201240744 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種用於去除固著於液晶面板等板狀構 件之異物之洗淨裝置及洗淨方法。 【先前技術】 如圖ίο所不’作為自先前用於去除固著於液晶面板之 異物之洗淨裝置，已知有如下之洗淨裝置21，其設置於併 設具有複數個橡膠製環24a之搬送滾輪24及輔助滾輪h 之搬送路徑間，使用洗淨片職淨沿搬送路徑搬送之液晶 面板22之表面背面（例如參照專利文獻1 )。 該洗淨裝置21為洗淨液晶面板22之表面背面，且備 以夾持液晶面板22之表面背面之方i 、 r 牙囟之方式配置於搬送路徑兩側 之—組洗淨手段23a、23b(參照圖w⑻卜 该洗淨手段23a (23b)且有·咕| ； 之送出、接而，， 八有”先淨片30、進行洗淨片30 、 之送出滾輪26及捲取滾輪27、將洗f # 3{) 按歷於液晶面板22而形占、^ 將洗淨片30 於洗淨片30+ 也成洗淨面3〇a(鳩）之按壓部28。 爭片3G中，使用塗佈有研磨材之不織布。 又’該洗淨裝置21係藉由使—組 -邊向同方向旋轉（再者手奴23a、23b 上方觀察之情形時之旋轉方向，以；為自洗淨裝置之 向之狀態於與搬送方向正同），-邊以相對 淨液晶面板22之表面背“ °進们主返移動，從而洗 根據該洗淨裝==參照圓!。(A))。 面’故可將節拍時間（5時洗淨液晶面板22之表面背 (洗淨-片液晶面板22所需之時間) 201240744 縮短至—定程度β [先行技術文獻] [專利文獻] [專利文獻1]曰本特開2001-62696號公報 【發明内容】 [發明所欲解決之問題] 然而，於先前之洗淨裝置21中’因一組洗淨手段23a、 23b向同方向旋轉，故該旋轉方向之力合成而施加於液晶面 板22，存在於洗淨中液晶面板22發生位置偏移之虞❶因此， 於使用先前之洗淨裝置21洗淨液晶面板22之情形時，需 要夾住液晶面板22之側面而用於防止位置偏移之位置偏移 防止手段3 1，該位置偏移防止手段3丨導致設備成本之增大。 進而，於先前之洗淨裝置21中，因一組洗淨手段23a、 23b以相對向之狀態於與搬送方向正《之方向進行往返移 動，故為無遺漏地洗淨液晶面板22之表面背面整體，每次 使洗淨手段23a、23b移動時，需要以既定間距間歇性地搬 送液晶面板2 2。因此，參俞·夕冰、鬼^ m 无刖之/先爭裝置21難以進而縮短節 拍時間。 又’先前之洗淨裝置21係使用塗佈有研磨材之不織布 作為洗淨片30,因洗淨面3〇a、3〇b實際上為平坦面故無 法充分地去除固著於液晶面板22之表面背面之玻璃屑等異 物，又，即便能夠去除，亦存在絲之異物夾人洗淨片30 與液晶面板22之間而於洗淨中損傷液晶面板22之虞。 進而’因先前之洗淨裝置21係具有用於進行洗淨片3〇 4 201240744 之送出及捲取之送出滾輪26及捲取滾輪27，故產生導致裝 置大型化、複雜化之問題、或洗淨片3G之交換花費時間: 問題。 本發明係雲於上述情況而完成者，其課題在於提供一 種洗淨裝置及洗淨方法，可於洗淨中不使液晶面板之位置 偏移發生而確實地去除固著於液晶面板之表面背面之玻璃 屑4異物。 [解決問題之手段] 淨針上述課題，本發明之洗淨裝置係具備以夾持洗 L=送中之板狀構件表面背面之方式且分別_ 狀配置於搬送路徑兩側之複數個洗淨手段，且一邊 構件供給洗淨液，一邊使洗淨手段旋轉洗淨搬送中之板狀 構件者，其特徵在於·· τ之板狀 複數個洗淨手段包含複數個配置於搬送路徑一 1 個洗淨手段、以及以與該洗淨手段 式配置於搬送路經另一側之i個法審^軸上相對向之方 具有複數個凸部隔著二::先：手段所構成之組，且 p隔耆既疋之間距連續配置之洗淨面，且構 s .且之洗淨手段係、洗淨面之旋轉方向為相反。 根據該構成，因於同一軸上相對向之洗淨手段 面於相反方向旋轉’故從配置於搬送路徑一側之洗淨手段 於板狀構件（例如a 方W 板）一側之面（表面）施加旋轉 ==與從配置於另一側之洗淨手段於板狀構件另二 貝 面）施加旋轉方向之力相抵消。因此，無+ 搬送路徑設置位晋 無而於 置偏移防止手段，就能防止板狀構件之位 201240744 置偏移i%而，根據該構成，將複數個洗淨手段以錯齒狀 配置’因無需使板狀構件停止就能以固定之搬送速度一邊 搬送一邊洗淨，故可進而縮短節拍時間。 又，根據該構成，藉由隔著既定之間距連續配置複數 個凸部，可確實地去除玻璃屑。進而，根據該構成，因將 去除之玻璃4收納於凸部間之，故可防止去除之玻璃 屑夾入洗淨面與板狀構件之間而導致板狀構件損傷。 又，上述洗淨手段係可以下述之機構構成：旋轉頭， 繞與搬送中之板狀構件表面背面垂直之軸旋轉；圓形盤， 於中〜。又置有第1貫通孔，且可裝卸地安裝於旋轉頭上； 洗淨墊，具有於中心設置有與第1貫通孔連通之第2貫通 孔之洗淨面，且安裝於圓形盤；洗淨液供給機構，經由第i 貫通孔及第2貫通孔對板狀構件供給洗淨液；升降機構， 使洗淨墊相對於板狀構件之表面或背面升降。進而，本發 明之洗淨裝置更具備於各洗淨手段進一步具備個別地控制 升降機構之控制手段之構成。 根據該構成，因圓形盤可裝卸地安裝，故可卸除圓形 盤而容易地交換洗淨墊。 進而，根據該構成，因每個洗淨手段具備個別控制升 降機構之控制手段，故即便為不同大小或厚度之板狀構件 亦可用1台洗淨裝置洗淨。 又’本發明之洗淨裝置較佳為將上述凸部之高度設為 100 μιη 以上、1000 μηι 以下。 根據該構成，藉由將凸部之高度設為100 μπι以上、1〇〇〇 6 201240744 二下之：保持凸部自身之強度同時凸部之高度高於-般 破W之最大高度，故可於洗淨中向所有高卢之 玻璃屑施加衝擊’從而可更確實地去除玻璃屑。a 又，為解決上述課題，本發明之洗淨方法包含 ==步驟’該搬送步驟沿著搬送路徑搬送洗淨對象即 終·先淨液，Γ先淨步耗於搬送步驟…邊對板狀構件供 :洗，液-邊使以夾持板狀構件表面f面之方式於上述搬 分別配置成鑛齒狀之複數個洗淨手段旋轉以洗 淨板狀構件，其特徵在於： 於洗淨步驟，使具有複數個凸部相隔既定間隔連續排 列之洗淨面之複數個洗淨手段之中、配置於搬送路徑一側 之1個洗淨手段、與該洗淨手段於同轴上相對向之方式配 置於搬送路徑另—側之1個洗淨手段構成之洗淨手段之洗 淨面於反方向旋轉。 根據該構成，因從配置於搬送路經一側之洗淨手段施 加於板狀構件表面之旋轉方向之力、與從配置於另一側之 洗淨手段施加於板狀構件背面之旋轉方向之力相抵消，故 無需於搬送路徑設置位置偏移防止手段就能防止板狀構件 之位置偏移。進而’根據該構成’因無需使板狀構件停止 可以固定之搬送速度-邊搬送一邊洗淨，故可進而縮短洗 淨步驟之節拍時間。 又，根據該構成，藉由隔著既定之間距連續配置之複 數個凸部’可確實地去除玻璃屑。進而，根據該構成，因 Μ除之玻璃Μ納於凸„之間隙’故可防止玻璃屑夾 201240744 入洗淨面與板狀構件之間而導致板狀構件損傷。 構件被搬明之洗淨方法係亦可設為於搬送步驟中板狀 降，並以既定壓力對板狀構件加壓。 #件升 控制手：發:之洗淨方法係亦可於各洗淨手段個別地 手段之升卜根據該構成，即便為 度之板狀構件可用1台洗淨裝置洗淨。 厚 [發明效果] 根據本發明，可提供一種洗淨裝置及洗淨方法，可於 洗淨中不發生使板狀構件之位置偏移就可確實地去除固著 於板狀構件表面背面之玻璃屑等異物。 【實施方式】 以下，參照隨附圖式，說明本發明較佳之實施形態。 [洗淨裝置] ~ ，本實施形態之洗淨裝置1示於圓1。如該圖所示，本實 施形態之洗淨裝置1係、設置於併設具有複數個橡膠製環4a 之搬送滾輪4及輔助滾輪5之搬送路徑間，並洗淨沿搬送 路控搬送之液晶面板2 (相#於本發明之「板狀構件」）之 表面背面者。再者’搬送之液晶面板2係於表面背面貼附 偏光膜前之狀態者，力2片玻璃基板之間密封有液晶。 洗淨裝置1具備以夾持搬送之液晶面板2之表面背面 之方式配置於搬送路徑兩側（上下）之複數個洗淨手段h、 3b。複數個洗淨手段3a、3b係以鋸齒狀配置於各側，意圖 在於將配置於前排F之洗淨手段3a、3b未能洗淨之部分、 8 201240744 由配置於後排B之洗淨手段3a' 3b洗淨（參照圖1( A))。 、又，複數個洗淨手段3a、3b係包含複數個由配置於搬 、、'路L 側（搬送之液晶面板2之表面側）之1個洗淨手 奴3a、及以與該洗淨手段3a於同一軸上相對向之方式配置 於搬送路徑另一側（搬送之液晶面板2之背面側）之i個 洗淨手段3b所構成之組（本實施形態中為5組）。 圖2係用於說明本實施形態之洗淨手段、扑之旋轉 方向（再者’關於旋轉方向’設為從洗淨裝置之上方觀察 之情形時之旋轉方向，以下相同）之圖。該圖所示之洗淨 2 3a-；[、3a.2、3a_3係、配置於搬送路徑—側之前排f者， ::奴3b_l、3b-2、3b_3係配置於搬送路徑另一側之前 ==手段Μ與洗淨手段.洗淨手…與 構又 及洗淨手段3a-3與洗淨手段加係分別 邀3b川且並且’該等構成同一組之洗淨手段（例如3a·3 ==淨面^之旋轉方向相反之方式旋轉。 传=，配置於搬送路徑-側之洗淨手段仏之洗淨面10a 手針方向旋轉，配置於搬送路徑另-側之洗淨 又之洗淨面⑽係全部向逆時針方向旋轉。 各洗淨手段3 a、3 b係由如nr、+，仏磁 垂直於搬送之液晶面板2之表/背成:、旋轉頭6,繞 轉，·圓形盤7，可铲卸地^ # 軸以既定速度旋 安裝於圓形盤7上升降：旋轉頭6上，·洗…， 面-，對於;^表:：…之洗淨 淨液供給機構9,設置於•鐘3 5淥面進仃升降；洗 ^ — 6内並對液晶面板2供給水 201240744 等洗淨液。 如圖3所示，於圓形盤7之中心設置有第1貫通孔12， 於洗淨墊1 0之中心設置有與第i貫通孔12相連通之第2 貫通孔13 »洗淨液供給機構9係經由第丨貫通孔丨2及第2 貫通孔1 3向液晶面板2供給洗淨液。 於旋轉頭6之前端，設置有用於安裝圓形盤7之磁石 11。圆形盤7係至少一側（旋轉頭6側）之面由與磁石i ^ 相互吸引之磁性體形成，相對於旋轉頭6可進行褒却。於 圓形盤7另一側之面上，經由耐水性之接著劑安裝有洗淨 墊1 0。於交換洗淨墊1 〇之情形時，藉由將圓形盤7整體卸 除，可簡易且準確地進行洗淨墊1 〇之交換。 升降機構8a、8b係在控制手段（未圖示）之控制下， 使旋轉頭6、圓形盤7及洗淨墊進行升降。具體而言， 設置於洗淨手段3 a之升降機構8 a係具有壓力感測器等壓力 檢測部，藉該壓力檢測部所檢測之壓力維持在藉由控制手 段指不之既定壓力之方式，藉由氣缸使洗淨墊丨〇 (洗淨面 10a)等下降向液晶面板2表面加壓。另一方面設置於洗 淨手段3b之升降機構8b係藉㈣服馬達與滾珠螺桿使洗 淨墊1〇(洗淨面l〇b)等上升，直至洗淨面1〇b之高度（升 降距離）it到根據控制手段所指示之值（通常為略高於搬 送面之位置）。 因控制手段可個別地控制各升降機構8a、8b，故於本 實施形態之洗淨裝置i巾，因應液晶面板2之大小或厚度 可個別地使洗淨手段3a、3b進行升降。例如，於圖i中了 10 201240744 即便不使用洗淨裝置1之洗淨手段3e仍可洗淨液晶面板2 之整面，故控制手段僅於洗淨中所使用之洗淨手段“、儿 進行升降。 又，於控制手段中，丨對應洗淨^1〇 t磨損量對洗淨 手段3b (洗淨面則之高度進行微調整，預先儲存預測 之磨損量換算為液晶面4反2之洗淨片數之資料。控制手段 係藉由將該 ▲資料與實際之洗淨片數進行比較從而決定洗淨 面l〇b之而度，並將用於指示該高度之控制信號向升降機 構肋傳送。升降機構8“系依據接收之控制信號，藉由飼 服馬達與滾珠螺桿精密地使洗淨面1〇b進行升降。藉此， 可使洗淨® 1〇b僅以磨損所減少之量上升，故可將洗淨面 10b維持在略高於搬送面之位置。再者，磨損量係從洗淨墊 1 〇之旋轉數或壓力等進行預測。 圖4係顯示洗淨墊1〇之洗淨面1〇a(i〇b)之平面圖及 部分放大平面圖。如圖4 (A)所示，於洗淨塾1〇中，凸部 14係隔著既定間距連續配置於第i方向χ及與該第i方向 X正交之第2方向y之兩個方向。並且，如圖4(b)所示， 洗淨塾1G之洗淨面1Ga(1()b)係由形成為截頭錐體狀之凸 。"4之截頭面1(M、該凸部14之側面1〇 2、及該凸部μ 間之平面丨0-3所構成。再者，洗淨墊1〇係將混入研磨材（未 圖示）之樹脂成型者。 圖5係顯示洗淨中之洗淨墊1〇之洗淨面i〇a、i〇b與液 晶面板2表面背面之關係之圖。如該圖所示，以洗淨墊1〇 之洗淨面l〇a、l〇b之中几部共- Μ之甲凸14之截頭面1(M與液晶面板 201240744 2之表面背面相接觸之狀態―邊向液晶面板2供給洗淨液 邊使洗淨塾1 〇旋轉，從而去除固著於液晶面板2之玻璃 屑C或塵埃等異物。具體而言，露出於凸部14之截頭面10-1 之研磨材研磨液晶面板2之表面背面，藉此去除附著於液 曰曰面板2之塵埃或有機物等，另一方面伴隨洗淨墊1 〇之旋 轉凸部14之側面1〇-2自所有方向於玻璃屬C之側面碰撞， 藉此將固著於液晶面板2之玻璃屑c彈起並去除。 因去除之玻璃屑c或塵埃等異物係收納於凸部14間之 間隙中（參照圖5)，並於其後與洗淨液一同通過凸部i 4 間之間隙向洗淨替10之外流出，故不會發生玻璃屬c夫入 凸部14之截頭面10-丨與液晶面板2之間而損傷液晶面板2 之狀況。 [洗淨方法] 其次，參照圖6說明使用本實施形態之洗淨裝置丨之 洗淨方法。本實施形態之洗淨方法係包含：搬送步驟（圖6 (A)〜（D))，搬送液晶面板2;以及洗淨步驟（圖6 (c ))，於該搬送步驟中，一邊於液晶面板2供給洗淨液 一邊使洗淨手段3a、3b於相反方向旋轉從而洗淨液晶面板 2之表面背面。 如圖6 ( A)所示，液晶面板2係水平地放置於併設之 搬送滾輪4上，並以相應於搬送滾輪4及輔助滾輪5之旋 轉速度之搬送速度朝向洗淨裝置1搬送。此時，洗淨裝置1 之洗淨手段3a、3b係於離開搬送路徑之位置待機而不進行 旋轉。 12 201240744 如圖6 ( B)所示，當將液晶面板2搬送至洗淨裝置i 之附近’藉由設置於洗淨裝置丨之感測器15確認到液晶面 板2之存在時，洗淨手段3a—邊往順時針旋轉一邊朝向液 晶面板2之表面下降，洗淨手段3b —邊往逆時針旋轉一邊 朝向液晶面板2之背面上升。洗淨手段3b係上升直至洗淨 面l〇b之高度到達根據控制手段所指示之高度（略高於搬 送面之位置）為止。 如圖6 ( C )所示，於洗淨步驟中，洗淨手段3a、孔係 以洗淨面1〇a、10b之中凸部14之截頭面1(M與液晶面板 2之表面背面相接觸之狀態旋轉。洗淨手段係當凸部μ 之截頭面10-1與液晶面板2之表面相接觸時，進而下降直 至施加於液晶面板2之壓力到達根據控制手段所指示之既 定壓力為止’其後，以壓力成為固定之方式對高度進行微 調整。再者，從凸部14之截頭面與液晶面板2之表面 相接觸至達到既定之壓力為止之時間非常短，洗淨手段h 可和凸部丨4之截頭面10·〗與液晶面板2之表面相接觸幾乎 同時地以既定之壓力進行加壓。 於該洗淨步驟中，為使將液晶面板2搬入洗淨裝置i 内後之搬送速度不慢於將液晶面板2搬入洗淨裝置丨内前 之搬送速度，搬送滾輪4及輔助滾輪5係於洗淨中亦不使 旋轉速度發生變化而以固定旋轉速度旋轉。 又，於該洗淨步驟中，為使液晶面板2於洗淨中不引 發位置偏移，將洗淨面l0a之旋轉方向與洗淨面l〇b之旋轉 方向设為相反，使從洗淨面丨〇a施加於液晶面板2表面之旋 13 201240744 轉方向之力、與從洗淨面1 Ob施加於液晶面板2背面之旋 轉方向之力相抵消。因此，於搬送路徑中，未設置於使用 先前之洗淨裝置2 1之情形時必要之位置偏移防止機構3 i。 如圖6 ( D)所示’當洗淨步驟結束時，洗淨裝置丨之 洗淨手段3a、3b進行升降而返回待機狀態。液晶面板2係 向後續步驟搬送。 [比較實驗1] 繼而，說明比較於使用本實施形態之洗淨塾1 〇進行洗 淨之情形時液晶面板2的表面狀態、與圖1〇所示之於使用 先前之洗淨片30進行洗淨之情形時液晶面板22的表面狀 態之比較實驗1。於本實驗中，代替使用洗淨裝置i ( 2丨）， 以0.075 MPa之表面壓力使洗淨墊1〇及洗淨片3〇接觸於液 晶面板2 ( 22 )之表面側（彩色濾光片側），並使洗淨塾 10及洗淨片30於液晶面板2(22)之長度方向往返次， 藉此進行洗淨。 圖7係顯示液晶面板2之表面狀態之圖，（a )、（ c ) 係洗淨前之液晶面板22、2，（ B )係用先前之洗淨片30 進行洗淨後之（A )之液晶面板22，（ D )係用本發明之洗 淨墊1 0進行洗淨後之（C )之液晶面板2。 如該圖所示’於使用先前之洗淨片30進行洗淨之情形 時於液晶面板22之表面產生多處損傷，相對於此，於使用 本實施形態之洗淨墊1 0進行洗淨之情形時，於液晶面板2 之表面幾乎未產生損傷。其原因在於’於使用本實施形態 之洗淨墊10之情形時，藉由洗淨去除之玻璃屑係收納於凸 14 201240744 部14間之間隙而未夾入形成於洗淨墊10之凸部ι4之截頭 面10-1與液晶面板2之表面之間（參照圖5 )。 [比較實驗2 ] 繼而，說明比較本實施形態之洗淨裴置1與先前之洗 淨裝置21之玻璃屑去除率之比較實驗2。於本實驗中，準 備6片人為使20個玻璃屑固著於表面側之液晶面板2 (22 )，將其中3片液晶面板2用本實施形態之洗淨裝置j 進行洗淨’將剩餘3片液晶面板2 2用先前之洗淨裝置21 進行洗淨。將結果顯示於表1。 [表1] 先前之洗淨裝置 本實施形態之洗洚键番 玻璃屑去除數 玻璃屑去除率 玻璃屑去除數 玻璃屑去除率 1 15/20 75% 20/20 100% 2 17/20 85% 20/20 100% 3 18/20 90% 20/20 100% 如表1所示，使用先前之洗淨裝置2 1進行洗淨之情形 時，玻璃屑去除率處於75%至90%，相對於此，於使用本 實施形態之洗淨裝置1之情形時，3片之玻璃屑去除率皆為 100%。其原因在於，使用本實施形態之洗淨裝置i之情形 時，形成於洗淨墊10之複數個凸部14之側面10·2從各種 方向與玻璃屑之側面碰撞，從而使去除玻璃屑所需之充分 之衝擊力施加於玻璃屑。 [變形例1〜4 ] 第4變形例示於 將本發明之洗淨裝置之第1變形例〜 15 201240744 圖8 ( A)〜（D)中。 圖8 ( A)所示之第[Technical Field] The present invention relates to a cleaning device and a cleaning method for removing foreign matter fixed to a plate-like member such as a liquid crystal panel. [Prior Art] As a cleaning device for removing foreign matter fixed to a liquid crystal panel, there is known a cleaning device 21 which is provided with a plurality of rubber rings 24a. Between the transport path of the transport roller 24 and the auxiliary roller h, the surface of the liquid crystal panel 22 that is transported along the transport path is transported by the cleaning sheet (see, for example, Patent Document 1). The cleaning device 21 is for cleaning the front and back surfaces of the liquid crystal panel 22, and is disposed on both sides of the transport path so as to sandwich the sides i and r of the front and back surfaces of the liquid crystal panel 22. The group cleaning means 23a, 23b (Refer to Fig. w(8), the cleaning means 23a (23b) and the 咕 咕 ; ; ; , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The washing f # 3{) is formed by pressing the liquid crystal panel 22, and the cleaning sheet 30 is also formed into the pressing portion 30 of the cleaning surface 3〇a (鸠) in the cleaning sheet 30+. A non-woven fabric coated with a polishing material is used. Further, the cleaning device 21 is rotated in the same direction by the group-side (the direction of rotation when the hand slaves 23a and 23b are viewed above); The state of the net device is in the same direction as the transport direction, and the side of the net liquid crystal panel 22 is moved back to the front side of the net liquid crystal panel 22, and the washing is performed according to the cleaning device == reference circle! (A)). Therefore, the tact time (the time required to clean the surface of the liquid crystal panel 22 at 5 o'clock (the time required for cleaning the liquid crystal panel 22) 201240744 is shortened to a certain degree β [prior art literature] [patent literature] [patent literature] 1] 曰本特开开 2001-62696 SUMMARY OF INVENTION [Problems to be Solved by the Invention] However, in the prior cleaning device 21, 'the cleaning means 21a, 23b rotate in the same direction, so The force in the direction of rotation is combined and applied to the liquid crystal panel 22, and the liquid crystal panel 22 is displaced in position during cleaning. Therefore, when the liquid crystal panel 22 is cleaned using the previous cleaning device 21, it is necessary to sandwich the liquid crystal. The positional deviation preventing means 3 for preventing the positional displacement on the side of the panel 22 causes the equipment cost to increase. Further, in the previous cleaning apparatus 21, a group of washings Since the cleaning means 23a and 23b are moved back and forth in the direction opposite to the conveyance direction, the entire front and back surfaces of the liquid crystal panel 22 are cleaned without any omission, and each time the cleaning means 23a and 23b are moved, it is necessary. At a given interval The liquid crystal panel 22 is transported intermittently. Therefore, it is difficult for the Shen Yu·Ice, the ghost, and the first device 21 to shorten the tact time. Further, the 'previous cleaning device 21 is coated with an abrasive material. The non-woven fabric is used as the cleaning sheet 30, and since the cleaning surfaces 3〇a and 3〇b are actually flat surfaces, foreign matter such as glass swarf fixed to the back surface of the liquid crystal panel 22 cannot be sufficiently removed, and even if it can be removed, There is a silk foreign matter between the person cleaning sheet 30 and the liquid crystal panel 22, which damages the liquid crystal panel 22 during cleaning. Further, since the previous cleaning device 21 has a cleaning sheet 3〇4 201240744 The delivery roller 26 and the take-up roller 27 are sent out and wound up, which causes a problem of increasing the size and complexity of the device, or the exchange of the cleaning sheet 3G takes time: The present invention is completed in the above case. An object of the present invention is to provide a cleaning device and a cleaning method capable of reliably removing foreign matter of glass swarf 4 fixed to the back surface of a liquid crystal panel without causing a positional shift of the liquid crystal panel during cleaning. [Means for Solving the Problem] Net needle The cleaning device of the present invention is provided with a plurality of cleaning means for arranging the back surface of the surface of the plate-shaped member to be washed and slidably disposed on both sides of the conveying path, and supplying the cleaning liquid to the member. In the plate-shaped member in which the cleaning means is rotated and washed, the plate-shaped plurality of cleaning means includes a plurality of cleaning means disposed on the transport path, and a cleaning means The arrangement is arranged on the other side of the i-method on the other side of the transport path, and has a plurality of convex portions separated by two:: first: a group formed by means, and the p-space is continuously arranged between the two sides The surface is cleaned, and the cleaning means is the opposite of the direction of rotation of the washing surface. According to this configuration, since the surface of the cleaning means is rotated in the opposite direction on the same axis, the cleaning means disposed on the side of the conveying path is on the side of the plate-like member (for example, the a-side W plate) (surface The application of the rotation == is offset by the force applied by the cleaning means disposed on the other side to the other side of the plate member. Therefore, the non-transport path setting bit can prevent the position of the plate member from being offset by i%, and according to this configuration, a plurality of cleaning means are arranged in a wrong tooth shape. Since it is not necessary to stop the plate-shaped member, it can be transported while being transported at a fixed transport speed, so that the tact time can be further shortened. Further, according to this configuration, the plurality of convex portions are continuously arranged with a predetermined interval therebetween, whereby the glass cullet can be surely removed. Further, according to this configuration, since the removed glass 4 is housed between the convex portions, it is possible to prevent the removed glass chips from being caught between the cleaning surface and the plate member, thereby causing damage to the plate member. Further, the cleaning means may be constituted by a rotating head that rotates about an axis perpendicular to the front surface of the plate member during conveyance; and a circular disk, in the middle. Further, a first through hole is provided and detachably attached to the rotary head; and the cleaning pad has a cleaning surface in which a second through hole that communicates with the first through hole is provided at the center, and is attached to the circular disk; The cleaning liquid supply means supplies the cleaning liquid to the plate-shaped member via the i-th through hole and the second through hole, and the elevating mechanism moves the cleaning pad up and down with respect to the front surface or the back surface of the plate member. Further, the cleaning apparatus of the present invention is further provided with a configuration in which each of the cleaning means further includes a control means for individually controlling the elevating mechanism. According to this configuration, since the circular disk is detachably attached, the circular disk can be removed and the cleaning pad can be easily exchanged. Further, according to this configuration, since each of the cleaning means includes the control means for individually controlling the raising and lowering means, even the plate-shaped members of different sizes or thicknesses can be washed by one cleaning means. Further, the cleaning device of the present invention preferably has a height of the convex portion of 100 μm or more and 1000 μη or less. According to this configuration, the height of the convex portion is set to 100 μπι or more and 1〇〇〇6 201240744: the strength of the convex portion itself is maintained and the height of the convex portion is higher than the maximum height of the W-break. The impact is applied to all of the Gaul's glass shards during washing to remove the swarf more reliably. In order to solve the above problems, the cleaning method of the present invention includes a == step 'the transfer step transports the final cleaning liquid, which is the cleaning target, along the transport path, and the net step is in the transport step... The member is provided for washing and washing, and the plate-shaped member is washed by a plurality of cleaning means arranged to be in a ore-like shape so as to sandwich the surface f surface of the plate-shaped member, and is characterized in that: In the step of providing a plurality of cleaning means having a plurality of convex portions spaced apart from each other at a predetermined interval, one cleaning means disposed on the side of the conveying path and the cleaning means are coaxially opposed to each other The cleaning surface of the cleaning means configured by one cleaning means disposed on the other side of the conveying path is rotated in the reverse direction. According to this configuration, the force applied to the rotation direction of the surface of the plate member from the cleaning means disposed on the side of the conveyance path and the direction of rotation applied to the back surface of the plate member from the cleaning means disposed on the other side Since the force is canceled, it is not necessary to provide the positional deviation preventing means in the transport path to prevent the positional displacement of the plate-like member. Further, according to this configuration, since it is not necessary to stop the plate-shaped member, the transport speed can be fixed, and the washing is performed while being transported. Therefore, the tact time of the washing step can be further shortened. Further, according to this configuration, the glass cullet can be surely removed by the plurality of convex portions ′ which are continuously arranged with a predetermined interval therebetween. Further, according to this configuration, since the removed glass is accommodated in the gap of the protrusions, it is possible to prevent the glass chip holder 201240744 from entering between the cleaning surface and the plate member, thereby causing the plate member to be damaged. It can also be set to plate-like drop in the conveying step, and pressurize the plate-shaped member with a predetermined pressure. #件升控手:发:The washing method can also be used in various means of cleaning. According to this configuration, the plate-shaped member can be washed by one cleaning device. Thickness [Effect of the Invention] According to the present invention, it is possible to provide a cleaning device and a cleaning method which can be prevented from being plate-shaped during washing. The positional deviation of the member can surely remove foreign matter such as glass swarf fixed to the back surface of the plate member. [Embodiment] Hereinafter, a preferred embodiment of the present invention will be described with reference to the accompanying drawings. [Washing device] ~ The cleaning device 1 of the present embodiment is shown in the circle 1. As shown in the figure, the cleaning device 1 of the present embodiment is provided with a transport roller 4 having a plurality of rubber rings 4a and an auxiliary roller 5 Between the paths, and wash along the transport The back surface of the liquid crystal panel 2 (phase # in the "plate member" of the present invention) of the road-controlled conveyance. Further, the liquid crystal panel 2 that is transported is in a state before the front surface of the front surface is attached with the polarizing film, and the liquid crystal is sealed between the two glass substrates. The cleaning device 1 includes a plurality of cleaning means h, 3b disposed on both sides (upper and lower sides) of the transport path so as to sandwich the front and back surfaces of the liquid crystal panel 2 to be transported. The plurality of cleaning means 3a and 3b are arranged in a zigzag manner on each side, and it is intended that the cleaning means 3a and 3b disposed in the front row F are not washed, and the 201240744 is disposed in the rear row B. The means 3a' 3b are washed (see Fig. 1(A)). Further, the plurality of cleaning means 3a and 3b include a plurality of cleaning hand slaves 3a disposed on the side of the road L (the surface side of the liquid crystal panel 2 to be transported), and the cleaning means 3a and 3b. The means 3a is disposed on the same axis so as to be disposed on the other side of the transport path (the back side of the liquid crystal panel 2 to be transported) by the i cleaning means 3b (in the present embodiment, five sets). Fig. 2 is a view for explaining the direction of rotation of the cleaning means and the direction of rotation of the embodiment (the same as the case where the direction of rotation is viewed from above the cleaning device, the same applies hereinafter). In the figure, the cleaning 2 3a-; [, 3a. 2, 3a_3, and the arrangement in the transport path-side before the row f, :: the slaves 3b_l, 3b-2, 3b_3 are placed on the other side of the transport path. == means means to wash and wash. Wash hands... and structure and washing means 3a-3 and washing means plus to invite 3b Sichuan and 'these groups of cleaning means (for example, 3a·3 ============================================================================================================ The clean surface (10) is all rotated counterclockwise. Each cleaning means 3 a, 3 b is made of, for example, nr, +, and the magnetic field is perpendicular to the surface/back of the liquid crystal panel 2 that is transported: the rotating head 6 is rotated. · Round disk 7, shovel can be shovel ^ # Axis is mounted on the circular disk 7 at a predetermined speed: lifting, heading, washing, etc., face-, for; The supply mechanism 9 is provided in the upper and lower sides of the clock, and is provided with a cleaning liquid such as water 201240744 in the liquid crystal panel 2. As shown in Fig. 3, the center of the circular disk 7 is provided. 1 The through hole 12 is provided with a second through hole 13 that communicates with the i-th through hole 12 at the center of the cleaning pad 10. The cleaning liquid supply mechanism 9 passes through the second through hole 2 and the second through hole 13 The cleaning liquid is supplied to the liquid crystal panel 2. At the front end of the rotary head 6, a magnet 11 for mounting the circular disk 7 is provided. The circular disk 7 is at least one side (the side of the rotary head 6) is mutually opposed to the magnet i ^ The magnetic body that is attracted is formed, and the rotating head 6 can be twisted. On the other side of the circular disk 7, the cleaning pad 10 is attached via a water-resistant adhesive. The cleaning pad 1 is exchanged. In this case, the entire cleaning disk 1 can be easily and accurately exchanged by removing the circular disk 7. The lifting mechanisms 8a and 8b are controlled by a control means (not shown) to rotate the head 6 The circular disk 7 and the cleaning pad are lifted and lowered. Specifically, the lifting mechanism 8a provided in the cleaning means 3a has a pressure detecting unit such as a pressure sensor, and the pressure detected by the pressure detecting unit is maintained at By means of the control means that the pressure is not determined, the cleaning pad (washing surface 10a) is lowered by the cylinder The surface of the liquid crystal panel 2 is pressurized. On the other hand, the elevating mechanism 8b provided in the cleaning means 3b raises the cleaning pad 1 (washing surface l〇b) by the motor and the ball screw until the cleaning surface is raised. The height (lifting distance) of 1〇b is the value indicated by the control means (usually slightly higher than the position of the conveying surface). Since the control means can individually control the lifting mechanisms 8a, 8b, the present embodiment is The cleaning device i towel can individually raise and lower the cleaning means 3a, 3b in accordance with the size or thickness of the liquid crystal panel 2. For example, in Fig. i, 10 201240744 can be used even if the cleaning means 3e of the cleaning device 1 is not used. Since the entire surface of the liquid crystal panel 2 is cleaned, the control means only raises and lowers the cleaning means used in the cleaning. Further, in the control means, the cleaning means 3b is applied to the cleaning means 3b (the height of the cleaning surface is finely adjusted, and the amount of wear predicted in advance is converted into the cleaning sheet of the liquid crystal surface 4 reversed 2 The data is controlled by comparing the ▲ data with the actual number of cleaning sheets to determine the degree of washing surface l〇b, and transmitting a control signal for indicating the height to the lifting mechanism rib. The lifting mechanism 8 "accurates the cleaning surface 1〇b precisely by the feeding motor and the ball screw according to the received control signal. Thereby, the cleaning® 1〇b can be increased only by the amount of wear reduction. Therefore, the washing surface 10b can be maintained at a position slightly higher than the conveying surface. Further, the amount of wear is predicted from the number of rotations of the washing mat 1 or the pressure, etc. Fig. 4 shows the washing of the washing mat 1 A plan view and a partially enlarged plan view of the clean surface 1〇a(i〇b). As shown in Fig. 4(A), in the cleaning 塾1〇, the convex portions 14 are continuously arranged in the i-th direction at a predetermined interval. Two directions of the second direction y orthogonal to the i-th direction X. Further, as shown in FIG. 4(b), the 塾1G is washed. The cleaning surface 1Ga(1()b) is formed by a frustum-shaped convex shape. The truncated surface 1 of the "4 (M, the side surface 1 of the convex portion 14, and the convex portion μ) Further, the cleaning pad 1 is a resin molded person which is mixed with a polishing material (not shown). Fig. 5 shows the cleaning surface of the cleaning pad 1 in the cleaning. a, i〇b and the relationship between the surface and the back surface of the liquid crystal panel 2. As shown in the figure, a few of the cleaning surfaces l〇a, l〇b of the cleaning pad 1〇-- In the state in which the M is in contact with the front and back surfaces of the liquid crystal panel 201240744 2, the cleaning liquid is supplied to the liquid crystal panel 2 to rotate the cleaning crucible 1 to remove the glass swarf fixed to the liquid crystal panel 2. Specifically, foreign matter such as dust is applied. Specifically, the polishing material exposed on the truncated surface 10-1 of the convex portion 14 polishes the back surface of the liquid crystal panel 2, thereby removing dust or organic matter adhering to the liquid helium panel 2, and the like. On the other hand, the side surface 1〇-2 of the rotary convex portion 14 with the cleaning pad 1 collides with the side surface of the glass genus C from all directions, whereby the glass cullet c fixed to the liquid crystal panel 2 is bounced and removed. The foreign matter such as the glass swarf c or the dust is stored in the gap between the convex portions 14 (see FIG. 5 ), and then flows out together with the cleaning liquid through the gap between the convex portions i 4 to the outside of the cleaning device 10 . The situation in which the liquid crystal panel 2 is damaged between the truncated surface 10 - 丨 of the glass c-shaped convex portion 14 and the liquid crystal panel 2 does not occur. [Washing method] Next, the cleaning using this embodiment will be described with reference to Fig. 6 . The cleaning method of the apparatus includes a transporting step (Figs. 6(A) to (D)), transporting the liquid crystal panel 2, and a washing step (Fig. 6(c)). In the transporting step, while the cleaning liquid is supplied to the liquid crystal panel 2, the cleaning means 3a, 3b are rotated in opposite directions to wash the front and back surfaces of the liquid crystal panel 2. As shown in Fig. 6(A), the liquid crystal panel 2 is placed horizontally on the transport roller 4 and transported toward the cleaning device 1 at a transport speed corresponding to the rotational speed of the transport roller 4 and the auxiliary roller 5. At this time, the cleaning means 3a, 3b of the cleaning device 1 are placed in a position away from the conveyance path and are not rotated. 12 201240744 As shown in Fig. 6 (B), when the liquid crystal panel 2 is transported to the vicinity of the cleaning device i, the presence of the liquid crystal panel 2 is confirmed by the sensor 15 provided in the cleaning device ,, the cleaning means 3a— While rotating clockwise, the surface of the liquid crystal panel 2 is lowered, and the cleaning means 3b is lifted toward the back surface of the liquid crystal panel 2 while rotating counterclockwise. The cleaning means 3b is raised until the height of the washing surface l〇b reaches the height indicated by the control means (slightly higher than the position of the conveying surface). As shown in FIG. 6(C), in the cleaning step, the cleaning means 3a and the holes are the truncated surface 1 of the convex portion 14 (M and the front surface of the liquid crystal panel 2) in the cleaning surfaces 1a and 10b. When the contact surface is rotated, the cleaning means is such that when the truncated surface 10-1 of the convex portion μ comes into contact with the surface of the liquid crystal panel 2, the pressure is lowered until the pressure applied to the liquid crystal panel 2 reaches the predetermined pressure indicated by the control means. Then, the height is finely adjusted so that the pressure is fixed. Further, the time from when the truncated surface of the convex portion 14 comes into contact with the surface of the liquid crystal panel 2 until the predetermined pressure is reached is very short, and the cleaning means h can be pressed at a predetermined pressure almost simultaneously with the surface of the liquid crystal panel 2 with the truncated surface 10 of the convex portion 。4. In this cleaning step, the liquid crystal panel 2 is carried into the cleaning device. The conveyance speed after the inside of the i is not slower than the conveyance speed before the liquid crystal panel 2 is carried into the cleaning device, and the conveyance roller 4 and the auxiliary roller 5 are rotated at a fixed rotation speed without changing the rotation speed during the cleaning. Moreover, in the cleaning step, in order to make the liquid crystal The plate 2 does not cause a positional shift during cleaning, and the rotation direction of the cleaning surface 10a is opposite to the rotation direction of the cleaning surface 10b, so that the rotation surface 丨〇a is applied to the surface of the liquid crystal panel 2 13 201240744 The force in the direction of rotation is offset by the force applied from the cleaning surface 1 Ob to the direction of rotation of the back surface of the liquid crystal panel 2. Therefore, it is not necessary to use the previous cleaning device 2 1 in the transport path. As shown in Fig. 6(D), when the cleaning step is completed, the cleaning means 3a, 3b of the cleaning device are moved up and down to return to the standby state. The liquid crystal panel 2 is moved to the subsequent step. [Comparative Experiment 1] Next, a description will be given of a surface state of the liquid crystal panel 2 when the cleaning is performed using the cleaning crucible 1 of the present embodiment, and a cleaning sheet 30 as shown in FIG. In the case of cleaning, the surface state of the liquid crystal panel 22 was compared. Experiment 1. In this experiment, instead of using the cleaning device i (2丨), the cleaning pad 1〇 and the cleaning sheet 3 were applied at a surface pressure of 0.075 MPa. 〇Contact the surface side of the LCD panel 2 ( 22 ) On the side of the filter, the cleaning crucible 10 and the cleaning sheet 30 are washed back and forth in the longitudinal direction of the liquid crystal panel 2 (22), and the cleaning is performed. Fig. 7 is a view showing the surface state of the liquid crystal panel 2, ( a), (c) the liquid crystal panels 22 and 2 before washing, and (B) the liquid crystal panel 22 (A) which has been cleaned by the previous cleaning sheet 30, and (D) is washed by the present invention. The liquid crystal panel 2 of the cleaning (C) is cleaned by the cleaning pad 10. As shown in the figure, when the cleaning is performed using the previous cleaning sheet 30, a plurality of damages are generated on the surface of the liquid crystal panel 22, as opposed to When the cleaning pad 10 of the present embodiment is used for cleaning, almost no damage occurs on the surface of the liquid crystal panel 2. The reason for this is that when the cleaning pad 10 of the present embodiment is used, the glass swarf which is removed by washing is stored in the gap between the projections 14 201240744 14 and is not sandwiched by the convex portion formed in the cleaning pad 10. Between the truncated surface 10-1 of ι4 and the surface of the liquid crystal panel 2 (refer to FIG. 5). [Comparative Experiment 2] Next, a comparison experiment 2 in which the glass removal rate of the cleaning device 1 of the present embodiment and the previous cleaning device 21 was compared will be described. In this experiment, six pieces of liquid crystals were fixed on the liquid crystal panel 2 (22) on the front side, and three liquid crystal panels 2 were cleaned by the cleaning device j of the present embodiment. The sheet liquid crystal panel 2 2 is cleaned by the previous cleaning device 21. The results are shown in Table 1. [Table 1] Previous cleaning device The number of glass chips removed by the washing button of this embodiment is the glass removal rate, the number of glass chips removed, the glass removal rate 1 15/20 75% 20/20 100% 2 17/20 85% 20/20 100% 3 18/20 90% 20/20 100% As shown in Table 1, when using the previous cleaning device 2 1 for cleaning, the glass removal rate is between 75% and 90%, as opposed to Therefore, in the case of using the cleaning device 1 of the present embodiment, the glass removal rate of each of the three sheets was 100%. The reason for this is that when the cleaning device i of the present embodiment is used, the side surface 10·2 formed on the plurality of convex portions 14 of the cleaning pad 10 collides with the side surface of the glass cullet from various directions, thereby removing the glass swarf. A sufficient impact force is required to apply to the glass shavings. [Modifications 1 to 4] The fourth modification is shown in Fig. 8 (A) to (D) of the first modification of the cleaning apparatus of the present invention to 15 201240744. Figure 8 (A) shows the number
晶面板2大型之液晶面板。Crystal panel 2 large LCD panel.
施形態之液晶面板2小型之 第2變形例之洗淨裝置1B係僅使用 【置1之5組洗淨手段3a、3b之中一 -3a、3b者’適合用於洗淨較上述實 小型之液晶面板，再者，若僅洗淨小 型液晶面板，則亦可使用未含洗淨手段3c之洗淨裝置，即 僅包含3組洗淨手段3a、3b之小型洗淨裝置。 圖8 ( C )所示之第3變形例之洗淨裝置1(：係增加上 述實施形態之洗淨裝置1之洗淨手段3a、3b之數量，並使 3行者。藉由第3變形例 洗淨手段3a ' 3b以鋸齒狀配置為 之洗淨裝置1C，可更確實地去除固著於液晶面板2之玻璃 屑等異物。 圖8 ( D )所示之第4變形例之洗淨裝置丨D係將上述 實施形態之洗淨裝置1之洗淨手段3 a、3 b之中、各行中相 鄰之洗淨手段3a(3b)之旋轉方向設為相反者。再者，於 該情形時構成同一組之洗淨手段3 a、3 b亦與上述實施形態 之洗淨裝置1相同地’以洗淨面10a、10b之旋轉方向成為 相反之方式旋轉° 以上，說明了本發明之洗淨裝置較佳之實施形態及第1 變形例〜第4變形例’但本發明並非限定於上述構成。 16 201240744 例如’亦可使用圖9所示之洗淨墊l 〇,代替上述洗淨墊 10。該洗淨塾10|於除以第2貫通孔13為中心以放射狀設 置有第3貝通孔i 31以外之點與洗淨墊〖〇共通。第3貫通 孔1 3係為對液晶面板2供給洗淨液而設置者，使用該洗淨 塾〇可對液晶面板2供給更多洗淨液。 又’形成於洗淨墊1 〇、1 〇,之洗淨面1 〇a、丨〇b之凸部 14之阿度係於1〇〇 μίη以上、1〇〇〇 以下之範圍内可任意 地，行設定。再者’若凸部14之高度低於⑽_，則低於 固著於液晶面4反2之玻璃屑之一般而言可設想之最大高 度故除對间度較南之玻璃屑以外無法施加衝擊，從而無 法將高度較低之玻璃屑去除。另一方面，若凸部"之高度 高於1000叩，則凸部14自身之強度下降而容易發生變形， 故施加於玻璃屑之衝擊力變弱，於此情形時亦無法充分地 將玻璃屑去除。 進而，凸部14若為立體形狀則 狀則可變更為任意之形狀， 例如可變更為圓枉狀或稜柱狀。 又，於上述實施形態中，兔故 為將圓形盤7設為從旋轉頭6 可進行裝卸，於旋轉頭6之前端钟 置有磁石11，但亦可將 磁石11設置於圓形盤7之旋轉瓸 ^ y 砰員6側，亦可於旋轉頭6盥 圓形盤7兩者上設置磁石ι1β " 或進而’右為可將圓形盤7設 為可從旋轉頭6進行裝卸，亦可使 便用磁石11以外之安裝手 ’雖以洗淨墊10 與液晶面板 又，於上述實施形態中，如圄< & _ 邪圖5所示In the cleaning apparatus 1B of the second modification of the liquid crystal panel 2 of the embodiment, only one of the five sets of cleaning means 3a and 3b is set to -3a, 3b is suitable for cleaning. Further, when the small liquid crystal panel is washed, it is also possible to use a cleaning device that does not include the cleaning means 3c, that is, a small cleaning device that includes only three sets of cleaning means 3a, 3b. In the cleaning apparatus 1 of the third modification shown in Fig. 8 (C), the number of cleaning means 3a, 3b of the cleaning apparatus 1 of the above-described embodiment is increased, and three rows are provided. The third modification is given. The cleaning means 3a' 3b is arranged in a zigzag manner as the cleaning device 1C, and the foreign matter adhered to the liquid crystal panel 2 can be more reliably removed. The cleaning device according to the fourth modification shown in Fig. 8 (D) In the case of the cleaning means 3a, 3b of the cleaning device 1 of the above-described embodiment, the direction of rotation of the adjacent cleaning means 3a (3b) in each row is reversed. In the same manner as the cleaning device 1 of the above-described embodiment, the cleaning means 3a and 3b of the same group are rotated by more than or equal to the rotation direction of the cleaning surfaces 10a and 10b, and the washing of the present invention has been described. The preferred embodiment of the net device and the first to fourth modifications are not limited to the above configuration. 16 201240744 For example, a cleaning pad 1 shown in FIG. 9 may be used instead of the cleaning pad 10 described above. The cleaning crucible 10| is provided with a third beacon hole i 31 radially except for the second through hole 13 The third through hole 13 is provided to supply the cleaning liquid to the liquid crystal panel 2, and the washing liquid can be used to supply more cleaning liquid to the liquid crystal panel 2. It is formed in the cleaning pad 1 〇, 1 〇, and the abundance of the convex portion 14 of the cleaning surfaces 1 〇 a and 丨〇 b is arbitrarily within a range of 1 〇〇 μίη or more and 1 〇〇〇 or less. In addition, if the height of the convex portion 14 is lower than (10)_, it is lower than the generally conceivable maximum height of the glass swarf fixed to the liquid crystal surface 4, so that it cannot be separated from the southmost glass swarf. When the impact is applied, the glass swarf having a lower height cannot be removed. On the other hand, if the height of the convex portion is higher than 1000 叩, the strength of the convex portion 14 itself is lowered to be easily deformed, so that the impact is applied to the glass swarf. The force is weakened, and in this case, the glass cullet cannot be sufficiently removed. Further, when the convex portion 14 has a three-dimensional shape, the shape can be changed to a more arbitrary shape, for example, the shape of the convex portion is more rounded or prismatic. In the above embodiment, the rabbit is configured to be detachable from the rotary head 6 by the circular disk 7. The magnet 11 is placed on the front end of the rotating head 6, but the magnet 11 may be disposed on the side of the rotating cymbal 6 of the circular disk 7, or the magnet may be placed on both the rotating head 6 and the circular disk 7. Ι1β " or further 'right' can be used to mount the circular disk 7 from the rotary head 6, or to use the mounting hand other than the magnet 11, although the cleaning pad 10 and the liquid crystal panel are In the form, as shown in 圄<& _ evil figure 5
之洗淨面10a、10b之中凸部μ夕# -Ε I 之戴頭面 17 201240744 2之表面背面相接觸之狀態進行液晶面板2之洗淨，但為將 較大之玻璃屑去除之情形時，亦可以凸部14之截頭面丨〇· i 從液晶面板2之表面背面略微升起之狀態進行液晶面板2 之洗淨。藉此洗淨墊10之壽命變長，並且無需於洗淨墊1〇 混合研磨# ’故有利於成本面。再者，於此情形時，控制 手段係以洗淨面1 〇a之高度（升降距離）成為指示值之方式 對洗淨手段3a之升降機構8a進行高度控制。 又，於上述實施形態中，作為洗淨對象以液晶面板2 為例進行了說明，#只要為至少於表面背面包含玻璃面之 板狀構件’便可適用本發明之洗淨裝i卜以〜心確實 地去除固著於玻璃面之玻璃屑等異物。 【圖式簡單說明】 圖1係、本發明之洗淨裝置，（A)係、平面@，（B)係 圆2 圖3 圖4 分放大平 係用於說明本發明之洗淨手段之旋轉方向之圖。 係顯示本發明之旋轉頭與圓形盤之關係之圖。 係本發明之洗淨墊，（A)係平面圖，（B)係部 面圖。 圖5係顯示本發明之洗淨墊之洗淨面與液晶彳 背面之關係之圆。 面與液曰S面板表面 ,圖6係本發明之洗淨方法，（A )、 係顯示依庠 （） 圖又序進仃之搬送步驟及洗淨步驟之情況之側視圖。 係洗淨：係顯示液晶面板之表面狀態之圖，⑷、（C) ⑴之液晶面板，（B )係用先前之洗淨片洗淨後之（a ) 18 201240744 之液晶面板，（D)孫田丄 1糸用本發明之洗淨墊洗淨後之（ 液晶面板。 ;^ 圖8係顯示本發明夕、a 不赞月之洗淨裝置之變形例之圖， 第1變形例之平面圖，、/ '、 (B)係第2變形例之平面圖，（ 係第3變形例之平面圖 ) ν (〇)係第4變形例之平面圖。 圖9係顯示本發明之、土也 之，先淨墊之變形例之平面圖。 圖1 0係先前之洗淨梦番^ Δ S .. 瑕置，（A )係平面圖，（β )在 視圖。 〈ΰ )係側 【主要元件符號說明】 1、ΙΑ、1Β、1C、1D 2 > 22 3a、3a-l、3a-2、3a-3 23a、23b 4、 24 4a 、 24a 5、 25 6 7 8a ' 8b 9 10、10丨、10a、10b 10a 、 10b 、 30a 、 30b 洗淨裝置 液晶面板 、3b 、 3b-l 、 3b-2 、 3b 洗淨手段 搬送滾輪 橡膠製環 輔助滚輪 旋轉頭 圓形盤 升降機構 洗淨液供給機構 洗淨塾 洗淨面 10-1 截頭面 10-2 側面 19 201240744 10-3 平面 11 磁石 12 第1貫通孔 13 第2貫通孔 13' 第3貫通孔 14 凸部 15 感測器 21 先前之洗淨裝置 26 送出滾輪 27 捲取滾輪 28 按壓部 30 洗淨片 3 1 位置偏移防止手段 B 後排 C 玻璃屑 F 前排 20In the cleaning surface 10a, 10b, the convex portion μ # Ε Ε Ε 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 At this time, the liquid crystal panel 2 may be cleaned in a state where the truncated surface of the convex portion 14 is slightly raised from the front surface of the liquid crystal panel 2. Thereby, the life of the cleaning pad 10 becomes long, and it is not necessary to wash the pad 1 〇 mixed grinding #', which is advantageous for the cost side. Further, in this case, the control means controls the height of the elevating mechanism 8a of the cleaning means 3a so that the height (lifting distance) of the washing surface 1 〇a becomes an instruction value. Further, in the above-described embodiment, the liquid crystal panel 2 has been described as an example of the cleaning object, and the cleaning device of the present invention can be applied as long as it is a plate-like member including a glass surface at least on the front and back surfaces. The heart surely removes foreign matter such as glass shards fixed to the glass surface. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cleaning apparatus of the present invention, (A) system, plane @, (B) system circle 2 Fig. 3 Fig. 4 is an enlarged plan view for explaining the rotation of the cleaning means of the present invention. The map of the direction. A diagram showing the relationship between the rotary head and the circular disk of the present invention. The cleaning pad of the present invention is (A) is a plan view and (B) is a plan view. Fig. 5 is a view showing the relationship between the cleaning surface of the cleaning pad of the present invention and the back surface of the liquid crystal. Fig. 6 is a washing method of the present invention, and Fig. 6 is a side view showing the washing method of the present invention, (A), showing the transfer step and the washing step of the 庠() diagram. Washing: showing the surface state of the liquid crystal panel, (4), (C) (1) liquid crystal panel, (B) liquid crystal panel (a) 18 201240744 after cleaning with the previous cleaning sheet, (D) After cleaning with the cleaning pad of the present invention (liquid crystal panel; ;^ Fig. 8 is a view showing a modification of the cleaning device of the present invention, a disappointing month, a plan view of the first modification, And /', (B) is a plan view of a second modification, (a plan view of a third modification) ν (〇) is a plan view of a fourth modification. Fig. 9 is a view showing the soil of the present invention. A plan view of a modification of the pad. Fig. 1 0 is the previous cleaning dream ^ Δ S .. 瑕, (A) is a plan view, (β) is in the view. ΰ 系 side [main symbol description] ΙΑ, 1Β, 1C, 1D 2 > 22 3a, 3a-1, 3a-2, 3a-3 23a, 23b 4, 24 4a, 24a 5, 25 6 7 8a ' 8b 9 10, 10丨, 10a, 10b 10a, 10b, 30a, 30b Cleaning device LCD panel, 3b, 3b-l, 3b-2, 3b Cleaning means Transfer roller Rubber ring Auxiliary roller Rotating head Round disk lifting mechanism Cleaning solution Washing mechanism Washing surface 10-1 Frustum surface 10-2 Side 19 201240744 10-3 Plane 11 Magnet 12 First through hole 13 Second through hole 13' Third through hole 14 Projection 15 Sensor 21 Previous cleaning device 26 Feed roller 27 Winding roller 28 Pressing portion 30 Cleaning sheet 3 1 Position offset prevention means B Rear row C Glass F F Front row 20