CN106773161A - Substrate cleaning apparatus - Google Patents
Substrate cleaning apparatus Download PDFInfo
- Publication number
- CN106773161A CN106773161A CN201611179594.2A CN201611179594A CN106773161A CN 106773161 A CN106773161 A CN 106773161A CN 201611179594 A CN201611179594 A CN 201611179594A CN 106773161 A CN106773161 A CN 106773161A
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- CN
- China
- Prior art keywords
- substrate
- cleaning
- rotary shaft
- transmission
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Abstract
The present invention provides a kind of substrate cleaning apparatus, it passes through to be wrapped in the hairbrush of cleaning rotating shaft surface using multiple cleaning brush substitutions of the dense arrangement driven by cleaning rotary shaft, so that the face that the linear contact lay between substrate and hairbrush is changed between substrate and multiple cleaning brush contacts, so as to greatly increase contact area of the substrate in cleaning and between cleaning brush, lift the time of contact of cleaning, make that the rolling wheel stamp of substrate back removes is more thorough, so as to lift the cleannes of substrate, it is ensured that processing procedure quality.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of substrate cleaning apparatus.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as display (Organic Light Emitting Diode, OLED) progressively replace cathode-ray tube
(Cathode Ray Tube, CRT) display, be widely used in LCD TV, mobile phone, personal digital assistant, digital camera,
Computer screen or notebook computer screen etc..
Display panel is the important component of LCD, OLED.The display surface of the whether display panel of LCD, or OLED
Plate, generally all has a thin film transistor (TFT) (Thin Film Transistor, TFT) array base palte.Display panel with LCD is
Example, it is mainly by a tft array substrate, a colored filter (Color Filter, CF) substrate and is configured at two substrates
Between liquid crystal layer (Liquid Crystal Layer) constituted, its operation principle is by tft array substrate and CF substrates
It is upper to apply driving voltage to control the rotation of liquid crystal molecule in liquid crystal layer, the light of backlight module is reflected into generation picture.
In the manufacturing process of tft array substrate, substrate is required for by coating photoresist, exposes, develops such a
Photo-mask process.The purpose of development is the photoresist that removal there occurs light reaction in exposure process, so as to be formed on substrate
Photoetching offset plate figure corresponding with exposure mask plate, is coated with the position of photoresist on development metacoxal plate, in next operation etching
During due to the protection of photoresist, the metal or non-metallic film of relevant position will not suffer damage, so as to finally reach
The purpose of TFT circuit is formed on substrate.Can be sent to after substrate cleaning apparatus by delivery unit in developing manufacture process metacoxal plate
In next process apparatus are sent to.
As shown in Figures 1 and 2, in the prior art, the substrate cleaning apparatus after developing apparatus are generally included：Frame 10,
And the first substrate transmission area 101 of being arranged in order at grade in the frame 10, base-plate cleaning area 102,
Area 103 is transmitted with second substrate；The first substrate transmission area 101 and second substrate transmission area 103 include：Between being parallel to each other
Every multiple transmission rotary shafts 202 of arrangement, the base-plate cleaning area 102 includes：Several and intervals parallel with transmission rotary shaft 202
The cleaning rotary shaft 201 of arrangement；The side wrap of each cleaning rotary shaft 201 has hairbrush 203, each transmission rotary shaft
Multiple delivery rollers 204 being sequentially arranged at intervals are arranged with 202, spray is disposed with the top in the base-plate cleaning area 102
Shower device (not shown), substrate is sent in base-plate cleaning area 102 by delivery roller 204, by spray equipment to substrate just
Face carries out cleaning showers, and scrub reduction is carried out to substrate back by hairbrush 203 is produced by delivery roller 204 in transmit process
Rolling wheel stamp, but due to when substrate passes through hairbrush 203, contact between hairbrush 203 and substrate is linear contact lay, contact area compared with
It is small, if rolling wheel stamp is more serious, cannot clean up, cause substrate to use, influence back-end process.
The content of the invention
It is an object of the invention to provide a kind of substrate cleaning apparatus, the rolling wheel stamp of substrate back can be effectively removed, carried
Rise the cleannes of substrate, it is ensured that processing procedure quality.
To achieve the above object, the invention provides a kind of substrate cleaning apparatus, including：Frame and located at the machine
The first substrate being arranged in order at grade transmission area, base-plate cleaning area and second substrate transmission area on frame；
The first substrate transmission area and second substrate transmission area include：Be parallel to each other spaced multiple transmission rotations
Rotating shaft, the base-plate cleaning area includes：At least two parallel with transmission rotary shaft and spaced cleaning rotary shafts；
In each cleaning rotary shaft multiple is equipped with to be parallel to each other spaced support shaft, the support shaft with it is described
Cleaning rotary shaft vertical-transmission connection, each support shaft is arranged with a cleaning brush away from one end of cleaning rotary shaft；
Each cleaning brush is respectively positioned on parallel with the cleaning rotary shaft away from a side end face of the cleaning rotary shaft
On same plane, the side of two adjacent cleaning brushes is tangent；
Multiple delivery rollers being sequentially arranged at intervals are arranged with each transmission rotary shaft.
The quantity of the cleaning rotary shaft is two.
Connected by a pair of helical gear vertical-transmissions between the cleaning rotary shaft and the support shaft.
Also include：Being put down with the transmission rotary shaft above the multiple transmission rotary shaft in the frame
Capable multiple auxiliary rotary shafts, each auxiliary rotary shaft is arranged with multiple auxiliary wheels being sequentially arranged at intervals.
When the substrate cleaning apparatus work, the auxiliary rotary shaft is in opposite direction with what the transmission rotary shaft rotated.
Minimum range between the auxiliary wheel and delivery roller is equal to the thickness of the substrate for needing cleaning.
Also include：Multiple free roller wheels, the free roller wheel is located at first substrate transmission area and base-plate cleaning area
Junction and the junction in second substrate transmission area and base-plate cleaning area, the summit of the free roller wheel are clear with each
Washing head is in same plane away from the side end face of the cleaning rotary shaft.
Also include：The drive device being connected with the transmission rotary shaft and cleaning rotary shaft.
The drive device is electric rotating machine.
Beneficial effects of the present invention：The present invention provides a kind of substrate cleaning apparatus, and it passes through to use by cleaning rotary shaft band
Multiple cleaning brush substitutions of dynamic dense arrangement are wrapped in the hairbrush of cleaning rotating shaft surface so that between substrate and hairbrush
The face that linear contact lay is changed between substrate and multiple cleaning brush contacts, so as to greatly increase substrate in cleaning with cleaning brush it
Between contact area, lift the time of contact of cleaning, make that the rolling wheel stamp of substrate back removes is more thorough, so as to lift substrate
Cleannes, it is ensured that processing procedure quality.
Brief description of the drawings
In order to be able to be further understood that feature of the invention and technology contents, refer to below in connection with of the invention detailed
Illustrate and accompanying drawing, however accompanying drawing only provide with reference to and explanation use, not for being any limitation as to the present invention.
In accompanying drawing,
Fig. 1 is the schematic top plan view of existing substrate cleaning apparatus；
Fig. 2 is the schematic cross-sectional view of existing substrate cleaning apparatus；
Fig. 3 is the schematic top plan view of substrate cleaning apparatus of the invention；
Fig. 4 is the schematic cross-sectional view of substrate cleaning apparatus of the invention；
Fig. 5 is the connection diagram cleaned between rotary shaft and support shaft in substrate cleaning apparatus of the invention.
Specific embodiment
Further to illustrate technological means and its effect that the present invention is taken, it is preferable to carry out below in conjunction with of the invention
Example and its accompanying drawing are described in detail.
Fig. 3 and Fig. 4 is referred to, the present invention provides a kind of substrate cleaning apparatus, including：Frame 1 and located at the frame
The first substrate being arranged in order at grade transmission area 11, base-plate cleaning area 12 and second substrate transmission area 13 on 1,
The first substrate transmission area 11 is used to that substrate to be sent to base-plate cleaning area 12, the base-plate cleaning area 12 from developing apparatus
For being cleaned to substrate, the second substrate transmission area 13 is used to for the substrate after cleaning to be sent to next process apparatus
In.
Specifically, the first substrate transmission area 11 and second substrate transmission area 13 include：It is parallel to each other and is spaced
Multiple transmission rotary shafts 22, the base-plate cleaning area 12 includes：At least two is parallel and be spaced with transmission rotary shaft 22
Cleaning rotary shaft 21.
Further, multiple is equipped with each cleaning rotary shaft 21 to be parallel to each other spaced support shaft 211, institute
State support shaft 211 with it is described cleaning the vertical-transmission of rotary shaft 21 be connected, each support shaft 211 away from clean rotary shaft 21 one
End is arranged with a cleaning brush 212, it is preferable that as shown in figure 5, the support shaft 211 passes through with the cleaning rotary shaft 21
A pair of helical gear vertical-transmission connections, this is not limitation of the present invention certainly, and other vertical-transmission connected modes are same
It is applicable.
It should be noted that in the present invention, a side end face of each cleaning brush 212 away from the cleaning rotary shaft 21
It is respectively positioned on the same plane parallel with the cleaning rotary shaft 21, the side of two adjacent cleaning brushes 212 is tangent, passes through
So that each cleaning brush 212 away from it is described cleaning rotary shaft 21 a side end face be respectively positioned on it is described cleaning rotary shaft 21 it is parallel
Same plane on enable the back side of substrate substrate when base-plate cleaning area 12 is sent to simultaneously with whole cleaning brushes
212 end contact, so as to the linear contact lay of prior art is changed into face contact, is substantially improved contact area, rolling wheel stamp removal
More thoroughly, ensure that each cleans brush 212 and substrate by causing that the side of two adjacent cleaning brushes 212 is tangent
Rear-face contact when the space that produces it is minimum, it is ensured that the region of cleaning is maximum.Preferably, the quantity of the cleaning rotary shaft 21 is
Two.
Specifically, multiple delivery rollers 221 being sequentially arranged at intervals are arranged with each transmission rotary shaft 22, are passed through
Frictional force between the delivery roller 221 and substrate transmits substrate.
It is noted that in order that substrate transmission when it is more steady, the present invention also in the frame 1 be located at institute
The position for stating multiple tops of transmission rotary shaft 22 sets multiple auxiliary rotary shafts 23 parallel with the transmission rotary shaft 22, each
Individual auxiliary rotary shaft 23 is arranged with multiple auxiliary wheels 231 being sequentially arranged at intervals, when the substrate cleaning apparatus work, institute
Auxiliary wheel 231 is stated substrate is clipped in the middle with delivery roller 221, and auxiliary rotary shaft 23 and the transmission rotary shaft
22 rotation it is in opposite direction so that substrate transmit when more smoothly and will not skid, it is preferable that the auxiliary wheel 231 with
Minimum range between delivery roller 221 is equal to the thickness of the substrate for needing cleaning.
Additionally, the present invention is provided with multiple free roller wheels 213 to be used to prevent substrate being sent to base-plate cleaning area 12
When bump against with the side of cleaning brush 212, the free roller wheel 213 is located at the first substrate transmission area 11 and base-plate cleaning area
12 junction and the junction in second substrate transmission area 13 and base-plate cleaning area 12, the top of the free roller wheel 213
Side end face of the point with each cleaning brush 212 away from the cleaning rotary shaft 21 is in same plane, so that substrate energy
It is enough smoothly to pass through base-plate cleaning area 12.
Specifically, the transmission rotary shaft 22 and cleaning rotary shaft 21 drive it to revolve by coupled drive device
Turn, it is preferable that the drive device is electric rotating machine.
Specifically, substrate cleaning apparatus specific work process of the invention is：Substrate by after development, from developing apparatus from
Out enter first substrate and transmit area 11, the delivery roller 221 in first substrate transmission area 11 rotate with the substrate it
Between produce frictional force so that substrate advances toward base-plate cleaning area 12, and then substrate enters base-plate cleaning area by free roller wheel 213
12, the drive device drives cleaning rotary shaft 21 to rotate, and the cleaning rotary shaft 21 rotarily drives support shaft 211 and rotates, and props up
Support axle 211 rotarily drives cleaning brush 212 and rotates, and the back to substrate is cleaned, the rolling wheel stamp at removal substrate back, then
Substrate transmits area 13 and gets forwarded to next process apparatus via second substrate transmission area 13 into second substrate.
It is understood that in order to the front to substrate is cleaned, substrate cleaning apparatus of the invention can also be in base
The top of plate cleaning area 12 sets spray equipment (not shown), is rinsed for the front to substrate.
In sum, substrate cleaning apparatus of the invention, it passes through using the dense arrangement driven by cleaning rotary shaft
Multiple cleaning brush substitution is wrapped in the hairbrush of cleaning rotating shaft surface so that the linear contact lay between substrate and hairbrush is changed into substrate
Contacted with the face between multiple cleaning brush, so as to greatly increase contact area of the substrate in cleaning and between cleaning brush,
The time of contact of cleaning is lifted, make that the rolling wheel stamp of substrate back removes is more thorough, so as to lift the cleannes of substrate, it is ensured that
Processing procedure quality.
The above, for the person of ordinary skill of the art, can be with technology according to the present invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claims in the present invention
Protection domain.
Claims (9)
1. a kind of substrate cleaning apparatus, it is characterised in that including：Frame (1) and in the frame (1) same
First substrate transmission area (11), base-plate cleaning area (12) and second substrate transmission area (13) being arranged in order in plane；
First substrate transmission area (11) and second substrate transmission area (13) include：Be parallel to each other spaced multiple biographies
Rotary shaft (22) is sent, the base-plate cleaning area (12) includes：At least two is parallel and spaced with transmission rotary shaft (22)
Cleaning rotary shaft (21)；
Multiple is equipped with each cleaning rotary shaft (21) to be parallel to each other spaced support shaft (211), the support shaft
(211) with it is described cleaning rotary shaft (21) vertical-transmission be connected, each support shaft (211) away from clean rotary shaft (21) one
End is arranged with cleaning brush (212)；
Each cleaning brush (212) is respectively positioned on and the cleaning rotary shaft away from a side end face of cleaning rotary shaft (21)
(21) on parallel same plane, the side of two adjacent cleanings brush (212) is tangent；
Multiple delivery rollers (221) being sequentially arranged at intervals are arranged with each transmission rotary shaft (22).
2. substrate cleaning apparatus as claimed in claim 1, it is characterised in that the quantity of the cleaning rotary shaft (21) is two
It is individual.
3. substrate cleaning apparatus as claimed in claim 1, it is characterised in that the cleaning rotary shaft (21) and the support shaft
(211) connected by a pair of helical gear vertical-transmissions between.
4. substrate cleaning apparatus as claimed in claim 1, it is characterised in that also include：Being located in the frame (1)
Multiple auxiliary rotary shaft (23) parallel with transmission rotary shaft (22) above the multiple transmission rotary shaft (22) are each
Individual auxiliary rotary shaft (23) is arranged with multiple auxiliary wheels (231) being sequentially arranged at intervals.
5. substrate cleaning apparatus as claimed in claim 4, it is characterised in that described auxiliary when the substrate cleaning apparatus work
Help rotary shaft (23) in opposite direction with what transmission rotary shaft (22) rotated.
6. substrate cleaning apparatus as claimed in claim 4, it is characterised in that the auxiliary wheel (231) and delivery roller
(221) minimum range between is equal to the thickness of the substrate for needing cleaning.
7. substrate cleaning apparatus as claimed in claim 1, it is characterised in that also include：Multiple free roller wheels (213) are described
Junction and described second of the free roller wheel (213) located at first substrate transmission area (11) with base-plate cleaning area (12)
The junction of substrate transmission area (13) and base-plate cleaning area (12), the summit of the free roller wheel (213) and each cleaning brush
(212) the side end face away from cleaning rotary shaft (21) is in same plane.
8. substrate cleaning apparatus as claimed in claim 1, it is characterised in that also include：With it is described transmission rotary shaft (22) with
And the connected drive device of cleaning rotary shaft (21).
9. substrate cleaning apparatus as claimed in claim 8, it is characterised in that the drive device is electric rotating machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611179594.2A CN106773161B (en) | 2016-12-19 | 2016-12-19 | Substrate cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611179594.2A CN106773161B (en) | 2016-12-19 | 2016-12-19 | Substrate cleaning apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106773161A true CN106773161A (en) | 2017-05-31 |
| CN106773161B CN106773161B (en) | 2019-07-02 |
Family
ID=58890620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611179594.2A Active CN106773161B (en) | 2016-12-19 | 2016-12-19 | Substrate cleaning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106773161B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003047918A (en) * | 2001-08-07 | 2003-02-18 | Fumio Irie | Washing apparatus for water rod roller of printer |
| CN102388335A (en) * | 2009-05-12 | 2012-03-21 | 夏普株式会社 | Substrate washing method and substrate washing apparatus |
| TW201240744A (en) * | 2011-04-01 | 2012-10-16 | Ishiyama Co Ltd | Cleaning device and cleaning method |
| KR20130056659A (en) * | 2011-11-22 | 2013-05-30 | 주식회사 케이씨텍 | Contact type cleaning device for large area substrate |
-
2016
- 2016-12-19 CN CN201611179594.2A patent/CN106773161B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003047918A (en) * | 2001-08-07 | 2003-02-18 | Fumio Irie | Washing apparatus for water rod roller of printer |
| CN102388335A (en) * | 2009-05-12 | 2012-03-21 | 夏普株式会社 | Substrate washing method and substrate washing apparatus |
| TW201240744A (en) * | 2011-04-01 | 2012-10-16 | Ishiyama Co Ltd | Cleaning device and cleaning method |
| KR20130056659A (en) * | 2011-11-22 | 2013-05-30 | 주식회사 케이씨텍 | Contact type cleaning device for large area substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106773161B (en) | 2019-07-02 |
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