2氣體。第2氣體之氧氣含有率與第2實施形態同樣地係相對於氮氣(放電生成氣體)為0.5 vol%之程度以下。 Fig. 6 is a view showing a fourth embodiment of the present invention. The fourth embodiment is a modification of the second gas supply source in the film surface treatment apparatus 1X of the third embodiment. The second gas source 22 of the fourth embodiment is a second gas obtained by adding a trace amount of oxygen (O 2 ) to nitrogen gas (N 2 ). In the same manner as in the second embodiment, the oxygen content of the second gas is not more than 0.5 vol% with respect to nitrogen gas (discharge generating gas).

根據第4實施形態,可藉由前段之第2處理空間39A中的氮氣及氧氣電漿處理而使接著性促進層疏水化,進而可藉由後段之第2處理空間39B中的氮氣及氧氣電漿處理而進一 步提高接著性促進層之疏水性。 According to the fourth embodiment, the adhesion promoting layer can be hydrophobized by the treatment of nitrogen gas and oxygen plasma in the second processing space 39A in the preceding stage, and the nitrogen and oxygen in the second processing space 39B in the subsequent stage can be further Pulp processing Steps increase the hydrophobicity of the adhesion promoting layer.

本發明並不限定於上述實施形態,可於不違背其宗旨之範圍內採用各種形態。 The present invention is not limited to the above embodiments, and various forms can be employed without departing from the scope of the invention.

例如,亦可同時併行地進行第1處理步驟與第2處理步驟。亦可將第1氣體與第2氣體一起直接供給至第2處理空間39(39A、39B)中。 For example, the first processing step and the second processing step may be performed in parallel at the same time. The first gas and the second gas may be directly supplied to the second processing space 39 (39A, 39B).

被處理膜9之主成分並不限定於TAC,亦可為聚丙烯(PP)、聚乙烯(PE)、環烯烴聚合物(COP)、環烯烴共聚物(COC)、聚對苯二甲酸乙二酯(PET)、聚甲基丙烯酸甲酯(PMMA)、聚醯亞胺(PI)等。 The main component of the film to be treated 9 is not limited to TAC, and may be polypropylene (PP), polyethylene (PE), cycloolefin polymer (COP), cyclic olefin copolymer (COC), polyethylene terephthalate. Diester (PET), polymethyl methacrylate (PMMA), polyimine (PI), and the like.

作為聚合性單體,亦可代替丙烯酸而使用甲基丙烯酸、伊康酸、順丁烯二酸等。作為載氣,亦可代替N2而使用Ar、He等稀有氣體。 As the polymerizable monomer, methacrylic acid, itaconic acid, maleic acid or the like may be used instead of acrylic acid. As the carrier gas, a rare gas such as Ar or He may be used instead of N 2 .

作為交聯性添加成分,可代替甲基丙烯酸烯丙酯或除甲基丙烯酸烯丙酯以外亦使用順丁烯二酸二烯丙酯、1,7-辛二烯等其他二烯丙基化合物,可使用3-甲基-1-丁炔-3-醇、3-甲基-1-戊炔-3-醇等炔烴化合物,可使用四乙氧基矽烷、乙烯基三甲氧基矽烷等矽烷氧化物(金屬烷氧化物),進而亦可使用烯丙基縮水甘油醚、甲基丙烯酸縮水甘油酯等縮水甘油基化合物,此外,亦可使用丙烯腈、丙烯醯胺、二環戊二烯等。第1氣體亦可含有複數種交聯性添加成分。例如,第1氣體可含有甲基丙烯酸烯丙酯及乙烯基三甲氧基矽烷作為交聯性添加成分。 As the crosslinkable additive component, other diallyl compounds such as diallyl maleate or 1,7-octadiene may be used in place of allyl methacrylate or allyl methacrylate. An alkyne compound such as 3-methyl-1-butyn-3-ol or 3-methyl-1-pentyn-3-ol can be used, and tetraethoxy decane, vinyl trimethoxy decane, or the like can be used. Further, a decyl oxide (metal alkoxide), or a glycidyl compound such as allyl glycidyl ether or glycidyl methacrylate, or acrylonitrile, acrylamide or dicyclopentadiene may be used. Wait. The first gas may also contain a plurality of crosslinkable additive components. For example, the first gas may contain allyl methacrylate and vinyl trimethoxy decane as a crosslinkable additive component.

作為第1氣體之載氣成分,亦可代替N2而使用Ar、He等 稀有氣體。 As the carrier gas component of the first gas, a rare gas such as Ar or He may be used instead of N 2 .

作為放電生成氣體,亦可代替N2而使用Ar、He等稀有氣體。 As the discharge generating gas, a rare gas such as Ar or He may be used instead of N 2 .

第1氣體中之交聯性添加成分相對於聚合性單體的含有率並不限定於0.5 wt%~10 wt%,只要在可表現所需之交聯作用且接著強度不會劣化之範圍內,根據交聯性添加成分、聚合性單體及被處理膜9之成分的組合加以設定即可。 The content ratio of the crosslinkable component to the polymerizable monomer in the first gas is not limited to 0.5 wt% to 10 wt%, as long as it exhibits a desired crosslinking action and then the strength does not deteriorate. Further, it may be set according to a combination of a crosslinkable additive component, a polymerizable monomer, and a component of the film to be processed 9.

於第2處理步驟中,亦可使用所謂遙距式之大氣壓電漿表面處理裝置,該裝置係將被處理膜9配置於電極間之外部,將於電極間電漿化之氣體朝外部之被處理膜9噴出。 In the second processing step, a so-called remote atmosphere piezoelectric slurry surface treatment apparatus may be used, in which the film to be processed 9 is disposed outside the electrodes, and the gas which is plasmad between the electrodes is directed to the outside. The treatment film 9 is ejected.

第2處理步驟之電漿照射並不限定於大氣壓附近,亦可於真空下進行。 The plasma irradiation in the second treatment step is not limited to the vicinity of atmospheric pressure, and may be carried out under vacuum.

亦可將複數種實施形態相互組合。 A plurality of embodiments can also be combined with each other.

本發明並不限定於偏光板用保護膜之表面處理,本發明可應用於在各種樹脂膜上形成聚合性單體之聚合膜的處理。 The present invention is not limited to the surface treatment of the protective film for a polarizing plate, and the present invention can be applied to a treatment of forming a polymer film of a polymerizable monomer on various resin films.

[實施例1] [Example 1]

對實施例進行說明,但本發明並不限定於以下之實施例。 The examples are described, but the present invention is not limited to the following examples.

使用圖1所示之膜表面處理裝置1,對膜9進行表面處理。 The film 9 was subjected to surface treatment using the film surface treatment apparatus 1 shown in Fig. 1 .

裝置1之尺寸構成如下所示。 The size of the device 1 is as follows.

輥31、32之處理寬度方向之軸長:390 mm Axial length of the processing width direction of the rolls 31, 32: 390 mm

輥31、32之直徑:320 mm Diameter of rolls 31, 32: 320 mm

噴嘴14、24之處理寬度方向之噴出寬度:300 mm Spray width of the nozzles 14, 24 in the processing width direction: 300 mm

第1處理空間93之圓弧方向之周長:275 mm The circumference of the circular arc direction of the first processing space 93: 275 mm

第1處理空間93之厚度:5 mm Thickness of the first processing space 93: 5 mm

放電間隙39之最窄部之厚度:1 mm Thickness of the narrowest portion of the discharge gap 39: 1 mm

使用TAC膜作為被處理膜9。TAC膜9之寬度為325 mm。 A TAC film was used as the film 9 to be processed. The width of the TAC film 9 is 325 mm.

TAC膜9之搬送速度設為2.5 m/min。 The transport speed of the TAC film 9 was set to 2.5 m/min.

輥31、32之溫度、以及TAC膜9之溫度設定為35℃。 The temperatures of the rolls 31, 32 and the temperature of the TAC film 9 were set to 35 °C.

[第1處理步驟] [First Processing Step]

於氣化器11中使丙烯酸(聚合性單體)及甲基丙烯酸烯丙酯(交聯性添加成分)氣化於載氣(N2)中,生成第1氣體。氣化器11之溫度為130℃。第1氣體之各成分之流量如下所示。 In the vaporizer 11, acrylic acid (polymerizable monomer) and allyl methacrylate (crosslinkable additive component) are vaporized in a carrier gas (N 2 ) to form a first gas. The temperature of the gasifier 11 was 130 °C. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.015 g/min Allyl methacrylate 0.015 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.5 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 0.5 wt%.

自第1噴嘴14噴出上述第1氣體,使其接觸第1處理空間93內之TAC膜9。第1噴嘴14之設定溫度以及第1氣體之噴出溫度為75℃。 The first gas is ejected from the first nozzle 14 and brought into contact with the TAC film 9 in the first processing space 93. The set temperature of the first nozzle 14 and the discharge temperature of the first gas were 75 °C.

[第2處理步驟] [Second processing step]

其次,自第2噴嘴24將第2氣體導入至放電間隙39中且電漿化,使其接觸TAC膜9。 Next, the second gas is introduced into the discharge gap 39 from the second nozzle 24, and is plasmad to contact the TAC film 9.

第2氣體之組成僅為作為放電生成氣體之氮氣(N2),其流量為10 slm。 The composition of the second gas is only nitrogen (N 2 ) as a discharge generating gas, and the flow rate thereof is 10 slm.

第2噴嘴24之設定溫度以及第2氣體之噴出溫度為75℃。 The set temperature of the second nozzle 24 and the discharge temperature of the second gas were 75 °C.

用以實現電漿放電之供給電力為760 W(將400 V、1.9 A之直流進行高頻轉換)。 The power supply for plasma discharge is 760 W (high frequency conversion is performed at 400 V, 1.9 A DC).

電極31、32間之施加電壓為16.4 kV。 The applied voltage between the electrodes 31 and 32 was 16.4 kV.

[偏光板製作] [Polarization Plate Making]

於經表面處理後之TAC膜9的被處理面塗佈PVA系接著劑,與PVA膜貼合。作為PVA系接著劑,使用將(A)聚合度500之PVA之5 wt%水溶液、與(B)羧甲基纖維素鈉之2 wt%水溶液混合所成的水溶液。(A)與(B)之混合比(A):(B)=20:1。PVA系接著劑之乾燥條件設為80℃、5分鐘。 A PVA-based adhesive was applied to the surface to be treated of the surface-treated TAC film 9, and bonded to the PVA film. As the PVA-based adhesive, an aqueous solution obtained by mixing (A) a 5 wt% aqueous solution of PVA having a polymerization degree of 500 and a 2 wt% aqueous solution of (B) sodium carboxymethylcellulose was used. Mix ratio of (A) to (B) (A): (B) = 20:1. The drying conditions of the PVA-based adhesive were set to 80 ° C for 5 minutes.

於上述PVA膜之相反側之面,利用與上述相同之PVA系接著劑貼合經皂化處理之TAC膜。藉此,製作複數個三層結構之偏光板樣品。偏光板樣品之寬度設為1 inch。 The saponified TAC film was bonded to the surface on the opposite side of the PVA film by the same PVA-based adhesive as described above. Thereby, a plurality of polarized plate samples of three-layer structure were produced. The width of the polarizing plate sample was set to 1 inch.

[接著強度評價] [Follow strength evaluation]

接著劑硬化之後,對未經過後述之溫水處理之偏光板樣品,測定被處理TAC膜9與PVA膜之接著強度(拉伸強度)。測定方法係依據浮輥法(JIS K6854)。測定結果以5個偏光板樣品之平均值計為9.6 N/inch,可獲得充分之接著強度。 After the agent was hardened, the adhesion strength (tensile strength) of the treated TAC film 9 and the PVA film was measured for the polarizing plate sample which was not subjected to the warm water treatment described later. The measurement method is based on the floating roll method (JIS K6854). The measurement result was 9.6 N/inch as the average of the five polarizing plate samples, and sufficient bonding strength was obtained.

[耐溫水性評價] [temperature resistance evaluation]

對於剩餘之偏光板樣品,於上述PVA系接著劑硬化之後,實施溫水處理。即,將偏光板樣品浸漬於70℃之溫水 中3小時。於溫水處理後之偏光板樣品的被處理TAC膜9與PVA膜之間未確認到剝離。又,測定溫水處理後之偏光板樣品之褪色寬度。測定結果以5個偏光板樣品之平均值計為0.91 mm,可獲得充分之耐溫水性。 For the remaining polarizing plate samples, after the PVA-based adhesive was hardened, warm water treatment was performed. That is, the polarizing plate sample is immersed in warm water of 70 ° C In 3 hours. No peeling was observed between the treated TAC film 9 and the PVA film of the polarizing plate sample after the warm water treatment. Further, the fading width of the polarizing plate sample after the warm water treatment was measured. The measurement result was 0.91 mm based on the average of five polarizing plate samples, and sufficient temperature resistance was obtained.

[實施例2] [Embodiment 2]

實施例2中,於圖1之裝置1中,將第1處理步驟中第1氣體之各成分之流量設為如下所述。 In the second embodiment, in the apparatus 1 of Fig. 1, the flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.3 g/min Allyl methacrylate 0.3 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。除此以外之處理條件與實施例1設為相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=8.8 N/inch。耐溫水性評價之結果,褪色寬度=0.89 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 10 wt%. The processing conditions other than this are the same as those in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 8.8 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.89 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例3] [Example 3]

實施例3中,於圖1之裝置1中,將第1處理步驟中第1氣體之各成分之流量設為如下所述。 In the third embodiment, in the apparatus 1 of Fig. 1, the flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.03 g/min Allyl methacrylate 0.03 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的 含有率為1 wt%。除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=9.2 N/inch。耐溫水性評價之結果,褪色寬度=0.95 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 Therefore, the allyl methacrylate in the first gas is relative to acrylic acid. The content rate is 1 wt%. The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 9.2 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.95 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例4] [Example 4]

實施例4中,於圖1之裝置1中,將第1處理步驟中第1氣體之各成分之流量設為如下所述。 In the fourth embodiment, in the apparatus 1 of Fig. 1, the flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.1 g/min Allyl methacrylate 0.1 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為3.3 wt%。除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=8.9 N/inch。耐溫水性評價之結果,褪色寬度=0.92 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 3.3 wt%. The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 8.9 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.92 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例5] [Example 5]

實施例5中,於圖1之裝置1中,將第1處理步驟中第1氣體之各成分之流量設為如下所述。 In the fifth embodiment, in the apparatus 1 of Fig. 1, the flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為5 wt%。除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=9.1 N/inch。耐溫水性評價之結果,褪色寬度=0.86 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 5 wt%. The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 9.1 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.86 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例6] [Embodiment 6]

實施例6中,於圖1之裝置1中,將第1處理步驟中第1氣體之各成分之流量設為如下所述。 In the sixth embodiment, in the apparatus 1 of Fig. 1, the flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.2 g/min Allyl methacrylate 0.2 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為6.7 wt%。除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=8.7 N/inch。耐溫水性評價之結果,褪色寬度=0.9 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 6.7 wt%. The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 8.7 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.9 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[比較例1] [Comparative Example 1]

作為比較例,於圖1之裝置1中,不於第1氣體中添加交聯性添加成分。第1氣體之組成及各成分之流量如下所 述。 As a comparative example, in the apparatus 1 of Fig. 1, a crosslinkable additive component was not added to the first gas. The composition of the first gas and the flow rate of each component are as follows Said.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果為9.4 N/inch,獲得較高之接著強度。另一方面,耐溫水性評價之褪色寬度為5.35 mm。亦確認到被處理TAC膜9與PVA膜之間之剝離,耐溫水性與實施例1~6相比較低。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation was then 9.4 N/inch, and a higher adhesive strength was obtained. On the other hand, the fading width of the evaluation of the temperature resistance was 5.35 mm. Peeling between the treated TAC film 9 and the PVA film was also confirmed, and the temperature resistance and water resistance were lower than those of Examples 1 to 6.

[比較例2] [Comparative Example 2]

比較例2中,於圖1之裝置1中,將第1氣體之組成及各成分之流量設為如下所述。 In Comparative Example 2, in the apparatus 1 of Fig. 1, the composition of the first gas and the flow rate of each component were as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.005 g/min Allyl methacrylate 0.005 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.17 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 0.17 wt%.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果為9.5 N/inch,接著強度較高。另一方面,耐溫水性評價之褪色寬度為5.21 mm。亦確認到被處理TAC膜9與PVA膜之間之剝離,耐溫水性與實施例1~6相比較低。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation was then 9.5 N/inch, followed by a higher intensity. On the other hand, the fading width of the evaluation of the temperature resistance was 5.21 mm. Peeling between the treated TAC film 9 and the PVA film was also confirmed, and the temperature resistance and water resistance were lower than those of Examples 1 to 6.

[比較例3] [Comparative Example 3]

比較例3中,於圖1之裝置1中,將第1氣體之組成及各成分之流量設為如下所述。 In Comparative Example 3, in the apparatus 1 of Fig. 1, the composition of the first gas and the flow rate of each component were as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.5 g/min Allyl methacrylate 0.5 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為16.7 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 16.7 wt%.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。耐溫水性評價之褪色寬度為0.99 mm,耐溫水性較高。然而,接著強度評價之結果為2.5 N/inch,接著強度較低。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The fading width of the evaluation of the temperature resistance is 0.99 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation was 2.5 N/inch, and then the intensity was low.

表1中歸納實施例1~6之處理條件及結果,表2中歸納比較例1~3之處理條件及結果。根據該等實施例及比較例可確認,藉由於第1氣體中添加適量之交聯性添加成分,可將偏光板之接著強度維持為較高,且可提高耐溫水性。可認為其原因為,藉由交聯性添加成分可使丙烯酸之電漿聚合膜交聯化。尤其是藉由將第1氣體中之甲基丙烯酸烯丙酯之添加量設為0.5 wt%~10 wt%,可將偏光板之接著強度維持為較高,且可提高耐溫水性。另一方面,可判明若交聯性添加成分(甲基丙烯酸烯丙酯)之添加量為零或過小,則無法獲得所期望之耐溫水性,若上述添加量過大,則雖耐溫水性較高但接著強度受損。 The processing conditions and results of Examples 1 to 6 are summarized in Table 1, and the processing conditions and results of Comparative Examples 1 to 3 are summarized in Table 2. According to the examples and the comparative examples, it was confirmed that by adding an appropriate amount of the crosslinkable additive component to the first gas, the adhesion strength of the polarizing plate can be maintained high, and the temperature resistance can be improved. The reason for this is considered to be that the plasma polymerization film of acrylic acid can be crosslinked by the crosslinkable additive component. In particular, by adding the amount of allyl methacrylate in the first gas to 0.5 wt% to 10 wt%, the adhesion strength of the polarizing plate can be maintained high, and the temperature resistance can be improved. On the other hand, it has been found that if the addition amount of the crosslinkable additive component (allyl methacrylate) is too small or too small, the desired temperature resistance water cannot be obtained, and if the addition amount is too large, the temperature resistance is higher than that of the temperature-sensitive water. High but then the strength is impaired.

[實施例7] [Embodiment 7]

實施例7中,使用圖3所示之膜表面處理裝置1對TAC膜9進行表面處理。第1氣體之組成及各成分之流量設為如下所述,與實施例1相同。因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.5 wt%。 In the seventh embodiment, the TAC film 9 was subjected to surface treatment using the film surface treatment apparatus 1 shown in FIG. The composition of the first gas and the flow rate of each component are as follows, and are the same as in the first embodiment. Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 0.5 wt%.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.015 g/min Allyl methacrylate 0.015 g/min

於第2氣體中,除作為放電生成氣體之氮氣(N2)以外,添加氧氣(O2)。第2氣體之各成分之流量設為如下所述。 In the second gas, oxygen (O 2 ) is added in addition to nitrogen (N 2 ) as a discharge generating gas. The flow rate of each component of the second gas is as follows.

N2 10 slm N 2 10 slm

O2 40 sccm=0.04 slm O 2 40 sccm=0.04 slm

因此,第2氣體中之氧氣含有率相對於氮氣(放電生成氣體)為0.4 vol%。 Therefore, the oxygen content rate in the second gas is 0.4 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=8.1 N/inch。耐溫水性評價之結果,褪色寬度=0.55 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。尤其可大幅提高耐溫水性。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 8.1 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.55 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good. In particular, the temperature resistance can be greatly improved.

[實施例8] [Embodiment 8]

實施例8中,對實施例7(圖3)中第1氣體之各成分之流量進行如下變更。 In Example 8, the flow rate of each component of the first gas in Example 7 (Fig. 3) was changed as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.3 g/min Allyl methacrylate 0.3 g/min

因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 10 wt%.

第2氣體之組成及各成分之流量如下所述與實施例7相同。因此,第2氣體中之氧氣含有率相對於氮氣(放電生成 氣體)為0.4 vol%。 The composition of the second gas and the flow rate of each component are the same as in the seventh embodiment as described below. Therefore, the oxygen content in the second gas is relative to nitrogen (discharge generation The gas) is 0.4 vol%.

N2 10 slm N 2 10 slm

O2 40 sccm=0.04 slm O 2 40 sccm=0.04 slm

除此以外之處理條件設為與實施例1及實施例7相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1、7相同。接著強度評價之結果,接著強度=7.8 N/inch。耐溫水性評價之結果,褪色寬度=0.3 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。尤其可大幅提高耐溫水性。 The other processing conditions are the same as in the first embodiment and the seventh embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in Examples 1 and 7. The result of the strength evaluation is then followed by the intensity = 7.8 N/inch. As a result of the evaluation of the temperature resistance, the fading width = 0.3 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good. In particular, the temperature resistance can be greatly improved.

[比較例4] [Comparative Example 4]

比較例4中,於圖3之裝置1中,將第1氣體之組成及各成分之流量與實施例7相同地設為如下所述。因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.5 wt%。 In the comparative example 4, in the apparatus 1 of FIG. 3, the composition of the first gas and the flow rate of each component were set as follows in the same manner as in the seventh embodiment. Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 0.5 wt%.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.015 g/min Allyl methacrylate 0.015 g/min

第2氣體之組成及各成分之流量為如下所述,相對於實施例7而言將氧氣添加量變更。 The composition of the second gas and the flow rate of each component were as follows, and the amount of oxygen added was changed with respect to Example 7.

N2 10 slm N 2 10 slm

O2 70 sccm=0.07 slm O 2 70 sccm=0.07 slm

因此,第2氣體中之氧氣含量相對於氮氣(放電生成氣體)為0.7 vol%。 Therefore, the oxygen content in the second gas is 0.7 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件設為與實施例1、7相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1、7相同。耐溫水性評價之褪色寬度為0.49 mm,耐溫水性較高。然而,接著強度評價之結果為2.1 N/inch,接著強度較低。 The other processing conditions were the same as in the first and seventh embodiments. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in Examples 1 and 7. The fading width of the evaluation of the temperature resistance is 0.49 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation was 2.1 N/inch, and then the intensity was low.

[比較例5] [Comparative Example 5]

比較例5中,於圖3之裝置1中,將第1氣體之組成及各成分之流量如下所述般設為與實施例8相同。因此,第1氣體中之甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。 In the comparative example 5, in the apparatus 1 of FIG. 3, the composition of the first gas and the flow rate of each component were set to be the same as in the eighth embodiment as follows. Therefore, the content of allyl methacrylate in the first gas with respect to acrylic acid was 10 wt%.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.3 g/min Allyl methacrylate 0.3 g/min

第2氣體之組成及各成分之流量為如下所述,相對於實施例8而言將氧氣添加量變更。 The composition of the second gas and the flow rate of each component were as follows, and the amount of oxygen added was changed with respect to Example 8.

N2 10 slm N 2 10 slm

O2 70 sccm=0.07 slm O 2 70 sccm=0.07 slm

因此,第2氣體中之氧氣含量相對於氮氣(放電生成氣體)為0.7 vol%。 Therefore, the oxygen content in the second gas is 0.7 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件與實施例1、8相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1、8相同。耐溫水性評價之褪色寬度為0.32 mm,耐溫水性較高。然而,接著強度評價之結果為1.9 N/inch,接著強度較低。 The other processing conditions were the same as in Examples 1 and 8. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in Examples 1 and 8. The fading width of the evaluation of the temperature resistance is 0.32 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation was 1.9 N/inch, and then the intensity was low.

表3中歸納實施例7、8及比較例4、5之處理條件及結 果。根據該等實施例及比較例可確認,藉由不僅於第1氣體中添加適量交聯性添加成分,且進而於第2氣體中添加微量氧氣,可進一步提高偏光板之耐溫水性。可認為其原因為,藉由添加氧氣,丙烯酸之電漿聚合膜之疏水性提高。另一方面,可判明若第2氣體中之氧氣添加量過大,則會損及偏光板之接著強度。 Table 3 summarizes the processing conditions and knots of Examples 7 and 8 and Comparative Examples 4 and 5. fruit. According to the examples and the comparative examples, it was confirmed that the temperature resistance of the polarizing plate can be further improved by adding an appropriate amount of the crosslinkable additive component to the first gas and further adding a trace amount of oxygen to the second gas. The reason for this is considered to be that the hydrophobicity of the plasma polymer film of acrylic acid is improved by the addition of oxygen. On the other hand, it has been found that if the amount of oxygen added to the second gas is too large, the adhesion strength of the polarizing plate is impaired.

[實施例9] [Embodiment 9]

實施例9中,使用圖4所示之膜表面處理裝置1X對TAC膜 9進行表面處理。將來自第1氣體供給源11之第1氣體正好各一半地分流至2個第1噴嘴14A、14B。裝置1X整體中第1氣體之流量及各成分之流量比設為與第1實施形態相同。因此,對各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量為如下所述,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.5 wt%。 In Example 9, the TAC film was used using the film surface treatment apparatus 1X shown in FIG. 9 surface treatment. The first gas from the first gas supply source 11 is divided into exactly two halves to the two first nozzles 14A and 14B. The flow rate of the first gas and the flow ratio of each component in the entire apparatus 1X are the same as in the first embodiment. Therefore, the composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are as follows, and the content of allyl methacrylate relative to acrylic acid is 0.5 wt%.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.0075 g/min Allyl methacrylate 0.0075 g/min

又,將來自第2氣體供給源21之放電生成氣體(N2)正好各一半地分流至2個第2噴嘴24A、24B。對各第2處理空間39A、39B的放電生成氣體之供給流量為10 slm。 In addition, the discharge generated gas (N 2 ) from the second gas supply source 21 is divided into two second nozzles 24A and 24B. The supply flow rate of the discharge generating gas to each of the second processing spaces 39A and 39B was 10 slm.

中央之輥電極32上之供給電力為760 W(將400 V、1.9 A之直流進行高頻轉換)。將該電力之一半(380 W)消耗於前段之放電間隙39A的電漿放電,將剩餘一半(380 W)消耗於後段之放電間隙39B的電漿放電。輥電極31、32間之施加電壓及輥電極32、33間之施加電壓均為16.4 kV。 The power supplied to the center roller electrode 32 was 760 W (high frequency conversion was performed at 400 V, 1.9 A DC). One half of the power (380 W) is consumed by the plasma discharge of the discharge gap 39A of the preceding stage, and the remaining half (380 W) is discharged to the plasma discharge of the discharge gap 39B of the subsequent stage. The applied voltage between the roller electrodes 31 and 32 and the applied voltage between the roller electrodes 32 and 33 were both 16.4 kV.

輥31、32、33之設定溫度以及膜9之溫度為35℃。 The set temperatures of the rolls 31, 32, and 33 and the temperature of the film 9 were 35 °C.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=11.2 N/inch。耐溫水性評價之結果,褪色寬度=0.56 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均較實施例1更良好。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by an intensity of 11.2 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.56 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance were better than those of Example 1.

[實施例10] [Embodiment 10]

實施例10中,於實施例9(圖4)中將對各第1處理空間93A、93B之第1氣體成分之供給流量進行如下變更。 In the tenth embodiment, the supply flow rate of the first gas component in each of the first processing spaces 93A and 93B is changed as follows in the embodiment 9 (FIG. 4).

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 10 wt%.

除此以外之處理條件設為與實施例9相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例9相同。接著強度評價之結果,接著強度=10.3 N/inch。耐溫水性評價之結果,褪色寬度=0.48 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were set to be the same as in the ninth embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the ninth embodiment. The result of the strength evaluation is then followed by an intensity of 10.3 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.48 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[比較例6] [Comparative Example 6]

比較例6中,於圖4之裝置1X中,不於第1氣體中添加交聯性添加成分,使第1氣體之成分僅為丙烯酸(聚合性單體)及氮氣(載氣)。對各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量如下所述。 In the comparative example 6, in the apparatus 1X of FIG. 4, the crosslinkable additive component is not added to the first gas, and the components of the first gas are only acrylic acid (polymerizable monomer) and nitrogen gas (carrier gas). The composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are as follows.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

除此以外之處理條件設為與實施例9相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例9相同。接著強度評價之結果為10 N/inch,接著強度較高。另一方面,耐溫水性評價之褪色寬度為4.63 mm。亦確認到被處理TAC膜9與PVA膜之間之剝離,耐溫水性較低。 The processing conditions other than this were set to be the same as in the ninth embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the ninth embodiment. Then the result of the strength evaluation is 10 N/inch, then higher intensity. On the other hand, the fading width of the evaluation of the temperature resistance was 4.63 mm. Peeling between the treated TAC film 9 and the PVA film was also confirmed, and the temperature resistance was low.

[比較例7] [Comparative Example 7]

比較例7中,於圖4之裝置1X中,將各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量設為如下所述。 In the comparative example 7, in the apparatus 1X of FIG. 4, the composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are as follows.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.003 g/min Allyl methacrylate 0.003 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.2 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 0.2 wt%.

除此以外之處理條件設為與實施例9相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例9相同。接著強度評價之結果為10.1 N/inch,接著強度較高。另一方面,耐溫水性評價之褪色寬度為4.56 mm,亦確認到被處理TAC膜9與PVA膜之間之剝離,耐溫水性較低。 The processing conditions other than this were set to be the same as in the ninth embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the ninth embodiment. The result of the strength evaluation was then 10.1 N/inch, followed by a higher intensity. On the other hand, the fading width of the evaluation of the temperature resistance was 4.56 mm, and the peeling between the treated TAC film 9 and the PVA film was confirmed, and the temperature resistance was low.

[比較例8] [Comparative Example 8]

比較例8中,於圖4之裝置1X中,將各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量設為如下所述。 In the comparative example 8, in the apparatus 1X of FIG. 4, the composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are as follows.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.25 g/min Allyl methacrylate 0.25 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為16.7 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 16.7 wt%.

除此以外之處理條件設為與實施例9相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例9相同。耐溫水性評價之褪色寬度為0.87 mm,耐溫水性較高。然而,接著強度評價之結果為2.9 N/inch,接著強度較低。 The processing conditions other than this were set to be the same as in the ninth embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the ninth embodiment. The fading width of the evaluation of the temperature resistance is 0.87 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation was 2.9 N/inch, and then the intensity was low.

表4中歸納實施例9、10及比較例6~8之處理條件及結果。可確認,藉由於第1氣體中添加適量之交聯性添加成分,且將第1處理步驟及第2處理步驟反覆進行兩次,可進一步提高偏光板之接著強度,且可進一步提高耐溫水性。可認為其原因為,藉由利用交聯性添加成分進行2階段處理,可進一步提高丙烯酸之電漿聚合膜之交聯度。另一方面,可判明即便進行2階段處理,若交聯性添加成分(甲基丙烯酸烯丙酯)之添加量為零或過小,亦無法獲得所期望之耐溫水性,若上述添加量過大,則雖耐溫水性較高但會損及接著強度。 The processing conditions and results of Examples 9 and 10 and Comparative Examples 6 to 8 are summarized in Table 4. It has been confirmed that by adding an appropriate amount of the crosslinkable additive component to the first gas and repeating the first treatment step and the second treatment step twice, the adhesion strength of the polarizing plate can be further improved, and the temperature resistance can be further improved. . The reason for this is considered to be that the degree of crosslinking of the plasma polymerization film of acrylic acid can be further improved by performing the two-stage treatment using the crosslinkable additive component. On the other hand, it has been found that even if the two-stage treatment is carried out, if the addition amount of the crosslinkable additive component (allyl methacrylate) is too small or too small, the desired temperature resistance water cannot be obtained, and if the above addition amount is too large, Although the temperature resistance is higher, the strength is deteriorated.

[實施例11] [Example 11]

實施例11中,使用圖6所示之膜表面處理裝置1X對TAC膜9進行表面處理。將來自第1氣體供給源11之第1氣體正好各一半地分流至2個第1噴嘴14A、14B。各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量設為如下所述,與實施例9相同。 In the eleventh embodiment, the TAC film 9 was subjected to surface treatment using the film surface treatment apparatus 1X shown in Fig. 6. The first gas from the first gas supply source 11 is divided into exactly two halves to the two first nozzles 14A and 14B. The composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are as follows, and are the same as in the ninth embodiment.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.0075 g/min Allyl methacrylate 0.0075 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為0.5 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 0.5 wt%.

又,於第2氣體供給源22之第2氣體中,除作為放電生成氣體之氮氣(N2)以外亦添加氧氣(O2)。將該第2氣體正好各一半地分流至2個第2噴嘴24A、24B。各第2處理空間39A、39B中的第2氣體之組成及各成分之供給流量如下所述般設為與實施例7相同。 Further, in the second gas of the second gas supply source 22, oxygen (O 2 ) is added in addition to nitrogen (N 2 ) as a discharge generating gas. The second gas is divided into two second nozzles 24A and 24B exactly at half. The composition of the second gas and the supply flow rate of each component in each of the second processing spaces 39A and 39B are the same as those in the seventh embodiment as described below.

N2 10 slm N 2 10 slm

O2 40 sccm=0.04 slm O 2 40 sccm=0.04 slm

因此,第2氣體中之氧氣含有率相對於氮氣(放電生成氣體)為0.4 vol%。 Therefore, the oxygen content rate in the second gas is 0.4 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件設為與實施例9相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例9相同。接著強度評價之結果,接著強度=9.5 N/inch。耐溫水性評價之結果,褪色寬度 =0.51 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。尤其可大幅提高耐溫水性。 The processing conditions other than this were set to be the same as in the ninth embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the ninth embodiment. The result of the strength evaluation is then followed by the intensity = 9.5 N/inch. Temperature resistance evaluation result, fading width = 0.51 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good. In particular, the temperature resistance can be greatly improved.

[實施例12] [Embodiment 12]

實施例12中,於實施例11(圖6)中,將對各第1處理空間93A、93B之第1氣體成分之供給流量進行如下變更。 In the twelfth embodiment, in the eleventh embodiment (FIG. 6), the supply flow rate of the first gas component in each of the first processing spaces 93A and 93B is changed as follows.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 10 wt%.

除此以外之處理條件設為與實施例11相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例11相同。接著強度評價之結果,接著強度=9.5 N/inch。耐溫水性評價之結果,褪色寬度=0.31 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as in the eleventh embodiment. The order of preparation of the surface-treated polarizing plate samples, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the eleventh embodiment. The result of the strength evaluation is then followed by the intensity = 9.5 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.31 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[比較例9] [Comparative Example 9]

比較例9中,於圖6之裝置1中,將對各第2處理空間39A、39B之第2氣體成分之供給流量進行如下變更。 In the comparative example 9, in the apparatus 1 of FIG. 6, the supply flow rate of the second gas component of each of the second processing spaces 39A and 39B is changed as follows.

N2 10 slm N 2 10 slm

O2 70 sccm=0.07 slm O 2 70 sccm=0.07 slm

因此,第2氣體中之氧氣含有率相對於氮氣(放電生成氣體)為0.7 vol%。 Therefore, the oxygen content rate in the second gas is 0.7 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件設為與實施例11相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例11相同。耐溫水性評價之褪色寬度為0.56 mm,耐溫水性較高。然而,接著強度評價之結果為2 N/inch,接著強度較低。 The processing conditions other than this were the same as in the eleventh embodiment. The order of preparation of the surface-treated polarizing plate samples, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the eleventh embodiment. The fading width of the evaluation of the temperature resistance is 0.56 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation was 2 N/inch, and then the intensity was low.

[比較例10] [Comparative Example 10]

比較例10中,於圖6之裝置1中,將各第1處理空間93A、93B中的第1氣體之組成及各成分之供給流量如下述般設為與實施例12相同。 In the comparative example 10, the composition of the first gas and the supply flow rate of each component in each of the first processing spaces 93A and 93B are the same as those in the twelfth embodiment as follows.

載氣(N2) 15 slm Carrier gas (N 2 ) 15 slm

丙烯酸 1.5 g/min Acrylic 1.5 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

因此,甲基丙烯酸烯丙酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of allyl methacrylate relative to acrylic acid was 10 wt%.

又,各第2處理空間39A、39B中的第2氣體之組成及各成分之供給流量設為如下所述。 Moreover, the composition of the second gas and the supply flow rate of each component in each of the second processing spaces 39A and 39B are as follows.

N2 10 slm N 2 10 slm

O2 70 sccm=0.07 slm O 2 70 sccm=0.07 slm

因此,第2氣體中之氧氣含有率相對於氮氣(放電生成氣體)為0.7 vol%。 Therefore, the oxygen content rate in the second gas is 0.7 vol% with respect to nitrogen gas (discharge generating gas).

除此以外之處理條件設為與實施例11相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例11相同。耐溫水性評價之褪色寬度為0.29 mm,耐溫水性較高。然而,接著強度評價之結果 為1.8 N/inch,接著強度較低。 The processing conditions other than this were the same as in the eleventh embodiment. The order of preparation of the surface-treated polarizing plate samples, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the eleventh embodiment. The fading width of the evaluation of the temperature resistance is 0.29 mm, and the temperature resistance is high. However, the result of the subsequent strength evaluation It is 1.8 N/inch and then the intensity is low.

表5中歸納實施例11、12及比較例9、10之處理條件及結果。可確認,藉由於第1氣體中添加適量之交聯性添加成分,且於第2氣體中添加適量之氧氣,進而將第1處理步驟及第2處理步驟反覆進行兩次,可進一步提高偏光板之接著強度,且可進一步提高耐溫水性。另一方面,可判明若第2氣體之氧氣添加量過剩,則會損及偏光板之接著強度。 Table 5 summarizes the processing conditions and results of Examples 11 and 12 and Comparative Examples 9 and 10. It was confirmed that the polarizing plate can be further improved by adding an appropriate amount of the crosslinkable additive component to the first gas and adding an appropriate amount of oxygen to the second gas, and further repeating the first treatment step and the second treatment step twice. The strength is then increased, and the temperature resistance can be further improved. On the other hand, it has been found that if the amount of oxygen added to the second gas is excessive, the adhesion strength of the polarizing plate is impaired.

[實施例13] [Example 13]

實施例13中,代替甲基丙烯酸烯丙酯使用同樣作為二烯丙基化合物之順丁烯二酸二烯丙酯,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 13, as the allyl methacrylate, diallyl maleate, which is also a diallyl compound, was used as the crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

順丁烯二酸二烯丙酯 0.3 g/min Diallyl maleate 0.3 g/min

因此,第1氣體中之順丁烯二酸二烯丙酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of diallyl maleate in the first gas with respect to acrylic acid is 10 wt%.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度評價之結果,接著強度=8.2 N/inch。耐溫水性評價之結果,褪色寬度=0.98 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The result of the strength evaluation is then followed by the intensity = 8.2 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.98 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例14] [Embodiment 14]

實施例14中,代替甲基丙烯酸烯丙酯使用同樣作為二烯丙基化合物之1,7-辛二烯,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 14, as the allyl methacrylate, 1,7-octadiene which is also a diallyl compound was used as the crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

1,7-辛二烯 0.3 g/min 1,7-octadiene 0.3 g/min

因此,第1氣體中之1,7-辛二烯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of 1,7-octadiene in the first gas with respect to acrylic acid is 10 wt%.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度為8.3 N/inch,耐溫水性為褪色寬度=0.99 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The strength is then 8.3 N/inch and the temperature resistance is fading width = 0.99 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例15] [Example 15]

實施例15中,代替甲基丙烯酸烯丙酯使用1,7-辛二烯,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量如下所述。 In Example 15, 1,7-octadiene was used instead of allyl methacrylate as the crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

1,7-辛二烯 0.15 g/min 1,7-octadiene 0.15 g/min

因此,第1氣體中之1,7-辛二烯相對於丙烯酸的含有率為5 wt%。 Therefore, the content of 1,7-octadiene in the first gas with respect to acrylic acid was 5 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=8.9 N/inch。耐溫水性評價之結果,褪色寬度=0.99 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 8.9 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.99 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例16] [Example 16]

實施例16中,代替甲基丙烯酸烯丙酯使用作為炔烴化合物之3-甲基-1-丁炔-3-醇,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 16, 3-methyl-1-butyn-3-ol as an alkyne compound was used instead of allyl methacrylate as a crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

3-甲基-1-丁炔-3-醇 0.15 g/min 3-methyl-1-butyn-3-ol 0.15 g/min

因此,第1氣體中之3-甲基-1-丁炔-3-醇相對於丙烯酸的含有率為5 wt%。 Therefore, the content of 3-methyl-1-butyn-3-ol in the first gas with respect to acrylic acid was 5 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=8.3 N/inch。耐溫水性評價之結果,褪色寬度=1.55 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 8.3 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 1.55 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例17] [Example 17]

實施例17中,代替甲基丙烯酸烯丙酯使用作為炔烴化合物之3-甲基-1-戊炔-3-醇,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 17, 3-methyl-1-pentyn-3-ol as an alkyne compound was used instead of allyl methacrylate as a crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

3-甲基-1-戊炔-3-醇 0.15 g/min 3-methyl-1-pentyn-3-ol 0.15 g/min

因此,第1氣體中之3-甲基-1-戊炔-3-醇相對於丙烯酸的含有率為5 wt%。 Therefore, the content of 3-methyl-1-pentyn-3-ol in the first gas with respect to acrylic acid was 5 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=8.2 N/inch。耐溫水性評價之結果,褪色 寬度=1.49 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 8.2 N/inch. The result of the evaluation of the temperature resistance water, faded Width = 1.49 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例18] [Embodiment 18]

實施例18中,代替甲基丙烯酸烯丙酯使用作為矽烷氧化物之四乙氧基矽烷,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 18, tetraethoxy decane as a decane oxide was used instead of allyl methacrylate as a crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

四乙氧基矽烷 0.15 g/min Tetraethoxy decane 0.15 g/min

因此,第1氣體中之四乙氧基矽烷相對於丙烯酸的含有率為5 wt%。 Therefore, the content of tetraethoxysilane in the first gas with respect to acrylic acid is 5 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=9 N/inch。耐溫水性評價之結果,褪色寬度=1.22 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 9 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 1.22 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例19] [Embodiment 19]

實施例19中,代替甲基丙烯酸烯丙酯使用作為矽烷氧化物之乙烯基三甲氧基矽烷,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 19, vinyl trimethoxynonane as a decane oxide was used instead of allyl methacrylate as a crosslinkable additive component in the apparatus 1 of Fig. 1. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

乙烯基三甲氧基矽烷 0.15 g/min Vinyl trimethoxy decane 0.15 g/min

因此,第1氣體中之乙烯基三甲氧基矽烷相對於丙烯酸的含有率為5 wt%。 Therefore, the content of vinyltrimethoxynonane in the first gas with respect to acrylic acid is 5 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=9.6 N/inch。耐溫水性評價之結果,褪色寬度=0.9 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 9.6 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.9 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good.

[實施例20] [Example 20]

實施例20中,代替甲基丙烯酸烯丙酯使用甲基丙烯酸烯丙酯及乙烯基三甲氧基矽烷之2種,作為圖1之裝置1中之交聯性添加成分。第1氣體之各成分之流量為如下所述。 In Example 20, two kinds of allyl methacrylate and vinyltrimethoxydecane were used instead of the allyl methacrylate to obtain a crosslinkable additive component in the apparatus 1 of Fig. 1 . The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

乙烯基三甲氧基矽烷 0.15 g/min Vinyl trimethoxy decane 0.15 g/min

因此,第1氣體中相對於丙烯酸,交聯性添加成分(甲基丙烯酸烯丙酯+乙烯基三甲氧基矽烷)之合計含有率為10 wt%。 Therefore, the total content of the crosslinkable additive component (allyl methacrylate + vinyltrimethoxydecane) relative to acrylic acid in the first gas is 10 wt%.

除此以外之處理條件設為與實施例1及14相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1及14相同。接著強度評價之結果,接著強度=8.7 N/inch。耐溫水性評價之結果,褪色寬度=0.75 mm。於被處理TAC膜9與PVA膜之間未確認到剝 離。因此,接著強度及耐溫水性兩者均為良好。 The processing conditions other than this were the same as those of Examples 1 and 14. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as those of Examples 1 and 14. The result of the strength evaluation is then followed by the intensity = 8.7 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.75 mm. No peeling was confirmed between the treated TAC film 9 and the PVA film. from. Therefore, both the strength and the temperature and water resistance are good.

[實施例21] [Example 21]

實施例21中,與實施例7同樣地使用圖3所示之膜表面處理1進行表面處理。作為交聯性添加成分,使用甲基丙烯酸烯丙酯及乙烯基三甲氧基矽烷。第1處理步驟中之第1氣體之各成分之流量為如下所述。 In Example 21, surface treatment was carried out using the film surface treatment 1 shown in Fig. 3 in the same manner as in Example 7. As the crosslinkable additive component, allyl methacrylate and vinyl trimethoxy decane were used. The flow rate of each component of the first gas in the first treatment step is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸烯丙酯 0.15 g/min Allyl methacrylate 0.15 g/min

乙烯基三甲氧基矽烷 0.15 g/min Vinyl trimethoxy decane 0.15 g/min

因此,第1氣體中之交聯性添加成分(甲基丙烯酸烯丙酯+乙烯基三甲氧基矽烷)相對於丙烯酸的含有率為10 wt%。 Therefore, the content of the crosslinkable additive component (allyl methacrylate + vinyltrimethoxydecane) in the first gas with respect to acrylic acid is 10 wt%.

第2氣體之組成及各成分之流量如下所述般設為與實施例7相同。因此,第2氣體中之氧氣含有率相對於氮氣(放電生成氣體)為0.4 vol%。 The composition of the second gas and the flow rate of each component were the same as in the seventh embodiment as described below. Therefore, the oxygen content rate in the second gas is 0.4 vol% with respect to nitrogen gas (discharge generating gas).

N2 10 slm N 2 10 slm

O2 40 sccm=0.04 slm O 2 40 sccm=0.04 slm

除此以外之處理條件設為與實施例1及實施例7相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1、7相同。接著強度評價之結果,接著強度=7.7 N/inch。耐溫水性評價之結果,褪色寬度=0.29 mm。於被處理TAC膜9與PVA膜之間未確認到剝離。因此,接著強度及耐溫水性兩者均為良好。尤其可大幅提高耐溫水性。 The other processing conditions are the same as in the first embodiment and the seventh embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in Examples 1 and 7. The result of the strength evaluation is then followed by the intensity = 7.7 N/inch. As a result of the evaluation of the temperature resistance, the fading width was 0.29 mm. No peeling was observed between the treated TAC film 9 and the PVA film. Therefore, both the strength and the temperature and water resistance are good. In particular, the temperature resistance can be greatly improved.

[比較例11] [Comparative Example 11]

作為比較例11,於圖1之裝置1中,使用非交聯性之甲基丙烯酸甲酯作為第1氣體之添加成分。第1氣體之各成分之流量為如下所述。 As Comparative Example 11, in the apparatus 1 of Fig. 1, methyl non-crosslinkable methyl methacrylate was used as an additive component of the first gas. The flow rate of each component of the first gas is as follows.

載氣(N2) 30 slm Carrier gas (N 2 ) 30 slm

丙烯酸 3 g/min Acrylic 3 g/min

甲基丙烯酸甲酯 0.3 g/min Methyl methacrylate 0.3 g/min

因此,甲基丙烯酸甲酯相對於丙烯酸的含有率為10 wt%。 Therefore, the content of methyl methacrylate relative to acrylic acid is 10 wt%.

除此以外之處理條件與實施例1相同。表面處理後之偏光板樣品之製作順序、以及接著強度評價及耐溫水性評價之內容亦與實施例1相同。接著強度為7.9 N/inch。另一方面,耐溫水性為褪色寬度=4.32 mm。 The processing conditions other than the above were the same as in the first embodiment. The order of preparation of the polarizing plate samples after the surface treatment, and the evaluation of the subsequent strength and the evaluation of the temperature resistance and water resistance were also the same as in the first embodiment. The intensity is then 7.9 N/inch. On the other hand, the temperature resistance is fading width = 4.32 mm.

表6~8中歸納實施例13~21及比較例11之處理條件及結果。使用順丁烯二酸二烯丙酯或1,7-辛二烯等甲基丙烯酸烯丙酯以外之二烯丙基化合物作為第1氣體之交聯性添加成分時,亦可將接著強度維持為較高且提高耐溫水性。即,藉由使用具有2個以上不飽和鍵之不飽和烴化合物作為交聯性添加成分,可將接著強度維持為較高且提高耐溫水性。又,使用3-甲基-1-丁炔-3-醇或3-甲基-1-戊炔-3-醇等炔烴化合物即具有三鍵之不飽和烴化合物作為交聯性添加成分時,亦可將接著強度維持為較高且提高耐溫水性。進而,使用四乙氧基矽烷或乙烯基三甲氧基矽烷等矽烷氧化物化合物作為交聯性添加成分時,亦可將接著強度維持 為較高且提高耐溫水性。將該等交聯性添加成分混合複數種而使用時,亦可將接著強度維持為較高且提高耐溫水性。另一方面,於第1氣體之添加成分不具有交聯性之情形(比較例11)時,耐溫水性幾乎未提高。 The treatment conditions and results of Examples 13 to 21 and Comparative Example 11 are summarized in Tables 6 to 8. When a diallyl compound other than allyl methacrylate such as diallyl maleate or 1,7-octadiene is used as the crosslinkable component of the first gas, the strength can be maintained. It is higher and improves the temperature resistance. In other words, by using an unsaturated hydrocarbon compound having two or more unsaturated bonds as a crosslinkable additive component, the adhesive strength can be maintained high and the temperature resistance can be improved. Further, when an alkyne compound such as 3-methyl-1-butyn-3-ol or 3-methyl-1-pentyn-3-ol, that is, an unsaturated hydrocarbon compound having a triple bond, is used as a crosslinkable additive component It is also possible to maintain the subsequent strength to be high and to improve the temperature resistance. Further, when a decane oxide compound such as tetraethoxysilane or vinyltrimethoxydecane is used as a crosslinkable component, the strength can be maintained. It is higher and improves the temperature resistance. When the crosslinkable component is mixed and used in plural amounts, the adhesive strength can be maintained high and the temperature resistance can be improved. On the other hand, in the case where the additive component of the first gas does not have crosslinkability (Comparative Example 11), the temperature resistant water resistance hardly increases.

[產業上之可利用性] [Industrial availability]

本發明可應用於製造例如平板顯示器(FPD)之偏光板。 The present invention is applicable to the manufacture of a polarizing plate such as a flat panel display (FPD).

1‧‧‧膜表面處理裝置 1‧‧‧ Film surface treatment device

1X‧‧‧膜表面處理裝置 1X‧‧‧ film surface treatment device

3‧‧‧支持部兼搬送單元 3‧‧‧Support and transport unit

9‧‧‧被處理膜 9‧‧‧Processed film

9c‧‧‧折返部分 9c‧‧‧return part

10‧‧‧第1氣體供給系統 10‧‧‧1st gas supply system

11‧‧‧氣化器(生成部) 11‧‧‧ gasifier (generating department)

13‧‧‧第1氣體供給管路 13‧‧‧1st gas supply line

14‧‧‧第1噴嘴 14‧‧‧1st nozzle

14A‧‧‧第1噴嘴 14A‧‧‧1st nozzle

14B‧‧‧第1噴嘴 14B‧‧‧1st nozzle

14e‧‧‧噴出口 14e‧‧‧Spray outlet

15‧‧‧遮蔽構件 15‧‧‧Shielding members

15A‧‧‧遮蔽構件 15A‧‧‧Shielding members

15B‧‧‧遮蔽構件 15B‧‧‧Shielding members

20‧‧‧第2氣體供給系統 20‧‧‧2nd gas supply system

21‧‧‧第2氣體供給源 21‧‧‧2nd gas supply source

22‧‧‧第2氣體供給源 22‧‧‧2nd gas supply source

23‧‧‧第2氣體供給管路 23‧‧‧2nd gas supply line

24‧‧‧第2噴嘴 24‧‧‧2nd nozzle

24A‧‧‧第2噴嘴 24A‧‧‧2nd nozzle

24B‧‧‧第2噴嘴 24B‧‧‧2nd nozzle

25‧‧‧阻塞部 25‧‧‧Blocking Department

31‧‧‧第1輥(電極) 31‧‧‧1st roll (electrode)

32‧‧‧第2輥(電極) 32‧‧‧2nd roller (electrode)

33‧‧‧第3輥(電極) 33‧‧‧3rd roller (electrode)

36‧‧‧導輥 36‧‧‧guide roller

36A‧‧‧導輥 36A‧‧·guide roller

36B‧‧‧導輥 36B‧‧·guide roller

39‧‧‧電漿放電間隙(第2處理空間) 39‧‧‧ Plasma discharge gap (2nd processing space)

39A‧‧‧電漿放電間隙(第2處理空間) 39A‧‧‧ Plasma discharge gap (2nd processing space)

39B‧‧‧電漿放電間隙(第2處理空間) 39B‧‧‧ Plasma discharge gap (2nd processing space)

91‧‧‧第1處理部 91‧‧‧First Processing Department

92‧‧‧第2處理部 92‧‧‧2nd Processing Department

93‧‧‧第1處理空間 93‧‧‧1st processing space

圖1係表示本發明之第1實施形態之膜表面處理裝置的側 視圖。 Fig. 1 is a side view showing a film surface treatment apparatus according to a first embodiment of the present invention. view.

圖2係上述膜表面處理裝置之立體圖。 Fig. 2 is a perspective view of the above film surface treatment apparatus.

圖3係表示本發明之第2實施形態之膜表面處理裝置的側視圖。 Fig. 3 is a side view showing a film surface treatment apparatus according to a second embodiment of the present invention.

圖4係表示本發明之第3實施形態之膜表面處理裝置的側視圖。 Fig. 4 is a side view showing a film surface treatment apparatus according to a third embodiment of the present invention.

圖5係上述第3實施形態之膜表面處理裝置的立體圖。 Fig. 5 is a perspective view of the film surface treatment apparatus according to the third embodiment.

圖6係表示本發明之第4實施形態之膜表面處理裝置的側視圖。 Fig. 6 is a side view showing a film surface treatment apparatus according to a fourth embodiment of the present invention.

1‧‧‧膜表面處理裝置 1‧‧‧ Film surface treatment device

3‧‧‧支持部兼搬送單元 3‧‧‧Support and transport unit

9‧‧‧被處理膜 9‧‧‧Processed film

9c‧‧‧折返部分 9c‧‧‧return part

10‧‧‧第1氣體供給系統 10‧‧‧1st gas supply system

11‧‧‧氣化器(生成部) 11‧‧‧ gasifier (generating department)

13‧‧‧第1氣體供給管路 13‧‧‧1st gas supply line

14‧‧‧第1噴嘴 14‧‧‧1st nozzle

14e‧‧‧噴出口 14e‧‧‧Spray outlet

15‧‧‧遮蔽構件 15‧‧‧Shielding members

20‧‧‧第2氣體供給系統 20‧‧‧2nd gas supply system

21‧‧‧第2氣體供給源 21‧‧‧2nd gas supply source

23‧‧‧第2氣體供給管路 23‧‧‧2nd gas supply line

24‧‧‧第2噴嘴 24‧‧‧2nd nozzle

25‧‧‧阻塞部 25‧‧‧Blocking Department

31‧‧‧第1輥(電極) 31‧‧‧1st roll (electrode)

32‧‧‧第2輥(電極) 32‧‧‧2nd roller (electrode)

36‧‧‧導輥 36‧‧‧guide roller

39‧‧‧電漿放電間隙(第2處理空間) 39‧‧‧ Plasma discharge gap (2nd processing space)

91‧‧‧第1處理部 91‧‧‧First Processing Department

92‧‧‧第2處理部 92‧‧‧2nd Processing Department

93‧‧‧第1處理空間 93‧‧‧1st processing space

Claims (7)

一種膜表面處理方法,其特徵在於:其係於樹脂製之被處理膜之表面上使聚合性單體進行電漿聚合,而於上述表面被覆上述聚合性單體的聚合物之膜者,且包括:第1處理步驟,使含有氣化之上述聚合性單體、及可使上述聚合物進行電漿交聯之交聯性添加成分的第1氣體接觸上述被處理膜;及第2處理步驟,於上述第1處理步驟後或與上述第1處理步驟併行地,將放電生成氣體電漿化並接觸上述被處理膜;且上述聚合性單體為具有不飽和鍵及特定之官能基之單體,上述特定之官能基係選自由羥基、羧基、乙醯基、碳數1~10之酯基、碸基、以及醛基所組成之群;上述交聯性添加成分係選自由具有2個以上不飽和鍵之不飽和烴化合物、具有三鍵之不飽和烴化合物、以及金屬烷氧化物化合物所組成之群;將上述第1氣體中之上述交聯性添加成分相對於上述聚合性單體的含有率調節為0.5wt%~10wt%。 A film surface treatment method which is characterized in that a polymerizable monomer is subjected to plasma polymerization on a surface of a resin-treated film, and a film of a polymer of the polymerizable monomer is coated on the surface, and In the first processing step, the first gas containing the vaporized monomer and the crosslinkable component capable of plasma crosslinking the polymer is brought into contact with the film to be treated; and the second treatment step After the first processing step or in parallel with the first processing step, the discharge generating gas is plasma-treated and contacts the processed film; and the polymerizable monomer is a single having an unsaturated bond and a specific functional group. The specific functional group is selected from the group consisting of a hydroxyl group, a carboxyl group, an ethyl fluorenyl group, an ester group having 1 to 10 carbon atoms, a mercapto group, and an aldehyde group; and the crosslinkable additive component is selected from the group consisting of 2 a group consisting of an unsaturated hydrocarbon compound having an unsaturated bond, an unsaturated hydrocarbon compound having a triple bond, and a metal alkoxide compound; and the crosslinkable component in the first gas is added to the polymerizable single The content ratio is adjusted to 0.5wt% ~ 10wt%. 如請求項1之膜表面處理方法,其中上述交聯性添加成分為二烯丙基化合物、炔烴化合物、或金屬矽烷氧化物化合物。 The film surface treatment method of claim 1, wherein the crosslinkable additive component is a diallyl compound, an alkyne compound, or a metal decane oxide compound. 如請求項1之膜表面處理方法,其中上述交聯性添加成分係選自由甲基丙烯酸烯丙酯、順丁烯二酸二烯丙酯、1,7-辛二烯、3-甲基-1-丁炔-3-醇、3-甲基-1-戊炔-3-醇、 作為金屬矽烷氧化物化合物之四乙氧基矽烷、作為金屬矽烷氧化物化合物之乙烯基三甲氧基矽烷所組成之群中的至少1種。 The membrane surface treatment method of claim 1, wherein the crosslinkable additive component is selected from the group consisting of allyl methacrylate, diallyl maleate, 1,7-octadiene, 3-methyl- 1-butyn-3-ol, 3-methyl-1-pentyn-3-ol, At least one selected from the group consisting of tetraethoxy decane of a metal decane oxide compound and vinyl trimethoxy decane which is a metal decane oxide compound. 如請求項1至3中任一項之膜表面處理方法,其中於上述第2處理步驟中,將於上述放電生成氣體中添加氧氣而成之第2氣體電漿化並接觸上述被處理膜,上述第2氣體之氧氣含有率係相對於上述放電生成氣體為0.5vol%以下。 The film surface treatment method according to any one of claims 1 to 3, wherein in the second processing step, the second gas obtained by adding oxygen to the discharge generating gas is plasma-treated and contacts the film to be processed. The oxygen content of the second gas is 0.5 vol% or less based on the discharge generating gas. 一種膜表面處理裝置,其特徵在於:其係於樹脂製之被處理膜之表面上使聚合性單體進行電漿聚合,而於上述表面被覆上述聚合性單體的聚合物之膜者,且包括:生成部,其生成含有上述聚合性單體、及可使上述聚合物進行電漿交聯之交聯性添加成分的第1氣體;第1噴嘴,其將上述第1氣體噴附至上述被處理膜上;一對電極,其藉由於相互間之間隙內施加電場而生成大氣壓附近之放電;第2噴嘴,其對上述間隙供給放電生成氣體;及搬送機構,其將上述被處理膜以經過面向上述第1噴嘴之第1處理空間後通過上述間隙之方式搬送;且上述聚合性單體為具有不飽和鍵及特定之官能基之單體,上述特定之官能基係選自由羥基、羧基、乙醯基、碳數1~10之酯基、碸基、以及醛基所組成之群;上述交聯性添加成分係選自由具有2個以上不飽和鍵之不飽和烴化合物、具有三鍵之不飽和烴化合物、以及 金屬烷氧化物化合物所組成之群;利用上述生成部,將上述第1氣體中之上述交聯性添加成分相對於上述聚合性單體的含有率調節為0.5wt%~10wt%。 A film surface treatment apparatus which is obtained by plasma-polymerizing a polymerizable monomer on a surface of a resin-made film to be coated, and coating a polymer of the polymerizable monomer on the surface thereof, and The production unit includes a first gas containing the polymerizable monomer and a crosslinkable additive component capable of plasma-crosslinking the polymer, and a first nozzle that sprays the first gas to the above a pair of electrodes on which a discharge in the vicinity of atmospheric pressure is generated by applying an electric field in a gap therebetween; a second nozzle that supplies a discharge generating gas to the gap; and a transfer mechanism that treats the film to be processed The first processing space facing the first nozzle is transported through the gap; and the polymerizable monomer is a monomer having an unsaturated bond and a specific functional group, and the specific functional group is selected from a hydroxyl group and a carboxyl group. a group consisting of an oxime group, an ester group having 1 to 10 carbon atoms, a mercapto group, and an aldehyde group; the crosslinkable additive component is selected from the group consisting of unsaturated hydrocarbon compounds having two or more unsaturated bonds, Unsaturated hydrocarbon compounds of the triple bond, and In the group of the metal alkoxide compounds, the content of the crosslinkable component in the first gas with respect to the polymerizable monomer is adjusted to 0.5% by weight to 10% by weight. 如請求項5之膜表面處理裝置,其中上述第2噴嘴將於上述放電生成氣體中添加氧氣而成之第2氣體供給於上述間隙,上述第2氣體之氧氣含有率係相對於上述放電生成氣體為0.5vol%以下。 The membrane surface treatment apparatus according to claim 5, wherein the second nozzle supplies a second gas obtained by adding oxygen to the discharge generating gas to the gap, and the oxygen content of the second gas is relative to the discharge generating gas. It is 0.5 vol% or less. 如請求項5或6之膜表面處理裝置,其中上述交聯性添加成分係選自由甲基丙烯酸烯丙酯、順丁烯二酸二烯丙酯、1,7-辛二烯、3-甲基-1-丁炔-3-醇、3-甲基-1-戊炔-3-醇、作為金屬矽烷氧化物化合物之四乙氧基矽烷、作為金屬矽烷氧化物化合物之乙烯基三甲氧基矽烷所組成之群中的至少1種。 The membrane surface treating apparatus according to claim 5 or 6, wherein the crosslinkable additive component is selected from the group consisting of allyl methacrylate, diallyl maleate, 1,7-octadiene, 3-methyl 1-butyn-3-ol, 3-methyl-1-pentyn-3-ol, tetraethoxynonane as a metal decane oxide compound, vinyl trimethoxy as a metal decane oxide compound At least one of the group consisting of decane.
TW101131620A 2011-08-30 2012-08-30 Membrane surface treatment method and device TWI522400B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011187686 2011-08-30

Publications (2)

Publication Number Publication Date
TW201313795A TW201313795A (en) 2013-04-01
TWI522400B true TWI522400B (en) 2016-02-21

Family

ID=47756203

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101131620A TWI522400B (en) 2011-08-30 2012-08-30 Membrane surface treatment method and device

Country Status (5)

Country Link
JP (1) JP5926269B2 (en)
KR (1) KR101930972B1 (en)
CN (1) CN103619926B (en)
TW (1) TWI522400B (en)
WO (1) WO2013031714A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5935051B2 (en) * 2014-08-05 2016-06-15 株式会社潤工社 Fluoropolymer tube
CN104882544A (en) * 2015-05-04 2015-09-02 复旦大学 Method of manufacturing multilayer organic electronic device through plasma cross-linking technology
AU2016275278A1 (en) 2015-06-09 2018-02-01 P2I Ltd Coatings
CN108562736A (en) * 2018-01-03 2018-09-21 兰州大学 Immunoassay device based on microwell array chip and Intelligent mobile equipment and method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AR009439A1 (en) * 1996-12-23 2000-04-12 Novartis Ag AN ARTICLE THAT INCLUDES A SUBSTRATE WITH A PRIMARY POLYMERIC COATING THAT CARRIES REACTIVE GROUPS PREDOMINANTLY ON ITS SURFACE, A METHOD FOR PREPARING SUCH AN ARTICLE, AN ARTICLE THAT HAS A HYBRID-TYPE COATING AND A CONTACT LENS
JP2009025604A (en) * 2007-07-20 2009-02-05 Konica Minolta Opto Inc Polarizing plate protective film, method and apparatus for manufacturing the same, and polarizing plate, method for manufacturing the same, and display device
WO2010073626A1 (en) * 2008-12-25 2010-07-01 積水化学工業株式会社 Method and device for treating film surface and process for producing polarizer
JP2010150372A (en) * 2008-12-25 2010-07-08 Sekisui Chem Co Ltd Method and device for surface treatment of film, and method for manufacturing polarizing plate
CN102459353A (en) * 2009-06-26 2012-05-16 积水化学工业株式会社 Method and device for treating film surface and method for production of polarising plate
JP5167431B2 (en) * 2010-03-09 2013-03-21 積水化学工業株式会社 Film surface treatment equipment
WO2012117933A1 (en) 2011-02-28 2012-09-07 積水化学工業株式会社 Film surface treatment method and device
JP5039220B1 (en) * 2011-03-30 2012-10-03 積水化学工業株式会社 Film surface treatment method and apparatus

Also Published As

Publication number Publication date
TW201313795A (en) 2013-04-01
KR20140063519A (en) 2014-05-27
WO2013031714A1 (en) 2013-03-07
CN103619926A (en) 2014-03-05
CN103619926B (en) 2016-03-02
JPWO2013031714A1 (en) 2015-03-23
KR101930972B1 (en) 2018-12-19
JP5926269B2 (en) 2016-05-25

Similar Documents

Publication Publication Date Title
WO2010150551A1 (en) Method and device for treating film surface and method for production of polarising plate
TWI522400B (en) Membrane surface treatment method and device
KR101345889B1 (en) Method for treating film surface, method for producing polarizing plate, and surface treatment apparatus
JP5006951B2 (en) Film surface treatment equipment
Zhang et al. Recent progress on non-thermal plasma technology for high barrier layer fabrication
TWI417326B (en) Film surface treatment device
JP2010150373A (en) Surface treating method and adhesion method of film, and method of manufacturing polarizing plate
WO2010073626A1 (en) Method and device for treating film surface and process for producing polarizer
JP5039220B1 (en) Film surface treatment method and apparatus
WO2012117933A1 (en) Film surface treatment method and device
JP5816891B2 (en) Method for depositing thin film on substrate for deposition and sputtering apparatus
JP2020023121A (en) Laminated film, and silicone resin molded body
WO2012043385A1 (en) Film surface treatment method and device
WO2013047279A1 (en) Method for starting surface treatment of film and surface-treatment device
JP4299586B2 (en) Surface modification and adhesion method
JP2011074362A (en) Method and apparatus for surface-treating film and method for producing polarizing plate
JP5253838B2 (en) Thin film manufacturing method
JP2011201970A (en) Film surface treatment apparatus